Thermal processor employing radiant heater

A thermal processor including a rotatable hollow drum including a drum core having an interior surface and an exterior surface, and a radiant heater positioned within an interior of the drum and configured to provide radiant energy to heat the drum, wherein at least one radiant energy absorption characteristic of the interior of the drum varies across its longitudinal width W d so that selected areas of the interior of the drum absorb more radiant energy than other areas of the interior of the drum so as to compensate for non-uniform heat loss from the drum and to provide the exterior surface of the drum core at a desired temperature which is substantially uniform across the longitudinal width of the drum core.

OPTICAL ARRANGEMENT, IN PARTICULAR PROJECTION EXPOSURE APPARATUS FOR EUV LITHOGRAPHY, AS WELL AS REFLECTIVE OPTICAL ELEMENT WITH REDUCED CONTAMINATION

An optical arrangement, e.g. a projection exposure apparatus () for EUV lithography, includes: a housing () enclosing an interior space (); at least one, preferably reflective optical element (--) arranged in the housing (); at least one vacuum generating unit () for the interior space () of the housing (); and at least one vacuum housing (-) arranged in the interior space () and enclosing at least the optical surface () of the optical element (--). A contamination reduction unit is associated with the vacuum housing (-) and reduces the partial pressure of contaminating substances, in particular of water and/or hydrocarbons, at least in close proximity to the optical surface () in relation to the partial pressure of the contaminating substances in the interior space (). 146-. (canceled)47. An apparatus for EUV lithography , the apparatus comprising:a main housing that encloses an interior space into which contaminating substances are outgassed during said operation;said main housing including three interconnected housing parts in said interior space of said main housing; a first one of said housing parts including a first interior space; a second one of said housing parts including a second interior space; and, a third housing part including a third interior space;said first housing part enclosing a light source in said first interior space;said second housing part enclosing an illumination system in said second interior space;said third housing part enclosing a projection optics system in said third interior space;at least one optical element arranged in one of said housing parts and said one optical element having an optical surface;a vacuum generating unit that generates a vacuum in the interior space of said one housing part of said main housing so as to cause the contaminating substances therein to be at a first partial pressure;a vacuum housing that is arranged in the interior space of said one housing part so as to be independent thereof;said vacuum housing ...

LIQUID CRYSTAL DISPLAY DEVICE TREATED BY UV IRRADIATION

A liquid crystal display device includes a pair of substrates, a liquid crystal between substrates and alignment layers disposed on the inner surface sides of the substrates. The alignment layer is made from a material including polyamic acid containing a diamine component and polyimide containing a diamine component different from the diamine component of the polyamic acid. The alignment layer is subjected to alignment treatment by irradiation of light. UV light can be irradiated in the oblique direction onto the alignment layer through a mask having openings. A reflecting plate can be arranged between a UV light source and the mask. Also, bank structures having a thickness from 0.1 to 0.15 μm can be provided on the alignment layer of the TFT substrate. 1disposing a photomask above said alignment layer;positioning said photomask so that a center portion of a first opening of said photomask is aligned with a center portion of a first pixel region of said alignment layer;disposing an ultraviolet light source obliquely above said photomask at a first position;conducting a first exposure by irradiating ultraviolet light from said ultraviolet light source at said first position;disposing, at a second position, said ultraviolet light source obliquely and symmetrically to said ultraviolet light source at said first position above said photomask; andconducting a second exposure by irradiating ultraviolet light from said ultraviolet light source at said second position;wherein a width of a non-exposed region between two regions exposed by said first exposure and said second exposure is not greater than 20 μm or a width of an overlapping exposed region of two regions exposed by said first exposure and said second exposure is not greater than 20 μm.. A method of treating an alignment layer, on which a plurality of pixel regions are defined, for conducting an alignment treatment of said alignment layer by irradiating ultraviolet light onto said alignment layer, said method ...

Exposure Device, Exposure Method and Method of Manufacturing Semiconductor Device

The present invention provides a highly controllable device for exposure from the back side and an exposure method, and also provides a method of manufacturing a semiconductor device using the same. The present invention involves exposure with the use of the back side exposure device of which a reflecting means is disposed on the front side of a substrate, apart from a photosensitive thin film surface by a distance X (X=0.1 μm to 1000 μm), and formation of a photosensitive thin film pattern in a self alignment manner, with good controllability, at a position a distance Y away from the end of a pattern. The invention fabricates a TFT using that method. 1a stage for placing a light transmissive substrate over which a photosensitive film is formed;a light source for irradiating said photosensitive film from a back side of said light transmissive substrate; anda reflecting means being opposite to a front side having said photosensitive film of said light transmissive substrate and apart from said photosensitive film by a predetermined distance.. An exposure device comprising: 1. Field of the InventionThe present invention relates to an exposure device and an exposure method. The invention also relates to a semiconductor device having a circuit that is composed of a thin film transistor (hereinafter referred to as TFT) made by using the exposure method, and to a method of manufacturing the same. The semiconductor device of the present invention includes not only elements such as thin film transistors (TFTs) and MOS transistors but also electrooptical devices, such as display devices and image sensors, having semiconductor circuits composed of those insulating gate type transistors. The semiconductor device of the invention relates to, for example, electrooptical devices typical example of which is a liquid crystal display panel or an electroluminescence (EL) display device and to electronic equipments provided with as their parts such electrooptical devices.Incidentally, ...

