OPTICAL COMPUTING DEVICES COMPRISING BROADBAND ANGLE-SELECTIVE FILTERS

There are various tools for analyzing samples using electromagnetic radiation. An example of sample analysis tool, so called a photometer, provides information about how the properties of the electromagnetic radiation are affected due to reflection, transmission or transmission through a sample. Another example of tool, so-called ellipsometer, provides information about how the polarity of the electromagnetic radiation is affected due to a reflection or a via of a sample. Another example of tool, so-called spectrometer, provides information about how the wavelengths of the electromagnetic radiation are affected by their reflection, transmission or transmission through a sample. Previous efforts to improve the performance of sample analysis tools comprise an arrangement to be cured of at least one optical element along an optical path. The performance of an optical element used in an analysis tool depend on the manufacturing process of the optical elements. In an exemplary method of manufacturing optical element, at least one layer is deposited onto a substrate to provide a result desired filter (e.g.. intensity filtration, filtration of light wavelength, a light polarizing filter). As a result of variation in the manufacturing process, it is difficult to mass-produce optical elements with the same operational characteristics.

One way to improve the process of manufacturing an optical element includes testing the operational characteristics of optical elements during the manufacturing process. This test method is not negligible and it is negatively affected by the manufacturing environment. For example, the sources of heat and vibration present in the manufacturing environment may introduce scattered electromagnetic radiation that increases the amount of error when testing the operational characteristics of an optical element.

Accordingly, described herein are methods and systems for testing optical elements employing a broadband filter selective according to the angle. Among the drawings:

Figures la to 1c show flowcharts of configurations illustrative test systems of optical elements.

Figure 2 illustrates a flow chart of an exemplary tool for the analysis of samples.

Figure 3 shows a drilling environment for example.

Figure 3 B watch an environment exemplary wireline logging.

Figure 4 finally illustrates an example method for testing optical element.

It is to be understood, however, that the specific embodiments given in Figures and their detailed description do not limit the description. On the contrary, they constitute the foundation that allows a person to experience ordinary discern alternative forms, equivalents and the other changes that are encompassed within the scope of the claims appended hereto.

Described herein are methods and systems for testing optical elements employing a broadband filter selective according to the angle. In various embodiments, the systems and methods of testing can be employed during and/or after manufacture of an optical element. In this context, the term "broadband filter selective angle" corresponds to an optical component that allows the electromagnetic radiation to pass therethrough for an extended range of frequencies, but only according to a particular angle of incidence or a narrow range of angles of incidence. Without limitation, a broadband filter selective angle documented is transparent to electromagnetic radiation at 98% p-polarized at an angle of + / - about 4° 55°. FS. Tang and Al [...], more Optical UMB [...][...], forensic science 343, 1499 (2014). The use of a broadband filter selective according to the angle in the legacy systems and methods for testing optical element gives options improving or replacing existing constructions test. In various embodiments, the optical elements obtained by systems and methods of testing can be employed in a number of tools such as optical sample analysis tools (e.g.. of photometers, ellipsometers and spectrometers).

In this context, an "optical element" corresponds to an optical component that reflects, absorbs or otherwise affects the incident electromagnetic radiation therethrough, emitted therefrom or reflecting the laser as a function of the wavelength, the polarity and/or angle of incidence. Examples of optical elements comprise at least one optical filter, a polarizing element, a wavelength selection element and an integrated computing (stateful firewall). In some cases, the optical elements subjected Systems and test corresponding to individual components that can be deployed along an optical path of sample analysis tool or other optical tool. In other cases, the optical elements subjected Systems and test described corresponding to components of combination, an optical element being combined with another component which may be deployed along an optical path of the sample analysis tool or other optical tool. Examples of combining components comprise a source of electromagnetic radiation or a transducer (sensor) of electromagnetic radiation including at least one layer of optical elements to at least one surface thereof.

