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Небесная энциклопедия

Космические корабли и станции, автоматические КА и методы их проектирования, бортовые комплексы управления, системы и средства жизнеобеспечения, особенности технологии производства ракетно-космических систем

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Мониторинг СМИ

Мониторинг СМИ и социальных сетей. Сканирование интернета, новостных сайтов, специализированных контентных площадок на базе мессенджеров. Гибкие настройки фильтров и первоначальных источников.

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Поддерживает ввод нескольких поисковых фраз (по одной на строку). При поиске обеспечивает поддержку морфологии русского и английского языка
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Применить Всего найдено 1282. Отображено 100.
13-06-2013 дата публикации

Method and apparatus for qualifying optics of a projection exposure tool for microlithography

Номер: US20130148105A1
Автор: Markus Goeppert
Принадлежит: CARL ZEISS SMT GMBH

A method for qualifying optics ( 16; 14, 16 ) of a projection exposure tool ( 10 ) for microlithography. The optics include ( 16; 14, 16 ) at least one mirror element ( 14 - 1 to 14 - 7, 16 - 1 to 16 - 6 ) with a reflective coating ( 52 ) disposed on the latter. The method includes: irradiating electromagnetic radiation ( 13, 42 ) of at least two different wavelengths onto the optics ( 16; 14, 16 ), a penetration depth of the radiation into the coating ( 52 ) of the mirror element varying between the individual wavelengths, taking an optical measurement on the optics ( 16; 14, 16 ) for each of the wavelengths, and evaluating the measurement results for the different wavelengths taking into consideration a respective penetration depth of the radiation into the coating ( 52 ) of the mirror element for each of the different wavelengths.

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08-08-2013 дата публикации

Method and apparatus to characterize photolithography lens quality

Номер: US20130201461A1

Provided is a method of characterizing photolithography lens quality. The method includes selecting an overlay pattern having a first feature with a first pitch and a second feature with a second pitch different than the first pitch, performing a photolithography simulation to determine a sensitivity coefficient associated with the overlay pattern, and providing a photomask having the overlay pattern thereon. The method also includes exposing, with a photolithography tool, a wafer with the photomask to form the overlay pattern on the wafer, measuring a relative pattern placement error of the overlay pattern formed on the wafer, and calculating a quality indicator for a lens in the photolithography tool using the relative pattern placement error and the sensitivity coefficient.

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15-08-2013 дата публикации

Flare measuring method, reflective mask, and exposure apparatus

Номер: US20130208252A1
Принадлежит: Toshiba Corp

According to a flare measuring method in an embodiment, a reflective mask, in which one reflective coordinate in a slit direction in a mask surface is determined when one scanning coordinate is determined, is placed on a scanner that includes a reflective projection optical system. Moreover, a light intensity of the exposure light is measured by performing a scanning exposure on an illuminance sensor moved to a predetermined position in the slit direction in a slit imaging plane. Then, an amount of flare at an intra-slit position corresponding to a position of the illuminance sensor in the slit direction is calculated by using a light intensity of exposure light received from an intra-slit position that does not correspond to the position of the illuminance sensor in the slit direction in the exposure light.

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22-08-2013 дата публикации

Inspection Apparatus and Method

Номер: US20130215404A1
Автор: Arie Jeffrey Den Boef
Принадлежит: ASML Netherlands BV

A spectroscopic scatterometer detects both zero order and higher order radiation diffracted from an illuminated spot on a target grating. The apparatus forms and detects a spectrum of zero order (reflected) radiation, and separately forms and detects a spectrum of the higher order diffracted radiation. Each spectrum is formed using a symmetrical phase grating, so as to form and detect a symmetrical pair of spectra. The pair of spectra can be averaged to obtain a single spectrum with reduced focus sensitivity. Comparing the two spectra can yield information for improving height measurements in a subsequent lithographic step. The target grating is oriented obliquely so that the zero order and higher order radiation emanate from the spot in different planes. Two scatterometers can operate simultaneously, illuminating the target from different oblique directions. A radial transmission filter reduces sidelobes in the spot and reduces product crosstalk.

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10-10-2013 дата публикации

CONTROL APPARATUS, LITHOGRAPHY APPARATUS, AND METHOD OF MANUFACTURING ARTICLE

Номер: US20130265558A1
Принадлежит: CANON KABUSHIKI KAISHA

The present invention provides a control apparatus including a feed-forward controller configured to perform feed-forward control of a controlled object, the apparatus being configured to obtain a first response data sequence of the controlled object measured by applying a first manipulated variable to the controlled object, and determining, assuming that a second response data sequence of the controlled object to be obtained if a second manipulated variable data sequence, obtained by respectively multiplying the first manipulated variable by gains as variables which can vary with time, is applied to the controlled object, is expressed as a linear combination of the first response data sequence with the gains as coefficients of the liner combination, the gains so that a discrepancy between the second response data sequence and a target data sequence falls within a tolerance. 1. A control apparatus including a feed-forward controller configured to perform feed-forward control of a controlled object , the apparatus being configured toobtain a first response data sequence of the controlled object measured by applying a first manipulated variable to the controlled object, anddetermining, assuming that a second response data sequence of the controlled object to be obtained if a second manipulated variable data sequence, obtained by respectively multiplying the first manipulated variable by gains as variables which can vary with time, is applied to the controlled object, is expressed as a linear combination of the first response data sequence with the gains as coefficients of the linear combination, the gains so that a discrepancy between the second response data sequence and a target data sequence falls within a tolerance, andthe feed-forward controller is configured to generate a feed-forward manipulated variable data sequence for the controlled object based on the determined gains.2. The apparatus according to claim 1 , wherein the apparatus is configured to obtain the ...

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05-01-2017 дата публикации

MULTISCALE PATTERNING OF A SAMPLE WITH APPARATUS HAVING BOTH THERMO-OPTICAL LITHOGRAPHY CAPABILITY AND THERMAL SCANNING PROBE LITHOGRAPHY CAPABILITY

Номер: US20170003602A1
Принадлежит:

The present invention provides a method for multiscale patterning of a sample. The method includes: placing the sample in an apparatus having both thermo-optical lithography capability and thermal scanning probe lithography capability; and patterning two patterns onto the sample, respectively by: thermo-optical lithography, wherein light is emitted from a light source onto the sample to heat the latter and thereby write a first pattern that is the largest of the two patterns; and thermal scanning probe lithography, wherein the sample and a heated probe tip are brought in contact for writing a second pattern that has substantially smaller critical dimensions than the first pattern. There is also provided an apparatus for multiscale patterning of a sample. 19. A method for multiscale patterning of a sample () , the method comprising:{'b': 10', '9', '10', '20', '30, 'placing (S) the sample () in an apparatus () having both thermo-optical lithography capability () and thermal scanning probe lithography capability (); and'}{'b': 20', '30', '200', '300', '9, 'patterning (S, S) two patterns (, ) onto the sample (), respectively by{'b': 20', '20', '22', '2', '9', '28', '200', '200', '300, 'sub': 1', '3, 'thermo-optical lithography (, S), wherein light (l, l) is emitted (S) from a light source () onto the sample () to heat the latter and thereby write (S) a first pattern () that is the largest of the two patterns (, ); and'}{'b': 30', '30', '9', '34', '38', '300', '200, 'thermal scanning probe lithography (, S), wherein the sample () and a heated probe tip are brought in contact (S) for writing (S) a second pattern () that has substantially smaller critical dimensions than the first pattern ().'}2202020232434143634349b. The method according to claim 1 , wherein patterning (S) by thermo-optical lithography ( claim 1 , S) comprises adjusting and/or modulating (S claim 1 , S) the light (l claim 1 , l claim 1 , l) according to a signal acquired via the probe tip () claim 1 , ...

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02-01-2020 дата публикации

MOVABLE BODY APPARATUS, MOVING METHOD, EXPOSURE APPARATUS, EXPOSURE METHOD, FLAT-PANEL DISPLAY MANUFACTURING METHOD , AND DEVICE MANUFACTURING METHOD

Номер: US20200004166A1
Автор: AOKI Yasuo
Принадлежит: NIKON CORPORATION

A movable body apparatus has: a substrate holder holding a substrate and can move in the X and Y-axes directions; a Y coarse movement stage movable in the Y-axis direction; a first measurement system acquiring position information on the substrate holder by heads on the substrate holder and a scale on the Y coarse movement stage; a second measurement system acquiring position information on the Y coarse movement stage by heads on the Y coarse movement stage and a scale; and a control system controlling the position of the substrate holder based on position information acquired by the first and second measurement systems. The first measurement system irradiates a measurement beam while moving the heads in the X-axis direction with respect to the scale, and the second measurement system irradiates a measurement beam while moving the heads in the Y-axis direction with respect to the scale. 1. A movable body apparatus , comprising:a first movable body that holds an object and can move in a first direction and a second direction intersecting with each other;a first measurement system in which one of a first grating member having a plurality of grating areas arranged mutually apart in the first direction and including measurement components in the first direction and the second direction and a plurality of first heads each irradiating the first grating member with a measurement beam while moving in the first direction with respect to the first grating member is provided at the first movable body, and which measures position information on the first movable body in the first direction by at least three first heads that irradiate at least one of the plurality of grating areas with the measurement beams, of the plurality of first heads;a second movable body that is provided with the other of the first grating member and the plurality of first heads, and can move in the second direction;a second measurement system in which one of a second grating member including measurement ...

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12-01-2017 дата публикации

Measuring device for determining a polarisation parameter

Номер: US20170010539A1
Автор: Andreas Wirsing
Принадлежит: CARL ZEISS SMT GMBH

A measurement system ( 10 ) for determining a polarization parameter of an optical system ( 50 ) has an illumination system ( 12 ) providing an optical radiation ( 14 ), a measurement mask ( 22 ) arranged between the illumination system and the optical system and including measurement structures ( 24 ) arranged at a plurality of field points ( 26 ) of the measurement mask, a polarization variation device ( 28 ) arranged in a beam path of the optical radiation and configured to vary a polarization state of the optical radiation in a field-point-dependent manner, such that at the same point in time one of the field points is irradiated with the optical radiation ( 14 - 1 ) in a first polarization state and another of the field points is irradiated with the optical radiation ( 14 - 2 ) in a second polarization state, and a detection module ( 32 ), which is configured to detect the optical radiation after it has interacted with the optical system.

