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COMPACT SYSTEM FOR COUPLING RF POWER DIRECTLY INTO RF LINACS

Номер патента: US20180124910A1. Автор: Houlahan, JR. Thomas J., Jurczyk Brian E., Potter James M., Stubbers Robert A.. Владелец: . Дата публикации: 03-05-2018.
A system for injecting radio frequency (RF) pulses into an RF linear accelerator (RF LINAC) cavity is described. In accordance with the description an RF power amplifying element, typically a compact planar triode (CPT), is directly mounted to an outside of a hermetically sealed RF cavity. The direct mounting of the RF power amplifying element places the antenna—responsible for coupling power into the RF cavity—physically on the RF cavity side of a hermetic high-voltage (HV) break. The RF input, RF circuitry, biasing circuitry, and RF power amplifier are all outside of the vacuum cavity region. The direct mounting arrangement facilitates easy inspection and replacement of the RF power amplifier, the RF input and biasing circuitry. The direct mounting arrangement also mitigates the deleterious effects of multipactoring associated with placing the RF power amplifier and associated RF circuitry in the vacuum environment of the RF LINAC cavity. 1. A system for injecting radio frequency energy into an accelerator , the system comprising:a vacuum chamber containing a cavity structure; an RF power amplifier located, in operation, external and adjacent to the vacuum chamber,', 'a socket interface that complementarily accepts the RF power amplifier,', 'an electrically insulating break between the socket interface and the cavity structure, and', 'an antenna located within the cavity structure, wherein the antenna is connected to the socket interface and electromagnetically coupled to the cavity structure; and, 'a power amplifier assembly directly coupled to the cavity structure, wherein the power amplifier assembly comprises a biasing element to bias the power amplifier assembly, and', 'an RF power source supplying a radio frequency energy to the power amplifier assembly for amplifying by the RF power amplifier and transmitting a resulting amplified RF power into the cavity structure., 'a power supply interface including2. The system of wherein the antenna transmits the ...

NEUTRON RADIATION SENSOR

Номер патента: US20140264048A1. Автор: Alman Darren A., Coventry Matthew D., Jurczyk Brain E., Scott Brett W., Stubbers Robert A.. Владелец: Starfire Industries, LLC. Дата публикации: 18-09-2014.
Embodiments utilize high energy particles generated by nuclear reactions involving neutron radiation and neutron-sensitive materials to generate and maintain an electric potential gradient between an electrode and a region separated from the electrode by an electric insulator. System and methods contemplated by the invention thereby enable passive detection of neutrons without an externally applied electric potential bias by maintaining a charge accumulation facilitated by nuclear reactions involving neutrons. The charge accumulation produces an electric potential gradient within an electric insulator that separates the charge accumulation from an exterior region. 1. A system for detecting exposure to neutrons , the system comprising:a neutron-sensitive material configured to eject, via nuclear reactions, high energy particles that produce charge carriers in at least one of an interior electrode and an electric insulator;wherein the interior electrode is configured to accumulate a portion of the charge carriers produced by the high-energy particles;wherein the electric insulator disposed between the interior electrode and an exterior region, andwherein the electric insulator is configured to inhibit propagation of the charge carriers collected by the interior electrode to the exterior region to maintain an electric potential difference between the interior electrode and the exterior region.2. The system of claim 1 , wherein the electric insulator is configured to allow the high-energy particles to propagate from the neutron-sensitive material to one or more of the exterior region and the interior electrode.3. The system of claim 1 , wherein the ejection of high-energy particles from the neutron-sensitive material produces an electric charge accumulation on the neutron-sensitive material.4. The system of claim 1 , wherein the high-energy particles ejected from the neutron-sensitive material produce electron-hole pairs in the electric insulator.5. The system of claim ...

