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Небесная энциклопедия

Космические корабли и станции, автоматические КА и методы их проектирования, бортовые комплексы управления, системы и средства жизнеобеспечения, особенности технологии производства ракетно-космических систем

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Мониторинг СМИ

Мониторинг СМИ и социальных сетей. Сканирование интернета, новостных сайтов, специализированных контентных площадок на базе мессенджеров. Гибкие настройки фильтров и первоначальных источников.

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Форма поиска

Поддерживает ввод нескольких поисковых фраз (по одной на строку). При поиске обеспечивает поддержку морфологии русского и английского языка
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Применить Всего найдено 17155. Отображено 100.
23-01-2017 дата публикации

Центрифуга

Номер: RU0000168186U1

Полезная модель относится к области производства оптических и оптико-электронных элементов и устройств и может быть использована преимущественно для финишной очистки поверхностей оптических деталей, например поверхностей подложек с нанесенными на них зеркалами лазерных гироскопов. Сущность полезной модели - она содержит корпус цилиндрической формы и опорный механизм, выполненный с возможностью установки и удержания оптической детали, а также подачи на ее поверхность моющего раствора и деионизованной воды, причем в верхней части корпуса имеется выемка, в центре которой установлен опорный механизм для удержания оптической детали, выполненный с возможностью вращения вокруг вертикальной оси в виде пружинящей разрезной втулки с упругими вертикально ориентированными пружинящими элементами, предназначенными для закрепления и удержания оптической детали, при этом внутренняя стенка выемки в верхней части корпуса выполнена из капиллярно-пористого материала с V-образным вырезом у верхнего края, а дно выемки выполнено с возможностью слива моющего раствора и деионизованной воды. Технический результат заключается в упрощении устройства и повышении качества очистки. 1 ил. РОССИЙСКАЯ ФЕДЕРАЦИЯ (19) RU (11) (13) 168 186 U1 (51) МПК B08B 3/10 (2006.01) B08B 3/02 (2006.01) B08B 11/02 (2006.01) H01L 21/08 (2006.01) ФЕДЕРАЛЬНАЯ СЛУЖБА ПО ИНТЕЛЛЕКТУАЛЬНОЙ СОБСТВЕННОСТИ (12) ФОРМУЛА ПОЛЕЗНОЙ МОДЕЛИ К ПАТЕНТУ РОССИЙСКОЙ ФЕДЕРАЦИИ (21)(22) Заявка: 2016127895, 12.07.2016 (24) Дата начала отсчета срока действия патента: 12.07.2016 (72) Автор(ы): Ищенко Петр Иванович (RU) Дата регистрации: 23.01.2017 Приоритет(ы): (22) Дата подачи заявки: 12.07.2016 Адрес для переписки: 117405, Москва, Варшавское ш., 143, корп. 1, кв. 110, Борисову Э.В. 1 6 8 1 8 6 R U (57) Формула полезной модели Центрифуга, содержащая корпус цилиндрической формы и опорный механизм, выполненный с возможностью установки и удержания оптической детали, а также подачи на ее поверхность моющего раствора и деионизованной воды, ...

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06-09-2019 дата публикации

Устройство зачистки поверхности секций радиаторов

Номер: RU0000192210U1

Полезная модель относится к металлообработке, в частности к устройствам, предназначенным для зачистки биметаллических или металлических поверхностей, выполненных из алюминия или алюминиевых сплавов, сложной геометрической формы от заусенцев, наклепа, облоя, шероховатостей и т.п.Устройство для зачистки секций радиаторов состоит из двух частей А и В, размещенных на основании 8, имеющем опорную часть 9, устанавливаемое на горизонтальную поверхность пола, содержит роликовый конвейер с верхним роликовым механизмом, представленный роликами 4, приводимыми в действие электрическим мотор-редуктором через шестерни, и нижний роликовый механизм, представленный роликами 5, имеющими возможность свободного вращения. Ролики 4 и 5 верхнего и нижнего роликовых механизмов зажимают радиатор 1 и обеспечивают его фиксацию от смещений при воздействии вращающихся с постоянной скоростью зачистных щеток 6 и 7, а также равномерное движение радиаторов. Щетки для зачистки 6 взаимодействуют с торцевыми (головными) частями радиаторов и имеют дискообразную форму. Щетки для зачистки 7 выполнены цилиндрической формы, имеют металлический ворс или ворс, выполненный из композитного материала с абразивом. Для зажима различных моделей радиаторов роликовыми механизмами, заявляемое устройство содержит механизмы регулировки, представленные маховиками 11 для перемещения несущих рам 12 и 13, а также рам, на которых размещены зачистные щетки 2,6 и 7. Электропривод зачистных щеток 2,6 и 7, и других движущихся частей осуществляется электродвигателями 10. Рольганг 3 части (А) выполнен как приводной рольганг, а части (В) выполнен как ведомый рольганг. Рольганг 3 для перемещения радиаторов снабжен собственным электроприводом. Электрическая часть представлена электромеханическим шкафом системы электропитания и управления. В процессе производства, при необходимости, допускается установка между частями (А) и (В) рабочего органа дополнительного оборудования, например ванны проверки на герметичность.Технический ...

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22-03-2022 дата публикации

Контейнер для пропарки очистных устройств трубопровода

Номер: RU0000209750U1

Полезная модель относится к области очистки объектов техники и предназначена для пропарки очистных устройств от продуктов поршневания магистральных конденсатопродуктопроводов. Контейнер для пропарки очистных устройств трубопровода включает установленный на опору корпус с крышкой, на внутренних боковых сторонах которого размещены узлы крепления очистного устройства, выполненные с возможностью обеспечения его вращательного движения. По длине контейнера смонтирован коллектор с соплами подачи пара. Причем узел крепления головной части очистного устройства состоит из планшайбы, вала с подшипниковым узлом и ручки прокрутки, а противоположный узел крепления включает прижимной шпиндель, маховик, рычаг блокировки вращения шпинделя, на котором смонтировано конусное фиксирующее устройство. В нижней части корпуса смонтирован патрубок. Техническим результатом является обеспечение безопасных условий выполнения работ с одновременным повышением производительности, исключения загрязнения окружающей среды, обеспечение простоты эксплуатации контейнера. 1 з.п. ф-лы, 1 ил. РОССИЙСКАЯ ФЕДЕРАЦИЯ (19) RU (11) (13) 209 750 U1 (51) МПК B08B 3/02 (2006.01) ФЕДЕРАЛЬНАЯ СЛУЖБА ПО ИНТЕЛЛЕКТУАЛЬНОЙ СОБСТВЕННОСТИ (12) ОПИСАНИЕ ПОЛЕЗНОЙ МОДЕЛИ К ПАТЕНТУ (52) СПК B08B 3/02 (2021.08) (21)(22) Заявка: 2021110818, 16.04.2021 (24) Дата начала отсчета срока действия патента: (73) Патентообладатель(и): Общество с ограниченной ответственностью «Газпром добыча Оренбург» (RU) Дата регистрации: 22.03.2022 (56) Список документов, цитированных в отчете о поиске: RU 173821 U1, 13.09.2017. RU 126268 U1, 27.03.2013. RU 2556113 C1, 10.07.2015. JP 2005040773 A, 17.02.2005. (45) Опубликовано: 22.03.2022 Бюл. № 9 2 0 9 7 5 0 R U (54) КОНТЕЙНЕР ДЛЯ ПРОПАРКИ ОЧИСТНЫХ УСТРОЙСТВ ТРУБОПРОВОДА (57) Реферат: Полезная модель относится к области очистки состоит из планшайбы, вала с подшипниковым объектов техники и предназначена для пропарки узлом и ручки прокрутки, а противоположный очистных устройств от продуктов поршневания ...

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26-01-2012 дата публикации

Idle down control for a pressure washer

Номер: US20120020809A1
Автор: Richard J. Gilpatrick
Принадлежит: Individual

A method of controlling the speed of an engine includes positioning a throttle at an operating position between an idle position that reduces the engine speed to an idle speed, and a normal speed position at which the engine runs at a speed greater than the idle speed, collecting a fluid within a manifold, sensing a pressure within the manifold, and adjusting the operating position of the throttle in response to the sensed pressure. When the sensed pressure is low, the throttle is moved toward the idle position and when the pressure is high, the throttle is moved toward the normal speed position. The method further includes positioning an unloader downstream of the manifold, the manifold configured in one of a first position in which the unloader directs fluid from the manifold to the pump, and a second position in which the unloader directs fluid to a point of use.

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01-03-2012 дата публикации

Appliance device with motors responsive to single-phase alternating current input

Номер: US20120048314A1
Принадлежит: Individual

An appliance for washing objects in which is employed a pump system for varying the spray velocity of washing fluid dispensed from spray jets affixed at an angle relative to a spray arm. In one embodiment, the pump system includes a pump having a pump motor such as a synchronous motor responsive to a variable frequency, single-phase alternating current input. The pump system also includes a pump motor control circuit configured to vary the frequency and voltage of the input, which in one example effectuates changes in the rotational speed of the pump motor in accordance with one or more operational cycles. The pump motor control circuit incorporates in one example a rectifier and an inverter that permits operation of the appliance when coupled to supply mains.

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22-03-2012 дата публикации

Optical connector cleaning tool

Номер: US20120066849A1
Автор: Kunihiko Fujiwara
Принадлежит: Fujikura Ltd

An optical connector cleaning tool which wipes to clean a joining end face of an optical connector by a feeding movement of a cleaning body. It includes a tool body which incorporates a feeding mechanism that supplies and takes up the cleaning body, and an insertion part which inserts into a connector housing hole of a positioning housing for connectors. The insertion part has a head member on which is formed a pressing face that presses the cleaning body against the joining end face within the connector housing hole, and is capable of moving in a direction of extension or contraction relative to the tool body. Movement of the tool body in an insertion direction relative to the insertion part in a state where the cleaning body is in contact with the joining end face causes the head member to axially rotate while the state of contact is maintained.

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22-03-2012 дата публикации

Cleanroom cleaning apparatus

Номер: US20120066850A1
Принадлежит: FOAMTEC INTERNATIONAL Co Ltd

A cleanroom cleaning device includes a multi-compartment container having two or more compartments and one or more breakable seals with at least one compartment containing a cleaning implement and at least another compartment containing a liquid capable of saturating the cleaning implement when the seals are broken. Another cleanroom cleaning device includes a nonbreakable/nonburstable outer pouch, a breakable/burstable inner pouch containing a liquid, and a cleaning implement where the inner pouch containing liquid and the cleaning implement are both contained within the outer pouch.

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17-05-2012 дата публикации

Method and device for cleaning substrates on a carrier

Номер: US20120118329A1
Автор: Reinhard Huber, Sven Worm
Принадлежит: Gebrueder Schmid GmbH and Co

In the case of a device and a method for cleaning substrates on a carrier, to the underside of which the substrates are fastened so as to be parallel to and slightly apart from one another, the carrier has in its interior a plurality of longitudinal channels, which run parallel to one another. As a result of the sawing of the wafers, they merge, via openings, into interstices between the substrates. As a result of a relative movement, an elongate tube, from which cleaning fluid is let out, is introduced into one of the longitudinal channels, the relative movement being achieved substantially through moving of the carrier.

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31-05-2012 дата публикации

Method and apparatus for wafer wet processing

Номер: US20120131815A1
Принадлежит: LAM RESEARCH AG

A gas dispenser in a process module for wet processing of wafer-shaped articles is substantially smaller than the article to be processed and is movable laterally of the article as it dispenses inert gas above the article.

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28-06-2012 дата публикации

Substrate processing device and method

Номер: US20120162618A1
Принадлежит: Lapis Semiconductor Co Ltd

A semiconductor processing device sprays a liquid chemical agent onto a film on a spinning semiconductor substrate. The spray nozzle is moved horizontally from a first upper position comparatively distant from the substrate to a second upper position closer to the substrate, then vertically downward to a lower position. All of these positions are higher than the substrate and none of them overlie the substrate. The spray nozzle is then moved horizontally to a spray position over the substrate and spraying begins. Any residual liquid chemical agent remaining at the outlet of the spray nozzle from the processing of a previous substrate drops off harmlessly at the end of the downward vertical motion instead of dropping onto the film on the substrate.

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18-10-2012 дата публикации

In-situ cleaning assembly

Номер: US20120260953A1
Принадлежит: Intermolecular Inc

A cleaning chamber is provided. The cleaning chamber includes a base portion housing a chuck and a lid affixed to the base portion. A support assembly is linked to the lid and the support assembly includes a top plate spaced apart from a bottom plate, the top plate has a plurality of openings defined therethrough and the bottom plate has a plurality of openings defined therethrough. The cleaning chamber includes a plurality of cups extending through corresponding pairs of the plurality of openings of the top plate and the bottom plate. The plurality of cups is configured to seal against a surface of a substrate, wherein each cup of the plurality of cups is independently supported by the bottom plate.

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13-12-2012 дата публикации

Tray cleaning aparatus for electronic components

Номер: US20120312765A1
Принадлежит: Chipbond Technology Corp

A tray cleaning apparatus having a top plate, a bottom plate, a first bearing plate assembly and a second bearing plate assembly. The first bearing plate assembly disposed between top plate and bottom plate comprises a first supporting plate, plural first blocks and plural second blocks, the first supporting plate comprises an inner surface having a first disposing area and a second disposing area. The first blocks are disposed at the first disposing area and the second blocks are disposed at the second disposing area. The second bearing plate assembly disposed between top plate and bottom plate comprises a second supporting plate, plural third blocks and plural fourth blocks, the second supporting plate comprises an outer surface having a third disposing area and a fourth disposing area. The third blocks are disposed at the third disposing area and the fourth blocks are disposed at the fourth disposing area.

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17-01-2013 дата публикации

Method for cleaning surfaces, in particular glass panes

Номер: US20130014783A1
Автор: Claus Wandres
Принадлежит: Wandres Brush Hitec GmbH

A method for cleaning glass surfaces, wherein the glass surface is transported relative to a cleaning device and the cleaning device moves a first, dampened microfiber cleaning face over the glass surface and a second microfiber cleaning face located downstream in the movement direction of the glass surface is moved over the glass surface.

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31-01-2013 дата публикации

No-Contact Wet Processing Tool with Fluid Barrier

Номер: US20130025688A1
Автор: Aaron Francis, Glen Egami
Принадлежит: Intermolecular Inc

Embodiments of the present invention describe substrate processing tools and methods. The substrate processing tool includes a housing defining a chamber and a substrate support coupled to the housing and configured to support a substrate within the chamber. The substrate has an upper surface with a first portion and a second portion surrounding the first portion. An isolation unit including a body is coupled to the housing and positioned within the chamber above and spaced apart from the first portion of the upper surface of the substrate. The body includes at least one outlet on a lower surface thereof, which is in fluid communication with at least one fluid pump. The at least one fluid pump is configured to drive fluid through the at least one of outlet to form a barrier around the first portion of the upper surface of the substrate.

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14-03-2013 дата публикации

Method for cleaning wafer after chemical mechanical planarization

Номер: US20130061884A1
Автор: Chao Zhao, Junfeng Li, Tao Yang
Принадлежит: Institute of Microelectronics of CAS

A method for cleaning wafer after chemical mechanical planarization that includes placing the wafer in the wafer holder and rotating the wafer holder and the wafer simultaneously, cleaning with chemicals by providing the wafer surface with chemical detergent through the detergent supply cantilever that keeps a certain distance away from the wafer surface, cleaning with deionized water by providing the wafer surface with deionized water through the detergent supply cantilever to remove the chemical detergent and cleaning products. The method also includes the second clean for better cleaning effect and drying the wafer out. According to the wafer cleaning method, the non-contact detergent and deionized water supply cantilever used for wafer cleaning reduces or eliminates the possible problems in making macro scratches on wafer surface in the scrubbing process and increases the yield for wafer devices.

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28-03-2013 дата публикации

HIGH-PRESSURE CLEANING APPLIANCE

Номер: US20130074883A1
Принадлежит: Alfred Kaercher GmbH & Co. KG

The invention relates to a high-pressure cleaning appliance comprising a first functional device required for operation in the form of a heatable heat exchanger for heating a liquid that is dischargeable from the high pressure cleaning appliance, and at least one further, second functional device required for operation which is arranged below the heat exchanger. In order to develop such a high-pressure cleaning appliance such that it is more user friendly to maintain, the invention proposes that the high-pressure cleaning appliance comprise a first appliance unit having a carrying device on which the heat exchanger is held, and a second appliance unit having a support device on which the at least one second functional device is held, and that the carrying device be releasably connectable to the support device in a force-locked and/or positively-locked manner. 1. High-pressure cleaning appliance comprising a first functional device required for operation in the form of a heatable heat exchanger for heating a liquid that is dischargeable from the high pressure cleaning appliance , and at least one further , second functional device required for operation which is arranged below the heat exchanger , wherein the high-pressure cleaning appliance comprises a first appliance unit having a carrying device on which the heat exchanger is held , and a second appliance unit having a support device on which the at least one second functional device is held , and wherein the carrying device is releasably connectable to the support device in at least one of a force-locked and positively-locked manner.2. High-pressure cleaning appliance in accordance with claim 1 , wherein the at least one second functional device is configured as at least one of a pump set for increasing the liquid pressure claim 1 , and a motor for the pump set claim 1 , and claim 1 , where applicable claim 1 , as a fan for generating a flow of air cooling the motor claim 1 , and a blower wheel for generating a ...

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04-04-2013 дата публикации

Portable Pressure Washer System

Номер: US20130082118A1
Автор: Christine Stepflug
Принадлежит: Individual

A portable pressure washer comprising: a tank, where the tank stores water used in conjunction with the pressure washer; a hose, where the hose is connected the tank at a connection end provides the transfer of pressurized water from the tank; a nozzle, where the nozzle attaches to a emission end of the hose; and a convertible power supply, where the power supply provides at least two forms of a power source. The power supply may include a cord and a connector. In one particular embodiment, the connector is an AC/DC converter. The power supply may also include a battery pack.

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18-04-2013 дата публикации

Pressure spray washer and control

Номер: US20130092745A1
Автор: Brian G. Karp
Принадлежит: Champion Power Equipment Inc

A method and apparatus is provided for starting and stopping a high pressure spray washer having a combustion engine driving a pump to provide high pressure fluid to a spray gun activated by a trigger. Pulling the trigger causes water to flow through the nozzle and pump and a sensor by the pump sends a flow start signal to a control module that activates an electric starter when an engine switch is turned on, thus starting the engine when it wasn't running. When the trigger is released flow to the pump stops and the sensor sends a flow stop signal to the control module. If a predetermined time passes before the sensor detects fluid flow to the pump as occurs when the trigger is pulled, then the engine is shut off. The time can be varied to adjust the time between releasing the trigger and shutting off the engine.

