ANTI-REFLECTIVE FILM AND PREPARATION METHOD OF SAME

In the specification, hard coat layer; and said hard coat layer is formed on one surface, said hollow inorganic nanoparticles dispersed in a resin as a binder resin including that refraction layer and solid inorganic nanoparticles; wherein, said hard coat layer and said solid inorganic nanoparticles within said interface between said that refraction layerthat refraction layer 70% or more in total in total thickness from 50% volume there is an anti-reflection film etched ball number.

In addition, in the specification, photocurable compound or (co) polymer, a photoreactive functional group-containing fluorine-containing compound, optical disclosure number, including hollow inorganic nanoparticles and solid inorganic nanoparticles formed resin composition at a temperature of 35 °C to 100 °C that refraction layer hard coat layer is deposited onto the heating is performed; and the plane of the photocuring said resin composition; including a number of antireflective film is encoded number ball bath method.

Hereinafter of the invention specific embodiments of antireflective film number bath method according to antireflection film and on the more specifically describing less than 1000.

In the specification, photopolymerizable compounds are irradiating light, e.g. irradiation of visible ray or ultraviolet polymerization compounds that dropped on the substrate.

In addition, fluorine-containing compound is included in the compound at least at least one fluoro compound 1 big.

In addition, (meth) acrylate and (meth) acrylic [(Meth) acryl] meaning including both the acrylic (acryl) (Methacryl) are disclosed.

In addition, polymer (ball) homopolymer and copolymer (co-a polymer) (homo-a polymer) meaning including both are disclosed.

In addition, hollow silica particles (silica hollow particles) the silicon compound or organic silicon compound as a multi-derived from silica particles, said surface of the silica particles and/empty where there is a space in the form of big particles formed within.

According to an exemplary embodiment of the invention, hard coat layer; and said hard coat layer is formed on one surface, said hollow inorganic nanoparticles dispersed in a resin as a binder resin including that refraction layer and solid inorganic nanoparticles; wherein, said hard coat layer and said solid inorganic nanoparticles within said interface between said that refraction layerthat refraction layer 70% or more in total in total thickness from 50% volume there is an anti-reflection film number ball 1308.

In order to enhance curing of antireflective film used to excess inorganic particles added but, in the upside of a height of antireflective film curing was measured number selected from the group consisting rather reflectance stain-door.

The, victims of the includes an antireflection film studies which gives rise to the present invention, antireflection film included in each other that refraction layer hollow inorganic nanoparticles and solid inorganic nanoparticles is distributed so that the can be decomposed when a low reflectance and high light transmittance while having high scratch and soil can be implemented rates while at the same time that it is to be invention the arrears of work.

Specifically, carry through specific number bath method, said hard coat layer and said layer of antireflective film during said that refraction layerthat refraction layer near the interface between solid inorganic nanoparticles and a rear face on the opposite side of said hollow inorganic nanoparticles mainly distribution interface when mainly distribution, can be obtained using previously inorganic particles that have successfully chamber number can be achieve lower compared to the reflectance reflectance, in addition said that refraction layer can realize greatly improved scratch and stain resistance.

As above-mentioned, said hollow inorganic nanoparticles dispersed in said resin as a binder resin that refraction layer and which solid inorganic nanoparticles, said hard coat layer can be formed on one surface, said 70 volume % or more of the hard coat layer and said solid inorganic nanoparticles in total in total thickness within said interface between said that refraction layerthat refraction layer from 50% can be present.

'Said at least 70 volume % in total solid inorganic nanoparticles present a particular zone' is the cross-section of said that refraction layer said solid inorganic nano particles that is defined in a specific area of most existing said sense, 70 volume % or more of the solid inorganic nanoparticles specifically said solid inorganic nano particles measured in total volume of said able to confirm a disclosed.

Said hollow inorganic nanoparticles and solid inorganic nanoparticles is specified whether solid inorganic nanoparticles in areas each hollow inorganic nanoparticles or said areas specified is determined and determines whether there is a bed of particles, said particles present in a specific region and over the interface number under the outside determines.

In addition, as described above, in a rear face on the opposite side of said hard coat layer and said interface between said that refraction layerthat refraction layer hollow inorganic nanoparticles which may be primarily distribution, specifically said at least 30 volume % in total hollow inorganic nanoparticles of less than all said hard coat layer and said interface between said solid inorganic nanoparticles that refraction layerthat refraction layer greater distance from said thickness can be present.

More specifically, said hard coating layer 30% total thickness within said interface from said solid inorganic nanoparticles that refraction layerthat refraction layer said at least 70 volume % in total can be present. In addition, said hard coating layer from said total thickness exceeds 30% said interface area of said hollow inorganic nanoparticles that refraction layerthat refraction layer 70 volume % or more can be present in total.

Said interface between said hard coat layer and said layer of antireflective film during that refraction layerthat refraction layer near a rear face on the opposite side of said interface and solid inorganic nanoparticles mainly distribution mainly according to the number of hollow inorganic nanoparticles, said that refraction layer each other within at least one layer is formed at least one portion or 2 2 other refractive index can be, the reflectivity of said antireflection film can be lowered.

In said solid inorganic nanoparticles and hollow inorganic nanoparticles that refraction layer said specific number carry specific distribution in bath method, said solid inorganic nanoparticles and hollow inorganic nanoparticles to modify the density difference between said 2 species of nanoparticles including modulating that refraction layer photocurable resin composition for forming a drying temperature can be obtained.

