25-07-2023 дата публикации
Номер: CN116482935A
Автор:
MOON HYUNG-RANG,
KIM YOUNG-KWON,
HEO RYUN-MIN,
LEE MIN-YOUNG,
KIM MIN-SOO,
LEE KYU-WON,
CHOI JUNG-MIN,
PARK CHUL-HONG,
KO MOO-HYUN,
BAE SANG-WON,
KIM JUNG-A
Принадлежит:
The invention relates to a method of forming a pattern. The method includes applying a metal-containing resist composition on a substrate, sequentially applying two types of compositions for removing edge beads along an edge of the substrate, performing a heat treatment including drying and heating to form a metal-containing resist film on the substrate, and exposing and developing the metal-containing resist film to form a resist pattern; or applying a metal-containing resist composition on a substrate, applying a composition for removing edge beads along an edge of the substrate, performing a heat treatment including drying and heating to form a metal-containing resist film on the substrate, exposing the metal-containing resist film, and developing with a developer composition to form a resist pattern, details of the two types of compositions for removing edge beads and the developer composition are as described in the specification.
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