СЕЛЕКТИВНЫЙ РЕЗОНАТОР CO2-ЛАЗЕРА

Изобретение относится к лазерной технике и может быть преимущественно использовано для создания компактных селективных резонаторов непрерывных и импульсно-периодических CO2-лазеров с оптической накачкой, излучающих в спектральной области 9…10 мкм и предназначенных для работы в различных оптических системах. Изобретение включает селективный резонатор с поглощающей излучение средой, которая включена непосредственно в состав рабочей газовой смеси СО2-лазера. В качестве поглощающей среды в рабочую смесь лазера дополнительно к основному составу компонентов вводится газообразный гексафторид серы - SF6 в количестве, необходимом для выполнения условия превышения коэффициента поглощения излучения в активной среде лазера над коэффициентом усиления в спектральном диапазоне 10…11 мкм и обеспечивающем максимально возможный энергетический выход генерации в спектральном диапазоне 9…10 мкм за счет оптимизации соотношения компонентов рабочей смеси. Техническим результатом является уменьшение размеров резонатора ...

VERFAHREN UND VORRICHTUNG ZUR BEHANDLUNG VON MATERIALIEN MITTELS LASER.

GLASLASEROSZILLATOR MIT HILFSELEKTRODEN

Ein Gaslaseroszillator weist Lasergaszirkulationspfade, die einen ersten und einen zweiten Pfad beinhalten; eine erste Entladungsröhren, die auf dem ersten Pfad bereitgestellt ist; eine zweite Entladungsröhre, die auf dem zweiten Pfad bereitgestellt ist; eine Laserstromversorgung, um einen ersten Hochfrequenzstrom an die erste Entladungsröhre zu liefern und einen zweiten Hochfrequenzstrom mit einer von dem ersten Hochfrequenzstrom verschiedenen Phase an die zweite Entladungsröhre zu liefern; und eine Abstimmungseinheit, die eine erste Spule und einen ersten Kondensator, und eine zweite Spule und einen zweiten Kondensator aufweist, auf. Jeder Wert der ersten Spule, des ersten Kondensators, der zweiten Spule, und des zweiten Kondensators ist so bestimmt, dass der Unterschied zwischen dem Spitzenwert einer Spannung, die an die erste Entladungsröhre angelegt wird, und dem Spitzenwert einer Spannung, die an die zweite Entladungsröhre angelegt wird, in einen vorherbestimmten Bereich fällt.

GAS LASER APPARATUS

Mehrfachimpulslaser

Gas laser and optical system

CONTROLLING OF THE SPACE-TIME UNIFORMITY OF A PULSED GAS LASER JET

Very narrow band, two chamber, high rep rate gas discharge laser system

HIGH-SPEED AXIAL FLOW TYPE GAS LASER OSCILLATOR

METHOD OF PREVENTING MIS-EMISSION OF A LASER BEAM IN A LASER ROBOT

A laser-beam mis-emission preventing method capable of improving safety of a laser robot. Upon supply of power to the laser- robot. a processor of a robot control unit (10) compares a predetermined value with an angle (.delta.) formed between a horizontal plane (XY plane) and an axis (8a) of a laser nozzle (8) and computed based on joint angles (W, U, r, .beta.) (S1 - S3). When the laser nozzle angle (.delta.) is less than the predetermined value, an interlock signal delivered to the laser oscillator (30) is set to turn off the power of the laser oscillator, thereby bringing the laser oscillator into a condition incapable of laser oscillation (S5). This prevents mis-emission of the laser beam which occurs due to deficiency of a robot operating program, erroneous manual operation, etc., and which can damage the human body or peripheral devices.

Einrichtung zum Messen von Drehbewegungen

Process and apparatus for increasing the repetition frequency of the pulses of a laser

In order to increase the repetition frequency of the pulses of a gas laser including two discharge tubes (A, B) connected in series, the discharge of the two tubes is commanded alternately in such a manner that each tube has its recycling time while the other is discharging. The apparatus comprises a pulse generator (2) composed of an oscillator (O) coupled to a pulse distributor (D) which commands the discharges of the tubes via electronic gates (8, 9). The process and the apparatus can be utilised for etching by means of laser discharges in ceramic substrates. ...

PROCEDEPOURcOMM OTHER UN COHERENT DE FAISCEAURAYONNEMENT.

Device for treating the free surface of the material making up an object by laser irradiation

This is a device for treating the free surface of material by laser irradiation. The device includes power laser emission means (2) delivering substantially parallel laser beams (3) directed towards the surface of the material. The laser emission means (2) are arranged in a network representing the surface of the material to be treated. Means (4) provide for the control and modulation of the power of the radiation of each laser beam as a function of the absorption parameters and of the thickness of the zones of impact on the surface of the material. Application to the drying of patterns with a distinctive or ornamental character on a fixed or moving backing. ...

HIGH SPEED GAS LASER OSCILLATOR.

GAS LASER.

Laser machining apparatus and a method of controlling the same

SPACE-TIME CONSISTENCY CHECK OF the BEAM Of a GAS LASER PULSATES

치과 레이저 시스템들의 전력 공급 및 냉각을 위한 시스템들 및 방법들

... 치과 레이저 시스템(12)은 높은 피크 레이저 전력, 낮은 듀티 사이클 레이저 펄스들을 제공하도록 구성되어, 낮은 평균 레이저 전력 및 따라서 냉각에 대한 감소된 필요성을 얻는다. 레이저 전력 시스템은 낮은 평균 레이저 전력을 생성하고 높은 피크 레이저 전력을 생성하지 않기 위해 요구되는 전기 전력을 제공하도록 구성될 수 있고, 높은 피크 전력 레이저 펄스들을 생성하기 위해 요구되는 전기 전력을 제공하도록 구성되는 적어도 하나의 커패시터(50)를 갖는 커패시터 뱅크 섹션을 포함할 수 있다. 커패시터들(50)은 잡음을 제거하는 AC 필터(42) 및 커패시터들을 충전하는 AC-DC 변환기(44)를 포함하는 전원 장치에 의해 충전된다. 레이저에 공급되는 전기 전력의 적어도 75%는 커패시터들에 의해 전달되어야 하며, 나머지는 AC-DC 변환기로 직접 전달된다. 전기 전력은 잡음을 감소시키기 위해 트위스트 라인들(52, 54)에 의해 레이저(12)에 공급된다. 냉각 시스템은 낮은 평균 전력 레벨을 위한 레이저 냉각을 제공하도록 구성될 수 있고 따라서 냉각 유닛을 필요로 하지 않을 수 있다.

예측성 교정 스케줄링 장치 및 방법

... 광원 내의 광학 디바이스에 관련된 교정을 스케줄링하기 위한 방법이 수행된다. 이러한 방법은 교정 장치 및 예측 제어기를 포함하는 교정 시스템에 의하여 수행될 수 있다. 이러한 방법은, 광학 디바이스가 교정되고 있는 동안에 상기 광학 디바이스와 연관된 속성을 수신하는 단계; 적어도 상기 광학 디바이스 속성에 기반하여 현재 열화 메트릭을 계산하는 단계 - 상기 열화 메트릭은 상기 광학 디바이스의 거동을 모델링함 -; 상기 현재 열화 메트릭에 기반하여 상기 광학 디바이스의 열화가 언제 임계를 초과할지를 추정하는 단계; 및 광학 디바이스 열화의 추정에 적어도 부분적으로 기반하여 상기 광학 디바이스의 교정을 스케줄링하는 단계를 포함한다.

Optical elements with protective undercoating

An apparatus and method are disclosed for an optical element which may comprise a main optical body comprising a crystal containing halogen atoms; a reflectivity coating for changing the reflectivity of a surface of the main body; and, an intermediate protective layer comprising a material containing free halogen atoms. The crystal may comprise an alkaline earth metal and may comprise fluorine atoms, e.g., calcium fluoride or magnesium fluoride. The intermediate protective layer may comprises a material containing free fluorine atoms, e.g., a material doped with fluorine atoms, e.g., doped silica. The intermediate layer comprises an amorphous portion and a polycrystalline portion. The optical element may also comprise a main optical element body; a reflectivity coating comprising a metal halide on an exterior the a surface of the main optical body; and a thin layer of protective outer coating on the reflectivity coating comprising a dense non-porous material thin enough to be transparent ...

METHOD OF CONTROLLING A RADIATION SOURCE AND LITHOGRAPHIC APPARATUS COMPRISING THE RADIATION SOURCE

A method of selecting a periodic modulation (401) to be applied to a variable of a radiation source, wherein the source delivers radiation for projection onto a substrate and wherein there is relative motion between the substrate and the radiation at a scan speed, the method including: for a set of system parameters and for a position on the substrate, calculating a quantity, the quantity being a measure of the contribution to an energy dose (403) delivered to the position that arises from the modulation being applied to the variable of the source, wherein the contribution to the energy dose is calculated as a convolution of: a profile of radiation (402), and a contribution to an irradiance of radiation delivered by the source; and selecting a modulation frequency at which the quantity for the set of system parameters and the position on the substrate satisfies a certain criteria.

DIGITAL PULSE-WIDTH-MODULATION CONTROL OF A RADIO FREQUENCY POWER SUPPLY FOR PULSED LASER

A pulse width modulation method for controlling the output power of a pulsed gas discharge laser powered by a pulsed RF power supply comprises delivering a train of digital pulses to the RF power supply. Each pulse in the train has an incrementally variable duration. The power supply is arranged to deliver a train of RF pulses corresponding in number and duration to the train of digital pulses received. The average power in the RF-pulse train can be varied by incrementally varying the duration of one or more of the digital pulses in the digital pulse train. The train of RF pulses is used to power a gas discharge laser. The gas discharge laser outputs a pulse train corresponding to the RF pulse train.

FAST WAVELENGTH CORRECTION TECHNIQUE FOR A LASER

Electric discharge laser with chirp correction. Fast wavelength chirp correction equipment includes at least one piezoelectric drive and a fast wavelength detection means and has a feedback response time of less than 1.0 millisecond. In a preferred embodiment a simple learning algorithm is described to allow advance tuning mirror adjustment in anticipation of the learned chirp pattern. Techniques include a combination of a relatively slow stepper motor (82) and a very fast piezoelectric driver. In another preferred embodiment, chirp correction is made on a pulse-to-pulse basis where the wavelength of one pulse is measured and the wavelength of the next pulse is corrected based on the measurement. This correction technique is able to function at repetition rates as rapid as 2000 Hz and greater.

Gas discharge laser light source beam delivery unit

A beam delivery unit and method of delivering a laser beam from a lasr light source for excimer or molecular fluorine gas discharge laser systems in the DUV and smaller wavelengths is disclosed, which may comprise: a beam delivery enclosure defining an output laser light pulse beam delivery path from an output of a gas discharge laser to an input of a working apparatus employing the light contained in the output laser light pulse beam; a purge mechanism operatively connected to the beam delivery enclosure; an in-situ beam parameter monitor and adjustment mechanism within the enclosure, comprising a retractable beam redirecting optic; a beam analysis mechanism external to the enclosure; and, a retraction mechanism within the enclosure and operable from outside the enclosure and operative to move the retractable beam redirecting optic from a retracted position out of the beam path to an operative position in the beam path. The BDU may also include a beam attenuator unit contained within the enclosure adjustably mounted within the enclosure for positioning within the beam delivery path. The BDU may have at least two enclosure isolation mechanisms comprising a first enclosure isolation mechanism on a first side of the enclosure from the at least one optic module and a second enclosure isolation mechanism on a second side of the enclosure from the at least one optic module, each respective enclosure isolation mechanism comprising a flapper valve having a metal to metal seating mechanism and a locking pin assembly. A precision offset ratchet driver operative to manipulate actuator mechanisms in difficult to reach locations may be provided. An external kinematic alignment tool may be provided. A method of contamination control for a BDU is disclosed comprising selection of allowable materials and fabrication processes.

Laser frequency control

A radio frequency excited carbon dioxide laser (50) is stabilized by sensing (66) variation in output power to generate a feedback signal (68,78 ) that is employed to vary amplitude of the radio frequency exciting signal from a power source (62). Frequency modulation of the laser output is achieved by varying the amplitude of the radio frequency signal from a power source (62) in response to a frequency modulating control signal from a modulation source (74). Both stabilization and frequency modulation are accomplished by combining the sensed power feedback signal with the frequency modulation control signal in a summing circuit (70) and employing the combined signal to vary magnitude of the radio frequency exciting signal.

METAL VAPOR CIRCULATING SYSTEM

A system for circulating an alkali vapor to operate as, for example, a gain medium in a diode pumped alkali laser. The system includes a pump configured to pump a buffer gas to a metal source. A source heat exchanger heats the alkali metal source to produce a metal vapor that flows with the buffer gas. An action chamber receives the metal vapor and buffer gas combination and contains the combination while the metal vapor performs its required functions. The metal vapor and buffer combination continue to flow to a metal vapor trap and heat exchanger that cools the metal vapor and buffer gas combination. The metal vapor trap collects alkali metal condensate as the combination cools. The diffuser transport channel provides an inflow of clean buffer gas to the pump. The pump provides a circulating gas flow through the closed loop system.

TEMPERATURE CONTROLLABLE GAS LASER OSCILLATOR

A gas laser oscillator according to the present invention comprises a resonator unit, a heat exchanger through which a fluid exchanging heat with a laser gas flows, a chiller for cooling the fluid in the heat exchanger and supplying the fluid to the heat exchanger, and a heat transfer device for transferring heat of the fluid to the resonator unit. The gas laser oscillator further comprises a first flow path for supplying the fluid used for cooling the laser gas in the heat exchanger to the heat transfer device, a second flow path for supplying the fluid cooled by the chiller to the heat transfer device prior to supplying the fluid to the heat exchanger, and a switching valve for switching either one of a first flow path and a second flow path.

Laser processing apparatus carrying out control to reduce consumed power

A laser processing apparatus including a laser oscillator, a laser processing machine, and a control part controlling the laser oscillator and the laser processing machine. The control part includes a preparatory operation part controlling the laser processing machine so as to start a preparatory operation for the laser processing if a preparatory operation command is output and, a mode switching part switching an operating mode of the laser oscillator between a standard standby mode before carrying out the laser processing and an energy saving mode with less consumed power than the standard standby mode, and the mode switching part controls the discharge tube voltage so as to switch the operating mode to the energy saving mode before the preparatory operation command is output and to start a switching operation of the operating mode from the energy saving mode to the standard standby mode when the preparatory operation command is output.

Laser unit having preparatory function for activating the unit and activation method for the unit

A laser unit having a preparatory function for activating the unit and an activation method for the unit, capable of stabilizing the temperature of each component of the laser unit in the preparation stage when the laser unit is activated in a low-temperature or high-temperature environment, and then effectively judging completion of the preparation. During a period of time Ta from T1 to T2, a first trial of laser oscillation is performed. After a period of time Tb in which the laser is not oscillated, a second trial of laser oscillation from T3 to T4. Such an operation is repeated until a predetermined criterion is satisfied. Laser output values P2, P4, P6, .., at the last moment in each trial of laser oscillation are recorded. Then, each difference between the laser outputs at the last moments of two neighboring or continuous trials, is calculated. When the difference is lower than a predetermined criterion value, the preparation of the laser unit is judged to be completed.

Laser machining apparatus and a method of controlling the same

A laser machining apparatus according to the present invention describes characteristics of a laser oscillator (16) with a function among a laser power, a frequency, and a duty ratio, computes an command for a power supply unit (15) in a feed forward control section (14) according to an command based on the function as well as on the power, duty ratio and frequency, computes a command for a power supply unit (15) in the feedback control section (27) from a power command value and a power measurement value from the power sensor (18), and inputs these command to the power supply unit (15). Also the laser machining apparatus detects changes in characteristics in the laser oscillator 16 and corrects a function for characteristics of the laser oscillator (16). ...

GAS LASER OSCILLATOR

PURPOSE: To stabilize the gain distribution of laser light by providing a device for adjusting the density, viscosity, and flow rate of gas such that the Reynolds number of the laser medium gas in a discharge region is less than a specific value. CONSTITUTION: A central processing unit 23 transmits output signals from a flow rate sensor 17, a pressure sensor 18, a temperature sensor 16, and a circulation system flow sensor 19 to an A/D converter 21. The signals are digitized and transferred to a unit 23. The transferred signal is corrected and stored in the unit 23. Alternatively, the unit 23 evaluates the Reynolds number. The unit 23 further sends to a driver 11 an instruction to move a fluid control plate 13 in an opening direction and the amount of movement of the plate 13 when the evaluated Reynolds number is greater than 2300. The driver 11 receivers the instruction and amount of movement of the plate to actuate a control driving mechanism 12. A differential pressure controller 14 ...

Ultra-narrow-band two-chamber high repetition rate discharge gas laser system

LASER OUTPUT CONTROLLER

PURPOSE: To simplify the operation of altering the output intensity of laser beams, by a method wherein the output intensity of laser beams is set in accordance with the pulse rate, and the output set value of laser beams is determined on the basis of a pulse rate set by a pulse rate setter. CONSTITUTION: When the division factor of a rate divider 21 is 1.0, the output of a setter 16 is compared with a feedback signal 11 via time constant circuit 22 and limitter 23; the excitation outputting time (t) becomes coincident with a period T, and the peak laser output Wp becomes equal to the average laser output WA. Next, when the pulse rate D is 0.5, the excitation outputting time (t) is 1/2 of the period T with 2WA=Wp; a point 35 gives the average laser output WA, and a point 36 the peak laser output Wp. On variation of the pulse rate D by the setter 16, the output WA varies in proportion to the pulse rate D, whereas the output Wp is controlled constant. On account of the action of the limitter ...

