POLYMERISABLE PHOTOINITIATORS FOR LED CURABLE COMPOSITIONS

A polymerisable photoinitiator according to Formula (I): 115-. (canceled)17. The polymerizable photoinitiator according to claim 16 , wherein Rand Rboth represent hydrogen.18. The polymerizable photoinitiator according to claim 16 , wherein A represents an acrylate group and/or a methacrylate group.19. The polymerizable photoinitiator according to claim 17 , wherein A represents an acrylate group.20. The polymerizable photoinitiator according to claim 16 , wherein m represents an integer from 2 to 4.21. The polymerizable photoinitiator according to claim 20 , wherein m represents the integer 2.25. The radiation curable composition according to claim 24 , wherein the radiation curable composition is an inkjet ink having a viscosity of smaller than 10 mPa·s at 45° C. and at a shear rate of 90 s.27. The method according to claim 26 , wherein the catalyst is selected from the group consisting of trifluoroacetic acid claim 26 , trichloroacetic acid claim 26 , pyridinium tosylate claim 26 , crosslinked poly(vinylpyridine) hydrochloride claim 26 , poly(vinylpyridinium) tosylate claim 26 , and sulfonic acid substituted ion exchangers.28. The method according to claim 26 , wherein the polymerizable photoinitiator is not isolated after its synthesis. This application is a 371 National Stage Application of PCT/EP2011/067274, filed Oct. 4, 2011. This application claims the benefit of U.S. Provisional Application No. 61/406,593, filed Oct. 26, 2010, which is incorporated by reference herein in its entirety. In addition, this application claims the benefit of European Application No. 10188140.7, filed Oct. 20, 2010, which is also incorporated by reference herein in its entirety.1. Field of the InventionThe present invention relates to a new class of photoinitiators, especially suitable for low viscous radiation curable compositions that are curable by UV-LEDs and for packaging printing applications.2. Description of the Related ArtShort run packaging printing is shifting from ...

NOVEL PHOTOINITIATORS

Novel photoinitiators provide for polyurethane formation, in which a photoinitiator moiety and a tertiary amine are incorporated into the photoinitiator structure, and thus the polyurethane polymer.

PREPARATION METHOD OF COPOLYMERIZABLE PHOTOINITIATORS

An intermediate for preparing (meth)acrylated photoinitiators according to Formula (I): 2. The method according to claim 1 , wherein the linking group L contains not more than 20 carbon atoms.3. The method according to claim 1 , wherein n and o are equal to 1.4. The method according to claim 1 , wherein the linking group L links the photoinitiating moiety A to the oxygen atom via a functional group selected from the group consisting of an ester claim 1 , an amide claim 1 , an ether claim 1 , a thioether claim 1 , and an amine.5. The method according to claim 1 , wherein the linking group L is selected from the group consisting of a substituted or unsubstituted alkylene group claim 1 , a substituted or unsubstituted arylene group claim 1 , and a substituted or unsubstituted heteroarylene group.6. The method according to claim 5 , wherein the linking group L is an alkylene group.7. The method according to claim 1 , wherein A represents a group including at least one photoinitiating moiety having an acid sensitive functional group.8. The method according to claim 1 , wherein the inorganic base is selected from the group consisting of a carbonate salt claim 1 , a bicarbonate salt claim 1 , a borate salt claim 1 , a phosphate salt claim 1 , and a hydrogen phosphate salt.9. The method according to claim 1 , wherein the inorganic base or the salt of a carboxylic acid is a potassium salt.10. The method according to claim 9 , wherein the inorganic base is potassium carbonate.11. The method according to claim 1 , wherein the aprotic solvent is selected from the group consisting of aliphatic ketones claim 1 , aliphatic nitriles claim 1 , cyclic ethers claim 1 , aliphatic esters claim 1 , aliphatic ethers claim 1 , glycol ethers claim 1 , glycol esters claim 1 , dimethyl acetamide claim 1 , dimethyl formamide claim 1 , N-methylpyrrolidone claim 1 , dimethyl sulfoxide claim 1 , sulfolane claim 1 , lactones claim 1 , halogenated hydrocarbons claim 1 , aromatic hydrocarbons claim ...

COMPOSITIONS, APPARATUS, SYSTEMS, AND METHODS FOR RESOLVING ELECTRONIC EXCITED STATES

The present disclosure relates, according to some embodiments, to molecules, including conjugated fused polycyclic molecules, that may receive excited state energy from other molecules (e.g., light-absorbing molecules) or directly from the irradiation sources. According to some embodiments, the disclosure relates to molecules, including conjugated fused polycyclic molecules, that may resolve (e.g., quench, dissipate) excited state energy, normally by way of releasing it as heat. (e.g., as heat). Conjugated fused polycyclic molecules of various structures are disclosed including Formula III: 2. A composition according to claim 1 , wherein Rand Rare different from each other.3. A composition according to claim 1 , wherein Dand Dare hydrogen.4. A composition according to claim 1 , wherein at least one of R3 claim 1 , R4 claim 1 , R5 claim 1 , R6 claim 1 , R7 claim 1 , R8 claim 1 , R9 claim 1 , and R10 is each independently an alkyl group having from about 1 to about 30 carbon atoms.5. A composition according to claim 1 , wherein one of Rand Ris nitrile.6. A composition according to claim 1 , wherein neither Rnor Ris nitrile.7. A composition according to claim 1 , wherein the conjugated fused polycyclic molecule comprises no more than 6 rings with no more than 4 of these rings fused to each other.8. A composition according to claim 1 , wherein the photoactive molecule is selected from a pigment claim 1 , a porphyrin claim 1 , dibenzyolmethane claim 1 , p-aminobenzoic acid claim 1 , anthranilate claim 1 , salicylate claim 1 , cinnamic acid claim 1 , dihydroxycinnamic acid claim 1 , camphor claim 1 , trihydroxycinnamic acid claim 1 , dibenzalacetone naptholsulfonate claim 1 , benzalacetophenone naphtholsulfonate claim 1 , dihydroxy-naphthoic acid claim 1 , o-hydroxydiphenyldisulfonate claim 1 , p-hydroxdydiphenyldisulfonate claim 1 , coumarin claim 1 , respective salts thereof claim 1 , respective derivatives thereof claim 1 , and combinations thereof.9. A composition ...

COMPOSITIONS, APPARATUS, SYSTEMS, AND METHODS FOR RESOLVING ELECTRONIC EXCITED STATES

The present disclosure relates, according to some embodiments, to molecules, including conjugated fused polycyclic molecules, that may receive excited state energy from other molecules (e.g., light-absorbing molecules) or directly from the irradiation sources. According to some embodiments, the disclosure relates to molecules, including conjugated fused polycyclic molecules, that may resolve (e.g., quench, dissipate) excited state energy, normally by way of releasing it as heat. (e.g., as heat). Conjugated fused polycyclic molecules of various structures are disclosed including Formula III: 134-. (canceled)36. A composition according to claim 35 , wherein each Rand Rare different from each other.37. A composition according to claim 35 , wherein Dand Dare hydrogen.38. A composition according to claim 35 , wherein at least one of R claim 35 , R claim 35 , R claim 35 , R claim 35 , R claim 35 , R claim 35 , R claim 35 , R claim 35 , R claim 35 , and Ris an alkyl group having from about 1 to about 30 carbon atoms.39. A composition according to claim 35 , wherein one of Rand Ris nitrile.40. A composition according to claim 35 , wherein neither Rnor Ris nitrile.41. A composition according to claim 35 , wherein the conjugated fused polycyclic molecule comprises no more than 6 rings with no more than 4 of these rings fused to each other.42. A paint claim 35 , a coating claim 35 , a cosmetic claim 35 , a sunscreen claim 35 , a pharmaceutical preparation claim 35 , a bituminous preparation claim 35 , an ink claim 35 , a toner claim 35 , a photographic emulsion claim 35 , a glass claim 35 , or a fabric comprising a composition according to . This application is a continuation-in-part of U.S. application Ser. No. 13/588,662 filed Aug. 17, 2012. This application is a continuation-in-part of International PCT Application No. PCT/US12/67519 filed Dec. 3, 2012. This application is a continuation-in-part of U.S. application Ser. No. 13/805,168 filed Dec. 18, 2012. This application ...

COMPOSITIONS, APPARATUS, SYSTEMS, AND METHODS FOR RESOLVING ELECTRONIC EXCITED STATES

The present disclosure relates, according to some embodiments, to molecules, including conjugated fused polycyclic molecules, that may receive excited state energy from other molecules (e.g., light-absorbing molecules) or directly from the irradiation sources. According to some embodiments, the disclosure relates to molecules, including conjugated fused polycyclic molecules, that may resolve (e.g., quench, dissipate) excited state energy, normally by way of releasing it as heat. (e.g., as heat). Conjugated fused polycyclic molecules of various structures are disclosed including Formula III: 2. A composition according to claim 1 , wherein Rand Rare different from each other.3. A composition according to claim 1 , wherein Dand Dare hydrogen.4. A composition according to claim 1 , wherein at least one of R3 claim 1 , R4 claim 1 , R5 claim 1 , R6 claim 1 , R7 claim 1 , R8 claim 1 , R9 claim 1 , and R10 is each independently an alkyl group having from about 1 to about 30 carbon atoms.5. A composition according to claim 1 , wherein one of Rand Ris nitrile.6. A composition according to claim 1 , wherein neither Rnor Ris nitrile.7. A composition according to claim 1 , wherein the conjugated fused polycyclic molecule comprises no more than 6 rings with no more than 4 of these rings fused to each other.8. A composition according to claim 1 , wherein the photoactive molecule is selected from a pigment claim 1 , a porphyrin claim 1 , dibenzyolmethane claim 1 , p-aminobenzoic acid claim 1 , anthranilate claim 1 , salicylate claim 1 , cinnamic acid claim 1 , dihydroxycinnamic acid claim 1 , camphor claim 1 , trihydroxycinnamic acid claim 1 , dibenzalacetone naptholsulfonate claim 1 , benzalacetophenone naphtholsulfonate claim 1 , dihydroxy-naphthoic acid claim 1 , o-hydroxydiphenyldisulfonate claim 1 , p-hydroxdydiphenyldisulfonate claim 1 , coumarin claim 1 , respective salts thereof claim 1 , respective derivatives thereof claim 1 , and combinations thereof.9. A composition ...

Piperazine derivatives, pharmaceutical compositions and methods of use thereof

The present invention relates to novel piperazine derivatives, methods for their preparation, pharmaceutical compositions including such compounds, and methods of using these compounds and compositions, especially for targeted therapy treatment of hyperproliferative disorders, including benign hyperproliferative disorders, cancer and pre-cancer conditions.

Onium compounds and methods of synthesis thereof

New onium salt compounds and methods for synthesis of such compounds are provided. Preferred methods of the invention include (a) providing an onium salt compound comprising a sulfonate component having an electron withdrawing group; and (b) treating the onium salt compound with a halide salt to form a distinct salt of the onium compound. The present onium compounds are useful as an acid generator component of a photoresist composition.

CHEMICALLY AMPLIFIED RESIST MATERIAL, PATTERN-FORMING METHOD, COMPOUND, AND PRODUCTION METHOD OF COMPOUND

A pattern-forming method comprises patternwise exposing a predetermined region of a resist material film made from a photosensitive resin composition comprising a chemically amplified resist material to a first radioactive ray that is ionizing radiation or nonionizing radiation having a wavelength of no greater than 400 nm. The resist material film patternwise exposed is floodwise exposed to a second radioactive ray that is nonionizing radiation having a wavelength greater than the wavelength of the nonionizing radiation for the patternwise exposing and greater than 200 nm. The chemically amplified resist material comprises a base component, and a generative component that is capable of generating a radiation-sensitive sensitizer and an acid upon an exposure. The generative component comprises a radiation-sensitive sensitizer generating agent. The radiation-sensitive sensitizer generating agent comprises a compound represented by formula (A). 2. The pattern-forming method according to claim 1 , wherein the base component is a polymer solubility in a developer solution of which is capable of being altered by an action of an acid.3. The pattern-forming method according to claim 1 , comprising the radiation-sensitive acid generating agent as the generative component.4. The pattern-forming method according to claim 1 , comprising as the generative component claim 1 , a polymer having an acid-generating group.5. The pattern-forming method according to claim 1 , wherein the compound represented by the formula (A) is derived from a compound having a benzanthrone skeleton.7. The chemically amplified resist material according to claim 6 , wherein the base component is a polymer solubility in a developer solution of which is capable of being altered by an action of an acid.8. The chemically amplified resist material according to claim 6 , comprising the radiation-sensitive acid generating agent as the generative component.9. The chemically amplified resist material according ...

NOVEL PHOTOINITIATORS

The present invention provides novel photoinitiators for polyurethane formation, in which a photoinitiator moiety and a tertiary amine are incorporated into the photoinitiator structure, and thus the polyurethane polymer. 2. A photoinitiator according to claim 1 , wherein Wand Ware the same.3. A photoinitiator according to claim 1 , wherein Xand Xare independently selected from optionally substituted C-Calkylene claim 1 , —O— claim 1 , —S— claim 1 , —NR— claim 1 , wherein Ris H or optionally substituted C-Calkyl claim 1 , and combinations thereof.4. A photoinitiator according to claim 1 , wherein Xand Xmay be linked to one another to form one or more ring structures.5. A photoinitiator according to claim 1 , wherein Xand Xare independently selected from optionally substituted C-Calkylene claim 1 , preferably optionally substituted C-Calkylene.6. A photoinitiator according to claim 1 , wherein Xand Xare the same.7. A photoinitiator according to claim 1 , wherein Za is selected from optionally substituted —O—(C-Calkylene)- claim 1 , preferably optionally substituted —O—(C-Calkylene)-.8. A photoinitiator according to claim 1 , wherein Xand Xare independently selected from optionally substituted C-Calkylene claim 1 , and Wand Ware —OH.9. A photoinitiator according to claim 1 , being4-{3-[bis(2-hydroxyethyl)amino]propoxy}-1-chloro-9H-thioxanthen-9-one. The present invention relates to novel photoinitiators. The photoinitiators can be incorporated into polyurethane polymers such that photoinitiator moieties are present as pendant groups on the polymeric backbone.Curing of coatings through ultraviolet (UV) radiation requires efficient methods of initiating the chemical reaction responsible for the curing process. Curing of polymeric material through generation of radical species upon irradiation with UV light is widely used to produce coatings for medical devices. The paint and lacquer industry also makes use of UV-initiated curing of acrylates, where photoinitiators in ...

PHOTOCURING METHOD, COMPOUND AND COMPOSITION USED THEREIN

An object of the present invention is to provide a photocuring method, which makes it possible to rapidly and efficiently obtain a crosslinked product (resin), a compound used in the photocuring method, and a photocuring resin composition containing the compound. 1. A photocuring method comprising a step 1 and a step 2 performed after the step 1;wherein in the step 1, in the presence of (A) compound having a carbonyl group generating a radical by photoirradiation and a carboxyl group decarboxylated by photoirradiation, (B) silane coupling agent having a mercapto group or a (meth)acryl group is reacted with (C) water under acidic conditions to obtain (D) silane compound having a mercapto group or a (meth)acryl group and at least one silanol group, andin the step 2, in the presence of the compound (A) and (E) compound having a carbonyl group generating a radical by photoirradiation and a group generating a base by being decarboxylated by photoirradiation, the compound (A) and the compound (E) are irradiated with light to create alkaline conditions in a reaction system by decarboxylating the carboxyl group of the compound (A) and generating a base from the compound (E), and radicals are generated from the compound (A) and the compound (E) to generate a crosslinked product containing a constitutional unit derived from the silane compound (D) from the silane compound (D) and, if necessary, from (F) compound having two or more polymerizable unsaturated groups.2. The photocuring method according to claim 1 , wherein the step 1 is performed at a pH in a range of 3 to 5.3. The photocuring method according to claim 1 , wherein the step 2 is performed at a pH in a range of 8 to 14.4. The photocuring method according to claim 1 , wherein the silane coupling agent (B) is (B′) silane coupling agent having a mercapto group claim 1 , the silane compound (D) is (D′) silane compound having a mercapto group and at least one silanol group claim 1 , and the crosslinked product obtained ...

SALT, QUENCHER, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN

Disclosed are a salt represented by formula (I), a quencher, and a resist composition including the same: 2. The salt according to claim 1 , wherein Ris —X—R.3. A quencher comprising the salt according to .4. A resist composition comprising the quencher according to claim 3 , a resin including a structural unit having an acid-labile group claim 3 , and an acid generator.7. The resist composition according to claim 4 , further comprising a salt generating an acid having an acidity lower than that of an acid generated from the acid generator.8. The resist composition according to claim 4 , further comprising a resin including a structural unit having a fluorine atom.9. A method for producing a resist pattern claim 4 , which comprises:{'claim-ref': {'@idref': 'CLM-00004', 'claim 4'}, '(1) a step of applying the resist composition according to on a substrate,'}(2) a step of drying the applied composition to form a composition layer,(3) a step of exposing the composition layer,(4) a step of heating the exposed composition layer, and(5) a step of developing the heated composition layer. The present invention relates to a salt, a quencher including the salt and a resist composition, and a method for producing a resist pattern using the resist composition.Patent Document 1 mentions a resist composition comprising a salt of the following structural formula, a resin including a structural unit having an acid-labile group, and an acid generator.Patent Document 2 mentions a resist composition comprising a salt of the following structural formula, a resin including a structural unit having an acid-labile group, and an acid generator.Patent Document 1: JP 2017-202993 APatent Document 2: JP 2018-066985 AAn object of the present invention is to provide a salt capable of producing a resist pattern with mask error factor (MEF) which is better than that of a resist pattern formed from the resist composition including the above-mentioned salts.The present invention includes the ...

