대기압 유전체 장벽 방전 플라즈마를 이용한 이차전지의 분리막 처리 방법

Atmospheric pressure dielectric barrier discharge plasma ball number encoded selective surface treatment process. Specifically, plasma using a source of secondary retardant film (separator film) surface treatment process (selective surface treatment process) selectively processing method number is looked into. Said dielectric barrier discharge (Dielectric barrier discharge: DBD) plasma source is atmospheric pressure (atmospheric-a pressure) in construction, locally forming a plasma mask and local pressures number used for a module.

Selective surface processing process by selectively number (hydrophilic) adhesive force between the floating battery electrode, electrolyte (electrolyte) into the other electrode, defining a pore number secondary battery can be inserted.

The present invention refers to plasma source are installed in a space selectivity number mask. Said mask to mask (plasma powered electrode) plasma power electrode area by means of masking (masked area) and a substantially unobstructed open with the frame. The processing region supporting said mask substantially coextensive with the potential subject (equipotential) according to user selection with each other. In masked area, mask and a reactor (secondary retardant film) is eliminated and the potential difference between, transition region effectively prevented and generating plasma, plasma processing method capable of selective space number substrate.

An open area of a reactor (hydrophilic processing) said treatment plasma processing region into the slide groove. Plasma reactor plasma region is formed by a reactor-activated species by said selectively hydrophilic processing as follows. Battery electrode can be used in water-holding layer. However, the active region of one or two surfaces so that said hydrophilic all, electrolyte performance can be significantly reduced. Thus, in the embodiment according to one of the present invention selective dielectric barrier discharge plasma processing generally comprises adhesion increase electrolyte can be simultaneously improving performance. Said hydrophilic treatment area to total area comparing 50 percent Wednesday 80 be performed. Increased adhesion along said hydrophilic processing area increases but, week misfortune royal favor can be reduced.

On the other hand, in the area of the plasma processing for injecting an inert gas or reaction gas has a relatively high pressure due to the untreated area comparing. In the absence of injecting an inert gas into, reduces the articles by discharge stability. Plasma-activated species (radicals) are diffusion voltage is supplied to the non-processing region indirect application, capable of selective treatment performance. , the possibility of shining and indistinctness hydrophilic processing region boundary of the processing area, can be spatially hydrophilic processing degree are gradually reduced. The, electrolyte implantation process stability can be reduced. The, non-processing region of the processing area is reduced and the fourth reactor needs to be disclosed. In order to solve the same, non-treatment area to selectively into the surface of a reactor of said inert gas, non-processing region prevented interference caused by penetration of active species, selective plasma processing performance can be remarkably improved. I.e., non of the processing area pressure higher than that of the processing area growth direction, non-processing region in a processing region setting compared to flow an inert gas, and a non-processing can be narrowed and the interfacial area of the processing area. In this alternative plasma surface treatment can be performed by linear dielectric barrier discharge source.

Such a selection plasma treatment process secondary battery to apply processing plasma suface treatment device of attaining further pore number storage unit only selective surface treatment such as a disclosed. In addition, selective surface treatment by plasma surface treatment of minerals with electrolyte performance by a circulation pump capable of attaining. The, productivity can be significantly improved pore-defined number.

Dielectric barrier discharge plasma source by conventional laser or article number by scratching the film layer can be. Plasma source dielectric barrier layer formed on a locally accumulated charges the high electric field at high current densities of arc generation reaction chamber. The charge storage dielectric layer on a dielectric barrier discharge (DBD) current flow in an outer dielectric surface charge (Surface accumulated charge) are disclosed. The, arc discharge film damage caused can be operating. This arc discharge is the same as the second occurs continuously such that it distinguishes a, and spiking solution offers memory number billion are disclosed.

The high electric field locally dielectric barrier layer due to damage micro of ceramic surfaces is formed, along the high current densities of arc generation can be insulated. Dielectric barrier material surface damage in cases of increased well.

