СТАЛЬНОЙ ЛИСТ С ФАРФОРОВО-ЭМАЛЕВЫМ ПОКРЫТИЕМ И ФРИТТЫ ДЛЯ ЭМАЛИРОВАНИЯ

Изобретение относится к нанесению покрытий эмалированием. Стальной лист с фарфорово-эмалевым покрытием состоит из стального листа с гальваническим покрытием алюминиево-цинковым сплавом и слоя фарфорово-эмалевого покрытия в качестве самого верхнего слоя стального листа, в котором промежуточный слой, имеющий хорошую адгезию к слою гальванического покрытия и к слою эмалевого покрытия, представляет собой прослойку между этими двумя слоями. Промежуточный слой предпочтительно представляет собой компонент, выбираемый из группы, включающей: поверхностный слой на слое гальванического покрытия алюминиево-цинковым сплавом, в котором содержание алюминия составляет не менее 96 вес.%; поверхностный слой на упомянутом слое гальванического покрытия алюминиево-цинковым сплавом, который содержит алюминий, никель и не более 1 вес.% цинка; слой покрытия, состоящий по меньшей мере из одного компонента, выбираемого из группы, включающей Ni, Co, Mo, Mn, Ni-P, Ni-Co-P и Со-Р; слой хромата; слой покрытия, состоящий ...

ЛЕГКОПЛАВКАЯ ЭМАЛЬ ДЛЯ АЛЮМИНИЯ

Изобретение относится к силикатным эмалям, предназначенным для эмалирования архитектурно-строительных изделий и бытовой посуды. Эмаль содержит, мас. %: Р2О5 31,93-32, 7; Al2О3 24,17-24,76; В2О3 10,94-11,20; К2О 3,41-3,50; Na2О 21,34-23,21; TiO2 6,34-6,50. Температура обжига эмали 550oС. Интервал обжига 540-570oС. Блеск 65%, термостойкость 20-250-20oС - 2-3 теплосмены. Прочность сцепления 72%. Технический результат изобретения - снижение температуры обжига эмали и повышение срока службы за счет повышения химической стойкости стеклоэмалевого покрытия. 2 табл.

ЭМАЛЬ

Использование: для эмалирования баков стиральных маших и других изделий бытовой техники. Сущность изобретения: эмаль содержит, мас. оксид кремния 38 40 БФ SiO2; оксид алюминия 3 5 БФ Al2O3; оксид бора 16 18 БФ B2O3; оксид натрия 18 20 БФ Na2O; оксид калия 2,1 3,5 БФ K2O; оксид титана 3 5 БФ TiO2; оксид фосфора 1 3 БФ P2O5; оксид циркония 4 6 БФ ZrO2; оксид кальция 3 5 БФ СаО; оксид кобальта 0,3 0,7 БФ Co2O3; оксид магния 0,6 1,5 БФ MgO; оксид лития 1 2 БФ Li2O; оксид цинка 1 4 БФ ZnO. Свойства эмалевого покрытия: температура обжига 750 800°С; прочность на удар 2,5 3,0 Дж; химстойкость обнажение грунтового покрытия после выдержки в растворе NaOH (концентрация 40 г/л) в течение 48 ч при 80°С отсутствует. 2 табл.

ЭМАЛЬ ДЛЯ СТАЛИ

Использование: для эмалирования баков автоматических и полуавтоматических стиральных машин и других изделий электробытового машиностроения. Сущность изобретения: эмаль для стали содержит следующие компоненты, мас.%: оксид кремния 33,0 - 35,0, БФ SiO2 ; оксид меди 1,0 - 2,5, БФ CuO; оксид алюминия 3,0 - 4,5, БФ Al2O3 ; оксид натрия 25,8 - 26,5, БФ Na2O ; оксид бора 20,0 - 21,0, БФ B2O3 ; оксид железа 2,5 - 5,0, БФ Fe2O3 ; оксид титана 1,0 - 3,0, БФ TiO2 ; оксид кобальта 0,25 - 0,5, БФ Co2O3 ; оксид фосфора 1,0 - 1,95, БФ P2O5 ; оксид никеля 0,5 - 1,2, БФ NiO; оксид марганца 4,0 - 6,0, БФ MnO2 ; оксид олова 0,03 - 0,1, БФ SnO2 . Характеристика эмалевого покрытия: прочность на растяжение 85 - 100 МПа, прочность на сжатие 0,8 - 1,2 ГПа, прочность на изгиб 150 - 190 МПа, после 565 ч наработки на износостойкость покрытие не изменилось. Видимых трещин и отколов на всей поверхности покрытия после испытаний на прочность к знакопеременным нагрузкам после реверсивного режима работы 565 ч не отмечено ...

ЭМАЛЬ

Изобретение относится к составам эмалей. Эмаль содержит, мас.%: SiO45,4-46,0; SbO2,2-2,6; ZnO 3,0-4,0; NaO 0,5-1,5; AlO22,0-24,0; BaO 1,0-1,5; CaO 0,3-0,5; BO6,0-7,5; KO 2,0-2,5; PO0,5-1,0; TiO11,0-12,5; NdO1,0-1,5. Технический результат – повышение химической стойкости эмали. 1 табл.

СТЕКЛЯННЫЕ ФРИТТЫ

... 1. Фритта, содержащая TeO2; и один или более из Bi2O3 и SiO2, при этом данная фритта не содержит целенаправленно добавленного свинца. ! 2. Фритта по п.1, дополнительно содержащая B2O3. ! 3. Фритта по п.2, дополнительно содержащая по меньшей мере один первый оксидный компонент, выбранный из одного или более из следующих: ZnO, Al2О3 и их комбинаций. ! 4. Фритта по п.2 или 3, дополнительно содержащая по меньшей мере один второй оксидный компонент, выбранный из одного или более из следующих: Ag2O, Sb2O3, GeO2, In2O3, Р2O5, V2O5, Nb2O5, Та2O5 и их комбинаций. ! 5. Фритта по п.2, дополнительно содержащая по меньшей мере один оксид щелочного металла, выбранный из одного или более из следующих: Na2O5 Li2O, K2O и их комбинаций. ! 6. Фритта по п.2, дополнительно содержащая по меньшей мере один оксид щелочноземельного металла, выбранный из одного или более из следующих: ВаО, CaO, MgO, SrO и их комбинаций. ! 7. Фритта по п.2, где TeO2 присутствует в количестве в диапазоне от около 0,1 мас.% до около ...

Фритта для защитного покрытия

Фритта для эмалевого покрытия

Способ термообработки глазури

Изобретение может быть использовано в керамической промышленности для производства облицовочных плиток при скоростном обжиге на поточно-конвейерных линиях. Цель - снижение температуры и длительности обжига при одновременном повышении содержания кристаллической фазы. В способе термообработки глазури, содержащей SIO2, AI2O3, FE2O3, CAO, MGO, K2O, NA2O, B2O3и ZNO, включающем нагрев до 800 - 840°С, выдержку при максимальной температуре, охлаждение до температуры 780°С, выдержку при ней в течение 5 - 6 мин и охлаждение до 250°С, глазурь дополнительно содержит P2O5, CAF2при следующем соотношении компонентов, мас.%: SIO240,0 - 43,0 AI2O38,75 - 9,73 FE2O30,48 - 0,67 CAO 16,65 - 19,0 MGO 0,70 - 0,95 K2O 1,45 - 2,40 NA2O 1,58 - 1,98 B2O36,83 - 8,35 ZNO 10,0 - 12,7 P2O50,60 - 0,081 CAF26,5 - 7,23, A НАгРЕВ дО ТЕМпЕРАТуРы 800 - 840°C пРОизВОдяТ B ТЕчЕНиЕ 4 - 6 МиН C ВыдЕРжКОй пРи эТОй ТЕМпЕРАТуРЕ B ТЕчЕНиЕ 4 - 6 МиН, ОХлАждЕНиЕ дО ТЕМпЕРАТуРы 780°C ОСущЕСТВляюТ B ТЕчЕНиЕ 1 - 2 МиН, A ОХлАждЕНиЕ дО ...

Глазурь

Фритта для эмали

Состав для покрытия металлических зубных протезов

Глазурь

BROWN ENAMEL

Способ получения стеклообразного покрытия на керамике

СПОСОБ ПОЛУЧЕНИЯ СТЕКЛООБРАЗНОГО ПОКРЫТИЯ НА КЕРАМИКЕ путем нанесения суспензии; сушки, нагрева, выдержки при максимальной температуре и охлаждения, отличающийся тем, что, с целью получения качественного покрытия состава, мол.%: 62-72; 1-7; ВаО 10-25; SiO 0,2-3; 1-5; 1-7, где R-d-элементы ГГГ периода, сушку покрытия проводят при 170-250С в течение 1-1,5 ч, после чего осуществляют термоудар при 400 С с последующим нагревом покрьгтия до максимальной температуры 600-700 С в течение 1-1,5 ч, а выдержку при этой температуре - в течение 0,5-1 ч, после чего осуществляют термоудар при 200-300 С, а вы (Л держку при этой температуре - 0,5 - 1 ч.

Эмалевый шликер

Изобретение относится к составам шлидеров с применением цветных бесФтори- стыхэмалей для покрытия крупногзбаригных изделий электробытово го машиностроения сложной конфИ урлции при машинном нанесении методом окунании ) на роЬототе/.нически комплекса /1лч улучшения качества покрытия при лмалиро- вании изделий сложной кон Jmrypaumi за счет понь шения par те h темпе i и и рявн( . мер- чости покрытия и обеспечения стабильной кроющей способности, чг.члеиыи шликер содержащий, в маг, ч: Фритту состава в мае .У : Si О; 36 О 40 0. Д|.-(). 1 5 -1.0. К .-О - 172 - 19.0, Ма.О 20.0 21.0 КЧ) 2.5 ( ПО: 3.0 - 6,0, Р:(, 1.5 --1.0: /г О; 2.0 1 0. СаО 1 5 - 4.0. СОД) 0.5 25. Ni/О ; 0 02 0.5 Li.00.5 1.5: MrjO 0.6 3.0 80 100 глину 5 - 6 хлористый калии 0.05 0 15 песок молотый 0.5 2 плавиком in пит 01 2. окись меди 0 ()5 2. 0.1 И воду 35 50.Крокицач способное ь шликера 6 - 7 г/дм, растекаемо ль 47 49 мм. ter-i- перагура нлпрлвл1 ни« 750 М Н; ( равно мерность покрытия С1 0° 0 12 мм 1аЬл 0 t ...

Фритта для керамических красок

Изобретение относится к составам фритт, используемых для получения керамических красок. Целью изобретения является повышение коэффициента интегрального светопоглощения красок. Для этого фритта содержит, мас. % : B2O36-12 P2O516-30 ZNO 30-50 NA2O 5-9 SIO22-6 AL2O34-10 TIO21-3 ZRO21-5 CDO 1-3 BAO 0,1-2 SNO20,1-2. Интегральное светопоглощение красок для синего цвета составляет 47,8-49,3%, для красного цвета - 37,8-40,1%. 2 табл.

Глазурь

Безгрунтовая эмаль

Изобретение относитс  к силикатным безгрунтовым бесфтористым эмал м и может быть использовано дл  покрыти  частей электробытовых приборов и машин из тонколистовой углеродистой стали. С целью повьш1ени  растекаемо- сти, щелочестойкости и блеска безгрун това  эмаль содержит, мас.%: SiO i35-45; , 1,5-8,0; , 12-19; -NaiO 14-21; 1,5-4,0; ,0-6,0; 1,0-4,0; ZrO,i 1,0-4,0; CaO 1,0- 4,0; , 0,5-2,0; , 0,02-0,5; LijO 0,1-2,0; MgO 0,6-3,5, причем отношение : ZrOz 1,0-2,0. Растекаемость змали 51-53 мм, блеск 65-67%, щелочестойкость (4 ч кип чени  в 10%-ном NaOH) 0,15-0,17 мг/см, прочность на удар 0,12-0,15 кгм. 2 табл. (Л The invention relates to silicate-free ground free enamel enamel and can be used to coat parts of household appliances and machines of thin-sheet carbon steel. In order to improve the flowability, alkali resistance and gloss, the straight enamel contains, wt%: SiO i35-45; , 1.5-8.0; , 12-19; -NaiO 14-21; 1.5-4.0; , 0-6,0; 1.0-4.0; ZrO, i 1.0-4.0; CaO 1.0-4.0; , 0.5-2.0; , 0.02-0.5; LijO 0.1-2.0; MgO 0.6-3.5, and the ratio: ZrOz 1.0-2.0. The flowability of the bloom is 51–53 mm, the gloss is 65–67%, the alkali resistance (4 h of boiling in 10% NaOH) is 0.15–0.17 mg / cm, and the impact strength is 0.12– 0.15 kgm. 2 tab. (L

Verfahren zum Emaillieren eines Gegenstandes, und plattenförmiger emaillierter Gegenstand

Glaszusammensetzung, Zusammensetzung für eine elektrische Leitpaste, welche dieseenthält, Elektrodenverdrahtungselement und elektronisches Bauteil

Eine Glaszusammensetzung nach der vorliegenden Erfindung umfasst: Phosphor, Vanadium und zumindest ein Übergangsmetall, das ausgewählt ist aus einer Gruppe, bestehend aus Wolfram, Eisen und Mangan, wobei die Glaszusammensetzung keine in den JIG Level A und B Listen enthaltenen Substanzen enthält und ein Erweichungspunkt der Glaszusammensetzung bei 550°C oder weniger liegt.

Glaskeramik mit ionenleitender Restglasphase und Verfahren zu ihrer Herstellung

Die Erfindung betrifft eine Lithiumionen-leitende Glaskeramik, die eine Restglasphase aufweist, die ebenfalls ionenleitend ist, ein Verfahren zu ihrer Herstellung sowie ihre Verwendung in einer Batterie. Die erfindungsgemäße Glaskeramik weist eine Hauptkristallphase auf, die isostrukturell zur NaSICon Kristallphase ist und deren Zusammensetzung sich mit folgender Formel beschreiben lässt:wobei x größer 0 ist und maximal 1, sowie größer als y. Y kann Werte zwischen 0 und 1 annehmen. Dabei gilt die Randbedingung, dass (1 + x - y) > 1 ist.M steht dabei für ein Kation der Wertigkeit +3, +4 oder +5. Mist ausgewählt aus AI, Y, Sc oder B, wobei mindestens Al als dreiwertiges Kation vorhanden ist. Unabhängig davon ist Mausgewählt aus Ti, Si oder Zr, wobei mindestens Ti als vierwertiges Kation vorhanden ist. Unabhängig davon ist Mausgewählt aus Nb, Ta oder La.

Bioactive glass

LOW TEMPERATURE GLASS COMPOSITION,PASTE AND METHOD OF USE.

A stable Tl2O3, V2O5, P2O5 glass composition for a die attach paste requiring no resin and having a glassy edge temperature of below about 350 DEG C.

Bioactive Glass coatings

Method of forming glass coatings and glass coated products

Improved porcelain enamelling frits

... 847,225. Enamels. MINNESOTA MINING & MANUFACTURING CO. Nov. 7, 1956 [Nov. 7, 1955], No1 34013/56. Class 56. An enamel particularly for aluminium arid aluminium alloys comprises (all in mols per cent except where stated) :- SiO 2 25-50; TiO 2 10-25; (SiO 2 + TiO 2 40-60); at least one TiO 2 - dissolving oxide selected from CdO, ZnO, BaO, SrO, CaO and MgO, the selection including CdO, ZnO or BaO, the maximum of any one being 10 and the total being between 3 and 15; di 2 O 5-15; K 2 O 2-13; Na 2 O 15-25; (Li 2 O + K 2 O + Na 2 O 25-40); B 2 O 3' 0.5-8; and P 2 O 5 0-5 with B 2 O 3 + P 2 O 5 being 1-12. The above total at least 90 mol per cent, with the following provisions:- SiO 2 : TiO 2 from 1À4 to 5; TiO 2 : TiO 2 -dissolvong oxide at least 1; and TiO 2 + TiO 2 -dissolving oxide less than the SiO 2 content. F 2 up to 5 mol per cent (NaF up to 10) may be present; also up to a total of 5 mol per cent of adherence-promoting oxides selected from CuO, NiO, CoO, PbO, Bi 2 O 3 and Sb 2 O 3 (but ...

ZUSAMMENSTZUNG AND PROCEDURES FOR THE PRODUCTION OF METALLIC EFFECTS IN CERAMIC BRICKS AND YOUR USE

ONCE BURNING CERAMIC PRODUCT AND PROCEDURE FOR ITS PRODUCTION

Emailfritte and procedure for their production

Weißemail for steel sheet with low titanium dioxide content

Eisenhaltige Emailfritte

SILVER-CONTAINING BIO GLASS COMPOSITIONS, THE OF SOL-GEL CONDITIONS DERIVED

ENAMELLING OF STEEL WITH A ZINKODER ZINC ALLOY PRE-COATING

Procedure for the two-layer enamelling in a fire

SANITARY WARE

IRON-CONTAINING PORCELAIN ENAMELS FOR SELF-CLEANING COOKING OVEN

COATING TO PREVENT THE OXIDATION OF ELECTRODES DURING ELECTRIC FURNACE STEEL MAKING

VERRES BIOACTIFS DOPES EN STRONTIUM

Verres bioactifs comprenant du, ou dopés en strontium, un procédé pour leur préparation et leur utilisation dans des procédés de réparation ou de reconstruction des os.

INTEGRATED PORCELAIN SYSTEM FOR A DENTAL PROSTHESIS

An integrated dental porcelain system for making dental prostheses and restorations is provided. The system includes three universal major components: a) opaque porcelain composition; b) pressable dentin ingot; and c) veneering porcelain composition that can be used interchangeably for making restorations. Techniques for making the prostheses and restorations include porcelain fused-to-metal (PFM), press-to-metal (PTM), and either pressed and/or machined all-ceramic methods. The system uses both a hand-layering of veneering porcelain (PFM technique) and a hot-pressing process (PTM and all-ceramic technique) to fabricate the prostheses and restorations.

LITHIUM SILICATE GLASS CERAMIC AND GLASS WITH RUBIDIUM OXIDE CONTENT

The invention relates to the use of lithium-silicate glass ceramics and glasses containing rubidium oxide for coating an oxide ceramic, a metal or an alloy.

Article conducteur muni d'un revêtement isolant

Schmelzbares anorganisches Material, Verfahren zu dessen Herstellung sowie dessen Verwendung

Verfahren zur Herstellung von Emailüberzügen auf dickwandigen eisernen Gegenständen, Titanpuderemail zur Durchführung dieses Verfahrens und danach hergestellter Gegenstand

Verfahren zum Herstellen von gebrannten, zinkhaltigen Überzügen auf keramischen oder metallischen Formkörpern

COMPOSITION FARFROVOI ENAMEL AND MADE FROM SAID COATING

Lead-free glass material for use in sealing and, sealed article and method for sealing using the same

Cooker and method of manufactruing and controlling the same

Plasma display panel and manufacturing method therefor

Sealed structure, multi-layer heat-insulating glass and glass container

Boron- titanium white enamel - for steel sheet

PHOSPHATE GLASS OF SYSTEM AL2O3-SIO2-P2O5, PROCESS AND MIXTURE FOR SA PREPARATION AND USE OF GLASS AND THE MIXTURE

PROCEDE DE REALISATION D'UN REVETEMENT CERAMIQUE A DEUX COUCHES

L'invention concerne un procédé pour réaliser un revêtement céramique à deux couches. Il est caractérisé en ce que successivement l'on applique sur le substrat une première couche d'une poudre sensiblement sèche et présentant une composition prédéterminée apte à former un verre adhérent audit substrat, puis l'on dépose sur ladite première couche une deuxième couche d'une poudre également sensiblement sèche et présentant une composition prédéterminée et n'adhérent pas au substrat, on fritte lesdites couches de sorte à provoquer tout d'abord la fusion et la stabilisation de ladite première couche et celà à une température inférieure à la température de fusion et de stabilisation de ladite deuxième couche, puis l'on fond et stabilise ladite deuxième couche et enfin l'on refroidit l'ensemble de sorte à former un revêtement à deux couches cohérent et adhérent audit substrat. L'invention est mise en oeuvre notamment dans les fours autonettoyants et le sanitaire.

PROCEDE DE FABRICATION D'UN REVETEMENT EMAILLE OU VERNISSE ET OBJETS AINSI REVETUS

Procédé de fabrication d'un revêtement résistant à l'abrasion et aux acides, émaillé ou vernissé. On agglomère par frittage entre 800 degrés C et 1 000 degrés C un mélange d'oxydes métalliques et notamment d'aluminium; cette masse solidifiée est moulue, mélangée dans une proportion allant jusqu'à 50 % avec les constituants habituels des pâtes d'émaillage et de vernissage et avec les ajouts appropriés et on recouvre avec de la poudre obtenue les surfaces 4 du support 5 en métal ou en céramique à revêtir pour obtenir un émaillage 7 ou un vernissage dont les particules 8 d'oxyde d'aluminium qui font saillie assurent la protection contre l'abrasion. Revêtement d'objets divers en céramique ou en métal tels qu'ustensiles de cuisine, revêtements muraux, baignoires, éviers, paillasses, plaques de fourneau, etc., ou outils tels que limes ou meules dont l'usage se trouve ainsi prolongé ...

Process for protection against the oxidation of a porous material containing of carbon, and matériauobtenu

Le matériau est imprégné par une solution aqueuse contenant les précurseurs d'une base verrière phosphate modifiée au moins par la présence d'oxyde de zinc, puis séché et soumis à un traitement thermique pour former un revêtement interne de protection contre l'oxydation constitué par la base verrière phosphate modifiée. Les précurseurs sont introduits dans la solution aqueuse de manière à permettre la formation d'une base verrière dans laquelle le rapport molaire entre oxydes modificateurs de verre, comprenant de l'oxyde de zinc et oxydes formateurs de verre, comprenant principalement ou seulement l'anhydride phosphorique, est suffisamment élevé, notamment au moins égal à 0,6, de préférence 0,9, pour conférer à la base verrière phosphate une résistance à la corrosion par l'humidité, et la solution est réalisée en dissolvant d'abord dans l'eau un polyphosphate tel le métaphosphate ou trimétaphosphate de sodium capable de permettre la mise en solution ultérieure, par complexation, de façon ...

Enamel powder - for aluminium based on silicates contg 1-15% wt vanadium pentoxide

Enamel powder - for aluminium, based on silicates contg 1-15% wt tin dioxide

전극 형성 방법, 이로부터 제조된 전극 및 태양 전지

... 도전성 분말, 은(Ag) 및 인(P)을 포함하지 않는 제1 유리 프릿 및 유기 비히클을 포함하는 제1 전극 형성용 조성물을 도포하여 핑거 전극의 패턴을 형성하고, 도전성 분말, 은(Ag) 및 인(P)을 포함하는 제2 유리 프릿 및 유기 비히클을 포함하는 제2 전극 형성용 조성물을 도포하여 버스 전극의 패턴을 형성한 후, 소성하는 공정을 포함하는 전극 형성 방법을 제공한다.

n-TYPE DIFFUSION LAYER FORMING COMPOSITION, METHOD OF PRODUCING n-TYPE DIFFUSION LAYER, AND METHOD OF PRODUCING SOLAR CELL ELEMENT

유리 프릿 항균 코팅

... 제품은 기판상에 유리층을 갖는다. 상기 유리층은 금속 또는 금속 합금을 통하여 항균 특성을 갖는다. 상기 유리층은 스크린 프린팅에 의해 증착될 수 있는 도핑된 유리 프릿을 사용하여 만들어진다. 상기 유리층 및 기판의 CTE는 일치될 수 있다.

