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Небесная энциклопедия

Космические корабли и станции, автоматические КА и методы их проектирования, бортовые комплексы управления, системы и средства жизнеобеспечения, особенности технологии производства ракетно-космических систем

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Мониторинг СМИ

Мониторинг СМИ и социальных сетей. Сканирование интернета, новостных сайтов, специализированных контентных площадок на базе мессенджеров. Гибкие настройки фильтров и первоначальных источников.

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Поддерживает ввод нескольких поисковых фраз (по одной на строку). При поиске обеспечивает поддержку морфологии русского и английского языка
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Применить Всего найдено 5523. Отображено 100.
19-01-2012 дата публикации

Polyfunctional (meth)acrylic polymer, coating composition, process for producing a coating and coated article

Номер: US20120016071A1
Принадлежит: Evonik Roehm GmbH

The present invention relates to a (meth)acrylate polymer for preparing a coating composition, where the (meth)acrylate polymer comprises 0.5% to 20% by weight of units derived from (meth)acrylic monomers which in the alkyl radical have at least one double bond and 8 to 40 carbon atoms, 0.1% to 60% by weight of units derived from hydroxyl-containing monomers which have up to 9 carbon atoms, 0.1% to 95% by weight of units derived from (meth)acrylates having 1 to 12 carbon atoms in the alkyl radical, and 0.1% to 60% by weight of units derived from styrene monomers, based in each case on the weight of the (meth)acrylate polymer, and the (meth)acrylate polymer has a weight-average molecular weight in the range from 2000 to 60 000 g/mol. The present invention further relates to a coating composition and to a method of producing a coating. The present invention describes, furthermore, a coated article comprising a coating obtainable by the method.

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02-02-2012 дата публикации

Radiation-sensitive resin composition, method for forming resist pattern, polymer and compound

Номер: US20120028189A1
Автор: Mitsuo Sato, Yusuke Asano
Принадлежит: JSR Corp

A radiation-sensitive resin composition includes (A) a fluorine-containing compound that includes a group shown by the following formula (1), and (B) a photoacid generator. wherein R C represents a (p+1)-valent aromatic ring group, Q represents a linking group obtained by removing one hydrogen atom from a monovalent hydrophilic group, R E represents a hydrogen atom or a hydrocarbon group having 1 to 10 carbon atoms, p is an integer from 1 to 5, provided that a plurality of Q and a plurality of R E may respectively be either the same or different when p is an integer from 2 to 5, and “*” indicates a bonding hand.

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09-02-2012 дата публикации

Resist polymer and resist composition

Номер: US20120034561A1
Принадлежит: Mitsubishi Rayon Co Ltd

The resist polymer of the present invention comprises a specific constitutional unit having a cyano group, a constitutional unit having an acid-dissociable group, and a specific constitutional unit having a lactone skeleton. When the above polymer is used as a resist resin in DUV excimer laser lithography or electron beam lithography, it exhibits high sensitivity and high resolution, and provides a good resist pattern shape, having a small degree of occurrence of line edge roughness or generation of microgels.

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09-02-2012 дата публикации

Nanohybrid polymers for ophthalmic applications

Номер: US20120035337A1
Принадлежит: Key Medical Technologies Inc

The present invention relates to novel materials particularly useful for ophthalmic applications and methods for making and using the same. More particularly, the present invention relates to relatively soft, optically transparent, foldable, high refractive index Materials particularly suited for use in the production of intraocular lenses, contact lenses, and other ocular implants and to methods for manufacturing and using the same.

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05-04-2012 дата публикации

Radiation-sensitive resin composition, polymer and compound

Номер: US20120082934A1
Принадлежит: JSR Corp

[Problem] To reduce the time required for a film to exhibit decreased hydrophobicity after liquid immersion lithography while allowing the surface of a film to exhibit high hydrophobicity during liquid immersion lithography. [Solution] A radiation-sensitive resin composition including (A) a polymer that includes a repeating unit (a1) and a fluorine atom, and (B) a photoacid generator, the repeating unit (a1) including a group shown by any of the following formulas (1-1) to (1-3).

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24-05-2012 дата публикации

Sulfonium salt-containing polymer, resist composition, patterning process, and sulfonium salt monomer and making method

Номер: US20120129103A1
Принадлежит: Shin Etsu Chemical Co Ltd

A sulfonium salt having a 4-fluorophenyl group is introduced as recurring units into a polymer comprising hydroxyphenyl (meth)acrylate units and acid labile group-containing (meth)acrylate units to form a polymer which is useful as a base resin in a resist composition. The resist composition has a high sensitivity, high resolution and minimized LER.

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28-06-2012 дата публикации

Radiation-curable adhesive composition and adhesive sheet

Номер: US20120165489A1
Автор: Tomokazu Takahashi
Принадлежит: Nitto Denko Corp

A radiation-curable adhesive composition having a base polymer including structural units derived from a monomer A having a functional group a; a monomer B formed from a methacrylate monomer having an alkyl group that includes at least 10 and no more than 17 carbon atoms; and a monomer C that has both a functional group c that reacts with the functional group a and a polymerizable carbon-carbon double bond group, and a main chain of the base polymer is configured from the monomer B and the monomer A, the proportion of the monomer B being at least 50 wt % of the total monomers configuring the main chain; and the base polymer includes a polymerizable carbon-carbon double bond group in a side chain as a result of a portion of the functional group a in the monomer A reacting and bonding with the functional group c in the monomer C.

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02-08-2012 дата публикации

Method of making ophthalmic devices and components thereof from hydrophobic acrylic (ha) polymers with reduced or eliminated glistenings

Номер: US20120196951A1
Автор: Khalid Mentak
Принадлежит: Key Medical Technologies Inc

This invention relates to the fields of polymer chemistry, materials science and ophthalmology. More particularly it relates to optical components and method(s) of preparing same from hydrophobic acrylic (HA) monomer(s) that exhibit reduced or eliminated glistenings when implanted in a patient's eye. The method of this invention uses a mixture of one or more low temperature initiators (LTI) combined with one or more high temperature initiators (HTI), to polymerize one or more HA monomers to produce an optical HA polymer which, when used to manufacture an optical component and implanted as with an intraocular lens (IOL), exhibit reduced glistenings to the patient.

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11-10-2012 дата публикации

Radiation Curable Resin Composition, and Fingerprint-Resistant Resin Composition Containing Same

Номер: US20120258324A1

A radiation-curable base resin composition and a fingerprint-resistant resin composition including the same are provided. The radiation-curable base resin composition includes a multifunctional urethane (meth)acrylate having three or more functional groups at 3 to 35 parts by weight, a bifunctional urethane (meth)acrylate at 3 to 35 parts by weight, at least one (meth)acrylic acid ester monomer selected from a monofunctional (meth)acrylic acid ester monomer and a multifunctional (meth)acrylic acid ester monomer at 20 to 60 parts by weight and a radiation polymerization initiator at 0.1 to 15 parts by weight.

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08-11-2012 дата публикации

Immersion upper layer film forming composition and method of forming photoresist pattern

Номер: US20120282553A1
Принадлежит: JSR Corp

An immersion upper layer film composition includes a resin and a solvent. The resin forms a water-stable film during irradiation and is dissolved in a subsequent developer. The solvent contains a monovalent alcohol having 6 or less carbon atoms. The composition is to be applied to form a coat on a photoresist film in an immersion exposure process in which the photoresist film is irradiated through water provided between a lens and the photoresist film.

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14-02-2013 дата публикации

Adhesive composition, adhesive film including the same, method of preparing adhesive film, and display member using the same

Номер: US20130040123A1
Автор: Ik Hwan Cho, In Cheon Han
Принадлежит: Cheil Industries Inc

A UV curable adhesive composition includes a morpholine group-containing (meth)acrylic copolymer.

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28-03-2013 дата публикации

Novel thickening polymer for ionic oil phases free of monomers

Номер: US20130079420A1

A copolymer that includes for 100 mol %: a) more than 70 mol % and up to 99.9 mol % of hydrophobic monomer units (A) from stearyl methacrylate; and b) 0.1 mol % to 30 mol % of monomer units (B) from at least one monomer of a compound of formula (I) where R1 is a linear or branched alkyl radical comprising 12 to 22 carbon atoms, R2 is a hydrogen atom or a methyl radical, and n is an integer greater than or equal to 0 and lower than or equal to 30, wherein it is understood that said compound of formula (I) is not stearyl methacrylate. The invention also relates to a method for preparing and using same as a modifier of the rheology of the oil phase of a topical cosmetic, dermopharmaceutical, or pharmaceutical composition.

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18-04-2013 дата публикации

Ultraviolet light absorbing materials for intraocular lens and uses thereof

Номер: US20130096273A1
Принадлежит: Benz Research and Development Corp

A method for reducing the transmittance of ultraviolet radiation through an intraocular lens to 10% or less at 370 mm Additionally, a method for preventing the transmittance of at least 90% of ultraviolet radiation at 370 nm through a foldable intraocular lens comprising: (a) incorporating a monomer comprising a 4-(4,6-diphenyl-1,3,5-triazin-2-yl)-3-hydroxyphenoxy moiety into at least one polymer and (b) forming the polymer into a material suitable for use as an intraocular lens, wherein the monomer comprising a 4-(4,6-diphenyl-1,3,5-triazin-2-yl)-3-hydroxyphenoxy moiety comprises 0.10 to 0.15 weight percent of the overall dry polymer.

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23-05-2013 дата публикации

Liquid crystal display device and process for producing liquid crystal display device

Номер: US20130128204A1
Принадлежит: Sharp Corp

The present invention provides a liquid crystal display device in which image sticking seldom occurs. The liquid crystal display device according to the present invention includes a pair of substrates, and a liquid crystal layer disposed between the pair of substrates, wherein the liquid crystal layer includes a liquid crystal material having a negative dielectric constant anisotropy, at least one of the pair of substrates is provided with an alignment film for vertically aligning adjacent liquid crystal molecules, and a polymer layer formed on the alignment film for controlling the alignment of the adjacent liquid crystal molecules, and the polymer layer is formed by polymerization of at least one monomer, the polymerization being initiated by radicals generated of the monomer upon absorption of light.

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23-05-2013 дата публикации

Process for producing carboxyl-containing polymer composition, and carboxyl-containing poylmer compostion

Номер: US20130131299A1
Принадлежит: Sumitomo Seika Chemicals Co Ltd

A process is disclosed for producing a carboxyl-containing polymer composition that allows the possibility of obtaining a carboxyl-containing polymer composition which exhibits excellent dispersibility in water or the like, has a viscosity increasing to a lower degree compared to the viscosity of a neutralized viscous liquid using an additive-free carboxyl-containing polymer, and has a high degree of transparency in a neutralized viscous liquid thereof. A carboxyl-containing polymer composition is obtained by polymerizing a monomer containing an α,β-unsaturated carboxylic acid as a main component in a presence of a polyol (iso)stearic acid ester. A polyol in the polyol (iso)stearic acid ester is a polyol selected from a specific group, and the polyol (iso)stearic acid ester is used in the polymerization in an amount of 0.2 to 7 parts by mass based on 100 parts by mass of the α,β-unsaturated carboxylic acid.

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06-06-2013 дата публикации

Liquid resin composition and semiconductor device

Номер: US20130143983A1
Принадлежит: Sumitomo Bakelite Co Ltd

According to the invention, a liquid resin composition which has favorable wet spreadability after mounting of a chip and exhibits excellent solder cracking resistance even in a high-temperature solder reflow process at about 260° C., i.e., even when being used in lead-free solder, and a semiconductor package using the liquid resin composition are provided. In the liquid resin composition of the invention, an acrylic copolymer having a radical polymerizable functional group contains alkyl(meth)acrylate as a constituent monomer having a linear or branched alkyl group having 6 to 9 carbon atoms in an amount of 10 wt % to 40 wt % of the entire constituent monomers.

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20-06-2013 дата публикации

Resist composition, method of forming resist pattern, and polymeric compound

Номер: US20130157201A1
Принадлежит: Tokyo Ohka Kogyo Co Ltd

A resist composition containing a base component (A) which generates acid upon exposure, and exhibits changed solubility in a developing solution under the action of acid, wherein the base component (A) contains a polymeric compound (A1) having a structural unit (a5) represented by general formula (a5-0) shown below and a structural unit (a6) that generates acid upon exposure. In the formula, R represents a hydrogen atom, an alkyl group of 1 to 5 carbon atoms or a halogenated alkyl group of 1 to 5 carbon atoms, R 1 represents a sulfur atom or an oxygen atom, R 2 represents a single bond or a divalent linking group, and Y represents a hydrocarbon group in which a carbon atom or a hydrogen atom may be substituted with a substituent.

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05-09-2013 дата публикации

Transmission lubricant

Номер: US20130229016A1
Принадлежит: Evonik RohMax Additives GmbH

The present invention relates to a transmission lubricant comprising at least 30% by weight of polyalkyl (meth)acrylate. The present invention further describes polyalkyl (meth)acrylates for use in lubricants and also processes for preparing them and their use. The present lubricants can be used particularly in wind turbine transmissions.

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05-09-2013 дата публикации

Polymers and methods for ophthalmic applications

Номер: US20130231740A1
Автор: Khalid Mentak
Принадлежит: Key Medical Technologies Inc

The present invention relates to novel methods and materials particularly useful for ophthalmic applications and to methods for making and using the same. More particularly, the present invention relates to relatively soft, optically transparent, foldable, high refractive index materials particularly suited for use in the production of intraocular lenses, contact lenses, and other ocular implants and to methods for manufacturing and implanting IOLs made therefrom.

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03-10-2013 дата публикации

Radiation-sensitive resin composition, pattern-forming method, polymer, and compound

Номер: US20130260315A1
Принадлежит: JSR Corp

A radiation-sensitive resin composition includes a polymer component that includes one or more types of polymers, and a radiation-sensitive acid generator. At least one type of the polymer of the polymer component includes a first structural unit represented by a following formula (1). R 1 represents a hydrogen atom, a fluorine atom, a methyl group or a trifluoromethyl group. R 2 represents a linear alkyl group having 5 to 21 carbon atoms. Z represents a divalent alicyclic hydrocarbon group or an aliphatic heterocyclic group having a ring skeleton which has 4 to 20 atoms. A part or all of hydrogen atoms included in the alicyclic hydrocarbon group and the aliphatic heterocyclic group represented by Z are not substituted or substituted.

