СТАЛЬНОЙ ПЛОСКИЙ ПРОКАТ И СПОСОБ ИЗГОТОВЛЕНИЯ СТАЛЬНОГО ТОНКОГО ПРОКАТА

Изобретение касается снабженного системой покрытия стального плоского листа, обладающего в покрытом состоянии оптимизированной комбинацией коррозионной стойкости и свариваемости. Согласно изобретению стальной прокат имеет базовый слой, образованный из стали, и нанесенную на базовый слой систему защиты от коррозии. Система защиты от коррозии содержит металлическое покрытие толщиной менее 3,5 мкм. Металлическое покрытие образовано из первого металлического слоя, нанесенного на базовый слой, и второго металлического слоя, нанесенного на первый металлический слой. Второй металлический слой образует сплав с первым металлическим слоем. Система защиты от коррозии также содержит плазменный полимерный слой, нанесенный на металлическое покрытие. Техническим результатом изобретения является высокая коррозионная стойкость и исключительная адгезия лака, хорошая стойкость к удару камнем, а также хорошая способность к свариванию лазерной сваркой. Указанный технический результат делает стальной прокат ...

СПОСОБ ИЗГОТОВЛЕНИЯ УСТРОЙСТВА ДЛЯ ДОЗИРОВАНИЯ ЛЕКАРСТВА

Изобретение относится к способу изготовления устройства для дозирования лекарства. Способ обработки компонента устройства для дозирования лекарства имеет по меньшей мере одну поверхность, входящую в контакт с лекарством в процессе хранения или применения устройства,и включает следующие этапы: получение указанного компонента и покрытие по меньшей мере одной из поверхностей методом плазменного осаждения для снижения осаждения лекарства на поверхность или разрушения лекарства, при котором по меньшей мере часть процесса плазменного осаждения осуществляют под контролем смещения постоянным током при фиксированном постоянном токе смещения для поддержания постоянной эмиссии электронов и постоянной плотности плазмы, причем на этапе плазменного осаждения компонент заземляют. Способ изготовления устройства для дозирования лекарства включает обработку компонента устройства способом, приведенным выше, получение других компонентов устройства и сборку компонентов. Технический результат: повышение эксплуатационных ...

СПОСОБЫ НАНЕСЕНИЯ ЗАЩИТНЫХ ПОКРЫТИЙ, УМЕНЬШАЮЩИХ ПОЯВЛЕНИЕ ЦАРАПИН, НА ИЗДЕЛИЯ С НАНЕСЕННЫМ МНОГОСЛОЙНЫМ ПОКРЫТИЕМ

Изобретение относится к способам нанесения защитного покрытия, которое может содержать органический материал, на изделие, имеющее уже нанесенный на него пакет слоев, для снижения потенциала образования поверхностных царапин. В способе изготовления изделия с заранее нанесенным покрытием путем нанесения защитного покрытия, уменьшающего появление царапин, обеспечивают промежуточное изделие с заранее нанесенным покрытием, содержащее подложку с нанесенным на нее однослойным или многослойным пакетом. Затем наносят защитное покрытие, уменьшающее появление царапин, процессом, связанным с откачкой, так, что изделие с заранее нанесенным покрытием и нанесенным на него защитным покрытием имеет угол контакта больший, а поверхностное трение меньшее, чем угол контакта и поверхностное трение промежуточного изделия с заранее нанесенным покрытием. Этап нанесения содержит этапы, на которых загружают в жидкой форме материал с низким давлением пара в нагревательную вакуумную камеру, соединенную с напыляющей ...

СПОСОБ И УСТРОЙСТВО ДЛЯ ПЛАЗМЕННОЙ ОБРАБОТКИ ПОРИСТОГО ТЕЛА

Способ плазменной обработки пористого тела включает стадии генерирования плазмы с использованием инертного газа или газовой смеси, состоящей из инертного газа и химически активного газа, подачи полученной плазмы к пористому телу с расходом, отнесенным к единице площади поверхности пористого тела и составляющим от 0,002 до 2 л/мин/см2, просасывания пористого тела в атмосфере плазмы или просасывания пористого тела при подаче плазмы к пористому телу с указанным расходом, производя тем самым эффективную плазменную обработку поверхностей и пор пористого тела. 5 н. и 1 з.п. ф-лы, 11 ил.

СПОСОБ И УСТРОЙСТВО ДЛЯ ПЛАЗМЕННОЙ ОБРАБОТКИ ПОРИСТОГО ТЕЛА

... 1. Способ плазменной обработки пористого тела, включающий стадии, на которых генерируют плазму с использованием инертного газа или газовой смеси, состоящей из инертного газа и химически активного газа, (а) подают полученную плазму к пористому телу с расходом, отнесенным к единице площади поверхности пористого тела, составляющим от 0,002 до 2 л/мин/см2, (b) просасывают пористое тело в атмосфере плазмы, или (с) просасывают пористое тело при подаче к пористому телу плазмы с указанной величиной расхода, вызывая прохождение плазмы через пористое тело. ! 2. Устройство для плазменной обработки пористого тела в камере, содержащее средство для генерирования плазмы, трубопровод для подачи плазмообразующего газа, представляющего собой инертный газ или газовую смесь, состоящую из инертного газа и химически активного газа, к средству генерирования плазмы, и пористую подложку, размещенную в камере, при этом пористая подложка размещена в таком месте, что она воспринимает давление потока плазмы, подводимой ...

ПОЛИМЕРНАЯ ПОДЛОЖКА, ИМЕЮЩАЯ ПОВЕРХНОСТЬ, ПОДОБНУЮ СТЕКЛУ, И ЧИП, ПОЛУЧЕННЫЙ ИЗ УПОМЯНУТОЙ ПОЛИМЕРНОЙ ПОДЛОЖКИ

... 1. Микрожидкостный чип, содержащий по меньшей мере одну первую полимерную подложку, имеющую первую поверхность, подобную поверхности стекла, которая имитирует поверхность стекла по одному или нескольким параметрам, выбранным из:уровня содержания химического компонента, состава химических компонентов, химической структуры, гомогенности, шероховатости, морфологии, пористости, гидрофильности, сродства поверхностной энергии, адсорбционного сродства, поверхностной функциональности, химической поверхностной реакционной способности, физической поверхностной реакционной способности, дзета-потенциала и поверхностного заряда.2. Микрожидкостный чип по п.1, в котором поверхность, подобная поверхности стекла, представляет собой первую поверхность, подобную поверхности травленого стекла.3. Микрожидкостный чип по п.2, в котором упомянутая поверхность, подобная поверхности стекла, представляет собой по меньшей мере одно из поверхности, модифицированной в результате проведения плазменной обработки, поверхности ...

Mit Aminogruppen beschichtete Oberfläche

Deposition of macromolecular light-emitting layer useful for light-emitting diode

Deposition of macromolecular light-emitting layers is carried out by vaporizing a highly conjugated polymer at \- 300 deg C and <= 50 mbar, and depositing on a substrate under plasma polymerisation conditions together with a plasma-polymerisable monomer. An Independent claim is also included for an obtained coated substrate.

A METHOD OF FORMING A POLYMER FILM

Verfahren und Vorrichtung zur Schutzbeschichtung von Verspiegelungsschichten

VERFAHREN ZUM ABSCHEIDEN EINER POLYMERSCHICHT

SUBSTRAT MIT EINER POLAREN PLASMAPOLYMERISIERTEN SCHICHT

Plasmapolymere Haftschichten

Beschrieben wird ein Verfahren zur Applikation einer als Haftschicht einsetzbaren plasmapolymeren Beschichtung auf ein Substrat, mit folgenden Schritten: DOLLAR A - Bereitstellen eines Substrats, DOLLAR A - Bereitstellen eines Precursormaterials, das Doppel- und/oder Dreifachbindungen umfasst, DOLLAR A - in einem Druckbereich zwischen 0,2 und 2 bar (a) Erzeugen eines Plasmastrahls eines Arbeitsgases, (b) Einspeisen eines Precursormaterials in den Plasmastrahl des Arbeitsgases, so dass das Arbeitsgasplasma das Precursormaterial in den Plasmazustand überführt, (c) Abscheiden des im Plasmazustand befindlichen Precursormaterials auf dem Substrat, so dass zumindest ein Teil der Doppel- und/oder Dreifachbindungen des Precursormaterials erhalten bleibt.

KRATZBESTAENDIGE PLASMABESCHICHTUNG.

Verfahren und Einrichtung zur plasmagestützten Oberflächenbehandlung

PLASMAUNTERSTÜTZTE GASPHASENAUSSCHEIDUNG VON KONJUGIERTEN POLYMEREN

Nieder- und Mitteldruck-Plasmaverfahren zur Oberflächenbeschichtung mittels Percursorzuführung ohne Trägergas

Die vorliegende Erfindung betrifft ein Verfahren zur Beschichtung mindestens einer Oberfläche eines zwei- oder dreidimensionalen Körpers, einer Vorrichtung zum Beschichten mindestens einer Oberfläche eines zwei- oder dreidimensionalen Körpers, die beschichtete Oberfläche an sich sowie die Verwendung eines trägergasfreien Einbringens eines flüssigen, mindestens eine Vorläuferverbindung enthaltenden Mediums in eine Beschichtungskammer.

Verfahren zur Herstellung eines Behälters aus Kunststoff mit einer Sperrbeschichtung

MIT FLÜSSIGKEIT DAUERBEFEUCHTBARER DURCHLÄSSIGER STOFF

Method for surface coating of a base material with layer materials, comprises providing the base material with a protective material, wearing out upper most part of the protective layer and providing the protective layer with a cover layer

The method comprises providing a base material (1) with a protective material in a first step, wearing out upper most part of the protective layer in a second step and providing the protective layer with a cover layer by a plasma coating process in a third step. The coating is carried out with the cover layer by a plasma assisted chemical vapor deposition process. The protective layer is cleaned and/or degreased after the first or the second section through a plasma process. The coating of the protective layer in the first and/or second step is carried out through a plasma process. The method comprises providing a base material (1) with a protective material in a first step, wearing out upper most part of the protective layer in a second step and providing the protective layer with a cover layer by a plasma coating process in a third step. The coating is carried out with the cover layer by a plasma assisted chemical vapor deposition process. The protective layer is cleaned and/or degreased ...

Verfahren und Vorrichtung zur Plasmabehandlung von Werkstücken

Das Verfahren und die Vorrichtung dienen zur Plasmabehandlung von Werkstücken. Das Werkstück wird in eine zumindest teilweise evakuierbare Kammer einer Behandlungsstation eingesetzt und zur Unterstützung einer Handhabung der Werkstücke wird mindestens ein Teil der Behandlungsstation relativ zu einem weiteren Teil bewegt. Die Bewegung wird derart durchgeführt, daß eine hülsenförmige Kammerwandung relativ zu einem Kammerboden sowie relativ zu einem Kammerdeckel positioniert wird.

Low reflectance fingerprint resistant surface for displays

Specular and diffuse refection and fingerprints are reduced associated with a display are reduced through the use of any or all of an anti-reflection (AR) coating, a self-assembled monolayer (SAM) coating, and micro-structures to selectivity deflect or diffract the incident light.

Method of coating a composite material and a coated edge of a composite structure

A method of coating a composite 20 comprises applying an adhesion promotion layer 22 containing metal particles 26 in a binder paint 24 to the composite and applying a thermal spray coating 28 to the adhesion promotion layer. Typically, the metal particles are irregularly-shaped and may be produced by water atomisation. The particles may be steel particles having a size of 5-90 microns. In one embodiment, at least some of the metal particles are exposed through the binder paint so as to engage the thermal spray coating when applied. The adhesion promotion layer and the overlying thermal spray coating may be applied to an edge 20a of the composite. Preferably, the edge has a rounded or bevelled profile. The thermal spray coating may comprise a high velocity oxygen fuel spray coating. Alternatively, a twin wire arc bond coating may be applied to the adhesion promotion layer before application of the high velocity oxygen fuel spray coating.

Method for producing a composite coating

Liquid repellant surfaces

Improvements relating to chiroptical switches

Deposition of anhydride layers

Plasma coated electrical or electronic devices

Apparatus for the coating and/or conditioning of substrates

Plasma coating of footwear

Coatings

Vehicle lamp coating film

Improved method for coating a substrate

Vapour delivery system

Rewritable photopatterning

A method of photopatterning rewritable reactive groups onto surfaces using typically a plasmachemical deposition of functionalized polymer material, followed by molecular printing of inks on the polymer surface. Subsequent treatment of the reactive groups allows for surface rewriting and also the method allows for the creation of either positive or negative image multifunctional rewritable patterned surfaces. An example of a functionalized surface comprising anhydride reactive groups to which a functional molecular dye (cresyl violet perchlorate) is attached. The dye molecules may be selectively attached and detached to provide a rewritable photopattern.

Coated electrical assembly

Method for forming a coating on an electronic or electrical device

A method for producing a thiol functionalised surface

Method of coating the channels of a microfluidic device

A barrier layer within individual channels or cavities of a microfluidic device is formed by placing the microfluidic device in a gas plasma reactor and generating reactive fragments or constituents (using the reactor) which diffuse into the cavities or channels of the device, wherein the fragments react with one another and are deposited upon the surfaces of the cavities or channels to form the barrier. Ideally, the generated barrier layer is a silicon oxide which is formed by the vaporization of oxygen and organosilicon compounds in the gas plasma reactor to form various reactive constituents. A metallic precursor, such as titanium, may be added to form a titanium constituent which is deposited to give a titanium oxide layer. The microfluidic device is ideally formed from polydimethylsiloxane.

Functionalised solid surfaces

Method and apparatus for producing a coating of substrate

Product

Improvements relating to nanocomposites

Plasma polymerized polymer nanocomposites for adhering substrates comprises introducing an atomized monomer and a nanofiller component into a plasma discharge to activate at least part of the monomer and/or nanofiller component; and exposing the join between the substrates to the monomer and nanofiller component to form a polymer nanocomposite in the join. The monomer is 2-hydroxyethyl methacrylate and the nanofiller is surface modified silica nanoparticles.

Method of surface treating microfluidic devices

Paint with low light reflectivity

Coatings

The coating is preferably 1 nm to 15 µm thick and halogen free. The aromatic moiety is preferably a phenyl group. The carbonyl group is preferably acrylic ester or vinyl ester. The preferred composition contains a crosslinking agent, preferably one having multiple olefinic or acetylenic unsaturation, a carbonyl moiety and aromatic moiety, or specifically divinyl adipate (DVA), 1,4-butanediol divinyl ether (BDVE), 1,4-cyclohexanedimethanol divinyl ether (CDDE), 1,7-octadiene (17OD), 1,2,4-trivinylcyclohexane (TVCH), 1,3-divinyltetramethyldisiloxane (DVTMDS), diallyl-1,4-cyclohexanedicarboxylate (DCHD), glyoxal bis(diallyl acetal) (GBDA) or 1,4-phenylene diacrylate. Most preferably the coating is derived from benzyl acrylate with DVA curing agent. The method can be used to form protective covers on printed circuit boards (PCB).

Improvements in drug delivery device

Improvement in drug delivery devices.

The invention relates to improvements in pressurised dispensing containers and particularly those for dispensing a metered dose of medicament. Pressurised dispensing container is provided for dispensing medicament wherein at least a portion of one or more of the internal surfaces of components of the pressurised dispensing container which come into contact with the medicament during storage or dispensing has a layer of one or more cold plasma preliminaried monomers bonded to at least a portion thereof.

Improvements in drug delivery device

CONNECTION LAYER FOR COATINGS ON PLASTIC SUBSTRATES

TREATMENT DEVICES

PROCEDURE FOR MANUFACTURING A COATED PLASTIC BODY

DEVICE FOR CVD COATINGS

PERMANENT TRANSPARENCIES COATINGS FOR AIRPLANE PASSENGER WINDOWS

APPLY A COATING MATERIAL ON A SUBSTRATE

COOLED DEVICE FOR THE PLASMA DEPOSIT OF A BARRIER LAYER ON A CONTAINER

PROCEDURE FOR EASILY CLEANING SUBSTRATES AND ARTICLES FROM IT

VERFAHREN ZUR HERSTELLUNG EINER SCHUTZSCHICHT AUF DER OBERFLAECHE OPTISCHER REFLEKTOREN UND VORRICHTUNG ZUR DRUCHFUEHRUNG DES VERFAHRENS

PROCEDURE FOR THE PRODUCTION OF A PROTECTIVE LAYER ON THE SURFACE OF OPTICAL REFLECTORS AND DEVICE FOR DRUCHFUEHRUNG THE PROCEDURE

CHECK FILM AND PROCEDURE FOR ITS PRODUCTION

ARTICLE WITH PLASMA-POLYMERE COATING

DIRT-HIDING COATING

COATED ARTICLE AND PROCEDURE FOR ITS PRODUCTION.

CHANGE THE LUMEN OF KUENSTLICHEN CONTAINERS OF MEANS PLASMA

LEATHER AND ITS SIDE DRESSING

PROCEDURE AND MECHANISM FOR EXAMINING THE CHEMICAL INTERACTIONS

PROCEDURE FOR THE PRODUCTION OF A MEDICINE DONOR

PROCEDURE FOR THE FUNCTIONALIZATION OF FIRM SURFACES

PROCEDURE FOR THE SURFACE TREATMENT OF A WORKPIECE AND THEREBY MANUFACTURED WORKPIECE

LASTING RISING UP LENSES

PROCEDURE FOR THE PRODUCTION OF UV JETS PROTECTING COATINGS BY PLASMA-STRENGTHENED STEAM SEPARATION

LAY ON A FLUOROPOLYMER FILM ON A BODY

WITH LIQUID OF DAUERBEFEUCHTBARER PERMEABLE MATERIAL

HYDROPHILIC FILMS BY PLASMA POLYMERIZATION

PROCEDURE FOR SEPARATING A POLYMER LAYER

PROCEDURE FOR MANUFACTURING POLYMERS WITH NONLINEAR OPTICAL CHARACTERISTICS

PLASMA-SUPPORTED GASEOUS PHASE ELIMINATION OF CONJUGATED POLYMERS

PROCEDURE AND DEVICE FOR THE PRODUCTION OF A COATING

TREATMENT DEVICES

TREATMENT DEVICES

TREATMENT DEVICES

TREATMENT DEVICES

TREATMENT DEVICES

TREATMENT DEVICES

TREATMENT DEVICES

TREATMENT DEVICES

TREATMENT DEVICES

TREATMENT DEVICES

TREATMENT DEVICES

Product having a thin film polymer coating and method of making

APPARATUS SUITABLE FOR PLASMA SURFACE TREATING AND PROCESS FOR PREPARING MEMBRANE LAYERS

Breathable waterproof sole for shoes

Waterproof vapor-permeable multilayer article

Breathable waterproof sole for shoes

Extended wear ophthalmic lens

An ophthalmic lens is disclosed which is suited for extended-wear periods of at least one day on the eye without a clinically significant amount of corneal swelling and without substantial wearer discomfort. The lens has a balance of oxygen permeability andion or water permeability, with the ion or water permeability being sufficient to provide good on eye movement, such that a good tear exchange occurs between the lens and the eye. A preferred lens is a copolymerization product of an oxyperm macromer and an ionoperm monomer. The invention encompasses extended wear contact lenses, which include a core having oxygen transmission and ion transmission pathways extending from the inner surface to the outer surface.

ABRASION RESISTANT PLASMA COATINGS

Wound healing device

A plasma coating device for treating a wound comprises a plasma chamber having: one or more electrodes, a gas supply inlet, a plasma outlet exposed to ambient pressure, and an ignition system operatively connected to the electrodes for providing a non-thermal equilibrium plasma within the plasma chamber. An aerosol delivery system is operable to introduce a bioresorbable material as an aerosol into the plasma, to produce a coating on the wound surface.

