SUNSCREEN CASE HAVING UV MEASURING MEANS

The present invention relates to a sunscreen case capable of using the proper amount of a sunscreen according to the intensity of UV rays. The sunscreen case has a discoloration unit of which a color is changed according to the intensity of UV rays. By comparing the color expressed through the discoloration unit with a color of a comparison unit in the case, the proper amount of the sunscreen is discharged and applied to the skin. COPYRIGHT KIPO 2017 ...

Vacuum Ultraviolet Absorption Spectroscopy System And Method

An efficient absorption spectroscopy system is provided. The spectroscopy system may be configured to measure solid, liquid or gaseous samples. Vacuum ultra-violet wavelengths may be utilized. Some of the disclosed techniques can be used for detecting the presence of trace concentrations of gaseous species. A preferable gas flow cell is disclosed. Some of the disclosed techniques may be used with a gas chromatography system so as to detect and identify species eluted from the column. Some of the disclosed techniques may be used in conjunction with an electrospray interface and a liquid chromatography system so as to detect and identify gas phase ions of macromolecules produced from solution. Some of the disclosed techniques may be used to characterize chemical reactions. Some of the disclosed techniques may be used in conjunction with an ultra short-path length sample cell to measure liquids. 1. A gas analysis system , comprising:a gas reaction flow cell, the gas reaction flow cell being configured to allow for a chemical reaction between at least two gas species;at least one gas inlet port of the gas reaction flow cell configured to provide the at least two gas species into the gas reaction flow cell, at least two of the at least two gas species being reactive with each other;at least one gas outlet port of the gas reaction flow cell;a detection space within the gas reaction flow cell;a light source coupled to the gas reaction flow cell, the light source configured to provide at least VUV or less wavelengths of light;a spectrometer coupled to the gas reaction flow cell, the spectrometer capable of measuring multiple wavelengths of light simultaneously; anda light path from the light source to the spectrometer, the light path being contained within one or more controlled environments,the gas reaction flow cell configured to pass light from the light source through the detection space to the spectromenter to detect a property of the chemical reaction.2. The system of ...

Vacuum Ultraviolet Absorption Spectroscopy System And Method

An efficient absorption spectroscopy system is provided. The spectroscopy system may be configured to measure solid, liquid or gaseous samples. Vacuum ultra-violet wavelengths may be utilized. Some of the disclosed techniques can be used for detecting the presence of trace concentrations of gaseous species. A preferable gas flow cell is disclosed. Some of the disclosed techniques may be used with a gas chromatography system so as to detect and identify species eluted from the column. Some of the disclosed techniques may be used in conjunction with an electrospray interface and a liquid chromatography system so as to detect and identify gas phase ions of macromolecules produced from solution. Some of the disclosed techniques may be used to characterize chemical reactions. Some of the disclosed techniques may be used in conjunction with an ultra short-path length sample cell to measure liquids. 1. A system for analyzing gas , comprising: a gas chromatography column, the gas chromatography column configured to provide at least one gas analyte to be analyzed;', 'a gas flow cell coupled to the gas chromatography column so as to receive a flow of the analyte from the gas chromatography column;', 'a light source which includes at least VUV light or less wavelengths, the light source optically coupled to the gas flow cell, the light source optically coupled to the gas flow cell in a manner that allows VUV light to enter the gas flow cell; and', 'a first detector optically coupled to the gas flow cell, the gas flow cell configured to pass VUV light from the light source through a detection space of the gas flow cell to the detector to enable the detector to detect a property of the analyte; and, 'a first gas analysis system, the first gas analysis system comprising a gas chromatography system, the gas chromatography system comprisinga second gas analysis system coupled to the first gas analysis system, the second gas analysis system coupled to the first gas analysis system ...

Infrared Spectroscopic Reflectometer For Measurement Of High Aspect Ratio Structures

Methods and systems for performing spectroscopic reflectometry measurements of semiconductor structures at infrared wavelengths are presented herein. In some embodiments measurement wavelengths spanning a range from 750 nanometers to 2,600 nanometers, or greater, are employed. In one aspect, reflectometry measurements are performed at oblique angles to reduce the influence of backside reflections on measurement results. In another aspect, a broad range of infrared wavelengths are detected by a detector that includes multiple photosensitive areas having different sensitivity characteristics. Collected light is linearly dispersed across the surface of the detector according to wavelength. Each different photosensitive area is arranged on the detector to sense a different range of incident wavelengths. In this manner, a broad range of wavelengths are detected with high signal to noise ratio by a single detector. 1. A metrology system comprising: one or more illumination sources configured to generate an amount of broadband illumination light including wavelengths spanning a range from 750 nanometers to 2,600 nanometers;', 'an illumination optics subsystem configured to direct the amount of illumination light from the illumination source to a measurement spot on a surface of a specimen under measurement at one or more angles of incidence, one or more azimuth angles, or a combination thereof;', 'a collection optics subsystem configured to collect an amount of collected light from the measurement spot on the surface of the specimen;', 'at least one detector having a planar, two-dimensional surface sensitive to incident light, wherein the at least one detector includes two or more different surface areas each having different photosensitivity, wherein the two or more different surface areas are aligned with a direction of wavelength dispersion across the surface of the at least one detector, the at least one detector configured to detect the incident light and generate ...

Vacuum Ultraviolet Absorption Spectroscopy System And Method

An efficient absorption spectroscopy system is provided. The spectroscopy system may be configured to measure solid, liquid or gaseous samples. Vacuum ultra-violet wavelengths may be utilized. Some of the disclosed techniques can be used for detecting the presence of trace concentrations of gaseous species. A preferable gas flow cell is disclosed. Some of the disclosed techniques may be used with a gas chromatography system so as to detect and identify species eluted from the column. Some of the disclosed techniques may be used in conjunction with an electrospray interface and a liquid chromatography system so as to detect and identify gas phase ions of macromolecules produced from solution. Some of the disclosed techniques may be used to characterize chemical reactions. Some of the disclosed techniques may be used in conjunction with an ultra short-path length sample cell to measure liquids.

Methods And Apparatus For Vacuum Ultraviolet (VUV) Or Shorter Wavelength Circular Dichroism Spectroscopy

A highly efficient vacuum ultraviolet circular dichroism spectrometer is provided; the spectrometer suitable for laboratory use or for integration into a beam line at a synchrotron radiation facility. In one embodiment, a spectroscopic circular dichroism instrument is provided; the instrument configured so as to enable circular dichroism data to be simultaneously obtained for multiple wavelengths of light. The instrument may be further configured to operate in at least a portion of the vacuum ultraviolet wavelength region. 1. A spectroscopic circular dichroism instrument , comprising:a light source which generates a multi-wavelength light beam comprised of light of a plurality of wavelengths;a region of the spectroscopic circular dichroism instrument for the placement of a sample from which a circular dichroism measurement is to be obtained by exposure of a sample to the multi-wavelength light beam;a constant phase difference compensator optically coupled to the multi-wavelength light beam, the constant phase difference compensator introducing a phase difference between two orthogonal polarization components of the multi-wavelength light beam;an optical element coupled to the multi-wavelength light beam, the optical element selecting a linearly polarized component of the multi-wavelength light beam; anda detector coupled to the multi-wavelength light beam to provide a circular dichroism measurement of the sample, the instrument being capable of providing the circular dichroism measurement simultaneously for multiple wavelengths.2. The spectroscopic circular dichroism instrument of claim 1 , wherein an optical path of the instrument is configured to allow the multi-wavelength light beam to pass through the constant phase difference compensator and the optical element after exposure of the sample to the multi-wavelength light beam.3. The spectroscopic circular dichroism instrument of claim 1 , wherein an optical path of the instrument is configured to allow the multi- ...

Multidimensional nanotomography with high harmonics and attosecond pulses

A system and method for performing four dimensional multicolor nanotomography with high harmonics and attosecond pulses to attain spectrally resolved absorption data about the three-dimensional volumetric structure of a sample are disclosed. Also disclosed are embodiments of the system and method that have been adapted to perform four dimensional multicolor nanotomography absorption and index of refraction data about the three-dimensional volumetric structure of a sample, to perform five dimensional multicolor nanotomography with high harmonics and attosecond pulses to obtain spectrally resolved absorption data about the three-dimensional volumetric structure and temporal dynamics of the sample, to perform five dimensional multicolor nanotomography to obtain spectrally resolved absorption and index of refraction data about the three-dimensional volumetric structure and temporal dynamics of the sample, and to perform Fourier-domain Optical Coherence Tomography.

Methods of bandgap analysis and modeling for high k metal gate

Methods of precisely analyzing and modeling band gap energies and electrical properties of a thin film are provided. One method includes: obtaining a substrate and a thin film disposed above the substrate, the thin film including an interfacial layer above the substrate, and a high-k layer above the interfacial layer; determining a thickness of the thin film; analyzing the thin film using deep ultraviolet spectroscopy ellipsometry to determine the photon energy of reflected light; using a model to determine a set of bandgap energies extracted from a set of results of the photon energy of the analyzing step; and determining at least one of: a leakage current from a main bandgap energy, a nitrogen content from a sub bandgap energy, and an equivalent oxide thickness from the nitrogen content and a composition of the interfacial layer.

