ЭЛЕКТРОД ДЛЯ ЭЛЕКТРОЛИЗНОГО БОРИРОВАНИЯ

Изобретение относится к области химико-термической обработки металлов. Электрод для электролизного борирования содержит полый графитовый стержень и токоподвод, при этом внутри графитового стержня размещена обмотка-индуктор, подключенная к источнику импульсного тока. Технический результат: снижение энергетических затрат, повышение эффективности. 1 ил.

Способ защиты поверхности изделий при электролизном борировании

PROCESS FOR ELECTROLYTICALLY TREATING THE SURFACE OF ALUMINIUM OR ALUMINIUM ALLOY

... 1412929 Electrolytically treating surfaceoxidized aluminium KANSAI PAINT CO Ltd 25 June 1974 [4 July 1973 23 July 1973 15 Nov 1973 (2) 19 Nov 1973] 28037/74 Heading C7B Al or an alloy thereof is surface oxidized using steam or hot-water and is subsequently treated electrolytically for at least 5 seconds in an aqueous bath containing at least one water-soluble salt of silicic, boric, phosphoric, permanganic, vanadic, tungstic, molybdic or stannic acid. The oxidation may be effected in the presence of ammonia or an anine e.g. mono-, di- or triethanolamine or dimethylethanolamine. An extensive list of salts is given and treatment may be in a mixed salt bath or in a succession of baths containing the same or a different salt. The following are used in examples; Na 2 O.2SiO 2 , K 2 O.3SiO 2 , NaBO 2 , NaPO 3 , Al(H 2 PO 4 ) 3 , KMnO 4 , Ca(MnO 4 ) 2 .4H 2 O, NH 4 VO 3 , KVO 3 , K 2 WO 4 , K 2 W 4 O 13 , (NHa) 2 WO 4 , K 2 MoO 4 , (NH 4 ) 6 Mo 7 O 24 and K 2 SnO 3 .3H 2 O. A water-soluble salt ...

The method of adhering colored electroplating layer on a zinc-electroplated steel article

VACUUM ARC MELTING OF METALS

ELECTROLYTICALLY A PROCEDURE FOR THE PRODUCTION A MINERAL CONTAINING COATING

ELECTRO-CHEMICAL PRODUCED LAYERS TO THE CORROSION PROTECTION OR AS CLAMPING COAT

Composite article comprising a ceramic coating

An energy enhanced process for treating a conductive surface and products formed thereby

High tc superconductors made by metal heterostructures at the atomic limit

CORROSION RESISTANT METALLIC PLATES PARTICULARLY USEFUL AS SUPPORT MEMBERS FOR PHOTOLITHOGRAPHIC PLATES AND THE LIKE

PROCESS FOR INCREASING THE USEFUL LIFE OF A PHOTOVOLTAIC CELL

PROCESS FOR INCREASING THE USEFUL LIFE OF A PHOTOVOLTAIC CELL A process for forming a chalcogenated copper complex layer on a metallic electrode for use in a photovoltaic cell. The layer is formed by a three-step process involving electrodeposition of a copper indium complex. The process produces a void free copper indium semiconductor layer which resists degradation when exposed to radiation and thereby increases the useful life of the photovoltaic cell.

METHOD FOR FORMING A UNIFORM OXIDE FILM ON A VALVE METAL

PROCESS FOR COATING ALUMINUM OR ALUMINUM ALLOY

PROCESS FOR FORMING BIOACTIVE COMPOSITE COATINGS ON IMPLANTABLE DEVICES

An electrochemical process for forming uniform, bioactive composite coatings on porous and non-porous conductive substrates such as implantable devices is disclosed. Bioactive composite coatings obtained by the process of this invention consist of a crystalline oxide base layer and a bioactive calcium phosphate outer layer such as hydroxyapatite. Bioactive composite coatings obtained by this process are effective in minimizing metal-ion release from the substrate, as well as, improving the bioactivity of the implantable devices. The process of this invention allows the production of such coatings in a commercially viable manner.

ZINCIFEROUS PLATED STEEL SHEET AND METHOD FOR MANUFACTURING SAME

A method for manufacturing a zinciferous plated steel sheet, comprises: forming a zinciferous plating layer on a steel sheet; and forming an Fe-Ni-O film on the zinciferous plating layer. The Fe-Ni-O film is formed by carrying out electrolysis with the steel sheet as a cathode in an aqueous solution, dipping the steel sheet in an aqueous solution, or spraying a mist on a surface of the zinciferous plating layer.

AN ELECTROLYTIC PROCESS FOR FORMING A MINERAL CONTAINING COATING

The disclosure relates to a process for forming a deposit on the surface of a metallic or conductive surface. The process employs an electrolytic process to deposit a mineral containing coating or film upon a metallic or conductive surface.

Objet en magnésium ou alliage de magnésium et procédé pour le fabriquer.

Verfahren zur Schwefelung von Oberflächen aus Eisen oder Stahl

Procédé électrolytique de formation sur un élément métallique contenant principalement de l'aluminium d'une couche protectrice résistant à la corrosion, et élément métallique recouvert d'une couche protectrice par ce procédé

PROCEDURE FOR THE SURFACE COATING OF SHAPED PARTS FROM ALUMINUM AND ALUMINUM ALLOYS.

VACUUM ARC MELTING OF METALS

СПОСОБ ПОЛУЧЕНИЯ ПЛЕНКИ CdTe ИЗ НЕВОДНОГО ЭЛЕКТРОЛИТА НА ОСНОВЕ ЭТИЛЕНГЛИКОЛЯ

Изобретение относится к способам получения пленок полупроводникового соединения CdTe с нанокристаллической структурой, применяемых в тонкопленочных солнечных элементах. Известный способ получения пленок CdTe путем электроосаждения при постоянном потенциале из аммиачно-хлоридного электролита, содержащего 1.10-2 М CdSO4 и 1.10-2 М К2TeO3 при соотношении кадмия (II): теллуру (IV) равном 1:1, не позволяет полностью устранить соосаждение элементарного теллура вместе с осадком CdTe. Благодаря тому, что в предлагаемом способе электроосаждение ведут из неводного электролита на основе этиленгликоля который содержит избыток ионов кадмия в соотношении Cd(II):Te(IV) = (1000 ÷ 5000) :1 с рН 0,14÷1,5 при потенциалах Е=-0,5 -0,6 В, при 90°С удается получить чистые пленки CdTe, с размером зерен от 2,5-7,0 нм, не содержащие посторонних примесей, что позволяет увеличить эффективность фотоэлектронного преобразования солнечного излучения.

СПОСІБ ВИГОТОВЛЕННЯ ОКСИДНОКОБАЛЬТОВОГО АНОДА

Винахід відноситься до хімічної промисловость, а саме – до способу виготовлення оксиднокобальтового електрода, і може бути використаний для електроосадження оксиднокобальтових покрить з метою виготовлення каталізаторів різних хімічних реакцій, тепловиділяючих елементів, а також малозношуваних анодів для електролізу хлорних розчинів, кисневих електродів паливних елементів, окиснювання закису вуглецю, деструкції барвників і ін. Спосіб виготовлення оксиднокобальтового електрода катодним співосадженням металу і гдроксиду на титановий електрод з водного розчину солі кобальту з наступним окисненням покриття. В водний розчин солі кобальту додатково вводять цирконій сірчанокислий чотириводний у кількості 2-15 г/дм3 , натрій лимоннокислий тризаміщенний у кількості 20-150 г/дм3 і в ньому здійснюють катодне співосаждення кобальту, цирконію і їхній гідроксидів при щільності струму 2-6 А/дм2 , значенні рН електроліту 8,5-9,5, анодне доокиснення термообробленого після катодного співосадження покриття ...

СПОСОБ ПОЛУЧЕНИЯ ПЛЕНКИ CuInSe2 С НАНОКРИСТАЛЛИЧЕСКОЙ СТРУКТУРОЙ

Изобретение относится к способам получения пленок полупроводникового соединения CuInSe2 с нанокристаллической структурой, применяемых в солнечных элементах. Известный способ получения пленок CuInSe2 с размером зерен 300-500 Å путем внутреннего электролиза (цементации) на медной подложке из раствора 2М NH4CI, содержащего индий (III) и селен (IV), не позволяет получить пленку CuInSe2 с меньшим размером зерен. Благодаря тому, что в предложенном способе осаждение пленки проводят из цитратного раствора, содержащего водные растворы солей NaHSeO3 -4,2·10-3 М, In2(SO4)3·7H2O - 4,2·10-3 М и 2,2- дипиридила - 6,8·10-4 М, осаждение ведут при комнатной температуре в течение 40 минут, а прокаливание пленки проводят на воздухе при 350°С в течение 10 минут, удается получать пленки строго заданного фазового и стехиометрического состава - CuInSe2 с нанокристаллическим размером зерен ≈ 50 Å.

СПОСОБ ОПРЕДЕЛЕНИЯ ЗАЩИТНОЙ КОНЦЕНТРАЦИИ ИНГИБИТОРА КОРРОЗИИ СТАЛИ

Изобретение относится к вольтамперометрическому способу определения защитной концентрации ингибитора коррозии стали. Известный электрохимический способ определения защитной концентрации ингибитора коррозии стали методом поляризационного сопротивления имеет ряд ограничений при его использовании, отличается длительностью исследований, большой затратой времени на обработку поляризационных кривых. Благодаря тому, что в предложенном способе определение защитной концентрации ингибитора коррозии стали проводят путем использования в качестве индикаторного электрода - электрода из нержавеющей стали; в качестве фонового электролита - водный раствор 0,3 М Na2SO4, содержащий различные концентрации нитрилтриметиленфосфоновой кислоты (НТФ); перед снятием вольтамперных кривых индикаторный электрод экспонируют при потенциале анодного растворения (Е=-0,25В) в течение 60 с; вольтамперные кривые снимают в интервале потенциалов от-0,25В до -1,25 В; из полученной серии вольтамперных кривых строят зависимость ...

СПОСОБ ПОЛУЧЕНИЯ ПЛЕНКИ Cu2Se

Изобретение относится к способам приготовления пленки селенида одновалентной меди Cu2Se. Известный способ получения пленки селенида меди путем химического осаждения из водного раствора, содержащего катионы меди, плавиковую и селенистую кислоты, с использованием двух сопряженных гальванических реакций, на кремниевые подложки не позволяет получать пленки Cu2Se со строго заданным фазовым и стехиометрическим составом. Благодаря тому, что в предложенном способе осаждение пленки проводят путем внутреннего электролиза (цементации), в качестве подложки используют медную пластинку, в качестве раствора 0,3M Na2SO3, содержащий водный раствор соли Na2SeSO3 - 3,5·10-3 М, осаждение ведут при комнатной температуре в течение 15 минут, а прокаливание пленки проводят на воздухе при 140°С в течение 1 часа, удается получать пленки строго заданного фазового и стехиометрического состава - Cu2Se.

СПОСОБ ПОЛУЧЕНИЯ ПЛЕНКИ CuInSe2

Изобретение относится к способам приготовления пленки диселенида индия меди CuInSe2. Известный способ получения пленки диселенида индия меди путем электроосаждения на титановую или никелевую подложки из раствора, содержащего InCI3, CuCI, SeO2 при силе тока 6мА/см2 и напряжении -0,7 + -0,5 В (нормальный каломельный электрод) не позволяет получать пленки CuInSe2 со строго заданным фазовым составом. Благодаря тому, что в предложенном способе осаждение пленки проводят путем внутреннего электролиза (цементации), в качестве подложки используют медную пластинку, в качестве раствора 2М NH4CI, содержащий водные растворы, солей NaHSeO3-3,8·10-3M и In2(SO4)3·7H2O-3,8·10-3M, осаждение ведут при комнатной температуре в течение 1 часа, а прокаливание пленки проводят на воздухе при 400ºС в течение 10 минут, удается получать пленки строго заданного фазового и стехиометрического состава - CuInSe2.

СПОСОБ ПРИГОТОВЛЕНИЯ ПЛЕНКИ СОЕДИНЕНИЯ CuIn1-xGAxSE2

Изобретение относится к способам приготовления пленки соединения CuIn1-xGaxSe2 Известный способ электроосаждения пленки медь-индиевого диселенида, не содержащего галлий, на поверхности титанового или никелевого катода из фонового электролита, в котором присутствуют ионы меди (II), индия (III), селена (IV) не позволяет получать полупроводниковые плёнки с достаточно высоким током короткого замыкания, повышенным напряжением холостого хода. Благодаря тому, что в предложенном способе получают полупроводниковые пленки состава CuIn0,9Ga0,1Se2 методом электрохимического осаждения из водного раствора сульфасалициловой кислоты, содержащего, М CuSO4 -1∙10-3; In2(SO4)3 7H2O - 4∙10-3; NaHSeO3 - 4·10-3 и дополнительно соль галлия Ga2(SO4)3 - 4·10-3, электроосаждение ведут при потенциале - 0,87B. (Ag/AgCl), а затем полученную пленку отжигают в аргоне при 410°С 10 мин. удается получать пленки улучшенного качества, обеспечивающие ток короткого замыкания 2 мА/см2, напряжение холостого хода 0,6В.

Method for improving high-temperature and high-salt performance of iron powder by using plasma electrolysis

Electro-deposition preparation method of microporous membrane material, microporous membrane material and application thereof

Method of preparing multi-element carbide film through electrodeposition of liquid phase plasmas

The invention relates to the technical field of carbide film preparation and particularly relates to a technological method of preparing a metal/semimetal/nonmetallic multi-element carbide film through electrodeposition of liquid phase plasmas. The technological method is characterized by comprising the steps that components such as carbon sources and element precursors to be plated are contained in an organic solution or an aqueous solution, a maximum value of a voltage needed by activating and ionizing each element precursor component to be plated into plasmas is used as an operation voltage, the operating temperature is 20-100 DEG C, the current density is 10-500mA/cm2, the area ratio of a cathode to an anode is 1:(1-2), a distance between electrodes is 5-50mm, any one of conductive materials or materials with conductive layers functions as the cathode (substrate), the element precursors to be plated in bubbles in cathode and anode regions are ionized to produce the plasmas through the ...

Method for preparing lanthanum-calcium-manganese-oxygen nanowire composite array

Cerium-doped gadolinium oxide green light luminescent film and preparation method thereof

The invention discloses a cerium-doped gadolinium oxide green light luminescent film and a preparation method thereof. A layer of cerium-doped gadolinium oxide green light luminescent film is deposited on a platinum substrate. The preparation method comprises the following steps: selecting a soluble gadolinium salt solution and a soluble cerium salt as raw materials; carrying out thin film deposition on the platinum substrate by an electrochemical method; inserting a three-electrode into an evenly-mixed solution of a gadolinium salt and the cerium salt, and depositing the mixture in a constant temperature water bath at a temperature of between 50 and 80 DEG C, wherein regulation voltage is between -0.90 and -1.2V (vs SCE saturation calomel reference electrode); and the deposition time is 15 to 60 minutes; washing and drying the obtained film; and then carrying out rapid annealing on the film for 2 to 5 minutes at a temperature of between 600 and 1,200 DEG C. The prepared luminescent film ...

Method for preparing SmS film through electrodeposition-liquid phase self assembly

Method for preparing two-dimensional layered vertical heterojunction

Graphene carbon nanotube composite film as well as preparation method and application thereof

A process for preparing the lanthanum calcium manganese oxygen accepts nanowire composite array method

Method for electroplating substrate using ceramic chromium and ceramic chromium layer electroplated on substrate

Method for micro-arc depositing ceramic layer onto positive and negative bipolarities on magnesium alloy

Improvements brought to the electrolytic processes of treatment the salt bath

DEVICE Of DEVELOPMENT HAS ROOM TEMPERATURE OF NANOFILS OF SO BY ELECTRODEPOSITION, METHOD OF PREPARATION AND NANOFILS OBTAINED

ELECTROLYTIC METAL ACTIVATION PROCESS

PROCESS OF TREATMENT OF FERROUS ALLOY PARTS TO IMPROVE RUBBING LEURSPROPRIETES, WITHOUT LOSS OF THEIR HARDNESS NOR DEFORMATION

DEVELOPMENT OF OXIDE COATING TRANSPARENT AND CONDUCTING FOR USE IN a PHOTOVOLTAIC STRUCTURE.

PROCESS OF PRODUCTION OF SMOOTH AND COHERENT FILMS ELECTROLYTIC OF METAL CHALCOGENURES BY DEPOSIT

L'INVENTION CONCERNE UN PROCEDE DE PRODUCTION D'UNE PELLICULE DE CHALCOGENURE METALLIQUE. SUIVANT L'INVENTION, CE PROCEDE CONSISTE A DEPOSER CETTE PELLICULE ELECTROLYTIQUEMENT SUR UNE CATHODE, A PARTIR D'UN BAIN COMPRENANT UNE SOLUTION, DANS UN SOLVANT ORGANIQUE POLAIRE, D'UN SEL METALLIQUE ET D'UN CHALCOGENE ELEMENTAIRE A TEMPERATURE ELEVEE ET SOUS UNE FAIBLE DENSITE DE COURANT. LE PROCEDE DE L'INVENTION EST APPLICABLE AUX DOMAINES ELECTRIQUE ET CHIMIQUE, NOTAMMENT POUR LES DISPOSITIFS DE CAPTAGE DE L'ENERGIE SOLAIRE OU LA REALISATION DE SEMI-CONDUCTEURS.

크롬 표면의 캐소딕 부식 방지 방법

... 본 발명은, 크롬 표면을 가지는 기재, 및 니켈, 니켈 합금들, 구리 및 구리 합금들을 포함하는 군에서 선택된, 기재와 크롬 표면 사이 적어도 하나의 중간층의 캐소딕 부식 방지 방법에 관한 것으로, 상기 크롬 표면은, 상기 기재, 적어도 하나의 애노드 및 수용액으로 전류를 통과시키면서 인을 함유한 적어도 하나의 화합물을 포함하는 수용액과 접촉되고 상기 기재는 캐소드로서 역할을 한다. 인 화합물은 바람직하게 RR2R3P03 유형의 포스폰산이고, R 은 n-옥틸, n-노닐, n-데실, n-운데실, n-도데실, n-트리데실, n-테트라데실, n-펜타데실, n-헥사데실, n-헵타데실, n-옥타데실, 비치환된 분지형 C8 ~ C18 알킬 잔기들로 구성된 군에서 선택되고, R2 및 R3 은 H 또는 Li+, Na+, K+ 및 NH4+ 에서 선택된 적합한 카운터 이온이다. 수용액은 또한 포스폰산의 용해도를 높이는 적어도 하나의 첨가제를 포함한다.

COMPOSITE LAYER INCLUDING METAL AND INORGANIC POWDERS, CAPABLE OF FREELY CONTROLLING THE AMOUNT OF INORGANIC POWDERS CONTAINED IN THE COMPOSITE LAYER, AND METHOD FOR MANUFACTURING THE SAME

PURPOSE: A method for manufacturing a composite layer with characteristics suitable for a specific environment by controlling an addition amount of sulfuric acid, thereby freely controlling the amount of inorganic powders in the composite layer, and the composite layer manufactured by the method are provided. CONSTITUTION: As a manufacturing method of a composite layer including metal and inorganic powders, the manufacturing method of the composite layer comprises the steps of: preparing an electrolyte solution comprising 50.0 to 300.0 g/L of nickel sulfamate(Ni(NH2SO4)), 10.0 to 20.0 g/L of boric acid, 1.0 to 10.0 g/L of nickel chloride(NiCl2), 0.02 to 0.5 g/L of coumarin(C9H6O2), 4.0 to 60.0 g/L of sodium dodecyl sulfate(CH3-(CH2)11-OSONa), 0 to 150.0 ml/L of sulfuric acid, and 20.0 to 70.0 g/L of one or more inorganic powders selected from the group consisting of alumina(Al2O3) and silicon carbide(SiC) with the balance of distilled water; dipping a matrix metal into the electrolyte solution ...

