Настройки

Укажите год
-

Небесная энциклопедия

Космические корабли и станции, автоматические КА и методы их проектирования, бортовые комплексы управления, системы и средства жизнеобеспечения, особенности технологии производства ракетно-космических систем

Подробнее
-

Мониторинг СМИ

Мониторинг СМИ и социальных сетей. Сканирование интернета, новостных сайтов, специализированных контентных площадок на базе мессенджеров. Гибкие настройки фильтров и первоначальных источников.

Подробнее

Форма поиска

Поддерживает ввод нескольких поисковых фраз (по одной на строку). При поиске обеспечивает поддержку морфологии русского и английского языка
Ведите корректный номера.
Ведите корректный номера.
Ведите корректный номера.
Ведите корректный номера.
Укажите год
Укажите год
Применить Всего найдено 24. Отображено 24.
27-03-2014 дата публикации

METHOD FOR PRODUCING POLISHING MATERIAL PARTICLES

Номер: WO2014045939A1
Автор: ITO, Natsuki, MAEZAWA, Akihiro, TAKAHASHI, Atsushi, MIZOGUCHI, Keisuke
Принадлежит:

The present invention addresses the problem of providing a method for producing polishing material particles, which efficiently produces polishing material particles having higher durability and higher polishing rate, while suppressing the amount of cerium oxide used therein. A method for producing polishing material particles, which comprises: a core layer formation step (A) wherein a core layer (1) is formed by means of an aqueous solution that contains a salt of a first element; an intermediate layer formation step (B) wherein an intermediate layer (2) is formed by adding an aqueous solution that contains a salt of a second element and a salt of Ce into the reaction solution; a shell layer formation step (C) wherein a shell layer (3) is formed by adding an aqueous solution that contains a salt of Ce into the reaction solution; a solid-liquid separation step (D); and a firing step (E). The addition amount of Ce contained in the aqueous solution to be added last in the shell layer formation ...

Подробнее
Номер записи: 1
19-12-2013 дата публикации

POLISHING MATERIAL COMPOSITION AND PRODUCTION METHOD THEREFOR

Номер: WO2013187358A1
Автор: ITO, Natsuki, TAKAHASHI, Atsushi, MAEZAWA, Akihiro
Принадлежит:

The purpose of the present invention is to provide a polishing material composition which is capable of combining excellent polishing speed and endurance, and which reduces polish-surface surface roughness so as to inhibit scratches on the object to be polished, while suppressing the amount of cerium oxide used. A polishing material composition (100) used for a polishing material is provided with: inorganic polishing material particles (10) each having a shell layer (3) which is the outermost shell layer, and which is formed using cerium oxide as a main component thereof, and an intermediate layer (2) which includes cerium oxide and an oxide of at least one element selected from Al, Sc, Ti, V, Cr, Mn, Fe, Co, Ni, Cu, Zn, Ga, Ge, Zr, In, Sn, Y, Gd, Tb, Dy, Ho, Er, Tm, Yb, Lu, W, Bi, Th, and the alkali earth metals, and which is formed further inside than the shell layer (3); and an organic base material (20) which includes a polymerizable compound. The outer surface of the organic base material ...

Подробнее
Номер записи: 2
12-02-2015 дата публикации

POLISHING MATERIAL PARTICLES, METHOD FOR PRODUCING POLISHING MATERIAL, AND POLISHING PROCESSING METHOD

Номер: WO2015019888A1
Автор: MIZOGUCHI, Keisuke, MAEZAWA, Akihiro, ITO, Natsuki, TAKAHASHI, Atsushi, WAKAMATSU, Hideaki, NAGAI, Yuuki, INUI, Chie
Принадлежит:

The present invention addresses the problem of providing: polishing material particles which have polishing performance suitable for precision polishing and also have a high polishing speed and high monodispersibility; a polishing material containing the polishing material particles; and a polishing processing method using the polishing material. The polishing material particles according to the present invention are characterized by being spherical particles having an average aspect ratio of 1.00 to 1.15, wherein the particle diameter (D50 (nm)) of the polishing material particles as determined from a particle diameter cumulative distribution curve falls within the range from 50 to 1500 nm, and the average content of cerium or the total content of cerium and at least one element selected from lanthanum (La), praseodymium (Pr), neodymium (Nd), samarium (Sm) and europium (Eu) in the polishing material particles is 81 mol% or more relative to the total content of all of rare earth elements ...

