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Небесная энциклопедия

Космические корабли и станции, автоматические КА и методы их проектирования, бортовые комплексы управления, системы и средства жизнеобеспечения, особенности технологии производства ракетно-космических систем

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Мониторинг СМИ

Мониторинг СМИ и социальных сетей. Сканирование интернета, новостных сайтов, специализированных контентных площадок на базе мессенджеров. Гибкие настройки фильтров и первоначальных источников.

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Поддерживает ввод нескольких поисковых фраз (по одной на строку). При поиске обеспечивает поддержку морфологии русского и английского языка
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Применить Всего найдено 3947. Отображено 100.
16-02-2012 дата публикации

Dynamic nano-inscribing for continuous and seamless metal and polymer nanogratings

Номер: US20120038085A1
Автор: Lingjie Jay Guo, Se Hyun Ahn
Принадлежит: University of Michigan

Nanoscale grating structure can be utilized in many practical applications in optics, flat-panel displays and bio-sensors. A Dynamic Nano-Inscribing (Dynamic Nano-Inscribing) technique is disclosed for directly creating large-area, truly continuous nano-grating patterns in a variety of metal or polymer materials with feature size down to sub-50 nm and at very high speed (10 cm/sec). Dynamic Nano-Inscribing is carried out under either ambient temperature or with a brief heating time on the order of ten microseconds, which minimizes damage on UV or thermo-sensitive functional materials.

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Номер записи: 1
08-03-2012 дата публикации

Method and apparatus for sequentially laminating optical film including polarizing film, to rectangular-shaped panel

Номер: US20120055622A1
Автор: Minoru Miyatake, Shusaku Goto, Takashi Kamijo, Takeharu Kitagawa, Takuya Nakazono, Tomohiro Mori
Принадлежит: Nitto Denko Corp

A method of sequentially laminating a carrier film-attached optical film laminate to a rectangular-shaped panel having a long side and a short side, is provided. The optical film laminate includes an optical film including a thin polarizing film, and a carrier film attached to the optical film through an adhesive layer. The method includes the steps: forming a plurality of slits in the carrier film-attached optical film laminate in a width direction thereof at lengthwise given intervals to extend from a surface of the optical film on a side opposite to the carrier film to a depth reaching a surface of the carrier film adjacent to the optical film to thereby form an optical film sheet supported by the carrier film, between lengthwisely adjacent two of the slits; and laminating each of the optical film sheets to a respective one of the panels through the adhesive layer.

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Номер записи: 2
19-04-2012 дата публикации

Embedded vertical optical grating for heterogeneous integration

Номер: US20120092771A1
Автор: Fei Liu, Keith Kwong Hon Wong, Qiqing (Christine) Ouyang
Принадлежит: International Business Machines Corp

An embedded vertical optical grating, a semiconductor device including the embedded vertical optical grating and a method for forming the same. The method for forming the embedded optical grating within a substrate includes depositing a hard mask layer on the substrate, patterning at least one opening within the hard mask layer, vertically etching a plurality of scallops within the substrate corresponding to the at least one opening within the hard mask layer, removing the hard mask layer, and forming an oxide layer within the plurality of scallops to form the embedded vertical optical grating.

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Номер записи: 3
21-06-2012 дата публикации

Method of manufacturing blazed diffractive grating and method of manufacturing mold for manufacturing blazed diffractive grating

Номер: US20120152080A1
Автор: Takashi Sukegawa, Yukinobu OKURA
Принадлежит: Canon Inc

A method of manufacturing a blazed diffractive grating includes a first step of forming a first groove having a first surface and a second surface by moving, in the first direction at a first position in the second direction, a cutting tool having a first cutting blade and a second cutting blade to cut the object; a second step of forming a second groove by moving, in the first direction at a second position separated from the first position in the second direction by a grating pitch, the cutting tool to cut the object; and a third step of forming a blazed surface of the first groove using the first cutting blade by moving, in the first direction at a third position between the first position and the second position, the cutting tool to cut the first surface of the first groove.

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Номер записи: 4
09-08-2012 дата публикации

Organic-inorganic composite resin composition, organic-inorganic composite resin material, optical element, and stacked diffraction optical element

Номер: US20120200925A1
Автор: Hidefumi Iwasa, Hideo Ukuda
Принадлежит: Canon Inc

Provided are an organic-inorganic composite resin composition and an organic-inorganic composite resin material made of a cured product thereof, containing at least an organic compound having a polymerizable functional group, metal oxide fine particles, and a polymerization initiator. The cured product obtained by curing the organic-inorganic composite resin composition through application of an active energy has a refractive index nd of 1.61 or more and 1.65 or less, Abbe's number νd of 13 or more and 20 or less, and an anomalous dispersion characteristic θg,F of 0.42 or more and 0.54 or less. Further provided is an optical element comprising a transparent substrate and the organic-inorganic composite resin material formed on the transparent substrate.

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Номер записи: 5
04-10-2012 дата публикации

Mirror for extreme ultra violet, manufacturing method for mirror for extreme ultra violet, and far ultraviolet light source device

Номер: US20120248342A1
Автор: Georg Soumagne, Masato Moriya, Osamu Wakabayashi
Принадлежит: GIGAPHOTON INC, KOMATSU LTD

An EUV light source is configured for generating an EUV light for an exposure device. The EUV light source includes a chamber, a target supply device configured for supplying a target into the chamber, an optical system for introducing laser light from a driver laser into the chamber and irradiating the target with the laser light to turn the target into plasma from which EUV light is emitted, and an EUV collector mirror in the chamber. The EUV collector mirror may include a multilayered reflecting surface with grooves and collect the EUV light from the plasma to a focal spot. The grooves can be arranged in a concentric fashion, and be configured for diffracting at least light at a wavelength which is the same as that of the laser light from the driver laser.

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Номер записи: 6
03-01-2013 дата публикации

Holographic storage method and article

Номер: US20130003151A1
Автор: Andrew A. Burns, Mark A. Cheverton, Michael T. Takemori, Sumeet Jain
Принадлежит: SABIC INNOVATIVE PLASTICS IP BV

A method of recording a holographic record is described. According to this method, a holographic recording medium is exposed to a desired pattern, shape, or image from a coherent light source emitting light at one or more wavelengths to which the holographic recording medium is sensitive. In this method, light having the desired pattern, shape, or image to which the holographic recording medium is exposed is diffracted by a spatially homogeneous optical diffraction element so that the holographic recording medium is exposed to a plurality of interfering light beams, thereby forming a holographic record in the holographic recording medium. Holographic recording articles are described that include a holographic recording medium and a spatially homogeneous optical diffraction element.

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Номер записи: 7
06-06-2013 дата публикации

METHOD OF FABRICATING AN OPTICAL GRATING

Номер: US20130140723A1
Автор: Murakowski Janusz, Prather Dennis W., Shi Shouyuan
Принадлежит: Lumilant, Inc.

According to embodiments of the invention, the design and fabrication of a binary superimposed grating (BSG) results in better performing devices that may be fabricated using existing technology. The fabrication process includes forming grating features based upon repeating features of the desired superposition function. The design process also relaxes the processing requirement for equivalently performing devices. 1. A method comprising:determining placement for grating features according to a position of repeating features in a desired superposition function; andfabricating the grating using a fabrication tool to form the grating features on or as part of a substrate according to the determined placement, wherein the grating features have a uniform width.2. The method of claim 1 , wherein the fabrication tool comprises an electron-beam lithography system.3. The method of claim 1 , wherein the uniform width is about 100 nm.4. The method of claim 1 , wherein the uniform width is as small as the fabrication tool can create.5. The method of claim 1 , wherein fabricating the grating includes having placement accuracy for the grating features to less than 1 nanometer.6. The method of claim 1 , wherein fabricating the grating includes having placement accuracy for the grating features to within about 0.1 nm.7. The method of claim 1 , wherein the repeating features are local minima.8. The method of claim 1 , wherein the repeating features are local maxima.9. A method comprising:determining placement for grating features according to a position of repeating features in a desired superposition function; and fabricating the grating using a fabrication tool to form the grating features on or as part of a substrate according to the determined placement, wherein the grating features have a uniform depth.10. The method of claim 9 , wherein the fabrication tool comprises an electron-beam lithography system.11. The method of claim 9 , wherein the grating features also have a ...

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Номер записи: 8
01-08-2013 дата публикации

DIFFRACTION-TYPE 3D DISPLAY ELEMENT AND METHOD FOR FABRICATING THE SAME

Номер: US20130193106A1
Автор: Chang Yao-Ru, CHEN Chien-Yue, Hung Wen-Chen
Принадлежит: National Yunlin University of Science and Technology

A diffraction-type 3D display element is arranged on an image output face of a 3D display device and comprises a first diffraction area and a second diffraction area. The first diffraction area has a plurality of first stepped gratings spaced apart from each other. The second diffraction area has a plurality of second stepped gratings spaced apart from each other. The second diffraction area is adjacent to the first diffraction area and is arranged symmetrically to the first diffraction area with a central line being the symmetric axis. The diffraction-type 3D display element of the invention diffracts the images output by the 3D display device and projects the diffracted images to two different viewing areas to provide 3D images for users. 14-. (canceled)5. A method for fabricating a diffraction-type 3D display element , comprising steps:cleaning a substrate;undertaking a first etching process, wherein the first etching process employs a first mask to form a plurality of first flattened areas and a plurality of first recessed areas on the substrate;aligning a second mask, wherein the second mask is aligned to borders of the first flattened areas and the first recessed areas; andundertaking a second etching process, wherein the second etching process employs the second mask to form second recessed areas on the first flattened areas and the first recessed areas respectively, and wherein each second recessed area is formed at a depth smaller than that of the first recessed area to form a four-step structure.6. The method for fabricating a diffraction-type 3D display element according to claim 5 , wherein the depth of the second recessed area is half the depth of the first recessed area.7. The method for fabricating a diffraction-type 3D display element according to further comprising steps:aligning a third mask, wherein the third mask is aligned to borders of the first flattened areas, the first recessed areas and the second recessed areas; andundertaking a third ...

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Номер записи: 9
14-11-2013 дата публикации

METHOD FOR PRODUCING MOLD FOR MINUTE PATTERN TRANSFER, METHOD FOR PRODUCING DIFFRACTION GRATING USING THE SAME, AND METHOD FOR PRODUCING ORGANIC EL ELEMENT INCLUDING THE DIFFRACTION GRATING

Номер: US20130299796A1
Автор: FUKUDA Maki, MASUYAMA Satoshi, Nishimura Suzushi, Seki Takashi, TAKAHASHI Madoka
Принадлежит:

A method for producing a mold includes: applying a block copolymer solution made of first and second polymers on a base member; performing a first annealing process at a temperature higher than Tg of the block copolymer after drying the coating film; forming a concavity and convexity structure on the base member by removing the second polymer by an etching process; performing a second annealing process of the concavity and convexity structure at a temperature higher than Tg of the first polymer; forming a seed layer on the structure; laminating or stacking a metal layer on the seed layer by an electroforming; and peeling off the metal layer from the base member. The second annealing process enables satisfactory transfer of a concavity and convexity structure on the base member onto the metal layer. 1. A method for producing a mold for minute pattern transfer , comprising:a step of applying a block copolymer solution made of at least a first polymer and a second polymer on a surface of a base member;a step of drying a coating film on the base member;a first heating step for heating the coating film after the drying at a temperature higher than a glass transition temperature of a block copolymer of the block copolymer solution;an etching step for etching the coating film after the first heating step to remove the second polymer so that a concavity and convexity structure is formed on the base member;a second heating step for heating the concavity and convexity structure at a temperature higher than a glass transition temperature of the first polymer;a step of forming a seed layer on the concavity and convexity structure after the second heating step;a step of or stacking a metal layer on the seed layer by an electroforming; anda step of peeling off the base member having the concavity and convexity structure from the metal layer and the seed layer.2. The method for producing the mold according to claim 1 , wherein a micro phase separation structure of the block ...

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Номер записи: 10
14-11-2013 дата публикации

Method for forming a structural body and an apparatus for forming a structural body

Номер: US20130300008A1
Автор: Ken Takenouchi, Yoshiyuki Yuasa
Принадлежит: TOYO SEIKAN KAISHA LTD

A method for forming a structural body includes irradiating a substrate with light having a periodic intensity distribution and a wavelength within a wavelength region which allows the substrate to show opacity thereby forming a periodic structure causing optical diffraction on a surface of the substrate.

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Номер записи: 11
14-11-2013 дата публикации

LAMINATED DIFFRACTION OPTICAL ELEMENT AND PRODUCTION METHOD THEREFOR

Номер: US20130301132A1
Автор: Niwa Maiko
Принадлежит: CANON KABUSHIKI KAISHA

A laminated diffraction optical element includes a substrate, and a resin layer provided on the substrate and including an optically effective portion and an optically non-effective outer portion adjacent to the optically effective portion. The optically non-effective outer portion in the resin layer has a continuous shape such that a layer thickness decreases when extending toward an outer periphery of the substrate. An angle formed between a straight line connecting both ends of the continuous shape and a tangent to a surface of the substrate at a point opposite to an end closer to the surface of the substrate is within a range of 20 to 60 degrees. 1. A laminated diffraction optical element comprising:a substrate; anda resin layer provided on the substrate and including an optically effective portion and an optically non-effective outer portion adjacent to the optically effective portion,wherein the optically non-effective outer portion in the resin layer has a continuous shape such that a layer thickness decreases when extending toward an outer periphery of the substrate, andwherein an angle formed between a straight line connecting both ends of the continuous shape and a tangent to a surface of the substrate at a point opposite to an end closer to the surface of the substrate is within a range of 20 to 60 degrees.2. The laminated diffraction optical element according to claim 1 , wherein an outer surface of the optically non-effective outer portion in the resin layer has a shape of an inclined face or a curved face.3. A laminated diffraction optical element comprising:a substrate; anda resin layer provided on the substrate and including an optically effective portion and an optically non-effective outer portion adjacent to the optically effective portion,wherein the optically non-effective outer portion in the resin layer includes at least a continuous first shape such that a layer thickness decreases when extending toward an outer periphery of the substrate, ...

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Номер записи: 12
19-12-2013 дата публикации

Method for producing a reflective optical component for an euv projection exposure apparatus and component of this type

Номер: US20130335816A1
Автор: Andre Bresan, Heiko Siekmann, Holger Kierey
Принадлежит: CARL ZEISS LASER OPTICS GMBH, CARL ZEISS SMT GMBH

A method for producing a reflective optical component for an EUV projection exposure apparatus, the component having a substrate having a base body, and a reflective layer arranged on the substrate, wherein the substrate has an optically operative microstructuring, comprises the following steps: working the microstructuring into the substrate, polishing the substrate after the microstructuring has been worked into the substrate, applying the reflective layer to the substrate. A reflective optical component for an EUV projection exposure apparatus correspondingly has a polished surface between the microstructuring and the reflective layer.

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Номер записи: 13
19-12-2013 дата публикации

Method of Manufacture of X-Ray Diffraction Gratings

Номер: US20130335825A1
Автор: Abbamonte Peter, MacLaren Scott
Принадлежит: The Board of Trustees of the University of Illinois

Methods and apparatus for manufacturing an optical grating, and the optical grating manufactured thereby. A workpiece is secured to a carriage driven by a linear actuator. A tool is maintained in contact with the workpiece at either a constant force or a constant displacement normal to the surface of the workpiece while the carriage is translated. A plurality of grooves is ruled into the workpiece in this manner. 1. A method of manufacturing an optical grating , the method comprising:a. securing a workpiece blank to a surface of a carriage;b. translating the carriage in a first direction by means of a linear actuator;c. maintaining a tool in contact with a surface of the workpiece blank at one of a constant force and a constant displacement normal to the surface of the workpiece blank during the step of translating the carriage in a first direction, thereby ruling a groove in the surface of the workpiece blank;d upon completion of the groove in the surface of the workpiece blank, translating the carriage in a second direction substantially transverse to the first direction; ande. repeating steps (b), (c) and (d) in such a manner as to rule a plurality of grooves, constituting, in the aggregate, a grating surface.2. A method according to claim 1 , wherein the step of maintaining the tool in contact with the surface of the workpiece blank is performed by means of an atomic force microscope.3. A method according to claim 1 , wherein the tool is a diamond tip.4. A method according to claim 3 , further comprising ion milling the diamond tip to a specified shape.5. A method according to claim 1 , wherein the tool is shaped by a process of polishing.6. A method according to claim 1 , wherein the linear actuator is a linear induction motor.7. A method according to claim 1 , further comprising measuring the translation of the carriage in the second direction by means of an interferometer.8. A method according to claim 1 , further comprising introducing chirped periods into ...

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Номер записи: 14
26-12-2013 дата публикации

METHOD OF MANUFACTURING A DIFFRACTION GRATING

Номер: US20130342908A1
Автор: Sugiyama Shigeru, Sukegawa Takashi
Принадлежит:

A method for manufacturing a blazed diffraction grating made of a crystalline material comprising gallium phosphide (GaP) or gallium arsenide (GaAs) includes forming the blazed diffraction grating by forming a plurality of grating grooves on a machined surface of a workpiece by machining, wherein the grating grooves are formed so that a surface comprising a (110) plane is arranged to receive the most incident light among the surfaces that constitute each grating, where (110) describes a crystal orientation of the crystalline material. 1. A method for manufacturing a blazed diffraction grating made of a crystalline material comprising gallium phosphide (GaP) or gallium arsenide (GaAs) , the method comprisingforming the blazed diffraction grating by forming a plurality of grating grooves on a machined surface of a workpiece by machining,wherein the grating grooves are formed so that a surface comprising a (110) plane is arranged to receive the most incident light among the surfaces that constitute each grating, where (110) describes a crystal orientation of the crystalline material.2. The method according to claim 1 , wherein the surface that receives the most incident light is a surface having a short side of a triangular cross-section of each grating.3. The method according to claim 1 , wherein the grating grooves are formed to have an opening angle of 90 degrees.4. The method according to claim 1 , wherein the grating groove is formed using a shaper system having a diamond cutting tool.5. The method according to claim 1 , wherein the blazed diffraction grating is an immersion diffraction grating.6. The method according to claim 1 , wherein the grating groove is formed by mounting the workpiece on a processing machine so that the workpiece is processed to form a surface of each grating groove comprising a (110) plane such that claim 1 , in use claim 1 , that surface receives the most incident light.7. A method for manufacturing a blazed diffraction grating made of a ...