REAGENT AND COMPOSITION OF RESIST

Described is a reagent that enhances acid generation of a photoacid generator and a composition containing such reagent. 1. A reagent wherein:a feed of an energy to the reagent or to an acceptor for the reagent receiving the energy generates an intermediate from the reagent; and further whereinthe intermediate enhances generation of acid from a precursor, wherein the intermediate is a ketyl radical.25.-. (canceled)6. The reagent of claim 1 , wherein the feed of energy comprises irradiation with light.7. The reagent of claim 1 , wherein the feed of energy is carried out by irradiation of the reagent with at least one of light of which the wavelength is less than or equal to 15 nm and an electron beam.8. A composition claim 1 , comprising:{'claim-ref': {'@idref': 'CLM-00001', 'claim 1'}, 'the reagent of ; and'}a first compound that functions as a generation source of acid.9. The composition of claim 8 , further comprising:a second compound that has a bond cleavable by acid.11. (canceled)12. The reagent of claim 10 , wherein:the reagent further includes a second cyclic moiety, andthe first cyclic moiety contains at least two atoms that are also contained in the second cyclic moiety.13. The composition reagent of claim 10 , wherein:the third reagent further includes a third cyclic moiety, andthe first cyclic moiety contains at least two atoms that are also contained in the third cyclic moiety.14. The reagent of claim 10 , wherein the first cyclic moiety is either a six-membered ring or a five-membered ring.15. The reagent of claim 10 , wherein the second cyclic moiety is an aromatic group.16. (canceled)17. The composition of claim 8 , wherein the first compound is an organic salt containing an iodonium ion or a sulfonium ion.18. The reagent of claim 1 , wherein the intermediate is generated by abstracting a hydrogen atom from the reagent.19. The reagent of claim 1 , wherein a difference between at least one of a first oxidation potential of a ground state and a second ...

3,6-DISUBSTITUTED XANTHYLIUM SALTS

Described are a compound of formula (II) or (III): 2. A method according to claim 1 , wherein X is selected from the group consisting of: NO claim 1 , ClO claim 1 , F claim 1 , Cl claim 1 , Br claim 1 , I claim 1 , ZnCl claim 1 , FeCl and PF.3. A method according to claim 1 , wherein —Ris independently —H claim 1 , or saturated aliphatic Calkyl claim 1 , which is unsubstituted or substituted with —R.4. A method according to claim 1 , wherein —Ris saturated aliphatic Calkyl claim 1 , which is unsubstituted or substituted with one or more substituents —R.5. A method according to claim 4 , wherein each —Ris independently selected from —F claim 4 , —Cl claim 4 , —Br claim 4 , or —I.6. A method according to claim 4 , wherein —Ris —CF.7. A method according to claim 1 , wherein —Ris phenyl claim 1 , which is substituted with one or more substituents —R.8. A method according to claim 7 , wherein each —Ris independently selected from NHand NO.9. A method according to claim 4 , wherein —Ris -Et.10. A method according to claim 1 , wherein the compound is a compound of formula (II) wherein —R claim 1 , —R claim 1 , —Rand —Rare each independently saturated aliphatic Calkyl.11. A method according to claim 10 , wherein —Rand —Rare each independently selected from: —H claim 10 , saturated Calkyl claim 10 , Calkenyl claim 10 , and halogenated Calkyl.13. A method according to claim 12 , wherein one of —Rand —R claim 12 , and one of —Rand —Ris -Et.14. A method according to claim 12 , wherein —R claim 12 , —R claim 12 , —Rand —Rare each -Et.15. A method according to claim 12 , wherein Rand R claim 12 , together with the nitrogen atom to which they are bound claim 12 , form a saturated Cheterocycle and Rand R claim 12 , together with the nitrogen atom to which they are bound claim 12 , independently form a saturated Cheterocycle{'sub': '3-7', 'wherein each of said saturated Cheterocycles is independently selected from: morpholine, piperidine, and pyrrolidine.'}18. A method according to ...

AMINE COMPOUND AND USE THEREOF FOR MEDICAL PURPOSES

The present invention provides a compound represented by the following formula (I): 2. The compound according to claim 1 , wherein both Rand Rare hydrogen atoms claim 1 , or a pharmaceutically acceptable acid addition salt thereof.3. The compound according to claim 1 , wherein n is 0 claim 1 , or a pharmaceutically acceptable acid addition salt thereof.4. The compound according to claim 1 , wherein V is CHCH claim 1 , or a pharmaceutically acceptable acid addition salt thereof.5. The compound according to claim 1 , wherein Cis a hydrogen atom claim 1 , aryl having 6-10 carbon atoms and optionally having substituent(s) or heteroaryl optionally having substituent(s) and having 5 to 10 ring-constituting atoms claim 1 , which contains 1 or 2 nitrogen atoms claim 1 , 1 or 2 oxygen atoms or 1 or 2 sulfur atoms as the ring-constituting atom(s) claim 1 , or a pharmaceutically acceptable acid addition salt thereof.6. The compound according to claim 1 , wherein Y is C═O claim 1 , or a phnnveentically ncreptahle acid addition salt thereof.7. The compound according to claim 1 , wherein Ais a single bond claim 1 , an oxygen atom claim 1 , a sulfur atom or —CO— claim 1 , or a pharmaceutically acceptable acid addition salt thereof.8. The compound according to claim 1 , wherein Ris hydroxymethyl claim 1 , or a pharmaceutically acceptable acid addition salt thereof.9. The compound according to claim 1 , wherein Ris a hydrogen atom claim 1 , or a pharmaceutically acceptable acid addition salt thereof.10. The compound according to claim 1 , wherein the compound of the formula (I) is any of the following a to hh claim 1 , or a pharmaceutically acceptable acid addition salt thereof:a. 2-[3-amino-4-hydroxy-3-(hydroxymethyl)butyl]-6[3-(trifluoromethyl)phenoxy]-9H-thioxanthen-9-one,b. 2-[3-amino-4-hydroxy-3-(hydroxymethyl)butyl]-6-(4-chlorophenoxy)-9H-thioxanthen-9-one,c. 2-[3-amino-4-hydroxy-3-(hydroxymethyl)butyl]-7-[3-(trifluoromethyl)phenoxy]-9H-thioxanthen-9-one,d. 2-[3-amino-4- ...

SUBSTITUTED ARYL ONIUM MATERIALS

Acid generators comprising a carbocyclic or heteroaromatic group substituted with at least one diester moiety are provided. These acid generators are particularly useful as a photoresist composition component. 2. An acid generator of claim 1 , wherein W is —(C═O)O— or —C(═O)O(CX′X″)nC(═O)O—.7. The acid generator of claim 1 , wherein Z is selected from the group consisting of carboxylate claim 1 , sulfamate claim 1 , or non-fluorinated sulfonate.8. The acid generator of claim 1 , wherein Z contains a polymerizable moiety.9. A photoresist composition comprising one or more acid generators of .10. A method for providing a photoresist relief image claim 1 , comprising:{'claim-ref': {'@idref': 'CLM-00009', 'claim 9'}, 'a) applying a coating layer of a photoresist composition of on a substrate; and'}b) exposing the photoresist composition layer to activating radiation and developing the exposed photoresist composition coating layer. In one aspect, the present invention relates to new onium acid generators that comprise a substituted carbocyclic, aryl, or heteroaromatic group.Photoresists are photosensitive films for transfer of images to a substrate. They form negative or positive images. After coating a photoresist on a substrate, the coating is exposed through a patterned photomask to a source of activating energy such as ultraviolet light to form a latent image in the photoresist coating. The photomask has areas opaque and transparent to activating radiation that define an image desired to be transferred to the underlying substrate. A relief image is provided by development of the latent image pattern in the resist coating.Known photoresists can provide features having resolution and dimension sufficient for many existing commercial applications. However for many other applications, the need exists for new photoresists that can provide highly resolved images of submicron dimension.Various attempts have been made to alter the make-up of photoresist compositions to ...

ARYL ACETATE ONIUM MATERIALS

Acid generators comprising a carbocyclic aryl or heteroaromatic group substituted with at least one acetate moiety are provided. These acid generators are particularly useful as a photoresist composition component. 8. An acid generator of wherein the acid generator comprises a polymerizable moiety.9. A photoresist composition comprising one or more acid generators of .10. A method for providing a photoresist relief image claim 1 , comprising:{'claim-ref': {'@idref': 'CLM-00001', 'claim 1'}, 'a) applying a coating layer of a photoresist composition of on a substrate; and'}b) exposing the photoresist composition layer to activating radiation and developing the exposed photoresist composition coating layer. In one aspect, the present invention relates to new onium acid generators that comprise a carbocyclic aryl or heteroaromatic group substituted with at least one acetate moiety.Photoresists are photosensitive films for transfer of images to a substrate. They form negative or positive images. After coating a photoresist on a substrate, the coating is exposed through a patterned photomask to a source of activating energy such as ultraviolet light to form a latent image in the photoresist coating. The photomask has areas opaque and transparent to activating radiation that define an image desired to be transferred to the underlying substrate. A relief image is provided by development of the latent image pattern in the resist coating.Known photoresists can provide features having resolution and dimension sufficient for many existing commercial applications. However for many other applications, the need exists for new photoresists that can provide highly resolved images of submicron dimension.Various attempts have been made to alter the make-up of photoresist compositions to improve performance of functional properties. Among other things, a variety of photoactive compounds have been reported for use in photoresist compositions. See US 20070224540 and EP 1906241. See also ...

3,6-disubstituted xanthylium salts

Described are a compound of formula (II) or (III): The compounds are effective in the treatment of disease, including a tauopathy condition or a disease of tau protein aggregation.

Compound, material for organic electroluminescence devices, organic electroluminescence device, and electronic device

wherein R1 to R8, R11 to R18, R21 to R28, R31 to R38, X, Y, L1, L2, L3, and Ar are as defined in the description.

REAGENT FOR ENHANCING GENERATION OF CHEMICAL SPECIES

A reagent that enhances acid generation of a photoacid generator and composition containing such a reagent is described. 1. A reagent , whereinthe reagent is able to generate a first chemical species; anda first cutoff wavelength in a first absorption spectrum of the reagent is shorter than a second cutoff wavelength of a second absorption spectrum of the first chemical species.2. The reagent of claim 1 , wherein the first chemical species is selected from the group consisting of a radical claim 1 , an ion claim 1 , and a reactive intermediate containing an atom with unusual valence.3. The reagent of claim 1 , wherein the first chemical species is able to generate a first product.4. The reagent of claim 3 , wherein the first cutoff wavelength is shorter than a third cutoff wavelength in an absorption spectrum of the first product.5. The reagent of claim 3 , wherein a first conjugation length of the reagent is shorter than a second conjugation length of the first product.6. The reagent of claim 3 , wherein:the reagent has a first pi-electron system; andthe first product has the first pi-electron system and a second pi-electron system.7. The reagent of claim 6 , wherein the first pi-electron system is conjugated with the second pi-electron system in the first product.8. The reagent of claim 7 , wherein the second pi-electron system is constituted by a carbon-carbon multiple bond.9. The reagent of claim 3 , wherein the highest occupied molecular orbital (HOMO) of the reagent is lower than the highest occupied molecular orbital (HOMO) of the first product.10. The reagent of claim 6 , wherein the first product further has a third pi-electron system.11. The reagent of claim 10 , wherein the third pi-electron system is conjugated with the second pi-electron system.12. The reagent of claim 10 , wherein the reagent has the third pi-electron system.13. The reagent of claim 12 , wherein the third pi-electron system is not conjugated with the first pi-electron system in the ...

COMPOUND AND ORGANIC ELECTRONIC DEVICE USING THE SAME

Provided are a novel compound and an organic electronic device using the same. The novel compound is represented by the following Formula (I): 3. The compound as claimed in claim 2 , wherein the aromatic structure extended from Aand Ais a substituted or unsubstituted 6 to 20-membered carbon aromatic cyclic structure.4. The compound as claimed in claim 3 , wherein the substituted or unsubstituted 6 to 20-membered carbon aromatic cyclic structure is selected from the group consisting of: a substituted or unsubstituted benzene structure claim 3 , a substituted or unsubstituted naphthalene structure claim 3 , a substituted or unsubstituted anthracene structure claim 3 , a substituted or unsubstituted phenanthrene structure claim 3 , a substituted or unsubstituted pyrene structure claim 3 , a substituted or unsubstituted fluoranthene structure claim 3 , a substituted or unsubstituted benzofluoranthene structure claim 3 , and a substituted or unsubstituted fluorene structure.5. The compound as claimed in claim 1 , wherein the first aryl ring extended from Xand Xis a substituted or unsubstituted 6 to 60-membered carbon ring.6. The compound as claimed in claim 5 , wherein the substituted or unsubstituted 6 to 60-membered carbon ring is selected from the group consisting of: a substituted or unsubstituted benzene ring claim 5 , a substituted or unsubstituted naphthalene ring claim 5 , a substituted or unsubstituted anthracene ring claim 5 , a substituted or unsubstituted phenanthrene ring claim 5 , a substituted or unsubstituted pyrene ring claim 5 , a substituted or unsubstituted fluoranthene ring claim 5 , a substituted or unsubstituted benzofluoranthene ring claim 5 , and a substituted or unsubstituted fluorene structure.7. The compound as claimed in claim 6 , wherein the substituted or unsubstituted 6 to 60-membered carbon ring is a substituted or unsubstituted benzene structure.8. The compound as claimed in claim 1 , wherein at least one of Zto Zin formula (I) is ...

NOVEL POLYMERIC PHOTOINITIATORS AND PHOTOINITIATOR MONOMERS

The present invention provides polymeric quaternary ammonium photoinitiators being co-polymers of photoinitiator monomers, as well as quaternary ammonium photoinitiator monomer being valuable intermediates in the preparation of such polymeric photoinitiators. Additionally, there is provided a polyacrylate obtained by radical polymerization of at least one acrylate monomer (Ac) in the presence of such polymeric photoinitiators. In the photoinitiator monomers and polymeric photoinitiators, a photoinitiator moiety and a quaternary ammonium are incorporated into the photoinitiator structure. 182-. (canceled)84. The polymeric photoinitiator according to claim 83 , wherein Z is selected from the group consisting of a single bond claim 83 , an optionally substituted C-Calkylene claim 83 , an optionally substituted C-Can alkenylene claim 83 , —O— claim 83 , —S— claim 83 , —NR— claim 83 , —C(═O)— claim 83 , —C(═O)—NR— claim 83 , —NR—C(═O)— claim 83 ,{'sup': 7', '7, 'sub': 2', '3', '8', '1', '12', 'n, '—C(═NR)—, —SO—, —P(═O)(OR)—, an optionally substituted —C-Ccycloalkyl, an optionally substituted heterocydyl, an optionally substituted aryl, —[O—(C-Calkylene)]—,'}{'sup': 2', '2', '7, 'sub': 1', '12', 'n', '1', '12', 'n', '1', '12', '1', '12, '—[NR—(C-Calkylene)], —[S—(C-Calkylene)]—, and combinations thereof, wherein Ris an optionally substituted C-Calkyl, Ris H or an optionally substituted C-Calkyl, and n is an integer from 1-20.'}85. The polymeric photoinitiator according to claim 84 , wherein n is an integer from 1-10.86. The polymeric photoinitiator according to claim 83 , wherein Z is selected from a single bond claim 83 , an optionally substituted C-Calkylene claim 83 , an optionally substituted C-Calkenylene claim 83 , —O— claim 83 , —S— claim 83 , —NR— claim 83 , —C(═O)— claim 83 , —C(═O)—NR— claim 83 , —NR—C(═O)— claim 83 ,{'sup': 7', '2', '2', '7, 'sub': 3', '8', '1', '12', 'n', '1', '12', 'n', '1', '12', 'n', '1', '12', '1', '12, '—C(═NR)—, an optionally ...

Novel photoinitiators

The present invention provides novel photoinitiators for polyurethane formation, in which a photoinitiator moiety and a tertiary amine are incorporated into the photoinitiator structure, and thus the polyurethane polymer.

WATER-BASED UV INKJET INK

The invention describes the use of a water-based UV curable inkjet printing ink wherein the ink is basic due to the presence of a tertiary amine, allowing the complete dissolution of an acid functional photoinitiator of Formula I or Formula IA (wherein R, R, R, n, q, and y are as defined herein). This combination of photoinitiator and tertiary amine allows the rapid low dosage UV curing of a water-based UV formulation using a UV LED light source. 3. The composition of claim 1 , which is curable by an LED light source.4. (canceled)5. (canceled)6. The composition of claim 1 , further containing one or more water compatible solvents claim 1 , one or more water soluble monomers claim 1 , and/or one or more additional photoinitiators.7. (canceled)8. (canceled)9. The composition of claim 6 , wherein:a) the photoinitiator of Formula I or IA is present in an amount of 0.1-2%;b) the polymer which is water-soluble, or dispersible in water either as a liquid in liquid emulsion or particle suspension is present in an amount of 15-35% of a water dispersion containing about 40% solids;c) water is present in an amount of 20-80%;d) the one or more water compatible solvents are present in an amount of 0-40%;e) the one or more water soluble monomers are present in an amount of 0-15%;f) the one or more tertiary amine synergists are present in an amount of 0.1-4%; andg) the one or more additional photoinitiators are present in an amount of 0-2%.10. The composition of claim 1 , wherein a ratio of amine to the photoinitiator of Formula 1 or Formula IA is greater than 1:1 claim 1 , greater than 1.5:1 claim 1 , greater than 2:1 claim 1 , greater than 5:1 claim 1 , greater than 10:1 claim 1 , greater than 15:1 or greater than 20:1.11. (canceled)12. (canceled)13. (canceled)14. (canceled)15. (canceled)16. (canceled)17. The composition of claim 1 , wherein the one or more tertiary amine synergists comprises at least one N claim 1 ,N-dialkylamino benzoic acid; and the composition further ...

COMPOUND FOR ORGANIC OPTOELECTRONIC DEVICE, ORGANIC LIGHT-EMITTING DEVICE CONTAINING THE SAME, AND DISPLAY DEVICE INCLUDING SAID ORGANIC LIGHT-EMITTING DEVICE

A compound for an organic optoelectronic device, an organic light-emitting device including the same and a display device including the organic light-emitting device are provided, and the compound for an organic optoelectronic device represented by a combination of the following Chemical Formulae 1 and 2 is provided and thus an organic light-emitting device has improved life-span characteristics due to excellent electrochemical and thermal stability, and high luminous efficiency at a low driving voltage. 2. The compound for an organic optoelectronic device as claimed in claim 1 , wherein:{'sup': 1', '2', 'a', 'b', 'a', 'b, 'Xand Xare each independently —O—, —S—, —CRR—, or —SiRR, and'}{'sup': a', 'b, 'Rand Rare each independently a substituted or unsubstituted C1 to C10 alkyl group, or a substituted or unsubstituted C6 to C30 aryl group.'}3. The compound for an organic optoelectronic device as claimed in claim 1 , wherein Rto Rare each independently hydrogen claim 1 , deuterium claim 1 , a substituted or unsubstituted C1 to C10 alkyl group claim 1 , or a substituted or unsubstituted C6 to C30 aryl group.4. The compound for an organic optoelectronic device as claimed in claim 1 , wherein A is a substituted or unsubstituted C6 to C30 aryl group or a substituted or unsubstituted C2 to C30 heteroaryl group.10. The compound for an organic optoelectronic device as claimed in claim 1 , wherein the compound has a triplet exciton energy (T1) of 2.0 eV or greater.11. The compound for an organic optoelectronic device as claimed in claim 1 , wherein the organic optoelectronic device is an organic photoelectric device claim 1 , an organic light emitting device claim 1 , an organic solar cell claim 1 , an organic transistor claim 1 , an organic photo conductor drum claim 1 , or an organic memory device.12. An organic light-emitting device claim 1 , comprising:an anode,a cathode; andat least one organic thin layer between the anode and the cathode,{'claim-ref': {'@idref': 'CLM- ...

