СПОСОБ УДАЛЕНИЯ ИЗБЫТОЧНОГО КРАСИТЕЛЯ С НАБИВНОЙ ИЛИ ОКРАШЕННОЙ ТКАНИ ИЛИ ПРЯЖИ

Изобретение относится к области красильно-отделочного производства, в частности, к способу удаления избыточного красителя с набивной или окрашенной ткани или пряжи, включающему обработку раствором для полоскания, содержащим, по меньшей мере, один фермент, проявляющий пероксидазную или лакказную активность, в концентрации от 0,005 до 5 мг белка фермента на 1 л раствора для полоскания, окислитель, медиатор - 1-гидроксибензтриазол в концентрации от 1 мкМ до 1 мМ и, необязательно, добавки. Предлагаются также система для удаления избыточного красителя с набивной или окрашенной ткани или пряжи и композиция для ее приготовления. Изобретение способствует удалению избыточного красителя с набивной или окрашенной ткани или пряжи без отбеливания окрашенной или набивной ткани. 3 с. и 24 з.п.ф-лы.

ПЕРОРАЛЬНАЯ КОМПОЗИЦИЯ

... 1. Пероральная композиция, содержащая пиколиновую кислоту и перекисное соединение или его эквивалентный источник, отличающаяся тем, что молярное соотношение между пиколиновой кислотой и перекисным соединением или его эквивалентным источником, имеет значение в интервале 1:30-100:1. 2. Пероральная композиция по пункту 1, в которой перекисное соединение или его эквивалентный источник представляют собой перкислоту или соединение, образующее пероксид водорода при растворении в воде. 3. Пероральная композиция по любому из предыдущих пунктов, дополнительно включающая соединение, хелатирующее переходный металл. 4. Пероральная композиция по любому из предыдущих пунктов, включающая соединение, хелатирующее переходный металл, имеющее коэффициент связывания железа (III) выше 1015. 5. Пероральная композиция по любому из предыдущих пунктов, включающая диэтилентриаминопентауксусную кислоту в качестве соединения, хелатирующего переходный металл. 6. Пероральная композиция по любому из предыдущих пунктов ...

Benzotriazolhaltige, granulare Komponente für den Einsatz in Maschinengeschirrspülmitteln (MGSM) und Verfahren zu dessen Herstellung

Maschinengeschirrspülmittel mit Silberschutz

Waschmittelzusammensetzungen mit Zusätzen zur Verhinderung der Farbstoffübertragung

AMMONIAK-FREIE ZUSAMMENSETZUNGEN MIT VERBESSERTER SUBSTRAT-KOMPATIBILITÄT ZUM REINIGEN VON MIKROELEKTRONISCHEN SUBSTRATEN

Enzymstabilisatoren

Die vorliegende Erfindung betrifft Wasch- oder Reinigungsmittel enthaltend mindestens eine Protease und mindestens eine Verbindung der Formel (I), (II), (III), IV), (V), (VI), (VII), (VIII), (IX), (X) oder (XI), wie hierin offenbart, die als Proteaseinhibitorwirkt und somit ein geeigneter Enzymstabilisator ist, sowie die Verwendung dieser Verbindungen als Enzymstabilisator in protease-haltigen Wasch- und Reinigungsmitteln. Ebenfalls Bestandteil der Erfindung sind die entsprechenden Wasch- und Reinigungsverfahren und die Verwendung der hierin beschriebenen Mittel.

BLEICHKATALYSATOREN MIT UNGESÄTTIGTEM TENSID UND ANTIOXIDANT

TETRAHYDROCARBAZOLE, VERFAHREN ZUR HERSTELLUNG DIESER VERBINDUNGEN SOWIE DEREN VERWENDUNG

Softening agent for textiles, esp. in washing machines - comprising imidazoline derivs. compatible with anionic detergents

A softening compsn. for textile materials contains 1-35% of a softening agent which comprises >=1 imidazoline deriv. of formula (I): (where R is a 13-21C aliphatic radical; n = 2 or 3; and X is H or an acyl gp. of formula RCO-. The acpds. are prepd. by reacting a fatty acid or ester (1 or 2 mols.) with 1 mol. of beta-hydroxyethyl ethylene diamine or beta-hydroxypropyl ethylenediamine. Compsns. are storage stable and are compatible with anionic detergents. A pref. compsn. contains 3-20% esp. 5-15% of the imidazolines and 4-70%, esp. 6-60% of an anionic, ionic hybrid and/or nonionic detergent, partic. 10% nonionic.

Cleaning fluid

A cleaning fluid for a filter, comprising a salt, a non-ionic surfactant and a non-flammable solvent. Preferably the salt is sodium carbonate, trisodium phosphate, sodium metasilicate or any combination thereof, the non-ionic surfactant is an ethylene oxide / propylene oxide block copolymer (0.2-10% wt) and the solvent is water. Preferably all three alkali salts are present, their total amount ranging from 1.5 to 30% wt, preferably from 3 to 5%. The fluid may further contain a corrosion inhibitor (0.05-10% wt) which is a mixture of n-oleoyl sarcosine, 2,2-[[(5-methyl-1H-benzotriazol-1-yl)methyl]imino]bisethanol, 2,2-[[(4-methyl-1H-benzotriazol-1-yl)methyl]imino]bisethanol and methanol. A preferred composition consists of 1-2% wt sodium carbonate, 0.25-1.25% wt trisodium phosphate, 0.5-1.5% wt sodium metasilicate, 0.3-1.5% wt EO/PO block copolymer, 0.05-1% wt corrosion inhibitor and water. The filter is preferably a diesel particulate filter like the ones used in automobiles and vans, i.e ...

Cleaning fluid

Fabric care treatment composition and a method of treating fabric

DETERGENT COMPOSITION

Zwitterionic water-soluble substituted imine corrosion inhibitors

Making granular sodium percarbonate

A process of manufacturing granular sodium percarbonate comprises spraying : hydrogen peroxide solution directly on to unpurifed anhydrous sodium carbonate to produce granular sodium percarbonate non-uniform sodium percarbonate being recycled to the process. The sodium perbonate particles may be stabilized with MgSO 4 and one or more compounds selected from (1) sodium silicate (2) higher fatty acids or esters thereof with a carbohydrate or polyol (3) pyridine compounds and (4) anomatic or aliphatic amines and salts thereof.

This invention relates to the manufacture and application of an aqueous based metal ion chelating composition that can coat surfaces to reduce fouling due to

MACHINE DISHWASHING COMPOSITIONS

Composition

Ligand and complex for catalytically bleaching a substrate

Pthalimidopercaproic acid sugar suspension

An aqueous liquid or gel phthalimidopercaproic (PAP) acid suspension comprises PAP dispersed in an aqueous sugar compound. Preferably PAP comprises 5-45% weight of the composition. The sugar is preferably sorbitol and preferably comprises 40-70% weight. The suspension may also contain a thickener e.g. xanthan gum. Also disclosed is a method for making the composition and its formulation for dishwashing.

Enzyme activity enhancement

Improvements in or related to organic compositions

IMPROVEMENTS IN WASHING AND CLEANING AGENTS

... 1,272,607. Weakly foaming detergents. HENKEL & CIE G.m.b.H. 15 Aug., 1969 [17 Aug., 1968], No. 40805/69. Heading C5D. A weakly foaming detergent composition comprises (A) at least one compound selected from anionic, amphoteric and non-ionic surfactants and inorganic and organic builder salts, (B) at least one propoxylated and/or butoxylated melamine of molecular weight from 700 to 20,000, the proportions by wt. of (A) to (B) being from 999: 1 to 3 : 1. The alkoxylated melamines preferably have a molecular weight of 1200 12,000 and may be obtained by reacting 1 mol. of melamine with 4 to 25 mols of propylene oxide and subsequently with 10 to 50 mol. of butylene oxide. Mixtures of differently alkoxylated melamines may be used. Many types of surfactants are listed including soaps, amine oxides and sulphoxides. Conventional builder salts may be present. Optional ingredients are (a) bleaching agents e.g. alkali metal perborates, percarbonates or perphosphates, urea perhydrate, alkali metal hypochlorites ...

PROCESS FOR PREPARATION OF POWDERY DETERGENT COMPOSITION

... 1504098 Spray dried detergent composition KAO SOAP CO Ltd 12 April 1976 [14 April 1975] 14826/76 Heading C5D Detergent compositions in powder form containing from 2 to 30% by weight of a surfactant of formula or wherein R 1 is C 6 to C 24 alkyl or alkyl (C 6 to C 18 ) phenyl, n is 1 to 29 and M is H, alkali metal or alkaline earth metal are prepared by a process which comprises forming an aqueous slurry of the surfactant and from 0À05 to 10 parts by weight per 100 parts by weight of the surfactant of a smokepreventing agent of Formula III wherein X is H or O; m is 1 to 3, R 2 and R 3 are C 1 -C 12 alkyl or is C 5 -C 7 cycloalkylidene or is wherein X is as defined above; and R 4 is a mono-, di- or tri-valent group depending on the value of m, and acid addition salts thereof, and spray drying the slurry. The compound of Formula III may be 4- benzyloxy-2,2,6,6,-tetramethyl piperidine, 4 -stearoyloxy - 2,2,6,6, - tetramethyl piperidine or bis(2,2,6,6-tetramethyl-4-piperidine) adipate. The compound ...

BLEACHING CATALYSTS WITH INSATIATED TENSID AND ANTIOXIDANT

CLEANING AGENT

AMMONIA-FREE COMPOSITIONS WITH IMPROVED SUBSTRATE COMPATIBILITY FOR CLEANING MICROELECTRONIC SUBSTRATES

PH-BUFFERED, AQUEOUS ONES CLEANING COMPOSITION AND PROCEDURE FOR THE DISTANCE OF PHOTO LACQUER ARREARS

SOLVENT COMPOSITIONS FOR THE DISTANCE OF OIL ARREARS OF A SUBSTRATE AND A USE PROCEDURE FOR IT

STABILIZED HYGIENE CENTER AND HOUSEHOLD PRODUCT

PRODUCTS ON BASIS OF IONI LIQUIDS AND PROCEDURE FOR THEIR USE

CHEMICAL RINSING COMPOSITION

SANITISIERUNGSZUSAMMENSETZUNG

STABILIZED, THICKENED ONE, WASSERSTOFFPEROXIDHALTIGE COMPOSITIONS

CLEANING AGENT FOR THE DISTANCE OF DYE FILMS OF SURFACES, PROCEDURES FOR THE PRODUCTION OF THE MEANS AND PROCEDURE FOR THE CLEANING

TEXTILE DETERGENT

CLEANING AGENT MIXTURE

USE OF POLYMERS IN MATERIAL TREATMENT MEANS WITH REDUCED FABRIC ABRASION

COLORPROTECTING DETERGENT

CLEANING AGENT WITH BLEACH-CATALYTICALLY ACTIVE ONE COMPLEXES

TEXTILE DETERGENT

PROCEDURE AND MIXTURES FOR REMOVING UNWANTED OF ORGANIC MATERIALS.

PROCEDURE AND COMPOSITIONS FOR THE DISTANCE OF UNWANTED ORGANIC MATERIAL.

AGAINST CHLORINE SPLITTING OFF STABLE ONE CLEANING AGENT COMPOSITIONS AND MEANS TO THEIR PRODUCTION.

SILVER CORROSION PROTECTION AGENT II

PROCEDURE FOR CLEANING ARTICLES, IN PARTICULAR FILTERS FOR THE FOOD PRODUCTION

TENSIDSYSTEM

Detergensmittel

BLEACHING PROCESS USING AN PHENOL-OXIDIZING ENZYME, A SOURCE OF HYDROGEN PEROXIDE AND A REINFORCEMENT

COLORCAREFUL BLEACHES, COMPOSITIONS AND DETERGENT COMPOSITIONS AND WASCHVERFAHREN UNDER THEIR USE

LAUNDRY PRESERVATIVE AGENT AS WELL AS A TEXTILE TREATMENT PROCEDURE

Prevention of the mutual attack of metals and with these materials in contact

WASCH-UND CLEANING METHOD

CLEANING AND DISINFECTION SYSTEMS FOR MEDICAL INSTRUMENTS

TENSIDHALTIGE CLEANING AGENTS WITH ENZYME INHIBITORS

TABLE-WARE WASHING MACHINE DETERGENT IN FORM OF A TABLET

Product

An automatic dishwashing product comprising a bleaching agent and a compound in accordance with formula (1) or a salt or tautomer thereof, wherein A and B are independently selected from the group consisting of H, OR ...

Cleaning compositions

Use of metal hydrazide complex compounds as oxidation catalysts

Utilisation of ketones as precursors of active compounds

CLEANING SYSTEM INCLUDING A LIQUID CLEANING COMPOSITION DISPOSED IN A WATER SOLUBLE CONTAINER

Method for enhancing the activity of an enzyme

AUTOMATIC DISHWASHING DETERGENT WITH IMPROVED GLASS ANTI-CORROSION PROPERTIES

IONIC LIQUID BASED PRODUCTS AND METHOD OF USING THE SAME

Reverse osmosis membrane cleaning agent, cleaning liquid, and cleaning method

This reverse osmosis (RO) membrane cleaning agent, which effectively removes contaminants that cannot be sufficiently removed by conventional cleaning agents when an RO membrane used to treat water, in particular an aromatic polyamide-based RO membrane, becomes contaminated, and the performance thereof in terms of the permeation flux, differential pressure, salt rejection rate, and the like is reduced, includes an aliphatic amide and/or an aromatic amide. Also provided is a method in which the cleaning agent or a cleaning liquid is used to clean a RO membrane. The aliphatic amide and/or the aromatic amide, and in particular a water-soluble aliphatic amide and/or an aromatic amide having a comparatively low molecular weight exhibit/exhibits an excellent cleaning effect with respect to contaminants adhered to an aromatic polyamide-based RO membrane.

Use of a bacterium isolated from the genus

The invention relates to a bacterium isolated from the genus ...

Agricultural compositions containing surface-active lactams

Microemulsion cleaning composition comprising a polyol mono-alkylether

Antimicrobial cleaning compositions

Rinse added fabric softener compositions containing antioxidants for sun-fade protection for fabrics

Composition and method for bleaching a substrate

Cleaner impregnated towel

Fabric treated with cellulase and oxidoreductase

Fabric care compositions having reduced fabric abrasion

Process for preparing detergent compositions

Liquid automatic dishwashing composition

Cleaning composition

ANTI-CORROSION DETERGENT COMPOSITIONS AND USE OF SAME IN CLEANING DENTAL AND MEDICAL INSTRUMENTS

A novel method for cleaning dental and medical instruments is disclosed, in which a cleaning solution including a low-residue corrosion inhibitor is used not only in a wash stage of the cleaning cycle, but also in at least one subsequent rinse cycle, to optimize both cleaning and rust prevention. A novel cleaning solution particularly suited to this method has a neutral to alkaline pH and comprises in aqueous solution a low-foaming surfactant and a corrosion inhibitor selected from the group of C4-C16 alkyl pyrrolidones and C1-C18 alkylamines.

METHOD AND COMPOSITIONS FOR REMOVAL OF UNDESIRABLE ORGANIC MATTER

METHOD AND COMPOSITIONS FOR REMOVAL OF UNDESIRABLE ORGANIC MATTER A method of removing undesirable organic matter, such as food soil, paint, or the like, comprises contacting the organic matter with imidazole, pyrazole, an alkyl or aryl substituted imidazole, an alkyl or aryl substituted pyrazole, or a mixture of two or more thereof. Compositions containing these compounds as the active ingredient are also disclosed.

FABRIC RINSE COMPOSITION TO REMOVE SURFACTANT RESIDUES

IR 4431A A FABRIC RINSE COMPOSITION TO REMOVE SURFACTANT RESIDUES A fabric rinse composition that removes residual soap and surfactant particularly anionic, left in the clothes during washing, which is disliked by consumers, consisting of low levels of a nonionic surfactant, low levels of an organic acid such as citric acid/sodium citrate, and a major amount of water, in the form of a liquid or gel.

ALKALINE LIGHT DUTY LIQUID DETERGENTS

FABRIC CARE TREATMENT COMPOSITION AND A METHOD OF TREATING FABRIC

A fabric care system comprising a radical photoinitiator selected from hydrogen abstraction photoinitiators, bond cleavage radical photoinitiators or mixtures thereof is used to treat fabric, for example as a stain removal system in the washing or rinsing of fabric in a laundry process. The fabric treatment system can be incorporated into a fabric washing composition or a conditioner composition.

SUPERCRITICAL FLUID-BASED CLEANING COMPOSITIONS AND METHODS

Compositions and methods employing supercritical fluids, e.g., supercritical carbon dioxide, for removal of unwanted material from microelectronic device structures and process equipment. One composition of such type, having utility for removing flux and solder perform surface films, includes supercritical fluid, e.g., supercritical CO2, and organic co-solvent, e.g., xylene. Another composition of such type having utility for removal of metals, metal oxides, metal-containing post-etch residues and CMP particles from semiconductor substrates includes supercritical fluid and at least one ~-diketone.

MICROELECTRONIC CLEANING COMPOSITIONS CONTAINING OXIDIZERS AND ORGANIC SOLVENTS

Cleaning compositions suitable for cleaning microelectronic structures having silicon dioxide, low-k or high-k dielectrics and copper or aluminum metallizations contain an oxidizing agent and a polar organic solvent selected from amides, sulfones, sulfolenes, selenones and saturated alcohols, and optionally other components.

LAUNDRY DETERGENT COMPOSITION

FLUORINATED ACID COMPOUNDS, COMPOSITIONS AND METHODS OF USE

Novel acid-based chemistries that can be used in various cleaning, de-scaling, rust- removal, brightening, etching and other similar applications, including, but not limited to, those based upon hexafluorozirconic acid and other additives, such as urea in some applications, which are effective for a wide range of applications, while avoiding the health, safety and environmental issues that are often associated with the use of hydrochloric acid and other toxic chemistries.

PREPARATION FOR INTERNAL CLEANING OVENS

PRODUCT FOR CLEANING SOIL OR HARD SURFACES AND ITS APPLICATION METHOD (VERSIONS)

... ?The claimed group of inventions relates to the field of organic chemistry and can be used for removing oils, including petroleum, fuel oil, fuels, hydrocarbons and liquid fuel, from soil; and can also be used for processing and gathering petroleum, oils, fuel oil, fuels, hydrocarbons and other petroleum products from hard surfaces, for example, from the inner surfaces of tanks for storing petroleum or petroleum products, of equipment used during the recovery, re-processing and transportation of petroleum, of equipment used for producing petroleum products, drilling sludge, gravel or sand in storage facilities, or from other hard surfaces. The substance for removing oils, including petroleum and petroleum products, from soil and hard surfaces is in the form of an aqueous solution of a natural polysaccharide and a surfactant. Unlike the prototype, microgels of polysaccharides having a molecular mass of 20 000 to 200 000 daltons and a particle size of 10 to 1000 nm are used as a natural polysaccharide ...

CLEANING COMPOSITION COMPRISING A PROTEASE CLEANING SYSTEM

The present application relates to nil phosphate and nil borate cleaning compositions comprising a protease cleaning system and a wetting agent, and processes for making and using such compositions. Such compositions offer improved enzyme stability in product and a consumer desirable cleaning profile.

DETERGENT COMPOSITIONS CONTAINING PYRIDINOL-N-OXIDE COMPOUNDS

This disclosure relates to detergent compositions containing pyridinol-N-oxide compounds and being substantially free of bleach. Methods for treating a stained fabric using such detergent compositions are also disclosed.

Detergent Compositions Inhibiting Dye Transfer Containing a Catalyst, Amine Stabilizer and Peroxide Generating Enzyme

BLEACH/BUILDER PRECURSORS

C 6144 (R) A novel multifunctional bleach/builder precursor molecule is disclosed which is useful in various detergent compositions.

Quick-Drying Gel-Type Disinfectant for Hands and Fingers

CLEANING COMPOSITIONS AND METHODS OF USING THE SAME

Cleaning compositions are disclosed that economically and effectively remove a variety of marking materials from many coated or uncoated substrate surfaces. The compositions contain a terpene compound, a pyrrolidone compound, an emulsifying surfactant, and water, the compositions being in the form of a microemulsion. Also disclosed are methods of cleaning marked surfaces with the microemulsion compositions.

RINSE ADDED FABRIC SOFTENER COMPOSITIONS CONTAINING ANTIOXIDANTS FOR SUN-FADE PROTECTION FOR FABRICS

The present invention relates to fabric care compositions to reduce the fading of fabrics from sunlight, comprising: (A) from about 1 % to about 25 % by weight of the composition of a non-fabric staining, light stable antioxidant compound, preferably containing at least one C8-C22 hydrocarbon fatty organic moiety; (B) from 3 % to about 50 % by weight of the composition of a fabric softening compound; (C) from about 25 % to about 95 % by weight of the composition of a carrier material; and (D) optionally, from about 0 % to about 20 % by weight of the composition of a non-fabric staining, light stable sunscreen compound, preferably containing at least one C8-C22 hydrocarbon fatty organic moiety; wherein the antioxidant compound is a solid material having a melting point of less than about 80 ~C or is a liquid at a temperature of less than about 40 ~C; wherein the sunscreen compound absorbs light at a wavelength of from about 290 nm to about 450 nm; and wherein the sunscreen compound is a ...

