Настройки

Укажите год
-

Небесная энциклопедия

Космические корабли и станции, автоматические КА и методы их проектирования, бортовые комплексы управления, системы и средства жизнеобеспечения, особенности технологии производства ракетно-космических систем

Подробнее
-

Мониторинг СМИ

Мониторинг СМИ и социальных сетей. Сканирование интернета, новостных сайтов, специализированных контентных площадок на базе мессенджеров. Гибкие настройки фильтров и первоначальных источников.

Подробнее

Форма поиска

Поддерживает ввод нескольких поисковых фраз (по одной на строку). При поиске обеспечивает поддержку морфологии русского и английского языка
Ведите корректный номера.
Ведите корректный номера.
Ведите корректный номера.
Ведите корректный номера.
Укажите год
Укажите год
Применить Всего найдено 49635. Отображено 100.
26-01-2012 дата публикации

Inspection systems and methods for blow-molded containers

Номер: US20120018925A1
Автор: Georg V. Wolfe, William E. Schmidt
Принадлежит: AGR International Inc

Systems and methods for in-line inspection of plastic blow molded containers. The inspection system may comprise a plurality of emitter assemblies arranged in a vertical array. Each emitter assembly may cyclically emit light energy in at least two different narrow wavelength bands at a container as the container passes through an inspection area. The system may also comprise a plurality of broadband photodetectors arranged in a vertical array, each photodetector facing at least one of the emitter assemblies with the inspection area therebetween such that the photodetectors are capable of sensing light energy that passes through the container when it is in the inspection area. The system may also comprise a processor in communication with the photodetectors for determining a characteristic of the container based on signals from the photodetectors.

Подробнее
Номер записи: 1
26-01-2012 дата публикации

Method for inspecting the inside of a narrow hose or tube particularly for medical use

Номер: US20120019807A1
Автор: Egbert Anne Martijn Brouwer
Принадлежит: Nederlandse Organisatie voor Toegepast Natuurwetenschappelijk Onderzoek TNO

Method and system for inspecting the inside of a small channel, e.g. a flexible tube or hose, particularly for medical use, e.g. included in an endoscope, for the presence of inside contaminations on the wall of the tube, comprising providing the inside of the channel with a liquid having a refractive index which is higher than the refractive index of the channel wall, transmitting a signal into one end of the channel having a wavelength w, comparing the spectrum of the signal received at the other end of the channel with the wavelength w of the transmitted signal and determining, e.g. by a spectrum analyzer, whether the latter signal contains any wavelength w′ which is unequal to the wavelength w of the transmitted signal, and indicating that, when not any wavelength w′ is determined unequal to w, the channel is not contaminated or that, when any wavelength w′ is determined unequal to w, the channel is contaminated. The system may include means for cleaning the inside of the channel by means of said liquid having a refractive index which can be higher than the refractive index of the channel wall which thus is used both as cleaning liquid and as light conducting core.

Подробнее
Номер записи: 2
02-02-2012 дата публикации

Methods, Systems and Apparatus for Defect Detection and Classification

Номер: US20120027286A1
Автор: Chang Yuan, Masakazu Yanase, Xinyu Xu
Принадлежит: Individual

Aspects of the present invention are related to systems, methods and apparatus for image-based automatic detection of a defective area in a flat panel display and classification of the defect type and the cause of the detected defect.

Подробнее
Номер записи: 3
16-02-2012 дата публикации

Inspection Apparatus and Method

Номер: US20120038910A1
Автор: Arno Jan Bleeker, Lucas Henricus Johannes Stevens
Принадлежит: ASML Netherlands BV

Ghost reflections in a catadioptric scatterometer objective are excluded from an angle-resolved spectrum measurement by using a partial pupil for illumination and for the measurement excluding the area of the pupil plane that has been illuminated. Ghost reflections are reflected back into same point in the pupil plane. The ghost reflections do not interfere with the signal in the non-illuminated area of the pupil plane. An illumination system provides a beam of electromagnetic radiation to illuminate a first area in an illumination pupil plane of the objective. The objective is arranged as to illuminate the substrate with the beam of electromagnetic radiation. The illumination pupil plane is the back projected image of the pupil plane of the objective and is also imaged into the measurement pupil plane at the back focal plane of the objective, via auxiliary optics. A detector is configured to measure an angle resolved spectrum arising from the illumination of the substrate, in a measurement area of the measurement pupil plane of the objective excluding an area corresponding to the first area.

Подробнее
Номер записи: 4
16-02-2012 дата публикации

Oxidation state sensors and methods for transition metal alloys

Номер: US20120040467A1
Автор: Daniel Clark, Justin Burrows
Принадлежит: Rolls Royce PLC

The present invention is concerned with a method of discriminating between, in a surface of a transition metal alloy, transition metals in different oxidation states using surface sensor molecules adapted to associate selectively with one of the transition metals. In particular, the present invention provides a method of identifying degradation in aircraft components such as turbine blades, engine casings and aerofoils. In embodiments, a surface sensor molecule comprising an oxidation state discriminating group, such as an imidazole, and a fluorescein probe is applied in aqueous solution to the surface of a service-run Ni alloy aircraft component. The sensor molecule selectively associates with transition metals in oxidation states greater than zero such that fluorescence imaging can be used to identify areas of degradation.

Подробнее
Номер записи: 5
16-02-2012 дата публикации

Measurement system and method

Номер: US20120041583A1
Автор: Joshua Conley, Stephen Murphy
Принадлежит: Individual

A method of measuring planar defects in a substrate may include positioning a sensor proximate to an area configured to receive a substrate.

Подробнее
Номер записи: 6
23-02-2012 дата публикации

Apparatus and method for inspecting internal defect of substrate

Номер: US20120044346A1
Автор: Che-Min Lin, Cheng-Kai Chen, Jen-Ming Chang, Yen-Chun Chou, Yu-Hsi Lee
Принадлежит: Delta Electronics Inc

An apparatus inspects internal defects of substrate, the substrate having an upper surface and a plurality of side surfaces connected with the upper surface. The apparatus includes at least one light source arranged on one of the side surfaces of the substrate and emitting a light beam on the corresponding side surface and into the substrate, the incident angle of the light beam is limited to a first predetermined angle within a range allowing the light beam to transmit in a total internal reflection manner in the substrate; an image capturing module arranged above the substrate to capture the image of the upper surface of the substrate, a light shield mask arranged between the image capturing module and the substrate and shielding an edge portion of the upper surface of the substrate.

Подробнее
Номер записи: 7
23-02-2012 дата публикации

Measuring method of hole diameter, hole position, hole surface roughness, or bending loss of holey optical fiber, manufacturing method of holey optical fiber, and test method of optical line of holey optical fiber

Номер: US20120044482A1
Автор: Itaru ISHIDA, Kazuhide Nakajima, Shoichiro Matsuo, Shoji Tanigawa, Takashi Matsui, Tomoya Shimizu, Toshio Kurashima, Yukihiro Goto
Принадлежит: Fujikura Ltd, Nippon Telegraph and Telephone Corp

A measuring method of a hole diameter of a holey optical fiber includes calculating an arithmetical mean value I(x) from two backscattering light intensities at a position x of two backscattering light waveforms of the holey optical fiber, in which the two backscattering light waveforms are obtained by OTDR measurement; and obtaining the hole diameter at the position x, based on a correlation between an arithmetical mean value I(x) and an hole diameter of the holey optical fiber that is obtained in advance.

Подробнее
Номер записи: 8
23-02-2012 дата публикации

Position-sensitive metrology system

Номер: US20120045855A1
Автор: Erel Milshtein, Markus E. Beck
Принадлежит: Individual

A metrology system for analyzing a semiconductor device on a substrate can include a metrology sensor.

Подробнее
Номер записи: 9
22-03-2012 дата публикации

Method and apparatus for inspecting substrates

Номер: US20120069330A1
Автор: Cheongsoo KIM, Moon-kyu LEE
Принадлежит: SAMSUNG ELECTRONICS CO LTD

A method and an apparatus for inspecting a substrate are provided. The method includes irradiating light to a semiconductor device formed on a substrate and detecting light reflected from the semiconductor device in order to inspect a defect of the semiconductor device. An irradiation position of the light may gradually move from a semiconductor device formed at the center of the substrate to a semiconductor device formed on an edge of the substrate. at least one semiconductor device formed on a substrate, a light irradiating member which irradiates light onto the semiconductor surface formed on the substrate; a light detecting member which detects light reflected from the semiconductor device in order to inspect the semiconductor device for defects; and an irradiation position of the light gradually moves from a semiconductor device formed at the center of the substrate to a semiconductor device formed on an edge of the substrate.

Подробнее
Номер записи: 10
29-03-2012 дата публикации

Optical surface defect inspection apparatus and optical surface defect inspection method

Номер: US20120075625A1
Автор: Ayumu ISHIHARA, Hiroshi Nakajima, Kenichi Shitara, Masanori Fukawa, Shintaro Tamura
Принадлежит: Hitachi High Technologies Corp

The present invention is to provide an optical surface defect inspection apparatus or an optical surface defect inspection method that can improve a signal-to-noise ratio according to a multi-segmented cell method without performing autofocus operations, and can implement highly sensitive inspection. The present invention is an optical surface defect inspection apparatus or an optical surface defect inspection method in which an inspection beam is applied onto a test subject, an image of a scattered light from the surface of the test subject is formed on a photo-detector, and a defect on the surface of the test subject is inspected based on an output from the photo-detector. The photo-detector has an optical fiber bundle. One end thereof forms a circular light receiving surface to receive the scattered light. The other end thereof is connected to a plurality of light receiving devices. The optical fiber bundle is divided into a plurality of fan-shaped cells in the light receiving surface, and connected to the light emitting devices in units of the cells for performing the inspection based on the outputs of the plurality of cells.

Подробнее
Номер записи: 11
12-04-2012 дата публикации

Automated wafer defect inspection system and a process of performing such inspection

Номер: US20120087569A1
Автор: Cory Watkins, Jeffrey O'Dell, Mark Harless, Thomas Verburgt
Принадлежит: Rudolph Technologies Inc

An automated defect inspection system has been invented and is used on patterned wafers, whole wafers, broken wafers, partial wafers, sawn wafers such as on film frames, JEDEC trays, Auer boats, die in gel or waffle packs, MCMs, etc., and is specifically intended and designed for second optical wafer inspection for such defects as metalization defects (such as scratches, voids, corrosion, and bridging), diffusion defects, passivation layer defects, scribing defects, glassivation defects, chips and cracks from sawing, solder bump defects, and bond pad area defects.

Подробнее
Номер записи: 12
19-04-2012 дата публикации

Precision solder resist registration inspection method

Номер: US20120092488A1
Автор: Mark Lawrence Delaney
Принадлежит: Mitutoyo Corp

A method is disclosed for operating a machine vision inspection system to determine a fluorescent imaging height for acquiring a fluorescent image for repeatably determining the location of a feature within the fluorescent material. The height of an exposed workpiece portion exposed outside of the fluorescent material is determined (e.g., using a height sensor or autofocus operations). The determined height is repeatable. The exposed portion has a characteristic height relative to the fluorescent material and/or features located therein. The fluorescent imaging height, which may be inside the fluorescent material, is determined relative to the determined height of the exposed portion. The fluorescent imaging height is determined such that it enhances the detection of the desired feature located within the fluorescent material in the resulting fluorescent image. For a variety of workpieces, the method provides automatic acquisition of appropriately focused fluorescent image more reliably than previously known methods.

Подробнее
Номер записи: 13
17-05-2012 дата публикации

Interference microscope and measuring apparatus

Номер: US20120120485A1
Автор: Fumio Ootomo, Hisashi Isozaki, Kazuhiro Miyakawa, Kazuo Nunokawa, Masayuki Momiuchi, Miyano Nunokawa
Принадлежит: Topcon Corp

In an interference microscope and a measuring device for observing and inspecting the surface and inside of a specimen such as a wafer by applying laser light to the specimen and using an interferometer, a reference optical path for conducting light is provided between a beam splitter and a reference mirror, and a measurement optical path for conducting light is provided between the beam splitter and the specimen, thereby providing an optical path difference between the reference optical path and the measurement optical path. Further, the reference mirror is tilted slightly, thereby forming interference fringes on detection means. It is possible to measure the surface shape of the specimen (measurement object) such as a wafer only by slightly tilting the reference mirror with a simple configuration and locate the accurate coordinate positions of foreign particles and pole pieces.

Подробнее
Номер записи: 14
24-05-2012 дата публикации

System for performing inspections, repairs, and/or other operations within vessels

Номер: US20120125128A1
Автор: Andrew James Toth, Christopher R. Butler, Vladimir Yliy Gershtein
Принадлежит: Air Products and Chemicals Inc

A system is provided to facilitate inspections, repairs, and other operations within vessels without human entry into the vessels, and without introducing contaminants that could reduce the purity of materials held in the vessels below predetermined minimum levels.