FUNCTIONALIZED PHOTOINITIATORS

The present invention provides mixtures of compounds and compounds having the formula: 138-. (canceled)40: The mixture as recited in claim 39 , wherein no single compound of formula (IV) is present in an amount of more than 45 wt.-% with respect to the total weight of the compounds of formula (IV) in the mixture.41: The mixture as recited in claim 39 , wherein the total amount of compounds of formula (IV) present in the mixture comprising the compounds of formula (IV) having at least one of p and q being 5 or larger is 20 wt.-% or less.42: The mixture as recited in claim 39 , wherein the weight of the compounds of formula (IV) with respect to a total weight of the mixture is from 10 to 100 wt.-%.45: The mixture as recited in claim 39 , wherein L is missing.47: The mixture as recited in claim 46 , wherein no single compound of formula (VI) is present in the amount of more than 45 wt.-% with respect to the total weight of compounds of formula (VI).50: The mixtures as recited in claim 46 , wherein the total amount of compounds of formula (VI) present in the mixtures which comprise compounds of formula (IV) having at least one of p and q being 5 or larger is 20 wt.-% or less.52: The photo-curable composition as recited in claim 51 , wherein the at least one ethylenically unsaturated components is selected from mono(meth)acrylates claim 51 , aliphatic or aromatic urethane (meth)acrylates claim 51 , polyether (meth)acrylates claim 51 , polyester (meth)acrylates and epoxy (meth)acrylates.53: The photo-curable composition as recited in claim 52 , wherein the mono(meth)acrylates are selected from the group consisting of methylacrylate claim 52 , methyl methacrylate claim 52 , ethyl acrylate claim 52 , ethyl methacrylate claim 52 , ethylhexyl acrylate claim 52 , ethylhexyl methacrylate claim 52 , hydroxyethyl acrylate claim 52 , hydroxyethyl methacrylate claim 52 , isobornyl acrylate claim 52 , isobornyl methacrylate claim 52 , butyl acrylate claim 52 , and butyl methacrylate ...

Pegylated thioxanthone photoinitiator and photosensitive resin composition

The present invention discloses a PEGylated thioxanthone photoinitiator and a photosensitive resin composition, the PEGylated thioxanthone compound is eco-friendly and has low toxicity, high initiation efficiency and good thermal stability, meanwhile, as a kind of photoinitiator, the compound has a small amount of fragment residue after cured, and may improve the compatibility of the photoinitiator and photosensitive resin composition system. The photosensitive resin composition provided by the present invention has reasonable allocation of ingredients and content in the components thereof, capable of 3D-printing a hydrogel having a specific structure; the hydrogel has lower cytotoxicity and better biocompatibility, and may applied in bioengineering fields, e.g., 3D cell culture.

RED-SHIFTED FLUOROPHORES

A compound of the following structure is provided: 2. The compound of claim 1 , wherein X is selected from the group consisting of alkyl claim 1 , substituted alkyl claim 1 , aryl claim 1 , substituted aryl claim 1 , alkenyl claim 1 , substituted alkenyl claim 1 , alkynyl claim 1 , substituted alkynyl claim 1 , CN claim 1 , COOH claim 1 , COO(alkyl) claim 1 , COO(aryl) claim 1 , C(O)NH(alkyl) claim 1 , C(O)N(alkyl) claim 1 , C(O)NH(aryl) claim 1 , C(O)N(aryl).4. The compound of claim 1 , wherein Q is selected from the group consisting of C(alkyl) claim 1 , O claim 1 , S claim 1 , SO claim 1 , Si(alkyl) claim 1 , P(O)(aryl) claim 1 , P(O)(alkyl) claim 1 , POH claim 1 , and replaced with two H atoms.6. The compound of claim 1 , wherein one or both L substituents are independently selected from the group consisting of O and OH.7. The compound of claim 1 , wherein one or both L substituents are independently selected from the group consisting of NH claim 1 , NCH(phenyl) claim 1 , NH(tert-butoxycarbonyl) claim 1 , and N(CH).8. The compound of claim 1 , wherein one or both L substituents are independently selected from the group consisting of substituted or unsubstituted cyclic amines with a ring size of 4 claim 1 , 5 claim 1 , 6 claim 1 , 7 claim 1 , or 8 atoms.10. The compound of claim 1 , wherein the Rsubstituents claim 1 , or the Rsubstituents claim 1 , and L substituents are taken together with the carbon atoms to which they are bonded to form a substituted or unsubstituted ring containing 5 claim 1 , 6 claim 1 , 7 claim 1 , 8 claim 1 , or 9 atoms12. The compound of claim 11 , wherein X is selected from the group consisting of alkyl claim 11 , substituted alkyl claim 11 , aryl claim 11 , substituted aryl claim 11 , alkenyl claim 11 , substituted alkenyl claim 11 , alkynyl claim 11 , substituted alkynyl claim 11 , CN claim 11 , COOH claim 11 , COO(alkyl) claim 11 , COO(aryl) claim 11 , C(O)NH(alkyl) claim 11 , C(O)N(alkyl) claim 11 , C(O)NH(aryl) claim 11 , C(O)N(aryl ...

Organic electroluminescent element and electronic device using same

An organic electroluminescence device comprising: a cathode, an anode, and an organic layer disposed between the cathode and the anode, wherein the organic layer comprises a compound represented by the following formula (1), and a compound A having a Stokes shift of 20 nm or smaller and an emission peak wavelength of 440 nm to 465 nm (at least one of Ar1 and Ar2 is a monovalent group having a structure represented by the following formula (2)).

NOVEL COMPOUND, ORGANIC ELECTROLUMINESCENCE DEVICE USING THE SAME, AND ELECTRONIC APPARATUS

A compound represented by the following formula (1), wherein in the formula, Land Lare predetermined linking groups, and Aris a monovalent group having a structure represented by the following formula (2). 2. The compound according to claim 1 , wherein one of Rto Rin the formula (2) is a single bond bonding with L.5. The compound according to claim 1 , wherein Lisa single bond, ora linking group having a structure represented by the formula (L-1), (L-2), (L-3), or (L-4).6. The compound according to claim 1 , wherein Lis a single bond.8. The compound according to claim 1 , wherein Lis a single bond ora linking group having a structure represented by the formula (L-1), (L-2), or (L-4).9. The compound according to claim 1 , wherein Lis a single bond.11. The compound according to wherein Aris{'sub': 2', '2', '2', '2', '2', '2', '2', '2, 'a monovalent group having a structure represented by the formula (Ar-1), (Ar-2), (Ar-3), (Ar-4), (Ar-5), (Ar-7), (Ar-8), or (Ar-9).'}13. The compound according to claim 1 , wherein Ar-L- isa substituted or unsubstituted phenyl group,a substituted or unsubstituted 2-naphthyl group,a substituted or unsubstituted phenylnaphthyl group,a substituted or unsubstituted biphenyl group,a substituted or unsubstituted naphthylphenyl group,a substituted or unsubstituted fluorenyl group,a substituted or unsubstituted phenanthryl group,a substituted or unsubstituted phenylphenanthryl group,a substituted or unsubstituted benzophenanthryl group,a substituted or unsubstituted benzotriphenylenyl group,a substituted or unsubstituted chrysenyl group,a substituted or unsubstituted dibenzofuranyl group,a substituted or unsubstituted phenyldibenzofuranyl group,a substituted or unsubstituted naphthobenzofuranyl group,a substituted or unsubstituted carbazolyl group,a substituted or unsubstituted carbazolyl-phenyl group, ora substituted or unsubstituted benzo[def]carbazolyl-phenyl group.14. The compound according to claim 1 , wherein Rto R claim 1 , and Rto ...

LIGHT EMITTING MATERIAL, MANUFACTURE METHOD THEREOF AND ORGANIC LIGHT EMITTING DIODE USING THE LIGHT EMITTING MATERIAL

A method for manufacturing a light emitting material of the constitutional formula This is a divisional application of co-pending U.S. patent application Ser. No. 16/279,933, filed on Feb. 19, 2019, which is a divisional application of U.S. patent application Ser. No. 15/122,410, filed on Aug. 30, 2016 and now U.S. Pat. No. 10,280,365, which is a national stage of PCT Application No. PCT/CN2016/095615, filed on Aug. 17, 2016, claiming foreign priority of Chinese Patent Application No. 201610579646.9, filed on Jul. 20, 2016.The present invention relates to a display technology field, and more particularly to a light emitting material, a manufacture method thereof and an organic light emitting diode using the light emitting material.The OLED (Organic Light-Emitting Diode) display, which is also named as the Organic light emitting display, is a new flat panel display device. Because it possesses advantages of simple manufacture process, low cost, low power consumption, high light emitting brightness, wide operating temperature range, thin volume, fast response speed, and being easy to achieve the color display and the large screen display, and being easy to achieve the match with the integrated circuit driver, and being easy to achieve the flexible display. Therefore, it has the broad application prospects.The OLED display utilizes the organic light emitting diode for light emission. Thus, it is extremely important to improve the efficiency and lifetime of the organic light emitting diode. Now, the organic light emitting diode has already made considerable progress. With the fluorescence phosphorescence hybrid, the white light element with the simple structure and high efficiency can be obtained. The efficiency of such fluorescence phosphorescence hybrid element significantly relies on the efficiency of the fluorescence. Therefore, it still has vital significant meaning to develop the high efficiency fluorescence material.In comparison with polymer, the small molecule ...

POLYMERIZABLE THIOXANTHONES

A polymerizable thioxanthone according to Formula (I): 115-. (canceled)17. The polymerizable thioxanthone according to claim 16 , wherein A represents a thioxanthone moiety substituted in a 1-position by a halogen claim 16 , an alkyl group claim 16 , or an alkoxy group.19. The polymerizable thioxanthone according to claim 18 , wherein X represents a fluor.20. The polymerizable thioxanthone according to claim 16 , wherein R1 and R2 are independently selected from the group consisting of hydrogen and an alkyl group having 1 to 6 carbon atoms.21. The polymerizable thioxanthone according to claim 20 , wherein R1 and R2 are both hydrogen.22. The polymerizable thioxanthone according to claim 16 , wherein the at least one free radical polymerizable group is selected from the group consisting of an acrylate and a methacrylate.23. The polymerizable thioxanthone according to claim 16 , wherein the moiety R3 includes two or three free radical polymerizable groups.24. The polymerizable thioxanthone according to claim 23 , wherein the two or three free radical polymerizable groups are independently selected from the group consisting of an acrylate and a methacrylate.25. The polymerizable thioxanthone according to claim 16 , wherein n is equal to 1.26. The polymerizable thioxanthone according to claim 18 , wherein n is equal to 1.27. A radiation curable composition including the polymerizable thioxanthone according to .28. A radiation curable composition including the polymerizable thioxanthone according to .30. The radiation curable composition according to claim 27 , wherein the radiation curable composition is an inkjet ink having a viscosity smaller than 15 mPa·s at 40° C. and at a shear rate of 1 claim 27 ,000 s.31. A substrate including a cured layer of the radiation curable composition according to .32. A method of inkjet printing claim 27 , the method including the step of:{'claim-ref': {'@idref': 'CLM-00027', 'claim 27'}, 'jetting the radiation curable composition of ...

COMPOUND FOR ORGANIC OPTOELECTRONIC DEVICE, ORGANIC LIGHT EMITTING DIODE INCLUDING THE SAME AND DISPLAY INCLUDING THE ORGANIC LIGHT EMITTING DIODE

Provided are a compound for an organic optoelectronic device represented by Chemical Formula 1, an organic light emitting diode including the same, and a display device including the organic light emitting diode. The structure of Chemical Formula 1 is shown in the specification. 2. The compound for an organic optoelectronic device as claimed in claim 1 , wherein claim 1 , in Chemical Formula 1 claim 1 ,X is nitrogen (N),{'sup': '1', 'Xis —O—, —S—, —CR′R″—, or —SiR′R″—, wherein R′ and R″ are each independently hydrogen, deuterium, a substituted or unsubstituted C1 to C10 alkyl group, or a substituted or unsubstituted C6 to C18 aryl group,'}{'sup': '2', 'Xis —O— or —S—,'}{'sup': 1', '3, 'Lto Lare each a phenyl group, and'}n1 to n3 are each independently 0 or 1.3. The compound for an organic optoelectronic device as claimed in claim 1 , wherein claim 1 , in Chemical Formula 1 claim 1 ,X is nitrogen (N),{'sup': '1', 'Xis —O—, —S—, —CR′R″—, or —SiR′R″—, wherein R′ and R″ are each independently hydrogen, deuterium, a substituted or unsubstituted C1 to C10 alkyl group, or a substituted or unsubstituted C6 to C18 aryl group,'}{'sup': '2', 'Xis —O— or —S—,'}{'sup': 1', '3, 'Lto Lare each a phenyl group,'}n1 to n3 are each independently 0 or 1, and{'sup': 1', '2, 'Arand Arare each independently a substituted or unsubstituted C6 to C30 aryl group.'}4. The compound for an organic optoelectronic device as claimed in claim 3 , wherein Arand Arare each independently a substituted or unsubstituted phenyl group claim 3 , a substituted or unsubstituted biphenyl group claim 3 ,a substituted or unsubstituted triphenyl group, a substituted or unsubstituted phenanthryl group, a substituted or unsubstituted naphthyl group, a substituted or unsubstituted anthracenyl group, or a substituted or unsubstituted fluorenyl group.6. The compound for an organic optoelectronic device as claimed in ;wherein the compound has a triplet exciton energy (T1) of greater than or equal to 2.0 eV.7. The ...

COMPOUND AND ORGANIC ELECTRONIC DEVICE USING THE SAME

Provided are a novel compound and an organic electronic device using the same. The novel corn pound is represented by the following Formula (I): 3. The compound as claimed in claim 2 , wherein the aromatic structure extended from Aand Ais a substituted or unsubstituted 6 to 20-membered carbon aromatic cyclic structure.4. The compound as claimed in claim 3 , wherein the substituted or unsubstituted 6 to 20-membered carbon aromatic cyclic structure is selected from the group consisting of: a substituted or unsubstituted benzene structure claim 3 , a substituted or unsubstituted naphthalene structure claim 3 , a substituted or unsubstituted anthracene structure claim 3 , a substituted or unsubstituted phenanthrene structure claim 3 , a substituted or unsubstituted pyrene structure claim 3 , a substituted or unsubstituted fluoranthene structure claim 3 , a substituted or unsubstituted benzofluoranthene structure claim 3 , and a substituted or unsubstituted fluorene structure.5. The compound as claimed in claim 1 , wherein the first aryl ring extended from Xand Xis a substituted or unsubstituted 6 to 60-membered carbon ring.6. The compound as claimed in claim 5 , wherein the substituted or unsubstituted 6 to 60-membered carbon ring is selected from the group consisting of: a substituted or unsubstituted benzene ring claim 5 , a substituted or unsubstituted naphthalene ring claim 5 , a substituted or unsubstituted anthracene ring claim 5 , a substituted or unsubstituted phenanthrene ring claim 5 , a substituted or unsubstituted pyrene ring claim 5 , a substituted or unsubstituted fluoranthene ring claim 5 , a substituted or unsubstituted benzofluoranthene ring claim 5 , and a substituted or unsubstituted fluorene structure.7. The compound as claimed in claim 6 , wherein the substituted or unsubstituted 6 to 60-membered carbon ring is a substituted or unsubstituted benzene structure.8. The compound as claimed in claim 1 , wherein at least one of Zto Zin Formula (I) is ...

Onium salt compound, chemically amplified resist composition and patterning process

An onium salt having formula (1) serving as an acid diffusion inhibitor and a chemically amplified resist composition comprising the acid diffusion inhibitor are provided. When processed by lithography, the resist composition exhibits a high sensitivity, and excellent lithography performance factors such as CDU and LWR.

ARYL ACETATE ONIUM MATERIALS

Acid generators comprising a carbocyclic aryl or heteroaromatic group substituted with at least one acetate moiety are provided. These acid generators are particularly useful as a photoresist composition component. 8. An acid generator of wherein the acid generator comprises a polymerizable moiety.9. A photoresist composition comprising one or more acid generators of .10. A method for providing a photoresist relief image claim 1 , comprising:{'claim-ref': {'@idref': 'CLM-00001', 'claim 1'}, 'a) applying a coating layer of a photoresist composition of on a substrate; and'}b) exposing the photoresist composition layer to activating radiation and developing the exposed photoresist composition coating layer.11. A photoresist composition comprising one or more acid generators of .12. A photoresist composition comprising one or more acid generators of .13. A method for providing a photoresist relief image claim 5 , comprising:{'claim-ref': {'@idref': 'CLM-00011', 'claim 11'}, 'a) applying a coating layer of a photoresist composition of on a substrate; and'}b) exposing the photoresist composition layer to activating radiation and developing the exposed photoresist composition coating layer.14. A method for providing a photoresist relief image claim 5 , comprising:{'claim-ref': {'@idref': 'CLM-00012', 'claim 12'}, 'a) applying a coating layer of a photoresist composition of on a substrate; and'}b) exposing the photoresist composition layer to activating radiation and developing the exposed photoresist composition coating layer. In one aspect, the present invention relates to new onium acid generators that comprise a carbocyclic aryl or heteroaromatic group substituted with at least one acetate moiety.Photoresists are photosensitive films for transfer of images to a substrate. They form negative or positive images. After coating a photoresist on a substrate, the coating is exposed through a patterned photomask to a source of activating energy such as ultraviolet light to ...