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12-01-2017 дата публикации

METHOD OF DETERMINING EDGE PLACEMENT ERROR, INSPECTION APPARATUS, PATTERNING DEVICE, SUBSTRATE AND DEVICE MANUFACTURING METHOD

Номер: US20170010541A1
Принадлежит: ASML Netherlands B.V.

A method of determining edge placement error within a structure produced using a lithographic process, the method comprising the steps of: (a) receiving a substrate comprising a first structure produced using the lithographic process, the first structure comprising first and second layers, each of the layers having first areas of electrically conducting material and second areas of non-electrically conducting material; (b) receiving a target signal indicative of a first target relative position which is indicative of a target position of edges between the first areas and the second areas of the first layer relative to edges between the first areas and second areas of the second layer in the first structure during said lithographic process; (c) detecting scattered radiation while illuminating the first structure with optical radiation to obtain a first signal; and (d) ascertaining an edge placement error parameter on the basis of the first signal and the first target relative position. 1. A method comprising:receiving a substrate comprising a first structure produced using a lithographic process, the first structure comprising first and second layers, each of the layers having first areas of electrically conducting material and second areas of non-electrically conducting material;receiving a target signal indicative of a first target relative position which is indicative of a target position of edges between the first areas and the second areas of the first layer relative to edges between the first areas and second areas of the second layer in the first structure during the lithographic process;detecting scattered radiation while illuminating the first structure with optical radiation to obtain a first signal; andascertaining an edge placement error parameter on the basis of the first signal and the first target relative position.2. The method of claim 1 , wherein the first signal represents the intensity or phase of the scattered radiation and the ascertaining step ...

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10-01-2019 дата публикации

METHOD AND DEVICE FOR CHARACTERIZING A MASK FOR MICROLITHOGRAPHY

Номер: US20190011839A1
Принадлежит:

The invention relates to a method and a device for characterizing a mask for microlithography. In a method according to the invention, structures of a mask intended for use in a lithography process in a microlithographic projection exposure apparatus are illuminated by an illumination optical unit, wherein the mask is imaged onto a detector unit by an imaging optical unit, wherein image data recorded by the detector unit are evaluated in an evaluation unit. In this case, for emulating an illumination setting predefined for the lithography process in the microlithographic projection exposure apparatus, the imaging of the mask onto the detector unit is carried out in a plurality of individual imagings which differ from one another with regard to the illumination setting set in the illumination optical unit or the polarization-influencing effect set in the imaging optical unit. 1. A method for characterizing a mask for microlithography , wherein structures of a mask intended for use in a lithography process in a microlithographic projection exposure apparatus are illuminated by an illumination optical unit and wherein the mask is imaged onto a detector unit by an imaging optical unit , wherein image data recorded by the detector unit are evaluated in an evaluation unit ,wherein for emulating an illumination setting predefined for the lithography process in the microlithographic projection exposure apparatus, the imaging of the mask onto the detector unit is carried out in a plurality of individual imagings which differ from one another with regard to the illumination setting set in the illumination optical unit.2. The method according to claim 1 , wherein the illumination settings set in the illumination optical unit each have a constantly linear polarization distribution.3. The method according to claim 1 , wherein the illumination setting to be set in the microlithographic projection exposure apparatus has a quasi-tangential polarization distribution.4. The method ...

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09-01-2020 дата публикации

CONTROL APPARATUS, EXPOSURE APPARATUS, AND METHOD OF MANUFACTURING ARTICLE

Номер: US20200012200A1
Автор: Kurihara Takashi
Принадлежит:

The present invention provides a control apparatus for performing synchronous control to synchronize driving of a second moving member so as to follow driving of a first moving member, including a feedforward control system that includes a calculator configured to obtain an input/output response of the second moving member and position deviations of the first moving member and the second moving member while driving the first moving member and the second moving member in synchronism with each other, and calculate a feedforward manipulated variable based on the input/output response of the second moving member and the synchronous error between the first moving member and the second moving member obtained from the position deviations of the first moving member and the second moving member. 1. A control apparatus for performing synchronous control to synchronize driving of a second moving member so as to follow driving of a first moving member , comprising:a feedback control system configured to perform, for each of the first moving member and the second moving member, feedback control to reduce a position deviation from a target position; anda feedforward control system configured to perform feedforward control by providing the second moving member with a feedforward manipulated variable to reduce a synchronous error between the first moving member and the second moving member in a state in which the feedback control is performed,wherein the feedforward control system includes a calculator configured to obtain an input/output response of the second moving member and position deviations of the first moving member and the second moving member while driving the first moving member and the second moving member in synchronism with each other, and calculate the feedforward manipulated variable based on the input/output response of the second moving member and the synchronous error between the first moving member and the second moving member obtained from the position ...

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18-01-2018 дата публикации

MICRO LED ARRAY AS ILLUMINATION SOURCE

Номер: US20180017876A1
Принадлежит:

Embodiments of the present disclosure generally relate to apparatuses and systems for performing photolithography processes. More particularly, compact illumination tools for projecting an image onto a substrate are provided. In one embodiment, an illumination tool includes a microLED array including one or more microLEDs. Each microLED produces at least one light beam. The illumination tool also includes a beamsplitter adjacent the microLED array, one or more refractory lens components adjacent the beam splitter, and a projection lens adjacent the one or more refractory lens components. The mounting plate advantageously provides for compact alignment in a system having a plurality of illumination tools, each of which is easily removable and replaceable. 1. An illumination tool , comprising:a microLED array, wherein the microLED array comprises one or more microLED, wherein each microLED produces at least one light beam;a beamsplitter adjacent the microLED array;one or more refractory lens components adjacent the beamsplitter; anda projection lens adjacent the one or more refractory lens components.2. The illumination tool of claim 1 , wherein the projection lens further comprises:a focus group; anda window.3. The illumination tool of claim 2 , further comprising:a focus sensor; anda camera.4. The illumination tool of claim 3 , wherein the focus sensor and camera are disposed adjacent the beamsplitter.5. The illumination tool of claim 4 , further comprising:a light dump.6. The illumination tool of claim 5 , further comprising:a light level sensor.7. The illumination tool of claim 6 , further comprising:a distortion compensator.8. The illumination tool of claim 7 , wherein the distortion compensator is disposed between the projection lens and the beamsplitter.9. An illumination tool claim 7 , comprising:a microLED array, wherein the microLED array comprises one or more microLED, wherein each microLED produces at least one light beam;a beamsplitter adjacent the ...

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18-01-2018 дата публикации

Lithography optics adjustment and monitoring

Номер: US20180017878A1
Принадлежит: Cymer LLC

Methods and apparatus for processing an image of a beam generated by an optical system to extract information indicative of an extent of damage to optical elements in the optical system. Also disclosed is a beam image and analysis tool capable of acquiring an image of a beam at any one of a number of locations.

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26-01-2017 дата публикации

METROLOGY TARGET DESIGN FOR TILTED DEVICE DESIGNS

Номер: US20170023358A1
Принадлежит:

Metrology methods, modules and targets are provided, for measuring tilted device designs. The methods analyze and optimize target design with respect to the relation of the Zernike sensitivity of pattern placement errors (PPEs) between target candidates and device designs. Monte Carlo methods may be applied to enhance the robustness of the selected target candidates to variation in lens aberration and/or in device designs. Moreover, considerations are provided for modifying target parameters judiciously with respect to the Zernike sensitivities to improve metrology measurement quality and reduce inaccuracies. 1. A method of metrology target design , the method comprising calculating a Zernike sensitivity of pattern placement errors (PPEs) of at least one device design and of a plurality of metrology target designs , and selecting a best metrology target design according to a value of a cost function derived from the calculated Zernike sensitivities , the cost function quantifying a similarity of the Zernike sensitivity between the at least one device design and the plurality of metrology target designs , wherein at least one of the calculating and the selecting is carried out by at least one computer processor.2. The method of claim 1 , wherein the Zernike sensitivity is calculated with respect to Zernike coefficients Z4 . . . Z36.3. The method of claim 2 , wherein the Zernike sensitivity is calculated with respect to odd Zernike coefficients only.4. The method of claim 3 , wherein the Zernike sensitivity is calculated only with respect to Zernike coefficients Z8 claim 3 , Z11 claim 3 , Z15 claim 3 , Z20 claim 3 , Z24 claim 3 , Z27 claim 3 , Z31 claim 3 , and Z35.5. The method of claim 1 , wherein the cost function comprises a distance metric between the PPE Zernike sensitivity of the at least one device design and the PPE Zernike sensitivity of the plurality of metrology target designs.6. A metrology target designed by the method of .7. A target design file of the ...

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08-02-2018 дата публикации

PROJECTION EXPOSURE SYSTEM FOR MICROLITHOGRAPHY AND METHOD OF MONITORING A LATERAL IMAGING STABILITY

Номер: US20180039184A1
Принадлежит:

A projection exposure system () for microlithography includes projection optics () configured to image mask structures into a substrate plane (), an input diffraction element () configured to convert irradiated measurement radiation () into at least two test waves () directed onto the projection optics () with differing propagation directions, a detection diffraction element () disposed in the optical path of the test waves () after they have passed through the projection optics () and configured to produce a detection beam () from the test waves () which has a mixture of radiation portions of both test waves (), a photo detector () disposed in the optical path of the detection beam () configured to record the radiation intensity of the detection beam (), time resolved, and an evaluation unit configured to determine the lateral imaging stability of the projection optics () from the radiation intensity recorded. 117.-. (canceled)18. A projection exposure system for microlithography comprising:projection optics configured to image mask structures into a substrate plane,a detection diffraction element, disposed in an optical path of at least two different test waves having passed through the projection optics and configured to produce a first detection beam and a second detection beam from the test waves, which first detection beam comprises a mixture of radiation portions of the at least two test waves and which second detection beam comprises at least one radiation portion of a first of the two test waves, andan evaluation unit configured to determine a lateral imaging stability of the projection optics from radiation intensities of the detection beams.19. The projection exposure system according to claim 18 ,wherein the detection diffraction element is further configured to produce a third detection beam from the test waves, which third detection beam comprises at least one radiation portion of the second of the two test waves.20. The projection exposure system ...

