ISOXAZOLINE-SUBSTITUTED BENZAMIDE COMPOUND AND PESTICIDE

A substituted alkenylbenzene compound of formula (4): 2. The substituted alkenylbenzene compound of formula (4) according to claim 1 , wherein:{'sup': '1', 'sub': 5', '1', '6', '1', '6', '1', '6, 'Xis selected from the group consisting of a halogen atom, —SF, C-Chaloalkyl, C-Chaloalkoxy and C-Chaloalkylthio;'}{'sup': '3', 'sub': 1', '6', '1', '6', '1', '6, 'Xis selected from the group consisting of a hydrogen atom, halogen atom, cyano, nitro, C-Calkyl, C-Chaloalkyl and C-Calkoxy;'}{'sup': '4', 'Xis a hydrogen atom or halogen atom;'}{'sup': 3a', '3b, 'Rand Rare each a fluorine atom;'}{'sup': 3c', '2', '3', '4', '1', '3', '4', '1', '3', '4', '3c, 'Ris selected from the group consisting of a hydrogen atom, fluorine atom, chlorine atom, bromine atom and trifluoromethyl, with a proviso that in case where Xis a fluorine atom, chlorine atom or trifluoromethyl and both Xand Xare a hydrogen atom, in case where both Xand Xare a fluorine atom and Xis a hydrogen atom, and in case where both Xand Xare trifluoromethyl and Xis a hydrogen atom, Ris a hydrogen atom, chlorine atom, bromine atom or trifluoromethyl.'} This application is a continuation of U.S. patent application Ser. No. 15/972,939, filed May 7, 2018, which is a continuation of U.S. patent application Ser. No. 15/097,002, filed Apr. 12, 2016, now U.S. Pat. No. 10,045,969, which is a continuation of U.S. patent application Ser. No. 14/568,964, filed Dec. 12, 2014, which is a continuation of U.S. patent application Ser. No. 13/850,067, filed Mar. 25, 2013, now U.S. Pat. No. 8,946,492, which is a divisional of U.S. patent application Ser. No. 13/350,297, filed Jan. 13, 2012, now U.S. Pat. No. 8,492,311, which is a divisional of U.S. patent application Ser. No. 13/166,294, filed Jun. 22, 2011, now U.S. Pat. No. 8,138,213, which is a divisional of U.S. patent application Ser. No. 12/509,859, filed Jul. 27, 2009, now U.S. Pat. No. 8,022,089, which is a divisional of U.S. patent application Ser. No. 11/514,921, filed Sep. 5, ...

FLUOROSURFACTANTS HAVING IMPROVED BIODEGRADABILITY

To address the problem of insufficient biodegradability of perfluorinated surfactants, the present invention provides biodegradable fluorosurfactants derived from olefins having —CHR, —CHRf, —CHF, and/or —CHgroups, where R is an alkyl group and Rf is a perfluoro or fluroroalkyl group. Preferably, the —CHR, —CHRf, —CHF, and/or —CHgroups are contained within partially fluorinated alkenes. 1. A fluorosurfactant having the general formula Rf—X—Y , wherein Rf is a perfluorinated alkyl group , X is a fluoroolefin , Y is a neutral group or a hydrophilic group , and wherein the surfactant is biodegradable.2. The fluorosurfactant of claim 1 , wherein X is derived from a partially fluorinated alkene.3. The fluorosurfactant of claim 3 , wherein the partially fluorinated alkene is selected from the group consisting of CF═CFCl claim 3 , CH═CHF claim 3 , CHF═CHF claim 3 , CH═CF claim 3 , CFCH═CHCF claim 3 , CFCF═CFCF claim 3 , CFC═H claim 3 , and (CF)CF—CF═CFCF(HFP dimer).4. The fluorosurfactant of claim 2 , wherein X is derived from a partially fluorinated propene.5. The fluorosurfactant of claim 3 , wherein the partially fluorinated propene is selected from the group consisting of CFCF═CH(HFO-1234yf) claim 3 , CFCH═CHF (HFO-1234ze) claim 3 , CFCF═CHF (HFO-1225yf) claim 3 , CFCH═CHCl (HCFO 1233zd) claim 3 , CFCH═CH claim 3 , CFCH═CF claim 3 , CFCF═CF claim 3 , CFCH≡CH claim 3 , (CF(CF)(CFH)H claim 3 , and hexafluoropropene trimer.6. The fluorosurfactant of claim 1 , which is an anionic surfactant.7. The fluorosurfactant of claim 6 , wherein the anionic surfactant is selected from the group consisting of carboxylates claim 6 , sulfonates claim 6 , sulfates claim 6 , phosphates claim 6 , and mixtures thereof.8. The fluorosurfactant of claim 1 , which is a cationic surfactant.9. The fluorosurfactant of claim 8 , wherein the cationic surfactant is selected from the group consisting of amino claim 8 , amido claim 8 , ammonio claim 8 , sulfonamido salts claim 8 , and mixtures thereof. ...

Opsin-Binding Ligands, Compositions and Methods of Use

Compounds and compositions are disclosed that are useful for treating ophthalmic conditions caused by or related to production of toxic visual cycle products that accumulate in the eye, such as dry adult macular degeneration, as well as conditions caused by or related to the misfolding of mutant opsin proteins and/or the mis-localization of opsin proteins. Compositions of these compounds alone or in combination with other therapeutic agents are also described, along with therapeutic methods of using such compounds and/or compositions. Methods of synthesizing such agents are also disclosed. 115-. (canceled)17. The method of claim 16 , wherein said visual cycle product is a toxic visual cycle product.18. The method of claim 17 , wherein said toxic visual cycle product is lipofuscin or N-retinylidene-N-retinylethanolamine (A2E).19. The method of claim 16 , wherein said compound reduces mislocalization of said opsin protein.20. The method of claim 16 , wherein said opsin protein is present in a cell.21. The method of claim 20 , wherein said cell is a cone cell or rod cell.22. The method of claim 20 , wherein said cell is present in a mammalian eye.23. A method of inhibiting the formation or accumulation of a visual cycle product claim 20 , comprising contacting an opsin protein with a compound selected from the group consisting of:3-(trifluoromethyl)-N-((2,6,6-trimethylcyclohex-1-enyl)methyl)aniline hydrochloride (Compound 1);3-methyl-N-((2,6,6-trimethylcyclohex-1-enyl)methyl)aniline (Compound 2);3-((2,6,6-trimethylcyclohex-1-enyl)methylamino)benzamide (Compound 3);3-((2,6,6-trimethylcyclohex-1-enyl)methylamino)benzonitrile (Compound 4);3-chloro-N-((2,6,6-trimethylcyclohex-1-enyl)methyl)aniline (Compound 5);1-methyl-3-((2,6,6-trimethylcyclohex-1-enyl)methoxy)benzene (Compound 6);1-fluoro-3-((2,6,6-trimethylcyclohex-1-enyl)methoxy)benzene (Compound 7);1-chloro-3-((2,6,6-trimethylcyclohex-1-enyl)methoxy)benzene (Compound 8);1-(trifluoromethyl)-3-((2,6,6-trimethylcyclohex- ...

LIQUID CRYSTAL COMPOUND, LIQUID CRYSTAL COMPOSITION AND LIQUID CRYSTAL DISPLAY DEVICE

To provide a liquid crystal compound satisfying at least one of physical properties such as high stability to light, a high clearing point, low minimum temperature of a liquid crystal phase, small viscosity, suitable optical anisotropy, large dielectric anisotropy, a suitable elastic constant, excellent compatibility with other liquid crystal compounds and a large dielectric constant in a minor axis direction. 2. The compound according to claim 1 , wherein claim 1 , in formula (1) claim 1 , Ris alkyl having 1 to 15 carbons claim 1 , alkenyl having 2 to 15 carbons claim 1 , alkoxy having 1 to 14 carbons or alkenyloxy having 2 to 14 carbons claim 1 , and in the groups claim 1 , at least one of hydrogen may be replaced by fluorine; and Xis fluorine claim 1 , —C≡N claim 1 , —N═C═S claim 1 , —CHF claim 1 , —CHF claim 1 , —CF claim 1 , —(CH)—F claim 1 , —CHCF claim 1 , —CFCF claim 1 , —(CH)—F claim 1 , —(CH)—CF claim 1 , —(CF)—F claim 1 , —(CH)—F claim 1 , —(CH)—CF claim 1 , —(CF)—F claim 1 , —(CF)—F claim 1 , —(CF)—F claim 1 , —(CF)—F claim 1 , —OCHF claim 1 , —OCHF claim 1 , —OCF claim 1 , —O—(CH)—F claim 1 , —OCHCF claim 1 , —OCFCF claim 1 , —O—(CH)—F claim 1 , —O—(CH)—CF claim 1 , —O—(CF)—F claim 1 , —O(CH)—F claim 1 , —O—(CH)—CF claim 1 , —O—(CF)—F claim 1 , —O—(CF)—F claim 1 , -0—(CF)—F claim 1 , —CH═CHF claim 1 , —CH═CF claim 1 , —CF═CHF claim 1 , —CF═CF claim 1 , —CH═CHCHF claim 1 , —CH═CHCF claim 1 , —CF═CHCF claim 1 , —CF═CFCF claim 1 , —(CH)—CH═CF claim 1 , —(CH)—CF═CF claim 1 , —(CH)—CH═CHCF claim 1 , —(CH)—CF═CHCFor —(CH)—CF═CFCF.3. The compound according to claim 1 , wherein claim 1 , in formula (1) claim 1 , Ris alkyl having 1 to 10 carbons claim 1 , alkenyl having 2 to 10 carbons claim 1 , alkoxy having 1 to 9 carbons or alkenyloxy having 2 to 9 carbons claim 1 , and in the groups claim 1 , at least one of hydrogen may be replaced by fluorine; and Xis fluorine claim 1 , —C≡N claim 1 , —CF claim 1 , —CHF claim 1 , —OCF claim 1 , —OCHF claim 1 , —CH═CHCF ...

PROCESS FOR THE PREPARATION OF VORTIOXETINE

Disclosed herein a process for the isolation of intermediate of Vortioxetine in a solid state form and an improved, commercially viable and industrially advantageous process for the preparation of vortioxetine or a pharmaceutically acceptable salt thereof, in high yield and purity. 2. The process according to wherein the reaction of step (a) and step (b) of method A claim 1 , B claim 1 , C claim 1 , D claim 1 , E and F can be carried out in the presence of a base claim 1 , a palladium catalyst claim 1 , a ligand and a solvent.3. (canceled)4. The process according to claim 2 , wherein the solvent is an organic solvent selected from the group consisting of methylene chloride claim 2 , ethylene dichloride claim 2 , chloroform claim 2 , carbon tetrachloride claim 2 , n-pentane claim 2 , n-hexane claim 2 , n-heptane claim 2 , cyclohexane claim 2 , toluene claim 2 , xylene claim 2 , acetone claim 2 , methyl ethyl ketone claim 2 , methyl isobutyl ketone claim 2 , methyl tert-butyl ketone claim 2 , acetonitrile claim 2 , ethyl acetate claim 2 , methyl acetate claim 2 , isopropyl acetate claim 2 , tert-butyl methyl acetate claim 2 , ethyl formate claim 2 , tetrahydrofuran claim 2 , dioxane claim 2 , diethyl ether claim 2 , diisopropyl ether claim 2 , monoglyme claim 2 , diglyme claim 2 , N claim 2 ,N-dimethylformamide claim 2 , and N claim 2 ,N-dimethylacetamide claim 2 , dimethylsulfoxide; or mixtures of at least two thereof.5. The process according to claim 2 , wherein the palladium catalyst is selected from the group consisting of Tris (dibenzylideneacetone) dipalladium (Pd(dba)) claim 2 , Bis (dibenzylideneacetone) palladium (Pd(dba)) and Palladium(II) acetate (Pd(OAc)).6. The process according to claim 2 , wherein the ligand is selected from the group consisting of racemic 2 claim 2 ,2′-bis-diphenylphosphanyl-[1 claim 2 ,1′]binaphtalenyl (rac-BINAP) claim 2 , 1 claim 2 ,1′-bis (diphenylphosphino) ferrocene (DPPF) claim 2 , bis-(2-diphenylphosphinophenyl)ether (DPEphos) ...