LIGHT EMITTING MATERIAL, MANUFACTURE METHOD THEREOF AND ORGANIC LIGHT EMITTING DIODE USING THE LIGHT EMITTING MATERIAL

The present invention provides a light emitting material, a manufacture method thereof and an organic light emitting diode using the light emitting material. The structure is unitary, and the formula weight is determined, and the better solubility and film formation are provided, and the thin film status is stable; it possesses a very high decomposition temperature and a lower sublimation temperature, and is easy to sublime to be light emitting material of high purity, and can be applied for small molecule organic light emitting diode. In the manufacture method of the light emitting material according to the present invention, m-bromothiophenol and 4-Bromo-2-fluorobenzonitrile are employed to be starting materials, and the intermediate of the light emitting material is obtained with a series of simple reactions, and finally, the light emitting material is obtained with Ullmann reaction or Suzuki reaction, and the steps are simple and the production is high. 2. The light emitting material according to claim 1 , wherein Arand Arare the same.5. The manufacture method of the light emitting material according to claim 4 , wherein Arand Arare the same.9. The organic light emitting diode according to claim 8 , wherein Arand Arare the same. The present invention relates to a display technology field, and more particularly to a light emitting material, a manufacture method thereof and an organic light emitting diode using the light emitting material.The OLED (Organic Light-Emitting Diode) display, which is also named as the Organic light emitting display, is a new flat panel display device. Because it possesses advantages of simple manufacture process, low cost, low power consumption, high light emitting brightness, wide operating temperature range, thin volume, fast response speed, and being easy to achieve the color display and the large screen display, and being easy to achieve the match with the integrated circuit driver, and being easy to achieve the flexible display. ...

Light emitting material, manufacture method thereof and organic light emitting diode using the light emitting material

The present invention provides a light emitting material, a manufacture method thereof and an organic light emitting diode using the light emitting material. The structure is unitary, and the formula weight is determined, and the better solubility and film formation are provided, and the thin film status is stable; it possesses a very high decomposition temperature and a lower sublimation temperature, and is easy to sublime to be light emitting material of high purity, and can be applied for small molecule organic light emitting diode. In the manufacture method of the light emitting material according to the present invention, m-bromothiophenol and 4-Bromo-2-fluorobenzonitrile are employed to be starting materials, and the intermediate of the light emitting material is obtained with a series of simple reactions, and finally, the light emitting material is obtained with Ullmann reaction or Suzuki reaction, and the steps are simple and the production is high.

LIGHT EMITTING MATERIAL, MANUFACTURE METHOD THEREOF AND ORGANIC LIGHT EMITTING DIODE USING THE LIGHT EMITTING MATERIAL

The present invention provides a light emitting material, a manufacture method thereof and an organic light emitting diode using the light emitting material. The structure is unitary, and the formula weight is determined, and the better solubility and film formation are provided, and the thin film status is stable; it possesses a very high decomposition temperature and a lower sublimation temperature, and is easy to sublime to be light emitting material of high purity, and can be applied for small molecule organic light emitting diode. In the manufacture method of the light emitting material according to the present invention, m-bromothiophenol and 4-Bromo-2-fluorobenzonitrile are employed to be starting materials, and the intermediate of the light emitting material is obtained with a series of simple reactions, and finally, the light emitting material is obtained with Ullmann reaction or Suzuki reaction, and the steps are simple and the production is high. 2. The light emitting material according to claim 1 , wherein Arand Arare the same.5. The manufacture method of the light emitting material according to claim 4 , wherein Arand Arare the same.9. The organic light emitting diode according to claim 8 , wherein Arand Arare the same. The present invention relates to a display technology field, and more particularly to a light emitting material, a manufacture method thereof and an organic light emitting diode using the light emitting material.The OLED (Organic Light-Emitting Diode) display, which is also named as the Organic light emitting display, is a new flat panel display device. Because it possesses advantages of simple manufacture process, low cost, low power consumption, high light emitting brightness, wide operating temperature range, thin volume, fast response speed, and being easy to achieve the color display and the large screen display, and being easy to achieve the match with the integrated circuit driver, and being easy to achieve the flexible display. ...

LIGHT EMITTING MATERIAL, MANUFACTURE METHOD THEREOF AND ORGANIC LIGHT EMITTING DIODE USING THE LIGHT EMITTING MATERIAL

An organic light emitting diode includes a light emitting layer that includes a light emitting material of the constitutional formula 2. The light emitting diode according to claim 1 , wherein Arand Arare the same. This is a divisional application of co-pending U.S. patent application Ser. No. 15/122,410, filed on Aug. 30, 2016, which is a national stage of PCT Application No. PCT/CN2016/095615, filed on Aug. 17, 2016, claiming foreign priority of Chinese Patent Application No. 201610579646.9, filed on Jul. 20, 2016.The present invention relates to a display technology field, and more particularly to a light emitting material, a manufacture method thereof and an organic light emitting diode using the light emitting material.The OLED (Organic Light-Emitting Diode) display, which is also named as the Organic light emitting display, is a new flat panel display device. Because it possesses advantages of simple manufacture process, low cost, low power consumption, high light emitting brightness, wide operating temperature range, thin volume, fast response speed, and being easy to achieve the color display and the large screen display, and being easy to achieve the match with the integrated circuit driver, and being easy to achieve the flexible display. Therefore, it has the broad application prospects.The OLED display utilizes the organic light emitting diode for light emission. Thus, it is extremely important to improve the efficiency and lifetime of the organic light emitting diode. Now, the organic light emitting diode has already made considerable progress. With the fluorescence phosphorescence hybrid, the white light element with the simple structure and high efficiency can be obtained. The efficiency of such fluorescence phosphorescence hybrid element significantly relies on the efficiency of the fluorescence. Therefore, it still has vital significant meaning to develop the high efficiency fluorescence material.In comparison with polymer, the small molecule light ...

LIGHT EMITTING MATERIAL, MANUFACTURE METHOD THEREOF AND ORGANIC LIGHT EMITTING DIODE USING THE LIGHT EMITTING MATERIAL

A method for manufacturing a light emitting material of the constitutional formula 2. The method according to claim 1 , wherein Arand Arare the same. This is a divisional application of co-pending U.S. patent application Ser. No. 15/122,410, filed on Aug. 30, 2016, which is a national stage of PCT Application No. PCT/CN2016/095615, filed on Aug. 17, 2016, claiming foreign priority of Chinese Patent Application No. 201610579646.9, filed on Jul. 20, 2016.The present invention relates to a display technology field, and more particularly to a light emitting material, a manufacture method thereof and an organic light emitting diode using the light emitting material.The OLED (Organic Light-Emitting Diode) display, which is also named as the Organic light emitting display, is a new flat panel display device. Because it possesses advantages of simple manufacture process, low cost, low power consumption, high light emitting brightness, wide operating temperature range, thin volume, fast response speed, and being easy to achieve the color display and the large screen display, and being easy to achieve the match with the integrated circuit driver, and being easy to achieve the flexible display. Therefore, it has the broad application prospects.The OLED display utilizes the organic light emitting diode for light emission. Thus, it is extremely important to improve the efficiency and lifetime of the organic light emitting diode. Now, the organic light emitting diode has already made considerable progress. With the fluorescence phosphorescence hybrid, the white light element with the simple structure and high efficiency can be obtained. The efficiency of such fluorescence phosphorescence hybrid element significantly relies on the efficiency of the fluorescence. Therefore, it still has vital significant meaning to develop the high efficiency fluorescence material.In comparison with polymer, the small molecule light emitting molecule has the simple steps, the stable structure and ...

REAGENT FOR ENHANCING GENERATION OF CHEMICAL SPECIES

A reagent that enhances acid generation of a photoacid generator and composition containing such reagent is disclosed. 2. (canceled)3. The reagent according to claim 1 , wherein a reaction of the chemical species with a first compound or the precursor regenerates the chemical species.4. (canceled)5. (canceled)6. The reagent according to claim 1 , wherein the intermediate has a reducing character.7. The reagent according to claim 1 , wherein the intermediate is a radical.8. The reagent according to claim 1 , wherein the intermediate discharges at least one of a hydrogen atom and hydrogen ion that have reducing characters.9. The reagent according to claim 1 , wherein the intermediate is a ketyl radical.10. The reagent according to claim 1 , wherein the chemical species is acid.1114.-. (canceled)15. A composition claim 1 , comprising:{'claim-ref': {'@idref': 'CLM-00001', 'claim 1'}, 'the reagent according to ; and'}the precursor.16. The composition according to claim 15 , further comprising:the first compound.1724.-. (canceled)25. The reagent according to claim 1 , wherein Ris connected to Rthrough at least one bond.26. The reagent according to claim 1 , wherein at least one of Rand Ris an aromatic group.27. The reagent according to claim 1 , wherein the product is formed by oxidation of the intermediate.28. (canceled)29. The reagent according to claim 1 , wherein:the reagent further includes a second cyclic moiety; andthe first cyclic moiety contains at least two atoms which are also contained in the second cyclic moiety.30. (canceled)31. (canceled)32. The reagent according to claim 1 , wherein Ris one of an ester group claim 1 , alkyl group and tetrahydropyranyl group.3335.-. (canceled)36. A method for manufacturing a device claim 1 , the method comprising:{'claim-ref': {'@idref': 'CLM-00015', 'claim 15'}, 'applying a solution of the composition according to to a substrate such that a coating film including the composition is formed on the substrate;'}a first ...

POLYMERIZABLE PHOTOINITIATORS

A specific mixture of polymerizable photoinitiators contains a thioxanthone group. A method for manufacturing the mixture of polymerizable photoinitiators uses flow chemistry. 115-. (canceled)17. The mixture of photoinitiators according to claim 16 , wherein the polymerizable photoinitiator according to Formula (I) is present in an amount of at least 75 wt % and the polymerizable photoinitiator according to Formula (II) is present in an amount of 0.1 wt % to 20.0 wt % claim 16 , each based on a total weight of the polymerizable photoinitiators according to Formula (I) and (II).18. The mixture of photoinitiators according to claim 16 , wherein the mixture of photoinitiators consists of the polymerizable photoinitiator according to Formula (I) and the polymerizable photoinitiator according to Formula (II).19. A UV curable composition comprising:{'claim-ref': {'@idref': 'CLM-00016', 'claim 16'}, 'the mixture of photoinitiators according to ; and'}2-(2′-vinyloxyethoxy) ethylacrylate.20. The UV curable composition according to claim 19 , further comprising a colorant.21. The UV curable composition according to claim 19 , wherein the UV curable composition is a UV curable inkjet ink.23. The method of manufacturing according to claim 22 , wherein the solid catalyst particles consist essentially of pyridine-sulfonic acid.24. The method of manufacturing according to claim 22 , wherein no organic solvent is present in the reaction mixture.25. The method of manufacturing according to claim 22 , wherein the step of heating the reaction mixture includes:heating the reaction mixture to a temperature between 100° C. and 150° C. for less than 20 minutes.26. The method of manufacturing according to claim 22 , wherein the periodic flow is created by a pulsating in-line pump.27. The method of manufacturing according to claim 22 , wherein the channel includes multiple curvatures.28. The method of manufacturing according to claim 22 , wherein the periodic flow is performed at a ...

Photoactivators

Photoactivators comprise a photoactive moiety and a hydrophilic moiety. The photoactivators preferably comprise less than about 35%, by weight of the photoactivator, of the photoactive moiety. The photoactivators can be activated to a photo-excited state by excitation with incident radiation of a wavelength between about 350 nm and 750 nm, preferably between about 350 nm and about 420 nm. The photoactivators further encompass those having certain chemical formulations. 1. A photoactivator comprising:a) a photoactive moiety; andb) a hydrophilic moiety,wherein the photoactivator comprises less than about 35%, by weight, of the photoactive moiety.2. The photoactivator of claim 1 , wherein the photoactivator comprises less than about 15% claim 1 , by weight claim 1 , of the photoactive moiety.3. The photoactivator of claim 1 , wherein the photoactivator comprises less than about 2% claim 1 , by weight claim 1 , of the photoactive moiety.4. The photoactivator of claim 1 , wherein the photoactivator can be activated to a photo-excited state by excitation with incident radiation of a wavelength between about 350 nm and 750 nm5. The photoactivator of claim 1 , wherein the photoactivator can be activated to a photo-excited state by excitation with incident radiation of a wavelength between about 350 nm and about 420 nm.6. The photoactivator of claim 1 , wherein the photo-excited state of the photoactivator has an energy greater than about 100 kJ/mol more than a ground state of the photoactivator.7. The photoactivator of claim 1 , wherein the photoactive moiety is selected from the group consisting of 1 claim 1 ,1′-biphenyl-4 claim 1 ,4′-diamine claim 1 , 1 claim 1 ,1′-biphenyl-4-amine claim 1 , benzophenone claim 1 , 1 claim 1 ,1′-biphenyl-4 claim 1 ,4′-diol claim 1 , 1 claim 1 ,1′-biphenyl-4-amine claim 1 , 1 claim 1 ,1′-biphenyl-4-ol claim 1 , 1 claim 1 ,1′:2′ claim 1 ,1″-terphenyl claim 1 , 1 claim 1 ,1′:3′ claim 1 ,1″-terphenyl claim 1 , 1 claim 1 ,1′:4′ claim 1 ,1″:4″ ...

LIGHT EMITTING MATERIAL, MANUFACTURE METHOD THEREOF AND ORGANIC LIGHT EMITTING DIODE USING THE LIGHT EMITTING MATERIAL

The present invention provides a light emitting material, a manufacture method thereof and an organic light emitting diode using the light emitting material. The structure is unitary, and the formula weight is determined, and the better solubility and film formation are provided, and the thin film status is stable; it possesses a very high decomposition temperature and a lower sublimation temperature, and is easy to sublime to be light emitting material of high purity, and can be applied for small molecule organic light emitting diode. In the manufacture method of the light emitting material according to the present invention, p-bromothiophenol and 4-Bromo-2-fluorobenzonitrile are employed to be starting materials, and the intermediate of the light emitting material is obtained with a series of simple reactions, and finally, the light emitting material is obtained with Ullmann reaction or Suzuki reaction, and the steps are simple and the production is high. 2. The light emitting material according to claim 1 , wherein Arand Arare the same.5. The manufacture method of the light emitting material according to claim 4 , wherein Arand Arare the same.9. The organic light emitting diode according to claim 8 , wherein Arand Arare the same. The present invention relates to a display technology field, and more particularly to a light emitting material, a manufacture method thereof and an organic light emitting diode using the light emitting material.The OLED (Organic Light-Emitting Diode) display, which is also named as the Organic light emitting display, is a new flat panel display device. Because it possesses advantages of simple manufacture process, low cost, low power consumption, high light emitting brightness, wide operating temperature range, thin volume, fast response speed, and being easy to achieve the color display and the large screen display, and being easy to achieve the match with the integrated circuit driver, and being easy to achieve the flexible display. ...

Light emitting material, manufacture method thereof and organic light emitting diode using the light emitting material

The present invention provides a light emitting material, a manufacture method thereof and an organic light emitting diode using the light emitting material. The structure is unitary, and the formula weight is determined, and the better solubility and film formation are provided, and the thin film status is stable; it possesses a very high decomposition temperature and a lower sublimation temperature, and is easy to sublime to be light emitting material of high purity, and can be applied for small molecule organic light emitting diode. In the manufacture method of the light emitting material according to the present invention, p-bromothiophenol and 4-Bromo-2-fluorobenzonitrile are employed to be starting materials, and the intermediate of the light emitting material is obtained with a series of simple reactions, and finally, the light emitting material is obtained with Ullmann reaction or Suzuki reaction, and the steps are simple and the production is high.

LIGHT EMITTING MATERIAL, MANUFACTURE METHOD THEREOF AND ORGANIC LIGHT EMITTING DIODE USING THE LIGHT EMITTING MATERIAL

The present invention provides a light emitting material, a manufacture method thereof and an organic light emitting diode using the light emitting material. The structure is unitary, and the formula weight is determined, and the better solubility and film formation are provided, and the thin film status is stable; it possesses a very high decomposition temperature and a lower sublimation temperature, and is easy to sublime to be light emitting material of high purity, and can be applied for small molecule organic light emitting diode. In the manufacture method of the light emitting material according to the present invention, m-bromothiophenol and 4-Bromo-2-fluorobenzonitrile are employed to be starting materials, and the intermediate of the light emitting material is obtained with a series of simple reactions, and finally, the light emitting material is obtained with Ullmann reaction or Suzuki reaction, and the steps are simple and the production is high. 2. The light emitting material according to claim 1 , wherein Arand Arare the same.5. The manufacture method of the light emitting material according to claim 4 , wherein Arand Arare the same.9. The organic light emitting diode according to claim 8 , wherein Arand Arare the same. The present invention relates to a display technology field, and more particularly to a light emitting material, a manufacture method thereof and an organic light emitting diode using the light emitting material.The OLED (Organic Light-Emitting Diode) display, which is also named as the Organic light emitting display, is a new flat panel display device. Because it possesses advantages of simple manufacture process, low cost, low power consumption, high light emitting brightness, wide operating temperature range, thin volume, fast response speed, and being easy to achieve the color display and the large screen display, and being easy to achieve the match with the integrated circuit driver, and being easy to achieve the flexible display. ...

