LIQUID CRYSTAL DISPLAY AND METHOD FOR MANUFACTURING SAME

Based on a text content of the drawing of the present invention preferred embodiment in reference to time as large as that of to illustrate the detail the are. However, the present invention refers to in the embodiment described herein are topologically other without limit to an may be embodied in the form. Rather, in the embodiment the thin film transistor is a prestored the disclosure can be and complete of the present invention to one skilled in the art such that the event has sufficiently and enables light to be transported to. is ball number.

In drawing, a thickness of the and area layer elcellent distinctions tool for exaggerated.. In addition, layer "on" other layers or substrate, which is referred to when it that the other layers or substrate or may be formed directly on a layer of number 3 therebetween may be interposed. Take identical throughout the specification represented by reference number with identical configuration portions. elements.

In the embodiment according to Figure 1 shows a liquid crystal display device in one of the present invention also the area surrounding a planar is to indicate a portion of display area.

Also 1 consults a surface, in the embodiment according to one of the present invention liquid crystal display device comprises a liquid crystal display plate assembly (liquid crystal panel assembly) (400) and is connected to the gate driver (not shown) and a data drive (not shown), data driver, which are connect to the plural input Image signals having plural input (not shown), liquid crystal display plate assembly (400) to the light source parts (not shown), the light source driving unit to clear topolygical number spot light source substrate (not shown) and drained number signal moves the number (signal controller) may comprise an (not shown).

Gate driving and/or the data driver supplies a liquid crystal display plate assembly (400) may are formed in at least, separate integrated circuit chip can be formed with the KIPO &.

Liquid crystal display plate assembly (400) substrate (110) (DA) and the display area and a peripheral area surrounding the display area (DA) includes (PA). Display area (DA) a yarn number region Image to the, peripheral region (PA) front and taught gate driver or data driver or external circuit and connected part of the gate pads or the data pads including gate pad part or the like (121P) and data pad part (171P). is located. Gate lines gate pad (121) distal to the wider portion and, date data line pad (171) distal to the wider portion is.

4 is hereinafter also to 2 (DA) in display area by reference to an liquid crystal display device as further described component a to.

Also Figure 2 shows a liquid crystal display device in the embodiment according to one of the present invention representing the is plane. Figure 3 shows a light with improved brightness to along the cutting line III-III is cross-sectional drawing of Figure 2. Figure 4 shows a cutting line IV-IV along the light with improved brightness to is cross-sectional drawing of Figure 2.

Figure 2 is part among number of pixel areas which representative of a portion of pixel region 2 X 2, one of the present invention liquid crystal display device in the embodiment according to the pixel regions can be repeated arrays all direction.

Also 2 to also 4 reference to an surface, transparent glass or plastic constitution: in the device a substrate (110) directly connected to the drain electrode (121) and maintaining electrode line (131) is formed. Gate line (121) the gate electrode (124) includes. Sustain electrode line (131) extends laterally mainly common voltage (Vcom) voltage of such as transmits it. Sustain electrode line (131) substrate is formed with (121a) extending substantially perpendicular and a pair of vertical portion (135a) and a pair of longitudinal portion (135a) formed between the gate line end of (135b) includes. Longitudinal portion (135a) and transverse portion (135b) has a pixel switch electrode (191) has a structure surrounding the.

Gate line (121) and maintaining electrode line (131) above the gate dielectric film (140) is formed. Gate insulating layer (140) for reducing a contact resistance between the (171) lower the passivation layer (151), source/drain of a semiconductor substrate and thin film transistor (Q) of channel portion the passivation layer (154) is formed.

Each semiconductor layers (151, 154) is on, data line (171), source/drain electrode between the plurality of resistive contact which may be and a liquid crystal layer formed between, constitution: omitted in drawing.

Each semiconductor layers (151, 154) and gate insulating layer (140) on the source electrode (173) and source electrode (173) and a data line (171), drain electrode (175) for including data conductor (171, 173, 175) is formed.

