14-01-2016 дата публикации
Номер: US20160013111A1
A substrate structure and a device employing the same are disclosed. An embodiment of the disclosure provides the substrate structure including a flexible substrate and a first barrier layer. The flexible substrate has a top surface, a side surface, and a bottom surface. The first barrier layer is disposed on and contacting the top surface of the flexible substrate, wherein the first barrier layer consists of Si, N, and Z atoms, wherein the Z atom is selected from a group of H, C, and 0 atoms, and wherein Si of the first barrier layer is present in an amount from 35 to 42 atom %, N of the first barrier layer is present in an amount from 10 to 52 atom %, and Z of the first barrier layer is present in an amount from 6 to 48 atom %. 1. A substrate structure , comprising:a flexible substrate having a top surface, a side surface, and a bottom surface; anda first barrier layer disposed on and contacting the top surface of the flexible substrate, wherein the first barrier layer consists of Si, N, and Z atoms, wherein the Z atom is selected from a group of H, C, and O atoms, and wherein Si of the first barrier layer is present in an amount from 35 to 42 atom %, N of the first barrier layer is present in an amount from 10 to 52 atom %, and Z of the first barrier layer is present in an amount from 6 to 48 atom %.2. The substrate structure as claimed in claim 1 , wherein an adhesion strength between the flexible substrate and the first barrier layer is 5B measured according to ASTM D3330.3. The substrate structure as claimed in claim 1 , wherein the first barrier layer exhibits a water vapor transmission rate (WVTR) of less than 0.1 g/mday claim 1 , as determined by ASTM F1249-06 at 60° C. and 90% RH.4. The substrate structure as claimed in claim 1 , wherein the first barrier layer has a thickness between 30 nm and 10 μm.5. The substrate structure as claimed in claim 1 , wherein the first barrier layer has a visible light transmittance equal to or more than 80%.6. The ...
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