ПРОИЗВОДНЫЕ БЕНЗОЛА, СПОСОБЫ ИХ ПОЛУЧЕНИЯ И СОДЕРЖАЩИЕ ИХ ФАРМАЦЕВТИЧЕСКИЕ КОМПОЗИЦИИ

Изобретение относится к новым производным бензола формулы (I), где А представляет собой группу, выбранную из следующих: -С≡С-, -СН=СН-; -СН2-СН2-; n равно 1 или 2; Х представляет собой атом водорода, хлора или фтора, или метильную, или метоксигруппу; Y представляет собой атом водорода, или атом хлора, или фтора; R1 представляет собой циклогексильную группу, монозамещенную, дизамещенную, тризамещенную или тетразамещенную метильной группой; фенильную группу, монозамещенную или дизамещенную атомом фтора или хлора или метоксигруппой; циклогептильную, трет-бутильную, дициклопропилметильную, 4-тетрагидропиранильную или 1- или 2-адамантильную или адамантан-2-ольную группу; либо R1 представляет собой фенильную группу, причем в этом случае Х и Y оба представляют собой атом хлора; r2 представляет собой атом водорода или (С1-С4)алкильную группу; r3 представляет собой (С5-С7)циклоалкил; и соли этих соединений, образованные присоединением фармацевтически приемлемых кислот, а также их сольваты и гидраты ...

ПРОИЗВОДНЫЕ АМИНОМАСЛЯНОЙ, АМИНОПЕНТАНОВОЙ И АМИНОГЕКСАНОВОЙ КИСЛОТ

Изобретение относится к производным аминомасляной, аминопентановой и аминогексановой кислот общей формулы I где R1 - -COOR10; - (CH2)m-CONHOR10, -CONHNHR10, -(CH2)nSR50 или -Y-P (OR51)2; m = 0, 1, 2; n = 0-3; каждый из R2, R3, R4, R5, R6 и R7 независимо является водородом, С1-8 алкилом, С2-8 алкенилом, -OR11, -SR11, -NR12R13, Циклом 1, С1-8 алкилом, замещенным -OR11, -SR11, -NR12R13, -COR14, гуанидино или Циклом 1, или С2-8 алкенилом, замещенным -OR11, -SR11, -NR12R13, -COR14, гуанидино или Циклом 1, или R3 и R4, взятые вместе, представляют С1-8 алкилен, R5 и R6, взятые вместе, представляют С1-8 алкилен, R3 и R6, взятые вместе, представляют С1-8 алкилен, R2 и R3, взятые вместе, представляют С2-8 алкилен, R4 и R5, взятые вместе, представляют С2-8 алкилен или R6 и R7, взятые вместе, представляют С2-8 алкилен, или (1) R8 представляет собой 1) водород, 2) С1-8 алкил, 3) С1-8 алкоксикарбонил, 4) С1-8 алкил, замещенный -OR26, -SR26, -NR27R28 или -COR29, или 5) С1-8 алкоксикарбонил, замещенный ...

БИЦИКЛИЧЕСКОЕ АРОМАТИЧЕСКОЕ СОЕДИНЕНИЕ, ФАРМАЦЕВТИЧЕСКАЯ И КОСМЕТИЧЕСКАЯ КОМПОЗИЦИИ

Изобретение относится к новым биоароматическим соединениям общей формулы I, где значения R1, R2, R3, X и Ar указаны в п.1 формулы. Они обладают активностью в областях дифференциации и пролиферации клеток. Описывается также фармацевтическая композиция, предназначенная для лечения дерматологических, ревматических, респираторных, сердечно-сосудистых и офтальмологических заболеваний, а также и косметическая композиция для гигиены тела и для ухода за волосами. 3 с. и 13 з.п.ф-лы, 4 ил.

СПОСОБ ПОЛУЧЕНИЯ АДАМАНТАНА

Изобретение относится к способу получения адамантана (трицикло[3.3.1.1]декана) осуществлением реакции изомеризации в две стадии с использованием эндо-тетрагидродициклопентадиена (трицикло[5.2.1.0]декана) или эндо-тетрагидродициклопентадиена (трицикло[5.2.1.0]декана) и экзо-тетрагидродициклопентадиена (трицикло[5.2.1.0]декана) в качестве исходного вещества. Способ включает стадии: использования одного HF катализатора или двух катализаторов из HF катализатора и BFкатализатора в отсутствие растворителя, на первой стадии реакции изомеризации эндо-тетрагидродициклопентадиена (трицикло[5.2.1.0]декана) в экзо-тетрагидродициклопентадиен (трицикло[5.2.1.0]декан); и использования HF катализатора и BFкатализатора в отсутствие растворителя на второй стадии реакции изомеризации экзо-тетрагидродициклопентадиена (трицикло[5.2.1.0]декан) в адамантан (трицикло[3.3.1.1]декан. При этом двухстадийная реакция изомеризации протекает в жидкой фазе, получаемый в реакции раствор находится в жидкой фазе, и выход ...

ПРОИЗВОДНЫЕ ОКТАГИДРОНАФТАЛИНОКСИМА, ФАРМАЦЕВТИЧЕСКАЯ КОМПОЗИЦИЯ, СПОСОБ ЛЕЧЕНИЯ И СПОСОБ ИХ ПОЛУЧЕНИЯ

Производные октагидронафталиноксима пригодны для фармацевтической композиции ингибирующей расстройства, возникающие в результате нарушения баланса холестерина. Игибирование достигается в дозе 1-10 мг в день. Производные октагидронафталиноксима формулы I, где х-С1-C10-алкил; А-С1-С10-алкилен; R - водород; Y - водород, фенил, возможно замещенный заместителями, включающими: галоген С1 -С4-алкокси, или представляет гетероциклическую группу с 5 или 6 кольцевыми атомами, 1-3 из которых азот и/или кислород и/или сера. Гетероциклическая группа возможно замещена по крайней мере одним С1-C5-алкилом. Описывается фармацевтическая композиция для ингибирования биосинтеза/холестерина, где в качестве активного соединения она содержит соединение формулы I или его фармацевтически приемлемые соли или сложные эфиры в эффективном количестве. Предложен способ ингибирования расстройств, возникающих в результате нарушения баланса холестерина, путем введения млекопитающим соединение формулы I и способ получения ...

СПОСОБ ПОЛУЧЕНИЯ МЕМАНТИНА И ПРОМЕЖУТОЧНОГО ПРОДУКТА

Изобретение относится к способу получения N-формил-1-амино-3,5-диметиладамантана - промежуточного продукта в полном способе получения 1-амино-3,5-диметиладамантан гидрохлорида (мемантина). Предложенный способ включает стадии: (а) взаимодействие 1,3-диметиладамантана со смесью кислот, содержащей концентрированную серную кислоту и концентрированную азотную кислоту, где на одну весовую часть 1,3-диметиладамантана, измеренного в г, использовали от 1 до 6 объемных частей серной кислоты, измеренной в мл; (b) взаимодействие раствора стадии (а) с количеством формамида, изменяющимся от 1 до 5 молярных эквивалентов на один моль депротонированного 1,3-диметиладамантана стадии (а), для получения N-формил-1-амино-3,5-диметиладамантана; причем на стадии (b) молярное отношение общего количества кислоты, т.е. молярного количества серной кислоты и молярного количества азотной кислоты, взятых вместе, к молярному количеству формамида равно по меньшей мере 1,5. Также предложен способ получения мемантина высокой ...

ФЕНИЛЭТИЛ- И ФЕНИЛПРОПИЛАМИНОВЫЕ СОЕДИНЕНИЯ, СПОСОБ ИХ ПОЛУЧЕНИЯ И ФАРМАЦЕВТИЧЕСКИЙ ПРЕПАРАТ

Описываются новые соединения формулы I, которые будут полезными при лечении психитрических нарушений, например шизофрении и других психозов, патологического страха, депрессии и маниакально-депрессивных психозов, в которой Z представляет собой насыщенную или ненасыщенную цепь с 3-6 атомами углерода, m является числом 2 или 3, R1 представляет собой атом водорода или С1-C4-алкил нормального или разветвленного строения, R2, R3 и R13 находятся в орто-, мета- или параположении фенильного кольца, являются одинаковыми или разными и выбраны из следующих групп: Н, ОН, OR14, галогена, CO2R9, СN, СF3, NO2, СОСH3, OSO2CF3, OSO2СН3, CONR10R11, OCOR12, где R9, R12 и R14 представляют собой C1-C4-алкил нормального или разветвленного строения, R10 и R11, одинаковые или разные, представляют собой водород или C1-C6-алкил нормального или разветвленного строения, в которой R представляет собой группу формулы Ia, в которой R4 и R5 являются одинаковыми или разными, и когда они разные, то представляют собой атом ...

ПСЕВДОПЕПТИДЫ ИЛИ ИХ СОЛИ, СПОСОБЫ ИХ ПОЛУЧЕНИЯ, ФАРМАЦЕВТИЧЕСКАЯ КОМПОЗИЦИЯ

Использование: в медицине для профилактики и лечения тромбоза. Сущность изобретения: псевдопептиды или их соли формулы I: A - NH - (CH2)m - x - y - CH (CH2 - R1) NHB, где R1 : COON, COOL1 , X = CH2- или R1 и X вместе - >CH - O - CO; y = -/CH2/m-, m = 1 или 2, A = -CO-/CH2/p - C6H4 - C 1 = NH1 NH2, где p = 0 или 1; B = -CO - /CH2/q - R3, где q = 1 или 2; R3 = /C1 - C4/ алкил, 1-адамантил, /C1 - C4/ алкоксифенил или B = -SO2 - (CH2)r - R4, где r = 0,1 или 2, R4 = n - /C1 - C4/ алкоксифенил; 2 способа получения соединений I; фармацевтическая композиция, содержащая в качестве активного ингредиента псевдопептид формулы I или его соль в эффективном количестве. 4 н.пункта, 4 з, пункта формулы. 2 с. и 6 з.п. ф-лы, 2 табл.

ПОЛИЕНОВЫЕ СОЕДИНЕНИЯ, ФАРМАЦЕВТИЧЕСКАЯ И КОСМЕТИЧЕСКАЯ КОМПОЗИЦИЯ НА ИХ ОСНОВЕ

Изобретение относится к новым полиеновым соединениям формулы I, где R1 - COR9; R2, R4, R6 - водород; R3, R5, R10, R11 - водород или низший алкил; R7 - циклоалифатический радикал или низший алкил; R8 - радикал -O-CH2-OCH2-CH2 -O-CH3 или OR11; R4 и R6 взятые вместе могут образовывать с соседним бензольным циклом нафталиновый цикл; R9 - O-R10, а также их солям и их оптическим и геометрическим изомерам. Соединения I обладают значительной активностью в области дифференциации и пролиферации клеток и могут найти применение при местном и системном лечении дерматологических расстройств, связанных с нарушением кератинизации, дерматологических или других заболеваний с воспалительной и/или иммуноаллергической компонентой. 3 c. и 8 з.п. ф-лы, 2 ил., 1 табл.

ПРОЛЕКАРСТВО ПРОИЗВОДНОГО АМИНОКИСЛОТЫ

АГЕНТЫ, НАРУШАЮЩИЕ КЛЕТОЧНУЮ РЕПЛИКАЦИЮ, И ИХ ПРИМЕНЕНИЕ ДЛЯ ИНГИБИРОВАНИЯ ПАТОЛОГИЧЕСКИХ СОСТОЯНИЙ

... 1. Применение соединения, соответствующего формуле (LXVII) ! ! в которой ! R21 означает аралкил или гетероаралкил, необязательно замещенный; ! R22 означает арил или гетероаралкил, необязательно замещенный; и ! Х представляет собой О или S; ! и их фармацевтически приемлемые соли, ! для получения лекарственного средства, снижающего клеточную репликацию, для лечения, улучшения или предупреждения заболеваний, состояний и/или нарушений. ! 2. Применение по п.1, при котором R21 означает бензил, необязательно замещенный, и R22 является арилом, необязательно замещенным. ! 3. Применение по п.1 или 2, при котором R21 имеет структуру, соответствующую формуле (LXVIII) ! ! R23, R24, R25, R26 и R27 независимо друг от друга означает Н, галоген, CN; NO2; NR′R′′; алкил, алкенил, алкинил; алкокси, алкоксиалкил; -OOC-R′′′; -COO-R′′′′′; арил, гетероарил, необязательно замещенные; ! где R′ и R′′ независимо друг от друга означают атом водорода, алкил, алкенил или алкинил, арил или гетероарил; необязательно замещенные ...

ПОЛИЕНОВЫЕ СОЕДИНЕНИЯ, ФАРМАЦЕВТИЧЕСКАЯ И КОСМЕТИЧЕСКАЯ КОМПОЗИЦИЯ НА ИХ ОСНОВЕ

Изобретение относится к новым полиеновым соединениям, фармацевтическим и косметическим композициям на их основе.

Полиаминные аналоги в качестве цитотоксических агентов

... 1. Цитотоксический полиаминный аналог, имеющий структуру R1-X-R2, где R1 и R2 - независимо Н или радикал, выбранный из группы, включающей прямой или разветвленный C1-10 алифатический, алициклический, одно- или многокольцевой ароматический, одно- или многокольцевой арил-замещенный алифатический, алифатически замещенный одно- или многокольцевой ароматический, одно- или многокольцевой гетероциклический, одно- или многокольцевой гетероциклически замещенный алифатический и алифатически замещенный ароматический, а также их галогенированные формы; Х - полиамин с двумя концевыми аминогруппами, -(CH2)3-NH- или -СН2-Ph-СН2-, при этом R1 и R2 - не являются одновременно незамещенными бензиловыми радикалами. 2. Аналог по п.1, отличающийся тем, что Х выбирают из группы, содержащей путресцин, спермидин и спермин. 3. Аналог по п.1, отличающийся тем, что Х является путресцином. 4. Аналог по п.3, отличающийся тем, что указанная структура представляет собой соединение, которое выбрано из группы, включающей ...

НОВЫЕ ПРОИЗВОДНЫЕ ПЕРОКСИДЫ, СПОСОБ ИХ ПОЛУЧЕНИЯ И ИХ ПРИМЕНЕНИЕ В МЕДИЦИНЕ И КОСМЕТИКЕ ДЛЯ ЛЕЧЕНИЯ ИЛИ ПРОФИЛАКТИКИ УГРЕЙ У ЧЕЛОВЕКА

... 1. Соединение следующей общей формулы (I):в которойR1 является низшим алкилом, высшим алкилом, циклоалкилом, циклоалкилалкилом, низшим алкокси, высшим алкокси, циклоалкилокси, циклоалкилалкокси, арилом, арилокси или моно- или диалкиламино;А является водородом или следующей последовательностью:R2 является низшим алкокси, высшим алкокси, циклоалкилокси, циклоалкилалкокси, арилокси или моно- или диалкиламино.2. Соединение по п.1, отличающееся тем, чтоа. R1 является низшим алкилом, циклоалкилом, циклоалкилалкилом, низшим алкокси, циклоалкилокси или моно- или диалкиламино;b. А является водородом или определенной группой такого типа:с. R2 является низшим алкокси, циклоалкилокси или моно- или диалкиламино.3. Соединение по п.1, отличающееся тем, чтоa. R1 является низшим алкилом, циклоалкилому циклоалкилалкилом, низшим алкокси или циклоалкилокси;b. А является водородом или определенной группой типа:c. R2 является низшим алкокси или циклоалкилокси.4. Соединение по любому из пп.1-3, выбранное из группы ...

ЗАМЕЩЕННЫЕ БЕНЗОИЛАМИНОИНДАН-2-КАРБОНОВЫЕ КИСЛОТЫ И РОДСТВЕННЫЕ СОЕДИНЕНИЯ

... 1. Соединение формулы Ia ! ! где A означает CH=CH или S; ! R23 означает водород, галоген, (C1-C4)-алкил, (C1-C4)-алкилокси, (C1-C4)-алкил-S- или нитро; ! R24 означает водород или галоген, когда A означает CH=CH, или водород, галоген, (C1-C4)-алкил, (C1-C4)-алкилокси, (C1-C4)-алкил-S- или нитро, когда A означает S; ! X означает N(H)C=O, N(H)S(O)2, C=ON(H) или S(O)2N(H); ! Y означает N(R11), S, O, C(R12)=C(R13), N=C(R14) или C(R15)=N, или конденсированный необязательно замещенный 5-7-членный карбоциклил; ! R11 означает водород, (C1-C10)-алкил, гидрокси-(C1-C10)-алкил-, (C1-C10)-алкилокси, (C1-C10)-алкил-S(O)m-, (C1-C10)-алкилкарбонил-, фенил, амино, (C1-C10)-алкиламино или ди((C1-C10)-алкил)амино; ! R12 означает водород, галоген, (C1-C10)-алкил, (C2-C10)-алкенил, (C3-C6)-циклоалкилокси, (C3-C10)-циклоалкенилокси, (C3-C6)-циклоалкил, (C3-C10)-циклоалкенил, (C3-C6)-циклоалкил[(C1-C4)-алкил или (C2-C4)-алкенил], (C3-C6)-циклоалкил(C1-C4)-алкилокси, гидрокси-(C1-C10)-алкил-, (C1-C10)-алкилокси ...

ГИДРОФОБНЫЕ ПОЛИАМИННЫЕ АНАЛОГИ И СПОСОБЫ ИХ ПРИМЕНЕНИЯ

... 1. Полиаминный аналог или производное, представленные формулой R-X-L-полиамин где R - прямой или разветвленный, насыщенный или ненасыщенный алифатический, карбоксилалкил, карбалкоксиалкил или алкокси С10-50; алициклический С1-8; одно- или многоядерный арил-замещенный или незамещенный алифатический, алифатически замещенный или незамещенный одно- или многоядерный ароматический, одно- или многоядерный гетероциклический, одно- или многоядерный гетероциклический алифатический; или арилсульфонил, "X" представляет собой -СО-, -SO2- или СН2-, а L - ковалентная связь или природная аминокислота, орнитин или 2,4-диаминомасляная кислота или их производное. 2. Полиаминный аналог или производное, представленные формулой II: где а, b и с независимо изменяются от 1 до 10, d и е независимо изменяются от 0 до 30, каждый Х независимо связан с атомом углерода (С) или серы (S), a R1 и R2 выбраны независимо из Н или из группы, включающей прямой или разветвленный, насыщенный или ненасыщенный алифатический, карбоксилалкил ...

PHENYLETHYL-UND PHENYLPROPYLAMINE

GLUTAMINSÄURE-DERIVATE, EIN VERFAHREN ZU IHRER HERSTELLUNG UND IHRE VERWENDUNG ZUR STEIGERUNG DES ERINNERUNGSVERMÖGENS UND DER LERNFÄHIGKEIT

PERFLUORADAMANTYLACRYLATVERBINDUNG UND ZWISCHENPRODUKT DAFÜR

CHEMOLUMINESZENTE 3-(SUBSTITUIERTE ADAMANT-2'-YLIDENE)1,2-DIOXETANE

Adamantan-Derivate, Verfahren zu deren Herstellung, diese enthaltende Mittel sowie deren Verwendung als Organoleptika und Deodorantien.

Verfahren zur Herstellung von Sulfoniumverbindungen und Methylthiophenylderivaten.

PHARMAZEUTISCH WIRKSAME VERBINDUNGEN UND METHODEN ZU IHRER ANWENDUNG

CYCLISCHE ACYLHARNSTOFFVERBINDUNGEN ENTHALTENDE KATALYSATOREN UND OXIDATIONEN UND NITRIERUNGEN VON ORGANISCHEN VERBINDUNGEN IN IHRER GEGENWART

BIAROMATISCHE VERBINDUNGEN UND IHRE ANWENDUNG IN MENSCHEN- UND TIERHEILKUNDE UND IN DER KOSMETIK.

CARBONSÄUREAMIDE MIT FUNGIZIDER WIRKUNG

CHEMILIMINESZENTE 1,2-DIOXETAN-VERBINDUNGEN.

