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Небесная энциклопедия

Космические корабли и станции, автоматические КА и методы их проектирования, бортовые комплексы управления, системы и средства жизнеобеспечения, особенности технологии производства ракетно-космических систем

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Мониторинг СМИ

Мониторинг СМИ и социальных сетей. Сканирование интернета, новостных сайтов, специализированных контентных площадок на базе мессенджеров. Гибкие настройки фильтров и первоначальных источников.

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Форма поиска

Поддерживает ввод нескольких поисковых фраз (по одной на строку). При поиске обеспечивает поддержку морфологии русского и английского языка
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Применить Всего найдено 20411. Отображено 100.
16-02-2012 дата публикации

Method and system for removal of films from peripheral portions of a substrate

Номер: US20120037593A1
Автор: Kazuhito Shigemori, Masashi Kanaoka, Shuichi Yasuda, Tadashi Miyagi, Tetsuya Hamada
Принадлежит: Screen Semiconductor Solutions Co Ltd

A substrate processing apparatus includes an anti-reflection film processing block, a resist film processing block, and a resist cover film processing block. In the processing blocks, an anti-reflection film, a resist film, and a resist cover film are formed on a substrate, respectively. Additionally, a film formed at a peripheral edge of the substrate is removed. The film formed at the peripheral edge of the substrate is removed by supplying a removal liquid capable of dissolving and removing the film to the peripheral edge of the substrate during rotation. When the peripheral edge of the film is removed, the position of the substrate is corrected such that the center of the substrate coincides with the center of a rotation shaft.

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Номер записи: 1
23-02-2012 дата публикации

Developers and method of coloring lithographic printing members

Номер: US20120045720A1
Автор: Eynat Matzner, Ilan Levi, Moshe Marom, Murray Figov, Ruizheng Wang
Принадлежит: Individual

A color contrast image in imaged lithographic printing precursors can be obtained by contacting the imaged precursor with a coloration solution containing a colorless form of a photochromic compound. Residual amounts of this compound attached to the oleophilic surface of the imaged precursor can be changed to its colored form when exposed to UV light. The coloration solution can be an alkaline or acidic developer or an alkaline or acidic solution used separately after development. The coloration solution can also be a gum solution.

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Номер записи: 2
01-03-2012 дата публикации

Image forming material, planographic printing plate precursor, and method for manufacturing a planographic printing plate

Номер: US20120052445A1
Автор: Noriaki Watanabe, Shigefumi Kanchiku, Shigekatsu Fujii, Yoshinori Taguchi
Принадлежит: Fujifilm Corp

The invention provides an infrared-sensitive positive-working image forming material which provides excellent development latitude, image formability and image region strength, and in which decrease in development property is prevented even when a certain time has passed after pattern exposure until development treatment; an infrared-sensitive positive-working planographic printing plate precursor which is formed from the image forming material and has excellent image formability and image region printing durability; and a method for manufacturing a planographic printing plate using the planographic printing plate precursor. The image forming material includes; on a support, a lower layer containing a polymer having carboxylic acid groups at side chains thereof, at least a part of the carboxylic acid groups forming a salt structure with a monovalent basic compound, and an infrared absorbing agent; and an upper layer whose solubility to aqueous alkaline solution is increased by heat, in this order.

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Номер записи: 3
08-03-2012 дата публикации

Pattern formation method

Номер: US20120058435A1
Автор: Yukiko Kikuchi, Yuriko Seino
Принадлежит: Individual

According to one embodiment, a pattern formation method contains: forming first guides by changing a surface energy of an underlayer material by transferring a pattern of a photomask onto the underlayer material by exposure, and forming second guides by changing the surface energy of the underlayer material between the first guides by diffraction of exposure light generated from the exposure; applying a block copolymer containing a plurality of types of polymer block chains onto the underlayer material; and causing any one of the polymer block chains to form a pattern in accordance with the first and second guides by microphase separation of the block copolymer by a heat treatment.

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Номер записи: 4
19-04-2012 дата публикации

System and method of vapor deposition

Номер: US20120090547A1
Автор: Chien-Wei Wang, Ching-Yu Chang, David Ding-Chung Lu
Принадлежит: Taiwan Semiconductor Manufacturing Co TSMC Ltd

Provided is a system for vapor deposition of a coating material onto a semiconductor substrate. The system includes a chemical supply chamber, a supply nozzle operable to dispense vapor, and a heating element operable to provide heat to a substrate in-situ with the dispensing of vapor. The system may further include reaction chamber(s) and/or mixing chamber(s).

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Номер записи: 5
03-05-2012 дата публикации

Vaporizing polymer spray deposition system

Номер: US20120108040A1
Автор: Ching-Yu Chang, Kuei-Liang Lu, Ming-Feng Shieh
Принадлежит: Taiwan Semiconductor Manufacturing Co TSMC Ltd

A vaporizing spray deposition device for forming a thin film includes a processing chamber, a fluid line, and a spray head coupled to the fluid line proximate the processing chamber. The fluid line is configured to transfer a polymer fluid and solvent mixture to the spray head. The spray head is configured to receive the polymer fluid and solvent mixture and to atomize the polymer fluid and solvent mixture to emit it in a substantially vaporized form to be deposited on a surface and thereby forming a thin film of the polymer on the surface after evaporation of the solvent. In an embodiment, the vaporizing spray deposition device may include a heating device to perform a hard bake process on the polymer. In an embodiment, the vaporizing spray deposition device may be configured to provide a post deposition solvent spray trim process to the thin film polymer.

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Номер записи: 6
10-05-2012 дата публикации

Processless Development of Printing Plate

Номер: US20120111214A1
Автор: Howard A. Fromson, William J. Rozell, William J. Ryan
Принадлежит: Anocoil Corp

On-press development of an imaged printing plate on a plate cylinder, in which ink is applied by an ink form roll, a blanket roll is in contact with the plate, a rubber roll is opposed to the blanket roll, and printable media passes between the blanket roll and the rubber roll. The plate comprises a substrate carrying an imaged coating and nonimage areas. The respective cohesive and adhesive properties of the nonimage and image areas to the applied ink, substrate, blanket roll and printable medium, and the ink to the roll are such that the blanket roll pulls the ink from the plate and the ink pulls the nonimage areas from the substrate as undissolved particles that are transferred by the blanket with the ink to the printable media.

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Номер записи: 7
31-05-2012 дата публикации

Device and method for coating a micro- and/or nano-structured structural substrate and coated structural substrate

Номер: US20120135143A1
Автор: Erich Thallner
Принадлежит: Individual

The present invention relates to a device and a method for coating a microstructured and/or nanostructured structured substrate. According to the present invention, the coating is performed in a vacuum chamber. The pressure level in the vacuum chamber is elevated during or after the charging of the vacuum chamber with coating substance.

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Номер записи: 8
31-05-2012 дата публикации

Coating treatment method, computer-readable storage medium, and coating treatment apparatus

Номер: US20120135358A1
Автор: Takashi Tanaka
Принадлежит: Tokyo Electron Ltd

A substrate is first rotated at a first rotation speed, and a resist solution is applied. Rotation of the substrate is decelerated to a second rotation speed lower than the first rotation speed so that the substrate is rotated at the low speed to smooth the resist solution on the substrate. Rotation of the substrate is then accelerated to a third rotation speed higher than the second rotation speed, and a solvent for the coating solution and/or a dry gas are/is supplied to the resist solution on the substrate. The solvent gas is supplied to a portion of the resist solution on the substrate thicker than a set thickness, and the dry gas is supplied to a portion of the coating solution on the substrate thinner than the set thickness. This thins the thicker portion of the resist solution and thickens the thinner portion to uniform the resist solution.

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Номер записи: 9
07-06-2012 дата публикации

Composition for forming resist underlayer film for lithography including resin containing alicyclic ring and aromatic ring

Номер: US20120142195A1
Автор: Hirokazu Nishimaki, Keisuke Hashimoto, Tetsuya Shinjo, Yasushi Sakaida
Принадлежит: Nissan Chemical Corp

There is provided a resist underlayer film having both heat resistance and etching selectivity. A composition for forming a resist underlayer film for lithography, comprising a reaction product (C) of an alicyclic epoxy polymer (A) with a condensed-ring aromatic carboxylic acid and monocyclic aromatic carboxylic acid (B). The alicyclic epoxy polymer (A) may include a repeating structural unit of Formula (1): (T is a repeating unit structure containing an alicyclic ring in the polymer main chain; and E is an epoxy group or an organic group containing an epoxy group). The condensed-ring aromatic carboxylic acid and monocyclic aromatic carboxylic acid (B) may include a condensed-ring aromatic carboxylic acid (B1) and a monocyclic aromatic carboxylic acid (B2) in a molar ratio of B1:B2=3:7 to 7:3. The condensed-ring aromatic carboxylic acid (B1) may be 9-anthracenecarboxylic acid and the monocyclic aromatic carboxylic acid (B2) may be benzoic acid.

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Номер записи: 10
28-06-2012 дата публикации

Color liquid crystal display device

Номер: US20120162575A1
Автор: Bo-Hsuan Lin, Chung-En CHENG, Jung-Pin Hsu
Принадлежит: Chi Mei Corp

A color liquid crystal display device includes a liquid crystal display element and a backlight unit. The liquid crystal display element includes a color filter having a red filter segment, a green filter segment, and a blue filter segment. The blue filter segment is prepared from blue photosensitive resin composition. The blue photosensitive resin composition includes a pigment combination, an alkali-soluble resin, a compound having an ethylenic group, and a photoinitiator. The pigment combination includes a copper phthalocyanine-based blue pigment. The color filter has a z value ranging from 0.3 to 0.5 in a chromaticity diagram of a XYZ color system. The backlight unit is coupled to the liquid crystal display element and has a color temperature ranging from 8,000 K to 20,000 K.

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Номер записи: 11
19-07-2012 дата публикации

Colored curable composition, color filter, and method for producing color filter

Номер: US20120182638A1
Автор: Hideki Takakuwa
Принадлежит: Fujifilm Corp

A colored curable composition for a solid-state image sensor comprises a polyhalogenated zinc phthalocyanine pigment, and a compound having at least a structure represented by the following Formula (A). In Formula (A), X 1 , X 2 , X 3 , X 4 , X 5 , and X 6 each independently represent a substituent selected from —OH, —OR, or —NHCOCH═CH 2 , R represents a monovalent organic group. When the compound is an oligomer, the oligomer has a configuration in which at least one of X 1 , X 2 , X 3 , X 4 , X 5 , and X 6 in a structure represented by Formula (A) is eliminated to form a single bond, which is then linked, via —O—, to another structure represented by Formula (A).

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Номер записи: 12
26-07-2012 дата публикации

Coating treatment apparatus, coating treatment method, and non-transitory computer storage medium

Номер: US20120189773A1
Автор: Akira Nishiya, Kouzou Tachibana, Takahisa OTSUKA
Принадлежит: Tokyo Electron Ltd

A coating treatment apparatus includes: a rotating and holding part; a nozzle supplying a coating solution; a moving mechanism moving the nozzle; and a control unit that controls the rotating and holding part, the nozzle, and the moving mechanism to supply the coating solution onto a central portion of the substrate and rotate the substrate at a first rotation speed, then move a supply position of the coating solution from a central position toward an eccentric position of the substrate with the substrate being rotated at a second rotation speed lower than the first rotation speed while continuing supply of the coating solution, then stop the supply of the coating solution with the rotation speed of the substrate decreased to a third rotation speed lower than the second rotation speed, and then increase the rotation speed of the substrate to be higher than the third rotation speed.

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Номер записи: 13
04-10-2012 дата публикации

Composition for forming photosensitive resist underlayer film

Номер: US20120251950A1
Автор: Hirokazu Nishimaki, Makiko Umezaki, Noriaki Fujitani, Takahiro Hamada, Takahiro Kishioka, Yusuke Horiguchi
Принадлежит: Nissan Chemical Corp

A composition for forming a resist underlayer film to be used in a lithography process, that includes: a polymer containing unit structures of Formula (1), Formula (2), and Formula (3): the polymer being a polymer in which the unit structure of Formula (1) has a ratio of mole number (a) within a range of 0.20≦a≦0.90, the unit structure of Formula (2) has a ratio of mole number (b) within a range of 0.05≦b≦0.60, and the unit structure of Formula (3) has a ratio of mole number (c) within a range of 0.001≦c≦0.40, when a total mole number of all unit structures constituting the polymer is 1.0, and the polymer having a weight average molecular weight of 3,000 to 100,000; a crosslinkable compound; a photoacid generator; and a solvent.

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Номер записи: 14
25-10-2012 дата публикации

Photosensitive composition and method of manufacturing a substrate for a display device using the same

Номер: US20120270142A1
Автор: Byung-Uk Kim, Cha-Dong KIM, Hi-Kuk Lee, Hyoc-Min Youn, Jin-Sun Kim, Jung-In Park, Sang-Hoon Lee, Sang-Hyun Yun, Su-Yeon Sim, Tae-hoon YEO
Принадлежит: SAMSUNG ELECTRONICS CO LTD

A photosensitive composition and a method of manufacturing a substrate used for a display device are disclosed. The photosensitive composition includes an acrylic based copolymer, a photo-initiator, a photo-sensitizer and a solvent. Thus, a photosensitivity of the photosensitive composition for ultra violet light of a long wavelength may be improved.

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Номер записи: 15
08-11-2012 дата публикации

Immersion upper layer film forming composition and method of forming photoresist pattern

Номер: US20120282553A1
Автор: Atsushi Nakamura, Hiroaki Nemoto, Hiroki Nakagawa, Takashi Chiba, Tomohiro Utaka, Toru Kimura, Yukio Nishimura
Принадлежит: JSR Corp

An immersion upper layer film composition includes a resin and a solvent. The resin forms a water-stable film during irradiation and is dissolved in a subsequent developer. The solvent contains a monovalent alcohol having 6 or less carbon atoms. The composition is to be applied to form a coat on a photoresist film in an immersion exposure process in which the photoresist film is irradiated through water provided between a lens and the photoresist film.

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Номер записи: 16
06-12-2012 дата публикации

Wet lamination of photopolymerizable dry films onto substrates and compositions relating thereto

Номер: US20120308929A1
Автор: Pedro Goncalo Carvalhais Teixeira Dias Jorge, Shinji Yu
Принадлежит: EI Du Pont de Nemours and Co

The invention is directed to a lamination fluid useful in processes for wet laminating a photopolymerizable film onto circuit board panels or other substrates. The lamination system comprises 1) a dry film photoresist, 2) a laminate comprising i) copper ii) stainless steel iii) non metal on a surface, 3) a lamination fluid and 4) fluid application device on the laminates. The lamination fluid comprises water and a surface energy modification agent. The surface energy modification agent is present in a range between 0.0001 and 3.0 moles/liter, and the pH of the fluid is between 3 and 11.

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Номер записи: 17
24-01-2013 дата публикации

Semiconductor device manufacturing method and semiconductor device manufacturing apparatus

Номер: US20130023117A1
Автор: Masanori Shindou
Принадлежит: Lapis Semiconductor Co Ltd

A method of manufacturing a semiconductor device includes: preparing a wafer member, the wafer member including a wafer, a conductive layer formed on a surface of the wafer and a negative photoresist formed on the conductive layer; applying a light blocking material so as to cover at least a part of an outer edge of the wafer member from an upper surface of the negative photoresist to a side surface of the negative photoresist; exposing the negative photoresist to exposure light; removing the light blocking material; and developing the negative photoresist.

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Номер записи: 18
25-04-2013 дата публикации

METHOD FOR FORMING RESIST PATTERN, AND COMPOSITION FOR FORMING RESIST UNDERLAYER FILM

Номер: US20130101942A1
Автор: MINEGISHI Shinya, MORI Takashi, SEKO Tomoaki, SUZUKI Jyunya, TAKANASHI Kazunori, Tanaka Hiromitsu
Принадлежит: JSR Corporation

A resist pattern-forming method capable of forming a resist pattern excellent in pattern collapse resistance in the case of development with the organic solvent in multilayer resist processes. The method has the steps of: (1) providing a resist underlayer film on a substrate using a composition for forming a resist underlayer film; (2) providing a resist film on the resist underlayer film using a photoresist composition; (3) exposing the resist film; and (4) developing the exposed resist film using a developer solution containing no less than 80% by mass of an organic solvent, in which the composition for forming a resist underlayer film contains (A) a component that includes a polysiloxane chain and that has a carboxyl group, a group that can generate a carboxyl group by an action of an acid, an acid anhydride group or a combination thereof. 1. A resist pattern-forming method comprising:(1) providing a resist underlayer film on a substrate using a composition for forming a resist underlayer film;(2) providing a resist film on the resist underlayer film using a photoresist composition;(3) exposing the resist film; and wherein the composition for forming a resist underlayer film comprises:', '(A) a component that includes a polysiloxane chain and that has a carboxyl group, a group that can generate a carboxyl group by an action of an acid, an acid anhydride group or a combination thereof., '(4) developing the exposed resist film using a developer solution comprising no less than 80% by mass of an organic solvent,'}2. The resist pattern-forming method according to claim 1 , wherein the component (A) comprises:(a) a polysiloxane that has a carboxyl group, a group that can generate a carboxyl group by an action of an acid, an acid anhydride group or a combination thereof.3. The resist pattern-forming method according to claim 1 , wherein the component (A) comprises:(b) a vinyl polymer that has a carboxyl group, a group that can generate a carboxyl group by an action of ...

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Номер записи: 19
30-05-2013 дата публикации

DYE COMPOUND, METHOD OF PRODUCING DIPYRROMETHENE METAL COMPLEX COMPOUND, METHOD OF PRODUCING DYE MULTIMER, SUBSTITUTED PYRROLE COMPOUND, COLORED CURABLE COMPOSITION, COLOR FILTER, METHOD OF PRODUCING COLOR FILTER, SOLID-STATE IMAGE SENSOR AND LIQUID CRYSTAL DISPLAY DEVICE

Номер: US20130137018A1
Автор: ARAYAMA Kyohei, GOTO Akiyoshi, IDEI Hiroaki, KANNA Shinichi, USHIJIMA Kenta
Принадлежит: FUJIFILM Corporation

The invention provides a dye compound having a partial structure represented by the following formula (5): 3. The dye compound according to claim 1 , wherein Dye in formula (5) is a residual group of a dye compound selected from the group consisting of an azo dye claim 1 , an azomethine dye claim 1 , a dipyrromethene dye claim 1 , a quinone dye claim 1 , a carbonium dye claim 1 , a quinoneimine dye claim 1 , an azine dye claim 1 , a polymethine dye claim 1 , a quinophthalone dye claim 1 , a phthalocyanine dye claim 1 , a perinone dye claim 1 , an indigo dye claim 1 , a thioindigo dye claim 1 , a quinoline dye claim 1 , a nitro dye claim 1 , a nitroso dye and a metal complex compound of these dyes.4. The dye compound according to claim 1 , wherein Dye in formula (5) is a residual group of a dipyrromethene compound or a residual group of a dipyrromethene metal complex compound obtained from the dipyrromethene compound and a metal or a metal compound.7. The dye compound according to claim 6 , wherein each of Rand Rin formula (8) independently represents a monovalent substituent group having an −Es′ value as a steric parameter of 1.5 or more.8. The dye compound according to claim 1 , further comprising a polymerizable group.9. The dye compound according to claim 6 , wherein Ma in formula (7) or formula (8) is any one of Zn claim 6 , Co claim 6 , V═O or Cu.10. The dye compound according to claim 6 , wherein Ma in formula (7) or formula (8) is Zn.11. The dye compound according to claim 1 , further comprising an alkali soluble group.12. A dye compound claim 1 , which is a dye multimer claim 1 , comprising claim 1 , as a partial structure of a dye moiety claim 1 , a group obtained by removing 1 to 10 hydrogen atoms from the dye compound according to .15. The dye compound according to claim 14 , further comprising claim 14 , as a copolymerization component claim 14 , a monomer having a different structure from the structure of the dye monomer represented by formula (1) and ...