OXALIC ACID MONOAMIDE LIGAND, AND USES THEREOF IN COUPLING REACTION OF COPPER-CATALYZED ARYL HALOGEN SUBSTITUTE

The present invention provides oxalic amide ligands and uses thereof in copper-catalyzed coupling reaction of aryl halides. Specifically, the present invention provides a use of a compound represented by formula I, wherein definitions of each group are described in the specification. The compound represented by formula I can be used as a ligand in copper-catalyzed coupling reaction of aryl halides for the formation of C—N, C—O and C—S bonds. 3. The use of claim 1 , characterized in that R is selected from the group consisting of substituted or unsubstituted phenyl claim 1 , substituted or unsubstituted naphthyl claim 1 , substituted or unsubstituted benzyl claim 1 , C1-C4alkyl claim 1 , pyridyl claim 1 , and adamantyl;{'sub': 'a', 'Ris selected from (a) or (b)(a) OR′; wherein R′ is selected from the group consisting of substituted or unsubstituted C1-C6 alkyl; or{'sub': '2', '(b) N(R″); wherein each R″ is independently selected from the group consisting of H, substituted or unsubstituted C6-C20 aryl, substituted or unsubstituted 3- to 20-membered heteroaryl, substituted or unsubstituted C7-C25 alkyl-aryl, substituted or unsubstituted C1-C5 alkyl-3- to 20-membered heteroaryl, substituted or unsubstituted C3-C20 cycloalkyl, and substituted or unsubstituted 3- to 20-membered heterocyclic group; wherein the heteroaryl or heterocyclic group has 1 to 5 heteroatoms selected from the group consisting of N, O and S; the cycloalkyl or heterocyclic group may be a monocyclic, polycyclic, spiro or bridged ring structure.'}5. The method of wherein claim 4 , in the reaction claim 4 , the molar ratio of the ligand to the reactant of aryl halide is 1-50:100 claim 4 , and preferably 5-20:100; and/orthe molar ratio of the ligand to the copper catalyst is 1-5: 1, and preferably 1-2:1.7. The method of wherein the reaction temperature is 50-180° C. claim 4 , and preferably 100-130° C. The present invention relates to the field of organic synthesis. Specifically, the present invention ...

SUBSTITUTED THIOXANTHENONE AUTOPHAGY INHIBITORS

Autophagy inhibitors useful for the treatment of cancer and other diseases are described. The autophagy inhibitors are a compound of formula: I wherein Ris a group selected from lower alkyl, lower alkyl amide, lower alkyl ester, lower alkyl ketone, and lower alkyl ether; Rand Rare H or a group selected from cycloalkyl, lower alkyl, lower alkyl amide, lower alkyl ester, lower alkyl ketone, and lower alkyl ether; Ris a heteroaryl group; and L is a —(CH)—X—(CH)— group, wherein n is 1, 2, 3, or 4, X is absent, O, S, or N—R, wherein Ris H or a lower alkyl group, or a pharmaceutically acceptable salt thereof. 2. The compound of claim 1 , wherein the heteroaryl group is a quinolinyl claim 1 , pyridyl claim 1 , or substituted anthracenyl compound.3. The compound of claim 2 , wherein the anthracenyl compound is an anthracenyl dione or thioxantheninyl compound.5. The compound of claim 1 , wherein Ris lower alkyl.6. The compound of claim 1 , wherein L is —CH—CH—N(CH)—CH—CH—.9. The method of claim 8 , wherein the disease or condition is selected from the group consisting of cancer claim 8 , rheumatoid arthritis claim 8 , diabetes claim 8 , malaria claim 8 , schistosomiasis claim 8 , antiphospolipid antibody syndrome claim 8 , lupus claim 8 , chronic urticaria claim 8 , Sjogren's disease claim 8 , reperfusion injury claim 8 , and neurodegenerative diseases such as Huntington's disease claim 8 , Alzheimer's disease claim 8 , Parkinson's disease claim 8 , and amyotrophic lateral sclerosis.10. The method of claim 8 , wherein the disease or condition is cancer.11. The method of claim 10 , wherein the cancer is leukemia.12. The method of claim 10 , wherein the method further comprises administration of an additional anticancer agent.13. The method of claim 8 , wherein the heteroaryl group is a quinolinyl claim 8 , pyridyl claim 8 , or substituted anthracenyl compound.14. The method of claim 13 , wherein the substituted anthracenyl compound is an anthracenyl dione or thioxantheninyl ...

MECHANICAL OPENING OF LIPID BILAYERS BY MOLECULAR NANOMACHINES

Embodiments of the present disclosure pertain to methods of opening a lipid bilayer by associating the lipid bilayer with a molecule that includes a moving component capable of moving (e.g., rotating) in response to an external stimulus; and exposing the molecule to an external stimulus before, during or after associating the molecule with the lipid bilayer. The exposing causes the moving component of the molecule to move and thereby open the lipid bilayer (e.g., by pore formation). The external stimuli may include an energy source, such as ultraviolet light. The opened lipid bilayer may be a component of cell membranes in vitro or in vivo. The opening of the lipid bilayer may allow for the passage of various materials (e.g., active agents, such as peptide-based drugs) through the lipid bilayer and into cells. Additional embodiments of the present disclosure pertain to the aforementioned molecules for opening lipid bilayers. 1. A method of opening a lipid bilayer of a cell , wherein the method comprises: 'wherein the molecular motor comprises a moving component capable of moving in response to an external stimulus; and', 'associating the lipid bilayer with a molecular motor,'} wherein the exposing causes the moving component of the molecular motor to move, and', 'wherein the movement facilitates the opening of the lipid bilayer., 'exposing the molecular motor to an external stimulus,'}2. The method of claim 1 , wherein the exposing comprises exposure of the lipid bilayer to an energy source.3. The method of claim 2 , wherein the energy source is selected from the group consisting of ultraviolet light claim 2 , visible light claim 2 , near-infra red light claim 2 , a radio frequency energy source claim 2 , a magnetic field claim 2 , a two-photon energy source claim 2 , an electric field claim 2 , an electromagnetic field claim 2 , and combinations thereof.4. The method of claim 1 , wherein the moving of the moving component facilitates the opening of the lipid ...

Novel cationic photoinitiator and preparation method and use thereof

This invention discloses a novel cationic photoinitiator and a preparation method and use thereof. The cationic photoinitiator has a structure as represented by general formula (I) below. It can match a longer absorption wavelength in the process of application and has an outstanding photosensitive property, and has characteristics of no proneness to migration and good yellowing resistance.

LIGHT EMITTING MATERIAL, MANUFACTURE METHOD THEREOF AND ORGANIC LIGHT EMITTING DIODE USING THE LIGHT EMITTING MATERIAL

An organic light emitting diode includes a light emitting layer that includes a light emitting material of the constitutional formula 1wherein the light emitting layer comprises a light emitting material having the following constitutional formula:. An organic light emitting diode, comprising a substrate, an anode, a hole injection layer, a hole transporting layer, a light emitting layer, an electron transport layer, an electron injection layer and a cathode stacked in sequence on the substrate from bottom to top;wherein Arand Arare respectively selected from aromatic amine groups shown in formula (1), formula (2), formula (3), formula (4), formula (5), formula (6), formula (7);wherein the light emitting material is selected from following compound:and This is a divisional application of co-pending U.S. patent application Ser. No. 16/278,720, filed on Feb. 19, 2019, which is a divisional application of U.S. patent application Ser. No. 15/122,410, filed on Aug. 30, 2016 and now U.S. Pat. No. 10,280,365, which is a national stage of PCT Application No. PCT/CN2016/095615, filed on Aug. 17, 2016, claiming foreign priority of Chinese Patent Application No. 201610579646.9, filed on Jul. 20, 2016.The present invention relates to a display technology field, and more particularly to a light emitting material, a manufacture method thereof and an organic light emitting diode using the light emitting material.The OLED (Organic Light-Emitting Diode) display, which is also named as the Organic light emitting display, is a new flat panel display device. Because it possesses advantages of simple manufacture process, low cost, low power consumption, high light emitting brightness, wide operating temperature range, thin volume, fast response speed, and being easy to achieve the color display and the large screen display, and being easy to achieve the match with the integrated circuit driver, and being easy to achieve the flexible display. Therefore, it has the broad application ...

SYNTHESIS OF ACETAL COMPOUNDS

A process for the preparation of optionally asymmetric acetal compounds includes reacting a compound containing a hydroxyl group with a vinylether compound in the presence of a zwitterionic catalyst including at least one basic nitrogen containing structural fragment and at least one sulfonic acid group in its structure, with the proviso that a molar ratio of the basic nitrogen to sulfonic acid is 1:1 115-. (canceled)16. A process for preparation of optionally asymmetric acetal compounds , the process comprising the steps of:reacting a compound including a hydroxyl group with a vinylether compound in the presence of a zwitterionic catalyst that includes at least one basic nitrogen containing structural fragment and at least one sulfonic acid group; whereina molar ratio of the basic nitrogen to sulfonic acid is 1:1.17. The process according to claim 16 , wherein the at least one basic nitrogen containing structural fragment is selected from the group consisting of a substituted or unsubstituted pyridine group claim 16 , a quinoline group claim 16 , an isoquinoline group claim 16 , an imidazole group claim 16 , a benzimidazole group claim 16 , and an aniline group.18. The process according to claim 16 , wherein the vinylether compound includes at least one vinylether group and at least one other free radical polymerizable ethylenically unsaturated group selected from the group consisting of an acrylate group claim 16 , a methacrylate group claim 16 , an acrylamide group claim 16 , a methacrylamide group claim 16 , a styrene group claim 16 , a maleimide group claim 16 , a vinyl ester group claim 16 , a vinyl ether group claim 16 , an allyl ether group claim 16 , and an allyl ester group.19. The process according to claim 18 , wherein the at least one other free radical polymerizable ethylenically unsaturated group is an acrylate group.20. The process according to claim 16 , wherein the compound including a hydroxyl group is a photoreactive compound including a hydroxyl ...

Thioxanthone Derivatives, Composition Comprising the Same and Pattern Forming Method Comprising Said Composition

Latent photoinitiator compounds are described, as well as compositions containing such compounds and their uses in photoinitiated methods for producing photoresist structures. 2. (canceled)3. A compound according to claim 1 , wherein one of the aromatic rings is substituted with at least one substituent independently selected from hydroxy claim 1 , alkoxy claim 1 , benzyloxy claim 1 , alkylcarbonate claim 1 , hydroxyalkyl claim 1 , acetal claim 1 , ester claim 1 , oxyacetic acid and esters thereof claim 1 , aryloxy or arylthio claim 1 , and the other aromatic ring is unsubstituted.4. A compound according to claim 1 , wherein one aromatic ring is substituted with a single substituent selected from hydroxy claim 1 , alkoxy claim 1 , benzyloxy claim 1 , alkylcarbonate claim 1 , hydroxyalkyl claim 1 , acetal claim 1 , ester claim 1 , oxyacetic acid and esters thereof claim 1 , aryloxy or arylthio.5. A compound according to claim 1 , wherein one aromatic ring is substituted with two substituents independently selected from hydroxy claim 1 , alkoxy claim 1 , benzyloxy claim 1 , alkylcarbonate claim 1 , hydroxyalkyl claim 1 , acetal claim 1 , ester claim 1 , oxyacetic acid and esters thereof claim 1 , aryloxy or arylthio.6. A compound according to claim 1 , wherein one aromatic is substituted with three substituents independently selected from hydroxy claim 1 , alkoxy claim 1 , benzyloxy claim 1 , alkylcarbonate claim 1 , hydroxyalkyl claim 1 , acetal claim 1 , ester claim 1 , oxyacetic acid and esters thereof claim 1 , aryloxy or arylthio.7. A compound according to claim 1 , wherein the one aromatic substituted with four substituents independently selected from hydroxy claim 1 , alkoxy claim 1 , benzyloxy claim 1 , alkylcarbonate claim 1 , hydroxyalkyl claim 1 , acetal claim 1 , ester claim 1 , oxyacetic acid and esters thereof claim 1 , aryloxy or arylthio.8. A compound according to claim 1 , wherein each of the aromatic rings is substituted with at least one substituent ...

Materials for Electronic Devices

The invention relates to compounds with benzindenofluorene base bodies and to the use thereof in electronic devices, in particular in organic electroluminescent devices.

METHOD OF QUENCHING SINGLET AND TRIPLET EXCITED STATES OF PHOTODEGRADABLE PIGMENTS, SUCH AS PORPHYRIN COMPOUNDS, PARTICULARLY PROTOPORPHYRIN IX, WITH CONJUGATED FUSED TRICYCLIC COMPOUNDS HAVING ELECTRON WITHDRAWING GROUPS, TO REDUCE GENERATION OF SINGLET OXYGEN

A method of quenching excited state energy from a photodegradable pigment that has been excited by absorption of light having a wavelength in the wavelength range of 290-800 nm, comprising reacting a pigment with a conjugated fused tricyclic compound having electron withdrawing groups of Formula (II) or a salt thereof: 1. (canceled)526-. (canceled)28. The cosmetic or dermatological composition of claim 27 , wherein the compound of Formula IIb claim 27 , IIc claim 27 , IId claim 27 , IIe claim 27 , IIf claim 27 , IIg claim 27 , IIh claim 27 , IIi claim 27 , IIk claim 27 , IIl claim 27 , IIm claim 27 , IIn claim 27 , or a combination thereof claim 27 , is present in an amount of about 0.01% by weight to about 20% by weight claim 27 , based on the total weight of the composition.29. The cosmetic or dermatological composition of further comprising an additional photoactive compound selected from the group consisting of p-aminobenzoic acid and salts and derivatives thereof; anthranilate and derivatives thereof; salicylate and derivatives thereof; cinnamic acid and derivatives thereof; dihydroxycinnamic acid and derivatives thereof; camphor and salts and derivatives thereof; trihydroxycinnamic acid and derivatives thereof; dibenzalacetone naptholsulfonate and salts and derivatives thereof; benzalacetophenone naphtholsulfonate and salts and derivatives thereof; dihydroxy-naphthoic acid and salts thereof; o-hydroxydiphenyldisulfonate and salts and derivatives thereof; p-hydroxdydiphenyldisulfonate and salts and derivatives thereof; coumarin and derivatives thereof; diazole derivatives; quinine derivatives and salts thereof; quinoline derivatives; hydroxyl-substituted benzophenone derivatives; naphthalate derivatives; methoxy-substituted benzophenone derivatives; uric acid derivatives; vilouric acid derivatives; tannic acid and derivatives thereof; hydroquinone; benzophenone derivatives; 1 claim 27 , 3 claim 27 , 5-triazine derivatives; phenyldibenzimidazole tetrasulfonate ...

Leveler, leveler composition and method for electrodeposition of metals in microelectronics

The present application discloses a levelling compound for electrodepositing metals. The metal is of formula (II):

TRICYCLIC HETEROCYCLIC DERIVATIVES AND USES THEREOF

Disclosed are tricyclic heterocyclic compounds having kinase inhibitory activity, pharmaceutical compositions and kits comprising the compounds, and use of the compounds in the treatment of or in medicaments for the treatment of various diseases and conditions. In particular, disclosed are tricyclic heterocyclic compounds of the formula (I) having CSF-1R (c-FMS kinase) inhibitory activity and their use in the treatment of various diseases and conditions, such as those mediated by CSF-1R, including proliferative or neoplastic diseases and conditions, including cancers, and bone, inflammatory, and autoimmune diseases and conditions. 5. The compound of any one of the preceding claims , wherein X is NR , O , S , SO , or SO.6. The compound of any one of the preceding claims , wherein X is NR , O , or S.7. The compound of any one of the preceding claims , wherein X is O or S.9. The compound of any one of the preceding claims wherein:{'sup': 1', '2', '2', '2, 'sub': 2-6', '2-3', '2-3', '1-3', 'a', '1-3', 'b', '2-3', '1-3', 'a', '1-3', 'b', '1-3', 'a', '1-3', 'b', '2-3, 'Lis Calkylene, —Calkylene-J-Calkylene-*, —(Calkylene)-A-(Calkylene)-*, —Calkylene-J-(Calkylene)-A-(Calkylene)-*, or —(Calkylene)-A-(Calkylene)-J-Calkylene-*;'}{'sup': 2', '2, 'sub': 2-6', '2-3', '2-3, 'Lis Calkylene or —Calkylene-J-Calkylene-*;'}{'sup': 3', '2', '2, 'sub': 1-6', '2-6', '2-3', '1-3, 'Lis a bond, Calkylene, —Calkylene-J-*, or Calkylene-J-Calkylene-*;'}{'sup': 10', '2', '2', '2, 'sub': 1-6', '1-3', '2-3', '1-3', 'a', '1-3', 'b', '1-3', '1-3', 'a', '1-3', 'b', '1-3', 'a', '1-3', 'b', '2-3, 'Lis Calkylene, —Calkylene-J-Calkylene-*, —(Calkylene)-A-(Calkylene)-*, —Calkylene-J-(Calkylene)-A-(Calkylene)-*, or —(Calkylene)-A-(Calkylene)-J-Calkylene-*;'}{'sup': 20', '2, 'sub': 1-6', '1-3', '2-3, 'Lis Calkylene or —Calkylene-J-Calkylene-*;'}{'sup': 30', '2', '2, 'sub': 1-6', '1-6', '1-3', '1-3, 'Lis Calkylene, —Calkylene-J-*, or —Calkylene-J-Calkylene-*.'}10. The compound of any one of the preceding ...

SULFONIUM SALT, HEAT- OR PHOTO-ACID GENERATOR, HEAT- OR PHOTO-CURABLE COMPOSITION, AND CURED PRODUCT THEREOF

The sulfonium salt does not contain a toxic metal and exhibits higher cationic polymerization performance and crosslinking performance than a tetrakis(pentafluorophenyl)borate salt. The heat- or photo-acid generator contains the sulfonium salt. The sulfonium salt is formed of a sulfonium cation selected from a group represented by general formulas (1), (9), (10) and (11) described below and a gallate anion represented by formula (a). The heat- or photo-acid generator contains the sulfonium salt. The heat- or energy ray-curable composition contains the acid generator and a cationically polymerizable compound. A cured product can be obtained by curing the same. 2. The sulfonium salt according to claim 1 , wherein in formula (1) claim 1 , Ris a group represented by formula (4) claim 1 , n is 1 claim 1 , and in formula (4) claim 1 , mis 0.3. The sulfonium salt according to claim 1 , wherein in formula (9) claim 1 , Ris a 2-hydroxyethoxy group claim 1 , and mis 1.4. The sulfonium salt according to claim 1 , wherein in formula (10) claim 1 , L is —S— claim 1 , M is an optionally substituted aryl group claim 1 , and n is 3.5. The sulfonium salt according to claim 1 , wherein in general formula (10) claim 1 , M is a phenyl group substituted by an acetyl group.6. The sulfonium salt according to claim 1 , wherein in formula (11) claim 1 , Ris a methyl group claim 1 , Ris a naphthylbenzyl group claim 1 , and Ris a hydroxy group.7. The sulfonium salt according to claim 1 , wherein in formula (11) claim 1 , Ris a methyl group claim 1 , Ris a benzyl group claim 1 , and Ris a hydroxy group.8. The sulfonium salt according to claim 1 , wherein in formula (11) claim 1 , Ris a methyl group claim 1 , Ris a 4-nitrobenzyl group claim 1 , and Ris a hydroxy group.9. The sulfonium salt according to claim 1 , wherein in formula (11) claim 1 , Rand Rare a methyl group claim 1 , and Ris an acetoxy group.10. The sulfonium salt according to claim 1 , wherein in formula (a) claim 1 , Rto Rare a ...