Подробнее
Номер записи: 15
31-05-2012 дата публикации

Defect inspection device and inspection method

Номер: US20120133928A1
Автор: Shigenobu Maruyama, Toshifumi Honda, Toshiyuki Nakao, Yuta Urano
Принадлежит: Hitachi High Technologies Corp

A defect inspection method wherein illumination light having a substantially uniform illumination intensity distribution in a certain direction on the surface of a specimen is radiated onto the surface of the specimen; wherein multiple components of those scattered light beams from the surface of the specimen which are emitted mutually different directions are detected, thereby obtaining corresponding multiple scattered light beam detection signals; wherein the multiple scattered light beam detection signals is subjected to processing, thereby determining the presence of defects; wherein the corresponding multiple scattered light detecting signals is processed with respect to all of the spots determined to be defective by the processing, thereby determining the sizes of defects; and wherein the defect locations on the specimen and the defect sizes are displayed with respect to all of the spots determined to be defective by the processing.

Подробнее
Номер записи: 16
31-05-2012 дата публикации

Refraction assisted illumination for imaging

Номер: US20120135550A1
Автор: Stephen La Lumondiere, Terence Yeoh
Принадлежит: Aerospace Corp

Various embodiments are directed to systems and methods of imaging subsurface features of objects. An illumination source may be directed towards a surface of an object comprising subsurface features at a first angle relative to the normal of the surface. The object may have a portion between the subsurface features and the surface that has an index of refraction that is greater than the index of refraction of a surrounding medium. An imaging device may be placed with an objective lens oriented substantially normal to the surface. The first angle may be larger than an acceptance angle of the objective lens.

Подробнее
Номер записи: 17
07-06-2012 дата публикации

Defect image processing apparatus, defect image processing method, semiconductor defect classifying apparatus, and semiconductor defect classifying method

Номер: US20120141011A1
Автор: Katsuhiko Ichinose, Seiji Isogai, Shigeki Kurihara, Tamao Ishikawa, Tomohiro Funakoshi, Tsunehiro Sakai, Yuichi Hamamura, Yutaka Tandai
Принадлежит: Hitachi High Technologies Corp

A defect image processing apparatus uses a normalized cross correlation to image-match a layout image ( 52 ) acquired from a design data with an image acquired by removing, from a defect image ( 53 ), the defect area portions thereof, and displays, as a result of that matching, a layout image and defect image ( 54 ) on the display device. In the displayed layout image & defect image ( 54 ), not only the layout image, the layer of which is the same as that of the defect image ( 53 ), but also a layout image of another layer is displayed superimposed on the defect image ( 53 ). This makes it easier to analyze the factor of a systematic defect having occurred due to a positional relationship with another layer.

Подробнее
Номер записи: 18
14-06-2012 дата публикации

Systems And Methods For The Angular Orientation And Detection of Containers In Labelling Machines

Номер: US20120147360A1
Автор: Antonio Secchi, Fabrizio Germini
Принадлежит: Sidel SpA

Systems and methods for the angular orientation and detection of containers being processed in labeling machines are provided.

Подробнее
Номер записи: 19
21-06-2012 дата публикации

Apparatus and methods for determining overlay of structures having rotational or mirror symmetry

Номер: US20120153281A1
Автор: Mark Ghinovker
Принадлежит: KLA Tencor Technologies Corp

A semiconductor target for determining a relative shift between two or more successive layers of a substrate is provided. The target comprises a plurality of first structures formed in a first layer, and the first structures have a first center of symmetry (COS). The target further comprises a plurality of second structures formed in a second layer, and the second structures have second COS. The difference between the first COS and the second COS corresponds to an overlay error between the first and second layer and wherein the first and second structures have a 180° rotational symmetry, without having a 90° rotational symmetry, with respect to the first and second COS, respectively.

Подробнее
Номер записи: 20
21-06-2012 дата публикации

Thermal Inspection and Machining Systems and Methods of Use

Номер: US20120154570A1
Автор: Jared Crosby, Jason Randolph Allen, Ronald Scott Bunker
Принадлежит: General Electric Co

The present application provides a thermal imaging and machining system for a machine component. The thermal imaging and machining system may include a machining subsystem with a machining device for drilling one or more holes in the machine component and a thermal inspection subsystem positioned about the machining subsystem. The thermal inspection subsystem may include an imager and one or more fluid supply lines such that a thermal response of the holes in the machine component may be determined.

Подробнее
Номер записи: 21
28-06-2012 дата публикации

Inspecting Method and Inspecting Apparatus for Substrate Surface

Номер: US20120162665A1
Автор: Akira Hamamatsu, Hisae Shibuya, Shigenobu Maruyama, Shunji Maeda, Toshiyuki Nakao, Yoshimasa Oshima, Yuta Urano
Принадлежит: Akira Hamamatsu, Hisae Shibuya, Shigenobu Maruyama, Shunji Maeda, Toshiyuki Nakao, Yoshimasa Oshima, Yuta Urano

An inspecting method and apparatus for inspecting a substrate surface includes application of a light to the substrate surface, detection of scattered light or reflected light from the substrate surface due to the applied light at a plurality of positions to obtain a plurality of electrical signals, extraction of a signal in a mutually different frequency band from each of the plurality of electrical signals, and calculation of a value regarding a state of film of the substrate through an arithmetical operation process of a plurality of extracted signals in the frequency bands.

Подробнее
Номер записи: 22
05-07-2012 дата публикации

Quantitative and self-calibrating chemical analysis using paper-based microfluidic systems

Номер: US20120171702A1
Автор: Gil Garnier, Junfei Tian, Wei Shen, Xu Li
Принадлежит: MONASH UNIVERSITY

A method of determining the concentration of a test fluid sample using a paper-based microfluidic system having a plurality of hydrophilic testing zones, including: a) depositing said test fluid sample on at least one said testing zone; b) depositing a plurality of standard fluid samples or reactives of differing known concentrations on other said testing zones; c) introducing an indicator solution to each said test zone to thereby react with the deposited fluid sample and result in a colour intensity change which is a function of the fluid sample concentration; and d) comparing the differences in colour intensity between the test fluid sample and the standard fluid samples or reactives to thereby determine the concentration of said test fluid sample.

Подробнее
Номер записи: 23
12-07-2012 дата публикации

Automated repair method and system

Номер: US20120179285A1
Автор: Dimitrios Thomaidis, Rolf WILKENHÖNER, Torsten Melzer-Jokisch
Принадлежит: SIEMENS AG

A method and system for automated repair of a machine component is provided. According to the proposed method, a first geometry of the component, including a damaged portion of the component, is digitalized. A trough is then machined over the damaged portion of the component. The machining is numerically controlled using digitalized geometrical data of the first geometry of the component. A second geometry of the component is then digitalized subsequent to the machining, the second geometry including the trough. Subsequently, a material is deposited over the trough. The deposition of the material is numerically controlled digitalized geometrical data of the second geometry of the component.

Подробнее
Номер записи: 24
19-07-2012 дата публикации

Methods and Apparatus for Inspection Of Articles, EUV Lithography Reticles, Lithography Apparatus and Method of Manufacturing Devices

Номер: US20120182538A1
Автор: Luigi Scaccabarozzi, Oktay Yildirim, Roelof Koole, Vadim Yevgenyevich Banine
Принадлежит: ASML Netherlands BV

An article such as an EUV lithography reticle is inspected to detect contaminant particles. The method comprises applying a fluorescent dye material to the article, illuminating the article with radiation at wavelengths suitable for exciting the fluorescent dye, monitoring the article for emission of second radiation by the fluorescent dye at a wavelength different from the first radiation, and generating a signal representing contamination in the event of detecting the second radiation. In one example, measures such as low-affinity coatings may be applied to the reticle to reduce affinity for the dye molecules, while the dye molecules will bind by physical or chemical adsorption to the contaminant particles. Dyes may be selected to have fluorescence behavior enhanced by hydrophobicity or hydrophilicity, and contaminant surfaces treated by buffer coatings accordingly.

Подробнее
Номер записи: 25
26-07-2012 дата публикации

Machine Tool - Based, Optical Coordinate Measuring Machine Calibration Device

Номер: US20120188380A1
Автор: Erik M. PEDERSEN, Joseph D. Drescher
Принадлежит: Pratt and Whitney Co Inc

A calibration artifact for an inspection system is provided. The calibration artifact comprises a base adapted for placement within a holding fixture of an inspection system during calibration, a sphere operatively connected to the base, and a light source operatively connected to the base. The base, the sphere, and the light source are removable from the inspection system after calibration.

Подробнее
Номер записи: 26
26-07-2012 дата публикации

Apparatus And Method For Establishing Standards For Visual Residue Limits

Номер: US20120189992A1
Автор: Carl Craig, William Mchale
Принадлежит: Waters Technologies Corp

Embodiments of the present invention are directed to apparatus and methods for establishing standards for visual residue limits, training individuals to visually observe and recognize surfaces exceeding or complying with residue limits, and certifying individuals for such detection limits The invention features a kit comprising an assembly of coupons with predetermined loads.

Подробнее
Номер записи: 27
09-08-2012 дата публикации

Tablet inspection support method and tablet inspection support apparatus

Номер: US20120200596A1
Автор: Makoto Gotou, Takanobu Tanimoto, Yoshihiko Matsukawa
Принадлежит: Panasonic Corp

The tablet inspection support apparatus ( 11 ) includes: (i) a conveying unit ( 15 ) which conveys a medicine packaging sheet having a series of packets each of which encloses one or more tablets between two films; (ii) a transmitted-light illumination unit ( 17 ) which illuminates a packet from a side of one of the two films; (iii) a reflected-light illumination unit ( 16 ) which illuminates a packet from a side of the other of the two films; (iv) an imaging unit ( 18 ) which obtains, by capturing an image of a packet from a side of the other of the two films, a transmitted-light image that is an image of a packet illuminated by the transmitted-light illumination unit and a reflected-light image that is a color image of the packet illuminated by the reflected-light illumination unit; (v) an image processing unit ( 19 ) which detects a tablet region indicating a region of one or more tablets enclosed in a packet by using the transmitted-light image and generates a color tablet image by clipping an image of a region of the reflected-light image corresponding to the tablet region; and (vi) a display unit ( 20 ) which displays the tablet image generated by the image processing unit ( 19 ).

Подробнее
Номер записи: 28
16-08-2012 дата публикации

Inspection Apparatus and Method, Lithographic Apparatus, Lithographic Processing Cell and Device Manufacturing Method

Номер: US20120206703A1
Автор: Arie Jeffrey Den Boef, Kaustuve Bhattacharyya, Peter Clement Paul Vanoppen, Stefan Carolus Jacobus Antonius Keij
Принадлежит: ASML Netherlands BV

Asymmetry properties of a periodic target on a substrate, such as a grating on a wafer, are determined. An inspection apparatus has a broadband illumination source with illumination beams point mirrored in the pupil plane of a high numerical aperture objective lens. The substrate and target are illuminated via the objective lens from a first direction and a second direction mirror reflected with respect to the plane of the substrate. A quad wedge optical device separately redirects diffraction orders of radiation scattered from the substrate and separates diffraction orders from illumination along each of the first and second directions. For example the zeroth and first orders are separated for each incident direction. After capture in multimode fibers, spectrometers are used to measure the intensity of the separately redirected diffraction orders as a function of wavelength.

Подробнее
Номер записи: 29
13-09-2012 дата публикации

Cigarette inspection device

Номер: US20120230578A1
Автор: Tetsuya Okuyama
Принадлежит: Japan Tobacco Inc

A cigarette inspection device for inspecting a filter quality through an inspection image of filter end faces in a bundle of cigarettes for accurately detecting, for example, only contaminations. A pattern image is used for detecting a cigarette location on the basis of a preset location of each cigarette in the cigarette bundle and a search area on the inspection image is set. The pattern image is shifted within the search area, thereby obtaining a position at which the pattern image coincides with an image of the filter end face. An image of a filter end face of the cigarette is cut out from the inspection image according to the detected position, and quality (contamination) is inspected. Inspection results obtained with respect to the cigarettes are aggregated, and a judgment is made on the quality (presence or absence of a contamination) of the filter end face.

Подробнее
Номер записи: 30
27-09-2012 дата публикации

Pattern inspection apparatus and pattern inspection method

Номер: US20120242985A1
Автор: Makoto Kaneko, Mitsutoshi WATABIKI, Shinichi Imai, Takayoshi Fujii, Yuichiro Yamazaki, Yusaku Konno, Yusuke Iida
Принадлежит: Toshiba Corp

In accordance with an embodiment, a pattern inspection apparatus includes a stage supporting a substrate with a pattern, a light source irradiating the substrate with light, a detection unit, an optical system, a focus position change unit, a control unit, and a determination unit. The detection unit detects reflected light from the substrate. The optical system leads the light from the light source to the substrate and leads the reflected light to the detection unit. The focus position change unit changes a focus position of the light to the substrate in a direction vertical to the surface of the substrate. The control unit associates the movement of the stage with the light irradiation and controls the stage drive unit and the focus position change unit, thereby changing the focus position. The determination unit determines presence/absence of a defect of the pattern based on the signal from the determination unit.

