СРЕДСТВО ДЛЯ УДАЛЕНИЯ ФОТОРЕЗИСТА ПОСЛЕ ИОННОЙ ИМПЛАНТАЦИИ ДЛЯ ПЕРСПЕКТИВНЫХ ОБЛАСТЕЙ ПРИМЕНЕНИЯ ПОЛУПРОВОДНИКОВ

Изобретение относится к композиции для удаления фоторезиста после ионной имплантации, содержащей: (a) амин, (b) органический растворитель А, и (c) сорастворитель, где содержание воды в композиции составляет менее 0.5 мас. % композиции; амин представляет собой гидроксид четвертичного аммония и присутствует в количестве от 1 до 4 мас. % композиции; органический растворитель А выбран из группы, состоящей из диметилсульфоксида (DMSO), диметилсульфона (DMSO2), 1-метил-2-пирролидинона (NMP), γ-бутиролактона (BLO)(GBL), этилметилкетона, 2-пентанона, 3-пентанона, 2-гексанона и изобутилметилкетона, 1-пропанола, 2-пропанола, бутилового спирта, пентанола, 1-гексанола, 1-гептанола, 1-октанола, этилдигликоля (EDG), бутилдигликоля (BDG), бензилового спирта, бензальдегида, N,N-диметилэтаноламина, ди-н-пропиламина, три-н-пропиламина, изобутиламина, втор-бутиламина, циклогексиламина, метиланилина, о-толуидина, м-толуидина, о-хлоранилина, м-хлоранилина, октиламина, N,N-диэтилгидроксиламина, N,N-диметилформамида ...

ТЕПЛООБМЕННЫЕ КОМПОЗИЦИИ

Изобретение относится к теплообменной композиции, которая может быть использована для замены существующих хладагентов, которые должны иметь пониженный потенциал глобального потепления (ПГП). Теплообменная композиция состоит по существу из от приблизительно 40 до приблизительно 60 вес.% R-152a, от приблизительно 5 до приблизительно 50 вес.% R-134a и от приблизительно 5 до приблизительно 50 вес.% R-1234ze(E). Указанная композиция является зеотропной. Изобретение обеспечивает хладагенты с пониженными показателями ПГП, токсичности и воспламеняемости при повышенном энергетическом выходе, составляющем по меньшей мере 95%, по отношению к отдельному хладагенту. 16 н. и 29 з.п. ф-лы, 1 ил., 9 табл.

ТЕПЛОПЕРЕДАЮЩИЕ КОМПОЗИЦИИ

Изобретение относится к теплопередающей композиции, содержащейE-1,3,3,3-тетрафторпроп-1-ен (R1234ze(E)), 3,3,3 трифторпропен (R-1243zf) и дифторметан (R32). Описывается использование указанной композиции в теплообменнике, в составе вспениваемой композиции, распыляемой композиции, для охлаждения или нагрева изделия, в способах очистки или экстракции материалов, снижения воздействия на окружающую среду продукта эксплуатации существующего хладагента. Предложенная композиция обладает улучшенными характеристиками охлаждения при пониженной огнеопасности и пониженном значении потенциала глобального потепления и может быть подходящей для замены существующих холодильных агентов, у которых эти показатели ниже. 15 н. и 33 з.п. ф-лы, 9 табл.

ТЕПЛОПЕРЕДАЮЩИЕ КОМПОЗИЦИИ

Изобретение относится к области теплопередающих композиций. Теплопередающая композиция содержит по существу из от около 60 до около 85 мас.% транс-1,3,3,3-тетрафторпропена (R-1234ze(E)) и от около 15 до около 40 мас.% фторэтана (R-161). Также изобретение касается теплопередающей композиции, включающей R-1234ze(E), R-161 и 1,1,1,2-тетрафторэтан (R-134a). Изобретение обеспечивает понижение токсичности, горючести и GWP теплопередающей композиции при КПД в пределах 10% от величин, достигаемых при использовании существующих холодильных агентов. 21 н. и 32 з.п. ф-лы, 11 табл., 1 ил.

ТЕПЛОПЕРЕДАЮЩИЕ КОМПОЗИЦИИ, СОДЕРЖАЩИЕ ФТОРАЛКЕНЫ, И СПОСОБ ПЕРЕДАЧИ ТЕПЛА

Изобретение относится к теплопередающим композициям для использования в системах кондиционирования воздуха, включающим, по меньшей мере, один фторалкен формулы II: ! ! где каждый из R независимо означает Cl, F, Br, I или Н; R' означает (СR2)nY; Y означает СF3; и n равно 0 или 1, и где, по меньшей мере, один R у ненасыщенного концевого углерода не является F; и, по меньшей мере, один адьювант. Причем названный фторалкен имеет потенциал глобального потепления (ПГП) не более чем приблизительно 150, количество фторалкена формулы II составляет не менее 50% от веса композиции. Адьювант выбран из группы, состоящей из смазочных материалов, агентов совместимости, поверхностно-активных веществ, солюбилизирующих агентов или комбинации двух или более этих адьювантов. Также изобретение относится к способу передачи тепла к или от воздуха, включающему принудительный фазовый переход у фторалкена формулы II в теплопередающей композиции. Технический результат - снижение термодинамического кпд хладагента ...

КОМПОЗИЦИИ, СОДЕРЖАЩИЕ ФТОРЗАМЕЩЕННЫЕ ОЛЕФИНЫ

... 1. Теплопередающая композиция, включающая, по меньшей мере, один фторалкен формулы I где Х означает ненасыщенный, замещенный или незамещенный С2- или С3-алкильный радикал, R независимо означает Cl, F, Br, I или Н и z равен 1-3, причем эта теплопередающая композиция имеет потенциал глобального потепления (ПГП) не выше приблизительно 150. 2. Теплопередающая композиция по п.1, в которой названный, по меньшей мере, один фторалкен является соединением формулы II где каждый из R независимо означает Cl, F, Br, I или Н; R' означает (CR2)nY; Y означает CRF2; и n равно 0 или 1. 3. Теплопередающая композиция по п.2, где Y означает CF3. 4. Теплопередающая композиция по п.3, где, по меньшей мере, один R у ненасыщенного концевого углерода не является F. 5. Теплопередающая композиция по п.4, где, по меньшей мере, один R у ненасыщенного концевого углерода является водородом. 6. Теплопередающая композиция по п.2, где n равно 0. 7. Теплопередающая композиция по п.2, где Y означает CF3 и n равно 0. 8. Теплопередающая ...

КОМПОЗИЦИИ, СОДЕРЖАЩИЕ ФТОРЗАМЕЩЕННЫЕ ОЛЕФИНЫ

... 1. Вспениваемая композиция, включающая, по меньшей мере, один формирующий пену компонент и вспенивающий агент, содержащий, по меньшей мере, один фторалкен формулы II: ! ! где каждый R независимо означает Cl, F, Br, I или Н; ! R′ означает (CR2)nY; ! Y означает CF3; ! и n равно 0 или 1, и где, по меньшей мере, один R у ненасыщенного концевого углерода является Н и, по меньшей мере, один из остающихся R представляет собой F, причем названный фторалкен имеет потенциал глобального потепления (ПГП) не более чем приблизительно 150. ! 2. Композиция по п.1, в которой вспенивающий агент имеет ПГП не более чем приблизительно 100. ! 3. Композиция по п.1, в которой вспенивающий агент имеет потенциал истощения озонового слоя (ПИОС) не более чем приблизительно 0,05. ! 4. Композиция по п.1, в которой, по меньшей мере, один заместитель у ненасыщенного концевого углерода фторалкена представляет собой F. ! 5. Композиция по п.1, в которой образующий пену компонент содержит, по меньшей мере, полиол. ! 6. Композиция ...

АЗЕОТРОПНАЯ РАСТВОРЯЮЩАЯ КОМПОЗИЦИЯ И СМЕШАННАЯ РАСТВОРЯЮЩАЯ КОМПОЗИЦИЯ

... 1. Азеотропная растворяющая композиция, включающая в себя 62 мас.% 1,1,1,2,2,3,3,4,4,5,5,6,6-тридекафтороктана и 38 мас.% изопропанола. ! 2. Смешанная растворяющая композиция, включающая в себя от 40 до 90 мас.% 1,1,1,2,2,3,3,4,4,5,5,6,6-тридекафтороктана и от 10 до 60 мас.% изопропанола. ! 3. Смешанная растворяющая композиция по п.2, которая дополнительно содержит не более 20%, по крайней мере, одного соединения, выбранного из группы, состоящей из углеводорода, спирта (отличного от изопропанола), кетона, галогензамещенного углеводорода (отличного от 1,1,1,2,2,3,3,4,4,5,5,6,6-тридекафтороктана), простого эфира и сложного эфира. ! 4. Способ очистки готового изделия, которое необходимо чистить, который включает в себя приведение растворяющей композиции, охарактеризованной в п.1, в контакт с готовым изделием, имеющим распространенное на нем масло, с целью удаления масла с готового изделия. ! 5. Способ очистки готового изделия, которое необходимо чистить, который включает в себя приведение ...

Моющее средство

Моющее средство, включающее метиленхлорид, парафин, толуол, муравьиную кислоту, отличающееся тем, что в качестве загустителя содержит ацетобутиратцеллюлозы, при этом, мас.ч.: Метиленхлорид 100-100 Ацетобутиратцеллюлозы 5-10 Парафин 1-2 Толуол 10-10 Муравьиная кислота 5-10 ...

СПОСОБ СТАБИЛИЗАЦИИ СИЛОКСАНОВЫХ СОЕДИНЕНИЙ

... 1. Способ стабилизации силиконовых растворителей для сухой химической чистки, которые могут содержать нежелательные кислотные примеси, способные вызывать образование циклических силоксанов, включающий контактирование силиконового растворителя для сухой химической чистки с адсорбентом, нейтрализующим агентом или их комбинацией, и отделение силиконового растворителя от адсорбента. 2. Способ по п.1, согласно которому количество используемых адсорбента, нейтрализующего агента или их комбинации составляет вплоть до 100 мас.ч. на 100 мас.ч. силиконового растворителя. 3. Способ по п.1, согласно которому растворитель контактирует с адсорбентом, нейтрализующим агентом или их комбинацией в течение от приблизительно 0, 0025 до приблизительно 6 ч. 4. Способ по п.1, согласно которому растворитель контактирует с адсорбентом, нейтрализующим агентом или их комбинацией при температуре от приблизительно 10 до приблизительно 80°С. 5. Способ по п.1, согласно которому адсорбент выбирают из группы, включающей ...

КОМПОЗИЦИЯ ДЛЯ ОЧИСТКИ И ПОЛИРОВАНИЯ ПОВЕРХНОСТИ

Настоящее изобретение относится к композиции для очистки и полирования поверхностей, которая особенно удобна в применении при очистке, полировании и обработке для придания водонепроницаемости поверхностей различных типов материалов с различной поверхностной текстурой и которая может быть использована без предварительной промывки или очистки обрабатываемой поверхности. Композиция содержит примерно от 1,0 до 1,5 об.% гексана, примерно от 0,5 до 0,8 об. % чистой кремнийорганической жидкости, примерно от 1,0 до 2,0 об.% карнаубского воска, примерно от 0,5 до 1,0 об.% растворителя - алифатического гликоля и воду, причем все количества даны по отношению к конечному объему композиции.

УНИВЕРСАЛЬНЫЙ ОЧИСТИТЕЛЬ ТВЕРДОЙ ПОВЕРХНОСТИ ПРЕДМЕТОВ ДОМАШНЕГО ОБИХОДА "ОРГАНИК"

Универсальный очиститель твердой поверхности предметов домашнего обихода "Органик", содержащий этиловый спирт, натриевую соль, отдушку, воду, отличающийся тем, что он содержит указанные компоненты при следующем соотношении, мас. %: Этиловый спирт - 48 - 53 Натрий хлор - 2 - 3,5 Отдушка - 0,2 - 0,7 Вода - До 100 ...

ЖИДКИЙ ПЯТНОВЫВОДИТЕЛЬ

Задачей изобретения является разработка состава пятновыводителя, способного эффективно удалять не только жиромасляные загрязнения, но и загрязнения на основе синтетических эмалей и лаков. Сущность изобретения заключается в том, что жидкий пятновыводитель состоит из хлорсодержащих этилена - перхлорэтилена и сивушного масла при следующем соотношении компонентов, мас. %: перхлорэтилен 60-70; сивушное масло З0-40.

АЗЕОТРОПОПОДОБНЫЕ КОМПОЗИЦИИ 2-ТРИФТОРМЕТИЛ-1,1,1,2-ТЕТРАФТОРБУТАНА И МЕТАНОЛА, ЭТАНОЛА ИЛИ ИЗОПРОПАНОЛА И ИХ ПРИМЕНЕНИЕ

Азеотропоподобные композиции, содержащие 2-трифторметил-1,1,1, 2-тетрафторбутан и метанол, этанол или изопропанол, и необязательно нитрометан, являются стабильными и находят применение в качестве обезжиривающих агентов, а также в качестве растворителей в различных промышленных применениях очистки, включая холодную очистку и обезжиривание в парах панелей печатных схем и сухую чистку.

Эмульсия для промывки пасты шариковых ручек

Моющее средство для очистки плат печатного монтажа от канифольных флюсов

Моющее средство для очистки поверхности изделий радиоэлектронной аппаратуры

Изобретение относится к моющим составам, в частности к моющему средству для очистки поверхности изделий радиоэлектронной аппаратуры. С целью повышения качества очистки поверхности и увеличения продолжительности использования моющего средства в кипящем состоянии оно содержит следующие компоненты, мас.%: этиловый спирт 3,5-4,5 одноатомный спирт C8-C92,5-3,5 нитрометан 0,04-0,06 трихлортрифторэтан до 100. Новый состав улучшает качество очистки, увеличивается продолжительность использования моющего средства /1200 мин/. 1 табл.

Средство для очистки канализационных труб

МОЮЩЕЕ СРЕДСТВО ДЛЯ ОЧИСТКИ РАДИОЭЛЕКТРОННОЙ АППАРАТУРЫ ОТ КАНИФОЛЬНЫХ ФЛЮСОВ

Моющая композиция для очистки металлической поверхности от нагарообразных загрязнений

Способ стабилизации метиленхлорида

Способ стабилизации хлорфторалканов

VERBESSERTE LÖSUNGSMITTELZUSAMMUNSETZUNG

BINÄRE AZEOTROPE ZUSAMMENSETZUNGEN

Reinigende Lösungsmittelzusammensetzung und Verfahren zur Reinigung eines Gegenstandes mit ihr

KÜHLZUSAMMENSETZUNGEN DIE HEXAFLUORPROPAN UND FLUORKOHLENWASSERSTOFF ENTHALTEN

Azeotrope Gemische aus Octamethyltrisiloxan und aliphatischen oder alizyklischen Alkoholen

Verfahren zur Entfettung einer Vielzahl von Objekten.

Verfahren zur Reinigung von Reaktoren

Verfahren zur Behandlung von Geweben durch Wärmeerzeugung

AMMONIAK-FREIE ZUSAMMENSETZUNGEN MIT VERBESSERTER SUBSTRAT-KOMPATIBILITÄT ZUM REINIGEN VON MIKROELEKTRONISCHEN SUBSTRATEN

ZUSAMMENSETZUNG ZUR HARZENTFERNUNG

REINIGUNG VON KUNSTSTOFF-MEHRWEGGEBINDEN ODER KUNSTSTOFFBESCHICHTETEN MEHRWEGGLASGEBINDEN.

SOLVENT COMPOSITION, METHOD OF INHIBITING THE DECOMPOSITION OF 1,1,1-TRICHLOROETHANE AND METHOD OF DEGREASING ARTICLES

Verfahren zum Herstellen von 1-Chlor-3,3,3-Trifluor-1-Propen und 1,3,3,3-Tetrafluorpropen

Bereitgestellt wird ein Verfahren, wobei auch ohne Verwendung eines Feststoffkatalysators ein gewünschtes Isomer von 1-Chlor-3,3,3-trifluor-1-propen und 1,3,3,3-Tetrafluorpropen bei hoher Umsetzungsrate erlangt werden kann. Da kein Feststoffkatalysator verwendet wird, kann auf stabile Weise das gewünschte Isomer von 1-Chlor-3,3,3-trifluor-1-propen und 1,3,3,3-Tetrafluorpropen erlangt werden, ohne dass die Sorge einer Degradation des Feststoffkatalysators wie etwa eines Verkokens des Feststoffkatalysators im Laufe der Zeit besteht.

REINIGUNGSVERFAHREN

Lösungsmittel-Reinigung von Gegenständen

AZEOTROPÄHNLICHE ZUSAMMENSETZUNGEN VON PENTAFLUORMETHAN, 1,1,1-TRIFLUORÄTHAN UND CHLORDIFLUORMETHAN.

Verfahren zur Entfernung von feinkörnigen Teilchen aus Fluoroharzgegenständen

Verfahren zum Gaengigmachen schwer beweglicher Lager

Machine cleansing agent

A biologically decomposible cold cleanser comprises essentially: (a) 5-20% by wt. of a monohydric aliphatic alcohol completely miscible with water, (b) 30-60% by wt. of a monohydric aliphatic alcohol partially sol. in water, (c) 20-30% by wt. of solvent miscible with alcohols of (a) and (b) and insol. or only slightly sol. in water, and (d) 5-20% by wt. of a biologically decomposible emulsifier. The cold cleansers are used in cleaning machinery of dirt, oil and fats, and have the advantage that they decompose rapidly and do not present a health hazard to operating personnel.

Fluessiges Reinigungsgemisch fuer Becken u.dgl.

Photoresist-Strippermittel und Verfahren zum Strippen von Photoresistaufträgen unter Verwendung des Mittels

Es werden ein Photoresist-Strippermittel und ein Verfahren zum Entfernen von Photoresistmaterial bzw. ein Photoresist-Strippverfahren unter Verwendung des genannten Mittels vorgeschlagen. Das Photoresist-Strippermittel wird von einer Mischung aus Aceton, gamma-Butyrolakton und Ester-Lösungsmittel gebildet. Das Photoresist-Strippverfahren umfaßt das Aufsprühen eines Photoresist-Strippermittels aus einer Mischung von Aceton, gamma-Butyrolakton und Ester-Lösungsmittel auf ein Substrat bei Rotierenlassen des Substrates mit verhältnismäßig niedriger Geschwindigkeit, so daß das Photoresistmaterial von dem Substrat entfernt wird. Die Rotation des Substrates wird für eine kurze Zeitdauer angehalten und das Photoresist-Strippermittel wird über das Substrat gesprüht, während sich dieses mit verhältnismäßig hoher Drehzahl dreht. Dann wird das Substrat mit reinem Wasser abgespült.

NICHTKORROSIVE ABBEIZ- UND REINIGUNGSZUSAMMENSETZUNG

KEIMTÖTENDE SAURE REINIGUNGSMITTEL FÜR HARTE OBERFLÄCHEN

DAMPFENTFETTUNGSVERFAHREN UND LOESUNGSMITTELGEMISCH HIERFUER

FABRIC CLEANING COMPOSITIONS FOR CLAY-BASED STAINS

REINIGUNGSMITTEL, INSBESONDERE FUER LEICHTMETALLE

VERFAHREN UND SILOXAN ENTHALTENDE ZUSAMMENSETZUNG ZUM CHEMISCHEN TROCKENREINIGEN

VERFAHREN ZUR HERSTELLUNG VON OCTAFLUOROPROPAN

ZUSAMMENSETZUNGEN VON 1,1,1,3,3-PENTAFLUORPROPAN UND TRANS-1,2-DICHLORETHYLEN

Mischung auf Basis von 1,1,1,3,3-Pentafluorbutan, Methylenchlorid und Methanol, zum Reinigen und/oder Trocknen von Feststoffoberflächen

HAUTREINIGUNGSMITTEL

Verfahren und Vorrichtung zum Flüssigreinigen von Gegenständen

Bei einem Flüssigreinigungsverfahren werden Gegenstände zunächst mit Reinigungsflüssigkeit gereinigt und dann mit Spülflüssigkeit gespült. Die Reinigungsflüssigkeit und die Spülflüssigkeit haben zumindest annähernd die gleiche Zusammensetzung und enthalten neben Wasser eine organische Komponente, derart und in einer Konzentration, dass die organische Komponente in gewissen Konzentrationen in Wasser löslich ist und die Flüssigkeit bei der bei der Reinigung herrschenden Temperatur im Zustand einer Mischungslücke mit einer wasserreichen kontinuierlichen Phase mit darin enthaltenen Tröpfchen einer organikreichen Phase vorliegt. Die die Reinigungsflüssigkeit und die Spülflüssigkeit bildende reinigungsaktive Flüssigkeit wird nach der Reinigung von Verschmutzungen befreit und erneut als Spülflüssigkeit bzw. Reinigungsflüssigkeit verwendet.

METHYLENCHLORID-MISCHUNG

REINIGUNGSMITTEL FÜR MIKROELEKTRONIK-SUBSTRATE

Acidic hard-surface antimicrobial cleaner

PROPYLENE GLYCOL CYCLOHEXYL ETHER DERIVATIVES,METHOD OF PRODUCING SAME AND USES THEREOF

Process and apparatus for contacting vaporized hydrocarbons with fluidised finely divided solid catalyst

In processes for the catalytic conversion of hydrocarbon vapours in presence of a fluidized solid catalyst, reduction in the size of the apparatus and improved conversion ratios are obtained by arranging the conventional cyclone catalyst separators inside the reaction or regeneration zones and discharging them by gravity by pipes dipping into a fluidized catalyst bed, the level of which is lower than that of the catalyst bed in the reactor or regenerator. The reactor 2 is divided by a sector plate 3 into reaction and stripping zones. Catalyst dust entrained in the gaseous reaction products is removed therefrom in a conventional two-stage cyclone separator 4, 5 and the separated catalyst is discharged by gravity through a pipe 8 into the catalyst bed in the stripping zone, the level of which is maintained lower than that in the reactor. The regenerator 1 is similarly constructed. The construction enables the height of the sector 3 to be increased, thus enabling the height ...

Honeycomb core degreasing method

Composition comprising 1,1,1,3,3-pentafluorobutane, methylene chloride and methanol, for the cleaning and/or drying of solid surfaces

To replace cleaning compositions based on 1,1,2-trichloro-1,2,2-trifluoroethane (F113), the invention provides a composition comprising, by weight, 30 to 69% 1,1,1,3,3-pentafluorobutane (F365-mfc), 30 to 60% methylene chloride and 1 to 10% methanol. These three compounds form a positive azeotrope (B.p.=32.1 DEG C. at normal pressure). The composition, optionally stabilized, can be used for the cleaning and/or the drying of solid surfaces, in particular for removing flux from printed circuits and for degreasing mechanical components.

Improvements in cleaning or polishing operations

Lacquered, varnished, or other surfaces are cleaned and/or polished by a -chlornaphthalene alone or mixed with resins, waxes, or other polishing-agents or with solvents or diluents, e.g. liquid aromatic hydrocarbons or their halogen derivatives.

Azetrope-like compositions of 1,1,2-trichloro-1,2,2-trifluoroethane,methanol,nitromethane,1,2-dichloroethylene and hexane

Azeotrope-like compositions comprising 1,1,2-trichloro-1,2,2-trifluoroethane, methanol, nitromethane, 1,2-dichloroethylene and hexane. These mixtures are useful in a variety of vapor degreasing applications and as solvents in variety of industrial cleaning applications including defluxing of printed circuit boards.

Composition for removing petroleum sludges from vessels

PCT No. PCT/FR81/00168 Sec. 371 Date Aug. 16, 1982 Sec. 102(e) Date Aug. 16, 1982 PCT Filed Dec. 23, 1981 PCT Pub. No. WO82/02177 PCT Pub. Date Jul. 8, 1982.A composition for recovering and upgrading sludge that accumulates in vessels for storing and transporting petroleum products comprises a solvent made up of at least one aliphatic hydrocarbon and at least one aromatic monohalogenated hydrocarbon of the benzene or naphthalene type, together with a demulsifying and dispersing agent that is an aliphatic straight-chain oxyethylated amineated derivative or a quaternary ammonium compound having at least one alkyl and at least one aryl residue in the form of thiocyano derivative. The composition is dissolved in a hydrocarbon in a proportion of from 2 to 10% by weight, the resulting solution is projected on to the residues at a pressure of from 2 to 15 bars, and the resulting suspension is recycled, recovered, and treated like crude oil. The invention is applied to the recovery and upgrading ...