Подробнее
Номер записи: 3
03-11-2016 дата публикации

POLYAMIDEIMIDE RESIN COMPOSITION AND COATING MATERIAL

Номер: WO2016175099A1
Автор: TAKAHASHI, Atsushi, SAITO, Yasuyuki, HARADA, Yuta
Принадлежит:

A polyamideimide resin composition comprising: (A) a polyamideimide resin that contains structural units derived from 3,3'-dimethylbiphenyl-4,4'-diisocyanate and/or 3,3'-dimethylbiphenyl-4,4'-diamine in a total amount of 30 mol% or more relative to all structural units derived from isocyanates and/or all structural units derived from diamines; (B) water; and (C) an organic solvent.

Подробнее
Номер записи: 4
22-06-2017 дата публикации

POLYAMIDE-IMIDE RESIN AND COATING MATERIAL

Номер: WO2017104461A1
Автор: SAITO Yasuyuki, TAKAHASHI Atsushi, HARADA Yuta
Принадлежит:

A polyamide-imide resin which has an isocyanate group at an end, and wherein at least a part of the isocyanate group is blocked with an ether group-containing cyclic amine.

Подробнее
Номер записи: 5
22-08-2013 дата публикации

ABRASIVE REGENERATION METHOD

Номер: WO2013122123A1
Автор: NAGAI, Yuuki, MAEZAWA, Akihiro, TAKAHASHI, Atsushi
Принадлежит:

The purpose of the present invention is to provide an abrasive regeneration method which, from a used abrasive, can recover an abrasive by an efficient method and can thereafter obtain a high-purity regenerated abrasive by a simple method. This abrasive regeneration method regenerates an abrasive from a used abrasive slurry and is characterized by said abrasive comprising at least one type of abrasive selected from diamond, boron nitride, silicon carbide, alumina, alumina zirconia, zirconium oxide and cerium oxide, and by abrasive regeneration involving a slurry recovery step (A) for recovering an abrasive slurry discharged from a polishing machine, a separation and concentration step (B) for adding an alkaline earth metal salt as an inorganic salt to the recovered abrasive slurry to aggregate the abrasive, and separating and concentrating the abrasive from a mother liquor, an abrasive recovery step (C) for recovering the separated and concentrated abrasive, and a second concentration step ...

Подробнее
Номер записи: 6
14-08-2014 дата публикации

POLISHING MATERIAL SLURRY

Номер: WO2014122976A1
Автор: TAKAHASHI, Atsushi, MAEZAWA, Akihiro, ITO, Natsuki, MIZOGUCHI, Keisuke, INUI, Chie
Принадлежит:

The problem addressed by the present invention is to provide a polishing material slurry that can obtain a high polishing speed and superior durability, and that suppresses the amount of cerium oxide used. The polishing material slurry contains at least water and core-shell polishing material particles, and is characterized in that the core-shell polishing material particles have a shell containing an oxide of cerium (Ce) and a core having as the primary component an oxide of at least one element selected from titanium (Ti), strontium (Sr), yttrium (Y), barium (Ba), samarium (Sm), europium (Eu), gadolinium (Gd), and terbium (Tb), at least one oxide of the oxides of the aforementioned nine elements is contained in both the core and the shell, and furthermore the pH value converted to that at a temperature of 25° of the polishing material slurry is in the range of 3.50-11.30.