HARD SURFACE CLEANING COMPOSITION CONTAINING INORGANIC ALKALI

A detergent composition comprising the following ingredients: an inorganic alkali salt, a water-insoluble organic solvent, an amine, a pyrrolidone compound, polyhydric alcohol, anionic surface active agent, and water.

MACHINE DISHWASHING GEL COMPOSITIONS

A detergent gel composition is described wherein the composition contains 10 to 50 % by weight of a builder material; an effective amount of an oxygen bleaching agent; 0.2 to 2.0 % by weight of a dual component structuring system consisting of a cross-linked polyacrylate structurant and an azole costructurant provided that the total amount of the builder and the structurant does not exceed 60 as calculated by the formula: wt.% of builder x wt.% of the structurant 60.

Cleaning Formulations and Method of Using the Cleaning Formulations

A water-rich hydroxylamine formulation for photoresist and post-etch/post-ash residue removal in applications wherein a semiconductor substrate comprises aluminum. The cleaning composition comprises from about 2 to about 15% by wt. of hydroxylamine; from about 50 to about 80% by wt. of water; from about 0.01 to about 5.0% by wt. of a corrosion inhibitor; from about 5 to about 45% by wt. of a component selected from the group consisting of: an alkanolamine having a pKa<9.0, a water-miscible solvent, and a mixture thereof. Employment of such composition exhibits efficient cleaning capability for Al substrates, minimal silicon etch while protecting aluminum for substrates comprising both materials.

Ophthalmic contact lens solutions containing forms of vitamin b

The present invention relates to improved ophthalmic solutions that employ select B vitamins; pyridoxine and its salts; and thiamine and its salts in order to more effectively preserve solutions and to reduce the degree to which cationic preservatives will deposit on contact lenses. Ophthalmic solutions are here understood to include contact lens treatment solutions, such as cleaners, soaking solutions, conditioning solutions and lens storage solutions, as well as wetting solutions and in-eye solutions for treatment of eye conditions.

CLEANING SOLUTION AND DAMASCENE PROCESS USING THE SAME

A cleaning solution is provided. The cleaning solution includes an aliphatic polycarboxylic acid, a chain sulfonic acid substantially less than 4 wt % and an amine containing buffer agent. 1. A cleaning solution , comprising:(a) an aliphatic polycarboxylic acid;(b) a chain sulfonic acid substantially less than 4 wt %; and(c) an amine containing buffer agent.2. The cleaning solution of claim 1 , wherein the aliphatic polycarboxylic acid comprises an alkyl polycarboxylic acid selected from a group consisting of tartaric acid claim 1 , maleic acid claim 1 , malic acid claim 1 , fumaric acid claim 1 , succinic acid claim 1 , oxalic acid claim 1 , malonic acid claim 1 , maleic anhydride claim 1 , citric acid claim 1 , adipic acid azelaic acid claim 1 , sebacic acid claim 1 , 1 claim 1 ,13-tridecanedioic acid and the arbitrary combinations thereof.3. The cleaning solution of claim 1 , wherein the aliphatic polycarboxylic acid is an aromatic polycarboxylic acid comprising phthalic acid or isophthalic acid.4. The cleaning solution of claim 1 , wherein the chain sulfonic acid is selected from a group consisting of mesylic acid claim 1 , esylic acid claim 1 , tosylic acid claim 1 , taurine and the arbitrary combinations thereof.5. The cleaning solution of claim 1 , wherein the amine containing buffer agent comprising Triethanolamine (TEA) claim 1 , Monoethanolamine (MEA) claim 1 , Diethanolamine (DEA) claim 1 , Methyl Diethanolamine (MDEA) or monoisopropanolamine (MIPA).6. The cleaning solution of claim 1 , further comprising an oxidizing agent selected from a group consisting of HO claim 1 , Fe(NO) claim 1 , KIO claim 1 , KMnO4 claim 1 , HNO claim 1 , NH4ClO claim 1 , NHClO claim 1 , NHIO claim 1 , NHBO claim 1 , NHClO claim 1 , NHIO claim 1 , (NH)SO claim 1 , (N(CH))ClO claim 1 , (N(CH))ClO claim 1 , (N(CH))IO claim 1 , (N(CH))BO claim 1 , (N(CH))ClO claim 1 , (N(CH))IO claim 1 , (N(CH))SO claim 1 , (CO(NH))HO claim 1 , CH(CO)OOH and the arbitrary combinations thereof.7. ...

Bleach catalysts

The present invention relates to specific acylhydrazone compounds, their use as oxidation catalysts and to a process for removing stains and soil on textiles and hard surfaces. The compounds are substituted with a specific cyclic ammonium group adjacent to the acyl group. Further aspects of the invention are compositions or formulations comprising such compounds.

Use of Metal Hydrazide Complex Compounds as Oxidation Catalysts

The present invention relates to the use of selected metal complex compounds and ligands as oxidation catalysts as well as to a process for removing stains and soil on textiles and hard surfaces. The metal complex compounds have hydrazide ligands, preferably with electron withdrawing groups in the phenyl ring adjacent to the acyl group. Further aspects of the invention are formulations comprising such metal complex compounds, novel metal complex compounds and novel ligands.

Liquid salt cleaning compositions

A cleaning composition comprising a liquid salt, and a hydrogen bond donor for the liquid salt, and a surfactant. Also a method of cleaning using the cleaning composition.

DETERGENT COMPOSITIONS FOR REMOVING HEAVY METALS AND FORMALDEHYDE

The present invention provides a detergent composition for removing heavy metals and formaldehyde, comprising at least one selected from the group consisting of trientine or trientine derivative of Formula (1), cyclen or cyclen derivative of Formula (2), cyclam or cyclam derivative of Formula (3), and a salt thereof. 9. The detergent composition of claim 1 , wherein trientine or trientine derivative claim 1 , cyclen or cyclen derivative claim 1 , cyclam or cyclam derivative claim 1 , and a salt thereof is comprised in the range of 0.01 to 5.0 wt % claim 1 , preferably 0.05 to 5.0 wt % claim 1 , more preferably 0.1 to 3.0 wt % claim 1 , based a total weight of the composition.10. The detergent composition of claim 1 , wherein the said composition is used as laundry detergent.11. The detergent composition of claim 1 , wherein the said composition is used as household detergent claim 1 , dishwashing detergent claim 1 , feeding bottle detergent claim 1 , detergent for washing agricultural products.12. The detergent composition of claim 1 , wherein the said composition is used as detergent for plastics claim 1 , furniture claim 1 , interior materials of household. The present invention relates to a detergent composition which can be used as a laundry detergent, a household detergent for plastics, toys, feeding bottles, a furniture cleaning detergent, dishwashing detergent and so on. In particular, the present invention relates to a detergent composition for effectively removing heavy metals and formaldehyde which are present in these materials.Air pollution is getting worse with industrial development. Major air pollutants are volatile organic compounds (VOCs) such as formaldehyde, harmful gases such as sulfur dioxide, nitrogen oxides, ozone and carbon monoxide, and heavy metals such as Pb, Cd, As, Cr, Cu, Ni. These pollutants are commonly absorbed or condensed into fine dusts (PM) or ultrafine dusts (PM), and enter into the body through the respiratory tract, thereby ...

SURFACE TREATMENT AGENT

The present invention provides a surface treatment agent which is capable of efficiently removing oily substances from the surface of a metal material, while removing scales and fumes therefrom at the same time. 1. A surface treatment agent for use in removing an oily substance simultaneously with scale and fumes from a surface of a metal material ,the surface treatment agent comprising a chelating agent, a nonionic surfactant, and an anionic surfactant,wherein the anionic surfactant is at least one selected from the group consisting of phosphate ester type surfactants, carboxylic acid type surfactants, sulfonic acid type surfactants, and sulfate ester type surfactants.2. The surface treatment agent according to claim 1 ,wherein the chelating agent is at least one selected from the group consisting of phosphonic acid-based chelating agents, aminocarboxylic acid type chelating agents, and carboxyethyl group-based chelating agents, anda total content of the chelating agent is 3,000 to 22,000 ppm by mass.3. The surface treatment agent according to claim 1 ,wherein the nonionic surfactant is at least one selected from the group consisting of polyoxyalkylene glycol fatty acid esters, polyalkylene glycol fatty acid esters, and polyoxyalkylene alkyl ethers, anda total content of the nonionic surfactant is 1,000 to 4,000 ppm by mass.4. The surface treatment agent according to claim 1 ,wherein the total content of the anionic surfactant is 2,000 to 8,000 ppm by mass.5. The surface treatment agent according to claim 1 , wherein the anionic surfactant is a phosphate ester type surfactant.6. The surface treatment agent according to claim 1 ,wherein the surface treatment agent further comprises a fluorine-containing compound that liberates fluoride ions, and a content of the fluorine-containing compound is 500 to 3,000 ppm by mass.7. The surface treatment agent according to claim 1 ,wherein the surface treatment agent further comprises a reducing agent, and a content of the ...

METHOD OF TREATING A METAL SUBSTRATE

A method of removing at least a portion of an oxide layer from the surface of a metal substrate comprising exposing the metal substrate to a body of treatment liquor comprising a treatment formulation and a multiplicity of solid particles which comprise or consists of a multiplicity of polymeric particles and wherein said treatment formulation comprises one or more promoters selected from the group consisting of acids, bases and surfactants wherein the method further comprises causing the solid particles and the metal substrate to enter into contacting relative movement. 1. A method of removing at least a portion of an oxide layer from the surface of a metal substrate comprising exposing the metal substrate to a body of treatment liquor comprising a treatment formulation and a multiplicity of solid particles which comprise or consists of a multiplicity of polymeric particles and wherein said treatment formulation comprises one or more promoters selected from the group consisting of acids , bases and surfactants wherein the method further comprises causing the solid particles and the metal substrate to enter into contacting relative movement.2. The method according to wherein the treatment formulation further comprises a solvent.3. The method according to or wherein the acids have a pKa greater than about −1.7.4. The method according to any one of the preceding claims wherein the one or more promoters comprise at least one organic acid.5. The method according to any of the preceding claims wherein the bases have a pKb greater than about −1.7.6. The method according to any one of the preceding claims wherein the one or more promoters comprise at least one carboxylic acid moiety.7. The method according to any one of the preceding claims wherein the one or more promoters comprise two or more carboxylic acid moieties.8. The method according to any one of the preceding claims wherein the one or more promoters comprise at least one citrate moiety.9. The method according to ...

COPPER CLEANING AND PROTECTION FORMULATIONS

A cleaning composition and process for cleaning post-chemical mechanical polishing (CMP) residue and contaminants from a microelectronic device having said residue and contaminants thereon. The cleaning compositions include novel corrosion inhibitors. The composition achieves highly efficacious cleaning of the post-CMP residue and contaminant material from the surface of the microelectronic device without compromising the low-k dielectric material or the copper interconnect material. 1. A cleaning composition comprising at least one solvent , at least one corrosion inhibitor , at least one amine , and at least one quaternary base , wherein the corrosion inhibitor comprises a species selected from the group consisting of: ribosylpurines and methylated or deoxy derivatives thereof;degradation products of adenosine and adenosine derivatives; purine-saccharide complexes; methylated or deoxy purine derivatives, and reaction or degradation products thereof; and combinations thereof.2. The cleaning composition of claim 1 , wherein the at least one corrosion inhibitor comprises a species selected from the group consisting of: N-ribosylpurine claim 1 , adenosine claim 1 , guanosine claim 1 , 2-aminopurine riboside claim 1 , 2-methoxyadenosine claim 1 , N-methyladenosine claim 1 , N claim 1 ,N-dimethyladenosine claim 1 , trimethylated adenosine claim 1 , trimethyl N-methyladenosine claim 1 , C-4′-methyladenosine claim 1 , 3-deoxyadenosine; adenine claim 1 , methylated adenine claim 1 , dimethylated adenine claim 1 , N4 claim 1 ,N4-dimethylpyrimidine-4 claim 1 ,5 claim 1 ,6-triamine claim 1 , 4 claim 1 ,5 claim 1 ,6-triaminopyrimidine claim 1 , allantoin claim 1 , hydroxylated C—O—O—C dimers claim 1 , C—C bridged dimers claim 1 , ribose claim 1 , methylated ribose claim 1 , tetramethylated ribose claim 1 , xylose claim 1 , glucose claim 1 , purine claim 1 , guanine claim 1 , hypoxanthine claim 1 , xanthine claim 1 , theobromine claim 1 , caffeine claim 1 , uric acid claim 1 , ...

STABILIZED COMPOSITIONS COMPRISING LEUCO COMPOUNDS

A composition comprising: (a) a leuco composition; and (b) a stabilizing amount of an antioxidant composition. The antioxidant composition comprises at least one sterically hindered phenol and at least one substituted diarylamine, and the mole ratio of the hindered phenol to the substituted diarylamine is greater than 1:1. In another embodiment, a composition comprises (a) a leuco composition and (b) an antioxidant composition; and optionally (c) a solvent composition. The combined mass of the leuco compounds and antioxidants present in the composition is 10% or more of the total mass of the composition, and (b) the molar ratio of antioxidants present in the composition to leuco compounds present in the composition is greater than 1:1. 1. A composition comprising: (a) a leuco composition; and (b) a stabilizing amount of an antioxidant composition which comprises at least one sterically hindered phenol and at least one substituted diarylamine , wherein the mole ratio of the hindered phenol to the substituted diarylamine is greater than 1:1.2. The composition of claim 1 , wherein the composition comprises about 1 wt. % or more sterically hindered phenol compounds.3. The composition of claim 2 , wherein the mole ratio of the hindered phenol to the substituted diarylamine is greater than 5.0:1.0.4. A composition comprising: (a) a leuco composition; and (b) an antioxidant composition claim 2 , wherein (i) the combined mass of the leuco compounds and antioxidants present in the composition is 10% or more of the total mass of the composition claim 2 , and (b) the molar ratio of antioxidants present in the composition to leuco compounds present in the composition is greater than 1:1.5. The composition of claim 4 , wherein the antioxidant composition comprises at least one sterically hindered phenol and at least one substituted diarylamine.6. The composition of claim 5 , wherein the hindered phenol is selected from the group consisting of 2 claim 5 ,6-bis(1-methylpropyl) ...

WASHING OR CLEANING AGENTS WITH ELECTROCHEMICALLY ACTIVATABLE ANIONIC MEDIATOR COMPOUNDS

The aim of the invention is to improve the cleaning power of washing and cleaning agents, especially with regard to bleachable stains, while avoiding any damage to the textile treated with said washing and cleaning agents. This is substantially achieved by using an electrolytically bleachable species generated by a redox reaction from an anionically substituted 1-hydroxy-2,2,6,6-tetramethylpiperidine, 2,2,6,6-tetramethylpiperidine-N-oxide, or (2,2,6,6-tetramethylpiperidine-1-yl)oxyl. 1. A washing or cleaning agent , comprising a mediator compound in the form of anionically substituted 1-hydroxy-2 ,2 ,6 ,6-tetramethylpiperidine , 2 ,2 ,6 ,6-tetramethylpiperidine-N-oxide , or (2 ,2 ,6 ,6-tetramethylpiperidin-1-yl)oxyl.2. The agent according to claim 1 , comprising 0.05% by weight to 10% by weight claim 1 , of the mediator compound and wherein the agent is free of a bleaching agent and conventional bleach activator.3. A method for washing textiles or for cleaning hard surfaces claim 1 , wherein the textiles or hard surfaces are contacted with a bleaching-active species claim 1 , generated electrolytically by a redox reaction in an electrolysis device from anionically substituted 1-hydroxy-2 claim 1 ,2 claim 1 ,6 claim 1 ,6-tetramethylpiperidine claim 1 , 2 claim 1 ,2 claim 1 ,6 claim 1 ,6-tetramethylpiperidine-N-oxide claim 1 , or (2 claim 1 ,2 claim 1 ,6 claim 1 ,6-tetramethylpiperidin-1-yl)oxyl in an aqueous bath.4. The method according to claim 4 , characterized in that the bath containing the mediator compound is electrolyzed continuously or once or repeatedly for specific time periods.5. The method according to or claim 4 , characterized in that the electrolysis device is formed as a separate device independent of a washing machine or dishwasher claim 4 , and said device operates on its own power source.6. The method according to claim 4 , characterized in that the mediator compound passes through an electrolysis device before admission into the chamber of a ...

Cleaning Compositions

This disclosure relates to a cleaning composition that contains 1) at least one redox agent; 2) at least one chelating agent, the chelating agent being a polyaminopolycarboxylic acid; 3) at least one corrosion inhibitor, the corrosion inhibitor being a substituted or unsubstituted benzotriazole; 4) at least one sulfonic acid; and 5) water.

SYNERGISTIC MIXED SOLVENTS-BASED COMPOSITIONS FOR REMOVAL OF PAINT, VARNISH AND STAIN COATINGS

Compositions and methods are disclosed which are effective for removing or stripping varnish and paint or stains from surfaces such as wood or metal which comprises activating NMP and/or BLO with 1-20% by weight of ethyl 3-ethoxypropionate (EEP), preferably 2-15%, and optimally about 3-5%, and with 0.1-10% by weight of NOP/ALC EO, preferably 0.2-5%, most preferably 1 -3% by weight and/or 0.1-5% by weight of Silwett 77, preferably 0.2-3%, and most preferably 0.5-2% by weight, 1. A method for removing a coating of paint or varnish from wood or ental surfaces which comprises providing a composition comprising a non-aqueous so vent matrix composed of about 20-70% by weight of a highly polar solvent with a Hansen's fractional polar solubility component greater than 0.25 , and an aqueous system additive selected from the group consisting of wetting agents , spreading agents and combinations thereof , the amount of said additive being sufficient to effect the spreading and wetting of the coating to facilitate the removal of the coating from the surface , and applying the composition to the surface to be treated , and then removing the composition from the treated surface2. The method of wherein the highly polar solvent is N-methyl-2-pyrrolidone.3. The method of wherein the additive has an HLB of about 8 or less.4. The method of wherein the additive exhibits a Drave's wetting of a cotton skein in less than 5 seconds at 0.1% water.5. The method of wherein the composition further comprises about 30-80% by weight of gamma-butyrolactone claim 1 , about 1-30% by weight of ethyl 3-ethoxypmpionate claim 1 , about 0.1-10% N-octyl pyrrolidone and about 0.1-5% ethoxylated siloxane.6. The method of in which said composition consists essentially of about 30-65% N-methyl-2-pyrrolidone claim 1 , about 35-70% gamma-butyrolactone claim 1 , about 2-15% ethyl 3-ethoxypropionate claim 1 , about 0.2-5% N-octyl pyrrolidone and about 0.2-3% ethoxylated siloxane.7. The method of in which said ...

Antiviral composition for textiles

The present invention relates to an antiviral composition. The antiviral composition of the invention is applied to textiles to make the textiles virus-resistant before they can be used. The antiviral composition includes an antiviral agent, one or more binding agents and a catalyst or a softener depending upon the utility of the antiviral composition.

Hydrogen peroxide and peracid stabilization with molecules based on a pyridine carboxylic acid

Stabilized peroxycarboxylic acid compositions are provided. The stable peroxycarboxylic acid compositions are particularly suitable for use in sanitizing equipment and surfaces to reduce yeasts, spores and bacteria, including those having contact with food, food products and/or components thereof, which require or benefit from infection control suitable for direct contact with such food sources are provided.

Cleaning compositions

The present disclosure is directed to non-corrosive cleaning compositions that are useful, e.g., for removing residues (e.g., plasma etch and/or plasma ashing residues) and/or metal oxides from a semiconductor substrate as an intermediate step in a multistep manufacturing process.

CLEANING KIT

A cleaning kit comprising a cleaning agent comprising a supporting substrate and an oxidoreductase mediator. The oxidoreductase-mediator is immobilized on the supporting substrate. 1. A cleaning kit comprising:i) a cleaning composition comprising an oxidoreductase enzyme; andii) a cleaning agent comprising a supporting substrate and an oxidoreductase-mediator wherein the oxidoreductase-mediator is immobilized on the supporting substrate.2. A cleaning kit according to wherein the oxidoreductase-mediator is selected from the group consisting of organic-based mediator claim 1 , transition metal coordination complex mediator and mixtures thereof.3. A cleaning kit according to wherein the oxidoreductase-mediator is selected from the group consisting of 2 claim 1 ,2′-azinobis-(3-ethylbenzthiazoline-6-sulfonate) claim 1 , 1-hydroxybenzotriazole claim 1 , violuric acid claim 1 , N-hydroxyacetanilide claim 1 , methyl syringate claim 1 , acetosyringone claim 1 , syringaldezine claim 1 , butyl syringate claim 1 , pentyl syringate claim 1 , hexyl syringate claim 1 , heptyl syringate claim 1 , vanillyl alcohol claim 1 , synapic acid claim 1 , acetovanillone claim 1 , and mixtures thereof.4. A cleaning kit according to wherein the oxidoreductase-mediator has the formula{'br': None, 'Z1HN—NHZ2'}wherein Z1, is any organic group e. g. (substituted)—(hetero) (polycyclic)-aromatic, substituted (cyclo)-alkyl containing hetero atoms, and Z2 is electron withdrawing group, selected from the group consisting of optionally substituted alkyl/(hetero)aryl-sulfone, sulfoxide, -sulfonate, -carbonyl, -oxalyl, -amidoxalyl, 5 hydrazidoxalyl, -carboxyl and esters and salts thereof and amidyl, -hydrazidyl, nitrile.5. A cleaning kit according to wherein the oxidoreductase-mediator is selected from the group consisting of phenoxazine-10-propionic acid claim 1 , phenoxazine-10-hydroxyethyl claim 1 , phenothiazine-10-ethyl-4-carboxy claim 1 , phenothiazine-10-propionic acid claim 1 , promazine ...

