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Небесная энциклопедия

Космические корабли и станции, автоматические КА и методы их проектирования, бортовые комплексы управления, системы и средства жизнеобеспечения, особенности технологии производства ракетно-космических систем

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Мониторинг СМИ

Мониторинг СМИ и социальных сетей. Сканирование интернета, новостных сайтов, специализированных контентных площадок на базе мессенджеров. Гибкие настройки фильтров и первоначальных источников.

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Поддерживает ввод нескольких поисковых фраз (по одной на строку). При поиске обеспечивает поддержку морфологии русского и английского языка
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Применить Всего найдено 1577. Отображено 100.
30-08-2012 дата публикации

Optical ingredient-measuring apparatus

Номер: US20120218555A1
Автор: Shinji Komatsuzaki, Tatsuya Kumagai
Принадлежит: Hitachi Cable Ltd

An optical ingredient-measuring apparatus is provided for measuring a concentration of an optically rotative substance. The apparatus includes a sensor main body which detects a phase difference between linear polarized light beams that propagate through an optical fiber loop in opposite directions, a circular polarized input component interposed in the middle of the optical fiber loop having first and second converters that convert the linear polarized light propagating through the optical fiber loop into left-hand and right-hand circular polarized light, and a concentration detector, installed in the sensor main body, which calculates the concentration of the substance in the sample based on the detected phase difference.

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Номер записи: 1
22-11-2012 дата публикации

Photonic crystal combinatorial sensor

Номер: US20120293802A1
Автор: Geoffrey A. Ozin, Leonardo Da Silva Bonifacio
Принадлежит: Opalux Inc

The present disclosure provides methods, systems and devices for a photonic crystal combinatorial sensor. The photonic crystal sensor may include an array of photonic crystal materials, wherein each photonic crystal material has a reflected wavelength in a respective initial wavelength range. At least one a first one of the photonic crystal materials may be configured to have a response to an external stimulus different from at least a second one of the photonic crystal materials, the different response resulting in a change in the reflected wavelength of the first photonic crystal material that is an optically detectable difference from the second photonic crystal material. The optically detectable difference may provide an optically detectable response pattern of reflected wavelengths in the array. The sensor may be reversible and reusable.

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Номер записи: 2
31-10-2013 дата публикации

System, Method and Applications Involving Identification of Biological Circuits Such as Neurological Characteristics

Номер: US20130284920A1
Автор: Karl Deisseroth, Leslie A. Meltzer, Raag D. Airan
Принадлежит: Leland Stanford Junior University

Various aspects are directed to systems and methods for assessing neural activity of a neural region having multiple subfields. In certain embodiments, a method includes evoking a cellular electrical response in at least one subfield due to neural activity in the neural region, capturing image data of the electrical response at a level sufficiently detailed in space and time to differentiate between polarization-based events of two respective portions of the subfield, and then assessing neural activity by correlating space and time information, from the captured data, for the two respective portions of the sub-field. Other more specific aspects of the invention involve different preparation and neural stimulation approaches which can vary depending on the application.

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Номер записи: 3
08-01-2015 дата публикации

Thickness measuring apparatus and thickness measuring method

Номер: US20150012246A1
Автор: Chu-Shik Kang, Jae-Wan Kim, Jong-ahn Kim, Jong-Han Jin
Принадлежит: Korea Research Institute of Standards and Science KRISS

Provided are a thickness measuring apparatus and a thickness measuring method. The thickness measuring method includes irradiating first laser beam of a first wavelength λ 1 to a transparent substrate and measuring intensity of first laser beam transmitting the transparent substrate; irradiating second laser beam of a second wavelength λ 2 to the transparent substrate and measuring intensity of second laser beam transmitting the transparent substrate; and extracting a rotation angle on a Lissajous graph using the first and second laser beams transmitting the transparent substrate. A phase difference between adjacent rays by multiple internal reflection of the first laser beam and a phase difference between adjacent ray by multiple internal reflection of the second laser beam is maintained at π/ 2.

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Номер записи: 4
14-01-2016 дата публикации

Detection of defect in die

Номер: US20160011122A1
Автор: Deepak Goyal, Mario Pacheco
Принадлежит: Intel Corp

Generally discussed herein are systems, apparatuses, and methods that can detect a defect in a die. According to an example, a method can include transmitting a first beam of light with a wavelength and optical power configured to produce a reflected beam with at least one milli-Watt of power, linearly polarizing the first beam of light in a specific direction, circularly polarizing the linearly polarized light by a quarter wavelength to create circularly polarized light, directing the circularly polarized light to a device under test, linearly polarizing light reflected off the device under test by a quarter wavelength, or creating an image of the linearly polarized light reflected off the device under test.

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Номер записи: 5
14-01-2021 дата публикации

INSTANTANEOUS ELLIPSOMETER OR SCATTEROMETER AND ASSOCIATED MEASURING METHOD

Номер: US20210010928A1
Автор: Acher Olivier, GASTON Jean-Paul, MELIZZI Géraldine, NGUYEN Thanh-Liem, PODZOROV Alexander, VILLIER Brice
Принадлежит:

Disclosed is an ellipsometer or scatterometer including a light source, a polarizer, an optical illumination system suitable for directing an incident polarized light beam towards a sample, a wavefront-division optical beam splitter arranged to receive a secondary light beam produced by reflection, transmission or diffraction, the wavefront-division optical beam splitter being oriented to form three collimated split beams, an optical polarization modification device and an optical polarization splitting device to form six angularly split beams, a detection system suitable for detecting the six split beams, and a processing system suitable for deducing therefrom an ellipsometric or scatterometric measurement. 1100. An ellipsometer () comprising:{'b': 1', '10, 'a light source () adapted to generate a source light beam ();'}{'b': 5', '10', '11, 'a polarizer () adapted to receive the source light beam () and to form a polarized incident light beam ();'}{'b': 2', '4', '11', '6', '9', '8, 'an illumination optical system (, ) adapted to direct the polarized incident light beam () towards a sample () following an incident optical axis () in a plane of incidence ();'}{'b': 20', '12', '11', '12', '19', '8', '20', '13', '14', '15', '16', '17', '18', '8, 'an optical wavefront-division beam splitter () arranged so as to receive a secondary light beam () formed by reflection or transmission of the polarized incident light beam () on the sample at a determined angle of incidence, the secondary light beam () propagating along a secondary optical axis () in the plane of incidence (), the optical wavefront-division beam splitter () being directed so as to form three collimated split beams (, , ) propagating along three distinct optical axes (, , ) angularly separated in a plane transverse to the plane of incidence (); and'}{'b': 25', '13', '14', '15, 'an optical polarization-changing device () adapted to receive the three collimated split beams (, , ) and to form three beams ...

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Номер записи: 6
03-02-2022 дата публикации

THIN FILM SPECTROELLIPSOMETRIC IMAGING

Номер: US20220034791A1
Автор: Zhang Aizhong
Принадлежит:

A method and device of thin film spectroellipsometric imaging are disclosed. The device comprises an illuminator to direct light through a polarization generator system toward an extended area of a sample; an imaging system to form images; a detection system to record in a plurality of spectral channels; a computer to display and analyze the recorded images; and at least one reference phantom with known optical properties to replace the sample for calibration. The method comprises directing light from an illuminator through a polarization generator system toward an extended area of a sample having a geometrical shape; forming images with an imaging system; adjusting a polarization generator system and a polarization analyzer system to obtain a series of polarimetric setups; recording the images with a detection system in a plurality of spectral channels; replacing the sample with at least one reference phantom; and analyzing the recorded images with a computer. 1. A thin film spectroellipsometric imaging device , comprising:an illuminator to direct light through a polarization generator system toward an extended area of a sample, wherein said illuminator is broadband, covering visible and infrared spectra, wherein said polarization generator system generates a plurality of polarization states, wherein said sample has a geometrical shape;an imaging system to form images of said extended area of said sample, wherein said imaging system comprises a polarization analyzer system;a detection system to record said images, wherein said detection system comprises a plurality of spectral channels, covering visible and infrared spectra;a computer to display and analyze said recorded images from said detection system; andat least one reference phantom with known optical properties to replace said sample for calibration, wherein said at least one reference phantom has the same or substantially similar geometrical shape as of said sample or a segment of said sample.2. (canceled)3 ...

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Номер записи: 7
19-01-2017 дата публикации

Optical Metrology Tool Equipped with Modulated Illumination Sources

Номер: US20170016815A1
Автор: Brady Gregory, Peterlinz Kevin, Rotter Lawrence D., Shaughnessy Derrick A., Shchegrov Andrei V., Veldman Andrei, Wang David Y.
Принадлежит:

The system includes a modulatable illumination source configured to illuminate a surface of a sample disposed on a sample stage, a detector configured to detect illumination emanating from a surface of the sample, illumination optics configured to direct illumination from the modulatable illumination source to the surface of the sample, collection optics configured to direct illumination from the surface of the sample to the detector, and a modulation control system communicatively coupled to the modulatable illumination source, wherein the modulation control system is configured to modulate a drive current of the modulatable illumination source at a selected modulation frequency suitable for generating illumination having a selected coherence feature length. In addition, the present invention includes the time-sequential interleaving of outputs of multiple light sources to generate periodic pulses trains for use in multi-wavelength time-sequential optical metrology. 1. An optical metrology tool , comprising:a first illumination source configured to generate illumination of a first wavelength;at least one additional illumination source configured to generate illumination of an additional wavelength, the additional wavelength different from the first wavelength, the first illumination source and the at least one additional illumination source configured to illuminate a surface of a sample disposed on a sample stage;a set of illumination optics configured to direct illumination of the first wavelength and illumination of the at least one additional wavelength from the first illumination source and the at least one additional illumination source to the surface of the sample;a set of collection optics;a detector configured to detect at least a portion of illumination emanating from a surface of the sample, wherein the set of collection optics is configured to direct illumination emanating from the surface of the sample to the detector; anda modulation control system ...

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Номер записи: 8
21-01-2016 дата публикации

IN-SITU MONITORING OF FABRICATION OF INTEGRATED COMPUTATIONAL ELEMENTS

Номер: US20160018818A1
Автор: Freese Robert Paul, Gardner Richard Neal, Jones Christopher Michael, Perkins David L.
Принадлежит: Halliburton Energy Services, Inc.

Techniques include receiving a design of an integrated computational element (ICE), the ICE design including specification of a substrate and a plurality of layers, their respective target thicknesses and complex refractive indices, complex refractive indices of adjacent layers being different from each other, and a notional ICE fabricated in accordance with the ICE design being related to a characteristic of a sample; forming at least some of the plurality of layers of the ICE in accordance with the ICE design; performing at least two different types of in-situ measurements; predicting, using results of the at least two different types of in situ measurements, performance of the ICE relative to the ICE design; and adjusting the forming of the layers remaining to be formed, at least in part, by updating the ICE design based on the predicted performance.

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Номер записи: 9
18-01-2018 дата публикации

Laminate substrate measurement method, laminate substrate and measurement apparatus

Номер: US20180017484A1
Автор: Kenji Kasahara, Taiki Yamamoto, Taketsugu Yamamoto
Принадлежит: Sumitomo Chemical Co Ltd

A measurement method for a laminate substrate is provided. The laminate substrate has: a base substrate; an absorption layer; and a measurement-target layer in this order. The measurement-target layer has a single measurement-target monolayer or a plurality of measurement-target monolayers. The method includes: emitting incident light including light with a wavelength shorter than a threshold wavelength from a side on which the measurement-target layer is positioned, and measuring reflected light and acquiring mutually independent 2n (n is a layer count of the measurement-target monolayers included in the measurement-target layer and is an integer equal to one or larger) or more reflected light-related values for wavelengths equal to the threshold wavelength or shorter; and calculating values related to the measurement-target monolayers for each measurement-target monolayer included in the measurement-target layer using the 2n or more reflected light-related values.

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Номер записи: 10
25-01-2018 дата публикации

SYSTEM, METHOD AND APPLICATIONS INVOLVING IDENTIFICATION OF BIOLOGICAL CIRCUITS SUCH AS NEUROLOGICAL CHARACTERISTICS

Номер: US20180020921A1
Автор: Airan Raag D., Deisseroth Karl, Meltzer Leslie A.
Принадлежит:

Various aspects are directed to systems and methods for assessing neural activity of a neural region having multiple subfields. In certain embodiments, a method includes evoking a cellular electrical response in at least one subfield due to neural activity in the neural region, capturing image data of the electrical response at a level sufficiently detailed in space and time to differentiate between polarization-based events of two respective portions of the subfield, and then assessing neural activity by correlating space and time information, from the captured data, for the two respective portions of the sub-field. Other more specific aspects of the invention involve different preparation and neural stimulation approaches which can vary depending on the application. 138.-. (canceled)39. A system for assessing neural activity , the system comprising:a stimulator configured to evoke a cellular electrical response in at least one subfield of a neural tissue in a neural region having multiple subfields by stimulating neuronal cells of the neural region that express a light-activated ion channel and/or a light-activated ion pump protein;an imager configured to capture image data of the cellular electrical response at space and time limits of resolution that allow for differentiation between polarization-based events of two portions of the at least one subfield, wherein each of the two portions comprises a group of neurons; anda processor configured for assessing neural activity, wherein assessing neural activity comprises correlating space and time information, from the captured image data, for the two portions of the at least one subfield to produce correlation results.40. The system according to claim 39 , further comprising a composition comprising a nucleic acid encoding the light-activated ion channel and/or the light-activated ion pump protein.41. The system according to claim 39 , further comprising a composition for staining the neural tissue claim 39 , wherein ...

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Номер записи: 11
28-01-2016 дата публикации

Spectral Ellipsometry Measurement and Data Analysis Device and Related Systems and Methods

Номер: US20160025618A1
Автор: Jun Chung-Sam, KO Woo-Seok, LEE Sang-Kil, Ryu Sung-yoon, YANG Yu-Sin
Принадлежит:

Spectral ellipsometry measurement systems are provided including a polarizer that rotates at a first angle and adjusts a polarizing direction of incident light of a measurement sample; a compensator that rotates at a second angle, different from the first angle, and adjusts a phase difference of the incident light; an analyzer that rotates at a third angle and adjusts a polarizing direction of light reflected on the measurement sample; a detector that detects a spectral image from the reflected light; a controller that controls one of the polarizer, the compensator, and the analyzer according to polarizer-compensator-analyzer (PCA) angle sets including the first to third angles; and a processor that receives, from the detector, a first spectral image corresponding to a first PCA angle set and a first wavelength and a second spectral image corresponding to a second PCA angle set and a second wavelength, different from the first wavelength, and generates a polarizer-compensator-analyzer rotating (PCAR) spectral matrix using the first and second spectral images. 1. A spectral ellipsometry measurement system comprising:a polarizer that rotates at a first angle and adjusts a polarizing direction of incident light of a measurement sample;a compensator that rotates at a second angle, different from the first angle, and adjusts a phase difference of the incident light;an analyzer that rotates at a third angle and adjusts a polarizing direction of light reflected on the measurement sample;a detector that detects a spectral image from the reflected light;a controller that controls one of the polarizer, the compensator, and the analyzer according to polarizer-compensator-analyzer (PCA) angle sets including the first to third angles; anda processor that receives, from the detector, a first spectral image corresponding to a first PCA angle set and a first wavelength and a second spectral image corresponding to a second PCA angle set and a second wavelength, different from the ...

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Номер записи: 12
26-01-2017 дата публикации

Interferometric Ellipsometry and Method using Conical Refraction

Номер: US20170023464A1
Автор: Arieli Yoel, COHEN YOEL
Принадлежит:

An apparatus and method for determining optical properties of an object () includes a light source () and an optical system for illuminating at least one point of the object with light from the light source, and collecting light reflected from the object. A biaxial birefringent crystal () intercepts a beam of light reflected from the object and propagates the beam along an optical axis of the crystal and transforms the beam of reflected light to a ring of light having a periphery, each point of which has a different polarization plane. A detector array () detects respective points along the periphery of the ring and a processing unit () is coupled to the detector and is responsive to signals thereby for determining optical properties of the object. 1. An apparatus comprising:a light source;an optical system for illuminating at least one point of an object with light from said light source, and collecting light reflected from the object;a biaxial birefringent crystal for intercepting a beam of light reflected from the object and for propagating said beam along an optical axis of the crystal and transforming the beam of reflected light to a ring of light, each point of said ring of light having a different polarization plane;a detector array for detecting respective points along said ring; anda processing unit coupled to the detector array and being responsive to signals thereby for determining ellipsometric optical properties of the object,the apparatus thereby being configured to determine ellipsometric optical properties of the object, without requiring use of a rotating optical element.2. The apparatus according to claim 1 , wherein the light source is composed of multiple spectral bands.3. The apparatus according to claim 2 , wherein the spectrum of the light source is modulated.4. The apparatus according to claim 1 , wherein the biaxial birefringent crystal is dispersive.5. The apparatus according to claim 1 , wherein the light source is monochromatic.6. The ...

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Номер записи: 13
26-01-2017 дата публикации

Automated Metrology System Selection

Номер: US20170023491A1
Автор: Heyin Li, Lie-Quan Lee, Meng Cao, Mengmeng Ye, Qiang Zhao
Принадлежит: KLA Tencor Corp

Methods and systems for evaluating and ranking the measurement efficacy of multiple sets of measurement system combinations and recipes for a particular metrology application are presented herein. Measurement efficacy is based on estimates of measurement precision, measurement accuracy, correlation to a reference measurement, measurement time, or any combination thereof. The automated the selection of measurement system combinations and recipes reduces time to measurement and improves measurement results. Measurement efficacy is quantified by a set of measurement performance metrics associated with each measurement system and recipe. In one example, the sets of measurement system combinations and recipes most capable of measuring the desired parameter of interest are presented to the user in rank order based on corresponding values of one or more measurement performance metrics. A user is able to select the appropriate measurement system combination in an objective, quantitative manner.

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Номер записи: 14
24-01-2019 дата публикации

System for measuring transport properties of materials and related method

Номер: US20190025196A1
Автор: Wang Xiao-Ping, XIANG Xiao-dong
Принадлежит: Ningbo Molian Materials Technology Inc.