Of the existing method (memory charge) or by arc generation surface charge storage dielectric barrier discharge type directly charge number exists in the stable amorphous silicon has a point. In addition, difference discharge (Afterglow) 2 using indirect dielectric barrier discharge when, injection flow rate uniformity being molded surface treatment space uniformity compared disclosed. Afterglow directly using indirect scheme is automatically has a low productivity.

In the embodiment according to one of the present invention dielectric barrier discharge plasma generating device is 1) in such a capture or a surface charge, direct DBD type has high productivity, through Afterglow productivity and uniformity of the base.

In the embodiment according to plasma generating device in one of the present invention, susceptor (Susceptor) by voltage application electrode away distance between dielectric barrier layer surface is discharged plasma, fast discharge (afterglow) 2 by said fluid flow difference by exposed surfaces can be disposed on a susceptor treated hydrophilic processing.

Hereinafter, a detailed drawing of the present invention preferred embodiment appended reference to less than 1000. Advantages and features of the present invention, achieve the appended drawing method and an electronic component together with specifically carry reference is the activitycopyright will in the embodiment. However in the embodiment described herein the present invention refers to a limited to different but are embodied in the form disapproval. Rather, the disclosure is introduced in the embodiment wherein the contents of the present invention to one skilled in the event can be calculated and complete and for allowing a target ball which can be transmitted sufficiently in order to number, defined by category of the present invention refers to claim only disclosed.

The same references refer to the same components across special specification. The, same references or similar references are read pipeline or drawing was not described, can be described with reference to another drawing. In addition, references is displayed was not, other drawing reference can be described.

In the embodiment according to Figure 1 of the present invention exhibits one layer dielectric barrier discharge plasma processing system.

1 Also reference surface, said dielectric barrier discharge plasma processing system (10) separator film wound into the form of a roll (22), said membrane film transfer roller (90), and said hydrophilic film separator plate and transporting a plasma processing device (100) can be a. 1308. Ball number hydrophilic processing separation film film is returning process. Said plasma device (100) can be among the plurality. One plasma device is said to have one aspect of line pattern layer film hydrophilic processing, the other plasma device is again line pattern layer film can be said to have hydrophilic processing. When it burns, heat by said hydrophilic treatment can be performed sequentially.

Typically, electrochemical element in cell (Battery) the crisis which becomes just used (22) call must be electrically isolated electrodes, said electrodes of a certain amount or more between ion conductivity should other. Thus, the cell (Battery) the crisis which becomes it closed ion transmittance is satisfactory system used high mechanical strength, for example, battery electrolyte is installed on an upper thin porous insulator material consisting of steel material and good long-term stability. In these batteries, electric separator are permanently resilient and must, in system arranged in, for example, movement in an electrode pack (pack) schedules quite other. Water-soluble electrolytic Ni-a MH secondary battery environment-friendly battery is by using a plurality of pixels must be alkali aqueous electrolyte with alkali, in addition diameter may also should provide the reactive part between the number. Said Ni-a MH secondary battery such patterns as polyimid polyolefin polymer material, due to the hydrophobic properties a water-soluble alkali electrolyte has no affinity for the Ni-a MH secondary battery right inoperative for applying should essentially involved in the process. Such a hydrophilization treatment process include dielectric barrier plasma processing can be used.

On the other hand, film on one side both hydrophilic treatment layer, adhesion can be improved but, electrolyte speed is reduced and the failure is increased substrate. The, said hydrophilic control layer film is selectively etched. On the other hand, layer (22) in order to prevent the sides of the release status portion can be hydrophilic processing.

In the embodiment of the present invention according to one, space plasma contact with hydrophilic processing number looked into. Local plasma water-friendly abruptly varies according to the position degree need to be disclosed. The width of the border region and the possibility of shining implementation being hereinafter 1 millimeter long distance hydrophilic treatment area. Hydrophilic treated line pattern width and adjacent hydrophilic processing line of the pattern (feature zero region width) and defect affecting electrolyte injection speed can be.

In the embodiment according to one of the present invention, 5 millimeters to 40 millimeters and the width of the hydrophilic treatment area, the possibility of shining be a 5 millimeter to 40 millimeters width of the processing area. Preferably, the possibility of shining said width of the processing area be a 5 millimeter to 20 millimeters.