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Номер записи: 15
26-12-2013 дата публикации

METHOD OF MANUFACTURING A DIFFRACTION GRATING

Номер: US20130342909A1
Автор: Sugiyama Shigeru, Sukegawa Takashi
Принадлежит:

A method for manufacturing a blazed diffraction grating made of a crystalline material comprising zinc selenide (ZnSe) or zinc sulfide (ZnS) includes forming the blazed diffraction grating by forming a plurality of grating grooves on a machined surface of a workpiece by machining, wherein the grating grooves are formed so that a surface comprising a (110) plane is arranged to receive the most incident light among the surfaces that constitute each grating, where (110) describes a crystal orientation of the crystalline material. 1. A method for manufacturing a blazed diffraction grating made of a crystalline material comprising zinc selenide (ZnSe) or zinc sulfide (ZnS) , the method comprising:forming the blazed diffraction grating by forming a plurality of grating grooves on a machined surface of a workpiece by machining,wherein the grating grooves are formed so that a surface comprising a (110) plane is arranged to receive the most incident light among the surfaces that constitute each grating, where (110) describes a crystal orientation of the crystalline material.2. The method according to claim 1 , wherein the surface that receives the most incident light is a surface having a short side of a triangular cross-section of each grating.3. The method according to claim 1 , wherein the grating grooves are formed to have an opening angle of 90 degrees.4. The method according to claim 1 , wherein the grating groove is formed using a shaper system having a diamond cutting tool.5. The method according to claim 1 , wherein the blazed diffraction grating is an immersion diffraction grating.6. The method according to claim 1 , wherein the grating groove is formed by mounting the workpiece on a processing machine so that the workpiece is processed to form a surface of each grating groove comprising a (110) plane such that claim 1 , in use claim 1 , that surface receives the most incident light.7. A method for manufacturing a blazed diffraction grating made of a crystalline ...

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Номер записи: 16
13-02-2014 дата публикации

DIFFRACTION ELEMENT AND METHOD OF MANUFACTURING DIFFRACTION ELEMENT

Номер: US20140043686A1
Автор: Sugiyama Shigeru, Tanaka Masato
Принадлежит: CANON KABUSHIKI KAISHA

Provided is an immersion diffraction element that prevents decrease of diffraction efficiency thereof so as to satisfy optical performance. A reflection type diffraction element is made of a material transmitting a light, beam having a predetermined wavelength. An echelle diffraction grating covered with a reflecting film that prevents transmission of the light beam is formed on one surface of the material. A diffraction grating is formed off in a repeated manner, a blazed surface facing incident light and a non-blazed surface connecting the blazed surface to a neighboring blazed surface. An angle formed between the blazed surface and the non-blazed surface is an acute angle. A defect generated at a grating vertex of the blazed surface fails in a shadow of the neighboring blazed surface so as to prevent the incident light from becoming scattered light due to the defect portion. 1. A diffraction element , comprising:a plurality of biased surfaces; anda non-blazed surface connecting neighboring blazed surfaces to each other among the plurality of blazed surfaces,the diffraction element permitting light to pass through the diffraction element and to be reflected by the plurality of blazed surfaces so that beams of the light reflected by the plurality of blazed surfaces interfere with each other and pass through the diffraction element for spectral separation of the light,wherein an angle formed between the non-blazed surface and each of the plurality of blazed surfaces is an acute angle.2. The diffraction element according to claim 1 , further comprising a film for reflecting the light claim 1 , the film being formed on each of the plurality of blazed surfaces.3. The diffraction element according to claim 2 , wherein the film for reflecting the light comprises a metal film containing gold or aluminum.4. The diffraction element according to claim 1 ,wherein the plurality of biased surfaces each comprise a part that does not reflect the light, andwherein a height of the ...

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Номер записи: 17
03-04-2014 дата публикации

DIFFRACTION GRATING MANUFACTURING METHOD, SPECTROPHOTOMETER, AND SEMICONDUCTOR DEVICE MANUFACTURING METHOD

Номер: US20140092384A1
Автор: Ebata Yoshisada, Hasegawa Norio, Kakuta Kazuyuki, MATSUI Shigeru, Onozuka Toshihiko
Принадлежит: HITACHI HIGH-TECHNOLOGIES CORPORATION

The present invention has been made in view of the above, and an object thereof is to provide a manufacturing technique capable of manufacturing a diffraction grating which is suitable for use in a spectrophotometer and has an apex angle of a convex portion of about 90° and can satisfy high diffraction efficiency and a low stray light amount. A method of manufacturing a diffraction grating, the method including: setting an exposure condition such that a sectional shape of a convex portion of a resist on a substrate, which has been formed by exposure, is an asymmetric triangle with respect to an opening portion shape of a mask having an opening portion with a periodic structure and an angle formed by a long side and a short side of the triangle is about 90°; and performing exposure. 1. A method of manufacturing a diffraction grating , comprising: setting an exposure condition such that , with respect to an opening portion shape of a mask having an opening portion with a periodic structure , a sectional shape of a convex portion of a resist on a substrate , the convex having been formed by exposure , is an asymmetric triangle and an angle formed by a long side and a short side of the triangle is about 90°; and performing exposure.2. The method of manufacturing a diffraction grating according to claim 1 , wherein at least one of the opening portion shape of the mask claim 1 , an exposure focus claim 1 , an exposure amount claim 1 , a numerical aperture of an exposure lens claim 1 , and a σ value of illumination is changed and comparison of sectional shapes of the convex portions of the resists on the substrate formed by exposure is performed.3. The method of manufacturing a diffraction grating according to claim 1 , wherein the mask has a periodic structure in a perpendicular direction or a parallel direction to with respect to a direction of grooves of the diffraction grating.4. The method of manufacturing a diffraction grating according to claim 1 , wherein the mask ...

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Номер записи: 18
05-01-2017 дата публикации

DIFFRACTIVE OPTICAL ELEMENTS WITH GRADED EDGES

Номер: US20170003504A1
Автор: Levola Tapani, Mattila Marco, Sainiemi Lauri, Vallius Tuomas
Принадлежит:

In an optical system that includes a waveguide with multiple diffractive optical elements (DOEs) incorporating diffraction gratings, light exiting a trailing edge of an upstream DOE enters a leading edge of a downstream DOE. One or more of the DOEs may include a leading and/or a trailing edge that have a graded profile. At a graded trailing edge of an upstream DOE, grating height smoothly decreases from full height to shallow height as a function of the proximity to the trailing edge. At a graded leading edge of the downstream DOE grating height smoothly increases from shallow height to full height as a function of distance away from the leading edge. By reducing a sharp boundary at the interface between the upstream and downstream DOEs, the graded profiles of the DOE edges enable optical resolution to be maintained decreasing sensitivity to misalignment between the DOEs that may occur during manufacturing. 1. An optical system , comprising:a substrate of optical material;a first diffractive optical element (DOE) disposed on the substrate and configured as an in-coupling grating to receive, as an input, one or more optical beams that propagate in the first DOE and exit at a trailing edge of the first DOE; and in which the trailing edge of the first DOE is located on the substrate at an interface with the second DOE, wherein the one or more optical beams exiting at the trailing edge, enter a leading edge of the second DOE, and', 'wherein the trailing edge and leading edge are graded so that a grating height of each of the first DOE and the second DOE increases as a function of distance from the interface., 'a second DOE disposed on the substrate and configured for pupil expansion of the one or more optical beams along a first direction,'}2. The optical system of further including a third DOE disposed on the substrate and configured for pupil expansion of the optical beams along a second direction claim 1 , and further configured as an out-coupling grating to couple ...

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Номер записи: 19
05-01-2017 дата публикации

DIFFRACTIVE OPTICAL ELEMENTS WITH ASYMMETRIC PROFILES

Номер: US20170003505A1
Автор: Sainiemi Lauri, Vallius Tuomas
Принадлежит:

In an optical display system that includes a waveguide with multiple diffractive optical elements (DOEs), gratings in one or more of the DOEs may have an asymmetric profile in which gratings may be slanted or blazed. Asymmetric gratings in a DOE can provide increased display uniformity in the optical display system by reducing the “banding” resulting from optical interference that is manifested as dark stripes in the display. Banding may be more pronounced when polymeric materials are used in volume production of the DOEs to minimize system weight, but which have less optimal optical properties compared with other materials such as glass. The asymmetric gratings can further enable the optical system to be more tolerant to variations—such as variations in thickness, surface roughness, and grating geometry—that may not be readily controlled during manufacturing particularly since such variations are in the submicron range. 1. An optical system , comprising:a substrate of optical material;a first diffractive optical element (DOE) disposed on the substrate, the first DOE having an input surface and configured as an in-coupling grating to receive one or more optical beams as an input; and 'wherein at least a portion of the second DOE includes gratings that are configured with a predetermined slant angle to a direction orthogonal to a plane of the substrate.', 'a second DOE disposed on the substrate and configured for pupil expansion of the one or more optical beams along a first direction,'}2. The optical system of further including a third DOE disposed on the substrate claim 1 , the third DOE having an output surface and configured for pupil expansion of the one or more optical beams along a second direction claim 1 , and further configured as an out-coupling grating to couple claim 1 , as an output from the output surface claim 1 , one or more optical beams with expanded pupil relative to the input.3. The optical system of in which at least a portion of the third DOE ...

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Номер записи: 20
04-01-2018 дата публикации

METHOD FOR MAKING AN OPTICAL ELEMENT HAVING A TEXTURED SURFACE AND AN OPTICAL ELEMENT HAVING A TEXTURED SURFACE

Номер: US20180003859A1
Автор: Morasse Bertrand
Принадлежит:

There is provided a method for making an optical element having a textured surface. The method comprises the steps of: a) providing a plurality of primary optical fiber segments, each primary fiber segment comprising one or more cores; b) bundling the primary fiber segments into an assembly with the cores of said primary fiber segments extending parallely; c) transforming the assembly into a secondary structure comprising the parallely extending cores; and d) etching a surface of the secondary structure according to an etch profile of said secondary structure, the etch profile being defined by the parallely extending cores, thereby forming the textured surface of the optical element. An optical element having a textured surface is also provided. 1. A method for making an optical element having a textured surface , comprising the steps of:a) providing a plurality of primary optical fiber segments, each primary fiber segment comprising one or more cores;b) bundling the primary fiber segments into an assembly with the cores of said primary fiber segments extending parallely;c) transforming the assembly into a secondary structure comprising the parallely extending cores; andd) etching a surface of the secondary structure according to an etch profile of said secondary structure, the etch profile being defined by the parallely extending cores, thereby forming the textured surface of the optical element.2. The method according to claim 1 , wherein step a) comprises the substeps of:providing a primary optical fiber; andsectioning the primary optical fiber into the plurality of primary optical fiber segments.3. The method according to claim 2 , wherein step a) further comprises a substep of removing a cladding surrounding a primary perform comprising the one or more cores claim 2 , the primary preform being drawn into the primary optical fiber.4. The method according to claim 1 , wherein the one or more cores of the primary optical fiber segments provided in step a) have an ...

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Номер записи: 21
02-01-2020 дата публикации

GAP FILL OF IMPRINTED STRUCTURE WITH SPIN COATED HIGH REFRACTIVE INDEX MATERIAL FOR OPTICAL COMPONENTS

Номер: US20200003936A1
Автор: FU Jinxin, Godet Ludovic, MCMILLAN Wayne
Принадлежит:

Embodiments of the present disclosure generally relate to a method for forming an optical component, for example, for a virtual reality or augmented reality display device. In one embodiment, the method includes forming a first layer on a substrate, and the first layer has a first refractive index. The method further includes pressing a stamp having a pattern onto the first layer, and the pattern of the stamp is transferred to the first layer to form a patterned first layer. The method further includes forming a second layer on the patterned first layer by spin coating, and the second layer has a second refractive index greater than the first refractive index. The second layer having the high refractive index is formed by spin coating, leading to improved nanoparticle uniformity in the second layer. 1. A method , comprising:forming a first layer having a first refractive index on a substrate;pressing a stamp having a pattern onto the first layer;transferring the pattern to the first layer to form a patterned first layer; andforming a second layer having a second refractive index greater than the first refractive index on the patterned first layer by spin coating.2. The method of claim 1 , wherein the first refractive index ranges from about 1.1 to about 1.5.3. The method of claim 1 , wherein the first layer comprises porous silicon dioxide or quartz.4. The method of claim 1 , wherein the second layer comprises a metal oxide.5. The method of claim 1 , wherein the second layer comprises titanium oxide claim 1 , tantalum oxide claim 1 , zirconium oxide claim 1 , hafnium oxide claim 1 , or niobium oxide.6. The method of claim 1 , wherein the first layer is formed on the substrate by spin coating.7. A method claim 1 , comprising:forming a first layer having a first refractive index ranging from about 1.1 to about 1.5;pressing a stamp having a pattern onto the first layer;transferring the pattern to the first layer to form a patterned first layer; andforming a second ...

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Номер записи: 22
02-01-2020 дата публикации

Using flowable cvd to gap fill micro/nano structures for optical components

Номер: US20200003937A1
Автор: Jinxin FU, Ludovic Godet, Wayne Mcmillan
Принадлежит: Applied Materials Inc

Embodiments of the present disclosure generally relate to a method for forming an optical component, for example, for a virtual reality or augmented reality display device. In one embodiment, the method includes forming a first layer having a pattern on a substrate, and the first layer has a first refractive index. The method further includes forming a second layer on the first layer by a flowable chemical vapor deposition (FCVD) process, and the second layer has a second refractive index less than the first refractive index.

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Номер записи: 23
07-01-2021 дата публикации

DEVICE AND METHOD FOR PRODUCING MASTER DIFFRACTION GRATING

Номер: US20210003752A1
Автор: OUE Yuki
Принадлежит: SHIMADZU CORPORATION

A device for producing a master diffraction grating includes a light source unit and a reflecting member . The light source unit forms a first interference fringe by irradiating a substrate surface of a master substrate with light. The reflecting member reflects the light from the light source unit reflected on the substrate surface of the master substrate and guides the light again to the substrate surface side to form a second interference fringe. A resist pattern based on the first interference fringe and the second interference fringe is formed on the substrate surface of the master substrate 1. A device for producing a master diffraction grating serving as a matrix for producing a replica diffraction grating , the device comprising:a light source unit for forming a first interference fringe by irradiating a substrate surface of a master substrate with light; anda reflecting member for reflecting light from the light source unit reflected on the substrate surface of the master substrate and guiding the light again to the substrate surface, so that a second interference fringe is formed, whereina resist pattern based on the first interference fringe and the second interference fringe is formed on the substrate surface of the master substrate.2. The device for producing a master diffraction grating according to claim 1 , whereinthe reflecting member is disposed at a position displaced along a direction parallel to a direction in which the first interference fringe extends, with respect to an optical axis of light from the light source unit.3. The device for producing a master diffraction grating according to claim 2 , whereinthe light source unit includes a condenser lens, a pinhole through which light condensed by the condenser lens passes, and a concave mirror for making light that has passed through the pinhole parallel, andthe reflecting member is disposed between the concave mirror and the substrate surface of the master substrate.4. A method for producing a ...

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Номер записи: 24
07-01-2021 дата публикации

DIFFRACTIVE OPTICAL ELEMENT AND METHOD FOR MANUFACTURING THE SAME

Номер: US20210003855A1
Автор: QIAN Pengxiang, SHAN Yanquan, WIEGEL Thomas, Zhang Guangjun
Принадлежит: SCHOTT GLASS TECHNOLOGIES (SUZHOU) CO. LTD.

A diffractive optical element is provided that includes at least two layers with different etching speeds for dry etching process. The diffractive optical element has a substrate of glass and a microstructure layer arranged on the substrate. The ratio of dry etching speed in thickness direction of the substrate to that of the microstructure layer is no more than 1:2 so that the substrate functions as an etching stop layer. The ratio of dry etching speed in horizontal direction of the substrate is substantially equal to that of the microstructure layer. The composition of glass includes, but is not limited to, AlO3, alkaline material (MO) and alkaline earth material (MO), where the weight percentage of AlO+MO+MO>=5%. 1. A diffractive optical element , comprising:{'sub': 2', '3', '2', '2', '3', '2, 'a substrate of glass, the glass comprising AlO, alkaline metal oxides MO, and alkaline earth metal oxides MO with a sum of content ΣAlO+MO+MO greater than 5 wt %, the substrate of glass exhibiting a refractive index in a range from 1.40 to 2.2;'}a microstructure layer arranged on the substrate of glass;a ratio of dry etching speed in thickness direction of the substrate of glass to that of the microstructure layer is no more than 1:2 so that the substrate of glass is an etching stop layer; anda ratio of dry etching speed in a horizontal direction of the substrate of glass is substantially equal to that of the microstructure layer.2. The diffractive optical element of claim 1 , wherein the ratio of dry etching speed in thickness direction is no more than 1:20.3. The diffractive optical element of claim 1 , wherein the sum of content ΣAlO+MO+MO is greater than or equal to 10 wt %.4. The diffractive optical element of claim 1 , wherein the microstructure layer has a feature dimension with an etched width less than 2000 μm.5. The diffractive optical element of claim 1 , wherein the microstructure layer has a step with an etched depth less than 1000 μm.6. The diffractive ...

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Номер записи: 25
07-01-2021 дата публикации

OPTICAL COMPONENT HAVING VARIABLE DEPTH GRATINGS AND METHOD OF FORMATION

Номер: US20210005461A1
Автор: Evans Morgan, Hautala John, MEYER TIMMERMAN THIJSSEN Rutger, Olson Joseph C.
Принадлежит: VARIAN SEMICONDUCTOR EQUIPMENT ASSOCIATES, INC.

An optical grating component may include a substrate, and an optical grating, the optical grating being disposed on the substrate. The optical grating may include a plurality of angled structures, disposed at a non-zero angle of inclination with respect to a perpendicular to a plane of the substrate, wherein the plurality of angled structures are arranged to define a variable depth along a first direction, the first direction being parallel to the plane of the substrate. 2. The optical grating of claim 1 , wherein the plurality of angled structures extend along a second direction claim 1 , perpendicular to the first direction claim 1 , and wherein a grating height of an angled structure along the second direction is uniform.3. The optical grating component of claim 2 ,wherein the optical grating is a first optical grating,the optical grating component further comprising a second optical grating, the second optical grating comprising a second plurality of angled structures, disposed at a second non-zero angle of inclination with respect to the perpendicular to the plane of the substrate, wherein the second plurality of angled structures are arranged to define a second variable depth along the second direction.4. The optical grating component of claim 1 , wherein the optical grating comprises silicon oxide claim 1 , silicon nitride claim 1 , or a glass.5. The optical grating component of claim 1 , wherein the optical grating comprises a grating height in a range of 100 nm to 1000 nm claim 1 , wherein the optical grating comprises a grating height variation of 10%-40%.6. The optical grating component of claim 1 , wherein the optical grating is disposed in a grating layer claim 1 , the optical grating component further comprising an etch stop layer claim 1 , disposed between the substrate and the grating layer.7. The optical grating component of claim 6 , wherein the etch stop layer comprises a thickness of 10 nm to 100 nm.8. The optical grating component of claim 6 , ...