SOLAR CELL AND PASTE MATERIAL USING SAME

vidro para camada de difusão em elemento de led orgânico, e elemento de led orgânico usando o mesmo.

Composition for forming p-type diffusion layer, method for forming p-type diffusion layer, and method for producing photovoltaic cell element

The composition for forming a p-type diffusion layer contains an acceptor element-containing glass powder which has softening temperature of from 300 DEG C to 950 DEG C and a dispersion medium. A p-type diffusion layer and a photovoltaic cell element having a p-type diffusion layer are prepared by applying the composition for forming a p-type diffusion layer, followed by a thermal diffusion treatment.

BIOACTIVE GLASS

The present invention relates to a bioactive glass comprising strontium and silicon dioxide, processes for the production of the bioactive glass and the use of the bioactive glass in medicine.

METAL-CERAMIC COMPOSITE COATINGS, MATERIALS, METHODS AND PRODUCTS

Metal-ceramic composite coatings provide refractory anti-corrosion flexible enamel coated products. Frit is made of silicon dioxide, sodium or potassium oxide, boron oxide, calcium oxide and zinc oxide, with possible other components. The frit is wet milled with clay and bentonite as a suspending agent, magnesium carbonate and sodium nitrates as electrolyte, boric acid as a buffer, and water. Finely divided aluminum is blended after milling. A substrate is coated with the frit aluminum and clay mixture, which is heated and fused. The metal component coats the substrate and provides galvanic protection. The resulting coating is flexible and deforms with the substrate without delaminating or chipping. The coating is prepared by crushing, sieving, mixing and melting the frit components. The melt is tested by pulling, cooling and feeling a thread. The melt is fritted by pouring into water. The frit is dried, ground and sieved, and then wet milled with water, clay, bentonite and pH adjustors ...

Coating to prevent the oxidation of electrodes during electric furnace steel making

A coating is provided which substantially lengthens the life of carbon and graphite electrodes used in electrical arc processes for the manufacture of ferrous metals. The coating forms a silica-phosphorus glass upon the electrodes.

PORCELAIN ENAMEL COMPOSITIONS AND COATINGS MADE THEREFROM

A porcelain enamel composition may includes a glass component including: at least one alkali oxide in an amount ranging from about 6 to 21 wt %, SiOin an amount ranging from about 20 to 50 wt %, ZnO in an amount ranging from about 0.1 to 10 wt %, AIOin an amount ranging from about 5 to 20 wt %, BOin an amount ranging from about 0.1 to 20 wt %, and POin an amount ranging from about 5 to 30 wt %, all weight percentages expressed relative to the enamel composition. Methods of using such compositions and formed products are also described. 1. A porcelain enamel composition , comprising: at least one alkali oxide in an amount ranging from about 6 to 21 wt %,', {'sub': '2', 'SiOin an amount ranging from about 20 to 50 wt %,'}, 'ZnO in an amount ranging from about 0.1 to 10 wt %,', {'sub': 2', '3, 'AlOin an amount ranging from about 5 to 20 wt %,'}, {'sub': 2', '3, 'BOin an amount ranging from about 0.1 to 20 wt %, and'}, {'sub': 2', '5, 'POin an amount ranging from about 5 to 30 wt %,'}, 'all weight percentages expressed relative to the enamel composition., 'a glass component including2. The porcelain enamel composition of claim 1 , wherein the at least one alkali oxide comprises NaO in an amount ranging from 5-20 wt % and KO in an amount ranging from about 1 to 15 wt %.3. The porcelain enamel composition of claim 2 , further comprising LiO in an amount ranging from about 0 to 7 wt %.4. The porcelain enamel composition of claim 1 , further comprising F in an amount ranging from about 0 to 10 wt %.5. The porcelain enamel composition of claim 1 , further comprising at least one of MnO claim 1 , CoO claim 1 , NiO claim 1 , FeOand CuO.6. The porcelain enamel composition of claim 5 , wherein MnO is present in an amount ranging from about 0 to 5 wt % claim 5 , CoO is present in an amount ranging from about 0 to 8 wt % claim 5 , NiO is present in an amount ranging from about 0 to 5 wt % claim 5 , FeOis present in an amount ranging from about 0 to 8 wt % claim 5 , and CuO is ...

Lead-free glass material for use in sealing and, sealed article and method for sealing using the same

A lead-free glass material for use in sealing, which has a glass composition being free of lead and exhibits high performance in the range of choices for the material to be sealed, the sealing processability, the sealing quality and the like, has a glass composition including four types of metal oxides of V2O5, ZnO, BaO and P2O5 as essential ingredients.

MULTIPHASE COMPOSITIONS FOR OXIDATION PROTECTION OF COMPOSITE ARTICLES

The present disclosure includes carbon-carbon composite articles having multiphase glass oxidation protection coatings for limiting thermal and/or catalytic oxidation reactions and methods for applying multiphase glass oxidation protection coatings to carbon-carbon composite articles.

Glass frit bond and process therefor

A lead-containing glass material of the type suitable for use in a wafer bonding process, wherein the moisture resistance of the glass material is increased by the presence of a lead phosphate coating on an outer exposed surface of the material, thereby acting as a barrier to reaction of moisture with the lead of the glass material. A source of reactive phosphate ions is applied to the glass material so as to spontaneously form the desired lead phosphate coating.

Phosphate sealing frits with improved H2O durability

Glass frit compositions, calculated in mole percent on an oxide basis, consisting essentially of 24.5 to 29.0% P2O5; 1.0 to 5.0% B2O3; 1.0 to 2.0% Al2O3; and sufficient amounts of SnO and ZnO (51.5 to 66.5% SnO, and 5.0-12.0% ZnO), wherein the molar ratio of SnO:ZnO is in the range of about 5.0:1 to 12:1, and 0.0 to 2.0% SiO2. The glass compositions exhibit, under NMR spectroscopic analysis of 11B nuclei, a signal containing at least two peaks at a chemical shift in the range of approximately -18 to -25 ppm. The frit compositions exhibit long term stability, durability, and resistance to attack against moisture in high temperature and humidity conditions and are capable of attaching optical fiber Bragg gratings without the use of a hermetic chamber and the like. An optoelectronic device that employs a sealing material that comprises a frit made from the glass compositions.

COATING COMPOSITION AND COOKING APPLIANCE

A coating composition may include a glass frit including Phosphorus Oxide (PO), Silicon Oxide (SiO), Boron Oxide (BO), a group I-based metal oxide, Barium Oxide (BaO), Sodium Fluoride (NaF), Titanium Oxide (TiO2), Stannous Oxide (SnO), Zinc Oxide (ZnO), and an adhesion enhancement component. The POmay be included by about 40 wt % to about 55 wt % based on a total weight of the glass frit. The SiOmay be included by about 5 wt % to about 15 wt % based on the total weight of the glass frit. The BOmay be included by about 5 wt % to about 10 wt % based on the total weight of the glass frit. The group I-based metal oxide may be included by about 3 wt % to about 10 wt % based on the total weight of the glass frit. The ZnO may be included by about 10 wt % to about 25 wt % based on the total weight of the glass frit, and the TiOmay be included by about 0.1 wt % to about 5 wt % based on the total weight of the glass frit. 1. A coating composition , comprising:{'sub': 2', '5', '2', '2', '3', '2', '5', '2', '2', '3', '2, 'a glass frit including Phosphorus Pentoxide (PO), Silicon Dioxide (SiO), Boron Oxide (BO), a group I-based metal oxide, Barium Oxide (BaO), Sodium Fluoride (NaF), Titanium Oxide (TiO2), Stannous Oxide (SnO), Zinc Oxide (ZnO), and an adhesion enhancement component, wherein the POis included by about 40 wt % to about 55 wt % based on a total weight of the glass frit, wherein the SiOis included by about 5 wt % to about 15 wt % based on the total weight of the glass frit, wherein the BOis included by about 5 wt % to about 10 wt % based on the total weight of the glass frit, wherein the group I-based metal oxide is included by about 3 wt % to about 10 wt % based on the total weight of the glass frit, wherein the ZnO is included by about 10 wt % to about 25 wt % based on the total weight of the glass frit, and wherein the TiOis included by about 0.1 wt % to about 5 wt % based on the total weight of the glass fit.'}2. The coating composition of claim 1 , wherein the ...

SUPER-WEAR-RESISTANT DIAMOND GLAZE, CERAMIC TILE AND PREPARATION METHOD THEREOF

The invention relates to the field of building ceramic materials, and specifically discloses a soft light super-wear-resistant diamond glaze, a ceramic tile and a preparation method thereof. The main raw materials of the super-wear-resistant diamond glaze in parts by weight are as follows: 30-70 parts of a frit, 20-55 parts of an aggregate, 0.1-6 parts of an additive, 30-50 parts of water; the frit contains Al2O3≤10%, Na2O+K2O≤3%. Correspondingly, the present invention also discloses a super-wear-resistant diamond glazed ceramic tile and a preparation method thereof. The diamond glaze disclosed in present invention has the characteristics of excellent transparency, good wear resistance and stain resistance and almost has no air bubbles.

Low-smelting, lead-free ceramic glaze frits, and process for making them

Disclosed are various ceramic frits which have a unique combination of low solubility, low-melting temperature, and freedom from lead oxide. They are formed from selected compositions in the alkali-ZnO-Al2O3-B2O3-P2O5-SiO2-TiO2-F system.

HIGH STABILITY TRANSITION METAL NZP TYPE PHOSPHATES

Transition metal NZP type compounds are synthesized. Examples of these compounds include MnZr4(PO4)6, FeZr4(PO4)6, CoZr4(PO4)6, NiZr4(PO4)6, and CuZr4(PO4)6. These compounds are synthesized by the Xerogel process. These transition metal NZP type compounds can be used as colorants in applications such as ceramic glazes where high thermal stability of the colorant is important.

Vitreous ceramic composition with high crystallization speed for glazing ceramic pieces and in particular tiles

ガラス積層体、支持体付き表示装置用パネル、表示装置用パネル、表示装置、およびこれらの製造方法

БЕЛОЕ СТЕКЛОЭМАЛЕВОЕ ПОКРЫТИЕ ДЛЯ СТАЛИ

Изобретение относится к составам белых покровных стеклоэмалевых защитных покрытий для сталей. Технический результат – повышение показателя белизны и качества защитных покрытий, снижение температуры обжига эмалей. Эмаль имеет следующий состав, мас.%: SiO41,19-41,22; AlO4,53-5,72; ВO15,82-16,22; СаО 0,12-0,15; MgO 1,48-1,92; ТiO15,81-15,98; NaO 12,30-13,50; LiO 0,20-0,22; РО3,93-4,0; KO 2,48-2,63; МoО0,36-0,40; F2,36 (сверх 100%). 3 пр.

ФРИТТА ГРУНТОВОЙ ЭМАЛИ ДЛЯ СТАЛИ

Сущность изобретения: фритта грунтовой эмали для стали содержит, мас.%: оксид кремния SiO2; оксид алюминия 4 - 6 Al2O3; оксид бора B2O3; оксид натрия Na2O; оксид титана TiO2; оксид фосфора P2O5;оксид железа Fe2O3; оксид кобальта Co2O3; оксид марганца MnO2; оксид никеля Ni2O3, причем отношение Co2O3 и Ni2O3 равно 1,77 - 2,0. Характеристика грунтового эмалевого покрытия: интервал обжига 320 - 330°С, прочность на удар 11,76 - 14,99 кгм/Дж. 2 табл.

ФРИТТА ДЛЯ ГЛАЗУРИ

Изобретение относится к составам фритт для глазурей, применяемым в производстве облицовочной и фасадной керамики. Сущность изобретения: фритта содержит, мас.%: оксид алюминия 4,5 - 6.5 БФ Al2O3; ; оксид бора 21 - 22 БФ B2O3; оксид калия 0.1 - 0.2 БФ K2O ; оксид натрия 6.0 - 8.0 БФ Na2O ; оксид кальция 4,0 - 6,0 БФ CaO; оксид магния 0,6 - 0,8 БФ MgO; оксид фосфора 3 - 4 БФ P2O5; ; оксид железа (III) 8 - 10 БФ Fe2O3; ; оксид бария 4 - 5 БФ BaO; оксид кремния остальное БФ SiO2 . Характеристики фритты: коэффициент линейного термического расширения (63,18 - 74,40)·10-7 град-1 , фритта позволяет получать насыщенные цвета: мокрый асфальт, темно-коричневый. 1 табл.

ЭМАЛЬ

Сущность изобретения: содержит следующие компоненты, мас. % : оксид кремния 20,2 - 27,4; оксид алюминия 1,0 - 3,2; оксид бора 14,0 - 18,0; оксид фосфора 2,5 - 6,9; оксид натрия 6,0 - 9,0; оксид титана 1,5 - 4,0; оксид железа 2,5 - 5,0; оксид хрома 2,3 - 4,1; оксид цинка 6,8 - 12,0; оксид молибдена 0,1 - 1,0; α - воллостанит 10,3 - 14,2; оксид калия 9,0 - 11,0. Характеристика эмали: температура варки 1100 - 1200С, время варки 40 - 45 мин, интервал обжига 670 - 715С, цвет - коричневый. 2 табл.

СТЕКЛЯННЫЕ ФРИТТЫ

Изобретение относится к стеклянным фриттам, проводящим пастам, содержащим фритту, и изделиям, на которые нанесены такие проводящие пасты. Техническим результатом изобретения является снижение температуры обжига фритты. Фритта для проводящей пасты для применения в просветляющем покрытии на полупроводнике для использования в качестве фотогальванического элемента содержит: ТеО, ВО, BiOи SiO. При этом данная фритта не содержит целенаправленно добавленного свинца, так что при обжиге, фритта проникает через просветляющий слой, позволяя тем самым формировать омический контакт между проводящей пастой и полупроводником. 3 н. и 11 з.п. ф-лы, 1 пр., 1 табл.

БЕЛОЕ СТЕКЛОЭМАЛЕВОЕ ПОКРЫТИЕ ДЛЯ СТАЛИ

ФРИТТА ДЛЯ ОДНОСЛОЙНОГО ЭМАЛЕВОГО ПОКРЫТИЯ

Фритта для однослойного эмалевого покрытия, включающая SiO2, Аl2 O3, В2O3, TiO2, Na2O, P2O5, Fе2O3, МnO2, NiO, отличающаяся тем, что дополнительно содержит СаО, К2О, Li2O, СаF2, при следующем соотношении компонентов, мас.%: SiO2 30,0-31,2 Аl2O3 2,8-3,2 В2O3 14,0-15,0 СаО 0,5-0,6 ТiO2 16,2-17,2 Р2O5 1,5-1,9 Na2O 17,0-17, 4 LiO2 8,0-8,8 К2О 6,0-8,0 МnO2 0,03-0,07 NiO 0,07-0,09 Fe2О3 0,06-0, 08 ...

Эмалевое покрытие

Изобретение относится к химическим составам эмалевых стекол и покрытий на их основе, предназначенных для эмалирования стальной посуды. газовых плит и колокон, санитарно- технических, архитектурно-строительных и др. видов изделий. С целью расширения интервала обжига, повышения белизны и блеска и улучшения оптической плотности, эмалевое покрытие содержит, мас.%: SiO- 41,4-45,5; Tic, 17,3-20,0; 16,5-17,5; AlaOs 2,0-2,9; 0,1-1,6; Na,0 15,3-16,7; MgO 1,0-2,0; PjOy 1,0- 3,0. Интервал обжига бесфтористого титанового покрытия составляет 100- , оптимальная температура обжига 800-840 с, коэффициент зеркального отражения 69-70%, коэффициент диффузного отражения 94,0-94,5%, чистота цвета за красным светофильтром 0,05-0,07 отн.ед, серым 0,05- 0,06, зеленым 0,06-0,07, синим 0,06- 0,08. 2 табл. i (Л ...

Эмаль

Изобретение относится к составам беспигментных цветных стеклоэмалей розовато-фиолетового цвета и может быть использовано для получения антикоррозионных силикатных покрытий на изделиях хозяйственно-бытового назначения и газовой аппаратуры. С целью повьппения блеска, снижения температуры варки и достижения устойчивой розовато-фиолетовой окраски содержит, мас.%: SiOa 27,7-33,0; AljOj 0,1- 10,0; BjOj 16,5-19,1; CaO 3,2-6,5; MgO 1,3-3,5; NagO 15,7-19,0; МпОг 1,6-3,5; PjOj. 5,0-6,7; TiOg 5,7-9,2; ZnO 3,8-5,7; CdO 0,7-2,5. Температура варки 1250 C; цвет розовато-фиолетовый; интервал наплавления 780- плавкость при 37,5- 39,0 мм и при 820°С 42-45, КЛТР ...

Глазурь

Грунтовая эмаль

Изобретение относится к составам легкоплавких безмарганцевых бесфтористых эмалей, рекомендуемых для эмалирования стальных изделий электробытового назначения и газовой аппаратуры . Цель - защита окружающей среды за счет исключения оксида марганца . Грунтовая эмаль имеет следующее соотношение компонентов, мас.%: SiOj 36,0-41,0; ,6,0-10,0; Na/) 21,0-22,5; 10,0-12,0; СаО 4,0- 7,0; TiOj 1,5-2,5; NiO 1,0-1,5; Fe 3,0-4,0; Р,05 5,0-8,0; ZrO 2,0-3,0. Растекаемость эмали 41-44 мм, прочность на удар 0,14-0,17 кгм. 2 табл.

ENAMEL COMPOSITION

DIELECTRIC COATING FOR LOW-CARBON STEELS

Эмаль

Изобретение относится к составам безгрунтовых эмалей, предназначенных для эмалирования металлических изделий, эксплуатируемых в щелочных средах, и может быть использовано на машиностроительных и приборостроительных заводах. С целью повышения растекаемости и щелочестойкости эмаль содержит, мас.%: SIO234,5-36,5, NA2O 16,7-20,5, B2O318,3-20,0, P2O57,4-9,7, CAO 0,5-6,9, ZRO24,0-5,0, FE2O33,1-3,5, CIO 0,5-1,0, NIO 1,0-2,0, MPO22,5-3,0, CO2O30,4-0,6, NA2SO41,0-1,2. Эмаль характеризуется следующими свойствами: температура варки 1100-1230°с, температура начала размягчения 480-495°с, растекаемость при 830°с 48-50 мм, температура обжига покрытия 800-830°с, щелочестойкость (потеря массы после 4 ч кипения в 10%-ном растворе NAOH) 0,10-0,11 мг/см3. 2 табл.

Эмалевый шликер

Изобретение относится к составам шликеров для получения однослойных стеклоэмалевых покрытий и может быть использовано при эмалировании изделий электробытового машиностроения, газовой аппаратуры. С целью повышения щелочестойкости и механической прочности эмалевого покрытия, а также снижения вероятности образования дефекта "рыбья чешуя" шликер включает, мас.ч.: фритту 100 (содержащую, мас.%: SIO235-39, P2O50,5-2,5, TIO20,5-4, AL2O31-3, B2O317-22, ZRO21-4, CAO 1,5-0,2, NA2O 18-21, K2O 2-4, LI2O 0,5-2, ZNO 0,5-3, CUO 0,3-0,6, MNO20,5-1, CO2O30,8-1,4, FE2O31-5), кварцевый песок 1-3, глину 4-6, хлорид калия 0,01-0,1, плавиковый шпат 0,5-4 и воду 35-45. При этом суммарное содержание кварцевого песка и плавикового шпата составляет 2-6,5 мас.ч. Покрытие на основе эмалевого шликера характеризуется механической прочностью 0,14-0,16 кгм химической стойкостью после кипячения в 1 н растворе NA2CO3в течение 4ч 0,10-0,12 мг/см2 время до появления первого откола при катодном травлении составляет 120-150 ...

Фритта для эмалевых покрытий

Изобретение относится к составам бесфтористых фритт для получения антикоррозионных легкоплавких эмалевых покрытий на деталях электробытового машиностроения из тонколистовой малоуглеродистой стали. С целью повышения степени заглу- шенности фритта для эмалевых покрытий содержит следующие компоненты, мас.%: SiOa 37,,0; 8,0-10,0; В20з 15,0- 16,0; Na20 15,0-16,0; ТЮа 10,0-13,0; Р205 5,0-6,0; ZrOa 1.0-2,0; LizO 0,5-1,0; MgO 1,0-1.7; КаО 1.0-1,2; CaO 0,5-1,5. Фритта может дополнительно содержать, мас.%: Со20з 0,1 -0.8; СиО 0.5-3,0. На основе предложенных фритт можно получать белые хорошо заглушенные стеклоэмалевые покрытия с высокой растекаемостью, а при введении в состав шихты на плавку красящих оксидов СозОз и СиО - цветные покрытия без существенных отличий основных физико- химических свойств. 1 з.п. ф-лы, 3 табл. (Л ...

Фритта для эмалевого покрытия на алюминии

Изобретение относится к составам эмалей для антикоррозионной защиты и декоративной отделки изделий из литых алюминиевых сплавов. С целью получения покрытия на литых изделиях с повышенной термостойкостью и прочностью сцепления фритта для эмалевого покрытия на алюминии содержит, мас.%: P 2O 5 45-65 AL 2O 3 3-6 MGO 3-5 K 2O 4-8 NA 2O 8-12 LI 2O 3-5 ZNO 8-12 SNO 2 0,05-4 B 2O 3 1-3 V 2O 5 0,05-4 CAF 2 0,5-3. Термостойкость покрытия 245-265°С, прочность на удар 0,18-0,30 Дж, растекаемость 28-34,0 мм, прочность сцепления 1,0-1,6 мм (разрушение поверхности). 3 табл.

Glass member provided with sealing material layer, electronic device using it and process for producing the electronic device

The invention provides a glass member provided with a sealing material layer, which suppresses generation of failures such as cracks or breakage of glass substrates or a sealing layer even when the distance between two glass substrates is narrowed, and thereby makes it possible to improve the sealing property between the glass substrates and its reliability. A glass substrate has a surface provided with a sealing region, on which a sealing material layer having a thickness of at most 15 μm is formed. The sealing material layer includes a fired material of a glass material for sealing containing a sealing glass, a laser absorbent and optionally a low-expansion filler, wherein the total content of the laser absorbent and the low-expansion filler being the optional component in the glass material for sealing is within the range of from 2 to 44 vol %.

