감광성 수지 조성물 및 이를 이용한 컬러필터
The substrates using the photosensitive resin composition and color filter prepared by the number are disclosed. Applying a photosensitive resist composition generally display color filter using a regular height from applying a desired pattern is formed on the photomask, dissolving the silicon industry patterning process to un-number and form the color filter. High sensitivity for color filter is soluble alkali material, adhesion to a substrate, chemical resistance, heat resistance are required. And, chromatic material usually use as pigment or dye are disclosed. However, pigment excellent in heat resistance and the chemical resistance but not in the case of luminance and chromatic quality not any disperse well solvent such as, in the case of dye is constructed in heat resistance and the chemical resistance strength of durability not any door number flow tides. The, current pigment or dye using photosensitive resin composition with chromatic material technical limit to jump across new general outline using the same color filter material converts the type photosensitive resin composition etc. continue to be developed. Certain embodiments include color filter process continues according to minimizes photo-conversion rate can be number for photosensitive resin composition are disclosed. Another implementation relates said photosensitive resin composition for color filter prepared by the number using number are disclosed. Certain embodiments include quantum dots (A); (B) binder resin; (C) represented by the formula 1 compound for including a photo-polymerizable monomer; photopolymerization disclosure number (D); (E) thiol (thiol) based added number; and (F) solvent including photosensitive resin composition number substrate. [Formula 1] In said formula 1, L1 And L2 Are each independently single bond, a substituted or unsubstituted C1 to C20 alkylene represented by formula 2 and to, [Formula 2] In said formula 2, L3 A substituted or unsubstituted C1 to C5 is modified, N is integer number of 1 to 10, Said formula 2 of the oxygen atom of the benzene ring of said formula 1 coupled directly. 10 To 40% by weight relative to the total photo-polymerizable monomer represented by said formula 1 compounds said weight % can be included. Said 360 nm to 780 nm of wavelength range of light by absorbing the quantum dots, in detecting the fluorescence wavelength region of 450 nm to 700 nm can be emitting. Said 450 nm to 580 nm maximum fluorescence wavelength in the quantum dots (fluorescence λEm ) 580 Nm to 700 nm having a maximum fluorescence wavelength or quantum dots (fluorescence λEm ) Having quantum dot can be. Mote this year orgin number is added to said at least 2 functional group including at least one end can be represented by formula 5. [Formula 5] In said formula 5, L4 And L5 Are each independently single bond, a C1 to C20 substituted or unsubstituted alkylene, substituted or unsubstituted C3 to C20 alkyl [leyn a cycle, a C6 to C20 substituted or unsubstituted C2 to C20 substituted or unsubstituted heteroaryl or a substituted or it will be biting, [leyn it will be biting, [leyn among others. Said photosensitive resin composition further comprises (G) diffusion number can be. Said diffusion number is barium sulfate, calcium carbonate, titanium dioxide, zirconia or combinations thereof can be. Said diffusion number is said photosensitive resin composition the synthetic fiber 0. 5% By weight to 10% by weight can be included. Said photosensitive resin composition, said photosensitive resin composition the synthetic fiber, 1% by weight to 30% by weight said quantum dots (A); 1% by weight to 30% by weight of said binder resin (B); 1% by weight to 20% by weight of said (C) a photo-polymerizable monomer; (D) said photopolymerization disclosure number 0. 1% By weight to 5% by weight; said number 1 weight % to 10 weight % based added thiol (thiol) (E); and said solvent comprising (F) can be. Said photosensitive resin composition malonic acid; 3 - amino - 1, 2 - propanediol; silane coupling number; leveling number; number fluorine-based surfactants; or a combination thereof can be further. Another implementation relates said photosensitive resin composition color filter prepared by the number using number substrate. Other aspects of the present invention specific the operating requirements described hereinafter included in the nanometer range. In one implementation according to quantum dot containing photosensitive resin composition, coating, pre-baking, exposure, developing, baking such as photo-conversion rate minimizes post - number can be pore-forming positive according to color filter. Figure 3 in the embodiment 1 and comparison example 1 to also independently filtered photo-conversion in every process step 1 according to photosensitive resin composition color filter graph are disclosed. Also in the embodiment 7 and comparison example 2 according to Figure 6 to 4 independently in every process step light converting filtered graph color filter photosensitive resin composition are disclosed. Hereinafter, one embodiment of the present invention detailed the on-sensors other. But, this is by way of example number so that when, the range of the present invention is defined by the present invention refers to one category number 802.11a packets not claimed only disclosed. The free special referred in the specification, C1 to C20 alkyl group implies "alkyl" components, "between the light-emitting" C2 to C20 components provide the means by which excavation, C3 to C20 components provide the means by which "the light-emitting cycles" excavation work cycle, C3 to C20 hetero "hetero the gap claw [khey neel it will know" components provide the means by which the gap claw neel the [khey which it will know it will raise, C6 to C20 aryl group "aryl group" means by which components, C6 to C20 arylalkyl "aryl-alkyl" means and implies, C1 to C20 unsubstituted alkylene group implies "alkylene" components, "it will be biting, [leyn" C6 to C20 components provide the means by which it will be biting and [leyn it will raise, C6 to C20 alkyl components provide the means by which it will be biting and [leyn it will raise "alkyl it will be biting, [leyn", "hetero it will be biting, [leyn" C3 to C20 hetero components provide the means by which it will be biting and [leyn it will raise, C1 to C20 alkoxy "alkoxy thread [leyn" implies the thread [leyn it will raise big. The free special referred in the specification, "substituted" RM (F, Cl, Br, I) hydrogen atoms at least one halogen atom, hydroxy, C1 to C20 alkoxy, nitro, cyano group, amine group, imino for, to azido, amino , , , carbonyl, carboxylic , molecular weight, ester, ether, carboxylic acid or salt thereof, a sulfonic acid group or salt thereof, phosphoric acid or salt thereof, C1 to C20 alkyl, C2 to C20 between the light-emitting, C2 to C20 alkynyl to, C6 to C20 aryl, C3 to C20 cycloalkyl, C3 to C20 1 between the light-emitting, C3 to C20 cycloalkyl height neel it will know, C2 to C20 hetero cycloalkyl, C2 to C20 hetero the gap claw [khey neel it will know, C2 to C20 hetero gap claw egg height neel, C3 to C20 substituted heteroaryl group or combinations thereof meaning that the other. In addition the free special referred in the specification, "hetero" implies, in formula N, O, and