Mid-Infrared Spectroscopy For Measurement Of High Aspect Ratio Structures

Methods and systems for performing high throughput spectroscopic measurements of semiconductor structures at mid-infrared wavelengths are presented herein. A Fourier Transform Infrared (FTIR) spectrometer includes one or more measurement channels spanning a wavelength range between 2.5 micrometers and 12 micrometers. The FTIR spectrometer measures a target at multiple different angles of incidence, azimuth angles, different wavelength ranges, different polarization states, or any combination thereof. In some embodiments, illumination light is provided by a laser sustained plasma (LSP) light source to achieve high brightness and small illumination spot size. In some embodiments, FTIR measurements are performed off-axis from the direction normal to the surface of the wafer. In some embodiments, a Stirling cooler extracts heat from the detector of an FTIR spectrometer. In another aspect, measurements performed by one or more spectrometer measurement channels are combined with measurements performed by a mid-infrared FTIR spectrometer channel to characterize high aspect ratio structures. 1. A metrology system comprising: at least one illumination source generating a first amount of broadband illumination light including wavelengths spanning a range from 2.5 micrometers to 12 micrometers;', 'an interferometer receiving the first amount of broadband illumination light and generating an amount of FTIR illumination light having a time varying spectrum;', 'an FTIR illumination optics subsystem directing the amount of FTIR illumination light from the interferometer to a FTIR measurement spot on a surface of a specimen under measurement at one or more angles of incidence, one or more azimuth angles, or a combination thereof, wherein a size of the FTIR measurement spot on the surface of the specimen is less than 50 micrometers;', 'a FTIR collection optics subsystem collecting an amount of FTIR collected light from the FTIR measurement spot on the surface of the specimen in ...

Complex Spatially-Resolved Reflectometry/Refractometry

Apparatus and methods for complex imaging reflectometry and refractometry using at least partially coherent light. Quantitative images yield spatially-dependent, local material information about a sample of interest. These images may provide material properties such as chemical composition, the thickness of chemical layers, dopant concentrations, mixing between layers of a sample, reactions at interfaces, etc. An incident beam of VUV wavelength or shorter is scattered off of a sample and imaged at various angles, wavelengths, and/or polarizations. The power of beam is also measured. This data is used to obtain images of a sample's absolute, spatially varying, complex reflectance or transmittance, which is then used to determine spatially-resolved, depth-dependent sample material properties.

Vacuum Ultraviolet Absorption Spectroscopy System And Method

An efficient absorption spectroscopy system is provided. The spectroscopy system may be configured to measure solid, liquid or gaseous samples. Vacuum ultra-violet wavelengths may be utilized. Some of the disclosed techniques can be used for detecting the presence of trace concentrations of gaseous species. A preferable gas flow cell is disclosed. Some of the disclosed techniques may be used with a gas chromatography system so as to detect and identify species eluted from the column. Some of the disclosed techniques may be used in conjunction with an electrospray interface and a liquid chromatography system so as to detect and identify gas phase ions of macromolecules produced from solution. Some of the disclosed techniques may be used to characterize chemical reactions. Some of the disclosed techniques may be used in conjunction with an ultra short-path length sample cell to measure liquids. 1. A liquid chromatography analysis system , comprising:a liquid chromatography column, the liquid chromatography column configured to provide at least one analyte to be analyzed;a flow cell coupled to the liquid chromatography column, the flow cell configured to receive a flow of the analyte from the liquid chromatography column;a light source configured to provide at least VUV wavelengths or less of light to the flow cell, the flow cell further configured to facilitate a partial transmission of at least VUV wavelengths or less of light through the flow of the analyte;a detector configured to detect the at least VUV wavelengths or less of light transmitted through the flow of the analyte, the detector capable of detecting multiple wavelengths simultaneously as a function of time; anda light path from the light source to the detector being contained within one or more controlled environments.2. The system of claim 1 , wherein transmission of at least VUV wavelengths or less of light through the flow cell is achieved by employing an ultra-short path-length flow cell claim 1 , ...

TESTING METHOD FOR RESIDUAL ORGANIC COMPOUNDS IN A LIQUID SAMPLE

A method and system for testing a liquid sample for an organic compound is disclosed, the method including the steps of collecting the liquid sample from a liquid source; transmitting light having a wavelength of between about 190 nanometers and about 310 nanometers into the liquid sample; measuring absorption/transmission of the light by the organic compound in the liquid sample; and determining a concentration of the organic compound within the liquid sample based on the absorption/transmission of the light by the organic compound. The system can include a spectrophotometer for measuring the absorption of UV light by the organic compound, an ion exchange column for removing ion contaminants from the liquid sample, and a vacuum degasser unit for removing gases and other impurities from the liquid sample.

Complex Spatially-Resolved Reflectometry/Refractometry

Apparatus and methods for complex imaging reflectometry and refractometry using at least partially coherent light (). Quantitative images yield spatially-dependent, local material information about a sample () of interest. These images may provide material properties such as chemical composition, the thickness of chemical layers, dopant concentrations, mixing between layers of a sample, reactions at interfaces, etc. An incident beam () of VUV wavelength or shorter is scattered off of a sample () and imaged at various angles, wavelengths, and/or polarizations. The power of beam () is also measured. This data is used to obtain images of a sample's absolute, spatially varying, complex reflectance or transmittance, which is then used to determine spatially-resolved, depth-dependent sample material properties. 1. The method of determining spatially-resolved material properties from a sample's complex reflectance or transmittance comprising the steps of:a. providing at least partially spatially-coherent radiation in the form of an incident beam;b. characterizing the incident beam;c. delivering the incident beam onto a sample to produce scattered radiation;d. varying at least one independent parameter of the incident beam upon which the sample's complex reflectance or transmittance is dependent;e. collecting the scattered radiation at multiple values of the independent parameter on a detector and generating scatter data;f. generating at least one spatially-resolved, complex image of the sample based upon the beam characterization and the collected scatter data, at each of the multiple values of the independent parameter, without constraining the images based on a structural model of the sample;g. calculating spatially-resolved complex scattering properties of the sample based on the images; andh. determining spatially-resolved, depth-dependent material properties of the sample from the spatially-resolved complex scattering properties.2. The method of wherein step 1h ...

GAS CHROMATOGRAPHY WITH VACUUM ULTRA-VIOLET DETECTOR AND MASS SPECTROMETER OR ION MOBILITY SPECTROMETER

Disclosed herein is an ion analysis instrument combining a chromatographic or other separation device for separating gaseous analyte material according to retention time with an ultra-violet (“UV”) spectrometer or detector for obtaining ultra-violet spectral data of at least a portion of the analyte material separated in said chromatographic or other separation device and a mass and/or ion mobility spectrometer for obtaining mass and/or ion mobility spectral data of ions generated from at least a portion of the analyte material separated in said chromatographic or other separation device. This instrument is able to provide highly orthogonal multidimensional data sets. 1. An analysis instrument comprising:a chromatographic or other separation device for separating gaseous analyte material according to retention time;an ultra-violet (“UV”) spectrometer or detector for obtaining ultra-violet spectral data of at least a portion of the analyte material separated in said chromatographic or other separation device; anda mass and/or ion mobility spectrometer for obtaining mass and/or ion mobility spectral data of ions generated from at least a portion of the analyte material separated in said chromatographic or other separation device.2. An instrument as claimed in claim 1 , wherein said chromatographic or other separation device comprises a gas chromatograph.3. An instrument as claimed in or claim 1 , wherein said ultra-violet spectrometer or detector comprises a flow cell vacuum ultra-violet (“VUV”) absorption detector.4. An instrument as claimed in claim 1 , further comprising a data recording system for recording one or more multi-dimensional data sets comprising said ultra-violet spectral data and said mass and/or ion mobility spectral data arranged according to retention time.5. An instrument as claimed in claim 1 , wherein said mass and/or ion mobility spectrometer is located downstream of said ultra-violet spectrometer or detector such that analyte material is ...

SPECTROMETER COMPATIBLE VACUUM AMPOULE DETECTION SYSTEM FOR RAPIDLY DIAGNOSING AND QUANTIFYING VIABLE BACTERIA IN LIQUID SAMPLES

A vacuum ampoule detection system and a method detect and quantify viable bacteria in liquid samples. The vacuum ampoule that includes a supporting medium, a selective reagent, and a detecting reagent are useful in the rapid detection and quantification of viable heterotrophic bacteria in liquid samples. The vacuum ampoule detection system is suitable for the detection of total bacteria, or total coliform, etc. The vacuum ampoule detection system is also compatible with spectrometer for visible light, UV light and fluorescence which can give more accurate analysis of the concentration of bacteria in the liquid samples. 1. A self-filling vacuum ampoule detection system to quantify viable bacteria in a liquid sample , the self-filling vacuum ampoule detection system comprising: a supporting medium, wherein the supporting medium comprises nutrients for culture bacterial species in the liquid sample;', 'at least one selective reagent to inhibit a growth of interference microbial species in the liquid sample; and', 'a detection reagent to quantify an amount of bacterial species in the liquid sample,, 'a vacuum ampoule includingwherein when the vacuum ampoule is self-filled with the liquid sample, and the viable bacteria is present in the liquid sample and react with the detection reagent, the self-filled vacuum ampoule is configured to change color.2. The self-filling vacuum ampoule detection system of claim 1 ,wherein the supporting medium comprises yeast extract, peptone, sodium chloride, or lab-lemco powder, andwherein the detection reagent comprises 2,3,5-triphenyltetrazolium chloride (TTC) to detect the viable total bacteria in the liquid sample.3. The self-filling vacuum ampoule detection system of claim 1 ,wherein the vacuum ampoule comprises about 1˜20% of yeast extract, about 10˜40% of peptone, about 10˜40% of sodium chloride, about 1˜10% of lab-lemco powder, and about 0.1˜1% of 2,3,5-triphenyltetrazolium chloride (TTC), and detects the viable total bacteria in ...