Подробнее
Номер записи: 31
27-09-2012 дата публикации

Apparatus for optical inspection

Номер: US20120242986A1
Автор: Cooper S.K. Kuo, Ron Tsai, Steven Lee
Принадлежит: Individual

An apparatus for optical inspection comprises a platform extending in a first direction, a transmitting unit for transporting at least one carrier in the first direction from an input port to an output port thereof, each of the at least one carrier to support one of at least one object to be inspected, a first detector disposed above the platform and extending in a second direction orthogonal to the first direction for inspecting the at least one object on the at least one carrier, the first detector including a first scanner extending in the second direction between the input port and the output port, and a first roller set between the first scanner and the input port to apply force onto a surface of each of the at least one object.

Подробнее
Номер записи: 32
04-10-2012 дата публикации

Capturing method for images with different view-angles and capturing system using the same

Номер: US20120249753A1
Автор: Chin-Kuei Chang, Chun-Lung Chang, Kuo-Tang Huang, Ya-Hui Tsai
Принадлежит: Industrial Technology Research Institute ITRI

A capturing method for a plurality of images with different view-angles and a capturing system using the same are provided. The capturing method for the images with different view-angles includes the following steps. An appearance image of an object is captured by an image capturing unit at a capturing angle. A light reflection area of the appearance image is detected by a detecting unit, and a dimension characteristic of the light reflection area is analyzed by the same. Whether the dimension characteristic of the light reflection area is larger than a first predetermined value is determined. If the dimension characteristic of the light reflection area is larger than the first predetermined value, then the capturing angle is adjusted within a first adjusting range. After the step of adjusting the capturing angle within a first adjusting range is performed, the step of capturing the appearance image is performed again.

Подробнее
Номер записи: 33
04-10-2012 дата публикации

Through silicon imaging and probing

Номер: US20120249859A1
Автор: Baohua Niu, David L. Budka, Mitchell L. Sacks, Patrick M. Pardy
Принадлежит: Intel Corp

Through silicon imaging and probing. A light source provides unpolarized light to be projected on a device under test (DUT). Light reflected from the DUT may be captured by a camera or other image capture device. A pellicle is utilized to reflect light from the light source toward the DUT. The pellicle also passes light reflected by the DUT to the camera. One or more linear polarizers or half wave plates may be used to provide the desired light polarization. The ability to provide the desired polarization provides an improved image that can be captured by the camera.

Подробнее
Номер записи: 34
18-10-2012 дата публикации

Defects inspecting apparatus and defects inspecting method

Номер: US20120262709A1
Автор: Akira Hamamatsu, Hidetoshi Nishiyama, Masahiro Watanabe, Minori Noguchi, Sachio Uto, Takahiro Jingu, Toshihiko Nakata, Yoshimasa Ohshima
Принадлежит: Akira Hamamatsu, Hidetoshi Nishiyama, Masahiro Watanabe, Minori Noguchi, Sachio Uto, Takahiro Jingu, Toshihiko Nakata, Yoshimasa Ohshima

An inspecting apparatus and method including first and second illuminating units for illuminating a surface of a specimen to be inspected with different incident angles and first and second detecting optical units arranged at different elevation angle directions to the surface of the specimen for detecting images of the specimen illuminated by the first and second illuminating units.

Подробнее
Номер записи: 35
25-10-2012 дата публикации

Multivariable predictive control optimizer for glass fiber forming operation

Номер: US20120271445A1
Автор: Michael D. PIETRO, Wei Li
Принадлежит: OWENS CORNING INTELLECTUAL CAPITAL LLC

A system and method for determining and controlling for cure status of binder on a fibrous product are disclosed. Cure status is monitored by measuring one or more control variables and attempting to keep them within known control limits. Exemplary control variables include oven temperatures at various locations and color values of sections of the fibrous product. Sensors such as thermocouples and image capture systems sense these variables continuously online and provide input signals for a MPC processor-optimizer. The MPC optimizers balances the constraints according to a programmed optimization function and priority ranking of control variables and solves for optimal control setting on manipulatable variables, such as oven fan speed, oven setpoint temperatures and coolant water flow rate.

Подробнее
Номер записи: 36
08-11-2012 дата публикации

Apparatus and method for reinspecting prescription drugs

Номер: US20120280075A1
Автор: Jun-Ho Kim
Принадлежит: JVM Co Ltd

Disclosed are an apparatus and a method for reinspecting a prescription drug, which reinspect the defect state of a defective drug pack after the defect state of an individually packaged drug has been inspected by analyzing the image of the drug. The apparatus includes a drug pack information transceiving module to receive primary inspection data, a drug reinspection controlling module to control a procedure of reinspecting a defect state of a drug pack which has been primarily determined as a defective drug pack, an image processing module to photograph the drug pack, which has been primarily determined as the defective drug pack, and to process an image of the drug pack, and a defect analyzing module to determine a defect state of the drug by analyzing a drug contained in the image of the drug pack provided from the image processing module.

Подробнее
Номер записи: 37
08-11-2012 дата публикации

Defect inspection device using catadioptric objective lens

Номер: US20120281207A1
Автор: Keiko YOSHIMIZU, Yasuhiro Yoshitake
Принадлежит: HITACHI LTD

A defect inspection device comprises an inspection optical system including a light source, a half mirror for reflecting illumination light emitted from the light source, a catadioptric objective lens for collecting reflected light from the sample by illumination light reflected by the half mirror, an imaging lens for focusing the reflected light transmitted through the catadioptric objective lens, a relay lens having a blocking member provided at a position at which specularly reflected light from the sample is focused by the imaging lens, and a detector for defecting the reflected light of the specularly deflected light blocked by the blocking member; and a computation processing unit for detecting defects of the sample on the basis of the signals detected by the detector.

Подробнее
Номер записи: 38
08-11-2012 дата публикации

White Blood Cell Analysis System and Method

Номер: US20120282598A1
Автор: Giacomo Vacca, Jiong Wu
Принадлежит: ABBOTT LABORATORIES

Systems and methods for analyzing blood samples, and more specifically for performing a white blood cell (WBC) differential analysis. The systems and methods screen WBCs by means of fluorescence staining and a fluorescence triggering strategy. As such, interference from unlysed red blood cells (RBCs) and fragments of lysed RBCs is substantially eliminated. The systems and methods also enable development of relatively milder WBC reagent(s), suitable for assays of samples containing fragile WBCs. In one embodiment, the systems and methods include: (a) staining a blood sample with an exclusive cell membrane permeable fluorescent dye, which corresponds in emission spectrum to an excitation source of a hematology instrument; (b) using a fluorescence trigger to screen the blood sample for WB Cs; and (c) using measurements of (1) axial light loss, (2) intermediate angle scatter, (3) 90° polarized side scatter, (4) 90° depolarized side scatter, and (5) fluorescence emission to perform a differentiation analysis.

Подробнее
Номер записи: 39
15-11-2012 дата публикации

Board inspection apparatus

Номер: US20120287264A1
Автор: Hong-Min KIM, Jong-Kyu Hong, Jung Hur, Moon-Young Jeon, Sang-Kyu YUN
Принадлежит: KOH YOUNG TECHNOLOGY INC

An apparatus for inspecting a board is shown. The board inspection apparatus includes at least one illuminating module, an imaging lens, a first beam splitter, a first camera, and a second camera. The illuminating module provides light to an inspection board and the imaging lens transmits a light reflected from the inspection board. The first beam splitter transmits a portion of the light transmitted from the imaging lens and reflects the rest of the transmitted light. The first camera image-captures by receiving the light that transmits the first beam, and the second camera image-captures by receiving the light reflected from the first beam splitter. Therefore, by using one imaging lens to inspect the inspection board, the decrease in accuracy caused by the different optical axis or magnification may be prevented.

Подробнее
Номер записи: 40
15-11-2012 дата публикации

Pattern inspection method and device for same

Номер: US20120287426A1
Автор: Hideaki Sasazawa, Kiyotaka HORIE, Shigeru Serikawa, Takenori Hirose
Принадлежит: Hitachi High Technologies Corp

In an optical inspection for patterned media for hard disks, a pattern inspection device is provided for inspecting patterns without being susceptible to variations in film thickness and film quality of an underlying film, the device includes optical characteristics detection means for detecting optical characteristics of multilayers by processing, upon the reflected light being dispersed and detected by the spectroscopic detection means, the reflected light from a non-patterned region on the substrate, and processing a detection signal corresponding to, and detecting optical characteristics of, the reflected light from the patterns including the multilayers; and pattern inspection means for inspecting the patterns formed on the multilayers, by viewing, upon the detection of the optical characteristics by the optical characteristics detection means, information on the optical characteristics of the reflected light from the multilayers, and processing information on the optical characteristics of the reflected light from the patterns including the multilayers.

Подробнее
Номер записи: 41
22-11-2012 дата публикации

Method and device for inspecting a traveling wire cable

Номер: US20120294506A1
Автор: Roland Verreet
Принадлежит: CASAR Drahtseilwerk Saar GmbH

A wire cable is exposed to flashes and the exposed image is detected on at least one lay length or a multiple of the lay length and monitored for changes in the image. Preferably, the respective repetition of the same outer stranded wire of the traveling wire cable is detected in the same location and every repetition or every other repetition or every third repetition is used for triggering the flash. In another embodiment, a picture is taken of a large portion of the wire cable using a specialized camera and the image is split up, into recurring units of length that correspond to the size of a lay length or a multiple of the lay length and the successive units of length are compared and inspected for changes in the image.

Подробнее
Номер записи: 42
22-11-2012 дата публикации

Defect inspection method and device thereof

Номер: US20120296576A1
Автор: Atsushi Taniguchi, TAKETO UENO, Toshifumi Honda, Yukihiro Shibata
Принадлежит: Hitachi High Technologies Corp

The present invention relates to a defect inspection device which includes: irradiating means for simultaneously irradiating different regions on a sample with illumination light under different optical conditions, the sample being predesigned to include patterns repeatedly formed thereupon, wherein the patterns are to be formed in the same shape; detection means for detecting, for each of the different regions, a beam of light reflected from each region irradiated with the illumination light; defect candidate extraction means for extracting defect candidates under the different optical conditions for each of the different regions, by processing detection signals corresponding to the reflected light which is detected; defect extraction means for extracting defects by integrating the defect candidates extracted under the different optical conditions; and defect classifying means for calculating feature quantities of the extracted defects and classifies the defects according to the calculated feature quantities.

Подробнее
Номер записи: 43
29-11-2012 дата публикации

Non-destructive liquid penetrant inspection process integrity verification test panel

Номер: US20120297857A1
Автор: Paul Dunnwald
Принадлежит: ILLINOIS TOOL WORKS INC

A fluid penetrant inspection test panel includes a substrate having a first surface and an opposing second surface, the first surface configured to receive a dye penetrant thereon, and a plurality of sensitivity indicators formed in the first surface, the plurality of sensitivity indicators having a cross-sectional profile defined by a continuous edge. The fluid penetrant inspection test panel may be formed to have either a rectangular shape or a triangular shape.

Подробнее
Номер записи: 44
06-12-2012 дата публикации

Method and device for detecting cracks in semiconductor substrates

Номер: US20120307236A1
Автор: Andreas Ortner, Hilmar Von Campe, Klaus Gerstner, Michael Stelzl
Принадлежит: SCHOTT AG

The invention relates to a method and an apparatus for detecting cracks in semiconductor substrates, such as silicon wafers and solar cells. The method and apparatus are based on the detection of light deflected at a crack.

Подробнее
Номер записи: 45
06-12-2012 дата публикации

Plate, Transducer and Methods for Making and Operating a Transducer

Номер: US20120308053A1
Автор: Alfons Dehe
Принадлежит: INFINEON TECHNOLOGIES AG

A plate, a transducer, a method for making a transducer, and a method for operating a transducer are disclosed. An embodiment comprises a plate comprising a first material layer comprising a first stress, a second material layer arranged beneath the first material layer, the second material layer comprising a second stress, an opening arranged in the first material layer and the second material layer, and an extension extending into opening, wherein the extension comprises a portion of the first material layer and a portion of the second material layer, and wherein the extension is curved away from a top surface of the plate based on a difference in the first stress and the second stress.

Подробнее
Номер записи: 46
27-12-2012 дата публикации

System and method for image calibration

Номер: US20120327214A1
Автор: Gregory J. McENTYRE
Принадлежит: HNJ Solutions Inc

The present invention discloses a system for smart camera image calibration, comprising a calibration card, a size marking on the calibration card, and a calibration image on the calibration card. A method for smart camera image calibration comprises calibrating a vision system to a size marking, capturing a calibration verification image, and verifying the calibration verification image based on the size marking. A smart camera calibration system comprises a vision system, a first calibration parameter programmed into the vision system, a calibration card comprising a size marking, and a calibration image, wherein the calibration image is shown on the calibration card and in the vision system, wherein the calibration image substantially corresponds to at least some portion of a product, and wherein the size marking does not bear similarity to the at least some portion of the product.