A material transport property measurement system includes an ellipsometry system, a heat capacity measurement system, and a controller. The ellipsometry system has a light source to generate a light which passes through a polarizer and shines on a sample. The sample reflects the light to an integrated polarization analyzer, which includes multiple polarizers with different polarization angles distributed from 0 to 180 degrees. A detector assembly includes multiple detectors corresponding to the multiple polarizers to detect light passing through the respective polarizers and generate multiple first electrical signals. The heat capacity measurement system measures a temperature parameter of the sample using a non-contact method, and outputs a second electrical signal. The controller analyzes the second and the multiple first electrical signals to obtain the transport properties of the material. A material transport property measurement method is also provided. 1. A transport properties measurement apparatus , comprising:an ellipsometry apparatus, a heat capacity measurement system, and a controller, wherein the ellipsometry apparatus and the heat capacity measurement system are electrically connected to the controller;wherein the ellipsometry apparatus comprises a light source, a polarizer, a sample stage, an integrated polarization analyzer, and a detector assembly disposed along an optical path;wherein the sample stage is configured to support a sample being measured, wherein a light emitted by the light source passes through the polarizer and shines on the sample, and the light is reflected from the sample to the integrated polarization analyzer;wherein multiple polarized light reflected from the sample enter the integrated polarization analyzer, wherein the detector assembly is connected to the integrated polarization analyzer to detect the multiple light signals, to convert the multiple light signals to multiple first electrical signals, and to output them to ...

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Номер записи: 15
23-01-2020 дата публикации

SYSTEM AND METHOD FOR USE IN HIGH SPATIAL RESOLUTION ELLIPSOMETRY

Номер: US20200025678A1
Автор: KENAZ Ralfy, Rapaport Ronen
Принадлежит:

System and method for use in optical monitoring of a sample. The system comprising: a light source unit () for providing collimated illumination; polarization modulation unit () located in optical path of light propagating from the light source unit; a lens unit () for focusing light onto an illumination spot on a surface of a sample, and for collection of light components returning from the sample; a light collection unit configured for collecting light returning from the sample and generate output image data associated with Fourier plane imaging with respect to surface of the sample; and a control unit () configured processing said data in accordance with said system calibration. The method provides calibration data, and comprising: providing reference data indicative of complex refractive index of the reference samples on at least two reference samples; collecting ellipsometry data for said at least two reference samples using the ellipsometry system, generating output data having a plurality of data pieces, each associated with unknown angular direction; and for each data piece corresponding to an unknown angular direction, determining simultaneously system parameters and angle of incidence in accordance with corresponding parameters of the reference data to thereby determine calibration data. 1. A system for use in optical monitoring of a sample , the system comprising:a light source unit configured for providing substantially collimated optical illumination of a selected wavelength range propagating along a first optical axis;polarization modulation unit located in optical path of light propagating along said first optical axis and configured for selectively varying polarization of light passing therethrough;a lens unit located in optical path along said first optical axis and configured for focusing light onto an illumination spot on a surface of the sample located on a dedicated sample holder, and for collection of light components returning from said ...

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Номер записи: 16
28-01-2021 дата публикации

Multilayer structure inspection apparatus and method, and semiconductor device fabricating method using the inspection method

Номер: US20210026152A1
Автор: Chung-Sam Jun, Hyun-su Kwak, Jung-Won Kim, Sung-Yoon Ryu, Yu-Sin Yang
Принадлежит: Korea Advanced Institute of Science and Technology KAIST, SAMSUNG ELECTRONICS CO LTD

Provided are a multilayer structure inspection apparatus and method of inspecting a multilayer structure in a sample without damaging the sample, the multilayer structure inspection apparatus being configured to measure both of reflectance and dispersion without damaging the sample, wherein the reflectance and dispersion are variables which are changed sensitively to a change in a repetitive pattern of the multilayer structure, by measuring values thereof, a structural change of the sample between before and after a process is inspected with high accuracy.

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Номер записи: 17
17-02-2022 дата публикации

Spectroscopic measuring apparatus and method, and method for fabricating semiconductor device using the measuring method

Номер: US20220049949A1
Автор: Jangryul Park, Kwangrak Kim, Soonyang Kwon, Yunje CHO
Принадлежит: SAMSUNG ELECTRONICS CO LTD

A spectroscopic measuring apparatus and method are provided. The apparatus includes a first light source, object, microlens, and imaging lenses, an optical fiber, a spectrometer and a position controller. The object lens to allows light from the first light source to be incident on a stage configured to support a measurement object. The microlens is disposed between the object lens and the stage. The imaging lens images light reflected from the measurement object. The optical fiber has an input terminal disposed on a first image plane of the imaging lens. The spectrometer is disposed at an output terminal of the optical fiber. The position controller controls positions of the object lens, the microlens, and the optical fiber, and adjusts the position of the object lens so that a focus of the object lens is positioned at a virtual image position of a virtual image generated by the microlens.

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Номер записи: 18
17-02-2022 дата публикации

EUV SPECTROSCOPIC POLARIMETER

Номер: US20220049990A1
Автор: CHANG Kuang-Yu, Chen Ming-Chang, HUANG Pei-Chi
Принадлежит:

We have invented an EUV spectroscopic polarimeter including a light receiving element, a first polarizing modulation element, a second polarizing modulation element, an energy splitting element and a light detecting and analyzing apparatus. The light receiving element is for receiving a target light. The first polarizing modulation element is rotatably connected to the light receiving element for generating a first polarized light. The second polarizing modulation element is rotatably connected to the first polarizing modulation element for generating a second polarized light. The energy splitting element receives the second polarized light so as to generate a modulated-polarization and energy-resolved light. The light detecting and analyzing apparatus receiving the polarization-modulated and energy-resolved light and providing a spectrum information by an analyzing algorithm which is able to retrieve the helicity, ellipticity, tilt angle and the degree of polarization for the whole spectrum of the target light. 1. An EUV spectroscopic polarimeter , which is operated in a vacuum-based environment , comprising:a light entrance for receiving a target light;a first polarizing modulation element rotatably connected to the light entrance, wherein the target light passes through the first polarizing modulation element so as to generate a first polarized light;a second polarizing modulation element rotatably connected to the first polarizing modulation element, wherein the first polarized light passes through the second polarizing modulation element so as to generate a second polarized light;dispersive element receiving the second polarized light so as to generate a polarization-modulated and wavelength-resolved light; anda light detecting and analyzing apparatus receiving the polarization-modulated and wavelength-resolved light and providing a spectrum information, wherein the spectrum information comprises at least one energy information.2. The EUV spectroscopic ...

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Номер записи: 19
06-02-2020 дата публикации

Plasma Source with Lamp House Correction

Номер: US20200041774A1
Автор: Bezel Ilya, ZHANG Shiyu
Принадлежит:

A plasma light source with lamp house correction is disclosed. The system may include a pump source configured to generate pump illumination. The pump illumination may be directed, by an elliptical reflector element, to a volume of gas contained within a plasma lamp in order to generate a plasma. The plasma may be configured to generate broadband illumination. The system may also include a correction plate and/or an aspherical elliptical reflector element configured to alter the pump illumination to correct for aberrations introduced by the plasma lamp. The system may also include an additional aspherical correction plate configured to alter the broadband illumination to correct for aberrations introduced by optical elements of the system. 1. A system , comprising:a pump source configured to generate pump illumination;a correction plate configured to receive the pump illumination and modify one or more characteristics of the pump illumination in order to correct one or more aberrations of the pump illumination introduced by one or more optical elements of the system; anda reflector element configured to receive the pump illumination and direct the pump illumination to a volume of gas contained within a plasma lamp, wherein the plasma lamp is configured to sustain a plasma within the volume of gas to generate broadband illumination.2. The system of claim 1 , wherein the plasma lamp comprises a cylindrical plasma lamp.3. The system of claim 1 , wherein the reflector element comprises an aspherical reflector element.5. The system of claim 1 , wherein the plasma lamp comprises a substantially prolate spheroid-shaped plasma lamp.6. The system of claim 1 , wherein the correction plate comprises an aspherical correction plate configured to correct one or more aberrations of the pump illumination introduced by the plasma lamp.8. The system of claim 1 , further comprising a compensator plate configured to receive the pump illumination and direct the pump illumination toward ...

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Номер записи: 20
18-02-2021 дата публикации

Method and apparatus for analysing a component

Номер: US20210048384A1
Автор: James R. Fortune
Принадлежит: Rolls Royce PLC

A method of analysing a component formed from a metal alloy to identify a possible defect, wherein the metal alloy comprises a first crystal grain region and the possible defect comprises a second crystal grain region aligned to a different axis to the first crystal grain region, the method comprising the steps of: obtaining a first image of the component illuminated using a first polarisation state of light, the first image comprising first polarisation data; obtaining a second image of the component illuminated using a second polarisation state of light different to the first polarisation state, the second image comprising second polarisation data; determining a difference in polarisation data for plural pixels of the first image between each pixel of the first image and a corresponding pixel of the second image; and identifying pixels corresponding to the second crystal grain region based on the difference in polarisation data.

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Номер записи: 21
16-02-2017 дата публикации

DEVICE FOR ANALYSING A SPECIMEN AND CORRESPONDING METHOD

Номер: US20170045397A1
Автор: Heussler Sascha Pierre, Schmidt Daniel
Принадлежит: NATIONAL UNIVERSITY OF SINGAPORE

A device for analysing a specimen is disclosed. The device comprises a first polarizer for polarizing a first beam of electromagnetic radiation; an optical device for directing the polarized beam of electromagnetic radiation at the specimen to enable interaction between the polarized beam of electromagnetic radiation and the specimen to cause generation of a second beam of electromagnetic radiation; a plurality of second polarizers for dividing the wavefront of the second beam of electromagnetic radiation into a plurality of beams of electromagnetic radiation polarized with different polarization states; and at least one spectrometer for analysing respective electromagnetic spectrums of the plurality of polarized beams of electromagnetic radiation to enable the specimen to be characterised. A related method is also disclosed. 1. A device for analysing a specimen , comprising:a first polarizer for polarizing a first beam of electromagnetic radiation;an optical device for directing the polarized beam of electromagnetic radiation at the specimen to enable interaction between the polarized beam of electromagnetic radiation and the specimen to cause generation of a second beam of electromagnetic radiation;a plurality of second polarizers for dividing the wavefront of the second beam of electromagnetic radiation into a plurality of beams of electromagnetic radiation polarized with different polarization states; andat least one spectrometer for analysing respective electromagnetic spectrums of the plurality of polarized beams of electromagnetic radiation to enable the specimen to be characterised.2. The device of claim 1 , wherein the device further includes a beam source arranged to generate the first beam of electromagnetic radiation selected from the group consisting of ultraviolet radiation claim 1 , visible light claim 1 , infrared radiation and Terahertz radiation.3. The device of claim 2 , wherein the beam source is further arranged to generate the first beam of ...

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Номер записи: 22
15-02-2018 дата публикации

Optical element testing methods and systems employing a broadband angle-selective filter

Номер: US20180045602A1
Автор: David L. Perkins, James M. Price
Принадлежит: Halliburton Energy Services Inc

An optical element testing system includes a broadband angle-selective filter arranged along an optical path with an optical element to be tested. The system also includes a electromagnetic radiation transducer that outputs a signal in response to electromagnetic radiation that passes through the broadband angle-selective filter. The system also includes a storage device that stores data corresponding to the signal output from the electromagnetic radiation transducer, wherein the data indicates a property of the optical element in response to a test.

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Номер записи: 23
03-03-2022 дата публикации

Method for determining properties of a sample by ellipsometry

Номер: US20220065774A1
Автор: Matthias Duwe
Принадлежит: Accurion GmbH

A method for determining properties of a sample ( 12 ) by ellipsometry includes positioning the sample ( 12 ) in an ellipsometer ( 10 ) so that a surface normal (n) of a measurement region of the sample surface is tilted relative to a reference axis (z) of the ellipsometer ( 10 ) and measuring a Mueller matrix for the measurement region. The method then includes creating an equation system by equating the measured Mueller matrix and a matrix product formed of: a rotation matrix about an input rotation angle (γ); an isotropic Mueller matrix in normalized NCS form and a rotation matrix about an output rotation angle (−δ). The method then solves the equation system for the parameters representing the sample properties to be determined. The input rotation angle (γ) and the output rotation angle (—δ) are set as parameters independent of one another when setting up the equation system.

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Номер записи: 24
14-02-2019 дата публикации

Variable Aperture Mask

Номер: US20190049365A1
Автор: Blasenheim Barry, Friedmann Michael, Rovira Pablo, Sapiens Noam
Принадлежит:

In some embodiments, a collection system of a semiconductor metrology tool includes a chuck to support a target from which an optical beam is reflected and an aperture mask to provide an adjustable aperture for the reflected optical beam. The aperture mask includes a plurality of opaque plates with adjustable positions. The collection system also includes a spectrometer to receive the reflected optical beam. The aperture mask is situated between the chuck and the spectrometer along the optical axis. 1. An aperture mask for use in a semiconductor metrology tool , comprising:a frame having a hole to allow transmission of an optical beam; anda plurality of opaque plates mechanically coupled to the frame and having adjustable positions with respect to the hole, to block respective portions of the hole and corresponding parts of the optical beam.2. The aperture mask of claim 1 , wherein:the plurality of opaque plates comprises a first opaque plate and a second opaque plate; a first translation stage, on which the first opaque plate is mounted, to adjust a linear position of the first opaque plate; and', 'a second translation stage, on which the second opaque plate is mounted, to adjust a linear position of the second opaque plate;, 'the aperture mask further comprisesthe first and second translation stages are mechanically coupled to the frame; andthe first and second translation stages are independently operable to adjust the linear positions of the first and second opaque plates.3. The aperture mask of claim 2 , wherein the first and second translation stages are motorized.4. The aperture mask of claim 2 , wherein the first and second translation stages are substantially aligned along a common axis and allow independent adjust of the linear positions of the first and second opaque plates along the common axis.5. The aperture mask of claim 2 , further comprising a rotation stage mounted on the frame and having a hole to allow transmission of the optical beam claim 2 , ...

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Номер записи: 25
26-02-2015 дата публикации

Broadband And Wide Field Angle Compensator

Номер: US20150055123A1
Автор: Arain Muzammil, Flock Klaus, Rotter Lawrence, Wang David Y.
Принадлежит:

A rotatable compensator configured to transmit non-collimated light over a broad range of wavelengths, including ultraviolet, with a high degree of retardation uniformity across the aperture is presented. In one embodiment, a rotatable compensator includes a stack of four individual plates in optical contact. The two thin plates in the middle of the stack are made from a birefringent material and are arranged to form a compound, zeroth order bi-plate. The remaining two plates are relatively thick and are made from an optically isotropic material. These plates are disposed on either end of the compound, zeroth order bi-plate. The low order plates minimize the sensitivity of retardation across the aperture to non-collimated light. Materials are selected to ensure transmission of ultraviolet light. The optically isotropic end plates minimize coherence effects induced at the optical interfaces of the thin plates. 1. A parallel plate compensator , comprising:a first birefringent plate having a front surface, a back surface, an optic axis oriented in a plane parallel to the front and back surfaces within a manufacturing tolerance, and a thickness of less than five hundred micrometers;a second birefringent plate having a front surface, a back surface, an optic axis oriented in a plane parallel to the front and back surfaces within the manufacturing tolerance, and a thickness of less than five hundred micrometers, wherein the first birefringent plate and the second birefringent plate are oriented such that the optic axis of the first birefringent plate is aligned approximately perpendicular to the optic axis of the second birefringent plate; anda first optically isotropic plate in optical contact with the front surface of the first birefringent plate, the optically isotropic plate having a thickness of at least five hundred micrometers, wherein a refractive index of the optically isotropic plate is within 15% of a mean refractive index of the first birefringent plate.2. The ...

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Номер записи: 26
25-02-2021 дата публикации

EVALUATION METHOD OF SILICON WAFER

Номер: US20210055232A1
Автор: ARAKI Koji, ARAKI Nobue, Okabe Kazuki, SUDO Haruo
Принадлежит: GLOBALWAFERS JAPAN CO., LTD.

An evaluation method of a silicon wafer allows non-destructive and non-contact inspection of a slip that affects the electrical properties of semiconductor devices, without being subjected to restrictions of the surface condition of silicon wafers or processing contents as much as possible. The evaluation method of a silicon wafer includes a step of section analysis where a surface of a single crystal silicon wafer after thermal processing is divided by equally-spaced lines into sections with an area of 1 mmor more and 25 mmor less and the existence of strain in each of the sections is determined based on a depolarization value of polarized infrared light, and a screening step where the wafer is evaluated as non-defective when the number of adjacent sections being determined to have strain by the section analysis step does not exceed a predetermined threshold value. 1. An evaluation method of a silicon wafer , comprising: a step of section analysis where a surface of a single crystal silicon wafer after thermal processing is divided by equally-spaced lines into sections having an area of not less than 1 mmand not more than 25 mmand presence of strain in each of the sections is determined based on a depolarization value of polarized infrared light; and a screening step where the wafer is evaluated as non-defective when the number of adjacent sections that are determined to have strain by the section analysis step does not exceed a predetermined threshold value.2. The evaluation method of a silicon wafer in claim 1 , wherein the number of adjacent sections that are determined to have strain is defined as a total number of sections that are determined to have strain located in front-back claim 1 , left-right claim 1 , and diagonal directions around a section that is determined to have strain.3. The evaluation method of a silicon wafer in claim 1 , the predetermined threshold value is determined by in advance obtaining a relation between a slip length of the silicon ...