P S comprising at least one at least one of the heteroatoms meaning as follows. In addition the free special referred in the specification, "(meth) acrylate" means "acrylate" is possible both on and "methacrylate", "(meth) acrylic acid" means "acrylic" and "methacrylic acid" is possible both to each other. The free special referred in the specification, "combination" RM mixing or copolymerization by big. The formula in the definition of a specification is installed at one free, chemical bond has to be green chemical bond is hung on a position is not hydrogen atoms bound position when said means other. The specification resin in treating cancer, selected from the group consisting of formula 9 - 1 to formula 9 - 11 to one or more functional resin skeleton (backbone) included to big. In addition the free special referred in the specification, "*" connected to a same or different atom or formula big portion. In one implementation a photosensitive resin composition according to (A) quantum dot; (B) binder resin; (C) represented by the formula 1 compound for including a photo-polymerizable monomer; photopolymerization disclosure number (D); (E) thiol (thiol) based added number; and (F) comprising solvent. [Formula 1] In said formula 1, L1 And L2 Are each independently single bond, a substituted or unsubstituted C1 to C20 alkylene represented by formula 2 and to, [Formula 2] In said formula 2, L3 A substituted or unsubstituted C1 to C5 is modified, N is integer number of 1 to 10, Said formula 2 of the oxygen atom of the benzene ring of said formula 1 coupled directly. Each component in a hereinafter described specifically with respect to each other. (A) Quantum dots Said 360 nm to 780 nm wavelength of the quantum dots, for example 400 nm to 780 nm of wavelength range of light absorption, in detecting the fluorescence wavelength region of 450 nm to 700 nm can be emitting. I.e., 450 nm to 700 nm wavelength fluorescence maximum at said conversion material is light (fluorescence λEm ) May have a. Specifically, maximum fluorescence wavelength 450 nm to 580 nm said quantum dots (fluorescence λEm ) 580 Nm to 700 nm (e.g. green quantum dots) or quantum dots having a maximum fluorescence wavelength (fluorescence λEm ) Comprising quantum dots having (e.g. red quantum dots) can be. 5 Nm to 10 nm may have an average particle diameter of said green the quantum dots, said quantum dots may have an average particle diameter of 7 nm to 15 nm red. Said 1 to 30% by weight with respect to the quantum dots in one implementation the total photosensitive resin composition according to weight %, e.g. 5% by weight to 20% by weight can be included. Incorporated into said range when said dots, quantum dot unique optical conversion characteristic expression and optical conversion efficiency reduction thereof can film. Said quantum dots to 100 nm 20 nm, 20 nm to 50 nm (Full width at half maximum; FWHM) example of a lenslet may have. When said range of said dots have anti-face width, the disk is color purity, color filter material used as these compositions are highly chromatic reappearance ratio flow tides. Said organic or inorganic or organic and inorganic hybrid (hybrids) quantum dots implementation being. The quantum dots can be composed of said core and said shell that surrounds the core, said core and shell are each independently II a-IV group, group III a-V or similar core, core/shell, core/number 1 shell/number 2 shell, alloy, alloy/shell may have a structure such as, limited to are not correct. For example, said core is CdS, CdSe, CdTe, ZnS, ZnSe, ZnTe, HgS, HgSe, HgTe, GaN, GaP, GaAs, InP, InAs and alloys thereof selected from the group consisting at least one material but, composite are not correct. Surrounding said core shell CdSe, ZnSe, ZnS, ZnTe, CdTe, PbS, TiO, SrSe, HgSe and alloys thereof selected from the group consisting at least one material but, composite are not correct. Structure of said quantum dots not limited specially but, in the case of said core/shell quantum dots, quantum dot size of 1 nm to 15 nm (average particle diameter) is overall shell, e.g. 5 nm to 10 nm implementation being. And dispersibility for improving the stability of said quantum dots, quantum dots by substituting said shell surface can be stabilizing organic material, said organic material is thiol-based compound, amine-based compound, phosphine oxide-based compound, acryl-based compound, but can include Si-based compounds and the like, composite are not correct. In one implementation, wherein the before global in recent interest because treatment substance contained in the number using an enriched, cadmium-based core to send light emitting materials, quantum efficiency (quantum yield) light-emitting material is somewhat low but environment-friendly expense cadmium orgin, e.g. InP/ZnS core/shell quantum dots (core-a shell type quantum dots) type, InP/ZnSe/ZnS core/number 1 shell quantum dots (core-a first shell-a second shell type quantum dots)/number 2 shell type use but, composite are not correct. On the other hand, said quantum dot dispersion stability for, in one implementation according to photosensitive resin composition further comprises dispersion number disapproval. Said number is uniformly dispersed in the photosensitive resin composition dispersed dots to aids, non-ionic, anionic or cationic dispersion number can be both. Specifically polyalkylene glycol or esters, poly oxyalkylene, a polyhydric alcohol ester alkylene oxide adduct, alcohol alkylene oxide adduct, sulfonic acid ester, sulfonic acid salt, carboxylic acid ester, carboxylic acid salt, alkylamide alkylene oxide adduct, alkylamines can be etc., they can be mixed at least one alone or 2. Said dispersion number is quantum dot solids contrast 0. 1% By weight to 100% by weight, e.g. 10% by weight to 20% by weight can be used. (B) binder resin Said acrylic binder resin binder resin, comprising binder resin or a combination thereof can be. Said acrylic binder resin is copolymerized with ethylenically unsaturated monomers capable of number 1 and number 2 copolymer of ethylenically unsaturated monomers, including one or more acrylic repeating units can be resin. Said number 1 one or more ethylenically unsaturated monomers and ethylenically unsaturated monomers containing a carboxyl group, specific examples of acrylic acid, methacrylic acid, maleic acid, itaconic, fumaric acid or a combination thereof is cited. 