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24-02-2022 дата публикации

METROLOGY SENSOR, ILLUMINATION SYSTEM AND METHOD OF GENERATING MEASUREMENT ILLUMINATION WITH A CONFIGURABLE ILLUMINATION SPOT DIAMETER

Номер: US20220057718A1
Принадлежит: ASML Netherlands B.V.

Disclosed is an illumination system for delivering incoherent radiation to a metrology sensor system. Also disclosed is an associated metrology system and method. The illumination system comprises a spatial filter system for selective spatial filtering of a beam of said incoherent radiation outside of a module housing of the metrology sensor system. At least one optical guide is provided for guiding the spatially filtered beam of incoherent radiation to the metrology sensor system, the at least one optical guide being such that the radiation guided has a substantially similar output angle as input angle. 120.-. (canceled)21. An illumination system comprising:a spatial filter system configured to perform selective spatial filtering of a beam of incoherent radiation; andat least one optical guide configured to guide the spatially filtered beam of the incoherent radiation to a metrology sensor system, the at least one optical guide being such that the incoherent radiation guided has a substantially similar output angle as input angle.22. The illumination system of claim 21 , wherein the spatial filter system comprises at least one aperture having a selectable size to implement the selective spatial filtering.23. The illumination system of claim 22 , wherein the at least one aperture is substantially circular having a selectable diameter.24. The illumination system of claim 23 , wherein the spatial filter system comprises a plurality of the apertures having different sizes claim 23 , the selective spatial filtering being implemented by a selection of one of the apertures to filter a beam of incoherent radiation.25. The illumination system of claim 22 , wherein the spatial filter system comprises a single aperture having a configurable size to implement the selective spatial filtering.26. The illumination system of claim 21 , further comprising:a focusing optical element configured to focus the spatially filtered beam of the incoherent radiation onto an input of the at ...

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07-02-2019 дата публикации

EXPOSURE METHOD, EXPOSURE APPARATUS, AND METHOD OF MANUFACTURING ARTICLE

Номер: US20190041759A1
Принадлежит:

The present invention provides an exposure method for repeatedly performing an exposure process for exposing a substrate via a projection optical system, the method comprising a first exposure process for measuring optical characteristics of the projection optical system, and exposing the substrate while correcting the optical characteristics based on a result of the measurement; a second exposure process for exposing the substrate while correcting the optical characteristics based on a result of estimating the optical characteristics by a prediction formula, wherein the first exposure process is repeatedly performed, and the second exposure process is started after the first exposure process where it is judged that the determined coefficient of the prediction formula has converged. 1. An exposure method for repeatedly performing an exposure process for exposing a substrate via a projection optical system , the method comprising:a first exposure process for measuring optical characteristics of the projection optical system, and exposing the substrate while correcting the optical characteristics based on a result of the measurement;a second exposure process for exposing the substrate while correcting the optical characteristics based on a result of estimating the optical characteristics by a prediction formula,wherein the first exposure process includes determining a coefficient of the prediction formula from a result of measuring the optical characteristics up until the present, and judging whether the determined coefficient of the prediction formula has converged, andwherein in the exposure method, the first exposure process is repeatedly performed, and the second exposure process is started after the first exposure process where it is judged that the determined coefficient of the prediction formula has converged.2. The exposure method according to claim 1 , wherein the judging is performed based on a comparison between the coefficient determined in the present ...

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15-02-2018 дата публикации

Variable corrector of a wave front

Номер: US20180045657A1
Принадлежит: Asml Holding Nv, ASML Netherlands BV

An optical inspection apparatus, including: an optical metrology tool configured to measure structures, the optical metrology tool including: an electromagnetic (EM) radiation source configured to direct a beam of EM radiation along an EM radiation path; and an adaptive optical system disposed in a portion of the EM radiation path and configured to adjust a shape of a wave front of the beam of EM radiation, the adaptive optical system including: a first aspherical optical element; a second aspherical optical element adjacent the first aspherical optical element; and an actuator configured to cause relative movement between the first optical element and the second optical element in a direction different from a beam axis of the portion of the EM radiation path.

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06-02-2020 дата публикации

Electron optical system and multi-beam image acquiring apparatus

Номер: US20200043698A1
Автор: John Hartley

An electron optical system includes an electromagnetic lens configured to include a yoke, and refract an electron beam passing through the yoke by generating a magnetic field, and a shield coil disposed along the inner wall of the yoke, and configured to reduce a leakage magnetic field generated by the electromagnetic lens.

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03-03-2022 дата публикации

ACTIVE RETICLE CARRIER FOR IN SITU STAGE CORRECTION

Номер: US20220066333A1
Принадлежит:

A reticle inspection system and a method of handling a reticle in a reticle inspection system are provided. The reticle inspection system includes an active reticle carrier and an inspection tool. The reticle is disposed on the active reticle carrier, and the inspection tool is configured to determine an orientation of the reticle when the active reticle carrier is disposed on a reticle stage. The active reticle carrier is movable between a loading station and the reticle stage and is configured to rotate the reticle to reorient the reticle based on the orientation of the reticle while the active carrier is disposed on the reticle stage. 1. A reticle inspection system comprising:an active reticle carrier, wherein a reticle is disposed on the active reticle carrier; andan inspection tool configured to determine an orientation of the reticle when the active reticle carrier is disposed on a reticle stage;wherein the active reticle carrier is movable between a loading station and the reticle stage and is configured to rotate the reticle to reorient the reticle based on the orientation of the reticle while the active carrier is disposed on the reticle stage.2. The system of claim 1 , wherein the reticle is clamped to the active reticle carrier.3. The system of claim 2 , further comprising an electromagnetic actuator disposed on the active reticle carrier configured to apply a clamping force on the reticle.4. The system of claim 1 , wherein the active reticle carrier comprises:a carrier base;a rotation plate rotatably mounted to the carrier base; anda piezoelectric motor disposed in the carrier base and configured to rotate the rotation plate relative to the carrier base.5. The system of claim 4 , wherein the active reticle carrier further comprises a rechargeable battery disposed on the carrier base and configured to power the piezoelectric motor claim 4 , wherein a transfer stage configured to recharge the rechargeable battery when the active reticle carrier is disposed ...

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01-03-2018 дата публикации

EXPOSURE APPARATUS AND DEVICE FABRICATION METHOD

Номер: US20180059549A1
Автор: ONO Kazuya
Принадлежит: NIKON CORPORATION

An exposure apparatus includes a stage apparatus having an upper surface in which a recess that holds a substrate is formed. A liquid immersion system has a supply port via which a liquid is supplied and a collection port via which the liquid is collected forms a liquid immersion region. A projection optical system has an optical element and is configured to project an exposure light onto the substrate through the liquid of the liquid immersion region. A light-transmissive member is provided at the stage apparatus and has an upper surface substantially coplanar with an upper surface of the substrate held on the stage apparatus and with the upper surface of the stage apparatus. A groove is provided at the stage apparatus, into which the liquid is allowed to flow. 1. An exposure apparatus comprising:a stage apparatus having an upper surface in which a recess is formed, the recess configured to hold a substrate in the recess;a liquid immersion system having a supply port via which a liquid is supplied and a collection port via which the liquid is collected, to form a liquid immersion region;a projection optical system having an optical element and configured to project an exposure light onto the substrate through the liquid of the liquid immersion region formed under the optical element;a light-transmissive member provided at the stage apparatus, the light-transmissive member having an upper surface that is substantially coplanar with an upper surface of the substrate held on the stage apparatus and with the upper surface of the stage apparatus; anda groove provided at the stage apparatus, into which the liquid is allowed to flow,wherein the substrate is exposed with the exposure light through the liquid of the liquid immersion region covering a portion of the upper surface of the substrate.2. The apparatus according to claim 1 , wherein the upper surface of the stage apparatus is provided between the groove and the recess.3. The apparatus according to claim 1 , ...

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20-02-2020 дата публикации

Radiation Analysis System

Номер: US20200057166A1
Принадлежит: ASML Netherlands BV

A radiation analysis system comprising a target comprising two marks which are separated from each other, the target being configured to undergo thermal expansion when illuminated with radiation; a position measurement system configured to measure a change in the separation of the marks; and a processor configured to determine a power of the radiation using the measured change in separation of the marks.

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04-03-2021 дата публикации

Device and method for characterizing a microlithographic mask

Номер: US20210063892A1
Принадлежит: CARL ZEISS SMT GMBH

The invention relates to a device and a method for characterizing a microlithographic mask. A device according to the invention has an illumination optical unit for illuminating structures of a mask intended for use in a lithography process in a microlithographic projection exposure apparatus, a detector unit, and an evaluation unit for evaluating the data recorded by the detector unit, wherein the detector unit is configured for the spatially resolved determination of both the intensity and the polarization state of the respectively impinging light emanating from the mask.

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28-02-2019 дата публикации

Pattern forming apparatus, deciding method, storage medium, information processing apparatus, and article manufacturing method

Номер: US20190064679A1
Автор: Shinichi Egashira
Принадлежит: Canon Inc

The present invention provides a pattern forming apparatus including a detection optical system configured to obtain optical information of a mark provided on a substrate by detecting the mark, and a processing unit configured to perform a process of obtaining a position of the mark by using a template for obtaining the position of the mark by being applied to the optical information of the mark and a window which indicates a region for extracting an amount of characteristic indicating the position of the mark from a waveform signal obtained from the optical information, wherein the processing unit decides, based on the optical information of the mark obtained by the detection optical system, a parameter indicating at least one of a shape of the template and a shape of the window for each of a plurality of substrates.

