04-09-2014 дата публикации
Номер: WO2014132927A1
Принадлежит:
This hydrophobization treatment device (U5) is equipped with a cooling unit (40), a photoirradiation unit (50), an air supply unit (60), a raising/lowering unit (80), and a control unit (90). The cooling plate (41) of the cooling unit (40) faces the rear surface (Wb) of a wafer (W). The light source (51a) of the photoirradiation unit (50) faces the front surface (Wa) of the wafer (W) with a gap interposed therebetween, and emits light for radiation heating. The gas-storing body (61) of the air supply unit (60) covers the underside of the light source (51a) and faces the front surface (Wa) of the wafer (W) with a gap interposed therebetween. The underside of the gas-storing body (61) is provided with a plurality of gas discharge ports (63). The control unit (90) delivers a hydrophobization-treatment gas by controlling the air supply unit (60), with the wafer (W) positioned near the cooling plate (41) as a result of controlling the raising/lowering unit (80). Thereafter, the hydrophobization-treatment ...
Подробнее