In at least some embodiments, a test system of optical elements comprises a broadband filter selective angle disposed along an optical path with the optical element to be tested. The system also includes an electromagnetic radiation transducer, which emits a signal in response to the electromagnetic radiation passing through the broadband filter selective according to the angle. The system also includes a recording device that records data corresponding to the output signal from the transducer of electromagnetic radiation, the data indicating a property of the optical element in response to a test. However, one example of a method of testing optical element comprises disposing an optical element to be tested and a broadband filter selective angle disposed along an optical path. The method also includes transmitting a signal in response to the electromagnetic radiation passing through the broadband filter selective according to the angle. The method further comprises posting data corresponding to the signal, the data indicating a property of the optical element in response to a test. Various options for testing optical element, options such aircraft and options of sample analysis tool that may benefit from the optical elements that are obtained with test options and manufacture described are described herein.

The systems and methods described are included at best when they are described in the context illustrative usage. Figures la to 1c show flowcharts of various configurations of test systems of optical elements 10a to 10c. In the configuration of Figure la 10a, analyzing the electromagnetic radiation corresponding to an optical path 12a, while an electromagnetic radiation emitted by the source of electromagnetic radiation (NC) 11 reflects on a surface the optical element 13, passes through the broadband filter selective angle and terminates at transducer 14 er 16. The signal emitted by the transducer 16 er in response to incident electromagnetic radiation is digitized, recorded and analyzed for characterizing a property of the optical element 13 in response to a test (e.g.. an optical monitor test, a test of ellipsometry test or spectrometry). For example, the configuration of Figure 1a may be used to identify the characteristics of the optical monitor of the optical element 13 (e.g.. how the intensity of the electromagnetic radiation emitted from the source er 11 and corresponding to a discrete wavelength or at an interval is affected due to a reflection on the optical element 13), the characteristics of the optical element 13 ellipsometry (i. D.. how the polarization of electromagnetic radiation emitted from the source er 11 is affected due to a reflection on the optical element 13) or the characteristics of the optical element 13 spectrometry (i. D.. how the particular wavelengths of the electromagnetic radiation emitted from the source er 11 are assigned by their reflection on the optical element 13).

In the configuration 10b of Figure lb, the electromagnetic radiation analyzing 12b corresponding to an optical path, the electromagnetic radiation emitted from the source er 11 passing through the optical element 13, through the broadband filter selective angle transducer 14 and arriving at er 16. The signal emitted by the transducer 16 er in response to incident electromagnetic radiation is digitized, recorded and analyzed for characterizing a property of the optical element 13 in response to a test (e.g.. an optical monitor test, a test of ellipsometry test or spectrometry). For example, the configuration of Figure I b may be used to identify the characteristics of the optical monitor of the optical element 13 (e.g.. how the intensity of the electromagnetic radiation emitted from the source er 11 and corresponding to a discrete wavelength or at an interval is affected due to a reflection on the optical element 13), the characteristics of the optical element 13 ellipsometry (i. D.. how the polarization of electromagnetic radiation emitted from the source er 11 is affected due to a reflection on the optical element 13) or the characteristics of the optical element 13 spectrometry (i. D.. how the particular wavelengths of the electromagnetic radiation emitted from the source er 11 are assigned by their passage through the optical element 13). In various embodiments, the system configurations for testing optical element such as the configurations 10a and 10b may be combined with a mechanism for use or equipment modification to accelerate obtaining an optical element to desired characteristics.

In the configuration of test systems of optical elements 10c of Figure 1c, a test section 20 and manufacture section 30 are represented. Score: the components of the test section 20 may be positioned on different sides of the manufacturing stage 30 by means of apertures or windows suitable 37a to 37d. Additionally or alternatively, the components of the test section 20 may be part of the manufacturing stage 20 (e.g.. in the deposition chamber 31). Additionally, a computer system 70 is shown, the computer system 70 that can direct the operations and/or receiving the measurements from the components of the test section 20 and/or the production cell 30. The computer system 70 may also display information on the screen and/or control options for an operator. The interaction of the computer system 70 with the test section 20 and/or the production cell 20 can be automated and/or subjected to a user input.