Specifically, said density of said solid inorganic nanoparticles and hollow inorganic nanoparticles difference 0. 3 to 30 g/cm3. 00 g/cm3, or 0. 1 to 40 g/cm3. 50 g/cm3, or 0. 0 to 50 g/cm3. One be 90 g/cm3, carry said solid inorganic nanoparticles formed according to the method number bath in said that refraction layer and smoother flow and distribution between said hollow inorganic nanoparticles imprints may be seen disclosed. The, implementation of the invention in embodiments of antireflection film, hard coat layer formed on said solid inorganic nano particles in said that refraction layer closer to can be situated on the hard coat layer side.

Said solid inorganic nano particles 2. 00 g/cm3 to 5. 00 g/cm3 density may have. In addition, said hollow inorganic nano particles 1. 3 to 50 g/cm3. May have a density of 50 g/cm3.

Said interface between said hard coat layer and said layer of antireflective film during that refraction layerthat refraction layer near a rear face on the opposite side of said interface and solid inorganic nanoparticles distributed mainly hollow inorganic nanoparticles when mainly distribution, modifies reflectance than can be obtained using previously inorganic particles can be implementing a low reflectance. In visible wavelengths of 380 nm to 780 nm reflective ring film is specifically said large area 0. 7% hereinafter can be average reflectance.

On the other hand, embodiments of antireflection film in implementing said, said at least 70 volume % in total that refraction layer said solid inorganic nanoparticles contained 70% or more in total volume number 1 layer and said hollow inorganic nanoparticles can be included in the number 2 layer, said layer from that of the hard coat layer and said that refraction layer relative to said number 1 number 2 layer can be located more closely. As above-mentioned, of antireflective film in said interface between said hard coat layer and said solid inorganic nanoparticles that refraction layerthat refraction layer primarily near the rear face on the opposite side of hollow inorganic nanoparticles distributed primarily to distribute said interface, said solid inorganic nanoparticles and hollow inorganic nanoparticles distributed mainly in each region can be visually identified that refraction layer independent layer.

Said solid inorganic nano particles of less than 100 nm does not exist therein and having the largest diameter is formed with a in the form of big particles.

In addition, said hollow inorganic nano particles of less than 200 nm and having the largest diameter whereby its surface and/or interior is formed with a in the form of big particles present.

Said solid inorganic nano particles 0. 5 to 100 nm, or may have a diameter of 1 to 30 nm.

Said hollow inorganic nano particles 1 to 200 nm, or may have a diameter of 10 to 100 nm.

On the other hand, said solid inorganic nanoparticles and said hollow inorganic nanoparticles (meth) acrylic the [ley[ley] sprouting, each surface, side epoxy, vinyl (Vinyl) and cycle consisting of at least one reactive functional group selected from the group consisting 1 this year (Thiol) may contain disclosed. Said solid inorganic nanoparticles and said hollow inorganic nanoparticles containing a reactive functionality according to the above-mentioned each surface, the cross-linking degree higher than said that refraction layer may have, thus a improved scratch and stain resistance can be secured.

On the other hand, the aforementioned that refraction layer photopolymerizable compound, a photoreactive functional group-containing fluorine-containing compound, hollow inorganic nanoparticles, a solid inorganic nanoparticles and optical disclosure number number bath 1308. photocurable coating composition.

The, in that refraction layer photopolymerizable compounds (co) polymer and said binder resin contained in the photoreactive functional group-containing polymer can be crosslinked (ball) between including fluorine-containing compound.

Embodiments of implementing said photocurable coating composition selected from the group comprising the binder resin forming the base of the soft layer can be that refraction layer number tank. Specifically, photopolymerizable compounds are (meth) acrylate or vinyl groups including said monomer or oligomer can be. More specifically, (meth) acrylate or vinyl groups said photopolymerizable compound is 1 or more, 2 or more, or 3 or more including monomer or oligomer can be.

Said (meth) acrylate comprises a specific monomer or oligomer and the examples, porous tree (meth) acrylate, pentaerythritol tetra (meth) acrylate, (meth) acrylate in D pen hit [su[su] [thol[thol]pen hit, hexa (meth) acrylate in D pen hit [su[su] [thol[thol], octa (meth) acrylate tree porous, [thu[thu] reel [leyn[leyn] diisocyanate, xylene diisocyanate, hexamethylene diisocyanate, (meth) acrylate trimethylolpropane tree, tree (meth) acrylate in trimethylolpropane hair, (meth) acrylate methyl roll propane tree tree, ethylene glycol di (meth) acrylate, butanediol di (meth) acrylate, ethyl (meth) acrylate process, butyl (meth) acrylate or 2 at least one mixture or, or urethane modified acrylate oligomer, epoxide acrylate oligomer, ether acrylate oligomer, dendritic acrylate oligomer, or at least one mixture 2 is cited. The molecular weight is preferably 1,000 to 10,000 in said oligomer preferably.

Said monomer or oligomer and the vinyl groups including specific examples, divinylbenzene, styrene or para methylstyrene is cited.

Said photocurable coating composition content of said photopolymerizable compounds are largely constrained but not limited to, the final number of antireflective film mechanical properties to said bath that refraction layer or polarity during the content of 5 to 80% by weight said photocurable coating composition solids photopolymerizable compound implementation being % by weight. The solids content of said photocurable coating composition said photocurable coating composition and a liquid component, as for example carry an organic solvent can be optionally comprise additives such as solid external grudge number only big.

