СПОСОБ ЛАЗЕРНОЙ ПЕЧАТИ ФОТОИЗОБРАЖЕНИЯ НА ИЗДЕЛИИ ИЗ СТЕКЛА

Настоящее изобретение в целом относится к способу лазерной печати фотоизображений на изделиях из стекла (с 3D эффектом или эффектом тиснения). Заявленное устройство лазерной печати фотоизображения на изделии из стекла содержит изделие из стекла и слой композиции, наносимый на поверхность указанного изделия. При этом указанный слой композиции нанесен средством лазерной печати, выполненным с возможностью получения файлов данных или форматов изображения от вычислительного средства, а указанное средство лазерной печати выполнено с возможностью печати фотоизображения. Печать фотоизображения на слой композиции включает нанесение слоя композиции на указанную поверхность изделия из стекла, выполнение лазерной печати фотоизображения на указанном слое композиции с помощью по меньшей мере средства лазерной печати и нагревание указанной поверхности изделия из стекла. При этом указанное фотоизображение представляет собой цветное изображение с трехмерным (3D) или тисненым эффектом. Технический результат ...

2D and 3D RF lumped element devices for RF system in a package photoactive glass substrates

The present invention includes a method for creating a system in a package with integrated lumped element devices is system-in-package (SiP) or in photo-definable glass, comprising: masking a design layout comprising one or more electrical components on or in a photosensitive glass substrate; activating the photosensitive glass substrate, heating and cooling to make the crystalline material to form a glass-crystalline substrate; etching the glass-crystalline substrate; and depositing, growing, or selectively etching a seed layer on a surface of the glass-crystalline substrate on the surface of the photodefinable glass, wherein the integrated lumped element devices reduces the parasitic noise and losses by at least 25% from a package lumped element device mount to a system-in-package (SiP) in or on photo-definable glass when compared to an equivalent surface mounted device.

SYNTHETIC QUARTZ GLASS MEMBER AND PROCESS FOR PRODUCING THE SAME

REDUCTION OF DAMAGE INITIATION DENSITY IN FUSED SILICA OPTICS VIA UV LASER CONDITIONING

UV PHOTOSENSITIVE MELTED GLASSES

Laser printed photo on glass article method thereof

LASER PRINTED PHOTO ON GLASS ARTICLE METHOD THEREOF 5 The present invention generally relates to a method of glass article laser printing of photo images (with 3D or emboss effect)(1), comprising steps of: pre-treating said glass article with acid or alkali solution (12), coating a layer of composition on said article (14), ageing said article surface under room or ambient temperature, laser-printing on said glass article 10 surface (16) with at least a laser printing means, and surface finishing said glass article surface by heating process (18). Alternatively, said surface finishing can be achieved by ultra-violet light irradiation, washing with fluid, lamination, or a combination thereof. (The most illustrative figure is FIG. 1) ...

NON-DESTUCTIVE SURFACE MARKING OF CERAMICSAND GLASSES USING A LASER BEAM

Verfahren zur Herstellung von Schutzgläsern zum Schutze des Auges gegen den Einfall störenden Lichtes und nach diesem Verfahren hergestelltes Schutzglas

PHOTOLYTIC ETCHING OF SILICON DIOXIDE

Microelectronic device manufacturing method, involves disseminating metal ions from ionizable metal layer, and depositing electrode on layer of chalcogenide material containing metal ions to form microelectronic device

La présente invention concerne un procédé de fabrication d'un dispositif microélectronique à mémoire programmable comprenant les étapes consistant à : i. déposer sur une première électrode, une couche intermédiaire d'un matériau comprenant un chalcogénure, ii. irradier par rayonnements ultra-violets la couche intermédiaire de l'étape i, iii. déposer une couche métallique ionisable sur la couche intermédiaire obtenue à l'étape ii, iv. diffuser les ions métalliques, provenant de la couche métallique ionisable de l'étape iii, dans la couche intermédiaire pour former un matériau chalcogénure contenant des ions métalliques, et v. déposer une deuxième électrode sur la couche de matériau chalcogénure contenant des ions métalliques obtenue à l'étape iv, pour former ledit dispositif microélectronique.

ORGANIC TREATMENT OF POLLUTION ON AN INORGANIC SUBSTRATE

L'invention a trait à un procédé de traitement de pollution organique sur un substrat en verre, d'oxyde ou de tout autre matériau essentiellement minéral ou métallique. Ce procédé se distingue par le fait qu'il consiste en un traitement électrique, un traitement UV ozone ou un traitement par flamme, éventuellement suivi d'un lavage. Sont également concernés des dispositifs de mise en oeuvre de ce procédé, l'application de ce procédé à un vitrage hydrophile etlou oléophile, ainsi qu'un vitrage traité par ce procédé et destiné à un véhicule de transport, au bâtiment, au mobilier urbain, à un élément décoratif d'intérieur ou d'extérieur, ou à l'électroménager.

METHOD FOR MANUFACTURING WINDOW GLASS COATED WITH AR COATING ON FRONT AND REAR SIDES FOR CAMERA

The present invention relates to a method for manufacturing window glass coated with AR coating on front and rear sides for a camera. An object of the present invention is to enhance the transmittance of a window glass and to prevent a ghost phenomenon caused by reflections when photographing with the camera. That is, the present invention relates to a method for manufacturing window glass for a camera which is characterized by forming AR coating layers on both front and rear sides of the window glass. Accordingly, an object of the present invention is to enhance the transmittance of the window glass and to prevent ghost phenomenon caused by reflection when photographing with the camera by forming AR coating layers on both front and rear sides of the window glass. COPYRIGHT KIPO 2019 (100) Printing step (200) Front side AR coating step (300) Cell cutting step (400) Rear side AT coating step (500) AF coating step ...

A Ultraviolet Ray using Glass Marking Device and a Method

Multicolored photosensitive glass-based parts and methods of manufacture

Multicolored glass-based articles and methods of manufacture are disclosed. The method includes forming a glass-based part and exposing a first region to radiation and a second region to radiation such that the first and second regions have different sized metallic nanoparticles, resulting in a multicolored glass article.

Sensitized, photo-sensitive glass and its production

COMBINED ADVANCED FINISHING AND UV LASER CONDITIONING PROCESS FOR PRODUCING DAMAGE RESISTANT OPTICS

A method for reducing the density of sites on the surface of fused silica optics that are prone to the initiation of laser-induced damage, resulting in optics which have far fewer catastrophic defects, and are better capable of resisting optical deterioration upon exposure to a high-power laser beam.

SYNTHETIC QUARTZ GLASS MEMBER AND PROCESS FOR PRODUCING THE SAME

A process for producing a quartz glass member, wherein a sample from a quartz glass base material is exposed to F2 laser under given conditions and whether or not the peak intensity of H2 Raman scattering radiation is decreased by 80% or more from the peak intensity of H2 Raman scattering radiation with respect to a sample not exposed to F2 laser is judged. When the decrease of the peak intensity of H2 Raman scattering radiation is less than 80%, the laser resistance of the quartz glass base material is judged as being satisfactory, and a synthetic quartz glass member is worked from the base material. The compaction of the sample is also measured.

ELECTRICAL STORAGE SYSTEM INCLUDING A SHEET-LIKE DISCRETE ELEMENT, SHEET-LIKE DISCRETE ELEMENT, METHOD FOR PRODUCING SAME, AND USE THEREOF

An electrical storage element is provided that includes a discrete sheet-like element with particularly low transparency to high-energy electrical radiation, preferably in a range of wavelengths from 200 to 400 nm, and to the manufacturing thereof, and also relates to a discrete sheet-like element that exhibits particularly low transparency for high-energy electromagnetic radiation, preferably in a range of wavelengths from 200 to 400 nm, and to the manufacturing thereof. 2. The electrical storage system as claimed in claim 1 , wherein the transmittance is selected from the group consisting of 15% or less in the range from 200 nm to 270 nm at a thickness of 30 μm claim 1 , 10% or less at 282 nm at a thickness of 30 μm claim 1 , and 80% or less at 308 nm a thickness of 30 μm.3. The electrical storage system as claimed in claim 1 , wherein the sheet-like discrete element exhibits a water vapor transmission rate (WVTR) of <10g/(m·d).4. The electrical storage system as claimed in claim 1 , wherein the sheet-like discrete element has a thickness of less than 2 mm.5. The electrical storage system as claimed in claim 1 , wherein the sheet-like discrete element has a thickness of less than or equal to 100 μm.6. The electrical storage system as claimed in claim 1 , wherein the sheet-like discrete element has a specific electrical resistance at a temperature of 350° C. and at alternating current with a frequency of 50 Hz of greater than 1.0*10Ohm·cm.7. The electrical storage system as claimed in claim 1 , wherein the sheet-like discrete element exhibits a maximum load temperature θof at least 300° C.8. The electrical storage system as claimed in claim 1 , wherein the sheet-like discrete element has a coefficient of linear thermal expansion α in a range from 2.0*10/K to 10*10/K.9. The electrical storage system as claimed in claim 1 , wherein the sheet-like discrete element has a maximum load temperature θof at least 300° C. claim 1 , a coefficient of linear thermal expansion α ...

High transmittance glass sheet and method of manufacture the same

The present invention is to provide a high transmittance glass sheet that has a composition containing as coloring components, expressed in wt. %, 0.005 to less than 0.02% of total iron oxide in terms of Fe2O3, less than 0.008% of FeO, and 0 to 0.25% of cerium oxide and having a ratio of FeO in terms of Fe2O3 to the total iron oxide of lower than 40%, and exhibits high visible light transmittance and solar radiation transmittance. Alternatively, a high transmittance glass sheet is provided that contains not more than 0.06% of total iron oxide and 0.025 to 0.20% of cerium oxide and has a ratio of a fluorescence intensity at 395 nm to a fluorescence intensity at 600 nm of 10% or higher when subjected to ultraviolet irradiation at a wavelength of 335 nm.

Silica glass, optical element and optical fiber apparatus resistant to ultraviolet rays and radioactive rays, and manufacturing method therefor

By forming many structural defects intentionally in silica glass by UV irradiation and subsequently removing the structural defects by heat treatment, structural relaxation proceeds to give structurally stable glass and defects due to ultraviolet irradiation are prevented from being formed. An optical fiber bundle is formed by winding a large number of optical fibers made of silica glass to form a column. Fixers are secured at both ends of the optical fiber bundle, which are inserted into and secured to each of the central holes of the fixers. The optical fiber bundle is inserted into a fiber bundle protection tube, which is inserted into a heater. The heater is formed by a spirally wound ribbon-like heat body covered with an insulating material. Lead wires are connected to both ends of the heat body. The heater and each of the lead wires are inserted into an outer protection tube.

Quarzglas, optisches Element und gegen ultraviolette und radioaktive Strahlung resistente faseroptische Vorrichtung, und Herstellungsverfahren dafür

PROCEDURE FOR THE PRODUCTION OF SYNTHETIC VITREOUS SILICA FOR APPLICATION FOR ARF EXCIMERLASERLITHOGRAPHIE ONES

PRETREATMENT OF MOLDS

Ultraviolet ray-absorbing, colorless and transparent soda-lime-silica glass

PROCESS OF REINFORCEMENT OF the CONTRAST Of IMAGE IN the TUBES-IMAGE FOR TELEVISION COLORS

TREATMENT OF ORGANIC POLLUTION ON AN INORGANIC SUBSTRATE

The invention relates to a method of treating organic pollution on a substrate made from glass, oxide or any other essentially mineral or metallic material having a functional character owing to the fact that it comprises: one or more stacked layers and/or a specific surface morphology. The inventive method is characterised in that it consists of electrical treatment, ozone UV treatment or flame treatment, optionally followed by washing. The invention also relates to: devices that are used to perform the above-mentioned method; the application of said method in relation to hydrophilic and/or oleophilic glazing; and glazing which is treated by said method and which is intended for a transport vehicle, a building, street furniture, an internal or external decorative element or an electric household appliance. © KIPO & WIPO 2007 ...

HIGH-SPEED MICRO-HOLE FABRICATION IN GLASS

A method for fabricating a high-density array of holes in glass comprises providing a glass sheet having a front surface and irradiating the glass sheet with a laser beam so as to produce open holes extending into the glass sheet from the front surface of the glass sheet. The beam creates thermally induced residual stress within the glass around the holes, and after irradiating, the glass sheet is annealed to eliminate or reduce thermal stress caused by the step of irradiating. The glass sheet is then etched to produce the final hole size. Preferably, the glass sheet is also annealed before the step of irradiating, at sufficiently high temperature for a sufficient time to render the glass sheet dimensionally stable during the step of annealing after irradiating.

Silica glass article and manufacturing process therefor

A process of manufacturing a silica glass article comprising the steps of: (1) irradiating a silica glass article with electromagnetic waves to generate defects therein; and (2) immersing the thus irradiated silica glass article in an atmosphere comprising a hydrogen gas, thereby providing the resulting silica glass article with a characteristic that is effective for preventing it substantially from increasing its absorption within an ultraviolet region due to ultraviolet ray irradiation. Also disclosed are a silica glass article or a glass fiber produced according to the manufacturing process.

Flat glass having high transmittance

The present invention is to provide a high transmittance glass sheet that has a composition containing as coloring components, expressed in wt. %, 0.005 to less than 0.02% of total iron oxide in terms of Fe2O3, less than 0.008% of FeO, and 0 to 0.25% of cerium oxide and having a ratio of FeO in terms of Fe2O3 to the total iron oxide of lower than 40%, and exhibits high visible light transmittance and solar radiation transmittance. Alternatively, a high transmittance glass sheet is provided that contains not more than 0.06% of total iron oxide and 0.025 to 0.20% of cerium oxide and has a ratio of a fluorescence intensity at 395 nm to a fluorescence intensity at 600 nm of 10% or higher when subjected to ultraviolet irradiation at a wavelength of 335 nm.

Synthetic quartz glass member for use in ArF excimer laser lithography

A synthetic glass member for use in excimer laser lithography, having superior homogeneity, high transmittance for ArF excimer laser beams and an excellent resistance against lasers is made from high purity synthetic quartz glass, and it is characterized in that layered structures, striae in three directions and internal strains are thermally and mechanically removed, the distribution of refractive index (Δn) in a plane orthogonal to the optical axis is up to about 1 × 10-6, the distribution of refractive index (Δn) in a plane parallel to the optical axis is up to about 5 × 10-6, the birefringence is up to about 2 nm/cm, the hydrogen molecule concentration is at least about 2 × 1017 molecules/cm3, and the internal transmittance is at least about 99.8% at a wavelength of 193.4 nm.

ЗАКАЛИВАЕМОЕ ИЗДЕЛИЕ, ЗАЩИЩЕННОЕ ВРЕМЕННЫМ СЛОЕМ

СПОСОБ ЛАЗЕРНОЙ ПЕЧАТИ ФОТОИЗОБРАЖЕНИЯ НА ИЗДЕЛИИ ИЗ СТЕКЛА

METHOD OF CLARIFICATION OF ZINC SELENIDE OPTICAL MEMBERS

Künstlich hergestelltes Quarzglaselement zur Anwendung in ArF-excimer-Laserlithographie

Verfahren zur Herstellung synthetischen Kieselglases zur Anwendung für ArF-Excimer-Laserlithographie

Herstellungsverfahren fuer Magnetkernanordnungen

Verfahren zum Herstellen von fotostrukturierbaren Glaskörpern im Wiederziehverfahren

Die vorliegende Erfindung betrifft ein Verfahren zur Herstellung von fotostrukturierbaren Glaskörpern im Wiederziehverfahren sowie ein Glaselement, das mit dem Verfahren herstellbar ist. Die Erfindung betrifft auch die Verwendung des Glaselements in einem Verfahren zum Strukturieren von Glas sowie nach dem Verfahren erhältliche strukturierte Glaselemente. Die Glaselemente der vorliegenden Erfindung können strukturiert und/oder unstrukturiert in verschiedenen Einsatzgebieten zum Einsatz kommen, zum Beispiel in Bauteilen oder als Bauteile in der Mikrotechnik, in der Mikroreaktionstechnik, im electronic packaging, für mikrofluidische Komponenten, in oder als FED Spacer, für die Biotechnologie (z.B. Titerplatten), als Interposer, und in oder als dreidimensional strukturierbare Antennen.

IMPROVEMENTS IN PHOTOLYTIC ETCHING OF SILICON DIOXIDE

... 1,220,365. Etching. GENERAL ELECTRIC CO. 28 May, 1968 [29 May, 1967], No. 25427/68. Heading B6J. The silicon dioxide surface layer of a transparent body, e.g. of quartz, is etched by contacting with an etchant liquid comprising a photodecomposable fluorine compound to form a liquid-solid interface, exposing the interface to a pattern of radiation through the transparent body to cause photodecomposition of the compound and produce a material which attacks the surface in the exposed areas. The fluorine compound may be fluorobenzene, fluorosulphonyl benzene, sulphonyl fluoride, monofluoroacetone, 4,41 - fluorobenzophenone, methane sulphonyl fluoride, 1 - fluoro - propan - 2 - ol, hexafluorobenzene, tritydifluoroamine or tetrafluoro - 1,4- benzoquinone.

Light-induced refractive index changes in low temperature glasses

2D AND 3D RF LUMPED ELEMENT DEVICES FOR RF SYSTEM IN A PACKAGE PHOTOACTIVE GLASS SUBSTRATES

The present invention includes a method for creating a system in a package with integrated lumped element devices is system-in-package (SiP) or in photo-definable glass, comprising: masking a design layout comprising one or more electrical components on or in a photosensitive glass substrate; activating the photosensitive glass substrate, heating and cooling to make the crystalline material to form a glass-crystalline substrate; etching the glass crystalline substrate; and depositing, growing, or selectively etching a seed layer on a surface of the glass-crystalline substrate on the surface of the photodefinable glass, wherein the integrated lumped element devices reduces the parasitic noise and losses by at least 25% from a package lumped element device mount to a system-in-package (SiP) in or on photo-definable glass when compared to an equivalent surface mounted device. See Fig. 15F.

LASER MARKING OF CERAMIC MATERIALS, GLAZES, GLASS CERAMICS AND GLASSES

Laser marking of ceramic materials, glazes, glass ceramics and glasses A method of laser marking ceramic materials, glazes, glass ceramics and glasses that contain at least one radiation-sensitive additive, utilising a laser beam as radiation energy source which is either applied to, or focused on, the surface of the material to be marked in accordance with the form of the graphic symbols to be reproduced, such that a change in colour is induced at the irradiated areas, wherein the wavelength of said laser beam used as energy source is in the near UV and/or visible range and/or infra-red range, and the radiation sensitive additive is an inorganic pigment.

PROCESS FOR MAKING COLORED PHOTOSENSITIVE GLASS CONTAINING MICROCRYSTALS OF ALKALI METAL FLUORIDE AND COLLOIDAL SILVER

MULTICOLORED PHOTOSENSITIVE GLASS-BASED PARTS AND METHODS OF MANUFACTURE

Process of double exposure for the photoengraving

다색 감광성(photosensitive) 유리-계 부품 및 이의 제조 방법

... 다색 유리-계 제품 및 이의 제조 방법이 개시된다. 상기 방법은 유리-계 부품을 형성하는 단계 및 제1 영역 및 제2 영역을 복사에 노출시켜 상기 제1 및 제2 영역이 상이한 크기의 금속 나노 입자를 갖도록 하는 단계를 포함하고, 이는 다색 유리 제품을 생성한다.

UV TREATED GREY GLASS AND METHOD OF MAKING SAME

This invention relates to grey glass that is capable of achieving high light transmittance in the visible range in combination with good solar properties (e.g., reduced IR, UV and/or TS transmission), and/or a method of making the same. In certain example embodiments, the glass is treated with UV (ultraviolet) radiation in order to increase %FeO and/or CeO2 content, thereby increasing the glass redox and improving solar performance of the glass. Such glass compositions are useful, for example and without limitation, in automotive windows (e.g., windshields, sidelites, backlites and sunroofs) and/or in architectural/residential window applications.

ULTRAVIOLET RAY-ABSORBING, COLORLESS AND TRANSPARENT SODA-LIME-SILICA GLASS

A soda-lime-silica type glass having a property of absorbing ultraviolet rays and also being colorless and transparent which has been prepared by irradiating a cerium containing soda-lime-silica glass with a light having a wave length in far-ultraviolet to near-ultraviolet region and is reduced in the transmittance of lights having a wave length in the range of 300 to 400 nm.

Process for making colored photosensitive glass

An improvement upon the making of colored photosensitive glasses via the exposure thereof to high energy or actinic radiation followed by heat treatment thereof, the improvement comprising conducting the exposure of the glasses while such are at a temperature between about 200 DEG - 410 DEG C. to thereby considerably shorten the time required for developing color and to produce colors of very high intensity.

Silica glass, optical element and optical fiber apparatus resistant to ultraviolet rays and radioactive rays, and manufacturing method therefor

By forming many structural defects intentionally in silica glass by UV irradiation and subsequently removing the structural defects by heat treatment, structural relaxation proceeds to give structurally stable glass and defects due to ultraviolet irradiation are prevented from being formed. An optical fiber bundle is formed by winding a large number of optical fibers made of silica glass to form a column. Fixers are secured at both ends of the optical fiber bundle, which are inserted into and secured to each of the central holes of the fixers. The optical fiber bundle is inserted into a fiber bundle protection tube, which is inserted into a heater. The heater is formed by a spirally wound ribbon-like heat body covered with an insulating material. Lead wires are connected to both ends of the heat body. The heater and each of the lead wires are inserted into an outer protection tube.