Figure 2 shows a general outline of the present invention also one in the embodiment according to plasma and an electrode layer lining describing process are disclosed.

Figure 3 shows a I a-I ' 16 along a line cross-sectional drawing of Figure 2 are disclosed.

Figure 4 shows a II a-II ' 16 along a line cross-sectional drawing of Figure 2 are disclosed.

Figure 5 shows a cross-section also returning the resultant electrode assembly described are disclosed,

Figure 6 shows a cross-section also returning the resultant of stacked electrode assembly described are disclosed.

Figure 7 shows a pouch is sealed by describing general outline electro-well also are disclosed.

Figure 8 hydrophilic treatment with the contact angle measured experimental result according to the position are disclosed.

With reference also to the 8 also 2, secondary battery (20) includes a cathode (24), anode (26), membrane (22), and electrolyte comprises (not shown). Electrode assembly (21) comprises a positive electrode/membrane/cathode consists of. Said layer (22) of one or two surfaces hydrophilic processing by a plurality of periodic line pattern dielectric barrier discharge of atmospheric pressure plasma processing area hydrophilic elder brother reel (22a) and the possibility of shining processing area (22b) with each other.

Said layer (22) nucleic acid molecule can be coated with the mixture. Said dielectric barrier discharge is said layer (22) can be selectively interlocking with one or two surfaces of hydrophilic processing.

Based on polyolefin blended with polymer be a sand layer. Said dielectric barrier discharge device (100) includes a hydrophilic treatment area (22a) forming active species in the possibility of shining and discharge gas processing area (22b) in said active species can be non-active gas penetration number billion.

Said polymer mixture comprising porous inorganic filler and binder polymer can be. Said layer (22) is connected to the binder polymer layer on the substrate is between inorganic filler, inorganic filler empty space therebetween due to pore structure heat resistance can be formed.

Said anode (26) NMP solvent the anode assembly includes a copolymer made by anodic bath after applying the drying and by rolling a number on a current collector can be disclosed. Said anode current collector has a thickness of several hundreds to several made. Said anode can be a conductive material.

Said cathode (24) incorporating a negative electrode active material on a current collector comprising a negative cathode is applied is dried to form a number bath 1308. Said cathode current collector has a thickness of several hundreds to several made. Said cathode can be a conductive material.

The electrolyte comprises a lithium salt can be said electrolyte material. Said electrolyte material is a nonaqueous organic solvent, organic solid electrolyte, is used as the inorganic solid electrolyte can be. Said lithium salt electrolyte material can be dissolved. Said electrolyte solution is said layer (22) is can be timely or different hydrogen or alkyl.

Said layer (22) woven air at atmospheric pressure using a plurality of periodic line pattern in the form of hydrophilic processing plasma dielectric barrier discharge by hydrophilic treatment area (22a) and the possibility of shining processing area (22b) can be with. The possibility of shining of the processing area width (W2) is said to be a 5 millimeter 40 millimeters. Said width (W1) is 5 millimeters to 40 millimeters be a hydrophilic of the processing area. Said hydrophilic treatment area on the two sides of said layer disposed thereon.

Number of secondary battery bath method is described.

Layer (22) on one surface of the dielectric barrier discharge atmospheric pressure selectively exposing hydrophilic treatment area in the form of a plurality of periodic line pattern selectively hydrophilic processing (22a) and the possibility of shining processing area (22b) selective surface treatment is to have a plurality of hierarchies. Said hydrophilic surface treatment process region processing area and the possibility of shining number for selective dielectric barrier discharge device conductive mask installed (150) host is not. Said hydrophilic processing in the area of the reaction gas (for injecting an inert gas) is selectively introduced into the plasma is generated. An inert gas is the possibility of shining said treatment area apart from each other. Said dielectric barrier discharge linear source mounted on spaced apart each other selective surface treatment opening (151) with conductive mask (150) to said opening (151) can be performed using a plasma formed only. Supporting said membrane support layer (90) includes a conductor are made of, said support layer (90) is said conductive mask and with etc. dislocation can be maintained. Said conductive layer support (90) is in contact with said roller (roller) layer implementation being. Said roller and said conductive mask can be ground.