MODERATELY ALKALINE CLEANING COMPOSITIONS FOR PROTEINACEOUS AND FATTY SOIL REMOVAL AT LOW TEMPERATURES

The present invention comprises chlorinated and non-chlorinated alkaline cleaning compositions for removal of proteinaceous and fatty soils at low temperature, i.e. less than 120° F., with little or no deleterious affect on cleaning performance. According to the invention, applicants have found that adding additional alkalinity makes protein removal more difficult and reducing the amount of alkalinity actually improves performance. According to the invention optimized combinations of chlorine and alkalinity components for low temperature cleaning as well as a surfactant system optimized for low temperature fatty soil removal are disclosed. 1. A cleaning composition capable of removing proteinaceous soils and/or fatty soils or mixtures thereof at temperatures of less than 100° F. comprising:a source of chlorine; anda source of active alkalinity; wherein said chlorine and active alkalinity are in a ratio of greater than 1:1 on a percent weight basis.2. The cleaning composition of claim 1 , wherein said chlorine and active alkalinity are in a ratio of greater than 3:1 on a weight basis.3. The cleaning composition of claim 1 , wherein said chlorine and active alkalinity are in a ratio of greater than 5:1 on a weight basis.4. The cleaning composition of wherein said alkaline portion comprises one or more of the following: an alkali or alkaline earth metal borate claim 1 , silicate claim 1 , carbonate claim 1 , hydroxide claim 1 , or phosphate.5. The cleaning composition of wherein said source of chlorine comprises one or more of the following: a hypochlorite claim 1 , a chlorinated phosphate claim 1 , a chlorinated isocyanurate claim 1 , a chlorinated melamine claim 1 , or a chlorinated amide.6. The cleaning composition of claim 1 , further comprising a surfactant.7. The cleaning composition of wherein said composition is a use composition8. The cleaning composition of wherein said surfactant is an amine oxide that has at least 50% of the carbon chain lengths of 14 or ...

FUNCTIONALIZED 4- AND 5-VINYL SUBSTITUTED REGIOISOMERS OF 1, 2, 3-TRIAZOLES VIA 1, 3- DIPOLAR CYCLOADDITION AND POLYMERS THEREOF

The present invention provides novel functionalized mixtures 4- and 5-vinyl substituted regioisomers of 1,2,3-triazoles via 1,3-dipolar cycloaddition. Functionalized alkyne moieties with a terminal alcoholic functionality are reacted with functionalized organic moieties with a terminal leaving group and an azide to provide an alcoholic functionalized mixture of 4- and 5-substituted regioisomers of 1,2,3-triazole moieties. The mixture may be converted to a wide variety of useful functionalized mixtures of 4- and 5-vinyl substituted regioisomers of 1,2,3-triazole moieties, which in turn can be converted to a wide variety of useful polymers The novel alcoholic functionalized mixtures of 4- and 5-substituted regioisomers can be separated by chromatography to provide the purified 4- and 5-alcoholic functionalized substituted 1,2,3-triazole moieties. The novel compounds of the invention can be employed in a wide variety of compositions (Formulae (I), (II)); wherein R, R, R, and R, are defined herein. 1. An alcoholic mixture of 4- and 5-substituted regioisomers of 1 ,2 ,3-triazole moieties.4. An adhesive , coating , encapsulation , personal care , oilfield , membrane , agricultural , or cleaning composition comprising an alcoholic mixture of 4- and 5-substituted regioisomers of 1 ,2 ,3-triazole moieties.14. A mixture of 4- and 5-vinyl substituted regioisomers of 1 ,2 ,3-triazole moieties.17. An adhesive , coating , encapsulation , personal care , oilfield , membrane , agricultural , or cleaning composition comprising a mixture of 4- and 5-vinyl substituted regioisomers of 1 ,2 ,3-triazole moieties.27. A homopolymer of a mixture of 4- and 5-vinyl substituted regioisomers of 1 ,2 ,3-triazole moieties.29. An adhesive , coating , encapsulation , personal care , oilfield , membrane , agricultural , or cleaning composition comprising a homopolymer of a mixture of 4- and 5-vinyl substituted regioisomers of 1 ,2 ,3-triazole moieties.34. A non-homopolymer of a mixture of 4- and 5- ...

Detergents capable of cleaning, bleaching, sanitizing and/or disinfecting textiles including sulfoperoxycarboxylic acids

The present invention relates to novel combined laundry detergent, bleach, and antimicrobial composition incorporating novel sulfoperoxycarboxylic acid compounds, and methods for making and using them. The sulfoperoxycarboxylic compounds used in compositions of the invention are storage stable, water soluble and have low to no odor. Compositions of the invention may be in the form of a liquid, a solid, or a gel. The sulfoperoxycarboxylic compounds useful in preparing compositions of the present invention can be formed from non-petroleum based renewable materials.

ADVANCED NOVEL ECO-FRIENDLY COMPOSITIONS

The present invention relates to Eco-friendly compositions for domestic and industrial applications as well as cleaning materials and detergents. In particular, the present invention relates to non-toxic “green” noval compositions including: about 1.0% to about 5.0% of Sodium Carbonate, about 0.1% to about 6.0% Potassium Hydroxide, up to 1.0% D-Limonene, and about to 1.5% to about 6.0% Alkyl Polyglycosides. 1. An eco-friendly composition for industrial and/or domestic applications comprising:(a) about 1.0% to about 5.0% of Sodium Carbonate;(b) about 0.1% to about 6.0% Potassium Hydroxide; and(c) about to 1.5% to about 6.0% Alkyl Polyglycosides.2. The eco-friendly composition for industrial and/or domestic applications of claim 1 , further comprising about 0.5% to about 3.5% APG.3. The eco-friendly composition for industrial and/or domestic applications of claim 2 , further comprising about 0.3% to about 3.5% TWEEN20.4. The eco-friendly composition for industrial and/or domestic applications of claim 2 , further comprising about 0.8% to about 2.2% STPP.5. The eco-friendly composition for industrial and/or domestic applications of claim 2 , further comprising about 0.4% to about 3.4% Sodium Bisulfate.6. The eco-friendly composition for industrial and/or domestic applications of claim 2 , further comprising about 0.01% to about 1.0% D-Limonene.7. The eco-friendly composition for industrial and/or domestic applications of claim 2 , further comprising about 0.01% to about 0.4% Potassium Sorbate.8. The eco-friendly composition for industrial and/or domestic applications of claim 7 , further comprising about 0.01% to about 0.1% Polysaccharide (Xantan).9. The eco-friendly composition for industrial and/or domestic applications of claim 7 , further comprising about 1.7% to about 12.0% Mono Propylene Glycol.10. The eco-friendly composition for industrial and/or domestic applications of claim 7 , further comprising about 0.01% to about 0.8% 1H-Benzotriazole methyl.11. The eco- ...

PHOTOACTIVATING DEVICE FOR WASHING MACHINE

Provided is a photoactivating device () for deployment in a washing machine for activating one or more photoactive components in a laundry treatment composition, comprising: a light source () configured for emission of light for activation of the one or more photoactive components; a controller (), and a switch and/or a motion sensing unit (), wherein the controller () is configured to control the light source () responsive to the switch and/or signals received from the motion sensing unit (). 1. A photoactivating device for deployment in a washing machine for activating one or more photoactive components in a laundry treatment composition , comprising:a light source configured for emission of light for activation of the one or more photoactive components,a controller, anda switch and/or a motion sensing unit, wherein the controller is configured to control the light source responsive to the switch and/or signals received from the motion sensing unit, andoptionally wherein photoactivating device further comprises:a body defining a cavity for receiving and retaining the laundry treatment composition, andan opening to the cavity configured for receiving the laundry treatment composition.2. The photoactivating device according to claim 1 , wherein the controller is configured to control the light source responsive to signals received from the motion sensing unit indicative of a fixed position and/or orientation of the photoactivating device relative to one or more laundry articles in the washing machine claim 1 , optionally wherein the controller is configured to reduce light emitted by the light source responsive to a centrifugal acceleration measured by the motion sensing unit of at least 20 m/s.3. The photoactivating device according to claim 1 , wherein the controller is configured to reduce light emitted by the light source when signals of motion sensing unit correspond to a period of non-activation of a washing machine agitation unit configured to induce movement ...

Detergent compositions containing pyridinol-n-oxide compositions

This disclosure relates to detergent compositions containing pyridinol-N-oxide compounds and being substantially free of bleach. Methods for treating a stained fabric using such detergent compositions are also disclosed.

Cleaning composition and cleaning method using the same

A cleaning composition for removing post-etch or post-ash residues from a semiconductor substrate, and a cleaning method using the same are disclosed. The cleaning composition can comprise water; a fluorine compound; an alkanolamine compound; and a corrosion inhibitor. The corrosion inhibitor is a mixture of a first corrosion inhibitor and a second corrosion inhibitor. When using the cleaning composition, it is possible to efficiently remove the residues of various aspects existing on a surface of the substrate or the semiconductor device without damage to a substrate or a semiconductor device including various metal layers, insulating layers, etc. Accordingly, when a highly integrated and miniaturized semiconductor device is manufactured, it may be advantageously applied to the removal of residues generated on the surface of the substrate or the semiconductor device.

CLEANING COMPOSITION AND CLEANING METHOD FOR COMPONENT OF SEMICONDUCTOR MANUFACTURING PROCESS CHAMBER

Provided is a cleaning composition for a component of a semiconductor manufacturing process chamber including: a foaming agent; an oxidizing agent; and an acidic compound, in which a value of (Number of moles of the acidic compound contained in the cleaning composition×acid valence of the acidic compound)/(Number of moles of the foaming agent contained in the cleaning composition×Base valence of the foaming agent) is more than 0.1 and less than 1.5.

CLEANING AGENT COMPOSITION AND CLEANING METHOD

A cleaning agent composition for use in removal of a polysiloxane adhesive remaining on a substrate, the composition containing a tetrahydrocarbylammonium fluoride and an organic solvent, wherein the organic solvent contains an alkylene glycol dialkyl ether and a lactam compound represented by formula (1). 110-. (canceled)12. The cleaning agent composition according to claim 11 , wherein the lactam compound includes at least one member selected from N-methyl-2-pyrrolidone and N-ethyl-2-pyrrolidone.13. The cleaning agent composition according to claim 11 , wherein the alkylene glycol dialkyl ether includes at least one member selected from among ethylene glycol dimethyl ether claim 11 , ethylene glycol diethyl ether claim 11 , ethylene glycol dipropylethane claim 11 , ethylene glycol dibutyl ether claim 11 , propylene glycol dimethyl ether claim 11 , propylene glycol diethyl ether claim 11 , and propylene glycol dipropyl ether.14. The cleaning agent composition according to claim 11 , wherein the tetrahydrocarbylammonium fluoride includes at least one member selected from among tetramethylammonium fluoride claim 11 , tetraethylammonium fluoride claim 11 , tetrapropylammonium fluoride claim 11 , and tetrabutylammonium fluoride.15. The cleaning agent composition according to claim 11 , wherein the ratio by mass of the alkylene glycol dialkyl ether to the lactam compound (alkylene glycol dialkyl ether:lactam compound) is 30:70 to 80:20.16. The cleaning agent composition according to claim 11 , wherein the lactam compound includes at least one member selected from N-methyl-2-pyrrolidone and N-ethyl-2-pyrrolidone; the alkylene glycol dialkyl ether includes at least one member selected from among ethylene glycol dimethyl ether claim 11 , ethylene glycol diethyl ether claim 11 , ethylene glycol dipropylethane claim 11 , ethylene glycol dibutyl ether claim 11 , propylene glycol dimethyl ether claim 11 , propylene glycol diethyl ether claim 11 , and propylene glycol dipropyl ...

Automatic Dishwashing Composition Comprising Metal Corrosion Inhibitors and Bleaches

An automatic dishwashing product comprising a bleaching agent and a compound in accordance with formula (1) or a salt or tautomer thereof, wherein A and B are independently selected from the group consisting of H, OR, and NHR, wherein Rand Rare independently selected from the group consisting of H and C-Calkyl, with the proviso that A and B are not both H and are not both OH. 2. The automatic dishwashing product according to claim 1 , wherein A is OH and B is NH claim 1 , or wherein A is NHand B is OH.5. The automatic dishwashing product according to claim 3 , wherein X is OH.6. The automatic dishwashing product according to claim 1 , wherein the bleaching agent and the compound in accordance with formula (1) claim 1 , or salt or tautomer thereof claim 1 , are present in a weight ratio of from 20:1 to 500:1.7. The automatic dishwashing product according to claim 1 , wherein the bleaching agent is an oxygen-releasing bleaching agent.8. The automatic dishwashing product according to claim 1 , wherein the product has a pH of less than 11.5 at 1 wt % aqueous solution at 20° C.9. The automatic dishwashing product according to claim 1 , the automatic dishwashing product further comprising:one or more builders, and/orone or more surfactants, and/orone or more enzymes.10. The automatic dishwashing product according to claim 1 , wherein the product is:in a unit dose form; and/orhoused within a water soluble or water dispersible film or container, preferably a polyvinyl alcohol film or container.11. A method of automatic dishwashing claim 1 , the method comprising:supplying a product to an automatic dishwasher; andreleasing the product or a portion thereof into a wash cycle of the automatic dishwasher, the product comprising a bleaching agent, and a compound having a structure in accordance with formula (1) or (2) or a salt or tautomer thereof.12. The method according to claim 11 , wherein the automatic dishwasher contains silverware and/or copperware.13. The method according ...

Microbicidal composition comprising an isothiazolone and an amine oxide

The present invention relates to a microbicidal composition in the form of a concentrate and to the use of the composition for the preservation of technical and domestic products, preferred for the preservation of wet wipes.

AUTOMATIC DISHWASHING METHOD

A method of cleaning soiled ware in a dishwasher the method having the step of using a water-soluble pouch, the pouch comprising a phosphate-free cleaning composition wherein the cleaning composition comprises loose powder and the composition comprises bleach, metal bleach catalyst and a complexing agent and wherein the complexing agent is slowly released as compared to the bleach catalyst. 1. A method of cleaning soiled ware in a dishwasher , using a program comprising a cleaning cycle of length t , the method comprising the step of using a water-soluble pouch , the pouch comprising a phosphate-free cleaning composition wherein the cleaning composition comprises loose powder and the composition comprises bleach , metal bleach catalyst and a complexing agent selected from the group consisting of methylglycine-N ,N-diacetic acid (MGDA) , glutamic acid-N ,N-diacetic acid (GLDA) , iminodisuccinic acid (IDS) , citric acid , aspartic acid-N ,N-diacetic acid (ASDA) , their salts and mixtures thereof and wherein:i) at least 90% by weight of the bleach catalyst is delivered into the cleaning cycle in less than 1/10 t; andii) at least 20% by weight of the complexing agent is delivered into the cleaning cycle later than ⅓ t and preferably more than 10% and less than 50% by weight of the complexing agent is delivered in less than ⅕ t.2. A method according to wherein less than 60% by weight of the complexing agent is delivered into the cleaning cycle before ⅓ t.3. A method according to wherein at least 40% by weight of the complexing agent is delivered into the cleaning cycle later than ½ t and preferably before ⅔ t.4. A method according to wherein at least 50% by weight of the complexing agent is delivered into the cleaning cycle at a time equal or later than ½ t and preferably before ⅔ t.5. A method according to wherein the complexing agent is delivered at regular intervals.6. A method according to wherein the complexing agent comprises MGDA.7. A method according to wherein ...

Dioxirane compounds and uses thereof

A dioxirane-containing compound has a first substituent that is an alkyl, polyalkoxy, aryl, heteroaryl, or heterocyclyl group, and a second substituent that is an electron withdrawing group, and where the first and second substituents can optionally join to form a cycloalkyl or heterocyclyl group. The dioxirane-containing compound can be used as an oxidant, surfactant, and/or an ionic liquid.

TiN Hard Mask And Etch Residual Removal

Composition, method and system for PVD TiN hard mask removal from 28/20 nm pattern wafers have been disclosed. The composition uses peroxide as oxidizing agent for PVD TiN hard mask removal under slightly basic conditions. The composition comprises bulky or long chain organic amines or polyalkylamine to improve removal/etching selectivity of PVD TiN vs CVD TiN. The composition further comprises long chain organic acids or amines to maintain Co compatibility. 2. The composition of claim 1 , wherein the peroxide is selected from the group consisting of hydroxide peroxide claim 1 , ammonium persulfate claim 1 , peracidic acid claim 1 , peroxybenzoic acid claim 1 , and combinations thereof.3. The composition of claim 2 , wherein the peroxide is hydroxide peroxide.4. The composition of claim 1 , wherein the base is selected from the group consisting of tetraethylammonium hydroxide(TEAH) claim 1 , trimethylphenylammonium hydroxide claim 1 , tetramethylammonium hydroxide claim 1 , tetrabutylammonium hydroxide claim 1 , choline hydroxide claim 1 , ammonium hydroxide claim 1 , and combinations thereof.5. The composition of claim 4 , wherein the base is tetraethylammonium hydroxide.6. The composition of claim 1 , wherein the weak acid is carboxylic acid selected from the group consisting of citric acid claim 1 , oxalic acid claim 1 , malonic acid claim 1 , lactic acid claim 1 , adipic acid claim 1 , acetic acid claim 1 , iminodiacetic acid claim 1 , and combinations thereof.7. The composition of claim 6 , wherein the weak acid is citric acid.8. The composition of claim 1 , wherein the ammonium salt is selected from the group consisting of ammonium salts of weak bases and include ammonium citrate claim 1 , ammonium acetate claim 1 , ammonium malonate claim 1 , ammonium adipate claim 1 , ammonium lactate claim 1 , ammonium iminodiacetate claim 1 , ammonium chloride claim 1 , ammonium bromide claim 1 , ammonium fluoride claim 1 , ammonium bifluoride claim 1 , ammonium sulfate ...

CLEANING SOLUTION AND CLEANING METHOD

There is provided a cleaning liquid for semiconductor substrates having undergone CMP, the cleaning liquid being excellent in storage stability. In addition, there is provided a method of cleaning semiconductor substrates having undergone CMP. The cleaning liquid for semiconductor substrates having undergone CMP shows alkaline properties and contains: an amine compound that is at least one selected from the group consisting of a primary amine, a secondary amine, a tertiary amine, and their salts; a chelating agent; and water. The amine compound content is not less than 25.5 mass % and less than 90 mass % based on the total mass of the cleaning liquid, and the water content is 10 to 60 mass % based on the total mass of the cleaning liquid. 1. A cleaning liquid for semiconductor substrates having undergone a chemical mechanical polishing process , an amine compound that is at least one selected from the group consisting of a primary amine, a secondary amine, a tertiary amine, and their salts;', 'a chelating agent; and', 'water,, 'wherein the cleaning liquid shows alkaline properties and comprisinga content of the amine compound is not less than 25.5 mass % and less than 90 mass % based on a total mass of the cleaning liquid, anda content of the water is 10 to 60 mass % based on the total mass of the cleaning liquid.2. The cleaning liquid according to claim 1 ,wherein the cleaning liquid has a pH of 8.0 to 12.0 at 25° C.3. The cleaning liquid according to claim 1 ,wherein a first acidity constant of a conjugated acid of the amine compound is not less than 7.0.4. The cleaning liquid according to claim 1 ,wherein the amine compound contains an amino alcohol.5. The cleaning liquid according to claim 4 ,wherein the amino alcohol has a primary amino group.6. The cleaning liquid according to claim 4 ,wherein the cleaning liquid contains two or more amino alcohols.7. The cleaning liquid according to claim 4 ,wherein the amino alcohol has a quaternary carbon atom situated at α ...