Electrical contact cleaner

Process for cleaning rigid articles

The invention comprises a process for cleaning articles made from rigid material with the aid of a chlorinated hydrocarbon wherein the articles are treated with a mixture which contains water, ammonia or a substance that yields ammonia and oleic acid in addition to the chlorinated hydrocarbon. The articles may be pretreated with a chlorinated hydrocarbon alone to remove fatty contaminants and any residual cleaning mixture that adheres to the surface of the articles may be removed by one or more after-treatments with a chlorinated hydrocarbon in either the liquid state or the vapour state.ALSO:A process for cleaning metal articles with the aid of a chlorinated hydrocarbon, comprises treating the article with a mixture which contains water, ammonia or a substance that yields ammonia, and oleio acid in addition to the chlorinated hydrocarbon. The articles may be pretreated with a chlorinated hydrocarbon alone to remove fatty contaminants and any residual cleaning mixture may be removed by ...

SOLVENT MIXTURES

SOLVENT COMPOSITIONS

... 1333588 Solvents containing tetrachlorodifluoroethane IMPERIAL CHEMICAL INDUSTRIES Ltd 27 Sept 1971 [5 Oct 1970] 47148/70 Heading C5D A composition for cleaning articles, especially printed circuit boards contaminated with soldering flux, comprises a solvent composition which is liquid at normal room temperature and which comprises a mixture of tetrachlorodifluoroethane with 1-4-dioxan, containing at least 75% by wt. of the tetrachlorodifluoroethane. An azeotropic mixture containing 89À5% by wt. of 1,1,2,2-tetrachloro-1,2-difluoroethane and 10À5% by wt. of 1,4-dioxan is preferred. Optional additions are cationic, anionic and nonionic surfactants (unspecified).

Cleaning process and apparatus

Process for cleaning textile materials

Textile materials, e.g. materials made from polymers and copolymers of acrylonitrile, cellulose triacetate or polypropylene, are cleaned and degreased by immersing them in trichlorotrifluoroethane, removing surplus solvent and then passing them into an aqueous bath maintained at such a temperature as produces rapid evaporation of the solvent. The materials may be treated with the trichlorotrifluoroethane at 40 DEG -50 DEG C. for 10-60 seconds and the aqueous bath may be maintained at a temperature of 45 DEG -55 DEG C.

STABILIZATION OF 1,1,1-TRICHLOROETHANE

Method for removing tacky adhesives and articles adhered therewith

Tacky adhesives are removed from a substrate by a non-stinging, non-drying, non-staining, non-solvent process. The process uses a volatile methylsiloxane fluid to detackify the adhered adhesive, after which it is easily removed. This process is particularly useful for removing tacky adhesives from the human skin. A highly preferred volatile methylpolysiloxane fluid is octamethylcyclotetrasiloxane.

METHOD OF CLEANING ARTICLES CONTAMINATED WITH TONER AND AN ORGANIC SOLVENT COMPOSITION THEREFOR

... 1526214 Organic solvent cleaning composition IMPERIAL CHEMICAL INDUSTRIES Ltd 30 April 1976 [29 May 1975 (2)] 23433/75 and 23436/75 Heading C5D A composition for cleaning articles contaminated with xerographic toner comprises a major proportion of trichlorotrifluoroethane and a minor proportion of acetone. The composition may also include methylol.

PROCESS FOR CLEANING SPINNERETS

TRICHLOROTRIFFLUOROETHANE SOLVENT COMPOSITIONS

... 1307433 Cleaning solvent IMPERIAL CHEMICAL INDUSTRIES Ltd 21 June 1971 [7 July 1970] 32948/70 Heading C5D The cleaning properties of trichlorotrifluorol ethane are enhanced by mixing it with ethano- and acetonitrile. The preferred isomer is 1,1,2- trichloro-1,2,2-trifluoroethane and the preferred mixture is an azeotropic one. In an example, a printed circuit board is cleaned of soldering flux by immersion in the boiling solvent mixture.

COMPOSITION USED TO REMOVE LABELS

COMPOSITION USED TO REMOVE LABELS

COMPOSITION USED TO REMOVE LABELS

PROCEDURE AND DEVICE FOR DEGREASING

CLEANING AGENT

AMMONIA-FREE COMPOSITIONS WITH IMPROVED SUBSTRATE COMPATIBILITY FOR CLEANING MICROELECTRONIC SUBSTRATES

TEXTILE CARE COMPOSITIONS AND SYSTEMS FOR THE PROCUREMENT OF A PURE CARBON ELIMINATION SMELL DURING A TREATMENT PROCEDURE OF MEANS OF A LIPOPHILIC LIQUID

COMPOSITIONS AND PROCEDURES FOR THE TREATMENT OF SURFACES

CLEANING AGENT

AZEOTROPI OR AZEOTROPÄHNLICHE COMPOSITIONS AND YOUR USES

STABILIZED DRAW MEANS ON THE BASIS OF PERCHLORATHYLEN

STABILIZED 1,1,1-TRICHLORAETHAN AND PROCEDURE FOR ITS PRODUCTION

COMPOSITION FROM 1,1,1,2 TETRAFLUORETHAN AND DIMETHYLETHER

MEANS FOR THE DISTANCE OF WATER FROM A SUBSTRATE, PROCEDURE FOR THE WATER DISTANCE AND DRYING PROCEDURE THEREBY

LACQUER REMOVER FOR THE MODEL CONSTRUCTION

AZEOTROP SIMILAR COMPOSITION OF 1,2-DICHLOR-3,3,3-TRIFLUORPROPEN AND HYDROGEN FLUORIDE

PROCEDURE FOR THE OIL SOLUTION AT LOW TEMPERATURES

SOLVENT COMPOSITIONS FOR THE DISTANCE OF OIL ARREARS OF A SUBSTRATE AND A USE PROCEDURE FOR IT

NANOELEKTRONIKUND MICROELECTRONICS CLEANING AGENT

N-PROPYL-BROMIDe-COMPOSITION

CLEANING SOLUTION

PROCEDURE FOR THE PRODUCTION OF A LIQUID COMPOSITION OF A VERY MUCH PURE ORTHODIHYDROXY BENZENE CONNECTION AS WELL AS THE RECEIVED COMPOSITION

AZEOTROPARTIGE COMPOSITIONS, THE HEXADECIMAL FLUORINE PROPYLENE DIMER CONTAINING, AND USE OF IT

SOLVENT COMPOSITION FOR REMOVING RADIOACTIVE SUBSTANCE AND REMOVING MATERIAL, AND METHOD FOR REMOVING RADIOACTIVE SUBSTANCE

The present invention relates to a solvent composition for removing radioactive substance, characterized by comprising at least one selected from hydrofluorocarbon, hydrofluoroether, and perfluoroketone as a medium for transporting the radioactive substance, and a method for removing a radioactive substance characterized by using the solvent composition for removing. 1. A method for removing a radioactive substance , by using a solvent composition which consists essentially of: hydrofluorocarbon or hydrofluoroether as a vehicle for transporting the radioactive substance.2. A method for removing a radioactive substance , by using a solvent composition which consists essentially of: hydrofluorocarbon as a vehicle for transporting the radioactive substance , wherein said hydrofluorocarbon is CHF , CHF , c-CHF , or CHF.3. The method for removing a radioactive substance according to claim 2 , wherein the solvent composition further comprises 3 to 15% by weight of ethanol based on the total weight of the removal solvent composition.4. A method for removing a radioactive substance claim 2 , by using a solvent composition which consists essentially of: hydrofluoroether as a vehicle for transporting the radioactive substance claim 2 , wherein said hydrofluoroether is CFOCH claim 2 , CFOCH claim 2 , CHFOCHF claim 2 , or F(CF(CF)CFO)CHFCF. This application claims priority to U.S. patent application Ser. No. 11/997,278, filed on Jan. 29, 2008, which is a United States national stage of Patent Cooperation Treaty application PCT/JP2005/013941, filed on Jul. 29, 2005, the contents of which are hereby incorporated by reference.1. The Field of the InventionThe present invention relates to a method for simply removing a low-concentration radioactive substance, a removing material suitable for the method, and a solvent composition for removing.2. The Relevant TechnologyAt present, it is considered that materials exposed to radiation in nuclear power plants or the like can be subjected ...

LIQUID CONCENTRATE FOR CLEANING COMPOSITION, CLEANING COMPOSITION AND CLEANING METHOD

Provided is a liquid concentrate for cleaning composition which could exhibit excellent environmental safety etc. by adding afterward a predetermined amount of water, and also has excellent regeneration efficiency, and provided are a cleaning composition and a cleaning method thereof. Disclosed is a liquid concentrate for cleaning composition which is used as a mixture with water and is intended for cleaning an object to be cleaned in a clouded state, with a predetermined amount of water having been added thereto, the liquid concentrate for cleaning composition including, a first organic solvent which is a predetermined hydrophobic glycol ether compound or the like, and a second organic solvent which is a predetermined hydrophilic amine compound. 1. A liquid concentrate for cleaning composition for cleaning intended for being used as a mixture with water and also for cleaning an object to be cleaned in a clouded state with an amount of water which is a value in the range of 50 to 1900 parts by weight relative to 100 parts by weight of the liquid concentrate for cleaning composition ,the liquid concentrate for cleaning composition comprising, as organic solvents, at least a first organic solvent and a second organic solvent,wherein the first organic solvent is at least one compound selected from the group consisting of a hydrophobic glycol ether compound, a hydrophobic hydrocarbon compound, a hydrophobic aromatic compound, a hydrophobic ketone compound and a hydrophobic alcohol compound, which has a boiling point in the range of 140° C. to 190° C. and a solubility in water (measurement temperature: 20° C.) of 50% by weight or less;the second organic solvent is a hydrophilic amine compound having a boiling point in the range of 140° C. to 190° C. and a solubility in water (measurement temperature: 20° C.) of greater than 50% by weight;the amount of incorporation of the second organic solvent is adjusted to a value in the range of 0.3 parts to 30 parts by weight ...

NON-AQUEOUS CLEANING LIQUID AND CLEANING METHOD

A non-aqueous cleaning liquid which is used for cleaning an ink flow path, through which a non-aqueous ink is circulated, in an ink jet recording apparatus including the ink flow path and with which a container composed of polyolefin is filled, includes a pigment and an organic solvent. In the non-aqueous cleaning liquid, a content of the pigment is 0.001% by mass to 0.5% by mass and an average particle size (d50) of the pigment is 10 nm to 500 nm. 1. A non-aqueous cleaning liquid which is used for cleaning an ink flow path , through which a non-aqueous ink is circulated , in an ink jet recording apparatus including the ink flow path and with which a container composed of polyolefin is filled , the non-aqueous cleaning liquid comprising:a pigment; andan organic solvent.2. The non-aqueous cleaning liquid according to claim 1 ,wherein a content of the pigment is 0.001% by mass to 0.5% by mass.3. The non-aqueous cleaning liquid according to claim 1 ,wherein an average particle size (d50) of the pigment is 10 nm to 500 nm.4. The non-aqueous cleaning liquid according to claim 1 ,wherein the pigment is an organic pigment.5. A method of cleaning an ink flow path claim 1 , through which a non-aqueous ink is circulated claim 1 , in an ink jet recording apparatus including the ink flow path claim 1 , the method comprising:{'claim-ref': {'@idref': 'CLM-00001', 'claim 1'}, 'circulating the non-aqueous cleaning liquid according to through the ink flow path,'}{'sup': 2', '2, 'wherein the ink flow path includes a region which has a cross-sectional surface area of 100 μmto 1000 μmperpendicular to a circulation direction of the non-aqueous ink.'}6. A method of cleaning an ink flow path claim 1 , through which a non-aqueous ink is circulated claim 1 , in an ink jet recording apparatus including the ink flow path claim 1 , the method comprising:{'claim-ref': {'@idref': 'CLM-00002', 'claim 2'}, 'circulating the non-aqueous cleaning liquid according to through the ink flow path,'}{'sup ...

HEAT TRANSFER COMPOSITIONS

The invention provides a heat transfer composition consisting essentially of from about 60 to about 85% by weight of trans-1,3,3,3-tetrafluoropropene (R-1234ze(E)) and from about 15 to about 40% by weight of fluoroethane (R-161). The invention also provides a heat transfer composition comprising R-1234ze(E), R-161 and 1,1,1,2-tetrafluoroethane (R-134a). 1. A heat transfer composition consisting essentially of from about 60 to about 85% by weight of trans-1 ,3 ,3 ,3-tetrafluoropropene (R-1234ze(E)) and from about 15 to about 40% by weight of fluoroethane (R-161).2. A composition according to claim 1 , consisting essentially of from about 65 to about 82% by weight of R-1234ze(E) and from about 18 to about 35% by weight of R-161.3. A heat transfer composition comprising R-1234ze(E) claim 1 , R-161 and 1 claim 1 ,1 claim 1 ,1 claim 1 ,2-tetrafluoroethane (R-134a).4. A composition according to comprising up to about 50% by weight of R-134a.5. A composition according to comprising from about 4 to about 20% by weight R-161 claim 4 , from about 25 to about 50% R-134a claim 4 , and from about 30 to about 71% by weight R-1234ze(E).6. A composition according to claim 3 , consisting essentially of R-1234ze(E) claim 3 , R-161 and R-134a.7. A composition according to claim 1 , wherein the composition has a GWP of less than 1000 claim 1 , preferably less than 150.8. A composition according to claim 1 , wherein the temperature glide is less than about 10K claim 1 , preferably less than about 5K.9. A composition according to claim 1 , wherein the composition has a volumetric refrigeration capacity within about 15 of the existing refrigerant that it is intended to replace.10. A composition according to claim 1 , wherein the composition is less flammable than R-161 alone or R-1234yf alone.12. A composition according to which has a fluorine ratio (F/(F+H)) of from about 0.42 to about 0.7 claim 1 , preferably from about 0.46 to about 0.67.13. A composition according to which is non- ...

COMPOSITIONS CONTAINING CHLOROFLUOROOLEFINS OR FLUOROOLEFINS

Compositions and methods based on the use of fluoroalkene containing from 3 to 4 carbon atoms and at least one carbon-carbon double bond, such as HFO-1214, HFO-HFO-1233, or HFO-1354, having properties highly beneficial in foaming and blowing agent applications, articles and methods. 1. A method for forming a foam comprising: {'br': None, 'sub': z', '3−z, 'XCFR\u2003\u2003(I)'}, 'providing a foamable composition comprising a blowing agent comprising at least one compound according to Formula I'}{'sub': 2', '3, 'where X is a Cor a Cunsaturated, chlorine and/or fluorine substituted alkyl group, each R is independently Cl, F, Br, I or H, and z is 1 to 3, said compound having an acute toxicity level substantially less than the acute toxicity level of HFO-1223xd, said compound(s) in accordance with Formula I being present in said blowing agent in an amount of at least about 50% by weight.'}2. The method of wherein z is at least 2.3. The method of wherein z is 3.4. The method of wherein said compound has an acute toxicity level at least about 30 relative percent less than the acute toxicity level of HFO-1223xd.5. The method of wherein said compound comprises 1-chloro-3 claim 1 ,3 claim 1 ,3-trifluoropropene (HFO-1233zd).6. The method of wherein said blowing agent further comprises at least one haloolefin selected from the group consisting of dichloro-tetrafluoro-propene and tetrafluorobutene and combinations of these.7. The method of wherein said blowing agent further comprises at least one co-blowing agent selected from the group consisting of include linear claim 1 , branched and cyclic hydrocarbons claim 1 , halocarbons claim 1 , alcohols claim 1 , ketones claim 1 , esters claim 1 , ethers claim 1 , and acetals.8. The method of wherein said co-blowing agent is an alcohol selected from the group consisting of methanol claim 7 , ethanol claim 7 , propanol claim 7 , isopropanol claim 7 , and butanol.9. A foam formed by the method of .10. A blowing agent comprising at least ...

Methods For Cleaning Articles Using N-propyl Bromide Based Solvent Compositions

Methods for cleaning articles using n-propyl bromide-based solvent compositions are provided. According to one method, an article to be cleaned is contacted with a solvent composition comprising about 50 weight percent to about 99 weight percent n-propyl bromide and about 0.5 weight percent to about 50 weight percent of an alcohol. Such methods remove at least one of water or water soluble contaminants. Such methods are useful as a degreaser and/or cleaner in both cold cleaning and hot rinsing systems for cleaning articles. 1. A method of cleaning an article , the method comprises contacting the article with a solvent composition comprising n-propyl bromide ranging from about 50 weight percent to about 99 weight percent and an alcohol ranging from about 0.5 weight percent to about 50 weight percent for removing at least one of water or water soluble contaminants.2. The method of wherein the concentration of n-propyl bromide ranges from about 70 weight percent to about 98 weight percent.3. The method of wherein the alcohol is an aliphatic monohydric alcohol.4. The method of wherein the alcohol is selected from a group consisting of 1-propanol claim 1 , isopropyl alcohol claim 1 , 1-butanol claim 1 , 2-butanol claim 1 , isobutyl alcohol claim 1 , tertiary butyl alcohol claim 1 , 1-heptanol claim 1 , 1-hexanol and pentanol claim 1 , including mixtures thereof.5. The method of wherein the concentration of the said alcohol ranges from about 2 weight percent to about 30 weight percent.6. The method of wherein the article is selected from a group consisting of metal products claim 1 , glass products claim 1 , plastics claim 1 , polymeric substrates claim 1 , electronic components or articles claim 1 , and combinations thereof.7. The method of cleaning of which is selected from vapor degreasing claim 1 , cold cleaning claim 1 , hand wipes claim 1 , aerosols and sprays.8. The method of wherein the article is contacted with the said solvent by dipping in a sump filled with ...

ENVIRONMENTALLY-FRIENDLY SOLVENT FOR WASHING AND DRY-CLEANING, AND LAUNDRY COMPOSITION INCLUDING THE SAME

The present invention relates to a solvent for cleaning textiles or clothes. The present invention provides a solvent for cleaning which has a specified formula that is safe on the human body and environment, as well as good cleaning ability against oil-based and water-based contaminants and can be quickly dried. The solvent of the present invention and a composition comprising the same can be effectively used to water clean or dry clean textiles or clothes at home. 2. The solvent of claim 1 , wherein Rand Rare each methyl claim 1 , and Ris hydrogen.3. The solvent of claim 1 , wherein Rand Rare methyl and ethyl claim 1 , respectively claim 1 , and Ris hydrogen.4. The solvent of claim 1 , wherein Rand Rare methyl and isobutyl claim 1 , respectively claim 1 , and Ris hydrogen.5. The solvent of claim 1 , wherein Rand Rare butyl and hydrogen claim 1 , respectively claim 1 , and Ris hydrogen.6. A composition for cleaning textiles or clothes claim 1 , comprising the solvent of .7. The composition of claim 6 , which is used for dry-cleaning.8. The composition of claim 6 , which further comprises water.9. The composition of claim 8 , wherein water is present in an amount of 20 wt % or less based on the total weight of the composition.10. A method of cleaning textiles or clothes claim 1 , characterized by using the solvent of . The present invention relates to a solvent for cleaning, e.g., water-cleaning and dry-cleaning of textiles and clothes, and a composition for water-cleaning or dry-cleaning, which comprises the solvent.This application claims priority to Korean Patent Application No. 10-2011-0020345 filed in the Republic of Korea on Mar. 8, 2011, the entire contents of which are incorporated herein by reference.This application also claims priority to Korean Patent Application No. 10-2011-0108903 filed in the Republic of Korea on Oct. 24, 2011, the entire contents of which are incorporated herein by reference.The cleaning process of textiles and clothes generally ...

Preparations for All-Purpose Cleaning Compositions

Multi-purpose cleaning compositions, in particular multi-purpose aqueous alkaline compositions for cleaning surfaces, and base preparations for this purpose. Such base preparations comprise one or more solvents that are at least partially water-miscible, one or more alkali metal salts of carboxylic acids, and water. Such multi-purpose cleaning compositions comprise at least such base preparation, a surfactant, a basifying agent, and water. 2. The aqueous base preparation according to claim 1 , further comprising at least one cosolvent selected from the group consisting of dioxolane derivatives claim 1 , glycol ethers claim 1 , alcohols claim 1 , and glycols.3. The aqueous base preparation according to claim 2 , wherein said cosolvent is selected from the group consisting of glycol monoethers claim 2 , glycol diethers claim 2 , glycol triethers claim 2 , C1-C6 alcohols claim 2 , and C2-C6 glycols.4. The aqueous base preparation according to claim 1 , wherein said dioxolanes are the result of a reaction between glycerol and aldehydes or ketones.5. The aqueous base preparation according to claim 1 , wherein said solvent is a dioxolane selected from the group consisting of 2 claim 1 ,2-dimethyl-1 claim 1 ,3-dioxolane-4-methanol claim 1 , 2 claim 1 ,2-diisobutyl-1 claim 1 ,3 -dioxolane-4-methanol claim 1 , 2-isobutyl-2-methyl-1 claim 1 ,3-dioxolane-4-methanol claim 1 , 2-butyl-2-ethyl-1 claim 1 ,3-dioxolane-4-methanol claim 1 , and 2-phenyl- 1 claim 1 ,3-dioxolane-4-methanol.6. The aqueous base preparation according to claim 2 , wherein said cosolvent is a glycol ether selected from the group consisting of:ethylene glycol monobutyl (or n-butyl or t-butyl) ether;ethylene glycol monoethyl ether;ethylene glycol monopropyl (or isopropyl) ether;ethylene glycol monophenyl ether;ethylene glycol monobenzyl ether;ethylene glycol hexyl ether;diethylene glycol monoethyl ether;diethylene glycol mono-n-butyl ether;diethylene glycol diethyl ether;diethylene glycol dimethyl ether; ...

COMPOSITIONS OF HYDROCHLOROFLUOROOLEFINS

The present invention relates to solvent/cleaner and heat transfer fluid compositions comprising at least one hydrochlorofluoroolefin (HCFO), 1-chloro-3,3,3-trifluoropropene (HCFO-1233zd), particularly the trans-isomer. The HCFO of the present invention can be used in combination with co-agents including, hydrofluorocarbons (HFCs), hydrofluomolefins (HFOs), hydrocarbons, ethers including hydrofluoroethers (HFEs), esters, ketones, alcohols, 1,2-transdichloroethylene and mixtures thereof. 1. A solvent/cleaner composition comprising the hydrochloroolefin 1233zd and an alcohol wherein the hydrochlorafluorolefin 1233zd comprises about 70 wt % or more the trans steroisomer of hydrochloroolefin. 1233zd.2. The solvent/cleaner composition of wherein said hydrochlorofluoroolefin 1233zd comprises about 90 wt % or more said trans stereoisomer.3. The solvent/cleaner composition of wherein said hydrochlorofluoroolefin 1233zd comprises about 97 wt % or more said trans stereoisomer.4. The solvent/cleaner composition of wherein said alcohol is selected from the group consisting of methanol claim 1 , ethanol and iso-propanol.5. The solvent/cleaner composition of claim 1 , further comprising hydrofluorocarbons claim 1 , hydrofluoroolefins claim 1 , hydrocarbons claim 1 , ethers claim 1 , hydrofluoroethers claim 1 , esters claim 1 , ketones claim 1 , 1 claim 1 ,2-transdichloroethylene and mixtures thereof.6. The solvent/cleaner composition of wherein said ester is selected from the group consisting of methyl formate claim 5 , methyl acetate claim 5 , ethyl formate and ethyl acetate.7. The solvent/cleaner composition of having a Kauri-butanol value of greater than about 15.8. The solvent/cleaner composition of having a Kauri-butanol value of greater than about 20.9. A method of removing contaminates from a surface comprising contact said surface with a liquid and/or vapor comprising the hydrochlorofluoroolefin 1233zd and an alcohol wherein said hydrochlorofluoroolefin 1233zd comprises ...