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Номер записи: 26
20-01-2022 дата публикации

METHOD FOR MANUFACTURING CRISS-CROSS TYPE X-RAY GRID

Номер: US20220015725A1
Автор: Cha Ho Kwon, Kim Jin Guk, Kim Jin Won, Park Myung Kyu, YOON Won Sik
Принадлежит: JPI HEALTHCARE CO., LTD.

A method for manufacturing a criss-cross type X-ray grid may include: forming a plurality of criss-cross type grooves at predetermined intervals in a longitudinal direction and a lateral direction in a substrate made of an X-ray transparent material, through a semiconductor sawing machine, such that the grooves form a checker board shape as a whole; putting the substrate having the criss-cross type grooves formed therein into a storage tank filled with a molten X-ray absorbent material; filing the criss-cross type grooves, formed in the substrate, with the X-ray absorbent material by vacuuming the inside of the storage tank; and taking the substrate filled with the X-ray absorbent material out of the storage tank, and curing the substrate at room temperature. 1. A method for manufacturing a criss-cross type X-ray grid , comprising:forming a plurality of criss-cross type grooves at predetermined intervals in a longitudinal direction and a lateral direction in a substrate made of an X-ray transparent material, through a semiconductor sawing machine, such that the grooves form a checker board shape as a whole;putting the substrate having the criss-cross type grooves formed therein into a storage tank filled with a molten X-ray absorbent material;filing the criss-cross type grooves, formed in the substrate, with the X-ray absorbent material by vacuuming the inside of the storage tank; andtaking the substrate filled with the X-ray absorbent material out of the storage tank, and curing the substrate at room temperature.2. The method of claim 1 , wherein the criss-cross type grooves formed in the substrate are inclined at a predetermined angle toward the center from the center to the left and right ends of the substrate.3. The method of claim 1 , wherein the substrate is made of any one selected from the group consisting of plastic claim 1 , polymer claim 1 , aluminum claim 1 , ceramic claim 1 , graphite and carbon fiber.4. The method of claim 1 , wherein the X-ray ...

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Номер записи: 27
27-01-2022 дата публикации

Fast Making of Transparent Angularly Selective Polymer Films and Plates

Номер: US20220026609A1
Автор: Wang Fuke
Принадлежит:

A method fabricates a transparent polymer plate or film. The method incudes applying an acrylate ink to a transparent substrate and illuminating the polymeric substrate and the acrylate ink with a light source to cause photopolymerization. The photopolymerization creates micro-louvre structures inside the transparent polymeric plate or film. 1. A method to make a transparent polymer film , the method comprising:coating a transparent polymeric substrate with an acrylate ink;adjusting a distance between a light source and the transparent polymeric substrate; andilluminating the transparent polymeric substrate and the acrylate ink with the light source to cause photopolymerization that creates the transparent polymer film with micro-louvre components inside the transparent polymer film.2. The method of further comprising:changing the distance between the light source and the transparent polymeric substrate to change a grating spacing of the micro-louvre components.3. The method of further comprising:changing an angle between the light source and the transparent polymeric substrate to change a diffraction angle of the micro-louvre components.4. The method of further comprising:placing the transparent polymeric substrate substantially parallel to the light source with the distance being from 1 cm to 50 cm.5. The method of claim 1 , wherein the transparent polymeric substrate is illuminated for around 10 minutes to solidify the transparent polymer film with a thickness of around 2 mm.6. The method of claim 1 , wherein the micro-louvre components have a space in a range of about 10 μm-25 μm and a height of about 1.5 μm to about 2.5 μm.7. The method of further comprising:adjusting the distance to about 10 cm to create the micro-louvre components with a space of around 15 μm.8. The method of further comprising:adjusting the distance to about 16 cm to create the micro-louvre components with a space of around 20 μm.9. A method to make a transparent polymer plate claim 1 , the ...

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Номер записи: 28
17-01-2019 дата публикации

NANO-GAP GRATING DEVICES WITH ENHANCED OPTICAL PROPERTIES AND METHODS OF FABRICATION

Номер: US20190018172A1
Автор: Basuray Sagnik, Bhatnagar Kunal, Cornish Peter, Gangopadhyay Keshab, Gangopadhyay Shubhra, Ghosh Arnab, Korampally Venu, Mathai Joseph, Menke Drew Edwin, Pathak Avinash, Wood Aaron
Принадлежит:

A method of producing a grating structure comprises the steps of forming a stamp from flexible plastic material, the stamp including a negative of a periodic grating pattern on a first surface; forming an ink by applying a polymer film to the stamp, the ink including a first surface and an opposing second surface, wherein the first surface of the ink contacts the first surface of the stamp such that the ink retains a positive of the periodic grating pattern; placing the ink and the stamp on a substrate such that the second surface of the ink contacts an upper surface of the substrate; and removing the stamp from the ink by applying a tensional force to one edge of the stamp. 1. A grating structure comprising: 'a first surface with a plurality of grating elements positioned adjacent one another, each grating element including a longitudinal tip, a longitudinal plateau, and a longitudinal nanogap, and', 'a base layer positioned on the substrate, the base layer including'}a contiguous first functional layer conformally covering the base layer producing an enhanced fluorescence of a sample,wherein the first functional layer includes a plurality of nanospurs forming a plurality of peaks abutting one another along the length of the longitudinal tip producing additional localized electromagnetic field enhancement.2. The grating structure of claim 1 , wherein the longitudinal nanogap has a width ranging from approximately 10 nm to approximately 30 nm and the longitudinal tip has a width ranging from approximately 10 nm to approximately 30 nm.3. The grating structure of claim 1 , wherein the first functional layer is metallic claim 1 , and wherein the first functional layer is approximately 100 nm thick.4. The grating structure of claim 1 , wherein the first functional layer is made of silver.5. The grating structure of claim 1 , wherein the first functional layer is made of a dielectric claim 1 , and wherein the first functional layer is between approximately 100 nm and ...

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Номер записи: 29
16-01-2020 дата публикации

DUTY CYCLE, DEPTH, AND SURFACE ENERGY CONTROL IN NANO FABRICATION

Номер: US20200018875A1
Автор: Leibovici Matthieu Charles Raoul, MOHANTY Nihar Ranjan
Принадлежит:

Techniques for fabricating slanted surface-relief structures are disclosed. In some embodiments, a method for of fabricating a target slanted surface-relief structure, such as a nanoimprint lithography (NIL) mold or a slanted surface-relief grating, includes manufacturing a preliminary surface-relief structure that includes a plurality of ridges and modifying a parameter of the preliminary surface-relief structure to make the target slanted surface-relief structure. The parameter includes a width of each of the plurality of ridges, a height of each of the plurality of ridges, a surface energy of the preliminary surface-relief structure, or a slant angle of an edge of the plurality of ridges. Modifying the parameter includes depositing a material layer on the preliminary surface-relief structure and etching or surface-treating the material layer. 1. A method of fabricating a nanoimprint lithography (NIL) mold with a target surface-relief structure , the method comprising:manufacturing a preliminary surface-relief structure of the NIL mold, the preliminary surface-relief structure comprising a plurality of ridges, wherein a parameter of the preliminary surface-relief structure is different from a corresponding parameter of the target surface-relief structure; and depositing a material layer on the preliminary surface-relief structure; and', 'etching or surface-treating the deposited material layer to make the target surface-relief structure, wherein the target surface-relief structure includes the preliminary surface-relief structure and is different from the preliminary surface-relief structure in at least one of a height or a slant angle of a ridge in the plurality of ridges., 'modifying the parameter of the preliminary surface-relief structure to make the target surface-relief structure, wherein modifying the parameter of the preliminary surface-relief structure comprises2. The method of claim 1 , wherein the NIL mold comprises a master NIL mold or a soft stamp for ...

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Номер записи: 30
16-01-2020 дата публикации

SYSTEM AND METHOD FOR OPTIMALLY FORMING GRATINGS OF DIFFRACTED OPTICAL ELEMENTS

Номер: US20200018985A1
Автор: Evans Morgan, Kurunczi Peter, Olson Joseph, Thijssen Rutger Meyer Timmerman
Принадлежит: VARIAN SEMICONDUCTOR EQUIPMENT ASSOCIATES, INC.

Optical grating components and methods of forming are provided. In some embodiments, a method includes providing an optically transparent substrate, and forming an optical grating layer on the substrate. The method includes forming an optical grating in the optical grating layer, wherein the optical grating comprises a plurality of angled components, disposed at a non-zero angle of inclination with respect to a perpendicular to a plane of the substrate. A first sidewall of the optical grating may have a first angle, and a second sidewall of the grating has a second angle different than the first angle. Modifying process parameters, including selectivity and beam angle spread, has an effect of changing a shape or dimension of the plurality of angled components. 1. A method of forming an optical grating component , comprising:providing an optical grating layer atop a substrate;providing a patterned hardmask atop the optical grating layer; andetching the optical grating layer and the hardmask to form an optical grating in the optical grating layer, wherein the optical grating comprises a plurality of angled components disposed at a non-zero angle of inclination with respect to a perpendicular to a plane of the substrate, and wherein the etching results in a width of the patterned hardmask being reduced faster than a height to form first and second sidewalls of the optical grating having different angles.2. The method of claim 1 , wherein forming the optical grating comprises etching into the optical grating layer.3. The method of claim 1 , wherein the etching comprises an angled reactive ion etch.4. The method of claim 3 , wherein the angled reactive ion etch is performed by a ribbon reactive ion beam claim 3 , wherein the substrate is scanned along a scan direction with respect to the ribbon reactive ion beam using a processing recipe claim 3 , and wherein the ribbon reactive ion beam has a beam angle mean and a beam spread claim 3 , the beam spread being one of: ...

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Номер записи: 31
17-04-2014 дата публикации

STRUCTURE, STRUCTURE-FORMING METHOD, AND STRUCTURE-FORMING DEVICE

Номер: US20140104686A1
Автор: Washizaki Toshirou, Yuasa Yoshiyuki
Принадлежит: TOYO SEIKAN GROUP HOLDINGS, LTD.

A structure has a processed part formed by the occurrence of photodisintegration attributed to the application of pulsed laser light. A fine periodic composition in which a plurality of processed parts are arranged in the form of grid cross points is formed in one region of the structure. A large number of regions are arranged in the structure. Each of a plurality of ranges obtained by the division of a surface in which the regions are arranged is a region-forming range. One or more regions are arranged in one region-forming range, and the arrangement directions of the processed parts formed in each of the large number of regions vary according to the region-forming ranges. 1. A structure comprising:a fine periodic structure formed in one of a plurality of regions; anda plurality of processed parts arranged in the fine periodic structure in a form of grid cross points,wherein each of the processed parts is formed by occurrence of photodisintegration caused by application of pulsed laser lightwherein each of a plurality of ranges obtained by a division of a surface in which the regions are arranged is a region-forming range,wherein at least one of the regions is arranged in one of the region-forming ranges, andwherein arrangement directions of the processed parts formed in each of the regions vary according to the region-forming ranges.2. The structure according to claim 1 ,wherein a sub-plurality of the regions is arranged in one of the region-forming ranges, and the processed parts in a same arrangement direction are formed in each of the sub-plurality of regions, andwherein, when the sub-plurality of regions constitute a region group, an arrangement direction of the processed parts formed in each of the sub-plurality of regions constituting the region group is different from an arrangement direction of the processed parts formed in each of another sub-plurality of the regions constituting another region group.3. The structure according to claim 1 ,wherein a shape ...

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Номер записи: 32
22-01-2015 дата публикации

Method of Producing a Fresnel Zone Plate for Applications in High Energy Radiation

Номер: US20150022892A1
Автор: Grevent Corinne, Hirscher Michael, KESKINBORA Kahraman, Schuetz Gisela
Принадлежит: Max-Planck-Gesellschaft zur Foerderung der Wissenschaften e.V.

The invention concerns to a method of producing a Fresnel Zone Plate () for applications in high energy radiation including the following steps: supply of a substrate () transparent for high energy radiation, deposition of a layer () of a metal, a metal alloy or a metal compound on a planar surface () of the substrate (), calculating a three dimensional geometrical profile () with a mathematical model, setting up a dosage profile () for an ion beam of the ion beam lithography inverse to the calculated three dimensional geometrical profile () and milling a three dimensional geometrical profile () with concentric zones into the layer () with ion beam lithography by means of focused ion beam. 1. A method of producing a Fresnel zone plate for applications in high energy radiation comprising the steps:a) supplying of a substrate transparent for high energy radiation,b) depositing a layer of a metal, a metal alloy or a metal compound on a planar surface of the substrate,c) milling a three dimensional geometrical profile with concentric zones into the layer with ion beam lithography by means of a focused ion beam,characterized in thatthe three dimensional geometrical profile is calculated with a mathematical model anda dosage profile for an ion beam of the ion beam lithography is set up inverse to the calculated three dimensional geometrical profile.2. The method according to claim 1 , characterized in that the deposition of the layer on the substrate is performed until the layer has reached a thickness (T) between 50 nm and 4000 nm.4. The method according to claim 3 , characterized in that the constant B has a value between 45 and 55.6. The method according to claim 5 , characterized in that the dwell time t is at least 100 ns and of at most 5 ms.7. The method according to claim 5 , characterized in that the ion beam current is between 1 pA and 100 pA.8. The method according to claim 1 , characterized in that an ion beam energy between 5 kV and 100 kV is used.9. The ...

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Номер записи: 33
26-01-2017 дата публикации

COLOR IMAGE DISPLAY DEVICES COMPRISING STRUCTURAL COLOR PIXELS THAT ARE SELECTIVELY ACTIVATED AND/OR DEACTIVATED BY MATERIAL DEPOSITION

Номер: US20170023711A1
Автор: Jiang Hao, KAMINSKA Bozena
Принадлежит:

A color image display device comprising arrays of structural color pixels, where said structural color pixels may be formed on a single substrate layer or multiple substrate layers and are patterned by selective material deposition to display a color image in accordance with input color images or patterns. The structural color pixels comprise a plurality of microstructures and/or nanostructures, including without limitation, diffraction gratings, sub-wavelength structures, to display colors in red, green, blue in RGB color space or cyan, magenta, yellow in CMY color space. Examples include methods of activating and/or deactivating structural pixels using selective material deposition onto at least one layer of the color display device to form a color image. Further examples include product labels, authentication devices and security documents carrying customized or personalized information and methods for their manufacture. 1. A color image display device , comprising:a generic substrate comprising a pixel layer which is generic to any pattern, said pixel layer including at least one type of structural pixels, each pixel defined by at least one microstructure or nanostructure having at least one specific optical property including a specific optical band or a specific color; andan ink material selectively deposited onto individual pixels of the pixel layer in accordance with a pattern to activate or deactivate individual of said pixels to form a color image.2. The color image display device as claimed in claim 1 , wherein the pixel layer further comprises pixel sets claim 1 , each pixel set being defined by a subset of the subpixels exclusive to the other pixel sets claim 1 , wherein at least two of the subpixels in each pixel set have a different specific optical property.3. The color image display device as claimed in claim 2 , wherein the subpixels for one of the pixel sets have a same respective at least one specific optical property as the subpixels for another ...

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Номер записи: 34
24-01-2019 дата публикации

Light redirecting film

Номер: US20190025480A1
Автор: Chen-Kuan Kuo, Cyun-Tai HONG, Fung-Hsu Wu
Принадлежит: BenQ Materials Corp

A light redirecting film in a sandwich-laminated structure is provided. The light redirecting film comprises a first layer, a second layer; and an intermediate layer sandwiched between the first layer and the second layer. The intermediate layer includes a first grating surface having a plurality of first gratings extending in a first grating direction and a second grating surface opposite to the first grating surface having a plurality of second gratings extending in a second grating direction, wherein the first grating direction and the second grating direction cross each other at an angle of 90°±10°, and the first grating surface and the second grating surface of the intermediate layer are gap-filled and planarized with the first layer and the second layer respectively to generate the light redirecting film.

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Номер записи: 35
24-01-2019 дата публикации

PHOTONICS GRATING COUPLER AND METHOD OF MANUFACTURE

Номер: US20190025520A1
Автор: Frish Harel
Принадлежит:

A structure for coupling an optical signal between an integrated circuit photonic structure and an external optical fiber is disclosed as in a method of formation. The coupling structure is sloped relative to a horizontal surface of the photonic structure such that light entering or leaving the photonic structure is substantially normal to its upper surface. 1. A photonic coupler , comprising:a substrate having an upper surface;a photonic element disposed over the substrate;a sloped grating disposed over the substrate for redirecting light into or out of the photonic element, the sloped grating configured to redirect light from a horizontal direction substantially parallel to the upper surface of the substrate to a vertical direction substantially orthogonal to the horizontal direction; anda lower cladding disposed between the substrate and the photonic element, the lower cladding having a horizontal portion and a sloped portion.2. The photonic coupler of claim 1 , further comprising an upper cladding material over the photonic element and the sloped grating claim 1 , the upper cladding material having an upper surface that is substantially parallel to the upper surface of the substrate.3. The photonic coupler of claim 1 , wherein the sloped grating comprises spaced grooves in a sloped portion of the photonic element claim 1 , the spaced grooves being oriented substantially vertically relative to the upper surface of the substrate.4. The photonic coupler of claim 3 , wherein the spaced grooves have a depth from an upper surface of the photonic element to the bottom of the grooves in the range of about 270 nm to about 280 nm.5. The photonic coupler of claim 3 , wherein the spaced grooves have a period of about 498 nm.6. A photonic coupler claim 3 , comprising:a photonic element provided having a horizontal portion and a sloped portion;a sloped grating formed at sloped portion of the photonic element and configured to direct light into or out of the photonic element;a ...

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Номер записи: 36
24-01-2019 дата публикации

Systems, devices, and methods for embedding a diffractive element in an eyeglass lens

Номер: US20190025592A1
Автор: Arnett Weber, Darren Ihmels, Eric J. Caliston, Michael A. T. Fowler, Nils Johan Fransson, Robin W. Tsen
Принадлежит: North Inc

Systems, devices, and methods for embedding a diffractive element in an eyeglass lens are described. A method of embedding a diffractive element in an eyeglass lens includes applying a protective layer to a diffractive element, applying an interface layer to the protective layer, and applying a lens layer to the interface layer. The interface layer and the lens layer are each comprised of a resin material that hardens when cured. The interface layer is of a shape and thickness that adheres well to the protective layer after the interface layer is cured. The lens layer is of a shape and thickness that achieves the desired component shape of the lens after the lens layer is cured.

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Номер записи: 37
24-01-2019 дата публикации

Systems, devices, and methods for embedding a diffractive element in an eyeglass lens

Номер: US20190025597A1
Автор: Arnett Weber, Darren Ihmels, Eric J. Caliston, Michael A. T. Fowler, Nils Johan Fransson, Robin W. Tsen
Принадлежит: North Inc

Systems, devices, and methods for embedding a diffractive element in an eyeglass lens are described. A method of embedding a diffractive element in an eyeglass lens includes applying a protective layer to a diffractive element, applying an interface layer to the protective layer, and applying a lens layer to the interface layer. The interface layer and the lens layer are each comprised of a resin material that hardens when cured. The interface layer is of a shape and thickness that adheres well to the protective layer after the interface layer is cured. The lens layer is of a shape and thickness that achieves the desired component shape of the lens after the lens layer is cured.