5 To 50% by weight relative to the total binder resin acrylic ethylenically unsaturated monomers are said said number 1% by weight, e.g. 10% by weight to 40% by weight can be included. Said number 2 ethylenically unsaturated monomers styrene, α - methylstyrene, a minute particle, aromatic vinyl compound such as vinyl benzyl methyl ether; methyl (meth) acrylate, ethyl (meth) acrylate, butyl (meth) acrylate, 2 - hydroxyethyl (meth) acrylate, 2 - hydroxy butyl (meth) acrylate, benzyl (meth) acrylate, cyclohexyl (meth) acrylate, phenyl (meth) acrylate such as unsaturated carboxylic acid ester compound; 2 - aminoethyl (meth) acrylate, dimethyl aminoethyl (meth) acrylate such as 2 - unsaturated carboxylic acid aminoalkyl ester compound; vinyl acetate, vinyl iodobenzoic acid such as carboxylic acid vinyl ester compound; unsaturated carboxylic acid glycidyl ester compound such as glycidyl (meth) acrylate; (meth) acrylonitrile such as cyanide vinyl compound; (meth) acrylamide such as unsaturated amide compound; and as to the, these either alone or by mixing two or more be. Specific examples poly it cuts qualitative meta [khu relay [thu said acrylic binder resin, (meta) acrylic acid/benzyl methacrylate copolymer, (meth) acrylic acid/benzyl methacrylate/styrene copolymer, (meth) acrylic acid/2 - hydroxy ethyl meta [khu relay [thu/ benzyl methacrylate copolymer, (meth) acrylic acid/styrene/2 - hydroxy benzyl methacrylate/ethyl meta [khu relay [thu but as to the copolymer, which are not limited to the, alone or in combination with them 2 is used in combination at least one disapproval. Said acrylic binder resin a weight average molecular weight 5,000 g/mol to 15,000 g/mol implementation being. Weight average molecular weight of said acrylic binder resin for toner constituent esters when said, excellent adhesion to substrate physical, chemical properties are pleasant, viscosity suitable for. Said acrylic binder resin has an acid value of 80 mgKOH/g to implementation being 130 mgKOH/g. Said acrylic binder resin has an acid value of said constituent esters when pixel patterns is that the resolution of 0.5 or 1. The repeating unit comprising said binder resin can be represented by formula 8 represented. [Formula 8] In said formula 8, R11 And R12 Are each independently hydrogen atom or a substituted or unsubstituted (meth) acrylic with the jade city which rises an alkyl group, R13 And R14 Are each independently a hydrogen atom, a halogen atom or a substituted or unsubstituted C1 to C20 alkyl group, Z1 Is single bond, O, CO, SO2 , CR17 R18 , SiR19 R20 (Wherein, R17 To R20 Are each independently hydrogen atom or a substituted or unsubstituted C1 to C20 six) or linkage groups represented by either formula 9 - 1 to formula 9 - 11 for and, [Formula 9 - 1] [Formula 9 - 2] [Formula 9 - 3] [Formula 9 - 4] [Formula 9 - 5] (In said formula 9 - 5, Ra Is hydrogen atom, ethyl, C2 H4 Cl, C2 H4 OH, CH2 CH=CH2 Or phenyl residue.) [Formula 9 - 6] [Formula 9 - 7] [Formula 9 - 8] [Formula 9 - 9] [Formula 9 - 10] [Formula 9 - 11] Z2 The remaining time and acid anhydride, T1 t2 and each independently an integer 0 to 4. Said binder resin a weight average molecular weight 50,000 g/mol to 500 g/mol, e.g. 1,000 g/mol to 30,000 g/mol implementation being. Weight average molecular weight of the binder resin for toner constituent esters when said number tank said color filter pattern formed pattern without residue and in effect, developing in film thickness and has both, good patterns can be achieved. At its one end to said at least one binder resin amount functional group can be represented by formula 10. [Formula 10] In said formula 10, Z3 To formula 10 - 7 can be represented by formula 10 - 1 is an epoxy resin. [Formula 10 - 1] (In said formula 10 - 1, Rb And Rc Are each independently, hydrogen atom, a substituted or unsubstituted C1 to C20 alkyl, ester or ether residue.) [Formula 10 - 2] [Formula 10 - 3] [Formula 10 - 4] [Formula 10 - 5] (In said formula 10 - 5, Rd Is O, S, NH, a C1 to C20 substituted or unsubstituted alkylene, C1 to C20 alkyl or C2 to C20 [khey neel amine it will know hydroxybutyrolactone among others.) [Formula 10 - 6] [Formula 10 - 7] Said binder resin example, 9, 9 - bis (4 - oxy [la_nil maul [thok hour phenyl) fluorene of fluorene-containing compounds; d anhydride the tetra car [lu luck thread it buys benzene, naphthalene the tetra car [lu luck thread it buys d anhydride, the non-phenyl tetra car [lu luck thread it buys d anhydride, benzophenone the tetra car [lu luck thread it buys d anhydride, fatigue adopts an d anhydride, the bhutan tetra car [lu luck thread it buys 1 d anhydride, vinyl d anhydride [leyn the tetra car [lu luck thread it buys, the draw [phwu column tetra car [lu luck thread it buys 2 d anhydride, tetrahydro phthalic acid anhydride such as anhydride compound; ethylene glycol, propylene glycol, polyethylene glycol such as glycol aldehyde compounds; methanol, ethanol, propanol, n - butanol, cyclohexanol, benzyl alcohol such as alcohol compound; propylene glycol methyl ethyl acetate, the solvent flow compound N - methylpyrrolidone; phosphorus compounds such as triphenyl phosphine; and tetramethyl ammonium chloride, tetraethyl orthosilicate ammonium bromide, benzyl diethanol amine, triethylamine, tri-butyl amine, benzyl amine or ammonium salt compounds which large number can be by mixing two or more of the high pressure liquid coolant. When said binder resin is binder resin, excellent developing photosensitive resin composition including same, method for forming fine pattern better sensitivity in photocuring excellent disclosed. 1% By weight to 30% by weight relative to the total photoresist resin composition said binder resin can be included, e.g. 3% by weight to 20% by weight can be included. Said binder resin is an excellent sensitivity if said range, a novolac resin, straight property of the resolution and pattern can be achieved. (C) Photopolymerizable Monomer Said represented by chemical formula 1 comprises a photo-polymerizable monomer. [Formula 1] In said formula 1, L1 And L2 Are each independently single bond, a substituted or unsubstituted C1 to C20 alkylene represented by formula 2 and to, [Formula 2] In said formula 2, L3 A substituted or unsubstituted C1 to C5 is modified, N is integer number of 1 to 10, Said formula 2 of the oxygen atom of the benzene ring of said formula 1 coupled directly. Generally photosensitive resin composition has a photo-polymerizable monomer include hydrocarbon (hydrocarbon) includes an acrylic compound having a core structure is used, said formula 1 compounds such as aromatic compound having a single-core structure not using well. However, hydrocarbon structure includes an acrylic compound having only a photo-polymerizable monomer to core functions, quantum dots including photosensitive resin composition coating on a substrate, exposure, developing capable of color filter process according, door number conversion rate blue light fallen short of reduced flow tides. While, when represented by said formula 1 compound acts as a photo-polymerizable monomer, color filter process continues according to prevent photo-conversion rate can be, quantum dot-containing photosensitive resin composition in said formula 1 compound suitable for use as a photo-polymerizable monomer. For example, compounds represented by the formula 1 - 1 but represented by said formula 1 or formula 1 - 2, the pieces are not correct. [Formula 1 - 1] [Formula 1 - 2] In said formula 1 - 1, L' C1 to C10 which is modified with a substituted or unsubstituted, In said formula 1 - 2, M1 m2 are each independently an integer between 1 and 10. Said photopolymerizable monomer is represented by said formula 1 can be other compound other than a compound, in this case represented by said formula 1% by weight to 40% by weight relative to the total photo-polymerizable monomer compounds said 10 can be included. Range if said compound represented by said formula 1, may have excellent processability and sensitivity. For example, said photopolymerizable monomers are, in addition to the compounds represented by said formula 1 further comprises a compound having a formula 3 can be. [Formula 3] In said formula 3, R1 To R6 Are