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10-03-2016 дата публикации

LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD

Номер: US20160070178A1
Принадлежит: ASML Netherlands B.V.

In a lithographic projection apparatus, a liquid supply system maintains liquid in a space between a projection system of the lithographic projection apparatus and a substrate. A sensor positioned on a substrate table, which holds the substrate, is configured to be exposed to radiation when immersed in liquid (e.g., under the same conditions as the substrate will be exposed to radiation). By having a surface of an absorption element of the sensor, that is to be in contact with liquid, formed of no more than one metal type, long life of the sensor may be obtained. 1. A lithographic projection apparatus comprising:a projection system configured to project a pattern from a patterning device onto a substrate;a liquid supply system configured to provide a liquid to a space between the projection system and the substrate; anda movable table comprising a sensor system, the sensor system configured to be exposed to electromagnetic radiation and the sensor system including a surface that is to be in contact with liquid from the liquid supply system and exposed to the electromagnetic radiation, the surface comprising no more than one metal type.2. The lithographic projection apparatus according to claim 1 , wherein the surface is formed by a continuous layer of one metal type.3. The lithographic projection apparatus according to claim 2 , wherein the continuous layer is not uniform in thickness to provide areas with different absorption characteristics.4. The lithographic projection apparatus according to claim 1 , wherein the surface comprises a layer of one metal type and the sensor system comprises a further layer of a material other than metal.5. The lithographic projection apparatus according to claim 4 , wherein the material other than metal comprises a ceramic.6. The lithographic projection apparatus according to claim 1 , wherein the surface comprises a layer of an isolation material.7. The lithographic projection apparatus according to claim 6 , wherein the sensor ...

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11-03-2021 дата публикации

MOVABLE BODY APPARATUS, MOVING METHOD, EXPOSURE APPARATUS, EXPOSURE METHOD, FLAT-PANEL DISPLAY MANUFACTURING METHOD, AND DEVICE MANUFACTURING METHOD

Номер: US20210072651A1
Автор: AOKI Yasuo
Принадлежит: NIKON CORPORATION

A movable body apparatus has: a substrate holder holding a substrate and can move in the X and Y-axes directions; a Y coarse movement stage movable in the Y-axis direction; a first measurement system acquiring position information on the substrate holder by heads on the substrate holder and a scale on the Y coarse movement stage; a second measurement system acquiring position information on the Y coarse movement stage by heads on the Y coarse movement stage and a scale; and a control system controlling the position of the substrate holder based on position information acquired by the first and second measurement systems. The first measurement system irradiates a measurement beam while moving the heads in the X-axis direction with respect to the scale, and the second measurement system irradiates a measurement beam while moving the heads in the Y-axis direction with respect to the scale. 1a first movable body that holds an object and can move in a first direction and a second direction intersecting with each other;a first measurement system in which one of a first grating member having a plurality of grating areas arranged mutually apart in the first direction and including measurement components in the first direction and the second direction and a plurality of first heads each irradiating the first grating member with a measurement beam while moving in the first direction with respect to the first grating member is provided at the first movable body, and which measures position information on the first movable body in the first direction by at least three first heads that irradiate at least one of the plurality of grating areas with the measurement beams, of the plurality of first heads;a second movable body that is provided with the other of the first grating member and the plurality of first heads, and can move in the second direction;a second measurement system in which one of a second grating member including measurement components in the first direction and ...

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15-03-2018 дата публикации

Metrology Method, Apparatus and Computer Program

Номер: US20180073866A1
Принадлежит: ASML Netherlands B.V.

Disclosed is a method of determining a characteristic of a target on a substrate and corresponding metrology apparatus and computer program. The method comprises determining a plurality of intensity asymmetry measurements from pairs of complementary pixels comprising a first image pixel in a first image of the target and a second image pixel in a second image of the target. The first image is obtained from first radiation scattered by the target and the second image is obtained from second radiation scattered by the target, the first radiation and second radiation comprising complementary non-zero diffraction orders. The characteristic of the target is then determined from said plurality of intensity asymmetry measurements. 117- (canceled)18. A method of determining a characteristic of a target on a substrate comprising:determining a plurality of intensity asymmetry measurements from pairs of complementary pixels comprising a first image pixel in a first image of the target and a second image pixel in a second image of the target, the first image having been obtained from first radiation scattered by the target and the second image having been obtained from second radiation scattered by the target, the first radiation and second radiation comprising complementary non-zero diffraction orders; anddetermining the characteristic of the target from the plurality of intensity asymmetry measurements.19. The method of claim 18 , wherein the characteristic of the target comprises overlay.20. The method of claim 18 , further comprising optimizing a relative positional offset between the first image and second image to identify the pairs of complementary pixels.21. The method claim 20 , wherein the optimizing is such that optical path lengths through the target travelled by the first radiation to form the first image pixel of a pair of complementary pixels and optical path lengths through the target travelled by the second radiation to form the second image pixel of the pair ...

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26-03-2015 дата публикации

DIFFERENTIAL DOSE AND FOCUS MONITOR

Номер: US20150085266A1

A dose and focus monitor structure includes at least one complementary set of unit dose monitors and at least one complementary set of unit focus monitors. Each complementary set of unit dose monitors generate edges on a photoresist layer such that the edges move in opposite directions as a function of a dose offset. Each complementary set of unit focus monitors generates edges on the photoresist layer such that the edges move in opposite directions as a function of a focus offset. The dose and focus monitor structure generates self-compensating differential measurements of the dose offset and the focus offset such that the dose offset measurement and the focus offset measurement are independent of each other. 1. A reticle comprising a dose and focus monitor structure , said dose and focus monitor structure comprising:at least one pair of unit dose monitors configured to print a first pair of printed shapes on a photoresist layer, upon lithographic exposure and development of said photoresist layer, said first pair of first printed shapes moving in opposite directions from positions corresponding to a nominal dose by a first offset distance that is proportional to a dose offset from said nominal dose; andat least one pair of unit focus monitors configured to print a second pair of printed shapes on said photoresist layer, upon lithographic exposure and development of said photoresist layer, said second pair of second printed shapes moving in opposite directions from positions corresponding to a nominal focus by a second offset distance that is proportional to a focus offset from said nominal focus.2. The reticle of claim 1 , wherein a pair of unit dose monitors among said at least one pair of unit dose monitors have patterns that are mirror images of each other.3. The reticle of claim 2 , wherein a mirror image axis for generating a pattern that is congruent to one of said pair of unit dose monitors from a pattern of another of said pair of unit dose monitors is ...

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24-03-2016 дата публикации

Method of Measuring a Property of a Target Structure, Inspection Apparatus, Lithographic System and Device Manufacturing Method

Номер: US20160086324A1
Принадлежит: ASML Netherlands BV

A property of a target structure is measured based on intensity of an image of the target. The method includes (a) obtaining an image of the target structure; (b) defining ( 1204 ) a plurality of candidate regions of interest, each candidate region of interest comprising a plurality of pixels in the image; (c) defining ( 1208, 1216 ) an optimization metric value for the candidate regions of interest based at least partly on signal values of pixels within the region of interest; (d) defining ( 1208, 1216 ) a target signal function which defines a contribution of each pixel in the image to a target signal value. The contribution of each pixel depends on (i) which candidate regions of interest contain that pixel and (ii) optimization metric values of those candidate regions of interest.

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31-03-2022 дата публикации

METHOD AND LITHOGRAPH APPARATUS FOR MEASURING A RADIATION BEAM

Номер: US20220100102A1
Принадлежит: ASML Netherlands B.V.

A lithographic apparatus including a projection system having an optical axis and configured to project a radiation beam. The apparatus includes a measurement unit arranged to measure the radiation beam projected by the projection system, the measurement unit having an opening through which the radiation beam passes in use, and a sensing surface extending transverse to the optical axis and arranged to measure the radiation beam passing through the opening. The apparatus is configured to move the sensing surface in a plane transverse to the optical axis between a plurality of measurement positions. The radiation beam defines a view in the plane, and the measurement unit is configured such that the sensing surface captures, in each measurement position, a portion of the view smaller than 100% of the view. 1. A sensing apparatus for a lithographic apparatus , the sensing apparatus comprising:a measurement unit arranged to measure a radiation beam projected by a projection system of the lithographic apparatus, the projection system having an optical axis and the measurement unit comprising:an opening through which the radiation beam passes in use; anda sensing surface arranged to extend transverse to the optical axis and arranged to measure the radiation beam passing through the opening,wherein the sensing surface is movable in a plane transverse to the optical axis to a plurality of measurement positions,wherein the radiation beam defines a view in the plane, andwherein the measurement unit is configured such that the sensing surface captures, in each measurement position, a portion of the view smaller than 100% of the view.2. A method of measuring a radiation beam by a sensing apparatus for a lithographic apparatus , the method comprising:measuring a radiation beam projected using a projection system having an optical axis and having passed through an opening in a measurement system, at a plurality of measurement positions, using a sensing surface of the measurement ...

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19-06-2014 дата публикации

Method of Operating a Lithographic Apparatus, Device Manufacturing Method and Associated Data Processing Apparatus and Computer Program Product

Номер: US20140168627A1
Принадлежит: ASML Netherlands B.V.

