МНОГОСЛОЙНЫЕ ПИГМЕНТЫ НА ОСНОВЕ СТЕКЛЯННЫХ ЧЕШУЕК

Изобретение может быть использовано в производстве многослойных пигментов на основе стеклянных чешуек, применяемых в красках, лаках, пластмассах, фольге, керамических материалах и косметических композициях, для лазерной маркировки бумаг и пластмасс. В многослойных пигментах на основе стеклянных чешуек стеклянные чешуйки покрыты, по крайней мере, тремя чередующимися слоями с высоким и низким показателем преломления. Пигменты включают, по крайней мере, одну последовательность слоев, которая содержит: (А) покрытие, которое имеет показатель преломления n>1,8, (В) покрытие, которое имеет показатель преломления n≤1,8, (С) покрытие, которое имеет показатель преломления n>1,8, и, при необходимости, (D) внешний защитный слой при условии, что пакет слоев (А)+(В) может присутствовать в стандартной послойной сборке (А)+(В)+(С) до четырех раз. Изобретение позволяет интенсифицировать интерференционный цвет многослойных пигментов, 5 н. и 6 з.п. ф-лы.

КОМПОЗИЦИОННЫЙ МАТЕРИАЛ

Изобретение относится к авиационной, космической технике, электротехнике, автомобиле- и приборостроению, а именно к композиционным материалам на основе стекломатриц, армированных непрерывными углеродными наполнителями. Предложенный композиционный материал включает стекломатрицу 60-66 мас.%, содержащую SiO2, В2О3, а в качестве армирующего углеродного наполнителя, в количестве 34-40 мас.%, используют высокопрочный углеродный жгут на основе полиакрилнитрила, при этом стекломатрица дополнительно содержит SiOC, при следующем соотношении компонентов матрицы, мас.%: SiO2 58,9-69,3; В2О3 13,5-15; SiOC 15,7-27,6. Изобретение позволяет улучшить фазовую термостабильность и увеличить уровень разрушающего напряжения при изгибе при увеличении уровня рабочих температур выше 500oС. Предложенный композиционный материал содержит экологически-, пожаро- и взрывобезопасные компоненты. 1 з. п.ф-лы, 2 табл.

Verfahren zur Herstellung optischer Elemente und Komponenten in ihren endgültigen oder nahezu endgültigen Abmessungen

VERFAHREN ZUR HERSTELLUNG VON GLASARTIKELN, INSBESONDERE VON OPTISCHEN FASERN

Elektrische Infrarot-Glühlampe und Verfahren zur Herstellung derselben

Quarzglas mit hoher Brechungsindex-Homogenität und Verfahren zur Herstellung desselben

Synthetisches Siliciumdioxid-Glasmaterial mit einem OH-Gehalt von 0,1 bis 1.300 Gew. ppm mit einer Schwankung in der OH-Konzentration in einer Ebene senkrecht zu einer optischen Achse davon von weniger als 20 Gew. ppm, und das Schlieren in der Richtung der Achse, welche senkrecht zu der Ebene ist, in der die OH-Schwankung weniger als 20 Gew. ppm beträgt, einschließt.

Verfahren zum Herstellen eines getruebten, aus etwa 96% SiO bestehenden Glases

Vorrichtung zur Nassbehandlung von laufenden Faeden, insbesondere zur Nachbehandlung von kuenstlichen Faeden im fortlaufenden Arbeitsgang

Mehrschichtige keramische Platine, Verfahren zu ihrer Herstellung und ihre Anwendung.

Optische Teile und Rohlinge aus synthetischem Siliziumdioxidglas und Verfahren zu ihrer Herstellung.

Verfahren zur Unterdrückung einer Metallverunreinigung bei einer Hochtemperaturbehandlung von Materialien

Es wird ein Verfahren zur Behandlung von Glas und kristallinen, anorganischen Materialien offenbart, wobei eine Metallverunreinigung während eines solchen Verfahrens verhindert wird. Solche Verfahren schließen die Behandlung des Materials in Gegenwart einer reinigenden Atmosphäre, die ein Reinigungsgas umfasst, ein. Das Verfahren ist insbesondere vorteilhaft für die Behandlung hochreinen, synthetischen Quarzglases zur Verwendung in hoch entwickelten, lithographischen Vorrichtungen.

Verfahren zur Herstellung eines dotierten SiO2-Schlickers sowie Verwendung des SiO2-Schlickers

Die Erfindung betrifft ein Verfahren zur Herstellung eines dotierten SiO2-Schlickers indem eine SiO2-Suspension mit mindestens einer Dotierlösung in Wechselwirkung gebracht wird, wobei die SiO2-Suspension oder/und die Dotierlösung als Sprühnebel aufeinander einwirken, dessen mittlerer Tropfendurchmesser im Bereich zwischen 10 m und 100 m liegt. Die Erfindung betrifft weiterhin die Verwendung eines mittels des Sprühnebelverfahrens dotierten SiO2-Schlickers zur Herstellung von dotiertem Quarzglas, insbesondere zur Herstellung von laseraktivem Quarzglas.

VERFAHREN ZUR DETERMINIERUNG VON LASER-INDUZIERTER KOMPAKTIERUNG IN GESCHMOLZENEM QUARZ

Infrarotstrahler

Infrarot-Flächenstrahler mit einem eine Oberfläche aufweisenden Substrat aus einem elektrisch isolierenden Werkstoff sind bekannt. Der elektrisch isolierende Werkstoff ist in Kontakt mit einer Leiterbahn aus einem elektrisch leitenden und bei Stromdurchfluss Wärme erzeugenden Widerstandsmaterial. Um hiervon ausgehend einen Infrarotstrahler, insbesondere einen Infrarot-Flächenstrahler, mit hoher Strahlungsleistung pro Flächeneinheit bereitzustellen, der sich an die Geometrie der zu beheizenden Oberfläche einfach anpassen lässt und der auch bei dünnen Substrat-Wandstärken ein homogenes Aufheizen ermöglicht, wird erfindungsgemäß vorgeschlagen, dass der Substrat-Werkstoff eine amorphe Matrixkomponente umfasst, in die eine im Spektralbereich der Infrarotstrahlung absorbierende Zusatzkomponente eingelagert ist.

SCHMELZQUARZGLAS ENTHALTENDES ALUMINIUM

SCHMELZQUARZGLAS ENTHALTEND ALUMINIUM

Verfahren zur Herstellung eines Quarzglas-Großrohres

Zur Herstellung eines Quarzglas-Großrohres sind mehrstufiges Umformverfahren bekannt, bei denen in einem ersten Umformschritt unter Einsatz eines Formwerkzeugs ein Zwischenzylinder aus Quarzglas mit einer Zwischenzylinder-Wandstärke und einem Zwischenzylinder-Außendurchmesser geformt und anschließend abgekühlt wird, und in einem zweiten Umformschritt mindestens ein Längenabschnitt des abgekühlten Zwischenzylinders einer Heizzone zugeführt, darin zonenweise auf eine Erweichungstemperatur erhitzt und um seine Längsachse rotierend zu dem Quarzglas-Großrohr mit einer End-Wandstärke und einem End-Außendurchmesser umgeformt wird. Geometrieschwankungen nehmen mit dem Außendurchmesser des Endrohres exponentiell zu. Um Hiervon ausgehend ein Verfahren anzugeben, das bei wirtschaftlich vertretbarem Aufwand die Herstellung von Quarzglasrohren erlaubt, die auch bei großem Außendurchmesser von mehr als 500 mm eine hohe Maßhaltigkeit haben, wird erfindungsgemäß vorgeschlagen, dass das Quarzglas synthetisch ...

Verfahren zur Erhoehung der Ritzhaerte und Festigkeit von Glasgegenstaenden, insbesondere Glasflaschen

Zusammensetzung zur Herstellung von Quarzglas unter Anwendung eines Sol-Gel-Verfahrens

Glass composition useful in e.g. halogen lamb bulbs, sunglasses, test tubes, titration cylinders, comprises silicon dioxide in specific amount having specific softening temperature and standard deviation

A glass composition comprises silicon dioxide (40-99 wt.%). The glass composition has a softening temperature of 600-1650[deg]C and a standard deviation less then 10[deg]C, when the softening temperature is measured from >=10 randomly selected samples of glass articles in the lot. Independent claims are included for the following: (1) making (P1) a glass product with reduced variations in its properties involving providing silicon dioxide (40-99 wt.%) and a dopant (D1) (0.1-25 wt.%) selected from metal oxide group of aluminum oxide (Al 2O 3), cerium oxide (CeO 2), neodymium oxide (Nd 2O 3), boron oxide (B 2O 3), titanium dioxide (TiO 2), barium oxide (BaO), strontium oxide (SrO), calcium oxide (CaO), magnesium oxide (MgO), sodium oxide (Na 2O), potassium oxide (K 2O), lithium oxide (Li 2O) and/or antimony oxide (Sb 2O 3), where the dispersant is a fumed metal oxide (preferably silicon dioxide or a metal oxide present in the dopant (D1)) having a BET of 50-400 m 2>/g and a mean particle ...

Verfahren zur Herstellung von Monolithen durch ein Sol-Gel Verfahren

Light-absorbing quartz glass and method of producing it

Optical fiber preform

An optical fiber preform comprising; a) a core portion composed of a silica glass; and, b) a cladding portion surrounding the core portion, the cladding portion being composed of a fluorine-containing silica glass having a lower refractive index than the core portion, the core portion including: i) a first region that does not include a central axis of the core portion, the first region containing a first dopant selected from sodium, potassium, and compounds thereof, and ii) a second region that includes the central axis of the core portion, the second region containing a second dopant that reduces the viscosity of the silica glass, the second dopant having a diffusion coefficient of 1 ´ 10−12 cm2/s or more and less than the first dopant at a temperature of 2,000°C to 2,300°C, wherein the entire core portion has an average first dopant concentration of 10 atomic ppm or more and 2,000 atomic ppm or less, and the entire core portion has an average second dopant concentration of 10 atomic ...

Improvements in and relating to the production of alumina/silica catalysts

A sheletal glass or porous alumina/silica catalyst (see Group III), is used in the dealkylation or isomerization of hydrocarbons and in the dehydration of alcohols. Examplified are (a) isomeric butylbenzenes are catalytically converted at 400 DEG C. to benzene and butene; (b) a mixture of isomeric oxylenes, 95 per cent para-xylene, is isomerized, using a catalyst at 430 DEG C., to a product containing 40 per cent para-xylene; (c) isopronanol is dehydrated to propylene using a catalytic bed at 240 DEG C.ALSO:A skeletal glass or porous catalyst containing silica and alumina and substantially free from alkali metals is produced by fusing a uniform mixture of silica, alumina, boric oxide and an alkaline earth, or suitable substitutes, such as alkaline earth silicates, aluminates, or borates, to produce a glass and heating, preferably between 650 DEG and 950 DEG C., to form at least two phases at least one of which is soluble. Decomposable alkaline earth metal salts, such as calcium carbonate ...

FORMING GLASS BODIES BY FLAME HYDROLYSIS

... 1497215 Forming glass by flame hydrolysis CORNING GLASS WORKS 15 April 1975 [22 April 1974] 15412/75 Heading C1M In making a glass body by flame hydrolysis, glass soot 18 produced in the flame 16 is deposited as a porous preform 10 on a carrier 12, and the preform 10 heated to a temperature (e.g. 1250-1700‹ C.) and for a time sufficient to consolidate the soot to a dense glass layer, the consolidation being conducted in a dry chlorine-containing atmosphere such that hydroxyl ions in the preform are replaced by chloride ions, thereby resulting in a glass that is substantially water-free (i.e. contains less than 10 p.p.m. by weight of water). The consolidation atmosphere preferably contains up to 5 vol. per cent chlorine and the balance comprises helium (although 0À5 vol. per cent of the helium may be replaced by oxygen). The preform 10 may be deposited on a carrier 12 of graphite or fused silica, the preform consisting of, e.g. 100 wt. per cent SiO 2 or 90 wt. per cent SiO 2 and 10 wt. per ...

OPTICAL MATERIAL FROM QUARTZ GLASS FOR EXCIMER LASER AND EXCIMER LAMP, AND PROCEDURE FOR ITS PRODUCTION

QUARTZ GLASS ELEMENTS FOR EXCIMER LASERS AND PROCEDURES FOR THEIR PRODUCTION

DISPERSION, CONTAINING SILICON TITANIUM MIXTURE OXIDE POWDERS, MAKING OF GRUNKÍRPER AND GLASFORMKÍRPER OF IT

PROCEDURE FOR PRODUCTION OF QUARTZ GLASS AND A QUARTZ GLASS GATHERING MOLD

AMPLIFIER GLASS FIBER, WHICH COVER NANO-PARTICLES, AND MANUFACTURING PROCESS

OWNER FROM QUARTZ GLASS FOR THE PROCESSING OF HALBLEITERWAFERN AND PROCEDURES FOR THE PRODUCTION OF THE OWNER

CRUCIBLE FROM ENDOWED ONE SILICAGLAS FOR MANUFACTURING SILICON STAFFS

QUARTZ GLASS BODY FOR AN OPTICAL CONSTRUCTION UNIT AND PROCEDURE FOR ITS PRODUCTION

PROCEDURE FOR THE PRODUCTION OF WATER AND NONPOROUS ONE, TRANSPARENT ONE FLINT SOUR GLASS OPTICALLY QUALITAT

PROCEDURE FOR THE PRODUCTION OF GLASS ARTICLES FROM A TUBULAR GLASS GATHERING MOLD

GLASSLIKE SILICON DIOXIDE PRODUCTS

PROCEDURE AND DEVICE FOR IN THE PROCEDURE RIVER TAKING PLACE DEHYDROGENISIERUNG FROM GATHERING MOLDS TO PULLING FIBERS.

PROCEDURE FOR THE PRODUCTION OF SIO2-TIO2-GLÄSERN WITH SMALL THERMAL COEFFICIENT OF EXPANSION

PROCEDURE FOR MANUFACTURING SILICON DIOXIDE BY DECOMPOSITION OF A ORGANOSILANS

SOL-GEL PROCEDURE USING POROUS FORMS

GATHERING MOLD FROM SYNTHETIC VITREOUS SILICA AND DEVICE TO YOUR PRODUCTION

QUARTZ GLASS BLANK FOR AN OPTICAL CONSTRUCTION UNIT AS WELL AS PROCEDURE FOR THE PRODUCTION AND USE OF THE SAME

QUARTZ GLASS BLANK FOR AN OPTICAL CONSTRUCTION UNIT AND USE OF THE SAME

Method for preparation of synthetic vitreous silica and apparatus for heat treatment

OPTICAL FIBRE PREFORM PRODUCTION

Method for purifying polyalkylsiloxanes and the resulting products

Luminescent glass

PROCESS FOR MAKING NON-POROUS, MICRON-SIZED HIGH PURITY SILICA

Method for the production of shaped silica aquagels

SOL-GEL PROCESS FOR THE PRODUCTION OF GLASSY ARTICLES

SYNTHETIC QUARTZ GLASS MEMBER AND PROCESS FOR PRODUCING THE SAME

QUARTZ GLASS DOPED WITH RARE EARTH ELEMENT AND PRODUCTION THEREOF

Sol-gel process for providing a tailored gel microstructure

Synthetic quartz glass optical member for ultraviolet light and reduction projection exposure system using the same

Coated metal element used for producing glass

Sol-gel process for providing a tailored gel microstructure

CONTINUOUS PRODUCTION OF OPTICAL FIBRES

TREATING SOOT PREFORMS WITH A REDUCING AGENT

A silica soot preform (12) is inserted into a furnace (30). The preform is then treated with heat and carbon monoxide gas (32) so as to reduce impurities that could effect the final product.

METHOD OF REMOVING ENTRAPPED GAS AND/OR RESIDUAL WATER FROM GLASS

METHOD OF MAKING OPTICAL WAVEGUIDES

METHOD OF MAKING OPTICAL WAVEGUIDES A method of making low loss glass optical waveguides, wherein at least one coating of glass soot is deposited by the flame hydrolysis process on a starting member. The soot coating is heated to its consolidation temperature in an atmosphere containing helium and an amount of chlorine that is effective to substantially remove the water from the glass soot while the soot is being consolidated to form a dense glass layer. The starting member is removed unless it is to form a part of the optical waveguide. The resultant structure, including the dense glass body, is then drawn into a waveguide fiber.

SILICEOUS MATERIAL

LIGHT AMPLIFYING OPTICAL FIBER

An optical fiber for optical amplifying, capable of amplifying optical signals at least in the vicinity of wavelengths of 1.57 to 1.62 .mu.m with a high gain in optical communication or the like. A clad (5) lower in refractive index than a core (1) is formed on the outer peripheral side of the erbium-added core (1), with the relative refractive index difference .DELTA. of the core (1) with respect to the clad (5) set to at least 0.3% and up to 1%. The core has a composition Er-Al2O3-GeO2-SiO2, and the clad has a composition SiO2, with erbium added to the entire region of the core at a concentration of 1000 wtppm and with the cutoff wavelength of the optical fiber set to 1400 nm. A constant cutoff wavelength of the optical fiber and an optimized relative refractive index difference .DELTA. can optimize a core diameter, avoid a reduction in gain due to an optical fiber bending loss, and increase a gain per optical fiber unit length by increasing an erbium absorption amount per optical fiber ...

VISCOSITY TAILORING OF FUSED SILICA

VISCOSITY TAILORING OF FUSED SILICA of the Invention A synthetic fused silica composition comprising silica and aluminum, wherein said aluminum is generally present in at least 7 parts per million and the composition has a viscosity of at least 1014.5 poise.

METHOD FOR FABRICATING SILICA GLASS

A silica glass fabrication method. The method includes the steps of adding silica and a dispersant to a premix solution obtained by dissolving a monome r for acrylic resin and a cross-linking agent in a distilled water, and dispersing themixed solution, and adjusting the pH of the mixture, to form a sol; removing airbubbles from the sol, and then aging the sol; ad ding a polymerization initiator to the aging-treated sol, and adjusting the pH of the reaction mixture; pouring thereaction mixture into a mold, aging the mixture in a n incubator at a high temperature and then gelating the resultant; aging the obtained gel, demoldi ng the aging-treated gel, and then drying the demolded gel; thermally-treating the dried gel to remove organic substances from the gel; and performing a hydroxy grou p elimination reaction and a sintering reaction on the gel from which organic substances have been removed. Therefore, a high purity silica glass tube, in which cracking after drying scarcely occurs and ...

ELECTRIC LAMP HAVING A FLUORESCENCE-SUPPRESSED QUARTZ-GLASS ENVELOPE, AND QUARTZ GLASS THEREFOR

To inhibit, or at least sharply attenuate, fluorescence of a quartz-glass envelope (10) surrounding a light source (11), such as a halogen incandescent lamp, a high-pressure discharge lamp, or the like, when the quartz glass is subjected to ultraviolet (UV) radiation from the light source, and has been doped with a UV radiation absorbing material, typically a cerium, or cerium- titanium doping, the quartz-glass envelope is additionally doped with praseodymium or a praseodymium compound, such as praseodymium oxide or praseodymium aluminate. The pure praseodymium in the doping is, preferably, present in quantities of between about 0.008 and 1.25%, by weight, with reference to the undoped quartz glass. Barium metaborate can also be used, preferably together with praseodymium to attenuate the fluorescence. Preferably, the praseodymium is used as a combined doping with cerium, in form of a cerium-praseodymium aluminate, added to the starting material for the quartz glass, and before the quartz ...

METHOD FOR FORMING SILICA BY COMBUSTION OF LIQUID REACTANTS USING OXYGEN

The present invention is directed to a method for making silica. A liquid siloxane-containing feedstock capable of being converted by thermal oxidative decomposition to SiO2 is provied and introduced directly into the flame of a combustion burner, which converts the compound to silica, thereby forming finely divided amorphous soot. The soot is vaporized at the conversion and/or deposition site where the liquid is converted into silica by atomizing the liquid with a stream of oxygen gas, or a mixture of oxygen gas and other gas, such as nitrogen. The amorphous soot is deposited on a receptor surface where, either substantially simultaneously with or subsequently to its deposition, the soot is consolidated into a body of fused silica glass, such as an optical fiber preform.

Erzeugnis, das im wesentlichen aus glasigem gesintertem Quarz besteht, und Verfahren zu dessen Herstellung.

Procédé de fabrication d'objets en verre à haute teneur de silice et objet obtenu par ce procédé.

Procédé de fabrication de verre de silice.

Appareil pour le traitement liquide de fils textiles.

Verfahren zur Herstellung von Hüllen für Gasentladungsstrahler

Verre de silice à absorption ménagée dans l'ultra-violet

Appareil thermique

Röhrendampfkessel.

Separatore di miscele liquidi-gas o liquidi-vapori.