METHOD OF PRODUCING FLUORINE-CONTAINING SULFIDE COMPOUNDS

The present invention aims to provide a method by which fluorine-containing sulfide compounds, particularly sulfide compounds that contain hydrogen and fluorine, can be produced in a simple, low-cost and industrial manner. Provided is a method of producing a fluorine-containing sulfide compound represented by the following formula (2): 16-. (canceled)9. The method of producing a fluorine-containing sulfide compound according to claim 7 , wherein 1.0 to 20.0 equivalents of the fluorinating agent relative to the chlorine-containing sulfide compound is used in terms of the substance's quantitative ratio.10. The method of producing a fluorine-containing sulfide compound according to claim 7 , wherein the reaction is performed at a temperature of 50 to 350° C.11. The method of producing a fluorine-containing sulfide compound according to claim 7 , wherein the chlorine-containing sulfide compound and the fluorinating agent are vaporized before being supplied to a reactor.12. The method of producing a fluorine-containing sulfide compound according to claim 7 , wherein the at least one selected from the group consisting of metal fluorides supported on activated charcoal claim 7 , metal chlorides supported on activated charcoal claim 7 , and metal catalysts supported on activated charcoal is at least one selected from the group consisting of chromium fluoride claim 7 , nickel fluoride claim 7 , copper fluoride claim 7 , silver fluoride claim 7 , sodium fluoride claim 7 , potassium fluoride claim 7 , cesium fluoride claim 7 , chromium chloride claim 7 , nickel chloride claim 7 , chromium claim 7 , copper claim 7 , zinc claim 7 , silver claim 7 , magnesium claim 7 , and titanium claim 7 , all of which is supported on activated charcoal.13. The method of producing a fluorine-containing sulfide compound according to claim 7 , wherein the chlorine-containing sulfide compound is CH-S-CCl claim 7 , and the fluorine-containing sulfide compound is CH-S-CF.14. The method of producing ...

New Process For The Synthesis Of 1-(2-((2,4-Dimethylphenyl)Thio)Phenyl)Piperazine

The present invention provides new intermediate compounds or formulae (III) and (IVa), and salts thereof, and their use in a new synthetic process for the production of 1-(2-((2,4-dimethylphenyl)thio)phenyl)piperazine (vortioxetine) an experimental drug under development for the treatment of depression and anxiety. 1. (canceled)4. A process according to claim 3 , wherein the reducing agent is thiourea dioxide claim 3 , sodium dithionite claim 3 , iron or zinc.5. (canceled)8. A process according to claim 7 , wherein:LG is selected from F, Cl, Br, OTs and OTf;{'sup': '1', 'Rrepresents hydrogen; and'}{'sub': 2', '3', '2', '3, 'the base is NaCOor KCO.'}10. A process according to wherein:LG is selected from F, Cl, Br, OTs and OTf;{'sup': '1', 'Rrepresents hydrogen;'}{'sub': 2', '3', '2', '3, 'the base is NaCOor KCO; and'}the reducing agent used in step (ii) is thiourea dioxide or sodium dithionite.11. A process according to wherein the reaction steps (i) and (ii) are carried out in the same reaction vessel.13. A process according to wherein the piperazine ring forming agent is selected from bis(2-chloroethyl)amine or a salt thereof claim 12 , diethanolamine and morpholine.14. A process according to which comprises the additional step of converting the compound of formula (V) claim 12 , or salt thereof claim 12 , to its hydrobromide salt. This invention relates to a new and advantageous process for the synthesis of 1-(2-((2,4-dimethylphenyl)thio)phenyl)piperazine (vortioxetine) an experimental drug under development for the treatment of depression and anxiety.Vortioxetine is disclosed as Example 1e in WO 2003/029232 A1 and is described as being prepared analogously to Example 1. The process used to prepare Example 1 involves the preparation of 1-(2-((2-(trifluoromethyl)phenyl)thio)phenyl)piperazine on a solid polystyrene support, followed by decomplexation using visible light irradiation, and purification by preparative LC-MS and ion-exchange chromatography. The overall ...

Isoxazoline-substituted benzamide compound and pesticide

A substituted alkenylbenzene compound of formula (4): wherein X 1 is selected from the group consisting of halogen atom, —SF 5 , C 1 -C 6 halo alkyl, hydroxy C 1 -C 6 haloalkyl, C 1 -C 6 alkoxy C 1 -C 6 haloalkyl, C 3 -C 8 halocycloalkyl, C 1 -C 6 haloalkoxy, C 1 -C 3 haloalkoxy C 1 -C 3 haloalkoxy, C 1 -C 6 haloalkylthio, C 1 -C 6 haloalkylsulfinyl and C 1 -C 6 haloalkylsulfonyl; X 3 is selected from the group consisting of a hydrogen atom, halogen atom, cyano, nitro, C 1 -C 6 alkyl, C 1 -C 6 haloalkyl, C 1 -C 6 alkoxy and C 1 -C 6 alkylthio; X 4 is selected from the group consisting of a hydrogen atom, halogen atom, cyano, C 1 -C 4 alkyl, C 1 -C 4 alkoxy and C 1 -C 4 haloalkoxy; R 3 is —C(R 3a )(R 3b )R 3c , where R 3a and R 3b independently of each other are a halogen atom, or R 3a and R 3b together form 3- to 6-membered ring together with the carbon atom bonding them by forming a C 2 -C 5 haloalkylene chain, and R 3c is selected from the group consisting of a hydrogen atom, halogen atom, C 1 -C 5 alkyl, C 1 -C 5 haloalkyl, C 1 -C 4 haloalkoxy and C 1 -C 4 haloalkylthio, with a proviso that in case where X 1 is a fluorine atom, chlorine atom or trifluoromethyl, and both X 2 and X 3 are a hydrogen atom, in case where both X 1 and X 2 are fluorine atom and X 3 is a hydrogen atom, and in case where both X 1 and X 2 are trifluoromethyl and X 3 is a hydrogen atom, R 3c is a hydrogen atom, chlorine atom, bromine atom, iodine atom, C 1 -C 5 alkyl, C 1 -C 5 haloalkyl, C 1 -C 4 haloalkoxy or C 1 -C 4 haloalkylthio.

LXR AGONISTS AND USES THEREOF

This invention features compounds that modulate the activity of liver X receptors, pharmaceutical compositions including the compounds of the invention, and methods of utilizing those compositions for modulating the activity of liver X receptors in the treatment of cancer. 2. The compound of claim 1 , wherein c is 0.3. The compound of claim 1 , wherein b is 1.4. The compound of claim 1 , wherein b is 0.5. The compound of claim 1 , wherein each Rand Ris hydrogen.6. The compound of claim 1 , wherein Ris hydrogen.7. The compound of claim 1 , wherein Ris fluorine.8. The compound of claim 1 , wherein Ris optionally substituted C-Calkyl.9. The compound of claim 8 , wherein said optionally substituted C-Calkyl is methyl10. The compound of claim 1 , wherein Ris phenyl or 4-fluorophenyl.11. The compound of claim 1 , wherein Ris hydrogen claim 1 , halogen claim 1 , optionally substituted C-Caryl claim 1 , optionally substituted C-Ccycloalkyl claim 1 , or optionally substituted C-Calkyl.12. The compound of claim 11 , wherein Ris hydrogen claim 11 , fluorine claim 11 , phenyl claim 11 , cyclohexyl claim 11 , or methyl.13. The compound of claim 12 , wherein Ris hydrogen claim 12 , phenyl claim 12 , or methyl.14. The compound of claim 1 , wherein d is 1.15. The compound of claim 1 , wherein each Rand Ris hydrogen.19. The compound of claim 1 , wherein B is optionally substituted C-Caryl.20. The compound of claim 19 , wherein said optionally substituted C-Caryl is 2-chloro-3-trifluoromethyl-phenyl claim 19 , 2-fluoro-3-trifluoromethyl-phenyl claim 19 , 3-(1 claim 19 ,1 claim 19 ,2 claim 19 ,2-tetrafluoroethoxy)-phenyl claim 19 , 3-trifluoromethyl-phenyl claim 19 , 3-trifluoromethyl-4-fluoro-phenyl claim 19 , 3-trifluoromethoxy-phenyl claim 19 , or 2 claim 19 ,2-difluoro-1 claim 19 ,3-benzodioxole.21. The compound of claim 20 , wherein B is 2-chloro-3-trifluoromethyl-phenyl claim 20 , 2-fluoro-3-trifluoromethyl-phenyl claim 20 , or 3-trifluoromethyl-phenyl.22. The compound of claim ...

Nitrile oxide compound

The present invention provides a compound represented by formula (I) wherein symbols in the formula are as defined in the specification.

COMPOUND, ACTIVE LIGHT SENSITIVE OR RADIATION SENSITIVE RESIN COMPOSITION, RESIST FILM USING SAME, RESIST-COATED MASK BLANK, PHOTOMASK, PATTERN FORMING METHOD, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, AND ELECTRONIC DEVICE

Provided is an active light sensitive or radiation sensitive resin composition which contains a compound (A) represented by General Formula (I) or (II): 2. The active light sensitive or radiation sensitive resin composition according to claim 1 ,{'sub': 1', '2, 'sup': '1', 'wherein, in General Formula (I) or (II), Xor Xis a group which is represented by —NH— or —NR—.'}3. The active light sensitive or radiation sensitive resin composition according to claim 1 ,{'sub': 2', '2, 'wherein, in General Formula (I) or (II), Xor Xis a group which is represented by —S—.'}4. The active light sensitive or radiation sensitive resin composition according to claim 1 ,{'sub': 1', '2, 'wherein, in General Formula (I) or (II), Yor Yis an aryl group or a monovalent hydrocarbon group which has an alicyclic hydrocarbon structure having 5 or more carbon atoms.'}5. The active light sensitive or radiation sensitive resin composition according to claim 1 , further comprising:a compound (B) which has a phenolic hydroxyl group.8. The active light sensitive or radiation sensitive resin composition according to claim 1 , further comprising:an acid cross-linkable compound (C).9. The active light sensitive or radiation sensitive resin composition according to claim 8 ,wherein the compound (C) is a compound which has two or more hydroxymethyl groups or alkoxymethyl groups in a molecule.10. The active light sensitive or radiation sensitive resin composition according to claim 1 , which is used for exposure to electron beams or extreme ultraviolet light.11. A resist film formed using the active light sensitive or radiation sensitive resin composition according to .12. A resist-coated mask blank coated with the resist film according to .13. A photomask obtained by exposing and developing the resist-coated mask blank according to .14. A pattern forming method comprising:{'claim-ref': {'@idref': 'CLM-00011', 'claim 11'}, 'exposing the resist film according to ; and'}developing the exposed film.15. A ...

