11-08-2023 дата публикации
Номер: CN116581134A
Принадлежит:
The invention discloses an ultraviolet-enhanced CMOS image sensor based on a fluorescent down-conversion material Alq3 and a preparation method of the ultraviolet-enhanced CMOS image sensor, belongs to the technical field of ultraviolet photoelectric detection, and particularly relates to an ultraviolet-enhanced silicon-based CMOS image sensor based on a down-conversion nano material and a preparation method of the ultraviolet-enhanced silicon-based CMOS image sensor. According to the ultraviolet-enhanced silicon-based CMOS image sensor, a vacuum thermal evaporation method is adopted, a powdery down-conversion nanometer material Alq3 is plated on the photosensitive surface of a CMOS to form a layer of uniform film, direct coupling of the material and a device is achieved, ultraviolet light is absorbed through the down-conversion nanometer material, and visible light matched with the spectral response peak value of the CMOS is emitted. The ultraviolet response capability of the photoelectric ...
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