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Номер записи: 38
24-01-2019 дата публикации

Light redirecting film and method for manufacturing the same

Номер: US20190025605A1
Автор: Chen-Kuan Kuo, Chuen-Nan Shen, Chung-Hung Chien, Cyun-Tai HONG, Fung-Hsu Wu, Hung-Jiun Shieh, Tsung-Chi Yeh
Принадлежит: BenQ Materials Corp

A light redirecting film and a method for manufacturing the same are provided. The light redirecting film comprises a substrate, a first diffraction grating layer of a first curable resin on the substrate and a second diffraction grating layer of a second curable resin on the first diffraction grating layer. Wherein the grating directions of the first diffraction grating layer and the second diffraction grating layer cross each other at an angle of 90±10°, and the difference of the refractive index of the first curable resin and the second curable resin is no less than 0.1 and no more than 0.3.

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Номер записи: 39
24-01-2019 дата публикации

Systems, devices, and methods for embedding a diffractive element in an eyeglass lens

Номер: US20190025929A1
Автор: Arnett Weber, Darren Ihmels, Eric J. Caliston, Michael A. T. Fowler, Nils Johan Fransson, Robin W. Tsen
Принадлежит: North Inc

Systems, devices, and methods for embedding a diffractive element in an eyeglass lens are described. A method of embedding a diffractive element in an eyeglass lens includes applying a protective layer to a diffractive element, applying an interface layer to the protective layer, and applying a lens layer to the interface layer. The interface layer and the lens layer are each comprised of a resin material that hardens when cured. The interface layer is of a shape and thickness that adheres well to the protective layer after the interface layer is cured. The lens layer is of a shape and thickness that achieves the desired component shape of the lens after the lens layer is cured.

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Номер записи: 40
23-01-2020 дата публикации

Monolithic Structured Light Projector

Номер: US20200025985A1
Автор: Boucart Julien, Teissier Jean Axel Edmond
Принадлежит: II-VI Delaware, Inc.

A structured light projector for generating a far-field image of light dots in a defined pattern is proposed, where the structured light projector includes a light source providing as an output a non-collimated light beam and a specialized diffractive optical element disposed to intercept the non-collimated light beam. The specialized diffractive optical element is formed to exhibit a non-uniform pattern of grating features configured to compensate for the non-planar wavefront and phase retardation of the non-collimated output beam, providing as an output of the projector an interference pattern of light dots exhibiting the desired configuration. 1. A structured light projector for generating a far-field image of light dots in a defined pattern , comprising:a light source providing as an output a non-collimated light beam; anda specialized diffractive optical element disposed to intercept the non-collimated light beam, the specialized diffractive optical element comprising a non-uniform pattern of a plurality of grating features configured to both compensate for wavefront and phase retardation of the non-collimated beam, and diffract the compensated beam to create as an output an interference pattern of light dots exhibiting the defined pattern.2. The structured light projector as defined in wherein the non-uniform pattern of the plurality of grating features comprises a non-uniform spacing between adjacent grating features.3. The structured light projector as defined in wherein the non-uniform spacing increases in size as measured from a center region of the specialized diffractive optical element outward.4. The structured light projector as defined in wherein the non-uniform pattern of the plurality of grating features comprises a non-uniform thickness of individual grating features forming the plurality of grating features.5. The structured light projected as defined in wherein the thickness of the grating features decreases as measured from a center region of ...

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Номер записи: 41
23-01-2020 дата публикации

Methods of Diffractive Lens and Mirror Fabrication

Номер: US20200025987A1
Автор: Kimball Brian, Roberts David E., Serak Svetlana, Steeves Diane, Tabirian Nelson V.
Принадлежит:

Methods of fabricating optical lenses and mirrors, systems and composite structures based on diffractive waveplates, and fields of application of said lenses and mirrors that include imaging systems, astronomy, displays, polarizers, optical communication and other areas of laser and photonics technology. Diffractive lenses and mirrors of shorter focal length and larger size, with more closely spaced grating lines, and with more exacting tolerances on the optical characteristics, can be fabricated than could be fabricated by previous methods. 1. A method for creating an alignment layer usable for fabricating a diffractive waveplate lens , the method comprising the steps of:generating a monochromatic, linearly-polarized incident beam of radiation;converting the linearly-polarized radiation to circular polarization with a first quarter wave plate;providing a refractive lens assembly containing a birefringent layer;producing a selected nonlinear dependence of optical retardation on radial distance from the center of said assembly, with the circularly polarized light from the first quarter-wave plate incident on said assembly;producing discontinuities of an integral number of waves in the optical path difference with said birefringent layer;converting beam output of the assembly from circular polarization to linear polarization with a second quarter wave plate; andproviding a thin film of material that is photoaligned by the linearly polarized output of the second quarter-wave plate.2. The method of claim 1 , in which the birefringent layer consists of a layer of liquid crystal between two solid substrates claim 1 , one of which is flat claim 1 , and the other of which has physical discontinuities that result in optical path difference discontinuities of an integer multiple of wavelengths; with a liquid crystal layer aligned in the same direction throughout said birefringent layer.3. The method of claim 1 , in which the birefringent layer consists of a thin solid ...

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Номер записи: 42
28-01-2021 дата публикации

MULTI-LEVEL DIFFRACTIVE OPTICAL ELEMENT THIN FILM COATING

Номер: US20210026051A1
Автор: Miller John Michael, WILLS Gonzalo
Принадлежит:

A transmissive optical element may include a substrate. The transmissive optical element may include a first anti-reflectance structure for a particular wavelength range formed on the substrate. The transmissive optical element may include a second anti-reflectance structure for the particular wavelength range formed on the first anti-reflectance structure. The transmissive optical element may include a third anti-reflectance structure for the particular wavelength range formed on the second anti-reflectance structure. The transmissive optical element may include at least one layer disposed between the first anti-reflectance structure and the second anti-reflectance structure or between the second anti-reflectance structure and the third anti-reflectance structure. 120-. (canceled)21. A method , comprising:depositing a plurality of layers onto a substrate;depositing a first mask and a second mask on a top layer of the plurality of layers, the first mask having a different pattern than the second mask;etching a first subset of layers, of the plurality of layers, at a first location that is not covered by the first mask or the second mask;removing the first mask, without removing the second mask, to expose a second location of the first subset of layers; and a first anti-reflectance structure at the first subset of layers;', 'a second anti-reflectance structure at the second subset of layers; and', 'a third anti-reflectance structure., 'the three or more-level relief profile including, 'etching the second location of the first subset of layers and the first location of a second subset of layers, of the plurality of layers, that are not covered by the second mask to form a three or more-level relief profile within the plurality of layers,'}22. The method of claim 21 , further comprising:removing the second mask after etching the second location of the first subset of layers and the first location of the second subset of layers.23. The method of claim 21 , wherein the ...

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Номер записи: 43
28-01-2021 дата публикации

DIFFRACTION DEVICE, SPECTROSCOPIC APPARATUS, AND MANUFACTURING METHOD OF DIFFRACTION DEVICE

Номер: US20210026052A1
Автор: Sukegawa Takashi
Принадлежит:

A diffraction device includes a ZnS member and a ZnSe member coupled to the ZnS member, and a diffraction grating is provided on the ZnSe member. 1. A diffraction device comprising a ZnS member and a ZnSe member coupled to the ZnS member , wherein a diffraction grating is provided on the ZnSe member.2. The device according to claim 1 , wherein the device is configured as an immersion diffraction device.3. The device according to claim 1 , wherein the diffraction grating is a blazed diffraction grating.4. The device according to claim 1 , wherein a maximum thickness of the ZnSe member is within a range of not less than 150 μm and not more than 1 claim 1 ,000 μm.5. The device according to claim 1 , wherein the ZnS member includes a first face and a second face claim 1 , the ZnSe member is coupled to the first face claim 1 , a second ZnSe member is coupled to the second face claim 1 , and a second diffraction grating is provided on the second ZnSe member.6. The device according to claim 5 , wherein a periodic direction of the diffraction grating and a periodic direction of the second diffraction grating are orthogonal to each other.7. The device according to claim 5 , wherein a grating interval of the diffraction grating is larger than a grating interval of the second diffraction grating.8. The device according to claim 1 , wherein the diffraction grating is configured to be capable of spectrally dispersing light in an infrared region.9. A spectroscopic apparatus comprising an optical system that includes a diffraction device claim 1 ,wherein the diffraction device comprises a ZnS member and a ZnSe member coupled to the ZnS member, a diffraction grating being provided on the ZnSe member.10. A manufacturing method of manufacturing a diffraction device claim 1 , comprising:forming a structure in which a ZnS member and a ZnSe member are coupled to each other; andprocessing to form a diffraction grating on the ZnSe member in the structure.11. The method according to claim ...

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Номер записи: 44
02-02-2017 дата публикации

Optical element manufacturing method

Номер: US20170028657A1
Автор: Jungo Kondo, Keiichiro Asai, Shoichiro Yamaguchi, Toshihiro Tomita
Принадлежит: NGK Insulators Ltd

It is produced an optical element including a support substrate, a clad layer provided on the support substrate, an optical material layer provided on the clad layer and a fine pattern formed in the optical material layer. The optical element has a warpage of +70 μm or more and +2.0 mm or less. At least a resin layer is formed on the optical material layer. It is used a mold with a design pattern corresponding to the fine pattern formed therein. The design pattern is transferred to the resin layer by an imprinting method. The fine pattern is formed in the optical material layer by a dry etching method. The mold is capable of being deformed conforming to a curve of the resin layer.

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Номер записи: 45
28-01-2021 дата публикации

PLASMA ETCHING METHOD USING FARADAY BOX

Номер: US20210027996A1
Автор: Jang Song Ho, Jo Geun Sik, KANG Soo Hee, KIM Chung Wan
Принадлежит:

A plasma etching method using a Faraday cage which is capable of inhibiting the formation of a needle-like structure and forming a pattern portion having a depth gradient on an etching base. 1. A plasma etching method using a Faraday cage , the plasma etching method comprising:providing an etching base in the Faraday cage, wherein the Faraday cage has a mesh part provided on an upper side of the Faraday cage;shielding at least a part of the mesh part with a shutter; andforming a pattern portion on the etching base by performing plasma etching on the etching base while moving the shutter in a direction from an outer portion of the Faraday cage to a central portion of the Faraday cage to prepare a patterned etching base,wherein a depth of the pattern portion gradually changes in a direction from one side of the etching base to an opposite side of the etching base.2. The plasma etching method of claim 1 , wherein the shutter is moved at a speed that changes in the direction from the outer portion of the Faraday cage to the central portion of the Faraday cage.3. The plasma etching method of claim 1 , wherein the shutter is moved at a speed of 1 mm/min or more and 500 mm/min or less.4. The plasma etching method of claim 1 , wherein a spacing distance between the etching base and the mesh part is 1 mm or more and 35 mm or less.5. The plasma etching method of claim 1 , wherein the plasma etching includes adjusting an ICP power of a plasma etching device to 0.1 kW or more and 4 kW or less and adjusting a RF power of the plasma etching device to 10 W or more and 200 W or less.6. The plasma etching method of claim 1 , wherein the plasma etching includes adjusting an operating pressure of a plasma etching device to 1 mTorr or more and 30 mTorr or less.7. The plasma etching method of claim 1 , wherein the plasma etching includes supplying a gas mixture including a reactive gas and an oxygen gas to a plasma etching device at a flow rate of 10 sccm or more and 200 sccm or less.8. ...

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Номер записи: 46
02-02-2017 дата публикации

Writing of high mechanical strength fiber bragg gratings using ultrafast pulses and a phase mask

Номер: US20170031090A1
Автор: Francois Trepanier, Julien Carrier, Martin Bernier, Real Vallee
Принадлежит: UNIVERSITE LAVAL

Methods and systems for writing a Bragg grating along a grating region of an optical fiber through a polymer coating of the optical fiber are provided. A light beam of ultrafast optical pulses is impinged on the grating region, the ultrafast optical pulses being characterised by writing wavelength at the grating region to which the polymer coating is substantially transparent The light beam is diffracted through a phase mask so as to form an interference pattern defining the Bragg grating at the grating region of the optical fiber. The light beam is also focussed such that the intensity of the optical pulses is below a damage threshold within the polymer coating, and above an FBG inscription threshold within the grating region of the fiber. Optical fiber having Bragg gratings and improved mechanical are also provided.

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Номер записи: 47
02-02-2017 дата публикации

Optical element and manufacturing method therefor

Номер: US20170031096A1
Автор: Jungo Kondo, Keiichiro Asai, Shoichiro Yamaguchi, Toshihiro Tomita
Принадлежит: NGK Insulators Ltd

An optical element includes a support substrate and an optical material layer provided over the support substrate. A first fine pattern is formed on the surface of the support substrate. When forming the optical material layer, a second fine pattern, to which the first fine pattern P 3 is transferred, is formed on the surface of the optical material layer.

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Номер записи: 48
02-02-2017 дата публикации

PRODUCTION METHOD FOR MOUNTING STRUCTURE FOR GRATING ELEMENTS

Номер: US20170031097A1
Автор: ASAI Keiichiro, Ejiri Tetsuya, Kondo Jungo, OKADA Naotake, YAMAGUCHI Shoichiro
Принадлежит: NGK Insulators, Ltd.

A plurality of Bragg gratings are formed at predetermined locations of a laminate including a mounting substrate, a clad layer provided on the mounting substrate and an optical material layer provided on the clad layer. Optical waveguides are formed each including at least each of the Bragg gratings. Masks are formed each covering a region corresponding to each of the grating elements on the optical material layer. The optical material layer and clad layer are etched to shape an end face of each of the grating elements. 1. A method for producing a mounting structure comprising a mounting substrate and a plurality of grating elements provided over said mounting substrate , the method comprising the steps of:forming a plurality of Bragg gratings at predetermined locations of a laminate comprising said mounting substrate, a clad layer provided on said mounting substrate and an optical material layer provided on said clad layer;forming optical waveguides each including at least each of said Bragg gratings;forming masks each covering a region corresponding to each of said grating elements on said optical material layer; andetching said optical material layer and said clad layer to shape an end face of each of said grating elements.2. The method of claim 1 , further comprising the step of forming an upper side clad layer on said optical material layer and a single layer film on said end face of said grating element claim 1 , after shaping said end face of each of said grating elements.3. The method of claim 1 , wherein said optical waveguide comprises a ridge type optical waveguide claim 1 , said method further comprising the step of etching said optical material layer to form ridge grooves for shaping said ridge optical waveguide.4. The method of claim 1 , further comprising the step of forming said Bragg gratings by a nanoimprinting method.5. The method of claim 1 , wherein a clearance is provided between said grating elements adjacent to each other on said mounting ...

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Номер записи: 49
04-02-2016 дата публикации

MICROFABRICATION

Номер: US20160033697A1
Автор: Levola Tapani, Saarikko Pasi, Sainiemi Lauri
Принадлежит:

Microfabrication processes and apparatuses for fabricating microstructures on a substrate are disclosed. The substrate has a current diffraction grating pattern formed by current surface modulations over at least a portion of the substrate's surface that exhibit a substantially uniform grating linewidth over the surface portion. An immersion depth of the substrate in a fluid for patterning the substrate is gradually changed so that different points on the surface portion are immersed for different immersion times. The fluid changes the linewidth of the surface modulations at each immersed point on the surface portion by an amount determined by the immersion time of that point, thereby changing the current diffraction grating pattern to a new diffraction grating pattern formed by new surface modulations over the surface portion that exhibit a spatially varying grating linewidth that varies over the surface portion. 1. A microfabrication process for fabricating microstructures on a substrate , the substrate having a current diffraction grating pattern formed by current surface modulations over at least a portion of the substrate's surface that exhibit a substantially uniform grating linewidth over the surface portion , the process comprising:gradually changing an immersion depth of the substrate in a fluid, the fluid for patterning the substrate, so that different points on the surface portion are immersed in the fluid for different immersion times;wherein the fluid changes the linewidth of the surface modulations at each immersed point on the surface portion by an amount determined by the immersion time of that point, thereby changing the current diffraction grating pattern to a new diffraction grating pattern formed by new surface modulations over the surface portion that exhibit a spatially varying grating linewidth that varies over the surface portion.2. A microfabrication process according to wherein the current surface modulations are formed by modulations of ...

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Номер записи: 50
01-02-2018 дата публикации

THIN FILM TOTAL INTERNAL REFLECTION DIFFRACTION GRATING FOR SINGLE POLARIZATION OR DUAL POLARIZATION

Номер: US20180031744A1
Автор: "OLeary Michael", Miller John Michael, Tian Lu, WILLS Gonzalo
Принадлежит:

A diffraction grating may include a substrate. The diffraction grating may include an etch stop layer to prevent etching of the substrate. The etch stop layer may be deposited on the substrate. The diffraction grating may include a marker layer to indicate an etch end-point associated with etching of a dielectric layer. The marker layer may be deposited on a portion of the etch stop layer. The diffraction grating may include the dielectric layer to form a grating layer after being etched. The dielectric layer may be deposited on at least the marker layer. 1. A diffraction grating , comprising:a substrate; 'the etch stop layer being deposited on the substrate;', 'an etch stop layer to prevent etching of the substrate,'} 'the marker layer being deposited on a portion of the etch stop layer; and', 'a marker layer to indicate an etch end-point associated with etching of a dielectric layer,'} 'the dielectric layer being deposited on at least the marker layer.', 'the dielectric layer to form a grating layer after being etched,'}2. The diffraction grating of claim 1 , further comprising: 'the encapsulation layer being deposited on at least the grating layer.', 'an encapsulation layer to protect the grating layer after etching of the dielectric layer,'}3. The diffraction grating of claim 1 , where the marker layer is formed of tantala claim 1 , silica or silicon nitride.4. The diffraction grating of claim 1 , where a thickness of the marker layer is less than or equal to approximately 50 nanometers.5. The diffraction grating of claim 1 , where a first diffraction efficiency (DE) of the diffraction grating is greater than 96 percent and a second DE of the diffraction grating is less than approximately 2 percent claim 1 ,the first DE corresponding to a transverse-magnetic polarization, andthe second DE corresponding to a transverse-electric polarization.6. The diffraction grating of claim 1 , where a first diffraction efficiency (DE) of the diffraction grating and a second DE ...