Vacuum Ultraviolet Absorption Spectroscopy System And Method

An efficient absorption spectroscopy system is provided. The spectroscopy system may be configured to measure solid, liquid or gaseous samples. Vacuum ultra-violet wavelengths may be utilized. Some of the disclosed techniques can be used for detecting the presence of trace concentrations of gaseous species. A preferable gas flow cell is disclosed. Some of the disclosed techniques may be used with a gas chromatography system so as to detect and identify species eluted from the column. Some of the disclosed techniques may be used in conjunction with an electrospray interface and a liquid chromatography system so as to detect and identify gas phase ions of macromolecules produced from solution. Some of the disclosed techniques may be used to characterize chemical reactions. Some of the disclosed techniques may be used in conjunction with an ultra short-path length sample cell to measure liquids. 1. A method of obtaining data regarding a gas analyte , comprising:providing the analyte from a gas chromatography column;providing the analyte to a gas flow cell;passing VUV wavelengths or less of light through the gas flow cell;detecting absorption of the VUV wavelengths or less of light by the analyte through the use of a spectrometer optically coupled to an optical output of the gas flow cell;obtaining a three dimensional data set indicative of an amount of absorption of the analyte as a function of wavelength and time; andanalyzing the three dimensional data set to determine an identity and quantity of the analyte.2. The method of claim 1 , further comprising providing a makeup gas flow to the gas flow cell in conjunction with the analyte.3. The method of claim 2 , further comprising varying the flow rate of the makeup gas flow.4. The method of claim 2 , further comprising varying the flow rate of the makeup gas flow in a manner to enhance temporal resolution of the analyte provided from the gas chromatography column in a manner that does not affect the detection of the ...

Vacuum Ultraviolet Absorption Spectroscopy System And Method

An efficient absorption spectroscopy system is provided. The spectroscopy system may be configured to measure solid, liquid or gaseous samples. Vacuum ultra-violet wavelengths may be utilized. Some of the disclosed techniques can be used for detecting the presence of trace concentrations of gaseous species. A preferable gas flow cell is disclosed. Some of the disclosed techniques may be used with a gas chromatography system so as to detect and identify species eluted from the column. Some of the disclosed techniques may be used in conjunction with an electrospray interface and a liquid chromatography system so as to detect and identify gas phase ions of macromolecules produced from solution. Some of the disclosed techniques may be used to characterize chemical reactions. Some of the disclosed techniques may be used in conjunction with an ultra short-path length sample cell to measure liquids. 1. A gas analysis system , comprising: a gas inlet;', 'a gas outlet;', 'a gas flow channel, the gas flow channel being environmentally sealed to provide a controlled environment for a flow of gas from the gas inlet to the gas outlet;, 'a gas flow cell, the gas flow cell comprisinga first optical coupling coupled to the gas flow cell on a first side of the first optical coupling, the first optical coupling capable of passing collimated VUV wavelengths or less of light as part of transmission of the light into the gas flow channel;a second optical coupling coupled to the gas flow cell on a first side of the second optical coupling, the second optical coupling capable of passing collimated VUV wavelengths or less of light as part of transmission of the light from the gas flow channel;a first thermal isolation coupling coupled to a second side of the first optical coupling, the first thermal isolation coupling providing thermal isolation from the first optical coupling, the first thermal isolation coupling being rigid; anda second thermal isolation coupling coupled to a second side ...

Determining one or more characteristics of light in an optical system

Methods and systems for determining one or more characteristics of light in an optical system are provided. One system includes first detector(s) configured to detect light having one or more wavelengths shorter than 190 nm emitted from a light source at one or more first angles mutually exclusive of one or more second angles at which the light is collected from the light source by an optical system for illumination of a specimen and to generate first output responsive to the light detected by the first detector(s). In addition, the system includes a control subsystem configured for determining one or more characteristics of the light at one or more planes in the optical system based on the first output.

Measuring device for measuring the reflection properties of a sample in the extreme ultraviolet spectral range

Die Erfindung betrifft eine Messvorrichtung (1) zur Messung von Reflexionseigenschaften einer Probe (2) für elektromagnetische Strahlung bei verschiedenen Wellenlängen im extremen ultravioletten Spektralbereich mit:- einer Strahlenquelle (3) zur Bereitstellung elektromagnetischer Strahlung im extremen ultravioletten Spektralbereich,- einem Monochromator (4) zum Einstellen der Wellenlänge eines auf die Probe (2) gerichteten Messstrahls (5), wobei der Monochromator ein im Strahlengang des Messtrahls (5) angeordnetes erstes Reflexionselement (12), ein im Strahlengang des Messtrahls (5) angeordnetes zweites Reflexionselement (13), einen im Strahlengang nach dem zweiten Reflexionselement (13) angeordneten ersten Austrittsspalt (14) und ein im Strahlengang nach dem ersten Austrittsspalt (14) angeordnetes drittes Reflexionselement (15) aufweist, wobei das erste Reflexionselement (12) dazu ausgebildet ist, den Messstrahl (5) im Bereich des ersten Austrittsspalts (14) oder im ersten Austrittsspalt (14) in einer ersten Richtung zu fokussieren, und wobei das zweite Reflexionselement (13) dazu ausgebildet ist, den Messstrahl (5) im Bereich des ersten Austrittsspalts (14) oder im ersten Austrittsspalt (14) in einer zur ersten Richtung senkrechten zweiten Richtung zu fokussieren, und wobei das zweite Reflexionselement (13) ein konkaves Gitter (16) ist, sowie- einem Detektor (7) zum Erfassen von an der Probe (2) reflektierter Strahlung (8). The invention relates to a measuring device (1) for measuring the reflection properties of a sample (2) for electromagnetic radiation at different wavelengths in the extreme ultraviolet spectral range, having: - a radiation source (3) for providing electromagnetic radiation in the extreme ultraviolet spectral range, - a monochromator (4) for setting the wavelength of a measuring beam (5) directed onto the sample (2), the monochromator having a first reflection element (12) arranged in the beam path of the measuring beam (5), a second reflection ...

A kind of organic nitrogen-organic carbon tandem online test method and device

本发明属于水质分析领域，具体涉及一种有机氮‑有机碳串联式在线检测方法与装置。检测装置与体积排阻色谱系统联用，检测装置包括脱碳氧化系统、有机氮检测系统、有机碳检测系统和电子控制系统；脱碳氧化系统后侧连接有机氮和有机碳检测系统，各系统之间可拆分连接，有机氮和有机碳检测系统的前后顺序可调，当脱碳氧化系统依次连接有机碳检测系统、有机氮检测系统时，增大有机氮检测系统管路直内径或缩短管路长度，以减小对有机碳检测系统的压力。本发明的检测装置，通过将有机氮和有机碳检测系统串联，使得有机碳和有机氮的检测延迟时间小于8秒，只需要一套氧化系统，无需调整分路之间的管径和长度来调节分流比，提高了长期监测的准确度。

Device for uv-spectrometric analysis of gaseous compounds

Изобретение относится к УФ-спектрометрическому анализу газообразных соединений. Устройство (20) содержит измерительный канал (5) для того, чтобы вмещать поток пробного газа, окно (16), прозрачное для ультрафиолетового излучения и расположенное на первом конце (5a) измерительного канала (5), источник (11) излучения, генерирующий ультрафиолетовое излучение, который скомпонован для того, чтобы испускать излучение через окно (16) внутрь измерительного канала (5), и спектрограф (3) для измерения ультрафиолетового излучения на втором, противоположном конце (5b) измерительного канала (5). Спектрограф (3) снабжен отверстием (12), причем второй конец (5b) измерительного канала (5) открыт в направлении спектрографа (3) так, что внутренняя часть спектрографа (3) и измерительный канал (5) соединяются через указанное отверстие (12). Спектрограф (3) заполняют защитным газом, который может течь через указанное отверстие (12) и внутрь измерительного канала (5). Изобретение обеспечивает упрощение компоновки выходного окна. 17 з.п. ф-лы, 2 ил. РОССИЙСКАЯ ФЕДЕРАЦИЯ (19) RU (11) (51) МПК G01N 21/33 (13) 2 558 014 C2 (2006.01) ФЕДЕРАЛЬНАЯ СЛУЖБА ПО ИНТЕЛЛЕКТУАЛЬНОЙ СОБСТВЕННОСТИ (12) ОПИСАНИЕ (21)(22) Заявка: ИЗОБРЕТЕНИЯ К ПАТЕНТУ 2012155864/28, 16.03.2011 (24) Дата начала отсчета срока действия патента: 16.03.2011 (72) Автор(ы): ВОЗКА Станислав (CZ), ПОДОЛАК Мирослав (CZ) (73) Патентообладатель(и): ЛАБИО А.С. (CZ) Приоритет(ы): (30) Конвенционный приоритет: (43) Дата публикации заявки: 27.06.2014 Бюл. № 18 R U 24.05.2010 CZ PV2010-398 (45) Опубликовано: 27.07.2015 Бюл. № 21 (85) Дата начала рассмотрения заявки PCT на национальной фазе: 24.12.2012 2 5 5 8 0 1 4 (56) Список документов, цитированных в отчете о поиске: US 6305213 B1, 23.10.2001. US 5225681 A, 06.07.1993. WO 84/04392 A1, 08.11.1984. RU 2299422 C1, 20.05.2007. JP 2005241249 A, 08.09.2005. JP 2008196882 A, 28.08.2008. RU 2112960 C1, 10.06.1998. EP 2011/053990 (16.03.2011) C 2 C 2 (86) Заявка PCT: (87) Публикация заявки PCT: R ...