Weatherable & Abrasion Resistant Coating Systems for Polymeric Substrates

Disclosed herein is a primer composition comprising an inorganic UV absorbing agent and a polymer selected from (i) a copolycarbonate, and (ii) a polyurethane obtained by reaction of a polyisocyanate and a copolycarbonate diol. Also disclosed is a coated article comprising a polymeric substrate, a primer layer disposed on at least one surface of said substrate, and an abrasion-resistant layer disposed on said primer layer, where the primer layer is made from the primer composition of the invention.

Surface treating method and film depositing method

A surface treating method for treating a surface of a substrate inside a process chamber includes the steps of generating an atmosphere containing no moisture in the process chamber, heating the substrate inside the atmosphere containing no moisture in the process chamber; and causing a reaction between the substrate and an adhesion accelerating agent by feeding the adhesion accelerating agent gas into the process chamber.

Porogens, Porogenated Precursors and Methods for Using the Same to Provide Porous Organosilica Glass Films with Low Dielectric Constants

A chemical vapor deposition method for producing a porous organosilica glass film comprising: introducing into a vacuum chamber gaseous reagents including at least one precursor selected from the group consisting of an organosilane and an organosiloxane, and a porogen that is distinct from the precursor, wherein the porogen is a Cto Ccyclic hydrocarbon compound having a non-branching structure and a degree of unsaturation equal to or less than 2; applying energy to the gaseous reagents in the vacuum chamber to induce reaction of the gaseous reagents to deposit a preliminary film on the substrate, wherein the preliminary film contains the porogen; and removing from the preliminary film substantially all of the labile organic material to provide the porous film with pores and a dielectric constant less than 2.6. 1. A chemical vapor deposition method for producing a porous organosilica glass film represented by the formula SiOCHF , where v+w+x+y+z=100% , v is from 10 to 35 atomic % , w is from 10 to 65 atomic % , x is from 5 to 30 atomic % , y is from 10 to 50 atomic % and z is from 0 to 15 atomic % , said method comprising:providing a substrate within a vacuum chamber;{'sub': 4', '14, 'introducing into the vacuum chamber gaseous reagents including at least one precursor selected from the group consisting of an organosilane and an organosiloxane, and a porogen that is distinct from the precursor, wherein the porogen is a Cto Ccyclic hydrocarbon compound having a non-branching structure and a degree of unsaturation equal to or less than 2;'}applying energy to the gaseous reagents in the vacuum chamber to induce reaction of the gaseous reagents to deposit a preliminary film on the substrate, wherein the preliminary film contains the porogen; andremoving from the preliminary film substantially all of the labile organic material to provide the porous film with pores and a dielectric constant less than 2.6.2. The method of wherein the dielectric constant is less than 2.2.3. ...

PLASMA TREATMENT OF SUBSTRATES

A process for plasma treating a substrate comprises applying a radio frequency high voltage to at least one electrode positioned within a dielectric housing having an inlet and an outlet while causing a process gas to flow from the inlet past the electrode to the outlet, thereby generating a non-equilibrium atmospheric pressure plasma. An atomized or gaseous surface treatment agent is incorporated in the non-equilibrium atmospheric pressure plasma. The substrate is positioned adjacent to the plasma outlet so that the surface is in contact with the plasma and is moved relative to the plasma outlet. The flow of process gas and the gap between the plasma outlet and the substrate are controlled so that the process gas has a turbulent flow regime within the dielectric housing. 1. A process for plasma treating a substrate by applying a radio frequency high voltage to at least one electrode positioned within a dielectric housing having an inlet and an outlet while causing a process gas to flow from the inlet past the electrode to the outlet , thereby generating a non-equilibrium atmospheric pressure plasma , incorporating an atomized or gaseous surface treatment agent in the non-equilibrium atmospheric pressure plasma , and positioning the substrate adjacent to the outlet of the dielectric housing so that the surface of the substrate is in contact with the plasma and is moved relative to the outlet of the dielectric housing , wherein the flow of process gas and the gap between the outlet of the dielectric housing and the substrate are controlled so that the process gas has a turbulent flow regime within the dielectric housing.2. A process according to claim 1 , wherein the gap between the outlet of the dielectric housing and the substrate is controlled to be less than 1.5 mm.3. A process according to claim 2 , wherein the flow of process gas is monitored and the gap between the plasma outlet and the substrate is controlled to be below the line shown in of the accompanying ...

Polymeric substrate having an etched-glass-like surface and a microfluidic chip made of said polymeric substrate

The present invention relates to a polymeric substrate having a glass-like surface, in particular an etched-glass-like surface and to a chip made of at least one such polymeric substrate. The present invention also relates to a method of providing a polymeric substrate with an etched-glass-like surface. Moreover, the present invention relates to a kit for manufacturing a chip using such polymeric substrate. Moreover, the present invention relates to the use of a polymeric substrate having a glass-like surface, in particular an etched-glass-like surface for manufacturing a chip.

SURFACE TREATMENT OF RUBBER USING LOW PRESSURE PLASMA

A method of treating a surface of an object comprising a rubber material and in particular a bladder for use in a process for making a vehicle tyre. The method comprises subjecting the surface to a gas at a low pressure at which the gas is susceptible of forming plasma, and causing the gas to form plasma. In order to obtain repellent properties of the surface of the rubber material fluorine gas such as tetrafluormethane or hexafluorethane is used. Preferably the treatment is performed until there is obtained a surface layer of the rubber material with properties modified by the treatment having an expected lifetime corresponding to the expected lifetime of the object. 1. A method of treating a surface of an object comprising a rubber material , wherein the object being a bladder for use in a process for making a vehicle tyre , the method comprising:subjecting the surface to a gas at a low pressure at which the gas is susceptible of forming a plasma, wherein the gas is a fluorine gas; andcausing the gas to form a plasma.2. The method according to claim 1 , wherein the fluorine gas contains tetrafluormethane and/or hexafluorethane.3. The method according to claim 1 , wherein the object is a bladder for use in a process for making a vehicle tyre.4. The method according to claim 1 , wherein the treatment is performed until there is obtained a surface layer of the rubber material with properties modified by the treatment having an expected lifetime corresponding to the expected lifetime of the object.5. The method according to claim 3 , wherein the treatment is performed until there is obtained a surface layer of the rubber material with properties modified by the treatment having an expected lifetime corresponding to the expected lifetime of the object and where the bladder is in a stretched position during the plasma treatment.6. The method according to claim 1 , wherein the stretching is done by mechanical means.7. The method according to claim 1 , wherein the ...

Method for Polymer Plasma Deposition

The present invention is related to a method or the deposition of a chlorinated polymeric layer onto a ubstrate, said method comprising the steps of:—generating a plasma in a gaseous medium by means of a plasma device;—placing the substrate in contact with the plasma, or in the post-plasma area;—introducing in said plasma or in the post-plasma area a chlorinated precursor of the chlorinated polymer. 2. Method according to wherein the precursor partial pressure in the plasma device is lower than or equal to the saturation vapour pressure of the precursor at the substrate temperature.3. Method according to wherein the gaseous medium further comprises a plasma generating gas such as Argon or Helium.4. Method according to wherein the chlorinated precursor comprises a chlorinated organic compound having a Cl/C ratio higher than 0.25 claim 1 , preferably higher than 0.5 claim 1 , more preferably higher than or equal to 1.5. Method according to wherein said chlorinated precursor comprises a polychlorinated organic compound selected from the group consisting of polychloroalkane claim 1 , polychloroalkene claim 1 , polychloroalkyne claim 1 , polychloroarene claim 1 , tertiary amine comprising perchloroalkanes groups and mixture thereof.6. Method according to wherein said polychlorinated organic compound is a perchlorinated organic compound.8. Method according to wherein the temperature of ionic and neutral species in the plasma is below 400° C. claim 1 , preferably below 150° C.9. Method according to any wherein the plasma is a dielectric barrier discharge (DBD)plasma claim 1 , a DC pulsed plasma claim 1 , a microwave plasma or a electron cyclotron resonance (ECR) discharge plasmas.10. Article comprising a substrate and a chlorinated polymeric layer producible by the method according to .11. Article according to wherein said polymeric layer is cross-linked.12. Article according to wherein said polymeric layer comprises a polymer selected from the group consisting of PVC ...

Plasma cvd apparatus, method for forming thin film and semiconductor device

A plasma CVD apparatus including a reaction chamber including an inlet for supplying a compound including a borazine skeleton, a feeding electrode, arranged within the reaction chamber, for supporting a substrate and being applied with a negative charge, and a plasma generating mechanism, arranged opposite to the feeding electrode via the substrate, for generating a plasma within the reaction chamber. A method forms a thin film wherein a thin film is formed by using a compound including a borazine skeleton as a raw material, and a semiconductor device includes a thin film formed by such a method as an insulating film. The apparatus and method enable to produce a thin film wherein low dielectric constant and high mechanical strength are stably maintained for a long time and insulating characteristics are secured.

LOW TEMPERATURE PLASMA COATING FOR ANTI-BIOFILM FORMATION

The present invention is a process for surface treatment of a fluid-contacting device where a continuous organo-silicon or organo-silicon and oxygen plasma coating is applied at a low temperature by a plasma deposition technique to at least one contacting surface of the device and devices with the process applied. The plasma coating inhibits bacterial attachment to the device and prevents biofilm formation on said device. The coating preferably has a thickness from about 1 nm to about 100 nm, more preferably from about 20 nm to about 30 nm. The trimethylsilane and oxygen gas mixture is an approximate ratio of 1 to 4. The invention demonstrates that bacterial cells on the organo-silicon or organo-silicon/Ocoated surface are more susceptible to antibiotic treatment than their counterparts in biofilm formed on uncoated surface. 1. A process for surface treatment of a fluid-contacting device comprising the step of:applying a plasma coating to at least one contacting surface of said device, wherein said plasma coating inhibits bacterial attachment to said device.2. The process of wherein said plasma coating prevents biofilm formation on said device.3. The process of wherein said plasma coating is comprised of at least one organo-silicon monomer.4. The process of wherein said plasma coating is applied at a low temperature by a plasma deposition technique in vacuum or at atmospperic pressure to form a continuous layer on said at least one surfce of said device.5. The process of wherein said layer having a thickness from about 1 nm to about 100 nm.6. The process of wherein said layer having a thickness from about 20 nm to about 30 nm.7. The process of cliam 1 wherein said at least one monomer is from the silane group and is seleceted from dimethylsilane claim 5 , trimethylsilane claim 5 , vinyltrichlorosilane claim 5 , tetraethoxysilane claim 5 , vinyltriethoxysilane claim 5 , hexamethyldisilazane claim 5 , tetramethylsilane claim 5 , vinyldimethylethoxysilane claim 5 , ...

METHOD AND DEVICE FOR PRODUCING A PARYLENE COATING

A method of producing a parylene coating on at least one surface of at least one component includes providing a first gas containing parylene monomers and depositing the parylene monomers on the at least one surface of the component by supplying the first gas containing the parylene monomers by a first nozzle to the at least one surface, wherein the component is disposed in an environment at atmospheric pressure. 1. A method of producing a parylene coating on at least one surface of at least one component comprising:providing a first gas containing parylene monomers, anddepositing the parylene monomers on the at least one surface of the component by supplying the first gas containing the parylene monomers by a first nozzle to the at least one surface, wherein the component is disposed in an environment at atmospheric pressure.2. The method according to claim 1 , further comprising providing a second gas in which a plasma is generated and conducting the second gas to the at least one surface as a plasma flow.3. The method according to claim 2 , wherein the at least one surface of the component is chemically activated by the plasma flow.4. The method according to claim 2 , whereinthe first gas containing the parylene monomers is provided outside of the first nozzle,the second gas is conducted by the first nozzle, in which the plasma is generated, as a plasma flow to the at least one surface, andthe first gas containing the parylene monomers is conducted to the plasma flow in the first nozzle.5. The method according to claim 2 , wherein the second gas is conducted to the at least one surface as a plasma flow by a second nozzle claim 2 , in which the plasma is generated.6. The method according to claim 1 , wherein the parylene monomers are produced by cleavage of parylene dimers in the first nozzle by a supply of heat and/or by a plasma in the first nozzle.7. The method according to claim 1 , wherein the at least one surface of the component is formed by silicone and/or ...

LIQUID REPELLENT SURFACES

A method for forming a liquid repellent surface on a substrate, said method comprising applying a combination of nanoparticles and a polymeric material to the surface in a chamber using ionisation or activation technology, in particular plasma processing. 1. A method for forming a liquid repellent surface on a substrate , said method comprising applying a combination of nanoparticles and a polymeric material to the substrate in a chamber using ionisation or activation technology.2. A method as claimed in wherein the nanoparticles comprise silver claim 1 , palladium claim 1 , gold claim 1 , silicone claim 1 , silica claim 1 , titanium dioxide or polymeric nanoparticles.3. A method as claimed in wherein the nanoparticles have an average diameter of from 1 to 500 nm.4. A method as claimed in wherein the polymeric material is hydrophobic and/or oleophobic.5. A method as claimed in claim 1 , wherein the substrate is selected from fabrics claim 1 , fibres claim 1 , clothing claim 1 , shoes claim 1 , electronic or electrical devices or components thereof claim 1 , laboratory consumables claim 1 , filtration media or membranes or microfluidic devices.6. A method as claimed in wherein in a first step claim 1 , nanoparticles are disposed on the surface of the substrate in the chamber claim 1 , and in a subsequent step claim 1 , the substrate is exposed to ionisation or activation conditions in the presence of a monomer capable of forming said polymeric material under said conditions.7. A method as claimed in wherein the nanoparticles are disposed on the substrate surface using ionisation or activation technology.8. A method as claimed in which method comprises exposing a substrate to ionisation or activation conditions in the presence of a monomer capable of forming a polymer under said conditions and nanoparticles so that the nanoparticles and the polymeric material are formed in a single step.9. A method as claimed in wherein the nanoparticles are dispersed in the monomer ...

Implant with a base body of a biocorrodible alloy

An implant having a base body, comprised either entirely or in part of a biocorrodible metallic material wherein at least the parts of the base body having the biocorrodible metallic material are at least partially covered with a coating of a crosslinked CF x layer that is nonpolymerized and has an F/C ratio in the range of 0.5 to 1.5.

PROCESS FOR DEPOSITION AND CHARACTERIZATION OF A COATING

Provided herein are processes for depositing a plasma coating on a substrate and coated substrates obtained thereby. More particularly, processes for characterizing a plasma coating on a substrate are provided. The process for depositing a plasma coating includes the step of exposing the substrate to a plasma. The plasma includes at least one coating precursor and one fluorophore other than the coating precursor. 1. A process for characterizing a plasma coating on a substrate , whereby a fluorophore is incorporated in said plasma coating and wherein said plasma coating is characterized in-line by monitoring the fluorescence of said fluorophore.2. The process according to claim 1 , comprising the steps of:a) exposing said substrate to a non-thermal plasma or an afterglow region of said plasma, said plasma or afterglow comprising at least one coating precursor and one fluorophore other than said coating precursor, thereby obtaining a coated substrate wherein the coating of said coated substrate comprises said fluorophore;b) irradiating said coated substrate in-line with electromagnetic radiation suitable for exciting said fluorophore; andc) monitoring the light emitted from said fluorophore present in said coating in-line with the coating process so as to characterize said coating.3. The process according to claim 1 , wherein said process is a continuous process.4. The process according to claim 1 , wherein said coating precursor and fluorophore are comprised in a solution claim 1 , said solution being introduced into said plasma or said afterglow in the form of an aerosol together with a carrier gas.5. The process according to claim 3 , wherein said solution comprises said fluorophore in a concentration ranging between 10% and 100% of the concentration at saturation.6. The process according to claim 1 , wherein step c) comprises characterizing at least one property of said coating selected from the coating thickness and coating homogeneity.7. The process according to ...

Plasma Polymerization for Encapsulating Particles

The present invention includes systems, methods and compositions for the encapsulation of particles. In one form, the system comprises one or more particles, a rotatable reaction chamber in a plasma enhanced chemical reactor to accept one or more particles, and at least one carbonaceous compound to be used in the rotatable reaction chamber, wherein the carbonaceous compound is polymerized onto a surface of one or more particles forming a polymer film encapsulating one or more particles. Using systems, methods, and compositions of the present invention, any particle encapsulated with a degradable or nondegradable polymer film may be introduced and/or released into an environment. The polymer film as well as introduction of encapsulated particles and release therefrom into an environment are controlled by the present invention.

Gas distribution showerhead for inductively coupled plasma etch reactor

A two piece ceramic showerhead includes upper and lower plates which deliver process gas to an inductively coupled plasma processing chamber. The upper plate overlies the lower plate and includes radially extending gas passages which extend inwardly from an outer periphery of the upper plate, axially extending gas passages in fluid communication with the radially extending gas passages and an annular recess forming a plenum between the upper and lower plates. The lower plate includes axially extending gas holes in fluid communication with the plenum. The two piece ceramic showerhead forms a dielectric window of the chamber through which radiofrequency energy generated by an antenna is coupled into the chamber. The gas delivery system is operable to supply an etching gas and a deposition gas into the processing chamber such that the etching gas in the plenum can be replaced with the deposition gas.

Enhanced low friction coating for medical leads and methods of making

An implantable or insertable medical device can include a silicone substrate and a plasma-enhanced chemical vapor deposition coating on the silicone substrate. The coating may include a silicon-containing compound. A method of forming the coating is also provided.

Atmospheric plasma treatment of reinforcement cords and use in rubber articles

The present invention is directed to a method of making a cord-reinforced rubber article, comprising the steps of (A) atomizing a mixture of a halogenated hydrocarbon, a carrier gas, and at least one member of the group consisting of hydrocarbon sulfides and polymerizable monomers, to form an atomized mixture; (B) generating an atmospheric pressure plasma from the atomized mixture; (C) exposing a reinforcement cord to the atmospheric pressure plasma to produce a treated reinforcement cord; and (D) contacting the treated reinforcement cord with a rubber composition comprising a diene based elastomer and at least one member of the group consisting of methylene donors and methylene acceptors.

ATMOSPHERIC PLASMA TREATMENT OF REINFORCEMENT CORDS AND USE IN RUBBER ARTICLES

The present invention is directed to a method of treating a reinforcement cord, comprising the steps of 1. A method of treating a reinforcement cord , comprising the steps of(A) atomizing a mixture of at least one hydrocarbon sulfide, a low viscosity organic solvent, and a carrier gas to form an atomized mixture;(B) generating an atmospheric pressure plasma from the atomized mixture; and(C) exposing the reinforcement cord to the atmospheric pressure plasma.2. The method of claim 1 , wherein the low viscosity organic solvent is a halogenated hydrocarbon.3. The method of claim 1 , wherein the low viscosity organic solvent is a non-halogenated organic solvent and a gaseous halogenated compound is added to the atomized mixture or the atmospheric pressure plasma.4. The method of claim 1 , wherein the plasma is generated by dielectric barrier discharge.5. The method of claim 1 , wherein the reinforcement cord is a steel reinforcement cord.6. The method of claim 1 , wherein the reinforcement cord is conveyed continuously during exposure to the atmospheric pressure plasma.7. The method of claim 1 , wherein the carrier gas is selected from the group consisting of argon claim 1 , helium claim 1 , neon claim 1 , xenon claim 1 , nitrogen claim 1 , carbon dioxide claim 1 , nitrous oxide claim 1 , carbon monoxide claim 1 , and air.9. The method of claim 1 , wherein the hydrocarbon sulfide is selected from the group consisting of diisobutyl disulfide claim 1 , dioctyl polysulfide claim 1 , di-tertiary nonyl polysulfide claim 1 , di-tertiary butyl polysulfide claim 1 , di-tertiary benzyl polysulfide claim 1 , di-tertiary-dodecyl polysulfide claim 1 , and olefin sulfides.10. The method of claim 1 , wherein the halogenated saturated hydrocarbon is selected from the group consisting of dichloromethane (methylene chloride) claim 1 , trichloromethane (chloroform) claim 1 , carbon tetrachloride claim 1 , trichloroethane claim 1 , chlorobutane claim 1 , methyl chloride claim 1 , allyl ...