On the other hand, said fluorine-based (meth) acrylate monomer or oligomer to be in the above compound photopolymerizable monomer or oligomer can be further. Said fluorine-containing (meth) acrylate monomer or oligomer when further including, said (meth) acrylate or vinyl groups including (meth) acrylate monomer or oligomer and monomer or oligomer for fluorine-based said weight ratio 0. Implementation being 10% to 1%.

Said fluorine-containing (meth) acrylate monomer or oligomer selected from the group consisting of formula 11 to 15 to specific examples 1 or more compounds is cited.

[Formula 11]

In said formula 11, R¹ 1 to 6 carbon atoms or hydrogen and alkyl, a is an integer between 0 and 7, b is an integer from 1 to 3.

[Formula 12]

In said formula 12, c is an integer from 1 to 10.

[Formula 13]

In said formula 13, d is an integer of 1 to 11.

[Formula 14]

In said formula 14, e is an integer from 1 to 5.

[Formula 15]

In said formula 15, f is an integer from 4 to 10.

On the other hand, said photoreactive functional group-containing part including said that refraction layer is derived from fluorine-containing compound can be included.

Said photoreactive functional group can be included or substituted carbonyl halide compounds include 1 or more photoreactive functional group-containing is, said photoreactive functional group-containing substrate by the irradiation of light, e.g. a functional group capable of participating in the polymerization by the irradiation of the visible ray or ultraviolet big. Said photoreactive functional group-containing substrate by the irradiation of light can participate in polymerization reactions that are known to various functional groups can be, for specific (meth) acrylic the [ley[ley] sprouting, examples, side epoxy, vinyl (Vinyl) or cycle a this year (Thiol) is cited.

Said photoreactive functional group-containing 2,000 to 200,000 each including fluorine-containing compound, preferably 5,000 to 100,000 weight-average molecular weight (weight-average molecular weight in terms of polystyrene measured by GPC method) may have a.

If said photoreactive functional group-containing fluorine-containing compound including weight-average molecular weight is too small, surface said photocurable in coating compositions fluorine-containing compound are located inside the tank and the final number are arranged in InGaN that refraction layer where it is not, the surface having said low pressure drop around the crosslinking density that refraction layerthat refraction layer recoating properties such as my [khu[khu] latch characteristic can be from the group consisting of overall strength.

In addition, said photoreactive functional group-containing fluorine-containing compound including weight-average molecular weight is too high, said photocurable in coating compositions and can be compatible with another components is lowered, the surface of the first interlayer dielectric structure and the final number that refraction layer haze is enhanced or bath, said that refraction layer strength in addition may cause a decrease in disclosed.

Specifically, the fluorine-containing compound including said photoreactive functional group-containing i) is one or more photoreactive functional group-substituted, at least one carbon 1 or more fluorine substituted aliphatic compound or aliphatic cyclic compound; ii) substituted 1 or more photoreactive functional group, at least one of hydrogen is fluorine-substituted, one or more carbon silicon substituted (hetero) aliphatic compound or hetero (hetero) aliphatic cyclic compound; iii) is one or more photoreactive functional group-substituted, at least one silicon 1 or more fluorine substituted poly d alkyl thread rock mountain system polymer (e.g., poly d methyl thread rock mountain system polymer); iv) substituted 1 or more photoreactive functional group-containing fluorine substituted polyether compound and at least one of hydrogen is, or said i) to iv) mixtures or their copolymer of 2 or more is cited.

Said photocurable coating composition including 100 parts by weight of said photopolymerizable compound 20 to 300 parts by weight of said photoreactive functional group-containing fluorine-containing compound can be.

Said photopolymerizable compound contrast when added to said implementing said photoreactive functional group-containing embodiments of photocurable coating composition including fluorine-containing compound is excess photocurable coating composition obtained from said cylinder coatable that refraction layer may not have sufficient are a curing. In addition, the amount of fluorine-containing compound including said photoreactive functional group-containing said photopolymerizable compound contrast if is too small, sufficient that refraction layer said photocurable coating composition obtained from scratch or stain-pyrazine as starting materials may not be disclosed.

Said photoreactive functional group-containing silicon or silicon compound including the fluorine-containing compound can be. I.e., said photoreactive functional group-containing silicon oxide or silicon compound including fluorine compound optionally may contain therein and, specifically said photoreactive functional group-containing silicon compound comprising the content of 0 or carbonyl halide groups. 1% by weight to 20% by weight implementation being.

Said photoreactive functional group implementing the silicon halide compound embodiments said photocurable coating compatibility between the other components included within the composition to produce a final number haze (haze) the size of the bath refraction layer serves to prevent the generation of height transparency can be. On the other hand, said photoreactive functional group-containing fluorine-containing compound including silicon content during too goes up, said photocurable coating included within the composition and said fluorine compound between other ingredients can be compatible rather lowering, the number is sufficient to give the final flash tank that refraction layer or antireflection film not have anti-reflective performance comments in addition anti-fouling surface may cause a decrease in disclosed.

100 parts by weight of said that refraction layer said photopolymerizable compounds (co) polymer 10 to 400 parts by weight of said contrast hollow inorganic nanoparticles can be 10 to 400 parts by weight of said solid inorganic nanoparticles.