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Номер записи: 27
23-02-2017 дата публикации

Broadband And Wide Field Angle Compensator

Номер: US20170052112A1
Автор: Arain Muzammil, Flock Klaus, Rotter Lawrence, Wang David Y.
Принадлежит:

A rotatable compensator configured to transmit non-collimated light over a broad range of wavelengths, including ultraviolet, with a high degree of retardation uniformity across the aperture is presented. In one embodiment, a rotatable compensator includes a stack of four individual plates in optical contact. The two thin plates in the middle of the stack are made from a birefringent material and are arranged to form a compound, zeroth order bi-plate. The remaining two plates are relatively thick and are made from an optically isotropic material. These plates are disposed on either end of the compound, zeroth order bi-plate. The low order plates minimize the sensitivity of retardation across the aperture to non-collimated light. Materials are selected to ensure transmission of ultraviolet light. The optically isotropic end plates minimize coherence effects induced at the optical interfaces of the thin plates. 1. A parallel plate compensator , comprising:a first birefringent plate having a front surface, back surface, an optic axis oriented in a plane parallel to the front and back surfaces within a manufacturing tolerance, and a thickness of less than five hundred micrometers;a second birefringent plate having a front surface, a back surface, an optic axis oriented in a plane parallel to the front and back surfaces within the manufacturing tolerance, and a thickness of less than five hundred micrometers; anda first optically isotropic plate in optical contact with the front surface of the first birefringent plate, the optically isotropic plate having a thickness of at least five hundred micrometers, wherein a refractive index of the optically isotropic plate is within 15% of a mean refractive index of the first birefringent plate.2. The parallel plate compensator of claim 1 , further comprising:a third birefringent plate having a front surface, a back surface, an optic axis oriented in a plane parallel to the front and back surfaces within the manufacturing ...

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Номер записи: 28
10-03-2022 дата публикации

PUPIL ELLIPSOMETRY MEASUREMENT APPARATUS AND METHOD AND METHOD OF FABRICATING SEMICONDUCTOR DEVICE USING THE PUPIL ELLIPSOMETRY MEASUREMENT METHOD

Номер: US20220074848A1
Автор: HIDAKA Yasuhiro, Jung Jaehwang, KIM Jinseob, Kim Wookrae, Lee Myungjun, NUMATA Mitsunori
Принадлежит: SAMSUNG ELECTRONICS CO., LTD.

Provided is a pupil ellipsometry measurement apparatus configured to measure an object, the pupil ellipsometry measurement apparatus including a stage configured to support the object to be measured, a light source unit configured to generate and output light, an irradiation optical system configured to focus the light from the light source unit on the object, a first detector configured to detect an image of reflected light from the object on an imaging plane, a self-interference generator (SIG) configured to generate self-interference with respect to the reflected light, a second detector configured to detect a hologram image of interference light of the SIG on a pupil plane, and a processor configured to reconstruct reflectance information based on the hologram image, and measure the object. 1. A pupil ellipsometry measurement apparatus configured to measure an object , the pupil ellipsometry measurement apparatus comprising:a stage configured to support the object to be measured;a light source unit configured to generate and output light;an irradiation optical system configured to focus the light from the light source unit on the object;a first detector configured to detect an image of reflected light from the object on an imaging plane;a self-interference generator (SIG) configured to generate self-interference with respect to the reflected light;a second detector configured to detect a hologram image of interference light of the SIG on a pupil plane; anda processor configured to reconstruct reflectance information based on the hologram image, and measure the object.2. The pupil ellipsometry measurement apparatus of claim 1 , wherein the SIG comprises a polarizing prism and a first polarizer claim 1 ,wherein the polarizing prism is configured to split the reflected light into two polarized beams that have different polarizations, andwherein the first polarizer is configured to change the two polarized beams to have a common polarization component and combine ...

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Номер записи: 29
03-03-2016 дата публикации

Optical Measuring Methods and Apparatus

Номер: US20160061585A1
Автор: PARK Jang-Ik, Seo Dong-Min
Принадлежит:

In an optical measuring method, a first spectrum and a second spectrum are obtained from a pattern and a thin layer formed on the pattern by a deposition process using an ellipsometer respectively. A skew spectrum is obtained between the first spectrum and the second spectrum. A fourier transform operation is performed on the skew spectrum to calculate a thickness of the thin layer on the pattern. 1. An optical measuring method , comprising:obtaining, via an ellipsometer, a first spectrum from a pattern and a second spectrum from a thin layer formed on the pattern by a deposition process;obtaining a skew spectrum between the first spectrum and the second spectrum; andperforming a fourier transform operation on the skew spectrum to calculate a thickness of the thin layer on the pattern.2. The method of claim 1 , wherein obtaining the first spectrum and the second spectrum comprises obtaining an amplitude ratio (tan(Ψ)) or phase difference (Å) spectrum of a reflected light from the pattern and the thin layer on the pattern.3. The method of claim 1 , wherein performing a fourier transform operation to calculate the thickness of the thin layer comprises:performing a fourier transform operation on the skew spectrum to obtain a fourier transform spectrum; anddetermining the thickness of the thin layer based on a peak position of the fourier transform spectrum.4. The method of claim 1 , further comprising:obtaining a plurality of third spectrums by detecting a reflected light from thin layers respectively formed on a plurality of patterns, the thin layers having different thicknesses; andobtaining a plurality of skew spectrums of the third spectrums with respect to the first spectrum.5. The method of claim 4 , further comprising:performing a plurality of fourier transform operations on the plurality of the skew spectrums respectively to obtain reference data for the thicknesses of the thin layers.6. The method of claim 1 , wherein the thin layer has a thickness of about 1 ...

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Номер записи: 30
28-02-2019 дата публикации

Laser crystallization measuring apparatus and method

Номер: US20190064059A1
Автор: Dong-Seop Lim, Jin Seo, Jun-Yeong Choi, Kyoung Su Kim, Se Yoon Oh, Seung-Ho HAN, Sung Hoon Yang, Yong Jun Park
Принадлежит: K-MAC, Samsung Display Co Ltd

A laser crystallization measuring apparatus including a spectrometer configured to measure actual data of a spectrum of an actual polycrystalline silicon layer crystallized by a laser crystallization device, and a simulation device that is connected to the spectrometer and is configured to determine simulation data of a spectrum of a virtual polycrystalline silicon layer according to a shape of a virtual protrusion formed in the virtual polycrystalline silicon layer, wherein a shape of an actual protrusion formed in the actual polycrystalline silicon layer is determined by using final data determined by selecting simulation data that is approximate to the actual data.

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Номер записи: 31
10-03-2016 дата публикации

METALLIC GRATINGS AND MEASUREMENT METHODS THEREOF

Номер: US20160069792A1
Автор: "OMullane Sam", Diebold Alain C., Keller Nicholas, Peterson Brennan
Принадлежит:

There is set forth herein in one embodiment, a structure including a metallic grating having a grating pattern, the metallic grating including a critical dimension. The metallic grating can output a spectral profile when exposed to electromagnetic radiation, the spectral profile having a feature. The grating pattern can be configured so that a change of the critical dimension produces a shift in a value of the feature of the spectral profile. A method can include propagating input electromagnetic radiation onto a metallic grating having a two dimensional periodic grating pattern and measuring a critical dimension of the metallic grating using output electromagnetic radiation from the metallic grating. 1. A structure comprising:a metallic grating having a grating pattern, the metallic grating including a critical dimension;wherein the metallic grating outputs a spectral profile when exposed to electromagnetic radiation, the spectral profile having a feature;wherein the grating pattern is configured so that a change of the critical dimension produces a shift in a value of the feature of the spectral profile.2. The structure of claim 1 , wherein the feature of the spectral profile comprises a local minimum or maximum of the spectral profile.3. The structure of claim 1 , wherein the feature of the spectral profile comprises a peak of the spectral profile.4. The structure of claim 1 , wherein the feature of the spectral profile comprises a local minimum peak of the spectral profile.5. The structure of claim 1 , wherein the feature of the spectral profile comprises a local maximum peak of the spectral profile.6. The structure of claim 1 , wherein the critical dimension has a value of less than 100 nm.7. (canceled)8. The structure of claim 1 , wherein the critical dimension has a value of less than 17 nm.9. The structure of claim 1 , wherein the grating pattern is configured so that the feature of the spectral profile shifts by more than 1% per 1 Å change in the critical ...

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Номер записи: 32
11-03-2021 дата публикации

HIGH-SENSITIVE BIOSENSOR CHIP USING HIGH EXTINCTION COEFFICIENT MARKER AND DIELECTRIC SUBSTRATE, MEASUREMENT SYSTEM, AND MEASUREMENT METHOD

Номер: US20210072149A1
Автор: CHEGAL Won, CHO Hyun-mo, CHO Yong-jai, Kim Dong-Hyung
Принадлежит:

The present chip relates to a high-sensitive biosensor chip using a high extinction coefficient marker and a dielectric substrate, a measurement system, and a measurement method and, more specifically, to an ellipsometry-based high-sensitive biosensor technology or a measurement method using same, the technology amplifying an elliptically polarized signal by a marker having a high extinction coefficient and a dielectric substrate. The marker and the substrate used in the present chip measure a Brewster's angle shift or an elliptical polarization measurement angle with respect to an ultra-low concentration biological material (e.g. antibody or DNA). 1. A highly sensitive biosensor chip using a marker having a large extinction coefficient and a dielectric substrate , the biosensor chip comprising:the dielectric substrate to which incident light is incident at a specific incident angle and is reflected from the dielectric substrate;an analyte section which is fixed on the substrate; andthe marker that is bonded to the analyte section and amplifies an elliptical polarization signal.2. The highly sensitive biosensor chip using a marker having a large extinction coefficient and a dielectric substrate according to claim 1 ,wherein the marker has an extinction coefficient which is equal to or larger than a specific value at light having a specific wavelength region.3. The highly sensitive biosensor chip using a marker having a large extinction coefficient and a dielectric substrate according to claim 2 ,wherein the specific value k is 1.000.4. The highly sensitive biosensor chip using a marker having a large extinction coefficient and a dielectric substrate according to claim 3 ,wherein the analyte sectioncauses a surface of the dielectric substrate to function as a self-assembled thin film and fixes a capture antibody to the surface, andincludes a detection antibody which attached to the marker and a biological bonding substance which is bonded between the detection ...

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Номер записи: 33
19-03-2015 дата публикации

Method for optical inspection and system thereof

Номер: US20150077751A1
Автор: Chih-Jung Chiang, Fu-Cheng Yang, Yi-Chen Hsieh
Принадлежит: Industrial Technology Research Institute ITRI

An optical inspection system suitable for inspecting a thin film is provided, in which a computer controls a controller to rotate angles of at least two of a polarization device, a phase compensation device and an analyzer at various incident wavelengths and incident angles of a light source, such that the intensities of a first image corresponding to the incident wavelengths and the incident angles of the light source are zero. The computer further records the rotated angles of at least two of the polarization device, the phase compensation device and the analyzer and intensities of a second image corresponding to the incident wavelengths and the incident angles when the intensities of the first image are zero, thereby obtaining a profiling diagram and a maximum intensity of the second images, in which the maximum intensity corresponds to a maximum grey level.

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Номер записи: 34
19-03-2020 дата публикации

POLARIZATION CHANGE DETECTION

Номер: US20200088583A1
Автор: Acker Andrew N., DeWeert Michael J.
Принадлежит: BAE Systems Information and Electronic Systems Integration Inc.

An object detection system uses a change in a linear polarization statistic between a first image at a first time and a second image at a second time to determine the presence or the likelihood of an object beneath a surface. The presence of the object may be determined by regions of anomalously high changes in the polarization statistic. The system may use a polarization change detection detector which may simultaneously capture images in multiple polarization channels. Further, the polarization change detection detector may be coupled with a laser interferometry system. 1. A system for detecting an object below a surface , the system comprising:{'sub': 1', '2, 'a polarization change detection (PCD) detector that captures a first image of the surface at a first time (T) and a second image of the surface at a subsequent second time (T); and'}{'sub': 1', '2', '1', '2, 'a processor in operative communication with the PCD detector to determine a degree of linear polarization (DOLP) of the first image at Tand a DOLP of the second image at T, wherein the surface changes from Tto Tand the processor determines a statistic associated with the DOLP.'}2. The system of claim 1 , wherein the PCD detector comprises:logic operative to convert different circular or elliptical polarization states into linear polarization states distinguishable by DOLP.3. The system of claim 1 , wherein the PCD detector comprises:a co-polarization channel; anda cross-polarization channel;wherein the PCD detector consists of only a single imager and the co-polarization channel is a first portion of the single imager and the cross-polarization channel is a second portion of the single imager.5. The system of claim 1 , further comprisinga polarized light source coupled with the PCD detector to illuminate the surface with polarized electromagnetic radiation.6. The system of claim 5 , wherein the polarized light source comprises:a laser transmitter generating a polarized laser beam directed at the ...

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Номер записи: 35
19-03-2020 дата публикации

METHOD FOR EVALUATING STRUCTURE USED FOR NUCLIDE TRANSMUTATION REACTION, EVALUATION DEVICE, STRUCTURE MANUFACTURING DEVICE PROVIDED WITH SAME, AND NUCLIDE TRANSMUTATION SYSTEM

Номер: US20200088629A1
Автор: Tsuruga Shigenori
Принадлежит: MITSUBISHI HEAVY INDUSTRIES, LTD.

A method for evaluating a structure is disclosed, the structure including a base material containing at least one kind of metal selected from the group consisting of hydrogen storage metals and hydrogen storage alloys, an intermediate layer provided on the base material and stacked alternately with a first layer containing low work function substances relatively lower in work function than the metal and a second layer containing the metal, and a surface layer provided on the intermediate layer and containing the metal, wherein the method includes measuring a change in polarization between incident light and reflected light by irradiating the surface layer with light, while holding the structure at a predetermined temperature, and comparing a measurement value of the change in polarization with a threshold of a change in polarization of a structure prepared in advance and evaluating a soundness of the structure based on comparison results. 110-. (canceled)11. A method for evaluating a structure to be used for nuclide transmutation reaction , the structure including a base material containing at least one kind of metal selected from the group consisting of hydrogen storage metals and hydrogen storage alloys , an intermediate layer provided on the base material and stacked alternately with a first layer containing low work function substances relatively lower in work function than the metal and a second layer containing the metal , and a surface layer provided on the intermediate layer and containing the metal , wherein the method comprises:measuring a change in polarization between incident light and reflected light by irradiating the surface layer with light, while holding the structure at a predetermined temperature;calculating an extinction coefficient based on the change in polarization of the structure,preliminarily setting a threshold of the extinction coefficient based on a relationship between an extinction coefficient of a structure prepared in advance and a ...

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Номер записи: 36
19-03-2020 дата публикации

OPTICAL DEVICES FOR CALIBRATING, AND FOR ANALYZING THE QUALITY OF A GLAZING, AND METHODS

Номер: US20200088651A1
Автор: Decourcelle Romain, DUMOULIN Olivier, RYBARCZYK Théo
Принадлежит:

An optical device comprises a first polariscope and a set of first photodetectors and an optical retardation generator. The device is configured to analyze the quality of a glazing. 1. An optical device comprising a first polariscope including in this order , in an optical alignment along an optical axis:a first, preferably polychromatic, light source with a given spectrum, placed orthogonal to the optical axis and delivering configured to deliver a light beam;a first circular polarizer that polarizes in a first polarization rotation direction, placed orthogonal to the optical axis and including a first linear polarizer followed by a first quarter waveplate;a first analyzer, which is a circular polarizer that polarizes in a second polarization rotation direction that is opposite to the first polarization rotation direction, placed orthogonal to the optical axis, said first analyzer including a second quarter waveplate followed by a second linear polarizer; 'placed orthogonal to the optical axis, between the first polarizer and the first analyzer, and in said optical alignment, a calibrated first optical retardation generator for generating optical retardations in a range AB, the first optical retardation generator being in said focal plane;', 'downstream of the first analyzer and in said optical alignment, a first digital sensor, placed orthogonal to the optical axis, and a first objective, placed orthogonal to the optical axis and defining a focal plane, said first objective being located facing the first digital sensor, between the first analyzer and the first digital sensor;'}wherein the first digital sensor includes a set of first photodetectors that are sensitive to the spectrum of the first light source, having a given spectral response, one or more of the first photodetectors, which photodetectors are calibration photodetectors, being located facing the calibrated first optical retardation generator, each calibration first photodetector receiving, in ...

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Номер записи: 37
01-04-2021 дата публикации

BEAMSPLITTER BASED ELLIPSOMETER FOCUSING SYSTEM

Номер: US20210096062A1
Автор: Lesoine John F.
Принадлежит:

An ellipsometer includes a focusing system that uses an image of the measurement spot to determine a best focal position for the ellipsometer. The focus signal is produced by splitting off the ellipsometer measurement spot before the signal is analyzed by a polarizer thereby avoiding imagining the spot with a modulated intensity. The focus signal is imaged on a sensor array and based on the position of the spot on the sensor array, the focal position of the ellipsometer may be determined. A single image may be used to determine the focal position of the ellipsometer permitting a real time focus position measurement. 1. An ellipsometer comprising:a source that emits light along a path;a polarizer that polarizes the light to produce a sample beam that interacts with a sample and is reflected to produce a reflected beam;a compensator disposed in the path of the sample beam or the reflected beam, the compensator induces phase retardations of a polarization state of the light, wherein at least one of the polarizer and the compensator rotates about an axis parallel to a propagation direction of the light;a beamsplitter positioned in the path of the reflected beam after the compensator, the beamsplitter positioned to receive the reflected beam and to direct a first portion of the reflected beam to a focusing system and to direct a second portion of the reflected beam to an analyzer, wherein the first portion of the reflected beam and the second portion of the reflected beam both include an entire cross-section of the reflected beam; a lens system that receives the first portion of the reflected beam, the lens system magnifies any deviation from a best focus position of the ellipsometer; and', 'a first detector positioned to receive the first portion of the reflected beam from the lens system, wherein the first detector comprises a two-dimensional sensor and the lens system in the focusing system produce a spot on the two-dimensional sensor and the two-dimensional sensor ...