A reticle is loaded into a lithographic apparatus. The apparatus performs measurements on the reticle, so as to calculate alignment parameters for transferring the pattern accurately to substrates. Tests are performed to detect possible contamination of the reticle or its support. Either operation proceeds with a warning, or the patterning of substrates is stopped. The test uses may use parameters of the alignment model itself, or different parameters. The integrity parameters may be compared against reference values reflecting historic measurements, so that sudden changes in a parameter are indicative of contamination. Integrity parameters may be calculated from residuals of the alignment model. In an example, height residuals are used to calculate parameters of residual wedge (Rx′) and residual roll (Ryy′). From these, integrity parameters expressed as height deviations are calculated and compared against thresholds. 1. A method comprising:measuring features of a patterning device supported in a lithographic apparatus, the results of the measuring being used in normal operation in calculating alignment parameters for use in controlling transfer of the pattern to one or more substrates;performing, on the basis of the measuring, one or more integrity tests to identify a contaminated condition of the patterning device or its support; anddetermining, depending on the result of the integrity test, whether to proceed with operating the lithographic apparatus to apply the pattern to one or more substrates.2. The method of claim 1 , wherein:the performing comprises identifying different severity levels of a contaminated conditions;for a first severity level operation proceeds while a warning is displayed or recorded to an operator; andfor a second severity level the patterning of substrates is interrupted or not started.3. The method of claim 1 , wherein the integrity test uses at least a subset of the alignment parameters calculated from the alignment measurements.4. The ...

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21-03-2019 дата публикации

LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD

Номер: US20190086820A1
Принадлежит: ASML Netherlands B.V.

In a lithographic projection apparatus, a liquid supply system maintains liquid in a space between a projection system of the lithographic projection apparatus and a substrate. A sensor positioned on a substrate table, which holds the substrate, is configured to be exposed to radiation when immersed in liquid (e.g., under the same conditions as the substrate will be exposed to radiation). By having a surface of an absorption element of the sensor, that is to be in contact with liquid, formed of no more than one metal type, long life of the sensor may be obtained. 120.-. (canceled)21. A movable table system for a lithographic apparatus , the lithographic apparatus comprising a projection system configured to project a beam of radiation onto a substrate and a liquid supply system configured to provide a liquid to a space between the projection system and an object facing the projection system , the movable table system comprising a movable table having:an essentially opaque material comprising an aperture through which electromagnetic radiation passes to a receiving surface located below the aperture and above which the liquid from the liquid supply system is to be provided, wherein the electromagnetic magnetic radiation passes to a sensor system component configured to be exposed to radiation; anda liquid impermeable material spanning at least the aperture and through which the electromagnetic radiation passes to the receiving surface below the liquid impermeable material, the liquid impermeable material having essentially planar upper and lower surfaces and the liquid impermeable material preventing liquid contacting the upper surface from passing through the aperture to contact the receiving surface.22. The movable table system of claim 21 , wherein the essentially opaque material comprises a metal structure with the aperture.23. The movable table system of claim 22 , wherein at least part of the liquid impermeable material is within the aperture.24. The movable ...

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26-03-2020 дата публикации

TEST OF OPERATIONAL STATUS OF A DIGITAL SCANNER DURING LITHOGRAPHIC EXPOSURE PROCESS

Номер: US20200096326A1
Автор: Goodwin Eric Peter
Принадлежит:

System and method for monitoring of performance of a mirror array of a digital scanner with a use of light, illuminating the mirror array at grazing (off-axis) incidence, and an optical imaging system that includes a lateral shearing interferometer (operated in either static or a phase-shifting condition) during and without interrupting the process of exposure of the workpiece with the digital scanner, to either simply identify problematic pixels for further troubleshooting or measure the exact magnitude of the deformation of a mirror element of the mirror array. 1. An optical imaging system comprising:an array of reflectors having an array axis that is normal to a surface of the array;a first optical system disposed to deliver first light in a substantially-collimated beam of light to the array of reflectors at a non-zero angle with respect to the axis;an optical detector positioned to receive second light, from the substantially-collimated beam that has been reflected by the array; and wherein each of the first and second beams carries a portion of the second light, and', 'wherein the first and second beams propagate at an angle with respect to one another within bounds of the second optical system, 'a second optical system configured to transmit the second light towards the optical detector while forming first and second beams at a first plane located between an elements of the second optical system and the optical detector,'}2. An optical imaging system according to claim 1 , wherein the non-zero angle is greater than 10 degrees.3. An optical imaging system according claim 1 , wherein the first plane is located between first and second elements of an optical relay system claim 1 , said optical relay system being telecentric in both image space and object space.4. An optical imaging system according to claim 1 , wherein the plane of the optical detector is tilted with respect to the first plane.5. An optical imaging system according to claim 1 , wherein the ...

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04-04-2019 дата публикации

Reticle backside inspection method

Номер: US20190102875A1

A method of inspecting a reticle includes obtaining a first image of a surface of the reticle at a first height by scanning the reticle surface with a light source at the first height of the reticle surface relative to a reference surface height of the reticle surface and obtaining a second image of the reticle surface at a second height by scanning the reticle surface with the light source at the second height of the reticle surface relative to the reference surface height of the reticle surface. The second height is different from the first height. The first and the second images are then combined to obtain a surface profile image of the reticle.

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02-04-2020 дата публикации

Device for determining the exposure energy during the exposure of an element in an optical system, in particular for microlithography

Номер: US20200103668A1
Автор: Thomas Frank
Принадлежит: CARL ZEISS SMT GMBH

The invention relates to a device for determining the exposure energy during the exposure of an element in an optical system, in particular for microlithography, comprising an optical element, a diffractive structure which has a locally varying grating period, and an intensity sensor arrangement, wherein electromagnetic radiation diffracted at the diffractive structure during operation of the optical system, in at least one order of diffraction, is directed to the intensity sensor arrangement by way of total internal reflection effected in the optical element.

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02-04-2020 дата публикации

Metrology Sensor, Lithographic Apparatus and Method for Manufacturing Devices

Номер: US20200103772A1
Принадлежит: ASML Netherlands B.V.

Disclosed is a metrology sensor apparatus and associated method. The metrology sensor apparatus comprises an illumination system operable to illuminate a metrology mark on a substrate with illumination radiation having a first polarization state and an optical collection system configured to collect scattered radiation, following scattering of the illumination radiation by the metrology mark. The metrology mark comprises a main structure and changes, relative to the first polarization state, at least one of a polarization state of a first portion of the scattered radiation predominately resultant from scattering by the main structure and a polarization state of a second portion of radiation predominately resultant from scattering by one or more features other than the main structure, such that the polarization state of the first portion of the scattered radiation is different to the polarization state of the second portion of the scattered radiation. The metrology sensor apparatus further comprises an optical filtering system which filters out the second portion of the scattered radiation based on its polarization state. 119.-. (canceled)20. A metrology sensor apparatus comprising:an illumination system operable to illuminate a metrology mark on a substrate with illumination radiation having a first polarization state;an optical collection system configured to collect scattered radiation, following scattering of the illumination radiation by the metrology mark, the metrology mark comprising a main structure and being operable to change, relative to the first polarization state, at least one of a polarization state of a first portion of the scattered radiation predominately resultant from scattering by the main structure and a polarization state of a second portion of radiation predominately resultant from scattering by one or more features other than the main structure, such that the polarization state of the first portion of the scattered radiation is different to ...

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11-04-2019 дата публикации

PROJECTION LENS WITH A MEASUREMENT BEAM PATH

Номер: US20190107784A1
Принадлежит:

A projection lens () for a microlithographic projection exposure apparatus () includes a plurality of optical elements (M-M) for imaging mask structures () onto a surface () of a substrate () by way of projecting the mask structures using imaging radiation () that travels along a used beam path. At least one of the optical elements (M) is formed with an opening () and the projection lens has a measurement beam path () extending through the opening. 1. A device comprising a projection lens for a microlithographic projection exposure apparatus and a measurement apparatus configured to measure a property of the projection lens , wherein the projection lens comprises a plurality of optical elements for imaging mask structures onto a surface of a substrate by projecting the mask structures with imaging radiation that travels along a used beam path , wherein at least one of the optical elements comprises an opening , and wherein a measurement beam path extends through the opening.2. The device according to claim 1 ,wherein the opening is arranged at a decentralized location in the optical element.3. The device according to claim 1 ,wherein the measurement apparatus is configured to orient the measurement beam path at the site of the opening to be tilted by at least 1° with respect to the used beam path.4. The device according to claim 1 ,wherein the measurement apparatus is configured to orient the measurement beam path to be incident on at least one further one of the optical elements.5. The device according to claim 4 ,wherein the measurement apparatus is configured to measure a surface shape of at least a section of the further optical element as the property being measured.6. The device according to claim 4 ,wherein the measurement apparatus is configured to measure a constitution of at least a section of at least one surface layer of the further optical element as the property being measured.7. The device according to claim 4 ,wherein the measurement apparatus is ...

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13-05-2021 дата публикации

METHOD AND DEVICE FOR CHARACTERIZING THE SURFACE SHAPE OF AN OPTICAL ELEMENT

Номер: US20210140762A1
Принадлежит:

A method and a device for characterizing the surface shape of an optical element. In the method, in at least one interferogram measurement carried out by an interferometric test arrangement, a test wave reflected at the optical element is caused to be superimposed with a reference wave not reflected at the optical element. In this case, the figure of the optical element is determined on the basis of at least two interferogram measurements using electromagnetic radiation having in each case linear input polarization or in each case circular input polarization, wherein the input polarizations for the two interferogram measurements differ from one another. 1. A method for characterizing a surface shape of an optical element , comprising:in at least one interferogram measurement carried out by an interferometric test arrangement, causing a test wave reflected at the optical element to be superimposed with a reference wave not reflected at the optical element,determining a figure of the optical element based on at least two interferogram measurements using electromagnetic radiation having in each case linear input polarization or in each case circular input polarization,wherein the input polarizations for the two interferogram measurements differ from one another, andwherein the input polarizations for the two interferogram measurements correspond in terms of their polarization direction to the directions of eigenvectors of a Jones matrix that describes a polarization effect of the interferometric test arrangement in a region thereof traversed jointly by the reference wave and the test wave.2. The method as claimed in claim 1 , wherein the input polarizations for the two interferogram measurements are linear input polarizations having different polarization directions.3. The method as claimed in claim 1 , wherein the input polarizations for the two interferogram measurements are orthogonal to one another.4. The method as claimed in claim 1 , wherein the figure of the ...

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03-05-2018 дата публикации

METHOD AND APPARATUS FOR INSPECTION AND METROLOGY

Номер: US20180120714A1
Принадлежит: ASML Netherlands B.V.