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17-10-2013 дата публикации

Acrylic pressure-sensitive adhesive composition and acrylic pressure-sensitive adhesive tape

Номер: US20130274419A1
Принадлежит: Nitto Denko Corp

An acrylic pressure-sensitive adhesive composition contains: an acrylic polymer (A); and a (meth)acrylic polymer (B) that includes, as a monomer unit, a (meth)acrylic monomer having a tricyclic or higher alicyclic structure and that has a weight average molecular weight of 1000 or more and less than 30000.

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31-10-2013 дата публикации

Cross-linked polymer particle for epoxy resin, epoxy resin composition, and epoxy cured material

Номер: US20130289211A1
Принадлежит: Mitsubishi Rayon Co Ltd

The invention discloses a cross-linked polymer particle for an epoxy resin, an epoxy resin composition containing the cross-linked polymer particle, the epoxy resin and a curing agent, and an epoxy cured material having qualities of colorless transparency and crack resistance as a result of curing the resin composition. The cross-linked polymer particle for the epoxy resin contains a (meth)acrylate monomer unit and a crosslinking monomer unit, wherein a volume average primary particle diameter is 0.5 to 10 μm, and a glass transition temperature of the monomer components excluding the crosslinking monomer is 30° C. or more by FOX formula calculation, and the refractivity at 23° C. is 1.490 to 1.510.

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05-12-2013 дата публикации

Salt-tolerant, thermally-stable rheology modifiers

Номер: US20130324443A1
Принадлежит: ISP Investments LLC

A salt-tolerant, thermally-stable rheology modifier and, in particular, a rheology modifier for applications in oil-field well-bore fluids. In accordance with one aspect, the rheology modifier comprises a terpolymer of acrylamide, 2-acrylamido-2-methyl-propanesulfonic acid (AMPS) and a long-chain alkyl acrylate wherein the terpolymer is prepared by dispersion polymerization.

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07-01-2021 дата публикации

Substrate-Free Adhesive Tape

Номер: US20210002524A1
Принадлежит: LG Chem Ltd

A substrate-free adhesive tape that is excellent in adhesive physical properties and is suitable for a continuous process is provided. The substrate-free adhesive tape includes a release film, and an adhesive layer provided on one surface of the release film and the adhesive layer containing a cured product of an adhesive composition, wherein when the release film is fixed on the outer surface of a semicircular tip part of a jig, the semicircular tip part having a radius of 22.5 mm, a breaking distance of the adhesive layer is 110 mm or less when the adhesive layer is stretched at a rate of 20 m/min from a semicircular center of the semicircular tip part toward an outermost direction of the semicircular tip part.

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12-01-2017 дата публикации

Monomer, polymer, positive resist composition, and patterning process

Номер: US20170008982A1
Принадлежит: Shin Etsu Chemical Co Ltd

A polymer comprising recurring units derived from a polymerizable monomer having two structures of hydroxyphenyl methacrylate having a hydroxy group substituted with an acid labile group is used as base resin in a positive resist composition, especially chemically amplified positive resist composition. The resist composition forms a resist film which is processed by lithography into a pattern of good profile having a high resolution, minimal edge roughness, and etch resistance.

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08-01-2015 дата публикации

Resist pattern-forming method and photoresist composition

Номер: US20150010866A1
Принадлежит: JSR Corp

A resist pattern-forming method includes forming a resist film using a photoresist composition. The resist film is exposed. The exposed resist film is developed. The photoresist composition includes an acid generator and a polymer. The acid generator generates a protonic acid upon application of exposure light. The protonic acid generates a proton. The polymer includes a first structural unit which includes a first group. The first group and the proton form a cationic group. The polymer substantially does not include a structural unit which includes an acid-labile group.

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16-01-2020 дата публикации

Wavelength conversion material, backlight unit, image display device, and curable composition

Номер: US20200017762A1
Принадлежит: Hitachi Chemical Co Ltd

A wavelength conversion material contains a cured product of a curable composition that contains a (meth)allyl compound, a (meth)acryl compound, a photopolymerization initiator, and a quantum dot phosphor.

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26-01-2017 дата публикации

Liquid crystal polymer composition, liquid crystal display and method for manufacturing the same

Номер: US20170023819A1
Принадлежит: LG Display Co Ltd

A liquid crystal polymer composition comprising a liquid crystal, acrylic monomers including an acrylic monomer group (A) including a cyclic ring and an acrylic monomer group (B) including a chain structure or a cyclohexanol, and a photo initiator.

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10-02-2022 дата публикации

MULTILAYER ADHESIVE TAPE

Номер: US20220041902A1
Принадлежит: TESA SE

Disclosed are powerful adhesive tapes, which rapidly coat rough and/or curved surfaces with different surface energies and thereby build up high adhesion. The adhesive joints formed in this way furthermore have good shear strength, even at elevated temperatures. Finally, enduring mechanical loading on the adhesive joints does not lead to the adhesive tape peeling from the surface. This is achieved with an adhesive tape comprising at least one foamed layer and at least one adhesive compound layer, wherein the adhesive compound layer contains at least one poly(meth)acrylate, and the poly(meth)acrylate is cross-linked with at least one covalent and at least one coordinative cross-linker. 1. An adhesive tape comprisingat least one foamed layer andat least one pressure-sensitive adhesive layer,where the pressure-sensitive adhesive layer comprises at least one poly(meth)acrylate and the poly(meth)acrylate is crosslinked with at least one covalent and at least one coordinative crosslinker.2. The adhesive tape as claimed in claim 1 , wherein the covalent crosslinker comprises at least one compound containing at least one cyclic ether function.3. The adhesive tape as claimed in claim 1 , wherein the coordinative crosslinker is selected from the group consisting of titanium dipropoxide bis(acetylacetonate) claim 1 , titanium dibutoxide bis(octylene glycolate) claim 1 , titanium dipropoxide bis(ethyl acetoacetate) claim 1 , titanium dipropoxide bis(lactate) claim 1 , titanium dipropoxide bis(triethanolaminate) claim 1 , titanium di-n-butoxide bis(triethanolaminate) claim 1 , titanium tri-n-butoxide monostearate claim 1 , butyl titanate dimer claim 1 , poly(titanium acetylacetonate) claim 1 , aluminum diisopropoxide monoethyl acetate claim 1 , aluminum di-n-butoxide monomethyl acetoacetate claim 1 , aluminum diisobutoxide monomethyl acetoacetate claim 1 , aluminum di-n-butoxide monoethyl acetoacetate claim 1 , aluminum di-sec-butoxide monoethyl acetoacetate claim 1 , aluminum ...

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04-02-2016 дата публикации

Moisture-curable reactive hot-melt adhesive agent composition

Номер: US20160032159A1
Принадлежит: Kaneka Corp

The present invention aims to provide a moisture-curable reactive hot-melt adhesive composition which contains no vinyl chloride resin, which is excellent in adhesion to oily steel sheets and electroplated steel sheets, which has high strength immediately after application to effectively improve the production cycle, and which can be suitably used in vehicle applications. This challenge is solved by a moisture-curable reactive hot-melt adhesive that includes an oxyalkylene polymer containing a reactive silyl group, an alkyl (meth)acrylate (co)polymer, a tackifying resin, and a specific inorganic filler in combination.

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01-02-2018 дата публикации

Monomer selection to prepare ultra high molecular weight drag reducer polymer

Номер: US20180030168A1
Принадлежит: LiquidPower Specialty Products Inc

The process begins by obtaining a first batch of monomers selected from a group of acrylates with a molecular weight equal to or less than butyl acrylate and/or methacrylate with a molecular weight equal to or less than butyl methacrylate. A second batch of monomers is then selected from a group of acrylates with a molecular weight greater than butyl acrylate and/or methacrylate with a molecular weight greater than butyl methacrylate. A mixture is then prepared by mixing the first batch of monomers and the second batch of monomers, wherein the second batch of monomers are greater than 50% by weight of the mixture. Finally, the mixture is polymerized to produce an ultra high molecular weight polymer.

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08-02-2018 дата публикации

Curable composition for imprints, cured product, pattern forming method, lithography method, pattern and lithography mask

Номер: US20180037688A1
Принадлежит: Fujifilm Corp

Provided are a curable composition for imprints which is capable of both improving releasability and suppressing occurrence of waviness during etching, as well as a cured product, a pattern forming method, a lithography method, a pattern, and a lithography mask, each of which uses the curable composition for imprints. The curable composition for imprints includes a monofunctional polymerizable compound, a polyfunctional polymerizable compound containing at least one of an alicyclic structure or an aromatic ring structure and having a viscosity at 25° C. of 150 mPa·s or less, and a photopolymerization initiator, in which the monofunctional polymerizable compound is contained in an amount of 5 to 30 mass % with respect to the total polymerizable compound in the curable composition for imprints, and the cured film of the curable composition for imprints has a modulus of elasticity of 3.5 GPa or less and a glass transition temperature of 90° C. or higher.

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09-02-2017 дата публикации

Compound, polymer compound, resist composition, and patterning process

Номер: US20170038683A1
Принадлежит: Shin Etsu Chemical Co Ltd

The present invention provides a compound shown by the formula (1), wherein R 1 represents a hydrogen atom, a fluorine atom, a methyl group, or a trifluoromethyl group; A represents a single bond or a linear divalent hydrocarbon group having 1 to 30 carbon atoms or a branched or cyclic divalent hydrocarbon group having 3 to 30 carbon atoms, in which the hydrocarbon group may contain a heteroatom, and a part or all of hydrogen atoms in the hydrocarbon group may be substituted with a group containing a heteroatom; “n” represents 0 or 1, provided that “n” is 0 when A is a single bond; and M + represents a cation. This compound is suitable as a raw material of a polymer compound usable for a base resin of a resist composition that has high resolution and high sensitivity and is excellent in balance of lithography properties such as LWR and CDU.

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03-03-2022 дата публикации

Radiation Curable Composition with Improved Mechanical Properties

Номер: US20220064442A1
Принадлежит:

The present disclosure relates to a radiation or radiation/moisture dual curable compositions based on (meth)acrylate polymers or (meth)acrylate- and silane-terminated polymers. The invention further relates to their use as an adhesive, sealant and/or coating material, and adhesive, sealant and/or coating materials comprising said curable composition thereof.

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13-02-2020 дата публикации

Dental materials using thermoset polymers

Номер: US20200046462A1
Принадлежит: Align Technology Inc

Provided herein are crosslinked polymers useful in orthodontic appliances and light polymerizable liquid compositions and formulations useful for making crosslinked polymers. Also provided are methods of making an orthodontic appliance comprising a cross-linked polymer formed by a direct fabrication technique.

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03-03-2022 дата публикации

Laminate, composition, and laminate forming kit

Номер: US20220066323A1
Принадлежит: FUJIFILM Corporation

Provided is a laminate that includes a base, an organic layer, a protective layer and a photo-sensitive layer in this order, the photo-sensitive layer contains an onium salt-type photo-acid generator that contains an anion moiety having a group with at least one ring structure selected from the group consisting of condensed ring structure, bridged ring structure and spiro ring structure, the photo-sensitive layer is intended for development with use of a developing solution, and the protective layer is intended for stripping with use of a stripping solution; and also provided are a composition used for forming the protective layer or the photo-sensitive layer contained in the laminate; and a laminate forming kit used for forming the laminate.

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25-02-2016 дата публикации

Salt, resin, resist composition and method for producing resist pattern

Номер: US20160052877A1
Принадлежит: Sumitomo Chemical Co Ltd

A salt represented by the formula (I); wherein Q 1 and Q 2 each independently represent a fluorine atom or a C 1 to C 6 perfluoroalkyl group, L b1 represents a single bond or a divalent C 1 to C 24 saturated hydrocarbon groupwhere a methylene group may be replaced by an oxygen atom or a carbonyl group and where a hydrogen atom may be replaced by a hydroxyl group or a fluorine atom, and Y represents a hydrogen atom, a fluorine atom, or an optionally substituted C 3 to C 18 alicyclic hydrocarbon groupwhere a methylene group may be replaced by an oxygen atom, a carbonyl group or a sulfonyl group; and Ar represents a divalent C 6 to C 20 aromatic hydrocarbon group, and Z + represents an organic sulfonium cation or an organic iodonium cation.

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25-02-2021 дата публикации

QUANTUM DOT DISPERSED RESIN MOLDED BODY, QUANTUM DOT DISPERSED COLLOID, AND LIGHT EMITTIONG DEVICE

Номер: US20210054266A1
Принадлежит:

Disclosed in the present disclosure are a quantum dot dispersed resin molded body, a quantum dot dispersed colloid, and a light emitting device. The quantum dot dispersed resin molded body includes quantum dots dispersed in an acrylate polymer, at least a portion of repeating units of the acrylate polymer comprise a C═C double bond, and the degree of polymerization n of the repeating units is greater than or equal to 2, the quantum dot dispersed resin molded body is formed by cross-linking and curing the quantum dot dispersed colloid. 1. A quantum dot dispersed resin molded body , comprising quantum dots dispersed in an acrylate polymer , wherein said quantum dot dispersed resin molded body being formed by cross-linking and curing a quantum dot dispersed colloid , and at least a portion of repeating units of said acrylic polymer comprise a C═C double bond , and a degree of polymerization n of said repeating units is greater than or equal to 2.2. A quantum dot dispersed colloid , comprising a dispersion medium and quantum dots dispersed in said dispersion medium , wherein said dispersion medium comprises: a functional acrylate resin , a non-functional acrylate prepolymer and a non-functional acrylate monomer; said functional acrylate resin is selected from at least one of a functional acrylate prepolymer and a functional acrylate monomer; a molecular chain of said functional acrylate prepolymer further comprises at least one C═C double bond in addition to an active functional allyl group; a molecular structure of said functional acrylate monomer further comprises at least one C═C double bond in addition to an active functional allyl group.3. The quantum dot dispersed colloid according to claim 2 , wherein said non-functional acrylate monomer comprises at least one of a monofunctional acrylate and a multifunctional acrylate;said monofunctional acrylate is selected from one or more of isobornyl (meth)acrylate, methyl (meth)acrylate, ethyl (meth)acrylate, n-butyl (meth) ...