Подробнее
Номер записи: 47
27-12-2012 дата публикации

Defect inspecting apparatus

Номер: US20120327217A1
Автор: Kazunori ANAYAMA, Kenta Sakai, Masami Ikeda, Toshiyuki Suzuma, Yoshiyuki Nakao
Принадлежит: Sumitomo Metal Industries Ltd

A defect inspecting apparatus includes a first light source, a first image capture device that receives the reflection light emitted from the first light source and reflected by the outer peripheral surface of a lip part to grab the image of the outer peripheral surface of the lip part, a second light source, a second image capture device 8 that receives the reflection light emitted from the second light source and reflected by a load face to grab the image of the load face, a third light source, a third image capture device that receives the reflection light emitted from the third light source and reflected by a thread bottom face inspection zone 106 to grab the image of the thread bottom face inspection zone, and an inspection device for inspecting defects by processing the captured images grabbed by the first to third image capture devices.

Подробнее
Номер записи: 48
03-01-2013 дата публикации

System and Method for Inspecting Components of Hygienic Articles

Номер: US20130002852A1
Автор: Jeremy Georges Bertin, Markus Ingo Hoffmann, Rajesh Kumar Singh, Randolph William Lumsden
Принадлежит: Procter and Gamble Co

System and method to inspect hygienic articles. Defects are detected using a vision system by comparing an inspection image of a component to a reference image of a defect-free component. Detection of a defect can then be used to reject components and perform other functions.

Подробнее
Номер записи: 49
24-01-2013 дата публикации

Wafer edge inspection and metrology

Номер: US20130022260A1
Автор: Ajay Pai, Tuan D. Le
Принадлежит: Rudolph Technologies Inc

Some aspects of the present invention relate to a wafer inspection method. A plurality of images is acquired about an edge portion of a wafer. Each of the images comprises a pixel array having a first dimension and a second dimension. A composite image of compressed pixel arrays is generated by compressing each of the pixel arrays in the first dimension and concatenating the pixel arrays. The composite image is analyzed to identify a wafer feature, for example using a sinusoidal line fit.

Подробнее
Номер записи: 50
31-01-2013 дата публикации

Inspecting device, inspecting method, and method for manufacturing optical fiber

Номер: US20130027689A1
Автор: Hiroki Hamaguchi, Itaru ISHIDA
Принадлежит: Fujikura Ltd

A detector sequentially detects intensity distribution of transmitted light which is transmitted through a center portion of a preform. A determining section determines at least one of a position of a through hole and a size thereof on the basis of a time series of a feature value in the intensity distribution.

Подробнее
Номер записи: 51
07-02-2013 дата публикации

Detecting defects on a wafer

Номер: US20130035876A1
Автор: Junqing Huang, Lisheng Gao, Richard Wallingford, Stephanie Chen, Tao Luo, Yong Zhang
Принадлежит: KLA Tencor Corp

Methods and systems for detecting defects on a wafer are provided.

Подробнее
Номер записи: 52
21-02-2013 дата публикации

Methods and apparatus for determining formulation orientation of multi-layered pharmaceutical dosage forms

Номер: US20130043612A1
Автор: Johan H. Geerke, Steven F. Stone
Принадлежит: Alza Corp

Rapid and accurate determination of the formulation orientation of multi-layer capsule-shaped tablets with respect to different internal formulation layers proximate to the opposite narrow and rounded ends of the tablets is required. By including an appropriate color scheme in multi-layer osmotic tablets, detection of the formulation orientation is achieved by detecting the color at a spot location on a side of the tablet corresponding to one or another formulation layer or to one or another interface of two formulation layers depending on the formulation orientation of the tablet.

Подробнее
Номер записи: 53
21-02-2013 дата публикации

Board inspection apparatus

Номер: US20130044204A1
Автор: Hiroyuki Ishigaki
Принадлежит: CKD Corp

A board inspection apparatus includes an irradiation unit, an imaging unit, and an image processing unit. The image processing unit includes a three-dimensional measurement unit configured to perform three-dimensional measurement of the surfaces of the solder and the resist film by a certain three-dimensional measurement method based on the image data, a virtual standard surface setting unit configured to set a virtual standard surface corresponding to a contacting surface of a certain component mounted in a certain area of the printed board, a protrusion amount calculation unit configured to calculate a protrusion amount from the virtual standard surface for each solder printed and formed in the certain area, and a determination unit configured to determine whether the printed state of the solder passes or fails based on each of the protrusion amounts of the solder.

Подробнее
Номер записи: 54
14-03-2013 дата публикации

Pattern inspection apparatus and method

Номер: US20130063721A1
Автор: Kiminori Yoshino, Makoto Kaneko, Mitsutoshi WATABIKI, Takayoshi Fujii, Yuichiro Yamazaki, Yusaku Konno, Yusuke Iida
Принадлежит: Toshiba Corp

In one embodiment, a pattern inspection apparatus includes a light source configured to generate light, and a condenser configured to shape the light into a line beam to illuminate a wafer with the line beam. The apparatus further includes a spectrometer configured to disperse the line beam reflected from the wafer. The apparatus further includes a two-dimensional detector configured to detect the line beam dispersed by the spectrometer, and output a signal including spectrum information of the line beam. The apparatus further includes a comparison unit configured to compare the spectrum information obtained from corresponding places of a repetitive pattern on the wafer with each other, and a determination unit configured to determine whether the wafer includes a defect, based on a comparison result of the spectrum information.

Подробнее
Номер записи: 55
14-03-2013 дата публикации

Die inspection method

Номер: US20130063725A1
Автор: Hidekazu Hayashi, Takao Imaoku
Принадлежит: Sharp Corp

A method is disclosed for inspecting a mold which has a porous alumina layer over its surface. The method includes providing, based on a relationship between a first parameter indicative of a thickness of the porous alumina layer and a color parameter indicative of a color of reflected light from the porous alumina layer, first color information which represents a tolerance of the first parameter of a porous alumina layer which has an uneven structure that is within a tolerance; providing a mold which is an inspection subject, the mold having a porous alumina layer over its surface; obtaining a color parameter which is indicative of a color of reflected light from the porous alumina layer of the inspection subject mold; and determining a suitability of the first parameter of the inspection subject mold based on the obtained color parameter and the first color information.

Подробнее
Номер записи: 56
21-03-2013 дата публикации

Evaluation device and evaluation method

Номер: US20130070244A1
Автор: Kazuhiko Fukazawa, Yuji Kudo
Принадлежит: Nikon Corp

In an evaluation device, an analyzer is rotated so that the azimuth of the transmission axis of the analyzer has an inclination angle of 90 degrees±3 degrees with respect to the transmission axis of a polarizer. An imaging camera captures a regularly reflected image of a wafer under each condition, and an image processing unit evaluates the shape of a repeating pattern and detects dose defects and focus defects on the basis of the two images of the wafer captured by the imaging camera.

Подробнее
Номер записи: 57
21-03-2013 дата публикации

Auto focusing devices for optical microscopes

Номер: US20130070334A1
Автор: Byeong Hwan Jeon, Chang Hoon Choi, Hyun Jae Lee, In ho Seo, Kwang Soo Kim, Myoung Ki AHN, Sung Jin Lee
Принадлежит: SAMSUNG ELECTRONICS CO LTD

A focusing device for an optical microscope may include a light emitting unit configured to emit laser light having a specific wavelength, a wedge mirror configured to enable the emitted laser light to be incident on a plurality of locations of a surface of a specimen, first and second light receiving units configured to detect an amount of laser light reflected from the surface of the specimen, a spatial filter configured to eliminate out-of-focus light from light beams reflected from the surface of the specimen and to detect an amount of in-focus light, and a control unit configured to generate a control signal used to carry out focus adjustment of the optical microscope using a plurality of light-amount information detected by the first and second light receiving units and the spatial filter.

Подробнее
Номер записи: 58
28-03-2013 дата публикации

APPLYING EDGE-ON PHOTOLUMINESCENCE TO MEASURE BULK IMPURITIES OF SEMICONDUCTOR MATERIALS

Номер: US20130075627A1
Автор: Hadd John W., Kreszowski Doug
Принадлежит: HEMLOCK SEMICONDUCTOR CORPORATION

Provided are photoluminescence spectroscopy systems and methods for identifying and quantifying impurities in a semiconductor sample. In some embodiments, the systems and methods comprise a defocused collimated laser beam illuminating a first sample surface, and collection by a collection lens of photoluminescence from a sample edge at the intersection of the first surface with a substantially orthogonal second surface, wherein the first sample surface is oriented from about 0° to 90° with respect to a position parallel to the collection lens. 136.-. (canceled)37. A photoluminescence spectroscopy system for identifying and quantifying impurities in one or more semiconductor samples , each comprising a first surface , a substantially orthogonal second surface , and an edge at the intersection of the first and second surfaces adapted to allow collection of photoluminescence emitted therefrom , the photoluminescence spectroscopy system comprising:a laser system adapted to provide a defocused laser beam capable of causing an illuminated semiconductor to photoluminesce; anda collection lens having a lens focal point at the edge of the one or more semiconductor samples positioned for analysis, the lens adapted to collect emitted photoluminescence from said focal point;wherein the system is configured such that when the one or more semiconductor samples is positioned for analysis, its first surface is oriented to be at an angle of deviation of greater than 0° and less than or equal to 90° with respect to a position parallel to the collection lens, andwherein the first surface is adapted to be at least partially illuminated by the defocused laser beam.38. A photoluminescence spectroscopy system according to claim 37 , wherein the defocused laser beam is a defocused collimated laser beam.39. A photoluminescence spectroscopy system according to claim 38 , wherein the laser system comprises a defocusing system comprising a first lens that collects and focuses a collimated ...

Подробнее
Номер записи: 59
28-03-2013 дата публикации

Substrate surface defect inspection method and inspection device

Номер: US20130077092A1
Автор: Hideaki Sasazawa, Kiyotaka HORIE, Shigeru Serikawa, Yu YANAKA
Принадлежит: Hitachi High Technologies Corp

A substrate surface inspection device includes an inspection optical system irradiating at least one light onto a substrate, which is an inspection target and carried on a turnable stage, and having at least one detector detecting reflected or scattered light from the substrate, a detector processing the signals, which are outputted from the at least one detector and A/D converted, and detecting a defect on the substrate, an output calculator performing scattered light simulation on a defect detection model and estimating a plurality of detector outputs; and a classifier constructor constructing a classifier by mechanical learning of a rule base, wherein the classifier constructor is adapted to present collection of a necessary actual defect sample on the basis of the classifier obtained by scattered light simulation, and construct the classifier under necessary and sufficient conditions.

Подробнее
Номер записи: 60
28-03-2013 дата публикации

Nanoparticle enhanced multi-modal fluid condition sensor platform and system therefor

Номер: US20130080085A1
Автор: Brian Von Herzen, Steven Van Fleet
Принадлежит: MASTINC

This invention encompasses embodiments for multi-modal integrated simultaneous measurement of various aspects of fluids contained in circulating systems such as automotive reciprocating engines and vehicle transmissions. These circulating systems perform constant internal lubrication, and heat and contaminant removal to protect the internal moving parts from the inherent friction and damage in normal operation. Most commonly this is achieved with fluids based on hydrocarbon and/or related synthetics, which, over time, can lose their protective properties, and vary in their performance or breakdown/decay due to internal and external events. Several components within the lubricant fluid can be measured and can provide insight into the efficacy of the system to perform its designed mission. Described herein is a real-time, simultaneous, integrated, multi-modal sensor system for early warning notification that can be further enhanced using specifically designed nanoparticles that can be introduced into the system, engineered to specifically bind with the contaminants and/or undergo an irreversible state change upon certain experienced conditions to both increase the detectability as well as provide for a framework to improve filter performance.

Подробнее
Номер записи: 61
04-04-2013 дата публикации

High Throughput Thin Film Characterization And Defect Detection

Номер: US20130083320A1
Автор: Jun-Jie (Julien) Ye, Leonid Poslavsky, Philip D. Flanner, III, Qiang Zhao, Torsten Kaack, XIANG Gao, Zhiming Jiang
Принадлежит: KLA Tencor Corp

Methods and systems for determining band structure characteristics of high-k dielectric films deposited over a substrate based on spectral response data are presented. High throughput spectrometers are utilized to quickly measure semiconductor wafers early in the manufacturing process. Optical dispersion metrics are determined based on the spectral data. Band structure characteristics such as band gap, band edge, and defects are determined based on optical dispersion metric values. In some embodiments a band structure characteristic is determined by curve fitting and interpolation of dispersion metric values. In some other embodiments, band structure characteristics are determined by regression of a selected dispersion model. In some examples, band structure characteristics indicative of band broadening of high-k dielectric films are also determined. The electrical performance of finished wafers is estimated based on the band structure characteristics identified early in the manufacturing process.