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Номер записи: 20
30-05-2013 дата публикации

Method of pre-treating a wafer surface before applying a solvent-containing material thereon

Номер: US20130137034A1
Автор: Chi-Hua FU, Chung-Cheng Wang
Принадлежит: Taiwan Semiconductor Manufacturing Co TSMC Ltd

A method for pre-treating a wafer surface before applying a material thereon. The method includes positioning the wafer on a rotating apparatus. The wafer is rotated at a first rotational speed between about 50 revolutions per minute (rpm) and about 300 rpm and for a period of about 1 second to about 10 seconds while dispensing a cleaning solvent on the wafer surface. The wafer is rotated at a second rotational speed between about 500 rpm and about 1,500 rpm for a period of about 1 second to about 10 seconds. The wafer is then rotated at a third rotational speed between about 50 rpm and about 300 rpm for a period of about 1 second to about 5 seconds. With the wafer rotating at the third rotational speed, a solvent-containing material is thereafter deposited on the surface of the wafer.

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Номер записи: 21
06-06-2013 дата публикации

Etch resistant alumina based coatings

Номер: US20130143408A1
Автор: David A. Thomas, Juha T Rantala, Thomas GÄDDA, Wei-Min Li, William McLaughlin
Принадлежит: SILECS OY

Method of forming a protective hard mask layer on a substrate in a semiconductor etch process, comprising the step of applying by solution deposition on the substrate a solution or colloidal dispersion of an alumina polymer, said solution or dispersion being obtained by hydrolysis and condensation of monomers of at least one aluminium oxide precursor in a solvent or a solvent mixture in the presence of water and a catalyst. The invention can be used for making a hard mask in a TSV process to form a high aspect ratio via a structure on a semiconductor substrate.

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Номер записи: 22
13-06-2013 дата публикации

Method for Functionalising Fluid Lines Contained in a Micromechanical Device, Micromechanical Device Including Functionalised Lines, and Method for Manufacturing Same

Номер: US20130149196A1
Автор: AGACHE Vincent, Hoang Antoine, Vinet Francoise
Принадлежит: COMMISSARIAT A L'ENERGIE ATOMIQUE ET AUX ENGERGIES ALTERNATIVES

The present invention relates to a method for functionalising fluid lines () in a micromechanical device, the walls of which include an opaque layer. For this purpose, the invention provides a method for functionalising a micromechanical device provided with a fluid line including a peripheral wall () having a surface () outside the line and an inner surface () defining a space () in which a fluid can circulate, the peripheral wall at least partially including a silicon layer (). The method includes the following steps: a) providing a device, the peripheral wall () of which at least partially includes a silicon layer () having, at least locally, a thickness (e) of more than 100 nm and less than 200 nm, advantageously of 160 to 180 nm; c) silanising at least the inner surface of the fluid line; d) the localised, selective photo-deprotection on at least the inner surface of the silanised device by exposing the peripheral wall () at the point at which said wall has a thickness (e) of more than 100 nm and less than 200 nm, advantageously of 160 to 180 nm. 1. A method for functionalizing a micromechanical device provided with a fluid line comprising a peripheral wall having a surface external to the line and an internal surface delimiting a space in which a fluid can circulate , the peripheral wall comprising at least partially a layer of silicon , wherein the method comprises the following steps:a) the provision of a device whose peripheral wall at least partially comprises a layer of silicon having, at least locally, a thickness (e) of between 100 and 200 nm exclusive,c) the silanization of at least the internal surface of the fluid line,d) the localized and selective photodeprotection on at least the internal surface of the silanized device by insolation of the peripheral wall at the point where it has a thickness (e) of between 100 and 200 nm exclusive.2. The method as claimed in claim 1 , comprising a step b) of hydration of at least the internal surface of the ...

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Номер записи: 23
20-06-2013 дата публикации

RESIN COMPOSITION, RESIST UNDERLAYER FILM, RESIST UNDERLAYER FILM-FORMING METHOD AND PATTERN-FORMING METHOD

Номер: US20130153535A1
Автор: KOUMURA Kazuhiko, MATSUMURA Yuushi, MIZOGUCHI Katsuhisa, Motonari Masayuki, Murakami Satoru, NAKAFUJI Shin-ya
Принадлежит: JSR Corporation

A resin composition for forming a resist underlayer film includes a resin that includes an aromatic ring, and a crosslinking agent having a partial structure represented by a following formula (i). X represents an oxygen atom, a sulfur atom, *—COO— or —NR—. Rrepresents a hydrogen atom or a Cmonovalent hydrocarbon group. Rrepresents a hydroxy group, a sulfanil group, a cyano group, a nitro group, a Cmonovalent hydrocarbon group, a Cmonovalent oxyhydrocarbon group or a Cmonovalent sulfanilhydrocarbon group. p is an integer of 1 to 3. 3. The resin composition according to claim 1 , wherein the resin is a novolak resin claim 1 , a resol resin claim 1 , an acenaphthylene resin claim 1 , a styrene resin claim 1 , a polyarylene resin claim 1 , or a combination thereof.4. The resin composition according to claim 1 , further comprising a solvent.5. A resist underlayer film formed from the resin composition according to .6. A resist underlayer film-forming method comprising:{'claim-ref': {'@idref': 'CLM-00001', 'claim 1'}, 'providing a coating film using the resin composition according to ; and'}heating the coating film.7. A pattern-forming method comprising:{'claim-ref': {'@idref': 'CLM-00001', 'claim 1'}, 'providing a resist underlayer film on an upper face side of a substrate using the resin composition according to ;'}providing a resist film on an upper face side of the resist underlayer film using a resist composition;exposing the resist film;developing the exposed resist film to form a resist pattern; andsequentially dry etching the resist underlayer film and the substrate using the resist pattern as a mask. The present application claims priority under 35 U.S.C. §119 to Japanese Patent Application No. 2011-275809, filed Dec. 16, 2011, and to Japanese Patent Application No. 2012-263224, filed Nov. 30, 2012. The contents of these applications are incorporated herein by reference in their entirety.1. Field of the InventionThe present invention relates to a resin ...

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Номер записи: 24
20-06-2013 дата публикации

Photoresist composition for forming a color filter and display substrate

Номер: US20130155536A1
Автор: Chul Huh, Sang-Hun Lee, Sun-Young Chang, Yui-Ku Lee
Принадлежит: Samsung Display Co Ltd

A photoresist composition for manufacturing a color filter, the photoresist composition includes a first red colorant and a yellow colorant represented by Chemical Formula 1, wherein R 1 and R 2 each independently represent a C1 to C10 alkyl group, wherein A 1 , A 2 , A 3 , and A 4 each independently represent a C1 to C10 alkyl group, —CN, —PO 3 H 2 , —C(O)OH, or a hydrogen atom, m is an integer of 1 to 10, and optionally wherein at least one —CH 2 — of R 1 and R 2 if present is independently replaced with —O—, —C(O)—, —C(O)O—, or —OC(O)—.

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Номер записи: 25
27-06-2013 дата публикации

LITHOGRAPHIC IMAGING AND PRINTING WITHOUT DEFECTS OF ELECTROSTATIC ORIGIN

Номер: US20130160667A1
Автор: Ray Kevin, RONDON SONIA
Принадлежит:

Embodiments of the present invention involve three-layer printing members having a central layer that is non-conductive yet abalatable at commercially realistic fluence levels. In various embodiments, the central layer is polymeric with a dispersion of nonconductive carbon black particles therein at a loading level sufficient to provide at least partial layer ablatability and water compatibility of the resulting ablation debris. 115-. (canceled)16. A method of imaging a lithographic printing member , the method comprising the steps of:(a) providing a lithographic printing member comprising (i) a first layer presenting a hydrophilic or oleophobic lithographic affinity, (ii) a second layer comprising a polymeric matrix and, dispersed therein, nonconductive carbon black particles at a loading level sufficient to provide at least partial layer ablatability, and (iii) a third layer presenting an oleophilic lithographic affinity, the second layer being disposed between the first and third layers;(b) exposing the printing member to imaging radiation in an imagewise pattern so as to at least partially ablate the second layer where exposed and thereby de-anchor the first layer; and(c) subjecting the printing member to an aqueous liquid to remove imaged portions of the imaging layer, thereby creating an imagewise lithographic pattern on the printing member.17. The method of wherein the aqueous liquid consists essentially of water.18. The method of wherein the aqueous liquid is plain tap water.19. The method of wherein the aqueous liquid comprises water and not more than 20% by weight of an organic solvent.20. The method of wherein the aqueous liquid comprises not more than 15% by weight of an organic solvent.21. The method of wherein the solvent is an alcohol.22. The method of wherein the alcohol is a glycol.23. The method of wherein the alcohol is at least one of propylene glycol claim 21 , benzyl alcohol or phenoxyethanol.24. The method of wherein the aqueous liquid ...

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Номер записи: 26
18-07-2013 дата публикации

METHOD FOR FORMING RESIST UNDERLAYER FILM, PATTERNING PROCESS USING THE SAME, AND COMPOSITION FOR THE RESIST UNDERLAYER FILM

Номер: US20130184404A1
Автор: FUJII Toshihiko, Hatakeyama Jun, OGIHARA Tsutomu
Принадлежит: SHIN-ETSU CHEMICAL CO., LTD.

A method for forming a resist underlayer film of a multilayer resist film having at least three layers used in a lithography, includes a step of coating a composition for resist underlayer film containing a novolak resin represented by the following general formula (1) obtained by treating a compound having a bisnaphthol group on a substrate; and a step of curing the coated composition for the resist underlayer film by a heat treatment at a temperature above 300° C. and 600° C. or lower for 10 to 600 seconds. A method for forming a resist underlayer film, and a patterning process using the method to form a resist underlayer film in a multilayer resist film having at least three layers used in a lithography, gives a resist underlayer film having a lowered reflectance, a high etching resistance, and a high heat and solvent resistances, especially without wiggling during substrate etching. 1. A composition for forming a resist underlayer film of a multilayer resist film having at least three layers used in a lithography, comprising a resin represented by the following general formula (3) and having a weight-average molecular weight of 500 to 100,000,{'sup': 1', '2, 'Rand Rrepresent the same or a different hydrogen atom, a linear, a branched, or a cyclic alkyl group having 1 to 10 carbon atoms, an aryl group having 6 to 20 carbon atoms, or an alkenyl group having 2 to 20 carbon atoms;'}{'sup': 3', '4, 'Rand Reach represents a hydrogen atom or a glycidyl group;'}{'sup': '5', 'Rrepresents a single bond, or a linear or a branched alkylene group having 1 to 10 carbon atoms;'}{'sup': 6', '7, 'Rand Rrepresent a benzene ring or a naphthalene ring; each reference character p and q represents 1 or 2;'}{'sup': 8', '9, 'Rand Rrepresent a hydrogen atom, a hydroxy group, an acyl group having 1 to 6 carbon atoms, an alkoxy group having 1 to 6 carbon atoms, an alkoxycarbonyl group having 1 to 6 carbon atoms, a carbonyl group, an amino group, an imino group, a hydroxy group substituted ...

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Номер записи: 27
25-07-2013 дата публикации

RESIST UNDERLAYER FILM FORMING COMPOSITION FOR LITHOGRAPHY CONTAINING POLYETHER STRUCTURE-CONTAINING RESIN

Номер: US20130189533A1
Автор: HASHIMOTO Keisuke, Kato Masakazu, Okuyama Hiroaki, SHINJO Tetsuya, Someya Yasunobu
Принадлежит: NISSAN CHEMICAL INDUSTRIES, LTD.

There is provided a resist underlayer film forming composition for forming a resist underlayer film providing heat resistance properties and hardmask characteristics. A resist underlayer film forming composition for lithography, comprising: a polymer containing a unit structure of Formula (1): 2. The resist underlayer film forming composition according to claim 1 , wherein the resist underlayer film forming composition for lithography contains a polymer containing the unit structure of Formula (1) claim 1 , and the organic group of Aris an organic group containing a fluorene structure.3. The resist underlayer film forming composition according to claim 1 , wherein the resist underlayer film forming composition for lithography contains a polymer containing the unit structure of Formula (2) claim 1 , and the organic group of Aris an organic group containing a fluorene structure.4. The resist underlayer film forming composition according to claim 1 , wherein the resist underlayer film forming composition for lithography contains a polymer containing a combination of the unit structure of Formula (1) and the unit structure of Formula (2) claim 1 , and at least one of the organic group of Arand the organic group of Aris an organic group containing a fluorene structure.5. The resist underlayer film forming composition according to claim 1 , wherein the resist underlayer film forming composition for lithography contains a polymer containing the unit structure of Formula (1) claim 1 , and the organic group of Aris an organic group containing a combination of an arylene group with a group containing a carbon-carbon triple bond and/or a group containing a carbon-carbon double bond.6. The resist underlayer film forming composition according to claim 1 , wherein the resist underlayer film forming composition for lithography contains a polymer containing the unit structure of Formula (2) claim 1 , and the organic group of Aris an organic group containing a combination of an ...

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Номер записи: 28
25-07-2013 дата публикации

GAP EMBEDDING COMPOSITION, METHOD OF EMBEDDING GAP AND METHOD OF PRODUCING SEMICONDUCTOR DEVICE BY USING THE COMPOSITION

Номер: US20130189627A1
Автор: SEKI Hiroyuki, YAMAMOTO Keiji
Принадлежит: FUJIFILM Corporation

A gap embedding composition used for embedding a patterned gap formed between photosensitive resin film portions on a semiconductor substrate surface, the gap embedding composition, having a hydrolysis condensate having an average molecular weight of 3,000 to 50,000 derived from an alkoxysilane raw material including at least alkyltrialkoxysilane and an ether compound having a total carbon atom of from 7 to 9 and/or an alkyl alcohol compound having a total carbon atom of from 6 to 9, as a solvent. 1. A gap embedding composition used for embedding a patterned gap formed between photosensitive resin film portions on a semiconductor substrate surface , the gap embedding composition comprising:a hydrolysis condensate having an average molecular weight of 3,000 to 50,000 derived from an alkoxysilane raw material including at least alkyltrialkoxysilane; andan ether compound having a total carbon atom of from 7 to 9 and/or an alkyl alcohol compound having a total carbon atom of from 6 to 9, as a solvent.2. The composition according to claim 1 , wherein 80 mass % or more of the solvent is the ether compound having the total carbon atom of from 7 to 9 and/or the alkyl alcohol compound having the total carbon atom of from 6 to 9.3. The composition according to claim 1 , wherein 20 mass % or more of the alkoxysilane raw material is alkyltrialkoxysilane.4. The composition according to claim 1 , wherein a solvent for dissolving the alkoxysilane raw material used for the above-described hydrolysis and condensation is different from the solvent for incorporating the hydrolysis condensate therein.5. The composition according to claim 1 , for use in a patterning technique comprising: removing the patterned photosensitive resin film portions; and subjecting a semiconductor substrate to etching manufacturing by using claim 1 , as a resist claim 1 , a cured film of the hydrolysis condensate having been left in the gap portion.6. The composition according to claim 5 , wherein a width of ...

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Номер записи: 29
25-07-2013 дата публикации

Resist underlayer coating forming composition for forming photo-crosslinking cured resist underlayer coating

Номер: US20130189850A1
Автор: Motohiko Hidaka, Satoshi Takei, Tetsuya Shinjo
Принадлежит: Nissan Chemical Corp

An underlayer coating is used as an underlayer of photoresists in lithography process of the manufacture of semiconductor devices and has a high dry etching rate in comparison to the photoresists, does not intermix with the photoresists, and is capable of flattening the surface of a semiconductor substrate having holes of a high aspect ratio; and an underlayer coating forming composition can form the underlayer coating. The underlayer coating forming composition for forming by light irradiation an underlayer coating used as an underlayer of a photoresist in a lithography process of the manufacture of semiconductor devices, includes a polymerizable substance and a photopolymerization initiator.

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Номер записи: 30
22-08-2013 дата публикации

Lithographic printing plate precursor and plate making method using the same

Номер: US20130216950A1
Автор: Junya Abe, Takashi Sato, Yu Iwai
Принадлежит: Fujifilm Corp

A lithographic printing plate precursor includes a support, an undercoat layer and an image-recording layer in this order, in which by exposing imagewise the image-recording layer with laser and then supplying at least any of printing ink and dampening water on a cylinder of a printing machine, an unexposed area of the image-recording layer can be removed, and the image-recording layer contains (A) a polymerization initiator, (B) a polymerizable compound and (C) a binder polymer, and the undercoat layer contains the copolymer (D1) as defined herein and the copolymer (D2) as defined herein and a weight of the copolymer (D1) is from 5 to 95% based on a total weight of the copolymers (D1) and (D2).

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Номер записи: 31
22-08-2013 дата публикации

LIQUID-REPELLENT FILM AND PRODUCTION METHOD THEREFOR, AND FINE STRUCTURE USING THE LIQUID-REPELLENT FILM AND PRODUCTION METHOD THEREFOR

Номер: US20130216958A1
Автор: Hamade Yohei, Mihara Hiroaki, Sawada Etsuko, Tsutsui Satoshi
Принадлежит: CANON KABUSHIKI KAISHA

Provided are a liquid-repellent film in which the aggregation of a liquid-repellent material is suppressed and which is excellent in liquid-repellent properties and a production method therefor, and a fine structure using the liquid-repellent film and a production method therefor. The liquid-repellent film is a liquid-repellent film formed of a silane compound having a specific perfluoropolyether group and a fluorine-containing acrylic homopolymer. 3. A liquid-repellent film according to claim 2 , wherein a content of a unit formed from the monomer represented by the formula (4) in the fluorine-containing acrylic copolymer is 30 mol % or more.5. A liquid-repellent film according to claim 1 , wherein a weight-average molecular weight of the perfluoropolyether group in the silane compound having a perfluoropolyether group contained in the liquid-repellent film is 500 or more and 20 claim 1 ,000 or less.7. A fine structure formed on a substrate claim 1 , the fine structure comprising the liquid-repellent film according to .8. A production method for a fine structure formed on a substrate claim 1 , the method comprising:forming, on a substrate, a photo cationic polymerizable resin layer which contains a photo cationic polymerizable resin material and is uncured;{'claim-ref': {'@idref': 'CLM-00001', 'claim 1'}, 'forming, on the photo cationic polymerizable resin layer, the liquid-repellent film according to ; and'}subjecting the photo cationic polymerizable resin layer and the liquid-repellent film to pattern exposure and development to remove a non-exposed portion of the photo cationic polymerizable resin layer and a non-exposed portion of the liquid-repellent film, thereby forming a fine pattern.9. An ink jet recording head claim 7 , comprising the fine structure according to .11. A liquid-repellent film according to claim 2 , wherein a weight-average molecular weight of the perfluoropolyether group in the silane compound having a perfluoropolyether group contained in ...