INDIUM-DOPED TITANIUM-BASED LEAD DIOXIDE ELECTRODE, AND MANUFACTURING METHOD THEREOF AND APPLICATION OF SAME

An indium (In)-doped titanium-based lead dioxide electrode, and manufacturing method thereof, and an application of same in degradation treatment of highly concentrated pharmaceutical wastewater with low biodegradability. The electrode uses titanium as the matrix, and comprises an antimony tin oxide base layer, an α-PbO2 middle layer, and an In-doped, fluoride-containing β-PbO2 active layer, wherein the layers are coated onto a titanium matrix in that order. A structural design and surface doping of the electrode are used to modify the lead dioxide electrode. By adding the post-transition metal In and a fluoride polymer resin, micro-particle dispersion of PbO2 on the surface of the electrode becomes more compact and uniform, greatly improving a surface structure and property of the electrode and reducing an internal stress between the PbO2 active layer and the titanium matrix. The final electrode therefore has a higher oxygen evolution potential and electrochemical stability, effectively ...

ANODIC FILMS WITH ENHANCED FEATURES

Anodizing techniques for providing enhanced anodic films are described. According to some embodiment, a barrier layer smoothing operation is used to flatten an interface between the anodic film and underlying metal substrate. According to some embodiments, the methods involve depositing a pigment having a particle diameter of about 20 nanometers or greater into an anodic film. According to some embodiments, the anodic films have multiple metal oxide layers. A first layer can provide scratch and chemical resistance and a second layer can provide a light diffusing pore structure that diffusely reflects incoming light and provides a white appearance to the anodic film. According to some embodiments, the anodic films have a dense porous layer and a thickened barrier layer. The porous layer can act as a cosmetic portion of the anodic film and have pores that have a colorant infused therein. The thickened barrier layer can distribute defects within the anodic film associated with alloying elements ...

Cross-Linked Polymer Based Hydrogel Material Compositions, Methods and Applications

A hydrogel material composition includes: (1) an alginate (or other cross-linking polymer) material; (2) an optional -hydroxy carboxylate material; and (3) an iron cation material. The hydrogel material composition with or without the -hydroxy-carboxylate material may be used in a photolithographic imaging application or a photorelease application within the context of a photoirradiation induced reduction/oxidation reaction of an iron (III) cation material to form an iron (II) cation material.

Electrolytic process for forming a mineral

The disclosure relates to a process for forming a deposit on the surface of a metallic or conductive surface. The process employs an electrolytic process to deposit a mineral containing coating or film upon a metallic or conductive surface.

Process for Fabricating a Silicon-Based Electrode, Silicon-Based Electrode and Lithium Battery Comprising Such an Electrode

The invention relates to a process for manufacturing a silicon-based electrode and to a silicon-based electrode. It also relates to a lithium battery comprising such an electrode. The process of the invention consists in fabricating a silicon-based electrode of the type that includes a step of electrochemically depositing silicon on a substrate by cyclic voltammetry in a solution comprising at least one ionic liquid and a silicon precursor of formula SinX2n+2, in which x is Cl, Br or I and n is equal to 1 or 2. The electrode of the invention is particularly applicable in the lithium battery field.

SUPERCAPACITOR ELECTRODES

The present invention relates to a method of producing an electrodeposited metal oxide coating for a supercapacitor electrode. The present invention relates to the chronoamperometric electrodeposition of the metal oxide over a period from a few seconds, up to about 30 seconds leading to superior performance as a result of an increased surface area of the deposit. According to the present invention, the capacitances achieved are typically greater than 1300 F/g, and in some instances, over 4000 F/g.

Electrodeposition of graphene layer from doped graphite

Provided is a method of forming a uniform graphene layer on a substrate (metal- or conductive-polymer-coated, ITO) by doping expanded graphite using various kinds of dopants (Lewis acid) to grant a positive charge thereto, dispersing the doped expanded graphite in an organic solvent using ultrasonic waves to obtain a solution in which the graphene is dispersed in the organic solvent, and electrically applying a negative voltage to the solution.

INTERCONNECT FOR A SOLID OXIDE FUEL CELL, ITS MANUFACTURING METHOD, AND A SOLID OXIDE FUEL CELL

ELECTROCHEMICAL IMMERSION METHOD IN AN AQUEOUS ELECTROLYTE FOR PRODUCING A BIOLOGICALLY DEGRADATION STABLE SURFACE LAYER ON BASE BODIES MADE OF TITANIUM OR TITANIUM BASED ALLOYS

IMPROVED PROCESS FOR COLORING LOW TEMPERATURE CARBURIZED AUSTENITIC STAINLESS STEEL

MEDICAL DEVICE

The present disclosure relates to a medical device. The medical device comprises a matrix and a first coating coated on the matrix. The matrix contains a metal element X having a content of ≥5wt%; the first coating is at least one of an elemental metal layer of the metal element X, an alloy layer of the metal element X, and a metal-ceramic layer of the metal element X; and the first coating does not contain nickel and cobalt. The medical device has good use safety, reliability, and biocompatibility, so that a product can meet a use requirement of large plastic deformation, and has good reliability during use. The medical device can particularly meet requirements of product with large plastic deformation during use, such as medical implant devices.

COLORING METHOD FOR STAINLESS STEEL

PURPOSE: To prevent a treatment liquid from becoming harmful or deteriorating and to color stainless steel by alternately and repeatedly subjecting the stainless steel to anodic oxidation treatment and cathodic reduction treatment under specified electrolytic conditions in an aq. soln. containing specified acid and an oxidizing agent with specified concn. and standard electrode potential. CONSTITUTION: Stainless steel is dipped in a specified soln. and alternately and repeatedly subjected to anodic oxidation and cathodic reduction under conditions of current density between ≥0.01A/m2 and <1A/m2, and 0.5-100Hz frequency, with the current density and time required for one electrolysis treatment satisfying the relation of the formula. In this formula, I(+) and I(-) is the current density of anode and cathode, respectively, t(+) and t(-) is the time for one treatment of anodic oxidation and cathodic reduction, respectively. The aq. soln. used for electrolysis contains at least one of sulfuric ...

THIN FILM FORMING METHOD

PROBLEM TO BE SOLVED: To provide a novel thin film synthetic method unnecessary for a high energy process. SOLUTION: A 1st reaction solution is prepared by dissolving LiOH.H2O in distilled water and a 2nd resection solution is prepared by dissolving CoSO4.7 H2O in distilled water. The 1st solution and the 2nd solution are charged into a flow type reactor provided with a pair of electrodes and a porous base material arranged between the electrodes. The 1st reaction solution is passed between one of a pair of the electrodes and the porous base material at a prescribed flow rate and the 2nd reaction solution is passed between another one of a pair of the electrodes and the porous base material at a prescribed flow rate. The thin film formed by containing a structural element of the 1st reaction solution and a structural element of the 2nd reaction solution is directly synthesized on the porous base material by impressing a prescribed voltage between a pair of the electrodes. COPYRIGHT: (C) ...

САМОВОССТАНАВЛИВАЮЩИЕСЯ ПОКРЫТИЯ ДЛЯ НЕФТЕГАЗОВЫХ ПРИМЕНЕНИЙ

Изобретение относится к изделию с покрытием и способу его изготовления. Изделие с покрытием содержит подложку и самовосстанавливающееся покрытие, нанесенное на поверхность подложки, содержащее сплошную металлическую матрицу, сформированную из Ni, Cu, Ag, Au, Sn, Fe, In, W, Ti, Co, Al, Mg, Cr, Mo, или их сплавов, или комбинации, и множество микро- или наноразмерных частиц, диспергированных в сплошной металлической матрице. При этом микро- или наноразмерные частицы имеют структуру из ядра и оболочки, содержащую активный агент, инкапсулированный в микро- или наноразмерной оболочке металлической емкости. Металлическая емкость и сплошная металлическая матрица имеют по меньшей мере один общий металл. Микро- или наноразмерные частицы имеют средний размер частиц от около 100 нм до около 100 мкм, а микро- или наноразмерная оболочка металлической емкости имеет толщину от около 10 нм до около 50 нм. При повреждении покрытия активный агент высвобождается и обеспечивает эффект самовосстановления покрытия ...

ЭЛЕКТРОД ДЛЯ ЭЛЕКТРОЛИЗНОГО БОРИРОВАНИЯ

Изобретение относится к области химико-термической обработки металлов. Электрод для электролизного борирования содержит полый графитовый стержень, внутри которого расположен элемент крепления в виде металлического штока, соединенного в верхней части с источником колебаний, а в нижней - с мембраной, при этом источник колебаний выполнен в виде емкости, в водном пространстве которой расположены два электрода, подключенных к регулируемому источнику импульсного тока. Технический результат: повышение эффективности борирования деталей различной конфигурации, уменьшение энергозатрат и обеспечение высокой надежности источника колебаний. 1 ил.

EIN ELEKTROLYTISCH VERFAHREN ZUR HERSTELLUNG EINER EIN MINERAL ENTHALTENDE BESCHICHTUNG

Verfahren zur Verguetung der Oberflaeche von Metallgegenstaenden

Verfahren zur Erzeugung von Molybdänblau in hoher Reinheit und in festem Zustand

Die Erfindung betrifft das Verfahren zur Erzeugung von Molybdänblau in hoher Reinheit und in festem Zustand, bestehend aus den Elementen der Arbeitselektrode (1), durch die die Redox-Reaktion stattfindet, einer Gegenelektrode (2), die den Übergang des Stroms aus der unterstützenden Elektrolytenlösung (5) gewährleistet, einer Bezugselektrode (3), die die Potenzialregelung der Arbeitselektrode (1) gewährleistet, einer unterstützenden Elektrolytenlösung (5), die in einer elektrochemischen Zelle (4) zur Verfügung steht und das erforderliche Medium zur Bildung des Molybdänblaus in hoher Reinheit und in festem Zustand und einem Potentiostat-Galvanostat-System (6), das die Anwendung des zyklischen Voltammetrieverfahrens gewährleistet.

ELECTROLYTIC METAL ACTIVATION PROCESS

... 1487916 Nickel hydroxide coatings INCO EUROPE Ltd 23 Oct 1974 [13 Nov 1973] 52658/73 Heading C7B [Also in Division H1] A metal foil or sheet e.g. of nickel is activated for use as an electrode in an alkaline accumulator by anodic treatment at a c.d. of 0À1-1000MA/cm2 in an ammonia-containing Ni/NH4 nitrate solution in which the ratio of NH 3 :Ni (g.mol:g.ion) and the molar ratio of Ni(NO 3 ) 2 to NH 4 NO 3 are both in the range 0À1-3À0:1, followed by cathodic treatment in a Ni-containing acidic (e.g. pH 0À5 to below 7) electrolyte containing reducible ions of which the redox potential is more positive than the discharge potential of Ni. The reducible ions may be No 3 , CrO 4 , ClO 4 or MnO 4 for NO 3 the c.d. may be 0À1-100mA/cm2 with an NO 3 concentration of 0À1M to saturation. The anodic treatment deposits black beta Ni hydrate; the cathodic treatment yields green Ni(OH)2 which impregnates the porous deposit of the former.

Electrolytic methods for applying a black layer to a metal backing

For preparing nearly-ideal black body layers for collecting and exploiting solar energy, layers of sulfides of the metals of the iron series, Ni, Fe, Co, are produced by electrolyzing the corresponding thiocyanates in aqueous solution. High absorption values are obtained concurrently with low emission values.

Electrochemical deposition of a dopant-containing silicate film on the surface of small silicon plates for the production of solar cells

To produce a dopant-containing silicate film on the surface of small silicon plates for the production of solar cells, silicate ions and ions which contain the dopant, which are primarily phosphate ions, undergo anodic deposition in aqueous solution on the small silicon plates.

PROCEDURE FOR BORATING COATINGS WITH THE HELP OF SNAPPING AN ELECTROLYTIC PROCEDURE

PROCEDURE FOR THE TREATMENT OF PARTS FROM FERROUS ALLOY FOR THE IMPROVEMENT OF THE FRICTION CHARACTERISTICS WITHOUT CAUSING OF HARDNESS LOSS OR DEFORMATION

Procedure for the production of a layer on one essentially from aluminum existing Metallgegenstand

PROCEDURE FOR THE PRODUCTION OF A GRADED COATING FROM CALCIUM PHOSPHATE PHASES AND METALLIC OXIDE PHASES ON METALLIC IMPLANTS

An electrolytic process for forming a mineral containing coating

THERMAL BARRIER COATINGS AND FABRICATION OF SAME USING ELECTROCHEMICAL METHODS

Process and apparatus for forming zinc oxide film, and process and apparatus for producing photovoltaic device

The method of adhering colored electroplating layer on a zinc-electroplated steel article

A method of surface treatment of an implant, an implant treated by said method and an electrolyte solution for use in said method

A method of surface treatment of at least part of an electro-conductive surface of an implant, in particular an orthopaedic or a dental implant is described which permits the simultaneous, electrochemical deposition of a therapeutic agent and a calcium phosphate coating in a combined single-step deposition process. The method involves the preparation of an electrolyte solution containing calcium and phosphorus ions and a therapeutic agent, preferably in combination with a complexing agent such that the resulting complex has a net positive charge. This electrolyte solution is then used in an electrochemical deposition process to produce a calcium phosphate coating incorporating the therapeutic agent on the electro-conductive surface of the implant Preferably, the therapeutic agent comprises metal ions, for example silver ions, and the complexing agent comprises an ammine complex. Also provided are an implant treated by the described method and an electrolyte solution for use in the described ...

METHOD FOR PRODUCING SMOOTH COHERENT METAL CHALCONIDE FILMS

Abstract Smooth coherent metal chalconide film is electroplated onto a cathode from an electroplating bath comprising a solution in an organic polar solvent metal salt and elemental chalcogen at elevated temperature and low current density.

COATINGS FOR ELECTROCHEMICAL ELECTRODES AND METHODS OF MAKING THE SAME

The present invention provides a coating for electrodes for use in electrochemical cells having an electrochemically active species and an electrolyte. The coating includes a selectively permeable material which allows for the diffusion of the active species through the coating during operation of the cell while providing a substantially impervious barrier to the electrolyte. Electrodes utilizing the coatings described herein may be used in primary and secondary cells over a wide range of operating temperatures to deliver better electrochemical performance even at room temperature. Methods of making the coating and an apparatus for performing these methods on a continuous basis are included in the present invention. A novel composition of matter also is contemplated containing lithium, silicon, and fluorine prepared by exposing lithium metal to SiF4.

PROCESS FOR COATING ALUMINUM OR ALUMINUM ALLOY

ZINCIFEROUS PLATED STEEL SHEET AND METHOD FOR MANUFACTURING SAME

A method for manufacturing a zinciferous plated steel sheet, comprises: forming a zinciferous plating layer on a steel sheet; and forming an Fe-Ni-O film on the zinciferous plating layer. The Fe-Ni-O film is formed by carrying out electrolysis with the steel sheet as a cathode in an aqueous solution, dipping the steel sheet in an aqueous solution, or spraying a mist on a surface of the zinciferous plating layer.

СПОСОБ ПРИГОТОВЛЕНИЯ ПЛЕНКИ СОЕДИНЕНИЯ CuGaSe2

Изобретение относится к способам приготовления пленки диселенида галлия меди - CuGaSe2, которая может быть использована в качестве дешевого и эффективного фотопреобразующего материала. Предлагаемый способ позволяет получить пленки полупроводникового соединения CuGaSe2 с заданной стехиометрией и шириной .запрещенной зоны 1,4 эВ. Пленки соединения CuGaSe2 применяются в составе тонкопленочных каскадных фотоэлементов для преобразования солнечного излучения в электрическую энергию. Пленки получают электроосаждением из раствора, содержащего М: CuSO4 - 1•10-3; Ga2(SO4)3 - от 1,2•10-2 до 4•10-2; NaHSeO3 -2•10-3; в качестве катода используют молибденовый или стеклоуглеродный электрод, в качестве электролита - водный раствор 0,1 М сульфосалициловой кислоты или 0,3 М раствор цитрата натрия. После электроосаждения полученную пленку отжигают в аргоне при температуре выше 400°С 10 мин.

СПОСОБ ПОЛУЧЕНИЯ ПЛЕНКИ СОЕДИНЕНИЯ CuInSe2МЕТОДОМ ЦЕМЕНТАЦИИ

Предлагаемый способ включает получение пленок соединения CuInSe2 на медных подложках или стекле, покрытом медной пленкой с использованием метода цементации. Соединение общей формулы CuInSe2 является наиболея перспективным полупроводником, который все более широко применяется для преобразования солнечного излучения в электрическую энергию. Тонкие пленки данного соединения способны абсорбировать до 90% солнечного света и преобразовывать его в электрическую энергию уже при толщине пленки 2-5 мкм. Способ получения тонкой пленки диселенида меди индия CuInSe2 с использованием метода цементации (внутреннего электролиза) из водного раствора, содержащего SeO2 CuSO4 отличается тем, что используют медные или инертные подложки, покрытые слоем меди. Используют электролит на основе сульфаминовой или сульфосалициловой кислоты. В этом растворе кроме солей меди и селена содержатся ионы индия (III) в виде его сернокислой соли In2(SO4)3. Соотношение селена к индию не меньше 1:2, общее соотношение концентраций ...

СПОСОБ ОПРЕДЕЛЕНИЯ КОНЦЕНТРАЦИИ СЕЛЕНА (IV)

Изобретение относится к инверсионно-вольтамперометрическому способу анализа селена (IV). Известный способ анализа селена (IV) на электроактивных (серебряный, свинцовый) электродах, с использованием в качестве фонового электролита 0,1 М HCI с добавлением меди, содержит большое количество операций и обладает невысокой воспроизводимостью. Благодаря тому, что в предложенном способе анализ селена (IV) проводят на электроактивном медном дисковом электроде, в качестве фонового электролита используют 0,5 М водный раствор (NH4)2HC6H5O7, предварительное накопление соединения селена с медью на электроде проводят при потенциале -0,1 В в течение 1 минуты с последующим снятием вольтамперных кривых в интервале потенциалов от -0,1 В до -0,4 В, удается упростить анализ селена и достичь высокой воспроизводимости и точности результата.

СПОСОБ ПРИГОТОВЛЕНИЯ ПЛЕНКИ СОЕДИНЕНИЯ CuInSe2

Изобретение относится к способу приготовления пленки соединения CuInSe2. Способ осуществляют путем электроосаждения на поверхности катода в присутствии фонового электролита, содержащего ионы меди (II), селена (III), индия (IV) и последующего отжига пленки, отличающийся тем, что в качестве катода используют стеклоуглеродный или углеситаловый электрод, в качестве электролита - водный раствор, содержащий, M: CuSO4 - 5x10-3, In2(SO4)37H2O - 2x10-2, NaHSeO3 -1,3x10-2, H2SO4 - 5x10-2, электроосаждение ведут при потенциале (-0,75)В (Ag/AgCl), а отжиг пленки проводят в аргоне при 350 ºС в течение 10 мин.

СПОСОБ ПРИГОТОВЛЕНИЯ ПЛЕНКИ СОЕДИНЕНИЯ CUINSE2

Изобретение относится к способам приготов-ления пленки соединения CuInSe2. Известный способ электроосаждения пленки медь-индиевого диселенида на поверхности титанового или нике-левого катода в присутствии фонового электролита, содержащего ионы меди(II), индия (III), селена (IV) не позволяет получать пленки со строго заданной фазовым и стехиометрическим составом Cu:In:Se =1:1:2. Благодаря тому, что в предложенном способе в качестве катода используют стеклоуглеродный электрод, в качестве электролита - 0,45М Na2SO4 в 0,05М H2SO4, содержащий водные растворы солей (М): CuSO4 -1·10-3; In2(SO4)3·7H2O 1·10-3; NaHSeO3 - 1·10-3; электроосаждение ведут в области потен-циалов от -0,25 до -0,8 В (Ag/AgCI), полученные пленки прокаливают на воздухе при 350ºС в течение 10 минут, удается получать пленки строго заданного фазового и стехиометрического состава - CuInSe2.