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Номер записи: 38
28-03-2019 дата публикации

Systems And Methods For Metrology Beam Stabilization

Номер: US20190094130A1
Автор: Blasenheim Barry, Friedmann Michael, Sapiens Noam
Принадлежит:

Methods and systems for measuring a specimen while actively stabilizing an optical measurement beam subject to changes in polarization by a rotating polarizer element are described herein. Movement of a focused measurement beam spot induced by a rotating polarizer element is compensated by actively controlling the position of an optical element in the beam path based on measurements of the focused measurement beam spot. Both feedback and feedforward control schemes may be employed to reduce beam position error. In one aspect, a measurement system includes a rotating optical polarizer, a beam position sensor, and an active beam compensating element in the illumination beam path, the collection beam path, or both. Beam position errors are detected by the beam position sensor, and control commands are communicated to the active beam compensating element to reduce the measured beam position errors. 1. A measurement system comprising:an illumination source configured to generate an amount of illumination light;one or more illumination optical elements configured to receive the amount of illumination light from the illumination source and project an illumination measurement beam to a specimen under measurement along an illumination beam path;a detector configured to generate a plurality of output signals indicative of a response of the specimen to the incident illumination measurement beam;one or more collection optical elements configured to collect an amount of collected light from the surface of the specimen and project a collection measurement beam from the specimen to the detector along a collection beam path;a rotating optical polarizer element located in the illumination beam path, the collection beam path, or both;a beam position sensor located in the illumination beam path, the collection beam path, or both, after the rotating optical polarizer element, wherein the beam position sensor generates output signals indicative of a location of the measurement beam;an ...

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Номер записи: 39
28-03-2019 дата публикации

Detection And Measurement Of Dimensions Of Asymmetric Structures

Номер: US20190094711A1
Автор: Atkins Phillip R., Dai Qi, Lee Liequan
Принадлежит:

Methods and systems for performing spectroscopic measurements of asymmetric features of semiconductor structures are presented herein. In one aspect, measurements are performed at two or more azimuth angles to ensure sensitivity to an arbitrarily oriented asymmetric feature. Spectra associated with one or more off-diagonal Mueller matrix elements sensitive to asymmetry are integrated over wavelength to determine one or more spectral response metrics. In some embodiments, the integration is performed over one or more wavelength sub-regions selected to increase signal to noise ratio. Values of parameters characterizing an asymmetric feature are determined based on the spectral response metrics and critical dimension parameters measured by traditional spectral matching based techniques. 1. A metrology system comprising:an illumination source configured to generate an amount of broadband optical radiation;an illumination optics subsystem configured to direct the amount of broadband optical radiation from the illumination source to a measurement spot on a surface of a specimen under measurement at each of two or more azimuth angles;a spectrometer configured to detect an amount of measurement light from the semiconductor wafer in response to the illuminating of the semiconductor wafer at each of the two or more azimuth angles and determine a measured spectral response of the structure of interest to the illumination based on each detected amount of measurement light, wherein each measured spectral response includes spectra associated with multiple elements of a Mueller matrix; and estimate values of one or more critical dimension parameters based on a fitting of a modelled spectral response to the measured spectral responses associated with the two or more azimuth angles;', 'select one or more sub-ranges of wavelengths of at least one spectrum of one or more off-diagonal elements of the Mueller matrix associated with each measured spectral response;', 'integrate the at ...

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Номер записи: 40
14-04-2016 дата публикации

Circular polarization filter and application therefor

Номер: US20160103015A1
Автор: Mitsuyoshi Ichihashi
Принадлежит: Fujifilm Corp

Provided are a circular polarization filter including a circularly-polarized light separating layer (preferably, a layer having a cholesteric liquid crystalline phase fixed therein or a laminate including a reflective linear polarizer and a λ/4 phase difference layer), in which the circularly-polarized light separating layer selectively transmits either right-handed circularly polarized light or left-handed circularly polarized light in a specific wavelength region, a transparent medium which is transparent with respect to light in the specific wavelength region is provided at least on one surface side of the circularly-polarized light separating layer, and the transparent medium has an inclined surface which forms an angle of 1° to 30° relative to the surface on the transparent medium side of the circularly-polarized light separating layer, and sensor system using the circular polarization filter. The circular polarization filter of the invention is capable of providing circularly polarized light with a high circular polarizance, or improving sensitivity in the sensor system using circularly polarized light.

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Номер записи: 41
12-04-2018 дата публикации

METROLOGY SYSTEM CALIBRATION REFINEMENT

Номер: US20180100796A1
Автор: Krishnan Shankar, Kwak Hidong, Lesoine John, Poslavsky Leonid, Sadiq Malik, Sushchik Mikhail M., Wei Lanhua
Принадлежит:

Methods and systems for matching measurement spectra across one or more optical metrology systems are presented. The values of one or more system parameters used to determine the spectral response of a specimen to a measurement performed by a target metrology system are optimized. The system parameter values are optimized such that differences between measurement spectra generated by a reference system and the target system are minimized for measurements of the same metrology targets. Methods and systems for matching spectral errors across one or more optical metrology systems are also presented. A trusted metrology system measures the value of at least one specimen parameter to minimize model errors introduced by differing measurement conditions present at the time of measurement by the reference and target metrology systems. Methods and systems for parameter optimization based on low-order response surfaces are presented to reduce the compute time required to refine system calibration parameters. 1. A system comprising:a first illuminator of a target metrology system that provides a first amount of illumination light to one or more structures of a first specimen, the one or more structures having an unknown spectral response;a first spectrometer of the target metrology system that detects a first plurality of intensities of light from the one or more structures in response to the first amount of illumination light provided to the first specimen, the detected first plurality of intensities comprising a first spectral measurement; and receive an indication of a first measured value of at least one structural parameter of the first specimen from a first trusted metrology system;', 'determine a first spectral error associated with the target metrology system based on a difference between the first spectral measurement and a modeled spectral response of the first specimen to measurement by the target metrology system, the modeled spectral response based at least in ...

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Номер записи: 42
12-04-2018 дата публикации

SAMPLE ANALYSIS TOOL EMPLOYING A BROADBAND ANGLE-SELECTIVE FILTER

Номер: US20180100799A1
Автор: Perkins David L., PRICE James M.
Принадлежит:

A sample analysis tool includes a sample chamber to hold a sample. The tool also includes a broadband angle-selective filter arranged along an optical path with the sample chamber. The tool also includes an electromagnetic radiation (ER) transducer that outputs a signal in response to electromagnetic radiation that passes through the broadband angle-selective filter. The tool also includes a storage device that stores data corresponding to the signal output from the ER transducer, wherein the data indicates a property of the sample. 1. A sample analysis tool , comprising:a sample chamber to hold a sample;a broadband angle-selective filter arranged along an optical path with the sample chamber;an electromagnetic radiation (ER) transducer that outputs a signal in response to electromagnetic radiation that passes through the broadband angle-selective filter; anda storage device that stores data corresponding to the signal output from the ER transducer, wherein the data indicates a property of the sample.2. The tool of claim 1 , further comprising a housing and an ER source within the housing.3. The tool of claim 1 , wherein the sample is exposed to an ER source and wherein the data indicates a property of the sample.4. The tool of claim 1 , wherein the sample emits electromagnetic radiation and wherein the data indicates a property of the sample.5. The tool of claim 1 , wherein the broadband angle-selective filter and the ER transducer are arranged within the tool to prevent scattered electromagnetic radiation or non-specular electromagnetic radiation from arriving to the ER transducer.6. The tool of claim 1 , further comprising a supplemental ER transducer to output a supplemental signal in response to an amount of scattered electromagnetic radiation or non-specular electromagnetic radiation that does not pass through the broadband angle-selective filter claim 1 , wherein data corresponding to the supplemental signal is used to determine the property of the sample.7. ...

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Номер записи: 43
19-04-2018 дата публикации

Metrology Systems And Methods For Process Control

Номер: US20180108578A1
Автор: Pandev Stilian Ivanov, Sanko Dzmitry, Shchegrov Andrei V.
Принадлежит:

Methods and systems for estimating values of parameters of interest based on repeated measurements of a wafer during a process interval are presented herein. In one aspect, one or more optical metrology subsystems are integrated with a process tool, such as an etch tool or a deposition tool. Values of one or more parameters of interest measured while the wafer is being processed are used to control the process itself. The measurements are performed quickly and with sufficient accuracy to enable yield improvement of a semiconductor fabrication process flow. In one aspect, values of one or more parameters of interest are estimated based on spectral measurements of wafers under process using a trained signal response metrology (SRM) measurement model. In another aspect, a trained signal decontamination model is employed to generate decontaminated optical spectra from measured optical spectra while the wafer is being processed. 1. A semiconductor wafer processing system comprising:a semiconductor fabrication process chamber comprising a fabrication process environment;a semiconductor wafer disposed inside the fabrication process chamber and exposed to the fabrication process environment during a process interval; an illumination source configured to provide an amount of broadband illumination light directed to a measurement spot on a surface of the semiconductor wafer at a plurality of different times during the process interval;', 'a spectrometer configured to collect an amount of reflected light from the semiconductor wafer and detect a spectral response of the semiconductor wafer to the amount of broadband illumination light over a range of wavelengths at each of the plurality of different times during the process interval;', 'an optical subsystem configured to direct the amount of broadband illumination light from the illumination source to the measurement spot on the surface of the semiconductor wafer during the process interval and direct the amount of light ...

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Номер записи: 44
10-07-2014 дата публикации

Conoscopic illumination optical device with a hollow cone for an optical microscope and method of optical microscopy in conoscopy

Номер: US20140192355A1
Автор: Emmanuel Froigneux, Joachim Schreiber
Принадлежит: HORIBA JOBIN YVON SAS

A method of microscopy and an illumination optical device with a hollow cone for a microscope, the illumination device includes a first conical lens ( 1 ) able to receive a collimated incident light beam ( 10 ) and form a conical light beam ( 20 ), a second conical lens ( 5 ) arranged in such a way as to receive the conical light beam ( 20, 40 ) and to form a cylindrical light beam with a black background ( 50 ) and an optical lens ( 6 ) having an image focal plane ( 12 ) arranged in such a way as to receive the cylindrical light beam with a black background ( 50 ), to form a hollow cone light beam ( 60 ) and to focus the hollow cone light beam ( 60 ) into a point ( 18 ) in the image focal plane ( 12 ).

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Номер записи: 45
28-04-2016 дата публикации

NON-LINEAR OPTICAL ELLIPSOMETRY FOR SURFACE MONITORING AND CHARACTERIZATION

Номер: US20160116396A1
Автор: Belk John H., Hunt Jeffrey H.
Принадлежит:

The present disclosure relates to monitoring, evaluating and interrogating material surfaces using second-order nonlinear optical ellipsometry for surface monitoring and characterization. 1. A method for non-invasively evaluating a substrate material surface comprising the steps of:positioning a first optical source and a second optical source wherein each optical source emits an optical source input signal, with at least one optical source polarization control in communication with each optical source;directing each optical source input signal from each optical source to a polarization control;directing each optical source input signal from the optical source polarization control to a predetermined area on a substrate comprising a substrate material surface;mixing the optical source input signals at the predetermined area on the substrate material surface to produce a combined output signal;positioning a detector at a predetermined location, said detector in communication with a polarization rotator and a polarization controller;directing at least a portion of the output signal from the predetermined area on the substrate material surface to the polarization controller and polarization rotator to null the output signal; anddirecting at least a portion of the output signal from the polarization rotator to the detector;detecting at least a portion of the output signal that is directed from the predetermined area on the substrate material surface to the detector; andcharacterizing features of the predetermined area on the substrate material surface at a molecular level based on the characteristics of the output signals received by the detector.2. The method of claim 1 , wherein each optical source is a laser.3. The method of claim 1 , wherein each optical source emits an input signal at a predetermined frequency claim 1 , with each frequency tuned to a frequency that is substantially equivalent to a substrate material surface resonance.4. The method of claim 3 , ...

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Номер записи: 46
27-04-2017 дата публикации

SYSTEM AND METHOD FOR DETECTION OF MATERIALS USING ORBITAL ANGULAR MOMENTUM SIGNATURES

Номер: US20170115220A1
Автор: ASHRAFI SOLYMAN, LINQUIST ROGER
Принадлежит:

An apparatus for detecting a presence of a predetermined material within a sample uses signal generation circuitry for generating a first signal having a first distinct signature including a first eccentricity of a mode intensity, a first shift in a center of the mode intensity and a first rotation of an ellipsoidal intensity output of the mode intensity and applying the first signal to the sample. A detector receives the first signal after the first signal passes through the sample and detects a second distinct signature including a second eccentricity of the mode intensity, a second shift in the center of the mode intensity and a second rotation of the ellipsoidal intensity output of the mode intensity. The detector also determines the presence of the predetermined material within the sample based on the detected second distinct signature within the first signal received from the sample and provides an output of an indication of the presence of the predetermined material responsive to the determination. 1. An apparatus for detecting a presence of a predetermined material within a sample , comprising:signal generation circuitry for generating a first signal having a first distinct signature including a first eccentricity of a mode intensity, a first shift in a center of the mode intensity and a first rotation of an ellipsoidal intensity output of the mode intensity and applying the first signal to the sample;a detector for receiving the first signal after the first signal passes through the sample, for detecting a second distinct signature including a second eccentricity of the mode intensity, a second shift in the center of the mode intensity and a second rotation of the ellipsoidal intensity output of the mode intensity and for determining the presence of the predetermined material within the sample based on the detected second distinct signature within the first signal received from the sample, the detector providing an output of an indication of the presence of ...

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Номер записи: 47
09-04-2020 дата публикации

Second harmonic generation (shg) optical inspection system designs

Номер: US20200110029A1
Автор: Ming Lei
Принадлежит: Femtometrics Inc

Second Harmonic Generation (SHG) can be used to interrogate a surface of a sample such as a layered semiconductor structure. The SHG based sample interrogation systems may simultaneously collect different polarization components of the SHG signal at a time to provide different types of information. SHG imaging systems can provide SHG images or maps of the distribution of SHG signals over a larger area of a sample. Some such SHG imaging systems employ multiple beams and multiple detectors to capture SHG signals over an area of the sample. Some SHG imaging systems employ imaging optics to image the sample onto a detector array to form SHG images.

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Номер записи: 48
13-05-2021 дата публикации

SAMPLE DETECTION DEVICE AND SAMPLE DETECTION METHOD BY USING THE SAME

Номер: US20210140875A1
Автор: CHO Keunchang, Jung Neon Cheol, YU Alexey Dan Chin
Принадлежит:

A sample detection device includes a first polarizer configured to allow part of incident light to pass therethrough by polarizing the incident light, a stage disposed on a path of light having passed the first polarizer, the stage allowing a sample to be seated thereon, a second polarizer configured to polarize light and a detection unit configured to detect light having passed the second polarizer and to generate a detection signal. The first polarizer allows first polarized light oscillating in a first direction to proceed toward the sample when the incident light reaches the first polarizer. Emission light is emitted by an excitation of the sample when the first polarized light reaches the sample. The second polarizer allows second polarized light oscillating in a second direction to proceed toward the detection unit when the emission light reaches the second polarizer. 1. A sample detection device comprising:a first polarizer configured to allow first polarized light which is a part of incident light to pass therethrough by polarizing the incident light;a stage disposed on a path of the first polarized light, the stage allowing a sample to be disposed thereon;a second polarizer configured to polarize light; anda detection unit configured to detect second polarized light having passed the second polarizer and to generate a detection signal,wherein the first polarizer is configured to allow the first polarized light oscillating in a first direction to proceed toward the sample when the incident light reaches the first polarizer,wherein emission light is configured to be emitted by an excitation of the sample when the first polarized light reaches the sample, andwherein the second polarizer is configured to allow the second polarized light oscillating in a second direction to proceed toward the detection unit when the emission light reaches the second polarizer.2. The sample detection device of claim 1 , further comprising:a reflective member configured to reflect ...

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Номер записи: 49
13-05-2021 дата публикации

SUBSTRATE INSPECTION DEVICE

Номер: US20210140899A1
Автор: PARK Jangik, RYU Sungyoon, Sohn Younghoon, Yang Yusin
Принадлежит: SAMSUNG ELECTRONICS CO., LTD.

A substrate inspection device including a light source, a polarizer, first and second compensators, an analyzer, a light splitter configured to receive reflected light reflected by the substrate to split the reflected light into first split light and second split light, a first detector and a second detector configured to detect the first split light and the second split light, respectively, and a controller configured to control the first and second detectors differently from each other, may be provided. 1. A substrate inspection device comprising:a light source configured to irradiate non-polarized incident light onto a substrate;a polarizer between the light source and the substrate and configured to linearly polarize the incident light;a first compensator between the polarizer and the substrate;a light splitter configured to receive reflected light generated by the incident light reflected by the substrate, and split the reflected light into first split light and second split light;a second compensator between the substrate and the light splitter;an analyzer between the second compensator and the light splitter;a first detector and a second detector configured to detect the first split light and the second split light, respectively;a controller configured to control the first and second detectors; anda processor configured to process signals detected by the first and second detectors,wherein the controller is configured to rotate at least one of the polarizer, the first and second compensators, or the analyzer, andthe controller is configured to differently control the first and second detectors.2. The substrate inspection device of claim 1 , whereineach of the first and second detectors comprises a spectral imaging camera,the first detector is configured to generate a first spectral image at a first wavelength band, andthe second detector is configured to generate a second spectral image at a second wavelength band that is different from the first wavelength ...

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Номер записи: 50
16-04-2020 дата публикации

Snapshot Ellipsometer

Номер: US20200116626A1
Автор: Hovorka Griffin A. P., Van Derslice Jeremy A.
Принадлежит: J. A. WOOLLAM CO., INC.

A snapshot ellipsometer or polarimeter which does not require temporally modulated element(s) to measure a sample, but instead uses one or more spatially varying compensators, (eg. microretarder arrays and compound prisms), to vary the polarization state within a measurement beam of electromagnetic radiation. Analysis of the intensity profile of the beam after interaction with the spatially varying compensator(s) and the sample allows sample parameters to be characterized without any moving optics. 2108108. An ellipsometer as in claim 1 , which further comprises at least one imaging element present between the spatially varying compensators () and said multi-element detector () to improve resolution regarding correspondence between specific points on said spatially varying compensators () and said detector ().32878. An ellipsometer as in claim 1 , in which the beam provided by said source of a beam of electromagnetic radiation () comprises multiple wavelengths claim 1 , and in which said detector () is two-dimensional claim 1 , and wherein said ellipsometer further comprises at least one wavelength separating element () prior to said detector () claim 1 , such that in use the polarization effects of the sample can be determined for multiple wavelengths at each location of a sample investigated.47. An ellipsometer as in in which the at least one wavelength separating element () is selected from the group consisting of:a planar or curved diffraction grating;a dispersing prism; andan attenuating or reflecting filter element that transmits, blocks, or reflects different wavelengths at different positions thereof.578. An ellipsometer as in in which at least one additional focusing optic resolves the spectral variation caused by said wavelength separating element () onto one dimension of the detector ().62. An ellipsometer as in in which said source of a beam of electromagnetic radiation () is selected from the group consisting of:a broadband or monochromatic laser;a ...