Glass composition, light source device and illumination device

A glass composition including, in oxide-based mol %: (a) at least 30% and at most 50% P 2 O 5 , (b) at least 10% and at most 50% ZnO, (c) at least 0.1% and at most 10% Al 2 O 3 , (d) at least 0% and at most 50% Li 2 O, (e) at least 0% and at most 50% Na 2 O, (f) at least 0% and at most 50% K 2 O, (g) at least 0% and at most 20% MgO, (h) at least 0% and at most 20% CaO, (i) at least 0% and at most 20% SrO, (j) at least 0% and at most 20% BaO, (k) at least 0% and at most 20% SnO, and (1) at least 0% and at most 5% B 2 O 3 , substantially not comprising ZrO 2 and Ag 2 O, and (a)/(b), the ratio of (a) and (b), being at least 0.2 and at most 2.0.

Phosphor composite member, led device and method for manufacturing phosphor composite member

Provided is a phosphor composite member having excellent thermal resistance, high color rendition, controllability of various chromaticities from a daylight color to a light bulb color, and high luminescence intensity. A phosphor composite member in which a sintered inorganic powder body layer containing a SnO—P 2 O 5 -based glass and an inorganic phosphor powder is formed on a surface of a ceramic base material, wherein upon irradiation with an excitation light, the ceramic base material and the sintered inorganic powder body layer emit different fluorescences having different wavelengths.

ENAMEL COMPOSITION, PREPARATION METHOD THEREOF, AND COOKING APPLIANCE INCLUDING THE SAME

Provided are an enamel composition, a preparation method thereof, and a cooking appliance including the same. The enamel composition includes a glass frit containing PO, SiO, TiO, NaO, and AlO. The glass frit contains about 10 wt % to about 25 wt % of SiO, about 5 wt % to about 20 wt % of TiO, about 5 wt % to about 15 wt % of NaO, and about 9 wt % to about 20 wt % of AlO, and the glass frit has a glass deformation temperature of about 500° C. or more, and a reflectivity of about 70% or more. 1. An enamel composition comprising:{'sub': 2', '5', '2', '2', '2', '2', '3, 'a glass frit containing PO, SiO, TiO, NaO, and AlO,'}{'sub': 2', '2', '2', '2', '3, 'wherein the glass frit contains about 10 wt % to about 25 wt % of SiO, about 5 wt % to about 20 wt % of TiO, about 5 wt % to about 15 wt % of NaO, and about 9 wt % to about 20 wt % of AlO,'}wherein the glass frit has a glass deformation temperature of about 500° C. or more, and a reflectivity of about 70% or more.2. The enamel composition according to claim 1 , wherein the glass frit further comprises one or more compounds selected from the group comprising KO claim 1 , LiO claim 1 , VO claim 1 , ZnO claim 1 , and BaO.3. The enamel composition according to claim 1 , wherein the glass frit contains about 28 wt % to about 32 wt % of PO claim 1 , about 13 wt % to about 16 wt % of SiO claim 1 , about 16 wt % to about 20 wt % of TiO claim 1 , about 9 wt % to about 12 wt % of NaO claim 1 , and about 9 wt % to about 12 wt % of AlO.4. The enamel composition according to claim 3 , wherein the glass frit has a white color.5. The enamel composition according to claim 3 , wherein the glass frit further comprises KO claim 3 , LiO claim 3 , VO claim 3 , ZnO claim 3 , and BaO.6. The enamel composition according to claim 5 , wherein the glass frit contains about 6 wt % to about 8 wt % of KO claim 5 , about 0.1 wt % to about 1 wt % of LiO claim 5 , about 1 wt % to about 3 wt % of VO claim 5 , about 0.5 wt % to about 1.5 wt % of ZnO ...

SEALING GLASS

A sealing glass of the present invention is a sealing glass for vacuum sealing an exhaust opening provided in a metal-made vacuum double container, wherein the sealing glass is used in a metal-made vacuum double container having a structure that the sealing glass is placed in a position excepting a position right over the exhaust opening in a vacuum sealing process, the sealing glass is substantially free of a Pb component, and the sealing glass produces a total amount of gases of 900 to 7000 μL/cmwhen a temperature is raised from 30° C. to 700° C. at 15° C./minute in a vacuum state. 110-. (canceled)11. A method for producing a metal-made vacuum double container , comprising the steps of:preparing a sealing glass with a glass having a glass composition substantially free of a Pb component and being introduced gasses;placing the sealing glass in a position excepting a position right over an exhaust opening of the container; and thenraising a temperature of the sealing glass under a vacuum to soften the sealing glass, thereby the sealing glass flows to arrive at the exhaust opening while producing the gasses, to seal the exhaust opening.12. The method for producing a metal-made vacuum double container according to claim 11 , wherein claim 11 , as a means for introducing the gasses into the glass claim 11 , at least one means claim 11 , selected from (1) a means of introducing the gasses from raw glass material for the glass claim 11 , (2) a means of introducing the gasses during melting of the glass claim 11 , and (3) a method of introducing the gasses during forming of the glass claim 11 , is employed.13. The method for producing a metal-made vacuum double container according to claim 11 , wherein the sealing glass produces the total amount of gases of 900 to 7000 μL/cmwhen the temperature is raised from 30° C. to 700° C. at 15° C./minute in the vacuum.14. The method for producing a metal-made vacuum double container according to claim 11 , wherein the sealing glass ...

LOW SOFTENING POINT GLASS COMPOSITION, BONDING MATERIAL USING SAME ADN ELECTRONIC PARTS

A low softening point glass composition, which is substantially free from lead, bismuth and antimony and comprises oxides of vanadium, phosphorous, tellurium and iron, a softening point of the composition being 380° C. or lower. 1. A low softening point glass composition , which is substantially free from lead , bismuth and antimony , and comprises oxides of vanadium , phosphorous , tellurium , barium , tungsten and/or molybdenum , and iron and/or alkali metal , the softening point of the glass composition being 380° C. or lower.2. The low softening point glass composition according to claim 1 , wherein vanadium claim 1 , phosphorous claim 1 , tellurium claim 1 , barium claim 1 , tungsten claim 1 , molybdenum claim 1 , iron claim 1 , alkali metal are contained in conversion as oxides claim 1 , an amount of VObeing in 40 to 55% by weight claim 1 , POin 5 to 15% by weight claim 1 , TeOin 20 to 30% by weight claim 1 , BaO in 2 to 10% by weight claim 1 , WOin 0 to 15% by weight claim 1 , MoOin 0 to 15% by weight claim 1 , FeOin 0 to 8% by weight claim 1 , R(R; alkali metal) in 0 to 5% by weight claim 1 , a total amount of POand TeObeing 30 to 40% by weight claim 1 , a total amount of WOand MoObeing 5 to 15% by weight claim 1 , and a total amount of FeOand Rbeing 2 to 8% by weight.3. The low softening point glass composition according to claim 1 , wherein the softening point of the glass composition is 360° C. or lower claim 1 , and a thermal expansion coefficient of the glass composition over a temperature range of 25 to 250° C. is 120×10/° C. or lower.4. An electronic part comprising an electronic component having an electrode claim 2 , in contact with the electronic component claim 2 , the electrode comprising metal and glass claim 2 , wherein the glass is the low softening glass composition of .5. The electronic part according to claim 4 , wherein the electronic component is an image display.6. The electronic part according to claim 4 , wherein the electronic ...

DECORATIVE POROUS INORGANIC LAYER COMPATIBLE WITH ION EXCHANGE PROCESSES

Embodiments of methods for forming strengthened glass articles comprise providing an exchangeable glass substrate having a coefficient of thermal expansion (CTE) between about 60×10−7°/C. to about 110×10−7°/C., depositing at least one decorative porous inorganic layer onto at least a portion of the surface of the glass substrate, wherein the decorative porous inorganic layer comprises a glass transition temperature (Tg)≧450° C., a glass softening temperature (Ts)≧650° C., wherein the difference in CTE values between the glass substrate and the decorative porous inorganic layer is within 10×10−7°/C.; and curing the glass substrate and the deposited decorative porous inorganic layer at a temperature greater than the Ts of the decorative porous inorganic layer; and chemically strengthening the cured glass substrate and the decorative porous inorganic layer thereon via ion exchange at a temperature below the Tg of the decorative porous inorganic layer. 1. A method for forming a strengthened glass article , the method comprising:{'sup': −7', '−7, 'providing an ion exchangeable glass substrate having a coefficient of thermal expansion (CTE) ranging between about 60×10/° C. to about 110×10/° C.;'}{'sup': '−7', 'depositing at least one decorative porous inorganic layer onto at least a portion of the surface of the glass substrate, wherein the decorative porous inorganic layer comprises a glass transition temperature (Tg)≧450° C., a glass softening temperature (Ts)≦650° C., wherein the difference in CTE values between the glass substrate and the decorative porous inorganic layer is within 10×10° C.;'}curing the glass substrate and the deposited decorative porous inorganic layer at a temperature greater than the glass softening temperature (Ts) of the decorative porous inorganic layer; andchemically strengthening the cured glass substrate and the decorative porous inorganic layer thereon via ion exchange at a temperature above the glass transition temperature (Tg) of the ...

MULTIPHASE COMPOSITIONS FOR OXIDATION PROTECTION OF COMPOSITE ARTICLES

The present disclosure includes carbon-carbon composite articles having multiphase glass oxidation protection coatings for limiting thermal and/or catalytic oxidation reactions and methods for applying multiphase glass oxidation protection coatings to carbon-carbon composite articles. 1. An article comprising:a carbon-carbon composite structure; and wherein the first glass phase comprises a phosphate glass composition having a first transition temperature,', 'wherein the second glass phase comprises a second transition temperature higher than the first transition temperature, and', 'wherein the second transition temperature is at least 100° C. higher than the first transition temperature., 'a multiphase oxidation protection composition including a first glass phase and a second glass phase on an outer surface of the carbon-carbon composite structure,'}2. The article of claim 1 , wherein the second glass phase comprises a sealing glass.3. The article of wherein the first glass phase is represented by the formula a(A′O)(PO)b(GO)c(A″O):A′ is selected from: lithium, sodium, potassium, rubidium, cesium, and mixtures thereof;{'sub': 'f', 'Gis selected from: boron, silicon, sulfur, germanium, arsenic, antimony, and mixtures thereof;'}A″ is selected from: vanadium, aluminum, tin, titanium, chromium, manganese, iron, cobalt, nickel, copper, mercury, zinc, thulium, lead, zirconium, lanthanum, cerium, praseodymium, neodymium, samarium, europium, gadolinium, terbium, dysprosium, holmium, erbium, thulium, ytterbium, actinium, thorium, uranium, yttrium, gallium, magnesium, calcium, strontium, barium, tin, bismuth, cadmium, and mixtures thereof;a is a number in the range from 1 to about 5;b is a number in the range from 0 to about 10;c is a number in the range from 0 to about 30;x is a number in the range from about 0.050 to about 0.500;{'sub': '1', 'yis a number in the range from about 0.040 to about 0.950;'}{'sub': '2', 'yis a number in the range from 0 to about 0.20; and'}z is ...

GLASS COMPOSITION AND COOKING APPLIANCE

A glass composition includes a glass frit and an electrostatic force reinforcing material including polymethylhydrosiloxane derivatives. The electrostatic force reinforcing material is represented by the following Formula. 2. The glass composition of claim 1 , wherein X is within a range of 50≤X≤120 claim 1 , and Y is within a range of 10≤Y≤50.3. The glass composition of claim 1 , wherein X+Y is within a range of 100≤X+Y≤200.4. The glass composition of claim 1 , further comprising: an additive reacting with the glass frit and the polymethylhydrosiloxane derivatives.5. The glass composition of claim 4 , wherein the additive comprises amino silane.6. The glass composition of claim 5 , wherein the amino silane is included in an amount of 0.05 wt % to 0.1 wt % in the glass composition.7. The glass composition of claim 1 , whereinthe glass frit is included in an amount of 99.6 wt % to 99.85 wt % in the glass composition, andthe electrostatic force reinforcing material is included in an amount of 0.1 wt % to 0.3 wt % in the glass composition.8. The glass composition of claim 1 , wherein the glass frit comprises PO claim 1 , SiO claim 1 , Group I oxide claim 1 , AlO claim 1 , BO claim 1 , or ZrO.10. The glass powder of claim 9 , wherein X is within a range of 50≤X≤120 claim 9 , and Y is within a range of 10≤Y≤50.11. The glass powder of claim 9 , wherein X+Y is within a range of 100≤X+Y≤200.12. The glass powder of claim 9 , further comprising: amino silane reacting with the glass frit powder and the polymethylhydrosiloxane derivatives.13. The glass powder of claim 12 , wherein the amino silane is included in an amount of 0.05 wt % to 0.1 wt % in the glass powder.14. The glass powder of claim 9 , whereinthe glass frit powder is included in an amount of 99.6 wt % to 99.85 wt % in the glass powder, andthe electrostatic force reinforcing material is included in an amount of 0.1 wt % to 0.3 wt % in the glass powder.15. The glass powder of claim 9 , wherein the glass frit powder ...

Grain Boundary Healing Glasses And Their Use In Transparent Enamels, Transparent Colored Enamels And Opaque Enamels

A method of modifying glass frit involves treating the frit with a grain-boundary-healing compound. The method increases transmission and clarity, and reduces haze of a fired enamel coating made from such modified glass frit as compared to a coating not made from such modified glass frit. The grain-boundary-healing compound influences the chemistry at the grain boundaries to prevent haze. The compound burns out to yield a fluxing material that dissolves alkaline carbonates or bicarbonates on the surface of the glass frit. The dissolved species are incorporated into the enamel coating, thereby promoting the fusion of the glass frit and reducing the amount of haze in the enamel coating. The additives also function to prevent the formation of seed crystals on the surface of the glass frit that may inhibit the fusion of the glass frit. 126-. (canceled)27: A method of preparing a treated glass frit comprising:smelting glass-forming raw material to produce a glass batch;quenching the glass batch to produce an amorphous solid;milling the amorphous solid to produce glass frit; andmixing a grain-boundary-healing additive with the glass frit to thereby prepare the treated glass frit, wherein the grain-boundary-healing additive comprises an organometallic compound containing at least one selected from the group consisting of Li, Na, K, Ba, V, Mn, Mo, W, Zn, In, Ga, Al, B, Si, P, Fe, Ta, Sb, Bi, Sn, Ge, Te, Y and As.28: The method of claim 27 , wherein the grain-boundary-healing additive is selected from the group consisting of molybdenum (V) ethoxide claim 27 , molybdenyl triethoxide claim 27 , molybdenyl acetylacetonate claim 27 , tungsten(V) ethoxide claim 27 , tungsten(VI) ethoxide claim 27 , tungsten(VI) isopropoxide claim 27 , trimethylene borate claim 27 , triethyl borate claim 27 , triisopropyl borate claim 27 , trimethyl borate claim 27 , niobium(V) ethoxide claim 27 , niobium(V) isopropoxide claim 27 , niobium(V) n-propoxide claim 27 , niobium(V) n-butoxide claim 27 , ...

Lithium Silicate Diopside Glass Ceramics

Lithium silicate-diopside glass ceramics are described which are characterized by a controllable translucence and can be satisfactorily processed mechanically and therefore can be used in particular as restoration material in dentistry. 1. Lithium silicate-diopside glass ceramic which comprises lithium silicate as main crystal phase and diopside as further crystal phase.2. Glass ceramic according to claim 1 , which comprises 53.0 to 75.0 wt.-% SiO.3. Glass ceramic according to claim 1 , which comprises 10.0 to 23.0 wt.-% LiO.4. Glass ceramic according to claim 1 , which comprises 1.0 to 13.0 wt.-% CaO and/or 1.0 to 12.0 wt.-% MgO.5. Glass ceramic according to claim 4 , wherein the molar ratio of CaO to MgO is 0.5 to 2.0.6. Glass ceramic according to claim 1 , which comprises 0 to 8.0 O.7. Glass ceramic according to claim 1 , which comprises 0 to 10.0 wt.-% further alkali metal oxide MeO claim 1 , wherein MeO is selected from NaO claim 1 , KO claim 1 , RbO and/or CsO.8. (canceled)9. Glass ceramic according to claim 1 , which comprises 0 to 10.0 wt.-% oxide of trivalent elements MeO claim 1 , wherein MeOis selected from AlO claim 1 , BO claim 1 , YO claim 1 , LaO claim 1 , GaOand/or InO.10. (canceled)11. (canceled)12. (canceled)14. (canceled)15. Glass ceramic according to claim 1 , which comprises lithium silicate in the form of lithium disilicate and/or lithium metasilicate.16. (canceled)17. (canceled)18. (canceled)19. Glass ceramic according to claim 1 , which is present in the form of a blank or a dental restoration.20. Starting glass which comprises the components of the glass ceramic according to .21. Starting glass according to claim 20 , which is present in the form of a ground powder or a compact made of ground powder.22. Process for the preparation of the glass ceramic according to claim 1 , wherein{'claim-ref': {'@idref': 'CLM-00020', 'claim 20'}, '(a) the starting glass according to is ground,'}(b) the ground starting glass is optionally pressed to form a ...

Fluorinated Tin-Based Glass Frit And Method For Manufacturing Same

Provided is a super low melting SnO—SnF2—P2O5-based glass frit for which the firing temperature can be set to 200° C. or less and which has high water resistance and transparency. The fluorinated tin-based glass frit includes, in mol %, 30 to 70% of SnF2, 10 to 30% of P2O5, 10 to 40% of SnO, 0.1 to 10% of SnO2, 0 to 5% of In2O3, 0 to 5% of B2O3, and 0 to 5% of SiO2, and has a glass transition point of 160° C. or lower, a softening point of 180° C. or lower, and a maximum particle size of 100 μm or less. The fluorinated tin-based glass frit has a visible light transmission rate of 80% or more at 200° C. and a thickness of 0.6 mm of a fired product thereof, and a rate of volume reduction of the fired product due to soaking in hot water at 85° C. for 24 hours is 2 vol. % or less. 1. A fluorinated tin-based glass frit including , in mol % , 30 to 70% of SnF2 , 10 to 30% of P2O5 , 10 to 40% of SnO , 0.1 to 10% of SnO2 , 0 to 5% of In2O3 , 0 to 5% of B2O3 , and 0 to 5% of SiO2 , and having a glass transition point of 160° C. or lower , a softening point of 180° C. or lower , and a maximum particle size of 100 μm or less , and with which a visible light transmission rate of a fired product obtained at 200° C. is 80% or more at a thickness of 0.6 mm and a rate of volume reduction of the fired product due to soaking in hot water at 85° C. for 24 hours is 2 vol. % or less.2. The fluorinated tin-based glass frit according to claim 1 , including claim 1 , in mol % claim 1 , 40 to 65% of SnF2 claim 1 , 15 to 30% of P2O5 claim 1 , 15 to 40% of SnO claim 1 , 0.1 to 2% of SnO2 claim 1 , 0 to 5% of In2O3 claim 1 , 0 to 5% of B2O3 claim 1 , and 0 to 5% of SiO2.3. A method for manufacturing a fluorinated tin-based glass frit comprising the steps of mixing a glass raw material powder claim 1 , which includes claim 1 , in mol % claim 1 , 30 to 70% of SnF2 claim 1 , 10 to 30% of P2O5 claim 1 , 10 to 40% of SnO claim 1 , 0.1 to 10% of SnO2 claim 1 , 0 to 5% of In2O3 claim 1 , 0 to 5% of ...

HIGH TEMPERATURE OXIDATION PROTECTION FOR COMPOSITES

Systems and methods for forming an oxidation protection system, on a composite structure is provided. In various embodiments, an oxidation protection system disposed on a substrate may comprise a base layer comprising a first pre-slurry composition comprising a first phosphate glass composition and a silica compound, and/or a sealing layer comprising a second pre-slurry composition comprising a second phosphate glass composition. 1. A method for forming an oxidation protection system on a composite structure , comprising:forming a first slurry by combining a first pre-slurry composition with a first carrier fluid, wherein the first pre-slurry composition comprises a first phosphate glass composition and a silica compound;applying the first slurry to the composite structure; andheating the composite structure to a temperature sufficient to form a base layer on the composite structure.2. The method of claim 1 , wherein the silica compound comprises at least one of silica and a silica former.3. The method of claim 1 , wherein the silica compound comprises silica and a silica former.4. The method of claim 3 , wherein the silica former comprises at least one of a metal silicide claim 3 , silicon claim 3 , fumed silica claim 3 , silicon carbide claim 3 , and silicon carbonitride.5. The method of claim 1 , further comprising:forming a second slurry by combining a second pre-slurry composition with a second carrier fluid, wherein the second pre-slurry composition comprises a second phosphate glass composition;applying the second slurry to the composite structure; andheating the composite structure to a temperature sufficient to form a sealing layer on the composite structure.6. The method of claim 5 , wherein the second pre-slurry composition comprises a silica compound claim 5 , wherein the silica compound comprises at least one of silica or a silica former.7. The method of claim 1 , wherein the first pre-slurry composition of the base layer comprises between about 15 ...

Composition for forming n-type diffusion layer, method for producing semiconductor substrate having n-type diffusion layer, and method for producing solar cell element

The invention provides composition for forming an n-type diffusion layer, the composition comprising a compound containing a donor element, a dispersing medium, and an organic filler; a method for producing a semiconductor substrate having an n-type diffusion layer; and a method for producing a photovoltaic cell element.

GLASS MATERIALS FOR LARGE SCALE DYE-SENSITIZED SOLAR CELL SEALING AND PASTES COMPRISING THE SAME

Disclosed is a glass composition for sealing a large-area dye-sensitized solar cell, and more particularly, to a glass composition which may be uniformly bonded to a large-area without reacting with an electrolyte. 1. A glass composition for sealing a dye-sensitized solar cell , comprising:{'sub': 2', '2', '2', '2', '5, '(SiO+NaO+KO)—PO—ZnO based glass,'}{'sub': 2', '2', '2', '2', '5, 'wherein (SiO+NaO+KO) is present in 10 to 25 mol %, POis present in 40 to 60 mol %, and ZnO is present in 5 to 35 mol %,'}{'sub': 2', '5, 'wherein the PO/ZnO has a molar ratio of 1.4 to 1.8, and'}{'sub': 2', '2', '2, 'wherein at least one selected from ZnF, BaFand CaFis included to replace a part or all of ZnO.'}2. The glass composition for sealing a dye-sensitized solar cell according to claim 1 , further comprising:{'sub': 2', '3', '2', '3', '2', '3, 'at least one selected from AlO, BOand SbOin an amount more than 0 mol % and less than or equal to 10 mol %,'}{'sub': 2', '3', '2', '3', '2', '3', '2', '5, 'wherein at least one selected from AlO, BOand SbOreplaces a part or all of ZnO or PO.'}3. The glass composition for sealing a dye-sensitized solar cell according to claim 1 ,wherein the glass composition has a firing temperature of 500° C. or below.4. The glass composition for sealing a dye-sensitized solar cell according to claim 3 ,wherein the glass composition has a firing temperature of at least 400° C.5. A paste for sealing a dye-sensitized solar cell claim 3 , comprising:{'claim-ref': {'@idref': 'CLM-00001', 'claim 1'}, 'the glass composition according to ; and'}an organic vehicle. This application claims priority to Korean Patent Application No. 10-2016-0097354, filed on Jul. 29, 2016, and all the benefits accruing therefrom under 35 U.S.C. §119, the contents of which in its entirety are herein incorporated by reference.The present disclosure relates to a glass composition for sealing a large-area dye-sensitized solar cell, and more particularly, to a composition for ...