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Номер записи: 32
22-08-2013 дата публикации

COMPOSITION FOR FORMING UPPER LAYER FILM FOR IMMERSION EXPOSURE, UPPER LAYER FILM FOR IMMERSION EXPOSURE, AND METHOD OF FORMING PHOTORESIST PATTERN

Номер: US20130216961A1
Автор: KOUNO Daita, NATSUME Norihiro, NISHIMURA Yukio, SUGIE Norihiko, Sugiura Makoto, WAKAMATSU Gouji
Принадлежит: JSR Corporation

A composition for forming an upper layer film includes a solvent and a resin component including a first resin having a first repeating unit and a second repeating unit. The first repeating unit is a repeating unit represented by a formula (1-1), a repeating unit represented by a formula (1-2), a repeating unit represented by a formula (1-3), or a combination thereof. The second repeating unit is a repeating unit represented by a formula (2-1), a repeating unit represented by a formula (2-2), or both thereof. The composition is to be used for forming the upper layer film in liquid immersion lithography. 2. The composition according to claim 1 , wherein a film formed by the first resin has a receding contact angle with water of less than 60°.4. The composition according to claim 1 , wherein the first resin comprises the first repeating unit represented by the formula (1-1) and the second repeating unit represented by the formula (2-1) claim 1 , and wherein the second resin comprises the third repeating unit represented by the general formula (3-1) and the fourth repeating unit represented by the general formula (4).5. The composition according to claim 1 , wherein a content of the first resin is in a range from 5% to 70% by weight based on 100% by weight of a total of the resin component.6. An upper layer film in liquid immersion lithography claim 1 , the upper layer film being formed using the composition according to .7. A method for forming a photoresist pattern claim 1 , comprising:applying a photoresist composition to a substrate to form a photoresist film;{'claim-ref': {'@idref': 'CLM-00001', 'claim 1'}, 'applying the composition according to to the photoresist film to form an upper layer film;'}disposing a liquid immersion medium between the upper layer film and a lens;irradiating the photoresist film and the upper layer film with exposure light through the liquid immersion medium and a mask having a specific pattern; anddeveloping the photoresist film to ...

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Номер записи: 33
29-08-2013 дата публикации

COLOR FILTER SUBSTRATE AND METHOD FOR PRODUCING SAME

Номер: US20130222936A1
Автор: Kawanishi Takafumi
Принадлежит: SHARP KABUSHIKI KAISHA

The present invention provides a color filter substrate and a method for producing the same, in which the uniformity in thickness of a color filter can be improved. The present invention is a method for producing a color filter substrate, the method including: a step for forming a photoresist film; a step for conducting an exposure process on the photoresist film through a photomask; a step for forming a bank defining an opening by developing the exposed photoresist film; and a step for discharging ink into the opening. The photomask has a transparent region, a light-shielding region, and a translucent region. The transmittance of the translucent region is less than the transmittance of the transparent region and is greater than the transmittance of the light-shielding region, and the translucent region is provided between the transparent region and the light-shielding region along an outline of the transparent region and the light-shielding region, respectively. 1. A manufacturing method for a color filter substrate , comprising:(a) forming a photoresist film;(b) conducting an exposure process on the photoresist film through a photomask;(c) forming a bank defining an opening by developing the photoresist film that underwent the exposure process; and(d) discharging ink into the opening,wherein the photomask has a transparent region, a light-shielding region, and a translucent region,wherein a transmittance of the translucent region is less than a transmittance of the transparent region and greater than a transmittance of the light-shielding region, andwherein the translucent region is provided between the transparent region and the light-shielding region along outlines of the transparent region and the light-shielding region, respectively.2. The manufacturing method for a color filter substrate according to claim 1 , wherein the translucent region is a half-tone region or a grey-tone region.3. The manufacturing method for a color filter substrate according to claim ...

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Номер записи: 34
29-08-2013 дата публикации

ATOMIC LAYER DEPOSITION LITHOGRAPHY

Номер: US20130224665A1
Автор: Kumar Ajay, NALAMASU Omkaram, Wu Banqiu
Принадлежит:

Methods and apparatus for performing an atomic layer deposition lithography process are provided in the present disclosure. In one embodiment, a method for forming features on a material layer in a device includes pulsing a first reactant gas mixture to a surface of a substrate disposed in a processing chamber to form a first monolayer of a material layer on the substrate surface, directing an energetic radiation to treat a first region of the first monolayer, and pulsing a second reactant gas mixture to the substrate surface to selectively form a second monolayer on a second region of the first monolayer. 1. A method for forming features on a material layer in a device , comprising:(a) pulsing a first reactant gas mixture to a surface of a substrate disposed in a processing chamber to form a first monolayer of a material layer on the substrate surface;(b) directing an energetic radiation to treat a first region of the first monolayer; and(c) pulsing a second reactant gas mixture to the substrate surface to selectively form a second monolayer on a second region of the first monolayer.2. The method of claim 1 , further comprising:selectively removing the first monolayer disposed in the first region thereof treated by the energetic radiation.3. The method of claim 2 , further comprising:forming structures or features in the first and the second monolayer after removing the treated first monolayer on the substrate surface.4. The method of claim 1 , wherein the light radiation is a UV light source having a wavelength between about 5 nm and about 400 nm.5. The method of claim 1 , further comprising:reacting the second monolayer with the first monolayer to form a material layer.6. The method of claim 1 , wherein directing the energetic radiation further comprises:directing the energetic radiation to the first region of the first monolayer unprotected by a mask wherein the energetic radiation passes therethrough.7. The method of claim 2 , wherein removing the first ...

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Номер записи: 35
29-08-2013 дата публикации

SILICON-CONTAINING RESIST UNDERLAYER FILM FORMING COMPOSITION HAVING FLUORINE-BASED ADDITIVE

Номер: US20130224957A1
Автор: Haraguchi Masayuki, Kanno Yuta, Matsuyama Motonobu, Misaki Tomoko, Nakajima Makoto
Принадлежит: NISSAN CHEMICAL INDUSTRIES, LTD.

A resist underlayer film forming composition for lithography includes: as a component (I), a fluorine-containing highly branched polymer obtained by polymerizing a monomer A having two or more radical polymerizable double bonds in the molecule thereof, a monomer B having a fluoroalkyl group and at least one radical polymerizable double bond in the molecule thereof, and a monomer D having a silicon atom-containing organic group and at least one radical polymerizable double bond in the molecule thereof, in the presence of a polymerization initiator C in a content of 5% by mole or more and 200% by mole or less, based on the total mole of the monomer A, the monomer B, and the monomer D; and as a component (II), a hydrolyzable silane compound, a hydrolysis product thereof, a hydrolysis-condensation product thereof, or a silicon-containing compound that is a combination of these compounds. 1. A resist underlayer film forming composition for lithography comprising:as a component (I), a fluorine-containing highly branched polymer obtained by polymerizing a monomer A having two or more radical polymerizable double bonds in the molecule thereof, a monomer B having a fluoroalkyl group and at least one radical polymerizable double bond in the molecule thereof, and a monomer D having a silicon atom-containing organic group and at least one radical polymerizable double bond in the molecule thereof, in the presence of a polymerization initiator C in a content of 5% by mole or more and 200% by mole or less, based on the total mole of the monomer A, the monomer B, and the monomer D; andas a component (II), a hydrolyzable silane compound, a hydrolysis product thereof, a hydrolysis-condensation product thereof, or a silicon-containing compound that is a combination of these compounds.2. The resist underlayer film forming composition according to claim 1 , wherein the component (I) is a fluorine-containing highly branched polymer obtained by polymerizing a monomer A having two or more ...

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Номер записи: 36
12-09-2013 дата публикации

COMPOSITION FOR FORMING RESIST UNDERLAYER FILM AND PATTERN-FORMING METHOD

Номер: US20130233825A1
Автор: KIMURA Tooru, KURITA Shunsuke, NAKASHIMA Hiromitsu, TAKANASHI Kazunori
Принадлежит: JSR Corporation

A composition for forming a resist underlayer film includes a polysiloxane and a solvent. The solvent includes an organic solvent having a standard boiling point of no less than 150.0° C., and water. A content of the organic solvent is no less than 1% by mass and no greater than 50% by mass with respect to a total amount of the solvent. A content of water is no less than 1% by mass and no greater than 30% by mass with respect to the total amount of the solvent. 1. A composition for forming a resist underlayer film , comprising:a polysiloxane; and an organic solvent having a standard boiling point of no less than 150.0° C.; and', 'water,, 'a solvent comprisingwherein a content of the organic solvent is no less than 1% by mass and no greater than 50% by mass with respect to a total amount of the solvent, anda content of water is no less than 1% by mass and no greater than 30% by mass with respect to the total amount of the solvent.2. The composition according to claim 1 , wherein the standard boiling point of the organic solvent is no less than 180° C.3. The composition according to claim 1 , wherein the organic solvent is an ester claim 1 , an alcohol claim 1 , an ether or a combination thereof.5. The composition according to claim 1 , wherein a relative permittivity of the organic solvent is 13 or greater and 200 or less.6. The composition according to claim 1 , wherein the solvent further comprises an alcohol other than the organic solvent.7. The composition according to claim 1 , further comprising an acid diffusion controller.8. The composition according to claim 1 , wherein the polysiloxane is a hydrolytic condensate of a compound comprising a hydrolyzable silane compound represented by a formula (i):{'br': None, 'sup': 'A', 'sub': a', '4-a, 'RSiX\u2003\u2003(i)'}{'sup': A', 'A', 'A', 'B', 'B', 'A', 'A, 'wherein, in the formula (i), Rrepresents a hydrogen atom, a fluorine atom, an alkyl group having 1 to 5 carbon atoms, an alkenyl group having 2 to 10 carbon ...

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Номер записи: 37
12-09-2013 дата публикации

COMPOSITION FOR FORMING RESIST UNDERLAYER FILM, AND PATTERN-FORMING METHOD

Номер: US20130233826A1
Автор: KIMURA Tooru, MATSUMURA Yuushi, SEKO Tomoaki, TOYOKAWA Fumihiro
Принадлежит: JSR Corporation

A composition for forming a resist underlayer film includes a polysiloxane, and an organic solvent composition. The organic solvent composition includes an alkylene glycol monoalkyl ether acetate having a standard boiling point of less than 150.0° C., and an organic solvent having a standard boiling point of no less than 150.0° C. In the organic solvent composition, a content of the alkylene glycol monoalkyl ether acetate is no less than 50% by mass and no greater than 99% by mass, and a content of the organic solvent is no less than 1% by mass and no greater than 50% by mass. 1. A composition for forming a resist underlayer film , comprising:a polysiloxane; and an alkylene glycol monoalkyl ether acetate having a standard boiling point of less than 150.0° C.; and', 'an organic solvent having a standard boiling point of no less than 150.0° C.,, 'an organic solvent composition comprisingwherein in the organic solvent composition, a content of the alkylene glycol monoalkyl ether acetate is no less than 50% by mass and no greater than 99% by mass, and a content of the organic solvent is no less than 1% by mass and no greater than 50% by mass.2. The composition according to claim 1 , wherein a standard boiling point of the organic solvent is no less than 180° C.3. The composition according to claim 1 , wherein the organic solvent is an ester claim 1 , an ether or a combination thereof.5. The composition according to claim 1 , wherein a relative permittivity of the organic solvent is 13 or greater and 200 or less.6. The composition according to claim 1 , wherein the alkylene glycol monoalkyl ether acetate is a propylene glycol monoalkyl ether acetate.7. The composition according to claim 1 , which is used for a multilayer resist process.8. The composition according to claim 1 , further comprising an acid diffusion control agent.9. The composition according to claim 1 , wherein the polysiloxane is a hydrolytic condensate of a compound comprising a silane compound ...

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Номер записи: 38
19-09-2013 дата публикации

Coating treatment method, coating treatment apparatus, and computer-readable storage medium

Номер: US20130239887A1
Автор: Koji Takayanagi, Kousuke Yoshihara, Tomohiro Iseki
Принадлежит: Tokyo Electron Ltd

In a coating step, a substrate is rotated at a high speed, and in that state a resist solution is discharged from a first nozzle to a central portion of the substrate to apply the resist solution over the substrate. Subsequently, in a flattening step, the rotation of the substrate is decelerated and the substrate is rotated at a low speed to flatten the resist solution on the substrate. In this event, the discharge of the resist solution by the first nozzle in the coating step is performed until a middle of the flattening step, and when the discharge of the resist solution is finished in the flattening step, the first nozzle is moved to move a discharge position of the resist solution from the central portion of the substrate. According to the present invention, the resist solution can be applied uniformly within the substrate.

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Номер записи: 39
19-09-2013 дата публикации

Method of fabricating a polarized color filter

Номер: US20130244145A1
Автор: Fang-Tzu Chuang, Hung-Hsin Chen, Si-Chen Lee, Yu-Wei Jiang
Принадлежит: National Taiwan University NTU

A method of fabricating a polarized color filter wherein a transparent substrate is provided and coated with a photoresist layer. A wave-shaped mask may then be prepared and a periodic wave-shaped surface may be placed in contact with the photoresist layer, treating the photoresist layer with a primary exposure process. An external force may be applied to the wave-shaped mask, and the transparent substrate or wave-shaped mask by be rotated by a predetermined degree. The photoresist layer may be treated with a secondary exposure process, wherein the photoresist layer is developed in order to obtain a photoresist pattern layer. A metal layer may be coated on the transparent substrate with the photoresist pattern layer. The photoresist pattern layer and the portion of the metal layer on the photoresist pattern layer may then be removed such that the remaining metal layer forms a periodic hole substrate.

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Номер записи: 40
26-09-2013 дата публикации

Polymer Compound, And Resist-Protecting Film Composition Including Same For A Liquid Immersion Exposure Process

Номер: US20130252170A1
Автор: Han Man Ho, Kim Hyun Jin, Kim Jae Hyun, Park Jong Kyoung
Принадлежит:

A polymer compound and a resist protective film composition for an immersion lithography process including the same. 2. The polymer compound of claim 1 , wherein R claim 1 , R claim 1 , R claim 1 , R claim 1 , and Rare each independently one of a hydrogen atom claim 1 , a fluorine atom claim 1 , a methyl group claim 1 , an ethyl group claim 1 , a propyl group claim 1 , a C-Calkyl group substituted with at least one fluorine atom claim 1 , and a C-Calkyl group substituted with at least one hydroxyl group claim 1 ,{'sub': '2', 'wherein 1 to 4 hydrogen atoms of the Ris substituted with a group represented by Formula a,'}{'sub': 7', '1', '25', '1', '25, 'Ris a hydrogen atom, a C-Calkyl group substituted with at least one hydroxyl group, or a C-Calkyl group substituted with at least one carboxyl group,'}{'sub': 8', '1', '10', '9', '1', '5, 'Ris a hydrogen atom or a substituted or unsubstituted C-Calkyl group, and Ris a single bond or a substituted or unsubstituted C-Calkylene group.'}7. The polymer compound of claim 6 , wherein Rand Rare each independently a hydrogen atom claim 6 , a fluorine atom claim 6 , a methyl group claim 6 , an ethyl group claim 6 , a propyl group claim 6 , a C-Calkyl group substituted with at least one fluorine claim 6 , or a C-Calkyl group substituted with at least one hydroxyl group claim 6 ,{'sub': 12', '1', '25', '1', '25, 'Ris a hydrogen atom, a C-Calkyl group substituted with at least one hydroxyl group, or a C-Calkyl group substituted with at least one carboxyl group,'}{'sub': 11', '15', '17', '1', '5', '16', '18', '19, 'R, R, and Rare each independently a single bond or a substituted or unsubstituted C-Calkylene group, Ris —COO—, and Rand Rare each independently a fluorine atom.'}12. A resist protective film composition for an immersion lithography process claim 1 , the composition comprising the polymer compound of and a solvent.13. The resist protective film composition of claim 12 , wherein an amount of the polymer compound is in a ...

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Номер записи: 41
03-10-2013 дата публикации

PRINTING FORM PRECURSOR HAVING ELASTOMERIC CAP LAYER AND A METHOD OF PREPARING A PRINTING FORM FROM THE PRECURSOR

Номер: US20130255513A1
Автор: Blomquist Robert M., Chiu Chi W., LOCKE JOHN STEPHEN
Принадлежит: E I DU PONT DE NEMOURS AND COMPANY

The invention pertains to a printing form precursor, a method of preparing a printing form from the precursor, and a process of preparing the precursor. The printing form precursor includes a photopolymerizable layer, an elastomeric layer having at least an elastomeric binder and particulate, and an actinic radiation opaque material on, adjacent, or disposed above the elastomeric layer opposite the photopolymerizable layer. The particulate is selected from specific material particles having an average diameter from 1 to 10 micron and a refractive index that is within 0.04 units of an index of refraction of the composition forming the elastomeric layer. 1. A printing form precursor comprising:a) a layer of a photopolymerizable composition sensitive to actinic radiation, the composition comprising a binder, a monomer, and a photoinitiator; 'wherein the particulate is selected from polyamide, polymethylmethacrylate, feldspar, nepheline syenite, or glass particles, the particulate having an average diameter from 1 to 10 micron and an index of refraction that is ±0.04 of the index of refraction of the elastomeric composition; and', 'b) a layer of an elastomeric composition, that is or becomes sensitive to the actinic radiation, comprising at least an elastomeric binder, and particulate, the elastomeric composition having an index of refraction;'}c) an actinic radiation opaque layer on, adjacent, or disposed above the elastomeric layer b) opposite the photopolymerizable layer a), that is capable of forming an in-situ mask.2. The printing form precursor of wherein the particulate has a particle size distribution in which 99.7% of the particles is within 1 to 10 micron.3. The printing form precursor of wherein less than 2% of the particulate has a particle size greater than 10 micron.4. The printing form precursor of wherein less than 0.5% of the particulate has a particle size greater than 10 micron.5. The printing form precursor of wherein the average diameter of the ...

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Номер записи: 42
03-10-2013 дата публикации

COMPOSITION FOR FORMING RESIST UNDERLAYER FILM, AND PATTERN-FORMING METHOD

Номер: US20130256264A1
Автор: KIMURA Tooru, Motonari Masayuki, SUZUKI Junya, Tanaka Hiromitsu
Принадлежит: JSR Corporation

A composition for forming a resist underlayer film includes a polysiloxane, and a solvent composition. The solvent composition includes an organic solvent which includes a compound represented by the following formula (1) or a carbonate compound and which has a standard boiling point of no less than 150.0° C. Rand Reach independently represent a hydrogen atom, an alkyl group having 1 to 4 carbon atoms or an acyl group having 1 to 4 carbon atoms. Rrepresents a hydrogen atom or a methyl group. n is an integer of 1 to 4. In a case where n is no less than 2, a plurality of Rs are identical or different. 2. The composition according to claim 1 , wherein the standard boiling point of the organic solvent is no less than 180° C.3. The composition according to claim 1 , wherein a content of the organic solvent in the solvent composition is no less than 1% by mass and no greater than 50% by mass.4. The composition according to claim 1 , wherein a static surface tension of the organic solvent is no less than 20 mN/m and no greater than 50 mN/m.5. The composition according to claim 1 , wherein the solvent composition further comprises an alkylene glycol monoalkyl ether acetate compound having a standard boiling point of less than 150.0° C.6. The composition according to claim 5 , wherein the alkylene glycol monoalkyl ether acetate compound is a propylene glycol monoalkyl ether acetate compound.7. The composition according to claim 1 , which is used for a multilayer resist process.8. The composition according to claim 1 , further comprising an acid diffusion control agent.9. The composition according to claim 8 , wherein the acid diffusion control agent is a nitrogen-containing compound.10. The composition according to claim 1 , wherein the polysiloxane is a hydrolytic condensate of a compound comprising a silane compound represented by a formula (I):{'br': None, 'sup': 'A', 'sub': a', '4-a, 'RSiX\u2003\u2003(i)'}{'sup': A', 'A', 'B', 'B', 'A', 'A, 'wherein, in the formula (I), ...