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18-04-2013 дата публикации

Fish and Game Washer

Номер: US20130093107A1
Автор: Funderburg Roland
Принадлежит:

It is designed to wash and clean meat. When meat is put in a 5 gallon bucket and water source connected and turned on. Air is sucked in to mix with water. This makes the meat float up from the bottom and begin to toss and tumble, which takes loose scales, feathers, blood and debris over the top of bucket. This leaves the meat clean in 5 to 15 minutes, depending on the load. Therefore you don't have to mess up kitchen sink. It is good for washing other things, including fruits in vegetables. 1. It will wash fish and game more effectively and faster.2. It can be used as a power washer , with or without soap.3. It may also be used as an aerator to keep fish alive.4. It can be used to wash other things like vegetables. Washes and cleans fish and game.When meat is put in bucket, the air bubbles making the meat toss and tumble and swirl in water.My invention takes the loose feathers off of game birds (dove, quail, etc.) and loose hair of off squirrels and rabbits. Removes loose scales off of fish. Also removes some grease plus debris and blood in five to fifteen minutes.Yes, have never seen one.Please refer to the drawings at the end of this example for a key to the reference numbers.It is designed to force water through nozzle. Water/air nozzle can be made up of plastic, iron, brass, aluminum, stainless steel. I am using plastic ½ inch with Number (connector) being a ¾ inch female screwed through a Number (5 gallon bucket or container) with ¾ inch hole in it. With Number (gasket) Number (45 degree connector) ¾ inch male screwed on to Number (connector) ¾ inch female. The length of this is 7 inches long, could be made shorter, longer or of different sizes.It can be made of plastic, stainless steel, brass, nylon. It can be made permanent or changeable. I am using 13/64 inch in first jet and second jet ⅜ inch, could be used bigger smaller.1jet Number (jet and nozzle) is 13/64 inch to reduce jet water flow for Number (fish and game washer). Nozzle Number (air sucking device) ...

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18-04-2013 дата публикации

Gas barrier with vent ring for protecting a surface region from liquid

Номер: US20130095667A1
Автор: Rajesh Kelekar
Принадлежит: Intermolecular Inc

A protective chuck is disposed on a substrate with a gas bearing layer between the bottom surface of the protective chuck and the substrate surface. The gas bearing layer protects a surface region against a fluid layer covering the substrate surface. The protection of the gas bearing is a non-contact protection, reducing or eliminating potential damage to the substrate surface due to friction. The gas bearing can enable combinatorial processing of a substrate, providing multiple isolated processing regions on a single substrate with different material and processing conditions.

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25-04-2013 дата публикации

Insert for a Microbial Scrubbing Device

Номер: US20130098398A1
Принадлежит: C. R. BARD, INC.

The microbial scrub brush in one embodiment employs an insert that is impregnated with an anti-bacterial disinfectant and that is housed within a housing of alcohol-compatible material and sealed over by a removable lid. The insert is maintained in sterile condition until ready for use. After removal of the lid, the insert is moved over the end of a female luer or other portion of a medical device and rotated in order to clean the exterior surface as well as the interior luminal surface of the device. In one embodiment, the insert includes a base from which extends an outer wall that defines a chamber. A plurality of complaint fingers extend from the base into the chamber. A plurality of wipers extend radially inward from the outer wall into the chamber to enable the cleansing of both the exterior surface and an interior surface of the medical device. 1. A scrubbing device for cleansing a portion of a medical device , comprising:a holder defining a cavity including an open end for receiving the portion of the medical device into the cavity;a cleansing insert fully disposed in the cavity including a plurality of resilient fingers configured to engage the portion of the medical device; anda cleansing substance carried by the fingers for cleansing both an exterior surface and an interior surface of the portion of the medical device when the portion of the medical device is received in the cavity and the fingers are moved relative thereto.2. The scrubbing device according to claim 1 , wherein the cleansing insert includes a base portion from which the fingers extend.3. The scrubbing device according to claim 1 , wherein the fingers are defined by a plurality of cross-cut slits in a block of resilient material.4. The scrubbing device according to claim 1 , wherein the fingers are generally aligned with one another and wherein the fingers include at least one of a hydrophilic polyurethane and a polyethylene foam.5. The scrubbing device according to claim 1 , wherein the ...

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02-05-2013 дата публикации

Substrate treating apparatus and chemical recycling method

Номер: US20130104943A1
Принадлежит: Semes Co Ltd

Provided is a substrate treating apparatus. The substrate treating apparatus according to embodiments of the present invention may include a cleaning chamber cleaning foreign objects on a substrate, and a recycling unit recycling by recovering a mixed solution including a first chemical and a second chemical used in cleaning of the substrate, wherein the recycling unit includes a separation unit separating the mixed solution recovered from the cleaning chamber, a recovery line connecting the separation unit and the cleaning chamber and allowing the mixed solution to flow into the separation unit, a decompression line having one end connected to the separation unit and exhausting the mixed solution evaporated from the separation unit, and a decompression unit installed in the decompression line and reducing pressure in the separation unit.

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08-08-2013 дата публикации

UNIT OF WASHING FOR MACHINE OF CLEANING OF OPHTHALMIC GLASSES OR OTHER SUBSTRATES

Номер: US20130199584A1
Автор: Gehrig Denis, Gehrig Jean

A washing unit for machines that clean ophthalmic glass () or other substrates, it includes, on one hand, two washing lines (), each able to issue a high-pressure jet of washing liquid in a flared shape of a width substantially equal to or greater than the diameter of the glass to be cleaned, said lines () being parallel and mounted opposite each other on each side of the glass () to be cleaned so that the two streams of liquid () are located at the same level and come into contact on the concave () and convex () surfaces respectively of said glass (); and, on the other hand, supports () intended to hold the glass () in a stable position during the washing operation and the means () to allow movement of said lines () or the glass () in order to perform simultaneous bathing of the concave () and convex () surfaces of the glass by the respective strains of washing liquid (). 1. A washing unit for machines that clean ophthalmic glass (l) or other substrates is characterized by:{'b': 22', '23', '3', '30', '22', '23', '1', '30', '10', '11', '1, '(a) two washing lines (, ), each line comprising a plurality of linearly aligned sprayers (), each line able to issue a high-pressure jet of overlapping washing liquid sprays () in a flared shape having a width substantially equal to great r than the diameter of the glass to be clear said lines (, ) being parallel and mounted opposite each other care on each side of the glass () to he cleaned such that the two streams of liquid () are located at the same level and come into contact on the concave () and convex () surfaces, respectively, of said glass (),'}{'b': '4', '(b) supports () for holding the glass in a stable position during the washing operation, the glass being maintained horizontally in a fixed washing position between the two lines;'}{'b': 2', '22', '23', '1', '10', '11', '1', '30, '(c) means (′) for allowing movement of said lines (, ) or the glass () in order to perform simultaneous bathing of the concave () and the ...

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15-08-2013 дата публикации

MOBILE CLEANING DEVICE FOR SOLAR PANELS

Номер: US20130206173A1
Автор: Zijlstra Jelle
Принадлежит:

The invention concerns a mobile cleaning device suitable for displacing along and cleaning a series of adjacent tilted solar panels aligned in a row and requiring therefor no superstructure fixed to the row of solar panels. The device includes a supporting frame defining a cleaning plane, on which are mounted a cleaning device suitable for cleaning a surface parallel to the cleaning plane, a support device for maintaining the supporting frame substantially parallel to the surface to be cleaned during the displacement of the cleaning device along a row of solar panels; and a guiding device for guiding the displacement of the cleaning device along a row of solar panels. The guiding device includes at least two, preferably at least three, separate guiding wheels, which are aligned along a straight line parallel to the cleaning plane and adjacent to a first edge of the frame. Each guiding wheel is mounted such as to rotate about an axis substantially normal to the cleaning plane and suitable for resting and rolling on the upper edge of the aligned solar panels with the cleaning device in cleaning contact with the surface to be cleaned. 2. The cleaning device according to claim 1 , wherein the outer edge of the guiding wheels is profiled to match the geometry of the upper edge of a solar panel.3. The cleaning device according to claim 2 , wherein the cleaning device comprises at least one brush or cloth which is motorized to rotate about an axis normal or parallel to the cleaning plane claim 2 , preferably to rotate about an axis parallel to the cleaning plane and transverse claim 2 , more preferably normal claim 2 , to the straight line formed by the guiding wheels claim 2 , wherein the cleaning device preferably extends over the whole length of the frame such as to span over the whole height of at least one solar panel claim 2 , and more preferably the cleaning device further comprises at least one squeegee.4. The cleaning device according to claim 3 , further ...

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29-08-2013 дата публикации

WATER AND DEBRIS RECOVERY SYSTEM

Номер: US20130220387A1
Автор: Crocker James
Принадлежит:

The present system relates to a water and debris recovery system for a water blasting device or water demolition system suitable for mounting upon the frame of a mobile vehicle for easy transport and use. The system includes a liquid reservoir connected to a high pressure fluid pump for directing ultra-high pressure water through a blast head to remove the coatings or markings from a surface. The blast head includes a shroud which surrounds the blasting area to at least partially contain the water and debris dislodged from the surface. A vacuum pump is secured to the shroud with the vacuum passing through a cyclone type separator allowing the water and debris to settle to the bottom portion of the cyclone. A mud type pump is then utilized to transfer the collected water and debris into an open top tank. 1. A water and debris recovery system comprising:a blast head having at least nozzle therein, said nozzle constructed and arranged to direct high pressure fluid against a surface for impingement thereon, said blast head having a shroud at least partially surrounding said at least one nozzle for substantially containing said high pressure fluid after said impingement,a vacuum system constructed and arranged to provide a negative pressure air flow through said shroud sufficient to draw said fluid into a tubular member, said tubular member fluidly connected to a separator, said separator being constructed and arranged to separate said air flow and said fluid,a mud pump assembly, said mud pump assembly including a reciprocating member for drawing said separated fluid from said separator during movement in a first direction, said fluid directed to an open topped tank during movement of said reciprocating member in a second direction, anda tank for containing said separated fluid.2. The water and debris recovery system of wherein said vacuum system includes a roots type blower for creating said negative air flow.3. The water and debris recovery system of wherein said ...

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12-09-2013 дата публикации

INDUSTRIAL CLEANING SYSTEM

Номер: US20130233359A1
Автор: Meissner Golo
Принадлежит:

The invention relates to an apparatus for an industrial cleaning plant for the treatment of items to be cleaned “G” in cleaning chambers (), and a transport device () that can be driven, rotated or pivoted for loading and unloading, whereby the transport device () has a lifting device ()* with a gripping tool ()** for the items to be cleaned “G”, with which a vertical transport lift can be carried out into the cleaning chamber (). The cleaning chambers () can be closed with a cover (). The object of the invention consists of achieving an improvement of the adjustment of the items to be cleaned “G” in the cleaning chamber (). The object is achieved in that the cover () is held moveably in a guide () parallel to a lifting arm (), in an aperture () along the shaft () of this lifting arm () of the lifting device (), in that an entrainment mechanism () is provided, which forms a stop for the cover () in upward movement of the lifting arm () for opening the cleaning chamber (), and for closing the cleaning chamber () in downward movement of the lifting arm (), the cover () is placed on the cleaning chamber (), whereby in closed position of the cover (), an up-or-down movement of the gripping tool () in the cleaning chamber () can be controlled with the lifting arm (). *sic; lifting device ()?—Translator's note.**sic; gripping tool ()?—Translator's note. 1. An industrial cleaning plant having one or more cleaning chambers and a transport device that can be driven , rotated or pivoted for loading or unloading , whereby the transport device has a lifting device with a gripping tool for items to be cleaned “G” , with which a transport lift is produced into the cleaning chamber and the gripping tool is guided through openings of the cleaning chambers , which can be closed by a cover , whereby the lifting device and the cover form one structural unit , is hereby characterized in that the cover is held moveably in a guide in an aperture along the shaft of a lifting arm of the ...

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03-10-2013 дата публикации

DEVELOPMENT OF EXTENSIONAL VISCOSITY FOR REDUCED ATOMIZATION FOR DILUTED CONCENTRATE SPRAYER APPLICATIONS

Номер: US20130255729A1
Принадлежит: ECOLAB USA INC.

A non-Newtonian concentrate composition includes a sensitizer or irritant, a surfactant, an anti-mist component and optionally a stability component. Example sensitizers and irritants include, but are not limited to, acids, quaternary compounds, and amines, and example anti-mist components include, but are not limited to, polyethylene oxide and polyacrylamide. 1. A non-Newtonian aqueous concentrate composition comprising:at least one acid;at least one surfactant; andat least one anti-mist component selected from the group consisting of polyethylene oxide, polyacrylamide and polyacrylate, wherein the composition is a non-Newtonian having a viscosity of less than about 40 centipoise.2. The non-Newtonian aqueous concentrate composition of claim 1 , wherein the polyethylene oxide has a molecular weight between about 3 claim 1 ,000 claim 1 ,000 and about 7 claim 1 ,000 claim 1 ,000.3. The non-Newtonian aqueous concentrate composition of claim 1 , further comprising at least one stability component selected from the group consisting of antioxidants claim 1 , chelants claim 1 , and solvents.4. The non-Newtonian aqueous concentrate composition of claim 3 , wherein the solvent is selected from the group consisting of propylene glycol and glycerine.5. The non-Newtonian aqueous concentrate composition of claim 1 , further comprising at least two stability components selected from the group consisting of antioxidants claim 1 , chelants claim 1 , and solvents.6. The non-Newtonian aqueous concentrate composition of claim 1 , wherein the acid includes at least one of phosphoric acid claim 1 , citric acid claim 1 , lactic acid claim 1 , and methane sulfonic acid.7. The non-Newtonian aqueous concentrate composition of claim 1 , wherein the concentrate composition has a pH of 4.5 or lower.8. The non-Newtonian aqueous concentrate composition of claim 1 , further comprising water claim 1 , and wherein water constitutes between about 45% and about 75% by weight of the aqueous ...

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10-10-2013 дата публикации

MOTOR PUMP UNIT FOR A HIGH-PRESSURE CLEANING APPLIANCE, AND HIGH-PRESSURE CLEANING APPLIANCE

Номер: US20130263899A1
Принадлежит:

A motor pump unit for a high-pressure cleaning appliance is provided, in which the cleaning liquid conveyed by the pump assembly is used for cooling the motor, comprising a motor housing which surrounds the motor, and a cooling channel which surrounds the motor and through which the cleaning liquid can flow for heat dissipation. To provide a motor pump unit having a level of electrical safety which is higher than that of a conventional motor pump unit, the cooling channel surround the motor housing, and the motor pump unit comprise at least one thermally conductive spacer element by way of which the cooling channel is spaced from the motor housing. A high-pressure cleaning appliance is also provided. 1. A motor pump unit for a high-pressure cleaning appliance , the motor pump unit comprising a motor and a pump driven by the motor , in which motor pump unit the cleaning liquid conveyed by the pump assembly is used for cooling the motor , comprising a motor housing which surrounds the motor , and a cooling channel which surrounds the motor and through which the cleaning liquid flows for heat dissipation , the cooling channel surrounding the motor housing , and the motor pump unit comprising at least one thermally conductive spacer element by way of which the cooling channel is spaced from the motor housing.2. The motor pump unit in accordance with claim 1 , wherein the interspace formed between the motor housing and the cooling channel and bridged by the at least one spacer element is filled with gas.3. The motor pump unit in accordance with claim 1 , wherein the at least one spacer element is formed in one piece with the motor housing.4. The motor pump unit in accordance with claim 3 , wherein the at least one spacer element together with the motor housing is made of aluminum or an aluminum alloy.5. The motor pump unit in accordance with claim 3 , wherein the at least one spacer element together with the motor housing is produced as a die-cast part.6. The motor pump ...

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17-10-2013 дата публикации

PROCESS FOR CLEANING A TRANSPORT BELT FOR MANUFACTURING A PAPER WEB

Номер: US20130269734A1
Принадлежит: GEORGIA-PACIFIC CONSUMER PRODUCTS LP

The disclosure relates to a continuous cleaning method for cleaning a moving fabric in a paper machine. The method uses one or more cleaning stages. In one embodiment, one cleaning stage applies steam to heat and soften contaminants on the fabric followed by the application of water, preferably superheated water, to remove the contaminants. Another cleaning stage may apply hot water, steam and/or superheated water via an encapsulated shower and evacuation chamber making it possible to clean the width of the fabric without substantial rewet. 1. A method for continuous cleaning of a papermaking fabric comprising:subjecting a fabric to be cleaned to an initial cleaning stage, wherein the initial cleaning stage includes the application of either steam or the application of water at a temperature of greater than 80° C. from an initial cleaning shower;subjecting the fabric to be cleaned to a second cleaning stage, wherein the second cleaning stage includes a second cleaning shower that spans the width of the fabric to be cleaned;wherein the paper machine production is not interrupted during cleaning.2. The method of claim 1 , wherein the water in the initial shower is superheated water.3. The method of claim 2 , wherein the superheated water is applied to a surface of the fabric after the application of steam.4. The method of claim 1 , wherein the initial cleaning shower is a traversing cleaning shower.5. The method of claim 1 , further comprising claim 1 , applying an air stream from an air knife to the fabric surface after the initial cleaning stage.6. The method of claim 1 , wherein the second cleaning shower is an encapsulated cleaning shower.7. The method of claim 1 , wherein superheated water is applied during the second cleaning stage.8. The method of claim 1 , wherein both steam and water are applied during the initial cleaning stage.9. The method of claim 1 , wherein steam is applied during the second cleaning stage.10. The method of claim 1 , wherein both steam ...