Methods and apparatuses for making addition-stuff of inflatable green preforms for light building materials

An object of the present invention is to provide a simple method for producing a synthetic quartz glass having excellent homogeneity and high transmittance, which is useful as an optical material in producing steppers equipped with an ArF excimer laser as a radiation source. A method for producing a synthetic quartz glass for use in ArF excimer laser lithography, which comprises irradiating a highly homogeneous synthetic quartz glass containing less than 60 ppb of Na with an ultraviolet radiation having a maximum wavelength of 260 nm for not less than the duration expressed by the following equation 1: wherein X represents an Na concentration (ppb), Y represents the duration of irradiation (hours), and Z represents the illuminance of an ultraviolet radiation on an irradiated surface (mW/cm2).

FURNACE FOR HEATING A DENTAL OBJECT

Die vorliegende Erfindung betrifft einen Ofen (100) zum Erhitzen eines Dentalobjektes (101), mit einer Kammer (103) zur Aufnahme des Dentalobjekts (101); einer Strahlungsquelle (105) zum Emittieren von Strahlung mit einer Wellenlänge, die kleiner als 350 nm ist, in die Kammer (103); und einer Heizeinrichtung (113) zum Erhitzen des Dentalobjekts (101) in der Kammer (103).

Method for characterizing and especially for labeling the surfaces of optical elements by means of UV light

METHODS FOR CONTROLLED LASER-INDUCED GROWTH OF GLASS BUMPS ON GLASS ARTICLES

A method for controlling formation of glass bumps in a glass article with laser-irradiation without the use of a growth-limiting structure. Standard deviation of height between the glass bumps on the article is less than 1 micron by controlling the laser radiation dose provided on the glass article.

Photosensitive glasses and glass ceramics and composite glass materials made therefrom

TREATMENT OF ORGANIC POLLUTION ON AN INORGANIC SUBSTRATE

METHOD FOR PROCESSING ULTRATHIN-TYPE GLASS, COMPRISING LAMINATING AND CUTTING PROCESSES

The present invention relates to a method for processing ultrathin-type glass, comprising laminating and cutting processes. The processing method comprises: an etching process for processing ultrathin-type glass by etching the same; a laminating process for manufacturing a lamination body; a lamination body cutting process for manufacturing a small lamination body by cutting the same with the fixed size; a small lamination body shape processing process for processing the shape of the small lamination body with the fixed shape; a polishing process for removing chipping; an edge healing process for progressing chemical edge polishing; a delaminating process for separating the same into individual small ultrathin-type glass; a primary front healing process for progressing fine chemical polishing; a chemical reinforcing process for chemically reinforcing the individual small ultrathin-type glass; and a secondary front healing process for fine chemical polishing. According to the present invention ...

Machining of fusion-drawn glass laminate structures containing a photomachinable layer

IN SITU SURFACE CONTAMINANT REMOVAL FOR ION IMPLANTING

Methods and apparatus that introduce, within the ion implant chamber or an isolated chamber in communication therewith, the capability to remove contaminants and oxide surface layers on a wafer surface prior to ion implantation, are disclosed. The mechanisms for removal of contaminants include conducting: a low energy plasma etch, heating the wafer and application of ultraviolet illumination, either in combination or individually. As a result, implantation can occur immediately after the cleaning/preparation process without the contamination potential of exposure of the wafer to an external environment. The preparation allows for the removal of surface contaminants, such as water vapor, organic materials and surface oxides.

SYNTHETIC QUARTZ GLASS FOR OPTICAL MEMBER, PROCESS FOR PRODUCING THE SAME, AND METHOD OF USING THE SAME

L'invention porte sur un procédé de fabrication d'un verre de silice synthétique qui consiste à irradier un verre de silice synthétique possédant un groupe OH d'une teneur inférieure ou égale à 50 ppm avec des ultraviolets à vide dont la longueur d'onde est inférieure ou égale à 180 nm en vue d'améliorer la transmittance dans une région de longueurs d'ondes inférieures à 165 nm.

Integrated optical components fabricated using ultraviolet laser techniques

A process for forming an integrated optical device in a glass substrate, comprising the steps of: providing a glass substrate having a base index of refraction; providing a UV light beam; focusing the beam on a portion of the glass substrate in order to form a region of increased refraction; and scanning an elongated region of the glass substrate with the beam in order to define at least one elongated optical channel having an increased index of refraction relative to the base index of refraction, the elongated optical cannel for guiding light transmitted there along. The process further includes: forming a plurality of elongated optical channels in said glass substrate, wherein a first optical channel is operative for transmitting light to said plurality of elongated optical channels such that said transmitted light is divided among said plurality of elongated optical channels, thereby forming an optical beamsplitter.

Bulk internal bragg gratings and optical devices

The present invention provides photonic devices utilized in optical telecommunications. The photonic devices include photosensitive bulk glass bodies which contain Bragg gratings, particularly with the ultraviolet photosensitive bulk glass bodies directing optical telecommunications wavelength range bands. Preferably the ultraviolet photosensitive bulk glass bodies are batch meltable alkali boro-alumino-silicate bulk glass bodies. The invention includes an optical communications wavelength device for use with wavelength range bands, with the device comprising an input optical waveguide collimator for collimating an input light beam out of an optical waveguide to provide an unguided input light beam including at least one reflective wavelength range band lambdR and at least one wavelengths range band lambdn; an internal bulk Bragg grating including a transparent photosensitive bulk optical grating medium with an internal modulated refractive index grating with a grating pattern for reflecting ...

Continuous production of photo-sensitive glass bodies

A method for continuous production of photo-sensitive glass bodies, glass bodies, and structured glass articles are provided. The glass bodies include a glass having Si4+, at least one crystal-agonist, at least one crystal-antagonist, and at least one pair of nucleating agents. The glass may be used in a method for structuring of glass. The glass bodies may be structured and/or unstructured and used in different applications such as in components or as components in micro-technology, in micro-reaction-technology, in electronic packaging, for micro-fluidic components, in or as FED spacer, for bio-technology (for example titer plates), as interposer, and in or as three-dimensional structurable antennae.

COVER GLASS FOR WRISTWATCH AND ITS PRODUCTION

PROBLEM TO BE SOLVED: To partially color glass in stained-tone by using crystallized glass as a glass material and heating a specific part of molded glass. SOLUTION: Glass 1 composed of e.g. Li2O-Al2O3-SiO2 material to which is added a nucleus forming material (TiO2) transparent in a glassy state as a glass base raw material is cut to a cover glass state, pre-heated to about 300°C, set on a rotation stage 2 of a press molder set at about 400°C and a peripheral part is continuously heated by left and right burners 3 to a softened state at about 830°C under rotating in a low speed. Simultaneously, a temperature of a press mold 4 made of a super alloy material and having a mirror- finished surface part contacting with glass is set at about 520°C near a distortion temperature of the crystallized glass 1 and the press mold is fallen on the softened crystallized glass 1, then the crystallized glass is press-molded with quenching by an inner tilted face A-part in a depressed part of the mirror ...

Self-processing of diffractive optical components in hybrid sol-gel glasses

2D AND 3D RF LUMPED ELEMENT DEVICES FOR RF SYSTEM IN A PACKAGE PHOTOACTIVE GLASS SUBSTRATES

The present invention includes a method for creating a system in a package with integrated lumped element devices is system-in-package (SiP) or in photo-definable glass, comprising: masking a design layout comprising one or more electrical components on or in a photosensitive glass substrate; activating the photosensitive glass substrate, heating and cooling to make the crystalline material to form a glass-crystalline substrate; etching the glass-crystalline substrate; and depositing, growing, or selectively etching a seed layer on a surface of the glass-crystalline substrate on the surface of the photodefinable glass, wherein the integrated lumped element devices reduces the parasitic noise and losses by at least 25% from a package lumped element device mount to a system-in-package (SiP) in or on photo-definable glass when compared to an equivalent surface mounted device.

PROCEDE DE FABRICATION DE VERRE PHOTOSENSIBLE COLORE

L'invention concerne une amélioration de la fabrication de verres photosensibles colorés, par exposition à un rayonnement d'énergie élevée ou à un rayonnement actinique suivie d'un traitement thermique, l'amélioration consistant à effectuer l'exposition des verres pendant qu'ils sont à une température comprise entre 200 et 410 degrés C pour raccourcir de façon importante la durée nécessaire pour créer la couleur, et pour obtenir des couleurs d'intensité très élevée.

storage element to ferrite cores with printed circuits

적층체의 제조 방법 및 배선판의 제조 방법

... 수지 조성물층을 기재 상에 형성하여 적층체를 얻는 공정을 구비하고, 상기 기재가 유리 기판 또는 실리콘 웨이퍼를 포함하고, 상기 수지 조성물층의 두께가 10㎛ 이하이며, 상기 수지 조성물층이, 탄소수 3 이상의 알킬렌글리콜에서 유래하는 구조 단위를 가지는 에폭시 수지, 및, 에스테르기 함유 화합물을 함유하는, 적층체의 제조 방법.

A glass complex, a shell, a display device and a terminal equipment

SYNTHETIC QUARTZ GLASS AND METHOD FOR PREPARATION THEREOF

La présente invention concerne un verre de quartz synthétique destiné aux lampes ultraviolettes à vide présentant une longueur d'onde de 175 nm ou moins, caractérisé en ce qu'il possède une teneur en groupe OH de 100 ppm ou moins et ne contient sensiblement pas de défauts de type réducteur.

Precision structured glass articles, integrated circuit packages, optical devices, microfluidic devices, and methods for making the same

The present disclosure relates to a reconstituted wafer- and/or panel-level package comprising a glass substrate having a plurality of cavities. Each cavity is configured to hold a single IC chip. The reconstituted wafer- and/or panel-level package can be used in a fan-out wafer or panel level packaging process. The glass substrate can include at least two layers having different photosensitivities with one layer being sufficiently photosensitive to be capable of being photomachined to form the cavities.

PRODUCTION OF COLORED GLASS

Surface inscription method for e.g. spectacle lens involves moving surface and focus point of light beam relatively to each other in such a way that the focus point lies on the surface

The method involves focusing the light beam of the excimer laser (1) using an optical element (5) and moving the surface to be inscribed and the focus point of the light beam relatively to each other in the direction of the tangential plane in the vertex of the surface. Additionally, the surface is moved in the direction of the normal line of the vertex, so that the focus point lies on the surface. An Independent claim is also included for an arrangement for carrying out the method.

Uv photosensitive melted germano-silicate glasses

2D and 3D RF lumped element devices for RF system in a package photoactive glass substrates

The present invention includes a method for creating a system in a package with integrated lumped element devices is system-in-package (SiP) or in photo-definable glass, comprising: masking a design layout comprising one or more electrical components on or in a photosensitive glass substrate; activating the photosensitive glass substrate, heating and cooling to make the crystalline material to form a glass-crystalline substrate; etching the glass-crystalline substrate; and depositing, growing, or selectively etching a seed layer on a surface of the glass-crystalline substrate on the surface of the photodefinable glass, wherein the integrated lumped element devices reduces the parasitic noise and losses by at least 25% from a package lumped element device mount to a system-in-package (SiP) in or on photo-definable glass when compared to an equivalent surface mounted device.

PROCEDE DE RENFORCEMENT DU CONTRASTE D'IMAGE DANS LES TUBES-IMAGE POUR TELEVISION EN COULEURS

Un masque opaque 2 ayant des trous 3 de forme désirée et de disposition appropriée est placé à proximité d'une glace photosensible 1 contenant de l'or et activée au CeO2 et la glace est exposée à travers le masque à des radiations ultra-violettes 4 pour donner des filtres colorés. Les luminophores sont appliqués sous forme de tirets ou de fentes d'une manière classique, les luminophores B, R bleus et rouges étant placés sur les filtres et le luminophore vert dans la partie limpide. Application, notamment, aux tubes-image pour télévision en couleurs.

MANUFACTORING PROCESS OF GLASS PHOTOSENSITIVE COLOURS

Method for laser printing photo on glass article and product by using the method

In situ surface contaminant removal for ion implanting

Methods and apparatus that introduce, within the ion implant chamber or an isolated chamber in communication therewith, the capability to remove contaminants and oxide surface layers on a wafer surface prior to ion implantation, are disclosed. The mechanisms for removal of contaminants include conducting: a low energy plasma etch, heating the wafer and application of ultraviolet illumination, either in combination or individually. As a result, implantation can occur immediately after the cleaning/preparation process without the contamination potential of exposure of the wafer to an external environment. The preparation allows for the removal of surface contaminants, such as water vapor, organic materials and surface oxides.

ULTRAVIOLET RAY CLEANING DEVICE AND CLEANING METHOD

An ultraviolet ray cleaning device for cleaning a to-be-treated object being conveyed by irradiation of ultraviolet rays on the object from an ultraviolet ray lamp (32). The ultraviolet ray cleaning device is characterized by having a gas supply route constructed such that a gas is blown on an ultraviolet ray irradiation surface of the object after passing through a gas diffusion plate (35).

OPTICAL ELEMENTS AND METHODS OF MAKING OPTICAL ELEMENTS

The present invention provides an optical element including a silver halide-containing glass material having a concentration of less than 0.001 wt% cerium; and a refractive index pattern formed in the silver halide-containing glass material, the refractive index pattern including regions of high refractive index and regions of low refractive index, the difference between the refractive indices of the high refractive index regions and the low refractive index regions being at least 4x10-5 at a wavelength of 633 nm. The present invention also provides methods for making optical elements from siliver halide-containing glass materials.

Method for controlling refractive index of silica glass

A method for controlling an index of refraction of silica glass, and in particular quartz glass, is disclosed. The method for controlling the index of refraction of silica glass includes the use of a vacuum ultraviolet laser beam having the same or shorter wavelength absorbable by the silica glass. The vacuum ultraviolet laser beam is irradiated to the silica glass to cause photodissociation of a Si-O bond at the point of irradiation. An index of refraction may also be altered using a vacuum ultraviolet laser beam having a longer wavelength absorbable by the silica glass.

Method of manufacturing microstructure using photosensitive glass substrate

The present invention relates to a method of manufacturing a microstructure such as a barrier lib or a spacer formed at an internal space between two flat panels constructing a flat panel display and, in particular, to a method of manufacturing a microstructure using a photosensitive glass substrate. The method of manufacturing a microstructure in accordance with the present invention includes the steps of preparing a photosensitive glass substrate, forming a mask pattern having a light transmission unit and a shading unit on the photosensitive glass substrate, exposing the photosensitive glass substrate, heat-treating the photosensitive glass substrate, and etching an unexposed portion of the photosensitive glass substrate. In addition, the process of changing the thermal expansive coefficient of the microstructure by heat-treating the photosensitive substrate again can be additionally included after etching and removing the unexposed portion.

UV photosensitive melted germano-silicate glasses

The present invention relates generally to UV (ultraviolet) photosensitive bulk glass, and particularly to batch meltable alkali boro-alumino-silicate glasses. The photosensitive bulk glass of the invention exhibits photosensitivity to UV wavelengths below 250 nm.The photosensitivity of the alkali boro-alumino-silicate bulk glass to UV wavelengths below 250 nm provide for the making of refractive index patterns in the glass. With a radiation source below 250 nm, such as a laser, refractive index patterns are formed in the glass. The inventive photosensitive optical refractive index pattern forming bulk glass allows for the formation of patterns in glass and devices which utilize such patterned glass. ...

Vorbehandlung von Giessformen

LIGHT-INDUCED REFRACTIVE INDEX CHANGES IN LOW TEMPERATURE GLASSES

Devices are made comprising a tin-phosphorous oxyfluoride glass, which has been exposed to light, preferably shorter in wavelength than the onset of the absorption edge of the glass, to change the refractive index change of the glass. The glasses can be used to form planar and fiber devices, including core/clad structures for guiding light.

Treatment of organic pollution on an inorganic substrate

Electric storage system containing discrete disc-shaped element, discrete disc-shaped element and method for producing and using the same

METHOD FOR MANUFACTURING A MICROELECTRONIC DEVICE WITH PROGRAMMABLE MEMORY

Method and device for bonding workpieces each produced from glass substrate or quartz substrate

Provided are a method and a device for bonding workpieces, the method and the device making it possible to ensure uniform joining and suppress the deterioration of optical characteristics of the workpieces, and not requiring a pressurization mechanism for pressurization. Vacuum ultraviolet light with a wavelength of 200 nm or less is applied to the joint surfaces of first and second workpieces (W1, W2) produced from a crystal substrate and a glass substrate, or a glass substrate and a glass substrate from a light application unit (10). The workpieces (W1, W2) are conveyed to a workpiece cleaning/stacking mechanism by a conveyance mechanism (C), the joint surfaces are subjected to mega-sonic cleaning as needed, and the workpieces are aligned with the joint surfaces thereof facing each other, and stacked such that the joint surfaces are in contact with each other. After being stacked, the stacked workpieces are conveyed to a workpiece heating mechanism and heated to increase the workpiece ...

METHOD OF MAKING A GLASS ENVELOPE

The coefficient of absorption of a pre-selected region of a glass sheet is preferentially increased. The glass sheet may thereafter be sealed to a substrate using a sealing laser. In one embodiment, the coefficient of absorption sheet is increased by irradiating the glass sheet at a wavelength of about 248 nm, preferably through a mask, to produce an irradiated pattern on the glass sheet having a pre-determined shape. The glass sheet is then heat treated, placed over a substrate and sealed to the substrate by exposing the irradiated pattern to a sealing laser light having a wavelength in the range between about 355 nm and 532 nm to produce a glass envelope. The method disclosed herein is useful, inter alia, for manufacturing electro-luminescent devices, such as light emitting diodes (LEDs) and in particular organic light emitting diodes (OLEDs).

Flat glass having high transmittance

The present invention is to provide a high transmittance glass sheet that has a composition containing as coloring components, expressed in wt. %, 0.005 to less than 0.02% of total iron oxide in terms of Fe2O3, less than 0.008% of FeO, and 0 to 0.25% of cerium oxide and having a ratio of FeO in terms of Fe2O3to the total iron oxide of lower than 40%, and exhibits high visible light transmittance and solar radiation transmittance. Alternatively, a high transmittance glass sheet is provided that contains not more than 0.06% of total iron oxide and 0.025 to 0.20% of cerium oxide and has a ratio of a fluorescence intensity at 395 nm to a fluorescence intensity at 600 nm of 10% or higher when subjected to ultraviolet irradiation at a wavelength of 335 nm.

Second-order nonlinear glass material

There is disclosed second-order nonlinear glass material wherein a part having second-order nonlinearity contain Ge, H and OH and second-order nonlinear optical constant d of 1 pm/V or more, and a method for producing second-order nonliner glass material comprising treating a porous class material containing Ge with hydrohen, sintering it and subjecting it to a ultraviolet poling treatment. There can be provided second-order nonlinger glass material having second-order nonlinearity which is a sufficiently high and has a sufficiently long lifetime for a practical purpose, in use of the glass material for optical elements or the like.

Method for producing photo-structurable glass bodies by a redrawing method

A method for production of a photo-structurable glass element is provided. The method includes the steps of: fixing a blank of photo-structurable glass at a first end; heating of a deformation zone of the blank; and drawing the blank. The glass includes Si4+, a crystal-agonist, a crystal-antagonist, and a pair of nucleating agents. The crystal-agonist is selected from the group consisting of Na+, K+, Li+, and any combinations thereof. The crystal-antagonist is selected from the group consisting of Al3+, B3+, Zn2+, Sr2+, Sb3+, and any combinations thereof. The pair of nucleating agents include cerium and an agent selected from the group consisting of silver, gold, copper, and any combinations thereof. The crystal-agonist has a molar proportion cat.-% in relation to a molar proportion of Si4+ that is at least 0.3 and at most 0.85.

SYNTHETIC QUARTZ GLASS AND METHOD FOR PREPARATION THEREOF

A synthetic quartz glass to be used for light in a vacuum ultraviolet region with a wavelength of at most 175 nm, which is characterized in that the OH group content in the synthetic quartz glass is less than 10 ppm, and it contains substantially no reduction type defects.

VERFAHREN ZUR BEARBEITUNG EINER OBERFLÄCHE

Transparent substrate with thin film and method for manufacturing transparent substrate with circuit pattern wherein such transparent substrate with thin film is used

An object of the invention is to provide a method for manufacturing a transparent substrate provided with a tin oxide thin film which can be satisfactorily patterned even by irradiation with a laser light having low energy because an ablation phenomenon occurs therewith. The invention relates to a method for manufacturing a transparent substrate bearing a circuit pattern, which comprises irradiating a thin-film-attached transparent substrate comprising a transparent substrate having thereon a transparent conductive film having a carrier concentration of 5×10 19 /cm 3 or higher, with a laser light having a wavelength of 1,064 nm to form a circuit pattern on the transparent substrate.

