Wafer handling apparatus and method
Номер патента: EP1454340A2
Опубликовано: 08-09-2004
Автор(ы): Manny Sieradzki, Nicholas R. White
Принадлежит: Diamond Semiconductor Group LLC
Опубликовано: 08-09-2004
Автор(ы): Manny Sieradzki, Nicholas R. White
Принадлежит: Diamond Semiconductor Group LLC
Реферат: A high-speed wafer-processing apparatus and method that employs a vacuum chamber having at least two wafer transport robots and a process station. The vacuum chamber interfaces with a number of single-wafer load locks that are loaded and unloaded one wafer at a time by a robot in atmosphere. Four load locks are sized to allow for a gentle vacuum cycling of each wafer without significant pumpdown delays. The robots in the vacuum chamber move wafers sequentially from one of the load locks to a process station for processing and then to another one of the load locks for unloading by the atmospheric robot.
Serial wafer handling mechanism
Номер патента: EP1109201A3. Автор: Frank Sinclair,Peter Lawrence Kellerman,Kevin Thomas Ryan,Ernest Everett Allen, Jr.,Roger Bradford Fish. Владелец: Axcelis Technologies Inc. Дата публикации: 2003-11-05.