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24-10-2013 дата публикации

HYDRODYNAMIC MULTIPURPOSE WASHING DEVICE INCLUDING DETERGENT

Номер: US20130276839A1
Автор: Yoo Wan Ki
Принадлежит:

The present invention relates to a hydrodynamic multipurpose washing device including a detergent, wherein the spray pressure is increased by even a small flux to maximize cleaning power using only the hydraulic pressure of tap water without a separate pressurization device such as a pressure pump, a detergent is combined and is diluted with water to be sprayed to facilitate the washing of an oil components and protein components which are difficult to be washed off with pure water, and a brush for removing solidified foreign matter and reducing washing time is provided to facilitate washing selections according to a need. 1. A hydrodynamic multipurpose washing device comprising a detergent , mounted in an end portion of a water valve and for adjusting and ejecting a detergent ejection amount and a water amount in a high pressure while increasing an ejection pressure and reducing a water amount area flowing through a water pressure of water discharged from a water tap , the hydrodynamic multipurpose washing device comprising:{'b': '10', 'an I-shape body ;'}{'b': '20', 'an ejecting nozzle positioned at a head portion of the body to perform bubble washing and rinse washing of a washing object by ejecting a detergent and water in a high pressure through an internal orifice pipe;'}{'b': '30', 'a flow channel pipe positioned at the rear end of the ejection nozzle to integrally connect between the ejection nozzle and a water pressure adjusting unit and for supplying a detergent and water toward the ejection nozzle;'}{'b': '40', 'the water pressure adjusting unit positioned at the rear end of the flow channel pipe to adjust an amount of water in order to inject water together with the detergent into the ejection nozzle by adjusting a water pressure of water discharged from the water tap; and'}{'b': '50', 'a water supply valve connected to the rear end of the water pressure adjusting unit and the end portion of the water valve to supply water discharged from the water tap ...

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07-11-2013 дата публикации

SURFACE CLEANING SYSTEM AND METHOD

Номер: US20130291323A1
Принадлежит:

A surface cleaning system includes a retainer having a non-absorbing retaining surface and a surface cleaning compound retained at the retaining surface of the retainer and formed a cleaning surface overlapped thereat. The surface cleaning compound is a polymer having high density and high adhesive ability for removing imbedded contaminants from a working surface and grabbing the contaminants therefrom. The retainer is made of non-absorbing material that prevents lubricant and the surface cleaning compound being absorbed through the retainer. 1. A surface cleaning system , the system comprising an applicator and a surface cleaning compound provided thereon forming a cleaning surface , wherein said surface cleaning compound comprises a colloidal element , resin , an abrasive element , a stabilizer , a binding element , and a solvent to form a polymer having high density and high adhesive ability for removing imbedded contaminants from a working surface , wherein said solvent is water.2. The surface cleaning system of wherein the colloidal element claim 1 , the resin claim 1 , and the abrasive element are generally present in a weight ratio of about 25-60 wt % : about 10-20 wt % : about 15-30 wt %.3. The surface cleaning system of wherein said colloidal element of said surface cleaning compound is a colloid material selected from the group consisting of silicone gel claim 2 , white glue claim 2 , hot melt adhesive claim 2 , and rubber.43. The surface cleaning system of clam wherein said abrasive element of said surface cleaning compound is in powdered form and is selected from the group consisting of calcium carbonate claim 2 , iron oxide claim 2 , alumina claim 2 , silicon carbide claim 2 , quartz claim 2 , and carbon powders.5. The surface cleaning system of wherein a grain size of said abrasive element is less than 0.1 mm.6. The surface cleaning system of wherein said stabilizer of said surface cleaning compound is a material with high heat capacity and is selected ...

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21-11-2013 дата публикации

Jewelry washing machine and method

Номер: US20130306111A1
Автор: Bryan K. MYERS
Принадлежит: SHADE SAVER Inc

A machine is presented for the cleaning of jewelry. The machine allows the manual or automatic cleaning of jewelry. Under both modes of operation, the jewelry is secured by a user to a support bracket inside a transparent, water-tight cylindrical wash chamber. When in manual mode, the user can direct the spray of wash fluid onto the jewelry by rotating the jewelry using a trackball. When used in automatic mode, the machine washes the jewelry during a preset washing cycle. For both modes, the washing cycle is followed by the drying cycle where a blower directs air onto the jewelry for a set time period to blow off excess moisture. The drying cycle concludes with a blower venting the cylindrical wash chamber to remove residual moisture from the wash chamber and the jewelry. After the cleaning, the user removes the jewelry from the machine.

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21-11-2013 дата публикации

CLEANING APPARATUS AND METHOD

Номер: US20130306113A1
Принадлежит: Carts & Parts, Inc.

An apparatus and method for cleaning a surface comprising a gas dispensing conduit having a first end connectable to a source of pressurized gas and an open second end such that a stream of pressurized gas may be dispensed from the open second end of the gas dispensing conduit. A liquid dispensing conduit is connectable to a source of liquid and associated with the gas dispensing conduit in such a way that liquid is introduced into the stream of pressurized gas wherein the liquid dispensing conduit allows liquid to be introduced into the stream of pressurized gas at a rate that causes the liquid to contact the surface to be cleaned while substantially preventing the liquid from running off the surface. 1. An apparatus for cleaning a surface , comprising:a gas dispensing conduit having a first end connectable to a source of pressurized gas and an open second end such that a stream of pressurized gas may be dispensed from the open second end of the gas dispensing conduit; anda liquid dispensing conduit having a first end and a second end, the first end connectable to a source of liquid and the second end associated with the gas dispensing conduit in such a way that liquid is introduced into the stream of pressurized gas,wherein the liquid dispensing conduit allows liquid to be introduced into the stream of pressurized gas at a rate that causes the liquid to contact the surface to be cleaned while substantially preventing the liquid from running off the surface.2. The apparatus of claim 1 , wherein the liquid dispensing conduit is configured to introduce liquid into the stream of pressurized gas at a liquid-to-gas ratio in a range from about 0.5 ml to about 2 ml per one cubic foot of pressurized gas when the stream of pressurized gas is dispensed from the open second end of the gas dispensing conduit at a pressure in a range from about 80 psi to about 150 psi and at a flow rate in a range from about 125 cfm to about 400 cfm.3. The apparatus of claim 3 , wherein the ...

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05-12-2013 дата публикации

Apparatus and method for cleaning substrate

Номер: US20130319457A1
Принадлежит: Semes Co Ltd

Provided are an apparatus and a method of cleaning a substrate. The apparatus includes a substrate supporting unit supporting a substrate, a container surrounding the substrate supporting unit and collecting an organic solvent scattered from the substrate, and a fluid supplying unit provided on one side of the container and spraying a liquid organic solvent with bubbles to the substrate. The fluid supplying unit includes a nozzle head ejecting the organic solvent to the substrate, an organic solvent supplying line supplying the organic solvent from an organic solvent storage tank to the nozzle head, and a bubble providing element provided on the organic solvent supplying line and providing bubbles to the liquid organic solvent.

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19-12-2013 дата публикации

NOZZLE APPARATUS AND CLEANING APPARATUS HAVING SUCH NOZZLE APPARATUS

Номер: US20130333732A1
Автор: Käske Egon
Принадлежит: Dürr Ecoclean GmbH

Nozzle apparatus and cleaning apparatus having such nozzle apparatus are disclosed. An example method for flood-washing a workpiece in a cleaning container includes providing of a cleaning container in which the workpiece is arranged and simultaneously impacting the workpiece using a first fluid stream and a second fluid stream. The first fluid stream being directed from a first nozzle chamber of a nozzle apparatus having a slit-shaped nozzle opening. The first fluid stream includes a liquid cleaning medium. The second fluid stream being directed from a second nozzle chamber of the nozzle apparatus. The second nozzle chamber fluidly coupled with the first nozzle chamber. The second fluid stream includes a liquid cleaning medium. The second fluid stream includes a jet direction which is warped at an acute angle or substantially perpendicular relative to the jet direction of the first fluid stream. 1. A nozzle apparatus for the generation of at least one fluid stream having a high flow velocity and a large mass flow rate , the nozzle apparatus comprising:a body having a nozzle chamber comprising a nozzle opening for generating a fluid stream,wherein the body is rotatably mounted on a unit and is movable about a rotation axis, wherein the nozzle opening comprises a wall and a slit-shaped nozzle mouth extending along a slit axis, andwherein the nozzle chamber opens into an opening slot formed in the wall of the body between the nozzle mouth and the nozzle chamber, the fluid being fed to the opening slot through the opening in the hollow body via a stream path directed by wall sections of the nozzle chamber to the opening slot, wherein the wall sections are located opposite the opening.2. The nozzle apparatus of claim 1 , wherein the nozzle chamber comprises a section having a trough-shaped cross section that is substantially perpendicular to the slit axis and opens into the opening slot.3. The nozzle apparatus of claim 1 , wherein the nozzle chamber comprises a ...

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19-12-2013 дата публикации

METHOD FOR PRODUCING CHEMICALLY STRENGTHENED GLASS SUBSTRATE FOR DISPLAY DEVICE

Номер: US20130338051A1
Принадлежит: Asahi Glass Company, Limited

The present invention provides a method for producing a chemically strengthened glass for a display device, which is capable of suppressing generation of concave defects. The present invention relates to a method for producing a chemically strengthened glass substrate for a display device, in which a calcium concentration in a cleaning liquid used in a final cleaning step before a chemical strengthening step is 5 ppm or less. 1. A method for producing a chemically strengthened glass substrate for a display device , wherein a calcium concentration in a cleaning liquid used in a final cleaning step before a chemical strengthening step is 5 ppm or less.2. The method for producing a chemically strengthened glass substrate for a display device according to claim 1 , wherein the cleaning liquid is water. The present invention relates to a method for producing a chemically strengthened glass substrate for a display device.A glass chemically strengthened by ion exchange or the like (hereinafter referred to as a “chemically strengthened glass”) is used in a cover glass of a display devices such as digital camera, mobile phone and PDA, and a glass substrate of a touch panel display. The chemically strengthened glass has high mechanical strength as compared with an unstrengthened glass, and is therefore suitable for those uses (Patent Documents 1 to 3).The cover glass of a display device and the like and the glass substrate of a touch panel display are required to have high transparency, high smoothness and good appearance.However, when a chemically strengthened glass substrate is used in a display device, a problem occurs in appearance in some cases. As a result of analyzing the glass substrate where the problem occurred in appearance by the present inventors, it has been found that very small concave defects (hereinafter referred to as “concave defects”) are generated on the surface of the glass substrate.Accordingly, the present invention aims at providing a method for ...

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26-12-2013 дата публикации

HIGH-PRESSURE CLEANING APPLIANCE

Номер: US20130340845A1
Принадлежит: Alfred Karcher GmbH & Co. KG

A high-pressure cleaning appliance is provided, including a heatable heat exchanger for heating a fluid that can be dispensed by the high-pressure cleaning appliance, a motor having a drive shaft that defines a drive axis, a pump unit, a fan for generating a combustion air stream and having a fan housing, and a fuel pump. The high-pressure cleaning appliance includes a first securing device having at least one securing element and a securing element receptacle integrally formed on the fan housing and associated with the at least one securing element, and the first securing device can be transferred from an unsecured position, in which the fuel pump can be coupled to the drive shaft and released from it, to a secured position by inserting the at least one securing element into the securing element receptacle to prevent the fuel pump from being released from the drive shaft. 1. A high-pressure cleaning appliance , comprising a heatable heat exchanger for heating a fluid to be dispensed by the high-pressure cleaning appliance , a motor having a drive shaft that defines a drive axis , a pump unit for increasing the fluid pressure , a fan for generating a combustion air stream and having a fan housing , and a fuel pump for delivering a fuel for the heat exchanger , the pump unit , the fan and the fuel pump being located along the drive axis and being drivable by the drive shaft , and the high-pressure cleaning appliance comprising at least one securing device for securing the fuel pump on the fan housing on its side facing away from the motor , wherein the high-pressure cleaning appliance comprises a first securing device having at least one securing element and a securing element receptacle integrally formed on the fan housing and associated with the at least one securing element , and wherein the first securing device is transferable from an unsecured position , in which the fuel pump is coupleable to the drive shaft and releasable from it , to a secured position in ...

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09-01-2014 дата публикации

METHOD OF STRIPPING PHOTORESIST ON A SINGLE SUBSTRATE SYSTEM

Номер: US20140007902A1
Автор: BROWN IAN J
Принадлежит: TOKYO ELECTRON LIMITED

Provided is a method and system for stripping an ion implanted resist or performing a post-ash clean using a single substrate tool. Cleaning objectives and cleaning operating variables are selected for optimization. The first step immerses the substrate in a first treatment chemical, while concurrently irradiating the substrate with UV light, the process completed in a first process time, a first flow rate, and a first rotation speed of the substrate. The second step dispenses onto the substrate a second treatment chemical at a second temperature and a second composition, the second treatment chemical dispensed at a dispense temperature, and completed in a second process time and a second rotation speed. The two or more selected cleaning operating variables comprise UV wavelength, UV power, first concentration, first rotation speed, first flow rate, second process time, second rotation speed, percentage of residue removal, and dispense temperature. 1. A method for stripping a resist layer on a substrate using a resist stripping system , the comprising a processing chamber and a treatment delivery system , the treatment delivery system comprising a first delivery device and a second delivery device , the method comprising:providing a substrate in the resist stripping system, the substrate having an ion implanted resist layer;selecting two or more resist stripping objectives;selecting two or more resist stripping operating variables to be optimized for achieving the two or more resist stripping objectives;immersing the substrate in a treatment liquid comprising a first treatment chemical, the first treatment chemical at a first temperature, a first flow rate, and a first composition, the immersing performed with the first delivery device and concurrently irradiating a portion of a surface of the substrate with ultra-violet (UV) light, the UV light having a wavelength and having a UV power, the irradiating operationally configured to be completed in a first process ...

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16-01-2014 дата публикации

Method and System for Uniformly Applying a Multi-Phase Cleaning Solution to a Substrate

Номер: US20140014146A1
Принадлежит: LAM RESEARCH CORPORATION

A system for cleaning a substrate includes a carrier and a cleaning station. The carrier is capable of holding the substrate and is movably coupled to a pair of guide tracks extending a length of the system. The cleaning station includes a force applicator and a gate. The force applicator has an applicator length and is operatively coupled to the cleaning station. The force applicator is rotatable and is adjusted to a first height off the surface of the carrier as the substrate is being cleaned. The force applicator has a hollow structure with internal channels and openings dispersed throughout the applicator length to dispense cleaning solution to substrate surface. The gate is affixed to a trailing edge of the force applicator and is set to a second height off the surface of the carrier. The gate includes a gate length that at least spans the applicator length. 1. A system for cleaning a substrate having surface contaminants thereon , comprising:a carrier capable of holding the substrate and movably coupled to a pair of guide tracks extending along a length of the system;a cleaning station including a force applicator and a gate,wherein the force applicator has an applicator length and is operatively connected to the cleaning station above a surface of the carrier and the pair of guide tracks, wherein the force applicator is rotatable, the force applicator is set to a first height off the surface of the carrier as the substrate is being cleaned, the force applicator having a hollow structure with a plurality of internal channels and openings dispersed throughout the applicator length of the force applicator, the plurality of channels and openings configured to dispense a cleaning solution to a surface of the substrate,wherein the gate is affixed to a trailing edge of the force applicator, the gate set to a second height off the surface of the carrier, the gate having a gate length that extends to at least span the applicator length.2. The system of claim 1 , ...

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23-01-2014 дата публикации

Coated Glasses and Method for Their Manufacture

Номер: US20140020722A1
Автор: Wendt Karl-Heinz
Принадлежит:

The invention relates to coated glass as well as a method for its manufacture. 118-. (canceled)20. The method according to claim 19 , wherein the method further comprises the step of abrading the partially or completely cured coating to break pointed edges.21. The method according to claim 19 , wherein the primer includes or comprises a polar claim 19 , organic solvent having 2 to 12 carbon atoms claim 19 , and at least one chemical group selected from keto claim 19 , aldehyde claim 19 , ester and acid group.22. The method according to claim 19 , wherein the method further comprises the step of polishing the glass surface with steel wool before applying the polyacrylate lacquer to the glass surface.23. The method according to claim 19 , wherein the polyacrylate lacquer is applied via silk-screen printing claim 19 , spraying or rolling.24. The method according to claim 19 , wherein the mineral particles are oxides or mixed oxides of aluminum and/or silicon claim 19 , including hydrates thereof or oxides or mixed oxides of titanium claim 19 , zinc or iron.25. The method according to claim 19 , wherein the mineral particles have an average diameter of 5 to 25 μm.26. The method according to claim 19 , wherein dyes claim 19 , colored pigments or both are added to the polyacrylate lacquer to manufacture a colored coating.27. The method according to claim 19 , wherein the glass body consists of fire-resistant glass of fireproof class F or G.28. The method according to claim 19 , wherein the glass body is a single-sheet safety glass claim 19 , and the coated glass has a surface tension that is relative to the uncoated either approximately unchanged or maximally reduced by 10%.29. The method according to claim 19 , wherein the polyacrylate lacquer is a 2-component lacquer obtained from at least one polyacrylate binder comprising the mineral particles and at least one isocyanate hardener having two or more reactive isocyanate groups per molecule claim 19 , which are ...

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06-02-2014 дата публикации

Methods and Apparatus for Cleaning Semiconductor Wafers

Номер: US20140034094A1
Принадлежит: ACM Research (Shanghai) Inc.

An apparatus for cleaning and conditioning the surface of a semiconductor substrate such as wafer includes a rotatable chuck, a chamber, a rotatable tray for collecting cleaning solution with one or more drain outlets, multiple receptors for collecting multiple cleaning solutions, a first motor to drive chuck, and a second motor to drive the tray. The drain outlet in the tray can be positioned directly above its designated receptor located under the drain outlet. The cleaning solution collected by the tray can be guided into designated receptor. One characteristic of the apparatus is having a robust and precisely controlled cleaning solution recycle with minimum cross contamination. 1. An apparatus for cleaning semiconductor substrate comprising:a chuck to hold a semiconductor substrate;a rotating means to drive said chuck;a chamber with at least one drain outlet;a plate having at least one receptor placed under the said chamber;a moving means to drive said plate so as to align the receptor with the drain outlet.2. The apparatus of claim 1 , wherein said moving means is a rotating mechanism to drive said plate to rotate around an axis.3. The apparatus of claim 1 , wherein said moving means is a translational motion mechanism to drive said plate to move laterally.4. The apparatus of claim 1 , wherein said chuck further comprises a vertically moving disk claim 1 , said disk is moved to a first position to load or unload the semiconductor substrate claim 1 , and to a second position to put the semiconductor substrate on or take it off said chuck.5. The apparatus of claim 1 , wherein said apparatus further comprises a vertically moving mechanism to drive said chuck to a first position for loading or unloading the semiconductor substrate claim 1 , and to a second position to perform cleaning or conditioning process.6. The apparatus of claim 1 , wherein said tray comprises at least one nitrogen nozzle to purge the used cleaning solution away from surface of said chamber.7 ...