AMINOSÄUREDERIVATE, DIESE VERBINDUNGEN ENTHALTENDE ARZNEIMITTEL UND VERFAHREN ZU IHRER HERSTELLUNG

NEUE VINYLSULFID-VERBINDUNGEN UND EIN VERFAHREN ZU IHRER HERSTELLUNG

POLYMERISIERBARE ADAMANTAN-DERIVATE UND VERFAHREN ZU IHRER HERSTELLUNG

ALPHA-ARYL-N-ALKYLNITRONE SOWIE DIESE ENTHALTENDE PHARMAZEUTISCHE ZUBEREITUNGEN

Verfahren zur Herstellung von Adamantanderivaten

Production of bridgehead-substituted diamines

... 1,4-Diaminobicyclo[2.2.2]octanes or 1,3-diaminotricyclo[3.3.1.13,7]decanes are made by heating, respectively, a 1,4-disubstituted bicyclo [2.2.2]octane of the formula or a 1,3-disubstituted tricyclo[3.3.1.13,7]decane of the formula in which formulae X and X1, which may be the same or different, are halogen, sulphate, phosphate, perchlorate, nitrate, alkanecarbonyloxy, arylcarbonyloxy, fluoroalkylcarbonyloxy, alkanesulphonyloxy or arylsulphonyloxy groups and the free valencies of the other nuclear carbon atoms are satisfied by hydrogen or monovalent hydrocarbon radicals, with ammonia at a temperature of from 80 DEG to 300 DEG C. The preferred compounds are those in which X and X1, are chlorine, bromine, iodine, benzenesulphonyloxy or p-toluenesulphonyloxy. At least 4 moles of ammonia per mole of starting material is used, the total pressure in the reactor being within the range of 50 to 3,000 atmospheres. Reaction times vary from 30 minutes to 30 hours ...

PROSTENOIC ACID DERIVATIVES AND METHOD FOR PREPARING SAME

... 1471070 Prostaglandins AMERICAN CYANAMID CO 29 April 1974 [11 May 1973] 18749/74 Heading C2C [Also in Division C3] The invention comprises prostaglandins of the Formula A wherein R 1 is C 1-4 alkoxy, #-hydroxy-C 1-4 alkoxy or #-tetrahydropyran-21-yloxy-C 1-4 alkoxy ; R 2 is H, C 1-4 alkyl or triphenylmethyl; R 3 is straight chain C 2-10 alkyl optionally substituted with 1 or 2 C 1-4 alkyl radicals, straight chain C 3-10 alkenylmethyl, optionally substituted by 1 or 2 C 1-4 alkyl radicals, C 4-9 cycloalkyl, C 5-10 alkylcycloalkyl, C 6-12 cycloalkyl-alkyl, in which the cycloalkyl is optionally substituted by a C 1-4 alkyl radical, C 5-9 cycloalkenyl, C 6-10 alkyl-cycloalkenyl, C 6-12 cycloalkenyl-alkyl in which the cycloalkenyl is optionally substituted by a C 1-4 alkyl radical, adamantyl or adamantyl-C 1-4 alkyl; R 4 is OH, C 1-12 alkoxy, C 1-12 alkoxy or 2-tetrahydropyranyloxy; R 3 is H or C 1-3 alkyl; V is >C=O, and Z is -(CH 2 ) n -, -(CH 2 ) n -C(R 5 ) 2 .CH 2 -, -(CH 2 ) n ...

Process for preparing 1-aminoadamantane and its hydrochloride

... 1 - Amino - adamantane and its hydrochloride are prepared by introducing a replaceable atom or group into adamantane in the 1-position, subjecting the 1-substituted adamantane to aminolysis to form the free base and, if desired, reacting the base with hydrogen chloride to form the hydrochloride. 1 - Bromo - adamantane is prepared by reacting adamantane with molecular bromine.

Substituted 2-phenyl-3-methoxypropenoate fungicides

Cck and gastrin receptor ligands

Improvements relating to derivatives of adamantane

Novel compounds of the formula and their salts with non-toxic acids, wherein A is an amino group of the formula in which R1 and R2 are each a C3- 12 alkenyl or alkynyl group having at least one CH2 group between the N-atom and the first olefinic or acetylenic bond or a C3- 8 cycloalkyl or C3- 9 cycloalkylmethyl group in which the cycloalkyl portion may carry one or two CH3 or C2H5 substituents, or R1 may also be hydrogen; and R1 and R2 together contain at most 12 carbon atoms, are made by (1) reacting 1-amino-adamantane with the appropriate halide R1 Hal and/or R2 Hal; (2) forming an N-cycloalkyl acylamido-adamantane by reacting 1-bromo-adamantane with an N-cycloakyl acylamide, e.g. N-cyclohexylacetamide, in the presence of silver sulphate and hydrolysing to give a product wherein R1 is hydrogen and R2 is a cycloalkyl group or (c) forming a 1-acylamino-adamantane e.g. 1-(4-methyl-3-hexen-1-oylamino) adamantane and reducing with LiAlH4. The products ...

Polymorphic form (I) of platinum (IV) complex

Compounds

Compounds of general formula (I): wherein R1, R2, R3, R4, R5a, R5b X1, X2, Z and Y are as defined herein are positive modulators of the calcium-activated chloride channel (CaCC), TMEM16A. The compounds are useful for treating diseases and conditions affected by modulation of TMEM16A, particularly respiratory diseases and conditions.

BICYLO(2.2.2)OCTANE DERIVATIVES

Method of making a templating agent

PROCESS FOR PRODUCING ALKYL ADAMANTANES

Lower-alkyladamantanes are obtained by reacting tetracyclo[6.2.1.1<3,6>.O<2,7>]dodecane or a lower alkyl derivative thereof and hydrogen in the presence of an H-Y type zeolite or a zeolite which has been subjected to ion-exchange treatment with at least one type of metal ions from the group of the alkaline earth metals and rare earth metals, as catalyst. The resulting lower-alkyladamantanes can be used for the preparation of synthetic lubricants, additives for lubricants, starting materials for monomers, pharmaceuticals and for intermediates for organic syntheses.

Formamide derivatives useful as adrenoceptor

Compounds for treatment of diseases

chemiluminescent 3-(substituted adamant-2'-ylidene) 1,2-dioxetanes

Guanidinobenzamides as MC4-R agonists

Compounds of formula (IA) and (IB) arc new where the variables R1 through R10 have the values set forth herein. Such compounds have use in treating diseases such as obesity and type Tl diabetes, and may be provided as pharmaceutical formulations in conjunction with a pliarmaceutically acceptable carrier- ...

Formamide derivatives useful as adrenoceptor.

IL-8 receptor antagonists.

This invention relates to novel compounds of Formula (I) to (VII), and compositions thereof, useful in the treatment of disease states mediated by the chemokine, Interleukin-8 (IL-8) ...

Compounds for treatment of diseases

Formamide derivatives useful as adrenoceptor

IL-8 receptor antagonists.

1,4-Diamino-2,3-Dihydroxybutanes.

Fungicides.

Guanidinobenzamides as mc4-r agonists

Il-8 receptor antagonists

Guanidinobenzamides as mc4-r agonists

Formamide derivatives useful as adrenoceptor

Compounds for treatment of diseases

ANTAGONISTS OF THE HUMAN INTERLEUKIN 8

GUANIDINOBENZAMIDE AS MC4-R AGONISTEN

CYCLOPROPYL CONDENSING DIPEPTIDYL PEPTIDASE IVHEMMER ON BASIS OF PYRROLIDIN, PROCEDURES FOR YOUR PRODUCTION AND YOUR USE

SALT, WHICH ARE SUITABLE FOR A SOUR GENERATOR, AS WELL AS CHEMICAL STRENGTHENED RESIST COMPOSITION, WHICH CONTAINS THIS

PROCEDURE FOR the PRODUCTION OF 1-AMINO-3,5DIMETHYLADAMANTAN-HYDROCHLORID

INHIBITORS THE DIPEPTIDYLPEPTIDASE IV ON ADAMANTYLGLYCINBASIS FOR THE TREATMENT OF DIABETES

PROCEDURE FOR THE IDENTIFICATION OF PROTEINS NON--PURPOSEFUL ON DRUGS

ISOCYANATE CONNECTION CONTAINING A ETHYLENISCH INSATIATED GROUP AND PROCEDURE FOR THEIR PRODUCTION, AS WELL AS A REACTIVE MONOMER, REACTIVE (METH) ACRYLATE POLYMER AND USE OF IT

PROCEDURE FOR THE PRODUCTION OF AMINOADAMANTANEN

SPHINGOLIPIDEN

PROCEDURE FOR the PRODUCTION of AROMATIC DERIVATIVES OF 1-ADAMANTAN

PROCEDURE FOR the USE OF Ä11CÜ CARBON MONOXIDE WITH the MARKING SYNTHESIS OF 11C-MARKIERTEN ESTERS BY PHOTO-INDUCED RADICAL ONES CARBONYLIERUNG

PROCEDURE FOR the PRODUCTION OF 6-Ä3 (1-ADAMANTYL) - 4-METHOXYPHENYLÜ-2-NAPHTOESÄURE

PROCEDURE FOR THE PRODUCTION OF ADAPALENE

NEW FLUORHALTIGE CONNECTION, FLUORHALTIGES POLYMER AND PROCEDURE FOR THE PRODUCTION OF THE CONNECTION

OCTAHYDRONAPHTHALENOXIM DERIVATIVES FOR THE INHIBIERUNG OF THE CHOLESTERIN BIO-SYNTHESIS, YOUR PRODUCTION AND USE

CHEMILIMINESZENTE 1,2-DIOXETAN-VERBINDUNGEN

DOPAMINE AGONISTEN

MORE OXIMETHER, PROCEDURES FOR YOUR PRODUCTION AND THESE CONNECTIONS CONTAINING FUNGICIDES.

AMINES, YOUR USE AND PRODUCTION.

WITH ORTHO ADAMANTYLGRUPPE SUBSTITUTED DIAROMATI CONNECTIONS, THESE CONTAINING PHARMACEUTICAL AND COSMETIC COMPOSITIONS AND USES

BIARYL PHOSPHOLIPASE a2 INHIBITORS

POLYENDERIVATE, THESE CONTAINING PHARMACEUTICAL AND COSMETIC COMPOSITIONS AND YOUR USE

SUBSTITUTED GUANIDINE AND DERIVATIVES OF IT AS MODULATORS OF THE RELEASE OF NEUROTRANSMITTERS AND NEW METHOD FOR THE IDENTIFICATION OF INHIBITORS OF THE NEUROTRANSMITTER RELEASE

GLOW AMINE ACID DERIVATIVES, A PROCEDURE FOR YOUR PRODUCTION AND YOUR USE FOR THE INCREASE OF THE MEMORY ABILITY AND THE ADAPTABILITY

ALICYCLI PHOSPHOLIPASE a2 INHIBITORS

POLYAMINE-SIMILAR AS CYTOTOXIC ACTIVE SUBSTANCES

POLYCYCLI DERIVATIVES TO THE CHANGE OF THE OPTICAL CHARACTERISTICS AND ÄTZBESTÄNDIGKEITSEIGNENSCHAFTEN

ANTIPSYCHOTI N-ARALKYL CYCLI AMINES

N-ACYLSULFONAMID-APOPTOSIs-PROMOTER

CONDENSED IMIDAZOLDERIVATE

NEW AROMATIC AND POLYCYCLI CONNECTIONS AND YOUR USE IN THE HUMAN OR VETERINARY MEDICINE AND IN KOSMETIKA

GASTRIN AND CCK ANTAGONIST

USE OF ALPHA-AMINOMETHYL-3,4 DICHLORBENZYLTHIOACEAMIDEN FOR THE PRODUCTION OF A DOPAMINE-RE+SEIZE-RESTRAINING MEDICINE AS WELL AS CONNECTIONS TO THE USE THE SAME

NEW GUANIDINDERIVATE, PROCEDURES FOR YOUR PRODUCTION AND YOUR USE AS DRUGS

CYCLOHEXANDIHARNSTOFF DERIVATIVES AND PROCEDURES FOR THEIR PRODUCTION

ADMANTAN DERIVATIVES

AMINOADAMANTAN DERIVATIVES AS THERAPEUTIC MEANS

Procedure for the production more again N' substituted N-Arylsulfonyl-urea

2-ADAMANTANMETHANAMIN CONNECTIONS TO the TREATMENT OF DEVIATIONS WITH GLUTAMATERGI TRANSMISSIONS

Light-driven rotary molecular motors

Compounds of Formula ( 1 ) are disclosed: C b is a carbocyclic or heterocyclic group having an atom within the cyclic structure selected from C, N, Si, and C r and singly bound to A. A is CR, COR, CSR, CNR 2 , CCN, CCONR 2 , CNO 2 , CNNAr, CX′, or N. C r is a chromophore having a substantially planar cyclic structure. The compounds function as nanometer-scale rotary molecular motors powered and controlled by light energy. The design of the molecular motor devices is flexible so that the rotary direction, drive light wavelength, and other physical characteristics can be varied. The compounds can be chemically functionalized to allow it to be integrated into or attached to a variety of structures. The device can be used in applications where mechanical power, positional control, and information encoding are to be generated at the size scale of individual molecules.

Administration of 6-[3-(1-adamantyl)-4-methoxyphenyl]-2-naphthoic acid for the treatment of dermatological disorders

Dermatological disorders having an inflammatory or proliferative component are treated with pharmaceutical compositions containing on the order of 0.3% by weight of 6-[3-(1-adamantyl)-4-methoxyphenyl]-2-naphthoic acid (adapalene) or salt thereof, formulated into pharmaceutically acceptable media therefor, advantageously topically applicable gels, creams or lotions.

Compounds, compositions, and methods for the treatment of beta-amyloid diseases and synucleinopathies

Dihydroxyaryl compounds and pharmaceutically acceptable esters, their synthesis, pharmaceutical compositions containing them, and their use in the treatment of β-amyloid diseases, such as observed in Alzheimer's disease, and synucleinopathies, such as observed in Parkinson's disease, and the manufacture of medicaments for such treatment.

Adamantyl diamide derivatives and uses of same

The present invention provides adamantyl-diamide derivatives of formula (I): wherein R 1 and R 2 are as defined herein, or a pharmaceutically acceptable salt thereof; and pharmaceutical compositions and methods using the same.

Preparation of 2,2-bis (fluoroalkyl) oxirane and preparation of photoacid generator therefrom

A 2,2-bis(fluoroalkyl)oxirane (A) is prepared by reacting a fluorinated alcohol (1) with a chlorinating, brominating or sulfonylating agent under basic conditions to form an oxirane precursor (2) and subjecting the oxirane precursor to ring closure under basic conditions. R 1 and R 2 are fluoroalkyl groups, R 3 and R 4 are hydrogen or monovalent hydrocarbon groups, X is chlorine, bromine or —OSO 2 R 5 group, and R 5 is alkyl or aryl.

Fluorine-Containing Sulfonate, Fluorine-Containing Sulfonate Resin, Resist Composition and Pattern Formation Method

According to the present invention, there is provided a fluorine-containing sulfonate resin having a repeating unit of the following general formula (3). In order to prevent deficiency such as roughness after pattern formation or failure in pattern formation, the fluorine-containing sulfonate resin incorporates therein a photoacid generating function and serves as a resist resin in which “a moiety capable of changing its developer solubility by the action of an acid” and “a moiety having a photoacid generating function” are arranged with regularity.

Adamantyl diamide derivatives and uses of same

The present invention provides adamantyl diamide derivatives of formula (I): wherein R 1 and R 2 are as defined herein, or a pharmaceutically acceptable salt thereof; and pharmaceutical compositions and methods using the same.

Synthesis of Tripodal Catechol Derivatives Having an Adamantyl Basic Framework for Functionalizing Surfaces

The present invention describes tripodal catechol derivatives with an adamantyl basic framework for the functionalisation of surfaces, methods for their production and use. The remaining fourth bridgehead position is easily suitable to be further functionalised via so-called click reactions, by way of example with biomolecules, dyes, radiomarkers, polyethylene glycol or active agents. The compounds according to the present invention have the general formula X-Ad[(CH 2 ) n —YZ] 3 , wherein A stands for the adamantyl skeleton, X stands for a group —(CH 2 ) p —R 5 , wherein p=0 to 10 and R 5 is selected from —H, —NH 2 , —NO 2 , —OH, —SH, —O—NH 2 , —NH—NH 2 , —N═C═S—, —N═C═O—, —CH═CH 2 , —C≡CH, —COOH, —(C═O)H, —(C═O)R 6 Y stands for —CH 2 —, —CH═CH—, —O—, —S—, —S—S—, —NH—, —O—NH—, —NH—O—, —HC═N—O—, —O—N═CH—, —NR 1 —, -aryl-, -heteroaryl-, —(C═O)—, —O—(C═O)—, —(C═O)—O—, —NH—(C═O)—, —(C═O)—NH—, —NR 1 —(C═O)—, —(C═O)—NR 1 —, —NH—(C═O)—NH—, —NH—(C═S)—NH—, R 1 stands for an alkyl group, R 6 for an alkyl, alkenyl, alkynyl, aryl or heteroaryl group, and Z stands for a catechol derivative. The production of the compounds occurs by reacting a compound X-Ad[(CH 2 ) n —Y′] 3 with a reagent Y″Z to the corresponding compound X-Ad[(CH 2 ) n —YZ] 3 and subsequently purifying the reaction product. Y′ and Y″ are hereby precursors of Y. The compounds according to formula (I) according to the present invention are suitable to be used in a method to functionalise surfaces. The X group of the compounds according to the present invention is suitable to be optionally coupled to an effector, for example, by means of click chemistry.

Radiation-sensitive resin composition, pattern-forming method, polymer, and compound

A radiation-sensitive resin composition includes a polymer component that includes one or more types of polymers, and a radiation-sensitive acid generator. At least one type of the polymer of the polymer component includes a first structural unit represented by a following formula (1). R 1 represents a hydrogen atom, a fluorine atom, a methyl group or a trifluoromethyl group. R 2 represents a linear alkyl group having 5 to 21 carbon atoms. Z represents a divalent alicyclic hydrocarbon group or an aliphatic heterocyclic group having a ring skeleton which has 4 to 20 atoms. A part or all of hydrogen atoms included in the alicyclic hydrocarbon group and the aliphatic heterocyclic group represented by Z are not substituted or substituted.

Compositions and processes of preparing and using the same

The present invention relates to compositions, for example, the DBU/Hexafluoroacetone hydrate salt, and processes of preparing and using the same for the modification of chemical compounds via the release of trifluoroacetate. The DBU/Hexafluoroacetone hydrate salt can perform trifluoromethylation reactions on chemical compounds, such as carbonyl group-containing compounds.

Modulators of atp-binding cassette transporters

The present invention relates to modulators of ATP-Binding Cassette (“ABC”) transporters or fragments thereof, including Cystic Fibrosis Transmembrane Conductance Regulator, compositions thereof, and methods therewith. The present invention also relates to methods of treating ABC transporter mediated diseases using such modulators.

S1P Receptors Modulators and Their Use Thereof

The invention relates to novel compounds that have SIP receptor modulating activity. Further, the invention relates to a pharmaceutical comprising at least one compound of the invention for the treatment of diseases and/or conditions caused by or associated with inappropriate SIP receptor modulating activity or expression, for example, autoimmune response. A further aspect of the invention relates to the use of a pharmaceutical comprising at least one compound of the invention for the manufacture of a medicament for the treatment of diseases and/or conditions caused by or associated with inappropriate SIP receptor modulating activity or expression such as autoimmune response.

Cyclic sulfonate compounds as photoacid generators in resist applications

Novel photoacid generator compounds are provided. Compositions that include the novel photoacid generator compounds are also provided. The present disclosure further provides methods of making and using the photoacid generator compounds and compositions disclosed herein. The compounds and compositions are useful as photoactive components in chemically amplified resist compositions for various microfabrication applications.