LIQUID CRYSTAL COMPOUND HAVING BIPHENYLENE, LIQUID CRYSTAL COMPOSITION AND LIQUID CRYSTAL DISPLAY DEVICE

Provided are a liquid crystal compound satisfying at least one of physical properties such as high stability to heat or light, a high clearing point (or high maximum temperature), low minimum temperature of a liquid crystal phase, small viscosity, large optical anisotropy, large negative dielectric anisotropy, a suitable elastic constant and good compatibility with other liquid crystal compounds, a liquid crystal composition containing the compound and a liquid crystal display device including the composition. 2. The compound according to claim 1 , wherein claim 1 , in formula (1) claim 1 , A claim 1 , A claim 1 , Aand Aare independently 1 claim 1 ,4-cyclohexylene claim 1 , 1 claim 1 ,4-phenylene claim 1 , decahydronaphthalene-2 claim 1 ,6-diyl claim 1 , 1 claim 1 ,2 claim 1 ,3 claim 1 ,4-tetrahydronaphthalene-2 claim 1 ,6-diyl or naphthalene-2 claim 1 ,6-diyl claim 1 , and in the groups claim 1 , at least one piece of —CH— may be replaced by —O— claim 1 , and at least one piece of —CHCH— may be replaced by —CH═CH— claim 1 , and in the divalent groups claim 1 , at least one hydrogen may be replaced by fluorine or chlorine.3. The compound according to claim 1 , wherein claim 1 , in formula (1) claim 1 , Z claim 1 , Z claim 1 , Zand Zare independently a single bond claim 1 , —(CH)— claim 1 , —CH═CH— claim 1 , —C≡C— claim 1 , —COO— claim 1 , —OCO— claim 1 , —CFO— claim 1 , —OCF— claim 1 , —CHO— claim 1 , —OCH— or —CF═CF—.12. A liquid crystal display device claim 8 , including the liquid crystal composition according to . The invention relates to a liquid crystal compound, a liquid crystal composition and a liquid crystal display device. More specifically, the invention relates to a liquid crystal compound having a biphenylene ring and negative dielectric anisotropy, a liquid crystal composition containing the compound, and a liquid crystal display device including the composition.In a liquid crystal display device, a classification based on an operating mode for liquid ...

THIOETHER COMPOUNDS AS NITRIFICATION INHIBITORS

Provided herein are a use of thioether compounds of formula I as nitrification inhibitors, and agricultural mixtures and compositions including the thioether compounds. 2. The thioether compound of claim 1 , wherein in the compound of formula I{'sup': 1', '2, 'Rand Rare H; and'}p is 1 or 2.6. A composition for use in reducing nitrification comprising at least one compound of formula I as defined in and at least one carrier.7. An agrochemical mixture comprising (i) at least one fertilizer; and (ii) at least one compound of formula I as defined in .8. (canceled)9. (canceled)10. A method for reducing nitrification claim 1 , the method comprising treating a plant growing on at least one of soil claim 1 , soil substituents claim 1 , and a locus claim 1 , soil claim 1 , and soil substituents where the plant is growing or is intended to grow with at least one compound of formula I as defined in .11. The method of claim 10 , further comprising providing the at least one of the plant and the locus claim 10 , soil claim 10 , and soil substituents where the plant is growing or is intended to grow with a fertilizer.12. The method of claim 11 , wherein the treating with the compound of formula I and the providing of the fertilizer are carried out simultaneously.13. A method for treating at least one of a fertilizer and a fertilizer composition claim 1 , comprising applying a nitrification inhibitor as defined in to the at least one of the fertilizer and the fertilizer composition.14. The agrochemical mixture of claim 7 , wherein the fertilizer is selected from the group consisting of a solid ammonium-containing inorganic fertilizer claim 7 , a liquid ammonium-containing inorganic fertilizer claim 7 , a solid organic fertilizer claim 7 , a liquid organic fertilizer claim 7 , and a urea-containing fertilizer.15. The method of claim 10 , wherein the plant is an agricultural plant claim 10 , a vegetable claim 10 , sorghum; a silvicultural plant; an ornamental plant; and a ...

UNIQUE HALOGEN-INDUCED CYCLIZATIONS, REAGENTS THEREFOR, AND COMPOUNDS PRODUCED THEREBY

This disclosure is related to halonium compounds useful for cyclization of polyenes, alkenoic acids, and alkenyl alkyl ethers, and halogenation of aromatic compounds. The synthesis of such halonium compounds, compounds made using such halonium compounds, and synthesis of natural compounds, including decalins, using the halonium compounds is also disclosed. A representative halonium compound of the disclosure is: 1122-. (canceled)124. A process for cyclizing an alkene or halogenating an aromatic ring comprising contacting the alkene or aromatic ring with the compound of under conditions permitting cyclization of the alkene or halogenation of the aromatic ring.125. The process of claim 124 , wherein the alkene is a polyene claim 124 , alkenoic acid or alkenyl alkyl ether.126. The process of claim 124 , wherein the cyclization is a ring-forming halolactonization or ring-expanding bromoetherification.127. The process of claim 124 , wherein the halogenation is a mono-halogenation and the aromatic ring is a substituted phenyl. This application claims priority of U.S. Provisional Application No. 61/403,406, filed Sep. 14, 2010, the contents of which are hereby incorporated by reference.The work disclosed herein was made with government support under Grant No. CHE0844593 from the National Science Foundation and Grant No. GM-084994 from the National Institutes of Health. Accordingly, the U.S. Government has certain rights in this invention.Throughout this application, certain publications are referenced in parentheses. Full citations for these publications may be found immediately preceding the claims. The disclosures of these publications in their entireties are hereby incorporated by reference into this application in order to describe more fully the state of the art to which this invention relates.With little question, the ability to convert polyene starting materials into far more complex frameworks via stereoselective cation-π cyclizations constitutes one of the most ...

IODINE-CONTAINING PHOTOACID GENERATORS AND COMPOSITIONS COMPRISING THE SAME

A photoacid generator compound having formula (I): 2. The photoacid generator compound of claim 1 , wherein W is a single bond or —(C═O)O—.3. The photoacid generator compound of claim 1 , wherein L is a single bond or a group having formula —(CH)—(CRR)— claim 1 , wherein{'sup': 2', '3', '2', '3', '2', '3, 'Rand Rare selected from hydrogen and fluorine, provided that at least one of Rand Rin each —(CRR)— is fluorine,'}n1 is an integer of 0 to 10, andn2 is an integer of 1 to 10.5. The photoacid generator compound of claim 1 , wherein the photoacid generator compound I comprises claim 1 , two claim 1 , three claim 1 , four claim 1 , or five iodine atoms.7. A photoresist composition comprising the photoacid generator compound of any of to and a copolymer.9. A coated substrate claim 7 , comprising: (a) a substrate having one or more layers to be patterned on a surface thereof; and (b) a layer of a photoresist composition of over the one or more layers to be patterned.10. A method of forming an electronic device claim 7 , comprising:{'claim-ref': {'@idref': 'CLM-00007', 'claim 7'}, '(a) applying a layer of the photoresist composition of over a surface of the substrate;'}(b) pattern-wise exposing the photoresist composition layer to activating radiation; and(c) developing the exposed photoresist composition layer to provide a resist relief image. The present disclosure generally relates to polymer compositions including a photoacid generator. Specifically, the disclosure provides copolymers derived from a monomer including at least two iodine atoms.Extreme ultraviolet lithography (“EUVL”) is one of the leading technology options to replace optical lithography for volume semiconductor manufacturing at feature sizes <20 nm. The extremely short wavelength (13.4 nm) is a key enabling factor for high resolution required at multiple technology generations. In addition, the overall system concept scanning exposure, projection optics, mask format, and resist technology—is quite ...

ISOXAZOLINE-SUBSTITUTED BENZAMIDE COMPOUND AND PESTICIDE

A substituted alkenylbenzene compound of formula (4): 1. (canceled)2. (canceled)4. A method according to claim 3 , wherein contacting the fleas with the compound comprises orally administering the compound to a mammal.5. A method according to claim 4 , wherein the mammal is livestock.6. A method according to claim 4 , wherein the mammal is a domestic animal.7. A method according to claim 4 , wherein the mammal is a pet.8. A method according to claim 4 , wherein the mammal is a dog.9. A method according to claim 4 , wherein the mammal is a cat.11. A method according to claim 10 , wherein contacting the fleas with the compound comprises orally administering the compound to a mammal.12. A method according to claim 11 , wherein the mammal is livestock.13. A method according to claim 11 , wherein the mammal is a domestic animal.14. A method according to claim 11 , wherein the mammal is a pet.15. A method according to claim 11 , wherein the mammal is a dog.16. A method according to claim 11 , wherein the mammal is a cat. This application is a continuation of U.S. patent application Ser. No. 15/972,939, filed May 7, 2018, which is a continuation of U.S. patent application Ser. No. 15/097,002, filed Apr. 12, 2016, now U.S. Pat. No. 10,045,969, which is a continuation of U.S. patent application Ser. No. 14/568,964, filed Dec. 12, 2014, which is a continuation of U.S. patent application Ser. No. 13/850,067, filed Mar. 25, 2013, now U.S. Pat. No. 8,946,492, which is a divisional of U.S. patent application Ser. No. 13/350,297, filed Jan. 13, 2012, now U.S. Pat. No. 8,492,311, which is a divisional of U.S. patent application Ser. No. 13/166,294, filed Jun. 22, 2011, now U.S. Pat. No. 8,138,213, which is a divisional of U.S. patent application Ser. No. 12/509,859, filed Jul. 27, 2009, now U.S. Pat. No. 8,022,089, which is a divisional of U.S. patent application Ser. No. 11/514,921, filed Sep. 5, 2006, now U.S. Pat. No. 7,662,972, which is a continuation-in-part of International ...

High refractive index liquids based on meta-substituted s-alkyl thioethers

The present invention relates to liquid aromatic thioethers, a process for the preparation of the liquid aromatic thioethers, an article comprising the liquid aromatic thioethers as well as the use of the liquid aromatic thioethers as a component or substantial part of an optical liquid, window material, color filter, coating, varnish, lacquer, dye or pigment formulation, immersion liquid, calibration liquid or matching liquid, ingredient or additive in a plastic material or ingredient or additive in a polymer.

RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, AND COMPOUND

A resist composition containing a base material component of which solubility in a developing solution is changed due to an action of an acid and a compound represented by Formula (bd1); in the formula, Rto Reach independently represent an aryl group which may have a substituent, provided that one or more of Rto Rare aryl groups having a fluorinated alkyl group which may have a substituent, and at least one of the fluorinated alkyl groups which may have a substituent in these aryl groups is bonded to a carbon atom adjacent to a carbon atom that is bonded to a sulfur atom in the formula, and a total number of the fluorinated alkyl groups which may have a substituent is 2 or more; X represents a counter anion. 3. A method of forming a resist pattern , comprising:{'claim-ref': {'@idref': 'CLM-00001', 'claim 1'}, 'forming a resist film on a support using the resist composition according to ;'}exposing the resist film; anddeveloping the exposed resist film to form a resist pattern.4. The method of forming a resist pattern according to claim 3 , wherein the resist film is exposed with extreme ultraviolet (EUV) rays or electron beams (EB). The present invention relates to a resist composition, a method of forming a resist pattern, and a compound.Priority is claimed on Japanese Patent Application No. 2018-227686, filed on Dec. 4, 2018, the content of which is incorporated herein by reference.In lithography techniques, for example, a resist film formed of a resist material is formed on a substrate, and the resist film is subjected to selective exposure, followed by developing treatment, thereby forming a resist pattern having a predetermined shape on the resist film. A resist material with which the exposed portions of the resist film become soluble in a developing solution is called a positive-tone, and a resist material with which the exposed portions of the resist film become insoluble in a developing solution is called a negative-tone.In recent years, in the production ...

MODULATORS OF THE INTEGRATED STRESS PATHWAY

Provided herein are compounds, compositions, and methods useful for modulating the integrated stress response (ISR) and for treating related diseases; disorders and conditions. 2. The compound of claim 1 , wherein D is a bridged monocyclic cycloalkyl optionally substituted with 1-4 R.3. The compound of any one of - claim 1 , wherein D is a bridged 4-6 membered monocyclic cycloalkyl optionally substituted with 1-4 R.4. The compound of any one of - claim 1 , wherein D is bicyclo[1.1.1]pentane optionally substituted with 1-4 R.7. The compound of any one of - claim 1 , wherein D is substituted with 0 R.9. The compound of any one of - claim 1 , wherein at least one of Land Lis independently 2-7-membered heteroalkylene optionally substituted by 1-5 R.10. The compound of any one of - claim 1 , wherein Lis 2-7-membered heteroalkylene and Lis independently selected from C-Calkylene or 2-7-membered heteroalkylene claim 1 , wherein each alkylene and heteroalkylene is optionally substituted by 1-5 R.11. The compound of any one of - claim 1 , wherein both of Land Lare independently 2-7-membered heteroalkylene substituted by 0 R.12. The compound of any one of - claim 1 , wherein each Land Lis independently selected from —CH—* claim 1 , —CHCH—* claim 1 , CHCHCH—* claim 1 , —CH(CH)—* claim 1 , —CH(CH)CH—* claim 1 , CHO—* or CHCHO—* claim 1 , and “—*” indicates the attachment point to A and W claim 1 , respectively.13. The compound of any one of - claim 1 , wherein Lis independently selected from CHO—* or CHCHO—* claim 1 , Lis independently selected from —CH—* claim 1 , —CHCH—* claim 1 , CHCHCH—* claim 1 , —CH(CH)—* claim 1 , —CH(CH)CH—* claim 1 , CHO—* or CHCHO—* claim 1 , and “—*” indicates the attachment point to A and W claim 1 , respectively.14. The compound of any one of - claim 1 , wherein Rand Rare each hydrogen or C-Calkyl.15. The compound of any one of - claim 1 , wherein A is phenyl and W is independently phenyl or 5-6 membered heteroaryl optionally substituted with 1-5 R ...