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06-02-2014 дата публикации

Acoustic Assisted Single Wafer Wet Clean For Semiconductor Wafer Process

Номер: US20140034096A1
Принадлежит: LAM RESEARCH CORPORATION

An apparatus for cleaning a substrate includes a dispense head configured to supply a liquid medium as a meniscus to the surface of the substrate and a rinse head that is equipped with at least an inlet conduit to supply rinse chemical to a top substrate surface as a meniscus. An outlet conduit is disposed on either side of the inlet conduit and is configured to remove the rinse chemical and liquid medium from the substrate surface. The inlet conduit and the outlet conduits are perpendicular to the surface of the rinse head that faces the substrate and parallel to one another. A first and second transducers are disposed in a portion of the rinse head between the inlet conduit and each of the outlet conduits. The transducers are configured to transmit acoustic energy to the meniscus when formed between the surface of the rinse head and the substrate. 1. An apparatus for cleaning a surface of a substrate , comprising:a dispense head configured to supply a liquid medium as a meniscus to the surface of the substrate; and at least an inlet conduit to supply rinse chemical to a top surface of the substrate as a meniscus, the inlet conduit being substantially perpendicular to a surface of the rinse head that faces the substrate, when present;', 'at least an outlet conduit disposed on either side of the inlet conduit to remove the rinse chemical and liquid medium from the surface of the substrate, wherein the outlet conduits are substantially perpendicular to the surface of the rinse head and substantially parallel to the inlet conduit, a portion of the surface of the rinse head disposed between the inlet conduit and each of the outlet conduits being substantially flat and parallel to the surface of the substrate, when present; and', 'at least a first and second transducer disposed in the portion of the rinse head between the inlet conduit and each of the outlet conduits, the transducer being positioned adjacent to an inner bottom surface of the rinse head that is proximal ...

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06-02-2014 дата публикации

Coating treatment method and coating treatment apparatus

Номер: US20140038423A1
Принадлежит: Tokyo Electron Ltd

In the present invention, a masking solution is supplied to an edge portion of a front surface of a substrate rotated around a vertical axis to form a masking film at the edge portion of the substrate, a hard mask solution is supplied to the front surface of the substrate to form a hard mask film on the front surface of the substrate, a hard mask film removing solution dissolving the hard mask film is supplied to the hard mask film formed at the edge portion of the substrate to remove the hard mask film formed at the edge portion of the substrate, and a masking film removing solution dissolving the masking film is supplied to the masking film to remove the masking film at the edge portion of the substrate.

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13-02-2014 дата публикации

Mobile washing apparatus

Номер: US20140041691A1
Автор: Wade Glasscock
Принадлежит: SMITH INDUSTRIAL SERVICE

A mobile washing apparatus is disclosed. The mobile washing apparatus can include a mobile chassis having a plurality of wheels, a first spray head assembly, and a first adjustable support structure. The first spray head assembly may have a first spray head having a top plate and a side skirt. The top plate and side skirt can together define an interior space. A first rotating sprayer wand may be located within the interior space of the first spray head. The first adjustable support structure supports the first spray head assembly from the mobile chassis. The first adjustable support structure can be configured such that the first spray head assembly is positionable in a horizontal direction and positionable in a vertical direction. The first spray head also defines a face angle and the first adjustable support structure is configured such that the face angle of the first spray head is adjustable.

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13-02-2014 дата публикации

Film washout system

Номер: US20140041697A1
Принадлежит: Media Blast and Abrasives Inc

Provided is a film washout device includes a housing defining a rinsing chamber and a drain in fluid communication with the rinsing chamber. A drum is rotatably coupled to the housing and is configured to be engageable with the photosensitive material for washout thereof. A booster pump is operatively coupled to the housing and includes a pump inlet and a pump outlet, the pump inlet being fluidly connectable to the pressurized fluid source to receive fluid therefrom at an inlet pressure, the pump being configured to elevate the pressure of the fluid exiting the pump via the pump outlet. A plurality of nozzles are coupled to the housing and in fluid communication with the pump to receive fluid therefrom. The plurality of nozzles are configured to direct fluid into the rinsing chamber for washout of the photosensitive material.

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20-02-2014 дата публикации

LIQUID PROCESSING METHOD, LIQUID PROCESSING APPARATUS AND STORAGE MEDIUM

Номер: US20140048109A1
Автор: Namba Hiromitsu
Принадлежит: TOKYO ELECTRON LIMITED

Disclosed is a liquid processing method, apparatus, and storage device for cleaning a member disposed at holding part-side of a substrate, such as a lift pin plate (including a lift pin) or a holding plate, with a rinsing liquid, thereby preventing a chemical liquid adhered to such a member from having a bad influence on the wafer. The liquid processing method includes holding the substrate by a holding part, rotating the substrate held by the holding part through a rotation driving part, and supplying a chemical liquid to a holding part-side surface of the substrate by a chemical liquid supply part. After the supply of the chemical liquid, rinsing liquid droplets are generated and supplied to the holding part-side surface of the substrate by supplying gas toward the holding part-side surface of the substrate through a gas supply part and supplying a rinsing liquid toward the holding part-side surface of the substrate through a rinsing liquid supply part. After the supply of the rinsing liquid droplets, a rinsing liquid is additionally supplied to the holding part-side surface of the substrate through the rinsing liquid supply part. 14-. (canceled)5. A liquid processing apparatus comprising:a holding part configured to hold a substrate;a rotation driving part configured to rotate the substrate held by the holding part;a chemical liquid supply mechanism configured to supply a chemical liquid toward a holding part-side surface of the substrate;a rinsing liquid supply mechanism including a liquid supply pipe and configured to supply a rinsing liquid toward the holding part-side surface of the substrate;a gas supply part including a gas supply pipe provided in parallel with and separately from the liquid supply pipe and configured to supply gas toward the holding part-side surface of the substrate; anda control device configured to control an overall operation of the rotation driving part, the chemical liquid supply mechanism, the rinsing liquid supply mechanism, and ...

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27-02-2014 дата публикации

LIQUID PROCESSING APPARATUS AND LIQUID PROCESSING METHOD

Номер: US20140053882A1
Принадлежит: TOKYO ELECTRON LIMITED

A liquid processing apparatus including: a second housing; a first housing capable of being brought into contact with the second housing; a holding part configured to hold an object to be processed; a rotation driving part configured to rotate the object to be processed held by the holding part; front-side process-liquid supply nozzle configured to supply a process liquid onto a peripheral portion of a front surface of the object to be processed held by the holding part; and a storage part disposed on a side of a rear surface of the object to be processed held by the holding part, the storage part being configured to store the process liquid having been passed through the object to be processed. The respective first housing and the second housing can be moved in one direction, so that the first housing and the second housing can be brought into contact and separated from each other. 1. A liquid processing apparatus comprising:a second housing;a holding part disposed inside the second housing, the holding part being configured to hold an object to be processed;a rotation driving part configured to rotate the object to be processed held by the holding part; anda storage part disposed on a side of a rear surface of the object to be processed held by the holding part, the storage part being configured to receive a process liquid having been passed through the object to be processed and store the process liquid;wherein the second housing has a rear-side inclined part that is inclined to draw away from the object to be processed toward a periphery of the object to be processed, at a position opposed to a peripheral portion of the rear surface of the object to be processed held by the holding part, anda rear-side process-liquid supply nozzle disposed on the rear-side inclined part, the rear-side process-liquid supply nozzle being configured to supply the process liquid onto the peripheral portion of the rear surface of the object to be processed,wherein the second housing ...

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06-03-2014 дата публикации

CLEANING METHOD AND CLEANING APPARATUS

Номер: US20140060587A1
Принадлежит: Denso Corporation

The cleaning apparatus includes a reservoir tank for reserving a cleaning fluid, a pressure-feed unit for feeding the cleaning fluid while pressurizing the cleaning fluid above the atmospheric pressure, a heating unit for heating the cleaning fluid pressure-fed from the pressure-feed unit above an atmospheric pressure boiling point of the cleaning fluid, a gas supply unit for supplying a gas and an injection unit connected to the heating unit and the gas supply unit for injecting the cleaning fluid pressurized by the pressure-feeding unit and heated by the heating unit as a pressurized superheated cleaning fluid and the gas supplied from the gas supply unit to the member at the same time. 1. A cleaning method for cleaning a member to be cleaned comprising:a step of preparing a pressurized superheated cleaning fluid by pressurizing a cleaning fluid above atmospheric pressure and heating the pressurized cleaning fluid above an atmospheric pressure boiling point of the cleaning fluid;a step of supplying a gas; anda step of injecting the pressurized superheated cleaning fluid and the gas to the member at the same time.2. A cleaning apparatus comprising:a reservoir tank for reserving a cleaning fluid;a pressure-feed unit for feeding the cleaning fluid while pressurizing the cleaning fluid above the atmospheric pressure;a heating unit for heating the cleaning fluid pressure-fed from the pressure-feed unit above an atmospheric pressure boiling point of the cleaning fluid;a gas supply unit for supplying a gas; andan injection unit connected to the heating unit and the gas supply unit for injecting the cleaning fluid pressurized by the pressure-feeding unit and heated by the heating unit as a pressurized superheated cleaning fluid and the gas supplied from the gas supply unit to a member to be cleaned at the same time.3. The cleaning apparatus according to claim 2 , wherein the injection unit includes a fluid passage through which the pressurized superheated cleaning fluid ...

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06-03-2014 дата публикации

WASHING DEVICE FOR CLEANING PARTS, SUCH AS MACHINE PARTS OR THE LIKE

Номер: US20140060588A1
Автор: Sporer Robert
Принадлежит:

The washing device for cleaning parts, such as machine parts or the like, characterized in that its housing has a circular cross-sectional shape, that its tank at a distance above the bottom of the washing device has a bottom wall with a central exit opening for the cleaning liquid which is connected by a line section to the suction opening of the pump arranged under the bottom wall, that a filter housing with a filter is inserted into the connection line, and that downstream of the filter housing a two-way distributor is inserted into the connection line from which a further line is branched off that leads through the wall of the housing into the tank and introduces the cleaning agent at said place into the tank in such a manner that the cleaning agent is put into rotation. 1. A washing device for cleaning parts comprising: a housing , a wash basin or a basket-like parts container , a tank for cleaning liquid , and a pump which supplies cleaning liquid via a connection line from the tank to a washing unit which is either at least a nozzle pipe or a washing gun or a spray brush , the housing has a circular cross-sectional shape , the tank at a distance above a bottom of the washing device has a bottom wall with a central exit opening for the cleaning liquid which is connected by a line section to a suction opening of the pump arranged under the bottom wall , a filter housing with a filter is inserted into the connection line , and downstream of the filter housing a two-way distributor is inserted into the connection line from which a further line is branched off that leads through a wall of the housing into the tank and introduces a cleaning agent at said place into the tank in such a manner that the cleaning agent is put into rotation.2. The washing device according to wherein an outlet of the pump is in contact with an end of a pipe consisting of metal claim 1 , which is connected with the other end to the connection line.3. The washing device according to wherein ...

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13-03-2014 дата публикации

Integrated cleaner and dryer system

Номер: US20140069467A1
Автор: Rebstock Lutz

Methods and apparatuses for integrated cleaning of objects comprising a sequence of wet cleaning and vacuum drying in a same process chamber. The present integrated cleaning process can eliminate moving parts, improving the system reliability. Vacuum decontamination can be included for degassing and decontaminating the cleaned objects. In an embodiment, a cleaner system combines various movements into an integrated movement to be handled by a robot, for example, to improve the throughput. For example, an integrated robot movement comprising picking up a closed container from the input load port, moving both the lid and body together, and then depositing the body and lid separately into the appropriate positions in the cleaner to be cleaned. 1. A chamber for processing an article , wherein the article comprises two separate portions , the chamber comprisinga housing, wherein the housing comprises a first processing position for a first portion of the article and a second processing position for a second portion of the article; wherein the mechanism is configured to unlock the first portion from the second portion of the article,', 'wherein the mechanism is configured to perform the unlock action on an article supported by a movable robot;, 'an unlocking mechanism disposed in the housing,'}a delivery system configured to deliver a processing mixture to the portions of the article; and wherein the robot mechanism is configured to move the two portions of the article with the two portions locked to each other,', 'wherein the robot mechanism is configured to move to engage the article with the unlocking mechanism to unlock the two separate portions of the article, wherein the unlocking mechanism unlocks the two portions of the article while the robot supports the article,', 'wherein the robot mechanism is configured to move the two portions of the article together and to sequentially deposit the first portion to the first cleaning position and the second portion to the ...

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27-03-2014 дата публикации

Systems and methods related to ablation during manufacture of radio-frequency modules

Номер: US20140087633A1
Принадлежит: Skyworks Solutions Inc

Disclosed are systems and methods related to removal of materials by techniques such as ablation during manufacture of radio-frequency (RF) modules. Such modules can be manufactured in an array on a panel, and an overmold structure can be formed on the panel. In some situations, it can be desirable to remove a portion of an upper surface of the overmold to, for example, better expose upper portions of shielding wirebonds. In some embodiments, an ablation system can include a blasting apparatus configured to provide a stream of ablating particles to a blasting region. A first transport section that moves a panel through the blasting region can be separate from a second transport section that feeds or removes the panel to or from the first transport section. Such a configuration can substantially isolate the second transport section from the stream of ablating particles.

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03-04-2014 дата публикации

CLEANING APPARATUS

Номер: US20140090673A1
Принадлежит: OLYMPUS CORPORATION

This cleaning apparatus includes a rotation holding unit that holds and rotates an object; a cleaning fluid spray unit that sprays a cleaning fluid onto a spot-like cleaning region on the object, which is held by the rotation holding unit; a cleaning region moving unit that moves at least one of the rotation holding unit and the cleaning fluid spray unit to relatively move the cleaning region from the rotation center of the object toward the outer peripheral side thereof; a layered air current forming unit that forms a layered air current entering the surface of the object so as to cover the periphery of the cleaning region from a backward side in the direction of movement of the cleaning region relative to the rotation center; and a layered air current moving unit that relatively moves the incoming position of the layered air current while following the relative movement of the cleaning region. 1. A cleaning apparatus comprising:a rotation holding unit which holds and rotates an object which is to be cleaned;a cleaning fluid spray unit which sprays a cleaning fluid onto a spot-like cleaning region on the object held by the rotation holding unit;a cleaning region moving unit which moves at least one of the rotation holding unit and the cleaning fluid spray unit to relatively move the cleaning region from a rotation center of the object toward an outer peripheral side thereof;a layered air current forming unit which forms a layered air current entering a surface of the object so as to cover a periphery of the cleaning region from a backward side in a relative movement direction of the cleaning region relative to the rotation center; anda layered air current moving unit which relatively moves an incoming position of the layered air current while following the relative movement of the cleaning region.2. The cleaning apparatus according to claim 1 , further comprising:a holding unit which integrally holds the cleaning fluid spray unit and the layered air current forming ...

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10-04-2014 дата публикации

MAKEUP BRUSH CLEANER AND SANITIZER

Номер: US20140096801A1
Принадлежит:

The present invention generally relates to a makeup brush cleaner and sanitizer. Specifically, embodiments of the present invention relate to an apparatus configured to hold multiple cosmetics or other makeup type brushes in specifically designed retention means such that only the brush tips/bristles of the brushes are subject to the sanitation area of the apparatus. Certain embodiments of the present apparatus provide the sanitation area of the apparatus to clean the brush tips/bristles of the retained brushes via one or more of a cleaning solution, water, ultra-violet cleaning source, ultrasonic cleaning source, gentle agitation, or any combination thereof. 1. A makeup brush sanitizer apparatus , said apparatus comprising:a base portion, comprising a sanitation area and one or more brush retention means,wherein said sanitation area is comprised of one or more brush head cleaning means,wherein said one or more brush head cleansing means are adapted to facilitate the removal of buildup from a brush head portion of a makeup brush, andwherein said one or more brush retention means are configured to securely hold one or more makeup brushes, such that only said brush head portion of each of said one or more makeup brushes is subjected to said sanitation area of said apparatus.2. The apparatus of claim 1 , further comprising a lid component.3. The apparatus of claim 2 , wherein a sanitation cycle will not operate unless said lid component is engaged with said base portion.4. The apparatus of claim 1 , further comprising a handle component.5. The apparatus of claim 4 , wherein said handle component is incorporated with said lid component.6. The apparatus of claim 4 , wherein said handle component is incorporated with said base portion.7. The apparatus of claim 1 , wherein said one or more brush head cleaning means is selected from a group of brush head cleaning means comprising one or more cleaning fluid basins claim 1 , ultraviolet light cleaning means claim 1 , ...

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01-01-2015 дата публикации

SINGLE USE RINSE IN A LINEAR MARANGONI DRIER

Номер: US20150000711A1
Автор: Brown Brian J.
Принадлежит: Applied Materials, Inc.

An apparatus for drying of wet substrates in a post CMP cleaning apparatus is provided. The apparatus provides a waterfall or shallow reservoir of rinsing solution, such as DIW, through which a substrate may be lifted. A solvent vapor may be provided at the rinsing solution interface on the substrate, such as in a Marangoni process. In certain embodiments, the volume of solution through which the substrate is lifted is reduced, which may provide for reduced or eliminated particle reattachment to the substrate. 1. An apparatus for rinsing and drying a substrate , comprising:a body defining a volume configured to accommodate a semiconductor substrate;one or more rinse fluid members positioned to provide a waterfall of rinse fluid in the volume;a plurality of wetting spray members positioned to provide rinsing fluid below the one or more rinse fluid members; anda plurality of solvent spray members positioned to provide a drying agent above the one or more rinse fluid members.2. The apparatus of claim 1 , further comprising a guide member disposed in the volume and adapted to control an elevation of the substrate within the volume.3. The apparatus of claim 1 , wherein the one or more rinse members further comprise:a first rinse fluid member and a second rinse fluid member coupled to the body, wherein the first rinse fluid member and the second rinse fluid member face one another.4. The apparatus of claim 3 , further comprising a guide member adapted to pass the substrate between the first and second rinse fluid members.5. The apparatus of claim 1 , further comprising a rinse fluid source configured to provide de-ionized water to the volume.6. The apparatus of claim 4 , wherein guide member is adapted to pass the substrate between at least two of the plurality of wetting spray members.7. The apparatus of claim 4 , wherein the guide member is adapted to pass the substrate between at least two of the solvent spray members.8. The apparatus of claim 1 , further comprising an ...

