Environmental sem gas injection system
Номер патента: EP2880675A1
Опубликовано: 10-06-2015
Автор(ы): Clive D Chandler, Daniel Woodrow PHIFER Jr., Marc Castagna, Wayne KUROWSKI
Принадлежит: FEI Co
Опубликовано: 10-06-2015
Автор(ы): Clive D Chandler, Daniel Woodrow PHIFER Jr., Marc Castagna, Wayne KUROWSKI
Принадлежит: FEI Co
Реферат: A gas injection system provides a local region at the sample surface that has sufficient gas concentration to be ionized by secondary electrons to neutralize charged on the sample surface. In some embodiments, a gas concentration structure concentrates the gas near the surface. An optional hole in the gas concentration structure allows the charged particle beam to impact the interior of a shrouded region. In some embodiments, an anode near the surface increases the number of ions that return to the work piece surface for charge neutralization, the anode in some embodiments being a part of the gas injection system and in some embodiments being a separate structure.
Gas injection subsystem for use in an inspection system to inspect a sample by use of charged particles and inspection system having such gas injection subsystem
Номер патента: US20230402251A1. Автор: Sybren Sijbrandij,Mark Dimanna,Jeffrey Sauer,Brett Lewis,Louise Barris,Alexander Lombardi. Владелец: CARL ZEISS SMT GMBH. Дата публикации: 2023-12-14.