A method involving providing incident radiation of a first polarization state by an optical component into an interface of an object with an external environment, wherein a surface is provided adjacent the interface and separated by a gap from the interface, detecting, from incident radiation reflected from the interface and from the surface, radiation of a second different polarization state arising from the reflection of incident radiation of the first polarization at the interface as distinct from the radiation of the first polarization state in the reflected radiation, and producing a position signal representative of a relative position between the focus of the optical component and the object. 1. A method , comprising:providing incident radiation of a first polarization state by an optical component into an interface of an object with an external environment, wherein a surface is provided adjacent the interface and separated by a gap from the interface;detecting, from incident radiation reflected from the interface and from the surface, radiation of a second different polarization state arising from the reflection of incident radiation of the first polarization at the interface as distinct from the radiation of the first polarization state in the reflected radiation; andproducing a position signal representative of a relative position between the focus of the optical component and the object.2. The method of claim 1 , further comprising filtering the radiation of the second different polarization state from the reflected radiation using a polarizer.3. The method of claim 1 , wherein the radiation of the first polarization state comprises radiation polarized in a first direction and the radiation of the second polarization state comprises radiation polarized in a second orthogonal direction.4. A method claim 1 , comprising:focusing radiation by an optical component into an object toward an interface of the object with an external environment;reflecting, at the ...

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24-07-2014 дата публикации

Method for controlling a motion of optical elements in lithography systems

Номер: US20140204354A1
Принадлежит: CARL ZEISS SMT GMBH

A method for controlling a vibrating optical element of a lithographic system the optical element having a predetermined number of degrees of freedom comprises: detecting a number of displacements of the optical element, each displacement corresponding to a degree of freedom, wherein the number of detected displacements is larger than the number of degrees of freedom; for each displacement according to a degree of freedom, generating a sensor signal corresponding to a movement in a degree of freedom; wherein the optical element moves as a function of a rigid body transformation matrix, the optical element movement including a first type of movement and a second type of movement; and modifying the sensor signals as a function of a modified transformation matrix, wherein the modified transformation matrix at least partially reduces at least one eigen mode or resonance of one of the first type of movements or the second type of movements.

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19-05-2016 дата публикации

LITHOGRAPHY APPARATUS AND ARTICLE MANUFACTURING METHOD

Номер: US20160139513A1
Автор: Tsujikawa Takuro
Принадлежит:

A lithography apparatus includes: a stage configured to hold a substrate on which a mark is formed; an image sensor having an image sensing region; a processor configured to read out data concerning an image of the mark on a row basis to obtain a position of the mark; and a controller configured to position the substrate based on the position of the mark. When the processor obtains a position of a first mark on a first substrate, the controller moves the stage with respect to the image sensor such that an image of the first mark is formed closer to a row, from which the processor starts readout of the data, than an image of a second mark on a second substrate on which the pattern has been formed prior to the first substrate. 1. A lithography apparatus for forming a pattern on a substrate , the apparatus comprising:a stage configured to move while holding the substrate on which a mark is formed;an image sensor having an image sensing region in which a plurality of pixels are arranged in matrix;a processor configured to read out data concerning an image of the mark formed in the image sensing region sequentially on a row basis and process the readout data, thereby obtaining a position of the mark formed on the substrate; anda controller configured to position the substrate by moving said stage based on the position of the mark and form the pattern on the substrate,wherein when said processor obtains a position of a first mark on a first substrate, said controller moves said stage with respect to said image sensor such that an image of the first mark is formed closer to a row in the image sensing region, from which said processor starts readout of the data, than an image of a second mark on a second substrate on which the pattern has been formed prior to the first substrate.2. The apparatus according to claim 1 , wherein when readout of data of a first region as a data processing target out of the image sensing region has ended claim 1 , said processor starts ...

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23-04-2020 дата публикации

Design and noise based care areas

Номер: US20200126212A1
Принадлежит: KLA Tencor Corp

Methods and systems for setting up inspection of a specimen with design and noise based care areas are provided. One system includes one or more computer subsystems configured for generating a design-based care area for a specimen. The computer subsystem(s) are also configured for determining one or more output attributes for multiple instances of the care area on the specimen, and the one or more output attributes are determined from output generated by an output acquisition subsystem for the multiple instances. The computer subsystem(s) are further configured for separating the multiple instances of the care area on the specimen into different care area sub-groups such that the different care area sub-groups have statistically different values of the output attribute(s) and selecting a parameter of an inspection recipe for the specimen based on the different care area sub-groups.

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17-05-2018 дата публикации

Illumination Source for an Inspection Apparatus, Inspection Apparatus and Inspection Method

Номер: US20180136568A1
Принадлежит: ASML Netherlands B.V.

Disclosed is an illumination source apparatus comprising a high harmonic generation medium, a pump radiation source and a spatial filter. The pump radiation source emits a beam of pump radiation having a profile comprising no pump radiation in a central region of the beam and excites the high harmonic generation medium so as to generate high harmonic radiation. The pump radiation and the generated high harmonic radiation are spatially separated beyond the focal plane of the beam of pump radiation The spatial filter is located beyond a focal plane of the beam of pump radiation, and blocks the pump radiation. Also disclosed is a method of generating high harmonic measurement radiation optimized for filtration of pump radiation therefrom. 126-. (canceled)27. An illumination source apparatus , comprising:a high harmonic generation medium;a pump radiation source operable to emit a beam of pump radiation having a profile comprising no pump radiation in a central region of the beam, the beam of pump radiation configured to excite the high harmonic generation medium so as to generate high harmonic radiation; anda spatial filter located beyond a focal plane of the beam of pump radiation and operable to block the pump radiation;wherein the pump radiation and the generated high harmonic radiation are spatially separated beyond the focal plane of the beam of pump radiation.28. The illumination source apparatus of claim 27 , wherein the beam of pump radiation has a substantially symmetrical profile.29. The illumination source apparatus of claim 27 , wherein the beam of pump radiation has a substantially annular profile.30. The illumination source apparatus of claim 27 , wherein the spatial filter is located in a far field of the beam of pump radiation.31. The illumination source apparatus of claim 30 , wherein the beam of pump radiation in the far field has a similar profile as in a near field of the beam of pump radiation.32. The illumination source apparatus of claim 30 , ...

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08-09-2022 дата публикации

METHOD TO DETECT A DEFECT ON A LITHOGRAPHIC SAMPLE AND METROLOGY SYSTEM TO PERFORM SUCH A METHOD

Номер: US20220283513A1
Автор: Jabbour Toufic, Omlor Lars
Принадлежит:

A method to detect a defect on a lithographic sample includes the following steps: detection light and a detector having at least one sensor pixel are provided. Further, a detection pattern is provided causing a light structure of the detection light being structured at least along one dimension (1D, x). The detection pattern is aligned such that the detector is aligned normal to an extension (xy) of the light structure. Further, a complimentary pattern is provided having a 1D structure which is complimentary to that of the detection pattern. The sample is moved relative to the detection pattern while gathering the detection light on the detector. Further, a reference sample without defects or with negligible defects is provided. The reference sample also is moved relative to the detection pattern while gathering the detection light on the detector. A defect (sto s) localization on the sample is decoded by correlation using the complementary pattern. Using such defect detection method improves a signal-to-noise ratio. 1. A method to detect a defect on a lithographic sample with the following steps:providing detection light and a detector with at least one sensor pixel,providing a detection pattern (P) causing a light structure of the detection light being structured at least along one dimension (1D, x),aligning the detection pattern (P) such that the detector is aligned normal to an extension (xy) of the light structure,providing a complimentary pattern ({tilde over (P)}) which has a 1D structure which is complementary to that of the detection pattern (P),moving the sample relative to the detection pattern (P) while gathering the detection light on the detector,providing a reference sample without defects or with negligible defects,moving the reference sample relative to the detection pattern (P) while gathering the detection light on the detector,{'sub': 1', '4, 'decoding a defect (sto s) localization on the sample by correlation using the complementary pattern ({ ...

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04-06-2015 дата публикации

POSITIONING APPARATUS, LITHOGRAPHY APPARATUS, AND ARTICLE MANUFACTURING METHOD

Номер: US20150153655A1
Автор: YAMADA Masanori
Принадлежит:

An apparatus, includes first and second measurement devices configured to measure a position in a first direction of a moving body; a drive unit configured to drive the moving body in the first direction; a controller configured to generate a control input for driving the drive unit, based on a control deviation in accordance with position command information in the first direction of the moving body and position measurement information from the first or second measurement device, and a control parameter set to a certain value. 1. An apparatus comprising:first and second measurement devices configured to measure a position in a first direction of a moving body;a drive unit configured to drive the moving body in the first direction;a controller configured to generate a control input for driving the drive unit, based on a control deviation in accordance with position command information in the first direction of the moving body and position measurement information from the first or second measurement device, and a control parameter set to a certain value;a switch unit configured to switch a measurement device used in generation of the control input from the first measurement device to the second measurement device or from the second measurement device to the first measurement device; anda change unit configured to change the set value of the control parameter in accordance with switching performed by the switch unit.2. The apparatus according to claim 1 , wherein the control parameter is any one of a proportional gain Kp claim 1 , an integral gain Ki claim 1 , and a derivative gain Kd claim 1 , or a combination of at least two thereof.3. The apparatus according to claim 1 , wherein the first measurement device and the second measurement device include interferometers.4. The apparatus according to claim 3 ,wherein measurement light that progresses from the first measurement device to the moving body and measurement light that progresses from the second measurement ...

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07-06-2018 дата публикации

Method of Measuring a Target, Metrology Apparatus, Polarizer Assembly

Номер: US20180157180A1
Автор: PANDEY Nitesh, Zhou Zili
Принадлежит: ASML Netherlands B.V.