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07-01-2021 дата публикации

Slide cleaner

Номер: US20210001343A1
Автор: Ahmet IMRALI
Принадлежит: Individual

The disclosure describes a slide cleaner apparatus. The apparatus comprises a cleaning chamber configured to receive a cell counting slide, at least one fluid inlet arranged to substantially align with an inlet on a cell counting slide when located in the chamber, and configured to feed cleaning fluid into the cleaning chamber and slide, and at least one fluid outlet configured to remove cleaning fluid from the cleaning chamber and slide. The disclosure also extends to a method of cleaning a cell counting slide.

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07-01-2016 дата публикации

SUBSTRATE TREATING APPARATUS AND METHOD

Номер: US20160001332A1
Принадлежит: SEMES CO., LTD.

The inventive concepts provide an apparatus for treating a substrate. The apparatus includes a housing proving an inner space in which a substrate is treated, a spin head supporting and rotating the substrate in the housing, an injection unit comprising a first nozzle member spraying a first treatment solution to the substrate put on the spin head, and a controller controlling the first nozzle member. The first nozzle member includes a body, a vibrator, a pump, and a power source. 1. A substrate treating apparatus comprising:a housing proving an inner space in which a substrate is treated;a spin head supporting and rotating the substrate in the housing;an injection unit comprising a first nozzle member spraying a first treatment solution to the substrate put on the spin head; anda controller controlling the first nozzle member,wherein the first nozzle member comprises:a body comprising: an injection fluid path in which the first treatment solution flows; and a first discharge opening connected to the injection fluid path to spray the first treatment solution;a vibrator installed within the body, the vibrator providing vibration to the first treatment solution flowing in the injection fluid path;a pump pressurizing the first treatment solution into the body to supply the first treatment solution; anda power source connected to the vibrator to operate the vibrator,wherein, when the first treatment solution is sprayed by the first nozzle member, the controller operates the pump to supply the first treatment solution after controlling the power source for operating the vibrator.2. The substrate treating apparatus of claim 1 , wherein claim 1 , if the supply of the first treatment solution is completed claim 1 , the controller interrupts the pump to remove pressure caused in the first nozzle member by the first treatment solution and then turns off the power source.3. The substrate treating apparatus of claim 2 , wherein the injection unit further comprises: a second ...

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05-01-2017 дата публикации

METHOD AND APPARATUS FOR TREATING SUBSTRATE

Номер: US20170001221A1
Автор: LEE TAEKYOUB
Принадлежит:

A method for treating a substrate with a treatment liquid is disclosed, wherein the substrate is treated while a location at which the treatment liquid is supplied onto the substrate that is rotated is moved in an outward direction from a central area of the substrate towards a peripheral area of the substrate and in an inward direction from a peripheral area of the substrate towards a central area of the substrate a plurality of times, and wherein the movement distances of some of the plurality of movements are different from each other. 1. A method for treating a substrate with a treatment liquid , wherein the substrate is treated while a supply location at which the treatment liquid is supplied onto the substrate that is rotated is moved in an outward direction from a central area of the substrate towards a peripheral area of the substrate or in an inward direction from a peripheral area of the substrate towards a central area of the substrate a plurality of times , and wherein movement distances of some of the plurality of movements are different from each other.2. The method of claim 1 , wherein the movement distances become shorter as a number of the movements increases.3. The method of claim 2 , wherein in the movements claim 2 , one end of a path of the supply location is a peripheral area of the substrate.4. The method of claim 3 , wherein in the movements claim 3 , ends of paths of the supply location are the same locations.5. The method of claim 1 , wherein an interval between a nozzle that discharges the treatment liquid and the substrate varies according to the supply location.6. The method of claim 5 , wherein the interval becomes shorter as the supply location goes outwards.7. The method of claim 6 , wherein the interval becomes longer as the supply location goes inwards.8. The method of claim 1 , wherein the discharge amounts of the treatment liquid varies according to the supply location.9. The method of claim 8 , wherein the discharge amount of the ...

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04-01-2018 дата публикации

CONNECTOR

Номер: US20180003901A1
Принадлежит:

An optical connector may include a vibrational element and a pair of traces to power the element. A corresponding connector receptacle includes a pair of pins to provide power to the vibrational element via the traces. 1. A connector , comprising:a connector body;a ferrule coupled to a front face of the connector body;a piezoelectric element proximal to the ferrule;power traces, each power trace coupled to the piezoelectric element and disposed on a side face of the connector body.2. The connector of claim 1 , wherein:each trace is disposed in a region of the side face of the connector body that is encompassed by a receptacle when the connector body is fully seated in the receptacle.3. The connector of claim 1 , further comprising:a resilient element adjacent to the ferrule.4. The connector of claim 1 , wherein the face of the ferrule comprises negatively charged material.5. The connector of claim 1 , wherein the connector body comprises an antistatic material.6. A receptacle claim 1 , comprising:a receptacle housing;a pair of pins disposed proximal to a rim of the receptacle housing; andtraces to connect the pair of pins to a power supply rail of a printed circuit assembly.7. The receptacle of claim 6 , further comprising adhesive material disposed on an inner face of the connector receptacle housing.8. The receptacle of claim 7 , further comprising adhesive material disposed on each inner face of the connector receptacle housing.9. A system claim 7 , comprising: a connector housing;', 'a ferrule disposed at a front face of the connector housing;', 'a vibrator coupled to the ferrule; and', 'a pair of traces coupled to the vibrator to deliver power to the vibrator, the pair of traces disposed on a side face of the body housing; and, 'a connector comprising a receptacle housing;', 'a pair of pins disposed on a side face of the receptacle housing to electrically couple to the pair of traces to deliver power to the vibrator., 'a receptacle comprising10. The system of ...

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13-01-2022 дата публикации

CLEANING DEVICE FOR A PAIR OF SPECTACLES HAVING BAR-SHAPED CLEANING ELEMENTS

Номер: US20220011605A1
Автор: JG BELEMANS Gèrald
Принадлежит:

A cleaning device for a pair of spectacles, comprising a housing defining a cleaning space, a mounting part for holding the pair of spectacles inside said space, sets of opposing cleaning elements for cleaning opposing faces of glasses of the pair of spectacles, and a drive unit for moving the pair of spectacles and the cleaning elements relative to each other during a cleaning operation. The sets of opposing cleaning elements are positionable relative to each other between an inactive position, that is configured to have at least one of the sets of the cleaning elements lie spaced from at least one of the opposing faces of the respective glasses, and a cleaning position, that is configured to have the sets of opposing cleaning elements lie against both opposing faces of the respective glasses. Each of the cleaning elements is bar-shaped, wherein, in the cleaning position, longitudinal axis of the bar-shaped cleaning elements extend in one or more directions that are substantially parallel to the opposing faces of the glasses, and wherein the drive unit is configured to translate the pair of spectacles and the bar-shaped cleaning elements relative to each other substantially parallel to the opposing faces of the glasses while rubbing or wiping them clean. 1. A cleaning device for a pair of spectacles , comprising:a housing defining a cleaning space;a mounting part for holding the pair of spectacles inside said space;sets of opposing cleaning elements for cleaning opposing faces of glasses of the pair of spectacles; anda drive unit for moving the pair of spectacles and the cleaning elements relative to each other during a cleaning operation,in which the sets of opposing cleaning elements are positionable relative to each other between an inactive position, that is configured to have at least one of the sets of the cleaning elements lie spaced from at least one of the opposing faces of the respective glasses, and a cleaning position, that is configured to have the ...

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04-01-2018 дата публикации

APPARATUS AND METHOD FOR TREATING SUBSTRATE

Номер: US20180005817A1
Принадлежит:

Disclosed are an apparatus and a method for liquid-treating a substrate. The method for liquid-treating a substrate includes a first treatment liquid supplying operation of supplying a first treatment liquid to a treatment location of the substrate, and a wetting operation of, after the first treatment liquid supplying operation, supplying a wetting liquid onto the substrate, wherein the wetting operation includes a simultaneous supply operation of supplying the wetting liquid to the first location while the first treatment liquid is supplied, and wherein the first location is a location deviating from the treatment location. Accordingly, the surface of the substrate may be prevented from being dried while the treatment liquid is converted to a wetting liquid. 1. An apparatus for liquid-treating a substrate , the apparatus comprising:a treatment container having a treatment space in the interior thereof;a substrate support unit supporting the substrate in the treatment space;a fixed nozzle unit fixedly installed in the treatment container; anda movable nozzle unit being movable to a location facing the treatment space and including a first movable nozzle configured to supply a first treatment liquid onto the substrate supported by the substrate support unit,wherein the fixed nozzle unit includes:a first fixed nozzle configured to supply a wetting liquid to a first location of the substrate supported by the substrate support unit; anda second fixed nozzle configured to supply the wetting liquid to a second location of the substrate supported by the substrate support unit, andwherein the first location is a location that is farther from the center of the substrate than the second location.2. The apparatus of claim 1 , wherein the first movable nozzle supplies the first treatment liquid to a treatment location of the substrate supported by the substrate support unit claim 1 , andwherein the first location is a location that is different from the treatment location.3. ...

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02-01-2020 дата публикации

SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING SYSTEM AND SUBSTRATE PROCESSING METHOD

Номер: US20200006092A1
Принадлежит:

A substrate processing apparatus includes a substrate processing unit, a partition wall, a first gas supply, and a second gas supply. The substrate processing unit performs a liquid processing on a substrate. The partition wall separates a first space defined from a carry-in/out port through which the substrate is loaded to the substrate processing unit, and a second space other than the first space. The first gas supply is connected to the partition wall, and supplies an atmosphere adjusting gas to the first space. The second gas supply is connected to a place different from the first gas supply in the partition wall, and supplies an atmosphere adjusting gas to the first space. 1. A substrate processing apparatus comprising:a substrate processing unit including a substrate holder configured to mount a substrate and perform a liquid processing on the substrate;a partition wall configured to separate a first space from a carry-in/out port through which the substrate is loaded to the substrate processing unit, and a second space other than the first space;a first gas supply connected to the partition wall and configured to supply an atmosphere adjusting gas to the first space; anda second gas supply connected to a place different from the first gas supply in the partition wall and configured to supply an atmosphere adjusting gas to the first space.2. The substrate processing apparatus according to claim 1 , wherein the first gas supply and the second gas supply are connected to positions in the partition wall facing the substrate.3. The substrate processing apparatus according to claim 2 , wherein the partition wall includes a top plate that covers a top side of the substrate claim 2 , and a side wall that surrounds a lateral side of the substrate claim 2 , and the first gas supply and the second gas supply are connected to the top plate of the partition wall.4. The substrate processing apparatus according to claim 3 , wherein the first gas supply is connected to the ...

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03-01-2019 дата публикации

CHEMICAL SUPPLYING UNIT, SUBSTRATE TREATMENT APPARATUS, AND METHOD OF TREATING SUBSTRATE USING THE SUBSTRATE TREATMENT APPARATUS

Номер: US20190006213A1
Принадлежит: SEMES CO., LTD.

Provided is a substrate treatment apparatus including a housing, a supporting unit located inside the housing and supporting a substrate, a nozzle unit supplying chemicals to the substrate disposed on the supporting unit, and a chemical supplying unit supplying the chemicals to the nozzle unit. Herein, the chemical supplying unit includes a chemical supply source, a first tank and a second tank storing the chemicals, a chemical supplying line supplying the chemicals from the chemical supply source to the first tank and the second tank, a chemical discharge line supplying the chemicals from the first tank and the second tank to the nozzle unit, a circulation line allowing the chemicals to circulate through the first tank and the second tank, respectively, a member installed on the circulation line, and a controller controlling the member. 1. A method of treating a substrate in a substrate treating apparatus , the method comprising:supplying chemicals from a tank;circulating the chemicals through a circulation line connected to the tank;maintaining the substrate in a first mode until a process condition is satisfied; andswitching the apparatus to a second mode different from the first mode after satisfying the process condition, the apparatus consuming a smaller amount of energy in the second mode than in the first mode.2. The method of claim 1 , wherein the circulation line is installed with a heater configured to control a temperature of the chemicals claim 1 , andwherein the temperature is lower in the second mode in the first mode.3. The method of claim 1 , wherein the circulation line is installed with a pump configured to control a flow amount of the chemicals claim 1 , andwherein strokes per minute of the pump are lower in the second mode in the first mode.4. The method of claim 1 , wherein the circulation line is installed with a pump configured to control a flow amount of the chemicals and a heater configured to control a temperature of the chemicals claim 1 ...

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20-01-2022 дата публикации

Ferrule-less multi-fiber connectors

Номер: US20220019042A1
Автор: Michael James Ott
Принадлежит: CommScope Technologies LLC

A connection system includes an optical connector assembly; and an optical plug. The connector assembly includes a stack of gel-groove assemblies and a spring assembly mounted within a housing. Each of the gel-groove assemblies includes a first gel block at a first axial end, a second gel block at a second axial end, and a fiber mating region between the first and second gel blocks. The optical plug including sub-modules over-molded over arrays (e.g., ribbons) of the optical fibers. Each sub-module defines notches for receiving latches of the spring assembly when the optical plug is coupled to the first axial end of the optical adapter. Bare optical fibers extend from the plug, pass through the first axial gel block, and enter the fiber mating region when the plug is coupled to the adapter.

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14-01-2021 дата публикации

FLUID SUPPLY UNIT AND SUBSTRATE TREATING APPARATUS HAVING THE SAME

Номер: US20210008606A1
Принадлежит: SEMES CO., LTD.

An apparatus for treating a substrate includes a process chamber having a treatment space for treating the substrate; a fluid supply unit for supplying fluid to the treatment space, wherein the fluid supply unit includes: a supply pipe connected to the treatment space to supply the fluid to the treatment space; a pump installed in the supply pipe to provide flow pressure to the fluid; a vent line installed between the pump and the process chamber to discharge pressure in the fluid to an outside; a relief valve installed in the vent line to open and close the vent line; and a reservoir installed between the pump and a branch point wherein the vent line branches from the supply pipe, wherein the reservoir has a cross-sectional area larger than a cross-sectional area of a portion of the supply pipe located between the pump and the branch point. 1. An apparatus for treating a substrate , the apparatus comprising:a process chamber having a treatment space for treating the substrate;a fluid supply unit for supplying fluid to the treatment space, a supply pipe connected to the treatment space to supply the fluid to the treatment space;', 'a pump installed in the supply pipe to provide flow pressure to the fluid;', 'a vent line installed between the pump and the process chamber to discharge pressure in the fluid to an outside;', 'a relief valve installed in the vent line to open and close the vent line; and', 'a reservoir installed between the pump and a branch point wherein the vent line branches from the supply pipe, wherein the reservoir has a cross-sectional area larger than a cross-sectional area of a portion of the supply pipe located between the pump and the branch point., 'wherein the fluid supply unit includes2. The apparatus of claim 1 , wherein the reservoir has a pipe shape.3. The apparatus of claim 1 , wherein both ends of the reservoir have the same cross-sectional area of the portion of the supply pipe.4. The apparatus of claim 3 , wherein a cross-sectional ...

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10-01-2019 дата публикации

APPARATUS SUITABLE FOR CLEANING VEHICLES

Номер: US20190009753A1
Автор: TOLDA Paolo
Принадлежит: BEST WASH BIKE s.r.I.

An apparatus suitable for cleaning vehicles, comprising: 1. (canceled)2. (canceled)3. (canceled)4. (canceled)5. (canceled)6. (canceled)7. (canceled)8. (canceled)9. (canceled)10. (canceled)11. (canceled)12. (canceled)13. (canceled)14. (canceled)15. (canceled)16. (canceled)17. (canceled)18. (canceled)19. (canceled)20. Apparatus suitable for cleaning vehicles comprising:a base structure for positioning the vehicle,a containment structure of the vehicle which is associated with the base structure, the containment structure comprising at least two side walls opposite to the side surfaces of the vehicle once the vehicle is placed on the base structure and at least one rear wall opposite to the front part of the vehicle once the vehicle has been placed on the base structure,at least one plurality of washing nozzles arranged in the base structure and opposite to the below part of the vehicle when the vehicle has been placed on the base structure, said at least one plurality of washing nozzles being aligned below the underbody of the vehicle to be cleaned so as not to be outside the projection of the profile of the vehicle to be cleaned on the base structure in the case wherein the vehicle is a two-wheel vehicle,another plurality of washing nozzles, which is supported by the side walls of the containment structure and is suitable for distributing washing liquid onto the vehicle, andeven another plurality of washing nozzles suitable for distributing washing liquid onto the front part of the vehicle, by comprising movement means for moving the wash nozzles of said another plurality of washing nozzles, said movement means being suitable for moving said washing nozzles according to an oscillating movement with respect to the containment structure of the vehicle, said apparatus comprising means suitable for providing said another plurality of washing nozzles and said even another plurality of washing nozzles with wash liquid at high pressure so that said another plurality of ...

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09-01-2020 дата публикации

SUBSTRATE PROCESSING APPARATUS AND NOZZLE UNIT

Номер: US20200009621A1
Принадлежит: SEMES CO., LTD.

An apparatus for processing a substrate compries a processing vessel having a processing space inside, a substrate support unit that supports and rotates the substrate in the processing vessel, and a nozzle unit that dispenses a processing liquid onto the substrate. The nozzle unit compries a nozzle that dispenses the processing liquid and an ultraviolet (UV) light supply unit that emits UV light to activate radicals of the processing liquid dispensed onto the substrate. 1. An apparatus for processing a substrate , the apparatus comprising:a processing vessel having a processing space inside;a substrate support unit configured to support and rotate the substrate in the processing vessel; anda nozzle unit configured to dispense a processing liquid onto the substrate,wherein the nozzle unit compries:a nozzle configured to dispense the processing liquid: andan ultraviolet (UV) light supply unit configured to emit UV light to activate radicals of the processing liquid dispensed on the substrate.2. The apparatus of claim 1 , wherein the nozzle unit further compries:an arm on which the nozzle and the UV light supply unit are installed; andan arm actuator configured to move the arm.3. The apparatus of claim 2 , wherein the UV light supply unit compries:a lamp tube hermetically sealed at opposite ends thereof to form a discharge space inside; anda pair of connectors installed on the opposite ends of the lamp tube and including a filament, andwherein the lamp tube has a U-shape that compries a horizontal portion parallel to the substrate and vertical portions vertically extending upward from opposite ends of the horizontal portion, the connectors being installed on the vertical portions.4. The apparatus of claim 3 , wherein the arm compries a lamp mounting part having a receiving space in which the UV light supply unit is received claim 3 , andwherein the receiving space is open at the bottom that faces the substrate, and the horizontal portion of the lamp tube is located at ...