According to at least some embodiments, the computer system 70 contains a processing unit 72 which displays test options, manufacturing options and/or test results by executing software or instructions obtained from a non-transient medium readable by a local or remote computer 78. The computer system 70 may also include one or more devices) input 76 (e.g., a keyboard, a mouse, a touch pad, and so on) and one or more devices) output 74 (e.g., a screen, a printer, and so forth). These devices) and/or input devices 76) output 74 provide a user interface that allows an operator to interact with the components of the test section 20, with the components of the manufacturing stage 30 and/or with the software executed by the processing unit 72. The computer system 70 may e.g. allow an operator to select test options (e.g.. a test of ellipsometer, a spectrometer test, a test optical monitor or adjustable parameters) for viewing the test results, to select options for making and/or to perform other tasks. As has been already indicated, at least some tasks performed by the computer system 70 (e.g., to direct the components of the test section 20, for directing the components of the manufacturing stage 30, to record the test results, for displaying the test results, and so on) can be automated. In at least some embodiments, the operations of the manufacturing stage 30 are based, at least in part, on the measurements taken by the test section 20. While the discussion for configuring 10c focuses on testing and manufacturing components on the ICE 33, it will be appreciated that other types of optical elements 13 may likewise be tested during manufacture or modification.

In accordance with at least some embodiments, the production cell 30 contains a deposition chamber 31 provided with at least one deposition source 38 to give low index materials complex refractive index n * l and complex high refractive index n * h used to form the layers ICE 33. The substrates on which the layers are to be deposited 33 ICE are placed on a substrate support 32. The substrates have a thickness and a complex refractive index specified by the design ICE. In various embodiments, one can employ various deposition techniques to form a stack of layers for each of the stateful firewall 33 ICE conforming to a design target. Examples of deposition techniques include physical vapor deposition (PVD process), the CVD (chemical vapor deposition), atomic layer deposition (as the AVD) and the molecular beam epitaxy (SEM provided). PVD operations, for example, the layers of stateful firewall 33 are formed by condensing a vaporized form of matter (e) the one or more sources (e) deposition 38, while maintains a vacuum deposition chamber. In some embodiments, is carried out according to a PVD deposition by electron beam (e-beam), wherein an electron beam of high energy is concentrated electromagnetically on the material (e) the one or more sources (e) deposition 38 to vaporize the atomic species (e.g.. If>2 or SiC). In some cases, the beam deposition e is assisted by ions which clean or that attack the substrate (e) and/or ICE that increase the energies of the material (e) (e) evaporated, so that they are more densely deposited on the substrates. If the ions are used, an ion source can be added to the production cell 30.

Another PVD technique that can be used to form the stack of layers of each of the stateful firewall 33 is the cathodic arc deposition, in which an electrical arc discharged at the one or more material (e) the one or more sources (e) deposition 38 blows a portion of the material (e) in ionized vapor depositing on the stateful firewall 33 being formed. Another PVD technique that can be used to form the stack of layers of each of the stateful firewall 33 still is vapor deposition, wherein the at least one material from (e) (e) in the or the light source (e) deposition 38 are heated up to a high steam pressure by electrical resistance heating. Another PVD technique that can be used to form the stack of layers of each of the stateful firewall 33 still is pulse laser deposition, where a laser removes material from (e) (e) in the or the light source (e) 38 by vapor deposition. Another PVD technique that can be used to form the stack of layers of each of the stateful firewall 33 still is sputter deposition, wherein a discharge plasma radiating (usually located around the one or more sources (e) deposition by a magnet 38 bombards the material (e) the one or more sources (e) 38 by spraying a portion outside as steam for subsequent deposition.