Said opening (151) plasma is formed in said conductive mask area to prevent said conductive mask closed closed diffused region capable of selectively introducing inert gas.

Then, layer selectively exposing a surface of said dielectric barrier discharge atmospheric pressure selectively hydrophilic treated in the form of a plurality of periodic line pattern is chosen to be the possibility of shining hydrophilic treatment area is surface treatment process region and a plurality of hierarchies.

Then, hydrophilic treated layer lining said electrode of electrodes assembly (21) a number substrate.

Then, said electrode assembly (21) sealed with a sealing member (or pouch, 28) and said sealing member (28) of a hot (28) through injecting an electrolyte substrate. Said electrolyte layer said completely following the ingress said battery cap (28) a sealed substrate.

The reference also 8, it has been determined that the contact angle of the electrolyte according to the position. Said water-friendly in contact angle ranges from about 110 degrees and, in contact angle ranges from about 90 degrees non-hydrophilic control disclosed. The possibility of shining hydrophilic processing region of the processing area border area is 1 millimeter are disclosed hereinafter. In the form of hydrophilic processing region with said isolation line process region when the possibility of shining, 1/3 hereinafter is not high as compared to the part of a permanent hydrophilic processing electrolyte infusion time is reduced. In addition, also significantly reduces the second.

In the embodiment according to the dielectric barrier discharge device of the present invention 9a perspective view describing each of the other also are disclosed.

C-a C 16 along a line 9a 9b is also of cross-sectional drawing also are disclosed.

16 Along a line 9a 9c is also of D provided D cross-sectional drawing also are disclosed.

16 Along a line 9a 9d is also of E provided E cross-sectional drawing also are disclosed.

Dielectric barrier discharge device also includes a dielectric barrier and insulation block 9a 9e describing perspective view also are disclosed.

Dielectric barrier discharge device also includes a power electrode 9a perspective view describing 9f also are disclosed.

Dielectric barrier discharge device also includes a perspective view of describing insulation block 9a 9g also are disclosed.

Dielectric barrier discharge device also includes a ground electrode 9a perspective view describing 9h also are disclosed.

Dielectric barrier discharge device also includes a lower plane view of describing 9a 9i also are disclosed.

The reference also 9a to 9i also, in the embodiment according to one of the present invention dielectric barrier discharge device (100) is welded to the ground electrode (110), power electrode (120), dielectric barrier portion (130), main and a gas distributing section (181), auxiliary gas distributing section (182), and part of (150) having a predetermined wavelength. Said power electrode (120) which extends upwards and the part number 1 various operation an alternating voltage is applied. Said ground electrode (110) which extends upwards the number 1 said power electrode (120) and said free end portion of number powered electrode disposed thereon. Said dielectric barrier portion (130) which extends upwards said number 1 is said ground electrode (110) and said power electrode (130) disposed between said power electrode (120) of said powered electrode so as to cover said exposed (130) disposed thereon in contact with. Said part of (150) includes at least one main opening (151) disposed laterally spaced apart on said number 1 at least one auxiliary opening (153) and said number 1 which extends upwards object (164) and said power electrode being disposed in said opposing each other in the number 1 is exposed said main opening (151) plasma is generated through said selectively processed article according said number 1 position of a treatment substrate. Said main and a gas distributing section (181) is said ground electrode (110) embedded within said number 1 along said power electrode exposed said supplied gas uniformly number 1. Said auxiliary gas distributing section (182) is said ground electrode (110) embedded within said auxiliary opening (153) to said number 1 through number number 2 gas pressure direction decodes the number.