Laser processing method

A laser processing method of converging a laser light into an object to be processed made of glass so as to form a modified region and etching the object along the modified region so as to form a through hole in the object comprises a browning step of discoloring at least a part of the object by browning; a laser light converging step of forming the modified region in the discolored part of the object by converging the laser light into the object after the browning step; and an etching step of etching the object after the laser light converging step so as to advance the etching selectively along the modified region and form the through hole.

Laser sealing device for glass substrates

A laser sealing device for glass substrates includes a first laser head and a second laser head. The first laser head irradiates laser onto a sealing material coated between glass substrates, thereby melting the sealing material. The second laser head is provided at a predetermined interval from the first laser head, irradiates laser onto the portion which has been irradiated by the first laser head, and is set to a lower power than the first laser head. The device further includes a heating plate provided so as to be movable relative to the first and second laser heads and placed on the glass substrates when being heated to a predetermined temperature. Thus, it is possible to minimize the occurrence of cracking in the glass substrates due to thermal shock since the temperature of the sealing material which is melted by the laser heads drops slowly rather than rapidly.

Glass member provided with sealing material layer, electronic device using it and process for producing the electronic device

The invention provides a glass member provided with a sealing material layer, which suppresses generation of failures such as cracks or breakage of glass substrates or a sealing layer even when the distance between two glass substrates is narrowed, and thereby makes it possible to improve the sealing property between the glass substrates and its reliability. A glass substrate has a surface provided with a sealing region, on which a sealing material layer having a thickness of at most 15 μm is formed. The sealing material layer includes a fired material of a glass material for sealing containing a sealing glass, a laser absorbent and optionally a low-expansion filler, wherein the total content of the laser absorbent and the low-expansion filler being the optional component in the glass material for sealing is within the range of from 2 to 44 vol %.

Method and System for Mitigation of Particulate Inclusions in Optical Materials

A method of fabricating an optical material includes providing input materials having a material softening temperature, melting the input materials, and flowing the melted input materials into a laser inclusion mitigation system. The melted input materials comprise one or more inclusions. The method also includes irradiating the input materials using a laser beam, fragmenting the one or more inclusions in response to the irradiating, and reducing a temperature of the input materials to less than the material softening temperature. The method further includes forming an optical material and annealing the optical material.

Annealing method and annealing apparatus

An annealing method irradiates a target object, having a film formed on its surface, with a laser beam to perform an annealing process to the target object. The surface of the target object is irradiated with the laser beam obliquely at an incident angle that is determined to achieve an improved laser absorptance of the film.

Vitreous silica crucible and method of manufacturing the same

Provided is a method of manufacturing a vitreous silica crucible for pulling a silicon single crystal which can suppress melt surface vibration of silicon melt filled therein and has a long lifetime. The crucible includes a peripheral wall portion, a curved portion and a bottom portion, and has a plurality of micro recesses on the specific region of the inner surface of the peripheral wall portion.

Transparent material processing with an ultrashort pulse laser

Methods for ultrashort pulse laser processing of optically transparent materials. A method for scribing transparent materials uses ultrashort laser pulses to create multiple scribe features with a single pass of the laser beam across the material, with at least one of the scribe features being formed below the surface of the material. Slightly modifying the ultrashort pulse laser processing conditions produces sub-surface marks. When properly arranged, these marks are clearly visible with side-illumination and not clearly visible without side-illumination. In addition, a method for welding transparent materials uses ultrashort laser pulses to create a bond through localized heating. The ultrashort pulse duration causes nonlinear absorption of the laser radiation, and the high repetition rate of the laser causes pulse-to-pulse accumulation of heat within the materials.

System And Method For Laser-Based, Non-Evaporative Repair Of Damage Sites In The Surfaces Of Fused Silica Optics

A method for repairing a damage site on a surface of an optical material is disclosed. The method may involve focusing an Infrared (IR) laser beam having a predetermined wavelength, with a predetermined beam power, to a predetermined full width (“F/W”) 1/ediameter spot on the damage site. The focused IR laser beam is maintained on the damage site for a predetermined exposure period corresponding to a predetermined acceptable level of downstream intensification. The focused IR laser beam heats the damage site to a predetermined peak temperature, which melts and reflows material at the damage site of the optical material to create a mitigated site. 1. A method of repairing a damage site on a surface of an optical material comprising:{'sup': '2', 'focusing an Infrared (IR) laser beam, of a predetermined wavelength, with a predetermined beam power, to a predetermined full width (“FM/”) 1/ediameter spot on the damage site;'}maintaining the focused IR laser beam on the damage site for a predetermined exposure period corresponding to a predetermined acceptable level of downstream intensification; andfurther using the focused IR laser beam to heat the damage site to a predetermined peak temperature, which melts and reflows material at the damage site of the optical material to create a mitigated site.2. The method of claim 1 , wherein the material at the damage site of the optical material is melted and reflowed without causing evaporation of the material.3. The method of claim 1 , further comprising controlling the beam power of the IR laser beam to provide:a first, predetermined, continuous level of beam power for a first time duration; andsubsequently ramping down the beam power to a reduced, second beam power level over a second time duration.4. The method of claim 1 , further comprising controlling the beam power of the IR laser beam to provide:a first, predetermined, continuous level of beam power for a first time duration; andsubsequently ramping down the beam power ...

METHODS OF FORMING HIGH-DENSITY ARRAYS OF HOLES IN GLASS

A method of fabricating a high-density array of holes in glass is provided, comprising providing a glass piece having a front surface, then irradiating the front surface of the glass piece with a UV laser beam focused to a focal point within +/−100 μm of the front surface of the glass piece most desirably within +/−50 μm of the front surface. The lens focusing the laser has a numerical aperture desirably in the range of from 0.1 to 0.4, more desirably in the range of from 0.1 to 0.15 for glass thickness between 0.3 mm and 0.63 mm, even more desirably in the range of from 0.12 to 0.13, so as to produce open holes extending into the glass piece 100 from the front surface 102 of the glass piece, the holes having an diameter the in range of from 5 to 15 μm, and an aspect ratio of at least 20:1. For thinner glass, in the range of from 0.1-0.3 mm, the numerical aperture is desirably from 0.25 to 0.4, more desirably from 0.25 to 0.3, and the beam is preferably focused to within +/−30 μm of the front surface of the glass. The laser is desirable operated at a repetition rate of about 15 kHz or below. An array of holes thus produced may then be enlarged by etching. The front surface may be polished prior to etching, if desired. 1. A method of fabricating a high-density array of holes in glass , the method comprising:providing a glass piece having a front surface;irradiating the front surface of the glass piece with a UV laser beam, the beam being focused by a lens within +/−100 um of the front surface of the glass piece, the lens having a numerical aperture in the range of from 0.1 to 0.4, so as to produce open holes extending into the glass piece from the front surface of the glass piece, the holes having an diameter the in range of from 5 to 15 μm, and an aspect ratio of at least 20:1.2. The method according to wherein irradiating comprises using a laser beam with a wavelength in the range of from 200-400 nm.3. The method according to wherein irradiating comprises using a ...

STRENGTHENED GLASS ARTICLES HAVING ETCHED FEATURES AND METHODS OF FORMING THE SAME

Strengthened glass articles having laser etched features, electronic devices, and methods of fabricating etched features in strengthened glass articles are disclosed. In one embodiment, a strengthened glass article includes a first strengthened surface layer and a second strengthened surface layer under a compressive stress and extending from a first surface and a second surface, respectively, of the strengthened glass article to a depth of layer, and a central region between the first strengthened surface layer and the second strengthened surface layer that is under tensile stress. The strengthened glass article further includes at least one etched feature formed by laser ablation within the first surface or the second surface having a depth that is less than the depth of layer and a surface roughness that is greater than a surface roughness of the first surface or second surface outside of the at least one etched feature. 1. A method of fabricating a strengthened glass article having an etched feature , the method comprising:providing a non-strengthened glass article comprising a first surface and a second surface;focusing a laser beam onto the first surface of the non-strengthened glass article to ablate material from the first surface;translating the laser beam relative to the non-strengthened glass article within a boundary defined by a desired etched feature, wherein translation of the laser beam ablates the material from the first surface at a depth to form the etched feature; and the strengthened glass article comprises a first strengthened surface layer and a second strengthened surface layer under a compressive stress and extending from the first surface and the second surface of the strengthened glass article, respectively, to a depth of layer, and a central region between the first strengthened surface layer and the second strengthened surface layer that is under tensile stress; and', 'the depth of the etched feature is less than the depth of layer such ...

Transparent Glass Article that is Locally Colored in its Bulk, an an Associated Method

An industrial decoration method in which a colored pattern () is made in the bulk of an article () made of transparent glass of composition including at least one metallic oxide of silver, of gold, or of copper, said method including the following successive steps: 1111. An industrial decoration method in which a colored pattern () is made in the bulk of an article () made of transparent glass of composition including at least one metallic oxide of silver , of gold , or of copper , said method including the following successive steps:a step of laser irradiating the zone of said glass article that is to be colored; anda final step of annealing the irradiated glass;{'sup': −11', '12', '2, 'and being characterized in that a glass composition is used that includes cerium and that has a total content of antimony plus tin that is less than 100 ppm, and in that the glass composition has been oxidized by the glass passing along a delivery channel having an oxidizing atmosphere, in particular having an increased presence of oxygen, and in that the step of laser irradiating the zone that is to be colored is performed with laser irradiation having a pulse duration that is less than or equal to 10s, while delivering power to the glass at greater than 10W/cm.'}2. A method according to claim 1 , which a composition is used that contains neither antimony or tin.33. A method according to in which said irradiation step is performed with the help of a laser () having a wavelength lying in the range 250 nm to 1700 nm.43. A method according to in which said irradiation step is performed with the help of a laser () having a pulse duration that is shorter than 6 ps.5325. A method according to in which said irradiation step is performed with the help of a laser () from which the beam () passes through an optical focusing system ().6111. A method according to in which the laser has an overlap ratio and the overlap ratio of the laser is caused to vary during the irradiation step in order to ...

Reed switch glass tube

A reed switch glass tube is capable of preventing, for example, chipping and cracking of end parts thereof by forming a compressive stress layer having a length (A) from an end face within a range of 0.1 mm to 0.6 mm on an outer circumference surface of the end part of the glass tube.

Wave plate and method for producing wave plate

To provide a low-cost wave plate that does not cause any diffracted light and wavefront aberrations. The challenge is met by providing a wave plate characterized by including a first region, a second region, and a third region which are placed on a glass substrate. The first region and the second region exhibit each uniaxial birefringence at least in their portions. The third region exhibits uniaxial birefringence and is interposed between the first region and the second region. Phase advance axes of birefringence of the first region and the second region are substantially parallel to each other. A phase advance axis of birefringence of the third region is substantially orthogonal to the phase advance axes of birefringence of the first and second regions.

DEVICE COMPRISING A FURNACE AND METHOD FOR THE USE THEREOF

A furnace () has at least one furnace chamber () delimited by a wall (); at least one opening () is provided in the wall (). The opening is provided with at least one nozzle (), configured to generate a sealing air flow. A glass semi-finished product () can be introduced into the furnace chamber. 11220254. Device () comprising a furnace () having at least one furnace chamber () , being is delimited by a wall () and being adapted to receive a semi-finished glass product () , wherein{'b': 25', '5', '50, 'the wall () has at least one opening (), which is provided with at least one nozzle (), said nozzle being adapted to generate a sealing air flow.'}250. Device according to claim 1 , wherein the nozzle () is a ring nozzle.32202122234. Device according to claim 1 , wherein the furnace () has a plurality of furnace chambers ( claim 1 , claim 1 , claim 1 , ) claim 1 , which are configured to be passed through sequentially by the semi-finished glass product () claim 1 , each furnace chamber configured to be brought to a different temperature.44. Device according to claim 1 , further comprising at least one thermal camera claim 1 , configured to determine temperature variation on a surface of the semi-finished glass product ().564. Device according to claim 1 , further comprising at least one embossing die () configured to re-shape the semi-finished glass product ().625020202520. Device according to claim 5 , wherein the embossing die is located in a partial volume () of the furnace chamber () claim 5 , and the device is configured to control temperature in the furnace chamber () such that a temperature of the partial volume () differs from a temperature of the remaining volume within the furnace chamber ().7606. Device according to claim 5 , wherein a complementarily shaped counter embossing die () is arranged opposite the at least one embossing die ().8330404. Device according claim 1 , further comprising at least one laser () configured to generate a laser beam () claim ...

Laser processing apparatus and laser processing method

A laser processing apparatus that condenses a laser beam into an annular shape to irradiate the condensing position of the laser beam within a thickness range of a substrate, and shifts the condensing position in such a manner that the center of the condensing position that is annular moves in a circular manner, at a stage of shifting the condensing position in a thickness direction of the substrate and a planar direction of the substrate.

TEMPERED GLASS ARTICLE WITH SUB-SURFACE LASER ENGRAVING AND PRODUCTION METHOD

A glass article is provided that has sub-surface laser engraving and a prestressing of the surface. A production method for the glass article and the use of the glass article are also provided. The sub-surface laser engraving is arranged in a partial volume of the glass article that is under tensile stress, with tempering of the glass article being performed after the introduction of the sub-surface laser engraving. 1. A glass article comprising:a surface having a compressive stress;an internal region having at least one region of compressive stress and at least one region of tensile stress; anda sub-surface laser engraving arranged in the internal region, wherein the sub-surface laser engraving is arranged in the least least one region of tensile stress.2. The glass article according to claim 1 , wherein the glass article is a thermally tempered article.3. The glass article according to claim 1 , wherein the surface has a compressive stress of at least 50 Mpa.4. The glass article according to claim 1 , wherein the surface has a compressive stress of at least 90 MPa.5. The glass article according to claim 1 , wherein the glass article is a pane with a pane thickness of 2 mm to 12 mm.6. The glass article according to claim 5 , wherein the pane thickness is 4 mm to 6 mm.7. The glass article according to claim 5 , wherein the sub-surface laser engraving is at a minimum distance from the surface of the pane thickness divided by 4.8. The glass article according to claim 5 , wherein the sub-surface laser engraving is at a minimum distance from the surface of the pane thickness divided by 3.9. The glass article according to claim 1 , wherein the sub-surface laser engraving comprises a plurality of defects each having an average size of 10 μm to 1000 μm.10. The glass article according to claim 9 , wherein the average size is 20 μm to 100 μm.11. The glass article according to claim 9 , wherein the plurality of defects together form a feature selected from the group ...

PINHOLE MITIGATION FOR OPTICAL DEVICES

Methods, apparatus, and systems for mitigating pinhole defects in optical devices such as electrochromic windows. One method mitigates a pinhole defect in an electrochromic device by identifying the site of the pinhole defect and obscuring the pinhole to make it less visually discernible. In some cases, the pinhole defect may be the result of mitigating a short-related defect 138-. (canceled)39. A method of mitigating an optical defect in an electrochromic device on a substrate incorporated into an insulated glass unit (IGU) , the method comprising:a. identifying coordinates of the optical defect in the electrochromic device; andb. applying laser energy to an area of the substrate proximal the optical defect using the identified coordinates, wherein applying the laser energy changes properties of either or both the substrate and the electrochromic device in the area to lower transmittance and/or increase scattering.40. The method of claim 39 , wherein the application of laser energy changes physical properties and/or optical properties.41. The method of claim 39 , wherein the laser energy applied in b) has more diffuse focus and/or less power than a laser energy used for ablation of the electrochromic device.42. The method of claim 39 , wherein material of the electrochromic device remains in the area after the application of laser energy in b).43. The method of claim 42 , wherein the application of laser energy in b) converts the material of the electrochromic device remaining in the area to a non-active device area.44. The method of claim 39 , wherein the application of laser energy in b) melts the material in the area to form small beads or an uneven surface.45. The method of claim 39 , wherein the application of laser energy in b) changes the morphology of the material in the area.46. The method of claim 39 , wherein applying laser energy in b) comprises melting claim 39 , ablating or otherwise changing the morphology of the substrate.47. The method of claim 39 ...

GLASS SHEET WITH IDENTIFICATION CODE

A glass sheet includes a symbol marked in the interior of the glass, the symbol forming a code. The symbol is marked in at least two dimensions including the dimension of the thickness of the glass sheet, portions of the symbol being marked at various depths in the thickness of the glass sheet. 1. A glass sheet comprising a symbol marked in an interior of the glass , the symbol forming a code;wherein the symbol is marked in at least two dimensions including a dimension of a thickness of the glass sheet, portions of the symbol being marked at various depths in the thickness of the glass sheet such that the symbol is readable both via a main face of the glass sheet and via an edge face of the glass sheet.2. The glass sheet as claimed in claim 1 , wherein each portion of the symbol is at a unique depth that is different from the depth of other rows and other columns claim 1 , respectively claim 1 , of the symbol.3. The glass sheet as claimed in claim 1 , wherein the various portions correspond to a sectioning of the symbol into various sections that are rectilinear and parallel.4. The glass sheet as claimed in claim 3 , wherein at least certain sections correspond to rows or columns of the symbol.5. The glass sheet as claimed in claim 1 , wherein the symbol is two-dimensional and of the Data Matrix claim 1 , QR Code or analogous type.6. The glass sheet as claimed in claim 1 , wherein the symbol is parallel or perpendicular to the closest edge face of the glass sheet.7. The glass sheet as claimed in claim 1 , wherein the symbol is marked in a plane inclined relative to the edge face of the glass sheet and to the main face of the glass sheet such that the symbol is identically readable both via the main face of the glass sheet and via the edge face of the glass sheet.8. The glass sheet as claimed in claim 7 , wherein said inclined plane is at 45° to said edge face of the glass sheet and to said main face of the glass sheet.9. A method for marking a symbol forming a code ...

Method for producing at least one recess in a material by means of electromagnetic radiation and subsequent etching process

A method for creating at least one recess, in particular an aperture, in a transparent or transmissive material, includes: selectively modifying the material along a beam axis by electromagnetic radiation; and creating the at least one recess by one or more etching steps, using different etching rates in a modified region and in non-modified regions. The electromagnetic radiation produces modifications having different characteristics in the material along the beam axis such that the etching process in the material is heterogeneous and the etching rates differ from one another in regions modified with different characteristics under unchanged etching conditions.

METHOD AND DEVICE FOR BONDING WORKPIECES EACH PRODUCED FROM GLASS SUBSTRATE OR QUARTZ SUBSTRATE

Vacuum ultraviolet light with a wavelength of 200 nm or less is applied on the joining surfaces of first and second workpieces made from a crystal substrate and a glass substrate, or a glass substrate and a glass substrate from a light irradiation unit. The workpieces are conveyed to a workpiece cleaning and laminating mechanism by a conveyance mechanism, the joining surfaces are subjected to mega-sonic cleaning as needed, and the workpieces are aligned with the joining surfaces thereof facing each other, and laminated such that the joining surfaces are in contact with each other. After being laminated, the laminated workpieces are conveyed to a workpiece heating mechanism and heated to increase the workpiece temperature to a predetermined temperature, and this temperature is maintained until joining is completed. The laminated workpieces are brought into a thermally expanded state upon heating, and are joined in this state. 1. A workpiece bonding method for bonding an optically polished surface of a first workpiece and an optically polished surface of a second workpiece to each other , the first and second workpieces being a glass substrate and another glass substrate , a glass substrate and a quartz substrate , or a quartz substrate and another quartz substrate , at least one of two surfaces of the first workpiece being optically polished , and at least one of two surfaces of the second workpieces being optically polished , said workpiece bonding method comprising:irradiating the optically polished surface of the first workpiece and the optically polished surface of the second workpiece with ultraviolet light having a wavelength equal to or less than 250 nm;laminating the first and second workpieces, after said irradiating, such that the optically polished surface of the first workpiece and the optically polished surface of the second workpiece contact each other; andheating the first and second workpieces, after said laminating, at a temperature equal to or ...

GLASS MEMBER FOR DISPLAY DEVICE, METHOD OF FABRICATING THE GLASS MEMBER, AND DISPLAY DEVICE INCLUDING THE GLASS MEMBER

A glass member for a display device, a method of fabricating a glass member, and a display device including a glass member are provided. A method of fabricating a glass member for a display device includes: preparing a glass substrate including a first surface, a second surface facing the first surface, and a side surface connecting the first surface to the second surface; forming a protection layer on the side surface to cover a portion of the side surface; and etching a portion of the glass substrate exposed by the protection layer. 1. A method of fabricating a glass member for a display device , the method comprising:preparing a glass substrate including a first surface, a second surface facing the first surface, and a side surface connecting the first surface and the second surface;forming a protection layer on the side surface to cover a portion of the side surface; andetching a portion of the glass substrate exposed by the protection layer.2. The method of claim 1 , wherein the forming of the protection layer comprises:coating the side surface with a curable material;curing a portion of the curable material by irradiating ultraviolet light; andremoving a remaining portion of the curable material, except for the cured portion of the curable material.3. The method of claim 2 , wherein the curing of the portion of the curable material comprises:placing a mask having an opening on the side surface coated with the curable material; andirradiating the ultraviolet light to cure a portion of the curable material exposed by the opening.4. The method of claim 3 , wherein the opening has a width from 10 μm to 200 μm.5. The method of claim 2 , further comprising irradiating ultraviolet light to the cured portion of the curable material to re-cure the cured portion of the curable material.6. The method of claim 2 , wherein the curable material comprises 30-40 wt % of an acrylic monomer claim 2 , 30-40 wt % of an acrylic oligomer claim 2 , and 20-30 wt % of a photoinitiator ...