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25-02-2021 дата публикации

PROTECTIVE FILM COMPOSITION AND METHOD OF MANUFACTURING SEMICONDUCTOR PACKAGE BY USING THE SAME

Номер: US20210057480A1
Принадлежит: DONGJIN SEMICHEM CO., LTD.

A protective film composition includes a polymer having the following formula: 2. The method according to claim 1 , wherein the semiconductor structure comprises an image sensor that comprises a sensor array region comprising a plurality of microlenses claim 1 , andthe forming of the protective film comprises:coating the protective film composition on the plurality of microlenses; andapplying heat to the protective film composition coated on the plurality of microlenses.3. The method according to claim 2 , wherein claim 2 , in the forming of the protective film claim 2 , the protective film is formed to have concave surfaces in direct contact with the plurality of microlenses.4. The method according to claim 1 , wherein the semiconductor structure comprises: an image sensor including a sensor array region comprising a plurality of microlenses; and a logic device arranged to vertically overlap the image sensor claim 1 , andwherein the forming of the protective film comprises coating the protective film composition on the plurality of microlenses.5. The method according to claim 1 , wherein the semiconductor structure comprises: an image sensor including a sensor array region comprising a plurality of microlenses; a logic device vertically overlapping the image sensor; and a memory device spaced apart from the image sensor with the logic device therebetween and vertically overlapping the image sensor claim 1 , andwherein the forming of the protective film comprises coating the protective film composition on the plurality of microlenses.6. The method according to claim 1 , further comprising:sawing the protective film and the semiconductor structure from a surface of the protective film.7. The method according to claim 1 , further comprising:sawing the protective film and the semiconductor structure from a surface of the protective film; andremoving the protective film by using an alkaline aqueous solution after the sawing of the protective film and the semiconductor ...

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10-03-2022 дата публикации

CURABLE RESIN COMPOSITION AND CURED PRODUCT THEREOF, AND METHOD FOR PRODUCING THREE-DIMENSIONAL SHAPED PRODUCT

Номер: US20220073725A1
Принадлежит:

To provide a low-viscosity curable resin composition capable of obtaining a cured product excellent in impact resistance. The curable resin composition contains core-shell type rubber particles, a radically polymerizable compound having one or more radically polymerizable functional groups in the molecule, and a radical polymerization initiator, and the core-shell type rubber particles have a core layer and a shell layer containing a polymer having an alicyclic hydrocarbon group in a side chain, and the radically polymerizable compound contains a radically polymerizable compound having a molecular weight of 500 or more in a ratio of 2 mass % to 70 mass %. 1. A curable resin composition comprisinga core-shell type rubber particle;a radically polymerizable compound having one or more radically polymerizable functional groups in the molecule;a radical polymerization initiator,wherein the core-shell type rubber particle has a core layer and a shell layer containing a polymer having an alicyclic hydrocarbon group in a side chain, andwherein the curable resin composition contains a radically polymerizable compound having a molecular weight of 500 or more in a ratio of 2 mass % or more and 70 mass % or less.2. The curable resin composition according to claim 1 , wherein the radically polymerizable compound contains less than 50 mass % of a (meth) acrylate compound having an alicyclic hydrocarbon group.3. The curable resin composition according to claim 1 , wherein the radically polymerizable compound having a molecular weight of 500 or more is a polyfunctional urethane (meth)acrylate having at least 2 (meth)acryloyl groups and at least 2 urethane groups.4. The curable resin composition according to claim 1 , wherein a content of the core-shell type rubber particle is 7 parts by mass or more and 65 parts by mass or less based on 100 parts by mass of the radically polymerizable compound.5. The curable resin composition according to claim 1 , wherein the core-shell type ...

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10-03-2022 дата публикации

PHOTOCURABLE COMPOSITION FOR THREE-DIMENSIONAL MOLDING, THREE-DIMENSIONAL MOLDED PRODUCT, AND METHOD FOR PRODUCING THREE-DIMENSIONAL MOLDED PRODUCT

Номер: US20220073753A1
Принадлежит: Denka Company Limited

A photocurable composition for three-dimensional modeling capable of high-speed modeling, a three-dimensional modeled object using the composition, and a method for producing the three-dimensional modeled object is provided. A photocurable composition for three-dimensional modeling, comprising a polymerizable organic compound component is provided. The photocurable composition has a steady flow viscosity of 30,000 mPa s or less measured with a rotary rheometer at 25° C. and a shear rate of 0.01 per second. When the photocurable composition for three-dimensional modeling is irradiated with a light having a light intensity of 1.3 mW/cm2, G′ becomes 1×10Pa or more after a start of photopolymerization in an integrated light irradiation time of 4 seconds or less. After the start of photopolymerization, a maximum value of tan δ on and after a gel point is 0.5 or more. The gel point is the point where G′=G″ is satisfied for the first time after the start of photopolymerization. G′ is a storage shear modulus, G′ is loss shear modulus, and tan δ is a loss tangent, each of which is calculated based on measurement data for 30 seconds per one measurement, measured with a rotary rheometer having a pair of parallel plate with a diameter of 10 mm and a measurement gap of 0.1 mm at a strain of 0.5% or less, a frequency of 0.1 Hz, and 25° C. 1. A photocurable composition for three-dimensional modeling , comprising a polymerizable organic compound component ,wherein:the photocurable composition has a steady flow viscosity of 30,000 mPa·s or less measured with a rotary rheometer at 25° C. and a shear rate of 0.01 per second,{'sup': 2', '6, 'when the photocurable composition for three-dimensional modeling is irradiated with a light having a light intensity of 1.3 mW/cm, G′ becomes 1×10Pa or more after a start of photopolymerization in an integrated light irradiation time of 4 seconds or less,'}after the start of photopolymerization, a maximum value of tan δ on and after a gel point is ...

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15-05-2014 дата публикации

Viscosity index improver, lubricant oil additive, and lubricant oil composition

Номер: US20140135243A1
Принадлежит: JX Nippon Oil and Energy Corp

A viscosity index improver of the present invention contains a star polymer obtained by a reaction of divinylbenzene with alkyl methacrylate containing stearyl methacrylate, the star polymer having a core part and an arm part, wherein the core part is derived from the divinylbenzene and the arm part is a polymer chain of the alkyl methacrylate. A lubricant oil additive and a lubricant oil composition of the present invention contain the above viscosity index improver.

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04-03-2021 дата публикации

Polymeric-inorganic nanoparticle compositions, manufacturing process thereof and their use as lubricant additives

Номер: US20210062106A1
Принадлежит: EVONIK OPERATIONS GMBH

The invention relates to polymeric-inorganic nanoparticle compositions and preparation processes thereof. The invention also relates to an additive and lubricant composition comprising these polymeric-inorganic nanoparticle compositions, as well as to the use of these polymeric-inorganic nanoparticle compositions in an oil lubricant formulation to improve tribological performance, in particular to improve anti-friction performance on metal parts.

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17-03-2022 дата публикации

CURABLE COMPOSITION

Номер: US20220081504A1
Принадлежит: NITTO SHINKO CORPORATION

Provided is, for example, a curable composition including: a curable compound having, in a molecule, a branched polyolefin structure, a (meth)acryloyl group, and an isocyanate group; and an alicyclic (meth)acrylate monomer having, in a molecule, a cycloalkyl structure and a (meth)acryloyl group. 1. A curable composition comprising:a curable compound having, in a molecule, a branched polyolefin structure, a (meth)acryloyl group, and an isocyanate group; andan alicyclic (meth)acrylate monomer having, in a molecule, a cycloalkyl structure and a (meth)acryloyl group.2. The curable composition according to claim 1 , whereinthe curable compound has neither a benzene ring structure nor a cycloalkyl structure in a molecule.3. The curable composition according to claim 1 , whereinthe branched polyolefin structure of the curable compound is a branched polybutene structure.4. The curable composition according to claim 1 , whereinthe alicyclic (meth)acrylate monomer has a norbornane structure.5. The curable composition according to claim 2 , whereinthe branched polyolefin structure of the curable compound is a branched polybutene structure.6. The curable composition according to claim 2 , whereinthe alicyclic (meth)acrylate monomer has a norbornane structure.7. The curable composition according to claim 3 , whereinthe alicyclic (meth)acrylate monomer has a norbornane structure. This application claims priority to Japanese Application Nos. 2019-003630, 2019-020657, and 2019-191320, the disclosure of which are incorporated herein by reference in their entirety.The present invention relates to a curable composition that cures by curing treatment such as irradiation with light.Conventionally, for example, known is a curable composition that includes a (meth)acrylate monomer having, in the molecule, a (meth)acryloyl group polymerized by being irradiated with ultraviolet rays, and a low molecular isocyanate compound having, in the molecule, two or more isocyanate groups. The curable ...

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17-03-2022 дата публикации

ENERGY RAY-CURABLE RESIN COMPOSITIONS AND ITS CURED PRODUCTS

Номер: US20220081571A1
Принадлежит:

A photocurable material formulation for a lost model that has a high elastic modulus, shows small thermal expansion, has heat resistance in a certain temperature region, and is free of a photoacid generator to be used in an epoxy material or the like. The formulation is a photocurable composition including curable materials formed of monofunctional (meth)acrylates each having a molecular weight of 150 or more and less than 350, and a bifunctional (meth)acrylate having a molecular weight of 200 or more and less than 400. 1. A photocurable composition comprising curable materials formed of monofunctional (meth)acrylates each having a molecular weight of 150 or more and less than 350 , and a bifunctional (meth)acrylate having a molecular weight of 200 or more and less than 400 ,wherein a content of the monofunctional (meth)acrylates is 80 mol % or more and 90 mol % or less of the curable materials, and the monofunctional (meth)acrylates are formed of a monofunctional (meth)acrylate having an alicyclic skeleton for forming a three-dimensional crosslinked structure and a monofunctional (meth)acrylate containing an alicyclic structure having an ether bond, orwherein the content of the monofunctional (meth)acrylates is 60 mol % or more and 75 mol % or less of the curable materials, and the monofunctional (meth)acrylates are formed of a monofunctional (meth)acrylate having an alicyclic skeleton and having quaternary carbon, and a monofunctional (meth)acrylate having a branched alkyl chain structure having 15 to 20 carbon atoms.2. The photocurable composition according to claim 1 ,wherein the content of the monofunctional (meth)acrylates is 80 mol % or more and 90 mol % or less of the curable materials, and the monofunctional (meth)acrylates are formed of the monofunctional (meth)acrylate having the alicyclic skeleton for forming the three-dimensional crosslinked structure and the monofunctional (meth)acrylate containing the alicyclic structure having the ether bond, ...

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29-05-2014 дата публикации

Polymers

Номер: US20140144070A1
Принадлежит: Infineum International Ltd

The present invention is a polymer having structural units, units of formula I, units of formula II and units of either formula IIIa or formula IIIb: The polymer improves the low-temperature properties of fuel oils from petroleum sources and especially from vegetable or animal sources.

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17-03-2022 дата публикации

LAMINATE, COMPOSITION, AND, LAMINATE FORMING KIT

Номер: US20220082941A1
Принадлежит: FUJIFILM Corporation

Provided are a laminate that includes a base, an organic layer, a protective layer and a photo-sensitive layer arranged in this order, the photo-sensitive layer containing a resin that contains a repeating unit having an acid-decomposable group represented by Formula (A1) below, the resin containing less than 10% by mass, relative to the total mass of the resin, of a repeating unit having a polar group, the photo-sensitive layer being intended for development with use of a developing solution, and the protective layer being intended for stripping with use of a stripping solution; a composition intended for use in forming the protective layer or the photo-sensitive layer contained in the laminate; and a laminate forming kit intended for use in forming the laminate: 2. The laminate of claim 1 , wherein the acid-decomposable group contains an aromatic structure.3. The laminate of claim 1 , wherein the acid-decomposable group contains a seven- or larger-membered monocyclic structure or an aromatic structure claim 1 , and claim 1 , at least one of R claim 1 , Ror Rrepresents an isopropyl group.4. The laminate of claim 1 , wherein the protective layer contains a water-soluble resin.6. The laminate of claim 1 , wherein the photo-sensitive layer further contains an onium salt-type photo-acid generator having a group that contains a cyclic structure claim 1 , or a nonionic photo-acid generator having a group that contains a cyclic structure.7. The laminate of claim 1 , wherein the development is of negative type.8. The laminate of claim 1 , wherein the developing solution contains 90 to 100% by mass claim 1 , relative to the total mass thereof claim 1 , of an organic solvent.9. A composition intended for use in forming the protective layer contained in the laminate described in .10. A composition intended for use in forming the photo-sensitive layer contained in the laminate described in claim 1 , the composition comprising:a resin that contains a repeating unit having an ...

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24-03-2022 дата публикации

Anaerobically Curable Compositions

Номер: US20220089920A1
Принадлежит: Henkel AG and Co KGaA

An anaerobically curable composition comprising:(a) a non-encapsulated liquid anaerobically curable monomer forming a liquid phase;(b) a solid component dispersed as a solid phase within the liquid phase formed by the non-encapsulated liquid anaerobically curable monomer;wherein the solid component has (meth)acrylate functionality and:(i) is in particulate form with the particles having a particle size in the range from about 80 μm to about 300 μm; and(ii) has a melting temperature of from about 50° C. to about 90° C.; and(c) a curing component for curing the anaerobically curable composition within the liquid phase.The anaerobically curable composition can easily be coated onto substrates such as threaded fasteners or other parts in its flowable form and then converted to anaerobically curable composition in solid form.