DENTAL ENAMEL COMPOSITIONS WITH ANTI-INFLAMMATORY AGENTS FOR ANIMALS

Provided are methods and compositions relating to a dental composition more specifically to prepare the damaged dentin of the tooth for animals and pets such as canine, feline and members of the taxonomic family Equidae prior to repair. The dental compositions include a bioactive glass and a non-aqueous solvent comprising an alcohol, anti-inflammatory and anti-pain reliever.

ELEMENT CONDUCTING SODIUM IONS FOR USE IN ELECTROCHEMICAL CELLS AND METHOD FOR PRODUCING IT

The invention relates to sodium-ion-conducting elements for use in electrochemical cells, more particularly as solid electrolyte/separator in high-temperature batteries. In these elements, a surface of a porous substrate bears a coating which is obtained by sintering at a temperature of not more than 1100° C. and which is formed with the system NaO—SiO—RO—R1O, in which R1=Sc, Y, La and/or B and R2=P, Sb, Bi, Sn, Te, Zn and/or Ge. 1. A sodium-ion-conducting element for use in electrochemical cells , more particularly as solid electrolyte/separator in high-temperature batteries , wherein a surface of a porous substrate bears a coating which is obtained by sintering at a temperature of not more than 1100° C. and which is formed with the system NaO—SiO—RO—R1O , in which R1=Sc , Y , La and/or B and R2=P , Sb , Bi , Sn , Te , Zn and/or Ge.2. The element as claimed in claim 1 , characterized in that the coating has a thickness in the 3 μm to 750 μm range.3. The element as claimed in claim 1 , characterized in that the material of the coating has a coefficient of thermal expansion which is lower claim 1 , preferably lower by not more than 1.5 ppm/K claim 1 , than the coefficient of thermal expansion of the substrate material.4. The element as claimed in claim 1 , characterized in that the substrate is an element in the shape of a plate claim 1 , honeycomb claim 1 , or tube which is open at one side.5. The element as claimed in claim 1 , characterized in that the substrate is formed of AlO claim 1 , mullite claim 1 , spinel claim 1 , fosterite claim 1 , ZrO claim 1 , a silicatic ceramic material claim 1 , an electrically conducting ceramic material claim 1 , or a metal or a metal alloy.6. The element as claimed in claim 1 , characterized in that electrically conducting ceramic substrate material consists of Nb-doped TiO claim 1 , CaLaTiOor SrYTiOor of a mixture of these components with AlO claim 1 , mullite claim 1 , spinel claim 1 , fosterite claim 1 , ZrOor a silicatic ...

Glass frit

A glass frit having a low melting point containing (A) Ag 2 O, (B) V 2 O 5 , and (C) at least one first oxide selected from the group consisting of MoO 3 , ZnO, CuO, TiO 2 , Bi 2 O 3 , MnO 2 , MgO, Nb 2 O 5 , BaO and P 2 O 5 . The glass frit preferably contains 40 to 70% by mass of (A), 10 to 40% by mass of (B), and 0.5 to 30% by mass of (C) with respect to the total mass in terms of oxides. Furthermore, the glass frit preferably has a mass ratio (Ag 2 O/V 2 O 5 ) of (A) to (B) of 1.8 to 3.2.

GLASS ELEMENT COMPRISING ENAMEL COATING AND USE THEREOF, COATING AGENT FOR MAKING SAME, AND METHOD FOR PRODUCING THE COATING AGENT

Glass elements are provided that include a coating and a sheet-like glass substrate. The sheet-like glass substrate has a first surface and a second surface opposite the first surface. The coating is disposed in at least some areas of at least one of the first and second surfaces. The coating is an inorganic glass-based coating that includes at least one glassy component; at least one pigment comprising pigment particles; and a filler. The filler is inorganic and includes filler particles with a dvalue, based on an equivalent diameter, of at least 0.1 μm and less than 10 μm. 1. A glass element , comprising:a sheet-like glass substrate having a first surface and a second surface opposite the first surface; and at least one glassy component;', 'at least one pigment comprising pigment particles; and', {'sub': '50', 'a filler, the filler being inorganic and comprising filler particles with a dvalue, based on an equivalent diameter, of at least 0.1 μm and less than 10 μm.'}], 'a coating disposed in at least some areas of at least one of the first and second surfaces, wherein the coating is an inorganic glass-based coating that comprises2. The glass element of claim 1 , wherein the inorganic glass-based coating is an enamel coating.3. The glass element of claim 1 , wherein the coating has a coefficient of thermal expansion that is less than or equal to a coefficient of thermal expansion of the glass substrate.4. The glass element of claim 1 , further comprising a second glassy component claim 1 , wherein the coating has a glass matrix that is inhomogeneous.5. The glass element of claim 4 , wherein the filler particles and/or the second glassy component have a coefficient of thermal expansion of at least 0.5*10/K and at most 15*10/K so that a resulting coefficient of thermal expansion of the coating is at least 6*10/K and at most 9*10/K and.6. The glass element of claim 5 , further comprising a difference in the coefficients of thermal expansion of the glass substrate and ...

Antimony-free glass, antimony-free frit and a glass package that is hermetically sealed with the frit

An antimony-free glass suitable for use in a frit for producing a hermetically sealed glass package is described. The hermetically sealed glass package, such as an OLED display device, is manufactured by providing a first glass substrate plate and a second glass substrate plate and depositing the antimony-free frit onto the first substrate plate. OLEDs may be deposited on the second glass substrate plate. An irradiation source (e.g., laser, infrared light) is then used to heat the frit which melts and forms a hermetic seal that connects the first glass substrate plate to the second glass substrate plate and also protects the OLEDs. The antimony-free glass has excellent aqueous durability, good flow, low glass transition temperature and low coefficient of thermal expansion.

HIGH TEMPERATURE SEALANT AND METHODS THEREOF

A method of making a stoichiometric monazite (LaPO) composition or a mixture of LaPOand LaPOcomposition, as defined herein. Also disclosed is a method of joining or sealing materials with the compositions, as defined herein. 1. A method of making a stoichiometric monazite (LaPO) composition , comprising:{'sub': 2', '3', '2', '5', 'melt, 'preparing La-phosphate glass frit particles comprising: melting a mixture of LaO:POin a mole ratio of 30:70 at a suitable melting temperature (T); and then pouring, rolling, and milling the resulting melt mixture to frit particles of a suitable particle size; and'}{'sub': 1', '4', 'melt', '1, 'heating the resulting frit particles in admixture with a lanthanum source to a reactive-ceramming temperature (T) for a sufficient time to form a stoichiometric LaPO, wherein Tis greater than T.'}2. The method of wherein a suitable melting temperature of the glass frit (T) is of from 1400 to 1700° C. claim 1 , a reactive-ceramming temperature (T) is of from 1200 to 1500° C. claim 1 , and for a sufficient time.3. The method of wherein a frit suitable particle size is a mean particle size of 10 to 15 microns.4. A method of making a mixture of LaPOand LaPO claim 1 , comprising:{'sub': 2', '3', '2', '5', 'melt, 'preparing La-phosphate frit particles comprising: melting a mixture of LaO:POin a mole ratio of from 25:75 to 20:80 at a suitable melting temperature (T); and then pouring, rolling, and milling the resulting melt mixture to frit particles of a suitable particle size; and'}{'sub': 1', '4', '3', '9', 'melt', '1, 'heating the resulting frit particles in admixture with a lanthanum source to a reactive-ceramming temperature (T) for a sufficient time to form the mixture of LaPOand LaPO, wherein Tis greater than T.'}5. The method of wherein a suitable melting temperature (T) of the glass frit is of from 1400 to 1700° C. claim 4 , a reactive-ceramming temperature (T) is of from 1200 to 1500° C. claim 4 , and for a sufficient time.6. A sealing ...

High temperature oxidation protection for composites

The present disclosure provides a method for coating a composite structure, comprising forming a first slurry by combining a first pre-slurry composition comprising a first phosphate glass composition, with a primary flow modifier and a first carrier fluid, wherein the primary flow modifier comprises at least one of cellulose or calcium silicate; applying the first slurry on a surface of the composite structure to form a base layer; and heating the composite structure to a temperature sufficient to adhere the base layer to the composite structure.

EXTERIOR MATERIAL OF HOME APPLIANCE, HOME APPLIANCE INCLUDING THE EXTERIOR MATERIAL, AND MANUFACTURING METHOD THEREOF

A cooking apparatus including an enamel coating layer having an improved cleaning efficiency and a manufacturing method therefor are provided. The cooking apparatus includes a cooking compartment configured to accommodate a cooking object, a door configured to open and close the cooking compartment, and an enamel coating layer provided on a surface of the cooking compartment. The enamel coating layer includes, in percent (%) by weight of the entire composition, 5% or less (excluding 0%) of a silicon dioxide (SiO), 10% to 20% of an aluminum oxide (AlO), 10% to 20% of a phosphorous pentoxide (PO), 5% to 15% of a rare earth oxide, and 5% to 10% of a ferric oxide (FeO). 1. A cooking apparatus comprising:a cooking compartment configured to accommodate a cooking object;a door configured to open and close the cooking compartment; andan enamel coating layer provided on a surface of the cooking compartment, [{'sub': '2', '5% or less (excluding 0%) of a silicon dioxide (SiO),'}, {'sub': 2', '3, '10% to 20% of an aluminum oxide (AlO),'}, {'sub': 2', '5, '10% to 20% of a phosphorous pentoxide (PO),'}, '5% to 15% of a rare earth oxide, and', {'sub': 2', '3, '5% to 10% of a ferric oxide (FeO).'}], 'wherein, the enamel coating layer comprises, in percent (%) by weight of the entire composition2. The cooking apparatus of claim 1 , wherein the ratio of the aluminum oxide (AlO) to phosphorous pentoxide (PO) ratio is 0.5 to 1:1 by weight.3. The cooking apparatus of claim 1 , wherein the ratio of the ferric oxide (FeO) to the aluminum oxide (AlO) ratio is 0.5 to 1:1 by weight.4. The cooking apparatus of claim 1 , wherein the ratio of the rare earth oxide to the phosphorous pentoxide (PO) is 0.3 to 1:1 by weight.5. The cooking apparatus of claim 1 , wherein the rare earth oxide is selected from the group consisting of a cerium oxide (CeO) claim 1 , a lanthanum oxide (LaO) claim 1 , and a samarium oxide (SmO).6. The cooking apparatus of claim 1 , wherein the enamel coating layer further ...

Glass frit antimicrobial coating

Articles have a glass layer on a substrate. The glass layer has antimicrobial properties via a metal or metal alloy. The glass layer is made using a doped glass frit which may be deposited by screen printing. The CTE of the glass layer and the substrate can be matched.

LOW-TEMPERATURE-FIRED LEAD-FREE GLASS FRIT, PASTE, AND VACUUM GLASS ASSEMBLY USING SAME

The present disclosure relates to a low temperature-calcined lead-free glass frit and paste, and a vacuum glass assembly using the same. The glass frit has a novel component system, in which phosphorus pentoxide (PO), vanadium pentoxide (VO), tellurium dioxide (TeO), copper oxide (CuO), barium oxide (BaO), zinc oxide (ZnO), bismuth oxide (BiO), and silver oxide (AgO) are included at a unique composition ratio according to the disclosure, and replaces a lead-based glass composition of the related art, is calcined at low temperature, includes no inorganic filter or include a minimum amount of an inorganic filler, has a coefficient of thermal expansion matching a coefficient of thermal expansion of a glass base material to prevent a separation or damage, and ensures excellent durability. 18-. (canceled)9. A glass frit , comprising:{'sub': 2', '5, '10 to 20 wt % of phosphorus pentoxide (PO);'}{'sub': 2', '5, '50 to 70 wt % of vanadium pentoxide (VO);'}{'sub': '2', '5 to 20 wt % of tellurium dioxide (TeO);'}1 to 5 wt % of copper oxide (CuO);1 to 20 wt % of one or more of barium oxide (BaO) and zinc oxide (ZnO); and{'sub': 2', '3', '2, '1 to 30 wt % of one or more of bismuth oxide (BiO) and silver oxide (AgO).'}10. The glass frit of claim 9 , wherein a composition of PO claim 9 , VO claim 9 , and TeOsatisfies a following equation.{'br': None, 'sub': 2', '5', '2', '5, 'VO(wt %)/PO(wt %)<3.5'}{'br': None, 'sub': 2', '5', '2, 'PO(wt %)+TeO(wt %)>25\u2003\u2003[Equation]'}11. The glass frit of claim 9 , wherein the glass frit has a coefficient of thermal expansion (CTE) within a range of 80 to 100×10/° C. after being calcined.12. The glass frit of claim 9 , wherein the glass frit has a softening point of 400° C. or less.13. A glass frit paste claim 9 , comprising:{'claim-ref': {'@idref': 'CLM-00009', 'claim 9'}, '100 parts by weight of the glass frit of and 10 to 100 parts by weight of an organic vehicle.'}14. A glass frit paste claim 9 , comprising:{'claim-ref': {'@idref': ' ...

GLASS POWDER AND SEALING MATERIAL USING SAME

A glass powder contains, as a glass composition, TeOof 15 mol % to 65 mol %, MoOof 10 mol % to 60 mol %, and POof 1 mol % to 35 mol %, and is substantially free of PbO. 16-. (canceled)7. A glass powder comprising: as a glass composition , TeOof 15 mol % to 65 mol % , MoOof 10 mol % to 60 mol % , and POof 1 mol % to 35 mol % , and substantially free of PbO.8. The glass powder according to claim 7 , further comprising: as the glass composition claim 7 , WOof 0 mol % to 25 mol % claim 7 , CuO of 0 mol% to 30 mol% claim 7 , BiOof 0 mol % to 35 mol % claim 7 , and AgO of 0 mol % to 25 mol %.9. The glass powder according to claim 7 , further comprising: as the glass composition claim 7 , NaO of 0 mol % to 20 mol % claim 7 , and KO of 0 mol % to 15 mol %.10. The glass powder according to claim 8 , further comprising: as the glass composition claim 8 , NaO of 0 mol % to 20 mol % claim 8 , and KO of 0 mol % to 15 mol %.11. A sealing material comprising: 40 vol % to 100 vol % of the glass powder according to ; and 0 vol % to 60 vol % of a fire resistant filler powder.12. A sealing material comprising: 40 vol % to 100 vol % of the glass powder according to ; and 0 vol % to 60 vol % of a fire resistant filler powder.13. A sealing material comprising: 40 vol % to 100 vol % of the glass powder according to ; and 0 vol % to 60 vol % of a fire resistant filler powder.14. A sealing material comprising: 40 vol % to 100 vol % of the glass powder according to ; and 0 vol % to 60 vol % of a fire resistant filler powder.15. The sealing material according to claim 11 , wherein the fire resistant filler powder is one or more selected from a zirconium phosphate-based compound claim 11 , a cordierite claim 11 , a willemite claim 11 , an alumina claim 11 , a zircon claim 11 , a zirconia claim 11 , a tin oxide claim 11 , a quartz glass claim 11 , a β-eucryptite claim 11 , and a spodumene.16. The sealing material according to claim 12 , wherein the fire resistant filler powder is one or more ...

METHOD OF MANUFACTURING BONDED BODY

A method of manufacturing a bonded body in which a first body and a second body are bonded using a glass paste. The glass paste includes a crystallized glass frit (A) and a solvent (B). A remelting temperature of the crystallized glass frit (A) is higher than a crystallization temperature thereof which is higher than a glass transition temperature thereof. The method includes: applying the glass paste on at least one of the first and second bodies, bonding the first and second bodies by interposing the glass paste therebetween, heating the bonded first and second bodies to a temperature that is not lower than the crystallization temperature and lower than the remelting temperature of the crystallized glass frit (A), and obtaining the bonded body by cooling the bonded first and second bodies to a temperature that is not higher than the glass transition temperature of the crystallized glass frit. 1. A method of manufacturing a bonded body in which a first body and a second body are bonded using a glass paste ,the glass paste comprising a glass frit (A) and a solvent (B), the glass frit (A) having a glass transition temperature and a crystallization temperature, and after a crystallization of the glass frit, the resultant crystallized glass having a remelting temperature, the remelting temperature being a temperature higher than the crystallization temperature, and the crystallization temperature being a temperature higher than the glass transition temperature,the method comprising:applying the glass paste on at least one of the first body and the second body,bonding the first body and the second body by interposing the glass paste therebetween,heating the first body and the second body that are bonded via the glass paste to a temperature that is not lower than the crystallization temperature and lower than the remelting temperature, andobtaining the bonded body by cooling the first body and the second body that are bonded via the glass paste to a temperature that is ...

HIGH-EXPANSION BONDING GLASS HAVING IMPROVED WATER RESISTANCE AND USES THEREOF

The present disclosure relates to a bonding glass which has improved water resistance and has a coefficient of thermal expansion α(25-300) of from 14·10Kto 17·10K, comprising, in mol % on an oxide basis, 5-7 of BO, 10-14 of AlO, 36-43 of PO, 15-22 of NaO, 12.5-20 of KO, 2-6 of BiOand >0-6 of R oxide, where R oxide is an oxide selected from the group consisting of MnOand SiOand SnOand TaOand NbOand FeOand GeOand CaO. The bonding glass is free of PbO except for, at most, impurities. The bonding glass may have a glass transition temperature Tg of from 390° C. to 430° C. The present disclosure also relates to uses of this bonding glass. 2. The bonding glass according to claim 1 , wherein the bonding glass has a glass transition temperature Tg of from 390° C. to 430° C.3. The bonding glass according to claim 1 , wherein R oxide comprises claim 1 , in mol % on an oxide basis claim 1 , 3.0-6.0 MnO.4. The bonding glass according to claim 3 , wherein R oxide comprises claim 3 , in mol % on an oxide basis claim 3 , 3.2-4.9 MnO.7. The bonding glass according to claim 1 , wherein the composition comprises at least one alkali metal oxide and a total content of alkali metal oxides in the composition is at most 36 mol %.8. The bonding glass according to claim 7 , wherein the at least one alkali metal oxide is selected from the group consisting of LiO claim 7 , NaO KO claim 7 , CsO claim 7 , or any combination thereof.9. The bonding glass according to claim 1 , wherein the bonding glass has crystalline regions which comprise phosphate-containing crystal phases.10. The bonding glass according to claim 9 , wherein the crystal phases comprise crystals from the group consisting of a BiO—POsystem claim 9 , an RO—AlO—POsystem claim 9 , or any combination thereof.11. The bonding glass according to claim 10 , wherein the crystal phases comprise crystals from a KO—AlO—POsystem.12. The bonding glass according to claim 1 , wherein the composition is in the form of a glass powder.13. The ...

Low temperature viscosity transition composition, display apparatus including the same, and method of manufacturing the same

A low-temperature viscosity transition (LVT) composition, including a tantalum oxide, a display apparatus including the same, and a method of manufacturing the same.

Glass material for sealing large-area dye-sensitized solar cell

The present invention relates to a glass material for sealing a large-area dye-sensitized solar cell and, more specifically, to a glass material which does not react with an electrolyte and allows uniform and high-strength binding even on a large area. According to the present invention, the glass material is expected to produce action effects of improving reliability and lifetime of solar cell products since it can uniformly seal a dye-sensitized solar cell, is chemically stable due to the absence of the reaction with an electrolyte, and has physical strength appropriate for large-area binding.

GLAZE COMPOSITION, METHOD FOR MANUFACTURING THE GLAZE COMPOSITION AND METHODS OF GLAZING

The invention provides a glass ceramic glaze composition manufactured using conventional raw material and one or more waste materials, wherein the waste materials are capable of producing glass forming oxides and glass modifying oxides. The waste materials are selected from a group that includes cullet, pozzolanic waste and fly ash. The invention also provides a method for manufacturing the glass ceramic glaze composition. Further, the invention provides different methods of glazing a glass ceramic substrate using the glass ceramic glaze composition. 1. A method for manufacturing a glass ceramic glaze composition , the method comprising:grinding a set of raw materials into a powder, wherein the set of raw materials comprises white sand and at least one raw material selected from a group comprising pozzolanic waste, cullet, clay, lime stone, fly ash and commercial frits;drying the powder to obtain a dried powder;heating the dried powder at temperature of about 700° C. to about 900° C. to decompose the carbonates;heating the dried powder at a temperature of about 1300° C. to about 1400° C. to obtain molten glass;pouring the molten glass in water to obtain glass frits;drying the glass frits;grinding the glass fits into a fine powder; andsieving the fine powder to filter out particles having diameter more than about 90 microns.2. The method of claim 1 , further comprising adding whitening agents to the set of raw materials.3. The method of claim 1 , wherein the dried powder is heated at a temperature of about 1300° C. to about 1400° C. for a period of about 1 hour to about 4 hours.4. The method of claim 1 , wherein the glass frits are dried at temperature of about 80° C. for a period of about 8 hours to about 10 hours.5. The method of claim 1 , wherein the set of raw materials comprises about 10 weight percent (wt %) to about 40 wt % of white sand claim 1 , about 5 wt % to about 40 wt % of clay claim 1 , about 5 wt % to about 20 wt % of limestone claim 1 , about 10 wt % ...

Low Melting Point Tin Phosphate-Based Glass Frit

A low melting point tin phosphate-based glass frit contains, in mol %, 15-75% of SnO, 0-40% of SnF2, 10-50% of P2O5, 0-30% of ZnO, 0-5% of Al2O3, 0-30% of B2O3, 0-5% of In203, 0-5% of BaO, and 0-5% of SiO2, does not contain Pb, and exhibits a temperature difference of 50° C. or less between the glass transition point to the glass softening point. The glass frit has a low softening point temperature and a conventional glass transition point temperature without using a substance that places a burden on the environment such as lead. 1. A low melting point tin phosphate-based glass frit comprising , in mol % , 15 to 75% of SnO , 0 to 40% of SnF , 10 to 50% of PO , 0 to 30% of ZnO , 0 to 5% of AlO , 0 to 30% of BO , 0 to 5% of InO , 0 to 5% of BaO , and 0 to 5% of SiO.2. The low melting point tin phosphate-based glass frit according to claim 1 , wherein a temperature difference from a glass transition point to a glass softening point is 50° C. or less.3. The low melting point tin phosphate-based glass frit according to that does not contain Pb.4. The low melting point tin phosphate-based glass frit according to that does not contain Pb. The present invention relates to a low melting point tin phosphate-based glass frit that can lower a glass softening point temperature while maintaining a conventional glass transition point temperature without using a substance that places a burden on the environment such as lead, etc.As conventional low melting point glass frits, for example, those described in Patent Literatures 1 to 5 are known. These inventions place emphasis on elimination of lead by adjustment of composition system (Patent Literatures 1 to 3) or improvement of weatherability (Patent Literatures 4 and 5).Patent Literature 1: Japanese Published Unexamined Patent Application No. 2000-169183Patent Literature 2: Japanese Published Unexamined Patent Application No. 2001-48579Patent Literature 3: Japanese Published Unexamined Patent Application No. 2004-010405Patent ...