STRIPPER COMPOSITION FOR REMOVING PHOTORESISTS AND METHOD FOR STRIPPING PHOTORESISTS USING THE SAME

The present invention relates to a stripper composition for removing photoresists which comprises: a chained amine compound having a weight average molecular weight of more than 95 g/mol; a chained amine compound having a weight average molecular weight of not more than 90 g/mol; a cyclic amine compound; an amide-based compound in which a linear or branched alkyl group having 1-5 carbon atoms is mono- or di-substituted with nitrogen; and a polar organic solvent, wherein the weight ratio of the chained amine compound having a weight average molecular weight of more than 95 g/mol to the chained amine compound having the weight average molecular weight of not more than 90 g/mol is 1:1 to 1:10, and a method for stripping a photoresist using the same. 1. A stripper composition for removing photoresists which comprises: a chained amine compound having a weight average molecular weight of more than 95 g/mol; a chained amine compound having a weight average molecular weight of not more than 90 g/mol; a cyclic amine compound; an amide-based compound in which a linear or branched alkyl group having 1-5 carbon atoms is mono- or di-substituted with nitrogen; and a polar organic solvent ,wherein the weight ratio of the chained amine compound having a weight average molecular weight of more than 95 g/mol to the chained amine compound having the weight average molecular weight of not more than 90 g/mol is 1:1 to 1:10.2. The stripper composition for removing photoresists of claim 1 ,which comprises 0.1 to 10% by weight of the chained amine compound having a weight average molecular weight of more than 95 g/mol; 0.5 to 20% by weight of the chained amine compound having a weight average molecular weight of not more than 90 g/mol; 0.1 to 10% by weight of the cyclic amine compound; 10 to 85% by weight of the amide-based compound in which a linear or branched alkyl group having 1-5 carbon atoms is mono- or di-substituted with nitrogen; and 10 to 85% by weight of the polar organic ...

LAUNDRY CARE COMPOSITIONS, METHODS, AND TEST KITS FOR DETERMINING AUTHENTICITY

The present disclosure provides a laundry care composition having at least one laundry care ingredient and at least one leuco composition conforming to Formula (I): 1. A laundry care composition comprising at least one laundry care ingredient and at least one leuco composition conforming to Formula (I):{'br': None, 'sup': 1', '2', '3, 'ArArArCH\u2003\u2003(I)'}{'sup': 2', '3', '1, 'wherein Arand Arare independently a carbocyclic aryl or heteroaryl, and wherein Aris selected from the group consisting of: unsubstituted phenyl, electron deficient carbocyclic aryl, and heteroaryl.'}2. The laundry care composition of claim 1 , wherein Aris selected from the group consisting of unsubstituted phenyl claim 1 , nitro-substituted carbocyclic aryl claim 1 , furan claim 1 , thiophene claim 1 , pyridine claim 1 , and indole.3. The laundry care composition of claim 2 , wherein Aris furan.4. The laundry care composition of claim 1 , wherein at least one of Arand Aris a phenyl ring substituted with an electron donating group.5. The laundry care composition of claim 4 , wherein the electron-donating group is a substituted amine covalently bonded to the phenyl ring at a position para to the carbon atom connecting the three Ar groups.6. The laundry care composition of claim 5 , wherein Arand Arare phenyl rings with independently selected substituted amines covalently bonded to each phenyl ring at a position para to the carbon atom connecting the three Ar groups.7. The laundry care composition of claim 6 , wherein the substituted amines conform to the formula —NRR claim 6 , and wherein each Rand Rare independently selected from the group consisting of: H claim 6 , Cbranched alkyl claim 6 , Clinear alkyl claim 6 , Csubstituted branched alkyl claim 6 , Csubstituted linear alkyl claim 6 , Csubstituted alkaryl claim 6 , Cunsubstituted alkaryl claim 6 , polyoxyalkylene claim 6 , and mixtures thereof.8. The laundry care composition of claim 7 , wherein at least one Rand Ris a polyoxyalkylene ...

PROCESS OF REDUCING MALODORS ON FABRICS

The present invention relates to a process for reducing malodors on fabrics using a detergent composition containing an antioxidant and use of said antioxidant and said process. 2. The process according to claim 1 , wherein the metal ions are Cu.3. The process according to claim 1 , wherein the wash liquor diluted in water by a factor of between 300-fold and 900-fold.4. The process according to claim 1 , wherein the laundry detergent composition comprises from 0.025% to 1.5% by weight of the laundry detergent composition of an alkylated phenol antioxidant claim 1 , a hindered phenol antioxidant claim 1 , or mixtures thereof.5. The process according to claim 1 , wherein at least one of said antioxidants has a log D value at pH 7 equal to or greater than 3.506. The process according to claim 1 , wherein the metal ion is introduced to the wash liquor by being present on the fabric prior to contacting with the wash liquor claim 1 , being present in the water used to make the wash liquor claim 1 , or a mixture thereof.7. The process according to claim 1 ,a. wherein the fabrics are washed in the wash liquor at a temperature of between 10° C. and 35° C.;b. wherein the wash operation in step b takes between 5 minutes and 30 minutes;c. or a mixture thereof.8. The process according to claim 1 , wherein the antioxidant is selected from the group consisting of 2 claim 1 ,6-bis(1-methylpropyl)phenol; 2 claim 1 ,6-bis(1 claim 1 ,1-dimethylethyl)-4-methyl-phenol; 2-(1 claim 1 ,1-dimethylethyl)-1 claim 1 ,4-benzenediol; 2 claim 1 ,4-bis(1 claim 1 ,1-dimethylethyl)-phenol; 2 claim 1 ,6-bis(1 claim 1 ,1-dimethylethyl)-phenol; 3 claim 1 ,5-bis(1 claim 1 ,1-dimethylethyl)-4-hydroxy-benzenepropanoic acid claim 1 , methyl ester; 2-(1 claim 1 ,1-dimethylethyl)-4-methylphenol; 2-(1 claim 1 ,1-dimethylethyl)-4 claim 1 ,6-dimethyl-phenol; 3 claim 1 ,5-bis(1 claim 1 ,1-dimethylethyl)-4-hydroxybenzenepropanoic acid claim 1 , 1 claim 1 ,1′-[2 claim 1 ,2-bis[[3-[3 claim 1 ,5-bis(1 claim 1 ,1- ...

Composition and Method for Treating Water Systems

A solid composition for treating cooling or heated water systems to remove scale, microorganisms and biofilm, and corrosion by-products. The composition for cooling towers and chilled water systems comprises chelating agents and an anionic surfactant. The composition for boilers and heated water systems comprises a sulfite, neutralizing amines, sodium phosphate, a polymethacrylate or polyacrylate polymer. A method for using such a treatment composition comprises contacting the treatment composition with substantially all parts of the water system.

Substance for Removing Oils from Soil and Hard Surfaces, and Method for Using Said Substances (Variants)

The claimed group of inventions relates to the field of organic chemistry and can be used for removing oils, including petroleum, fuel oil, fuels, hydrocarbons and liquid fuel, from soil; and can also be used for processing and gathering petroleum, oils, fuel oil, fuels, hydrocarbons and other petroleum products from hard surfaces, for example, from the inner surfaces of tanks for storing petroleum or petroleum products, of equipment used during the recovery, re-processing and transportation of petroleum, of equipment used for producing petroleum products, drilling sludge, gravel or sand in storage facilities, or from other hard surfaces. The substance for removing oils, including petroleum and petroleum products, from soil and hard surfaces is in the form of an aqueous solution of a natural polysaccharide and a surfactant. Unlike the prototype, microgels of polysaccharides having a molecular mass of 20 000 to 200 000 daltons and a particle size of 10 to 1000 nm are used as a natural polysaccharide; furthermore, the overall concentration of the microgels of the polysaccharides and the surfactant in the aqueous solution is at least 0.05 g/l, while the ratio of the microgels of the polysaccharides to the surfactant is in the range of 100:1 to 1:100. The claimed group of inventions makes it possible to achieve an increase in the effectiveness of the removal of oils, including petroleum and petroleum products, from hard surfaces or soil; a decrease in the specific consumption of the reagents while simultaneously increasing the environmental safety of the process of removing oils from hard surfaces or soil, and providing for the possibility of re-using the oils removed from the soil and the hard surfaces, and also the surfactants. 112.-. (canceled)13. A product for cleaning soil or hard surfaces in the form of a water solution of a natural polysaccharide and a surface-active agent , comprising:polysaccharide microgels having a molecular mass of 20,000 to 200,000 D and a ...

Cleaning Compositions

A composition comprises a bleach and an optical brightener, wherein the optical brightener is selected from the substance class(es) of benzonitrile, benzoxazole, benzopyrazol as well as their derivatives and substituted compounds. The optical brightener is present in an amount of 0.001 to 1 wt %, e.g. 0.08 wt %. The composition comprises a nonionic surfactant in a ratio by weight to the optical brightener is from around 5:1 to 1000:1. 1. A composition comprising:a bleach;a nonionic surfactant; andan optical brightener;wherein the optical brightener is selected from the group consisting of benzonitrile, benzoxazole, benzopyrazole, their derivatives and substituted compounds;wherein the optical brightener is present in an amount of from 0.001 to 1 wt % of the composition; andwherein the nonionic surfactant is present in a ratio by weight to the optical brightener from around 5:1 to 1000:1.3. A method comprising washing fabric in the presence of an amount of the composition of .4. The method according to claim 4 , wherein the fabric comprises a synthetic material.8. The method according to claim 4 , wherein the synthetic material is selected from the group consisting of polyamide and polyester.9. A composition comprising:a bleach;a nonionic surfactant; anda first optical brightener;wherein the optical brightener is present in an amount of from approximately 0.001 to approximately 1 wt % of the composition; andwherein the nonionic surfactant is present in a ratio by weight to the optical brightener from approximately 5:1 to approximately 1000:1.10. The composition according to further comprising a second optical brightener different than the first optical brightener claim 9 , the second optical brightener comprising a stilbene brightener.11. The composition according to claim 10 , wherein the first optical brightener is selected from the group consisting of benzonitrile claim 10 , benzoxazole claim 10 , benzopyrazole claim 10 , their derivatives and substituted ...

OPHTHALMIC CONTACT LENS SOLUTIONS CONTAINING FORMS OF VITAMIN B

The present invention relates to improved ophthalmic solutions that employ select B vitamins; pyridoxine and its salts; and thiamine and its salts in order to more effectively preserve solutions and to reduce the degree to which cationic preservatives will deposit on contact lenses. Ophthalmic solutions are here understood to include contact lens treatment solutions, such as cleaners, soaking solutions, conditioning solutions and lens storage solutions, as well as wetting solutions and in-eye solutions for treatment of eye conditions. 1. A contact lens solution comprising:at least 0.00001 weight percent of a cationic preservative selected from the group consisting of polyhexamethylene biguanide and polyquaternium-1;between 0.00001 and 10 weight percent of dexpanthenol that functions as a preservative enhancer;a physiologically compatible buffer selected from the group consisting of phosphate, bicarbonate, citrate, borate, ACES, BES, BICINE, BIS, BIS-Tris, BIS-Tris Propane, HEPES, HEPPS, imidazole, MES, MOPS, PIPES, TRIS, TAPS, TES, an amino acid, and Tricine;wherein the contact lens solution has a low chloride concentration of less than 0.1 mole percent chloride, and the combination of the polyhexamethylene biguanide, the dexpanthenol, and the low chloride concentration provide an enhanced preservative effect relative to a corresponding contact lens solution having a chloride concentration of more than 0.2 mole percent.2. The contact lens solution of claim 1 , wherein the cationic preservative is present in a concentration between 0.1 parts per million and 10 claim 1 ,000 parts per million.3. The contact lens solution of claim 1 , wherein the physiologically compatible buffer is BIS-Tris Propane.4. The contact lens solution of further comprising a wetting agent.5. The contact lens solution of claim 4 , wherein the wetting agent is selected from the group consisting of a polysorbate surfactant claim 4 , a polyoxyethylene surfactant claim 4 , a phosphonates claim 4 , ...

Cleaning and disinfecting composition

The disclosed invention relates to a two-part liquid composition for cleaning and disinfecting a substrate, comprising: (A) a disinfectant medium comprising peracetic acid; and (B) a supplemental medium comprising a non-enzymatic cleaner, a corrosion inhibitor, and a chelator. The supplemental medium (B) may further comprise an enzymatic cleaner, a surfactant, a buffer, a pH modifier, or a mixture of two or more thereof. The substrate may be a medical device, for example, an endoscope.

BLEACH ACTIVATOR HAVING A CATIONIC GROUP AND WASHING OR CLEANING AGENT CONTAINING SAME

The present invention relates to compounds which form, under perhydrolysis conditions, certain cationic organic peracids, to the use of said compounds for activating peroxygen compounds in the context of bleaching stains when washing textiles and cleaning hard surfaces, and to washing and cleaning agents that contain said compounds. 2. The bleach-activating compound of claim 1 , wherein the anion Xis selected from the group consisting of chloride claim 1 , bromide claim 1 , iodide claim 1 , tosylate claim 1 , mesylate claim 1 , triflate claim 1 , sulfate claim 1 , carbonate claim 1 , and phosphate.3. The bleach-activating compound of claim 1 , wherein in the hydrocarbon functional groups 1 or more non-adjacent carbon atoms not bonded to a heteroatom can be replaced by N claim 1 , O claim 1 , S and/or Se.6. The method according to claim 5 , wherein the anion Xis selected from the group consisting of chloride claim 5 , bromide claim 5 , iodide claim 5 , tosylate claim 5 , mesylate claim 5 , triflate claim 5 , sulfate claim 5 , carbonate claim 5 , and phosphate.7. The method according to claim 5 , wherein in the hydrocarbon functional groups 1 or more non-adjacent carbon atoms not bonded to a heteroatom can be replaced by N claim 5 , O claim 5 , S and/or Se.8. The method according to claim 5 , wherein the contact between the aqueous liquor and the textile to be washed or the hard surface to be cleaned is made at temperatures in the range of 20° C. to 40° C.9. The method according to claim 5 , wherein the contact between the aqueous liquor and the textile to be washed or the hard surface to be cleaned is made at temperatures in the range of 20° C. to 30° C.10. The method according to claim 5 , wherein the textile to be washed or the hard surface to be cleaned remains in contact with the aqueous liquor over a period of 20 minutes to 120 minutes.11. The method according to claim 5 , wherein the textile to be washed or the hard surface to be cleaned remains in contact with ...

Cleaning formulation for removing residues on surfaces

This disclosure relates to a cleaning composition that contains 1) hydroxylamine; 2) alkanolamine; 3) an alkylene glycol; 4) water. This disclosure also relates to a method of using the above composition for cleaning a semiconductor substrate.

WASH-DURABLE, FLUID ABSORBENT SUBSTRATE WITH ANTIMICROBIAL PROPERTIES AND/OR IMPROVED WASHABILITY, AND HYGIENE PRODUCT SUCH AS REUSABLE SANITARY NAPKIN

The present invention is directed to a substrate, in particular textile material to which one or more antimicrobial and/or hydrophilic and/or stain release agents are adhered. The agent(s) is/are adhered to the substrate in such a manner that they are not released from the textile even if the textile is wetted or washed, so that the textile is reusable. Washability and/or usability of the textile are improved where one or more hydrophilic and/or stain release agents are adhered to the textile. The substrate can be used, e.g., in a reusable sanitary napkin or other hygiene product. The structure of the hygiene product is disclosed, together with a process of attaching the different layers of the hygiene product together by ultrasonic welding. The invention further relates to a method of finishing a substrate by applying and binding antimicrobial and/or hydrophilic and/or stain release agents to the substrate so that the agents are essentially irreversibly adhered to the finished substrate. 123-. (canceled)24. A substrate to which one or more stain release agents and one or more antimicrobial agents are adhered , wherein{'i': Escherichia coli', 'Candida albicans, 'the substrate exhibits a reduction value of ATCC 25922 and ATCC 10231 measured in accordance with AATCC test method 100-2012 of at least 99% within 1 hour of contact time;'}the substrate has a stain release rating, measured in accordance with AATCC test method 130-2010, of at least grade 3;the substrate has a water repellency rating, measured in accordance with AATCC test method 22-2014, of at most 50;the substrate has an oil repellency rating, measured in accordance with AATCC test method 118-2013, of at most grade 1; andthe antimicrobial efficiency and the stain release rating are achieved even after at least 25 laundry washes in a laundry washing machine, for 10-15 minutes, using non-antimicrobial, non-ionic and non-chlorine containing laundry detergent.25. The substrate of claim 24 , wherein the ...

CLEANING LIQUID COMPOSITION

The purpose of the present invention is to provide a cleaning liquid composition useful in cleaning substrates, etc., which have undergone treatment such as chemical mechanical polishing (CMP) in a process for manufacturing electronic devices such as semiconductor elements. This cleaning liquid composition for cleaning substrates having Cu wiring includes one or more basic compounds and one or more heteromonocyclic aromatic compounds containing a nitrogen atom, and has a hydrogen ion concentration (pH) of 8-11. 110-. (canceled)11. A method for cleaning a semiconductor substrate , comprising a step of putting a substrate having Cu wiring in contact with a cleaning liquid composition comprising(a) choline;(b) one or more types of nitrogen atom-containing heteromonocyclic aromatic compound selected from histidine, histamine, or 3-amino-5-hydroxypyrazole;(c) triethanolamine;(d) one or more phosphonic acid-based chelating agents selected from the group consisting of nitrilotris(methylenephosphonic acid) (NTMP), and salts thereof; and(e) having a hydrogen ion concentration (pH) of 8 to 11.12. The method according to claim 11 , wherein it comprises a step of subjecting the substrate having Cu wiring to chemical mechanical polishing (CMP) prior to the step of putting a substrate having Cu wiring in contact.13. The method according to claim 11 , wherein the step of putting a substrate having Cu wiring in contact is a step of cleaning the substrate having Cu wiring.14. A method for dissolving a Cu-containing organic residue claim 11 , the method comprising a step of putting a Cu-containing organic residue in contact with a cleaning liquid composition comprising(a) choline;(b) one or more types of nitrogen atom-containing heteromonocyclic aromatic compound selected from histidine, histamine, or 3-amino-5-hydroxypyrazole;(c) triethanolamine;(d) one or more phosphonic acid-based chelating agents selected from the group consisting of nitrilotris(methylenephosphonic acid) (NTMP), ...

BLEACH ACTIVATOR WITH A CATIONIC GROUP AND WASHING OR CLEANING AGENT CONTAINING SAID BLEACH ACTIVATOR

The oxidizing and bleaching effect of peroxygen compounds at low temperatures was to be improved. This was substantially achieved through the use of organic peroxoacids under perhydrolysis conditions with compounds which form cationic groups and in which a quaternary nitrogen atom is part of a heterocyclic 5-membered functional group. 2. The bleach-activating compound of claim 1 , wherein the anion X is selected from the group consisting of chloride claim 1 , bromide claim 1 , iodide claim 1 , tosylate claim 1 , mesylate claim 1 , triflate claim 1 , sulfate claim 1 , carbonate claim 1 , and phosphate.3. The bleach-activating compound of claim 1 , wherein in the hydrocarbon functional groups 1 or more non-adjacent carbon atoms not bonded to a heteroatom can be replaced by N claim 1 , O claim 1 , S and/or Se.6. The method according to claim 5 , wherein the anion X is selected from the group consisting of chloride claim 5 , bromide claim 5 , iodide claim 5 , tosylate claim 5 , mesylate claim 5 , triflate claim 5 , sulfate claim 5 , carbonate claim 5 , and phosphate.7. The method according to claim 5 , wherein in the hydrocarbon functional groups 1 or more non-adjacent carbon atoms not bonded to a heteroatom can be replaced by N claim 5 , O claim 5 , S and/or Se.8. The method according to claim 5 , wherein the contact between the aqueous liquor and the textile to be washed or the hard surface to be cleaned is made at temperatures in the range of 20° C. to 40° C.9. The method according to claim 5 , wherein the contact between the aqueous liquor and the textile to be washed or the hard surface to be cleaned is made at temperatures in the range of 20° C. to 30° C.10. The method according to claim 5 , wherein the textile to be washed or the hard surface to be cleaned remains in contact with the aqueous liquor over a period of 20 minutes to 120 minutes.11. The method according to claim 5 , wherein the textile to be washed or the hard surface to be cleaned remains in contact ...

Butylpyrrolidone based cleaning agent for removal of contaminates from electronic and semiconductor devices

A composition effective for removing contaminates from an electronic device either as a concentrated material or when diluted with water. The composition designed for effective removal of undesirable contaminates from an electronic device, including but not limited to, solder flux and polymeric residues. The composition contains butylpyrrolidone and an alkali and has a pH of greater than 7.1 and a pKa less than 12. The composition may contain additional optional solvents and additives to enhance cleaning of articles or to impart other properties to the composition. The composition can be contacted with a surface to be cleaned in a number of ways and under a number of conditions depending on the manufacturing or processing variables present.

LAUNDRY PRODUCTS

Combination of reservoirs () providing segregated stocks of components for laundry products to enable a user to formulate multiple doses of laundry products on demand for supplying to a washing machine drum (), the combination comprises a first reservoir () containing a stock of a first composition containing a bleach component and a second reservoir () containing a stock of a second composition containing a component capable of initiating and/or promoting action of the bleach component in a subsequent wash/rinse cycle and, optionally, a stock of detergent provided in the second reservoir (b) or an optional third reservoir (). 1. A combination of reservoirs providing segregated multi-dose stocks of components for laundry products to enable a user to formulate doses of laundry products on demand for supplying to a washing machine drum , the combination comprising:a first reservoir containing a stock of a first composition containing a bleach component; anda second reservoir containing a stock of a second composition containing a source of alkalinity selected from alkali metal hydroxides, alkali metal carbonates, alkali metal bicarbonates, alkali metal silicates and alkanolamines wherein the first composition and/or second composition are in liquid form.2. The combination of reservoirs according to wherein the source of alkalinity is present in a total amount of 10 to 50 wt % based on the total weight of the second composition.3. The combination of reservoirs according to wherein the bleach component of the first composition comprises an oxygen bleach system.4. (canceled)5. The combination of reservoirs according to claim 1 , wherein the first composition comprises 0.1 wt % to 20 wt % claim 1 , preferably from 1 wt % to 20 wt % of bleach component claim 1 , based on the total weight of the composition.6. The combination of reservoirs according to claim 1 , wherein the first composition contains bleach component and at least one selected from (ia) fluorescer and (ib) ...