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27-01-2022 дата публикации

OPTICAL CONNECTOR CLEANING TOOL

Номер: US20220026642A1
Принадлежит:

An optical connector cleaning tool includes a cleaning portion (), a container () configured to store a cleaning liquid (), and an atomizer () configured to atomize the cleaning liquid () stored in the container () by ultrasonic atomization. The atomizer () includes an atomizing separation portion () configured to cover a liquid supply port () and pass not a liquid but mist. In addition, the cleaning tool includes a control circuit () configured to control an operation time of the atomizer () by a set time. 1. An optical connector cleaning tool comprising:a cleaning portion configured to absorb a cleaning liquid;a container including a liquid supply port and configured to store the cleaning liquid;an atomizer configured to atomize the cleaning liquid stored in the container by ultrasonic atomization;a supply portion configured to supply mist of the cleaning liquid atomized by the atomizer to the cleaning portion; anda control circuit configured to control an operation time of the atomizer.2. The optical connector cleaning tool according to claim 1 , wherein the atomizer includes an atomizing separation portion configured to cover the liquid supply port and pass not a liquid but mist.3. The optical connector cleaning tool according to claim 1 , wherein the supply portion comprises a tube including claim 1 , at one end claim 1 , an opening in which the cleaning portion is inserted claim 1 , andthe atomizer is provided at the other end of the tube.4. The optical connector cleaning tool according to claim 1 , further comprising:a timer configured to measure a time set from a point of time when the operation time controlled by the control circuit has elapsed; andan indicator configured to light from the point of time when the operation time controlled by the control circuit has elapsed and turn off when the set time has been measured by the timer.5. The optical connector cleaning tool according to claim 1 , further comprising:a start signal generation unit configured to ...

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14-01-2016 дата публикации

ARTICLE FOR CLEANING OPTICAL FIBERS

Номер: US20160011380A1
Автор: Tourigny Jay S.
Принадлежит:

The cleaning head () of a swab-like cleaning device () for cleaning optical fiber end faces, especially the lens of expanded beam (“EB”) optical fibers, has a concave configuration of its cleaning surface (). This provides for effective engagement of the cleaning surface with the convex, e.g., spherical or nearly spherical, light transmission surfaces of the lenses () of EB optical fibers. The cleaning head comprises coherent bodies of sintered polymers and may have zones of different density. Deformability of at least that portion of the cleaning head () which terminates in the cleaning surface () facilitates use of the cleaning device for non-EB as well as EB optical fiber end faces by better conforming the cleaning surface to the end faces during cleaning of the end faces. 1. A cleaning device for cleaning an optical fiber end face , the cleaning device comprising a cleaning head terminating in a curved concave cleaning surface.2. The cleaning device of wherein the concave cleaning surface comprises a bowl-shaped depression terminating in a non-crenulated peripheral leading edge.3. The cleaning device of wherein the concave cleaning surface comprises a bowl-shaped depression terminating in a crenulated peripheral leading edge.4. The cleaning device of wherein the cleaning head has a longitudinal axis and the concave cleaning surface comprises a U-shaped groove disposed perpendicularly to the longitudinal axis of the cleaning head claim 1 , whereby the cleaning surface has a saddle shape configuration.5. The cleaning device of any one of claim 1 , claim 1 , or wherein the concave cleaning surface is dimensioned and configured to conform to a portion of the surface of a convex lens of a lensed optical fiber.6. The cleaning device of any one of claim 1 , claim 1 , or wherein the cleaning head comprises a polymeric open-celled structure in the form of a coherent body of one or more thermally sintered polymers.7. The cleaning device of wherein the cleaning head has at ...

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15-01-2015 дата публикации

METHOD AND DEVICE FOR BONDING WORKPIECES EACH PRODUCED FROM GLASS SUBSTRATE OR QUARTZ SUBSTRATE

Номер: US20150013388A1
Принадлежит: USHIO DENKI KABUSHIKI KAISHA

Vacuum ultraviolet light with a wavelength of 200 nm or less is applied on the joining surfaces of first and second workpieces made from a crystal substrate and a glass substrate, or a glass substrate and a glass substrate from a light irradiation unit. The workpieces are conveyed to a workpiece cleaning and laminating mechanism by a conveyance mechanism, the joining surfaces are subjected to mega-sonic cleaning as needed, and the workpieces are aligned with the joining surfaces thereof facing each other, and laminated such that the joining surfaces are in contact with each other. After being laminated, the laminated workpieces are conveyed to a workpiece heating mechanism and heated to increase the workpiece temperature to a predetermined temperature, and this temperature is maintained until joining is completed. The laminated workpieces are brought into a thermally expanded state upon heating, and are joined in this state. 1. A workpiece bonding method for bonding an optically polished surface of a first workpiece and an optically polished surface of a second workpiece to each other , the first and second workpieces being a glass substrate and another glass substrate , a glass substrate and a quartz substrate , or a quartz substrate and another quartz substrate , at least one of two surfaces of the first workpiece being optically polished , and at least one of two surfaces of the second workpieces being optically polished , said workpiece bonding method comprising:irradiating the optically polished surface of the first workpiece and the optically polished surface of the second workpiece with ultraviolet light having a wavelength equal to or less than 250 nm;laminating the first and second workpieces, after said irradiating, such that the optically polished surface of the first workpiece and the optically polished surface of the second workpiece contact each other; andheating the first and second workpieces, after said laminating, at a temperature equal to or ...

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10-01-2019 дата публикации

CLEANING PADS FOR FIBER OPTIC CONNECTORS

Номер: US20190011644A1
Принадлежит:

A cleaning pad () for cleaning fiber optic connectors includes: a main body; and a plurality of cleaning locations () located along the main body, each of the cleaning locations () defining a space in which a fiber optic connector is to be cleaned. 1. A cleaning pad for cleaning fiber optic connectors , the cleaning pad comprising:a main body; anda plurality of cleaning locations located along the main body, each of the cleaning locations defining a space in which a fiber optic connector is to be cleaned.2. The cleaning pad of claim 1 , wherein the cleaning locations are located in a plurality of rows along the cleaning pad.3. The cleaning pad of claim 1 , wherein the cleaning locations are located in a single row along the cleaning pad.4. The cleaning pad of claim 1 , wherein each of the cleaning locations includes first and second sloped sidewalls and a bottom wall.5. The cleaning pad of claim 4 , wherein each of the cleaning locations extends along a length sized to indicate a proper cleaning length for the fiber optic connector.6. The cleaning pad of claim 1 , wherein the fiber optic connector is positioned in a fixture holding a plurality of fiber optic connectors.7. The cleaning pad of claim 1 , wherein the cleaning pad is configured to receive a cleaning tissue positioned thereon.8. A method for cleaning a plurality of fiber optic connectors claim 1 , the method comprising:providing a cleaning pad including a main body and a plurality of cleaning locations located along the main body;positioning a cleaning tissue over the cleaning pad; andplacing a fiber of a fiber optic connector in one of the cleaning locations to contact the cleaning tissue to clean the fiber.9. The method of claim 8 , further comprising moving the fiber along a length of the cleaning location to clean the fiber.10. The method of claim 8 , further comprising moving a fixture holding the fiber optic connector along a length of the cleaning location to clean the fiber.11. The method of claim ...

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15-01-2015 дата публикации

SUBSTRATE PROCESSING APPARATUS

Номер: US20150013603A1
Принадлежит:

Each chemical processing section includes a chemical liquid bottle, a buffer tank, a pump, a filter, a discharge valve and a discharge nozzle. A chemical liquid stored in the chemical liquid bottle is led to the discharge nozzle and is discharged from the discharge nozzle to a substrate. A cleaning processing section includes a solvent bottle, a cleaning liquid bottle, the buffer tank and the pump. A solvent stored in the solvent bottle, a cleaning liquid stored in the cleaning liquid bottle and a gas supplied from a gas supply source are selectively led to the discharge nozzle in each chemical liquid processing section. 1. A substrate processing apparatus comprising:a chemical liquid processing section in which a process is performed on a substrate by a chemical liquid;a cleaning processing section in which a cleaning process is performed on the chemical liquid processing section; anda controller configured to control the chemical liquid processing section and the cleaning processing section, whereinthe chemical liquid processing section includesa chemical liquid storage configured to store the chemical liquid,a discharge nozzle configured to discharge the chemical liquid,a first pipe for leading the chemical liquid stored in the chemical liquid storage to the discharge nozzle,a supply device provided at the first pipe and configured to supply the chemical liquid stored in the chemical liquid storage to the discharge nozzle through the first pipe,a flow path opening/closing unit provided at a portion of the first pipe at a further downstream position than the supply device and configured to be capable of opening and closing a flow path in the first pipe, anda filter provided at a portion of the first pipe that is located at a further downstream position than the supply device and at a further upstream position than the flow path opening/closing unit,the cleaning processing section includesa second pipe for leading a cleaning liquid to the first pipe,a third pipe ...

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15-01-2015 дата публикации

FLUID NOZZLE DEVICE AND METHOD FOR CLEANING A SUBSTRATE USING THE SAME

Номер: US20150013727A1
Автор: Teng Chih-Ming
Принадлежит: els System Technology Co., Ltd.

A fluid nozzle device includes: at least one fluid nozzle which includes a nozzle body having a first inner surface, a second inner surface that is opposite to and spaced apart from the first inner surface, an inner bottom surface that interconnects the first and second inner surfaces and that cooperates with the first and second inner surfaces to define a receiving space thereamong; a gas-intake tube disposed on top of the nozzle body; a liquid-intake tube formed with a liquid inlet and having at least one liquid outlet that is distal from the gas-intake tube; and a plurality of ejecting channels spaced apart from each other and disposed in the nozzle body. 1. A fluid nozzle device adapted for cleaning a substrate , said fluid nozzle device comprising at least one fluid nozzle which includes:a nozzle body having a first inner surface, a second inner surface that is opposite to and spaced apart from said first inner surface in a first direction, an inner bottom surface that interconnects said first and second inner surfaces and that cooperates with said first and second inner surfaces to define a receiving space thereamong, and an outer bottom surface at a bottom of said nozzle body;a gas-intake tube disposed on top of said nozzle body and defining a gas-intake channel that is in fluid communication with said receiving space;a liquid-intake tube having an end that is connected to said second inner surface, and an opposite end that extends in the first direction through said first inner surface, and that is formed with a liquid inlet spatially communicating said receiving space with the external environment, said liquid-intake tube further having at least one liquid outlet that is distal from said gas-intake tube and that extends in the first direction for spatially communicating said receiving space with an inner space of said liquid-intake tube; anda plurality of ejecting channels spaced apart from each other in the first direction and disposed in said nozzle body, ...

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14-01-2016 дата публикации

SEMICONDUCTOR SUBSTRATE CLEANING SYSTEM AND METHOD FOR CLEANING SEMICONDUCTOR SUBSTRATE

Номер: US20160013047A1
Автор: Ogawa Yuichi
Принадлежит: KURITA WATER INDUSTRIES LTD.

There is provided a method for cleaning a semiconductor substrate to remove platinum and/or a platinum alloy from the semiconductor substrate having a layer having Si as its constituting component, and the method enables Al, a silicide film, a Si-based insulating film, a Si-based substrate and the like to be effectively cleaned without being damaged. 1. A method for cleaning a semiconductor substrate to remove platinum and/or a platinum alloy from the semiconductor substrate having a layer having Si as a constituting element thereof , the method comprising:a first cleaning step of bringing the semiconductor substrate into contact with a first solution containing nitric acid and/or hydrogen peroxide as main solutes to thereby clean the semiconductor substrate; anda second cleaning step of bringing the semiconductor substrate having undergone the first cleaning step into contact with a second solution containing an oxidizing agent-containing sulfuric acid solution and a halide and having a temperature of 25 to 100° C., to thereby clean the semiconductor substrate.2. The method for cleaning a semiconductor substrate according to claim 1 , wherein the semiconductor substrate is any one of a semiconductor substrate having an insulating film constituted of a Si compound claim 1 , a semiconductor substrate constituted of Si or a Si compound semiconductor claim 1 , and a semiconductor substrate having a silicide film.3. The method for cleaning a semiconductor substrate according to claim 1 , wherein the semiconductor substrate has a silicide film containing platinum formed thereon.4. The method for cleaning a semiconductor substrate according to claim 1 , wherein the semiconductor substrate has Al present thereon.5. The method for cleaning a semiconductor substrate according to claim 1 , wherein the semiconductor substrate has SiOplatinum and/or a platinum alloy and SiOexposed thereon.6. The method for cleaning a semiconductor substrate according to claim 1 , wherein the ...

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14-01-2016 дата публикации

APPARATUS FOR TREATING SUBSTRATE

Номер: US20160013079A1
Принадлежит:

A substrate treating apparatus is provided which includes a treating container of which a top end is opened, a substrate support unit placed in a treating container to support a substrate, a treatment solution supply unit supplying a treatment solution to a substrate put on the support unit, and a heating unit placed in the substrate support unit to heat the substrate. The heating unit includes a heating element and a reflection element reflecting a heat from the heating element upward. 1. A substrate treating apparatus comprising:a treating container of which a top end is opened;a substrate support unit placed in a treating container to support a substrate;a treatment solution supply unit supplying a treatment solution to a substrate put on the support unit; anda heating unit placed in the substrate support unit to heat the substrate,wherein the heating unit comprises:a heating element; anda reflection element reflecting a heat from the heating element upward.2. The substrate treating apparatus of claim 1 , wherein the heating element comprises in a plurality of lamps.3. The substrate treating apparatus of claim 2 , wherein the substrate support unit comprises:a chuck stage on which a substrate is put and rotatable; anda rotary unit having a hollow form and rotating the chuck stage in connection with the chuck stage,wherein the heating element is located in the chuck stage and includes lamps concentrically arranged to have ring shapes of which distances from the center of the chuck stage are different from each other.4. The substrate treating apparatus of claim 3 , wherein the reflection element comprises a main reflection plate disposed between adjacent lamps.5. The substrate treating apparatus of claim 4 , wherein the reflection element further comprises:an inner reflection plate located between the chuck stage and the lamps.6. The substrate treating apparatus of claim 5 , wherein the reflection element further comprises:an outer reflection plate spaced apart ...

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14-01-2016 дата публикации

APPARATUS AND METHOD FOR TREATING SUBSTRATE

Номер: US20160013080A1
Принадлежит:

Embodiments of the inventive concepts provide an apparatus and a method for treating a substrate. The apparatus includes a substrate support unit supporting the substrate, and a liquid supply unit supplying a treatment solution to the substrate supported by the substrate support unit. The liquid supply unit includes a nozzle discharging the treatment solution to the substrate, a liquid supply line supplying the treatment solution to the nozzle, a mixing member installed on the liquid supply line, a mixing space formed within the mixing member, and a gas supply line connected to the mixing member to supply a gas into the mixing space. The mixing member includes a body within which the mixing space is formed, and an inflow port combined with the body such that the gas supplied through the inflow port is mixed with the treatment solution in the mixing space to form nano-sized bubbles. 1. An apparatus for treating a substrate , the apparatus comprising:a substrate support unit supporting the substrate; anda liquid supply unit supplying a treatment solution to the substrate supported by the substrate support unit,wherein the liquid supply unit comprises:a nozzle discharging the treatment solution to a top surface of the substrate;a liquid supply line supplying the treatment solution to the nozzle;a mixing member installed on the liquid supply line, a mixing space formed within the mixing member; anda gas supply line connected to the mixing member to supply a gas into the mixing space,wherein the mixing member comprises:a body within which the mixing space is formed; andan inflow port combined with the body such that the gas supplied through the inflow port is mixed with the treatment solution in the mixing space to form nano-sized bubbles.2. The apparatus of claim 1 , further comprising:a liquid flow rate adjuster installed on the liquid supply line, the liquid flow rate adjuster controlling a first flow rate of the treatment solution;a gas flow rate adjuster installed ...

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11-01-2018 дата публикации

WET ETCHING METHOD, SUBSTRATE LIQUID PROCESSING APPARATUS, AND STORAGE MEDIUM

Номер: US20180012754A1
Автор: Nanba Hiromitsu
Принадлежит:

This wet etching method comprises rotating a substrate (W), supplying an etching chemical to a first surface (a surface for forming a device) of the rotating substrate, and supplying an etching inhibitor (DIW) to a second surface (a surface which is not used for forming a device) during the supplying the etching chemical to the substrate. The etching inhibitor moves past an edge (WE) of the substrate to swirl onto the first surface and reaches a first region extending from the edge of the substrate on the periphery of the first surface to a first radial position located radially inward from the edge on the first surface. Thus, it is possible to perform an excellent bevel etching treatment on the upper layer of the substrate having a two-layered film formed thereon. 1. A substrate liquid processing method comprising:A wet etching method for wet-etching a substrate including a first surface and a second surface opposite to the first surface and formed with a first layer as a lower layer and a second layer as an upper layer that are laminated on at least a peripheral edge portion of the first surface of the substrate, the method comprising:a process of rotating the substrate;a process of supplying a chemical liquid capable of etching both the first layer and the second layer, to the first surface of the rotating substrate; anda first process of supplying an etching inhibiting liquid to the second surface of the substrate while supplying the chemical liquid to the substrate;wherein in the first process, the etching inhibiting liquid is supplied while rotating the substrate such that the etching inhibiting liquid wraps around the first surface through an edge of the substrate and reaches a first region extending from the edge of the substrate on the peripheral edge portion of the first surface to a first radial position located radially inward from the edge on the first surface.2. The wet etching method of claim 1 , wherein the process of supplying the etching inhibiting ...

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14-01-2021 дата публикации

SUBSTRATE PROCESSING SYSTEM AND SUBSTRATE PROCESSING METHOD

Номер: US20210013056A1
Автор: Takimoto Yuji
Принадлежит:

A substrate processing system includes: a substrate transfer device; processing units each having a substrate holding mechanism for rotatably holding a substrate received from the substrate transfer device and a processing fluid supply part for supplying a processing fluid to the substrate; and a controller for controlling the substrate transfer device and the processing units according to processing recipe information so as to execute the substrate processing process. When an abnormality in a certain unit of the processing units occurs in the substrate processing process for the substrate to be processed, the controller controls the substrate transfer device and a relief processing unit according to complementary recipe information so that the complementary processing process for a relief substrate is executed in the relief processing unit by transferring the relief substrate to the relief processing unit different from the certain processing unit. 1. A substrate processing system , comprising:a substrate transfer device configured to transfer a substrate;a plurality of processing units, each having a substrate holding mechanism configured to rotatably hold the substrate received from the substrate transfer device and a processing fluid supply part configured to supply a processing fluid to the substrate held by the substrate holding mechanism; anda controller configured to control the substrate transfer device and the plurality of processing units according to processing recipe information indicating contents of a substrate processing process so as to execute the substrate processing process including a substrate chemical liquid process of supplying a chemical liquid to the substrate, a substrate rinsing process of supplying a rinsing liquid to the substrate, and a substrate drying process of drying the substrate,wherein, when an abnormality in a certain processing unit of the plurality of processing units occurs in the substrate processing process for the ...