GLASS-BASED SUBSTRATE WITH VIAS AND PROCESS OF FORMING THE SAME

A glass sensor substrate including metallizable through vias and related process is provided. The glass substrate has a first major surface, a second major surface and an average thickness of greater than 0.3 mm. A plurality of etch paths are created through the glass substrate by directing a laser at the substrate in a predetermined pattern. A plurality of through vias through the glass substrate are etched along the etch paths using a hydroxide based etching material. The hydroxide based etching material highly preferentially etches the substrate along the etch path. Each of the plurality of through vias is long compared to their diameter for example such that a ratio of the thickness of the glass substrate to a maximum diameter of each of the through vias is greater than 8 to 1. 1. A process for forming vias in a glass-based substrate having a first major surface and an opposing second major surface , the process comprising:creating a plurality of etch paths extending from the first major surface of the glass substrate by directing a laser at the substrate in a predetermined pattern; andetching a plurality of vias extending from the first major surface of the glass substrate along the etch paths using a hydroxide based etching material, wherein the hydroxide based etching material preferentially etches the substrate along the etch path such that an etch rate of the etching material along the etch path is at least 12 times greater than an etch rate of the etching material outside of the etch paths.2. The process of claim 1 , wherein each of the plurality of vias have a ratio of the length of the via to a maximum diameter of the via is greater than 8 to 1.3. The process of claim 1 , wherein at least one of the plurality of vias is a through via.4. The process of claim 1 , wherein at least one of the plurality of vias is a blind via.5. The process of claim 1 , wherein the laser is a picosecond laser.6. The process of claim 1 , wherein the maximum diameter of each of ...

GLASS MEMBER

A glass member includes a recessed portion, wherein in cross-sectional view, an angle formed between a principal surface of the glass member and an edge face of an opening of the recessed portion is 90 degrees to 130 degrees. 1. A glass member comprising:a recessed portion,wherein in cross-sectional view, an angle formed between a principal surface of the glass member and an edge face of an opening of the recessed portion is 90 degrees to 130 degrees.2. The glass member as claimed in claim 1 , wherein in cross-sectional view claim 1 , a side face of the recessed portion closer to a bottom face side than the edge face of the opening has an angle of 90 degrees to 130 degrees with respect to the principal surface of the glass member.3. The glass member as claimed in claim 1 , wherein the recessed portion is a ring-like groove or a circular dip.4. The glass member as claimed in claim 3 , wherein a roundness of an outward form of the recessed portion in plan view is less than or equal to 5% with respect to dimensions of the outward form.5. The glass member as claimed in claim 1 , wherein the recessed portion includes a linear shape in plan view.6. The glass member as claimed in claim 1 , wherein the recessed portion has a curved bottom face.7. The glass member as claimed in claim 1 , wherein a surface roughness Rq of a bottom face of the recessed portion is smaller than a surface roughness Rq of a side face of the recessed portion.8. The glass member as claimed in claim 1 , wherein a ratio of a depth of the recessed portion to a thickness of the glass member is 0.05 to 0.5.9. The glass member as claimed in claim 1 , wherein in plan view claim 1 , an outward form of the glass member is free of any straight portions in a positional relationship of being parallel or orthogonal to each other.101. The glass member as claimed in claim 9 , wherein in plan view claim 9 , the outward form of the glass member is free of any straight portions.11. The glass member as claimed in ...

LASER CONTROLLED ION EXCHANGE PROCESS AND GLASS ARTICLES FORMED THEREFROM

A method for forming ion-exchanged regions in a glass article by contacting an ion source with at least one surface of the glass article, forming a first ion-exchanged region in the glass article by heating a first portion of the glass article with a laser, and forming a second ion-exchanged region in the glass article. Characteristics of the first ion-exchanged region may be different from characteristics of the second ion-exchanged region. A depth of the ion-exchanged region may be greater than 1 μm. A glass article including a first ion-exchanged region, and a second ion-exchanged region having different characteristics from the first ion-exchanged region. The thickness of the glass article is less than or equal to about 0.5 mm. 1. A method for forming ion-exchanged regions in a glass article , the method comprising:contacting an ion exchange source with at least one surface of the glass article;forming a first ion-exchanged region in the glass article by heating a first portion of the glass article with a local heat source, wherein the first ion-exchanged region comprises a first compressive stress; andforming a second ion-exchanged region in the glass article at a second portion of the glass article, wherein the second ion-exchanged region comprises a second compressive stress that is different from the first compressive stress,wherein at least a portion of the first ion-exchanged region is located at an edge face of the glass article, the second ion-exchanged region is located at a major surface of the glass article, and a concentration of ions in the first ion-exchanged region is greater than a concentration of ions in the second ion exchange region.2. The method of claim 1 , wherein a depth of the first ion-exchanged region is different than a depth of the second ion-exchanged region.3. The method of claim 1 , wherein a depth of each of the first and second ion-exchanged regions is from about 5 μm to about 60 μm.4. The method of claim 1 , wherein the glass ...

LASER-COLORED SAPPHIRE MATERIAL

A colored sapphire material and methods for coloring sapphire material using lasers are disclosed. The method for coloring the sapphire material may include positioning the sapphire material over an opaque substrate material, exposing the opaque substrate material to a laser beam passing through the sapphire material to impact the substrate material, and inducing a chemical change in a portion of the sapphire material exposed to the laser beam. The method may also include creating a visible color in the portion of the sapphire material as a result of the chemical change. The colored sapphire material may include a first transparent portion, and a second, colored portion substantially surrounded by the first portion. The second, colored portion may have a chemical composition different than that of the first portion. 1. A sapphire component , comprising:a first portion; anda second portion integrally formed with the first portion and having a chemical composition that is distinct from the first portion, wherein:the second portion is optically contrasted with respect to the first portion.2. The sapphire component of claim 1 , wherein:the first portion is substantially transparent; andthe second portion is substantially opaque and defines a visible color distinct from a color of the first portion.3. The sapphire component of claim 1 , wherein the second portion has an oxygen content that is distinct from an oxygen content of the first portion.4. The sapphire component of claim 1 , wherein:the first portion defines a primary surface of the sapphire component; andthe first and second portions define a second surface of the sapphire component.5. The sapphire component of claim 4 , wherein the second portion extends from the secondary surface and towards the primary surface.6. The sapphire component of claim 5 , wherein a chemical composition of the second portion varies between the primary and secondary surfaces.7. An electronic device claim 5 , comprising:an exterior ...

Method for Producing a Bird Protection Device and Bird Protection Device

The invention relates to a method for producing a bird protection device arid to a bird protection device. According to the invention, a method for producing a bird protection device is proposed, wherein the bird protection device is made of an at least partially transparent material and contains an optical structure visible to a bird's eye. Here, the method comprises a radiation input, wherein the radiation input is implemented on and/or in the partially transparent material for forming the optical structure. The radiation input is preferably laser radiation. Suitable lasers for the radiation input are, for example, CO2 lasers with a wavelength of 1064 nm, picosecond lasers with a wavelength of 532 nm or nanosecond lasers with a wavelength of 532 nm. In one embodiment of the invention, the bird protection device furthermore comprises an element for increasing the contrast, wherein, for forming the optical structure, the radiation input is implemented on and/or in the element for increasing the contrast. 1. A method for producing a bird protection device , comprising the steps of:forming the bird protection device of an at least partially transparent material, andproviding an optical structure visible for a bird's eye, with a source of radiation, wherein the radiation is applied for forming the optical structure on and/or in the partially transparent material.2. The method for producing a bird protection device according to claim 1 , further comprising an element for contrast enhancement claim 1 , wherein for forming the optical structure the radiation is applied on and/or in the element for contrast enhancement.3. The method for producing a bird protection device according to claim 1 , wherein the optical structure is formed by employing laser radiation on and/or in the partially transparent material.4. The method for producing a bird protection device according to claim 1 , wherein the application of radiation into the optical structure causes a local change of ...

GLASS BUMPS ON GLASS ARTICLES AND METHODS OF LASER-INDUCED GROWTH

A glass article having a glass bump formed integrally thereon by laser-irradiation methods. The glass bump includes a lower region connected to an upper region by an inflection region. The lower region projects from a surface of the glass article and is defined by concavely rounded sides with a radius of curvature R. The upper region includes a transition portion and a top portion. The transition portion is defined by convexly rounded sides with a radius of curvature R. The transition portion connects to the lower portion via the inflection region. The upper portion connects to the transition portion and is defined by a convexly rounded top surface with a radius of curvature R, which is greater than radius of curvature R 1. A glass article comprising:a glass surface having a glass bump thereon, wherein the glass bump comprises:{'b': 1', '1', '1, 'a lower region comprising a diameter D defined by concavely rounded sides, wherein the lower region projects from the surface of the glass article, wherein diameter D is the glass bump maximum diameter, wherein the concavely rounded sides have a radius of curvature R and join with the glass article surface;'}an inflection region connecting the lower region of the glass bump and an upper region of the glass bump; [{'b': 2', '2', '2', '1, 'the transition portion comprising a diameter D defined by convexly rounded sides, wherein the convexly rounded sides have a radius of curvature R, wherein diameter D is less than diameter D; and'}, {'b': 3', '3', '2', '3', '2, 'the top portion comprising a diameter D defined by a convexly rounded top surface, the convexly rounded top surface joining with the convexly rounded sides converging from the transition portion, wherein the convexly rounded top surface has a radius of curvature R from about 900 microns to about 2600 microns which is greater than the radius of curvature R, wherein diameter D is less than diameter D, wherein the convexly rounded top surface is spaced apart from the ...

METHODS FOR CONTROLLED LASER-INDUCED GROWTH OF GLASS BUMPS ON GLASS ARTICLES

A method for controlling formation of glass bumps in a glass article with laser-irradiation without the use of a growth-limiting structure. Standard deviation of height between the glass bumps on the article is less than 1 micron by controlling the laser radiation dose provided on the glass article. 120-. (canceled)21. A glass article including a plurality of glass bumps formed on a surface of the glass article , each glass bump having a height spaced apart from the glass article surface , at least one of the plurality of glass bumps comprising:{'b': 1', '1', '1, 'a lower region comprising a diameter D defined by concavely rounded sides, wherein the lower region projects from the surface of the glass pane, wherein diameter D is the glass bump maximum diameter, wherein the concavely rounded sides have a radius of curvature R and join with the glass article surface;'}an inflection region connecting the lower region of the glass bump and an upper region of the glass bump; [{'b': 2', '2', '2', '1, 'the transition portion comprising a diameter D defined by convexly rounded sides, wherein the convexly rounded sides have a radius of curvature R, wherein diameter D is less than diameter D; and'}, {'b': 3', '3', '2', '3', '2, 'the top portion comprising a diameter D defined by a convexly rounded top surface, the convexly rounded top surface joining with the convexly rounded sides converging from the transition portion, wherein the convexly rounded top surface has a radius of curvature R from about 600 microns to about 750 microns which is greater than the radius of curvature R, wherein diameter D is less than diameter D, wherein the convexly rounded top surface is spaced apart from the glass article surface defining a height H of the glass bump.'}], 'the upper region of the glass bump comprising a transition portion and a top portion;'}22. The glass article of wherein a standard deviation of height between the plurality of glass bumps is less than 1 micron.23. The glass ...

METHODS FOR CONTROLLED LASER-INDUCED GROWTH OF GLASS BUMPS ON GLASS ARTICLES

A method for controlling formation of glass bumps in a glass article with laser-irradiation without the use of a growth-limiting structure. Standard deviation of height between the glass bumps on the article is less than 1 micron by controlling the laser radiation dose provided on the glass article. 1. A method of forming a glass article comprising a plurality of glass bumps , the glass article having a surface , the glass bumps formed in the glass article by laser radiation , each glass bump having a terminal point at a distance from the glass article surface , the method comprising:irradiating the glass article with laser radiation at a plurality of localities to induce growth of the glass bumps at the plurality of localities on the glass article;detecting a flash of light from the laser irradiated localities on the glass article with a photodetector that generates an electronic signal;setting a fixed exposure time for the laser radiation at the plurality of localities for after the flash of light is detected; andcontrolling a laser irradiation dose at the plurality of localities and the distance between each glass bump terminal point and the glass article surface, using the electronic signal, by terminating laser radiation of the localities the fixed exposure time after a controller receives the electronic signal.2. The method of wherein the plurality of glass bumps includes at least 5 glass bumps.3. The method of wherein each of the plurality glass bumps include a hemispherical lateral cross-section claim 1 , wherein each lateral cross-section substantially corresponds to a general circle curve equation with a coefficient of determination from 0.9 to 0.99.4. The method of wherein the standard deviation of the distance between the glass article surface and the terminal points of the plurality of glass bumps is less than 1 micron.5. The method of wherein the standard deviation of the distance between the glass article surface and the terminal points of the ...

GLASS FOR LASER PROCESSING AND METHOD FOR PRODUCING PERFORATED GLASS USING SAME

The present invention provides a glass composition that allows holes with a circular contour and a smooth inner wall to be formed by a collective micro-hole-forming process using a combination of modified portion formation by ultraviolet laser irradiation and etching, the glass composition being adapted for practical continuous production. The present invention relates to a glass for laser processing, the glass having a glass composition including, in mol %: 45.0%≦SiO≦70.0%; 2.0%≦BO≦20.0%; 3.0%≦AlO≦20.0%; 0.1%≦CuO≦2.0%; 0%≦TiO≦15.0%; and 0%≦ZnO≦9.0%, wherein a relationship of 0≦LiO+NaO+KO<2.0% is satisfied. 1. A glass for laser processing , the glass having a glass composition comprising , in mol %:{'sub': '2', '45.0%≦SiO≦70.0%;'}{'sub': 2', '3, '2.0%≦BO≦20.0%;'}{'sub': 2', '3, '3.0%≦AlO≦20.0%;'}0.1%≦CuO≦2.0%;{'sub': '2', '0%≦TiO≦15.0%; and'}0%≦ZnO≦9.0%,{'sub': 2', '2', '2, 'wherein a relationship of 0≦LiO+NaO+KO<2.0% is satisfied.'}2. The glass for laser processing according to claim 1 , wherein a relationship of 55.0%≦SiO+BO≦80.0% is satisfied.3. The glass for laser processing according to claim 1 , wherein a relationship of 6.0%≦MgO+CaO+SrO+BaO≦25.0% is satisfied.4. The glass for laser processing according to claim 1 , wherein a relationship of 5.0≦AlO/CuO≦60.0 is satisfied.5. The glass for laser processing according to claim 1 , further comprising claim 1 , as a coloring component claim 1 , an oxide of at least one metal selected from the group consisting of Fe claim 1 , Ce claim 1 , Bi claim 1 , W claim 1 , Mo claim 1 , Co claim 1 , Mn claim 1 , Cr claim 1 , and V.6. The glass for laser processing according to claim 1 , whereinthe glass composition comprises, in mol %:{'sub': '2', '45.0%≦SiO≦68.0%;'}{'sub': 2', '3, '2.0%≦BO≦20.0%;'}{'sub': 2', '3, '3.0%≦AlO≦20.0%; and'}0.1%≦CuO≦2.0%,{'sub': '2', 'the glass composition is substantially free of TiOand ZnO, and'}the following relationships are satisfied:{'sub': 2', '2', '3, '58.0%≦SiO+BO≦80.0%;'}8.0%≦MgO+CaO+SrO+ ...

COMPOSITIONAL MODIFICATION OF GLASS ARTICLES THROUGH LASER HEATING AND METHODS FOR MAKING THE SAME

Glass articles and methods for modifying a composition of a surface portion of the glass article are disclosed. The method includes heating the surface portion of the glass article with a laser beam to a temperature within a range of about 1100?C to about 2200?C such that the heating evaporates one or more metalloids and/or one or more alkali metals present at the surface portion, and modifies the composition of the surface portion such that the surface portion has a lower alkali metals concentration and/or a lower metalloids concentration as compared to a portion of the glass article that is not heated by the laser beam. 1. A method of modifying a composition of a surface portion of a glass article , the method comprising heating the surface portion of the glass article with a laser beam to a temperature within a range of about 1100° C. to about 2200° C. , such that the heating evaporates one or more metalloids and/or one or more alkali metals present at the surface portion , and modifies the composition of the surface portion such that the surface portion comprises a lower alkali metals concentration and/or a lower metalloids concentration as compared to a portion of the glass article that is not heated by the laser beam.2. The method of claim 1 , further comprising preheating the glass article to a temperature within a range of about 50° C. to about 900° C. before heating the surface portion of the glass article with the laser beam.3. The method of claim 1 , wherein heating the surface portion of the glass article with the laser beam comprises scanning the laser beam along the surface portion of the glass article using a rotating polygon mirror.4. The method of any one of claim 1 , wherein the laser beam has a scan frequency within a range of about 10 kHz to about 100 Hz.5. The method of any one of claim 1 , wherein the laser beam is focused on the surface portion of the glass article using an f-theta lens.6. The method of any one of claim 1 , wherein the laser ...

METHOD OF MAKING A LENSED CONNECTOR WITH PHOTOSENSITIVE GLASS

The present disclosure relates to a method of making a lensed connector in which a glass ferrule has holes within the body of the glass ferrule, and the glass ferrule is subsequently processed to form lens structures along the ferrule. 1. A method of making a lensed connector comprising:inserting a light occluding agent into at least one hole of a ferrule made of glass, wherein the at least one hole extends partially through the ferrule from a first surface;applying UV light onto the first surface of the ferrule such that the light occluding agent prevents a portion of the ferrule from being treated by the UV light, thereby forming an untreated portion of the ferrule;removing the light occluding agent from the ferrule; andthermally developing the ferrule such that the untreated portion of the ferrule forms a dome shaped lens structure protruding from a second surface of the ferrule, wherein the second surface is opposite the first surface.2. The method of claim 1 , further including:inserting an optical fiber into the at least one hole; andbonding the optical fiber to the lens structure within the at least one hole with an adhesive.3. The method of claim 1 , wherein the hole extends into between 25% and 80% of a thickness of the ferrule.4. The method of claim 1 , wherein the dome shaped lens structure has a sag height ranging between 4.5 μm and 13 μm.5. The method of claim 1 , wherein the UV light has a wavelength ranging between 300 nm and 340 nm.6. The method of claim 1 , wherein the glass ferrule comprises a photosensitive glass.7. The method of claim 6 , wherein during the thermally developing claim 6 , the untreated portion of the ferrule softens and the photosensitive glass of the ferrule surrounding the untreated portion shrinks in volume to squeeze the untreated portion and form the dome shaped lens structure.8. The method of claim 2 , wherein the hole is substantially circular in shape having a center and an outer surface with at least one protuberance ...

METHOD FOR STRUCTURING A TRANSPARENT SUBSTRATE WITH A LASER IN A BURST MODE

Method for structuring a top surface of a transparent substrate, the substrate being transparent to visible light with a laser source able to emit a laser beam in a burst mode, the burst mode being characterized by a train of pulses comprising sets of laser pulses repeated over time; wherein each of the sets of laser pulses of the train of pulses comprises a first and second pulses with a time interval between them comprised between 5 ns to 50 ns, preferably between 10 ns to 40 ns, and more preferably about 25 ns; wherein each of the first and second pulses has an energy density on the top surface comprised between 0.5 nJ/umand 50 nJ/um; and wherein the train of pulses is able to structure the top surface. 1. A method for structuring a top surface of a transparent substrate , said substrate being transparent to visible light , the method comprising the steps of:(a) providing said transparent substrate with said top surface;(b) providing a laser machining device comprising a laser source able to emit a laser beam in a burst mode, said burst mode being characterized by a train of pulses comprising sets of laser pulses repeated over time; wherein said laser source is a femtosecond laser source;', 'wherein each of said sets of laser pulses of said train of pulses comprises a first and second pulse with a time interval between them between 5 ns to 50 ns;', {'sup': 2', '2, 'wherein each of said first and second pulses has an energy density on said top surface between 0.5 nJ/umand 50 nJ/um; and'}, 'wherein said train of pulses is configured to structure said top surface., '(c) using said laser source for irradiating said transparent substrate from the top surface with a laser beam according to said burst mode;'}2. The method according to further comprising claim 1 , before step (c) claim 1 , the additional step of:determining an ablation threshold of said transparent substrate being defined by an energy density per pulse;wherein said first and second pulses have an energy ...