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Номер записи: 43
03-10-2013 дата публикации

Polymer compound comprising dye and curable resin composition comprising same

Номер: US20130261213A1
Автор: Janghyun Ryu, Jiyoung Park, Sunhwa KIM
Принадлежит: LG Chem Ltd

The present invention relates to a polymer compound including a dye, and a curable resin composition including the same. The polymer compound including the dye according to the present invention may exhibit characteristics such as excellent heat resistance, solubility, coating uniformity, chemical resistance and the like by introducing a single molecule type dye into a side chain of a polymer binder to be modified into a polymer form and applying the modified polymer to a curable composition.

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Номер записи: 44
10-10-2013 дата публикации

TRANSPARENT CONDUCTIVE FILMS, ARTICLES, AND METHODS

Номер: US20130266898A1
Автор: Whitcomb David R.
Принадлежит:

Transparent conductive films, articles made from them, and methods of making them are disclosed. Some transparent conductive films include flexible glass substrates and conductive layers containing metal nanoparticles. Others include at least one layer with cell walls that contain metal nanorods or conductive nanowires. Still others include a substrate with a coating disposed on it, with the coating including conductive components and photopolymers. Such films are useful in such articles as electronic displays, touch screens, and the like. 1. A transparent conductive film comprising a substrate and at least one layer disposed on the substrate , the at least one layer comprising conductive components and at least one photopolymer composition.2. The transparent conductive film according to claim 1 , wherein the conductive components comprise carbon nanotubes or metal nanoparticles.3. The transparent conductive film according to claim 2 , wherein the metal nanoparticles comprise metal nanowires claim 2 , metal nanocubes claim 2 , metal nanorods claim 2 , metal nanopyramids claim 2 , or metal nanotubes.4. The transparent conductive film according to claim 2 , wherein the metal nanoparticles comprise metal nanowires.5. The transparent conductive film according to claim 4 , wherein the metal nanowires comprise silver nanowires.6. The transparent conductive film according to claim 1 , wherein the at least one photopolymer composition is water developable.7. The transparent conductive film according to claim 1 , wherein the at least one layer is a conductive layer.8. The transparent conductive film according to claim 1 , wherein the substrate is a flexible glass substrate.9. The transparent conductive film according to claim 8 , wherein the flexible glass substrate has at least one of the following: (1) an average thickness less than about 500 μm claim 8 , (2) an average thickness greater than about 10 μm and less than about 100 μm claim 8 , (3) can achieve a radius of ...

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Номер записи: 45
17-10-2013 дата публикации

Curable jettable fluid for making a flexographic printing master

Номер: US20130269558A1
Автор: Eddie Daems, Luc Vanmaele
Принадлежит: AGFA GRAPHICS NV

The present invention relates to a curable jettable fluid for making a flexographic printing master comprising an initiator, a cyclic monofunctional (meth)acrylate monomer and a difunctional (meth)acrylate monomer characterized in that the initiator is an oligomer, a polymer or a copolymerizable compound.

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Номер записи: 46
24-10-2013 дата публикации

PHOTOSENSITIVE, DEVELOPER-SOLUBLE BOTTOM ANTI-REFLECTIVE COATING MATERIAL

Номер: US20130280656A1
Автор: Dai Jinhua, Guerrero Alice, Lowes Joyce
Принадлежит: BREWER SCIENCE INC.

Photosensitive, developer-soluble bottom anti-reflective coatings are described. Compositions and methods of forming the same are also disclosed along with resulting microelectronic structures. The anti-reflective compositions comprise a multi-functional epoxy compound having multiple epoxy moieties pendant therefrom and one or more crosslinkable chromophores bonded thereto. The compounds are dispersed or dissolved in a solvent system with a vinyl ether crosslinker and can be used to create crosslinkable and de-crosslinkable coatings for microelectronics fabrication. 1. A photosensitive , developer-soluble anti-reflective composition for microelectronics fabrication , said composition comprising a multi-functional epoxy compound and a vinyl ether crosslinker dispersed or dissolved in a solvent system , wherein said multi-functional epoxy compound comprises one or more crosslinkable chromophores bonded thereto.2. The composition of claim 1 , wherein said crosslinkable chromophores are selected from the group consisting of substituted or unsubstituted aromatics claim 1 , aliphatics claim 1 , sulfur-containing compounds claim 1 , and halogen-containing compounds claim 1 , comprising from about 1 to about 10 crosslinkable groups.3. The composition of claim 2 , wherein said crosslinkable groups are selected from the group consisting of —OH claim 2 , Ar—OH claim 2 , and —COOH.4. The composition of claim 1 , wherein said crosslinkable chromophores are bonded to the multi-functional epoxy compounds via respective epoxy moieties.6. The composition of claim 5 , wherein L is an ester linkage claim 5 , and R claim 5 , when present claim 5 , is —O—.7. The composition of claim 1 , wherein said multi-functional epoxy compound is selected from the group consisting of non-polymeric small molecules claim 1 , homopolymers claim 1 , and copolymers of no more than two different co-monomers.8. The composition of claim 1 , wherein said multi-functional epoxy compound is a nonpolymeric ...

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Номер записи: 47
07-11-2013 дата публикации

Novel compound, dye and colored photosensitive composition

Номер: US20130296455A1
Автор: Koichi Shigeno, Masaaki Shimizu, Yosuke Maeda
Принадлежит: Adeka Corp

Disclosed are a dye that is excellent in solubility and heat-resistance, and a novel compound that is suitable for the dye, and specifically provides a yellow dye having a maximum absorption wavelength in the region of 420 to 470 nm. Also disclosed are a colored (alkali-developable) photosensitive composition and an optical filter using the dye, and specifically provides a color filter that does not decrease luminance and thus is preferable for an image display device such as a liquid crystal display panel. Specifically, disclosed are a novel compound represented by the following general formula (1), a dye using the compound, and a colored (alkali-developable) photosensitive composition and a color filter. The content of the above-mentioned general formula (1) is as described in the description.

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Номер записи: 48
14-11-2013 дата публикации

ORGANIC FILM COMPOSITION, METHOD FOR FORMING ORGANIC FILM AND PATTERNING PROCESS USING THIS, AND HEAT-DECOMPOSABLE POLYMER

Номер: US20130302990A1
Автор: FUJII Toshihiko, Kinsho Takeshi, Noda Kazumi, Tachibana Seiichiro, WATANABE Takeru, YANO Toshiharu
Принадлежит: SHIN-ETSU CHEMICAL CO., LTD.

The invention provides an organic film composition comprises (A) a heat-decomposable polymer, (B) an organic solvent, and (C) an aromatic ring containing resin, with the weight reduction rate of (A) the heat-decomposable polymer from 30° C. to 250° C. being 40% or more by mass. There can be provided an organic film composition having not only a high dry etching resistance but also an excellent filling-up or flattening characteristics. 1. An organic film composition comprising (A) a heat-decomposable polymer , (B) an organic solvent , and (C) an aromatic ring containing resin , with the weight reduction rate of (A) the heat-decomposable polymer from 30° C. to 250° C. being 40% or more by mass.2. The organic film composition according to claim 1 , wherein (A) the heat-decomposable polymer is in the state of liquid at 100° C. with the weight reduction rate thereof from 30° C. to 250° C. being 70% or more by mass.9. The organic film composition according to claim 1 , wherein (C) the aromatic ring containing resin contains a naphthalene ring.16. The organic film composition according to claim 1 , wherein (C) the aromatic ring containing resin comprises a resin (C3) that is obtained by polycondensation of one or two or more aromatic ring containing compounds with benzophenone claim 1 , naphthophenone claim 1 , or fluorenone.17. The organic film composition according to claim 9 , wherein (C) the aromatic ring containing resin comprises a resin (C3) that is obtained by polycondensation of one or two or more aromatic ring containing compounds with benzophenone claim 9 , naphthophenone claim 9 , or fluorenone.18. The organic film composition according to claim 10 , wherein (C) the aromatic ring containing resin comprises a resin (C3) that is obtained by polycondensation of one or two or more aromatic ring containing compounds with benzophenone claim 10 , naphthophenone claim 10 , or fluorenone.19. The organic film composition according to claim 11 , wherein (C) the aromatic ...

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Номер записи: 49
21-11-2013 дата публикации

Photosensitive Resin Composition for Color Filter and Color Filter Using Same

Номер: US20130306918A1
Автор: HAN Gyu-Seok, JUNG Ju-Ho, KIM Dong-Wan, Kim Jae-Hyun, KWON Ji-Yun, Lee In-Jae
Принадлежит:

Provided are a photosensitive resin composition for a color filter and a color filter using the same. The photosensitive resin composition for a color filter includes (A) a colorant including a diaminopyridine azo-based dye including a structure represented by Chemical Formula 1, and having an absorption wavelength at about 450 to about 550 nm, (B) an acrylic-based binder resin, (C) an acrylic-based photopolymerizable monomer, (D) a photopolymerization initiator, and (E) a solvent. 2. The photosensitive resin composition for a color filter of claim 1 , comprising:about 1 to about 30 wt % of the colorant (A);about 1 to about 30 wt % of the acrylic-based binder resin (B);about 1 to about 20 wt % of the acrylic-based photopolymerizable monomer (C);about 0.1 to about 10 wt % of the photopolymerization initiator (D); anda balance amount of the solvent (E).3. The photosensitive resin composition for a color filter of claim 1 , wherein the dye has solubility of about 5 to about 15 in a solvent.4. The photosensitive resin composition for a color filter of claim 1 , wherein the dye has transmittance of about 95 to about 100% in a long wavelength region of about 500 to about 800 nm.5. The photosensitive resin composition for a color filter of claim 1 , wherein the dye has a thermal decomposition temperature (Td) of about 280 to about 400° C. at which about 10 wt % of the dye is thermally decomposed.6. The photosensitive resin composition for a color filter of claim 1 , wherein the dye has ΔEab* of less than about 3.7. The photosensitive resin composition for a color filter of claim 1 , wherein the photosensitive resin composition further comprises a pigment claim 1 , and the diaminopyridine azo-based dye of the above Chemical Formula 1 and the pigment are included in a mixing weight ratio of about 7:3 to about 3:7.8. The photosensitive resin composition for a color filter of claim 1 , wherein the photosensitive resin composition further comprises a dispersing agent; malonic ...

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Номер записи: 50
21-11-2013 дата публикации

Resist underlayer film-forming composition

Номер: US20130310514A1
Автор: Kazuhiko KOMURA, Kyoyu Yasuda, Makoto Sugiura, Satoru Murakami, Shin-ya MINEGISHI, Shinya NAKAFUJI, Takanori Nakano, Yushi Matsumura
Принадлежит: JSR Corp

A resist underlayer film-forming composition includes a polymer including a repeating unit shown by a formula (1), and having a polystyrene-reduced weight average molecular weight of 3000 to 10,000, and a solvent. Each of R 3 to R 8 individually represent a group shown by the following formula (2) or the like. R 1 represents a single bond or the like. R 2 represents a hydrogen atom or the like.

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Номер записи: 51
05-12-2013 дата публикации

NORBORNENE-TYPE POLYMERS, COMPOSITIONS THEREOF AND LITHOGRAPHIC PROCESS USING SUCH COMPOSITIONS

Номер: US20130323644A1
Автор: Fujita Kazuyoshi, Kandanarachchi Pramod, Rhodes Larry F., Smith Steven
Принадлежит: PROMERUS, LLC

Embodiments in accordance with the present invention provide for non-self imagable norbornene-type polymers useful for immersion lithographic processes, methods of making such polymers, compositions employing such polymers and immersion lithographic processes that make use of such compositions. More specifically the embodiments of the present invention are related to norbornene-type polymers useful for forming top-coat layers for overlying photoresist layers in immersion lithographic process and the process thereof. 2. The top-coat composition of claim 1 , further comprising at least one additional norbornene-type repeating unit distinct from said first norbornene-type repeating unit of formula (I).3. The top-coat composition of claim 1 , wherein said non-self imagable polymer is having a molecular weight (M) of from 2 claim 1 ,000 to 80 claim 1 ,000.4. The top-coat composition of claim 1 , wherein said non-self imagable polymer is having a molecular weight (M) of from 2000 to 30000.13. The top-coat composition of claim 1 , further comprising one or more of an acidic moiety or a surfactant.14. The top-coat composition of claim 1 , where the solvent is selected from n-butyl alcohol claim 1 , isobutyl alcohol claim 1 , n-pentanol claim 1 , 4-methyl-2-pentanol claim 1 , 2-octanol claim 1 , 2-perfluorobutyl ethanol (CFCHCHOH) claim 1 , perfluoropropyl methanol ((CF)CHOH)) claim 1 , H(CF)CH—O—(CF)—H claim 1 , H(CF)—(CO)O—CH claim 1 , and H(CF)—(CO)O—CH claim 1 , diisopropylether claim 1 , diisobutylether claim 1 , dipentylether claim 1 , methyl-t-butylether and mixtures thereof.15. An immersion lithographic method comprising:first forming a photoresist layer overlying an active surface of a substrate;{'claim-ref': {'@idref': 'CLM-00001', 'claim 1'}, 'second forming a top-coat layer overlying the photoresist layer where said top-coat layer is formed using the top-coat composition of ;'}imagewise exposing the photoresist layer; anddeveloping the imagewise exposed ...

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Номер записи: 52
19-12-2013 дата публикации

METHOD FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM

Номер: US20130337168A1
Автор: IWABUCHI Motoaki, OGIHARA Tsutomu, YOSHIHARA Takao
Принадлежит: SHIN-ETSU CHEMICAL CO., LTD.

The invention provides a method for forming a silicon-containing resist underlayer film, the method for coating and forming a silicon-containing resist underlayer film by spin coating method comprising: feeding an aqueous alkaline solution in a pipe of an apparatus for coating and forming a film by spin coating method to clean therein; supplying a silicon-containing resist underlayer film composition via the pipe; and coating the silicon-containing resist underlayer film on a substrate to form a film. There can be provided a method for forming a silicon-containing resist underlayer film capable of reducing coating defects after forming a film by cleaning and removing a precipitate derived from silicon-containing resist underlayer film composition that precipitates and adheres in a pipe of an apparatus for coating and forming a film. 1. A method for forming a silicon-containing resist underlayer film , the method for coating and forming a silicon-containing resist underlayer film by spin coating method comprising: feeding an aqueous alkaline solution in a pipe of an apparatus for coating and forming a film by spin coating method to clean therein; supplying a silicon-containing resist underlayer film composition via the pipe; and coating the silicon-containing resist underlayer film on a substrate to form a film.2. The method for forming a silicon-containing resist underlayer film according to claim 1 , wherein an aqueous tetraalkylammonium hydroxide solution is used as the aqueous alkaline solution. 1. Field of the InventionThe present invention relates to a method for forming a silicon-containing resist underlayer film by spin coating method.2. Description of the Related ArtIn LSIs, advanced integration and higher process speed have made growing demands for more micro pattern size. Lithography technology has achieved further fine patterning by introducing a shorter wavelength of a light source and a resist composition appropriately selected according thereto.Even in ...

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Номер записи: 53
19-12-2013 дата публикации

COMPOUND FOR FORMING ORGANIC FILM, AND ORGANIC FILM COMPOSITION USING THE SAME, PROCESS FOR FORMING ORGANIC FILM, AND PATTERNING PROCESS

Номер: US20130337649A1
Автор: KORI Daisuke, Noda Kazumi, OGIHARA Tsutomu, Tachibana Seiichiro, WATANABE Takeru, YANO Toshiharu
Принадлежит:

The invention provides a compound for forming an organic film having a partial structure represented by the following formula (i) or (ii), 9. An organic film composition using the compound for forming an organic film according to claim 1 , which comprises at least one selected from (A) the compound represented by the formula (iii) claim 1 , (B) the compound having the partial structure represented by the formula (iv) claim 1 , (C-1) the polymer compound having the partial structure represented by the formula (iv) as a part of the repeating unit claim 1 , (C-2) the polymer compound having the partial structure represented by the formula (v) claim 1 , (C-3) the polymer compound having the partial structure represented by the formula (vi) claim 1 , and (C-4) the polymer compound having the partial structure represented by the formula (vii).10. The organic film composition according to claim 9 , wherein the composition contains (D) a resin containing an aromatic ring which is different from the polymers (C-1) to (C-4).11. The organic film composition according to claim 10 , wherein (D) the resin containing an aromatic ring contains a naphthalene ring.14. The organic film composition according to claim 9 , wherein the composition further comprises at least one of (E) a compound containing a phenolic hydroxyl group claim 9 , (F) an acid generator claim 9 , (G) a cross-linking agent claim 9 , (H) a surfactant and (I) an organic solvent.15. The organic film composition according to claim 9 , wherein it is used as a resist underlayer film composition or a planarizing composition for manufacturing a semiconductor apparatus.16. A process for forming an organic film which acts as a resist underlayer film or a planarizing film for manufacturing a semiconductor apparatus of a multilayer resist film used in lithography claim 9 , which comprises coating the organic film composition according to on a substrate to be processed claim 9 , and subjecting the composition to heat ...

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Номер записи: 54
26-12-2013 дата публикации

A KIND OF TINPLATE CYLINDRICAL CAN SCREEN PROCESS PRINTING TECHNOLOGY

Номер: US20130340636A1
Автор: LIN Hongzhong
Принадлежит: DONGGUAN RENAULTIN METAL PRODUCTS CO., LTD

This invention belongs to the screen process printing field, disclosing the tinplate cylindrical can screen printing technology, that is, prepare the screen first and then carry out the screen printing with pneumatic cylindrical screen printer of high accuracy; The said screen workpieces' periphery are elongated by 3 mm and the said 3 mm range are respectively made into gradient screentone of 50%, 35% and 15% at the screen trail, being the connection for the screen printing. The said screen is coated with UV curable varnish, which is mainly made from the following components based on the weight proportion: acrylic mixed resin, 70%; acrylic mixed monomer, 20%, mixed photosensitizer, 4%-8%; and organic siloxane, the adjuvant, 2%-6%. The room temperature for blending UV curable varnish ranges from 23° C. to 33° C. The purpose of this invention is to provide a technology with high transparency, smooth workpiece surface and free of any added textures. 1. A kind of tinplate cylindrical can screen process printing technology , which is characterized in that prepare the screen first and then carry out the screen printing with pneumatic cylindrical screen printer of high accuracy; The said screen workpieces' periphery are elongated by 3 mm and the said 3 mm range are respectively made into gradient screentone of 50% , 35% and 15% at the screen trail , being the connection for the screen printing. The said screen is coated with UV curable varnish , which is mainly made from the following components based on the weight proportion: acrylic mixed resin , 70%; acrylic mixed monomer (C15H20O6 , C1H2406 , C12H1804) , 20% , mixed photosensitizer (C10H12O2 , C13H10O) , 4%-8%; andorganic siloxane, the adjuvant, 2%-6%.2. The tinplate cylindrical can screen process printing technology claim 1 , as set forth in claim 1 , is characterized in that the room temperature for blending UV curable varnish ranges from 23° C. to 33° C.3. The tinplate cylindrical can screen process printing ...