In various embodiments, the relative orientation of and separation between the at least one light source (e) deposition 38 and the substrate support 32 can be varied to obtain a desired level of deposition and spatial uniformity through the stateful firewall 33 disposed on the substrate support 32. If the spatial distribution of a substantial portion of or provided by the deposition sources to deposit (e) 38 is not uniform, the assembly forming the support 34 can periodically move the substrate support 32 with respect to the at least one light source (e) deposition 38 along at least one direction. The support assembly 34 may for example support a transverse movement (e.g.. upward, downward, leftward, rightward along a straight line with the axes "R." or "Z-" represented) of the substrate support 32 in a deposition chamber and/or a rotational movement about an axis 36 (e.g.. a change in the azimuth direction "0") to obtain deposits to reproducibly uniform layers for the stateful firewall 33 in a batch.

The test section 20 used with this manufacturing 100 may include multiple components. As shown in Figure 1c, the position of the components for the test section 20 may vary to provide analysis based on reflection or analysis feedthrough (i. D.. transmission) optical layers during fabrication. Although this does not appear specifically, in at least some embodiments, the test section 20 may include a monitor physical thickness such as a microbalance quartz crystals (not shown) for measuring a rate of deposition. The deposition rate can be used to steer the operations of the one or more sources (e) deposition 38 (i. D.. that the deposition rate can be increased or decreased) and/or the operations of the substrate support 32 (e.g.. for moving the substrate support 32 with respect to the at least one light source (e) deposition 38). In some embodiments, the computer system 70 may determine complex indices of refraction and thickness of layer using measurements of how the electromagnetic radiation emitted from a EM source (e.g.. a source 22a or 22b er) has interacted with the layers formed of an ICE 33 particular test τ (the ICE 33 being tested). The electromagnetic radiation emitted from the source er 22a or 22b corresponds to any type of electromagnetic radiation including at least one probe wavelength from an appropriate region of the electromagnetic spectrum. The test section 20 also includes at least one transducer er (e.g.. a transducer er 26a and 26b) configured to receive electromagnetic radiation after interaction with the ICE 33 T and traversing a broadband filter selective angle 28a or 28b. More specifically, there is a transducer er 26a for receiving electromagnetic radiation emitted from a source and reflected out er 22a the ICE T-test 33, while the transducer is arranged er 26b for receiving electromagnetic radiation emitted by the source er 22b and through the ICE test j is 33.

In at least some embodiments, the test section 20 performs a test of ellipsometry. The testing of ellipsometry may e.g. involve the measurement, by the transducer er 26a (e.g.. during or after formation of the jth layer 33 of stateful firewall), the amplitude and phase components (Ψ, has) of the probe light elliptically polarized by the source er 22 has after reflection from a stack containing the j layers corresponding to the ICE test 33 τ· the probe light is supplied from the source er 22a, for example, via a probe hole or window 37a in the deposition chamber 31. Meanwhile, the reflected electromagnetic radiation arrives on the transducer er 26a through another hole or window 37c of the deposition chamber 31. The amplitude and the phase components (Ψ, has) measured may be used by the computer system 70 to determine the real and imaginary components of the complex index of refraction and the thicknesses of each of the layers formed in the stack. In at least some embodiments, the computer system 70 makes this determination by solving Maxwell's equations for propagating/reflect light meets the test probe ellipsometry through the layers formed of the ICE 33 τ· test

Additionally or alternatively, the trial section 20 can perform optical monitor test. The test optical monitor may e.g. involve the measurement (e.g.. during or after formation of the jth layer of stateful firewall 33) the intensity variation of a probe light source fed er 22b and transmitted through a stack containing the j layers corresponding to the ICE test 33 τ· for testing optical monitor, the probe light account at least one wavelength "discrete" {Xkis where k=1.2, ...}, where a discrete wavelength Xkis comprises a center wavelength Xk in a narrow bandwidth [...] (e.g.. [...] 5 nm at most) and wherein at least two wavelengths XI and λ and 2, contained in the probe light, have respective bandwidths Α λ Α λ 1 and 2 which do not overlap. The source er 22b may for example be a continuous wave laser (WC). As shown in Figure 1c, the source er 22b emitting probe light through a port or window 37b in the deposition chamber 31. Meanwhile, the transducer er 26b collection corresponding measurements through another port or window 37d. The measured intensity variation of the I (Y, Xkis) may be used by the computer system 70 for determining refractive indices complexes and the thicknesses of each of the layers formed in the stack. In at least some embodiments, the computer system 70 makes this determination by solving Maxwell's equations for propagating a light probe meets the test optical monitor through the layers formed of the ICE 33 τ· test