Azeotrope-like compositions of tetrafluoropropene and hydrofluorocarbons

Provided are azeotrope-like compositions comprising tetrafluoropropene and hydrofluorocarbons and uses thereof, including use in refrigerant compositions, refrigeration systems, blowing agent compositions, and aerosol propellants.

Heat Transfer Compositions

The invention provides a heat transfer composition comprising: 1. A heat transfer composition comprising:from about 5% to about 40% by weight of R-1234ze(E);from about 20% to about 35% by weight R-32;from about 15% to about 30% by weight R-125; andfrom about 12% to about 50% by weight R-134a.2. A composition according to claim 1 , wherein the composition has a GWP of less than 1800.3. A composition according to claim 1 , wherein the temperature glide is less than about 15 k.4. A composition according to claim 1 , wherein the composition has a volumetric refrigeration capacity within about 15% of the existing refrigerant that it is intended to replace.5. A composition according to claim 1 , wherein the composition is less flammable than R-32 alone.6. A composition according to wherein the composition has:(a) a higher flammable limit;(b) a higher ignition energy; and/or(c) a lower flame velocity compared to R-32 alone.7. A composition according to which is non-flammable.8. A composition according to claim 1 , wherein the composition has a cycle efficiency within about 10% of the existing refrigerant that it is intended to replace.9. A composition according to claim 1 , wherein the composition has a compressor discharge temperature within about 15 k of the existing refrigerant that it is intended to replace.10. A composition comprising a lubricant and a composition according to .11. A composition according to claim 10 , wherein the lubricant is selected from mineral oil claim 10 , silicone oil claim 10 , polyalkyl benzenes (PABs) claim 10 , polyol esters (POEs) claim 10 , polyalkylene glycols (PAGs) claim 10 , polyalkylene glycol esters (PAG esters) claim 10 , polyvinyl ethers (PVEs) claim 10 , poly (alpha-olefins) and combinations thereof.12. A composition according to further comprising a stabiliser.13. A composition according to claim 12 , wherein the stabiliser is selected from diene-based compounds claim 12 , phosphates claim 12 , phenol compounds and epoxides ...

COMPOSITIONS COMPRISING 1,2-DICHLORO-1,2-DIFLUOROETHYLENE FOR USE IN CLEANING AND SOLVENT APPLICATIONS

The present application provides compositions comprising 1,2-dichloro-1,2-difluoroethylene (i.e., CFO-1112) and, optionally, an additional component. The present application further provides use of the compositions provided herein in cleaning, solvent, carrier fluid, and deposition applications. 1. A process for dissolving a solute , comprising contacting and mixing said solute with a sufficient quantity of a composition comprising:i) 1,2-dichloro-1,2-difluoroethylene, and, optionally,ii) a compound selected from N-pentane, HFE-7000, R-1233xfB, R-1336mzzZ, dimethoxymethane, R-1345mzzE, R-43-10mee, R-365mfc, tetrahydrofuran, and R-153-10mzzy.2. The process of claim 1 , wherein the solute comprises rosin flux claim 1 , oil claim 1 , or a mixture thereof.3. The process of claim 2 , wherein the rosin flux is selected from RMA (rosin mildly activated) claim 2 , RA (rosin activated) claim 2 , WS (water soluble) claim 2 , and OA (organic acid) rosin flux claim 2 , or any mixture thereof.4. The process of claim 2 , wherein the oil is selected from mineral oil claim 2 , motor oil claim 2 , silicone oil claim 2 , a fluorinated oil claim 2 , or any mixture thereof.5. (canceled)6. A process of cleaning a surface claim 2 , comprising contacting with said surface a composition comprising:i) 1,2-dichloro-1,2-difluoroethylene, and, optionally,ii) a compound selected from N-pentane, HFE-7000, R-1233xfB, R-1336mzzZ, dimethoxymethane, R-1345mzzE, R-43-10mee, R-365mfc, tetrahydrofuran, and R-153-10mzzy.7. The process of claim 6 , wherein the contacting comprises immersing the surface in a container comprising the composition claim 6 , spraying the surface with the composition claim 6 , wiping the surface with a material that has been wet with the composition claim 6 , or any combination thereof.8. The process of claim 7 , wherein the surface is an integrated circuit device.9. The process of claim 8 , wherein the integrated circuit device is a circuit board.10. The process of claim 7 , ...

CLEANING COMPOSITION FOR LIQUID CRYSTAL ALIGNMENT LAYER AND MANUFACTURING METHOD OF LIQUID CRYSTAL ALIGNMENT LAYER USING THE SAME

The present invention relates to a cleaning composition for a liquid crystal alignment layer, a manufacturing method of a liquid crystal alignment layer using the same, and a liquid crystal display device including the liquid crystal alignment layer manufactured by the manufacturing method. More specifically, the present invention relates to a cleaning composition for a liquid crystal alignment layer that is capable of solving a non-uniformity problem of the liquid crystal alignment layer and effectively removing an ionic byproduct on a polymer surface to increase anisotropy of the liquid crystal alignment layer, by using a cleaning composition including a specific solvent in a cleaning process after a UV alignment process, and a manufacturing method of a liquid crystal alignment layer. 1. A cleaning composition for a liquid crystal alignment layer comprising:tetrahydrofurfuryl alcohol or methyl 2-hydroxyisobutyrate,wherein the cleaning composition for a liquid crystal alignment layer is used for cleaning a UV-aligned liquid crystal alignment layer including polyimide or a polyimide precursor.2. The cleaning composition for a liquid crystal alignment layer of claim 1 , further comprising:at least one compound selected from the group consisting of an alkylene glycol-based compound having a viscosity of 10 cP or less and a boiling point of at least 150° C. or more and a polar solvent having a viscosity of 5 cP or less and a boiling point of at least 100° C. or more.3. The cleaning composition for a liquid crystal alignment layer of claim 1 , wherein:the cleaning composition includesa) 100 wt % of the tetrahydrofurfuryl alcohol or the methyl 2-hydroxyisobutyrate, orb) 1 to 99 wt % of the compound a); and 0.1 to 99 wt % of at least one compound selected from the group consisting of an alkylene glycol-based compound and a polar solvent.4. The cleaning composition for a liquid crystal alignment layer of claim 1 , further comprising:1 to 70 wt % of deionized water.5. The ...

CLEANING AGENT FOR REMOVAL OF CONTAMINATES FROM MANUFACTURED PRODUCTS

A composition effective for removing contaminates from a manufactured product either as a concentrated material or when diluted with water. The composition designed for effective removal of all types of undesirable contaminates from a manufactured product, including but not limited to, solder flux, oils, greases, soil, and particulate matter. Depending on the nature of the process the cleaning composition maybe used in a multistep process. The composition contains propylene glycol phenyl ether and an alkali and has a pH of greater than 7.5. The composition may contain additional optional solvents and additives to enhance cleaning of articles or to impart other properties to the composition. The composition can be contacted with a surface to be cleaned in a number of ways and under a number of conditions depending on the manufacturing or processing variables present. 1. A composition effective for removing a contaminant from a manufactured product consisting essentially of propylene glycol phenyl ether , an alkali , and optionally one or more secondary solvents , and has a pH of at least about 7.5.2. The composition of claim 1 , further containing water.3. The composition of claim 2 , wherein said composition is diluted with said water to a concentration of from about 99.9 weight % to about 0.1 weight %.4. The composition of claim 1 , wherein said secondary solvent is present in an amount up to about 90%.5. The composition of claim 1 , wherein the secondary solvent is a member of the group consisting of{'sub': 1', 'x', '2x', 'n, 'claim-text': [{'sub': '1', 'Ris an alkyl group having 1 to 6 carbon atoms,'}, 'n is integer from 1 to 4, and', 'x is integer from 1 to 4;, '(a) a glycol ether of the formula R—O—(CHO)—H, wherein{'sub': '2', '(b) an alcohol of the formula R—OH, wherein{'sub': '2', 'Ris an alkyl group having 1 to 8 carbon atoms, a tetrahydrofurfuryl group, or hydrogen;'}{'sub': '3', 'claim-text': Npyrr represents a pyrollidone ring', {'sub': '3', 'Ris an alkyl ...

Non-flammable compositions and use of these compositions

The invention relates to certain non-flammable compositions containing 1,1,1,3,3-pentafluorobutane (R365mfc), 1,2-dichloroethylene and a hydrofluoroether, to mixtures containing these compositions and to the use of these non-flammable compositions or these mixtures, especially as precision cleaning agents for solid surfaces and for flushing, especially of refrigeration systems.

CLEANING COMPOSITION WITH CORROSION INHIBITOR

A cleaning composition and process for cleaning an in-process microelectronic device substrate, e.g., by post-chemical mechanical polishing (CMP) cleaning, to remove residue from a surface thereof, wherein the cleaning composition may be especially effective for cleaning a substrate surface that includes exposed metal such as cobalt, copper, or both, along with dielectric or low k dielectric material, and wherein the cleaning composition includes corrosion inhibitor to inhibit corrosion of the exposed metal. 1. A cleaning composition effective to clean a microelectronic device substrate , the cleaning composition comprising:water,base to provide a pH of at least 8,cleaning compound, andcorrosion inhibitor selected from: a guanidine functional compound, a pyrazolone functional compound, and a hydroxyquinoline compound.2. A cleaning composition of claim 1 , wherein the corrosion inhibitor is selected from:a guanidine functional compound selected from dicyandiamide, guanylurea, a guanidine salt, and glycocyamine,a pyrazolone functional compound selected from 2-methyl-3-butyn-2-ol, 3-methyl-2-pyrazolin-5-one, 3-methyl-1-4(sulfophenyl)-2-pyrazolin-5-one, 3-methyl-1-p-tolyl-5-pyrazolone, anda hydroxyquinoline compound selected from: 8-hydroxyquinoline, 8-hydroxyquinoline-2-carboxylic acid, 5-chloro7-iodo-quinolin-8-ol, 5,7-dichloro-2-[(dimethylamino)methyl)quinolin-8-ol, 8-hydroxyquinoline-4-carbaldehyde, 8-hydroxyquinoline-4-carbaldehyde-oxime, 8-hydroxyquinoline-5-sulfonic acid monohydrate3. A cleaning composition of claim 1 , wherein the base is selected from: choline hydroxide claim 1 , tetraethylammonium hydroxide claim 1 , tetramethylammonium hydroxide claim 1 , a quaternary ammonium compound claim 1 , and a combination thereof.4. A cleaning composition of claim 1 , wherein the cleaning compound is an alkanol amine.5. A cleaning composition of claim 1 , wherein the corrosion inhibitor is a guanine.6. A cleaning composition of claim 1 , wherein the corrosion ...

A NON-TOXIC HAND CLEANER COMPRISING A TERNARY SOLVENT MIXTURE

A cleaning composition comprises between about 10% to about 50% of at least one organic solvent comprising vegetable oil. The composition further comprises between about 2% to about 20% of at least one co-solvent. The composition further comprises at least one water-in-oil emulsifier and non-ionic surfactant. The composition also comprises at least one anionic surfactant and between about 20% to about 60% of water. 1. A cleaning composition comprising:between about 10% to about 50% of at least one organic solvent comprising vegetable oil;between about 2% to about 20% of at least one co-solvent;at least one water-in-oil emulsifier and non-ionic surfactant;at least one anionic surfactant; andbetween about 20% to about 60% of water.2. The cleaning composition as recited in claim 1 , further comprising at least one anti-microbial claim 1 , anti-oxidant claim 1 , chelating and PH balancing agent.3. The cleaning composition as recited in claim 2 , in which said anti-microbial claim 2 , anti-oxidant claim 2 , chelating and PH balancing agent comprises a saturated fatty acid.4. The cleaning composition as recited in claim 1 , further comprising at least one denaturant.5. The cleaning composition as recited in claim 4 , in which said denaturant comprises denatonium.6. The cleaning composition as recited in claim 1 , in which said co-solvent comprises at least one carbonate ester of aliphatic alcohols.7. The cleaning composition as recited in claim 1 , in which said anionic surfactant comprises ammonium xylene sulphonate.8. The cleaning composition as recited in claim 1 , further comprising at least one oil-in-water emulsifier.9. The cleaning composition as recited in claim 8 , in which said oil-in-water emulsifier comprises nonyl phenol ethoxylate.10. The cleaning composition as recited in claim 1 , further comprising at least one water phase thickening agent.11. The cleaning composition as recited in claim 10 , in which said water phase thickening agent comprises guar gum. ...

SOLVENT FORMULATIONS

The present disclosure provides, in part, solvent compositions including an acetic acid alkyl (C—C) ester (e.g., methyl acetate (MA), ethyl acetate (EA), or tert-butyl acetate (TBAc)) and a carbonate ester (e.g., dimethyl carbonate, or propylene carbonate), and optionally, a benzene-containing compound. The solvent compositions may be used to replace methyl ethyl ketone (MEK). 1. A solvent composition comprising:{'sub': 1', '4, '(a) an acetate ester in an amount between about 40% v/v and about 90% v/v, wherein the acetate ester is an acetic acid alkyl (C-C) ester;'}(b) a carbonate ester in an amount between about 5% v/v and about 55% v/v; and(c) a benzene-containing compound in an amount between about 5% v/v and about 15% v/v.2. The solvent composition of wherein:(a) the acetate ester is present in an amount between about 65% v/v and about 75% v/v;(b) the carbonate ester is present in an amount between about 10% v/v and about 30% v/v; and(c) the benzene-containing compound is present in an amount between about 5% v/v and about 10% v/v.3. (canceled)4. The solvent composition of wherein the acetate ester is methyl acetate (MA) or tert-butyl acetate (TBAc).5. The solvent composition of wherein the carbonate ester is dimethyl carbonate (DMC) or propylene carbonate (PC).6. The solvent composition of wherein the benzene-containing compound is benzyl alcohol (BA).7. The solvent composition of claim 1 , comprising:(a) the acetate ester in an amount between about 65% v/v and about 80% v/v, wherein the acetate ester is tert-butyl acetate (TBAc);(b) the carbonate ester in an amount between about 15% v/v and about 25% v/v, wherein the carbonate ester is dimethyl carbonate (DMC); and(c) the benzene-containing compound in an amount between about 5% v/v and 10% v/v, wherein the benzene-containing compound is benzyl alcohol (BA).823-. (canceled)24. The solvent composition of consisting essentially of:(a) the acetate ester in an amount of about 40% v/v, wherein the acetate ester is ...

MAINTENANCE LIQUID FOR ACTIVE ENERGY RAY-CURABLE INKJET INK

Provided is a non-aqueous maintenance liquid for an active energy ray-curable inkjet ink which can be used as a cleaning liquid for removing the inkjet ink and as a preserving liquid to fill the head when the printer is not in operation. The non-aqueous maintenance liquid for an active energy ray-curable inkjet ink of the present invention comprises a main liquid component, a pigment dispersant resin, and a surface control agent, wherein the main liquid component is an organic solvent and/or an active energy ray-curable compound, and the amount of the surface control agent is 0.01 to 10% by weight in 100% by weight of the maintenance liquid. 1. A non-aqueous maintenance liquid for an active energy ray-curable inkjet ink , the liquid comprising a main liquid component , a pigment dispersant resin , and a surface control agent ,wherein the main liquid component is an organic solvent and/or an active energy ray-curable compound.2. The maintenance liquid according to claim 1 , wherein the amount of the surface control agent is 0.01 to 10% by weight in 100% by weight of the maintenance liquid.3. The maintenance liquid according to claim 1 , wherein the amount of the pigment dispersant resin is 0.02 to 5% by weight in 100% by weight of the maintenance liquid.4. The maintenance liquid according to claim 1 , wherein the surface control agent comprises an acrylic claim 1 , silicone-based claim 1 , or fluorinated surface control agent.5. The maintenance liquid according to claim 1 , wherein the surface control agent comprises a polyether modified dimethylsiloxane silicone-based surface control agent.6. The maintenance liquid according to claim 1 , wherein the active energy ray-curable compound comprises one or more compounds selected from the group consisting of dipropylene glycol diacrylate claim 1 , 2-(2-vinyl oxyethoxy)ethyl acrylate claim 1 , and phenoxyethyl acrylate.7. The maintenance liquid according to claim 1 , wherein the active energy ray-curable compound comprises ...

SUBSTRATE CLEANING SOLUTION AND METHOD FOR MANUFACTURING DEVICE

To obtain a substrate cleaning solution capable of cleaning a substrate and removing particles. The present invention is a substrate cleaning solution comprising a polymer (A), an alkaline component (B), and a solvent (C), provided that the alkaline component (B) does not comprise ammonia. 115.-. (canceled)16. A substrate cleaning solution comprising a polymer (A) , an alkaline component (B) , and a solvent (C) ,provided that the alkaline component (B) does not comprise ammonia.17. The substrate cleaning solution according to claim 16 , wherein the alkaline component (B) comprises at least one of primary amine claim 16 , secondary amine claim 16 , tertiary amine claim 16 , and quaternary ammonium salt claim 16 , and the alkaline component (B) comprises hydrocarbon.18. The substrate cleaning solution according to claim 16 , wherein the solvent (C) comprises an organic solvent.19. The substrate cleaning solution according to claim 16 , wherein the boiling point of the alkaline component (B) at one atmospheric pressure is 20-400° C.20. The substrate cleaning solution according to claim 16 , wherein the polymer (A) comprises at least one of novolak claim 16 , polyhydroxy styrene claim 16 , polystyrene claim 16 , polyachrylate derivative claim 16 , polymaleic acid derivative claim 16 , polycarbonate claim 16 , polyvinyl alcohol derivatives claim 16 , polymethacrylate derivatives claim 16 , and copolymer of any combination of any of these.21. The substrate cleaning solution according to claim 20 , wherein the polymer (A) does not contain fluorine and/or silicon.22. The substrate cleaning solution according to claim 16 , further comprising a crack accelerating component (D) claim 16 ,wherein the crack accelerating component (D) comprises hydrocarbon and further comprises a hydroxy group and/or a carbonyl group.23. The substrate cleaning solution according to claim 16 , wherein the content of the polymer (A) is 0.1-50 mass % based on the total mass of the substrate cleaning ...

CLEANING SOLUTION FOR REMOVING DRY ETCHING RESIDUE AND METHOD FOR MANUFACTURING SEMICONDUCTOR SUBSTRATE USING SAME

The present invention can provide a cleaning solution containing 0.2-20 mass % of an amine compound (A), 40-70 mass % of a water-soluble organic solvent (B), and water, wherein the amine compound (A) contains at least one selected from the group consisting of n-butylamine, hexylamine, octylamine, 1,4-butanediamine, dibutylamine, 3-amino-1-propanol, N,N-diethyl-1,3-diaminopropane, and bis(hexamethylene)triamine, and the water-soluble organic solvent (B) has a viscosity of 10 mPa·s or less at 20° C. and a pH of 9.0-14. 1. A cleaning solution , comprising:from 0.2 to 20 mass % of an amine compound,from 40 to 70 mass % of a water-soluble organic solvent andwater,wherein:the amine compound comprises one or more selected from the group consisting of n-butylamine, hexylamine, octylamine, 1,4-butanediamine, dibutylamine, 3-amino-1-propanol, N,N-diethyl-1,3-diaminopropane and bis(hexamethylene)triamine;the water-soluble organic solvent has a viscosity of 10 mPa·s or less at 20° C.; andpH is in a range of from 9.0 to 14.2. The cleaning solution according to claim 1 , wherein a content of the amine compound is from 2.0 to 4.0 mass %.3. The cleaning solution according to claim 1 , wherein a content of water is from 28 to 59 mass %.4. The cleaning solution according to claim 1 , wherein the water-soluble organic solvent comprises one or more selected from the group consisting of diethylene glycol monomethyl ether claim 1 , diethylene glycol monobutyl ether claim 1 , triethylene glycol monomethyl ether claim 1 , dipropylene glycol monomethyl ether and N claim 1 ,N-dimethyl isobutylamide.5. The cleaning solution according to claim 1 , wherein the amine compound comprises one or more selected from the group consisting of 3-amino-1-propanol claim 1 , N claim 1 ,N-diethyl-1 claim 1 ,3-diaminopropane and bis(hexamethylene)triamine.6. The cleaning solution according to claim 1 , which is suitable for removing dry etching residue.7. A method for manufacturing a semiconductor substrate ...

Heat Transfer Compositions

A heat transfer composition comprising trans-1,3,3,3-tetrafluoropropene (R-1234ze(E)), carbon dioxide (R-744) and a third component selected from difluoromethane (R-32), 1,1-difluoroethane (R-152a), fluoroethane (R-161), 1,1,1,2-tetrafluoroethane (R-134a), propylene, propane and mixtures thereof. 1. A heat transfer composition comprising:trans-1,3,3,3-tetrafluoropropene (R-1234ze(E));carbon dioxide (R-744, CO2); anda third component selected from a group consisting of propylene, propane and mixtures thereof.2. A composition according to claim 1 , said composition comprising at least about 45% by weight of said R-1234ze(E).3. A composition according to claim 1 , said composition comprising greater than zero percent and up to about 12% by weight of said CO2.4. A composition according to claim 3 , said composition comprising from about 1 to about 10% by weight of said CO2.5. A composition according to claim 4 , said composition comprising about 2 to about 7% by weight of said CO2.6. A composition according to claim 1 , said composition comprising greater than zero percent and up to about 50% by weight of said third component.7. A composition according to claim 6 , wherein said third component is selected from a group consisting of propylene and propane claim 6 , said composition comprising from about 1 to about 10% by weight of said third component.8. A composition according to claim 7 , said composition comprising from about 2 to about 8% by weight of said third component.9. A composition according to claim 8 , said composition comprising from about 2 to about 10% by weight of said R-744.10. A composition according to claim 8 , said composition comprising from about 3 to about 6% by weight of said third component.11. A composition according to claim 10 , said composition comprising from about 2 to about 10% by weight of said R-744.12. A composition according to claim 1 , said composition consisting essentially of said R-1234ze(E) claim 1 , said R-744 and said third ...

ADHESIVE REMOVER COMPOSITIONS AND METHODS OF USE

The invention is directed to adhesive remover compositions and methods of their use. The adhesive remover compositions generally comprise a glycol ether solvent system comprising an aliphatic glycol ether, an aromatic glycol ether, a hydrophobic glycol ether, and a hydrophilic glycol ether, and a surfactant system. In further embodiment of the invention, the surfactant system may comprise three surfactants. In another aspect of the invention, the composition effectively removes medical adhesives from healthcare textiles. In a particular embodiment of the invention, the surfactant system may comprise one or more nonionic surfactants 1. An adhesive remover composition comprising:a glycol ether solvent system comprising an aliphatic glycol ether, an aromatic glycol ether, a hydrophobic glycol ether, and a hydrophilic glycol ether; anda surfactant system.2. The composition of claim 1 , wherein the surfactant system contains at least one nonionic surfactant.3. The composition of claim 1 , wherein the surfactant system comprises at least two surfactants.4. The composition of further comprising water between about 0 wt. % and about 20 wt. %.5. The composition of claim 1 , wherein the glycol ether solvent system is between about 8 wt. % and about 94 wt. % of the composition.6. The composition of claim 1 , wherein the surfactant system is between about 6 wt. % and about 90 wt. % of the composition.7. The composition of claim 1 , wherein the composition is phosphorus-free.8. The composition of claim 1 , wherein the composition is free of petroleum distillates.9. The composition of claim 1 , wherein the composition is free of nonylphenol ethoxylates.10. The composition of claim 1 , wherein the composition is free of D-limonene.11. An adhesive remover composition comprising:an aliphatic glycol ether present between about 5 wt. % and about 35 wt. %;an aromatic glycol ether present between about 1 wt. % and about 20 wt. %;a hydrophobic glycol ether present between about 1 wt. % ...