Procédé de fabrication d'objets d'une haute teneur en silice et objet obtenu selon ledit procédé.

Procédé de fabrication d'une pièce satinée et translucide en silice pure fondue

Verfahren zur Herstellung eines durchsichtigen Gegenstandes aus glasigem Siliciumdioxyd

Verfahren zur Herstellung von gefärbtem glasigem Siliciumdioxyd

Verfahren zur Herstellung von Borsilicatglas

Verfahren zum Behandeln von kristallinem Quarz für optische Zwecke

Verfahren zur Reinigung von Quarzsand bzw. Herstellung reiner Quarzschmelze

Verre de silice

Quarzglasrohr mit Überzug

Verfahren zur Herstellung von metall- und kohlenstofffreiem, im wesentlichen aus Siliziumdioxyd bestehendem Siliziumoxyd

Quarzglaskörper für die Halbleitertechnik

Process for the preparation of synthetic quartz glass, apparatus to carry out the process, and the use of the synthetic quartz glass

PROCEDURE AND EQUIPMENT FOR THE CONTINUOUS FIBER OPTIC PRODUCTION.

METHOD FOR ENTRAPPING TOXIC MATERIAL IN A GLASS MATRIX AND A POROUS SILICATE GLASS OR POROUS SILICA GEL FOR CARRYING OUT SAID METHOD.

PROCEDURE FOR THE PRODUCTION AND FOR DRYING IN A PROCESSING STEP OF A TUBULAR GLASS GATHERING MOLD FOR OPTICAL TRANSVERSE ELECTROMAGNETIC WAVE.

用于耐高温织物的二氧化硅纱线

... 本发明涉及二氧化硅纱线，以及由所述纱线生产的纺织物或无纺织物，所述纱线以重量计包括：30～1500ppm的氧化形式的铝；10～200ppm的氧化形式的钛；不同于Si和O的化学元素的质量之和按重量计低于5000ppm；下面元素可不存在或以很少的含量存在于其中：硼、钠、钙、钾或锂。包括这种二氧化硅纱线的织物，具有优良的耐高温性，因此在高于600℃下长时间保持其挠性。它们尤其用于要求良好的高温挠性的应用中，例如用于炉密封。 ...

PRODUCTION AND AFTERTREATMENT OF SILICA GLASS ARTICLE

Preparation method of core rod of Yb doped quartz fiber preform

Making the large-scale of the quartz glass tube method

Filler powder and its manufacturing method

Depression of gelatinization of siloxanes material in preparation of silicone dioxide

METHOD FOR PRODUCING FLAKY ZIRCONIA TYPE FINE CRYSTALS

Rear earth aluminoborosilicate glass composition

The invention relates to aluminoborosilicate-based glasses suitable for use as a solid laser medium. In particular, these aluminoborosilicate-based laser glasses exhibit broad emission bandwidths of rare earth lasing ions. Although not entirely understood, the broadening of the emission bandwidth is believed to be achieved by the presence of significant amounts of lanthanide ions in the glass matrix. In addition, because of the high values of Young's modulus, fracture toughness and hardness, the rare earth aluminoborosilicate glass system according to the invention is also suitable as transparent armor window material.

Titania-doped quartz glass and making method

A titania-doped quartz glass suited as an EUV lithographic member is prepared by feeding a silicon-providing reactant gas and a titanium-providing reactant gas through a burner along with hydrogen and oxygen, subjecting the reactant gases to oxidation or flame hydrolysis to form synthetic silica-titania fine particles, depositing the particles on a rotating target, and concurrently melting and vitrifying the deposited particles to grow an ingot of titania-doped quartz glass. The target is retracted such that the growth front of the ingot may be spaced a distance of at least 250 mm from the burner tip.

Abnormality detection system, abnormality detection method, and recording medium

Disclosed is an abnormality detection system that accurately detects abnormalities that arise in a device. The abnormality detection system 100, which detects abnormalities that arise in a plasma processing device 2, is provided with: a plurality of ultrasonic sensors 41, which detects acoustic emissions (AE), which cause abnormalities to arise; a distributor 65, which distributes each output signal from the ultrasonic sensors 41 into a first signal and a second signal; a trigger 52, which samples the first signal at, for example, 10 kHz, and generates a trigger signal when predetermined characteristics are detected; a trigger generation time counter 54, which receives trigger signals and determines the time of trigger generation; a data logger board 55, which creates sampling data from sampling the second signal at, for example, 1 MHz; and a PC 50, which analyzes abnormalities arising in the plasma processing device 2 by means of performing a waveform analysis of data from the sampling data, said data corresponding to a set time period using the time of trigger generation determined by the trigger generation time counter 54 as a benchmark.

Aluminum-boron solar cell contacts

Formulations and methods of making solar cells are disclosed. In general, the invention provides a solar cell comprising a contact made from a mixture wherein, prior to firing, the mixture comprises at least one aluminum source, at least one boron source, and about 0.1 to about 10 wt % of a glass component. Within the mixture, the overall content of aluminum is about 50 wt % to about 85 wt % of the mixture, and the overall content of boron is about 0.05 to about 20 wt % of the mixture.

Lead free solar cell contacts

Formulations and methods of making solar cells are disclosed. In general, the invention presents a solar cell contact made from a mixture wherein the mixture comprises a solids portion and an organics portion, wherein the solids portion comprises from about 85 to about 99 wt % of a metal component, and from about 1 to about 15 wt % of a lead-free glass component. Both front contacts and back contacts arc disclosed.

Green luminescent glass for ultraviolet led and preparation method thereof

A green luminescent glass for ultraviolet LED and a preparation method for glass are disclosed. The preparation method includes: weighing raw materials of CaCO 3 , Al 2 O 3 , SiO 2 , CeO 2 and Tb 4 O 7 respectively and mixing the raw materials evenly; melting the raw materials at 1500˜1700 for 0.5˜3 hours and then molding to form a glass; annealing the formed glass in reducing atmosphere with temperature of 650˜1050 for 3˜20 hours; and cooling the glass to room temperature to obtain the green luminescent glass for ultraviolet LED. The green luminescent glass for ultraviolet LED prepared according to the preparation method of the disclosure has advantages of high luminous intensity, uniformity and stability.

Glass powder and method of manufacturing the same

Provided are a glass powder represented as aLi 2 O-bK 2 O-cBaO-dB 2 O 3 -eSiO 2 wherein a+b+c+d+e=1, and and 0.01≦a≦0.1, 0.01≦b≦0.1, 0.01≦c≦0.1, 0.05≦d≦0.3, and 0.3≦e≦0.7 are satisfied in terms of mol %, a method of manufacturing the same, and a multi-layered ceramic material using the same. Therefore, a nano glass powder having an average particle size of 100 nm or less and uniform particle size distribution can be manufactured using liquid phase deposition, specifically, a sol-gel method. In addition, the glass powder can be used as sintering additives to decrease a sintering temperature by about 100° C. in comparison with conventional glass upon manufacture of a ceramic material such as MLCC and MLCI, which can be sintered at a low temperature, contributing to improvement of dielectric capacity and inductance capacity of the parts and increasing quality coefficient.

Copper-contaning silica glass, method for producing the same, and xenon flash lamp using the same

It is an object of the present invention to provide a copper-containing silica glass which emits fluorescence having a peak in a wavelength range of from 520 nm to 580 nm under irradiation of ultraviolet light with a wavelength of 400 nm or less, and which is excellent in long term stability even in the high output use. The copper-containing silica glass is made to have copper of from 5 wtppm to 200 wtppm, which emits fluorescence having a peak in a wavelength range of from 520 nm to 580 nm under irradiation of ultraviolet light with a wavelength ranging from 160 nm to 400 nm, and in which an internal transmittance per 2.5 mm thickness at a wavelength of 530 nm is 95% or more.

Multilayered ceramic electronic component

There is provided a multilayered ceramic electronic component having a reduced thickness and exhibiting hermetic sealing. In multilayered ceramic electronic component, an external electrode includes two layers, that is, first and second layers, and the first and second layers contain glass with different compositions, respectively. Therefore, the multilayered ceramic electronic component having high reliability, such as strong adhesion between the external electrode and the internal electrode, prevention of glass exudation, or the like, may be obtained.

Optical Glass and Optical Element

An optical glass includes, by mass: 38 to 55% of P 2 O 5 ; 1 to 10% of Al 2 O 3 ; 0 to 5.5% of B 2 O 3 ; 0 to 4% of SiO 2 ; 3 to 24.5% of BaO; 0 to 15% of SrO; 1 to 10% of CaO; 0.5 to 14.5% of ZnO; 1 to 15% of Na 2 O; 1 to 4% of Li 2 O; 0 to 4.5% of K 2 O; 0 to 0.4% of TiO 2 ; and 0 to 5% of Ta 2 O 5 , in which BaO+SrO+CaO+ZnO falls within a range of 25 to 39%, Na 2 O+Li 2 O+K 2 O falls within a range of 5 to 20%, Al 2 O 3 +SiO 2 +CaO+Ta 2 O 5 falls within a range of 9 to 18% and P 2 O 5 +B 2 O 3 +Al 2 O 3 +SiO 2 +BaO+SrO+CaO+ZnO+Na 2 O+Li 2 O+K 2 O+TiO 2 +Ta 2 O 5 is equal to 98% or more.

Glass composition and optical device

There is provided a glass composition containing an oxide containing Lu, Si, and Al, in which the composition of the glass composition lies within a compositional region of a ternary composition diagram of Lu, Si, and Al in terms of cation percent, the compositional region being defined by the following six points: (32.3% Lu0 3/2 , 30.0% SiO 2 , 37.7% AlO 3/2 ), (32.3% Lu0 3/2 , 37.7% SiO 2 , 30.0% AlO 3/2 ), (20.8% Lu0 3/2 , 55.0% SiO 2 , 24.2% AlO 3/2 ), (10.0% Lu0 3/2 , 45.0% SiO 2 , 45.0% AlO 3/2 ), (20.8% Lu0 3/2 , 24.2% SiO 2 , 55.0% AlO 3/2 ), and (30.0% Lu0 3/2 , 25.0% SiO 2 , 45.0% AlO 3/2 ). For the glass composition, a glassy state having low or no intrinsic birefringence in the ultraviolet region is stably obtained.

Synthetic amorphous silica powder and method for producing same

The synthetic amorphous silica powder of the present invention is characterized in that it comprises a synthetic amorphous silica powder obtained by applying a spheroidizing treatment to a silica powder, and by subsequently cleaning and drying it so that the synthetic amorphous silica powder has an average particle diameter D 50 of 10 to 2,000 μm; wherein the synthetic amorphous silica powder has: a quotient of 1.00 to 1.35 obtained by dividing a BET specific surface area of the powder by a theoretical specific surface area calculated from the average particle diameter D 50 ; a real density of 2.10 to 2.20 g/cm 3 ; an intra-particulate porosity of 0 to 0.05; a circularity of 0.75 to 1.00; and a spheroidization ratio of 0.55 to 1.00.

Glass composition, light source device and illumination device

A glass composition including, in oxide-based mol %: (a) at least 30% and at most 50% P 2 O 5 , (b) at least 10% and at most 50% ZnO, (c) at least 0.1% and at most 10% Al 2 O 3 , (d) at least 0% and at most 50% Li 2 O, (e) at least 0% and at most 50% Na 2 O, (f) at least 0% and at most 50% K 2 O, (g) at least 0% and at most 20% MgO, (h) at least 0% and at most 20% CaO, (i) at least 0% and at most 20% SrO, (j) at least 0% and at most 20% BaO, (k) at least 0% and at most 20% SnO, and (1) at least 0% and at most 5% B 2 O 3 , substantially not comprising ZrO 2 and Ag 2 O, and (a)/(b), the ratio of (a) and (b), being at least 0.2 and at most 2.0.

Glass substrate for information recording medium and magnetic information recording medium to which the glass substrate is applied

Disclosed are a glass substrate for an information recording medium, having excellent scratch resistance and a light weight and having high fracture toughness, the glass substrate having a fragility index value, measured in water, of 12 μm −1/2 or less or having a fragility index value, measured in an atmosphere having a dew point of −5° C. or lower, of 7 μm −1/2 or less, or the glass substrate comprising, by mol %, 40 to 75% of SiO 2 , 2 to 45% of B 2 O 3 and/or Al 2 O 3 and 0 to 40% of R′ 2 O in which R′ is at least one member selected from the group consisting of Li, Na and K), wherein the total content of SiO 2 , B 2 O 3 , Al 2 O 3 and R′ 2 O is at least 90 mol %, and a magnetic information recording medium comprising a magnetic recording layer formed on the glass substrate.

GLASS SUBSTRATE FOR FLAT PANEL DISPLAY AND MANUFACTURING METHOD THEREOF

A flat panel display glass substrate includes a glass comprising, in mol %, 55-80% SiO, 3-20% AlO, 3-15% BO, and 3-25% RO (the total amount of MgO, CaO, SrO, and BaO). The contents in mol % of SiO, AlO, and BOsatisfy a relationship (SiO+AlO)/(BO)=7.5-17. The strain point of the glass is 665° C. or more. The devitrification temperature of the glass is 1250° C. or less. The substrate has a heat shrinkage rate of 75 ppm or less. The rate of heat shrinkage is calculated from the amount of shrinkage of the substrate measured after a heat treatment which is performed at a rising and falling temperature rate of 10° C./min and at 550° C. for 2 hours by the rate of heat shrinkage (ppm)={the amount of shrinkage of the substrate after the heat treatment/the length of the substrate before the heat treatment}×10. 1. A flat panel display glass substrate on which a p-Si TFT can be formed , the flat panel display glass substrate comprising a glass comprising , as expressed in mol %:{'sub': '2', '55-80% SiO;'}{'sub': 2', '3, '3-20% AlO;'}{'sub': 2', '3, '3-15% BO; and'}3-25% RO, where RO represents the total amount of MgO, CaO, SrO, and BaO, wherein{'sub': 2', '2', '3', '2', '3', '2', '2', '3', '2', '3, 'in the glass, the contents in mol % of SiO, AlO, and BOsatisfy a relationship (SiO+AlO)/(BO)=7.5-17,'}the strain point of the glass is 665° C. or more,the devitrification temperature of the glass is 1250° C. or less,the glass substrate has a rate of heat shrinkage of 75 ppm or less, and {'br': None, 'sup': '6', 'the rate of heat shrinkage (ppm)={the amount of shrinkage of the glass substrate after the heat treatment/the length of the glass substrate before the heat treatment}×10.'}, 'the rate of heat shrinkage is calculated from the amount of shrinkage of the glass substrate measured after a heat treatment which is performed at a rising and falling temperature rate of 10° C./min and at 550° C. for 2 hours by;'}2. A flat panel display glass substrate on which a p-Si TFT can be formed ...

OPTICAL GLASS

There is provided an optical glass with a high refractive index and a low dispersion having a refractive index (nd) of not less than 1.75 and an Abbe's number (νd) of not less than 35 where the image formation characteristic is hardly affected by changes in temperature of the using environment. SiO, BOand LaOare contained as essential components and the ratio of the constituting components are adjusted whereby an optical glass in which a product of α and β where α is an average linear expansion coefficient at −30 to +70° C. and β is an optical elasticity constant at the wavelength of 546.1 nm is not more than 130×10° C.×nm×cm×Pais able to be achieved. 1. An optical glass comprising , by mass on oxide basis:{'sub': '2', 'SiOmore than 1.0% and less than 12.0%,'}{'sub': 2', '3', '2', '2', '3, 'BO8.0 to 35.0%, the ratio of SiO/BObeing more than 0 and less than 0.6, and'}{'sub': 2', '3, 'LaO25.0 to 50.0%,'}{'sup': −12', '−1', '−1', '−1, 'wherein the product of α and β, where α is an average linear expansion coefficient within −30° C. to +70° C. and β is an optical elasticity constant at the wavelength of 546.1 nm, is not more than 130×10° C.×nm×cm×Pa.'}2. The optical glass according to claim 1 , wherein the glass has optical constants within the rages where the refractive index (nd) is 1.75 to 2.00 and the Abbe's number (νd) is 35 to 55.3. The optical glass according to claim 1 , wherein the glass further comprises 0.0 to 40.0% of GdO claim 1 , 0.0 to 15.0% of YO claim 1 , 0.0 to 15.0% of ZrO claim 1 , 0.0 to 25.0% of TaO claim 1 , 0.0 to 18.0% of NbOand 0.0 to 10.0% of WO.4. The optical glass according to claim 1 , wherein the glass further comprises{'sub': '2', '0.0 to 0.1% by mass of GeO,'}{'sub': 2', '3, '0.0 to 1.0% by mass of YbO,'}{'sub': 2', '3, '0.0 to 1.0% by mass of GaO, and'}{'sub': 2', '2, '0.0 to 1.0% by mass of BiO'}{'sub': 2', '2, 'and the optical glass does not contain a lead compound such as PbO and an arsenic compound such as AsO.'}5. The optical glass ...

GLASS COMPOSITION FOR PROTECTING SEMICONDUCTOR JUNCTION, METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE AND SEMICONDUCTOR DEVICE

Provided is a glass composition for protecting a semiconductor junction which contains at least SiO, AlO, ZnO, CaO and 3 mol % to 10 mol % of BO, and substantially contains none of Pb, P, As, Sb, Li, Na and K. It is preferable that a content of SiOfalls within a range of 32 mol % to 48 mol %, a content of AlOfalls within a range of 9 mol % to 13 mol %, a content of ZnO falls within a range of 18 mol % to 28 mol %, a content of CaO falls within a range of 15 mol % to 23 mol %, and a content of BOfalls within a range of 3 mol % to 10 mol %. 1. A glass composition for protecting a semiconductor junction , wherein the glass composition contains at least SiO , AlO , ZnO , CaO and 3 mol % to 10 mol % of BO , and substantially contains none of Pb , P , As , Sb , Li , Na and K.2. A glass composition for protecting a semiconductor junction according to claim 1 , wherein{'sub': '2', 'a content of SiOfalls within a range of 32 mol % to 48 mol %,'}{'sub': 2', '3, 'a content of AlOfalls within a range of 9 mol % to 13 mol %,'}a content of ZnO falls within a range of 18 mol % to 28 mol %,a content of CaO falls within a range of 15 mol % to 23 mol %, and{'sub': 2', '3, 'a content of BOfalls within a range of 3 mol % to 10 mol %.'}3. A method of manufacturing a semiconductor device comprising:a first step of preparing a semiconductor element having a pn junction exposure part where a pn junction is exposed; anda second step of forming a glass layer such that the glass layer covers the pn junction exposure part in this order, wherein{'sub': 2', '2', '3', '2', '3, 'in the second step, the glass layer is formed using a glass composition for protecting a semiconductor junction which contains at least SiO, AlO, ZnO, CaO and 3 mol % to 10 mol % of BO, and substantially contains none of Pb, P, As, Sb, Li, Na and K.'}4. A method of manufacturing a semiconductor device according to claim 3 , whereinthe first step includes: a step of preparing a semiconductor base body having a pn junction ...

OPTICAL GLASS, PREFORM FOR PRECISION PRESS-MOLDING, OPTICAL ELEMENT, METHODS FOR MANUFACTURING THEREOF, AND IMAGING DEVICE

An optical Glass characterized by comprising, denoted as molar percentages: BO—5 to 45 percent; SiO—0 to 6 percent (excluding 6 percent); LiO, NaO, KO in total—0 to 3 percent; ZnO—10 to 40 percent; LaO. 5 to 30 percent; GdO—1 to 20 percent; and ZrO, TaO, TiO, NbO, WO, and BiOin total—2.5 to 20 percent. The cation ratio of the Ti content relative to the total content of Zr, Ta, Ti, Nb, W, and Bi is 0.30 or lower; in that the temperature Tp at which a viscosity of 10dPa·s is exhibited is 706° C. or lower. The refractive index nd and the Abbé number v(nu)d satisfy all of the following relations (I) to (IV): 34.0≦vd<40 (I); nd≧1.87 (II); nd≧2.245−0.01×vd (III) and nd≦2.28−0.01×vd (IV). 1. An optical Glass characterized by comprising , denoted as molar percentages:{'sub': 2', '3, 'BO5 to 45 percent;'}{'sub': '2', 'LiO 0 to 3 percent;'}ZnO 10 to 40 percent;{'sub': 2', '3, 'LaO5 to 30 percent;'}{'sub': 2', '3, 'GdO0 to 20 percent; and'}{'sub': 2', '2', '5', '3', '2', '3, 'figref': {'@idref': 'DRAWINGS', 'FIG. 1'}, 'claim-text': {'br': None, 'i': Tg', '×X, '[° C.]≦655° C.−5\u2003\u2003(1).'}, 'at least one from among TiO, NbO, WO, and BiO; in that the total content X of Ti, Nb, W, and Bi, denoted as a cation percentage, is 3 to 35 percent; in that the Abbé number v(nu)d and refractive index nd fall within the range delimited by sequentially connecting with straight lines points A (40, 1.85), B (39, 1.91), C (33, 1.93), D (34, 1.87), and A (40, 1.85) in (where lines AB, BC, CD, and DA are included, and point A is excluded); and in that the glass transition temperature Tg satisfies relation (1) below2. The optical Glass according to claim 1 , wherein the glass further comprises{'sub': '2', 'ZrO0 to 10 molar percent; and'}{'sub': 2', '5, 'TaO0 to 20 molar percent.'}3. The optical Glass according to claim 1 , wherein the glass further comprises claim 1 , denoted as molar percentages:{'sub': 2', '2, 'NaO and KO in total equal to or more than 0 percent and less than 0.5 percent ...