Additionally or alternatively, the trial section 20 may test for spectrometry. Testing of spectrometry may e.g. involve the measurement (e.g.; during or after formation of the jth layer of stateful firewall 33) spectrum e (j of; the X) of electromagnetic radiation provided by a source er 22b and through a stack of j layers corresponding to the ICE T-test 33, the electromagnetic radiation can have a wavelength range wide and continued from λ π ηη to λ π ΐ 3. χ. Score: carry out the test optical monitor and testing of spectrometry, the source er 22b may correspond to the components of the electromagnetic radiation source broadband components and the source of electromagnetic radiation of narrow band needed for the two types of tests. For spectrometry, the source er 22b emits electromagnetic radiation broadband through a port or window 37b in the deposition chamber 31. Meanwhile, the transducer er 26b collection corresponding measurements through another port or window 37d. The spectrum e (j of, λ) measured by the transducer 26b (on the wavelength interval of λ π ηη to λ ηΐηχ) can be used by the computer system 70 for determining refractive indices complexes and the thicknesses of each of the layers formed in the stack. In at least some embodiments, the computer system 70 makes this determination by solving Maxwell's equations for propagating a light probe meets the test of spectrometry through the layers formed of the ICE 33 τ· test

In at least some embodiments, an ICI χ test 33 is at rest with respect to the components of the test section 20 collects measurements during a test. In this case, the deposition of a layer L (d) is terminated or completed before performing the measurement. For some layers of a ICE design, the test section 20 can measure the characteristics of the probe light that has interacted with the ICE test 33 τ once layer L (Y) has been deposited to its thickness (d) complete target T-or equivalently, when depositing the layer L (d) is completed. Otherwise, the trial section 20 can measure the characteristics of the probe light that has interacted with the ICE test τ 33 during the deposition of the layer L (d). In various scenarios, this measurement may be taken when layer L (Y) has been deposited to a fraction of its thickness target (e.g.. f=50%, 80%, 90%, 95%, and so on).

In other embodiments, the test 33 here τ moves with respect to the components of the test section 20. The support assembly 34 may for example cause the substrate support 32 and 33 to move the stateful firewall (e.g.. upward, downward, leftward, rightward, to rotate) during collection of test measurements. In this case, the deposition of the layer L (Y) may, but not necessarily, be terminated or completed before the measurement test. For at least a portion of the layers of the ICE design, test measurements are collected continuously throughout ATs (d) deposition of layer L (d) or portions of the deposition process (e.g.. during the last 50%, 20%, 10% of the process). The test measurements can still correspond to a test for ellipsometry, to test optical monitor or testing spectrometry as described herein. If desired, the collected measurements may be averaged over a period of time or over intervals of movement (e.g. 5 intervals). As another example, multiple stateful firewall 33 (not only the ICE 33 T-test) may then be tested while the support assembly moves each stateful firewall 33 in terms of the components of the test section 20. Testing measurements obtained for different stateful firewall 33 can be averaged.

A complication with obtaining measurements of test spectra near infrared (NIR-) or [...]-red median (MIRD) is that scattered electromagnetic radiation emanating from any surface warm (e.g.. a black body) within the deposition chamber 31 may arrive at the transducers er 26a and 26b and interfere with testing measurements. A further complication can occur when the electromagnetic radiation scattered from a er sources 22a or 22b (i. D.. the electromagnetic radiation that has not interacted with the ICE 33. χ) arrives on the transducer er 26a or 26b. Scattered electromagnetic radiation can be due to components of the deposition chamber 31 and/or vibration of the deposition chamber 31. To avoid such interference with testing measurements, wide-band filter selective angle 28a and 28b are positioned forward their respective transducer er 26a and 26b. Thus, an unwanted electromagnetic interference radiation angle is blocked by the broadband filters selective angle 28a and 28b, thereby improving testing measurements obtained.