TRANSVERSE ELECTRIC-FIELD TYPE LIQUID CRYSTAL DISPLAY DEVICE, PROCESS OF MANUFACTURING THE SAME, AND SCAN-EXPOSING DEVICE

A process of manufacturing a liquid crystal display device of transverse electric-field type, wherein a halftone photomask which is used to form a photoresist pattern has a fully light-shielding area preventing UV irradiation of a portion of an active matrix substrate in which a thin-film transistor element is to be formed, so that the photoresist pattern includes a positive resist portion which has a first thickness and which is formed on the above-indicated portion of the substrate. The halftone mask further has a fully light-transmitting area which permits fully UV transmission therethrough to provide the photoresist pattern with a resist-free area which corresponds to a portion of the substrate in which a contact hole serving as a third connection portion connecting an external scanning-line driver circuit and a scanning-line terminal portion through a junction electrode is to be formed. The photoresist pattern also has a positive resist portion which is formed in the other portion of the substrate and which has a second thickness smaller than the first thickness. Also disclosed in a scan-exposing device used in the process is also disclosed. 1. (canceled)2. (canceled)3. (canceled)4. (canceled)5. (canceled)6. (canceled)7. (canceled)9. (canceled)10. (canceled)11. (canceled)12. (canceled)13. A scan-exposing device used in a process of manufacturing a liquid crystal display device including a pair of substrates at least one of which is transparent , and a layer of a liquid crystal composition interposed between the pair of substrates , said scan-exposing device being operable to scan-expose a photoresist applied to one of said pair of substrates , through a photomask having a desired light-shielding pattern , said scan-exposing device comprising:a slide carrying said one of the pair of substrates;photomask scan-exposing means for scan-exposing said photoresist while said photomask and said slide are moved at a same speed in a same direction; andspot scan-exposing ...

THERMAL PROCESSOR EMPLOYING RADIANT HEATER

A thermal processor including a rotatable hollow drum including a drum core having an interior surface and an exterior surface, and a radiant heater positioned within an interior of the drum and configured to provide radiant energy to heat the drum, wherein at least one radiant energy absorption characteristic of the interior of the drum varies across its longitudinal width Wso that selected areas of the interior of the drum absorb more radiant energy than other areas of the interior of the drum so as to compensate for non-uniform heat loss from the drum and to provide the exterior surface of the drum core at a desired temperature which is substantially uniform across the longitudinal width of the drum core. 1. A method of operating a thermal processor for thermally developing photothermographic film , comprising:positioning a radiant heater within an interior of a rotating hollow drum, the radiant heat providing radiant energy to heat the hollow drum; andmodifying radiant energy absorption characteristics of an interior surface of the hollow drum so that selected areas of the interior surface of the drum absorb more radiant energy than other areas of the interior surface of the drum in order to compensate for non-uniform heat loss from the hollow drum so that the exterior surface of the hollow drum has a temperature which is substantially uniform across a longitudinal width of the drum.2. The method of claim 1 , wherein modifying the radiant energy absorption characteristics comprises modifying an emissivity comprises coating or treating the interior surface of the drum such that end portions of the interior surface of the hollow drum have a higher emissivity than a remaining middle portion of the interior surface of the hollow drum.3. The method of claim 1 , wherein modifying the radiant energy absorption characteristics comprises grooving an interior surface of end portions of the hollow drum such that the interior surface of the end portions of the hollow drum ...

IMAGE EXPOSURE DEVICE, IMAGE EXPOSURE METHOD, AND PROGRAM

There are provided an image exposure device, an image exposure method, and a program, the image exposure device including: an image display device; a support portion that supports a photosensitive recording medium for recording an image displayed on the image display device in a state in which an exposure surface thereof faces the image display device; a louver film that is provided between the image display device and the support portion and limits an angle of light radiated from the image display device; an image generation unit that generates a display image in which an image quality of a color input image is deteriorated by emphasizing a density difference of a high-frequency component of the input image; and a controller that performs a control for generating an image of an R component, an image of a G component, and an image of a B component from the display image and sequentially displaying each of the image of the R component, the image of the G component, and the image of the B component on the image display device in a predetermined order to sequentially expose the photosensitive recording medium. 1. An image exposure device comprising:an image display device having a plurality of pixels;a support portion that supports a photosensitive recording medium for recording an image displayed on the image display device in a state in which an exposure surface of the photosensitive recording medium faces the image display device;a limiting member that is provided between the image display device and the support portion and limits an angle of light radiated from the image display device to the photosensitive recording medium;an image generation unit that generates a display image in which an image quality of a color input image represented by input image data is deteriorated by emphasizing a density difference of a high-frequency component of the input image; anda controller that performs a control for generating an image of an R component, an image of a G component ...

