Method for smoothing a surface of a glass substrate for a reflective mask blank used in EUV lithography

To provide a method for smoothing a surface of a glass substrate having a concave defect, such as a pit or a scratch. A method for smoothing a surface of a glass substrate having a concave defect thereon, comprising: forming a film on the surface of the glass substrate having the concave defect by a dry deposition method, the film comprising a glass material having a fluid point Tf of 150° C. or above and of not higher than a strain point Ts (° C.) of the glass substrate; and heating the film of the glass material at a temperature of not lower than Tf and not higher than Ts to put the film in such state that the film of the glass material can flow so as to bury the concave defect, followed by cooling the film of the glass material, thereby to smooth the surface of the glass substrate having the concave defect.

Reflective-type mask blank for EUV lithography

A reflective mask blank for EUV lithography including a substrate having a front surface and a rear surface, a reflective layer formed over the front surface of the substrate, an absorbing layer formed over the reflective layer, and a chucking layer formed on the rear surface of the substrate and positioned to chuck the substrate to an electrostatic chuck. The substrate has a non-conducting portion which eliminates electrical conduction between the reflective layer and the chucking layer and electrical conduction between the absorbing layer and the chucking layer, and the non-conducting portion is formed by forming a portion of the substrate covered with one or more covering members and preventing formation of the reflective layer and the absorbing layer.

REFLECTIVE MASK BLANK FOR EUV LITHOGRAPHY AND MASK FOR EUV LITHOGRAPHY

Provision of an EUV mask whereby an influence of reflected light from a region outside a mask pattern region is suppressed, and an EUV mask blank to be employed for production of such an EUV mask. A reflective mask for EUV lithography (EUVL), comprising a substrate having a mask pattern region and an EUV light-absorbing region located outside the mask pattern region; a reflective layer provided on the mask pattern region of the substrate for reflecting EUV light and having a portion on which an absorber layer is present and a portion on which no absorber layer is present; the portion on which an absorber layer is present and the portion on which no absorber layer is present being arranged so as to constitute a mask pattern; wherein the reflectivity of a surface of the absorber layer for EUV light is from 5 to 15% and the reflectivity of a surface of the EUV light-absorbing region for EUV light is at most 1%.

Reflective mask blank for EUV lithography

A reflective mask blank for EUV lithography is provided which has an absorber layer wherein stress and crystal structure can be easily controlled. A reflective mask blank for EUV lithography, which comprises a substrate, and at least a reflective layer for reflecting EUV light and an absorber layer for absorbing EUV light formed in this order on the substrate, wherein the absorber layer contains tantalum (Ta), nitrogen (N) and hydrogen (H); and in the absorber layer, the total content of Ta and N is from 50 to 99.9 at %, and the content of H is from 0.1 to 50 at %.

Reflective-type mask blank for EUV lithography

There are provided a substrate with a reflective layer and an EUV mask blank, which can prevent particles from adhering to a surface of the reflective layer or an absorbing layer, or into a reflective layer or an absorbing layer during formation thereof by eliminating electrical connection between a film formed on a front surface of the substrate and a film formed on a rear surface of the substrate. A substrate with a reflective layer, which is usable to fabricate a reflective mask blank for EUV lithography, comprising a chucking layer formed on a rear surface opposite a surface with the reflective layer formed thereon, the chucking layer serving to chuck and support the substrate by an electrostatic chuck, wherein the reflective layer has no electrical connection to the chucking layer.

Reflective-type mask blank for EUV lithography

There are provided a substrate with a reflective layer and an EUV mask blank, which can prevent particles from adhering to a surface of the reflective layer or an absorbing layer, or into a reflective layer or an absorbing layer during formation thereof by eliminating electrical connection between a film formed on a front surface of the substrate and a film formed on a rear surface of the substrate. A substrate with a reflective layer, which is usable to fabricate a reflective mask blank for EUV lithography, comprising a chucking layer formed on a rear surface opposite a surface with the reflective layer formed thereon, the chucking layer serving to chuck and support the substrate by an electrostatic chuck, wherein the reflective layer has no electrical connection to the chucking layer.