Подробнее
Номер записи: 7
14-08-2014 дата публикации

CORE/SHELL-TYPE INORGANIC PARTICLES

Номер: WO2014122992A1
Автор: ITO, Natsuki, MAEZAWA, Akihiro, TAKAHASHI, Atsushi, MIZOGUCHI, Keisuke, INUI, Chie
Принадлежит:

The present invention addresses the problem of providing core/shell-type inorganic particles contained in a polishing material allowing a high polishing speed on harder polishing objects and suppressing the amount of cerium used, and reducing the surface roughness of the polishing object. These core/shell-type inorganic particles (P) are contained in a polishing material, the particles being characterized in having a core (1) containing: the salt of at least one element selected from yttrium (Y), titanium (Ti), strontium (Sr), barium (Ba), samarium (Sm), europium (Eu), gadolinium (Gd), and terbium (Tb); and a shell (2) containing the salt of at least one element selected from the abovementioned eight elements, and cerium (Ce) salt, the average crystallite diameter of the crystallites constituting the shell (2) being within the range of 4-30 nm.

Подробнее
Номер записи: 8
13-03-2014 дата публикации

PRODUCTION METHOD FOR POLISHING-MATERIAL PARTICLES

Номер: WO2014038536A1
Автор: TAKAHASHI, Atsushi, ITO, Natsuki, MIZOGUCHI, Keisuke, MAEZAWA, Akihiro
Принадлежит:

The problem to be solved by the present invention is to provide a production method for polishing-material particles, said production method with which the amount of cerium oxide used can be suppressed and greater durability and polishing speed can be achieved. This production method for polishing-material particles is characterized in that: an inner layer (1) is formed having, as a main component thereof, a salt of at least one element selected from Al, Sc, Ti, V, Cr, Mn, Fe, Co, Ni, Cu, Zn, Ga, Ge, Zr, In, Sn, Y, Gd, Tb, Dy, Ho, Er, Tm, Yb, Lu, W, Bi, Th, and the alkali earth metals; a prepared aqueous solution is added, at a prescribed time, to a reaction solution in which the salt formed from the element is dispersed, to form an external layer (2) on the outside of the inner layer (1); solid-liquid separation is used to separate a polishing-material-particle precursor from the reaction solution, and the polishing-material-particle precursor is baked; and the percentage of Ce in the ...

Подробнее
Номер записи: 9
22-08-2013 дата публикации

ABRASIVE REGENERATION METHOD

Номер: WO2013122128A1
Автор: NAGAI, Yuuki, MAEZAWA, Akihiro, TAKAHASHI, Atsushi
Принадлежит:

The purpose of the present invention is to provide an abrasive regeneration method which, from a used abrasive slurry, can recover an abrasive by an efficient method and can thereafter obtain a high-purity regenerated abrasive by a simple method. This abrasive regeneration method regenerates, from a used abrasive slurry, the abrasive contained in said abrasive slurry, is characterized by said abrasive comprising at least one type of abrasive selected from diamond, boron nitride, silicon carbide, alumina, alumina zirconia and zirconium oxide, and by abrasive regeneration involving a slurry recovery step (A) for recovering an abrasive slurry discharged from a polishing machine, a separation and concentration step (B) for adding an alkaline earth metal salt as an inorganic salt to the recovered abrasive slurry to aggregate the abrasive, and separating and concentrating the abrasive from a mother liquor, and an abrasive recovery step (C) for recovering the separated and concentrated abrasive ...

Подробнее
Номер записи: 10
14-08-2014 дата публикации

METHOD FOR PRODUCING ABRASIVE

Номер: WO2014122978A1
Автор: MIZOGUCHI, Keisuke, ITO, Natsuki, TAKAHASHI, Atsushi, INUI, Chie, MAEZAWA, Akihiro
Принадлежит:

The object of the invention is to provide a method for producing an abrasive that minimizes the amount of cerium oxide used, makes it possible to obtain a high polishing rate for an object to be polished having greater hardness, and makes it possible to reduce the surface roughness of the object to be polished. This method for producing an abrasive contains core-shell inorganic particles (P), and is characterized by having a firing step (D) for firing, for from one to five hours at a temperature within the range of 500-1200°C, a precursor of the core-shell inorganic particles (P) having: a core containing a salt of at least one element selected from yttrium (Y), titanium (Ti), strontium (Sr), barium (Ba), samarium (Sm), europium (Eu), gadolinium (Gd), and terbium (Tb); and a shell (2) containing a salt of at least one element selected from the above eight elements, and a salt of cerium (Ce).