Salt, acid generator, resist composition and method for producing resist pattern

Disclosed are a salt represented by formula (I), an acid generator and a resist composition: wherein R 1 , R 2 and R 3 each represent I or F, R 4 , R 5 , R 6 , R 7 , R 8 and R 9 each represent a halogen atom, a hydroxy group, a haloalkyl group or a hydrocarbon group, X 1 , X 2 and X 3 each represent O or S, m1 and m7 represent an integer of 0 to 5, m2, m3, m4, m5, m6, m8 and m9 represent an integer of 0 to 4, in which 0≤m1+m7≤5, 0≤m2+m8≤4, 0≤m3+m9≤4, at least one of m1, m2, m3 represents an integer of 1 or more, X 4 represents a single bond, —CH 2 —, —O—, —S—, —CO—, —SO— or —SO 2 —, and AI − represents an organic anion.

Monomer, polymer, positive resist composition, and patterning process

A polymer comprising recurring units derived from a polymerizable monomer having two structures of hydroxyphenyl methacrylate having a hydroxy group substituted with an acid labile group is used as base resin in a positive resist composition, especially chemically amplified positive resist composition. The resist composition forms a resist film which is processed by lithography into a pattern of good profile having a high resolution, minimal edge roughness, and etch resistance.

Retinoid derivatives with antitumor activity

The present invention relates to compounds of formula (I) and to pharmaceutical compositions containing them: wherein meanings of the substituents are indicated in the description. Such compounds for use in the treatment of cancer and other diseases related to altered angiogenesis, such as arthritic pathology, diabetic retinopathy, psoriasis and chronic inflammatory disease, are also within the scope of the present invention.

Salts of Prostaglandin Analog Intermediates

The present invention relates to crystalline 1-adamantanamine salts, and polymorphic forms thereof, of prostaglandin analog intermediates of formula 3a, 4a and 6a, useful in the preparation of Tafluprost and Lubiprostone and processes for their preparation. The process includes combining 1-adamantanamine, water, an organic solvent, and a compound of Formula 3 or 6, thereby obtaining a suspension. The process also includes isolating the solid salt of Formula 3a or 6a from the suspension. 2. The crystalline salt of having the Formula 3a.3. The crystalline salt of claim 2 , wherein the salt is characterized by a Powder X-Ray Diffraction (PXRD) diffractogram comprising a peak claim 2 , expressed in degrees two-theta claim 2 , at 11.0+/−0.2 claim 2 , and at least four peaks claim 2 , expressed in degrees two-theta claim 2 , selected from the group consisting of: 3.7+/−0.2 claim 2 , 7.5+/−0.2 claim 2 , 8.1+/−0.2 claim 2 , 9.5+/−0.2 claim 2 , 12.9+/−0.2 claim 2 , 13.6+/−0.2 claim 2 , 15.1+/−0.2 claim 2 , 15.7+/−0.2 claim 2 , 17.0+/−0.2 claim 2 , and 20.5+/−0.2.4. The crystalline salt of claim 3 , wherein the PXRD diffractogram comprises peaks claim 3 , expressed in degrees two-theta claim 3 , at: 3.7+/−0.2 claim 3 , 7.5+/−0.2 claim 3 , 8.1+/−0.2 claim 3 , 9.5+/−0.2 claim 3 , 11.0+/−0.2 claim 3 , 12.9+/−0.2 claim 3 , 13.6+/−0.2 claim 3 , 15.1+/−0.2 claim 3 , 15.7+/−0.2 claim 3 , 17.0+/−0.2 and 20.5+/−0.2.5. The crystalline salt of claim 3 , wherein the salt is characterized by a Differential Scanning Calorimetry (DSC) thermogram comprising an endothermic peak having a peak onset at approximately 78° C.6. The crystalline salt of having the Formula 4a.702. The crystalline salt of claim 6 , wherein the salt is Form APO-I characterized by a Powder X-Ray Diffraction (PXRD) diffractogram comprising a peak claim 6 , expressed in degrees two-theta claim 6 , at approximately 5.6+/−. claim 6 , and at least four peaks claim 6 , expressed in degrees two-theta claim 6 , selected from ...

ORGANIC COMPOUND AND ORGANIC ELECTROLUMINESCENT ELEMENT COMPRISING SAME

The present invention relates to an adamantane derivative compound and an organic light-emitting diode (OLED) including the same, and more particularly, to an adamantane derivative compound capable of being used in an OLED and an OLED having excellent properties such as low voltage and high efficiency using the compound. 3. The compound of claim 1 , wherein X is C(R)(R).4. The compound of claim 1 , wherein Arand Arare a substituted or unsubstituted aryl group having 6 to 30 carbon atoms or a substituted or unsubstituted heteroaryl group having 3 to 30 carbon atoms.5. The compound of claim 1 , wherein Rand Rare a substituted or unsubstituted alkyl group having 1 to 30 carbon atoms claim 1 , a substituted or unsubstituted cycloalkyl group having 1 to 20 carbon atoms or a substituted or unsubstituted aryl group having 6 to 30 carbon atoms.6. The compound of claim 1 , wherein L is selected from the group consisting of a single bond claim 1 , a substituted or unsubstituted arylene group having 6 to 30 carbon atoms and a substituted or unsubstituted heteroarylene group having 6 to 30 nuclear carbon atoms.8. An organic light-emitting diode (OLED) claim 1 , comprising:a first electrode; and a second electrode placed opposite to the first electrode; and one or more organic material layers placed between the first electrode and the second electrode,{'claim-ref': {'@idref': 'CLM-00001', 'claim 1'}, 'wherein at least one of the one or more organic material layers includes the compound of .'}9. The OLED of claim 8 , wherein the organic material layer is selected from the group consisting of a hole injection layer claim 8 , a hole transfer layer claim 8 , a light emitting layer claim 8 , a hole blocking layer claim 8 , an electron transport layer and an electron injection layer.10. The OLED of claim 8 , wherein the organic material layer is a light emitting layer.11. The OLED of claim 8 , wherein the organic material layer is a hole injection layer claim 8 , a hole transfer layer ...

CYCLIC SULFONATE COMPOUNDS AS PHOTOACID GENERATORS IN RESIST APPLICATIONS

Novel photoacid generator compounds are provided. Compositions that include the novel photoacid generator compounds are also provided. The present disclosure further provides methods of making and using the photoacid generator compounds and compositions disclosed herein. The compounds and compositions are useful as photoactive components in chemically amplified resist compositions for various microfabrication applications. 2. The sulfonic acid derivative compound of wherein R claim 1 , R claim 1 , and Rare each independently an optionally substituted (C-C)aralkyl group; and X is H.3. The sulfonic acid derivative compound of wherein R claim 1 , R claim 1 , and Rare each independently an optionally substituted (C-C)aralkyl group; and X is —OH.4. The sulfonic acid derivative compound of wherein Rand Rare joined together along with the sulfur to which they are attached to form a ring; Ris an optionally substituted (C-C)aralkyl group; and X is H.5. The sulfonic acid derivative compound of wherein Rand Rare joined together along with the sulfur to which they are attached to form a ring; Ris an optionally substituted (C-C)aralkyl group; and X is —OH.6. (canceled)7. (canceled)12. The composition of wherein R claim 11 , R claim 11 , and Rare each independently an optionally substituted (C-C)aralkyl group; and X is H.13. The composition of wherein R claim 11 , R claim 11 , and Rare each independently an optionally substituted (C-C)aralkyl group; and X is —OH.14. The composition of wherein Rand Rare joined together along with the sulfur to which they are attached to form a ring; Ris an optionally substituted (C-C)aralkyl group; and X is H.15. The composition of wherein Rand Rare joined together along with the sulfur to which they are attached to form a ring; Ris an optionally substituted (C-C)aralkyl group; and X is —OH.16. The composition of wherein Rand Rare each independently an optionally substituted (C-C)aralkyl group; and X is H.17. The composition of wherein Rand Rare ...

COMPOUND, PHOTORESIST COMPOSITION COMPRISING SAME, PHOTORESIST PATTERN COMPRISING SAME, AND METHOD FOR MANUFACTURING PHOTORESIST PATTERN

The present specification provides a compound, a photoresist composition comprising the same, a photoresist pattern comprising the same, and a method for preparing a photoresist pattern. 4. The compound of claim 2 , wherein Xof Chemical Formula 3 is a substituted or unsubstituted phenyl group claim 2 , or CR claim 2 , and wherein Ris hydrogen claim 2 , a substituted or unsubstituted alkyl group claim 2 , a substituted or unsubstituted aryl group claim 2 , or a substituted or unsubstituted heterocyclic group.5. The compound of claim 2 , wherein Xof Chemical Formula 4 is C; or a substituted or unsubstituted Cto Calkyl group.7. The compound of claim 1 , wherein Q is an onium cation comprising an S claim 1 , I claim 1 , O claim 1 , N claim 1 , P claim 1 , Cl claim 1 , Br claim 1 , F claim 1 , As claim 1 , Se claim 1 , Sn claim 1 , Sb claim 1 , Te claim 1 , or Bi element.9. A photoresist composition comprising:{'claim-ref': {'@idref': 'CLM-00001', 'claim 1'}, 'the compound of ;'}a binder resin; anda solvent.10. The photoresist composition of comprising the compound in 1 parts by weight to 10 parts by weight based on 100 parts by weight of the photoresist composition.11. A photoresist pattern comprising the photoresist composition of .12. A method for preparing a photoresist pattern claim 9 , the method comprising:{'claim-ref': {'@idref': 'CLM-00009', 'claim 9'}, 'forming a photoresist layer by coating the photoresist composition of on a semiconductor substrate;'}selectively exposing the photoresist layer; anddeveloping the exposed photoresist layer.13. The method for preparing a photoresist pattern of claim 12 , wherein the selectively exposing of the photoresist layer is aligning a mask on the photoresist claim 12 , and exposing an area of the photoresist layer not covered by the mask to ultraviolet rays.14. The method for preparing a photoresist pattern of claim 12 , wherein the developing of the exposed photoresist layer is removing the exposed portion in the ...

ADAMANTANE DERIVATIVES FOR THE TREATMENT OF FILOVIRUS INFECTION

Compounds of structural Formula I were developed for the treatment of infections by filoviruses including Ebolavirus and Marburgvirus, wherein, R, R, R, X and Y are defined in the specification. 119-. (canceled)21. The compound of claim 20 , wherein:{'sup': 4', '5, 'X is C-A-D and Y is CRR.'}23. The compound of claim 22 , wherein:{'sup': 2', '11a', '11b', '12, 'sub': 1', '10', '1', '10', '1', '10', '3', '10', '5', '10', '1', '10', '2', 'n, 'Ris selected from hydrogen, (Cto C) alkyl, (Cto C) alkenyl, (Cto C) alkynyl, (Cto C) cycloalkyl, (Cto C) cycloalkenyl, (Cto C) alkoxy, —(CH)C(O)N(RR), and —C(O)R, wherein'}{'sub': 1', '10', '1', '10', '1', '10', '3', '10', '5', '10', '1', '10, 'sup': '13', 'each of the said (Cto C) alkyl, (Cto C) alkenyl, (Cto C) alkynyl, (Cto C) cycloalkyl, (Cto C) cycloalkenyl, and (Cto C) alkoxy is optionally substituted with at least one Rgroup;'}{'sup': '3', 'sub': 1', '10', '1', '10', '1', '10', '3', '10', '5', '10, 'Ris selected from hydrogen, (Cto C) alkyl, (Cto C) alkenyl, (Cto C) alkynyl, (Cto C) cycloalkyl, and (Cto C) cycloalkenyl, wherein'}{'sub': 1', '10', '1', '10', '1', '10', '6', '10', '5', '10, 'sup': '13', 'each of the said (Cto C) alkyl, (Cto C) alkenyl, (Cto C) alkynyl, (Cto C) cycloalkyl, (Cto C) cycloalkenyl is optionally substituted with at least one Rgroup.'}24. The compound of claim 23 , wherein:{'sup': '3', 'Ris hydrogen.'}31. The method of claim 30 , wherein the infection is associated with filovirus selected from the group consisting of Ebolavirus and Marburgvirus.32. The method of claim 31 , where the filovirus is Ebolavirus.33. The method of claim 31 , including administering a therapeutic amount of a therapeutic agent selected from the group consisting of Ribavirin claim 31 , viral RNA-dependent-RNA polymeras inhibitors including favipiravir claim 31 , Triazavirin claim 31 , Remdesivir (GS-5734) claim 31 , monoclonal antibody therapies including claim 31 , ZMapp claim 31 , REGN3470-3471-3479 claim 31 , mAb 114 ...

COMPOUND, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN

A compound represented by the formula (I). 2. The compound according to claim 1 , wherein{'sup': '1', 'Wis an adamantanediyl group or a cyclohexanediyl group.'}4. The compound according to claim 1 , wherein Ais a single bond.5. The compound according to claim 1 , wherein Ris a Cto Cfluorinated alkyl group.6. The compound according to claim 1 , wherein{'sup': 2', 'f, 'sub': 2', 'n, 'Ris —(CH)—R,'}where n represents an integer of 1 to 6, and{'sup': 'f', 'sub': 1', '6, 'Rrepresents a Cto Cperfuloroalkyl group.'}7. The compound according to claim 1 , wherein{'sup': 2', 'fa', 'fb, 'Ris —CH(R)(R);'}{'sup': fa', 'fb', 'fa', 'fb, 'sub': 1', '6, 'where Rand Reach independently represent a Cto Cperfuloroalkyl group, provided that Rand Rhave 11 or less of carbon atoms in total.'} This application is a Divisional of co-pending application Ser. No. 14/835,102 filed on Aug. 25, 2015, which claims priority under 35 U.S.C. § 119(a) to Patent Application No. 2014-170762 filed in Japan on Aug. 25, 2014 and Patent Application No. 2014-189934 filed in Japan on Sep. 18, 2014, all of which are hereby expressly incorporated by reference into the present application.The present invention relates to a compound, a resin, a composition, a resist composition and a method for producing the resist pattern.A resist composition which contains a resin having the following structural unit is described in Patent document of JP 2012-53460A.The present invention provides following inventions of <1> to <10>.<1> A compound represented by formula (I).wherein Rrepresents a hydrogen atom, a halogen atom or a Cto Calkyl group that may have a halogen atom;Rrepresents a Cto Cfluorinated saturated hydrocarbon group;Wrepresents a Cto Cdivalent alicyclic hydrocarbon group;Aand Aeach independently represent a single bond or *-A-X-(A-X)-;Aand Aeach independently represent a Cto Calkanediyl group;Xand Xeach independently represents —O—, —CO—O— or —O—CO—;a represents 0 or 1; and* represents a binding site to an ...

Modulators of atp-binding cassette transporters

The present invention relates to modulators of ATP-Binding Cassette (“ABC”) transporters or fragments thereof, including Cystic Fibrosis Transmembrane Conductance Regulator, compositions thereof, and methods therewith. The present invention also relates to methods of treating ABC transporter mediated diseases using such modulators.

THERAPEUTIC COMPOUNDS AND METHODS OF USE THEREOF

The invention provides compounds having the general Formula (I); 3. The compound or pharmaceutically acceptable salt of claim 1 , wherein Ris selected from the group consisting of F claim 1 , Cl claim 1 , Br claim 1 , I claim 1 , —CN claim 1 , —OH claim 1 , —NH claim 1 , Calkyl and Chaloalkyl.5. The compound or pharmaceutically acceptable salt of claim 1 , wherein ring “A” is a Cheterocycle and is selected from the group consisting of azetidine claim 1 , pyrrolidine claim 1 , piperidine claim 1 , morpholine claim 1 , homopiperazine claim 1 , piperazine and 8-azabicyclo[3.2.1]octane claim 1 , and is optionally substituted.16. The compound or pharmaceutically acceptable salt of claim 1 , wherein:{'sup': 'o', 'sub': '1-6', 'Ris hydrogen or Calkyl;'}{'sup': 1', '2, 'sub': '1-8', 'Rand Rare each independently selected from the group consisting of hydrogen and Calkyl;'}{'sup': '3', 'Ris selected from the group consisting of hydrogen and F;'}{'sup': 4', '1', '4, 'sub': '1-4', 'Ris selected from the group consisting of hydrogen or Calkyl; or Rand Rare combined to form a 3- to 7-membered heterocycle ring as described above;'}{'sup': '5', 'sub': 1-8', '3-8, 'Ris selected from the group consisting of F, Cl, Calkyl, and Ccycloalkyl;'}{'sub': '1-6', 'L is Calkylene;'}the subscript m represents the integer 0 or 1;{'sup': 1', '2', '1', '2, 'Xand Xare each independently selected from the group consisting of absent and —O—, and wherein if the subscript m is 0 then one of Xor Xis absent;'}the ring “A” in is selected from the group consisting of:{'sub': '2-11', 'claim-text': [{'sup': 'AA', 'sub': 1-8', '1-8', '1-8, 'Ris independently selected from the group consisting of Calkyl, Chaloalkyl, Cheteroalkyl, F, Cl, Br and I;'}, 'n is an integer from 0 to 5;', {'sup': A', 'RA', 'RA', 'A', 'RA', 'RA', 'RAi', 'RA, 'sub': 6-10', '1-2', '1-2', '6-10', '1-4', '1-4', '1-4', '2', '1-4, 'Ris selected from the group consisting of (Caryl)-(X)—, and (5- to 10-membered heteroaryl)-(X)—, wherein said ...

Imaging histone deacetylases with a radiotracer using positron emission tomography

wherein R1 is a moiety including a positron emitter; R2 represents hydrogen, or substituted or unsubstituted alkyl, or substituted or unsubstituted aryl, or substituted or unsubstituted heteroaryl; and n is an integer selected from 0 or 1. In one version of the compound of formula (I), R1 is a moiety including an adamantyl group.

Resist composition, method of forming resist pattern, novel compound, and acid generator

A resist composition including a base component (A) which exhibits changed solubility in an alkali developing solution under action of acid and an acid-generator component (B) including a compound represented by (b1-1), a compound represented by (b1-1′) and/or a compound represented by (b1-1″) (R 1 ″-R 3 ″ represents an aryl group or an alkyl group, provided that at least one of R 1 ″-R 3 ″ represents a substituted aryl group being substituted with a group represented by (b1-1-0), and two of R 1 ″-R 3 ″ may be mutually bonded to form a ring with the sulfur atom; X represents a C 3 -C 30 hydrocarbon group; Q 1 represents a carbonyl group-containing divalent linking group; X 10 represents a C 1 -C 30 hydrocarbon group; Q 3 represents a single bond or a divalent linking group; Y 10 represents —C(═O)— or —SO 2 —; Y 11 represents a C 1 -C 10 alkyl group or a fluorinated alkyl group: Q 2 represents a single bond or an alkylene group; and W represents a C 2 -C 10 alkylene group).

Compound, polymer compound, resist composition, and patterning process

The present invention provides a compound shown by the formula (1), wherein R 1 represents a hydrogen atom, a fluorine atom, a methyl group, or a trifluoromethyl group; A represents a single bond or a linear divalent hydrocarbon group having 1 to 30 carbon atoms or a branched or cyclic divalent hydrocarbon group having 3 to 30 carbon atoms, in which the hydrocarbon group may contain a heteroatom, and a part or all of hydrogen atoms in the hydrocarbon group may be substituted with a group containing a heteroatom; “n” represents 0 or 1, provided that “n” is 0 when A is a single bond; and M + represents a cation. This compound is suitable as a raw material of a polymer compound usable for a base resin of a resist composition that has high resolution and high sensitivity and is excellent in balance of lithography properties such as LWR and CDU.