MASK, EXPOSURE METHOD AND TOUCH DISPLAY PANEL

A mask is provided. The mask includes a plurality of light blocking strips configured to block light and bounding spaces through which light is allowed to pass. The plurality of light blocking strips are arranged in a mesh shape, and include first light blocking strips located in at least one side edge of the mask, and second light blocking strips, and each of the first light blocking strips has a greater width than each of the second light blocking strips. An exposure method using the mask, and a touch display panel manufactured by the exposure method are also provided. 1. A mask comprising:a mask normal exposure area;a mask splicing exposure area constituted by a side edge of the mask and adjoining the mask normal exposure area; anda plurality of light blocking strips configured to block light and bounding spaces, wherein the spaces are configured such that light is allowed to pass through the spaces,wherein the plurality of light blocking strips are arranged in a mesh shape, the plurality of light blocking strips comprise first light blocking strips located in the mask splicing exposure area of the mask, and second light blocking strips located in the mask normal exposure area, and each of the first light blocking strips has a greater width than each of the second light blocking strips.2. The mask of claim 1 , wherein:the mask is configured to be used in a splicing exposure process comprising at least two exposures, each of the first light blocking strips has a first width, each of the second light blocking strips has a second width, and a difference between the first width and the second width is in direct proportion to a position deviation of the mask between the two exposures in the splicing exposure process.3. An exposure method claim 1 , comprising:{'claim-ref': {'@idref': 'CLM-00001', 'claim 1'}, 'providing the mask of ;'}providing a substrate comprising a first exposure region and a second exposure region;aligning the mask with the first exposure region of ...

Extreme Ultraviolet Lithography Process and Mask

An extreme ultraviolet lithography (EUVL) process is performed on a target, such as a semiconductor wafer, having a photosensitive layer. The method includes providing a one-dimensional patterned mask along a first direction. The patterned mask includes a substrate including a first region and a second region, a multilayer mirror above the first and second regions, an absorption layer above the multilayer mirror in the second region, and a defect in the first region. The method further includes exposing the patterned mask by an illuminator and setting the patterned mask and the target in relative motion along the first direction while exposing the patterned mask. As a result, an accumulated exposure dose received by the target is an optimized exposure dose. 1. A lithography process , comprising:providing a patterned mask having one or more one-dimensional patterns along a first direction;providing a target having a photosensitive layer on it;exposing the patterned mask by an illuminator having an intensity; andsetting an image of the patterned mask and the target in relative motion along the first direction over a time, wherein an accumulated exposure dose received by the target during the time is an optimized exposure dose.2. The process of claim 1 , wherein the patterned mask stays in a fixed position while the target moves in the first direction during exposing one field.3. The process of claim 1 , wherein the target stays in a fixed position while the patterned mask moves in the first direction during exposing one fild.4. The process of claim 1 , wherein the optimized exposure dose is based on an exposure dose for a pre-specified pattern on the patterned mask to achieve a pre-specified dimension on the target.5. The process of claim 1 , wherein the patterned mask includes:a reflective region;an opaque region; anda defect region in the reflective region.6. The process of claim 5 , wherein the reflective region is assigned to a polygon along the first direction ...

Multi-prism mechanism for laser exposure system of 3D images and method thereof

A multi-prism mechanism includes: an exposure motherboard; and a laser controlling and launching unit; wherein a multi-prism unit, a lens, an angle-switching reflecting mirror, a light detecting reflecting mirror, a light detecting device, three acousto-optical driving controllers, a laser driving control panel, a plurality of support posts and a plurality of reflecting mirrors are provided on the exposure motherboard; the laser controlling and launching unit is mounted on the support posts through nuts, in such a manner that the laser controlling and launching unit is installed on the exposure motherboard in a folded form; wherein the lens comprises a light inputting face and a light outputting face, the laser controlling and launching unit comprises three laser generator sets in parallel, the laser generator set comprises an acousto-optical regulator, a light valve, a directing lens, an optical zooming lens, a laser reflecting mirror and a spotting reflecting mirror. 16-. (canceled)7. A multi-prism mechanism for a laser exposure system of three-dimensional images , comprising:an exposure motherboard; anda laser controlling and launching unit;wherein a multi-prism unit, a lens, an angle-switching reflecting mirror, a light detecting reflecting mirror, a light detecting device, three acousto-optical driving controllers, a laser driving control panel, a plurality of support posts and a plurality of reflecting mirrors are provided on said exposure motherboard; said laser controlling and launching unit is mounted on said support posts through nuts, in such a manner that said laser controlling and launching unit is installed on said exposure motherboard in a folded form; wherein said lens comprises a light inputting face and a light outputting face, said laser controlling and launching unit comprises three laser generator sets in parallel, each of said laser generator sets comprises an acousto-optical regulator, a light valve, a directing lens, an optical zooming lens, ...

