METAL SILICON PARTICLE LIQUID DISPERSION AND MANUFACTURING METHOD OF CHLOROSILANE USING SAME
The present invention refers to metal silicon particles using the dispersion solution and manufacturing method of chlorosilanes, more specifically of trichlorosilane can be more efficiently producing metal which can be used in a process where silicon particles using the dispersion solution and trichlorosilane relates to manufacturing method. Purity polycrystalline silicon (a so-called polysilicon) trichlorosilane [...] -based polymer useful as a starting material manufacturing (SiHCl3: TCS) the, 1000 °C reacts with hydrogen in the high temperature of or more purity is used for depositing polysilicon. As a raw material of the azo are mainly color the reaction (1) and (2) represented by.. 4SiHCl3 → Si + 3SiCl4 + 2H2 (1) SiHCl3 + H2 → Si + 3HCl (2) Said precipitation in reaction polysilicon such as trichlorosilane is generally used in the metal silicon and hydrogen chloride made by the reaction of.. For example, fluidized bed reaction device patent document 1 metallic silicon and gaseous hydrogen chloride in the presence of a catalyst, and aluminum-containing iron the known as a raw material of the fluidized bed reactor (3) by the reaction of a method for the production of trichlorosilane is disclosure is. Si + 3HCl → SiHCl3 + H2 (3) Metal silicon and hydrogen chloride gas produced by reaction of is cooled to -10 ° C hereinafter which condensation separation of trichlorosilane, trichlorosilane the condensate is a by-product in addition to a other organosilane that is fitted with an aperture. These chlorosilanes having trichlorosilane including condensate from the supernatant may be processed to recover separated by distillation as a raw material for the production is carried out by using an acidulous polysilicon. Furthermore, trans polybutadiene with separated by distillation the phenychlorosilanes (SiCl4: STC) mainly formula (4) by reacting trichlorosilane (TCS) towards the preparation of polysilicon is reuse. 3SiCl4 + 2H2 + Si → 4SiHCl3 (4) While, the 100 to 300 micro m patent document 2 degree sized metal silicon particles in fluidized bed reactor which is filled with the gaseous hydrogen chloride, tetra the phenychlorosilanes and and supplying hydrogen to the, silicon and metal in a reaction vessel and gaseous with hydrogen chloride producing reaction of trichlorosilane (type (3) reaction of) and, silicon, tetra the phenychlorosilanes and reaction with hydrogen producing reaction of trichlorosilane gaseous by (type (4) reaction of) of trichlorosilane the progress of simultaneously manufacturing method is proposed (also reference 1). Atm adaptation layer type 2 in which reactions method of said way helps to silicon particles have a size in patterned to gradually decreasing water level of cross-. required. State of the SP heads and, raw material for determining when to supplement reporting temperature change of reaction temperature is since is non-uniform to checks quality of product over time to the reactor a problem that to each other. The present invention refers to metal silicon powder is stably dispersed in the vehicle. a dispersion for a cathode ray tube. In addition the present invention refers to said possible to control the chlorosilanes, in particular of trichlorosilane and that can be produced at efficient. provides method. The present invention refers to said, the first and to achieve Liquid silane compound, dispersed metal compounds silane liquid silicon powder and said liquid silane compound dissolved in a including of brushless DC motor, provides dispersions of silicon powder metal. In addition the present invention refers to, another technique to achieve, the first and, 1) said metal silicon powder dispersions of hydrogen chloride mixing a step; and 2) said 1 the presence of hydrogen) step mixture generating a chlorosilanes having; provides a manufacturing method including of chlorosilanes. According to the present invention a liquid silane compounds particulate silicon stably dispersed in the vehicle dispersions provided, said hydrogen and hydrogen chloride and dispersions current so as liquid phase reaction of the reaction mixture into the shaped can be is uniformly mixed. Thus good contact efficiency to pass through the inside chlorosilanes manufacturing productivity can be height. Figure 1 shows a multiplex fluidized bed process is according to the prior art. Also Figure 2 shows a embodiment of the present invention bringing a chlorosilanes manufacturing process is flow multiplex. Specifically for a described hereinafter the present invention. According to the present invention liquid silane compound, dispersed metal compounds silane liquid silicon powder and said liquid silane compound dissolved in a including of brushless DC motor, it is intended to provide a dispersion of silicon powder metal. According to an exemplary embodiment, said precipitated silicon powder dispersions column morality the backscattered permeability or speed when display change can be from 0.8% / min hereinafter.. According to an exemplary embodiment, said halogen compounds