Gaslaserröhre mit einem Magnetfeld zur Formung des optischen Bündels

HIGH-SPEED AXIAL FLOW TYPE GAS LASER OSCILLATOR

PROCEDURE AND DEVICE FOR THE PRODUCTION OF A LASER BEAM

Method and device for generating a laser beam

METHOD OF FEEDBACK CONTROL OF ELECTRON BEAM LASERS

In a method for producing a beam of radiation such as a laser beam issuing from a gaseous working medium in a working region, it is known for the gas to be subjected to a an electric field and for an ionizing beam to be directed to the gas, ionizing the gas and producing therein secondary electrons sufficient to support laser action. In this invention, the power of the laser radiation is controlled by controlling the power of the electron beam and the electron beam power is controlled by an electrical feedback signal from a radiation detector that detects a fraction of the laser radiation.

LASER LITHOGRAPHY LIGHT SOURCE WITH BEAM DELIVERY

The present invention provides a modular high repetition rate ultraviolet gas discharge laser (4) light source for a production line machine. The system includes an enclosed and purged beam path for delivery the laser beam to a desired location such as the entrance port of the production line machine. In preferred embodiments, the production line machine is a lithography machine (2) and two separate discharge chambers are provided, one of which is a part of a master oscillator producing a very narrow band send beam which is amplified in the second discharge chamber. The MOPA system is capable of output pulse energies approximately double the comparable single chamber laser system with greatly improved beam quality. A pulse stretcher more than doubles the output pulse length resulting in a reduction in pulse power (mJ/ns) as compared to prior art laser systems. This preferred embodiment is capable throughout the operating life of the lithography system, despite substantially degradation ...

Pulse generation in axial pulsed gas laser - voltage pulse rising time is synchronised with gas breakdown, ensuring laser pulse reproducibility

Improvements with the tubes with discharge

LASER A MIROIRS SCELLES EMETTANT SUR PLUSIEURS LONGUEURS D'ONDES

Lasers à miroirs scellés émettant sur plusieurs longueurs d'ondes. Le laser selon la présente invention se présente sous la forme d'un laser monobloc 10 comportant deux parties 16 et 18, la première partie constituant un laser hélium-cadmium, la seconde partie constituant un laser à hélium-néon, les première et seconde parties étant alignées coaxialement et ayant des diamètres intérieurs différents. L'excitation simultanée des deux différentes parties assure une excitation optimale entraînant la production d'un rayonnement laser rouge par la partie hélium-néon et d'un rayonnement laser bleu par la partie héliumnéon-cadmium. Application aux télécopieurs.

PROCEDE POUR AUGMENTER LA FREQUENCE DE REPETITION DES IMPULSIONS D'UN LASER

Procédé pour augmenter la fréquence de répétition des impulsions d'un laser et, en particulier, d'un laser à gaz. Il est caractérisé par le fait que les impulsions commandent, selon une séquence prédéterminée, la décharge de chacun des tubes ou groupes de tubes à décharge de manière telle que chaque tube ou groupe de tubes soit reexcité lorsque sa charge s'est reconstituée. Application notamment à la gravure (scribing) de substrats céramiques.

METHOD AND APPARATUS FOR LASER CONTROL IN A TWO CHAMBER GAS DISCHARGE LASER

A laser control system contains an oscillator gas chamber and an amplifier gas chamber. A first voltage input is operatively connected to deliver electrical pulses to a first pair of electrodes within the oscillator gas chamber and a second pair of electrodes within the amplifier gas chamber. An output of the gas chambers is an energy dose calculated by a trapezoidal window. A control circuit connects to the first voltage input for modifying the first voltage input. A feedback control loop communicates an output of the gas chambers to the control circuit for modifying the first voltage input.

SYSTEM AND METHOD FOR AUTOMATIC GAS OPTIMIZATION IN A TWO-CHAMBER GAS DISCHARGE LASER SYSTEM

A system and method for automatically performing gas optimization after a refill in the chambers of a two chamber gas discharge laser such as an excimer laser. The laser is continuously fired at a low power output, and the gas in the amplifier laser chamber bled until the discharge voltage meets/exceeds a minimum value without dropping the pressure below a minimum value. The power output is increased, and the gas bled again until the voltage and pressure meet/exceed the minimum values. The laser is then fired in a burst pattern that approximates the expected firing of the laser in operation, and the gas bled until the discharge voltage meets/exceeds the minimum value and the output energy meets/exceeds a minimum value, again without dropping the pressure in the chamber below the minimum value. Once the minimum values are provided, the process runs quickly without manual interaction.

Metal vapor circulating system

A system for circulating an alkali vapor to operate as, for example, a gain medium in a diode pumped alkali laser. The system includes a pump configured to pump a buffer gas to a metal source. A source heat exchanger heats the alkali metal source to produce a metal vapor that flows with the buffer gas. An action chamber receives the metal vapor and buffer gas combination and contains the combination while the metal vapor performs its required functions. The metal vapor and buffer combination continue to flow to a metal vapor trap and heat exchanger that cools the metal vapor and buffer gas combination. The metal vapor trap collects alkali metal condensate as the combination cools. The diffuser transport channel provides an inflow of clean buffer gas to the pump. The pump provides a circulating gas flow through the closed loop system.

LASER OSCILLATOR CONTROL CIRCUIT

CONTROLLING APPARATUS FOR CO2 GAS LASER

PURPOSE: To prevent an overshoot and a damping at a rise by a method wherein, at a rise of a laser power waveform, an output of a waveform setting circuit is started at a delayed stage from an output of a laser power detection circuit by using a feedback control operation. CONSTITUTION: While, at a rise of a waveform, an output of a waveform setting circuit 19 is counting a delay time in a delay circuit 27, an output value which has been set in a power setting circuit 12 is input to a bias circuit 15 and a laser power rises by an open-loop control operation. When the circuit 27 executes a counting-up operation and switches 28, 29 of a changeover switching circuit 24 are closed, an output of a laser power detecting circuit 20 and an output of the circuit 12 are input to a non-inverted terminal and an inverted terminal of an error amplification circuit 25; they are compared and amplified in an error amplification amplifier 33; a feedback control operation is started at a delayed stage. COPYRIGHT ...

МОЩНЫЙ ИМПУЛЬСНЫЙ СО2 ЛАЗЕР С САМОИНЖЕКЦИЕЙ ИЗЛУЧЕНИЯ

Генератор импульсов ионизации

Изобретение относится к области лазерной техники и может быть использовано при создании мощных технологических электроразрядных лазеров импульсно-периодического действия на углекислом газе и окиси углерода с несамостоятельным тлеющим разрядом с импульсной емкостной ионизацией. Достигаемый технический результат - расширение технологических возможностей лазера. Генератор импульсов ионизации содержит генератор частоты ионизации, последовательно соединенный с источником ионизации лазера, имеющим приемник излучения, а также шесть резисторов, ограничитель мощности излучения, ограничитель сигнала управления, пороговую схему, генератор низкой частоты, четыре повторителя, усилитель, два тумблера, измеритель мощности излучения, два формирователя, компаратор, ключ и преобразователь напряжение-частота, пять реле и перемычку. 1 ил.

Генератор импульсов ионизации

Изобретение относится к области лазерной техники. Генератор импульсов ионизации содержит генератор частоты ионизации, источник ионизации лазера, приемник излучения, шесть резисторов, ограничитель мощности излучения, ограничитель сигнала управления, пороговую схему, генератор низкой частоты, четыре повторителя, усилитель, тумблер, измеритель мощности излучения, два формирователя, компаратор, ключ и преобразователь напряжение-частота. Первый резистор соединен с входом первого повторителя напряжения, второй резистор соединен с входом компаратора, третий резистор связан с входом второго повторителя напряжения, первый повторитель напряжения соединен с преобразователем напряжение-частота, выход которого связан с входом компаратора. Четвертый резистор соединен с входом ограничителя мощности, пятый резистор связан с входом ограничителя сигнала управления, шестой резистор соединен с входом пороговой схемы. Выход ограничителя мощности соединен с входом третьего повторителя, который соединен с контактом ...

Ein durch eine Vielzahl von Betriebsmodi betriebenes Laserbearbeitungssystem

Laserbearbeitungssystem (10), das umfasst:einen Laseroszillator (12), der dazu ausgebildet ist, Laserlicht (36) zu erzeugen;eine Laserbearbeitungsmaschine (14), die dazu ausgebildet ist, durch den Laseroszillator (12) erzeugtes Laserlicht auf ein Werkstück (W) auszustrahlen, um das Werkstück (W) zu bearbeiten, wobei die Laserbearbeitungsmaschine (14) einen Bewegungsmechanismus (48) umfasst, der dazu ausgebildet ist, um eine Ausstrahlungsposition des Laserlichts auf dem Werkstück (W) zu bewegen;einen Modusumschaltabschnitt (66), der dazu ausgebildet ist,einen Betriebsmodus, der eine dem Laseroszillator (12) zugeführte elektrische Energie bestimmt, umzuschalten zwischen (1) einem Standard-Bereitschaftsmodus , um den Laseroszillator (12) dazu zu veranlassen, vor einem Laserbearbeiten ein Grundentladen auszuführen, um Laserlicht zu erzeugen, das eine geringere Laserleistung aufweist, als bei einem Hauptentladen, und (2) einem Energiesparmodus, in dem das Grundentladen und das Hauptentladen ...

Extreme repetition rate gas discharge laser

Laser spectral engineering for lithographic process

Method and device for generating a laser beam

METHOD AND APPARATUS FOR LASER PROCESSING OF MATERIALS

An improved method of laser processing of a material by directing a laser beam against the material comprises providing the beam with a power waveform with respect to time characterized by a plurality of peak power pulses and a predetermined CW power level between the peak power pulses such that the average beam power maintained is equal to or greater than the predetermined CW power level of the beam. The method is particularly adapted for cutting material such as aluminum, copper and stainless steel with improved cut quality at a relatively high cutting speed and for welding.

HIGH-SPEED AXIAL FLOW TYPE GAS LASER OSCILLATOR

There is described a high speed axial flow type gas laser oscillator in which the flow rates of the laser gas inside the laser tubes will be more or less equal, in which the lengths of the recirculation paths from the laser tubes to the heat exchanger or cooler will remain approximately equal even if the number of tubes is increased or decreased. Further, the electrical discharges between the electrodes of the laser tubes and the heat exchanger are suppressed, reducing the loss of electric power used for injection and suppressing excessive heating of the laser gas, and, in addition, reducing the additional load on the heat exchanger or cooler. Also the removal and replacement of the electrodes in the laser tubes can be carried out easily without displacing the tubes in the axial direction. The vibrations in the blower which is used to circulate laser gas to the laser tubes are not transmitted to each of the tubes, and, moreover, it is possible to compensate for thermal deformation in the ...

MULTIPLE PULSE TEA LASER

MULTIPLE PULSE TEA LASER A laser system capable of producing multiple pulses comprising a single optical resonator having multiple dischange regions and multiple sets of electrodes and preionizers. The optical resonator is folded and the beam passes through all of the discharge regions. Since the multiple discharges occur within the same resonator, multiple identical pulses are produced and since the discharge regions are separated, the shock wave and medium inhomogeneity produced by a discharge in one discharge region will not disturb the others. The overall mirror separation and electrode spacing define a Fresnel number suited for single transverse mode operation.

GAS DISCHARGE LASER CONTROL SYSTEMS USING MULTIPLE CPU'S WITH SHARED MEMORY ON A COMMON BUS

A laser control system with multiple CPU's having shared memory on a common bus to provide high performance, relatively lost-cost, laser control. In the system disclosed, a first CPU which handles most, if not all, communication to and from the laser control system and which may communicate with one or more additional CPU's through the shared memory, so as to be capable of providing the software and operating commands to one or more additional processors on the common bus. A second processor is provided to control the intensity and repetition rate of a gas laser responsive to the program and commands made available thereto through the shared memory by the first processor. In addition, the second processor may directly respond to specific controls provided thereto to allow operation of the laser directly in response to control signals provided thereto from the outside, rather than based on parameters provided thereto by the first processor. Additional processors may beprovided on the common ...

Gas laser apparatus equipped with power calculation unit

Gas laser apparatus

PROCESS AND CONTROL DEVICE OF the INTENSITY OF the BEAM OF EXIT Of a LASER

Pulse generation in axial pulsed gas laser - voltage pulse rising time is synchronised with gas breakdown, ensuring laser pulse reproducibility

Multiline emission integral mirror laser

LASER A IMPULSIONS MULTIPLES

L'INVENTION CONCERNE LES LASERS FONCTIONNANT EN REGIME D'IMPULSIONS. UN LASER CAPABLE DE PRODUIRE DES IMPULSIONS MULTIPLES COMPREND UN SEUL RESONATEUR OPTIQUE DEFINI PAR DES MIROIRS 30, 32, 34, 36, AVEC PLUSIEURS REGIONS DE DECHARGE ET PLUSIEURS JEUX D'ELECTRODES 12, 14; 16, 18 ET DE DISPOSITIFS DE PRE-IONISATION 21, 23. LE RESONATEUR OPTIQUE EST REPLIE ET LE FAISCEAU TRAVERSE TOUTES LES REGIONS DE DECHARGE. DU FAIT DE L'UTILISATION D'UN SEUL RESONATEUR, LES IMPULSIONS MULTIPLES PRODUITES PAR LES DIFFERENTES REGIONS DE DECHARGE SONT IDENTIQUES. LA SEPARATION DES REGIONS DE DECHARGES FAIT QUE L'ONDE DE CHOC ET LE DEFAUT D'HOMOGENEITE DU MILIEU AMPLIFICATEUR PRODUITS PAR UNE DECHARGE NE PERTURBENT PAS D'AUTRES DECHARGES. APPLICATION A L'INSTRUMENTATION AERONAUTIQUE.

레이저 시스템

... 이 레이저 시스템은, 트리거 신호를 수신하고, 트리거 신호를 수신했을 때부터 제1 지연 시간이 경과하였음을 나타내는 제1 지연 신호와, 트리거 신호를 수신했을 때부터 제2 지연 시간이 경과하였음을 나타내는 제2 지연 신호를 출력하는 지연 회로부와, 제1 지연 신호를 수신하고, 제1 지연 신호를 수신했을 때부터 제1 보정 시간이 경과하였음을 나타내는 제1 스위치 신호를 출력하는 제1 트리거 보정부와, 제2 지연 신호를 수신하고, 제2 지연 신호를 수신했을 때부터 제2 보정 시간이 경과하였음을 나타내는 제2 스위치 신호를 출력하는 제2 트리거 보정부와, 지연 회로부와, 제1 트리거 보정부와, 제2 트리거 보정부에 공통의 클럭 신호를 생성하는 클럭 생성기를 구비해도 된다.

METHOD AND APPARATUS FOR LASER CONTROL IN A TWO CHAMBER GAS DISCHARGE LASER

GAS DISCHARGE ULTRAVIOLET WAVEMETER WITH ENHANCED ILLUMINATION

LASER WAVELENGTH CONTROL UNIT WITH PIEZOELECTRIC DRIVER

An electric discharge laser with fast wavelength correction. Fast wavelength correction equipment includes at least one piezoelectric drive and a fast wavelength measurement system and fast feedback response times. In a preferred embodiment, equipment is provided to control wavelength on a slow time frame of several milliseconds, on an intermediate time from of about one to three millisecond and on a very fast time frame of a few microseconds. Techniques include a combination of a relatively slow stepper motor and a very fast piezoelectric driver for tuning the laser wavelength using a tuning mirror. A preferred control technique is described (utilizing a very fast wavelength monitor) to provide the slow and intermediate wavelength control and a piezoelectric load cell in combination with the piezoelectric driver to provide the very fast (few microseconds) wavelength control.

Very narrow band, two chamber, high rep-rate gas discharge laser system

An oscillator-amplifier gas discharge laser system and method is disclosed which may comprise a first laser unit which may comprise a first discharge region which may contain an excimer or molecular fluorine lasing gas medium; a first pair of electrodes defining the first discharge region containing the lasing gas medium, a line narrowing unit for narrowing a spectral bandwidth of output laser light pulse beam pulses produced in said first discharge region; a second laser unit which may comprise a second discharge chamber which may contain an excimer or molecular fluorine lasing gas medium; a second pair of electrodes defining the second discharge region containing the lasing gas medium; a pulse power system providing electrical pulses to the first pair of electrodes and to the second pair of electrodes producing gas discharges in the lasing gas medium between the respective first and second pair of electrodes, and laser parameter control mechanism modifying a selected parameter of a selected ...

Gas laser apparatus, and method and device for monitoring blower

A gas laser apparatus including a laser oscillating section including a blower forcibly circulating a medium gas in a medium circuit, and a blower monitoring section monitoring a maintenance state of the blower. The blower includes a lubricant storage chamber storing a lubricant, and a lubricant monitoring chamber connected to the lubricant storage chamber to ensure fluidic communication therebetween at a position lower than an oil level of a lubricant having a predetermined appropriate volume and stored in the lubricant storage chamber. The blower monitoring section includes a lubricant detecting section detecting that a lubricant stored in the lubricant storage chamber of the blower flows into the lubricant monitoring chamber and at least a part of the lubricant is present in the lubricant monitoring chamber, as a result of internal-pressure change in the lubricant storage chamber, and a lubricant-change judging section monitoring whether the lubricant detecting section detects a presence ...

Laser spectral engineering for lithographic process

An integrated circuit lithography technique called spectral engineering by Applicants, for bandwidth control of an electric discharge laser. In a preferred process, a computer model is used to model lithographic parameters to determine a desired laser spectrum needed to produce a desired lithographic result. A fast responding tuning mechanism is then used to adjust center wavelength of laser pulses in a burst of pulses to achieve an integrated spectrum for the burst of pulses approximating the desired laser spectrum. The laser beam bandwidth is controlled to produce an effective beam spectrum having at least two spectral peaks in order to produce improved pattern resolution in photo resist film. Line narrowing equipment is provided having at least one piezoelectric drive and a fast bandwidth detection control system having a time response of less than about 2.0 millisecond. In a preferred embodiment, a wavelength tuning mirror is dithered at dither rates of more than 500 dithers per second ...

