29-12-2022 дата публикации
Номер: US20220410204A1
A method for depositing a film on a substrate, which includes the steps of forming a film using a liquid composition that includes a neutral surfactant and a charged lamellar compound, placing the film in contact with the substrate and depositing the film on substrate. Also, a process for analyzing a substrate onto which a film has been deposited by the method. 116-. (canceled)17. A process for depositing a film onto a substrate using a liquid composition , comprising the following steps:a) formation of a film using the liquid composition,b) placing the film in contact with the substrate, andc) depositing the film on the substrate, wherein the liquid composition comprises a neutral surfactant and a charged lamellar compound.18. The deposition process as claimed in claim 17 , in which the neutral surfactant is chosen from a nonionic surfactant claim 17 , a zwitterionic surfactant claim 17 , an amphoteric surfactant and mixtures thereof.19. The deposition process as claimed in claim 18 , in which the neutral surfactant is a nonionic surfactant chosen from an ethoxylated alcohol claim 18 , an ethoxylated alkylphenol claim 18 , an ethoxylated fatty acid claim 18 , an ethoxylated monoalkanolamide claim 18 , an ethoxylated sorbitan ester claim 18 , an ethoxylated amine claim 18 , a glycol ester claim 18 , a glycerol ester claim 18 , a polyglycerol ester claim 18 , a sorbitol ester claim 18 , a glucoside claim 18 , a polyglucoside claim 18 , a sucrose ester claim 18 , an amine oxide claim 18 , a block copolymer including at least one amphiphilic block claim 18 , and mixtures thereof.20. The deposition process as claimed in claim 19 , in which the nonionic surfactant is a block copolymer including at least one amphiphilic block chosen from fluoro unit blocks claim 19 , biological unit blocks claim 19 , dendrimer unit blocks and poly(alkylene oxide) unit blocks.211. The deposition process as claimed in claim 17 , in which the charged lamellar compound is chosen from a ...
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