each independently a hydrogen atom or to a formula 4 is displayed. [Formula 4] the compounds represented by said formula 3 including ethylenically unsaturated double bonds, represented by said formula 4 substituent, pattern forming process cause polymerization a sufficient quantity upon exposure by heat resistance, light resistance and excellent chemical resistance can be pattern. In said formula 3, Said R1 To R6 At least one can be represented by said formula 4 is at least 4. Compounds represented by said formula 3 example, in d pen hit tree [thol di (meta) acrylate, (meth) acrylate in d pen hit tree [thol tree, in d pen hit tree [thol pen hit (meta) acrylate, (meth) acrylate can be a process such as in d pen hit tree [thol, limited to are not correct. In addition, said photopolymerizable monomers are, in addition to the compounds represented by said formula 1 compound and said formula 3 (meta) acrylamide, (meth) acrylamide acid, methoxymethyl (meth) acrylamide, (meth) acrylamide ethoxymethyl, propoxymethyl (meth) acrylamide, (meth) acrylamide-butloxycarbonyl methoxymethyl, acid N - (meta) acrylamide, N - hydroxymethyl (meth) acrylamide, (meth) acrylic acid, fumaric acid, maleic acid, maleic anhydride, itaconic, itaconic anhydride, citraconic sheet, sheet citraconic anhydride, compress , 2 - acrylamide - 2 - methyl propane sulfonic, tert - butyl acrylamide sulfonic acid, methyl (meth) acrylate, ethyl (meth) acrylate, butyl (meth) acrylate, 2 - ethylhexyl (meth) acrylate, cyclohexyl (meth) acrylate, 2 - hydroxyethyl (meth) acrylate, 2 - hydroxypropyl (meta) acrylate, 2 - hydroxy butyric (meta) arc relay, 2 - phenoxy - 2 - hydroxypropyl (meta) acrylate, 2 - (meth) acryloyl oxy - 2 - hydroxypropyl phthalate, glycerin mono (meta) acrylate, dimethylamino (meta) acrylate, glycidyl (meth) acrylate, 2, 2, 2 - trifluoro ethyl (meta) acrylate, 2, 2, 3, 3 - tetra [phul base oro pro it will bloom (meta) acrylate such as ethylene glycol di (meth) acrylate employed compounds and prepared, d ethylene glycol d (meta) acrylate, tetra ethylene glycol d (meta) acrylate, (meta) acrylate paint propylene, poly propylene glycol d (meta) acrylate, butylene (meta) acrylate paint, neopentylglycol di (meta) acrylate, trimethylolpropane tri (meth) acrylate tree, glycerin di (meth) acrylate, pentaerythritol triazole diacrylate, pentaerythritol tetra acrylate, in d pen hit tree [thol pen hit acrylate, pentaerythritol di (meth) acrylate, pentaerythritol tri (meth) acrylate, pentaerythritol tetra (meth) , 2, 2 - bis (4 - (meta) acrylic oxy to d [thok hour phenyl) propane, 2, 2 - bis (4 - (meta) acrylic oxy polyethoxylated stabilizer) propane, 2 - hydroxy - 3 - (meta) acrylic with the jade city which rises profile (meta) acrylate, glycerin triazole dimethylaminoethyl methacrylate, poly (meta) acrylate poly glycerin writing city [til ether, urethane (meth) acrylate (i.e. method for treating), the reaction product of 2 - hydroxyethyl (meta) trimethyl process process, methylene bis (meth) acrylamide, (meth) acrylamide methylene ether, N - (meth) acrylamide such as water-based acid polyhydric alcohol and at least one polyfunctional compound 2 alone or in combination with the condensation can be. Said release more excellent developing a photo-polymerizable monomer for use by treatment with acid anhydride may be filled. Said % by weight to 20% by weight relative to the total photosensitive resin composition said photopolymerizable monomer is 1 can be included, e.g. 3% by weight to 15% by weight can be included. Said range when said photopolymerizable monomer incorporated into, pattern forming process is performed that is superior in pivoting occurs sufficiently cured, alkali developer developing to excellent disclosed. (D) PhotopolymerizationDisclosurenumber Said photosensitive resin composition is typically used as the photopolymerization disclosure number disclosure number, e.g. acetoacetoxy-functional compounds, benzophenone-based compound, the [khu it buys ton orgin thio compounds, benzo phosphorus-based compounds, triazine compound, oxime-based compound, amino ketone orgin compounds and the like can be used. Examples of said lung rice field orgin acetoacetoxy-functional compounds, 2, 2 '- directed to d [thok at the time of α2, 2, 2' - d department [thok city process for α2, 2 - hydroxy - 2 - methyl pro bloom the lung rice field, p-a t - butyl trichloro process for α2, α2 dichloro p-a t - butyl acetoacetoxy-functional, 4 - chloro process for α2, 2, 2 ' - dichloro - 4 - phenoxy process for α2, 2 - methyl - 1 - (4 - (methyl thio) phenyl) - 2 - wool pulley roh propane - 1 - one, 2 - benzyl - 2 - dimethylamino - 1 - (4 - wool pulley roh phenyl) butane - 1 - on - such as is cited. Examples of said benzophenone-based compound, benzophenone, benzoyl iodobenzoic acid, benzoyl iodobenzoic acid methyl, 4 - phenyl benzophenone, hydroxybenzophenone, acrylated benzophenone, 4, 4 '- bis (dimethylamino) benzophenone, 4, 4' - bis (diethylamino) benzophenone, 4, 4 '- dimethylamino benzophenone, 4, 4' - dichloro benzophenone, 3, 3' - dimethyl - 2 - like the maul [thok city it cuts trillion lung rice field is cited. Examples of the [khu it buys ton orgin said thio compounds, thio xanthone, mote oak from ton 2 - methyl, isopropyl thio xanthone, 2, 4 - diethyl thio xanthone, 2, 4 - diisopropyl thio xanthone, 2 - chloro mote oak from ton or the like is cited. Examples of said benzo of a phosphorus compound, for the preparation of an, benzo methyl ether, for the preparation of an ethyl ether, isopropyl ether for the preparation of an, for the preparation of an isobutyl ether, benzyl d methyl [khey mask or the like is cited. Examples of said triazine compound, 2, 4, 6 - trichloro - s - triazine, 2 - phenyl - 4, 6 - bis (trichloromethyl) - s - triazine, 2 - (3 ', 4' - ) - 4, 6 - bis (trichloromethyl) - s - triazine, 2 - (4' - the maul [thok it is sour but the [phu) - 4, 6 - bis (trichloromethyl) - s - triazine, 2 - (p - methoxyphenyl) - 4, 6 - bis (trichloromethyl) - s - triazine, 2 - (p - tolyl) - 4, 6 - bis (trichloro methyl) - s - triazine, 2 - biphenyl - 4, 6 - bis (trichloro methyl) - s - triazine, bis (trichloromethyl) - 6 - styryl - s - triazine, 2 - (naphtho - 1 - yl) - 4, 6 - bis (trichloromethyl) - s - triazine, 2 - (4 - the maul [thok it is sour but the [phu toe - 1 - yl) - 4, 6 - bis (trichloromethyl) - s - triazine, 2 - 4 - bis (trichloromethyl) - s - triazine - 6 - piperidinyl fipronil, 2 - 4 - bis (trichloromethyl) - 6 - (4 - ) - s - triazine or the like is cited. Examples of said oxime compound O - compound, 2 - [4 - (phenylthio) phenyl] - 1 - (O - benzoyl oxime) - 1, 2 - octane dione, 1 - (O - acetyl oxime) - 1 - [9 - ethyl - 6 - (2 - methyl benzoyl) - 9H - carbazole - 3 - yl] ethane on, O - ethoxycarbonyl - 1 - phenyl propane - 1 - on - α - oxy amino can be user information. Said O - compound of the specific example, 1, 2 - octane dione, 2 - dimethylamino - 2 - (4 - methylbenzyl) - 1 - (4 - morpholin - 4 - yl - phenyl) - butane - 1 - one, 1 - (4 - phenylsulfanyl-phenyl phenyl) - butane - 1, 2 - dione - 2 - oxime - O - benzoate, 1 - (4 - phenylsulfanyl-phenyl phenyl) - 1, 2 - dione - 2 - oxime - O - benzoate - octane, 1 - (4 - phenylsulfanyl-phenyl phenyl) - octane - 1 - it comes the jade core - O - acetate, 1 - (4 - phenylsulfanyl-phenyl phenyl) - butane - 1 - it comes the jade core - O - acetate or the like is cited. 