The stateful firewall 33 and/or other optical elements 13 that have been manufactured and/or modified functions of test results as described herein can be used in various tools such as the sample analysis tool. Figure 2 illustrates a sample analyzing tool 40. The sample analyzing tool 40 includes a source er 41, a sample chamber 42, at least one optical element and at least one transducer 13 er 46 disposed along an optical path 50. The positional and orientational components deployed along the optical path 50 may vary. In addition, the optical path 10 does not necessarily correspond to a rectilinear path (e.g.. there may be corners, curves or other changes in direction 50 along the optical path). The sample analysis tool 40 may further include components of spatial masking, imaging optics and/or lenses along the optical path 50. Otherwise, there can be omitted the components based on the arrangement of the transducer (e) er 46.

In some embodiments, the source er 41 can be omitted if the electromagnetic radiation outside the sample analysis tool 40 is available. In other embodiments, a sample 43 in the chamber 42 is capable of emitting electromagnetic radiation (e.g.. by a transparent window of the sample chamber 42) and may serve as a source er 41. In various embodiments, the at least one optical element (O) (O) 13 allow the sample analysis tool 40 measurements as photometry, ellipsometry measurements or measurements of spectrometry that can be used to characterize or identify the sample 43.

In at least some embodiments, the sample analysis tool 40 also includes at least one digitizer 47 to convert analog signals from each detector 46 er into a corresponding digital signal. Further, the sample analysis tool 40 may include a data recording device 48 which records data corresponding to the output of each transducer er 46. Furthermore, the sample analysis tool 40 may include a telecommunication interface 49 to transfer the data corresponding to the output of each transducer er 46 to another device. Additionally or alternatively, the sample analysis tool 40 may include a processing unit (not shown) for processing data and/or mimicked display (not shown) for displaying data corresponding to the output of each transducer er 46. For example, the data corresponding to the output of each transducer 46 er may be analyzed to identify a property of the sample 43. The identified property can for example correspond to a density (or other physical parameter) and/or to a chemical component. The identified property can be displayed by a display unit and/or can be transmitted using the telecommunication interface 49 to another apparatus. The configuration of the sample analysis tool 40 may vary depending on the environment in which the sample analysis tool 40 is used. A design of downhole for sample analysis tool 40 may for example differ from a configuration of laboratory for sample analysis tool 40 because of space constraints, of sampling constraints, power constraints, of environmental parameters (temperature, pressure, and so on) or other factors.

It will be appreciated further that the sample analysis tool 40 can contain components of obtaining a sample. For sampling fluid in a downhole environment for example, the sample analysis tool 40 may contain a sampling interface which extends to a borehole wall and which sucks fluid formation. In addition, the sampling interface may direct the formation fluid to the sample chamber 42. If desired, the resulting samples may be stored for subsequent analysis once a sample analysis tool 40 is recovered (e.g.. from a downhole environment) or the samples can be rinsed for analysis of a next sample while the sample analysis tool 40 remains in a downhole environment. It will be appreciated further that the sample analysis tool 40 can comprise any of the components of the pressure or the temperature of a sample during analysis.