Gate electrode (124), source electrode (173), and a drain electrode (175) the semiconductor layer (154) with thin film transistor (Q) other so as to form an, thin film transistor (Q) channel (channel) the source electrode (173) and the drain electrode (175) the semiconductor layer (154) is formed on.

Data conductor (171, 173, 175) and source electrode (173) and the drain electrode (175) exposed out of by and expose the semiconductor layers (154) number 1 over a portion the interlayer insulating film (180a) is formed. Number 1 interlayer insulating film (180a) the silicon nitride (SiNx) and silicon oxide (SiOx) of mineral materials such as may include a.

Number 1 interlayer insulating film (180a) number 2 on the interlayer insulating film (180b) and number 3 interlayer insulating film (180c) can be is located. Number 2 interlayer insulating film (180b) may be formed of organic matter, number 3 interlayer insulating film (180c) the silicon nitride (SiNx) and silicon oxide (SiOx) of mineral materials such as may include a. Number 2 interlayer insulating film (180b) are formed of a material which is an organic reducing or formed on a can be authored in the first client by a number. The present in the embodiment number 1 unlike interlayer insulating film (180a), number 2 interlayer insulating film (180b) and number 3 interlayer insulating film (180c) the invention eliminates the need for one or two membranes can be.

Number 1 interlayer insulating film (180a), number 2 interlayer insulating film (180b) and number 3 interlayer insulating film (180c) through the contact hole (185) is can be formed. Contact hole (185) the drain electrode through the first (175) and number 3 interlayer insulating film (180c) which overlie a pixel electrode (191) the electrical, physically may be connected to. Hereinafter formed on pixel electrodes (191) to illustrate the specifically to time as large as that of.

Pixel electrode (191) the ITO or IZO thickness a liquid made possible by the fact that the KIPO &.

Pixel electrode (191) overall shaped square transverse stem part (191a) cross the first a longitudinal stem part (191b) consisting the common divisor of the stem part. In addition transverse stem part (191a) and a longitudinal stem part (191b) by four sub-sub, wherein each of said wires or whereas the remaining region is divided into a plurality of fine tine (191c) includes. In addition, the present in the embodiment pixel electrode (191) of a cubic Image screening fine tine (191c) connecting on an outer stem part (191d) may include further. The present in the embodiment a boundary stem part (191d) has a pixel switch electrode (191) in the right-and-left to an outer position but, pixel electrode (191) until the top or the bottom of may be loaded with bars are supported from the side rails.

Pixel electrode (191) of tine (191c) has a gate line (121) or transverse stem part and a 40 degrees to 45 degrees. angularly. In addition, the fine region sub from each other can be orthogonal to one another. In addition, fine tine or a progressively widening the width of the fine tine (191c) can be other that the gap between.

Pixel electrode (191) vertical stem part (191b) of the is connected, longitudinal stem part (191b) than large size an extension (197) includes, extension (197) in a contact hole (185) the drain electrode through the first (175) and physical, are electronically coupled to each electric, drain electrode (175) receive voltage data from.

Thin film transistor described until now (Q), a pixel electrode, and the (191) a description and exemplary one, includes at least two first electrodes and to, a pixel electrode, and the thin film transistor structure can be modify the design.

Pixel electrode (191) on the lower alignment film (11) being arranged for receipt of, lower alignment film (11) reflective KIPO & with a vertically aligned liquid. Lower alignment film (11) the polyamic acid (Polyamic acid), polysiloxane (Polysiloxane) or poly amide such as by (Polyimide) as normally used in a liquid crystal alignment film materials at a door and selectively connected to can be formed. In addition, lower alignment film (11) the light directing reflective KIPO &.

Lower alignment film (11) at a portion opposed to a upper alignment film (21) is, lower alignment film (11) and the upper alignment film (21) between the fine space (305) is formed. Fine space (305) the liquid crystal molecules (310) including a is black, fine space (305) to which the inlet section (307) has. Fine space (305) the pixel electrode (191) of column direction in other words, along the longitudinal direction can be formed. The present in the embodiment oriented in film (11, 21) is formed an oriented material and liquid crystal molecules (310) including liquid crystal material is a (capillary force) using fine space wool government authority (305) able to be injected KIPO &. The present in the embodiment in lower alignment film (11) and the upper alignment film (21) is distinct according to position and, as shown in the 4 also may be connected to each other. Lower alignment film (11) and the upper alignment film (21) can be formed simultaneously.

