21-07-2023 дата публикации
Номер: CN116469763A
Принадлежит:
The invention discloses a CSTBT with a self-biased pMOS and a manufacturing method of the CSTBT. The CSTBT with the self-biased pMOS sequentially comprises a metal collector, a P + collector region, an N-type field stop layer, an N-type drift region, an N-type doped carrier storage layer and a P well region from bottom to top, the trench gate and the deep groove emitting electrodes penetrate through the P well region and the N-type doped carrier storage layer, and the deep groove emitting electrodes are formed on the two sides of the trench gate; the P-type compensation layer is formed on the first side of the trench gate and the first side of the deep groove emitter respectively; the P-type buried layers are formed in peripheral regions of the bottoms of the trench gate and the deep groove emitter respectively; the N + emitter region and the P + emitter region are formed on the upper portion of the P well region and located between the trench gate and the deep groove emitter, and the P ...
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