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24-03-2022 дата публикации

RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD OF FORMING RESIST PATTERN

Номер: US20220091507A1
Автор: Nishikori Katsuaki
Принадлежит: JSR Corporation

A radiation-sensitive resin composition includes: a polymer which has a first structural unit including a phenolic hydroxyl group, and a second structural unit represented by formula (1); and a radiation-sensitive acid generating agent which has a compound represented by formula (2), Rrepresents a hydrogen atom, or the like; Rrepresents a hydrogen atom or the like; and Rrepresents a divalent monocyclic alicyclic hydrocarbon group having 3 to 12 ring atoms. Arrepresents a group obtained by removing (q+1) hydrogen atoms on an aromatic ring from an arene formed by condensation of at least two benzene rings; Rrepresents a monovalent organic group having 1 to 20 carbon atoms; q is an integer of 0 to 7; and Rrepresents a halogen atom, a hydroxy group, a nitro group, or a monovalent organic group having 1 to 20 carbon atoms, or the like. 2. The radiation-sensitive resin composition according to claim 1 , wherein p in the formula (2) is 1.4. The radiation-sensitive resin composition according to claim 3 , wherein in the formula (2) claim 3 , in a case in which q is 1 claim 3 , Rrepresents a halogen atom claim 3 , a nitro group claim 3 , a monovalent unsubstituted hydrocarbon group having 1 to 20 carbon atoms claim 3 , or a monovalent hydrocarbon group having 1 to 20 carbon atoms in which a part or all of hydrogen atoms are substituted with a substituent claim 3 , and in a case in which q is no less than 2 claim 3 , a plurality of Rs are identical or different and each Rrepresents a halogen atom claim 3 , a nitro group claim 3 , a monovalent unsubstituted hydrocarbon group having 1 to 20 carbon atoms claim 3 , or a monovalent hydrocarbon group having 1 to 20 carbon atoms in which a part or all of hydrogen atoms are substituted with a substituent claim 3 , or at least two of the plurality of Rs taken together represent an alicyclic structure having 4 to 20 ring atoms or an aliphatic heterocyclic structure having 4 to 20 ring atoms claim 3 , together with the carbon chain to ...

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24-03-2016 дата публикации

Polyfunctional (meth)acrylate, and method for producing same

Номер: US20160083331A1
Принадлежит: Daicel Corp

Provided are: a multifunctional (meth)acrylate compound that has excellent curability and can form a polymer or cured product having hardness and durability at excellent levels; and a method for easily and selectively producing the multifunctional (meth)acrylate compound. The multifunctional (meth)acrylate compound according to the present invention is represented by Formula (1) below. In the formula, Ring Z 1 represents a tricyclo[5.2.1.0 2,6 ]decane ring, R is selected from a hydrogen atom and a methyl group, and n 1 and n 2 meet a condition that n 1 is 2 or 3 and n 2 is 1, or a condition that n 1 is 3 or 4 and n 2 is 0.

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18-03-2021 дата публикации

Solid electrolyte composition, solid electrolyte-containing sheet, all-solid state secondary battery, method of manufacturing solid electrolyte-containing sheet, and method of manufacturing all-solid state secondary battery

Номер: US20210083323A1
Автор: Tomonori Mimura
Принадлежит: Fujifilm Corp

Provided is a solid electrolyte composition including: an inorganic solid electrolyte having ion conductivity of a metal belonging to Group 1 or Group 2 in the periodic table; a binder including a polymer that includes a specific structural unit having 6 or more carbon atoms; and a dispersion medium. Provided are a solid electrolyte-containing sheet and an all-solid state secondary battery that include a layer formed of the composition, and method of manufacturing a solid electrolyte-containing sheet and an all-solid state secondary battery.

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22-03-2018 дата публикации

Resist composition and method of forming resist pattern

Номер: US20180081269A1
Принадлежит: Tokyo Ohka Kogyo Co Ltd

A resist composition including a polymeric compound having 0 to 20 mol % of a structural unit containing a polar group-containing aliphatic hydrocarbon group, and an acid generator compound represented by general formula (b1-1) in which R 101 represents a hydrocarbon group having at least 1 hydroxy group as a substituent; Y 101 represents a single bond or a divalent linking group containing an oxygen atom; V 101 represents a single bond, an alkylene group or a fluorinated alkylene group; R 102 represents a fluorine atom or a fluorinated alkyl group of 1 to 5 carbon atoms; M′ m+ represents an organic cation having a valency of m.

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31-03-2022 дата публикации

CURABLE COMPOSITION

Номер: US20220098345A1
Принадлежит:

A curable composition can comprise a polymerizable material including a monomer of Formula (1), with R being H or alkyl or alkylaryl, n being 1-4, m being 0-6, Xbeing C-Csubstituted or unsubstituted alkyl, Xbeing CHor H, 2. The curable composition of claim 1 , wherein the monomer of Formula (1) includes a di-functional acrylate monomer.4. The curable composition of claim 1 , wherein an amount of the monomer of Formula (1) is at least 5 wt % and not greater than 50 wt % based on the total weight of the curable composition.5. The curable composition of claim 1 , wherein an amount of the polymerizable material is at least 5 wt % and not greater than 98 wt % based on the total weight of the curable composition.6. The curable composition of claim 1 , wherein the polymerizable material comprises at least one second acrylate monomer different from the monomer of Formula (1).7. The curable composition of claim 6 , wherein the at least one second acrylate monomer includes benzyl acrylate (BA) claim 6 , or isobornyl acrylate (IBOA) claim 6 , or neopentyl glycol diacrylate (A-NPG) claim 6 , or any combination thereof.8. The curable composition of claim 1 , wherein the composition has a viscosity not greater than 20 mPa s.9. The curable composition of claim 8 , wherein the composition has a viscosity not greater than 15 mPa s.10. The curable composition of claim 1 , further comprising a photo-initiator.11. The curable composition of claim 1 , wherein the curable composition is adapted for use as a resist in a nanoimprint lithographic process.12. The curable composition of claim 1 , wherein an Ohnishi number of the curable composition after curing is not greater than 3.6.13. A laminate comprising a substrate and a cured layer overlying the substrate claim 1 , wherein the cured layer is formed from the curable composition of .14. The laminate of claim 13 , wherein the cured layer has an Ohnishi number of not greater than 3.6.16. The method of claim 15 , wherein a viscosity of the ...

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25-03-2021 дата публикации

Cosmetic

Номер: US20210085591A1
Принадлежит: Shiseido Co Ltd

A cosmetic includes a component (a) and (b): wherein component (a) is a polyacrylic acid or a salt thereof or poly(2-acrylamido-2-methylpropanesulfonic acid) or a salt thereof that has a weight-average molecular weight of 500,000 to 8,000,000, is linear, and has a thread length of 10 mm or less at room temperature when formed into a 1% by mass solution, wherein the thread length is a distance determined by: bringing a round disk having a diameter of about 1 cm uniformly and lightly into contact with a surface of the solution; lowering a container that contains the solution at a velocity of 5 mm/sec, and measuring the distance that the container descended until a thread of the solution is cut, and component (b) is a crosslinked water-swellable polymer having a crosslinking density of 0.01 to 1% by mole, or a microgel obtained by pulverizing a gel consisting of a hydrophilic compound having gelating ability.

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25-03-2021 дата публикации

PHOTOCURABLE COMPOSITION AND METHOD OF MANUFACTURING THREE-DIMENSIONAL OBJECT

Номер: US20210087315A1
Принадлежит:

A photocurable composition which can be used to manufacture a three-dimensional object that is formed by stacking a plurality of layers on top of each other, from which the three-dimensional object having excellent transparency, a high glass transition temperature, and a high hardness can be formed, and which exhibits a high curing rate. The photocurable composition is a photocurable composition used to manufacture a three-dimensional object that is formed by stacking a plurality of layers on top of each other. The photocurable composition contains a monofunctional monomer having a polycyclic aliphatic group, a polyfunctional monomer, an alcohol, and an acylphosphine oxide photopolymerization initiator. 1. A photocurable composition used to manufacture a three-dimensional object which is formed by stacking a plurality of layers on top of each other , the photocurable composition comprising:a monofunctional monomer having a polycyclic aliphatic group;a polyfunctional monomer;an alcohol; andan acylphosphine oxide photopolymerization initiator.3. The photocurable composition according to claim 1 , wherein the polyfunctional monomer has a density of at least 1.00.6. The photocurable composition according to claim 1 , wherein a weight ratio of the acylphosphine oxide photopolymerization initiator to the alcohol is 0.1-10.7. The photocurable composition according to claim 1 , wherein the photocurable composition has an internal transmittance per 1 cm thickness at 385 nm of less than 1% claim 1 , andwherein the three-dimensional object formed by using the photocurable composition has an internal transmittance per 1 cm thickness at 385 nm of at least 85%.8. The photocurable composition according to claim 1 , wherein the three-dimensional object is an optical member.9. A three-dimensional object-manufacturing method claim 1 , comprising:{'claim-ref': {'@idref': 'CLM-00001', 'claim 1'}, 'a step A of manufacturing a stacked object having a plurality of cured layers stacked on ...

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31-03-2016 дата публикации

Polymerizable composition, ink composition for ink-jet recording, method of ink-jet recording, and printed article

Номер: US20160090494A1
Автор: Shota Suzuki
Принадлежит: Fujifilm Corp

A polymerizable composition includes: a polymer compound; a polymerization initiator; and a polymerizable compound. The polymer compound contains at least one of a repeating unit represented by the following Formula (1) or a repeating unit represented by the following Formula (2). An ink composition for ink-jet recording includes the polymerizable composition. A method of ink jet recording and a printed article use the ink composition.

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21-03-2019 дата публикации

Rheology modifiers for encapsulating quantum dots

Номер: US20190085112A1

A polymer resin comprising: (a) quantum dots, (b) a compound of formula (I) (I) wherein R 1 is hydrogen or methyl and R 2 is a C 6 -C 20 aliphatic polycyclic substituent, and (c) a block or graft copolymer having Mn from 50,000 to 400,000 and comprising from 10 to 100 wt % polymerized units of styrene and from 0 to 90 wt % of a non-styrene block; wherein the non-styrene block has a van Krevelen solubility parameter from 15.0 to 17.5 (J/cm 3 ) 1/2 .

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05-05-2022 дата публикации

Fabrication of solid materials or films from a polymerizable liquid

Номер: US20220135721A1
Принадлежит: Molecule Corp

The disclosure describes a polymerizable liquid that includes a reactive oligomer and a reactive monomer. The polymerizable liquid is an energy polymerizable liquid hardenable by a single reaction mechanism forming a Photoplastic material. The disclosure further describes a method of producing the Photoplastic material and articles that can be made from the Photoplastic material.

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09-04-2015 дата публикации

Novel surfactant-free self-reversible reverse latex, and use of same as a thickening agent in a cosmetic composition

Номер: US20150098915A1
Автор: Olivier Braun, PAUL Mallo

Disclosed is a self-reversible reverse latex including: a) 25-80% by mass of a cross-linked anionic polyelectrolyte (P), resulting from the polymerisation, for 100 mole percent: i)—of a molar proportion 30% and 95% of monomeric units from at least one monomer including a free, partially- or totally-salified strong acid function; and ii)—of a molar proportion >0% and <5% of at least one monomer with diethylenic or polyethylenic crosslinking; b) 0.5-10% by mass of a terpolymer of stearyl methacrylate, pentacosaethoxylated behenyl methacrylate and N,N-dimethylacrylamide, resulting from the polymerisation, for 100 mole percent: of 80-95 mole percent of stearyl methacrylate, of 2.5-10 mole percent of N,N-dimethylacrylamide, and of 2.5-10 mole percent of pentacosaethoxylated behenyl methacrylate, c) 5-40% by mass of at least one oil, and d) 0.1-40% by mass of water; method of preparing same and use thereof as a thickener.

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12-05-2022 дата публикации

PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR FORMING RESIST PATTERN, AND METHOD FOR PRODUCING PLATED FORMED PRODUCT

Номер: US20220146932A1
Принадлежит: JSR Corporation

The present invention is a photosensitive resin composition including an alkali-soluble resin (A), a polymerizable compound (B), a photoradical polymerization initiator (C), and a solvent (D), in which the polymerizable compound (B) contains at least one kind (B1) selected from a compound represented by the following formula (1) and a compound represented by the following formula (3), having specific Rs, and a content ratio of the compound (B1) contained in the photosensitive resin composition is 15 to 50% by mass. The photosensitive resin composition of the present invention can form a thick-film resist pattern having excellent sensitivity and resolution, and by using the thick-film resist pattern, a plated formed product can be miniaturized. 2: The photosensitive resin composition according to claim 1 , wherein a content ratio of the compound (B1) to the total content of the alkali-soluble resin (A) and the polymerizable compound (B) is from 20 to 50% by mass.3: The photosensitive resin composition according to claim 1 , wherein a content ratio of the compound (B1) contained in the polymerizable compound (B) is from 50 to 100% by mass.4: The photosensitive resin composition according to claim 1 , wherein the polymerizable compound (B1) is a compound represented by the formula (1).5: A method for forming a resist pattern comprising:{'claim-ref': {'@idref': 'CLM-00001', 'claim 1'}, 'forming a resin-coated film by applying the photosensitive resin composition according to onto a substrate;'}exposing the resin-coated film; anddeveloping the exposed resin-coated film.6: A method for producing a plated formed product comprising performing plating treatment by using the resist pattern formed by the method for forming a resist pattern according to as a mask. The present invention relates to a photosensitive resin composition, a method for forming a resist pattern, and a method for producing a plated formed product.In recent years, since there has been an increasing demand ...

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08-04-2021 дата публикации

METHOD OF TREATING SUBSTRATE

Номер: US20210102020A1
Принадлежит: DAIKIN INDUSTRIES, LTD.