Cell unit of solid polymeric electrolyte type fuel cell

A polymer electrolyte fuel cell unit comprising (a) a polymer electrolyte membrane 2, (b) a pair of gas-diffusible electrodes 3, 4 respectively attached to both surfaces of the polymer electrolyte membrane 2, (c) a pair of porous, gas-diffusible, conductive graphite collectors 5, 5 in contact with the outside of the electrodes 3, 4, and (d) a pair of metal separators 7, 7 for introducing a fuel gas and an oxygen-containing gas separately into the electrodes 3, 4; a porous, conductive buffer layers 6, 6 having flexibility and gas permeability being provided between the metal separators 7, 7 and the graphite collectors 5, 5; and said metal separator 7, 7 being provided with a conductive, corrosion-resistant coating 9, 9 having a thickness of 0.01 to 10 μm, whose polarization current is 10 μA/cm2 or less when measured by an electrochemical polarization evaluation method, at least on a surface in contact with said porous, conductive buffer layer 6, 6.

Method for smoothing a surface of a glass substrate, and substrate for a reflective mask blank used in EUV lithography, obtainable by that method

To provide a method for smoothing a surface of a glass substrate having a concave defect, such as a pit or a scratch. A method for smoothing a surface of a glass substrate having a concave defect thereon, comprising: forming a film on the surface of the glass substrate having the concave defect by a dry deposition method, the film comprising a glass material having a fluid point Tf of 150° C. or above and of not higher than a strain point Ts (° C.) of the glass substrate; and heating the film of the glass material at a temperature of not lower than Tf and not higher than Ts to put the film in such state that the film of the glass material can flow so as to bury the concave defect, followed by cooling the film of the glass material, thereby to smooth the surface of the glass substrate having the concave defect.

Medicinal Composition Improving Leptin Resistance

The present invention provides a compound of formula (I) which improves leptin resistance, a pharmaceutical composition comprising the compound, a method for manufacturing a pharmaceutical for improving leptin resistance comprising using the compound, use of the compound for manufacturing a pharmaceutical for improving leptin resistance, and a method for improving leptin resistance comprising administering the compound or the pharmaceutical composition. The improvement of leptin resistance can lead treatment and/or prevention of a disorder associated with leptin resistance, including, particularly, metabolic disorder, obesity, hyperphagia, steatosis, diabetes, and dyslipidemia.

Substrate for EUV mask blanks

A substrate that is suitable for an EUV mask or an EUV mask blank and excellent in flatness, is provided. A substrate for an EUV mask blank, which is made of a silica glass containing from 1 to 12 mass % of TiO 2 , wherein the surface roughness (rms) in a surface quality area of the substrate is at most 2 nm, and the maximum variation (PV) of the stress in the surface quality area of the substrate is at most 0.2 MPa.

REFLECTIVE-TYPE MASK BLANK FOR EUV LITHOGRAPHY

A reflective mask blank for EUV lithography including a substrate having a front surface and a rear surface, a reflective layer formed over the front surface of the substrate, an absorbing layer formed over the reflective layer, and a chucking layer formed on the rear surface of the substrate and positioned to chuck the substrate to an electrostatic chuck. The substrate has a non-conducting portion which eliminates electrical conduction between the reflective layer and the chucking layer and electrical conduction between the absorbing layer and the chucking layer, and the non-conducting portion is formed by forming a portion of the substrate covered with one or more covering members and preventing formation of the reflective layer and the absorbing layer.