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09-01-2020 дата публикации

SYSTEM AND METHOD FOR SELF-CLEANING WET TREATMENT PROCESS

Номер: US20200013641A1
Принадлежит:

An apparatus for supporting and maneuvering a wafer comprises a handle having a gas inlet adapted to couple to a gas supply, a supporting surface coupled to the handle section including a frame structure having edge segments connecting at vertices and spoke elements extending from a center of the frame structure to the vertices, a gas supply channel coupled to the gas inlet that extends from the handle and branches into channels that run through the spoke elements, and a plurality of nozzles positioned at the vertices on the supporting surface and coupled to the channels in the spoke elements. Gas provided to the plurality of nozzles exits the nozzles in a stream directed parallel to the supporting surface and the stream of gas generates forces that enable wafers to be securely supported in a floating manner over the supporting surface without coming into direct contact with the supporting surface. 1. A semiconductor processing system comprising:a self-cleaning immersion station adapted for immersion a wafer in solvent for removal of material, the immersion station including a first sprayer having a plurality of nozzles positioned to spray the wafer as it is transferred out of the immersion station, and a self-cleaning assembly adapted to spray cleaning fluid on internal surfaces of the immersion station; anda self-cleaning lift-off station adapted to completely remove material from the surface of the wafer and including a) a vacuum-assisted separator adapted to spray solvent at a high pressure spray onto the wafer surface while applying suction in the vicinity of the sprayed wafer surface to capture material dislodged by the spray, and b) at least one cleaning sprayer adapted to clean internal surfaces of the lift-off station.2. The semiconductor processing system of claim 1 , wherein the immersion station includes an opening through which the wafer can be removed from inside the immersion station claim 1 , the first sprayer comprising an elongated bar that is ...

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09-01-2020 дата публикации

SYSTEMS AND METHODS FOR A SPRAY MEASUREMENT APPARATUS

Номер: US20200013650A1
Принадлежит: OEM Group, LLC

Various embodiments of a spray measurement system having a jig device that allows measuring spray output of one or more spray nozzles and determine spray distribution patterns of the spray nozzles are disclosed. 1. A spray measurement system , comprising: the rotor is operable to rotate around a horizontal axis Z,', 'wherein the rotor is operable to rotate in a clockwise or counterclockwise direction A and an opposite clockwise or counterclockwise direction B;, 'a rotor disposed within a batch chemical processing chamber, wherein'} [ a jig device, comprising a plurality of slots, wherein each of the plurality of slots is operable to receive a blocker plate; and', 'one or more channels corresponding with one or more of the plurality of slots, wherein each of the one or more channels is in operative association with a respective pressure transducer for measuring an amount of liquid collected in the channel;', 'wherein the spray measurement apparatus is operable to be rotated between a vertical resting position and a predetermined testing angle by the rotor;, 'the spray measurement apparatus comprising, 'and;, 'a spray measurement apparatus in operative association with the rotor,'}a controller in operative association with the rotor, wherein the controller is operable to rotate the rotor around the horizontal axis Z, wherein the controller is operable to rotate the rotor in the clockwise or counterclockwise direction A and the opposite clockwise or counterclockwise direction B between the vertical resting position and a predetermined testing angle;wherein the spray measurement apparatus is operable to be rotated to a predetermined testing angle and receive an amount of liquid sprayed by a spray nozzle array into the one or more of the channels, wherein a data collection interface is operable to record the amount of liquid collected in each of the one or more channels.2. The system of claim 1 , wherein the spray nozzle array remains in a fixed position angled above the ...

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19-01-2017 дата публикации

MULTI-CYCLE WAFER CLEANING METHOD

Номер: US20170014871A1
Принадлежит:

Methods for cleaning a wafer in semiconductor fabrication are provided. The method includes providing a wafer. The method further includes cleaning the wafer in a first cleaning cycle by supplying a cleaning solution and supplying a first washing liquid mixed with a purge gas in sequence. The method also includes cleaning the wafer in a second cleaning cycle by supplying the cleaning solution and a second washing liquid mixed with the purge gas in sequence. The second cleaning cycle is initiated after the first cleaning cycle is finished. 1. A method comprising:providing a wafer; andperforming a cleaning cycle over the wafer multiple times, wherein each of the cleaning cycles comprises supplying a cleaning solution over the wafer and supplying a washing liquid mixed with a purge gas over the wafer.2. The method as claimed in claim 1 , wherein each of the cleaning cycles are preformed successively claim 1 , and the supply of the cleaning solution and the supply of the washing liquid in two sequential cleaning cycles are alternately performed.3. The method as claimed in claim 1 , wherein each of the cleaning cycles takes the same amount of time to perform.4. The method as claimed in claim 1 , wherein a flow rate of the cleaning solution to the wafer in a second of the cleaning cycles is less than a flow rate of the cleaning solution to the wafer in a first of the cleaning cycles claim 1 , wherein the second of the cleaning cycles is initiated after the conclusion of the first of the cleaning cycles.5. The method as claimed in claim 1 , wherein a time interval for supplying the cleaning solution in a second of the cleaning cycles is less than a time interval for supplying the cleaning solution in a first of the cleaning cycles claim 1 , wherein the second of the cleaning cycles is initiated after the conclusion of the first of the cleaning cycles.6. The method as claimed in claim 1 , wherein a time interval for supplying the washing liquid in a second of the cleaning ...

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19-01-2017 дата публикации

SUBSTRATE PROCESSING SYSTEM AND PIPE CLEANING METHOD

Номер: US20170014873A1
Принадлежит:

A substrate processing system is constituted by a cleaning unit, a plurality of processing liquid supply units and a substrate processing apparatus. The cleaning unit supplies a first cleaning liquid to a processing unit of a processing liquid supply unit during cleaning of a pipe. The processing liquid supply unit stores the first cleaning liquid supplied from the cleaning unit in the processing liquid tank, and then supplies the first cleaning liquid in a processing liquid tank to the processing unit of the substrate processing apparatus through the pipe. The cleaning unit prepares a second cleaning liquid concurrently with cleaning of the pipe by the first cleaning liquid, and supplies the prepared second cleaning liquid to the processing liquid tank. 1. A substrate processing system comprising:a substrate processing apparatus that performs processing on a substrate;a processing liquid supplier that supplies a processing liquid to the substrate processing apparatus through a pipe; anda cleaner, whereinthe processing liquid supplier includes a processing liquid tank that stores the processing liquid during processing of a substrate,the substrate processing apparatus includes a substrate processor that supplies the processing liquid to the substrate during processing of the substrate,the processing liquid tank and the substrate processor are connected to each other by the pipe,the cleaner is configured to, during cleaning of the pipe, supply a first cleaning liquid to the processing liquid tank of the processing liquid supplier, then prepare a second cleaning liquid, and supply the prepared second cleaning liquid to the processing liquid tank, andthe processing liquid supplier is configured to, during the cleaning of the pipe, store the first cleaning liquid supplied from the cleaner in the processing liquid tank, and then clean the pipe by supplying the first cleaning liquid in the processing liquid tank to the substrate processor through the pipe, and store the ...

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21-01-2016 дата публикации

METHOD OF CLEANING SUBSTRATE PROCESSING APPARATUS

Номер: US20160016206A1
Принадлежит:

A spin base is caused to rotate at a number of revolutions of from 250 rmp to 350 rpm (first number of revolutions), and at the same time, a cleaning solution is supplied through a discharge head to a holding surface of a spin base while the upper end of a processing cup surrounding the spin base is placed below the holding surface. Thus, an outer upper surface of the processing cup is cleaned with the cleaning solution scattered from the holding surface. Then, the spin base is caused to rotate at a number of revolutions of from 350 rpm to 450 rpm (second number of revolutions) higher than the first number of revolutions, and at the same time, a cleaning solution is supplied through the discharge head onto the holding surface. Thus, a partition plate outside the processing cup is cleaned with the cleaning solution scattered from the rotating holding surface.

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03-02-2022 дата публикации

OPTICAL CONNECTOR CLEANING TOOL

Номер: US20220035106A1
Принадлежит:

Provided is an optical connector cleaning tool that is unlikely to cause a static charge and can accurately remove dust located on an end surface of an optical connector. Disclosed is an optical connector cleaning tool including: a main body housing a supply holder configured to hold a cleaner that has a contaminant-retainable layer and can be supplied so as to clean an end surface of an optical connector; a cleaning head configured to position the cleaner having been supplied from the main body and be held at a certain holding position with respect to the main body; a controller that can be engaged with the optical connector and can be displaced from a first position to a second position, which is different from the first position, with respect to the cleaning head while kept engaged with the optical connector; and a supply mechanism configured to transmit, to the cleaner, movement of displacing the controller from the first position to the second position to displace and then supply the cleaner to the cleaning head, in which when the controller is positioned at the first position, the cleaning head is apart from the end surface of the optical connector, while the controller is displaced from the first position to the second position, the supply mechanism causes the cleaner to be displaced, and when the controller is positioned at the second position, the cleaning head comes into contact with the end surface of the optical connector. 1. An optical connector cleaning tool , comprising:a main body housing a supply holder configured to hold a cleaner that has a contaminant-retainable layer and can be supplied so as to clean an end surface of an optical connector;a cleaning head configured to position the cleaner having been supplied from the main body and be held at a certain holding position with respect to the main body;a controller that can be engaged with the optical connector and can be displaced from a first position to a second position, which is different from ...

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16-01-2020 дата публикации

Cleaning tool and adhesive body

Номер: US20200016632A1
Принадлежит: Fujikura Ltd

A cleaning tool that cleans an optical connector includes an adhesive body that contacts an optical signal region of the optical connector where an optical signal enters and is emitted from the optical connector. The adhesive body includes a protrusion that protrudes in a region—that contacts the optical signal region.

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17-04-2014 дата публикации

Substrate cleaning apparatus, substrate cleaning method, and computer-readable storage medium

Номер: US20140102474A1
Принадлежит: Tokyo Electron Ltd

A substrate cleaning apparatus for cleaning a substrate back surface includes a first substrate supporting portion supporting the substrate at a first area of the substrate back surface, the back surface facing down; a second substrate supporting portion supporting the substrate at a second area of the substrate back surface, the second area being separated from the first area; a cleaning liquid supplying portion supplying cleaning liquid to the substrate back surface; a drying portion drying the second area of the substrate back surface; and a cleaning portion cleaning a third area of the substrate back surface when the substrate is supported by the first substrate supporting portion, the third area including the second area, and cleaning a fourth area of the substrate back surface when the substrate is supported by the second substrate supporting portion, the fourth area excluding the second area.

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17-04-2014 дата публикации

Method and System for Improving Performance and Preventing Corrosion in Multi-Module Cleaning Chamber

Номер: US20140102488A1
Автор: Kahlon Satbir, MA Frank
Принадлежит: INTERMOLECULAR, INC.

A method and system for cleaning a substrate in a multi-module cleaning assembly is provided. The method begins by receiving the substrate into the cleaning module. A cleaning chemistry, at a temperature elevated from an ambient temperature, is applied onto a top surface of the substrate. Concurrent with application of the cleaning chemistry, vapors are exhausted from the cleaning chemistry through a port located below a bottom surface of the substrate with the vapor exhaustion providing a negative pressure relative to a pressure external to the cleaning module. The application of the cleaning chemistry is terminated, followed by termination of the exhausting of the vapors. The substrate is dried after the flowing of inert gas is terminated. 1. A cleaning assembly , comprising:a bottom cleaning module for performing a spin-rinse-dry operation on a substrate, the bottom cleaning module having a base portion housing a chuck adapted for receiving the substrate;a top cleaning module disposed over the bottom cleaning module, wherein a mid-portion of the cleaning assembly is operable as a base of the top cleaning module and a top of the bottom cleaning module;a component located in the bottom cleaning module for applying a cleaning chemistry onto a top surface of the substrate, wherein the cleaning chemistry is at a temperature higher than ambient temperature; anda port located in the bottom cleaning module below a bottom surface of the substrate and operably connected to a vacuum source for exhausting vapors while the cleaning chemistry is applied.2. The cleaning assembly of wherein the substrate is dried in the bottom cleaning module after terminating the applying of the cleaning chemistry and the exhausting of the vapors.3. The cleaning assembly of wherein the applying of the cleaning chemistry is terminated before the exhausting of the vapors is terminated.4. The cleaning assembly of wherein the port is configured as an annular ring disposed along a lower outer ...

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03-02-2022 дата публикации

METHODS AND APPARATUS FOR CLEANING SUBSTRATES

Номер: US20220037172A1
Принадлежит: ACM Research (Shanghai) Inc.

The present invention discloses a method for cleaning substrate without damaging patterned structure on the substrate using ultra/mega sonic device, comprising: applying liquid into a space between a substrate and an ultra/mega sonic device; setting an ultra/mega sonic power supply at frequency fand power Pto drive said ultra/mega sonic device; after micro jet generated by bubble implosion and before said micro jet generated by bubble implosion damaging patterned structure on the substrate, setting said ultra/mega sonic power supply at frequency fand power Pto drive said ultra/mega sonic device; after temperature inside bubble cooling down to a set temperature, setting said ultra/mega sonic power supply at frequency fand power Pagain; repeating above steps till the substrate being cleaned. 198.-. (canceled)99. An apparatus for cleaning a semiconductor wafer comprising features of patterned structures , the apparatus comprising:a wafer holder configured to hold the semiconductor wafer;an inlet configured to apply liquid on the semiconductor wafer;a transducer configured to deliver acoustic energy to the liquid;a power supply of the transducer; and deliver acoustic energy to the liquid at a first frequency and a first power level for a predetermined first time period, wherein bubble implosion occurs in the first time period, and', 'deliver acoustic energy to the liquid at a second frequency and a second power level for a predetermined second time period,', 'wherein the controller is configured to alternately apply the first and second time periods one after another for a predetermined number of cycles,', 'wherein the first and second time periods, the first and second power levels, and the first and second frequencies are determined such that no feature is damaged as a result of delivering the acoustic energy., 'a controller for the power supply comprising a timer, the controller being configured to control the transducer based on the timer to100. The apparatus of ...

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17-01-2019 дата публикации

CLEANING MACHINE AND BASKET FOR TIMEPIECE OR JEWELLERY COMPONENTS

Номер: US20190018371A1
Принадлежит: Montres Breguet S.A.

Cleaning machine for timepiece or jewellery components, including cleaning baskets with a receptacle including a bottom and a peripheral partition separating the internal volume of the receptacle, and an environment outside the basket, which includes in the bottom or in the peripheral partition, flared holes whose cross-section is smaller towards the receptacle than towards the external environment, the machine including cleaning means and drying means arranged to circulate cleaning or drying fluids through flow orifices and flared holes, and effluent collecting means arranged to collect effluents from the cleaning and drying operations. 1. A cleaning basket for timepiece or jewellery components comprising a receptacle arranged for receiving components , said receptacle including at least a bottom , which is arranged to serve as support surface for said components , and at least one peripheral partition , arranged to retain said components inside said receptacle and defining a separation between the internal volume of said receptacle , and an environment outside said cleaning basket , said basket including a plurality of flow orifices arranged to allow the flow of cleaning and/or drying fluids through said bottom and/or said at least one peripheral partition , wherein said cleaning basket includes , in said bottom and/or in said at least one peripheral partition , a plurality of said flow orifices , which are flared holes , whose cross-section is smaller towards said receptacle than towards said external environment.2. The cleaning basket according to claim 1 , wherein said cleaning basket includes a plurality of said flared holes both in said bottom and in said at least one peripheral partition.3. The cleaning basket according to claim 1 , wherein said cleaning basket is a nested assembly comprising an outer basket arranged to contain at least one other removable inner basket claim 1 , and wherein said outer basket and every inner basket each include a plurality of ...

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22-01-2015 дата публикации

CLEANING APPARATUS

Номер: US20150020853A1
Автор: Maejima Makoto
Принадлежит:

A cleaning apparatus including a holding table for holding a plate-shaped workpiece, a cleaning nozzle for spraying a cleaning fluid to the plate-shaped workpiece, and a table cover for covering a circumference of the holding table. The table cover includes a top plate for covering an upper side of the holding table and a side plate for covering the circumference of the holding table. The table cover is provided with a netlike mesh sheet spaced from a lower surface of the top plate and another netlike mesh sheet spaced from an inner surface of the side plate. 1. A cleaning apparatus comprising:a holding table for holding a plate-shaped workpiece;a motor for rotating said holding table;a cleaning nozzle for spraying a cleaning fluid to said plate-shaped workpiece held on said holding table; anda cover for absorbing said cleaning fluid sprayed from said cleaning nozzle and scattered from said holding table holding said plate-shaped workpiece and rotating at a predetermined speed,said cover including a top plate having an opening for exposing an upper surface of said holding table and a side plate connected to said top plate so as to extend downward therefrom, said top plate being positioned above an upper surface of said plate-shaped workpiece held on said holding table,said side plate being provided with a netlike mesh sheet spaced from an inner surface of said side plate.2. The cleaning apparatus according to claim 1 , wherein said top plate is provided with another netlike mesh sheet spaced from a lower surface of said top plate. 1. Field of the InventionThe present invention relates to a cleaning apparatus for cleaning a surface of a plate-shaped workpiece such as a semiconductor wafer.2. Description of the Related ArtConventionally known is a spinner type cleaning apparatus including a rotatable holding table for holding a wafer and a cleaning nozzle for spraying a cleaning fluid to the wafer held on the holding table being rotated (see Japanese Patent Laid-Open ...