Said power electrode (120) is formed into a triangular shape be a conductive material. Said ground electrode (110) is said power electrode (120) disposed thereon opposite to the both lateral sides of the upper end of the right (descending operation). Said ground electrode (110) to expose the upper end of the right said powered electrode disposed thereon. Said power electrode (120) and upper end of the right susceptor (162) is said dielectric barrier portion (130) is attached with a number 1 main region (main discharge region) dielectric barrier discharge on a chuck. Said power electrode (120) and said ground electrode of descending operation of the (110) is said dielectric barrier portion (130) is attached with a dielectric barrier discharge can be auxiliary in number 2. If the dielectric barrier discharge only said main, storage charge can be locally formed arc discharge causing said upper edge. To reduce arcing, auxiliary dielectric discharge plasma generated, electronic, said active gas supplied to said number 1 main dielectric barrier discharge region, the discharge cells can be performed even at low voltages. The, discharge stability is improved. Main dielectric barrier discharge electric power for electrode (120) and ground (susceptor) of descending operation of the vertical distance between the level of several millimeters can be. Specifically, said power electrode (120) on the edge of dielectric barrier portion (130) is 1 millimeter level on the vertical distance between said susceptor (g1) can be. The, said part of (150) can be less than the thickness of 1 millimeter. On the other hand, said power electrode (120) of descending operation of a dielectric barrier portion (130) to said ground electrode (110) is the vertical distance between 1 millimeter (g2) can be level. Forming a plasma stable dielectric barrier discharge auxiliary storage charge and a stand-alone number, a main dielectric discharge arrange the seed (seed charge) charge number substrate. Gas said dielectric barrier portion (130) along the upper edge side of the uniform fluid flow direction (descending operation of the) number improve discharge stability, said dielectric barrier portion (130) can be cooling.

Said power electrode (120) can be formed into a direction number 1 therein at least one bore. Refrigerant flows through the hole can be said. Powered electrode at one end of said refrigerant after said power electrode are implanted to number 1 along side of, said power electrode can be discharged. AC power is said power electrode (120) can be supplied to the center of the site.

Said dielectric barrier portion (130) is of constant thickness' V ' beam shape and user, said dielectric barrier portion (130) includes said power electrode (120) and descending operation of the upper end of the right covering, said covering part of descending operation of the insulation block thereof can. Said dielectric barrier portion (130) of several hundred micrometers to several millimeters may have a certain thickness. Said dielectric barrier portion is made out of ceramic, or plastic be a sequence. In the embodiment of the present invention modified according to, said dielectric barrier portion (130) on said insulation block (140) integral be a.

Insulation block (140) is triangular shaped and includes a number 1 direction, said upper end of the right triangular said power electrode for insertion into the depressions (147) can be a. Said depressions (147) is number 1 can be extended. Said insulation block (140) is made out of a be a ceramic or plastic material. Said dielectric barrier portion (130) includes said power electrode which extends upwards to cover said number 1 of descending operation of the insulation block and descending operation, said insulation block (140) to cover a portion of which extends in a direction of descending operation of the descending operation can be.

Said insulation block (140) which extends upwards to the number 1 of descending operation of said insulation block and a projection protruding (142) can be a. Said dielectric barrier portion (130) includes said projection (142) guide can be arranged. Said power electrode (120) patterned strong electric field is formed, said power electrode (120) and said ground electrode (110) in a very minute gaps can cause parasitic discharges or arc discharge. A billion for parasitic discharges said number, said insulating half (142) is disposed thereon. The, said power electrode (120) and an edge of said ground electrode (110) connecting the path said projection (142) returned to the outer pole is filled by path number billion can discharge.

Said ground electrode (110) generally hollow truncated triangular (truncated triangular prism) may be in the form disclosed. Or, said ground electrode that extends in the direction of slit opening can be arranged in the form of a frusto site number 1. Said power electrode (120) the ground electrode (110) buried in, said power electrode (120) is the upper edge of said ground electrode (110) can be disposed beneath the opening. Or said ground electrode (120) said power electrode that extends in the direction the number 1 and number to surround a exposed (or upper edge) can be.

Said power electrode (120) said upper end of the right or dielectric barrier portion (130) the upper end of the right said ground electrode (110) of truncated surface can be substantially matched.