METHOD OF MATERIAL PROCESSING BY LASER FILAMENTATION

A method is provided for the internal processing of a transparent substrate in preparation for a cleaving step. The substrate is irradiated with a focused laser beam that is comprised of pulses having an energy and pulse duration selected to produce a filament within the substrate. The substrate is translated relative to the laser beam to irradiate the substrate and produce an additional filament at one or more additional locations. The resulting filaments form an array defining an internally scribed path for cleaving said substrate. Laser beam parameters may be varied to adjust the filament length and position, and to optionally introduce V-channels or grooves, rendering bevels to the laser-cleaved edges. Preferably, the laser pulses are delivered in a burst train for lowering the energy threshold for filament formation and increasing the filament length. 124-. (canceled)25. A method of preparing a substrate for cleavage , the method comprising the steps of:irradiating said substrate with a single pulse of a focused laser beam, wherein said substrate is transparent to said focused laser beam, and wherein said single pulse has an energy and pulse duration selected to produce a single continuous filament within said substrate;translating said substrate relative to said focused laser beam to irradiate said substrate and produce additional single continuous filaments at locations in said substrate;said single continuous filaments form an array defining an internally scribed path for cleaving said substrate;each said single pulse of said focused laser beam is focused to provide a sufficient beam intensity within said substrate to cause self-focusing of the focused laser beam over an extended laser interaction focal volume, thereby producing a plasma channel within said substrate while avoiding optical breakdown, such that substantially uniform modification of said material occurs along said beam path, thereby forming a single continuous filament within said substrate; ...

METHOD FOR MODIFYING THE TRANSMISSION OF GLASSES AND GLASS CERAMICS AND GLASS OR GLASS CERAMIC ARTICLES THAT CAN BE PRODUCED ACCORDING TO THE METHOD

A product is provided that includes a volume-colored monolithic glass or glass ceramic element and to a method for producing same. The glass or glass ceramic element has a first region in which the coloration is modified so that light transmission of the first region differs from light transmission of a second, adjacent region. The light scattering in the region of modified coloration in the glass or glass ceramic remains the same as light scattering in the second, adjacent region with non-modified light transmission. 120. A method for producing a glass or glass ceramic article with locally modified transmission , wherein light scattering in a first region of the glass or glass ceramic differs from light scattering in a second region of the glass or glass ceramic by not more than percentage points , the method comprising:providing the glass or glass ceramic article which is volume-colored by color centers or coloring ions; anddirecting electromagnetic radiation onto a localized surface area of the glass or glass ceramic article, the electromagnetic radiation being absorbed in the material of the glass or glass ceramic article in an irradiated region; andchoosing a power density of the electromagnetic radiation such that a region of the glass or glass ceramic article is heated up by the electromagnetic radiation, wherein heating of the region is performed at least until an absorption coefficient and thus a light transmission of the material of the glass or glass ceramic article is modified in the region, at least in a spectral range;cooling the surface of the glass or glass ceramic article with a cooling fluid during exposure to the electromagnetic radiation;terminating the irradiation of electromagnetic radiation after heating; andcooling the region at a cooling rate of at least 1 K per second at least within a temperature range between a maximum temperature and 100 K below the maximum temperature.2. The method as claimed in claim 1 , wherein electromagnetic ...

THROUGH ELECTRODE SUBSTRATE AND SEMICONDUCTOR DEVICE

A through electrode substrate includes a substrate having a through hole extending through between a first face and a second face, a diameter of the through hole not having a minimum value inside the through hole; and a conductor arranged inside the through hole, wherein the through hole has a shape having a value obtained by summing a first to an eighth inclination angle at a first to an eighth position, respectively, of an inner face of the through hole of 8.0° or more, each of the first to the eighth inclination angle is an angle of the inner face with respect to a center axis of the through hole, and the first to the eighth position correspond to positions at distances of 6.25%, 18.75%, 31.25%, 43.75%, 56.25%, 68.75%, 81.25%, and 93.75%, respectively, from the first face in a section from the first face to the second face. 1. A through electrode substrate comprising:a substrate having a first face and a second face, the substrate having a through hole extending through between the first face and the second face, a diameter of the through hole not having a minimum value inside of the through hole, such that the inside of the through hole is defined by an area between a top edge of a first opening of the through hole and a bottom edge of a second opening of the through hole; anda conductor arranged along an inner face of the through hole, whereinan insulation region surrounded by the conductor is arranged inside the through hole,the through hole has a shape having a value obtained by summing a first inclination angle to an eighth inclination angle at a first position to an eighth position, respectively, of the inner face of 8.0° or more,each of the first inclination angle to the eighth inclination angle is an angle of the inner face with respect to a center axis of the through hole, and an angle expanding toward the first face is defined as a positive, andthe first position to the eighth position correspond to positions at distances of 6.25%, 18.75%, 31.25%, 43.75 ...

METHODS OF FABRICATING CHANNELS IN GLASS ARTICLES BY LASER DAMAGE AND ETCHING AND ARTICLES MADE THEREFROM

A method for forming a glass article and the corresponding glass article are provided. The method for forming a glass article includes providing a glass substrate sheet, and translating a pulsed laser beam on the glass substrate sheet. The pulsed laser forms a laser damage region extending from first surface of the glass substrate sheet a mid-point of the glass substrate sheet. The method further includes contacting the glass substrate sheet with an etchant solution to form channels at the laser damage region, the channels having width and depth dimensions of less than 150 μm. The glass article includes a first surface, a second surface, a channel extending from the first surface to point between the first surface and the second surface. The channel has width and height dimensions less than about 150 μm. 1. A method of forming a glass article , comprising:providing a glass substrate sheet;translating a pulsed laser beam on the glass substrate sheet to form a laser damage region extending from a surface of the glass substrate sheet to a mid-point of the glass substrate sheet; andcontacting the glass substrate sheet with an etchant solution,wherein after the contacting of the glass substrate sheet with the etchant solution, the laser damage regions form channels having width and depth dimensions of less than 150 μm.2. The method of claim 1 , wherein the channels have a width from about 25 μm to about 125 μm.3. The method of claim 1 , wherein the channels have a depth from about 25 μm to about 125 μm.4. The method of claim 1 , wherein the channels have width and depth dimensions from about 30 μm to about 100 μm.5. The method of claim 1 , wherein a tolerance of the width and depth dimensions of the channels is less than about ±35 μm.6. The method of claim 1 , wherein a tolerance of the width and depth dimensions of the channels is less than about ±30 μm.7. The method of claim 1 , further comprising chemically strengthening the glass substrate sheet.8. The method of ...

HIGH-SPEED MICRO-HOLE FABRICATION IN GLASS

A method for fabricating a high-density array of holes in glass comprises providing a glass sheet having a front surface and irradiating the glass sheet with a laser beam so as to produce open holes extending into the glass sheet from the front surface of the glass sheet. The beam creates thermally induced residual stress within the glass around the holes, and after irradiating, the glass sheet is annealed to eliminate or reduce thermal stress caused by the step of irradiating. The glass sheet is then etched to produce the final hole size. Preferably, the glass sheet is also annealed before the step of irradiating, at sufficiently high temperature for a sufficient time to render the glass sheet dimensionally stable during the step of annealing after irradiating. 1. A method of fabricating a high-density array of holes in glass , the method comprising:providing a glass sheet having a front surface;irradiating the glass sheet with a laser beam so as to produce open holes extending into the glass sheet from the front surface of the glass sheet, the beam creating thermally induced residual stress within the glass around the holes;annealing the glass sheet, after irradiating, to eliminate or reduce thermal stress caused by the step of irradiating;etching the glass sheet.2. The method of wherein the beam used in the step of irradiating the glass sheet is focused by a lens within +/−100 um of the front surface of the glass sheet claim 1 , the lens having a numerical aperture in the range of from 0.1 to 0.3.3. The method according to wherein the beam used in the step of irradiating is a UV laser beam producing radiation having a wavelength in the range of from 300 to 400 nm.4. The method according to claim 1 , further comprising the step of compacting the glass sheet claim 1 , before irradiating claim 1 , by annealing the glass sheet.5. The method according to wherein the step of compacting comprises annealing at sufficiently high temperature for a sufficient time to render ...

METHOD FOR MANUFACTURING A PARTIALLY TEXTURED GLASS ARTICLE

A method of manufacturing a partially textured glass article that includes (a) providing partially textured mother glass substrate that includes a first main surface and a second main surface which are opposed to each other; (b) irradiating the first main surface of the glass substrate with a laser to form a separating line on the first main surface that defines contour lines and extends from the first main surface to the second main surface dividing the glass article from the glass substrate, the glass article being a size smaller than the mother glass substrate; and (c) separating the partially textured glass article is separated from the mother glass substrate by the separating line. The method allows cutting a large partially textured mother glass substrate, with high precision, into smaller articles of partially textured glass at a requested size. 1: A method of manufacturing a partially textured glass article comprising:a) providing a partially textured mother glass substrate having a first main surface and a second main surface which are opposed to each other,b) irradiating the first main surface of the mother glass substrate with a laser to form, on the first main surface, at least one separating line defining contour lines and extending in a depth direction from the first main surface to the second main surface, for dividing the partially textured glass article from the glass substrate, the partially textured glass article being a size smaller than a size of the mother glass substrate, andc) separating the partially textured glass article from the mother glass substrate according to the separating line.2: The method according to claim 1 , wherein the separating line comprises a plurality of adjacent voids forming a spot-cutting line.3: The method according to claim 1 , wherein between b) irradiating and c) separating claim 1 , the mother glass substrate is chemically strengthened.4: The partially textured glass article according to claim 1 , wherein the ...

Glass core substrate and method for manufacturing the same

Disclosed herein are a glass core substrate and a method for manufacturing the same. According to an embodiment of the present invention, there is provided the glass core substrate including: a glass core laminate including a glass layer and insulating layers which are stacked on upper and lower portions of the glass layer; a through hole formed by penetrating through the glass core laminate and provided with at least one crack which is formed at a penetrating inner wall by penetrating into the glass layer; and a conductive material filled in the through hole and the crack. Further, the method for manufacturing a glass core substrate is provided.

LOW-EMISSIVITY COATED GLASS FOR IMPROVING RADIO FREQUENCY SIGNAL TRANSMISSION

Modified low emissivity (low-E) coated glass, so that windows using the processed glass allow uninterrupted use of RF devices within commercial or residential buildings. Glass processed in the manner described herein will not significantly diminish the energy conserving properties of the low-E coated glass. This method and apparatus disrupts the conductivity of the coating in small regions. In an embodiment, the method and apparatus ablates the low-E coating along narrow contiguous paths, such that electrical conductivity can no longer occur across the paths. The paths may take the form of intersecting curves and/or lines, so that the remaining coating consists of electrically isolated areas. The method and apparatus are applicable both to treating glass panels at the factory as well as treating windows in-situ after installation. 1. A sheet of glass , having a low emissivity (low-E) coating thereon , wherein a portion of the low-E coating is absent in a pattern of intersecting lines or curves between 10 and 40 microns in width , where all the lines or curves are interconnected and a plurality of areas of the coating remain and are permanently electrically isolated from each other , wherein the absence of the coating is of a size and shape such that the coated sheet of glass allows transmission , through the glass , of cellular and wireless local area network radio signals with an insertion loss of 10 dB or less.2. The sheet of glass of claim 1 , wherein the total area of the remaining low-E coating comprises 95% or more of the area of the sheet of glass claim 1 , and the area of the sheet of glass where the low-E coating is absent comprises 5% or less of the total area of the sheet of glass.3. The sheet of glass of claim 1 , wherein the lines or curves are created using a laser to ablate the low-E coating.4. The sheet of glass of claim 1 , wherein the portion of the low-E coating is absent in a grid pattern and the spacing of the grid pattern is between 2 mm and 10 ...

FRIT SEALING SYSTEM

Provided is a frit sealing system for attaching a first substrate and a second substrate by using a frit. The frit sealing system includes a laser irradiation member configured to irradiate a laser on the frit between the first substrate and the second substrate, and a pressurization member on the second substrate, the pressurization member being configured to apply pressure to the second substrate during the irradiation of the laser, the pressurization member including base, and an elastic portion connected to the base and contacting the second substrate. 1. A frit sealing system for attaching a first substrate and a second substrate by using a frit , the frit sealing system comprising:laser irradiation member configured to irradiate a laser on the frit between the first substrate and the second substrate; and a base, and', 'an elastic portion connected to the base and contacting the second substrate., 'a pressurization member on the second substrate, the pressurization member being configured to apply pressure to the second substrate during the irradiation of the laser, the pressurization member including2. The frit sealing system as claimed in claim 1 , further comprising a space between the base and the elastic portion claim 1 , the space including fluid.3. The frit sealing system as claimed in claim 2 , wherein claim 2 , when the fluid fills the space between the base and the elastic portion claim 2 , the elastic portion is configured to apply pressure to the second substrate.4. The frit sealing system as claimed in claim 2 , wherein the elastic portion includes material that transmits the laser.5. The frit sealing system as claimed in claim 4 , wherein the laser is configured to pass through the base claim 4 , the fluid claim 4 , the elastic portion claim 4 , and the second substrate to be irradiated on the frit.6. The fit sealing system as claimed in claim 2 , further comprising a transmission portion connected to the elastic portion claim 2 , the ...

Substrate For Changing Color Of Light Emitting Diode And Method For Producing Same

The present invention relates to a substrate for changing the color of a light emitting diode and a method for producing same and, more particularly, to a substrate for changing the color of a light emitting diode and a method for producing same, wherein the substrate may be hermetically sealed so that quantum dots (QD) contained inside may be completely protected from the outside and emission efficiency of the light emitting diode may be enhanced. Thus, the present invention provides a substrate for changing the color of a light emitting diode, and a method for producing same, wherein the substrate is characterized by including: a first glass substrate disposed on the light emitting diode; a second glass substrate formed opposite to the first substrate; a structure which is disposed between the first substrate and the second substrate, has hollows, and includes a material having a coefficient of thermal expansion (CTE) of 30-80×10/° C.; QDs to fill the hollows; and sealing materials respectively formed between the first substrate and a bottom face of the structure and between the second substrate and a top face of the structure. 1. A color conversion substrate for a light-emitting diode comprising:a first glass substrate disposed over the light-emitting diode;a second glass substrate facing the first glass substrate;{'sup': −7', '−7, 'a structural body disposed between the first glass substrate and the second glass substrate, the structural body having an opening, and comprising a material, a coefficient of thermal expansion of which ranges from to 30*10/° C. to 80*10/° C.;'}a quantum dot accommodated in the opening of the structural body; andan sealant disposed between the first glass substrate and a bottom surface of the structural body and between the second glass substrate and a top surface of the structural body.2. The color conversion substrate according to claim 1 , wherein the structural body is white.3. The color conversion substrate according to claim 2 , ...

LASER CONTROLLED ION EXCHANGE PROCESS AND GLASS ARTICLES FORMED THEREFROM

A method for forming ion-exchanged regions in a glass article by contacting an ion source with at least one surface of the glass article, forming a first ion-exchanged region in the glass article by heating a first portion of the glass article with a laser, and forming a second ion-exchanged region in the glass article. Characteristics of the first ion-exchanged region may be different from characteristics of the second ion-exchanged region. A depth of the ion-exchanged region may be greater than 1 μm. A glass article including a first ion-exchanged region, and a second ion-exchanged region having different characteristics from the first ion-exchanged region. The thickness of the glass article is less than or equal to about 0.5 mm. 1. A method for forming ion-exchanged regions in a glass article , the method comprising:contacting an ion exchange source with at least one surface of the glass article;forming a first ion-exchanged region in the glass article by heating a first portion of the glass article with a laser; andforming a second ion-exchanged region in the glass article,wherein at least one characteristic of the first ion-exchanged region is different from a characteristic of the second ion-exchanged region.2. The method of claim 1 , wherein a depth of the first ion-exchanged region is different than a depth of the second ion-exchanged region.3. The method of claim 1 , wherein a concentration of ions at an edge of the glass article is different than a concentration of ions at a center of the glass article.4. The method of claim 1 , wherein a depth of each of the first and second ion-exchanged regions is from about 5 μm to about 60 μm.5. The method of claim 1 , wherein the glass article does not contain any alkali metal ions.6. The method of claim 1 , wherein the ion exchange source is selected from the group consisting of KNO claim 1 , NaNO claim 1 , and AgNO.7. The method of claim 1 , wherein the laser is selected from the group consisting of a CO laser ...

Method of Manufacture of Copper-doped Glasses

A method of making a copper-doped glass comprising placing a target glass in a container, placing a target glass in a container, surrounding the target glass with a powder mixture comprised of fused silica (SiO) powder and copper sulfide (CuS) powder, such that both the target glass and the surrounding powder are contained in the container, and heating the container and the target glass and the surrounding powder mixture to a temperature of between 800° C. and 1150° C. 1. A method of making a copper-doped glass comprising the steps of:placing a target glass in a container;{'sub': 2', '2, 'surrounding the target glass with a powder mixture comprised of fused silica (SiO) powder and copper sulfide (CuS) powder, such that both the target glass and the surrounding powder are contained in the container; and'}heating the container and the target glass and the surrounding powder mixture to a temperature of between 800° C. and 1150° C.2. The method of making a copper-doped glass of wherein the powder mixture is comprised of a SiOpowder and Cus powder mixed according to the formula (SiO)(CuS) claim 1 , where 0.01 Подробнее

Decorative object, in particular watch glass, with an optical effect

Disclosed is a decorative object including an upper glass, a lower glass, a recessed pattern formed in the lower glass and facing the upper glass, a liquid filling the recessed pattern, the refractive index of the liquid being equal to that of the lower glass or differing from that of the lower glass by at most 10%, and solid elements which can move in the liquid.

PORTABLE DEFECT MITIGATOR FOR ELECTROCHROMIC WINDOWS

Portable apparatus for identifying and mitigating defects in electronic devices disposed on substrates or windows are disclosed herein. Such defects can be visually perceived by the end user. The substrates or windows may include flat panel displays, photovoltaic windows, electrochromic devices, and the like, particularly electrochromic windows. 131-. (canceled)32. A portable apparatus for mitigating a defect in an electrochromic device on a window , the portable apparatus comprising:a first mechanism configured to detect the defect;a second mechanism configured to mitigate the defect;a third mechanism configured to align the portable apparatus with the window; andan illumination mechanism configured to illuminate the defect in the electrochromic device on the window and to substantially block energy from the second mechanism with a backstop when the second mechanism is mitigating the defect, the illumination mechanism being positioned on a first side of the window, and the first mechanism, the second mechanism, and the third mechanism being positioned on a second side of the window, opposite the first side.33. The portable apparatus of claim 32 , wherein:the first mechanism comprises at least one of a microscope, a camera, and a photo detector, andthe second mechanism comprises at least one of a laser, a heat source, an induction coil, a microwave source, and a voltage source.34. The portable apparatus of claim 32 , wherein the portable apparatus is configured to mount to the window.35. The portable apparatus of claim 32 , wherein the third mechanism includes a movable stage configured to align the first and second mechanisms.36. The portable apparatus of claim 32 , configured to mount to the window using suction.37. The portable apparatus of claim 32 , wherein the first mechanism employs at least one of reflection claim 32 , scattering claim 32 , and refraction to identify a defect signature.38. The portable apparatus of claim 32 , further comprising a controller ...

METHODS FOR MAKING OPTICAL DEVICES

Described herein are methods for constructing optical device without the need of chemical adhesives. The methods involve performing the following steps: obtaining a first optical substrate comprising a first surface and a second optical substrate comprising a second surface; applying water to the first surface of the first optical substrate, to the second surface of the second optical substrate, or both; securing the first optical substrate to the second optical substrate, wherein the first surface of the first optical substrate is adjacent to the second surface of the second optical substrate; and applying deep ultraviolet radiation to the first optical substrate and the second optical substrate to form a bond without the use of adhesive. Also provided are optical devices constructed by the methods described herein. 1. A method for producing an optical device comprising:(a) obtaining a first optical substrate comprising a first surface and a second optical substrate comprising a second surface;(b) applying water to the first surface of the first optical substrate, to the second surface of the second optical substrate, or both the first surface of the first optical substrate and the second surface of the second optical substrate;(c) securing the first optical substrate to the second optical substrate, wherein the first surface of the first optical substrate is adjacent to the second surface of the second optical substrate; and(d) applying deep ultraviolet radiation to the first optical substrate and the second optical substrate.2. The method of claim 1 , wherein the first optical substrate and the second optical substrate are made of the same material.3. The method of claim 1 , wherein the first optical substrate and the second optical substrate are made of different material.4. The method of claim 1 , wherein the first optical substrate and the second optical substrate comprise SiO.5. The method of claim 1 , wherein the first optical substrate and the second ...

Thickness control of substrates

A thickness of at least one preselected portion of a substrate, such as glass substrate for example, is controlled. A laser beam is directed to the at least one preselected portion of the substrate in a viscous state, thereby increasing a temperature and reducing a viscosity of the at least one preselected portion of the substrate in a viscous state sufficiently to cause the at least one preselected portion of the glass substrate to attain a desired thickness. The laser beam after it is generated can be directed to a reflecting surface from which the laser beam is reflected to the at least one preselected portion of the substrate in the viscous state. The substrate can comprise a glass ribbon produced in a downdraw glass forming process for example, and the laser beam can be directed onto a plurality of preselected portions of the glass ribbon.