Quartz glass body and a method and gel body for producing a quartz glass body

A method for producing a quartz glass body from a get body is provided, wherein the gel body generated from a colloidal suspension is at least formed and compressed into the quartz glass body Displacement bodies are added to the colloidal suspension prior to gelating into the gel body, and are completely removed from the gel body after gelating, wherein hollow spaces are generated at the positions of the removed displacement bodies, so that a translucent or opaque quartz glass body is generated. Further, a gel body for producing a quartz glass body is provided, wherein displacement bodies are introduced into the gel body that can be completely removed from the gel body, so that hollow spaces arise at the positions of the displacement bodies. A quartz glass body is also provided that includes vacuoles or hollow spaces filled with gas.

OPTICAL GLASS AND OPTICAL ELEMENT

Provided is an optical glass which can satisfy all of the following requirements: (1) it contains no environmentally undesirable components; (2) it can easily achieve a low glass transition point; (3) it has a high refractive index and high dispersion; (4) it can easily provide a glass having a superior visible light transmittance; and (5) it has superior resistance to devitrification during preparation of a preform. The optical glass has a refractive index nd of 2.0 or more, an Abbe's number vd of 20 or less, a glass transition point of 450° C. or below, and a glass composition, in % by mass, of 70 to 90% BiO, 4 to 29.9% BO, 0.1 to 10% LiO+NaO+KO, and 0 to 2.5% SiO+AlOand is substantially free of lead component, arsenic component, F component, TeO, and GeO. 1. An optical glass having a refractive index nd of 2.0 or more , an Abbe's number vd of 20 or less , a glass transition point of 450° C. or below , and a glass composition , in % by mass , of 70 to 90% BiO , 4 to 29.9% BO , 0.1 to 10% LiO+NaO+KO , and 0 to 2.5% SiO+AlOand being substantially free of lead component , arsenic component , F component , TeO , and GeO.2. The optical glass according to claim 1 , wherein BiO/BOis 8 or less in mass ratio.3. The optical glass according to claim 1 , wherein BO/(SiO+AlO) is 5.5 or more in % by mass.4. The optical glass according to claim 1 , wherein a content of BiO+BO+LiO+NaO+KO is 90% by mass or more.5. The optical glass according to claim 1 , containing 0 to 15% by mass TiO+WO+NbO.6. The optical glass according to claim 1 , wherein a content of BiO+BO+LiO+NaO+KO+TiO+WO+NbOis 95% by mass or more.7. The optical glass according to claim 1 , wherein a content of ZnO+BaO is 0 to 2.5% by mass.8. The optical glass according to claim 1 , wherein a content of ZnO+BaO+CaO+SrO+MgO is 0 to 2.5% by mass.9. The optical glass according to claim 1 , wherein a content of LaO+GdO+TaOis 0 to 10% by mass.10. The optical glass according to claim 1 , wherein a content of SbOis 0 to 1% by ...

Lead-Free Low Melting Point Glass Composition

Disclosed is a lead-free, low melting point glass composition, which is characterized by being substantially free from a lead component and comprising 0-8 mass % of SiO 2 , 2-12 mass % of B 2 O 3 , 2-7 mass % of ZnO, 0.5-3 mass % of RO (MgO+CaO+SrO+BaO), 0.5-5 mass % of CuO, 80-90 mass % of Bi 2 O 3 , 0.1-3 mass % of Fe 2 O 3 , and 0.1-3 mass % of Al 2 O 3 . This glass composition is not easily crystallized at high temperatures and is stable. Therefore, it is useful as an insulating coating material and a sealing material for electronic material substrates.

Silica glass having improved properties

The invention relates to a silica glass compound having improved physical and chemical properties. In one embodiment, the present invention relates to a silica glass having a desirable brittleness in combination with a desirable density while still yielding a glass composition having a desired hardness and desired strength relative to other glasses. In another embodiment, the present invention relates to a silica glass composition that contains at least about 85 mole percent silicon dioxide and up to about 15 mole percent of one or more dopants selected from F, B, N, Al, Ge, one or more alkali metals (e.g., Li, Na, K, etc.), one or more alkaline earth metals (e.g., Mg, Ca, Sr, Ba, etc.), one or more transition metals (e.g., Ti, Zn, Y, Zr, Hf, etc.), one or more lanthanides (e.g., Ce, etc.), or combinations of any two or more thereof.

ION EXCHANGEABLE GLASS WITH HIGH CRACK INITIATION THRESHOLD

Alkali aluminosilicate glasses that are resistant to damage due to sharp impact and capable of fast ion exchange are provided. The glasses comprise at least 4 mol % POand, when ion exchanged, have a Vickers indentation crack initiation load of at least about 7 kgf. 2. The alkali aluminosilicate glass of claim 1 , wherein the glass satisfies:{'br': None, 'sub': 2', '3', 'x, '[MO(mol%)/RO(mol%)]<1.4.'}3. The alkali aluminosilicate glass of claim 2 , wherein the glass satisfies:{'br': None, 'sub': 2', '3', 'x, '[MO(mol%)/RO(mol%)]<1.'}4. The alkali aluminosilicate glass of claim 1 , wherein the glass satisfies:{'br': None, 'sub': 2', '5', '2', '2', '3, '1.3<[(PO+RO)/MO]≦2.3.'}5. The alkali aluminosilicate glass of claim 4 , wherein the glass satisfies:{'br': None, 'sub': 2', '5', '2', '2', '3, '1.5<[(PO+RO)/MO]≦2.0.'}6. The alkali aluminosilicate glass of claim 1 , further comprising less than 1 mol % KO.7. The alkali aluminosilicate glass of claim 6 , wherein the alkali aluminosilicate glass comprises 0 mol % KO.8. The alkali aluminosilicate glass of claim 1 , further comprising less than 1 mol % BO.9. The alkali aluminosilicate glass of claim 8 , wherein the alkali aluminosilicate glass comprises 0 mol % BO.10. The alkali aluminosilicate glass of claim 1 , wherein the glass is ion exchanged to a depth of layer of at least about 10 μm.11. The alkali aluminosilicate glass of claim 10 , wherein the glass is ion exchanged to a depth of layer of at least about 30 μm.12. The alkali aluminosilicate glass of claim 10 , wherein the alkali aluminosilicate glass has a compressive layer extending from a surface of the glass to the depth of layer claim 10 , and wherein the compressive layer is under a compressive stress of at least about 300 MPa.13. The alkali aluminosilicate glass of claim 12 , wherein the compressive stress is at least about 500 MPa.14. The alkali aluminosilicate glass of claim 10 , wherein the ion exchanged alkali aluminosilicate glass has a Vickers ...

Manufacturing method of deco glass panel and glass panel using the same

A method of manufacturing a deco glass panel, and a deco glass panel using the same. The method includes a pattern forming step of applying an adhesive onto a mother substrate of a glass panel in a prescribed pattern; applying glass powder onto the surface of the mother substrate of the glass panel having the adhesive applied thereonto; hardening the adhesive applied onto the glass panel by heating the glass panel in a state where the glass powder has been applied; heating the glass panel at a temperature lower than a melting point of the glass powder; welding the glass panel at a temperature higher than a melting point of the glass powder but lower than a melting point of the mother substrate of the glass panel; cooling the glass panel; and attaching a prescribed rear surface pattern on a rear surface of the glass panel.

Glass composition for protecting semiconductor junction, method of manufacturing semiconductor device and semiconductor device

A glass composition for protecting a semiconductor junction contains at least SiO 2 , Al 2 O 3 , MO, and nickel oxide, and substantially contains none of Pb, P, As, Sb, Li, Na and K (M in MO indicates one of alkali earth metals).

IONICALLY CONDUCTIVE MATERIAL AND PROCESS FOR PRODUCING SAME

Provided is an ion-conducting material, comprising, as a composition in terms of mol o, 15 to 80% of PO, 0 to 70% of SiO, and 5 to 35% of RO, which represents the total content of LiO, NaO, KO, RbO, CsO, and AgO. 1. An ion-conducting material , comprising , as a composition in terms of mol % , 15 to 80% of PO , 0 to 70% of SiO , and 5 to 35% of RO , which represents a total content of LiO , NaO , KO , RbO , CsO , and AgO.2. The ion-conducting material according to claim 1 , wherein RO comprises at least two or more kinds of components among LiO claim 1 , NaO claim 1 , KO claim 1 , RbO claim 1 , CsO claim 1 , and AgO.3. The ion-conducting material according to claim 1 , wherein a content of POis 15 to 60% and a content of SiOis 10 to 60%.4. The ion-conducting material according to claim 1 , wherein the ion-conducting material has a molar ratio of (NaO+KO)/RO of 0.2 to 1.0.5. The ion-conducting material according to claim 1 , wherein the ion-conducting material has a molar ratio of NaO/RO of 0.2 to 0.8.6. The ion-conducting material according to claim 1 , wherein the ion-conducting material has a molar ratio of KO/RO of 0.2 to 0.8.7. The ion-conducting material according to claim 1 , further comprising 0.1 mol % or more of AlOin the composition.8. The ion-conducting material according to claim 1 , wherein the ion-conducting material has an ionic conductivity logσ (S/cm) at 500° C. of −5.5 or more and has a transport number of a proton at 500° C. of 0.7 or more.9. The ion-conducting material according to claim 1 , wherein the ion-conducting material has an areal resistance value (Ω.cm) at 500° C. of 30 or less.10. The ion-conducting material according to claim 1 , wherein the ion-conducting material is an amorphous material with a crystallinity of 50% or less.11. The ion-conducting material according to claim 1 , wherein the ion-conducting material has a thin-sheet shape and has a thickness of 1 to 500 μm.12. The ion-conducting material according to claim 1 , wherein ...

OPTICAL GLASS

Provided is an optical glass that has desired optical properties, superior resistance to devitrification, and superior mass productivity. An optical glass is made of a SiO—NbO—TiO-based glass having a refractive index (nd) of 1.75 to 1.95 and an Abbe's number (νd) of 15 to 35 and has an operation temperature range (ΔT=(temperature at 10poise)−(liquidus temperature)) of 20° C. or more. The optical glass preferably contains, in percent by mass, 15% to 45% SiO, 15% to 40% (but excluding 40%) NbOand % to 30% TiOas glass components. 1. An optical glass made of a SiO—NbO—TiO-based glass having a refractive index (nd) of 1.75 to 1.95 and an Abbe's number (νd) of 15 to 35 , the optical glass having an operation temperature range (ΔT=(temperature at 100.5 poise)−(liquidus temperature)) of 20° C. or more.2. The optical glass according to claim 1 , containing claim 1 , in percent by mass claim 1 , 15% to 45% SiO claim 1 , 15% to 40% (but excluding 40%) NbOand 1% to 30% TiOas glass components.3. The optical glass according to claim 2 , further containing claim 2 , in percent by mass claim 2 , 0% to 15% LiO and 0% to 20% NaO as glass components.4. The optical glass according to claim 2 , further containing claim 2 , in percent by mass claim 2 , 0% to 2% KO claim 2 , 0% to 20% (but excluding 20%) RO (where R represents Li claim 2 , Na or K) claim 2 , and 0% to 2% R′O (where R′ represents Mg claim 2 , Ca claim 2 , Sr or Ba) as glass components and being substantially free of PbO claim 2 , AsO claim 2 , CsO claim 2 , GeO claim 2 , and BiO.5. An optical glass containing claim 2 , in percent by mass claim 2 , 15% to 45% SiO claim 2 , 15% to 40% (but excluding 40%) NbO claim 2 , 1% to 30% TiO claim 2 , 0% to 15% LiO claim 2 , 0% to 20% NaO claim 2 , 0% to 2% KO claim 2 , 0% to 20% (but excluding 20%) RO (where R represents Li claim 2 , Na or K) claim 2 , and 0% to 2% R′O (where R′ represents Mg claim 2 , Ca claim 2 , Sr or Ba) as glass components and being substantially free of PbO ...

OPTICAL GLASS, PRESS-MOLDING GLASS MATERIAL, AND OPTICAL ELEMENT AND METHOD OF MANUFACTURING THE SAME

An optical glass, comprising, denoted as cation percentages: a content of Si and B (35 to 55); a combined content of La, Gd, and Y (30 to 55), wherein Gd is 5 to 20%; a content of Ti, Nb, Ta and W (7 to 20); Zr (2 to 8); and Zn (0 to 10); wherein a cation ratio of Zn to Gd is 0 to 0.80; a cation ratio of Gd to Ti, Nb, Ta, and W combined is 0.65 to 2.00; a cation ratio of Ta to Ti, Nb, Ta, and W combined is 0 to 0.30; a cation ratio of Ti to Ti, Nb, Ta, and W combined is 0.30 to 0.90; and a refractive index nd is 1.890 to 1.950, and an Abbé number νd of equal to or lower than 39.0, the Abbé number νd satisfying a relation of νd≧(2.334-nd)/0.012 relative to nd. 1. An optical glass , which is an oxide glass comprising , denoted as cation percentages:{'sup': 4+', '3+, 'a combined content of Si and B of 35 to 55 percent;'}{'sup': 3+', '3+', '3+', '3+, 'a combined content of La, Gd, and Y of 30 to 55, wherein a content of Gd ranging from 5 to 20 percent;'}{'sup': 4+', '5+', '5+', '6+, 'a combined content of Ti, Nb, Ta and W of 7 to 20 percent;'}{'sup': '4+', '2 to 8 percent of Zr; and'}{'sup': '2+', '0 to 10 percent of Zn;'}{'sup': 2+', '3+', '2+', '3+, 'wherein a cation ratio of a content of Zn to a content of Gd (Zn/Gd) ranges from 0 to 0.80;'}{'sup': 3+', '4+', '5+', '5+', '6+', '3+', '4+', '5+', '5+', '6+, 'a cation ratio of the content of Gd to the combined content of Ti, Nb, Ta, and W (Gd/(Ti+Nb+Ta+W)) ranges from 0.65 to 2.00;'}{'sup': 5+', '4+', '5+', '5+', '6+', '5+', '4+', '5+', '5+', '6+, 'a cation ratio of a content of Ta to the combined content of Ti, Nb, Ta, and W (Ta/(Ti+Nb+Ta+W)) ranges from 0 to 0.30;'}{'sup': 4+', '4+', '5+', '5+', '6+', '4+', '4+', '5+', '5+', '6+, 'claim-text': 'which has a refractive index ranging from 1.890 to 1.950, and an Abbé number νd of equal to or lower than 39.0, the Abbé number νd satisfying a relation of νd≧(2.334-nd)/0.012 relative to the refractive index nd.', 'a cation ratio of a content of Ti to the combined content of ...

Optical glass

An optical glass that is an oxide glass having a very high refractive index in spite of its low-dispersion property, having excellent glass stability and having less susceptibility to coloring.

Optical glass and optical element

The invention discloses an optical glass and an optical element. The optical glass comprises 0.1 wt %-8 wt % of SiO 2 , 20 wt %-32 wt % of B 2 O 3 , 20 wt %-35 wt % of La 2 O 3 , 15 wt %-30 wt % of Gd 2 O 3 , 1-6 wt % of Ta 2 O 5 , 1 wt %-15 wt % of ZnO, and 0.1 wt %-2 wt % of Li 2 O. The optical glass claimed in the invention has a refractive index of 1.75-1.8, an Abbe number of 45-52, a transformation temperature of less than 610° C., and a wavelength of less than 390 nm at 80% transmittance. Thus the claimed optical glass meets the requirements for a modern imaging device.

Arsenic and antimony free, titanium oxide containing borosilicate glass and methods for the production thereof

Titanium oxide containing borosilicate glasses, which have been produced without the use of arsenic and antimony compounds, are provided. An environmentally friendly refining method for providing titanium oxide containing borosilicate glass is also provided. The method includes using oxygen containing selenium compounds as refining agents to provide glasses with good transmittance values in the infrared range and show no disturbing discolorations. The glasses of the present disclosure are particularly suitable for the production of IR light conductors, cover glasses for photo sensors, and UV filters.

OPTICAL GLASS

An optical glass having high-refractivity and low-dispersion properties and containing, by mol %, 0.1 to 40% of SiO, 10 to 50% of BO, wherein the mass ratio of the content of SiOto the content of BO, SiO/BO, is 1 or less, 0.5 to 22% of ZnO, 5 to 50% of LaO, and optionally other ingredients. The optical glass has a refractive index nd of 1.86 to 1.95 and an Abbe's number vd of (2.36−nd)/0.014 or more but less than 38, and a glass transition temperature of equal to or greater than 640° C. 18.-. (canceled)9. An optical glass comprising , by mol % ,{'sub': '2', '0.1 to 40% of SiO,'}{'sub': 2', '3, '10 to 50% of BO,'}{'sub': 2', '2', '2, '0 to 10% of total of LiO, NaO and KO,'}0 to 10% of total of MgO, CaO, SrO and BaO,0.5 to 22% of ZnO,{'sub': 2', '3, '5 to 50% of LaO,'}{'sub': 2', '3, '0.1 to 25% of GdO,'}{'sub': 2', '3, '0.1 to 20% of YO,'}0 to 20% of Yb2O3,{'sub': '2', '0 to 25% of ZrO,'}{'sub': '2', '0 to 25% of TiO,'}{'sub': 2', '5, '0 to 20% of NbO,'}{'sub': 2', '5, '0 to 7% of TaO,'}{'sub': '3', 'over 0.1% but not more than 20% of WO,'}{'sub': '2', '0 to less than 3% of GeO,'}{'sub': 2', '3, '0 to 10% of BiO, and'}{'sub': 2', '3, '0 to 10% of AlO,'}{'sub': 2', '2', '3', '2', '2', '3, "the mass ratio of the content of SiOto the content of BO, SiO/BO, being 1 or less, the optical glass having a refractive index nd of 1.86 to 1.95, an Abbe's number vd of (2.36−nd)/0.014 or more but less than 38, and a glass transition temperature of equal to or greater than 640° C."}10. The optical glass of claim 9 , which has a refractive index nd of 1.89 to 1.95 claim 9 , an Abbe's number vd of (2.36−nd)/0.014 or more but less than 38.11. The optical glass of claim 9 , wherein the content of ZnO is 0.5 to 18 mol %.12. The optical glass of claim 9 , which is a Ge-free glass.13. The optical glass of claim 9 , wherein the content of SiOis 3 to 35 mol % claim 9 , and the content of BOis 12 to 45 mol %.14. The optical glass of claim 9 , wherein the mass ratio of the content of SiOto ...

HIGH-REFRACTIVE-INDEX GLASS

Provided is a high refractive index glass, comprising, as a glass composition in terms of mass %, 0.1 to 60% of SiO+AlO+BO, having a mass ratio (BaO+LaO+NbO+TiO+ZrO)/(SiO+AlO+BO) of 0.1 to 50, amass ratio (MgO+CaO+SrO+BaO)/(BaO+LaO+NbO+TiO+ZrO) of 0 to 10, and a mass ratio (TiO+ZrO)/(BaO+LaO+NbO) of 0.001 to 40, and having a refractive index nd of 1.55 to 2.3. 1. A high refractive index glass , comprising , as a glass composition in terms of mass % , 0.1 to 60% of SiO+AlO+BO , having a mass ratio (BaO+LaO+NbO+TiO+ZrO)/(SiO+AlO+BO) of 0.1 to 50 , a mass ratio (MgO+CaO+SrO+BaO)/(BaO+LaO+NbO+TiO+ZrO) of 0 to 10 , and a mass ratio (TiO+ZrO)/(BaO+LaO+NbO) of 0.001 to 40 , and having a refractive index nd of 1.55 to 2.3.2. The high refractive index glass according to claim 1 , wherein the high refractive index glass has a liquidus viscosity of 10dPa·s or more.3. The high refractive index glass according to claim 1 , wherein the high refractive index glass has a sheet shape.4. The high refractive index glass according to claim 3 , wherein the high refractive index glass is formed by one of an overflow down-draw method and a slot down-draw method.5. The high refractive index glass according to claim 3 , wherein the high refractive index glass comprises at least one unpolished surface claim 3 , the unpolished surface having a surface roughness Ra of 10 Å or less.611-. (canceled)12. A high refractive index glass claim 3 , comprising claim 3 , as a glass composition in terms of mass % claim 3 , 10 to 60% of SiO claim 3 , 0 to 5% of BO claim 3 , 0.1 to 60% of BaO claim 3 , 0.1 to 40% of LaO+NbO claim 3 , and 0 to 10% of LiO+NaO+KO claim 3 , having a value for a mass ratio (MgO+CaO)/(SrO+BaO) of 0 to 0.5 claim 3 , and having a strain point of 600° C. or more and a refractive index nd of 1.55 to 2.3.13. The high refractive index glass according to claim 12 , wherein the high refractive index glass has a liquidus viscosity of 10dPa·s or more.14. The high refractive index glass ...