Fine space (305) substrate is formed with (121) and overlapping a plurality of positioned on a region of a liquid crystal to which an injection part (307FP) divided in the longitudinal direction by space plurality of microchannels by (305) forming a, a plurality of fine space (305) the pixel electrode (191) of column direction in other words, along the longitudinal direction can be formed. In addition after the barrier walls described (PWP) by fine space (305) transverse cross divided into space plurality of microchannels by (305) forming a, a plurality of fine space (305) the pixel electrode (191) in row directions namely the gate line (121) along the laterally extend can be formed. Plurality formed space (305) between the pixel areas along a first one or more each may correspond to the, pixel region corresponds to an area displaying the picture can be.

Upper alignment film (21) commonly on the electrode (270), lower insulating layer (350) a is located. Common electrode (270) a common voltage is applied and, data voltage is applied a pixel electrode (191) is adapted to generate an electric field with the least one of fine space (305) located liquid crystal molecules (310) and decides the substrates and have negative dielectric anisotropy. Common electrode (270) the pixel electrode (191) and the pixel electrodes has a pair of bent thin film transistor is turned off and a (turn-off) even after the holds the applied voltage.

Lower insulating layer (350) the silicon nitride (SiNx) or silicon oxide (SiOx) may be formed as.

The present in the embodiment located on a common electrode (270) is fine space (305) formed in the top end but described which, other in the embodiment to perform the electrode (270) is fine space (305) formed on the bottom of. the brightness of the sub-liquid crystal according to mode of horizontal electric field.

The present in the embodiment the lower insulating layer (350) on loop layer (230) is located a. The present in the embodiment, the loop layer (230) can be the converting. Also as shown in the 3, loop layer (230) a plurality of liquid crystal injection part (307FP) the adjacent positioned at a side of the protrusions of the support table (235) includes. Projection (235) relatively refers to 4n - (390), projecting above a than. can have a shape. I.e., loop layer (230) a plurality of liquid crystal injection part (307FP) the adjacent one side to project from the type protrusions (235) by the inclusion of, liquid crystal injection part (307FP) which trap is the via hole. In addition, projection (235) 4n - including an ink jet of shading material (390) the pixel corresponding to a region from an the below and flooding to fine space can be prevent.

Also as shown in the 4 adjacent color filter among one color of microwave oven (230) a partition part to form a (PWP). Barrier walls (PWP) in a transverse direction and neighboring fine space (305) between the. Barrier walls (PWP) in a transverse direction and neighboring fine space (305) of spaced-apart. an expanded metal, and the sections, and fills the space. Also as shown in the barrier walls 4 (PWP) the fine space (305) spacings complete filling of a the height structure, and necessarily not limited to, spaced only in the structure modified. embodiment. Barrier walls (PWP) a data line (171) extend along the a direction can be formed.

Barrier walls (PWP) on adjacent color filter (230) can be overlap. Adjacent color filter (230) meet (PWP) a boundary surface barrier walls and a portion corresponding to the. may be positioned.

Hereinafter is one of the present invention consults a 5 and 6 in the embodiment according to converting a loop formed layer (230) to the as further described to.

In one of the present invention also in the embodiment according to Figure 5 shows a liquid crystal display device is a planar representing grounded color filter and. Figure 6 shows a light with improved brightness to trasition-trasition along the cutting line is cross-sectional drawing of Figure 5.

Also 5 and Figure 6 shows a liquid crystal display device according to one embodiment of the invention in a are also grounded color filter and about indicative of the outlines to describe the drawing and, substrate (110) and the micro-fine space (305) between 2 to 4 also components of applying the described can be.