METHOD AND APPARATUS FOR DYNAMIC LITHOGRAPHIC EXPOSURE

The present disclosure, in some embodiments, relates to a photolithography tool. The photolithography tool includes a source configured to generate electromagnetic radiation. A dynamic focal system is configured to provide the electromagnetic radiation to a plurality of different vertical positions over a substrate stage. The plurality of different vertical positions include a first position having a first depth of focus and a second position having a second depth of focus that is below the first depth of focus and that vertically overlaps the first depth of focus. 1. A photolithography tool , comprising:a source configured to generate electromagnetic radiation;a dynamic focal system configured to provide the electromagnetic radiation to a plurality of different vertical positions over a substrate stage; andwherein the plurality of different vertical positions comprise a first position having a first depth of focus and a second position having a second depth of focus that is below the first depth of focus and that vertically overlaps the first depth of focus.2. The photolithography tool of claim 1 , wherein the substrate stage is configured to hold a substrate claim 1 , the first position and the second position configured to be within a photosensitive material over the substrate.3. The photolithography tool of claim 2 , wherein the first depth of focus and the second depth of focus both expose a same pattern in the photosensitive material.4. The photolithography tool of claim 1 , further comprising:projection optics disposed between a photomask and the substrate stage, wherein the dynamic focal system is configured to operate on the projection optics to provide the electromagnetic radiation to the plurality of different vertical positions.5. The photolithography tool of claim 4 , wherein the photomask comprises a pellicle mounted on an extreme ultraviolet (EUV) reticle.6. The photolithography tool of claim 4 , wherein the projection optics comprise a plurality of ...

METHOD AND APPARATUS FOR DYNAMIC LITHOGRAPHIC EXPOSURE

The present disclosure, in some embodiments, relates to a method of performing a photolithography process. The method includes forming a photosensitive material over a substantially flat upper surface of a substrate. The substantially flat upper surface of the substrate extends between opposing sides of the substrate. The photosensitive material is exposed to electromagnetic radiation at a plurality of depths of focus that are centered at different heights over the substrate. The photosensitive material is developed to remove a part of the photosensitive material. 1. A method of performing a photolithography process , comprising:forming a photosensitive material over a substantially flat upper surface of a substrate, wherein the substantially flat upper surface of the substrate extends between opposing sides of the substrate;exposing the photosensitive material to electromagnetic radiation at a plurality of depths of focus that are centered at different heights over the substrate; anddeveloping the photosensitive material to remove a part of the photosensitive material.2. The method of claim 1 , wherein the photosensitive material is continuously exposed to the electromagnetic radiation while a distance between a source of the electromagnetic radiation and the substrate changes.3. The method of claim 1 , wherein at least two of the plurality of depths of focus vertically overlap.4. The method of claim 1 , wherein the plurality of depths of focus comprise a first depth of focus centered at a first point over the substrate and a second depth of focus centered at a second point directly over the first point.5. The method of claim 1 , wherein the electromagnetic radiation exposes the photosensitive material to a same pattern at each of the plurality of depths of focus.6. The method of claim 1 , wherein the plurality of depths of focus collectively expose the photosensitive material over a cumulative depth of focus that is larger than any one of the plurality of depths ...

Electrostatic registration for contact printing

Development device and method

Copying machine

Radiation sensitive resin composition

A plastic composite is disclosed. The plastic composite properly resists a resolution at a non-exposure portion, and increases the intensity of the transparency at an exposure portion.

Photographic printer and method for improving illuminance of photographic printer

(57)【要約】 【課題】 写真プリンタの照度均一性の改良方法の提 供。 【解決手段】 原画像位置および原画像位置を照明する 光源６を有する写真プリンタの一様でない照度を改良す る方法であって、光源６は原画像位置を不均一に照明す ることが可能であり、写真要素を光源６に露光させ、要 素２２を処理し、光源６と原画像位置との間のフィルタ リング位置における光源６のネガ画像を形成することに よってマスク１８ａ，１８ｂ，１８ｃを形成する段階 と、マスク１８ａ，１８ｂ，１８ｃをフィルタリング位 置に配置する段階とを含む。

A printing apparatus using a liquid crystal display device and a method for fabricating a printing film using a liquid crystal display device