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Номер записи: 51
02-05-2019 дата публикации

Optimizing Computational Efficiency By Multiple Truncation Of Spatial Harmonics

Номер: US20190129376A1
Автор: Veldman Andrei
Принадлежит:

Methods and systems for solving measurement models of complex device structures with reduced computational effort and memory requirements are presented. The computational efficiency of electromagnetic simulation algorithms based on truncated spatial harmonic series is improved for periodic targets that exhibit a fundamental spatial period and one or more approximate periods that are integer fractions of the fundamental spatial period. Spatial harmonics are classified according to each distinct period of the target exhibiting multiple periodicity. A distinct truncation order is selected for each group of spatial harmonics. This approach produces optimal, sparse truncation order sampling patterns, and ensures that only harmonics with significant contributions to the approximation of the target are selected for computation. Metrology systems employing these techniques are configured to measure process parameters and structural and material characteristics associated with different semiconductor fabrication processes. 1. A measurement system comprising:an illumination source configured to provide an amount of illumination light to a periodic metrology target having multiple spatial periods including a first spatial period and a second spatial period in a first direction of the periodic metrology target, wherein a ratio of the first spatial period and the second spatial period is a ratio of two integers;a detector configured to receive an amount of collected light from the periodic metrology target in response to the amount of illumination light and generate a plurality of measured signals; and receive an indication of the multiple spatial periods of the periodic metrology target;', 'classify a plurality of spatial harmonics associated with the periodic metrology target into a plurality of different groups according to each of the multiple spatial periods of the periodic metrology target, wherein each group of spatial harmonics has a different harmonic spacing; and', ' ...

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Номер записи: 52
19-05-2016 дата публикации

Inspection system and method using an off-axis unobscured objective lens

Номер: US20160139032A1
Автор: Alexander Kuznetsov, Andrei V. Shchegrov, Barry Blasenheim, Claudio Rampoldi, Shankar Krishnan
Принадлежит: KLA Tencor Corp

An inspection system is provided that can include a reflectometer having a light source for projecting light, and a light splitter for receiving the light projected by the light source, transforming at least one aspect of the light, and projecting the light once transformed. The reflectometer further has an off-axis unobscured objective lens through which the light transformed by the light splitter passes to contact a fabricated component, and has a detector for detecting a result of the transformed light contacting the fabricated component. The inspection system can additionally, or alternatively, include an ellipsometer having a light source similar to the reflectometer, and further a polarizing element to polarize the light of the light splitter. The polarized light passes through an off-axis unobscured objective lens to contact a fabricated component, and a detector detects a result of the polarized light contacting the fabricated component.

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Номер записи: 53
26-05-2016 дата публикации

Apparatus and a method for spectroscopic ellipsometry, in particular infrared spectroscopic ellipsometry

Номер: US20160146722A1
Автор: Claus Daniel, Koerner Klaus, Osten Wolfgang, Roeseler Arnulf
Принадлежит:

Disclosed herein is an apparatus for spectroscopic ellipsometry, preferably for infrared spectroscopic ellipsometry, and a method for spectroscopic ellipsometry employing the apparatus. In some embodiments, the apparatus may comprise a light source (), a detector (), a polarizer (), an analyzer (), and a measuring probe (). In one embodiment, the measuring probe may comprise an ATR prism () having at least one first surface having at least one measuring portion (M) configured to be brought in optical contact with a measured object (), and at least one second surface having at least one reflective portion (RX). 1. An apparatus for spectroscopic ellipsometry , preferably for infrared spectroscopic ellipsometry , comprising:a light source;a detector;a polarizer;an analyzer; and an attenuated total reflection (ATR) prism having at least a first surface having at least one measuring portion configured to be brought in optical contact with a measured object, and at least a second surface having at least one reflective portion,', at least a portion of polarized light entering the measuring probe undergoes an attenuated totally reflection at the at least one measuring portion of the first surface,', 'at least a portion of the totally reflected light is reflected back towards the first surface by the at least one reflective portion of the second surface, and', 'at least a portion of the light reflected back by the at least one reflective portion of the second surface undergoes an attenuated total reflection at the at least one measuring portion of the first surface and is decoupled from the ATR prism,', 'wherein a difference between a magnitude of an angle between the first surface and the second surface and a magnitude of a critical total reflection angle is less than a predetermined value., 'the ATR prism being configured such that], 'a measuring probe comprising2. The apparatus for spectroscopic ellipsometry according to claim 1 , wherein the first surface and the second ...

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Номер записи: 54
02-06-2016 дата публикации

OPTICAL ELEMENT ROTATION TYPE MUELLER-MATRIX ELLIPSOMETER AND METHOD FOR MEASURING MUELLER-MATRIX OF SAMPLE USING THE SAME

Номер: US20160153894A1
Автор: CHEGAL Won, Cho Hyun Mo, Cho Yong Jai
Принадлежит:

Provided is an optical element rotation type Mueller-matrix ellipsometer for solving a problem of measurement accuracy and measurement precision occurring due to residual polarization of a light source, polarization dependence of a photo-detector, measurement values of Fourier coefficients of a high order term in dual optical element rotation type Mueller-matrix ellipsometers according to the related art capable of measuring some or all of components of a Mueller-matrix for any sample. 1. An optical element rotation type Mueller-matrix ellipsometer comprising:a light source emitting incident light toward a sample;a polarization modifying unit disposed between the light source and the sample on a movement path of the incident light, controlling a polarization state of the incident light emitted from the light source, and including a plurality of optical elements including a constant velocity rotation optical element rotating at a constant velocity and a scanning optical element;a polarization analyzing unit receiving reflected light (or transmitted light), analyzing a change in a polarization state of the reflected light (or the transmitted light), and including a plurality of optical elements including a constant velocity rotation optical element rotating at a constant velocity and a scanning optical element, the polarization state of the reflected light (or the transmitted light) being changed from that of the incident light polarized while passing through the polarization modifying unit due to reflection (or transmission) of the sample;a photo-detector receiving the reflected light (or the transmitted light) passing through the polarization analyzing unit and measuring intensity of the received light as an electrical signal such as a voltage or a current;a calculating device measuring and storing Fourier coefficient values of a waveform of light intensity depending on a change in an azimuth angle of the constant velocity rotation optical element by the photo- ...

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Номер записи: 55
15-09-2022 дата публикации

Optical metrology models for in-line film thickness measurements

Номер: US20220290974A1
Автор: Edward Budiarto, Eric Chin Hong Ng, Sergey STARIK, Todd J. Egan
Принадлежит: Applied Materials Israel Ltd

An optical metrology model for in-line thickness measurements of a film overlying non-ideal structures on a substrate is generated by performing pre-measurements prior to deposition of the film and performing post-measurements after the deposition. The pre- and post-measurements are performed at at least one of multiple polarization angles or multiple orientations of the substrate. Differences in reflectance between the pre- and post-measurements are determined at the multiple polarization angles and the multiple orientations. At least one of the multiple polarization angles or the multiple orientations are identified where the differences in reflectance are indicative of a suppressed influence from the non-ideal structures. The optical metrology model is generated using the identified polarization angles and the identified orientations as inputs to a machine-learning algorithm

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Номер записи: 56
17-06-2021 дата публикации

NORMAL INCIDENCE ELLIPSOMETER AND METHOD FOR MEASURING OPTICAL PROPERTIES OF SAMPLE BY USING SAME

Номер: US20210181090A1
Автор: CHEGAL Won, Cho Hyun Mo, Cho Yong Jai
Принадлежит:

The present invention relates to a normal incidence ellipsometer and a method for measuring the optical properties of a sample by using same. The purpose of the present invention is to provide: a normal incidence ellipsometer in which a wavelength-dependent compensator is replaced with a wavelength-independent linear polarizer such that equipment calibration procedures are simplified while a measurement wavelength range expansion can be easily implemented; and a method for measuring the optical properties of a sample by using same. 1. A normal incidence ellipsometer comprising:a light source including a collimating optical system and emitting an incident collimated beam toward a sample;a beam splitter disposed between the light source and the sample and directing a portion of the incident collimated beam in a direction perpendicular to a surface of the sample;a fixed polarizer disposed between the beam splitter and the sample and fixed at a preset azimuthal angle to allow only a linearly polarized component of the incident collimated beam in a preset direction to pass therethrough;a constantly rotating polarizer disposed between the fixed polarizer and the sample and rotating at a constant speed to regularly modulate a polarization state of the incident collimated beam according to a constant rotational frequency;a photodetector element measuring an exposure of a spectral radiant flux upon receiving a reflected collimated beam reflected from the sample;a constantly rotating analyzer disposed between the sample and the photodetector element and rotating at a constant speed to regularly modulate a polarization state of the reflected collimated beam according to a constant rotational frequency;a fixed analyzer disposed between the constantly rotating analyzer and the photodetector element and fixed at a preset azimuthal angle to allow only a linearly polarized component of the reflected collimated beam in a preset direction to pass therethrough; anda processor ...

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Номер записи: 57
14-05-2020 дата публикации

POLARIZATION ENHANCED INTERFEROMETRIC IMAGING

Номер: US20200150028A1
Автор: DAABOUL George, ÜNLÜ M. Selim, YURT Abdulkadir
Принадлежит: TRUSTEES OF BOSTON UNIVERSITY

An imaging system uses polarized light to illuminate the target and then uses a polarization filter to remove the light that is reflected from the target without modification. The target can include one or more anisotropic objects that scatter the light and alter the polarization state of the reflected light and causing it to be selectively transmitted to the imaging device which can record the transmitted light through the filter. The illuminating light can be circularly polarized and the filter can remove the circularly polarized light. The target can include asymmetric nanoparticles, such as nanorods that alter the amplitude or phase of the scattered light enabling pass through the filter to be detected by the imaging device. 122-. (canceled)23. An interferometric reflectance imaging system comprising:a target including a substrate having a first reflecting surface and a transparent layer on the first reflecting surface forming a second reflective surface separated from the first reflecting surface by a thickness of the transparent layer;a light source configured to produce illumination light along an illumination path toward the target, the illumination light being polarized by a first polarizer according to a first polarization configuration;wherein the first reflecting surface and the second reflecting surface of the target is positioned to receive the illumination light and reflect the illumination light along a collection path toward an imaging sensor and result in signal interference in the reflected illumination light; anda filter positioned in the collection path to filter light polarized according to the first polarization configuration whereby at least some of the reflected illumination light reflected by the first reflecting surface and the second reflecting surface is not received by the imaging sensor.24. The interferometric reflectance imaging system according to claim 23 , wherein the filter comprises a second polarizer claim 23 , and the second ...

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Номер записи: 58
18-06-2015 дата публикации

POLARIZATION ANALYSIS APPARATUS

Номер: US20150168291A1
Автор: OTSUKA Haruka, SUGITA Kazuhiro, YAMAZAKI Yusuke
Принадлежит:

Provided is a polarization analysis apparatus that can quickly measure the polarization properties of a sample. The polarization analysis apparatus includes a light source configured to emit light in a predetermined wavelength region, a polarizer configured to transmit the light emitted from the light source, a spatial phase modulator configured to transmit the light from the sample, an analyzer configured to transmit the light that has passed through the spatial phase modulator, and an imaging spectrometer configured to receive the light that has passed through the analyzer. The spatial phase modulator is formed of a birefringent material, and is configured to have different phase differences at respective positions in a first direction in a plane orthogonal to an optical axis. The imaging spectrometer disperses the received light in a second direction that is different from the first direction in the plane orthogonal to the optical axis. 1. A polarization analysis apparatus , comprising:a light source configured to emit light in a predetermined wavelength region;a polarizer configured to transmit the light emitted from the light source, the light having passed through the polarizer being radiated on a sample;a spatial phase modulator configured to transmit the light from the sample, the spatial phase modulator being formed of a birefringent material and being configured to have different phase differences at respective positions in a first direction in a plane orthogonal to an optical axis;an analyzer configured to transmit the light that has passed through the spatial phase modulator; andan imaging spectrometer configured to receive the light that has passed through the analyzer, and disperse the received light in a second direction that is different from the first direction in the plane orthogonal to the optical axis.2. The polarization analysis apparatus according to claim 1 , wherein a phase difference of the spatial phase modulator continuously changes in the ...

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Номер записи: 59
29-09-2022 дата публикации

Method for measuring film thickness of semiconductor device

Номер: US20220307818A1
Автор: Yongshang SHENG
Принадлежит: Changxin Memory Technologies Inc

The present disclosure discloses a method for measuring the film thickness of a semiconductor device. The measuring method includes: providing a reference spectrogram of a main storage region of a reference semiconductor device; obtaining a first measured spectrogram of a main storage region of a semiconductor device to be measured; adjusting a thickness parameter of a target film in the main storage region of the reference semiconductor device within a preset range based on the reference spectrogram, obtaining an adjusted reference spectrogram, and comparing the first measured spectrogram with the adjusted reference spectrogram; if the similarity between the first measured spectrogram and the adjusted reference spectrogram is greater than a first preset value, using the thickness parameter corresponding to the adjusted reference spectrogram as the thickness of the target film in the main storage region of the semiconductor device to be measured.

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Номер записи: 60
21-05-2020 дата публикации

Compositions and methods for controllably merging emulsion droplets and sample analysis

Номер: US20200158736A1
Автор: Christopher Gordon Atwood
Принадлежит: Individual

The present disclosure in some aspects provides methods for the controlled merging of emulsion droplets, which can be used to assemble useful compositions such as droplets (e.g., stabilized micelles) containing a precise combination of analytes and/or analytical reagents. In some embodiments, disclosed herein is a method, e.g., for detecting the presence/absence, a level or amount, and/or an activity of an analyte in a sample, comprising merging two or more emulsion droplets such that an interaction between an analyte and an analyte-interacting reagent occurs in the merged droplet. The two or more emulsion droplets may be merged using a method for the controlled merging of emulsion droplets disclosed herein.

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Номер записи: 61
21-06-2018 дата публикации

TOTAL INTERNAL REFLECTION AND TRANSMISSION ILLUMINATION FLUORESCENCE MICROSCOPY IMAGING SYSTEM WITH IMPROVED BACKGROUND SUPPRESSION

Номер: US20180172578A1
Автор: FIOLKA Reto P.
Принадлежит:

Systems, methods, and computer-readable storage media are disclosed for providing a structured total internal reflection fluorescence (sTIRF) imaging system providing improved out of focus blur rejection and improved image contrast. The sTIRF imaging system may be configured to illuminate a sample using two beams of light (e.g., a primary beam of light and an interfering beam of light). The interfering beam of light may be configured to create interference with respect to the primary beam of light. The sTIRF imaging system may be configured to capture a plurality of intermediate images of the sample during the illuminating, and to generate a final image of the sample based on the plurality of intermediate images. The interference caused by the two beams of light may enable the sTIRF imaging system to reject out of focus blur based on detection of whether fluorescence emissions from the sample being imaged fluctuate or remain static. 1. A method for imaging a sample using an imaging system , the method comprising:illuminating a sample using a primary beam of light and an interfering beam of light, where the interfering beam of light is configured to create interference with respect to the primary beam of light;capturing a plurality of intermediate images of the sample during the illuminating; andgenerating a final image of the sample based on the plurality of intermediate images.2. The method of claim 1 , where the plurality of intermediate images comprises at least three intermediate images claim 1 , where interference created by the interfering beam of light comprises an interference pattern claim 1 , where the plurality of intermediate images include a representation of the interference pattern claim 1 , and where generating the final image of the sample further comprises:detecting changes between each of the plurality of intermediate images based at least in part on the representation of the interference pattern; andgenerating the final image based on detected ...

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Номер записи: 62
06-06-2019 дата публикации

CONFIGURABLE RETRO-REFLECTIVE SENSOR SYSTEM FOR THE IMPROVED CHARACTERIZATION OF THE PROPERTIES OF A SAMPLE

Номер: US20190170636A1
Автор: Hartrumpf Matthias, NEGARA Christian
Принадлежит: Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e. V.

Disclosed is a retroreflector-based sensor system for optical characterization of a sample, having a transmitter for irradiating the sample, a retroflector positioned behind the sample, the transmitter, the sample, and the retroreflector being positioned such that radiation reflected back from the retroreflector is again incident on the sample and is reflected back from the latter in the direction towards the transmitter, and a receiver which is positioned in the receiving beam path such that it detects radiation reflected back from the retroreflector, incident again on the sample and reflected back from the latter, in the direction towards the transmitter. 111-. (canceled)12. A retroreflector-based sensor system for optical characterisation of a sample , having a transmitter for irradiating the sample which is positioned in the transmitter beam path , a retroflector which is positioned behind the sample in the transmitter beam path such that it reflects radiation in the transmitter beam path coming from the sample and incident thereon in the receiving beam path back onto the sample ,the transmitter, the sample, and the retroreflector being positioned such that radiation reflected back from the retroreflector in the receiving beam path is again incident on the sample and is reflected back from the latter in the direction towards the transmitter, anda receiver which is positioned in the receiving beam path such that it detects radiation reflected back from the retroreflector, incident again on the sample and reflected back from the latter, in the direction towards the transmitter,from the radiation detected by the receiver, measured values being obtainable and evaluatable for optical characterisation of the sample, andone or more configuration means being provided, by means of which improved obtaining and/or evaluation of the measured values is/are possible, for improved optical characterisation of the sample.13. The retroreflector-based sensor system according to ...