COMPOSITIONS AND METHODS TO DETECT GLUA1 IN BRAIN AND TO IDENTIFY THE PRESENCE OF GLUA1-MEDIATED PTSD

The present invention provides compositions and methods for detecting GluA1, as a subunit protein and/or as a GluA1-containing, GluA2-lacking AMPAR complex. The invention further provides composition and methods for detecting and/or diagnosing PTSD. The invention further relates to compositions that can be detected using radiological imaging techniques, and processes for performing such imaging techniques using the compositions, to identify elevated GluA1 expression or activity in a subject, which is a biological marker of PTSD. 2. A method of detecting GluA1 levels , or GluA1-containing , GluA2-lacking AMPAR levels , in an amygdala of a subject , comprising:administering to the subject a first amount of a radiolabeled composition comprising a ligand of GluA1 or a ligand of a GluA1-containing, GluA2-lacking AMPAR effective for detection of the radiolabeled composition in the amygdala of the subject using radiological imaging; anddetermining or quantifying, by the radiological imaging of the radiolabeled composition in the amygdala of the subject, GluA1 subunit density or GluA1-containing, GluA2-lacking AMPAR density in the amygdala of the subject.3. A method of detecting Post-Traumatic Stress Disorder (PTSD) in a subject , comprising:administering to the subject a first amount of a radiolabeled composition comprising a ligand of GluA1 or a ligand of a GluA1-containing, GluA2-lacking AMPAR effective for detection of the radiolabeled composition in an amygdala of the subject using radiological imaging; anddetermining or quantifying, by the radiological imaging of the radiolabeled composition in the amygdala of the subject, GluA1 subunit density or GluA1-containing, GluA2-lacking AMPAR density in the amygdala of the subject, and comparing the density so determined or quantified with a predetermined baseline level, wherein a density greater than the predetermined baseline level indicates PTSD in the subject.4. A method of detecting GluA1-mediated Post-Traumatic Stress ...

THERAPEUTIC COMPOUNDS AND METHODS OF USE THEREOF

The invention provides a method of treating a disease or condition in a mammal by administering a compound having the general formula I: 5. The method of claim 1 , wherein ring “B” is selected from the group consisting of cyclobutyl claim 1 , cyclopentyl claim 1 , and cyclohexyl.14. The method of claim 1 , wherein wherein n is 2 claim 1 , 3 claim 1 , 4 claim 1 , or 5.15. The method of claim 1 , wherein ring “A” is a 6-15 membered carbocycle claim 1 , a 6-10 membered aryl claim 1 , or a 4-6 membered heterocycle.18. The method of claim 1 , wherein Xis absent; Xis —O—; m is 1; and -(L)- is an optionally substituted Calkylene.19. The method of claim 1 , wherein wherein:ring “A” is a 6-15 membered carbocycle, a 6-10 membered aryl, or a 4-6 membered heterocycle;{'sup': '1', 'Xis absent;'}{'sup': '2', 'Xis —O—;'}m is 1; and{'sub': '1-4', '-(L)- is an optionally substituted Calkylene.'} This application is a divisional of U.S. application Ser. No. 16/685,335, filed 15 Nov. 2019, which is a continuation of U.S. application Ser. No. 15/896,970, filed 14 Feb. 2018, now abandoned, which is a continuation of International Application No. PCT/US2016/048477, filed 24 Aug. 2016, which claims the benefit of U.S. Provisional Application No. 62/210,891, filed 27 Aug. 2015. The entire content of the applications referenced above are hereby incorporated by reference.The present invention relates to organic compounds useful for therapy in a mammal, and in particular to inhibitors of sodium channel (e.g., NaV1.7) that are useful for treating sodium channel-mediated diseases or conditions, such as pain, as well as other diseases and conditions associated with the modulation of sodium channels.Voltage-gated sodium channels are transmembrane proteins that initiate action potentials in nerve, muscle and other electrically excitable cells, and are a necessary component of normal sensation, emotions, thoughts and movements (Catterall, W. A., Nature (2001), Vol. 409, pp. 988-990). These channels ...

HIGH ASPECT RATIO LAYERED DOUBLE HYDROXIDE MATERIALS AND METHODS FOR PREPARATION THEREOF

Embodiments are directed to adamantane-intercalated layered double-hydroxide (LDH) particles and the methods of producing adamantane-intercalated LDH particles. The adamantane-intercalated LDH particles have a general formula defined by [MAl(OH)](A).mHO, where x is from 0.14 to 0.33, m is from 0.33 to 0.50, M is chosen from Mg, Ca, Co, Ni, Cu, or Zn, and A is adamantane carboxylate. The adamantane-intercalated LDH particles further have an aspect ratio greater than 100. The aspect ratio is defined by the width of an adamantane-intercalated LDH particle divided by the thickness of the adamantane-intercalated LDH particle. 1. An adamantane-intercalated layered double-hydroxide (LDH) material in a form of adamantane-intercalated LDH particles , where the adamantane-intercalated LDH particles comprise:{'sub': 1-x', 'x', '2', 'x', '2, 'a general formula defined by [MAl(OH)](A).mHO, where x is from 0.14 to 0.33, m is from 0.33 to 0.50, M is chosen from Mg, Ca, Co, Ni, Cu, or Zn, and A is adamantane carboxylate; and'}an aspect ratio greater than 100, the aspect ratio defined by a width of an adamantane-intercalated LDH particle divided by a thickness of the adamantane-intercalated LDH particle.2. The adamantane-intercalated LDH material of where M is Mg.3. The adamantane-intercalated LDH material of where the aspect ratio is greater than 125.4. The adamantane-intercalated LDH material of where the aspect ratio is greater than 150.5. The adamantane-intercalated LDH material of where the aspect ratio is greater than 200.6. The adamantane-intercalated LDH material of where the adamantane-intercalated LDH particles have a particle diameter of 5 to 10 μm.7. The adamantane-intercalated LDH material of where the adamantane-intercalated LDH particles have characteristic peaks in an IR spectra at 1517 cm claim 1 , 1395 cm claim 1 , 2901 cm claim 1 , 2847 cm claim 1 , and 4302 cm. This application is a divisional application of U.S. patent application Ser. No. 15/449,207 filed Mar. ...

PRODRUG OF AMINO ACID DERIVATIVE

Provided is an amino acid derivative prodrug represented by general formula (I-A) that is a prodrug form of an amino acid derivative which is a group 2 metabotropic glutamate receptor antagonist, or a pharmaceutically acceptable salt thereof. 120-. (canceled)22. The compound or pharmaceutically acceptable salt thereof according to claim 21 , wherein Ris a fluorine atom.23. The compound or pharmaceutically acceptable salt thereof according to claim 22 , wherein Ris a Calkyl group claim 22 , a Ccycloalkyl group optionally substituted by one to three Calkyl groups claim 22 , a Ccycloalkoxy group optionally substituted by one to three Calkyl groups and optionally having a Calkylene group crosslinking two different carbon atoms in the ring claim 22 , an adamantyl group optionally substituted by one to three Calkyl groups claim 22 , or a phenyl group.25. The compound or pharmaceutically acceptable salt thereof according to claim 21 , wherein Ris a hydrogen atom.27. The compound or pharmaceutically acceptable salt thereof according to claim 25 , wherein Ris a 4-fluorophenyl group or a 3 claim 25 ,4-difluorophenyl group.29. The compound or pharmaceutically acceptable salt thereof according to claim 25 , wherein Ris a methyl group.32. The compound or pharmaceutically acceptable salt thereof according to claim 30 , wherein Ris a methyl group.33. The compound or pharmaceutically acceptable salt thereof according to claim 21 , wherein the compound or pharmaceutically acceptable salt thereof is any of the following compounds:{'sup': '3,7', '(1R,2R,3R,5R,6R)-2-amino-6-fluoro-3-[(4-fluorophenyl)methoxy]-2-({(1S)-1-[(tricyclo[3.3.1.1]decane-1-carbonyl)oxy]ethoxy}carbonyl)bicyclo[3.1.0]hexane-6-carboxylic acid,'}{'sup': '3,7', '(1R,2R,3R,5R,6R)-2-amino-6-fluoro-3-[(4-fluorophenyl)methoxy]-2-({[(tricyclo[3.3.1.1]decane-1-carbonyl)oxy]methoxy}carbonyl)bicyclo[3.1.0]hexane-6-carboxylic acid,'}{'sup': '3,7', '(1R,2R,3R,5R,6R)-2-amino-3-[(3,4-difluorophenyl)methoxy]-6-fluoro-2-({(1S)-1 ...

Salt, resin, resist composition and method for producing resist pattern

A salt represented by the formula (I); wherein Q 1 and Q 2 each independently represent a fluorine atom or a C 1 to C 6 perfluoroalkyl group, L b1 represents a single bond or a divalent C 1 to C 24 saturated hydrocarbon groupwhere a methylene group may be replaced by an oxygen atom or a carbonyl group and where a hydrogen atom may be replaced by a hydroxyl group or a fluorine atom, and Y represents a hydrogen atom, a fluorine atom, or an optionally substituted C 3 to C 18 alicyclic hydrocarbon groupwhere a methylene group may be replaced by an oxygen atom, a carbonyl group or a sulfonyl group; and Ar represents a divalent C 6 to C 20 aromatic hydrocarbon group, and Z + represents an organic sulfonium cation or an organic iodonium cation.

Photoacid generator and photoresist comprising same

A photoacid generator compound has the formula (I): [A—(CHR 1 ) p ] k -(L)—(CH 2 ) m —(C(R 2 ) 2 ) n SO 3 − Z +   (I) wherein A is a substituted or unsubstituted, monocyclic, polycyclic, or fused polycyclic C 5 or greater cycloaliphatic group optionally comprising O, S, N, F, or a combination comprising at least one of the foregoing, R 1 is H, a single bond, or a substituted or unsubstituted C 1-30 alkyl group, wherein when R 1 is a single bond, R 1 is covalently bonded to a carbon atom of A, each R 2 is independently H, F, or C 1-4 fluoroalkyl, wherein at least one R 2 is not hydrogen, L is a linking group comprising a sulfonate group, a sulfonamide group, or a C 1-30 sulfonate or sulfonamide-containing group, Z is an organic or inorganic cation, p is an integer of 0 to 10, k is 1 or 2, m is an integer of 0 or greater, and n is an integer of 1 or greater. A precursor compound to the photoacid generator, a photoresist composition including the photoacid generator, and a substrate coated with the photoresist composition, are also disclosed.

Onium compounds and methods of synthesis thereof

New onium salt compounds and methods for synthesis of such compounds are provided. Preferred methods of the invention include (a) providing an onium salt compound comprising a sulfonate component having an electron withdrawing group; and (b) treating the onium salt compound with a halide salt to form a distinct salt of the onium compound. The present onium compounds are useful as an acid generator component of a photoresist composition.

HDAC6 Inhibitors and Imaging Agents

Provided herein are compounds useful for binding to one or more histone deacetylase enzymes (HDACs). The present application further provides radiolabeled compounds useful as a radiotracer for position emission tomography imaging of HDAC. Methods for prepared unlabeled and labeled compounds, diagnostic methods, and methods of treating diseases associated HDAC are also provided. 29.-. (canceled)10. The compound of claim 1 , or a pharmaceutically acceptable salt thereof claim 1 , wherein Lis methylene.11. The compound of claim 1 , or a pharmaceutically acceptable salt thereof claim 1 , wherein Ris Ccycloalkyl which is optionally substituted by 1 or 2 independently selected Calkyl groups.12. The compound of claim 1 , or a pharmaceutically acceptable salt thereof claim 1 , wherein Ris selected from the group consisting of cyclohexyl claim 1 , adamantyl claim 1 , norbornyl claim 1 , and 6 claim 1 ,6-dimethylbicyclo[3.1.1]heptanyl.13. The compound of claim 1 , wherein Ris adamantyl.14. (canceled)15. The compound of claim 1 , or a pharmaceutically acceptable salt thereof claim 1 , wherein Xis CR.16. The compound of claim 1 , or a pharmaceutically acceptable salt thereof claim 1 , wherein Ris H or F.17. The compound of claim 1 , or a pharmaceutically acceptable salt thereof claim 1 , wherein Ris F.18. (canceled)19. The compound of claim 1 , or a pharmaceutically acceptable salt thereof claim 1 , wherein Xis CR.2022.-. (canceled)23. The compound of claim 1 , or a pharmaceutically acceptable salt thereof claim 1 , wherein Xis CRand Xis CR.24. The compound of claim 1 , or a pharmaceutically acceptable salt thereof claim 1 , wherein Ris F and Ris H.2528.-. (canceled)29. The compound of claim 1 , or a pharmaceutically acceptable salt thereof claim 1 , wherein Ris F and R claim 1 , R claim 1 , and Rare each H.30. (canceled)31. The compound of claim 1 , or a pharmaceutically acceptable salt thereof claim 1 , wherein:{'sup': 1', 'N, 'sub': '2', 'Xis —N(R)— or —CH—;'}{'sup': 2', '2, ...

Modulators of atp-binding cassette transporters

The present invention relates to modulators of ATP-Binding Cassette (“ABC”) transporters or fragments thereof, including Cystic Fibrosis Transmembrane Conductance Regulator, compositions thereof, and methods therewith. The present invention also relates to methods of treating ABC transporter mediated diseases using such modulators.

COMPOSITIONS AND METHODS FOR HYDROCARBON FUNCTIONALIZATION

Embodiments of the present disclosure provide for methods of hydrocarbon functionalization, methods and systems for converting a hydrocarbon into a compound including at least one group ((e.g., hydroxyl group) (e.g., methane to methanol)), functionalized hydrocarbons, and the like. Systems and methods as described herein can utilize photocatalysis. 1. A method , comprising:{'sub': a', 'n', '4', '4', '3', '3, 'sup': +', '+', '+, 'mixing AX, an iodine-based compound, and a source of functionalization to form a first mixture, wherein A is selected from the group consisting of: hydrogen, lithium, sodium, potassium, beryllium, magnesium, calcium, strontium, barium, transition metals, aluminum, gallium, thallium, indium, tin, sulfur, ammonium (NH), alkylammonium, phosphonium (PH), alkylphosphonium, arylphosphonium, or trimethyl sulfonium ([S(CH)]) and a combination thereof, wherein X is chlorine or bromine, wherein subscript “a” is an oxidation state of X and subscript “n” is an oxidation state of A;'}mixing the first mixture with a hydrocarbon in the gas phase to form a second mixture; andapplying light from a light source to the second mixture to make a functionalized hydrocarbon.2. The method of claim 1 , further comprising:converting the functionalized hydrocarbon to a compound including at least one group selected from the group consisting of: hydroxyl, halide, carbonyl, and a combination thereof.3. The method of claim 2 , wherein the compound is selected from an alcohol or glycol.4. The method of claim 2 , wherein the compound is methanol claim 2 , ethanol claim 2 , or propanol.5. The method of claim 1 , wherein the hydrocarbon is selected from the group consisting of: methane claim 1 , ethane claim 1 , propane claim 1 , butane claim 1 , and a combination thereof.6. The method of claim 1 , wherein the hydrocarbon is aliphatic.7. The method of claim 1 , wherein the hydrocarbon is aromatic.8. The method of claim 1 , wherein AXis selected from the group consisting of: ...

ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, PATTERN FORMING METHOD, RESIST FILM, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE

An actinic ray-sensitive or radiation-sensitive resin composition including one or more specific compounds selected from the group consisting of a compound represented by General Formula (1), a compound represented by General Formula (2), and a compound represented by General Formula (3), and an acid-decomposable resin. 2. The actinic ray-sensitive or radiation-sensitive resin composition according to claim 1 ,wherein the fluorine-containing group in each of General Formulae (1) to (3) is a fluoroalkyl group.3. The actinic ray-sensitive or radiation-sensitive resin composition according to claim 1 ,{'sup': ['1', '2', '3'], '#text': 'wherein in General Formula (1), the aromatic hydrocarbon ring group represented by each of Ar, Ar, and Arhas a total of three or more fluoroalkyl groups or has a total of one or more organic groups other than an electron-withdrawing group, and a total number of carbon atoms included in the total of one or more organic groups other than an electron-withdrawing group is 3 or more,'}{'sup': ['4', '5', '6'], '#text': 'in General Formula (2), the aromatic hydrocarbon ring group represented by each of Ar, Ar, and Arhas a total of three or more fluorine-containing groups, or'}{'sup': ['4', '5', '6'], '#text': 'the aromatic hydrocarbon ring group represented by each of Ar, Ar, and Arhas a total of one or more linear or branched organic groups other than an electron-withdrawing group, and a total number of carbon atoms included in the total of one or more linear or branched organic groups other than an electron-withdrawing group is 3 or more, and'}{'sup': ['7', '8', '9'], '#text': 'in General Formula (3), a total number of carbon atoms included in the organic groups other than an electron-withdrawing group, contained in the aromatic hydrocarbon ring group represented by each of Ar, Ar, and Ar, is 3 or more.'}5. The actinic ray-sensitive or radiation-sensitive resin composition according to claim 4 ,{'sup': ['5', '6'], '#text': 'wherein Arand ...

Salt and photoresist composition containing the same

A salt represented by formula (I): wherein R 1 and R 2 independently each represent a C6-C18 unsubstituted or substituted aromatic hydrocarbon group, X 1 represents a C1-C12 divalent aliphatic saturated hydrocarbon group in which a methylene group can be replaced by an oxygen atom or a carbonyl group, and A − represents an organic anion.

H2S-BASED THERAPEUTIC AGENTS FOR THE TREATMENT OF NEURODEGENERATIVE DISEASES

The present invention concerns the field of neurodegenerative diseases, and in particular relates to compounds, pharmaceutical compositions and their uses in the protection of neuronal cells from inflammation and from oxidative stress in the early stage of Parkinson's Disease as well as in Alzheimer's Disease. 2. The compound for use according to claim 1 , wherein A is —N═C═S.3. The compound for use according to claim 1 , wherein A is —NH—B.4. The compound for use according to claim 3 , wherein n is preferably 1.5. The compound for use according to claim 1 , wherein the neurodegenerative disease is a disease selected from the group consisting of Parkinson's disease claim 1 , Alzheimer's disease amyotrophic lateral sclerosis and Huntington's disease7. The compound of claim 6 , wherein n is 1.9. The pharmaceutical composition according to claim 8 , wherein A is —N═C═S. The present invention concerns the field of neurodegenerative diseases, and in particular relates to compounds, pharmaceutical compositions and their uses in the protection of neuronal cells from inflammation and from oxidative stress in the early stages of Parkinson's Disease as well as in Alzheimer's Disease.Hydrogen sulfide (HS) is emerging as a hot topic in the field of drug discovery. HS is a well-known pungent and toxic gas and has been recognized as the third gaseous signaling molecule in addition to nitric oxide and carbon monoxide [1]. HS is produced endogenously from the amino acids L-cysteine and homocysteine by several enzymes. In particular, in the brain it is synthesized by cystathionine-b-synthetase (CBS) which is highly expressed in the hippocampus and cerebellum [2]. Noteworthy, a dramatic decrease of CBS activity and a consequent drastic fall in HS levels (about 50%) have been detected in the brain of patients affected by Alzheimer's disease (AD). Moreover, it seems to play a neuroprotective role in Parkinson's disease [3], thus suggesting that this gaseous-transmitter is able to ...

CURABLE COMPOSITION, CURED PRODUCT AND OPTICAL MEMBER

A curable composition capable of manufacturing a cured product having a high refractive index is provided. The curable composition contains a polymerizable compound represented by formula (1) and inorganic particles. In formula (1), Lrepresents a divalent linking group, and the divalent linking group includes at least one of a divalent aromatic group, a divalent polycyclic aliphatic group and an alkylene group having an aromatic group, Ar represents an aromatic group, and R represents an aromatic group optionally having one or more substituents or a polycyclic aliphatic group optionally having one or more substituents. 3. The curable composition according to claim 2 , wherein the polymerizable compound represented by formula (2) satisfies at least one of following requirements 1 and 2:{'sub': 'c', 'requirement 1: Lrepresents an alkylene group having a hydroxy group;'}requirement 2: R represents a polycyclic aliphatic group having a hydroxy group.4. The curable composition according to claim 1 , wherein the inorganic particles comprise at least one type selected from the group consisting of metal oxide particles and metal sulfide particles.5. A cured product obtained by curing the curable composition according to .6. An optical member obtained by curing the curable composition according to .9. The polymerizable compound according to claim 8 , satisfying at least one of following requirements 1 and 2:{'sub': 'c', 'requirement 1: Lrepresents an alkylene group having a hydroxy group;'}requirement 2: R represents a polycyclic aliphatic group having a hydroxy group.10. The curable composition according to claim 2 , wherein the inorganic particles comprise at least one type selected from the group consisting of metal oxide particles and metal sulfide particles.11. The curable composition according to claim 3 , wherein the inorganic particles comprise at least one type selected from the group consisting of metal oxide particles and metal sulfide particles.12. A cured ...