СПОСІБ ВИГОТОВЛЕННЯ ОКСИДНОКОБАЛЬТОВОГО АНОДА

... 1. Об'єкт винаходу: оксиднокобальтовий електрод. 2. Суть винаходу: в електроліт додатково вводять цирконій сірчанокислий чотириводний у кількості 2-15 г/дм3, натрій лимоннокислий тризаміщенний у кількості 20-150 г/дм3 і в ньому здійснюють катодне соосаждення кобальту, цирконію і їхній гідроксидів при щільності струму 2-6 А/дм2, значенні рН електроліту 8,5-9,5, анодне доокислення термообробленого після катодного соосадження покриття і нарощування оксидного покриття при співвідношенні площі анода до площі катода Sa:Sк=(2-10):1. 3. Область використання: електрохімічні виробництва, зокрема, електроосадження оксиднокобальтових покрить з метою виготовлення каталізаторів різних хімічних реакцій, тепловиділюючих елементів, а також малозношуваних анодів для електролізу хлорних розчинів, кисневих електродів паливних елементів, окислювання закису вуглецю, деструкції барвників і ін. 4. Технічний результат зниження пористості покриття при збільшенні його товщини і міцності зчеплення з основою.

СПОСОБ ОПРЕДЕЛЕНИЯ ЗАЩИТНОЙ КОНЦЕНТРАЦИИ ИНГИБИТОРА КОРРОЗИИ ЛАТУНИ

Изобретение относится к вольтамперометрическому способу определения защитной концентрации ингибитора коррозии латуни. Известный электрохимический способ определения защитной концентрации ингибитора коррозии методом поляризационного сопротивления имеет ряд ограничений при его использовании, отличается длительностью исследований, большой затратой времени на обработку поляризационных кривых. Благодаря тому, что в предложенном способе определение защитной концентрации ингибитора коррозии латуни проводят путем использования в качестве индикаторного электрода - электрода из латуни (Л-70); в качестве фонового электролита - водный раствор 0,3 M Na2SO4, содержащий различные концентрации нитрилтриметиленфосфоновой кислоты (НТФ); перед снятием вольтамперных кривых индикаторный электрод экспонируют при потенциале анодного растворения (E=-0,2B) в течение 60 с; вольтамперные кривые снимают в интервале потенциалов от -0,2 B до -1,3 B; из полученной серии вольтамперных кривых строят зависимость максимального ...

Electrochemical method for preparation of silicon-containing hydroxyapatite nano composite coating on nickel titanium alloy surface

The invention discloses a electrochemical method for preparation of a silicon-containing hydroxyapatite nano composite coating on a nickel titanium alloy surface, and the electrochemical method comprises the following steps: a three electrode system is used for constant current deposition, a nickel titanium plate is used as a working electrode, a platinum sheet is used as a counter electrode, and a saturated calomel electrode is used as a reference electrode; the silicon-containing hydroxyapatite nano composite coating is obtained by deposition in an electrolyte comprising calcium nitrate, ammonium dihydrogen phosphate and nano silica, the current is 0.8mA, the time is 1800s, the temperature is 65 DEG C, and finally vacuum sintering of the sample is performed at 400 DEG C. The external of the coating is a micron-sized multi-cavity shape, the porous structure provides channels and spaces for growth of fiber cells and bone cells into a biological ceramic material, and increases the combination ...

Preparation method of sodium yttrium tetrafluoride bismuth oxyiodide composite solar film

The invention discloses a preparation method of a sodium yttrium tetrafluoride bismuth oxyiodide (NaYF4:Yb-Er/BiIO) composite solar film. The method involves depositing a Yb-doped Er-doped sodium yttrium tetrafluoride (NaYF4:Yb-Er) upconversion film on one side surface of a conductive glass substrate and then self-assembling a bismuth oxyiodide film on the NaYF4:Yb-Er film. The prepared composite film is uniform and compact and is a composite solar film responding to near infrared light. The technical method is simple, the materials are available, the cost is low, the energy consumption is low, and there is no toxicity. Normal-temperature normal-pressure operation can be realized, and the method has high prospect for industrial production.

Method for preparing copper-indium-sulfur film

The invention discloses a method for preparing a copper-indium-sulfur film, which comprises the following steps: 1) taking a copper salt, an indium salt, a sulfur salt, a complexing agent and supporting electrolyte deionized water to prepare electrolyte; 2) soaking a conducting substrate as a working electrode in the electrolyte, and adopting a three-electrode system and a constant potential mode to deposit copper, indium and sulfur deacidized out of the electrolyte on the conducting substrate at room temperature so as to obtain a CIS preformed film; and 3) putting the CIS preformed film into a pipe furnace, and performing curing and annealing treatments under an argon atmosphere containing elemental sulfur. The method has the advantages of simple process and low cost. The prepared CIS film is uniform and compact with pure phases and can be applied to an absorption layer of a solar battery. The method can achieve industrial mass production.

Heat treatment method for increasing n-type cuprous oxide film carrier concentration

Lead-silver alloy of aluminum composite anode plate and its preparation method

CaBi

A flexible plastic substrate and the electrodeposition nano ZnO thin film preparation method

Modified graphene coating solution for direct electroplating as well as preparation method and application of modified graphene coating solution

The invention provides a modified graphene coating solution for direct electroplating and a preparation method and application thereof. The modified graphene coating solution for direct electroplating comprises edge modified graphene, a high-molecular polymer, a condensing agent, a surface energy additive, a hyperdispersant, a PH regulator and water, and the surface energy additive comprises a nonionic gemini surfactant and an anionic surfactant. The modified graphene coating solution for direct electroplating is relatively good in dispersing capacity and conductivity, and can be relatively well adapted to a direct electroplating process of a printed circuit board.

Copper-based graphene composite material and preparation method thereof

The invention discloses a copper-based graphene composite material and a preparation method thereof, the preparation method comprises the steps of pretreating a copper plate, preparing a single-layer graphene oxide solution and the like, and the copper-based graphene composite material is prepared according to the method. The copper-based graphene composite material is good in yield strength, tensile strength, ductility and the like, and good in comprehensive performance. According to the preparation method, an electro-deposition method is adopted, specific parameter conditions are set, combination of graphene and a metal matrix is improved, graphene is distributed on the metal matrix more evenly, interface combination is good, meanwhile, the problem that the performance of a plate is unstable after hot pressing sintering is avoided as much as possible, and excellent mechanical performance is achieved.

ELECTRODEPOSITION OF GRAPHENE LAYER FROM DOPED GRAPHITE

Provided is a method of forming a uniform graphene layer on a substrate (metal- or conductive-polymer-coated, ITO) by doping expanded graphite using various kinds of dopants (Lewis acid) to grant a positive charge thereto, dispersing the doped expanded graphite in an organic solvent using ultrasonic waves to obtain a solution in which the graphene is dispersed in the organic solvent, and electrically applying a negative voltage to the solution. 1. A method of electrodepositing graphene , comprising:doping expanded graphite using a dopant;dispersing the doped expanded graphite in an organic solvent, and obtaining doped graphene dispersed in the solvent; andapplying a voltage to the solvent in which the doped graphene is dispersed.2. The method of claim 1 , wherein the dopant is one of HNO claim 1 , FeCl claim 1 , HSO claim 1 , and FTS.3. The method of claim 1 , wherein the dopant is FeCl.4. The method of claim 1 , wherein the solvent is ACN.5. The method of claim 1 , wherein the dispersion is performed using an ultrasonic wave device.6. The method of claim 1 , wherein the electrodeposition is performed using a platinum plate as a counter electrode claim 1 , PEDOT-coated gold as a working electrode claim 1 , and Ag/AgCl/KCl(sat'd) as a reference electrode.7. The method of claim 3 , wherein the applied voltage is a negative voltage of −1.5 V to −1.0 V.8. A method of electrodepositing graphene claim 3 , comprising:p-doping expanded graphite using a dopant;dispersing the doped expanded graphite in an organic solvent using ultrasonic waves, and obtaining doped graphene dispersed in the solvent; andapplying a negative voltage to the solvent in which the doped graphene is dispersed.9. The method of claim 8 , wherein the dopant is one of HNO claim 8 , FeCl claim 8 , HSO claim 8 , and FTS.10. The method of claim 9 , wherein the dopant is FeCl claim 9 , and the negative voltage is −0.5 V or lower.11. The method of claim 9 , wherein the dopant is FeCl claim 9 , and the negative ...

PRETREATMENT OF TINPLATE PRIOR TO THE COATING THEREOF WITH LACQUER

The invention relates to a method for the anti-corrosive pretreatment of tinplate, in which an anti-corrosive primer coating is applied in a single step, said primer coating effectively preventing the shiny metal surface of the pretreated tinplate from turning black when the pretreated tinplate of the invention that is provided with a topcoat is in contact with liquids releasing or containing sulfur compounds and with food containing protein. In the disclosed method, the tinplate is anodically polarized in an electrolyte containing silicates of formula MO.nSiO, where M is an alkali metal ion or quaternary ammonium ion and n is a natural number between 0.8 and 7. Tinplate pretreated according to the invention can be used in particular for the production of food-safe packaging such as beverage cans or tin cans. 1. A method for the electrolytic passivation of tinplate by anodic polarization in an alkaline aqueous electrolyte , wherein the electrolyte contains at least one water-soluble silicate of the composition MO.nSiO , where “M” is an alkali metal ion or quaternary ammonium ion and “n” is a natural number between 0.8 and 7.215.-. (canceled) The present invention relates to a method for the anti-corrosive pretreatment of tinplate, in which an anti-corrosive primer coating is applied in a single step, said primer coating effectively preventing the shiny metal surface of the pretreated tinplate from turning black when the pretreated tinplate of the invention that is provided with a topcoat is in contact with liquids releasing or containing sulfur compounds and with food containing protein. In the method according to the invention, the tinplate is anodically polarized in an electrolyte containing silicates of the composition MO.nSiO, where M is an alkali metal ion or quaternary ammonium ion and n is a natural number between 0.8 and 7. A subsequent conventional passivation of the tinplate surface can additionally preserve the metallic appearance of the tinplate surface ...

METHOD FOR FORMING ZrO2 FILM BY PLASMA ELECTROLYTIC OXIDATION

A method for forming a ZrOoxide film by plasma electrolytic oxidation includes a first step of placing an anode, which is a substrate with a ZrN film, and a cathode into an electrolyte of which the temperature range is from 65° C. to 75° C. Said electrolyte contains barium acetate or barium hydroxide ranging from 0.3 M to 0.7 M and sodium hydroxide or potassium hydroxide ranging from 1.5 M to 2.5 M. The method includes a second step of applying a voltage ranging from 50 V to 1000 V to the anode and cathode to finally form a ZrOfilm on a surface of the ZrN film of the anode. A DC power supply, an AC power supply, unipolar pulse power supply or bipolar pulse power supply is applied to said anode and cathode in constant-voltage mode or constant-current mode. The oxide film can be formed more rapidly than the prior art and has excellent crystallinity. 1. A method for forming a ZrOfilm by plasma electrolytic oxidation (PEO) , comprising steps of:(a) placing an anode, which is a substrate deposited with a ZrN film, and a cathode into an electrolyte of which the temperature range is from 65° C. to 75° C., wherein said electrolyte contains barium acetate or barium hydroxide ranging from 0.3 M to 0.7 M and sodium hydroxide or potassium hydroxide ranging from 1.5 M to 2.5 M; and{'sub': '2', '(b) applying a voltage ranging from 50 V (volts) to 1000 V to said anode and cathode to form a ZrOfilm on a surface of said ZrN film, wherein a DC power supply, an AC power supply, unipolar pulse power supply or bipolar pulse power supply is applied to said anode and cathode in constant-voltage mode or constant-current mode.'}2. The method as claimed in claim 1 , wherein said ZrN film is formed on said substrate by way of sputtering claim 1 , sintering claim 1 , spray coating or dipping in the step (a).3. The method as claimed in claim 1 , wherein said cathode is platinum claim 1 , carbon claim 1 , or stainless steel in the step (a).4. The method as claimed in claim 1 , wherein a DC ...

ELECTRODEPOSITION OF BIAXIALLY TEXTURED LAYERS ON A SUBSTRATE

Methods of producing one or more biaxially textured layer on a substrate, and articles produced by the methods, are disclosed. As exemplary method may comprise electrodepositing on the substrate a precursor material selected from the group consisting of rare earths, transition metals, actinides, lanthanides, and oxides thereof. An exemplary article may comprise a biaxially textured base material, and at least one biaxially textured layer selected from the group consisting of rare earths, transition metals, actinides, lanthanides, and oxides thereof. The at least one biaxially textured layer is formed by electrodeposition on the biaxially textured base material. 1. A method of producing at least one biaxially textured layer on a substrate , comprising electrodepositing on the substrate a precursor material selected from the group consisting of rare earths , transition metals , actinides , lanthanides , and oxides thereof.2. The method of claim 1 , wherein the precursor material is selected from the group consisting of CeO claim 1 , doped CeO claim 1 , LaO claim 1 , Ir claim 1 , Ni—Ir claim 1 , Ni YSZ claim 1 , YO claim 1 , and La—Mn—O.3. The method of claim 1 , wherein the substrate is biaxially textured.4. The method of claim 1 , wherein the substrate comprises Ni.5. The method of claim 1 , wherein the substrate comprises Ni—W.6. The method of claim 1 , wherein the precursor material is CeO.7. The method of claim 1 , wherein the precursor material is a doped CeO.8. The method of claim 1 , wherein the CeOis doped with Sm claim 1 , Gd claim 1 , or Zr.9. The method of claim 1 , further comprising electrodepositing CeOon electrodeposited YO.10. The method of claim 1 , wherein electrodepositing is at a current density in the range of about 0.05 to 25 mA/cm.11. The method of claim 1 , wherein electrodepositing is during stirring of a bath containing the precursor material.12. The method of claim 1 , wherein the electrodepositing is in the range of about 20° C. to 100° C. ...

Selective Solar Absorber Having a Thick Corrosion-Resistant Passivation and Thermal Barrier Layer for High Temperature Applications and its Process of Preparation

A selective solar thermal absorber capable of operating at high temperatures in a corrosive environment, including, successively stacked, a substrate, a selective solar coating, configured in order to absorb a large part of the solar radiation while re-emitting as little as possible of thermal infrared radiation at high temperatures when it is not corroded, and a corrosion-resistant barrier layer. The corrosion-resistant barrier layer is a thick passivation layer which is thermally stable, which has a low optical refractive index and which is optically transparent to solar radiation, the thickness being adjusted as a function of the operating temperature and of the effectiveness of the third material in order to prevent the diffusion of constituent components of the corrosive environment. 1. Selective solar thermal absorber capable of operating at high temperatures in a corrosive environment , comprising , successively stacked:a substrate composed of a first material,a selective solar coating composed of a second material,a corrosion-resistant barrier layer composed of a third material,characterized in that:the corrosion-resistant barrier layer is a passivation layer having an optical refractive index of less than or equal to 2 over the range of wavelengths between 0.3 μm and 10 μm and being transparent to the radiation of the solar spectrum for which the wavelength is between 0.3 μm and 2.5 μm,and in that the thickness of the said corrosion-resistant barrier is greater than or equal to 0.5 μm.2. Selective solar thermal absorber according to claim 1 , wherein said corrosion-resistant barrier layer is also transparent to the radiation for which the wavelength is between 2.5 μm and 10 μm.3. Selective solar thermal absorber according to claim 1 , wherein the said corrosion-resistant barrier layer exhibits a transmittance of greater than or equal to 90%.4. Selective solar thermal absorber according to claim 1 , wherein claim 1 , the said selective solar coating ...

CMAS-INERT THERMAL BARRIER LAYER AND METHOD FOR PRODUCING THE SAME

Disclosed are a method for forming a thermal barrier layer for a metallic component, which method involves forming a ceramic coat in which at least in part aluminum oxide and titanium oxide are disposed, the aluminum oxide and the titanium oxide being introduced by infiltration of aluminum-containing and titanium-containing particles or substances or by physical vapor deposition. 1. A method for forming a thermal barrier layer for a metallic component which involves formation of a ceramic coat , wherein aluminum oxide and titanium oxide are disposed at least in part in the ceramic coat and wherein the method comprises introducing the aluminum oxide and the titanium oxide by (i) infiltration of aluminum-containing and titanium-containing particles or substances or by (ii) physical vapor deposition.2. The method of claim 1 , wherein the aluminum oxide and the titanium oxide are introduced by (i).3. The method of claim 1 , wherein the aluminum oxide and the titanium oxide are introduced by (ii).4. The method of claim 2 , wherein for (i) the aluminum oxide particles and the titanium oxide particles or the aluminum-containing and titanium-containing particles or substances are employed in the form of nanoparticles having an average grain size or maximum size of up to 200 nm.5. The method of claim 2 , wherein infiltration is carried out by application or immersion into a suspension or by a sol-gel method or by electrophoresis or electrolysis.6. The method of claim 2 , wherein the aluminum oxide particles and titanium oxide particles and/or the aluminum-containing and titanium-containing particles or substances are present in an aqueous or alcoholic suspension.7. The method of claim 2 , wherein the ceramic coat is immersed into a suspension for about 0.25 to about 30 hours and is subsequently dried for up to about two hours claim 2 , at a temperature of up to about 500° C.8. The method of claim 1 , wherein an aluminum-containing starting material comprises at least one ...

SEMICONDUCTOR DEVICE, BASE, AND METHOD FOR MANUFACTURING SAME

A semiconductor device includes a base and a semiconductor element disposed on the base. The base includes: a base member, a reflective film located above the base member, the reflective film containing silver as a major component and containing particles formed of at least one material selected from the group consisting of an oxide, a nitride, and a carbide; and a dielectric multilayered film located above the reflective film. 1. A semiconductor device comprising: a base member,', 'a reflective film located above the base member, the reflective film containing silver as a major component and containing particles formed of at least one material selected from the group consisting of an oxide, a nitride, and a carbide, and', 'a dielectric multilayered film located above the reflective film; and, 'a base comprisinga semiconductor element disposed on the base.2. The semiconductor device according to claim 1 , wherein a content of the particles in the reflective film is at least 0.01% by mass and at most 5% by mass with respect to a total mass of the reflective film.3. The semiconductor device according to claim 1 , wherein the particles are in contact with the dielectric multilayered film or distributed near a surface of the reflective film closer to the dielectric multilayered film.4. The semiconductor device according to claim 1 , wherein the particles are dispersed throughout the reflective film.5. The semiconductor device according to claim 1 , wherein the particles are unevenly distributed and concentrated at or near an upper surface of the reflective film.6. The semiconductor device according to claim 1 , wherein the particles contained in the reflective film are formed of at least one material selected from the group consisting of GaO claim 1 , NbO claim 1 , and HfO.7. The semiconductor device according to claim 1 , wherein:the dielectric multilayered film comprises two or more types of films each containing an oxide or nitride of at least one element selected ...