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Номер записи: 63
02-07-2015 дата публикации

Method Using Laser Ellipsometry for Determining the Quality of Liquid Product Containing Polyphenols

Номер: US20150185135A1
Автор: Martino Paul A.
Принадлежит:

The objective is to develop a method for determining the quality of a liquid product containing polyphenols. The present invention is a method that is a significant improvement over existing methods that use conventional laboratory instrumentation to study the quality of liquid products. The method uses an adsorption cell with a small mirror as a reflecting surface and acts as a substrate for the adsorption of the liquid's polyphenols on its surface. The polyphenol's film thickness is measured by laser ellipsometry. Light from a monochromatic light source is reflected from the thin film of polyphenol, which changes the light's optical properties and are sensed using the principles of ellipsometry. The changes in state of polarized light are translated into graphical illustrations of measured and computed parameters that can be recognized and interpreted as distinctive properties of liquid product quality. 1(a) A means of employing ellipsometry apparatus, a refractometer and a pH meter, and(b) An adsorption cell containing a reflecting surface (e.g., mirror) attached to the interior bottom wall of the cell, and(c) Whereby, the said calculated polyphenol film thickness and said ellipsometry parameters are used to derive optical responses that are tabulated and/or presented in graphical form to facilitate the determination of the liquid product quality.. A method for quantifying quality assurance of a liquid product to determine the amount of polyphenol adsorption from solution on to a reflective substrate (polyphenol film thickness), which is an improvement over existing methods, comprising of Not applicable.Not applicable.1. Field of InventionAchieving faster, better and/or more reliable methods and analyzers for determining the quality of liquids containing polyphenols is of interest in many fields. One of these fields concerns the determination of the role of polyphenols in wine quality. Polyphenols are called tannins in certain liquids, such as wine. They have the ...

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Номер записи: 64
28-06-2018 дата публикации

Optical Metrology With Small Illumination Spot Size

Номер: US20180180406A1
Автор: Buettner Alexander, Peterlinz Kevin A., Purrucker Kerstin, Sapiens Noam, Shchegrov Andrei V.
Принадлежит:

Methods and systems are presented to reduce the illumination spot size projected onto a measurement target and associated spillover onto area surrounding a measurement target. In one aspect, a spatial light modulator (SLM) is located in the illumination path between the illumination light source and the measurement sample. The SLM is configured to modulate amplitude, phase, or both, across the path of the illumination light to reduce wavefront errors. In some embodiments, the desired state of the SLM is based on wavefront measurements performed in an optical path of the metrology system. In another aspect, an illumination aperture having an image plane tilted at an oblique angle with respect to a beam of illumination light is employed to overcome defocusing effects in metrology systems that employ oblique illumination of the measurement sample. In some embodiments, the illumination aperture, objective lens, and specimen are aligned to satisfy the Scheimpflug condition. 1. A metrology system comprising:an illumination source configured to generate an amount of illumination light;an illumination optics subsystem configured to direct the amount of illumination light from the illumination source to a specimen under measurement, wherein the illumination optics subsystem includes an illumination aperture having an image plane oriented at an oblique angle with respect to a beam of the illumination light passing through the illumination aperture;a detector configured to generate a plurality of output signals indicative of a response of the specimen to the amount of illumination light; anda collection optics subsystem configured to collect an amount of collected light from the surface of the specimen and direct the amount of collected light to the detector.2. The metrology system of claim 1 , wherein the beam of illumination light is oriented at an oblique angle with respect to the surface of the specimen under measurement at the point of incidence of the beam of ...

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Номер записи: 65
13-06-2019 дата публикации

Measurement Methodology of Advanced Nanostructures

Номер: US20190178788A1
Автор: Aoyagi Paul, Atkins Phillip, Chouaib Houssam, HU Dawei, Kuznetsov Alexander, Lee Liequan, Malkova Natalia, Nguyen Manh, Sushchik Mikhail
Принадлежит:

A parameterized geometric model of a structure can be determined based on spectra from a wafer metrology tool. The structure can have geometry-induced anisotropic effects. Dispersion parameters of the structure can be determined from the parameterized geometric model. This can enable metrology techniques to measure nanostructures that have geometries and relative positions with surrounding structures that induce non-negligible anisotropic effects. These techniques can be used to characterize process steps involving metal and semiconductor targets in semiconductor manufacturing of, for example, FinFETs or and gate-all-around field-effect transistors. 1. A method comprising:receiving spectra at a processor, wherein the spectra are from an area of a semiconductor wafer that includes a structure, wherein the spectra are measured by a wafer metrology tool, and wherein the structure has geometry-induced anisotropic effects;generating a parameterized geometric model of the structure using the processor;assigning anisotropic material properties to the parameterized geometric model using the processor;determining dispersion parameters of the structure on the wafer using the parameterized geometric model with the processor, wherein the dispersion parameters include anisotropic dispersion parameters; anddetermining at least one geometric parameter or anisotropic material parameter from the parameterized geometric model using the processor.2. The method of claim 1 , further comprising measuring the spectra with the wafer metrology tool.3. The method of claim 1 , wherein the dispersion parameters include an anisotropic tensor matrix.4. The method of claim 1 , wherein anisotropic dielectric components of the dispersion parameters are provided by reference theoretical or empirical dispersion models.5. The method of claim 4 , wherein the reference theoretical or empirical dispersion models represent dependency of the dispersion parameters on contributing factors to anisotropy.6. ...

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Номер записи: 66
04-06-2020 дата публикации

OPTICAL DEVICE

Номер: US20200173912A1
Автор: CHERN JYH-LONG, YEN CHIH-MING
Принадлежит:

An optical device includes a door, a door control unit, a polarized light generation unit and a spectrum response analysis unit. The polarized light generation unit and the spectrum response analysis unit are located at a first side of the door. When the door is opened by the door control unit, a polarized light from the polarized light generation unit is transmitted through the door and externally projected on an under-test object at a second side of the door, so that a scattered light is generated. After the scattered light is returned back and transmitted through the door, the scattered light is projected on the spectrum response analysis unit, so that the spectrum response analysis unit performs a spectrum response analysis. The optical device has enhanced signal-to-noise ratio. Moreover, the optical device is capable of acquiring more explicit and diverse inherent information of the under-test object. 1. An optical device , comprising:at least one door;a polarized light generation unit located at a first side of the at least one door, and generating at least one polarized light;a spectrum response analysis unit located at the first side of the at least one door; anda door control unit for opening or closing the at least one door,wherein when the at least one door is opened by the door control unit, the at least one polarized light is transmitted through the at least one door and externally projected on an under-test object at a second side of the at least one door, so that a scattered light is generated, wherein after at least a portion of the scattered light from the under-test object is returned back and transmitted through the at least one door, the at least a portion of the scattered light is projected on the spectrum response analysis unit, so that the spectrum response analysis unit performs a spectrum response analysis on the at least a portion of the scattered light.2. The optical device according to claim 1 , wherein the at least one door comprises a ...

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Номер записи: 67
25-09-2014 дата публикации

SYSTEM AND METHOD OF ANALYSIS BY DETERMINING A DEPOLARIZING OR DICHROIC CHARACTER OF AN OBJECT

Номер: US20140285803A1
Автор: Alouini Mehdi, Fade Julien
Принадлежит:

An analysis system comprises a transmitting device () and a receiving device (). The transmitting devices comprises means for illuminating an object (), or a part of the object, by a first light beam () consisting of signals with two distinct frequencies and first orthogonal polarisation states. The receiving device comprises means () for detecting, in a second light beam with second polarisation states and resulting from the illumination of the object to be analysed by the first light beam, a signal at a beat frequency equal to a difference between the two frequencies of the first light beam; and means () for obtaining information relating to the depolarising or dichroic character of the object, or of the part of the object, according to the detection or not of a signal at the beat frequency. 2. Analysis system according to claim 1 , characterised in that the means for obtaining the information relating to the depolarising or dichroic character of the object to be analysed claim 1 , or of said part of the object to be analysed claim 1 , comprise means for determining the amplitude of the signal at the beat frequency.3310411. Analysis system according to claim 1 , characterised in that the transmitting device is adapted so that the means for illuminating the object to be analysed claim 1 , or said part of the object to be analysed claim 1 , perform the illumination via a first optical guide (.; .).4153545. Analysis system according to claim 1 , characterised in that the receiving device comprises means (.; .; .) for capturing light and for converting a captured light signal into an electrical signal claim 1 , said means having a bandwidth defined according to the beat frequency.5310412. Analysis system according to claim 1 , characterised in that the receiving device comprises means for receiving the light beam resulting from the illumination of the object to be analysed by said first light beam via a second optical guide (.; .).6. Analysis system according to claim ...

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Номер записи: 68
22-07-2021 дата публикации

OPTICAL METROLOGY TOOL EQUIPPED WITH MODULATED ILLUMINATION SOURCES

Номер: US20210223166A1
Автор: Brady Gregory, Peterlinz Kevin, Rotter Lawrence D., Shaughnessy Derrick A., Shchegrov Andrei V., Veldman Andrei, Wang David Y.
Принадлежит:

The system includes a modulatable illumination source configured to illuminate a surface of a sample disposed on a sample stage, a detector configured to detect illumination emanating from a surface of the sample, illumination optics configured to direct illumination from the modulatable illumination source to the surface of the sample, collection optics configured to direct illumination from the surface of the sample to the detector, and a modulation control system communicatively coupled to the modulatable illumination source, wherein the modulation control system is configured to modulate a drive current of the modulatable illumination source at a selected modulation frequency suitable for generating illumination having a selected coherence feature length. In addition, the present invention includes the time-sequential interleaving of outputs of multiple light sources to generate periodic pulse trains for use in multi-wavelength time-sequential optical metrology. 1. An optical metrology tool , comprising:a modulatable pumping source configured to generate illumination beam;a plasma cell, the plasma cell including a bulb for containing a volume of gas;a set of optical elements configured to shape the illumination beam and focus the illumination beam from the modulatable pumping source into the volume of gas in order to maintain a plasma within the volume of gas;a set of illumination optics configured to direct the illumination beam from the plasma cell to the surface of a sample;a set of collection optics;a detector configured to detect at least a portion of illumination emanating from a surface of a sample, wherein the set of collection optics is configured to direct illumination from the surface of the sample to the detector;a pump control system communicatively coupled to the modulatable pumping source, wherein the pump control system is configured to modulate a drive current of the modulatable pumping source at a selected modulation frequency in order to ...

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Номер записи: 69
12-07-2018 дата публикации

METHOD FOR USE IN PROCESS CONTROL OF MANUFACTURE OF PATTERNED SAMPLE

Номер: US20180196356A1
Автор: Bozdog Cornel, CEPLER Aron, Isbester Paul
Принадлежит:

A method and system are presented for use in controlling a multiple patterning process of n patterning stages subsequently applied to a sample to produce a target pattern thereon. The method comprises: providing intermediate measured data indicative of an optical response of the sample after being patterned by m-th patterning stage, 1≤m Подробнее

Номер записи: 70
27-06-2019 дата публикации

Optical Metrology Tool Equipped with Modulated Illumination Sources

Номер: US20190195782A1
Автор: Brady Gregory, Peterlinz Kevin, Rotter Lawrence D., Shaughnessy Derrick A., Shchegrov Andrei V., Veldman Andrei, Wang David Y.
Принадлежит:

The system includes a modulatable illumination source configured to illuminate a surface of a sample disposed on a sample stage, a detector configured to detect illumination emanating from a surface of the sample, illumination optics configured to direct illumination from the modulatable illumination source to the surface of the sample, collection optics configured to direct illumination from the surface of the sample to the detector, and a modulation control system communicatively coupled to the modulatable illumination source, wherein the modulation control system is configured to modulate a drive current of the modulatable illumination source at a selected modulation frequency suitable for generating illumination having a selected coherence feature length. In addition, the present invention includes the time-sequential interleaving of outputs of multiple light sources to generate periodic pulse trains for use in multi-wavelength time-sequential optical metrology. 1. An optical metrology tool , comprising:a first illumination source configured to generate illumination of a first wavelength;at least one additional illumination source configured to generate illumination of an additional wavelength, the additional wavelength different from the first wavelength, the first illumination source and the at least one additional illumination source configured to illuminate a surface of a sample disposed on a sample stage;a set of illumination optics configured to direct illumination of the first wavelength and illumination of the at least one additional wavelength from the first illumination source and the at least one additional illumination source to the surface of the sample;a set of collection optics;a detector configured to detect at least a portion of illumination emanating from a surface of the sample, wherein the set of collection optics is configured to direct illumination emanating from the surface of the sample to the detector;a first illumination switching ...

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Номер записи: 71
06-08-2015 дата публикации

METHODS AND APPARATUSES FOR MEASURING VALUES OF PARAMETERS OF INTEGRATED CIRCUIT DEVICES

Номер: US20150219446A1
Автор: Chin Soo-Bok, JUNG Woo-Jin, Kim Deok-Yong, Lee Ji-Hye, LEEM Choon-Shik, Song Chul-Gi
Принадлежит:

Methods and apparatuses for measuring parameters of integrated circuit devices may be provided. The methods may include performing detecting operations on samples to obtain a set of data. Each detecting operation may include irradiating a light beam to the samples using a light irradiation part and detecting reflected light from the samples using a light detector. The samples may have values of a parameter different from one another. The method may also include obtaining a principal component based on the set of data and obtaining a regression model for the parameter using the principal component and values of the parameter of the samples. 1. An optical measuring method , the method comprising: each one of the plurality of detecting operations comprises irradiating a light beam to the respective ones of the plurality of samples using a light irradiation part and detecting reflected light from the respective ones of the plurality of samples using a light detector;', 'each of the plurality of samples comprises a respective one of a plurality of structures therein; and', 'a first one of the plurality of structures comprises a parameter that has a first value different from a second value of the parameter of a second one of the plurality of structures;, 'performing a plurality of detecting operations on respective ones of a plurality of samples to obtain a set of data, whereinobtaining at least one principal component based on the set of data;obtaining values of the parameter of the plurality of structures; andperforming a regression analysis to obtain a regression model that regresses the at least one principal component to the values of the parameter of the plurality of structures.2. The method of claim 1 , wherein each of the plurality of structures comprises a grating structure claim 1 , and the parameter is a height of the grating structure.3. The method of claim 2 , wherein the heights of the grating structures of the plurality of structures have a first range ...

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Номер записи: 72
06-08-2015 дата публикации

Image processing apparatus

Номер: US20150219552A1
Автор: Katsuhiro Kanamori
Принадлежит: Panasonic Intellectual Property Management Co Ltd

An image processing apparatus includes an illumination unit in which illumination axes of first and second illumination light substantially coincide with an imaging axis and which illuminates an object with the first and second illumination light alternately, the first and second illumination light being respectively polarized in a first direction and a second direction that crosses the first direction; a splitter that divides returning light into at least two returning light components; and first and second polarization imaging devices that receive the returning light components. The first polarization imaging device obtains first and second polarization images polarized in the first direction while the object is being illuminated with the first and second illumination light, respectively. The second polarization imaging device obtains third and fourth polarization images polarized in the second direction while the object is being illuminated with the first and second illumination light, respectively.

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Номер записи: 73
02-07-2020 дата публикации

INSPECTION APPARATUS AND INSPECTION METHOD

Номер: US20200209155A1
Автор: KIM Daesuk
Принадлежит: Industrial Cooperation Foundation Chonbuk National University

The present inventive concepts comprises linearly polarizing light, splitting the linearly polarized light into a first light and a second light, modulating the first light and the second light to have a phase difference to produce an output wave light, converting the output wave light to have a linear shape in a first direction to radiate the converted output wave light to a measured object, receiving a measurement light coming out of the measured object and linearly polarizing the first light and the second light of the measurement light to generate an interference light, and obtaining from the interference light an image of the measured object. The measured object can be scanned in a second direction intersecting the first direction or may be scanned rotationally about an axis in a third direction perpendicular to the first and second directions. 1. An inspection apparatus , comprising:a light generator that generates light;a first linear polarizer that linearly polarizes the light;a polarization interferometer that splits the linearly polarized light into a first light and a second light and that modulates the first light and the second light to have phase difference information;a line converter that converts an output wave light to have a linear line-shape in a first direction and that provides a measured object with the line-shaped output wave light, the output wave light coming out of the polarization interferometer;a scanner that loads the measured object, the scanner being configured such that the measured object is scanned in a second direction intersecting the first direction or is scanned rotationally about an axis in a third direction perpendicular to the first and second directions;a second linear polarizer that receives a measurement light and linearly polarizes the first light and the second light of the measurement light to generate an interference light, the measurement light coming from the output wave light that passes through or reflects from ...

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Номер записи: 74
11-07-2019 дата публикации

Variable resolution spectrometer

Номер: US20190212255A1
Автор: Mark Allen Neil
Принадлежит: KLA Tencor Corp

Systems, methods, apparatuses, and articles of manufacture are provided for recovering a digitized spectrum and may comprise: an optical system configured to transform rays, the optical system including a diffraction grating, a steering mirror, a stage, and an actuator configured to move one of the stage, diffraction grating, or steering mirror according to a movement regime to vary an incidence of the rays on the stage; a sensor array disposed on the stage configured to receive the rays incident from the optical system at a plurality of measurement locations to obtain a plurality of ray spectra; and a processor electrically connected to the sensor array configured to receive the ray spectra, interleave the ray spectra to yield an interleaved spectrum, and deconvolve a point spread function corresponding to the optical system from the interleaved spectrum to yield a recovered digitized spectrum.