During said that refraction layer said hollow inorganic nanoparticles and solid inorganic nanoparticles in case that excessive content of, said hollow inorganic nanoparticles and solid inorganic nanoparticles in said number tank that refraction layer phase separation does not occur between the reflectivity can be sufficiently and mixed, can be lowered convexoconcave surface is generated by the stain-main. In addition, during said that refraction layer said hollow inorganic nanoparticles and solid content of inorganic nanoparticles when erased, said interface between said hard coat layer and said solid inorganic nanoparticles located near that refraction layer from the area can be difficult during live programs, said gas pressure slowly rises reflectivity can be that refraction layer.

1 nm to 300 nm said that refraction layer, or 50 nm to 200 nm may have a thickness of.

On the other hand, included in said in that refraction layer said solid inorganic nanoparticles each surface is equipped with a hollow inorganic nanoparticles and reactive functional groups or silane coupling number can be substituted.

More specifically, said reactive functional group is alcohol, amine, carboxylic acid, epoxide, imide, (meth) acrylate, nitrile, norbornene, olefin, polyethylene glycol, cycle ol, silane and vinyl group that is at least one functional group selected from the group consisting 1 can be.

Said silane coupling number is vinyl with claw thread column, vinyl the tree maul [thok[thok] it will be sour, column, vinyl [thok[thok] It will be sour in tree, column, 2 - (3, 4 - epoxy hour claw [heyk[heyk] thread) ethyl the tree maul [thok[thok] it will be sour, column, 3 - writing hour killing by poison pro the tree maul which will bloom [thok[thok] it will be sour, column, 3 - writing hour killing by poison pro [thok[thok] it will be sour to the methyl D it will bloom, column, 3 - writing hour killing by poison pro [thok[thok] it will be sour to the D it will bloom, column, 3 - writing hour killing by poison pro [thok[thok] it will be sour in the tree which will bloom, column, the tree maul [thok[thok] it will be sour, column p - styryl, (meth) acrylic jade hour pro [thok[thok] it will be sour in the tree which will bloom, column 3 -, 3 - (meth) acrylic jade hour pro the tree maul which will bloom [thok[thok] it will be sour, column, 3 - (meth) acrylic jade hour pro the methyl D maul which will bloom [thok[thok] it will be sour, column, 3 - (meth) acrylic jade hour pro [thok[thok] it will be sour to the methyl D it will bloom, column, 3 - acrylic jade hour pro the tree maul which will bloom [thok[thok] it will be sour, column, N provided 2 - amino - 3 - (aminoethyl) pro the methyl D maul which will bloom [thok[thok] it will be sour, column, N provided 2 - amino - 3 - (aminoethyl) pro the tree maul which will bloom [thok[thok] it will be sour, column, (aminoethyl) - 3 - amino pro [thok[thok] it will be sour in the methyl tree which will bloom, column N-a 2 -, 3 - amino pro the tree maul which will bloom [thok[thok] it will be sour, column, object with 3 - amino, 3 - tree [thok[thok] Sour reel - N - (1, 3 - dimethyl butyl it was burnt) propyl amine, pro the tree maul which will bloom [thok[thok] it will be sour, column N - phenyl - 3 - amino, 3 - chloro pro the tree maul which will bloom [thok[thok] it will be sour, column, 3 - the [me[me] cop toe pro the methyl D maul which will bloom [thok[thok] it will be sour, column, 3 - the [me[me] cop toe pro the tree maul which will bloom [thok[thok] it will be sour, column, bis (tree [thok[thok] Sour reel pro it will bloom) tetra sulfide and 3 - 1 and at least one element selected from the group consisting of isocyanate at the time of this [thu[thu] pro which it knows [thok[thok] it will be sour in the tree which will bloom, column can be.

On the other hand, on the other hand, selected from the group consisting of (meth) acrylic and vinyl said that refraction layerthe [ley[ley] with sprouting, 1 1 or more including at least one reactive functional group can be a silane compound.

(Meth) acrylic the [ley[ley] with sprouting, vinyl groups and said at least one reactive functional group selected from the group consisting 1 1 or more reactive functional groups that refraction layer said organosilane-based compound including due to mechanical properties, e.g. curing can be height. In addition, vinyl (meth) acrylic the [ley[ley] with sprouting,that refraction layer said and said at least one reactive functional group selected from the group consisting 1 including 1 or more according to a silane compound, a curing decreases can be secured.

In addition, vinyl (meth) acrylic the [ley[ley] with sprouting, 1 and said at least one reactive functional group selected from the group consisting of a silane compound including 1 or more silane functional groups or silicon can be improve that refraction layer due to internal properties of said reactor. More specifically, a silane compound is evenly distributed inside said that refraction layer silane functional groups or silicon atoms by the implement can be lower than an average reflectance, in addition said silane functional groups to said inorganic fine particles uniformly distributed in the reactor or silicon that refraction layer said photopolymerizable compound distributed uniformly become engaged final number tank can be improved resistance preventing film.

As described above, the (meth) acrylic the [ley[ley] with sprouting, vinyl groups and said at least one reactive functional group selected from the group consisting 1 1 or more reactive with the functional groups of said silane compound including said silicon atoms to the fourth chemical structures including simultaneously, said that refraction layer optimized internal properties of refractive index can be lowered, the low reflectance and high light transmittance can be implementing said that refraction layer, as well as ensure excellent wear resistance or curing than uniform crosslinking density can be formed.

Specifically, vinyl (meth) acrylic the [ley[ley] with sprouting, and said at least one reactive functional group selected from the group consisting 1 including 1 or more reactive functional group containing organosilane-based compound is 100 to 1000 g/mol equivalent can be said.