Vacuum ultraviolet referencing reflectometer

제공된 분광학 시스템(500) 진공자외선 스펙트럼에서 동작한다. 보다 상세하게, 진공자외선 스펙트럼에서 반사율 측정법 기술들을 이용하는 시스템은 계측 응용물들을 위하여 준비된다. 정확하고 반복 가능한 측정을 보장하도록, 광학 경로(506,508)들의 환경은 광학 경로에서 존재할 수도 있는 가스들의 흡수 영향들을 제한하도록 제어된다. 여전히 발생할 수도 있는 흡수 영향을 설명하도록, 광 경로의 길이는 최소화된다. 흡수 영향을 추가적으로 설명하도록, 반사율 데이터가 상대 표준으로 참조된다. The provided spectroscopy system 500 operates in the vacuum ultraviolet spectrum. More specifically, a system using reflectometry techniques in the vacuum ultraviolet spectrum is prepared for metrology applications. To ensure accurate and repeatable measurements, the environment of the optical paths 506 and 508 is controlled to limit the absorption effects of gases that may be present in the optical path. To account for the absorption effects that may still occur, the length of the light path is minimized. To further explain the absorption effect, the reflectance data is referred to as a relative standard. 반도체, 진공자외선, 심자외선, 반사율계, Semiconductor, vacuum ultraviolet ray, deep ultraviolet ray, reflectometer,

Combined gas chromatography vacuum ultra-violet detector with mass spectrometer or ION mobility spectrometer

Gaseous analyte material is separated according to retention time using a chromatographic or other separation device (e.g. gas chromatograph 2). Ultra-violet (UV) spectra of a portion of the separated material are obtained using a UV spectrometer or detector (e.g. flow-cell vacuum UV absorption detector 4-7). Mass or ion mobility spectra of an ionized portion of the separated material are obtained using mass or ion mobility spectrometer 10, perhaps downstream of the UV spectrometer or detector. Multi-dimensional UV and mass / ion mobility data sets arranged according to retention time may be obtained. Mass or ion mobility spectra may be extracted at retention times corresponding to UV signals at wavelengths of interest. UV spectra may be extracted at retention times corresponding to mass, mass/charge ratio, or ion mobility values of interest. Mass / ion mobility data may help deconvolute UV data. Compounds having characteristic UV signatures may be added to the analyte prior to UV measurements.

Device for uv-spectrometric analysis of gaseous compounds

The invention concerns a device (20) for UV-spectrometric analysis of gaseous compounds, said device (20) comprising: a measurement channel (5) intended to accommodate a flow of sample gas to be analyzed, a window member (16) transparent for ultraviolet radiation arranged at a first end (5a) of the measurement channel (5), a radiation source (11) capable of generating ultraviolet radiation arranged to emit radiation through the window member (16) and into the measurement channel (5), and a spectrographic member (3) for measuring of ultraviolet radiation emitted by the radiation source (11) arranged at a second, opposite, end (5b) of the measurement channel (5), wherein the device (20) is arranged such that ultraviolet radiation entering the measurement channel (5) at the first end (5a) can propagate through the measurement channel (5), interact with the accommodated gas and be measured by the spectrographic member (3) at the second end (5b) of the measurement channel (5). The invention is characterized in that the first end (5a) of the measurement channel (5) is open towards the window member (16) and in that a channel (6, 18) for guiding a protection gas is arranged in connection to the window member (16) such that protection gas fed through the protection gas channel (6, 18) is allowed to flow over and cover the side of the window member (16) facing the measurement channel (5) and to flow further into the measurement channel (5).

Method for evaluating scattering images of objects generated by narrowband, short-wave coherent laser radiation, particularly for usage in xuv microscopy

The problem addressed by the invention is that of being able to evaluate and unambiguously assess microscopic scattering images resulting from narrowband, short-wave coherent laser radiation, detected with high resolution, using the minimum time and expense possible at high throughputs. The intention is to create a fast and informative microscopic examination option that can be easily handled, particularly for medical purposes such as routine and preventive clinical examinations. According to the invention, the microscopy scattering image resulting from the object, which image is detected in a spatially resolved manner, is compared, without the necessity for reconstruction of the object, to reference data and the radiation characteristic is classifiably evaluated on the basis thereof.

Vacuum ultraviolet absorption spectroscopy method

An efficient absorption spectroscopy system (100) is provided for detecting the presence of trace concentrations of gaseous species. In particular, a method of obtaining data regarding a gas analyte, comprising: providing the analyte from a gas chromatography column (130); providing the analyte to a gas flow cell (104); passing VUV wavelengths or less of light from a VUV source (110) through the gas flow cell (104); detecting absorption of the VUV wavelengths or less of light by the analyte through the use of a spectrometer (106, 154, 156) optically coupled to an optical output (142) of the gas flow cell (104); obtaining a three dimensional data set indicative of an amount of absorption of the analyte as a function of wavelength and time; and analyzing the three dimensional data set to determine an identity and quantity of the analyte.

Device for uv-spectrometric analysis of gaseous compounds

The invention concerns a device (20) for UV-spectrometric analysis of gaseous Compounds, comprising: a measurement Channel (5) to accommodate a flow of sample gas, a window (16) transparent for ultraviolet radiation arranged at a first end (5a) of the measurement Channel (5), a radiation source (11) generating ultraviolet radiation arranged to emit radiation through the window (16) into the measurement Channel (5), and a spectrograph (3) for measuring ultraviolet radiation at a second, opposite, end (5b) of the measurement Channel (5). The invention is characterized in that the spectrograph (3) is provided with an opening (12) wherein the second end (5b) of the measurement Channel (5) is open towards the spectrograph (3) such that an inside of the spectrograph (3) and the measurement Channel (5) are in communication via said opening (12). The spectrograph (3) is filled with a protection gas which is allowed to flow through said opening (12) and into the measurement Channel (5).

Apparatus and method for measuring phase of extreme ultraviolet (EUV) mask and method of fabricating EUV mask including the method

An apparatus and a method for correctly measuring a phase of an extreme ultraviolet (EUV) mask and a method of fabricating an EUV mask including the method are described. The apparatus for measuring the phase of the EUV mask includes an EUV light source configured to generate and output EUV light, at least one mirror configured to reflect the EUV light as reflected EUV light incident on an EUV mask to be measured, a mask stage on which the EUV mask is arranged, a detector configured to receive the EUV light reflected from the EUV mask, to obtain a two-dimensional (2D) image, and to measure reflectivity and diffraction efficiency of the EUV mask, and a processor configured to determine a phase of the EUV mask by using the reflectivity and diffraction efficiency of the EUV mask.

DEVICE FOR UV SPECTROMETRIC ANALYSIS OF GAS COMPOUNDS

1. Устройство (20) для УФ-спектрометрического анализа газообразных соединений, причем указанное устройство (20) содержит:- измерительный канал (5), предназначенный для того, чтобы вмещать поток пробного газа, подлежащего анализу,- оконный элемент (16), прозрачный для ультрафиолетового излучения, который размещен на первом конце (5a) измерительного канала (5),- источник (11) излучения, способный генерировать ультрафиолетовое излучение, который скомпонован для того, чтобы испускать излучение через оконный элемент (16) и внутрь измерительного канала (5),- спектрографический элемент (3) для измерения ультрафиолетового излучения, испускаемого источником (11) излучения, размещенный на втором, противоположном конце (5b) измерительного канала (5),при этом устройство (20) скомпоновано так, что ультрафиолетовое излучение, входящее в измерительный канал (5) на первом конце (5a), может распространяться через измерительный канал (5), взаимодействовать с размещенным газом и подвергаться измерению спектрографическим элементом (3) на втором конце (5b) измерительного канала (5),отличающееся тем, чтоспектрографический элемент (3) снабжен отверстием (12), через которое ультрафиолетовое излучение проходит внутрь спектрографического элемента (3) во время работы устройства (20), при этом второй конец (5b) измерительного канала (5) открыт в направлении спектрографического элемента (3) так, что внутренняя часть спектрографического элемента (3) и измерительный канал (5) соединяются через указанное отверстие (12), причем спектрографический элемент (3) скомпонован для заполнения защитным газом, и устройство (20) скомпоновано так, что защитный газ, подаваемый в спектрогра РОССИЙСКАЯ ФЕДЕРАЦИЯ (19) RU (11) (13) 2012 155 864 A (51) МПК G01N 21/15 (2006.01) ФЕДЕРАЛЬНАЯ СЛУЖБА ПО ИНТЕЛЛЕКТУАЛЬНОЙ СОБСТВЕННОСТИ (12) ЗАЯВКА НА ИЗОБРЕТЕНИЕ (21)(22) Заявка: 2012155864/28, 16.03.2011 (71) Заявитель(и): ЛАБИО А.С. (CZ) Приоритет(ы): (30) Конвенционный приоритет: 24.05.2010 CZ PV2010-398 (85) Дата начала ...

Infrared spectroscopic reflectometer for measuring high aspect ratio structures

在本文中呈现用于在红外波长下执行半导体结构的光谱反射测量的方法及系统。在一些实施例中，采用横跨从750纳米到2,600纳米或更大的范围的测量波长。在一个方面中，在倾斜角下执行反射测量以降低背侧反射对测量结果的影响。在另一方面中，由包含具有不同敏感度特性的多个光敏区的检测器检测宽广红外波长范围。根据波长跨越所述检测器的表面线性地分散所收集光。每一不同光敏区布置于所述检测器上以感测不同入射波长范围。以此方式，由单个检测器以高信噪比检测宽广波长范围。

Vacuum ultraviolet referencing reflectometer

A spectroscopy system (500) is provided which operates in the vacuum ultra-violet spectrum. More particularly, a system utilizing reflectometry techniques in the vacuum ultraviolet spectrum is provided for use in metrology applications. To ensure accurate and repeatable measurement, the environment of the optical paths (506, 508) is controlled to limit absorption effects of gases that may be present in the optical path. To account for absorption effects that may still occur, the length of the optical path is minimized. To further account for absorption effects, the reflectance data may be referenced to a relative standard.