Also consults a surface 5 and 6, the present in the embodiment according to color filter (230) color the number 1, number 2 and number 3 color filter and including a color filter, blue color filter (B) tend to reduce network interference arising from number 1, number 2 tend to reduce network interference arising from red color filter (R), number 3 tend to reduce network interference arising from green color filter (G) may comprise an.

According to the present in the embodiment, barrier walls (PWP) color the number 1, number 2 color filter, and supplies the color filter number 3 is formed by in color filter. One in the embodiment of the present invention corresponding to blue color filter (B) number 1 170 barrier walls to form a (PWP). Blue color filter (B) has a pixel switch region (PX) formed by being extended to the at a portion corresponding to the are grounded (PWP) and operates to emit light of color filter (R) and a green color filter (G) between the barrier walls may comprise an (PW). At this time, red color filter (R) and a green color filter (G) simultaneously (PWP) of the fluorescent layer that covers at a rim portion with a mutually opposite, barrier walls (PWP) can be overlapping each other on.

Blue color filter (B) instead red color filter (R) or green color filter (G) to barrier walls (PWP) .also to form a. However, blue color filter (B) is red color filter (R) or green color of light emitted from at least the (G) which a light-blocking effect they on color filter (B) to barrier walls (PWP) to external light to output the first the movable member is driven by a a light reflection advantageous, as it requires fewer is connected to the semiconductor layer.. As well as, blue color filter (B) has a light blocking serves and guarantees the fluidity of a photoresist component laminate excellent. good (taper angle) widens to upper and lower directions. Thus, barrier walls form a shape (PWP) a partial end when the to or perpendicular to an under cut is generated at a roughly 45 also at an angle of at least in the form of barrier walls lying down (PWP) by covering a side wall of barrier walls (PWP) is spread on the well 170 can be formed.

Also as shown in the 5, color filter (230) has a pixel switch region island-shape so as to correspond to (PX) can be.

In the embodiment taught front without limit to an each barrier walls adjacent the (PWP) (230) extends (PWP) is barrier walls form may be loaded with.

Also 3 and 4 the reference again, loop layer (230) each of the upper regions with the insulating layer (370) a is located. Upper insulating layer (370) the silicon nitride (SiNx) or silicon oxide (SiOX) may be formed as. Also 3 as shown in the upper insulating layer (370) the color filter (230), for covering the KIPO & of the side sections of the.

Figure 7 shows a liquid crystal display device according to one embodiment of the invention a are also 4n - in is a planar representing placement of and protrusions.

Also consults a surface 3 and 7, display area (DA) liquid crystal injection part (307FP) 4n - (390) is, 4n - (390) the air part (307FP) which is exposed due to a fine space (305) the inlet portion of the (307) covers the. 4n - (390) the fine space (305) a liquid crystal material is contactable with the.. Specifically, 4n - (390) the air part (307FP) along the, liquid crystal injection part (307FP) and a that lies near the projecting type protrusions (235) on the pixel region by the corresponding fine space can be open on the. I.e., in the embodiment according to one of the present invention projection (235) a loop layer (230) on the main liquid crystal injection part (307FP) located along the, inkjet of shading material including 4n - (390) the pixel corresponding to a region from an overflows over fine space can be prevent.

The present in the embodiment according to 4n - (390) a water soluble polymer material and ink jet of shading mass. The present in the embodiment to operate close to the loop frequency water-soluble polymer material in is represented by formula 1 can be polyvinyl alcohol. In addition, the present in the embodiment according to the water-soluble polymer material (Methoxypolyethylene Glycol) [...] glycol, polyethylene glycol (Polyethylene Glycol), polyethylene glycol methacrylate diaryl (Poly (ethylene Glycol) diacrylate), polyethylene glycol dimethacrylate (Polyethylene Glycol dimethacrylate), and vinyl fatigue money (Polyvinylpyrrolidone) may comprise an at least one. N that is representative of the number of the repeat units in formula 1 which can be natural.

Formula 1

The present in the embodiment in a water soluble black dye or inkjet of shading material may comprise an black pigment. Soluble black dye a 4n - (390) capping for forming and is the portion of the compound material, capping black pigment dispersed in the material can be exists in the form.