METHOD FOR REDUCING THE WINDING LEVEL ADHESIVENESS OF AN ADHESIVE TAPE ROLL

The invention relates to a method for reducing end face stickiness of a roll () of adhesive tape, by supplying a precursor () to a plasma stream (), using the plasma stream () enriched with the precursor () to coat a carrier film () with a passivation coat () in a plasma process, placing a carrier film section () by its passivation-coated side onto an end face () of the roll () of adhesive tape, removing the carrier film section () and leaving at least part of the passivation coat () on the end face () and reducing its end face stickiness. 1. A method for reducing end face stickiness of a roll of adhesive tape , comprising:supplying a precursor to a plasma stream,using the plasma stream enriched with the precursor to coat a carrier film with a passivation coat in a plasma process,placing a carrier film section by its passivation-coated side onto an end face of the roll of adhesive tape, andremoving the carrier film section and leaving at least part of the passivation coat on the end face and reducing its end face stickiness.2. The method as claimed in claim 1 ,wherein the precursor is supplied to a plasma stream at a plasma nozzle, andthe plasma stream enriched with the precursor is directed at a surface of the carrier film.3. The method as claimed in claim 1 ,wherein a liquid precursor is vaporized and then supplied to a carrier gas.4. The method as claimed in claim 1 ,wherein siloxanes are used as precursor.5. The method as claimed in claim 4 ,wherein HMDSO is used as precursor.6. The method as claimed in claim 1 ,wherein the carrier film section is pressed with a laminating roller onto the end face.7. The method as claimed in claim 1 ,wherein the carrier film is provided with a passivation coat 10 nm to 600 nm thick.8. The method as claimed in claim 1 ,wherein a material selected from the group consisting of PET, PVC, PC, PP, and PE is selected for the carrier film.9. The method as claimed in claim 1 ,wherein an apolar polymer is selected as material of the ...

Task specific ionic liquid-impregnated polymeric surface coatings for antibacterial, antifouling, and metal scavenging activity

Disclosed are polymer-coated surfaces encapsulating task specific ionic liquids (ILs), IL complexes, or oils. Also disclosed are polymer-coated surfaces, wherein the polymer comprises ILs or neutral ethylene diamine compounds. Also disclosed are methods of antimicrobial treatment, metal remediation, and gas absorption using polymer coatings encapsulating ILs, IL complexes, and oils or polymer coatings comprising ILs and neutral ethylene diamine compounds.

COATED ELECTRICAL OR ELECTRONIC DEVICE PROTECTED FROM LIQUID PENETRATION

An electrical or electronic device comprising a polymeric coating, formed by exposing;the device to pulsed plasma comprising a compound of formula (I), 2. An electrical or electronic device according to claim 1 , which is selected from communications devices claim 1 , sound or audio systems devices claim 1 , computers or computer-related components claim 1 , outdoor lighting systems claim 1 , or electrical or electronic devices used in transport vehicles claim 1 , washing machines and dishwashers; or components of any of these.3. An electrical or electronic device according to claim 2 , which is a sound or audio system device.4. An electrical or electronic device according to claim 3 , which is a loudspeaker claim 3 , microphone claim 3 , ringer or buzzer.5. An electrical or electronic device according to comprising a microphone that comprises a foamed plastic cover and the polymeric layer is present thereon.6. An electrical or electronic device according to claim 1 , wherein any alkyl chains in R claim 1 , Ror R claim 1 , have 1 to 6 carbon atoms.7. An electrical or electronic device according to claim 1 , wherein at least one of R claim 1 , Rand Ris hydrogen.8. An electrical or electronic device according to claim 1 , wherein Ris an alkyl group such as methyl or propyl.9. An electrical or electronic device according to claim 1 , wherein the compound of formula (I) is a compound of formula (II){'br': None, 'sub': '2', 'sup': '5', 'CH═CH—R\u2003\u2003(II)'}{'sup': '5', 'claim-ref': {'@idref': 'CLM-00001', 'claim 1'}, 'claim-text': {'br': None, 'sub': 2', '2', 'n, 'sup': 7', '5, 'CH═CRC(O)O(CH)R\u2003\u2003(III)'}, 'where Ris as defined in , or a compound of formula (III)'}{'sup': 5', '7, 'claim-ref': {'@idref': 'CLM-00001', 'claim 1'}, 'sub': 1-10', '1-10, 'where n and Rare as defined in and Ris hydrogen, Calkyl, or Chaloalkyl.'}10. An electrical or electronic device according to claim 1 , wherein Rcomprises an alkyl group having in the range of 6 to 12 carbon atoms ...

SURFACE PLASMON DETECTION APPARATUSES AND METHODS

The disclosed technology relates to methods, apparatuses and systems for detecting molecules using surface plasmon resonance techniques, and more particularly to surface plasmon resonance techniques that employ metal nanoparticles formed on substrates. In one aspect, method of making a layer of metallic nanoparticles includes providing a liquid composition comprising a binder polymer and a solvent and at least partially immersing, into the liquid composition, an article comprising a polymeric surface, wherein the polymeric surface comprises a polymeric material and does not comprise an inorganic glass or crystalline material. The method additionally includes applying a gas phase plasma to the liquid composition to facilitate chemical reactions between the binder polymer and the polymeric material of the polymeric surface to form a binder layer on the polymeric surface of the article. The method further includes applying metallic nanoparticles onto the binder layer to form a metallic nanoparticle layer on the binder layer. 1. A method of making a polymeric layer on a polymeric substrate , the method comprising:providing a liquid composition comprising a binder polymer and a solvent, the binder polymer comprising amine terminals;providing an article comprising a polymeric surface with one or more functional groups reactive with amine, wherein the polymeric surface does not comprise inorganic glass or crystalline material;causing the liquid composition to contact the polymeric surface;applying a gas phase plasma for a period between 1 millisecond and 1 minute to the liquid composition contacting the polymeric surface such that the liquid composition is interposed between the gas phase plasma and the polymeric surface, which to form a polymeric layer comprising cross-linked binder polymers bonded to the polymeric surface by chemical reactions between amine terminals of the binder polymer and the one or more functional groups of the polymeric surface, wherein the gas ...

METHOD OF FORMING A PROTECTED CONNECTION AND CONNECTOR COMPRISING SAID CONNECTION

A method of forming a protected connection between a first connecting element, optionally mounted on a support (), and a second connecting element, the method comprising: (i) depositing a protective material () on the first connecting element and/or on the support; (ii) optionally depositing an overlying coating () on the protective material; and (iii) pushing the second connecting element and establishing a connection between the first connecting element and the second connecting element, the connection being protected by the protective material. 1. A method of forming a protected connection between a first connecting element , optionally mounted on a support , and a second connecting element , the method comprising:(i) depositing a protective material on the first connecting element and/or on the support;(ii) optionally depositing an overlying coating on the protective material; and(iii) pushing the second connecting element and establishing a connection between the first connecting element and the second connecting element, the connection being protected by the protective material.2. The method of claim 1 , wherein step (iii) additionally comprises pushing the second connecting element into the protective material.3. The method of or claim 1 , wherein step (iii) additionally comprises pushing the second connecting element through the overlying coating.4. The method of any one of the preceding claims claim 1 , wherein in step (i) the protective material is deposited on the first connecting element.5. The method of any one of the preceding claims claim 1 , wherein in step (iii) the second connecting element is pushed into the protective material claim 1 , and optionally through the overlying coating claim 1 , to establish a connection between the first connecting element and the second connecting element.6. The method of any one of the preceding claims claim 1 , wherein the support is a printed circuit board.7. The method of any one of the preceding claims claim 1 ...

Functionalized Surface

A method of treating a polymer surface using conventional plasma nitriding, and a nitrided polymer surface obtained thereby. The method comprises introducing nitrogen into the polymer surface using conventional plasma nitriding, and optionally functionalizing the nitrided polymer surface with a molecule, such as an antimicrobial moiety, which is capable of forming a covalent bond with the nitrogen atoms within the polymer surface. 1: Use of conventional plasma nitriding for treating a polymer surface.2: A method of treating a polymer surface , the method comprising introducing nitrogen into the polymer surface using conventional plasma nitriding , thereby producing a nitrided polymer surface.3: The method of claim 2 , wherein the conventional plasma nitriding comprises:placing an article comprising the polymer surface into a vessel; andapplying an electrical current between the article and a wall of the vessel in the presence of a gas comprising nitrogen.4: The method of claim 3 , wherein the pressure of the gas inside the vessel is no more than 5 mbar.5: The method of claim 3 , wherein the gas comprises at least 20% nitrogen.6: The method of claim 3 , wherein the plasma nitriding process is carried out at a temperature of no more than 100° C.7: The method of claim 3 , wherein the plasma is generated by applying a voltage of from 300 V to 375 V between the polymer surface and the vessel wall.8: The method of claim 3 , wherein the current is from 5 to 10 A.9: The method of claim 3 , wherein the plasma nitriding process is carried out for a period of from 1 hour to 25 hours.10: The method of claim 3 , further comprising a step of purging the vessel prior to carrying out the nitriding process.11: The method of claim 2 , wherein the polymer is polyamide claim 2 , polycarbonate claim 2 , polyester claim 2 , polyethylene claim 2 , polyethylene terephthalate claim 2 , polypropylene claim 2 , polystyrene claim 2 , polyurethane claim 2 , polyvinyl chloride claim 2 , ...

METHOD OF PRODUCING A FUNCTIONALIZED SURFACE AND SURFACES MADE THEREBY

A method of photopatterning rewritable reactive groups onto surfaces using typically a plasmachemical deposition of functionalized materials, followed by molecular printing of inks. Subsequent treatment of the reactive groups allows for surface rewriting and also the method allows for the creation of either positive or negative image multifunctional rewritable patterned surfaces. 1. A method of producing a patterned functionalized surface , the method involving:(i) contacting a surface with a polymer having reactive groups so the groups are deposited on the surface to produce a functionalized polymer layer on said surface; and(ii) contacting the functionalized polymer layer with a functional molecule that reacts with the functionalized polymer layer to produce a patterned surface having one or more areas of reactive surface functionality.2. A method according to wherein the substrate material is selected from one or more of woven or non-woven fibres claim 1 , natural fibres claim 1 , synthetic fibres claim 1 , metal claim 1 , glass claim 1 , ceramics claim 1 , semiconductors claim 1 , cellulosic materials claim 1 , paper claim 1 , wood claim 1 , or polymers such as polytetrafluoroethylene claim 1 , polyethylene or polystyrene.3. A method according to claim 1 , wherein the surface is a silicon layer.4. A method according to claim 1 , wherein the polymer is formed by one or more of the following: plasma deposition claim 1 , plasma polymerization claim 1 , thermal chemical vapour deposition claim 1 , initiated chemical vapour deposition (iCVD) claim 1 , photodeposition claim 1 , ion-assisted deposition claim 1 , electron beam polymerization claim 1 , gamma-ray polymerization claim 1 , target sputtering claim 1 , graft polymerization claim 1 , or solution phase polymerization.5. A method according to claim 4 , wherein the polymer is formed by plasma deposition.6. A method according to claim 5 , wherein the process is a pulsed plasma deposition.7. A method according to ...

Wear Resistant and Biocompatible Coatings for Medical Devices and Method of Fabrication

A method of forming a biocompatible or biologically inert article for use in an application in which the article will make contact with at least one tissue, organ, or fluid within a human or animal body is provided. The method generally comprises providing an article having an external surface; selecting chemical precursors; using a means to direct one or more chemical precursors towards or to apply such chemical precursors to the external surface; activating the chemical precursors by exposing said precursors to atmospheric pressure plasma; and grafting and/or cross-linking the chemical precursors to form a solid coating adjacent to the external surface of the article. 1. A method of forming a biocompatible or biologically inert article for use in an application in which the article will make contact with at least one tissue , organ , or fluid within a human or animal body; the method comprising the steps of:providing an article having an external surface;selecting chemical precursors;using a means to direct one or more chemical precursors towards or to apply such chemical precursors to the external surface;activating the chemical precursors by exposing said precursors to atmospheric pressure plasma; andgrafting and/or cross-linking the chemical precursors to form a solid coating adjacent to the external surface of the article.2. The method according to claim 1 , wherein the method further comprises the step of applying a sub-layer to the external surface of the article or pre-treating the external surface prior to the application of the solid coating; the sub-layer or the pretreatment capable of enhancing adhesion of the solid coating to the article claim 1 , providing additional wear or abrasion resistance claim 1 , or increasing hardness of the coating.3. The method according to claim 1 , wherein the article is a medical device or a biomedical implant having a body constructed from one selected from the group of a metal claim 1 , a ceramic claim 1 , a plastic ...

Assembly and method of pretreating localized areas of parts for joining

An assembly and a method of joining a first part with a second part at an attachment area that includes a localized area on the first part. The localized area is cleaned and activated by a plasma jet. An organosilicon composition is applied by plasma-enhanced chemical vapor deposition to the localized area. An adhesive is applied to the localized area and the second part is mechanically fastened to the first part in the localized area.

ATMOSPHERIC PRESSURE PLASMA METHOD FOR PRODUCING PLASMA POLYMER COATINGS

A method for depositing a plasma polymer layer in an atmospheric-pressure plasma on a metallic substrate, wherein the plasma is obtained by a discharge between two electrodes. At least one organic coating precursor compound is fed into the region of the relaxing plasma and is deposited on the metallic substrate as a plasma polymer layer. Nitrogen or a forming gas is used as a treatment gas and the at least one organic coating precursor compound is selected from various compounds. Also disclosed is an article, an electrode and a capacitor which utilize the method and include a metallic substrate having a surface and a plasma polymer layer on the surface. Also disclosed is a method for producing the electrode or for producing the capacitor, a battery cell or a lithium-ion accumulator which comprises the electrode. 1. Method for depositing a plasma polymer layer in an atmospheric pressure plasma onto a metallic substrate , wherein the plasma is generated by a discharge between electrodes ,comprising feeding at least one organic coating precursor compound into an area of relaxing plasma, and depositing the resulting compound onto the metallic substrate as a plasma polymer layer,wherein nitrogen or a forming gas is used as a process gas, andwherein the at least one organic coating precursor compound is selected from the group consisting of heterocyclic compounds, cyclic non-functionalised hydrocarbons and hydrocarbons with at least one functional group selected from the group consisting of an alcohol group, a carbonyl group, a carboxyl group, an amino group, a multiple carbon-carbon bond group, a multiple carbon-nitrogen bond group and a multiple nitrogen-nitrogen bond group.2. Method according to claim 1 , wherein the at least one organic coating precursor compound is fed into the area of the relaxing plasma as a gas mixture together with an inert gas comprising nitrogen claim 1 , wherein the area of the relaxing plasma lies outside of the discharge claim 1 , which ...

PLASMA CVD DEVICE AND PLASMA CVD METHOD

The present invention relates to a plasma CVD device provided with a vacuum chamber, and a plasma CVD electrode unit and a substrate-holding mechanism inside the vacuum chamber. The plasma CVD electrode unit is provided with an anode, a cathode that faces the anode at a distance, and a first gas supply nozzle for supplying gas so as to pass through the plasma-generation space between the anode and cathode. The substrate-holding mechanism is disposed at a position where the gas passing through the plasma-generation space impinges. The length of the anode in the gas-supply direction and the length of the cathode in the gas-supply direction are both longer than the distance between the anode and the cathode. Thus, a plasma CVD device that makes it possible to increase gas decomposition efficiency and achieve high film deposition rate is provided. 1. A plasma CVD device comprising a plasma CVD electrode unit and a substrate-holding mechanism in a vacuum chamber , wherein the plasma CVD electrode unit comprises:an anode;a cathode facing the anode at a distance; anda first gas supply nozzle supplying a gas through a plasma-generation space between the anode and the cathode,the substrate-holding mechanism being provided at a position to contact the gas passing through the plasma-generation space, wherein a gas-supply directional length of the anode and a gas-supply directional length of the cathode are longer than a distance between the anode and cathode.2. The plasma CVD device according to claim 1 , wherein the cathode has a plasma-generation surface on a side facing to the anode and a magnet inside which forms a magnetron magnetic field on the plasma-generation surface.3. The plasma CVD device according to claim 1 , wherein the cathode is constituted by two or more arrayed metal cylindrical electrodes in the gas-supply direction and a plurality of magnets are inserted inside the metal cylindrical electrode.4. The plasma CVD device according to claim 1 , wherein the ...

MEMBRANES, SEPARATORS, BATTERIES, AND METHODS

In accordance with at least selected embodiments, novel or improved porous membranes or substrates, separator membranes, separators, composites, electrochemical devices, batteries, methods of making such membranes or substrates, separators, and/or batteries, and/or methods of using such membranes or substrates, separators and/or batteries are disclosed. In accordance with at least certain embodiments, novel or improved microporous membranes, battery separator membranes, separators, energy storage devices, batteries including such separators, methods of making such membranes, separators, and/or batteries, and/or methods of using such membranes, separators and/or batteries are disclosed. In accordance with at least certain selected embodiments, a separator for a battery which has an oxidation protective and binder-free deposition layer which is stable up to 5.2 volts or more, for example, up to 7 volts, in a battery is disclosed. The deposition layer is preferably a thin, very thin or ultra-thin deposition on a polymeric microporous membrane applied via a binder-free and solvent-free deposition method. By employing such an ultra-thin deposition layer, the energy density of a battery may be increased. In accordance with at least particular embodiments, the battery separator membrane described herein is directed to a multi-layer or composite microporous membrane battery separator which may have excellent oxidation resistance and may be stable in a high voltage battery system up to 5.2 volts or more. In accordance with at least other certain selected embodiments, the present invention is directed to a separator for a battery which has a conductive deposition layer which is stable up to at least 5.2 volts or higher in a battery. 1. A porous membrane or substrate having a thin , very thin or ultra-thin layer of at least one of an inorganic material , organic material , conductive material , semi-conductive material , non-conductive material , reactive material , or ...

ENHANCED LOW FRICTION COATING FOR MEDICAL LEADS AND METHODS OF MAKING

An implantable or insertable medical device can include a silicone substrate and a plasma-enhanced chemical vapor deposition coating on the silicone substrate. The coating may include a silicon-containing compound. A method of forming the coating is also provided. 1. A method of forming a medical device for insertion or implantation into a patient , the method comprising:exposing a silicone substrate to plasma in a chamber; andforming a coating on the silicone substrate by plasma-enhanced chemical vapor deposition (PECVD) of a cyclic silicon-containing compound at a chamber pressure of less than about 200 millitorr (mtorr) after exposing the silicone substrate to plasma, the coating comprising at least about 20 atomic weight percent silicon, of which at least 30 atomic weight percent is in a silica oxidation state.2. The method of claim 1 , wherein the silicon-containing compound comprises octamethyltetracyclosiloxane (OMCTS).3. The method of claim 1 , wherein the PECVD occurs at a chamber pressure of about 20 mtorr or less.4. The method of claim 1 , wherein forming a coating on the silicone substrate includes forming the coating on an inner surface of the silicone substrate.5. The method of claim 1 , wherein exposing the silicone substrate to plasma includes forming free radicals on at least a portion of the silicone substrate.6. The method of claim 5 , wherein forming free radicals on the silicone substrate includes forming plasma from a gas including at least one member selected from the group consisting of oxygen claim 5 , argon claim 5 , tetrafluoromethane (CF) and nitrogen trifluoride (NF) and combinations thereof.7. The method of claim 1 , wherein the coating has a thickness that is about 50 micrometers or less.8. The method of claim 7 , wherein the coating has a thickness between about 10 nanometers and about 500 nanometers.9. A method of forming a medical device for insertion or implantation into a patient claim 7 , the method comprising:positioning a ...