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Номер записи: 55
16-01-2014 дата публикации

RESIN COMPOSITION, RESIST UNDERLAYER FILM, RESIST UNDERLAYER FILM-FORMING METHOD AND PATTERN-FORMING METHOD

Номер: US20140014620A9
Автор: KOUMURA Kazuhiko, MATSUMURA Yuushi, MIZOGUCHI Katsuhisa, Motonari Masayuki, Murakami Satoru, NAKAFUJI Shin-ya
Принадлежит: JSR Corporation

A resin composition for forming a resist underlayer film includes a resin that includes an aromatic ring, and a crosslinking agent having a partial structure represented by a following formula (i). X represents an oxygen atom, a sulfur atom, *—COO— or —NR—. Rrepresents a hydrogen atom or a Cmonovalent hydrocarbon group. Rrepresents a hydroxy group, a sulfanil group, a cyano group, a nitro group, a Cmonovalent hydrocarbon group, a Cmonovalent oxyhydrocarbon group or a Cmonovalent sulfanilhydrocarbon group. p is an integer of 1 to 3. 3. The resin composition according to claim 1 , wherein the resin is a novolak resin claim 1 , a resol resin claim 1 , an acenaphthylene resin claim 1 , a styrene resin claim 1 , a polyarylene resin claim 1 , or a combination thereof.4. The resin composition according to claim 1 , further comprising a solvent.5. A resist underlayer film formed from the resin composition according to .6. A resist underlayer film-forming method comprising:{'claim-ref': {'@idref': 'CLM-00001', 'claim 1'}, 'providing a coating film using the resin composition according to ; and'}heating the coating film.7. A pattern-forming method comprising:{'claim-ref': {'@idref': 'CLM-00001', 'claim 1'}, 'providing a resist underlayer film on an upper face side of a substrate using the resin composition according to ;'}providing a resist film on an upper face side of the resist underlayer film using a resist composition;exposing the resist film;developing the exposed resist film to form a resist pattern; andsequentially dry etching the resist underlayer film and the substrate using the resist pattern as a mask. The present application claims priority under 35 U.S.C. §119 to Japanese Patent Application No. 2011-275809, filed Dec. 16, 2011, and to Japanese Patent Application No. 2012-263224, filed Nov. 30, 2012. The contents of these applications are incorporated herein by reference in their entirety.1. Field of the InventionThe present invention relates to a resin ...

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Номер записи: 56
16-01-2014 дата публикации

METAL AZO PIGMENTS AND PIGMENT PREPARATIONS PRODUCED THEREFROM

Номер: US20140016072A1
Автор: BORST Hans-Ulrich, ENDERT Sabine, FUELLMANN Heinz-Josef, Linke Frank, MICHAELIS Stephan, Pfuetzenreuter Dirk
Принадлежит: LANXESS DEUTSCHLAND GMBH

The new metal azo pigments comprising the adduct of 6. Pigment preparation comprising at least one metal azo pigment according to at least one of .7. Pigment preparation according to claim 6 , characterized in that it comprises at least one dispersant.8. Pigment preparation according to claim 6 , characterized in that it comprises C.I. Pigment Green 36 and/or C.I. Pigment Green 58.9. Pigment preparation according to claim 6 , characterized in that it comprises as further component d) at least one organic compound selected from the group of terpenes claim 6 , terpenoids claim 6 , fatty acid esters and the group of homopolymers or copolymers having a solubility in water at 20° C. of less than 1 g/l.12. Method for producing a pigment preparation according to claim 6 , at least one metal azo pigment according to comprising mixing and grinding with at least one dispersant and optionally at least one further pigment and optionally with at least one organic compound selected from the group consisting of terpenes claim 6 , terpenoids claim 6 , fatty acid ester and homopolymers or copolymers.13. Colour filter comprising at least one metal azo pigment according to .14. Photoresist comprising at least one photocurable monomer claim 1 , at least one photoinitiator and at least one metal azo pigment according to .15. Method for producing colour filters for liquid crystal displays claim 1 , characterized in that at least one metal azo pigment according to or a pigment preparation according to is ground in an organic solvent claim 1 , optionally with addition of a binder resin and/or dispersant claim 1 , and is subsequently processed claim 1 , with addition of photocurable monomers claim 1 , photoreaction initiators and optionally further binder and/or solvent claim 1 , to a photoresist which is subsequently applied by means of suitable coating methods such as roller claim 1 , spray claim 1 , spin claim 1 , dip claim 1 , ink jet or air knife coating claim 1 , for example claim 1 , ...

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Номер записи: 57
23-01-2014 дата публикации

PROCESS FOR MAKING LITHOGRAPHIC PRINTING PLATE

Номер: US20140020585A1
Автор: Sonokawa Koji
Принадлежит: FUJIFILM Corporation

A process for making a lithographic printing plate is provided that includes a step of producing a negative-working lithographic printing plate precursor comprising, above a support, a photopolymerizable photosensitive layer comprising a vinylcarbazole compound-derived monomer unit-containing acrylic polymer and/or a urethane-acrylic hybrid polymer, a step of imagewise exposing the negative-working lithographic printing plate precursor, and a step of developing the exposed negative-working lithographic printing plate precursor using a developer comprising (Component A) an organic solvent having a solubility in water at 20° C. of 1.5 to 7.0 g/100 mL, (Component B) an amphoteric surfactant represented by Formula (I) below and/or Formula (II) below, and (Component C) water. 2. The process for making a lithographic printing plate according to claim 1 , wherein Component B is an amphoteric surfactant represented by Formula (I).3. The process for making a lithographic printing plate according to claim 2 , wherein at least one selected from the group consisting of R claim 2 , R claim 2 , and Rcomprises in its chain a linking group selected from the group consisting of an ester bond claim 2 , an amide bond claim 2 , and an ether bond.4. The process for making a lithographic printing plate according to claim 2 , wherein R claim 2 , R claim 2 , and Rhave a sum total of 8 to 22 carbons.5. The process for making a lithographic printing plate according to claim 1 , wherein Component A is an organic solvent selected from the group consisting of benzyl alcohol claim 1 , ethylene glycol monophenyl ether claim 1 , and propylene glycol monobutyl ether.6. The process for making a lithographic printing plate according to claim 1 , wherein Component A is benzyl alcohol.7. The process for making a lithographic printing plate according to claim 1 , wherein Component A has a content in the developer of 2 to 40 wt %.8. The process for making a lithographic printing plate according to claim ...

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Номер записи: 58
30-01-2014 дата публикации

LIQUID PROCESSING APPARATUS, LIQUID PROCESSING METHOD AND STORAGE MEDIUM FOR LIQUID PROCESSING

Номер: US20140030423A1
Автор: Kubota Minoru, TACHIBANA Kouzou, Yoshihara Kousuke
Принадлежит: TOKYO ELECTRON LIMITED

A liquid processing apparatus includes a substrate holding unit arranged within a processing cup and configured to horizontally hold a substrate, a rotating mechanism configured to rotate the substrate holding unit about a vertical axis, a processing liquid supply unit configured to supply a processing liquid onto a surface of the substrate, and an exhaust mechanism configured to discharge an atmospheric gas around the substrate. The exhaust mechanism includes an exhaust flow path connected to an exhaust port formed at the processing cup, a circulation flow path branched from the exhaust flow path and configured to communicate with the processing cup, a gas liquid separator, a first regulator valve installed at one end of the exhaust flow path, and a second regulator valve installed at the other end of the exhaust flow path. 1. A liquid processing apparatus , comprising:a substrate holding unit arranged within a processing cup having an open top end and configured to horizontally hold a substrate;a rotating mechanism configured to rotate the substrate holding unit about a vertical axis;a processing liquid supply unit configured to supply a processing liquid onto a surface of the substrate; andan exhaust mechanism configured to discharge an atmospheric gas around the substrate held by the substrate holding unit,wherein the exhaust mechanism includes:an exhaust flow path communicating with an exhaust port formed in a bottom portion of the processing cup at a first end while communicating with an outside at a second end and provided with an exhaust device installed in the exhaust flow path;a circulation flow path branched from a branching portion of the exhaust flow path to communicate with the processing cup;a gas liquid separator installed at the branching portion, and configured to separate the atmospheric gas into a mist and a gas;a first regulator valve installed at the first end of the exhaust flow path and capable of being opened and closed and capable of ...

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Номер записи: 59
30-01-2014 дата публикации

COLORED COMPOSITION, COLORED CURED FILM, COLOR FILTER, METHOD FOR PRODUCING COLOR FILTER, LIQUID CRYSTAL DISPLAY DEVICE, SOLID-STATE IMAGING DEVICE, AND NOVEL DIPYRROMETHENE METAL COMPLEX COMPOUND OR TAUTOMER THEREOF

Номер: US20140030642A1
Автор: SASAKI Daisuke, TAKASAKI Yuta
Принадлежит: FUJIFILM Corporation

Provided is a colored composition including at least one selected from the group consisting of a compound represented by the following formula (I) and a tautomer thereof: wherein in formula (I), Rto Reach independently represent a hydrogen atom or a monovalent substituent; Rrepresents a hydrogen atom, a halogen atom, an alkyl group, an aryl group or a heterocyclic group; Ma represents a metal or a metal compound; Xand Xeach independently represent NR, a nitrogen atom, an oxygen atom, or a sulfur atom, wherein R represents a hydrogen atom, an alkyl group, an alkenyl group, an aryl group, a heterocyclic group, an acyl group, an alkylsulfonyl group, or an arylsulfonyl group; Xrepresents a group required to neutralize the charge of Ma; a represents 1 or 2; and Rto Reach independently represent a hydrogen atom or a monovalent substituent, provided that at least one of Rto Rrepresents a particular polymerizable substituent. 2. The colored composition according to claim 1 , wherein claim 1 , in formula (I) claim 1 , at least any one of Rto Ris a substituent represented by formula (II) claim 1 , and at least any one of Rto Ris a substituent represented by formula (II).3. The colored composition according to claim 1 , further comprising a polymerizable compound and a photopolymerization initiator.4. The colored composition according to claim 1 , further comprising a pigment or an anthraquinone compound claim 1 , or comprising both a pigment and an anthraquinone compound.6. The colored composition according to claim 1 , wherein a content of the at least one selected from the group consisting of a compound represented by formula (I) and a tautomer thereof is 0.1% to 30% by mass relative to the total solid content of the colored composition.7. The colored composition according to claim 2 , further comprising a polymerizable compound and a photopolymerization initiator.8. The colored composition according to claim 2 , further comprising a pigment or an anthraquinone compound ...

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Номер записи: 60
30-01-2014 дата публикации

COATING COMPOSITIONS FOR PHOTOLITHOGRAPHY

Номер: US20140030653A1
Автор: Gallagher Michael K., Jain Vipul, Ongayi Owendi, ZAMPINI Anthony
Принадлежит:

Underlying coating compositions are provided that comprise one or more resins comprising one or more modified imide groups. These coating compositions are particularly useful as antireflective layers for an overcoated photoresist layer. Preferred systems can be thermally treated to increase hydrophilicity of the composition coating layer to inhibit undesired intermixing with an overcoated organic composition layer, while rendering the composition coating layer removable with aqueous alkaline photoresist developer. 1. A method of preparing an electronic device , comprising:applying an organic composition on a substrate, the organic composition comprise one or more resins with modified imide groups; andapplying a further composition above the organic composition.2. The method of further comprising thermally treating the organic composition layer prior to applying the further composition.3. The method of wherein thermal treatment does not significantly increase molecular weight of the resin.4. The method of wherein the imide groups are substituted with ester groups or acetal groups.5. The method of wherein the one or more resins comprise glutarimide and/or maleimide groups and/or the organic composition comprises one or more resins with one or more chromophore groups.6. The method of wherein the further composition layer is a photoresist composition claim 1 , a lift-off composition claim 1 , a passivation composition or a hardmask composition.7. A coated substrate comprising:an organic composition on a substrate, the organic composition comprise one or more resins with modified imide groups; anda further composition layer above the organic composition.8. The method of wherein the one or more resins comprise glutarimide and/or maleimide groups and/or one or more chromophore groups.9. An underlying coating composition comprising one or more resins comprising one or more modified imide groups.10. An organic solvent solution comprising (1) one or more organic solvents and ...

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Номер записи: 61
30-01-2014 дата публикации

MULTILAYER RESIST PROCESS PATTERN-FORMING METHOD AND MULTILAYER RESIST PROCESS INORGANIC FILM-FORMING COMPOSITION

Номер: US20140030660A1
Автор: MORI Takashi, Motonari Masayuki, Nakahara Kazuo, TAKANASHI Kazunori, TAKIMOTO Yoshio
Принадлежит: JSR Corporation

A multilayer resist process pattern-forming method includes providing an inorganic film over a substrate. A protective film is provided on the inorganic film. A resist pattern is provided on the protective film. A pattern is provided on the substrate by etching that utilizes the resist pattern as a mask. A multilayer resist process inorganic film-forming composition includes a compound, an organic solvent, and a crosslinking accelerator. The compound includes a metal compound that includes a hydrolyzable group, a hydrolysate of a metal compound that includes a hydrolyzable group, a hydrolysis-condensation product of a metal compound that includes a hydrolyzable group, or a combination thereof. The compound includes at least one metal element belonging to Group 6, Group 12, or Group 13 of the Periodic Table of the Elements. 1. A multilayer resist process pattern-forming method comprising:providing an inorganic film over a substrate;providing a protective film on the inorganic film;providing a resist pattern on the protective film; andproviding a pattern on the substrate by etching that utilizes the resist pattern as a mask.2. The multilayer resist process pattern-forming method according to claim 1 , further comprising:providing a resist underlayer film on the substrate before providing the inorganic film over the substrate,wherein the inorganic film is provided on the resist underlayer film.3. The multilayer resist process pattern-forming method according to claim 1 , wherein the resist pattern is provided on the protective film using a process including:providing a resist film on the protective film using a resist composition;exposing the resist film by applying radiation through a photomask; anddeveloping the exposed resist film to provide the resist pattern.4. The multilayer resist process pattern-forming method according to claim 1 , wherein the resist pattern is provided by nanoimprint lithography.5. The multilayer resist process pattern-forming method ...

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Номер записи: 62
30-01-2014 дата публикации

UPPER SURFACE ANTIREFLECTIVE FILM FORMING COMPOSITION AND PATTERN FORMING METHOD USING SAME

Номер: US20140030661A1
Автор: KATAYAMA Tomohide, Sao Takayuki
Принадлежит: AZ ELECTRONIC MATERIALS USA CORP.

[Object] 2. The top anti-reflection coating composition according to claim 1 , wherein said alkylsulfonic acid is contained in an amount of 0.02 to 0.4 wt % based on the total weight of the composition.3. The top anti-reflection coating composition according to claim 1 , wherein said fluorine-containing polymer has a weight average molecular weight of 350000 to 450000.4. The top anti-reflection coating composition according to claim 1 , further containing a no fluorine-containing polymer having a carboxy group.5. The top anti-reflection coating composition according to claim 1 , further containing an amine compound selected from the group consisting of monoalkanol amines claim 1 , dialkanol amines claim 1 , trialkanol amines claim 1 , and monoalkyl amines.6. The top anti-reflection coating composition according to claim 1 , wherein the solid content is 0.1 to 50 wt % based on the total weight of the composition.7. A pattern formation method comprising the steps of: coating a substrate with a resist composition to form a resist film; coating said resist film with the top anti-reflection coating composition according to ; drying said composition; conducting exposure by use of light; and then carrying out development.8. The pattern formation method according to ; wherein said top anti-reflection coating composition further contains a no fluorine-containing polymer having a carboxy group claim 7 , and the light for exposure has a wavelength of 300 nm or more.9. The pattern formation method according to ; wherein said top anti-reflection coating composition further contains an amine compound selected from the group consisting of monoalkanol amines claim 7 , dialkanol amines claim 7 , trialkanol amines claim 7 , and monoalkyl amines claim 7 , and the light for exposure has a wavelength of 300 nm or less.10. The top anti-reflection coating composition according to claim 2 , wherein said fluorine-containing polymer has a weight average molecular weight of 350000 to 450000. ...

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Номер записи: 63
06-02-2014 дата публикации

COLORED COMPOSITION, COLORED CURED FILM, COLOR FILTER, METHOD FOR PRODUCING COLOR FILTER, LIQUID CRYSTAL DISPLAY DEVICE, SOLID-STATE IMAGING DEVICE, AND NOVEL DIPYRROMETHENE METAL COMPLEX COMPOUND OR TAUTOMER THEREOF

Номер: US20140038092A1
Автор: SASAKI Daisuke
Принадлежит: FUJIFILM Corporation

A colored composition including at least one selected from the group consisting of a compound represented by the following formula (I) and a tautomer thereof. In formula (I), Rto Reach independently represent a hydrogen atom or a monovalent substituent, Rrepresents a hydrogen atom, a halogen atom, an alkyl group, or the like, Ma represents a metal or a metal compound, Xand Xeach independently represent NR, a nitrogen atom, an oxygen atom, or a sulfur atom, R represents a hydrogen atom, an alkyl group, or the like, Yand Yeach independently represent NRc, a nitrogen atom, or a carbon atom, Rc represents a hydrogen atom, an alkyl group, or the like, and Rand Reach independently represent an alkyl group, an alkenyl group, or the like. Z represents an atomic group that forms a nitrogen-containing ring having a specific structure. 2. The colored composition according to claim 1 , wherein Ma in formula (I) represents Fe claim 1 , Zn claim 1 , Co claim 1 , V═O claim 1 , or Cu.3. The colored composition according to claim 1 , further comprising a polymerizable compound and a photopolymerization initiator.4. The colored composition according to claim 1 , further comprising either a pigment or an anthraquinone compound claim 1 , or both of the pigment and the anthraquinone compound.6. The colored composition according to claim 1 , wherein a content of the at least one selected from the group consisting of a compound represented by formula (I) and a tautomer thereof is from 0.1% by mass to 30% by mass based on a total solid content of the colored composition.7. The colored composition according to claim 2 , further comprising a polymerizable compound and a photopolymerization initiator.8. The colored composition according to claim 2 , further comprising a polymerizable compound; a photopolymerization initiator; and either a pigment or an anthraquinone compound or both of the pigment and the anthraquinone compound.12. A colored cured film obtained by curing the colored ...

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Номер записи: 64
06-02-2014 дата публикации

Light Emitting Diode Apparatus for Curing an Emulsion

Номер: US20140038108A1
Автор: Louis D'Amelio
Принадлежит: Individual

An apparatus and method for curing a photo activated emulsion. The apparatus is a light emitting apparatus is a plurality of light emitting diodes (LED's) attached to a circuit board. The LED's are used to quickly and efficiently cure a photo sensitive emulsion on a mesh screen for use in silk screening.