SULFONIUM SALT, PHOTOACID GENERATOR, PHOTOCURABLE COMPOSITION, AND CURED PRODUCT THEREOF

A sulfonium salt is formed of a sulfonium cation selected from a group indicated by general formulas (1), (2), and (3) and a gallate anion represented by formula (a). A photoacid generator is characterized in that said sulfonium salt is contained therein. An energy-ray curable composition contains the acid generator and a cationic polymerizable compound. A cured product is formed by curing these substances. 2. The sulfonium salt according to claim 1 , wherein in general formula (1) claim 1 , Ris a group selected from an alkylcarbonyl group claim 1 , an aryl group claim 1 , a silyl group claim 1 , an arylcarbonyl group and an aryloxy group.3. The sulfonium salt according to claim 1 , wherein in general formula (1) claim 1 , Ris an aryl group or an alkylcarbonyl group.4. The sulfonium salt according to claim 1 , wherein in general formula (1) claim 1 , a is 1.5. The sulfonium salt according to claim 1 , wherein in general formula (1) claim 1 , a is 1 and b-d are 0.6. The sulfonium salt according to claim 1 , wherein in general formula (1) claim 1 , Rand Rare each independently a group selected from an alkylcarbonyl group claim 1 , an aryl group claim 1 , a silyl group claim 1 , an arylcarbonyl group and an aryloxy group claim 1 , a is 1 and c is 1.7. The sulfonium salt according to claim 1 , wherein in general formula (2) claim 1 , X is an optionally substituted thioxanthonyl group and Y is —S—.8. The sulfonium salt according to claim 7 , wherein in general formula (2) claim 7 , e claim 7 , f claim 7 , g and h are 0.9. The sulfonium salt according to claim 1 , wherein in general formula (3) claim 1 , n is 1 claim 1 , Q is —S— claim 1 , i is 0 claim 1 , j is 0 claim 1 , Ar is phenyl group.10. The sulfonium salt according to claim 1 , wherein in general formula (a) claim 1 , Rto Rare a phenyl group substituted at least one selected from the group consisting of a perfluoroalkyl group and fluorine atom.11. The sulfonium salt according to claim 1 , wherein in general ...

COMPOUND, COMPOSITION FOR FORMING ORGANIC FILM, SUBSTRATE FOR MANUFACTURING SEMICONDUCTOR APPARATUS, METHOD FOR FORMING ORGANIC FILM, AND PATTERNING PROCESS

A compound including two or more partial structures shown by the following general formula (1-1) in the molecule, 5. The composition for forming an organic film according to claim 3 , further comprising one or more components selected from the group consisting of (C) an acid generator claim 3 , (D) a surfactant claim 3 , (E) a compound having a partial structure of an aromatic ring other than the compound of the component (A) claim 3 , and (F) a plasticizer.6. The composition for forming an organic film according to claim 5 , wherein the component (E) has a weight average molecular weight of 500 to 100 claim 5 ,000.7. A substrate for manufacturing a semiconductor apparatus claim 3 , comprising a basis substrate and an organic film formed on the basis substrate claim 3 , the organic film being a cured material of the composition for forming an organic film according to .8. A method for forming an organic film applied in a semiconductor apparatus manufacturing process claim 3 , the method comprising:{'claim-ref': {'@idref': 'CLM-00003', 'claim 3'}, 'applying the composition for forming an organic film according to on a body to be processed by spin coating; and'}heating the body to be processed, on which the composition for forming an organic film has been applied, at a temperature of 50° C. or more and 600° C. or less for 5 to 7200 seconds in an inert gas atmosphere to form a cured film.9. A method for forming an organic film applied in a semiconductor apparatus manufacturing process claim 3 , the method comprising:{'claim-ref': {'@idref': 'CLM-00003', 'claim 3'}, 'applying the composition for forming an organic film according to on a body to be processed by spin coating;'}heating the body to be processed, on which the composition for forming an organic film has been applied, at a temperature of 50° C. or more and 300° C. or less for 5 to 600 seconds in air to form a coating film, andheating the body to be processed, on which the coating film has been formed, ...

Thioxanthone derivative photoinitiator

This invention relates to a thioxanthone derivative photoinitiator, a radiation curable composition comprising the same and the use thereof. In particular, the invention relates to thioxanthone derivative photoinitiator suitable to be in one drop filling process for manufacturing liquid crystal display device without the concern of liquid crystal contamination.

ACID- AND RADICAL-GENERATING AGENT AND METHOD FOR GENERATING ACID AND RADICAL

It is a subject of the present invention to provide an acid- and radical-generating agent which has high sensitivity to an active energy ray having a wavelength of around 300 to 450 nm, and can exert both high acid-generating performance and high radical-generating performance, and has heat resistance; and a method for generating an acid and a radical. 9. An acid- and radical-generating agent comprising the compound according to .10. The acid- and radical-generating agent according to claim 9 , wherein the acid- and radical-generating agent is the one generating an acid and a radical by irradiation of an active energy ray.11. A method for generating an acid and a radical claim 1 , which comprises irradiating an active energy ray onto the compound according to .12. The method for generating an acid and a radical according to claim 11 , wherein main wavelength of the active energy ray is 405 nm. The present invention relates to a compound useful as an acid-generating agent, a radical-generating agent, or the like, to be used in a resist field or the like, and for more detail, relates to a compound which has property to generate an acid and a radical by irradiation of an active energy ray having a wavelength of around 300 to 450 nm; an acid- and radical-generating agent comprising these; and a method for generating an acid and a radical.Conventionally, as a resist material to be used in a photolithography process, there has been known a resin composition containing a resin, which is changed to alkali-soluble by a reaction of a carboxylic acid derivative or a phenol derivative by an action of an acid, for example, a tert-butyl ester of a carboxylic acid, or a tert-butyl ether or a silyl ether of phenol or the like, and a photo-acid-generating agent. By irradiation of an active energy ray of, for example, UV-rays and the like onto such a resin composition to decompose the photo-acid-generating agent, and to generate a strong acid, and still more by carrying out post ...

Sulfonium salt, chemically amplified resist composition, and patterning process

A sulfonium salt having both anion and cation moieties in the molecule functions as a photoacid generator and is compatible with other components. A resist composition comprising the sulfonium salt has the advantages of reduced acid diffusion and forms a pattern with a good balance of sensitivity, MEF and DOF, less outgassing, and minimal defects.

Organic electroluminescent materials and devices

The present invention includes novel compounds containing heterocycles or azaheterocycles and hexaphenylbenzene or azahexaphenylbenzene. These compounds are useful as host materials for phosphorescent electroluminescent devices.

Bisoxime Ester Photoinitiator and Preparation Method and Use Thereof

A bisoxime ester photoinitiator as represented by general formula (I). By introducing a bisoxime ester group and a cycloalkylalkyl group into the chemical structure, this photoinitiator not only has excellent performance in aspects of storage stability, photosensitivity, developability, pattern integrity, and the like, but also exhibits obviously improved photosensitivity and thermal stability compared to similar photoinitiators. 2. The bisoxime ester photoinitiator according to claim 1 , characterized in that in R claim 1 , X is blank claim 1 , a single bond claim 1 , a methylene group claim 1 , an ethylene group claim 1 , or a propylene group; and Y is O claim 1 , S claim 1 , or a RN— group claim 1 , wherein Ris hydrogen or a C-Clinear or branched alkyl group.4. The bisoxime ester photoinitiator according to claim 1 , characterized in that Rrepresents a C-Clinear or branched alkyl group claim 1 , a C-Ccycloalkyl group claim 1 , a C-Ccycloalkylalkyl group claim 1 , a C-Calkylcycloalkyl group claim 1 , a C-Cheteroaryl group claim 1 , and a C-Caryl group claim 1 , and optionally claim 1 , hydrogen in the above groups may be substituted with a group selected from the group consisting of halogen claim 1 , a nitro group claim 1 , and an alkoxy group.7. The preparation method according to claim 6 , characterized in that said Z is selected from the group consisting of F claim 6 , Cl claim 6 , Br claim 6 , or I.8. The preparation method according to claim 6 , characterized in that the nitrite ester is selected from the group consisting of ethyl nitrite claim 6 , isopentyl nitrite claim 6 , or isooctyl nitrite claim 6 , and the nitrite salt is selected from the group consisting of sodium nitrite or potassium nitrite.9. Use of the bisoxime ester photoinitiator of in a photocurable composition. This invention pertains to the technical field of photoinitiators, and particularly to a bisoxime ester photoinitiator and a preparation method and a use thereof.The use of compounds ...

HIV REPLICATION INHIBITOR

The present invention provides a novel compound having an antiviral activity, in particular, an HIV replication inhibiting activity, as well as a pharmaceutical composition, in particular, an anti-HIV agent. 2: The compound according to or its pharmaceutically acceptable salt claim 1 , wherein Ris a hydrogen atom.3: The compound according to claim 1 , or its pharmaceutically acceptable salt claim 1 , wherein n is 1.4: The compound according to or its pharmaceutically acceptable salt claim 3 , wherein Ris substituted or unsubstituted alkyloxy claim 3 , or substituted or unsubstituted cycloalkyloxy.5: The compound according to or its pharmaceutically acceptable salt claim 1 , wherein ring A is monocyclic aromatic carbocycle claim 1 , monocyclic non-aromatic carbocycle claim 1 , monocyclic aromatic heterocycle or monocyclic non-aromatic heterocycle claim 1 ,{'sup': 'A', 'wherein the ring may be fused with another aromatic carbocycle, non-aromatic carbocycle, aromatic heterocycle, or non-aromatic heterocycle; the ring may form a spiro ring together with another aromatic carbocycle, non-aromatic carbocycle, aromatic heterocycle or non-aromatic heterocycle; two atoms constituting ring A which are not adjacent to each other may be cross-linked with alkylene, alkenylene or alkynylene; and/or, rings may be substituted with one or more of R;'}{'sup': A', 'A', 'A1, 'wherein Ris each independently, halogen, cyano, nitro, oxo, azide, trimethylsilyl or —X—R;'}{'sup': A', 'A2', 'A2', 'A2', 'A2', 'A2', 'A2', 'A2', 'A2', 'A2', 'A2', 'A3', 'A2', 'A2, 'sub': 2', '2', '2, 'Xis a single bond, —O—, —S—, —NR—, ═N—, —CO—, —SO—, —O—CO—, —CO—O—, —NR—CO—, —CO—NR—, —NR—CO—O—, —CO—O—NR—, —O—CO—NR—, —NR—O—CO—, —CO—NR—O—, —O—NR—CO—, —NR—CO—NR—, —NR—SO— or —SO—NR—;'}{'sup': A1', 'A', 'A1, 'Ris a hydrogen atom, substituted or unsubstituted alkyl, substituted or unsubstituted alkenyl, substituted or unsubstituted alkynyl, substituted or unsubstituted aromatic carbocyclyl, substituted or ...

POLYMERIC PHOTO ACTIVE AGENTS

The present disclosure is drawn to polymeric photo active agents, photo curable inks containing the polymeric photo active agents, and methods of making the photo curable inks. A polymeric photo active agent can include a xanthone analog modified with a polyether chain connecting to the xanthone analog through an amide linkage. 1. A polymeric photo active agent , comprising a xanthone analog modified with a polyether chain connecting to the xanthone analog through an amide linkage.2. The polymeric photo active agent of claim 1 , further comprising an additional xanthone analog moiety connecting to an opposite end of the polyether chain through an amide linkage.4. The polymeric photo active agent of claim 1 , wherein the polyether chain is selected from the group consisting of polyethylene glycol claim 1 , polypropylene glycol claim 1 , and a copolymer of polyethylene glycol and polypropylene glycol.6. The polymeric photo active agent of claim 1 , wherein the polymeric photo active agent has a molecular weight from about 500 Mw to about 5000 Mw8. The polymeric photo active agent of claim 1 , wherein the polymeric photo active agent is stable in water at a pH from 7 to 12.9. The polymeric photo active agent of claim 1 , wherein the polyether chain is derived from a polyethyleneoxy polypropyleneoxy chain portion of a polyethyleneoxy polypropyleneoxy amine.10. The polymeric photo active agent of claim 1 , wherein the polymeric photo active agent has a water solubility of at least 0.5 wt %.11. A photo curable ink claim 1 , comprising:a photo reactive binder;a polymeric photo active agent comprising a xanthone analog modified with a polyether chain connecting to the xanthone analog through an amide linkage;a co-photo initiator, a synergist, or combination thereof;a colorant; anda liquid vehicle including co-solvent and water.12. The photo curable ink of claim 11 , wherein the photo curable ink has a pH of 7 to 12 claim 11 , the polymeric photoactive agent is stable in the ...

ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE

The present invention provides an actinic ray-sensitive or radiation-sensitive resin composition which is capable of forming a pattern having a low LWR and is further suppressed in the collapse of the formed pattern, a resist film, a pattern forming method, and a method for manufacturing an electronic device. The actinic ray-sensitive or radiation-sensitive resin composition of the present invention contains a photoacid generator represented by General Formula (1) or a resin having a residue obtained by removing one hydrogen atom from the photoacid generator represented by General Formula (1). 4. The actinic ray-sensitive or radiation-sensitive resin composition according to claim 1 ,{'sub': '1', 'wherein Rrepresents an alkoxy group, an alkylthio group, a halogen atom, or a cyano group.'}6. The actinic ray-sensitive or radiation-sensitive resin composition according to claim 1 , further comprising a resin including a repeating unit having a group that decomposes by the action of an acid to generate an alkali-soluble group.7. The actinic ray-sensitive or radiation-sensitive resin composition according to claim 1 , further comprising an acid diffusion control agent.8. A resist film formed using the actinic ray-sensitive or radiation-sensitive resin composition according to .9. A pattern forming method comprising:{'claim-ref': {'@idref': 'CLM-00008', 'claim 8'}, 'a step of exposing the resist film according to ; and'}a step of developing the exposed resist film.10. The pattern forming method according to claim 9 ,wherein the exposure is liquid immersion exposure.11. A method for manufacturing an electronic device claim 9 , comprising the pattern forming method according to .13. The actinic ray-sensitive or radiation-sensitive resin composition according to claim 2 ,{'sub': '1', 'wherein Rrepresents an alkoxy group, an alkylthio group, a halogen atom, or a cyano group.'}14. The actinic ray-sensitive or radiation-sensitive resin composition according to claim 3 ,{'sub': ...

RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, COMPOUND, AND ACID GENERATOR

A resist composition containing a compound represented by the general formula (bd1-1), (bd1-2) or (bd1-3); in the formula, Rxto Rxrepresent a hydrocarbon group or a hydrogen atom or may be mutually bonded to form a ring structure; Ryto Ryrepresent a hydrocarbon group or a hydrogen atom or may be mutually bonded to form a ring structure, Rzto Rzrepresent a hydrocarbon group or a hydrogen atom or may be mutually bonded to form a ring structure. At least one of Rxto Rx, Ryto Ryand Rzto Rzhas an anion group, M represents a sulfonium cation having a sulfonyl group, Rto Reach independently represent a monovalent organic group; provided that at least one of Rto Ris an organic group having an acid dissociable group; and M represents an m-valent organic cation having an electron-withdrawing group. 2. The resist composition according to claim 1 ,{'sup': 1', '2', '3', '4, 'wherein at least one of Rxto Rxand at least one of Rxto Rxare mutually bonded to form a ring structure.'}5. The resist composition according to claim 1 ,{'sup': 1', '2, 'wherein Ryto Ryare mutually bonded to form a ring structure.'}6. The resist composition according to claim 3 ,{'sup': 7', '8, 'wherein Rxto Rxare mutually bonded to form a ring structure.'}7. The resist composition according to claim 1 ,{'sup': 1', '4, 'wherein two or more of Rzto Rzare mutually bonded to form a ring structure.'}8. The resist composition according to claim 1 ,{'sup': 1', '4, 'wherein at least one of Rzto Rzhas an anion group.'}9. The resist composition according to claim 3 ,{'sup': 5', '6, 'wherein at least one of Rxand Rxhas an anion group.'}10. The resist composition according to claim 1 ,{'sup': b2', 'b3, 'wherein the sulfonyl group that a cation represented by the general formula (ca-0) has is a bivalent sulfonyl group in which one carbon atom of a ring formed of Rto Rthat are mutually bonded to form a ring together with a sulfur atom in the formula is substituted.'}11. The resist composition according to claim 1 ,{'sub ...

ORGANIC ELECTROLUMINESCENT MATERIALS AND DEVICES

The present invention includes novel compounds containing deuterated or partially deuterated xanthene and thioxanthene structures. These compounds may be useful as host materials with high triplet energies for phosphorescent electroluminescent devices 2. The compound of claim 1 , wherein Rfor each CRis independently hydrogen claim 1 , or is independently selected from the group consisting of deuterium claim 1 , fluorine claim 1 , alkyl claim 1 , cycloalkyl claim 1 , heteroalkyl claim 1 , aryl claim 1 , heteroaryl claim 1 , nitrile claim 1 , isonitrile claim 1 , and combinations thereof.3. The compound of claim 1 , wherein Rand Rare independently selected from the group consisting of:deuterium;{'sub': 1', '6', '2', '2', '4, 'a C-Calkyl, which is partially or fully deuterated, α-Dalkyl, or α,β-CD-alkyl;'}{'sub': 1', '4', '1', '4, 'a phenyl, which is partially or fully deuterated, and optionally substituted with C-Calkyl or partially or fully deuterated C-Calkyl;'}{'sub': 5', '8', '2', '2', '4, 'a C-Ccyclolalkyl, which is partially or fully deuterated, α—CD-cycloalkyl, or α,β-CD-cycloalkyl; and'}{'sub': 5', '8', '2', '2', '4, 'a C-Cheteroaryl, which is partially or fully deuterated, α—CD-heteroaryl, or α,β-CD-heteroaryl.'}4. The compound of claim 1 , wherein Rand Rare independently selected from the group consisting of:{'sub': 1', '10', '2', '2', '4, 'a C-Csilyl, which is partially or fully deuterated, α—CDsilyl, or α,β-CD-silyl; and'}{'sub': 4', '8', '2', '2', '4, 'a C-Csilyl, which is α—CD-silyl, or α,β-CD-silyl, each of which includes an alkyl, cycloalkyl, or a heteroaryl.'}7. The compound of claim 1 , wherein E is O.8. The compound of claim 1 , wherein E is S.10. The compound of claim 1 , wherein D is C(CD) claim 1 , E is O; and each of Ato Ais CR claim 1 , and Ris selected from hydrogen or deuterium claim 1 , or one or two of Ato Ais CR claim 1 , and Ris phenyl or biphenyl claim 1 , each of which is optionally substituted with C-Calkyl claim 1 , which can be fully ...