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Номер записи: 51
01-02-2018 дата публикации

Metamaterial optical filter and method for producing the same

Номер: US20180031749A1
Автор: Andrew Yick, Efthymios Kallos, Georgios PALIKARAS, John Cormier, Michael Wenyon, Thierry Leger
Принадлежит: Metamaterial Technologies Inc

A metamaterial optical filter including: a transparent substrate; and a photosensitive polymer layer provided to the transparent substrate, wherein the photosensitive polymer layer is treated using a laser to form a non-conformal holographically patterned subwavelength grating, the holographic grating configured to block a predetermined wavelength of electromagnetic radiation. A system and method for manufacturing holographically patterned subwavelength grating onto the photosensitive polymer layer including: applying a photosensitive polymer layer to a transparent substrate; placing the photosensitive polymer layer between a laser and a mirror; scanning the laser over the photosensitive polymer layer such that a holographic grating is created within the photosensitive polymer layer by interaction between the laser light and light reflected from the mirror; and stacking two or more holographically patterned subwavelength grating layers to form complex metamaterial optical filter stacks.

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Номер записи: 52
05-02-2015 дата публикации

METHOD FOR PRODUCING A DIFFRACTION GRATING

Номер: US20150034591A1
Автор: Van Amerongen Aaldert Hide, Vink Henri Johannes Petrus, Visser Huibert
Принадлежит:

A manufacturing method for a grating is disclosed for the angular dispersion of light impinging the grating. The grating comprises tapered structures and cavities. A cavity width and/or corrugation amplitude is varied for achieving a desired grating efficiency according to calculation. A method is disclosed for conveniently creating gratings with variable cavity width and/or corrugation amplitude. The method comprises the step of anisotropically etching a groove pattern into a grating master. Optionally a replica is produced that is complementary to the grating master. By variation of an etching resist pattern, the cavity width of the grating may be varied allowing the optimization towards different efficiency goals. 1. Method of manufacturing a master grating for diffracting light of a particular wavelength impinging the master grating or a replica grating of the master grating with a particular angle of incidence , the master grating comprising an array of grooves running in parallel along a planar face of the master grating , the grooves distanced by a grating period; the grooves comprising a triangular profile with flat interfaces , wherein one of the interfaces forms a blaze angle with respect to the planar face; wherein the method comprisesproviding a wafer comprising a substantially mono-crystalline material, the material having first, second, and third crystal planes, wherein the first and second crystal planes intersect each other at an intersection angle; the wafer being cut along a wafer surface having a cut angle equal to the blaze angle with respect to the first crystal plane;applying an etching resistant material to parts of the wafer surface in a pattern of parallel strips, the centers of the strips distanced by the grating period, wherein exposed parts of the wafer surface are formed between the strips;applying an anisotropic etching process to the wafer surface that etches faster in a direction normal to the third crystal plane than in a direction ...

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Номер записи: 53
04-02-2021 дата публикации

SECURITY ELEMENTS AND METHODS OF MANUFACTURE THEREOF

Номер: US20210031554A1
Автор: FOURNIER Fred, HOLMES Brian, KING Maria
Принадлежит: DE LA RUE INTERNATIONAL LIMITED

A security element including: a first layer having a first surface; an array of image regions across the first surface arranged along at least a second direction, each region including at least a first image sub-region having an average inclination defining an angle, relative to a plane of the security element, about an image region axis extending along a first direction; a diffractive optically variable effect generating structure provided in or on the first surface across the first image sub-regions, the structure including diffractive elements that extend along a direction within 45° of the first direction, wherein the structure is provided across the first image sub-regions and spatially arranged and/or modulated across the first image sub-regions in accordance with a first image so the first image is displayed by the first image sub-regions in combination at least at a first viewing angle. Also, a method of manufacturing the security element. 1. A security element comprising:a first layer having a first surface;an array of image regions across the first surface arranged along at least a second direction, each image region comprising at least a first image sub-region having an average inclination defining an angle, relative to a plane of the security element, about an image region axis extending along a first direction;a diffractive optically variable effect generating structure provided in or on the first surface across the first image sub-regions, the diffractive optically variable effect generating structure comprising diffractive elements that extend along a direction within 45° of the first direction, wherein the diffractive optically variable effect generating structure is provided across the first image sub-regions and spatially arranged and/or modulated across the first image sub-regions in accordance with a first image such that the first image is displayed by the first image sub-regions in combination at least at a first viewing angle.2. A security ...

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Номер записи: 54
17-02-2022 дата публикации

APPARATUS AND TECHNIQUES FOR ANGLED ETCHING USING MULTIELECTRODE EXTRACTION SOURCE

Номер: US20220051880A1
Автор: Evans Morgan, Kurunczi Peter F., Olson Joseph C.
Принадлежит: Applied Materials, Inc.

A plasma source may include a plasma chamber, where the plasma chamber has a first side, defining a first plane and an extraction assembly, disposed adjacent to the side of the plasma chamber, where the extraction assembly includes at least two electrodes. A first electrode may be disposed immediately adjacent the side of the plasma chamber, wherein a second electrode defines a vertical displacement from the first electrode along a first direction, perpendicular to the first plane, wherein the first electrode comprises a first aperture, and the second electrode comprises a second aperture. The first aperture may define a lateral displacement from the second aperture along a second direction, parallel to the first plane, wherein the vertical displacement and the lateral displacement define a non-zero angle of inclination with respect to a perpendicular to the first plane. 1. A method of patterning a substrate , comprising:providing the substrate, wherein a main surface of the substrate defines a substrate plane, wherein the substrate comprises a grating layer and a base layer, subjacent the grating layer;generating a plasma in a plasma chamber, adjacent to the substrate; andapplying an extraction voltage to an extraction assembly, adjacent the plasma chamber, the extraction assembly comprising at least two electrodes, wherein a first electrode is disposed immediately adjacent a side of the plasma chamber, the side of the plasma chamber defining a first plane, wherein a second electrode defines a vertical displacement from the first electrode along a first direction, perpendicular to the first plane, wherein the at least two electrodes define an angled extraction tunnel, disposed at a non-zero angle of inclination with respect to a perpendicular to the substrate plane,wherein an angled ion beam is extracted from the extraction assembly, the angled ion beam defining a non-zero angle of incidence with respect to the substrate plane,wherein the angled ion beam etches the ...

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Номер записи: 55
30-01-2020 дата публикации

Diffractive optical elements with mitigation of rebounce-induced light loss and related systems and methods

Номер: US20200033604A1
Автор: Frank Y. Xu, Jeffrey Dean SCHMULEN, Kang LUO, Kevin MESSER, Marlon Edward Menezes, Matthew Grant Dixon, Neal Paul RICKS, Samarth Bhargava, Shuqiang Yang, Victor Kai LIU, Vikramjit Singh, Xiaopei Deng
Принадлежит: Magic Leap Inc

Display devices include waveguides with in-coupling optical elements that mitigate re-bounce of in-coupled light to improve overall in-coupling efficiency and/or uniformity. A waveguide receives light from a light source and/or projection optics and includes an in-coupling optical element that in-couples the received light to propagate by total internal reflection in a propagation direction within the waveguide. Once in-coupled into the waveguide the light may undergo re-bounce, in which the light reflects off a waveguide surface and, after the reflection, strikes the in-coupling optical element. Upon striking the in-coupling optical element, the light may be partially absorbed and/or out-coupled by the optical element, thereby effectively reducing the amount of in-coupled light propagating through the waveguide. The in-coupling optical element can be truncated or have reduced diffraction efficiency along the propagation direction to reduce the occurrence of light loss due to re-bounce of in-coupled light, resulting in less in-coupled light being prematurely out-coupled and/or absorbed during subsequent interactions with the in-coupling optical element.

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Номер записи: 56
04-02-2021 дата публикации

MICROLITHOGRAPHIC FABRICATION OF STRUCTURES

Номер: US20210033968A1
Автор: Singh Vikramjit
Принадлежит:

Asymmetric structures formed on a substrate and microlithographic methods for forming such structures. Each of the structures has a first side surface and a second side surface, opposite the first side surface. A profile of the first side surface is asymmetric with respect to a profile of the second side surface. The structures on the substrate are useful as a diffraction pattern for an optical device. 1. (canceled)2. An optical device comprising:a substrate; anda diffraction pattern on the substrate, the diffraction pattern comprising a plurality of asymmetric structures extending from a common surface of the substrate,wherein each structure of the plurality of asymmetric structures has a first side surface and a second side surface opposite the first side surface, and a profile of the first side surface is asymmetric with respect to a profile of the second side surface.3. The device of claim 2 , wherein each structure of the plurality of asymmetric structures has an asymmetric triangular profile.4. The device of claim 2 , wherein each structure of the plurality of asymmetric structures has an asymmetric chair-like profile comprising a linear profile of the first side surface and an angled profile of the second side surface.5. The device of claim 2 , wherein each structure of the plurality of asymmetric structures has an asymmetric stepped profile comprising a linear profile of the first side surface and a stepped profile of the second side surface.6. The device of claim 2 , wherein a recess is defined between adjacent structures of the plurality of asymmetric structures.7. The device of claim 6 , wherein a surface of the recess is substantially parallel to a surface of the substrate.8. The device of claim 2 , wherein the asymmetric structures comprise one of Si claim 2 , SiO claim 2 , a polymer material claim 2 , or an organic-inorganic hybrid material.9. The device of claim 2 , wherein the structures are nano-structures.10. The device of claim 2 , wherein the ...

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Номер записи: 57
11-02-2016 дата публикации

GROUP III NITRIDE SEMICONDUCTOR LIGHT-EMITTING DEVICE AND PRODUCTION METHOD THEREFOR

Номер: US20160043274A1
Автор: GOSHONOO Koichi, KANTO Toru
Принадлежит:

The present invention provides a Group III nitride semiconductor light-emitting device which attains suitable light extraction to the outside by reflecting the light directed from a substrate to a semiconductor layer toward the substrate, and a production method therefor. The light-emitting device comprises a substrate, a buffer layer, an n-type semiconductor layer, a light-emitting layer, a p-type semiconductor layer, and a plurality of dielectric multilayer films. The dielectric multilayer films are disposed on the first surface of the substrate. The first surface of the substrate has at least a bottom surface. The buffer layer is formed on at least a part of the bottom surface. The dielectric multilayer films have inclined planes inclined to the bottom surface. The n-type semiconductor layer is formed on the buffer layer and the inclined planes of the dielectric multilayer films. 1. A Group III nitride semiconductor light-emitting device comprising:a substrate having a first surface;a buffer layer disposed on at least a part of the first surface of the substrate;a first conduction type first semiconductor layer disposed on the buffer layer;a light-emitting layer disposed on the first semiconductor layer; anda second conduction type second semiconductor layer on the light-emitting layer;wherein a plurality of dielectric multilayer films are provided on the first surface side of the substrate;the first surface of the substrate has at least a flat surface;the buffer layer is formed on at least a part of the flat surface;each of the dielectric multilayer films has an inclined plane inclined to the flat surface; andthe first semiconductor layer is formed on the buffer layer and the inclined planes of the dielectric multilayer films.2. A Group III nitride semiconductor light-emitting device according to claim 1 , wherein the first surface of the substrate has a plurality of protrusions claim 1 , the dielectric multilayer films cover at least a part of the surfaces of ...

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Номер записи: 58
06-02-2020 дата публикации

NANOGRATING METHOD AND APPARATUS

Номер: US20200041712A1
Автор: Jurbergs David, Luo Kang, MELLI Mauro, Menezes Marlon Edward, Miller Michael Nevin, Peroz Christophe, Schmulen Jeffrey Dean, Singh Vikramjit, Wang Zongxing, Xu Frank Y., Yang Shuqiang
Принадлежит: Magic Leap, Inc.

A method of manufacturing a waveguide having a combination of a binary grating structure and a blazed grating structure includes cutting a substrate off-axis, depositing a first layer on the substrate, and depositing a resist layer on the first layer. The resist layer includes a pattern. The method also includes etching the first layer in the pattern using the resist layer as a mask. The pattern includes a first region and a second region. The method further includes creating the binary grating structure in the substrate in the second region and creating the blazed grating structure in the substrate in the first region. 1. A method of manufacturing a waveguide having a multi-level binary grating structure , the method comprising:coating a first etch stop layer on a first substrate;adding a second substrate on the first etch stop layer;depositing a first resist layer on the second substrate, wherein the first resist layer includes at least one first opening;depositing a second etch stop layer on the second substrate in the at least one first opening;removing the first resist layer from the second substrate;adding a third substrate on the second substrate and the second etch stop layer;depositing a second resist layer on the third substrate, wherein the second resist layer includes at least one second opening;depositing a third etch stop layer on the third substrate in the at least one second opening;removing the second resist layer from the third substrate;etching the second substrate and the third substrate, leaving the first substrate, the first etch stop layer, the second etch stop layer and the second substrate in the at least one first opening, and the third etch stop layer and the third substrate in the at least one second opening; andetching an exposed portion of the first etch stop layer, an exposed portion of the second etch stop layer, and the third etch stop layer, forming the multi-level binary grating.2. The method of claim 1 , wherein the first ...

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Номер записи: 59
19-02-2015 дата публикации

Method for Manufacturing Holographic Bi-Blazed Grating

Номер: US20150048047A1
Автор: Chen Minghui, Liu Quan, Wu Jianhong
Принадлежит:

A method for manufacturing a holographic bi-blazed grating. Two blaze angles of the holographic bi-blazed grating are respectively a blaze angle A and a blaze angle B, and oblique-ion beam etching is performed on two grating areas A and B respectively by using a photoresist grating () and a homogeneous grating () as masks, thereby implementing different controls on the two blaze angles, and avoiding a secondary photoresist lithography process. Because when manufacturing the homogeneous grating (), the time of positive ion beam etching can be controlled, so that the groove depth of the homogeneous grating () is controlled accurately. In addition, because the homogeneous grating mask and a substrate () are made of the same material, etching rates of the two are consistent, so that the accurate control of blaze angles can be implemented. 1. A method for fabricating a holographic bi-blazed grating , wherein: two blaze angles of the holographic bi-blazed grating are respectively a blaze angle A and a blaze B , and the bi-blazed grating is divided into two regions with a grating region A corresponding to the blaze angle A and a grating region B corresponding to the blaze angle B; the fabricating method comprises the following steps:1) coating a photoresist layer on a substrate, wherein a thickness of the photoresist layer depends on the blaze angle A;2) performing lithography on the photoresist layer to form a photoresist grating for fabricating the blaze angle A;3) shielding the grating region B, performing tilted-Ar ion beam etching on the substrate by using the photoresist grating as a mask to etch different portions of the substrate in the grating region A with an obscuring effect of the photoresist grating mask on the ion beam, to form a blazed grating with the blaze angle A;4) shielding the grating region A, and performing vertical ion beam etching on the substrate in the grating region B by using the photoresist grating as a mask, to form a homogeneous grating in ...

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Номер записи: 60
18-02-2016 дата публикации

MANUFACTURING METHOD OF GRATING

Номер: US20160047957A1
Автор: CHEN MO, LI QUN-QING, ZHANG LI-HUI, ZHU ZHEN-DONG
Принадлежит:

A method for making a grating includes the following steps. A first photoresist film is formed on a substrate. A second photoresist film is applied on the first photoresist film. A number of first cavities are formed in the second photoresist film, wherein part of the first photoresist film is exposed to form a first exposed part. A number of second cavities are formed, wherein part of the surface of the substrate is exposed to form an exposed surface. A mask layer is deposited on the second photoresist film and the exposed surface of the substrate. A patterned mask layer is formed, and part of the substrate is exposed to form a second exposed part. The second exposed part of the substrate is etched through the patterned mask layer. The patterned mask layer is removed. 1. A manufacturing method of a grating , the method comprising:forming a first photoresist film on a surface of a substrate;applying a second photoresist film on a surface of the first photoresist film away from the substrate;forming a plurality of first cavities in the second photoresist film by nanoimprinting the second photoresist film, wherein part of the first photoresist film is exposed through the plurality of first cavities to form a first exposed part;forming a plurality of second cavities by etching the first exposed part of the first photoresist film, wherein part of the surface of the substrate is exposed through the plurality of second cavities to form an exposed surface;depositing a mask layer on the second photoresist film and the exposed surface of the substrate;forming a patterned mask layer by removing the first photoresist film, the second photoresist film, and a portion of the mask layer deposited on the second photoresist film, wherein the patterned mask layer defines a plurality of third cavities, and part of the substrate is exposed through the plurality of third cavities to form a second exposed part;etching the second exposed part of the substrate through the patterned mask ...

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Номер записи: 61
19-02-2015 дата публикации

Methods for manufacturing grating sheet and lcd panel

Номер: US20150050804A1
Автор: Linlin LU
Принадлежит: Beijing BOE Optoelectronics Technology Co Ltd, BOE Technology Group Co Ltd

Methods for manufacturing the grating sheet and a liquid crystal display panel are provided. The grating sheet comprises a plurality of primary color gratings in parallel, each of which comprises a red R sub-grating, a green G sub-grating and a blue B sub-grating in parallel, and each sub-grating comprises an opening area and a reflective region disposed around the opening area and corresponds to a pixel unit on a sub-array substrate. The methods for manufacturing the grating sheet and a liquid crystal display panel may be applicable to a system with a liquid crystal display.

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Номер записи: 62
03-03-2022 дата публикации

CHOLESTERIC LIQUID CRYSTAL LAYER AND METHOD FOR FORMING CHOLESTERIC LIQUID CRYSTAL LAYER

Номер: US20220066076A1
Автор: Saitoh Yukito, Sasata Katsumi, Sato Hiroshi
Принадлежит: FUJIFILM Corporation

Provided are a cholesteric liquid crystal layer that diffracts specific circularly polarized light in a specific wavelength range by transmission, and a method of forming the cholesteric liquid crystal layer. The cholesteric liquid crystal layer is obtained by immobilizing a cholesteric liquid crystalline phase, in which the cholesteric liquid crystal layer has a liquid crystal alignment pattern in which a direction of an optical axis derived from a liquid crystal compound changes while continuously rotating in at least one in-plane direction, in a cross-section of the cholesteric liquid crystal layer observed with a scanning electron microscope, bright portions and dark portions derived from the cholesteric liquid crystalline phase are tilted at 80° or more with respect to a main surface of the cholesteric liquid crystal layer.