METHOD FOR PLASMA COATING ON THERMOPLASTIC

A composite material, and methods of making thereof, include a polycarbonate substrate and plasma-enhanced chemical vapor deposition formed layers. In particular, a film formed by a process of plasma-enhanced chemical vapor deposition includes: applying a radio frequency bias to a substrate; and supplying a process gas through an antennae, where microwave power applied to the antennae generates plasma of the process gas at the surface of the substrate thereby forming one or more layers on the substrate. In certain aspects the film exhibits one or more (or all) of favorable oxygen transmission rate, barrier improvement factor, optical transmission, surface roughness, chemical resistance and surface roughness properties. 1. A film formed by a process of plasma-enhanced chemical vapor deposition , the process comprising:applying a radio frequency bias to a substrate; andsupplying a process gas through an antennae, where microwave power applied to the antennae generates plasma of the process gas at a surface of the substrate thereby forming one or more layers on the substrate to form the film, [{'sup': −6', '3', '2', '3', '2, 'has an oxygen transmission rate of between about 10cm/m·day·bar and about 1 cm/m·day·bar when measured in accordance with ISO 15105-2,'}, 'exhibits a barrier improvement factor of greater than 1000 when compared to a substantially similar substrate,', 'exhibits a transmission of greater than about 88% at a 2.5 mm film thickness,', 'exhibits a surface roughness substantially similar to the surface roughness of a substantially similar substrate,', 'exhibits chemical resistance to organic solvents, and', 'has a surface roughness of less than about 2 nm., 'wherein the film'}2. A film formed by a process of plasma-enhanced chemical vapor deposition , the process comprising:applying a radio frequency bias to a polycarbonate substrate; andsupplying a process gas through an antennae, where microwave power applied to the antennae generates plasma of the ...

TRANSPARENT SUPERHYDROPHOBIC COMPOSITION

Provided herein is a film and methods of producing the same. The film includes a substrate and a layer adjacent to the substrate, wherein a surface of the layer comprises spaced apart protrusions. The methods include providing a substrate, depositing a layer on at least a portion of the substrate, decomposing the layer to form at least a first phase of material and a second phase of material, and removing at least a portion of the second phase from the decomposed layer to form a structured layer. 1. A method for producing a film , the method comprising:providing a substrate;depositing a layer on at least a portion of the substrate;decomposing the layer to form at least a first phase of material and a second phase of material; andremoving at least a portion of the second phase from the decomposed layer to form a structured layer.2. The method of claim 1 , wherein the step of decomposing the layer comprises:subjecting the layer to flash lamp annealing.3. The method of claim 3 , further comprising:creating a temperature gradient based on the flash lamp annealing such that the temperature of the film decreases from an air-layer interface of the film to a substrate-layer interface of the film.4. The method of claim 3 , wherein the layer is heated and the substrate is not heated.5. The method of claim 1 , wherein the decomposed layer comprises a silica rich crust claim 1 , the method further comprising:removing the silica rich crust prior to removing at least a portion of the second phase.6. The method of claim 5 , further comprising:subjecting the silica crust to a plasma etching process.7. The method of claim 1 , further comprising:applying a hydrophobic silane composition to the structured layer.9. The method of claim 1 , wherein the film is transparent claim 1 , superhydrophobic claim 1 , or antireflective.10. The method of claim 1 , further comprising:subjecting the layer to an oxygen plasma process.11. A film comprising:a substrate comprising an inert material; anda ...

Plasma treatment of liquid surfaces

A method of decreasing a water contact angle and/or increasing a surface energy of a liquid is disclosed herein, the method comprising exposing the liquid to a plasma treatment. Further disclosed is a plasma-treated liquid exhibiting a decreased water contact angle and/or increased surface energy, compared to the water contact angle and/or surface energy, respectively, of a non-treated corresponding liquid. Methods for combining a first liquid and a second liquid, or for enhancing an adhesion between a liquid and a surface of another substance, the methods comprising exposing a liquid to plasma treatment, are further disclose herein, as well as a method of predicting an apparent contact angle of a liquid droplet on a surface of a substance.

COATED ELECTRICAL ASSEMBLY

An electrical assembly which has a multi-layer conformal coating comprising three or more layers on at least one surface of the electrical assembly, wherein the lowest layer of the multi-layer conformal coating, which is in contact with the at least one surface of the electrical assembly, is obtainable by plasma deposition of a precursor mixture comprising (a) one or more organo-silicon compounds, (b) optionally O, NO, NO, H, NHand/or N, and (c) optionally He, Ar and/or Kr; the uppermost layer of the multi-layer conformal coating is obtainable by plasma deposition of a precursor mixture comprising (a) one or more organosilicon compounds, (b) optionally O, NO, NO, H, NHand/or N, and (c) optionally He, Ar and/or Kr; and the multi-layer coating comprises one or more layers which is obtainable by plasma deposition of a precursor mixture comprising (a) one or more hydrocarbon compounds of formula (A), (b) optionally NH, NO, N, NO, CH, CH, CHand/or CH, and (c) optionally He, Ar and/or Kr, Zrepresents C-Calkyl or C-Calkenyl; Zrepresents hydrogen, C-Calkyl or C-Calkenyl; Zrepresents hydrogen, C-Calkyl or C-Calkenyl; Zrepresents hydrogen, C-Calkyl or C-Calkenyl; Zrepresents hydrogen, C-Calkyl or C-Calkenyl; and Zrepresents hydrogen, C-Calkyl or C-Calkenyl. 2. The electrical assembly according to claim 1 , wherein the multi-layer conformal coating has three to thirteen layers.3. The electrical assembly according to or claim 1 , wherein the plasma deposition is plasma enhanced chemical vapour deposition (PECVD).4. The electrical assembly according to any one of the preceding claims claim 1 , wherein the plasma deposition occurs at a pressure of 0.001 to 10 mbar.5. The electrical assembly according to any one of the preceding claims claim 1 , wherein the lowest layer of the multi-layer conformal coating is organic.6. The electrical assembly according to any one of the preceding claims claim 1 , wherein the lowest layer of the multi-layer conformal coating is obtainable by ...

Application of antimicrobial coatings using atmospheric pressure plasma spray systems

Devices and methods are provided to apply thin layers of antimicrobial coatings onto a wide variety of substrates and articles. The methods can be performed at moderate temperatures and pressures, allowing for the coating of sensitive substrates and articles.

Single run deposition for forming supercomposite structures

A method for depositing a multilayer coating onto a substrate includes supporting the substrate on a platen comprising an electrically conductive material disposed in a deposition chamber, connected to an electrical power supply and electrically insulated from an electrode. The pressure in the deposition chamber is less than 10 Torr when a first feedstock is fed to the substrate. The electrical power supply is activated to create a plasma surrounding the substrate which ionises and/or activates particles within the first feedstock, allowing the ionised and/or activated particles from the first feedstock to deposit on the substrate and polymerise, thereby forming a first a coating on the substrate. Particles of a second feedstock, different from the first feedstock, are fed to the substrate and are ionized and/or activated by the plasma and allowed to deposit on the substrate and polymerise to form a second coating on the substrate. The pressure in the deposition chamber does not rise above 700 Torr between feedstocks fed therein.

LAYERED COATING SYSTEM FOR LONG-TERM OUTDOOR EXPOSURE

A layered coating system with enhanced properties capable of protecting an article or a component of an article from exposure to outdoor elements, including UV radiation, extreme temperatures, water, acid rain, other fluids and chemicals; scratching and marring from surface contact; and more. The layered coating system and articles formed therewith are characterized by properties that can include UV-absorption, abrasion and scratch resistance, adhesion to the substrate and within the coating layers, haze and visible light transparency, and impact resistance. 1. A weatherable and abrasion resistant coating system , the coating system comprising two or more coating layers that at least partially encapsulate an organic resin substrate; the coating layers including an outer layer (I) formed of an abrasion resistant atmospheric PECVD film , optionally a bottom layer (III) , and an inner layer (II) having a cured composition comprising: {'br': None, 'sup': 1', '2', '3, 'sub': m', 'n', '4-m-n, '(R)(R)Si(OR)\u2003\u2003 (F-1)'}, '(II-A) a silicone resin reaction product obtained by (co)hydrolyzing, condensing, or (co)hydrolyzing-condensing a member selected from oxysilanes and partial hydrolytic condensates thereof, said oxysilane corresponding to Formula (F-1){'sup': 1', '2', '3, 'wherein Rand Rare independently selected as hydrogen or either a substituted or unsubstituted monovalent hydrocarbon group, Ris a substituted or unsubstituted monovalent hydrocarbon group, and m and n are integers independently selected as 0 or 1 such that m+n is 0, 1 or 2;'}(II-B) an UV absorber, and(II-C) optionally, a residual amount of a solvent;wherein, when present, the bottom layer (III) is configured to increase adhesion between the inner layer (II) and the substrate.2. The layered coating system according to claim 1 , wherein Rand Rare bonded together.3. The layered coating system according to claim 1 , wherein the UV absorber comprises at least one of a hydroxybenzotriazole derivative ...

Method of manufacturing semiconductor device and film forming apparatus

A method of manufacturing a semiconductor includes adjusting a temperature of a substrate having a recess formed therein and accommodated in a container to a temperature within a range of 200 degrees C. or higher and 280 degrees or lower, and laminating a polyurea film in the recess in the substrate by supplying isocyanate gas and amine gas into the container.

Hafnium-containing film forming compositions for vapor deposition of hafnium-containing films

Disclosed are Hafnium-containing film forming compositions comprising Silicon- and Hafnium-containing precursors having one of the following formulae: wherein each R 1 , R 2 , R 3 , R 4 , R 5 , R 6 , R 7 , Fe, R 9 and R 19 is independently selected from H; a C1-C5 linear, branched, or cyclic alkyl group; or a C1-C5 linear, branched, or cyclic fluoroalkyl group. Also disclosed are methods of synthesizing the disclosed compositions and using the same to deposit Hafnium-containing thin films on substrates via vapor deposition processes.

Method for Forming Regular Polymer Thin Films Using Atmospheric Plasma Deposition

The invention provides a method for forming regular polymer thin films on a substrate using atmospheric plasma discharges. In particular, the method allows for the deposition of functional polymer thin films which require a high regularity and a linear polymer structure. 1. A method for forming a polymer thin film on a substrate , comprising the following subsequent steps:providing a mixture comprising at least one polymer forming material; andapplying a sequence of atmospheric plasma pulses to the mixture in order to form a polymer thin film on a surface portion of a substrate, which is contacted by said mixture;{'sub': ON', 'OFF, 'wherein each plasma pulse presents a duration t, comprised between one nanosecond and one microsecond, during which the plasma is discharged, and a duration t, comprised between one microsecond and one second, during which the plasma is not discharged; and'}{'sub': ON', 'ON', 'OFF, 'wherein the duty-cycle of a plasma pulse t/(t+t) is lower than 1%.'}2. The method according to claim 1 , wherein the duty-cycle is lower than 0.1%.3. The method according to claim 1 , wherein each plasma discharge is generated by a voltage pulse claim 1 , which rises to the plasma discharge breakdown voltage in one nanosecond to one microsecond.4. The method according to claim 3 , wherein the voltage rise rate of the voltage pulse is of at least 10 V·ns.5. The method according to claim 3 , wherein the voltage pulses are repeated at a frequency which is lower than one of the following:one kHz; andone hundred Hz.6. The method according to claim 3 , wherein the voltage pulse is a square wave voltage pulse.7. The method according to claim 6 , wherein the square wave is a bipolar square wave.8. The method according to claim 6 , wherein the square wave is a positive or negative unipolar square wave.9. The method according to claim 3 , wherein the duration of a voltage pulse is comprised between one nanosecond and one second.10. The method according to claim 1 , ...

A PLASMA POLYMERISATION METHOD FOR COATING A SUBSTRATE WITH A POLYMER

A plasma polymerisation method for coating a substrate with a polymer layer, which method includes: providing a substrate to be coated within a plasma chamber; introducing a flow of a first polymer precursor to the plasma chamber; applying a power at a level greater than zero Watts (W) and converting the first polymer precursor to a first polymer precursor plasma; exposing the substrate to the first polymer precursor plasma; introducing a flow of a second polymer precursor to the plasma chamber; applying a power at a level greater than zero Watts (W) and converting the second polymer precursor to a second polymer precursor plasma; and exposing the substrate to the second polymer precursor plasma, wherein exposing the substrate to the first polymer precursor plasma forms a first polymer layer thereon and exposing the substrate to the second polymer precursor plasma forms a second polymer layer thereon, characterised by maintaining the power at a level greater than zero Watts (W) between exposing the substrate to the first polymer precursor plasma and exposing the substrate to the second polymer precursor plasma. 2. A plasma polymerisation method according to claim 1 , wherein the power which converts the second polymer precursor to the second polymer precursor plasma is different from the power which converts the first polymer precursor to the first polymer precursor plasma.4. A plasma polymerisation method according to claim 3 , wherein the second power level is lower than the first power level such that the power is reduced immediately from the first power level to the second power level.5. A plasma polymerisation method according to claim 1 , including setting the pressure within the plasma chamber to a first polymer precursor operating pressure for converting the first polymer precursor to the first polymer precursor plasma and setting the pressure within the plasma chamber to a second polymer precursor operating pressure for converting the second polymer ...

SURFACE COATINGS

A method of forming a liquid repellent coating on a surface of a substrate, where the surface is exposed to a monomer in a plasma process under conditions that maintain the monomer in situ for a period of time to allow a polymeric layer to form on the surface, wherein the conditions comprise at least one cycle of varying pressure.

APPARATUS AND METHODS FOR PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION OF POLYMER COATINGS

Apparatuses and methods are described that involve the deposition of polymer coatings on substrates. The polymer coatings generally comprise an electrically insulating layer and/or a hydrophobic layer. The hydrophobic layer can comprise fused polymer particles have an average primary particle diameter on the nanometer to micrometer scale. The polymer coatings are deposited on substrates using specifically adapted plasma enhanced chemical vapor deposition approaches. The substrates can include computing devices and fabrics. 1. A method for forming a protective coating on a substrate , the method comprising:depositing a collection of polymer particles having an average primary particle diameter of from about 20 nm to about 10 microns on the substrate to form a fused particle layer.2. The method of wherein the polymer particles have an average primary particle diameter of from about 20 nm to about 200 nm.3. The method of comprising pulsing a first precursor comprising a monomer into a plasma enhanced chemical vapor deposition chamber to form the particles by a chemical reaction comprising the monomer.4. The method of wherein the plasma is pulsed.5. The method of wherein the particles are spheroidal.6. The method of wherein the depositing comprises exposing claim 1 , in a vacuum chamber claim 1 , the substrate to a pulsed plasma formed from a first precursor composition comprising a first monomer represented by the formula RRC═CRR;{'sub': 2', '3', '4, 'wherein R, R, and Rcan be independently be a hydrogen, a halogen, of a fluorinated or perfluoronated linear or branched, saturated or unsaturated, hydrocarbon chain having 1 to 20 carbon atoms; and'}{'sub': 1', '5', '5, 'wherein Ris represented by the formula —COORand wherein Rcan be hydrogen, or a hydrocarbyl group; and'}wherein the plasma is generated using a pulsed RF field.7. The method of wherein the first monomer comprises 1H claim 6 , 1H claim 6 , 2H claim 6 , 2H-tridecylfluorooctyl methacrylate or 1H claim 6 , 1H ...

SEALING ARTICLE

The present invention relates to a sealing article comprising an elastomeric and/or polymeric substrate and a plasma polymeric coating arranged thereon and consisting of carbon, silicon, oxygen, hydrogen and (i) fluorine or (ii) no fluorine and optionally usual impurities, the following relationships applying to the substance amount ratios in the plasma polymeric coating: 1. Sealing article , comprising an elastomeric and/or polymeric substrate and a plasma polymeric coating arranged thereon and consisting of carbon , silicon , oxygen , hydrogen and (i) fluorine or (ii) no fluorine and optionally usual impurities , the following relationships applying to the substance amount ratios in the plasma polymeric coating:{'br': None, 'i': n', 'n, '1.3:1≤(O): (Si)≤3.0:1, and'}{'br': None, 'i': n', 'n, '0.3:1≤(C):(Si)≤5.0:1.'}2. Sealing article according to claim 1 , wherein the sealing article is suitable for dynamic loads.3. Sealing article according to claim 1 , wherein in the ESCA spectrum of the plasma polymeric layer claim 1 , with calibration on the aliphatic proportion of the C is peak at 285.00 eV claim 1 , compared to a trimethylsiloxy-terminated polydimethylsiloxane (PDMS) with a kinematic viscosity of 350 mm/s at 25° C. and a density of 0.97 g/mL at 25° C. claim 1 ,the Si 2p peak has a bonding energy value which is displaced by more than 0.4 eV to higher bonding energies orthe O 1s peak has a bonding energy value which is displaced by more than 0.50 eV to higher bonding energies.4. Article according to claim 1 , wherein the sealing article has on the side of the plasma polymeric coating remote from the substrate a sliding friction coefficient of ≤0.25.5. Article according to claim 1 , wherein the plasma polymeric layer has a hardness of from 1.5 to 5 GPa or a modulus of elasticity of from 10 to 50 GPa claim 1 , measured by means of nanoindentation.6. Article according to claim 1 , wherein the plasma polymeric coating has on the side remote from the substrate a ...

COATING

A method of applying a coating to a device which has one or more components housed in a housing. A liquid coating precursor is applied to at least part of the internal surface of the housing and/or at least part of the one or more components within the housing. Low pressure conditions are applied to the closed housing, sufficient to cause the liquid coating precursor to evaporate and initiation of the liquid coating precursor to thereby cause the coating to form on at least some of the internal surfaces of the device. 1. A method of applying a coating to a device , the device comprising one or more components housed in a housing , the method comprising the steps of:(i) applying liquid coating precursor to at least part of the internal surface of the housing and/or at least part of the one or more components ;(ii) applying below atmosphere pressure conditions to the closed housing, with the one or more components inside the housing, the pressure conditions being sufficient to cause the liquid coating precursor to evaporate; and(iii) initiation of the liquid coating precursor, to thereby cause the coating to form from the liquid precursor on at least some of the internal surfaces of the device.2. A method according to claim 1 , wherein the initiation of the liquid coating precursor comprises an energizing and/or ionization field claim 1 , such as a plasma.3. A method according to any one of and claim 1 , wherein the initiation of the liquid coating precursor is selected from plasmas claim 1 , including atmospheric based plasmas;penning ionization; laser; initiated and oxidative chemical vapour deposition; free radical initiators; and electromagnetic radiation including visible and infra-red light.4. A method according to any one of to claim 1 , wherein the coating formed by plasma polymerization.5. A method according to claim 4 , wherein the coating is applied using a pulsed plasma.6. A method according to claim 4 , wherein the coating is applied using a continuous ...

SUPERHYDROPHOBIC COATINGS FOR DEPOSIT REDUCTION IN SELECTIVE CATALYTIC REDUCTANT SYSTEMS

Superhydrophobic coatings to reduce deposit formation of diesel exhaust fluid (DEF) within selective catalytic reduction (SCR) systems. 1. A method for reducing deposits on the internal surface of SCR component(s) comprising:providing an SCR component having an internal volume and internal surface and creating a vacuum within the interior volume of the SCR component;supplying gas to the interior volume of said SCR component wherein the gas includes a plasma precursor in the gas phase;biasing the SCR component to ground;forming a plasma along the length of said SCR component;generating positive ions of said plasma precursor which are deposited on the internal surface of said SCR component;forming a coating on said internal surface of said SCR component wherein said coating exhibits a water contact angle in oil of greater than 120°.2. The method of claim 1 , wherein said plasma precursor comprises hexamethyldisiloxane.3. The method of wherein said plasma precursor comprises a perfluorinated propylene oxide.5. The method of claim 1 , wherein said coating comprises 50 to 60 atomic percent carbon claim 1 , 20 to 30 atomic percent oxygen and 15 to 25 atomic percent silicon.6. The method of claim 1 , wherein said coating claim 1 , at a depth of up to 300 Angstroms claim 1 , comprises the following bond types:(a) Si—O— at a relative concentration of 38.5(±12) %;(b) Si—C at a relative concentration of 25.6 (±5) %;(c) C—O at a relative concentration of 4.5 (±3) %; and(d) C—C at a relative concentration of 31.4 (±2) %.7. The method of claim 1 , wherein said coating has a thickness of up to 5.0 μm.8. The method of claim 1 , wherein said coating has a water contact angle in oil of greater than 120° to 170°.9. The method of claim 1 , wherein said coating has a water contact angle in oil of greater than 155°.10. The method of wherein said coating comprises a fluoro-organsiloxane coating.11. The method of claim 1 , wherein said SCR component comprises metallic tubing.12. The method ...