METHOD FOR SEALING OXIDE PROTECTIVE LAYERS ON METAL SUBSTRATES

A method for sealing oxide protective layers on metal substrates using aqueous compositions containing a copolymer or a copolymer mixture of at least one aliphatic and acyclic alkene with at least one α,β-unsaturated carboxylic acid in a water-dispersed and/or water-dissolved form with a copolymer or copolymer mixture acid number of at least 20 mg KOH/g, but not more than 200 mg KOH/g, the invention also relates to the use of such copolymers or such a copolymer mixture for sealing protective layers based on oxides and/or hydroxides of the elements Si, Ti and/or Zr on an aluminum substrate where the protective layer has a thickness of at least 2 microns. 1. A method for sealing oxide protective layers on metal substrates , wherein the metal substrate provided with the oxide protective layer is subjected to the following steps: a) at least 1 wt. % of a copolymer or of a copolymer mixture of at least one aliphatic and acyclic alkene with at least one α,β-unsaturated carboxylic acid in water-dispersed and/or water-dissolved form, based on the aqueous composition, wherein of the copolymer or the copolymer mixture has an acid number that is at least 20 mg KOH/g, but no more than 200 mg KOH/g; and', 'b) a cross-linking agent;, '(i) contacting with an aqueous composition for sealing, comprisingand subsequently(ii) drying and/or curing takes place while supplying thermal energy to thereby form a cured seal;wherein the aqueous composition for sealing in step (i) has a flow time of no more than 50 seconds, measured by way of a 4 mm DIN flow cup.2. The method according to claim 1 , wherein the copolymer or the copolymer mixture is present in an amount of at least 5 wt. % claim 1 , but no more than 30 wt. % claim 1 , based on the aqueous composition.3. The method according to claim 1 , wherein the cross-linking agent b) is selected from water-soluble inorganic compounds of the elements Zr and/or Ti claim 1 , from water-soluble and/or water-dispersible aminoplasts and/or ...

Method and Chemistry for Selenium Electrodeposition

Techniques for electrodepositing selenium (Se)-containing films are provided. In one aspect, a method of preparing a Se electroplating solution is provided. The method includes the following steps. The solution is formed from a mixture of selenium oxide; an acid selected from the group consisting of alkane sulfonic acid, alkene sulfonic acid, aryl sulfonic acid, heterocyclic sulfonic acid, aromatic sulfonic acid and perchloric acid; and a solvent. A pH of the solution is then adjusted to from about 2.0 to about 3.0. The pH of the solution can be adjusted to from about 2.0 to about 3.0 by adding a base (e.g., sodium hydroxide) to the solution. A Se electroplating solution, an electroplating method and a method for fabricating a photovoltaic device are also provided. 1. An electroplating method , comprising the steps of: forming the solution from a mixture comprising selenium oxide, an acid selected from the group consisting of alkane sulfonic acid, alkene sulfonic acid, aryl sulfonic acid, heterocyclic sulfonic acid, aromatic sulfonic acid and perchloric acid and a solvent;', 'adjusting a pH of the solution to from about 2.0 to about 3.0. providing a substrate; and, 'preparing a selenium electroplating solution by the steps ofelectroplating a selenium-containing film on the substrate using the solution as a plating bath.2. The method of claim 1 , further comprising the step of:annealing the film at a temperature of from about 100° C. to about 300° C. for a duration of from about 30 minutes to about 60 minutes.3. The method of claim 1 , wherein the solvent is selected from the group consisting of: water claim 1 , glycerol claim 1 , an ionic liquid claim 1 , and combinations thereof.4. The method of claim 1 , wherein the step of adjusting the pH of the solution comprises the step of:adding a base to the solution, after the forming step has been performed, to adjust the pH of the solution to from about 2.0 to about 3.0.5. The method of claim 4 , wherein the base ...

POROUS GRAPHENE NETWORK ELECTRODES AND AN ALL-CARBON LITHIUM ION BATTERY CONTAINING THE SAME

Systems for the production of graphene oxide sheets are provided. The systems include electro-deposition and spray deposition techniques. The graphene oxide sheets may be used as pre-cursors for the formation of porous graphene network (PGN) anodes and lithiated porous graphene (Li-PGN) cathodes. The method of making PGN electrodes includes thermally reducing a pre-cursor sheet of graphene oxide to provide a PGN anode and exposing the sheet to lithium or a lithium-containing compound to produce a Li-PGN cathode. The Li-PGN cathode and PGN anode may be combined with an electrolyte to provide an “all-carbon” battery that is useful in various applications, such as automotive applications. 1. A system for the production of graphene oxide sheets comprising:a counter electrode and a working electrode immersed in a bath, the bath containing a dispersion of graphene oxide,a substrate applied to a surface of the counter electrode, anda source of electricity configured to apply a current between the counter electrode and the working electrode capable of electrolytically depositing the graphene oxide in the bath onto the substrate.2. The system of claim 1 , wherein the substrate comprises a hydrophilic porous polymer.3. The system of claim 1 , wherein the substrate is configured to be removable from the bath following deposition of the graphene oxide.4. The system of claim 1 , further comprising a plurality of rollers configured to advance the substrate through the bath and wherein the substrate is in the form of a web provided on at least one of the plurality of rollers.5. The system of further comprising a drying zone downstream of the bath and configured to dry the graphene oxide deposited on the substrate.6. The system of further comprising a reduction zone downstream of the bath and configured to reduce the graphene oxide to graphene.7. A system for the production of graphene oxide sheets comprising:a heated substrate,a dispersion of graphene oxide,and a spray nozzle ...

METHODS OF FORMING BORIDED DOWN HOLE TOOLS, AND RELATED DOWN-HOLE TOOLS

A method of forming a down-hole tool comprises contacting at least a portion of at least one down-hole structure comprising at least one ceramic-metal composite material with a molten electrolyte comprising sodium tetraborate. Electrical current is applied to at least a portion of the at least one down-hole structure to form at least one borided down-hole structure comprising at least one metal boride material. Other methods of forming a down-hole tool, and a down-hole tool are also described. 1. A method of forming a down-hole tool , comprising:{'sub': 2', '4', '7, 'contacting at least a portion of at least one down-hole structure comprising at least one ceramic-metal composite material with a molten electrolyte comprising NaBO; and'}applying electrical current to the at least a portion of the at least one down-hole structure to form at least one borided down-hole structure comprising at least one metal boride material.2. The method of claim 1 , wherein contacting at least a portion of at least one down-hole structure further comprises selecting the at least one down-hole structure to comprise a component of at least one of an earth-boring rotary drill bit claim 1 , a completion tool claim 1 , an expandable reamer claim 1 , an expandable stabilizer claim 1 , a fixed stabilizer claim 1 , a slip-on stabilizer claim 1 , a clamped-on stabilizer claim 1 , an integral stabilizer claim 1 , an optimized rotational density tool claim 1 , a slimhole neutron density tool claim 1 , a calibrated neutron density tool claim 1 , a drill motor claim 1 , a bearing claim 1 , an upper bearing housing claim 1 , a lower bearing housing claim 1 , a rotor claim 1 , a stator claim 1 , a pump claim 1 , and a valve.3. The method of claim 1 , wherein contacting at least a portion of at least one down-hole structure comprising at least one ceramic-metal composite material further comprises selecting the ceramic-metal composite material to comprise hard ceramic phase particles in a matrix of at ...

FILM, FILM FORMING METHOD, AND SURFACE-COATED MATERIAL

A film that contains NiOH as a main component. 1. A film comprising NiOH as a main component.2. A film forming method comprising repeatedly alternately applying a first potential and a second potential to a Ni material in a state where the Ni material is immersed in an alkaline solution , such that a film that contains NiOH as a main component is formed on a surface of the Ni material , wherein:{'sub': '2', '#text': 'the first potential is a potential at which Ni turns tetravalent in a Ni—HO system; and'}{'sub': '2', '#text': 'the second potential is a potential at which Ni turns divalent in the Ni—HO system.'}3. The film forming method according to claim 2 , wherein the alkaline solution has a temperature of 40° C. to 90° C. and a pH of 10 or higher.4. The film forming method according to claim 2 , wherein the alkaline solution is one of a KOH solution claim 2 , a NaOH solution claim 2 , and a LiOH solution.5. A surface-coated material comprising:{'claim-ref': {'@idref': 'CLM-00001', '#text': 'claim 1'}, '#text': 'the film according to ; and'}a Ni material in which at least a part of a surface is coated with the film. This application claims priority to Japanese Patent Application No. 2020-151421 filed on Sep. 9, 2020, incorporated herein by reference in its entirety.The present disclosure relates to a film, a film forming method, and a surface-coated material.As a surface modification treatment for a Ni (nickel) material, a method of forming a nickel fluoride passivation film that has anticorrosion properties on a surface of the Ni material by using fluorine gas is known.Japanese Unexamined Patent Application Publication No. 2011-233423 (JP 2011-233423 A) discloses a method of suppressing an increase in amounts of NiOH generated in a positive electrode of an alkaline storage battery, such as a nickel-hydrogen battery. However, a film that contains NiOH as a main component is not known.Nickel fluoride has anticorrosion properties but is an electrical insulator. ...

NANO-CATALYST FILTER AND PRODUCTION METHOD FOR SAME

Provided is a method of manufacturing a nano-catalyst filter, which includes depositing through electrodeposition a catalyst precursor inside a porous filter to which an electrode layer is attached. Using this method, a nano-catalyst can be uniformly deposited inside a porous ceramic filter, and high catalyst efficiency can be obtained only using a small amount of the nano-catalyst. 1. A method of manufacturing a nano-catalyst filter , comprising:forming a nano-catalyst by electrodeposition of a nano-catalyst precursor inside a porous filter.2. The method of claim 1 , wherein the porous filter is formed of a material selected from the group consisting of alumina claim 1 , silica claim 1 , mullite claim 1 , zeolite claim 1 , zirconia claim 1 , titanium oxide claim 1 , silicon carbide claim 1 , and cordierite.3. The method of claim 1 , wherein the porous filter is formed as a disc type or a honeycomb type porous filter.4. The method of claim 1 , wherein the nano-catalyst is a material selected from the group consisting of a metal oxide claim 1 , a transition metal claim 1 , a noble metal claim 1 , and a rare earth metal.5. The method of claim 1 , wherein the nano-catalyst precursor is selected from the group consisting of a metal oxide precursor claim 1 , a transition metal precursor claim 1 , a noble metal precursor claim 1 , and a rare earth metal precursor.6. The method of claim 1 , comprising:dipping the porous filter into a plating bath filled with an electrolyte solution containing the nano-catalyst precursor, and decompressing the plating bath; andperforming electrodeposition.7. The method of claim 6 , wherein a concentration of the nano-catalyst precursor is 0.01 to 30 M.8. The method of claim 6 , wherein the electrolyte solution has a pH of 1 to 5.9. The method of claim 6 , wherein the decompression is performed at a pressure of 100 kPa to 100 mPa.10. The method of claim 6 , wherein the decompression is performed for 10 minutes to 5 hours.11. The method of ...

MANUFACTURING METHOD FOR CARBONFIBER GROWN METAL OXIDE

A method for manufacturing metal oxide-grown carbon fibers including immersing carbon fibers in a solution for forming a metal oxide seed layer and electrodepositing a metal oxide seed on the surfaces of carbon fibers, or irradiating microwave thereto to form a metal oxide seed layer, and irradiating microwave to the metal oxide seed layer-formed carbon fibers to grow metal oxide. The method for manufacturing metal oxide-grown carbon fibers can reduce process time, and improve process energy efficiency and production efficiency. The method for manufacturing metal oxide-grown carbon fibers can offer metal oxide-grown carbon fibers with improved interfacial shear stress. 1. A method for manufacturing metal oxide-grown carbon fibers comprising:immersing carbon fibers in a solution for forming a metal oxide seed layer and then electrodepositing a metal oxide seed on the surfaces of carbon fibers or irradiating microwave thereto to form a metal oxide seed layer; andirradiating microwave to the metal oxide seed layer-formed carbon fibers to grow metal oxide.2. The method according to claim 1 , further comprising surface treating the carbon fibers before forming the metal oxide seed layer claim 1 ,wherein the surface treatment is carried out by a method selected from the group consisting of coupling agent treatment, plasma treatment, acid treatment and dopamine treatment.3. The method according to claim 1 , wherein the electrodeposition is carried out in a device using the carbon fiber as a cathode claim 1 , using an electrode plate as an anode and using the solution for forming a metal oxide seed layer as an electrolyte.4. The method according to claim 3 , wherein the electrode plate comprises any one selected from the group consisting of aluminum claim 3 , zinc claim 3 , copper claim 3 , iron claim 3 , graphite claim 3 , silver claim 3 , gold claim 3 , platinum and lead.5. The method according to claim 1 , wherein the solution for forming a metal oxide seed layer ...

ANODIZING APPARATUS AND ANODIZING METHOD

An anodizing apparatus configured to perform an anodization on a metallic material to be processed provided with a projecting portion on a surface thereof, includes: an electrolysis tank configured to store electrolytic solution for anodization; a first electrode portion formed of a metal and electrically connected to the material in an immersed state immersed in the electrolytic solution in the electrolysis tank; a second electrode portion formed of a metal and opposing the material in the immersed state; an electrode apparatus configured to apply a predetermined voltage between the first and second electrode portions; a retaining device configured to retain and rotate the material in the immersed state; and a first injection device configured to inject the electrolytic solution toward a predetermined area deviated from the material in a storage space in the electrolysis tank so that the material is deviated from a line in the direction of injection. 1. An anodizing apparatus configured to perform an anodization on a metallic material to be processed provided with a projecting portion on a surface thereof , comprising:an electrolysis tank configured to store electrolytic solution for anodization;a first electrode portion formed of a metal and electrically connected to the material to be processed in an immersed state immersed in the electrolytic solution in the electrolysis tank;a second electrode portion formed of a metal and opposing the material to be processed in the immersed state;an electrode apparatus configured to apply a predetermined voltage between the first electrode portion and the second electrode portion;a retaining device configured to retain and rotate the material to be processed in the immersed state; anda first injection device configured to inject the electrolytic solution for the anodization toward a predetermined area deviated from the material to be processed in a storage space in the electrolysis tank so that the material to be processed is ...

Vacuum pump components without conversion layers

The invention relates to vacuum pump components without conversion layers that are made of valve metals and alloys thereof.

ELECTRODEPOSITION MEDIUMS FOR FORMATION OF PROTECTIVE COATINGS ELECTROCHEMICALLY DEPOSITED ON METAL SUBSTRATES

Articles including a conductive metal substrate and a protective coating on the metal substrate are provided. The protective coating is electrochemically deposited from an electrodeposition medium including a silicon alkoxide and quaternary ammonium compounds or quaternary phosphonium compounds. Methods of electrochemically depositing such protective coatings are also described herein. 1. An article comprising: a silicon alkoxide;', 'one or more quaternary ammonium compounds or quaternary phosphonium compounds; and', 'water., 'an electrically conductive metal substrate and a protective coating, the protective coating electrochemically deposited from an electrodeposition medium comprising2. The article of claim 1 , wherein the silicon alkoxide comprises tetraethyl orthosilicate.3. The article of claim 1 , wherein the one or more quaternary ammonium compounds or quaternary phosphonium compounds are selected from the group consisting of tetra butyl ammonium hydroxide claim 1 , benzyl triethyl ammonium hydroxide claim 1 , tetra ethyl ammonium hydroxide claim 1 , tetra methyl ammonium hydroxide claim 1 , benzyl trimethyl ammonium hydroxide claim 1 , trimethyl hydroxyethyl ammonium hydroxide claim 1 , tetra butyl phosphonium hydroxide claim 1 , benzyl triethyl phosphonium hydroxide claim 1 , tetra ethyl phosphonium hydroxide claim 1 , tetra methyl phosphonium hydroxide claim 1 , benzyl trimethyl phosphonium hydroxide claim 1 , and trimethyl hydroxyethyl phosphonium hydroxide.4. The article of claim 1 , wherein the mole ratio of the silicon alkoxide to the one or more quaternary ammonium compounds or quaternary phosphonium compounds ranges from about 1 to about 2 to a mole ratio of about 1 to about 7.5. The article of claim 1 , wherein the electrodeposition medium comprises a pH of about 8 to about 12.6. The article of claim 1 , wherein about 5% or more of the protective coating is electrochemically deposited onto the electrically conductive metal substrate from the ...

METHOD FOR PROCESSING A SUPER-HYDROPHOBIC SURFACE, AND EVAPORATOR HAVING THE SUPER-HYDROPHOBIC SURFACE

A method for fabricating a super-hydrophobic surface having excellent surface strength and an evaporator having the super-hydrophobic surface fabricated by the method are provided. The method includes preparing a metal base material, anodizing the metal base material to form a ceramic layer having a complex structure of a microstructure and nano-fiber structures on a surface of the metal base material, and applying a hydrophobic polymer material on the complex structure to form a polymer layer having the same surface shape as the complex structure. 1. A method for fabricating a super-hydrophobic surface , comprising:preparing a metal base material;anodizing the metal base material to form a ceramic layer having a complex structure of a microstructure and nano-fiber structures on a surface of the metal base material; andapplying a hydrophobic polymer material on the complex structure to form a polymer layer having the same surface shape as the complex structure.2. The method of claim 1 , wherein the metal base material includes at least one selected from the group consisting of aluminum claim 1 , nickel claim 1 , titanium claim 1 , magnesium claim 1 , and zinc.3. The method of claim 1 , whereinnano-holes are formed in the ceramic layer during an early stage of the anodizing, andwall surfaces of the nano-holes collapse due to enlargement of the nano-holes according to progress of the anodizing and wall surfaces having a high density remain at a center to form the complex structure formed of the nano-fiber structures and mountain range-shaped microstructures.4. The method of claim 3 , wherein during the anodizing claim 3 , a temperature of an electrolyte solution is in a range of 0 to 40° C. claim 3 , and a voltage applied to the metal base material and a counter electrode is in a range of 20 to 200 V.5. The method of claim 4 , wherein an application time of the voltage to the metal base material and the counter electrode is in a range of 5 to 10 minutes.6. The method ...

ONE-STEP GROWTH OF A DENSE, PHOTORESPONSIVE SILICON FILM IN MOLTEN CALCIUM CHLORIDE

Photoactive silicon films may be formed by electrodeposition from a molten salt electrolyte. In an embodiment, SiOis electrochemically reduced in a molten salt bath to deposit silicon on a carbonaceous substrate. 1. A method of depositing silicon on a substrate comprising electrochemically reducing silicon dioxide particles in a molten salt to deposit silicon on a carbonaceous substrate , wherein a current density used to electrochemically reduce the silicon dioxide is between about 2 mA/cmto about 8 mA/cm.2. The method of claim 1 , wherein the silicon is deposited as a film on the carbonaceous substrate.3. The method of claim 1 , wherein the silicon is deposited as nanowires on the carbonaceous substrate.4. The method of claim 1 , wherein the molten salt comprises calcium chloride.5. The method of claim 1 , wherein the molten salt is at a temperature of less than about 1000° C.6. The method of claim 1 , wherein the carbonaceous substrate is a graphite substrate.7. The method of claim 1 , further comprising adding boron and or arsenic or phosphorus to the molten salt to produce a doped silicon film on the metal substrate.8. The method of claim 1 , further comprising adjusting a current density used to electrochemically reduce the silicon dioxide to alter the physical properties of the deposited silicon.9. (canceled)10. A photovoltaic device comprising silicon film claim 1 , wherein the silicon film is produced by the method of .11. The device of claim 10 , wherein the silicon film has a purity of at least 99.9999%.12. The device of claim 10 , wherein the silicon film is disposed on a carbonaceous substrate.13. The method of claim 1 , wherein the silicon is deposited for a time of between about 0.75 hours and about 1.5 hours. The invention generally relates to methods of forming high purity silicon. More specifically, the invention relates to electrochemical formation of silicon from silicon oxide nanoparticles.Silicon has been recognized as one of the most important ...