Подробнее
Номер записи: 62
04-04-2013 дата публикации

Triggering light grid and method for determining the position of containers

Номер: US20130083330A1
Автор: Bernhard Dünzinger, Helmut Schaffer, Stefan Piana, Thorsten Gut
Принадлежит: KRONES AG

A triggering light grid and a method for registering the position of containers and/or for checking their alignment on a conveyance path. Due to the fact that a plurality of light barriers provided at different height levels with respect to the conveyance path and having light sources that can be activated separately of one another and a shared housing are provided, as is a triggering unit for the generation of control signals on the basis of output signals of the light barriers, different container types can be registered by reprogramming the triggering light grid without mechanical adjustment of the same.

Подробнее
Номер записи: 63
11-04-2013 дата публикации

SUCTION APPARATUS, SEMICONDUCTOR DEVICE OBSERVATION DEVICE, AND SEMICONDUCTOR DEVICE OBSERVATION METHOD

Номер: US20130088714A1
Автор: MATSUURA Hiroyuki, TERADA Hirotoshi
Принадлежит: HAMAMATSU PHOTONICS K.K.

A suction unit includes a main body portion having a first surface on which a semiconductor wafer W is arranged and a second surface opposite to the first surface , and in which a through-hole that penetrates through the first surface and the second surface is formed and a light transmitting portion having a light incident surface and a light emitting surface , and which is fitted to the through-hole . Further, in the first surface , a first suction groove for vacuum sucking the semiconductor wafer W to fix the semiconductor device D to the light incident surface is formed, and in the second surface , a second suction groove for vacuum sucking the solid immersion lens S to fix the solid immersion lens S to the light emitting surface is formed. 1. A suction unit to be used for a semiconductor device observation apparatus for performing observation of a semiconductor device by use of a solid immersion lens , comprising:a main body portion having a first surface on which a semiconductor wafer formed with the semiconductor device is arranged and a second surface that is a surface opposite to the first surface, and in which a through-hole that penetrates through the first surface and the second surface is formed; anda light transmitting portion having a light incident surface onto which light from the semiconductor device is made incident and a light emitting surface from which light made incident from the light incident surface is emitted, and which is fitted to the through-hole so that the light incident surface is exposed to a side of the first surface and the light emitting surface is exposed to a side of the second surface, whereinin the first surface, a first suction groove for vacuum sucking the semiconductor wafer to fix the semiconductor device to the light incident surface is formed, andin the second surface, a second suction groove for vacuum sucking the solid immersion lens to fix the solid immersion lens to the light emitting surface is formed.2. The suction ...

Подробнее
Номер записи: 64
25-04-2013 дата публикации

TIRE SURFACE ANOMALY DETECTION

Номер: US20130099123A1
Автор: De Amicis Gene Edward, Estor Patrice R., Flamont Julien Mattieu, Gramling Frank E., Judd David Andrew, Nicholson Verner Steve, Schober Bradley D., Thomas Anton Felipe
Принадлежит:

A tire surface anomaly detection system and method are disclosed. The system and method are generally based on the principle that a tire surface anomaly will have a different heat transfer rate than that of the uniform mass surrounding the tire surface anomaly. Embodiments of the present disclosure apply thermal energy to the surface of a tire and monitor the infrared energy at the surface of the tire to generate one or more infrared images of the surface of the tire. The infrared images are analyzed by an image processing system to determine and locate thermal gradients on the surface of the tire. The presence of a thermal gradient in the infrared images generally indicates the presence of an anomaly in the surface of the tire. In this manner, the present disclosure provides an objective technique for identifying, locating, and classifying tire surface anomalies. 1. A tire inspection method , comprising:imparting motion to a tire to present a first portion of a tire surface to a thermal energy source;providing thermal energy from the thermal energy source to the first portion of the tire surface;imparting motion to the tire to present the first portion of the tire surface to an infrared detector;detecting infrared energy from the first portion of the tire surface with the infrared detector;generating a first infrared image of the first portion of the tire surface based at least in part on the infrared energy detected from the first portion of the tire surface; andanalyzing the first infrared image with an image processing system to determine the presence of one or more anomalies in the surface of the tire.2. The tire inspection method of claim 1 , wherein providing thermal energy from the thermal energy source comprises heating or cooling the first portion of the tire surface.3. The tire inspection method of claim 1 , wherein imparting motion to the tire comprises continuously rotating an inner surface of the tire over the thermal energy source and the infrared ...

Подробнее
Номер записи: 65
25-04-2013 дата публикации

Inspection apparatus and inspection method

Номер: US20130100446A1
Автор: Hiroyuki YAASHITA, Kei Shimura, Masaaki Ito, Norio Sakaiya
Принадлежит: Hitachi High Technologies Corp

The invention is directed to find a false defect from defect candidates and obtain a threshold with which the false defect can be eliminated by the smallest number of review times. Defect candidates are reviewed and selected as a defect or a false defect. By deleting a defect candidate having a characteristic quantity equal to or less than that of the false defect from a map or displaying it in another sign, the false defect can be determined visually. Since the defect candidate having the characteristic quantity equal to or less than that of the selected false defect is deleted from the map or displayed in another sign, the defect candidates unnecessary to set a threshold are not reviewed. The number of defect candidates to be reviewed can be largely reduced as compared with that in the conventional technique. Further, by repeating the above work, the threshold is automatically calculated, and an inspection result map with the threshold is displayed, so that a re-inspection is unnecessary.

Подробнее
Номер записи: 66
25-04-2013 дата публикации

SURFACE INSPECTION APPARATUS AND SURFACE INSPECTION METHOD

Номер: US20130100448A1
Автор: FUKAZAWA Kazuhiko, KOMATSU Koichiro, OOMORI Takeo
Принадлежит: NIKON CORPORATION

A surface inspection apparatus and a surface inspection method aim to securely deal with finer repetition pitch without shortening the wavelength of illumination light. To this end, the apparatus includes a unit illuminating repetitive pattern(s) formed on the substrate surface to be inspected with linearly polarized light, a unit setting to an oblique angle an angle between the direction of an intersecting line of a vibration plane of the linearly polarized light on the substrate surface and the repetition direction of repetitive pattern(s), a unit extracting a polarized light component perpendicular to the vibration plane of the linearly polarized light, from light having been emitted from the repetitive pattern(s) in a specular direction, and a unit detecting a defect of the repetitive pattern(s) according to the light intensity of the polarized light component. 1. A surface inspection apparatus comprising:an illumination unit which illuminates, with linearly polarized light, repetitive pattern(s) formed on a surface of a substrate to be inspected;a setting unit which sets, to an oblique angle, an angle between a direction of a vibration plane of said linearly polarized light on said surface and a repetition direction of said repetitive pattern(s); andan extraction unit which extracts a polarized light component from light that has been emitted from said repetitive pattern(s) in a specular direction, the polalized light component being perpendicular to the vibration plane of said linearly polarized light.2. The surface inspection apparatus according to claim 1 , comprisinga detection unit which detects a defect of said repetitive pattern(s) according to a light intensity of said polarized light component extracted by said extraction unit.3. The surface inspection apparatus according to claim 1 , further comprising:an image formation unit which forms an image of said substrate to be inspected, using light extracted by said extraction unit; anda detection unit ...

Подробнее
Номер записи: 67
02-05-2013 дата публикации

Imprint apparatus, imprint method, imprint system, and device manufacturing method

Номер: US20130106023A1
Автор: Akiko Iimura, Akiyoshi Suzuki
Принадлежит: Canon Inc

A imprint apparatus that brings a pattern formed on a mold into contact with an imprint material supplied to a substrate to transfer the pattern to the imprint material includes an emission unit configured to emit excitation light for causing a luminescent material to emit light, a detection unit configured to detect light, and a mold holding unit configured to hold the mold including the luminescent material, in which, after the pattern is transferred to the imprint material, the emission unit emits the excitation light to the pattern transferred to the imprint material, and the detection unit detects light emitted from the luminescent material remaining in the imprint material.

Подробнее
Номер записи: 68
02-05-2013 дата публикации

Inspecting Method and Inspecting Apparatus For Substrate Surface

Номер: US20130107247A1
Автор: Akira Hamamatsu, Hisae Shibuya, Shigenobu Maruyama, Shunji Maeda, Toshiyuki Nakao, Yoshimasa Oshima, Yuta Urano
Принадлежит: Akira Hamamatsu, Hisae Shibuya, Shigenobu Maruyama, Shunji Maeda, Toshiyuki Nakao, Yoshimasa Oshima, Yuta Urano

An inspecting method and apparatus for inspecting a substrate surface includes illuminating a light to the substrate surface having a film, detection of a scattered light or reflected light from a plurality of positions of the substrate surface to obtain a plurality of electrical signals, comparison of the plurality of electrical signals and a database which indicates a relationship between the electrical signals and surface roughness, and calculation of a surface roughness value based on the result of comparison.

Подробнее
Номер записи: 69
02-05-2013 дата публикации

Container Inspection Apparatus and Method

Номер: US20130107249A1
Автор: George H. Hall, Jr., Stephen M. Graff, Timothy A. Kohler
Принадлежит: Owens Brockway Glass Container Inc

A method of and apparatus for inspecting a container having a base and a mouth. Light is directed through the container base into the container, and out of the container through the container mouth, using at least one light source disposed beneath the container base. A plurality of images of the container mouth is obtained from the light transmitted through the container mouth. Minimum bore diameters of the container mouth are calculated from the plurality of images, and an overall lowest minimum bore diameter (OLMBD) of the minimum bore diameters is identified. A value other than the OLMBD is determined to be an effective minimum bore diameter of the container mouth.

Подробнее
Номер записи: 70
09-05-2013 дата публикации

HIGH RESOLUTION AUTOFOCUS INSPECTION SYSTEM

Номер: US20130113919A1
Автор: Fontaine Jeffrey J., Hofeldt David L., Lai Jack W., Qiao Yi, Reed Steven C., Tarnowski Catherine P.
Принадлежит: 3M INNOVATIVE PROPERTIES COMPANY

An inspection device comprises a camera assembly including an objective lens that captures and collimates light associated with an object being inspected, an image forming lens that forms an image of the object based on the collimated light, and a camera that renders the image. The camera assembly defines a focal point distance from the objective lens that defines a focal point of the camera assembly. The inspection device comprises an optical sensor positioned to detect an actual distance between the objective lens and the object, an actuator that controls positioning of the objective lens to control the actual distance between the objective lens and the object, and a control unit that receives signals from the optical sensor indicative of the actual distance. Control signals from the control unit can control the actuator to adjust the actual distance such that the actual distance substantially equals the focal point distance. 1. An inspection device comprising:a camera assembly including an objective lens that captures and collimates light associated with an object being inspected, an image forming lens that forms an image of the object based on the collimated light, and a camera that renders the image for inspection of the object, wherein the camera assembly defines a focal point distance from the objective lens that defines a focal point of the camera assembly;an optical sensor positioned to detect an actual distance between the objective lens and the object;an actuator that controls positioning of the objective lens to control the actual distance between the objective lens and the object, wherein the image forming lens remains in a fixed location when the actuator moves the objective lens; anda control unit that receives signals from the optical sensor indicative of the actual distance and generates control signals for the actuator to adjust the actual distance such that the actual distance remains substantially equal to the focal point distance.2. The ...

Подробнее
Номер записи: 71
09-05-2013 дата публикации

Inspection apparatus and inspection method

Номер: US20130114081A1
Автор: Kazuhiko Fukazawa
Принадлежит: Nikon Corp

There is provided an inspection apparatus, including: an illumination section configured to irradiate a pattern, a detection section configured to detect a reflected light from the pattern, and a calculation section configured to compare a first change and a second change to calculate a deviation between the first and second changes. The first change which is a change, of a detection result of a pattern formed by a plurality of first exposure conditions, with respect to the first exposure conditions. The second change which is a change, of a detection result of a reflected light, from a pattern, generated by irradiating the pattern with the illumination light. The pattern is formed by a plurality of second exposure conditions each having a predetermined interval in a range which has at least one part overlapping with a range of the first exposure conditions, with respect to the second exposure conditions.