Thiol-based deep eutectic solvent

A deep eutectic solvent consisting of (2-hydroxyethyl) trimethyl ammonium chloride and dithiothreitol in a molar ratio of from 1:2 to 1:3 and from 0% to 10% co-solvent, and methods of enzymatic production of polypeptides using the deep eutectic solvent.

METHOD OF PREPARING VORTIOXETINE

The new method of preparing 1-(2-(2,4-di-methylphenylsulphanyl)pheny!)piperazine of formula (I) or its salt comprises a reaction of 2-(2,4-dimethylphenyl-sulphanyl)benzeneamine of formula (XI), wherein Me is methyl, with a suitable precursor of formation of piperazine ring of formula (X11), wherein LG is a leaving group and R is hydrogen or a protective group, in a suitable organic solvent, wherein the reaction is carried out without presence of a base in a neutral or acidic environment. 2. The method according to claim 1 , wherein the reaction is carried out without presence of a base in a neutral or acidic environment.3. The method according to claim 1 , wherein the leaving group LG is selected from the group consisting of Cl claim 1 , Br claim 1 , I claim 1 , methylsulfonyloxy claim 1 , toluenesulfonyloxy claim 1 , and the protective group is COOR′ claim 1 , wherein R′ is an unbranched or branched C1-C5 alkyl group.5. The method according to claim 1 , wherein the organic solvent is an aromatic solvent selected from the group consisting of chlorobenzene claim 1 , xylene claim 1 , toluene claim 1 , α claim 1 ,α claim 1 ,α-trifluorotoluene and their mixtures.6. The method according to claim 1 , comprising reacting 2-(2 claim 1 ,4-dimethylphenylsulphanyl)benzeneamine of formula XI with 1-1.2 equivalents of bis-(2-chloroethyl)amine hydrochloride of formula XIIaa in toluene at a temperature of 103-111° C.8. The method according to claim 7 , wherein the reduction of the nitro compound of formula X is carried out with metals selected from the group consisting of Fe claim 7 , Zn claim 7 , and Sn claim 7 , with metal salts claim 7 , or by catalytic hydrogenation or transfer-hydrogenation in the presence of a catalyst based on Pt claim 7 , Pd claim 7 , Ni claim 7 , Fe claim 7 , or Co in a suitable solvent selected from C1-C5 alcohols and esters.9. The method according to claim 8 , wherein the reduction of the nitro compound of formula X is carried out by hydrogenation on ...

BIMESOGENIC COMPOUNDS AND MESOGENIC MEDIA

The invention relates to bimesogenic compounds of formula I 2. Bimesogenic compounds according to claim 1 , characterized in thatat least one of{'sup': 11', '12, 'MGand MGcomprises one fused ring structure, two or more fused ring structures, at least part of which fused ring structure or fused ring structures is aromatic in character'}3. Bimesogenic compounds according to claim 1 , characterized in that both MGand MGcomprise one claim 1 , two or more ring structures claim 1 , linked by a 1 claim 1 , 2 or 3 atomic spacer claim 1 , preferably selected from —CO—O— claim 1 , —O—CO— claim 1 , —O—CH— claim 1 , —CH—O— claim 1 , —CF—O— claim 1 , —O—CF— claim 1 , —C≡C— claim 1 , —CH═CH— claim 1 , —CF═CF— and —CHF═CHF—.4. Bimesogenic compounds according to claim 1 , characterized in that Ris selected from OCF claim 1 , CF claim 1 , F claim 1 , Cl claim 1 , CN and NO.5. Bimesogenic compounds according to claim 1 , characterized in that Spis —(CH)— and o is 1 claim 1 , 3 or an integer from 5 to 15.6. A method which comprises including one or more bimesogenic compounds according to in a liquid crystalline medium.7. Liquid-crystalline medium claim 1 , characterised in that it comprises one or more bimesogenic compounds according to .8. Liquid-crystalline medium according to claim 7 , characterised in that it additionally comprises one or more compounds selected from the group of the compounds of the formulae III{'br': None, 'sup': 31', '31', '31', '3', '32', '32', '32, 'R-MG-X-Sp-X-MG-R\u2003\u2003III'}wherein{'sup': 31', '32, 'sub': 2', '3, 'Rand Rare each independently H, F, Cl, CN, NCS or a straight-chain or branched alkyl group with 1 to 25 C atoms which may be unsubstituted, mono- or polysubstituted by halogen or CN, it being also possible for one or more non-adjacent CHgroups to be replaced, in each case independently from one another, by —O—, —S—, —NH—, —N(CH)—, —CO—, —COO—, —OCO—, —O—CO—O—, —S—CO—, —CO—S—, —CH═CH—, —CH═CF—, —CF═CF— or —C≡C— in such a manner that oxygen ...

Fluorine-based compound for brancher, polymer using same, and polymer electrolyte membrane using same

The present specification relates to a fluorine-based compound for a brancher, a polymer using the same, a polymer electrolyte membrane using the same, a fuel cell using the same, and a redox flow battery including the same.

ARYL TETRAFLUOROSULFANYL COMPOUNDS

The invention provides compounds of the Formula (I), methods of making the compounds, and devices comprising the compounds. 2. A compound according to wherein R claim 1 , R claim 1 , and R are independently absent or selected from hydrogen claim 1 , fluorine claim 1 , chlorine claim 1 , bromine claim 1 , trifluoromethyl claim 1 , pentafluorosulfanyl claim 1 , cyano claim 1 , nitro claim 1 , carboxy claim 1 , amino claim 1 , mono- or di-Chydrocarbylamino; and a group A-B wherein A is a bond claim 1 , O claim 1 , CO claim 1 , C(═O)O claim 1 , OC(═O) claim 1 , OC(═O)O claim 1 , or NR; and Rmay additionally be —SF—X′—(Ar′)—R.3. A compound according to wherein B is hydrogen or a Chydrocarbyl group optionally substituted by one or more substituents selected from hydroxy claim 2 , oxo claim 2 , halogen claim 2 , cyano claim 2 , nitro claim 2 , carboxy claim 2 , amino claim 2 , and carbocyclic and heterocyclic groups having from 3 to 6 ring members optionally substituted by one or more substituents selected from halogen claim 2 , Chydrocarbyl claim 2 , Chydrocarbyloxy claim 2 , Cacyloxy claim 2 , trifluoromethyl claim 2 , trifluoromethoxy claim 2 , and difluoromethoxy; and wherein one or more carbon atoms of the Chydrocarbyl group may optionally be replaced by O claim 2 , CO claim 2 , S claim 2 , SO claim 2 , SO claim 2 , NR claim 2 , OC(═O) claim 2 , C(═O)O or OC(═O)O.4. A compound according to wherein R claim 1 , R claim 1 , and R are independently absent or selected from hydrogen claim 1 , fluorine claim 1 , chlorine claim 1 , bromine claim 1 , trifluoromethyl claim 1 , cyano claim 1 , nitro claim 1 , carboxy claim 1 , amino; and a group A-B wherein A is a bond claim 1 , O claim 1 , CO claim 1 , C(═O)O claim 1 , OC(═O) claim 1 , OC(═O)O claim 1 , or NRand B is hydrogen claim 1 , a carbocyclic or heterocyclic group having from 3 to 6 ring members claim 1 , or a Chydrocarbyl group optionally substituted by one or more substituents selected from hydroxy claim 1 , oxo claim ...

Mercapto benzophenone compounds, compositions and preparation method thereof

The present invention provides a photocurable composition prepared using mercapto benzophenone compounds as key raw materials. The present invention aims to solve the problems existing in the prior photo-curing technology that low-molecular photoinitiators are easy to remain and migrate, while macromolecular photoinitiators has low initiation efficiency due to a low content of effective components and also has the problem of certain migration. The photocurable composition in the present invention can be easily prepared and has high addition efficiency with ethylenically unsaturated compounds, and the photocurable composition obtained by addition has no residual mercapto and has features of high initiation activity and zero migration rates when it is used in photocurable coatings, binder and ink formula.

METHOD FOR PRODUCING 3-ALKYLSULFANYL-2-CHLORO-N-(1-ALKYL-1H-TETRAZOL-5-YL)-4-TRIFLUOROMETHYL-BENZAMIDES

The invention relates to a method for producing 3-alkylsulfanyl-2-chloro-N-(1-alkyl-1H-tetrazol-5-yl)-4-trifluoromethyl-benzamides of formula (I). In said formula, the substituents Rand Rrepresent residues such as alkyl and substituted phenyl. 2. Method according to claim 1 , wherein the thiolate (IV) used is NaSMe or KSMe.3. Method according to claim 1 , where Ris C-C-alkyl.4. Method according to claim 1 , wherein Ris methyl.5. Method according to claim 1 , wherein Mis sodium.6. Method according to claim 1 , wherein Ris methyl.7. Method according to claim 1 , wherein the organometallic reagent used is an alkyllithium compound.8. Method according to claim 1 , wherein the carboxylating reagent used is carbon dioxide.9. Method according to claim 1 , wherein the activator used is thionyl chloride.10. Method according claim 1 , wherein the acyl transfer reagent used is 1-methyl-1H-imidazole.12. Compound of formula (III) according to claim 11 , where Ris methyl.14. Compound of formula (VI) according to claim 13 , where Ris methyl. The invention relates to a method for preparing 3-alkylsulphanyl-2-chloro-N-(1-alkyl-1H-tetrazol-5-yl)-4-trifluoromethylbenzamides which are used as agrochemically active substances. In particular, the invention relates to a method for preparing 2-chloro-3-methylsulphanyl-N-(1-methyl-1H-tetrazol-5-yl)-4-trifluoromethylbenzamide in its stable crystal modification.Numerous agrochemically active N-(tetrazol-5-yl)arylcarboxamides are known from WO 2012/028579 A1. 3-Alkylsulphanyl-2-chloro-N-(1-alkyl-1H-tetrazol-5-yl)-4-trifluoromethylbenzamides have proven to be particularly advantageous. The 3-alkylsulphanyl-2-chloro-4-trifluoromethylbenzoic acids required for the preparation thereof may be prepared according to a method described in WO2009/149806 A1. However, this method cannot be used for a large-scale industrial synthesis due to the low yields and expensive starting materials. Moreover, in the case of the compound 2-chloro-3-(methylsulphanyl)-N ...