Solvent compositions for removing petroleum residue from a substrate and methods of use thereof

Water-soluble solvent compositions, including from about 10% to about 60% by weight of an aromatic ester; from about 30% to about 60% by weight of an aliphatic ester; from 0% to about 15% by weight of a co-solvent; from 0% to about 20% of one of a cyclic terpene and a terpenoid; from 0% to about 1% by weight of an odor-masking agent; and from 0% to about 20% by weight of a nonionic surfactant, for removing petroleum residue from a substrate, and methods of use thereof. The composition can further comprise water. The composition also can comprise an aqueous solution. The method for removing petroleum residue from a substrate can further comprise recycling the solvent composition by using a countercurrent separation column charged with compressed ammonia and/or carbon dioxide and a spinning band distillation column to separate the solvent composition from the petroleum residue.

COMPOSITION FOR CLEANING A HEAT TRANSFER SYSTEM HAVING AN ALUMINUM COMPONENT

Disclosed herein is a cleaner concentrate comprising: greater than 10 weight percent of a freezing point depressant, 0.5 to 35 weight percent of oxalic acid, and an azole compound, wherein weight percent is based on the total weight of the cleaner concentrate. 1. A heat transfer system conditioner comprising:a) water;b) a water soluble alkaline metal phosphate;c) one or more azole compounds; andd) optionally, a corrosion inhibitor, scale inhibitor, acid neutralizer, colorant, surfactant, antifoam, stop-leak agent, or combinations thereof.2. The conditioner of claim 1 , wherein the water soluble alkaline metal phosphate is sodium phosphate or potassium phosphate.3. The conditioner of claim 1 , wherein the water soluble alkaline metal phosphate is 0.2 to 15 wt %.4. The conditioner of claim 1 , wherein the one or more azole compounds are 0.05 to 5 wt %.5. The conditioner of claim 1 , wherein the stop-leak agent is attaclay or soybean meal.6. The conditioner of claim 1 , wherein the pH is greater than or equal to 7.5 at 15° to 25° C.7. The conditioner of claim 1 , wherein the pH is 8.5 to 11 at 15° to 25° C.8. A heat transfer system conditioner comprising:a) water;b) one or more azole compounds;c) an antifoam/surfactant;d) a water soluble polymer; ande) phosphoric acid.9. The conditioner of further comprising sodium hydroxide.10. The conditioner of further comprising a corrosion inhibitor.11. The conditioner of claim 10 , wherein the corrosion inhibitor is selected from the group consisting of an alkaline metal benzoate claim 10 , alkaline metal molybdate claim 10 , alkaline metal nitrite claim 10 , and combinations thereof.12. The conditioner of claim 11 , wherein the alkaline metal benzoate is sodium benzoate.13. The conditioner of claim 10 , wherein the corrosion inhibitor is magnesium nitrate.14. The condition of claim 8 , wherein the one or more azole compounds is sodium tolytriazole.15. The conditioner of claim 8 , wherein the antifoam/surfactant is nonionic.16. ...

CLEANING LIQUID COMPOSITION, METHOD FOR CLEANING SEMICONDUCTOR ELEMENT, AND METHOD FOR MANUFACTURING SEMICONDUCTOR ELEMENT

[Problems to be Solved] The object is to provide a cleaning liquid composition, which suppresses damage to a low-dielectric constant interlayer dielectric film, a wiring material, such as copper or a copper alloy, a barrier metal, and a barrier dielectric film and removes an organosiloxane thin film, a dry etching residue and a photoresist on a treatment target surface in a process for producing a semiconductor device, as well as a cleaning method for a semiconductor device using the same, and a production process for a semiconductor device using the same. 1. A cleaning liquid composition for producing a semiconductor device comprising:0.05 to 25% by weight of a quaternary ammonium hydroxide,0.001 to 1.0% by weight of potassium hydroxide,5 to 85% by weight of a water-soluble organic solvent, and0.0005 to 10% by weight of pyrazoles.2. The cleaning liquid composition according to claim 1 , wherein the quaternary ammonium hydroxide is one or more kinds selected from the group consisting of tetramethylammonium hydroxide claim 1 , tetraethylammonium hydroxide claim 1 , tetrapropylammonium hydroxide claim 1 , tetrabutylammonium hydroxide claim 1 , and choline.3. The cleaning liquid composition according to claim 1 , wherein the water-soluble organic solvent is one or more kinds selected from the group consisting of alcohols selected from ethanol claim 1 , 2-propanol claim 1 , ethylene glycol claim 1 , propylene glycol claim 1 , glycerine claim 1 , diethylene glycol claim 1 , xylitol claim 1 , and sorbitol; glycol ethers selected from diethylene glycol monomethyl ether claim 1 , diethylene glycol monoethyl ether claim 1 , diethylene glycol monobutyl ether claim 1 , diethylene glycol dimethyl ether claim 1 , dipropylene glycol monomethyl ether claim 1 , and dipropylene glycol monopropyl ether; amides selected from N claim 1 ,N-dimethyl formamide claim 1 , N claim 1 ,N-dimethyl acetamide claim 1 , and N-methyl-2-pyrrolidone; dimethyl sulfoxide; and 1 claim 1 ,3-dimethyl-2- ...

CLEANING COMPOSITIONS FOR REMOVING POST ETCH RESIDUE

The disclosure relates to a cleaning composition that aids in the removal of post-etch residues in the production of semiconductors. There is provided a stock composition comprising: a tetraalkylammonium hydroxide base or a quaternary trialkylalkanolamine base; a corrosion inhibitor; and a combination of at least two or more polyprotic acids or salts thereof, wherein at least one said polyprotic acid or salt thereof contains phosphorous. 120-. (canceled)21. A stock composition comprising:a tetraalkylammonium hydroxide base or a quaternary trialkylalkanolamine base;a corrosion inhibitor; anda combination of at least two or more polyprotic acids or salts thereof, wherein at least one said polyprotic acid or salt thereof contains phosphorous.22. The composition of claim 21 , wherein said combination of at least two or more polyprotic acids or salts thereof comprises phosphoric acid claim 21 , a phosphonic acid claim 21 , or a salt thereof.23. The composition of claim 21 , wherein said combination of at least two or more polyprotic acids or salts thereof comprises phosphoric acid claim 21 , a diphosphonic acid or a combination thereof.24. The composition of claim 21 , wherein said combination of at least two or more polyprotic acids or salts thereof comprises a polycarboxylic acid or salt thereof.25. The composition of claim 24 , wherein the polycarboxylic acid or salt thereof comprises one or more of oxalic and an alkyldiaminetetraacetic acid.26. The composition of comprising an oxidizer comprising a heterocyclic amine N-oxide.27. The composition of claim 26 , wherein the tetraalkylammonium hydroxide base or a quaternary trialkylalkanolamine base and oxidizer comprising heterocyclic amine N-oxide together make up between 10 wt % and 35 wt % of the composition.28. The composition of claim 26 , wherein the heterocyclic amine N-oxide is present in an amount of from 5 wt % to 15 wt %.29. The composition of claim 26 , wherein the heterocyclic amine N-oxide comprises 4- ...

PROCESS SOLUTION COMPOSITION FOR POLYMER TREATMENT

The present disclosure relates to a process solution composition for polymer treatment comprising: a fluorine compound; a ketone-based solvent; and a polar aprotic solvent, wherein the ketone-based solvent is one or more selected from the group consisting of compounds represented by Chemical Formula 1 or Chemical Formula 2, and has an effect capable of preventing damage to various types of metals while improving the power of removing an adhesive polymer remaining on the wafer circuit surface in a semiconductor manufacturing process. 2. The process solution composition of claim 1 , wherein the ketone-based solvent includes a compound having the sum of carbon atoms of 3 or more and 30 or less.3. The process solution composition of claim 1 , wherein the ketone-based solvent and the polar aprotic solvent have a mixing ratio of 1:9 to 9:1.4. The process solution composition of claim 1 , wherein the mixed solvent of the ketone-based solvent and the polar aprotic solvent has a Hansen solubility parameter value range satisfying the following:{'sub': 'D', 'sup': '1/2', 'δ: 15.5 to 19.0 [MPa]'}{'sub': 'P', 'sup': '1/2', 'δ: 7.5 to 15.5 [MPa]'}{'sub': 'H', 'sup': '1/2', 'δ: 4.5 to 9.5 [MPa]'}5. The process solution composition of claim 1 , wherein the ketone-based solvent is one or more selected from 2-butanone claim 1 , dicyclopropyl ketone claim 1 , cyclopropyl methyl ketone claim 1 , cyclopentanone claim 1 , cyclohexanone claim 1 , cycloheptanone claim 1 , 3-pentanone claim 1 , 2-pentanone claim 1 , 3-methyl-2-pentanone claim 1 , acetylacetone claim 1 , 4-methyl-2-pentanone claim 1 , 2-methyl-3-pentanone claim 1 , 3-hexanone claim 1 , 2-hexanone claim 1 , dicycloketone claim 1 , 1-cyclopentylethanone claim 1 , 3-methyl-2-hexanone claim 1 , 2-methyl-3-hexanone claim 1 , isoamyl ketone claim 1 , amyl ketone claim 1 , 4-heptanone claim 1 , 3-heptanone claim 1 , 2-heptanone claim 1 , 5-nonanone claim 1 , 2 claim 1 ,4-dimethyl-3-pentanone claim 1 , ethyl isobutyl ketone claim 1 ...

POST CMP CLEANING COMPOSITION

The disclosure generally relates to a composition and process for cleaning residue and/or contaminants from microelectronic devices having said residue and contaminants thereon. The residue may include post-CMP, post-etch, and/or post-ash residue. The compositions and methods are particularly advantageous when cleaning a microelectronic surface comprising copper, low-k dielectric materials, and barrier materials comprising at least one of tantalum-containing material, cobalt-containing material, tantalum-containing, tungsten-containing, and ruthenium-containing material. 1. A composition comprising(i) at least one etchant material chosen from amines and complexing agents, (ii) at least one cleaning additive chosen from ethylene oxide/propylene oxide block copolymers, dodecyl trimethyl ammonium hydroxide, Cocamidopropyl Betaine, polyglycol ethers, and fatty amine quaternary ammonium salts, and combinations thereof,(iii) at least one organic additive,(iv) at least one corrosion inhibitor,(v) at least one pH adjuster, and optionally(vi) at least one water soluble polymer,wherein said composition has a pH of greater than about 8.2. The composition of claim 1 , wherein the pH is about 8 to about 14.3. The composition of claim 1 , wherein the pH is about 9 to about 13.9.4. The composition of claim 1 , wherein the etchant material is chosen from monoethanolamine claim 1 , diglycolamine claim 1 , and dimethanolamine.5. The composition of claim 1 , wherein the etchant material is chosen from compounds of the formula NRRR claim 1 , wherein R claim 1 , Rand Rmay be the same as or different from one another and are chosen from hydrogen claim 1 , straight-chain or branched C-Calkyl groups claim 1 , straight-chain or branched C-Chydroxyalkyl groups claim 1 , and C-Calkyl ethers of straight chain or branched C-Chydroxyalkyl groups.6. The composition of claim 1 , wherein the etchant material is chosen from aminoethylethanolamine claim 1 , N-methylaminoethanol claim 1 , ...

OILFIELD CLEANER AND CORROSION INHIBITOR

Disclosed herein are cleaner/corrosion inhibiting compositions useful in applications relating to the production, transportation, storage, and separation of crude oil and natural gas. Also disclosed herein are methods of using the compositions as cleaners/corrosion inhibitors, particularly in applications relating to the production, transportation, storage, and separation of crude oil and natural gas. 128.-. (canceled)30. The composition of wherein the polyamine sulfonic acid salt component is formed by reaction of a polyamine component with a sulfonic acid component.31. The composition of claim 30 , wherein the polyamine component comprises a polyalkylene polyamine claim 30 , wherein the polyalkylene polyamine comprises a polyethylene polyamine claim 30 , a polypropylene polyamine claim 30 , a polybutylene polyamine claim 30 , or a combination thereof.32. The composition of claim 31 , wherein the polyamine component comprises a mixture of tetraethylenepentamine (TEPA) claim 31 , pentaethylenehexamine (PEHA) claim 31 , and hexaethyleneheptamine (HEHA).33. The composition of claim 30 , wherein the sulfonic acid component is selected from the group consisting of an aryl sulfonic acid claim 30 , an alkyl sulfonic acid claim 30 , an arylalkyl sulfonic acid claim 30 , and a combination thereof.34. The composition of claim 29 , wherein the polyamine sulfonic acid salt component comprises a salt selected from the group consisting of:a tetraethylenepentamine dodecylbenzenesulfonic acid salt;a pentaethylenehexamine dodecylbenzenesulfonic acid salt;a hexaethyleneheptamine dodecylbenzenesulfonic acid salt;and a combination thereof.35. The composition of claim 29 , wherein the corrosion inhibitor comprises the imidazoline of Formula (I) or the imidazolinium salt of Formula (II) claim 29 , Ris an alkyl mixture typical in tall oil fatty acid (TOFA) claim 29 , Ris benzyl claim 29 , Rand Rare each hydrogen claim 29 , Ris hydroxyethyl claim 29 , and X is chloride.36. The composition ...

DETERGENT COMPOSITION

A substantially builder-free low-pH automatic dishwashing detergent composition comprising a buffer, an enzyme and an iron chelant and wherein the composition has a pH as measured in 1% weight aqueous solution at 25° C. of from about 5 to about 7.5. 1. A substantially builder-free low-pH automatic dishwashing detergent composition comprising a buffer , an enzyme and an iron chelant and wherein the composition has a pH as measured in 1% weight aqueous solution at 25° C. of from about 5 to about 7.5.2. A composition according to having a pH of from about 5 to less than about 6.9 as measured in 1% weight aqueous solution at 25° C.3. A composition according to wherein the buffer comprises a polycarboxylic acid claim 1 , its salt or a mixture thereof.4. A composition according to wherein the iron chelant is selected from the group consisting of siderophores claim 1 , catechols claim 1 , catechol sulfonates claim 1 , enterobactin claim 1 , hydroxamates claim 1 , hydroxypyridinones (or hydroxypyridine N-Oxides) and mixtures thereof.5. A composition according to wherein the iron chelant comprises a catechol sulfonate claim 1 , preferably 1 claim 1 ,2-dihydroxybenzene-3 claim 1 ,5-disulfonic acid.6. A composition according to wherein the iron chelant comprises a hydroxypyridine N-Oxide claim 1 , preferably 2-pyridinol 1 oxide.7. A composition according to comprising from about 0.1% to about 5% by weight of the composition of the iron chelant.8. A composition according to wherein the composition is free or substantially free of bleach.9. A composition according to comprising from about 0.5% to about 5% by weight of the composition of bleach.10. A composition according to comprising bleach and iron chelant in a weight ratio of from 10:1 to 1:1.11. A composition according to further comprising a crystal growth inhibitor.12. A composition according to wherein the composition comprises a performance polymer.13. A composition according to wherein the composition comprises the ...

Method of automatic dishwashing

A method of washing dishware and tableware in a dishwasher using a low temperature program comprising the step of subjecting the ware during the main wash of the automatic dishwasher to a wash liquor comprising a low pH detergent composition, the composition having a pH as measured in 1% weight aqueous solution at 25° C. of from about 5 to about 7.5, and wherein the temperature of the main wash is 50° C. or less. 1. A method of washing dishware and tableware in a dishwasher using a low temperature program comprising the step of subjecting the ware during the main wash of the automatic dishwasher to a wash liquor comprising a low pH detergent composition , the composition having a pH as measured in 1% weight aqueous solution at 25° C. of from about 5 to about 7.5 , and wherein the temperature of the main wash is 50° C. or less.2. A method according to wherein the temperature of the main wash is 40° C. or less.3. A method according to wherein the length of the main wash is 20 minutes or less.4. A method according to wherein the composition is substantially builder-free.5. A method according to wherein the composition comprises a buffer.6. A method according to wherein the composition comprises an iron chelant selected from the group consisting of siderophores claim 1 , catechols claim 1 , enterobactin claim 1 , hydroxamates claim 1 , hydroxypyridinones (or hydroxypyridine N-Oxides) and mixtures thereof.7. A method according to wherein the composition is free or substantially free of bleach.8. A method according to wherein the composition comprises an anionic surfactant.9. A method according to wherein the composition comprises a performance polymer.10. A method according to wherein the composition comprises a crystal growth inhibitor.11. A method according to wherein the composition comprises a low temperature amylase.12. A method according to wherein the composition comprises a protease selected from the group consisting of:(i) a metalloprotease;(ii) a cysteine ...

METHOD OF AUTOMATIC DISHWASHING

A method of washing dishware and tableware in a dishwasher using a short program comprising the step of subjecting the ware to a main wash lasting less than 20 minutes wherein the washing liquor of the main wash comprises a low pH detergent composition, the composition having a pH as measured in 1% weight aqueous solution at 25° C. of from about 5 to about 7.5. 1. A method of washing dishware and tableware in a dishwasher using a short program comprising the step of subjecting the ware to a main wash lasting less than 20 minutes wherein the washing liquor of the main wash comprises a low pH detergent composition , the composition having a pH as measured in 1% weight aqueous solution at 25° C. of from about 5 to about 7.5.2. A method according to wherein the temperature of the main wash is 50° C. or less.3. A method according to wherein the length of the main wash is 15 minutes or less.4. A method according to wherein the composition is substantially builder-free.5. A method according to wherein the composition comprises a buffer.6. A method according to wherein the composition comprises an iron chelant.7. A method according to wherein the composition comprises an iron chelant selected from the group consisting of siderophores claim 1 , catechols claim 1 , enterobactin claim 1 , hydroxamates claim 1 , hydroxypyridinones (or hydroxypyridine N-Oxides) and mixtures thereof.8. A method according to wherein the composition is free or substantially free of bleach.9. A method according to wherein the composition comprises an anionic surfactant.10. A method according to wherein the composition comprises an anionic surfactant wherein the anionic surfactant comprises an alkyl ethoxy sulfate.11. A method according to wherein the composition comprises a performance polymer.12. A method according to wherein the composition comprises a performance polymer wherein the polymer comprises an alkoxylated polyalkyleneimine.13. A method according to wherein the composition comprises a ...

METHOD OF AUTOMATIC DISHWASHING

A method of cleaning a dishwashing load comprising dishware and tableware having bleachable stains in the presence of iron in a dishwasher, the method comprising the step of contacting the ware with a detergent composition comprising an iron chelant wherein the detergent composition is free or substantially free of bleach and preferably has a pH as measured in 1% weight aqueous solution at 25° C. of from about 5 to about 7.5 1. A method of cleaning a dishwashing load comprising dishware and tableware having bleachable stains in the presence of iron in a dishwasher , the method comprising the step of contacting the ware with a detergent composition comprising an iron chelant wherein the detergent composition is free or substantially free of bleach and has a pH as measured in 1% weight aqueous solution at 25° C. of from about 5 to about 7.5.2. A method according to wherein the iron chelant is selected from the group consisting of siderophores claim 1 , catechols claim 1 , catechol sulfonates claim 1 , enterobactin claim 1 , hydroxamates claim 1 , hydroxypyridinones (or hydroxypyridine N-Oxides) and mixtures thereof.3. A method according to wherein the composition comprises a crystal growth inhibitor.4. A method according to wherein the composition comprises a cleaning polymer.5. A method according to wherein the composition comprises a cleaning polymer and wherein the cleaning polymer comprises an alkoxylated polyalkyleneimine.6. A method according to wherein the composition comprises an anionic surfactant.7. A method according to wherein the composition comprises an anionic surfactant and wherein the anionic surfactant comprises an alkyl ethoxy sulfate.8. A method according to wherein the composition has a pH as measured in 1% weight aqueous solution at 25° C. of from about 5 to about 6.9.9. A method according to wherein the composition is substantially builder-free.10. A method according to wherein the composition comprises a buffer.11. A method according to wherein ...