are hydrogen chloride, hydrogen fluoride, hydrogen bromide can be. Dispersion halogen compound content on the basis of the total weight the dispersions can be 10 to 50 weight %. According to an exemplary embodiment, said metal silicon powder of average particle size of 35 micro m hereinafter can be is. According to an exemplary embodiment, said liquid silane compound 100 parts by weight silicon metal said contrast can be 0.005 to 0.05 parts by weight. According to an exemplary embodiment, said metal silicon powder unoxidized, preprocessed contact method substantially corrode the surface can be removed. According to an exemplary embodiment, said dispersion including a metal film silicon powder particles of distance values between 10 to 1000 nm can be. According to an exemplary embodiment, said silylethyl group of tetra silane compound including. may be. According to an exemplary embodiment, said tetra with claw thread column trichlorosilane and hydrogen by the reaction of one deposited on the counter electrode polysilicon can be provided to improve a bonding strength as a by-product in the process. The present invention refers to in addition, The aforementioned metal silicon powder dispersions of generating a reacting chlorosilanes having; provides a manufacturing method including of chlorosilanes. According to an exemplary embodiment, said liquid includes silylethyl group a tetraalkyl silane compound, said reaction formed after including chlorosilanes of trichlorosilane. may be. According to an exemplary embodiment, said reaction is liquid can be a reaction in progress. According to an exemplary embodiment, said reaction is 30 to 500 bar pressure, at a temperature of 200 to 1000 °C embodiment. is disposed. According to an exemplary embodiment, silanes and the resulting after reaction a reaction for separating particles silicon further including. may be. According to another embodiment, said metal silicon particles a reaction a small amplitude to the reactor a silicon particles does not embodiment separation step to obtain a can be. The embodiment hereof is more particularly described hereinafter of the present invention. Metal silicon powder dispersion of the present invention according to liquid of silane compound and particulate metal silicon powder, and said liquid dissolved in the silane compound, comprises a of brushless DC motor. Said halogen compounds silane compound is solubilized in a converting chlorosilanes silane compound in liquid phase are compounds capable contribute to is not limited to ramyon. For example, hydrogen chloride, hydrogen fluoride, hydrogen bromide may be used. The present invention according to precipitated silicon powder dispersions column morality the backscattered permeability or speed when display change 0.8% / min hereinafter and remain stable such that on standing as can be. I.e. said aggregation of silicon powder metal dispersions is suppressed form a precipitate or various applications with so that metals storage stability can be using. Said settling rates a dispersion for a cathode ray tube of silicon powder concentration about 16 wt % based on dispersion stability to the titanium dioxide particle measuring equipment, for example 880 nm of near infrared-ray source (transmittance) transmission utilizing measuring (back scattering) 2002 the backscattered and a calculating the degree change up by using the silicon chip Turbiscan. the. According to an exemplary embodiment, said metal silicon powder the ball mill, jet mill, roller mill, such the contact law unoxidized, may be pretreated with the LR is limited to not. Non-oxidizing the contact law treatment chamber for oxidizing the surface of silicon to epoxygenated fatty acids therein without physical or chemical method under such conditions that a thermal oxide layer the surface via machining essentially eliminating method.. Pre-processed metal silicon powder surface oxide layer is eliminated following substantially, for example oxide inclusion content so that 50 wt % hereinafter can be is free from oxides. Surface oxidation is present when the undesirable dispersion characteristic can be influenced is preferably removed since.. Said dispersions the first substrate are assembled silane compound used in but not limited to, chlorosilanes with simple operation by allowing a, for example, mono the phenychlorosilanes, dichlorosilane, trichlorosilane, and the like which the phenychlorosilanes or, according to an exemplary embodiment, it is possible, including tetra silylethyl group. Furthermore, said silane compounds trichlorosilane and hydrogen by the reaction of one deposited on the counter electrode polysilicon can be a as a by-product in the process, a silane compound generated as a by-product from said cooling and liquefying a portion of the poly contact said metal silicon dispersion may be used in the. Said dispersion a metallurgical silicon converter ferrosilicon silicon or metal number, or to a metallic state such as is solid particulate material including element Si, which Si-addition lowers. Furthermore, metal silicon to iron included even to impurities of compounds and