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Номер записи: 65
13-02-2014 дата публикации

POSITIVE WORKING LITHOGRAPHIC PRINTING PLATE PRECURSOR AND A METHOD FOR MAKING A PRINTING PLATE

Номер: US20140041541A1
Автор: Miyamoto Yasushi
Принадлежит:

The present invention provides a CTP positive lithographic printing original plate which has satisfactory image contrast even after baking. 1. A positive lithographic printing original plate , comprising a substrate , and an image forming layer containing a water-insoluble and alkali-soluble resin and a photo-thermal conversion material , formed on the substrate , whereinthe image forming layer contains an acid dye as a colorant.2. The positive lithographic printing original plate of claim 1 , wherein the image forming layer comprises of a lower layer containing a water-insoluble and alkali-soluble resin and an upper layer containing a water-insoluble and alkali-soluble resin claim 1 , formed on the substrate claim 1 , the lower layer or the upper layer containing the photo-thermal conversion material claim 1 , whereinthe lower layer or the upper layer contains an acid dye as a colorant.3. The positive lithographic printing original plate according to claim 1 , wherein the acid dye is selected from the group consisting of xanthene-based claim 1 , indigoid-based claim 1 , triphenylmethane-based claim 1 , anthraquinone-based claim 1 , azo-based claim 1 , cyanine-based claim 1 , and phthalocyanine-based dyes.4. The positive lithographic printing original plate according to claim 1 , wherein the acid dye is selected from the group consisting of Acid Red 52 claim 1 , Acid Red 87 claim 1 , Acid Red 91 claim 1 , Acid Red 92 claim 1 , Acid Red 94 claim 1 , and Erythrosine B (Acid Red 51).5. The positive lithographic printing original plate according to claim 1 , wherein the water-insoluble and alkali-soluble resin contains a phenol resin claim 1 , and the phenol resin accounts for less than 50% by mass of the water-insoluble and alkali-soluble resin.6. A method for making a positive lithographic printing original plate claim 1 , comprising imagewise exposing the positive lithographic printing original plate according to ; developing the exposed plate with a developing ...

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Номер записи: 66
13-02-2014 дата публикации

WATERLESS PLANOGRAPHIC PRINTING PLATE PRECURSOR

Номер: US20140045120A1
Автор: Eguchi Masuichi, Iihara Akihiro, Suezawa Mitsuru
Принадлежит: Toray Industries, Inc.

A waterless planographic printing plate precursor has, on a substrate, at least a photosensitive layer or heat sensitive layer and a silicone rubber layer, which is a waterless planographic printing plate precursor, wherein 1) a color pigment and a pigment dispersant are contained in the silicone rubber layer, 2) the a content of color pigment is 0.1 to 20 vol % in the silicone rubber layer, and 3) the pigment dispersant contains an organic complex compound including a metal and an organic compound. 1. A waterless planographic printing plate precursor having , on a substrate , at least a photosensitive layer or heat sensitive layer and a silicone rubber layer , which is a waterless planographic printing plate precursor , wherein 1) a color pigment and a pigment dispersant are contained in said silicone rubbery layer , 2) said a content of color pigment is 0.1 to 20 vol % in the silicone rubber layer , and 3) said pigment dispersant contains an organic complex compound comprising a metal and an organic compound.2. The waterless planographic printing plate precursor according to claim 1 , wherein said metal contains aluminum and/or titanium.3. The waterless planographic printing plate precursor according to claim 1 , wherein said silicone rubber layer is obtained by coating a color pigment-containing diluted silicone liquid on the photosensitive layer or the heat sensitive layer claim 1 , and wherein said color pigment-containing diluted silicone liquid is obtained by mixing (1) a color pigment dispersion in which a color pigment is dispersed and mixed in a solution containing at least a pigment dispersant and a solvent and (2) a silicone liquid containing at least an organopolysiloxane and a cross-linking agent or a diluted silicone liquid in which the silicone liquid is diluted with a solvent.4. The waterless planographic printing plate precursor according to claim 2 , wherein said silicone rubber layer is obtained by coating a color pigment containing diluted ...

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Номер записи: 67
13-02-2014 дата публикации

Photoresist composition and method of forming a black matrix using the same

Номер: US20140045121A1
Автор: Chang-Hoon Kim, Hi-Kuk Lee, Ki-Beom Lee, Sang-Hyn LEE, Su-Yeon Sim
Принадлежит: Samsung Display Co Ltd

A photoresist composition including: about 5% by weight to about 10% by weight of a binder resin; about 5% by weight to about 10% by weight of a photo-polymerization monomer; about 1% by weight to about 5% by weight of a photo initiator, which is activated by a light having a peak wavelength from about 400 nm to about 410 nm; about 5% by weight to about 10% by weight of a black-coloring agent, each based on a total weight of the photoresist composition; and a solvent.

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Номер записи: 68
20-02-2014 дата публикации

Aluminum substrates and lithographic printing plate precursors

Номер: US20140047993A1
Автор: Celin Savariar-Hauck, Gerhard Hauck, Michael NIELINGER, Oliver Richard BLUM
Принадлежит: Individual

Electrochemically grained and anodized aluminum supports are treated with a post-treatment coating solution containing a polymer derived at least in part from vinyl phosphonic acid and phosphoric acid. This post-treated support is useful as substrates in the preparation of lithographic printing plate precursors. The post-treatment substrate treatment enables wide latitude in manufacturing and compatibility with silicate-free developers to achieve negligible background staining and oxide attack.

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Номер записи: 69
20-02-2014 дата публикации

COMPOSITION FOR FORMING RESIST UNDERLAYER FILM AND PATTERN-FORMING METHOD

Номер: US20140048512A1
Автор: Minegishi Shin-ya, NAKAFUJI Shin-ya, Nakano Takanori
Принадлежит: JSR Corporation

A composition for forming a resist underlayer film includes a polymer having a repeating unit represented by a following formula (1), and a solvent. Rrepresents a hydroxy group, or the like. n is an integer of 0 to 5. X represents a divalent hydrocarbon group having 1 to 20 carbon atoms or an alkanediyloxy group having 1 to 20 carbon atoms. m is an integer of 1 to 7. A sum of m and n is no greater than 7. Rrepresents a single bond or an alkanediyl group having 1 to 4 carbon atoms. Rrepresents an alicyclic group having 4 to 20 carbon atoms or an arylene group having 6 to 30 carbon atoms. A part or all of hydrogen atoms included in the alicyclic group or the arylene group represented by Rare unsubstituted or substituted. 3. The composition according to claim 1 , wherein a weight average molecular weight of the polymer is 500 to 8 claim 1 ,000.4. The composition according to claim 1 , further comprising an acid generating agent.5. The composition according to claim 1 , further comprising a crosslinking agent.6. A pattern-forming method comprising:{'claim-ref': {'@idref': 'CLM-00001', 'claim 1'}, 'coating the composition according to on a substrate, to provide a resist underlayer film;'}forming a resist pattern on the substrate using a resist composition, the substrate having the resist underlayer film provided on the substrate; andetching the resist underlayer film and the substrate. The present application is a continuation application of International Application No. PCT/JP2011/060489, filed Apr. 28, 2011. The contents of this application are incorporated herein by reference in their entirety.1. Field of the InventionThe present invention relates to a composition for forming a resist underlayer film, and a pattern-forming method.2. Discussion of the BackgroundSubstrates used for semiconductor devices have an intended pattern. A process for patterning the substrate includes, for example, the steps of: depositing a photosensitive substance, called a resist composition, ...

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Номер записи: 70
20-02-2014 дата публикации

PHOTOSENSITIVE RESIN COMPOSITION AND APPLICATION THEREOF

Номер: US20140051017A1
Автор: Hsieh I-Chun, Liao Hao-Wei
Принадлежит: CHI MEI CORPORATION

The present invention relates to a photosensitive resin composition, which comprises an alkali-soluble resin (A), a compound (B) containing vinyl unsaturated group(s), a photoinitiator (C), ortho-naphthoquinone diazide sulfonic acid ester (D), a thermal initiator (E) and a solvent (F). The photosensitive resin composition added with the ortho-naphthoquinone diazide sulfonic acid ester (D) and the thermal initiator (E) can have excellent resolution and development adherence. Moreover, the present invention further provides a spacer or a protective film formed by the aforementioned photosensitive resin composition, as well as a liquid crystal display device (LCD) including the aforementioned spacer or protective film. 1. A photosensitive resin composition , comprising:an alkali-soluble resin (A);a compound (B) containing vinyl unsaturated group(s);a photoinitiator (C);ortho-naphthoquinone diazide sulfonic acid ester (D);a thermal initiator (E); anda solvent (F).2. The photosensitive resin composition of claim 1 , wherein the alkali-soluble resin (A) is copolymerized from an unsaturated carboxylic acid monomer (a1) claim 1 , an unsaturated monomer containing epoxy group(s) (a2) and other unsaturated monomers (a3).3. The photosensitive resin composition of claim 1 , wherein based on the amount of the alkali-soluble resin (A) as 100 parts by weight claim 1 , the usage amount of the compound (B) containing vinyl unsaturated group(s) is 20 parts by weight to 200 parts by weight claim 1 , the usage amount of the ortho-naphthoquinone diazide sulfonic acid ester (D) is 0.2 parts by weight to 15 parts by weight claim 1 , the usage amount of the thermal initiator (E) is 0.2 parts by weight to 10 parts by weight claim 1 , and the usage amount of the solvent (F) is 500 parts by weight to 3000 parts by weight.4. The photosensitive resin composition of claim 1 , wherein based on the amount of the compound (B) containing vinyl unsaturated group(s) as 100 parts by weight claim 1 , ...

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Номер записи: 71
20-02-2014 дата публикации

Photosensitive Alkali-Soluble Resin, Method Of Preparing The Same, And Color Photosensitive Resist Containing The Same

Номер: US20140051814A1
Автор: Li Lin, Shu Shi, SUN Wenwen, Zhao Ming
Принадлежит: BOE Technology Group Co., Ltd.

Provided is a photosensitive alkali-soluble resin comprising a compound of formula (I), a method of preparing the same, and a color photosensitive resist containing the same, wherein n1, n2, R, Rand Rare defined as herein. The photosensitive alkali-soluble resin is prepared by: copolymerizing ethylene oxide with α-hydroxyalkyl phenyl ketone to obtain the first intermediate product, followed by copolymerizing the first intermediate product with a copolymerization product of glycerin acrylate, styrene, and maleic anhydride to obtain the second intermediate product, and oxidizing the second intermediate product to produce the photosensitive alkali-soluble resin. 2. The photosensitive alkali-soluble resin of claim 1 , wherein{'sub': 1', '2', '2', '2', '2', '2', '3', '2', '12', '25', '3, 'Ris selected from the group consisting of —H, —O(CH)OH, —O(CH)OCOCH═CH, —N(CH), —CHand —SCH.'}3. A method of preparing a photosensitive alkali-soluble resin comprising:a) copolymerizing ethylene oxide with α-hydroxyalkyl phenyl ketone to obtain a first intermediate product;b) copolymerizing the first intermediate product with a copolymerization product of glycerin acrylate, styrene and maleic anhydride to obtain the second intermediate product; andc) oxidizing the second intermediate product to produce the photosensitive alkali-soluble resin.4. The method of claim 3 , wherein the molar ratio of the ethylene oxide to the α-hydroxyalkyl phenyl ketone is 1:1 to 8:1; the molar ratio of the glycerin acrylate claim 3 , the styrene and the maleic anhydride is (1-1.2):(1-1.2):(1-1.3); and molar ratio of the ethylene oxide to the glycerin acrylate is (0.5-6.1):1.5. The method of claim 3 , wherein 3-mercapto propionic acid is used in the copolymerization of the ethylene oxide and the α-hydroxyalkyl phenyl ketone with a molar ratio of 3-mercapto propionic acid to ethylene oxide of (0-0.1):1; and a mercapto-based chain transfer agent is used in the copolymerization of glycerin acrylate claim 3 , ...

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Номер записи: 72
27-02-2014 дата публикации

Photoresist Film and Manufacturing Method for Organic Light Emitting Display Device Using the Same

Номер: US20140057379A1
Автор: Hye Li Min, Jae Hyun Park, Jin Wuk Kim, Min Jee Kim, Wy-Yong Kim, Young sub Shin, Young Tae Son
Принадлежит: LG Display Co Ltd

Disclosed is a photoresist film including a light-to-heat conversion layer on a support film, and a thermo-responsive polymer layer on the light-to-heat conversion layer, wherein the photoresist film is easily detached from a transfer substrate through a temperature adjustment and detach film since the photoresist film includes thermo-responsive polymer.

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Номер записи: 73
06-03-2014 дата публикации

SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD

Номер: US20140065309A1
Автор: KASHIYAMA Masahito, NISHIYAMA Koji
Принадлежит:

Transport mechanisms are respectively provided in first and second processing blocks. Each transport mechanism has a hand. The hand holds the other surface of a substrate without coming into contact with an edge of the substrate. The hand is moved such that the substrate is transported between an adhesion reinforcement processing unit or a cooling unit and a coating processing unit or a development processing unit. In the adhesion reinforcement processing unit and the cooling unit, temperature processing is performed on the substrate while the back surface of the substrate is held by suction. In the coating processing unit and the development processing unit, a processing liquid is supplied to the main surface of the substrate while the back surface of the substrate is held by suction by a spin chuck. 1. A substrate processing apparatus that performs predetermined processing on a substrate having one surface and the other surface , comprising:one or plurality of processing liquid supply units that supplies a processing liquid to the one surface of the substrate;a first temperature processing unit that performs temperature processing on the substrate before the processing liquid is supplied or after the processing liquid is supplied by the one or plurality of processing liquid supply units;a first transport device, having a first holder that holds the other surface of the substrate without coming into contact with an edge of the substrate, configured to transport the substrate by moving the first holder; anda controller that controls the first transport device such that the substrate is transported between any one of the one or plurality of processing liquid supply units and the first temperature processing unit, whereineach of the one or plurality of processing liquid supply units includesa second holder that holds the other surface of the substrate without coming into contact with the edge of the substrate, anda liquid supply mechanism that supplies a coating ...

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Номер записи: 74
06-03-2014 дата публикации

POSITIVE-WORKING LITHOGRAPHIC PRINTING PLATE PRECURSOR FOR INFRARED LASER AND PROCESS FOR MAKING LITHOGRAPHIC PRINTING PLATE

Номер: US20140065538A1
Автор: AOSHIMA Norio, TAGUCHI Yoshinori, WATANABE Noriaki
Принадлежит: FUJIFILM Corporation

A positive-working lithographic printing plate precursor for infrared laser is provided that includes, layered sequentially above a support, a lower layer and an upper layer, the lower layer and/or the upper layer including an infrared absorbing agent, either the lower layer comprising an alkali-soluble group-containing graft copolymer or the upper layer comprising a sulfonamide group-, active imide group-, and/or amide group-containing graft copolymer, and the graft copolymer being a polyurethane resin having as a graft chain an ethylenically unsaturated monomer-derived constitutional unit. There is also provided a process for making a lithographic printing plate, the process including in sequence an exposure step of imagewise exposing by means of an infrared laser the positive-working lithographic printing plate precursor for infrared laser and a development step of developing using an aqueous alkali solution with a pH of 8.5 to 10.8. 1. A positive-working lithographic printing plate precursor for infrared laser comprising , layered sequentially above a support ,a lower layer comprising an alkali-soluble group-containing graft copolymer; andan upper layer that increases in solubility in aqueous alkali solution upon exposure;the lower layer and/or the upper layer comprising an infrared absorbing agent, andthe graft copolymer in the lower layer being a polyurethane having as a graft chain an ethylenically unsaturated monomer-derived constitutional unit.2. The positive-working lithographic printing plate precursor for infrared laser according to claim 1 , wherein the polyurethane is a reaction product of a diisocyanate and a diol.3. The positive-working lithographic printing plate precursor for infrared laser according to claim 1 , wherein the graft chain comprises an acidic hydroxy group and/or an acidic amino group as the alkali-soluble group.4. The positive-working lithographic printing plate precursor for infrared laser according to claim 1 , wherein the graft ...

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Номер записи: 75
13-03-2014 дата публикации

Spin coating apparatus and method

Номер: US20140072709A1
Автор: Keisuke Nakazawa
Принадлежит: Toshiba Corp

In one embodiment, a spin coating apparatus includes a coating liquid feeding module to drop a coating liquid onto a substrate, and a motor to rotate the substrate. The module drops a first drop amount of the coating liquid onto the substrate at a first discharge rate, while the motor rotates the substrate at a first number of rotations. The module drops a second drop amount of the coating liquid onto the substrate at a second discharge rate larger than the first discharge rate, while the motor rotates the substrate at a second number of rotations smaller than the first number of rotations, after the first drop amount of the coating liquid is dropped. The module discharges the coating liquid onto the substrate at a third discharge rate smaller than the second discharge rate, after the coating liquid is discharged onto the substrate at the second discharge rate.

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Номер записи: 76
20-03-2014 дата публикации

Pigment dispersion, ink composition including pigment dispersion, and color filter yellow resist composition including pigment dispersion

Номер: US20140080063A1
Автор: Kaoru Takahashi, Masao Nakano, Masashi Hirose, Satoshi Saito, Taichi Shintou, Takayuki Ujifusa, Takeshi Miyazaki, Yutaka Tani
Принадлежит: Canon Inc

The present invention provides a pigment dispersion excellent in dispersibility. Furthermore, the present invention provides a color filter yellow resist composition and an ink composition, which include the pigment dispersion. A pigment dispersion containing at least a compound represented by General formula (1) and a yellow pigment represented by General formula (2) in a dispersion medium and a method for manufacturing the same are provided. Furthermore, a color filter yellow resist composition and an ink composition are provided, wherein images can be displayed with high spectral characteristics and high display contrast because the brightness is high and the hue of yellow is excellent.

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Номер записи: 77
20-03-2014 дата публикации

RESIST PROTECTIVE FILM-FORMING COMPOSITION AND PATTERNING PROCESS

Номер: US20140080064A1
Автор: Hatakeyama Jun
Принадлежит: SHIN-ETSU CHEMICAL CO., LTD.

A pattern is printed by forming a photoresist layer on a wafer, forming a protective film thereon, exposure, and development. The protective film is formed from a composition comprising a copolymer comprising recurring units derived from a styrene, indene, benzofuran or benzothiophene monomer having 1,1,1,3,3,3-hexafluoro-2-propanol, and recurring units derived from a styrene, vinylnaphthalene, indene, benzofuran, benzothiophene, stilbene, styrylnaphthalene or dinaphthylethylene monomer and an ether solvent. 2. The protective film-forming composition of which is soluble in an alkaline developer.3. The protective film-forming composition of claim 1 , further comprising an ether solvent selected from the group consisting of diisopropyl ether claim 1 , diisobutyl ether claim 1 , diisopentyl ether claim 1 , di-n-pentyl ether claim 1 , methyl cyclopentyl ether claim 1 , methyl cyclohexyl ether claim 1 , di-n-butyl ether claim 1 , di-sec-butyl ether claim 1 , diisopentyl ether claim 1 , di-sec-pentyl ether claim 1 , di-tert-amyl ether claim 1 , and di-n-hexyl ether.4. The protective film-forming composition of claim 3 , further comprising an alcohol solvent in admixture with the ether solvent claim 3 , said alcohol solvent being selected from the group consisting of 1-butyl alcohol claim 3 , 2-butyl alcohol claim 3 , isobutyl alcohol claim 3 , tert-butyl alcohol claim 3 , 1-pentanol claim 3 , 2-pentanol claim 3 , 3-pentanol claim 3 , tert-amyl alcohol claim 3 , neopentyl alcohol claim 3 , 2-methyl-1-butanol claim 3 , 3-methyl-1-butanol claim 3 , 3-methyl-3-pentanol claim 3 , cyclopentanol claim 3 , 1-hexanol claim 3 , 2-hexanol claim 3 , 3-hexanol claim 3 , 2 claim 3 ,3-dimethyl-2-butanol claim 3 , 3 claim 3 ,3-dimethyl-1-butanol claim 3 , 3 claim 3 ,3-dimethyl-2-butanol claim 3 , 2-ethyl-1-butanol claim 3 , 2-methyl-1-pentanol claim 3 , 2-methyl-2-pentanol claim 3 , 2-methyl-3-pentanol claim 3 , 3-methyl-1-pentanol claim 3 , 3-methyl-2-pentanol claim 3 , 3-methyl-3- ...

