Method to Determine a Patterning Process Parameter
28-03-2019 дата публикации
Номер:
US2019094703A1
Автор: JAK MARTIN JACOBUS JOHAN, MATHIJSSEN SIMON GIJSBERT JOSEPHUS, BHATTACHARYYA KAUSTUVE, JANG WON-JAE, BYUN JINMOO, JAK, Martin Jacobus Johan, MATHIJSSEN, Simon Gijsbert Josephus, BHATTACHARYYA, Kaustuve, JANG, Won-Jae, BYUN, Jinmoo
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Номер заявки: 13-16-20185197
Дата заявки: 19-09-2018
A method to determine a patterning process parameter, the method comprising: for a target, calculating a first value for an intermediate parameter from data obtained by illuminating the target with radiation comprising a central wavelength; for the target, calculating a second value for the intermediate parameter from data obtained by illuminating the target with radiation comprising two different central wavelengths; and calculating a combined measurement for the patterning process parameter based on the first and second values for the intermediate parameter.