Highly dilutable polishing concentrates and slurries
Номер патента: EP2489066A1
Опубликовано: 22-08-2012
Автор(ы): Bin Hu, Deepak Mahulikar, Hyungjun Kim, Minae Tanaka, Richard Wen
Принадлежит: Fujifilm Planar Solutions LLC
Опубликовано: 22-08-2012
Автор(ы): Bin Hu, Deepak Mahulikar, Hyungjun Kim, Minae Tanaka, Richard Wen
Принадлежит: Fujifilm Planar Solutions LLC
Реферат: The present disclosure provides a concentrate for use in chemical mechanical polishing slurries, and a method of diluting that concentrate to a point of use slurry. The concentrate comprises abrasive, complexing agent, and corrosion inhibitor, and the concentrate is diluted with water and oxidizer. These components are present in amounts such that the concentrate can be diluted at very high dilution ratios, without affecting the polishing performance.
Highly dilutable polishing concentrates and slurries
Номер патента: US8192644B2. Автор: Deepak Mahulikar,Hyungjun Kim,Richard Wen,Bin Hu,Minae Tanaka. Владелец: Fujifilm Planar Solutions LLC. Дата публикации: 2012-06-05.