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Номер записи: 63
14-02-2019 дата публикации

MULTIPLEXED HOLOGRAM TILING IN A WAVEGUIDE DISPLAY

Номер: US20190049727A1
Автор: Bohn David D., Nguyen Ian, Robbins Steve, Yuan Sheng
Принадлежит: Microsoft Technology Licensing, LLC

Embodiments related near-eye display devices having angularly multiplexed holograms are disclosed. One disclosed embodiment provides a near-eye display device including an image source, a waveguide, and a controller. The waveguide is configured to propagate light received the image source to a user of the near-eye display device, and includes a holographic grating comprising a plurality of angularly multiplexed holograms. The controller is configured to control display of an image via the image source. 1. A method of manufacturing a waveguide for a near-eye display device , the method comprising:forming a first holographic recording by reproducing a master hologram at a light coupling interface of the waveguide via laser light directed at a first angle relative to the master hologram;forming a second holographic recording by reproducing the master hologram at the light coupling interface of the waveguide in spatially overlapping relation to the first holographic recording via laser light directed at a second, different angle relative to the master hologram.2. The method of claim 1 , further comprising positioning a mask between a laser providing the laser light and the master hologram claim 1 , wherein openings of the mask are positioned in a same location during the forming of the first holographic recording and the forming of the second holographic recording.3. The method of claim 1 , further comprising forming one or more additional holographic recordings claim 1 , each additional holographic recording being recorded by laser beams having at a different incident angle relative to other holographic recordings.4. The method of claim 1 , wherein the light coupling interface is an output grating claim 1 , and the method further comprising forming an input grating comprising angularly multiplexed holograms.5. The method of claim 4 , wherein the output grating is a first grating and the input grating is a second grating claim 4 , the method further comprising forming a ...

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Номер записи: 64
25-02-2016 дата публикации

OPTICAL FILM, OPTICAL FILM MANUFACTURING METHOD AND SURFACE LIGHT-EMITTING BODY

Номер: US20160054489A1
Автор: HANAFUSA Akihiro, KOSHITOUGE Haruki, Kurita Yusuke
Принадлежит: MITSUBISHI RAYON CO., LTD.

This optical film includes a diffraction grating layer made of a transparent material, and a concavo convex surface structure layer made of a transparent material. The surface light-emitting body includes the aforementioned optical film. This optical film manufacturing method involves supplying a second active energy ray curable composition between a substrate and a mold having a diffractive grating transfer part, irradiating second active energy rays to obtain a laminate having a diffractive grating layer on convex structure transfer part, and irradiating first active energy rays. 1. An optical film comprising:a surface relief structure layer that is composed of a first transparent material and has a relief structure; anda diffraction grating layer composed of a second transparent material.2. The optical film according to claim 1 , wherein the second transparent material is a resin.3. The optical film according to claim 1 , wherein a refractive index of the second transparent material is from 1.30 to 1.80.4. The optical film according to claim 1 , wherein a pitch of a diffraction grating of the diffraction grating layer is from 0.2 to 5 μm.5. The optical film according to claim 1 , wherein a height of a diffraction grating of the diffraction grating layer is from 0.4 to 5 μm.6. The optical film according to claim 1 , wherein the first transparent material is a resin.7. The optical film according to claim 1 , wherein the relief structure of the surface relief structure layer is spherical.8. The optical film according to claim 1 , wherein the surface relief structure layer further contains light-diffusing fine particles.9. The optical film according to claim 8 , wherein a volume average particle size of the light-diffusing fine particles is from 1 to 10 μm.10. The optical film according to claim 8 , wherein a content of the light-diffusing fine particles in the surface relief structure layer is from 1 to 50% by mass.11. The optical film according to claim 1 , wherein ...

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Номер записи: 65
25-02-2021 дата публикации

OUTWARD COUPLING SUPPRESSION IN WAVEGUIDE DISPLAY

Номер: US20210055460A1
Автор: Calafiore Giuseppe, Huang Ningfeng, Lee Hee Yoon, MOHANTY Nihar Ranjan, Saarikko Pasi, SHI YU
Принадлежит:

A pupil replication waveguide for a projector display includes a slab of transparent material for propagating display light in the slab via total internal reflection. A diffraction grating is supported by the slab. The diffraction grating includes a plurality of tapered slanted fringes in a substrate for out-coupling the display light from the slab by diffraction into a blazed diffraction order. A greater portion of the display light is out-coupled into the blazed diffraction order, and a smaller portion of the display light is out-coupled into a non-blazed diffraction order. The tapered fringes result in the duty cycle of the diffraction grating varying along the thickness direction of the diffraction grating, to facilitate suppressing the portion of the display light out-coupled into the non-blazed diffraction order. 1. A pupil replication waveguide comprising:a slab of transparent material for propagating display light therein via total internal reflection;a diffraction grating supported by the slab and comprising a plurality of fringes formed by a twisted nematic (TN) liquid crystal (LC) material in a polymer substrate, wherein the fringes are slanted for out-coupling the display light from the slab by diffraction into a blazed diffraction order, wherein a greater portion of the display light is out-coupled into the blazed diffraction order, and a smaller portion of the display light is out-coupled into a non-blazed diffraction order;{'sub': O', 'E, 'wherein the TN LC material has an ordinary refractive index nfor light polarized perpendicular to molecules of the TN LC material, and an extraordinary refractive index nfor light polarized parallel to the molecules of the TN LC material, wherein a refractive index contrast for polarized display light impinging onto the diffraction grating has a refractive index contrast profile along a thickness direction of the diffraction grating;'}wherein a refractive index contrast is larger at a middle than at both sides of ...

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Номер записи: 66
13-02-2020 дата публикации

DIFFRACTIVE OPTICAL ELEMENT, OPTICAL APPARATUS USING THE SAME, AND METHOD FOR MANUFACTURING DIFFRACTIVE OPTICAL ELEMENT

Номер: US20200049870A1
Автор: Kubo Kazuto
Принадлежит:

A diffractive optical element includes a substrate, a first resin layer formed on the substrate and having a diffraction grating shape including a plurality of wall surfaces and a plurality of slopes, a second resin layer formed in close contact with the first resin layer, a high refractive-index portion formed on the plurality of wall surfaces of the first resin layer and having a higher refractive index than the first and the second resin layers, and a close contact portion discontinuous with the high refractive-index portion, wherein the close contact portion is formed on the plurality of slopes of the first resin layer, and wherein a thickness of the close contact portion is smaller than a height of the plurality of wall surfaces. 1. A diffractive optical element comprising:a substrate;a first resin layer formed on the substrate and having a diffraction grating shape including a plurality of wall surfaces and a plurality of slopes;a second resin layer formed in close contact with the first resin layer;a high refractive-index portion formed on the plurality of wall surfaces of the first resin layer and having a higher refractive index than the first and the second resin layers; anda close contact portion discontinuous with the high refractive-index portion,wherein the close contact portion is formed on the plurality of slopes of the first resin layer, andwherein a thickness of the close contact portion is smaller than a height of the plurality of wall surfaces.2. The diffractive optical element according to claim 1 , wherein the thickness of the close contact portion is 1/400 or more and 1/50 or less times the height of the plurality of wall surfaces.3. The diffractive optical element according to claim 1 , wherein the thickness of the close contact portion is 10 nm or more and 200 nm or less.4. The diffractive optical element according to claim 1 , further comprising a center and an outer edge claim 1 , wherein the thickness of the close contact portion ...

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Номер записи: 67
22-02-2018 дата публикации

Display, article, original plate, and method for producing original plate

Номер: US20180052262A1
Автор: Akira Nagano
Принадлежит: Toppan Printing Co Ltd

In display, in a plan view facing an obverse surface of a reflection layer, first reflection surfaces are substantially square in shape, and a second reflection surface occupies gaps between adjacent ones of the first reflection surfaces. The distance between the first reflection surfaces and the second reflection surface in the thickness direction of a substrate has an extent that the obverse surface of the reflection layer emit colored light by interference between light reflected from the first reflection surfaces and light reflected from the second reflection surface. In a plan view facing the obverse surface of the reflection layer, more than one of the first reflection surfaces are located on each of a plurality of imaginary lines. On a straight line intersecting more than one of the imaginary lines, distances between adjacent ones of the imaginary lines have different extents.

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Номер записи: 68
14-02-2019 дата публикации

FABRICATION OF MULTILAYER NANOGRATING STRUCTURES

Номер: US20190051863A1
Автор: Basuray Sagnik, Bok Sangho, CHEN Biyan, Gangopadhyay Keshab, Gangopadhyay Shubhra, Grant Sheila, MATHAI Cherian Joseph, PATHAN Samiullah, Wood Aaron
Принадлежит:

Provided are nanograting structures and methods of fabrication thereof that allow for stable, robust gratings and nanostructure embedded gratings that enhance electromagnetic field, fluorescence, and photothermal coupling through surface plasmon or, photonic resonance. The gratings produced exhibit long term stability of the grating structure and improved shelf life without degradation of the properties such as fluorescence enhancement. Embodiments of the invention build nanograting structures layer-by-layer to optimize structural and optical properties and to enhance durability. 1. A method of manufacturing a nanoscale grating structure , comprising the steps of:spin-coating a mold in a solution of a polymer dissolved in a solvent;curing the solution of the polymer in the mold to obtain a grating;transferring the grating to a substrate;applying a hydrophilicity treatment to the grating;coating the treated grating in a fluorescence-enhancing reflective layer;coating the fluorescence-enhancing reflective layer with a protective layer.2. The method of claim 1 , wherein curing the solution of the polymer comprises exposing the polymer solution to ultraviolet light.3. The method of claim 1 , wherein curing the solution of the polymer comprises exposing the grating to 3-aminopropyltriethoxysilane.4. The method of claim 1 , further comprising the step of annealing the grating.5. The method of claim 4 , wherein the grating is annealed at 60 degrees Celsius for three hours claim 4 , then heated to 400 degrees Celsius at a rate of 1 degree Celsius per minute claim 4 , and then held at 400 degrees Celsius for one hour.6. The method of claim 1 , further comprising the step of applying an adhesion layer between the treated polymer grating and the fluorescence-enhancing reflective layer.7. The method of claim 6 , wherein the adhesion layer is made of titanium (IV) oxide.8. The method of claim 6 , wherein the adhesion layer is between approximately 5 nanometers thick and 10 ...

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Номер записи: 69
10-03-2022 дата публикации

Digital writing of large diffraction grating patterns

Номер: US20220075195A1
Автор: Marek W. Kowarz, Robert J. Schultz, Robert W. Gray
Принадлежит: Vuzix Corp

A method of fabricating a substrate includes providing a substrate having a flat surface and a beam writing system operable to write in a first direction and a second direction, wherein the second direction is perpendicular to the first direction, The method further includes providing a diffraction grating layout pattern having a first diffraction grating, a second diffraction grating, and a third diffraction grating. The method also includes locating the substrate in the beam writing system, whereby the beam writing system is operable to write into the flat surface, and aligning one of the first, second, and third diffraction gratings parallel with the beam writing system first direction. Additionally, the method includes writing the diffraction grating layout pattern into the substrate flat surface via the beam writing machine.

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Номер записи: 70
10-03-2022 дата публикации

Manufacturing a flowcell with a planar waveguide

Номер: US20220075263A1
Автор: Dajun Yuan, M. Shane Bowen, Zhong Mei
Принадлежит: Illumina Inc

Provided in one example is a method of manufacturing a flowcell that includes: forming a core layer, the core layer disposed between a substrate and a nanowell layer, the nanowell layer having nanowells to receive a sample, the core layer having a higher refractive index than the substrate and the nanowell layer; and forming a grating to couple light to the core layer.

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Номер записи: 71
21-02-2019 дата публикации

MULTI-LAYER THIN FILM STACK FOR DIFFRACTIVE OPTICAL ELEMENTS

Номер: US20190056531A1
Автор: Bagnald Stephen, Miller John Michael
Принадлежит:

An optical element may include a substrate. The optical element may include a first anti-reflectance structure for a particular wavelength range formed on the substrate. The optical element may include at least one layer disposed on a portion of the first anti-reflectance structure. The optical element may include a second anti-reflectance structure for the particular wavelength range formed on the at least one layer. A depth between a first surface of the first anti-reflectance structure and a second surface of the second anti-reflectance structure, a first index of refraction of the first anti-reflectance structure, a second index of refraction of the second anti-reflectance structure, and a third index of refraction of the at least one layer may be selected to form a diffractive optical element associated with a particular phase delay for the particular wavelength. 1. An optical element , comprising:a substrate;a first anti-reflectance structure for a particular wavelength range formed on the substrate;at least one layer disposed on a portion of the first anti-reflectance structure; and 'wherein a depth between a first surface of the first anti-reflectance structure and a second surface of the second anti-reflectance structure, a first index of refraction of the first anti-reflectance structure, a second index of refraction of the second anti-reflectance structure, and a third index of refraction of the at least one layer are selected to form a diffractive optical element associated with a particular phase delay for the particular wavelength.', 'a second anti-reflectance structure for the particular wavelength range formed on the at least one layer,'}2. The optical element of claim 1 , wherein the first anti-reflectance structure is formed onto a first side of the substrate; and 'an anti-reflectance coating formed on a second side of the substrate.', 'further comprising3. The optical element of claim 1 , wherein the first anti-reflectance structure is an etch ...

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Номер записи: 72
21-02-2019 дата публикации

MULTI-LEVEL DIFFRACTIVE OPTICAL ELEMENT THIN FILM COATING

Номер: US20190056542A1
Автор: Miller John Michael, WILLS Gonzalo
Принадлежит:

A transmissive optical element may include a substrate. The transmissive optical element may include a first anti-reflectance structure for a particular wavelength range formed on the substrate. The transmissive optical element may include a second anti-reflectance structure for the particular wavelength range formed on the first anti-reflectance structure. The transmissive optical element may include a third anti-reflectance structure for the particular wavelength range formed on the second anti-reflectance structure. The transmissive optical element may include at least one layer disposed between the first anti-reflectance structure and the second anti-reflectance structure or between the second anti-reflectance structure and the third anti-reflectance structure. 1. A transmissive optical element , comprising:a substrate;a first anti-reflectance structure for a particular wavelength range formed on the substrate;a second anti-reflectance structure for the particular wavelength range formed on the first anti-reflectance structure;a third anti-reflectance structure for the particular wavelength range formed on the second anti-reflectance structure; and 'wherein a first relief depth between a first surface of the first anti-reflectance structure and a second surface of the second anti-reflectance structure and a second relief depth between the first surface and a third surface of the third anti-reflectance structure are configured to form a diffractive optical element associated with a first phase delay and a second phase delay, respectively, for the particular wavelength range.', 'at least one layer disposed between the first anti-reflectance structure and the second anti-reflectance structure or between the second anti-reflectance structure and the third anti-reflectance structure,'}2. The transmissive optical element of claim 1 , wherein the first phase delay is a π/2 phase delay and the second phase delay is a π phase delay.3. The transmissive optical element of ...

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Номер записи: 73
01-03-2018 дата публикации

NANOGRATING METHOD AND APPARATUS

Номер: US20180059297A1
Автор: Jurbergs David, Luo Kang, MELLI Mauro, Menezes Marlon Edward, Miller Michael Nevin, Peroz Christophe, Schmulen Jeffrey Dean, Singh Vikramjit, Wang Zongxing, Xu Frank Y., Yang Shuqiang
Принадлежит: Magic Leap, Inc.

A method of manufacturing a waveguide having a combination of a binary grating structure and a blazed grating structure includes cutting a substrate off-axis, depositing a first layer on the substrate, and depositing a resist layer on the first layer. The resist layer includes a pattern. The method also includes etching the first layer in the pattern using the resist layer as a mask. The pattern includes a first region and a second region. The method further includes creating the binary grating structure in the substrate in the second region and creating the blazed grating structure in the substrate in the first region. 1. A method of manufacturing a waveguide having a combination of a binary grating structure and a blazed grating structure , the method comprising:cutting a substrate off-axis;depositing a first layer on the substrate;depositing a resist layer on the first layer, wherein the resist layer includes a pattern;etching the first layer in the pattern using the resist layer as a mask, wherein the pattern includes a first region and a second region;removing the resist layer;coating a first polymer layer in the first region of the pattern;etching the substrate in the second region of the pattern, creating the binary grating structure in the substrate in the second region;removing the first polymer layer;coating a second polymer layer in the second region of the pattern;etching the substrate in the first region of the pattern, creating the blazed grating structure in the substrate in the first region;removing the second polymer layer; andremoving the first layer from the substrate.2. The method of claim 1 , wherein the substrate comprises silicon.3. The method of claim 1 , wherein the first layer comprises silicon dioxide.4. The method of claim 1 , wherein the resist layer is deposited using lithography.5. The method of claim 1 , wherein etching the substrate in the second region of the pattern includes dry etching the substrate.6. The method of claim 1 , ...

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Номер записи: 74
01-03-2018 дата публикации

METHOD FOR TUNING ONE OR MORE RESONATOR(S)

Номер: US20180059412A1
Автор: Baker Christopher, Favero Ivan, Gil Santos Eduardo
Принадлежит:

The invention concerns a method for tuning at a targeted resonance wavelength at least one micro and/or nanophotonic resonator, the resonator having dimensions defining resonance wavelength of said resonator, the resonator being immersed in a fluid containing ions so that the resonator is surrounded by said fluid, wherein the method comprises a step of injecting light, having a light wavelength equal to the resonance wavelength, into the resonator, so that the injected light resonates within the resonator and triggers a photo-electrochemical etching process enabled by the surrounding fluid containing ions, said etching process being enhanced by the optical resonance which amplifies light intensity in the photonic resonator, the etching decreasing dimensions of the photonic resonator, hereby lowering and tuning the resonance wavelength of the photonic resonator. 1. Method for tuning at a targeted resonance wavelength (λt) at least one micro and/or nanophotonic resonator ,the resonator having dimensions defining resonance wavelength (λr) of said resonator,the resonator being immersed in a fluid containing ions so that the resonator is surrounded by said fluid,wherein the method comprises a step of injecting light, having a light wavelength equal to the resonance wavelength (λr), into the resonator,so that the injected light (λ) resonates within the resonator and triggers a photo-electrochemical etching process enabled by the surrounding fluid containing ions, said etching process being enhanced by the optical resonance which amplifies light intensity in the photonic resonator,the etching decreasing dimensions of the photonic resonator, hereby lowering and tuning the resonance wavelength (λr) of the photonic resonator.2. Method according to claim 1 , wherein the photonic resonator has a bandgap wavelength (lambda B) set by its constitutive material and the wavelength (λ) of the injected light is above the resonator bandgap wavelength (lambda B)3. Method according to ...

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Номер записи: 75
02-03-2017 дата публикации

SKEW MIRRORS, METHODS OF USE, AND METHODS OF MANUFACTURE

Номер: US20170059759A1
Автор: ANDERSON Kenneth E., AYRES MARK R., Sissom Bradley J., Urness Adam
Принадлежит:

An optical reflective device referred to as a skew mirror, having a reflective axis that need not be constrained to surface normal, is described. Examples of skew mirrors are configured to reflect light about a constant reflective axis across a relatively wide range of wavelengths. In some examples, a skew mirror has a constant reflective axis across a relatively wide range of angles of incidence. Exemplary methods for making and using skew mirrors are also disclosed. Skew mirrors include a grating structure, which in some examples comprises a hologram. 1. A skew mirror comprising: the grating structure is configured to reflect first incident light, the first incident light being incident upon the grating medium at a specific site and having a first wavelength and a first internal angle of incidence relative to grating medium surface normal;', 'the first incident light is principally reflected by the grating medium as first reflected light, the first reflected light having the first wavelength and a first internal angle of reflection relative to the surface normal;', 'the first incident light and the first reflected light are bisected by a first reflective axis having a first reflective axis angle relative to the surface normal;', 'the grating structure is further configured to reflect second incident light, the second incident light being incident on the grating medium at the specific site and having a second wavelength and a second internal angle of incidence relative to the surface normal;', 'the second incident light is principally reflected by the grating medium as second reflected light, the second reflected light having the second wavelength and a second internal angle of reflection relative to the surface normal;', 'the second incident light and the second reflected light are bisected by a second reflective axis having a second reflective axis angle relative to the surface normal;', 'the first internal angle of incidence is the same as the second internal ...