Corrosion-resistant aluminum conductive material and process for producing the same

This invention relates to a corrosion-resistant aluminum conductive material comprising an aluminum material consisting of aluminum or an aluminum alloy and a conductive film formed on the surface of said aluminum material wherein defects in the conductive film are substantially sealed off by a hot water treatment or a steam treatment and to a process for producing a corrosion-resistant aluminum conductive material which comprises forming a conductive film on the surface of an aluminum material and subjecting to a hot water treatment or a steam treatment thereby substantially sealing off defects in the conductive film. This invention makes it possible to substantially seal off the defects unavoidably developed on the surface of the conductive film without harming the excellent properties of the aluminum material and provide excellent corrosion resistance even when the thickness of the conductive film is small.

Method for improving leptin resistance

The present invention provides a compound of formula (I) which improves leptin resistance, a pharmaceutical composition comprising the compound, a method for manufacturing a pharmaceutical for improving leptin resistance comprising using the compound, use of the compound for manufacturing a pharmaceutical for improving leptin resistance, and a method for improving leptin resistance comprising administering the compound or the pharmaceutical composition. The improvement of leptin resistance can lead treatment and/or prevention of a disorder associated with leptin resistance, including, particularly, metabolic disorder, obesity, hyperphagia, steatosis, diabetes, and dyslipidemia.

REFLECTIVE MASK BLANK FOR EUV LITHOGRAPHY

A reflective mask blank for EUV lithography is provided which has an absorber layer wherein stress and crystal structure can be easily controlled. A reflective mask blank for EUV lithography, which comprises a substrate, and at least a reflective layer for reflecting EUV light and an absorber layer for absorbing EUV light formed in this order on the substrate, wherein the absorber layer contains tantalum (Ta), nitrogen (N) and hydrogen (H); and in the absorber layer, the total content of Ta and N is from 50 to 99.9 at %, and the content of H is from 0.1 to 50 at %.

Reflective mask blank for EUV lithography and mask for EUV lithography

Provision of an EUV mask whereby an influence of reflected light from a region outside a mask pattern region is suppressed, and an EUV mask blank to be employed for production of such an EUV mask. A reflective mask for EUV lithography (EUVL), comprising a substrate having a mask pattern region and an EUV light-absorbing region located outside the mask pattern region; a reflective layer provided on the mask pattern region of the substrate for reflecting EUV light and having a portion on which an absorber layer is present and a portion on which no absorber layer is present; the portion on which an absorber layer is present and the portion on which no absorber layer is present being arranged so as to constitute a mask pattern; wherein the reflectivity of a surface of the absorber layer for EUV light is from 5 to 15% and the reflectivity of a surface of the EUV light-absorbing region for EUV light is at most 1%.

SURFACE-TREATED ALUMINUM MATERIAL AND ZINC-SUPPLEMENTED ALUMINUM ALLOY

Provided are a surface-treated aluminum material having, on an aluminum material formed of aluminum or an aluminum alloy, a porous anodically oxidized film of a uniformly porous type exhibiting no visually recognizable crystal grain pattern after anodic oxidation treatment, and a novel zinc-doped aluminum alloy suitable for manufacture of the surface-treated aluminum material. The surface-treated aluminum material includes an aluminum alloy base material and an anodically oxidized film formed on a surface thereof, in which the aluminum alloy base material is formed of a zinc-doped aluminum alloy having an alloy composition containing 0.05 mass % to 1 mass % of a Zn component, 0.02 mass % or less of inevitable impurities, and the balance of aluminum. 1. A surface-treated aluminum material , comprising:an aluminum alloy base material; andan anodically oxidized film formed on a surface of the aluminum alloy base material,wherein the aluminum alloy base material is formed of a zinc-doped aluminum alloy having an alloy composition containing 0.05 mass % to 1 mass % of a Zn component, 0.02 mass % or less of inevitable impurities, and the balance of aluminum.2. A surface-treated aluminum material according to claim 1 , wherein the anodically oxidized film is formed through anodic oxidation treatment using a polybasic acid aqueous solution as a treatment bath.3. A surface-treated aluminum material according to or claim 1 , wherein the aluminum alloy base material is subjected to planarization treatment by any one method selected from cutting work claim 1 , buff polishing claim 1 , electropolishing claim 1 , and chemical polishing claim 1 , prior to the anodic oxidation treatment.4. A zinc-doped aluminum alloy claim 1 , which is obtained by doping high-purity aluminum with Zn claim 1 , the zinc-doped aluminum alloy comprising 0.05 mass % to 1 mass % of a Zn component claim 1 , 0.02 mass % or less of inevitable impurities claim 1 , and the balance of aluminum. The present ...