Gas laser tube with a magnetic field for optical beam shaping

CONTROL METHOD FOR LASER ROBOT

PURPOSE: To prevent laser light from being carelessly radiated to a long distant part by applying interlocking to generate a condition impossible to irradiate the laser light when a tilt angle in the horizontal surface of a laser nozzle is smaller than a predetermined value. CONSTITUTION: Each articulatory angle of a robot 1 is always caught and stored. An angle in a laser nozzle 2 for the horizontal surface is detected from each articulatory angle. When this angle is not more than a predetermined value, that is, when laser light, irradiated from the laser nozzle 2, is irradiated at an angle not more than the predetermined value for the horizontal surface, interlocking is applied to generate an irradiation impossible condition, and misirradiation is prevented. As a result, the laser light is prevented from being radiated to a long distant part at an angle less than the predetermined value in relation to the horizontal surface, and no harm is given to a human body and a device in the periphery ...

МАЛОГАБАРИТНЫЙ ИЗЛУЧАТЕЛЬ ГЕЛИЙ-НЕОНОВОГО ЛАЗЕРА

Полезная модель относится к лазерной технике. Малогабаритный излучатель гелий-неонового лазера содержит управляющий элемент и корпус из немагнитного материала. Внутри корпуса расположен активный элемент коаксиальной конструкции с разрядным капилляром с двумя продольными модами. На внешней поверхности корпуса размещён по крайней мере один магнит. Управляющий элемент выполнен в виде нагревательного элемента, размещённого на внешней поверхности активного элемента, а магнит выполнен из неодимового материала и ориентирован для формирования в разрядном капилляре магнитного поля, направленного перпендикулярно разрядному капилляру, величиной 0,1 мТл ≤ Н ≤ 50 мТл. Технический результат заключается в обеспечении высокой мощности излучения, а также высокой стабильности мощности и оптической частоты излучения. 3 ил.

LASER CONTROL DEVICE WITH INTERVAL TIMER

VERFAHREN UND VORRICHTUNG ZUR ERZEUGUNG EINES LASERSTRAHLES

MITTELS GASENTLADUNG GEPUMPTER LASER

METHOD OF REGULATING LIGHT EMITTING POWER OF LASER AND APPARATUS FOR EFFECTING SAME

... 1365049 Lasers M K DYATLOV E P OSTAPCHENKO V A STEPANOV and J N KULIKOV 10 July 1973 32734/73 Heading H1C The output power of a gas laser using a mixture of an inert gas and a vapour of a chemical element as the active medium is regulated- and may be enhanced-by superposing an alternating current on the D.C. current producing a gas discharge in the active medium, the alternating current being supplied by an A.C. source the frequency of which is adjusted to select the output power required. As shown in Fig. 3 the laser 1 comprises a gas discharge tube 5 formed with Brewster windows 6 which is located between external resonator mirrors 7, the gas active medium content comprising He-Se, He-Zn, He-Mg, He-Hg or He-Cd. The gas discharge electrodes 8 are connected to the series combination of a D.C. current source 3 and a transformer secondary winding 11, the transformer primary 12 being connected to an A.C. source 4 adjustable in frequency from 40 to 220 kHz. In a modification, Fig. 4 (not shown ...

Improvements in or relating to optical maser systems

... 1,061,613. Lasers. SIEMENS & HALSKE A.G. April 28, 1964 [April 30, 1963], No. 17495/64. Heading H1C. A tube 1 contains a gaseous active medium such as neon the atoms or molecules of which are raised to a chosen energy level by collision with electrons freed by ionising either the active medium or a second gas, the free electrons being propagated electromagnetically along the tube with controlled uniform velocity. In the single gas embodiment electrons are liberated by applying a D.C. potential to electrodes 15, 16 'the electrons liberated by ionisation being propagated along the tube by a travelling wave field produced by alternating current in a spiral delay line 2, as shown, or in a waveguide. The electron velocity is so chosen that the kinetic energy yielded up by a free electron upon collision with an atom or molecule of the active medium is substantially equal to the specific energy required to excite the atom or molecule to a chosen level of population inversion. The current in wire ...

PROCEDURE AND DEVICE FOR THE TREATMENT OF MATERIALS OF MEANS LASER.

Electric discharge laser with active wavelength chirp correction

Extreme repetition rate gas discharge laser with improved blower motor

Gas laser capable of modulation

Gas laser comprises a plasma tube, means to produce a discharge current in the tube to form a laser output signal which has a negative variation zone in function with the discharge current and means to vary, in a controllable manner, the current in the zone so that it causes variation of the laser output signal.

PROCEDE ET APPAREIL DE PRODUCTION D'IMPULSIONS LASER A REPRODUCTIBILITE ELEVEE

L'invention concerne un procédé et un appareil de production d'impulsions laser à reproductibilité élevée. L'appareil comprend un tube laser LT comportant deux électrodes A et B, l'électrode A recevant des impulsions de tension par l'intermédiaire d'un conducteur H. Entre la source d'énergie et le conducteur H est placée une bobine d'induction L1 . Autour du tube H est placé un tube de protection ST formant, avec le conducteur H, un condensateur. Le circuit LC réglable ainsi obtenu permet de rendre égaux le temps de montée des impulsions de tension appliquées à l'électrode A et les temps de claquage du tube de décharge LT. On obtient alors une reproductibilité des impulsions meilleure que 1 % à un taux de répétition de 400 Hz ...

EXTERNALLY BIASED RING LASER

Very narrow band, two chamber, high rep rate gas discharge laser system

An injection seeded modular gas discharge laser system capable of producing high quality pulsed laser beams at pulse rates of about 4,000 Hz or greater and at pulse energies of about 5 mJ or greater. Two separate discharge chambers are provided, one of which is a part of a master oscillator producing a very narrow band seed beam which is amplified in the second discharge chamber. The chambers can be controlled separately permitting separate optimization of wavelength parameters in the master oscillator and optimization of pulse energy parameters in the amplifying chamber. A preferred embodiment in an ArF excimer laser system configured as a MOPA and specifically designed for use as a light source for integrated circuit lithography. In the preferred MOPA embodiment, each chamber comprises a single tangential fan providing sufficient gas flow to permit operation at pulse rates of 4000 Hz or greater by clearing debris from the discharge region in less time than the approximately 0.25 milliseconds ...

Control system for a two chamber gas discharge laser

The present invention provides a control system for a modular high repetition rate two discharge chamber ultraviolet gas discharge laser. In preferred embodiments, the laser is a production line machine with a master oscillator producing a very narrow band seed beam which is amplified in the second discharge chamber. Feedback timing control techniques are provided for controlling the relative timing of the discharges in the two chambers with an accuracy in the range of about 2 to 5 billionths of a second even in burst mode operation. This MOPA system is capable of output pulse energies approximately double the comparable single chamber laser system with greatly improved beam quality.

GAS LASER APPARATUS

A gas laser apparatus may include: a laser chamber connected through a first control valve to a first laser gas supply source that supplies a first laser gas containing a halogen gas and connected through a second control valve to a second laser gas supply source that supplies a second laser gas having a lower halogen gas concentration than the first laser gas; a purification column that removes at least a part of the halogen gas and a halogen compound from at least a part of a gas exhausted from the laser chamber; a booster pump, connected through a third control valve to the laser chamber, which raises a pressure of a gas having passed through the purification column to a gas pressure that is higher than an operating gas pressure of the laser chamber; and a controller that calculates, on a basis of a first amount of a gas supplied from the booster pump through the third control valve to the laser chamber, a second amount of the first laser gas that is to be supplied to the laser chamber ...

METHOD AND APPARATUS FOR LASER CONTROL IN A TWO CHAMBER GAS DISCHARGE LASER

A laser control system contains an oscillator gas chamber and an amplifier gas chamber. A first voltage input is operatively connected to deliver electrical pulses to a first pair of electrodes within the oscillator gas chamber and a second pair of electrodes within the amplifier gas chamber. An output of the gas chambers is an energy dose calculated by a trapezoidal window. A control circuit connects to the first voltage input for modifying the first voltage input. A feedback control loop communicates an output of the gas chambers to the control circuit for modifying the first voltage input.

Gas laser apparatus carrying out improved startup process

A gas laser apparatus includes a receptacle for enclosing a laser gas, a laser oscillator that emits a laser beam, a pressure detecting unit that detects gas pressure inside the receptacle, an exhausting unit that discharges a gas from the receptacle, a feeding unit that supplies a laser gas into the receptacle, a pressure storing unit configured to store the pressure detected by the pressure detecting unit and retain stored information even when a power supply is shut off, a comparing unit that compares pressure inside the receptacle when the gas laser apparatus has stopped suddenly with pressure inside the receptacle when the gas laser apparatus is restarted thereafter, and a determining unit that determines whether or not a gas should be discharged from the receptacle and whether or not the laser gas should be supplied into the receptacle based on the result of the comparison.

Laser processing system operating by plurality of operation modes

A laser processing system able to realize both reduction of the power consumption and shortening of the cycle time. The laser processing system is provided with a laser oscillator, a laser processing machine which has a movement mechanism which makes the irradiation position of the laser light on the workpiece move, a mode switching part which switches an operation mode of the laser oscillator between a standard-standby mode and an energy saving mode, a movement controller controlling the movement mechanism so as to place the irradiation position at a process start point placed at a non-product region of the workpiece, and a switching controller controlling the mode switching part to switch the operation mode from the energy saving mode to the standard-standby mode when placing the irradiation position at the process start point.

Gas laser tube with a magnetic field for optical beam shaping

A gas laser oscillator of easy maintenance which is capable of switching a beam mode at high speed. Electric discharge sections (3a,3b) in which gas medium is flown (7) are formed in an optical resonating space in an electric discharge tube between a rear mirror (4a) and an output mirror (4b). Electrodes (2a,2b) are connected to electric discharge power sources (1a,1b) (alternative current or direct current power sources). Coils (8a-8d) are wound around the electric discharge tube at the respective electric discharge sections and excited by coil excitation circuits (9a-9d). Directions and intensities of the excitation currents from the coil excitation circuits are controlled by a controller (10). Regions in which the electric discharge currents flow between the electrodes in the respective electric discharge sections are varied by magnetic fields generated by the coils in accordance with the directions and intensities of the excitation currents of the coils, to thereby control the beam ...

GAS LASER FOR EXPOSURE

PROBLEM TO BE SOLVED: To provide a long-pulse gas laser for exposure which is more improved in laser oscillation efficiency and stability by added xenon gas. SOLUTION: This long-pulse gas laser for exposure has a pair of discharge electrodes 2 arranged in a laser chamber 1 and emits laser light having a laser pulse width (Tis) of ≥40 ns by exciting a laser gas which is enclosed in the chamber 1 and contains the xenon gas at a partial pressure ratio of, at least, 2-100 ppm by causing discharge between the electrodes 2. In this laser, the laser gas is heated at least when the laser light is emitted. COPYRIGHT: (C)2002,JPO ...

МОЩНЫЙ ИМПУЛЬСНЫЙ СО-ЛАЗЕР С САМОИНЖЕКЦИЕЙ ИЗЛУЧЕНИЯ

FIELD: electricity. SUBSTANCE: invention relates to laser equipment. CO 2 laser comprises an unstable laser cavity in the form of a first optical resonator having a semi-transparent output coupler, a laser medium in the unstable laser cavity, and means for exciting the laser medium. Laser further comprises a second optical resonator optically coupled with the unstable laser cavity beyond the light aperture of the output coupler, wherein the second resonator comprises at least one focusing member, and wherein the optical length of the second optical resonator is equal to or is a multiple of the optical length of first optical resonator. Laser further comprises a Q-switching device arranged in the focal plane of said focusing member, and means for synchronising operation of the means for exciting the laser medium with operation of the Q-switching device. EFFECT: technical result is enabling increase in radiation power. 9 cl, 5 dwg РОССИЙСКАЯ ФЕДЕРАЦИЯ (19) RU (11) (13) 2 657 345 C2 (51) МПК H01S 3/223 (2006.01) H01S 3/082 (2006.01) H01S 3/11 (2006.01) ФЕДЕРАЛЬНАЯ СЛУЖБА ПО ИНТЕЛЛЕКТУАЛЬНОЙ СОБСТВЕННОСТИ (12) ОПИСАНИЕ ИЗОБРЕТЕНИЯ К ПАТЕНТУ (52) СПК H01S 3/2232 (2018.02); H01S 3/082 (2018.02); H01S 3/11 (2018.02) (21)(22) Заявка: 2015132844, 16.01.2014 (24) Дата начала отсчета срока действия патента: (73) Патентообладатель(и): ГИПЕРМЕМО ОЙ (FI) Дата регистрации: 13.06.2018 R U 16.01.2014 (72) Автор(ы): КИЙКО Вадим (FI) (56) Список документов, цитированных в отчете о поиске: US 5173916 A1, 22.12.1992. US 6292505 B1, 18.09.2001. US 5157684 A1, 20.10.1992. RU 2321118 C2, 27.03.2008. 16.01.2013 FI 20135052 (43) Дата публикации заявки: 22.02.2017 Бюл. № 6 (45) Опубликовано: 13.06.2018 Бюл. № 17 (85) Дата начала рассмотрения заявки PCT на национальной фазе: 17.08.2015 2 6 5 7 3 4 5 Приоритет(ы): (30) Конвенционный приоритет: FI 2014/050035 (16.01.2014) C 2 C 2 (86) Заявка PCT: (87) Публикация заявки PCT: R U 2 6 5 7 3 4 5 WO 2014/111626 (24.07.2014) Адрес для переписки: ...

Remotely Induced Atmospheric Lasing

A laser pulse from an ultrashort pulse laser (USPL) is fired into the atmosphere. The USPL pulse is configured to generate a plasma filament at a predefined target in the atmosphere, in which free, or “seed,” electrons are generated by multi-photon or tunneling ionization of the air molecules in the filament. A second pulse is fired into the atmosphere to form a heater beam that impinges on the plasma filament and thermalizes the seed electrons within the plasma filament, leading to the collisional excitation of the electrons in the filament. The excited electrons collisionally excite various electronic and vibrational states of the air molecules in the filament, causing population inversions and lasing, e.g., exciting the C 3 Π u →B 3 Π g (v=0→0) transition of the N 2 in the atmosphere to cause lasing at 337 nm.

Gas laser apparatus equipped with power calculation unit

Disclosed is a gas laser apparatus having: a first estimation unit which calculates an estimate of input power to the laser power supply device by using the output current value and output voltage value of the DC power supply unit and also using the efficiency of conversion from input power to output power by the DC power supply unit; a second estimation unit which calculates an estimate of input power to the driving device by using the output current value of the driving device; and a power calculation unit which calculates the power consumption value of the gas laser apparatus, based on the estimate of the input power to the laser power supply device and the estimate of the input power to the driving device.

LASER SYSTEM

The laser system may include a delay circuit unit, first and second trigger-correction units, and a clock generator. The delay circuit unit may receive a trigger signal, output a first delay signal obtained by delaying the trigger signal by a first delay time, and output a second delay signal obtained by delaying the trigger signal by a second delay time. The first trigger-correction unit may receive the first delay signal and output a first switch signal obtained by delaying the first delay signal by a first correction time. The second trigger-correction unit may receive the second delay signal and output a second switch signal obtained by delaying the second delay signal by a second correction time. The clock generator may generate a clock signal that is common to the delay circuit unit and the first and second trigger-correction units. 1. A laser system comprising:laser apparatuses configured to emit respective pulse laser beams;a beam bundling device configured to bundle the pulse laser beams each emitted from a corresponding laser apparatus of the laser apparatuses and to emit a bundled laser beam to an exposure apparatus; and receive target energy of the bundled laser beam and target pulse waveform of the bundled laser beam from the exposure apparatus,', 'calculate target pulse energy for each of the pulse laser beams emitted from the corresponding laser apparatus based on the target energy of the bundled laser beam,', 'calculate target delay time for each of the pulse laser beams emitted from the corresponding laser apparatus based on the target pulse waveform of the bundled laser beam, and', 'send, to the corresponding laser apparatus, the target pulse energy for a corresponding pulse laser beam of the pulse laser beams emitted from the corresponding laser apparatus and the target delay time for the corresponding pulse laser beam emitted from the corresponding laser apparatus., 'a laser system controller configured to'}2. The laser system according to claim ...

SYSTEM AND METHOD FOR GENERATING EXTREME ULTRAVIOLET LIGHT

A system includes a chamber, a laser beam apparatus configured to generate a laser beam to be introduced into the chamber, a laser controller for the laser beam apparatus to control at least a beam intensity and an output timing of the laser beam, and a target supply unit configured to supply a target material into the chamber, the target material being irradiated with the laser beam for generating extreme ultraviolet light. 1. A system comprising:a laser system configured to generate a pre-pulse laser beam with a pulse duration of less than 1 ns, and a main pulse laser beam;a target supply unit configured to supply a target material to be irradiated with the pre-pulse laser beam and the main pulse laser beam for generating extreme ultraviolet light; anda laser controller configured to control the laser system such that a fluence of the pre-pulse laser beam is lower than a fluence of the main pulse laser beam and a beam intensity of the pre-pulse laser beam is higher than a beam intensity of the main pulse laser beam.2. The system according to claim 1 , wherein the controller is configured to control the laser system such that a pulse energy of the pre-pulse laser beam is 0.25 mJ or higher and 2 mJ or lower.3. The system according to claim 1 , wherein the controller is configured to control the laser system such that a delay time from irradiation of the target material with the pre-pulse laser beam to irradiation of the target material with the main pulse laser beam is 0.5 μs or longer and 1.8 μs or shorter.4. The system according to claim 1 , wherein the controller is configured to control the laser system such that a delay time from irradiation of the target material with the pre-pulse laser beam to irradiation of the target material with the main pulse laser beam is 0.7 μs or longer and 1.6 μs or shorter.5. The system according to claim 1 , wherein the controller is configured to control the laser system such that a delay time from irradiation of the target ...