Methods of measuring a target formed by a lithographic process, a metrology apparatus and a polarizer assembly are disclosed. The target comprises a layered structure having a first periodic structure in a first layer and a second periodic structure in a second layer. The target is illuminated with polarized measurement radiation. Zeroth order scattered radiation from the target is detected. An asymmetry in the first periodic structure is derived using the detected zeroth order scattered radiation from the target. A separation between the first layer and the second layer is such that the detected zeroth order scattered radiation is independent of overlay error between the first periodic structure and the second periodic structure. The derived asymmetry in the first periodic structure is used to derive the correct overlay value between the first periodic structure and the second periodic structure. 133-. (canceled)34. A method of measuring a target formed by a lithographic process , the target comprising a layered structure having a first periodic structure in a first layer and a second periodic structure in a second layer , the method comprising:illuminating the target with polarized measurement radiation;detecting zeroth order scattered radiation from the target; andderiving an asymmetry in the first periodic structure using the detected zeroth order scattered radiation from the target,wherein a separation between the first layer and the second layer is such that the zeroth order scattered radiation is independent of overlay error between the first periodic structure and the second periodic structure.35. The method of claim 34 , wherein:the detecting comprises detecting a crossed polarization component of the zeroth order scattered radiation; andthe deriving uses the crossed polarization component of the zeroth order scattered radiation.36. The method of claim 34 , further comprising:detecting higher than zeroth order scattered radiation from the target; ...

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30-05-2019 дата публикации

EXPOSURE SYSTEM, EXPOSURE DEVICE AND EXPOSURE METHOD

Номер: US20190163074A1
Автор: CHEN Yonghui, GE Yaping, Lan Ke
Принадлежит:

An exposure system (), an exposure apparatus and an exposure method are disclosed. The exposure system () includes: a laser unit (), a light spot switching unit () and a lens unit (); the laser unit () is configured for producing a laser beam; the light spot switching unit () is configured to direct the laser beam to travel along one of different optical paths based on a desired size of a light spot for a workpiece to be exposed so that a laser beam in correspondence with the desired size of the light spot is obtained; and the lens unit () is configured for altering a direction in which the laser beam is incident on the workpiece. The light spot switching unit () enables the laser beam to be switched between the different optical paths so as to form light spots sized in different ranges, which can satisfy different needs of workpieces with various critical dimensions. As a result, an improvement in processing adaptability to different workpieces and a significant reduction in cost can be achieved. 1. An exposure system , comprising: a laser unit , a light spot switching unit and a lens unit , the laser unit configured to produce a laser beam , the light spot switching unit comprising a first optical path and a second optical path and configured to direct the laser beam to travel along one of the first and second optical paths based on a desired size of a light spot for a workpiece to be exposed so that a laser beam in correspondence with the desired size of the light spot is obtained , the lens unit configured to alter a direction in which the laser beam is incident on the workpiece , the first optical path configured to follow a diffraction-limit principle to generate a first light spot that is adjustable and has a size smaller than the threshold light spot size , the second optical path configured to generate , by geometrical imaging , a second light spot that is adjustable and has a size greater than or equal to the threshold light spot size.2. The exposure ...

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29-09-2022 дата публикации

Extreme ultraviolet (euv) collector inspection apparatus and method

Номер: US20220309643A1
Принадлежит: SAMSUNG ELECTRONICS CO LTD

An extreme ultraviolet (EUV) collector inspection apparatus and method capable of precisely inspecting a contamination state of an EUV collector and EUV reflectance in accordance with the contamination state are provided. The EUV collector inspection apparatus includes a light source arranged in front of an EUV collector to be inspected and configured to output light in a visible light (VIS) band from UV rays, an optical device configured to output narrowband light from the light, and a camera configured to perform imaging from an UV band to a VIS band. An image by wavelength of the EUV collector is obtained by using the optical device and the camera and a contamination state of the EUV collector is inspected.

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21-06-2018 дата публикации

DETERMINATION OF OPERABILITY OF A DIGITAL SCANNER WITH SHEARING INTERFEROMETRY

Номер: US20180172437A1
Автор: Goodwin Eric Peter
Принадлежит:

System and method for monitoring of performance of a mirror array of a digital scanner with a use of a lateral shearing interferometer (operated in either static or a phase-shifting condition) to either simply identify problematic pixels for further troubleshooting or measure the exact magnitude of the mirror's deformation. 1. An optical imaging system comprising:an array of reflectors having an axis normal to a surface thereof;a first optical system configured to split an incident optical wavefront impinging thereon along the axis into first and second optical wavefronts, the first and second optical wavefronts having collinear normal vectors that are transversely shifted with respect to one another in a direction perpendicular to the axis; andan optical detector positioned to receive light from both the first and second optical wavefronts such as to detect interference fringes produced by interference between the first and second optical wavefronts.2. An optical imaging system according to claim 1 , wherein the first optical system includes a lateral shearing interferometer.3. An optical imaging system according to claim 1 , first, second, and third optical polarization elements disposed immediately adjacent to one another along the axis; and', 'a first optical lens element having a focal length and disposed between the first optical polarizer and the array of reflectors., 'wherein the first optical system includes'}4. An optical imaging system according to claim 3 , wherein an axial separation between the array of reflectors and the optical detector is substantially equal to a quadruple of said focal length.5. An optical imaging system according to claim 3 , further comprising a second optical element having the focal length and configured to focus a collimated beam of light claim 3 , arriving thereon from the array of reflectors claim 3 , at a focal point of the first optical lens.6. An optical imaging system according to claim 3 , wherein the first optical ...

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20-07-2017 дата публикации

Method of Measuring a Property of a Target Structure, Inspection Apparatus, Lithographic System and Device Manufacturing Method

Номер: US20170206649A1
Принадлежит: ASML Netherlands B.V.

A property of a target structure is measured based on intensity of an image of the target. The method includes (a) obtaining an image of the target structure; (b) defining a plurality of candidate regions of interest, each candidate region of interest comprising a plurality of pixels in the image; (c) defining an optimization metric value for the candidate regions of interest based at least partly on signal values of pixels within the region of interest; (d) defining a target signal function which defines a contribution of each pixel in the image to a target signal value. The contribution of each pixel depends on (i) which candidate regions of interest contain that pixel and (ii) optimization metric values of those candidate regions of interest. 1. A method of measuring a property of a target structure on a substrate , the method comprising:obtaining an image of the target structure using a predetermined portion of radiation diffracted by the target structure under illumination;defining candidate regions of interest each comprising a plurality of pixels in the obtained image;defining an optimization metric value for the candidate regions of interest based at least partly on pixel signal values of the plurality of pixels within each of the candidate regions of interest;defining a target signal function which defines a contribution of each pixel in the image to a target signal value, the contribution of each pixel depending on (i) which respective ones of the candidate regions of interest contain that pixel and (ii) optimization metric values of the respective ones of the candidate regions of interest; andobtaining a measurement of the property of the target structure or a different target structure using the target signal value determined by combining multiple pixel signal values from the obtained image in accordance with the defined target signal function.2. The method of claim 1 , wherein the candidate regions of interest differ from one another in two or more ...

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27-07-2017 дата публикации

Compact Two-Sided Reticle Inspection System

Номер: US20170212057A1
Принадлежит: ASML Holding N.V.

An apparatus and method is provided to efficiently and more precisely inspect reticles for contamination. The inspection system is used to image the reticle back-side and pellicle-side separately by transferring the reticle while maintaining desired demagnification. An inspection system is disclosed that includes a reticle support to support the reticle at a first position and an illumination source to illuminate a first surface of the reticle at the first position. The inspection system further includes a first sensor to receive light from the illuminated first surface of the reticle when the reticle is at the first position and a second sensor to receive light from an illuminated second surface of the reticle when the reticle is at a second position. 1. An inspection system , comprising:a reticle support configured to support a reticle at a first position;an illumination source configured to illuminate a first surface of the reticle at the first position;a first sensor configured to receive light from the illuminated first surface of the reticle when the reticle is at the first position; andthe reticle support further configured to support the reticle at a second position;the illumination source further configured to illuminate a second surface of the reticle at the second position; anda second sensor configured to receive light from the illuminated second surface of the reticle when the reticle is at the second position.2. The inspection system of claim 1 , further comprising:a processor configured to determine contamination of the first and second surfaces of the reticle.3. The inspection system of claim 2 , wherein the processor is further configured to control transfer of the reticle support between the first and second positions.4. The inspection system of claim 1 , wherein the first and second sensors include inspection cameras configured to image the first and second surfaces of the reticle.5. The inspection system of claim 1 , wherein the first surface of ...

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04-07-2019 дата публикации

DETERMINATION OF OPERABILITY OF A DIGITAL SCANNER WITH SHEARING INTERFEROMETRY

Номер: US20190204074A1
Автор: Goodwin Eric Peter
Принадлежит:

System and method for monitoring of performance of a mirror array of a digital scanner with a use of a lateral shearing interferometer (operated in either static or a phase-shifting condition) to either simply identify problematic pixels for further troubleshooting or measure the exact magnitude of the mirror's deformation. 1. An optical imaging system configured to receive light from a first plane , the optical imaging system comprising: 'wherein the first and second optical wavefronts have collinear normal vectors that are transversely shifted with respect to one another in a direction that is transverse to the axis; and', 'a first optical system configured to split an incident optical wavefront of said light, impinging thereon along the axis, into first and second optical wavefronts,'}an optical detector positioned to receive light from both the first and second optical wavefronts such as to detect interference fringes produced by interference between the first and second optical wavefronts.2. The optical imaging system according to claim 2 , wherein the first optical system further includes first and second lenses that are positioned co-axially with one another so as to define a detecting surface of the optical detector to be optically-conjugate with the first plane.3. The optical imaging system according to claim 2 , wherein the first optical system includes a first optical polarizer element configured to split the incident optical wavefront into the first and second optical wavefronts claim 2 , and wherein the first polarizer element is positioned between the second lens and the optical detector.4. The optical imaging system according to claim 2 , further comprising a beam splitter disposed across the axis between the first and second lenses.5. The optical imaging system according to claim 1 , wherein the first optical system includes a group of lenses including first and second lens elements and a first optical polarizer element claim 1 , wherein a focal ...