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Номер записи: 78
27-03-2014 дата публикации

COLOR FILTER SUBSTRATE AND FABRICATION METHOD THEREOF, TRANSFLECTIVE LIQUID CRYSTAL DISPLAY DEVICE

Номер: US20140085742A1
Автор: HUI Guanbao, QI Yonglian, Wang Can, XUE Jianshe
Принадлежит: BOE Technology Group Co., Ltd.

A color filter substrate and a fabrication method thereof, and a transflective liquid crystal display device are provided. The color filter substrate comprises: a transparent base substrate; a plurality of separators formed on a surface of the transparent base substrate and separating the surface of the transparent base substrate into a plurality of color filter regions; a plurality of color filter patterns that arrange alternatively with the separators, wherein each color filter pattern covers one color filter region; an aperture formed in the color filter pattern on at least one of the color filter regions; a flat protective layer at least disposed on the color filter pattern and the aperture, wherein an upper surface of a portion of the flat protective layer above the color filter pattern is even with an upper surface of a portion of the flat protective layer above the aperture. 1. A color filter substrate , comprising:a transparent base substrate;a plurality of separators formed on a surface of the transparent base substrate and separating the surface of the transparent base substrate into a plurality of color filter regions;a plurality of color filter patterns that arrange alternatively with the separators, wherein each color filter pattern covers one color filter region;an aperture formed in the color filter pattern on at least one of the color filter regions;a flat protective layer at least disposed on the color filter pattern and the aperture,wherein an upper surface of a portion of the flat protective layer above the color filter pattern is even with an upper surface of a portion of the flat protective layer above the aperture.2. The color filter substrate according to claim 1 , wherein the color filter substrate further comprises a columnar spacer disposed above the separator claim 1 , and an upper surface of the columnar spacer is higher than an upper surface of the flat protective layer.3. The color filter substrate according to claim 2 , wherein the ...

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Номер записи: 79
27-03-2014 дата публикации

PRINTING FORM PRECURSOR HAVING INDICIA AND A METHOD FOR PREPARING A PRINTING FORM FROM THE PRECURSOR

Номер: US20140087306A1
Автор: Blomquist Robert, LUNGU ADRIAN, Lungu Violeta, Subramanian Rajgopal
Принадлежит: E I DU PONT DE NEMOURS AND COMPANY

The present invention relates to a photosensitive printing form precursor and a method for forming a printing form from the precursor. The precursor includes a support and a layer of a photosensitive composition adjacent the support, in which at least one indicia is disposed between the support and the photosensitive layer. The indicia identifies the precursor, is retained throughout a multi-step process to convert the precursor into a printing form and in the end-use of the printing form. 2. The precursor or wherein the at least one indicia is transparent to actinic radiation.3. The precursor of wherein the actinic radiation is ultraviolet radiation and the at least one indicia is created with an ink that transmits at least 1% of the ultraviolet radiation.4. The precursor of wherein the actinic radiation is ultraviolet radiation and the at least one indicia is created with an ink that transmits at least 15% of the ultraviolet radiation.5. The precursor of wherein the actinic radiation is ultraviolet radiation between about 300 and 390 nm claim 1 , and the at least one indicia is created with a blue ink that transmits at least 10% of the actinic radiation.6. The printing form precursor of wherein the indicia is applied on a surface of the support to transmit at least 5% of actinic radiation to the photopolymerizable layer.7. The precursor of wherein the at least one indicia is applied by printing or ink jetting an ink on a surface of the support that is adjacent the photopolymerizable layer.8. The precursor of wherein the at least one indicia is selected from a solid line image or a halftone image.9. The precursor of wherein the indicia in the precursor is viewable in visible light or safelight.10. The precursor of wherein the indicia has a color that sufficiently contrasts with the photopolymerizable layer to be visible.11. The printing form precursor of further comprising a plurality of the indicia forming a pattern with intervals having no indicia.12. The ...

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Номер записи: 80
03-04-2014 дата публикации

COMPOSITION FOR FORMING LIQUID IMMERSION UPPER LAYER FILM, RESIST PATTERN-FORMING METHOD, POLYMER, AND COMPOUND

Номер: US20140093826A1
Автор: KUSABIRAKI Kazunori, MINEGISHI Shinya, Tanaka Kiyoshi
Принадлежит: JSR Corporation

A composition for forming a liquid immersion upper layer film includes a polymer component including a polymer having a structural unit represented by a formula (1); and a solvent. Rrepresents a carboxy group or a group represented by a formula (2); X represents a single bond, a divalent hydrocarbon group having 1 to 20 carbon atoms or a divalent fluorinated hydrocarbon group having 1 to 20 carbon atoms; Rrepresents a hydrocarbon group having 1 to 20 carbon atoms and a valency of (n+1), a fluorinated hydrocarbon group having 1 to 20 carbon atoms and a valency of (n+1), or one of these groups each including between adjacent two carbon atoms thereof —CO—, —COO—, —O—, —NR′—, —CS—, —S—, —SO—, —SO— or a combination thereof; and Rrepresents a hydrogen atom or a monovalent organic group having 1 to 20 carbon atoms. 2. The composition according to claim 1 , wherein the polymer component further comprises a second structural unit that comprises a sulfo group claim 1 , the second structural unit being included in a second polymer which is identical to or different from the first polymer.3. The composition according to claim 1 , wherein the polymer component further comprises a third structural unit that comprises a fluorinated alkyl group or a fluorinated cycloalkyl group claim 1 , the third structural unit being included in a third polymer which is identical to or different from the first polymer.5. The composition for forming a liquid immersion upper layer film according to claim 1 , wherein the solvent comprises an ether solvent.6. A resist pattern-forming method comprising:providing a resist film using a photoresist composition;{'claim-ref': {'@idref': 'CLM-00001', 'claim 1'}, 'providing a liquid immersion upper layer film on the resist film using the composition according to ;'}exposing the resist film having the liquid immersion upper layer film provided thereon to an exposure light through a liquid immersion medium; anddeveloping the resist film.9. The composition ...

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Номер записи: 81
10-04-2014 дата публикации

Composition for forming resist underlayer film for euv lithography

Номер: US20140099791A1
Автор: Bangching Ho, Rikimaru Sakamoto, Takafumi Endo
Принадлежит: Nissan Chemical Corp

A method for producing a semiconductor device includes the steps of: applying a composition for forming a resist underlayer film for EUV lithography including a novolac resin containing a halogen atom onto a substrate having a film to be fabricated for forming a transferring pattern and baking the composition so as to form a resist underlayer film for EUV lithography; and applying a resist for EUV lithography onto the resist underlayer film for EUV lithography, irradiating, with EUV through a mask, the resist underlayer film for EUV lithography and a film of the resist for EUV lithography on the resist underlayer film, developing the film of the resist for EUV lithography, and transferring an image formed in the mask onto the substrate by dry etching so as to form an integrated circuit device.

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Номер записи: 82
01-01-2015 дата публикации

Monomer for hardmask composition and hardmask composition including the monomer and method of forming patterns using the hardmask composition

Номер: US20150001178A1
Автор: Chung-Heon Lee, Go-Un Kim, Hea-Jung KIM, Hyun-Ji SONG, Joon-Young Moon, Seung-Hee Hong, Seung-Wook Shin, Yo-Choul PARK, Yong-Woon YOON, Yoo-Jeong Choi, You-Jung PARK, Young-Min Kim, Yu-Shin Park, Yun-Jun KIM
Принадлежит: Cheil Industries Inc

A monomer for a hardmask composition is represented by the following Chemical Formula 1,

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Номер записи: 83
07-01-2016 дата публикации

METHOD FOR PRODUCING A MICROSCREEN

Номер: US20160001231A1
Автор: KORNELY Susanne, Schieber Markus, SICKERT Daniel
Принадлежит: SIEMENS AKTIENGESELLSCHAFT

A method for producing a microscreen is described in which, in a first step, a support is provided, in a second step, a photoresist layer with a definable thickness is applied to the support, in an exposure step, the photoresist is exposed by means of the effect of radiation using a mask that defines the structure of the microscreen, in a development step, the photoresist is developed, characterized in that the thickness of the photoresist layer is selected such that, in a sub-region of the photoresist layer, the radiation used for the exposure penetrates only so slightly that practically no cross-linking of the photoresist takes place. 16-. (canceled)7. A process for producing a microsieve , comprising:applying a photoresist layer to a carrier, the photoresist layer having a definable thickness chosen such that radiation used for exposure penetrates into a subregion of the photoresist layer insufficiently to cause any substantial crosslinking of the photoresist;exposing the photoresist layer by action of radiation using a mask defining a structure of the microsieve; anddeveloping the photoresist. The invention relates to a process for producing a microsieve.For demanding separation tasks, for example in medical technology or biotechnology, microsieves are increasingly being used. For instance, the enrichment or extraction of particular cells from human blood can be effected by means of filtration of the blood through a microsieve (microfiltration). Microsieves, in contrast to the conventional microfilters made from sponge-like polymeric or ceramic membranes, have a defined pore geometry and are therefore much more efficient and have better classification.For optimization of a filtration method, a freely selectable pore geometry and pore density and distribution of the microsieve are advantageous. In contrast to sponge-like filter membranes, the particles retained barely penetrate into the surface, if at all, in the case of microsieves. Thus, they are firstly more ...

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Номер записи: 84
07-01-2021 дата публикации

A LITHOGRAPHIC PRINTING PLATE PRECURSOR

Номер: US20210001617A1
Автор: Billiet Thomas
Принадлежит:

A lithographic printing plate precursor is disclosed including a coating comprising a polymerisable compound, an infrared absorbing dye, a photoinitiator including a trihaloalkyl group and a borate compound. 110-. (canceled)12. The lithographic printing plate precursor of claim 11 , wherein the aryl group of the tribromomethyl aryl sulfone is substituted by at least one electron-donating group in an ortho or para position.14. The lithographic printing plate precursor of claim 11 , wherein R claim 11 , R claim 11 , Rand Rare independently an optionally substituted aryl group or an optionally substituted heteroaryl group.15. The lithographic printing plate precursor of claim 11 , wherein the borate compound is present in the coating an amount between 0.05% and 30% by weight.17. A method for making a printing plate including the steps of{'claim-ref': {'@idref': 'CLM-00011', 'claim 11'}, 'a. image-wise exposing the lithographic printing plate precursor of to heat and/or IR radiation to produce a lithographic image consisting of image areas and non-image areas;'}b. developing the exposed precursor.18. The method according to claim 17 , wherein the image-wise exposing step induces a colour change in the image areas.19. The method of claim 17 , wherein the precursor is developed by mounting the precursor on a plate cylinder of a lithographic printing press and rotating the plate cylinder while feeding dampening liquid and/or ink to the precursor.20. The method of claim 17 , wherein the precursor is developed by applying a gum solution to the precursor. The invention relates to a novel lithographic printing plate precursor.Lithographic printing typically involves the use of a so-called printing master such as a printing plate which is mounted on a cylinder of a rotary printing press. The master carries a lithographic image on its surface and a print is obtained by applying ink to said image and then transferring the ink from the master onto a receiver material, which is ...

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Номер записи: 85
07-01-2021 дата публикации

PLANOGRAPHIC PRINTING PLATE PRECURSOR AND METHOD OF PRODUCING PLANOGRAPHIC PRINTING PLATE PRECURSOR

Номер: US20210001618A1
Автор: IKEYAMA Yusuke, NAMBA Yusuke, OSHIMA Atsushi, SONE Nobuyuki
Принадлежит: FUJIFILM Corporation

Provided are a planographic printing plate precursor and a method of producing a planographic printing plate precursor, in which an image forming region during printing on newspaper page is ensured and edge stains are eliminated. Provided are a planographic printing plate precursor () including an aluminum support () which has an anodized film (), and an image recording layer () on the aluminum support (), in which an end portion of the planographic printing plate precursor () has a sagging shape having a sagging amount (X) of 25 μm to 150 μm and a sagging width (Y) of 70 μm to 300 μm, the image recording layer () contains an infrared absorbing agent, and a part or an entire side surface of two sides of the aluminum support (), the two sides having the sagging shape and opposing each other contains an ink repellent agent (); and a method of producing the planographic printing plate precursor (). 1. A planographic printing plate precursor comprising:an aluminum support which has an anodized film; andan image recording layer on the aluminum support,wherein an end portion of the planographic printing plate precursor has a sagging shape having a sagging amount X of 25 μm to 150 μm and a sagging width Y of 70 μm to 300 μm,the image recording layer contains an infrared absorbing agent,a part or an entire side surface of two sides of the aluminum support, the two sides having the sagging shape and opposing each other contains an ink repellent agent, andthe arithmetic average height Sa of the surface of the outermost layer on a side where the image recording layer is provided is in a range of 0.3 μm to 20 μm.2. The planographic printing plate precursor according to claim 1 ,wherein at least a region which extends to a distance of 30 μm from a surface of the aluminum support on a side of the image recording layer contains the ink repellent agent.3. The planographic printing plate precursor according to claim 1 ,{'sup': 2', '2, 'wherein an amount of the ink repellent agent is ...

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Номер записи: 86
01-01-2015 дата публикации

Methods for Forming a Channel Through a Polymer Layer Using One or More Photoresist Layers

Номер: US20150004058A1
Автор: Linhardt Jeffrey George, Parviz Babak, Yao Huanfen
Принадлежит:

A method may involve forming one or more photoresist layers over a sensor located on a structure, such that the sensor is covered by the one or more photoresist layers. The sensor is configured to detect an analyte. The method may involve forming a first polymer layer. Further, the method may involve positioning the structure on the first polymer layer. Still further, the method may involve forming a second polymer layer over the first polymer layer and the structure, such that the structure is fully enclosed by the first polymer layer, the second polymer layer, and the one or more photoresist layers. The method may also involve removing the one or more photoresist layers to form a channel through the second polymer layer, wherein the sensor is configured to receive the analyte via the channel. 1. A method comprising:forming one or more photoresist layers over a sensor located on a structure, such that the sensor is covered by the one or more photoresist layers, wherein the sensor is configured to detect an analyte;forming a first polymer layer, wherein the first polymer layer defines a posterior side of an eye-mountable device;positioning the structure on the first polymer layer;forming a second polymer layer over the first polymer layer and the structure, such that the structure is fully enclosed by the first polymer layer, the second polymer layer, and the one or more photoresist layers, wherein the second polymer layer defines an anterior side of the eye-mountable device; andremoving the one or more photoresist layers to form a channel through the second polymer layer, wherein the sensor is configured to receive the analyte via the channel.2. The method of claim 1 , wherein the forming one or more photoresist layers over a sensor located on a structure comprises forming a first photoresist layer over the sensor and forming a second photoresist layer over the first photoresist layer.3. The method of claim 1 , wherein the forming one or more photoresist layers ...

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Номер записи: 87
01-01-2015 дата публикации

Coating film forming apparatus, coating film forming method, and recording medium

Номер: US20150004311A1
Автор: Katsunori Ichino, Kousuke Yoshihara, Yuichi Terashita
Принадлежит: Tokyo Electron Ltd

A coating film forming apparatus includes: a substrate holding unit to horizontally hold a substrate; a rotating mechanism to rotate the substrate held by the substrate holding unit; a coating liquid supplying mechanism to supply coating liquid to form a coating film on the substrate; an annular member to rectify a gas stream above a periphery of the substrate when liquid film of the coating liquid is dried by rotation of the substrate, the annular member being provided above the periphery of the substrate and along a circumferential direction of the substrate so as to cover the periphery of the substrate; and a protrusion provided on an inner periphery of the annular member along circumferential direction of the annular member so as to protrude upward to reduce component of the gas stream flowing directly downward near an inner peripheral edge of the annular member.

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Номер записи: 88
05-01-2017 дата публикации

Elastomer-Assisted Manufacturing

Номер: US20170003594A1
Автор: RABINOWITZ Jake, SOMU Sivasubramanian
Принадлежит: NORTHEASTERN UNIVERSITY

Methods of performing lithography in films attached to elastomeric substrates are provided, including methods of performing optical lithography using photoresist films on a stretched elastomeric substrate. Also described are flexible electronic devices made by the methods, and patterned substrates having small voids fabricated by the methods. 1. A method of performing lithography , the method comprising the steps of:{'sub': 's', '(a) providing an elastomeric substrate in an unstretched state, the substrate having a first length lin a dimension of the substrate;'}{'sub': 's', '(b) applying a tensile stress along the dimension of the substrate, thereby causing the substrate to stretch along said dimension, achieving a stretched state, wherein the substrate has a second length l′ in the dimension of the substrate;'}(c) retaining the substrate in its stretched state;(d) optionally, depositing an adhesion-promoting layer onto the stretched substrate;(e) depositing a photoresist layer onto the substrate, or if present, the adhesion-promoting layer, while the substrate is in the stretched state;{'sub': 'v', '(f) creating a void in the photoresist layer and, if present, the adhesion-promoting layer by lithography, the void having a first length lalong the dimension of stretch; and'}{'sub': 'v', '(g) relieving the tensile stress, whereby the substrate returns to the unstretched state, and wherein the void has a second length l′ in said dimension.'}2. The method of claim 1 , wherein step (d) is performed.3. The method of claim 1 , wherein step (e) comprises depositing a plurality of two or more photoresist sub-layers claim 1 , adjacent photoresist sub-layers optionally separated by an adhesion-promoting sub-layer.4. The method of claim 1 , wherein the photoresist layer is from about 0.15 μm to about 50 μm thick.5. The method of claim 1 , wherein the tensile stress is applied uniformly along the dimension of the substrate.6. The method of claim 1 , wherein the tensile stress ...

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Номер записи: 89
05-01-2017 дата публикации

PATTERN-FORMING METHOD, RESIN, AND COMPOSITION

Номер: US20170003595A1
Автор: AOKI Shun, ISHIKAWA Masayoshi, Kimura Toru, TAKIMOTO Yoshio, Tanaka Hiromitsu, Wakamaytsu Goji
Принадлежит: JSR Corporation

A pattern-forming method comprises: forming a resist underlayer film on an upper face side of a substrate; forming a silicon-containing film on an upper face side of the resist underlayer film; and removing at least a part of the resist underlayer film and at least a part of the silicon-containing film with a basic aqueous solution. Preferably, the pattern-forming method further comprises, after the forming of the silicon-containing film and before the removing of the resist underlayer film and the silicon-containing film, forming a resist pattern on an upper face side of the silicon-containing film, and etching the silicon-containing film using the resist pattern as a mask. 1. A pattern-forming method comprising:forming a resist underlayer film on an upper face side of a substrate;forming a silicon-containing film on an upper face side of the resist underlayer film;forming a resist pattern on an upper face side of the silicon-containing film;etching the silicon-containing film using the resist pattern as a mask; andto removing at least a part of the resist underlayer film and at least a part of the silicon-containing film with a basic aqueous solution.2. The pattern-forming method according to claim 1 , wherein the basic aqueous solution is a liquid comprising tetraalkylammonium hydroxide and water claim 1 , or a liquid obtained by mixing ammonia claim 1 , hydrogen peroxide and water.3. The pattern-forming method according to claim 1 , wherein the basic aqueous solution comprises none of hydrogen fluoride claim 1 , a salt thereof claim 1 , and a salt of a fluorine compound.4. The pattern-forming method according to claim 1 , wherein the removing of the resist underlayer film and the silicon-containing film is carried out at a temperature of less than 100° C.5. The pattern-forming method according to claim 1 , wherein the resist underlayer film is formed from a composition that comprises an aromatic ring-containing resin.6. The pattern-forming method according to ...