Figure 3a shows a drilling environment illustrative 51 A. Figure 3a, a drilling assembly 54 allows lowering and lifting of a drill string in a borehole 60 55 59 which penetrates the earth formations 58. The drill string 60 is for example formed of a modular assembly of segments 62 and 63 of adapters of drill string. At the lower end of the drill string 60, a bottom hole assembly with a drill bit 61 69 removes material formations 59 drilling according to known techniques. The bottom hole assembly 61 also comprises at least one drill collar 67 66 and a downhole tool having at least one sample analyzing unit 68a to 68n, each of which may correspond to a certain variation of the sample analysis tool 40 described for Figure 2. for collecting fluid samples in the downhole environment 51 has, a sampling interface (not shown) is provided with the downhole tool for example 66 ., the sampling interface may be provided with a drill collar 67 69 near the drill bit. If desired, drilling operations may be stopped in order to obtain fluid samples of known multiplexed sampling

In addition to units sample analysis to 68n 68a, the downhole tool 66 may also include electronics for recording data, the telecommunications, and others in various embodiments, the measurements of sample analysis obtained by the at least one sample analyzing unit 68a Tp0.7 68n are transferred to the earth's surface according to techniques known telemetry (e.g.. the telemetry wired pipe, the mud pulse telemetry, acoustic telemetry, electromagnetic) and/or they are recorded by the downhole tool 66. in at least some embodiments, a cable 57a can extend the BHA 61 up to the earth's surface. The cable 57a may for example take various forms, such as integrated electrical conductors and/or optical waveguides (e.g., fibers) to allow transfer of electricity and/or communication between the bottomhole assembly 61 and the earth's surface. In other words, the cable 57a can be integrated with the modular components of the drill string 60, attached thereto or located inside thereof.

Figure 3a has, an interface 56 located at the surface of the earth receives measurements of sample analysis (or other data collected downhole) by the cable 57a or by another ranging channel transfers the measurements and sample analysis to a computer system 50. In some embodiments, the interface surface 26 and/or the computer system 50 may perform various operations such as converting signals from one format to another, recording measurements sample analysis and/or treatment of analytical measurements of sample for retrieving information on the properties of a sample. In one example, in at least some embodiments, the computer system 50 includes a processing unit 52 which displays analytical measurements of samples or sample properties related by executing software or instructions obtained from a non-transient medium readable by a local or remote computer 58. The computer system 50 may also include one or more devices) input 56 (e.g., a keyboard, a mouse, a touch pad, and so on) and one or more devices) 54 output (e.g., a screen, a printer, and so forth). These devices) and/or input devices 56) output 54 provide a user interface that allows an operator to interact with the downhole tool 66 and/or with the software executed by the processing unit 52. For example, the computer system 70 may allow an operator to select sampling options, select options for sample analysis, view analytical measurements of samples collected, view sample properties obtained by the measurements of sample analysis and/or perform other tasks. In addition, the information on the bottom position at which a particular sample is collected may be taken into account and used to facilitate decisions well completion and/or other strategic decisions related to the production of hydrocarbons.

At varying times during the drilling process, the drill string 61 in Figure 3a may be removed from the borehole 55. When removing the drill string 60, another option for performing the operations of sample analysis involves the environment of wireline 51b of Figure 3b. Figure 3b has, a tool string wireline 90 is suspended in a borehole that penetrates formations 55 59 58 of the earth. The tool string of wireline 90 may for example be suspended by a cable 86 comprises electrical conductors and/or optical fibers for transmitting power to the tool string wire line 90. The cable 86 can also interface communication for telecommunications from top and/or bottom hole. In at least some embodiments, the cable 86 winds and unwinds required around the cable reel 84 by lowering or raising the tool string wire line 90. As seen, the cable spool 84 may be part of a logging facility or a mobile vehicle 80 containing a cable guide 82.

In at least some embodiments, the tool string of wireline 90 contains one or more tool (e) logging 94 92 and a downhole tool having at least one sample analyzing unit 68a to 68n, each of which may correspond to a certain variation of the sample analysis tool 40 described for Figure 2. the downhole tool 62 may also include electronics for recording data, the telecommunications, so on the measurements sample analysis obtained by the at least one sample analyzing unit 38a to verbs 38n are transferred to the surface of the earth and/or they are recorded by the downhole tool 62. in either case, the measurements may be used sample analysis to determine at least one property of a sample collected in the downhole environment. The measurements of sample analysis may for example be used to determine a density of sample, to identify the presence or absence of a chemical and/or determining a further property of a sample. In addition, information on the bottom position at which a particular sample was collected can be taken into account and used to facilitate decisions well completion and/or other strategic decisions related to the production of hydrocarbons.