SALT, QUENCHER, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN

Disclosed are a salt represented by formula (1), and a quencher and a resist composition comprising the same: 2. A quencher comprising the salt according to .3. A resist composition comprising the quencher according to claim 2 , a resin including a structural unit having an acid-labile group claim 2 , and an acid generator.7. The resist composition according to claim 3 , further comprising a salt generating an acid having an acidity lower than that of an acid generated from the acid generator.8. A method for producing a resist pattern claim 3 , which comprises:{'claim-ref': {'@idref': 'CLM-00003', 'claim 3'}, '(1) a step of applying the resist composition according to on a substrate,'}(2) a step of drying the applied composition to form a composition layer,(3) a step of exposing the composition layer,(4) a step of heating the exposed composition layer, and(5) a step of developing the heated composition layer. The present invention relates to a salt, a quencher and a resist composition comprising the salt, and a method for producing a resist pattern using the resist composition.Patent Document 1 mentions a resist composition comprising a salt of the following structural formula, a resin including a structural unit having an acid-labile group, and an acid generator.Patent Document 2 mentions a resist composition comprising a salt of the following structural formula, a resin including a structural unit having an acid-labile group, and an acid generator.Patent Document 1: JP 2017-202993 APatent Document 2: JP 2018-066985 AAn object of the present invention is to provide a salt capable of producing a resist pattern with pattern collapse margin (PCM) which is better than that of a resist pattern formed from the resist composition including the above-mentioned salts.The present invention includes the following inventions.[1] A salt represented by formula (I):wherein, in formula (I),R, Rand Reach independently represent a halogen atom, an alkyl fluoride group having 1 to 6 ...

Extreme Ultraviolet Photoresist and Method

Resist materials having enhanced sensitivity to radiation are disclosed herein, along with methods for lithography patterning that implement such resist materials. An exemplary resist material includes a polymer, a sensitizer, and a photo-acid generator (PAG). The sensitizer is configured to generate a secondary radiation in response to the radiation. The PAG is configured to generate acid in response to the radiation and the secondary radiation. The PAG includes a sulfonium cation having a first phenyl ring and a second phenyl ring, where the first phenyl ring is chemically bonded to the second phenyl ring. 1. A method comprising:forming a resist material over a material layer, wherein the resist material includes a polymer, a sensitizer, and a photo-acid generator (PAG) that includes a cation and an anion, wherein the cation of the PAG includes a sulfur chemically bonded to a first phenyl ring and a second phenyl ring, and further wherein the cation of the PAG further includes a chemical group that chemically bonds the first phenyl ring to the second phenyl ring;exposing the resist material to radiation and developing the resist material after the exposing to form a patterned resist material over the material layer; andperforming a fabrication process on the material layer using the patterned resist material as a mask.2. The method of claim 1 , wherein the performing the fabrication process on the material layer includes etching the material layer using the patterned resist material as an etch mask.3. The method of claim 2 , wherein the material layer is a hard mask layer and the etching the material layer using the patterned resist material as an etch mask forms a patterned hard mask claim 2 , the method further comprising etching another material layer using the patterned hard mask as an etch mask.4. The method of claim 1 , wherein the performing the fabrication process on the material layer includes performing an implantation process on the material layer using ...

PHOTOSTABLE MIMICS OF MACULAR PIGMENT

Described are visible light absorbing compounds. The compounds have a visible light absorption maximum between 430 and 480 nm and a full width half maximum (FWHM) at the visible light absorption maximum of at least 35 nm and up to 100 nanometers, wherein the compounds are photostable. The compounds substantially mimic the visible light absorbance properties of macular pigment while remaining photostable. The compounds may be used in a variety of articles, including ophthalmic devices. 1. A compound having a visible light absorption maximum between 430 and 480 nm and a full width half maximum (FWHM) at the visible light absorption maximum of at least 35 nm and up to 100 nanometers , wherein the compound is photostable (e.g. , when measured according to ICH guideline Q1B).2. The compound of wherein the visible light absorbance maximum is between 440 nm and 470 nm.3. The compound of wherein the FWHM at the visible light absorption maximum is at least 40 nm and up to 95 nm.4. The compound of wherein photostability comprises a loss of absorbance at the visible light absorption maximum of no more than 20 percent.5. A compound having a visible light absorption maximum between 430 and 480 nm and a full width half maximum (FWHM) at the visible light absorption maximum of at least 35 nm and up to 100 nanometers claim 1 , wherein the compound is more photostable than macular pigment (e.g. claim 1 , when measured according to ICH guideline Q1B).7. The compound of wherein EWG at each occurrence is independently cyano claim 6 , amide claim 6 , ester claim 6 , keto claim 6 , or aldehyde.8. The compound of wherein EWG at each occurrence is cyano.10. A compound according to that is:2-(9H-thioxanthen-9-ylidene)malononitrile; or2-((9-(dicyanomethylene)-9H-thioxanthen-2-yl)oxy)ethyl methacrylate.11. The compound of claim 6 , the compound having a visible light absorption maximum between 430 and 480 nm and a full width half maximum (FWHM) at the visible light absorption maximum of at ...

A PROCEDURE FOR PREPARING BENZOTIOPYRAN COMPOUNDS- (4, 3, 2-CD) INDAZOL

Preparation method of copolymerizable photoinitiators

An intermediate for preparing (meth)acrylated photoinitiators according to Formula (I): wherein: R1 is selected from the group consisting of hydrogen and a methyl group; A represents a group comprising at least one photoinitiating moiety; L represents a n+o-valent linking group comprising at least one carbon atom; n and o each independently represent an integer from 1 to 4; p is equal to 0 or 1; X represents a group selected from the group consisting of Cl, Br, I and R 2 SO 3 ; and R 2 represents an optionally substituted group selected from the group consisting of an alkyl group, an alkenyl group, an alkynyl group, an alkaryl group , an aralkyl group, an aryl group and a heteroaryl group. A method for the preparation of (meth)acrylated photoinitiators by β-elimination of HX from the intermediate according to Formula (I) is also disclosed.

Polymerizable photoinitiators and radiation curable compositions

A new type of polymerizable Norrish Type II photoinitiators having an optionally substituted benzophenone group or an optionally substituted thioxanthone group is disclosed exhibiting improved compatibility with and solubility in radiation curable compositions. Radiation curable compositions and inkjet inks containing these polymerizable Norrish Type II photoinitiators, exhibiting low extractable amounts of the photoinitiators and their residues after curing, are also disclosed.

Materials for electronic devices

The invention relates to compounds with benzindenofluorene base bodies and to the use thereof in electronic devices, in particular in organic electroluminescent devices.

Process for preparing aryl trifluoromethylsulfides

Trifluoromethylthiocopper, formed in situ by the reaction of bis-(trifluoromethylthio)mercury with copper, reacts with aromatic bromides and iodides to give aryl trifluoromethyl sulfides.

SALT, ACID GENERATOR, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN

Provided are a salt capable of producing a resist pattern with satisfactory CD Uniformity (CDU), an acid generator, and a resist composition. Disclosed are a salt represented by formula (I), an acid generator, and a resist composition: 2. The salt according to claim 1 , wherein Ais *—X-L- or *-L-X— claim 1 , Ais *—X-L- or *-L-X— claim 1 , and Ais *—X-L- or *-L-X— (X claim 1 , Xand Xeach independently represent —O— claim 1 , —CO— claim 1 , —S— or —SO— claim 1 , L claim 1 , Land Leach independently represent a hydrocarbon group having 1 to 19 carbon atoms claim 1 , the hydrocarbon group may have a substituent claim 1 , and * represents a bonding site to the benzene ring to which R claim 1 , Ror Rmay be bonded).3. The salt according to claim 2 , wherein X claim 2 , Xand Xare each independently —O— or —S—.4. The salt according to claim 2 , wherein L claim 2 , Land Lare each independently an alkanediyl group having 1 to 6 carbon atoms.5. The salt according to claim 1 , wherein when m4 claim 1 , m5 or m6 is an integer of 1 or more claim 1 , R claim 1 , Rand Rare each independently a fluorine atom claim 1 , an iodine atom claim 1 , a perfluoroalkyl group having 1 to 4 carbon atoms or an alkyl group having 1 to 4 carbon atoms (—CH— included in the alkyl group may be replaced by —O— or —CO—).6. The salt according to claim 1 , wherein when m7 claim 1 , m8 or m9 is an integer of 1 or more claim 1 , R claim 1 , Rand Rare each independently a fluorine atom claim 1 , an iodine atom claim 1 , a perfluoroalkyl group having 1 to 4 carbon atoms or an alkyl group having 1 to 4 carbon atoms (—CH— included in the alkyl group may be replaced by —O— or —CO—).7. The salt according to claim 1 , wherein AI is a sulfonic acid anion claim 1 , a sulfonylimide anion claim 1 , a sulfonylmethide anion or a carboxylic acid anion.9. An acid generator comprising the salt according to .10. A resist composition comprising the acid generator according to and a resin having an acid-labile group.13. The ...

Neue O-Acyloxim-Photostarter

Oximesterverbindungen der Formeln I, II, III und IV DOLLAR F1 worin DOLLAR A R¶1¶ Phenyl, C¶1¶-C¶20¶-Alkyl oder C¶2¶-C¶20¶-Alkyl, gegebenenfalls durch -O- unterbrochen, C¶2¶-C¶20¶-Alkanoyl oder Benzoyl, darestellt, oder R¶1¶ C¶2¶-C¶12¶-Alkoxycarbonyl oder Phenoxycarbonyl darstellt; R¶1¶' C¶2¶-C¶12¶-Alkoxycarbonyl darstellt oder R¶1¶' Phenoxycarbonyl darstellt, oder R¶1¶' -CONR¶10¶R¶11¶ oder CN darstellt; R¶2¶ C¶2¶-C¶12¶-Alkanoyl, C¶4¶-C¶6¶-Alkenoyl, Benzoyl, C¶2¶-C¶6¶-Alkoxycarbonyl oder Phenoxycarbonyl darstellt; R¶3¶, R¶4¶, R¶5¶, R¶6¶ und R¶7¶ Wasserstoff, Halogen, C¶1¶-C¶12¶-Alkyl, Cyclopentyl, Cyclohexyl, Phenyl, Benzyl, Benzoyl, C¶2¶-C¶12¶-Alkanoyl, C¶2¶-C¶12¶-Alkoxycarbonyl, Phenoxycarbonyl oder eine Gruppe OR¶8¶, SR¶9¶, SOR¶9¶, SO¶2¶R¶9¶ oder NR¶10¶R¶11¶ darstellen; R¶4¶', R¶5¶' und R¶6¶' Wasserstoff, Halogen, C¶1¶-C¶12¶-Alkyl, Cyclopentyl, Cyclohexyl, Phenyl, Benzyl, Benzoyl, C¶2¶-C¶12¶-Alkanoyl, C¶2¶-C¶12¶-Alkoxycarbonyl, Phenoxycarbonyl darstellen, oder eine Gruppe OR¶8¶, SR¶9¶, SOR¶9¶, SO¶2¶R¶9¶, NR¶10¶R¶11¶ darstellen; mit der Maßgabe, daß mindestens einer der Reste R¶3¶, R¶4¶, R¶5¶, R¶6¶, R¶7¶, R¶4¶', R¶5¶' und R¶6¶', OR¶8¶, SR¶9¶ oder NR¶10¶R¶11¶ darstellt; R¶8¶, R¶9¶, R¶10¶ und R¶11¶ beispielsweise Wasserstoff, C¶1¶-C¶12¶-Alkyl, Phenyl, darstellen, sind ferner als Starter für die Photopolymerisation von radikalisch polymerisierbaren Verbindungen geeignet.

New O-acyl oxime photoinitiator

Verbindungen der Formeln I, II, III und IV worin R 1 Phenyl, C 1 -C 12 -Alkyl darstellt; R 1 ' C 2 -C 4 -Alkoxycarbonyl oder Phenyl, das mit SR 9 substituiert ist, wobei ein 5- oder 6-gliedriger Ring über die Gruppe R 9 durch Herstellen einer Bindung an ein Kohlenstoffatom des Phenylrings, der die Gruppen R 4 ', R 5 ' und R 6 ' trägt, gebildet wird, darstellt; oder mindestens einer der Reste R 4 ' oder R 5 ' -SR 9 darstellt; R 2 C 2 -C 4 -Alkanoyl oder Benzoyl, das unsubstituiert oder mit einem oder mehreren C 1 -C 4 -Alkyl oder Halogen substituiert ist, darstellt; R 3 , R 6 und R 7 Wasserstoff darstellen; R 4 und R 5 unabhängig voneinander Wasserstoff oder eine Gruppe SR 9 oder NR 10 R 11 darstellen; R 4 ' und R 5 ' unabhängig voneinander Wasserstoff oder eine Gruppe SR 9 oder NR 10 R 11 darstellen; R 6 ' Wasserstoff darstellt; R 9 C 1 -C 4 -Alkyl, Phenyl oder eine Gruppe darstellt; R 10 und R 11 Methyl oder Ethyl darstellen oder R 10 und R 11 zusammen C 2 -C 6 -Alkylen, das... Compounds of the formulas I, II, III and IV wherein R 1 is phenyl, C 1 -C 12 alkyl; R 1 'is C 2 -C 4 alkoxycarbonyl or phenyl which is substituted by SR 9 , a 5- or 6-membered ring being via the group R 9 by forming a bond to a carbon atom of the phenyl ring containing the groups R 4 ' , R 5 'and R 6 ', is formed; or at least one of R 4 'or R 5 ' -SR 9 ; R 2 is C 2 -C 4 alkanoyl or benzoyl which is unsubstituted or substituted by one or more C 1 -C 4 alkyl or halogen; R 3 , R 6 and R 7 represent hydrogen; R 4 and R 5 independently represent hydrogen or a group SR 9 or NR 10 R 11 ; R 4 'and R 5 ' independently represent hydrogen or a group SR 9 or NR 10 R 11 ; R 6 'represents hydrogen; R 9 is C 1 -C 4 alkyl, phenyl or a group represents; R 10 and R 11 represent methyl or ethyl, or R 10 and R 11 together represent C 2 -C 6 -alkylene, the ...

Novel thioxanthones substituted by alpha-aminoalkyl groups

The novel thioxanthones of the formula I ##STR1## in which R 1 , R 2 , X and W are as defined in patent claim 1, are suitable, for example, for the preparation of photosensitive, compositions of matter which are capable of undergoing condensation or addition reactions and may or may not be crosslinkable, and which in turn are used for image formation, in particular by means of electroless deposition of metals. Such compositions of matter contain, for example, a thioxanthone of the formula I, an oligomer or polymer with terminal glycidyl groups and, where relevant, a crosslinking agent and/or a salt of a metal or group Ib or VIII of the Periodic Table.

New polymer photo initiators

FIELD: bioengineering. SUBSTANCE: polymer photo initiators include photo initiating fragments as lateral groups on a polymer skeleton. Described is the photo initiator that makes the copolymer of a monomer A with monomer B and monomer C, where: the monomer A is the monomer-photo initiator A of formula wherein: Pi is a photo initiating fragment composed of benzophenone or thioxanthone; Z is a linker fragment selected from an ordinary bond, optionally substituted C 1 -C 12 alkylene and the group -[O-(C 1 -C 12 alkylene)] n -; X 1 and X 2 are an optionally substituted C 1 -C 12 alkylene; where X 1 and X 2 or a part thereof can be bonded with each other or with Z to make one or several ring structures; where Z, X 1 and X 2 are selected so that N is a tertiary amine; W 1 and W 2 are alcohol groups; the monomer (B) includes at least two functional groups W 3 and W 4 . The said groups W 3 and W 4 are isocyanate groups where W 1 , W 2 , W 3 and W 4 are selected so that, at the copolymerisation of the monomers (A) and (B), W 1 reacts with W 3 to form an urethane fragment while W 2 reacts with W 4 to make an urethane fragment, the monomer (C) has the structure of formula W 5 -T-W 6 , where W 5 and W 6 are alcohol groups, and where T is selected from the group consisting of an optionally substituted C 1 -C 12 alkylene, optionally substituted C 1 -C 12 alkylene, optionally substituted C 3 -C 12 heterocyclil, optionally substituted aryl, optionally substituted diaryl, -[O-(C 1 -C 12 alkylene)] m -, -[S-(C 1 -C 12 alkylene)] m -, where m is the integer of 1 to 1000, and combinations thereof. Besides, this invention discloses the production of the polymer photo initiator including the stepwise copolymerisation of the monomer A with monomer B and monomer C, cross-linking of the said polymer photo initiator including subjecting of the latter to UV radiation and/or heating, and application thereof as the photo initiator of radical polymerisation. EFFECT: decreased or ruled out ...

Bimolecular photoinitiator systems

Photoinititator systems comprising (b1) at least one aromatic aldehyde; (b2) at least one tertiary amine compound and/or a quaternary ammonium salt of a tertiary amine compound; and (b3) optionally a sensitizer compound are suitable for the photo polymerization of ethylenically unsaturated monomeric or oligomeric polymerizable compounds; wherein the aromatic aldehyde is a compound of formula I (1), wherein R1 and R2 independently of each other are hydrogen, C1-C4alkyl, formyl, or OR6; R3, R4 and R5 for example are hydrogen, C1-Cl2alkyl, C3-C8cycloalkyl, halogen, C1-C8alkanoyl, OR6, NR7R8, SR9, SOR9, SO2R9; benzoyl; phenyl which optionally is substituted; or R1 and R3 together, or R3 and R5 together for example form a group b, g, h, k or p which is optionally substituted; provided that at least one of the residues R3, R4 and R5 is SR9, or that R1 and R3 together, or R3 and R5 together form a group a, b, c, d, e, f, g, h, j, k, m, n or o; R6 for example is hydrogen, C1-C18alkyl or phenyl; R7 and R8 for examples are hydrogen or C1-C12alkyl; R9 is for example hydrogen, C1-C24alkyl, phenyl which is optionally substituted; and R10 is for example hydrogen, C1-C12alkyl or phenyl.