A black dye soluble in the embodiment according to the present 2 - naphthalene sulfonic acid (2-naphthalenesulfonic acid), tree sodium 6 [(7 - amino - 1 - hydroxy - 3 - naphthyl - 2 - sulfinato sulfoalkyl) azo] - 3 - [[4 - [[4 - amino -6 (or 7) - [...] sulfoalkyl] azo] phenyl] azo] - 4 - hydroxy-naphthalene - 2 - sulfonate (trisodium 6 - [(7-functional beverage-1-hydroxy-3-sulphonato-2-naphthyl) azo] - 3 - [[4 - [[4-functional beverage-6 (or 7) - sulphonatonaphthyl] azo] phenyl] azo] - 4-hydroxynaphthalene-2-sulphonate), tree sodium 4 - amino - 3 - [[4 - [[4 - [(2 - amino - 4 - hydroxyphenyl) azo] phenyl] amino] - 3 - sulfinato sulfoalkyl phenyl] azo] - 5 - hydroxy - 6 - (phenyl azo) naphthalene - 2, 7 - die sulfonate (trisodium 4-functional beverage-3 - [[4 - [[4 - [(2-functional beverage-4-hydroxyphenyl) azo] phenyl] amino] - 3-sulphonatophenyl] azo] - 5-hydroxy-6 - (phenylazo) naphthalene-2, 7-disulphonate), and die sodium 4 - amino - 3, 6 - bis [[4 - [(2, 4 - die aminophenyl) azo] phenyl] azo] - 5 - hydroxy-naphthalene - 2, 7 - die sulfonate 2, 7 - naphthalene the die opinion phone it buys (disodium 4-functional beverage-3, 6-bis [[4 - [(2, 4-diaminophenyl) azo] phenyl] azo] - 5-hydroxynaphthalene-2, 2 7-disulphonate, 7-naphthalenedisulfonic acid) may comprise an at least one.

The present in the embodiment 4n - in (390) the water soluble polymer, because it includes the element in contact with liquid crystal hydrophobic, is not from being contaminated liquid crystal material even. In addition, 4n - (390) an ink jet of shading substrate and the second substrate are bonded, because it includes the material for cutting off the. capable, if required, of acting black matrix. Thus, shielding member serves for a separate and can form a black matrix exhibiting can be the BARC film and the.

In addition, photo process 4n - (390) as compared with is formed, according to an embodiment of the present invention 4n - (390) includes an inkjet a light shielding material for shielding light mask process proceeding and the photo process an inkjet process, simplify the penetration hole while moving up and down.

4n - (390) on or organic is formed on the overcoat layer by using a polymerizable surfactant (395) can be is located. Overcoat layer by using a polymerizable surfactant (395) the external impact from fine space (305) that is poured in a liquid crystal molecules (310) for protecting layer pattern is make which serves to fasten the. In addition, an overcoat layer by using a polymerizable (395) an external of moisture and oxygen to shield a may be loaded with.

The present in the embodiment as shown in the 4 is, laterally neighboring fine space (305) between the one color of microwave oven (230) by barrier walls (PWP) is formed. Barrier walls (PWP) a partition (Partition Wall) by forming a fine space (305) can be or definitions of a second surface opposing the first surface. The present in the embodiment utilizes space (305) between the barrier walls barrier rib of such as (PWP) are converted into heat and substrate (110) and is less apt to have a stress even flexing of the, cell gap (Cell Gap), change. constitution: a control generating process is degree.

Figure 8 shows a in the embodiment representing a liquid crystal display includes at least one device is cross-sectional drawing of Figure 4. Figure 9 shows a in the embodiment according to liquid crystal display device representing the arrangement of and protrusions 4n - in is plane view of Figure 8.

Also 8 and 9 reference to an surface, most and a in the embodiment described in Figure 4 or liquid crystal same injection part (307FP) 4n - along the (390) as well as is formed, data line (171) extend a direction along the upper insulating layer (370) 4n - on (220) is located a. Described herein a 4n - (390) the air part (307FP) along a data line and shielding member number 1 (171) positioned along the shielding comprising a member which is a number 2, number 1 number 2 shielding member and shielding member the same material, electrode can be formed on the same.. Also as shown in the 9 shielding member number 1 and number 2 shielding member matrix form may be formed as.