the like, so that its components are't limited to tissues in the are specifically content or or. Just, metal silicon particles and the mean particle size of 35 micro m hereinafter, or 20 micro m hereinafter, or 10 micro m hereinafter, or 8 micro m hereinafter, can be degree m micro 5 to 0.5. In the present specification, 'particles' or' powder ' that term can be mixed. The mixing ratio silane compound particles and silicon at a weight ratio 1:20-200, or 1: can be 50-150. Performance to the surface of glass other, particles silicon contrast parts by weight 100 silane compound 0.005 to 0.05 parts by weight, or can be 0.006 to 0.02 parts by weight. Liquid dose of cross-metal dispersed metal compounds silane of silicon particles distance values between 10 to 1000 nm, or 20 to 800 nm, or 50 to 500 nm is a range to appropriately may be selected. The present invention according to dispersions may be used in the chlorosilanes manufacturing. Chlorosilanes manufacturing method 1 in particular) liquid silane compound the metal silicon powder dispersed therein a dispersion and the hydrogen chloride, mixing the reinforcing, acoustical enhancement; and 2) said 1 under the presence of hydrogen) step of reacting mixture of step; can be embodiment including. Said silicon and metal manufacturing method of chlorosilanes and of which the reaction with hydrogen chloride of which the reaction with hydrogen compounds and silane and simultaneously organosilane chloro the processing liquid is to be generated by a rope. embodiment reaction. Said producing reactions are of chlorosilanes said metal silicon powder is stably dispersed in the vehicle by using a liquid silane compound distributed hydrogen chloride and hydrogen by reacting reaction brought about is to enlarge the reaction area, contact has a value of a range of reaction efficiency for maximizing the characterized in that. According to a preferred embodiment of the present invention, poly silicon, said manufacturing method of a communication of chlorosilanes to:a system for establishing a data effective trichlorosilane of silicon, from using a communication tetra silylethyl group in a process for producing trichlorosilane can be useful. The present invention according to of the trichlorosilane can be representation as follows. 3SiCl4 (ℓ) + HCl (ℓ) + 3H2 (g) + Si (s)-> 4SiHCl3 (ℓ) + HCI (ℓ) + H2 (ℓ) (5) The resulting in said known as a raw material of the reactor immediately after the due to the internal pressure can be available in a liquid form. Specifically said reaction is 30 to 500 bar pressure and at a temperature of 200 to 1000 °C can be embodiment. Said metal silicon is of using all reaction by't remain in the, anhydrous gypsum and a superplasticizer used for a metal silver fine powder, method for separating the resultant the BARC film and the. Hereinafter, for example, example trichlorosilane in manufacturing method, each reaction for more particularly. longitude. Hydrogen chloride halogen compound Metal with the silver used for the hydrogen chloride halogen compounds such as hydrogen are incorporated may. used without limited. Said halogen compounds silane compound is solubilized in a converting chlorosilanes silane compound in liquid phase are compounds capable contribute to is not limited to ramyon. For example, hydrogen chloride, hydrogen fluoride, hydrogen bromide can be used the LR is limited to not. However, trichlorosilane generally, tetra the phenychlorosilanes, dichlorosilane such as a high hydrolyzable chlorosilanes is to react with water. Thereby, hydrogen chloride the inclusion of moisture halogen compound, and the resulting silane. has a risk lowering the yield. Therefore, a dry halogen compound this hydrogen chloride is preferably in the state. Molecular halogen hydrogen chloride is unit liquid reactants dispersed silicon metal particles around the sufficient reaction may be distributed is predetermined lines. Hydrogen chloride halogen compound the vapor phase, and even when supplied from a liquid the present invention according to is readily dissolved dispersion of the mobile station can participate liquid phase reaction. Hydrogen chloride the weight ratio with claw thread column tetra and halogen compound may be 1:0 to 10 hereinafter, preferably can be 5 hereinafter to 1:0. Or, tetra the phenychlorosilanes 1 mol of hydrogen chloride halogen compound approximately 1 molar hereinafter, or about 0.8 molar hereinafter, may be or about 0.5 molar hereinafter, total mean additive moles of more than about 0.1 in addition, total mean additive moles of more than or about 0.2 can be which not limited to, up the respective supply speed and together, reaction device blade of a test reliability corresponding to a size can be of a range from. Reactor The present invention according to ejection path is formed at one liquid phase reaction is, reaction device a tubular reactor, in particular fine tubular reactor preferably employ. . The internal tube diameter about 10 mm hereinafter fine tubular reactor or about 1 mm or more in the approximate range, length of about 10 cm or more, or about 500 cm hereinafter is spin speed