Compounds, Compositions, and Methods For Modulating Ferroptosis and Treating Excitotoxic Disorders

The present invention provides, inter alia, a compound having the structure: (Formula (I). Also provided are compositions containing a pharmaceutically acceptable carrier and a compound according to the present invention. Further provided are methods for treating or ameliorating the effects of an excitotoxic disorder in a subject, methods of modulating ferroptosis in a subject, methods of reducing reactive oxygen species (ROS) in a cell, and methods for treating or ameliorating the effects of a neurodegenerative disease.

RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD OF FORMING RESIST PATTERN

A radiation-sensitive resin composition includes: a polymer which has a first structural unit including a phenolic hydroxyl group, and a second structural unit represented by formula (1); and a radiation-sensitive acid generating agent which has a compound represented by formula (2), Rrepresents a hydrogen atom, or the like; Rrepresents a hydrogen atom or the like; and Rrepresents a divalent monocyclic alicyclic hydrocarbon group having 3 to 12 ring atoms. Arrepresents a group obtained by removing (q+1) hydrogen atoms on an aromatic ring from an arene formed by condensation of at least two benzene rings; Rrepresents a monovalent organic group having 1 to 20 carbon atoms; q is an integer of 0 to 7; and Rrepresents a halogen atom, a hydroxy group, a nitro group, or a monovalent organic group having 1 to 20 carbon atoms, or the like. 2. The radiation-sensitive resin composition according to claim 1 , wherein p in the formula (2) is 1.4. The radiation-sensitive resin composition according to claim 3 , wherein in the formula (2) claim 3 , in a case in which q is 1 claim 3 , Rrepresents a halogen atom claim 3 , a nitro group claim 3 , a monovalent unsubstituted hydrocarbon group having 1 to 20 carbon atoms claim 3 , or a monovalent hydrocarbon group having 1 to 20 carbon atoms in which a part or all of hydrogen atoms are substituted with a substituent claim 3 , and in a case in which q is no less than 2 claim 3 , a plurality of Rs are identical or different and each Rrepresents a halogen atom claim 3 , a nitro group claim 3 , a monovalent unsubstituted hydrocarbon group having 1 to 20 carbon atoms claim 3 , or a monovalent hydrocarbon group having 1 to 20 carbon atoms in which a part or all of hydrogen atoms are substituted with a substituent claim 3 , or at least two of the plurality of Rs taken together represent an alicyclic structure having 4 to 20 ring atoms or an aliphatic heterocyclic structure having 4 to 20 ring atoms claim 3 , together with the carbon chain to ...

Modulators of atp-binding cassette transporters

The present invention relates to modulators of ATP-Binding Cassette (“ABC”) transporters or fragments thereof, including Cystic Fibrosis Transmembrane Conductance Regulator, compositions thereof, and methods therewith. The present invention also relates to methods of treating ABC transporter mediated diseases using such modulators.

THERAPEUTIC COMPOUNDS AND METHODS OF USE THEREOF

The invention provides compounds having the general Formula (I); 2. The method of claim 1 , wherein Ris F or Cl; and Ris selected from the group consisting of F claim 1 , Cl claim 1 , Calkyl claim 1 , Calkoxy claim 1 , and Ccycloalkyl.3. The method of claim 1 , wherein Ris F or Cl and Ris selected from the group consisting of F claim 1 , Cl claim 1 , cyclopropyl claim 1 , cyclobutyl claim 1 , and cyclopentyl.4. The method of claim 1 , wherein Xis —O— or —N(H)—; Xis absent; the subscript m is 1; and -(L)- is an optionally substituted Calkylene.5. The method of claim 1 , wherein Xis —O— or —N(H)—; Xis absent; the subscript m is 1; and -(L)- is selected from the group consisting of —CH— claim 1 , —C(═O)— claim 1 , —C(H)(CH)— claim 1 , —CH—CH— claim 1 , —CH—C(H)(CH)— claim 1 , —C(H)(CH)—C(H)— claim 1 , —CHCHCH— claim 1 , —CH—C(H)CH)—CH— claim 1 , or —CHCHCHCH—.6. The method of claim 1 , wherein Xis —O—; the subscript m is 1 and -(L)- is —CH— claim 1 , —C(H)(CH)— claim 1 , or —CH—CH—.7. The method of claim 1 , wherein Xis absent; Xis —O— or —N(H)—; the subscript m is 1; and -(L)- is selected from the group consisting of —CH— claim 1 , —C(═O)— claim 1 , —C(H)(CH)— claim 1 , —CH—CH— claim 1 , —CH—C(H)(CH)— claim 1 , —C(H)(CH)—C(H)— claim 1 , —CHCHCH— claim 1 , —CH—C(H)(CH)—CH— claim 1 , or —CHCHCHCH—.8. The method of claim 1 , wherein Xand Xare absent; the subscript m is 1; and -(L)- is selected from the group consisting of —CH— claim 1 , —C(═O)— claim 1 , —C(H)(CH)— claim 1 , —CH—CH— claim 1 , —CH—C(H)(CH)— claim 1 , —C(H)(CH)—C(H)— claim 1 , —CHCHCH— claim 1 , —CH—C(H)(CH)—CH— claim 1 , or —CHCHCHCH—.9. The method of claim 1 , wherein Xand Xare absent: the subscript m is 1; and -(L)- is selected from the group consisting of —CH— claim 1 , —C(═O)— claim 1 , —C(H)(CH)— claim 1 , and —CH—CH—.10. The method of claim 1 , wherein m is 0; Xis selected from —O— and —N(H)—; and Xis absent. This application is a divisional of U.S. application Ser. No. 16/150,070, filed 2 Oct. 2018 ...

SUBSTITUTED BICYCLIC COMPOUNDS

Disclosed are compounds of Formulas (I), (II), (III), (IV), and (V): 116-. (canceled)19. The compound according to or a salt thereof claim 17 , wherein:{'sub': 2a', '2', '3', '3', '2', '5-6', '3', '2', '2', '3', '2', '2', '2', '3', '2', '3', '3', '2', '3', '3', '2', '2', '4', '2', '2', '4', '3', '2', '3', '3', '2', '3', '3', '2', '2', '3', '2', '2', '2', '2', '3', '2', '3', '2', '2', '2', '3', '3', '2', '1-3', '3', '3', '2', '3', '3', '2', '2', '3', '2', '2', '2', '2', '2', '2', '1-2', '3', '2', '2', '2', '2', '2', '2-3', '2', '2', '3-4', '3', '2', '2', '2', '3', '2', '2', '2', '2', '3', '3', '2', '2', '9', '3', '2', '2', '2', '2', '3', '2', '2', '2', '3', '2', '2', '3', '2', '2', '2', '2', '2', '3', '2', '2', '2', '2', '2', '2', '2', '2', '2', '2', '2', '2', '3', '2', '2', '2', '2', '3', '2', '2', '2', '2', '2', '2', '2', '2', '2', '3', '2', '2', '2', '2', '3', '2', '2', '2', '2', '3', '2', '2', '2', '2', '2', '3', '2', '3', '3', '2', '3', '3', '3', '3', '2', '1-6', '3', '3', '2', '2', '3', '2', '2', '3', '3', '3', '2', '2', '2', '3', '3', '2', '3', '2', '2', '2', '2', '2', '2', '3', '3', '2', '2', '2', '2', '2', '2', '2', '2', '2', '2', '2', '2', '2', '2', '2', '3', '2', '2', '2', '3', '2', '2', '2', '2', '2', '2', '2', '2', '3', '2', '2', '3', '2', '3', '2', '3', '3', '2', '2', '3', '2', '2', '2', '2', '3', '2', '3', '2', '3', '2', '3', '2', '2', '2-4', '3', '2', '3', '2', '2', '2', '3', '2', '2', '2', '3', '3', '2', '2', '2', '3', '2', '2', '2', '2', '3', '3', '2', '2', '2', '3', '3', '2', '2', '2', '1-2', '3', '2', '2', '2', '3', '2', '2', '3', '3', '2', '3', '2', '2', '2', '2', '2', '2', '2', '2', '2', '2', '2', '2', '2', '2', '3', '3', '2', '2', '2', '3', '3', '2', '2', '2', '2', '4', '3', '2', '2', '4', '3', '3', '2', '4', '3', '2', '3', '2', '5', '3', '2', '2', '4-7', '3', '2', '2', '2', '2-4', '3', '2', '2', '2', '3', '2', '2', '2', '2-3', '3', '2', '2', '2', '2', '2', '2', '2', '3', '2', '2', '2', '3', '2', '2', '2', '2', '2', '2', '2', '2', '2-3', '3', ' ...

Antibiotic Compounds

The present application provides compounds and methods of treating bacterial infection, including bacterial infection caused by 3. The compound of claim 1 , wherein R claim 1 , R claim 1 , R claim 1 , R claim 1 , R claim 1 , and Rare each independently selected from H claim 1 , HO claim 1 , and —C(═O)OH.4. The compound of claim 1 , wherein R claim 1 , R claim 1 , R claim 1 , R claim 1 , R claim 1 , and Rare each independently selected from H and HO.9. A pharmaceutical composition comprising a compound of claim 1 , or a pharmaceutically acceptable salt thereof claim 1 , and a pharmaceutically acceptable carrier.10. The pharmaceutical composition of claim 9 , further comprising at least one additional therapeutic agent which is an antibiotic selected from a quinolone claim 9 , a β-lactam claim 9 , a cephalosporin claim 9 , a penicillin claim 9 , a carbapenem claim 9 , a lipopetide claim 9 , an aminoglycoside claim 9 , a glycopeptide claim 9 , a macrolide claim 9 , an ansamycin claim 9 , a sulfonamide claim 9 , a monobactam claim 9 , oxazolidinone claim 9 , lipopeptide claim 9 , macrolide claim 9 , and a cationic antimicrobial peptide (CAMP).11. The pharmaceutical composition of claim 9 , wherein the pharmaceutical composition is a topical composition selected from an aerosol spray claim 9 , a cream claim 9 , an emulsion claim 9 , a foam claim 9 , an oil claim 9 , a gel claim 9 , a lotion claim 9 , a mousse claim 9 , an ointment claim 9 , and a patch.12. A method of killing or inhibiting growth of bacteria claim 1 , the method comprising contacting the bacteria with an effective amount of a compound of claim 1 , or a pharmaceutically acceptable salt thereof.13StaphylococcusStreptococcus, Propionibacterium, Peptococcus, EnterococcusBacillus.. The method of claim 12 , wherein the bacteria is a member of a genus selected from: (including coagulase negative and coagulase positive) claim 12 , claim 12 , and14S. aureus, S. pyogenes, S. pneumoniae, S. sahvarius, S. milleri, S ...

TETRACYCLINE COMPOUNDS

The present invention is directed to a compound represented by Structural Formula (I): 3. The compound of claim 1 , wherein:{'sup': 1a', '2', '3, 'Y is selected from fluoro, methyl, and —CH(R)—N(R)(R);'}{'sup': '1a', 'Ris selected from hydrogen and methyl;'}{'sup': '2', 'sub': 1', '3', '2, 'Ris selected from hydrogen, C-Cstraight chained alkyl and —CH-cyclopropyl;'}{'sup': 3', '3', '2', '3, 'sub': 1', '8', '2', '2', '1', '6', '1', '3', '3', '10', '2', '2', '3', '10', '1', '3', '1', '3', '1', '2, 'Ris selected from hydrogen, C-Calkyl, —CH—CHF, —C-Calkylene-O—C-Calkyl, C-Ccycloalkyl, —(CH)-phenyl and C-Ccycloalkyl-substituted C-Calkyl, wherein each cycloalkyl in the group represented by Ris optionally substituted with —C-Calkyl or optionally benzofused and when Ris hydrogen or —C-Calkyl, Ris additionally selected from benzyl; or'}{'sup': 2', '3, 'sub': 1', '3', '1', '3', '1', '3, 'Rand Rtaken together with the nitrogen atom to which they are bound form a ring selected from pyrrolidine and piperidine, wherein the ring is optionally substituted with one or more substituents independently selected from fluoro —C-Calkyl and —C-Calkylene-O—C-Calkyl, and wherein the ring is optionally fused to phenyl or spirofused to cyclopropyl.'}4. The compound of claim 1 , wherein at least one of X and Z is other than hydrogen.5. The compound of claim 4 , wherein both X and Z are other than hydrogen.6. The compound of claim 4 , wherein one of X and Z is hydrogen.7. The compound of claim 6 , wherein:{'sub': 3', '2, 'X is selected from hydrogen, fluoro, chloro, —CN, and —N(CH); and'}{'sub': 2', '2', '2', '3', '3, 'Z is hydrogen, NHor —CH—NH—CH—C(CH).'}9. The compound of claim 8 , wherein X is fluoro claim 8 , chloro or —N(CH).16. The compound of claim 1 , wherein:{'sup': '3', 'Y is —NHR, and'}{'sup': 3', '3, 'sub': 1', '8', '1', '3', '1', '3', '1', '3, 'Ris pyridyl, C-Calkyl, —C(O)—C-Calkylene-piperidine, —C(O)—C-Calkylene-pyrrolidine, wherein each piperidine or pyrrolidine in the group ...

Compounds which have a protective activity with respect to the action of toxins and of viruses with an intracellular mode of action

The subject matter of the present invention is novel families of compounds which are aromatic amine, imine, aminoadamantane and benzodiazepine derivatives, medicaments comprising same and the use thereof as inhibitors of the toxic effects of toxins with intracellular activity, such as, for example, ricin, and of viruses that use the internalization pathway for infecting cells.

Organosilicon on solid oxides, and related complexes, compositions, methods and systems

Organosilicon Lewis acids supported on activated oxides and metal oxo complexes grafted on the organosilicon Lewis acids as heterogeneous catalysts and the related compositions, methods and systems are described. These organosilicon Lewis acids and the grafted metal oxo complexes catalyze industrially important chemical reactions including, respectively, C—F bond activation and olefin metathesis reactions such as homocoupling and polymerizations.

HEPATITIS B ANTIVIRAL AGENTS

The present invention discloses compounds of Formula (I), or pharmaceutically acceptable salts, esters, or prodrugs thereof: 11. A pharmaceutical composition claim 1 , comprising a compound or a combination of compounds according to claim 1 , in combination with a pharmaceutically acceptable carrier or excipient.12. A method of treating or preventing an HBV infection in a subject in need thereof claim 1 , comprising administering to the subject a therapeutically effective amount of a compound or a combination of compounds according to .13. The method of claim 12 , further comprising administering to the subject at least one additional therapeutic agent selected from the group consisting of HBV polymerase inhibitors claim 12 , interferon claim 12 , viral entry inhibitors claim 12 , viral maturation inhibitors claim 12 , capsid assembly or core protein inhibitors or modulators claim 12 , reverse transcriptase inhibitors claim 12 , TLR-agonists claim 12 , inducers of cellular viral RNA sensor claim 12 , therapeutic vaccines claim 12 , RNA interence (RNAi) or small interfering RNA (siRNA) and combinations thereof.14. The method of claim 13 , wherein the compound and the at least one additional therapeutic agent are co-formulated.15. The method of claim 13 , wherein the at least one additional therapeutic agent is administered at a lower dose and/or frequency than that which is therapeutically effective when said agent is administered alone. This application is a divisional of U.S. application Ser. No. 15/450,125, filed on Mar. 6, 2017, which claims the benefit of U.S. Provisional Application No. 62/304,671, filed on Mar. 7, 2016, and 62/337,675, filed on May 17, 2016. The entire teachings of the above applications are incorporated herein by reference.The present invention relates generally to novel antiviral agents. Specifically, the present invention relates to compounds which can inhibit the protein(s) encoded by hepatitis B virus (HBV) or interfere with the function ...

HDAC6 Inhibitors and Imaging Agents

Provided herein are compounds useful for binding to one or more histone deacetylase enzymes (HDACs). The present application further provides radiolabeled compounds useful as a radiotracer for position emission tomography imaging of HDAC. Methods for prepared unlabeled and labeled compounds, diagnostic methods, and methods of treating diseases associated HDAC are also provided.

PROCESS FOR MAKING N-SULFINYL a-AMINO AMIDES

Disclosed is a process for making diastereomeric N-sulfinyl α-amino amides by reaction of chiral sulfinimines with formamides and lithium diisopropylamide. The process of the invention provides the N-sulfinyl α-amino amides in high yields and with high diastereoselectivity.

Therapeutic compounds and methods of use thereof

and pharmaceutically acceptable salts thereof, wherein the variables RAA, n, ring A, X1, L, m, X2, R2, R3, R4, R5, X, and R6 have the meaning as described herein, and compositions containing such compounds and methods for using such compounds and compositions.

Compound, resin, composition, resist pattern formation method, circuit pattern formation method, and method for purifying resin

The present invention has an object to provide a new compound that is useful as a film forming material for lithography or an optical component forming material, a resin containing a constituent unit derived from said compound, a composition, a resist pattern formation method, a circuit pattern formation method, and a purification method. A compound represented by formula (1), a resin containing a constituent unit derived from said compound, a composition containing one or more selected from the group consisting of said compound and said resin, a resist pattern formation method using said composition, a circuit pattern formation method, and a purification method thereof.

SALT, ACID GENERATOR, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN

Disclosed are a salt represented by formula (I), an acid generator and a resist composition: 2. The salt according to claim 1 , wherein Lrepresents a single bond or *-L2-CO—O— claim 1 , wherein Lrepresents a cyclic hydrocarbon group having 3 to 18 carbon atoms or a group obtained by combining a cyclic hydrocarbon group having 3 to 18 carbon atoms with an alkanediyl group having 1 to 4 carbon atoms claim 1 , the cyclic hydrocarbon group may have a substituent claim 1 , —CH— included in the cyclic hydrocarbon group may be replaced by —O— claim 1 , —S— claim 1 , —CO— or —SO— claim 1 , —CH— included in the alkanediyl group may be replaced by —O— or —CO— claim 1 , and * represents a bonding site to X.3. The salt according to claim 1 , wherein Ar is an aromatic hydrocarbon group having 6 to 10 carbon atoms which may have a substituent.4. The salt according to claim 1 , wherein Xis an oxygen atom.5. The salt according to claim 1 , wherein Ris an iodine atom claim 1 , a fluorine atom or a perfluoroalkyl group having 1 to 3 carbon atoms.6. The salt according to claim 1 , wherein Ris an iodine atom claim 1 , a fluorine atom claim 1 , a hydroxy group claim 1 , a perfluoroalkyl group having 1 to 3 carbon atoms or an alkoxy group having 1 to 3 carbon atoms.7. An acid generator comprising the salt according to .8. A resist composition comprising the acid generator according to and a resin having an acid-labile group.11. The resist composition according to claim 8 , further comprising a salt generating an acid having an acidity lower than that of an acid generated from the acid generator.12. A method for producing a resist pattern claim 8 , which comprises:{'claim-ref': {'@idref': 'CLM-00008', 'claim 8'}, '(1) a step of applying the resist composition according to on a substrate,'}(2) a step of drying the applied resist composition to form a composition layer,(3) a step of exposing the composition layer,(4) a step of heating the exposed composition layer, and(5) a step of ...

Methods of carbon-carbon bond fragmentation

The present disclosure relates to methods of carbon-carbon bond fragmentation.