2 - Benzyl - 2 - dimethylamino - 1 - examples of said amino ketone orgin compounds (4 - wool pulley roh phenyl) - butane on -1 (2 a-Benzyl-a 2 a-dimethylamino-a 1 - (4 a-morpholinophenyl) - butanone-a 1) or the like is cited. Preferably said disclosure number is said compound in addition cover neck of compound, diketone ton type compounds, sulfonium borate-based compounds, diazo compounds, imidazole-based compound, bead compounds and the like can be used. Said disclosure number is preferably placed after the released state and the energy thereof by transferring number for use with photosensitizing chemical reaction causing disapproval. Examples of said photosensitizing dyes are number, tetra ethylene glycol bis - 3 - propionate, pentaerythritol tetrakis - 3 - propionate, tetrakis - 3 - like in d pen hit tree [thol propionate is cited. Said photosensitive resin composition comprising the photopolymerization disclosure number 0 is the synthetic fiber. 1% By weight to 5% by weight, e.g. 0. 1% By weight to 3% by weight can be included. When photopolymerization is incorporated into said range disclosure number, pattern forming process in curing process is performed sufficiently up for excellent reliability can be obtained, pattern heat resistance, light resistance, chemical resistance, superior resolution and adhesion, due to unreacted disclosure number of preventing transmittance thereof can. (E) Thiol (thiol) based Number added Said quantum dot stability and to enhance dispersibility, in one implementation according to photosensitive resin composition further comprises adding number mote this year orgin. Adding said number has been substituted mote this year orgin surface shell of said quantum dots, quantum dots in high-temperature heat resistance enhancing solvent quantum dot dispersion stability can be improved. Adding said mote this year orgin number 2 has a curved structure 10 according end two atoms, e.g. 2 4 (- SH) may have a molecular weight of atoms. For example, a functional group represented by formula 5 mote this year orgin number is added to said end including at least one can be at least 2. [Formula 5] In said formula 5, L4 And L5 Are each independently single bond, a C1 to C20 substituted or unsubstituted alkylene, substituted or unsubstituted C3 to C20 alkyl [leyn a cycle, a C6 to C20 substituted or unsubstituted C2 to C20 substituted or unsubstituted heteroaryl or a substituted or it will be biting, [leyn it will be biting, [leyn among others. For example, formula 6 is indicated to be mote this year orgin said number is added. [Formula 6] In said formula 6, L4 And L5 Are each independently single bond, a C1 to C20 substituted or unsubstituted alkylene, substituted or unsubstituted C3 to C20 alkyl [leyn a cycle, a C6 to C20 substituted or unsubstituted C2 to C20 substituted or unsubstituted heteroaryl or a substituted or it will be biting, [leyn it will be biting, [leyn strangeness, U1 u2 are each independently 0 or an integer and 1. For example, in formula 6 and said formula 5, said L4 And L5 A C1 to C20 alkyl [leyn fixed date is used in a single bond or a substituted or unsubstituted be. Said specific number added to formula 7a mote this year orgin examples represented in pen hit tree [thol tetra kissing (3 - ) (pentaerythritol tetrakis (3 a-mercaptopropionate)), represented by the formula 7b to trimethylolpropane tris (3 - ) (trimethylolpropane tris (3 a-mercaptopropionate)), pentaerythritol tetrakis (mercaptoacetate) represented by the formula 7c to Pentaerythritol tetrakis ([me cop toe acetate), represented by formula 7d to trimethylolpropane tris (2 - [me cop toe acetate) (trimethylolpropane tris (2 a-mercaptoacetate)), represented by formula 7e to propylene glycol di - 3 - (Glycol di-a 3 a-mercaptopropionate) and combination thereof any one selected from the group consisting is cited. [Formula 7a] [Formula 7b] [Formula 7c] [Formula 7d] [Formula 7e] Said number is 1% by weight to 10% by weight relative to the total photosensitive resin composition added mote this year orgin, e.g. 1% by weight to 5% by weight can be included. Less than 1% by weight is added mote this year orgin number encoded in, and the waste is used, 10% by weight and above its separator pattern encoded in photosensitive resin composition, can be time-varying occurs at room temperature. (F) solvent Said solvent is compatible solvent and adding said quantum dots having said mote this year orgin number, said binder resin, a photo-polymerizable monomer and said disclosure number has a reverse compatibility with said photopolymerization, the unreacted materials can be used. Examples of said quantum dots having compatible solvent, pentane, hexane, heptane or the like an alkanolamine such as current (R a-H); toluene, aromatic hydrocarbons such as xylene (Ar a-H); dee child wheat ether, dibutyl ether, ethylene glycol dimethyl ether such as ether (R a-O-a R); chloroform, trichloro methane such as alkyl halide (R a-X) is opioids clinically; cyclopropane, butane 1, cyclopentane, current cycloalkanes such as cyclohexane; acetate, hexyl acetate, cyclohexyl acetate such as acetate current; it can be alkyl ketones such as methyl isobutyl ketone etc., limited to are not correct. Adding said number mote this year orgin, said binder resin, a photo-polymerizable monomer and said disclosure number examples of solvents having compatibility with said photopolymerization, methanol, alcohol such as ethanol; dichloro ethyl ether, n - monobutyl ether, dee child wheat ether, methyl phenyl ether, tetra draw [phyu column such as ether; ethylene glycol monomethyl ether, ethylene glycol monoalkyl ethers such as ethyl ether glycol ethers; it will count with brush [pu methyl acetate, ethyl it will count with brush [pu acetate, diethyl it will count with brush [pu acetate such as it will count with brush [pu acetate current; methyl ethyl carboxylic expense [thol, expense [thol diethyl, diethylene glycol monomethyl ether, diethylene glycol mono ethyl ether, diethylene glycol dimethyl ether, diethylene glycol methyl ethyl ether, diethylene glycol such as carboxylic expense [thol type d ethyl ether; propylene glycol monomethyl ether acetate, propylene glycol propyl ether acetate such as propylene glycol alkyl ether acetate current; toluene, O-xylene aromatic hydrocarbons; methyl ethyl ketone, cyclohexanone 1, 4 - hydroxy - 4 - methyl - 2 - pentanone, methyl - n - propyl ketone, methyl butyl ketone - n -, methyl - n - oh wheat ketone, 2 - [heyp other rice field such as ketones; ethyl acetate, acetic acid - n - butyl, isobutyl acetate such as saturated aliphatic monocarboxylic acid alkyl esters; lactic acid methyl, ethyl lactic acid such as lactic acid esters; oxy acetic methyl, oxy acetic acid ethyl, oxy acetic acid alkyl esters such as oxy butyl acetate; methoxy acetic methyl, methoxy acetic acid ethyl, butyl acetate methoxy, ethoxy acetic methyl, alkoxy acetic acid alkyl esters such as ethyl ethoxy acetic acid; 3 - oxy propionic acid methyl, 3 - oxy propionic acid alkyl esters of 3 - phenylpropionic acid ethyl oxy; 3 - methoxy methyl propionic acid, 3 - phenylpropionic acid ethyl methoxy, ethoxy 3 - phenylpropionic acid ethyl, 3 - ethoxy propionic acid alkyl esters such as methyl 3 - alkoxy propionic acid; 2 - oxy propionic acid methyl, 2 - oxy acid ethyl, propyl 2 - oxy propionic acid alkyl esters such as 2 - oxy propionic acid; 2 - methoxy propionic acid methyl, 2 - phenylpropionic acid ethyl methoxy, 2 - phenylpropionic acid ethyl ethoxy, 2 - ethoxy propionic acid alkyl esters such as methyl 2 - alkoxy propionic acid; 2 - oxy - 2 - methyl propionic acid methyl, methyl 2 - oxy - 2 - methyl propionic acid esters such as 2 - oxy - 2 - phenylpropionic acid ethyl, 2 - methoxy - 2 - methyl propionic acid methyl, 2 - ethoxy - 2 - methyl propionic acid 2 - alkoxy - 2 - phenylpropionic acid ethyl methyl oxy monocarboxylic acid alkyl esters of mono alkyl or the like; 2 - hydroxypropionic acid ethyl, 2 - hydroxy - 2 - methyl propionic acid ethyl, hydroxy acetic acid ethyl, 2 - hydroxy - 3 - methyl butanic acid esters such as methyl; blood base empty mountain such as ethyl ketone acid esters and the like and, in addition, N - methyl formamide, N, N - dimethyl formamide, methyl N - the lard which will not be a gun roentgen per hour at one meter, N - methylacetamide, N, N - dimethylacetamide, N - methylpyrrolidone, dimethyl sulfoxide, benzyl ethyl ether, d [heyk thread ether, acetyl acetone, isophorone, capric acid theory it buys, the acids are capric acid, 1 - octanol, 1 - nonanol, benzyl alcohol, benzyl acetate, ethyl iodobenzoic acid, oxalic acid diethyl, maleic acid diethyl, γ - butyrolactone, ethylene carbonate, propylene carbonate, boiling point solvent such as it will count with brush [pu phenyl acetate is cited. Among these good compatible and reactive taking into account preferably, glycol ethers such as ethylene glycol mono ethyl ether; it will count with brush [pu ethyl acetate such as ethylene glycol alkyl ether acetate current; 2 - hydroxypropionic acid ethyl such as esters; diethylene glycol monomethyl ether of carboxylic expense [thol type; propylene glycol monomethyl ether acetate, propylene glycol propyl ether acetate such as propylene glycol alkyl ether acetate current can be used. Said solvent is photosensitive resin composition the synthetic fiber cup department quantity, for example 30% by weight to 80% by weight, for example 40% by weight to 75% by weight can be included. When photosensitive resin composition has an appropriate viscosity solvent incorporated into said range according to color filter number integer from 2 to 1,000. processability during tank. (G) Number diffusion (Or Number diffusion Dispersion) In one implementation according to photosensitive resin composition further comprises diffusion number can be. For example, in one implementation according to said diffusion number number dispersion further comprises photosensitive resin composition can be dispersed diffusion. Said diffusion is formed on the organic solvent such as PGMEA grudge without special number distributed dispersed number if available disclosed. For example, said diffusion number is barium sulfate (BaSO4 ), Calcium carbonate (CaCO3 ), Titanium dioxide (TiO2 ), Zirconia (ZrO2 ) Or combinations thereof can be. Said diffusion number is performed without such a light converting material and reflects the light beam, said reflected a light conversion material capable of absorbing diffuse to again. I.e., a light conversion material number said diffusion light are absorbed by the capacitors, photosensitive resin composition can be photo-conversion at a low temperature. I.e., color filter process continues according to a predetermined conversion rate of blue light, the role of the aforementioned formula 1 compound can be assist. Said diffusion is number mean particle diameter (D50 ) Is 150 nm to 250 nm and can, specifically 180 nm to 230 nm implementation being. An average particle diameter of said constituent esters when said diffusion number, than may have good light spread effects, light conversion efficiency can be increased. Said diffusion number, specifically said solids content of said photosensitive resin composition the synthetic fiber diffusion number 0. 5% By weight to 10% by weight, for example 1% by weight to 8% by weight can be included. Said diffusion number is said photosensitive resin composition the synthetic fiber 0. 5% By weight less than encoded in, diffusion using photo-conversion rate according to centrifugal force while the number comprises a styrofoam, greater than 10% by weight when the surface color filter pattern, the resulting decrease in optically convert to be coated. I.e., said diffusion number 2 for the total photosensitive resin composition said dispersion. 5 Weight % to 50 weight %, e.g. 5% by weight to 40% by weight can be included. (H) other added number In one implementation according to photosensitive resin composition malonic acid; 3 - amino - 1, 2 - propanediol; silane coupling number; leveling number; number fluorine-based surfactants; or a combination thereof can be further. For example, a photo-like photosensitive resin composition in order to improve the vinyl group, carboxyl group, meta [khu reel jade time, at the time of knows sprouting, isocyanate, epoxy silane coupling further includes a number of reactive substituents can be. Examples of said silane coupling number, tree benzoic acid, γ - methacrylic oxy propyl trimethoxysilane, vinyl triazole tax [thok it will be sour, column, vinyl trimethoxysilane, γ - isocyanate propyl tree [thok it will be sour, column, writing hour killing by poison γ - propyl trimethoxysilane, β - (3, 4 - epoxy gap claw [heyk thread) ethyl the tree maul [thok it will be sour, column can be a bearing, alone or in combination with at least one 2 them can be mixed. Said photosensitive resin composition 100 parts by weight of a silane coupling said number is 0. 01 Parts by weight to 10 parts by weight can be. Silane coupling number when said range is incorporated into adhesion, storage excellent disclosed. In addition said photosensitive resin composition number surfactants for prevention effect generating needed coatable enhancement and defects, e.g. fluorine-based surfactants can be further includes a number. Fluorine-based surfactants include said number, of BM-a 1000 BM Chemie ® , BM-a 1100 ® Such as; [ing height [nis phone-ROM pack F 142D paid amounting (main) of die ® , Copper F 172 ® , Copper F 173 ® , Copper F 183 ® Such as; [su american toe wool container for m (main) lard FC provided 135 's profile ® , Copper FC provided 170C ® , Copper FC-a 430 ® , Copper FC-a 431 ® Such as; it buys the [phu asahi manufacturing method of magnetron S provided 112 (main) ® , Copper S provided 113 ® , Copper S provided 131 ® , Copper S provided 141 ® , Copper S provided 145 ® Such as; silicon (main) of SH-a 28PA ® , Copper -190 ® , Copper -193 ® , SZ-a 6032 ® , SF-a 8428 ® Such as; (main) of DIC F provided 482, F-a 484, F provided 478, fluorine-based surfactants such as the ball chain lever called the number F-a 554 can be using. Said photosensitive resin composition 100 parts by weight of said fluorine-based surfactant number is 0. 