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Номер записи: 90
13-01-2022 дата публикации

A LITHOGRAPHIC PRINTING PLATE PRECURSOR

Номер: US20220009219A1
Автор: Billiet Thomas, Dom Elke, Loccufier Johan, VRIAMONT Nicolas
Принадлежит:

A lithographic printing plate precursor including a photopolymerisable coating and an overcoat layer provided on top of said layer, characterized in that the overcoat layer includes a compound comprising at least one moiety having a structure according to Formula (I): (I). 110-. (canceled)13. A printing plate precursor according to claim 12 , wherein the terminal groups Rand Rare represented by hydrogen claim 12 , an optionally substituted alkyl or cycloalkyl group claim 12 , an optionally substituted aryl group claim 12 , an optionally substituted aralkyl group or an optionally substituted heteroaryl group.14. A printing plate precursor according to claim 12 , wherein the divalent linking groups Land Lindependently represent an optionally substituted alkylene or cycloalkylene group.15. A method for making a lithographic printing plate precursor comprising:{'claim-ref': {'@idref': 'CLM-00011', 'claim 11'}, 'applying on a support a photopolymerisable layer and an overcoat layer as defined in ; and'}drying the precursor.16. A method for making a printing plate comprising:{'claim-ref': {'@idref': 'CLM-00011', 'claim 11'}, 'image-wise exposing the printing plate precursor as defined in to heat and/or light; and'}developing the precursor.17. The method according to claim 16 , wherein the precursor is exposed with laser light having a wavelength between 350 and 450 nm.18. The method according to claim 16 , wherein the precursor is exposed with laser light having a wavelength between 750 and 1500 nm.19. The method according to claim 16 , wherein the developing step is carried out on press by mounting the exposed precursor on a plate cylinder of a lithographic printing press and rotating the plate cylinder while feeding dampening liquid and/or ink to the coating.20. The method according to claim 16 , wherein the developing step is carried out off-press by treating the exposed precursor with a gum solution and whereby the precursor is developed and gummed in one single step. ...

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Номер записи: 91
07-01-2016 дата публикации

RADIATION-SENSITIVE COLORED COMPOSITIONS, CURED COLORED FILMS, COLOR FILTERS, PROCESSES FOR FORMING COLORED PATTERNS, PROCESSES FOR PREPARING COLOR FILTERS, SOLID-STATE IMAGE SENSORS AND LIQUID CRYSTAL DISPLAY DEVICES

Номер: US20160004154A1
Автор: GOTOU Akiyoshi, HARADA Masayuki, IDEI Hiroaki, OOTA Kazuya
Принадлежит: FUJIFILM Corporation

Herein provided are radiation-sensitive colored compositions suppressing a phenomenon in which a radiation-sensitive colored composition of another color penetrates into previously formed pixels to result in a decrease in the color purity of the previously obtained pixels; cured colored films and color filters using them; processes for forming colored patterns; processes for preparing the color filters; solid-state image sensors; and image display devices. 4. The radiation-sensitive colored composition according to claim 1 , wherein the dyestuff has a weight average molecular weight of 5000 or more.5. The radiation-sensitive colored composition according to claim 3 , wherein the dyestuff has a weight average molecular weight of 5000 or more.6. The radiation-sensitive colored composition according to claim 1 , which comprises a colorant including the dyestuff in a concentration of 50% by mass or more claim 1 , relative to the total solids of the radiation-sensitive colored composition.7. The radiation-sensitive colored composition according to claim 3 , which comprises a colorant including the dyestuff in a concentration of 50% by mass or more claim 3 , relative to the total solids of the radiation-sensitive colored composition.8. The radiation-sensitive colored composition according to claim 1 , wherein the dye contains a partial structure derived from a dye selected from dipyrromethene dyes claim 1 , azo dyes claim 1 , anthraquinone dyes claim 1 , triphenylmethane dyes claim 1 , xanthene dyes claim 1 , cyanine dyes claim 1 , squarylium dyes claim 1 , quinophthalone dyes claim 1 , phthalocyanine dyes and subphthalocyanine dyes.9. The radiation-sensitive colored composition according to claim 3 , wherein the dye contains a partial structure derived from a dye selected from dipyrromethene dyes claim 3 , azo dyes claim 3 , anthraquinone dyes claim 3 , triphenylmethane dyes claim 3 , xanthene dyes claim 3 , cyanine dyes claim 3 , squarylium dyes claim 3 , quinophthalone ...

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Номер записи: 92
02-01-2020 дата публикации

GAP FILL OF IMPRINTED STRUCTURE WITH SPIN COATED HIGH REFRACTIVE INDEX MATERIAL FOR OPTICAL COMPONENTS

Номер: US20200003936A1
Автор: FU Jinxin, Godet Ludovic, MCMILLAN Wayne
Принадлежит:

Embodiments of the present disclosure generally relate to a method for forming an optical component, for example, for a virtual reality or augmented reality display device. In one embodiment, the method includes forming a first layer on a substrate, and the first layer has a first refractive index. The method further includes pressing a stamp having a pattern onto the first layer, and the pattern of the stamp is transferred to the first layer to form a patterned first layer. The method further includes forming a second layer on the patterned first layer by spin coating, and the second layer has a second refractive index greater than the first refractive index. The second layer having the high refractive index is formed by spin coating, leading to improved nanoparticle uniformity in the second layer. 1. A method , comprising:forming a first layer having a first refractive index on a substrate;pressing a stamp having a pattern onto the first layer;transferring the pattern to the first layer to form a patterned first layer; andforming a second layer having a second refractive index greater than the first refractive index on the patterned first layer by spin coating.2. The method of claim 1 , wherein the first refractive index ranges from about 1.1 to about 1.5.3. The method of claim 1 , wherein the first layer comprises porous silicon dioxide or quartz.4. The method of claim 1 , wherein the second layer comprises a metal oxide.5. The method of claim 1 , wherein the second layer comprises titanium oxide claim 1 , tantalum oxide claim 1 , zirconium oxide claim 1 , hafnium oxide claim 1 , or niobium oxide.6. The method of claim 1 , wherein the first layer is formed on the substrate by spin coating.7. A method claim 1 , comprising:forming a first layer having a first refractive index ranging from about 1.1 to about 1.5;pressing a stamp having a pattern onto the first layer;transferring the pattern to the first layer to form a patterned first layer; andforming a second ...

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Номер записи: 93
04-01-2018 дата публикации

VACUUM-INTEGRATED HARDMASK PROCESSES AND APPARATUS

Номер: US20180004083A1
Автор: ANTONELLI George Andrew, Gottscho Richard A., Hausmann Dennis M., Knisley Thomas Joseph, Kolics Artur, LaVoie Adrien, Marks Jeffrey, Reddy Sirish K., Varadarajan Bhadri N.
Принадлежит:

Vacuum-integrated photoresist-less methods and apparatuses for forming metal hardmasks can provide sub-30 nm patterning resolution. A metal-containing (e.g., metal salt or organometallic compound) film that is sensitive to a patterning agent is deposited on a semiconductor substrate. The metal-containing film is then patterned directly (i.e., without the use of a photoresist) by exposure to the patterning agent in a vacuum ambient to form the metal mask. For example, the metal-containing film is photosensitive and the patterning is conducted using sub-30 nm wavelength optical lithography, such as EUV lithography. 1. An apparatus for conducting photoresist-less metal mask formation , the apparatus comprising:a metal-containing film deposition module;a metal-containing film patterning module;a vacuum transfer module connecting the deposition module and the patterning module.2. The apparatus of claim 1 , wherein:the deposition module comprises reactor chamber for depositing a photosensitive metal halide or organometallic compound film; andthe patterning module comprises a photolithography tool with a source of sub-30 nm wavelength radiation.3. The apparatus of claim 1 , wherein the patterning module is a EUV lithography tool.4. The apparatus of claim 1 , wherein the patterning module has a source of a patterning agent selected from the group consisting of photons claim 1 , electrons claim 1 , protons claim 1 , ions and neutral species such that the metal-containing film can be patterned by exposure to the patterning agent.5. The apparatus of claim 1 , further comprising an ingoing load lock for transferring a substrate from the patterning module to the vacuum transfer module claim 1 , and an outgoing load lock for transferring a substrate to the patterning module from the vacuum transfer module; and wherein the outgoing load lock functions as an outgassing module.6. The apparatus of claim 1 , further comprising a controller including instructions for conducting ...

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Номер записи: 94
04-01-2018 дата публикации

LOW TEMPERATURE SC1 STRIPPABLE OXYSILANE-CONTAINING COATINGS

Номер: US20180004089A1
Автор: Huang Hong Min, LIU CHAO, Xu Helen Xiao
Принадлежит:

A composition for forming a coating is provided including at least one oxysilane-containing polymer or oligomer having an oxysilane group and at least one other organic crosslinkable group; an endcapping agent; and a solvent. A coated substrate, wherein the substrate is a silicon wafer or coated silicon wafer, includes an organic planarization layer in contact with the substrate, a photoresist layer, and a middle layer positioned between the organic planarization layer and the photoresist layer. The middle layer is formed from a composition including at least one oxysilane-containing polymer or oligomer having an oxysilane group and at least one other organic crosslinkable group, an endcapping agent; and a solvent. 1. A composition for forming a coating , the composition comprising:at least one oxysilane-containing polymer or oligomer having an oxysilane group and at least one other organic crosslinkable group;an endcapping agent; anda solvent.3. The composition of claim 1 , wherein the oxysilane-containing polymer or oligomer is an oxysilane containing acrylic urethane.5. The composition of claim 1 , wherein the oxysilane-containing polymer or oligomer has a weight average molecular weight of 500 Dalton to 10 claim 1 ,000 Dalton.6. The composition of claim 1 , wherein the oxysilane-containing polymer or oligomer comprises from 1 wt. % to 30 wt. % silicon.7. The composition of claim 1 , wherein the oxysilane-containing polymer or oligomer comprises from 0.5 wt. % to 30 wt. % of the total weight of the composition.8. The composition of claim 1 , wherein the endcapping agent is selected from the group consisting of: trimethylethoxy silane claim 1 , triethylmethoxy silane claim 1 , trimethylacetoxy silane claim 1 , trimethylsilanol claim 1 , triphenylsilanol claim 1 , triphenylmethoxysilane claim 1 , triphenylethoxysilane.9. The composition of claim 1 , wherein the endcapping agent includes acetoxy trimethyl silane.10. The composition of claim 1 , wherein a molar ratio ...

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Номер записи: 95
02-01-2020 дата публикации

MASK AND METHOD FOR FABRICATING THE SAME

Номер: US20200004136A1
Автор: Jou Jia-Guei, LIN JIUN-HAO, LU CHI-TA, TSAI CHI-MING, WU HUANG-MING
Принадлежит:

Present disclosure provide a method for fabricating a mask, including obtaining a target pattern to be imaged onto a substrate, providing a first scattering bar and a second scattering bar adjacent to consecutive edges of the target pattern, identifying a first length of the first scattering bar and a second length of the second scattering bar, connecting the first scattering bar and the second scattering bar when any of the first length and the second length is smaller than a predetermined value, identifying a separation between the first scattering bar and the second scattering bar subsequent to identifying the first length and the second length, disposing the first scattering bar and the second scattering bar in a first fashion when the separation is equal to zero, and disposing the first scattering bar and the second scattering bar in a second fashion when the separation is greater than zero. 1. A method for fabricating a mask , comprising:obtaining a target pattern to be imaged onto a substrate;providing a first scattering bar and a second scattering bar adjacent to consecutive edges of the target pattern;identifying a first length of the first scattering bar and a second length of the second scattering bar;connecting the first scattering bar and the second scattering bar when any of the first length and the second length is smaller than a predetermined value;identifying a separation between the first scattering bar and the second scattering bar subsequent to identifying the first length and the second length;disposing the first scattering bar and the second scattering bar in a first fashion when the separation is equal to zero; anddisposing the first scattering bar and the second scattering bar in a second fashion when the separation is greater than zero.2. The method of claim 1 , wherein no relative displacement is caused when connecting the first scattering bar and the second scattering bar.3. The method of claim 1 , wherein disposing the first scattering ...

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Номер записи: 96
02-01-2020 дата публикации

DEVICE HAVING COLOR RESISTS PATTERN

Номер: US20200004141A1
Автор: HSU MING-AN
Принадлежит:

A device having a color photo resist pattern includes a 3D substrate, at least one color photo resist layer and at least one circuit pattern layer. The at least one color photo resist layer is formed on said 3D substrate and forms a visual pattern together. The at least one circuit pattern layer is formed on said visual pattern formed by said at least one color photo resist layer. 1. A device having a color photo resist pattern , comprising:a 3D substrate;at least one color photo resist layer, forming on said 3D substrate, said at least one color photo resist layer forming a visual pattern together; andat least one circuit pattern layer, forming on said visual pattern formed by said at least one color photo resist layer.2. The device as claimed in claim 1 , wherein said at least one color photo resist layer forming a slope at the edge of said visual pattern and every single layer of said at least one color photo resist layer is connecting to said 3D substrate.3. The device as claimed in claim 2 , wherein the thickness of said at least one color photo resist layer is between 0.5 micrometers to 30 micrometers.4. The device as claimed in claim 2 , wherein the trace width of said visual pattern is more than 10 millimeters.5. The device as claimed in claim 2 , wherein said at least one color photo resist layer is more than two layers claim 2 , and the layer on the top is transparent.6. The device as claimed in claim 2 , wherein the hardness of said at least one color photo resist layer which is hardened is between 2H to 4H.7. The device as claimed in claim 1 , wherein said 3D substrate is made of a glass material claim 1 , a plastic material or a ceramic material. This application is a Divisional Application of co-pending application Ser. No. 15/395,804, filed on 30 Dec. 2016, for which priority is claimed under 35 U.S.C. § 120; the entire contents of all of which are hereby incorporated by reference.The present disclosure relates to a 3D substrate, especially to a ...

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Номер записи: 97
02-01-2020 дата публикации

Dispensing Nozzle Design and Dispensing Method Thereof

Номер: US20200004153A1
Автор: Cheng Wei Chang, Liao Chi-Hung
Принадлежит:

An apparatus for dispensing fluid includes a fluid source; a nozzle having an inner layer and an outer layer, the inner layer defining a bore in fluid communication with the fluid source; and a plurality of pins each moveable to be in physical contact with the outer layer, wherein the plurality of pins is operable to apply a force towards the outer layer to adjust a cross-section of the bore. 1. An apparatus for dispensing fluid , comprising:a fluid source;a nozzle having an inner layer and an outer layer, the inner layer defining a bore in fluid communication with the fluid source; anda plurality of pins each moveable to be in physical contact with the outer layer, wherein the plurality of pins is operable to apply a force towards the outer layer to adjust a cross-section of the bore.2. The apparatus of claim 1 , wherein each of the plurality of pins is moveable in a direction perpendicular to a longitudinal axis of the bore.3. The apparatus of claim 1 , wherein each of the plurality of pins is movable by applying a gaseous pressure.4. The apparatus of claim 1 , wherein the inner and outer layers are made of elastic material.5. The apparatus of claim 4 , wherein the elastic material of the inner layer is more rigid than that of the outer layer.6. The apparatus of claim 1 , wherein the inner and outer layers form a cavity that can be inflated by pumping in gas.7. The apparatus of claim 1 , wherein the cross-section of the bore is adjustable to vary in shapes.8. The apparatus of claim 7 , wherein the shapes are selected from triangle claim 7 , rectangle claim 7 , square claim 7 , circle claim 7 , oval claim 7 , and polygon.9. The apparatus of claim 1 , wherein the cross-section of the bore is adjustable to vary in cross-sectional areas along a longitudinal axis of the bore.10. The apparatus of claim 1 , further comprising:a gas outlet nozzle in a proximity region of an orifice of the nozzle, wherein the gas outlet nozzle is operable to increase an ambient pressure in ...

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Номер записи: 98
07-01-2021 дата публикации

COMPOSITION FOR FORMING ORGANIC FILM, SUBSTRATE FOR MANUFACTURING SEMICONDUCTOR DEVICE, METHOD FOR FORMING ORGANIC FILM, PATTERNING PROCESS, AND POLYMER

Номер: US20210003920A1
Автор: KORI Daisuke, NIIDA Keisuke, OGIHARA Tsutomu, SAWAMURA Takashi, Tachibana Seiichiro, WATANABE Takeru
Принадлежит: SHIN-ETSU CHEMICAL CO., LTD.

A composition for forming an organic film contains a polymer having a partial structure shown by the following general formula (1) as a repeating unit, and an organic solvent. Each of AR1 and AR2 represents a benzene ring or naphthalene ring which optionally have a substituent; Wrepresents a particular partial structure having a triple bond, and the polymer optionally contains two or more kinds of W; and Wrepresents a divalent organic group having 6 to 80 carbon atoms and at least one aromatic ring. This invention provides: a polymer curable even under film formation conditions in an inert gas and capable of forming an organic film which has not only excellent heat resistance and properties of filling and planarizing a pattern formed in a substrate, but also favorable film formability onto a substrate with less sublimation product; and a composition for forming an organic film, containing the polymer. 3. The composition for forming an organic film according to claim 1 , wherein the polymer has a weight-average molecular weight of 1000 to 5000.4. The composition for forming an organic film according to claim 1 , wherein the organic solvent is a mixture of one or more organic solvents each having a boiling point of lower than 180° C. and one or more organic solvents each having a boiling point of 180° C. or higher.5. The composition for forming an organic film according to claim 1 , further comprising at least one of a surfactant and a plasticizer.6. A substrate for manufacturing a semiconductor device claim 1 , comprising an organic film on the substrate claim 1 , the organic film being formed by curing the composition for forming an organic film according to .7. A method for forming an organic film employed in a semiconductor device manufacturing process claim 1 , the method comprising the steps of:{'claim-ref': {'@idref': 'CLM-00001', 'claim 1'}, 'spin-coating a substrate to be processed with the composition for forming an organic film according to ; and'}heating ...

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Номер записи: 99
03-01-2019 дата публикации

SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD

Номер: US20190004427A1
Автор: ASAI Masaya, HARUMOTO Masahiko, KANEYAMA Koji, Tanaka Yuji
Принадлежит:

A substrate processing apparatus includes a spin chuck that holds a substrate, a processing liquid supply unit that supplies a first processing liquid having first specific gravity and a second processing liquid having second specific gravity smaller than the first specific gravity to a surface to be processed of the substrate held by the spin chuck, a collection tank that stores the used first and second processing liquids that have been supplied to the substrate, and a processing liquid separating mechanism that separates the first processing liquid and the second processing liquid based on specific gravity, the first and second processing liquids being stored in the collection tank. 1. A substrate processing apparatus comprising:a substrate holder that holds a substrate;a processing liquid supply unit that supplies a first processing liquid having first specific gravity and a second processing liquid having second specific gravity smaller than the first specific gravity to a surface to be processed of the substrate held by the substrate holder;a storage that stores the used first and second processing liquids that have been supplied to the substrate; anda processing liquid separating mechanism that separates the first processing liquid and the second processing liquid based on specific gravity, the first and second processing liquids being stored in the storage.2. The substrate processing apparatus according to claim 1 , whereinthe processing liquid separating mechanism includesa first discharge pipe provided to discharge the used first processing liquid from the storage,a second discharge pipe provided to discharge the used second processing liquid from the storage,a first discharge valve inserted into the first discharge pipe,a boundary surface detector that detects a boundary surface between the first processing liquid and the second processing liquid that are stored in the storage, anda controller that acquires the boundary surface detected by the boundary ...

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Номер записи: 100