Said ground electrode (110) includes a pair of grounding electrode (111), a pair of auxiliary grounding electrode (111a), slots ground electrode (116) can be comprising. Said grounding electrode (111) is said power electrode (120) and said of descending operation of the insulation block (140) opposite of descending operation of the disposed thereon. Said grounding electrode (111) which extends upwards the number 1, number 1 extends perpendicular to the direction of said auxiliary grounding electrode is said insulation block (140) to both ends of the disposed thereon.

Said main and a gas distributing section (181) is said grounding electrode (111) and said power electrode formed in the sides of said dielectric barrier portion (130) of supplies gas to the descending operation of the can. Said main and a gas distributing section (181) and includes a gas moving path, said grounding electrode (111) and said dielectric barrier portion (130) and between, said dielectric barrier portion (130) of descending operation of the gas along said dielectric barrier on either side of the can. Said gas moving path in said ground electrode (110) and said power electrode (120) formed in the electrode face a number (number 2 region) can be auxiliary discharge space. Said auxiliary discharge space is can be auxiliary dielectric barrier plasma. If said gas moving path in the form of a slit extending along a descending operation of said dielectric barrier can be. Said main and a gas distributing section (181) is said part of said number 1 to number direction can be uniform density of gas.

Said main and a gas distributing section (181) is meandering within said ground electrode further includes a fluid passage cross-section can be slit-shaped ground electrode. Specifically, said ground electrode fluid passages number 1 number 1 line pattern extending in the vertical direction (112a) and number 2 line pattern (114a) can be comprising. Said grounding electrode (111) separating (112) slots (114) and, a plurality of number 1 line pattern which extends upwards projecting upper side of number 1 (112a) can be comprising. In addition, a plurality of number 2 on a lower side of number 1 projecting which extends upwards (114a) can be comprising. Said number 1 line pattern (112a) and number 2 line pattern (114a) can be alternately arranged in each other. Gas in the form of a slit formed on a lower surface of said grounding electrode gas inlet (116) said number 1 through number 2 on a line pattern can be formed by fluid path through the arms. The, rotate direction receives said gas purge can be uniformly resistance number 1 direction. The, said grounding electrode gas outlet (117) is said dielectric barrier portion direction of delivering, number 1 direction can be maintaining the generally uniform density.

Said grounding electrode (111) is said power electrode (120) and said number 1 formed against the lower lateral edge extending perpendicularly to the ground electrode depressions (112b) can be a. Said ground electrode depressions (112b) are installed such that the outside can be number when it has not been filled with gas.

Said ground electrode depressions (112b) is arc prevention insulation block (172) can be filled by. Arc preventing said insulation block (172) is said number 1 can be ceramic or plastic material that extends in the direction of a rectangular column.

Said grounding electrode (111) and said dielectric barrier portion (130) and the distance between 1 millimeter hereinafter, said gas moving path can be performed said number 1 number auxiliary dielectric barrier discharge plasma region.

Main gas outlet of said gas distribution (117) discharged from the gas arc preventing said insulation block (172) and said dielectric barrier portion (130) space between barrier space 1308. ball number to (number 2 region). Arc preventing said insulation block (172) is the distance between said power electrode and said ground electrode sufficiently degrading the dielectric barrier discharge and arc discharge can number billion.

Said grounding electrode (111) is said ground electrode (110) and said dielectric barrier portion (130) and an auxiliary discharge space between the ground electrode and an auxiliary discharge number (114b) can be a. Said ground electrode and an auxiliary discharge (114b) is an auxiliary discharge space can be said a number (number 2 region). Said ground electrode and an auxiliary discharge (114b) communicates heat deformation be a strong metal alloy. Said ground electrode and an auxiliary discharge (114b) on said dielectric barrier portion (130) is the vertical distance between level (g2) can be several millimeters.

If, said vertical distance (g2) greater too, auxiliary dielectric barrier discharge not. The, susceptor in said number 1 (162) on said power electrode (120) is generated by the upper end of the right dielectric barrier period only, arc discharge by discharge stability can be deteriorated.