Method for Producing Alpha-substituted Cysteine or Salt Thereof or Synthetic Intermediate of Alpha-substituted Cysteine

According to the present invention, it becomes possible to perform a process for converting into an α-substituted cysteine represented by general formula (1) or a salt thereof at low cost and on an industrial scale by employing a process that is routed through a compound represented by general formula (3) to a compound represented by general formula (6). Particularly, by employing a process that is routed through a compound represented by general formula (7-2), it becomes possible to detach a tert-butyl protection group in a simple manner and to produce the compound represented by general formula (1) with high purity. Furthermore, by employing a process that is routed through tert-butylthiomethanol or a process that is routed through a compound represented by general formula (9), it becomes possible to produce a compound represented by general formula (2) without generating bischloromethylether that is an oncogenic substance. In the production of an α-substituted-D-cysteine or a salt thereof, it becomes possible to perform a process for converting the compound represented by general formula (2) into a compound represented by general formula (3S) in one step by allowing an enzyme or the like to act on the compound represented by general formula (2). This is a continuation of U.S. application Ser. No. 14/888,576, which is the U.S. national phase of PCT/JP2014/062115 filed May 1, 2014, based on JP 2013-097172 filed May 2, 2013, the entire respective disclosures of which are incorporated herein by reference.The present invention relates to a method for producing an α-substituted cysteine or a salt thereof, which is useful as an intermediate for pharmaceuticals and the like, or an intermediate for synthesis of an α-substituted cysteine.Among α-substituted cysteines, optically active α-substituted cysteines are especially useful as intermediates for pharmaceuticals. Various methods are conventionally known as methods for producing α-substituted cysteines and salts thereof ...

SUBSTITUTED ALKYL DIARYL DERIVATIVES, METHODS OF PREPARATION AND USES

Compounds according to Formula I are provided: and salts thereof, wherein Q, Q, R, R, X, and Y are as defined herein. Methods for preparing compounds of Formula I are also provided, as well as methods of treating cellular proliferative disorders, such as cancer, using compounds of Formula (I). 2. A compound according to claim 1 , or a salt thereof claim 1 , wherein the Qand Qare substituted.3. A compound according to claim 2 , or a salt thereof claim 2 , wherein X is —N(—R—)— or —CH(R)—; and Y is —S(═O)—.4. A compound according to claim 2 , or a salt thereof claim 2 , wherein X is —N(—R—)— and Y is —C(═O)—.5. A compound according to claim 3 , or a salt thereof claim 3 , wherein Ris H and Ris H.6. A compound according to claim 5 , or a salt thereof claim 5 , wherein Qhas at least one substituent selected from the group consisting of carboxy; —O—R; and fluoro.7. A compound according to claim 5 , or a salt thereof claim 5 , wherein Qhas at least one substituent selected from the group consisting of chloro; —O—R; —NRR; and [—N(—R)—(CH)—C(—R)(—R)—(CH)—COOR].8. A compound according to claim 6 , or a salt thereof claim 6 , wherein Qhas at least one substituent selected from the group consisting of chloro; —O—R; —NRR; and [—N(—R)—(CH)—C(—R)(—R)—(CH)—COOR].9. A compound according to claim 8 , or a salt thereof claim 8 , wherein Qis phenyl having a substituent at the 4-position thereof claim 8 , and Qis phenyl having a substituent at the 4-position thereof.10. A compound according to claim 9 , or a salt thereof claim 9 , wherein Qis phenyl substituted at the 2- claim 9 , 4- and 6-positions with (C-C)alkoxy claim 9 , and Qis phenyl substituted in at least the 4-position with —O—Ror —NRR.11. A compound according to claim 10 , or a salt thereof claim 10 , wherein Qis phenyl substituted at the 4-position with —O—Ror —NRRand substituted at the 3-position with —NRR claim 10 , —O—Ror —N(—R)—(CH)—C(—R)(—R)—(CH)—COOR].12. A compound according to selected from the group consisting of:4 ...

Method for producing bis(3-aminophenyl)disulfides and 3-aminothiols

The present invention relates to a novel method for preparing bis(3-aminophenyl) disulphides of the general formula (I) and 3-aminothiols of the general formula (II), where X,Y have the meanings stated in the description, which serve as intermediates for the preparation of phenyl sulphoxides having insecticidal, acaricidal and nematicidal activity.

SULFONIUM SALT AND PHOTO-ACID GENERATOR

Provided is a novel sulfonium salt that has high solubility in a solvent and has high light sensitivity to, especially, light having a wavelength not longer than deep-UV (254 nm) and a novel photo-acid generator comprising the sulfonium salt. The invention relates to a sulfonium salt represented by the following general formula (1) and a novel photo-acid generator comprising the sulfonium salt. 2. The sulfonium salt according to claim 1 , wherein Ris a perfluoroalkyl group having 1 to 4 carbon atoms claim 1 , a nitro group claim 1 , a hydroxyl group claim 1 , a cyano group claim 1 , an acyl group having 1 to 4 carbon atoms claim 1 , or a halogen atom.3. The sulfonium salt according to claim 1 , wherein Ris a perfluoroalkyl group having 1 to 4 carbon atoms or a halogen atom.4. The sulfonium salt according to claim 1 , wherein Ris a trifluoromethyl group or a fluorine atom.5. The sulfonium salt according to claim 1 , wherein X is an anion selected from the group consisting of Cl claim 1 , Br claim 1 , SbF claim 1 , PF claim 1 , BF claim 1 , (CFCF)PF claim 1 , (CFCF)PF claim 1 , (CFCF)PF claim 1 , (CF)B claim 1 , {(CF)CH}B claim 1 , (CF)Ga claim 1 , {(CF)CH}Ga claim 1 , a trifluoromethanesulfonate anion claim 1 , a nonafluorobutanesulfonate anion claim 1 , a methanesulfonate anion claim 1 , a butanesulfonate anion claim 1 , a camphorsulfonate anion claim 1 , a benzenesulfonate anion claim 1 , a p-toluenesulfonate anion claim 1 , (CFSO)C claim 1 , (CFSO)N claim 1 , and (CFSO)N.6. A photo-acid generator comprising the sulfonium salt according to . The present invention relates firstly to a sulfonium salt and secondly to a photo-acid generator. More specifically, the present invention relates to a photo-acid generator comprising a specific sulfonium salt that is decomposed by irradiation with an active energy ray, such as light, an electron beam, or an X-ray, to generate an acid.A photo-acid generator is a generic name of compounds which are decomposed by irradiation with ...

METHOD OF ETCHING SEMICONDUCTOR STRUCTURES WITH ETCH GAS

Disclosed are sulfur-containing compounds for plasma etching channel holes, gate trenches, staircase contacts, capacitor holes, contact holes, etc., in Si-containing layers on a substrate and plasma etching methods of using the same. The plasma etching compounds may provide improved selectivity between the Si-containing layers and mask material, less damage to channel region, a straight vertical profile, and reduced bowing in pattern high aspect ratio structures. 2. The method of claim 1 , wherein the compound is CFS(CAS 1717-50-6).3. The method of claim 1 , wherein the compound has the formula R—SH.4. The method of claim 3 , wherein the compound is selected from the group consisting of FCSH (CAS 1493-15-8) claim 3 , FC—CF—SH (CAS 1540-78-9) claim 3 , FC—CH—SH (CAS 1544-53-2) claim 3 , CHF—CF—SH (812-10-2) claim 3 , CF—CF—CH—SH (CAS 677-57-6) claim 3 , and FC—CH(SH)—CF(CAS 1540-06-3).5. The method of claim 1 , wherein the compound has the formula R—S—R.6. The method of claim 5 , wherein the compound is selected from the group consisting of FC—S—CF(CAS 371-78-8) claim 5 , FC—S—CHF(CAS 371-72-2) claim 5 , FC—CF—S—CF—CF(CAS 155953-22-3) claim 5 , and FC—CF—CF—S—CF—CF—CF(CAS 356-63-8).7. The method of claim 5 , wherein Rand Rare joined to form a 5 to 6 member S-containing ring.8. The method of claim 7 , wherein the compound is selected from the group consisting of c(—S—CF—CF—CHF—CF—)(CAS 1035804-79-5) claim 7 , c(—S—CF—CHF—CHF—CF-) (CAS 30835-84-8) claim 7 , c(—S—CF—CF—CF—CF—CF-)(CAS 24345-52-6) claim 7 , c(—S—CFH—CF—CF—CFH-) (2 R claim 7 , 5 R)(CAS 1507363-75-8) claim 7 , c(—S—CFH—CF—CF—CFH-)(2 R claim 7 , 5 S)(CAS 1507363-76-9) claim 7 , and c(—S—CFH—CF—CF—CH-)(CAS 1507363-77-0).9. The method of claim 1 , wherein the silicon-containing layer comprises a layer of silicon oxide claim 1 , silicon nitride claim 1 , polysilicon claim 1 , or combinations thereof.10. The method of claim 1 , further comprising introducing an oxidizer into the chamber.11. The method of claim ...

METHOD FOR PRODUCING BIS(3-AMINOPHENYL)DISULFIDES AND 3-AMINOTHIOLS

The present invention relates to a novel method for preparing bis(3-aminophenyl)disulphides of the general formula (I) and 3-aminothiols of the general formula (II),

ISOXAZOLINE-SUBSTITUTED BENZAMIDE COMPOUND AND PESTICIDE

A substituted alkenylbenzene compound of formula (4): 1. (canceled)2. (canceled)4. A method according to claim 3 , wherein the mammal is livestock.5. A method according to claim 3 , wherein the mammal is a canine.6. A method according to claim 3 , wherein the mammal is a feline.7. A method according to claim 3 , wherein the mammal is a dog.8. A method according to claim 3 , wherein the mammal is a cat.10. A method according to claim 9 , wherein the mammal is livestock.11. A method according to claim 9 , wherein the mammal is a canine. (New) A method according to claim 9 , wherein the mammal is a feline.13. A method according to claim 9 , wherein the mammal is a dog.14. A method according to claim 9 , wherein the mammal is a cat.16. A method according to claim 15 , wherein the mammal is livestock.17. A method according to claim 15 , wherein the mammal is a canine.18. A method according to claim 15 , wherein the mammal is a feline.19. A method according to claim 15 , wherein the mammal is a dog.20. A method according to claim 15 , wherein the mammal is a cat. This application is a continuation of U.S. patent application Ser. No. 15/097,002, filed Apr. 12, 2016, which is a continuation of U.S. patent application Ser. No. 14/568,964, filed Dec. 12, 2014, which is a continuation of U.S. patent application Ser. No. 13/850,067, filed Mar. 25, 2013, now U.S. Pat. No. 8,946,492, which is a divisional of U.S. patent application Ser. No. 13/350,297, filed Jan. 13, 2012, now U.S. Pat. No. 8,492,311, which is a divisional of U.S. patent application Ser. No. 13/166,294, filed Jun. 22, 2011, now U.S. Pat. No. 8,138,213, which is a divisional of U.S. patent application Ser. No. 12/509,859, filed Jul. 27, 2009, now U.S. Pat. No. 8,022,089, which is a divisional of U.S. patent application Ser. No. 11/514,921, filed Sep. 5, 2006, now U.S. Pat. No. 7,662,972, which is a continuation-in-part of International Application No. PCT/JP2005/04268, filed Mar. 4, 2005, which claims priority to ...

Methods for Making Functionalized Fluorinated Monomers, Fluorinated Monomers, and Compositions for Making the Same

A method of making a functionalized fluorinated monomer for use in making oligomers and polymers that can be used to improve surface properties of polymer-derived systems, such as coatings. The method of making a functionalized fluorinated monomer includes reacting at least one fluorinated nucleophilic reactant, such as a fluorinated alcohol, with at least one compound containing at least one epoxide group. Other methods include reaction of a fluorinated alcohol with a cyclic carboxylic anhydride. In another embodiment, a method includes reacting a fluorinated mesylate, tosylate or triflate with an amine, alkoxide or phenoxide. In other embodiments, the method includes reacting a fluorinated alcohol with an alkyl halide, or reacting a fluorinated alkyl halide with an amine. The functionalized fluorinated monomers may be used as intermediates and reacted to modify the functional groups thereon. Further, the functionalized fluorinated monomers may be reacted to form polymers or oligomers, or with polymers or oligomers having functional groups to modify the polymer or oligomer through the functional group thereon. 1. A method for making a functionalized fluorinated monomer , comprising:reacting at least one fluorinated nucleophilic reactant having a functional reactant group with at least one compound comprising at least one epoxide group to form a functionalized fluorinated monomer having at least one hydroxyl group.2. The method of claim 1 , wherein the at least one fluorinated nucleophilic reactant is selected from the group consisting of a fluorinated alcohol claim 1 , a fluorinated carboxylic acid claim 1 , a fluorinated organic acid anhydride claim 1 , a fluorinated amine claim 1 , a fluorinated thiol claim 1 , a fluorinated amide claim 1 , a fluorinated sulfonamide claim 1 , and combinations thereof.3. The method of claim 2 , wherein the at least one fluorinated nucleophilic reactant is a mixture of at least two of the fluorinated alcohol claim 2 , the ...