SEALING COMPOSITIONS

The present invention relates to compositions in the form of precursor glass powders, pastes and preforms comprising said precursor glass powders, and glass-ceramics produced from the precursor glass powders, pastes or preforms. 1. A glass precursor sealing composition comprising:{'sub': 2', '3, '(I) 14-35 mol % AlO;'}(II) 31-52 mol % CaO; and{'sub': '2', '(III) 25-45 mol % SiO;'}{'sub': 2', '3, 'said composition being free of BO.'}2. A composition according to comprising 21 to 35 mol % AlO.3. A composition according to wherein the composition comprises 35 to 47 mol % CaO.4. A composition according to wherein the composition comprises 35 to 45 mol % SiO.5. A composition according to further comprising one or more of ZrO claim 1 , TiO claim 1 , PO claim 1 , BaO claim 1 , LaO claim 1 , YO claim 1 , or NbO.6. A composition according to in the form of a powder.7. A composition according to which has an MgO content of 1 mol % or less claim 1 , such as 0.5 mol % or less; anda ZnO content of 1 mol % or less.8. A composition according to consisting of AlO claim 1 , CaO claim 1 , SiOand optionally one or more oxides selected from PO claim 1 , YO claim 1 , and ZrO.9. A composition according to consisting of AlO claim 1 , CaO claim 1 , SiOand optionally a single oxide selected from PO claim 1 , YO claim 1 , or ZrO.10. A composition according to consisting of AlO claim 1 , CaO claim 1 , SiOand optionally one or more oxides selected from PO claim 1 , YO claim 1 , and BaO.11. A composition according to having a minimum viscosity when measured on a sintered disc in accordance with ASTM C1351M-96(2012) of 10to 10Pa·s.12. A paste claim 1 , preform or sintered preform comprising a glass precursor sealing composition according to .13. A preform comprising a sintered composition according to .14. A glass-ceramic composition comprising the composition according to .15. A glass-ceramic composition according to wherein the composition has a coefficient of thermal expansion (CTE) of 5.5 to ...

High thermal expansion glass composites and uses thereof

The present invention relates to glass composites, including filled glass composites and uses thereof. In particular examples, the composites provide improved thermal expansion characteristics. Also described are methods of forming such composites, such as by adding a particle filler to a glass mixture.

PROCESS FOR PRODUCING A SINTERED LITHIUM DISILICATE GLASS CERAMIC DENTAL RESTORATION AND KIT OF PARTS

The present invention is directed to a process for producing a sintered lithium disilicate glass ceramic dental restoration out of a porous 3-dim article, the process comprising the step of sintering the porous 3-dim article having the shape of a dental restoration with an outer and inner surface to obtain a sintered lithium disilicate ceramic dental restoration, the sintered lithium disilicate glass ceramic dental restoration comprising—Si oxide calculated as SiO2 from 55 to 80 wt.-%, —Li oxide calculated as Li2O from 7 to 16 wt.-%, —Al oxide calculated as Al2O3 from 1 to 5 wt.-%, and—P oxide calculated as P2O5 from 1 to 5 wt.-%, wt.-% with respect to the weight of the dental restoration, the sintering being done under reduced atmospheric pressure conditions, the reduced atmospheric pressure conditions being applied at a temperature above 600° C. The present invention is also directed to a kit of parts comprising a porous 3-dim article having the shape of a dental milling block and a respective instruction of use. 1. A process for producing a sintered lithium disilicate glass ceramic dental restoration out of a porous 3-dim article , the process comprising:sintering the porous 3-dim article having the shape of a dental restoration with an outer and inner surface to obtain a sintered lithium disilicate ceramic dental restoration, Si oxide calculated as SiO2: from 55 to 80 wt.-%;', 'Li oxide calculated as Li2O: from 7 to 16 wt.-%;', 'Al oxide calculated as Al2O3: from 1 to 5 wt.-%; and', 'P oxide calculated as P2O5: from 1 to 5 wt.-%,, 'the sintered lithium disilicate glass ceramic dental restoration comprisingwt.-% with respect to the weight of the dental restoration,the sintering being done under reduced atmospheric pressure conditions, the reduced atmospheric pressure conditions being applied above a temperature of 600° C.2. The process of comprising:providing a porous 3-dim article, the 3-dim article having either the shape of a dental milling block or of a ...

DENTAL TREATMENT MATERIAL AND DENTAL TREATMENT MATERIAL KIT

A dental treatment material includes: a liquid dispersion of a glass powder; and an inorganic phosphoric acid aqueous solution, wherein the glass powder contains zinc, silicon, and fluorine and does not substantially contain aluminum. 1. A dental treatment material comprising:a liquid dispersion of a glass powder; andan inorganic phosphoric acid aqueous solution,wherein the glass powder contains zinc, silicon, and fluorine and does not substantially contain aluminum.2. The dental treatment material according to is used as a dentinal tubules sealing material.3. A dental treatment material kit comprising:a container in which a liquid dispersion of a glass powder that contains zinc, silicon, and fluorine and does not substantially contain aluminum is contained; anda container in which an inorganic phosphoric acid aqueous solution is contained. The present invention relates to a dental Treatment material and a dental treatment material kit.Conventionally, in dental treatment, a dental treatment material that is applied to an affected part for alleviating symptoms of hyperesthesia or the like is known. In particular, a treatment material that seals dentinal tubules of dentine exposed at an affected part to block external stimuli to alleviate pain is well known.For example, Patent Document 1 describes a dental treatment material containing two liquids that promptly causes precipitation hardly soluble in water when being mixed.[Patent Document 1] Japanese Laid-open Patent Publication No. H4-217904However, conventional dental treatment materials have room for improvement with respect to suppression of tooth demineralization.Hence, an object in one aspect of the present invention is to provide a dental treatment material having an enhanced effect of suppressing tooth demineralization.According to one aspect of the present invention, a dental treatment material includes: a liquid dispersion of a glass powder; and an inorganic phosphoric acid aqueous solution, wherein the ...

FEED-THROUGH

A feed-through, in particular a feed-through which passes through part of a housing, in particular a battery housing, for example made of metal, in particular light metal, for example aluminum, an aluminum alloy, AlSiC, magnesium, an magnesium alloy, titanium, a titanium alloy, steel, stainless steel or high-grade steel. The housing part has at least one opening through which at least one conductor, in particular an essentially pin-shaped conductor, embedded in a glass or glass ceramic material, is guided. The base body is, for example, an essentially annular-shaped base body and is hermetically sealed with the housing part such that the helium leakage rate is smaller than 1*10mbar l/sec. 1. A housing part of a housing having at least one opening , said housing part comprising: one of a glass material and a glass ceramic material;', 'at least one conductor embedded in said one of a glass material and a glass ceramic material; and', {'sup': '−8', 'a base body through which said at least one conductor embedded in said one of a glass material and a glass ceramic material is guided, wherein said base body is in a region of said at least one opening and is hermetically sealed with the housing part by one of welding, soldering, pressing, crimping and shrinking such that the helium leakage rate is smaller than 1.*10mbar l/sec.'}], 'a feed-through placed in said at least one opening, said feed-through including2. The housing part according to claim 1 , wherein the housing part consists of a metal and said metal is one of aluminum claim 1 , an aluminum alloy claim 1 , aluminum silicon carbide (AlSiC) claim 1 , magnesium claim 1 , a magnesium alloy claim 1 , titanium claim 1 , a titanium alloy claim 1 , steel claim 1 , stainless steel and a high-grade steel.3. The housing part according to claim 1 , wherein said at least one conductor is an essentially pin shaped conductor claim 1 , a material of said pin-shaped conductor being one of copper claim 1 , copper silicon carbide ( ...

Conductive paste containing lead-free glass frit

The present invention discloses a conductive paste comprising a conductive metal or a derivative thereof, and a lead-free glass frit dispersed in an organic vehicle, wherein said lead-free glass frit comprises tellurium-bismuth-lithium-oxide. The conductive paste of the present invention can be used in the preparation of an electrode of a solar cell with excellent energy conversion efficiency.

Metal anticorrosive coating, preparation method therefor, and use therefor

The invention discloses a metal anticorrosive coating. The coating is an inorganic coating used for metal anticorrosion. This coating has a double-layer structure, including an outer enamel coating and an inner base oxide coating. Meanwhile, the content of the base metal oxide decreases from the inner layer to the outer layer, which causes the thermal expansion coefficient of the coating to increase from the inner layer to the outer layer, ensures that the overall thermal expansion coefficient of the coating is coordinate with various base metals. The composition of the outer layer enamel coating includes: by weight, 1-40 parts of silicon, 1-30 parts of sodium, 1-20 parts of potassium, 2-20 parts of calcium, 0.5-15 parts of fluorine, 0.3-10 parts of cobalt, 0.2-10 parts of nickel, 1-18 parts of boron, 0.5-10 parts of phosphorus, 0.1-8 parts of magnesium, and the rest is oxygen; the composition of the base oxide coating of the inner layer includes the base metal and oxygen. A preparation process of a double-layer dense metal anticorrosive coating formed by low-temperature sintering is also disclosed, including the following steps: 1) grinding; 2) preparation of mixture; 3) grinding; 4) high temperature reaction; 5) grinding; 6) coating; 7) sintering. The coating of the invention has the advantages of improving the corrosion resistance by more than 14 times, has a high ductility which can be coordinated with the reinforcing steel bar in tensile deformation, has a thermal expansion coefficient gradient which can be applied to different metals and different types of the same metal.

METHOD OF FORMING ELECTRODE, ELECTRODE MANUFACTURED THEREFROM AND SOLAR CELL

A method of forming an electrode, an electrode for a solar cell manufactured, and a solar cell, the method including forming a pattern of a finger electrode by: coating a composition for forming a first electrode that includes a conductive powder, an organic vehicle, and a first glass frit that is free of silver and phosphorus, and drying the coated composition for forming a first electrode; forming a pattern of a bus electrode by: coating a composition for forming a second electrode that includes a conductive powder, an organic vehicle, and a second glass frit that includes silver and phosphorus, and drying the coated composition for forming a second electrode; and firing the resultant patterns. 1. A method of forming an electrode , the method comprising: coating a composition for forming a first electrode that includes a conductive powder, an organic vehicle, and a first glass frit that is free of silver and phosphorus, and', 'drying the coated composition for forming a first electrode;, 'forming a pattern of a finger electrode by coating a composition for forming a second electrode that includes a conductive powder, an organic vehicle, and a second glass frit that includes silver and phosphorus, and', 'drying the coated composition for forming a second electrode; and, 'forming a pattern of a bus electrode byfiring the resultant patterns.2. The method of forming an electrode as claimed in claim 1 , wherein the composition for forming the first electrode includes:about 60 wt % to about 95 wt % of the conductive powder,about 0.5 wt % to about 20 wt % of the first glass frit, anda balance amount of the organic vehicle.3. The method of forming an electrode as claimed in claim 1 , wherein the composition for forming the second electrode includes:about 60 wt % to about 95 wt % of the conductive powder,about 0.5 wt % to about 20 wt % of the second glass frit, anda balance amount of the organic vehicle.4. The method of forming an electrode as claimed in claim 1 , wherein ...

Pyrolytic Hybrid Enamel

A fired hybrid enamel coating is provided. The hybrid enamel coating is formed by firing an enamel composition on a substrate. The enamel composition includes at least a first glass frit, which is sintered to form the hybrid enamel coating. The hybrid enamel coating can be cleaned using aqualytic or pyrolytic cleaning methods, and does not discolor or lose gloss when subject to typical pyrolytic cleaning methods. The hybrid enamel coating does not require the application of highly caustic cleaners to remove the baked-on soils 1. A composition for forming an enamel cover coat , the composition comprising at least a first glass frit comprising by weight:{'sub': '2', 'from about 5% to about 10% NaO;'}{'sub': '2', 'from about 1% to about 10% KO;'}{'sub': '2', 'from about 6% to about 25% SiO;'}{'sub': 2', '5, 'from about 15% to about 35% PO;'}{'sub': '2', 'from about 0% to about 20% ZrO;'}{'sub': 2', '3, 'from about 10% to about 25% AlO;'}{'sub': '2', 'from about 0% to about 6% TiO;'}{'sub': '2', 'from about 0% to about 5% LiO;'}from about 0% to about 8% BaO;{'sub': 2', '3, 'from about 0% to about 7% CoO;'}{'sub': 2', '3, 'from about 0% to about 5% CrO;'}from about 0% to about 5% ZnO;from about 0% to about 7% CaO;from about 0% to about 7% SrO;from about 0% to about 5% F; and{'sub': 2', '3, 'optionally from about 5% to about 20% BO.'}2. The composition according to claim 1 , wherein the first glass frit comprises by weight:{'sub': '2', 'from about 6.3% to about 7.4% NaO;'}{'sub': '2', 'from about 6.3% to about 7.4% KO;'}{'sub': '2', 'from about 9.9% to about 11.9% SiO;'}{'sub': 2', '5, 'from about 25.7% to about 29.7% PO;'}{'sub': '2', 'from about 12.7% to about 14.7% ZrO;'}{'sub': 2', '3, 'from about 16.8% to about 20.8% AlO;'}{'sub': '2', 'from about 0.6% to about 4.0% TiO;'}{'sub': '2', 'from about 0.1% to about 2.0% LiO;'}from about 0.1% to about 2.0% BaO;{'sub': 2', '3, 'from about 0.1% to about 5.0% CoO;'}{'sub': 2', '3, 'from about 0.1% to about 1.0% CrO;'}{'sub': ...

Glass ceramic and preparation method thereof, and a bond for composite grinding wheel comprising the glass ceramics and preparation method and application thereof

The application relates to bond materials for a grinding wheel, in particular a glass ceramic and a preparation method thereof, and a bond for the composite grinding wheel. The glass ceramic is prepared from raw materials comprising kaolin, silica, diboron trioxide, lithium superoxide, albite, potassium feldspar, talc, dolomite, phosphorus pentoxide, and yttrium oxide. A glass ceramic composed entirely of microcrystalline phases is obtained from the glass prepared by the above raw materials at 900-1020° C., achieving a complete conversion of the glass phase at a low temperature. The application also provides a bond for a composite grinding wheel, comprising glass ceramic and glass with mass ratio of (20-50):(50-80), the glass phase having a low flow temperature and, together with the glass ceramic phase, forming encapsulation of the abrasive particles, realizing low-temperature sintering of the grinding wheel. Microcrystalline phase in the bond results in high mechanical strength for the obtained grinding wheel.

GLASS

The present invention pertains to a glass characterized by: containing 72-82% of Li, 0-21% of Si, and 0-28% of B in terms of cation %; and containing at least 70% and less than 100% of Oand more than 0% and at most 30% of Cl, containing at least 94% and less than 100% of O and more than 0% and at most 6% of S, or containing at least 64% and less than 100% of O, more than 0% and at most 30% of Cl, and more than 0% and at most 6% of S, in terms of anion %. 1. A glass , [{'sup': '+', '72% or more and 82% or less of Li,'}, {'sup': '4+', '0% or more and 21% or less of Si, and'}, {'sup': '3+', '0% or more and 28% or less of B, and,'}], 'comprising, as represented by cation % [{'sup': '2−', '70% or more and less than 100% of Oand'}, {'sup': '−', 'more than 0% and 30% or less of Cl.'}], 'comprising, as represented by anion %2. The glass according to claim 1 , having a crystallization peak temperature of Tc and a glass transition temperature of Tg claim 1 , satisfying (Tc−Tg) of 55° C. or higher.3. The glass according to claim 1 , having a glass transition point of 200° C. or higher and 450° C. or lower.4. The glass according to claim 1 , having an ion conductivity of 7.0×10S/cm or more.5. A solid electrolyte comprising the glass according to .6. A binder for binding comprising the glass according to .7. A glass claim 1 , [{'sup': '+', '50% or more and less than 72% of Li,'}, {'sup': '4', 'more than 0% and 7% or less of Si, and'}, {'sup': '3+', 'more than 21% and 50% or less of B, and,'}], 'comprising, as represented by cation % [{'sup': '2−', '70% or more and less than 100% of Oand'}, {'sup': '−', 'more than 0% and 30% or less of Cl.'}], 'comprising, as represented by anion %8. The glass according to claim 7 , having a crystallization peak temperature of Tc and a glass transition temperature of Tg claim 7 , satisfying (Tc−Tg) of 55° C. or higher.9. The glass according to claim 7 , having a glass transition point of 200° C. or higher and 450° C. or lower.10. The glass ...

ENAMEL COMPOSITION, METHOD FOR PREPARATION THEREOF AND COOKING APPLIANCE USING SAME

The present disclosure relates to an enamel composition, a method for preparation thereof, and a cooking appliance using the same, which provide excellent cleaning performance, reduce a defect caused by carbon gases when an enamel coating is implemented on a base material made of cast iron, and provides excellent thermal shock resistance and durability. In the enamel composition according to the disclosure, components implementing glass and components having catalytic performance have an optimal component system, thereby ensuring excellent thermal shock resistance and durability. The enamel composition of the present disclosure has a component system that helps enamel cast iron as well as low carbon steel, thereby ensuring excellent cleaning performance, thermal shock resistance and durability. The enamel composition of the present disclosure is appropriate for a cooktop grate, a hob burner, and the like which directly contact a fire and are exposed to repetitive thermal shock. 1. An enamel composition comprising:{'sub': 2', '5, '13 to 30 wt % of phosphorus pentoxide (PO);'}{'sub': '2', '20 to 45 wt % of silicon dioxide (SiO);'}{'sub': 2', '3, '5 to 18 wt % of aluminum oxide (AlO),'}{'sub': '2', '10 or less wt % of zirconium dioxide (ZrO);'}{'sub': '2', '2 to 15 wt % of sodium oxide (NaO);'}{'sub': '2', '5 to 20 wt % of potassium oxide (KO);'}{'sub': '2', '1 to 10 wt % of lithium oxide (LiO);'}5 or less wt % of sodium fluoride (NaF);{'sub': 2', '3, '5 to 20 wt % of boron trioxide (BO);'}{'sub': '2', '5 or less wt % of titanium dioxide (TiO), and'}{'sub': 2', '5, '10 or less wt % of vanadium oxide (VO).'}2. The enamel composition of claim 1 , wherein the enamel composition comprises 5 or greater wt % of NaO.3. The enamel composition of claim 1 , further comprising:{'sub': 3', '4', '2', '2', '3, '5 or less wt % of one or more of cobalt tetraoxide (CoO), manganese oxide (MnO), nickel oxide (NiO) and iron oxide (FeO).'}4. A method for preparation of an enamel ...

COMPOSITION FOR SOLID OXIDE FUEL CELL SEALANT, SEALANT USING SAME AND METHOD FOR PREPARING SAME

The present specification relates to a composition for a solid oxide fuel cell sealant including PO, a sealant using the same and a method for manufacturing the same. 1. A composition for a solid oxide fuel cell sealant comprising PO.2. The composition for a solid oxide fuel cell sealant of comprising the POin 1 mol % to 10 mol % based on the content of the whole composition.3. The composition for a solid oxide fuel cell sealant of comprising the POin 5 mol % to 10 mol % based on the content of the whole composition.4. The composition for a solid oxide fuel cell sealant of claim 1 , further comprising one or more materials selected from the group consisting of SiO claim 1 , BO claim 1 , AlO claim 1 , ZnO claim 1 , CaO claim 1 , BaO and SrO.5. The composition for a solid oxide fuel cell sealant of claim 1 , further comprising SiOin 12 mol % to 33 mol %.6. The composition for a solid oxide fuel cell sealant of claim 1 , comprising SiOin 12 mol % to 33 mol % claim 1 , BOin 25 mol % to 40 mol % claim 1 , the POin 5 mol % to 10 mol % claim 1 , ZnO in 5 mol % to 11 mol % claim 1 , CaO in 5 mol % to 12 mol % and BaO in 5 mol % to 10 mol %.7. The composition for a solid oxide fuel cell sealant of claim 1 , further comprising AlOin greater than 0 mol % and less than or equal to 10 mol %.8. The composition for a solid oxide fuel cell sealant of claim 6 , further comprising SrO in greater than 0 mol % and less than or equal to 13 mol %.9. The composition for a solid oxide fuel cell sealant of claim 6 , which has a value adding up the content of the CaO and the ZnO in a range of 5 mol % to 20 mol %.10. The composition for a solid oxide fuel cell sealant of claim 8 , which has a value adding up the content of the BaO and the SrO in a range of 9 mol % to 18 mol %.11. The composition for a solid oxide fuel cell sealant of claim 1 , which has a coefficient of thermal expansion value in a range of 8×10/K to 12×10/K.12. The composition for a solid oxide fuel cell sealant of claim 1 , ...

GLASS COMPOSITION FOR PHOTO-CONVERSION MEMBER AND CERAMIC PHOTO-CONVERSION MEMBER USING THE SAME

Provided are a ternary glass composition containing SiO, BOand ZnO, and a ceramic phosphor plate including a glass frit obtained by vitrification of the glass composition as a matrix and obtained by sintering at least one phosphor. 1. A glass composition for a photo-conversion member , which is a ternary glass composition , comprising:{'sub': 2', '2', '3, 'SiO, BOand ZnO'}{'sub': 2', '3, 'wherein BOis contained in a content of 30 to 45 mol % in the glass composition, and ZnO is contained in a content of 40 to 60 mol % in the glass composition.'}2. The glass composition of claim 1 , wherein a ratio of ZnO to BOis 0.6 to 1.3. A glass composition for a photo-conversion member claim 1 , comprising:{'sub': 2', '2', '3, '85 to 95 mol % of an oxide mixture composed of SiO, BOand ZnO; and'}5 to 25 mol % of at least one alkali metal oxide.4. The glass composition of claim 3 , wherein the alkali metal oxide is one oxide selected from the group consisting NaO claim 3 , LiO claim 3 , KO claim 3 , and a mixture thereof.5. The glass composition of claim 3 , wherein when a single component is contained in the alkali metal oxide claim 3 , a ratio of SiO claim 3 , to the alkali metal oxide is 1:0.3 to 1:1.2.6. The glass composition of claim 3 , wherein when two kinds of components are contained in the alkali metal oxide claim 3 , a content of the alkali metal oxide is 10 to 25 mol %.7. The glass composition of claim 3 , wherein when two kinds of components are contained in the alkali metal oxide claim 3 , a chemically resistant improvement component is further contained claim 3 , the chemically resistant improvement component being a trivalent metal oxide.8. The glass composition of claim 7 , wherein the trivalent metal oxide is AlO.9. A glass composition for a photo-conversion member claim 7 , comprising:{'sub': 2', '2', '3, 'an oxide mixture composed of SiO, BOand ZnO; and'}at least one oxide of oxides containing a metal of group I or group II,{'sub': 2', '3, 'wherein the oxide ...