AUTOMATIC DISHWASHING DETERGENT COMPOSITION

A neutral or acidic automatic dishwashing detergent composition including a nitrogen containing compound selected from the group consisting of imidazoles, pyrazoles, benzothiazoles, benzimidazoles, indoles, benzotriazoles, and mixtures thereof. 1. A neutral or acidic automatic dishwashing detergent composition comprising a nitrogen containing compound selected from the group consisting of imidazoles , pyrazoles , benzothiazoles , benzimidazoles , indoles , benzotriazoles , and mixtures thereof.2. A composition according to wherein the nitrogen containing compound is benzotriazole.3. A composition according to comprising from about 0.01 to about 1.0% by weight of the composition of the nitrogen containing compound.4. A composition according to comprising a pH regulator system and a cleaning agent selected from the group consisting of cleaning surfactants claim 1 , soil suspending polymers and mixtures thereof.5. A composition according to comprising a pH regulator system and a cleaning agent selected from the group consisting of cleaning surfactants claim 1 , soil suspending polymers and mixtures thereof and wherein the weight ratio of the pH regulator system to the cleaning agent is preferably from about 3:1 to about 1:1.6. A composition according to comprising from about 15% to about 55% by weight of the composition of apH regulator system.7. A composition according to wherein the pH regulator system comprises a mixture of an acid and a conjugate salt.8. A composition according to comprising at least 15% by weight of the composition of a cleaning agent.9. A composition according to comprising a cleaning surfactant selected from the group consisting of anionic surfactants claim 1 , amphoteric surfactants claim 1 , non-ionic surfactants and mixtures thereof.10. A composition according to comprising a cleaning surfactant wherein the cleaning surfactant comprises a mixture of alcohol ethoxylated and epoxy-capped poly(oxyalkylated) alcohol non-ionic surfactants.11. A ...

AUTOMATIC DISHWASHING DETERGENT COMPOSITION

A neutral or acidic automatic dishwashing detergent composition including inorganic bleach, enzymes and a cleaning agent selected from the group consisting of cleaning surfactants, soil suspending polymers and mixtures thereof and from 0.01% to 5% by weight of the composition of a perfume and wherein the composition has a cleaning index of at least 60 and a care index of at least 4 as defined herein. 1. A neutral or acidic automatic dishwashing detergent composition comprising inorganic bleach , enzymes , a cleaning agent selected from the group consisting of cleaning surfactants , soil suspending polymers , and mixtures thereof and from about 0.01% to about 5% by weight of the composition of a perfume and wherein the composition has a cleaning index of at least 60 and a care index of at least 4 as defined herein.2. A composition according to wherein the bleach is sodium percarbonate.3. A composition according to wherein the inorganic bleach is in the form of a particle comprising a core substantially consisting of inorganic bleach and a coating layer enclosing this core comprising preferably sodium sulphate claim 1 , sodium carbonate claim 1 , sodium borate claim 1 , sodium silicate claim 1 , sodium bicarbonate or mixtures thereof.4. A composition according to comprising a cleaning surfactant selected from the group consisting of anionic surfactants claim 1 , amphoteric surfactants claim 1 , non-ionic surfactants and mixtures thereof.5. A composition according to comprising a cleaning surfactant wherein the cleaning surfactant comprises a mixture of alcohol ethoxylated and epoxy-capped poly(oxyalkylated) alcohol non-ionic surfactants.6. A composition according to comprising a cleaning surfactant wherein the cleaning surfactant comprises a mixture of alcohol ethoxylated and epoxy-capped poly(oxyalkylated) alcohol non-ionic surfactants wherein the alcohol ethoxylated is an alcohol having from 12 to 14 carbon atoms and from 6 to 8 ethoxy groups and wherein the epoxy- ...

AUTOMATIC DISHWASHING DETERGENT COMPOSITION

A neutral or acidic automatic dishwashing detergent composition including a pH regulator system and a cleaning agent selected from the group consisting of cleaning surfactants, soil suspending polymers and mixtures thereof wherein the weight ratio of the pH regulator system to the cleaning agent is from 3:1 to 1:1 system and wherein the detergent composition includes from 0.01% to 5% by weight of the composition of a perfume. 1. A neutral or acidic automatic dishwashing detergent composition comprising a pH regulator system and a cleaning agent selected from the group consisting of cleaning surfactants , soil suspending polymers and mixtures thereof wherein the weight ratio of the pH regulator system to the cleaning agent is from about 3:1 to about 1:1 system and wherein the detergent composition comprises from about 0.01% to about 5% by weight of the composition of a perfume.2. A composition according to comprising from about 15% to about 55% by weight of the composition of the pH regulator system.3. A composition according to wherein the pH regulator system comprises a mixture of an acid and a conjugate salt.4. A composition according to wherein the composition comprises at least 10% by weight thereof of the cleaning agent.5. A composition according to comprising a cleaning surfactant selected from the group consisting of anionic surfactants claim 1 , amphoteric surfactants claim 1 , non-ionic surfactants and mixtures thereof.6. A composition according to wherein composition comprises a cleaning surfactant and wherein the cleaning surfactant comprises a mixture of alcohol ethoxylated and epoxy-capped poly(oxyalkylated) alcohol non-ionic surfactants.7. A composition according to comprising a soil suspending polymer.8. A composition according to comprising an alkoxylated polyalkyleneimine.9. A composition according to comprising from about 10% to about 40% by weight of the composition of bleach.10. A composition according to comprising sodium percarbonate.11. A ...

AUTOMATIC DISHWASHING DETERGENT COMPOSITION

A neutral or acidic automatic dishwashing detergent composition including a powder composition including an effervescent system and wherein the detergent composition comprises from about 0.01% to about 5% by weight of the composition of a perfume. 1. A neutral or acidic automatic dishwashing detergent composition comprising a powder composition comprising an effervescent system and wherein the detergent composition comprises from 0.01% to 5% by weight of the composition of a perfume.2. A composition according to wherein the effervescent system comprises sodium percarbonate and a pH regulator system wherein the pH regulator system comprises an acid and its conjugate salt.3. A composition according wherein the effervescent system comprises sodium percarbonate and a pH regulator system wherein the pH regulator system comprises an acid and its conjugate salt and wherein the acid and the percarbonate are in a weight ratio of from about 1:2 to about 2:1.4. A composition according to comprising at least 25% by weight of the powder composition of the effervescent system.5. A composition according to comprising:a) from about 10% to about 40% by weight of the composition of sodium percarbonate;b) from about 10% to about 40% by weight of the composition of citric acid; andc) from about 10% to about 40% by weight of the composition of sodium citrate.6. A composition according comprising:a) from about 1% to about 5% by weight of the composition of sodium percarbonate;b) from about 1% to about 8% by weight of the composition of citric acid; andc) from about 10% to about 40% by weight of the composition of sodium citrate.7. A composition according to comprising sodium percarbonate wherein the sodium percarbonate is in the form of a particle comprising a core substantially consisting of inorganic bleach and a coating layer enclosing this core wherein the core comprises sodium sulphate claim 1 , sodium carbonate claim 1 , sodium borate claim 1 , sodium silicate claim 1 , sodium ...

Water-Soluble Encapsulated Chlorinating Agent

The present invention is directed to materials and method of encapsulating chemical agents. In particular, the present invention is directed to compositions and methods of encapsulating a water chlorinating agent in a water soluble polymer encapsulant. 1. A composition , comprising:a water-soluble polymeric encapsulant; anda water chlorinating agent encapsulated in the water soluble polymer encapsulant.2. The composition of claim 1 , the water chlorinating agent comprising an alkali metal dichloroisocyanurate salt.3. The composition of claim 1 , the water chlorinating agent comprising sodium dichloroisocyanurate.4. The composition of claim 1 , formulated in a unit or pod dosage form.5. The composition of claim 1 , the water-soluble polymeric encapsulant being a water-soluble film.6. The composition of claim 1 , the water-soluble polymeric encapsulant being a flexible water-soluble film.7. The composition of claim 1 , the water-soluble polymeric encapsulant being a self-supporting water-soluble film.8. The composition of claim 1 , the water chlorinating agent being stable or inert with respect to the water-soluble polymeric encapsulant.9. The composition of claim 1 , the water-soluble polymeric encapsulant rendering the encapsulated water chlorinating agent stable or inert.10. The composition of claim 1 , further comprising one or more of: an active compound claim 1 , a disinfectant claim 1 , an antimicrobial claim 1 , a sporocide claim 1 , a stabilizing agent claim 1 , and a colorant.11. The composition of claim 1 , the water-soluble polymeric encapsulant being configured to provide timed release of the encapsulated water chlorinating agent over a period of about 1 minute to about 4 weeks.12. The composition of claim 1 , the water-soluble polymeric encapsulant being configured to provide time-delayed release of the encapsulated water chlorinating agent with a release time beginning from about 1 minute to about 4 weeks.13. The composition of claim 1 , the water- ...

Stripping compositions for removing photoresists from semiconductor substrates

This disclosure relates to photoresist stripping compositions containing 1) at least one water soluble polar aprotic organic solvent; 2) at least one alcohol solvent; 3) at least one quaternary ammonium hydroxide; 4) water; 5) at least one copper corrosion inhibitor selected from 6-substituted-2,4-diamino-1,3,5-triazines; and 6) optionally, at least one defoaming surfactant.

TREATMENT LIQUID AND METHOD FOR TREATING LAMINATE

A treatment liquid is a treatment liquid for a semiconductor device, and contains a fluorine-containing compound and a metal ion. 1. A treatment liquid for a semiconductor device , comprising:a fluorine-containing compound; anda metal ion.2. The treatment liquid according to claim 1 ,wherein the fluorine-containing compound is hydrogen fluoride.3. The treatment liquid according to claim 1 ,wherein the metal ion is a divalent or higher metal ion.4. The treatment liquid according to claim 1 ,wherein the metal ion is at least one selected from the group consisting of an alkaline earth metal ion and an Al ion.5. The treatment liquid according to claim 1 ,wherein the metal ion is at least one selected from the group consisting of a Sr ion, a Ba ion, and an Al ion.6. The treatment liquid according to claim 1 ,wherein the treatment liquid is formed by blending a metal salt having the metal ion thereinto, andan amount of the metal salt blended is 0.001% to 3% by mass with respect to the total mass of the treatment liquid.7. The treatment liquid according to claim 1 ,wherein in a case where a content of the metal ion and a content of the fluorine-containing compound are defined as M1 and M2, respectively, a content ratio M1/M2 is 0.01 to 10.8. The treatment liquid according to claim 1 , further comprising a water-soluble polymer compound.9. The treatment liquid according to claim 8 ,wherein the water-soluble polymer compound is an anionic polymer.10. The treatment liquid according to claim 8 ,wherein the water-soluble polymer compound is a polyacrylic acid.11. The treatment liquid according to claim 8 ,wherein a weight-average molecular weight of the water-soluble polymer compound is 2,000 to 100,000.12. The treatment liquid according to claim 8 ,wherein in a case where a content of the metal ion and a content of the water-soluble polymer compound are defined as M1 and M3, respectively, a content ratio M1/M3 is 0.01 to 0.5.13. The treatment liquid according to claim 1 , ...

DETERGENT COMPOSITIONS

A method for treating textiles wherein textiles are contacted with an aqueous solution comprising optical brightener and optionally, alklyphthalimide derivatives and mixtures thereof, and then rinsed and dried. 1. A method of treating textile , the method comprising the steps of: (i) treating a textile with an aqueous solution comprising from about 1 ppb to about 50 ppm of an optical brightener having ClogP from about 1 to about 50 , and optionally from about 0 to about 0.4 g/l alkylphthalimide derivative , at a temperature of about 30° C. or below , and ii) rinsing and drying the textile.2. A method according to claim 1 , wherein the optical brightener is selected from coumarinic and benzoxazole optical brighteners and mixtures thereof.3. A method according to wherein the brightener is selected from the group comprising coumarinic brighteners and mixtures thereof.4. A method according to wherein the textile is treated with the aqueous solution at a temperature of about 25° C. or below.5. A method according to wherein the alkylphthalimide comprises N-butylphthalimide.6. A method according to wherein the aqueous solution comprises from about 0.0001 to about 0.05 g/l alkylphthalimide.9. A method according to wherein the optical brightener is selected from{'sup': '3', 'compounds of formula I and Ris phenyl optionally substituted with —Cl or methyl.'}10. A method according to wherein the aqueous solution additionally comprises an enzyme selected from the group comprising protease claim 1 , amylase and lipase enzymes and mixtures thereof.11. A method according to wherein the aqueous solution additionally comprises an additional optical brightener selected from hydrophilic optical brighteners.12. A method according to wherein the weight ratio of hydrophobic brightener to hydrophilic brightener is from about 5:1 to about 1:10.13. A method according to wherein the aqueous solution comprising an optional additional optical brightener selected from: sodium 2 (4-styryl-3- ...

DETERGENT COMPOSITIONS

A method for treating textiles having oily soils wherein textiles are contacted with an aqueous solution comprising brightener and optionally, alklyphthalimide derivatives and mixtures thereof, and then rinsed and dried. 1. A method of treating a visibly distinct oily stain on a textile surface , the method comprising the steps of: (i) contacting the textile with a composition comprising about 1 ppb to about 50 ppm of an optical brightener having a ClogP from about 1 to about 50 , and ii) rinsing and drying the textile.2. A method according to wherein the optical brightener is selected from coumarinic and benzoxazole optical brighteners.3. A method according to wherein the textile surface is contacted with the composition at a temperature of about 30° C. claim 1 , or about 25° C. or below.4. A method according to wherein the composition is liquid.5. A method according to wherein the composition contacting the textile surface is anaqueous wash liquor or an aqueous rinse liquor in a domestic treatment process.6. A method according to wherein the composition contacting the textile surface is a pre-treatment composition for use prior to a domestic wash or rinse step.7. A method according to wherein the composition contacting the textile additionally comprises from about 0.0001 to about 0.5 g/l an optionally substituted alkylphthalimide.8. A method according to wherein the optical brightener is selected from the group comprising coumarinic brighteners.11. A method according to wherein the composition additionally comprises an enzyme selected from the group comprising protease claim 1 , amylase claim 1 , and lipase enzymes and mixtures thereof.12. A method according to wherein the composition additionally comprises an additional optical brightener selected from hydrophilic optical brighteners claim 1 , the weight ratio of hydrophobic brightener to hydrophilic brightener being from about 20:1 to about 1:20.13. A method according to wherein the composition additionally ...

DETERGENT COMPOSITIONS

A composition and method for treating textiles wherein textiles are contacted with a composition comprising optical brightener and fabric shading dyes optionally with alklyphthalimide derivatives and mixtures thereof. 1. A fabric treatment composition comprising from about 0.0001 to about 0.1 wt % fabric shading dye and from about 0.0001 to about 10 wt % optical brightener having a ClogP from about 1 to about 50.2. A fabric treatment composition according to wherein the optical brightener is selected from coumarinic and benzoxazole optical brighteners and mixtures thereof.3. A fabric treatment composition according to wherein the optical brightener is selected from coumarinic optical brighteners.4. A fabric treatment composition according to wherein the composition is a liquid.5. A fabric treatment composition according to additionally comprising optionally substituted alkylphthalimide.6. A fabric treatment composition according to wherein the optionally substituted alkylphthalimide is present in an amount of from about 0.0001 to about 0.5 g/l and comprises N-butylphthimide.8. A fabric treatment composition according to additionally comprising an additional optical brightener selected from low ClogP optical brighteners claim 1 , the weight ratio of high ClogP brightener to low ClogP brightener being from about 20:1 to about 1:20.9. A fabric treatment composition according to the weight ratio of high ClogP brightener to low ClogP brightener being from about 5:1 to about 1:10.10. A fabric treatment composition according to additionally comprising from about 0.005 to about 10 wt % of a dye transfer inhibitor selected from the group comprising polyvinylpyrrolidone polymers claim 1 , polyamine N-oxide polymers claim 1 , copolymers of N-vinylpyrrolidone and N-vinylimidazole claim 1 , polyvinyloxazolidones and polyvinylimidazoles or mixtures thereof.11. A fabric treatment composition according to wherein the dye transfer inhibitor is selected from copolymers of N- ...

SOLVENT APPLICATION IN BOTTLE WASH USING AMIDINE BASED FORMULAS

According to the invention, the compositions and methods provide for the complete removal of labels, synthetic glues and/or adhesives from a plurality of surfaces through the use of an aqueous or non-aqueous basic organic solvent and/or an amidine, optionally in combination with surfactants, chelants, acidulants and/or additional bottle wash additives. Beneficially, the compositions and methods are suitable for use at lower temperatures and pH conditions, along with under caustic-free and/or reduced caustic conditions to effectively remove such labels, synthetic glues and/or adhesives from a surface within less than about 30 minutes. 1: A method for removing soils , labels and other adhesive material from a surface comprising:applying a label removing composition to a surface in need of removal of an adhesive material, wherein the label removing composition comprises an aqueous or non-aqueous basic organic solvent and/or an amidine solvent, a surfactant, wherein the composition contains caustic in an amount from about 0 wt-% (caustic free) to about 2 wt-%; andremoving said soils, labels and other adhesive material from the surface within a period of time less than about 60 minutes;wherein the surfactant is an anionic surfactant and/or nonionic surfactant,wherein the composition includes one or more additional functional ingredients,wherein the temperature of the label removing composition is below about 80° C.,wherein the pH of the label removing composition is between about 10 and about 14, andwherein the label removing composition substantially or completely removes said adhesive materials comprising natural and/or synthetic adhesives and said labels comprising metallic labels without compromising any cleaning performance on the surface and/or creating any pulping or other residue within a cleaning system.2: The method of claim 1 , wherein the label removing composition has a pH between about 12 and about 14 claim 1 , and wherein the label removing composition is ...

Compositions and Processes for Treatment with Lipases

The present invention relates to a composition comprising: (a) at least one surfactant, at least one surfactant system, at least one soap, or any mixtures thereof; and (b) a polypeptide having lipase activity selected from the group consisting of: (I) a polypeptide having at least 80% sequence identity to the mature polypeptide of SEQ ID NO: 2; (II) a polypeptide encoded by a polynucleotide that hybridizes under low stringency conditions with (i) the mature polypeptide coding sequence of SEQ ID NO: 1, or (ii) the full-length complement of (i); (III) a polypeptide encoded by a polynucleotide having at least 80% sequence identity to the matore polypeptide coding sequence of SEQ ID NO: 1; (IV) a variant of the mature polypeptide of SEQ ID NO: 2 comprising a substitution, deletion, and/or insertion at one or more positions; and (V) a fragment of the polypeptide of (I), (II), (III), or (IV); wherein said composition is a cleaning and/or treatment composition. The invention furthermore relates to methods of producing and using the composition. 1. A composition comprising: (a) at least one surfactant , at least one surfactant system , at least one soap , or any mixtures thereof; and (b) a polypeptide having lipase activity selected from the group consisting of: (I) a polypeptide having at least 80% sequence identity to the mature polypeptide of SEQ ID NO: 2; (II) a polypeptide encoded by a polynucleotide that hybridizes under low stringency conditions with (i) the mature polypeptide coding sequence of SEQ ID NO: 1 , or (ii) the full-length complement of (i); (III) a polypeptide encoded by a polynucleotide having at least 80% sequence identity to the mature polypeptide coding sequence of SEQ ID NO: 1; (IV) a variant of the mature polypeptide of SEQ ID NO: 2 comprising a substitution , deletion , and/or insertion at one or more positions; and (V) a fragment of the polypeptide of (I) , (II) , (III) , or (IV); wherein said composition is a cleaning and/or treatment composition ...

TREATMENT LIQUID AND METHOD FOR TREATING LAMINATE

A treatment liquid is a treatment liquid for a semiconductor device, which contains a fluorine-containing compound and a water-soluble aromatic compound not having a heterocyclic group but having a benzene ring, and has a pH of 5 or less. 1. A treatment liquid for a semiconductor device , comprising:a fluorine-containing compound; anda water-soluble aromatic compound not having a heterocyclic group but having a benzene ring,wherein the treatment liquid has a pH of 5 or less.2. The treatment liquid according to claim 1 ,wherein a pKa of the water-soluble aromatic compound is 6 or less.3. The treatment liquid according to claim 1 , further comprising water claim 1 ,wherein a content of water is 50% by mass or more with respect to the total mass of the treatment liquid.4. The treatment liquid according to claim 1 ,wherein the treatment liquid does not comprise an oxidizing agent.5. The treatment liquid according to claim 1 ,wherein the fluorine-containing compound is hydrogen fluoride.6. The treatment liquid according to claim 1 ,wherein the water-soluble aromatic compound has an acidic group.7. The treatment liquid according to claim 1 ,wherein the water-soluble aromatic compound includes at least one selected from the group consisting of phenylphosphonic acid, benzenecarboxylic acid, benzenesulfonic acid, and derivatives thereof.8. The treatment liquid according to claim 1 ,wherein a content of the water-soluble aromatic compound is 0.05% to 10% by mass with respect to the total mass of the treatment liquid.9. The treatment liquid according to claim 1 ,wherein in a case where a content of the fluorine-containing compound and a content of the water-soluble aromatic compound are defined as M1 and M2 respectively, a content ratio M1/M2 is 0.05 to 10.10. The treatment liquid according to claim 1 ,wherein the pH is 2 to 5.11. The treatment liquid according to claim 1 , further comprising an anionic surfactant.12. The treatment liquid according to claim 1 , further ...