COMPOSITIONS OF COATED DIAMOND NANOPARTICLES, METHODS OF FORMING COATED DIAMOND NANOPARTICLES, AND METHODS OF FORMING COATINGS

In a composition including a plurality of coated diamond nanoparticles, each diamond nanoparticle may have at least one silane functional group covalently bonded to a surface thereof. A method of forming coated diamond nanoparticles may include functionalizing surfaces of diamond nanoparticles with at least one of a fluorine-containing compound and an oxidant; dispersing the functionalized diamond nanoparticles in a solvent comprising a silane functional group; and forming covalent bonds between the silane functional group and the diamond nanoparticles. A method of forming a diamond coating may include depositing the diamond nanoparticles over a substrate. 1. A composition , comprising:a plurality of coated diamond nanoparticles, each diamond nanoparticle having at least one silane functional group covalently bonded to a surface thereof.2. The composition of claim 1 , wherein the plurality of coated diamond nanoparticles is dispersed in a solvent.3. The composition of claim 2 , wherein the solvent comprises water.4. The composition of claim 2 , wherein the solvent comprises an organic polar solvent.5. The composition of claim 2 , wherein the composition is substantially free of surfactants.6. The composition of claim 1 , wherein the plurality of coated diamond nanoparticles comprises a coating over a substrate.7. The composition of claim 6 , wherein the coating is bonded to an electrically conductive material over the substrate.8. A method of forming coated diamond nanoparticles claim 6 , comprising:functionalizing surfaces of diamond nanoparticles with at least one of a fluorine-containing compound and an oxidant;dispersing the functionalized diamond nanoparticles in a solvent comprising a silane functional group; andforming covalent bonds between the silane functional group and the diamond nanoparticles.9. The method of claim 8 , wherein functionalizing surfaces of diamond nanoparticles comprises exposing the diamond nanoparticles to fluorine gas.10. The method of ...

METHOD FOR VARNISHING PLATED PARTS

A method is provided for plating a non-metal substrate (S), allowing a plated part to be obtained. The method includes steps of: (a) providing a non-metal substrate (S) having a surface (); (b) forming a bonding layer (C) on the surface (); (c) forming at least one reinforcement layer (C) on the bonding layer (C); (d) forming a varnish layer (C) above the reinforcement layer (C); and performing a drying step to dry the varnish layer, wherein the varnish layer is exposed to ultraviolet radiation. 1. A method for the plating of a non-metal substrate allowing a chromium-free plated part to be obtained , wherein:a non-metal substrate is provided having a surface;a bonding layer is formed on said surface;at least one reinforcement layer is formed on the bonding layer;at least one varnish layer is formed above the reinforcement layer;a drying step is also performed to dry the varnish layer at which the varnish layer is exposed to ultraviolet radiation.2. The method according to claim 1 , wherein at least one nickel layer is formed on the reinforcement layer and wherein said at least one varnish layer is formed on the nickel layer.3. The method according to claim 1 , wherein the drying step is conducted at a temperature lower than 60° C.4. The method according to claim 1 , wherein the varnish layer is transparent or coloured.5. The method according to claim 1 , wherein the varnish layer is an electrolytic varnish layer.6. The method according to claim 1 , wherein the non-metal substrate consists of acrylonitrile butadiene styrene.7. The method according to claim 1 , wherein the non-metal substrate consists of a polyamide or polypropylene.8. The method according to claim 1 , wherein the bonding layer is obtained by successively performing chemical attack of the surface claim 1 , activating the chemically attacked surface and depositing a first layer of nickel or copper on the activated surface.9. The method according to claim 1 , wherein the reinforcement layer comprises at ...

CATALYTIC METAL COATINGS FOR METAL COMPONENTS FOR IMPROVED TRIBOLOGICAL PERFORMANCE IN LUBRICATED SYSTEMS

A lubricated system is taught including at least one metal component in motion. The at least one metal component is lubricated by a lubricant including organic oil additives and the at least one metal component is coated with a catalytic material. 1. A lubricated system comprising:at least one metal component in motion and lubricated by a lubricant including organic oil additives, wherein the at least one metal component is coated with a catalytic material.2. The lubricated system of claim 1 , wherein the presence of the catalytic metal improves the tribological performance of the system as compared to an identical system without the catalytic metal coated on the at least one metal component.3. The lubricated system of claim 1 , wherein the at least one metal component is selected from the group consisting of automotive drivetrain systems including engines claim 1 , transmissions claim 1 , axle centers claim 1 , wheel ends claim 1 , power transmission devices in construction claim 1 , mining claim 1 , agricultrue claim 1 , and aerospace applications claim 1 , shafts claim 1 , bearings claim 1 , bushings claim 1 , gears claim 1 , rollers claim 1 , rolling bearings claim 1 , plain bearings claim 1 , gears claim 1 , pistons claim 1 , piston rings claim 1 , tappets claim 1 , and seals and wherein the at least one metal component is made of metals or metal alloys selected from steel claim 1 , aluminum claim 1 , magnesium alloy claim 1 , titanium alloy claim 1 , and metal matrix composites.4. The lubricated system of claim 3 , wherein the at least one metal component is made of AISI 52100 steel.5. The lubricated system of claim 1 , wherein the lubricant is selected from the group consisting of petroleum-based oils claim 1 , semi-synthetic oils claim 1 , synthetic oils claim 1 , greases with mineral or synthetic oil claim 1 , di-ester oils claim 1 , and silicone oils; wherein the organic oil additives are selected from the group consisting of extreme pressure additives ...

SENSOR ELEMENT FOR DETECTING HCl GAS, SENSOR DEVICE HAVING THE SENSOR ELEMENT, AND METHOD OF MANUFACTURING THE SENSOR ELEMENT

The present invention relates to a sensor element for detecting hydrogen chloride (HCl) gas, a sensor device having the sensor element, and a method of manufacturing the sensor element, wherein s the sensor element includes: an ionic layer including a Ag ion obtained through ionization; an ion conductive layer, in which the Ag ion is conducted, the ion conductive layer being formed on the ionic layer; and a reactive layer, in which the Ag ion conducted from the ion conductive layer and HCl gas react with each other, the reactive layer being formed on the ion conductive layer. The sensor element detects HCl gas generated from insulting materials when fire occurs, thereby detecting an electrical fire and preventing gas and fire spreading.

SHIELDED CABLES

The present invention relates to a cable, suitable for both electrical and data transmission, comprising at least one shield layer, comprising a metal layer directly adhering onto the polymeric layer. 1. A cable (C) comprising at least one cable core and at least one shield layer (S) surrounding said cable core , [{'sub': 'P', 'is made from a composition (C) comprising at least one melt-processable polymer (P) and'}, {'sub': i', 'o', 'o', 'M, 'has an inner surface (S) and an outer surface (S) with respect to the position of the cable core, said surface (S) comprising at least one layer (L) comprising at least one metal compound (M).'}], 'characterized in that said at least one shield layer (S)'}2. The cable according to claim 1 , wherein said compound (M) comprises at least one metal selected from the group consisting of: Rh claim 1 , Ir claim 1 , Ru claim 1 , Ti claim 1 , Re claim 1 , Os claim 1 , Cd claim 1 , Tl claim 1 , Pb claim 1 , Bi claim 1 , In claim 1 , Sb claim 1 , Al claim 1 , Ti claim 1 , Cu claim 1 , Ni claim 1 , Pd claim 1 , V claim 1 , Fe claim 1 , Cr claim 1 , Mn claim 1 , Co claim 1 , Zn claim 1 , Mo claim 1 , W claim 1 , Ag claim 1 , Au claim 1 , Pt claim 1 , Ir claim 1 , Ru claim 1 , Pd claim 1 , Sn claim 1 , Ge claim 1 , Ga and alloys thereof.3. The cable according to claim 1 , wherein said surface (S) further comprises at least one nitrogen-containing group.4. The cable according to claim 1 , wherein said polymer (P) is selected from the group comprising: polyolefins; polyamides; and (per)fluorinated polymers.5. The cable according to claim 4 , wherein said polymer (P) is a semi-crystalline perfluoro-polymer [polymer (P)] claim 4 , said polymer (P) being a copolymer comprising recurring units derived from TFE and recurring units derived from at least one perfluorinated monomer different from TFE [co-monomer (F)].6. The cable according to claim 4 , wherein said polymer (P) is a (per)fluoroelastomer [polymer (P)] comprising recurring units derived ...

SYSTEM AND METHOD FOR MANUFACTURING A FABRICATED CARRIER

A method and apparatus for fabricating a carrier having a top surface and a bottom surface, the method comprising combining a conductive portion at the top surface and a dielectric at the bottom surface, wherein the dielectric includes contact island cavities, filling one or more of the contact island cavities with solder metal to form solder islands, selectively metal plating the conductive portion, selectively etching a portion of the conductive portion, and applying solder resist to the selectively plated and etched top surface of said conductive portion. 1. A method of fabricating a carrier having a top surface and a bottom surface , the method comprising:combining a conductive portion at the top surface and a dielectric at the bottom surface, said dielectric including contact island cavities;filling one or more of the contact island cavities with solder metal to form solder islands;selectively metal plating the conductive portion;selectively etching a portion of said conductive portion; andapplying solder resist to the selectively plated and etched top surface of said conductive portion.2. The method of claim 1 , further including metalizing at least a portion of a surface of the dielectric portion that includes the contact island cavities prior to filling the contact island cavities with solder metal.3. The method of claim 2 , wherein said metalizing comprises one of either sputtering a metal seed layer onto the dielectric portion or immersing the dielectric portion in a molten metal.4. The method of claim 3 , wherein said metal seed layer comprises one of chromium or titanium.5. The method of claim 2 , wherein said molten metal comprises copper.6. The method of claim 2 , further comprising electrolytic plating the metalized portion of the surface of the dielectric portion to a predetermined thickness.7. The method of claim 1 , wherein the solder metal comprises one of either SnAg claim 1 , SnAgCu or SnCu.8. The method of claim 1 , wherein filling one or more ...

SEMICONDUCTOR REACTOR AND METHOD FOR FORMING COATING LAYER ON METAL BASE MATERIAL FOR SEMICONDUCTOR REACTOR

A method for forming a coating layer on a metal base material for a semiconductor reactor according to an aspect of the present invention comprises the steps of: immersing a metal base material for a semiconductor reactor in an aqueous alkaline electrolyte solution containing NaOH and NaAlO; and connecting an electrode to the metal base material and supplying power to the electrode to form a coating layer on the metal base material through a plasma electrolytic oxidation (PEO) method. 1. A method for forming a coating layer on a metal base material for a semiconductor reactor , the method comprising:{'sub': '2', 'a step of immersing a metal base material for a semiconductor reactor in an aqueous alkaline electrolyte solution containing NaOH and NaAlO; and'}a step of forming a coating layer on the metal base material by a plasma electrolytic oxidation (PEO) method, by connecting an electrode to the metal base material and supplying power to the electrode.2. The method for forming a coating layer on a metal base material for a semiconductor reactor according to claim 1 , wherein the metal base material comprises an aluminum alloy claim 1 ,the electrolyte further comprises an yttrium salt, andthe coating layer comprises an aluminum oxide layer therein, and comprises a composite oxide layer of an aluminum oxide and an yttrium oxide at a surface thereof.3. The method for forming a coating layer on a metal base material for a semiconductor reactor according to claim 2 , wherein the composite oxide layer further comprises an aluminum-yttrium oxide.4. The method for forming a coating layer on a metal base material for a semiconductor reactor according to claim 2 , wherein the electrolyte comprises Y(NO)as the yttrium salt.5. The method for forming a coating layer on a metal base material for a semiconductor reactor according to claim 1 , wherein in the step of forming the coating layer claim 1 , a bipolar pulse current claim 1 , which has longer application time of a ...

COLORED, CORROSION-RESISTANT ALUMINUM ALLOY SUBSTRATES AND METHODS FOR PRODUCING SAME

A silicon polymer treatment with included pigments for anodized aluminum objects such as wheels. Titanium dioxide may be dispersed in polysiloxane or polysilazane to form a white polymer treatment on the object. Other beneficial components, such as corrosion inhibitors may be included in the polymer matrix. 1. A treatment for anodized aluminum alloy object having a porous oxide layer formed on a base layer of the aluminum alloy , comprising:a liquid including a silicon monomer, the liquid having a viscosity permitting infiltration into the porous oxide layer when applied thereto and capable of reacting with the oxide layer to chemically bond with molecules of the oxide layer, the monomer capable of polymerizing within the porous oxide layer yielding a polymer interlocked with the oxide layer;a pigment dispersed within the liquid, the pigment capable of being bound within the polymer and imparting a color to the object.2. The treatment of claim 1 , wherein the polymer is a polysiloxane.3. The treatment of claim 1 , wherein the polymer is a polysilazane.4. The treatment of claim 1 , wherein the pigment is titanium dioxide.5. The treatment of claim 1 , wherein a portion of the pigment particles enter the porous oxide layer prior to polymerization.6. The treatment of claim 1 , wherein a portion of the pigment particles bound within the polymer are too large to enter the pores of the oxide layer.7. The treatment of claim 1 , wherein the pigment includes particles that are small enough to enter the porous oxide layer and particles that are too large to enter the pores of the oxide layer.8. The treatment of wherein the silicon monomer is dispersed in butanol.9. The treatment of further comprising a corrosion inhibitor that is dispersed in the liquid and which is fixed in the polymer after polymerization.10. A method for treating an anodized aluminum object having a porous oxide layer thereof claim 1 , comprising the steps of:(A) obtaining a liquid containing a silicon ...

Copper Foil, Copper-Clad Laminate Board, Method for Producing Printed Wiring Board, Method for Producing Electronic Apparatus, Method for Producing Transmission Channel, and Method for Producing Antenna

To provide a copper foil and a copper-clad laminate board that have a favorably suppressed transmission loss even in the use thereof in a high frequency circuit board that is folded in use or bent in use. A copper foil having a number of times of folding of 1 or more in a folding test under a prescribed condition for a copper-clad laminate board containing the copper foil having adhered thereto an insulating substrate. 1. A copper foil having a number of times of folding of 1 or more in a folding test under a prescribed condition for a copper-clad laminate board containing the copper foil having an insulating substrate adhered to the copper foil.2. The copper foil according to claim 1 , wherein the copper foil satisfies at least one of the following conditions (2-1) to (2-2):(2-1) the copper foil has a number of cracks having a depth of 1 μm or more from a surface of the copper foil being 3 or less after a sliding bending test in a prescribed number of times under a prescribed condition for a copper-clad laminate board containing the copper foil having an insulating substrate adhered to the copper foil, in an observation of a region having a size of a thickness of the copper foil×100 μm on a cross section of the copper foil in parallel to a sliding direction in the sliding bending test;(2-2) the copper foil has a number of cracks having a depth of 2 μm or more from a surface of the copper foil being 2 or less after a sliding bending test in a prescribed number of times under a prescribed condition for a copper-clad laminate board containing the copper foil having an insulating substrate adhered to the copper foil, in an observation of a region having a size of a thickness of the copper foil×100 μm on a cross section of the copper foil in parallel to a sliding direction in the sliding bending test.3. A copper foil satisfying at least one of the following conditions (3-1) to (3-2):(3-1) the copper foil has a number of cracks having a depth of 1 μm or more from a ...

ANODIZED FILMS WITH BRANCHED PORE STRUCTURES

The embodiments described herein relate to anodizing and anodized films. The methods described can be used to form opaque and white anodized films on a substrate. In some embodiments, the methods involve forming anodized films having branched pore structures. The branched pore structure provides a light scattering medium for incident visible light, imparting an opaque and white appearance to the anodized film. In some embodiments, the methods involve infusing metal complex ions within pores of an anodized. Once within the pores, the metal complex ions undergo a chemical change forming metal oxide particles. The metal oxide particles provide a light scattering medium for incident visible light, imparting an opaque and white appearance to the anodized film. In some embodiments, aspects of the methods for creating irregular or branched pores and methods for infusing metal complex ions within pores are combined. 1. A protective film on a metal part , the protective film comprising:a barrier layer having an exterior surface corresponding to an exterior surface of the metal part, the barrier layer having branched structures positioned only within the barrier layer and having substantially no anodic pores, wherein the branched structures are arranged in a branching pattern that diffusely reflects visible wavelengths of light incident on the exterior surface and imparting a white appearance to the barrier layer; anda porous anodic layer positioned adjacent the metal part and providing structural support for the barrier layer.2. The protective film of claim 1 , wherein the porous anodic layer comprises pores arranged in parallel with top ends adjacent to the plurality of branched structures and bottom ends adjacent to an underlying metal surface of the metal part.3. The protective film of claim 1 , wherein the barrier layer has indented portions on the exterior surface of the barrier layer.4. The protective film of claim 1 , wherein the branched structures are formed through ...

IN-BODY POWER SOURCE HAVING HIGH SURFACE AREA ELECTRODE

Power sources that enable in-body devices, such as implantable and ingestible devices, are provided. Aspects of the in-body power sources of the invention include a solid support, a first high surface area electrode and a second electrode. Embodiments of the in-power sources are configured to emit a detectable signal upon contact with a target physiological site. Also provided are methods of making and using the power sources of the invention. 125-. (canceled)26. A device comprising:a solid support comprising a surface and a circuitry element;a first electrode comprising a first active electrode material that is present on the surface of the solid support and coupled to the circuitry element;a second electrode present on the surface of the solid support and coupled to the circuitry element, wherein the second electrode is electrically isolated from the first electrode and comprises a second active electrode material that is different from the first active electrode material;a porous under-layer located under at least one of the first electrode and the second electrode, wherein the porous under-layer is configured to provide a surface area enhancement to at least one of the first electrode and the second electrode.27. The device according to claim 26 , wherein the device is dimensioned to be ingestible.28. The device according to claim 27 , wherein the porous under-layer comprises a conductive material.29. The device according to claim 28 , wherein the porous under-layer comprises an element selected from the group consisting of: Au claim 28 , Cu claim 28 , Pt claim 28 , Ir claim 28 , Pd claim 28 , Rh and Ru and alloys thereof.30. The device according to claim 28 , wherein the porous under-layer comprises an element selected from the group consisting of: Ti and Wand alloys thereof.31. The device according to claim 28 , wherein the porous under-layer has a thickness ranging from 0.1 to 100 μm.32. The device according to claim 26 , wherein the first electrode is ...

ANTICORROSIVE AND CONDUCTIVE MATERIAL

An anticorrosive and conductive substrate includes a bulk portion and a surface portion including a magnesium titanium material having a formula (I) TiMgO(I), where x is a number from 0 to ≤1 and y is a number from 1 to ≤2, and wherein at least about 50% of the magnesium titanium material has a cubic crystal structure, and wherein the magnesium titanium material is configured to impart anticorrosive and conductive properties to the substrate. 1. An anticorrosive and conductive substrate comprising:a bulk portion; and {'br': None, 'sub': x', '1-x', 'y, 'TiMgO\u2003\u2003(I),'}, 'a surface portion including a magnesium titanium material having formula (I)'}where x is a number from 0 to ≤1 and y is a number from 1 to ≤2, andwherein at least about 50% of the magnesium titanium material includes MgO and TiO having cubic crystal structures, and wherein the magnesium titanium material is configured to impart anticorrosive and conductive properties to the substrate.2. The substrate of claim 1 , wherein the magnesium titanium material includes less than about 10 atomic % Ti.3. The substrate of claim 1 , wherein the magnesium titanium material includes more than about 10 atomic % Ti such that the material further includes MgO and TiO nanodomains.4. The substrate of claim 3 , wherein the TiO nanodomains are electrically conductive.5. The substrate of claim 1 , wherein electrical conductivity of the material is greater than about 100 S cm.6. The substrate of claim 1 , wherein an interfacial contact resistance between the substrate and the coating is less than about 0.1 Ohm cm.7. The substrate of claim 1 , wherein the bulk portion is steel.8. The substrate of claim 1 , wherein the bulk portion is glass and the material is configured to form a transparent film on the surface portion.9. A bipolar plate for a proton-exchange-membrane fuel cell (PEMFC) comprising: {'br': None, 'sub': x', '1-x', 'y, 'MAO\u2003\u2003(II),'}, 'a metal substrate having a bulk portion and a surface ...