ALUMINUM-MATERIAL ANODIZATION METHOD

Provided is an anodic oxidation treatment method for an aluminum material including aluminum or an aluminum alloy capable of forming a porous anodic oxide film of a porous type at a treatment voltage of 10 V or more while suppressing manifestation of a crystal grain pattern to the extent possible. Specifically, provided is an anodic oxidation treatment method for an aluminum material for subjecting an aluminum material to anodic oxidation treatment in a treatment bath of a polybasic acid aqueous solution under a treatment condition of a target voltage of 10 V or more, to form an anodic oxide film on a surface of the aluminum material, the method including, as pre-treatment of the anodic oxidation treatment, subjecting the aluminum material to anodic oxidation treatment in a treatment bath of a polybasic acid aqueous solution under a treatment condition of a voltage of 6 V or less until an electrical quantity reaches 0.05 C/cmor more, to form a pre-film on the surface of the aluminum material. 1. An anodic oxidation treatment method for an aluminum material for subjecting an aluminum material comprising aluminum or an aluminum alloy to anodic oxidation treatment in a treatment bath of a polybasic acid aqueous solution under a treatment condition of a target voltage of 10 V or more , to form a porous anodic oxide film on a surface of the aluminum material ,{'sup': '2', 'the method comprising, as pre-treatment of the anodic oxidation treatment, subjecting the aluminum material to anodic oxidation treatment in a treatment bath of a polybasic acid aqueous solution under a treatment condition of a voltage of 6 V or less until an electrical quantity reaches 0.05 C/cmor more, to form a porous pre-film on the surface of the aluminum material.'}2. An anodic oxidation treatment method for an aluminum material according to claim 1 , wherein a crystal grain in the aluminum material has a size of 100 μm or more.3. An anodic oxidation treatment method for an aluminum material ...

ANTENNA UNIT, ANTENNA UNIT-EQUIPPED WINDOW GLASS, ATTACHMENT METHOD FOR ANTENNA UNIT

An antenna unit to be used by being installed so as to face window glass of a building, the antenna unit including a radiating element, a reflective member configured to reflect electromagnetic waves radiated from the radiating element toward outside of the building, and a support unit configured to removably support the reflective member. An antenna unit attachment method includes installing an antenna unit so as to face window glass for a building, the antenna unit having a radiating element and a support unit, and supporting a reflective member that reflects electromagnetic waves radiated from the radiating element by the support unit on an outdoor side relative to the radiating element. 1. An antenna unit to be used by being installed so as to face window glass for a building , the antenna unit comprising:a radiating element;a reflective member configured to reflect electromagnetic waves radiated from the radiating element toward outside of the building; anda support unit configured to removably support the reflective member.2. The antenna unit according to claim 1 , wherein the support unit includes an antenna unit upper portion from which the reflective member hangs.3. The antenna unit according to claim 2 , wherein the antenna unit upper portion includes a connector connected to the radiating element claim 2 , andwherein the reflective member hangs from the antenna unit upper portion except where the connector is placed.4. The antenna unit according to claim 1 , wherein the support unit includes a core rod around which the reflective member is drawably wound claim 1 , and includes an antenna unit upper portion configured to support the core rod.5. The antenna unit according to claim 4 , wherein the antenna unit upper portion includes a connector that is connected to the radiating element claim 4 , andwherein the reflective member wound around the core rod hangs by the connector.6. The antenna unit according to claim 1 , wherein the support unit includes a ...