value within a range of homogeneous dispersion of the reactants to facilitate with sufficient residence time to ensure preferably. A ratio of a diameter to fine of the tubular reactor 1:10 to 5000, more preferably 500 to 1:20 can be. The reaction temperature, manufacturing device and in view of the ability or material of appropriately but if the called party determines that the, reaction temperature is as high, selectivity of trichlorosilane the phenychlorosilanes tetra to the second short-circuit other than such as dichlorosilane or trichlorosilane, resulting generates a large amount of product chlorosilanes. Furthermore, direct chloride reaction (Direct chlorination: Si + 3HCl → SiHCl3 + H2) is is exothermic. The same in tetra with claw thread column hydrogen reacts with the fluff pulp and/is preferably the is trichlorosilane. The two reactors and in view of the conditions setting various the reaction temperature can be, generally set in the range of 1000 °C hereinafter.. Preferably 800 °C hereinafter, or 600 °C hereinafter, or may be set to a temperature of 400 °C hereinafter, 200 °C or more, or 300 °C can be set to a temperature above its melting point the LR is not limited to. The pressure increases and of the reactor produced though the selectivity of chlorosilanes silane is increased since also increases reaction, the pertinent pressure on the. is. Generally. set in the range of 300 bar to 10 bar. Hydrogen In the present invention according to the reaction between the oxygen and silane compound hydrogen chlorosilanes having. assist in forming. Won hydrogen available industrially at various hydrogen can be used and, of polysilicon as a result the hydrogen may in the alternative be employed purifying. Hydrogen and tetra with claw thread column the weight ratio which may be 200 to 1:20, preferably can be 100 to 1:50. Or, tetra the phenychlorosilanes 1 mol of hydrogen 5 molar hereinafter, or molar 4 hereinafter, or 3 molar hereinafter can be are mixed in a proportion of from, total mean additive moles of more than in addition 1 can be treated with water are not limited to the LR is, supplied immersion liquid speed device reactions using the blade of a test reliability corresponding to a size can be of a range from. Catalyst The present invention according to method order to enhance efficiency in using the catalyst but not necessarily may be the not. Metallic silicon and hydrogen chloride of publicly known as catalyst components in is free, can be utilized for time alignment. Iron specifically such as catalyst components, cobalt, nickel, palladium, an element of group number VIII metal such as platinum such as chlorides or metal, aluminum, copper, or titanium: chloride of a metal or an. These catalysts are used to input numerical using alone, or a plurality of combination catalyst may also be used.. Said catalyst component is used in an amount of chlorosilanes having the resin films do not limited to, extracts of Barks of if positive, and in view of the ability of device manufacturing appropriately if the called party determines that the is. Furthermore, in the reaction of catalytic components said addition of but may be or a compound thereof is present, the iron compounds and the like as impurities silicon include of catalytic components and, if contained, a, impurity of as catalyst components for effectively utilizing the. Well as, catalyst component impurities can be efficiently even when the mother pipe having a silicon, metal silicon and hydrogen chloride reactive in order to achieve a high catalyst component the reaction system in reduced times, at an organic solvent containing an alkylbenzene derivative't problem no. Poly silicon manufacturing The phenychlorosilanes tetra according to the present invention produced from polycrystalline silicon having very high purity trichlorosilane (a so-called polysilicon) manufacturing can be used as a raw material. Known as a raw material of the trichlorosilane, as shown on said distribution of, 1000 °C a polysilicon pyrolysis in the high temperature of or more may be one deposited on the counter electrode. Optionally the presence of hydrogen pyrolytically cracking the may preferably. 4SiHCl3 → Si + 3SiCl4 + 2H2 (1) SiHCl3 + H2 → Si + 3HCl (2) Poly silicon on wafer using the LPCVD of trichlorosilane art which is known and the precipitation reaction, thus specifically a description process dispensed a. 2 is hereinafter by referring to one embodiment of the present invention method according to the described more particularly thereby, the cold air flows. Also as shown in 2, vapor its the phenychlorosilanes (1) a cooler (10) the phenychlorosilanes its liquid through the (2) is converting. The phenychlorosilanes its liquid (2) hydrogen chloride (4) together with organic compound, dissolved with claw in thread column agent composed of hydrogen chloride is formed on the liquid state. Excitation the metal silicon particles (6) are determined dispersion (7) is produced is. Drawing metal silicon particle dispersion the process formed during the process is shown which the LR is not limited to, its liquid-particles are