PROCESS FOR PREPARING ALKYL PYROGLUTAMIC ACIDS

Disclosed are compounds of formulae: 17.-. (canceled)9. A composition according to further comprising at least one additive claim 8 , excipient or diluent.10. A composition according to claim 8 , comprising at least two compounds of formula (II).1320.-. (canceled) This application claims benefit of U.S. Provisional Application Ser. No. 61/576,023, filed Dec. 15, 2011, the disclosure of which is incorporated herein by reference in its entirety.This disclosure relates to compounds and compositions suitable for use in surfactants. In particular, the disclosure relates to alkyl pyroglutamic acid compounds.The large shift towards environmentally friendly surfactants has resulted in the need for the industry to provide readily biodegradable and non-toxic surfactants and additives. Surfactants and additives with renewable content can be preferable to their synthetic counterparts with demand being driven by life sustainability initiatives, preferred buying programs and consumer trends.Alcohol ethoxy sulfates (AES) is a class of anionic surfactant commonly used in personal care shampoo formulation. The trace byproduct from the manufacturing processes of AES (alkoxylation and sulfation), and the skin irritancy associated with AES are not desirable in personal care applications. An ethylene oxide-free (EO-free) and sulfate-free surfactant that is non-irritating is much more preferable in personal care.Common EO-free and sulfate-free surfactant personal care surfactants are fatty acid soaps, betaines, alpha olefin sulfonates, sulfosuccinates, esters, alkyl polyglucosides, fatty acyl amino acids, fatty amine oxides, and quaternaries. Two common commercially available amino acid surfactants are acyl glutamate and acyl sarcosinate. Acyl glutamate is derived from natural fatty acids and natural glutamic acid, while acyl sarcosinate is derived from natural fatty acids and synthetic glycine. In either case, these amino acid surfactants are commonly accepted as non-toxic and mild. ...

STABLE AQUEOUS PAP SUSPENSION

A storage stable aqueous suspension of PAP is provided. 1. An aqueous liquid PAP suspension comprising solid PAP dispersed in an aqueous sugar compound.2. The suspension according to claim 1 , wherein the solid PAP comprises between 5 and 45% by weight.3. The suspension according claim 1 , wherein the aqueous sugar compound is 10 sorbitol.4. The suspension according to claim 1 , wherein the aqueous sugar compound comprises between 40 and 70% by weight.5. The suspension according to claim 1 , wherein the suspension is polyvinyl alcohol (PVOH) stable.6. The suspension according to further comprising a thickening agent.7. The suspension according to claim 6 , wherein the thickening agent comprises xanthan gum.8. The suspension according to claim 1 , wherein the suspension comprises:20-45% by weight PAP powder;55-70% by weight sorbitol;0-0.5% by weight xanthan gum; and0-10% by weight distilled water911-. (canceled)12. An automatic ware washing detergent composition comprising the suspension according to .13. The automatic ware washing detergent composition of further comprising PVOH at least partially enclosing the composition.14. The composition of that is formulated to be a monodose composition.15. (canceled)16. An automatic dishwashing (ADW) detergent formulation comprising the suspension according to .17. An aqueous PAP suspension comprising:solid PAP; andan aqueous sugar compound;wherein the solid PAP is dispersed in the aqueous sugar compound; andwherein the form of the aqueous PAP suspension is selected from the group consisting of liquid and gel.18. The suspension according to claim 17 , wherein the solid PAP comprises between 5 and 45% by weight; andwherein the aqueous sugar compound comprises between 40 and 70% by weight.19. The suspension according to further comprising xanthan gum.20. The suspension according to claim 17 , wherein the suspension comprises:20-45% by weight of the solid PAP;55-70% by weight of the aqueous sugar compound;0-0.5% by weight of a ...

AQUEOUS FORMULATION FOR THE CLEANING OF HARD SURFACES

An aqueous formulation includes a) one or more proteolytic enzymes, b) one or more anionic surfactants, c) one or more non-ionic surfactants, d) one or more corrosion inhibitors, e) one or more multivalent aliphatic alcohols, f) one or more complexing agents, and g) one or more of para-hydroxybenzoic acid and esters thereof. The pH value of the formulation is in the range of from 9. to 12.5. The formulation is used in the mechanical cleaning of hard surfaces, in particular of medical instruments, and is preferably silicate free. 1. Aqueous formulation which containsa) one or more proteolytic enzymes, wherein the total quantity of the component a), relative to the weight of the formulation, amounts to from 0.03 to 1.0% by weight,b) one or more anionic surfactants, wherein the total quantity of the component b), relative to the weight of the formulation, amounts to from 0.5 to 15% by weight,c) one or more non-ionic surfactants, wherein the total quantity of the component c), relative to the weight of the formulation, amounts to from 0.1 to 12% by weight,d) one or more corrosion inhibitors, wherein the total quantity of the component d), relative to the weight of the formulation, amounts to from 0.050 to 1.0% by weight,e) one or more multivalent aliphatic alcohols, wherein the total quantity of the component e), relative to the weight of the formulation, amounts to from 5.0 to 60% by weight,f) one or more complexing agents, wherein the total quantity of the component f), relative to the weight of the formulation, amounts to from 0.1 to 15% by weight, andg) one or more of para-hydroxybenzoic acid and the esters thereof, wherein the total quantity of the component g), relative to the weight of the formulation, amounts to from 0.05 to 3.0% by weight,wherein the pH value of the formulation is in the range of from 9.5 to 12.5.2. Formulation according to claim 1 , characterized in that the proteolytic enzyme is selected from the group comprising Properase claim 1 , Savinase ...

USE OF A BACTERIUM ISOLATED FROM THE GENUS PSEUDOALTEROMONAS, CYCLOLIPOPEPTIDES AND USES THEREOF

The present invention relates to an isolated bacterium from the genus for its use as a probiotic, the use of said strain as a preservative, cyclolipopeptides which may be obtained from this bacterium, a composition comprising at least such a cyclolipopeptide, as well as to their uses. 2. The cyclolipopeptide according to claim 1 , wherein R is selected from the group consisting of:alkyl groups comprising between 6 and 14 carbon atoms, except nonyl and undecyl groups;alkylene groups comprising between 6 and 14 carbon atoms, except undec-4-ylene and tridec-6-ylene groups;alkyl groups substituted with an —OH group and comprising between 6 and 14 carbon atoms; andalkylene groups substituted with an —OH groups and comprising between 6 and 14 carbon atoms.3. The cyclolipopeptide according to claim 2 , wherein R is selected from the group consisting of the groups: nonylene claim 2 , in particular nonyl-2-ene claim 2 , nonanol claim 2 , in particular nonan-2-ol claim 2 , heptyl claim 2 , octylene claim 2 , octyl claim 2 , decyldiene claim 2 , decanyl claim 2 , decanol claim 2 , decylene claim 2 , octenol claim 2 , dodecylene and tridecyltriene.4. The cyclolipopeptide according to claim 2 , which may be obtained from a bacterium as defined according to .5. A cosmetic and/or dermatological composition comprising at least one cyclolipopeptide according to in a physiologically acceptable carrier.6. A pharmaceutical composition comprising at least one cyclolipopeptide according to in a pharmaceutically acceptable carrier. This application is a Divisional Application of U.S. application Ser. No. 14/893,366 filed on Mar. 24, 2016, which is a National Phase of Patent Application Serial No. PCT/EP2014/060737, filed on May 23, 2014, which claims priority to French Patent Application No. FR1354691, filed on May 24, 2013, all of which applications are herein incorporated by reference in their entirety.The present invention relates to an isolated bacterium from the genus for its use as ...

Sulfoxide/Glycol Ether Based Solvents for Use in the Electronics Industry

Solvents useful for removing, among other things, photoresists and poly(amic acid)/polyimide from display/semiconductor substrates or electronic processing equipment, consist essentially of: (A) a first component consisting of a sulfoxide, e.g., DMSO; (B) a second component consisting of a glycol ether, e.g., ethylene glycol monobutyl ether; and (C) a third component consisting of at least one of N-formyl morpholine, N,N-dimethyl propionamide, 3-methoxy-N,N-dimethyl propanamide, triethyl phosphate, N,N-dimethyl acetamide; N,N-diethyl acetamide, N,N-diethyl propionamide, N-methyl acetamide, N-methyl propionamide, N-ethyl acetamide, and N-ethyl propionamide.

Metal-Safe Solid Form Aqueous-Based Compositions and Methods To Remove Polymeric Materials in Electronics Manufacturing

Compositions and methods useful for the removal of organic substances from substrates, for example, electronic device substrates, are provided. A method is presented which uses a minimum amount of solid form concentrate that is diluted into water, introduced into a manufacturing tool and heated, applied to said substrate for a sufficient time to allow penetration and removal of an organic substance, and immediately rinsed with water to achieve complete removal. These compositions and methods are particularly suitable for removing and completely dissolving photoresists of the positive variety most commonly used in the manufacture of a flat panel display (FPD) and other electronic substrates.

MICROPARTICLE COMPOSITION AND USE THEREOF

The invention provides a personal care product or a home care product having self-assembled microparticles having an acid having two or more acid groups and an organic base in a solvent. The microparticles may form into a macrostructure and provide a support for carrying components of a personal care or home care composition. The particle is of micron scale. The microparticle may be obtained by contacting a bis-acid and organic base in a hydrophilic solvent, wherein the acid is insoluble or sparingly soluble in the hydrophilic solvent and the organic base is soluble in a hydrophilic solvent. 1. A personal care product comprising a personal care base composition and a particulate component comprising a self-assembled microparticle.2. A personal care product according to in which the personal care base composition is selected from a skin cream claim 1 , cosmetic claim 1 , fragrance claim 1 , deodorant claim 1 , hand or face wipe claim 1 , hand wash claim 1 , hand scrub claim 1 , shampoo claim 1 , conditioner claim 1 , mouth wash and tooth paste.3. A home care product comprising a home care base composition and a particulate component comprising a self-assembled microparticle.4. A home care product according to comprising a home care base composition selected from a surface treatment claim 3 , a surface spray claim 3 , a surface wipe claim 3 , a detergent composition claim 3 , a fabric softener claim 3 , a fragrance and a dishwashing composition.5. A personal care product or a home care product according to any one of the preceding claims in which the self-assembled microparticle comprises an acid having two or more acid groups and an organic base.6. A personal care product or a home care product according to any one of the preceding claims in which the microparticle has a particle size of 0.5 to 10 microns claim 3 , preferably 1 to 5 microns.7. A personal care product or a home care product according to any one of the preceding claims in which the molar ratio of acid ...

ACTIVE SUBSTANCE WAFER

The present invention relates to an active substance wafer and methods for producing such an active substance wafer. Further, the present invention relates to the use of such an active substance wafer as/in a laundry care agent, a hand laundry washing agent or a dishwashing agent and to a product selected from these agents consisting or comprising an active substance wafer. 1. An active substance wafer comprising:(a) 1.0 to 50.0 parts by weight of a water-soluble polyvinyl alcohol,(b) 1.0 to 60.0 parts by weight of an active substance,(c) 0 to 5.0 parts by weight of a water-insoluble polymer, and(d) 0 to 10.0 parts by weight of an additive, wherein the parts by weight are based on the total weight of the active substance wafer.2. The active substance wafer according to claim 1 , wherein the active substance of (b) is selected from the group consisting of a fragrance claim 1 , a cleaning-active and/or protecting substance claim 1 , a functional agent claim 1 , and a combination thereof.3. The active substance wafer of claim 1 , wherein the additive substance of (b) is selected from the group consisting of a filler claim 1 , a disintegrant claim 1 , a binder claim 1 , an absorber claim 1 , an antimicrobial claim 1 , a dye claim 1 , and a combination thereof.4. The active substance wafer according to comprising 3 to 12 parts by weight of the water-soluble polyvinyl alcohol.5. The active substance wafer according to comprising 5 to 15 parts by weight of the active substance of (b).6. The active substance wafer according to comprising:(a) 5 to 10 parts by weight of water-soluble polyvinyl alcohol,(b) 7 to 15 parts by weight of an active substance, wherein the active substance is a fragrance,(e) optionally, 2 to 5 parts by weight of starch, and(f) optionally, 1 to 8 parts by weight of the additive are contained.7. The active substance wafer according to claim 1 , wherein the water-soluble polyvinyl alcohol has an average degree of hydrolysis of 65 to 99.99 Mol %.8. A ...

Process for preparing alkyl pyroglutamic acids

Disclosed are compounds of formulae: and salts, hydrates, or solvates thereof, where R 1 , R 2 , R 3 , R 5 , and R 6 are defined herein, compositions containing these compounds, methods of preparing these compounds, and methods of using these compounds in a variety of applications, such as a surfactant or additive in personal care products.

HOME CARE COMPOSITION

The presently disclosed and/or claimed inventive concept(s) relates to a liquid home care composition comprising a mixed hydrophobically modified cationic polysaccharide comprising a polysaccharide backbone having at least one cationic group, at least one C-Cshort chain hydrophobic group and at least one C-Clong chain hydrophobic group attached thereon; at least one surfactants, and at least one additive agent used on the liquid home care composition. The liquid home care composition is a single clear, transparent liquid. 1. A liquid home care composition comprising:{'sub': 3', '8', '9', '24, '(a) a mixed hydrophobically modified cationic polysaccharide comprising a polysaccharide backbone having at least one cationic group, and at least one C-Cshort chain hydrophobic group and at least one C-Clong chain hydrophobic group attached thereon;'}(b) at least one surfactant; and(c) at least one additive agent selected from detergent adjuvants or builders, auxiliary cleaning agents, acidic cleaning agents, metal chelating agents, calcium-sequesting agents, hydrotropic agents, bleaching agents, abrasives, biocidal or antimictobial agents, corrosion inhibitors, enzymes, anti-redeposition agents, anti-color transfer agents, and soil-release agents, wherein the liquid home care composition is a clear single phase liquid and the polysaccharide backbone is water soluble or water insoluble.2. The liquid home care composition of claim 1 , wherein the polysaccharide backbone is cellulose ether.3. The liquid home care composition of claim 2 , wherein the cellulose ether is selected from the group consisting of hydroxyethyl cellulose (HEC) claim 2 , hydroxypropyl cellulose (HPC) claim 2 , methyl cellulose (MC) claim 2 , hydroxypropylmethyl cellulose (HPMC) claim 2 , ethylhydroxyethyl cellulose (EHEC) claim 2 , and methylhydroxyethyl cellulose (MHEC).4. The liquid home care composition of claim 1 , wherein the water insoluble polysaccharide backbone is soluble in a solution containing ...

COMPOSITION COMPRISING PRECURSOR FOR VOLATILES

A detergent, cleaning, fabric softener or cosmetic composition comprising a compound based on 1-Aza-3,7-dioxabicyclo[3.3.0]octane (bicyclic oxazolidine derivative) substituted with 3,7-dimethyl-1,6-nonyldien represented by formula (I) 3. The composition of claim 1 , wherein the at least one compound represented by formula I is present in an amount ranging from 0.000001 to 5 wt.4. The composition of claim 1 , wherein the composition is in the form of a solid claim 1 , a liquid claim 1 , a gel a dosage unit claim 1 , and combinations thereof.5. The composition according to claim 4 , wherein the solid is a powder claim 4 , granule claim 4 , tablet claim 4 , or tab claim 4 , wherein the liquid is a solution claim 4 , emulsion claim 4 , or dispersion claim 4 , or wherein a dosage form where solid and liquid or solid and gel or liquid and gel parts are present in one dosage unit claim 4 , for example in a pouch.6. The composition of claim 1 , wherein the composition is an aqueous cosmetic composition comprising one or more surfactants.7. The composition of claim 1 , wherein the composition is a deodorant composition.8. (canceled)10. The composition of claim 1 , further comprising one or more additional fragrance compounds different from that of the compound of formula (I).11. The composition of claim 1 , wherein Rof the compound of formula (I) is a Calkyl.12. The composition of claim 1 , wherein Rof the compound of formula (I) is methyl.13. The composition of claim 1 , wherein Rof the compound of formula (I) is hydrogen.14. The composition of claim 1 , wherein Rand Rof the compound of formula (I) are independently selected from hydrogen claim 1 , methyl claim 1 , or combinations thereof.15. The composition of claim 1 , wherein Rand Rof the compound of formula (I) are both hydrogen.16. The composition of claim 2 , wherein Rof the compound of formula (II) is a Calkyl.17. The composition of claim 2 , wherein Rof the compound of formula (II) is methyl.18. The composition of ...

SOLVENT COMPOSITIONS FOR REMOVING PETROLEUM RESIDUE FROM A SUBSTRATE AND METHODS OF USE THEREOF

A method of cleaning highway and road construction equipment is disclosed. 1. A method of cleaning highway and road construction equipment comprising:placing equipment on a perforated grid;spraying a biodegradable solvent composition with a spray gun under pressure on a residue containing equipment thereby forming an aqueous sludge, wherein the solvent composition has a pH of about 7;filtering the aqueous sludge through the perforated grid and thus separating insoluble contaminates;subjecting the filtered aqueous sludge to a compressed gas and thereby separating the solvent composition from the residue; andpreparing the solvent composition for recycling or disposal,wherein the solvent composition comprises about 30-60 weight % of a biodiesel.2. The method of claim 1 , wherein the solvent composition comprises from about 40% to about 60% by weight of an aromatic ester.3. The method of claim 1 , wherein the solvent composition further comprises 40-60 weight % of an aromatic ester selected from the group consisting of: methyl benzoic acid ester claim 1 , ethyl benzoic acid ester claim 1 , n-propyl benzoic acid ester claim 1 , isobutyl benzoic acid ester claim 1 , n-butyl benzoic acid ester claim 1 , tert-butyl benzoic acid ester claim 1 , isomers of pentyl benzoic acid ester claim 1 , isopropyl benzoic acid ester claim 1 , and combinations thereof;4. The method of claim 1 , wherein the solvent composition further comprises 40-60 weight % of an aromatic ester claim 1 , wherein the aromatic ester is isopropyl benzoic acid ester present in an amount of about 50 weight % claim 1 ,5. The method of claim 1 , further comprising a nonionic surfactant in an amount of about 0-20 weight %.6. The method of claim 1 , wherein the solvent composition further comprises about 0-10 weight % of diethylene glycol ether.7. The method of claim 1 , wherein the solvent composition further comprises about 0-20 weight % of a cyclic terpene or terpenoid.8. The method of claim 1 , wherein the ...

Combinations of 1-aza-3,7-dioxabicyclo[3.3.0]octane compounds and silicic acid esters and the use of same as pro-fragrances

The invention relates to combinations of 1-aza-3,7-dioxabicyclo[3.3.0]octane compounds with silicic acid esters, methods for producing same, the use of same as pro-fragrances, as well as washing and cleaning agents, fabric softeners and cosmetics that contain same. The invention also relates to a method for prolonging the perception of fragrance in such agents.

SOLVENT APPLICATION IN BOTTLE WASH USING AMIDINE BASED FORMULAS

According to the invention, the compositions and methods provide for the complete removal of labels, synthetic glues and/or adhesives from a plurality of surfaces through the use of an aqueous or non-aqueous basic organic solvent and/or an amidine, optionally in combination with surfactants, chelants, acidulants and/or additional bottle wash additives. Beneficially, the compositions and methods are suitable for use at lower temperatures and pH conditions, along with under caustic-free and/or reduced caustic conditions to effectively remove such labels, synthetic glues and/or adhesives from a surface within less than about 30 minutes. 1. A method for removing soils , labels and other adhesive material from a surface comprising:applying a label removing composition to a surface in need of removal of an adhesive material, wherein the label removing composition comprises an aqueous or non-aqueous basic organic solvent and/or an amidine solvent, a surfactant, wherein the composition contains caustic in an amount from about 0 wt-% (caustic free) to about 2 wt-%; andremoving said soils, labels and other adhesive material from the surface within a period of time less than about 60 minutes;wherein the temperature of the label removing composition is below about 80° C., andwherein the pH of the label removing composition is between about 10 and about 14.2. The method of claim 1 , wherein the label removing composition has a pH between about 12 and about 14 claim 1 , and wherein the label removing composition is at a temperature from about 50° C. to about 60° C. and removes said soils claim 1 , labels and other adhesive material within a period of time less than about 30 minutes.3. The method of claim 1 , wherein the aqueous or non-aqueous basic organic solvent comprises an amine and/or amide solvent claim 1 , and further comprises water in an amount less than about 70 wt-% of the label removing composition.5. The method of claim 3 , wherein said solvent is a fatty dialkyl ...