METHOD FOR PERFORMING ELECTROPOLISHING TREATMENT ON ALUMINUM MATERIAL

Provided is a method of performing electropolishing treatment on an aluminum material, which is capable of easily producing an aluminum material having an excellent outer appearance with luster and uniformity on an industrial scale. The method of performing electropolishing treatment on an aluminum material includes immersing the aluminum material in an electrolytic treatment solution in an electrolytic treatment tank, and applying an electrolysis voltage through use of the aluminum material as an anode, to thereby perform electropolishing treatment on a surface of the aluminum material, the method including: performing, as pretreatment for the electropolishing treatment, anodic oxidation treatment; performing, during the electropolishing treatment, bubble-diffusion-preventing treatment; and performing, as post-treatment for the electropolishing treatment, film peeling treatment for an electropolishing film. 1. A method of performing electropolishing treatment on an aluminum material including immersing an aluminum material formed of aluminum or an aluminum alloy in an electrolytic treatment solution in an electrolytic treatment tank , and applying an electrolysis voltage through use of the aluminum material as an anode , to thereby perform electropolishing treatment on a surface of the aluminum material ,the method comprising, as pretreatment for the electropolishing treatment, performing anodic oxidation treatment including subjecting the aluminum material to anodic oxidation in a pretreatment tank arranged separately from the electrolytic treatment tank at a voltage lower than the electrolysis voltage during the electropolishing treatment through use of a pretreatment solution formed of a polybasic acid aqueous solution having a weak ability to dissolve the aluminum material as compared to the electrolytic treatment solution, to thereby form an anodic oxide film on the surface of the aluminum material.2. A method of performing electropolishing treatment on an ...

Reflective mask base for EUV microfilm

Method for electrolytic coloring of aluminum material

This invention relates to an improvement of a process for electrolytically coloring an aluminum material comprising immersing an aluminum material consisting of anodized aluminum or an anodized aluminum alloy in an electrolytic coloring bath containing a soluble metal salt, performing a pretreatment prior to coloring by passing a direct current waveform with said aluminum material serving as the anode, and performing alternating current electrolytic coloring in the same electrolytic coloring bath and the improved process comprises performing said pretreatment prior to coloring until the voltage and current respectively reach the preset ultimate values. It is possible to prevent as much as possible an occurrence of irregular coloring not only in one energizing lot but also in different energizing lots and produce an aluminum material colored in a uniform tone stably and readily on a commercial scale.

Reflective mask blank for euv lithography

Method for electrolytic coloring of aluminum material

In a method for electrolytic coloring of an aluminum material which comprises immersing an aluminum material, which comprises aluminum or an aluminum alloy, having an anodized film in an electrolytic coloring treatment bath containing a soluble metal salt and passing a direct current waveform by the use of the aluminum material as an anode, to thereby subjecting the aluminum material to a pre-treatment prior to coloring, and then subjecting the aluminum material to an a.c. electrolytic coloring treatment in the same electrolytic coloring treatment bath, an improvement which comprises performing the above pre-treatment prior to coloring until a voltage and a current reach respective predetermined values. The improved method can be employed for significantly reducing coloring irregularities not only within one energizing lot, but also between different energizing lots, and thus for producing an aluminum material being colored in a uniform tone with stability and ease on an industrial scale.

Reflective mask blank for euv lithography

A reflective mask blank for EUV lithography is provided which has an absorber layer wherein stress and crystal structure can be easily controlled. A reflective mask blank for EUV lithography, which comprises a substrate, and at least a reflective layer for reflecting EUV light and an absorber layer for absorbing EUV light formed in this order on the substrate, wherein the absorber layer contains tantalum (Ta), nitrogen (N) and hydrogen (H); and in the absorber layer, the total content of Ta and N is from 50 to 99.9 at%, and the content of H is from 0.1 to 50 at%.