Подробнее
Номер записи: 11
23-08-2018 дата публикации

POLYAMIDE IMIDE RESIN COMPOSITION AND FLUORINE COATING

Номер: WO2018150566A1
Автор: TAKAHASHI Atsushi
Принадлежит:

Provided are: a polyamide imide resin composition that comprises (A) a polyamide imide resin, (B) a 3-alkoxy-N,N-dimethylpropanamide, and (C) water; and a fluorine coating that comprises the polyamide imide resin composition and a fluororesin.

Подробнее
Номер записи: 12
07-02-2019 дата публикации

POLYAMIDE-IMIDE RESIN COMPOSITION AND FLUORINE-CONTAINING COATING MATERIAL

Номер: WO2019026838A1
Автор: TAKAHASHI Atsushi
Принадлежит:

A polyamide-imide resin composition including (A) a polyamide-imide resin, (B) 4-morpholinecarbaldehyde, (C) water, and (D) a basic compound, the viscosity change rate of the polyamide-imide resin composition from before to after storage for 7 days at 60°C being -30% or less.

Подробнее
Номер записи: 13
15-06-2017 дата публикации

POLY(AMIDE-IMIDE) RESIN COMPOSITION AND FLUOROCHEMICAL COATING MATERIAL

Номер: WO2017099030A1
Автор: TAKAHASHI Atsushi
Принадлежит:

A poly(amide-imide) resin composition that comprises: (A) a poly(amide-imide) resin which has isocyanate groups at terminals and in which at least some of the isocyanate groups have been blocked with a blocking agent selected from the group consisting of alcohols, oximes, and lactams; (B) N-formylmorpholine; and (C) water.

Подробнее
Номер записи: 14
02-08-2012 дата публикации

FINE ABRASIVE PARTICLES AND PROCESS FOR PRODUCING SAME

Номер: WO2012101871A1
Автор: MAEZAWA, Akihiro, TAKAHASHI, Atsushi, NAGAI, Yuuki
Принадлежит:

Provided are fine abrasive particles which have a high rate of polishing and generate few polishing flaws. A process for producing fine abrasive particles is also provided in which the fine abrasive particles have a reduced coefficient of fluctuation in particle diameter, the production steps are simple, and the production cost is low. The fine abrasive particles comprise cerium oxide, at least one element selected from La, Pr, Nd, Sm, and Eu, and one or more elements selected from Y, Gd, Tb, Dy, Ho, Er, Tm, Yb, and Lu, and are characterized in that the cerium oxide has a Ce content of 20 mol% or higher and that the sum (mol%) of the content of the at least one element selected from La, Pr, Nd, Sm, and Eu and the content of Ce in the cerium oxide is greater than the sum (mol%) of the contents of the one or more elements selected from Y, Gd, Tb, Dy, Ho, Er, Tm, Yb, and Lu.

Подробнее
Номер записи: 15
15-09-2016 дата публикации

HYDROGEN GAS DETECTING MEMBER, METHOD FOR MANUFACTURING SAME, AND HYDROGEN GAS DETECTING SYSTEM

Номер: WO2016143385A1
Автор: TAKAHASHI, Atsushi, MIZOGUCHI, Keisuke, MAEZAWA, Akihiro
Принадлежит:

The present invention addresses the problem of providing: a hydrogen gas detecting member exhibiting large variations in light transmittance or color according to hydrogen gas concentration and having a high detection sensitivity; a method for manufacturing the same; and a hydrogen gas detecting system having the same. The problem is solved by a hydrogen gas detecting member in which the light absorption characteristics vary with changes in hydrogen gas concentration, the hydrogen gas detecting member including a cerium oxide-containing layer, a tungsten oxide-containing layer, and a catalytic metal element-containing layer, wherein the cerium oxide-containing layer is disposed adjacent to the tungsten oxide-containing layer, and the catalytic metal element-containing layer is disposed on the reverse side of the surface of the tungsten oxide-containing layer facing the cerium oxide-containing layer.