dispersed silicon with claw in thread column dispersions are directly supply may also be.. 2 even in the case is a cooler shown in (10) the drive, can be dispensed with.. said solution and the hydrogen chloride produced (4) together with which in combination with, metal silicon particles combined with necessary prior to gear pump (20) can be pressurized by not limited to but. Any of the above mentioned step hydrogen can be added to step. For example, said dispersion (7) hydrogen chloride, (4) and the combination either prior to or after, or metal silicon particle dispersion before or after can add. Its liquid-particles are dispersed silicon the phenychlorosilanes/hydrogen chloride mixture (7) tubular reactor (30) and the processing advances reaction is drawn into the lumen. Drawing the mixture said prior but not shown the invention as described above wherein a constant-temperature storage tank, raw material with stirrer is recorded may be proposed. Reactor (30) for providing the optimal reaction temperature heating means (not shown) the frame is installed at the, contact with residence time sufficient providing can be designed so that they can be. Furthermore, tetra with claw in thread column dispersed silicon particles deposited a high density is especially. Silicon dispersed therein silane solution when negotiating the tubular reactor than deposition of silicon a linear velocity of a must be high. For example micro 10 to event silicon particles m the phenychlorosilanes tetra surface is about 10 mm per second precipitation velocity in solution, the solution without precipitation reactor tubular 10 mm inner diameter is passed a linear velocity of solution tunneling oxide layer and an 10 mm should equal at minimum per second. Thus tubular reactor size of silicon powder the inner diameter and length of speed and precipitation can be determined. A reaction to both the metal silicon particles it is preferred that the been exhausted which, in this case a reaction a process for for separating particles silicon (for example filtering process) can be the invention eliminates the need for. Reactor (3) effluent from (8), the pressure inside a reactor the liquid which, liquid phase reaction in hydrogen/chloride with the trichlorosilane the pressure separating the hydrogen distillation or evacuated but may also be used a device, at room temperature the trichlorosilane liquid and hydrogen chloride and hydrogen by exploiting the properties in a gas, a liquid state immediately after trichlorosilane, hydrogen chloride, hydrogen in the pressure-less state store liquid trichlorosilane may be easily obtained. The present invention according to method using silylethyl group liquid its liquid phase reaction of trichlorosilane using tubular reactor useful in the manufacture of, metal silane benzoic acid liquid in addition the dispersions are prepared by using a memory reactant is uniformly mixed surface area the reactor and which is directed can be is serving produced control unit controls the selection unit to reaction temperature can be efficiency is maximized. Hereinafter specific embodiment to the present invention in further the description to the, embodiment relate to describe the present invention more specifically for and/or at least two different embodiment to the present invention is not limited to. In the embodiment 1 Average particle diameter 5 micro m metal silicon powders ball mill process (hydrogen fluoride) 24 on time using process on the metal if there is the specific etching of a silicon surface to oxide layer is removed. Pre-processed metal silicon powder 3 g a liquid silicon with tetra claw thread column immersed in 45 g 2 minutes at room temperature the atmospheric it does, stirring, hydrogen chloride per minute to supply in a distributed environment with within misfortune 5cc of 50 weight % of hydrogen chloride is dissolved in been produced with at dispersion. In the embodiment 2 Metal silicon powder not pre-processing of a the same method in the embodiment 1 except been produced with at liquid distributed. In the embodiment 3 And for of silicon powder metal, and is formed into a small 6 g the same method in the embodiment 1 except for liquid distributed have been prepared. In the embodiment 4 Average particle diameter 30 micro m metal silicon powders used in the range of the same method in the embodiment 2 except liquid distributed have been prepared. Compared example 1 Average particle diameter 50 micro m metal silicon powders used in the range of the same method in the embodiment 2 except liquid distributed have been prepared. Compared example 2 Average particle diameter 200 micro m metal silicon powders used in the range of the same method in the embodiment 2 except liquid distributed have been prepared. Dispersion stability to the titanium dioxide particle evaluation In the embodiment 1 to 4 and comparison e.g. respect to dispersion of 1 to 2 was assessed dispersion stability to the titanium dioxide particle. Specifically dispersion stability to the titanium dioxide particle but having the evaluation method the first voice portion out of an equipment Turbiscan. A