Provided are a fluorine-free soil resistant agent and a soil resistant treatment method which give excellent water-repellency and excellent antifouling property to a substrate, especially a carpet. The soil resistant agent contains () a fluorine-free copolymer having (a) a repeating unit formed from an acrylic monomer having a hydrocarbon group containing 7 to 40 carbon atoms, and (b) a repeating unit formed from an acrylic monomer having a hydrophilic group, and (2) water or a mixture of water and an organic solvent dispersing the fluorine-free copolymer (1). A method of treating the substrate, includes applying the soil resistant agent to the substrate. 1. A method of treating a substrate , comprising applying a soil resistant agent to the substrate ,wherein the soil resistant agent comprises: (a) a repeating unit formed from an acrylic monomer having a hydrocarbon group containing 7 to 40 carbon atoms, and', '(b) a repeating unit formed from acrylic monomer having a hydrophilic group, and, '(1) a fluorine-free copolymer comprising(2) water or a mixture of water and an organic solvent dispersing the fluorine-free copolymer (1).3. The method according to claim 1 , wherein the hydrocarbon group-containing acrylic monomer (a) is: {'br': None, 'sub': '2', 'sup': 4', '2', '2, 'CH═C(—X)—C(═O)—Y—R'}, '(a1) an acrylic monomer represented by the formula{'sup': '2', 'claim-text': [{'sup': '4', 'Xis a hydrogen atom, a monovalent organic group or a halogen atom excluding a fluorine atom, and'}, {'sup': '2', 'Yis —O— or —NH—, and/or'}], 'wherein Ris a hydrocarbon group having 7 to 40 carbon atoms,'} {'br': None, 'sub': 2', 'n, 'sup': 5', '3', '4', '3, 'CH═C(—X)—C(═O)—Y—Z(—Y—R)'}, '(a2) an acrylic monomer represented by the formula{'sup': '3', 'claim-text': [{'sup': '5', 'Xis a hydrogen atom, a monovalent organic group or a halogen atom excluding a fluorine atom,'}, {'sup': '3', 'Yis —O— or —NH—,'}, {'sup': '4', 'sub': '2', 'Yeach is independently a direct bond, or a group ...

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03-07-2014 дата публикации

Radiation-sensitive resin composition, polymer, compound, and method for producing compound

Номер: US20140186771A1
Автор: Hayato Namai
Принадлежит: JSR Corp

A radiation-sensitive resin composition includes a polymer that includes a structural unit represented by a formula (1), and an acid generator. R 1 is a hydrogen atom, a fluorine atom, or the like. R 2 is a hydrogen atom or a monovalent hydrocarbon group. R 3 is a hydrogen atom, a monovalent chain hydrocarbon group, or the like. R 4 is a hydrogen atom, a monovalent chain hydrocarbon group, or the like. R 5 is a hydrogen atom, a monovalent chain hydrocarbon group, or the like. R 6 is a monovalent chain hydrocarbon group. R 6 is bonded to R 3 to form a first alicyclic structure, or R 6 is bonded to R 5 to form a second alicyclic structure. At least one hydrogen atom of R 2 , R 3 , or R 4 is optionally substituted with a fluorine atom.

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03-07-2014 дата публикации

Adhesion improver for amine curing epoxy resin paint

Номер: US20140187670A1
Автор: Junpei Suetou, Tomoko Ooya
Принадлежит: Kusumoto Chemicals Ltd

An adhesion improver for amine curing epoxy resin paint which, when added in a small amount to amine curing epoxy resin paint, is capable of preventing the inhibition of adhesion caused by amine blushing and of giving good interlayer adhesion is provided. This adhesion improver is a composition which contains a polymer obtained by the polymerization of (A) acrylic acid ester and/or methacrylic acid ester which has a formula as follows: wherein R 1 denotes a hydrogen atom or a methyl group, and R 2 denotes a branched alkyl group having 3 to 18 carbon atoms, and (B) acrylic acid ester other than (A) above and/or methacrylic acid ester other than (A) above and/or vinyl ether.

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02-04-2020 дата публикации

Polymer dispersions for wax inhibition

Номер: US20200102407A1
Принадлежит: Rhodia Operations SAS

The present invention relates to a process of a process for preparation of a polymer dispersion comprising a step (E) of free radical polymerization in an aqueous medium (M) in the presence of: at least a pre-polymer (pO) soluble in the medium (M), at least one free-radical polymerization initiator, and at least one ethylenically unsaturated hydrophobic monomer (m) which is chosen from an alkyl (meth)acrylate of at least C6, wherein the aqueous medium (M) includes water and at least one water miscible solvent.

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29-04-2021 дата публикации

Radiation-sensitive resin composition and resist pattern-forming method

Номер: US20210124263A1
Принадлежит: JSR Corp

A radiation-sensitive resin composition includes a polymer including a phenolic hydroxyl group, a compound represented by formula (1-1) or formula (1-2), and a compound represented by formula (2). In the formula (1-1), a sum of a, b, and c is no less than 1; at least one of R 1 , R 2 , and R 3 represents a fluorine atom or the like; and R 4 and R 5 each independently represent a hydrogen atom, a fluorine atom, or the like. In the formula (1-2), in a case in which d is 1, R 6 represents a fluorine atom or the like, and in a case in which d is no less than 2, at least one of the plurality of R 6 s represents a fluorine atom or the like; and R 8 represents a single bond or a divalent organic group having 1 to 20 carbon atoms.

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09-06-2022 дата публикации

RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN

Номер: US20220179313A1
Принадлежит:

A resist composition that contains a resin component having a constitutional unit represented by General Formula (a0-1) and contains a photodecomposable base in which an acid dissociation constant of a conjugate acid is 4.0 or less, wherein Rrepresents a hydrogen atom or an alkyl group having 1 to 5 carbon atoms; Yarepresents a single bond or a divalent linking group; Rarepresents a hydrocarbon group; Yarepresents a single bond or a divalent linking group; Rarepresents a hydrogen atom, a hydroxy group, or a hydrocarbon group; Ar represents a benzene ring or a naphthalene ring; Raand Ramay be bonded to each other to form a ring; n01 represents an integer in a range of 1 to 6 5. The resist composition according to claim 4 , wherein the constitutional unit (a0) is a constitutional unit (a0-1-2) represented by General Formula (a0-1-2).7. The resist composition according to claim 6 , wherein the constitutional unit (a0) is a constitutional unit (a0-1-2) represented by General Formula (a0-1-2).9. The resist composition according to claim 8 , wherein the constitutional unit (a0) is a constitutional unit (a0-1-2) represented by General Formula (a0-1-2).10. A method of forming a resist pattern claim 8 , comprising:{'claim-ref': {'@idref': 'CLM-00001', 'claim 1'}, 'forming a resist film on a support using the resist composition according to ;'}exposing the resist film; anddeveloping the exposed resist film to form a resist pattern.11. The method of forming a resist pattern according to claim 10 , wherein the resist film is exposed with an extreme ultraviolet ray (EUV) or an electron beam (EB). The present invention relates to a resist composition and a method of forming a resist pattern.Priority is claimed on Japanese Patent Application No. 2020-204407, filed on Dec. 9, 2020, the content of which is incorporated herein by reference.In recent years, in the production of semiconductor elements and liquid crystal display elements, advances in lithography techniques have led to a ...

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13-05-2021 дата публикации

Photocurable adhesive sheet, adhesive sheet laminate, laminate for image display device, and image display device

Номер: US20210139744A1
Принадлежит: Mitsubishi Chemical Corp

The photocurable adhesive sheet includes a first adhesive layer, a second adhesive layer, and an intermediate layer interposed between the first adhesive layer and the second adhesive layer, and is characterized in that the intermediate layer is a layer that is formed from a resin composition containing a (meth)acrylic copolymer as a main component resin and has a crosslinked structure, the first adhesive layer, the second adhesive layer, or both of these layers are photocurable resin layers each formed from a photocurable resin composition, and the fall time in the measurement of holding force at 40° C. under a load of 1 N/cm2 is 60 minutes or more, while the fall time in the measurement of holding force at 60° C. under a load of 1 N/cm2 is less than 60 minutes.

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13-05-2021 дата публикации

CURABLE AND CURED ADHESIVE COMPOSITIONS

Номер: US20210139748A1
Принадлежит:

Curable adhesive compositions are provided that can be cured using ultraviolet or visible light radiation. These curable adhesive compositions, which contain a curable (meth)acrylate copolymer, have a creep compliance that is less than 5(10) inverse Pascals at 25° C., a creep compliance that is greater than 1(10) inverse Pascals at 70° C., and a shear storage modulus greater than 40 kiloPascals when measured at 25° C. at a frequency of 1 radian/second. 2. The curable adhesive composition of claim 1 , wherein the curable (meth)acrylate copolymer further comprises a fifth monomeric unit that is a nitrogen-containing monomeric unit not of Formula (II).3. The curable adhesive composition of claim 1 , wherein the curable (meth)acrylate copolymer is free or substantially free of monomeric units derived from a vinyl ester monomer or an anhydride-containing monomer.4. The curable adhesive composition of claim 1 , wherein the curable (meth)acrylate copolymer has a glass transition temperature equal to at least −15° C. when measured using Dynamic Mechanical Analysis at a frequency of 1 radian/second.5. A cured adhesive composition comprising a cured (meth)acrylate copolymer claim 1 , the cured adhesive composition being a reaction product resulting from exposing a curable adhesive composition to ultraviolet or visible light radiation claim 1 , wherein the curable adhesive composition is of .6. The cured adhesive composition of claim 5 , wherein the cured adhesive composition is optically clear.7. An article comprising a first substrate and a layer of the curable adhesive composition of positioned adjacent to the first substrate.8. The article of claim 7 , wherein the layer of the curable adhesive composition is a die-cut film.9. The article of claim 7 , wherein the first substrate is a release liner.10. The article of claim 8 , wherein the article further comprises a second substrate and the die-cut film is positioned between the first substrate that is the release liner and ...

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25-08-2022 дата публикации

MODIFIED FILM-FORMING RESIN CONTAINING ACID INHIBITOR, PREPARATION METHOD THEREFOR, AND PHOTORESIST COMPOSITION

Номер: US20220267492A1
Принадлежит:

A modified film-forming resin containing an acid inhibitor is formed by polymerizing a film-forming resin monomer and an acid inhibitor monomer. The modified film-forming resin includes film-forming functional groups and acid inhibitor functional groups, so that the modified film-forming resin can be used as a matrix resin, and has an acid inhibition effect: 2. The modified film-forming resin according to claim 1 , wherein a mass ratio of the film-forming resin monomer to the acid inhibitor monomer is (95-99.99):(0.01-5).3. The modified film-forming resin according to claim 1 , wherein the acid inhibitor monomer comprises at least one monomer selected from the group consisting of a carbon-chain-containing acid inhibitor monomer claim 1 , an ether-bond-containing acid inhibitor monomer claim 1 , an ester-bond-containing acid inhibitor monomer claim 1 , and a hydroxyl-containing acid inhibitor monomer; andthe film-forming resin monomer comprises at least one monomer selected from the group consisting of a polar film-forming resin monomer, a non-polar film-forming resin monomer, and an acid protected monomer.4. The modified film-forming resin according to claim 2 , wherein the acid inhibitor monomer comprises at least one monomer selected from the group consisting of a carbon-chain-containing acid inhibitor monomer claim 2 , an ether-bond-containing acid inhibitor monomer claim 2 , an ester-bond-containing acid inhibitor monomer claim 2 , and a hydroxyl-containing acid inhibitor monomer; andthe film-forming resin monomer comprises at least one monomer selected from the group consisting of a polar film-forming resin monomer, a non-polar film-forming resin monomer, and an acid protected monomer.7. A preparation method for the modified film-forming resin according to claim 1 , comprising the following steps:1) performing a polymerization, comprising: dissolving the film-forming resin monomer and the acid inhibitor monomer in a reaction solvent under a protective ...

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25-08-2022 дата публикации

THICKENED ORGANIC LIQUID COMPOSITIONS WITH POLYMERIC RHEOLOGY MODIFIERS

Номер: US20220267493A1
Принадлежит: NOURYON CHEMICALS INTERNATIONAL B.V.

Disclosed are thickened organic liquid compositions comprising an organic liquid and a polymeric rheology modifier wherein the polymeric rheology modifier is obtainable by co-polymerizing at least two of a bicyclic (meth)acrylate ester, an alkyl (meth)acrylate, and an aromatic vinyl monomer. Also disclosed are thickened organic liquid dispersions with suspended solids and methods of stabilizing dispersions using polymeric rheology modifiers. 1. A thickened organic liquid comprising an organic liquid and a polymeric rheology modifier , wherein the organic liquid is substantially free of gasoline and diesel fuel , and wherein the polymeric rheology modifier is obtainable by co-polymerizing a monomer mixture comprising at least one alkyl (meth)acrylate and at least one of the following monomers:a bicyclic (meth)acrylate ester different from the alkyl (meth)acrylate, and an aromatic vinyl monomer.2. The thickened organic liquid composition of wherein the polymeric rheology modifier comprises:20 to 70 wt %, preferably 25 to 60 wt %, and more preferably 30 to 55 wt % bicyclic (meth)acrylate ester, and30 to 80 wt %, preferably 40 to 75 wt %, and more preferably 45 to 70 wt % alkyl (meth)acrylate,up to a total of 100 wt %, wherein the weight percentages of the monomer are based on the total weight of all the monomers.3. The thickened organic liquid composition of wherein the polymeric rheology modifier comprises:5 to 50 wt % bicyclic (meth)acrylate ester,25 to 70 wt %, alkyl (meth)acrylate, and10 to 40 wt % aromatic vinyl monomer,up to a total of 100 wt %, wherein the weight percentages of the monomer are based on the total weight of all the monomers.4. The thickened organic liquid composition of wherein the alkyl (meth)acrylate is chosen from the group consisting of lower alkyl (meth)acrylate claim 1 , fatty alkyl (meth)acrylate claim 1 , and combinations thereof claim 1 , and wherein the polymeric rheology modifier comprises:10 to 30 wt % bicyclic (meth)acrylate ester,10 ...