(Meth) acrylic the [ley[ley] with sprouting, vinyl groups and said at least one reactive functional group selected from the group consisting 1 1 or more silane compounds including reactive functional group if said content is too small, said that refraction layer scratch or sufficiently enhancing the mechanical properties thereof can difficult.

On the other hand, selected from the group consisting of (meth) acrylic the [ley[ley] with sprouting, vinyl groups and said at least one reactive functional group including 1 1 or more reactive functional group content of said silane compound is too high, dispersion of fine particles in said inorganic or homogeneity that refraction layer said that refraction layer also lowers the light like rather may cause a decrease in disclosed.

(Meth) acrylic the [ley[ley] with sprouting, vinyl groups and said at least one reactive functional group selected from the group consisting 1 including 1 or more organosilane-based compound is 100 to 5,000, or 200 to 3,000 weight-average molecular weight (weight-average molecular weight in terms of polystyrene measured by GPC method) may have a.

Specifically, vinyl (meth) acrylic the [ley[ley] with sprouting, and said at least one reactive functional group selected from the group consisting 1 1 or more (meth) acrylic and vinyl organosilane-based compound including at least one reactive functional group selected from the group consisting 1 the [ley[ley] with sprouting, 1 or more, 1 to 10 carbon atoms and at least one urethane functional group coupled tree the cock which will know it will be sour, column repeating 1 can be organic functional group. 1 to 3 carbon atoms substituted in said tree the cock which will know it will be sour and column it crawls 3 the dog silicon compound be a alkoxy functional groups.

(Meth) acrylic the [ley[ley] with sprouting, vinyl groups and said at least one reactive functional group selected from the group consisting 1 1 or more specific chemical structure is defined in which organosilane-based compound including but not limited to, vinyl with claw thread column, vinyl the tree maul [thok[thok] it will be sour, column, vinyl [thok[thok] It will be sour in tree, column, 2 - (3, 4 - epoxy hour claw [heyk[heyk] thread) ethyl the tree maul [thok[thok] it will be sour, column, 3 - writing hour killing by poison pro the tree maul which will bloom [thok[thok] it will be sour, column, 3 - writing hour killing by poison pro [thok[thok] it will be sour to the methyl D it will bloom, column, 3 - writing hour killing by poison pro [thok[thok] it will be sour to the D it will bloom, column, 3 - writing hour killing by poison pro [thok[thok] it will be sour in the tree which will bloom, column, the tree maul [thok[thok] it will be sour, column p - styryl, (meth) acrylic jade hour pro [thok[thok] it will be sour in the tree which will bloom, column 3 -, 3 - (meth) acrylic jade hour pro the tree maul which will bloom [thok[thok] it will be sour, column, 3 - (meth) acrylic jade hour pro the methyl D maul which will bloom [thok[thok] it will be sour, column, 3 - (meth) acrylic jade hour pro [thok[thok] it will be sour to the methyl D it will bloom, column, 3 - acrylic jade hour pro the tree maul which will bloom [thok[thok] it will be sour, column, N provided 2 - amino - 3 - (aminoethyl) pro the methyl D maul which will bloom [thok[thok] it will be sour, column, N provided 2 - amino - 3 - (aminoethyl) pro the tree maul which will bloom [thok[thok] it will be sour, column, N provided 2 - amino - 3 - (aminoethyl) pro [thok[thok] it will be sour in the methyl tree which will bloom, column, pro the tree maul which will bloom [thok[thok] it will be sour, column 3 - amino, 3 - amino object with, [thok[thok] Sour reel tree - N - 3 - (1, 3 - dimethyl butyl it was burnt) propyl amine, pro the tree maul which will bloom [thok[thok] it will be sour, column N - phenyl - 3 - amino, 3 - chloro pro the tree maul which will bloom [thok[thok] it will be sour, column, 3 - the [me[me] cop toe pro the methyl D maul which will bloom [thok[thok] it will be sour, column, 3 - the [me[me] cop toe pro the tree maul which will bloom [thok[thok] it will be sour, column, bis (tree [thok[thok] Sour reel pro it will bloom) tetra sulfide, 3 - at the time of this [thu[thu] pro which it knows [thok[thok] it will be sour in the tree which will bloom, column isocyanate, or at least one mixture 2 is cited.

On the other hand, said hard coat layer is formed on the hard coat layer can be used without a conventionally known large number.

In one example of the hard coat film said, photocurable resin binder resin; and said binder resin dispersed antistatic number including a hard coat film is cited.

Hard in coating layer ultraviolet rays included in said photo-curing resin such as photocurable polymer of the compound as polymerization which can cause, as is normal in the art be a. But, preferably, includes a multifunctional (meth) acrylate monomeric units and said photocurable compound or oligomeric, the (meth) acrylate functional number of 2 to 10, preferably 2 to 8, more preferably 2 to 7 mm., secure hard can be part properties advantageous in disclosed. More preferably, said tree (meth) acrylate photocurable compound is porous, pentaerythritol tetra (meth) acrylate, (meth) acrylate in D pen hit [su[su] [thol[thol]pen hit, hexa (meth) acrylate in D pen hit [su[su] [thol[thol], octa (meth) acrylate in D pen hit [su[su] [thol[thol], octa (meth) acrylate tree porous, [thu[thu] reel [leyn[leyn] diisocyanate, xylene diisocyanate, hexamethylene diisocyanate, (meth) acrylate trimethylolpropane tree, and (meth) acrylate to form selected from the group consisting of trimethylolpropane hair in at least one tree be a 1.