본 발명은 출판인쇄 공정의 제조비용 및 시간을 획기적으로 줄이고, 인쇄품질을 향상시킬 수 있는 액정표시장치를 이용한 출판인쇄장치 및 액정표시장치를 이용한 인쇄용 필름 제작방법에 관한 것으로, 광을 출사하는 노광기와; 상기 노광기로부터 출사된 광을 제공받아, 표시부에 표현되는 영상에 따라 상기 광의 광량을 조절하여 출사하는 액정표시패널과; 상기 액정표시패널로부터 조절된 광을 전달받아, 상기 액정표시패널의 표시부에 표현된 영상에 대한 패턴이 형성되는 R, G, B 필름을 포함하여 구성되는 것이다. The present invention relates to a publication printing apparatus using a liquid crystal display device and a method for manufacturing a film for printing using a liquid crystal display device, which can drastically reduce the manufacturing cost and time of a publication printing process and improve print quality. Wow; A liquid crystal display panel which receives the light emitted from the exposure machine and adjusts the amount of light to be emitted according to an image displayed on the display unit; Receives the adjusted light from the liquid crystal display panel, and comprises a R, G, B film is formed a pattern for the image represented on the display unit of the liquid crystal display panel. 액정표시장치, 출판인쇄, 노광기, 원고 LCD, Published Printing, Exposure Machine, Manuscript

Movable body apparatus, exposure apparatus, device manufacturing method, flat-panel display manufacturing method, and object exchange method

반출 대상 기판 (Pa) 을 지지하는 제 1 에어 부상 유닛 (69) 의 +X 측에, 반입 대상 기판 (Pb) 을 지지하는 제 2 에어 부상 유닛 (70) 이 배치되고, 제 2 에어 부상 유닛 (70) 의 하방에 제 3 에어 부상 유닛 (75) 이 θy 방향으로 경사져 배치된다. 제 1 에어 부상 유닛 (69) 이 제 3 에어 부상 유닛 (75) 에 따라서 θy 방향으로 경사되어, 기판 (Pa) 이 제 1 에어 부상 유닛 (69) 상으로부터 제 3 에어 부상 유닛 (75) 상으로 반송된 후, 제 1 에어 부상 유닛 (69) 이 수평으로 되고, 기판 (Pb) 이 제 2 에어 부상 유닛 (70) 상으로부터 제 1 에어 부상 유닛 (69) 상으로 반송된다. 보다 상세하게는, 제 1 에어 부상 유닛 (69) 에 대한 기판의 반입 경로와 반출 경로가 상이하다. On the +X side of the first air floating unit 69 supporting the carrying-in target substrate Pa, a second air floating unit 70 supporting the carrying-in target substrate Pb is disposed, and the second air floating unit ( Below 70), the 3rd air floating unit 75 is inclined and arrange|positioned in the θy direction. The first air floating unit 69 is inclined in the θy direction along the third air floating unit 75, so that the substrate Pa is from the first air floating unit 69 to the third air floating unit 75. After being conveyed, the 1st air floating unit 69 becomes horizontal, and the board|substrate Pb is conveyed from the 2nd air floating unit 70 onto the 1st air floating unit 69. In more detail, the carrying-in route and carrying-out route of the substrate to the first air floating unit 69 are different.

Positive type resist composition and formation of mask patter using it

A mask pattern of a positive type resist compsn. is formed with trimethylsilyl-nitrile. A first resist layer is formed on a wafer for planarizing the wafer surface, add then a second resist layer is formed. The second resist layer is selectively exposed to form a pattern in that layer, and exposed portions of the layer are removed to form a mask pattern in the portions of the layer. The resist compsn. comprises a photoactive resin having phenolic OH gps., a 5-50 wt.% trimethylsilil-nitrile and an organic solvent.

UV double side irradiation device

Device for recording medium heat development

1. УСТРОЙСТВО ДЛЯ ТЕПЛОВОГО ПРОЯВЛЕНИЯ НОСИТЕЛЯ ЗАПИСИ, содержащее вращающийс  валик дл  транспортировки носител  записи в зону про влени  и подогнанный к кривизне поверхности валика нагреваемый корпус, отличающеес  тем, что, с целью повьппени  надежности, оно имеет перед нагреваемым корпусом направл ющий ненагреваемый корпус, охватывающий часть цилиндрической поверхности йалика, причем ненагреваемый корпус образует с валиком клиновидное входное отверстие. 2.Устройство по п. 1, отличающеес  тем, что ненагреваемый корпус теплоизолирован от нагреваемого . 3.Устройство по пп. 1 и 2, о т личающеес  тем, что направл юща  поверхность ненагреваемого корпуса выполнена гладкой. 4.Устройство по пп. 1-3, о т личающеес  тем,, что, с целью улучшени  эффекта охлаждени , наружна  поверхность ненагреваемого СО корпуса имеет ребра охлаждени . 5.Устройство по пп. 1-4, о т с личающеес  тем, что нагреваемьй и ненагреваемый корпусы имеют зубчатое зацепление. 00 IND со ;о 1. A DEVICE FOR THERMAL MANAGEMENT OF RECORDS MEDIA, containing a rotating roller for transporting the recording medium to the development zone and fitted to the curvature of the roller surface, a heated body, characterized in that, in order to increase reliability, it has an unheated body, covering the heated body, part of the cylindrical surface of the jalica, and the unheated body forms a wedge-shaped inlet with the roller. 2. A device according to claim 1, characterized in that the non-heated body is thermally insulated from the heated one. 3. The device according to paragraphs. 1 and 2, in that the guide surface of the non-heated body is made smooth. 4. Device on PP. 1-3, in order to improve the cooling effect, the outer surface of the non-heated hull CO has cooling fins. 5. Device on PP. 1-4, with the fact that the heated and non-heated bodies have a gearing. 00 IND with; o