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Номер записи: 76
20-02-2020 дата публикации

Grating with plurality of layers

Номер: US20200057198A1
Автор: Di Liang, Geza Kurczveil, Raymond G. Beausoleil
Принадлежит: HEWLETT PACKARD ENTERPRISE DEVELOPMENT LP

A hybrid grating comprises a first grating layer composed of a first solid-state material, and a second grating layer over the first grating layer and composed of a second solid-state material, the second solid state-material being different than the first solid-state material and having a monocrystalline structure.

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Номер записи: 77
04-03-2021 дата публикации

Evacuating bragg gratings and methods of manufacturing

Номер: US20210063634A1
Автор: Alastair John Grant, Baeddan George Hill, Jonathan David Waldern, Milan Momcilo Popovich, Shibu Abraham
Принадлежит: DigiLens Inc

Improvements to gratings for use in waveguides and methods of producing them are described herein. Deep surface relief gratings (SRGs) may offer many advantages over conventional SRGs and Bragg gratings, an important one being a higher S-diffraction efficiency. In one embodiment, deep SRGs can be implemented as polymer surface relief gratings or evacuated Bragg gratings (EBGs). EBGs can be formed by first recording a holographic polymer dispersed liquid crystal (HPDLC) grating. Removing the liquid crystal from the cured grating provides a polymer surface relief grating. Polymer surface relief gratings have many applications including for use in waveguide-based displays.

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Номер записи: 78
04-03-2021 дата публикации

Methods of optical device fabrication using an electron beam apparatus

Номер: US20210066036A1
Автор: Chien-An Chen, Kartik Ramaswamy, Ludovic Godet, Manivannan Thothadri, Rutger MEYER TIMMERMAN THIJSSEN, Yang Yang
Принадлежит: Applied Materials Inc

Aspects of the disclosure relate to apparatus for the fabrication of waveguides. In one example, an angled ion source is utilized to project ions toward a substrate to form a waveguide which includes angled gratings. In another example, an angled electron beam source is utilized to project electrons toward a substrate to form a waveguide which includes angled gratings. Further aspects of the disclosure provide for methods of forming angled gratings on waveguides utilizing an angled ion beam source and an angled electron beam source.

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Номер записи: 79
27-02-2020 дата публикации

FACETED GEMSTONE WITH ENHANCED COLOR DISPERSION AND DIMINISHED HAZE

Номер: US20200060394A1
Автор: Benderly David
Принадлежит:

Incident light enters a faceted gemstone and is routed along optical paths to exit the gemstone as emergent light. At least one diffraction grating is patterned on the gemstone in an asymmetrical manner relative to an axis of symmetry. The diffraction grating has a diffractive structure positioned on at least one facet for diffracting the light being routed along at least one of the optical paths to enhance color dispersion of the emergent light. The diffraction grating is the only diffraction grating to diffract the light being routed along the at least one optical path to diminish haze of the emergent light. 1. A gemstone constituted of a light-transmissive material having a refractive index greater than air , an axis of symmetry , and a plurality of cut facets on which incident light entering the material is routed along optical paths through the material to exit the material as emergent light , the gemstone comprising:at least one diffraction grating patterned on the material in an asymmetrical manner relative to the axis of symmetry, the at least one diffraction grating having a diffractive structure positioned on at least one of the facets for diffracting the light being routed along at least one of the optical paths to enhance color dispersion of the emergent light, and the at least one diffraction grating being the only diffraction grating to diffract the light being routed along the at least one optical path to diminish haze of the emergent light.2. The gemstone of claim 1 , wherein the material has an upper faceted portion and a lower faceted portion; and wherein the cut facets are symmetrically arranged about the axis of symmetry on the lower faceted portion claim 1 , and wherein the cut facets are inclined relative to the axis to reflect the light incident thereon by total internal reflection.3. The gemstone of claim 1 , wherein the at least one diffraction grating has periodic diffractive features.4. The gemstone of claim 1 , wherein there is a ...

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Номер записи: 80
17-03-2022 дата публикации

Method of building a 3d functional optical material layer stacking structure

Номер: US20220082738A1
Автор: Christopher Dennis Bencher, Ludovic Godet, Michael Yu-Tak Young, Naamah ARGAMAN, Robert Jan Visser, Wayne Mcmillan
Принадлежит: Applied Materials Inc

Embodiments herein describe a sub-micron 3D diffractive optics element and a method for forming the sub-micron 3D diffractive optics element. In a first embodiment, a method is provided for forming a sub-micron 3D diffractive optics element on a film stack disposed on a substrate without planarization. The method includes forming a hardmask on a top surface of a film stack. Forming a mask material on a portion of the top surface and a portion of the hardmask. Etching the top surface. Trimming the mask. Etching the top surface again. Trimming the mask a second time. Etching the top surface yet again and then stripping the mask material.

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Номер записи: 81
17-03-2022 дата публикации

TECHNIQUES FOR MANUFACTURING VARIABLE ETCH DEPTH GRATINGS USING GRAY-TONE LITHOGRAPHY

Номер: US20220082739A1
Автор: Colburn Matthew E., FRANKE Elliott, LANE Austin, MOHANTY Nihar Ranjan, Vora Ankit
Принадлежит:

A method of fabricating gratings with variable grating depths including depositing a first grating material layer with a uniform thickness profile on a substrate, forming an etch mask layer having a variable thickness profile on the first grating material layer, etching the etch mask layer and the first grating material layer to change the uniform thickness profile of the first grating material layer to a non-uniform thickness profile, forming a patterned hard mask on the first grating material layer, and etching, using the patterned hard mask, the first grating material layer to form a grating with a variable depth in the first grating material layer. 1. A method comprising:depositing a first grating material layer with a uniform thickness profile on a substrate;forming an etch mask layer having a variable thickness profile on the first grating material layer;etching the etch mask layer and the first grating material layer to change the uniform thickness profile of the first grating material layer to a non-uniform thickness profile;forming a patterned hard mask on the first grating material layer; andetching, using the patterned hard mask, the first grating material layer to form a grating with a variable depth in the first grating material layer.2. The method of claim 1 , wherein forming the etch mask layer having the variable thickness profile on the first grating material layer comprises:depositing a photoresist material layer on the first grating material layer, the photoresist material layer sensitive to exposure light and having a non-binary response to exposure dosage;exposing, through a variable transparency photomask, the photoresist material layer to the exposure light for a period of time; anddeveloping the photoresist material layer to remove portions of the photoresist material layer exposed to the exposure light to form the etch mask layer having the variable thickness profile on the first grating material layer.3. The method of claim 1 , wherein the ...

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Номер записи: 82
17-03-2022 дата публикации

OPTICAL FILTER AND CORRESPONDING MANUFACTURING METHOD

Номер: US20220082743A1
Автор: Le Neel Olivier, MONFRAY Stéphane, Zoll Stephane
Принадлежит:

An optical filter includes a carrier layer made of a first material. A periodic grating of posts is disposed on the carrier layer in a periodic pattern configured by characteristic dimensions. The posts are made of a second material. A layer made of a third material encompasses the periodic grating of posts and covers the carrier layer. The third material has a refractive index that is different from a refractive index of the second material. Characteristic dimensions of the periodic grating of posts are smaller than an interfering wavelength and are configured to selectively reflect light at the interfering wavelength on the periodic grating of posts. 1. An optical filter , including:a carrier layer comprising a first material;a periodic grating of posts disposed on the carrier layer in a periodic pattern configured by characteristic dimensions, the periodic grating of posts comprising a second material; anda layer comprising a third material encompassing the periodic grating of posts and covering the carrier layer, the third material having a refractive index that is different from a refractive index of the second material;wherein characteristic dimensions of the periodic grating of posts are smaller than an interfering wavelength and configured such that the periodic grating of posts selectively reflects light at the interfering wavelength.2. The optical filter according to claim 1 , wherein the first material claim 1 , the second material claim 1 , and the third material are selected such that the optical filter is transparent to light claim 1 , except at the interfering wavelength claim 1 , having a wavelength comprised in a wavelength range comprising the interfering wavelength.3. The optical filter according to claim 1 , wherein each post of the periodic grating of posts has a cylindrical shape with a diameter and a height claim 1 , and wherein the characteristic dimensions comprise said diameter and said height.4. The optical filter according to claim 1 , ...

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Номер записи: 83
29-05-2014 дата публикации

GRATING STRUCTURE FOR DIVIDING LIGHT

Номер: US20140144506A1
Автор: ENGHETA NADER, IIZUKA Hideo, TAKEDA Yasuhiko
Принадлежит:

A grating structure and a solar cell assembly. In one aspect, the grating structure suppresses the zero order transmission to near 0%. In another aspect, the solar cell assembly has improved absorption due to coupling with a grating structure. 118-. (canceled)19. A solar cell assembly comprisingan absorption layer for absorbing light and converting the light into electrical energy;a first grating layer disposed on a first side of the absorption layer; anda second grating layer disposed on a second side of the absorption layer, the second side being opposite the first side.20. The solar cell assembly according to claim 19 , wherein the first grating layer claim 19 , the second grating layer claim 19 , and the absorption layer form a sandwich structure claim 19 , the absorption layer being located between the first layer and the second layer.21. The solar cell assembly according to claim 19 , wherein the first grating layer and the second grating layer comprise lossless dielectrics.22. The solar cell assembly according to claim 19 , wherein the first grating layer is formed by alternating portions of a first lossless dielectric and a second lossless dielectric.23. The solar cell assembly according to claim 22 , wherein the first lossless dielectric has a different permittivity than the second lossless dielectric.24. The solar cell assembly according to claim 23 , wherein the first lossless dielectric has a permittivity of about 2.25 and the second lossless dielectric has a permittivity of about 6.25.25. A method of splitting a light beam comprising:providing a grating with rectangular grooves and ridges;providing an light beam substantially normal to the grating;splitting the unpolarized light beam such that the zero order transmission is suppress to near 0%.26. The method according to claim 25 , wherein the angle of the first order transmission is at least 40 degrees.27. The method according to claim 25 , wherein the angle of the first order transmission is about 50 ...

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Номер записи: 84
17-03-2022 дата публикации

Nanostamping Method and Nano-Optical Component

Номер: US20220082935A1
Автор: Knorr Fabian
Принадлежит:

In an embodiment a nanostamping method includes forming a nanostructure in a layer of optical embossing material on a first carrier substrate by a forming stamp having a nano-relief, wherein the nanostructure comprises a plurality of nano-elevations which are connected via an embossing material base, generating a coated nanostructure by covering the nano-elevations with a filler material layer, wherein the filler material layer and the optical embossing material comprise different refractive indices, applying a second carrier substrate on the coated nanostructure, detaching the first carrier substrate and removing a material of the embossing material base. 115.-. (canceled)16. A nanostamping method for manufacturing a nano-optical component , the method comprising:forming a nanostructure in a layer of optical embossing material on a first carrier substrate by a forming stamp having a nano-relief, wherein the nanostructure comprises a plurality of nano-elevations which are connected via an embossing material base;generating a coated nanostructure by covering the nano-elevations with a filler material layer, wherein the filler material layer and the optical embossing material comprise different refractive indices;applying a second carrier substrate on the coated nanostructure;detaching the first carrier substrate; andremoving a material of the embossing material base.17. The nanostamping method according to claim 16 , further comprising applying a protective coating to a component surface exposed by the material removal of the embossing material base.18. The nanostamping method according to claim 17 , wherein a difference of the real parts of the refractive indices of the protective coating and the filler material layer is smaller than 0.1 for a wavelength range from 380 nm to 780 nm.19. The nanostamping method according to claim 17 , wherein a difference of the real parts of the refractive indices of the protective coating and the filler material layer is smaller ...

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Номер записи: 85
28-02-2019 дата публикации

METHOD OF MANUFACTURING NANO METAL GRATING AND NANO METAL GRATING MANUFACTURED THEREBY

Номер: US20190064406A1
Автор: HOU Jun, LU MACAI
Принадлежит: SHENZHEN CHINA STAR OPTOELECTRONICS TECHNOLOGY CO., LTD.

A method of manufacturing a nano metal grating is provided. In the method, a patterned metal oxide film is formed on a surface of the metal layer through the formation of metal oxides in an oxygen ashing process, and the nano metal grating is manufactured by using the patterned metal oxide film as a mask. Thus, a drawback that the metal layer cannot be etched after the metal layer is oxidized is solved, and the metal oxide film is not only used as a mask to manufacture the nano metal grating, but the metal oxide film is also used as a protective layer of the nano metal grating. 1. A method of manufacturing a nano metal grating , comprising steps of:providing a substrate formed with a metal layer thereon, wherein the metal layer is made of aluminum;forming a to-be-imprinted resin layer on the metal layer;providing an imprinting template having a grating cycle pattern for imprinting the to-be-imprinted resin layer, wherein the grating cycle pattern includes periodic grating grooves;curing the to-be-imprinted resin layer, removing the imprinting template after curing the to-be-imprinted resin layer, to form an imprinted resin having the grating cycle pattern, and to leave an imprinted resin residue on a bottom of the grating cycle pattern of the imprinted resin;performing an oxygen ashing process to remove the imprinted resin residue on the bottom of the grating cycle pattern, to expose the metal layer under the bottom of the grating cycle pattern, so that the exposed metal layer reacts with oxygen to form a metal oxide film;removing the imprinted resin having the grating cycle pattern; andusing the metal oxide film as a mask to pattern the metal layer, to form the nano metal grating.2. A method of manufacturing a nano metal grating , comprising steps of:providing a substrate formed with a metal layer thereon;forming an to-be-imprinted resin layer on the metal layer;providing an imprinting template having a grating cycle pattern for imprinting the to-be-imprinted resin ...

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Номер записи: 86
08-03-2018 дата публикации

AUTOMATED SYSTEM FOR TRANS-JACKET FIBRE BRAGG GRATING INSCRIPTION AND MANUFACTURING

Номер: US20180067254A1
Автор: COULAS David, Ding Huimin, GROBNIC Dan, HNATOVSKY Cyril, LAUSTEN Rune, LU Ping, MIHAILOV Stephen, Walker Robert
Принадлежит:

There is provided an alignment system and method for use in an ultrashort pulse duration laser-based Fiber Bragg Grating (FBG) writing system, the alignment system comprising: clamps configured to hold a coated optical fiber in a position perpendicular to a beam path of an ultrashort pulse duration laser-based FBG writing station; an optical detector; and a control system with an input from the optical detector and an output to adjust parameters of an optical source and the FBG writing station adjust a distance between the optical fiber and an optical source of the writing station based on luminescence generated in a core of the optical fiber as indicated in a signal received at the input from the optical detector. 1. An alignment system for use in an ultrashort pulse duration laser-based Fiber Bragg Grating (FBG) writing system , the electromagnetic radiation having a pulse duration of less than or equal to 5 picoseconds , and the wavelength of the electromagnetic radiation having a characteristic wavelength in the wavelength range from 150 nm to 3.0 microns , the alignment system comprising:a holder configured to hold an optical fiber in a position perpendicular to a beam path of an ultrashort pulse duration laser-based FBG writing station;an optical detector; anda control system with an input from the optical detector and an output to adjust parameters of an optical writing source and the FBG writing station based on photoluminescence generated in the optical fiber as indicated in a signal received at the input from the optical detector.2. The alignment system of claim 1 , wherein the optical fiber is coated.3. The alignment system of claim 1 , wherein an external light source is coupled into the core of the optical fiber.4. The alignment system of claim 3 , wherein the optical detector is positioned to visualize/image ultrashort pulse duration laser induced modification in the optical fiber based on collecting a scattered component of external light source that ...

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Номер записи: 87
24-03-2022 дата публикации

LASER MARKED OPTICALLY VARIABLE DEVICE

Номер: US20220088958A1
Автор: Crisan Silviu, THURAILINGAM Thivaharan
Принадлежит:

A security device for security documents provides an angle-dependent Moire effect. A security device for a security document and method for making the security device are provided. At least two interlaced laser engraved images form an angle dependent parallax effect. First and second images are laser engraved at a substrate of the security document. To render the security device more difficult to copy, a colour changing effect or a nonreciprocal transmission effect may be achieved by adding a coloured (absorptive or emissive) layer between or within non-laser engravable layers situated between the laser engravable layers, and/or by adding a patterned phase diffraction grating situated between the laser engravable layers. 1. A security device for a security document comprising at least two interlaced laser engraved images forming an angle dependent parallax effect wherein first and second images are laser engraved at a surface of a substrate of the security document , and the security device comprises a colour image on or within at least one non-laser-engravable layer situated between laser engravable layers.2. A security device as claimed in claim 1 , wherein the colour image is in registration with the laser engraved images.3. A security device as claimed in claim 1 , wherein the first image is engraved on a front surface of the substrate and the second image is engraved on a back surface of the substrate.4. A security device as claimed in or further claim 1 , comprising at least two non-laser engravable layers claim 1 , wherein the colour image is situated between the at least two non-laser engravable layers.5. A security device as claimed in claim 1 , wherein the colour image is a passive colour image or an absorptive colour image.6. A security device as claimed in claim 1 , wherein the colour image is an active colour image or an emissive colour image.7. A security device for a security document comprising at least two interlaced laser engraved images forming an ...

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Номер записи: 88
17-03-2016 дата публикации

METHOD OF MANUFACTURING A MEMBER, OPTICAL MEMBER AND OPTICAL ELEMENT

Номер: US20160077250A1
Автор: Kojima Makoto, Nakayasu Tomonao, Okura Yukinobu, Tanaka Masato
Принадлежит:

An optical member having a concentric diffraction surface facing the outside, wherein the projection having a inclined surface concentric to the diffraction surface having an angle of inclination θ smaller than the angle of inclination φ is provided outside the diffraction surface having the largest φ, so that an interference of a cutting tool is avoided, and simultaneously, deterioration of a surface roughness may be restrained. 1. A method of manufacturing a member by rotating an object to be processed and processing a concentric surface while moving a cutting tool from an outer peripheral end portion of the object to be processed toward a center of rotation , comprising:{'sub': 1', '0, 'a first step of moving the cutting tool so that a gap angle formed between a feeding direction of the cutting tool and a side cutting edge of the cutting tool has a constant angle αto process a surface having an angle of inclination θ;'}{'sub': '2', 'a second step of moving the cutting tool so that the gap angle becomes a constant angle αto process a surface having an angle of inclination θ after the first step; and'}{'sub': '3', 'a third step of moving the cutting tool so that the gap angle becomes a constant angle αto process a surface having an angle of inclination φ after the second step, wherein'}{'sub': 1', '2', '3', '0', '0', '1, 'the gap angles α, α, and αare larger than 0 degree and not larger than 4 degrees, the angle of inclination θ, θ, and φ have a relationship of θ<θ<φ, and the angle of inclination θ is smaller than the angle α.'}2. The method of manufacturing a member according to claim 1 , wherein the angle of inclination θmeans that an angle formed with respect to a surface perpendicular to an optical axis is 0 degree.3. The method of manufacturing a member according to claim 1 , wherein the gap angle α claim 1 , α claim 1 , and αare set to be the same angle.4. The method of manufacturing a member according to claim 1 , wherein the member includes a glass lens ...