GAS LASER APPARATUS

A gas laser apparatus may include: a laser chamber connected through a first control valve to a first laser gas supply source that supplies a first laser gas containing a halogen gas and connected through a second control valve to a second laser gas supply source that supplies a second laser gas having a lower halogen gas concentration than the first laser gas; a purification column that removes at least a part of the halogen gas and a halogen compound from at least a part of a gas exhausted from the laser chamber; a booster pump, connected through a third control valve to the laser chamber, which raises a pressure of a gas having passed through the purification column to a gas pressure that is higher than an operating gas pressure of the laser chamber; and a controller that calculates, on a basis of a first amount of a gas supplied from the booster pump through the third control valve to the laser chamber, a second amount of the first laser gas that is to be supplied to the laser chamber and controls the first control valve on a basis of a result of the calculation of the second amount. 1. A gas laser apparatus comprising:a laser chamber connected through a first control valve to a first laser gas supply source that supplies a first laser gas containing a halogen gas and connected through a second control valve to a second laser gas supply source that supplies a second laser gas having a lower halogen gas concentration than the first laser gas;a purification column that removes at least a part of the halogen gas and a halogen compound from at least a part of a gas exhausted from the laser chamber;a booster pump, connected through a third control valve to the laser chamber, which raises a pressure of a gas having passed through the purification column to a gas pressure that is higher than an operating gas pressure of the laser chamber; anda controller that calculates, on a basis of a first amount of a gas supplied from the booster pump through the third control ...

LASER UNIT AND NON-TRANSITORY COMPUTER-READABLE STORAGE MEDIUM

There may be provided a laser unit including a display configured to display one or both of electric power consumed by the laser unit and electric energy consumed by the laser unit. 1. A laser unit comprising:a pair of electrodes;a fan configured to make flow of gas fed to a clearance between the electrodes;a motor configured to rotate the fan; anda display configured to display one or both of electric power consumed by the laser unit and electric energy consumed by the laser unit,the electric power consumed by the laser unit including electric power consumed by the motor,the electric energy consumed by the laser unit including electric energy consumed by the motor,the electric power consumed by the motor being calculated based on pressure of the gas fed to the clearance between the electrodes, andthe electric energy consumed by the motor being calculated based on the pressure of the gas fed to the clearance between the electrodes.2. The laser unit according to claim 1 , further comprising a charger configured to apply a voltage between the electrodes claim 1 , whereinthe electric power consumed by the laser unit includes one or more of electric power consumed by the charger, the electric power consumed by the motor, and a sum of the electric power consumed by the charger and the electric power consumed by the motor, andthe electric energy consumed by the laser unit includes one or more of electric energy consumed by the charger, the electric energy consumed by the motor, and a sum of the electric energy consumed by the charger and the electric energy consumed by the motor.3. The laser unit according to claim 2 , wherein the electric energy consumed by the charger is obtained by integrating the electric energy consumed through applying the voltage to the pair of electrodes.4. The laser unit according to claim 2 , further comprising a standby-power supply configured to supply the laser unit with standby electric power claim 2 , whereinthe electric power consumed by ...

SYSTEM AND METHOD FOR GENERATING EXTREME ULTRAVIOLET LIGHT

A system includes a chamber, a laser beam apparatus configured to generate a laser beam to be introduced into the chamber, a laser controller for the laser beam apparatus to control at least a beam intensity and an output timing of the laser beam, and a target supply unit configured to supply a target material into the chamber, the target material being irradiated with the laser beam for generating extreme ultraviolet light. 1. An extreme ultraviolet light generation system configured to irradiate a target with a first pulse laser beam and a second pulse laser beam to turn the target into plasma thereby generating extreme ultraviolet light , comprising:a chamber having at least one aperture configured to introduce the first pulse laser beam and the second pulse laser beam;a target supply unit configured to supply the target to a predetermined region in the chamber;a first laser apparatus configured to output the first pulse laser beam with which the target in the chamber is irradiated so as to make the target be diffused in a shape having a first length in a direction in which the first pulse laser beam travels and a second length in a direction perpendicular to the direction in which the first pulse laser beam travels, the first length being shorter than the second length; anda second laser apparatus configured to output the second pulse laser beam with which the target which has been irradiated with the first pulse laser beam is further irradiated.2. The extreme ultraviolet light generation system according to claim 1 , wherein a fluence of the second pulse laser beam is 150 J/cmor higher and 300 J/cmor lower.3. The extreme ultraviolet light generation system according to claim 1 , wherein the target is supplied in the form of a droplet.4. The extreme ultraviolet light generation system according to claim 3 , wherein a diameter of the droplet is equal to or greater than 12 μm and equal to or smaller than 40 μm.5. The extreme ultraviolet light generation system ...

Generation of VUV, EUV, and X-ray Light Using VUV-UV-VIS Lasers

A method for extending and enhancing bright coherent high-order harmonic generation into the VUV-EUV-X-ray regions of the spectrum involves a way of accomplishing phase matching or effective phase matching of extreme upconversion of laser light at high conversion efficiency, approaching 10in some spectral regions, and at significantly higher photon energies in a waveguide geometry, in a self-guiding geometry, a gas cell, or a loosely focusing geometry, containing nonlinear medium. The extension and enhancement of the coherent VUV, EUV, X-ray emission to high photon energies relies on using VUV-UV-VIS lasers of shorter wavelength. This leads to enhancement of macroscopic phase matching parameters due to stronger contribution of linear and nonlinear dispersion of both atoms and ions, combined with a strong microscopic single-atom yield. 1. The method of generating coherent emission within the VUV , EUV , and X-ray region of the spectrum comprising the steps of:(a) providing a nonlinear medium comprising a gas for high harmonic generation (HHG) of laser light;(b) selecting the pressure of the nonlinear medium;{'sup': 14', '2, '(c) generating a laser driving pulse having a selected wavelength within the VUV-UV-VIS region of the spectrum and a selected peak intensity above 5×10W/cm; and'}(d) focusing the driving pulse into the nonlinear medium to cause HHG upconversion resulting in a generated pulse within a selected range within the VUV, EUV, and X-ray region of the spectrum;wherein the steps of selecting the medium pressure and generating the driving pulse having the selected wavelength and the selected peak intensity effectively phase match the driving pulse and the generated pulse sufficiently to result in a coherent generated pulse wherein the coherence length is comparable to the absorption depth.2. The method of wherein the selected wavelength and the selected peak intensity of the driving pulse result in significant ionization of the nonlinear medium.3. The ...

LASER APPARATUS, EUV LIGHT GENERATION SYSTEM, AND METHOD OF CONTROLLING LASER APPARATUS

A laser apparatus may include: an optical amplifier configured to amplify a laser beam outputted from a master oscillator; an optical-amplifier power supply configured to supply an alternating current for optical amplification to the optical amplifier; and a laser controller. The optical-amplifier power supply may include: an alternating current generation circuit including an inverter circuit configured to change output amplitude in accordance with a duty cycle, the alternating current generation circuit being configured to generate the alternating current from an output of the inverter circuit; and a power supply control circuit configured to hold control information defining correspondence relations between command values from the laser controller and duty cycles of the inverter circuit, determine a duty cycle corresponding to a command value received from the laser controller based on the control information, and provide the determined duty cycle to the inverter circuit. 1. A laser apparatus configured to generate a pulse laser beam , the laser apparatus comprising:a master oscillator configured to output a pulse laser beam;an optical amplifier configured to amplify the laser beam outputted from the master oscillator;an optical-amplifier power supply configured to supply an alternating current for optical amplification to the optical amplifier; anda laser controller configured to control the master oscillator and the optical-amplifier power supply, an alternating current generation circuit including an inverter circuit configured to change output amplitude in accordance with a duty cycle, the alternating current generation circuit being configured to generate the alternating current from an output of the inverter circuit; and', 'a power supply control circuit configured to hold control information defining correspondence relations between command values from the laser controller and duty cycles of the inverter circuit, determine a duty cycle corresponding to a ...

GAS LASER APPARATUS

A gas laser apparatus may include: a laser chamber connected through a first control valve to a first laser gas supply source that supplies a first laser gas containing a halogen gas and connected through a second control valve to a second laser gas supply source that supplies a second laser gas having a lower halogen gas concentration than the first laser gas; a purification column that removes at least a part of the halogen gas and a halogen compound from at least a part of a gas exhausted from the laser chamber; a booster pump, connected through a third control valve to the laser chamber, which raises a pressure of a gas having passed through the purification column to a gas pressure that is higher than an operating gas pressure of the laser chamber; and a controller that calculates, on a basis of a first amount of a gas supplied from the booster pump through the third control valve to the laser chamber, a second amount of the first laser gas that is to be supplied to the laser chamber and controls the first control valve on a basis of a result of the calculation of the second amount. 1. A gas purification system configured to purify exhaust gas exhausted from an excimer laser apparatus using laser gas including xenon gas and supply the exhaust gas having been purified to the excimer laser apparatus , the gas purification system comprising:a xenon-adding unit configured to add xenon gas to the exhaust gas to increase a xenon gas concentration in the exhaust gas.2. The gas purification system according to claim 1 , whereinthe excimer laser apparatus is connected to a first gas supply source supplying laser gas including xenon gas at a first concentration, andthe xenon-adding unit is connected to a second gas supply source supplying laser gas including xenon gas at a second concentration higher than the first concentration.3. The gas purification system according to claim 1 , further comprising:a xenon gas concentration reducing unit configured to reduce a xenon ...

Gas laser apparatus

A gas laser apparatus may include: a laser chamber connected through a first control valve to a first laser gas supply source that supplies a first laser gas containing a halogen gas and connected through a second control valve to a second laser gas supply source that supplies a second laser gas having a lower halogen gas concentration than the first laser gas; a purification column that removes at least a part of the halogen gas and a halogen compound from at least a part of a gas exhausted from the laser chamber; a booster pump, connected through a third control valve to the laser chamber, which raises a pressure of a gas having passed through the purification column to a gas pressure that is higher than an operating gas pressure of the laser chamber; and a controller that calculates, on a basis of a first amount of a gas supplied from the booster pump through the third control valve to the laser chamber, a second amount of the first laser gas that is to be supplied to the laser chamber and controls the first control valve on a basis of a result of the calculation of the second amount.

EXCIMER LASER SYSTEM WITH LONG SERVICE INTERVALS

An excimer laser system includes first and second gas cylinders connected to a laser chamber for selectively supplying the laser chamber with gases that are needed to generate and emit laser pulsations having a certain energy level from the laser chamber. At least one of the first and second gas cylinders includes a halogen gas. The halogen gas is consumed during the operation of the excimer laser system. A computer system, included within the excimer laser system, is used to determine whether to resupply the laser chamber with halogen gas from the first and/or second cylinders, or to entirely flush out the gas contents of the laser chamber, and to resupply the flushed gas chamber with gas sourced from the first and/or second cylinders. 1. An excimer laser system comprising:a laser having a chamber and configured to emit a pulsed laser beam when operated;a first gas cylinder for storing a first pressurized gas therein;a second gas cylinder for storing a second pressurized gas therein;a first gas manifold connecting the first gas cylinder and the laser chamber to one another, the first gas manifold including a first valve for selectively controlling a flow of gas from the first gas cylinder to the laser chamber;a second gas manifold connecting the second gas cylinder and the laser chamber to one another, the second gas manifold including a second valve for selectively controlling a flow of gas from the second gas cylinder to the laser chamber;a third gas manifold connected to the laser chamber and including a third valve for selectively flushing out gas from the laser chamber;a laser energy detector configured to measure an energy of the pulsed laser beam; anda computer system electrically connected to control the first, second, and third valves and to receive as input energy signals from the laser energy detector; (a) receive energy readings from the laser energy detector and calculate laser operating efficiency based on the received energy readings;', '(b) detect a ...

GAS LASER APPARATUS

A gas laser apparatus may include: a laser chamber connected through a first control valve to a first laser gas supply source that supplies a first laser gas containing a halogen gas and connected through a second control valve to a second laser gas supply source that supplies a second laser gas having a lower halogen gas concentration than the first laser gas; a purification column that removes at least a part of the halogen gas and a halogen compound from at least a part of a gas exhausted from the laser chamber; a booster pump, connected through a third control valve to the laser chamber, which raises a pressure of a gas having passed through the purification column to a gas pressure that is higher than an operating gas pressure of the laser chamber; and a controller that calculates, on a basis of a first amount of a gas supplied from the booster pump through the third control valve to the laser chamber, a second amount of the first laser gas that is to be supplied to the laser chamber and controls the first control valve on a basis of a result of the calculation of the second amount. 1. A gas purification system connected to a laser oscillation system , the laser oscillation system being configured to excite gas in a chamber , output a laser beam , and exhaust gas from the chamber to outside , the gas including laser gas supplied from a gas supply source to the chamber , the gas purification system comprising:a circulation gas pipe in which a first end is connected to a first pipe through which gas is exhausted from the chamber to the outside and a second end is connected to a second pipe through which gas is supplied from the gas supply source to the chamber;a booster pump provided in the circulation gas pipe and configured to raise a pressure of gas to flow the gas from the first end to the second end;a gas purification unit provided in the circulation gas pipe; anda first tank provided between the booster pump and the second end in the circulation gas pipe.2. ...

GAS LASER APPARATUS

A gas laser apparatus may include: a laser chamber connected through a first control valve to a first laser gas supply source that supplies a first laser gas containing a halogen gas and connected through a second control valve to a second laser gas supply source that supplies a second laser gas having a lower halogen gas concentration than the first laser gas; a purification column that removes at least a part of the halogen gas and a halogen compound from at least a part of a gas exhausted from the laser chamber; a booster pump, connected through a third control valve to the laser chamber, which raises a pressure of a gas having passed through the purification column to a gas pressure that is higher than an operating gas pressure of the laser chamber; and a controller that calculates, on a basis of a first amount of a gas supplied from the booster pump through the third control valve to the laser chamber, a second amount of the first laser gas that is to be supplied to the laser chamber and controls the first control valve on a basis of a result of the calculation of the second amount. 1. A gas purification system configured to purify exhaust gas exhausted from a laser oscillation system using mixed gas of rare gases and supply purified gas to the laser oscillation system , the gas purification system comprising:a purification unit configured to remove oxygen from the exhaust gas; anda getter configured to further purify the exhaust gas having passed through the purification unit.2. The gas purification system according to claim 1 , wherein the purification unit includes a treating agent including at least one of nickel (Ni) claim 1 , copper (Cu) claim 1 , and a compound thereof.3. The gas purification system according to claim 1 , wherein the purification unit includes a heating device.4. The gas purification system according to claim 1 , further comprising:an oximeter provided downstream from the purification unit.5. The gas purification system according to ...

LASER UNIT AND NON-TRANSITORY COMPUTER-READABLE STORAGE MEDIUM

There may be provided a laser unit including a display configured to display one or both of electric power consumed by the laser unit and electric energy consumed by the laser unit. 1. A discharge-excited gas laser unit comprisinga display configured to display resource consumption of the discharge-excited gas laser unit,the resource consumption including at least one of laser gas consumption, purge gas consumption, cooling water consumption, and exhaust air consumption.2. The laser unit according to claim 1 , wherein the laser gas consumption includes at least one of:consumption of mixed gas of argon and neon; andconsumption of mixed gas of fluorine, argon, and neon.3. The laser unit according to claim 2 , further comprisinga controller configured to calculate the laser gas consumption.4. The laser unit according to claim 1 , wherein the laser gas consumption includes at least one of:consumption of mixed gas of krypton and neon; andconsumption of mixed gas of fluorine, krypton, and neon.5. The laser unit according to claim 3 , further comprisinga controller configured to calculate the laser gas consumption.6. The laser unit according to claim 1 , wherein the purge gas consumption includes at least one of consumption of nitrogen gas and consumption of helium gas.7. The laser unit according to claim 6 , further comprisinga controller configured to calculate the purge gas consumption.8. The laser unit according to claim 1 , further comprising:a charger;a pulse power module; anda chamber including a heat exchanger, whereinthe cooling water consumption includes consumption of water for cooling at least one of the charger, the pulse power module, and the heat exchanger.9. The laser unit according to claim 8 , further comprisinga controller configured to calculate the cooling water consumption.10. The laser unit according to claim 1 , wherein the exhaust air consumption includes exhaust air consumption for ventilation.11. The laser unit according to claim 10 , further ...

SYSTEM FOR RECLAIMING, REBALANCING AND RECIRCULATING LASER GAS MIXTURES USED IN A HIGH ENERGY LASER SYSTEM

The present invention relates to a system for recirculating the gas atmosphere within an excimer laser system, where contaminates, created in the laser's operation, are removed, and the gas concentrations of additive gases, such as Xe, Kr, or others, depleted in the laser operation, are rebalanced to specific lasing mixtures by analyzation and component replenishment from one or more external supplies. 116-. (canceled)17. An excimer laser system comprising:a laser chamber comprising one or more compartments wherein each compartment contains a lasing gas quad-mix at operating concentrations for operating the laser, the laser chamber includes at least one port for introducing and exhausting said lasing gas quad-mixture from said laser chamber;a first cylinder containing an original lasing gas quad-mix source comprising a noble lasing gas, a buffer gas, a halogen gas, and an enhancing gas coupled to said port for introducing said lasing gas;a scrubber coupled to the gas port for removal of said halogen gas from said lasing gas exhausted from said laser chamber;at least one gas purifier in fluid communication with said scrubber wherein said halogen free lasing gas is purified forming a recycled gas mixture;a second cylinder for containing said recycled gas mixture in fluid communication with a compressor for compressing said recycled gas mixture; anda third cylinder wherein said third cylinder stores said compressed recycled gas mixture and is in fluid communication with said inlet at least one port of said laser chamber.18. The excimer laser system of claim 17 , wherein said recycled gas mixture comprises approximately 1-5% Ar claim 17 , 94-98% Ne claim 17 , and 1-100 ppm Xe.19. The excimer laser system of claim 18 , wherein said recycled gas mixture comprises 3.5% Ar claim 18 , 95.5% Ne claim 18 , and and Xe 10 ppm.20. The excimer laser system of claim 17 , wherein said recycled gas mixture comprises 1-5% Ar claim 17 , 75-99% Ne claim 17 , and 0.05-20% F.21. (canceled ...