WAFER TREATMENT SOLUTION FOR EDGE-BEAD REMOVAL, EDGE FILM HUMP REDUCTION AND RESIST SURFACE SMOOTH, ITS APPARATUS AND EDGE-BEAD REMOVAL METHOD BY USING THE SAME

The present disclosure provides a wafer treatment solution for edge-bead removal, edge film hump reduction and resist surface smooth. The wafer treatment solution includes a solution and a fluorine-containing additive mixed in the solution. The fluorine-containing additive has a following formula (I): R—X—(CHCHO)—R(I); or a following formula (II): 3. The wafer treatment solution of claim 1 , wherein the fluorine-containing additive has the compound of the formula (I) claim 1 , wherein Ris a C6 perfluoroalkyl group claim 1 , R1 is hydrogen claim 1 , X is CH2O claim 1 , and m is between 1 to 6 claim 1 , so that the chemical structure of the fluorine-containing additive is formula (III):{'br': None, 'sub': 3', '2', '2', '2', '2', '2', '2', '2', '2, 'i': 'm', 'CFCFCFCFCFCFCHO(CHCHO)H\u2003\u2003(III).'}4. The wafer treatment solution of claim 1 , wherein the content of the fluorine-containing additive in the wafer treatment solution is in a range of 0.1-5 wt %.5. The wafer treatment solution of claim 1 , wherein the solution is selected from the group consisting of propylene glycol methyl ether (PGME) claim 1 , propylene glycol methyl ether acetate (PGMEA) claim 1 , cyclohexanol claim 1 , cyclohexanone claim 1 , γ-butyrolactone (GBL) claim 1 , N-methyl-2-pyrrolidone (NMP) claim 1 , n-butyl acetate (NBA) claim 1 , methyl ethyl ketone (MEK) claim 1 , diacetone alcohol (DAA) claim 1 , methyl isobutyl ketone (MIBK) claim 1 , dimethyl sulfoxide (DMSO) claim 1 , water claim 1 , ethanol claim 1 , propanol claim 1 , butanol claim 1 , isopropyl alcohol (IPA) claim 1 , 4-methyl-2-pentanol (MIBC) and a combination thereof.6. The wafer treatment solution of claim 1 , wherein the solution is a mixed solution of PGME and PGMEA claim 1 , and the weight ratio of PGME and PGMEA is 70:30.7. A method for edge-bead removal claim 1 , comprising:forming a photoresist layer on a semiconductor wafer, the semiconductor wafer is positioned on and in contact with a rotatable wafer chuck; and{' ...

AZEOTROPIC COMPOSITION, AZEOTROPE-LIKE COMPOSITION, COMPOSITION, CLEANING AGENT, SOLVENT, AND HEAT TRANSFER MEDIUM

To provide an azeotropic composition, an azeotrope-like composition and a composition, which have little influence over the global environment, which are non-flammable, and which are less likely to undergo composition change even when evaporated and condensed repeatedly, and a detergent, a solvent and a heat transfer fluid, which contain the azeotropic composition, the azeotrope-like composition or the composition. 1. An azeotropic composition consisting essentially of 34.5 mass % of (Z)-1-chloro-2 ,3 ,3-trifluoropropene and 65.5 mass % of trans-1 ,2-dichloroethylene.2. An azeotrope-like composition consisting essentially of from 28 to 41 mass % of (Z)-1-chloro-2 ,3 ,3-trifluoropropene and from 59 to 72 mass % of trans-1 ,2-dichloroethylene.3. The azeotrope-like composition according to claim 2 , which has a relative volatility of 1.00±0.10.4. A composition containing (Z)-1-chloro-2 claim 2 ,3 claim 2 ,3-trifluoropropene and trans-1 claim 2 ,2-dichloroethylene claim 2 , wherein the total proportion of (Z)-1-chloro-2 claim 2 ,3 claim 2 ,3-trifluoropropene and trans-1 claim 2 ,2-dichloroethylene in the composition to the total amount of the composition is at least 90 mass % claim 2 , and the mass ratio of (Z)-1-chloro-2 claim 2 ,3 claim 2 ,3-trifluoropropene to trans-1 claim 2 ,2-dichloroethylene is from 28/72 to 41/59.5. The composition according to claim 4 , which further contains (E)-1-chloro-2 claim 4 ,3 claim 4 ,3-trifluoropropene.6. A detergent containing the azeotropic composition as defined in .7. A detergent containing the azeotrope-like composition as defined in .8. A detergent containing the composition as defined in .9. A solvent containing the azeotropic composition as defined in .10. A solvent containing the azeotrope-like composition as defined in .11. A solvent containing the composition as defined in .12. An aerosol composition containing the azeotropic composition as defined in .13. An aerosol composition containing the azeotrope-like composition as ...

N-PROPYL BROMIDE SOLVENT SYSTEMS

A solvent composition and system is disclosed having a composition including n-propyl bromide and a propionate containing liquid and/or a butyrate containing liquid. The solvent system may include approximately 35 to 92.5 weight percent propionate containing liquid and approximately 7.5 to 65 weight percent n-propyl bromide. Alternatively, the solvent system may include approximately 40 to 85 weight percent butyrate containing liquid and 15 to 60 weight percent n-propyl bromide. The solvent system may incorporate a polymer, such as a synthetic rubber polymer. Further the solvent system preferably has high solvency while maintaining desirable evaporation rates and is preferably nonflammable, combustible, or minimally a class IC flammable liquid. 1. (canceled)2. (canceled)3. The solvent system of wherein said propionate containing liquid is hexyl propionate.4. The solvent system of wherein said mixture is nonflammable.5. The solvent system of wherein said mixture has a Kauri-Butanol solvency power greater than 75.6. The solvent system of wherein said mixture has a Kauri-Butanol solvency power greater than 100.7. A solvent system comprising a miscible solvent mixture comprising n-propyl bromide claim 7 , a propionate containing liquid and a synthetic rubber claim 7 , wherein the solvent mixture dissolves the synthetic rubber to form a liquid rubber.8. The solvent system of wherein said system comprises 30 to 50 weight percent propionate containing liquid.9. The solvent system of wherein said system is used as a liquid rubber agent.10. The solvent system of wherein said system is used as a paint carrier.11. The solvent system of wherein said system is applied to a metal surface and reduces tarnishing on said surface.12. The solvent system of wherein said system is used as a bonding-agent.13. The solvent system of wherein said system is a bonding agent for a polymer material comprising styrene-block-copolymer.14. The solvent system of wherein said composition further ...

Composition for use in cleaning metal components

A composition for use in cleaning metal components having Hansen Solubility Parameters for the composition of δ D ≥15, δ P <6, and δ H from about 5.5 to about 6.9. The composition includes a blend of organic solvents, none of which are classified as a volatile organic compound, a hazardous air pollutant, or a potential carcinogen, or exhibit a vapor pressure of less than 0.1 mmHg at 20° C. Further, the blend of organic solvents includes a halogenated aromatic solvent having one or more halide groups and from 6 to 8 carbon atoms, an organic solvent having one or more ester functional group and from 3 to 9 carbon atoms, and one or more of a linear or branched hydrocarbon solvent with 6-12 carbon atoms with a single polar moiety head group or a solvent containing one or more ketone functional groups and from 2 to 5 carbon atoms.

SOLVENT SYSTEMS AND METHODS OF USE THEREOF

A cleaning composition comprising a blend of at least one C-Cester of a C-Cfatty acid component, at least one terpene hydrocarbon component, and optionally at least one emulsifier component. The weight percent ratio of the at least one C-Cester of a C-Cfatty acid component to the at least one terpene hydrocarbon component is from about 10:90 weight percent to about 99:1 weight percent, based on the total weight of the blend. The weight percent ratio is such that the blend has a flash point greater than about 118° F. A method of cleaning a surface of a substrate comprising applying the cleaning composition to a substrate surface having an undesirable residue thereupon, and removing the undesirable residue from the substrate surface. The blend may be biodegradable, and has no ozone depleting compounds, no hazardous air pollutants, and no carcinogens. 1. A composition consisting essentially of:{'sub': 1', '4', '16', '20, 'a blend of at least one C-Cester of a C-Cfatty acid component, and at least one terpene hydrocarbon component; and optionally one or more of an emulsifier, a surfactant, a thixotropic agent, a pH adjuster, an alcohol, a salt, an acid, and water;'}{'sub': 1', '4', '16', '20', '1', '4, 'wherein the at least one C-Cester of a C-Cfatty acid component is selected from at least one C-Cester of corn oil, mustard oil, niger seed oil, olive oil, peanut oil, poppy seed oil, rapeseed oil, safflower oil, sesame oil, soybean oil, sunflower seed oil, wheat germ oil, or mixtures thereof;'}{'sub': 1', '4', '16', '20, 'wherein the weight percent ratio of the at least one C-Cester of a C-Cfatty acid component to the at least one terpene hydrocarbon component is from about 10:90 weight percent to about 90:10 weight percent, based on the total weight of the composition; and'}wherein the weight percent ratio is such that the composition has a flash point greater than about 118° F.2. The composition of claim 1 , wherein the blend further comprises at least one emulsifier.3 ...

EXTRUSION OR INJECTION MOLDING MACHINE PURGING COMPOSITION AND METHOD

A composition comprising 10-80% by weight of a cellulose ether and a solvent selected from a water-soluble polyhydric alcohol, polyhydric alcohol ether, polyhydric alcohol ester, and ethanolamine is effective for purging extrusion and injection molding machines. The purging composition exerts a satisfactory purging or cleaning effect, but little abrasion effect, thus avoiding any abrasion of machine internal components by purging. Even if part of the purging composition is left within the machine after the composition is discharged out, the residue can be readily removed. 1. A purging composition for extrusion and injection molding machines , comprising a cellulose ether and at least one solvent selected from the group consisting of a water-soluble polyhydric alcohol , polyhydric alcohol ether , polyhydric alcohol ester , and ethanolamine , the cellulose ether being present in the solvent in a concentration of at least 10% by weight.2. The purging composition of which is prepared by heating and melting the cellulose ether in the solvent claim 1 , cooling the solution for solidification claim 1 , and grinding the solid.3. The purging composition of wherein the cellulose ether is an alkyl cellulose claim 1 , hydroxyalkyl cellulose claim 1 , hydroxyalkyl alkyl cellulose or stearyl ether thereof claim 1 , or cellulose-based enteric substrate.4. The purging composition of wherein the water-soluble polyhydric alcohol is ethylene glycol claim 1 , propylene glycol claim 1 , diethylene glycol claim 1 , dipropylene glycol claim 1 , 1 claim 1 ,3-propanediol or glycerol.5. The purging composition of wherein the water-soluble polyhydric alcohol ether is ethylene glycol ethyl ether or tripropylene glycol methyl ether.6. The purging composition of wherein the water-soluble polyhydric alcohol ester is ethylene glycolate claim 1 , glyceryl monoacetate or glyceryl diacetate.7. The purging composition of wherein the water-soluble ethanolamine is monoethanolamine or diethanolamine.8. A ...

MAINTENANCE LIQUID FOR INKJET PRINTERS

A maintenance liquid for inkjet printers includes at least 50 wt % of at least one ether solvent according to Formula (I) or (II) with the wt % based on the total weight of the maintenance liquid: 115-. (canceled)16. A maintenance liquid for inkjet printers , the maintenance liquid comprising: [{'br': None, 'sup': 1', '2', '3, 'sub': x', 'y, 'R(CO)(OR)OR\u2003\u2003Formula (I)'}, {'br': None, 'sup': 4', '5', '6, 'sub': 'z', 'RCO(OR)OCOR\u2003\u2003Formula (II);'}], 'at least 50 wt % of at least one ether solvent according to Formula (I) or (II) with the wt % is based on a total weight of the maintenance liquidwherein{'sup': 1', '4', '6, 'R, R, and Rindependently represent an alkyl group having 1 to 4 carbon atoms;'}{'sup': 2', '5, 'Rrand Rindependently represent an ethylene group or a propylene group;'}{'sup': '3', 'Rrepresents a hydrogen atom or an alkyl group having 1 to 4 carbon atoms;'}x represents an integer of 0 or 1;y and z independently represent an integer of 1 to 4; andthe maintenance liquid contains no more than 25 ppm of peroxide expressed as hydrogen peroxide.17. The maintenance liquid according to claim 16 , wherein the at least one ether solvent according to Formula (I) has a boiling point of at least 160° C. at 760 mm Hg.18. The maintenance liquid according to claim 16 , wherein the at least one ether solvent according to Formula (I) is selected from the group consisting of dipropylene glycol n-butyl ether claim 16 , tripropylene glycol n-butyl ether claim 16 , dipropylene glycol n-propyl ether claim 16 , dipropylene glycol dimethyl ether claim 16 , tripropylene glycol methyl ether claim 16 , tetraethylene glycol dimethyl ether claim 16 , diethylene glycol ethyl ether acetate claim 16 , dipropylene glycol diacetate claim 16 , dipropylene glycol monomethyl ether acetate claim 16 , and diethylene glycol n-butyl ether acetate.19. The maintenance liquid according to claim 16 , wherein the at least one ether solvent according to Formula (I) is present in ...

PROCESS FOR REMOVING POLYMERIC FOULING

A process is provided for removing polymeric fouling on process equipment surfaces to restore the efficiency of such equipment. This is accomplished by contacting the fouled equipment with a solvent comprising at least one non-aromatic hydrocarbon compound, or a mixture of one or more non-aromatic organic compounds and one or more aromatic hydrocarbon compounds, for a period of time sufficient to remove the polymeric fouling. 1. A process for dissolving polymeric fouling on process equipment surfaces comprising the steps of:contacting polymeric fouling on one or more process equipment surfaces with a solvent capable of dissolving the polymeric fouling, the solvent comprising at least one non-aromatic organic compound;maintaining contact of the polymeric fouling with the solvent at a temperature of from about 115° F. (about 50° C.) to about 600° F. (about 320° C.) for a time sufficient to dissolve substantially all of the polymeric fouling;recovering the solvent containing polymeric fouling; andseparating a least a portion of the polymeric fouling from the recovered solvent using filtration.2. The process of wherein the solvent comprises from about 5% volume to about 50% volume diphenylethane claim 1 , from about 5% volume to about 50% volume ethylenated benzenes claim 1 , and from about 20% volume to about 80% volume diesel fuel claim 1 , kerosene claim 1 , or a combination of diesel fuel and kerosene.3. The process of including the additional steps of:obtaining a sample of the polymeric fouling from one or more of the fouled process equipment surfaces; andselecting a suitable solvent or custom solvent that dissolves at least a portion of the polymeric fouling sample.4. The process of wherein the polymeric fouling on at least one process equipment surface occurred during a monomer polymerization process.5. The process of wherein the polymeric fouling comprises non-vinyl polymers or copolymers.6. The process of wherein the polymeric fouling comprises polyethylene or ...

QUATERNARY AZEOTROPE AND AZEOTROPE-LIKE COMPOSITIONS FOR SOLVENT AND CLEANING APPLICATIONS

The present application provides quaternary azeotrope or azeotrope-like compositions comprising trans-dichloroethylene and three or more additional components. Methods of using the compositions provided herein in cleaning, defluxing, deposition, and carrier fluid applications are also provided. 1. An azeotrope or azeotrope-like composition , comprising:i) trans-1,2-dichloroethylene;ii) a second component selected from a hydrofluoroolefin, a hydrofluoroether, a hydrochlorofluoroolefin, and an alkyl perfluoroalkene ether;iii) a third component which is a hydrofluorocarbon; and{'sub': ['1-6', '3-6', '5-8', '3-6', '1-6'], '#text': 'iv) a fourth component selected from a Calcohol, a Cketone, a Calkane, a Ccycloalkane, and a Calkyl acetate.'}2. The composition of claim 1 , wherein the second component is a hydrofluoroolefin.3. The composition of claim 2 , wherein the hydrofluoroolefin is (Z)-1 claim 2 ,1 claim 2 ,1 claim 2 ,4 claim 2 ,4 claim 2 ,4-hexafluoro-2-butene.4. The composition of claim 1 , wherein the second component is a hydrofluoroether.5. The composition of claim 4 , wherein the hydrofluoroether is selected from HFE-7000 claim 4 , HFE-7100 claim 4 , HFE-7200 claim 4 , HFE-7300 claim 4 , HFE-347pc-f claim 4 , and 1 claim 4 ,1 claim 4 ,1 claim 4 ,2 claim 4 ,2 claim 4 ,3 claim 4 ,4 claim 4 ,5 claim 4 ,5 claim 4 ,5-decafluoro-3-methoxy-4-(trifluoromethyl)pentane.6. The composition of claim 4 , wherein the hydrofluoroether is 1 claim 4 ,1 claim 4 ,1 claim 4 ,2 claim 4 ,2 claim 4 ,3 claim 4 ,4 claim 4 ,5 claim 4 ,5 claim 4 ,5-decafluoro-3-methoxy-4-(trifluoromethyl)pentane.7. The composition of claim 1 , wherein the second component is a hydrochlorofluoroolefin.8. The composition of claim 7 , wherein the hydrochlorofluoroolefin is selected from HCFO-1233zd(Z) claim 7 , HCFO-1233zd(E) claim 7 , and HCFO-1233yd(Z).9. The composition of claim 1 , wherein the second component is an alkyl perfluoroalkene ether.10. The composition of claim 9 , wherein the alkyl ...

THINNER COMPOSITION

A thinner composition is capable of reducing the amount of photoresist used in a reducing resist consumption (RRC) coating process, an edge bead removed (EBR) process or the like, and removing unnecessary photoresist on an edge portion or a backside portion of the wafer. The thinner composition includes C-Calkyl C-Calkoxy propionate, propylene glycol C-Calkyl ether, and propylene glycol C-Calkyl ether acetate. 1. A method of removing photoresist on a substrate using a thinner composition comprising C-Calkyl C-Calkoxy propionate , propylene glycol C-Calkyl ether , and propylene glycol C-Calkyl ether acetate.2. The method of claim 1 , wherein the thinner composition comprises 20 to 45% by weight of C-Calkyl C-Calkoxy propionate claim 1 , 5 to 55% by weight of propylene glycol C-Calkyl ether claim 1 , and 20 to 60% by weight of propylene glycol C-Calkyl ether acetate claim 1 , based on the total weight of the thinner composition.3. The method of claim 1 , wherein the C-Calkyl C-Calkoxy propionate is any one or a mixture of two or more selected from the group consisting of methyl methoxy propionate claim 1 , methyl ethoxy propionate claim 1 , ethyl methoxy propionate claim 1 , and ethyl ethoxy propionate.4. The method of claim 1 , wherein the propylene glycol C-Calkyl ether is at least one selected from the group consisting of propylene glycol methyl ether claim 1 , propylene glycol ethyl ether claim 1 , propylene glycol propyl ether claim 1 , and propylene glycol butyl ether.5. The method of claim 1 , wherein the propylene glycol C-Calkyl ether acetate is at least one selected from the group consisting of propylene glycol methyl ether acetate claim 1 , propylene glycol ethyl ether acetate claim 1 , propylene glycol propyl ether acetate claim 1 , propylene glycol isopropyl ether acetate claim 1 , and propylene glycol butyl ether acetate.6. The method of claim 1 , wherein the thinner composition further comprises at least one selected from C-Calkyl hydroxyisobutyrate and ...

AZEOTROPIC COMPOSITION CONTAINING 1,1,1,3,3,3-HEXAFLUORO-2-METHOXYPROPANE

An azeotropic composition a formulated with 1,1,1,3,3,3,-hexafluoro-2-methoxypropane and a second component selected from the group consisting of isopropyl alcohol, ethanol, methanol, and trans-1,2-dichloroethylene. The azeotropic composition exhibits a substantially constant boiling point at a constant pressure and is useful for various cleaning and degreasing applications. 19-. (canceled)10. An azeotropic composition comprising:about 52 weight % (wt. %) to about 99 wt. % 1,1,1,3,3,3,-hexafluoro-2-methoxypropane (“HFMOP”); andabout 1 wt. % to about 48 wt. % of a second component selected from the group consisting of isopropyl alcohol (“IPA”), ethanol, and methanol;wherein the azeotropic composition has a substantially constant boiling point at a constant pressure.11. The azeotropic composition of claim 10 , wherein the azeotropic composition contains about 94 wt. % to about 99 wt. % HFMOP and about 1 wt. % to about 6 wt. % of IPA.12. The azeotropic composition of claim 11 , wherein the azeotropic composition consists essentially of about 97 wt. % of HFMOP and about 3 wt. % of IPA claim 11 , wherein the azeotropic composition has a substantially constant boiling point of about 49° C. at atmospheric pressure.13. The azeotropic composition of claim 10 , wherein the azeotropic composition contains about 94 wt. % to about 99 wt % HFMOP and about 1 wt. % to about 6 wt. % of ethanol.14. The azeotropic composition of claim 13 , wherein the azeotropic composition consists essentially of about 96.6 wt. % HFMOP and about 3.4 wt. % ethanol claim 13 , wherein the azeotropic composition has a substantially constant boiling point of about 47° C. at atmospheric pressure.15. The azeotropic composition of claim 10 , wherein the azeotropic composition contains about 91 wt. % to about 97 wt % HFMOP and about 3 wt. % to about 9 wt. % methanol.16. The azeotropic composition of claim 15 , wherein the azeotropic composition consists essentially of about 94.1 wt. % HFMOP and about 5.9 wt. ...

CLEANER COMPOSITION, CLEANING AEROSOL, AND METHOD FOR CLEANING CONTAMINATED PART

A cleaner composition, a cleaning aerosol, and a method for cleaning a contaminated part, in which the contaminated part, particularly a part around an automobile brake or the like, can be cleaned easily, safely, and with high efficiency and minimal environmental impact. A cleaner composition can include a component (A); cis-1-chloro-3,3,3-trifluoropropene (HCFO-1233zdZ) as a cleaning agent; and a component (B); carbon dioxide as a propellant; wherein a content of the component (B) contains 1.6 to 10 parts by mass with respect to 100 parts by mass of the component (A). 18-. (canceled)9. A cleaner composition , comprising:a component (A); cis-1-chloro-3,3,3-trifluoropropene (HCFO-1233zdZ) as a cleaning agent; anda component (B); carbon dioxide as a propellant,wherein a content of the component (B) contains 1.6 to 10 parts by mass with respect to 100 parts by mass of the component (A).10. A cleaning aerosol obtained by filling an aerosol container with a cleaner composition , comprising:a component (A); cis-1-chloro-3,3,3-trifluoropropene (HCFO-1233zdZ) as a cleaning agent; anda component (B); carbon dioxide as a propellant,wherein a content of the component (B) contains 1.6 to 10 parts by mass with respect to 100 parts by mass of the component (A).11. The cleaning aerosol according to claim 10 , wherein the aerosol container is filled so that an internal pressure of the aerosol container is 0.4 to 0.7 MPa.12. The cleaning aerosol according to claim 10 , wherein the cleaning aerosol does not substantially include a propellant other than carbon dioxide.13. A method for cleaning a contaminated part claim 10 , comprising: a component (A); cis-1-chloro-3,3,3-trifluoropropene (HCFO-1233zdZ) as a cleaning agent; and', 'a component (B); carbon dioxide as a propellant,', 'wherein a content of the component (B) contains 1.6 to 10 parts by mass with respect to 100 parts by mass of the component (A), 'injecting a cleaning aerosol obtained by filling an aerosol container with a ...

CLEANING COMPOSITIONS AND METHODS

The present invention relates, in part, to cleaning methods and solvent cleaning compositions including at least one hydrofluoro-olefin or hydrochlorofluoro-olefin solvent for use in connection with cleaning of metal parts, and in certain preferred embodiments cleaning metal parts to be used in an aircraft. 1. A method of cleaning metal parts to be used in an aircraft comprising:a. providing a solvent composition comprising at least about 50% by weight of 1233zd: andb. contacting the metal part to be used in an aircraft with said solvent composition, said metal part comprising a metal or a metal alloy selected from titanium and titanium alloys; zinc and zinc alloys; tungsten and tungsten alloys; copper and copper alloys; Inconel-Ni alloys; silver and silver alloys; cadmium and cadmium alloys; stainless steels; gold and gold alloys; and silver and silver alloys.2. The method of wherein said contacting step comprises spraying said metal part with said solvent composition.3. The method of wherein said contacting step comprises immersing said metal part in said solvent composition.4. The method of wherein said solvent composition is in a liquid phase during said immersing step.5. The method of wherein said solvent composition is in a vapor phase during said immersing step.6. The method of claim one wherein said metal part is contaminated with cutting oil prior to said contacting step.7. The method of wherein said metal part is substantially free of cutting oil after said contacting step.8. The method of wherein said solvent composition further comprises methanol.9. The method of wherein said methanol is present in the composition in an amount of from about one to about 10% by weight of the composition.10. The method of wherein said methanol is present in the composition in an amount of from about one to about 5% by weight of the composition.11. The method of wherein said solvent composition further comprises ethanol.12. The method of wherein said ethanol is present in ...