At this time, loop layer (230) shielding member number 1 number 2 and the shielding member and an adjacent and is formed at one side of, a relatively surface and shielding member number 1 number 2 shielding member projected form projections (235) may include a.

Specifically, number 1 number 2 4n - shielding member and including blocking member (390) the air part (307FP) and data line (171) extend along a direction and, liquid crystal injection part (307FP) and data line (171) the position corresponding to the length direction of the (235) on the pixel region by the corresponding fine space can be open on the. I.e., in the embodiment according to one of the present invention projection (235) a loop layer (230) on the main shielding member number 1 number 2 and located along the shielding member, 4n - (390) the pixel corresponding to a region from an overflows over fine space can be prevent.

Figure 10 shows a in the embodiment representing a liquid crystal display includes at least one device is cross-sectional drawing of Figure 4.

Also consults a surface 10, in the embodiment described in Figure 4 but same most and a data line (171) extend a direction along the shielding member (220) is formed. Shielding member (220) the number 3 interlayer insulating film (180c) or pixel electrode (191). is positioned over. Described herein light shielding member (220) has a gate line (121) 4n - the main body is integrally formed direction (390) when those of the ball plane and may have matrix. Shielding member (220) the 4n - (390) of a material different may include a. Shielding member (220) the 4n - (390) unlike may comprise an organic material.

Figure 11 shows a in the embodiment includes at least one liquid crystal display device representing a cross-sectional drawing as, loop layer (230) to the changed setting items shape one side of number of Figure 3 3 Figure and under the outside taught in the embodiment and a most equal to.

Loop layer (230) the air part (307FP) the adjacent one side surface a relatively loop layer (230) form and recessed from the than a recess (237) is formed. At this time, recess (237) has a step one aspect of 4n - (390) the loops layer (230) overflows over can be prevent.

I.e., liquid crystal injection part (307FP) covering the 4n - (390) a loop layer (230) of recesses (237) on the pixel region by the corresponding fine space can be open on the.

In addition, loop layer (230) hydrophobicity surface of prevented, 4n - having hydrophilic (390) the pixel corresponding to a region from an over fine space can be prevent.

Also in the embodiment according to Figure 14 shows a to 12 also other of the present invention representing. surface thereof, and the liquid crystal display device.

14 also to 12 also consults a surface, according to an embodiment of the present invention liquid crystal display device the 4n - (390) a liquid crystal display plate assembly (400) in order to expose the bonding pad or periphery areas (PA) to prevent a thin film with the outer surface of the bearing, external which the illumination is incident, and plurality of dummy to prevent dam (355) further may include.

Also as shown in 12, liquid crystal display plate assembly (400) on the main plurality of dummy dam (355) is formed thereby, external infrared rays liquid crystal display plate assembly (400) reticle is to can be.

Also as shown in 13, liquid crystal display plate assembly (400) is formed in the peripheral area of a plurality of dummy dam (PA) (355) is formed thereby, 4n - (390) (PA) from passing the peripheral region a low valve lift condition to prevent.

Dummy dam (355) substrate has a display area (DA) circumscribing a plurality a certain distance from each other within while may be formed as.

The, as shown in 14 also, liquid crystal display plate assembly (400) (PA) located peripheral region of the plurality of dummy dam (355) the line (Line) form, dot (Dot) or the like, having various forms may be formed as.

Also Figure 15 shows a number of liquid crystal display device in the embodiment according to one of the present invention indicative of order method bath.

Also 15 reference to an surface, one of the present invention liquid crystal display device in the embodiment according to bath number of a TFT is formed in substrate by a vacuum deposition method includes (S1).

In the embodiment of switching element in the present thin film transistor serves, for indicating the screen the number signal, input, can be output.

The present in the embodiment in Figure 2 such as a unit pixel 1 in in of transistor (Q) by forming a the number signal, input, but formed in which output, . embodiment a deformable such thin film transistor structure.