Systems and methods for spatiotemporal control of a laser and applications of same

Methods and systems are disclosed for using a chromatic lens system to provide a “flying focus”—i.e., an advanced focusing scheme enabling spatiotemporal control of a focal location. In a method, a photon beam is emitted from a source at a wavelength. The photon beam may have more than one wavelength. The photon beam is focused to a focal location using a chromatic lens system. The focal location is at a first longitudinal distance along an optical axis from the chromatic lens system. The wavelength of the photon beam is changed as a function of time to change the focal location as a function of time. The wavelength may be changed such that the focal location changes with a focal velocity.

AMPLIFIER AND LASER SYSTEM

An amplifier may include a chamber, and first and second mirrors. The chamber may include a pair of discharge electrodes opposed to each other in a first direction, a laser exciting medium, an input window allowing seed light to pass therethrough into the chamber, and an output window allowing amplified laser light to pass therethrough to outside in a second direction intersecting with the first direction. The first and second mirrors may each include a reflection region, and be opposed to each other in a third direction intersecting with the first direction with the pair of discharge electrodes in between. A projected image of the reflection region of the first mirror in the second direction and a projected image of the reflection region of the second mirror in the second direction may provide a gap of a size equal to or greater than zero in between. 1. An amplifier , comprising:a chamber including a pair of discharge electrodes, a laser exciting medium, an input window, and an output window, the pair of discharge electrodes being opposed to each other in a first direction, the input window allowing seed light to pass therethrough into the chamber, and the output window allowing amplified laser light to pass therethrough to outside in a second direction intersecting with the first direction; anda first mirror and a second mirror each including a reflection region, and opposed to each other in a third direction with the pair of discharge electrodes in between, the third direction intersecting with the first direction, and a projected image of the reflection region of the first mirror in the second direction and a projected image of the reflection region of the second mirror in the second direction providing a gap of a size equal to or greater than zero in between.2. The amplifier according to claim 1 , wherein the first mirror is a convex mirror claim 1 , and the second mirror is a concave mirror.3. The amplifier according to claim 2 , wherein the convex mirror is a ...

SYSTEM AND METHOD FOR GENERATING EXTREME ULTRAVIOLET LIGHT

A system includes a chamber, a laser beam apparatus configured to generate a laser beam to be introduced into the chamber, a laser controller for the laser beam apparatus to control at least a beam intensity and an output timing of the laser beam, and a target supply unit configured to supply a target material into the chamber, the target material being irradiated with the laser beam for generating extreme ultraviolet light. 1. An extreme ultraviolet light generation system configured to irradiate a target with a first pulse laser beam and a second pulse laser beam to turn the target into plasma thereby generating extreme ultraviolet light , comprising:a chamber having at least one aperture configured to introduce the first pulse laser beam and the second pulse laser beam;a target supply unit configured to supply the target to a predetermined region in the chamber;a first laser apparatus configured to output the first pulse laser beam with which the target in the chamber is irradiated so as to make the target be diffused in a dome shape; anda second laser apparatus configured to output the second pulse laser beam with which the target which has been irradiated with the first pulse laser beam is further irradiated.2. The extreme ultraviolet light generation system according to claim 1 , wherein a fluence of the first pulse laser beam is lower than a fluence of the second pulse laser beam and equal to or higher than 6.5 J/cm.3. The extreme ultraviolet light generation system according to claim 1 , wherein the target is diffused in the dome shape in a direction opposite to a direction in which the first pulse laser beam travels.4. The extreme ultraviolet light generation system according to claim 3 , wherein the target diffused in the dome shape includes an annular shaped portion claim 3 , a dome-shaped portion claim 3 , and a portion surrounded by the annular shaped portion and the dome-shaped portion.5. The extreme ultraviolet light generation system according to ...

LASER UNIT

A laser unit may include a laser chamber including a pair of discharge electrodes that are opposed to each other in a first direction with an electrode gap interposed in between and are configured to provide a discharge width in a second direction, orthogonal to the first direction, smaller than the electrode gap; and an optical resonator including a first optical member and a second optical member that are opposed to each other in a third direction orthogonal to both the first direction and the second direction with the discharge electrodes interposed in between, and configured to amplify laser light generated between the discharge electrodes and output amplified laser light, the optical resonator satisfying the following expression to configure a stable resonator in the second direction: 1. A laser unit , comprising:a laser chamber including a pair of discharge electrodes that are opposed to each other in a first direction with an electrode gap interposed in between and are configured to provide a discharge width in a second direction smaller than the electrode gap, the second direction being orthogonal to the first direction; and {'br': None, 'i': G', 'G, '0<1·2<1'}, 'an optical resonator including a first optical member and a second optical member, and configured to amplify laser light generated between the discharge electrodes and output amplified laser light, the first optical member and the second optical member that are opposed to each other in a third direction orthogonal to both the first direction and the second direction with the discharge electrodes interposed in between, and the optical resonator satisfying the following expression to configure a stable resonator in the second directionwhere G1 is a G parameter of the first optical member, and G2 is a G parameter of the second optical member.2. The laser unit according to claim 1 , wherein the optical resonator further satisfies the following expression:{'br': None, 'i': G', 'G, '0.25<1·2<0.75.'}3. The ...

Systems and Methods to More Accurately Estimate a Fluorine Concentration in a Source Laser

In master oscillator-power amplifier (MOPA) systems for generating laser light, a fluorine concentration in each of the master oscillator and power amplifier chambers is maintained. While sensors at the chambers can measure certain values of some variables, the sensors do not directly measure fluorine concentration. As a further complication, the values received from the sensors are known to be affected by various specified variables. To estimate the effect on the received values, an RLS algorithm and covariance matrix are used. To ensure that the RLS algorithm is responsive to recent changes in a specified variable, portions of the covariance matrix are reset to more quickly and more heavily weight the more recent values. 1. A method comprising:receiving values of one or more measured variables from sensors of a Master Oscillator Power Amplifier (MOPA) system, the received values indicative of a fluorine concentration in chambers of the MOPA system, the received values affected by one or more specified variables;resetting, based on a change in target bandwidth, a portion of covariance values within a covariance matrix, the portion of covariance values indicative of a first specified variable of the one or more specified variables;estimating, using a computing device, an effect of the one or more specified variables on the received values, the estimating performed using a recursive least squares (RLS) algorithm and the covariance matrix having the reset portion of covariance values, the RLS algorithm including a quadratic term of the first specified variable of the one or more specified variables that has a quadratic relationship with one of the one or more measured variables; anddirecting an injection of fluorine into the chambers of the MOPA system based on the estimated effect and the received values.2. The method of claim 1 , wherein a second specified variable of the one or more specified variables has a linear relationship with the measured variables.3. The ...

Gas laser device

A discharge excitation gas laser device includes: first and second discharge electrodes disposed to face each other; a plurality of peaking capacitors connected to the first discharge electrode; a charger; a plurality of pulse power modules, each one of the pulse power modules including a charging capacitor to which a charged voltage is applied from the charger, a pulse compression circuit that pulse-compresses and outputs electrical energy stored in the charging capacitor as an output pulse to a corresponding peaking capacitor, and a switch disposed between the charging capacitor and the pulse compression circuit; a plurality of output pulse sensors, each one of the output pulse sensors detecting an output pulse output by a corresponding pulse power module; and a control unit configured to control, based on a detection result of each of the output pulse sensor, a timing of a switch signal to be input to a corresponding switch.

GAS CONTROL METHOD AND RELATED USES

Provided is a gas control system and method for online control of a gas compartment of a radiation source. The method includes measuring a parameter of a radiation source such as an excimer laser, the parameter describing an electrical stimulation applied to the laser and/or a characteristic of radiation generated by the laser and/or an amount of a consumable in the gas compartment. A function of the parameter is compared a to a threshold and if the parameter breaches the threshold, an amount of gas is calculated based on the parameter. An instruction is provided to provide or remove the amount of gas to or from, the gas compartment. Gases may be injected or bled into the compartment during use of the radiation source thereby reducing or negating the need to take the radiation source offline to purge and refill the gas compartment. 1. A method of controlling a gas control system of a gas compartment of a radiation source , the method comprising:measuring a parameter of an excimer laser, wherein the parameter describes an electrical stimulation applied to the excimer laser and/or a characteristic of radiation generated by the excimer laser and/or an amount of a consumable in the gas compartment;comparing the parameter, or a function of the parameter, to a threshold;calculating, responsive to determining that the parameter or function of the parameter breaches the threshold, an amount of gas to be provided or removed based on the parameter;providing an instruction to the gas control system to provide the amount of gas to, or remove the amount of gas from, the gas compartment.2. The method of claim 1 , wherein the radiation source continues to generate radiation during the provision of gas to claim 1 , or removal of gas from claim 1 , the gas compartment.3. The method of claim 1 , wherein the calculating an amount of gas further comprises calculating a gas characteristic based on the parameter.4. The method of claim 3 , wherein the calculating the amount of gas is ...

System and method for generating extreme ultraviolet light

A system includes a chamber, a laser beam apparatus configured to generate a laser beam to be introduced into the chamber, a laser controller for the laser beam apparatus to control at least a beam intensity and an output timing of the laser beam, and a target supply unit configured to supply a target material into the chamber, the target material being irradiated with the laser beam for generating extreme ultraviolet light.

GAS LASER DEVICE

A discharge excitation gas laser device includes: first and second discharge electrodes disposed to face each other; a plurality of peaking capacitors connected to the first discharge electrode; a charger; a plurality of pulse power modules, each one of the pulse power modules including a charging capacitor to which a charged voltage is applied from the charger, a pulse compression circuit that pulse-compresses and outputs electrical energy stored in the charging capacitor as an output pulse to a corresponding peaking capacitor, and a switch disposed between the charging capacitor and the pulse compression circuit; a plurality of output pulse sensors, each one of the output pulse sensors detecting an output pulse output by a corresponding pulse power module; and a control unit configured to control, based on a detection result of each of the output pulse sensor, a tinting of a switch signal to be input to a corresponding switch. 1. A discharge excitation gas laser device , comprising:(A) first and second discharge electrodes disposed to face each other;(B) a plurality of peaking capacitors connected to the first discharge electrode;(C) a charger;(D) a plurality of pulse power modules, (D1) a charging capacitor to which a charged voltage is applied from the charger;', '(D2) a pulse compression circuit that pulse-compresses electrical energy stored in the charging capacitor, and outputs the pulse-compressed electrical energy as an output pulse to a corresponding peaking capacitor of the peaking capacitors; and', '(D3) a switch disposed between the charging capacitor and the pulse compression circuit;, 'each one of the pulse power modules including the following (D1) to (D3)(E) a plurality of output pulse sensors, each one of the output pulse sensors detecting an output pulse output by a corresponding one of the pulse power modules; and(F) a control unit configured to control, based on a detection result of each of the output pulse sensors, a timing of a switch signal ...

Residual gain monitoring and reduction for EUV drive laser

A system includes a laser source operable to provide a laser beam, a laser amplifier having a gain medium operable to provide energy to the laser beam when the laser beam passes through the laser amplifier, and a residual gain monitor operable to provide a probe beam and operable to derive a residual gain of the laser amplifier from the probe beam when the probe beam passes through the laser amplifier while being offset from the laser beam in time or in path. 1. A system , comprising:a laser source operable to provide a laser beam;a laser amplifier having a gain medium operable to provide energy to the laser beam when the laser beam passes through the laser amplifier; anda residual gain monitor operable to provide a probe beam and operable to derive a residual gain of the laser amplifier from the probe beam when the probe beam passes through the laser amplifier while being offset from the laser beam in time or in path.2. The system of claim 1 , further comprising an extreme ultraviolet (EUV) vessel operable to receive the laser beam after travelling through the laser amplifier for interaction with a target to create EUV light.3. The system of claim 1 , further comprising a control module coupled to the residual gain monitor and configured to receive the residual gain claim 1 , wherein the control module is configured to adjust parameters of the gain medium according to a comparison between the residual gain and a threshold level.4. The system of claim 1 , wherein the laser amplifier is one of a plurality of laser amplifiers and the laser beam is configured to travel through each of the plurality of laser amplifiers.5. The system of claim 4 , wherein:a first laser amplifier of the plurality of laser amplifiers is configured to provide a first gain to the laser beam,a second laser amplifier of the plurality of laser amplifiers is configured to provide a second gain to the laser beam, the first gain being greater than the second gain, andthe residual gain monitor is ...

PULSED LIGHT BEAM SPECTRAL FEATURE CONTROL

A system includes a first actuatable apparatus of an optical source, the first actuatable apparatus being altered within a range of values about a target value to thereby alter a spectral feature of the light beam; a second actuatable apparatus of the optical source, the second actuatable apparatus being altered to thereby alter the spectral feature of the light beam; a metrology system including an observation system configured to output an indication of a deviation between the actual value at which the first actuatable apparatus is operating and the target value; and a control system configured to determine whether the deviation is greater than an acceptable deviation, and, if it is greater than the acceptable deviation, then send a signal to a second actuation module controlling the second actuatable apparatus to adjust the actual value at which the first actuatable apparatus is operating to be closer to the target value. 1. A system for controlling a spectral feature of a pulsed light beam produced by an optical source , the system comprising:a first actuation module coupled to a first actuatable apparatus of the optical source, the first actuatable apparatus being altered within a range of values about a target value by the first actuation module to thereby alter the spectral feature of the pulsed light beam;a second actuation module coupled to a second and distinct actuatable apparatus of the optical source, the second actuatable apparatus being altered by the second actuation module to thereby alter the spectral feature of the pulsed light beam;a metrology system including an observation system connected to at least the first actuation module and configured to output a metric that indicates a deviation between the actual value at which the first actuatable apparatus is operating and the target value; determine whether the deviation is greater than an acceptable deviation, and', 'if the deviation is outside the acceptable deviation, then send a signal to the ...

Oxygen laser oscillator

The disclosed invention relates to a method of realizing an oxygen laser oscillator. The laser oscillator relating to one aspect of the invention is provided with a laser cavity consisting of a high-reflectivity mirror ( 108 ) and a partial-reflectivity output mirror ( 107 ), a singlet oxygen generator ( 105 ), a focusing optics ( 109 ), and a shutter ( 113 ). Singlet oxygen (O 2 ( 1 Δ g )) is supplied to the chamber ( 102 A) which is pumped beforehand by a vacuum pump. In order to produce a laser oscillation, the shutter ( 113 ) is pulled out so that the radiation from O 2 ( 1 Δ g ) goes back and forth inside the laser cavity. This causes a stimulated emission from O 2 ( 1 Δ g ), and a pulsed laser is extracted from the output mirror ( 107 ).

LASER APPARATUS

A laser apparatus according to embodiments may include a laser chamber including a laser gain medium; a power source; a first electrode to which a voltage is applied from the power source and a second electrode that is grounded, the first and second electrodes being disposed in the laser chamber; and a connector connected to the power source, and supporting the first electrode in a way that allows the first electrode to move toward a side where the second electrode is disposed. 1. A laser apparatus comprising:a laser chamber including a laser gain medium;a power source;a first electrode to which a voltage is applied from the power source and a second electrode that is grounded, the first and second electrodes being disposed in the laser chamber; anda connector connected to the power source, and supporting the first electrode in a way that allows the first electrode to move toward a side where the second electrode is disposed.2. The laser apparatus according to claim 1 , wherein a part contacting with the first electrode in the connector is made of elastic metal.3. The laser apparatus according to claim 1 , wherein the connector includes an elastic member therein that is made of metal.4. The laser apparatus according to claim 1 , whereinthe connector contacts with the first electrode at a plurality of parts, andeach of the parts contacting with the first electrode is made of elastic metal.5. The laser apparatus according to claim 1 , whereinthe laser chamber includes an insulator, andthe connector is fixed to the insulator.6. The laser apparatus according to claim 1 , further comprising an electrode moving mechanism configured to move the first electrode toward the side where the second electrode is disposed.7. The laser apparatus according to claim 6 , further comprising an insulator member disposed between the electrode moving mechanism and the first electrode.8. The laser apparatus according to claim 6 , wherein a part of the electrode moving mechanism and the ...

LASER GAS PURIFYING SYSTEM

A laser gas purifying system is configured to purify emission gas emitted from an ArF excimer laser apparatus using laser gas including xenon gas and to supply the purified gas to the ArF excimer laser apparatus. The laser gas purifying system comprises a xenon trap configured to reduce xenon gas concentration in the emission gas, and a xenon-adding unit configured to add xenon gas to the emission gas passed through the xenon trap. 1. A laser gas purifying system configured to purify emission gas emitted from an ArF excimer laser apparatus using laser gas including xenon gas and to supply purified gas to the ArF excimer laser apparatus , comprising:a xenon trap configured to reduce xenon gas concentration in the emission gas; anda xenon-adding unit configured to add xenon gas to the emission gas passed through the xenon trap.2. The laser gas purifying system according to claim 1 , further comprising a first impurity trap configured to purify the emission gas emitted from the ArF excimer laser apparatus claim 1 , whereinthe xenon trap reduces the xenon gas concentration in the emission gas passed through the first impurity trap.3. The laser gas purifying system according to claim 1 , further comprising a second impurity trap configured to purify the emission gas passed through the xenon trap.4. The laser gas purifying system according to claim 2 , further comprising a second impurity trap configured to purify the emission gas passed through the xenon trap.5. The laser gas purifying system according to claim 1 , wherein the xenon-adding unit includes:a gas cylinder configured to store laser gas that contains xenon gas,a mixer configured to mix the laser gas supplied from the gas cylinder and the emission gas passed through the xenon trap,a first control valve provided between the mixer and the gas cylinder,a second control valve provided between the mixer and the xenon trap, anda controller configured to control the first control valve and the second control valve.6. ...