Reflective mask blank for euv lithography

Disclosed is a reflective mask blank for EUV lithography, which has an absorber layer wherein stress and crystal structure can be easily controlled. The reflective mask blank for EUV lithography is obtained by forming, on a substrate, at least a reflective layer for reflecting EUV light and an absorber layer for absorbing EUV light in this order. The reflective mask blank for EUV lithography is characterized in that the absorber layer contains tantalum (Ta), nitrogen (N) and hydrogen (H), the total content ratio of Ta and N in the absorber layer is 50-99.9 at%, and the content ratio of H in the absorber layer is 0.1-50 at%.

Surface-treated aluminum material and zinc-supplemented aluminum alloy

一種對於由鋁或鋁合金所成之鋁材經陽極氧化處理後之結晶粒花樣不會被辨識、具有均勻多孔質型之多孔性陽極氧化皮膜之表面處理鋁材及適於製造該表面處理鋁材之新穎之添加鋅之鋁合金。 一種表面處理鋁材，其具有鋁合金基材及其表面上形成之陽極氧化皮膜之表面處理鋁材，其特徵係前述鋁合金基材係由添加鋅之鋁合金所形成，該添加鋅之鋁合金具有Zn成分：0.05~1質量%、不可避免之雜質：0.02質量%以下、及其餘部分：鋁之合金組成。

Composición medicinal que mejora la resistencia a la leptina

Un compuesto de fórmula (I):**Fórmula** en donde R1 es arilo o heteroarilo, en donde el arilo o heteroarilo pueden estar sustituidos con 1 a 3 sustituyentes seleccionados independientemente del grupo que consiste en halo, hidroxi, alquilo, alquilo sustituido con halógeno, arilo, arilo sustituido con halógeno o alquilo, alcoxi, alcoxi sustituido con hidroxi o carboxi, alquiltio, ariloxi, CHO, C(O)-alquilo, C(O)-arilo, C(O)-alquilen-carboxilo, C(O)-alquilen-carboxiéster, ciano, oxo, heterocicloalquilo y alcoxi sustituido con heteroarilo, y R2 es hidrógeno, halo, alquilo, fenilo o piridilo, o un óxido, éster, sal farmacéuticamente aceptable o solvato del mismo, para su uso en el tratamiento y/o prevención de un trastorno asociado con la resistencia a la leptina seleccionado del grupo que consiste en síndrome metabólico, hiperglucemia, hiperinsulinemia, resistencia a la insulina, intolerancia a la glucosa, diabetes tal como diabetes mellitus, diabetes gestacional, diabetes mellitus insulinodependiente y diabetes mellitus no insulinodependiente, complicaciones diabéticas seleccionadas del grupo que consiste en retinopatía diabética, nefropatía diabética y neuropatía diabética, hipertrigliceridemia, nivel elevado de triglicéridos plasmáticos postprandial, hipoalfalipoproteinemia, hiperfagia y esteatosis.

Antenna unit, window glass with antenna unit, and installation method of antenna unit

Medicinal composition improving leptin resistance

Medical composition that improves leptin resistance

Stubstrat mit reflektierenden schichten geeignet zur herstellung von reflexionsmaskenrohlingen für die euv-lithographie

Antenna unit, antenna unit-equipped window glass, attachment method for antenna unit

An antenna unit to be used by being installed so as to face window glass of a building, the antenna unit including a radiating element, a reflective member configured to reflect electromagnetic waves radiated from the radiating element toward outside of the building, and a support unit configured to removably support the reflective member. An antenna unit attachment method includes installing an antenna unit so as to face window glass for a building, the antenna unit having a radiating element and a support unit, and supporting a reflective member that reflects electromagnetic waves radiated from the radiating element by the support unit on an outdoor side relative to the radiating element.