CLEANING AGENT COMPOSITION AND CLEANING METHOD

A cleaning agent composition for use in removal of a polysiloxane adhesive remaining on a substrate containing a tetrahydrocarbylammonium fluoride and an organic solvent, wherein the organic solvent contains a lactam compound represented by formula (1) and a ring-structure-having ether compound including at least one species selected from among a cyclic ether compound, a cycloalkyl (chain alkyl) ether compound, a cycloalkyl (branched alkyl) ether compound, and a di(cycloalkyl) ether compound.

CLEANING FLUID COMPOSITIONS AND METHODS OF MAKING AND USING THE SAME

A cleaning fluid composition, a method of manufacture of the fluid composition, and a method of use thereof are provided. The fluid composition comprises 10% to 50% by weight of an alcohol based on the total weight of the fluid composition, 2% to 40% by weight of a co-solvent based on the total weight of the fluid composition, and at least 20% by weight of water based on the total weight of the fluid composition. The co-solvent is miscible with water, the fluid composition is substantially free of ethylene glycol and methanol, and the fluid composition has a viscosity less than or equal to 45 cP at −25 degrees Celsius and a freezing point less than −25 degrees Celsius. 1. A cleaning fluid composition comprising:(a) 10% to 50% by weight of an alcohol based on the total weight of the fluid composition, wherein the fluid composition is substantially free of methanol;(b) 2% to 40% by weight of a co-solvent based on the total weight of the fluid composition, wherein the co-solvent is miscible with water and the fluid composition is substantially free of ethylene glycol; and(c) at least 20% by weight of water based on the total weight of the fluid composition;wherein the fluid composition has a viscosity less than or equal to 45 cP at −25 degrees Celsius and a freezing point of less than −25 degrees Celsius.2. The fluid composition of claim 1 , wherein the fluid composition is essentially free of methanol.3. The fluid composition of claim 1 , wherein the fluid composition is essentially free of ethylene glycol.4. The fluid composition of claim 1 , wherein the co-solvent comprises at least one of a glycol ether and a ketone.5. The fluid composition of claim 1 , wherein the co-solvent comprises at least one of methyl ethyl ketone claim 1 , propylene glycol n-butyl ether claim 1 , and dipropylene glycol dimethyl ether.6. The fluid composition of claim 1 , wherein the alcohol comprises at least one of ethanol claim 1 , 1-propanol claim 1 , and 2-propanol.7. The fluid ...

CLEANING FORMULATIONS FOR REMOVING RESIDUES ON SURFACES

This disclosure relates to a cleaning composition that contains 1) at least one chelating agent, the chelating agent being a polyaminopolycarboxylic acid; 2) at least one organic solvent selected from the group consisting of water soluble alcohols, water soluble ketones, water soluble esters, and water soluble ethers; 3) at least one monocarboxylic acid containing a primary or secondary amino group and at least one additional basic group containing nitrogen; 4) at least one metal corrosion inhibitor, the metal corrosion inhibitor being a substituted or unsubstituted benzotriazole; and 5) water. This disclosure also relates to a method of using the above composition for cleaning a semiconductor substrate.

NONFLAMMABLE COMPOSITION CONTAINING 1,2-DICHLOROETHYLENE

A nonflammable solvent composition, a method of cleaning a surface, and a method of coating a substrate with a material using the solvent composition are provided. The nonflammable solvent composition includes about 70 wt. % or more of trans-1,2-dichloroethylene (t-DCE) and about 0.1 to about 30 wt. % of one or more of hydrofluoroether (HFE) and n-propyl bromide. The method of cleaning a surface includes applying the solvent composition to the surface and spreading or rubbing the composition on the surface. The method of coating a substrate with a material includes dissolving one or more material in the solvent composition, applying the solvent composition containing the one or more material to a substrate, and evaporating the solvent composition from the substrate. 1. A solvent composition comprising:about 70 wt. % or more of trans-1,2-dichloroethylene (t-DCE); andabout 0.1 to about 30 wt. % of one or more of hydrofluoroether (HFE) and n-propyl bromide.2. The composition according to claim 1 , wherein the composition is non-azeotropic.3. The composition according to claim 1 , wherein the t-DCE is present in an amount of about 70 wt. % to about 95 wt. %.4. The composition according to claim 1 , wherein the one or more of HFE and n-propyl bromide is present in an amount of about 5 wt. % to about 30 wt. %.5. The composition according to claim 3 , wherein the one or more of LIFE and n-propyl bromide is present in an amount of about 5 wt. % to about 30 wt. %.6. The composition according to claim 1 , wherein the t-DCE is present in an amount of about 70 wt. % to about 90 wt. % and the one or more of HFE and n-propyl bromide is present in an amount of about 10 wt. % to about 30 wt. %.7. The composition according to claim 1 , wherein the composition exhibits no flash point.8. The composition according to claim 1 , wherein the composition does not exhibit a flash point up to a boiling point of the composition.9. The composition according to claim 1 , comprising a ...

MISCIBLE SOLVENT SYSTEM AND METHOD FOR MAKING SAME

A miscible solvent system and method for making same having a composition between about 10 to about 90 weight percent PCBTF and between about 10 to about 90 weight percent fluorinated solvent. The miscible solvent system may be combined with boron nitride powder to create a bulk paint system. Further the miscible solvent system may be combined with a propellant to create an aerosol system. The miscible solvent system, bulk paint system, and aerosol system may be nonflammable or flammable and contain VOCs or be VOC free. 1. A miscible solvent system comprising:between about 10 to about 90 weight percent PCBTF; andbetween about 10 to about 90 weight percent fluorinated solvent.2. The solvent system of claim 1 , wherein the system is trans-1 claim 1 ,2-DCE free.3. The solvent system of claim 1 , wherein the system contains trans-1 claim 1 ,2-DCE.4. The solvent system of claim 1 , wherein said system is nonflammable.5. The solvent system of claim 1 , wherein said system is VOC free.6. The solvent system of wherein said fluorinated solvent is 1 claim 1 ,1 claim 1 ,1 claim 1 ,2 claim 1 ,2 claim 1 ,3 claim 1 ,4 claim 1 ,5 claim 1 ,5 claim 1 ,5-decafluoropentane.7. The solvent system of wherein said fluorinated solvent is methoxy-nonafluorobutane.8. The solvent system of wherein said fluorinated solvent is a combination including 1 claim 1 ,1 claim 1 ,1 claim 1 ,2 claim 1 ,2 claim 1 ,3 claim 1 ,4 claim 1 ,5 claim 1 ,5 claim 1 ,5-decafluoropentane and trans-1 claim 1 ,2-DCE.9. The solvent system of wherein said combination includes between about 61 to about 63 weight percent 1 claim 8 ,1 claim 8 ,1 claim 8 ,2 claim 8 ,2 claim 8 ,3 claim 8 ,4 claim 8 ,5 claim 8 ,5 claim 8 ,5-decafluoropentane and between about 37 to about 39 weight percent trans-1 claim 8 ,2-DCE.10. The solvent system of wherein said fluorinated solvent is a combination including a mixture of hydrofluoroethers and trans-1 claim 1 ,2-DCE.11. The solvent system of wherein said combination includes about 68 to ...

COMPOSITIONS CONTAINING TRANS-1,2-DICHLOROETHYLENE AND A HYDROFLUOROETHER, AND METHODS OF USING THE SAME

Disclosed herein are solvent compositions and methods of using the solvent compositions. The solvent composition includes at least trans-1,2-dichloroethylene (t-DCE) and 1,1,2,2-tetrafluoroethyl-2,2,3,3-tetrafluoropropyl ether (TFE-TFPE). The solvent composition may also include an oxygenated solvent, such as an alcohol or fluorinated ether. A method of cleaning the surface of an article includes contacting the surface with the solvent composition to dissolve, disperse, or displace a contaminant on the surface, and removing the solvent composition containing the contaminant from the surface. 1. A solvent composition comprising:trans-1,2-dichloroethylene (t-DCE) in an amount in a range of from 70 to 99.9 wt. %; and1,1,2,2-tetrafluoroethyl-2,2,3,3-tetrafluoropropyl ether (TFE-TFPE) in an amount in a range of from 0.1 to 30 wt. %.2. The solvent composition according to claim 1 , wherein the t-DCE and the TFE-TFPE are present in the composition in relative azeotrope or azeotrope-like amounts.3. The solvent composition according to claim 1 , wherein the composition is nonflammable.4. A solvent composition comprising:65 to 98 wt. % of trans-1,2-dichloroethylene (t-DCE);0.1 to 30 wt. % of 1,1,2,2-tetrafluoroethyl-2,2,3,3-tetrafluoropropyl ether (TFE-TFPE); and0.1 to 15 wt. % of an oxygenated solvent selected from the group consisting of at least one of methanol, ethanol, isopropanol, t-butanol, 1-propanol, 2-butanol, methylperfluoroheptene ether (MPHE), and 3-methoxyperfluoro(2-methylpentane).5. The solvent composition according to claim 4 , wherein the t-DCE claim 4 , TFE-TFPE claim 4 , and the oxygenated solvent are present in the composition in relative azeotrope or azeotrope-like amounts.6. The solvent composition according to claim 4 , wherein:the oxygenated solvent is MPHE and 3-methoxyperfluoro(2-methylpentane), andthe t-DCE, TFE-TFPE, MPHE, and 3-methoxyperfluoro(2-methylpentane) are present in the composition in relative azeotrope or azeotrope-like amounts.7. The ...

SUBSTRATE DETERGENT COMPOSITION

The invention provides a substrate detergent composition used for cleaning a surface of a substrate, comprising: (A) A quaternary ammonium salt: 0.1 to 2.0% by mass; (B) Water: 0.1 to 4.0% by mass; and (C) An organic solvent: 94.0 to 99.8% by mass. There can be provided a substrate detergent composition used for cleaning a surface of a substrate contaminated with a silicone component whose water contact angle is 100° or more. 1. A method of cleaning a surface of a semiconductor substrate which includes silicone resin on the surface comprising: cleaning the surface by using a semiconductor substrate detergent composition , comprising:(A) a quaternary ammonium salt: 0.1 to 2.0% by mass;(B) water: 0.1 to 4.0% by mass; and(C) an organic solvent: 94.0 to 99.8% by mass.2. The method for cleaning a surface of a semiconductor substrate according to claim 1 , wherein the silicone resin is an adhesive containing the silicone resin.3. The method for cleaning a surface of a semiconductor substrate according to claim 1 , wherein the semiconductor substrate is a thin semiconductor substrate obtained bybonding a semiconductor substrate and a support with an adhesive containing the silicone resin to produce a laminated body,grinding and processing the semiconductor substrate of the laminated body, andremoving the support and the adhesive from the laminated body.4. The method for cleaning a surface of a semiconductor substrate according to claim 2 , wherein the semiconductor substrate is a thin semiconductor substrate obtained bybonding a semiconductor substrate and a support with an adhesive containing the silicone resin to produce a laminated body,grinding and processing the semiconductor substrate of the laminated body, andremoving the support and the adhesive from the laminated body.5. The method for cleaning a surface of a semiconductor substrate according to claim 1 , wherein the organic solvent is an organic solvent containing at least one kind of a saturated aliphatic ...

CLEANING SOLVENT COMPOSITION

Provided is a cleaning solvent composition that comprises a cis-1-chloro-3,3,3-trifluoropropene solvent and an additive, wherein the additive contains at least one type of compound selected from the group consisting of nitroalkanes and epoxides. 1. A cleaning solvent composition comprising a cis-1-chloro-3 ,3 ,3-trifluoropropene solvent and an additive , wherein the additive comprises at least one compound selected from the group consisting of nitroalkanes and epoxides.2. The cleaning solvent composition according to claim 1 , wherein the additive comprises a nitroalkane.3. The cleaning solvent composition according to claim 2 , wherein an amount of the nitroalkane is 0.1 wt % to 20 wt % claim 2 , both inclusive.4. The cleaning solvent composition according to claim 2 , wherein the nitroalkane comprises a nitroethane.5. The cleaning solvent composition according to claim 1 , wherein the additive comprises an epoxide.6. The cleaning solvent composition according to claim 5 , wherein an amount of the epoxide is 0.1 wt % to 20 wt % claim 5 , both inclusive.7. The cleaning solvent composition according to claim 5 , wherein the epoxide comprises a butylene oxide.8. The cleaning solvent composition according to claim 1 , comprising:a nitroethane of 1 wt % to 2 wt %, both inclusive; anda butylene oxide of 1 wt % to 2 wt %, both inclusive.9. The cleaning solvent composition according to claim 1 , wherein the cis-1-chloro-3 claim 1 ,3 claim 1 ,3-trifluoropropene solvent further comprises a lower aliphatic alcohol.10. The cleaning solvent composition according to claim 1 , wherein the cis-1-chloro-3 claim 1 ,3 claim 1 ,3-trifluoropropene solvent further comprises trans-1 claim 1 ,2-dichloroethylene.11. The cleaning solvent composition according to claim 1 , wherein the additive comprises a nitroalkane and an epoxide claim 1 , and a total concentration of the nitroalkane and the epoxide in the cleaning solvent composition is 1 wt % to 20 wt % claim 1 , both inclusive. The ...

Azeotrope-Like Compositions of Tetrafluoropropene And Hydrofluorocarbons

Provided are azeotrope-like compositions comprising tetrafluoropropene and hydrofluorocarbons and uses thereof, including use in refrigerant compositions, refrigeration systems, blowing agent compositions, and aerosol propellants. 1. An azeotrope-like composition consisting essentially of (a) trans-1 ,3 ,3 ,3-tetrafluoropropene (transHFO-1234ze) and (b) 1 ,1-difluoroethane (“HFC-152a”) , said HFC-152a being present in the azeotrope-like composition in a range of from about 50 wt % to less than 100 wt %.2. A heat transfer composition comprising the azeotrope-like composition of .3. The heat transfer composition of wherein said azeotrope-like composition has a boiling point of from about −23° C.+/−1° C. at a pressure of about 14.4 psia.4. A refrigeration system comprising the heat transfer composition of .5. An air conditioning system comprising the heat transfer composition of .6. A refrigeration system originally designed for use with HFC-134a and comprising the heat transfer composition of .7. The heat transfer composition of wherein said heat transfer composition is non-flammable.8. The heat transfer composition of further comprising a lubricant.9. An azeotrope-like composition consisting of (a) trans-1 claim 7 ,3 claim 7 ,3 claim 7 ,3-tetrafluoropropene (transHFO-1234ze) and (b) 1 claim 7 ,1 claim 7 ,1 claim 7 ,2 claim 7 ,2-pentafluoroethane (“HFC-125”) claim 7 , said HFC-125 being present in the azeotrope-like composition in a range of from about 60 wt % to less than about 99 wt % claim 7 , wherein said composition range includes a minimum boiling azeotrope having a liquid composition component concentration equal to the vapor composition component concentration claim 7 , whereby at a pressure of about 14.4 psia said azeotrope-like composition has a boiling point of −47° C.+/−2° C.10. A heat transfer composition comprising the azeotrope-like composition of .11. A refrigeration system comprising the heat transfer composition of .12. The heat transfer composition ...

CLEANING COMPOSITIONS AND METHODS

The present invention relates, in part, to cleaning methods and solvent cleaning compositions including at least one hydrofluoro-olefin or hydrochlorofluoro-olefin solvent for use in connection with cleaning of metal parts, and in certain preferred embodiments cleaning metal parts to be used in an aircraft. 115.-. (canceled)16. A method of repairing or maintaining an aircraft engine containing metal parts , said method comprising cleaning a metal part of the aircraft engine by steps that include contacting the metal part with a solvent composition comprising at least about 50% by weight of 1-chloro-3 ,3 ,3-trifluoropropene (HFCO-1233zd) , said metal part comprising a metal or a metal alloy selected from the group consisting of aluminum and aluminum alloys , titanium and titanium alloys; zinc and zinc alloys; tungsten and tungsten alloys; copper and copper alloys; Inconel-Ni alloys; silver and silver alloys; cadmium and cadmium alloys; stainless steels; gold and gold alloys; and silver and silver alloys.17. The method of wherein said solvent composition consists essentially of HFCO-1233zd.18. The method of wherein said solvent composition consists essentially of trans HFCO-1233zd.19. The method of wherein said cleaning step comprises contacting said metal part of the aircraft engine with said solvent composition.20. The method of wherein said contacting step comprises spraying said solvent composition.21. The method of wherein said contacting step comprises immersing said metal part of the aircraft engine in said solvent composition.22. The method of wherein said solvent composition is in a liquid phase during said immersing step.23. The method of wherein said solvent composition is in a vapor phase during said immersing step.24. The method of wherein said metal part of the aircraft engine is contaminated with cutting oil prior to said contacting step.25. The method of wherein said metal part of the aircraft engine is substantially free of cutting oil after said ...

CLEANING FORMULATION FOR REMOVING RESIDUES ON SURFACES

This disclosure relates to a cleaning composition that contains 1) at least one redox agent; 2) at least one first chelating agent, the first chelating agent being a polyaminopolycarboxylic acid; 3) at least one second chelating agent different from the first chelating agent, the second chelating agent containing at least two nitrogen-containing groups; 4) at least one metal corrosion inhibitor, the metal corrosion inhibitor being a substituted or unsubstituted benzotriazole; 5) at least one organic solvent selected from the group consisting of water soluble alcohols, water soluble ketones, water soluble esters, and water soluble ethers; 6) water; and 7) optionally, at least one pH adjusting agent, the pH adjusting agent being a base free of a metal ion. This disclosure also relates to a method of using the above composition for cleaning a semiconductor substrate. 1. A cleaning composition , comprising:1) at least one redox agent;2) at least one first chelating agent, the first chelating agent being a polyaminopolycarboxylic acid;3) at least one second chelating agent different from the first chelating agent, the second chelating agent comprising at least two nitrogen-containing groups;4) at least one metal corrosion inhibitor, the metal corrosion inhibitor being a substituted or unsubstituted benzotriazole;5) at least one organic solvent selected from the group consisting of water soluble alcohols, water soluble ketones, water soluble esters, and water soluble ethers;6) water; and7) optionally, at least one pH adjusting agent, the pH adjusting agent being a base free of a metal ion.2. The composition of claim 1 , wherein the pH of the composition is between 6 and about 11.3. The composition of claim 1 , wherein the redox agent is hydroxylamine.4. The composition of claim 1 , wherein the composition comprises from about 0.5% to about 20% by weight of the redox agent.5. The composition of claim 1 , wherein the polyaminopolycarboxylic acid is selected from the ground ...

COMPOSITIONS COMPRISING 1,2-DICHLORO-1,2-DIFLUOROETHYLENE FOR USE IN CLEANING AND SOLVENT APPLICATIONS

The present application provides compositions comprising 1,2-dichloro-1,2-difluoroethylene (i.e., CFO-1112) and, optionally, an additional component. The present application further provides use of the compositions provided herein in cleaning, solvent, carrier fluid, and deposition applications. 1. A process for dissolving a solute , comprising contacting and mixing said solute with a sufficient quantity of a composition comprising:i) 1,2-dichloro-1,2-difluoroethylene, and, optionally,ii) a compound selected from N-pentane, HFE-7000, R-1233xfB, R-1336mzzZ, dimethoxymethane, R-1345mzzE, R-43-10mee, R-365mfc, tetrahydrofuran, and R-153-10mzzy.2. The process of claim 1 , wherein the solute comprises rosin flux claim 1 , oil claim 1 , or a mixture thereof.3. The process of claim 2 , wherein the rosin flux is selected from RMA (rosin mildly activated) claim 2 , RA (rosin activated) claim 2 , WS (water soluble) claim 2 , and OA (organic acid) rosin flux claim 2 , or any mixture thereof.4. The process of claim 2 , wherein the oil is selected from mineral oil claim 2 , motor oil claim 2 , silicone oil claim 2 , a fluorinated oil claim 2 , or any mixture thereof.5. The process of claim 1 , further comprising recovering the solute from the composition.6. (canceled)7. (canceled)8. (canceled)9. (canceled)10. (canceled)11. (canceled)12. A process for removing at least a portion of water from the surface of a wetted substrate claim 1 , comprising: i)1,2-dichloro-1,2-difluoroethylene, and, optionally,', 'ii) a compound selected from N-pentane, HFE-7000, R-1233xfB, R-1336mzzZ, dimethoxymethane, R-1345mzzE, R-43-10mee, R-365mfc, tetrahydrofuran, and R-153-10mzzy, and, 'a) contacting the substrate with a composition comprisingb) removing the substrate from contact with the composition.13. The process of claim 12 , wherein composition further comprises at least one surfactant suitable for dewatering or drying the substrate.14. The process of claim 13 , wherein the surfactant is ...

HEAT TRANSFER COMPOSITIONS

A heat transfer composition includes: 1. A heat transfer composition comprising:(i) trans-1,3,3,3-tetrafluoropropene (R-1234ze(E));(ii) a second component selected from difluoromethane (R-32), propane (R-1270), propane (R290) and mixtures thereof;(iii) a third component selected from pentafluoroethane (R-125), 1,1,1,2-tetrafluoroethane (R-34a), and mixtures thereof; and optionally(iv) a fourth component selected from fluoroethane (R-161), 1,1-difluoroethane (R-152a) and mixtures thereof.2. A composition according to claim 1 , comprising from about 5 to about 50% by weight of R-1234ze(E).3. A composition according to claim 1 , comprising from about 10 to about 40% by weight of the second component.4. A composition according to claim 1 , comprising from about 10 to about 80% by weight of the third component.5. A composition according to claim 1 , wherein the second component comprises R-32.6. A composition according to claim 1 , wherein the third component is R-125 and R-134a.7. A composition according to claim 1 , comprising R-161 as the fourth component.8. A composition according to claim 7 , comprising R-1234ze(E) claim 7 , R-32 claim 7 , R-134a and R-161.9. A composition according to claim 8 , comprising from about 5 to about 60% by weight R-1234ze(E) claim 8 , from about 20 to about 50% by weight R-32 claim 8 , from about 10 to about 60% by weight R-161 claim 8 , and from about 10 to about 40% by weight R-134a.10. A composition according to claim 9 , comprising from about 30 to about 60% by weight R-1234ze(E) claim 9 , from about 20 to about 50% by weight R-32 claim 9 , from about 10 to about 30% by weight R-161 claim 9 , and from about 10 to about 25% by weight R-134a.11. A composition according to claim 7 , comprising R-1234ze(E) claim 7 , R-32 claim 7 , R-125 and R-161.12. A composition according to claim 11 , comprising from about 0 to about 65% by weight R-1234ze(E) claim 11 , from about 15 to about 40% by weight R-32 claim 11 , from about 10 to about 30% by ...

USE OF COMPOSITIONS COMPRISING A SOLVENT MIXTURE FOR AVOIDING PATTERN COLLAPSE WHEN TREATING PATTERNED MATERIALS WITH LINE-SPACE DIMENSIONS OF 50 NM OR BELOW

The invention relates to the use of a composition comprising a Cto Calkanol and a carboxylic acid ester of formula (I) wherein Ris selected from a Cto Calkyl, which may be unsubstituted or substituted by OH or F, and —X—[O—X]—H; Ris selected from a Cto Calkyl, which may be unsubstituted or substituted by OH or F, and —X—[O—X]—H; X, Xare independently selected from Cto Calkandiyl, which may be unsubstituted or substituted by OH or F; n is an integer from 1 to 5. wherein, the Cto Calkanol and the carboxylic acid ester are selected so as to form an azeotropic mixture and are present in an amount from 20% by weight below to 20% by weight above such azeotropic mixture. 2. The method of claim 1 , wherein the Cto Calkanol and the carboxylic acid ester are selected so as to form an azeotropic mixture having a temperature minimum and are present in an amount of 10% by weight below to 10% by weight above the azeotropic mixture.3. The method of claim 1 , wherein the Cto Calkanol is selected from the group consisting of methanol claim 1 , ethanol claim 1 , 1-propanol and 2-propanol.4. The method of claim 1 , wherein Ris a Cto Calkyl.5. The method of claim 4 , wherein R claim 4 , Ror both Rand Rare selected from the group consisting of methyl claim 4 , ethyl claim 4 , 1-propyl and 2-propyl.6. The method of claim 1 , wherein R claim 1 , Ror both Rand Rare —X—[O—X]—H claim 1 , wherein Xand Xare each independently an unsubstituted Cto Calkandiyl.7. The method of claim 6 , wherein Xand Xare each independently selected from the group consisting of methanediyl claim 6 , ethanediyl claim 6 , propane-1 claim 6 ,3-diyl and propane-1 claim 6 ,2-diyl.8. The method of claim 1 , wherein the carboxylic acid ester is selected from the group consisting of ethyl acetate and 1-methoxy-2-propylacetate.9. The method of claim 1 , wherein the Cto Calkanol is 2-propanol and the carboxylic acid ester is ethyl acetate.10. The method of claim 9 , wherein the composition comprises 2-propanol in an amount ...