METHOD OF ETCHING SEMICONDUCTOR STRUCTURES WITH ETCH GAS

Disclosed are sulfur-containing compounds for plasma etching channel holes, gate trenches, staircase contacts, capacitor holes, contact holes, etc., in Si-containing layers on a substrate and plasma etching methods of using the same. The plasma etching compounds may provide improved selectivity between the Si-containing layers and mask material, less damage to channel region, a straight vertical profile, and reduced bowing in pattern high aspect ratio structures. 1. A method of depositing an etch-resistant polymer layer on a substrate , the method comprising:{'sub': 2', '4', '2', '3', '3', '2', '3', '2', '2', '2', '3', '2', '2', '3', '3', '3', '3', '3', '2', '3', '2', '2', '3', '3', '2', '2', '2', '2', '3', '2', '2', '2', '2', '2', '2', '2', '2', '2', '2', '2', '2', '2', '2', '2', '2', '2, 'introducing a vapor of a compound into a reaction chamber containing the substrate, the compound having a formula selected from the group consisting of: CFS(CAS 1717-50-6), FCSH (CAS 1493-15-8), FC—CF—SH (CAS 1540-78-9), FC—CH—SH (CAS 1544-53-2), CHF—CF—SH (812-10-2), CF—CF—CH—SH (CAS 677-57-6), FC—CH(SH)—CF(CAS 1540-06-3), FC—S—CF(CAS 371-78-8), FC—S—CHF(CAS 371-72-2), FC—CF—S—CF—CF(CAS 155953-22-3), FC—CF—CF—S—CF—CF—CF(CAS 356-63-8), c(—S—CF—CF—CHF—CF—) (CAS 1035804-79-5), c(—S—CF—CHF—CHF—CF—) (CAS 30835-84-8), c(—S—CF—CF—CF—CF—CF—) (CAS 24345-52-6), c(—S—CFH—CF—CF—CFH—)(2 R, 5 R) (CAS 1507363-75-8), c(—S—CFH—CF—CF—CFH—)(2 R, 5 S) (CAS 1507363-76-9), and c(—S—CFH—CF—CF—CH—) (CAS 1507363-77-0); and'}plasma activating the compound to form the etch-resistant polymer layer on the substrate.2. The method of claim 1 , wherein the compound is CFS(CAS 1717-50-6).3. The method of claim 1 , wherein the compound is selected from the group consisting of FCSH (CAS 1493-15-8) claim 1 , FC—CF—SH (CAS 1540-78-9) claim 1 , FC—CH—SH (CAS 1544-53-2) claim 1 , CHF—CF—SH (812-10-2) claim 1 , CF—CF—CH—SH (CAS 677-57-6) claim 1 , and FC—CH(SH)—CF(CAS 1540-06-3).4. The method of claim 1 , wherein the ...

THIOETHER COMPOUNDS AS NITRIFICATION INHIBITORS

Provided herein are a use of thioether compounds of formula I as nitrification inhibitors, and agricultural mixtures and compositions including the thioether compounds. 2. The thioether compound of claim 1 , wherein in the compound of formula I{'sup': 1', '2, 'Rand Rare H; and'}p is 1 or 2.6. A composition for use in reducing nitrification comprising at least one compound of formula I as defined in and at least one carrier.7. An agrochemical mixture comprising (i) at least one fertilizer; and (ii) at least one compound of formula I as defined in .8. (canceled)9. (canceled)10. A method for reducing nitrification claim 1 , the method comprising treating a plant growing on at least one of soil claim 1 , soil substituents claim 1 , and a locus claim 1 , soil claim 1 , and soil substituents where the plant is growing or is intended to grow with at least one compound of formula I as defined in .11. The method of claim 10 , further comprising providing the at least one of the plant and the locus claim 10 , soil claim 10 , and soil substituents where the plant is growing or is intended to grow with a fertilizer.12. The method of claim 11 , wherein the treating with the compound of formula I and the providing of the fertilizer are carried out simultaneously.13. A method for treating at least one of a fertilizer and a fertilizer composition claim 1 , comprising applying a nitrification inhibitor as defined in to the at least one of the fertilizer and the fertilizer composition.14. The agrochemical mixture of claim 7 , wherein the fertilizer is selected from the group consisting of a solid ammonium-containing inorganic fertilizer claim 7 , a liquid ammonium-containing inorganic fertilizer claim 7 , a solid organic fertilizer claim 7 , a liquid organic fertilizer claim 7 , and a urea-containing fertilizer.15. The method of claim 10 , wherein the plant is an agricultural plant claim 10 , a vegetable claim 10 , sorghum; a silvicultural plant; an ornamental plant; and a ...

Process for the preparation of 2-alkyl-4-trifluoromethyl-3-alkylsulphonylbenzoic acids by chemoselective thioether oxidation

A process for the preparation of 2-alkyl-4-trifluoromethyl-3-alkylsulfonylbenzoic acids of the formula (I) is described. 2. Process according to claim 1 , in which NaSMe or KSMe is used as thiolate (IV).3. Process according to claim 1 , in which the thiolate (IV) is used in a molar ratio of 2:1 to 3:1 claim 1 , based on the compound of formula (II).4. Process according to claim 1 , in which claim 1 , in the first step claim 1 , dimethyl sulfoxide claim 1 , dimethylacetamide claim 1 , dimethylformamide or N-methyl-2-pyrrolidone is used as solvent.5. Process according to claim 1 , in which claim 1 , in the second step claim 1 , HOis used for selective oxidation.6. Process according to claim 1 , in which claim 1 , in the second step claim 1 , acetic acid claim 1 , propionic acid or dichloromethane is used as solvent.7. Process according to claim 1 , in which NaWOin an amount of 5 to 15 mol % claim 1 , and hydrogen peroxide in an amount of 3 to 8 mol equivalents claim 1 , in each case based on the compound of formula (VII) claim 1 , are used as oxidation catalyst.8. Process according to claim 1 , in which claim 1 , in the third step claim 1 , ethylmagnesium bromide claim 1 , butylmagnesium chloride or isopropylmagnesium chloride is used as organometallic compound.9. Process according to claim 1 , in which claim 1 , in the third step claim 1 , toluene claim 1 , tetrahydrofuran or 2-methyltetrahydrofuran is used as solvent.11. Compound according to claim 10 , in which Rand Rare methyl claim 10 , ethyl n-propyl or isopropyl or n-butyl.13. Compound according to claim 12 , in which Rand R claim 12 , independently of one another claim 12 , are methyl claim 12 , ethyl claim 12 , n-propyl claim 12 , isopropyl or n-butyl.15. Compound according to claim 14 , in which Rand R claim 14 , independently of one another claim 14 , are methyl claim 14 , ethyl claim 14 , n-propyl claim 14 , isopropyl or n-butyl. The invention relates to a process for the preparation of 2-alkyl-4- ...

Positive-type resist composition, method for forming resist pattern, photo-reactive quencher, and polymeric compound

A positive-type resist composition which generates an acid upon exposure and whose solubility in an alkali developing solution increases under the action of an acid, the composition including a base material component whose solubility in an alkali developing solution increases under the action of an acid; and a compound represented by the following general formula (m0): Z 01 to Z 04 each independently represent a substituent having electron withdrawing properties, Rb 21 and Rb 22 each independently represent an alkyl group, an alicyclic hydrocarbon group which may have a substituent, or a hydroxyl group, Rb 1 represents an aryl group which may have a substituent, an alkyl group, or an alkenyl group, n1 and n2 represent an integer of 0 to 3, and X0 − represents an organic anion.

LUMINESCENT NANOCRYSTAL COMPLEX

“Object” A problem to be solved by the present invention is to provide a luminescent nanocrystal complex that tends to disperse orderly in a polymer matrix and is superior in dispersibility in structurally mesogenic crosslinkable polymer matrices. “Solution” The present invention is a luminescent nanocrystal complex that contains luminescent nanocrystals and a surface-modifying compound that modifies the surface of the luminescent nanocrystals. The surface-modifying compound has a mesogenic backbone and a group that binds to the surface of the luminescent nanocrystals. 1. A luminescent nanocrystal complex comprising luminescent nanocrystals and a surface-modifying compound modifying a surface of the luminescent nanocrystals , whereinthe surface-modifying compound has a mesogenic group and at least one group that binds to the surface of the luminescent nanocrystals.2. The luminescent nanocrystal complex according to claim 1 , wherein the group of the surface-modifying compound that binds to the surface of the luminescent nanocrystals contains one or two or more types of atoms selected from the group consisting of sulfur claim 1 , nitrogen claim 1 , oxygen claim 1 , and phosphorus.3. The luminescent nanocrystal complex according to claim 1 , wherein the group of the surface-modifying compound that binds to the surface of the luminescent nanocrystals is any one or more of hydroxy claim 1 , thiol claim 1 , carboxylic acid claim 1 , amine claim 1 , sulfonic acid claim 1 , phosphine claim 1 , phosphine oxide claim 1 , and thioether.5. The luminescent nanocrystal complex according to claim 4 , wherein MGin general formula (i) is a divalent organic group incorporating a cyclic group optionally with a hydrogen atom in the cyclic group substituted with general formula (i-3):{'br': None, 'sup': i2', 'i2', 'i3, 'sub': 'ni2', 'R-(MGSp)-\u2003\u2003(i-3)'}{'sup': 'i2', '(In general formula (i-3) above, MGrepresents a mesogenic group,'}{'sup': 'i3', 'SPrepresents a single bond or ...

6-(poly-substituted aryl)-4-aminopicolinates and their use as herbicides

4-Aminopicolinic acids having tri- and tetra-substituted aryl substituents in the 6-position, and their amine and acid derivatives of the forula I are potent herbicides demonstrating a broad spectrum of weed control.

Process for preparing optically active alcohol

A β-keto acid derivative (1 mol) of formula (II): where R¹ is optionally substituted C1-7 alkyl, trifluoro­methyl or aryl, R² is C1-8 alkoxy, SR⁵ where R⁵ is C1-8 alkyl or phenyl or -NR⁶R⁷ where R⁶ and R⁷ are H, C1-8 alkyl or benzyl, and R³ is H, halogen, C1-8 alkyl or alkoxycarbonyl of R¹+R³ form a methylene chain, is dissolved in a solvent and there is added 100-1/50,000 mol of a ruthenium-optically active phosphine derivative as catalyst, e.g. of formula Ru x H y Cl z (R⁸-BINAP)₂(S) p (III) or [RuH l (R⁸-BINAP) v ]Y w (V) wherein BINAP is a specified tertiary phosphine group. The derivative is reacted with hydrogen at a pressure of 5-100 kg/cm2 for 1-48 hours and there is recovered as product an optically active alcohol of the formula (I) wherein the =C=O group has become CH-OH.

CYLINDER DERIVATIVES, METHOD FOR THE PRODUCTION THEREOF AND THEIR USE AS MEDICINAL PRODUCTS

A PROCEDURE FOR PREPARING BENZOTIOPYRAN COMPOUNDS- (4, 3, 2-CD) INDAZOL

HETARYLALKYL SUBSTITUTED 5- AND 6-RINGHETEROCYCLES

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Process for preparing aryl trifluoromethylsulfides

Trifluoromethylthiocopper, formed in situ by the reaction of bis-(trifluoromethylthio)mercury with copper, reacts with aromatic bromides and iodides to give aryl trifluoromethyl sulfides.