ELECTROCHEMICAL pH MEASUREMENT

An electrode for the determination of pH is made by depositing a phenolic compound on a conductive substrate, where the phenolic compound has a phenolic hydroxy group attached to a carbon atom on an aromatic ring and also has an oxygen atom connected through one other atom to an adjacent carbon atom of the aromatic ring such that this oxygen atom can form a hydrogen bond to the phenolic hydroxy group; and then electrochemically oxidising the immobilized phenolic compound in a one electron one proton oxidation so as to form a polymeric, water-insoluble, redox-active deposit on the conductive substrate. The electrode is useful for electrochemical determination of pH and is capable of measuring pH of an unbuffered aqueous liquid. 1. A method of measuring the pH of an aqueous liquid wherein the concentration of buffer is not greater than 0.01 molar , comprising: 'where the phenolic compound has a phenolic hydroxy group attached to a carbon atom on an aromatic ring and also has an oxygen atom connected through one other atom to an adjacent carbon atom of the aromatic ring, such that said oxygen atom can form a hydrogen bond to the phenolic hydroxy group;', 'preparing a sensor electrode by applying a phenolic compound to a conductive substrate,'}electrochemically oxidising the phenolic compound in a one electron one proton oxidation so as to form a polymeric, water-insoluble, redox-active deposit on the conductive substrate; andexposing the aqueous liquid to the sensor electrode and observing the redox reaction of the deposit on the sensor electrode.2. A method according to claim 1 , wherein the oxygen atom is part of a carbonyl claim 1 , sulfonyl or nitro group attached to the said adjacent carbon atom of the ring.3. A method according to claim 1 , wherein the oxygen atom is part of a ketone claim 1 , aldehyde or ester group attached to the said adjacent carbon atom of the ring.4. A method according to claim 1 , wherein the phenolic compound is free of ionized or ...

Method and Chemistry for Selenium Electrodeposition

Techniques for electrodepositing selenium (Se)-containing films are provided. In one aspect, a method of preparing a Se electroplating solution is provided. The method includes the following steps. The solution is formed from a mixture of selenium oxide; an acid selected from the group consisting of alkane sulfonic acid, alkene sulfonic acid, aryl sulfonic acid, heterocyclic sulfonic acid, aromatic sulfonic acid and perchloric acid; and a solvent. A pH of the solution is then adjusted to from about 2.0 to about 3.0. The pH of the solution can be adjusted to from about 2.0 to about 3.0 by adding a base (e.g., sodium hydroxide) to the solution. A Se electroplating solution, an electroplating method and a method for fabricating a photovoltaic device are also provided. 1. An electroplating method , comprising the steps of: forming the solution from a mixture comprising selenium oxide, an acid selected from the group consisting of alkane sulfonic acid, alkene sulfonic acid, aryl sulfonic acid, heterocyclic sulfonic acid, aromatic sulfonic acid and perchloric acid and a solvent;', 'adjusting a pH of the solution to from about 2.0 to about 3.0., 'preparing a selenium electroplating solution by the steps ofproviding a substrate; andelectroplating a selenium-containing film on the substrate using the solution as a plating bath.2. The method of claim 1 , further comprising the step of:annealing the film at a temperature of from about 100° C. to about 300° C. for a duration of from about 30 minutes to about 60 minutes.3. The method of claim 1 , wherein the solution is free of metals claim 1 , and the selenium oxide is an only plating element present in the solution such that the solution is configured to plate an elemental selenium film wherein selenium in the film is present in a non-alloy form.4. The method of claim 1 , wherein the step of adjusting the pH of the solution comprises the step of:adding a base to the solution, after the forming step has been performed, to ...

METHOD FOR FORMING A BORON-CONTAINING THIN FILM AND MULTILAYER STRUCTURE

To provide a method for forming a boron-containing thin film, by which a uniform boron thin film with good adhesion can be formed on the surface of a processing object, and also to provide a multilayer structure. An electrolysis apparatus includes an anode , a processing object serving as a cathode, an electrolytic vessel , and a molten salt electrolytic bath . A variable power supply is connected between the anode and the processing object . The variable power supply is configured to be capable of changing a voltage or current waveform during the electrolysis process. Current of an appropriate pulse waveform is applied in the molten salt for electrolysis to form a uniform boron thin film within the processing object having a complicated shape.

SYSTEM AND METHOD FOR MANUFACTURING A FABRICATED CARRIER

A method and apparatus for fabricating a carrier having a top surface and a bottom surface, the method comprising combining a conductive portion at the top surface and a dielectric at the bottom surface, wherein the dielectric includes contact island cavities, filling one or more of the contact island cavities with solder metal to form solder islands, selectively metal plating the conductive portion, selectively etching a portion of the conductive portion, and applying solder resist to the selectively plated and etched top surface of said conductive portion. 1. A method of fabricating a carrier having a top surface and a bottom surface , the method comprising:combining a conductive portion at the top surface and a dielectric at the bottom surface, said dielectric including contact island cavities;filling one or more of the contact island cavities with solder metal to form solder islands;selectively metal plating the conductive portion;selectively etching a portion of said conductive portion; andapplying solder resist to the selectively plated and etched top surface of said conductive portion.2. The method of claim 1 , further including metalizing at least a portion of a surface of the dielectric portion that includes the contact island cavities prior to filling the contact island cavities with solder metal.3. The method of claim 2 , wherein said metalizing comprises one of either sputtering a metal seed layer onto the dielectric portion or immersing the dielectric portion in a molten metal.4. The method of claim 3 , wherein said metal seed layer comprises one of chromium or titanium.5. The method of claim 2 , wherein said molten metal comprises copper.6. The method of claim 2 , further comprising electrolytic plating the metalized portion of the surface of the dielectric portion to a predetermined thickness.7. The method of claim 1 , wherein the solder metal comprises one of either SnAg claim 1 , SnAgCu or SnCu.8. The method of claim 1 , wherein filling one or more ...

LITHIUM-ION BATTERY

A lithium-ion battery having an anode including an array of nanowires electrochemically coated with a polymer electrolyte, and surrounded by a cathode matrix, forming thereby interpenetrating electrodes, wherein the diffusion length of the Li ions is significantly decreased, leading to faster charging/discharging, greater reversibility, and longer battery lifetime, is described. The battery design is applicable to a variety of battery materials. Methods for directly electrodepositing CuSb from aqueous solutions at room temperature using citric acid as a complexing agent to form an array of nanowires for the anode, are also described. Conformal coating of poly-[Zn(4-vinyl-4′ methyl-2,2′-bipyridine)](PF)by electroreductive polymerization onto films and high-aspect ratio nanowire arrays for a solid-state electrolyte is also described, as is reductive electropolymerization of a variety of vinyl monomers, such as those containing the acrylate functional group. Such materials display limited electronic conductivity but significant lithium ion conductivity. Cathode materials may include oxides, such as lithium cobalt oxide, lithium magnesium oxide, or lithium tin oxide, as examples, or phosphates, such as LiFePO, as an example. 140-. (canceled)41. A method for electrodepositing copper antimonide onto an electrically conducting substrate , comprising:{'sup': +2', '+3', '+3, 'preparing a solution having a chosen molar concentration of Cuand a chosen molar concentration of Sbin an aqueous solution of having sufficient citric acid present such that precipitation of the Sbdoes not occur;'}{'sup': 2−', '3−', '+3', '+2, 'increasing the pH of the solution such that a mixture of HCit and Cit species is formed from the citric acid, and the difference between the reduction potential of the Sbto Sb and the reduction potential of Cuto Cu is minimized;'}applying a chosen negative potential to the electrically conducting substrate;{'sub': '2', 'whereby CuSb is electrodeposited onto the ...

Method For Producing A Coated Surface Of A Tribological System

A method is proposed for producing a cylinder working surface of an internal combustion engine that is optimized in terms of friction and wear. 1. A method for producing a wear-resistant surface on or within a workpiece that is made of aluminum or an aluminum alloy , the method comprising the steps of:premachining and thereby activating a surface of the workpiece by honing or precision boring the workpiece, and then applying a wear-resistant coating onto the activated surface of the workpiece by means of electrolysis.2. The method according to claim 1 , wherein the wear-resistant coating is applied by means of plasma electrolytic deposition (PED) or plasma electrolytic oxidation (PEO).3. The method according to claim 1 , wherein after the wear-resistant coating has been applied claim 1 , the surface of the wear-resistant coating is smoothed claim 1 , and wherein a porosity of the wear-resistant coating surface is retained after the wear-resistant coating surface has been smoothed.4. The method according to claim 3 , wherein the surface of the wear-resistant coating is smoothed by honing the surface.5. The method according to claim 4 , wherein during the honing of the surface of the wear-resistant coating a layer of less than 5 μm of thickness of the surface is removed during the honing process.6. The method according to claim 1 , wherein the activated surface of the workpiece is subjected to an alkaline degreasing step prior to application of the wear-resistant coating onto the activated surface.7. The method according to claim 1 , wherein a cylindrical surface is produced in the workpiece during the premachining step.8. The method according to claim 1 , wherein the workpiece is made of a hypoeutectic aluminum alloy.9. The method according to claim 1 , wherein the premachining of the workpiece is used to produce a cylinder bore of an internal combustion engine in the workpiece and wherein the cylinder bore is coated with the wear-resistant coating.10. The method ...

SURFACE TREATMENT AGENT COMPOSITION FOR TIN-PLATED STEEL, AND TIN-PLATED STEEL SUBJECTED TO SURFACE TREATMENT

A surface treatment agent composition which contains aluminum as the coating film formation component and exhibits excellent properties for removing tin ions within a treatment bath when subjecting a tin-plated steel to electrolytic surface treatment, thereby forming a coating film exhibiting excellent corrosion resistance and yellowing resistance. This surface treatment agent composition is used for subjecting a tin-plated steel or a tin-based alloy-plated steel to electrolytic surface treatment and contains aluminum ions, fluorine ions, and polycarboxylic acid. The tin ions that eluted from the tin-plated steel are precipitated within and removed from the treatment bath by using this surface treatment agent composition. 1. A surface treatment agent composition for tin-plated steel to be used for electrolytic surface treatment of a tin- or tin-based alloy-plated steel , comprising aluminum ions , fluorine ions and a polycarboxylic acid.2. The surface treatment agent composition for tin-plated steel according to claim 1 , wherein the polycarboxylic acid is a homopolymer containing a monomer selected from tlgroup consisting of acrylic acid claim 1 , methacrylic acid claim 1 , maleic acid claim 1 , and itaconic acid as a constitutional unit or a copolymer containing at least one of these monomers as the constitutional unit.3. The surface treatment agent composition for tin-plated steel according to claim 1 , wherein a ratio [C group]/[Al] of a molar concentration [C group] of carboxyl groups contained in the polycarboxylic acid to a molar concentration [Al] of the aluminum ions is 0.005 to 2.0.4. The surface treatment agent composition for tin-plated steel according to claim 1 , wherein a ratio [F]/[Al] of a molar concentration [F] of the fluorine ions to a molar concentration [Al] of the aluminum ions is 1 to 4.5. The surface treatment agent composition for tin-plated steel according to claim 1 , wherein a mass concentration of the aluminum ions is 100 to 10 claim 1 ...

MARKED LAYER STRUCTURE, PROCESS FOR PRODUCING IT AND USE THEREOF

The present invention relates to a process for producing a marked layer structure comprising: a) providing a product surface or a substrate with an appropriate surface; providing a support; b) contacting the support with a mixture comprising inert particles, in which particles a marking agent is substantially inseparably enclosed; c) electrochemically or chemically coating the support, the inert particles being incorporated into the layer produced by the coating; and also a layer structure obtained in this way and its use for quality control and/or as a wear indicator and/or as a marker. 1. A process for producing a marked layer structure comprising:a) providing a support;b) contacting the support with a mixture comprising inert particles, in which particles a marking agent is substantially inseparably enclosed;c) electrochemically or chemically coating the support, the inert particles being incorporated into the layer produced by the coating;2. The process as claimed in claim 1 , wherein the mixture is a liquid mixture.3. The process as claimed in claim 1 , wherein the particles have a diameter in a range from 0.05-1 claim 1 ,000 μm.4. The process as claimed in claim 1 , wherein the inert material has a transparency of greater than 90% in the wavelength range of 300-1.000 nm.5. The process as claimed in claim 1 , wherein the inert material is glass or ceramic material or both glass and ceramic material.6. The process as claimed in claim 1 , wherein the marking agent is a fluorescent material.7. The process as claimed in claim 1 , wherein the inert particles are distributed in the mixture substantially homogeneously.8. A marked layer structure obtained by the process as claimed in .9. A process for one or more of quality control claim 8 , as a wear indicator claim 8 , or a marker to show that an item is an original claim 8 , comprising providing the marked layer structure as claimed in .10. The process as claimed in claim 3 , wherein the inert material is glass or ...

MASKING METHOD FOR PRODUCING A COMBINATION OF BLADE TIP HARDFACING AND EROSION-PROTECTION COATING

A method for manufacturing a blade () for a turbomachine, the blade having a hardfacing on its tip () and an erosion-protection coating () at least on its airfoil () is provided. Initially, a blade tip hardfacing is applied to the blade tip and, subsequently, a mask () is positioned in the region of the blade tip hardfacing, the mask covering the blade tip hardfacing, and, subsequently, the erosion-protection coating is deposited. The mask is removed after the erosion-protection coating is completed. A blade for a turbomachine, the blade having a hardfacing on its tip () and an erosion-protection coating () at least on its airfoil () is also provided. The erosion-protection coating at least partially covers the blade tip hardfacing, and the thickness of the erosion-protection coating decreases continuously in and/or toward the region of the blade tip hardfacing. 1. A method for manufacturing a blade for a turbomachine , the blade having a tip and an airfoil , the blade having hardfacing on the tip and an erosion-protection coating at least on the airfoil , the method comprising;applying initially a blade tip hardfacing to the blade tip; andpositioning subsequently a mask in the region of the blade tip hardfacing, the mask covering the blade tip hardfacing;depositing subsequently the erosion-protection coating; andremoving the mask after the erosion-protection coating is deposited.2. The method as recited in wherein the mask is positioned at a distance from the blade tip hardfacing.3. The method as recited in wherein the mask is configured to replicate a shape of the blade tip hardfacing.4. The method as recited in wherein the mask is a three-dimensional replica of the surface shape of the blade tip hardfacing or a two-dimensional projection of the surface shape of the blade tip hardfacing.5. The method as recited in wherein the mask is supported in the region of a leading edge or a trailing edge of the blade.6. The method as recited in wherein the mask is ...

METHODS OF FABRICATING SELF-ALIGNED METAL LAYER STRUCTURE AND OPTIC

A method of fabricating a self-aligned metal layer structure is disclosed. The method includes: providing a substrate including a conductive layer; forming a pattern in the conductive layer; and electroplating the conductive layer to form thereon an electroplated metal layer such that the pattern is directly transferred in the electroplated metal layer in a self-aligned manner. Methods of fabricating optics are also disclosed. The methods are capable of high accuracy in alignment, and the optics can be used in the production of a lens module. 1. A method of fabricating a self-aligned metal layer structure , the method comprising the following steps in the sequence set forth:providing a substrate comprising a conductive layer;forming a pattern in the conductive layer; andelectroplating the conductive layer to form thereon an electroplated metal layer such that the pattern is transferred in the electroplated metal layer.2. The method of claim 1 , wherein the pattern is formed in the conductive layer by an etching process.3. The method of claim 1 , wherein the conductive layer is formed of a non-metallic material.4. The method of claim 1 , wherein the conductive layer is electroplated with chromium claim 1 , copper claim 1 , tungsten claim 1 , aluminum claim 1 , silver claim 1 , chromium sesquioxide claim 1 , thallium nitride claim 1 , or silver oxide to form the electroplated metal layer.5. A method of fabricating an optic claim 1 , comprising the following steps in the sequence set forth:providing a glass substrate having a first side and a second side opposing the first side;forming a first light-shielding layer over the first side of the glass substrate, the first light-shielding layer defining a first pattern;forming one transparent conductive layer over the second side of the glass substrate;forming a second pattern in the one transparent conductive layer such that the second pattern is aligned with the first pattern; andforming a second light-shielding layer ...

MASKING METHOD FOR PRODUCING A COMBINATION OF BLADE TIP HARDFACING AND EROSION-PROTECTION COATING

A method for manufacturing a blade () for a turbomachine, the blade having a hardfacing on its tip () and an erosion-protection coating () at least on its airfoil () is provided. Initially, a blade tip hardfacing is applied to the blade tip and, subsequently, a mask () is positioned in the region of the blade tip hardfacing, the mask covering the blade tip hardfacing, and, subsequently, the erosion-protection coating is deposited. The mask is removed after the erosion-protection coating is completed. A blade for a turbomachine, the blade having a hardfacing on its tip () and an erosion-protection coating () at least on its airfoil () is also provided. The erosion-protection coating at least partially covers the blade tip hardfacing, and the thickness of the erosion-protection coating decreases continuously in and/or toward the region of the blade tip hardfacing. 1. A method for manufacturing a blade for a turbomachine , the blade having a tip and an airfoil , the blade having hardfacing on the tip and an erosion-protection coating at least on the airfoil , the method comprising;applying initially a blade tip hardfacing to the blade tip; andpositioning subsequently a mask in the region of the blade tip hardfacing, the mask covering the blade tip hardfacing;depositing subsequently the erosion-protection coating; andremoving the mask after the erosion-protection coating is deposited.2. The method as recited in wherein the mask is positioned at a distance from the blade tip hardfacing.3. The method as recited in wherein the mask is configured to replicate a shape of the blade tip hardfacing.4. The method as recited in wherein the mask is a three-dimensional replica of the surface shape of the blade tip hardfacing or a two-dimensional projection of the surface shape of the blade tip hardfacing.5. The method as recited in wherein the mask is supported in the region of a leading edge or a trailing edge of the blade.6. The method as recited in wherein the mask is ...

PHOTO-ELECTROCHEMICAL CELL, MANUFACTURING METHOD OF PHOTO-ELECTROCHEMICAL CELL, AND PHOTO-ELECTROCHEMICAL REACTION DEVICE

A photo-electrochemical cell of an embodiment includes: a first electrode which has a transparent conductive film provided on a first surface of a photoelectric conversion layer; a first catalyst layer provided on the first electrode; a second electrode provided on a second surface of the photoelectric conversion layer; and a second catalyst layer provided on the second electrode. The first catalyst layer has a plurality of catalyst parts disposed on the first electrode and a transparent dielectric part disposed in a gap between the plurality of catalyst parts. 1. A photo-electrochemical cell comprising:a photoelectric conversion layer having a first surface and a second surface;a first electrode provided on the first surface of the photoelectric conversion layer;a first catalyst layer including a plurality of catalyst parts disposed on the first electrode and a transparent dielectric part disposed in a gap between the plurality of catalyst parts;a second electrode provided on the second surface of the photoelectric conversion layer; anda second catalyst layer electrically connected to the second electrode.2. The photo-electrochemical cell according to claim 1 ,wherein the first catalyst layer further comprises a conductive part disposed on the first electrode, and the catalyst part is provided on the conductive part.3. The photo-electrochemical cell according to claim 2 ,wherein the conductive part has a tapered shape, and the catalyst parts are provided along a surface of the tapered-shaped conductive part.4. The photo-electrochemical cell according to claim 2 ,wherein the conductive part includes at least one selected from the group consisting of a metal, an alloy including the metal, and a conductive compound containing the metal,wherein the catalyst part is provided on the conductive part, andwherein the transparent dielectric part includes an insulating compound containing the metal.5. The photo-electrochemical cell according to claim 4 ,wherein the conductive ...