METHOD FOR PROVIDING A CO- AND NI-FREE VITREOUS ENAMELLED METAL COATED STEEL SUBSTRATE AND A PRIMER COMPOSITION THEREFOR

Method for producing a metal coated steel substrate provided with a coating of a primer composition, comprising applying a layer of the primer composition on the metal coated steel substrate wherein the primer composition comprises basic components selected from the group consisting of CuO, K0, Li0, Na0, Ce0and ZnO; components with intermediate acidity selected from the group consisting of Al0, B0, Cr0, Sn0Sb0and Fe0; acidic components selected from the group consisting of Mn0, Mo0, P0, Si0, Ti0, V0, W0and Zr0; wherein all wt. % are drawn on the total primer composition and the total sum of the amounts excluding impurities and after normalization is 100 wt. %, wherein all components are expressed as oxides, wherein the sum of the amounts of Ce0+Cr0+CuO+Fe0+Mn0+Mo0+Sn0+Sb0+V0W0is between about 16.7 and about 48.6 wt. %. 1. A method for producing a metal coated steel substrate provided with a coating of a primer composition , comprising applying a layer of the primer composition on the metal coated steel substrate , wherein the primer composition comprises:one or more basic components (B) selected from the group consisting of CuO, K2O, Li2O, Na2O, CeO2 and ZnO;one or more components with intermediate acidity (IN) selected from the group consisting of Al2O3, B2O3, Cr2O3, SnO2, Sb2O3 and Fe2O3;one or more acidic components (A) selected from the group consisting of MnO2, MoO3, P2O5, SiO2, TiO2, V2O5, WO3 and ZrO2; andwherein all wt. % are drawn on the total primer composition and the total sum of the amounts excluding impurities and after normalization is 100 wt. %,wherein all components are expressed as oxides, wherein the sum of the amounts of CeO2+Cr2O3+CuO+Fe2O3+MnO2+MoO3+SnO2+Sb2O3+V2O5+WO3 is between 16.7 and 48.6 wt. %, and wherein the sum of the amounts of CeO2+CuO+Fe2O3+MoO3+SnO2+WO3 is between 18.9 and 48.6 wt. %, and firing the metal coated substrate with the primer composition.2. The method according to claim 1 , wherein the primer composition does not ...

Enamel And Ground Coat Compositions

A composition that upon firing, forms a non-stick enamel layer is disclosed. The composition can be applied to a metal substrate to provide a non-stick, durable coating for cooking surfaces. Also disclosed are methods of forming enamel layers and corresponding coated substrates. Various ground coats and related methods are also described. Furthermore, various multilayer coatings and structures are disclosed that include an enamel layer and a ground coat layer.

GLASS COMPOSITION, PREPARATION METHOD OF GLASS COMPOSITION, AND COOKING APPLIANCE

A glass composition formed of glass frit including PO, TiOand group I-based oxide, wherein POis contained in an amount of 20 wt % to 30 wt % based on a total weight of the glass frit, wherein TiOis contained in an amount of 10 wt % to 20 wt % based on the total weight of the glass frit, and wherein the group I-based oxide is contained in an amount of 15 wt % to 30 wt % based on the total weight of the glass frit. 1. A glass composition comprising glass frit including PO , TiOand group I-based oxide ,{'sub': 2', '5, 'wherein POis contained in an amount of 20 wt % to 30 wt % based on a total weight of the glass frit,'}{'sub': '2', 'wherein TiOis contained in an amount of 10 wt % to 20 wt % based on the total weight of the glass frit, and'}wherein the group I-based oxide is contained in an amount of 15 wt % to 30 wt % based on the total weight of the glass frit.2. The glass composition of claim 1 , wherein the group I-based oxide comprises at least one metal oxide selected from a group consisting of LiO claim 1 , NaO and KO.3. The glass composition of claim 2 , wherein the glass frit comprises SiO claim 2 , wherein SiO2 is contained in an amount of 10 wt % to 20 wt % based on the total weight of the glass frit.4. The glass composition of claim 3 , wherein the glass frit comprises BO claim 3 , wherein BOis contained in an amount of 5 wt % to 15 wt % based on the total weight of the glass frit.5. The glass composition of claim 4 , wherein the glass frit comprises AlO claim 4 , wherein AlOis contained in an amount of 10 wt % to 30 wt % based on the total weight of the glass frit.6. The glass composition of claim 5 , wherein the glass frit comprises a fluorinated compound claim 5 , wherein the fluorinated compound is contained in an amount of 0.1 wt % to 5 wt % based on the total weight of the glass frit claim 5 , wherein the fluorinated compound includes at least one metal fluoride selected from NaF and AlF.7. The glass composition of claim 4 , wherein the glass frit ...

GLASS COMPOSITION, PREPARATION METHOD OF GLASS COMPOSITION, AND COOKING APPLIANCE

A glass composition formed of a glass frit including PO, SiO, BO, AlO, ZrOand group I-based oxide, wherein POis contained in an amount of 20 wt % to 40 wt % based on a total weight of the glass frit, SiOis contained in an amount of to wt % to 30 wt % based on the total weight of the glass frit, BOis contained in an amount of 3 wt % to 20 wt % based on the total weight of the glass frit, AlOis contained in an amount of 7 to 24 wt % based on the total weight of the glass frit, ZrOis contained in an amount of 1 wt % to 7 wt % based on the total weight of the glass frit, and the group I-based oxide is contained in an amount of 7 wt % to 28 wt % based on the total weight of the glass frit. 1. A glass composition comprising:{'sub': 2', '5', '2', '2', '3', '2', '3', '2, 'a glass fit comprising PO, SiO, BO, AlO, ZrOand group I-based oxide,'}{'sub': 2', '5, 'wherein POis contained in an amount of 20 wt % to 40 wt % based on a total weight of the glass frit,'}{'sub': '2', 'SiOis contained in an amount of to wt % to 30 wt % based on the total weight of the glass frit,'}{'sub': 2', '3, 'BOis contained in an amount of 3 wt % to 20 wt % based on the total weight of the glass frit,'}{'sub': 2', '3, 'AlOis contained in an amount of 7 to 24 wt % based on the total weight of the glass frit,'}{'sub': '2', 'ZrOis contained in an amount of 1 wt % to 7 wt % based on the total weight of the glass frit, and'}the group I-based oxide is contained in an amount of 7 wt % to 28 wt % based on the total weight of the glass frit.2. The glass composition of claim 1 , wherein the group I-based oxide comprises at least one metal oxide selected from a group consisting of LiO claim 1 , NaO and KO.3. The glass composition of claim 1 , wherein the glass frit comprises at least one of TiOand SnO claim 1 , and{'sub': '2', 'wherein said at least one of TiOand SnO is contained in an amount of 1 wt % to 10 wt % based on the total weight of the glass frit.'}4. The glass composition of claim 1 , wherein the ...

Feed-through

A feed-through through a housing part of a housing, for example of a battery or a capacitor made of a metal, wherein the housing part has at least one opening, through which at least one conductor is fed in a glass or glass ceramic material, and wherein the conductor has at least two sections in the axial direction, a first section made of a first material, e.g. aluminium, and a second section made of a second material, e.g. copper, as well as a transition from the first to the second material, and wherein the transition from the first to the second material is located in the region of the glass or glass ceramic material, said glass or glass ceramic material being adapted to the metal of the housing in such a way that a compression glass-to-metal seal is formed.

LEAD-FREE LOW-MELTING GLASS COMPOSITION, LOW-TEMPERATURE SEALING GLASS FRIT, LOW-TEMPERATURE SEALING GLASS PASTE, CONDUCTIVE MATERIAL, AND CONDUCTIVE GLASS PASTE CONTAINING GLASS COMPOSITION, AND GLASS-SEALED COMPONENT AND ELECTRIC/ELECTRONIC COMPONENT PREPARED USING THE SAME

An AgO—VO—TeOlead-free low-melting glass composition that is prevented or restrained from crystallization by heating so as to soften and flow more satisfactorily at a low temperature contains a principal component which includes a vanadium oxide, a tellurium oxide and a silver oxide; a secondary component which includes at least one selected from the group consisting of BaO, WOand PO; and an additional component which includes at least one selected from the group consisting of oxides of elements in Group 13 of periodic table. A total component of the principal component is 85 mole percent or more in terms of VO, TeOand AgO. Contents of TeOand AgO each is 1 to 2 times as much as a content of VO. A content of the secondary component is 0 to 13 mole percent. A content of the additional component is 0.1 to 3.0 mole percent. 1. A lead-free low-melting glass composition comprising:a principal component which includes a vanadium oxide, a tellurium oxide and a silver oxide;{'sub': 3', '2', '5, 'a secondary component which includes at least one selected from the group consisting of BaO, WOand PO; and'}an additional component which includes at least one selected from the group consisting of oxides of elements in Group 13 of periodic table,{'sub': 2', '5', '2', '2, 'wherein a total component of the principal component is 85 mole percent or more in terms of VO, TeOand AgO,'}{'sub': 2', '2', '2', '5, 'contents of TeOand AgO each is 1 to 2 times as much as a content of VO, and'}wherein a content of the secondary component is 0 to 13 mole percent, anda content of the additional component is 0.1 to 3.0 mole percent.2. The lead-free low-melting glass composition according to claim 1 ,{'sub': 2', '3', '2', '3', '2', '3', '2', '3, 'wherein the additional component includes at least one selected from the group consisting of BO, AlO, GaOand InO, and'}wherein the content of the additional component is 0.1 to 2.0 mole percent in terms of oxide.3. The lead-free low-melting glass ...

Glass frit, crystallized glass, method for producing crystallized glass, solid electrolyte, and lithium ion secondary battery

A glass frit includes a glass which contains: Li; at least one selected from the group consisting of B, Si, P, Ge, and Te; O; and at least one selected from the group consisting of F, Cl, Br, and I. The glass is to turn into a crystallized glass including an amorphous phase and a crystalline phase, the crystalline phase precipitated by a heat treatment at a temperature equal to or higher than a glass transition temperature and equal to or lower than a glass crystallization temperature. The crystallized glass shows diffraction peaks at 2θ=22.8±0.5°, 2θ=32.1±0.5° and 2θ=39.6±0.5° in a powder X-ray diffraction pattern using Cu—Kα radiation.

STRENGTHENED GLASS SUBSTRATES WITH GLASS FRITS AND METHODS FOR MAKING THE SAME

Strengthened glass substrates with glass frits and methods for forming the same are disclosed. According to one embodiment, a method for forming a glass frit on a glass substrate may include providing a glass substrate comprising a compressive stress layer extending from a surface of the glass substrate into a thickness of the glass substrate, the compressive stress having a depth of layer DOL and an initial compressive stress CS. A glass frit composition may be deposited on at least a portion of the surface of the glass substrate. Thereafter, the glass substrate and the glass frit composition are heated in a furnace to sinter the glass frit composition and bond the glass frit composition to the glass substrate, wherein, after heating, the glass substrate has a fired compressive stress CSwhich is greater than or equal to 0.70*CS. 1. An automotive glazing comprising:{'sub': 'f', 'a glass substrate comprising a compressive stress layer extending from a surface of the glass substrate into a thickness of the glass substrate, the compressive stress layer having a depth of layer DOL and a fired compressive stress CS;'} the glass frit has a softening point of less than or equal to 400° C., a glass transition temperature which is less than or equal to 375° C., and a sintering temperature of less than 450° C.; and', {'sub': f', 'i, 'the fired compressive stress CSis greater than or equal to 0.70 of an initial compressive stress CSof the glass substrate prior to the glass frit being bonded to at least a portion of the glass substrate.'}], 'a glass frit is fully vitrified and bonded to at least a portion of the surface of the glass substrate, wherein2. The glazing of claim 1 , wherein the substrate comprises a substrate coefficient of thermal expansion CTEis in a range from about 80×10/° C. to about 95×10/° C. over a temperature range from 0° C. to 300° C.; and{'sub': F', 'S, 'sup': '−7', 'the glass frit has a frit coefficient of thermal expansion CTEwhich is within +/−10×10/° ...

HEAT-DISSIPATING STRUCTURE AND SEMICONDUCTOR MODULE USING SAME

A heat-dissipating structure is formed by bonding a first member and a second member, each being any of a metal, ceramic, and semiconductor, via a die bonding member; or a semiconductor module formed by bonding a semiconductor chip, a metal wire, a ceramic insulating substrate, and a heat-dissipating base substrate including metal, with a die bonding member interposed between each. At least one of the die bonding members includes a lead-free low-melting-point glass composition and metal particles. The lead-free low-melting-point glass composition accounts for 78 mol % or more in terms of the total of the oxides V2O5, TeO2, and Ag2O serving as main ingredients. The content of each of TeO2 and Ag2O is 1 to 2 times the content of V2O5, and at least one of BaO, WO3, and P2O5 is included as accessory ingredients, and at least one of Y2O3, La2O3, and Al2O3 is included as additional ingredients. 1. A heat-dissipating structure comprising:a first member and a second member each of which is metal, ceramic, or a semiconductor and which are bonded to each other with a die bonding member, which contains a lead-free low-melting glass composition and metal particles, interposed therebetween,{'sub': 2', '5', '2', '2, 'wherein the lead-free low-melting glass composition contains oxides comprising VO, TeO, and AgO serving as main ingredients of which the total content of the oxides is 78 mol % or more of the lead-free low-melting glass composition,'}{'sub': 2', '2', '2', '5, 'the content of each of TeOand AgO is 1 to 2 times the content of VO, and'}{'sub': 3', '2', '5', '2', '3', '2', '3', '2', '3, 'the lead-free low-melting glass composition further contains one or more accessory ingredients selected from BaO, WO, and POof which the total content is 20 mol % or less of the lead-free low-melting glass composition, and one or more additional ingredients selected from YO, LaO, and AlOof which the total content is 2.0 mol % or less of the lead-free low-melting glass composition.'}2. ...

SUBSTRATE FOR COLOR CONVERSION OF LIGHT-EMITTING DIODE AND MANUFACTURING METHOD THEREFOR

The present invention relates to a substrate for the color conversion of a light-emitting diode and a manufacturing method therefor and, more specifically, to a substrate for the color conversion of a light-emitting diode and a manufacturing method therefor, which enable a quantum dot (QD) and a structure, in which the QD is supported, to have a color conversion function for implementing white light. To this end, the present invention provides a substrate for the color conversion of a light-emitting diode, comprising: a first glass substrate arranged on a light-emitting diode; a second glass substrate formed to face the first glass substrate; a structure arranged between the first glass substrate and the second glass substrate, having a hollow portion and formed from a mixture of a yellow phosphor and a low-melting point frit glass; a QD filling the hollow portion; and sealing materials respectively formed between the first glass substrate and the lower side of the structure and between the second glass substrate and the upper side of the structure. 1. A color conversion substrate comprising:a first glass substrate disposed over a light-emitting diode;a second glass substrate facing the first glass substrate;at least one structural body disposed between the first glass substrate and the second glass substrate, having a hollow portion, and formed of a mixture of a yellow fluorescent material and a low melting point glass frit;a quantum dot accommodated in the hollow portion of the at least one structural body; anda sealant disposed between the first glass substrate and a bottom surface of the at least one structural body and between the second glass substrate and a top surface of the at least one structural body.2. The color conversion substrate of claim 1 , wherein the yellow fluorescent material comprises a yttrium aluminum garnet-based fluorescent material.3. The color conversion substrate of claim 1 , wherein a softening point of the low melting point glass frit ...

Sealed structural body and method for manufacturing the same

A sealed structural body has an internal space and is made of glass, wherein at least a part of a boundary between the internal space of the sealed structural body and the outside is separated by a sealing material containing a metal material and a lead-free oxide glass. The lead-free oxide glass contains at least one of element Ag or P, Te, and V.

LEAD-FREE LOW-MELTING GLASS COMPOSITION, LOW-TEMPERATURE SEALING GLASS FRIT, LOW-TEMPERATURE SEALING GLASS PASTE, CONDUCTIVE MATERIAL, AND CONDUCTIVE GLASS PASTE CONTAINING GLASS COMPOSITION, AND GLASS-SEALED COMPONENT AND ELECTRIC/ELECTRONIC COMPONENT PREPARED USING THE SAME

An AgO—VO—TeOlead-free low-melting glass composition that is prevented or restrained from crystallization by heating so as to soften and flow more satisfactorily at a low temperature contains a principal component which includes a vanadium oxide, a tellurium oxide and a silver oxide; a secondary component which includes at least one selected from the group consisting of BaO, WOand PO; and an additional component which includes at least one selected from the group consisting of oxides of elements in Group 13 of periodic table. A total component of the principal component is 85 mole percent or more in terms of VO, TOand AgO. Contents of TeOand AgO each is 1 to 2 times as much as a content of VO. A content of the secondary component is 0 to 13 mole percent. A content of the additional component is 0.1 to 3.0 mole percent. 120.-. (canceled)21. A lead-free low-melting glass composition comprising:a principal component which includes a vanadium oxide, a tellurium oxide and a silver oxide; andan additional component which includes at least one selected from the group consisting of oxides of elements in Group 13 of periodic table,{'sub': 2', '2', '5, 'wherein a content of TeOis 1 to 2 times as much as a content of VO, and'}wherein a content of the additional component is 0.1 to 3.0 mole percent.22. The lead-free low-melting glass composition according to claim 21 , further comprising an optional secondary component which includes at least one selected from the group consisting of BaO claim 21 , WOand PO claim 21 , wherein the content of VOis 17 to 27 mole percent.23. The lead-free low-melting glass composition according to claim 21 ,wherein a content of the optional secondary component is 0 to 13 mole percent.24. The lead-free low-melting glass composition according to claim 21 ,{'sub': 2', '5, 'wherein the content of VOis 17 to 27 mole percent,'}{'sub': '2', 'the content of TeOis 34 mole percent or more, and'}{'sub': '2', 'a content of AgO is 40 mole percent or less.'}25. ...

METHODS AND APPARATUS FOR FORMING SHAPED ARTICLES, SHAPED ARTICLES, METHODS FOR MANUFACTURING LIQUID LENSES, AND LIQUID LENSES

A method includes depositing a glass frit on sidewalls of a plurality of cavities of a shaped article formed from a glass material, a glass ceramic material, or a combination thereof. The glass frit is heated to a firing temperature above a glass transition temperature of the glass frit to sinter the glass frit into a glaze disposed on the sidewalls of the plurality of cavities. 1. A method comprising:depositing a glass frit on sidewalls of a plurality of cavities of a shaped article comprising a glass material, a glass-ceramic material, or a combination thereof;heating the glass frit to a firing temperature above a glass transition temperature of the glass frit and below a strain point of the glass material, the glass-ceramic material, or the combination thereof of the shaped article to sinter the glass frit into a glaze disposed on the sidewalls of the plurality of cavities;wherein the glaze disposed on the sidewalls of the plurality of cavities has an Ra surface roughness of at most about 200 nm.2. (canceled)3. The method of claim 1 , comprising forming the plurality of cavities in a preform comprising the glass material claim 1 , the glass-ceramic material claim 1 , or the combination thereof to transform the preform into the shaped article.4. The method of claim 3 , wherein the forming the plurality of cavities in the preform comprises cutting the plurality of cavities in the preform using a laser.5. The method of claim 3 , wherein the forming the plurality of cavities in the preform comprises pressing the plurality of cavities in the preform using a mold.6. The method of claim 1 , comprising smoothing the glaze by irradiating the glaze with a laser.7. The method of claim 1 , wherein the depositing the glass frit comprises dispensing the glass frit from a pen dispenser onto the sidewalls at a dispensing speed.8. The method of claim 7 , wherein the dispensing speed is at most about 1.8 mm/s.9. The method of claim 1 , comprising polishing at least one of a first ...

Sealed devices comprising transparent laser weld regions

Disclosed herein are sealed devices comprising a first substrate, a second substrate, an inorganic film between the first and second substrates, and at least one weld region comprising a bond between the first and second substrates. The weld region can comprise a chemical composition different from that of the inorganic film and the first or second substrates. The sealed devices may further comprise a stress region encompassing at least the weld region, in which a portion of the device is under a greater stress than the remaining portion of the device. Also disclosed herein are display and electronic components comprising such sealed devices.

Powder magnetic core, powder for magnetic cores, and methods of manufacturing them

A powder magnetic core having excellent specific resistance or strength. The powder magnetic core has soft magnetic particles, first coating layers that coat the surfaces of the soft magnetic particles and include aluminum nitride, and second coating layers that coat at least a part of the surfaces of the first coating layers and include a low-melting-point glass having a softening point lower than an annealing temperature for the soft magnetic particles. The first coating layers including aluminum nitride are excellent in the wettability to the low-melting-point glass which constitutes the second coating layers and suppress diffusion of constitutional elements between the soft magnetic particles and the low-melting-point glass of the second coating layers. The powder magnetic core can stably exhibit a higher specific resistance and higher strength than the prior art owing to such a synergistic action of the first coating layers and second coating layers.

DECORATIVE NON-POROUS LAYERS FOR ION-EXCHANGEABLE GLASS SUBSTRATES

Disclosed are non-porous inorganic frit compositions, which permit the decoration of ion-exchangeable glass-based substrates before the ion exchange chemical strengthening processes. When fired, the non-porous inorganic frit compositions comprise a crystallized phase and/or a ΔT greater than about 80° C. Also disclosed are strengthened glass-based substrates having one or more non-porous inorganic layers, glass-based articles comprising strengthened glass-based substrates having one or more non-porous inorganic layers, and methods of making the same. 1. An inorganic frit composition comprising:{'sub': 2', '5, 'POin an amount ranging from 30 mol % to about 40 mol %,'}{'sub': 2', '5, 'NbOin an amount ranging from about 5 mol % to about 15 mol %,'}ZnO in an amount ranging from about 15 mol % to about 30 mol %, and{'sub': '2', 'NaO in an amount ranging from about 15 mol % to about 30 mol %.'}2. The inorganic frit composition of claim 1 , comprising:{'sub': 2', '5, 'POin an amount ranging from about 35 mol % to about 38 mol %,'}{'sub': 2', '5, 'NbOin an amount ranging from about 7 mol % to about 13 mol %,'}ZnO in an amount ranging from about 19 mol % to about 25 mol %, and{'sub': '2', 'NaO in an amount ranging from about 19 mol % to about 25 mol %.'}3. The inorganic frit composition of claim 1 , wherein the composition comprises a crystallization onset temperature when measured at a heating rate of 10° C./minute (Tx) claim 1 , a glass transition temperature claim 1 , and a ΔT greater than about 80° C. claim 1 , wherein ΔT is the difference between Tx and Tg.4. The inorganic frit composition of claim 1 , further comprising at least one of TiO claim 1 , KO claim 1 , LiO claim 1 , SiO claim 1 , and AlO.5. The inorganic frit composition of claim 1 , further comprising at least one pigment.6. The inorganic frit composition of claim 1 , which is fired.7. The inorganic fit composition of claim 4 , comprising an NZP-type crystalline phase.8. An article comprising:a strengthened ...