ASSOCIATED PARTICLE DETECTION FOR PERFORMING NEUTRON FLUX CALIBRATION AND IMAGING

Номер патента: US20210208303A1. Автор: Alman Darren A., Coventry Matthew D., Jurczyk Brian E., Stubbers Robert A.. Владелец: . Дата публикации: 08-07-2021.
An associated particle-based inspection apparatus is described. The apparatus includes a grounded target region and a neutron generator that produces a neutron and one or more corresponding charged particles. The apparatus further includes an associated particle imaging (API) detector comprising a particle detector that detects the one or more corresponding charged particles, wherein the particle detector comprises at least one particle detector element that facilitates determining a trajectory, origination time, and a velocity of the neutron based upon a detection, by a particular one of the at least one particle detector element, of the corresponding charged particles. 1. An inspection apparatus comprising:a grounded target region;a neutron generator that produces, by a fusion reaction, a neutron and one or more corresponding charged particles;an associated particle imaging (API) detector comprising a particle detector that detects the one or more corresponding charged particles, wherein the particle detector comprises at least one particle detector element that facilitates determining a trajectory, origination time, and a velocity of the neutron based upon a detection, by a particular one of the at least one particle detector element, of the corresponding charged particles, a positively-biased ion source; and', 'a neutron generating source point that receives an ion beam from the positively-biased ion source through a vacuum tube assembly,, 'wherein the neutron generator compriseswherein the neutron generating source point provides a directed volume of corresponding charged particles,wherein the vacuum tube assembly comprises a hermetically-sealed vacuum vessel that couples the positively-biased ion source and the grounded target region,wherein the grounded target region contains the API detector and the neutron generating source point, andwherein charged particle detection events are transmitted from the particle detector array to external sensors through a ...

COMPACT HIGH-VOLTAGE PLASMA SOURCE FOR NEUTRON GENERATION

Номер патента: US20170196073A1. Автор: Jurczyk Brian E., Menet Daniel P., Stubbers Robert A., Williams Michael J.. Владелец: Starfire Industries, LLC. Дата публикации: 06-07-2017.
Systems and methods are described herein for coupling electromagnetic (EM) energy from a remotely-located primary antenna into a plasma ion source. The EM energy is radiated by a first by through an intermediary secondary antenna. The embodiments described herein enable the elevation of the plasma ion source to a high electric potential bias relative to the primary antenna, which can be maintained at or near a grounded electric potential. 1. An apparatus for generating a plasma ion source in a vacuum chamber , the apparatus comprising:a plasma ion source dielectric configured to encapsulate the vacuum chamber;a secondary antenna positioned external to an exterior surface of the plasma ion source dielectric and configured to couple electromagnetic (EM) radiation into the plasma ion source in the vacuum chamber; anda primary antenna electrically isolated from the secondary antenna and configured to transmit electromagnetic (EM) radiation to the secondary antenna;wherein the plasma ion source chamber, the plasma ion source dielectric, and the secondary antenna are biased at a positive electric potential with respect to the primary antenna.2. The apparatus of claim 1 , further comprising:a magnet assembly positioned external to the exterior surface of the plasma ion source dielectric;wherein a portion of the secondary antenna is positioned between the exterior surface of the plasma ion source dielectric and the magnet assembly.3. The apparatus of claim 2 , wherein the magnetic structure is comprised of permanent magnets in a hexapole configuration.4. The apparatus of claim 1 , further comprising a conducting outer enclosure that encapsulates the plasma ion source dielectric and the secondary antenna.5. The apparatus of claim 4 , wherein the conducting outer enclosure serves as an electric potential ground for the apparatus.6. The apparatus of claim 4 , wherein the primary antenna is electrically connected to the conducting outer enclosure.7. The apparatus of claim 2 , ...

SCALABLE MULTI-ROLE SURFACE-WAVE PLASMA GENERATOR

Номер патента: US20180199423A1. Автор: Jurczyk Brian E., Ruzic David N., Stubbers Robert A.. Владелец: . Дата публикации: 12-07-2018.
Systems and methods are described herein for generating surface-wave plasmas capable of simultaneously achieving high density with low temperature and planar scalability. A key feature of the invention is reduced damage to objects in contact with the plasma due to the lack of an RF bias; allowing for damage free processing. The preferred embodiment is an all-in-one processing reactor suitable for photovoltaic cell manufacturing, performing saw-damage removal, oxide stripping, deposition, doping and formation of hetero structures. The invention is scalable for atomic-layer deposition, etching, and other surface interaction processes. 1. A surface-wave plasma source comprising a microwave launch structure , a dielectric insulator , a conducting baseplate , an impedance matching feedthrough and a microwave generator to supply electromagnetic energy at microwave frequency to the plasma region.2. The surface-wave plasma source of wherein the microwave launch structure comprises a metallic patch antenna over a dielectric channel with radiating slots adjacent to an outer conductor that is electromagnetically-coupled to a feedthrough.3. The surface-wave plasma source of claim 1 , wherein microwave launch structure is a planar claim 1 , coaxial or ring configuration.4. The surface-wave plasma source of further comprising a plurality of microwave launch structures arrayed into a periodic structure to generate overlapping plasma zones to approximate a uniform plasma sheet.5. The surface-wave plasma source of claim 4 , wherein the plurality of microwave launch structures further are controlled by a control to facilitate adjustment of power claim 4 , frequency and phase to tailor plasma properties over a large area substrate to improve uniformity claim 4 , power balancing and process conditions.6. The surface-wave plasma source of claim 4 , wherein the arrayed periodic structure is driven by multiple microwave magnetron generators on each of a set of three phases of standard ...