BATTERY TYPE SUPER CAPACITOR ELECTRODE MATERIAL HAVING HIGH POWER DENSITY AND HIGH ENERGY DENSITY AND METHOD FOR PREPARING THE SAME

A new battery type super capacitor electrode material having high power density and high energy density is provided. The electrode material is made from multi-layer of BiS/CNT films and rGO films, wherein the layer number of BiS/CNT films is same as the layer number of rGO films, and the BiS/CNT films and rGO films are alternately stacked on top of each other. Further, a method of preparing an electrode material is provided. The methods includes coating BiS/CNT and drying; depositing graphene oxide onto BiS/CNT via electrochemical deposition; and, reducing graphene oxide to rGO by cyclic voltammetry to obtain a product. The capacitor electrode material has high energy density (460 Wh/kg), high power density (22802 W/kg) and specific capacitance (specific capacitance of 3568 F/g when current density is 22 A/g), and excellent cycling stability (remaining 90% of initial capacity after 1000 cycles). 1. A cell-type super capacitor electrode material having high power density and high energy density , wherein: the electrode material is made from BiS/CNT films and rGO films.2. A cell-type super capacitor electrode material according to claim 1 , wherein: the electrode material is made of a plurality of layers of BiS/CNT films and a plurality of layers of rGO films claim 1 , in which the layer number of BiS/CNT films is same as the layer number of rGO films claim 1 , and the BiS/CNT films and the rGO films alternately stack on top of each other.3. A cell-type super capacitor electrode material according to claim 2 , wherein: the BiS/CNT films and rGO films have 2-10 layers.4. A cell-type super capacitor electrode material according to claim 2 , wherein: each BiS/CNT film has a layer thickness of 50-200 nm claim 2 , and each rGO film has a layer thickness of 50-200 nm.5. A method for preparing a cell-type super capacitor electrode material of claim 1 , wherein: the method comprises the following steps:{'sub': 2', '3, '1) coating BiS/CNT and drying;'}{'sub': 2', '3, '2) ...

Wire cutting tool and method of fabricating the same

PURPOSE: A wire cutting tool and a manufacturing method thereof are provided to improve lifetime of the tool and work stability by preventing a grinding particle adhered to a base materiel from being separated. CONSTITUTION: A manufacturing method of a wire cutting tool comprises: a step of preparing composite plating solution, a step of dipping a base material(100), a step of arranging a grinding particle(110), and a step of forming a deposition layer(120). The deposition layer adheres a plurality of grinding particles on the surface of the base material in a wire shape using a composite electroplating method and comprises a composite of a plating material(121) and a carbon nanotube(122) on the surface in a wire shape. The composite plating solution contains boric acid and maintains 3.2-3.7 pH. The specific gravity of the composite plating solution is 35-40 and maintains the temperature at 50-70 deg. C. The electric current density applied from the composite electroplating method is 10-150Dk.

Catalytically active thermal barrier ceramic coating on surface of chamber of internal combustion engine

FIELD: engines. SUBSTANCE: invention relates to a wear-resistant catalytically active thermal barrier ceramic coating of parts of internal combustion engine chambers, deposited by micro-arc oxidation. Said coating is double-layer with thickness of 15-150 mcm. First coating layer has thickness 5-100 mcm with aluminium content of not less than 90 mol%. Second porous layer with thickness of 10-100 mcm consists of aluminium oxide and cerium oxide with content of 1 to 50 mol%. EFFECT: higher reliability and efficiency of chamber of internal combustion engine, higher efficiency of internal combustion engine, reduced emissions of carbon monoxide, carbon dioxide and hydrocarbons into environment. 1 cl РОССИЙСКАЯ ФЕДЕРАЦИЯ (19) RU (11) (13) 2 581 329 C1 (51) МПК B01J 21/04 (2006.01) B01J 37/025 (2006.01) C25D 9/04 (2006.01) ФЕДЕРАЛЬНАЯ СЛУЖБА ПО ИНТЕЛЛЕКТУАЛЬНОЙ СОБСТВЕННОСТИ (12) ОПИСАНИЕ (21)(22) Заявка: ИЗОБРЕТЕНИЯ К ПАТЕНТУ 2014140685/02, 09.10.2014 (24) Дата начала отсчета срока действия патента: 09.10.2014 (72) Автор(ы): Лебедев Дмитрий Александрович (RU), Иванов Максим Борисович (RU) (73) Патентообладатель(и): Лебедев Дмитрий Александрович (RU) R U Приоритет(ы): (22) Дата подачи заявки: 09.10.2014 (45) Опубликовано: 20.04.2016 Бюл. № 11 2 5 8 1 3 2 9 R U (54) КАТАЛИТИЧЕСКИ-АКТИВНОЕ ТЕРМОБАРЬЕРНОЕ КЕРАМИЧЕСКОЕ ПОКРЫТИЕ НА ПОВЕРХНОСТИ КАМЕРЫ ВНУТРЕННЕГО СГОРАНИЯ ДВИГАТЕЛЯ (57) Реферат: Изобретение относится к износостойкому слой толщиной 10-100 мкм состоит из оксида каталитически-активному термобарьерному алюминия и оксида церия с содержанием от 1 до керамическому покрытию деталей камеры 50 мол.%. Обеспечивается повышение надежности двигателя внутреннего сгорания, нанесенному и эффективности в работе камеры двигателя методом микродугового оксидирования. внутреннего сгорания, увеличение коэффициента Упомянутое покрытие является двухслойным с полезного действия двигателя внутреннего толщиной 15-150 мкм. Первый слой покрытия сгорания, снижение уровня выбросов угарного ...

Substrate with zinc oxide layer, method for producing zinc oxide layer, photovoltaic device, and method for producing photovoltaic device

Provided are a substrate with a zinc oxide layer, in which at least a zinc oxide layer is provided on a support substrate, wherein the zinc oxide layer comprises a zinc oxide layer having the c axis perpendicular to the support substrate and a zinc oxide layer having the c axis slantindicular to the support substrate in the order from the side of the support substrate; and a photovoltaic device in which a semiconductor layer is formed on the substrate with the zinc oxide layer. Thus provided is the inexpensive photovoltaic device with excellent reflective performance and optical confinement effect and with high photoelectric conversion efficiency.

Method of making a composite article comprising a ceramic coating

A ceramic coating is formed on a conductive article by immersing a first anodic electrode, including the conductive article, in an electrolyte comprising an aqueous solution of alkali metal hydroxide and an alkali metal silicate, providing a second cathodic electrode in contact with the electrolyte, and passing an alternating current from a resonant power source through the first electrode and to the second electrode while maintaining the angle φ between the current and the voltage at zero degree, while maintaining the voltage within a predetermined range. The resulting ceramic coated article comprises a coating which includes a metal, silicon, and oxygen, wherein the silicon concentration increases in the direction from the article surface toward an outer surface of the ceramic coating surface layer.

Method of producing a highly stable sensor coating on hydrogen peroxide

FIELD: technological processes.SUBSTANCE: invention relates to electroanalysis and electrochemical sensors and can be used in analytical chemistry, in designing biosensors, in clinical and non-invasive diagnostics, for monitoring the environment in various industries. Method involves successive single deposition of iron and nickel hexacyanoferrates onto the electrode surface. Task is solved by performing complex optimization of synthesis parameters: the amount of precipitated hexacyanoferrates varied within a wide range until an optimum ratio is established.EFFECT: method enables to obtain reproducible sensor coatings with high sensitivity, selectivity and stability.8 cl, 4 dwg, 2 tbl РОССИЙСКАЯ ФЕДЕРАЦИЯ (19) RU (11) (13) 2 703 316 C1 (51) МПК C25D 9/04 (2006.01) ФЕДЕРАЛЬНАЯ СЛУЖБА ПО ИНТЕЛЛЕКТУАЛЬНОЙ СОБСТВЕННОСТИ (12) ОПИСАНИЕ ИЗОБРЕТЕНИЯ К ПАТЕНТУ (52) СПК C25D 9/04 (2019.05) (21)(22) Заявка: 2018142226, 29.11.2018 (24) Дата начала отсчета срока действия патента: Дата регистрации: 16.10.2019 (45) Опубликовано: 16.10.2019 Бюл. № 29 (54) СПОСОБ ИЗГОТОВЛЕНИЯ ВЫСОКОСТАБИЛЬНОГО ПОКРЫТИЯ СЕНСОРА НА ПЕРОКСИД ВОДОРОДА (57) Реферат: Изобретение относится к области поверхность электрода. Поставленная задача электроанализа и электрохимических сенсоров и решается за счет проведения комплексной может быть использовано в аналитической химии, оптимизации параметров синтеза: количества при конструировании биосенсоров, в клинической осаждаемых гексацианоферратов варьировались и неинвазивной диагностике, для контроля в широких пределах до установления состояния окружающей среды, в различных оптимального соотношения. Способ позволяет областях промышленности. Способ включает получать воспроизводимые сенсорные покрытия последовательное однократное осаждение с высокой чувствительностью, селективностью и гексацианоферратов железа и никеля на стабильностью. 3 н. и 5 з.п. ф-лы, 4 ил., 2 табл. R U 2 7 0 3 3 1 6 (56) Список документов, цитированных в отчете о поиске: RU 2442976 C2, 20.02. ...

Metal oxide supercapacitor having metal oxide electrode coated onto the titanium dioxide ultrafine and its fabrication method

A metal oxide-based super capacitor having a metal oxide electrode coated onto a titanium oxide ultrafine fiber and a method for manufacturing the super capacitor are provided to prevent the decrease of capacitance of the super capacitor by uniformly depositing the metal oxide on a substrate with a large surface area. A metal oxide electrode of a metal oxide-based super capacitor includes an ultrafine titanium oxide fiber layer and a metal oxide layer. The ultrafine titanium oxide fiber layer is formed on a condenser material. The metal oxide layer is formed on the titanium oxide fiber layer. The ultrafine titanium oxide fiber layer further includes conductive particles therein. A diameter of the ultrafine titanium oxide fiber is 50 to 1000nm. A diameter of the ultrafine titanium oxide fiber is 1 to 50nm, and a length of the ultrafine titanium oxide fiber is 10 to 200nm.

Energy enhanced process for treating a conductive surface and products formed thereby

The disclosure relates to a process for forming a deposit on the surface of a metallic or conductive surface. The process employs an energy enhanced process to deposit a silicate containing coating or film upon a metallic or conductive surface.

Metal material coated with metal oxide and/or metal hydroxide coating film and method for production thereof

본 발명의 목적은 금속재료 상에 대한 여러 가지 기능, 여러 가지 구조의 갖가지 산화물 피막 및/또는 수산화물 피막의 수용액으로부터의 제조 방법과, 그 피막을 가지는 금속재료를 제공하는 것에 있다. SUMMARY OF THE INVENTION An object of the present invention is to provide a method for producing metal oxides having various functions on metal materials, various oxide films and / or hydroxide films having various structures from aqueous solutions, and metal films having the films. 금속 이온과 상기 금속 이온에 대하여 몰비로 4배 이상의 불소 이온을 포함하는, 및/또는 금속과 상기 금속에 대하여 몰비로 4배 이상의 불소를 함유하는 착이온을 포함하는, pH2 내지 7의 처리 수용액 중에, 금속재료를 침지함으로써, 또는 도전성 재료를 전해함으로써, 상기 금속재료 표면에 상기 금속 이온을 포함하는 금속 산화물 및/또는 금속 수산화물의 피막을 형성하는 것을 특징으로 하는 금속 산화물 및/또는 금속 수산화물 피복 금속재료의 제조 방법과, 본 방법으로 제작된 금속 산화물 및/또는 금속 수산화물의 피막을 가지는 것을 특징으로 하는 금속 산화물 및/또는 금속 수산화물 피복 금속재료이다. In an aqueous solution of pH 2 to 7 comprising a complex ion containing at least 4 times fluorine ions in a molar ratio of metal ions and the metal ions and / or at least 4 times of fluorine in a molar ratio of metal and the metal ions. A metal oxide and / or metal hydroxide-coated metal, wherein a film of metal oxide and / or metal hydroxide containing the metal ion is formed on the surface of the metal material by immersing the metal material or by electrolytically conducting the conductive material. It is a metal oxide and / or metal hydroxide coating metal material characterized by having the manufacturing method of a material, and the film of metal oxide and / or metal hydroxide produced by this method.

Method for preparation of MoO3-Pt thin films having bi-layered structure by electrochemical deposition and MoO3-Pt thin films prepared by the method

본 발명은 본 발명은 전기화학적 증착법에 의한 이중층 구조를 갖는 삼산화몰리브데늄-백금 박막의 제조방법에 관한 것으로, 구체적으로 염화백금산 전해질 용액을 제조하는 단계(단계 1); 몰리브데늄 전해질 용액을 제조하는 단계(단계 2);상기 단계 1에서 제조된 염화백금산 전해질 용액에 기판을 침지시킨 후 전기화학적 증착법을 통하여 기판 위에 백금 박막을 제조하는 단계(단계 3); 및 상기 단계 2에서 제조된 몰리브데늄 전해질 용액에 상기 단계 3에서 제조된 백금 박막이 형성된 기판을 침지시킨 후 전기화학적 증착법을 통하여 이중층 구조의 삼산화몰리브데늄-백금 박막을 제조하는 단계(단계 4)를 포함하는 이중층 구조를 갖는 삼산화몰리브데늄-백금 박막의 제조방법 및 이에 의해 제조된 삼산화몰리브데늄-백금 박막에 관한 것이다. 본 발명에 따른 삼산화몰리브데늄-백금 박막은 추가적인 처리공정없이 직접적으로 전극을 사용할 수 있어, 공정의 편의성을 상승시키고 재료의 성능저하를 막을 수 있으며, 경제적으로 유리하고 종래 백금 박막에 비해 성능이 월등히 향상되었을 뿐만 아니라, 적당량의 삼산화몰리브데늄의 첨가로 인하여 전극의 안정성 또한 증가되어 이를 이용한 촉매 등에 유용하게 사용될 수 있다. The present invention relates to a method for producing a molybdenum trioxide-platinum trioxide thin film having a double layer structure by an electrochemical vapor deposition method, specifically preparing a platinum chloride electrolyte solution (step 1); Preparing a molybdenum electrolyte solution (step 2); preparing a platinum thin film on the substrate by electrochemical deposition after immersing the substrate in the chloroplatinic acid electrolyte solution prepared in step 1; And immersing the substrate on which the platinum thin film prepared in step 3 is formed in the molybdenum electrolyte solution prepared in step 2, and then preparing a molybdenum trioxide-platinum trioxide thin film having a double layer structure by electrochemical deposition (step 4 It relates to a method for producing a molybdenum trioxide-platinum thin film having a double layer structure comprising a) and a molybdenum trioxide-platinum thin film prepared thereby. The molybdenum trioxide-platinum thin film according to the present invention can directly use the electrode without additional processing process, it can increase the convenience of the process and prevent the performance degradation of the material, it is economically advantageous and the performance compared to the conventional platinum thin film Not only was it significantly improved, the stability of the electrode was ...

Item made from composite material with ceramic coating (versions) and coating forming method

FIELD: metallurgy industry. SUBSTANCE: invention refers to items made from composite materials, and namely to items consisting of metal with ceramic coating, as well as to the method of applying ceramic coating to metals and their alloys. When forming the ceramic coating on an electrically conducting item, the first electrode containing electrically conducting item is submerged into an electrolyte which contains water solution of metal hydroxide and metal silicate. Vessel wherein there is electrolyte, or electrode submerged in electrolyte is used as the second electrode, and alternate current is passed from resonant power supply through the first electrode used as an anode and the second electrode used as a cathode, thus forming angle φ between current and voltage, which equals zero degrees. Voltage between the first and second electrodes is maintained within the specified range for crystal inclusions and high-temperature modifications of oxides to appear in the coating being obtained. There obtained is an item made according to the above method, which contains metal, silicon and oxygen, and wherein silicon concentration increases in the direction from the item surface to external surface of surface layer of ceramic coating. EFFECT: obtaining the coating with excellent mechanical and safety performance such as very high hardness, increased ultimate tensile strength, wear-and-tear- and heat resistance, strong bonding to the base, low friction factor, high dielectric strength, and very high chemical and corrosion resistance. 31 cl, 2 tbl, 30 dwg, 1 ex ÐÎÑÑÈÉÑÊÀß ÔÅÄÅÐÀÖÈß RU (19) (11) 2 345 180 (13) C2 (51) ÌÏÊ C25D 9/04 C25D 3/02 C25D 5/30 (2006.01) (2006.01) (2006.01) ÔÅÄÅÐÀËÜÍÀß ÑËÓÆÁÀ ÏÎ ÈÍÒÅËËÅÊÒÓÀËÜÍÎÉ ÑÎÁÑÒÂÅÍÍÎÑÒÈ, ÏÀÒÅÍÒÀÌ È ÒÎÂÀÐÍÛÌ ÇÍÀÊÀÌ (12) ÎÏÈÑÀÍÈÅ ÈÇÎÁÐÅÒÅÍÈß Ê ÏÀÒÅÍÒÓ (21), (22) Çà âêà: 2005132631/02, 27.02.2004 (72) Àâòîð(û): ÁÓÊÀÐ Ñåðãèó (MD) (24) Äàòà íà÷àëà îòñ÷åòà ñðîêà äåéñòâè ïàòåíòà: 27.02.2004 (73) Ïàòåíòîîáëàäàòåëü(è): ÎËÈÌÅÊÑ ÃÐÓÏ, ÈÍÊ. (US ...

Composition for plating cobalt and method for forming a methal wiring using the same

본 발명은 코발트 도금용 조성물 및 이를 이용한 금속 배선의 형성 방법에 관한 것으로, 보다 상세하게는 코발트 염; 염화물 또는 염산; 붕산; 탄소계 물질; 및 기타 첨가제를 포함하는 코발트 도금용 조성물에 관한 것으로, 상기 코발트 도금용 조성물을 기판 상에 도금함으로써 고온 공정 시 발생하는 금속의 열팽창을 억제하여 기판의 구조 변경이나 추가 공정 없이도 기판의 변형을 방지하는 코발트 도금용 조성물 및 이를 이용한 금속 배선의 형성 방법에 관한 것이다.

A kind of modified BiFeO of phosphoric acid cobalt catalyst3Film photoelectric electrode and preparation method thereof

本发明属于半导体薄膜领域，具体涉及一种磷酸钴改性BiFeO 3 (BFO)薄膜光电极及其制备方法。本发明提供了一种磷酸钴(Co‑Pi)改性BFO薄膜光电极及其制备方法，其特点在于，通过光辅助电化学沉积法在溶胶凝胶法制备的BFO薄膜表面上沉积负载一层Co‑Pi助催化剂。通过磷酸钴助催化剂改性后，可以有效降低BFO薄膜光电极的反应过电势，提高表面反应活性，在一定程度上解决目前BFO薄膜光电极存在的光生载流子迁移率较差以及载流子复合率高等问题，从而可以大幅提高BFO薄膜光电极的光电化学性能，促进BFO薄膜光电极在光电化学领域的应用。

Rapid preparation method for cuprous oxide nano-film

本发明涉及一种氧化亚铜纳米薄膜的快速制备方法，是根据氧化亚铜的结构特征，采用醋酸铜和乳酸做原料，十二烷基硫酸钠做表面修饰剂，去离子水做溶剂，氢氧化钠做pH碱性调节剂，采用电化学脉冲直流电解法制备氧化亚铜纳米薄膜，此制备方法工艺先进，数据精确翔实，产物为黄色膜状，薄膜截面呈长方形，膜层厚度≤30nm，氧化亚铜纳米薄膜由颗粒组成，颗粒呈纳米球状，颗粒直径≤30nm，产物纯度达99.6％，与导电玻璃之间结合牢固，对紫外光和可见光有明显的吸收，在100W氙灯照射下产生240μA/cm 2 电流，可在太阳能发电，光伏产品中使用，是先进的氧化亚铜纳米薄膜的快速制备方法。

Protective or priming layer for sheet metal, comprises inorganic compound of different metal with low phosphate ion content, electrodeposited from solution

A layer of inorganic compound of a metal (A) is electrochemically-deposited onto the conductive surface from a solution of the metal (A); weight applied being 0.01-10 g/m<2>. The metal (A) is other than that forming the main component of the surface. The inorganic compound contains less than 20 wt% of phosphate ions. An Independent claim is included for a corresponding method of making an at least two-layer coating on an electrically-conductive surface. The second layer is added in a further stage, in which a coating of an organic polymer is applied. Preferred features: The deposited compound is an oxide. Deposition takes place at a potential relative to a standard hydrogen electrode of \! 0.1V to \! 300V; or a current density of \! 0.1 - \! 10000 mAcm<-2>. The inorganic compound is x-ray crystalline. In applying a second layer, a cathodically- or anodically- deposited electro-dip paint is applied. The process is a continuous sheet operation, the polymer layer being applied by dipping, spraying-on or using a coating roller. A powder paint is applied. Adhesive is applied. A corresponding metal component with double layer coating is also claimed.