To the earth's surface, a surface interface 56 receives the measurements of sample analysis by the cable 86 and sends the measurements sample analysis to a computer system 70. As has been already indicated, the interface 56 and/or computer system 70 (e.g.. a section of the system logging mobile or the vehicle 80) may perform various operations such as converting signals from one format to another, the record of analytical measurements of sample, the treatment sample analysis measurements, the measurement display sample analysis or the reference characteristics corresponding, andc.

Figure 4 illustrates an example method for testing optical element 100. As seen, the method 100 includes disposing an optical element to be tested and a broadband filter selective angle along an optical path (block 102). At block 104, a signal is transmitted in response to the electromagnetic radiation passing through the broadband filter selective according to the angle. The electromagnetic radiation may correspond to a test for ellipsometry, to test optical monitor or testing spectrometry as described herein. At block 106, the data corresponding to the signal is recorded, the data indicating a property of the optical element in response to a test. In at least some embodiments, the test method of optical element 100 may be performed during the manufacture of an optical element for guiding the manufacturing process such as PVD. The process method of testing optical element 100 may be performed after the fabrication is completed for testing the functionality of an optical element fabricated. In each case, the modification of an optical element or a batch of optical elements may be based on the test results. After manufacture or modification, the optical elements which have undergone the testing process described herein may be employed with tools such as optical sample analysis tools described herein.

The embodiments described herein include:

Has: a test system of optical elements comprises a broadband filter selective angle disposed along an optical path with an optical element to be tested. The system also includes a transducer er, which outputs a signal in response to the electromagnetic radiation passing through the broadband filter selective according to the angle. The system also includes a recording device that records data corresponding to the output signal from the transducer er, the data indicating a property of the optical element in response to a test.

B.: a method for testing optical element comprises disposing an optical element to be tested and a broadband filter selective angle disposed along an optical path. The method also includes transmitting a signal in response to the electromagnetic radiation passing through the broadband filter selective according to the angle. The method further comprises posting data corresponding to the signal, the data indicating a property of the optical element in response to a test.

Each of the embodiments a and b may include at least one of the following additional elements, in any combination. Element 1: further comprising a housing and a source of em in the housing. Element 2: also includes a deposition source and a controller, the controller directing the deposition source to adjust a layer of the optical element or for adding a layer to the optical element based on the data. Element 3: further comprising a deposition chamber and a support assembly that is in the deposition chamber, the controller directing the support assembly to move the optical element transversely in the deposition chamber according to the data. Element 4: further comprising a deposition chamber and a support assembly that is in the deposition chamber, the controller directing the support assembly for rotating the optical element in the deposition chamber according to the data. 5 element: the controller directing the deposition source for adjusting a deposition rate based on the data. 6 element: the broadband filter selective according to the angle and the transducer er are arranged to prevent scattered electromagnetic radiation or electromagnetic radiation to reach the specular ηοή er transducer. 7 element: the data is indicative of a test optical monitor. 8 element: the data is indicative of a test of ellipsometry. 9 element: the data is indicative of a test spectrometry. 10 element: the optical element is an ICE.

Element 11: also includes adjusting a layer of the optical element or the addition of at least one layer to the optical element based on the data. Member 12: further comprising moving the optical element in a deposition chamber according to the data. Member 13: further comprising adjusting a deposition rate based on the data. Element 14: further comprising using the data to generate a set of optical elements. 15 element: the data is indicative of a test optical monitor. 16 element: the data is indicative of a test of ellipsometry. 17 element: the data is indicative of a test spectrometry. 18 element: the optical element is an ICE.

Many other modifications and variations will be apparent to those skilled in the field once the description above have been fully understood. It is understood that the following claims be interpreted to embrace all such modifications and variations, if any.