Optical glass, preform for precision press molding and optical element using the same

The present invention relates to an optical glass containing, in terms of % by weight on the basis of oxides, B 2 O 3 : 8 to 15%, La 2 O 3 : 27 to 40%, SiO 2 : 1 to 10%, ZnO: 13 to 20%, WO 3 : 9 to 17%, Ta 2 O 5 : 7 to 15%, ZrO 2 : 1 to 6%, Y 2 O 3 : 2 to 8%, and Bi 2 O 3 : 0 to 5%, in which the optical glass contains substantially no Li 2 O and Gd 2 O 3 , and the optical glass has a refractive index n d of 1.86 to 1.90 and an Abbe number v d of 35 to 40.

Non-reducible low temperature sinterable dielectric ceramic composition for multi layer ceramic capacitor and manufacturing method thereof

The present invention relates to a dielectric ceramic composition for multilayer ceramic capacitor (MLCC), including a first component of 91 to 98 wt % and a second component of 2 to 9 wt %, wherein the first component includes a main component BaTiO 3 of 94 to 98 wt %, a first subcomponent of 0.5 to 2 wt % including a glass powder having a mesh structure, and a second subcomponent of 1 to 4 wt % including at least one of MgO, Cr 2 O 3 and Mn 3 O 4 , and the second component includes (Ba 1-y-x Ca y Sr x )(Zr y Ti 1-y )O 3 , and x satisfies 0.2≦x≦0.8 and y satisfies 0.03≦y≦0.15.

Silica container and method for producing the same

A silica container contains a substrate having a rotational symmetry, containing mainly a silica, and gaseous bubbles in a peripheral part of the substrate; a transparent silica glass in an inner peripheral part of the substrate; and an inner layer, formed on an inner surface of the substrate and containing a transparent silica glass; wherein the substrate contains Li, Na, and K in a total concentration of 50 or less ppm by weight; the substrate has a linear light transmittance of 91.8% to 93.2% at a light wavelength of 600 nm; the inner layer contains Li, Na, and K in a total concentration of 100 or less ppb by weight and at least one of Ca, Sr, and Ba in a total concentration of 50 to 2000 ppm by weight; and the inner layer has a linear light transmittance of 91.8% to 93.2% at a light wavelength of 600 nm.

BISMUTH BORATE GLASS ENCAPSULANT FOR LED PHOSPHORS

Embodiments are directed to glass frits containing phosphors that can be used in LED lighting devices and for methods associated therewith for making the phosphor containing glass frit and their use in glass articles, for example, LED devices. 1. An article comprising a glass layer , wherein the layer comprises a glass comprising BiOand at least 30 mol % BO; and at least one phosphor , wherein the layer is a fired mixture of a frit comprising the BiOand BOand the at least one phosphor.2. The article according to claim 1 , wherein the layer is Pb free.3. The article according to claim 1 , wherein the glass comprises in mole percent:{'sub': 2', '3, '10-30% BiO;'}{'sub': '2', '0-20% MO, wherein M is Li, Na, K, Cs, or combinations thereof;'}0-20% RO, wherein R is Mg, Ca, Sr, Ba, or combinations thereof;{'sub': '2', '15-50% ZnO, ZnF, or a combination thereof;'}{'sub': 2', '3, '0-5% AlO;'}{'sub': 2', '5, '0-5% PO; and'}{'sub': 2', '3, '30-55% BO.'}4. The article according to claim 3 , comprising in mole percent:{'sub': 2', '3, '10-30% BiO;'}{'sub': '2', 'greater than 0% NaO;'}{'sub': '2', '15-50% ZnO, ZnF, or a combination thereof;'}{'sub': 2', '3, '30-55% BO;'}{'sub': '2', '0-3% SiO;'}{'sub': '3', '0-1% WO;'}0-12% BaO, CaO, SrO, or combinations thereof.5. The article according to claim 4 , comprising at least 1% NaO.6. The article according to claim 4 , comprising 15-50% ZnO.7. The article according to claim 4 , comprising:{'sub': 2', '3, '12-20% BiO;'}{'sub': '2', '5-12% NaO;'}20-30% ZnO;{'sub': 2', '3, '38-52% BO;'}{'sub': '2', '0-3% SiO;'}{'sub': '3', '0-1% WO;'}1-12% BaO, CaO, SrO, or combinations thereof.8. The article according to claim 7 , comprising:{'sub': 2', '3, '14-16% BiO;'}{'sub': '2', '5-11% NaO;'}22-27% ZnO;{'sub': 2', '3, '40-51% BO;'}{'sub': '2', '0-3% SiO;'}{'sub': '3', '0-1% WO;'}1-11% BaO, CaO, SrO, or combinations thereof.9. The article according to claim 8 , wherein the glass has a refractive index of 1.81-1.83 at 473 nm and a glass transition ...

OPTICAL GLASS

An optical glass comprising, by mass %, 1. An optical glass comprising , by mass % ,{'sub': '2', '12 to 40% of SiO,'}{'sub': 2', '5, '15% or more but less than 42% of NbO,'}{'sub': '2', '2% or more but less than 18% of TiO,'}{'sub': 2', '5', '2, '(provided that NbO/TiOis over 0.6),'}{'sub': '2', '0.1 to 20% of LiO,'}{'sub': '2', '0.1 to 15% of NaO, and'}{'sub': '2', '0.1 to 25% of KO,'}the optical glass having an Abbe's number νd of 20 to 30, a ΔPg,F of 0.016 or less and a liquidus temperature of 1,200° C. or lower.2. An optical glass as recited in claim 1 , which contains claim 1 , as optional components claim 1 ,{'sub': 2', '3, '0 to 10% of BO,'}{'sub': '2', '0 to 20% of ZrO,'}{'sub': '3', '0 to 22% of WO,'}0 to 17% of CaO,0 to 13% of SrO,0 to 20% of BaO,(provided that the total content of CaO, SrO and BaO is 0 to 25%),0 to 13% of ZnO,{'sub': 2', '3, '0 to 3% of LaO,'}{'sub': 2', '3, '0 to 3% of GdO,'}{'sub': 2', '3, '0 to 3% of YO,'}{'sub': 2', '3, '0 to 3% of YbO,'}{'sub': 2', '5, '0 to 10% of TaO,'}{'sub': '2', '0 to 3% of GeO,'}{'sub': 2', '3, '0 to 10% of BiO, and'}{'sub': 2', '3, '0 to 10% of AlO,'}{'sub': 2', '5', '2', '2', '2', '2, 'the total content of NbOand TiObeing 35 to 65%, the total content of LiO, NaO and KO being 1 to 30%,'}the optical glass having a refractive index nd of 1.82 or more but less than 1.87.3. The optical glass as recited in claim 1 , which contains claim 1 , as optional components claim 1 ,{'sub': 2', '3, '0 to 10% of BO,'}{'sub': '2', '0 to 20% of ZrO,'}{'sub': '3', '0 to 20% of WO,'}0 to 13% of CaO,0 to 13% of SrO,0 to 20% of BaO,(provided that the total content of CaO, SrO and BaO is 0 to 25%),0 to 13% of ZnO,{'sub': 2', '3, '0 to 3% of LaO,'}{'sub': 2', '3, '0 to 3% of GdO,'}{'sub': 2', '3, '0 to 3% of YO,'}{'sub': 2', '3, '0 to 3% of YbO,'}{'sub': 2', '5, '0 to 10% of TaO,'}{'sub': '2', '0 to 3% of GeO,'}{'sub': 2', '3, '0 to 10% of BiO, and'}{'sub': 2', '3, '0 to 10% of AlO,'}{'sub': 2', '5', '2', '2', '2', '2', '2, 'the total ...

OPTICAL GLASS

A high-refractivity low-dispersion optical glass that can be stably supplied and has excellent glass stability and that has coloring reduced, composed of in mass %, 5 to 32% of total of SiOand BO, 45 to 65% of total of LaO, GdOand YO, 0.5 to 10% of ZnO, 1 to 20% of total of TiOand NbO, and optionally other components. The optical glass has a refractive index nd of 1.89 to 2.0, an Abbe's number νd of 32 to 38 and a coloring degree λ70 of 430 nm or less. 115-. (canceled)16. An optical glass comprising , denoted by mass % ,{'sub': '2', '5 to 12% of SiO'}{'sub': 2', '3, '9 to 15% of BO,'}{'sub': 2', '3, '32 to 55% of LaO,'}{'sub': 2', '3', '2', '3', '2', '3', '2', '3, '56.32 to 65% of total of LaO, GdOand YO(comprising equal to or greater than 0.1% of GdO),'}1 to 8% of ZnO,{'sub': 2', '2', '5', '2', '2', '5, '1 to 20% of total of TiOand NbO(comprising equal to or greater than 0.1% of each of TiOand NbO),'}{'sub': '2', '0.5 to 15% of ZrO,'}{'sub': 2', '5, '0 to 12% of TaO,'}{'sub': '2', '0 to 5% of GeO,'}{'sub': 2', '2', '3', '2', '2', '3', '2', '3', '2', '3', '2', '3', '2', '3', '2', '3', '2', '3', '2', '3', '2', '3', '2', '3', '2', '3, 'wherein the mass ratio of the content of SiOto the content of BO, (SiO/BO), is from 0.3 to 1.0, and the mass ratio of the total content of GdOand YOto the total content of LaO, GdOand YO, (GdO+YO)/(LaO+GdO+YO), is from 0.05 to 0.6,'}the optical glass having a refractive index nd of 1.90 to 2.0 and an Abbe's number νd of 32 to 38 and having a coloring degree λ70 of 430 nm or less.17. The optical glass according to claim 16 , which comprises none of LiO claim 16 , NaO claim 16 , and KO.18. The optical glass according to claim 16 , which comprises claim 16 , denoted by mass % claim 16 , 0.1 to 25% of GdO.1916. The optical glass according to claim 16 , which comprises claim 16 , denoted by mass % claim 16 ,{'sub': '2', '0.1 to 15% of TiO,'}{'sub': 2', '5, '0.1 to 15% of NbO.'}20The optical glass according to claim 16 , which has a ...

Electrochemical energy accumulator

A glass-based material is disclosed, which is suitable for the production of a separator for an electrochemical energy accumulator, in particular for a lithium ion accumulator, wherein the glass-based material comprises at least the following constituents (in wt.-% based on oxide): SiO 2 +F+P 2 O 5 20-95; Al 2 O 3 0.5-30, wherein the density is less than 3.7 g/cm 3 .

METHOD FOR PRODUCING SILICA GLASS BODY CONTAINING TITANIA, AND SILICA GLASS BODY CONTAINING TITANIA

The present invention relates to a method for producing a silica glass body containing titania, containing: a flame hydrolysis step of feeding a silica (SiO) precursor and a titania (TiO) precursor into an oxyhydrogen flame and causing a hydrolysis reaction in the flame to form silica glass fine particles containing titania, in which in the flame hydrolysis step, a reaction rate of the hydrolysis reaction of the silica precursor is 80% or more. 1. A method for producing a silica glass body containing titania , comprising:{'sub': 2', '2, 'a flame hydrolysis step of feeding a silica (SiO) precursor and a titania (TiO) precursor into an oxyhydrogen flame and causing a hydrolysis reaction in the flame to form silica glass fine particles containing titania; and'}a glass fine particle deposition step of depositing the silica glass fine particles containing titania formed in the flame hydrolysis step, whereinin the flame hydrolysis step, a reaction rate of the hydrolysis reaction of the silica precursor is 80% or more.2. The method for producing a silica glass body containing titania according to claim 1 , whereinthe glass fine particle deposition step is a step of depositing the silica glass fine particles containing titania formed in the flame hydrolysis step on a base material to form a porous glass body; andthe production method further comprises a step of heating the porous glass body to cause transparent vitrification.3. The method for producing a silica glass body containing titania according to claim 1 , whereinthe glass fine particle deposition step is a step of depositing the silica glass fine particles containing titania formed in the flame hydrolysis step in a fire-resistant vessel and simultaneously with the deposition, fusing them to form a silica glass body containing titania.4. The method for producing a silica glass body containing titania according to claim 1 , whereinin the flame hydrolysis step, a reaction calorie of oxyhydrogen to be fed into the ...

OPTICAL GLASS

A highly refractive and highly transparent optical glass is provided. The use of such a glass, optical elements and processes for producing the glass or the optical elements are also provided. 3. The optical glass according to according to claim 1 , comprising a sum of the proportions in % by weight of LaO+TaO+GdO+NbO+YO+TiOof at least 50% by weight.4. The optical glass according to according to claim 1 , comprising a ratio of proportions of the components (TiO+ZrO)/(NbO+GdO+YO) from 0.4 to 1.0.5. The optical glass according to according to claim 1 , wherein the glass is free of one or more components selected from the group consisting of WO claim 1 , GeO claim 1 , LiO claim 1 , NaO claim 1 , KO claim 1 , RbO claim 1 , CsO claim 1 , MgO claim 1 , CaO claim 1 , BaO claim 1 , SrO claim 1 , ZnO claim 1 , PbO claim 1 , F claim 1 , AsO claim 1 , BiO claim 1 , colour-imparting components claim 1 , optically active components claim 1 , and combinations thereof.6. The optical glass according to according to claim 1 , wherein the glass has a refractive index from 1.90 to 2.05 and an Abbe number from 28 to 39.7. The optical glass according to according to claim 1 , wherein the glass has claim 1 , at a specimen thickness of 10 mm claim 1 , an internal transmission at a wavelength of 410 nm of at least 75%. This application claims benefit under 35 U.S.C. §119(a) of German Patent Application No. 10 2012 209 531.4, filed Jun. 6, 2012, the entire contents of which are incorporated herein by reference.1. Field of the InventionThe present invention relates to a highly refractive and highly transparent optical glass, the use of such a glass, optical elements and processes for producing the glass or the optical elements.2. Description of Related ArtIn recent years, the market trend both in optical technologies and optoelectronic technologies (fields of application of imaging, projection, telecommunication, optical news technology, mobile drive and laser technology) is increasingly in ...

OPTICAL GLASS, GLASS MATERIAL FOR PRESS MOLDING, OPTICAL ELEMENT, AND METHOD OF MANUFACTURING SAME

A method of making a press-moldable glass, including melting starting materials, forming a melt, and annealing a formed glass, wherein the melt has a composition such that, (1) when rapidly cooled to room temperature, it becomes glass that has a scattering coefficient of less than 0.005 cm-1 at wavelengths of from 400 to 2,500 nm or comprises crystals with a volumetric ratio of less than 10-6, and (2) when maintained for three hours at a temperature 10° C. higher than the glass transition temperature, maintained for 10 min at a temperature yielding a viscosity of 104.5 to 103.5 dPa·s, and then rapidly cooled to room temperature, (3) the resulting glass has (a) a scattering coefficient of at least one wavelength from 400 to 2,500 nm of greater than 0.01 cm-1 or (b) crystals with a volumetric ratio of greater than 10-5. A temperature for annealing is lower than for glass transition. 1. An optical glass , which comprises essential components in the form of SiO , BaO , and TiO; and exhibits a refractive index (nd) greater than or equal to 1.80 and an Abbé number (vd) less than or equal to 30 , wherein the number density of the crystal particles precipitating out after being maintained for five hours at a temperature 20° C. higher than the glass transition temperature and then for five minutes at 900° C. is less than or equal to 12/mm.2. The optical glass according to claim 1 , which comprises claim 1 , expressed as weight percentages claim 1 , greater than or equal to 24 percent and less than 30 percent of SiO claim 1 , greater than or equal to 12 percent and less than 23 percent of BaO claim 1 , and 22 to 37 percent of TiO.3. The optical glass according to claim 1 , wherein the weight ratio SiO/TiOof SiOto TiOexceeds 0.86.4. The optical glass according to claim 1 , which comprises claim 1 , expressed as weight percentages claim 1 , 10.50 to 20 percent of NaO.5. The optical glass according to claim 1 , which comprises claim 1 , expressed as weight percentages claim 1 , ...

LEAD-FREE GLASS FOR SEMICONDUCTOR ENCAPSULATION AND ENCAPSULATOR FOR SEMICONDUCTOR ENCAPSULATION

The present invention provides a lead-free glass for semiconductor encapsulation, which can encapsulate semiconductor devices at a low temperature, has an excellent acid durability and hardly precipitates crystals when forming a glass tube, and an encapsulator for semiconductor encapsulation made of the glass. The glass comprises, as a glass composition, from 45 to 58% of SiO, from 0 to 6% of AlO, from 14.5 to 30% of BO, from 0 to 3% of MgO, from 0 to 3% of CaO, from 4.2 to 14.2% of ZnO, from 5 to 12% of LiO, from 0 to 15% of NaO, from 0 to 7% of KO, from 15 to 30% of LiO+NaO+KO, and from 0.1 to 8% of TiO, in terms of % by mol, wherein a ratio of ZnO to LiO is in the range from 0.84 to 2. 1. A lead-free glass for semiconductor encapsulation , which comprises , as a glass composition , from 45 to 58% of SiO , from 0 to 6% of AlO , from 14.5 to 30% of BO , from 0 to 3% of MgO , from 0 to 3% of CaO , from 4.2 to 14.2% of ZnO , from 5 to 12% of LiO , from 0 to 15% of NaO , from 0 to 7% of KO , from 15 to 30% of LiO+NaO+KO , and from 0.1 to 8% of TiO , in terms of % by mol , wherein a ratio of ZnO to LiO is in the range from 0.84 to 2.2. The lead-free glass for semiconductor encapsulation according to claim 1 , which comprises claim 1 , as a glass composition claim 1 , from 49 to 53.6% of SiO claim 1 , from 0.4 to 1.1% of AlO claim 1 , from 15.5 to 18.2% of BO claim 1 , from 0 to 0.5% of MgO claim 1 , from 0 to 0.5% of CaO claim 1 , from 7.4 to 9.9% of ZnO claim 1 , from 5 to 10% of LiO claim 1 , from 5 to 11% of NaO claim 1 , from 0.1 to 2.3% of KO claim 1 , from 19 to 25% of LiO+NaO+KO claim 1 , and from 1.1 to 4% of TiO claim 1 , wherein the ratio of ZnO to LiO is in the range from 0.85 to 1.5.3. The lead-free glass for semiconductor encapsulation according to claim 1 , which comprises less than 9% by mol of LiO.4. The lead-free glass for semiconductor encapsulation according to claim 1 , which comprises from 52.1 to 56.5% by mol of SiO+TiO.5. The lead-free glass for ...

Glass-ceramic substrates for semiconductor processing

Embodiments are directed to glass-ceramic substrates with a III-V semiconductor layer, for example, a GaN layer that can be used in LED lighting devices. The glass-ceramics material is in the anorthite-rutile (CaAl 2 Si 2 O 8 +TiO 2 ) family or in the cordierite-enstatite (SiO 2 —Al 2 O 3 —MgO—TiO 2 ) family.