Plasma Treatment and Plasma Enhanced Chemical Vapor Deposition onto Temperature Sensitive Biological Materials

A method and apparatus for depositing a film on a biological substrate are provided. A plasma generation device includes a dielectric conduit and a high voltage electrode. The plasma generation device is placed in proximity to the biological substrate and a gas supply that includes a precursor material is directed through the dielectric conduit. An electric field generated by the potential difference between the high voltage electrode and the biological substrate ionizes at least a portion of the gas supply and causes plasma to emanate from the dielectric conduit and contact the biological substrate. The plasma induces a reaction of the precursor material to form a film that is deposited on the biological substrate. 1. A method of depositing a film on a biological substrate , comprising:placing a dielectric conduit in the proximity of the biological substrate, the dielectric conduit having a high voltage electrode disposed about its external surface;directing a gas flow containing a precursor material through an interior of the dielectric conduit; andsupplying the high voltage electrode with an alternating voltage,wherein an electric field generated by a potential difference between the high voltage electrode and the biological substrate ionizes at least a portion of the gas flow causing a plasma to emanate from a downstream end of the dielectric conduit, propagate through ambient conditions, and contact the biological substrate, andwherein the plasma induces a dissociation reaction of the precursor material to form a film that is deposited on the biological substrate.2. The method of claim 1 , wherein supplying the high voltage electrode with an alternating voltage comprises supplying the high voltage electrode with a sinusoidal voltage waveform.3. The method of claim 2 , wherein the sinusoidal voltage waveform has a frequency between 20 and 40 kilohertz.4. The method of claim 1 , wherein directing the gas flow containing the precursor material through the interior ...

Method to Produce an Item of Footwear with Improved Wearing Comfort, and Item of Footwear Produced According to this Method

The present invention concerns a method for coating outer, internal and inner surfaces of an item of footwear with a water- and/or oil-repellent coating by a low-pressure plasma polymerization coating process, by degassing the item of footwear prior to said coating process. 112-. (canceled)14. Method according to claim 13 , wherein said set low pressure to which the plasma chamber is pumped down claim 13 , is equal to or higher than a set base pressure of the coating step or an optional pre-treatment step.15. Method according to claim 13 , comprising shielding parts of the item of footwear prior to said coating process claim 13 , removing of parts of the item of footwear prior to said coating process claim 13 , and/or separately coating parts of the item of footwear by said coating process prior to assembly of the parts into said item.16. Method according to claim 13 , wherein the low pressure plasma polymerization is preceded by a low pressure plasma pre-treatment step claim 13 , preferably wherein the outgassing and the pre-treatment are combined in a single processing step.17. Method according to claim 13 , wherein the item of footwear is a sports shoe.19. Method according to claim 13 , wherein the low pressure plasma polymerization uses a monomer which is an organosilane claim 13 , wherein the organosilane is:{'sub': 1', '2', '1', '3', '4', '5', '2', '3′', '4′', '5′', '3', '4', '5', '3′', '4′', '5′', '3', '4', '5', '3′', '4′', '5′, 'Y—X—Ywherein X is O or NH, Yis —Si(Y)(Y)Yand Yis Si(Y)(Y)Ywherein Y, Y, Y, Y, Y, and Y are each independently H or an alkyl group of up to 10 carbon atoms; wherein at most one of Y, Yand Yis hydrogen, at most one of Y, Y and Y is hydrogen; and the total number of carbon atoms is not more than 20;'}{'sub': 3', 'q', '2-q', 'n, 'cyclic according to —[Si(CH)(H)—X—]— where n is 2 to 10, wherein q is 0 to 2 and wherein the total number of carbon atoms is not more than 20;'}{'sub': 2', '1', '2', '3', '4', '1', '3', '1', '2', '3', 't', '2t+1 ...

Method for Treating an Elongated Object, Apparatus and Method

The invention relates to a method for treating an elongated object using a plasma process. The method comprises the steps of providing an elongated object in a planar electrode structure, and applying potential differences between electrodes of an electrode structure to generate the plasma process. Further, the method comprises at least partially surrounding the elongated object by a unitary section of the guiding structure, the electrode structure being associated with the unitary section. 1. A method for treating an elongated object using a plasma process , comprising:providing at least one elongated object and a planar electrode structure, wherein the at least one elongated object has a structure that extends along a longitudinal direction of the elongated object;providing at least one outlet port, on either side of the planar electrode structure, and in series with the planar electrode structure;treating, via the at least one outlet port and the planar electrode structure, the at least one elongated object with a flow and plasma process, wherein the flow and plasma process further comprises:blowing a carrier gas over a surface of the at least one elongated object via the at least one outlet port; andactivating the surface of the at least one elongated object with a plasma process via the planar electrode structure; andapplying potential differences between electrodes of the electrode structure to generate the plasma process, wherein the at least one elongated object is positioned near or on the electrode structure.2. The method according to claim 1 , wherein the flow process further comprises:depositing at least one of a polymerization material or nanomaterial at the activated surface of the at least one elongated object via one or more of the at least one outlet port.3. A method for treating an elongated object using a plasma process claim 1 , comprising:providing at least one elongated object and a planar electrode structure, wherein the at least one elongated ...

Coating of usage surfaces with plasma polymer layers under atmospheric pressure in order to improve the cleanability

In a method for applying an easily cleanable surface to a domestic article, a polymer surface layer is deposited by one or more nozzles on at least a part of the surface of the domestic article by plasma polymerization in the presence of an atmospheric pressure plasma based on at least one precursor.

HEM FLANGE PLASMA TREATMENT PROCESS

A hem flange treatment method. The method includes air plasma direct spraying a hem flange at an outer edge of an outer panel thereof with a plasma polymer direct spray to cover the outer edge with a protective direct spray region. The method further includes air plasma overspraying an inner cut edge of an inner panel of the hem flange with a plasma polymer overspray to form a protective overspray region that covers the inner cut edge. 1. A method comprising:air plasma direct spraying a hem flange at an outer edge of an outer panel thereof with a plasma polymer direct spray to cover the outer edge with a protective direct spray region; andair plasma overspraying a cut edge of an inner panel of the hem flange with a plasma polymer overspray to form a protective overspray region that covers the inner cut edge.2. The method of claim 1 , wherein the plasma polymer overspray exits the hem flange at an inner opening between the outer and inner panels.3. The method of claim 1 , further comprising directly applying a phosphate coating to the surfaces of the inner panel and the cut edge prior to the air plasma direct spraying and overspraying steps to form an inner panel phosphate coated surface.4. The method of claim 3 , further comprising directly applying an electrocoat to the inner panel phosphate coated surface to form inner panel coated regions and inner panel exposed regions.5. The method of claim 4 , wherein the air plasma direct spraying and overspraying steps form a barrier coating on the inner panel coated and exposed regions.6. The method of claim 4 , wherein the inner panel exposed regions include exposed regions on the cut edge.7. The method of claim 1 , wherein the plasma polymer direct spray includes polymerized HMDSO.8. A method comprising:electrocoating a hem flange having inner and outer panels, each including inner surfaces, to form inner panel surface coated and exposed regions;spraying the hem flange at an outer edge of the outer panel with a plasma ...

SOFT PLASMA POLYMERIZATION PROCESS FOR A MECHANICALLY DURABLE SUPERHYDROPHOBIC NANOSTRUCTURED COATING

A method for depositing a coating on a substrate is disclosed. A first precursor comprising fluoro-acrylate monomers, fluoro-alkyl acrylate monomers, fluoro-methacrylate monomers, fluoro-alkyl methacrylate monomers, fluoro-silane monomers, or a combination or derivates thereof is provided. A second precursor comprising linear siloxanes, silane monomers, cyclosiloxanes, cyclosilane monomers, or a combination or derivates thereof is provided. The first and second precursors are co-injected in a treatment region. An atmospheric or reduced pressure plasma discharge is created in said treatment region. The substrate coating comprises alternated multi-stacked nanostructures and is formed by copolymerization of the first and second precursors. 115.-. (canceled)16. A method for depositing a superhydrophobic coating on a substrate , comprising the steps of:providing a first precursor comprising fluoro-acrylate monomers, fluoro-alkyl acrylate monomers, fluoro-methacrylate monomers, fluoro-alkyl methacrylate monomers, fluoro-silane monomers, or a combination or derivates thereof;providing a second precursor comprising cyclosiloxanes;co-injecting said first and second precursors in a treatment region; andcreating an atmospheric pressure or reduced pressure plasma discharge in said treatment region to deposit a superhydrophobic coating derived from said co-injected first and second precursors on said substrate, whereby the plasma discharge comprises a power density of at least 0.05 W·cm−2 and at most 100 W·cm−2.17. The method according to claim 16 , wherein the second precursor comprises a cyclopolydisubstitutedsiloxane represented by the formula [—(R1R2)SiO-]z claim 16 , whereby each of R1 and R2 is claim 16 , independently of one another claim 16 , an alkyl group of from 1 to 30 carbon atoms claim 16 , an aryl group of from 6 to 60 carbon atoms claim 16 , or a substituted alkyl group or a substituted aryl group of from about 1 to about 30 carbon atoms claim 16 , and wherein z ...

PLASMA POLYMERIZATION COATING APPARATUS AND PROCESS

Introduced here is a plasma polymerization apparatus. Example embodiments include a reaction chamber in a shape substantially symmetrical to a central axis. Some examples further include a rotation rack in the reaction chamber. The rotation rack may be operable to rotate relative to the reaction chamber about the central axis of the reaction chamber. Examples may further include reactive species discharge mechanisms positioned around a perimeter of the reaction chamber and configured to disperse reactive species into the reaction chamber in a substantially symmetrical manner from the outer perimeter of the reaction chamber toward the central axis of the reaction chamber, such that the reactive species form a polymeric coating on surfaces of the one or more substrates during said dispersion of the reactive species, and a collecting tube positioned along the central axis of the reaction chamber and having an air pressure lower than the reaction chamber. 1. A reaction chamber apparatus for performing plasma polymerization on the surface of one or more substrates , the apparatus comprising:a primary rotation rack operably coupled to a primary rotation shaft and configured to rotate along a central axis, the primary rotation rack including one or more arms extending from the primary rotation shaft and away from the central axis;a secondary rotation rack operably coupled to a secondary rotation shaft and configured to rotate on a secondary axis that is distal from the central axis, the secondary rotation shaft coupled to an arm of the one or more arms extending from the primary rotation shaft;one or more substrate platforms configured to carry the one or more substrates that are to receive the plasma polymerization coating, each substrate platform located on the secondary rotation rack; anda controller configured to transmit a rotation rate control signal to a rotation motor to rotate the primary rotation shaft and primary rotation rack at a controlled rotation rate.2. ...

Coating method for energetic material and coating system for coating energetic material using said type of coating method

The invention relates to a coating method for energetic material (), in particular in a vacuum. The energetic material () is coated by chemical or physical vapor deposition. The coating material () is electrically conductive and/or hydrophobic or hydrophilic. The energetic material () is shaped as grains and/or pellets and/or is in the form of a powder. 111-. (canceled)1312. The coating method according to claim 12 , characterized in that the energetic material () comprises an explosive claim 12 , a pyrotechnic composition and/or a propellant.1412. The coating method according to claim 12 , characterized in that the energetic material () has an explosion heat of more than 2500 kJ/kg claim 12 , a burn rate of more than 30 m/s and/or a Trauzl number of more than 30 cm.1512. The coating method according to claim 12 , characterized in that the energetic material () comprises black powder claim 12 , nitroglycerin and/or nitrocellulose.1616. The coating method according to claim 12 , characterized in that the coating material () contains halogens; monomers containing at least one halogen; silicon; monomers containing silicon; silazanes claim 12 , in particular hexamethyldisilazane; siloxanes; silanes; fluorine; hydrocarbon; in particular saturated and/or unsaturated hydrocarbon; aliphatic hydrocarbon; aromatic hydrocarbon; derivatives of aliphatic hydrocarbon and/or aromatic hydrocarbon claim 12 , in particular containing heteroatoms; oxygen; conductive polymers; alkanes claim 12 , in particular fluoroalkanes; cycloalkanes; mixtures containing alkanes and halogens claim 12 , alkenes claim 12 , mixtures containing alkenes and halogens; hexamethyldisiloxane; fluoroacrylates; octafluorocyclobutane; ethine; parylene; paraffin; octene; hexafluoroethane; acrylic acid and/or combinations of the aforementioned substances.17. The coating method according to claim 12 , characterized in that the coating takes place at a pressure of a maximum of 10 millibars and/or a temperature of a ...

PLASMA DEPOSITION METHOD

A plasma deposition method in which a cover layer is deposited onto the internal walls of an empty plasma chamber by plasma deposition of a precursor mixture comprising (i) one or more hydrocarbon compounds of formula (A), or (ii) one or more C-Calkane, C-Calkene or C-Calkyne compounds: (Formula (A)) wherein: Zrepresents C-Calkyl or C-Calkenyl; Zrepresents hydrogen, C-Calkyl or C-Calkenyl; Zrepresents hydrogen, C-Calkyl or C-Calkenyl; Zrepresents hydrogen, C-Calkyl or C-Calkenyl; Zrepresents hydrogen, C-Calkyl or C-Calkenyl; and Zrepresents hydrogen, C-Calkyl or C-Calkenyl. 2. The method according to claim 1 , wherein the plasma deposition is plasma enhanced chemical vapour deposition (PECVD).3. The method according to or claim 1 , wherein the plasma deposition occurs at a pressure of 0.001 to 10 mbar.4. The method according to any one of the preceding claims claim 1 , wherein the or each hydrocarbon compound of formula (A) is selected from 1 claim 1 ,4-dimethylbenzene claim 1 , 1 claim 1 ,3-dimethylbenzene claim 1 , 1 claim 1 ,2-dimethylbenzene claim 1 , toluene claim 1 , 4-methyl styrene claim 1 , 3-methyl styrene claim 1 , 2-methyl styrene claim 1 , 1 claim 1 ,4-divinyl benzene claim 1 , 1 claim 1 ,3-divinyl benzene claim 1 , 1 claim 1 ,2-divinyl benzene claim 1 , 1 claim 1 ,4-ethylvinylbenzene claim 1 , 1 claim 1 ,3 -ethylvinylbenzene and 1 claim 1 ,2-ethylvinylbenzene.5. The method according to claim 4 , wherein the hydrocarbon compound of formula (A) is 1 claim 4 ,4-dimethylbenzene.6. The method according to claim 4 , wherein the one or more hydrocarbon compounds of formula (A) is a mixture of 1 claim 4 ,4-divinyl benzene claim 4 , 1 claim 4 ,3-divinyl benzene and 1 claim 4 ,2-divinyl benzene.7. The method according to any one of the preceding claims claim 4 , wherein the precursor mixture further comprises one or more reactive gases selected from NO claim 4 , NO claim 4 , NH claim 4 , N claim 4 , CH claim 4 , CH claim 4 , CH claim 4 , CHand CH8. The method ...

Surface properties of polymeric materials with nanoscale functional coating

An electronic device comprising a substrate having a component-side surface and a moisture protection film covering the component-side surface. The moisture protection film includes a first water layer bonded to component-side surface that is an activated surface, wherein the activated surface has a lower water contact angle than the substrate surface before the surface activation. The film includes a first graphed layer of a plasma-reacted first set of precursor molecules graphed to the first water layer, wherein the first water layer forms a first bonding link between the substrate surface and the reacted first set precursor molecules. The film includes a second water layer bonded to the first graphed layer. The film includes a second graphed layer of a plasma-reacted second set of precursor molecules graphed to the second water layer, wherein the second water layer forms a second bonding link between the second water layer and the reacted second set of precursor molecules.

Vessels, containers, and surfaces coated with water barrier coatings

A vessel has a lumen defined at least in part by a wall. The wall has an interior surface facing the lumen, an outer surface, and a plasma-enhanced chemical vapor deposition (PECVD) coating set supported by the wall. The PECVD coating set comprises a water barrier coating or layer having a water contact angle from 80 to 180 degrees, applied using a precursor comprising at least one of a saturated or unsaturated fluorocarbon precursor having from 1 to 6 carbon atoms and a saturated or unsaturated hydrocarbon having from 1 to 6 carbon atoms. Optionally, the coating set includes an SiOx gas barrier coating or layer from 2 to 1000 nm thick, in which x is from 1.5 to 2.9 as measured by x-ray photoelectron spectroscopy (XPS), and optionally other related coatings.

Active Corrosion Protection Coatings

The present invention is related to a method for protecting a metal substrate against corrosion comprising the step of: —generating a plasma in a gaseous medium by means of a plasma device; —placing the substrate in contact with the plasma, or in a post-plasma area of said plasma; —introducing in said plasma or in said post-plasma area a corrosion inhibitor along with an organic precursor, thereby depositing a barrier layer comprising the corrosion inhibitor, the deposited layer protecting the metal substrate against corrosion. 2. Method according to wherein the corrosion inhibitor is gradually removed from plasma thereby creating a concentration gradient of the corrosion inhibitor in the coating claim 1 , the inhibitor concentration at the surface of the barrier layer being lower than in the bulk of said barrier layer.3. Method according to further comprising the step of introducing in said plasma or in the post-plasma area the organic precursor of the organic barrier material without corrosion inhibitor claim 1 , thereby depositing a barrier layer without corrosion inhibitor claim 1 , said barrier layer without corrosion inhibitor being deposited prior to the layer comprising the inhibitor.4. Method according to wherein the organic precursor is selected from the group consisting of silanes claim 1 , silicon containing monomers claim 1 , styrene claim 1 , bisphenol A claim 1 , butadiene claim 1 , (meth)acrylate claim 1 , allyl methacrylate claim 1 , alkane claim 1 , alkene claim 1 , halogenated alkane and halogenated alkene.5. Method according wherein the corrosion inhibitor exhibit both cationic and anionic corrosion inhibition properties.6. Method according to wherein the corrosion inhibitor comprises an organometallic compound.7. Method according to wherein the corrosion inhibitor comprises phosphate groups.8. Method according to wherein the corrosion inhibitor comprises a rare earth metal salt such as Cerium.9. Method according to wherein the corrosion ...

PRODUCTION OF COMPOSITE MATERIAL BY MEANS OF PLASMA COATING

A process may be employed to produce a composite material having at least one metallic substrate and at least one polymer layer. The process may comprise applying an adhesion promoter layer across a surface of the metallic substrate and/or the polymer layer by means of plasma coating by a plasma coating system. The adhesion promoter layer may be created by driving the plasma coating system during the plasma coating such that a specific profile of the adhesion promoter layer across the surface of the metallic substrate and/or the polymer layer is established at least in some regions. The process may also involve bonding the polymer layer to the surface of the metallic substrate having the adhesion promoter layer and/or bonding the metallic substrate to the surface of the polymer layer having the adhesion promoter layer to produce the composite material. 114.-. (canceled)15. A process for producing a composite material that includes a metallic substrate and a polymer layer , the process comprising:applying an adhesion promoter layer across a surface of at least one of the metallic substrate or the polymer layer by way of plasma coating with a plasma coating system, wherein the adhesion promoter layer is created by driving the plasma coating system during the plasma coating such that a specific profile of the adhesion promoter layer is established at least in some regions across the surface; and bonding the polymer layer to the surface of the metallic substrate having the adhesion promoter layer, or', 'bonding the metallic substrate to the surface of the polymer layer having the adhesion promoter layer., 'performing at least one of'}16. The process of wherein the specific profile of the adhesion promoter layer is homogeneous in a controlled manner or varies in a controlled manner across the surface.17. The process of wherein the plasma coating system comprises plasma modules claim 15 , wherein the driving of the plasma coating system comprises at least partly separate ...