LASER SYSTEM

The laser system includes a first laser apparatus, a second laser apparatus, a charging voltage measuring unit configured to measure the charging voltage of the first storage capacitor and the charging voltage of the second storage capacitor, at least one bleeding circuit configured to reduce the charging voltage of the first storage capacitor and the charging voltage of the second storage capacitor, and a bleeding circuit controller configured to control the at least one bleeding circuit based on the voltage measured by the charging voltage measuring unit. 1. A laser system comprising:a first laser apparatus including a first laser chamber, a first pair of electrodes provided in the first laser chamber, a first pulse generator including a first storage capacitor, the first pulse generator being configured to generate a pulsed voltage using electric energy stored in the first storage capacitor and configured to apply the pulsed voltage to the first pair of electrodes, and a first charger configured to supply electric energy to charge the first storage capacitor;a second laser apparatus including a second laser chamber, a second pair of electrodes provided in the second laser chamber, a second pulse generator including a second storage capacitor, the second pulse generator being configured to generate a pulsed voltage using electric energy stored in the second storage capacitor and configured to apply the pulsed voltage to the second pair of electrodes, and a second charger configured to supply electric energy to charge the second storage capacitor;a charging voltage measuring unit configured to be commonly used to measure the charging voltage of the first storage capacitor and the charging voltage of the second storage capacitor;at least one bleeding circuit configured to reduce the charging voltage of the storage capacitor and the charging voltage of the second storage capacitor; anda bleeding circuit controller configured to control the at least one bleeding ...

GAS OPTIMIZATION IN A GAS DISCHARGE LIGHT SOURCE

In a method, energy is supplied to a first gas discharge chamber of a first stage until a pulsed amplified light beam is output from the first stage and directed toward a second stage. While the energy is supplied to the first gas discharge chamber: a value of an operating parameter of the first gas discharge chamber is measured; it is determined whether to adjust an operating characteristic of the first gas discharge chamber based on the measured value; and, the operating characteristic of the first gas discharge chamber is adjusted if it is determined that the operating characteristic of the first gas discharge chamber should be adjusted. After it is determined that the operating characteristic of the first gas discharge chamber no longer should be adjusted, then an adjustment procedure is applied to an operating characteristic of a second gas discharge chamber of the second stage. 1. (canceled)2. A method comprising:performing a first full replenishment of a first gas mixture in a first gas discharge chamber of a first stage of a light source, the first full replenishment comprising replacing the first gas mixture in the first gas discharge chamber;performing a second full replenishment of a second gas mixture in a second gas discharge chamber of a second stage of the light source, the second full replenishment comprising replacing the second gas mixture in the second gas discharge chamber;after the first and second full replenishments are completed, performing a first gas adjustment procedure on the first gas discharge chamber, the first gas adjustment procedure comprising adjusting one or more operating characteristics of the first gas discharge chamber based on one or more operating parameters of the first gas discharge chamber;after the first gas adjustment procedure is completed, feeding a pulsed amplified light beam output from the first stage to the second stage and performing a second gas adjustment procedure on the second gas discharge chamber, the ...

Residual gain monitoring and reduction for EUV drive laser

A system includes a laser source operable to provide a laser beam, a laser amplifier having a gain medium operable to provide energy to the laser beam when the laser beam passes through the laser amplifier, and a residual gain monitor operable to provide a probe beam and operable to derive a residual gain of the laser amplifier from the probe beam when the probe beam passes through the laser amplifier while being offset from the laser beam in time or in path. 1. A method , comprising:generating a probe beam in a residual gain monitor;amplifying the probe beam through a laser amplifier;calculating a residual gain of the laser amplifier based on strengths of the probe beam before and after the amplifying; andadjusting parameters of the laser amplifier according to a comparison between the residual gain and a threshold level.2. The method of claim 1 , further comprising:generating a laser beam in a laser source;amplifying the laser beam through the laser amplifier; andcommunicating the residual gain to a control module,wherein the adjusting of the parameters is conducted at the control module.3. The method of claim 2 , wherein the amplifying of the probe beam includes amplifying the probe beam along a probe path claim 2 , and the amplifying of the laser beam includes amplifying the laser beam along a main path claim 2 , wherein the probe path is offset from the main path.4. The method of claim 2 , wherein the amplifying of the probe beam includes amplifying the probe beam at a first time period claim 2 , the amplifying of the laser beam includes amplifying the laser beam at a second time period claim 2 , and the first time period is offset from the second time period.5. The method of claim 2 , wherein the generating of the probe beam includes generating the probe beam at a first power level claim 2 , and the generating of the laser beam includes generating the laser beam at a second power level claim 2 , and the first power level is about 10−9 to about 10−6 of the ...

Optical surface preservation techniques and apparatus

Techniques and architecture are disclosed for preserving optical surfaces (e.g., windows, coatings, etc.) in a flowing gas amplifier laser system, such as a diode-pumped alkali laser (DPAL) system. In some instances, the disclosed techniques/architecture can be used, for example, to protect optical surfaces in a DPAL system from: (1) chemical attack by pump-bleached alkali vapor atoms and/or ions; and/or (2) fouling by adherence thereto of reaction products/soot produced in the DPAL. Also, in some instances, the disclosed techniques/architecture can be used to substantially match the geometry of the pumping volume with that of the lasing volume, thereby minimizing or otherwise reducing the effects of amplified spontaneous emission (ASE) on DPAL output power. Furthermore, in some cases, the disclosed techniques/architecture can be used to provide a DPAL system capable of producing a beam output power in the range of about 20 kW to 10 MW, or greater.

Laser unit and non-transitory computer-readable storage medium

There may be provided a laser unit including a display configured to display one or both of electric power consumed by the laser unit and electric energy consumed by the laser unit.

GAS LASER APPARATUS

A gas laser apparatus may include: a laser chamber connected through a first control valve to a first laser gas supply source that supplies a first laser gas containing a halogen gas and connected through a second control valve to a second laser gas supply source that supplies a second laser gas having a lower halogen gas concentration than the first laser gas; a purification column that removes at least a part of the halogen gas and a halogen compound from at least a part of a gas exhausted from the laser chamber; a booster pump, connected through a third control valve to the laser chamber, which raises a pressure of a gas having passed through the purification column to a gas pressure that is higher than an operating gas pressure of the laser chamber; and a controller that calculates, on a basis of a first amount of a gas supplied from the booster pump through the third control valve to the laser chamber, a second amount of the first laser gas that is to be supplied to the laser chamber and controls the first control valve on a basis of a result of the calculation of the second amount. 1. A gas laser apparatus comprising:a laser chamber connected through a first control valve to a first laser gas supply source that supplies a first laser gas containing a halogen gas and connected through a second control valve to a second laser gas supply source that supplies a second laser gas having a lower halogen gas concentration than the first laser gas;a purification column that removes at least a part of the halogen gas and a halogen compound from at least a part of a gas exhausted from the laser chamber;a booster pump, connected through a third control valve to the laser chamber, which raises a pressure of a gas having passed through the purification column to a gas pressure that is higher than an operating gas pressure of the laser chamber; anda controller that calculates, on a basis of a first amount of a gas supplied from the booster pump through the third control ...

LASER GAS REGENERATION SYSTEM AND LASER SYSTEM

A laser gas regeneration system for an excimer laser includes a first pipe capable of supplying a laser chamber with a first laser gas, a second pipe capable of supplying the laser chamber with a second laser gas having a halogen gas concentration higher than that of the first laser gas, a third pipe allowing a gas exhausted from the laser chamber to pass therethrough, a gas refiner that refines the gas having passed through the third pipe, a branch that causes the refined gas to divide and flow into a fourth pipe and a fifth pipe, a first regenerated gas supplier that supplies the first pipe with a gas having divided and flowed into the fourth pipe, and a second regenerated gas supplier that adds a halogen gas to a gas having divided and flowed into the fifth pipe and supplies the second pipe with the halogen-added gas. 1. A laser gas regeneration system for an excimer laser including a first pipe configured to be capable of supplying a laser chamber with a first laser gas , a second pipe configured to be capable of supplying the laser chamber with a second laser gas having a halogen gas concentration higher than a halogen gas concentration of the first laser gas , and a third pipe configured to allow a gas exhausted from the laser chamber to pass therethrough , the laser gas regeneration system comprising:a gas refiner that refines the gas having passed through the third pipe;a branch that causes a gas having flowed into the gas refiner and having been refined by the gas refiner to divide and flow into a fourth pipe and a fifth pipe;a first regenerated gas supplier that supplies the first pipe with a gas having divided and flowed into the fourth pipe; anda second regenerated gas supplier that adds a halogen gas to a gas having divided and flowed into the fifth pipe and supplies the second pipe with the gas to which the halogen gas has been added.2. The laser gas regeneration system according to claim 1 , further comprising:a first valve that controls the first ...

LASER APPARATUS, LASER SYSTEM, AND EXTREME ULTRAVIOLET LIGHT GENERATION APPARATUS

A laser apparatus includes a master oscillator configured to output a pulse laser beam, at least one amplifier disposed in an optical path of the pulse laser beam, an energy detector that is disposed in the optical path on one of an input side and an output side of the amplifier and that is configured to detect energy of self-oscillating light from the amplifier, a gain adjustment section configured to adjust the gain of the amplifier, and a control unit configured to control the gain adjustment section based on a detection result from the energy detector when a pulse laser beam is not being inputted into the amplifier from the master oscillator. 1. A laser apparatus comprising:a master oscillator configured to output a pulse laser beam;at least one amplifier disposed in an optical path of the pulse laser beam;an energy detector that is disposed in the optical path on one of an input side and an output side of the amplifier and that is configured to detect energy of self-oscillating light from the amplifier;a gain adjustment section configured to adjust a gain of the amplifier; anda control unit configured to control the gain adjustment section based on a detection result from the energy detector when a pulse laser beam is not being inputted into the amplifier from the master oscillator.2. The laser apparatus according to claim 1 ,{'sub': 2', '2, 'wherein the amplifier contains a COlaser gas and is configured to discharge-pump the COlaser gas.'}3. The laser apparatus according to claim 2 ,{'sub': '2', 'wherein the gain adjustment section is configured to adjust a composition of the COlaser gas.'}4. The laser apparatus according to claim 3 ,{'sub': 2', '2, 'wherein the gain adjustment section is configured to adjust a gas concentration of at least one of CO, N, and Xe within the laser gas.'}5. The laser apparatus according to claim 4 ,wherein the gain adjustment section is configured to adjust the concentration of Xe gas to no greater than 1%.6. The laser apparatus ...

GAS LASER APPARATUS

A gas laser apparatus may include: a laser chamber connected through a first control valve to a first laser gas supply source that supplies a first laser gas containing a halogen gas; a purification column that removes at least a part of the halogen gas and a halogen compound from at least a part of a gas exhausted from the laser chamber; a booster pump; and a controller that calculates, on a basis of a first amount of a gas supplied from the booster pump to the laser chamber, a second amount of the first laser gas that is to be supplied to the laser chamber and controls the first control valve on a basis of a result of the calculation of the second amount. 1. A gas laser apparatus comprising:a laser chamber connected through a first control valve to a first laser gas supply source that supplies a first laser gas containing a halogen gas and connected through a second control valve to a second laser gas supply source that supplies a second laser gas having a lower halogen gas concentration than the first laser gas;a purification column that removes at least a part of the halogen gas and a halogen compound from at least a part of a gas exhausted from the laser chamber;a booster pump, connected through a third control valve to the laser chamber, which raises a pressure of a gas having passed through the purification column to a gas pressure that is higher than an operating gas pressure of the laser chamber;a first tank disposed between the purification column and the booster pump;a first pressure sensor that measures a first pressure inside the first tank;a second tank disposed between the booster pump and the third control valve;a second pressure sensor that measures a second pressure inside the second tank; anda controller that controls the booster pump on a basis of the first pressure and controls the third control valve on a basis of the second pressure.2. The gas laser apparatus according to claim 1 , wherein the controller controls the booster pump so that the ...

Laser machining apparatus changing operation based on length of power-down time

A laser machining apparatus includes: a laser oscillator; a control device controlling the laser oscillator; a power-down detection unit detecting a decrease in supply power; a time measurement unit measuring power-down time until the supply power is returned to a predetermined value from when the supply power is decreased under the predetermined value; an electricity storage unit supplying electric power to the control device upon a power outage; and equipment operating abnormally when the supply power is decreased under the predetermined value, and recovering from an abnormal operation when a state of the supply power being smaller than the predetermined value continues for a first predetermined period or longer, the control device stopping the laser machining apparatus when the power-down time is smaller than the first predetermined period and not stopping the laser machining apparatus when the power-down time is equal to or larger than the first predetermined period.

GAS LASER APPARATUS

A gas laser apparatus may include: a laser chamber connected through a first control valve to a first laser gas supply source that supplies a first laser gas containing a halogen gas and connected through a second control valve to a second laser gas supply source that supplies a second laser gas having a lower halogen gas concentration than the first laser gas; a purification column that removes at least a part of the halogen gas and a halogen compound from at least a part of a gas exhausted from the laser chamber; a booster pump, connected through a third control valve to the laser chamber, which raises a pressure of a gas having passed through the purification column to a gas pressure that is higher than an operating gas pressure of the laser chamber; and a controller that calculates, on a basis of a first amount of a gas supplied from the booster pump through the third control valve to the laser chamber, a second amount of the first laser gas that is to be supplied to the laser chamber and controls the first control valve on a basis of a result of the calculation of the second amount. 1. A gas laser apparatus comprising:a first laser chamber connected through a first control valve to a first laser gas supply source that supplies a first laser gas containing a halogen gas and connected through a second control valve to a second laser gas supply source that supplies a second laser gas having a lower halogen gas concentration than the first laser gas;a second laser chamber connected through a sixth control valve to the first laser gas supply source and connected through a seventh control valve to the second laser gas supply source;a common pipe connected to the second laser gas supply source and divided into a first branch pipe in which the second control valve is disposed and a second branch pipe in which the seventh control valve is disposed;a fourth control valve disposed in the common pipe;a purification column that removes at least a part of the halogen gas and ...

EXCIMER LASER APPARATUS AND ELECTRONIC-DEVICE MANUFACTURING METHOD

An excimer laser apparatus according to the present disclosure includes an etalon spectrometer configured to measure a fringe waveform of a laser beam; and a controller configured to obtain area of a first ratio in a spectral space obtained based on a result of the measurement by the etalon spectrometer, calculate a first spectral line width of the laser beam based on the obtained area of the first ratio, and calibrate a first spectral line width based on a correlation function representing correlation between the first spectral line width and a second spectral line width of the laser beam measured by a reference meter. 1. An excimer laser apparatus comprising:an etalon spectrometer configured to measure a fringe waveform of a laser beam; anda controller configured to obtain area of a first ratio in a spectral space obtained based on a result of the measurement by the etalon spectrometer, calculate a first spectral line width of the laser beam based on the obtained area of the first ratio, and calibrate the first spectral line width based on a correlation function representing correlation between the first spectral line width and a second spectral line width of the laser beam measured by a reference meter.2. The excimer laser apparatus according to claim 1 , wherein the controller sets area of a predetermined range with respect to a center position of the fringe waveform as total area of the spectral space.3. The excimer laser apparatus according to claim 2 , wherein the controller sets a peak position of the fringe waveform as the center position of the fringe waveform.4. The excimer laser apparatus according to claim 2 , wherein the controller sets a center position of full width at half maximum of the fringe waveform as the center position of the fringe waveform.5. The excimer laser apparatus according to claim 1 , wherein the controller calculates the area of the first ratio by dividing the fringe waveform into a plurality of divided wavelength intervals claim 1 ...

LASER APPARATUS

A laser apparatus according to the present disclosure includes: a laser chamber including a pair of electrodes and configured to emit, at each of a plurality of pulse repetition frequencies, a pulse laser beam having a pulse energy corresponding to a voltage applied between the electrodes; an energy detector provided on an optical path of the pulse laser beam and configured to detect the pulse energy of the pulse laser beam; a voltage control unit configured to control the applied voltage based on a target pulse energy and the pulse energy detected by the energy detector; and a pulse energy control unit configured to periodically vary the target pulse energy at a modulation frequency corresponding to each of the pulse repetition frequencies with a reference energy being a center of variation. 1. A laser apparatus comprising:a laser chamber including a pair of electrodes and configured to emit, at each of a plurality of pulse repetition frequencies, a pulse laser beam having a pulse energy corresponding to a voltage applied between the electrodes;an energy detector provided on an optical path of the pulse laser beam and configured to detect the pulse energy of the pulse laser beam;a voltage control unit configured to control the applied voltage based on a target pulse energy and the pulse energy detected by the energy detector; anda pulse energy control unit configured to periodically vary the target pulse energy at modulation frequencies corresponding to the pulse repetition frequencies with a reference energy being a center of variation.3. The laser apparatus according to claim 1 , further comprising a gain calculation unit configured to calculate a plurality of control gains corresponding to the pulse repetition frequencies.4. The laser apparatus according to claim 3 , wherein the voltage control unit controls the applied voltage based on the control gains as well as the target pulse energy and the pulse energy detected by the energy detector.5. The laser ...