001 Weight 5 parts by weight can be used. Fluorine-based surfactants incorporated into said range when said number coating uniformity is ensured, which does not easily generate unevenness, integer from 2 to 1,000. substrate and a wettable (wetting). In addition said photosensitive resin composition properties within a range that does not anti-oxidation number, number of other added when the added number stable disapproval. Another implementation relates the aforementioned photosensitive resin compositions can be used to color filter prepared by the number number substrate. Said color filter number bath method as follows. (1) Coating and coating film formation step Etherification of the aforementioned photosensitive resin composition formed on a substrate of a spin or slit coat method, roll coat method, screen printing method, the [e pulley kater law method such as using a desired thickness, e.g. a thickness of 9 to 10 micro m after applying the micro m, 1 to about 10 minutes at a temperature of about 100 °C heated solvent number by a stand-alone coating formed on the substrate. (2) Exposure step Said coating film obtained in order to produce a desired pattern formed on the mask of predetermined shapes after, 200 nm to 500 nm active irradiation substrate. It utility in the examination of low pressure mercury light source, high-pressure mercury, super high pressure mercury lamp, metal halide lamp, argon gas laser etc. can be, if desired the X ray, electron beam or the like can be also by using. Type of exposure amount is said photosensitive resin composition components, different but along the blended amount and drying the film thickness, e.g. when using high pressure mercury 500 mJ/cm2 Hereinafter (365 nm by sensor) are disclosed. (3) Rear Said exposure step is followed by, unnecessary parts by utilizing the dissolved alkaline aqueous solution developer, a stand-alone number stage along Image pattern portion of the reaction chamber. (4) Post-processing steps Said phenomenon picture pattern obtained by heat resistance, light resistance, adhesion, cracking resistance, chemical resistance, high strength, it is possible to obtain excellent storage stability for, curing by irradiation for heating or the like can be active again. By using the aforementioned photosensitive resin composition, said coating and coating film formation step, exposure step, developed, capable according to post-processing steps such as photo-conversion rate can be minimizes. Hereinafter, of the present invention preferred embodiment are described substrate. But, in the embodiment of the present invention is provided to form a one preferred one in the embodiment, the present invention defined by portion in which in the embodiment are not correct. (Photosensitive resin composition number bath) In the embodiment 1 To In the embodiment 12, Comparison example 1 And Comparison example 2 Table 1 and table 2 for the components referred to in the embodiment 1 shown in each composition using to in the embodiment 12, 2 according to comparison example 1 and comparison example number photosensitive resin composition was high pressure liquid coolant. Specifically, after disclosure number held between the dissolving solvent, stirring at room temperature 2 sufficiently time-gate. Then, a photo-polymerizable monomer acrylic resin as a component which can be quantum dots together, 2 hours stirring at room temperature back-gate. Mote this year orgin herein added number, number in TiO diffusion2 Adding a fluorine-based surfactant dispersed diffusion number dispersion and number, 1 hours stirring at room temperature, said filtering impurities by a stand-alone product 3 times number, number photosensitive resin composition was high pressure liquid coolant. (A) Quantum dots (A provided 1) InP/ZnSe/ZnS quantum dots (fluorescence λEm =530nm, FWHM=45nm, Green QD, one brush chemical ) (A provided 2) InP/ZnS quantum dots (fluorescence λEm =630nm, FWHM=45nm, Red QD, one brush chemical ) (B) binder resin (B provided 1) acrylic binder resin (SM-a CRB-a 400H, SMS ) (B provided 2) (V259ME, NSCC ) binder resin (C) Photopolymerizable Monomer For compounds of formula A (C-a 1) (poly net magnetron ) [Formula A] (C provided 2) compound to formula B (Osaka gas chemical ) [Formula B] (American circle at the top dead center) to compounds of formula C (C-a 3) [Formula C] (In said formula C, A and b are each on the same integer or being resized and hereinafter, 10. a + b is an integer) (C provided 4) tree [thol it buys in d pen hit arc relay [thu (Japanese explosive ) (D) PhotopolymerizationDisclosurenumber (D provided 1) oxime-based disclosure number (PBG-a 305, Tronyl ) (D provided 2) amino ketone orgin disclosure number (IRG-a 369, BASF ) (E) solvent Propylene glycol monomethyl ether acetate (PGMEA) (E-a 1) Ethylene glycol dimethyl ether (EDM) (E provided 2) (F) Mote this year orgin Number added Glycol di - 3 - (THIOCURE ® GDMP, BRUNO BOCK ) (G) Number diffusion Dispersion Titanium dioxide dispersion (TiO2 Solids 20 weight % in PGMEA, average particle diameter: 200 nm, Aldrich ) (H) other added number Fluorine-based surfactants (F-a 554, DIC ) number Evaluation: blue in every process step Conversion rate and Optical retention evaluation In the embodiment 1 to in the embodiment 12, in comparison example 1 and comparison example 2 photosensitive resin composition prepared by the number each spin coating on the glass substrate to a thickness of 10 micro m ( Mikasa, Opticoat MS provided A150, 150 rpm) using one act heated, hot plate (hot-a plate) in 2 minutes using 100 °C pre - baking (pre-a baking; PRB) whereby, initial blue light conversion rate were measured. Exposer ( Ushio, ghi broadband) using 60 mJ/cm2 To 100 mJ/cm2 And then the output (power) UV, blue light exposure step conversion rate were measured. (Jongro ㈜) then in convection clean oven 180 °C, 30 minutes post - baking is performed (post-a baking; POB), blue light conversion rate were measured. Pre - bake stages, exposure step, the bake stages for each post -, green to blue light incident from BLU evaluated photo-conversion rate and retention, to the result of table 3, table 4 and 1 to 6 also shown to also. (Also 1 to Figure 3 shows a also in the embodiment 1 and comparison example 1 according to photosensitive resin composition color filter in every process step light converting filtered graph and, also 4 to 6 is in the embodiment 7 and comparison example 2 according to photosensitive resin composition color filter in every process step light converting filtered graph are disclosed.) The blue light conversion rate measurements may have CAS 140 CT spectrometer measuring equipment, which is covered with a diffusing film is measured with a reference detector and blue BLU bare glass on placing the following first holds, in the embodiment 12 in location as the to in the embodiment 1, a comparison example 1 and comparison example 2 according to photosensitive resin composition coated plate is connected to the one act, a decrease amount of contrast green (or red) peak potential of converted into blue light absorption peak calculated by, photo-conversion rate (Green/Blue, Red/Blue) were measured. In addition, in the second photo-conversion rate in initial PRB POB whether how maintained, i.e. PRB POB in proceeds in an optical retention required for a long time together. According to color (Color) can be greater than maximum twice since POB process (for example, green quantum dot containing photosensitive resin composition first patterning when, red quantum dot containing photosensitive resin composition when then be patterned, such as by ten past records subjected to POB process), the same