Silacyclic Compounds and Methods for Depositing Silicon-Containing Films Using Same

A method and composition for producing a porous low k dielectric film via chemical vapor deposition includes the steps of: providing a substrate within a reaction chamber; introducing into the reaction chamber gaseous reagents including at least one structure-forming precursor comprising an silacyclic compound, and with or without a porogen; applying energy to the gaseous reagents in the reaction chamber to induce reaction of the gaseous reagents to deposit a preliminary film on the substrate, wherein the preliminary film contains the porogen, and the preliminary film is deposited; and removing from the preliminary film at least a portion of the porogen contained therein and provide the film with pores and a dielectric constant of 3.0 or less. In certain embodiments, the structure-forming precursor further comprises a hardening additive. 1. A method for producing a dielectric film represented by the formula SiOCHF , wherein v+w+x+y+z=100% , v is from 10 to 35 at. % , w is from 10 to 65 at. % , x is from 5 to 40 at. % , y is from 10 to 50 at. % and z is from 0 to 15 at. % , said method comprising:providing a substrate within a reaction chamber;introducing into the reaction chamber gaseous reagents comprising at least one structure-forming precursor comprising an silacyclic compound, wherein the silacyclic compound contains less than about 100 ppm of impurities; andapplying energy to the gaseous reagents in the reaction chamber to induce reaction of the gaseous reagents and thereby deposit a film on the substrate.2. The method of wherein the gaseous reagents further comprise a structure forming reagent comprising a hardening additive selected from tetraethoxysilane and tetramethoxysilane.4. The method of wherein the silacyclic compound comprises at least one compound selected from the group consisting of 1-methyl-1-acetoxy-1-silacyclopentane claim 3 , 1-methyl-1-propionoxy-1-silacyclopentane claim 3 , 1-methyl-1-acetoxy-1-silacyclobutane claim 3 , 1-methyl-1- ...

METHOD AND APPARATUS FOR FORMING ORGANIC MONOLAYER

A method for forming an organic monolayer includes supplying to an object an organic material gas including organic molecules, each molecule having a binding site that is to be chemically bonded to a surface of the object. The method further includes supplying excited hydrogen to the organic material gas before the organic material gas reaches the object to substitute an end of the binding site with hydrogen, and forming an organic monolayer by reaction between the end substituted with the hydrogen and the object. 1. A method for forming an organic monolayer , comprising:supplying to an object an organic material gas including organic molecules, each molecule having a binding site that is to be chemically bonded to a surface of the object;supplying excited hydrogen to the organic material gas before the organic material gas reaches the object to substitute an end of the binding site with hydrogen; andforming an organic monolayer by reaction between the end substituted with the hydrogen and the object.2. The method of claim 1 , wherein the organic monolayer includes a self-assembled monolayer.3. The method of claim 2 , wherein the organic material gas includes a silane coupling agent.4. The method of claim 1 , wherein an alkyl group is at the end of the binding site of the organic material gas claim 1 , and the alkyl group is substituted with the hydrogen by the excited hydrogen.5. The method of claim 1 , wherein the excited hydrogen is at least one of hydrogen ion claim 1 , hydrogen radical and hydrogen Plasma.6. An apparatus for forming an organic monolayer on a surface of an object claim 1 , the apparatus comprising:a chamber configured to accommodate the object;an organic material gas supply unit configured to supply into the chamber an organic material gas including organic molecules, each molecule having a binding site that is to be chemically bonded to the surface of the object;an excited hydrogen generation mechanism configured to generate excited hydrogen in ...

Antifouling film-coated substrate and process for its production

To provide an antifouling film-coated substrate, which has a fluorinated organic silicon compound coating film and which is excellent in the antifouling properties as it has water repellency, oil repellency, etc. and also excellent in the abrasion resistance so that deterioration in the antifouling properties is prevented against repeated wiping operations. The antifouling film-coated substrate 3 comprises a transparent substrate 1 having a film-forming surface 1 a exposed to at least a moisture-containing atmosphere, and a fluorinated organic silicon compound coating film 2 formed on the film-forming surface 1 a of the transparent substrate 1 by a dry-mode method.

WOUND HEALING DEVICE

A plasma coating device for treating a wound comprises a plasma chamber having: one or more electrodes, a gas supply inlet, a plasma outlet exposed to ambient pressure, and an ignition system operatively connected to the electrodes for providing a non-thermal equilibrium plasma within the plasma chamber. An aerosol delivery system is operable to introduce a bioresorbable material as an aerosol into the plasma, to produce a coating on the wound surface. 18-. (canceled)9. A method for treating a patient , the method comprising:generating a non-thermal equilibrium plasma at a frequency between 100 kHz and 500 kHz in a plasma chamber;introducing an aerosol comprising a bioresorbable material into the non-thermal equilibrium plasma; andcontacting tissue of the patient with the plasma and the aerosol to form a coating on the tissue, the coating comprising the bioresorbable material.10. The method of claim 9 , wherein the aerosol is introduced into the non-thermal equilibrium plasma inside the plasma chamber.11. The method of claim 9 , wherein the aerosol is introduced into the non-thermal equilibrium plasma outside the plasma chamber.12. The method of claim 11 , wherein the aerosol is introduced into a region downstream of an outlet of the plasma chamber the region containing reactive species of the plasma.13. The method of claim 9 , wherein the plasma is pulsed.14. The method of claim 9 , wherein the tissue is part of a wound claim 9 , and contacting the tissue with the plasma sterilizes and coagulates the wound.15. The method of claim 9 , wherein the aerosol is generated from a liquid by a nebulizer claim 9 , the bioresorbable material being dissolved or dispersed in the liquid.16. The method of claim 9 , wherein the bioresorbable material comprises a protein claim 9 , a nucleic acid claim 9 , a lipid claim 9 , a drug claim 9 , a polysaccharide claim 9 , a biopolymer claim 9 , a biodegradable polymer claim 9 , a cell claim 9 , or a combination thereof.17. The method of ...

Metal Component Having Friction-Reducing Surface Coating

Various embodiments may include a metallic component comprising: a base metal form with at least one surface; and an organic protective layer applied to at least part of the at least one surface to reduce friction. The organic protective layer is applied by treatment with a carbon-containing precursor by means of an atmospheric pressure plasma. 1. A metallic component having comprising:a base metal form with at least one surface;an organic protective layer applied to at least part of the at least one surface to reduce friction; andwherein the organic protective layer is applied by treatment with a carbon-containing precursor by means of an atmospheric pressure plasma.2. The component as claimed in claim 1 , wherein the coated surface has a thermal conductivity in the range from 10 to 150 W/mK.3. The component as claimed in claim 1 , wherein the carbon-containing precursor comprises an unsaturated compound having at least one carbon-carbon multiple bond.4. The component as claimed in claim 1 , wherein the organic protective layer has a thickness of less than 1 μm.5. The component as claimed in claim 1 , wherein the organic protective layer has a thickness of less than 500 nm.6. The component as claimed in claim 1 , wherein the organic protective layer has an absorption in the wavelength range of visible light.7. The component as claimed in claim 1 , wherein the carbon-containing precursor is present in gaseous form at room temperature.8. The component as claimed in claim 1 , wherein the base metal form serves as a counterelectrode for a plasma generation module.9. A process for coating surfaces of metallic components claim 1 , the process comprising:coating at least one surface of a base metal body with an organic protective layer with an atmospheric pressure plasma generation module.10. The process as claimed in claim 9 , further comprising at least partially removing the organic protective layer with the atmospheric pressure plasma generation module.11. The process ...

Ultra-thin, Pinhole-free, Flexible Metal-Organic Films

Described herein are facile, one-step initiated plasma enhanced chemical vapor deposition (iPECVD) methods of synthesizing hyper-thin (e.g., sub-100 nm) and flexible metal organic covalent network (MOCN) layers. As an example, the MOCN may be made from zinc tetraphenylporphyrin (ZnTPP) building units. When deposited on a membrane support, the MOCN layers demonstrate gas separation exceeding the upper bounds for multiple gas pairs while reducing the flux as compared to the support alone. 2. The polymer of claim 1 , wherein the polymer comprises a repeat unit of Formula I claim 1 , Formula III claim 1 , or Formula V.3. The polymer of claim 1 , wherein the polymer comprises a repeat unit of Formula I claim 1 , Formula III claim 1 , or Formula V; and M is a zinc ion claim 1 , a manganese ion claim 1 , or a cobalt ion.4. The polymer of claim 1 , wherein the polymer comprises a repeat unit of Formula I claim 1 , Formula III claim 1 , or Formula V; and M is a zinc ion.5. (canceled)6. The polymer of claim 1 , wherein n is an integer from 2 to 1000.7. The polymer of claim 1 , wherein m is an integer from 2 to 1000.8. The polymer of claim 1 , wherein the polymer further comprises a second repeat unit derived from a vinyl monomer or a divinyl crosslinker.912-. (canceled)13. A composition claim 1 , wherein the composition comprises a substrate and a coating material claim 1 , wherein the coating material comprises a polymer of .14. The composition of claim 13 , wherein the coating material is flexible.15. (canceled)16. The composition of claim 13 , wherein the coating material is pinhole-free.17. (canceled)18. The composition of claim 13 , wherein the plane-to-plane distance of the porphyrin rings in the coating material is about 0.2 nm to about 1.0 nm.19. The composition of claim 13 , wherein the thickness of the coating material is less than about 100 nm.20. The composition of claim 13 , wherein the substrate is porous.21. The composition of claim 13 , wherein the substrate ...

SYSTEMS AND METHODS FOR DELIVERING THERAPEUTIC AGENTS

Plasma systems for depositing biomolecules, pharmaceutical agents, and other therapeutic active agents onto surfaces are described. The systems may include a plasma device having one or more electrodes, a gas supply inlet, a plasma outlet exposed to ambient pressure, and an ignition system operatively connected to the electrodes for providing a non-thermal equilibrium plasma within the plasma chamber. A particulate delivery system may be used to introduce the active agent(s) as a dry powder into or downstream of the plasma, and to deposit the plasma-treated active agent(s) to produce a coating on a surface. The coating may retain the activity of the active agent(s). 1. A method of producing a coated substrate , comprising:introducing a plurality of dry particles into a non-thermal plasma, each particle comprising at least one active agent chosen from biomolecules, pharmaceutical agents, or combinations thereof; andexposing a substrate to the plurality of dry particles and the plasma to deposit a coating comprising the at least one active agent onto the substrate.2. The method of claim 1 , wherein each particle consists of only the at least one active agent.3. The method of claim 1 , wherein the coating retains a biological or pharmaceutical activity of the at least one active agent.4. The method of claim 1 , wherein the substrate is chosen from tissue claim 1 , a diagnostic component claim 1 , a medical device claim 1 , or a food product.5. The method of claim 1 , wherein the substrate comprises a multi-well plate and the at least one active agent comprises a biomolecule.6. The method of claim 1 , wherein the coating comprises at least one first layer comprising a pharmaceutical agent and at least one second layer comprising a biomolecule claim 1 , and the at least one first layer is adjacent the at least one second layer.7. The method of claim 6 , wherein the biomolecule of the at least one second layer is cross-linked.8. The method of claim 1 , wherein the at ...

METHODS FOR TREATING A SUBSTRATE AND METHOD FOR MAKING ARTICLES COMPRISING BONDED SHEETS

Described herein are articles and methods of making articles, for example glass articles, including a sheet and a carrier, wherein the sheet and carrier are bonded together using a coating layer, which is, for example, a fluorocarbon polymer coating layer, and associated deposition methods and inert gas treatments that may be applied on the sheet, the carrier, or both, to control the fluorine content of the coating layer and van der Waals, hydrogen and covalent bonding between the sheet and the carrier. The coating layer bonds the sheet and carrier together with sufficient bond strength to prevent delamination of the sheet and the carrier during high temperature processing to while preventing a permanent bond at during high temperature processing while at the same time maintaining a sufficient bond to prevent delamination during high temperature processing. 1. A method for treating a substrate surface comprising the steps of:a. arranging a base substrate on a chuck in a reaction chamber, the reaction chamber comprising an inductively coupled plasma coil and a gas supply inlet, the chuck and inductively coupled plasma coil being independently connected to an electric power supply;{'sub': x', 'z', 'y, 'b. supplying a polymer forming fluorine gas source to the gas supply inlet and flowing the polymer forming fluorine gas source into the reaction chamber to contact the substrate arranged on the chuck, the polymer forming fluorine gas source comprising a fluorine component of the formula CHF, wherein x is selected from 1-4, y is selected from 3-8, and z is selected from 0-3, wherein when x is 1 then y is 3 and z is 1;'}c. supplying electric power to the inductively coupled plasma coil and the chuck;d. depositing a carbon-based material derived from the polymer forming fluorine gas source to form a coating layer on the substrate;e. exposing the deposited coating layer to a treatment gas to form a treated coated substrate; andf. removing the treated coated substrate from ...

Monoalkoxysilanes and dense organosilica films made therefrom

A method for making a dense organosilicon film with improved mechanical properties, the method comprising the steps of: providing a substrate within a reaction chamber; introducing into the reaction chamber a gaseous composition comprising a novel monoalkoxysilane; and applying energy to the gaseous composition comprising a novel monoalkoxysilane in the reaction chamber to induce reaction of the gaseous composition comprising a novel monoalkoxysilane to deposit an organosilicon film on the substrate, wherein the organosilicon film has a dielectric constant of from about 2.80 to about 3.30, an elastic modulus of from about 9 to about 32 GPa, and an at. % carbon of from about 10 to about 30 as measured by XPS.

Coating Apparatus and Coating Method

A coating apparatus includes a chamber body having a reaction chamber, a supporting rack, a monomer discharge source and a plasma generation source. The supporting rack has a supporting area for supporting the substrate. The monomer discharge source has a discharge inlet for introducing a coating forming material into the reaction chamber. The plasma generation source is arranged for exciting the coating forming material, wherein the supporting area of the supporting rack is located at a position between the monomer discharge source and the plasma generation source, so that the coating is evenly formed on the surface of the substrate, and the deposition velocity is increased. 1. A coating apparatus for coating a plurality of substrates by a coating forming material , comprising:a chamber body having a reaction chamber;a supporting rack having a supporting area for supporting the substrates within said reaction chamber of said chamber body;a monomer discharge source having a discharge inlet for introducing the coating forming material into said reaction chamber of said chamber body; anda plasma generation source disposed in said reaction chamber of said chamber body for exciting the coating forming material, wherein said supporting area of said supporting rack is located at a position between said monomer discharge source and said plasma generation source in such a manner that the substrates are adapted for being arranged between said monomer discharge source and said plasma generation source.2. The coating apparatus claim 1 , as recited in claim 1 , wherein said supporting rack comprises a movable rack and a plurality of carrier racks supported on said movable rack claim 1 , wherein said carrier racks are spaced from each other claim 1 , wherein each of said carrier racks has said supporting area for supporting the substrates.3. The coating apparatus claim 2 , as recited in claim 2 , wherein said movable rack is operable to rotate about a central axis thereof claim ...

ETCHING METHOD, SUBSTRATE PROCESSING APPARATUS, AND SUBSTRATE PROCESSING SYSTEM

A system, apparatus and method enable etching of a layer of a substrate with reduced etching on the surface of a side wall of the layer. The etching method includes forming a protective layer on a surface of the side wall defining a recess in the layer. The protective layer contains phosphorus. The etching method further includes etching the layer in one or more additional cycles so as to increase a depth of the recess after the forming the protective layer. 1. An etching method , comprising:forming a protective layer on a surface of a side wall defining a recess in a layer of a substrate, the protective layer containing phosphorus; andetching the layer to increase a depth of the recess after the forming of the protective layer.2. The etching method according to claim 1 , wherein the forming of the protective layer includesforming a precursor layer on the surface of the side wall with a first gas, andforming the protective layer from the precursor layer with a second gas, wherein the first gas or the second gas contains phosphorus.3. The etching method according to claim 2 , whereina plurality of layer deposition cycles each including the forming of the precursor layer and the forming of the protective layer from the precursor layer are performed sequentially.4. The etching method according to claim 3 , whereinthe plurality of layer deposition cycles include at least one layer deposition cycle in which the forming of the precursor layer is performed under a condition different from a condition under which at least another one of the plurality of layer deposition cycles is performed.5. The etching method according to claim 3 , whereinthe plurality of layer deposition cycles include at least one layer deposition cycle in which the forming of the protective layer from the precursor layer is performed under a condition different than in which at least another one of the plurality of layer deposition cycles is performed.6. The etching method according to claim 2 , ...

Method for Protecting an Electrical or Electronic Device

An electrical or electronic device comprising a polymeric coating, formed by exposing the device to pulsed plasma comprising a compound of formula (I), 2. The electrical or electronic device of claim 1 , which is a sound or audio device.3. The electrical or electronic device of claim 2 , wherein the sound or audio device is selected from a ringer claim 2 , a buzzer claim 2 , a hearing aid claim 2 , personal audio equipment claim 2 , a television claim 2 , a DVD player claim 2 , a video recorder claim 2 , a set-top box and a computer.4. The electrical or electronic device of claim 2 , wherein the sound or audio device is selected from a microphone or a loudspeaker comprising at least one of an outer casing or a foam cover and the polymeric coating is present thereon.5. The electrical or electronic device of claim 1 , wherein the electrical or electronic device is exposed to the pulsed plasma within a plasma deposition chamber.9. The electrical or electronic device of claim 8 , wherein the monomer of formula (IV) is 1H claim 8 , 1H claim 8 ,2H claim 8 ,2H-heptadecafluorodecylacrylate. This application is a division of U.S. application Ser. No. 12/116,181, filed Nov. 12, 2008, which is a national stage application under 35 U.S.C. §371 of PCT/GB2007/000149, filed Jan. 19, 2007, which claims priority of United Kingdom application 0601117.5, filed Jan. 20, 2006 and U.S. provisional application 60/762,242, filed Jan. 26, 2006, each of the foregoing of which is incorporated by reference in its entirety.Field of the InventionThe present invention relates to novel products in the form of electronic or electrical devices, which are treated to protect them from liquid damage, for example from environmental damage in particular from water or other liquids, as well as to processes for their production.Description of Related ArtIt is well known that electronic and electrical devices are very sensitive to damage caused by contamination by liquids such as environmental liquids, in ...

COATINGS

The present invention provides an electronic or electrical device or component thereof comprising a cross-linked polymeric coating on a surface of the electronic or electrical device or component thereof; wherein the cross-linked polymeric coating is obtainable by exposing the electronic or electrical device or component thereof to a plasma comprising a monomer compound and a crosslinking reagent for a period of time sufficient to allow formation of the cross-linked polymeric coating on a surface thereof, wherein the monomer compound has the following formula: where R, Rand Rare each independently selected from hydrogen, optionally substituted branched or straight chain C-Calkyl or halo alkyl or aryl optionally substituted by halo, and Ris selected from: or where each X is independently selected from hydrogen, a halogen, optionally substituted branched or straight chain C-Calkyl, halo alkyl or aryl optionally substituted by halo; and nis an integer from to 27; and wherein the crosslinking reagent comprises two or more unsaturated bonds attached by means of one or more linker moieties and has a boiling point at standard pressure of less than 500° C. 2. An electronic or electrical device or component thereof according to claim 1 , wherein the protective cross-linked polymeric coating is a physical barrier to mass and electron transport.3. An electronic or electrical device or component thereof according to or claim 1 , wherein the protective cross-linked polymeric coating forms a liquid repellent surface defined by a static water contact angle (WCA) of at least 90°.9. An electronic or electrical device or component thereof according to claim 8 , wherein each Yis H and each Yis H.10. An electronic or electrical device or component thereof according to claim 8 , wherein each Yis fluoro and each Yis fluoro.11. An electronic or electrical device or component thereof according to any of to claim 8 , wherein n is from 4 to 6.13. An electronic or electrical device or ...