Insecticidal pyrazoline derivatives

ベンゾイル尿素誘導体、その製造法及び殺虫剤

(57)【要約】本公報は電子出願前の出願データであるた め要約のデータは記録されません。

Alkyl esters of 4-substituted phenoxyisobutyric acid

ALKYL ESTERS OF 4-SUBSTITUTED PHENOXYISOBUTYRIC ACID WHICH ARE USEFUL IN THE TREATMENT OF HYPOCHOLESTEROLEMIA IN MAMMALS AND AS PREVENTIVES OF BILIARY LITHIASIS IN MAMMALS.

Methods of treating cholesterolemia

THE METHODS OF THIS INVENTION ARE USEFUL FOR THE TREATMENT OF CHOLESTEROLEMINA IN MAMMALS. THE METHODS INVOLVE ADMINISTERING TO MAMMALS CERTAIN FLUORINATED DERIVATIVES OF ESTERS OF PHENOXY ISOBUTYRIC ACID.

Coloured photo-hardenable composition

Processo para a preparação de 3- aminobenzonitrilas substituídas

Lubricating oil additives

1404714 Fuels; lubricants EXXON RESEARCH & ENG CO 7 Sept 1973 [15 Jan 1973] 1980/73 Headings C5F and C5G [Also in Division C2] A lubricating oil or fuel oil composition comprises a lubricating oil or a fuel oil and a sulphurized hydrocarbon-substituted phenol prepared by reacting a phenol of the formula wherein R is an aliphatic group, and m and n are integers from 1 to 5 provided m + n is not more than 6, with S in the presence of an organic amine having a pK 6 of between 2 and 12. Specified aliphatic groups R are alkyl, cycloalkyl and alkenyl groups. The fuel oil may be gasoline or diesel fuel. The lubricating oil may be animal, vegetable, mineral or synthetic ester lubricating oil. Other additives which may be present are dispersants, VI improvers, corrosion inhibitors or additional antioxidants.

Acides indenyl-acetiques et procede pour les

Fungicidal triazole ethanol compounds

Compounds of formula: <IMAGE> wherein R1 is alkyl, cycloalkyl or phenyl and R2 is phenyl or benzyl and their acid addition salts and metal complexes. The compounds have fungicidal activity.

Fungicidally active 3-substituted 1-azolyl-3-methyl-1-phenoxy-butan-2-ones and -ols

New 3-substituted 1-azolyl-3-methyl-1-phenoxy-butan-2-ones and -ols of the general formula ##STR1## in which Az represents 1,2,4-triazol-1-yl, 1,2,4-triazol-4-yl or imidazol-1-yl, B represents the keto group or the CH(OH) group, Y represents oxygen or sulphur, R represents halogenoalkyl, optionally substituted phenyl or optionally substituted benzyl, or provided Y represents sulphur, may represent alkyl and X 1 , X 2 and X 3 are selected independently and each represent hydrogen, halogen, alkyl, halogenoalkyl, alkoxy, alkylthio, alkylsulphonyl, nitro, cyano, alkoxycarbonyl or optionally substituted phenyl, are obtained if halogenoether ketones are reacted with 1,2,4-triazole or imidazole in the presence of a diluent and of an acid-binding agent, and, if appropriate, the keto derivatives thus obtained are reduced. The compounds, as such or as their acid-addition salts or metal-salt complexes, have fungicidal activity, for example against those fungi which cause powdery mildew diseases or cause rice diseases.

Heterocyclic compounds

Compounds of formula: ##STR1## wherein R 1 is alkyl, cycloalkyl or phenyl and R 2 is phenyl or benzyl and their acid addition salts and metal complexes. The compounds have fungicidal activity.

1-(.beta.-(R-THIO) PHENETHYL) IMIDAZOLES AND DERIVATIVES THEREOF

ABSTRACT OF THE DISCLOSURE Novel 1-[.beta.-(R-thio)phenethyl]imidazoles and the corresponding 1-[.beta.-(R-sulfinyl)phenethyl]imidazoles and 1-[.beta.-(R-sulfonyl)pbenethyl]?zoles of the formula:

Dialkylphenol sulphides

Chemical process, etc.

Low-foaming overbased phenates

Mineral oil composition

A MINERAL OIL COMPOSITION COMPRISING A NEUTRAL, NONVOLATILE, MINERAL OIL BASE AND, AS A VISCOSITY INDEX IMPROVER, AN EFFECTIVE AMOUNT, FOR EXAMPLE, 0.5-3 WEIGHT PERCENT, OF AN ESSENTIALLY AMORPHOUS, OIL SOLUBLE COPOLYMER HAVING RANDOM REPEAT UNITS DERIVED, ON A WEIGHT BASIS WITH THE COMBINED WEIGHTS TOTALLING 100%, (A) 25-55% FROM ETHYLENE, (B) 37-75% FROM A TERMINALLY UNSATURATED STRAIGHT CHAIN MONOOLEFIN HAVING 3-12 CARBON ATOMS, (C) 0.1-10% FROM A NON-CONJUGATED DIOLEFIN HAVING 518 CARBON ATOMS AND ONLY ONE POLYMERIZABLE DOUBLE BOND, AND (D) 0.1-2% FROM A NON-CONJUGATED DIOLEFIN HAVING 518 CARBON ATOMS AND TWO POLYMERIZABLE DOUBLE BONDS, SAID COPOLYMER HAVING AN INHERENT VISCOSITY OF 0.7-1.8 AS MEASURED ON A 0.1 WEIGHT PERCENT SOLUTION IN TETRACHLOROETHYLENE AT 30*C. AND A WALLACE PLASTICITY OF AT LEAST 16, SAID COPOLYMER FURTHER CHARACTERIZED AS EXHIBITING SUPERIOR PROCESSABILITY AND ISOLABILITY AND GOOD SHEAR STABILITY.

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6-(多取代芳基)-4-氨基吡啶甲酸酯及其作为除草剂的用途

在6－位置上具有三－和四－取代芳基取代基的通式I的4－氨基吡啶甲酸、其胺和酸衍生物是证明控制广谱杂草的有效除草剂。

Method for preparing 3-methyl mercaptopropionic aldehyde

Method of obtaining derivatives of n-arylbenzamide or salts thereof

N-arylbenzamide derivatives of formula (I) <CHEM> wherein Z is oxygen or sulfur, R1, R2, R3 are hydrogen or a substituent, R4 is an heteroaryl group linked to the nitrogen atom by a carbon atom, selected from possibly substituted isoxazole, isothiazole, pyrazole, imidazole, thiadiazole, oxadiazole or pyridazine. These compounds can be used as herbicides.

Process for preparing phenylacetic acid derivatives or their salts

The present invention provides compounds of the general formula: …<CHEM>… wherein… R<1> is an aryl, ar(lower)alkyl or pyridyl radical, each of which may be substituted by halogen, amino, lower alkyl, lower alkoxy or carboxy(lower)alkyl,… R<2> is a hydrogen or halogen atom,… R<3> is an amino, lower alkylamino, acylamino or nitro radical,… R<4> is a divalent radical of the general formula -CnH2n- in which n is an integer of from 1 to 7, and… A is oxy, thio, sulfinyl, sulfonyl or imino,… the derivatives of the carboxy group, and the pharmaceutically acceptable salts thereof. …<??>The present invention also provides processes for the preparation of these compounds, as well as pharmaceutical compositions containing them.

Patent JPH0415226B2

Method of controlling undesirable vegetation

Fluorinated alkyl compound derivatives and process for preparing same

Fluorinate alkyl ketone compound represented by general formula(III) thiophenol in the presence of Lewis acid selected from catalysts such as aluminum chlorinate, titanium(IV) chloride, ferric chloride, etc., to yield fluorinated alkyl ketal represented by general formula(I) in solvents which do not affect reaction. Dithioketal is reduced by reductant such as hydrogenated aluminum lithium, hydrogenated sodium borate, etc., in solvent such as ether, tetrahydro furan, benzene alone or mixture thereby.

6-(polysubstituted aryl)-4-aminopicolinates and use thereof as herbicides

FIELD: chemistry. SUBSTANCE: invention relates to a compound of formula used as herbicides, in which Q 1 is H or F; Q 2 is a halogen provided that when Q 1 is H, Q 2 is Cl or Br; R 1 and R 2 independently denote H, C 1 -C 6 -acyl; and Ar is a polysubstituted aryl group selected from a group consisting of a) , b) , c) in which W 1 is a halogen; X 1 is C 1 -C 4 -alkyl, C 1 -C 4 -alkoxy, C 1 -C 4 -halogenalkyl, -NR 3 R 4 ; Y 1 is C 1 -C 4 -alkyl, C 1 -C 4 -halogenalkyl, halogen or -CN, or when X 1 and Y 1 are taken together denotes -O(CH 2 ) n O-, in which n=1; and R 3 and R 4 independently denote H or C 1 -C 4 -alkyl; W 2 is F or Cl; X 2 is F, CI, -CN, C 1 -C 4 -alkyl, C 1 -C 4 -alkoxy, C 1 -C 4 -alkylthio, C 1 -C 4 -alkylthionyl, C 1 -C 4 -alkylsulphonyl, C 1 -C 4 -halogenalkyl, C 1 -C 4 -halogenalkoxy, C 1 -C 4 -alkoxy-substituted C 1 -C 4 -alkyl, C 1 -C 4 -alkoxy-substituted C 1 -C 4 -alkoxy, -NR 3 R 4 or fluorinated acetyl; Y 2 is a halogen, C 1 -C 4 -alkyl, C 1 -C 4 -halogenalkyl or -CN, or when W 2 is F, X z and Y 2 , taken together, denote -O(CH 2 ) n O-, in which n=1; and R 3 and R 4 independently denote H or C 1 -C 6 -alkyl; Y 3 is a halogen or -CN; Z 3 is F, CI, -NO 2 , C 1 -C 4 -alkoxy, -NR 3 R 4 ; and R 3 and R 4 independently denote H; derivatives on the carboxyl group which are suitable for use in agriculture. EFFECT: compounds are excellent herbicides with a wide range action against weeds and excellent selectivity towards agricultural crops. 19 cl, 7 tbl, 69 ex РОССИЙСКАЯ ФЕДЕРАЦИЯ (19) RU (11) (51) МПК C07D C07C C07C C07C C07C C07C ФЕДЕРАЛЬНАЯ СЛУЖБА C07C ПО ИНТЕЛЛЕКТУАЛЬНОЙ СОБСТВЕННОСТИ, C07C ПАТЕНТАМ И ТОВАРНЫМ ЗНАКАМ C07F C07F (12) ОПИСАНИЕ 2 428 416 213/79 (2006.01) 25/13 (2006.01) 39/26 (2006.01) 39/27 (2006.01) 39/28 (2006.01) 47/55 (2006.01) 47/575 (2006.01) 49/80 (2006.01) 5/02 (2006.01) 7/22 (2006.01) (13) C2 A01N 43/40 (2006.01) A01P 13/02 (2006.01) ИЗОБРЕТЕНИЯ К ПАТЕНТУ (21)(22) Заявка: 2008125897/04, 12.01.2007 (24) Дата начала отсчета ...

一种联芳基轴手性烷基硫化物及其合成方法与应用

本发明提供了一种联芳基轴手性烷基硫化物(III)及其合成方法与应用，本发明通过光学纯联芳基轴手性杂环硫化物与卤代烷烃等的亲核取代反应，高效合成联芳基轴手性烷基硫化合物，该反应可在空气下进行，操作简单，反应条件温和，后处理方便，原料易得，总收率较高，本发明所得联芳基轴手性化合物ee值最高为99％，收率可高达99％；

Method of preparation of symmetric oxythioalcanes

白细胞功能相关抗原与细胞间粘着分子结合的抑制剂及其用途

本发明涉及与LFA－1的I域中的新调节位点结合从而抑制LFA－1与能结合LFA－1的ICAMs结合的化合物。因此,本发明还提供调节白细胞与上皮细胞黏合的方法。本发明的化合物可用于治疗下列疾病:与炎症有关的疾病、自免疫疾病、肿瘤转移、同种移植排斥和再灌注损伤。具体地,本发明是涉及通式结构(I)的二芳基硫醚、其药学上可接受的盐或其药物前体,以及二芳基硫醚的用途,特别是式(I)的化合物在抑制LFA－1与能结合LFA－1的ICAM的结合中的用途,在式(I)中,A和B独立地为选自5－员和6－员芳香环的芳基,包括但是不限于苯基、噻吩基、呋喃基、嘧啶基、咪唑基、吡唑基、吡啶基、吡嗪基、吡咯基和哒嗪基。

Cyclopropane derivative and insecticidal and tickicidal composition containing it

Herbicidal compounds, compositions, and method of use

Novel and highly effective herbicidal compounds in the diphenylether class are provided herein.