GLASS ARTICLES WITH PROTECTIVE FILMS AND METHODS OF FORMING GLASS ARTICLES WITH PROTECTIVE FILMS

Glass articles with protective films used for processing hard disk drive substrates and methods of forming glass articles with protective films used for processing hard disk drive substrates are provided herein. In one embodiment, a glass blank includes: a first surface, a second surface opposing the first surface, and an edge surface connecting the first surface and the second surface; wherein the first surface comprises a first coated portion and a first uncoated portion surrounding the first coated portion, wherein the first uncoated portion extends a first distance radially inward from the edge toward a center of the first surface, wherein the second surface comprises a second coated portion and a second uncoated portion surrounding the second coated portion, wherein the second uncoated portion extends a second distance radially inward from the edge toward a center of the second surface.

METHOD FOR BLUNTING SHARP EDGES OF GLASS OBJECTS

The invention relates to methods for processing glass objects, in particular, to methods of blunting sharp edges of glass objects. A method comprises treating a glass edge with a focused laser beam, while relatively moving the glass object and/or the beam, said treating of the glass edge being carried out with a laser beam having a ring-shaped section, during which the glass edge is heated with the laser beam to a temperature above glass transition temperature, T>Tg. The method provides the creation of tempered glass sections of desired shape and size in the near-edge area due to the provision of thermal stresses in these areas, which cause the formation of a chamfer with rounded or blunt ends on the glass at brittle fracture. 1. A method of blunting sharp edges of glass objects , comprising treating the glass edge with a focused laser beam , while relatively moving the glass object and/or the beam , wherein said treating of the glass edge is carried out with a laser beam having a ring-shaped section , and said treating comprises heating the glass edge with the laser beam to a temperature above glass transition temperature , T>Tg.2. The method according to claim 1 , wherein said laser beam is directed so that its axis is disposed at an angle of 20-70° to the plane claim 1 , which is a continuation of the glass surface facing the laser beam.3. The method according to claim 2 , wherein said angle lies in the plane perpendicular to the vector of movement of the glass object and/or beam.4. The method according to claim 2 , wherein the axis of the laser beam is directed at an angle of 0-30° to the plane perpendicular to the vector of movement of the glass object and/or beam.5. The method according to claim 1 , wherein said treating is carried out with a laser beam having the shape of a ring elongated in the direction of movement of said glass object and/or beam to produce a heat spot in the shape of an elongated ring.6. The method according to claim 1 , wherein said ...

GLASS PLATE PRODUCTION METHOD, GLASS PLATE, GLASS ARTICLE PRODUCTION METHOD, GLASS ARTICLE, AND GLASS ARTICLE PRODUCTION APPARATUS

A glass plate, containing: a first main surface and a second main surface opposite to each other, wherein an in-plane void region having a plurality of voids is arranged on the first main surface, a plurality of internal void rows each having one void or two or more voids are arranged from the in-plane void region toward the second main surface, and a cut surface obtained by cutting the glass plate to pass through the in-plane void region and the plurality of internal void rows has a compressive stress layer formed by applying a chemical strengthening treatment in the center of the cut surface. 16-. (canceled)7. A glass plate comprising:a first main surface and a second main surface opposite to each other,wherein an in-plane void region having a plurality of voids is arranged on the first main surface,a plurality of internal void rows each having one void or two or more voids are arranged from the in-plane void region toward the second main surface, anda cut surface obtained by cutting the glass plate to pass through the in-plane void region and the plurality of internal void rows has a compressive stress layer formed by applying a chemical strengthening treatment in the center of the cut surface.8. A glass plate comprising:a first main surface and a second main surface opposite to each other,wherein an in-plane void region having a plurality of voids is arranged on the first main surface,a plurality of internal void rows each having one void or two or more voids are arranged from the in-plane void region toward the second main surface, anda cut surface obtained by cutting the glass plate to pass through the in-plane void region and the plurality of internal void rows has a concentration profile of predetermined alkali metal ions from the first main surface of the glass plate to the second main surface of the glass plate indicating concentration of the predetermined alkali metal ions being higher than bulk concentration of the glass plate, andthe predetermined ...

REVERSE PHOTOCHROMIC BOROSILICATE GLASSES

Borosilicate glasses are disclosed having (in weight %) 66-76% SiO, 0-8% AlO, 10-18% BO, 0-4% LiO, 0-12% NaO, 0-12% KO, 1-1.5% Ag, 1.5-2.5% Cl and 0.01-0.06% of a summed amount of CuO and NiO, wherein the glass composition is bleachable upon exposure to ultraviolet irradiation from a stable state color or shade to a lighter color or shade. Such reverse photochromic borosilicate glass compositions may be thermally darkenable. The borosilicate glasses may be strengthened via ion-exchange strengthening treatment. The borosilicate glasses may retain their reverse photochromic and thermally darkenable properties even after ion-exchange strengthening treatment. 1. A photochromic borosilicate glass composition comprising (in weight %) 66-76% SiO , 0-8% AlO , 10-18% BO , 0-4% LiO , 0-12% NaO , 0-12% KO , 1-1.5% Ag , 1.5-2.5% Cl , and 0.01-0.06% of a summed amount of CuO and NiO , wherein the glass composition is substantially free of Br.2. The photochromic borosilicate glass composition of wherein the glass composition is bleachable upon exposure to ultraviolet irradiation from a stable state color or shade to a lighter color or shade.3. The photochromic borosilicate glass composition of wherein the glass is thermally darkenable.4. The photochromic borosilicate glass composition of wherein the glass composition is thermally darkenable at a temperature of 150° C. or greater.5. The photochromic borosilicate glass composition of comprising 2-12% NaO.6. The photochromic borosilicate glass composition of which is substantially free of LiO.7. The photochromic borosilicate glass composition of comprising 2-8% AlO claim 1 , 4-12% NaO claim 1 , and 0-6% KO claim 1 , wherein the weight % of NaO is greater than the weight % of KO.8. The photochromic borosilicate glass of which is substantially free of LiO.9. The photochromic borosilicate glass composition of comprising 68.6-71.6% SiO claim 1 , 3-6% AlO claim 1 , 13.4% BO claim 1 , 4.5-9% NaO claim 1 , 0-4.5% KO claim 1 , 1.2% Ag claim ...

WELDED GLASS PRODUCT AND METHOD OF FABRICATION

A method for welding together glass workpieces where one of the workpieces has metal nanoparticles positioned at or near the surface to be welded. The method comprises positioning the workpieces in operative contact at an interface where a weld is to be formed, applying a laser beam to be incident upon the interface wherein energy from the laser beam is absorbed by the nanoparticle bearing workpiece and the energy from the laser beam is transferred to the glass surrounding the metal nanoparticles to heat the glass and to weld the workpieces together. 1. A method for welding a first glass workpiece to a second glass workpiece , the method comprising the steps of:positioning at least part of the first workpiece in operative contact with the second workpiece at an interface where a weld is to be formed;applying a laser beam to be incident upon the interface;wherein energy from the laser beam is absorbed by the second workpiece and wherein the second workpiece comprises metal nanoparticles at or near the surface of the second workpiece, wherein the metal nanoparticles are integrally formed with the second workpiece and absorb the energy from the laser beam then transfer the absorbed energy to the glass surrounding the metal nanoparticles to heat the glass of the second workpiece and to weld it to the first workpiece.2. A method as claimed in wherein claim 1 , the metal nanoparticles are distributed substantially homogeneously across a layer or region of the second work piece.3. A method as claimed in wherein claim 2 , the layer or region is a predetermined depth below the interface.4. A method as claimed in wherein claim 1 , the metal nanoparticles directly absorb the energy from the laser beam then transfer the absorbed energy to the glass surrounding the metal nanoparticles to heat the glass of the second workpiece and to weld it to the first workpiece.5. A method as claimed in wherein claim 2 , the layer of nanoparticles has a thickness of between 500 nm and 50 μm.6. ...

UV PHOTOBLEACHING OF GLASS HAVING UV-INDUCED COLORIZATION

A method of UV photobleaching a glass sample having UV-induced colorization is disclosed. The processed includes first irradiating the glass sample with colorizing UV radiation having a colorizing wavelength of λ<300 nm to form the colorized glass, which has a pink hue. The method then includes irradiating the colorized glass with bleaching UV radiation having a bleaching wavelength of λ, wherein 248 nm≦λ≦365 nm, to substantially remove the pink hue. 116.-. (canceled)17. A method of bleaching a colorized glass sample that has a pink hue due to the formation of Ticolor centers , comprising:{'sub': B', 'B, 'irradiating the colorized glass sample with bleaching UV radiation that has a bleaching wavelength λ, wherein 248 nm≦λ≦365 nm; and'}carrying out said irradiating for an exposure time t in the range 0.5 hr≦t≦5 hrs to substantially remove the pink hue.18. The method according to claim 17 , wherein the glass sample comprises an aluminophosphosilicate glass.19. The method according to claim 17 , wherein the Ticolor centers form from an amount T of titanium in the glass sample claim 17 , wherein 20 ppm/mole≦T≦1000 ppm/mole.20. The method according to claim 17 , wherein the glass sample defines a glass sheet.21. The method according to claim 17 , wherein the glass sample includes titanium in trace amounts T claim 17 , wherein 20 ppm/mole≦T≦1000 ppm/mole.22. The method according to claim 17 , wherein the bleaching UV radiation has a bleaching intensity Iin the range 5 mW/cmto 100 mW/cm. This application claims the benefit of priority under 35 U.S.C. §119 of U.S. Provisional Application Ser. No. 61/942,302 filed on Feb. 20, 2014 the content of which is incorporated herein by reference in its entirety.The present disclosure relates to photobleaching, and in particular relates to UV photobleaching of glass that has UV-induced colorization.Certain types of glasses are susceptible to colorization and reduced optical transmission (i.e., higher optical absorbance) at visible ...

Method for manufacturing ultra low expansion glass mirror substrates

A method of manufacturing a mirror substrate that includes the steps of providing a polishable substrate surface layer formed from ultra low expansion (ULE) glass, depositing successive layers of powdered ULE glass onto the polishable substrate surface layer, and selectively lasing each successive layer of powdered ULE glass to produce successive fused layers of ULE glass joined to one another to form a mirror substrate having an optimized three-dimensional topology. A mirror substrate manufactured according to the prescribed method is also disclosed.

STEREOSCOPIC DISPLAY DEVICE AND METHOD FOR FORMING THE SAME

A stereoscopic display device includes a display panel, a quarter-wave plate and a glass substrate. The display panel includes left-eye pixel line units, right-eye pixel line units and a color filter which including filter units and a black matrix between any two of adjacent filter units. The quarter-wave plate includes first retarders and second retarders. The glass substrate comprises opaque areas, and each opaque area is disposed on the two adjacent first retarder and the second retarder and used for blocking the light from the right-eye pixel line units into the second retarder or the light from the left-eye pixel line units into the first retarder. Therefore, the light corresponding to the right-eye or the left-eye signals is not obscured by the opaque areas even though users watch at a large angle so that it improves crosstalk to optimize 3D image quality. 1. A stereoscopic display device for displaying a 3D image comprising:a backlight module for emitting light;a display panel comprising a plurality of left-eye pixel line units, a plurality of right-eye pixel line units and a color filter, the plurality of left-eye pixel line units and the plurality of right-eye pixel line units being arranged alternately, the color filter comprising a plurality of filter units and a black matrix layer between any two of adjacent filter units;{'b': '90', 'a quarter-wave plate comprising a plurality of first retarders and a plurality of second retarders, the plurality of first retarders and the plurality of second retarders being arranged alternately, an angle between an optical axis of each first retarder and an optical axis of each second retarder being degrees, and'}a glass substrate between the display panel and the quarter-wave plate, the glass substrate comprising a plurality of opaque areas, and each opaque area onto the adjacent first retarder and the second retarder for obscuring light from the plurality of right-eye pixel line units to the plurality of second ...

METHOD OF SURFACE STRUCTURING A SUBSTRATE BODY AND SUBSTRATE BODY

A method for preparing and/or carrying out the structuring of a predetermined or predeterminable distinguished surface of a substrate body having a substrate material includes exposing the substrate material in at least one curved effective area to an electromagnetic field which in each of the at least one curved effective area causes a non-linear interaction between the electromagnetic field and the substrate material, and thus at least partially influencing the substrate material arranged in the curved effective area. After the structuring of the distinguished surface the distinguished surface has at least in certain areas at least one first curved progression which is at least partially determined and/or influenced by the curved shape of the at least one curved effective area. The nonlinear interaction causes at least one nonlinear absorption of the electromagnetic field in the substrate material. 1. A method for preparing and/or carrying out the structuring of a predetermined or predeterminable distinguished surface of a substrate body comprising a substrate material , the method comprising:exposing the substrate material in at least one curved effective area to an electromagnetic field which in each of the at least one curved effective area causes a non-linear interaction between the electromagnetic field and the substrate material, and thus at least partially influencing the substrate material arranged in the curved effective area,wherein after the structuring of the distinguished surface the distinguished surface comprises at least in certain areas at least one first curved progression which is at least partially determined and/or influenced by the curved shape of the at least one curved effective area, andwherein the nonlinear interaction causes at least one nonlinear absorption of the electromagnetic field in the substrate material.2. The method according to claim 1 , wherein the substrate material is exposed to an electromagnetic field in a plurality of ...

Methods for forming vias in glass substrates

Methods for forming vias in glass substrates by laser drilling and acid etching are disclosed. In one embodiment, a method forming a via in a glass substrate includes laser drilling the via through at least a portion of a thickness of the glass substrate from an incident surface of the glass substrate. The method further includes etching the glass substrate for an etching duration to increase a diameter of an incident opening of the via and applying ultrasonic energy to the glass substrate during at least a portion of the etching duration. The applied ultrasonic energy has a frequency between 40 kHz and 192 kHz.

PROCESSING METHOD, PROCESSING SYSTEM, AND PROCESSING PROGRAM

A processing method of producing a processed object by processing a material, the processed object including an opening to outside and a hollow space of a predetermined shape and in communication with the opening, includes forming the hollow space in the material by performing ablation by projecting a laser from a region to be processed on a surface of the material corresponding to the opening along a region to be processed corresponding to the hollow space. 18-. (canceled)9. A processing method of producing a processed object by processing a material , the processed object including an opening to outside and a hollow space in communication with the opening , the method comprising:forming the hollow space in the material by performing ablation by projecting a laser from a region to be processed on a surface of the material corresponding to the opening along a region to be processed corresponding to the hollow space.10. The processing method according to claim 9 , whereinthe region to be processed is extracted in each of surfaces of a slice obtained by slicing the material to a certain thickness in a certain direction; andthe laser is projected to each of the surfaces of the slice.11. The method according to claim 10 , wherein the laser is projected in a projection pattern such that lasers are projected with an equal or substantially equal energy density to each of different regions in the region to be processed in one of the surfaces of the slice.12. A processing method of producing a processed object by processing a material claim 10 , the processed object including an opening to outside and a hollow space in communication with the opening claim 10 , the method comprising:forming the hollow space in the material by performing ablation to the material in which the opening and a portion of the hollow space in communication with the opening have been formed, by projecting a laser along a region to be processed corresponding to a remaining portion of the hollow space. ...

Method for manufacturing disk-shaped glass blank and method for manufacturing glass substrate for magnetic disk

A glass blank is cut out from a glass plate by forming a crack starting portion inside the glass plate by moving a first laser beam relative to the glass plate such that a focal position of the laser beam is located in an inner portion of the glass plate in its thickness direction and the focal position forms a circle when viewed from a surface of the glass plate, then causing cracks to develop from the crack starting portion toward main surfaces of the glass plate, and splitting the glass plate to separate, from the glass plate, a glass blank that includes a separation surface having an arithmetic average surface roughness Ra smaller than 0.01 μm and a roundness not larger than 15 μm. Thereafter, main surfaces of the glass blank are ground or polished.

METHODS FOR FORMING ION-EXCHANGED WAVEGUIDES IN GLASS SUBSTRATES

Methods of forming ion-exchanged waveguides in glass substrates are disclosed. In one embodiment, a method of forming a waveguide in an ion-exchanged glass substrate having an ion-exchanged layer extending from a surface to a depth of layer of the ion-exchanged glass substrate includes locally heating at least one band at the surface of the ion-exchanged glass substrate to diffuse ions in the ion-exchanged layer within the at least one band. A concentration of ions within the at least one band is less than a concentration of ions outside of the at least one band, and at least one waveguide is defined within the ion-exchanged layer adjacent the at least one band. In some embodiments, the at least one waveguide is embedded within the ion-exchanged glass substrate such that an upper surface of the at least one waveguide is below the surface of the glass substrate by a depth d. 1. A method of forming a waveguide in an ion-exchanged glass substrate comprising an ion-exchanged layer extending from a surface to a depth of layer of the ion-exchanged glass substrate , the method comprising locally heating at least one band at the surface of the ion-exchanged glass substrate to diffuse ions in the ion-exchanged layer within the at least one band , wherein:a concentration of ions within the at least one band is less than a concentration of ions outside of the at least one band; andat least one waveguide is defined within the ion-exchanged layer adjacent the at least one band.2. The method of claim 1 , wherein an index of refraction of the ion-exchanged glass substrate is higher within the waveguide than within the at least one band.3. The method of claim 1 , wherein:the at least one band comprises a first band and a second band; andthe at least one waveguide is disposed between the first band and the second band.4. The method of claim 1 , wherein the waveguide extends from the surface of the ion-exchanged glass substrate.5. The method of claim 1 , wherein an upper surface of ...

Method of Manufacturing a Waveguide

A method of manufacturing an optical device is disclosed. The method includes scanning along a curved path at a first surface of a glass plate with a laser beam directed orthogonally to the first surface to form a trench according to a pattern of a waveguide. The curved path is coincident with a longitudinal axis of the waveguide. The method further includes filling the trench with a material having an index different from that of glass to form the waveguide and, after filling the trench, depositing a cladding layer. 1. A method of manufacturing an optical device , the method comprising:scanning along a curved path at a first surface of a glass plate with a laser beam directed orthogonally to the first surface to form a trench according to a pattern of a waveguide, the curved path being coincident with a longitudinal axis of the waveguide;filling the trench with a material having an index different from that of glass to form the waveguide; andafter filling the trench, depositing a cladding layer.2. The method of claim 1 , whereinscanning the first surface comprises scanning with pulses of the laser beam having a duration between 2 femtoseconds and 500 femtoseconds, andscanning the first surface according to the pattern of the waveguide forms exactly one trench in the glass plate.3. The method of claim 2 , wherein the pulses are emitted at a frequency between 10 and 500 kHz.4. The method of claim 1 , wherein the trench comprises a depth between 5 μm and 15 μm and a width between 5 μm and 12 μm.5. The method of claim 1 , wherein the waveguide is a single-mode waveguide.6. The method of claim 1 , further comprising:before depositing the cladding layer, forming an inclined mirror disposed entirely in the glass plate, the inclined mirror forming an acute angle with the first surface and terminating in the glass plate.7. The method of claim 1 , wherein the trench has a semi-circular claim 1 , rectangular claim 1 , or rounded-angle rectangular cross-section.8. An apparatus ...

Method for manufacturing window glass and carrier film used for the same

A method for manufacturing a window glass according to an embodiment of the present disclosure includes: preparing a carrier film; forming an assembly by attaching the carrier film to a window base; coating a UV resin on a jig; placing the assembly on the jig so that the window base faces downwards; attaching the assembly and the UV resin on the jig to each other by using a roller; primarily curing the UV resin by performing primary UV irradiation to an upper portion of the assembly attached with the UV resin on the jig; removing an uncured portion of the UV resin; and secondarily curing a remaining portion of the UV resin from which the uncured portion of the UV resin has been removed by performing secondary UV irradiation to the remaining portion of the UV resin.

NON ABRASIVE, THIN GLASS SHAPING METHODS, SYSTEMS FOR PERFORMING SUCH METHODS, AND THIN GLASS PRODUCED BY SUCH METHODS

An example method for producing a thin glass sheet having a desired surface profile is described. It includes: (a) receiving information about an actual surface of a thin glass sheet to be processed; (b) receiving information describing the desired surface profile of the thin glass sheet; (c) determining a corrective curvature based on (1) the information describing the actual surface of the thin glass sheet, and (2) the information describing the desired surface profile of the thin glass sheet; (d) determining at least one parameter of at least one glass shaping process; and (e) applying the at least one glass shaping process to the thin glass sheet using the determined at least one parameter. In some implementations of the example method, the corrective curvature is determined using a Laplacian of surface data of the thin glass sheet and the desired surface profile of the thin glass sheet. Example apparatus for performing the methods are also described. Resulting thin glass sheets are also described. 1. A method for producing a thin glass sheet having a desired surface profile , the method comprising:a) receiving information about an actual surface of a thin glass sheet to be processed;b) receiving information describing the desired surface profile of the thin glass sheet;c) determining a corrective curvature based on (1) the information describing the actual surface of the thin glass sheet, and (2) the information describing the desired surface profile of the thin glass sheet;d) determining at least one parameter of at least one glass shaping process; ande) applying the at least one glass shaping process to the thin glass sheet using the determined at least one parameter.2. The method of wherein the corrective curvature is determined using a Laplacian of surface data of the thin glass sheet and the desired surface profile of the thin glass sheet.3. The method of wherein the information about the actual surface of the thin glass sheet to be processed is received ...