Broad band referencing reflectometer

A spectroscopy system is provided which is optimized for operation in the VUV region and capable of performing well in the DUV-NIR region. Additionally, the system incorporates an optical module which presents selectable sources and detectors optimized for use in the VUV and DUV-NIR. As well, the optical module provides common delivery and collection optics to enable measurements in both spectral regions to be collected using similar spot properties. The module also provides a means of quickly referencing measured data so as to ensure that highly repeatable results are achieved. The module further provides a controlled environment between the VUV source, sample chamber and VUV detector which acts to limit in a repeatable manner the absorption of VUV photons. The use of broad band data sets which encompass VUV wavelengths, in addition to the DUV-NIR wavelengths enables a greater variety of materials to be meaningfully characterized. Array based detection instrumentation may be exploited to permit the simultaneous collection of larger wavelength regions.

Device and method for element analysis of materials

Vorrichtung zur Elementanalyse von Materialien mittels optischer Emissionsspektroskopie, insbesondere mittels laserinduzierter Plasmaspektroskopie, umfassend:Mittel zur Anregung eines Plasmas von einer Teilmenge eines Messobjekts aus dem zu analysierenden Material;Mittel zum Erfassen und spektralen Auswerten von von dem Plasma ausgehender optischer Strahlung; undStrahlführungsmittel zum Führen zumindest eines Teils der von dem Plasma ausgehenden optischen Strahlung zu den Mitteln zum Erfassen und spektralen Auswerten; dadurch gekennzeichnet, dass die Vorrichtung außerdem Mittel zum Spülen zumindest eines Teilbereichs der Vorrichtung mit einem Schutzgas aufweist und es sich bei den Strahlführungsmitteln zumindest um ein Kapillarrohr handelt, das außerdem zur Führung des Schutzgases dient; wobei mindestens ein Kapillarrohr so angeordnet ist, dass unter einem flachen Winkel von dem Plasma ausgehende optische Strahlung erfasst wird.

Apparatus and method for measuring phase of EUV mask and method for manufacturing mask

本公开提供了用于测量极紫外(EUV)掩模的相位的装置和方法及制造掩模的方法。用于测量EUV掩模的相位的装置包括：EUV光源，配置为产生并输出EUV光；至少一个反射镜，配置为反射EUV光作为入射在要测量的EUV掩模上的被反射的EUV光；掩模台，EUV掩模布置在该掩模台上；检测器，配置为接收从EUV掩模反射的EUV光，以获得二维(2D)图像，并测量EUV掩模的反射率和衍射效率；以及处理器，配置为通过使用EUV掩模的反射率和衍射效率来确定EUV掩模的相位。

Optical method and system utilizing operating with deep or vacuum UV spectra

An apparatus and method are presented for use in optical processing of an article. The apparatus comprises: one or more optical windows for directing predetermined electromagnetic radiation therethrough to illuminate a region of interest and collecting radiation returned from the illuminated region; and two or more ports operable for inputting or discharging one or more gases from the vicinity of the region of interest on the article being processed to create in the vicinity of said region a substantially static state of environment, non-absorbable for said electromagnetic radiation, thereby reducing amount of ambient gas in the vicinity of said region of interest and enabling optical processing of the article while maintaining it in the ambient gas environment.

The particle beams excites vacuum ultraviolet-visible light wave range magneto-optic spectrum test method and system

本发明提供了一种粒子束激发真空紫外‑可见光波段磁光谱测试方法及系统，让带电的离子束通过与电子束中和而形成中性粒子束(原子束)，这种粒子束可以不受磁场影响而对样品进行激发，利用原子核能跃迁能引起的电磁辐射反映物质内部的超精细结构，并通过单色仪等装置对光信号进行后续处理和控制，探测粒子轰击过程产生的不同频段的电磁辐射，包括红外‑可见光‑紫外‑真空紫外，从而揭示不同层次的物质结构，为新材料的研发、生产和应用提供电子结构依据。

Mid-infrared spectroscopy for measurement of high aspect ratio structures

本文提出用于以中红外波长执行半导体结构的高吞吐量光谱测量的方法及系统。傅里叶变换红外(FTIR)光谱仪包含一或多个跨越2.5微米与12微米之间的波长范围的测量通道。所述FTIR光谱仪以多个不同的入射角、方位角、不同的波长范围、不同的偏振状态或其任何组合测量目标。在一些实施例中，照明光由激光维持等离子体(LSP)光源提供以实现高亮度及小照明点大小。在一些实施例中，从与晶片的表面法向的方向离轴执行FTIR测量。在一些实施例中，斯特林冷却器从FTIR光谱仪的检测器中提取热量。另一方面，由一或多个光谱仪测量通道执行的测量与由中红外FTIR光谱仪通道执行的测量相结合以表征高深宽比结构。

Device for tomographic measurement of gas distribution on a test bench

Optical method and system utilizing operating with deep or vacuum UV spectra

Apparatus and method for measuring phase of extreme ultraviolet (euv) mask and method of fabricating euv mask including the method

An apparatus and a method for correctly measuring a phase of an extreme ultraviolet (EUV) mask and a method of fabricating an EUV mask including the method are described. The apparatus for measuring the phase of the EUV mask includes an EUV light source configured to generate and output EUV light, at least one mirror configured to reflect the EUV light as reflected EUV light incident on an EUV mask to be measured, a mask stage on which the EUV mask is arranged, a detector configured to receive the EUV light reflected from the EUV mask, to obtain a two-dimensional (2D) image, and to measure reflectivity and diffraction efficiency of the EUV mask, and a processor configured to determine a phase of the EUV mask by using the reflectivity and diffraction efficiency of the EUV mask.

Extreme ultraviolet radiation in genomic sequencing and other applications

Methods, apparatus, and processes which use Extreme ultraviolet radiation (EUV) and/or soft X-ray wavelengths to read, image, edit, locate, identify, map, alter, delete, repair and sequence genes are described. An EUV scanning tool which allows high throughput genomic scanning of DNA, RNA and protein sequences is also described. A database which records characteristic absorption spectra of gene sequences is also described.

Vacuum ultraviolet reflectometer having collimated beam

A spectroscopy system is provided which is optimized for operation in the VUV region and capable of performing well in the DUV-NIR region. The system further provides a controlled environment between the VUV source, sample chamber and VUV detector which acts to limit in a repeatable manner the absorption of VUV photons. The light source is utilized to create a light beam that travels through at least a portion of the environmentally controlled chambers. The light beam may be a collimated light beam at locations where the light beam passes between at least two of the environmentally controlled chambers. A coupling mechanism may be provided that optically couples at least two the environmentally controlled chambers. Collimated light may be provided through the coupling mechanism. Array based detection instrumentation may be exploited to permit the simultaneous collection of larger wavelength regions.

Vacuum ultraviolet reflectometer integrated with processing system

A spectroscopy system is provided which is optimized for operation in the VUV region and capable of performing well in the DUV-NIR region. Additionally, the system incorporates an optical module which presents selectable sources and detectors optimized for use in the VUV and DUV-NIR. As well, the optical module provides common delivery and collection optics to enable measurements in both spectral regions to be collected using similar spot properties. The module also provides a means of quickly referencing measured data so as to ensure that highly repeatable results are achieved. The module further provides a controlled environment between the VUV source, sample chamber and VUV detector which acts to limit in a repeatable manner the absorption of VUV photons. The use of broad band data sets which encompass VUV wavelengths, in addition to the DUV-NIR wavelengths enables a greater variety of materials to be meaningfully characterized. Array based detection instrumentation may be exploited to permit the simultaneous collection of larger wavelength regions.

Integration of an Optical Height Sensor in Mask Inspection Tools

A photomask-inspection system includes a vacuum chamber and a stage, disposed in the vacuum chamber, to support a photomask and to translate the photomask horizontally and vertically. The system also includes an EUV objective, disposed in the vacuum chamber, to collect EUV light from the photomask to inspect the photomask for defects and an optical height sensor, at least partially disposed in the vacuum chamber, to measure heights on a surface of the photomask. The system further includes a stage controller to translate the stage horizontally and vertically in accordance with a focal map for the photomask produced using the measured heights on the surface of the photomask.

Method and apparatus for long term accurate measurement of ammonia gas concentration in a permanent ammonia gas environment

A method and apparatus are described for measuring the concentration of a gas with an absorption band in the ultraviolet range. The device includes an absorption chamber containing a gas, a light source, a selected optical bandpass filter, and ultraviolet photodetectors. The gas concentration is measured by the ratio of a transmitted intensity to an incident intensity with the Beer-Lambert Law relation. A second light source may be used for a compensation signal. A second method periodically changes the absorption coefficient by inserting a transparent material in the absorption path to measure the optical compensation signal. A third method periodically shortens the optical absorption path by moving the active detector closer to the light source to measure the optical compensation signal. The fourth method uses an optical element to deflect the optical beam to create a shorter absorption path as a reference for the incident signal using one detector.

DEVICE FOR SPECTROSCOPIC ANALYSIS

Modulus-enforced probe

Apparatus and methods for forming an image of an object which involves focusing partially to fully spatially-coherent radiation onto a sample and collecting the resulting scattered radiation (the "standard data set") on an array detector. In addition to the standard dataset, an additional measurement or plurality of measurements is made of a relatively-unscattered beam, using the array detector, which comprises the "modulus enforced probe (MEP) dataset". This MEP dataset serves as an extra constraint, called the MEP constraint, in the phase retrieval algorithm used to reconstruct the image of the object.