OPTICAL GLASS, PREFORM FOR PRESS-MOLDING AND OPTICAL ELEMENT FORMED FROM PREFORM

The present invention relates to an optical glass including, in terms of mass % on the basis of oxides, BO: 10% to 20%, SiO: 0.5% to 12%, ZnO: 5% to 19%, TaO: 3% to 17%, LiO: 0.2% to 3%, ZrO: 0.6% to 4.9%, WO: 6.1% to 20%, LaO: 32.5% to 50%, and YO: 0.2% or more and less than 1.5%, in which a mass fraction (LaO/YO) of a content of LaOto a content of YOin terms of mass % is 40 or higher, and the optical glass has optical constants of a refractive index nof 1.83 to 1.88 and an Abbe's number υof 39 to 42. 1. An optical glass comprising , in terms of mass % on the basis of oxides ,{'sub': 2', '3, 'BO: 10% to 20%,'}{'sub': '2', 'SiO: 0.5% to 12%,'}ZnO: 5% to 19%,{'sub': 2', '5, 'TaO: 3% to 17%,'}{'sub': '2', 'LiO: 0.2% to 3%,'}{'sub': '2', 'ZrO: 0.6% to 4.9%,'}{'sub': '3', 'WO: 6.1% to 20%,'}{'sub': 2', '3, 'LaO: 32.5% to 50%, and'}{'sub': 2', '3, 'YO: 0.2% or more and less than 1.5%,'}{'sub': 2', '3', '2', '3', '2', '3', '2', '3', 'd', 'd, "wherein a mass fraction (LaO/YO) of a content of LaOto a content of YOin terms of mass % is 40 or higher, and the optical glass has optical constants of a refractive index nof 1.83 to 1.88 and an Abbe's number υof 39 to 42."}2. The optical glass according to claim 1 , having a liquidus temperature Tof 1 claim 1 ,100° C. or lower.3. The optical glass according to claim 1 , wherein a total content of TaOand LaOis greater than 45 mass %.4. The optical glass according to claim 1 , wherein a devitrification start time of a molten glass at 1000° C. measured by a hot-thermocouple method is 500 seconds or longer.5. A preform for press-molding comprising the optical glass according to .6. An optical element obtained by press-molding the preform according to . The present invention relates to an optical glass having a high refractive index and a low dispersion property, a preform for high-precision press-molding and an optical element using the same.In optical systems such as a digital camera, a glass-made optical lens, in particular, an ...

NIOBIUM DOPED SILICA TITANIA GLASS AND METHOD OF PREPARATION

This disclosure is directed to a silica-titania-niobia glass and to a method for making the glass. The composition of the silica-titania-niobia (SiO—TiO—NbO) glass, determined as the oxides, is NbOin an amount in the range of 0.005 wt. % to 1.2 wt. %, TiOin an amount in the range of 5 wt. % to 10 wt. %, and the remainder of glass is SiO. In the method, the STN glass precursor is consolidated into a glass by heating to a temperature of 1600° C. to 1700° C. in flowing helium for 6 hours to 10 hours. When this temperature is reached, the helium flow can be replaced by argon for the remainder of the time. Subsequently the glass is cooled to approximately 1050° C., and then from 1050° C. to 700° C. followed by turning off the furnace and cooling the glass to room temperature at the natural cooling rate of the furnace. 1. A silica-titania-niobia glass comprising , in wt. % measured as the oxides , niobia in an amount in the range of 0.005 wt. % to 1.2 wt. % , titania in an amount in the range of 5 wt. % to 10 wt. % , and the remainder of the glass is silica , SiO.2. The silica-titania-niobia glass according to claim 1 , wherein the titania content is in the range of 6 wt. % to 9 wt. %.3. The silica-titania-niobia glass according to claim 1 , wherein the silica-titania-niobia has a lower expansivity slope than that of a silica-titania glass having a substantially equivalent titania content.4. The silica-titania-niobia glass according to claim 1 , wherein the OH content of the glass is less than 200 ppm.5. The silica-titania-niobia glass according to claim 1 , wherein the OH content of the glass is less than 100 ppm.6. The silica-titania-niobia glass according to claim 1 , wherein the OH content of the glass is in the range of 10-70 ppm.7. A method for making a silica-titania-niobia glass having a composition comprising niobia in an amount in the range of 0.005 wt. % to 1.2 wt. % claim 1 , titania in an amount in the range of 5 wt. % to 10 wt. % claim 1 , and the remainder ...

High-purity silicon dioxide granules for quartz glass applications and method for producing said granules

It has been found that conventional cheap waterglass qualities in a strongly acidic medium react to give high-purity silica grades, the treatment of which with a base leads to products which can be processed further to give glass bodies with low silanol group contents.

BLACK SYNTHETIC QUARTZ GLASS WITH TRANSPARENT LAYER AND METHOD FOR PRODUCING THE SAME

Provided in a facile manner are a black synthetic quartz glass with a transparent layer, which meets demands for various shapes, has a black portion satisfying required light shield property and emissivity in an infrared region, keeps a purity equivalent to that of a synthetic quartz glass in terms of metal impurities, has a high-temperature viscosity characteristic comparable to that of a natural quartz glass, can be subjected to high-temperature processing such as welding, does not release carbon from its surface, and is free of bubbles and foreign matter in the transparent layer and the black quartz glass, and at an interface between the transparent layer and the black quartz glass, and a production method therefor. 1. A method for producing a black synthetic quartz glass with a transparent layer comprising a black quartz glass portion and a transparent layer quartz glass portion , the method comprising:a black quartz glass preparing step of preparing a black quartz glass portion by subjecting a silica porous glass body containing a hydroxy group to a gas-phase reaction in an atmosphere of a volatile organosilicon compound at a temperature of 100° C. or more and 1,200° C. or less, and after the reaction, firing the resultant at a temperature of 1,200° C. or more and 2,000° C. or less; anda transparent layer preparing step of coating the black quartz glass portion with a transparent layer material, followed by heating treatment,wherein:the transparent layer preparing step comprises coating the black quartz glass portion with silica slurry, performing heating treatment in an oxidizing atmosphere in a temperature region of 300° C. to 1,200° C., and keeping the resultant within a temperature range of 1,300° C. to 2,000° C. and a pressure range of 0.001 to 1.0 MPa to perform sintering; andthe silica slurry uses silica particles each having an average particle diameter of 0.1 μm to 100 μm and has a concentration of silica of 50 to 95% and a concentration of a cellulose ...

Scintillator panel and method for manufacturing scintillator panel

A scintillator panel including: a plate-like substrate; a grid-like barrier rib provided on the substrate; and a scintillator layer composed of a phosphor filled in cells divided by the barrier rib, wherein the barrier rib is formed of a material which is mainly composed of a low-melting-point glass containing 2 to 20% by mass of an alkali metal oxide. The scintillator panel is provided with a narrow barrier rib with high accuracy in a large area, and the scintillator panel has high luminous efficiency, and provides sharp images.

OPTICAL COMPONENT MADE OF QUARTZ GLASS FOR USE IN ArF EXCIMER LASER LITHOGRAPHY AND METHOD FOR PRODUCING THE COMPONENT

An optical component made of synthetic quartz glass includes a glass structure substantially free of oxygen defect sites and having a hydrogen content of 0.1×10to 1.0×10molecules/cm, an SiH group content of less than 2×10molecules/cm, a hydroxyl group content of 0.1 to 100 wt. ppm, and an Active temperature of less than 1070° C. The optical component undergoes a laser-induced change in the refractive index in response to irradiation by a radiation with a wavelength of 193 nm using 5×10pulses with a pulse width of 125 ns and a respective energy density of 500 μJ/cmat a pulse repetition frequency of 2000 Hz. The change totals a first measured value Mwhen measured using the applied wavelength of 193 nm and a second measured value Mwhen measured using a measured wavelength of 633 nm. The ratio M/Mis less than 1.7. 111-. (canceled)12. An optical component made of synthetic quartz glass for use in ArF excimer laser lithography with an applied wavelength of 193 nm , the optical component comprising:{'sup': 16', '3', '18', '3', '17', '3, 'a glass structure which is substantially free of oxygen defect sites, the glass structure having a hydrogen content in the range of 0.1×10molecules/cmto 1.0×10molecules/cm, a content of SiH groups of less than 2×10molecules/cm, a content of hydroxyl groups in the range between 0.1 and 100 wt. ppm, and a fictive temperature of less than 1070° C.,'}{'sub': '193nm', 'sup': '633nm', 'wherein the glass structure reacts to irradiation with radiation of an applied wavelength of 193 nm with 5×109 pulses with a pulse width of 125 ns and an energy density of 500 μJ/cm2 each time and a pulse repetition frequency of 2000 Hz with a laser-induced refractive-index change, the amount of which upon measurement with the applied wavelength of 193 nm yields a first measured value Mand upon measurement with a measurement wavelength of 633 nm yields a second measured value M, and'}{'sub': 193nm', '633nm, 'wherein M/M<1.7.'}13. The optical component according to ...

GLASS COMPOSITION FOR PROTECTING SEMICONDUCTOR JUNCTION, METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE AND SEMICONDUCTOR DEVICE

A glass composition for protecting a semiconductor junction is made of fine glass particles prepared from a material in a molten state obtained by melting a glass raw material which contains at least ZnO, SiO, BO, AlOand at least two oxides of alkaline earth metals selected from a group consisting of BaO, CaO and MgO and substantially contains none of Pb, As, Sb, Li, Na and K, the glass composition for protecting a semiconductor junction containing no filler. 1. A glass composition for protecting a semiconductor junction used in forming a glass layer which protects a pn junction in a semiconductor element having a pn junction exposure portion where the pn junction is exposed , wherein{'sub': 2', '2', '3', '2', '3, 'the glass composition for protecting a semiconductor junction is made of fine glass particles prepared from a material in a molten state obtained by melting a glass raw material which contains at least ZnO, SiO, BO, AlOand at least two oxides of alkaline earth metals selected from a group consisting of BaO, CaO and MgO with the following contents and substantially contains none of Pb, As, Sb, Li, Na and K, the glass composition for protecting a semiconductor junction containing no filler.'}ZnO: 30 mol % to 60 mol %{'sub': '2', 'SiO: 5 mol % to 45 mol %'}{'sub': 2', '3, 'BO: 5 mol % to 30 mol %'}{'sub': 2', '3, 'AlO: 5 mol % to 13 mol %'}oxide of alkaline earth metal: 1 mol % to 10 mol %2. The glass composition for protecting a semiconductor junction according to claim 1 , wherein the glass raw material substantially contains no Bi.3. The glass composition for protecting a semiconductor junction according to claim 2 , wherein the glass raw material substantially contains no P.4. The glass composition for protecting a semiconductor junction according to claim 1 , wherein the glass raw material further contains nickel oxide.5. The glass composition for protecting a semiconductor junction according to claim 1 , wherein the glass raw material further contains ...

GLASS MATERIAL AND METHOD FOR MANUFACTURING SAME

Provided is a glass composition that exhibits greater Faraday effect than ever before. A glass composition contains 48% or more of TbO(exclusive of 48%) in % by mole. 1. A glass material containing 50% or more of TbOand 40% or less of AlOin % by mole.2. The glass material according to claim 1 , having a TbOcontent of not more than 80% by mole.3. The glass material according to claim 1 , further containing claim 1 , in % by mole claim 1 , 0 to 50% SiO claim 1 , 0 to 50% BO claim 1 , and 0 to 50% PO.4. The glass material according to claim 1 , being used as a magneto-optical element.5. The glass material according to claim 4 , being used as a Faraday rotator. The present invention relates to a glass material suitable for a magneto-optical element making up part of a magnetic device, such as an optical isolator, an optical circulator or a magnetic sensor, and a method for manufacturing the same.A glass material containing terbium oxide which is a paramagnetic compound is known to exhibit the Faraday effect which is one of magneto-optical effects. The Faraday effect is an effect of rotating the polarization plane of linearly polarized light passing through a material placed in a magnetic field. This effect is utilized in optical isolators, magnetic field sensors, and so on.The optical rotation θ (angle of rotation of the polarization plane) due to the Faraday effect is expressed by the following formula where the intensity of a magnetic field is represented by H and the length of a substance through which polarized light passes is represented by L. In the formula, V represents a constant dependent on the type of the substance and is referred to as a Verdet constant. The Verdet constant takes positive values for diamagnetic substances and negative values for paramagnetic substances. The larger the absolute value of the Verdet constant, the larger the absolute value of the optical rotation, resulting in exhibition of greater Faraday effect.θ=VHLConventionally known glass ...

LOW LOSS OPTICAL FIBERS WITH FLUORINE AND CHLORINE CODOPED CORE REGIONS

A co-doped optical fiber is provided having an attenuation of less than about 0.17 dB/km at a wavelength of 1550 nm. The fiber includes a core region in the fiber having a graded refractive index profile with an alpha of greater than 5. The fiber also includes a first cladding region in the fiber that surrounds the core region. Further, the core region has a relative refractive index of about −0.10% to about +0.05% compared to pure silica. In addition, the core region includes silica that is co-doped with chlorine at about 1.2% or greater by weight and fluorine between about 0.1% and about 1% by weight. 1. An optical fiber , comprising:a fiber having an attenuation of less than about 0.17 dB/km at a wavelength of 1550 nm, the fiber comprising:a core region in the fiber having a graded refractive index profile with an alpha of greater than 0.5; anda first cladding region in the fiber that surrounds the core region,wherein the core region comprises silica co-doped with chlorine at about 1.2% or greater by weight and fluorine between about 0.1% and about 1% by weight.2. The fiber according to claim 1 , wherein the core region has a relative refractive index claim 1 , Δ claim 1 , of about −0.20% to about +0.1% compared to pure silica.3. The fiber according to claim 1 , wherein the first cladding region comprises (a) an inner cladding region that surrounds the core region and has a relative refractive index claim 1 , Δ claim 1 , and (b) a depressed cladding region that surrounds the inner cladding region and has a relative refractive index claim 1 , Δ; the core region has a relative refractive index claim 1 , Δ; and Δ≧Δ>Δ.4. The fiber according to claim 3 , wherein the first cladding region further comprises an outer cladding region having a relative refractive index claim 3 , Δ claim 3 , and further wherein Δ>Δ.5. The fiber according to claim 1 , wherein the core region comprises silica co-doped with chlorine and fluorine claim 1 , the chlorine at about 2.5% or greater ...

GLASS COMPOSITION AND COOKING APPLIANCE

A glass composition includes a glass frit and an electrostatic force reinforcing material including polymethylhydrosiloxane derivatives. The electrostatic force reinforcing material is represented by the following Formula. 2. The glass composition of claim 1 , wherein X is within a range of 50≤X≤120 claim 1 , and Y is within a range of 10≤Y≤50.3. The glass composition of claim 1 , wherein X+Y is within a range of 100≤X+Y≤200.4. The glass composition of claim 1 , further comprising: an additive reacting with the glass frit and the polymethylhydrosiloxane derivatives.5. The glass composition of claim 4 , wherein the additive comprises amino silane.6. The glass composition of claim 5 , wherein the amino silane is included in an amount of 0.05 wt % to 0.1 wt % in the glass composition.7. The glass composition of claim 1 , whereinthe glass frit is included in an amount of 99.6 wt % to 99.85 wt % in the glass composition, andthe electrostatic force reinforcing material is included in an amount of 0.1 wt % to 0.3 wt % in the glass composition.8. The glass composition of claim 1 , wherein the glass frit comprises PO claim 1 , SiO claim 1 , Group I oxide claim 1 , AlO claim 1 , BO claim 1 , or ZrO.10. The glass powder of claim 9 , wherein X is within a range of 50≤X≤120 claim 9 , and Y is within a range of 10≤Y≤50.11. The glass powder of claim 9 , wherein X+Y is within a range of 100≤X+Y≤200.12. The glass powder of claim 9 , further comprising: amino silane reacting with the glass frit powder and the polymethylhydrosiloxane derivatives.13. The glass powder of claim 12 , wherein the amino silane is included in an amount of 0.05 wt % to 0.1 wt % in the glass powder.14. The glass powder of claim 9 , whereinthe glass frit powder is included in an amount of 99.6 wt % to 99.85 wt % in the glass powder, andthe electrostatic force reinforcing material is included in an amount of 0.1 wt % to 0.3 wt % in the glass powder.15. The glass powder of claim 9 , wherein the glass frit powder ...

PURIFICATION OF QUARTZ POWDERS BY REMOVAL OF MICROPARTICLES OF REFRACTORY MATERIALS

Described is a process for the refinement of a quartz powder, comprising the step of separating microparticles of refractory minerals, in particular minerals containing rare earth metal compounds, from the quartz powder by an elutriation step. 1. A process for the refinement of a quartz powder , comprising separating microparticles of refractory minerals out of the quartz powder by an elutriation step , wherein the microparticles of refractory minerals comprise minerals containing rare earth metals and/or thorium and/or uranium; andcarrying out the elutriation step in a fluidised bed reactor, in which a controlled upward flow of a liquid elutriation phase is provided, by which the microparticles of refractory minerals are carried upwards in the fluidised bed reactor;whereas the quartz powder remains in the lower region of the fluidised bed reactor.2. The process according to claim 1 , wherein the microparticles of refractory minerals carried upwards in the fluidised bed are either discharged out of the fluidised bed reactor or are separated from the liquid elutriation phase.3. The process according to claim 2 , wherein the liquid elutriation phase is recycled into the elutriation step and the microparticles of refractory minerals contained therein are separated from the elutriation phase by filtration.4. The process according to claim 3 , wherien the microparticles of refractory minerals are separated from the elutriation phase by filtration using a filter with a filter having a pore size of 0.7 μm or less.5. The process according to claim 4 , wherein the filter is an acid-resistant filter.6. The process according to claim 1 , wherein the separation of the microparticles of refractory minerals from the quartz powder is facilitated by means of ultrasonic agitation before or during elutriation.7. The process according to claim 1 , wherein the elutriation step is carried out before or after a calcination and/or hot chlorination step.8. The process according to claim 1 ...

Fluorescent Glass For Light Emitting Diode And Manufacturing Method Thereof

The present disclosure is related to a fluorescent glass for a light emitting diode and a manufacturing method thereof. The fluorescent glass for the light emitting diode includes a glass powder and a fluorescent powder, wherein the glass powder and the fluorescent powder are mixed to form a fluorescent glass, the material for manufacturing the glass powder comprises silicon dioxide with 20 wt % to 37 wt %, diboron trioxide with 31 wt %-47 wt % and calcium oxide with 16 wt %˜35 wt %, and the material of the fluorescent powder is selected from one of Ce-YAG, LuAG, silicate, and nitrides/oxynitrides fluorescent powder. The fluorescent glass of the present disclosure is formed by mixing and sintering the glass powder and the fluorescent powder and has low sintering temperature, so as to avoid the deterioration of color of the fluorescent powder due to high temperature. Therefore, the fluorescent glass of the present disclosure has good transparency, and the light emitting diode applying this fluorescent glass has good lighting efficiency. 1. A fluorescent glass for a light emitting diode , comprising a glass powder and a fluorescent powder , wherein the glass powder and the fluorescent powder are mixed to form a fluorescent glass , the material for manufacturing the glass powder comprises silicon dioxide with 20 wt % to 37 wt % , diboron trioxide with 31 wt %˜47 wt % and calcium oxide with 16 wt %˜35 wt % , and the material of the fluorescent powder is selected from one of Ce-YAG , LuAG , silicate , and nitrides/oxynitrides fluorescent powder.2. The fluorescent glass for the light emitting diode as claimed in claim 1 , wherein the material for manufacturing the glass powder further comprises magnesium oxide or zinc oxide claim 1 , the weight percent of magnesium oxide or zinc oxide is between 0 wt % and 17 wt %.3. The fluorescent glass for the light emitting diode as claimed in claim 2 , wherein the material for manufacturing the glass powder further comprises aluminum ...

Fluorinated Tin-Based Glass Frit And Method For Manufacturing Same

Provided is a super low melting SnO—SnF2—P2O5-based glass frit for which the firing temperature can be set to 200° C. or less and which has high water resistance and transparency. The fluorinated tin-based glass frit includes, in mol %, 30 to 70% of SnF2, 10 to 30% of P2O5, 10 to 40% of SnO, 0.1 to 10% of SnO2, 0 to 5% of In2O3, 0 to 5% of B2O3, and 0 to 5% of SiO2, and has a glass transition point of 160° C. or lower, a softening point of 180° C. or lower, and a maximum particle size of 100 μm or less. The fluorinated tin-based glass frit has a visible light transmission rate of 80% or more at 200° C. and a thickness of 0.6 mm of a fired product thereof, and a rate of volume reduction of the fired product due to soaking in hot water at 85° C. for 24 hours is 2 vol. % or less. 1. A fluorinated tin-based glass frit including , in mol % , 30 to 70% of SnF2 , 10 to 30% of P2O5 , 10 to 40% of SnO , 0.1 to 10% of SnO2 , 0 to 5% of In2O3 , 0 to 5% of B2O3 , and 0 to 5% of SiO2 , and having a glass transition point of 160° C. or lower , a softening point of 180° C. or lower , and a maximum particle size of 100 μm or less , and with which a visible light transmission rate of a fired product obtained at 200° C. is 80% or more at a thickness of 0.6 mm and a rate of volume reduction of the fired product due to soaking in hot water at 85° C. for 24 hours is 2 vol. % or less.2. The fluorinated tin-based glass frit according to claim 1 , including claim 1 , in mol % claim 1 , 40 to 65% of SnF2 claim 1 , 15 to 30% of P2O5 claim 1 , 15 to 40% of SnO claim 1 , 0.1 to 2% of SnO2 claim 1 , 0 to 5% of In2O3 claim 1 , 0 to 5% of B2O3 claim 1 , and 0 to 5% of SiO2.3. A method for manufacturing a fluorinated tin-based glass frit comprising the steps of mixing a glass raw material powder claim 1 , which includes claim 1 , in mol % claim 1 , 30 to 70% of SnF2 claim 1 , 10 to 30% of P2O5 claim 1 , 10 to 40% of SnO claim 1 , 0.1 to 10% of SnO2 claim 1 , 0 to 5% of In2O3 claim 1 , 0 to 5% of ...