CLEANING COMPOSITIONS AND METHODS

The present invention relates, in part, to cleaning methods and solvent cleaning compositions including at least one hydrofluoro-olefin or hydrochlorofluoro-olefin solvent for use in connection with cleaning of metal parts, and in certain preferred embodiments cleaning metal parts to be used in an aircraft. 1. A method of cleaning metal parts to be used in an aircraft comprising:a. providing a solvent composition comprising at least about 50% by weight of 1233zd: andb. contacting the metal part to be used in an aircraft with said solvent composition, said metal part comprising a metal or a metal alloy selected from titanium and titanium alloys: zinc and zinc alloys; tungsten and tungsten alloys; copper and copper alloys; Inconel-Ni alloys: silver and silver alloys; cadmium and cadmium alloys; stainless steels: gold and gold alloys; and silver and silver alloys.2. The method of wherein said contacting step comprises spraying said metal part with said solvent composition.3. The method of wherein said contacting step comprises immersing said metal part in said solvent composition.4. The method of wherein said solvent composition is in a liquid phase during said immersing step.5. The method of wherein said solvent composition is in a vapor phase during said immersing step.6. The method of claim one wherein said metal part is contaminated with cutting oil prior to said contacting step.7. The method of wherein said metal part is substantially free of cutting oil after said contacting step.8. The method of wherein said solvent composition further comprises methanol.9. The method of wherein said methanol is present in the composition in an amount of from about one to about 10% by weight of the composition.10. The method of wherein said methanol is present in the composition in an amount of from about one to about 5% by weight of the composition.11. The method of wherein said solvent composition further comprises ethanol.12. The method of wherein said ethanol is present in ...

TREATMENT LIQUID, KIT, AND METHOD FOR WASHING SUBSTRATE

A treatment liquid for a semiconductor device is a treatment liquid including water, an organic solvent, and two or more nitrogen-containing aromatic heterocyclic compounds. 1. A treatment liquid for a semiconductor device , comprising:water;an organic solvent; andtwo or more nitrogen-containing aromatic heterocyclic compounds.3. The treatment liquid according to claim 2 ,{'sup': 11', '12, 'wherein the nitrogen-containing aromatic heterocyclic compound (A) is the compound represented by General Formula (I), in which Rand Ris bonded to each other to form a ring, and'}the nitrogen-containing aromatic heterocyclic compound (B) is the compound represented by General Formula (III).4. The treatment liquid according to claim 2 ,wherein a mass content ratio of the nitrogen-containing aromatic heterocyclic compound (A) to the nitrogen-containing aromatic heterocyclic compound (B) is 2 to 30,000.5. The treatment liquid according to claim 2 ,wherein a mass content ratio of the nitrogen-containing aromatic heterocyclic compound (A) to the nitrogen-containing aromatic heterocyclic compound (B) is 100 to 15,000.6. The treatment liquid according to claim 2 ,wherein the nitrogen-containing aromatic heterocyclic compound (B) includes two compounds selected from the group consisting of the compound represented by General Formula (II), the compound represented by General Formula (III), and the compound represented by General Formula (V), anda mass ratio of the two compounds is 1 to 10,000.7. The treatment liquid according to claim 2 ,wherein a content of the nitrogen-containing aromatic heterocyclic compound (B) is 0.01 to 10,000 ppm by mass with respect to a total mass of the treatment liquid.8. The treatment liquid according to claim 2 ,wherein a content of the nitrogen-containing aromatic heterocyclic compound (B) is 0.5 to 80 ppm by mass with respect to a total mass of the treatment liquid.9. The treatment liquid according to claim 1 , further comprising a cobalt ion.10. The ...

SOLVENT COMPOSITIONS FOR USE AS HEPTANE REPLACEMENTS

The present disclosure provides, in part, a solvent composition for use as a heptane replacement. The solvent composition may include a first methylated organosilicon compound, an acetate ester, and either para-Chlorobenzotrifluoride (PCBTF) or a second methylated organosilicon compound or both. 1. A solvent composition comprising:i) a first methylated organosilicon compound comprising about 40% to about 60% by volume of the solvent composition;ii) an acetate ester comprising about 20% v/v to about 40% v/v by volume of the solvent composition; andiii) para-Chlorobenzotrifluoride (PCBTF) comprising about 0% to about 30% by volume of the solvent composition and/or a second methylated organosilicon compound comprising about 0% v/v to about 20% v/v of the solvent composition.2. The solvent composition of wherein:i) the first methylated organosilicon compound comprises about 45% to about 60% by volume of the solvent composition;ii) the acetate ester comprises about 20% v/v to about 35% v/v by volume of the solvent composition; andiii) the para-Chlorobenzotrifluoride (PCBTF) comprises about 10% to about 25% by volume of the solvent composition.3. The solvent composition of wherein:i) the first methylated organosilicon compound comprises about 40% to about 50% by volume of the solvent composition;ii) the acetate ester comprises about 30% v/v to about 40% v/v by volume of the solvent composition; andiii) the second methylated organosilicon compound comprises about 15% v/v to about 20% v/v of the solvent composition.4. The solvent composition of wherein:i) the first methylated organosilicon compound comprises about 45% to about 50% by volume of the solvent composition;ii) the acetate ester comprises about 30% v/v to about 40% v/v by volume of the solvent composition;iii) the para-Chlorobenzotrifluoride (PCBTF) comprises about 5% to about 17.5% by volume of the solvent composition; andiv) the second methylated organosilicon compound comprises about 2.5% v/v to about 15% v/v ...

SOLVENT VAPOR PHASE DEGREASING AND DEFLUXING COMPOSITIONS, METHODS, DEVICES AND SYSTEMS

The present invention relates, in part, to compositions that include (1) a first component comprising an alcohol, (b) a second component selected from the group consisting of a glycol ether, a terpene, a halogenated hydrocarbon, and combinations thereof, (c) a third component selected from the group consisting of a hydrohaloether, a decahalopentane, and combinations thereof. 1. A method for removing residual soils or surface contamination from a part comprising:A) immersing the part in a liquid solvent composition comprising (a) a first component comprising an alcohol selected from the group consisting of methanol, ethanol and isopropanol, (b) a second component selected from the group consisting of a glycol ether, a terpene, a halogenated hydrocarbon, and combinations thereof, and (c) a third component selected from the group consisting of a hydrohaloether, a decahalopentane, and combinations thereof;B) vaporizing a portion of the liquid solvent composition to form a vapor space comprising a vaporized portion of component (a) and (c) and amounts of component (b) sufficiently low such that a flammability-suppression blank exists in said vapor space; andC) drying the part within the flammability-suppression blanket.2. The method of claim 1 , wherein component (c) has a boiling point that is at least 10° C. higher than components (a) and (b) or any azeotrope or azeotrope-like composition formed between components (a) and (b).3. The method of wherein component (c) has a boiling point that is at least 25° C. higher than components (a) and (b) or any azeotrope or azeotrope-like composition formed between components (a) and (b).4. The method of wherein component (c) has a boiling point that is at least 50° C. higher than components (a) and (b) or any azeotrope or azeotrope-like composition formed between components (a) and (c).5. A method for removing residual soils or surface contamination from a part comprising:A) immersing the part in a liquid solvent composition ...

SOLVENT COMPOSITION, CLEANING METHOD AND METHOD OF FORMING A COATING FILM

There is provided a solvent composition which is a stable solvent composition which is excellent in solubility of various organic substances, has a sufficient drying property, and has no adverse effect on a global environment, is stabilized not to decompose, and moreover suppresses metal corrosion under coexistence with metal, and which can be used without having an adverse effect on articles of various materials such as metal, plastic, and elastomer in a wide range of industrial uses such as cleaning and dilution coating uses. A solvent composition including: a solvent (A) including (Z)-1-chloro-3,3,3-trifluoro-1-propene; and a stabilizer (B) consisting of HCFC whose boiling point at normal pressure is not lower than 30° C. nor higher than 60° C. 1. A solvent composition comprising:a solvent including (Z)-1-chloro-3,3,3-trifluoro-1-propene; anda stabilizer consisting of a saturated hydrochlorofluorocarbon whose boiling point at normal pressure is not lower than 30° C. nor higher than 60° C.2. The solvent composition according to claim 1 , wherein a proportion of a content of the stabilizer to a content of the solvent is 1 mass ppm to 1 mass %.3. The solvent composition according to claim 1 , wherein a proportion of the content of the stabilizer to a content of (Z)-1-chloro-3 claim 1 ,3 claim 1 ,3-trifluoro-1-propene is 1 mass ppm to 1 mass %.4. The solvent composition according to claim 1 , wherein a proportion of the content of (Z)-1-chloro-3 claim 1 ,3 claim 1 ,3-trifluoro-1-propene to a total amount of the solvent is 80 to 100 mass %.5. The solvent composition according to claim 1 , wherein the saturated hydrochlorofluorocarbon whose boiling point at normal pressure is not lower than 30° C. nor higher than 60° C. is one or more selected from a group consisting of 2-chloro-3 claim 1 ,3 claim 1 ,3-trifluoropropane claim 1 , 1-chloro-3 claim 1 ,3 claim 1 ,3-trifluoropropane claim 1 , 1 claim 1 ,1-dichloro-2 claim 1 ,2 claim 1 ,3 claim 1 ,3 claim 1 ,3- ...

HEAT TRANSFER COMPOSITIONS

The invention provides a heat transfer composition consisting essentially of from about 82 to about 88% by weight of trans-1,3,3,3-tetrafluoropropene (R-1234ze(E)) and from about 12 to about 18% by weight of 1,1-difluoroethane (R-152a). The invention also provides a heat transfer composition comprising from about 5 to about 85% by weight R-1234ze(E), from about 2 to about 20% by weight R-152and from about 5 to about 60 by weight 1,1,1,2-tetrafluoroethane (R-134a). 1. A heat transfer composition consisting essentially of from about 82 to about 88% by weight of R-1234ze(E) and from about 12 to about 18% by weight of R-152a.2. A composition according to claim 1 , consisting essentially of from about 83 to about 87% by weight of R-1234ze(E) and from about 13 to about 17% by weight of R-152a.3. (canceled)4. A heat transfer composition comprising from about 5 to about 20% by weight R-152a claim 1 , from about 10 to about 55% R-134a claim 1 , and from about 30 to about 80% by weight R-1234ze(E).5. A composition according to claim 4 , comprising from about 10 to about 18% by weight R-152a claim 4 , from about 10 to about 50% R-134a claim 4 , and from about 32 to about 78% by weight R-1234ze(E).6. A composition according to claim 4 , comprising from about 12 to about 18% by weight R-152a claim 4 , from about 15 to about 50% R-134a claim 4 , and from about 32 to about 70% by weight R-1234ze(E).7. A composition according to claim 4 , consisting essentially of R-1234ze(E) claim 4 , R-152a and R-134a.8. A composition according claim 4 , wherein the composition has a GWP of less than 1000.9. A composition according claim 4 , wherein the temperature glide is less than about 10 K.10. A composition according claim 4 , wherein the composition has a volumetric refrigeration capacity within about 15% of the existing refrigerant that it is intended to replace.11. A composition according to claim 4 , wherein the composition is less flammable than R-152a alone or R-1234yf alone.12. A ...

CLEANING LIQUID FOR LITHOGRAPHY AND METHOD FOR FORMING WIRING

A cleaning liquid for lithography, and a method for forming a wiring using the cleaning liquid for lithography. The cleaning liquid for includes an alkali or an acid, a solvent, and a silicon compound generating a silanol group through hydrolysis. The method forms a metal wiring layer by embedding a metal in an etching space formed in a low dielectric constant layer of a semiconductor multilayer laminate. In this method, the semiconductor multilayer laminate is cleaned using the cleaning liquid for lithography, after formation of the etching space. 1. A method of cleaning a semiconductor device , comprising cleaning the semiconductor device with a cleaning liquid comprising an alkali or an acid , a solvent , and a silicon compound that generates a silanol group through hydrolysis.2. The method of claim 1 , wherein the silicon compound is a alkoxysilane represented by the following formula (1) or a partial hydrolysis condensate thereof:{'br': None, 'sup': 1', '2, 'sub': 4-n', 'n, 'RSi(OR)\u2003\u2003(1)'}Wherein R1 represents an organic group, R2 represents an alkyl group having 1 to 4 carbon atoms, and n is an integer of 1 to 4.3. The method of claim 1 , wherein the amount of the silicon compound is 5% by mass or less.4. The method of claim 1 , wherein the alkali includes a quaternary ammonium hydroxide.6. The method of claim 4 , wherein the amount of the quaternary ammonium hydroxide is 0.05 to 10% by mass.7. The method of claim 4 , wherein the amount of the quaternary ammonium hydroxide is 0.1 to 5% by mass.8. The method of claim 1 , wherein the alkali includes an alkanolamine.9. The method of claim 8 , wherein the amount of the alkanolamine is 0.05 to 20% by mass.10. The method of claim 8 , wherein the amount of the alkanolamine is 0.1 to 10% by mass.11. The method of claim 1 , wherein the alkali includes a combination of a quaternary ammonium hydroxide and an inorganic base.12. The method of claim 1 , wherein the acid includes hydrofluoric acid.13. The method of ...

SOLVENT COMPOSITION, CLEANING METHOD, METHOD FOR PRODUCING SUBSTRATE WITH COATING FILM, AND HEAT TRANSFER FLUID

To provide a solvent composition in which various organic substances are soluble, and which has no adverse effect on global environment. A solvent composition comprising 1-chloro-2,3,3,4,4,5,5-heptafluoro-1-pentene, a cleaning method using the solvent composition, a method for producing a substrate with a coating film, and a heat transfer fluid. 1. A solvent composition comprising 1-chloro-2 ,3 ,3 ,4 ,4 ,5 ,5-heptafluoro-1-pentene.2. The solvent composition according to claim 1 , wherein the proportion of the content of 1-chloro-2 claim 1 ,3 claim 1 ,3 claim 1 ,4 claim 1 ,4 claim 1 ,5 claim 1 ,5-heptafluoro-1-pentene to the total amount of the solvent composition is at least 50 mass %.3. The solvent composition according to claim 1 , wherein in the 1-chloro-2 claim 1 ,3 claim 1 ,3 claim 1 ,4 claim 1 ,4 claim 1 ,5 claim 1 ,5-heptafluoro-1-pentene claim 1 , the proportion of the content of (Z)-1-chloro-2 claim 1 ,3 claim 1 ,3 claim 1 ,4 claim 1 ,4 claim 1 ,5 claim 1 ,5-heptafluoro-1-pentene to the total amount of (Z)-1-chloro-2 claim 1 ,3 claim 1 ,3 claim 1 ,4 claim 1 ,4 claim 1 ,5 claim 1 ,5-heptafluoro-1-pentene and (E)-1-chloro-2 claim 1 ,3 claim 1 ,3 claim 1 ,4 claim 1 ,4 claim 1 ,5 claim 1 ,5-heptafluoro-1-pentene is at least 50 mass %.4. The solvent composition according to claim 1 , which further contains a solvent soluble in 1-chloro-2 claim 1 ,3 claim 1 ,3 claim 1 ,4 claim 1 ,4 claim 1 ,5 claim 1 ,5-heptafluoro-1-pentene.5. The solvent composition according to claim 1 , which contains claim 1 , as a solvent soluble in 1-chloro-2 claim 1 ,3 claim 1 ,3 claim 1 ,4 claim 1 ,4 claim 1 ,5 claim 1 ,5-heptafluoro-1-pentene claim 1 , at least one member selected from the group consisting of isopropanol claim 1 , 1-butanol claim 1 , 2-methyl-1-propanol claim 1 , 2 claim 1 ,2 claim 1 ,4-trimethylpentane claim 1 , cyclohexane claim 1 , methyl ethyl ketone claim 1 , methyl isobutyl ketone claim 1 , propylene glycol methyl ethyl acetate claim 1 , ethyl acetate claim 1 , ...

SOLVENT COMPOSITIONS CONTAINING 1,2,2-TRIFLUORO-1-TRIFLUOROMETHYLCYCLOBUTANE (TFMCB)

The use of compositions comprising 1,2,2-trifluoro-1-trifluoromethyl cyclobutane (TFMCB) as a solvent are disclosed, wherein the TFMCB may be formulated into solvent compositions including a co-solvent such as ethanol or trans-dichloroethylene (trans-DCE). The solvent compositions may be in the form of a sprayable aerosol composition, and may be used for applications including degreasing or removal of coatings such as paints and adhesives. 1. A solvent composition comprising at least about 5% by weight of 1-trifluoromethyl-1 ,2 ,2-trifluorocyclobutane (TFMCB) and at least one co-solvent.2. The solvent composition of claim 1 , wherein the co-solvent is selected from the group consisting of ethanol and trans-dichloroethylene (trans-DCE).3. An aerosol and/or a sprayable composition comprising the solvent composition of .4. A method of removing a contaminant from an article comprising contacting the contaminated article with the solvent composition of .5. The method of claim 4 , wherein the article is selected from the group consisting of a metal claim 4 , a glass claim 4 , silica claim 4 , and alumina.6. A method of removing a coating from an article comprising contacting the contaminated article with the solvent composition of .7. The method of claim 6 , wherein the coating is selected from the group consisting of a paint and an adhesive.8. The solvent composition of claim 2 , wherein the solvent composition has a Global Warming potential (GWP) of not greater than about 1000.9. The solvent composition of claim 2 , wherein the co-solvent is ethanol claim 2 , and the solvent composition comprises from about 95% to about 99% by weight of TFMCB and from about 1% to about 5% by weight ethanol.10. The solvent composition of claim 9 , wherein the co-solvent is ethanol claim 9 , and the solvent composition comprises from about 96% to about 98% by weight of TFMCB and from about 2% to about 4% by weight ethanol.11. An aerosol and/or a sprayable composition comprising the ...

CLEANER COMPOSITION, CLEANING AEROSOL, AND METHOD FOR CLEANING CONTAMINATED PART

The present invention provides a cleaner composition having excellent cleaning properties and appropriate drying properties. The present invention is a cleaner composition including: (A) a hydrofluoroolefin having a boiling point of 30° C. or more and less than 100° C.; and (B) at least one of a perfluoropolyether having a boiling point of 100° C. or more and a hydrofluoroolefin having a boiling point of 100° C. or more, where a mass ratio of the component (A) and the component (B) is 99:1 to 55:45. 1. A cleaner composition comprising:(A) a hydrofluoroolefin having a boiling point of 30° C. or more and less than 100° C.; and(B) at least one of a perfluoropolyether having a boiling point of 100° C. or more and a hydrofluoroolefin having a boiling point of 100° C. or more,wherein a mass ratio of the component (A) and the component (B) is 99:1 to 55:45.2. The cleaner composition according to claim 1 ,wherein a boiling point of the component (A) is 30° C. or more and less than 90° C.3. The cleaner composition according to claim 1 , wherein a boiling point of the component (B) is 100° C. or more and less than 150° C.4. The cleaner composition according to claim 1 , wherein the component (B) is at least one of methoxyperfluoroheptene and a perfluoropolyether having a boiling point of 100° C. or more.5. The cleaner composition according to claim 1 , wherein the component (A) has one or more chlorine atoms in its molecule.6. The cleaner composition according to claim 1 , wherein the component (A) is cis-1-chloro-3 claim 1 ,3 claim 1 ,3-trifluoropropene.7. A cleaning aerosol obtained by filling a pressure-resistant container with the cleaner composition according to .8. A method for cleaning a contaminated part claim 7 , comprising injecting the cleaning aerosol according to onto a contaminant attached to the contaminated part.9. The method for cleaning a contaminated part according to claim 8 , wherein the contaminated part is a brake part.10. The method for cleaning a ...

SOLVENT COMPOSITION

One of the problems is to provide a solvent composition which has a little adverse effect on the global environment and has excellent stability when a compound having a perfluoropolyether (PFPE) group is in a solution state. In an embodiment, the problem is solved by providing a solvent composition for dissolving a compound having a perfluoropolyether (PFPE) group includes Z-1,2-dichloro-3,3,3-trifluoropropene (1223xd(Z)) as a main component. 1. A solvent composition for dissolving a compound having a perfluoropolyether group , comprising: Z-1 ,2-dichloro-3 ,3 ,3-trifluoropropene as a main component.2. The solvent composition according to claim 1 , comprising: E-1 claim 1 ,2-dichloro-3 claim 1 ,3 claim 1 ,3-trifluoropropene.3. The solvent composition according to claim 1 , comprising: at least one organic solvent selected from HFCs claim 1 , HFEs claim 1 , HFOs.4. The solvent composition according to any one of claim 1 , comprising: at least one selected from a stabilizer claim 1 , a flame retardant claim 1 , a surfactant claim 1 , a metal passivator claim 1 , or a rust-preventing agent.6. A solution comprising: the solvent composition according to claim 1 , and a compound having a perfluoropolyether group.8. A method for cleaning an article with a compound having a perfluoropolyether group attached using the solvent composition according to .10. The method according to claim 8 , wherein a material of the article is polycarbonate claim 8 , acrylic resin or ABS resin.11. A method of forming a coating film claim 6 , comprising: coating the solution according to to a surface of an article; volatilizing the solvent composition from the article; and forming the coating film including the compound having the perfluoropolyether group on the surface of the article.12. The method according to claim 11 , wherein a material of the article is polycarbonate claim 11 , acrylic resin or ABS resin. This application is based upon and claims the benefit of priority from the prior ...

CLEANING SOLVENT COMPOSITIONS AND THEIR USE

A cleaning solvent composition comprises from about 0.2 to 15 weight percent of mono- or di-phosphate ester in free acid form, and from about 85 to 99.8 weight percent of one or more halogenated hydrocarbon solvents. Other cleaning solvent compositions further comprise one or more alcohols. For example, such alcohol-containing compositions may comprise from about 0.2 to 15 weight percent of mono- or di-phosphate ester in free acid form, from about 2 to about 25 weight percent of one or more alcohols, and from about 25 to about 97.8 weight percent of one or more halogenated hydrocarbon solvents. 3. The composition of wherein n is an integer from 2 to 5.4. The composition of or wherein the alcohol is selected from the group consisting of one or more of methanol claim 2 , ethanol claim 2 , isopropanol and n-butanol.5. The composition of or wherein the one or more halogenated hydrocarbon solvents are selected from the group consisting of one or more of perfluorocarbons (“PFCs”) claim 2 , chlorofluorocarbons (“CFCs”) claim 2 , hydrofluorocarbons (“HFCs”) claim 2 , hydrofluoroethers (“HFEs”) claim 2 , hydrofluoroolefins (“HFOs”) claim 2 , partially brominated hydrocarbons claim 2 , fully brominated hydrocarbons claim 2 , partially chlorinated hydrocarbons and fully chlorinated hydrocarbons.6. The composition of or wherein:the halogenated hydrocarbon solvent comprises trans-chlorotrifluoromethyl propene and is present in the amount of from about 50 to about 96 weight percent of the composition;the alcohol comprises one or more of straight and branched chain alkyl alcohols, aromatic and heteroaromatic alcohols, all having from 1-20 carbon atoms and is present in the amount of from about 2 to about 15 weight percent of the composition; andthe phosphate ester surfactant comprises one or more of alkoxylated alkyl and aryl substituted phosphate esters, alkoxylated phosphate esters, fluorinated alkyl and aromatic phosphate esters, and alkyl and aromatic substituted phosphate ...