Подробнее
Номер записи: 72
09-05-2013 дата публикации

METHOD AND APPARATUS FOR INSPECTING DEFECT

Номер: US20130114880A1
Автор: Matsumoto Shunichi, Taniguchi Atsushi, Ueno Taketo
Принадлежит:

In inspecting a substrate having a transparent oxide film or a metal film formed on a surface thereof by using a dark field type inspection apparatus installing a laser light source, an illuminating beam having a high coherence causes variations in reflection strength due to multiple interferences within the transparent oxide film or an interference of scattered beams due to the surface roughness of the metal film occurs and which leads to degradation in the sensitivity of defect detection. The present invention solves the problem by providing a low-coherence but high-brightness illumination using a highly directive broadband light source, and a system in which the conventional laser light source is simultaneously employed to selectively use the light sources, thereby enabling a highly sensitive inspection according to the condition of a wafer. 1. A defect inspection method , including the steps of:selecting a high-coherent broadband light beam with a desired wavelength among those emitted from a high-coherent broadband light source;forming the selected high-coherent broadband light beam with the desired wavelength in a shape long in one direction;obliquely irradiating the selected high-coherent broadband light beam with the desired wavelength formed in the shape long in one direction onto an inspection target on the surface of which a pattern is formed;blocking a scattered light beam from the pattern formed on the inspection target among reflected scattered light beams from the inspection target onto which the selected high-coherent broadband light beam with the desired wavelength formed in the shape long in one direction is obliquely irradiated;capturing an image of a scattered light beam that has not been blocked among the reflected scattered light beams from the inspection target;generating an inspection image from a signal obtained by the capturing; andprocessing the generated inspection image to extract defects.3. The defect inspection method according to ...

Подробнее
Номер записи: 73
09-05-2013 дата публикации

Method and apparatus for reviewing defects

Номер: US20130114881A1
Автор: Atsushi Miyamoto, Kenji Obara, Minoru Harada, Ryo Nakagaki
Принадлежит: Atsushi Miyamoto, Kenji Obara, Minoru Harada, Ryo Nakagaki

Disclosed is a method for reviewing defects in a large number of samples within a short period of time through the use of a defect review apparatus. To collect defect images steadily and at high throughput, a defect detection method is selected before imaging and set up for each of review target defects in the samples in accordance with the external characteristics of the samples that are calculated from the design information about the samples. The defect images are collected after an imaging sequence is set up for the defect images and reference images in such a manner as to reduce the time required for stage movement in accordance with the defect coordinates of the samples and the selected defect detection method.

Подробнее
Номер записи: 74
09-05-2013 дата публикации

Secondary Target Design for Optical Measurements

Номер: US20130116978A1
Автор: Andrei V. Shchegrov, ByeoungSu Hwang, InKyo KIM, Leonid Poslavsky, Seunghwan Lee, Sungchul Yoo, Thaddeus G. Dziura
Принадлежит: KLA Tencor Corp

The disclosure is directed to improving optical metrology for a sample with complex structural attributes utilizing custom designed secondary targets. At least one parameter of a secondary target may be controlled to improve sensitivity for a selected parameter of a primary target and/or to reduce correlation of the selected parameter with other parameters of the primary target. Parameters for the primary and secondary target may be collected. The parameters may be incorporated into scatterometry model. Simulations utilizing the scatterometry model may be conducted to determine a level of sensitivity or a level of correlation for the selected parameter of the primary target. The controlled parameter of the secondary target may be modified until a selected level of sensitivity or a selected level of correlation is achieved.

Подробнее
Номер записи: 75
16-05-2013 дата публикации

DETECTION SYSTEM AND INSPECTION METHOD FOR BOTTLE SEAM AND EMBOSSING ALIGNMENT

Номер: US20130120746A1
Автор: Buchwald Carsten, SCHORN Wolfgang
Принадлежит: KHS GmbH

“A system for detecting features on a container wall includes an optical assembly comprising a camera, and an illuminating unit having light sources arranged on conductive tracks. Viewed in a vertical direction of the unit, the light sources are in vertical columns to project a strip-shaped beam onto a container-wall region. When viewed axially, the light sources are arranged on the conductive track one above the other without offset. Each column of light sources is actuated to project a light pattern on the container-wall region that can be variably adjusted as a function of surface properties of the container-wall region. The illuminating unit has first and second light source sets in corresponding adjacent vertical columns. Each light source set has one or more light sources. Adjustment is effected by concurrently switching the first and second light source sets between an on-state and an-off state.” 116-. (canceled)17. An apparatus comprising a system for detecting containers that exhibit features arranged on a container wall thereof , said system comprising an optical assembly comprising a camera , and an illuminating unit comprising a plurality of light sources arranged on a plurality of conductive tracks , said light sources , when viewed in a vertical direction of said illuminating unit , being arranged one above the other in vertical columns such that said light sources project a strip-shaped light beam onto a container-wall region of said container wall , said projected strip-shaped light beams being disposed at a distance from one another when viewed in an axial direction of said illuminating unit , wherein said light sources , are , when viewed in axial direction , arranged on said conductive track one above the other without offset , wherein each vertically aligned column of light sources is actuated via a control unit such that said vertically aligned columns project a light pattern onto said container-wall region that can be variably adjusted as a ...

Подробнее
Номер записи: 76
16-05-2013 дата публикации

Transparent object detection system and transparent flat plate detection system

Номер: US20130123985A1
Автор: Hideaki Hirai, Masanori Kobayashi, Shin Aoki, Xue Li
Принадлежит: Ricoh Co Ltd

A disclosed transparent body detection system includes an image acquisition unit acquiring a vertical polarization image and a horizontal polarization image by acquiring an image of a first region, the image including a transparent body having characteristics in which a polarization direction of transmission light changes; a placing table on which the transparent body is to be placed; a polarization filter disposed opposite to the image acquisition unit across the placing table and at a position including a second region, an image of the second region including at least the transparent body in the first region and being acquired; and an image processing apparatus detecting the transparent body based on distribution of vertical/lateral polarization degree of a vertical/lateral polarization degree image based on the vertical polarization image and the horizontal polarization image.

Подробнее
Номер записи: 77
30-05-2013 дата публикации

SAMPLE OBSERVATION APPARATUS AND METHOD OF MARKING

Номер: US20130134308A1
Автор: ENDO Fumiaki, YAESHIMA Kaori
Принадлежит: HITACHI HIGH-TECHNOLOGIES CORPORATION

If an indentation mark is put in the vicinity of a defect under constant conditions regardless of the film type of samples, surroundings of the mark become cracked or the mark may be too small to view, thus causing the problem of difficulty in viewing the mark or the defect. Another problem is that in a patterned wafer, an indentation mark is coincidentally put on a film not suited for marking. To solve such problems, an elemental analysis is conducted of a position to be marked and, on the basis of the analysis results, such indentation marking conditions as the pressing load, descending rate, and marking depth of an indenter are varied to perform marking suited for a film type. If the film type of the location to be marked cannot be concluded to be a registered film type, marking under wrong conditions is prevented by switching to manual setting. It is also possible to avoid putting marks on a material if the material is not suited for marking. 2. The sample observation apparatus according to claim 1 , wherein the marking conditions are determined by referring to the information on the basis of the elemental analysis results with respect to the surroundings of the defect position.3. The sample observation apparatus according to claim 2 , wherein the marking conditions include the pressing load of the indenter.4. The sample observation apparatus according to claim 1 , wherein the positions to be marked are changed on the basis of the elemental analysis results with respect to the surroundings of the defect position.5. The sample observation apparatus according to claim 1 , wherein the attachment of marks is stopped if the elemental analysis results with respect to the surroundings of the defect position do not correspond to any of pre-registered materials.6. The sample observation apparatus according to claim 1 , wherein if the elemental analysis results with respect to the surroundings of the defect position do not correspond to any of pre-registered materials ...

Подробнее
Номер записи: 78
06-06-2013 дата публикации

Detecting surface stains using high absorbance spectral regions in the mid-ir

Номер: US20130140462A1
Автор: Heather Brooke, Jessica N. Mccutcheon, Megan R. Pearl, Michael L. Myrick, Stephen L. Morgan
Принадлежит: UNIVERSITY OF SOUTH CAROLINA

Methods and systems for detecting the presence of a substance on a surface are provided. The method can include directing a modulated light beam (e.g., having a wavelength of about 3 to about 20 μm) from a light source to a beam expander such that the beam expander widens the diameter of the light beam into an expanded beam. The expanded beam can then be directed onto the surface to form an illuminated area. A specular reflection can then be detected from the illuminated area on the surface in each light cycle, and the presence of the substance on the surface can be determined.

Подробнее
Номер записи: 79
06-06-2013 дата публикации

Detecting heat capacity changes due to surface inconsistencies using high absorbance spectral regions in the mid-ir

Номер: US20130140463A1
Автор: Heather Brooke, Jessica N. Mccutcheon, Megan R. Pearl, Michael L. Myrick, Stephen L. Morgan
Принадлежит: UNIVERSITY OF SOUTH CAROLINA

Methods and systems for detecting the presence of an inconsistency in or on a surface are generally provided. The method can include directing a modulated light beam (e.g., having a wavelength of about 3 μm to about 20 μm) from a light source to a mirror. The mirror then directs a reflected light beam onto the surface (e.g., directly onto the surface or indirectly onto the surface via a additional mirror(s)). The mirror is controlled to scan the reflected light beam across the surface. A specular reflection from the surface can then be detected in each light cycle, and the presence of the inconsistency on the surface can be detected.

Подробнее
Номер записи: 80
06-06-2013 дата публикации

SYSTEM AND METHOD FOR ANALYZING PORE SIZES OF SUBSTRATES

Номер: US20130141722A1
Автор: Broomall Charles F., Wood Stewart P.
Принадлежит: Dow Global Technologies LLC

A system for analyzing the pore size of a substrate or device containing substrates adapted to separate fluids and has at least two surfaces, a first and a second surface, which are isolated from, one another and wherein the substrate or devices containing the substrates have an exit for fluids passing through the substrate, comprising: a) a particle generator () capable of generating particles of a controlled size; b) a system () for creating a pressure differential between the first and the second surface of the substrate; c) a light source () spaced front the exit of the substrate or device containing the substrate adapted for illuminating particles exiting the exit of the substrate or device containing the substrate; d) a closed flow path from the particle generator to the first surface of the substrate; e) a substrate or device holder () adapted for holding the substrate or device in the proper location in the system; and f) one or more reference images. Also described are methods of utilizing the system to identify pore sizes of substrates. 2. A system according to further comprising g) one or more light sensors located in the enclosure adapted to sense the intensity of the scattered light.3. A system according to or wherein the sensors are one or more photodiodes claim 1 , photomultipliers or cameras.4. A system according to any one of to wherein the light source provides highly directional light and forms a thin sheet of light.5. A system according to any one of to wherein the light source is a laser.6. A system according to any one of to wherein the light sensor is attached to the enclosure on the side disposed toward the substrate or the exit of the device containing the substrate.7. A system according to any one of to which further comprises a computer interface wherein the comparison of the image of the light scattered by the particles exiting the substrate or the exit of the device containing the substrate to the one or more reference images is ...

Подробнее
Номер записи: 81
13-06-2013 дата публикации

Method and apparatus for qualifying optics of a projection exposure tool for microlithography

Номер: US20130148105A1
Автор: Markus Goeppert
Принадлежит: CARL ZEISS SMT GMBH

A method for qualifying optics ( 16; 14, 16 ) of a projection exposure tool ( 10 ) for microlithography. The optics include ( 16; 14, 16 ) at least one mirror element ( 14 - 1 to 14 - 7, 16 - 1 to 16 - 6 ) with a reflective coating ( 52 ) disposed on the latter. The method includes: irradiating electromagnetic radiation ( 13, 42 ) of at least two different wavelengths onto the optics ( 16; 14, 16 ), a penetration depth of the radiation into the coating ( 52 ) of the mirror element varying between the individual wavelengths, taking an optical measurement on the optics ( 16; 14, 16 ) for each of the wavelengths, and evaluating the measurement results for the different wavelengths taking into consideration a respective penetration depth of the radiation into the coating ( 52 ) of the mirror element for each of the different wavelengths.

Подробнее
Номер записи: 82
13-06-2013 дата публикации

METHOD AND SYSTEM FOR DETECTING FIBER FAULT IN PASSIVE OPTICAL NETWORK

Номер: US20130148109A1
Автор: Bei Jinsong, Lu Jianxin, SU Jie, Xu Jidong
Принадлежит:

The disclosure provides a method and a system for detecting a fiber fault in a Passive Optical Network (PON). The system comprises an optical path detection device, a Wavelength Division Multiplexing (WDM) coupler, a wavelength selection coupler, a branch fiber selector and a wavelength selection router. The detection system is attached to an original PON system, without influencing the operation of the original system while performing the detection. With the disclosure, the problem of being unable to determine whether there is a fault in a branch fiber due to the loss of an optical path detection reflection signal is solved, the branch fiber with a fault can be quickly located and fixed, thus the operational and maintenance costs of an operator are reduced. 1. A system for detecting a fiber fault in a Passive Optical Network (PON) , comprising:an Optical Time Domain Reflectometer (OTDR), which is configured to transmit an optical path detection signal of which a wavelength corresponds to a branch fiber, receive an optical path detection reflection signal, and determine whether there is a fault in a trunk fiber or in the branch fiber according to a state of the optical path detection reflection signal;a Wavelength Division Multiplexing (WDM) coupler, which is configured to import the optical path detection signal onto the trunk fiber and transmit the optical path detection reflection signal transmitted by the trunk fiber to the OTDR;a wavelength selection coupler, which is configured to transmit the optical path detection signal which is on the trunk fiber to a branch fiber selector and import the optical path detection reflection signal, which is received from the branch fiber selector, back onto the trunk fiber;the branch fiber selector, which is configured to transmit the optical path detection signal to a corresponding wavelength selection router and transmit the optical path detection reflection signal, which is transmitted from the wavelength selection router, ...