Ｉｃカード発行システム

【課題】セキュリティの高いＩＣカード発行システムを提供する。【解決手段】申込データ入力端末７０、ＩＣカード発行用端末１０４、ＩＣカード発行機３０、ならびにサーバー１０６を備えるＩＣカード発行システム１００であって、サーバーは、申込データ入力端末からの申込者データに基づきＩＣカード発行の可否を審査し、その結果を申込データ入力端末に送信する機能、申込データ入力端末からの受付番号を伴う発行決済データに基づき、ＩＣデータ付きカード発行データ１１４を生成し、それをカード発行データファイル１１６に記憶する機能、およびＩＣカード発行用端末からの受付番号を伴っての指示により、カード発行データファイルに記憶されたＩＣデータ付きカード発行データをＩＣカード発行用端末に送信する機能を有し、ＩＣカード発行機はＩＣカード発行用端末からのＩＣデータ付きカード発行データによりＩＣカードを自動発行する。【選択図】図３

Antenna unit, window glass with antenna unit, and installation method of antenna unit

An antenna unit to be used by being installed so as to face window glass of a building, the antenna unit including a radiating element, a reflective member configured to reflect electromagnetic waves radiated from the radiating element toward outside of the building, and a support unit configured to removably support the reflective member. An antenna unit attachment method includes installing an antenna unit so as to face window glass for a building, the antenna unit having a radiating element and a support unit, and supporting a reflective member that reflects electromagnetic waves radiated from the radiating element by the support unit on an outdoor side relative to the radiating element.

クレジットカード発行用審査システム

【課題】クレジットカードがなくともクレジット扱いで買い物ができるようにしたクレジットカード発行用審査システムを提供する。 【解決手段】タブレット端末１２と顧客基幹系サーバ１６を備え、前記顧客基幹系サーバ１６は、タブレット用カード申込サーバ監視部２８、自動審査用処理部１８、契約データ生成部２０、及び郵送カード発行データ生成部２２を備え、前記タブレット用カード申込サーバ監視部２８は、タブレット用カード申込サーバ１４に顧客データを伴ったクレジットカード申込データが存在していないかを常に監視し、クレジットカード申込データが存在するとき、それを読み取り、自動審査用処理部１８に送信し、自動審査用処理部１８は、該クレジットカード申込データに基づきクレジットカード発行の可否を審査し、その審査が可であるとき、契約データ生成部２０は、契約番号を採番し、この契約番号を伴うメッセージを示す契約データを生成する。 【選択図】図１

バーチャルカードシステム

【課題】親カードについての子カードの発行申請を適正に処理でき、しかも親カードおよび子カードの利用可能金額を正確に管理できるバーチャルカードシステムを提供する。【解決手段】クレジットカードである親カードを持ち、ネット会員である顧客のための、前記親カードに関連する、バーチャルカードである子カードであって、設定される利用限度額が親カードの現在の利用可能枠内である子カードの発行データを生成するためのバーチャルカードシステムにおいて、セキュリティコードは重要情報であるので、バーチャルカードである子カードを発行するときに生成したセキュリティコードを顧客に知らせた後は、基幹系サーバオーソリゼーションサーバ側では保管（記憶）せずに、子カードの限度額の設定・変更、子カードの利用（クレジットカードとしての利用）の都度、カード番号から算出してこれを顧客側から送られてきたセキュリティコードと照会する。【選択図】図１

アルミ基材の表面加工方法

【課題】鏡面加工により形成されたアルミ基材の被加工面（鏡面）に、その高度な平坦度や真円度を損なうことなく、微細粗面加工を施して微細な凹凸が均一に付与された微細粗面を形成することができるアルミ基材の表面加工方法を提供する。 【解決手段】アルミ基材１ａの表面に鏡面加工を施し、この鏡面加工後のアルミ基材の鏡面（被加工面）に球状微粒子が分散した加工液を噴射し、アルミ基材に微細粗面を形成する方法であり、加工液中の球状微粒子の目標粒径を３〜３０μmとし、加工液の噴射圧力を０．１〜０．４MPaとし、かつ、被加工面に噴射する球状微粒子の粒子総数を１×１０ 4 〜５×１０ 8 個/mm 2 としたアルミ基材の表面加工方法である。 【選択図】図１

Glass plate with protective film