ADMINISTRATION OF 6-[3-(1-ADAMANTYL)-4-METHOXYPHENYL]-2-NAPHTHOIC ACID FOR THE TREATMENT OF DERMATOLOGICAL DISORDERS

Dermatological disorders having an inflammatory or proliferative component are treated with pharmaceutical compositions containing on the order of 0.3% by weight of 6-[3-(1-adamantyl)-4-methoxyphenyl]-2-naphthanoic acid (adapalene) or salt thereof, formulated into pharmaceutically acceptable media therefor, advantageously topically applicable gels, creams or lotions. 1. A method for eliciting an early onset of action in regression of non-inflammatory lesions in treating common acne afflicting an individual's skin, the individual being in need of such treatment, comprising topically administering daily to said individual an anti-acne effective amount of a pharmaceutical composition which consists essentially of: (1) 0.3% by weight of 6-[3-(1-adamantyl)-4-methoxyphenyl]-2-naphthoic acid (adapalene) or salt thereof; (2) one or more ingredients selected from the group consisting of carbomer 940, carbomer 934, disodium edetate, methyl paraben, propylene glycol, PEG methyl glucose sesquistearate, PEG 400, methyl glucose sesquistearate, cyclomethicone, perhydrosqualene, propyl paraben, glycerol, sodium hydroxide, ethanol and phenoxyethanol; (3) water; and (4) optionally, one or more additive selected from the group consisting of wetting agents, pH regulators, osmotic pressure modifiers, emulsifiers, UV-A and UV-B screening agents and antioxidants, wherein said composition is formulated into a pharmaceutically acceptable medium therefor, said composition being a gel or a cream, said early onset of action occurring by two weeks after treatment begins and being demonstrated by regression of non-inflammatory lesions after two weeks of treatment greater than that demonstrated by vehicle alone or by a similar composition comprising 0.1% by weight of adapalene after two weeks of treatment. This application is a continuation of co-pending U.S. patent application Ser. No. 15/175,188, filed Jun. 7, 2016, now allowed, which is a continuation of co-pending U.S. patent application Ser. ...

PHOTOACID GENERATOR, PHOTORESIST COMPOSITION INCLUDING THE SAME, AND METHOD OF PREPARING THE PHOTOACID GENERATOR

Disclosed are a photoacid generator, a photoresist composition including the same, and a method of preparing the photoacid generator. The photoacid generator may include a compound represented by Formula 1: 2. The photoacid generator of claim 1 , whereinCY is an unsubstituted C6-C10 aromatic ring group,a C6-C10 aromatic ring group substituted with fluorine, chlorine, or bromine, ora C6-C10 aromatic ring group substituted with a C1-C30 alkyl fluoride group, a C1-C30 alkyl chloride group, or a C1-C30 alkyl bromide group.5. The photoacid generator of claim 4 , wherein R claim 4 , R claim 4 , R claim 4 , R claim 4 , and Rare each independently hydrogen claim 4 , fluorine claim 4 , chlorine claim 4 , bromine claim 4 , a C1-C20 alkyl group claim 4 , a C1-C20 alkyl fluoride group claim 4 , a C1-C20 alkyl chloride group claim 4 , or a C1-C20 alkyl bromide group.7. The photoacid generator of claim 6 , wherein R′ claim 6 , R′ claim 6 , R′ claim 6 , R′ claim 6 , and R′ are each independently hydrogen claim 6 , fluorine claim 6 , chlorine claim 6 , bromine claim 6 , a C1-C20 alkyl group claim 6 , a C1-C20 alkyl fluoride group claim 6 , a C1-C20 alkyl chloride group claim 6 , or a C1-C20 alkyl bromide group.9. The photoacid generator of claim 8 , wherein R′ claim 8 , R′ claim 8 , R′ claim 8 , R′ claim 8 , R′ claim 8 , R′ claim 8 , R′ claim 8 , R′ claim 8 , R′ claim 8 , and R′ are each independently hydrogen claim 8 , fluorine claim 8 , chlorine claim 8 , bromine claim 8 , a C1-C20 alkyl group claim 8 , a C1-C20 alkyl fluoride group claim 8 , a C1-C20 alkyl chloride group claim 8 , or a C1-C20 alkyl bromide group.12. A photoresist composition comprising:{'claim-ref': {'@idref': 'CLM-00001', 'claim 1'}, 'the photoacid generator of ;'}a base polymer;a photodegradable quencher (PDQ); anda solvent.13. The photoresist composition of claim 12 , wherein the content of the photoacid generator is about 15 parts by weight to about 50 parts by weight based on 100 parts by weight of the base ...

Radiation-sensitive resin composition and resist pattern-forming method

A radiation-sensitive resin composition includes a polymer including a phenolic hydroxyl group, a compound represented by formula (1-1) or formula (1-2), and a compound represented by formula (2). In the formula (1-1), a sum of a, b, and c is no less than 1; at least one of R 1 , R 2 , and R 3 represents a fluorine atom or the like; and R 4 and R 5 each independently represent a hydrogen atom, a fluorine atom, or the like. In the formula (1-2), in a case in which d is 1, R 6 represents a fluorine atom or the like, and in a case in which d is no less than 2, at least one of the plurality of R 6 s represents a fluorine atom or the like; and R 8 represents a single bond or a divalent organic group having 1 to 20 carbon atoms.

SALT, ACID GENERATOR, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN

A salt represented by formula (I): 2. The salt according to claim 1 , wherein Xis *—CO—O— claim 1 , where * represents a binding position to C(R)(R) or C(Q)(Q).3. The salt according to claim 1 , wherein A1 is a hydrocarbon group having an adamantanediyl moiety.4. An acid generator comprising the salt according to . This application is a Divisional of co-pending application Ser. No. 15/151,618 filed on May 11, 2016, which claims priority under 35 U.S.C. § 119(a) to Patent Application No. 2015-097043 filed in Japan on May 12, 2015. All of the above applications are hereby expressly incorporated by reference into the present application.The present disclosure relates to a salt, an acid generator, a resin, a resist composition and a method for producing resist pattern.A method for synthesizing a salt represented by the following formula is described in Patent document of JP 2011-215619A.A resist composition which contains a resin having a structural unit derived from a salt represented by the following formula is described in Patent document of JP2014-197168A.The present disclosure provides the inventions as follow.[1] A salt represented by formula (I):wherein Qand Qindependently represent a fluorine atom or a Cto Cperfluoroalkyl group,Rand Rin each occurrence independently represent a hydrogen atom, a fluorine atom or a Cto Cperfluoroalkyl group,z represents an integer of 0 to 6,Xrepresents *—CO—O—, *—O—CO— or —O—, * represents a binding position to C(R)(R) or C(Q)(Q),Arepresents a Cto Chydrocarbon group having a Cto Cdivalent alicyclic hydrocarbon moiety,Arepresents a Cto Cdivalent hydrocarbon group,Rand Rindependently represent a hydrogen atom or a Cto Cmonovalent saturated hydrocarbon group,Rrepresents a hydrogen atom, a fluorine atom, or a Cto Calkyl group where a hydrogen atom may be replaced by a fluorine atom, andZ represents an organic cation.[2] The salt according to [1], whereinXis *—CO—O—, where * represents a binding position to C(R)(R) or C(Q)(Q).[3] The ...

Salt and photoresist composition containing the same

A salt comprising a group represented by the formula (aa): wherein X a and X b independently each represent an oxygen atom or a sulfur atom, and X 1 represents a C1-C12 saturated hydrocarbon group which has a moiety represented by formula (1 a ) or (2 a ):

TARGETED, METAL-CATALYZED FLUORINATION OF COMPLEX COMPOUNDS WITH FLUORIDE ION VIA DECARBOXYLATION

Methods of preparing fluorinated compounds by carboxylative fluorination using fluoride are contained herein. Fluorinated compounds are provided. Methods of using fluorinated compounds are contained herein. 1. A method of targeted fluorination comprising combining a mono-fluoro-aryl iodine-(III) carboxylate and a manganese catalyst.2. The method of claim 1 , wherein the manganese catalyst is a manganese porphyrin or a manganese salen.3. The method of further comprising mixing a compound containing a carboxyl group claim 1 , a nucleophilic fluoride source claim 1 , a solvent and an iodine (III) oxidant to form the mono-fluoro-aryl iodine-(III) carboxylate prior to the step of combining.4. The method of further comprising maintaining the mono-fluoro-aryl iodine-(III) carboxylate at a temperature from 25° C. to 80° C.5. The method of claim 3 , wherein the nucleophilic fluoride source is trialkyl amine trihydrofluoride.6. The method of claim 5 , wherein the trialkyl amine trihydrofluoride is triethylamine trihydrofluoride.7. The method of claim 1 , wherein the step of combining is performed under an inert atmosphere.8. The method of claim 3 , wherein the nucleophilic fluoride source is [F]-fluoride.9. The method of claim 3 , wherein prior to the step of mixing claim 3 , the method comprises obtaining an aqueous [F] fluoride solution from a cyclotron claim 3 , loading the aqueous [F] fluoride solution onto an ion exchange cartridge and releasing the [F] fluoride from the ion exchange cartridge with an alkaline solution. This application is a divisional of U.S. patent application Ser. No. 15/019,673, which was filed Feb. 9, 2016 as a continuation-in-part of U.S. patent application Ser. No. 14/239,719, which was filed Apr. 8, 2014 and was a 35 U.S.C § 371 national stage of International Patent Application No. PCT/US2012/051628, which was filed Aug. 20, 2012. U.S. patent application Ser. No. 14/239,719 claimed the benefit of U.S. Provisional Application No. 62/113,847, ...

Photoacid generators and photoresists comprising same

New methods are provided for synthesis of photoacid generator compounds (“PAGs”), new photoacid generator compounds and photoresist compositions that comprise such PAG compounds. In a particular aspect, sulfonium-containing (S+) photoacid generators and methods of synthesis of sulfonium photoacid generators are provided.

COMPOUNDS FOR THE TREATMENT OF HYPERGLYCAEMIA

There is herein provided a compound of formula (I) or a pharmaceutically acceptable salt thereof, for use in the treatment of hyperglycaemia or a disorder characterized by hyperglycaemia, such as type 2 diabetes, wherein X, R, R, Rand n have meanings as provided in the description. 2. The compound for use according to claim 1 , wherein Rrepresents Calkyl optionally substituted by one or more F.3. The compound for use according to any preceding claim claim 1 , wherein Rrepresents n-butyl claim 1 , sec-butyl claim 1 , tent-butyl claim 1 , 2-pentyl claim 1 , cyclopentyl claim 1 , —CH-cyclopropyl claim 1 , —(CH)-cyclopropyl claim 1 , n-hexyl claim 1 , —(CH)-cyclopropyl claim 1 , —CH-cyclohexyl claim 1 , n-octyl claim 1 , —(CH)-cyclohexyl claim 1 , —(CH)-cyclohexyl claim 1 , 4 claim 1 ,4 claim 1 ,4-trifluorobutyl or 1-adamantyl.4. The compound for use according to any preceding claim claim 1 , wherein Rrepresents H and Rrepresents H or methyl.5. The compound for use according to any preceding claim claim 1 , wherein Rand Reach represent H.6. The compound for use according to any preceding claim claim 1 , wherein:{'sup': a', 'b', 'c', 'd', 'a', 'b', 'c', 'd, 'sub': 3', '2', '1-4', '1-4, 'each X independently represents halo, R, —CN, —N, —N(R)R, —NOor OR, wherein Rrepresents Calkyl optionally substituted by one or more F, and R, Rand Reach independently represent H or Calkyl optionally substituted by one or more F.'}7. The compound for use according to any preceding claim claim 1 , wherein each X independently represents F claim 1 , Cl claim 1 , R claim 1 , —NHor —OH claim 1 , wherein Rrepresents Calkyl optionally substituted by 1 or more F.8. The compound for use according to any preceding claim claim 1 , wherein each X independently represents Cl claim 1 , —NH claim 1 , —CFor —OH.9. The compound for use according to any preceding claim claim 1 , wherein n represents 0 claim 1 , 1 claim 1 , 2 or 3.10. The compound for use according to any preceding claim claim 1 , wherein ...

Nanomaterials containing constrained lipids and uses thereof

Compositions for delivering nucleic acids to cells or tissue microenvironments are provided. In one embodiment, the compositions are lipid nanoparticle compositions formulated to have reduced splenic and hepatic clearance. It has been discovered that the chemical composition of lipid nanoparticles significantly influences the natural trafficking of the lipid nanoparticles. More specifically, it has been discovered that conformationally constrained ionizable lipids can modify the tropism and clearance profile of lipid nanoparticles without the need of a targeting ligand. It has also been discovered that tropism of the disclosed lipid nanoparticles is size-independent.

COMPOUNDS, COMPOSITIONS, AND METHODS FOR MODULATING FERROPTOSIS AND TREATING EXCITOTOXIC DISORDERS

The present invention provides, inter alia, a compound having the structure: 131-. (canceled)33. The method according to claim 32 , wherein the neurodegenerative disease is selected from the group consisting of Alzheimer's claim 32 , Parkinson's claim 32 , Amyotrophic lateral sclerosis claim 32 , Friedreich's ataxia claim 32 , Multiple sclerosis claim 32 , Huntington's Disease claim 32 , Transmissible spongiform encephalopathy claim 32 , Charcot-Marie-Tooth disease claim 32 , Dementia with Lewy bodies claim 32 , Corticobasal degeneration claim 32 , Progressive supranuclear palsy claim 32 , and Hereditary spastic paraparesis.34. The method according to further comprising co-administering to the subject an effective amount of one or more compositions selected from the group consisting of Donepezil (Aricept) claim 32 , Rivastigmine (Exelon) claim 32 , Galantamine (Razadyne) claim 32 , Tacrine (Cognex) claim 32 , Memantine (Namenda) claim 32 , Vitamin E claim 32 , CERE-110: Adeno-Associated Virus Delivery of NGF (Ceregene) claim 32 , LY450139 (Eli Lilly) claim 32 , Exenatide claim 32 , Varenicline (Pfizer) claim 32 , PF-04360365 (Pfizer) claim 32 , Resveratrol claim 32 , Carbidopa/levodopa immediate-release (Sinemet) claim 32 , Carbidopa/levodopa oral disintegrating (Parcopa) claim 32 , Carbidopa/levodopa/Entacapone (Stalevo) claim 32 , Ropinirole (Requip) claim 32 , Pramipexole (Mirapex) claim 32 , Rotigotine (Neupro) claim 32 , Apomorphine (Apokyn) claim 32 , Selegiline (I-deprenyl claim 32 , Eldepryl) claim 32 , Rasagiline (Azilect) claim 32 , Zydis selegiline HCL Oral disintegrating (Zelapar) claim 32 , Entacapone (Comtan) claim 32 , Tolcapone (Tasmar) claim 32 , Amantadine (Symmetrel) claim 32 , Trihexyphenidyl (formerly Artane) claim 32 , Benztropine (Cogentin) claim 32 , IPX066 (Impax Laboratories Inc.) claim 32 , ioflupane 1231 (DATSCAN®) claim 32 , safinamide (EMD Serono) claim 32 , Pioglitazone claim 32 , riluzole (Rilutek) claim 32 , Lithium carbonate claim ...

Enantiomerically pure adamantane carboxamides for the treatment of filovirus infection

The compounds of the invention as shown by general structure I, as shown below, are effective in treating filovirus infections.X is selected from the group consisting of O and H;R1 is selected from (C6 to C10) aryl and (C2 to C9) heteroaryl, andR2 is selected from (C1 to C10) alkyl, (C1 to C10) alkenyl, (C1 to C10) alkynyl, (C3 to C10) cycloalkyl, and (C5 to C10) cycloalkenyl, andNR3aR3b is defined in the specification.These compounds are effective in treating filovirii infections including Ebolavirus and Marburg virus.

SALT, ACID GENERATOR, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN

The present invention can provide a salt and a resist composition including the salt, capable of producing a resist pattern with satisfactory line edge roughness (LER). 2. The salt according to claim 1 , wherein Ris a hydrogen atom or a fluorine atom.3. The salt according to claim 1 , wherein Rand Rare hydrogen atoms.4. The salt according to claim 1 , wherein the counter anion is an organic sulfonic acid anion.6. An acid generator comprising the salt according to .7. A resist composition comprising the acid generator according to and a resin having an acid-labile group.8. The resist composition according to claim 7 , further comprising a salt generating an acid having an acidity lower than that of an acid generated from the acid generator.9. A method for producing a resist pattern claim 7 , which comprises:{'claim-ref': {'@idref': 'CLM-00007', 'claim 7'}, '(1) a step of applying the resist composition according to on a substrate,'}(2) a step of drying the applied composition to form a composition layer,(3) a step of exposing the composition layer,(4) a step of heating the exposed composition layer, and(5) a step of developing the heated composition layer. The present invention relates to a salt, an acid generator, a resist composition and a method for producing a resist pattern.Patent Document 1 mentions a resist composition comprising a salt represented by the following formula as an acid generator.Patent Document 2 mentions a resist composition comprising a salt represented by the following formula as an acid generator.Patent Document 1: JP 2011-051981 APatent Document 2: JP 2014-235248 AAn object of the present invention is to provide a salt capable of producing a resist pattern having line edge roughness (LER) which is better than that of a resist pattern formed from the above-mentioned resist composition comprising a salt.The present invention includes the following inventions.[1] A salt represented by formula (I):wherein, in formula (I),Rand Reach ...

Platform drug delivery system utilizing crystal engineering and theanine dissolution

A platform drug delivery system and a method of improving the delivery of low solubility pharmaceuticals utilizing crystal engineering and Theanine dissolution resulting in enhanced bioactivity, dissolution rate, and solid state stability.

Memantine compounds and their preparation and uses thereof

Provided are compounds of formula (I), or a stereoisomer, mixture of stereoisomers, deuterated analog, tautomer, solvate or pharmaceutically acceptable salt thereof, compositions, method of making and uses thereof.

MODULATORS OF ATP-BINDING CASSETTE TRANSPORTERS

The present invention relates to modulators of ATP-Binding Cassette (“ABC”) transporters or fragments thereof, including Cystic Fibrosis Transmembrane Conductance Regulator, compositions thereof, and methods therewith. The present invention also relates to methods of treating ABC transporter mediated diseases using such modulators.

METHOD FOR PREPARING DIFLUOROALLYLBORONATE AND APPLICATION THEREOF

The present invention relates to a method for preparing difluoroallylboronate and application thereof, and it belongs to a field of compound preparation. A method for preparing difluoroallyl borate ester is using a compound of the formula II and bis (pinacolato) diboron as raw materials in a solvent and in the presence of an iron catalyst and a base according to the following reaction formula, to obtain a compound of the formula I, 2. The method according to claim 1 , wherein the Ris H or propyl.3. The method according to claim 1 , wherein the Ris H claim 1 , methyl claim 1 , methoxyl claim 1 , halogen claim 1 , trifluoromethyl claim 1 , tert-butyl claim 1 , trifluoromethoxy claim 1 , phenyl.4. The method according to claim 1 , wherein the amount of substance of the base is 0.5 to 3 times of that of the compound of formula II.5. The method according to claim 4 , wherein the amount of substance of the base is 1 to 2 times of that of the compound of formula II.6. The method according to claim 1 , wherein the amount of substance of the bis (pinacolato) diboron is 1 to 3 times of that of the compound of formula II.7. The method according to claim 6 , wherein the amount of substance of the bis (pinacolato) diboron is 1 to 1.5 times of that of the compound of formula II.8. The method according to claim 1 , wherein the amount of substance of the catalyst is 0.1% to 10% of that of the compound of formula II.9. The method according to claim 1 , wherein the reaction temperature of the reaction is 25° C. to solvent reflux temperature claim 1 , and the reaction time is 10 min to 48 h. The present invention relates to a method for preparing difluoroallylboronate and application thereof. It belongs to the field of compound preparation.Generally, the introduction of fluorine atom(s) into an organic molecule can change the physical, chemical properties and biological activity of a compound. Therefore, introduction of fluorine atom(s) into various drugs, macromolecular materials and ...