passivation of the 880 nm Turbiscan coated on surfaces of the transmission and as to put 100% initial light source (Transmission: T %) value and the backscattered 2002 (Back scattering: BS %) are measured by feeding a relatively solution dispersion stability to the titanium dioxide particle demultiplexer solution total area of permeability or the backscattered height of a sample domain signal, and a variance value 2002 equipment is measured according to. Showed to result to the computer of the table 1. According to said result, the present invention according to dispersions the backscattered transmission and a high sensitivity while its time variation column morality dispersion stability is less can be of confirming the. Trichlorosilane for manufacturing In the embodiment 1 to 4 and comparison e.g. by using a liquid dispersion of 1 and 2 been produced with at of trichlorosilane. Reaction conditions as follows. Tubular reactor (reactor specifications): Sus316 inner diameter 4 mm, length 300 mm of reaction tube Reaction temperature: 350 also , Wherein the reaction pressure: 160 bar Reaction time: 30 ingredient The feed rate dispersion: 20cc/min Hydrogen chloride the feed rate: 10cc/min Hydrogen feed rate: 100cc/min Said yield of trichlorosilane generated reaction result as follows. Said according to experiments, the present invention according to the possible to control trichlorosilane when produced of trichlorosilane is separated from the locking groove yields and purity of been.. 10. Cooler 20. Pump 30. Tubular reactor Provided are a liquefied silane-based compound, metal silicon powder dispersed in the liquefied silane-based compound, and a liquid dispersion of metal silicon powder comprising a halogen compound dissolved in the liquefied silane-based compound. The liquid dispersion of the metal silicon powder can be used to manufacture chlorosilane. More particularly, chlorosilane can be manufactured by a method comprising the steps of: 1) mixing the liquid dispersion and hydrogen chloride; and 2) conducting a reaction of the mixture product from the step 1) under the presence of hydrogen. COPYRIGHT KIPO 2016 Liquid silane compound; said silane compounds dispersed metal silicon powder; and said liquid silane compound dissolved in an of brushless DC motor including a, dispersion of silicon powder metal. According to Claim 1, said backscattered of permeability or silicon powder dispersions change 2002 is a 0.8% / min hereinafter, dispersion of silicon powder metal. According to Claim 1, said halogen compound this hydrogen chloride, hydrogen fluoride or brominated hydrogen is a, dispersion of silicon powder metal. According to Claim 1, said halogen compound during the dispersions present in concentrations of from 50 weight % hereinafter a, dispersion of silicon powder metal. According to Claim 1, said metal silicon powder of average particle size of 35 micro m hereinafter in, dispersion of silicon powder metal. According to Claim 1, said liquid silane compound 100 parts by weight metal silicon 0.005 to 0.05 parts by said contrast, dispersion of silicon powder metal. According to Claim 1, said metal silicon powder surface a and substantial elimination of corrode, dispersion of silicon powder metal. According to Claim 1, said dispersion dispersed metal silicon powder particles of distance values between 10 to 1000 nm in, dispersion of silicon powder metal. According to Claim 1, including said silylethyl group of tetra silane compound a, dispersion of silicon powder metal. According to Claim 1, said silane compounds trichlorosilane and hydrogen by the reaction of a as a by-product in the process one deposited on the counter electrode polysilicon a, dispersion of silicon powder metal. Number 1 anti to either anti number 10 terms metal silicon powder dispersions of chlorosilanes having reacting the presence of hydrogen that it consists in generating manufacturing method including of chlorosilanes. According to Claim 11, said liquid includes silylethyl group a tetraalkyl silane compound, said reaction formed after a including chlorosilanes of trichlorosilane, manufacturing method of chlorosilanes. According to Claim 11, a is a liquid phase reaction reaction said, manufacturing method of chlorosilanes. According to Claim 11, said reaction is 30 to 500 bar pressure, at a temperature of 300 to 1000 °C is embodiment, manufacturing method of chlorosilanes. According to Claim 11, silanes and the resulting after reaction a reaction further including silicon for separating particles, manufacturing method of chlorosilanes. According to Claim 11, a small amplitude to the reactor the reaction silicon said a silicon particles separating the embodiment does not characterized by, manufacturing method of chlorosilanes. Divided Transmission/the backscattered 2002 change (% / min) In the embodiment 1 0.09 In the embodiment 2 0.08 In the embodiment 3 0.07 In the embodiment 4 0.18 Compared example 1 100 Compared example 2 100 Divided Yield (%) In the embodiment 1 18.7 In the embodiment 2 18.1 In the embodiment 3 19 In the embodiment 4 10 Compared example 1 2.1 Compared example 2 1.7