Подробнее
Номер записи: 83
13-06-2013 дата публикации

Electron-Bombarded Charge-Coupled Device And Inspection Systems Using EBCCD Detectors

Номер: US20130148112A1
Автор: Brown David L., Chuang Yung-Ho Alex, Fielden John, Liu Xuefeng
Принадлежит: KLA-TENCOR CORPORATION

A focusing EBCCD includes a control device positioned between a photocathode and a CCD. The control device has a plurality of holes therein, wherein the plurality of holes are formed perpendicular to a surface of the photocathode, and wherein a pattern of the plurality of holes is aligned with a pattern of pixels in the CCD. Each hole is surrounded by at least one first electrode, which is formed on a surface of the control device facing the photocathode. The control device may include a plurality of ridges between the holes. The control device may be separated from the photocathode by approximately half a shorter dimension of a CCD pixel or less. A plurality of first electrodes may be provided, wherein each first electrode surrounds a given hole and is separated from the given hole by a gap. 1. An electron-bombarded charge-coupled device (EBCCD) comprising:an assembly including a window;a photocathode inside the assembly and adjacent to the window;a CCD device inside the assembly and positioned to collect electrons emitted from the photocathode; anda control device positioned between the photocathode and the CCD, the control device having a plurality of holes therein, wherein the plurality of holes are formed perpendicular to a surface of the photocathode, and wherein a pattern of the plurality of holes is aligned with a pattern of pixels in the CCD, each hole being surrounded by at least one first electrode formed on a surface of the control device facing the photocathode.2. The EBCCD of claim 1 , wherein the CCD has a boron coating on its surface facing the at least one first electrode.3. The EBCCD of claim 1 , wherein the CCD comprises a back-thinned CCD.4. The EBCCD of claim 1 , wherein the CCD comprises a time-delay integration CCD.5. The EBCCD of claim 1 , wherein an exterior surface of the window includes an anti-reflective coating.6. The EBCCD of claim 1 , wherein the control device comprises a silicon structure.7. The EBCCD of claim 1 , wherein the control ...

Подробнее
Номер записи: 84
13-06-2013 дата публикации

INSPECTION SYSTEM, INSPECTION METHOD, AND PROGRAM

Номер: US20130148116A1
Автор: Tanaka Kazumasa
Принадлежит: HITACHI HIGH-TECHNOLOGIES CORPORATION

Setting a spatial filter requires repeatedly confirming a scan image through visual inspection by an operator and adjusting the spatial filter. A setting state is also dependent on the operator. Therefore, in the present invention, a scattered light image (beam image) and a diffracted light image (Fourier image) are simultaneously observed, and an intensity profile of the scattered light image (beam image) and an intensity profile of the diffracted light image (Fourier image) are simultaneously monitored. A field of view of a diffracted light image is scanned with only one spatial filter, and a state change with respect to the intensity profiles in the absence of insertion of the spatial filter is detected. A setting condition for a spatial filter is determined on the basis of the detected state change. 1. An inspection system for inspecting a surface of an item to be inspected , the inspection apparatus comprising:an irradiation unit that irradiates inspection light onto the item to be inspected;a scattered light observation unit that observes an image of scattered light produced at or near the surface of the item to be inspected;a diffracted light observation unit that observes an image of diffracted light as the Fourier transform of the scattered light produced at or near the surface of the item to be inspected;a spatial filter unit that blocks some of the diffracted light;a detection unit that detects the intensity and position of the scattered light produced at or near the surface of the item to be inspected;a stage unit that can be moved at a variable speed with the item to be inspected mounted thereon;a processing unit that processes information detected by the detection unit;a display unit that displays the information processed by the processing unit; anda spatial filter setting unit that observes an intensity profile of the scattered light image and an intensity profile of the diffracted light image simultaneously, and determines a setting condition for a ...

Подробнее
Номер записи: 85
20-06-2013 дата публикации

METHOD AND DEVICE FOR INSPECTING FOR DEFECTS

Номер: US20130155400A1
Автор: Honda Toshifumi, Nakao Toshiyuki, Nakata Toshihiko, Shibata Yukihiro, Shimizu Yuki, Urano Yuta, Xu Junguo
Принадлежит:

A defect inspecting method is provided which comprises a pre-scan defect inspecting process including a pre-scan irradiating step for casting irradiation light onto the surface of a sample, a pre-scan detecting step for detecting the scattered lights, and a pre-scan defect information collecting step for obtaining information on preselected defects present on the sample surface on the basis of the scattered lights; a near-field defect inspecting process including a near-field irradiating step in which the distance between the sample surface and a near-field head is adjusted so that the sample surface is irradiated, a near-field detecting step for detecting near-field light response, and a near-field defect information collecting step for obtaining information on the preselected defects on the basis of the near-field light response; and a merging process for inspecting defects present on the sample surface by merging the pieces of information on the preselected defects. 1. A defect inspecting method comprising: a pre-scan irradiating step for casting irradiation light onto the surface of a sample,', 'a pre-scan detecting step for detecting the scattered lights emanating from the area of the sample surface irradiated in the pre-scan irradiating step, and', 'a pre-scan defect information collecting step for obtaining information on preselected defects present on the sample surface on the basis of the scattered lights detected in the pre-scan detecting step;, 'a pre-scan defect inspecting process including a near-field irradiating step in which the distance between the sample surface and a near-field head is adjusted on the basis of the information on the preselected defects obtained in the pre-scan defect information collecting step so that the irradiation of the sample surface is started from the position where the near-field head has been adjusted,', 'a near-field detecting step for detecting near-field light response generated from that area on the sample surface ...

Подробнее
Номер записи: 86
20-06-2013 дата публикации

Method for determining the active doping concentration of a doped semiconductor region

Номер: US20130155409A1
Автор: Janusz Bogdanowicz, Trudo Clarysse, Wilfried Vandervorst
Принадлежит: Interuniversitair Microelektronica Centrum vzw IMEC, Katholieke Universiteit Leuven

A method and system for optically determining a substantially fully activated doping profile are disclosed. The substantially fully activated doping profile is characterized by a set of physical parameters. In one aspect, the method includes obtaining a sample comprising a fully activated doping profile and a reference, and obtaining photomodulated reflectance (PMOR) offset curve measurement data and DC reflectance measurement data for the sample including the fully activated doping profile and for the reference. The method also includes determining values for the set of physical parameters of the doping profile based on both the photomodulated reflectance offset curve measurements and the DC reflectance measurements.

Подробнее
Номер записи: 87
20-06-2013 дата публикации

METHOD AND APPARATUS FOR ANALYZING AND/OR REPAIRING OF AN EUV MASK DEFECT

Номер: US20130156939A1
Автор: Bret Tristan, Budach Michael, Edinger Klaus, FELDMANN Heiko, Hofmann Thorsten, RUOFF Johannes
Принадлежит:

The invention relates to a method for analyzing a defect of a photolithographic mask for an extreme ultraviolet (EUV) wavelength range (EUV mask) comprising the steps of: (a) generating at least one focus stack relating to the defect using an EUV mask inspection tool, (b) determining a surface configuration of the EUV mask at a position of the defect, (c) providing model structures having the determined surface configuration which have different phase errors and generating the respective focus stacks, and (d) determining a three dimensional error structure of the EUV mask defect by comparing the at least one generated focus stack of the defect and the generated focus stacks of the model structures. 1. A method for analyzing a defect of a photolithographic mask for an extreme ultraviolet (EUV) wavelength range (EUV mask) , the method comprising:a. generating at least one focus stack relating to the defect using an EUV mask inspection tool;b. determining a surface configuration of the EUV mask at a position of the defect;c. providing model structures having the determined surface configuration which have different phase errors and generating the respective focus stacks; andd. determining a three dimensional error structure of the EUV mask defect by comparing the at least one generated focus stack of the defect and the generated focus stacks of the model structures.2. The method of claim 1 , further comprising applying different repairing methods to the three dimensional error structure and simulating respective focus stacks in order to determine an optimal repairing method.3. The method of claim 2 , further comprising applying the optimal repairing method to the defective position.4. The method of claim 1 , wherein the model structures comprise an absorbing pattern structure on a surface of the EUV mask.5. The method of claim 4 , further comprising providing the absorbing pattern structure from EUV mask design data and/or from a recording of at least one image.6. The ...

Подробнее
Номер записи: 88
20-06-2013 дата публикации

METHODS AND SYSTEMS FOR INSPECTING BONDED WAFERS

Номер: US20130157391A1
Автор: Estermann Markus, Kappel Christoph, Kharrazian Reza, Markwort Lars
Принадлежит: Nanda Technologies GmbH

A method of inspecting a bonded wafer arrangement comprises: 1. A method of inspecting a bonded wafer arrangement ,wherein the bonded wafer arrangement includes plural layers of a semiconductor wafer and at least one of an adhesive layer and a substrate attached to the semiconductor wafer, and wherein the method comprises:directing measuring radiation onto the bonded wafer arrangement;imaging at least a portion of the bonded wafer arrangement onto a detector using the measuring radiation having emerging from the bonded wafer arrangement, wherein an object side numerical aperture of the imaging is less than 0.05; andsimultaneously detecting, using the detector, at least a portion of the measuring radiation emerging from the bonded wafer arrangement at a multitude of different spaced apart locations within the field of view;wherein the detected radiation has an intensity spectrum such that an intensity of the detected radiation having wavelengths less than 700 nm is less than 10% of a total intensity of the detected radiation and an intensity of the detected radiation having wavelengths greater than 1200 nm is less than 10% of the total intensity of the detected radiation.2. The method according to claim 1 , wherein the simultaneously detecting comprises detecting the measuring radiation having traversed the bonded wafer arrangement at locations spaced apart by more than 100 mm.3. The method according to claim 1 , wherein orientations of chief rays of the detected radiation used for imaging vary by less than 6° across the portion of the bonded wafer arrangement imaged onto the detector.4. The method according to claim 1 , wherein the bonded wafer arrangement has a front face and a back face claim 1 , wherein the measuring light is directed onto the front face and wherein the measuring radiation used for the imaging emanates from the front face.5. The method according to claim 4 , further comprising reflecting measuring radiation having traversed the bonded wafer ...

Подробнее
Номер записи: 89
27-06-2013 дата публикации

Method and apparatus for inspecting ophthalmic lens

Номер: US20130162984A1
Автор: Soon Wei Wong, Tian Poh Yew, Victor Vertoprakhov
Принадлежит: VISIONXTREME PTE LTD

An embodiment of a system and a method for inspecting a contact lens is provided. The illumination system illuminates the center zone and the peripheral zone of the contact lens when it is inside a cavity between a male mold and a female mold. The imaging optical system has two channels to capture two images or a composite single image to inspect the entire contact lens. The imaging optical system of the first channel has its entrance pupil far away from the mold tool. The camera of the first channel is used to capture the image of the center zone of the contact lens. The image optical system of the second channel is located outside the mold tool but its entrance pupil is located inside the mold tool or outside but substantially close to it. This enables the camera of the second channel to capture the image of the peripheral zone of the contact lens.

Подробнее
Номер записи: 90
27-06-2013 дата публикации

DEVICE AND METHOD FOR DETECTION OF DEFECTS IN VITREOUS BODIES

Номер: US20130162986A1
Автор: Bernhardt Rainer, Groeschke Jasmin, Juhnke Hanno, Kibat Paul-Gerhard, Scharf Matthias, Schrack Michael, Spengler Jan-Peter
Принадлежит: SANOFI-AVENTIS DEUTSCHLAND GMBH

The invention relates to a device for detection of glass container defects comprising a cold light source for emitting a light spectrum with limited infrared portion and optical means for directing the cold light through one or more glass containers to be observed. 114-. (canceled)15. Device for detection of defects of a vitreous body comprising:a cold light source for emitting a cold light;optical means for directing the cold light to at least one vitreous body along a light line, wherein a view line for visually detecting a defect of the vitreous body extends in longitudinal direction of the vitreous body,variation means for modifying the direction of the light line of the cold light, such that a detection angle between the view line and the light line is larger than 60° and smaller than 180°.16. Device according to characterised in that the variation means is adapted to vary the detection angle between 120° and 60°.17. Device according to claim 15 , wherein the variation means is adapted to vary the detection angle between 105° and 75°.18. Device according to claim 15 , wherein the vitreous body comprises a cylindrically shaped container claim 15 , wherein the view line extends substantially parallel to the axial direction of the container.19. Device according to claim 15 , further comprising a handling means adapted to rotate the at least one vitreous body around an axis defined by the view line.20. Device according to characterised in that the handling means is a mass tray for multiple vitreous bodies.21. Device according to claim 15 , characterised in that the variation means is configured to provide a detection angle of 90° in a starting configuration.22. Device according to claim 15 , characterised in that the variation means comprises at least one mirror and/or at least one lens.23. Device according to claim 21 , characterised in that the variation means comprises two rotating mirrors.24. Method for detecting defects in a vitreous body comprising the ...