Scalable Multi-Role Surface-Wave Plasma Generator

Номер патента: US20140315347A1. Автор: Brian E. Jurczyk, David N. Ruzic, Michael P. Reilly, Piyum S. Zoonoz, Robert A. Stubbers. Владелец: Starfire Industries LLC. Дата публикации: 23-10-2014.
Systems and methods are described herein for generating surface-wave plasmas capable of simultaneously achieving high density with low temperature and planar scalability. A key feature of the invention is reduced damage to objects in contact with the plasma due to the lack of an RF bias; allowing for damage free processing. The preferred embodiment is an all-in-one processing reactor suitable for photovoltaic cell manufacturing, performing saw-damage removal, oxide stripping, deposition, doping and formation of heterostructures. The invention is scalable for atomic-layer deposition, etching, and other surface interaction processes.

SYSTEM FOR COUPLING RF POWER INTO LINACS AND BELLOWS COATING BY MAGNETRON SPUTTERING WITH KICK PULSE

Номер патента: US20210327694A1. Автор: Haehnlein Ian F., Houlahan, JR. Thomas J., Jurczyk Brian E., Menet Daniel P., Shchelkanov Ivan A., Stubbers Robert A.. Владелец: . Дата публикации: 21-10-2021.
A system and associated method are described for depositing high-quality films for providing a coating on a three-dimensional surface such as an internal surface of a bellows structure. The system includes a magnetic array comprising multiple sets of magnets arranged to have Hall-Effect regions that run lengthwise along a sputter target. The system further includes an elongated sputtering electrode material tube surrounding the magnetic array comprising multiple sets of magnets arranged to have Hall-Effect regions that run lengthwise along the sputter target. During operation, the system generates and controls ion flux for direct current high-power impulse magnetron sputtering. During operation logic circuitry issues a control signal to control a kick pulse property of a sustained positive voltage kick pulse taken from the group consisting of: onset delay, amplitude and duration. 1. A system for depositing high-quality films on a surface of a bellows structure for providing a nanolayered coating on a three-dimensional surface of an RF accelerator cavity and associated superconducting cavities , the system comprising:a magnetic array comprising multiple sets of magnets arranged to have Hall-Effect regions that run lengthwise along a sputter target; andan elongated sputtering electrode material tube surrounding the magnetic array comprising multiple sets of magnets arranged to have Hall-Effect regions that run lengthwise along the sputter target, providing a vacuum apparatus containing a sputtering magnetron target electrode;', 'generating a high-power pulsed plasma magnetron discharge with a high-current negative direct current (DC) pulse to the sputtering magnetron target electrode; and', 'generating a configurable sustained positive voltage kick pulse to the magnetron target electrode after terminating the negative DC pulse,', 'wherein during the generating, program processor configured logic circuitry issues a control signal to control at least one kick pulse ...

Azimuthal Associated Particle Imaging Neutron Generator For Neutron X-Ray Inspection System Gamma Imaging for Oil and Gas Technologies

Номер патента: US20190265384A1. Автор: Alman Darren A., Coventry Matthew D., Jurczyk Brian E., Stubbers Robert A.. Владелец: . Дата публикации: 29-08-2019.
A wellbore inspection apparatus and a corresponding method of operation are described. The wellbore inspection apparatus comprises a neutron generator that produces, by a fusion reaction, a neutron and a corresponding charged particle. An associated particle imaging (API) detector comprises a particle detector array that detects the corresponding charged particle. The particle detector array comprises a plurality of particle detector elements that facilitate determining a trajectory of the neutron based upon a detection, by a particular one of the plurality of particle detector elements, of the corresponding charged particle. A gamma-ray detector assembly comprises a set of gamma-ray detector elements, and a set of collimating structures, where adjacent pairs of the set of collimating structures define a gamma-ray path for a gamma-ray arising from an inelastic collision of the neutron. 1. A wellbore inspection apparatus comprising:a neutron generator that produces, by a fusion reaction, a neutron and a corresponding charged particle; a set of gamma-ray detector elements, and', 'a set of collimating structures, where adjacent pairs of the set of collimating structures define a gamma-ray path for a gamma-ray arising from an inelastic collision of the neutron., 'a gamma-ray detector assembly comprising, 'an associated particle imaging (API) detector comprising a particle detector array that detects the corresponding charged particle, wherein the particle detector array comprises a plurality of particle detector elements that facilitate determining a trajectory of the neutron based upon a detection, by a particular one of the plurality of particle detector elements, of the corresponding charged particle; and'}2. The wellbore inspection apparatus of wherein the corresponding charged particle produced by the fusion reaction is an alpha particle.3. The wellbore inspection apparatus of wherein the plurality of particle detector elements are arranged to form a cylindrical ...