Подробнее
Номер записи: 16
04-01-2018 дата публикации

POLYAMIDE-IMIDE RESIN COMPOSITION AND COATING MATERIAL

Номер: WO2018002988A1
Автор: SAITO, Yasuyuki, TAKAHASHI, Atsushi
Принадлежит:

A polyamide-imide resin composition which contains a polyamide-imide resin and a solvent that comprises a structure represented by formula (I). (In the formula, each of R1 and R2 independently represents an alkyl group having 1-3 carbon atoms, or alternatively R1 and R2 combine with each other and form a five-membered or six-membered heterocyclic group containing a nitrogen atom; and R3 represents a hydrogen atom or an alkyl group having 1-4 carbon atoms.) ...

Подробнее
Номер записи: 17
27-06-2013 дата публикации

ABRASIVE MATERIAL REGENERATION METHOD AND REGENERATED ABRASIVE MATERIAL

Номер: WO2013094399A1
Автор: TAKAHASHI, Atsushi, NAGAI, Yuuki, MAEZAWA, Akihiro
Принадлежит:

The problem addressed by the present invention is to provide: an abrasive material regeneration method that, by means of an efficient method, recovers cerium oxide from used abrasive material having cerium oxide as the primary component, and then can obtain a regenerated abrasive material by means of a simple method; and a regenerated abrasive material. The abrasive material regeneration method regenerates a cerium oxide abrasive material from a used abrasive material slurry containing the cerium oxide abrasive material and resulting from grinding a grinding subject having silicon as the primary component, and is characterized by regenerating the abrasive material containing cerium oxide through: a slurry recovery step (A) for recovering an abrasive material slurry discharged from a grinder; an isolation/concentration step (B) for adding a magnesium salt as an inorganic salt to the recovered abrasive material slurry, aggregating the abrasive material under the condition that the pH value ...

Подробнее
Номер записи: 18
07-02-2019 дата публикации

ORTHOSIS MANUFACTURING SYSTEM, SYSTEM FOR GENERATING CORRECTION DATA FOR MANUFACTURING ORTHOSIS, AND ORTHOSIS MANUFACTURING METHOD

Номер: WO2019026424A1
Автор: WASHIZU, Takashi, TANAKA, Yoshikazu, TAKAHASHI, Atsushi, ISHIGAI, Takuya
Принадлежит:

This orthosis manufacturing system is designed to manufacture an orthosis to be fitted on a human body and provided with: an orthosis modeling data generation unit (2) for generating orthosis modeling data (D4) for the orthosis on the basis of three-dimensional data (D1) of the human body generated by measuring the shape of a portion of the human body to which the orthosis is to be fitted, a model shape data (D2) for the orthosis, and manufacture history data (D3) relating to other orthoses manufactured in the past; and an orthosis formation unit (3) for three-dimensionally forming the orthosis on the basis of the modeling data (D4).

Подробнее
Номер записи: 19
02-08-2012 дата публикации

METHOD FOR RECOVERING ABRASIVE MATERIAL COMPONENT FROM USED ABRASIVE MATERIAL SLURRY, AND CERIUM OXIDE RECOVERED THROUGH METHOD

Номер: WO2012101868A1
Автор: TAKAHASHI, Atsushi, NAGAI, Yuuki, MAEZAWA, Akihiro
Принадлежит:

Provided is a method for recovering an abrasive material component from used slurry having cerium oxide as the principal component of the abrasive material therein, the abrasive component recovery method being one in which post-recovery treatment of the abrasive agent and waste liquid is easy. Also provided is cerium oxide recovered through the novel recovery method. A method for recovering an abrasive material component from used abrasive slurry containing cerium oxide in the abrasive material thereof is characterized in that the abrasive material component is recovered by: adding a magnesium salt to the used abrasive slurry; coagulating the abrasive material component and causing the same to sediment from the abrasive slurry, which contains the abrasive material component and components derived from the material subjected to abrasion; and separating the solids and liquids.