Подробнее
Номер записи: 91
11-07-2013 дата публикации

Air Pocket Detection Methods and Systems

Номер: US20130176454A1
Автор: John F. Valley
Принадлежит: SunEdison Inc

Methods and systems for use in detecting an air pocket in a single crystal material are described. One example method includes providing a matrix including a plurality of data units, the plurality of data units including image data related to a region of interest of the single crystal material; determining, by a processor, a difference between data units of the matrix and a corresponding data unit of the matrix, wherein the corresponding data unit is defined by a first operation of the matrix; calculating, by the processor, a first index value based on the differences of the corresponding data units; and identifying an air pocket within the single crystal material based on the first index value and a predetermined threshold.

Подробнее
Номер записи: 92
11-07-2013 дата публикации

INTERPOSER BASED IMAGING SENSOR FOR HIGH-SPEED IMAGE ACQUISITION AND INSPECTION SYSTEMS

Номер: US20130176552A1
Автор: Brown David L., Chuang Yung-Ho, IYER VENKATRAMAN, Zheng Guowu
Принадлежит: KLA-TENCOR CORPORATION

The present invention includes an interposer disposed on a surface of a substrate, a light sensing array sensor disposed on the interposer, the light sensing array sensor being back-thinned and configured for back illumination, the light sensing array sensor including columns of pixels, one or more amplification circuitry elements configured to amplify an output of the light sensing array sensor, the amplification circuits being operatively connected to the interposer, one or more analog-to-digital conversion circuitry elements configured to convert an output of the light sensing array sensor to a digital signal, the ADC circuitry elements being operatively connected to the interposer, one or more driver circuitry elements configured to drive a clock or control signal of the array sensor, the interposer configured to electrically couple at least two of the light sensing array sensor, the amplification circuits, the conversion circuits, the driver circuits, or one or more additional circuits. 1. An interposer-based image sensing device , comprising:at least one interposer disposed on a surface of a substrate;at least one sensing array sensor disposed on the at least one interposer, the at least one light sensing array sensor being back-thinned, the at least one light sensing array sensor configured for back illumination, the at least one light sensing array sensor including a plurality of columns of pixels;at least one amplification circuitry element configured to amplify an output of the at least one light sensing array sensor, the at least one amplification circuit being operatively connected to the interposer;at least one analog-to-digital conversion circuitry element configured to convert an output of the at least one light sensing array sensor to a digital signal, the at least one analog-to-digital conversion circuits being operatively connected to the interposer;at least one driver circuitry element configured to drive at least one of a clock signal or control ...

Подробнее
Номер записи: 93
11-07-2013 дата публикации

LUMINOUS FLUX BRANCHING ELEMENT AND MASK DEFECT INSPECTION APPARATUS

Номер: US20130176559A1
Автор: NAGAHAMA Hiroyuki, Nakamura Tomohiro, Ogawa Riki
Принадлежит: NuFlare Technology, Inc.

A luminous flux branching element includes a transparent base member arranged diagonally to an optical axis and having an incidence plane and an emission plane parallel to each other. Incident light from the incidence plane is split into a main luminous flux emitted from an emission position on the emission plane and a branched luminous flux emitted from a branch position apart from the emission position and having a smaller light quantity than of the main luminous flux. A reflecting member is arranged on the incidence plane to cause the incidence plane to reflect reflected light from the emission plane. A non-coat region in which antireflection-treatment is not performed is formed in a region of the emission plane where the incident light from the incidence plane is reached, and antireflection-treatment is performed in the emission plane excluding the non-coat region and the incidence plane. 1. A luminous flux branching element , comprisinga transparent base member, arranged diagonally to an optical axis, having a plane of incidence and a plane of emission parallel to each other,wherein incident light from the plane of incidence is split into a main luminous flux emitted from an emission position on the plane of emission and a branched luminous flux emitted from a branch position apart from the emission position of which has quantity smaller than that of the main luminous flux, further comprising:a reflecting member arranged on the plane of incidence to cause the plane of incidence to reflect reflected light from the plane of emission,wherein a non-coat region in which antireflection-treated is not performed is formed in a region of the plane of emission where the incident light from the plane of incidence is reached, andantireflection-treated is performed in the plane of emission excluding the non-coat region and the plane of incidence.2. The element according to claim 1 , further comprising a light blocking member arranged on a portion of the plane of incidence ...

Подробнее
Номер записи: 94
18-07-2013 дата публикации

METHOD AND APPARATUS FOR FILTER CONDITION INSPECTION

Номер: US20130181134A1
Автор: Forster Peter Ivan
Принадлежит: CERAMEX LTD.

A method of inspecting a ceramic wall-flow filter () for a vehicle exhaust system includes the steps of: a) providing a source () of heat energy suitable for heating material within the filter (); b) applying heat energy from the source () to a first end () of the filter () to heat material within the filter; c) detecting infrared radiation () which has been emitted by heated material in the filter using a radiation detector () at the second end () of the filter () to form an image () of a pattern of emitted radiation, the pattern of emitted radiation providing an indication of the condition of the filter (). Another aspect of the invention provides apparatus for use in the method. 1. A method of inspecting a ceramic wall-flow filter for a vehicle exhaust system , the filter having a first end and a second end; the method including the steps of:a) providing a source of heat energy suitable for heating material within the filter;b) applying heat energy from the source to the first end of the filter to heat material within the filter;c) detecting infrared radiation which has been emitted by heated material in the filter using a radiation detector at the second end of the filter to form an image of a pattern of emitted radiation, the pattern of emitted radiation providing an indication of the condition of the filter.2. A method according to claim 1 , wherein the heat energy applied to the first end of the filter is substantially not transmitted through the second end.3. A method according to or claim 1 , wherein the step of forming an image is carried out at a plurality of time intervals claim 1 , producing a plurality of images.4. A method according to claim 3 , wherein the plurality of images is obtained during a period of from 5 to 300 seconds claim 3 , preferably 15 to 60 seconds from the application of the heat energy to the first end of the filter.5. A method according to any preceding claim claim 3 , further comprising the steps of ceasing to apply the heat ...

Подробнее
Номер записи: 95
25-07-2013 дата публикации

System and method for object measurement

Номер: US20130188042A1
Автор: Denisa Narmour Borges, Glen William Brooksby, Paulo Ricardo dos Santos Mendonça
Принадлежит: General Electric Co

A technique is provided for measuring an object based on multiple views. The technique includes registering each of the plurality of images and a first model of the object with one another and reconstructing a second model of the object based on the plurality of images and the first model registered with one another.

Подробнее
Номер записи: 96
25-07-2013 дата публикации

DEFECT INSPECTING APPARATUS AND DEFECT INSPECTING METHOD

Номер: US20130188184A1
Автор: Matsumoto Shunichi, Shibata Yukihiro, Taniguchi Atsushi, Ueno Taketo
Принадлежит:

A defect inspecting apparatus includes an irradiation optical system having a light source that emits illumination light and a polarization generation part that adjusts polarization state of the illumination light emitted from the light source, a detection optical system having a polarization analysis part that adjusts polarization state of scattered light from a sample irradiated by the irradiation optical system and a detection part that detects the scattered light adjusted by the polarization analysis part, and a signal processing system that processes the scattered light detected by the detection optical system to detect a defect presenting in the sample. The polarization generation part adjusts the polarization state of the illumination light emitted from the light source on the basis of predetermined illumination conditions and the polarization analysis part adjusts the polarization state of the illumination light emitted from the light source on the basis of predetermined detection conditions. 1. A defect inspecting apparatus comprising:an irradiation optical system including a light source to emit illumination light and a polarization generation part to adjust polarization state of the illumination light emitted from the light source;a detection optical system including a polarization analysis part to adjust polarization state of scattered light from a sample irradiated by the irradiation optical system and a detection part to detect the scattered light adjusted by the polarization analysis part; anda signal processing system to process the scattered light detected by the detection optical system to detect a defect presenting in the sample;the polarization generation part adjusting the polarization state of the illumination light emitted from the light source on the basis of predetermined illumination conditions;the polarization analysis part adjusting the polarization state of the illumination light emitted from the light source on the basis of ...

Подробнее
Номер записи: 97
25-07-2013 дата публикации

Microscope and inspection apparatus

Номер: US20130188251A1
Автор: Haruhiko Kusunose, Takao Tsubouchi
Принадлежит: Lasertec Corp

A system including a microscope and an inspection apparatus in which an objective lens having a large numerical aperture is used for detecting a defect existing inside a sample. A light source apparatus produces linearly polarized light. The polarization maintaining fibers optically coupled to the light source apparatus project the linearly polarized light onto the sample surface as an illumination beam of P-polarized light at an incidence angle substantially equal to the Brewster's angle of the sample. The scattered light generated by the defect existing in the sample is emitted from the sample and is collected by the objective lens whose optical axis is perpendicular to the sample surface. Since the illumination beam of P-polarized light is projected at the incidence angle equal to the Brewster's angle of the sample, no surface reflection occurs and it is possible to use the objective lens having a large numerical aperture.

Подробнее
Номер записи: 98
01-08-2013 дата публикации

SUBSTRATE INSPECTION METHOD

Номер: US20130194569A1
Автор: Jeon Jeong-Yul, Kwon Dal-An, Lee Hyun-Ki
Принадлежит: KOH YOUNG TECHNOLOGY INC.

A substrate inspection apparatus for inspecting a substrate, on which a measurement object is formed, is shown. The substrate inspection method includes measuring a substrate, on which a measurement object is formed, generating a plane equation of the substrate, and acquiring a region of the measurement object formed on the substrate. After, by considering a height of measurement object a region of the measurement object is converted into a substrate plane by plane equation,. Then, the measurement object is inspected based on a region of the measurement object converted into a substrate plane by plane equation and a region of the measurement object by reference data. Therefore, an offset value of a measurement object is acquired according to a tilted pose of the substrate, and a distortion of measurement data is compensated by using the offset value, to improve a measurement credibility of a measurement object. 1. A method of inspecting a substrate , comprising:generating a plane equation of a substrate by measuring the substrate, on which a measurement object is formed, with an image-capture part;acquiring a region of the measurement object formed on the measured substrate;converting the region of the measurement object into a substrate plane by the plane equation, by considering a height of the measurement object; andinspecting the measurement object based on the region of the measurement object converted into the substrate plane by the plane equation and a region of the measurement object by a reference data.2. The method of inspecting a substrate of claim 1 , wherein generating a plane equation claim 1 , comprises:generating the plane equation by measuring a distance between an indication marks that are formed on the substrate.3. The method of inspecting a substrate of claim 1 , wherein generating a plane equation claim 1 , comprises:generating the plane equation by measuring the substrate with a laser.4. The method of inspecting a substrate of claim 1 , wherein ...

Подробнее
Номер записи: 99
01-08-2013 дата публикации

INSPECTION APPARATUS

Номер: US20130194579A1
Автор: CHIKAMATSU Shuichi, IMAI Eiji, MOHARA Yukihisa, Nishiyama Hidetoshi, Taniguchi Koichi
Принадлежит:

In a conventional art, vibrations of compositions (for example, a Z-stage, a θ-stage, a wafer chuck, and a detection optical system mounted above a stage linear scale) within a device are not precisely fed back to a coordinate value. 1. An inspection apparatus that inspects a substrate , comprising:a substrate holder that holds the substrate;a travel unit that travels the substrate holder;an irradiation unit that irradiates the substrate with light;a charge storage detector that detects the light from the substrate, and stores electric charges;a measurement unit that measures a change in relative position between the substrate holder and the travel unit; anda processing unit,wherein the charge storage detector stores the electric charges on the basis of a charge transfer signal obtained on the basis of a measurement result from the measurement unit, andwherein the processing unit detects a defect of the substrate with the use of an image generated by storing the electric charge on the basis of the charge transfer signal.2. The inspection apparatus according to claim 1 ,wherein the measurement unit includes a first measurement unit that measures a change in position of the substrate holder.3. The inspection apparatus according to claim 2 ,wherein the first measurement unit includes a first interference optical system, andwherein a reference light and an inspection light of the first interference optical system are parallel to a travel direction of the travel unit.4. The inspection apparatus according to claim 3 ,wherein the first interference optical system is arranged through the travel unit and a frame.5. The inspection apparatus according to claim 3 ,wherein the first interference optical system is located at a distance from the travel unit.6. The inspection apparatus according to claim 1 , comprising an imaging unit that images the light from the substrate on the charge storage detector claim 1 ,wherein the measurement unit includes a second measurement unit that ...

Подробнее
Номер записи: 100