マスク検査ツールにおける光学式高さセンサの統合

フォトマスク検査システムであって、真空チャンバと、フォトマスクを支持すべく且つそのフォトマスクを水平及び垂直に並進させるべくその真空チャンバ内に配設されたステージとを有する。そのシステムがまた、そのフォトマスクからＥＵＶ光を集めて欠陥に関しそのフォトマスクを検査するためその真空チャンバ内に配設されたＥＵＶ対物系と、そのフォトマスクの表面上の高さを計測すべくその真空チャンバ内に少なくとも部分的に配設された光学式高さセンサとを有する。そのシステムが更に、そのフォトマスクの表面上でのその計測高さを用い作成されておりそのフォトマスクに係るフォーカルマップに従いそのステージを水平及び垂直に並進させるステージコントローラを、有する。

一种有机氮-有机碳串联式在线检测方法与装置

本发明属于水质分析领域，具体涉及一种有机氮‑有机碳串联式在线检测方法与装置。检测装置与体积排阻色谱系统联用，检测装置包括脱碳氧化系统、有机氮检测系统、有机碳检测系统和电子控制系统；脱碳氧化系统后侧连接有机氮和有机碳检测系统，各系统之间可拆分连接，有机氮和有机碳检测系统的前后顺序可调，当脱碳氧化系统依次连接有机碳检测系统、有机氮检测系统时，增大有机氮检测系统管路直内径或缩短管路长度，以减小对有机碳检测系统的压力。本发明的检测装置，通过将有机氮和有机碳检测系统串联，使得有机碳和有机氮的检测延迟时间小于8秒，只需要一套氧化系统，无需调整分路之间的管径和长度来调节分流比，提高了长期监测的准确度。

判定在光學系統中的光之一或多個特性

本發明提供用於判定一光學系統中的光之一或多個特性之方法及系統。一種系統包含(若干)第一偵測器，其經組態以一或多個第一角度偵測自一光源發射之具有短於190 nm之一或多個波長之光且回應於由該(等)第一偵測器偵測之該光而產生第一輸出，該一或多個第一角度與由一光學系統自該光源收集該光用於照射一樣本之一或多個第二角度互不相交。另外，該系統包含一控制子系統，其經組態以基於該第一輸出來判定該光學系統中一或多個平面處之該光之一或多個特性。

光学システム内の光の１つ又は複数の特性の決定

Improvements in optical emission spectrometry

A method for controlling the flow of gas through a spectrometer, comprising: flowing a gas through a volume of the spectrometer, the volume being a volume through which light from a sample passes along a first path to reach a first detector and the gas being transparent to the light in a spectral region analysed by the spectrometer; transmitting light from a light source along a second path through the gas to a second detector; detecting an intensity of the light from the light source at the second detector at one or more wavelengths of the light; comparing the detected intensity of the light to a respective setpoint corresponding to a desired transmittance of the gas in the volume of the spectrometer and generating at least one error signal based on the comparison; and adjusting a flow rate of the gas through the volume of the spectrometer based on the error signal, in particular to minimise the difference between the detected intensity and setpoint.

Determining one or more characteristics of light in an optical system

Methods and systems for determining one or more characteristics of light in an optical system are provided. One system includes first detector(s) configured to detect light having one or more wavelengths shorter than 190 nm emitted from a light source at one or more first angles mutually exclusive of one or more second angles at which the light is collected from the light source by an optical system for illumination of a specimen and to generate first output responsive to the light detected by the first detector(s). In addition, the system includes a control subsystem configured for determining one or more characteristics of the light at one or more planes in the optical system based on the first output.

蒸气作为光学系统中的保护剂及生命延长剂

环绕光学组件的外壳可与蒸气源连接。所述蒸气源可以从500ppm到15000ppm的蒸气水平将蒸气提供到所述外壳。所述外壳中的蒸气浓度可增加所述外壳中的所述光学组件的寿命。

高アスペクト比構造の測定のための中赤外分光法及びシステム

【課題】中赤外波長における半導体構造の高スループット分光測定を実行する方法およびシステムを提供する。【解決手段】フーリエ変換赤外（ＦＴＩＲ）分光計は、２．５マイクロメートルから１２マイクロメートルの波長範囲に及ぶ１つ以上の測定チャネルを含む。ＦＴＩＲ分光計は、複数の異なる入射角、方位角、異なる波長範囲、異なる偏光状態、またはこれらの任意の組み合わせで対象を測定する。高い輝度および小さい照明スポットサイズを達成するために、照明光がレーザ維持プラズマ（ＬＳＰ）光源によって提供される。ＦＴＩＲ測定は、ウェハの表面に垂直な方向から軸外で実行される。スターリング冷却器がＦＴＩＲ分光計の検出器から熱を取り出す。１つ以上の分光計測定チャネルによって実行される測定が、中赤外ＦＴＩＲ分光計チャネルによって実行される測定と組み合わせられる。【選択図】図６

Complex spatially-resolved reflectometry/refractometry

Apparatus and methods for complex imaging reflectometry and refractometry using at least partially coherent light. Quantitative images yield spatially-dependent, local material information about a sample of interest. These images may provide material properties such as chemical composition, the thickness of chemical layers, dopant concentrations, mixing between layers of a sample, reactions at interfaces, etc. An incident beam of VUV wavelength or shorter is scattered off of a sample and imaged at various angles, wavelengths, and/or polarizations. The power of beam is also measured. This data is used to obtain images of a sample's absolute, spatially varying, complex reflectance or transmittance, which is then used to determine spatially-resolved, depth-dependent sample material properties.

Testing method for residual organic compounds in a liquid sample

A method and system (10) for testing a liquid sample (12) for an organic compound is disclosed, the method including the steps of collecting the liquid sample (12) from a liquid source; transmitting light having a wavelength of between about (190) nanometers and about (310) nanometers into the liquid sample (12); measuring absorption/transmission of the light by the organic compound in the liquid sample (12); and determining a concentration of the organic compound within the liquid sample (12) based on the absorption/transmission of the light by the organic compound. The system (10) can include a spectrophotometer (18) for measuring the absorption of UV light by the organic compound, an ion exchange column (16) for removing ion contaminants from the liquid sample (12), and a vacuum degasser unit (21) for removing gases and other impurities from the liquid sample (12).

蒸氣作為光學系統中之保護劑及生命延長劑

環繞光學組件之一外殼可與一蒸氣源連接。該蒸氣源可以自500 ppm至15000 ppm之一蒸氣位準將一蒸氣提供至該外殼。該外殼中之蒸氣濃度可增加該外殼中之該光學組件之壽命。

Modulus-enforced probe

Apparatus and methods for forming an image of an object which involves focusing partially to fully spatially-coherent radiation onto a sample and collecting the resulting scattered radiation (the "standard data set") on an array detector. In addition to the standard dataset, an additional measurement or plurality of measurements is made of a relatively-unscattered beam, using the array detector, which comprises the "modulus enforced probe (MEP) dataset". This MEP dataset serves as an extra constraint, called the MEP constraint, in the phase retrieval algorithm used to reconstruct the image of the object.

Complex spatially-resolved reflectometry/refractometry

Apparatus and methods for complex imaging reflectometry and refractometry using at least partially coherent light (121). Quantitative images yield spatially-dependent, local material information about a sample (128, 228) of interest. These images may provide material properties such as chemical composition, the thickness of chemical layers, dopant concentrations, mixing between layers of a sample, reactions at interfaces, etc. An incident beam (123) of VUV wavelength or shorter is scattered off of a sample (128, 228) and imaged at various angles, wavelengths, and/or polarizations. The power of beam (123) is also measured. This data is used to obtain images of a sample's absolute, spatially varying, complex reflectance or transmittance, which is then used to determine spatially-resolved, depth-dependent sample material properties.

Multidimensional nanotomography with high harmonics and attosecond pulses

A system and method for performing four dimensional multicolor nanotomography with high harmonics and attosecond pulses to attain spectrally resolved absorption data about the three-dimensional volumetric structure of a sample are disclosed. Also disclosed are embodiments of the system and method that have been adapted to perform four dimensional multicolor nanotomography absorption and index of refraction data about the three- dimensional volumetric structure of a sample, to perform five dimensional multicolor nanotomography with high harmonics and attosecond pulses to obtain spectrally resolved absorption data about the three-dimensional volumetric structure and temporal dynamics of the sample, to perform five dimensional multicolor nanotomography to obtain spectrally resolved absorption and index of refraction data about the three-dimensional volumetric structure and temporal dynamics of the sample, and to perform Fourier-domain Optical Coherence Tomography.

Apparatus and method for measuring phase of extreme ultraviolet (EUV) mask and method of fabricating EUV mask including the method

An apparatus and a method for correctly measuring a phase of an extreme ultraviolet (EUV) mask and a method of fabricating an EUV mask including the method are described. The apparatus for measuring the phase of the EUV mask includes an EUV light source configured to generate and output EUV light, at least one mirror configured to reflect the EUV light as reflected EUV light incident on an EUV mask to be measured, a mask stage on which the EUV mask is arranged, a detector configured to receive the EUV light reflected from the EUV mask, to obtain a two-dimensional (2D) image, and to measure reflectivity and diffraction efficiency of the EUV mask, and a processor configured to determine a phase of the EUV mask by using the reflectivity and diffraction efficiency of the EUV mask.