Composer

(57)【要約】本公報は電子出願前の出願データであるた め要約のデータは記録されません。

Exposing device

PROCESS FOR CREATING NON-COPYABLE WRITINGS

Head-mounted single-panel stereoscopic display

단일 마이크로디스플레이 패널로부터의 이미지들을 관측자의 안구에 재조사시키기 위해 하나 이상의 액정 스위치들 및 편광빔 스플리터를 이용하는 헤드 장착형 단일 패널 디스플레이 시스템이 개시된다. 디스플레이 패널로부터 방출되는 광은 제일 먼저 편광빔 스플리터를 이용하여, 좌측 안구 및 우측 안구에서의 이미지를 각각 형성하는 두 개의 매우 유사한 광학 이미징 시스템들내로 조사된다. 입체영상(3D) 동작의 경우, 이미지가 한번에 하나의 안구에서만 보여지도록 광이 변조된다. 50Hz보다 큰 프레임율로 시순차적인 입체영상 이미지들을 각각의 안구에서 제공함으로써, 플릭커 없는 완전 해상도의 3D가 시각화될 수 있다. A head mounted single panel display system using one or more liquid crystal switches and a polarizing beam splitter to review images from a single microdisplay panel into an eye of an observer is disclosed. The light emitted from the display panel is first irradiated into two very similar optical imaging systems, each of which forms an image in the left eye and right eye using a polarization beam splitter. For stereoscopic (3D) motion, light is modulated such that the image is visible only in one eye at a time. By providing time-sequentially stereoscopic images at frame rates greater than 50 Hz in each eye, full resolution 3D without flicker can be visualized.

Image recording device

(57)【要約】本公報は電子出願前の出願データであるた め要約のデータは記録されません。

Process for the production of cinema blocks

Arrangement of command holes on moving picture strips

Direct-writing exposure machine

本发明公开了一种直写曝光机，所述直写曝光机包括：吸附平台系统；运动平台系统，所述运动平台安装于吸附平台系统；对准系统，所述对准系统安装于所述运动平台系统；电控系统，所述电控系统安装于所述运动平台系统，所述电控系统和所述对准系统电连接；曝光系统，所述曝光系统安装于所述运动平台系统，所述曝光系统和所述电控系统电连接，所述曝光系统包括多个曝光单元，相邻曝光单元之间的间距小于每个曝光单元的宽度。根据本发明实施例的直写曝光机能够一次扫描成型，具有生产效率高、产品质量好等优点。

Exposure apparatus and exposure method, flat panel display manufacturing method and device manufacturing method

Heating device and thermal developing device

(57)【要約】 【課題】 熱膨張に起因する加熱不良を除去し、熱現像 ムラの無い良好な熱現像性能を有するとともに、大判印 刷版でも処理可能な加熱装置並びに該加熱装置を備える 熱現像装置を提供する。 【解決手段】 加圧接触部Ｐを備える加熱装置１におい て、印刷原版１０の金属支持体の厚さをＤ〔ｍｍ〕とし た時、金属支持体の加圧接触部Ｐでの進行方向Ａにおけ る熱膨張量ｄｌ〔ｍｍ〕がｄｌ＜０．１３／Ｄ〔ｍｍ〕 を満足するように、関係式（１）：ｌ 0 ＝ｄｌ／（α・ ｄＴ） ここで、ｌ 0 ：加圧接触部の進行方向長 ｄＴ：昇温温度 α：金属支持体の熱膨張率 から加圧接触部Ｐの進行方向長ｌ 0 を設定した加熱装置 １。

Contact printing

Contact-procetion printer

Image recorder

Conveyor device for changing the direction of movement of flat objects by 90 degrees in their plane

Mosaic splices product splice region method of adjustment and device

本发明涉及一种马赛克拼接产品拼接区调整方法及装置。该马赛克拼接产品拼接区调整方法包括：步骤10、在曝光机台坐标系中补正光罩的长度尺寸；步骤20、在曝光机台坐标系中选定影响长度尺寸的照射并固定其坐标，使其成为不可移动的照射；对于拼接成一个整体的面板的多个照射，以其中不可移动的照射为参照，调整其余可移动的照射的坐标以使相邻的照射的拼接处实现无缝接合。本发明还提供了一种马赛克拼接产品拼接区调整装置。本发明马赛克拼接产品拼接区调整方法及装置由于采用针对马赛克拼接产品的新的优化手法，使得拼接产品的亮暗不均得到控制；也使得面板的首件完成时间大幅缩短。