TRANSPARENT MATERIAL PROCESSING WITH AN ULTRASHORT PULSE LASER

Methods, devices, and systems for ultrashort pulse laser processing of optically transparent materials are disclosed, with example applications in scribing, marking, welding, and joining. For example, ultrashort laser pulses create scribe features with one pass of the laser beam across the material, with at least one of the scribe features being formed below the surface of the material. Slightly modifying the ultrashort pulse laser processing conditions produces sub-surface marks. When properly arranged, these marks are clearly visible with correctly aligned illumination. Reflective marks may also be formed with control of laser parameters. A transparent material other than glass may be utilized. A method for welding transparent materials uses ultrashort laser pulses to create a bond through localized heating. In some embodiments of transparent material processing, a multifocus beam generator simultaneously forms multiple beam waists spaced depthwise relative to the transparent material, thereby increasing processing speed. 1. A laser-based system for modification of a transparent material , comprising:a pulsed laser apparatus generating a pulsed laser output comprising at least one pulse having a pulse width in the range from about 10 fs to 100 ps;a multifocus beam generator receiving said output, said generator configured to form a plurality of focused beams using said pulsed laser output, each focused beam having a beam waist, said beam waists spaced depthwise relative to said material, at least one beam waist of said plurality of focused beams being within said material and causing modification of said material, said plurality of focused beams comprising different polarizations or different wavelengths generated in different optical paths;a motion system to produce relative movement between said material and said focused beams; anda controller coupled to said pulsed laser apparatus and to said motion system, and controlling said system in such a way that said ...

ENCAPSULATION STRUCTURE AND METHOD FOR MAKING SAME

An encapsulation structure includes a first substrate, a second substrate, and a quantum dot layer. Both the first substrate and the second substrate are made of glass. The edge of the first substrate and the edge of the second substrate are sealed together to encapsulate the quantum dot layer between the first substrate and the second substrate. 1. An encapsulation structure comprising:a first substrate, the first substrate being made of glass;a second substrate, the second substrate being made of glass; anda quantum dot layer formed between the first substrate and the second substrate;wherein the edge of the first substrate and the edge of the second substrate are sealed together to encapsulate the quantum dot layer between the first substrate and the second substrate, the first substrate defines a plurality of grooves having a depth in a range of 5 μm to 10 μm, and the quantum dot layer is formed in the plurality of grooves.23.-. (canceled)4. The encapsulation structure as claimed in claim 1 , wherein the first substrate has a thickness no greater than 0.2 mm claim 1 , and the second substrate has a thickness no greater than 0.2 mm.5. The encapsulation structure as claimed in claim 1 , wherein the quantum dot layer is formed by using a colloidal quantum dot claim 1 , the colloidal quantum dot comprises a red quantum dot claim 1 , a green quantum dot claim 1 , and polymer glue.6. The encapsulation structure as claimed in claim 5 , wherein the weight ratio of the red quantum dot to the green quantum dot is in a range from 1:2 to 2:1.7. The encapsulation structure as claimed in claim 5 , wherein the polymer glue is selected from a group consisting of acrylic resin glue claim 5 , organic siloxane glue claim 5 , acrylate modified polyurethane glue claim 5 , acrylate modified silicone resin glue claim 5 , epoxy resin glue claim 5 , and any combination thereof.8. A method for making an encapsulation structure comprising:providing a first substrate, the first substrate ...

VITREOUS SILICA CRUCIBLE AND METHOD OF MANUFACTURING THE SAME

A method of manufacturing a vitreous silica crucible includes: a taking-out process of taking out the vitreous silica crucible from the mold, a honing process of removing the unfused silica powder layer on the outer surface of the vitreous silica crucible, and further comprising, after the taking-out process and before the honing process, a marking process of marking an identifier comprised of one or more groove line on the outer surface of the vitreous silica crucible, wherein the groove line after the honing process has a cross-sectional shape of an inverse trapezoid and a depth of 0.2 to 0.5 mm, and a width of 0.8 mm or more at the opening of the groove line. The groove line is formed by repeating shifting a focal point of a laser. 1. A method of marking a vitreous silica crucible after taking-out the vitreous silica crucible from a mold and before removing unfused silica power layer on an outer surface of the vitreous silica crucible , said method comprising: marking by a laser beam an identifier comprised of multiple groove lines constituting alphabetic characters , numeric characters , or a bar code on the outer surface of the vitreous silica crucible to identify various kinds of crucibles , whereineach groove line after the honing process has a depth of 0.2 to 0.5 mm, and a width of 0.8 mm or more at the opening of the groove line, and each groove line has a cross-sectional shape of an inverse trapezoid; (i) setting, on the outer surface of the vitreous silica crucible under the unfused silica powder layer, a focal point of the laser released from a laser marker;', '(ii) in that state, reciprocally moving the focal point along a longitudinal direction of the groove line at a width-direction position to form a part of the groove line;', '(iii) shifting the focal point in a width direction to a next width-direction position and repeating step (ii); and', '(iv) repeating step (iii) to form each of the multiple groove lines with the inverse trapezoid cross ...

METHOD FOR PRODUCING A COATED SUBSTRATE

The subject of the invention is a process for obtaining a substrate provided on at least one portion of at least one of its sides with a coating, comprising a step of depositing said coating on said substrate, then a step of heat treatment of said coating using a pulsed or continuous laser radiation focused on said coating in the form of at least one laser line, the wavelength of which is within a range extending from 400 to 1500 nm, said heat treatment being such that a relative displacement movement is created between the substrate and the or each laser line, the speed of which is at least 3 meters per minute, the or each laser line having a beam quality factor (BPP) of at most 3 mm·mrad and, measured at the place where the or each laser line is focused on said coating, a linear power density divided by the square root of the duty cycle of at least 200 W/cm, a length of at least 20 mm and a width distribution along the or each line such that the mean width is at least 30 micrometers and the difference between the largest width and the smallest width is at most 15% of the value of the mean width. 1. A process for obtaining a substrate provided on at least one portion of at least one side with a coating , the process comprising:depositing said coating on said substrate, thenheat treating said coating with a pulsed or continuous laser radiation focused on said coating as a laser line, a wavelength of which is within a range of from 400 to 1500 nm,wherein, in the heat treating, a speed of a relative displacement movement between the substrate and the laser line is at least 3 meters per minute,the laser line has a beam quality factor (BPP) of at most 3 mm·mrad,the laser line has, measured at a place where the laser line is focused on said coating, a linear power density divided by the square root of the duty cycle of at least 200 W/cm,the laser line has a length of at least 20 mm,a mean width of the laser line is at least 30 micrometers anda difference between a ...

Methods of Fabricating Glass Articles by Laser Damage and Etching

Methods of forming a glass article are disclosed. In one embodiment, a method of forming a glass article includes translating a pulsed laser beam on a glass substrate sheet to form a laser damage region between a first surface and a second surface of the glass substrate sheet. The method further includes applying an etchant solution to the glass substrate sheet to remove a portion of the glass substrate sheet about the laser damage region. The method may further include strengthening the glass substrate sheet by an ion-exchange strengthening process, and coating the glass substrate sheet with an acid-resistant coating. Also disclosed are methods where the laser damage region has an initial geometry that changes to a desired geometry following the reforming of the glass substrate sheet such that the initial geometry of the laser damage region compensates for the bending of the glass substrate sheet. 1. A method of forming a glass article , comprising:providing a glass substrate sheet; the pulsed laser beam has a wavelength in the ultraviolet spectrum and a power of about 0.1 W to about 2.0 W; and', 'the laser damage region comprises a plurality of defect lines;, 'translating a pulsed laser beam on the glass substrate sheet to form a laser damage region extending from a first surface of the glass substrate sheet to a second surface of the glass substrate sheet, wherein a concentration of the hydrochloric acid is less than about 1M if a concentration of the hydrofluoric acid is greater than about 2M; and', 'the concentration of the hydrochloric acid is between about 1M and about 3M if the concentration of the hydrofluoric acid is less than about 2M;, 'applying the glass substrate sheet with an etchant solution comprising about 1M to about 3M of hydrofluoric acid and hydrochloric acid, whereinstrengthening the glass substrate sheet by an ion-exchange strengthening process; andcoating the glass substrate sheet with an acid-resistant coating.2. The method of claim 1 , ...

ARTICLES HAVING HOLES WITH MORPHOLOGY ATTRIBUTES AND METHODS FOR FABRICATING THE SAME

Articles including a glass-based substrate with holes, semiconductor packages including an article with holes, and methods of fabricating holes in a substrate are disclosed. In one embodiment, an article includes a glass-based substrate having a first surface, a second surface, and at least one hole extending from the first surface. The at least one hole has an interior wall having a surface roughness Rthat is less than or equal to 1 μm. The at least one hole has a first opening having a first diameter that is present the first surface. A first plane is defined by the first surface of the glass-based substrate based on an average thickness of the glass-based substrate. A ratio of a depression depth to the first diameter of the at least one hole is less than or equal to 0.007. 1. An article comprising: [{'sub': 'a', 'the at least one hole comprises an interior wall having a surface roughness Rthat is less than or equal to 1 μm;'}, 'the at least one hole comprises a first opening having a first diameter that is present at the first surface;', 'a first plane is defined by the first surface of the glass-based substrate based on an average thickness of the glass-based substrate; and', 'a ratio of a depression depth to the first diameter of the at least one hole is less than or equal to 0.007, wherein the depression depth is measured from the first plane to the first surface at the first opening of the at least one hole., 'a glass-based substrate comprising a first surface, a second surface, and at least one hole extending from the first surface, wherein2. The article of claim 1 , wherein:the at least one hole is a through hole extending from the first surface to the second surface such that a second opening having a second diameter is present on the second surface;a second plane is defined by the second surface of the glass-based substrate based on the average thickness of the glass-based substrate; anda ratio of a second depression depth to the second diameter of the at ...

Laser processing method and laser processing apparatus

A laser beam machining method and a laser beam machining device capable of cutting a work without producing a fusing and a cracking out of a predetermined cutting line on the surface of the work, wherein at pulse laser beam is radiated on the predetermined cut line on the surface of the work under the conditions causing a multiple photon absorption and with a condensed point aligned to the inside of the work, and a modified area is formed inside the work along the predetermined determined cut line by moving the condensed point along the predetermined cut line, whereby the work can be cut with a rather small force by cracking the work along the predetermined cut line starting from the modified area and, because the pulse laser beam radiated is not almost absorbed onto the surface of the work, the surface is not fused even if the modified area is formed.

GLASS LINING, METHOD FOR MANUFACTURING GLASS LINING AND METHOD FOR CLEANING GLASS-LINED ARTICLES

A glass lining that has an excellent balance between a hydrophilic property and a hydrophobic property on its surface, that has less adhesion of dirt than a typical GL since having an excellent stain-proof property against both oily stains and aqueous stains, and that can maintain the stain-proof property and the self-cleaning performance for a long time after the glass lining is cleaned, leading to excellent cleaning performance and low dirt-adhesion. The glass lining includes a lining and a conductive inorganic compound contained in the lining. The glass lining is structured to have a plurality of hydrophilic concave portions and net-like hydrophobic convex portions connecting peripheries of the plurality of hydrophilic concave portions. 1. A glass lining comprising a lining and a conductive inorganic compound contained in the lining and having a structure comprising:a plurality of hydrophilic concave portions; andnet-like hydrophobic convex portions connecting peripheries of the plurality of hydrophilic concave portions.2. The glass lining according to claim 1 , wherein the conductive inorganic compound is acicular conductive antimony-containing tin oxide.3. The glass lining according to claim 1 , whereinan average diameter of the concave portions ranges from 10 μm to 60 μm, anda difference in height between the concave portions and the convex portions ranges from 1 μm to 3 μm.4. The glass lining according to claim 1 , whereina contact angle of water on the glass lining is 30 degrees or less.5. A manufacturing method of the glass lining according claim 1 , the method comprising:providing a slip comprising a glass frit having a glass particle diameter ranging from 30 μm to 70 μm before the slip is used for a glass lining; andadding and mixing 3 parts by weight to 6 parts by weight of a conductive inorganic compound per 100 parts by weight of the glass frit after elapse of 40% to 75% of a total mill-grinding time.6. A cleaning method of glass-lined equipment ...

METHOD FOR PRODUCING A GLASS-PLASTIC CONNECTION

A process for the production of a glass-plastic connection which is form-fitting, and to a form-fitting composite between glass and plastic which is obtainable by the process. The process and the glass-plastic composite are characterized in that a glass, which in particular is planar, neither during the process nor in the glass-plastic composite is subjected to a mechanical load which could lead to cracks, e.g. microcracks. Accordingly, in the composite, the glass is connected to a plastic in a stress-free manner The composite of glass with plastic is especially gas-proof and/or liquid-proof. 1. A process for the production of a glass-plastic composite comprising or consisting of the steps of1. providing a glass substrate having spaced-apart recesses traversing through the glass substrate and having at least one undercut which is formed by the recesses widening within the glass substrate,2. applying at least one solidifying plastic onto the glass substrate in the area of the recesses and introducing the plastic into the recesses,3. solidifying the plastic.2. The process according to claim 1 , characterized in that the recesses within the glass substrate taper and adjacently widen.3. The process according to claim 1 , wherein the recesses within the glass substrate widen in the direction towards the surface of the glass substrate which lies opposite to the surface onto which the solidifying plastic is applied.4. The process according to claim 1 , wherein the glass substrate having recesses is provided by treating a glass substrate with laser pulses at the positions where recesses are to be generated claim 1 , and subsequently etching the glass substrate.5. The process according to claim 1 , wherein the recesses traversing through the glass substrate are inclined toward one another claim 1 , and in that different plastics are applied onto opposite surfaces of the glass substrate and are each introduced into the recesses.6. The process according to wherein the recesses ...

Method for manufacturing glass plate, method for chamfering glass plate, and method for manufacturing magnetic disk

A method for manufacturing a disk-shaped glass plate in which shape processing is performed on an edge surface of the glass plate includes processing the edge surface into a target shape by irradiating the edge surface with a laser beam while moving the laser beam relative to the edge surface in a circumferential direction of the glass plate. A cross-sectional intensity distribution of the laser beam with which the edge surface is irradiated is a single mode, and W1>Th holds true and Pd×Th is in a range of 0.8 to 3.5 [W/mm] when a width of luminous flux of the laser beam in a thickness direction of the glass plate at an irradiation position of the edge surface is W1 [mm], a thickness of the glass plate is Th [mm], and a power density of the laser beam is Pd.

SITE-SPECIFIC CONNECTING OF GLASS SUBSTRATES

The invention relates to a process for connecting glass substrates which allows glass substrates to be aligned in a site-specific manner and to subsequently be connected to one another, and to the site-specifically aligned and interconnected glass substrates. Generally, the process relates to connecting glass substrates to one another, optionally also without site-specific alignment. The interconnected glass substrates obtainable by processes according to the invention are characterized by a firm bond with one another, which is preferably formed by solidified glass solder that is in form-fitting engagement with the glass substrates. Therein, recesses, which are preformed in the glass substrate, with glass solder are used for aligning and optionally for connecting the glass substrates. 1. A process comprising steps of:providing at least one glass substrate having spaced traversing and V-shaped tapered recesses each having a larger cross-section at a surface of the glass substrate and a smallest cross section opposite the larger cross-section,applying glass solder onto the surface of the glass substrate in which the recesses have their larger cross-section,heating the glass substrate with the glass solder applied thereto,and subsequently cooling the glass substrate with the glass solder applied thereto,2. The process according to claim 1 , wherein the cooling creates solidified glass solder that protrudes beyond the surface of the glass substrate adjacent to an area of smallest cross-section of the recess claim 1 , the method comprising arranging another glass substrate with recesses matching over the solidified glass solder claim 1 , subsequently heating to the melting temperature of the glass solder and subsequent cooling whereby the glass solder extends with form-fit through at least the areas of smallest cross-section of the matchingly arranged recesses of the glass substrates.3. The process according to claim 1 , comprising arranging at least two glass substrates ...

Strengthened glass articles with separation features

A method of forming a strengthened glass article is provided. The method includes providing a strengthened glass article. The strengthened glass article is in the form of a container including a sidewall having an exterior surface and an interior surface that encloses an interior volume. The sidewall has an exterior strengthened surface layer that includes the exterior surface, an interior strengthened surface layer that includes the interior surface and a central layer between the exterior strengthened surface layer and the interior strengthened surface layer that is under a tensile stress. A laser-induced intended line of separation is formed in the central layer at a predetermined depth between the exterior strengthened surface layer and the interior strengthened surface layer by irradiating the sidewall with a laser without separating the glass article.

SEALED DEVICES COMPRISING TRANSPARENT LASER WELD REGIONS

Disclosed herein are sealed devices comprising a first substrate, a second substrate, an inorganic film between the first and second substrates, and at least one weld region comprising a bond between the first and second substrates. The weld region can comprise a chemical composition different from that of the inorganic film and the first or second substrates. The sealed devices may further comprise a stress region encompassing at least the weld region, in which a portion of the device is under a greater stress than the remaining portion of the device. Also disclosed herein are display and electronic components comprising such sealed devices. 1. A sealed device comprising:an inorganic film formed over a surface of a first substrate;a second substrate in contact with the inorganic film; anda weld region comprising a bond formed between the first and second substrates and extending from a first depth in the first substrate to a second depth in the second substrate;wherein the inorganic film comprises at least one inorganic film element and wherein one or both of the first and second substrates comprises at least one inorganic substrate element; andwherein a first inorganic film element concentration of the first or second substrate in the weld region is higher than a second inorganic film element concentration of the first or second substrate outside the weld region.2. The sealed device of claim 1 , wherein the inorganic film claim 1 , and optionally at least one of the first or second substrates is transmissive at wavelengths ranging from about 420 nm to about 750 nm.3. The sealed device of claim 1 , wherein the weld region is transparent.4. The sealed device of claim 1 , wherein at least one of the first or second substrates comprises a glass claim 1 , glass-ceramic claim 1 , ceramic claim 1 , polymer claim 1 , or metal.5. The sealed device of claim 1 , wherein both the first and second substrates comprise a glass or glass-ceramic.6. The sealed device of claim 1 , ...

LAYERED GLASSY PHOTOSENSITIVE ARTICLE AND METHOD OF MAKING

A method includes forming a glassy article. The glassy article includes a first glassy layer and a second glassy layer adjacent to the first glassy layer. The second glassy layer includes a photosensitive glass. The glassy article is exposed to radiation to form an exposed glassy article. The exposed glassy article is subjected to a heat treatment, whereby a plurality of inclusions is formed in the photosensitive glass of the second glassy layer. 1. A method comprising:forming a glassy article comprising a first glassy layer and a second glassy layer adjacent to the first glassy layer, the second glassy layer comprising a photosensitive glass;exposing the glassy article to radiation to form an exposed glassy article; andsubjecting the exposed glassy article to a heat treatment such that a plurality of inclusions is formed in the photosensitive glass of the second glassy layer, the plurality of inclusion comprising a determined pattern to control an emission profile of light emitted from the glassy article.2. (canceled)3. The method of claim 1 , wherein the exposing the glassy article to radiation comprises exposing an exposed portion of the second glassy layer comprising the determined pattern to the radiation without exposing an unexposed portion of the second glassy layer to the radiation.4. The method of claim 3 , wherein:the exposing the glassy article to radiation comprises positioning a mask between a radiation source and the glassy article andthe mask comprises an opaque region that blocks the radiation and a transparent region that transmits the radiationthe opaque region of the mask comprises a pattern corresponding to the unexposed portion of the second glassy layer of the glassy article and shields the unexposed portion from exposure to the radiation; andthe transparent region of the mask comprises a plurality of openings in the opaque region of the mask.56-. (canceled)7. The method of claim 4 , wherein the plurality of openings comprises a gradient in at ...

MULTICOLORED PHOTOSENSITIVE GLASS-BASED PARTS AND METHODS OF MANUFACTURE

Multicolored glass-based articles and methods of manufacture are disclosed. The method includes forming a glass-based part and exposing a first region to radiation and a second region to radiation such that the first and second regions have different sized metallic nanoparticles, resulting in a multicolored glass article. 1. (canceled)2. (canceled)3. (canceled)4. (canceled)5. (canceled)6. (canceled)7. (canceled)8. (canceled)9. (canceled)10. (canceled)11. (canceled)12. (canceled)13. (canceled)14. (canceled)15. (canceled)16. A method , comprising:irradiating a first region of a glass-based substrate with an ultra-violet source to form an irradiated glass-based substrate comprising metallic nanoparticle nuclei in the first region; andheat treating the irradiated glass-based substrate to form a heat treated glass-based substrate comprising metallic nanoparticles of a component in the first region;wherein the heat treated glass-based substrate comprises a second region containing metallic nanoparticles of the component with a second average particle diameter that is different than the first average particle diameter.17. The method of claim 16 , further comprising disposing a mask between the glass-based substrate and the ultra-violet source prior to irradiating the glass-based source.18. The method of claim 17 , wherein the mask is ink jet printed.19. The method of claim 17 , wherein the mask reduces the intensity of the irradiation with the ultra-violet source at the second region relative to the first region.20. The method of claim 17 , further comprising removing the mask after irradiating the glass-based substrate.21. The method of claim 16 , wherein the component is selected from the group consisting of Au claim 16 , Ag claim 16 , and Cu.22. The method of claim 16 , wherein the glass-based substrate further comprises a photosensitizer.23. The method of claim 16 , wherein the glass-based substrate further comprises CeO.24. The method of claim 16 , further comprising ...