Feedback control of dimensions in nanopore and nanofluidic devices

Nanofluidic passages such as nanochannels and nanopores are closed or opened in a controlled manner through the use of a feedback system. An oxide layer is grown or removed within a passage in the presence of an electrolyte until the passage reaches selected dimensions or is closed. The change in dimensions of the nanofluidic passage is measured during fabrication. The ionic current level through the passage can be used to determine passage dimensions. Fluid flow through an array of fluidic elements can be controlled by selective oxidation of fluidic passages between elements.

Patent FR2380357B1

Process for the treatment of metal surfaces and products thus treated

PHOTOVOLTAIC CELL AND METHOD FOR ITS PREPARATION

Indium doping ti-supported lead dioxide electric pole and its preparation method and application

本发明提供了一种In掺杂钛基二氧化铅电极及其制备方法，以及在高浓度难生物降解的制药废水的降解处理中的应用，所述的电极以钛为基体，自钛基体起由内至外依次镀有锡锑氧化物底层、α‑PbO 2 中间层、掺杂In的含氟β‑PbO 2 活性层；本发明通过电极结构设计和表面掺杂对二氧化铅电极进行修饰，通过主族金属In及高聚物氟树脂的加入使电极表面PbO 2 微粒分散更加紧密均匀，大大地改善了电极表面的结构和性质，使PbO 2 活性层与钛基体的之间的内应力减小，因此，制得的电极具有更高的析氧电位和电化学稳定性，有效地延长了电极寿命；该电极催化性能好，使用寿命长，实用性强，易于制备，具有广阔的市场前景。

Metal oxide and / or metal hydroxide-coated metal material and method for producing the same

本発明の目的は、金属材料上への種々機能、様々な構造の種々酸化物被膜及び／又は水酸化物被膜の水溶液からの製造方法と、その被膜を有する金属材料を提供することにある。金属イオンと該金属イオンに対してモル比で４倍以上のフッ素イオンを含む、及び／又は、金属と該金属に対してモル比で４倍以上のフッ素を含有する錯イオンを含む、ｐＨ２〜７の処理水溶液中に、金属材料を浸漬することで、あるいは導電性材料を電解することで、該金属材料表面に前記金属イオンを含む金属酸化物及び／又は金属水酸化物の被膜を形成することを特徴とする金属酸化物及び／又は金属水酸化物被覆金属材料の製造方法と、本方法で作製された金属酸化物及び／又は金属水酸化物の被膜を有することを特徴とする金属酸化物及び／又は金属水酸化物被覆金属材料である。 An object of the present invention is to provide a method for producing various functions and various oxide films and / or hydroxide films of various structures on a metal material from an aqueous solution, and a metal material having the film. PH 2 to 4 containing fluorine ions at a molar ratio of 4 times or more with respect to the metal ions and the metal ions, and / or containing complex ions containing fluorine at a molar ratio of 4 times or more with respect to the metal and the metals. The metal oxide and / or metal hydroxide film containing the metal ions is formed on the surface of the metal material by immersing the metal material in the treatment aqueous solution 7 or by electrolyzing the conductive material. A metal oxide and / or metal hydroxide-coated metal material, and a metal oxide and / or metal hydroxide film produced by the method. And / or metal hydroxide-coated metal materials.

Process for coloring metal surfaces

Cadmium telluride photovoltaic cell - has cadmium telluride film electrodeposited on cadmium surface from acid or alkaline soln.

The cell comprises (a) a Cd-Te film, (b) a barrier layer intimately contacting one side of the film and forming a rectifying junction with it and (c) a conductive layer intimately contacting the other side of the film, which is Cd-rich at the interface, forming an ohmic junction witb it. Mrf. of a photovoltaic cell comprises (i) electrodepositing a photovoltaic CdTe film on a smooth Cd surface, making ohmic contact with it, pref. (ii) depositing a barrier layer making rectifying contact with CdTe and esp. (iii) treating before or after (ii) to improve rectifying junction properties. CdTe is pref. deposited from a bath (I) contg. soln. CdSO4 and TeO2, pH 2.5 or (II) contg. 2-15 g/l Cd (II), 5-30 g/l Te (IV) and cyanide ions, pH 11-13.. The cell is mfrd. at low cost and has improved efficiency, e.g. above 1%, increasing up to over 5% with post deposition treatment, with over 6% probably attainable with anti-reflection layers. Band gap energy of CdTe is optimum for solar radiation reaching the earth.

Electrolytic treatment of iron surfaces

Treatment is to better resistance to friction and wear and tear by the surface and involves the use of an electrolytic bath which exhibits desirable stabilisation properties. The bath, which is kept under 300 degrees C., contains additional potassium and/or sodium thiocyanate in a quantity between 0.005 and 4.00%. Iron ferricyanide which forms in situ on the surface of the object mixes with the iron sulphide.

Process for the treatment of metal surfaces and products thus treated

PROCEDURE FOR THE REALIZATION OF A COATING WITH HIGH ABSORPTION IN THE RANGE OF WAVELENGTHS OF THE SOLAR SPECTRUM AND PRODUCTS OBTAINED

A kind of Zinc electrolysis fluorine-resistant lead base composite anode and preparation method thereof

本发明公开了一种锌电积用耐氟铅基复合阳极及其制备方法。采用电化学沉积方法在Pb或Pb合金表面沉积复合膜层CaO‑MnO 2 ‑PbO 2 。CaO的引入可以拦截向Pb基底扩散传输的氟离子，抑制氟对Pb基底的腐蚀，改善基底与膜层的结合。弥散分布的MnO 2 可以抑制膜层中MnO 2 /PbO 2 ‑PbSO 4 /MnO 2 叠层结构的形成，提高氧化膜层内部稳定性。该复合阳极可拦截向铅基底传输的氟并提高氧化膜层内部稳定性，显著延长铅基复合阳极在含氟硫酸体系中的服役寿命。

Process for applying lead dioxide coatings by anodic deposition on metallic titanium

Method of sulfidizing copper

Metal material coated with metal oxide and/or metal hydroxide coating film and method for production thereof

A method for producing a metal material coated with a metal oxide and/or metal hydroxide coating film, characterized in that it comprises immersing a metal material or electrolyzing an electroconductive material, in an aqueous treating solution which contains a metal ion and a fluorine ion in a molar amount four times that of the metal ion and/or a metal and a complex ion containing fluorine in a molar amount four times that of the metal and has a pH of 2 to 7, to thereby form a metal oxide and/or a metal hydroxide coating film containing the above metal ion on the surface of said metal material; and a metal material coated with a metal oxide and/or a metal hydroxide, characterized in that it has a coating film of a metal oxide and/or a metal hydroxide prepared by the above method. The above method allows the formation of oxide coating films and/or hydroxide coating films having various structure or exhibiting various functions on a metal material, by the use of an aqueous solution.

Process for producing a graduated coating of calcium phosphate phases and metallic oxide phases on metal implants

The invention concerns a process for producing a gradient coating of calcium phosphate phases and metal oxide phases on metallic implants, in particular made of titanium or titanium alloys, for use as dental, jaw or joint implants. A solution containing calcium ions and phos-phate ions is used as an electrolyte the pH value of which is slightly acidic to approximately neutral. The substrate electrodes are alternately polarized to be cathodic or anodic. The depos-ited layer forms a gradient coating, which is strongly adherent, has a fine structure and is dis-tinguished for its high degree of biocompatibility.

method for measuring oxygen reduction reaction activity of silver oxide catalyst

The present invention relates to a method for electrodeposition of silver oxide nanoparticles, and a method for measuring oxygen reduction reaction activity of a silver oxide catalyst prepared thereby. More particularly, the present invention relates to a method of electrodepositing silver oxide nanoparticles having a uniform pyramid-shaped polyhedral structure and improved catalytic activity on the surface of a working electrode without forming dendrites by applying a current having a positive (+) sign in the form of a pulse, and a method for measuring the activity and electrochemical stability of the silver oxide catalyst prepared by the method in a state in which a triple-phase boundary is formed in the same way as the conditions under which the oxygen reduction catalyst is actually driven.

Patent JPS5759317B2

Metal material coated with metal oxide and/or metal hydroxide and method for production thereof

本发明提供了生产金属氧化物和/或金属氢氧化物涂敷的金属材料的方法，特征在于将金属材料浸渍在含有金属离子和相对于该金属离子而言4倍摩尔比的氟离子、和/或含有包括至少一种金属和相对于该金属而言4倍摩尔比的氟的络离子的pH2-7的含水处理溶液中，或将导电材料在该含水处理溶液中电解，以在所述金属材料的表面上形成含有该金属离子的金属氧化物和/或金属氢氧化物涂层；以及提供了被金属氧化物和/或金属氢氧化物涂敷的金属材料，特征在于它具有通过上述方法形成的金属氧化物和/或金属氢氧化物涂层。上述方法通过使用所述水溶液使得在金属材料上能形成具有各种结构或显示各种功能的氧化物涂膜和/或氢氧化物涂膜。

Patent JPS5654399B2

Zinc oxide film treatment method and method of manufacturing photovoltaic device utilizing the same

A film of zinc oxide electrochemically deposited from an aqueous solution is subjected to heat treatment at a temperature equal to or higher than 150° C. and equal to or lower than 400° C. in a nitrogen or inert gas atmosphere that contains oxygen, thereby obtaining a zinc oxide film that is low in electric resistance without impairing the light transmittance of the zinc oxide film.

Preparation method and application of composite coating electrocatalytic electrode material

本发明公开一种复合涂层电催化电极材料的制备方法，包括钛基板预处理、制备导电底基层、制备抗氧化中间层、制备导电致密中间层、制备催化层，共计五大步骤后得到复核涂层的复合涂层电催化电极材料，本发明公开的电极材料，在强化劣化试验下具有良好的稳定性，同时本发明具有原料价格便宜且易得的特点，同时，具有高机械强度、活性好的特点，可迅速降低废水中有机物，提高废水可生化性。且本发明公开的工艺中不产生VOCs，环保且节能。

Improvements in or relating to the Treatment of Iron.

4292. Dismore, A. V. Feb. 19. Iron, obtaining; metals, pickling; connexions. -Cast or wrought iron, or inferior mild steel, is rendered more malleable, ductile, and tenacious by constituting it an insoluble electrode of a bath in which the electric pressure is increased or diminished, preferably suddenly, during electrolysis, being for part of the time considerably higher than ordinary plating pressures. The lowest pressure may for instance be 6 volts, and the highest pressure 250-1000 volts. In the arrangement shown in plan, two pairs of anodes F, of nickel and carbon respectively, are suspended on opposite sides of the iron cathode E. Before changing the pressure the iron is reversed, so that each side faces the nickel and carbon electrodes in succession. Low and high pressure circuits C, D are both connected to the electrodes; the high-pressure circuit includes a hand-switch D<1>, and the lowpressure circuit an automatic switch C<1> which opens under the action of the higher pressure. The electrolyte may be made by boiling 3-4 quarts of water with 35¢ oz. nickel sulpha.te, 26¢ oz. neutral ammonium tartrate, and 77 grains tannin, diluting to 20 quarts, adding first a solution of 0À35 oz. nickel ammonium sulphate and 1À75 oz. strong ammonia, in 1 quart of water, and then successively, to each gallon of liquid, 1À25 lb. common salt and 3À75 grains platinum bichloride. Alternatively, 1 lb. of " nickel salts," i.e. a mixture of nickel sulphate, ammonium tartrate, and tannin, together with the amounts of common salt and platinum chloride specified, may be dissolved in 1 gallon of water; this electrolyte may be revivified when required by adding nickel ammonium sulphate, ammonia, and water. The cell may be of lead lined with matchboard, and is preferably constructed so that the electrolyte may be agitated and may be heated by gas or electricity, or otherwise. Before treatment the iron is freed from grease, paint, and the like, and after treatment it ...

Process for electrodepositing lead dioxide

Procedure for superficial treatment of ferrous surfaces to improve their rubbing and wear resistance qualities. (Machine-translation by Google Translate, not legally binding)

Surface treatment process of ferrous surfaces to improve their friction and wear resistance qualities, in which the ferrous surfaces are treated by electrolysis in a bath of molten salts, the ferrous surface forming the anode, the salt bath being low temperature below 300º c, and comprising potassium thiocyanate and sodium thiocyanate, the former in a notably greater proportion than the latter, a process characterized in that the salt bath also comprises potassium and/or sodium cyanide, in an amount comprised between 0.005% and 4.00% of cyanide whose melting temperature is of the order of 600ºC and which is in solution in the bath at a temperature lower than 300º c, and because this homogeneous solution is maintained by agitation of the bath, in such a way that it forms "in situ" an iron ferricyanide on the surface of the piece mixed with iron sulphide. (Machine-translation by Google Translate, not legally binding)

Method for preparing aluminum oxide-based ceramic coating by electrolyzing liquid phase plasma on surface of stainless steel

一种不锈钢表面液相等离子体电解制备Al 2 O 3 基陶瓷涂层的方法，它涉及不锈钢表面改性领域，本发明主要解决现有方法在不锈钢表面制备陶瓷涂层工艺复杂，所需设备昂贵，而且难以在形状复杂工件表面制备陶瓷涂层的问题。本发明的方法为：一、不锈钢试样表面打磨清洗处理；二、配制电解液；三、将试样连在双脉冲电源上，在电解液温度为10～100℃，正脉冲为10～1000V、负脉冲为10～500V、工作频率为50～2000Hz、占空比为5～50％的条件下，电解沉积5～240min；四、清洗、干燥，即得Al 2 O 3 基陶瓷涂层。本发明所需设备简单、工艺参数易调节、所得陶瓷涂层结构均匀、成膜速度快，并且操作简单，易于实现自动化。本发明应用在不锈钢的耐磨防腐领域。

PROCEDURE FOR ELECTROLYTIC COLORING OF NON-ANODIZED ALUMINUM AND ALUMINUM ALLOYS.

Self-healing coatings for oil and gas applications

A coated article comprises a substrate and a self-healing coating disposed on a surface of the substrate, the self-healing coating comprising a metallic matrix; and a plurality of micro- or nano-sized particles dispersed in the metallic matrix; the micro- or nano-sized particles comprising an active agent disposed in a carrier comprising a micro- or nano-sized metallic container, a layered structure, a porous structure, or a combination comprising at least one of the foregoing.

Metal oxide and / or metal hydroxide-coated metal material and method for producing the same

Method for increasing adhesion between a chromium surface and a lacquer

The present invention concerns a method for increasing the adhesion between a chromium surface and a lacquer wherein said chromium surface is contacted with an aqueous solution comprising at least one phosphorous compound according to formulae R1—P(O)(OR2)(OR3) 1 and R1—O—P(O)(OR2)(OR3) 2 wherein R1 is a C1 to C12 alkyl group, linear, branched or cyclic comprising at least one polar residue and R2 and R3 are independently selected from the group consisting of hydrogen, lithium, sodium, potassium, ammonium and C1 to C4 alkyl while passing an external electrical current through said substrate and at least one anode wherein said substrate serves as the cathode.

MgB2 superconductor and method for preparation thereof

An electrode is steeped in a solution of Mg and B and a negative voltage is applied to the electrode so as to precipitate superconductive MgB 2 on the electrode. Superconductive MgB 2 is easily manufactured in various forms and at low costs without any special device.

Non-enzymatic electrochemical sensor for detecting concentration of glutamic acid and detection method adopting same

本发明提供了一种用于检测谷氨酸浓度的非酶电化学传感器及采用其的检测方法，所述的电化学传感器包括反应池，以及设置于反应池内的工作电极、辅助电极和参比电极；通过工作电极、辅助电极和参比电极构建三电极体系，对反应池内的待测溶液中的谷氨酸进行痕量检测；所述的工作电极为表面修饰有镍氧化物‑还原氧化石墨烯纳米材料的碳基电极。本发明以非酶电化学传感方式检测样品中低浓度的谷氨酸，对0.1nM‑1μM范围内的谷氨酸浓度也可以实现较高的电流响应，从而实现了对谷氨酸进行痕量检测的目的，为生物与医学应用领域中谷氨酸的痕量检测提供了非常廉价、快捷的方法，值得推广。

Process of coating metals with oxids

Improvements to electrolytic deposits of lead dioxide

PROCESS FOR PREPARING AN OXIDE OR HYDROXIDE FILM OF AN ELEMENT OF COLUMNS II OR III OF THE CLASSIFICATION, AND THE COMPOSITE STRUCTURES INCLUDING SUCH A FILM

Method for preparing Ni-Fe hydroxide nanometer films through electrodeposition

本发明公开了一种电沉积制备NiFe氢氧化物纳米薄膜的方法，该方法以环己醇为油相、TX100为表面活性剂、1丁基3甲基咪唑四氟硼酸盐为助表面活性剂、Ni(NO 3 ) 2 和Fe(NO 3 ) 3 的水溶液为水相，制备成具有较高导电性的反相四元离子液体微乳液，然后以该微乳液为电解液，采用电沉积法制备成NiFe氢氧化物纳米薄膜。本发明通过在微乳液中添加1丁基3甲基咪唑四氟硼酸盐，提高了微乳液的导电性能，从而提高了电沉积效率；1丁基3甲基咪唑四氟硼酸盐作为助表面活性剂参与微胶束的形成，作为软模板剂防止纳米粒子团聚，可以有效控制微反应器的大小，进而控制NiFe氢氧化物的尺寸，有效提高催化比表面积，提高其作为水分解阳极催化剂的催化性能。

Method for electrochemically depositing carbon nitride films on a substrate

Dense carbon nitride films are electrochemically formed on a conductive substrate by placing the substrate acting as cathode in a molten salt electrolyte bath and applying DC current across the substrate and a counter electrode acting as anode also placed in the molten salt electrolyte bath. Carbonate ion and nitrate ion are concurrently reduced to deposit carbon nitride films on the substrate.

Preparation method of super-hydrophobic stainless steel surface with self-repairing characteristic

本发明属于功能材料技术领域，涉及一种具有自修复特性的超疏水不锈钢表面的制备方法。本发明提出的一种具有自修复特性的超疏水不锈钢表面的制备方法具体为：采用电沉积方法制备超疏水结构。一方面利用亚麻酸对不锈钢的蚀刻；另一方面利用改性氧化石墨烯在不锈钢表面强的吸附力，从而形成高阻挡性能的膜层，来构筑超疏水表面；同时，通过在不锈钢表面沉积得到二氧化铈自修复膜层，使得超疏水不锈钢具有优良持久的耐蚀性能，缓蚀效率达97%以上，具有广泛的工业应用前景。

A kind of Polyglycolic acid fibre-indium sulfide zinc compound film electrode and preparation method thereof

本发明公开了一种聚乙撑二氧噻吩‑硫化铟锌复合膜电极及其制备方法，包括以下步骤：步骤1，三电极体系中，采用钛片作为工作电极，铂片为对电极，银/氯化银为参比电极；将三电极体系置于合成ZnIn 2 S 4 的前驱体溶液中，通过电化学沉积，在钛片基底上合成ZnIn 2 S 4 前驱体膜；在惰性气体氛围下经退火工艺得到ZnIn 2 S 4 膜电极；步骤2，将乙烯二氧噻吩溶解于去离子水中，加入硫酸钠作为电解质，配制获得聚合物前驱体溶液；步骤3，将步骤1处理后的三电极体系，置于步骤2获得的聚合物前驱体溶液中，进行聚合；步骤4，步骤3处理后的工作电极清洗干燥，得到聚乙撑二氧噻吩‑硫化铟锌复合膜电极。本发明消除了粉末状ZnIn 2 S 4 催化剂易聚集、难回收等缺点。