METHOD AND APPARATUS FOR METAL AND CERAMIC NANOLAYERING FOR ACCIDENT TOLERANT NUCLEAR FUEL, PARTICLE ACCELERATORS, AND AEROSPACE LEADING EDGES

Номер патента: US20200273684A1. Автор: Haehnlein Ian F., Houlahan, JR. THOMAS JAMES, Jurczyk Brian E., Shchelkanov Ivan, Stubbers Robert A.. Владелец: Starfire Industries LLC. Дата публикации: 27-08-2020.
A system is described that includes a sputter target and a magnetic element array including multiple sets of magnets arranged to have a Hall-Effect region that extends along a length of the sputter target. The elongated sputtering electrode material tube is interposed between the magnetic array and an object to be deposited with a sputtered material from the sputter target. During a direct current high-power impulse magnetron sputtering operation, the system performs a depositing on a surface of the object by generating and controlling an ion and neutral particle flux by: providing a vacuum apparatus containing a sputter target holder electrode; first generating a high-power pulsed plasma magnetron discharge with a high-current negative direct current (DC) pulse to the sputter a target holder electrode; and second generating a configurable positive voltage kick pulse to the sputter target holder electrode after terminating the negative DC pulse. 1. A system comprising:a sputter target; anda magnetic element array including multiple sets of magnets arranged to have a Hall-Effect region that extends along a length of the sputter target;wherein the elongated sputtering electrode material tube is interposed between the magnetic array and an object to be deposited with a sputtered material from the sputter target, providing a vacuum apparatus containing a sputter target holder electrode;', 'first generating a high-power pulsed plasma magnetron discharge with a high-current negative direct current (DC) pulse to the sputter a target holder electrode; and', 'second generating a configurable positive voltage kick pulse to the sputter target holder electrode after terminating the negative DC pulse., 'wherein, during a direct current high-power impulse magnetron sputtering operation, the system is configured to perform a depositing on a surface of the object by generating and controlling an ion and neutral particle flux by2. The system of wherein during the second generating ...

COMPACT SYSTEM FOR COUPLING RF POWER DIRECTLY INTO RF LINACS

Номер патента: US20200377995A1. Автор: Haehnlein Ian F., Houlahan, JR. Thomas J., Jurczyk Brian E., Menet Daniel P., Shchelkanov Ivan A., Stubbers Robert A.. Владелец: . Дата публикации: 03-12-2020.
A system and associated method are described for depositing high-quality films for providing a nanolayered coating on a three-dimensional surface. The system includes a magnetic array comprising multiple sets of magnets arranged to have Hall-Effect regions that run lengthwise along a sputter target. The system further includes an elongated sputtering electrode material tube surrounding the magnetic array comprising multiple sets of magnets arranged to have Hall-Effect regions that run lengthwise along the sputter target. During operation, the system generates and controls ion flux for direct current high-power impulse magnetron sputtering. During operation logic circuitry issues a control signal to control a kick pulse property of a sustained positive voltage kick pulse taken from the group consisting of: onset delay, amplitude and duration. 1. A system for depositing high-quality films for providing a nanolayered coating on a three-dimensional surface of an RF accelerator cavity and associated superconducting cavities , the system comprising:a magnetic array comprising multiple sets of magnets arranged to have Hall-Effect regions that run lengthwise along a sputter target; andan elongated sputtering electrode material tube surrounding the magnetic array comprising multiple sets of magnets arranged to have Hall-Effect regions that run lengthwise along the sputter target, providing a vacuum apparatus containing a sputtering magnetron target electrode;', 'generating a high-power pulsed plasma magnetron discharge with a high-current negative direct current (DC) pulse to the sputtering magnetron target electrode; and', 'generating a configurable sustained positive voltage kick pulse to the magnetron target electrode after terminating the negative DC pulse,', 'wherein during the generating, program processor configured logic circuitry issues a control signal to control at least one kick pulse property of the sustained positive voltage kick pulse taken from the group ...