Sulfonium salts, methods for their preparation and use thereof as photoinitiators for radiation curable systems

본 발명은 술포늄염, 이의 제조방법, 및 광개시제로서 이를 함유하는 방사선 경화성 조성물에 관한 것이다. The present invention relates to a sulfonium salt, a method for preparing the same, and a radiation curable composition containing the same as a photoinitiator.

锍盐及其制法和其作为辐射可固化体系的光引发剂的应用

本发明涉及锍盐，其制备方法和其作为辐射可固化组合物中光引发剂的应用。

Organic film forming composition, semiconductor device manufacturing substrate, organic film forming method and pattern forming method

1-[[2-(dilower alkylamino)alkyl]amino]-4-substituted thioxanthene-9-ones and pharmaceutical composition showing antitumor activity

FIELD: organic chemistry. SUBSTANCE: product: N-1-[2-(diethylamino)amino] -9-oxothioxanthene-4-yl-(methyl)-N- -ethylformamide, m. p. is 75-77 C. N-1-[2-(diethylamino)ethyl]-amino-9-oxothioxanthene-4-yl-(met- -hyl)-methylmethane-sulfonamide, m. p. is 175-177 C. Synthesized compounds were used for tumor treatment in mammalian. EFFECT: enhanced effectiveness of treatment. 15 cl, 4 tbl Д1У79%10сС ПЧ Го (19) 13) ВИ” 2 075 477 ^^ С1 ОМК С 070 335/16, А 61 К 31/38 РОССИЙСКОЕ АГЕНТСТВО ПО ПАТЕНТАМ И ТОВАРНЫМ ЗНАКАМ 12) ОПИСАНИЕ ИЗОБРЕТЕНИЯ К ПАТЕНТУ РОССИЙСКОЙ ФЕДЕРАЦИИ (21), (22) Заявка: 5052026/04, 09.06.1992 (71) Заявитель: Стерлинг Уинтроп Инк. (1$) (30) Приоритет: 10.06.1991 Ш$ 07/713173 13.02.1992 Ц$ 07/835159 (72) Изобретатель: Теодор Чарльз Миллер[Ц$], Джозеф Чарльз Коллинз[Ц$], Кеннет Чарльз (46) Дата публикации: 20.03.1997 Мэттс[Ч$], Марк Филип Вентланд[Ц$], Роберт Бруно Перни[Ц$], Томас Хьюгз Корбетт[Ч$] (56) Ссылки: Патент США М 4539412, кл. С 07 О 335/16, 1985. Патент США М 4582851, кл. С 07 (73) Патентообладатель: О 335/16, 1986. Патент ЕРВ М 152249, кл. С Стерлинг Уинтроп Инк. (ЦЗ) 070 335/16, 1985. (54) 1-/2-{ДИНИЗШИЙ АЛКИЛАМИНО)АЛКИЛ/АМИНО/-4-ЗАМЕЩЕННЫЕ ТИОКСАНТЕН-9-ОНЫ И ФАРМАЦЕВТИЧЕСКАЯ КОМПОЗИЦИЯ, ОБЛАДАЮЩАЯ ПРОТИВООПУХОЛЕВОИ АКТИВНОСТЬЮ (57) Реферат: . лформамид, т. пл. 75 - 775°С. Использование: для лечения опухолей у М-[[1-[2-(диэтиламино)этил]амино]-9-оксотиок млекопитающих ЖИВОТНЫХ. Продукт: сантен-4-ил] метил]-№-мет- М-И-[2-(диэтиламино)этил] илметансульфонамид, т.пл. 175 - 1775С. 2 с. амино]-Э-оксотиоксантен-4-ил]метил]-М-эти- и 13з. п. ф-пы, 4 табл. 2075477 С1 КО Д1У79%10сС ПЧ Го КУЗЗАМ АСЕМСУ ГОК РАТЕМТ$ АМО ТКАОЕМАКК$ 12) АВЗТКАСТ ОЕ 1МУЕМТОМ (19) ВИ” 2075 477. (51) 1пЕ. С1.6 13) Сл С 070 335/16, А 61 К 31/38 (21), (22) АррИсаНоп: 5052026/04, 09.06.1992 (30) Рпошу: 10.06.1991 0$ 07/713173 13.02.1992 Ц$ 07/835159 (46) Рае ог ричбИсаНоп: 20.03.1997 (71) АррИсапе: Зетта Читгор |пК. (1$) (72) пуетщог. — Теодог Сваг'; МШеги$], О7По7е{т Спаг!'х Ко|т ...

肟酯类化合物及其合成方法及应用

本发明提供一种具有通式Ⅰ所示结构的酰基肟酯结构的化合物，所述化合物具有良好的紫外吸收效果，该化合物具有溶解性好、热稳定性和感光活性高且毒性低的特点，应用性能明显优于同类产品，本发明还提供了一种制备所述酰基肟酯结构的化合物的合成方法，所述合成方法具有简单高效，生产过程中不产生污染性废弃物，且产品纯度高，适用于工业化生产的特点。

Thioxanthenone compounds and pharmaceutical compositions showing antitumor activity

FIELD: organic chemistry, pharmacy. SUBSTANCE: invention describes new thioxanthenone compounds of the general formula (I) where values R 1 ,R 2 ,R 8 , Q are given in p. 1 of the invention claim or their pharmaceutically acceptable acid-additive salts or solvates. Compounds of the formula (I) show an antitumor activity. Invention describes also the composition based on the above indicated activity. EFFECT: new compounds indicated above, antitumor activity. 21 cl, 8 tbl, 45 ex сбУзЗ$ гс ПЧ Го РОССИЙСКОЕ АГЕНТСТВО ПО ПАТЕНТАМ И ТОВАРНЫМ ЗНАКАМ (19) ВИ "” 2138 495 ' 13) СЛ 57 МК С 070 335/12, А 61 К 31/38 12) ОПИСАНИЕ ИЗОБРЕТЕНИЯ К ПАТЕНТУ РОССИЙСКОЙ ФЕДЕРАЦИИ (21), (22) Заявка: 94011565/04, 07.04.1994 (24) Дата начала действия патента: 07.04.1994 (30) Приоритет: 08.04.1993 1$ 044843 (46) Дата публикации: 21.09.1999 (71) Заявитель: Санофи (ЕК) (72) Изобретатель: Марк Филип Вентленд (Ц$), Роберт Бруно Перни (1$), Джозеф Вилльям Гайлс (ЦЗ) (73) Патентообладатель: < (56) Ссылки: ЕР 0330444 А2, 1989. ЗЦ 1121264 А, Санофи (ЕК) о 1984. 4$ 4571405 А, 1986. Ц$ 4539412 А, 1985. 4$ 4582851 А, 1986. (98) Адрес для переписки: > 103735, Москва, ул.Ильинка 5/2, Союзпатент, Патентному поверенному Лебедевой Н.Г. с <Р (54) ТИОКСАНТЕНОНОВЫЕ СОЕДИНЕНИЯ И ФАРМАЦЕВТИЧЕСКИЕ КОМПОЗИЦИИ, ОБЛАДАЮЩИЕ ПРОТИВООПУХОЛЕВОЙ АКТИВНОСТЬЮ со (57) Реферат: Соединения формулы // — обладают < Описываются новые тиоксантеноновые противоопухолевой активностью. = соединения общей Формулы //, где значения Описывается также композиция на основе В! В. В8. О, указаны в п.1 формулы, или их вышеуказанных соединений, обладающая с" фармацевтически приемлемые соли, противоопухолевой активностью. 5 с. и 16 кислотно-аддитивные соли или сольваты. з.п.ф-лы, 8 табл. — О сбУзЗ$ гс ПЧ Го КУЗЗАМ АСЕМСУ ГОК РАТЕМТ$ АМО ТКАОЕМАКК$ 12) АВЗТКАСТ ОЕ 1МУЕМТОМ (19) КО 2138 495' 9 С 070 335/12, А 61 К 31/38 13) СЛ (21), (22) АррИсаНоп: 94011565/04, 07.04.1994 (24) ЕНесНуе дае Гог ргорейу па: 07.04.1994 (30) Рпогйу: 08.04.1993 4$ ...

New compounds as anti-inflammatory, immunomodulating, and anti-proliferative agents

FIELD: organic chemistry, pharmaceuticals. SUBSTANCE: invention relates to compounds of general formula I and salt thereof, wherein F is non-aromatic ring system containing five carbon atoms and at least one double bond wherein one ring carbon atom is optionally substituted with X group, such as S, O, or SO 2 , and one or more ring carbon atoms are optionally substituted with R 1 ; D represents S, O, SO 2 , NR 4 , or CH 2 ; Z 1 and Z 2 are independently O; Y is steryl, mono- or polycyclic non-substituted ring system, containing one or more X group such as S, O, SO 2 , N; m, n, p, r and q = 0 or 1; meanings of the rest substituents are as defined in specification. Also invention relates to compounds of general formula I , wherein m, n, and q = 0; r = 1. Disclosed is pharmaceutical composition having inhibitory activity in relates to dihydroorotate dehydrogenase (DHODH) containing effective amount of said compound in free form or in form of pharmaceutically acceptable salts together with pharmaceutically acceptable diluents or carriers. Compounds of formula I are useful as drug inhibiting DHODH for treatment of disease or therapeutic condition in which inhibition of DHODH is beneficial. EFFECT: new compounds as anti-inflammatory, immunomodulating, and anti-proliferative agents. 13 cl, 1 tbl, 1 dwg, 76 ex ÐÎÑÑÈÉÑÊÀß ÔÅÄÅÐÀÖÈß (19) RU (11) 2 309 946 (13) C2 (51) ÌÏÊ C07C 233/60 C07C 233/58 C07C 233/59 C07C 233/62 C07C 255/60 ÔÅÄÅÐÀËÜÍÀß ÑËÓÆÁÀ C07D 335/12 ÏÎ ÈÍÒÅËËÅÊÒÓÀËÜÍÎÉ ÑÎÁÑÒÂÅÍÍÎÑÒÈ,C07D 333/38 ÏÀÒÅÍÒÀÌ È ÒÎÂÀÐÍÛÌ ÇÍÀÊÀÌ C07D 333/60 C07D 307/30 A61K 31/167 (12) (2006.01) (2006.01) (2006.01) (2006.01) (2006.01) (2006.01) (2006.01) (2006.01) (2006.01) (2006.01) A61K 31/341 (2006.01) A61K 31/381 (2006.01) ÎÏÈÑÀÍÈÅ ÈÇÎÁÐÅÒÅÍÈß Ê ÏÀÒÅÍÒÓ (21), (22) Çà âêà: 2004103741/04, 09.07.2002 (24) Äàòà íà÷àëà îòñ÷åòà ñðîêà äåéñòâè ïàòåíòà: 09.07.2002 (30) Êîíâåíöèîííûé ïðèîðèòåò: 10.07.2001 (ïï.1-13) EP PCT/EP01/07948 (43) Äàòà ïóáëèêàöèè çà âêè: 20.06.2005 2 3 0 9 9 4 6 R U (56) ...

Cell adhesion inhibitors

본 발명은 세포 유착과 세포 유착에 의해 매개되는 병리학적 증상을 억제 및 예방하는 데 유용한 신규 화합물에 관한 것이다. 또한, 본 발명은 이러한 화합물을 포함하는 약제 조성물과 이를 세포 유착 및 세포 유착에 의해 매개되는 병리학적 증상을 억제 및 예방하는 데 사용하는 방법에 관한 것이다. 본 발명의 화합물과 약제 조성물은 치료제 또는 예방제로서 사용할 수 있다. 이들은 다수의 염증성 질환과 자가 면역 질환을 치료하는 데 특히 적합하다. The present invention relates to novel compounds useful for inhibiting and preventing cell adhesion and pathological symptoms mediated by cell adhesion. The invention also relates to pharmaceutical compositions comprising such compounds and methods of using the same to inhibit and prevent cell adhesion and pathological symptoms mediated by cell adhesion. The compounds of the present invention and pharmaceutical compositions can be used as therapeutic or prophylactic agents. They are particularly suitable for treating many inflammatory diseases and autoimmune diseases.

肟酯光引发剂

本发明涉及式(I)和(II)的化合物，其中M 1 、M 2 和M 3 彼此独立地为无键、直接键、CO、O、S、SO、SO 2 或NR 14 ；条件是M 1 、M 2 或M 3 的至少一个为直接键、CO、O、S、SO、SO 2 或NR 14 ；M 4 是直接键、CR” 3 R” 4 、CS、O、S、SO或SO 2 ；Y是S或NR 18 ；R 1 例如为氢、C 3 -C 8 环烷基、苯基或萘基，该苯基或萘基均任选被取代；R 2 例如为C 1 -C 20 烷基；R” 2 具有对R 2 给出的含义之一；R 3 和R 4 例如为氢、卤素、C 1 -C 20 烷基；R’ 3 、R’ 4 、R” 3 和R” 4 彼此独立地具有对R 3 和R 4 给出的含义之一；R 5 是例如氢、卤素、C 1 -C 20 烷基；条件是在式(I)的化合物中，存在至少两个肟酯基团和条件是存在至少一个规定的取代基R 2 或R” 2 ；该化合物在光聚合反应中显示出非常好的性能。

레지스트 조성물 및 레지스트 패턴 형성 방법, 그리고, 화합물 및 산 발생제

일반식 (bd1-1), (bd1-2) 또는 (bd1-3) 으로 나타내는 화합물을 함유하는 레지스트 조성물. 식 중, Rx 1 ∼ Rx 4 는, 탄화수소기 혹은 수소 원자를 나타내거나, 또는 상호 결합하여 고리 구조를 형성하고 있어도 된다. Ry 1 ∼ Ry 2 는, 탄화수소기 혹은 수소 원자를 나타내거나, 또는 상호 결합하여 고리 구조를 형성하고 있어도 된다. Rz 1 ∼ Rz 4 는, 탄화수소기 혹은 수소 원자를 나타내거나, 또는 상호 결합하여 고리 구조를 형성하고 있어도 된다. Rx 1 ∼ Rx 4 , Ry 1 ∼ Ry 2 및 Rz 1 ∼ Rz 4 중 적어도 1 개는 아니온기를 갖는다. M 1 m＋ 는, 술포닐기를 갖는 술포늄 카티온을 나타낸다. R 001 ∼ R 003 은, 각각 독립적으로 1 가의 유기기를 나타낸다. 단, R 001 ∼ R 003 중, 적어도 1 개는 산 해리성기를 갖는 유기기이다. M 3 m＋ 는, 전자 구인성기를 갖는 m 가의 유기 카티온을 나타낸다. [화학식 1]

化合物、产酸剂、组合物、固化物及图案以及固化物及图案的制造方法

本发明的目的在于提供产酸灵敏度优异的化合物。本发明为下述通式(A)所表示的化合物。(式中，R 11 及R 20 分别独立地表示氢原子、碳原子数1～20的无取代或具有取代基的脂肪族烃基等、或者R 11 及R 20 键合而表示直接键合、‑S‑等，R 11 、R 12 、R 13 、R 14 、R 15 、R 16 、R 17 、R 18 、R 19 及R 20 中的1个以上为上述通式(1)所表示的基团，R 1 表示碳原子数1～20的无取代或具有取代基的脂肪族烃基等，R 2 表示氢原子、碳原子数1～20的无取代或具有取代基的脂肪族烃基等。)

用于增强化学物质产生的试剂

本发明公开了一种增强光酸产生剂的酸产生的试剂和含有所述试剂的组合物。

用作抗炎、免疫调节及抗增殖药剂的新化合物

本发明涉及用作抗炎、免疫调节及抗增殖药剂的通式(I)的化合物或其盐。

一种新型阳离子型光引发剂及其制备方法和应用

本发明公开一种具有如下通式(I)所示的新型阳离子型光引发剂，在应用过程中能够匹配更长的吸收波长，感光性能优异，且具有不易迁移、耐黄变的特点。

Compound, method for manufacturing the compound, and composition for forming organic film

본 발명은 공기 중에서의 뿐만 아니라, 불활성 가스 중에서의 성막 조건에서도 경화하고, 부생물이 발생하지 않으며, 내열성이나, 기판 상에 형성된 패턴의 매립이나 평탄화 특성이 우수할 뿐만 아니라, 기판 가공 시의 드라이 에칭 내성도 양호한 유기 하층막을 형성할 수 있는 화합물, 이 화합물의 제조 방법 및 이 화합물을 이용한 유기막 형성용 조성물을 제공한다. 상기 화합물은 하기 일반식(1-1)으로 표시되는 구조를 분자 내에 2개 이상 갖는 화합물이다. (식 중, Ar는 치환기를 갖더라도 좋은 방향환 또는 질소 원자 및 황 원자 중 1개 이상을 포함하는 방향환을 나타내고, 2개의 Ar끼리가 연결되어 고리 구조를 형성하여도 좋다. 파선은 Y와의 결합수이고, Y는 치환기를 갖더라도 좋은 방향환 또는 복소방향환을 가지며, 결합수가 방향환 구조 또는 복소방향환 구조에 있는, 탄소수가 6∼30개인 2가 또는 3가의 유기기이다. R은 수소 원자 또는 탄소수 1∼68의 1가의 기이다.) The present invention cures not only in air but also under the conditions of film formation in inert gas, does not generate by-products, has excellent heat resistance, excellent embedding and planarization characteristics of patterns formed on a substrate, and is dried during substrate processing. A compound capable of forming an organic underlayer film having good etching resistance, a method for producing the compound, and a composition for forming an organic film using the compound are provided. The compound is a compound having two or more structures represented by the following general formula (1-1) in the molecule. (Wherein, Ar represents an aromatic ring which may have a substituent or an aromatic ring containing at least one of a nitrogen atom and a sulfur atom, and two Ars may be connected to form a ring structure. is the number of bonds, Y is a divalent or trivalent organic group having 6 to 30 carbon atoms, having an aromatic ring or heteroaromatic ring which may have a substituent, and the number of bonds is in an aromatic ring structure or a heteroaromatic ring structure. It is a hydrogen atom or a monovalent group having 1 to 68 carbon atoms.)