Said grounding electrode (111) follow a ground electrode of said fluid passage (112a, 114a) auxiliary supplied with gas from a gas distributing section (182,183) can be a. Said auxiliary gas distributing section (182,183) is included as ground electrode depressions (183) and said auxiliary gas spraying portion (182) can be a. Said auxiliary gas distributing section (182,183) is said part of auxiliary opening can be selectively supplying a gas. Specifically, said grounding to the ground electrode grooves formed depressions (112b) said auxiliary opening is at the location corresponding auxiliary ground electrode further depth sunken depressions (183) can be formed. Said auxiliary ground electrode depressions (183) is disposed along said auxiliary opening eulogy position to said number 1 can be formed. Said auxiliary ground electrode depressions (183) is said gas outlet (117) is connected to gas be supplied. Said auxiliary gas distributing section () is arc preventing said insulation block (172) can be in the form of a path which surrounds a gas cylinder which circumvent number. Said auxiliary gas spraying portion (182) is said part of auxiliary opening (152) to gas injection can be through-holes.

Said lower ground electrode (116) is said grounding electrode (111) which bind the lower face, said insulation block (140) lower surface of the substrate. Said lower ground electrode (116) is formed on its upper surface that extends in the direction extending perpendicularly to the side disposed adjacent said number 1 and number 1 number 1 trench (215) disposed adjacent said number 1 and number 2 in the opposite direction and spaced apart from the trench sides extended trench (225) can be a. Number 1 gas outlet (214) is number 1 trench (215) arranged around the bottom surface of gas inlet (216) formed inside the fluid passage through said through lower ground electrode connected thereto. Number 2 gas outlet (223) is number 2 trench (225) arranged around the bottom surface of gas inlet (222) through said through lower ground electrode formed inside the fluid passage connected thereto.

Said number 1 trench (215) comprises a plurality of number 1 gas outlet (214) with, said number 2 trench (225) comprises a plurality of number 2 gas outlet (223) with, said number 2 gas outlet on said number 1 number 1 () gas outlet direction can be alternately arranged. Said number 1 trench (215) coupled to the grounding electrode gas inlet (116) coupled with each other. Said number 2 trench (225) of other grounding electrode gas inlet (116) coupled with each other.

Said lower ground electrode (116) are inclined at a predetermined pipe is performed on the refrigerant pipe through hole (211) and A.C. power supply is performed on the power line power line through hole (212) can be disposed.

Said object (164) selective for processing, said part of (150) is said ground electrode (110) can be disposed of when the paragraph it puts,. Said part of (150) includes a plurality of arranged in said number 1 the main opening (151) and a plurality of auxiliary opening (153) can be a. It will be a centi meter be said to be main aperture are several hundred micrometers. Said part of (150) is plate-like and having a thickness of 1 millimeter hereinafter, a plurality of main opening 3 said number 1 (151) having a predetermined wavelength. Said part of (150) includes a ceramic, metal, or metal alloy be a.

Of said part of said auxiliary opening (153) is spaced from the centerline of said part of can be arranged symmetrically. Said auxiliary opening (153) to said dielectric barrier discharge is not powered electrode (120) can be arranged so faces. I.e., the upper surface of said ground electrode which is arranged to be watching said auxiliary opening, said auxiliary gas distributing section (182,183) gas outlet can be aligned. A pair of said treated gas discharged by said auxiliary opening at a point which can be focused disclosed.

Preferably, said part of (150) and conductive material is grounded, said part of said recess of the ground electrode (110a) can be arranged to cover the upper surface of. I.e., said part of (150) is positioned in said opening when the paragraph it puts, of ground electrode can be. Said part of (150) of the main opening (111) is dielectric barrier discharge is created that is locally along main number 1 can be. Said part of (150) in tactics, main dielectric barrier discharge is not generated. In addition, said fabrication method [khwu department (150) in open area of, main dielectric barrier discharge is generated. The, object (164) is number 1 direction may have been treated with region is not region.

