09-05-2023 дата публикации
Номер: CN116083173A
Принадлежит:
The invention discloses a cleaning composition used after sapphire substrate polishing, which is prepared from the following raw materials in percentage by mass: 3-15% of inorganic base, 1-10% of Gemini type polyether phosphate surfactant, 1-5% of penetrant, 1-8% of dispersing agent and the balance of water, and the sum of the mass percentages is 100%. The cleaning composition using the specific Gemini type polyether phosphate surfactant has good wax removal, chelation, cleaning, wetting, dispersion and other effects, and can effectively remove residual surface particles, wax dirt, dust and other organic pollutants after the sapphire substrate slice is ground and polished at a time; and the problem of difficulty in cleaning caused by'hydration layer 'residues in the industry can be solved, and the cleaning agent has the advantages of high product concentration, good cleaning effect, high cleaning yield, long service life, environmental friendliness and the like.
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