Said antistatic number 4 is quaternary ammonium salt compounds; d [nyum[nyum] salt pyridazinone; cationic compounds having an amino group of 1 to 3; sulfonic acid base, sulfate ester base, phosphate ester base, anionic compounds such as phosphonic acid base; fruition or amino sulfate ester-based compounds and the like benign compounds; imino alcohol compounds, glycerin-based compound, polyethylene glycol compounds and the like of non-ionic compound; tin or titanium metal alkoxide compounds and the like including an organic metal compound; said organic metal compound acetylacetonate salts of metal chelate compound; 2 these compounds of at least one reactant or polymer cargo; 2 can be a mixture of at least one of these compounds. Wherein, said 4 1 4 compound having at least one quaternary ammonium base compounds are quaternary ammonium salts in the molecule can be, or can be used without a number molecular weight polymer type.

In addition, said antistatic number include conductive polymer and metal oxide particle can be be used. Said conductive polymer include aromatic conjugated poly (para-phenylene), heterocyclic type adjoint system polypyrrole, polythiophene, aliphatic adjoint system polythienylene, heteroatom containing conjugated ardency polyaniline, poly (phenylene vinylene) collection adjoint system, conjugated joint sealluck [sway[sway] style conjugated compounds having a plurality of conjugated chain molecule, conjugated polymer chain saturated polymer-based copolymer is a graft or block etc. conductive composite body. In addition, said metal oxide particle include zinc oxide, antimony oxide, tin oxide, cerium oxide, indium tin oxide, indium oxide, [ni[ni] aluminide oxide, antimony doped tin oxide, aluminum doped zinc oxide or the like is cited.

Photocurable resin of said binder resin; and said dispersed in a binder resin including number alkoxy silane oligomer and antistatic hard coat film is at least one selected from the group consisting of monomeric and oligomeric side orgin metal alkoxide compound 1 can be.

As is normal in the art said alkoxy silane compounds can be a, preferably tetra the maul [thok[thok] it will be sour, column, tetra [thok[thok] It will be sour, column, tetra this cow pro width it will be sour, column, methyl the tree maul [thok[thok] it will be sour, column, [thok[thok] It will be sour in tree, column methyl, (meth) acrylic rock hour pro the tree maul which will bloom [thok[thok] it will be sour, column, writing hour killing by poison pro it will bloom trimethoxysilane, and one or more compounds selected from the group consisting 1 [thok[thok] It will be sour, columnwriting hour killing by poison pro it will bloom tree be a.

In addition, said metal alkoxide sol - gel composition including metal alkoxide side orgin oligomer side orgin compound and water via reaction number can be high pressure liquid coolant. The aforementioned alkoxy silane oligomer number bath method satisfying said sol - gel reaction is a method can be performed.

But, metal alkoxide compounds are reacted so rapid side orgin said water, said water into a metal alkoxide compound into an organic solvent after dilution side orgin said sol - gel can be slowly dropping method of performing an electrochemical reaction. The, in view of reaction efficiency and the like, the molar ratio of metal alkoxide compound in water (metal ion reference) is preferably adjustable within the range in the 3 to 170.

Wherein, said metal alkoxide of titanium tetrachloride - pro bombing death idside orgin isocyanate compounds, isocyanate pro bombing death id zirconium, and aluminum 1 or more compounds selected from the group consisting of isocyanate with pro bombing death id be a.

On the other hand, said hard coat film of as another example, the antiglare film surface roughened light-therefore antiglare processing (haze to treatment) the film is cited.

E.g., said hard coat film as an example of a, photocurable resin including organic or inorganic fine particles dispersed in said binder resin and binder resin; including a hard coat film is cited.

Hard in coating layer ultraviolet rays included in said photo-curing resin such as photocurable polymer of the compound as polymerization which can cause, as is normal in the art be a. Specifically, said photocurable resin is a urethane acrylate oligomer, epoxide acrylate oligomer, polyester acrylate, and polyether acrylate to form a reactive acrylate oligomer group; and in D pen hit [su[su] [thol[thol] hexa acrylate, hydroxy pen in D pen hit [su[su] [thol[thol] whereby diacrylate, pentaerythritol tetra acrylate, dimethylaminoethyl methacrylate triazole porous, trimethylene profile triazole dimethylaminoethyl methacrylate, glycerol triazole pro width hour [ley[ley] mote [tu[tu] dimethylaminoethyl methacrylate, trimethyl propane ethoxy triazole diacrylate, 1, 6 - hexane d the D arc relay [thu[thu] which comes, preparing triazole pro width hour [ley[ley] mote [tu[tu] dimethylaminoethyl methacrylate, tree propylene glycol methacrylate, and ethylene glycol methacrylate and at least one element selected from the group consisting of polyfunctional acrylate monomer can be 1.

The particle diameter of 1 to 10 micro m organic or inorganic fine particles said implementation being.

Organic or inorganic fine particles said acrylic resin, styrene resin, epoxide resin and a nylon resin or organic fine particle silicon oxide, titanium dioxide, indium oxide, tin oxide, zinc oxide and zirconium oxide and be a comprising inorganic fine particles.

Said hard coat layer 0. 1 to 100 micro m thickness of micro m may have.

Said hard coat layer can additionally include a substrate coupled to other aspects. Said substrate has the specific kind or thickness greatly limited, number of antireflective film substrate used bath that refraction layer or that are known to a large number can be used without.