Highly stable and chemically temperable glasses

Glasses and glass products which combine the chemical temperability with very good alkali and acid resistance, hydrolytic resistance, as well as a desired coefficient of thermal expansion are provided. The glass has a composition characterized by the following constituent phases: a composition characterized by the following constituent phases: 20-60 mol % albite; 0-40 mol % silicon dioxide; 0-20 mol % orthoclase; 0-10 mol % wollastonite; 0-20 mol % enstatite; 0-20 mol % parakeldyshite; 0-20 mol % narsarsukite; 0-40 mol % disodium zinc silicate; 0-20 mol % cordierite; 0-10 mol % strontium silicate; and 0-10 mol % barium silicate.

GLASSES WITH IMPROVED ION EXCHANGEABILITY

The present invention relates to glasses, such as e.g. thin or thinnest glasses, but also to glasses for the production of tubular glass, carpules and syringes as well as other pharmaceutical vessels. The glasses are characterized by a high chemical prestressability (tem-perability) with very well alkali, hydrolytic and/or acid resistance as well as an advantageous coefficient of thermal expansion. The glass has a composition characterized by the following constituent phases: 0-60 mol % reedmergnerite; 20-60 mol % albite; 0-30 mol % orthoclase; 0-20 mol % natrosilite; 0-20 mol % sodium metasilicate; 0-20 mol % parakeldyshite; 0-20 mol % narsarsukite; 0-20 mol % disodium zinc silicate; 0-21 mol % cordierite; and 0-20 mol % danburite. A quotient of a coefficient of thermal expansion of the glass multiplied by 1000 (in ppm/K) and the product of a pH value and a removal rate in alkaline environment (in mg/(dm3h)) according to ISO 695 is at least 9.0. 1. A glass , comprising:a composition characterized by the following constituent phases:0-60 mol % reedmergnerite;20-60 mol % albite;0-30 mol % orthoclase;0-20 mol % natrosilite;0-20 mol % sodium metasilicate;0-20 mol % parakeldyshite;0-20 mol % narsarsukite;0-20 mol % disodium zinc silicate;0-21 mol % cordierite; and{'sup': '2', '0-20 mol % danburite, wherein a quotient of a coefficient of thermal expansion of the glass multiplied by 1000 (in ppm/K) and the product of a pH value and a removal rate in alkaline environment (in mg/(dm3 h)) according to ISO 695 is at least 9.0.'}2. The glass of claim 1 , wherein a proportion of disodium zinc silicate is at most 19 mol %.3. The glass of claim 1 , wherein a proportion of cordierite is at least one of at most 20 mol % or at least 3 mol %.4. The glass of claim 1 , wherein a proportion of albite is at least one of at least 30 mol % or at most 55 mol %.5. The glass of claim 1 , wherein a proportion of orthoclase is at least one of at least 5 mol % or at most 25 mol %.6. The glass of ...

METHOD OF PREPARING SOLID ELECTROLYTE COMPOSITION FOR LITHIUM SECONDARY BATTERY

Disclosed is a method of preparing a solid electrolyte composition for a lithium secondary battery which includes: (a) mixing materials including LiO, SiO, TiO, PO, BaO, CsO and VO; (b) melting the mixed materials; (c) rapidly cooling the molten materials at room temperature and compressing the molten materials using a preheated plate to form electrolyte glass having a predetermined thickness; (d) heating the electrolyte glass to eliminate stress at a predetermined temperature range; (e) heating the electrolyte glass to a higher temperature range higher than in the step of heating the electrolyte glass to eliminate stress to be crystallized; and (f) precisely adjusting a thickness of the electrolyte glass by lapping the electrolyte glass. 1. A method of preparing a solid electrolyte composition for a lithium secondary battery , comprising:{'sub': 2', '2', '2', '2', '5', '2', '2', '5, '(a) mixing materials including LiO, SiO, TiO, PO, BaO, CsO and VO;'}(b) melting the mixed materials;(c) rapidly cooling the molten materials at room temperature and compressing the molten materials using a preheated plate to form electrolyte glass;(d) heating the electrolyte glass to eliminate stress at 500 to 600° C.;(e) heating the electrolyte glass to a temperature range higher than in the step of heating the electrolyte glass to eliminate stress to be crystallized; and(f) precisely adjusting a thickness of the electrolyte glass by lapping the electrolyte glass.2. The method of claim 1 , wherein 5 to 8 wt % of LiO claim 1 , 2 to 5 wt % of SiO claim 1 , 30 to 35 wt % of TiO claim 1 , 56 to 60 wt % of PO claim 1 , 0.1 to 2 wt % of BaO claim 1 , 0.1 to 2 wt % of CsO and 0.5 to 2 wt % of VOare mixed in the step (a).3. The method of claim 1 , wherein the mixed materials are introduced into a platinum crucible and are heated at a rate of 10° C./min to become molten in an air atmosphere at a temperature of 1300 to 1450° C. in the step (b).4. The method of claim 1 , wherein the molten ...

SUBSTRATE FOR DEVICE HAVING AN ORGANIC LIGHT-EMITTING DIODE

A diffusing substrate for a device having an organic light-emitting diode including a sheet of glass coated on one of the surfaces thereof with a layer including a vitreous material, such that the vitreous material has a chemical composition including the following components, which vary within the weight limits defined below: 2. The scattering substrate as claimed in claim 1 , wherein the weight content of BiOis included in a range of from 65% to 80%.3. The scattering substrate as claimed in claim 1 , wherein the weight content of ZnO is at most 8%.4. The scattering substrate as claimed in claim 1 , wherein the weight content of SiOis included in a range of from 7% to 12%.5. The scattering substrate as claimed in claim 1 , wherein the sum of the weight contents of MgO and ZnO is included in a range of from 2% to 9%.6. The scattering substrate as claimed in claim 1 , wherein the sum of the weight contents of CaO and MgO is included in a range of from 0.5% to 4%.7. The scattering substrate as claimed in claim 1 , wherein the chemical composition of the vitreous material comprises the oxides TiOand/or SnO.8. The scattering substrate as claimed in claim 7 , wherein the TiOcontent is at least 0.5% or 1% and at most 5%.9. The scattering substrate as claimed in claim 7 , wherein the SnOcontent is at least 0.2% or 0.5% and at most 5%.10. The scattering substrate as claimed in claim 1 , wherein the layer comprising a vitreous material also comprises scattering elements chosen from particles and cavities.11. The substrate as claimed in claim 10 , wherein the particles are chosen from aluminum particles claim 10 , zirconia particles claim 10 , silica particles claim 10 , titanium dioxide particles claim 10 , calcium carbonate particles and barium sulfate particles.12. The substrate as claimed in claim 1 , wherein the layer comprising a vitreous material consists of said vitreous material claim 1 , and wherein the sheet of glass scatters light or that a scattering layer is ...

Superomniphobic Bulk Optical Glass

A method for preparing an optically transparent, superomniphobic glass composition is described. In one aspect, the present disclosure provides a method for preparing a glass composition, including heating a borosilicate glass comprising 45-85 wt. % silicon oxide and 10-40 wt. % boron oxide to form a phase-separated glass comprising an interpenetrating network of silicon oxide domains and boron oxide domains. The method includes removing at least a portion of the boron oxide domains from the phase-separated glass and depositing a hydrophobic silane to provide a porous glass having a hydrophobic silane layer disposed on a portion of the surface thereof, a total pore volume of 15-50 vol. %, and an average pore diameter of 20-300 nm. The method includes, within at least a portion of the volume of the porous glass, forming an aerogel precursor, and converting at least a portion of the aerogel precursor to an aerogel. 1. A method for preparing a glass composition , comprisingheating a borosilicate glass comprising 45-85 wt. % silicon oxide and 10-40 wt. % boron oxide to form a phase-separated glass comprising an interpenetrating network of silicon oxide domains and boron oxide domains; a hydrophobic silane layer disposed on a portion of the surface thereof;', 'a total pore volume of 15-50 vol. %; and', 'an average pore diameter of 20-300 nm;, 'removing at least a portion of the boron oxide domains from the phase-separated glass and depositing a hydrophobic silane to provide a porous glass having'}within at least a portion of the pore volume of the porous glass, forming an aerogel precursor; andconverting at least a portion of the aerogel precursor to an aerogel.2. The method of claim 1 , whereinremoving the phase-separated boron oxide domains comprises selectively leaching or etching in an aqueous solution for a period of time sufficient to remove at least 80 wt. % of the boron oxide domains of the phase-separated glass; anddepositing the hydrophobic silane comprises ...

SEALING GLASS COMPOSITION AND SOLID OXIDE FUEL CELL USING SAME

The present invention relates to: a glass composition that can be used as sealing material; and a solid oxide fuel cell using same. A sealing glass composition according to the present invention includes 10-35 wt % of SiO, 3-35 wt % of BO, 30-65 wt % of BaO, 0.1-15 wt % of CaO, 0.1-3 wt % of NiO, and 0.1-3 wt % of CuO. Unlike conventional glass compositions as sealing material, the present sealing glass composition is suitable for use in solid oxide fuel cells that operate at medium-low temperatures, and in particular, has the excellent effect of minimizing sealing adhesion strength degradation even after long-term use. 1. A sealing glass composition , comprising:{'sub': '2', '10 to 35% by weight of SiO,'}{'sub': 2', '3, '3 to 35% by weight of BO,'}30 to 65% by weight of BaO,0.1 to 15% by weight of CaO,0.1 to 3% by weight of NiO, and0.1 to 3% by weight of CuO.2. The sealing glass composition of claim 1 , wherein a content of the SiOis equal to or less than ½ of a content of the BaO.3. The sealing glass composition of claim 1 , wherein a content of the CaO is less than a content of the BO.4. The sealing glass composition of claim 1 , further comprising at least one of AlO claim 1 , ZrO claim 1 , LaO claim 1 , SrO claim 1 , or MgO.5. The sealing glass composition of claim 4 , wherein the at least one of AlO claim 4 , ZrO claim 4 , LaO claim 4 , SrO claim 4 , or MgO is in a range of 0.1 to 20% by weight.6. The sealing glass composition of claim 1 , further comprising at least one of ZnO or LiO.7. The sealing glass composition of claim 6 , wherein the at least one of ZnO or LiOis in a range of 0.1 to 10% by weight.8. The sealing glass composition of claim 1 , wherein a hemisphere temperature is equal to or less than 800° C.9. A solid oxide fuel cell claim 1 , comprising a sealing material formed of the sealing glass composition according to .10. (canceled)11. A solid oxide fuel cell claim 2 , comprising a sealing material formed of the sealing glass composition ...

HIGHLY REFRACTIVE GLASS

A glass includes the following components in % by weight: 2-10 wt-% SiO, 2-10 wt-% BO, 40-55 wt-% LaO, 4-11 wt-% GdO, 6-14 wt-% NbO, 8-18.5 wt-% TiO, and 5-11 wt-% ZrO. The glass has a refractive index nof at least 2.02, a sum of the portions of LaO, NbO, TiOand ZrOis at least 76.5% by weight, and a weight ratio of a sum of the portions of LaO, NbOand ZrOto the portion of TiOis at least 3.85:1. 2. The glass of claim 1 , wherein at least one of the following is satisfied:{'sub': 2', '3, 'a portion of YOis 0 to 5% by weight;'}a portion of BaO is 0 to 10% by weight; or{'sub': '2', 'a portion of HfOis 0 to 1% by weight.'}3. The glass of claim 1 , wherein a weight ratio of a sum of the portions of LaOand NbOto a sum of the portions of TiOand ZrOis at least 2.25:1.4. The glass of claim 1 , wherein a sum of the weight portions of NbOand ZrOis higher than the weight portion of TiO.5. The glass of claim 1 , wherein a weight ratio of a sum of the portions of LaOand NbOto the portion of TiOis at least 3.15:1.6. The glass of claim 1 , wherein a sum of the portions of LaO claim 1 , NbOand ZrOis in a range of 55 to 75% by weight.7. The glass of claim 1 , wherein a weight ratio of the portion of TiOto the portion of ZrOis at most 3.00:1.8. The glass of claim 1 , wherein a portion of SbOis at most 50 ppm.9. The glass of claim 1 , wherein the glass has an internal transmission TI of at least 80% claim 1 , measured at a wavelength of 460 nm and a sample thickness of 10 mm.10. The glass of claim 1 , wherein the portion of GdOis at most 9% by weight and the portion of ZrOis at least 6% by weight.11. The glass of claim 1 , wherein the portion of GdOis in a range of from 4.5 to 9% by weight and the portion of ZrOis in a range of from 6 to 11% by weight.12. The glass of claim 1 , wherein the portion of BaO is in a range of from 1 to 8% by weight.13. A glass having a refractive index nof at least 2.02 and an internal transmission TI of at least 85% claim 1 , measured at a wavelength of 460 ...

Mask blank substrate, substrate with multilayer reflection film, transmissive mask blank, reflective mask, and semiconductor device fabrication method

Disclosed is a mask blank substrate for use in lithography, wherein the main surface on which the transfer pattern of the substrate is formed has a root mean square roughness (Rms) of not more than 0.15 nm obtained by measuring an area of 1 μm×1 μm with an atomic force microscope, and has a power spectrum density of not more than 10 nm 4 at a spatial frequency of not less than 1 μm −1 .

METHOD FOR THE MANUFACTURE OF DOPED QUARTZ GLASS

One aspect relates to a method for the manufacture of doped quartz glass. Moreover, one aspect relates to quartz glass obtainable according to the method including providing a soot body, treating the soot body with a gas, heating an intermediate product and vitrifying an intermediate product.

DEVICE FOR MANUFACTURING SiO2-TiO2 BASED GLASS

A device for manufacturing SiO—TiObased glass by growing a glass ingot upon a target by a direct method. The device includes the target, comprising a thermal storage portion that accumulates heat by being preheated, and a heat insulating portion that suppresses conduction of heat from the thermal storage portion in a direction opposite to the glass ingot. 1. A device for manufacturing SiO—TiObased glass by growing a glass ingot upon a target by a direct method , comprising: a thermal storage portion that accumulates heat by being preheated, and', 'a heat insulating portion that suppresses conduction of heat from the thermal storage portion in a direction opposite to the glass ingot., 'the target, comprising'}2. The device according to claim 1 , wherein:the thermal storage portion and the heat insulating portion comprise a plate-shaped first member and a plate-shaped second member, respectively;the first member has a larger thermal capacity than the second member; andthe second member has a lower thermal conductivity than the first member.3. The device according to claim 1 , wherein:the thermal storage portion comprises a plate-shaped first member, and has convex portions upon a surface of the first member that is opposite to the glass ingot.4. The device according to claim 3 , wherein:the heat insulating portion comprises a plate-shaped second member, and the first member and the second member are in mutual thermal contact via the convex portions. This is a divisional application filed under Rule 1.53(b) as U.S. application Ser. No. 14/582,237 filed Dec. 24, 2014 which is a continuation application filed under 35 U.S.C. §111(a), which claims the benefit of PCT International Patent Application No. PCT/JP2013/067678, filed Jun. 27, 2013, which claims the foreign priority benefit under 35 U.S.C. §119, of Japanese Patent Application No. 2012-144149, filed Jun. 27, 2012, the disclosures of which are herein incorporated by reference.The present invention relates to a ...

Optical glass

An optical glass with high refractive index and low dispersion, having refractive index nd of 1.78-1.95, Abbe number vd of 32-50, and contains no GeO 2 , so it is not easily devitrified. An optical glass, represented by cation %, including: 1-20% of Si 4+ ; 25-60% of B 3+ ; 10-40% of La 3+ ; 0-15% of Y 3+ ; 0-20% of Nb 5+ ; 0-15% of Ti 4+ ; 0-10% of Ta 5+ ; 0-5% of W 6+ ; 0-15% of Zr 4+ ; 0-10% of Zn 2+ ; 0-10% of Bi 3+ . An optical glass with excellent transmittance, an optical glass preform and an optical element formed by the above optical glass. The optical element made by the above optical glass and the above glass preform or optical element blank, such as lens, can be used for optical systems.

FEED-THROUGH ELEMENT FOR HARSH ENVIRONMENTS

A feed-through element for harsh environments is provided that includes a support body with at least one access opening, in which at least one functional element is arranged in an electrically insulating fixing material. The electrically insulating fixing material contains a glass or a glass ceramic with a volume resistivity of greater than 1.0×10Ωcm at the temperature of 350° C. The glass or a glass ceramic has a defined composition range in the system SiO—BO-MO. 1. A feed-through element for harsh environments , comprising:a support body with an access opening;at least one functional element is arranged in the access opening; andan electrically insulating fixing material securing the at least one functional element in the access opening and electrically insulating the at least one functional element from the support body,wherein the electrically insulating fixing material contains a glass or a glass ceramics and the glass or glass ceramics comprises in mole % on oxide basis:{'sub': '2', 'SiO25-55,'}{'sub': 2', '3, 'BO0.1-15,'}{'sub': 2', '3, 'AlO0-15,'}MO 20-50, and{'sub': '2', 'MO 0-<2,'}wherein MO is selected from the group consisting of MgO, CaO, SrO, BaO, and any combinations thereof,{'sub': 2', '2', '2', '2, 'wherein MO is selected from the group consisting of LiO, NaO, KO, and any combinations thereof,'}wherein the electrically insulating fixing material has a CTE that is smaller than a CTE of the support body, whereby at least at room temperature the support body exerts an additional holding pressure to the electrically insulating fixing material, andwherein the electrically insulating fixing material has an electrical insulation resistivity of at least 500 MΩ at an operation temperature of 260° C.2. The feed-through element according to claim 1 , wherein the at least one functional element is selected from the group consisting of an electrical conductor claim 1 , a waveguide claim 1 , a cooling-fluid line claim 1 , a housing of a thermo element claim 1 , ...

Resistive composition

An object of the present invention is to provide a resistive composition that can form a thick film resistor excluding a toxic lead component from a conductive component and glass and having characteristics equivalent to or superior to conventional resistors in terms of, in a wide resistance range, resistance values, TCR characteristics, current noise characteristics, withstand voltage characteristics and the like. The resistive composition of the present invention includes: ruthenium-based conductive particles including ruthenium dioxide; a glass frit that is essentially free of a lead component; and an organic vehicle, wherein the glass frit is a glass frit which is constituted such that in a case where a fired product of a mixture of the glass frit and the ruthenium dioxide has in a range of 1 kΩ/□ to 1 MΩ/□, the fired product exhibits a temperature coefficient of resistance in a plus range.

OPTICAL GLASS, PRESS-MOLDING GLASS MATERIAL, OPTICAL ELEMENT AND METHOD OF MANUFACTURING THE SAME, AND BONDED OPTICAL ELEMENT

An aspect of the present invention relates to an optical glass, which comprises, denoted as weight percent, 2 to 37 percent of SiO, 0 to 25 percent of BO, 0 to 10 percent of GeO, 18 to 55 percent of a combined content of LiO, NaO, KO, CaO, SrO, and BaO, and 27 to 55 percent of a combined content of TiO, NbO, and WO, wherein the weight ratio of SiOcontent relative to a combined content of SiOand BOranges from 0.1 to 1, a weight ratio of the LiO content to a combined content of LiO, NaO, KO, CaO, SrO, and BaO ranges from 0 to 0.4, and a weight ratio of TiOcontent relative to a combined content of TiO, NbO, and WOranges from 0.35 to 1, with a refractive index nd of 1.860 to 1.990 and an Abbé number νd of 21 to 29. 1. An optical glass , which comprises , denoted as weight percent ,{'sub': '2', '2 to 37 percent of SiO,'}{'sub': 2', '3, '0 to 25 percent of BO,'}{'sub': '2', '0 to 10 percent of GeO,'}{'sub': 2', '2', '2, '18 to 55 percent of a combined content of LiO, NaO, KO, CaO, SrO, and BaO,'}{'sub': 2', '2', '5', '3, '33.78 to 55 percent of a combined content of TiO, NbO, and WO, and'}{'sub': 2', '3, '0 to 15 percent of LaO;'}{'sub': 2', '2', '2', '3', '2', '2', '2', '3, 'wherein the weight ratio of SiOcontent relative to a combined content of SiOand BO(SiO/(SiO+BO) ranges from 0.1 to 1;'}{'sub': 2', '2', '2', '2', '2', '2', '2', '2, 'a weight ratio of the LiO content to a combined content of LiO, NaO, KO, CaO, SrO, and BaO (LiO/(LiO+NaO+KO+CaO+SrO+BaO) ranges from 0 to 0.4; and'}{'sub': 2', '2', '2', '5', '3', '2', '2', '2', '5', '3, 'a weight ratio of TiOcontent relative to a combined content of TiO, NbO, and WO(TiO/(TiO+NbO+WO) ranges from 0.35 to 1; and'}which has a refractive index nd ranging from 1.860 to 1.990 and an Abbé number νd ranging from 21 to 29.2. The optical glass according to claim 1 , wherein a difference (Tx−Tg) between a peak crystallization temperature Tx and a glass transition temperature Tg is equal to or greater than 120° C.3. The optical ...