Подробнее
Номер записи: 20
04-07-2013 дата публикации

METHOD FOR SEPARATING POLISHING MATERIAL AND REGENERATED POLISHING MATERIAL

Номер: WO2013099666A1
Автор: TAKAHASHI, Atsushi, NAGAI, Yuuki, MAEZAWA, Akihiro
Принадлежит:

The present invention addresses the problem of providing: a method for separating a polishing material, which is capable of separating and recovering cerium oxide from a used polishing material that is mainly composed of cerium oxide by excellently efficient and economical processes; and a regenerated polishing material which can be obtained by the separation method. A method for separating a polishing material of the present invention separates a cerium oxide polishing material from a slurry of a used polishing material that contains cerium oxide. This method for separating a polishing material is characterized in that a divalent alkaline earth metal salt is added into the slurry of the used polishing material, while controlling the temperature of the slurry within the range of 10-70˚C, thereby causing the polishing material to aggregate under such conditions that the mother liquor has a pH of less than 10.0 as the pH is converted to one at 25˚C so that the polishing material is separated ...

Подробнее
Номер записи: 21
22-05-2014 дата публикации

SOLVENT FOR USE IN PREPARING LIQUID FOR ELECTROSTATIC SPRAYING, LIQUID FOR ELECTROSTATIC SPRAYING, AND ELECTROSTATIC SPRAYING METHOD

Номер: WO2014077362A1
Автор: TAKAHASHI Atsushi, WATANABE Koji, FUJIMOTO Masatoshi, KASAI Kouki
Принадлежит:

This solvent for use in preparing a liquid for electrostatic spraying has a solubility parameter of 9.2 to 13.4. This liquid for electrostatic spraying comprises both a solvent having a solubility parameter of 9.2 to 13.4 and a solute.

Подробнее
Номер записи: 22
19-12-2013 дата публикации

ABRASIVE PARTICLES AND PRODUCTION METHOD THEREOF

Номер: WO2013187354A1
Автор: TAKAHASHI, Atsushi, ITO, Natsuki, MAEZAWA, Akihiro
Принадлежит:

In order to use less cerium oxide and achieve higher durability and polishing speeds, these abrasive particles used in an abrasive have: a shell layer (3) which is the outermost shell layer of the abrasive particles and is formed with cerium oxide as the main component; and a middle layer (2) which contains cerium oxide and an oxide of at least one element selected from Al, Sc, Ti, V, Cr, Mn, Fe, Co, Ni, Cu, Zn, Ga, Ge, Zr, In, Sn, Y, Gd, Tb, Dy, Ho, Er, Tm, Yb, Lu, W, Bi, Th, and the alkali earth metals, and which is formed closer to the center of the abrasive particles than the shell layer (3).

Подробнее
Номер записи: 23
14-08-2014 дата публикации

POLISHING SLURRY

Номер: WO2014122982A1
Автор: INUI, Chie, MAEZAWA, Akihiro, ITO, Natsuki, MIZOGUCHI, Keisuke, TAKAHASHI, Atsushi
Принадлежит:

The problem to be solved by the present invention is to provide a polishing slurry that makes it possible to reduce the amount of cerium oxide used, does not cause clumping of polishing particles during long-term storage, has outstanding dispersion stability and scratch resistance when polishing, and has a high polishing rate. This polishing slurry is characterized by the following: the polishing slurry comprises core-shell-type polishing particles with respectively different compositions; the core of each core-shell-type polishing particle comprises as a primary constituent an oxide of a metallic element of at least one type selected from a group of designated metallic elements; the shell comprises cerium oxide as a primary constituent and an oxide of at least one type of metallic element selected from a group of designated metallic elements, as a secondary constituent; the core and the shell each comprise at least one type of oxide (including cerium oxide) of the same metallic element ...

Подробнее
Номер записи: 24