OPTICAL INTERFACE DEVICE HAVING A CURVED WAVEGUIDE USING LASER WRITING AND METHODS OF FORMING

An optical interface device for optically connecting photonic devices to optical device along with methods of making. The method includes providing a glass support member that is either monolithic or laminated. A laser beam is used to write cores in the body of the support member. The support member includes a bend section and the cores generally follow the bend section and serve to define curved optical waveguides. The cores provide strong out-of-plane optical confinement, thereby allowing for strong bends and therefore a compact design for the optical interface device. 1. A method of forming an optical interface device for optically connecting at least one photonic device to at least one optical device via at least one optical fiber , comprising:{'sub': b', '1', 'b, 'providing a support member having glass body with a refractive index n, a proximal end, a distal end and an outer surface, wherein the glass body includes a bend section that includes a curved portion of the outer surface, with the curved portion of the outer surface being interfaced with either air or a dielectric coating having a refractive index nnand an outer edge closest to the outer surface and that resides within 10 microns of the curved portion of the outer surface; and'}wherein the at least one core defines at least one curved optical waveguide.2. The method according to claim 1 , wherein the at least one curved optical waveguide is further defined by a portion of the glass body adjacent the core and either the air or the dielectric coating.3. The method according to claim 1 , wherein the support member includes a front-end section claim 1 , and wherein the front-end section includes an optical fiber support feature.4. The method according to claim 1 , wherein the core is closest to the outer surface at the curved portion of the outer surface.5. The method according to ...

METHOD OF SEPARATING A LIQUID LENS FROM AN ARRAY OF LIQUID LENSES

A method of separating a portion of an object comprising: presenting an object having a thickness; using a laser emission at a wavelength to perforate at least a portion of the thickness of the object sequentially over a length to form a series of perforations between a first portion of the object on one side of the series of perforations and a second portion of the object on the other side of the series of perforations; and applying a stress to the object at the series of perforations to separate the first portion of the object from the second portion of the object, wherein the thickness of the object, at the series of perforations, is transparent to the wavelength of the laser emission. 1. A method of separating a portion of an object comprising a first layer that is transparent to a wavelength of a laser emission , a second layer that is not transparent to the wavelength of the laser emission , and a third layer that is transparent to the wavelength of the laser emission , the method comprising:bonding the first layer to the third layer throughout a bonded volume, whereby the bonded volume is transparent to the wavelength of the laser emission;perforating at least a portion of a thickness of the object sequentially over a length using the laser emission at the wavelength to form a series of perforations between a first portion of the object on one side of the series of perforations and a second portion of the object on the other side of the series of perforations, the series of perforations extending through the bonded volume; andapplying a stress to the object at the series of perforations to separate the first portion of the object from the second portion of the object;wherein the thickness of the object, at the series of perforations, is transparent to the wavelength of the laser emission.2. The method of claim 1 , wherein the laser emission perforates the entire thickness of the object.3. The method of claim 1 , wherein the series of perforations comprises ...

Optical device production method

A method for manufacturing an optical device includes a hydrogen-loading step, a laser irradiation step, and a light condensing point movement step. A continuous refractive index changed region is formed in a glass member by alternately repeating the laser irradiation step and the light condensing point movement step or performing the laser irradiation step and the light condensing point movement step in parallel. In the hydrogen-loading step, hydrogen is loaded into the glass member containing P2O5 as a main component. In the laser irradiation step, a femtosecond laser beam having a repetition frequency of 10 kHz or higher is condensed in the hydrogen-loaded glass member, and a light-induced change in refractive index is caused in the glass member. In the light condensing point movement step, a light condensing point position of the femtosecond laser beam is moved relative to the glass member.

Resin composite module for vehicle and production method therefor

There is provided a production method of a resin composite module for a vehicle, which includes a resin module substrate, and a silicone-based polymer hard coat which is formed on the resin module substrate. The method includes forming the hard coat by coating a silicone-based polymer onto the resin module substrate, and radiating an ultraviolet ray onto at least a part of a surface of the hard coat such that a hardness thereof becomes 0.8 GPa or more as evaluated by a nanoindentation method. The radiating the ultraviolet ray uses a light source unit which includes a light source and emits an ultraviolet ray having a wavelength of 360 0nm or less from an emission surface thereof and radiates the ultraviolet ray onto the surface of the hard coat while a distance from the emission surface to the surface of the hard coat is 10 mm or less.

METHOD FOR INCREASING THE STRENGTH OF A GLASS SUBSTRATE

Methods for increasing the strength of a planar or strip-shaped glass substrate are provided. Electromagnetic radiation in the wavelength range from 180 nm to 1100 nm is applied to the glass substrate by means of at least one pulse, wherein the at least one pulse has a radiation bandwidth of at least 100 nm and the glass substrate has a temperature of at most 200° C. prior to the at least one pulse acting thereon, and wherein the pulse energy density of the at least one pulse of electromagnetic radiation is set in the range from 0.1 Jcm-2 to 100 Jcm-2.

Method of Manufacture of Copper-doped Glasses

A copper-doped glass formed by placing a target glass in a container, surrounding the target glass with a powder mixture comprised of SiOpowder and CuS powder, wherein the SiOpowder and the CuS powder are mixed according to the formula (SiO)(CuS), where 0.01 Подробнее

Optical metasurfaces, and associated manufacturing methods and systems

A method for manufacturing an optical metasurface is configured to operate in a given working spectral band. The method comprises: obtaining a 2D array of patterns, each comprising one or more nanostructures forming dielectric elements that are resonant in said working spectral band, said nanostructures being formed in at least one photosensitive dielectric medium; exposing said 2D array to a writing electromagnetic wave having at least one wavelength in said photosensitivity spectral band, said writing wave having a spatial energy distribution in a plane of the 2D array that is a function of an intended phase profile, so that each pattern of the 2D array produces on an incident electromagnetic wave having a wavelength in the working spectral band, a phase variation corresponding to a refractive index variation experienced by said pattern during said exposure.

Methods of forming high-density arrays of holes in glass

A method of fabricating a high-density array of holes in glass is provided, comprising providing a glass piece having a front surface, then irradiating the front surface of the glass piece with a UV laser beam focused to a focal point within +/−100 μm of the front surface of the glass piece most desirably within +/−50 μm of the front surface. The lens focusing the laser has a numerical aperture desirably in the range of from 0.1 to 0.4, more desirably in the range of from 0.1 to 0.15 for glass thickness between 0.3 mm and 0.63 mm, even more desirably in the range of from 0.12 to 0.13, so as to produce open holes extending into the glass piece 100 from the front surface 102 of the glass piece, the holes having an diameter the in range of from 5 to 15 μm, and an aspect ratio of at least 20:1. For thinner glass, in the range of from 0.1-0.3 mm, the numerical aperture is desirably from 0.25 to 0.4, more desirably from 0.25 to 0.3, and the beam is preferably focused to within +/−30 μm of the front surface of the glass. The laser is desirable operated at a repetition rate of about 15 kHz or below. An array of holes thus produced may then be enlarged by etching. The front surface may be polished prior to etching, if desired.

GLASS-BASED SUBSTRATE WITH VIAS AND PROCESS OF FORMING THE SAME

A glass sensor substrate including metallizable through vias and related process is provided. The glass substrate has a first major surface, a second major surface and an average thickness of greater than 0.3 mm. A plurality of etch paths are created through the glass substrate by directing a laser at the substrate in a predetermined pattern. A plurality of through vias through the glass substrate are etched along the etch paths using a hydroxide based etching material. The hydroxide based etching material highly preferentially etches the substrate along the etch path. Each of the plurality of through vias is long compared to their diameter for example such that a ratio of the thickness of the glass substrate to a maximum diameter of each of the through vias is greater than 8 to 1. 1. A process for forming vias in a glass-based substrate having a first major surface and an opposing second major surface , the process comprising:creating a plurality of etch paths extending from the first major surface of the glass substrate by directing a laser at the substrate in a predetermined pattern; andetching a plurality of vias extending from the first major surface of the glass substrate along the etch paths using a hydroxide based etching material, wherein the hydroxide based etching material preferentially etches the substrate along the etch path such that an etch rate of the etching material along the etch path is at least 12 times greater than an etch rate of the etching material outside of the etch paths.2. The process of claim 1 , wherein each of the plurality of vias have a ratio of the length of the via to a maximum diameter of the via is greater than 8 to 1.3. The process of claim 1 , wherein at least one of the plurality of vias is a through via.4. The process of claim 1 , wherein at least one of the plurality of vias is a blind via.5. The process of claim 1 , wherein the laser is a picosecond laser.6. The process of claim 1 , wherein the maximum diameter of each of ...

ADDITIVE MANUFACTURE OF OPTICAL COMPONENTS

A method of forming an optical component includes depositing slurry that includes glass powder material onto a facesheet and fusing the glass powder material to a facesheet to form a first core material layer on the facesheet. The method also includes successively fusing glass powder material in a plurality of additional core material layers to build a core material structure on the facesheet. The method can include selectively depositing slurry including glass powder material over only a portion of at least one of the facesheet, the first core material layer, and/or the one of the additional core material layers. Depositing the slurry can include extruding the slurry from an extruder. 1depositing slurry including glass powder material onto a facesheet;fusing the glass powder material to the facesheet to form a first core material layer on the facesheet; andsuccessively depositing and fusing glass powder material in at least one additional core material layer to build a core material structure on the facesheet.. A method of forming an optical component comprising: This application is a continuation of, and claims the benefit of, U.S. application Ser. No. 15/348,136, filed on Nov. 10, 2016, the entire contents of which are hereby incorporated by reference.The present disclosure relates to optics and additive manufacturing, and more particularly to additively manufacturing optics, e.g., from low expansion glass.Conventional lightweight glass mirror substrates are generated with subtractive manufacturing, milling, grinding, polishing, or etching away material from a large glass boule. These processes can create a stiff, lightweight glass structure with a precisely shaped optical surface, which remains stable under thermal and mechanical loads. But because glass is fragile, it is challenging to manufacture many small, intricate features with these conventional processes, and such intricate features can be important to manufacturing lightweight optics.The conventional ...

ELECTRICAL STORAGE SYSTEM INCLUDING A SHEET-LIKE DISCRETE ELEMENT, SHEET-LIKE DISCRETE ELEMENT, METHOD FOR PRODUCING SAME, AND USE THEREOF

An electrical storage element is provided that includes at least one discrete sheet-like element with increased transparency to high-energy electrical radiation. Discrete sheet-like elements exhibiting increased transparency to high-energy electrical radiation and the manufacturing thereof are also provided. 1. An electrical storage system , comprising:a sheet-like discrete element,wherein the sheet-like discrete element has a transmittance selected from the group consisting of: 0.1% or more in a range from 200 nm to 270 nm at a thickness of 30 μm, more than 0.5% at 222 nm at a thickness of 30 μm, more than 0.3% at 248 nm at a thickness of 30 μm, more than 3% at 282 nm at a thickness of 30 μm, more than 50% at 308 nm at a thickness of 30 μm, more than 88% at 351 nm at a thickness of 30 μm, 0.1% or more from 200 nm to 270 nm at a thickness of 100 μm, more than 0.5% at 222 nm at a thickness of 100 μm, more than 0.3% at 248 nm at a thickness of 100 μm, more than 0.1% at 282 nm at a thickness of 100 μm, more than 30% at 308 nm at a thickness of 100 μm, more than 88% at 351 nm at a thickness of 100 μm, andwherein the sheet-like discrete element has a thickness variation of not more than 25 μm based on wafer or substrate sizes in a range of >100 mm in diameter.2. The electrical storage system as claimed in claim 1 , wherein the transmittance is 15% or more in the range from 200 nm to 270 nm at a thickness of 30 μm.3. The electrical storage system as claimed in claim 1 , wherein the thickness variation is not more than 5 μm.4. The electrical storage system as claimed in claim 1 , wherein the sheet-like discrete element exhibits a water vapor transmission rate (WVTR) of <10g/(m·d).5. The electrical storage system as claimed in claim 1 , wherein the sheet-like discrete element has a thickness of less than 2 mm.6. The electrical storage system as claimed in claim 1 , wherein the sheet-like discrete element has a thickness of less than or equal to 100 μm.7. The electrical ...

Locally-sintered porous soot parts and methods of forming

A porous soot sheet is formed using a roll-to-roll glass soot deposition and sintering process. The soot sheet formation involves depositing glass soot particles on a deposition surface to form a supported soot layer, removing the soot layer from the deposition surface to form a soot sheet, and heating a portion of the soot sheet to locally-sinter the glass soot particles and form a porous soot part having a sintered peripheral edge.

METHOD OF MANUFACTURING A WAVEGUIDE

A method of manufacturing a waveguide in a glass plate is disclosed. The glass plate is scanned with a laser beam directed orthogonally to the glass plate to form a trench according to a pattern of the waveguide to be formed. The scanning is performed by pulses of the laser beam having a duration between 2 and 500 femtoseconds. The glass plate with the trench is treated with hydrofluoric acid. After treating the glass plate, the trench is filled with a material having an index different from that of glass, and, after filling the trench, a cladding layer is deposited. 1. A method of manufacturing a waveguide in a glass plate , the method comprising:scanning the glass plate with a laser beam directed orthogonally to the glass plate to form a trench according to a pattern of the waveguide to be formed, the scanning being performed by pulses of the laser beam having a duration between 2 and 500 femtoseconds, wherein the scan of the laser beam according to the pattern forms exactly one trench in the glass plate;treating the glass plate with the trench with hydrofluoric acid;after treating the glass plate, filling the trench with a material having an index different from that of glass; andafter filling the trench, depositing a cladding layer.2. The method of claim 1 , wherein the trench has a depth between from 5 μm and 10 μm and a width between 5 μm and 10 μm.3. The method of claim 1 , wherein the filled trench is a single-mode waveguide.4. The method of claim 1 , wherein the material is a polymer.5. The method of claim 4 , further comprising performing a cross-linking and after filling the trench.6. The method of claim 1 , further comprising performing a planarization step after filling the trench.7. The method of claim 6 , wherein the planarization step is carried out by chemical-mechanical polishing.8. The method of claim 1 , wherein filling the trench with the material comprises laminating the material in the trench.9. The method of claim 1 , wherein the trench has a ...

METHOD OF MANUFACTURING WINDOW FOR A DISPLAY DEVICE

A method of manufacturing a window includes preparing a base material layer, forming a first hard coating layer on the base material layer, and forming a second hard coating layer on the first hard coating layer. The forming of the second hard coating layer is performed in an environment having an oxygen concentration of about 0.01% to about 0.1%. 1. A method of manufacturing a window , the method comprising:preparing a base material layer;forming a first hard coating layer on the base material layer; andforming a second hard coating layer on the first hard coating layer,wherein the forming of the second hard coating layer is performed in an environment having an oxygen concentration of about 0.01% to about 0.1%.2. The method of claim 1 , wherein the forming of the first hard coating layer comprises:coating a first solution including acrylic and epoxy on the base material layer; andhardening the first solution.3. The method of claim 1 , wherein the forming of the second hard coating layer comprises:coating a second solution including fluorine on the first hard coating layer; andhardening the second solution.4. The method of claim 3 , wherein the hardening of the second solution comprises:disposing a preliminary window in a first chamber that is disposed in a second chamber, the preliminary window including the base material layer, the first hard coating layer formed on the base material layer and an unhardened second solution coated on the first hard coating layer;adjusting an oxygen ratio in the first chamber;providing ultraviolet light in the second chamber to harden the preliminary window.5. The method of claim 4 , wherein the adjusting of the oxygen ratio allows an oxygen concentration in the first chamber to range from about 0.01% to about 0.1%.6. The method of claim 4 , wherein the adjusting of the oxygen ratio in the first chamber comprises injecting a nitrogen gas into the first chamber and exhausting air in the first chamber through an exhaust valve.7. The ...

THROUGH-GLASS VIA HOLE FORMATION METHOD

A through-glass via hole formation method, includes: an internal deformation region formation step in which an internal deformation region is formed inside a glass substrate at a predetermined distance from a surface of the glass substrate; a surface etching step in which the glass substrate is thinned by immersing the glass substrate in an etching solution such that a portion of the surface of the glass substrate, at which the internal deformation region is not formed, is etched and removed at a first etching rate; and a through-glass via hole formation step in which, with the glass substrate immersed in the etching solution, the internal deformation region is etched and removed at a second etching rate higher than the first etching rate such that a through-glass via hole is formed in the glass substrate along the internal deformation region. 1. A through-glass via hole formation method comprising:an internal deformation region formation step in which an internal deformation region is formed inside a glass substrate at a predetermined distance from a surface of the glass substrate by irradiating the glass substrate with a laser beam at an intensity not exceeding an ablation threshold of the glass substrate;a surface etching step in which the glass substrate is thinned by immersing the glass substrate in an etching solution such that a portion of the surface of the glass substrate, at which the internal deformation region is not formed, is etched and removed at a first etching rate; anda through-glass via hole formation step in which, with the glass substrate immersed in the etching solution, the internal deformation region is etched and removed at a second etching rate higher than the first etching rate such that a through-glass via hole is formed in the glass substrate along the internal deformation region.2. The through-glass via hole formation method according to claim 1 , wherein a thickness of the portion of the surface of the glass substrate removed in the ...

Method for storing information on a spectacles lens, spectacles lens blank or spectacles lens semi-finished product

Information is stored in an optical element in the form of a glass or plastic body embodied as spectacles lens, spectacles lens blank or spectacles lens semi-finished product. The information in the form of data is stored on or in the glass or plastic body by creating at least one marking with a marking system. The marking can be read by a reading apparatus. The marking system has an interface for reading information individualizing the optical element. The marking is created permanently by the marking system on or in the optical element at a definition point of a local body-specific coordinate system set by two points on or in the optical element. In this body coordinate system, the manufacturer specifies the position of the lens horizontal and/or the far and/or the near and/or the prism reference point.

LASER RESEALING WITH STRESS-REDUCING PRESTRUCTURING

A method for manufacturing a micromechanical component including a substrate and a cap connected to the substrate and together with the substrate enclosing a first cavity, a first pressure prevailing and a first gas mixture with a first chemical composition being enclosed in the first cavity: in a first method step, an access opening, connecting the first cavity to surroundings of the micromechanical component, being formed in the substrate or in the cap; in a second method step, the first pressure and/or the first chemical composition being adjusted in the first cavity; in a third method step, the access opening being sealed by introducing energy and heat into an absorbing part of the substrate or the cap with the aid of a laser; in a fourth method step, a recess being formed, and/or an elevation being formed, and/or a reflection area being formed, and/or an absorption area being formed. 1. A method for manufacturing a micromechanical component including a substrate and a cap connected to the substrate and together with the substrate enclosing a first cavity , a first pressure prevailing and a first gas mixture with a first chemical composition being enclosed in the first cavity , the method comprising:in a first step, forming an access opening, connecting the first cavity to surroundings of the micromechanical component, in the substrate or in the cap;in a second step, adjusting at least one of the first pressure and the first chemical composition, in the first cavity;in a third step, sealing the access opening by introducing energy and heat into an absorbing part of the substrate or the cap with the aid of a laser; and (i) forming a recess in a surface of the substrate or of the cap, facing away from the first cavity in the area of the access opening for accommodating a material area of the substrate or the cap converted into a liquid aggregate state in the third step,', '(ii) forming an elevation on the surface of the substrate or of the cap facing away from the ...

Laser Processing System Using Broad Band Pulsed Lasers

A laser material processing system which includes a pulsed fiber laser source having a continuous wavelength bandwidth of larger than 100 nm and pulse width of from 100 femtosecond to 1 microsecond, a broad band laser emitted from one core of an optical fiber, where the broad band laser is applied to a subject material to produce removal of the subject material and/or color change of the subject material. 1. A laser material processing system comprising:a pulsed fiber laser source having a continuous wavelength bandwidth of larger than 100 nm and pulse width of from 100 femtosecond to 1 microsecond, a broad band laser being emitted from one core of an optical fiber;the broad band laser is applied to a subject material to produce removal of the subject material and/or color change of the subject material.2. The laser material processing system of claim 1 , wherein said material comprises a polymeric material.3. The laser material processing system of claim 2 , wherein said polymeric material is selected from the group consisting of polystyrene and polymethylmethacrylate.4. The laser material processing system of claim 1 , wherein said material comprises an inorganic glass oxide.5. The laser material processing system of claim 1 , wherein said material comprises a semiconductor material.6. A method to form an aperture through a substrate claim 1 , comprising:providing a substrate;providing a laser material processing system comprising a pulsed fiber laser source having a continuous wavelength bandwidth of larger than 100 nm and pulse width of from 100 femtosecond to 1 microsecond;directing said laser energy from said material processing system onto said substrate to form said aperture.7. The method of claim 6 , wherein said substrate comprises a polymeric material.8. The method of claim 7 , wherein said polymeric material is selected from the group consisting of polystyrene and polymethylmethacrylate.9. The method of claim 6 , wherein said substrate comprises an ...