METHODS AND COMPOSITIONS FOR SEPARATING OR ENRICHING BLOOD CELLS

The present invention provides a filtration chamber comprising a microfabricated filter enclosed in a housing, wherein the surface of said filter and/or the inner surface of said housing are modified by vapor deposition, sublimation, vapor-phase surface reaction, or particle sputtering to produce a uniform coating; and a method for separating cells of a fluid sample, comprising: a) dispensing a fluid sample into the filtration chamber disclosed herein; and b) providing fluid flow of the fluid sample through the filtration chamber, wherein components of the fluid sample flow through or are retained by the filter based on the size, shape, or deformability of the components. 1. A filtration chamber comprising a microfabricated filter enclosed in a housing , wherein the filtration chamber comprises an antechamber and a post-filtration subchamber , and the fluid flow path in the antechamber is substantially opposite to the fluid flow path in the post-filtration subchamber.2. The filtration chamber of claim 1 , wherein each of the antechamber and the post-filtration subchamber has an inflow port and/or an outflow port.3. The filtration chamber of claim 2 , wherein the antechamber comprises at least two inflow ports.4. The filtration chamber of claim 3 , wherein the antechamber comprises a suprafilter thereby creating a suprachamber.5. The filtration chamber of claim 4 , wherein the suprafilter claim 4 , between the antechamber and the suprachamber claim 4 , is sufficiently rigid to maintain its flatness under slow flow conditions.6. The filtration chamber according to or claim 4 , wherein the suprafilter comprises holes or slots with openings smaller than about 5 microns.76. The filtration chamber according to any one of - claims 2 , wherein the inflow port and outflow port may be used interchangeably.87. The filtration chamber according to any one of - claims 1 , wherein the microfabricated filter comprises one or more tapered slots.9. The filtration chamber of claim 8 , ...

Hydrophilic Coating Methods for Chemically Inert Substrates

The present invention discloses methods for producing a hydrophilic coating for chemically inert substrates such as fluoropolymers using a multi-step coating process consisting of (1) producing a plasma polymerization coating of alcohol compounds on the substrate, followed by (2) sequentially contacting the plasma polymer coated substrate with one or more solutions of hydrophilic polymers. Advantageously, such methods produce a strongly adhered hydrophilic coating for fluoropolymer and other chemically inert substrates.

METHOD FOR FORMING A PROTECTIVE FILM

A method for forming a protective film is provided. In the method, a source gas containing an organic metal gas or an organic semi-metal gas is supplied to a substrate having a plurality of recessed shapes formed in a surface so as to cause the source gas to adsorb on the surface of the substrate including the plurality of recessed shapes. Then, an oxidation gas is supplied to the surface of the substrate including the plurality of recessed shapes to oxidize the source gas adsorbed on the surface of the substrate, thereby depositing an oxidation film of the organic metal or the organic semi-metal on a flat area between the plurality of recessed shapes. Supplying the source gas to the substrate and supplying the oxidation gas to the substrate are repeated at a rate in a range of 90 to 300 cycles per minute. 1. A method for forming a protective film , comprising steps of:supplying a source gas containing an organic metal gas or an organic semi-metal gas to a substrate having a plurality of recessed shapes formed in a surface so as to cause the source gas to adsorb on the surface of the substrate including the plurality of recessed shapes;supplying an oxidation gas to the surface of the substrate including the plurality of recessed shapes to oxidize the source gas adsorbed on the surface of the substrate, thereby depositing an oxidation film of the organic metal or the organic semi-metal on a flat area between the plurality of recessed shapes,wherein the steps of supplying the source gas to the substrate and supplying the oxidation gas to the substrate are repeated at a rate in a range of 90 to 300 cycles per minute.2. The method according to claim 1 ,{'sub': 2', '2', '2', '2', '3, 'wherein the oxidation gas contains at least one of HO, HO, Oand O, and'}the source gas is oxidized by thermal oxidation.3. The method according to claim 1 , further comprising:supplying a noble gas and an additive gas that are activated by plasma to the oxidation film of the organic metal ...

PRODUCTION OF A WIDE GAMUT OF STRUCTURAL COLORS USING BINARY MIXTURES OF PARTICLES WITH A POTENTIAL APPLICATION IN INK JET PRINTING

In one or more embodiments, the present invention provides a method of applying or printing structural colors to a substrate that involves pre-treatment of the substrate surface to prevent absorption of the fluid containing the particles. This allows the fluid to maintain their sessile drop shapes and as the water evaporates, the colloidal particles spontaneously assemble within the confined geometry into semi-ordered structures that interact with light to produce structural color. While the pre-treatment may be done in a variety of ways, application of a, hydrophobic and/or oleophobic coating, like 1H-IH,2H-perfluoro-1-dodecene (CF—CH═CH) (perfluoro) monomer, fluoroalkyls, fluorohydroalkyls, cyclo-fluoroalkyls, fluorobenzen, by plasma-enhanced chemical vapor deposition (cold plasma treatment) has been found to be effective, particularly for printing applications. These treated substrates allow production of a wide range of structural colors using binary systems of nanoparticles. 1. A method for applying structural colors to a substrate comprising:A) treating some or all of a surface of a substrate with a hydrophobic and/or oleophobic coating;B) preparing a structural color forming suspension comprising a carrier solvent and a plurality of nanoparticles known to form a structural color upon evaporation of the carrier solvent;C) placing said structural color forming suspension on the treated surface of said substrate, wherein said hydrophobic and/or oleophobic coating on the surface of said substrate substantially prevents adsorption of a structural color forming suspension into said substrate and substantially prevents the structural color forming suspension from moving on said surface; andD) allowing the carrier solvent to evaporate, whereby the nanoparticles organize to produce a structural color on said substrate.2. The method of wherein the substrate is selected from the group consisting of paper claim 1 , cardboard claim 1 , plastic claim 1 , metal claim 1 , ...

IMPROVED WATER REPELLENT SUBSTRATE AND APPLICATION METHOD THEREFOR

A water repellent fibrous substrate comprising a cured hydrophobic coating layer located on the fibrous substrate; and a hydrophobic plasma polymer coating layer located on the hydrophobic coating layer. The hydrophobic plasma polymer layer may be used to protect the cured hydrophobic coating layer on said fibrous substrate from abrasion or general wear. 1. A water repellent fibrous substrate comprising:(i) a cured hydrophobic coating layer located on the fibrous substrate; and(ii) a hydrophobic plasma polymer coating layer located on the hydrophobic coating layer.2. The water repellent fibrous substrate according to claim 1 , wherein the fibrous substrate is in the form of a fibre claim 1 , yarn or fabric.3. The water repellent fibrous substrate according to claim 1 , wherein the fibrous substrate comprises cotton claim 1 , wool claim 1 , angora claim 1 , silk claim 1 , grass claim 1 , rush claim 1 , hemp claim 1 , sisal claim 1 , coir claim 1 , straw claim 1 , bamboo claim 1 , pina claim 1 , ramie claim 1 , and seaweed claim 1 , polyamide (nylon) claim 1 , polyester claim 1 , polyolefin claim 1 , polyacrylonitrile claim 1 , polyurethane claim 1 , aramid claim 1 , acetate and combinations of two or more thereof.4. The water repellent fibrous substrate according to claim 1 , wherein the cured hydrophobic coating layer contains hyperbranched-based polymer claim 1 , dendrimer claim 1 , silicone-based polymer claim 1 , fluorocarbon-based polymer claim 1 , or combinations thereof.5. The water repellent fibrous substrate according to claim 1 , wherein the hydrophobic plasma polymer coating layer comprises plasma polymerised residues of one or more of hexamethyldisiloxane (HMDSO) claim 1 , hexamethyldisilazane (HMDSN) claim 1 , tetrafluoromethane claim 1 , octafluorocyclobutane claim 1 , difluoroacetylene claim 1 , and hexafluorobenzene (HFB).6. A method of producing a water repellent fibrous substrate claim 1 , the method comprising:(i) providing a fibrous substrate ...

FLUOROCARBON RELEASE COATING

An organofluorine coating on a major surface of a substrate, wherein the organofluorine coating has a surface composition of about 5 at % to about 15 at % oxygen and about 30 at % to about 50 at % fluorine. 1. An organofluorine coating on a major surface of a substrate , wherein the organofluorine coating has a surface composition of about 5 at % to 15 at % oxygen and about 30 at % to 50 at % fluorine.2. The coating of claim 1 , wherein the coating has a thickness of less than about 500 nm.3. The coating of claim 1 , wherein the coating has a release peel force from the substrate of less than about 15 grams/inch.4. The coating of claim 1 , wherein the major surface of the substrate comprises protruding or recessed structures with a density of about 10 structures per mmto about 10 claim 1 ,000 structures per mm claim 1 , and wherein the coating overlies and conforms to the structures.5. The coating of claim 1 , wherein the major surface of the substrate has a Ra of less than about 2 nm.6. The coating of claim 1 , wherein the major surface of the substrate has a Ra of less than about 1 nm.78-. (canceled)9. An article comprising a polymeric film with a major surface claim 1 , wherein at least a portion of the major surface of the polymeric film comprises protruding or recessed structures with a density of about 10 structures per mmto about 10 claim 1 ,000 structures per mm claim 1 , and an organofluorine coating layer on the structures claim 1 , wherein the coating layer comprises fluoroether species and a surface composition of about 5 at % to 15 at % oxygen and about 30 at % to about 50 atomic % fluorine.10. The article of claim 9 , wherein the organofluorine coating layer has a thickness of less than about 500 nm.11. A fluoropolymer coating on a major surface of a substrate claim 9 , wherein the coating comprises copolymeric repeat units derived from at least one of fluorocarbons having a formula CFand oxyfluorocarbons having a formula CFO claim 9 , wherein x claim ...

METHODS FOR PREPARING NANO-PROTECTIVE COATING

Methods and associated systems for preparing a nano-protective coating are disclosed. The method includes (1) placing a substrate in a reaction chamber of a nano-coating preparation equipment; (2) introducing an inert gas, wherein the inert gas includes helium (He) and/or argon (Ar); (3) turning on a movement mechanism so that the substrate is moved in the reaction chamber; (4) introducing a monomer vapor into the reaction chamber to achieve a vacuum degree of 30-300 mTorr; and (5) turning on a plasma discharge for chemical vapor deposition to form an organosilicon nano-coating on a surface of the substrate. 1. A method for generating a nano-protective coating , comprising:placing a substrate in a reaction chamber of a nano-coating preparation equipment, wherein the reaction chamber is continuously vacuumized, and wherein a vacuum degree in the reaction chamber is 10 to 200 mTorr;introducing an inert gas, wherein the inert gas includes helium (He) and/or argon (Ar);turning on a movement mechanism so that the substrate is moved in the reaction chamber;introducing a monomer vapor into the reaction chamber to achieve a vacuum degree of 30-300 mTorr;turning on a plasma discharge for a chemical vapor deposition; andforming an organosilicon nano-coating on a surface of the substrate by the chemical vapor deposition;wherein the monomer vapor includes a mixture of at least one organosilicon monomer containing a double bond, Si—Cl, Si—O—C, Si—N—Si, Si—O—Si structure or an annular structure and at least one polyfunctional unsaturated hydrocarbon or hydrocarbon derivative;wherein a mass fraction of the polyfunctional unsaturated hydrocarbon or hydrocarbon derivative in the monomer vapor is 15-65%; andwherein a flow rate of the monomer vapor is 10-1000 μL/min.2. The method of claim 1 , further comprising:stopping introducing the monomer vapor;turning off the plasma discharge;continuing to maintain a vacuum degree of the reaction chamber to 10-200 mTorr for at least one minute; ...

METHODS FOR PREPARING NANO-PROTECTIVE COATING WITH A MODULATION STRUCTURE

Methods and associated systems for preparing a nano-protective coating are disclosed. The method includes (1) placing a substrate in a reaction chamber of a nano-coating preparation equipment; (2) introducing an inert gas, wherein the inert gas includes helium (He) and/or argon (Ar); (3) turning on a movement mechanism so that the substrate is moved in the reaction chamber; (4) introducing a first monomer vapor into the reaction chamber to achieve a vacuum degree of 30-300 mTorr; (5) turning on a plasma discharge for chemical vapor deposition; and (6) introducing a second monomer vapor into the reaction chamber to form an organosilicon nano-coating on a surface of the substrate. 1. A method for generating a nano-protective coating , comprising:placing a substrate in a reaction chamber of a nano-coating preparation equipment, wherein the reaction chamber is continuously vacuumized, and wherein a vacuum degree in the reaction chamber is 10 to 200 mTorr;introducing an inert gas, wherein the inert gas includes helium (He) and/or argon (Ar);turning on a movement mechanism so that the substrate is moved in the reaction chamber;introducing a first monomer into the reaction chamber to achieve a vacuum degree of 30-300 mTorr;turning on a plasma discharge for a chemical vapor deposition;stopping introducing the first monomer;introducing a second monomer into the reaction chamber; andforming an organosilicon nano-coating on a surface of the substrate by the chemical vapor deposition;wherein the first monomer includes a mixture of at least one monofunctional unsaturated fluorocarbon resin and at least one first polyfunctional unsaturated hydrocarbon or hydrocarbon derivative;wherein the second monomer includes a mixture of at least one organosilicon monomer containing a double bond, Si—Cl, Si—O—C, Si—N—Si, Si—O—Si structure or an annular structure and at least one second polyfunctional unsaturated hydrocarbon or hydrocarbon derivative;wherein a mass fraction of the first or ...

VAPOUR DEPOSITION OF ORGANIC UV ABSORBERS ONTO PLASTIC SUBSTRATES

Method for coating a plastics substrate with a functional layer, wherein (a) in a vacuum chamber, an organic UV absorber which comprises at least one chromophore and at least one reactive side chain is evaporated and (b) is brought into contact with at least one surface of the plastics substrate and excited with a plasma, or (c) is excited with a plasma and then brought into contact with at least one surface of the plastics substrate, whereby a functional layer comprising the UV absorber is formed on the surface of the plastics substrate, the plasma being ignited at a pressure of greater than 10bar and less than 1.013 bar. 1. Method for coating a plastics substrate with a functional layer , wherein(a) in a vacuum chamber, evaporating an organic UV absorber which comprises at least one chromophore and at least one reactive side chain and(b) bringing said organic UV absorber into contact with at least one surface of the plastics substrate and excited with a plasma, or(c) exciting said organic UV absorber with a plasma and then bringing said organic UV absorber into contact with at least one surface of the plastics substrate,{'sup': '−5', 'whereby a functional layer comprising the UV absorber is formed on the surface of the plastics substrate, the plasma being ignited at a pressure of greater than 10bar and less than 1.013 bar.'}2. Method according to claim 1 , wherein the plasma is ignited at a pressure in the range of from 2 x 10bar to 10bar claim 1 , optionally in the range of from 3×10bar to 10bar.3. Method according to claim 1 , wherein a chromophore of the organic UV absorber is selected from benzotriazole claim 1 , benzophenone claim 1 , resorcinol claim 1 , cyanoacrylate and derivatives thereof and cinnamic acid derivatives claim 1 , optionally from benzotriazole and resorcinol.4. Method according to claim 1 , wherein the reactive side chain of the organic UV absorber comprises an ethylenically unsaturated double bond and/or an alkoxyalkylsilyl group claim 1 , ...

ULTRA LOW REFLECTIVITY HYDROPHOBIC COATING AND METHOD THEREFOR

A low reflectivity coating () is provided on a substrate (). The coating includes a layer of substantially vertically aligned carbon nanotubes () on an exposed surface () of the substrate. Provided on and extending partially within the carbon nanotube layer () is a hydrophobic coating (), in the preferred embodiment of or containing fluorocarbon. The hydrophobic coating () prevents any settling or ingress of water particles onto or into the carbon nanotube layer () and as a result increases the stability of the carbon nanotube layer during use () whilst improving the low reflectivity of the film. 1. A method of forming a low reflectivity hydrophobic coating on a substrate , including the steps of:providing in a reaction chamber a substrate having a layer of carbon nanostructures on the substrate,supplying the reaction chamber with a coating precursor which includes a fluorocarbon, andgenerating a plasma in the reaction chamber, in order to deposit a hydrophobic coating on at least a part of said layer of carbon nanostructures,{'sup': '−2', 'wherein either the plasma generation takes place in the absence of a source of hydrogen atoms, in which case the substrate is heated to at least 100° C., the power density of the plasma is not more than 0.1 Wcmand the plasma is generated for a period from 3 to 12 minutes,'}{'sup': '−2', 'or the plasma generation takes place in the presence of a source of hydrogen atoms, in which case the power density of the plasma is not more than 0.2 Wcmand the plasma is generated for a period from 5 to 14 seconds.'}2. A method as claimed in claim 1 , wherein the carbon nanostructure layer has an internal side and an exposed side with the internal side facing the substrate and the carbon nanostructures having tips at the exposed side.3. A method as claimed in claim 1 , including the step of drying said layer before the hydrophobic coating is deposited thereon.4. A method as claimed in claim 1 , wherein the plasma generation takes place in the ...

ATMOSPHERIC PLASMA TREATMENT OF REINFORCEMENT CORDS AND USE IN RUBBER ARTICLES

The present invention is directed to a method of making a cord-reinforced rubber article, comprising the steps of 1. A method of making a cord-reinforced rubber article , comprising the steps ofA) mixing a carrier gas, sulfur and an alkyne, to form a gas mixture;B) generating an atmospheric pressure plasma from the gas mixture;C) exposing a reinforcement cord to the atmospheric pressure plasma to produce a treated reinforcement cord; andD) contacting the treated reinforcement cord with a rubber composition comprising a diene based elastomer.2. The method of claim 1 , wherein the cord is selected from the group consisting of polyamide claim 1 , polyester claim 1 , polyketone claim 1 , rayon claim 1 , and polyaramid cords.3. The method of claim 1 , wherein the cord is selected from the group consisting of steel claim 1 , galvanized steel claim 1 , zinc plated steel and brass plated steel cords.4. The method of claim 1 , wherein the alkyne is acetylene.5. The method of claim 1 , wherein the rubber composition is exclusive of cobalt.6. The method of claim 1 , wherein the sulfur and alkyne are present in a volume ratio as sulfur/alkyne in a range of 0.001 to 0.05.7. The method of claim 1 , wherein the sulfur and alkyne are present in a volume ratio as sulfur/alkyne in a range of 0.002 to 0.01.8. The method of claim 1 , wherein the sulfur and alkyne are present in a volume ratio as (sulfur+alkyne)/carrier gas in a range of from 0.01 to 0.1.9. The method of claim 1 , wherein the sulfur and alkyne are present as (sulfur+alkyne)/carrier gas in a range of from 0.02 to 0.05 percent.10. The method of claim 1 , wherein the reinforcement cord is conveyed continuously during exposure to the atmospheric pressure plasma.11. The method of claim 1 , wherein the carrier gas is selected from the group consisting of argon claim 1 , helium claim 1 , neon claim 1 , xenon claim 1 , nitrogen claim 1 , carbon dioxide claim 1 , nitrous oxide claim 1 , carbon monoxide claim 1 , and air.12. A ...

Surface modification of polymer foams using plasma

An embodiment includes a system comprising: a monolithic shape memory polymer (SMP) foam having first and second states; wherein the SMP foam includes: (a) polyurethane, (b) an inner half portion having inner reticulated cells defined by inner struts, (c) an outer half portion, having outer reticulated cells defined by outer struts, surrounding the inner portion in a plane that provides a cross-section of the SMP foam, (d) hydroxyl groups chemically bound to outer surfaces of both the inner and outer struts. Other embodiments are discussed herein.