BORATE-GLASS BIOMATERIALS

Borate-glass biomaterials comprising: aNaO. bCaO. cPO. dBOwherein a is from about 1-40 wt %, b is from about 10-40 wt %, c is from about 1-40 wt %, and d is from about 35-80 wt %; and wherein the biomaterial has a surface area per mass of more than about 5 m/g. Methods of making and uses of these biomaterials. 144-. (canceled)45. A borate-glass biomaterial comprising a composition having a BOcomponent , a CaO component , and at least one other component selected from a POcomponent and a NaO component , wherein the BOcomponent is a main network forming component and the biomaterial has a surface area per mass of more than about 5 m/g.46. The borate-glass biomaterial of claim 45 , wherein the composition comprises: aNaO. bCaO. cPO. dBO claim 45 , wherein a is from about 1-40 wt % claim 45 , b is from about 10-40 wt % claim 45 , c is from about 1-40 wt % claim 45 , and d is from about 35-80 wt %.47. The borate-glass biomaterial of claim 46 , wherein a is from about 15-30 wt % claim 46 , b is from about 15-30 wt % claim 46 , c is from about 3-7 wt % claim 46 , and d is from about 35-65 wt %.48. The borate-glass biomaterial of claim 45 , wherein the composition comprises: xCaO. yPO. zBO claim 45 , wherein x is from about 5-50 wt % claim 45 , y is from about 5-50 wt % claim 45 , and z is from about 35-75 wt % claim 45 , or x is 10-50 wt % claim 45 , y is 5-35 wt % and z is 38-80 wt %.49. The borate-glass biomaterial of claim 45 , wherein the composition comprises: 1NaO. mCaO nBO. wherein 1 is from about 5-50 wt % claim 45 , m is from about 1-50 wt % claim 45 , and n is from about 40-80 wt %.50. The borate-glass biomaterial of claim 45 , wherein the biomaterial has a surface area per mass of about 5-300 m/g claim 45 , 10-300 m/g claim 45 , 20-300 m/g claim 45 , 30-300 m/g claim 45 , 40-300 m/g claim 45 , 50-300 m/g claim 45 , 60-300 m/g claim 45 , 70-300 m/g claim 45 , 80-300 m/g claim 45 , 90-300 m/g claim 45 , 100-300 m/g claim 45 , 110-300 m/g claim 45 , 120-300 m/g ...

Glass Powder Blend, Glass Powder Paste and Photoelectric Package

The present invention provides a glass powder blend comprising glass powder and additives, wherein the additives comprise copper powder, and the copper powder accounts for 2-3 mass % based on the total amount of the glass powder blend in 100 mass %. The present invention also provides a glass powder paste and a photoelectric package. Due to the addition of copper powder to the glass powder, the melting point of the glass powder blend can be decreased, thereby lowering the temperature for melting the glass powder blend by using laser, and reducing the thermal stress generated during encapsulation. 1. A glass powder blend characterized by comprising glass powder and additives , wherein the additives comprise copper powder , and the copper powder accounts for 2-3 mass % based on the total amount of the glass powder blend in 100 mass %.2. The glass powder blend according to claim 1 , wherein the additives further comprise TeO2 powder which accounts for 3-6 mass % based on the total amount of the glass powder blend in 100 mass %.3. The glass powder blend according to claim 1 , wherein the glass powder comprises V2O5 powder and P2O5 powder claim 1 , wherein claim 1 , based on the total amount of the glass powder blend in 100 mass % claim 1 , the V2O5 powder accounts for 40-60 mass % claim 1 , and the P2O5 powder accounts for 18-36 mass %.4. The glass powder blend according to claim 1 , wherein the glass powder comprises PbO powder claim 1 , B2O3 powder and ZnO powder claim 1 , wherein claim 1 , based on the total amount of the glass powder blend in 100 mass % claim 1 , the PbO powder accounts for 45-60 mass % claim 1 , the B2O3 powder accounts for 20-40 mass % claim 1 , and the ZnO powder accounts for 10-15 mass %.5. The glass powder blend according to claim 1 , wherein the additives further comprise ceramic powder.6. The glass powder blend according to claim 1 , wherein each of the components in the glass powder blend has an average particle diameter between 0.3 μm and 4 ...

GLASS AND POLYMER RIGID ARTICLES

Multilayered molded articles comprising a glass layer interposed between first and second non-glass layers are described. These molded articles provide enhanced oxygen and moisture barrier protection to stored contents and are useful in medical, pharmaceutical, food, and research applications as containers and packaging materials. 1. A multi-layer three-dimensional molded article , comprising:a first layer;a second layer; and{'sub': 'g', 'a glass layer between the first layer and the second layer, wherein the glass layer comprises glass having a glass transition temperature (T) of about 500° C. or less.'}2. A molded article according to claim 1 , wherein the glass comprises an alkali phosphate glass.3. A molded article according to claim 1 , wherein the glass comprises a tin fluorophosphate glass.4. A molded article according to claim 1 , wherein the glass comprises claim 1 , on an elemental basis claim 1 , tin in a mole percentage within a range from 7.4 to 30 claim 1 , fluorine in a mole percentage within a range from 4.9 to 47.2 claim 1 , phosphorus in a mole percentage within a range from 6.7 to 23.1 claim 1 , and oxygen in a mole percentage within a range from 20.8 to 61.5.5. A molded article according to claim 1 , wherein the glass comprises claim 1 , on an elemental basis claim 1 , tin in a mole percentage within a range from 12 to 17.1 claim 1 , fluorine in a mole percentage within a range from 11.2 to 24.3 claim 1 , phosphorus in a mole percentage within a range from 12.1 to 19.6 claim 1 , and oxygen in a mole percentage within a range from 43.3 to 61.1.6. A molded article according to claim 1 , wherein the glass comprises claim 1 , on an elemental basis claim 1 , tin in a mole percentage within a range from 15.4 to 17.1 claim 1 , fluorine in a mole percentage within a range from 19.6 to 24.3 claim 1 , phosphorus in a mole percentage within a range from 14.2 to 16.6 claim 1 , and oxygen in a mole percentage within a range from 43.3 to 56.7. A molded article ...

ENAMEL COMPOSITION, METHOD FOR PREPARING ENAMEL COMPOSITION, AND COOKING APPLIANCE

An enamel composition, a method for preparing an enamel composition, and a cooking appliance are provided. The enamel composition may include 15 to 50 wt % of phosphorus pentoxide (PO); 5 to 20 wt % of one or more of lithium superoxide (LiO), sodium oxide (NaO), or potassium oxide (KO); 1 to 5 wt % of one or more of sodium fluoride (NaF), calcium fluoride (CaF), or aluminum fluoride (AlF); 1 to 35 wt % of one or more of magnesium oxide (MgO), barium oxide (BaO), or calcium oxide (CaO); and 5 to 30 wt % of one or more of manganese dioxide (MnO), molybdenum trioxide (MoO), bismuth oxide (BiO), or nickel oxide (NiO). The enamel composition may be cleaned without being putting it into water. 1. An enamel composition , comprising:{'sub': 2', '5, '15 to 50 wt % of phosphorus pentoxide (PO);'}{'sub': 2', '2', '2, '5 to 20 wt % of one or more of lithium superoxide (LiO), sodium oxide (NaO), or potassium oxide (KO);'}{'sub': 2', '3, '1 to 5 wt % of one or more of sodium fluoride (NaF), calcium fluoride (CaF), or aluminum fluoride (AlF);'}1 to 35 wt % of one or more of magnesium oxide (MgO), barium oxide (BaO), or calcium oxide (CaO); and{'sub': 2', '3', '2', '3, '5 to 30 wt % of one or more of manganese dioxide (MnO), molybdenum trioxide (MoO), bismuth oxide (BiO), or nickel oxide (NiO).'}2. The enamel composition of claim 1 , further comprising:{'sub': '2', '20 or less wt % of silicon dioxide (SiO).'}3. The enamel composition of claim 1 , further comprising:{'sub': 2', '3, '15 or less wt % of bismuth oxide (BO).'}4. The enamel composition of claim 1 , further comprising:{'sub': 2', '3, '1 to 20 wt % of aluminum oxide (AlO);'}{'sub': '2', '1 to 5 wt % of zirconium dioxide (ZrO); and'}1 to 20 wt % of one or more of tin oxide (SnO) or zinc oxide (ZnO).5. The enamel composition of claim 1 , further comprising:{'sub': '2', '2 or less wt % of titanium dioxide (TiO).'}6. The enamel composition of claim 1 , wherein claim 1 , when the enamel composition includes both molybdenum ...

ENAMEL COMPOSITION, METHOD FOR PREPARING ENAMEL COMPOSITION, AND COOKING APPLIANCE

An enamel composition, a method for preparing an enamel composition, and a cooking appliance are provided. The enamel composition may include 15 to 50 wt % of phosphorus pentoxide (PO); 1 to 20 wt % of silicon dioxide (SiO); 1 to 20 wt % of boron oxide (BO); 5 to 20 wt % of one or more of lithium superoxide (LiO), sodium oxide (NaO), or potassium oxide (KO); 1 to 5 wt % of one or more of sodium fluoride (NaF), calcium fluoride (CaF), or aluminum fluoride (AlF); 1 to 35 wt % of one or more of magnesium oxide (MgO), barium oxide (BaO), or calcium oxide (CaO); and 5 to 30 wt % of one or more of titanium dioxide (TiO), vanadium pentoxide (VO), molybdenum trioxide (MoO), or iron oxide (FeO). With such an enamel composition, cleaning may be performed at a low temperature for thermal decomposition, and contaminants, such as fat, may be more completely removed. 1. An enamel composition , comprising:{'sub': 2', '5, '15 to 50 wt % of phosphorus pentoxide (PO);'}{'sub': '2', '1 to 20 wt % of silicon dioxide (SiO);'}{'sub': 2', '3, '1 to 20 wt % of boron oxide (BO);'}{'sub': 2', '2', '2, '5 to 20 wt % of one or more of lithium superoxide (LiO), sodium oxide (NaO), or potassium oxide (KO);'}{'sub': 2', '3, '1 to 5 wt % of one or more of sodium fluoride (NaF), calcium fluoride (CaF), or aluminum fluoride (AlF);'}1 to 35 wt % of one or more of magnesium oxide (MgO), barium oxide (BaO), and calcium oxide (CaO); and{'sub': 2', '2', '5', '3', '2', '3, '5 to 30 wt % of one or more of titanium dioxide (TiO), vanadium pentoxide (VO), molybdenum trioxide (MoO), or iron oxide (FeO).'}2. The enamel composition of claim 1 , further comprising:{'sub': 2', '3, '1 to 20 wt % of aluminum oxide (AlO);'}{'sub': '2', '1 to 5 wt % of zirconium dioxide (ZrO); and'}1 to 10 wt % of one or more of tin oxide (SnO) or zinc oxide (ZnO).3. The composition for enamel of claim 1 , comprising:{'sub': 3', '2', '5, '5 to 15 wt % of one or more of MoOor VO.'}4. The enamel composition of claim 1 , comprising:{' ...

ENAMEL COMPOSITION, METHOD FOR PREPARING ENAMEL COMPOSITION, AND COOKING APPLIANCE

An enamel composition, a method for preparing an enamel composition, and a cooking appliance are provided. The enamel composition may include phosphorus pentoxide (PO) at 15 to 50 wt %; silicon dioxide (SiO) at 10 to 20 wt %; boron oxide (BO) at 1 to 15 wt %; one or more of lithium superoxide (LiO), sodium oxide (NaO), or potassium oxide (KO) at 5 to 20 wt %; one or more of sodium fluoride (NaF), calcium fluoride (CaF), or aluminum fluoride (AlF) at 1 to 5 wt %; one or more of magnesium oxide (MgO), barium oxide (BaO), or calcium oxide (CaO) at 1 to 35 wt %; and one or more of titanium dioxide (TiO), cerium dioxide (CeO), molybdenum trioxide (MoO), bismuth oxide (BiO), or copper oxide (CuO) at 10 to 25 wt %, such that a heating time required for cleaning may be shortened and oil contaminants may be completely removed. 1. An enamel composition , comprising:{'sub': 2', '5, 'phosphorus pentoxide (PO) at 15 to 50 wt %;'}{'sub': '2', 'silicon dioxide (SiO) at 10 to 20 wt %;'}{'sub': 2', '3, 'boron oxide (BO) at 1 to 15 wt %;'}{'sub': 2', '2', '2, 'one or more of lithium superoxide (LiO), sodium oxide (NaO), or potassium oxide (KO) at 5 to 20 wt %;'}{'sub': 2', '3, 'one or more of sodium fluoride (NaF), calcium fluoride (CaF), or aluminum fluoride (AlF) at 1 to 5 wt %;'}one or more of magnesium oxide (MgO), barium oxide (BaO), or calcium oxide (CaO) at 1 to 35 wt %; and{'sub': 2', '2', '3', '2', '3, 'one or more of titanium dioxide (TiO), cerium dioxide (CeO), molybdenum trioxide (MoO), bismuth oxide (BiO), or copper oxide (CuO) at 10 to 25 wt %.'}2. The enamel composition of claim 1 , further comprising:{'sub': 2', '3, 'aluminum oxide (AlO) at 1 to 20 wt %;'}{'sub': '2', 'zirconium dioxide (ZrO) at 1 to 5 wt %; and'}one or more of tin oxide (SnO) or zinc oxide (ZnO) at 1 to 10 wt %.3. The enamel composition of claim 1 , wherein the MoOis included at 1 to 10 wt % claim 1 , and the CuO is included at 1 to 5 wt %.4. The enamel composition of claim 1 , wherein when both the ...

ELECTRONIC DEVICE HOUSING, ELECTRONIC DEVICE, AND COMPOUND BODY

An electronic device housing, an electronic device and a compound body are provided. The electronic device housing comprises a frame; a sealing layer, disposed on at least a part of an outer surface of the frame, and including a plurality of sub-sealing layers laminated in sequence; and a back case, attached to the frame by the sealing layer, wherein two adjacent sub-sealing layers have different compositions. 1. An electronic device housing , comprising:a frame;a sealing layer, disposed on at least a part of an outer surface of the frame, wherein the sealing layer comprising a plurality of sub-sealing layers laminated in sequence; anda back case, attached to the frame by the sealing layer,wherein two adjacent sub-sealing layers of the plurality of sub-sealing layers have different compositions.2. The electronic device housing according to claim 1 , wherein a thermal expansion coefficient of the sealing layer is smaller than one of a thermal expansion coefficient of the frame and a thermal expansion coefficient of the back case and is greater than the other one of the thermal expansion coefficient of the frame and the thermal expansion coefficient of the back case claim 1 , a difference between the thermal expansion coefficient of the frame and the thermal expansion coefficient of the sealing layer or a difference between the thermal expansion coefficient of the sealing layer and the thermal expansion coefficient of the back case is no more than 10%.3. The electronic device housing according to claim 1 , wherein thermal expansion coefficients of the plurality of sub-sealing layers increase or decrease in a direction of distribution of the frame claim 1 , the sealing layer and the back case.4. The electronic device housing according to claim 1 , wherein the frame is a metal frame claim 1 , and the back case is an inorganic back case; andwherein a bonding promotion layer is further disposed between the metal frame and the sealing layer.5. The electronic device housing ...

COMPOSITION FOR PACKAGING ELECTRONIC DEVICE, PACKAGING METHOD, AND OLED DISPLAY APPARATUS

A composition for packaging an electronic device comprises a matrix and an adsorption material having a water vapor adsorption capability, and the adsorption material includes attapulgite and/or zeolite. By adding attapulgite and/or zeolite which have an adsorption effect to modify the formulation of the frit, the compositions for packaging an electronic device can effectively reduce the influence of water vapor on the electronic device, thereby effectively extending the lifetime of the packaged electronic device. 1. A composition for packaging an electronic device , comprising a matrix and an adsorption material having a water vapor adsorption capability , wherein , the adsorption material comprises attapulgite and/or zeolite.2. The composition for packaging the electronic device according to claim 1 , wherein claim 1 , the attapulgite has a molecular formula of{'br': None, 'sub': 5', '8', '20', '2', '2', '4', '2, '(MgCaFe)SiO(OH)(OH).4HO.'}3. The composition for packaging the electronic device according to claim 1 , wherein claim 1 , the zeolite has a general molecular formula of A[(AlO)x(SiO)y]·nHO claim 1 ,{'sup': +', '+', '+', '+, 'wherein, A is K, Ca, Naor Ba; y/x is a value of 1-5; n is a number of water molecules and is a positive integer not larger than 4.'}4. The composition for packaging the electronic device according to claim 1 , wherein claim 1 , a molar percent content of the attapulgite is 5 to 15% claim 1 , and/or that of the zeolite is 4 to 10%.5. The composition or packaging the electronic device according to claim 1 , wherein claim 1 , a total molar percent content of the attapulgite and the zeolite is 11-20%.6. The composition for packaging the electronic device according to claim 1 , wherein claim 1 , the matrix comprises at least one of VO claim 1 , PO claim 1 , TeOand any combination thereof.7. The composition for packaging the electronic device according to claim 6 , wherein claim 6 , a molar percent content of VOis 45-52% claim 6 , a molar ...

GLASS COMPOSITION FOR VITRIFYING MIXED WASTE PRODUCT AND METHOD FOR VITRIFYING MIXED WASTE PRODUCT USING SAME

This invention relates to the vitrification of radioactive waste products. According to this invention, a glass composition that is suitable for mixed waste products, which include flammable waste products, such as gloves, working clothes, plastic waste, and rubber, and low-level radioactive waste products, and a method of vitrifying the mixed waste products using the same are provided to significantly reduce the volume of radioactive waste products and to vitrify the mixed waste products using the glass composition, which is suitable for vitrifying the mixed waste products, thereby maximally delaying or completely preventing the leakage of radioactive materials from a glass solidified body. 1. A glass composition for vitrifying a mixed waste product , the glass composition comprising:{'sub': 2', '2', '3', '2', '3', '2', '2', '2', '2', '2, 'SiO, AlO, BO, CaO, KO, LiO, MgO, NaO, TiO, and VO.'}2. The glass composition of claim 1 , further comprising:{'sub': 2', '5', '2', '2', '3', '2', '2', '5', '2, 'AsO, CeO, CoO, FeO, MnO, PO, and ZrO.'}3. The glass composition of claim 1 , wherein the glass composition includes 40 to 50 wt % of SiO claim 1 , 11 to 16 wt % of AlO claim 1 , 8 to 15 wt % of BO claim 1 , 3 to 6 wt % of CaO claim 1 , 1 to 3 wt % of KO claim 1 , 1 to 3 wt % of LiO claim 1 , 1 to 3 wt % of MgO claim 1 , 15 to 19 wt % of NaO claim 1 , 0.5 to 3 wt % of TiO claim 1 , and 0.5 to 3 wt % of VO.4. The glass composition of claim 2 , wherein the glass composition includes 40 to 50 wt % of SiO claim 2 , 11 to 16 wt % of AlO claim 2 , 8 to 15 wt % of BO claim 2 , 3 to 6 wt % of CaO claim 2 , 1 to 3 wt % of KO claim 2 , 1 to 3 wt % of LiO claim 2 , 1 to 3 wt % of MgO claim 2 , 15 to 19 wt % of NaO claim 2 , 0.5 to 3 wt % of TiO claim 2 , 0.5 to 3 wt % of VO claim 2 , 0.5 to 3 wt % of AsO claim 2 , 0.5 to 3 wt % of CeO claim 2 , 0.1 to 2 wt % of CoO claim 2 , 1 to 3 wt % of FeO claim 2 , 0.01 to 0.1 wt % of MnO claim 2 , 0.1 to 1.0 wt % of PO claim 2 , and 0.5 to 3 wt ...

Conductive paste and method for producing solar cell by using the same

The present invention relates to a conductive paste and a method for producing solar cell by using the same. The conductive paste comprises at least silver powders and a composite glass frit comprising a first type of glass frit containing lead oxides and silicon oxides and a second type of glass frit containing tellurium oxides and zinc oxides wherein the first type of glass frit and the second type of glass frit are in a weight ratio of 93:7 to 44:56.

METHOD FOR MANUFACTURING WAVELENGTH CONVERSION MEMBER AND WAVELENGTH CONVERSION MEMBER

Provided are a method for manufacturing a wavelength conversion member that can suppress the reaction between inorganic nanophosphor particles and glass to suppress the deterioration of the inorganic nanophosphor particles, and the wavelength conversion member. The method for manufacturing a wavelength conversion member according to the present invention includes the steps of: forming inorganic protective films on surfaces of inorganic nanophosphor particles and mixing the inorganic nanophosphor particles having the inorganic protective films formed thereon with glass powder and firing a resultant mixture in a temperature range where the inorganic protective films survive. 1. A method for manufacturing a wavelength conversion member , the method comprising the steps of:forming inorganic protective films on surfaces of inorganic nanophosphor particles; andmixing the inorganic nanophosphor particles having the inorganic protective films formed thereon with glass powder and firing a resultant mixture in a temperature range where the inorganic protective films survive.2. The method for manufacturing a wavelength conversion member according to claim 1 , wherein the inorganic protective films are SiO-based protective films.3. The method for manufacturing a wavelength conversion member according to claim 1 , wherein the inorganic protective film is formed on a surface of an aggregate formed of a plurality of the inorganic nanophosphor particles.4. The method for manufacturing a wavelength conversion member according to claims 1 , wherein the inorganic protective films are formed by applying a sol solution for forming the inorganic protective films to the surfaces of the inorganic nanophosphor particles and then drying the sol solution.5. The method for manufacturing a wavelength conversion member according to claim 1 , wherein the temperature range is not more than 350° C.6. The method for manufacturing a wavelength conversion member according to claim 1 , wherein the ...

GLASS FRITS FOR ION-EXCHANGEABLE GLASSES

Strengthened glass substrates with glass fits and methods for forming the same are disclosed. According to one embodiment, the present invention provides a glass frit with a coefficient of thermal expansion less than or equal to the coefficient of thermal expansion of the glass substrate where it is going to be painted. The glass frit of the present invention has similar ion exchange properties to the glass substrate that is going to be used to paint with the glass frit allowing the glass substrate to be ion-exchanged. The glass frit of the present invention is mixed with an organic carrier. 2. The glass frit composition of claim 1 , wherein said glass frit composition is a colored glass frit composition.3. A glass substrate comprising:a sintered glass frit on at least a portion of at least one surface of said glass substrate; [{'claim-ref': {'@idref': 'CLM-00001', 'claim 1'}, 'a glass frit composition according to ; and'}, 'an organic carrier;', 'wherein the glass frit composition has a coefficient of thermal expansion less than or equal to that of the glass substrate; and, 'wherein the sintered glass frit is formed from a glass frit paste comprisingwherein the entire glass substrate, including the at least a portion where the sintered glass frit is placed, is ion exchanged.4. The glass substrate of claim 3 , wherein the proportion of glass frit composition to organic carrier is greater than 60:40 claim 3 , and preferably about 70:30.5. The glass substrate of claim 3 , wherein the ion-exchanged glass substrate has a depth of layer greater than or equal to 10 μm and a compressive stress greater than or equal to 400 Mpa.6. A method for forming a glass frit on an ion exchangeable glass substrate claim 3 , the method comprising:{'claim-ref': {'@idref': 'CLM-00001', 'claim 1'}, 'providing a glass frit composition according to , wherein said glass composition has a coefficient of thermal expansion less than or equal to that of the glass substrate;'}milling the glass frit ...

Ultra low melting glass frit and fibers

Disclosed herein are methods for forming low melting point glass fibers comprising providing a glass feedstock comprising a low melting point glass and melt-spinning the glass feedstock to produce glass fibers, wherein the glass transition temperature of the glass fibers is less than or equal to about 120% of the glass transition temperature of the glass feedstock. The disclosure also relates to method for forming low melting point glass frit further comprising jet-milling the glass fibers. Low melting point glass frit and fibers produced by the methods described above are also disclosed herein.