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Номер записи: 75
12-08-2021 дата публикации

WAFER INSPECTION DEVICE AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE BY USING THE WAFER INSPECTION DEVICE

Номер: US20210247328A1
Автор: CHOI Myoungkyu, KIM Kwangeun, NAM Kihak, PARK Hwiwoo, RYU Sungyoon, YOON Dayoung
Принадлежит:

According to embodiments, a wafer inspection device is provided. The wafer inspection device includes a porous chuck including a plurality of pores formed all over the porous chuck to allow pressure for fixing a wafer to be applied thereto, a chuck driving device, a back side inspection optical system configured to inspect a portion of a back surface of the wafer, and a position identification optical system, wherein the porous chuck includes a plurality of holes uniformly formed all over the porous chuck to partially expose the back surface of the wafer and a slit exposing the back surface of the wafer and extending in one direction parallel to a top surface of the porous chuck. 1. A wafer inspection device comprising:a porous chuck having a plurality of pores located all over the porous chuck the plurality of pores enabling pressure for fixing a wafer to be applied to the porous chuck;a chuck driving actuator configured to drive the porous chuck;a back side inspection optical system under the porous chuck, the back side inspection optical system configured to inspect a portion of a back surface of the wafer; anda position identification optical system on the porous chuck, the position identification optical system configured to identify a position of the portion of the wafer inspected by the back side inspection optical system, a plurality of holes uniformly located all over the porous chuck, the plurality of holes configured to partially expose the back surface of the wafer; and', 'a slit configured to expose the back surface of the wafer and extending in one direction parallel to a top surface of the porous chuck., 'wherein the porous chuck includes,'}2. The wafer inspection device of claim 1 , wherein the split divides the porous chuck into a first portion and a second portion horizontally apart from the first portion.3. The wafer inspection device of claim 1 , wherein a radius of the porous chuck is less than a radius of the wafer.4. The wafer inspection ...

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Номер записи: 76
02-07-2020 дата публикации

POLARIZATION AND PHASE MICROSCOPE

Номер: US20200209602A1
Автор: Liang Rongguang, Pau Stanley
Принадлежит: Arizona Board of Regents on Behalf of the University of Arizona

Apparatus and methods are disclosed for measuring polarization properties and phase information, for example as can be used in microscopy applications. According to one example of the disclosed technology, an apparatus includes a light source, an interferometer configured to receive light generated by the light source and split the received light into two split beam outputs. The split beam outputs including combined, interfering light beams. Two light sensors, each including a polarization-sensitive focal plane array receive a respective one of the split beam outputs from the interferometer. Thus, some examples of the disclosed technology allows for simultaneous or concurrent measurement of properties of light including intensity, wavelength, polarization, and phase. The polarization-sensitive focal plane array includes a number of macropixels, each of which includes superpixels having different polarization filtering properties, each of which includes one or morepixels, which comprise filters for different colors. 1. An apparatus that can measure polarization and phase of light received from a sample , the apparatus comprising:a light source; receive light generated by the light source and split the received light into two or more split beams directed to a sample in a sample region,', 'combine at least two of the split beams into at least one interfering, split beam output; and, 'an interferometer configured toa polarization imager comprising a first light sensor and a second light sensor having a polarization-sensitive focal plane array, the first light sensor and the second light sensor being situated to receive the at least one interfering, split beam output.2. The apparatus of claim 1 , wherein the polarization-sensitive focal plane array comprises a circular polarizer.3. The apparatus of claim 1 , wherein the polarization imager further comprises a third light sensor claim 1 , the second light sensor and the third light sensor being situated to receive ...

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Номер записи: 77
23-10-2014 дата публикации

ROTATING-ELEMENT ELLIPSOMETER AND METHOD FOR MEASURING PROPERTIES OF THE SAMPLE USING THE SAME

Номер: US20140313511A1
Автор: Che Gal Won, Cho Hyun Mo, Cho Yong Jai
Принадлежит: Korea Research Institute of Standards and Science

Provided is a real-time spectroscopic ellipsometer capable of obtaining information on properties of a sample, a nano pattern shape, and the like, in real time by measuring and analyzing, for a plurality of wavelengths, a change in a polarization state of incident light generated while being reflected or transmitted due to the sample when light having a specific polarization component is incident to the sample. The real-time spectroscopic ellipsometer according to the exemplary embodiment of the present invention have the improved structure and function to solve problems such as polarization dependency of a light source and a photometric detector, wavelength dependency of a compensator, a limitation of a change in integration time due to a fixing of a measuring frequency of exposure, in a rotating-element multichannel spectroscopic ellipsometers of the related art, thereby measuring more accurately, precisely, and rapidly measuring the characteristics of the sample than the related art. 1. An ellipsometer including a light source , a polarization modulating unit , a sample stage , a polarization analysis unit , and a photometric detector , the ellipsometer comprising: a digital signal modulating apparatus connected to an optical element unit rotating at constant velocity of the polarization modulating unit or the polarization analysis unit to control a measuring frequency of exposure of the photometric detector ,the integration time and the measuring frequency of exposure of the photometric detector are controlled according to the intensity of light irradiated to the photometric detector.2. The ellipsometer of claim 1 , further comprising: an operator acquiring a plurality of values of exposure for a waveform of the intensity of light at a predetermined interval for any multiple of the period from the photometric detector and performing discrete Fourier transform on the plurality of values of exposure to determine a plurality of Fourier coefficients and average ...

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Номер записи: 78
09-08-2018 дата публикации

Inspection and Metrology Using Broadband Infrared Radiation

Номер: US20180224711A1
Автор: Baigang Zhang, John Fielden, Vahid Esfandyarpour, Yinying Xiao Li, Yung-Ho Alex Chuang
Принадлежит: KLA Tencor Corp

Systems and methods for measuring or inspecting semiconductor structures using broadband infrared radiation are disclosed. The system may include an illumination source comprising a pump source configured to generate pump light and a nonlinear optical (NLO) assembly configured to generate broadband IR radiation in response to the pump light. The system may also include a detector assembly and a set of optics configured to direct the IR radiation onto a sample and direct a portion of the IR radiation reflected and/or scattered from the sample to the detector assembly.

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Номер записи: 79
10-08-2017 дата публикации

Analyte system and method for determining hemoglobin parameters in whole blood

Номер: US20170227522A1
Автор: Michael S. Cafferty, Scott P. Cionek
Принадлежит: Nova Biomedical Corp

A method of measuring whole-blood hemoglobin parameters includes providing a LED light source, guiding light having the spectral range from the LED light source along an optical path, providing a cuvette module with a sample receiving chamber, providing a pair of first and second optical diffusers disposed in the optical path where the cuvette module is disposed between the pair of first and second optical diffusers, guiding light from the cuvette module into an optical spectrometer, and processing an electrical signal from the spectrometer into an output signal useable for displaying and reporting hemoglobin parameter values and/or total bilirubin parameter values of the sample of whole blood.

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Номер записи: 80
16-07-2020 дата публикации

Semiconductor Metrology Based On Hyperspectral Imaging

Номер: US20200225151A1
Автор: Blasenheim Barry, Buettner Alexander, Pandev Stilian Ivanov, Saerchen Emanuel, Shchegrov Andrei V., Wang David Y.
Принадлежит:

Methods and systems for performing semiconductor measurements based on hyperspectral imaging are presented herein. A hyperspectral imaging system images a wafer over a large field of view with high pixel density over a broad range of wavelengths. Image signals collected from a measurement area are detected at a number of pixels. The detected image signals from each pixel are spectrally analyzed separately. In some embodiments, the illumination and collection optics of a hyperspectral imaging system include fiber optical elements to direct illumination light from the illumination source to the measurement area on the surface of the specimen under measurement and fiber optical elements to image the measurement area. In another aspect, a fiber optics collector includes an image pixel mapper that couples a two dimensional array of collection fiber optical elements into a one dimensional array of pixels at the spectrometer and the hyperspectral detector. 1. A metrology system comprising:one or more hyperspectral imaging based metrology tools each comprising:an illumination source configured to provide an amount of broadband illumination light;an optical subsystem configured to direct the amount of illumination light from the illumination source to a measurement area on a surface of the semiconductor wafer under measurement and image the measurement area on the surface of the semiconductor wafer to a field plane conjugate to the surface of the semiconductor wafer over a field of view having a dimension of at least 250 micrometers at the semiconductor wafer; anda spectrometer configured to disperse the imaged measurement area at or near the field plane conjugate to the surface of the semiconductor wafer; anda hyperspectral detector configured to detect a spectral response of the semiconductor wafer to the amount of broadband illumination light at each of a plurality of pixels spanning the imaged measurement area.2. The metrology system of claim 1 , wherein each ...

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Номер записи: 81
26-08-2021 дата публикации

METHOD FOR MEASURING DIELECTRIC TENSOR OF MATERIAL

Номер: US20210262922A1
Автор: CHEN Xiuguo, Fang Mingsheng, GU Honggang, GUO Zhengfeng, Jiang Hao, LIU Shiyuan, Song Baokun
Принадлежит: HUAZHONG UNIVERSITY OF SCIENCE AND TECHNOLOGY

The disclosure relates to a method for measuring a dielectric tensor of a material. Firstly, a partial conversion matrix Tand a transmission matrix Tare determined by a predetermined initial value ε(E) of the dielectric tensor of the material to be measured, thereby obtaining a transfer matrix of an electromagnetic wave on a surface of the material to be measured by the partial conversion matrix T, the transmission matrix T, and an incident matrix T. Then, a theoretical Mueller matrix spectrum MM(E) of the material to be measured is determined by the transfer matrix T. A fitting analysis is performed on the theoretical Mueller matrix spectrum MM(E) and a measured Mueller matrix spectrum MM(E) of the material to be measured to obtain the dielectric tensor of the material to be measured. The obtained result is comprehensive and reliable, which is suitable for solving dielectric tensors of various materials. 1. A method for measuring a dielectric tensor of a material , comprising:{'b': '1', 'sub': p', 't', 'm', 'i', 'p', 't', 'p', 't', 'i, 'sup': '−1', 'S: determining a partial conversion matrix Tand a transmission matrix Tby a predetermined initial value ε(E) of the dielectric tensor of a material to be measured, thereby obtaining a transfer matrix T=TTTof an electromagnetic wave on a surface of the material to be measured by the partial conversion matrix T, the transmission matrix T, and an incident matrix T; and'}{'b': '2', 'sub': Cal', 'm', 'Cal', 'Exp, 'S: determining a theoretical Mueller matrix spectrum MM(E) of the material to be measured by the transfer matrix T, and then performing a fitting analysis on the theoretical Mueller matrix spectrum MM(E) and a measured Mueller matrix spectrum MM(E) of the material to be measured to obtain the dielectric tensor of the material to be measured.'}2. The method for measuring the dielectric tensor of the material according to claim 1 , wherein the incident matrix Tis calculated by a following equation:{'br': None, 'i': T ...

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Номер записи: 82
25-08-2016 дата публикации

Optimizing Computational Efficiency By Multiple Truncation Of Spatial Harmonics

Номер: US20160246285A1
Автор: Veldman Andrei
Принадлежит:

Methods and systems for solving measurement models of complex device structures with reduced computational effort and memory requirements are presented. The computational efficiency of electromagnetic simulation algorithms based on truncated spatial harmonic series is improved for periodic targets that exhibit a fundamental spatial period and one or more approximate periods that are integer fractions of the fundamental spatial period. Spatial harmonics are classified according to each distinct period of the target exhibiting multiple periodicity. A distinct truncation order is selected for each group of spatial harmonics. This approach produces optimal, sparse truncation order sampling patterns, and ensures that only harmonics with significant contributions to the approximation of the target are selected for computation. Metrology systems employing these techniques are configured to measure process parameters and structural and material characteristics associated with different semiconductor fabrication processes. 1. A measurement system comprising:an illumination source configured to provide an amount of illumination light to a periodic metrology target having multiple spatial periods including a fundamental spatial period and one or more approximate spatial periods in a first direction of the periodic metrology target, wherein each of the one or more approximate spatial periods is an integer fraction of the fundamental spatial period;a detector configured to receive an amount of collected light from the periodic metrology target in response to the amount of illumination light and generate a plurality of measured signals; and receive an indication of the multiple spatial periods of the periodic metrology target;', 'classify a plurality of spatial harmonics associated with the periodic metrology target into a plurality of different groups according to each of the multiple spatial periods of the periodic metrology target, wherein each group of spatial harmonics has a ...

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Номер записи: 83
20-11-2014 дата публикации

METROLOGY SYSTEM CALIBRATION REFINEMENT

Номер: US20140340682A1
Автор: Krishnan Shankar, Kwak Hidong, Lesoine John, Poslavsky Leonid, Sadiq Malik, Sushchik Mikhail M., Wei Lanhua
Принадлежит:

Methods and systems for matching measurement spectra across one or more optical metrology systems are presented. The values of one or more system parameters used to determine the spectral response of a specimen to a measurement performed by a target metrology system are optimized. The system parameter values are optimized such that differences between measurement spectra generated by a reference system and the target system are minimized for measurements of the same metrology targets. Methods and systems for matching spectral errors across one or more optical metrology systems are also presented. A trusted metrology system measures the value of at least one specimen parameter to minimize model errors introduced by differing measurement conditions present at the time of measurement by the reference and target metrology systems. Methods and systems for parameter optimization based on low-order response surfaces are presented to reduce the compute time required to refine system calibration parameters. 1. A method comprising:receiving an indication of a first spectral measurement of one or more specimen by a reference metrology system, wherein the first spectral measurement is determined based at least in part on an amount of raw measurement data collected by the reference metrology system and one or more system parameter values associated with the reference metrology system;receiving an amount of raw measurement data collected by a target metrology system based on a measurement of the one or more specimen by the target metrology system;determining values of one or more system parameters associated with the target metrology system such that an error function that includes a difference between the first spectral measurement and a second spectral measurement of the one or more specimen by the target metrology system is minimized, wherein the second spectral measurement is determined based at least in part on the amount of raw measurement data collected by the target ...

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Номер записи: 84
23-09-2021 дата публикации

Scatterometry Based Methods And Systems For Measurement Of Strain In Semiconductor Structures

Номер: US20210293532A1
Автор: Aaron Rosenberg, Dawei Hu, Houssam Chouaib, Kai-Hsiang Lin, Zhengquan Tan
Принадлежит: KLA Corp

Methods and systems for measuring optical properties of transistor channel structures and linking the optical properties to the state of strain are presented herein. Optical scatterometry measurements of strain are performed on metrology targets that closely mimic partially manufactured, real device structures. In one aspect, optical scatterometry is employed to measure uniaxial strain in a semiconductor channel based on differences in measured spectra along and across the semiconductor channel. In a further aspect, the effect of strain on measured spectra is decorrelated from other contributors, such as the geometry and material properties of structures captured in the measurement. In another aspect, measurements are performed on a metrology target pair including a strained metrology target and a corresponding unstrained metrology target to resolve the geometry of the metrology target under measurement and to provide a reference for the estimation of the absolute value of strain.

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Номер записи: 85
23-09-2021 дата публикации

SYSTEMS AND METHODS FOR SEMICONDUCTOR CHIP HOLE GEOMETRY METROLOGY

Номер: US20210293727A1
Автор: Wang Le, ZHANG JUN, ZHANG Wei, Zhou Yi, Zou Yuanxiang
Принадлежит:

In certain aspects, a method for training a model is disclosed. A model for measuring a geometric attribute of a hole structure in a semiconductor chip is provided by at least one processor. A plurality of training samples each including a pair of an optical spectrum signal and a reference signal corresponding to a same hole structure are obtained by the at least one processor. The reference signal is labeled with a labeled geometric attribute of the hole structure. An estimated geometric attribute of the hole structure is estimated using the model. A parameter of the model is adjusted based, at least in part, on a difference between the labeled geometric attribute and the estimated geometric attribute in each of the training samples by the at least one processor. 1. A method for training a model , comprising:providing, by at least one processor, a model for measuring a geometric attribute of a hole structure in a semiconductor chip;obtaining, by the at least one processor, a plurality of training samples each comprising a pair of an optical spectrum signal and a reference signal corresponding to a same hole structure, wherein the reference signal is labeled with a labeled geometric attribute of the hole structure;estimating, by the at least one processor, an estimated geometric attribute of the hole structure using the model; andadjusting, by the at least one processor, a parameter of the model based, at least in part, on a difference between the labeled geometric attribute and the estimated geometric attribute in each of the training samples.2. The method of claim 1 , wherein the optical spectrum signal comprises a spectroscopic ellipsometry signal.3. The method of claim 1 , wherein the geometric attribute comprises a tilt of the hole structure.4. The method of claim 1 , wherein the hole structure comprises a lower hole and an upper hole claim 1 , and the geometric attribute comprises an overlay between the upper hole and the lower hole.5. The method of claim 1 , ...

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Номер записи: 86
08-08-2019 дата публикации

Methods of bandgap analysis and modeling for high k metal gate

Номер: US20190242938A1
Автор: Dawei Hu, Dominic Schepis, Min Dai, Ming Di, Qiang Zhao
Принадлежит: Globalfoundries Inc, KLA Tencor Corp

Methods of precisely analyzing and modeling band gap energies and electrical properties of a thin film are provided. One method includes: obtaining a substrate and a thin film disposed above the substrate, the thin film including an interfacial layer above the substrate, and a high-k layer above the interfacial layer; determining a thickness of the thin film; analyzing the thin film using deep ultraviolet spectroscopy ellipsometry to determine the photon energy of reflected light; using a model to determine a set of bandgap energies extracted from a set of results of the photon energy of the analyzing step; and determining at least one of: a leakage current from a main bandgap energy, a nitrogen content from a sub bandgap energy, and an equivalent oxide thickness from the nitrogen content and a composition of the interfacial layer.

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Номер записи: 87
06-09-2018 дата публикации

Spectroscopic tissue analysis apparatus and methods

Номер: US20180252695A1
Автор: Zhiwei Huang
Принадлежит: NATIONAL UNIVERSITY OF SINGAPORE

An apparatus for spectroscopic tissue analysis is disclosed. The apparatus comprises: a light delivery system configured to direct an excitation signal on to a tissue sample; a light collection system configured to collect a backscattered signal comprising diffuse reflectance photons backscattered by the tissue sample; an imaging device; a spectrometer; an optical adaptor configured to direct a first portion of the backscattered signal to the imaging device and a second portion of the backscattered signal to the spectrometer; and an analysis system configured to apply polar decomposition to spectral image data of the tissue captured by the imaging device and the spectrometer and thereby derive polarization metrics for the tissue sample.