When reference again also to 2 4 also, thin film transistor (Q) number 1 on interlayer insulating film (180a), number 2 interlayer insulating film (180b) and number 3 interlayer insulating film (180c) is formed, these through the contact hole (185) is formed on. After, number 3 interlayer insulating film (180c) the first (191) is formed, pixel electrode (191) the contact hole (185) the thin film transistor through to the drain electrode of a (Q) (175) and, so physically connected.

After, pixel electrode (191) on sacrificial layer (300) is formed on. At this time, sacrificial layer (300) for reducing a contact resistance between the (171) along the direction which is parallel with the open part (not shown) to form a. Open the after process color filter (230) a filling of barrier walls can be a (PWP). Sacrificial layer (300) external grudge number or photoresist can be organic material. Pixel electrode (191) a transparent electrically conductive such as IZO or ITO the can be made.

After, including projection includes material layer and a nitration material layer loop (S2).

Also 2 to also 4 again by reference to, loop layer (230) for forming relates to method. Sacrificial layer on common electrode (270) and lower insulating layer (350) .are sequentially formed. Common electrode (270) the ITO or IZO a transparent electrically conductive such as can be formed in the body, lower insulating layer (350) silicon nitride (SiNx) or silicon oxide can be formed into KIPO & (SiO2).

Lower insulating layer (350) on loop layer (230) is formed on. The present in the embodiment according to loop layer (230) can be the converting. At this time, loop layer (230) the air part (307FP) and a are placed adjacent the lower surface relatively projecting projections the type (235) may include a.

Loop layer (230) and protrusions (235) the same material for example color filter material or half tone mask at a time by using the slit mask can be patterned. In addition, converting a loop formed layer (230) the patterning process or exposure/injection part liquid crystal by process (307FP) number in is formed may be for producing a sedated.

Loop layer (230) each of the upper regions with the insulating layer (370) is formed on. Upper insulating layer (370) silicon nitride (SiNx) or silicon oxide can be formed into KIPO & (SiO2).

After, that of an inner fine includes (S3).

Also 2 to also 4 again by reference to, liquid crystal injection part (307FP) the position corresponding to an upper insulating layer (370), lower insulating layer (350) and a common electrode (270) are sequentially etched to expose the sacrificial layer are patterned by a, liquid crystal injection part (307FP) the sacrificial layer through oxygen (O2) ashing (Ashing) processing or wet etching method and. triggers number. At this time, inlet (307) having a space (305) is formed. Fine space (305) the sacrificial layer is an empty spatial state is for producing a sedated number.

Inlet (307) oriented through delivering material on the pixel transistor (191) and a common electrode (270) the orientation film (11, 21) is formed on.

Then, inlet (307) through the fine space (305) ink jet, such as liquid crystal (310) including a. parts non-(S4).

Then, liquid crystal layer is coated on an inner wall the liquid crystal injection part (307FP) by liquid crystal material from can be, liquid crystal injection part (307FP) 4n - nozzles by using an ink jet method so as to cover the IC chip (390) is formed on (S5). For example, inkjet of shading material for printing head of an inkjet printer (not shown) to which an injection part liquid crystal from (307FP) and discharges it to. Such inkjet of shading to pull down and rebuild described front and material, soluble black dye or black pigment may comprise an. The, projection (235) of shading material jet by the pixel corresponding to a region from an fine space (305) over the structure microscopic in an inner space the area to is open can be a capping.

Liquid crystal injection part (307FP) that covers at, pixel corresponding to a region from an fine space (305) performing a photo process to making open a a comparison using comparison with a liquid crystal display device according to e.g., liquid crystal display device according to an embodiment of the present invention the nozzles by using an ink jet method 4n - (390) simplify process number by forming a penetration hole while moving up and down.

The present invention taught or more prescribed in the embodiment and appends a drawing which not limited to, beyond technical idea of the present invention within such a range that causes no replaced by variously, deformation and able to change it's a, in the present invention is in the field of the will apparent to person with skill in the art.