THINNER COMPOSITION

A thinner composition includes propyleneglycol C1-C10 alkylether, C1-C10 alkyl C1-C10 alkoxy propionate, and C1-C10 alkyl lactate, thereby is it possible to improve applicability of a photoresist while remarkably reducing an amount of the used photoresist, as well as having excellent solubility and EBR property to various photoresists, BARCs and underlayers. 1. A thinner composition comprising:propyleneglycol C1-C10 alkylether;C1-C10 alkyl C1-C10 alkoxy propionate; andC1-C10 alkyl lactate.2. The thinner composition according to claim 1 , wherein the propyleneglycol C1-C10 alkylether is at least one selected from a group consisting of propyleneglycol methylether claim 1 , propyleneglycol ethylether claim 1 , propyleneglycol propylether and propyleneglycol butylether.3. The thinner composition according to claim 1 , wherein the C1-C10 alkyl C1-C10 alkoxy propionate is at least one selected from a group consisting of methylmethoxy propionate claim 1 , methylethoxy propionate claim 1 , ethylmethoxy propionate and ethylethoxy propionate.4. The thinner composition according to claim 1 , wherein the C1-C10 alkyl lactate is at least one selected from a group consisting of methyl lactate claim 1 , ethyl lactate claim 1 , propyl lactate and butyl lactate.5. The thinner composition according to claim 1 , wherein 40 to 80% by weight of propyleneglycol C1-C10 alkylether claim 1 , 15 to 50% by weight of C1-C10 alkyl C1-C10 alkoxy propionate claim 1 , and 1 to 20% by weight of C1-C10 alkyl lactate.6. The thinner composition according to claim 1 , wherein 50 to 70% by weight of propyleneglycol claim 1 , 20 to 40% by weight of C1-C10 alkyl C1-C10 alkoxy propionate claim 1 , and 5 to 15% by weight of C1-C10 alkyl lactate.7. A method for treatment of a substrate using the thinner composition according to before applying a photoresist to the substrate.8. A method for treatment of a substrate using the thinner composition according to after applying a photoresist to the substrate and ...

SOLVENT COMPOSITION

It is an object of the present invention to provide a stable solvent composition which provides excellent solubility of various organic substances, has sufficient drying property and has no adverse influences on global environment and is stabilized and not decomposed, and which can be used without adversely affecting objects made of various materials such as metal, plastic or elastomer, for a wide range of industrial use such as cleaning or coating. 1. A solvent composition comprising 1 ,1-dichloro-2 ,3 ,3 ,3-tetrafluoropropene , and at least one stabilizer selected from the group consisting of a phenol , an ether , an epoxide and an amine.2. The solvent composition according to claim 1 , wherein said stabilizer is contained in an amount of from 1 mass ppm to 10 mass % claim 1 , to 1 claim 1 ,1-dichloro-2 claim 1 ,3 claim 1 ,3 claim 1 ,3-tetrafluoropropene.3. The solvent composition according to claim 1 , wherein 1 claim 1 ,1-dichloro-2 claim 1 ,3 claim 1 ,3 claim 1 ,3-tetrafluoropropene is contained in an amount of at least 80 mass % claim 1 , to the solvent composition.4. The solvent composition according to claim 1 , wherein the phenol is phenol claim 1 , 1 claim 1 ,2-benzenediol claim 1 , 2 claim 1 ,6-di-tert-butyl-4-methylphenol claim 1 , 3-cresol claim 1 , 2-isopropyl-5-methylphenol or 2-methoxyphenol.5. The solvent composition according to claim 1 , wherein the phenol is contained in an amount of from 5 mass ppm to 5 mass % claim 1 , to 1 claim 1 ,1-dichloro-2 claim 1 ,3 claim 1 ,3 claim 1 ,3-tetrafluoropropene.6. The solvent composition according to claim 1 , wherein the ether is 1 claim 1 ,4-dioxane claim 1 , 1 claim 1 ,3-dioxane claim 1 , 1 claim 1 ,3 claim 1 ,5-trioxane claim 1 , furan claim 1 , 2-methylfuran claim 1 , tetrahydrofuran claim 1 , ethyl phenyl ether or diethylene glycol monoethyl ether.7. The solvent composition according to claim 1 , wherein the ether is contained in an amount of from 0.01 mass % to 5 mass % claim 1 , to 1 claim 1 ,1- ...

Method for Cleaning a (Meth)Acrylate Ester Process Tank

Provided is a method for removing deposited solid residue from equipment used in the processing of (meth)acrylic acid or esters, including the steps of dissolving the solid residue in a cleaning solution comprising an organic carboxylic acid to produce a solid residue slurry; and removing the solid residue slurry from the equipment. 1. A method for removing solid residue from equipment used in the processing of (meth)acrylic acid or esters , comprising the steps of:dissolving the solid residue in a cleaning solution comprising an organic carboxylic acid having 2-10 carbon atoms to produce a solid residue slurry; andremoving the solid residue slurry from the equipment.2. The method of wherein the organic carboxylic acid is acetic acid claim 1 , propionic acid claim 1 , acetic anhydride claim 1 , propionic anhydride or combinations thereof.3. The method of wherein the cleaning solution has a pKa from 3 to 7.4. The method of wherein the cleaning solution to solid residue is in a ratio of greater than 0 to 1.5. The method of wherein the cleaning solution to solid residue is in a ratio of 1 to 1.6. The method of wherein the cleaning solution to solid residue is in a ratio of 2 to 1.7. The method of further comprising soaking the solid residue in the cleaning solution for 24 hours before removing the solid residue slurry.8. The method of wherein the cleaning solution further comprises 3-5 wt % of acrylic acid and 1-2 wt % of water.9. The method of wherein the cleaning solution is an acetic acid by-product solution obtained from an acrylic acid process.10. The method of wherein the dissolving solid residue in the cleaning solution comprises agitating the solid residue.11. The method of wherein the dissolving and removing steps are repeated after 24 hours.12. The method of wherein the dissolving step is carried out at temperatures less than 100° C. and at atmospheric pressure.13. The method of wherein the dissolving step is carried out at temperatures less than 40° C. and ...

LOW VOC CLEANER

A cleaner composition with improved cleaning of hydrophobic contaminants typically found on used brake assemblies and parts, including one or more low vapor pressure hydrocarbon solvents, one or more exempted volatile organic compounds, and a non-exempt volatile organic compound. 1. A cleaner composition comprising:20% to 45% by weight of a low vapor pressure hydrocarbon solvent;50% to 80% by weight acetone; and0% to 10% by weight heptane.2. The cleaner composition of claim 1 , further comprising:about 25% by weight of a low vapor pressure hydrocarbon solvent;about 65% by weight acetone; andabout 10% by weight heptane.3. The cleaner composition of claim 1 , further comprising 3% to 10% by weight carbon dioxide.4. The cleaner composition of claim 3 , further comprising:about 25% by weight of a low vapor pressure hydrocarbon solvent;about 60% by weight acetone;about 10% by weight heptane; andabout 5% by weight carbon dioxide.5. A cleaner composition comprising:20% to 45% by weight of one or more low vapor pressure hydrocarbon solvents;50% to 80% by weight of one or more exempted volatile organic compounds; and0% to 10% by weight of a non-exempt volatile organic compound.6. The cleaner composition of claim 5 , further comprising:about 25% by weight of one or more low vapor pressure hydrocarbon solvents;about 65% by weight of one or more exempted Volatile Organic Compounds; andabout 10% by weight of a non-exempt volatile organic compound.7. The cleaner composition of claim 5 , further comprising 3% to 10% by weight of at least one compressed gas selected from the list including: carbon dioxide claim 5 , nitrogen and air.8. The cleaner composition of claim 7 , further comprising:about 25% by weight of one or more low vapor pressure hydrocarbon solvents;about 60% by weight of one or more exempted volatile organic compounds; andabout 10% by weight of a non-exempt volatile organic compound; andabout 5% by weight of at least one compressed gas selected from the list ...

HEAT TRANSFER COMPOSITIONS

The invention provides a heat transfer composition comprising: 1. A heat transfer composition comprising:from about 5% to about 40% by weight of R-1234ze(E);from about 20% to about 35% by weight R-32;from about 15% to about 30% by weight R-125; andfrom about 12% to about 50% by weight R-134a.2. A composition according to claim 1 , wherein the composition has a GWP of less than 1800.3. A composition according to claim 1 , wherein the temperature glide is less than about 15 k.4. A composition according to claim 1 , wherein the composition has a volumetric refrigeration capacity within about 15% of the existing refrigerant that it is intended to replace.5. A composition according to claim 1 , wherein the composition is less flammable than R-32 alone.7. A composition according to which is non-flammable.8. A composition according to claim 1 , wherein the composition has a cycle efficiency within about 10% of the existing refrigerant that it is intended to replace.9. A composition according to claim 1 , wherein the composition has a compressor discharge temperature within about 15 k claim 1 , of the existing refrigerant that it is intended to replace.10. A composition according to further comprising a lubricant.11. A composition according to claim 10 , wherein the lubricant is selected from mineral oil claim 10 , silicone oil claim 10 , polyalkyl benzenes (PABs) claim 10 , polyol esters (POEs) claim 10 , polyalkylene glycols (PAGs) claim 10 , polyalkylene glycol esters (PAG esters) claim 10 , polyvinyl ethers (PVEs) claim 10 , poly (alpha-olefins) and combinations thereof.12. A composition according to further comprising a stabilizer.13. A composition according to claim 12 , wherein the stabilizer is selected from the group consisting of: diene-based compounds claim 12 , phosphates claim 12 , phenol compounds and epoxides claim 12 , and mixtures thereof.14. A composition according to further comprising a flame retardant.15. A composition according to claim 1 , wherein the ...

USE OF COMPOSITIONS COMPRISING A SILOXANE-TYPE ADDITIVE FOR AVOIDING PATTERN COLLAPSE WHEN TREATING PATTERNED MATERIALS WITH LINE-SPACE DIMENSIONS OF 50 NM OR BELOW

The invention relates to the use of a non-aqueous composition comprising an organic solvent and at least one particular siloxane-type additive for treating substrates comprising patterns having line-space dimensions of 50 nm or below and aspect ratios of 4 or more as well as a method for manufacturing integrated circuit devices, optical devices, micromachines and mechanical precision devices, the said method comprising the steps of (1) providing a substrate having patterned material layers having line-space dimensions of 50 nm, aspect ratios of greater or equal 4, or a combination thereof, (2) contacting the substrate at least once with a non-aqueous composition, and (3) removing the non-aqueous composition from the contact with the substrate, wherein the non-aqueous composition comprising an organic solvent and at least one of such siloxane-type additives. 2: The method according to claim 1 , wherein the organic solvent is a polar protic organic solvent.3: The method according to claim 1 , wherein the organic solvent is a linear or branched Cto Calkanol.4: The method according to claim 3 , wherein the organic solvent is isopropanol.5: The method according to claim 1 , wherein a content of water in the non-aqueous composition is lower than 0.1% by weight.6: The method according to claim 1 , wherein the non-aqueous composition consists essentially of the organic solvent and the at least one additive of formula I claim 1 , II claim 1 , III or IV.7: The method according to claim 1 , wherein the at least one additive of formula I claim 1 , II claim 1 , III or IV is present in a concentration from 0.001 to 0.1% by weight.8: The method according to claim 1 , wherein the at least one additive is a compound of formula I claim 1 , wherein{'sup': 1', '2, 'Rand Rare independently selected from H, methyl or ethyl,'}e is 0, 1 or 2,b and d are 0, 1 or 2,a and c are integers independently selected from 1 to 22,{'sup': 10', '12, 'Rand Rare independently selected from H, methyl or ...

DUST-REMOVING CLEANING AGENT AND CLEANING METHOD USING SAME

To provide a dust-removing cleaning agent for reducing the re-adherence of particles of dust, grime, and the like to a substrate after these particles have been removed from the substrate. A dust-removing cleaning agent having a particle adherence-reducing function and containing a fluoride solvent and an alcohol having at least four carbon atoms in the backbone thereof, and a cleaning method using the same. 1. A dust-removing cleaning agent having a particle adherence-reducing function , the agent comprising a fluorinated solvent and an alcohol having at least four carbon atoms in the backbone thereof.2. The dust-removing cleaning agent according to claim 1 , wherein the alcohol is an alcohol having an unbranched backbone.3. The dust-removing cleaning agent according to claim 1 , wherein the alcohol is a normal alcohol.4. The dust-removing cleaning agent according to claim 1 , having at least 0.04 mol of the alcohol per 1 claim 1 ,000 g of the fluorinated solvent.5. The dust-removing cleaning agent according to claim 1 , wherein the fluorinated solvent is a hydrofluoroether and/or a hydrofluorocarbon.6. A method for removing contaminants from a surface of a substrate claim 1 , the method comprising the steps of:bringing into contact a dust-removing cleaning agent having a particle adherence-reducing function and containing a fluorinated solvent and an alcohol having at least four carbon atoms in the backbone thereof and a substrate; andremoving the dust-removing cleaning agent from the substrate. The present invention relates to a dust-removing cleaning agent having a particle adherence-reducing function, and a cleaning method using the same.Fluoride solvents or mixed solvents containing a fluoride solvent and another typical cleaning solvent are used to remove contaminants adhering to the surface of a substrate such as metal, glass, ceramic, plastic, fabric, or the like.Japanese Translation of Published PCT Application H10-512609 discloses a cleaning composition ...

SOLVENT VAPOR PHASE DEGREASING AND DEFLUXING COMPOSITIONS, METHODS, DEVICES AND SYSTEMS

The present invention relates, in part, to compositions that include (1) a first component comprising an alcohol, (b) a second component selected from the group consisting of a glycol ether, a terpene, a halogenated hydrocarbon, and combinations thereof, (c) a third component selected from the group consisting of a hydrohaloether, a decahalopentane, and combinations thereof. 1. A method for removing residual soils or surface contamination from a part comprising:A) immersing the part in a liquid solvent composition comprising (a) a first component comprising an alcohol selected from the group consisting of methanol, ethanol and isopropanol, (b) a second component selected from the group consisting of a glycol ether, a terpene, a halogenated hydrocarbon, and combinations thereof, and (c) a third component selected from the group consisting of a hydrohaloether, a decahalopentane, and combinations thereof;B) vaporizing a portion of the liquid solvent composition to form a vapor space comprising a vaporized portion of component (a) and (c) and amounts of component (b) sufficiently low such that a flammability-suppression blank exists in said vapor space; andC) drying the part within the flammability-suppression blanket.2. The method of claim 1 , wherein component (c) has a boiling point that is at least 10° C. higher than components (a) and (b) or any azeotrope or azeotrope-like composition formed between components (a) and (b).3. The method of wherein component (c) has a boiling point that is at least 25° C. higher than components (a) and (b) or any azeotrope or azeotrope-like composition formed between components (a) and (b).4. The method of wherein component (c) has a boiling point that is at least 50° C. higher than components (a) and (b) or any azeotrope or azeotrope-like composition formed between components (a) and (c).5. A method for removing residual soils or surface contamination from a part comprising:A) immersing the part in a liquid solvent composition ...

NON-FLAMMABLE TERNARY COMPOSITIONS AND USE OF THESE COMPOSITIONS

Non-flammable ternary compositions and use of these compositions. The invention relates to certain non-flammable compositions containing, 1,1,3,3-pentafluorobutane (R365mfc), 1,2-dichloroethylene and a hydrofluoroether, to mixtures containing these compositions and to the use of these non-flammable compositions or these mixtures, especially as precision cleaning agents for solid surfaces and for flushing, especially of refrigeration systems. 1. A non-flammable composition consisting or consisting essentially of(a) 1,1,1,3,3-pentafluorobutane (R365mfc) in a concentration of 10-15 wt %,(b) 1,2-dichloroethylene in a concentration of 65-85 wt %, and(c) a hydrofluoroether in a concentration of 5-20 wt %.2. The non-flammable composition of consisting or consisting essentially of(a) 1,1,1,3,3-pentafluorobutane (R365mfc) in a concentration of 10-15 wt %,(b) 1,2-dichloroethylene in a concentration of 70-80 wt %, and(c) a hydrofluoroether in a concentration of 10-15 wt %.3. The non-flammable composition of consisting or consisting essentially of(a) 1,1,1,3,3-pentafluorobutane (R365mfc) in a concentration of 12-13 wt %,(b) 1,2-dichloroethylene in a concentration of 74-76 wt %, and(c) a hydrofluoroether in a concentration of 12-13 wt %.4. The non-flammable composition of wherein the 1 claim 1 ,2-dichloroethylene consists essentially of trans-1 claim 1 ,2-dichloroethylene.5. The non-flammable composition of wherein the composition is azeotropic.6. The non-flammable composition of wherein the composition is pseudo-azeotropic.7. The non-flammable composition of wherein the composition has a GWP of <500.8. The non-flammable composition of wherein the hydrofluoroether is ethoxynonafluorobutane (HFE-7200).9. The non-flammable composition of wherein the hydrofluoroether is methoxynonafluorobutane (HFE-7100).10. A mixture comprising the non-flammable composition of and at least one stabilizer and/or at least one propellant.11. The mixture of wherein the mixture comprises at least one ...

Azeotropic Composition Having Fluorine-Containing Olefin as Constituent

A liquid composition according to one embodiment of the present invention contains 0.0001 mol % to 40 mol % (Z)-1,2-dichloro-3,3,3-trifluoropropene (1223Z) and 99.9999 mol % to 60 mol % (E)-1,2-dichloro-ethylene (t-DCE). The liquid composition has less influence on the global environment and azeotropic (or azeotrope-like) properties. There occurs practically no composition change even when the liquid composition is used in an open system or used for a long term. Further, it is less likely that there will occur a composition change even when the liquid composition is recovered by distillation. The liquid composition is thus suitably usable as a cleaning agent (solvent). In particular, the liquid composition of 90 mol % or less of t-DCE is classified as non-hazardous under the Fire Serves Act. 18.-. (canceled)9. An azeotrope-like composition comprising (Z)-1 ,2-dichloro-3 ,3 ,3-trifluoropropene and (E)-1 ,2-dichloro-ethylene.10. The azeotrope-like composition according to claim 9 , which comprises 0.0001 mol % to 40 mol % of the (Z)-1 claim 9 ,2-dichloro-3 claim 9 ,3 claim 9 ,3-trifluoropropene and 99.9999 mol % to 60 mol % of the (E)-1 claim 9 ,2-dichloro-ethylene.11. The azeotrope-like composition according to claim 9 , which comprises 10 mol % to 40 mol % of the (Z)-1 claim 9 ,2-dichloro-3 claim 9 ,3 claim 9 ,3-trifluoropropene and 90 mol % to 60 mol % of the (E)-1 claim 9 ,2-dichloro-ethylene.12. An azeotropic composition consisting essentially of 20 mol % of (Z)-1 claim 9 ,2-dichloro-3 claim 9 ,3 claim 9 ,3-trifluoropropene and 80 mol % of (E)-1 claim 9 ,2-dichloro-ethylene.13. A liquid composition claim 9 , comprising the azeotrope-like composition according to and at least one additional component.14. The liquid composition according to claim 13 , wherein the at least one additional component is contained in an amount of 10 ppm to 30 mass % relative to a total amount of the azeotrope-like composition.15. A liquid composition claim 12 , comprising the azeotropic ...

POLYIMIDE-BASED RESIN FILM CLEANING LIQUID, METHOD FOR CLEANING POLYIMIDE-BASED RESIN FILM, METHOD FOR PRODUCING POLYIMIDE COATING, METHOD FOR PRODUCING FILTER, FILTER MEDIUM, OR FILTER DEVICE, AND METHOD FOR PRODUCING CHEMICAL SOLUTION FOR LITHOGRAPHY

A polyimide-based resin film cleaning liquid includes at least one solvent selected from the group consisting of a hydroxy aliphatic carboxylic acid ester, an aliphatic carboxylic acid ester, a chain or cyclic ketone, an alkylene glycol monoalkyl ether, an alkylene glycol monoalkyl ether acetate, and an aprotic polar solvent other than these solvents. 1. A polyimide-based resin film cleaning liquid comprising:at least one solvent selected from the group consisting of a hydroxy aliphatic carboxylic acid ester, an aliphatic carboxylic acid ester, a chain or cyclic ketone, an alkylene glycol monoalkyl ether, an alkylene glycol monoalkyl ether acetate, and an aprotic polar solvent other than these solvents.2. The polyimide-based resin film cleaning liquid according to claim 1 , comprising:(A) an aprotic polar solvent other than the following solvent (B), and(B) at least one solvent selected from the group consisting of a hydroxy aliphatic carboxylic acid ester, an aliphatic carboxylic acid ester, a chain or cyclic ketone, an alkylene glycol monoalkyl ether, and an alkylene glycol monoalkyl ether acetate.3. The polyimide-based resin film cleaning liquid according to claim 1 ,wherein the solvent (B) is a compound having 5 to 7 carbon atoms.4. The polyimide-based resin film cleaning liquid according to claim 3 ,wherein the solvent (B) is at least one solvent selected from the group consisting of ethyl lactate, butyl acetate, 2-heptanone, cyclohexanone, and propylene glycol monomethyl ether acetate.6. The polyimide-based resin film cleaning liquid according to claim 5 ,wherein the aprotic polar solvent is at least one selected from the group consisting of dimethylformamide, dimethylacetamide, N-methylpyrrolidone, 1,1,3,3-tetramethylurea, and dimethylsulfoxide.7. The polyimide-based resin film cleaning liquid according to claim 1 ,wherein the polyimide-based resin film is an unbaked composite film and/or a porous film.8. A method for cleaning a polyimide-based resin film ...

METHOD OF CLEANING AND DRYING SEMICONDUCTOR SUBSTRATE

A cleaning and drying method of a semiconductor substrate capable of suppressing collapse or breakdown of a pattern which occur at the time of drying a cleaning solution after cleaning the substrate and decomposition of a resin at a bottom of the pattern, and capable of removing the cleaning solution with good efficiency without using a specific device. 3. The method of cleaning and drying a semiconductor substrate according to claim 1 , wherein the aspect ratio of the pattern is 20:1 or more.4. The method of cleaning and drying a semiconductor substrate according to claim 2 , wherein the aspect ratio of the pattern is 20:1 or more.5. The method of cleaning and drying a semiconductor substrate according to claim 1 , wherein the cleaning solution is a liquid containing at least one of water claim 1 , a water-soluble alcohol and a fluorine compound.6. The method of cleaning and drying a semiconductor substrate according to claim 2 , wherein the cleaning solution is a liquid containing at least one of water claim 2 , a water-soluble alcohol and a fluorine compound.7. The method of cleaning and drying a semiconductor substrate according to claim 3 , wherein the cleaning solution is a liquid containing at least one of water claim 3 , a water-soluble alcohol and a fluorine compound.8. The method of cleaning and drying a semiconductor substrate according to claim 4 , wherein the cleaning solution is a liquid containing at least one of water claim 4 , a water-soluble alcohol and a fluorine compound.9. The method of cleaning and drying a semiconductor substrate according to claim 1 , wherein a temperature of the semiconductor substrate onto which a pattern has been formed is maintained at 0° C. or higher and 100° C. or lower in the (III).10. The method of cleaning and drying a semiconductor substrate according to claim 2 , wherein a temperature of the semiconductor substrate onto which a pattern has been formed is maintained at 0° C. or higher and 100° C. or lower in the ( ...