DETERGENTS AND CLEANING AGENTS HAVING IMPROVED PERFORMANCE

The present invention relates to the use of 8-hydroxyquinoline sulfonic acids in detergents and cleaning agents for improving the washing or cleaning performance with respect to bleachable stains. 2. The method according to claim 1 , wherein the compound of formula I includes one to two SOX substituents.3. The method according to claim 1 , wherein Ris an SOX substituent.4. The method according to claim 1 , wherein the stains comprise polymerizable substances.5. The method according to claim 4 , wherein the polymerizable substances are polyphenolic dyes.6. The method according to claim 4 , wherein the polymerizable substances are flavonoids.7. The method according to claim 4 , wherein the polymerizable substances are dyes in the class of anthocyanidins or anthocyanins claim 4 , or oligomers thereof.8. The method according to claim 1 , wherein the improved detergent or cleaning agent performance includes an improved removal of green- claim 1 , yellow- claim 1 , red- claim 1 , blue- claim 1 , violet- claim 1 , lilac- claim 1 , brown- claim 1 , purple- claim 1 , or pink-colored stains.9. The method according to claim 1 , wherein the stains are selected from stains caused by cherry claim 1 , morello cherry claim 1 , grape claim 1 , apple claim 1 , pomegranate claim 1 , chokeberry claim 1 , plum claim 1 , buckthorn claim 1 , acai claim 1 , kiwi claim 1 , mango claim 1 , grass claim 1 , redcurrants claim 1 , blackcurrants claim 1 , elderberries claim 1 , blackberries claim 1 , raspberries claim 1 , blueberries claim 1 , cranberries claim 1 , lingonberries claim 1 , strawberries claim 1 , huckleberries claim 1 , coffee claim 1 , tea claim 1 , red cabbage claim 1 , blood orange claim 1 , eggplant claim 1 , tomato claim 1 , carrot claim 1 , beetroot claim 1 , spinach claim 1 , peppers claim 1 , red-fleshed or blue-fleshed potatoes claim 1 , red onion claim 1 , spices claim 1 , sauces claim 1 , chutneys claim 1 , curries claim 1 , purees claim 1 , marmalades claim 1 , wines ...

MICROPARTICLE COMPOSITION AND USE THEREOF

The invention provides a personal care product or a home care product having self-assembled microparticles having an acid having two or more acid groups and an organic base in a solvent. The microparticles may form into a macrostructure and provide a support for carrying components of a personal care or home care composition. The particle is of micron scale. The microparticle may be obtained by contacting a bis-acid and organic base in a hydrophilic solvent, wherein the acid is insoluble or sparingly soluble in the hydrophilic solvent and the organic base is soluble in a hydrophilic solvent. 1. A personal care product or a home care product comprising a base composition and a particulate component comprising a self-assembled microparticle which comprises a bis acid which comprises an aliphatic amine or an aromatic amine having a basic character or other nitrogen-containing base and an organic base.2. A personal care product or a home care product according to in which the base composition is selected from a skin cream claim 1 , cosmetic claim 1 , fragrance claim 1 , deodorant claim 1 , hand or face wipe claim 1 , hand wash claim 1 , hand scrub claim 1 , shampoo claim 1 , conditioner claim 1 , mouth wash and tooth paste.3. (canceled)4. A personal care product or a home care product according to comprising a base composition selected from a surface treatment claim 1 , a surface spray claim 1 , a surface wipe claim 1 , a detergent composition claim 1 , a fabric softener claim 1 , a fragrance and a dishwashing composition.5. A personal care product or a home care product according to in which the microparticle has a particle size of 0.5 to 10 microns claim 1 , preferably 1 to 5 microns.6. A personal care product or a home care product according to in which the molar ratio of acid groups to basic groups in the acid and base is from 0.6 to 1.4:1.7. (canceled)8. A personal care product or a home care product according to in which the microparticle comprises a self- ...

STRIPPING COMPOSITIONS FOR REMOVING PHOTORESISTS FROM SEMICONDUCTOR SUBSTRATES

This disclosure relates to compositions containing 1) at least one water soluble polar aprotic organic solvent; 2) at least one quaternary ammonium hydroxide; 3) at least one carboxylic acid; 4) at least one Group II metal cation; 5) at least one copper corrosion inhibitor selected from the group consisting of 6-substituted-2,4-diamino-1,3,5-triazines; and 6) water. The compositions can effectively strip positive or negative-tone resists or resist residues, and be non-corrosive to bumps and underlying metallization materials (such as SnAg, CuNiSn, CuCoCu, CoSn, Ni, Cu, Al, W, Sn, Co, and the like) on a semiconductor substrate. 1. A composition , comprising:1) at least one water soluble polar aprotic organic solvent;2) at least one quaternary ammonium hydroxide;3) at least one carboxylic acid;4) at least one Group II metal cation;5) at least one copper corrosion inhibitor selected from the group consisting of 6-substituted-2,4-diamino-1,3,5-triazines; and6) water.2. The composition of claim 1 , wherein the at least one quaternary ammonium hydroxide comprises a compound of the formula [NRRRR]OH claim 1 , in which each of R claim 1 , R claim 1 , R claim 1 , and R claim 1 , independently claim 1 , is a linear claim 1 , branched claim 1 , or cyclic alkyl group optionally substituted by hydroxy claim 1 , a substituted or unsubstituted phenyl group claim 1 , or a substituted or unsubstituted benzyl group.3. The composition of claim 2 , wherein each of R claim 2 , R claim 2 , R claim 2 , and R claim 2 , independently claim 2 , is a C-Calkyl group claim 2 , a hydroxyethyl group claim 2 , a phenyl group claim 2 , or a benzyl group.4. The composition of claim 1 , wherein the composition comprises the at least one quaternary ammonium hydroxide in an amount from about 0.1 wt % to about 10 wt %.5. The composition of claim 1 , wherein the at least one copper corrosion inhibitor comprises a 6-substituted-2 claim 1 ,4-diamino-1 claim 1 ,3 claim 1 ,5-triazine claim 1 , the ...

METHOD OF TREATING A METAL SUBSTRATE

A method of cleaning a metal substrate, the method comprising exposing the metal substrate to a body of cleaning liquor comprising a cleaning formulation and a multiplicity of solid particles wherein the method further comprises causing the solid particles and the metal substrate to enter into contacting relative movement; wherein i) the cleaning formulation comprises at least one acid which has a pKa greater than about −1.7; and/or ii) the cleaning formulation comprises at least one base which has a pKb greater than about −1.7; and the length of the particles is from about 0.5 mm to about 6 mm. 1. A method of cleaning a metal substrate , the method comprising exposing the metal substrate to a body of cleaning liquor comprising a cleaning formulation and a multiplicity of solid particles wherein the method further comprises causing the solid particles and the metal substrate to enter into contacting relative movement; whereini) the cleaning formulation comprises at least one acid which has a pKa greater than about −1.7; and/orii) the cleaning formulation comprises at least one base which has a pKb greater than about −1.7; andthe length of the particles is from about 0.5 mm to about 6 mm.2. The method according to wherein the cleaning formulation comprises a solvent.3. The method according to or wherein the cleaning formulation comprises at least one surfactant.4. The method according to wherein the at least one surfactant is a non-ionic surfactant.5. The method according to any one of the preceding claims wherein the cleaning formulation comprises at least one acid which has a pKa greater than about −1.7.6. The method according to wherein the at least one acid has a pKa between about −1.7 and about 15.7.7. The method according to or wherein the at least one acid is an organic acid.8. The method according to any one of the preceding claims wherein the cleaning formulation comprises at least one base which has a pKb greater than about −1.7.9. The method according to ...

METHOD OF TREATING A METAL SUBSTRATE

A method of removing at least a portion of an oxide layer from the surface of a metal substrate comprising exposing the metal substrate to a body of treatment liquor comprising a treatment formulation and a multiplicity of solid particles which comprise or consists of a multiplicity of polymeric particles and wherein said treatment formulation comprises one or more promoters selected from the group consisting of acids, bases and surfactants wherein the method further comprises causing the solid particles and the metal substrate to enter into contacting relative movement. 1. A method of removing at least a portion of an oxide layer from the surface of a metal substrate comprising exposing the metal substrate to a body of treatment liquor comprising a treatment formulation and a multiplicity of solid particles which comprise or consists of a multiplicity of polymeric particles and wherein said treatment formulation comprises one or more promoters selected from the group consisting of acids , bases and surfactants wherein the method further comprises causing the solid particles and the metal substrate to enter into contacting relative movement.2. The method according to wherein the treatment formulation further comprises a solvent.3. The method according to or wherein the acids have a pKa greater than about −1.7.4. The method according to any one of the preceding claims wherein the one or more promoters comprise at least one organic acid.5. The method according to any of the preceding claims wherein the bases have a pKb greater than about −1.7.6. The method according to any one of the preceding claims wherein the one or more promoters comprise at least one carboxylic acid moiety.7. The method according to any one of the preceding claims wherein the one or more promoters comprise two or more carboxylic acid moieties.8. The method according to any one of the preceding claims wherein the one or more promoters comprise at least one citrate moiety.9. The method according to ...

CLEANING AGENT FOR SEMICONDUCTOR PROVIDED WITH METAL WIRING

A cleaning agent for a microelectronic device provided with metal wiring, which has an excellent ability to remove polishing particle residues derived from a polishing agent and an excellent ability to remove metallic residues on an insulating film, and has excellent anticorrosiveness to the metal wiring. The cleaning agent is used at a step subsequent to chemical mechanical polishing in a manufacturing process of a microelectronic device in which a metal wiring, e.g., copper or tungsten, is formed. 2. The composition of claim 1 , wherein the material comprises post-CMP residue and/or contaminants.3. The composition according to claim 1 , wherein the polyphenol based reducing agent is selected from the group consisting of catechol claim 1 , caffeic acid claim 1 , alizarin claim 1 , endocrocin claim 1 , urushiol claim 1 , flavone claim 1 , resorcinol claim 1 , hydroquinone claim 1 , emodin claim 1 , pyrogallol claim 1 , gallic acid claim 1 , quercetin claim 1 , catechin claim 1 , and anthocyanin.5. The composition according to claim 4 , wherein the quaternary ammonium hydroxide is selected from the group consisting of tetraalkylammonium hydroxide claim 4 , (hydroxyalkyl)trialkylammonium hydroxide claim 4 , bis(hydroxyalkyl)dialkylammonium hydroxide claim 4 , and tris(hydroxyalkyl)alkylammonium hydroxide.6. The composition according to claim 1 , wherein the cyclic polyamine is selected from the group consisting of N-methylpiperazine claim 1 , N-ethylpiperazine claim 1 , N-isobutylpiperazine claim 1 , N-aminomethylpiperazine claim 1 , N-aminoethylpiperazine claim 1 , N-aminopropylpiperazine claim 1 , N-hydroxymethylpiperazine claim 1 , N-hydroxyethylpiperazine claim 1 , N-hydroxypropylpiperazine claim 1 , 1 claim 1 ,4-dimethylpiperazine claim 1 , 1 claim 1 ,4-diethylpiperazine claim 1 , 1 claim 1 ,4-diisopropylpiperazine claim 1 , 1 claim 1 ,4-dibutylpiperazine claim 1 , 1-aminomethyl-4-methylpiperazine claim 1 , 1-hydroxymethyl-4-methylpiperazine claim 1 , 1- ...

CLEANING COMPOSITION, CLEANING APPARATUS, AND METHOD OF FABRICATING SEMICONDUCTOR DEVICE USING THE SAME

A cleaning composition, a cleaning apparatus, and a method of fabricating a semiconductor device, the cleaning composition including a surfactant; deionized water; and an organic compound, wherein the surfactant is included in the cleaning composition in a concentration of about 0.28M to about 0.39 M or a mole fraction of about 0.01 to about 0.017, and wherein the organic compound is included in the cleaning composition in a concentration of about 7.1 M to about 7.5 M or a mole fraction of about 0.27 to about 0.035. 1. A cleaning composition , comprising:a surfactant;deionized water; andan organic compound,wherein the surfactant is included in the cleaning composition in a concentration of about 0.28 M to about 0.39 M or a mole fraction of about 0.01 to about 0.017, andwherein the organic compound is included in the cleaning composition in a concentration of about 7.1 M to about 7.5 M or a mole fraction of about 0.27 to about 0.035.2. The cleaning composition as claimed in claim 1 , wherein the surfactant is a sulfate-based surfactant.3. The cleaning composition as claimed in claim 1 , wherein the surfactant is represented by the following Formula 1:{'br': None, 'sup': 1', '2, 'sub': a', 'b', '3', '4, '(R—O)—(R—O)—SONH\u2003\u2003(1)'}wherein, in Formula 1,a and b are each an integer of 0 to 18, provided that a and b are not simultaneously 0,{'sup': '1', 'Ris a substituted or unsubstituted alkyl group or having 1 to 18 carbon atoms, a substituted or unsubstituted alkylene group having 1 to 18 carbon atoms, or a substituted or unsubstituted arylene group having 6 to 14 carbon atoms, and'}{'sup': '1', 'when a is 3 to 18, (R—O) is repeated randomly or in a block form.'}4. The cleaning composition as claimed in claim 3 , wherein:a is 1,{'sup': '1', 'Rhas 16 carbon atoms,'}b is 0, andthe surfactant is ammonium hexadecyl sulfate.5. The cleaning composition as claimed in claim 1 , wherein the organic compound includes isopropyl alcohol claim 1 , ethyl alcohol claim 1 , ...

METAL CLEANSER COMPOSITION

A metal cleanser composition includes: (A) at least one carboxylic acid compound selected from the group consisting of an aliphatic monocarboxylic acid, a polycarboxylic acid, and a neutral salts thereof; (B) a specific oxyalkylene group-containing compound; and (C) at least one compound selected from the group consisting of a specific organic phosphonic acid and a salt thereof, and a specific nitrogen-containing heterocycle-containing compound. 2. The metal cleanser composition according to claim 1 , wherein a content of (A) is 1 to 40 mass % claim 1 , a content of (B) is 0.1 to 15 mass % claim 1 , and a content of (C) is 0.001 to 5.0 mass % based on a total amount of the metal cleanser composition.3. The metal cleanser composition according to claim 1 , comprising: a compound in which Rrepresents a linear or branched alkyl group or alkenyl group having 8 carbon atoms claim 1 , AO represents an oxyalkylene group having 2 to 4 carbon atoms claim 1 , and p is within a range of 1 to 5 in Formula (B) claim 1 , as the compound represented by General Formula (B).4. The metal cleanser composition according to claim 2 , comprising: a compound in which Rrepresents a linear or branched alkyl group or alkenyl group having 8 carbon atoms claim 2 , AO represents an oxyalkylene group having 2 to 4 carbon atoms claim 2 , and p is within a range of 1 to 5 in Formula (B) claim 2 , as the compound represented by General Formula (B). The present invention relates to a cleanser composition used for cleaning metal.In recent years, inexpensive parts have appeared on the market as the parts market for vehicles, trains, airplanes, machine tools, and the like has become globalized, and domestic parts manufacturers are exposed to intense cost competition. For this reason, each parts manufacturer takes various measures to reduce costs in materials or manufacturing steps in order to maintain competitiveness.Bringing the temperature during cleaning step to normal temperature is in progress as ...

CLEANING LIQUID AND METHOD FOR CLEANING

A cleaning liquid including hydrofluoric acid, a tetrazole compound, and water. The tetrazole compound may be represented by the following Formula (B1) in which Ris a hydrogen atom or an organic group and Ris a hydrogen atom, a hydroxyl group, a mercapto group, an amino group, or an organic group. 1. A cleaning liquid comprising:hydrofluoric acid;a tetrazole compound; andwater.3. The cleaning liquid according to claim 2 , wherein Ris a hydrogen atom.4. The cleaning liquid according to claim 1 , further comprising a basic compound.5. The cleaning liquid according to claim 1 , further comprising a water-soluble organic solvent.6. A method for cleaning a substrate claim 1 , comprising contacting the substrate with the cleaning liquid according to .7. The method according to claim 6 , wherein at least a part of the surface of the substrate is formed of metals containing cobalt. This application claims priority to Japanese Patent Application No. 2016-042500, filed Mar. 4, 2016, the entire content of which is incorporated herein by reference.Field of the InventionThe present invention relates to a cleaning liquid and a cleaning method using the cleaning liquid.Related ArtWhen semiconductor elements such as IC and LSI, or display elements such as liquid crystal panels are manufactured, a CVD vapor-deposited metal film or an insulating film such as a SiOfilm is first firmed on a substrate such as a silicon wafer or glass. Next, a photoresist pattern or a metal hard mask is formed on the metal film or the insulating film. Then, the substrate is subjected to dry etching using this photoresist pattern or this hard mask as a mask to form a fine circuit. Next, after the pattern or the mask is ashed, residual materials of the photoresist pattern and the residual materials of the hard mask are cleaned and removed using a cleaning liquid.In elements provided with such a fine circuit formed of a metal film, miniaturization of a circuit is increasingly progressed. In many cases, ...

TiN Hard Mask and Etch Residue Removal

Composition, method and system for PVD TiN hard mask removal from 28/20 nm pattern wafers have been disclosed. The composition uses peroxide as oxidizing agent for PVD TiN hard mask removal under slightly basic conditions. The composition comprises bulky or long chain organic amines or polyalkylamine to improve removal/etching selectivity of PVD TiN vs CVD TiN. The composition further comprises long chain organic acids or amines to maintain Co compatibility. 2. The composition of claim 1 , wherein the peroxide is selected from the group consisting of hydrogen peroxide claim 1 , ammonium persulfate claim 1 , peracidic acid claim 1 , peroxybenzoic acid claim 1 , and combinations thereof.3. The composition of claim 1 , wherein the base is selected from the group consisting of tetraethylammonium hydroxide(TEAH) claim 1 , trimethylphenylammonium hydroxide claim 1 , tetramethylammonium hydroxide claim 1 , tetrabutylammonium hydroxide claim 1 , choline hydroxide claim 1 , ammonium hydroxide claim 1 , and combinations thereof.4. The composition of claim 1 , wherein the weak acid is carboxylic acid selected from the group consisting of citric acid claim 1 , oxalic acid claim 1 , malonic acid claim 1 , lactic acid claim 1 , adipic acid claim 1 , acetic acid claim 1 , iminodiacetic acid claim 1 , and combinations thereof.5. The composition of claim 1 , wherein the ammonium salt is selected from the group consisting of ammonium citrate claim 1 , ammonium acetate claim 1 , ammonium malonate claim 1 , ammonium adipate claim 1 , ammonium lactate claim 1 , ammonium iminodiacetate claim 1 , ammonium chloride claim 1 , ammonium bromide claim 1 , ammonium fluoride claim 1 , ammonium bifluoride claim 1 , ammonium sulfate claim 1 , and combinations thereof.6. The composition of claim 1 , wherein the corrosion inhibitor is selected from the group consisting of 1 claim 1 ,2 claim 1 ,4-triazole claim 1 , benzotriazole claim 1 , methyl-1H-benzotriazole claim 1 , 2-aminobenthothiazole claim ...

Solvent Composition and Process for Removal of Asphalt and Other Contaminant Materials

A method and composition for removing contaminant material from industrial equipment are disclosed herein. The method includes providing a solvent composition having methyl soyate, N-methylpyrrolidinone, an additional solvent, and a cationic surfactant. The method also includes contacting the contaminant material with the solvent composition and allowing the solvent composition to react with the contaminant material such that at least a portion of the contaminant material is no longer attached to the industrial equipment. 1. A method for removing contaminant material from industrial equipment , the method comprising:(A) providing a solvent composition comprising methyl soyate, N-methylpyrrolidinone, an additional solvent, and a cationic surfactant;(B) contacting the contaminant material with the solvent composition; and(C) allowing the solvent composition to react with the contaminant material such that at least a portion of the contaminant material is no longer attached to the industrial equipment.2. The method of claim 1 , further comprising removing any contaminant material that is suspended in solution with the solvent composition.3. The method of claim 1 , further comprising the solvent composition contacting the industrial equipment; additionally comprising the solvent composition dissolving at least a portion of the contaminant material such that at least a portion of the contaminant material is dissolved within the solvent composition; and further comprising removing the solvent composition comprising the dissolved contaminant material from further contact with the industrial equipment.4. The method of claim 1 , wherein the solvent composition comprises between about 20.0 wt. % and about 40.0 wt. % methyl soyate.5. The method of claim 1 , wherein the solvent composition comprises between about 20.0 wt. % and about 50.0 wt. % N-methylpyrrolidinone.6. The method of claim 1 , wherein the solvent composition comprises between about 20.0 wt. % and about 40.0 wt. ...

Detergent compositions

A compound of formula (I) wherein R 1 is a C 5 to C 39 alkyl or alkenyl group and R 2 is (c) wherein A is an anion.

Agent, liquid, and method for cleaning reverse osmosis membrane

Provided is an agent and a liquid for cleaning an RO membrane to remove effectively foulants that can not be sufficiently removed with conventional cleaning agents when an RO membrane particularly an aromatic polyamide RO membrane has been used for water treatment and has become fouled resulting in degradation of performance such as permeation flux, pressure difference, and salt rejection rate. The agent for cleaning an RO membrane includes an aliphatic amide and/or an aromatic amide. Also provided is a method for cleaning an RO membrane with the cleaning agent or the cleaning liquid. The aliphatic amide and/or the aromatic amide particularly an aliphatic amide and/or an aromatic amide being soluble in water and having a relatively low molecular weight remove effectively foulants adhered on an aromatic polyamide RO membrane.

Fluorinated acid compounds, compositions and methods of use

Novel acid-based chemistries that can be used in various cleaning, de-scaling, rust-removal, brightening, etching and other similar applications, including, but not limited to, those based upon hexafluorozirconic acid and other additives, such as urea in some applications, which are effective for a wide range of applications, while avoiding the health, safety and environmental issues that are often associated with the use of hydrochloric acid and other toxic chemistries.