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Номер записи: 88
27-11-2014 дата публикации

DEVICE AND METHOD FOR MEASURING PHASE RETARDATION DISTRIBUTION AND FAST AXIS AZIMUTH ANGLE DISTRIBUTION IN REAL TIME

Номер: US20140347665A1
Автор: HUANG Huijie, LIU Longhai, ZENG Aijun, ZHU Linglin
Принадлежит:

Device and method for measuring phase retardation distribution and fast axis azimuth angle distribution of birefringence sample in real time. The device consists of a collimating light source, a circular polarizer, a diffractive beam-splitting component, a quarter-wave plate, an analyzer array, a charge coupled device (CCD) image sensor and a computer with an image acquisition card. The method can measure the phase retardation distribution and the fast axis azimuth angle distribution of the birefringence sample in real time and has large measurement range. The measurement result is immune to the light-intensity fluctuation of the light source. 1. A device for measuring the phase retardation distribution and fast axis azimuth angle distribution in real time , comprisinga collimating light source,a circular polarizer,a diffractive beam-splitting component,a quarter wave plate,an analyzer array,a CCD image sensor, anda computer equipped with an image acquisition card,wherein the analyzer array is composed of four analyzers whose polarization direction angles successively increase by 45°, they are respectively named as a first analyzer, a second analyzer, a third analyzer, and a fourth analyzer;the quarter wave plate is located in the same path with the first analyzer, and the angle between a fast axis of the quarter wave plate and transmission direction of the first analyzer is 45° or 135°;light emitted from the collimating light source passes through the circular polarizer and the diffractive component, and is then split into four sub-beams;one sub-beam passes through the quarter wave plate and then is analyzed by the first analyzer, the other three sub-beams are directly analyzed by the second analyzer, the third analyzer, and the fourth analyzer, respectively;an output port of the image sensor is connected to an input port of the computer; anda faucet for the measuring sample is set between the circular polarizer and the diffractive component.2. The device for ...

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Номер записи: 89
27-11-2014 дата публикации

METROLOGY SYSTEM OPTIMIZATION FOR PARAMETER TRACKING

Номер: US20140347666A1
Автор: Brady Gregory, Dziura Thaddeus Gerard, Kuznetsov Alexander, Pandev Stilian Ivanov, Shchegrov Andrei V., Veldman Andrei
Принадлежит:

Methods and systems for evaluating the capability of a measurement system to track measurement parameters through a given process window are presented herein. Performance evaluations include random perturbations, systematic perturbations, or both to effectively characterize the impact of model errors, metrology system imperfections, and calibration errors, among others. In some examples, metrology target parameters are predetermined as part of a Design of Experiments (DOE). Estimated values of the metrology target parameters are compared to the known DOE parameter values to determine the tracking capability of the particular measurement. In some examples, the measurement model is parameterized by principal components to reduce the number of degrees of freedom of the measurement model. In addition, exemplary methods and systems for optimizing the measurement capability of semiconductor metrology systems for metrology applications subject to process variations are presented. 1. A method comprising:receiving a measurement model characterizing a response of a metrology system to a measurement of a metrology target, wherein the measurement model includes one or more parameters of interest characterizing the metrology target and one or more system parameters characterizing the metrology system;determining a set of known values associated with any of the one or more parameters of interest that span a desired process window associated with the metrology target;determining a set of perturbed synthetic measurement signals based on a set of simulations of the measurement model characterizing a set of measurements of the metrology target for each of the set of known values of any of the one or more parameters of interest and at least one perturbation signal;determining estimated values associated with each of the one or more parameters of interest based on the set of perturbed synthetic measurement signals;determining a metric indicative of a parameter tracking performance of ...

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Номер записи: 90
24-09-2015 дата публикации

Optical particle analysis

Номер: US20150268151A1
Автор: Faris Modawar
Принадлежит: Moxtek Inc

A system and method for determining particle size, shape, and/or quantity. The particle can alter the polarization state of two oppositely-polarized light beams, thus allowing the light beams to interfere with each other. An interference pattern from interference of the two light beams can be captured by a CCD. The interference pattern can be analyzed to determine size, shape, and/or quantity.

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Номер записи: 91
08-10-2015 дата публикации

MULTIPLE ANGLES OF INCIDENCE SEMICONDUCTOR METROLOGY SYSTEMS AND METHODS

Номер: US20150285735A1
Автор: Arain Muzammil, Brady Gregory, de Veer Johannes D., Filip Catalin, Flock Klaus, Krishnan Shankar, Rotter Lawrence, Shchegrov Andrei, Wang David Y.
Принадлежит: KLA- Tencor Corporation

An apparatus includes (i) a bright light source for providing an illumination beam at multiple wavelengths selectable with a range from a deep ultraviolet wavelength to an infrared wavelength, (ii) illumination optics for directing the illumination beam towards a sample at selectable sets of angles of incidence (AOI's) or azimuth angles (AZ's) and polarization states to provide spectroscopic ellipsometry, wherein the illumination optics include an apodizer for controlling a spot size of the illumination beam on the sample at each of the selectable AOI/AZ sets, (iii) collection optics for directing an output beam from the sample in response to the illumination beam at each of the selectable AOI/AZ sets and polarization states towards a detector that generates an output signal or image based on the output beam, and (v) a controller for characterizing a feature of the sample based on the output signal or image. 1. An ellipsometer apparatus for performing metrology of a semiconductor sample , comprising: a first off axis parabolic (OAP) mirror,', 'a first translation mirror that is movable to receive the illumination beam at a plurality of positions to direct the illumination beam to a plurality of positions on the first OAP mirror so that the first OAP reflects the illumination beam to the sample at the discrete ranges of AOI and/or AZ one at a time, and', 'polarization generating optical elements for generating a plurality of polarization states for the illumination beam;, "an illumination optics module for providing an illumination beam at a plurality of wavelengths that are selectable within a range from a vacuum ultraviolet (VUV) wavelength to an infrared (IR) wavelength and directing the illumination beam towards the sample at a plurality of angles of incidence (AOI's) and/or azimuth angles (AZ's), wherein the illumination optics comprises:"} a detector,', 'a second OAP,', 'a second translation mirror that is movable to receive the output beam at a plurality of ...

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Номер записи: 92
27-09-2018 дата публикации

Interferometric Ellipsometry and Method using Conical Refraction

Номер: US20180275047A1
Автор: Arieli Yoel, COHEN YOEL
Принадлежит:

An apparatus and method for determining optical properties of an object includes a tunable monochromatic light source and an optical system for illuminating at least one point of the object with light from the light source, and collecting light reflected from the object. A biaxial birefringent crystal intercepts a beam of light reflected from the object and propagates the beam along an optical axis of the crystal and transforms the beam of reflected light to a ring of light having a periphery, each point of which has a different polarization plane. A detector array detects respective points along the periphery of the ring and a processing unit is coupled to the detector and is responsive to signals thereby for determining optical properties of the object. 1. An apparatus comprising:a tunable monochromatic light source configured to illuminate at least one point of an object;a polarizer configured to be disposed between the light source and the object, the polarizer being configured to polarize light from the light source;a biaxial birefringent crystal (a) positioned to intercept a beam of light reflected from the object, (b) positioned to propagate the beam along an optical axis of the crystal, and (c) configured to transform the beam of reflected light into a ring of light, (i) each point of the ring of light having a different polarization plane, and (ii) a diameter of the ring of light being different for different respective wavelengths of the light from the tunable monochromatic light source; anda detector array configured to simultaneously detect respective points along the ring of light for each of a plurality of wavelengths of the tunable monochromatic light source, such that images are acquired by the detector array at different wavelengths, one at a time.2. The apparatus according to :further comprising an interferometer positioned such that, when the light source is activated, (a) light from the light source enters the interferometer and is split into two ...

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Номер записи: 93
09-12-2021 дата публикации

TOTAL INTERNAL REFLECTION ENABLED WIDE-FIELD COHERENT ANTI-STOKES RAMAN SCATTERING MICROSCOPY

Номер: US20210381986A1
Автор: Doughty Benjamin L., Ma Yingzhong
Принадлежит:

A system is provided. The system has a femtosecond oscillator to generate pulses used for pump and probe beams. A photonic crystal fiber is disposed in a path of the probe beam and produces pulses for a chirped probe beam. A high NA objective receives the pump and the chirped probe beam, redirects the received beams through a dielectric substrate towards an interface between a sample and the dielectric substrate to cause total internal reflection (TIR) at the sample-substrate interface, and produces corresponding evanescent waves in a portion of the sample adjacent to the sample-substrate interface, and collects a backward-propagating beam of pulses of responsive light. The portion of the sample illuminated by the evanescent waves emits responsive light. The dielectric substrate is transparent to the responsive light, the pump and the chirped probe beam. An image is produced having a specific image size using the received backward-propagating beam. 1. A system comprising:an oscillator configured to emit femtosecond (fs) pulses of light centered at a preset wavelength;a beam splitter disposed in a path of the emitted pulses of light and configured to split the emitted light into pulses for a pump beam and a probe beam;a photonic crystal fiber disposed in a path of the probe beam and configured to produce pulses for a chirped probe beam; receive the pump beam and the chirped probe beam, where the received pump and chirped probe beams are spatially and temporally aligned,', 'redirect the received pump and chirped probe beams through a dielectric substrate towards an interface between a sample and the dielectric substrate to', 'cause total internal reflection (TIR) of the pump beam and the chirped probe beam at the sample-substrate interface, the sample is disposed on the dielectric substrate, where the dielectric substrate is transparent to both the pump beam and the chirped probe beam; and', 'produce corresponding evanescent waves in a portion of the sample adjacent ...

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Номер записи: 94
05-09-2019 дата публикации

CIRCULAR DICHROISM MEASURING METHOD AND CIRCULAR DICHROISM MEASURING DEVICE

Номер: US20190271639A1
Автор: SATOZONO Hiroshi
Принадлежит:

Circular dichroism can be accurately measured even when a phase modulation element with a distortion component is used. 1. (canceled)2. (canceled)5. The circular dichroism measuring device according to claim 4 , further comprising:a beam splitter that splits the light emitted from the phase modulation element in two,wherein a light detector constituting the sample data acquisition means and detecting light transmitted through the sample is formed on an optical path for one of the two lights split by the beam splitter, and the second polarization plate constituting the Ip(t) acquisition means and a second light detector detecting light transmitted through the second polarization plate are formed on an optical path for the other of the two lights split by the beam splitter. The present invention relates to a circular dichroism measuring method and a circular dichroism measuring device.Circular dichroism (CD) is a phenomenon caused by optical activity (chirality) of molecules and is defined as a difference in absorbance with respect to left and right circularly polarized light. Since spectral information of this circular dichroism reflects a high-order structure of molecules, circular dichroism is particularly suitably applied to, for example, analysis of a high order structure of biologically active substance. For this circular dichroism, a method of irradiating a sample with left and right circularly polarized lights and obtaining a difference in absorbance from an intensity difference of transmitted light is generally used.In measurement of the circular dichroism, measurement using a so-called modulation method is generally used. In a modulation method, an optical phase modulator such as a photoelastic modulator or a Pockel cell is used as a circular polarization modulator that generates circularly polarized light. However, modulation of the circular polarization modulator in which there is a distortion component is known (see, for example, Patent Literature 1 and ...

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Номер записи: 95
25-12-2014 дата публикации

MULTIPLE MEASUREMENT TECHNIQUES INCLUDING FOCUSED BEAM SCATTEROMETRY FOR CHARACTERIZATION OF SAMPLES

Номер: US20140375983A1
Автор: Kotelyanskii Michael J., WOLF Robert Gregory
Принадлежит: Rudolph Technologies, Inc.

A system for monitoring thin-film fabrication processes is herein disclosed. Diffraction of incident light is measured and the results are compared to a predictive model based on at least one idealized or nominal structure. The model and/or the measurement of diffracted incident light may be modified using the output of one or more additional metrology systems. 1. An ellipsometric A metrology tool for optically measuring characteristics of a substrate comprising:at least one light source adapted to output a beam of incident light;a first optical element for focusing the incident light onto a metrology site of the substrate having a periodic structure formed thereon at a plurality of incident angles and at a plurality of azimuthal angles, an optical axis of the first optical element being inclined at an oblique angle with respect to a plane of the substrate, wherein the incident light is incident upon the metrology site of the substrate at a range of angles of incidence between 0 degrees to 90 degrees as measured from a normal axis of the metrology site;a second optical element for directing reflected light reflected from the metrology site to a detector, the detector output being at least partially correlated to a polarization state of the incident light, a phase shift of the reflected light, at least one of the plurality of incident angles and at least one of the plurality of azimuthal angles of the incident light with respect to the metrology site;a control system comprises a computer, the computer configured to identify from a model of the substrate an optimal azimuthal angle of the beam of light and, comparing data output by the detector at the optimal azimuthal angle of a principal angle of the beam of light with at least one other azimuthal angle of the principal angle of the beam of light to validate the model.2. (canceled)3. The ellipsometric metrology tool of wherein the detector is a CCD array that outputs an array of light intensity data on a pixel by ...

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Номер записи: 96
06-10-2016 дата публикации

Feed Forward of Metrology Data in a Metrology System

Номер: US20160290796A1
Автор: Ady Levy, Barak BRINGOLTZ, Dana Klein, Daniel Kandel, Janay Camp, John Robinson, Leonid Poslavsky, Mark Wagner, Michael E. Adel, Nadav Carmel, Nuriel Amir, Tal Itzkovich, Tal Marciano, Tzahi Grunzweig, Vidya Ramanathan
Принадлежит: KLA Tencor Corp

A metrology performance analysis system includes a metrology tool including one or more detectors and a controller communicatively coupled to the one or more detectors. The controller is configured to receive one or more metrology data sets associated with a metrology target from the metrology tool in which the one or more metrology data sets include one or more measured metrology metrics and the one or more measured metrology metrics indicate deviations from nominal values. The controller is further configured to determine relationships between the deviations from the nominal values and one or more selected semiconductor process variations, and determine one or more root causes of the deviations from the nominal values based on the relationships between values of the one or more metrology metrics and the one or more selected semiconductor process variations.

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Номер записи: 97
27-08-2020 дата публикации

Variable Aperture Mask

Номер: US20200271569A1
Автор: Barry Blasenheim, Michael Friedmann, Noam Sapiens, Pablo Rovira
Принадлежит: KLA Corp

A collection system of a semiconductor metrology tool includes a chuck to support a target from which an optical beam is reflected and a spectrometer to receive the reflected optical beam. The collection system also includes a plurality of aperture masks arranged in a rotatable sequence about an axis parallel to an optical axis. Each aperture mask of the plurality of aperture masks is rotatable into and out of the reflected optical beam between the chuck and the spectrometer to selectively mask the reflected optical beam.

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Номер записи: 98
12-09-2019 дата публикации

SPECULAR VARIABLE ANGLE ABSOLUTE REFLECTANCE METHOD AND REFLECTOMETER

Номер: US20190277760A1
Автор: Murphy Jeffery Thomas, Shawgo Loyal Bruce
Принадлежит:

A specular variable angle absolute reflectometer. The device includes a light source and a mirror system in a light path of the light source. The mirror system is configured to reflect a light beam from the light source towards a sample that is optically reflective. The device also includes a roof mirror disposed in the light path after the sample. The roof mirror is configured to reflect the light beam back towards the sample. The device also includes a mechanism connected to the roof mirror. The mechanism is configured to rotate the roof mirror about an axis of the sample. The device also includes a detector in the light path after the roof mirror such that the detector receives light that has been reflected from the roof mirror, thence back to the sample, thence back to the mirror system, and thence to the detector. 1. A specular variable angle absolute reflectometer , comprising:a light source;a mirror system in a light path of the light source, the mirror system configured to reflect a light beam from the light source towards a sample that is optically reflective;a roof mirror disposed in the light path after the sample, the roof mirror configured to reflect the light beam back towards the sample;a mechanism connected to the roof mirror, the mechanism being configured to rotate the roof mirror about an axis of the sample; anda detector in the light path after the roof mirror such that the detector receives light that has been reflected from the roof mirror, thence back to the sample, thence back to the mirror system, and thence to the detector.2. The specular variable angle absolute reflectometer of claim 1 , wherein the roof mirror comprises a “V” shaped wedge with an inner angle of the “V” shaped wedge facing the sample.3. The specular variable angle absolute reflectometer of claim 1 , wherein the light source comprises a tunable laser.4. The specular variable angle absolute reflectometer of further comprising:a polarization controller disposed in the light ...

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Номер записи: 99
13-10-2016 дата публикации

Systems and Methods to Reduce Delamination In Integrated Computational Elements Used Downhole

Номер: US20160299084A1
Автор: Atkinson Robert, Perkins David L., PRICE James M.
Принадлежит: Halliburton Energy Services, Inc.

Systems and methods are disclosed for reducing delamination or cracking in a multilayer film stack fabricated on a substrate. The multilayer film stack is designed to optically process a sample fluid interacted electromagnetic radiation to measure various chemical or physical characteristics of a production fluid from a wellbore. Systems and methods measure in situ a characteristic of the multilayer film stack during fabrication and compare the measured characteristic against a reference criterion. The reference criterion has been predetermined to represent an onset of delamination or cracking. If the reference criterion is met, fabrication of the multilayer film stack is modified to reduce the possibility of delamination or cracking. Other systems and methods are presented. 1. A method for reducing delamination or cracking of a multilayer film stack fabricated on a substrate for use in measuring the properties of a sample fluid , the method comprising:measuring a materials characteristic of the multilayer film stack in situ during fabrication with a precision measurement device;evaluating the measured materials characteristic against a reference criterion during fabrication;modifying fabrication of the multilayer film stack if the reference criterion is met; andwherein the multilayer film stack is fabricated to transmit an optical spectrum related to one or more characteristics of the sample fluid.2. The method of claim 1 , the method further comprising:modifying a design of the multilayer film stack if the reference criteria is met; andcontinuing fabrication of the multilayer film stack using the modified design.3. The method of claim 2 , the method further comprising:repeating the steps of measuring the materials characteristic, evaluating the measured materials characteristic, modifying fabrication, modifying the design, and continuing fabrication until the multilayer film stack is completely fabricated.4. The method of or any of - claim 2 , wherein evaluating ...

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Номер записи: 100