Said auxiliary opening (153) presents a number through the main opening formed in said dielectric barrier discharge gas by lowering of the number space to move the active gas selectivity can number 1 billion. Said auxiliary opening (153) depending on the direction and number 1 through number number presents a gas pressure differential, said main opening number higher pressures than an area which can be.

Said main and a gas distributing section (181) through which said gas number ball number 1 auxiliary gas distributing section (182,183) number through which ambient gas be a number 2 the same ball. Only, said presents a number through the opening in the main by means of a dielectric barrier discharge gas can be converted into a blowing gas.

According to modified in the embodiment of the present invention, said part of (150) is said ground electrode (110) does not contact with, said object (164) can be disposed adjacent the lower. In this case, said part of (150) in different 2 may have three-dimensional pattern. On the other hand, vacuum chamber said part of said features (150) when fixed, linear dielectric barrier plasma device is processed while moving said 2 dimensional pattern can be formed.

Again, also the reference also 9a to 9i, secondary retardant film plasma processing device (100) includes a recess extending in the vertical direction and number 1 is electrically grounded to the ground electrode (110); and a part of said recess to prevent said ground electrode buried in the powered electrode extending in the vertical direction and an alternating voltage is applied to said number 1 (120); said power electrode in contact with said powered electrode part exposed to surround said number 1 and extending perpendicularly to the dielectric barrier portion (130); said power electrode which extends upwards facing said number 1 grounded susceptor (162); the main opening (151) and an auxiliary opening (153) extending perpendicularly to said susceptor and said number 1 is supported membranes prepared film (164) and said power electrode being disposed in said opposing each other in the number 1 is exposed to spatially plasma density number depending on the position of said film layer by selectively plasma processing part of said number 1 direction (150); and said auxiliary opening (153) said number 1 to number gas pressure distribution number direction auxiliary gas distributing section (182,183) without using a tool.

Object (164) be a layer film of a secondary battery. Said features susceptor (or roller) can be disposed and movable. Number 1 main dielectric barrier region occurs, said number 1 number 1 direction spatially modulates the plasma density region mask is disposed thereon. The, said membrane film comprises a light diffusion that extend alongside the line may have to be treated in the form of a hydrophilic region. In order to increase the selectivity of plasma processing space, said auxiliary opening is installed on said object ball number encoded. The, main opening only said plasma processing is carried out.

Again, also the reference also 9a to 9i, atmospheric pressure dielectric barrier discharge plasma processing method is subject to be processed (164) is electrically grounded and transferring the work vehicles (162) the number a ; atmospheric pressure through said transfer means in said object (164) transporting; said ground electrode (110) buried in a partially exposed power electrode (120) the number an alternating power; said power electrode (120) covering the exposed dielectric barrier portion (130) of a mask on a portion (150) between said transfer means and said power electrode is disposed on the exposed said selectively performing said dielectric barrier discharge plasma treatment be processed depending on the position; and said plasma discharge may be carried out in part of the main opening (151) are arranged around said auxiliary opening (153) at those positions number gas pressure over a plower number comprising the following steps.

Said ground electrode (110) can be gas through said exposed portions of the powered electrode. Said water-friendly and said plasma processed article, said atmosphere gas, oxygen, nitrogen, hydrogen, and argon can be at least one. Said object (164) be a layer film of a secondary battery. Said main and said auxiliary gas ball number through the opening in the same through an opening in the ambient gas ball be a number. Only, said presents a number through the opening in the main by means of a dielectric barrier discharge gas can be converted into a blowing gas.

Triangular shape when said power electrode, said ground electrode and said power electrode exposed auxiliary dielectric barrier discharge can be generated between (or said power electrode descending operation). To this end, said ground electrode and said dielectric barrier between number 2 region is formed, the process gas via said number 2 region can be supplied.

Or more, but reference attached drawing of the present invention in the embodiment described, the present invention is provided to its technical idea or person with skill in the art in the present invention is essential features without changing other specific embodiment can form can be understand are disclosed. In the embodiment described above the all sides is provided with a non-limiting exemplary understood to which must substrate.