On the other hand, according to another embodiment of the invention, photocurable compound or (co) polymer, a photoreactive functional group-containing fluorine-containing compound, optical disclosure number, including hollow inorganic nanoparticles and solid inorganic nanoparticles formed resin composition at a temperature of 35 °C to 100 °C that refraction layer hard coat layer is deposited onto the heating is performed; and the plane of the photocuring said resin composition; the number of antireflective film including a number 1308. ball bath method.

The number bath method described above through embodiments of one implementation of antireflective film antireflective films are co number can be disclosed.

Specifically, said number of antireflective film bath method number by which the antireflective film is that refraction layer hollow inorganic nanoparticles and solid inorganic nanoparticles ball in each other is distributed so that can be decomposed and the low reflectance and high light transmittance while having high scratch and soil can be implemented while at the same time.

More particularly, said antireflection film comprises a hard coat layer; and said hard coat layer is formed on one surface, said hollow inorganic nanoparticles dispersed in a resin as a binder resin including that refraction layer and solid inorganic nanoparticles; wherein, said hard coat layer and said solid inorganic nanoparticles within said interface between said that refraction layerthat refraction layer from 50% in total in total thickness at least 70 volume % can be present.

In addition, 30 volume % or more in total in said hollow inorganic nanoparticles of less than all said hard coat layer and said interface between said solid inorganic nanoparticles that refraction layerthat refraction layer greater distance from said thickness can be present.

In addition, said hard coating layer from said total thickness within said 30% solid inorganic nanoparticles that refraction layerthat refraction layer interface said at least 70 volume % in total can be present. In addition, said hard coating layer from said total thickness exceeds 30% said interface area of said hollow inorganic nanoparticles that refraction layerthat refraction layer 70 volume % or more can be present in total.

In addition, number by number bath method of antireflective film which antireflection film in said hole, said that refraction layer 70 weight % or more in total in said solid inorganic nanoparticles layer 70 weight % or more in total number 1 included in said hollow inorganic nanoparticles can be included in the number 2 layer, said number 1 number 2 layer relative to said layer can be located more closely that of the hard coat layer and said that refraction layer.

Said that refraction layer photocurable compound or (co) polymer, a photoreactive functional group-containing fluorine-containing compound, optical disclosure number, solid and hollow inorganic nanoparticles that refraction layer resin composition including inorganic nanoparticles formed hard coat layer is deposited onto 35 °C to 100 °C, or can be formed as drying at a temperature of 40 °C to 80 °C.

Hard coat layer applied on said polycarbonate resin is below a temperature 35 °C that refraction layer dryer, said that refraction layer be formed having anti-fouling property can be significantly reduced. In addition, hard coat layer applied on said polycarbonate resin is greater than 100 °C that refraction layer temperature dryer, said hollow inorganic nanoparticles and solid inorganic nanoparticles in said number tank that refraction layer phase separation does not occur between the sufficiently mixed and force than said that refraction layer scratch and stain-as well as well as a decrease in reflectance can be.

Hard coat layer applied onto said resin composition for forming a drying temperature in said drying that refraction layer solid inorganic nanoparticles with said hollow inorganic nanoparticles and adjust a density difference between the aforementioned that refraction layer having properties can be formed.

Specifically, said density of said solid inorganic nanoparticles and hollow inorganic nanoparticles difference 0. 3 to 30 g/cm3. 00 g/cm3, or 0. 1 to 40 g/cm3. 50 g/cm3, or 0. 0 to 50 g/cm3. One be 90 g/cm3, according to embodiments of implementing said method in said solid inorganic nanoparticles formed that refraction layer said number tank and between said hollow inorganic nanoparticles in smoother flow and distribution of fixing device may be seen disclosed. The, method embodiments of implementing said number tank in which ball number by antireflection film, hard coat layer formed on said solid inorganic nano particles in said that refraction layer closer to can be situated on the hard coat layer side.

Said solid inorganic nano particles 2. 00 g/cm3 to 5. 00 g/cm3 and has a density of, said hollow inorganic nano particles 1. 3 to 50 g/cm3. May have a density of 50 g/cm3.

On the other hand, hard coat layer applied onto said resin composition at a temperature of 35 °C to 100 °C that refraction layer forming step 5 seconds to 10 minutes drying, or 30 seconds to 4 minutes can be performed.

Said case of a shorter drying time too, the above-described solid inorganic nanoparticles and between said hollow inorganic nanoparticles be sufficiently developing phase separation does not occur. To the W-CDMA, said drying time is too when the burst length, said hard coat layer can be formed that refraction layer erosion.

On the other hand, said that refraction layer photocurable compound or (co) polymer, a photoreactive functional group-containing fluorine-containing compound, hollow inorganic nanoparticles, a solid inorganic nanoparticles and optical disclosure number number bath 1308. photocurable coating composition.

Said that refraction layer said photocurable coating composition is deposited onto a predetermined substrate layer is applied can be obtained by photocuring. Said substrate has the specific kind or thickness greatly limited, number of antireflective film substrate used bath that refraction layer or that are known to a large number can be used without.

Said photocurable coating composition to the device in a right side of other commonly used method and can be used without a number, e.g., Meyer bar such as bar coating, gravure coating, 2 roll reverse coating, vacuum slot die coating, 2 roll coating method can be use.

1 nm to 300 nm said that refraction layer, or 50 nm to 200 nm may have a thickness of. The, said photocurable coating composition thickness is about 1 nm to 300 nm is applied onto said predetermined substrate, or 50 nm to 200 nm implementation being.