LASER MACHINING DEVICE

A laser machining device capable of recovering an exhaust performance of a dry pump easily is provided. A laser machining device includes: an oscillating portion that generates a machining laser beam G; an enclosure portion in which a first gas is enclosed; and an exhausting portion that exhausts the first gas together with a dirt generated in the enclosure portion in association with an operation of the oscillating portion. The exhausting portion includes: a dry pump; a first line that connects the enclosure portion and the dry pump; a second line that supplies a second gas having a higher pressure than the first gas to the dry pump; a valve portion that opens or closes the first line and the second line; and a control unit that controls opening or closing of the valve portion. 1. A laser machining device comprising: an oscillating portion that generates a machining laser beam; an enclosure portion in which a first gas is enclosed; and an exhausting portion that exhausts the first gas together with a dirt generated in the enclosure portion in association with an operation of the oscillating portion , whereinthe exhausting portion includes:a dry pump;a first line that connects the enclosure portion and the dry pump;a second line that supplies a second gas having a higher pressure than the first gas to the dry pump;a valve portion that opens or closes the first line and the second line; anda control unit that controls opening or closing of the valve portion.2. The laser machining device according to claim 1 , wherein the second line is connected to an intermediate portion of the first line claim 1 ,the valve portion is a three-way valve disposed in a connection portion to which the first line and the second line are connected, andthe control unit controls the three-way valve so that the valve switches from a first inflow state in which the first gas flows from the first line to the dry pump to a second inflow state in which the second gas flows from the second line ...

GAS CIRCULATION TYPE LASER OSCILLATOR

A laser oscillator comprising an electric discharge excitation part having a discharge tube, and generates laser by excitation discharge of a laser gas flow through the inside of the discharge tube, an optical resonance part which has optical components attached to outsides of end walls of the discharge tube, and resonates laser generated in the discharge tube, and blower piping which connects an intake port and exhaust port of the discharge tube to form a circulation path of laser gas. The end walls of the discharge tube are provided with through holes which connect the inside of the discharge tube and the optical components, and blocking members are arranged in the through holes so as to block the flow of laser gas through the through holes toward the optical components.

Gas laser oscillation device

A gas laser oscillation device includes a discharge part, a blower part, and a laser gas path. The discharge part excites a laser gas medium and the blower part blows the laser gas. The laser gas path forms the circulation path of the laser gas between the discharge part and the blower part. The blower part includes an impeller section, a drive section, and an intermediate chamber disposed between the impeller section and the drive section. In the impeller section, a rotating blade to be rotated by a drive section via a rotating shaft is disposed. In the intermediate chamber, a main space and a gas damper space are partially partitioned by a gas shielding member.

LASER OSCILLATOR PROVIDED WITH BLOWER

A laser oscillator which can estimate the rotation speed of a blower in an idle state at cheaper cost and higher precision. The laser oscillator is comprised of a resonator part, laser medium flow path, blower, drive part, controller, manometer which measures the pressure of the laser medium at a predetermined position of the laser medium flow path, and rotation speed estimating part which uses the pressure of the laser medium which is measured by the manometer and a predetermined relationship between the pressure of the laser medium and the blower rotation speed at a certain position as the basis to estimate the rotation speed of the blower. The controller controls the drive part so as to restart operation of the blower at the rotation speed which is estimated by the rotation speed estimating part when the power supply to the blower is stopped and the blower is idling. 1. A laser oscillator comprising:a resonator part which generates laser light;a laser medium flow path for introducing a laser medium into the resonator part and discharging the laser medium from the resonator part;a blower which makes the laser medium to flow through the laser medium flow path;a drive part which drives the blower;a controller which controls the drive part;a manometer which measures a pressure of the laser medium at a predetermined position of the laser medium flow path; anda rotation speed estimating part which estimates a rotation speed of the blower, based on a predetermined relationship between the pressure of the laser medium at the predetermined position and the rotation speed of the blower, and on the pressure of the laser medium measured by the manometer, whereinthe controller controls the drive part so as to restart the operation of the blower at the rotation speed estimated by the rotation speed estimating part when the power supply to the blower is stopped and the blower is idling.2. The laser oscillator according to further comprising an uninterruptible power source ...

POWERFUL PULSED SELF-SEEDING CO2 LASER

The present disclosure discloses a COlaser and a method for the COlaser. The COlaser comprises an unstable laser cavity in the form of a first optical resonator having a semi-transparent output coupler (), a laser medium () in the unstable laser cavity, and means () for exciting the laser medium (). A part of the laser beam propagating beyond the light aperture of the output coupler () is directed to a second resonator, the second resonator comprising at least one focusing member (), and the optical length of the second resonator being equal or multiple to the optical length of the first optical resonator. The part of the laser beam passing through the focal plane of the focusing member () is modulated by using a Q-switching device () in a manner that the excitation of the laser medium is in synchrony with the operation of the Q-switching device (). 1. A CO2 laser comprising an unstable laser cavity in the form of a first optical resonator having a semi-transparent output coupler , a laser medium in the unstable laser cavity , and means for exciting the laser medium , characterized in that the laser further comprisesa second optical resonator optically coupled with the unstable laser cavity beyond the light aperture of the output coupler, wherein the second resonator comprises at least one focusing member, and wherein the optical length of the second optical resonator is equal or multiple to the optical length of first optical resonator,a Q-switching device arranged into the focal plane of said focusing member, andmeans for synchronizing operation of the means for exciting the laser medium with operation of the Q-switching device.2. A laser as claimed in claim 1 , wherein{'b': '3', 'the diameter of the aperture of the output coupler () is less than the diameter of a laser beam generated in the unstable laser cavity, wherein the output coupler is configured to divide the generated laser beam into a first part that follows a path passing through the aperture of the ...

Pulsed iodine laser apparatus

The disclosed invention relates to a pulsed iodine laser apparatus. The laser apparatus has a flashlamp-pumped iodine laser oscillator which produces a laser pulse with a full pulse width of longer than 1 microsecond, and a COIL amplifier. The laser apparatus may has a controller which controls the timing of injecting chlorine gas contained in a high-pressure chlorine tank into the singlet oxygen generator by outputting an open/close signal of the valve V 2, and the timing of injecting iodine molecules contained in a iodine molecule tank into an amplifier chamber of the COIL amplifier.

GAS LASER OSCILLATOR CAPABLE OF ESTIMATING SEALABILITY OF GAS CONTAINER

A gas laser oscillator includes an output command part for outputting a power supply output command; a power supply unit for applying a discharge tube voltage corresponding to the power supply output command to the discharge tube to start discharge; a voltage detection part for detecting the discharge tube voltage; a discharge start determination part for determining whether or not the discharge has been started on the basis of a value detected by the voltage detection part when the power supply output command is gradually increased; and a sealability determination part for determining that sealability of the gas container has been reduced when a discharge start time from the application of the discharge tube voltage until when it is determined by the discharge start determination part that the discharge is started exceeds a predetermined first threshold value. 1. A gas laser oscillator , comprising:a gas container in which a laser gas is circulated;at least one of discharge tube arranged in a circulation path of the laser gas;an output command part configured to output a power supply output command;a power supply unit configured to apply a discharge tube voltage corresponding to the power supply output command to the discharge tubs so as to start discharge in the discharge tube;a voltage detection part configured to detect the discharge tube voltage;a discharge start determination part configured to determine whether or not the discharge has been started in the discharge tube on the basis of a value detected by the voltage detection part when the power supply output command is gradually increased; anda sealability determination part configured to determine that sealability of the gas container has been reduced when a discharge start time from application of the discharge tube voltage until when the discharge start determination part determines the start of the discharge exceeds a predetermined first threshold value.2. The gas laser oscillator according to claim 1 , ...

LASER DEVICE, AND METHOD OF CONTROLLING ACTUATOR

A laser device () may include: a laser resonator () configured to output pulsed laser light (L); an actuator () configured to change wavelength of the pulsed laser light; and a controller () configured to receive data of target wavelength for a plurality of pulses of the pulsed laser light before the pulsed laser light is output, and to control the actuator, based on the data of the target wavelength for the plurality of pulses, such that the wavelength of the pulsed laser light approaches the data of the target wavelength. 1100. A laser device () , including:{'b': 20', '30, 'a laser resonator (, ) configured to output pulsed laser light (L);'}{'b': 35', '36', '37, 'an actuator (, , ) configured to change wavelength of the pulsed laser light; and'}{'b': '110', 'a controller () configured to receive data of target wavelength for a plurality of pulses of the pulsed laser light before the pulsed laser light is output and to control the actuator, based on the data of the target wavelength for the plurality of pulses, such that the wavelength of the pulsed laser light approaches the data of the target wavelength.'}2. The laser device according to claim 1 , wherein the controller is configured to receive the data of the target wavelength for the plurality of pulses of the pulsed laser light before a burst of the pulsed laser light is output.3. The laser device according to claim 2 , wherein the data of the target wavelength for the plurality of pulses of the pulsed laser light include data of target wavelength for a plurality of pulses included in the burst of the pulsed laser light.4120. The laser device according to claim 1 , further comprising a wavelength measuring unit () configured to measure wavelength of the pulsed laser light claim 1 , whereinthe controller is configured to control the actuator based on the wavelength measured by the wavelength measuring unit.5. The laser device according to claim 4 , wherein the controller is configured to control the actuator ...

LASER APPARATUS AND MEASUREMENT UNIT

A laser apparatus may include: a quantum cascade laser outputting, based on a supplied current, laser light at an oscillation start timing when a first delay time elapses from a current rising timing of the supplied current: an amplifier disposed in a laser light optical path, and selectively amplifying light of a predetermined wavelength to output the amplified laser light to a chamber including a plasma generation region into which a target is fed; and a laser controller controlling a third delay time, from an output timing of a laser output instruction to the current rising timing, to cause a laser light wavelength to be equal to the predetermined wavelength at an aimed timing when a second delay time elapses from the oscillation start timing, based on oscillation parameters including the first delay time, a supplied current waveform, and a device temperature of the quantum cascade laser. 1. A laser apparatus comprising:a quantum cascade laser configured to output, on a basis of a supplied current, laser light at an oscillation start timing at which a first delay time elapses from a current rising timing of the supplied current;an amplifier disposed in an optical path of the laser light, and configured to selectively amplify light of a predetermined wavelength to output the amplified laser light to a chamber, the chamber including a plasma generation region into which a target is to be fed; anda laser controller configured to control, on a basis of a plurality of oscillation parameters, a third delay time to cause a wavelength of the laser light to be equal to the predetermined wavelength at an aimed timing at which a second delay time elapses from the oscillation start timing, the oscillation parameters including the first delay time, a current waveform of the supplied current, and a device temperature of the quantum cascade laser, the third delay time being a time period from an output timing of a laser output instruction to the current rising timing, the laser ...

Electromagnetically pumped alkali metal vapor cell system

An electromagnetic pumped alkali metal vapor cell system is provided. The system comprises a vapor cell and windings. The vapor cell contains alkali metal and a buffer. The windings are positioned around the vapor cell and are configured to create an electromagnet field in the vapor cell when an AC signal is applied to the windings. The electromagnetic field pumps unexcited alkali vapor into unionized D 1 and D 2 states.

Laser device

Excimer laser oscillation device having gas recycle function

(과제) 엑시머 레이저 발진 장치에서 사용되는 희가스 (예를 들어, 아르곤, 크세논, 크립톤 등) 를 함유하는 배기 가스로부터, 불순물을 제거하는 제거 기능을 엑시머 레이저 발진 장치의 계내에 형성하는 것을 목적으로 한다. (해결 수단) 가스 리사이클 기능을 구비하는 엑시머 레이저 발진 장치는, 할로겐 가스, 희가스, 및 버퍼 가스를 갖는 레이저 가스를 내부에 충전하고 있는 발진 챔버와, 상기 발진 챔버로부터 배출된 배기 가스 중의 불순물을 제거하는 제 1 불순물 제거 장치를 엑시머 레이저 발진 장치의 계내에 구비한다.

Excimer laser oscillation device having gas recycle function

(과제) 엑시머 레이저 발진 장치에서 사용되는 희가스 (예를 들어, 아르곤, 크세논, 크립톤 등) 를 함유하는 배기 가스로부터, 불순물을 제거하는 제거 기능을 엑시머 레이저 발진 장치의 계내에 형성하는 것을 목적으로 한다. (해결 수단) 가스 리사이클 기능을 구비하는 엑시머 레이저 발진 장치는, 할로겐 가스, 희가스, 및 버퍼 가스를 갖는 레이저 가스를 내부에 충전하고 있는 발진 챔버와, 상기 발진 챔버로부터 배출된 배기 가스 중의 불순물을 제거하는 제 1 불순물 제거 장치를 엑시머 레이저 발진 장치의 계내에 구비한다. (Problem) An object of the present invention is to provide a removal function for removing impurities from an exhaust gas containing a rare gas (for example, argon, xenon, krypton, etc.) used in an excimer laser oscillator in the system of an excimer laser oscillator. . (Solving means) An excimer laser oscillation apparatus having a gas recycling function removes impurities in an oscillation chamber filled with a laser gas having a halogen gas, a rare gas, and a buffer gas therein and an exhaust gas discharged from the oscillation chamber. A first impurity removal device is provided in the system of the excimer laser oscillation device.

Controlling spectral characteristics of an output light beam generated by a light source

一种系统包括：包括多个光学振荡器的光源；光谱分析设备；以及控制器。每个光学振荡器被配置为产生光束。该控制器被配置为：基于来自光谱分析设备的数据，确定光学振荡器中的一个光学振荡器的光束的光谱特性是否不同于多个光学振荡器中的至少另一光学振荡器的光束的光谱特性。如果光学振荡器中的第一光学振荡器的光束的光谱特性不同于光学振荡器中的另一光学振荡器的光束的光谱特性，则控制器被配置为调整光学振荡器中的第一光学振荡器的光束或光学振荡器中的至少一个其它光学振荡器的光束的光谱特性。

Set of extremely narrow-band two-chamber gas-discharge lasers characterized in high pulse repetition frequency

FIELD: electric-discharge lasers including narrow-band gas-discharge ones characterized in high pulse repetition frequency. SUBSTANCE: each of proposed lasers designed for producing pulses at repetition frequency of 4000 Hz or higher at pulse energy about 5 to 10 mJ or higher affording radiation power output of 20 to 40 W or higher has two separate discharge chambers of which one is part of master oscillator generating narrow-band prime beam which is amplified in second discharge chamber. Working chambers can be controlled separately. Each working chamber has one tangential-flow fan producing gas flow sufficient for operation at pulse repetition frequency of 4000 Hz. Master oscillator is provided with radiation-line narrowing module incorporating fast-response adjusting mirror. EFFECT: enhanced quality of laser pulse radiation beams and power output. 78 cl, 80 dwg

Method of controlling laser oscillator

내용 없음. No content.

PACKED-BED FILTER FOR METAL FLUORIDE DUST TRAPPING IN LASER DISCHARGE CHAMBERS

A light source apparatus () includes a gas discharge stage () and a metal fluoride trap (). The gas discharge stage includes an optical amplifier () and a set of optical elements (). The optical amplifier includes a chamber () configured to hold a gas discharge medium (), the gas discharge medium outputting a light beam. The set of optical elements is configured to form an optical resonator around the optical amplifier. The metal fluoride trap is configured to trap metal fluoride dust generated from the gas discharge stage. The metal fluoride trap includes an electrostatic precipitator () and a packed-bed filter () disposed around the electrostatic precipitator. The packed-bed filter includes a plurality of beads configured () to absorb metal fluoride dust ().

Gas supply method of excimer laser device

레이저챔버내에 할로겐가스, 희가스, 버퍼가스를 주입하여 레이저발진을 행하는 엑시머레이저장치에 있어서, 레이저발진전에, 발지정지시간을 산출하고, 그 산출한 발진정지시간이 소정시간을 넘어 있으면 그 산출한 발진정지시간에 기초하여 희가스 및 버퍼가스의 혼합가스의 주입량을 산출하고, 그 산출한 주입량만큼 혼합가스를 레이저 발진전에 주입하도록 하여 레이저발진초기로부터 안정한 레이저출력이 얻어지도록 한다.

Laser wavelength control unit with piezoelectric driver

An electric discharge laser (34) with fast wavelength correction. Fast wavelength correction equipment includes at least one piezoelectric drive and a fast wavelength measurement system (104) and fast feedback response times. In a preferred embodiment, equipment is provided to control wavelength on a slow time frame of several milliseconds, on a intermediate time from of about one to five milliseconds and on a very fast time frame of a few microseconds. Preferred techniques include a combination of a relatively slow stepper motor and a very fast piezoelectric driver for tuning the laser wavelength using a tuning mirror. Very fast wavelength control is provided with a piezoelectric load cell in combination with the piezoelectric driver. Preferred embodiments provide fast feedback control based on wavelength measurements, fast vibration control, active damping using the load cell and an active damping module (320), and transient inversion using feed forward algorithms based on historical burst data.

Laser unit and non-transitory computer-readable storage medium

There may be provided a laser unit including a display configured to display one or both of electric power consumed by the laser unit and electric energy consumed by the laser unit.

GAS LASER

METHOD AND DEVICE FOR ANALYSIS OF FLUORINE-CONTAINING GASES AND FOR CONTROLLING FLUORINE CONCENTRATION IN EXCESSOR LASER GAS

L'invention concerne un appareil pour analyser un gaz mixte contenant du fluor gazeux pour déterminer la concentration de ce fluor gazeux. Selon l'invention, il comprend une colonne garnie 20 contenant un composé qui n'a pas d'atome d'halogène et qui réagit avec le fluor gazeux pour former un halogénure solide et au moins l'un de l'oxygène moléculaire et du gaz carbonique, un moyen 16 pour faire passer le gaz mixte contenant du fluor à travers la colonne garnie et un moyen 40 de détection du gaz pour mesurer la concentration de l'oxygène moléculaire ou du gaz carbonique dans un gaz sortant de la colonne garnie. L'invention s'applique notamment à l'analyse des gaz de lasers excimeurs contenant du fluor.