Substrate Processing Method and Solvent Used for Same Method

A processing method of a semiconductor substrate according the present invention includes: cleaning a surface of the semiconductor substrate with a water-based cleaning liquid; and drying the semiconductor substrate by replacing the water-based cleaning liquid attached to the surface of the semiconductor substrate with a supercritical fluid, characterized by using as the supercritical fluid a C-Cfluoroalcohol-containing solvent whose Fe, Ni, Cr, Al, Zn, Cu, Mg, Li, K, Na and Ca contents are each 500 mass ppb or less. In this processing method, it is possible to reduce the amount of fluorine atoms released in the supercritical fluid. 1. A processing method of a semiconductor substrate , comprising:cleaning a surface of the semiconductor substrate with a water-based cleaning liquid; anddrying the semiconductor substrate by replacing the cleaning liquid adhered to the surface of the semiconductor substrate with a supercritical fluid,{'sub': 2', '6, 'wherein the supercritical fluid is of a fluoroalcohol-containing solvent which contains a C-Cfluoroalcohol and whose Fe, Ni, Cr, Al, Zn, Cu, Mg, Li, K, Na and Ca contents are each 500 mass ppb or less.'}28.-. (canceled)9. The processing method of the semiconductor substrate according to claim 1 , wherein the processing method involves the following steps:(2-1) supplying the water-based cleaning liquid to the surface of the semiconductor substrate;(2-2) supplying the fluoroalcohol-containing solvent to the surface of the semiconductor substrate to which the water-based cleaning liquid has been attached;(2-3) moving the semiconductor substrate to which the fluoroalcohol-containing solvent has been attached into a chamber, and then, replacing the fluoroalcohol-containing solvent attached to the semiconductor substrate with the supercritical fluid of the fluoroalcohol-containing solvent, wherein the supercritical fluid has been separately obtained by controlling temperature and pressure of the fluoroalcohol-containing solvent ...

METHOD OF STABILIZATION OF A HALOOLEFIN-BASED COMPOSITION

The present invention provides a haloolefin-based composition comprising a highly-stable haloolefin in which decomposition and oxidization are inhibited, and the haloolefin-based composition being used for at least one application selected from the group consisting of heat transfer media, refrigerants, foaming agents, solvents, cleaning agents, propellants, and fire extinguishers. 114-. (canceled)15. A method of stabilization of a haloolefin-based composition , comprising combining a haloolefin , oxygen and water in a haloolefin-based composition ,wherein the amount of the oxygen is more than 0 mol %, and 0.35 mol % or less, based on the total amount of the haloolefin,the amount of the water is 3 ppm by weight or more and 200 ppm by weight or less, based on the total amount of the haloolefin, andwherein the haloolefin comprises 2,3,3,3-tetrafluoropropene and 1,3,3,3-tetrafluoropropene, and the amount of the 2,3,3,3-tetrafluoropropene is 0.1 to 10000 ppm by weight based on the total amount of the haloolefin.161. The method according to claim , further comprising combining at least one lubricating oil selected from the group consisting of a polyalkyleneglycol and a polyolester in the haloolefin-based composition. The present invention relates to a haloolefin-based composition and use thereof.Hydrofluorocarbons (HFCs), such as HFC-125 and HFC-32, have been widely used as important substitutes for CFCs, HCFCs, etc., which are known as substances that deplete the ozone layer. Known examples of such substitutes include “HFC-410A,” which is a mixture of HFC-32 and HFC-125, “HFC-404A,” which is a mixture of HFC-125, HFC-134a, and HFC-143a, etc.Such substitutes have various applications, such as heat transfer media, refrigerants, foaming agents, solvents, cleaning agents, propellants, and fire extinguishers, and are consumed in large amounts. However, since these substances have a global warning potential (GWP) several thousand times higher than that of CO, many people are ...

Azeotrope-Like Composition

Disclosed herein are multi-component, azeotrope-like compositions containing trans-dichloroethylene, 1,1,1,3,3-pentafluorobutane, and 1,1,2,2-tetrafluoroethyl-2,2,2-trifluoroethyl ether. These compositions also form an azeotrope-like mixture with methanol. These compositions are useful as solvents in refrigeration flushing, oxygen system cleaning, foam blowing, and cleaning operations such as cold cleaning, vapor degreasing, and aerosol cleaners. 1. An azeotrope-like composition comprising (a) 1 ,2-trans-dichloroethylene , (b) 1 ,1 ,1 ,3 ,3-pentafluorobutane , and (c) 1 ,1 ,2 ,2-tetrafluoroethyl-2 ,2 ,2-trifluoroethyl ether.2. The azeotrope-like composition of claim 1 , further comprising (d) a component selected from the group consisting of alcohol claim 1 , ether claim 1 , ketone claim 1 , alkane claim 1 , alkene claim 1 , and mixtures thereof.3. The azeotrope-like composition of claim 2 , wherein the component is an alcohol and the alcohol is methanol.4. The azeotrope-like composition of claim 2 , wherein the component is an alkane and the alkane is a halogenated alkane.5. The azeotrope-like composition of claim 2 , wherein the component is an alkane and the alkane is a cycloalkane.6. The azeotrope-like composition of claim 2 , wherein the component is an alkene and the alkene is a halogenated alkene.7. The azeotrope-like composition of comprising (a) about 37 wt. % to about 47 wt. % of 1 claim 1 ,2-trans-dichloroethylene claim 1 , (b) about 51 wt. % to about 61 wt. % of 1 claim 1 ,1 claim 1 ,1 claim 1 ,3 claim 1 ,3 pentafluorobutane claim 1 , and (c) about 1 wt. % to about 8 wt. % of 1 claim 1 ,1 claim 1 ,2 claim 1 ,2 tetrafluorethyl-2 claim 1 ,2 claim 1 ,2-trifluoroethyl ether claim 1 , wherein the composition has a constant boiling point at 760 mm Hg of about 34° C. to about 36° C.8. The azeotrope-like composition of comprising (a) about 40 wt. % to about 44 wt. % of 1 claim 7 ,2-trans-dichloroethylene claim 7 , (b) about 54 wt. % to about 57 wt. % of 1 claim ...

DETERGENT COMPOSITION FOR DRY CLEANING

A detergent composition for dry cleaning is disclosed. The detergent composition for dry cleaning includes a) 5 to 10% by weight of a fluorinated (fluoro-based) solvent, b) 1 to 2% by weight of a cleaning booster, c) 5 to 10% by weight of an anti-shrinkage agent, d) 40 to 50% by weight of a water-soluble solvent, and e) 30 to 40% by weight of water. 1. A detergent composition for dry cleaning comprising:a) 5 to 10% by weight of a fluorinated (fluoro-based) solvent;b) 1 to 2% by weight of a cleaning booster;c) 5 to 10% by weight of an anti-shrinkage agent;d) 40 to 50% by weight of a water-soluble solvent; ande) 30 to 40% by weight of water.2. The detergent composition for dry cleaning according to claim 1 , wherein the a) fluorinated solvent comprises at least one selected from the group consisting of the following Formula 1 and a combination thereof:{'br': None, 'sub': 2', 'm', '2', 'n, 'R—(CH)(CF)—R [Formula 1]'}{'sub': 3', '3', '3, 'wherein m is an integer of 0 to 4, n is an integer of 1 to 5, and R is H or F, or CH, CHO or CF.'}3. The detergent composition for dry cleaning according to claim 1 , wherein the b) cleaning booster comprises at least one selected from the group consisting of a compound represented by the following Formula 2 claim 1 , a compound represented by the following Formula 3 and a compound represented by the following Formula 4:{'br': None, 'sub': 6', '5', '2', '2', '2', 'm', '1, 'CH—HO—(CHCHO)—R\u2003\u2003[Formula 2]'}{'br': None, 'sub': 2', '2', '2', 'm', '1, 'R—O—(CHCHO)—R\u2003\u2003[Formula 3]'}{'br': None, 'sub': 1', '3', '2, 'R—R—R\u2003\u2003[Formula 4]'}{'sub': '1', 'wherein m is an integer of 1 to 5, Ris H or alkyl having 1 to 4 carbon atoms,'}{'sub': 2', '3, 'Ris alkyl having 1 to 8 carbon atoms, and Ris alkyl or alkene group having 3 to 20 carbon atoms.'}4. The detergent composition for dry cleaning according to claim 1 , wherein the c) anti-shrinkage agent comprises at least one selected from the group consisting of propylene ...

Refrigerants based on hydrofluoroether of fluoroether

Compositions comprising a hydrofluoroether or fluoroether of the formula CaFbH2a+2-bOc wherein a = 3 to 6, b = 1 to 14 and c = 1 or 2; an acyclic hydrofluorocarbon or fluorocarbon of the formula CdFeH2d+2-e wherein d = 4 to 6 and e = 1 to 14; a cyclic hydrofluorocarbon or fluorocarbon of the formula CmFnH2m-n wherein m = 4 to 6 and n = 1 to 12; a fluoroalcohol of the formula CrFsH2r+1-sOH wherein r = 4 to 6 and s = 1 to 13; or perfluoro-n-methylmorpholine wherein said compositions are useful as refrigerants, cleaning agents, aerosol propellants, heat transfer media, gaseous dielectrics, fire extinguishing agents, expansion agents for polymers such as polyolefins and polyurethanes, and as power cycle working fluids are described.

Compositions comprising 1,1,1,3,3-pentafluorobutane and use of said compositions

The invention concerns compositions comprising 1,1,1,3,3-pentafluorobutane and more than 5 wt. % of at least a non-flammable fluorinated compound and use thereof.

Compositions comprising 1,1,1,3,3-pentafluorobutane and use of these compositions

Compositions comprising 1,1,1,3,3-pentafluorobutane and more than 5% by weight of at least one non-flammable fluoro compound, and use thereof. No figures.

Compositions of hydrochlorofluoroolefins

The present invention relates to solvent/cleaner and heat transfer fluid compositions comprising at least one hydrochlorofluoroolefin (HCFO), 1-chloro-3, 3,3-trifluoropropene (HCFO-1233zd), particularly the trans- isomer. The HCFO of the present invention can be used in combination with co-agents including, hydrofluorocarbons (HFCs), hydrofluoroolefins (HFOs), hydrocarbons, ethers including hydrofluoroethers (HFEs), esters, ketones, alcohols, 1,2-transdichloroethylene and mixtures thereof.

Compositions of hydrochlorofluoroolefins

The present invention relates to solvent/cleaner and heat transfer fluid compositions comprising at least one hydrochlorofluoroolefin (HCFO), 1-chloro-3,3,3-trifluoropropene (HCFO-1233zd), particularly the trans-isomer. The HCFO of the present invention can be used in combination with co-agents including, hydrofluorocarbons (HFCs), hydrofluoroolefins (HFOs), hydrocarbons, ethers including hydrofluoroethers (HFEs), esters, ketones, alcohols, 1,2-transdichloroethylene and mixtures thereof.

Composition for post chemical-mechanical polishing cleaning

CMP polishing method, CMP polishing apparatus, and manufacturing method of semiconductor element

Semi-aqueous stripping and cleaning composition containing aminobenzenesulfonic acid

The present invention relates to semi-aqueous compositions and the method using same, to remove highly cross-linked resists and etch-residues. The compositions are comprised of aminobenzenesulfonic acid, water miscible organic solvent and water.

半導體製程用的清洗組成物及清洗方法

Thinner composition and method of manufacturing the same

세정액 조성물은 T 1 ℃의 비점을 갖는 프로필렌 글리콜 모노알킬에테르 60 내지 80 중량%, T 2 ℃의 비점을 갖는 알킬아세테이트 10 내지 30 중량%, 및 T 3 ℃의 비점을 갖고 하기 관계식 1을 만족하는 포토레지스트용 용제 1 내지 10 중량%을 포함한다. 상기 세정액 조성물은 포토레지스트에 대한 세정력이 우수할 뿐만 아니라 분별증류에 의한 회수가 용이하여 재활용성이 매우 우수하다. The cleaning liquid composition has 60 to 80% by weight of propylene glycol monoalkylether having a boiling point of T 1 ° C, 10 to 30% by weight of alkylacetate having a boiling point of T 2 ° C, and a boiling point of T 3 ° C to satisfy the following Equation 1. 1 to 10% by weight of the solvent for the photoresist. The cleaning liquid composition is not only excellent in cleaning power for the photoresist, but also easy to recover by fractional distillation, and is very excellent in recyclability. T 2 < T 3 < T 2 + 30 ------- (1) T 2 <T 3 <T 2 + 30 ------- (1)

Композиция для очистки после химико-механической полировки

1. Композиция для очистки после химико-механической полировки, содержащая от около 1 до около 30 мас.% водорастворимого амина, от около 10 до около 59 мас.% водорастворимого органического растворителя, и от около 30 до около 89 мас.% деионизированной воды, по отношению к общей массе композиции.2. Композиция по п.1, где водорастворимый амин выбирается из гидразина, гидрата гидразина или их комбинации.3. Композиция по п.1, где водорастворимый органический растворитель выбирается из диметилсульфоксида (ДМСО), диольного соединения, N-метилпирролидона (NMP), диметилацетамида (ДМАЦ), диметилформамида (ДМФ) или их смеси.4. Композиция по п.3, где диольное соединение выбирается из простого монобутилового эфира диэтиленгликоля (БДГ), простого моноэтилового эфира этиленгликоля, простого диметилового эфира этиленгликоля, простого н-бутилового эфира этиленгликоля, ацетата простого монобутилового эфира этиленгликоля или их смеси.5. Композиция по п.1, где водорастворимый амин присутствует в количестве от около 1 до около 25 мас.%.6. Композиция по п.5, где водорастворимый амин присутствует в количестве от около 1 до около 10 мас.%.7. Композиция по п.1, где водорастворимый органический растворитель присутствует в количестве от около 10 до около 50 мас.%.8. Композиция по п.7, где водорастворимый органический растворитель присутствует в количестве от около 10 до около 25 мас.%.9. Композиция по п.1, где деионизированная вода присутствует в количестве от около 50 до около 85 мас.%.10. Композиция по п.9, где деионизированная вода присутствует в количестве от около 65 до около 85 мас.%.11. Способ очистки после химико-механической полировки, содержащий стадию контакта полупров РОССИЙСКАЯ ФЕДЕРАЦИЯ (19) RU (11) (51) МПК C11D 1/40 (13) 2011 129 239 A (2006.01) ФЕДЕРАЛЬНАЯ СЛУЖБА ПО ИНТЕЛЛЕКТУАЛЬНОЙ СОБСТВЕННОСТИ (12) ЗАЯВКА НА ИЗОБРЕТЕНИЕ (21)(22) Заявка: 2011129239/04, 06.01.2010 (71) Заявитель(и): БАСФ СЕ (DE) Приоритет(ы): (30) Конвенционный приоритет: 22.01.2009 TW 098102676; 22.01.2009 ...

Cmp研磨方法及装置、半导体器件的制造方法

本发明提供一种CMP研磨方法，可对采用疏水化了的多孔质物质作为在基板上形成的半导体集成电路的层间绝缘膜材料的东西，在用含有界面活性剂的清洗液清洗去除残留在基板表面上的料浆和研磨残留物后，有效地去除渗入到层间绝缘膜中的有机物质。如果用含有界面活性剂的清洗液清洗，来去除残留的料浆和研磨残留物，含有界面活性剂的清洗液中的有机物就会渗入到层间绝缘膜(3)中。因此，之后用有机溶剂或含有有机溶剂的溶液清洗基板，进行渗入到层间绝缘膜(3)中的有机物的清洗去除。层间绝缘膜(3)虽然进行了疏水化处理，但是因为是有机溶剂，所以不受它的影响，可渗入到层间绝缘膜(3)中，将有机物溶解、清洗去除。

Ｃｍｐ 연마 방법, ｃｍｐ 연마 장치, 및 반도체디바이스의 제조 방법

세정액(계면활성제를 함유하는 것이 바람직함)으로 세정하여, 잔류하는 슬러리와 연마 잔류물을 제거하면, 계면활성제를 함유하는 세정액 중의 유기물이 층간 절연막(3) 속으로 스며든다. 그래서, 이 후, 유기 용매 또는 유기 용매를 함유한 용액으로 기판을 세정하고, 층간 절연막(3) 속에 스며든 유기물을 세정 제거한다. 층간 절연막(3)은 소수화 처리가 실시되고 있지만 유기 용매이기 때문에, 그것에 영향을 받지 않고 층간 절연막(3) 속으로 스며들어 유기물을 용해하고, 세정 제거할 수 있다. 그 후, 기판(1)을 건조시켜 표면에 부착된 유기 용매 또는 유기 용매를 함유한 용액을 제거한다.

リソグラフィー用洗浄剤

(57)【要約】 （修正有） 【課題】レジスト溶解性に優れかつ人体に対する安全性 の高いリソグラフィー用洗浄剤を提供する。 【解決手段】リソグラフィー用洗浄剤は、プロピレング リコールアルキルエーテル、プロピレングリコールアル キルエーテルアセテート、エチレングリコールアルキル エーテル、エチレングリコールアルキルエーテルアセテ ート、酢酸アルキルエステル、プロピオン酸アルキルエ ステル、アルコキシプロピオン酸アルキルエステル、乳 酸アルキルエステル、脂肪族ケトン（ケトン類）及びア ルコキシブタノールからなる群から選ばれた少なくとも １種の有機溶剤と、アルキル基の炭素数が１から４のア ルコール類から選ばれた少なくとも１種のアルコールと の均質溶液からなる。プロピレングリコールモノメチル エーテルアセテートとエタノールとの混合溶液を用いた 場合、特に溶解性が優れた洗浄剤を得ることができる。

혼합용매조성물

1,1,1,2,2,3,3,4,4,5,5,6,6 - 트리데카플루오로헥산 89.2 중량% 와 메탄올 10.8 중량% 로 이루어져 있는 공비 조성물 그리고 1,1,1,2,2,3,3,4,4,5,5,6,6 - 트리데카플루오로헥산 91.1 중량% 와 에탄올 8.9 중량% 로 이루어져 있는 공비 조성물. 본 발명은 종래의 1,1,2 - 트리클로로 - 1,2,2 - 트리플루오로에탄의 우수한 특성을 갖는, 그러고 성층권의 오존층을 고갈시키지 않는, 대체 공비 용매 조성물들을 제공한다.

혼합 용매 조성물(mixed solvent composition)

1,1,1,2,2,3,3,4,4,5,5,6,6-트리데카플루오로헥산 89.2중량%와 메탄올 10.8중량%로 이루어져 있는 공비 조성물 그리고 1,1,1,2,2,3,3,4,4,5,5,6,6-트리데카플루오로헥산 91.1 중량%와 에탄올 8.9중량%로 이루어져 있는 공비 조성물. 본 발명은 종래의 1,1,2-트리클로로-1,2,2-트리플루오로에탄의 우수한 특성을 갖는, 그리고 성층권의 오존층을 고갈시키지 않는, 대체 공비 용매 조성물들을 제공한다.

Solvent composition

１，１，２，２−テトラフルオロエチル−２，２，２−トリフルオロエチルエーテルとｔｒａｎｓ−１，２−ジクロロエチレンと炭素数１〜３のアルコールの合計量に対して１，１，２，２−テトラフルオロエチル−２，２，２−トリフルオロエチルエーテルが２５．０〜７５．０％（質量基準である。以下、同じ）、ｔｒａｎｓ−１，２−ジクロロエチレンが１５．０〜７４．９％、炭素数１〜３のアルコールが０．１〜１０．０％である溶剤組成物。本発明の溶剤組成物はフラックス等の汚れを高い洗浄力で除去できる。 1,1,2,2 with respect to the total amount of 1,1,2,2-tetrafluoroethyl-2,2,2-trifluoroethyl ether, trans-1,2-dichloroethylene and an alcohol having 1 to 3 carbon atoms 2-tetrafluoroethyl-2,2,2-trifluoroethyl ether is 25.0-75.0% (based on mass; the same applies hereinafter), and trans-1,2-dichloroethylene is 15.0-74. The solvent composition whose 9% and C1-C3 alcohol are 0.1-10.0%. The solvent composition of the present invention can remove dirt such as flux with high detergency.

Cleaning composition and cleaning method using the same

本发明提供一种清洁组合物，此清洁组合物包括至少一多胺多羧酸或其盐类、至少一溶剂、至少一经取代或未经取代的苯乙胺以及水。其中，溶剂选自由二醇类所构成的族群。

Composition for post chemical-mechanical polishing cleaning

본 발명은 화학적 기계적 연마(CMP) 후 세정을 위한 조성물에 관한 것이다. 조성물은 CMP 후 웨이퍼 표면 상에서 아졸형 부식 억제제를 제거할 수 있는 알칼리이다. 이러한 조성물은 아졸 화합물을 효과적으로 제거하고, Cu 표면의 습윤성을 증가시키며, CMP 후 결함 제거를 유의적으로 향상시킬 수 있다.

Heat-exchange compositions

FIELD: chemistry. SUBSTANCE: invention relates to heat-exchange compositions, used in cooling systems and heat-transmitting devices. Heat-exchange composition includes, at least, approximately 45 wt % of trans-1,3,3,3-tetrafluoropropene (R-1234ze(E)), to approximately 10 wt % of carbon dioxide (R-744) and from approximately 2 to approximately 50 wt % of 1,1,1,2-tetrafluoroethane (R-134a). EFFECT: combination of required properties of good cold productivity; low combustibility, low greenhouse potential value WGP with improved miscibility with lubricating materials (lubricants) in comparison with existing refrigerants, such as R-134a and R-1234yf. 59 cl, 1 dwg, 30 tbl РОССИЙСКАЯ ФЕДЕРАЦИЯ (19) RU (11) (51) МПК C09K 3/30 C09K 5/04 C08J 9/14 C11D 7/30 B01D 11/00 F25D 31/00 ФЕДЕРАЛЬНАЯ СЛУЖБА F25B 1/00 ПО ИНТЕЛЛЕКТУАЛЬНОЙ СОБСТВЕННОСТИ F24F 5/00 (12) ОПИСАНИЕ (21)(22) Заявка: (13) 2 547 118 C2 (2006.01) (2006.01) (2006.01) (2006.01) (2006.01) (2006.01) (2006.01) (2006.01) ИЗОБРЕТЕНИЯ К ПАТЕНТУ 2012155285/05, 06.12.2010 (24) Дата начала отсчета срока действия патента: 06.12.2010 (72) Автор(ы): ЛОУ Роберт Э. (GB) (73) Патентообладатель(и): МЕКСИЧЕМ АМАНКО ХОЛДИНГ С.А. ДЕ С.В. (MX) R U Приоритет(ы): (30) Конвенционный приоритет: 20.05.2010 GB 1008438.2; 16.06.2010 GB 1010057.6 (43) Дата публикации заявки: 27.06.2014 Бюл. № 18 2 5 4 7 1 1 8 (45) Опубликовано: 10.04.2015 Бюл. № 10 (56) Список документов, цитированных в отчете о поиске: US 2009253820 A1, 08.10. 2009. US (85) Дата начала рассмотрения заявки PCT на национальной фазе: 20.12.2012 C 2 C 2 2010044619 A1, 25.02.2010; . US 2010025619 A1, 04.02.2010. US 2006043331 A1, 02.03. 2006. RU 2006130970 A, 10.03.2008; . RU 2007108672 A, 20.09.2008; . US 2008099190 A1, 01.05. 2008. RU 2005115867 A, 10.01.2006 (86) Заявка PCT: R U 2 5 4 7 1 1 8 GB 2010/002231 (06.12.2010) (87) Публикация заявки PCT: WO 2011/144885 (24.11.2011) Адрес для переписки: 109012, Москва, ул. Ильинка, 5/2, ООО "Союзпатент" (54) ТЕПЛООБМЕННЫЕ КОМПОЗИЦИИ ( ...

Detergent composition and cleaning method

基体上に残留するポリシロキサン系接着剤を除去するために用いられる洗浄剤組成物であって、フッ化テトラ（炭化水素）アンモニウムと、有機溶媒とを含み、上記有機溶媒が、式（１）で表されるラクタム化合物と、環状エーテル化合物、環状アルキル鎖状アルキルエーテル化合物、環状アルキル分岐状アルキルエーテル化合物及びジ（環状アルキル）エーテル化合物から選択される少なくとも１種を含む環状構造含有エーテル化合物とを含む。【化１】（式中、Ｒ101は、炭素数１〜６のアルキル基を表し、Ｒ102は、炭素数１〜６のアルキレン基を表す。） A cleaning agent composition used for removing the polysiloxane-based adhesive remaining on the substrate, which contains tetraammonium fluoride (hydrogen hydrocarbon) and an organic solvent, and the organic solvent is the formula (1). A cyclic structure-containing ether compound containing at least one selected from a cyclic ether compound, a cyclic alkyl chain alkyl ether compound, a cyclic alkyl branched alkyl ether compound, and a di (cyclic alkyl) ether compound. including. [Chemical formula 1] (In the formula, R101 represents an alkyl group having 1 to 6 carbon atoms, and R102 represents an alkylene group having 1 to 6 carbon atoms.)

Halo-olefin composition and use therefor