长期精确测量永久氨气环境中氨气浓度的方法和装置

描述了一种用于测量吸收波段在紫外范围内的气体浓度的方法和装置。该设备包括含有气体的吸收室、光源、选定的光学带通滤波器和紫外光检测器。气体浓度是通过比尔‑朗伯定律关系，由透射强度与入射强度的比来测量的。第二光源可以用于补偿信号。第二种方法通过在吸收路径中插入透明材料以测量光学补偿信号来周期性地改变吸收系数。第三种方法通过将有源检测器移近光源以测量光学补偿信号来周期性地缩短光吸收路径。第四种方法使用光学元件来偏转光束，以使用一个检测器产生较短的吸收路径作为入射信号的参考。

Method and apparatus for long term accurate measurement of ammonia gas concentration in a permanent ammonia gas environment

A method and apparatus are described for measuring the concentration of a gas with an absorption band in the ultraviolet range. The device includes an absorption chamber containing a gas, a light source, a selected optical bandpass filter, and ultraviolet photodetectors. The gas concentration is measured by the ratio of a transmitted intensity to an incident intensity with the Beer-Lambert Law relation. A second light source may be used for a compensation signal. A second method periodically changes the absorption coefficient by inserting a transparent material in the absorption path to measure the optical compensation signal. A third method periodically shortens the optical absorption path by moving the active detector closer to the light source to measure the optical compensation signal. The fourth method uses an optical element to deflect the optical beam to create a shorter absorption path as a reference for the incident signal using one detector.

Extreme ultraviolet radiation in genomic sequencing and other applications

Methods, apparatus, and processes which use Extreme ultraviolet radiation (EUV) and/or soft X-ray wavelengths to read, image, edit, locate, identify, map, alter, delete, repair and sequence genes are described. An EUV scanning tool which allows high throughput genomic scanning of DNA, RNA and protein sequences is also described. A database which records characteristic absorption spectra of gene sequences is also described.

判定在光學系統中的光之一或多個特性

本發明提供用於判定一光學系統中的光之一或多個特性之方法及系統。一種系統包含(若干)第一偵測器，其經組態以一或多個第一角度偵測自一光源發射之具有短於190 nm之一或多個波長之光且回應於由該(等)第一偵測器偵測之該光而產生第一輸出，該一或多個第一角度與由一光學系統自該光源收集該光用於照射一樣本之一或多個第二角度互不相交。另外，該系統包含一控制子系統，其經組態以基於該第一輸出來判定該光學系統中一或多個平面處之該光之一或多個特性。

Spectroscopic measurement device

A spectroscopic measurement apparatus includes a pulsed laser light source that emits pulsed laser light, a beam splitter that splits the pulsed laser light into pump light and probe light, a delay circuit that changes a delay time of the pump light with respect to the probe light, a chopper that intensity-modulates the pump light, a wavelength converter that wavelength-converts the probe light into vacuum ultraviolet light, an optical system that guides the pump light and the wavelength-converted probe light to a sample, and a detector that detects the probe light reflected by the sample.

마스크 검사 도구 내의 광학 높이 센서의 통합

포토마스크 검사 시스템은 진공 챔버, 및 포토마스크를 지지하고 포토마스크를 수평 및 수직으로 병진시키기 위해 진공 챔버에 배치된 스테이지를 포함한다. 본 시스템은 또한, 포토마스크로부터 EUV 광을 수집하여 결함에 대해 포토마스크를 검사하기 위해 진공 챔버에 배치된 EUV 대물 렌즈, 및 포토마스크의 표면 상의 높이를 측정하기 위해 진공 챔버에 적어도 부분적으로 배치된 광학 높이 센서를 포함한다. 본 시스템은, 포토마스크의 표면 상의 측정된 높이를 사용하여 생성된 포토마스크에 대한 초점 맵에 따라 스테이지를 수평 및 수직으로 병진시키기 위한 스테이지 제어기를 더 포함한다.

Integration of an optical height sensor in mask inspection tools

A photomask-inspection system includes a vacuum chamber and a stage, disposed in the vacuum chamber, to support a photomask and to translate the photomask horizontally and vertically. The system also includes an EUV objective, disposed in the vacuum chamber, to collect EUV light from the photomask to inspect the photomask for defects and an optical height sensor, at least partially disposed in the vacuum chamber, to measure heights on a surface of the photomask. The system further includes a stage controller to translate the stage horizontally and vertically in accordance with a focal map for the photomask produced using the measured heights on the surface of the photomask.

Integration of an optical height sensor in mask inspection tools

Integration of an optical height sensor in mask inspection tools

A photomask-inspection system includes a vacuum chamber and a stage, disposed in the vacuum chamber, to support a photomask and to translate the photomask horizontally and vertically. The system also includes an EUV objective, disposed in the vacuum chamber, to collect EUV light from the photomask to inspect the photomask for defects and an optical height sensor, at least partially disposed in the vacuum chamber, to measure heights on a surface of the photomask. The system further includes a stage controller to translate the stage horizontally and vertically in accordance with a focal map for the photomask produced using the measured heights on the surface of the photomask.

在遮罩檢測工具中之光學高度感測器之整合

一種光罩檢測系統包含一真空室及一載物台，該載物台經安置於該真空室中以支撐一光罩且水平及垂直地平移該光罩。該系統亦包含：一EUV物鏡，其經安置於該真空室中以收集來自該光罩之EUV光以檢測該光罩之缺陷；及一光學高度感測器，其至少部分安置於該真空室中以量測該光罩之一表面上之高度。該系統進一步包含一載物台控制器以根據使用該光罩之該表面上之該等經量測高度產生之該光罩之一焦點圖水平及垂直地平移該載物台。

清潔檢測系統之設備及方法

本發明揭示一種用於清潔一晶圓檢測系統之真空紫外線(VUV)光學器件(例如，一VUV之鏡面)的方法及設備。清潔系統使氫氣在VUV光學器件環境中電離或解離以產生氫自由基(例如，H * )或離子(例如，H + 、H 2 + 、H 3 + )，其自該等鏡面之表面移除水或烴。該等VUV鏡面可包含一反射材料，諸如鋁。該等VUV鏡面可具有一保護塗層以保護該反射材料免受對該等氫自由基或離子之任何有害反應。該保護塗層可包含一貴金屬。

검사 시스템을 세정하기 위한 장치 및 방법

웨이퍼 검사 시스템의 진공 자외선(VUV) 광학계 (예를 들어, VUV의 미러)를 세정하기 위한 방법 및 장치가 개시된다. 세정 시스템은 VUV 광학 환경에서 수소 가스를 이온화 또는 분리하여 수소 라디칼 (예를 들어, H*) 또는 이온 (예를 들어, H + , H 2 + , H 3 + )을 생성하며, 이는 미러 표면으로부터 물 또는 탄화수소를 제거한다. VUV 미러는 알루미늄과 같은 반사 재료를 포함할 수 있다. VUV 미러는 보호 코팅부를 가져 수소 라디칼 또는 이온에 대한 임의의 유해한 반응으로부터 반사 재료를 보호할 수 있다. 보호 코팅부는 귀금속을 포함할 수 있다.

Vapor as a protectant and lifetime extender in optical systems

An enclosure surrounding the optical component can be connected with a vapor source. The vapor source can provide a vapor to the enclosure with a vapor level from 500 ppm to 15000 ppm. The concentration of vapor in the enclosure can increase the lifespan of the optical component in the enclosure.

EUV-Reflektometer und Messverfahren

Ein Messverfahren zum Messen der Reflektivität eines für EUV-Strahlung reflektierend wirkenden Prüflings (PR) umfasst ein Erzeugen eines auf die Oberfläche (OB) gerichteten Messstrahls (STR) mit EUV-Strahlung, ein Halten des Prüflings (PR) und Positionieren des Prüflings in Bezug auf den Messstrahl (STR) in mehreren Freiheitsgraden derart, dass im Betrieb der Messstrahl (STR) an einer vorgebbaren Messstelle im Bereich eines Messflecks (MFL) unter einen vorgebbaren Einfallswinkel auf die reflektierende Oberfläche (OB) trifft, ein Detektieren einer Eigenschaft eines von der Oberfläche des Prüflings reflektierten Strahls mittels eines Detektors (DET) zur Erzeugung von Detektorsignalen, die die vom Prüfling reflektierte EUV-Strahlung repräsentieren sowie ein Auswerten der Detektorsignale zur Bestimmung von Reflektivitäts-Messwerten, wobei das EUV-Reflektometer vor Durchführung einer Messung in einer Justageoperation für die Messung justiert wird. Die Justageoperation umfasst folgende Schritte:(i) Bestimmen einer Strahlrichtung des reflektierten Strahls (STRR) und/oder des Messstrahls (STR) zur Ermittlung von Strahlrichtungs-Parametern;(ii) Bestimmen eine Positionsabweichung (PA) zwischen einem für die Messung angestrebten Soll-Auftreffort des reflektierten Strahls auf dem Detektor und einem auf Basis der Strahlrichtungs-Parameter bestimmten virtuellen Ist-Auftreffort;(iii) Bestimmen von Korrekturwerten auf Basis der Positionsabweichung, wobei die Korrekturwerte Korrekturwinkelwerte und/oder Korrekturwegwerte aufweisen, wobei Korrekturwinkelwerte Winkelwerte repräsentieren, um die die Orientierung des Prüflings (PR) verändert werden muss, um die Positionsabweichung zu korrigieren und wobei Korrekturwegwerte Wegwerte repräsentieren, um die die Position des Detektors (DET) verändert werden muss, um die Positionsabweichung zu korrigieren;(iv) Verändern der Orientierung des Prüflings relativ zum Messstrahl (STR) und/oder Veränderung der Position des Detektors (DET) relativ ...