method to process additional items of an POB blue light conversion rate were measured. Said table 3, table 4 to 1 as in Figure 6 the and also, in the embodiment 1 in the embodiment 12 according to comparison example 1 and comparison example 2 according to photosensitive resin composition compared to photosensitive resin composition, color filter process continues according to blue light conversion rate is less, high optical retention can confirm it. Therefrom, including photopolymerized monomer represented by said formula 1 compounds when used, color filter in every process step up conversion rate blue light, light retention can be effectively installed in cylindrical. The present invention refers to said in the embodiment are different but limited to number tank can be in various forms, in the present invention is technical idea of the present invention is provided to essential features or person with skill in the art without changing other specific embodiment can form can be understand are disclosed. In the embodiment described above the exemplary non-limiting all sides are understood to which must substrate. The present invention relates to a photosensitive resin composition, comprising: (A) quantum dots; (B) a binder resin; (C) a photopolymerizable monomer containing a compound represented by the following chemical formula 1; (D) a photopolymerization initiator; (E) thiol-based additives; and (F) a solvent, and a color filter using the same. Accordingly, the present invention can minimize the deterioration of the optical conversion rate. In chemical formula 1, each substituent is defined in the specification. (A) quantum dot; (B) binder resin; (C) to compounds represented by formula 1 and formula 3 to compound including a photo-polymerizable monomer; photopolymerization disclosure number (D); (E) thiol (thiol) based added number; and (F) solvent including photosensitive resin composition: [formula 1] In said formula 1, L1 And L2 Are each independently single bond, a substituted or unsubstituted C1 to C20 alkylene represented by formula 2 and to, [formula 2] In said formula 2, L3 A substituted or unsubstituted C1 to C5 is modified, n is integer number of 1 to 10, of the oxygen atom of the benzene ring is directly bonded to said formula 2 of said formula 1, [formula 3] In said formula 3, R1 To R6 Are each independently a hydrogen atom or to a formula 4 is displayed. [Formula 4] According to Claim 1, represented by said formula 1 10% by weight to 40% by weight relative to the total photo-polymerizable monomer compounds said compound having at least one photosensitive resin composition. Back number According to Claim 1, said 360 nm to 780 nm of wavelength range of light by absorbing the quantum dots, in detecting the fluorescence wavelength region of 450 nm to 700 nm which emits photosensitive resin composition. According to Claim 4, maximum fluorescence wavelength 450 nm to 580 nm said quantum dots (fluorescence λEm ) 580 Nm to 700 nm having a maximum fluorescence wavelength or quantum dots (fluorescence λEm ) Quantum dots having including photosensitive resin composition. According to Claim 1, at least 2 functional group represented by formula 5 mote this year orgin number is added to said at least one end including photosensitive resin composition: [formula 5] In said formula 5, L4 And L5 Are each independently single bond, a C1 to C20 substituted or unsubstituted alkylene, substituted or unsubstituted C3 to C20 alkyl [leyn a cycle, a C6 to C20 substituted or unsubstituted C2 to C20 substituted or unsubstituted heteroaryl or a substituted or it will be biting, [leyn it will be biting, [leyn among others. According to Claim 1, further including said photosensitive resin composition (G) diffusion number photosensitive resin composition. According to Claim 7, said diffusion number is barium sulfate, calcium carbonate, titanium dioxide, zirconia or a combination thereof including photosensitive resin composition. According to Claim 8, said diffusion number is said photosensitive resin composition the synthetic fiber 0. 5% By weight to 10% by weight compound having at least one photosensitive resin composition. According to Claim 1, 1% by weight to 30% by weight said quantum dots (A); 1% by weight to 30% by weight of said binder resin (B); 1% by weight to 20% by weight of said (C) a photo-polymerizable monomer; (D) said photopolymerization disclosure number 0. 1% By weight to 5% by weight; said number 1 weight % to 10 weight % based added thiol (thiol) (E); and said solvent (F) including photosensitive resin composition. According to Claim 1, said photosensitive resin composition malonic acid; 3 - amino - 1, 2 - propanediol; silane coupling number; leveling number; number fluorine-based surfactants; or a combination thereof further including photosensitive resin composition. Anti number 1, number 2 term and any one of Claim 4 to Claim 11 color filter prepared by the number using photosensitive resin composition. In the embodiment 1 In the embodiment 2 In the embodiment 3 In the embodiment 4 In the embodiment 5 In the embodiment 6 Comparison example 1 (A) quantum dots (A provided 1) 10. 6 10. 6 10. 6 10. 6 10. 6 10. 6 10. 6 (A provided 2) - - - - - - - (B) binder resin (B provided 1) 7 7 7 7 7 7 7 (C) a photo-polymerizable monomer (C provided 1) 1 2 - - - - - (C provided 2) - - 1 1. 5 - - - (C provided 3) - - - - 0. 5 2 - (C provided 4) 4 3 4 3. 5 4. 5 3 5 (D) disclosurenumber photopolymerization (D provided 1) 0. 2 0. 2 0. 2 0. 2 0. 2 0. 2 0. 2 (D provided 2) 0. 2 0. 2 0. 2 0. 2 0. 2 0. 2 0. 2 (E) added mote this year orgin number 1. 8 1. 8 1. 8 1. 8 1. 8 1. 8 1. 8 (F) solvent (E provided 1) 40 40 40 40 40 40 40 (E provided 2) 20 20 20 20 20 20 20 (G) diffusion number dispersion 15 15 15 15 15 15 15 (H) other added number 0. 2 0. 2 0. 2 0. 2 0. 2 0. 2 0. 2 Total 100 100 100 100 100 100 100 In the embodiment 7 In the embodiment 8 In the embodiment 9 In the embodiment 10 In the embodiment 11 In the embodiment 12 Comparison example 2 (A) quantum dots (A provided 1) - - - - - - - (A provided 2) 6 6 6 6 6 6 6 (B) binder resin (B provided 2) 7. 4 7. 4 7. 4 7. 4 7. 4 7. 4 7. 4 (C) a photo-polymerizable monomer (C provided 1) 1 2 - - - - - (C provided 2) - - 1 1. 5 - - - (C provided 3) - - - - 0. 5 2 - (C provided 4) 4 3 4 3. 5 4. 5 3 5 (D) disclosurenumber photopolymerization (D provided 1) 0. 2 0. 2 0. 2 0. 2 0. 2 0. 2 0. 2 (D provided 2) 0. 2 0. 2 0. 2 0. 2 0. 2 0. 2 0. 2 (E) added mote this year orgin number 2 2 2 2 2 2 2 (F) solvent (E provided 1) 42 42 42 42 42 42 42 (E provided 2) 22 22 22 22 22 22 22 (G) diffusion number dispersion 15 15 15 15 15 15 15 (H) other added number 0. 2 0. 2 0. 2 0. 2 0. 2 0. 2 0. 2 Process In the embodiment 1 In the embodiment 2 In the embodiment 3 In the embodiment 4 In the embodiment 5 In the embodiment 6 Comparison example 1 Blue light conversion rate PRB step 31 30 31 30 31 30 33 Exposure step 31 30 31 30 30 29 31 POB step 26 25 26 24 25 24 23 Optical retention 55 82 83 82 80 80 69 Process In the embodiment 7 In the embodiment 8 In the embodiment 9 In the embodiment 10 In the embodiment 11 In the embodiment 12 Comparison example 2 Blue light conversion rate PRB step 27 26 27 26 27 26 27 Exposure step 25 24 26 25 25 24 25 POB step 15 14 15 14 15 14 13 Optical retention 55 54 55 54 55 54 49