Thermal photographic development machine - has heat source outside roller driving sheet developed

The machine has a fixed support on which there are mounted a device printing the sensitive sheet using a source of actinic light, an insertion and slide track for the sensitive sheet, a motor-driven sheet driving roller downstream of the printing device, and a thermostat controlling the temperature of the heat source. The latter (12) is mounted outside the roller (1) driving the sheet (2), close to the emulsioned face of the sheet and along the path it travels after printing, so as to reheat and develope it. The source can be in the form of an electrical resistance, there being a cloth of electrically insulating material between it and the sheet.

Direct photographic reproducer with support platform - has upper transparent plate and lower multilayer support producing sprung upwardly directed force

Direct photographic reproduction from a large drawing or similar is completed by a machine with an illumination unit with a support platform, extending into it. A feed system with a continuous drive band feeds a film surface and an original into the unit. A take-up device with an opening receives the front edge of the film and the drawing/original. An upper transparent plate and a lower multi-layer support device are provided such that a sprung, upwardly directed force is produced to hold the film and original together. A pliable intermediate element is provided in the support device as is an upper layer of relatively low frictional coefficient.

Advanced camera for photographic prints

Printing device for photographic prints

Frame mask for photographic prints

Advanced press frame for photographic printers

Portable photographic processing tank - with means for closing duct between integral reservoir and tank

The processing tank has reservoirs (6, 7) for processing fluid, separated from the development tank (4) with ducts allowing the fluid to flow into the tank (4) after the film to be developed has been placed in the latter. The tank may be formed from three separate cylinders (1, 2, 4), coupled together by bayonet fastenings (3), with the inner cylinder comprising the tank (4) and containing a film support (5) and the outer two cylinders (1, 2) the respective reservoirs for the developer and fixer. The two reservoirs (1,2) can be brought into communication with the tank (4) by unscrewing obstruction means (12, 13) for the flow ducts (10, 11). The processing liquid can be returned to the appropriate reservoir by inverting the tank.

PHOTOGRAPHIC MOUNTING AND DRAWING APPARATUS FOR MANUFACTURING PRINTING PLATES

L'INVENTION CONCERNE UNE MACHINE DE PHOTOCOMPOSITION. ELLE SE RAPPORTE A UNE MACHINE AYANT UNE TABLE 25 QUI A UNE POSITION INCLINEE FIXE, FAISANT PAR EXEMPLE UN ANGLE DE 30 AVEC LA VERTICALE. L'ENSEMBLE35 COMPRENANT LE SUPPORT DE FILM ET UNE LAMPE, EST MOBILE LONGITUDINALEMENT ET TRANSVERSALEMENT PARRAPPORT A LA TABLE DE MANIERE CLASSIQUE. LA TABLE COMPORTE DES DISPOSITIFS D'ASPIRATION ET DES ERGOTS DE POSITIONNEMENT QUI PEUVENT ETRE SELECTIVEMENT EFFACES DANS L'EPAISSEUR DE LA TABLE. APPLICATION A LA FABRICATION DES CLICHES LITHOGRAPHIQUES. THE INVENTION RELATES TO A PHOTOCOMPOSITION MACHINE. IT RELATES TO A MACHINE HAVING A TABLE 25 WHICH HAS A FIXED INCLINED POSITION, FOR EXAMPLE MAKING AN ANGLE OF 30 WITH THE VERTICAL. THE ASSEMBLY 35, INCLUDING THE FILM HOLDER AND A LAMP, IS LONGITUDINALLY MOBILE AND TRANSVERSALLY BY RELATION TO THE TABLE IN A CLASSIC MANNER. THE TABLE INCLUDES SUCTION DEVICES AND POSITIONING SNAPS WHICH CAN BE SELECTIVELY ERASED IN THE THICKNESS OF THE TABLE. APPLICATION TO THE MANUFACTURE OF LITHOGRAPHIC CLICHES.

Continuous, projection-shooting machine for cinematographic films

Printer for obtaining, frame by frame, positive short films

Photographic printer

Heliographic reproduction machine

Device for holding plates of photosensitive resin with a view to their exposure to ultraviolet light, and exposure machine fitted with this device

Device for holding plates of photosensitive resin with a view to their exposure to ultraviolet light, and exposure machine fitted with this device. The device, which is used alone, or which is fitted to the machine, comprises a glass plate 1, having a working zone 5 whose surface state is granular, obtained by sand blasting, surrounding by a perimeter strip 7, with a smooth surface, whereas suction orifices 11' connected to a vacuum source open at the edge of the working zone 5, in order to produce a vacuum therein when the combination of the glass plate carrying a photopolymer plate is covered with a flexible sheet of transparent material.