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25-04-2019 дата публикации

Photopolymerization sensitizer composition and photopolymerizable composition comprising the same

Номер: US20190119426A1
Принадлежит: Kawasaki Kasei Chemicals Ltd

To provide a photopolymerizable composition which can be quickly cured by light of from 300 nm to 450 nm, and a cured product of which is less colored. A photopolymerization sensitizer composition containing a compound represented by the following formula (1) and a compound, of which the maximum value of an absorption coefficient in a wavelength region ranging from at least 400 nm to at most 500 nm is higher than the maximum value of an absorption coefficient in a wavelength region ranging from at least 400 nm to at most 500 nm of said compound; and a photopolymerizable composition containing the photopolymerization sensitizer composition. In the formula (1), R 1 is a C 1-20 alkyl group, a C 6-20 aryl group, a C 1-20 alkoxy group or a C 6-20 aryloxy group, and each of X 1 and Y 1 which may be the same or different, is a hydrogen atom or a C 1-8 alkyl group

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25-08-2022 дата публикации

RADIATION-SENSITIVE RESIN COMPOSITION, METHOD OF FORMING RESIST PATTERN, AND POLYMER

Номер: US20220269172A1
Принадлежит: JSR Corporation

Provided are: a radiation-sensitive resin composition, a method of forming a resist pattern, and a polymer which enable forming a resist pattern with favorable sensitivity to exposure light and superiority in terms of CDU performance and resolution. The radiation-sensitive resin composition contains: a polymer having: a first structural unit represented by formula (1), and a second structural unit derived from a (meth)acrylic acid ester including an acid-labile group; and a radiation-sensitive acid generator. 2. The radiation-sensitive resin composition according to claim 1 , wherein Rin the formula (1) represents a hydrogen atom.3. The radiation-sensitive resin composition according to claim 1 , wherein a proportion of the first structural unit with respect to total structural units constituting the polymer is no less than 1 mol % and no greater than 20 mol %. The present application claims priority to Japanese Patent Application No. 2021-26687, filed Feb. 22, 2021 and to Japanese Patent Application No. 2021-178257, filed Oct. 29, 2021. The contents of these applications are incorporated herein by reference in their entirety.The present invention relates to a radiation-sensitive resin composition, a method of forming a resist pattern, and a polymer.A radiation-sensitive resin composition for use in microfabrication by lithography generates an acid at light-exposed regions upon an irradiation with a radioactive ray, e.g., an electromagnetic wave such as a far ultraviolet ray such as an ArF excimer laser beam (wavelength of 193 nm), a KrF excimer laser beam (wavelength of 248 nm), etc. or an extreme ultraviolet ray (EUV) (wavelength of 13.5 nm), or a charged particle ray such as an electron beam. A chemical reaction in which the acid serves as a catalyst causes a difference between the light-exposed regions and light-unexposed regions in rates of dissolution in a developer solution, whereby a resist pattern is formed on a substrate.Such a radiation-sensitive resin ...

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27-05-2021 дата публикации

RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN

Номер: US20210157234A1
Принадлежит:

A resist composition which contains a resin component (A1) having a constitutional unit (a01) represented by General Formula (a01-1) and a constitutional unit (a02) represented by General Formula (a02-1), in which a content of an acid generator component (B) is 20 parts by mass or more and a content of a photodegradable base component (D1) is 5 parts by mass or more, in Formula (a01-1), Rarepresents an aromatic hydrocarbon group which may have a substituent, Raand Raeach independently represent a hydrocarbon group which may have a substituent, and Raand Ramay be bonded to each other to form a ring, in Formula (a02-1), Warepresents a divalent aromatic hydrocarbon group 2. The resist composition according to claim 1 , wherein Raand Rain General Formula (a01-1) are bonded to each other to form a ring.3. The resist composition according to claim 1 , wherein a total content of the acid generator component (B) and the photodegradable base component (D1) is 27 parts by mass or more and 40 parts by mass or less with respect to 100 parts by mass of the base material component (A).4. The resist composition according to claim 2 , wherein a total content of the acid generator component (B) and the photodegradable base component (D1) is 27 parts by mass or more and 40 parts by mass or less with respect to 100 parts by mass of the base material component (A).9. A method of forming a resist pattern claim 2 , comprising:{'claim-ref': {'@idref': 'CLM-00001', 'claim 1'}, 'forming a resist film on a support using the resist composition according to ;'}exposing the resist film; anddeveloping the exposed resist film to form a resist pattern.10. The method of forming a resist pattern according to claim 1 , wherein the resist film is exposed with extreme ultraviolet (EUV) rays or electron beam (EB). The present invention relates to a resist composition and a method of forming a resist pattern.Priority is claimed on Japanese Patent Application No. 2019-211246, filed on Nov. 22, 2019, the ...

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10-05-2018 дата публикации

Functionally versatile amphiphilic copolymers

Номер: US20180127551A1
Принадлежит: ISP Investments LLC

The present invention provides multifunctional amphiphilic copolymers having the structure set out below: wherein w, x, y, and z are molar percentages, the sum of which equals 100%; wherein R 1 has the formula —(CH 2 CH 2 O) n —R 2 , where R 2 is hydrogen or a C 1 -C 10 alkyl group; R 3 has the formula —(CH 2 ) a —CH 3 ; R 4 is hydrogen or methyl; R 5 has the formula —(OCH 2 CH 2 ) b —O—(CH 2 ) c —CH 3 or —(OCH 2 CH 2 ) b —O—C 6 H 5 ; and n is an integer ranging from 1 to about 10, a is an integer ranging from 1 to about 21, b is an integer ranging from 1 to about 23, and c is an integer ranging from 1 to about 21. The present invention also provides compositions comprising the multifunctional amphiphilic copolymers including spray drift control compositions including agricultural compositions, consumer compositions, industrial compositions, and mining compositions. The present invention also provides methods for preparing and using the multifunctional amphiphilic copolymers.

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01-09-2022 дата публикации

Emulsion particle-containing aqueous dispersion

Номер: US20220275117A1
Принадлежит: NIPPON SHOKUBAI CO LTD

This aqueous dispersion contains monomer emulsion particles comprising a monomer component, wherein the monomer component contains (A) at least one monomer X selected from the group consisting of styrene-based monomers and alkyl (meth)acrylates including an alkyl group having 4 to 12 carbon atoms, (B) a nonionic emulsifier, (C) an aliphatic organic acid (alkyl ester) having 15 or more carbon atoms, and (D) a lipophilic active component, and the mean particle size of the monomer emulsion particles is 10 to 200 nm.

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01-09-2022 дата публикации

UV Cure Basecoatings For Medical Devices

Номер: US20220275300A1
Принадлежит: Biocoat Inc

The invention concerns coating composition comprising hydrophobic polymer for use as a photoreactive basecoat for a medical device or implant comprising a polymer made from monomers comprising: (a) 1 to 12 mol % of at least one photoactive monomer that is a hydrogen atom abstracter and (b) 99 to 88 mol % of one or more of acrylamides, methacrylamides, acrylates, methacrylates, and N-vinylpyrrolidone; wherein the polymer has a glass transition temperature (Tg) of less than 40° C.

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03-06-2021 дата публикации

COATING AGENT COMPOSITION AND LAMINATED FILM

Номер: US20210162724A1
Автор: ONO Susumu
Принадлежит:

It is an object of the present invention to provide a coating agent composition from which a cured layer superior in water scale resistance and chemical resistance as well as in processability can be obtained. A cured film superior in water scale resistance and chemical resistance as well as in processability can be obtained from a coating agent composition for a laminated film to protect an exterior curved surface of a vehicle, including a component (A1): a (meth)acrylic resin having a hydroxyl group, and a component (B): a polyfunctional isocyanate compound, wherein the component (A1) has an alicyclic structure (a11) and a structure (a12) selected from the group consisting of polylactone, polycarbonate, polyester and polyether, and the component (A1) has a hydroxyl value of 50 to 150 mg KOH/g. 1. A coating agent composition for a laminated film to protect an exterior curved surface of a vehicle , comprisinga component (A1): a (meth)acrylic resin having a hydroxyl group, anda component (B): a polyfunctional isocyanate compound,wherein the component (A1) has an alicyclic structure (a11) and a structure (a12) selected from the group consisting of polylactone, polycarbonate, polyester and polyether, andthe component (A1) has a hydroxyl value of 50 to 150 mg KOH/g.2. The coating agent composition according to claim 1 , wherein an amount of a constitutional unit having the structure (a11) is 25 to 70 parts by mass per 100 parts by mass of the component (A1).3. The coating agent composition according to claim 1 , wherein an amount of a constitutional unit having the structure (a12) is 10 to 60 parts by mass per 100 parts by mass of the component (A1).4. The coating agent composition according to claim 1 , wherein an equivalent ratio of the number of isocyanate groups of the component (B) to the number of hydroxyl groups of the component (A1) is 0.5 to 1.5.5. The coating agent composition according to claim 1 , further comprisinga component (A2): a polyol.6. The coating ...

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03-06-2021 дата публикации

WATER-BASED RESIN COMPOSITION, WATER-BASED PAINT, AND ARTICLE

Номер: US20210163651A1
Принадлежит:

There is provided a water-based resin composition that contains a polymer (A) containing, as essential raw materials, a hydrogenated polybutadiene (a1) with an iodine value in the range of 5 to 25, a monomer (a2) with an acid group, and a monomer (a3) with a hydroxy group, a basic compound (B), and an aqueous medium (C), wherein the hydrogenated polybutadiene (a1) constitutes 4% to 38% by mass of the raw materials of the polymer (A), and the polymer (A) has an acid value in the range of 10 to 65 mgKOH/g. A water-based resin composition of the present invention has high storage stability and forms a coating film with good physical properties, such as high adhesiveness to various substrates and high blocking resistance, and is therefore suitably used in a water-based paint. 1. A water-based resin composition comprising: a polymer (A) containing a hydrogenated polybutadiene (a1) with an iodine value in the range of 5 to 25 , a monomer (a2) with an acid group , and a monomer (a3) with a hydroxy group as essential raw materials; a basic compound (B); and an aqueous medium (C) , wherein the hydrogenated polybutadiene (a1) constitutes 4% to 38% by mass of the raw materials of the polymer (A) , and the polymer (A) has an acid value in the range of 10 to 65 mgKOH/g.2. The water-based resin composition according to claim 1 , wherein the hydrogenated polybutadiene (a1) has a number-average molecular weight in the range of 1 claim 1 ,000 to 5 claim 1 ,000.3. The water-based resin composition according to claim 1 , wherein the polymer (A) has a hydroxyl value in the range of 5 to 50 mgKOH/g.4. A water-based paint comprising the water-based resin composition according to .5. An article comprising a coating film of the water-based paint according to . The present invention relates to a water-based resin composition useful for a water-based paint.Due to their high weatherability, flexibility, strength, and adhesiveness, acrylic resins have been widely used in paints, inks, ...

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03-06-2021 дата публикации

OIL-RESISTANT AGENT FOR PAPER

Номер: US20210164165A1
Принадлежит: DAIKIN INDUSTRIES, LTD.

An oil-resistant agent for paper, which contains a non-fluorine copolymer that has a repeating unit formed from (a) an acrylic monomer having a long-chain hydrocarbon group with 7-40 carbon atoms and a repeating unit formed from (b) an acrylic monomer having a hydrophilic group. The oil-resistant agent for paper also contains a liquid medium that is composed of water and/or an organic solvent, preferably of water or a mixture (aqueous medium) of water and an organic solvent. The non-fluorine copolymer preferably has a repeating unit formed from (c) a monomer having an ion donor group in addition to the repeating units formed from the monomers (a) and (b). Also disclosed is an oil-resistant paper having an oil-resistant layer including the oil-resistant agent for paper, and starch or modified starch, on a surface of the paper as well as a method of treating paper. 1. An oil-resistant agent for paper , comprising a fluorine-free copolymer having:(a) a repeating unit formed from an acrylic monomer having a long-chain hydrocarbon group having 7 to 40 carbon atoms, and (b) a repeating unit formed from an acrylic monomer having a hydrophilic group.2. The oil-resistant agent for paper according to claim 1 , wherein the acrylic monomer having a long-chain hydrocarbon group (a) is a monomer represented by the formula:{'br': None, 'sub': 2', 'k, 'sup': 1', '1', '1, 'CH═C(—X)—C(═O)—Y(R)'} [{'sup': '1', 'Reach is independently a hydrocarbon group having 7 to 40 carbon atoms,'}, {'sup': '1', 'Xis a hydrogen atom, a monovalent organic group, or a halogen atom,'}, {'sup': '1', 'sub': 6', '4', '2, 'Yis a divalent to tetravalent group composed of at least one selected from a hydrocarbon group having one carbon atom, —CH—, —O—, —C(═O)—, —S(═O)—, or —NH—, provided that a hydrocarbon group is excluded, and'}, 'k is 1 to 3., 'wherein'}3. The oil-resistant agent for paper according to claim 1 , wherein 1 , in the acrylic monomer having a long-chain hydrocarbon group (a) 1 , Xis a ...

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09-05-2019 дата публикации

Copolymer having thickening and suspension properties

Номер: US20190133914A1
Принадлежит: Coatex SAS

The invention relates to the field of the production of aqueous compositions comprising rheology-modifying agents, in particular the production of aqueous cosmetic or detergent compositions having improved thickening and clarity properties and also good suspending properties. In particular, the invention relates to a rheology-modifying agent which is a copolymer obtained by polymerization of at least one cross-linking monomer with at least one anionic monomer comprising at least one polymerizable ethylenic unsaturation and at least one hydrophobic nonionic monomer comprising at least one polymerizable ethylenic unsaturation.

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07-08-2014 дата публикации

Polymerizable Fluoromonomer, Fluoropolymer, Resist Material, and Method of Pattern Formation

Номер: US20140221589A1
Принадлежит: Central Glass Co Ltd

Disclosed is a polymerizable fluoromonomer represented by the following general formula (1). In the formula, R 1 represents a hydrogen atom, methyl group, fluorine atom, or trifluoromethyl group. n is an integer of 0 or 1, and m is that of from 1 to (3+n). R 2 and R 3 each independently represents a hydrogen atom or a protective group. A resist containing a fluoropolymer obtained by polymerizing or copolymerizing the monomer is suitable for use in microfabrication by immersion exposure or by a double patterning process based on immersion exposure.