FEEDTHROUGH

An electric energy production device or an electric energy storage device including a housing and a feed-through. The feed-through includes at least one body which has at least one opening through which the at least one conductor in an electrically insulating material is fed. The insulating material has a layer structure of at least two layers wherein a top layer being arranged towards the outside of the electric energy production device or the electric energy storage device consists of a sealing glass and an inner layer one of comprises and consists of a further glass material or glass ceramic material. The electrically insulated material is bonded with at least one of the base body and the conductor, wherein the sealing glass one of includes and consists of titanium glass. 2. The electric energy production device or electric energy storage device according to claim 1 , wherein the layer structure comprises three layers in the form of a sandwich structure claim 1 , wherein the top layer and a bottom layer consists of the sealing glass.3. The electric energy production device or electric energy storage device according to or claim 1 , wherein the inner layer one of includes or consists of a phosphate glass.5. The electric energy production device or electric energy storage device according to claim 1 , wherein the electric energy production device or the electric energy storage device is at least one of a battery claim 1 , a lithium-ion battery claim 1 , a lithium-ion accumulator and a capacitor.6. The electric energy production device or electric energy storage device according to claim 1 , wherein said conductor is a substantially pin-shaped conductor.7. The electric energy production device or electric energy storage device according to claim 1 , wherein said light metal is one of aluminum claim 1 , magnesium claim 1 , and titanium claim 1 , and said light metal alloy is one of an aluminum alloy claim 1 , a magnesium alloy claim 1 , a titanium alloy claim 1 , and ...

COMPOSITION FOR FORMING N-TYPE DIFFUSION LAYER, METHOD FOR FORMING N-TYPE DIFFUSION LAYER, METHOD OF PRODUCING SEMICONDUCTOR SUBSTRATE WITH N-TYPE DIFFUSION LAYER, AND METHOD FOR PRODUCING PHOTOVOLTAIC CELL ELEMENT

A composition for forming an n-type diffusion layer, comprising glass particles that comprise a donor element, a dispersing medium, and an organometallic compound; a method of forming an n-type diffusion layer; a method of producing a semiconductor substrate with n-type diffusion layer; and a method of producing a photovoltaic cell element. 1. A composition for forming an n-type diffusion layer , comprising: glass particles that comprise a donor element; a dispersing medium; and an organometallic compound.2. The composition for forming an n-type diffusion layer according to claim 1 , wherein the organometallic compound comprises a silicon atom.3. The composition for forming an n-type diffusion layer according to claim 1 , wherein the organometallic compound comprises at least one selected from the group consisting of a metal alkoxide claim 1 , a silicone resin and an alkylsilazane compound.4. The composition for forming an n-type diffusion layer according to claim 1 , wherein the organometallic compound comprises a metal alkoxide claim 1 , and the metal alkoxide comprises a silicon alkoxide.5. The composition for forming an n-type diffusion layer according to claim 1 , wherein the organometallic compound comprises a metal alkoxide claim 1 , and the metal alkoxide comprises a silane coupling agent.6. The composition for forming an n-type diffusion layer according to claim 1 , wherein the organometallic compound comprises a silicone resin.7. The composition for forming an n-type diffusion layer according to claim 6 , wherein the silicone resin comprises dimethyl polysiloxane.8. The composition for forming an n-type diffusion layer according to claim 1 , wherein the organometallic compound comprises an alkylsilazane compound.9. The composition for forming an n-type diffusion layer according to claim 1 , wherein the donor element is at least one selected from the group consisting of P (phosphorus) and Sb (antimony).10. The composition for forming an n-type diffusion ...

Glass composition and cooking appliance

Provided is a glass composition comprising a glass frit containing P2O5, BaO, ZnO, group I-based oxide and group II-based oxide, wherein the P2O5 is contained in an amount of 20 wt % to 55 wt % based on a total weight of the glass frit, wherein each of the BaO and ZnO is contained in an amount of 2 to 30% by weight based on the total weight of the glass frit, wherein the group I-based oxide is contained in an amount of 5 to 20% by weight based on the total weight of the glass frit, wherein the group II-based oxide is contained in an amount of 1 to 15% by weight based on the total weight of the glass frit.

ANTIMONY-FREE GLASS, ANTIMONY-FREE FRIT AND A GLASS PACKAGE THAT IS HERMETICALLY SEALED WITH THE FRIT

An antimony-free glass suitable for use in a frit for producing a hermetically sealed glass package is described. The hermetically sealed glass package, such as an OLED display device, is manufactured by providing a first glass substrate plate and a second glass substrate plate and depositing the antimony-free frit onto the first substrate plate. OLEDs may be deposited on the second glass substrate plate. An irradiation source (e.g., laser, infrared light) is then used to heat the frit which melts and forms a hermetic seal that connects the first glass substrate plate to the second glass substrate plate and also protects the OLEDs. The antimony-free glass has excellent aqueous durability, good flow, low glass transition temperature and low coefficient of thermal expansion. 1. A glass article , comprising:a glass substrate; [{'sub': 2', '5, 'VO≧40 mole % and ≦52.5 mole %;'}, {'sub': 2', '5, 'PO≧15 mole % and <25 mole %;'}, 'ZnO≧0 mole % and ≦10 mole %;', {'sub': 2', '3, 'FeO>0 mole % and <25 mole %;'}, {'sub': '2', 'TiO>0 mole % and <25 mole %;'}, {'sub': 2', '3, 'BO>0 mole % and ≦20 mole %; and'}], 'a frit sealing material attached to the glass substrate plate, the frit sealing material including an antimony-free glass comprising{'sub': 2', '2', '3', 'g, 'wherein TiO+FeOis in a range from 15 mole % to 30 mole %, and a Tof the antimony-free glass is ≦365° C.'}2. The glass article according to claim 1 , wherein the antimony-free glass comprises:{'sub': 2', '5, 'VO≧40 mole % and ≦50 mole %;'}{'sub': 2', '5, 'PO≧20 mole % and <23 mole %;'}ZnO≧2 mole % and ≦5 mole %;{'sub': 2', '3, 'FeO≧10 mole % and ≦20 mole %;'}{'sub': '2', 'TiO≧5 mole % and ≦20 mole %;'}{'sub': 2', '3, 'BO≧1 mole % and ≦20 mole %.'}3. The glass article according to claim 1 , wherein the Tof the antimony-free glass is 350° C.4. The glass article according to claim 1 , wherein a CTE of the sealing material substantially matches a CTE of the glass substrate plate.5. The glass article according to claim 1 ...

Glass ceramic composite electrolyte for low temperature solid oxide fuel cell

The present disclosure provides a glass ceramic composite electrolyte comprising gadolinium doped ceria and glass composite with desired ionic conductivity in the temperature range of 400 to 600 ° C., suitable for applications in solid oxide fuel cells. Also disclosed is a process for the preparation of the glass ceramic composite electrolyte.

GLASS COMPOSITION CO-FIREABLE WITH TITANIA FOR SEALING LARGE-AREA DYE-SENSITIZED SOLAR CELL

The present invention relates to a glass material for sealing a large-area dye-sensitized solar cell and, more specifically, to a glass material capable of binding to a large area uniformly and very strongly without reacting with en electrolyte. According to the present invention as described above, the glass material is expected to have effects of uniformly sealing a dye-sensitized solar cell, securing stable chemical properties against a reaction with an electrolyte, and having physical strength suitable for large-area binding, and thus can improve reliability and lifetime of solar cell products. 1. A glass composition for sealing a dye-sensitized solar cell , comprising (PO , +ZnO)—VO—TeO ,wherein{'sub': 2', '5', '2', '5', '2, '(PO+ZnO) are present in 50 to 65 mol %, VOis present in 30 to 45 mol %, TeOis present in 5 to 20 mol %,'}{'sub': 2', '5', '2, 'VO/TeOhas a value of 2 to 6 based on a molar ratio, and'}{'sub': 2', '3', '2', '3', '2', '3, 'at least one selected from AlO, BOand SbOis comprised in an amount more than 0 mol % and less than or equal to 10 mol %.'}2. The glass composition for sealing a dye-sensitized solar cell according to claim 1 , wherein the at least one selected from AlO claim 1 , BOand SbOpartly replaces the (PO+ZnO).3. The glass composition for sealing a dye-sensitized solar cell according to claim 1 , which has a firing temperature of 400 to 500° C.4. A paste for sealing a dye-sensitized solar cell claim 1 , comprising: the glass composition according to ; and an organic vehicle. This research was conducted by Orion Co., Ltd. under the support of the Korea Technology & Information Promotion Agency for SMEs of the Small and Medium Business Administration (Option-to-purchase new product development project; Development of glass frit material for sealing large-area DSSC; Project serial number: 1425097431).The present disclosure relates to a glass material for sealing a large-area dye-sensitized solar cell, more specifically, to a glass ...

Flexible Glass/Metal Foil Composite Articles and Production Process Thereof

A flexible article made of glass and metal foil, as well as the production thereof, are provided. The flexible article is a multilayered structure having at least one glass layer and one metal foil layer, and the shear strength between glass and metal foil is above 1 MPa/mm 2 . The glass layer of said flexible article has high electrical resistivity at ambient temperature, low roughness, low thickness, good adherence to metal foil, and the glass in the glass layer has high temperature stability and low flowing temperature, and the thermal expansion coefficient (20 to 300° C.) is 1×10 −6 /K to 25×10 −6 /K. The whole article is flexible and can be bent, and the curvature radius of the bent flexible article is above 1 mm.

Encapsulating Material and Multilayered Glass Panel Using Same

The present invention provides a highly reliable multilayered glass panel and an encapsulating material for achieving the highly reliable multilayered glass panel. The encapsulating material includes lead-free low melting glass particles containing vanadium oxide and tellurium oxide, low thermal expansion filler particles, and glass beads as a solid content. A volume fraction of the glass beads in the solid content is not less than 10% to not more than 35%, and a volume fraction of the lead-free low melting glass particles in the solid content is larger than a volume fraction of the low thermal expansion filler in the solid content. 1. An encapsulating material comprising:lead-free low melting glass particles containing vanadium oxide and tellurium oxide;low thermal expansion filler particles; andglass beads as a solid content,wherein a volume fraction of the glass beads in the solid content is not less than 10% to not more than 35%; anda volume fraction of the lead-free low melting glass particles in the solid content is larger than a volume fraction of the low thermal expansion filler particles in the solid content.2. The encapsulating material according to claim 1 ,{'sub': '50', 'wherein an average diameter (D) of the glass beads is not less than 50 μm to not more than 200 μm.'}3. The encapsulating material according to claim 1 ,wherein a volume fraction of the glass beads in the solid content is not less than 20% to not more than 30%.4. The encapsulating material according to claim 1 ,wherein a volume fraction of the lead-free low melting glass particles in the solid content is not less than 35%.5. The encapsulating material according to claim 1 ,wherein the lead-free low melting glass particles further contain silver oxide.6. The encapsulating material according to claim 1 ,wherein the lead-free low melting glass particles further contain at least one kind of tungsten oxide, barium oxide, potassium oxide, and phosphorus oxide.7. The encapsulating material ...

Thick-Film Aluminum Electrode Paste with Pretreatment before Metal Plating for Fabricating Chip Resistor

A thick-film aluminum (Al) electrode paste is provided to fabricate a chip resistor. The paste is a mixture of a vanadium-zinc-boron series glass (VO—ZnO—BOor BaO—ZnO—BO) along with a metal oxide, aluminum granules, and an organic additive, whose proportions are separately 3˜30 wt %, 0.1˜15 wt %, 50˜70 wt %, and 10˜20 wt %. After being stirred through three rollers and filtered, the paste is pasted on an alumina ceramic substrate. The pasted substrate is dried and sintered for forming a thick-film aluminum electrode. Meanwhile, before processing metal plating that follows, an anti-plating pretreatment is performed. Therein, surface irregularities and nonconductive alumina on the surface are removed. Thus, the electrode obtains smooth flat surface and low oxygen content. The characteristics of the chip resistor using the thick-film aluminum electrode are equivalent to those using thick-film printed silver electrodes and those using thick-film printed copper electrodes sintered in a reducing atmosphere. 1. A composition of thick-film aluminum (Al) electrode paste , said composition being of a conductive Al paste to obtain a terminal electrode of a chip resistor on an Al ceramic substrate , said composition comprising an RO-zinc(Zn)-boron(B)-based glass , a metal oxide (MO) , Al granules , and an organic additive ,{'sub': 2', '5', '2', '3', '2', '3, 'wherein, in the total weight of said RO—Zn—B-based glass, said MO, said Al granules, and said organic additive, said RO—Zn—B-based glass has a content of 3˜30 wt %, said MO has a content of 0.1˜15 wt %, said Al granules has a content of 50˜70 wt %, and said organic additive has a content of 1020 wt %; and said RO—Zn—B-based glass is selected from a group consisting of a vanadium(V)—Zn—B-based glass (VO—ZnO—BO) and a barium(Ba)—Zn—B-based glass (BaO—ZnO—BO).'}2. The composition according to claim 1 ,{'sub': 2', '2', '2', '3', '2', '2', '3', '2', '3', '2', '2', '2', '2', '3', '2', '2', '3', '2', '3', '2', '2', '2', '2', '3', ...

Enamel

Изобретение относитс  к составам дл  эмалировани  стальных деталей газовой аппаратуры. С целью смещени  интервала обжига в область низких температур при обеспечении стабильности белизны и блеска эмаль содержит следующие компоненты, мас.%: SIO 2 35,8-37,5 The invention relates to compositions for enameling steel parts of gas apparatus. In order to shift the firing interval to low temperatures while ensuring the stability of whiteness and gloss, the enamel contains the following components, wt%: SIO 2 35.8-37.5 TIO 2 16,0-17,7 TIO 2 16.0-17.7 B 2O 3 20,7-25,0 B 2O 3 20.7-25.0 AL 2O 3 2,9-5,2 AL 2O 3 2.9-5.2 NA 2O 12,4-14,6 NA 2O 12.4-14.6 K 2O 1,6-1,8 K 2O 1.6-1.8 MGO 1,2-1,6 MGO 1.2-1.6 P 2O 5 2,5-4,5. Температура варки эмали 1280-1300°С, обжига покрытий 740-780°С, интервал стабильности белизны 80-100°С при пониженных температурах оплавлени  эмалевого сло , белизна покрыти  84,8-86%, блеск 63-66,5%. 3 табл. P 2 5 2.5-4.5. Cooking temperature of enamel is 1280-1300 ° C, calcination of coatings 740-780 ° C, whiteness stability interval 80-100 ° C at lower temperatures of melting of the enamel layer, whiteness of the coating 84.8-86%, gloss 63-66.5%. 3 tab.

Glaze composition

Изобретение относитс  к керамической промышленности, в частности к производству майоликовых и фа нсовых изделий. Целью изобретени   вл етс  расширение интервала обжига, повышени  микротвердости и снижение коэффициента линейного термического расширени . Дл  этого глазурь содержит, мас.%: SIO 2 47,54-49,43 The invention relates to the ceramic industry, in particular to the production of majolica and fax products. The aim of the invention is to expand the burning range, increase the microhardness and decrease the linear thermal expansion coefficient. For this glaze contains, wt%: SIO 2 47.54-49.43 AL 2 O 3 7,45-9,22 AL 2 O 3 7.45-9.22 B 2 O 3 22,70-23,75 B 2 O 3 22.70-23.75 FE 2 O 3 7,56-8,46 FE 2 O 3 7.56-8.46 TIO 2 0,01-0,02 TIO 2 0.01-0.02 CAO 2,75-2,88 CAO 2.75-2.88 MGO 0,32-1,05 MGO 0.32-1.05 NA 2 O 4,47-4,64 NA 2 O 4.47-4.64 K 2 O 0,91-1,52 K 2 O 0.91-1.52 P 2 O 5 0,10-0,12 P 2 O 5 0.10-0.12 Y 2 O 5 1,85-2,12 Y 2 O 5 1.85-2.12 SO 3 0,53-0,60. Интервал обжига глазури составл ет 980-1080°С, микротвердость 795-824 кг/мм 2 , коэффициент линейного термического расширени  (4,7-5,1) . 10 -6 град -1 . 4 табл. SO 3 0.53-0.60. The glaze firing interval is 980-1080 ° C, the microhardness is 795-824 kg / mm 2 , the coefficient of linear thermal expansion (4.7-5.1) . 10 -6 degrees -1 . 4 tab.

A substrate for the penetration of a conductor, and a housing member of a housing comprising such a substrate, especially a battery housing.

Frit for enamel coating for steel

Эмаль

Изобретение относитс  к составам беспигментных эмалей и может быть использовано дл  получени  покрытий на издели х хоз йственно-бытового назначени  и газовой аппаратуры. С целью достижени  устойчивой табачной окраски и повышени  р.астекаемости, эмаль содержит, мас.%: SiOi 33,0- 38,0; AljOj 3,5-8,5; BjOj 15 5-18,0; 15,5-19,2; PjO 5-5,3-6, 3,0-7,7; CaO 3,5-6,4; 0,2-3,5; ZnO 3,3-5,8; CrjOj 0,5-2,7. Эмалевое покрытие имеет табачный цвет, интервал обжига 780-820 с, растекаемость при 800&amp;deg;С 33-35 мм, КТР (100,9-108,2) 1/град, отраженный блеск 64-67%. 2 табл.

Коричнева эмаль

Изобретение относитс  к составам бесфтористых беспигментных цветных эмалей и может быть использовано дл  получени  антикоррозийных силикатных покрытий на издели х хоз йственно-бытового назначени  и газовой аппаратуры. Цель - охрана окружающей среды и повышение чистоты цвета. Коричнева  эмаль содержит, мас.%: Si02 25-34; №20 16-18; P20s 6-10, В20з 17- 18,4; Ре20з 2-4; Сг20з 1,9-3,8; ZnO 7,5-11; 1-2,5; ТЮ 2-6,3; ВаО 0,5-1 Zr02 0,5-2,8. Полученна  эмаль обладает следующими свойствами: чистота цвета (83-84)%, коэффициент зеркального отражени  (температура обжига 780&amp;deg;С) (60-64)%, КТЛР

用于馈通导体的基体以及壳体的、尤其具有这种基体的电池壳体的壳体部件

本发明涉及具有至少一个开口的基体，至少一个功能元件在玻璃或玻璃陶瓷材料中穿过基体的开口，以便与由轻金属、尤其是铝构成的壳体连接。本发明的特征在于，基体至少部分地由轻金属、优选铝合金、尤其是铝或铝合金构成，其在加热到大于520℃直至最大560℃的温度经过大于60分钟、优选达到30分钟之后屈服极限大于40 N /mm 2 、优选大于50 N /mm 2 、尤其大于80 N /mm 2 、尤其在80 N /mm 2 直至150 N /mm 2 的范围内。

Glaze

Изобретение относитс  к составам глазурей дл  фасадных плиток скоростного обжига и может быть использовано в производстве строительной керамики. Целью изобретени   вл етс  повышение  ркости и снижение ТКЛР. Дл  этого глазурь содержит, мас.%: SIO 2 42,38 - 43,94 The invention relates to glaze compositions for facade tiles of high-speed firing and can be used in the manufacture of building ceramics. The aim of the invention is to increase the brightness and decrease the thermal expansion coefficient. For this glaze contains, wt%: SIO 2 42.38 - 43.94 AL 2 O 3 12,23 - 12,36 AL 2 O 3 12.23 - 12.36 FE 2 O 3 0,55 - 0,82 FE 2 O 3 0.55 - 0.82 CAO 11,74 - 12,79 CAO 11.74 - 12.79 MGO 5,88 - 7,39 MGO 5.88 - 7.39 K 2 O 0,88 - 1,50 K 2 O 0.88 - 1.50 NA 2 O 0,55 - 0,62 NA 2 O 0.55 - 0.62 B 2 O 3 20,82 - 21,02 B 2 O 3 20.82 - 21.02 MNO 0,02 - 0,04 MNO 0.02 - 0.04 FEO 0,76 - 1,28 FEO 0.76 - 1.28 P 2 O 5 0,20 - 0,34 P 2 O 5 0.20 - 0.34 TIO 2 0,08 - 0,14, FЪ 0,4 - 0,5 TIO 2 0.08 - 0.14, Fb 0.4 - 0.5 SO 3 0,07 - 0,11 SO 3 0.07 - 0.11 ZNO 0,1 - 0,5. Яркость глазури 60,0 - 60,7%, ТКЛР (54,5 - 56,2) . 10 -7 , °С -1 . 2 табл. ZNO 0.1 - 0.5. The brightness of the glaze is 60.0 - 60.7%, TCLE (54.5 - 56.2) . 10 -7 , ° C -1 . 2 tab.

Фритта дл безгрунтового эмалевого покрыти

Изобретение относитс  к составам безгрунтовых эмалей, предназначенных дл  эмалировани  стальных изделий, и может быть использовано в нефтегазовой промышленности дл  защиты трубопроводов. С целью снижени  коэффициента термического расширени  и повышени  кислото- стойкости, фритта дл  безгрунтового эмалевого покрыти  содержит, мас.%: 5Ю2 57-65; В20з 8,1-10,1; TI02 2,0-4.0; СаО 2,4-3,2, СоО 0,3-0,8; N10 0,9-1,5; Na20 13,2-14,8; К20 2,4-3,3; №зА1Р6 1.4-3,0; Сг20з 0,5-1,3; P20s 1,0-1,8; V205 0,6-1,4. Эмалевое покрытие имеет коэффициент объемного термического расширени  3 а(253,6-271,9). 107 1/град, кислотостой- кость 0,017-0,019 г/м2.ч, интервал обжига 750-900&amp;deg;С, термостойкость 420-430&amp;deg;С, прочность на удар 0,6 кгм, поверхностное нат жение 248,3-261.5 нм, 2 табл.

Enamel

Enamel

Сущность изобретени ; эмаль содержит , мас.%: оксид кремни  20,0-22,8; оксид бора 18,5-19,4; оксид фосфора 5,1-7,9; оксид натри  18.0-20,6; оксид магни  2,0-3,0, оксид титана 10,4-12,4; оксид алюмини  12,2-16,2; оксид кальци  1,3-2,2- оксид цинка 2,4-3,0; оксид лити  1,5-2,5. Характеристика эмали: температура варки 1200-1230&amp;deg;С, температура обжига 720- 740&amp;deg;С, цвет белый, коэффициент диффузного отражени  89-91 %. 2 табл. Summary of the Invention; enamel contains, wt%: silicon oxide 20.0-22.8; boron oxide 18.5-19.4; phosphorus oxide 5.1-7.9; sodium oxide 18.0-20.6; magnesium oxide 2.0-3.0, titanium oxide 10.4-12.4; alumina 12.2-16.2; calcium oxide 1.3-2.2 - zinc oxide 2.4-3.0; lithium oxide 1.5-2.5. Characteristics of the enamel: the cooking temperature is 1200-1230 ° C, the firing temperature is 720-740 ° C, white color, the diffuse reflection coefficient is 89-91%. 2 tab.