CHASSIS-PRESS FOR THE REPRODUCTION OF PHOTOGRAPHIC PHOTOGRAPHS

UN CHASSIS-PRESSE COMPREND UNE PLAQUE DE VERRE 21 BORDEE PAR DEUX BAGUETTES 22 ET UN SOCLE 11 RELIE PAR UNE ARTICULATION A CHARNIERE A L'UNE AU MOINS DES BAGUETTES 22. CETTE ARTICULATION EST DEMONTABLE DE FACON QUE, GRACE A DES TIGES 30 ADAPTABLES AUX BAGUETTES 22, LA PLAQUE DE VERRE 21 PUISSE ETRE UTILISEE EN TABLE DE PHOTOMONTAGE AVANT LES TIGES 30 COMME PIEDS. A CHASSIS-PRESS CONSISTS OF A GLASS PLATE 21 EDGED BY TWO RODS 22 AND A BASE 11 CONNECTED BY A HINGED JOINT TO AT LEAST ONE OF THE RODS 22. THIS JOINT IS REMOVABLE IN A WAY, THANKS TO RODS 30 ADAPTABLE TO THE BAGUETTES 22, THE GLASS PLATE 21 CAN BE USED AS A PHOTOMONTAGE TABLE BEFORE THE RODS 30 AS THE FEET.

Combination switch counter for photographic prints

Apparatus for printing photographic strips

Pattern reproduction table

PATTERN REPRODUCTION TABLE ABSTRACT OF THE DISCLOSURE A pattern reproduction table incorporates a support grid which supports a transparent perforated sheet above a plurality of lamps. The support grid comprises a plurality of thin polished longitudinal and transverse members which are interlocked and which are mounted in tension on an enclosure. The support grid provides rigid support for the transparent perforated sheet without obscuring the lamps or interfering with a vacuum blower which is mounted in the enclosure.

Apparatus for printing photographic prints on gelatin-bromide paper

Method and apparatus for making copies

Machine for contact reproduction of images formed on transparent supports, in particular on photographic negatives and slides

La machine de reproduction, par contact, selon l'invention comprend un premier boîtier étanche à la lumière 11 renfermant une première bobine contenant un film photographique vierge; un second boîtier étanche à la lumière 19 renfermant une seconde bobine destinée à recevoir le film provenant de la première bobine; un plateau 6 apte à former une surface d'appui pour la partie de film qui s'étend entre la première et la seconde bobines; un châssis 8 apte à recevoir un support transparent portant au moins une image, ce châssis étant monté pivotant entre une position inactive dans laquelle il maintient le support transparent à distance de la partie de film reposant sur le plateau 6 et une position active dans laquelle il applique le support transparent contre ladite partie de film reposant sur le plateau; et une source lumineuse 10 apte à impressionner le film à travers le support transparent.

Printing frame for photographic prints

Camera with internal light source and press frame for printing photographic prints

Rotating tube heliographic machine

Photographic printer

Machine to reproduce plans

Device for photographic printing of postcards

Improvements to photographic frame presses

Frame press

Photographic printer

Film printer

Proof printing process for obtaining photographs in large quantities

Electric press for printing photographic prints

Copy apparatus using chemical flashlamp

COPY APPARATUS USING CHEMICAL FLASHLAMP ABSTRACT A portable low-cost copier comprises a housing having a bottom surface at which a photosensitized sheet and an original can be disposed. Disposed within the housing is a chemical flashlamp which is ignited to make the copy.

Patent FR2338211B1

Improvements to cameras for photographic prints

Method for copying films, and device for its implementation

PHOTOGRAPHIC TESTING APPARATUS

Machine for photographic printing

Apparatus for printing photographic prints on gelatin-bromide paper

Improvement in photographic printers

Improvements to photographic printers

Patent FR2328221B1

Selection printer for photocopying

MACHINE FOR THE REPRODUCTION, BY CONTACT, OF IMAGES FORMED ON TRANSPARENT MEDIA, ESPECIALLY ON PHOTOGRAPHIC NEGATIVES AND SLIDES

Contact photographic printing device

Device for the development of photo prints by heat

Improved method and apparatus for photographic prints

Patent FR2080299A5

Apparatus for thermal development of photographic materials

FILM DEVELOPMENT AND FIXING EQUIPMENT

AUTOMATIC CARRIER OF MICROSHEET MATERIALS

Further training in cinematographic printers

Photographic printer

Light knurling

Improvements to photographic printers

Camera for photographic printing

Patent FR760702A

Photographic printer

Photographic printer for small originals

Motion picture continuous film machine

Repeated and repeated photographic printing apparatus

Electrostatic support for documents, or original holder, and its production method

Apparatus for printing photographic reproductions