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08-09-2022 дата публикации

Curable Composition and Cured Product

Номер: US20220282014A1
Принадлежит:

Provided is a curable composition which can form a cured product having good balance between mechanical properties, such as elongation at break and breaking strength, and weatherability, and which has excellent storage stability. A curable composition contains a (meth)acrylic polymer (A) which is a polymer of starting components including a polymerizable monomer containing 20% by mass or more of a (meth)acrylic acid alkyl ester (a1) having an alkyl group with 8 to 12 carbon atoms, and a mercapto group-containing compound (a10) having a group represented by a specific formula (1) in an amount of 0.1 to 5 parts by mass relative to 100 parts by mass of the polymerizable monomer; and a polymer (B) having a group represented by a specific formula (2) and having a polyether skeleton in the main chain thereof. 1. A curable composition comprising:a (meth)acrylic polymer (A) which is a polymer of starting components including a polymerizable monomer containing 20% by mass or more of a (meth)acrylic acid alkyl ester (a1) having an alkyl group with 8 to 12 carbon atoms, and a mercapto group-containing compound (a10) having a group represented by the formula (1) below in an amount of 0.1 to 5 parts by mass relative to 100 parts by mass of the polymerizable monomer; and {'br': None, 'sup': '1', 'sub': '3', '—SiR\u2003\u2003Formula (1), 'a polymer (B) having a group represented by the formula (2) below and having a polyether skeleton in the main chain thereof{'sup': 1', '1, 'claim-text': {'br': None, 'sup': B', '2, 'sub': '3', '—W—R—SiR\u2003\u2003Formula (2), '[in the formula (1), Ris each independently an alkyl group with 1 to 20 carbon atoms, alkoxy group with 1 to 20 carbon atoms, or hydroxyl group, and at least one Ris the alkoxy group or hydroxyl group], and'}{'sup': 2', '2', 'B', '3', '4', '3', '4', '3', '4, '[in the formula (2), Ris each independently an alkyl group with 1 to 20 carbon atoms, alkoxy group with 1 to 20 carbon atoms, or hydroxyl group, and at least one Ris ...

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28-05-2015 дата публикации

Resin, photoresist composition, and method for producing photoresist pattern

Номер: US20150147695A1
Принадлежит: Sumitomo Chemical Co Ltd

A resin comprising: a structural unit which has, at a side chain, a carbonyl group and a thiolactone ring-containing amino group where the thiolactone ring may have a substituent, and a structural unit having an acid-labile group.

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08-09-2022 дата публикации

RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD FOR FORMING RESIST PATTERN

Номер: US20220283498A1
Принадлежит: JSR Corporation

A radiation-sensitive resin composition includes: a resin having a polystyrene-equivalent weight-average molecular weight of 8,000 or less; a radiation-sensitive acid generator; and a solvent. The resin includes: a structural unit A represented by formula (1); a structural unit B having a phenolic hydroxyl group; and a structural unit C having an acid-dissociable group. The structural unit B is other than the structural unit A; and the structural unit C is other than the structural unit A or B. In the formula (1), Ris a hydrogen atom or a methyl group; and Ar is a monovalent aromatic hydrocarbon group having a substituent represented by —OR. The substituent is bonded to a carbon atom next to a carbon atom bonded to a main chain of the resin. Ris a hydrogen atom or a protective group to be deprotected by action of an acid. 2. The radiation-sensitive resin composition according to claim 1 , wherein in the above formula (1) claim 1 , Ar does not have a substituent other than —OR.3. The radiation-sensitive resin composition according to claim 1 , wherein the aromatic hydrocarbon group is a phenyl group claim 1 , a naphthyl group claim 1 , an anthryl group claim 1 , a phenanthryl group claim 1 , or a pyrenyl group.5. The radiation-sensitive resin composition according to claim 4 , wherein Ris a hydrogen atom claim 4 , and R claim 4 , R claim 4 , R claim 4 , and Rare each independently an alkyl group or an alkoxy group.9. The radiation-sensitive resin composition according to claim 1 , wherein a lower limit of a content of the radiation-sensitive acid generator is 15 parts by mass per 100 parts by mass of the resin.10. A method for forming a resist pattern claim 1 , comprising:{'claim-ref': {'@idref': 'CLM-00001', 'claim 1'}, 'forming a resist film from the radiation-sensitive resin composition according to ;'}exposing the resist film; anddeveloping the exposed resist film. The present application claims priority to Japanese Patent Application No. 2021-033710 filed Mar. 3 ...

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10-06-2021 дата публикации

ASSOCIATIVE AND EXCHANGEABLE OLIGOMERS, AND COMPOSITION COMPRISING THEM

Номер: US20210171679A1
Принадлежит: TOTAL MARKETING SERVICES

Compositions obtained by mixing at least one oligomer A1 which is obtained by the copolymerization of at least two monomers functionalized by diol functions with at least one second monomer, and at least one compound A2 comprising at least two boronic ester functions. They have rheological properties which vary significantly depending on the proportion of the compounds A1 and A2 used. Composition obtained by mixing at least one lubricating oil with such a composition of associative and exchangeable polymers, and use of this composition to lubricate a mechanical part. 113-. (canceled)15. The composition as claimed in claim 14 , in which the oligomer A1 has a number-average molar mass ranging from 600 g/mol to 9500 g/mol.16. The composition as claimed in claim 14 , in which the oligomer A1 comprises less than 1.5 mol % of repeating units corresponding to one or more monomers M3 of general formula (X).17. The composition as claimed in claim 14 , in which the monomer M3 is styrene.18. The composition as claimed in claim 14 , in which the side chains of the oligomer A1 have a mean length ranging from 8 to 20 carbon atoms.19. The composition as claimed in claim 14 , in which the oligomer A1 has a molar percentage of repeating units corresponding to the monomer M1 of formula (I) ranging from 2% to 70%20. The composition as claimed in claim 14 , in which the oligomer A1 has a number-average degree of polymerization ranging from 3 to 100.21. The composition as claimed in claim 14 , in which the oligomer A1 has a polydispersity index (Ip) ranging from 1.05 to 4.0.24. The composition as claimed in claim 23 , in which the oligomer A2 has a number-average molar mass ranging from 600 g/mol to less than 10 000 g/mol.25. The composition as claimed in claim 23 , in which the oligomer A2 has a molar percentage of monomer M4 of formula (IV) in said oligomer ranging from 4% to 50%.26. The composition as claimed in claim 23 , in which the side chains of the oligomer A2 have a mean ...

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14-08-2014 дата публикации

Gradient copolymer, composition including same and cosmetic make-up or care method

Номер: US20140227210A1
Автор: Celine Farcet
Принадлежит: LOreal SA

Novel gradient copolymers including at least two different and specifically selected monomers, and cosmetic or skin-care compositions including same. The invention also relates to a cosmetic method for make-up or the care of keratin materials, in particular the skin of the body or of the face, the nails, the hair and/or the eyelashes, comprising the application of a cosmetic composition as defined above on said materials.

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16-05-2019 дата публикации

Quantum dot-containing composition, wavelength conversion member, backlight unit, and liquid crystal display device

Номер: US20190144689A1
Принадлежит: Fujifilm Corp

A quantum dot-containing composition includes a quantum dot, a ligand having coordinating groups, which coordinates to the surface of the quantum dots, and the ligand is represented by Formula I. In Formula I, A is an organic group including one or more coordinating groups selected from an amino group, a carboxy group, a mercapto group, a phosphine group, and a phosphine oxide group, Z is an (n+m+l)-valent organic linking group, R is a group including an alkyl group, an alkenyl group, or an alkynyl group each of which may have a substituent, Y is a group having a polymer chain which has a degree of polymerization of 3 or greater and which includes a polyacrylate skeleton or the like. n and m are each independently 1 or greater, l is 0 or greater, and n+m+l is integer 3 or greater. At least two coordinating groups are included in a molecule.

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17-06-2021 дата публикации

FUEL COMPOSITION

Номер: US20210179957A1
Принадлежит:

A fuel composition for powering a combustion engine, the composition comprising a liquid base fuel; and a (co)polymer obtainable by (co)polymerizing at least the following monomers: one or more bicyclic (meth)acrylate esters (a); up to 15 wt % of styrene (b); optionally other ethylenically unsaturated monomers that are not monomer (a) or (b); up to a total of 100 wt %, wherein the weight percentages of the monomer are based on the total weight of all of the monomers. 3. The fuel composition according to claim 1 , wherein the copolymer is a random co-polymer.5. The fuel composition according to claim 1 , wherein the copolymer comprises:85 to 99.95 wt % of the bicyclic (meth)acrylate ester (a);1 to 10 wt % of styrene (b); and0 to 10 wt % of ethylenically unsaturated monomers not being a monomer (a) or (b), up to a total of 100 wt %, wherein the weight percentages of the monomer are based on the total weight of all the monomers.6. The fuel composition according to claim 1 , wherein the copolymer comprises:90 to 99.95 wt % of the bicyclic (meth)acrylate ester (a);2.0 to 8.0 wt % of styrene (b); and0 to 5 wt % of ethylenically unsaturated monomers not being a monomer (a) or (b), up to a total of 100 wt %, wherein the weight percentages of the monomer are based on the total weight of all the monomers.7. The fuel composition according to claim 1 , wherein the copolymer comprises a total of bicyclic (meth)acrylate ester and styrene in an amount of 80 wt % claim 1 , preferably 83 wt % claim 1 , more preferably 90 wt % of the total monomer claim 1 , or more.8. The fuel composition according to claim 1 , wherein the copolymer comprises a total of bicyclic (meth)acrylate ester and styrene in an amount of 95 wt % or more claim 1 , preferably 99 wt % or more.9. The fuel composition according to claim 1 , wherein the copolymer is produced from isobornyl methacrylate and styrene.10. The fuel composition according to claim 1 , wherein the copolymer has a cloud point in fuel of 12.5° ...

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17-06-2021 дата публикации

TONER AND TWO COMPONENT DEVELOPER

Номер: US20210181647A1
Принадлежит:

A toner having a toner particle containing a binder resin having a first resin and a second resin, wherein the first resin is a crystalline resin, the second resin is an amorphous resin, the first resin has a first monomer unit, a second monomer unit and a third monomer unit each having specific structure, a content of the first monomer unit and a content of the third monomer unit in the first resin satisfy specific range, and an SP value of the second monomer unit satisfies specific range, the second resin contains at least one of resin selected from the group consisting of a vinyl-based resin and a specific hybrid resin, a cross section of the toner has a domain-matrix structure formed of a matrix including the first resin and domains including the second resin, and a number average diameter of the domains is 0.10 to 2.00 μm. 2. The toner according to claim 1 , wherein in an observed cross section of the toner claim 1 ,a ratio of an area of the domains relative to an area of the cross section of the toner is 15% to 80%.3. The toner according to claim 1 , wherein when an acid value of the first resin is denoted by AVa and an acid value of the second resin is denoted by AVi claim 1 , the values of AVa and AVi satisfy formulae (6) and (7) below:{'br': None, '0.5 mg KOH/g≤AVa≤30.0 mg KOH/g \u2003\u2003(6)'}{'br': None, '0.5 mg KOH/g≤AVi≤30.0 mg KOH/g \u2003\u2003(7).'}4. The toner according to claim 1 , wherein when an acid value of the first resin is denoted by AVa and an acid value of the second resin is denoted by AVi claim 1 , the values of AVa and AVi satisfy formula (8):{'br': None, 'i': a', 'i|≤, '0 mg KOH/g≤|AV−AV20.0 mg KOH/g \u2003\u2003(8).'}5. The toner according to claim 1 , wherein when a hydroxyl value of the first resin is denoted by OHVa and a hydroxyl value of the second resin is denoted by OHVi claim 1 , the values of OHVa and OHVi satisfy formulae (9) and (10) below:{'br': None, '0.5 mg KOH/g≤OHVa≤30.0 mg KOH/g \u2003\u2003(9)'}{'br': None, '0.5 mg ...

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22-09-2022 дата публикации

LAMINATE CONTAINING AN ADHESION PROMOTER LAYER AND METHOD OF MAKING THE LAMINATE

Номер: US20220297410A1
Автор: LIU Weijun
Принадлежит:

A laminate can contain a substrate, an adhesion promoter layer, and a coating layer, wherein the adhesion promoter layer may include an isocyanate group containing compound of formula (1): R—R—N═C═O (1), with Rbeing a functional group different than the isocyanate group, and Rbeing substituted or unsubstituted alkyl or aryl. The adhesion promoter layer can provide strong adhesion of the coating layer to the substrate by forming covalent bonds with the substrate and covalent bonds with the coating layer. 1. A laminate comprising:a substrate;{'sub': 1', '2', '1', '2, 'an adhesion promoter layer directly overlying the substrate, the adhesion promoter layer including an isocyanate group containing compound of formula (1): R-R—N═C═O (1), with Rbeing a functional group different than the isocyanate group, and Rbeing substituted or unsubstituted alkyl or aryl; and'}a coating layer directly overlying the adhesion promoter layer.2. The laminate of claim 1 , wherein Rof formula (1) is selected from an acrylate group claim 1 , a methacrylate group claim 1 , a vinyl group claim 1 , or a halogen.4. The laminate of claim 1 , wherein the substrate includes a polymer claim 1 , silicon claim 1 , a glass claim 1 , a ceramic claim 1 , a metal claim 1 , or a metal alloy.5. The laminate of claim 4 , wherein the substrate includes an organic polymer.6. The laminate of claim 5 , wherein the substrate includes a polyimide.7. The laminate of claim 1 , wherein the coating layer is a cured resist claim 1 , the cured resist including polymerized acrylate units and/or polymerized methacrylate units.8. The laminate of claim 7 , wherein the substrate includes a polyimide or silicon.9. The laminate of claim 1 , wherein the coating layer includes a poly(p-xylylene) polymer.10. The laminate of claim 9 , wherein the coating layer includes a chlorinated poly(p-xylylene)11. The laminate of claim 1 , wherein the substrate includes a polyimide and the coating layer includes a chlorinated poly(p- ...