光学システム内の保護剤としての蒸気及び寿命延長装置

光学構成要素を囲む筐体が、蒸気源と接続されてもよい。蒸気源は、５００ｐｐｍから１５０００ｐｐｍまでの蒸気レベルを有する筐体に蒸気を提供してもよい。筐体内の蒸気の濃度は、筐体内の光学構成要素の寿命を増加させてもよい。

Determining one or more characteristics of light in an optical system

Methods and systems for determining one or more characteristics of light in an optical system are provided. One system includes first detector(s) configured to detect light having one or more wavelengths shorter than 190 nm emitted from a light source at one or more first angles mutually exclusive of one or more second angles at which the light is collected from the light source by an optical system for illumination of a specimen and to generate first output responsive to the light detected by the first detector(s). In addition, the system includes a control subsystem configured for determining one or more characteristics of the light at one or more planes in the optical system based on the first output.

광학 시스템에서 광의 하나 이상의 특성 결정

광학 시스템에서 하나 이상의 광의 특성을 결정하기 위한 방법 및 시스템이 제공된다. 하나의 시스템은 표본의 조명을 위해 광학 시스템에 의해 광원으로부터 광이 수집되는 하나 이상의 제2 각도를 상호 배제한 하나 이상의 제1 각도에서 광원으로부터 방출된 190 nm보다 짧은 하나 이상의 파장을 갖는 광을 검출하고, 제1 검출기(들)에 의해 검출된 광에 응답하여 제1 출력을 생성하도록 구성된 상기 제1 검출기(들)를 포함한다. 또한, 시스템은 제1 출력에 기초하여 광학 시스템 내의 하나 이상의 평면에서 광의 하나 이상의 특성을 결정하도록 구성된 제어 서브시스템을 포함한다.

Determining one or more characteristics of light in an optical system

Verfahren und Vorrichtung zur Kalibrierung eines Reflektometers

Die Erfindung betrifft ein Verfahren zur Kalibrierung eines Reflektometers (10), welches zur Messung einer Reflexionseigenschaft eines Testobjekts (12) konfiguriert ist, durch Korrektur von im zeitlichen Verlauf im Messergebnis auftretenden Abweichungen. Das Verfahren umfasst ein Bereitstellen einer Referenzprobe (50, 52), welche dazu konfiguriert ist, bei Einstrahlung einer Messstrahlung (26) in Reflexion ein Wellenlängenspektrum (60) mit mindestens zwei voneinander unterscheidbaren Peaks (62) zu erzeugen. Weiterhin umfasst das Verfahren ein Vermessen des Wellenlängenspektrums (60) der Referenzprobe (50, 52) mittels des Reflektometers (10), und ein Ermitteln einer Abweichung der Reflexionseigenschaft im vermessenen Wellenlängenspektrum (60) gegenüber einem Referenzspektrum zur Kalibrierung des Reflektometers (10). Weiterhin betrifft die Erfindung eine Kalibriervorrichtung (14) zum Kalibrieren eines Reflektometers (10), welches zur Messung einer Reflexionseigenschaft eines Testobjekts (12) konfiguriert ist.

Improvements in optical emission spectrometry

Improvements in optical emission spectrometry

A method for controlling the flow of gas through a spectrometer, comprising: flowing a gas through a volume of the spectrometer, the volume being a volume through which light from a sample passes along a first path to reach a first detector and the gas being transparent to the light in a spectral region analysed by the spectrometer; transmitting light from a light source along a second path through the gas to a second detector; detecting an intensity of the light from the light source at the second detector at one or more wavelengths of the light; comparing the detected intensity of the light to a respective setpoint corresponding to a desired transmittance of the gas in the volume of the spectrometer and generating at least one error signal based on the comparison; and adjusting a flow rate of the gas through the volume of the spectrometer based on the error signal, in particular to minimise the difference between the detected intensity and setpoint.

発光分光分析の改善

Improvements in optical emission spectrometry

蒸氣作為光學系統中之保護劑及生命延長劑

環繞光學組件之一外殼可與一蒸氣源連接。該蒸氣源可以自500 ppm至15000 ppm之一蒸氣位準將一蒸氣提供至該外殼。該外殼中之蒸氣濃度可增加該外殼中之該光學組件之壽命。

Extreme ultraviolet reflectometer with rotating grating monochrometer

A reflectometer device (10) for determining the quality characteristics of an electronic chip mask blank (12) utilizing a source (22) of electromagnetic radiation in the extreme ultraviolet region. Radiations from the source is passed to a monochrometer (32) which includes a mirror (34), a rotatable grating (38), and an exit slit (42). The radiation travels to the mirror and is reflected to the grating which, in turn, provides a source of electromagnetic radiation which is essentially continuous and of a particular bandwidth. The grating is rotated to tune such source of electromagnetic radiation which is passed to the subject test blank . Upon reflection from the mask blank, a detector (62) determines the intensity of the reflected beam from the mask blank and translates such measurement into a determination of reflectivity.

Dispositioning defects detected on extreme ultraviolet photomasks

用于清洁检查系统的设备和方法

公开了一种用于清洁晶片检查系统的真空紫外(VUV)光学器件(例如VUV反射镜)的方法和设备。该清洁系统使VUV光学器件环境中的氢气离子化或离解，以产生从反射镜的表面去除水或碳氢化合物的氢自由基(例如H * )或氢离子(例如H + 、H 2 + 、H 3 + )。VUV反射镜可以包括反射材料，诸如铝。VUV反射镜可以具有保护涂层，以保护反射材料免受与氢自由基或氢离子的任何不利反应。保护涂层可以包括稀有金属。

Gasgefuelltes uv-spektrometer

Systemn zum messen oder analysieren von proben mit vuv-licht

一种样品探测机构

本发明公开了一种样品探测机构，属于探测器技术领域，该一种样品探测机构，包括底板部件、切换组件、扫描组件和探测组件。通过设置由切换组件、扫描组件和探测组件构成的探测机构，通过扫描组件中支撑轴体的转动带动切换组件转动，从而实现入射角度的调节，并通过探测组件中臂部自由端的转动实现探测部件角度的调节，且切换机构和切换组件的转动能够独立的调节转动角度，以满足测量过程中不同的角度要求，能够在简化结构的基础上完成样品反射率及透射率的测量。

자외선 측정 수단이 구비된 자외선 차단제 케이스

본 발명은 자외선 세기에 따른 적정량을 사용할 수 있도록 하는 자외선 차단제 케이스에 관한 것으로, 자외선 차단제 케이스에 UV의 세기에 따라 색이 변하는 변색부를 구비하고, 상기 변색부를 통해 발현된 색을 상기 케이스에 구비된 비교부와 비교하여, 적절한 양을 토출시켜 피부에 도포할 수 있도록 한다.

光学システム及び方法

【課題】光学素子及びレーザーの寿命改善のために改善された技術を提供する。【解決手段】システム１００は、光学構成要素１０１であるＣａＦ２と、光学構成要素１０３を囲む筐体１０２と、筐体１０２と流体連通している蒸気源１０３であって、蒸気源１０３は、ＣａＦ２に応じた蒸気レベルであって５０００ｐｐｍ以上１５０００ｐｐｍまでの蒸気レベルを有する筐体１０２に蒸気を提供し、蒸気は、水、メタノール、エチレングリコール、又はエタノールのうちの１つである。【選択図】図５

Ｖｕｖ 측정 시스템을 위한 자동 교정 방법

복수의 교정 위치를 가진 교정 패드가 제공된다. 특정 교정 위치는 그 특정 위치가, 예컨대, 오염물로 인해 추가 사용이 불가능하게 되었음을 판정할 때까지 사용될 수 있고, 사용 불가능하게 되었다고 판정된 경우, 교정 프로세스는 교정 패드 상의 상이한 교정 위치를 사용하기 위해 이동할 수 있다. 위치가 더 이상 사용 불가능하다는 판정을 제공하기 위해 다양한 기술이 사용될 수 있다. 교정 프로세스에 사용하기 위해 시간이 흐름에 따라 위치에서 위치로의 이동이 발생할 수 있다. "나쁜" 위치의 지정은 측정된 반사율 데이터를 기초로 할 수 있으나, 다른 기준도 사용될 수 있다. 예를 들어, 광에 노출된 횟수는 위치를 나쁘다고 지정하는 기준일 수 있다. 대안으로서, 위치의 누적 노출이 기준일 수 있다. 또한, 단일 교정 패드 상에 제공된 복수의 교정 위치는 사용 이전에 사용 불가능한 교정 위치를 먼저 걸러내기 위해 사전-평가될 수 있다. 제공된 기술은 단일 교정 샘플을 사용하는 교정 프로세스, 또는 복수의 교정 샘플을 요구하는 프로세스에서 사용될 수 있다.

Dispositioning defects detected on extreme ultraviolet photomasks

Methods and systems for photomask defect dispositioning are provided. One method includes directing energy to a photomask and detecting energy from the photomask. The photomask is configured for use at one or more extreme ultraviolet wavelengths of light. The method also includes detecting defects on the photomask based on the detected energy. In addition, the method includes generating charged particle beam images of the photomask at locations of the detected defects. The method further includes dispositioning the detected defects based on the charged particle beam images generated for the detected defects.

Dispositioning defects detected on extreme ultraviolet photomasks

Euv-reflexionsmessung mit relaxierten sauberkeitsanforderungen

Dargestellt und beschrieben ist ein eine Messvorrichtung für EUV-Reflektivitätsmessungen umfassend: eine Strahlungsquelle (7) und einen Detektor (8), eine Probenaufnahme (2) und eine erste Vakuum-Kammer (5). Um die Anforderungen an die Sauberkeit der verwendeten Messvorrichtungen verringern zu können wird vorgeschlagen, dass die Messvorrichtung für EUV-Reflektivitätsmessungen eine zweite Vakuum-Kammer (4) umfasst, dass die Probenaufnahme (2) wenigstens abschnittsweise in der zweiten Vakuum-Kammer (4) angeordnet ist und dass die zweite Vakuum-Kammer (4) wenigstens ein strahlungsdurchlässiges Fenster (6) aufweist.