IMPROVED SOLID-STATE MAGNESIUM ION SELECTIVE MICROELECTRODE AND METHODS OF PRODUCTION AND USE THEREOF

A magnesium sensing membrane is disclosed for use in a potentiometric ion selective microelectrode that exhibits an increased lower detection limit. Potentiometric ion selective microelectrodes containing said magnesium sensing membranes are also disclosed. Kits containing the microelectrodes are also disclosed, along with methods of production and use of the magnesium sensing membranes and/or potentiometric ion selective microelectrodes. 2. The magnesium sensing membrane of claim 1 , wherein the mol ratio of lipophilic electrolyte to ionophore is in a range of from about 15 mol % to about 45 mol %.4. The magnesium sensing membrane of claim 1 , wherein the polymer is selected from the group consisting of poly(vinyl chloride) claim 1 , polyurethane claim 1 , and combinations thereof.5. The magnesium sensing membrane of claim 1 , wherein the membrane has a diameter of less than about 0.5 cm and a thickness of less than about 100 μm.6. The magnesium sensing membrane of claim 1 , wherein the lipophilic borate salt is potassium tetrakis (4-chlorophenyl) borate (KTpCIPB).8. The potentiometric ion selective microelectrode of claim 7 , wherein the mol ratio of lipophilic electrolyte to ionophore is in a range of from about 15 mol % to about 45 mol %.10. The potentiometric ion selective microelectrode of claim 7 , wherein the polymer is selected from the group consisting of poly(vinyl chloride) claim 7 , polyurethane claim 7 , and combinations thereof.11. The potentiometric ion selective microelectrode of claim 7 , wherein the membrane has a diameter of less than about 0.5 cm and a thickness of less than about 100 μm.12. The potentiometric ion selective microelectrode of claim 7 , wherein the lipophilic borate salt is potassium tetrakis (4-chlorophenyl) borate (KTpCIPB).14. The method of claim 13 , wherein the mol ratio of lipophilic electrolyte to ionophore is in a range of from about 15 mol % to about 45 mol %.16. The method of claim 13 , wherein the polymer is selected ...

RADIATION-SENSITIVE RESIN COMPOSITION, METHOD OF FORMING RESIST PATTERN, POLYMER, AND COMPOUND

A radiation-sensitive resin composition includes: a first polymer including a structural unit including an acid-labile group; a second polymer including a structural unit represented by formula (1); and a radiation-sensitive acid generator. In the formula (1), A represents an oxygen atom or a sulfur atom; a sum of m and n is 2 or 3, wherein m is 1 or 2, and n is 1 or 2; X represents a single bond or a divalent organic group having 1 to 20 carbon atoms; and Rrepresents a monovalent organic group including a fluorine atom. 2. The radiation-sensitive resin composition according to claim 1 , wherein Rin the formula (1) represents a group defined as (1-1) or (1-2):{'sup': 1a', '1a, '(1-1): a group represented by *—COO—R, wherein Rrepresents a substituted or unsubstituted monovalent fluorinated hydrocarbon group having 1 to 20 carbon atoms, or a monovalent organic group comprising —O—, —CO—, or —COO— between two carbon atoms in a C—C bond constituting a substituted or unsubstituted monovalent fluorinated hydrocarbon group having 2 to 20 carbon atoms; and * denotes a site of bonding to X in the formula (1); and'}(1-2): a substituted or unsubstituted monovalent fluorinated hydrocarbon group having 1 to 20 carbon atoms, or a group comprising —O—, —CO—, or —COO— between two carbon atoms in a C—C bond constituting a substituted or unsubstituted monovalent fluorinated hydrocarbon group having 2 to 20 carbon atoms, wherein the group defined as (1-2) does not fall under the group defined as (1-1).3. The radiation-sensitive resin composition according to claim 2 , wherein Rin the group defined as (1-1) represents a substituted or unsubstituted monovalent fluorinated hydrocarbon group having 1 to 20 carbon atoms claim 2 , —R—COO—R claim 2 , or —R—O—R claim 2 ,wherein{'sup': '1b', 'Rrepresents a substituted or unsubstituted divalent hydrocarbon group having 1 to 20 carbon atoms, a substituted or unsubstituted divalent fluorinated hydrocarbon group having 1 to 20 carbon atoms, or a ...

Onium salt compound, chemically amplified resist composition and patterning process

An onium salt having formula (1) serving as an acid diffusion inhibitor and a chemically amplified resist composition comprising the acid diffusion inhibitor are provided. When processed by lithography, the resist composition exhibits a high sensitivity, and excellent lithography performance factors such as CDU and LWR.

Resist composition and patterning process

A resist composition comprising a base polymer and a sulfonium salt of iodized benzoic acid offers a high sensitivity and minimal LWR independent of whether it is of positive or negative tone.

Salt, acid generator, photoresist composition, and method for producing photoresist pattern

A salt represented by the formula (I): wherein Q 1 and Q 2 each independently represent a fluorine atom or a C 1 to C 6 perfluoroalkyl group; R 1 represents a C 1 to C 12 alkyl group in which a methylene group may be replaced by an oxygen atom or a carbonyl group; A 1 represents a C 2 to C 8 alkanediyl group; and R 2 represents a C 5 to C 18 alicyclic hydrocarbon group in which a hydrogen atom may be replaced by a hydroxy group, and in which a methylene group may be replaced by an oxygen atom or a carbonyl group, and which alicyclic hydrocarbon group may have a cyclic ketal structure optionally having a fluorine atom; and “m” represents an integer of 0, 1, 2 or 3.

SALTS AND PHOTORESISTS COMPRISING SAME

New Te-salt compounds are provided, including photoactive tellurium salt compounds useful for Extreme Ultraviolet Lithography. 6. A salt of wherein the salt comprises a polymerizable group.7. A salt of wherein the salt comprises one or more acid-labile groups.8. A photoresist composition comprising a resin and one or more salts of .9. The photoresist composition of wherein the photoresist composition comprises one or more acid generator compounds that are distinct from the one or more salts.10. A method for providing a photoresist relief image comprising:{'claim-ref': {'@idref': 'CLM-00008', 'claim 8'}, 'a) applying a coating layer of a photoresist of on a substrate; and'}b) exposing the photoresist composition layer to activating radiation and developing the exposed photoresist composition coating layer. The present invention relates to new salt compounds that comprise one or more Te atoms. In one preferred aspect, photoactive tellurium salt compounds are provided that are useful for extreme ultraviolet lithography.Extreme ultraviolet lithography (“EUVL”) is one of the leading technologies options to replace optical lithography for volume semiconductor manufacturing at feature sizes <20 nm. The extremely short wavelength (13.4 nm) is a key enabling factor for high resolution required at multiple technology generations. In addition, the overall system concept—scanning exposure, projection optics, mask format, and resist technology—is quite similar to that used for current optical technologies. Like previous lithography generations, EUVL consists of resist technology, exposure tool technology, and mask technology. The key challenges are EUV source power and throughput. Any improvement in EUV power source will directly impact the currently strict resist sensitivity specification. Indeed, a major issue in EUVL imaging is resist sensitivity, the lower the sensitivity, the greater the source power that is needed or the longer the exposure time that is required to fully ...

ADAMANTYLMETHYLAMINE DERIVATIVE AND USE THEREOF AS PHARMACEUTICAL

The present invention provides a pharmaceutical composition for treating or preventing a cognitive disease or disorder, comprising a compound represented by Formula (I), an enantiomer thereof a diastereomer thereof, or a pharmaceutically acceptable salt thereof. 4. The compound claim 1 , enantiomer thereof claim 1 , diastereomer thereof claim 1 , or pharmaceutically acceptable salt thereof according to claim 1 , wherein Qand Rrepresent hydrogen atoms.5. The compound claim 1 , enantiomer thereof claim 1 , diastereomer thereof claim 1 , or pharmaceutically acceptable salt thereof according to claim 1 , wherein Qand Rare selected from halogen atoms.6. The compound claim 1 , enantiomer thereof claim 1 , diastereomer thereof claim 1 , or pharmaceutically acceptable salt thereof according to claim 1 , wherein Qand Rrepresent chlorine atoms.7. The compound claim 1 , enantiomer thereof claim 1 , diastereomer thereof claim 1 , or pharmaceutically acceptable salt thereof according to claim 1 , wherein Rrepresents phenylsulfonyl optionally substituted with one or more substituents selected from X claim 1 , (Calkyl)sulfonyl optionally substituted with one or more halogen atoms claim 1 , or —CORRrepresents Calkyl.8. The compound claim 7 , enantiomer thereof claim 7 , diastereomer thereof claim 7 , or pharmaceutically acceptable salt thereof according to claim 7 , wherein Rrepresents trifluoroacetyl.9. The compound claim 1 , enantiomer thereof claim 1 , diastereomer thereof claim 1 , or pharmaceutically acceptable salt thereof according to claim 1 , wherein Rrepresents phenyl optionally substituted with one or more substituents selected from X.10. The compound claim 1 , enantiomer thereof claim 1 , diastereomer thereof claim 1 , or pharmaceutically acceptable salt thereof according to claim 1 , wherein Rrepresents a hydrogen atom.11. The compound claim 1 , enantiomer thereof claim 1 , diastereomer thereof claim 1 , or pharmaceutically acceptable salt thereof according to claim 1 ...

Compositions and methods to treat neurodegenerative diseases

The specification provides compositions and methods to treat neurodegenerative diseases.

Antibiotic Compounds

The present application provides compounds and methods of treating bacterial infection, including bacterial infection caused by P. acnes.

HEPATITIS B ANTIVIRAL AGENTS

The present invention discloses compounds of Formula (I), or pharmaceutically acceptable salts, esters, or prodrugs thereof: 210-. (canceled)11. A pharmaceutical composition comprising a compound according to and a pharmaceutically acceptable carrier or excipient.12. A method of treating or preventing an HBV infection in a subject in need thereof claim 1 , comprising administering to the subject a therapeutically effective amount of a compound or a combination of compounds according to .13. The method of claim 12 , further comprising administering to the subject at least one additional therapeutic agent selected from the group consisting of HBV polymerase inhibitors claim 12 , interferon claim 12 , viral entry inhibitors claim 12 , viral maturation inhibitors claim 12 , capsid assembly or core protein inhibitors or modulators claim 12 , reverse transcriptase inhibitors claim 12 , TLR-agonists claim 12 , inducers of cellular viral RNA sensor claim 12 , therapeutic vaccines claim 12 , RNA interference (RNAi) or small interfering RNA (siRNA) and combinations thereof.14. The method of claim 13 , wherein the compound and the at least one additional therapeutic agent are co-formulated.15. The method of claim 13 , wherein the at least one additional therapeutic agent is administered at a lower dose and/or frequency than that which is therapeutically effective when said agent is administered alone. This application is a continuation of U.S. application Ser. No. 16/715,602, filed on Dec. 16, 2019, which is a continuation application of U.S. application Ser. No. 16/194,608, filed on Nov. 19, 2018, now U.S. Pat. No. 10,538,532, issued on Jan. 21, 2020, which is a divisional of U.S. application Ser. No. 15/450,125, filed on Mar. 6, 2017, now U.S. Pat. No. 10,179,792, issued on Jan. 15, 2019, which claims the benefit of U.S. Provisional Application No. 62/304,671, filed on Mar. 7, 2016, and 62/337,675, filed on May 17, 2016. The entire teachings of the above applications are ...

ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN FORMING METHOD, AND METHOD OF MANUFACTURING ELECTRONIC DEVICE

An actinic ray-sensitive or radiation-sensitive resin composition contains a compound that generates an acid represented by Formula (I) by irradiation with an actinic ray or radiation, and a resin. The resist film is formed of the actinic ray-sensitive or radiation-sensitive resin composition. In the pattern forming method and the method of manufacturing an electronic device, the actinic ray-sensitive or radiation-sensitive resin composition is used. 2. The actinic ray-sensitive or radiation-sensitive resin composition according to claim 1 ,{'sup': '1', 'wherein, in Formula (I), Rrepresents a hydrocarbon group having 1 to 20 carbon atoms.'}3. The actinic ray-sensitive or radiation-sensitive resin composition according to claim 1 ,{'sup': '2', 'wherein, in Formula (I), Rrepresents a hydrocarbon group having 2 to 20 carbon atoms which may include a hetero atom.'}4. The actinic ray-sensitive or radiation-sensitive resin composition according to claim 1 ,{'sup': 1', '2, 'wherein, in Formula (I), Ris a linear or branched alkyl group, and Ris an alkyl group having 2 to 20 carbon atoms.'}5. The actinic ray-sensitive or radiation-sensitive resin composition according to claim 1 ,wherein, in Formula (I), n is 1.6. The actinic ray-sensitive or radiation-sensitive resin composition according to claim 1 ,wherein the resin is a resin that is decomposed due to an action of an acid to increase polarity.7. A resist film that is formed of the actinic ray-sensitive or radiation-sensitive resin composition according to .8. A pattern forming method comprising:{'claim-ref': {'@idref': 'CLM-00001', 'claim 1'}, 'forming a resist film by using the actinic ray-sensitive or radiation-sensitive resin composition according to ;'}exposing the resist film; anddeveloping the exposed resist film with a developer.9. The pattern forming method according to claim 8 ,wherein the developer contains an organic solvent.10. A method of manufacturing an electronic device claim 8 , comprising:{'claim-ref': ...

LIGHT EMITTING DIODE AND DISPLAY DEVICE INCLUDING THE SAME

A light emitting diode of an embodiment includes a first electrode, a hole transport region disposed on the first electrode, an emission layer disposed on the hole transport region, an electron transport region disposed on the emission layer, and a second electrode disposed on the electron transport region. The hole transport region includes a first hole transport layer disposed adjacent to the first electrode and having a first refractive index, a second hole transport layer disposed adjacent to the emission layer and having a second refractive index, and a third hole transport layer disposed between the first hole transport layer and the second hole transport layer and having a third refractive index which is greater than each of the first refractive index and the second refractive index, thereby showing high light extraction efficiency and high emission efficiency properties. 1. A light emitting diode , comprising:a first electrode;a hole transport region disposed on the first electrode;an emission layer disposed on the hole transport region;an electron transport region disposed on the emission layer; anda second electrode disposed on the electron transport region, a first hole transport layer disposed adjacent to the first electrode, the first hole transport layer having a first refractive index;', 'a second hole transport layer disposed adjacent to the emission layer, the second hole transport layer having a second refractive index; and', 'a third hole transport layer disposed between the first hole transport layer and the second hole transport layer, the third hole transport layer having a third refractive index which is greater than each of the first refractive index and the second refractive index., 'wherein the hole transport region comprises2. The light emitting diode of claim 1 , whereina difference between the third refractive index and the first refractive index is greater than about 0.1, anda difference between the third refractive index and the second ...

Substituted cyano cycloalkyl penta-2,4-dienes, cyano cycloalkyl pent-2-en-4-ynes, cyano heterocyclyl penta-2,4-dienes and cyano heterocyclyl pent-2-en-4-ynes as active substances

The invention relates to cyano cycloalkyl penta-2,4-dienes, cyano cycloalkyl pent-2-en-4-ynes, cyano heterocyclyl penta-2,4-dienes and cyano heterocyclyl pent-2-en-4-ynes of general formula (I), or the salts thereof, where [X-Y], Q, R 1 , R 2 , A 1 , A 2 , V, W, m and n have the definitions specified in the description. The invention also relates to a production method for same and to the use of same for increasing stress tolerance in plants against abiotic stress, and/or for increasing the plant yield.

HEPATITIS B ANTIVIRAL AGENTS

The present invention discloses compounds of Formula (I), or pharmaceutically acceptable salts, esters, or prodrugs thereof: 110-. (canceled)11. A pharmaceutical composition claim 16 , comprising a compound according to and a pharmaceutically acceptable carrier or excipient.12. A method of treating or preventing an HBV infection in a subject in need thereof claim 16 , comprising administering to the subject a therapeutically effective amount of a compound according to .13. The method of claim 12 , further comprising administering to the subject at least one additional therapeutic agent selected from the group consisting of HBV polymerase inhibitors claim 12 , interferon claim 12 , viral entry inhibitors claim 12 , viral maturation inhibitors claim 12 , capsid assembly or core protein inhibitors or modulators claim 12 , reverse transcriptase inhibitors claim 12 , TLR-agonists claim 12 , inducers of cellular viral RNA sensor claim 12 , therapeutic vaccines claim 12 , RNA interference (RNAi) or small interfering RNA (siRNA) and combinations thereof.14. The method of claim 13 , wherein the compound and the at least one additional therapeutic agent are co-formulated.15. (canceled)17. The compound of claim 16 , wherein:n at each occurrence is independently 0, 1, or 2;{'sub': '21', 'Rat each occurrence is independently halogen, CN, methyl, methoxy, or cyclopropyl;'}{'sub': '22', 'Ris halogen, CN, methyl, or methoxy;'}{'sub': '23', 'Ris hydrogen or halogen;'}{'sub': 10', '1', '3, 'Each Ris independently hydrogen, halogen, hydroxyl, or optionally substituted C-Calkyl; and'}{'sub': '30', 'Ris hydrogen or an acyl group derived from an amino acid.'}18. The compound of claim 16 , wherein:{'sub': '21', 'Each Ris fluorine;'}{'sub': '22', 'Ris chlorine;'}{'sub': '23', 'Ris hydrogen or fluorine; and'}{'sub': '10', 'Each Ris independently hydrogen, halogen, hydroxyl, hydroxymethyl, fluoromethyl, trifluoromethyl, or methoxymethyl.'}19. The compound of claim 16 , wherein Ris an acyl ...

AMANTADINE NITRATE COMPOUNDS FOR USE AS MEDICAMENTS FOR THE TREATMENT OF DISEASES

The present invention relates to amantadine nitrate compounds having neural protective effect, and preparation method and medical use thereof. The compounds have the structure of the general formula (II). 5. The method of claim 1 , wherein the diseases related to NMDA receptor are: cerebral ischemia claim 1 , Parkinson's disease claim 1 , Alzheimer's disease claim 1 , amyotrophic lateral sclerosis claim 1 , ataxia telangiectasia claim 1 , bovine spongiform encephalopathy claim 1 , Creutzfeldt-Jakob disease claim 1 , Huntington's disease claim 1 , cerebellum atrophy claim 1 , multiple sclerosis claim 1 , primary amyotrophic lateral sclerosis claim 1 , spinal muscular atrophy claim 1 , glaucoma claim 1 , vascular dementia claim 1 , subarachnoid hemorrhage claim 1 , pulmonary arterial hypertension claim 1 , chronic obstructive pulmonary disease claim 1 , acute lung injury claim 1 , bronchial asthma claim 1 , or age-related macular degeneration.6. The method of claim 1 , wherein the diseases related to NO production are: stroke claim 1 , brain trauma claim 1 , epilepsy claim 1 , Parkinson's disease claim 1 , Huntington's disease claim 1 , amyotrophic lateral sclerosis claim 1 , Alzheimer's disease claim 1 , hypoxic-ischemic brain damage claim 1 , cerebral hemorrhage claim 1 , dementia claim 1 , ischemic heart disease claim 1 , blood clots claim 1 , atherosclerosis claim 1 , hypercholesterolemia claim 1 , emphysema claim 1 , cataracts claim 1 , diabetes claim 1 , acute pancreatitis claim 1 , alcohol-induced liver disease claim 1 , kidney damage claim 1 , glaucoma claim 1 , vascular dementia claim 1 , subarachnoid hemorrhage claim 1 , pulmonary arterial hypertension claim 1 , chronic obstructive pulmonary disease claim 1 , or acute lung injury claim 1 , bronchial asthma.7. The method of claim 1 , wherein the diseases related to neurodegeneration are: cerebral ischemia claim 1 , Parkinson's disease claim 1 , Alzheimer's disease claim 1 , amyotrophic lateral sclerosis claim ...