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22-09-2022 дата публикации

TONER AND METHOD FOR MANUFACTURING TONER

Номер: US20220299902A1
Принадлежит:

A toner comprising a toner particle comprising a binder resin and a release agent, wherein the binder resin comprises a first resin and a second resin; the first resin is a crystalline resin having a melting point Tp of 50° C. to 90° C.; the second resin is an amorphous resin; in a cross section of the toner particle observed by a transmission electron microscope, the cross section of the toner particle has a matrix-domain structure composed of a matrix comprising the first resin and domains comprising the second resin; an area ratio of the matrix comprising the first resin in a total area of the cross section of the toner particle is 35 to 70 area %; and where a longest direction of each of the domains is taken as a longitudinal direction, a standard deviation of an angle of the longitudinal direction of the domains is 25° or less. 1. A toner comprising a toner particle comprisinga binder resin and a release agent, whereinthe binder resin comprises a first resin and a second resin;the first resin is a crystalline resin having a melting point Tp of 50° C. to 90° C.;the second resin is an amorphous resin;in a cross section of the toner particle observed by a transmission electron microscope,the cross section of the toner particle has a matrix-domain structure composed of a matrix comprising the first resin and domains comprising the second resin;an area ratio of the matrix in a total area of the cross section of the toner particle is 35 to 70 area %; andwhere a longest direction of each of the domains is taken as a longitudinal direction, a standard deviation of an angle of the longitudinal direction of the domains is 25° or less.2. The toner according to claim 1 , wherein a softening temperature Tm of the second resin is higher than the melting point Tp of the first resin by 10° C. or more.3. The toner according to claim 1 , wherein the area ratio of the matrix is 60 area % or less of the total area of the cross section of the toner particle.4. The toner according ...

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22-09-2022 дата публикации

Resin composition, adhesive member, and display device including the same

Номер: US20220300103A1
Принадлежит: Samsung Display Co Ltd

A resin composition includes a (meth) acrylate oligomer, and an oxygen inhibition preventing agent including at least one of a phosphite compound having a boiling point of about 150° C. or higher, and a phosphine compound having a boiling point of about 150° C. or higher, wherein the oxygen inhibition preventing agent is included in an amount of about 0.1 wt % or more and less than about 1 wt % with respect to a total amount of a (meth)acrylate. An adhesive member formed by photocuring the resin composition exhibits excellent adhesion at high temperatures, and may thus exhibit excellent reliability in case used in a flexible display device.

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24-06-2021 дата публикации

CURABLE COMPOSITIONS FOR PRESSURE-SENSITIVE ADHESIVES

Номер: US20210189042A1
Принадлежит:

Curable compositions, cured compositions, articles containing the curable or cured compositions, and methods of making the articles are provided. More particularly, the curable compositions contain a (meth)acrylate-based polymer having pendant (meth)acryloyl groups, at least one monomer having a single ethylenically unsaturated group, a photoinitiator that includes an acyl phosphine oxide, and a thixotropic agent. The curable compositions can be printed or dispensed, if desired, and the cured compositions are pressure-sensitive adhesives. 1. A curable composition comprising:a) a (meth)acrylate-based polymer having multiple pendant (meth)acryloyl groups, the (meth)acrylate-based polymer having a weight average molecular weight in a range of 25,000 to 400,000 Daltons;b) at least one monomer having a single ethylenically unsaturated group;c) a photoinitiator comprising an acyl phosphine oxide compound;d) a thixotropic agent comprising inorganic oxide particles,wherein the curable composition is free or substantially free of an epoxy resin.2. The curable composition of claim 1 , wherein the (meth)acrylate-based polymer having multiple pendant (meth)acryloyl groups further comprises monomeric units having pendant hydroxy groups.3. The curable composition of claim 1 , wherein the photoinitiator further comprises a second photoinitiator that absorbs wavelengths of light less than 300 nanometers.4. The curable composition of claim 3 , wherein the photoinitiator is a mixture of diphenyl (2 claim 3 ,4 claim 3 ,6-trimethylbenzoyl) phosphine oxide and methyl benzoylformate.5. The curable composition of claim 1 , wherein the (meth)acrylate-based polymer having pendant (meth)acryloyl groups has 1 to 20 pendant (meth)acryloyl groups per chain on average.6. The curable composition of claim 1 , wherein the (meth)acrylate-based polymer having pendant (meth)acryloyl group comprises 50 to 99.9 weight percent monomeric units derived from a (hetero)alkyl (meth)acrylate claim 1 , 0.1 to ...

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18-06-2015 дата публикации

Pattern forming method, electron beam-sensitive or extreme ultraviolet ray-sensitive resin composition, resist film, and method for manufacturing electronic device, and electronic device using the same

Номер: US20150168834A1
Принадлежит: Fujifilm Corp

There is provided a pattern forming method, including: (a) forming a film by using an electron beam-sensitive or extreme ultraviolet ray-sensitive resin composition containing a resin (A) having a repeating unit represented by Formula (1-0) and a repeating unit represented by Formula (1-2); (b) exposing the film by using an electron beam or extreme ultraviolet ray; and (c) developing the exposed film by using a developer containing an organic solvent to form a negative pattern, wherein a content of the repeating unit represented by Formula (1-0) is 45 mol % or more based on a whole repeating units in the resin (A).

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16-06-2016 дата публикации

Novel powder polymer, method for the preparation thereof, and use as a thickener

Номер: US20160167040A1
Автор: Olivier Braun, PAUL Mallo

A cross-linked anionic polyelectrolyte resulting from the polymerization, for 100 mol %: (i) of a proportion no smaller than 30 mol % and smaller than 99.5 mol % monomer units from a monomer having a partially or totally salified strong acid function; (ii) of a proportion no smaller than 0.5 mol % and no greater than 5 mol % monomer units from at least one monomer having Formula (I): CH 2 ═CH(CH 3 )—C(=0)-OR 1 (I), wherein Ri is an alkyl radical including 6 to 18 carbon atoms; (iii) of a proportion greater than 0 mol % and no greater than 5 mol % monomer units from at least one diethylene or polyethylene cross-linking monomer; and (iv) optionally, of a proportion smaller than 69.5 mol % monomer units from a neutral monomer. Also, a method for preparing the polyelectrolyte and to the use thereof as a thickener in topical compositions.

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24-06-2021 дата публикации

RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN

Номер: US20210191268A1
Принадлежит:

A resist composition including a resin component having a constitutional unit derived from a compound represented by General Formula (a01-1) and a constitutional unit derived from a compound represented by General Formula (a02-1), and an acid generator component composed of an anion moiety and a cation moiety. In General Formula (a01-1), Wrepresents a polymerizable group-containing group, Crepresents a tertiary carbon atom, Rrepresents an unsaturated hydrocarbon group which may have a substituent, Rand Rrepresent a chain saturated hydrocarbon group which may have a substituent, and a carbon atom at an α-position of Cconstitutes a carbon-carbon unsaturated bond. In General Formula (a02-1), Wrepresents a polymerizable group-containing group, Warepresents an aromatic hydrocarbon group, and n2 represents an integer in a range of 1 to 3 4. A method of forming a resist pattern , comprising:{'claim-ref': {'@idref': 'CLM-00001', 'claim 1'}, 'forming a resist film on a support using the resist composition according to ;'}exposing the resist film; anddeveloping the exposed resist film to form a resist pattern.5. The method of forming a resist pattern according to claim 4 , wherein the resist film is exposed to extreme ultraviolet (EUV) rays or electron beams (EB). The present invention relates to a resist composition and a method of forming a resist pattern.Priority is claimed on Japanese Patent Application No. 2019-228281, filed on Dec. 18, 2019, the content of which is incorporated herein by reference.In recent years, in the production of semiconductor elements and liquid crystal display elements, with advances in lithography techniques, rapid progress in the field of pattern miniaturization has been achieved. Typically, these miniaturization techniques involve shortening the wavelength (increasing the energy) of the light source for exposure.Resist materials for use with these types of light sources for exposure require lithography characteristics such as a high resolution ...

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15-06-2017 дата публикации

Ultraviolet light absorbing materials for intraocular lens and uses thereof

Номер: US20170165052A1
Принадлежит: Benz Research and Development Corp

A method for reducing the transmittance of ultraviolet radiation through an intraocular lens to 10% or less at 370 nm by (a) polymerizing a mixture comprising: at least one first monomer and a second monomer comprising a trisaryl-1,3,5-triazine moiety, (b) forming an optic portion from the copolymer wherein the second monomer is present in about 0.10 to about 0.20 percent by weight of the overall polymer and wherein the optic portion of the intraocular lens displays essentially the same physical properties such as, for example, refractive index as the optic portion of the intraocular lens formed from the polymerized mixture of (a) without the second monomer, but otherwise identical conditions. Additionally, a method for preventing the transmittance of at least 90% of ultraviolet radiation at 370 nm through a foldable intraocular lens comprising: (a) incorporating a monomer comprising a 4-(4,6-diphenyl-1,3,5-triazin-2-yl)-3-hydroxyphenoxy moiety into at least one polymer and (b) forming the polymer into a material suitable for use as an intraocular lens, wherein the monomer comprising a 4-(4,6-diphenyl-1,3,5-triazin-2-yl)-3-hydroxyphenoxy moiety comprises 0.10 to 0.15 weight percent of the overall dry polymer.

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14-06-2018 дата публикации

Demulsifiers for crude oil based on acrylic-aminoacrylic random copolymers of controlled molecular mass

Номер: US20180162975A1
Принадлежит: INSTITUTO MEXICANO DEL PETROLEO

Nowadays, one of the major problems of the oil industry is the presence of large amounts of water and salts, which cannot be efficiently removed by conventional dehydrating polymers. In addition, the acid stimulation operations of petroleum wells cause the chemical degradation of demulsifiers such as polyethers and phenolic resins, reducing drastically their efficiency as water and salt removers. Based on aforementioned, a series of new copolymers has been developed; these copolymers are combinations of an acrylic and an aminoacrylic monomer and they are synthesized by semi-continuous emulsion polymerization (under starved feed conditions), which ensures both the homogeneity of the different chains as well as the randomness of the monomers distribution. The solutions of one of these random copolymers have shown an efficiency similar or superior to combinations of two or three block copolymers (formulations), when they are applied in light or heavy crude oils. The acrylic-aminoacrylic copolymers show good performance as water/oil emulsion breaker initiators, coalescence agents of water droplets and clarifiers of the remaining aqueous phase. In addition, the chemical structure of the acrylic copolymers confers resistance to degradation induced by abrupt pH changes when acid stimulation operations of wells are performed.

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29-09-2022 дата публикации

RESIN COMPOSITION, RESIN FILM, AND GLASS LAMINATE

Номер: US20220306785A1
Принадлежит: Sekisui Chemical Co., Ltd.

The resin composition of the present invention is a resin composition comprising an acrylic-based polymer (A) and a urethane polymer (B), in which the acrylic-based polymer (A) is a polymer of a monomer component comprising an acrylic-based monomer (A1) having at least one functional group (X) selected from the group consisting of a hydroxy group, a carboxy group, a thiol group, an amino group, a group having an ether bond, a group having a urethane bond and a group having an amide bond. 1. A resin composition comprising an acrylic-based polymer (A) and a urethane polymer (B) ,the acrylic-based polymer (A) being a polymer of a monomer component comprising an acrylic-based monomer (A1) having at least one functional group (X) selected from the group consisting of a hydroxy group, a carboxy group, a thiol group, an amino group, a group having an ether bond, a group having a urethane bond and a group having an amide bond.2. The resin composition according to claim 1 , wherein a mass rate (A/B) of the acrylic-based polymer (A) to the urethane polymer (B) is 1/5 or more and 10/1 or less.3. The resin composition according to claim 1 , wherein an amount of the acrylic-based monomer (A1) compounded is 1 part by mass or more based on 100 parts by mass of the monomer component forming the acrylic-based polymer (A).4. The resin composition according to claim 1 , wherein a phase separation structure is formed by the acrylic-based polymer (A) and the urethane polymer (B).5. The resin composition according to claim 1 , wherein a total content of the acrylic-based polymer (A) and the urethane polymer (B) is 90% by mass or more based on a total amount of a resin comprised in the resin composition.6. The resin composition according to claim 1 , wherein a glass transition temperature (Tg) of the acrylic-based polymer (A) is 50° C. or less.7. The resin composition according to claim 1 , wherein the acrylic-based monomer (A1) comprises at least one selected from the group consisting of ...

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29-09-2022 дата публикации

USE OF NANOPARTICLE COMPOSITIONS AS HEAT TRANSFER FLUIDS IN BATTERY OR OTHER ELECTRICAL EQUIPMENT SYSTEMS

Номер: US20220306924A1
Принадлежит: EVONIK OPERATIONS GMBH

The invention relates to the use of a nanoparticle composition as a heat transfer fluid in battery or other electrical equipment systems. The electrical equipment can be in particular electric batteries, electric motors, electric vehicle transmissions, electric transformers, electric capacitors, fluid-filled transmission lines, fluid-filled power cables, computers and power electronics such as electric power converters. 1. A nanoparticle heat fluid transfer composition obtained by milling a mixture , the mixture comprising one or more nanoparticle compound(s) (A) and one or more polymer compound(s) (B) , metal or metalloid nitride nanoparticle;', 'multi or single walled carbon nanotubes;', 'carbon black;', {'sub': '2', 'a metal chalcogenide having a molecular formula MX, wherein M is a metallic element selected from the group consisting of titanium (Ti), vanadium (V), manganese (Mn), iron (Fe), cobalt (Co), nickel (Ni), copper (Cu), zinc (Zn), zirconium (Zr), niobium (Nb), molybdenum (Mo), tantalum (Ta), tungsten (W), osmium (Os), and combinations thereof, and X is a chalcogen element selected from the group consisting of sulfur (S), oxygen (O), and combinations thereof;'}, 'or a mixture thereof, and, '(A) wherein the one or more nanoparticle compound(s) (A) is selected from the group consisting of'} [ a1) aminoalkyl (meth)acrylates and aminoalkyl (meth)acrylamides;', 'a2) nitriles of alkyl (meth)acrylic acid and other nitrogen-containing alkyl (meth)acrylates;', 'a3) (meth)acrylates of ether alcohols;', 'a4) oxiranyl alkyl (meth)acrylate;', 'a5) phosphorus-, boron- and/or silicon-containing alkyl (meth)acrylates;', 'a6) heterocyclic alkyl (meth)acrylates;', 'a7) vinyl halides;', 'a8) vinyl esters;', 'a9) vinyl monomers containing aromatic groups;', 'a10) heterocyclic vinyl compounds;', 'a11) vinyl and isoprenyl ethers;', 'a12) methacrylic acid and acrylic acid, and, 'a) 1 to 30% by weight, based on the total weight of the monomer composition, of one or more ...

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