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Номер записи: 89
15-03-2018 дата публикации

Diffractive optical element and method of manufacturing the same

Номер: US20180074239A1
Автор: Maiko Niwa
Принадлежит: Canon Inc

A diffractive optical element prevents degradation of the optical performance of the element due to moisture absorption of the resin layers from taking place and also can prevent cracks of the resin layers and peeling of the resin layers along the interface thereof from taking place in a hot environment or in a cold environment. The diffractive optical element comprises a first layer and a second layer sequentially laid on a substrate, a diffraction grating being formed at the interface of the first layer and the second layer, the height d of the diffraction grating, the average film thickness t1 of the first layer and the average film thickness t2 of the second layer satisfying the relationship requirements expressed by the expressions of 1.1×d≦t 1 ≦50 μm and 30 μm≦t 2 ≦(400 μm−t 1 −d).

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Номер записи: 90
24-03-2022 дата публикации

DIFFRACTIVE PIGMENT

Номер: US20220091313A1
Автор: Argoitia Alberto, LIANG Kangning, SEYDEL Johannes P., ZIEBA Jaroslaw
Принадлежит: VIAVI SOLUTIONS INC.

A diffractive pigment includes diffractive pigment, includes a stack including alternating layers of a high refractive index layer and a low refractive index layer, in which the high refractive index layer is a composition including an organic material and high refractive index inorganic nanoparticles; in which at least one layer of the stack is embossed. A method of making a diffractive pigment is also disclosed. 1. A diffractive pigment , comprising:a stack including alternating layers of a high refractive index lay and a low refractive index layer, wherein the high refractive index layer is a composition including an organic material and high refractive index inorganic nanoparticles;wherein at least one layer of the stack is embossed.2. The diffractive pigment of claim 1 , wherein the pigment does not include a reflector layer.3. The diffractive pigment of claim 1 , wherein the organic material is at least one material chosen from thermoplastics claim 1 , thermosets claim 1 , and energy curable materials.4. The diffractive pigment of claim 1 , wherein the at least one layer of the stack is partially embossed.5. The diffractive pigment of claim 1 , wherein the inorganic nanoparticles can be present in the composition in an amount to achieve a desired refractive index.6. The diffractive pigment of claim 1 , wherein each layer of the alternating layers of the stack is partially embossed.7. The diffractive pigment of claim 1 , wherein each layer of the alternating layers of the stack is fully embossed.8. The diffractive pigment of claim 1 , wherein the low refractive index layer is a composition including low refractive index organic materials.9. The diffractive pigment of claim 1 , wherein the low refractive index layer is a composition including low refractive index inorganic nanoparticles.10. The diffractive pigment of claim 1 , wherein another of the alternating layer of the stack is non-embossed.11. The diffractive pigment of claim 1 , wherein a portion of the ...

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Номер записи: 91
24-03-2022 дата публикации

Fabrication of diffractive optic element having a variable refractive index profile by inkjet printing deposition

Номер: US20220091314A1
Автор: Daihua Zhang, Kang LUO, Ludovic Godet, Xiaopei Deng
Принадлежит: Applied Materials Inc

Embodiments of the present disclosure generally relate to optical devices. More specifically, embodiments described herein relate to optical devices and methods of manufacturing optical devices having optical device structures with at least one of varying depths or refractive indices across the surface of a substrate. According to certain embodiments, an inkjet process is used to deposit a volumetrically variable optical device that is etched to form a diffractive optic element (DOE). Volumetrically variable can relate to the thickness of the optical device, or the relative volume of two or more diffractive materials deposited in combination. According to other embodiments, a single-profile DOE is deposited on a substrate and an inkjet process deposits a volumetrically variable organic material over the DOE. The DOE and organic material are etched to modify the profile of the structure, after which the organic material is removed, leaving the modified-profile DOE.

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Номер записи: 92
05-03-2020 дата публикации

Non-Uniform Disordered Optical Gratings Formed Through Spontaneous Buckling For Improved Lighting Conditions

Номер: US20200071992A1
Автор: Alvine Kyle J., Bernacki Bruce E., DeVetter Brent M.
Принадлежит:

The present disclosure describes example methods and structures directed to a non-uniform disordered optical grating formed though spontaneous buckling. The non-uniform disordered optical grating, which can be used as part of a light-dispersing structure to improve lighting conditions, may be formed from a bilayer coating of polymeric materials that is deposited and cured on a sacrificial substrate. The light-dispersing structure effectuates the spreading of incident light without noticeable chromatic dispersion due to its stochastic patterning, thus enhancing daylight penetration and improving lighting conditions. 1. A method of forming a non-uniform disordered optical grating for a daylighting application , the method comprising:depositing a second layer of a second polymer material over a first layer of a first polymer material to form a bilayer coating, wherein the second layer of the second polymer material has a mechanical stiffness that is less than that of the first layer of the first polymer material; andbuckling the bilayer coating to form the non-uniform disordered optical grating.2. The method of claim 1 , further comprising:depositing the first layer of the first polymer material onto a sacrificial substrate.3. The method of claim 1 , wherein the first polymer material comprises polystyrene.4. The method of claim 3 , wherein the second polymer material comprises polydimethysiloxane.5. The method of claim 1 , wherein the second polymer material comprises polydimethysiloxane.6. The method of claim 1 , wherein the first polymer material comprises polyurethane.7. The method of claim 6 , wherein the second polymer material comprises polyethylene terephthalate.8. The method of claim 1 , wherein the second polymer material comprises polyethylene terephthalate.9. The method of claim 1 , wherein the buckling of the bilayer coating is a result of a compressive lateral stress in a same plane of the bilayer coating.10. The method of claim 1 , wherein the buckling ...

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Номер записи: 93
18-03-2021 дата публикации

POLARIZATION GRATING HAVING A LIGHT-SHIELDING LAYER, MANUFACTURING METHOD FOR THE SAME AND DISPLAY PANEL FOR THE SAME

Номер: US20210080783A1
Автор: Yan Yuan
Принадлежит:

A polarization grating having a light-shielding layer and a manufacturing method for the same are disclosed. The method includes steps of: forming a metal layer on a substrate, forming a shielding layer on the metal layer, wherein the shielding layer includes a light-shielding pattern layer and a polarization grating pattern layer and etching the metal layer according to the shielding layer to form a polarization grating, wherein the polarization grating includes a polarization section and a light-shielding section directly connected to the polarization section. The present invention improves the compactness of the display panel. 1. A manufacturing method for a polarization grating having a light-shielding layer , comprising:forming a metal layer on a substrate;forming a shielding layer on the metal layer, wherein the shielding layer includes a light-shielding pattern layer and a polarization grating pattern layer; and{'b': '20', 'etching the metal layer according to the shielding layer to form a polarization grating, wherein the polarization grating includes a polarization section and a light-shielding section directly connected to the polarization section.'}2. The manufacturing method for a polarization grating having a light-shielding layer according to claim 1 , wherein the light-shielding pattern layer and the polarization grating pattern layer are formed in a same process.3. The manufacturing method for a polarization grating having a light-shielding layer according to claim 2 , wherein the step of forming a shielding layer on the metal layer comprises steps of:forming an imprint adhesive layer on the metal layer; andusing an imprint template corresponding to the light-shielding pattern layer and the polarization grating pattern layer to perform a transfer process to the imprint adhesive layer in order to form the shielding layer.4. The manufacturing method for a polarization grating having a light-shielding layer according to claim 2 , wherein the step of ...

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Номер записи: 94
26-03-2015 дата публикации

HOWLLOW-STRUCTURE METAL GRATING

Номер: US20150085364A1
Автор: BAI BEN-FENG, FAN SHOU-SHAN, LI QUN-QING, ZHU ZHEN-DONG
Принадлежит:

A hollow-structure metal grating is provided. The hollow-structure metal grating includes a substrate, a number of connecting metal layers, and a number of hollow metal protrusions spaced and located on a surface of the substrate. A space is defined between each of the number of hollow metal protrusions and the substrate. 1. A hollow-structure metal grating comprising:a substrate;a plurality of connecting metal layers and a plurality of hollow metal protrusions spaced and located on a surface of the substrate, wherein a space is defined between each of the plurality of hollow metal protrusions and the substrate.2. The metal grating of claim 1 , wherein each two adjacent hollow metal protrusions are connected to each other by one connecting metal layer.3. The metal grating of claim 2 , wherein the plurality of hollow metal protrusions and the plurality of connecting metal layers are integrated to form a single solid structure.4. The metal grating of claim 3 , wherein a width between the adjacent hollow metal protrusions is in a range from about 80 nanometers to about 500 nanometers.5. The metal grating of claim 4 , wherein a width of the plurality of hollow metal protrusions is in a range from about 70 nanometers to about 400 nanometers.6. The metal grating of claim 4 , wherein a thickness of the plurality of metal connecting layers is in a range from 20 nanometers to about 200 nanometers.7. The metal grating of claim 1 , wherein the plurality of connecting metal layers and the plurality of hollow metal protrusions are made of gold claim 1 , silver claim 1 , copper claim 1 , or aluminum.8. The metal grating of claim 1 , wherein each of the hollow metal protrusions has opposite sidewalls substantially perpendicular to the surface of the substrate.9. The metal grating of claim 1 , wherein the plurality of hollow metal protrusions and the connecting metal layers are strip shaped structures claim 1 , and are arranged at regular intervals.10. The metal grating of claim 1 ...

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Номер записи: 95
26-03-2015 дата публикации

LOW BIREFRINGENT SENSOR SUBSTRATE AND METHODS THEREOF

Номер: US20150085365A1
Автор: Cadotte, Jr. John Claude, Peanasky John Stephen, Timmons Christopher Lee, Vaddiraju Srinivasa Rao, Vasudeo Nikhil Baburam, Wezner Tyler
Принадлежит: CORNING INCORPORATED

A resonant waveguide article, including: a polymeric substrate having at least one integral grating region, wherein the article has a low birefringence property of for example, from about 5 to 270 nm/cm, as defined herein. Also disclosed is a microplate including the resonant waveguide article, and an integral well plate bonded to the sensor article, as defined herein. Also disclosed are methods of making a sensor article, and a method of making and using the microplate including the sensor article, as defined herein. 1. A resonant waveguide grating article , comprising:a polymeric substrate and the integral grating region;wherein the article has a low birefringence property of from about 5 to 270 nm/cm.2. The article of claim 1 , wherein the length and width dimensions of the substrate are about 4.7 by about 3 inches claim 1 , the thickness of the substrate is from about 0.5 to about 1.5 millimeters having less than about 2% variation claim 1 , and the grating height is about 0.05 to about 1 micrometer.3. The article of claim 1 , wherein the substrate and the integral grating region comprise an optically transparent engineering resin.4. The article of claim 3 , wherein the optically transparent engineering resin comprises a COC resin claim 3 , a polystyrene resin claim 3 , or a combination thereof.5. The article of claim 1 , wherein the optical axis orientation of the birefringence is substantially parallel or perpendicular to the lines of at least one of the grating regions.6. The article of claim 1 , wherein the article has power uniformity where the power of each of the sensors in the article is within about 30% of the maximum power of the sensor.7. The article of claim 1 , further comprising an integral well plate directly bonded to the article to provide a microplate.8. The article of claim 7 , wherein the microplate has optical alignment variation of less than 2 milliradians claim 7 , flatness and parallelism variation such that the angle between the launch ...

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Номер записи: 96
22-03-2018 дата публикации

Diffraction Grating and Method of Manufacture

Номер: US20180081170A1
Автор: Jan Eskolin, Jari Turunen, Jyrki Kimmel, Jyrki Saarinen, Seppo Honkanen, Toni Järvenpää
Принадлежит: NOKIA TECHNOLOGIES OY

A method including forming a substrate to form a template which includes areas of high relief and areas of low relief; and forming a high refractive index diffraction grating in the template by adding high refractive index material to the template to form a continuous low relief surface. The high refractive index material fills the areas of low relief and covers the areas of high relief of the template to form a high refractive index diffraction grating. The high refractive index diffraction grating includes the high refractive index material configured to have a low relief side corresponding to the continuous low relief surface and configured by the template to have a periodic side including areas of high relief and areas of low relief which periodically alternate in the first direction with the first periodicity and are interconnected by the high refractive index material.

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Номер записи: 97
22-03-2018 дата публикации

MICROLITHOGRAPHIC FABRICATION OF STRUCTURES

Номер: US20180081265A1
Автор: Singh Vikramjit
Принадлежит:

Asymmetric structures formed on a substrate and microlithographic methods for forming such structures. Each of the structures has a first side surface and a second side surface, opposite the first side surface. A profile of the first side surface is asymmetric with respect to a profile of the second side surface. The structures on the substrate are useful as a diffraction pattern for an optical device. 1. A microlithographic method of forming asymmetric structures , the method comprising:forming a plurality of discrete structures extending from a common surface on a substrate;applying a masking material over the structures under conditions that cause the masking material to asymmetrically cover the structures such that at least a portion of one side of each structure is free of the masking material;etching an area of the structures that is not covered by the masking material; andstripping the masking material from the structures.2. The method of claim 1 , wherein the conditions that cause the masking material to asymmetrically cover the structures comprise inclining the substrate at a non-normal angle to a deposition direction from which the masking material is applied by a deposition system.3. The method of claim 1 , wherein the plurality of structures include a first region of structures and second region of structures claim 1 , andwherein applying the masking material to the structures asymmetrically comprises masking the second region of structures while applying the masking material to the first region of structures.4. The method of claim 3 , wherein applying the masking material to the structures asymmetrically comprises masking the first region of structures while applying the masking material to the second region of structures.5. The method of claim 1 , wherein etching an area of the structures comprises performing one of a wet etch process claim 1 , a dry etch process claim 1 , or an ion beam etching process.6. The method of claim 1 , wherein the portion of ...

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Номер записи: 98
14-03-2019 дата публикации

MANUFACTURING METHOD OF DIFFRACTIVE OPTICAL ELEMENTS

Номер: US20190079395A1
Автор: Ishii Fusao, Kazuhiko Takahashi, Mikiko Nakanishi, Murakami Keiichi, Yuji Abrakawa
Принадлежит:

Manufacturing methods are disclosed to produce DOE, HOE and Fresnel optical elements. These methods enable low cost manufacturing with high precision. The methods include lithography, roll-to-roll imprint and UV-casting. 1. A method for manufacturing a diffractive optical element (DOE) on a substrate coated with a photoresist comprising:preparing a plurality of photomasks corresponding to a plurality levels of phase-shift at predesignated locations on the substrate and applying the photomasks on top of the photoresist followed by exposing the photoresist to a plurality of photolithographic exposures;developing the photoresist after the photolithographic exposure into a top surface of multiple horizontal levels followed by etching the substrate over the photoresist to form a plurality of top surface levels on the substrate corresponding to the plurality levels of phase-shift at the predesignated locations on the substrate; andapplying isotropic etchants to horizontally etch the substrate for removing fences and sharp corners on top of the substrate.2. The method of further comprising:calculating a phase shift function of DOE and dividing the phase shift function in a pitch of 2π into a sliced phase shift function wherein the sliced phase function with a saw-tooth shape has a same slope as the slope of the phase shift function in each slice.3. The method of wherein:{'sup': 'N', 'the step of preparing a plurality of photomasks further comprises a step of preparing a total of N photomasks where N is a positive integer and the N photomasks create 2levels of steps with a slope at each location corresponds to the slope of the sliced phase shift function.'}4. The method of wherein:{'sup': 'N', 'the step of preparing a plurality of photomasks further comprises a step of preparing a total of N photomasks where N is a positive integer and the N photomasks corresponding to a 2levels of phase-shift in a pitch of 2π at predesignated locations on the substrate.'}5. The method of ...

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Номер записи: 99
24-03-2016 дата публикации

POSITIVE MICROCONTACT PRINTING

Номер: US20160085000A1
Автор: Chen Shih-Chi, Xu Huihua, ZHAO NI, Zhou Xi
Принадлежит:

A process for positive microcontact printing, including inking a patterned mold with a thiol; contacting the mold with a metal surface of a substrate; backfilling the metal surface with a solution containing an aromatic amine to form a backfilling layer; etching the metal surface of the substrate; and rinsing the substrate to remove the backfilling layer. 1. A process for positive microcontact printing , comprising:inking a patterned mold with a thiol;contacting the mold with a metal surface of a substrate;backfilling the metal surface with a solution containing an aromatic amine to form a backfilling layer;etching the metal surface of the substrate; andrinsing the substrate to remove the backfilling layer.2. The process of claim 1 , wherein the aromatic amine is represented by formula (I){'br': None, 'sub': 'n', 'sup': 'm+', '[Ar—(NRR′)]\u2003\u2003(I)'}wherein Ar represents an aryl group having 6 to 18 carbon atoms or a heteroaromatic group having 4 to 17 carbon atoms; each of R and R′ independently represents a hydrogen atom, a methyl group, or a ethyl group; n is 1, 2, or 3; and m is 0, 1, 2, or 3.3. The process of claim 2 , wherein n is 2.4. The process of claim 2 , wherein the aromatic amine is selected from the group consisting of 2 claim 2 ,4 claim 2 ,6-trimethyl-benzene-1 claim 2 ,3 claim 2 ,5-triamine claim 2 , tri-hydrochloride; 3 claim 2 ,6-diaminoacridine hydrochloride claim 2 , 3 claim 2 ,7-bis(Dimethylamino)phenazathionium chloride claim 2 , 9-aminoacridine dydrochloride and 2-(4-dimethylaminophenylazo)benzoic acid.5. The process of claim 1 , wherein the surface is backfilled with a solution containing an aromatic amine to form a backfilling layer through dewetting.6. The process of claim 1 , wherein the aromatic amine is dissolved in a mixture of at least one monohydroxyl alcohol and one or more glycol ethers to obtain the solution containing the aromatic amine.7. The process of claim 5 , wherein the monohydroxyl alcohol is selected from the group ...

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Номер записи: 100