Mold, molding apparatus, and production method of bent glass

A mold has a molding surface for hot molding of a body to be molded. The mold includes a glass having a porosity of 0.01% or more and containing 95 mol % or more of SiO 2 . A molding apparatus includes the mold. A method for producing a bent glass includes a placing step and a molding step. In the placing step, a glass to be molded is placed on a mold including a glass having a porosity of 0.01% or more. In the molding step, the glass to be molded which has been placed on the mold is heated, and then, the glass is caused to be molded to follow a molding surface of the mold.

Method for cutting glass using a laser, and glass produced according to the method

A method for cutting thin glass, wherein the thin glass is heated with a laser beam along a path forming a cutting line moving along a forward feed direction, such that a crack propagates along the cutting line and cuts through the thin glass. The laser beam is formed by a beam-forming optic in such a way that the beam profile thereof has an elongated shape. The laser beam is orientated on the surface of the thin glass such that the longitudinal direction thereof is aligned in the feed direction. The elongated shape of the beam profile is asymmetric, such that the intensity course differs at the ends of the beam profile in such a way that the increase in intensity at the front end crossing the thin glass first is steeper than the drop in intensity at the opposite rear end.

Ion exchangeable glass with high crack initiation threshold

Alkali aluminosilicate glasses that are resistant to damage due to sharp impact and capable of fast ion exchange are provided. The glasses comprise at least 4 mol % P 2 O 5 and, when ion exchanged, have a Vickers indentation crack initiation load of at least about 7 kgf.

Vanadium-based frit materials, and/or methods of making the same

Certain example embodiments relate to improved seals for glass articles. Certain example embodiments relate to a composition used for sealing an insulted glass unit. In certain example embodiments the composition includes vanadium oxide, barium oxide, zinc oxide, and at least one additional additive. For instance, another additive that is a different metal oxide or different metal chloride may be provided. In certain example embodiments, a vacuum insulated glass unit includes first and second glass substrates that are sealed together with a seal that includes the above-described composition.

PROCESS FOR THE PREPARATION OF FLUORINATED QUARTZ GLASS

A process for the production of a fluorinated quartz glass including the steps of generating SiOparticles in a synthesis burner; depositing the resulting SiOparticles into a body; and vitrifying the resulting body, wherein a fluorinating agent having a boiling point greater than or equal to −10° C. is supplied to the synthesis burner. 1. A process for the production of fluorinated quartz glass , characterized by:{'sub': '2', 'a. generation of SiOparticles in a synthesis burner;'}{'sub': '2', 'b. deposition of the SiOparticles resulting from process a. to form a body; and'}c. vitrification of the body resulting from process b,characterized in that a fluorinating agent having a boiling point of greater than or equal to −10° C. is introduced to the synthesis burner during process a.2. The process according to claim 1 , characterized in that the fluorinating agent is selected from the group consisting of:i. oxygen-containing fluorinating agents;ii. nitrile-containing fluorinating agents;iii. mixtures of the oxygen-containing and nitrile-containing fluorinating agents.3. The process according to claim 2 , characterized in that the oxygen-containing fluorinating agents are selected from the group consisting of: [{'br': None, 'sub': F1', 'F2, 'R—CO—R\u2003\u2003(I),'}, {'sub': F1', 'F2, 'wherein Ris selected from the group consisting of perfluorinated carbon groups having 1 to 7 carbon atoms and fluorine; and Ris selected from the group consisting of perfluorinated carbon groups having 1 to 7 carbon atoms;'}], 'i. Perfluoroketones of the general formula (I)'} [{'br': None, 'sub': F1', '1', '2', 'F2, 'R—C(X)(X)O—R\u2003\u2003(II),'}, {'sub': F1', 'F2', '1', '2', '3, 'wherein Ris selected from the group consisting of perfluorinated carbon groups having 1 to 7 carbon atoms and fluorine; Ris selected from the group consisting of perfluorinated carbon groups having 1 to 7 carbon atoms; and Xand Xare F or CF.'}], 'ii. Perfluoroethers of the general formula (II)'} [{'br': None, ' ...

MINERAL FIBER COMPOSITIONS HAVING ENHANCED BIOPERSISTENT PROPERTIES AND METHODS FOR MAKING AND USING THE SAME

Described herein are mineral fiber compositions having enhanced characteristics, such as biopersistence and resistance to heat induced shrinkage. Also described are methods for making and using the same. Such compositions may comprise manganese oxide and aluminum oxide. 1. A composition comprising mineral fibers wherein: manganese oxide; and', 'aluminum oxide;, 'the mineral fibers comprise;'}wherein the manganese oxide is present in an amount from about 7 to about 10%, based on the total weight of the mineral fiber.2. The composition according to claim 1 , wherein the aluminum oxide is present in an amount greater than about 17% claim 1 , based on the total weight of the mineral fiber.3. The composition according to claim 1 , wherein the aluminum oxide is present in an amount between 17.5% to 21.0% claim 1 , based on the total weight of the mineral fiber.4. The composition according to claim 1 , wherein the mineral fiber comprises SiOpresent in an amount between 35.0% to 41.0% claim 1 , based on the total weight of the mineral fiber.5. The composition according to claim 1 , wherein the mineral fiber comprises FeOT present in an amount between 0.20% to 2.00% claim 1 , based on the total weight of the mineral fiber.6. The composition according to claim 1 , wherein the mineral fiber comprises MgO present in an amount between 5% to 9% claim 1 , based on the total weight of the mineral fiber.7. The composition according to claim 1 , wherein the mineral fiber comprises CaO present in an amount between 18% to 25% claim 1 , based on the total weight of the mineral fiber.8. The composition according to claim 1 , wherein the mineral fiber comprises KO present in an amount between 1.0% to 2.0% claim 1 , based on the total weight of the mineral fiber.9. The composition according to claim 1 , wherein the mineral fiber comprises about 40 wt. % of SiOand about 18.9 wt. % of AlO.10. The composition according to claim 9 , wherein the mineral fiber further comprises about 8.65 wt. % ...

OPTICAL GLASS, PREFORM, AND OPTICAL ELEMENT

An optical glass having a small partial dispersion ratio (θg,F), while having a refractive index (n) and Abbe number (ν) within desired ranges, is obtained. The optical glass, in mass %, comprises 10.0 to 70.0% of an SiOcomponent, 1.0 to 50.0% of an NbOcomponent, and 1.0 to 30.0% of an NaO component, and has a refractive index (n) of 1.62 to 1.75, an Abbe number (ν) of 30 to 42, and a partial dispersion ratio (θg,F) of no greater than 0.594. 1. An optical glass comprising , in mass % ,{'sub': '2', '10.0 to 70.0% of an SiOcomponent,'}{'sub': 2', '5, '1.0 to 50.0% of an NbOcomponent, and'}{'sub': '2', '1.0 to 30.0% of an NaO component,'}and having{'sub': 'd', 'a refractive index (n) of 1.62 to 1.75,'}{'sub': 'd', 'an Abbe number (ν) of 30 to 42, and'}a partial dispersion ratio (θg,F) of no greater than 0.594.2. An optical glass according to claim 1 , wherein claim 1 , in mass % claim 1 , a content of a BOcomponent is no greater than 25.0%.3. An optical glass according to claim 1 , wherein a mass ratio (LiO+NaO)/(ZrO) is no less than 0.50.4. An optical glass according to claim 1 , wherein claim 1 , in mass % claim 1 , a content of an LiO component is no greater than 20.0%.5. An optical glass according to claim 1 , wherein a mass ratio (SiO)/(SiO+BO) is no less than 0.50.6. An optical glass according to claim 1 , wherein a mass ratio (SiO)/(SiO+BO) is no greater than 0.95.7. An optical glass according to claim 1 , wherein claim 1 , in mass % claim 1 , a content of a ZrOcomponent is no greater than 25.0%.8. An optical glass according to claim 1 , wherein claim 1 , in mass % claim 1 ,{'sub': '2', 'an KO component is 0 to 20.0%,'}{'sub': '2', 'a TiOcomponent is 0 to 20.0%,'}an MgO component is 0 to 10.0%,a CaO component is 0 to 10.0%,an SrO component is 0 to 10.0%,a BaO component is 0 to 20.0%,{'sub': 2', '3, 'a TaOcomponent is 0 to 10.0%,'}{'sub': 2', '3, 'an LaOcomponent is 0 to 10.0%,'}{'sub': 2', '3, 'a GdOcomponent is 0 to 10.0%,'}{'sub': 2', '3, 'a YOcomponent is 0 ...

POLISHING AGENT FOR SYNTHETIC QUARTZ GLASS SUBSTRATE, METHOD FOR MANUFACTURING THE POLISHING AGENT, AND METHOD FOR POLISHING SYNTHETIC QUARTZ GLASS SUBSTRATE

A polishing agent for a synthetic quartz glass substrate contains polishing particles and water. The polishing particles contain silica particles as base particles, and composite oxide particles of cerium and at least one rare earth element selected from trivalent rare earth elements other than cerium are supported on surfaces of the base particles. This provides a polishing agent for a synthetic quartz glass substrate, the polishing agent having high polishing rate and being capable of sufficiently reducing generation of defects due to polishing. 19.-. (canceled)10. A polishing agent for a synthetic quartz glass substrate , comprising polishing particles and water , whereinthe polishing particles comprise silica particles as base particles, andcomposite oxide particles of cerium and at least one rare earth element selected from trivalent rare earth elements other than cerium are supported on surfaces of the base particles.11. The polishing agent for a synthetic quartz glass substrate according to claim 10 , whereinthe base particles comprise amorphous silica particles, andthe amorphous silica particles have an average particle diameter of 60 nm or more and 120 nm or less.12. The polishing agent for a synthetic quartz glass substrate according to claim 10 , whereinthe composite oxide particles are a composite oxide of cerium and lanthanum, anda molar ratio of cerium/lanthanum is 1.0 to 4.0.13. The polishing agent for a synthetic quartz glass substrate according to claim 11 , whereinthe composite oxide particles are a composite oxide of cerium and lanthanum, anda molar ratio of cerium/lanthanum is 1.0 to 4.0.14. The polishing agent for a synthetic quartz glass substrate according to claim 10 , wherein the composite oxide particles have particle diameters of 1 nm or more and 20 nm or less.15. The polishing agent for a synthetic quartz glass substrate according to claim 11 , wherein the composite oxide particles have particle diameters of 1 nm or more and 20 nm or less ...

GLASS

To provide a glass plate having a high Young's modulus and a high devitrification viscosity. A glass includes, in mol % based on oxides: SiOof 30.0 to 50.0%; BOof 10.0 to 30.0%; AlOof 10.0 to 30.0%; YOof 3.0 to 17.0%; and GdOof 3.5 to 17.0%, in which (GdO+YO) is from 16.0 to 22.0%, and (GdO/YO) is from 0.15 to 7.0. 1. A glass comprising , in mol % based on oxides:{'sub': '2', 'SiOof 30.0 to 50.0%;'}{'sub': 2', '3, 'BOof 10.0 to 30.0%;'}{'sub': 2', '30, 'AlOf 10.0 to 30.0%;'}{'sub': 2', '3, 'YOof 3.0 to 17.0%; and'}{'sub': 2', '3, 'GdOof 3.5 to 17.0%, wherein'}{'sub': 2', '3', '2', '3, '(GdO+YO) is from 16.0 to 22.0%, and'}{'sub': 2', '3', '2', '3, '(GdO/YO) is from 0.15 to 7.0.'}2. The glass according to claim 1 , wherein the glass includes claim 1 , in mol % based on oxides:{'sub': '2', 'SiOof 35.0 to 45.0%;'}{'sub': 2', '3, 'BOof 15.0 to 25.0%;'}{'sub': 2', '30, 'AlOf 15.0 to 25.0%;'}{'sub': 2', '3, 'YOof 9.0 to 14.0%; and'}{'sub': 2', '3, 'GdOof 6.0 to 11.0%.'}3. The glass according to claim 1 , wherein claim 1 , in mol % based on oxides claim 1 ,{'sub': 2', '3', '2', '3, '(GdO+YO) is from 19.0 to 21.0%, and'}{'sub': 2', '3', '2', '3, '(GdO/YO) is from 0.5 to 2.0.'}4. The glass according to claim 1 , wherein claim 1 , in mol % based on oxides claim 1 , 95.0% (SiO+BO+AlO+YO+GdO)≤100.0%.5. The glass according to claim 1 , wherein a Young's modulus is equal to or larger than 110 GPa.6. The glass according to claim 1 , wherein a devitrification viscosity log is equal to or larger than 1.95.7. The glass according to claim 1 , wherein the glass is used as a support substrate of a semiconductor.8. The glass according to claim 1 , wherein the glass is used as a peelable support substrate in a semiconductor manufacturing process. This application is a continuation of International Application No. PCT/JP2019/028892, filed on Jul. 23, 2019, the entire contents of which are incorporated herein by reference.The present invention relates to glass.Fan-out wafer level packages ( ...

POROUS GLASS MEMBER

Provided is a porous glass member less likely to crack during production. A porous glass member has a porosity of 10 to 85% and contains, in terms of % by mass, 80 to below 100% SiO, over 0 to 10% ZrO, and 0 to 10% AlO. 1. A porous glass member having a porosity of 10 to 85% and containing , in terms of % by mass , 80 to below 100% SiO , over 0 to 10% ZrO , and 0 to 10% AlO.2. The porous glass member according to claim 1 , having a median value of a pore distribution of 1 to 100 nm.3. The porous glass member according to claim 1 , having an aspect ratio of 2 to 1000. The present invention relates to porous glass members.Porous glass has a sharp pore distribution and a large specific surface area and also has thermal resistance and organic solvent resistance and, therefore, its use in a wide range of applications, including a separation membrane, a diffuser tube, an electrode material, and a catalyst carrier, is recently under consideration. Porous glass is produced by thermally treating a glass base material made of borosilicate glass to separate it into two phases: a silica-rich phase and a boron oxide-rich phase, removing the boron oxide-rich phase with an acid, then washing the silica-rich phase with water or the like, and then drying the silica-rich phase (see, for example, Patent Literature 1).However, porous glass often cracks during production and is therefore difficult to produce into a desired shape.In view of the above, the present invention has an object of providing a porous glass member less likely to crack during production.The inventor repeated various experiments and finally found that porous glass containing ZrOoften cracked during drying in the course of production and the cracking was caused by stress (capillary force) produced when water present in the pores volatilized.A porous glass member according to the present invention has a porosity of 10 to 85% and contains, in terms of % by mass, 80 to below 100% SiO, over 0 to 10% ZrO, and 0 to 10% AlO ...

LITHIUM ION CONDUCTOR, SOLID ELECTROLYTE LAYER, ELECTRODE, BATTERY, AND ELECTRONIC DEVICE

A lithium ion conductor includes a first lithium ion conductor that contains at least one selected from among oxide crystals and glass ceramics, and a second lithium ion conductor that has a sintering temperature of not more than 600° C. The lithium ion conductivity of the first lithium ion conductor is higher than the lithium ion conductivity of the second lithium ion conductor. 1. A lithium ion conductor comprising:a first lithium ion conductor that contains at least one selected from among oxide crystals and glass ceramics; anda second lithium ion conductor that has a sintering temperature of not more than 600° C.,wherein a lithium ion conductivity of the first lithium ion conductor is higher than a lithium ion conductivity of the second lithium ion conductor.2. The lithium ion conductor according to claim 1 , wherein the first lithium ion conductor and the second lithium ion conductor contain an oxide.3. The lithium ion conductor according to claim 1 , wherein a sintering temperature of the first lithium ion conductor exceeds 600° C.4. The lithium ion conductor according to claim 1 , wherein the second lithium ion conductor contains a glass.5. The lithium ion conductor according to claim 4 , wherein the glass contains at least one selected from among germanium claim 4 , silicon claim 4 , boron claim 4 , and phosphorus claim 4 , as well as lithium and oxygen.6. The lithium ion conductor according to claim 1 , wherein in a state where the second lithium ion conductor has been sintered claim 1 , the lithium ion conductivity of the lithium ion conductor is not less than 5×10S/cm.7. The lithium ion conductor according to claim 1 , wherein an average particle diameter of the first lithium ion conductor is not less than an average particle diameter of the second lithium ion conductor.8. The lithium ion conductor according to claim 1 , wherein a proportion by volume of the first lithium ion conductor is not less than a proportion by volume of the second lithium ion ...

Composite Laminated Ceramic Electronic Component

A composite laminated ceramic electronic component that includes co-fired low dielectric-constant ceramic layers and high dielectric-constant ceramic layers. The low dielectric-constant ceramic layers and the high dielectric-constant ceramic layers are each composed of a glass ceramic containing: a first ceramic composed of MgAl 2 O 4 and/or Mg 2 SiO 4 ; a second ceramic composed of BaO, RE 2 O 3 (where RE is a rare-earth element), and TiO 2 ; glass containing each of 44.0 to 69.0 weight % of RO (where R is an alkaline-earth metal), 14.2 to 30.0 weight % of SiO 2 , 10.0 to 20.0 weight % of B 2 O 3 , 0.5 to 4.0 weight % of Al 2 O 3 , 0.3 to 7.5 weight % of Li 2 O, and 0.1 to 5.5 weight % of MgO; and MnO. The content ratios of the glass, etc. are varied between the low dielectric-constant ceramic layers and the high dielectric-constant ceramic layers.

OPTICAL GLASS AND USE THEREOF

An optical glass is oxide glass wherein Si+B ranges from 10-60 cation %, La+Gd+Y+Yb ranges from 25-70 cation %, Ti+Nb+W+Bi ranges from 10-20 cation %, Li content ranges from 0-5.0 cation %, Ge content is lower than 5.0 mass % as quantity of GeObased on oxides, no Pb included, a cation ratio, Si/B, is equal or lower than 0.70, a cation ratio, (La+Gd+Y+Yb)/(Ti+Nb+W+Bi), ranges from 1.90-7.00, a cation ratio, Y/(La+Gd+Y+Yb), is equal or lower than 0.180, and Nb is an essential component, with Ti/Nb being equal or lower than 4.00, with nd of higher than 1.920 and equal or lower than 2.000, vd ranging from 28.0-34.0, and yield point higher than 645° C., and a deviation ΔPg,F from normal line of partial dispersion ratio Pg,F being equal or lower than 0.0005. 1. Optical glass , which is oxide glass wherein:{'sup': 4+', '3+, 'a total content of Si and Branges from 10 to 60 cation %;'}{'sup': 3+', '3+', '3+', '3+, 'a total content of La, Gd, Y, and Yb ranges from 25 to 70 cation %;'}{'sup': 4+', '5+', '6', '3+, 'a total content of Ti, Nb, Wand Bi ranges from 10 to 20 cation %;'}{'sup': '+', 'a content of Li ranges from 0 to 5.0 cation %;'}{'sub': '2', 'a content of Ge is lower than 5.0 mass % as a quantity of GeOin a glass composition based on oxides;'}no Pb is comprised;{'sup': 4+', '3+', '4', '3+, 'a cation ratio of a content of Si to a content of B, Si/B, is equal to or lower than 0.70;'}{'sup': 3+', '3+', '3+', '3+', '4+', '5+', '6+', '3+', '3+', '3+', '3+', '3+', '4+', '5+', '6+', '3+, 'a cation ratio of the total content of La, Gd, Y, and Yb to the total content of Ti, Nb, W, and Bi, (La+Gd+Y+Yb)/(Ti+Nb+W+Bi), ranges from 1.90 to 7.00;'}{'sup': 3+', '3+', '3+', '3+', '3+', '3+', '3+', '3+', '3+', '3+, 'a cation ratio of a content of Y to the total content La, Gd, Y, and Yb, Y/(La+Gd+Y+Yb), is equal to or lower than 0.180; and'}{'sup': 5+', '4+', '5+', '4+', '5+, 'Nb is comprised as an essential component, with a cation ratio of a content of Ti to a content of Nb, Ti/Nb ...