Said photocurable coating composition to ultraviolet or visible light irradiation in the step 200 provided 400 nm wavelength photocuring can, preferably when irradiated exposure amount is 100 to 4,000 mJ/cm2. Also not specially limited exposure time, exposure device, can be appropriately changing the irradiation position of a beam spot along a presence or absence or exposure.

In addition, in the step for applying to said photocurable coating composition such as a photocuring nitrogen ambient conditions can be nitrogen purging.

Said photocurable compound, hollow inorganic nanoparticles, solid inorganic nanoparticles and a photoreactive functional group-specific content is a fluorine-containing compound including said character enhancer is disclosed embodiments of one implementation comprises anti-reflective film.

Said hollow inorganic nanoparticles and solid inorganic nanoparticles dispersed colloidal emulsion wherein EL device can be included within the composition onto. Said hollow inorganic nanoparticles and solid inorganic nanoparticles including each colloidal dispersion can be an organic solvent for forming a thin film.

Said photocurable coating composition said hollow inorganic nanoparticles and solid inorganic nanoparticles each content range or said photocurable coating composition viscosity considering at least one said hollow inorganic nanoparticles and solid inorganic nanoparticles content can be determined during each colloidal, e.g. said hollow inorganic nanoparticles and solid inorganic nanoparticles having a solids level of said colloidal phase is 5 weight % to 60 weight % each implementation being.

Wherein, said dispersion medium of organic solvent methanol, isopropyl alcohol, ethylene glycol, an alcohol such as butanol; methyl ethyl ketone, methyl isobutyl ketone such as ketones; toluene, aromatic hydrocarbons such as xylene; dimethyl formamide. Dimethylacetamide, amides such as N - methylpyrrolidone; ethyl acetate, butyl acetate, gamma with butyl [lak[lak] ton such as esters; tetrahydrofuran mixable, such as 1, 4 - dioxane ether; or a mixture of these can be included.

Preferably said disclosure number include photocurable resin composition can be used that are known to compound can be used without greatly if a number, specifically benzo lung rice field orgin compound, lung rice field orgin acetoacetoxy-functional compounds, bead it will get torn and the total which will doze compound, a triazine compound, oxime-based compound or at least one mixture 2 can be.

Said photopolymerizable compound 100 parts by weight, preferably 1 to 100 parts by weight of a content is said disclosure number can be used. Photopolymerization disclosure number if said amount of is too small, said photocurable coating composition in the photocuring publication residual substances can be an aprotic polar solvent. Said amount of photopolymerization disclosure number occur, residual unreacted disclosure number as an impurity in the crosslinking density or number tank supports film from the group consisting of reflectivity or gas pressure slowly rises can be.

On the other hand, can be said photocurable coating composition further comprises an organic solvent.

Number of said organic solvent but for example ketones, alcohols, ether and then the mixture is acetate, or a mixture of at least one 2 is cited.

Specific examples of organic solvent, methyl ethyl [khey[khey] rice field, methyl isobutyl ketone, acetyl acetone or isobutyl ketone such as ketones; methanol, ethanol, diaryl three ton alcohol, n - propanol, i - propanol, n - butanol, i - butanol, an alcohol such as butanol or t -; ethyl acetate, propyl acetate i -, or polyethylene glycol monomethyl ether acetate such as acetate current; ether such as tetrahydrofuran mixable or propylene glycol monomethyl ether; or at least one mixture 2 is cited.

Said organic solvent is included in said photocurable coating compositions each component added to or blending time each components dispersed or mixed state added to the organic solvent while said photocurable coating can be included within the composition. If said photocurable coating composition of organic solvent content is too small, said photocurable coating composition bath agent which lowers the final number change can be a defect such as abrasion of the stripes. In addition, solids content upon the addition of excessive amounts of said organic solvent is not completed, and film forming coating or surface properties will be degraded sufficiently so that the film properties can be, drying and curing can be are cut. The, said photocurable coating composition 1% by weight to 50% by weight of the total solid component concentration of ingredients included, 2 to 20% by weight or so can be an organic solvent.

Said hard coat layer antireflection film can be used which is known to have a number can be used without a material is installed.

Specifically, said number of antireflective film bath method is photocurable compound or (co) polymer, optical disclosure number number antistatic hard coat layer comprising a polymer resin for composition is deposited onto the photocuring can be further includes, via said hard coat layer can be formed.

Said hard coat layer used for forming an anti-reflective film component with respect to said enhancer is disclosed efined embodiments of one implementation.

In addition, alkoxy silane oligomer and polymer resin for hard coat layer said metal alkoxide composition at least one compound selected from the group consisting of monomeric and oligomeric side orgin 1 can be.

Said hard coat layer polymer resin for composition used in a right side of the device and method apply typically used without other number can be, for example, Meyer bar such as bar coating, gravure coating, 2 roll reverse coating, vacuum slot die coating, 2 roll coating method can be use.

Said hard coat layer polymer resin for composition in the step 200 provided 400 nm ultraviolet or visible wavelength to photocuring can be irradiated, preferably when irradiated exposure amount is 100 to 4,000 mJ/cm2. Also not specially limited exposure time, exposure device, can be appropriately changing the irradiation position of a beam spot along a presence or absence or exposure. In addition, the hard coat layer said polymer resin for composition in the step for applying a photocuring nitrogen ambient conditions can be such as a nitrogen purging.