피라졸린 유도체의 제법

내용 없음

Pyrimidin-z-ones

Compounds of the general formula: <IMAGE> I wherein X represents halogen or trifluoromethyl; R1 and R2, independently represent hydrogen or lower alkyl; R3, R4 and R5, which may be the same or different, each represent hydrogen, lower alkyl, lower alkenyl, lower alkynyl, lower alkanoyl, lower alkenoyl, C7-16 aralkyl or C6-10 aryl or a 5-9 membered unsaturated or aromatic heterocyclic ring; one or both of R4 and R5 may also represent aroyl groups; Z represents an oxygen atom or a sulfur atom or oxide thereof or a group NR6 (wherein R6 is as defined for R hereinafter or represents the group COR7 in which R7 represents hydrogen or optionally substituted aryl, heterocyclic, aralkyl, lower alkyl or lower alkoxy group; and R represents a C6-10 carbocyclic aromatic group or a heterocyclic group containing a 5-9 membered unsaturated or aromatic heterocyclic ring which ring contains one or more heteroatoms selected from O, N and S and optionally carries a fused ring which carbocyclic or heterocyclic group may carry one or more C1-4 alkyl or phenyl groups said groups being optionally substituted; and where acid or basic groups are present, the salts thereof are useful in combating abnormal cell proliferation. The compounds of the invention are prepared by inter alia alkylation, ring closure and oxidation.

Functional fluid containing metal salts of esters of hydrocarbyl succinic acid or anhydride with thio-bis-alkanols as antioxidants

There are disclosed zinc and nickel salts of mono- or di- esters of C 12 -C 50 aliphatic hydrocarbon substituted succinic acids or anhydrides, such as octadecenyl succinic anhydride, with thio-bis-alkanols such as dithiodiethanol. The products are useful as antioxidants for lubricating oils and functional fluids, especially automatic transmission fluids.

Process for production of (poly)thiol compound for use as optical material, and polymerizable composition comprising the compound

Insecticide-acaricide

Patent JPS5910344B2

Method of producing beta-methylthiopropionic aldehyde

Azolylmethyl-cyclopropylcarbinol derivative

Esters of trisubstituted hydroxyphenylalkonoic acids

Ether compound, production thereof, insecticide and acaricide comprising said compound as active ingredient

DIHYDROPYRIDINE DERIVATIVES AND PROCEDURES FOR PREPARING THEREOF

Benzoate derivative, its preparation, and use of said derivative

Process for production of (poly)thiol compound for use as optical material, and polymerizable composition comprising the compound

유기 (폴리)할로겐 화합물 또는 (폴리)알코올 화합물과 티오요소를 반응시켜 이소티우로늄염을 생성하고, 얻어진 이소티우로늄염을 가수분해하여 (폴리)티올 화합물을 제조하는 방법에 있어서, 상기 티오요소 중의 칼슘의 함유량이, 1.0중량% 이하인, 광학재료용 (폴리)티올 화합물의 제조방법을 제공한다. In a method of producing an isotiuronium salt by reacting an organic (poly) halogen compound or a (poly) alcohol compound with a thiourea, and hydrolyzing the obtained isothiuronium salt to produce a (poly) thiol compound. It provides the manufacturing method of the (poly) thiol compound for optical materials whose content of calcium in 1.0 weight% or less.

Substituted phenylthiotrifluoride and other similar fluorinating agents

FIELD: chemistry. SUBSTANCE: described is a compound of formula (I): , in which R 1a and R 1b independently denote a hydrogen atom; a primary or secondary alkyl group containing 1-8 carbon atoms; or a primary, secondary or tertiary alkyl group containing 2-8 carbon atoms and at least one ether bond; and R 2a , R 2b independently denote a hydrogen atom; a halogen atom; a primary, secondary or tertiary alkyl group containing 1-8 carbon atoms; or a primary, secondary or tertiary alkyl group containing 2-8 carbon atoms and at least one ether bond; and R 3 denotes a hydrogen atom; a primary, secondary or tertiary alkyl group containing 1-8 carbon atoms; or a primary, secondary or tertiary alkyl group containing 2-8 carbon atoms and at least one ether bond; where, if R 3 denotes a hydrogen atom, then at least two of R 1a , R 1b , R 2a and R 2b each independently denotes a primary, secondary or tertiary alkyl group containing 1-8 carbon atoms, where R 1a and R 1b do not denote a tertiary alkyl group; or a primary, secondary or tertiary alkyl group containing 2-8 carbon atoms and at least one ether bond; or at least one of R 1a , R 1b , R 2a and R 2b denotes a primary, secondary or tertiary alkyl group containing 2-8 carbon atoms and at least one ether bond; and where, if R 3 denotes a primary alkyl group containing 1-8 carbon atoms, then at least one of R 1a , R 1a , R 2a and R 2b denotes a primary, secondary or tertiary alkyl group containing 1-8 carbon atoms, where R 1a and R 1b does not denote a tertiary alkyl group; or a primary, secondary or tertiary alkyl group containing 2-8 carbon atoms and at least one ether bond; and where, if at least two of R 2a , R 2b and R 3 denote tertiary alkyl groups, then the tertiary alkyl groups are adjacent. Described also is a method of introducing one or more fluorine atoms into a desired compound, which involves bringing the fluorinating agent of formula (I) into contact with the desired compound under conditions which enable ...

Novel surfactant polypod compound and its manufacture

ELASTOMERIC COMPOUNDS INCORPORATING PARTIALLY COATED BLACKS OF SMOKE

UN COMPUESTOELASTOMERICO COMPRENDE,UN ELASTOMERO SELECCIONADO A PARTIR DEL GRUPO QUE CONSISTE DE CA UCHO DE MONOMERO DE DIENO PROPILENO ETILENO POLI- CLOROPRENO CAUCHO NATURAL CAUCHO DE BUTADIENO NITR ILO HIDROGENADO CAUCHO NITRILO BUTADIENO POLIETILE NO CLORINADO CAUCHO DE ESTIRENO BUTADIENO CAUCHO DE BUTILO CAUCHO POLIACRILICO POLIEPICLOROHIDRINA ACETATO DE ETILENO VINILO Y MEZCLAS DE LOS ANTERIO RES Y UN NEGRO DE HUMO RECUBIERTO DE SILICE. A COMPUESTOELASTOMERICO UNDERSTANDS, an elastomer selected from among the group consisting of CA UCHO diene monomer Ethylene Propylene polychloroprene NATURAL RUBBER Butadiene Rubber NITR ILO Hydrogenated Nitrile butadiene POLIETILE NO CHLORINATED Styrene Butadiene rubber butyl rubber polyacrylic polyepichlorohydrin ACETATO OF ETHYLENE VINYL AND MIXTURES OF THE PREVIOUS RES AND A BLACK OF SMOKE COATED WITH SILICE.

Sulfonium compound, chemically amplified resist composition, and patterning process

하기 식 (A)의 신규한 술포늄 화합물 및 PAG로서 이를 포함하는 화학 증폭 레지스트 조성물이 제공된다. KrF 또는 ArF 엑시머 레이저, EB 또는 EUV를 이용하여 포토리소그래피로 가공될 때, 본 레지스트 조성물은 고감도 및 감소된 산 확산을 가지며, 리소그래피 성능이 개선된다. A novel sulfonium compound of the following formula (A) and a chemically amplified resist composition comprising the same as a PAG are provided. When processed by photolithography using a KrF or ArF excimer laser, EB or EUV, the resist composition has high sensitivity and reduced acid diffusion, and lithography performance is improved.

Benzophenone hydrazone derivatives as insecticides

式(I)代表的新的二苯酮腙衍生物，式中R 1 、R 2 、R 3 、R 4 、R 5 、R 6 、R 7 和n的定义见说明书。式(I)的二苯酮腙衍生物具有优良的杀虫活性。

Method for preparing mercaptoacyl-carnitine

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Thioether compounds as nitrification inhibitors

Provided herein are a use of thioether compounds of formula I as nitrification inhibitors, and agricultural mixtures and compositions including the thioether compounds.

The method of producing dibenzoxazepines

Phenoxyalkylcarboxylic acid derivatives and process for their preparations

Phenoxyalkylcarboxylic acid derivatives of the following formula, ##STR1## wherein R 1 indicates hydrogen atom, methyl group or ethyl group, m is an integer from 2 to 5, and n is an integer from 3 to 8, X 1 and X 2 each independently represent sulfur atom, oxygen atom, sulfinyl group or sulfonyl group, proviso X 1 and X 2 are not simultaneously oxygen atom; their alkali salts and hydrates thereof are useful as antiallergic agents.

Method of producing aryl-sulphur pentafluorides

FIELD: chemistry. SUBSTANCE: invention relates to novel methods of producing aryl-sulphur pentafluorides of formula (I) where: R 1 , R 2 , R 3 , R 4 and R 5 each independently denotes a hydrogen atom, a halogen atom, an unsubstituted alkyl group having 1-18 carbon atoms or a nitro group; R denotes a hydrogen atom or a halogen atom; M denotes an alkali metal atom; and X denotes a chlorine atom, a bromine atom or an iodine atom. The methods involve reaction of at least one aryl-sulphur compound with a halogen and a fluorine salt to obtain aryl-sulphur halotetrafluoride. The aryl-sulphur halotetrafluoride reacts with a fluoride source to obtain the desired aryl-sulphur pentafluoride. EFFECT: improved method. 21 cl, 3 tbl, 34 ex РОССИЙСКАЯ ФЕДЕРАЦИЯ (19) RU (11) 2 472 779 (13) C2 (51) МПК C07C 381/00 (2006.01) ФЕДЕРАЛЬНАЯ СЛУЖБА ПО ИНТЕЛЛЕКТУАЛЬНОЙ СОБСТВЕННОСТИ (12) ОПИСАНИЕ ИЗОБРЕТЕНИЯ К ПАТЕНТУ (21)(22) Заявка: 2009139003/04, 21.03.2008 (24) Дата начала отсчета срока действия патента: 21.03.2008 (73) Патентообладатель(и): УБЭ Индастриз, Лтд. (JP) R U Приоритет(ы): (30) Конвенционный приоритет: 23.03.2007 US 60/896,669 (72) Автор(ы): УМЕМОТО Теруо (US) (43) Дата публикации заявки: 27.04.2011 Бюл. № 12 C 2 (56) Список документов, цитированных в отчете о поиске: OU et al. "Oxidative addition and isomerization reactions. The synthesis of cisand trans- ArSF4 Cl and cis- and trans- PhTeF4Cl", Canadian journal of chemistry, vol.75(12), 1997, p.p.1878-1884. OU et al. "Oxidative fluorination of S, Se and Те compounds", Journal of Fluorine Chemistry, vol.101, 2000, 279-283. RU 97107003 A, (см. прод.) C 2 2 4 7 2 7 7 9 2 4 7 2 7 7 9 (45) Опубликовано: 20.01.2013 Бюл. № 2 (85) Дата начала рассмотрения заявки PCT на национальной фазе: 23.10.2009 (86) Заявка PCT: US 2008/057849 (21.03.2008) (87) Публикация заявки РСТ: WO 2008/118787 (02.10.2008) Адрес для переписки: 105082, Москва, Спартаковский пер., 2, стр. 1, секция 1, этаж 3, "ЕВРОМАРКПАТ" R U (54) СПОСОБ ПОЛУЧЕНИЯ ...

Process for preparation of 4-phenoxy-phenoxy-alkane-carboxylic acids