Culinary Article Comprising a Fluorocarbon-Resin Based Non-Stick Coating Having Improved Properties of Adhesion to the Support, and Method for the Production Thereof

The present invention relates to a cooking article a substrate having a contact surface at least partially made of metal and coated with a non-stick coating comprising at least one layer including at least one fluorocarbon resin alone or mixed with a thermostable coupling binder that is heat-resistant up to at least 200° C., the fluorocarbon resin and, if necessary, the thermostable coupling binder forming a sintered network. According to the invention, the contact surface comprises an interface layer consisting of a polymer layer formed by plasma polymerization from a precursor selected from among unsaturated carboxylic acids, the salts or esters thereof, saturated carboxylic acid vinyl esters, unsaturated dicarboxylic acids, the salts, esters, hemiesters or anhydride esters thereof, and unsaturated epoxides. The present invention also relates to a method for manufacturing such an article.

Method of manufacturing patterned substrate for culturing cells, patterned substrate for culturing cells, patterning method of culturing cells, and patterned cell chip

The present invention relates to a method of manufacturing a patterned substrate for culturing cells, comprising the steps of: (1) preparing a substrate; (2) forming a first plasma polymer layer by integrating a first precursor material using a plasma on the substrate; (3) placing a shadow mask having a predetermined pattern on the first plasma polymer layer; and (4) forming a second patterned plasma polymer layer by integrating a second precursor material using a plasma. 1. A method of manufacturing a patterned substrate for culturing cells , comprising the steps of:(1) preparing a substrate;(2) forming a first plasma polymer layer by integrating a first precursor material using a plasma on the substrate;(3) placing a shadow mask having a predetermined pattern on the first plasma polymer layer; and(4) forming a second patterned plasma polymer layer by integrating a second precursor material using a plasma.2. The method according to claim 1 , further comprising the step of forming the first patterned plasma polymer layer by integrating the first precursor material using a plasma between steps (3) and (4).3. The method according to claim 1 , wherein the substrate is selected from the group consisting of glass claim 1 , plastic claim 1 , metal and silicone.4. The method according to claim 1 , wherein the first precursor material is selected from the group consisting of styrene and n-hexane.5. The method according to claim 1 , wherein the first precursor material is a siloxane-based compound having a siloxane functional group with the Si—O—Si linkage.6. The method according to claim 5 , wherein the siloxane-based compound includes linear siloxanes and cyclic siloxanes.7. The method according to claim 6 , wherein the linear siloxane compound includes hexamethyldisiloxane claim 6 , octamethyltrisiloxane claim 6 , decamethyltetrasiloxane claim 6 , dodecamethylpentasiloxane claim 6 , and tetradecamethylhexasiloxane.8. The method according to claim 6 , wherein the cyclic ...

Method for Treating an Elongated Object, Apparatus and Method

The invention relates to a method for treating an elongated object using a plasma process. The method comprises the steps of providing an elongated object in a planar electrode structure, and applying potential differences between electrodes of an electrode structure to generate the plasma process. Further, the method comprises at least partially surrounding the elongated object by a unitary section of the guiding structure, the electrode structure being associated with the unitary section. 1. A method for treating an elongated object using a plasma process , comprising the steps of:providing an elongated object in a guiding structure, andapplying potential differences between electrodes of an electrode structure to generate the plasma process,at least partially surrounding, in a cross-sectional view, the elongated object by a unitary section of the guiding structure, the electrode structure being associated with the unitary section,wherein the electrode structure comprises a dielectric body provided with a curved section integrated with the curved unitary section, and at least one electrode arranged at the radial inner side of the dielectric body section or embedded in the dielectric body.2. The method according to claim 1 , wherein the plasma process comprises a plasma activation process.3. The method according to claim 1 , comprising depositing a polymer layer on the elongated object.4. The method according to claim 1 , wherein the plasma process is at least one of a plasma induced polymerization process claim 1 , a plasma polymerization process claim 1 , or a plasma assisted grafting process.5. The method according to claim 3 , wherein the polymer layer contains nanomaterial.6. The method according to claim 1 , further comprising the steps of:providing a polymerization material near and/or on a surface of the elongated object;conducting a flow near and/or on the surface of the elongated object, the flow comprising a nanomaterial; anddepositing a polymer layer ...

METHODS AND APPARATUSES FOR INJECTION MOLDING WALLED STRUCTURES

A process is provided for making a walled structure using an injection molding apparatus. The apparatus has a molding space formed between a mold cavity and an inner core disposed within the mold cavity. The molding space defines a shape of the structure. The process includes injecting molding material into the molding space, moving or retaining a portion of a movable impression member protruding from the inner core within a portion of the molding space so as to create a recess within an inner wall of the structure, and retracting the impression member into the inner core such that the impression member is cleared from the molding space. 15.-. (canceled)6. A process for making a medical barrel using an injection molding apparatus , the apparatus having a molding space formed between a mold cavity and an inner core disposed within the mold cavity , the molding space defining a shape of the medical barrel , the process comprising the steps of:a. injecting thermoplastic molding material into the molding space;b. moving or retaining, prior to, during or after injecting thermoplastic molding material into the molding space, at least a portion of a movable impression member protruding from the inner core within a portion of the molding space so as to create a bypass groove within an inner wall of the medical barrel; andc. retracting the impression member into the inner core in a direction perpendicular to the central axis of the inner core, such that the impression member is cleared from the molding space and housed entirely within the inner core, the process further comprising providing an actuator disposed within the inner core, wherein the actuator is operatively connected to the impression member and wherein movement of the actuator along the central axis of the inner core operates to retract the impression member.7. The process of further comprising a step of withdrawing the medical barrel from the molding space claim 6 , after the medical barrel is solidified claim ...

FLUID TRANSFER SYSTEM IN A CHARGED PARTICLE SYSTEM

Apparatuses, systems, and methods for transferring fluid to a stage in a charged particle beam system are disclosed. In some embodiments, a stage may be configured to secure a wafer; a chamber may be configured to house the stage; and a tube may be provided within the chamber to transfer fluid between the stage and outside of the chamber. The tube may include a first tubular layer of first material, wherein the first material is a flexible polymer; and a second tubular layer of second material, wherein the second material is configured to reduce permeation of fluid or gas through the tube. In some embodiments, a system may include a degasser system outside of the chamber, where the degasser system may be configured to remove gases from the transfer fluid before the transfer fluid enters the tube. 1. A system , comprising:a stage configured to secure a wafer;a chamber configured to house the stage and wherein the chamber is configured to operate in a vacuum environment; and a first tubular layer of first material, wherein the first material is a flexible polymer; and', 'a second tubular layer of second material, wherein the second material is configured to reduce permeation of fluid or gas through the tube., 'a tube provided within the chamber and configured to transfer fluid between the stage and outside of the chamber, wherein the tube comprises2. The system of claim 1 , wherein the flexible polymer comprises polytetrafluoroethylene (PTFE).3. The system of claim 1 , wherein the flexible polymer comprises polyethylene terephthalate (PET).4. The system of claim 1 , wherein the second tubular layer coats the first tubular laver.5. The system of claim 1 , wherein the second material is diamond-like-carbon.6. The system of claim 1 , wherein the second material is a metal-oxide.7. The system of claim 6 , wherein the metal-oxide is an aluminum oxide.8. The system of claim 1 , wherein the second material is a metal.9. The system of claim 8 , therein the metal is aluminum. ...

METHOD OF FORMING DIELECTRIC MATERIAL LAYERS USING PULSED PLASMA POWER, STRUCTURES AND DEVICES INCLUDING THE LAYERS, AND SYSTEMS FOR FORMING THE LAYERS

Methods and systems for forming a structure including a dielectric material layer on a surface of a substrate and structures and devices formed using the method or system are disclosed. Exemplary methods include providing a substrate within a reaction chamber of a reactor system, providing one or more precursors to the reaction chamber, and providing pulsed plasma power to polymerize the one or more precursors within the reaction chamber. 1. A method of forming dielectric material on a surface of a substrate , the method comprising the steps of:providing a substrate within a reaction chamber of a reactor system;providing one or more precursors to the reaction chamber; andproviding pulsed plasma power to polymerize the one or more precursors within the reaction chamber.2. The method of claim 1 , further comprising a step of providing a reactant to the reaction chamber.3. The method of claim 2 , wherein the reactant comprises one or more of nitrogen and hydrogen.4. The method of claim 3 , wherein the reactant comprises one or more of NH claim 3 , nitrogen claim 3 , hydrogen claim 3 , and amino family reactants claim 3 , such as hydrazine claim 3 , monomethylamine claim 3 , dimethylamine claim 3 , trimethylamine claim 3 , monoethylamine claim 3 , and diethylamine claim 3 , in any combination.5. The method of claim 3 , wherein a volumetric ratio of the nitrogen and hydrogen reactant to the one or more precursors is less than 10 or about 3 to about 5.6. The method of claim 2 , wherein the reactant comprises an oxidant.7. The method of claim 6 , wherein a volumetric ratio of the oxidant to the one or more precursors is less than 10 or about 7 to about 10.8. The method of claim 6 , wherein the oxidant is selected from the group consisting of one or more of O claim 6 , O claim 6 , NO claim 6 , NO claim 6 , NO claim 6 , CO claim 6 , CO claim 6 , HO claim 6 , and HO claim 6 , and an oxygen-containing (e.g. claim 6 , liquid) compound represented by the chemical formula: CHO ...

WET AREA MEMBER

Provided is a wet area member for use in an indoor wet environment, comprising: a base member; and an amorphous carbon layer formed on a surface of the base member and mainly containing carbon atoms, wherein the amorphous carbon layer further contains hydrogen atoms, and the amorphous carbon layer contains the hydrogen atoms in a predetermined amount or more and has a density lower than a predetermined value so as to be capable of inhibiting sticking of water scale for a long period. This makes it possible to obtain a wet area member which exhibits a high stain release property and a high stain release durability. 1. A wet area member for use in an indoor wet environment , comprising:a base member; andan amorphous carbon layer formed on a surface of the base member and mainly containing carbon atoms, whereinthe amorphous carbon layer further contains hydrogen atoms, andthe amorphous carbon layer contains the hydrogen atoms in a predetermined amount or more and has a density lower than a predetermined value so as to be capable of inhibiting sticking of water scale for a long period.2. The wet area member according to claim 1 , whereinthe amount of the hydrogen atoms contained in the amorphous carbon layer is more than 3 atm %, and{'sup': '3', 'the density of the amorphous carbon layer is lower than 2.0 g/cm.'}3. The wet area member according to claim 2 , whereinthe amount of the hydrogen atoms contained in the amorphous carbon layer is less than 42 atm %, and{'sup': '3', 'the density of the amorphous carbon layer is higher than 1.1 g/cm.'}4. The wet area member according to claim 2 , whereinthe amount of the hydrogen atoms contained in the amorphous carbon layer is 21 atm % or more and 35 atm % or less.5. The wet area member according to claim 2 , wherein{'sup': '3', 'the density of the amorphous carbon layer is 1.4 g/cmor higher.'}6. A method for manufacturing the wet area member according to claim 1 , the method comprising the steps of:placing a wet area base ...

A PROCESS FOR PREPARATION OF A COMPOSITE LAYER OR A LAMINATE, AND PRODUCT OBTAINED THEREWITH

The invention relates to a process for preparing a composite layer, by applying an oligomeric organic compound layer on a substrate with a metal or metal oxide layer by vapour deposition, comprising the steps of (a) providing a substrate layer, (b) applying a metal or metal oxide layer under reduced pressure on said substrate, and (c) vapour depositing the oligomeric organic compound on the metal or metal oxide layer while the film remains at reduced pressure, wherein the oligomeric compound is evaporated from an oligomeric or polymeric compound comprising a stabiliser, or wherein the oligomeric compound is amorphous, or has a high solubility in certain solvents. 1. Process for preparing a composite layer , by applying an oligomeric organic compound layer on a substrate with a metal or metal oxide layer by vapour deposition , comprising the steps ofa) providing a substrate layer,b) applying a metal or metal oxide layer under reduced pressure on said substrate, andc) vapour depositing the oligomeric organic compound on the metal or metal oxide layer while the film remains at reduced pressure, wherein the oligomeric compound is evaporated from an oligomeric or polymeric compound comprising a stabiliser.2. Process for preparing a composite layer , by applying an organic compound layer on a substrate with a metal or metal oxide layer by vapour deposition , comprising the steps ofa) providing a substrate layer,b) applying a metal or metal oxide layer under reduced pressure on said substrate, andc) vapour depositing the organic compound on the metal or metal oxide layer while the film remains at reduced pressure, wherein the oligomeric compound is evaporated from an oligomeric or polymeric compound which after deposition on metal or metal oxide layer form an amorphous phase, wherein amorphous is defined by X-ray diffraction (XRD), which should not show a diffraction pattern representing ordening of molecules or polymer chains below 5 nm.3. Process for preparing a ...

PERMEATION-BARRIER

The method of providing a permeation-barrier layer system on a substrate includes establishing a permeation seal by depositing, by PVD and/or by ALD, an inorganic material layer system, thereby providing adhesion of the inorganic material layer system and crack-sealing by depositing a polymer material layer system on the substrate and the inorganic material layer system on the polymer material system. 1) A method of providing a permeation-barrier layer system on a starting substrate , or of manufacturing a substrate provided with a surface permeation-barrier layer system , comprising:a) establishing permeation-seal by depositing by PVD and/or by ALD at least one inorganic material layer system, comprising at least one inorganic-material-containing layer, upon a starting substrate;b) providing adhesion of said inorganic material layer system to said starting substrate and crack-sealing of said inorganic material layer system, by depositing a polymer material layer system comprising at least one polymer-material-containing layer, directly on said starting substrate and depositing said inorganic material layer system directly on said polymer material layer system.2) The method of comprising vacuum plasma polymerizing material of said polymer-material-containing layer or of at least one of polymer-material containing layers.3) The method of wherein establishing said permeation-seal comprising plasma enhanced ALD.4) The method of at least one layer being deposited from an electrically isolating layer.5) The method of said permeation-barrier layer system being deposited to be transparent for visible light.6) The method of claim 1 , wherein the temperature at the starting substrate during said depositions does not exceed a predetermined value claim 1 , which preferably does not exceed at most 150° C.7) The method of claim 1 , comprising depositing a further polymer material layer system claim 1 , comprising at least one polymer-material-containing layer claim 1 , directly ...

Method of coating alloy wheels using inter-coat plasma

An alloy wheel is formed having a three dimensional configuration defining a face and recessed surfaces. The face of the wheel is machined providing a smooth surface at the face and defining an edge between the smooth surface of the face and the recessed surfaces. A nozzle element for projecting a plasma jet toward the wheel is provided. The plasma jet is projected toward the smooth surface of the face, the edge, and toward at least a portion of the recessed surfaces forming an alloy oxide at least on the face and the edge disposed between the face and the recessed surfaces. A first polymeric coating is applied over the face, the recessed surfaces and the edge disposed between the face and the recessed surfaces.

Apparatus and Method for Applying Surface Coatings

The present invention provides a method for applying a surface coating on, for example, a sheet of fabric and further provides a plasma chamber () for coating a sheet of fabric, e.g. a textile material, with a polymer layer, the plasma chamber () comprising a plurality of electrode layers (RF, M) arranged successively within the plasma chamber, wherein at least two adjacent electrode layers are radiofrequency electrode layers (RF) or ground electrode layers (M), thereby providing a surface coating on both sides of a fabric sheet. 1. A plasma chamber for coating a sheet of fabric , such as a textile material , with a polymer layer , the plasma chamber having a plurality of electrode layers each having a generally planar or plate like form arranged successively within the plasma chamber , wherein at least two adjacent electrode layers are radiofrequency electrode layers or ground electrode layers.2. A plasma chamber according to having at least two pairs of electrode layers claim 1 , and wherein the outer pair of electrode layers are either ground electrode layers or radiofrequency electrode layers.3. A plasma chamber according to any preceding claim claim 1 , having a first electrode set and a second electrode set claim 1 , the first and second electrode sets being arranged either side of a passage for receiving a fabric.4. A plasma chamber according to claim 3 , wherein one or both of the first and second electrode sets has an inner electrode layer and a pair of outer electrode layers.5. A plasma chamber according to claim 4 , wherein either the inner electrode layer is a radiofrequency electrode and the outer electrode layers are ground electrodes claim 4 , or the inner electrode layer is a ground electrode and the outer electrode layers are radiofrequency electrodes.6. A plasma chamber according to any preceding claim claim 4 , wherein the radiofrequency electrode layer or layers includes heat regulating means.7. A plasma chamber according to any preceding claim ...

Hydrophilizing plasma coating

The invention relates to a method for hydrophilizing surfaces of polymer workpieces. The method has a step (a) of pretreating the workpiece surfaces in a high-frequency gas plasma which is produced on the basis of an inert gas in order to clean and activate the workpiece surfaces; a step (b) of precoating the pretreated workpiece surfaces with polyacrylic acid using a high-frequency gas plasma made of a gas mixture, said gas mixture being composed of an inert gas and a first gas made of biocompatible, polymerizable carboxy group-containing monomers; and a step (c) of subsequently coating the precoated workpiece surfaces using a second gas substantially containing acrylic acid monomers.

COATING OF AN OBJECT

The object of the invention is to provide an improved coating. The coating comprises a high transmittance antireflection layer of a grass-like alumina made by atomic layer deposition technique and subsequent water immersion. The coating also comprises at least one coating layer on the layer of a grass-like alumina, an uppermost coating layer being a low-surface energy coating. The coating is also hydrophobic and transparent. 1. A coating of an object , which coating comprises a transparent layer of a grass-like alumina made by atomic layer deposition technique and subsequent immersion to hot water , characterised in that the coating also comprises at least one coating layer on the layer of a grass-like alumina , an uppermost coating layer being a low-surface energy coating , the coating being transparent and also being hydrophobic or superhydrophobic.2. A coating of an object according to claim 1 , characterised in that the coating is a high broadband and omnidirectional optical transmittance antireflection coating.3. A coating of an object according to claim 1 , characterised in that the uppermost coating layer is plasma enhanced chemical vapour deposition coated fluoropolymer or parylene.4. A coating of an object according to claim 3 , characterised in that the said parylene is parylene-C.5. A coating of an object according to claim 1 , characterised in that the coating is conformal.6. A coating of an object according to claim 1 , characterised in that the water contact angle of the coating is 90 degrees or more.7. A coating of an object according to claim 1 , characterised in that the water contact angle of the coating is 172-176 degrees.8. A coating of an object according to claim 1 , characterised in that the between the uppermost layer of the low-surface energy coating and the grass-like alumina there is a titania layer deposited by atomic layer deposition.9. A coating of an object according to claim 1 , characterised in that the between the uppermost layer of ...

APPARATUS AND METHODS FOR DEFINING A PLASMA

Apparatus comprising: a support arranged to transport a moving substrate; a plasma generator arranged to generate plasma; and an electrode arranged to bias ions within the plasma towards the moving substrate to form an ion flux. The ion flux has an energy level between 3.6 eV and 250 eV. Alternatively, apparatus for defining plasma having a plurality of spaced race track portions. 128-. (canceled)29. An apparatus for curing a radiation curable material on a substrate , the apparatus comprising:a cylindrical drum arranged to rotate to transport a moving substrate;a plasma generator arranged to generate plasma;a radiation curable material delivery device arranged to deliver radiation curable material towards the cylindrical drum such that the radiation curable material will, in use, condense on the substrate; andone or more electrodes arranged to bias positive ions within the plasma towards the cylindrical drum to form a positive ion flux for curing radiation curable material condensed on the substrate, the ion flux having an energy level between 3.6 eV and 250 eV, the cylindrical drum defining one of the one or more electrodes.30. An apparatus according to claim 29 , further comprising a magnet array arranged to spatially define the plasma.31. An apparatus according to arranged to provide a unit energy dose which is no greater than 15 J/cm.32. An apparatus according to claim 29 , wherein the cylindrical drum is arranged to move the substrate at a speed through the ion flux such that the dwell time is no greater than 5 minutes.33. An apparatus according to claim 29 , further comprising a gas delivery system arranged to deliver a primary gas from which the plasma is generated and one or more further gases that are distinct from the primary gas.34. An apparatus for defining a plasma comprising:a drum arranged to transport a moving substrate;a plasma generator arranged to generate a plasma; and a first race track portion that is adjacent to a first surface region of the ...