PHOTO-DECOMPOSABLE COMPOUND, PHOTORESIST COMPOSITION INCLUDING THE SAME, AND METHOD OF MANUFACTURING INTEGRATED CIRCUIT DEVICE

A photo-decomposable compound includes an anion component including an adamantyl group and a cation component including a C5 to C40 cyclic hydrocarbon group and forming a complex with the anion component. At least one of the adamantyl group and the cyclic hydrocarbon group has a substituent, which decomposes by acid and generates an alkali soluble group. The substituent includes an acid-labile protecting group. A photoresist composition includes a chemically amplified polymer, the photo-decomposable compound, and a solvent. To manufacture an integrated circuit (IC) device, a photoresist film is formed using the photoresist composition on a feature layer, a first area of the photoresist film is exposed to generate a plurality of acids from the photo-decomposable compound in the first area, the chemically amplified polymer is deprotected due to the plurality of acids, and the first area is removed to form a photoresist pattern. 1. A photo-decomposable compound , comprising:an anion component including an adamantyl group; anda cation component including a C5 to C40 cyclic hydrocarbon group, the cation component forming a complex with the anion component,wherein:at least one of the adamantyl group and the C5 to C40 cyclic hydrocarbon group has a substituent,the substituent decomposes in response to exposure to an acid to generate an alkali soluble group, andthe substituent includes an acid-labile protecting group.2. The photo-decomposable compound as claimed in claim 1 , wherein the acid-labile protecting group is a substituted or unsubstituted t-butyl group or a C3 to C30 substituted or unsubstituted tertiary alicyclic group.3. The photo-decomposable compound as claimed in claim 1 , wherein:the acid-labile protecting group includes a first substituent,the first substituent includes a C1 to C10 alkyl group, a C1 to C10 alkoxy group, a halogen atom, a C1 to C10 halogenated alkyl group, a hydroxyl group, an unsubstituted C6 to C30 aryl group, or a C6 to C30 aryl group,at ...

Novel adamantane and memantine derivatives as peripheral nmda receptor antagonists

The present invention relates to cationic compounds of formula (I) for use as peripheral NMDA receptor antagonists.

NOVEL ANTAGONISTS OF THE GLUCAGON RECEPTOR

The present invention provides for novel compounds of Formula (I) and pharmaceutically acceptable salts and co-crystals thereof which have glucagon receptor antagonist or inverse agonist activity. The present invention further provides for pharmaceutical compositions comprising the same as well as methods of treating, preventing, delaying the time to onset or reducing the risk for the development or progression of a disease or condition for which one or more glucagon receptor antagonist is indicated, including Type I and II diabetes, insulin resistance and hyperglycemia. The present invention also provides for processes of making the compounds of Formula I, including salts and co-crystals thereof and pharmaceutical compositions comprising the same. 2. The method according to claim 1 , wherein{'sub': 1-6', '3', '1-6, 'D is a substituted group selected from phenyl or heteroaryl, wherein said group is substituted with L and, optionally, one or more additional substituents independently selected from C-alkyl, halogen, —CF, or C-haloalkyl;'}wherein said heteroaryl contains one or two heteroatoms independently selected from nitrogen, oxygen, or sulfur.3. The method according to claim 1 , wherein{'sup': 2', '2, 'sub': '1-3', 'Z is —C(O)N(R)—; wherein said Ris hydrogen or C-alkyl;'}{'sup': 27', '27, 'sub': '1-3', 'Y is a group selected from —O— or —CHR—; wherein Ris hydrogen or C-alkyl; and'}{'sup': '1', 'sub': '3', 'Ris a group selected from hydrogen, —F, or —CH.'}4. The method according to claim 1 , wherein{'sub': 3-8', '4-8', '3-8', '4-8', '1-6', '3', '3', '2', '3, 'E is a group selected from phenyl, C-cycloalkyl-substituted phenyl, C-cycloalkenyl-substituted phenyl, phenyl-substituted phenyl, benzyl, C-cycloalkyl-substituted benzyl, C-cycloalkenyl-substituted benzyl, or phenyl-benzyl, wherein each group is optionally substituted with one to three groups independently selected from halogen, —CN, —C-alkyl, halogen, —CF, —OCF, or —OCHCF.'}6. The method according to claim 1 ...

SALT, ACID GENERATOR, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN

Disclosed are a salt represented by formula (1), and an acid generator and a resist composition which include the same: 2. The salt according to claim 1 , wherein R claim 1 , Rand Reach independently represent a fluorine atom claim 1 , an iodine atom or a perfluoroalkyl group having 1 to 4 carbon atoms.3. An acid generator comprising the salt according to .4. A resist composition comprising the acid generator according to and a resin having an acid-labile group.7. The resist composition according to claim 4 , further comprising a salt generating an acid having an acidity lower than that of an acid generated from the acid generator.8. A method for producing a resist pattern claim 4 , which comprises:{'claim-ref': {'@idref': 'CLM-00004', 'claim 4'}, '(1) a step of applying the resist composition according to on a substrate,'}(2) a step of drying the applied composition to form a composition layer,(3) a step of exposing the composition layer,(4) a step of heating the exposed composition layer, and(5) a step of developing the heated composition layer. The present invention relates to a salt, an acid generator, a resist composition and a method for producing a resist pattern.Patent Document 1 mentions resist compositions each including, as acid generators, salts represented by the following formulas.Patent Document 2 mentions resist compositions including, as acid generators, salts represented by the following formulas.The present invention provides a salt and a resist composition comprising the salt capable of producing a resist pattern with CD uniformity (CDU) which is better than that of a resist pattern formed from the resist compositions including the salts mentioned above.The present invention includes the following inventions.[1] A salt represented by formula (I):wherein, in formula (I),Rrepresents a fluorine atom or a fluorinated alkyl group having 1 to 4 carbon atoms,R, Rand Reach independently represent a halogen atom, a fluorinated alkyl group having 1 to 4 ...

THERAPEUTIC COMPOUNDS AND METHODS OF USE THEREOF

The invention provides compounds having the general formula I: 11. The compound of claim 1 , wherein ring “B” is selected from the group consisting of cyclobutyl claim 1 , cyclopentyl claim 1 , and cyclohexyl.2024-. (canceled)25. The compound of claim 1 , wherein ring “A” is a 6-15 membered carbocycle.2643-. (canceled)45. A pharmaceutical composition comprising a compound of formula I as described in claim 1 , or a pharmaceutically acceptable salt thereof claim 1 , and a pharmaceutically acceptable excipient.46. A method of treating a disease or condition in a mammal selected from the group consisting of pain claim 1 , depression claim 1 , cardiovascular diseases claim 1 , respiratory diseases claim 1 , and psychiatric diseases claim 1 , and combinations thereof claim 1 , wherein the method comprises administering to the mammal in need thereof a therapeutically effective amount of a compound of formula I as described in or a pharmaceutically acceptable salt thereof.4753-. (canceled) This application is a continuation of International Application No. PCT/US2016/048477, filed 24 Aug. 2016, which claims the benefit of U.S. Provisional Application No. 62/210,891, filed 27 Aug. 2015. The entire content of the applications referenced above are hereby incorporated by reference.The present invention relates to organic compounds useful for therapy in a mammal, and in particular to inhibitors of sodium channel (e.g., NaV1.7) that are useful for treating sodium channel-mediated diseases or conditions, such as pain, as well as other diseases and conditions associated with the modulation of sodium channels.Voltage-gated sodium channels are transmembrane proteins that initiate action potentials in nerve, muscle and other electrically excitable cells, and are a necessary component of normal sensation, emotions, thoughts and movements (Catterall, W. A., Nature (2001), Vol. 409, pp. 988-990). These channels consist of a highly processed alpha subunit that is associated with ...

Benzo Annulenes as Antiviral Agents

The present disclosure is concerned with benzo annulene compounds that are capable of inhibiting a viral infection and methods of treating viral infections such as, for example, chikungunya, Venezuelan equine encephalitis, dengue, influenza, and zika, using these compounds. This abstract is intended as a scanning tool for purposes of searching in the particular art and is not intended to be limiting of the present invention. 2. The compound of claim 1 , wherein Z is CH.3. The compound of claim 1 , wherein each of Rand Ris hydrogen.4. The compound of claim 1 , wherein Ris —OR.5. The compound of claim 1 , wherein Cyis selected from C5-C6 aryl and C4-C5 heteroaryl and substituted with 0 claim 1 , 1 claim 1 , or 2 groups independently selected from halogen claim 1 , —COH claim 1 , —CN claim 1 , —OH claim 1 , —NH claim 1 , C1-C8 alkyl claim 1 , C1-C8 haloalkyl claim 1 , C1-C8 alkylnitrile claim 1 , C1-C8 hydroxyalkyl claim 1 , C1-C8 alkoxy claim 1 , C1-C8 halohydroxyalkyl claim 1 , C1-C8 aminoalkyl claim 1 , C1-C8 alkylamino claim 1 , (C1-C8)(C1-C8) dialkylamino claim 1 , and Cy.6. The compound of claim 1 , wherein Cyis phenyl substituted with 0 claim 1 , 1 claim 1 , or 2 groups independently selected from halogen claim 1 , —COH claim 1 , —CN claim 1 , —OH claim 1 , —NH claim 1 , C1-C8 alkyl claim 1 , C1-C8 haloalkyl claim 1 , C1-C8 alkylnitrile claim 1 , C1-C8 hydroxyalkyl claim 1 , C1-C8 alkoxy claim 1 , C1-C8 halohydroxyalkyl claim 1 , C1-C8 aminoalkyl claim 1 , C1-C8 alkylamino claim 1 , (C1-C8)(C1-C8) dialkylamino and Cy.7. The compound of claim 1 , wherein Cyis phenyl substituted with a tert-butyl group.8. The compound of claim 1 , wherein Cyis C4-C5 heteroaryl substituted with 0 claim 1 , 1 claim 1 , or 2 groups independently selected from halogen claim 1 , —COH claim 1 , —CN claim 1 , —OH claim 1 , —NH claim 1 , C1-C8 alkyl claim 1 , C1-C8 haloalkyl claim 1 , C1-C8 alkylnitrile claim 1 , C1-C8 hydroxyalkyl claim 1 , C1-C8 alkoxy claim 1 , C1-C8 halohydroxyalkyl ...

Compounds, compositions, and methods for modulating ferroptosis and treating excitotoxic disorders

The present invention provides, inter alia, a compound having the structure: Also provided are compositions containing a pharmaceutically acceptable carrier and a compound according to the present invention. Further provided are methods for treating or ameliorating the effects of an excitotoxic disorder in a subject, methods of modulating ferroptosis in a subject, methods of reducing reactive oxygen species (ROS) in a cell, and methods for treating or ameliorating the effects of a neurodegenerative disease.

Compounds Which Have a Protective Activity with Respect to the Action of Toxins and of Viruses with an Intracellular Mode of Action

The subject matter of the present invention is novel families of compounds which are aromatic amine, imine, aminoadamantane and benzodiazepine derivatives, medicaments comprising same and the use thereof as inhibitors of the toxic effects of toxins with intracellular activity, such as, for example, ricin, and of viruses that use the internalization pathway for infecting cells. 2. The method as claimed in claim 1 , characterized in that said compound of and/or Ris a hydrogen atom.4. (canceled)5. The method as claimed in claim 1 , characterized in that said compound of general formula (I) is selected from the group consisting ofCompound 1: N-benzyladamantylamine;Compound 2: N-(2-bromobenzyl)adamantylamine;Compound 3: N-(3-bromobenzyl)adamantylamine;Compound 4: N-(4-bromobenzyl)adamantylamine;Compound 5: N-(3-fluorobenzyl)adamantylamine;Compound 6: N-(3-hydroxybenzyl)adamantylamine;Compound 7: N-(2-methoxybenzyl)adamantylamine;Compound 8: N-(3-methoxybenzyl)adamantylamine;Compound 9: N-(4-methoxybenzyl)adamantylamine;Compound 10: N-(2-nitrobenzyl)adamantylamine;Compound 11: N-(4-nitrobenzyl)adamantylamine;Compound 12: N-(4-carbethoxybenzyl)adamantylamine;Compound 13: 4-bromo-2-((1-adamantylino)methyl)phenol;Compound 14: N-(2-bromo-5-nitrobenzyl)adamantylamine;Compound 15: N-[(2-methoxy-5-bromo)benzyl]adamantylamine;Compound 16: N-((pyridin-2-yl)methyl)adamantylamine;Compound 17: N-((pyridin-3-yl)methyl)adamantylamine;Compound 18: N-((pyridin-4-yl)methyl)adamantylamine;Compound 19: N-((5-methylfuran-2-yl)methy)adamantylamine;Compound 20: N-((5-methylthiophen-2-yl)methyl)cyclohexanamine;Compound 21: N-[(3-furyl)methyl]adamantylamine;Compound 22: N-((1-methyl-1H-imidazol-5-yl)methy)adamantylamine;Compound 23: N-[(5-N-methylimidazolyl)methyl]adamantylamine;Compound 24: Benzo[d][1,3]dioxol-4-yl)methyl)adamantylamine;Compound 25: N-((5-nitrobenzo[d][1,3]dioxol-6-yl)methyl)adamantylamine;Compound 26: N-((quinolin-3-yl)methyl)adamantylamine;Compound 27: N-((quinolin-4-yl) ...

1,3-bis(hydroxyphenyl)-5-ethyladamantane compound and method for production thereof, and aromatic polycarbonate resin and method for production thereof

The present invention can provide a 1,3-bis(hydroxyphenyl)-5-ethyladamantane compound represented by Formula (1) below and a method for producing the same, as well as an aromatic polycarbonate resin comprising said compound and a method for producing the same. (wherein, R represents an alkyl group with a carbon number of 1-6, a cycloalkyl group with a carbon number of 3-6, or a phenyl group, and n represents an integer of 0-2).

CARBOXYLATE, CARBOXYLIC ACID GENERATOR, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN

Disclosed are a carboxylate represented by formula (I), and a carboxylic acid generator and a resist composition, including the same: 2. The carboxylate according to claim 1 , wherein R claim 1 , Rand Reach independently represent a fluorine atom claim 1 , an iodine atom or a perfluoroalkyl group having 1 to 4 carbon atoms.4. The carboxylate according to claim 3 , wherein Xis an alicyclic hydrocarbon group having 3 to 36 carbon atoms which may have a fluorine atom or a hydroxy group (—CH— included in the alicyclic hydrocarbon group may be replaced by —O— claim 3 , —S— claim 3 , —CO— or —SO—) claim 3 , a group obtained by combining an alicyclic hydrocarbon group having 3 to 36 carbon atoms with a chain hydrocarbon group having 1 to 18 carbon atoms (—CH— included in the alicyclic hydrocarbon group may be replaced by —O— claim 3 , —S— claim 3 , —CO— or —SO— claim 3 , —CH— included in the chain hydrocarbon group may be replaced by —O— or —CO— claim 3 , and the alicyclic hydrocarbon group and the chain hydrocarbon group may have a fluorine atom or a hydroxy group) claim 3 , an aromatic hydrocarbon group having 6 to 36 carbon atoms which may have a fluorine atom or a hydroxy group claim 3 , a group represented by formula (aa) or a group represented by formula (bb).5. A carboxylic acid generator comprising the carboxylate according to .6. A resist composition comprising the carboxylic acid generator according to claim 5 , an acid generator other than the carboxylic acid generator claim 5 , and a resin having an acid-labile group.9. A method for producing a resist pattern claim 5 , which comprises:{'claim-ref': {'@idref': 'CLM-00006', 'claim 6'}, '(1) a step of applying the resist composition according to on a substrate,'}(2) a step of drying the applied composition to form a composition layer,(3) a step of exposing the composition layer,(4) a step of heating the exposed composition layer, and(5) a step of developing the heated composition layer. The present invention ...

MONOMER, POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS

A monomer of formula (1a) or (1b) is provided wherein A is a polymerizabie group, R-Rare monovalent hydrocarbon groups, Xis a divalent hydrocarbon, group, Zis an aliphatic group, Zforms an alicyclic group, k=0 or 1, m=1 or 2, n=1 to 4. A useful polymer is obtained by polymerizing the monomer. A resist composition comprising the polymer has improved development properties and is processed to form a negative pattern having high contrast, high resolution and etch resistance which is insoluble in alkaline developer. 2. A polymer comprising recurring units derived from the monomer of .6. A resist composition comprising a base resin claim 2 , an acid generator claim 2 , and an organic solvent claim 2 , the base resin comprising the polymer of .7. A pattern forming process comprising the steps of applying the resist composition of onto a substrate claim 6 , baking to form a resist film claim 6 , exposing the resist film to high-energy radiation to define exposed and unexposed regions claim 6 , baking claim 6 , and developing the exposed resist film in a developer to form a pattern.8. The pattern forming process of wherein the developing step uses an alkaline developer in which the unexposed region of resist film is dissolved and the exposed region of resist film is not dissolved claim 7 , for forming a negative tone pattern. This application is a Divisional of U.S. application Ser. No. 15/346,981, filed on Nov. 9, 2016, and wherein U.S. application Ser. No. 15/346,981 is a non-provisional application which claims priority under 35 U.S.C. § 119(a) to Patent Application No. 2015-220175 filed in Japan on Nov. 10, 2015, the entire contents of which are hereby incorporated by reference.This invention relates to a monomer useful as a starting reactant for functional, pharmaceutical and agricultural chemicals, a polymer comprising recurring units derived from the monomer, a resist composition comprising the polymer, and a pattern forming process using the composition.To meet the ...

FARNESOID X RECEPTOR AGONISTS AND USES THEREOF

Described herein are compounds that are farnesoid X receptor agonists, methods of making such compounds, pharmaceutical compositions and medicaments comprising such compounds, and methods of using such compounds in the treatment of conditions, diseases, or disorders associated with farnesoid X receptor activity. 2. The compound of claim 1 , or a pharmaceutically acceptable salt or solvate thereof claim 1 , wherein:{'sup': 3', '3', '3', '12, 'sub': 4', '10', '3', '10, 'Ris selected from substituted or unsubstituted C-Calkyl, substituted or unsubstituted C-Ccycloalkyl, or substituted or unsubstituted aryl, wherein if Ris substituted then Ris substituted with one or more Rgroups.'}3. The compound of or claim 1 , or a pharmaceutically acceptable salt or solvate thereof claim 1 , wherein:{'sup': '3', 'Ris selected from n-butyl, iso-butyl, tert-butyl, n-pentyl, tert-pentyl, neopentyl, isopentyl, sec-pentyl, 3-pentyl, n-hexyl, isohexyl, 3-methylpentyl, 2,3-dimethylbutyl, neohexyl, substituted or unsubstituted cyclopropyl, substituted or unsubstituted cyclobutyl, substituted or unsubstituted cyclopentyl, substituted cyclohexyl, and substituted phenyl.'}4. The compound of any one of - claim 1 , or a pharmaceutically acceptable salt or solvate thereof claim 1 , wherein:{'sup': '3', 'Ris selected from substituted cyclohexyl and substituted phenyl.'}6. The compound of claim 5 , or a pharmaceutically acceptable salt or solvate thereof claim 5 , wherein:{'sup': 'A', 'A is CR.'}7. The compound of claim 5 , or a pharmaceutically acceptable salt or solvate thereof claim 5 , wherein:A is N.8. The compound of any one of - claim 5 , or a pharmaceutically acceptable salt or solvate thereof claim 5 , wherein:{'sup': 1', '1', '2', '2', '1, 'Lis —X-L-, -L-X—;'}{'sup': 1', '10', '10', '10', '10', '10, 'sub': 2', '2', '2', '2, 'Xis —O—, —S—, —S(═O)—, —S(═O)—, —S(═O)NR—, —CH—, —C≡C—, —C(═O)—, —C(═O)O—, —OC(═O)—, —C(═O)NR—, —NRC(═O)—, —NRS(═O)—, or —NR—;'}{'sup': '2', 'sub': '2', 'Lis absent ...