Patent FR1488482A

GAS LASER OSCILLATOR OF THE FAST AXIAL CIRCULATION TYPE

L'INVENTION CONCERNE LES LASERS A GAZ. UN OSCILLATEUR A LASER A GAZ COMPREND NOTAMMENT UN ECHANGEUR DE CHALEUR 43 DESTINE A REFROIDIR LE GAZ LASER, DES MOYENS DE CIRCULATION DE GAZ 69, UN ENSEMBLE DE TUBES LASERS 49A, 49B DISPOSES PARALLELEMENT LES UNS AUX AUTRES, ET UN ENSEMBLE DE CONDUITS DE RECYCLAGE DE GAZ 97 QUI RELIENT LES TUBES LASERS A L'ECHANGEUR DE CHALEUR ET QUI ONT TOUS PRATIQUEMENT LA MEME LONGUEUR. DES CATALYSEURS 129 SONT INCORPORES DANS LES CONDUITS DE RECYCLAGE POUR NEUTRALISER LE GAZ IONISE QUI SORT DES TUBES LASERS. APPLICATION AUX MACHINES-OUTILS A LASER. THE INVENTION RELATES TO GAS LASERS. A GAS LASER OSCILLATOR INCLUDES IN PARTICULAR A HEAT EXCHANGER 43 INTENDED TO COOL LASER GAS, GAS CIRCULATION MEANS 69, A SET OF LASER TUBES 49A, 49B ARRANGED IN PARALLEL WITH ONE TO THE OTHERS, AND A CONDUIT RECOVERY SET OF GAS 97 WHICH CONNECT THE LASER TUBES TO THE HEAT EXCHANGER AND WHICH ARE PRACTICALLY THE SAME LENGTH. CATALYZERS 129 ARE INCORPORATED IN THE RECYCLING DUCTS TO NEUTRALIZE THE IONIZED GAS THAT COMES OUT OF THE LASER TUBES. APPLICATION TO LASER MACHINE-TOOLS.

MULTI-PULSE LASER

L'INVENTION CONCERNE LES LASERS FONCTIONNANT EN REGIME D'IMPULSIONS. UN LASER CAPABLE DE PRODUIRE DES IMPULSIONS MULTIPLES COMPREND UN SEUL RESONATEUR OPTIQUE DEFINI PAR DES MIROIRS 30, 32, 34, 36, AVEC PLUSIEURS REGIONS DE DECHARGE ET PLUSIEURS JEUX D'ELECTRODES 12, 14; 16, 18 ET DE DISPOSITIFS DE PRE-IONISATION 21, 23. LE RESONATEUR OPTIQUE EST REPLIE ET LE FAISCEAU TRAVERSE TOUTES LES REGIONS DE DECHARGE. DU FAIT DE L'UTILISATION D'UN SEUL RESONATEUR, LES IMPULSIONS MULTIPLES PRODUITES PAR LES DIFFERENTES REGIONS DE DECHARGE SONT IDENTIQUES. LA SEPARATION DES REGIONS DE DECHARGES FAIT QUE L'ONDE DE CHOC ET LE DEFAUT D'HOMOGENEITE DU MILIEU AMPLIFICATEUR PRODUITS PAR UNE DECHARGE NE PERTURBENT PAS D'AUTRES DECHARGES. APPLICATION A L'INSTRUMENTATION AERONAUTIQUE. THE INVENTION CONCERNS LASERS OPERATING IN PULSE REGIME. A LASER CAPABLE OF PRODUCING MULTIPLE PULSES INCLUDES A SINGLE OPTICAL RESONATOR DEFINED BY MIRRORS 30, 32, 34, 36, WITH SEVERAL DISCHARGE REGIONS AND SEVERAL SETS OF ELECTRODES 12, 14; 16, 18 AND PRE-IONIZATION DEVICES 21, 23. THE OPTICAL RESONATOR IS FOLDED AND THE BEAM CROSSES ALL THE DISCHARGE REGIONS. DUE TO THE USE OF A SINGLE RESONATOR, THE MULTIPLE PULSES PRODUCED BY THE DIFFERENT REGIONS OF DISCHARGE ARE IDENTICAL. THE SEPARATION OF THE DISCHARGE REGIONS MAKES THAT THE SHOCK WAVE AND THE FAILURE OF HOMOGENEITY OF THE AMPLIFIER MEDIUM PRODUCED BY ONE DISCHARGE DO NOT INTERRUPT OTHER DISCHARGES. APPLICATION TO AERONAUTICAL INSTRUMENTATION.

AXIS CIRCULATION TYPE GAS LASER OSCILLATOR

Device and method for shape and power control of the output pulses of a pulsed CO2 laser

Um eine konstante Laserausgangspulsleistung in einem RF-angeregten, abgeschlossenen, diffusionsgekühlten, gepulsten CO 2 -Gasentladungslaser aufrechtzuerhalten, wird jeder Laserausgangspuls durch einen Zug oder eine Folge von kürzeren RF-Pulsen erzeugt. Wenn die Zeit zwischen den Laserausgangspulsen kurz genug wird, so dass die Leistung in einem Puls durch Gasentladungs-Wärmeeffekte eines vorhergehenden Pulses verringert würde, wird die Leistung in den RF-Pulszügen durch Ändern der Dauer oder des Tastgrads der Pulse in den Folgen verändert, wodurch die Ausgangspulsleistung in den Laserausgangspulsen konstant gehalten wird. RF-Pulse in einer beliebigen Folge können eine unterschiedliche Dauer haben, um die zeitliche Form eines zugehörigen Laserausgangspulses maßzuschneidern. In order to maintain a constant laser output pulse power in an RF excited, sealed, diffusion cooled, pulsed CO 2 gas discharge laser, each laser output pulse is generated by a train or train of shorter RF pulses. If the time between the laser output pulses becomes short enough so that the power in a pulse would be reduced by gas discharge heat effects of a previous pulse, the power in the RF pulse trains is changed by changing the duration or duty cycle of the pulses in the sequences the output pulse power in the laser output pulses is kept constant. RF pulses in any sequence may have a different duration to tailor the temporal shape of an associated laser output pulse.

Dual pulse width medical laser with preset

Output pulse Form and power control of a pulsed CO2 laser

Um eine konstante Laserausgangspulsleistung in einem RF-angeregten, abgeschlossenen, diffusionsgekühlten, gepulsten CO2-Gasentladungslaser aufrechtzuerhalten, wird jeder Laserausgangspuls durch einen Zug oder eine Folge von kürzeren RF-Pulsen erzeugt. Wenn die Zeit zwischen den Laserausgangspulsen kurz genug wird, so dass die Leistung in einem Puls durch Gasentladungs-Wärmeeffekte eines vorhergehenden Pulses verringert würde, wird die Leistung in den RF-Pulszügen durch Ändern der Dauer oder des Tastgrads der Pulse in den Folgen verändert, wodurch die Ausgangspulsleistung in den Laserausgangspulsen konstant gehalten wird. RF-Pulse in einer beliebigen Folge können eine unterschiedliche Dauer haben, um die zeitliche Form eines zugehörigen Laserausgangspulses maßzuschneidern. In order to maintain a constant laser output pulse power in an RF excited, sealed, diffusion cooled, pulsed CO2 gas discharge laser, each laser output pulse is generated by a train or train of shorter RF pulses. If the time between the laser output pulses becomes short enough so that the power in a pulse would be reduced by gas discharge heat effects of a previous pulse, the power in the RF pulse trains is changed by changing the duration or duty cycle of the pulses in the sequences the output pulse power in the laser output pulses is kept constant. RF pulses in any sequence may have a different duration to tailor the temporal shape of an associated laser output pulse.

Powerful pulsed self-seeding co2 laser

本公开内容公开一种CO 2 激光器和一种用于CO 2 激光器的方法。所述CO 2 激光器包括：不稳定激光器腔，所述激光器腔采用具有半透明输出耦合器(3)的第一光学谐振器的形式；所述不稳定激光器腔中的激光介质(2)；以及用于激发所述激光介质(2)的构件(1)。在所述输出耦合器(3)的所述光孔径之外传播的所述激光束的一部分被引导到第二谐振器，所述第二谐振器包括至少一个聚焦部件(6)，并且所述第二谐振器的光学长度等于所述第一光学谐振器的光学长度或为其倍数。穿过所述聚焦部件(6)的焦平面的所述激光束的所述部分通过使用Q开关装置(8)以一定的方式被调制，从而使得所述激光介质的激发与所述Q开关装置(8)的操作同步。

Laser control device with interval timer

ABSTRACT OF THE DISCLOSURE A laser control device includes a pulse repetition interval timer and a pulse width timer that, upon each setting, directs one pulse having a predetermined pulse width to a laser system that emits a laser beam in response thereto. A pulse cycle timer is provided which sets the pulse width timer at preset intervals during a time period from its initial setting until the resetting thereof. The pulse repetition interval timer resets the pulse cycle timer when a predetermined time . -,, ~ has passed since the initial setting time, and an acutator is provided for simultaneously setting the pulse width timer, the pulse cycle timer and the interval timer.

Frequency sweeping phase-locked-loop syntesizer power supply for co2 waveguide laser

Gas laser oscillator

Controlling a spectral property of an output light beam produced by an optical source

A system includes: an optical source including a plurality of optical oscillators; a spectral analysis apparatus; and a controller. Each optical oscillator is configured to produce a light beam. The controller is configured to: determine, based on data from the spectral analysis apparatus, whether the spectral property of the light beam of one of the optical oscillators is different than the spectral property of the light beam of at least another of the plurality of optical oscillators. If the spectral property of the light beam of the first one of the optical oscillators is different than the spectral property of the light beam of another of the optical oscillators, the controller is configured to adjust the spectral property of the light beam of the first one of the optical oscillators or of the light beam of at least one other of the optical oscillators.

Excimer laser apparatus and electronic-device manufacturing method

An excimer laser apparatus according to the present disclosure includes an etalon spectrometer configured to measure a fringe waveform of a laser beam; and a controller configured to obtain area of a first ratio in a spectral space obtained based on a result of the measurement by the etalon spectrometer, calculate a first spectral line width of the laser beam based on the obtained area of the first ratio, and calibrate a first spectral line width based on a correlation function representing correlation between the first spectral line width and a second spectral line width of the laser beam measured by a reference meter.

Laser spectral engineering for lithographic processing

Gas laser oscillator

The gas laser oscillator of the invention comprises a discharge tube, a pair of electrodes disposed at both ends thereof, a direct-current high voltage power source for applying a direct-current high voltage in pulse form to the pair of electrodes, an output control device for controlling the direct-current high voltage power source, a fully reflective mirror provided at one end of the outside of the pair of electrodes, a partially reflective mirror disposed at the other end of the outside of the pair of electrodes, and an absorber disposed outside of the partially reflective mirror. In thus constituted gas laser oscillator, the output control device controls to apply a same direct-current voltage as during processing between the pair of electrodes also on standby while the absorber is closed. The gas laser oscillator of the invention further comprises a beam splitter outside of the absorber, a switch to be actuated while the beam splitter is installed at a specified position, a focusing lens disposed on the optical axis of the laser beam reflected and separated by the beam splitter, a shielding plate disposed so as to open or close the passage of laser beam, a switch to be actuated while the shielding plate is open, a detector for detecting the laser beam, an amplifier for amplifying the output of the detector, and a medium passage disposed in contact with the detector for realizing heat exchange between the temperature-controlled medium and the detector, whereby it is controlled to issue the laser beam only while the beam splitter is installed at a specified position. The output of the laser beam is controlled so that the detector input may not exceed the maximum allowable input of the detector while the shielding plate is open. Moreover, the beam splitter, focusing lens, and detector are arranged so that the optical axis may be horizontal to the laser beam passing therethrough.

Laser processing method

Method of processing, e.g., laser annealing, objects such as semiconductor devices with pulsed lasers with high production yield and high reproducibility so as to obtain good characteristics stably. The pulse width of the irradiated pulse beam is set to more than 30 nsec to stabilize the processing. To achieve a pulse width exceeding 30 nsec, plural lasers are connected in series or in parallel and excited successively.

Pulsed CO2 Laser Output-Pulse Shape And Power Control

In order to maintain a constant laser output pulse power in a RF-energized, sealed-off, diffusion cooled, pulsed, CO2 gas-discharge laser (160), each laser output pulse is generated by train or burst of shorter RF pulses. When the time between laser output pulses (176) becomes short enough that the power in one pulse would be reduced by gas-discharge heating effects of a previous pulse, power in the RF pulse trains (164) is varied by varying the duration or duty cycle of pulses in the bursts, thereby keeping output-pulse power in the laser output pulses constant. RF pulses in any burst can have a different duration for tailoring the temporal shape of a corresponding laser-output pulse.

Method of controlling a radiation source and lithographic apparatus comprising the radiation source

A method of selecting a periodic modulation to be applied to a variable of a radiation source, wherein the source delivers radiation for projection onto a substrate and wherein there is relative motion between the substrate and the radiation at a scan speed, the method including: for a set of system parameters and for a position on the substrate, calculating a quantity, the quantity being a measure of the contribution to an energy dose delivered to the position that arises from the modulation being applied to the variable of the source, wherein the contribution to the energy dose is calculated as a convolution of: a profile of radiation, and a contribution to an irradiance of radiation delivered by the source; and selecting a modulation frequency at which the quantity for the set of system parameters and the position on the substrate satisfies a certain criteria.

Method and apparatus for controlling the output of a gas discharge laser system

The present invention relates to a fluorine gas discharge laser system and control of replenishment of fluorine gas as the gas discharge laser operates and consumes fluorine.

Laser wavelength control unit with piezoelectric driver

An electric discharge laser with fast wavelength correction. Fast wavelength correction equipment includes at least one piezoelectric drive and a fast wavelength measurement system and fast feedback response times. In a preferred embodiment, equipment is provided to control wavelength on a slow time frame of several milliseconds, on a intermediate time from of about one to three millisecond and on a very fast time frame of a few microseconds. Techniques include a combination of a relatively slow stepper motor and a very fast piezoelectric driver for tuning the laser wavelength using a tuning mirror. A preferred control technique is described (utilizing a very fast wavelength monitor) to provide the slow and intermediate wavelength control and a piezoelectric load cell in combination with the piezoelectric driver to provide the very fast (few microseconds) wavelength control.

Laser wavelength control unit with piezoelectric driver

An electric discharge laser with fast wavelength correction. Fast wavelength correction equipment includes at least one piezoelectric drive and a fast wavelength measurement system and fast feedback response times. In a preferred embodiment, equipment is provided to control wavelength on a slow time frame of several milliseconds, on a intermediate time from of about one to three millisecond and on a very fast time frame of a few microseconds. Techniques include a combination of a relatively slow stepper motor and a very fast piezoelectric driver for tuning the laser wavelength using a tuning mirror. A preferred control technique is described (utilizing a very fast wavelength monitor) to provide the slow and intermediate wavelength control and a piezoelectric load cell in combination with the piezoelectric driver to provide the very fast (few microseconds) wavelength control.

Systems and methods for supplying power to and cooling dental laser systems

A dental laser system (12) is configured to provide high peak laser power, low duty cycle laser pulses, yielding a low average laser power and thus a reduced need for cooling. The laser power system may be configured to provide the electrical power required to produce the low average laser power and not the high peak laser power, and may include a capacitor bank section having at least one capacitor (50) configured to provide the electrical power needed to produce the high peak power laser pulses. The capacitors (50) are charged by a power supply comprising an AC filter (42) for removing noise and an AC-DC converter (44) charging the capacitors. At least 75% of the electrical power supplied to the laser should be delivered by the capacitors, the remainder directly from the AC-DC converter. The electrical power is supplied to the laser (12) by twisted lines (52,54) in order to reduce noise. The cooling system may be configured to provide laser cooling for the low average power level and thus may not require a refrigeration unit.

Gas laser oscillation device

本发明的气体激光振荡装置具有放电部、鼓风部以及激光气体路径。放电部激励激光气体介质，鼓风部输送激光气体。激光气体路径形成激光气体在放电部与鼓风部之间的循环路径。鼓风部具有叶轮部、驱动部、以及设置在叶轮部与驱动部之间的中间室。在叶轮部上配置有通过驱动部经由旋转轴而旋转的旋转叶片。中间室被气体阻隔构件局部分隔出主空间和气体缓冲空间。

GAS LASER

L'INVENTION CONCERNE UN LASER A GAZ DE TYPE PULSE. ELLE SE RAPPORTE A UN LASER A GAZ DANS LEQUEL LES ELECTRODES NEGATIVES K-K SONT CONNECTEES A L'ALIMENTATION PRINCIPALE EM PAR UN COMPOSANT D-D PAR EXEMPLE UNE DIODE, QUI EMPECHE LA CIRCULATION DU COURANT EN SENS INVERSE. DE CETTE MANIERE, L'ALIMENTATION D'ENTRETIEN ES PEUT AVOIR UNE FAIBLE TENSION ET LE COURANT QU'ELLE FOURNIT PEUT ETRE REDUIT. APPLICATION AUX LASERS A ANHYDRIDE CARBONIQUE. THE INVENTION RELATES TO A PULSE TYPE GAS LASER. IT RELATES TO A GAS LASER IN WHICH THE K-K NEGATIVE ELECTRODES ARE CONNECTED TO THE MAIN EM POWER SUPPLY THROUGH A D-D COMPONENT, FOR EXAMPLE A DIODE, WHICH PREVENTS THE FLOW OF CURRENT IN REVERSE DIRECTION. IN THIS WAY, THE ES MAINTENANCE POWER SUPPLY MAY HAVE A LOW VOLTAGE AND THE CURRENT PROVIDED MAY BE REDUCED. APPLICATION TO CARBONIC ANHYDRIDE LASERS.

Patent JPS6338875B2

Compensation for a disturbance in an optical source

A pulsed light beam emitted from an optical source is received, the pulsed light beam being associated with a temporal repetition rate; a frequency of a disturbance in the optical source is determined, the frequency being an aliased frequency that varies with the temporal repetition rate of the pulsed light beam; a correction waveform is generated based on the aliased frequency; and the disturbance in the optical source is compensated by modifying a characteristic of the pulsed light beam based on the generated correction waveform.

gas monitoring system

FAST AXIAL CIRCULATION TYPE GAS LASER OSCILLATOR