Ultralow expansion glass

Silica-titania glasses with small temperature variations in coefficient of thermal expansion over a wide range of zero-crossover temperatures and methods for making the glasses. The method includes a cooling protocol with controlled anneals over two different temperature regimes. A higher temperature controlled anneal may occur over a temperature interval from 750° C.-950° C. or a sub-interval thereof. A lower temperature controlled anneal may occur over a temperature interval from 650°C.-875° C. or a sub-interval thereof. The controlled anneals permit independent control over CTE slope and Tzc of silica-titania glasses. The independent control provides CTE slope and Tzc values for silica-titania glasses of fixed composition over ranges heretofore possible only through variations in composition.

Radiopaque glass and uses thereof

The amorphous, or at least partially crystalline, glass-based joining material is suitable for high-temperature applications, particularly in fuel cells and/or sensors. In addition to SiOand BOas glass formers, the joining material similarly contains BaO and CaO, whereby the amount of AlOis limited. The joining material has a coefficient of linear thermal expansion of at least 7.0·10Kin a range of 20° C. to 300° C. The joining material can be used for joining ferritic high-grade steels and/or chromium-containing alloys and/or ceramics, such as stabilized zirconium oxide and/or aluminium oxide. 2. The radiopaque glass as defined in claim 1 , wherein said composition comprises not more than 5 wt. % of F claim 1 , and preferably not more than 2.5 wt. % of F.4. The radiopaque glass as defined in claim 1 , wherein the sum of BaO+CsO+SnO+F is ≧12 wt. % claim 1 , preferably ≧14 wt. % claim 1 , and most preferably ≧17 wt. %.5. The radiopaque glass as defined in claim 1 , wherein a molar ratio of SnOto F is at least 0.4 claim 1 , preferably at least 0.45 claim 1 , more preferably at least 0.49 and more preferably at least 0.5.6. The radiopaque glass as defined in claim 1 , wherein a molar ratio of SnOto F is at most 0.85 claim 1 , preferably at most 0.79 claim 1 , more preferably at most 0.77 claim 1 , more preferably at most 0.75 claim 1 , more preferably at most 0.72 and more preferably at most 0.7.7. The radiopaque glass as defined in claim 1 , wherein a molar ratio of CsO to the sum of BaO+CsO+SnOis at least 0.05 claim 1 , preferably at least 0.07 and more preferably at least 0.1.8. The radiopaque glass as defined in claim 1 , wherein a molar ratio of CsO to the sum of BaO+CsO+SnOis at most 0.48 claim 1 , preferably at most 0.45 and more preferably at most 0.41.10. The radiopaque glass as defined in claim 1 , which is claim 1 , apart from at most impurities claim 1 , free of at least one of NaO claim 1 , LiO claim 1 , MgO claim 1 , CeO claim 1 , LaOand ZrO.11. The ...

GLASS COMPOSITION FOR SEALING

Disclosed is a glass composition that gives a high thermal expansion crystallized glass having a thermal expansion coefficient of not less than 130×10/° C. after its firing in the form of powder at a temperature not lower than 850° C. The glass composition is substantially free of alkali metal oxides, and contains 12-25 mass % SiO, 10-20 mass % BO(but, not including 20 mass %), 18-30 mass % CaO, 15-30 mass % MgO, and 10.5-27 mass % BaO, wherein the glass composition, when fired in the form of glass powder at a temperature of 850-1050° C., forms a crystallized glass that exhibits a thermal expansion coefficient of at least 130×10/° C. in the range of 50-800° C. 1. A sealing glass composition substantially not containing alkali metal oxides , but containing{'sub': '2', 'SiO12-25 mass %,'}{'sub': 2', '3, 'BO10-20 mass % (but, not including 20 mass %),'}CaO 18-30 mass %,MgO 15-30 mass %, {'sup': '−7', 'wherein the glass composition, when fired in the form of glass powder at a temperature of 850-1050° C., produces a crystallized glass that exhibits a thermal expansion coefficient of at least 130×10/° C. in the range of 50-800° C.'}, 'BaO 10.5-27 mass %,'}2. The sealing glass composition according to substantially not containing alkali metal oxides claim 1 , but containing{'sub': '2', 'SiO12-20 mass %,'}{'sub': 2', '3, 'BO13-19 mass %,'}CaO 20-29 mass %,MgO 18-25 mass %, {'sup': '−7', 'wherein the glass composition, when fired in the form of glass powder at a temperature of 850-1050° C., produces a crystallized glass that exhibits a thermal expansion coefficient of at least 130×10/° C. in the range of 50-800° C.'}, 'BaO 10.5-25 mass %,'}3. The sealing glass composition according to substantially not containing alkali metal oxides claim 1 , but containing{'sub': '2', 'SiO13-18 mass %,'}{'sub': 2', '3, 'BO13-19 mass %,'}CaO 20-29 mass %,MgO 18-25 mass %, {'sup': '−7', 'wherein the glass composition, when fired in the form of glass powder at a temperature of 850-1050° C., ...

TOP PLATE FOR COOKING DEVICE

A technical object of the present invention is to devise a top plate for a cooking appliance that can suppress proliferation of bacteria or mold. In order to achieve the technical object, the top plate for a cooking appliance of the present invention includes: a crystallized glass substrate having a cooking surface on which a cooking device is placed; and a decorative layer formed on the cooking surface, in which the decorative layer includes 30 vol % to 100 vol % of ZnO—BO-based glass and 0 vol % to 70 vol % of refractory filler powder. 1. A top plate for a cooking appliance , comprising:a crystallized glass substrate having a cooking surface on which a cooking device is placed; anda decorative layer formed on the cooking surface,{'sub': 2', '3, 'wherein the decorative layer comprises 30 vol % to 100 vol % of ZnO—BO-based glass and 0 vol % to 70 vol % of refractory filler powder.'}2. The top plate for a cooking appliance according to claim 1 , wherein the ZnO—BO-based glass comprises as a glass composition claim 1 , in terms of mass % claim 1 , 40% to 70% of ZnO claim 1 , 10% or more and less than 40% of BO claim 1 , 0% to 25% of SiO claim 1 , 0% to 20% of NaO claim 1 , and 0% to 5% of AgO.3. The top plate for a cooking appliance according to claim 1 , wherein the ZnO—BO-based glass comprises as a glass composition claim 1 , in terms of mass % claim 1 , 54% to 64% of ZnO claim 1 , 15% or more and less than 40% of BO claim 1 , 2% to 20% of SiO claim 1 , 0.1% to 5% of AlO claim 1 , and 0.05% to 0.9% of AgO claim 1 , and is substantially free of an alkali component.4. The top plate for a cooking appliance according to claim 1 , wherein the refractory filler powder comprises one kind or two or more kinds selected from cordierite claim 1 , willemite claim 1 , alumina claim 1 , zirconium phosphate claim 1 , zircon claim 1 , zirconia claim 1 , tin oxide claim 1 , mullite claim 1 , silica claim 1 , β-eucryptite claim 1 , β-spodumene claim 1 , a β-quartz solid solution ...

Cladding glass for solid-state lasers

The present disclosure relates to a glass having a refractive index of at least 1.7 as well as the use of the glass as a cladding glass of a solid-state laser. The disclosure also relates to a laser component comprising a core of doped sapphire and a cladding glass being placed on said core. The cladding glass is arranged on said core such that light exiting from the core due to parasitic laser activity can enter the cladding glass and can be absorbed there. Thus, a laser component with improved efficiency is obtained. The present disclosure also relates to a method for producing the laser component.

Quartz etching method and etched substrate

A quartz etching method of the invention includes forming a mask on a quartz glass substrate and carrying out etching using a hydrofluoric acid-based etchant solution. The quartz etching method includes: preparing a quartz glass substrate; forming a mask having a predetermined pattern on the quartz glass substrate; and carrying out etching on the quartz glass substrate. When the quartz glass substrate is prepared, the quartz glass substrate is selected in accordance with a standard such that a concentration of hydroxyl groups included therein is less than or equal to 300 ppm.

PREPARATION OF A QUARTZ GLASS BODY IN A STANDING SINTER CRUCIBLE

The invention relates to a process for the preparation of a quartz glass body comprising the process steps i.) Providing a silicon dioxide granulate, ii.) Making a glass melt out of silicon dioxide granulate in an oven and iii.) Making a quartz glass body out of at least part of the glass melt, wherein the oven comprises a standing sinter crucible. The invention further relates to a quartz glass body which is obtainable by this process. The invention further relates to a light guide, an illuminant and a formed body, which are each obtainable by further processing of the quartz glass body. 118-. (canceled)19. A process for the preparation of a quartz glass body comprising: [{'sup': '2', 'a BET surface area in a range from 20 to 50 m/g; and'}, 'a mean particle size in a range from 50 to 500 μm;, 'providing a silicon dioxide granulate, wherein the silicon dioxide granulate was prepared from pyrogenic silicon dioxide, wherein the silicon dioxide granulate comprisesmaking a glass melt out of the silicon dioxide granulate in an oven; andmaking a quartz glass body out of the glass melt;wherein the oven comprises a standing sinter crucible.20. The process according to claim 19 , wherein the sinter crucible is made of a sinter material claim 19 , which comprise a sinter metal selected from the group consisting of molybdenum claim 19 , tungsten and a combination thereof.21. The process according to claim 20 , wherein the sinter metal of the sinter crucible has a density of 85% or more of the theoretical density of the sinter metal.22. The process according to claim 19 , wherein the BET surface area is not reduced to less than 5 m/g before making the glass melt out of the silicon dioxide granulate in the oven.23. The process according to claim 19 , wherein the standing sinter crucible comprises at least one of:an area formed as a standing surface;at least two sealed on rings as side parts;a nozzle;a mandrel;at least one gas inlet;at least one gas outlet; anda lid.24. The ...

Diffuser material of synthetically produced quartz glass and method for the manufacture of a molded body consisting fully or in part thereof

A diffuser material of synthetically produced, pore-containing quartz glass and a method for the manufacture of a molded body consisting fully or in part thereof. The diffuser material has a chemical purity of at least 99.9% SiO2, a cristobalite content of not more than 1%, and a density in the range of 2.0 to 2.18 g/cm3. Starting therefrom, to indicate a diffuser material which is improved with respect to diffuse reflectivity with Lambertian behavior over a wide wavelength range, high material homogeneity and UV radiation resistance, the quartz glass has a hydroxyl group content in the range of at least 200 wt. ppm and at least 80% of the pores have a maximum pore dimension of less than 20 μm.

OPTICAL GLASS AND OPTICAL ELEMENT

The invention provides a high-refraction low-dispersion optical glass with refractive index of 1.76-1.80 and Abbe number of 47-51. The glass has an excellent transmittance when the content of TaOin glass component is reduced. The optical glass comprises the following components by molar percentage: 40-65% of BO; 6-21% of LaO; 1-15% of GdO; greater than 6.5% but less than or equal to 15% of ZrO; ad 10-28% of ZnO. According to the present invention, the transmittance of glass becomes excellent without introducing SnO; the product cost is optimized by reducing the content of TaO; with reasonable component ratio, the high-refraction low-dispersion optical glass in favor of precision molding and with excellent transmittance, as well as the glass preform and optical element made of the optical glass can be easily enabled while the required optical constant of the glass is realized. 1. An optical glass , comprising the following components by molar percentage: 40-65% of BO; 6-21% of LaO; 1-15% of GdO; greater than 6.5% but less than or equal to 15% of ZrO; ad 10-28% of ZnO.2. The optical glass according to claim 1 , further comprising 0-8% of TaO; 0-8% of NbO; 0-2% of SiO; 0-8 of YO; 0-10% of GeO; 0-10% of BiO; 0-10% of AlO; 0-3% of LiO; 0-10% of NaO+KO; 0-1% of CeO; 0-1% of SbO; 0-10% of RO claim 1 , wherein RO is one or more of MgO claim 1 , CaO claim 1 , SrO or BaO.3. The optical glass according to claim 2 , further comprising: 0-3% of TaOand/or 0-3% of NbO; 0-1% of SiOand/or 0-3% of YOand/or 0-5% of GeOand/or 0-5% of BiOand/or 0-5% of AlOand less than 1% of LiO and/or 0-5% of NaO+KO and/or 0-0.5% of CeOand/or 0-0.5% of SbOand/or 0-5% of RO.4. The optical glass according to claim 1 , wherein (TaO+NbO)/(ZnO+LiO) is less than 0.35.5. The optical glass according to claim 1 , wherein LaO/(LaO+GdO+YO) is 0.20-0.80.6. The optical glass according to claim 1 , wherein ZrO/(BO+SiO) is 0.10-0.35.7. The optical glass according to claim 1 , wherein (TaO+NbO)/(ZnO+LiO) is less than ...

Glass composition for vitrifying low-level radioactive waste resin and method for vitrifying low-level radioactive waste resin using same

This invention relates to the vitrification of radioactive waste products. According to this invention, a glass composition, which is suitable for low-level radioactive waste resins, and a method of vitrifying the low-level radioactive waste resins using the same are provided to significantly reduce the volume of radioactive waste products and to vitrify low-level radioactive waste products using the glass composition, which is suitable for vitrifying the low-level radioactive waste resins, thereby maximally delaying or completely preventing the leakage of radioactive materials from a glass solidified body.

LITHIUM-RICH METALLURGICAL SLAG

The present invention concerns a slag composition having a high lithium content, suitable as additive in the manufacture of end-user products, or for the economic recovery of the contained lithium. 17-. (canceled)8. A LiO bearing metallurgical slag comprising AlO , SiO , CaO , and MnO , wherein the by-weight composition is as follows:{'sub': '2', '3% Подробнее

VANADIUM-BASED FRIT MATERIALS, BINDERS, AND/OR SOLVENTS AND/OR METHODS OF MAKING THE SAME

Certain example embodiments relate to seals for glass articles. Certain example embodiments relate to a composition used for sealing an insulted glass unit. In certain example embodiments the composition includes vanadium oxide, barium oxide, zinc oxide, and at least one additional additive. For instance, another additive that is a different metal oxide or different metal chloride may be provided. In certain example embodiments, a composition may be combined with a binder solution that substantially or completely burns out by the time the composition is melted. In certain example embodiments, a vacuum insulated glass unit includes first and second glass substrates that are sealed together with a seal that included the above-described composition. 130-. (canceled)32. The method of claim 31 , further comprising evacuating the gap between the first and second glass substrates to a pressure less than atmospheric pressure after a seal has been formed via at least said frit material. This application is a continuation-in-part of U.S. application Ser. No. 13/238,358, filed Sep. 21, 2011, which is a continuation-in-part of U.S. application Ser. No. 12/929,875, filed Feb. 22, 2011, the entire contents of which are each hereby incorporated by reference.Certain example embodiments of this invention relate to improved frit materials for glass articles (e.g., for use in vacuum insulted glass or VIG units), and/or methods of making the same, as well as articles including such improved frit materials and/or methods of making the same. More particularly, certain example embodiments relate to binders used in vanadium-based frit materials. In certain example embodiments, improved insulted seals created with the frit materials are used in connection with vacuum insulted glass (VIG) units, and/or a method is provided for sealing VIG units with the improved seals.Vacuum IG units are known in the art. For example, see U.S. Pat. Nos. 5,664,395, 5,657,607, and 5,902,652, the disclosures of ...

GLASS COMPOSITION AND GLASS POWDER, IN PARTICULAR FOR THE USE IN THE DENTAL FIELD

The present disclosure relates to a glass composition as well as a glass powder. The disclosure also relates to the use in the dental field, e.g. as dental material such as dental filling or dental restauration material, in particular as or for the production of a glass ionomer cement, for example for the treatment and/or for the filling of cavities in human and/or animal teeth and/or for tooth restoration. 5. The glass according to claim 1 , wherein the component 1 comprises SiOand POand wherein the component 2 comprises AlO.7. The glass according to claim 1 , wherein the ratio of the proportion by weight of AlOto the proportion by weight of SiOis in a range of 0.9:1 to 1.15:1.8. The glass according to claim 1 , wherein the glass contains at least one X-ray absorbing component selected from the group consisting of YO claim 1 , YbO claim 1 , LaO claim 1 , SrO claim 1 , BaO and CsO in a proportion of in total at least 0.1% by weight.9. The glass according to claim 1 , wherein the ratio of the proportion by weight of the component 2 to the proportion by weight of the component 1 is in a range of 1.0:1 to 1.6:1.10. The glass according to claim 1 , wherein the ratio of the proportion by weight of the component 2 to the proportion by weight of the component 3 is in a range of 1.0:1 to 6.5:1.11. The glass according to claim 1 , wherein the ratio of the proportion by weight of the component 1 to the proportion by weight of the component 3 is in a range of 0.8:1 to 4.5:1.12. The glass according to claim 1 , wherein the glass has a refractive index of from 1.43 to 1.55.13. A glass powder comprising particles of glass powder claim 1 , wherein the particles of glass powder comprise the glass according to claim 1 , and wherein the particle size of the glass powder claim 1 , when specified as d50 value claim 1 , is in a range of 0.2 μm to 20 μm.14. A method of making a glass ionomer cement claim 1 , comprising the step of:{'claim-ref': {'@idref': 'CLM-00001', 'claim 1'}, 'mixing ...

GLASS MATERIALS FOR LARGE SCALE DYE-SENSITIZED SOLAR CELL SEALING AND PASTES COMPRISING THE SAME

Disclosed is a glass composition for sealing a large-area dye-sensitized solar cell, and more particularly, to a glass composition which may be uniformly bonded to a large-area without reacting with an electrolyte. 1. A glass composition for sealing a dye-sensitized solar cell , comprising:{'sub': 2', '2', '2', '2', '5, '(SiO+NaO+KO)—PO—ZnO based glass,'}{'sub': 2', '2', '2', '2', '5, 'wherein (SiO+NaO+KO) is present in 10 to 25 mol %, POis present in 40 to 60 mol %, and ZnO is present in 5 to 35 mol %,'}{'sub': 2', '5, 'wherein the PO/ZnO has a molar ratio of 1.4 to 1.8, and'}{'sub': 2', '2', '2, 'wherein at least one selected from ZnF, BaFand CaFis included to replace a part or all of ZnO.'}2. The glass composition for sealing a dye-sensitized solar cell according to claim 1 , further comprising:{'sub': 2', '3', '2', '3', '2', '3, 'at least one selected from AlO, BOand SbOin an amount more than 0 mol % and less than or equal to 10 mol %,'}{'sub': 2', '3', '2', '3', '2', '3', '2', '5, 'wherein at least one selected from AlO, BOand SbOreplaces a part or all of ZnO or PO.'}3. The glass composition for sealing a dye-sensitized solar cell according to claim 1 ,wherein the glass composition has a firing temperature of 500° C. or below.4. The glass composition for sealing a dye-sensitized solar cell according to claim 3 ,wherein the glass composition has a firing temperature of at least 400° C.5. A paste for sealing a dye-sensitized solar cell claim 3 , comprising:{'claim-ref': {'@idref': 'CLM-00001', 'claim 1'}, 'the glass composition according to ; and'}an organic vehicle. This application claims priority to Korean Patent Application No. 10-2016-0097354, filed on Jul. 29, 2016, and all the benefits accruing therefrom under 35 U.S.C. §119, the contents of which in its entirety are herein incorporated by reference.The present disclosure relates to a glass composition for sealing a large-area dye-sensitized solar cell, and more particularly, to a composition for ...

FEEDTHROUGH

A feed-through includes at least one main body which has at least one opening through which at least one conductor in an electrically insulating material comprising or consisting of a sealing glass is fed, wherein the main body comprises or consists of a light metal and/or a light metal alloy, with an integral bond being formed between the light metal and/or the conductor and the sealing glass, wherein the sealing glass comprises or consists of a titanate glass and has only a small phosphate proportion. 1. A feedthrough for a storage device , comprising:at least one base body, wherein the base body has at least one opening, said base body one of including and consisting of at least one of a light metal and a light metal alloy;at least one conductor in an electrically insulated material one of comprising and consisting of a sealing glass fed through said at least one opening, said sealing glass being material bonded with at least one of said base body and said conductor, wherein said sealing glass one of includes and consists of titanium glass.2. The feedthrough according to claim 1 , wherein said conductor is a substantially pin-shaped conductor claim 1 , said light metal is one of aluminum claim 1 , magnesium claim 1 , and titanium claim 1 , and said light metal alloy is one of an aluminum alloy claim 1 , a magnesium alloy claim 1 , a titanium alloy claim 1 , and AlSiC.3. The feedthrough according to claim 2 , wherein said substantially pin-shaped conductor one of includes and consists of a light metal claim 2 , a light metal alloy claim 2 , aluminum claim 2 , an aluminum alloy claim 2 , copper claim 2 , CuSiC claim 2 , a copper alloy claim 2 , gold claim 2 , a gold alloy claim 2 , silver claim 2 , a silver alloy claim 2 , NiFe claim 2 , an NiFe-casing having a copper core claim 2 , and a cobalt-iron alloy.4. The feedthrough according to claim 1 , wherein said sealing glass is a titanate glass one of including and consisting of the following components in weight-% ...