A process of imaging a photoresist with multiple antireflective coatings

01-01-2007 дата публикации

Номер:

TW0200700924A

Автор: David J Abdallah, Mark O Neisser, Ralph R Dammel, Georg Pawlowski, John Baifore, Andrew R Romano, Wookyu Kim, ABDALLAH DAVID J, NEISSER MARK O, DAMMEL RALPH R, PAWLOWSKI GEORG, BAIFORE JOHN, ROMANO ANDREW R, KIM WOOKYU, ABDALLAH, DAVID J., NEISSER, MARK O., DAMMEL, RALPH R., PAWLOWSKI, GEORG, BAIFORE, JOHN, ROMANO, ANDREW R., KIM, WOOKYU

Принадлежит: Az Electronic Materials Usa

Контакты:

Номер заявки: 97-43-9510

Дата заявки: 09-02-2006

A process for imaging a photoresist comprising the steps of, (a) forming a stack of multiple layers of organic antireflective coatings on a substrate; (b) forming a coating of a photoresist over the upper layer of the stack of multiple layers of organic antireflective coatings; (c) imagewise exposing the photoresist with an exposure equipment; and, (d) developing the coating with a developer.

CPC - классификация

G G0 G03 G03F G03F7 G03F7/G03F7/0 G03F7/00 G03F7/09 G03F7/091 H H0 H01 H01L H01L2 H01L21 H01L21/H01L21/0 H01L21/02 H01L21/027 H01L21/0276 Y Y1 Y10 Y10S Y10S4 Y10S43 Y10S430 Y10S430/Y10S430/1 Y10S430/15 Y10S430/151

IPC - классификация

G G0 G03 G03F G03F7 G03F7/G03F7/1 G03F7/11 H H0 H01 H01L H01L2 H01L21 H01L21/H01L21/0 H01L21/02 H01L21/027