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16-01-2020 дата публикации

FIBER OPTIC CONNECTOR

Номер: US20200018908A1
Автор: Cheng Steve
Принадлежит:

A method of providing fiber optic connectivity including gripping a rotatable coupler of a fiber optic connector at a grip portion thereof, inserting the rotatable coupler into a bulkhead adapter in a straight direction, turning the rotatable coupler in a clockwise or counterclockwise direction to increase a tension of the spring while pushing the rotatable coupler forward, and releasing the rotatable coupler such that the rotatable coupler rotates in a counter clockwise direction and locks the fiber optic connector into the bulkhead adapter. 1. A method of providing fiber optic connectivity , comprising;gripping a rotatable coupler of a fiber optic connector at a grip portion thereof; inserting the rotatable coupler into a bulkhead adapter in a straight direction;turning the rotatable coupler in a clockwise or counterclockwise direction to increase a tension of the spring while pushing the rotatable coupler forward; andreleasing the rotatable coupler such that the rotatable coupler rotates in a counter clockwise direction and locks the fiber optic connector into the bulkhead adapter.2. The method of claim 1 , further comprising releasing the rotatable coupler when the rotatable coupler has rotated in a clockwise or counterclockwise direction and reached a stop point in an alignment groove on the bulkhead adapter.3. The method of claim 1 , further comprising inserting the rotatable coupler into a port of the bulkhead adapter.4. The method of claim 1 , further comprising inserting an alignment token of the rotatable coupler or bulkhead adapter into an alignment groove of an adjoining bulkhead adapter or rotatable coupler.5. The method of claim 1 , further comprising cleaning a front portion of the rotatable coupler when inserting the rotatable coupler into the bulkhead adapter.6. A fiber optic connector assembly claim 1 , comprising:a boot portion connected to a fiber optic cable;a fixed body portion connected to the boot portion;a shrouded coupler connected to the ...

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28-01-2016 дата публикации

Display Surface Cleaning System

Номер: US20160023253A1
Принадлежит: K2Invent LLC

A display surface cleaning system which includes a display surface cleaning assembly which can be utilized discrete from or coupled proximate a user interactive display surface of a device and methods of using such display surface cleaning assembly. 118-. (canceled)19. A method of producing an apparatus for cleaning a display surface of a device , comprising forming an encasement configured to releasably secure to said device having said display surface , said encasement including a container configured to releasably retain a display surface cleaning medium.20. The method of claim 19 , further comprising providing a display surface cleaning medium releasably retained within said container.21. The method of claim 20 , further comprising providing a cleanser contained by said display surface cleaning medium claim 20 , said cleanser compatible with said display surface.22. The method of claim 21 , further comprising overwrapping said display surface cleaning medium with an overwrap.23. The method of claim 22 , wherein said display surface cleaning medium comprises a one-piece display surface cleaning medium.24. The method of claim 22 , wherein said display surface cleaning medium comprises a plurality of display surface cleaning sheets.25. The method of claim 24 , further comprising providing a separation line in said overwrap claim 24 , said overwrap detachable along said separation line to provide a sheet dispensing outlet which allows passage of one or more of said plurality of cleaning medium sheets from said cleaning medium overwrap.26. The method of claim 21 , further comprising coupling a container cover to said container claim 21 , said container cover operating between a closed container condition and an open container condition which allows access to said display surface cleaning medium.27. The method of claim 26 , further comprising coupling a container seal to one of said container and said container cover claim 26 , said container cover and said container ...

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16-01-2020 дата публикации

PLASMA GENERATOR, CLEANING LIQUID PROCESSING APPARATUS, SEMICONDUCTOR DEVICE CLEANING APPARATUS, CLEANING LIQUID PROCESSING METHOD, AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE

Номер: US20200020551A1
Принадлежит:

A plasma generator, a cleaning liquid processing apparatus including the same, a semiconductor cleaning apparatus, and a cleaning liquid processing method are provided. The cleaning liquid processing apparatus comprising a bubble formation section configured to lower a pressure of a mixed liquid obtained by mixing a liquid and a gas to form bubbles in the mixed liquid, a plasma generator connected to the bubble formation section and configured to apply a voltage to the mixed liquid to form plasma in the bubbles formed in the mixed liquid, a mixing section connected to the plasma generator and configured to dissolve radicals included in the plasma into the mixed liquid, and a discharge nozzle connected to the mixing section and configured to discharge the mixed liquid to a wafer. 1. A cleaning liquid processing apparatus comprising:a bubble formation section configured to lower a pressure of a mixed liquid obtained by mixing a liquid and a gas to form bubbles in the mixed liquid;a plasma generator connected to the bubble formation section and configured to apply a voltage to the mixed liquid to form plasma in the bubbles formed in the mixed liquid;a mixing section connected to the plasma generator and configured to dissolve radicals included in the plasma into the mixed liquid; anda discharge nozzle connected to the mixing section and configured to discharge the mixed liquid to a wafer.2. The cleaning liquid processing apparatus of claim 1 , further comprising:a blending section configured to mix the liquid and the gas to form the mixed liquid.3. The cleaning liquid processing apparatus of claim 2 , further comprising:a pump configured to increase the pressure of the mixed liquid disposed inside the mixing section to supersaturate and dissolve the gas into the liquid.4. The cleaning liquid processing apparatus of claim 1 , wherein the plasma generator includes a first electrode and a second electrode claim 1 ,wherein the first electrode is connected to an RF pulse ...

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16-01-2020 дата публикации

METHOD FOR CLEANING SEMICONDUCTOR WAFER AND MANUFACTURING METHOD OF SEMICONDUCTOR WAFER USING THE METHOD FOR CLEANING

Номер: US20200020552A1
Автор: WAKASUGI Katsuro
Принадлежит: SUMCO CORPORATION

Provided is a method for cleaning a semiconductor wafer which can effectively reduce deposits on a main surface of a wafer. A method for cleaning a semiconductor wafer of the present disclosure includes supplying ozone water into a cleaning tank from a lower part of the cleaning tank with the ozone water overflowing from the upper part of the cleaning tank to outside the cleaning tank (first step), subsequently, stopping a supply of the ozone water (second step), subsequently, immersing a semiconductor wafer into the ozone water in the cleaning tank (third step), and subsequently, resupplying the ozone water into the cleaning tank from the lower part of the cleaning tank with the ozone water overflowing again from the upper part of the cleaning tank to outside the cleaning tank (fourth step). 1. A method for cleaning a semiconductor wafer in which the semiconductor wafer is immersed and cleaned in ozone water in a cleaning tank , the method comprising:supplying the ozone water into the cleaning tank from a lower part of the cleaning tank with the ozone water overflowing from an upper part of the cleaning tank to outside of the cleaning tank;subsequently, stopping a supply of the ozone water;subsequently, immersing the semiconductor wafer into the ozone water in the cleaning tank; andsubsequently, resupplying the ozone water into the cleaning tank from the lower part of the cleaning tank with the ozone water overflowing again from the upper part of the cleaning tank to the outside of the cleaning tank.2. The method for cleaning the semiconductor wafer according to claim 1 , wherein a period of time from when the supply of the ozone water is stopped until the ozone water is resupplied is set to 1 second or more to 30 seconds or less.3. The method for cleaning the semiconductor wafer according to claim 2 , wherein a period of time from when the supply of the ozone water is stopped until a lower end of the semiconductor wafer contacts a liquid surface of the ozone water ...

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26-01-2017 дата публикации

Wiping device and stack manufacturing apparatus

Номер: US20170021394A1
Принадлежит: Semiconductor Energy Laboratory Co Ltd

An object is to eliminate a harmful effect when a film is bonded by wiping an adhering sealant ( 30 a ). Characterized is a wiping device ( 200 ) including a stage ( 230 ) that supports a sheet-like member ( 220 ), a wiping means ( 210 ) that wipes an adhering object ( 30 a ) adhering on a peripheral portion of the sheet-like member ( 220 ), a wiping cloth ( 241 ) that is attachably and detachably provided for the wiping means ( 210 ), and a solvent ( 261 ) that adheres to the wiping cloth ( 241 ), in which the wiping means ( 210 ) is provided with the wiping cloth ( 241 ), makes the solvent ( 261 ) adhere to the wiping cloth ( 241 ), and wipes the adhering object ( 30 a ), or a stack manufacturing apparatus ( 1000 ) including such a wiping device ( 200 ).

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10-02-2022 дата публикации

DENUDER

Номер: US20220040740A1
Автор: Shah Raza U.
Принадлежит: MEDTRONIC ADVANCED ENERGY, INC.

A method of denuding bone stock with a denuder, such as a bone stock denuder container, is disclosed. The bone stock is deposited into a wash chamber formed with a curved chamber wall. The bone stock is impacted with a stream of fluid under pressure to separate non-bone tissue from bone. Fluid and non-bone tissue are drained from the wash chamber. 1. A method of denuding bone stock , the method comprising:depositing the bone stock into a wash chamber formed with a curved chamber wall;impacting the bone stock with a stream of fluid under pressure to separate non-bone tissue from bone; anddraining the fluid and non-bone tissue from the wash chamber.2. The method of wherein the curved chamber wall forms the wash chamber configured as a parabolic cylinder.3. The method of comprising impacting the bone stock with a redirection stream of the fluid from the stream of fluid to separate the non-bone tissue from bone.4. The method of wherein the redirection stream is provided from a redirection chamber in fluid communication with the wash chamber.5. The method of wherein a grate separates the wash chamber from the redirection chamber.6. The method of comprising impacting the stream of fluid against the curved chamber wall to form the redirection stream.7. The method of wherein the curved chamber wall includes a redirection wall claim 6 , and the impacting the stream of fluid against the curved chamber wall to form the redirection stream includes impacting the stream of fluid against the redirection wall.8. The method of wherein the stream of fluid includes a sterile water or saline.9. The method of wherein the fluid includes an abrasive or detergent.10. A method of denuding bone stock claim 1 , the method comprising:depositing the bone stock into a container body having wash chamber formed with a curved chamber wall including a grate, the curved chamber wall forming a wash chamber and the grate covering a redirection chamber in the container body; andimpacting the bone stock ...

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28-01-2021 дата публикации

Systems and Methods for Rotating and Translating a Substrate in a Process Chamber

Номер: US20210023591A1
Принадлежит:

Disclosed herein are systems and methods related to a handling system used to move a semiconductor substrate within a process chamber during treatment. The handling system moves the substrate back-and-forth between two locations in an arc-like motion around a pivot point, while simultaneously rotating the substrate around its own center point. 114-. (canceled)15. A method , comprising:positioning a swing-arm to receive a microelectronic substrate within a treatment chamber;placing a microelectronic substrate on a rotation component coupled to the swing-arm;positioning the microelectronic substrate underneath a nozzle(s) disposed within the treatment chamber;exposing the microelectronic substrate to a process treatment comprising a cryogenically cooled fluid;rotating the microelectronic substrate around a center point of the microelectronic substrate; andpivoting the swing-arm back-and-forth around a pivot point.16. The method of claim 15 , wherein the pivoting comprises rotating the swing-arm at an angular velocity that varies based claim 15 , at least in part claim 15 , on a relative location of the fluid nozzle to a center point of the microelectronic substrate.17. The method of claim 15 , wherein the pivoting comprises rotating the swing-aim at an angular velocity between 5 and 50 arc degrees per second.18. The method of claim 15 , wherein rotating comprises rotating the microelectronic substrate at rotation velocity that varies based claim 15 , at least in part claim 15 , on a relative location of the fluid nozzle to a center point of the microelectronic substrate.19. The method of claim 15 , wherein the rotating comprises a rotation velocity between 10 RPM and 300 RPM.20. The method of claim 15 , wherein the pivoting comprises rotating the swing-arm between a first position and a second position claim 15 , wherein the first position and second position are less than 145 degrees apart along an arc-line around the pivot point. The present application claims ...

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24-04-2014 дата публикации

NOZZLE APPARATUS AND METHODS FOR TREATING WORKPIECES

Номер: US20140109939A1
Принадлежит: Dürr Ecoclean GmbH

Nozzle apparatus and methods for treating workpieces are disclosed. An example apparatus includes a nozzle module and a first nozzle chamber disposed within the nozzle module. The first nozzle chamber has a first nozzle opening and is to deliver a relatively high pressure fluid to the first nozzle opening. The example apparatus also includes a second nozzle chamber disposed within the nozzle module and having a second nozzle opening, the second nozzle chamber to deliver a relatively low pressure fluid to a second nozzle opening. A first flow of the low pressure fluid at least partially contacts a second flow of the high pressure fluid. The second flow is directed onto a workpiece. 1. An apparatus for treating workpieces comprising:a nozzle module comprising a module body having a first nozzle chamber, the first nozzle chamber comprising a first nozzle mouth through which an axis extends, the first nozzle mouth having a first nozzle opening, the first nozzle chamber extending in a longitudinal direction along the axis, the first nozzle opening to generate a high-pressure liquid jet in the direction of the axis onto a workpiece, wherein the module body comprises a second nozzle chamber extending in the longitudinal direction;a first device to deliver liquid under relatively high pressure into the first nozzle chamber to generate a high-pressure liquid jet; anda second device to deliver liquid or gaseous fluid under relatively low pressure into a second nozzle chamber to generate a low-pressure fluid jet, wherein the second nozzle chamber comprises a second nozzle mouth to face the workpiece, the second nozzle mouth having a second nozzle opening to generate the low-pressure fluid jet flowing at least partially along and contacting the high-pressure liquid jet.2. The apparatus as defined in claim 1 , wherein the second nozzle opening is coaxial with the axis of the first nozzle chamber to allow the low-pressure fluid jet to at least partially surround the high-pressure ...

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28-01-2016 дата публикации

SUBSTRATE PROCESSING METHOD, SUBSTRATE PROCESSING APPARATUS, AND COMPUTER-READABLE STORAGE MEDIUM STORED WITH SUBSTRATE PROCESSING PROGRAM

Номер: US20160027635A1
Принадлежит:

Disclosed is a substrate processing apparatus (a substrate processing method, and a computer readable storage medium having a substrate processing program stored therein) of cleaning an etched substrate with a polymer removing liquid, in which any of isopropyl alcohol vapor, water vapor, deionized water and isopropyl alcohol, ammonia water, and ammonia water and isopropyl alcohol is supplied to the substrate before the substrate is cleaned with the polymer removing liquid. 1. A substrate processing method of cleaning an etched substrate with a polymer removing liquid ,wherein isopropyl alcohol vapor or water vapor is supplied to the substrate before the etched substrate is cleaned with the polymer removing liquid.2. A substrate processing method of cleaning an etched substrate with a polymer removing liquid ,wherein deionized water and isopropyl alcohol are supplied to the substrate at the same time before the etched substrate is cleaned with the polymer removing liquid.3. The substrate processing method of claim 2 , wherein isopropyl alcohol is solely supplied to the substrate before the deionized water and the isopropyl alcohol are supplied at the same time.4. The substrate processing method of claim 2 , wherein isopropyl alcohol is solely supplied to the substrate after the deionized water and the isopropyl alcohol are supplied at the same time.5. The substrate processing method of claim 3 , wherein a rotation speed of the substrate when the isopropyl alcohol is solely supplied is higher than that of the substrate when the deionized water and the isopropyl alcohol are supplied at the same time.6. The substrate processing method of claim 2 , wherein a ratio of a supply amount of the deionized water and a supply amount of the isopropyl alcohol is 5:1 to 1:1.7. A substrate processing method of cleaning an etched substrate with a polymer removing liquid claim 2 ,wherein ammonia water is supplied to the substrate or ammonia water and isopropyl alcohol are supplied to ...

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28-01-2016 дата публикации

APPARATUS FOR TREATING SURFACES OF WAFER-SHAPED ARTICLES

Номер: US20160027680A1
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A device for processing wafer-shaped articles comprises a closed process chamber. The closed process chamber comprises a housing providing a gas-tight enclosure, a rotary chuck located within the closed process chamber and adapted to hold a wafer shaped article thereon, and an interior cover disposed within said closed process chamber. The interior cover is movable between a first position in which the rotary chuck communicates with an outer wall of the closed process chamber, and a second position in which the interior cover seals against an inner surface of the closed process chamber adjacent the rotary chuck to define a gas-tight inner process chamber. 1. Device for processing wafer-shaped articles , comprising an upper chamber structure that surrounds and supports a rotary chuck , said rotary chuck being adapted to hold a wafer shaped article thereon , and a cover disposed beneath said upper chamber structure and said rotary chuck , said cover comprising at least one drainage channel and a liquid outlet communicating with said at least one drainage channel , said cover being movable relative to said upper chamber structure and said rotary chuck between a first position in which an annular deflector member that extends upwardly above said at least one drainage channel does not seal against a facing surface of said upper chamber structure adjacent said rotary chuck , and a second position in which said annular deflector member seals against an inner surface of said upper chamber structure adjacent said rotary chuck to define a gas-tight process chamber.2. The device according to claim 1 , wherein said cover comprises a base and at least one upstanding wall claim 1 , said base being connected to a shaft that penetrates said cover via a seal that permits relative movement between said shaft and said cover while maintaining gas tightness of said gas-tight process chamber.3. The device according to claim 1 , wherein said cover comprises a plurality of splash guards ...

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29-01-2015 дата публикации

METHOD FOR CLEANSING GLASS SUBSTRATE AND DEVICE FOR PERFORMING THE METHOD

Номер: US20150027490A1
Автор: Sun Shihying

The present invention provides a method for cleansing a glass substrate and a device for performing the method. The method includes: () providing a transport platform () and a glass substrate to be cleansed (); () placing a glass substrate to be cleansed () on the transport platform (); () providing two air blowing devices (); () the two air blowing devices () blowing air flows toward the lass substrate to be cleansed () to have impurities () that are attached to the glass substrate to be cleansed () detached from the glass substrate (); () providing a suction device (), the suction device () comprising an air drawing device () and a magnetic attraction device (); () the air drawing device () drawing air from the glass substrate to be cleansed () and the magnetic attraction device () generating a magnetic attraction force to magnetic impurities on the glass substrate to be cleansed () so as to draw the impurities () attached to the glass substrate to be cleansed () into the suction device (). 1. A method for cleansing a glass substrate , comprising the following steps:(1) providing a transport platform and a glass substrate to be cleansed, the glass substrate to be cleansed having impurities attached thereto, the impurities comprising magnetic impurities and non-magnetic impurities;(2) placing the glass substrate to be cleansed on the transport platform;(3) providing two air blowing devices, the two air blowing devices being spaced from each other and arranged above the transport platform;(4) the two air blowing devices blowing air flows toward the glass substrate to be cleansed to have the impurities that are attached to the glass substrate to be cleansed to detach from the glass substrate;(5) providing a suction device, wherein the suction device comprises an air drawing device and a magnetic attraction device, the air drawing device comprising an air drawing opening arranged between the two air blowing devices, the magnetic attraction device being arranged in the ...

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