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04-08-2016 дата публикации

METROLOGY METHOD, METROLOGY APPARATUS AND DEVICE MANUFACTURING METHOD

Номер: US20160223476A1
Автор: QUINTANILHA Richard
Принадлежит: ASML Netherlands B.V.

A pattern is applied to a substrate by a lithographic apparatus as part of a lithographic manufacturing system. Structures are produced with feature sizes less than 10 nm. A target includes one or more gratings with a direction of periodicity. A detector captures one or more diffraction spectra, to implement small angle X-ray scattering metrology. One or more properties, such as linewidth (CD), are calculated from the captured spectra for example by reconstruction. The irradiation direction defines a non-zero polar angle relative to a direction normal to the substrate and defines a non-zero azimuthal angle relative to the direction of periodicity, when projected onto a plane of the substrate. By selecting a suitable azimuthal angle, the diffraction efficiency of the target can be enhanced by a large factor. This allows measurement time to be reduced significantly compared with known techniques. 1. A method comprising:irradiating a periodic structure with x-radiation along an irradiation direction, the periodic structure having been formed by a lithographic process on a substrate and having a periodicity in a first direction,detecting x-radiation scattered by the periodic structure after transmission through the substrate, andprocessing signals representing the detected scattered radiation to determine a property of the periodic structure,wherein the irradiation direction defines a non-zero polar angle relative to a direction normal to the substrate and defines a non-zero azimuthal angle relative to the first direction, when projected onto a plane of the substrate.2. The method of claim 1 , wherein the azimuthal angle is selected so that a diffraction efficiency of the periodic structure in one or more non-zero diffraction orders is greater than would be the case for an irradiation direction of zero azimuthal angle.3. The method of claim 2 , wherein the azimuthal angle is selected so that a diffraction efficiency of the periodic structure in a first order of ...

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11-07-2019 дата публикации

Method and apparatus for deriving corrections, method and apparatus for determining a property of a structure, device manufacturing method

Номер: US20190212660A1
Принадлежит: ASML Netherlands BV

An optical system delivers illuminating radiation and collects radiation after interaction with a target structure on a substrate. A measurement intensity profile is used to calculate a measurement of the property of the structure. The optical system may include a solid immersion lens. In a method, the optical system is controlled to obtain a first intensity profile using a first illumination profile and a second intensity profile using a second illumination profile. The profiles are used to derive a correction for mitigating the effect of, e.g., ghost reflections. Using, e.g., half-moon illumination profiles in different orientations, the method can measure ghost reflections even where a solid immersion lens would cause total internal reflection. The optical system may include a contaminant detection system to control a movement based on received scattered detection radiation. The optical system may include an optical component having a dielectric coating to enhance evanescent wave interaction.

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09-08-2018 дата публикации

Lithographic Method and Apparatus

Номер: US20180224751A1
Принадлежит: ASML Netherlands B.V.

An illumination system (IL) for a lithographic apparatus comprising a polarization adjustment apparatus () arranged to receive linearly polarized radiation, the polarization adjustment apparatus comprising regions which are configured to rotate the polarization orientation by different amounts, a directing apparatus () operable to direct the radiation through one or more regions of the polarization adjustment apparatus, a controller (CN) configured to control the directing apparatus so as to control which of the one or more regions of the polarization adjustment apparatus radiation is directed through, wherein the controller is configured to limit which of the regions radiation is directed through to one or more regions which rotate the orientation of the linear polarization by substantially the same amount, and a diffuser configured to receive radiation output from the polarization adjustment apparatus and increase a range of angles at which the radiation propagates whilst substantially conserving the polarization state of the radiation. 1. An illumination system for a lithographic apparatus , the illumination system comprising:a polarization adjustment apparatus arranged to receive linearly polarized radiation, the polarization adjustment apparatus comprising regions which are configured to rotate the orientation of the linear polarization by different amounts;a directing apparatus operable to direct the linearly polarized radiation through one or more regions of the polarization adjustment apparatus;a controller configured to control the directing apparatus so as to control which of the one or more regions of the polarization adjustment apparatus radiation is directed through, wherein the controller is configured to limit which of the regions of the polarization adjustment apparatus radiation is directed through to one or more regions which are configured to rotate the orientation of the linear polarization by substantially the same amount, such that radiation ...

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10-08-2017 дата публикации

Method for evaluating shaping aperture array

Номер: US20170229282A1
Автор: Satoru Hirose
Принадлежит: Nuflare Technology Inc

In one embodiment, a method for evaluating a shaping aperture array includes forming a plurality of evaluation patterns on a substrate, the evaluation patterns each including a first line portion along a first direction and a second line portion along a second direction perpendicular to the first direction by performing writing using a plurality of beams formed by passage of a charged particle beam through a shaping aperture array having a plurality of holes, measuring, for each of the plurality of evaluation patterns, a position of the first line portion in the second direction, a position of the second line portion in the first direction, and a line width of the first line portion or the second line portion, and evaluating accuracy of the plurality of holes based on a result of measurement. Each evaluation pattern is written using one beam that has passed through a corresponding one of the holes in the shaping aperture array.

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19-08-2021 дата публикации

RETICLE BACKSIDE INSPECTION METHOD

Номер: US20210256686A1
Принадлежит:

A method of inspecting a reticle includes obtaining a first image of a surface of the reticle at a first height by scanning the reticle surface with a light source at the first height of the reticle surface relative to a reference surface height of the reticle surface and obtaining a second image of the reticle surface at a second height by scanning the reticle surface with the light source at the second height of the reticle surface relative to the reference surface height of the reticle surface. The second height is different from the first height. The first and the second images are then combined to obtain a surface profile image of the reticle. 1. A method of inspecting a reticle , comprising:obtaining a first image of a backside surface of the reticle at a first height by applying a first light beam from a first light source and a second light beam from a second light source on the backside surface of the reticle, the second light beam having a different wavelength from the first light beam, the first height of the backside surface of the reticle being relative to a reference surface height of the backside surface of the reticle;obtaining a second image of the backside surface of the reticle at a second height by applying the first light beam from the first light source and the second light beam from the second light source on the backside surface of the reticle, the second height of the backside surface of the reticle being relative to the reference surface height of the backside surface of the reticle and being different from the first height; anddetermining whether a particle exists on the backside surface of the reticle based on the first image and the second image.2. The method of claim 1 , wherein a distance between the first height and the second height is smaller than a thickness of the reticle.3. The method of claim 1 , further comprising combining the first and second images to obtain a surface profile image of the reticle.4. The method of claim 3 , ...

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23-08-2018 дата публикации

Methods of Aligning a Diffractive Optical System and Diffracting Beams, Diffractive Optical Element and Apparatus

Номер: US20180239160A1
Принадлежит: ASML Netherlands BV

A method of aligning a diffractive optical system, to be operated with an operating beam, comprises: aligning (558) the diffractive optical system using an alignment beam having a different wavelength range from the operating beam and using a diffractive optical element optimized (552) to diffract the alignment beam and the operating beam in the same (or a predetermined) direction. In an example, the alignment beam comprises infra-red (IR) radiation and the operating beam comprises soft X-ray (SXR) radiation. The diffractive optical element is optimized by providing it with a first periodic structure with a first pitch (pIR) and a second periodic structure with a second pitch (pSXR). After alignment, the vacuum system is pumped down (562) and in operation the SXR operating beam is generated (564) by a high harmonic generation (HHG) optical source pumped by the IR alignment beam’ optical source.

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30-09-2021 дата публикации

SYSTEMS AND METHODS USING MASK PATTERN MEASUREMENTS PERFORMED WITH COMPENSATED LIGHT SIGNALS

Номер: US20210302828A1
Принадлежит:

A system includes a plate configured for mounting of a reflective extreme ultra-violet (EUV) mask thereon and a zone plate configured to divide EUV light into zero-order light and first-order light and to pass the zero-order light and the first-order light to the reflective EUV mask. The system further includes a detector configured to receive EUV light reflected by the EUV mask and including a zero-order light detection region configured to generate a first image signal and a first-order light detection region configured to generate a second image signal, and a calculator configured to generate a compensated third image signal from the first image signal and the second image signal. The third image signal may be used to determine a distance between mask patterns of the EUV mask. 120-. (canceled)21. A method comprising:detecting EUV light reflected from a reflective EUV mask including first and second spaced apart mask patterns;generating respective first and second image signals corresponding to zero-order light and first-order light reflected by the EUV mask;generating a third image signal from the first and second image signals;determining a distance between the first mask pattern and the second mask pattern using the third image signal; andforming patterns on a substrate using the reflective EUV mask.22. The method of claim 21 , wherein generating the third image signal comprises dividing the second image signal by the first image signal.23. The method of claim 21 , wherein an intensity of the second image signal is greater than an intensity of the first image signal.24. The method of claim 21 , wherein the first and second mask patterns are formed in a measurement target region of the reflective EUV mask claim 21 , and wherein the second image signal comprises information for the measurement target region.25. The method of claim 21 , wherein generating respective first and second image signals corresponding to zero-order light and first-order light reflected by ...

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27-11-2014 дата публикации

METHOD AND APPARATUS FOR COMPENSATING AT LEAST ONE DEFECT OF AN OPTICAL SYSTEM

Номер: US20140347646A1
Принадлежит:

The invention relates to a method for compensating at least one defect of an optical system which comprises introducing an arrangement of local persistent modifications in at least one optical element of the optical system, which does not have pattern elements on one of its optical surfaces, so that the at least one defect is at least partially compensated. 126-. (canceled)27. A method , comprising:at least partially compensating for a defect of an optical system by introducing an arrangement of local persistent modifications in optical element of the optical system, wherein the optical element does not have pattern elements on one of its optical surfaces.28. The method of claim 27 , wherein the defect comprises a member selected from the group consisting of a local polarization variation of the optical element and a local intensity variation of the optical element.29. The method of claim 27 , further comprising one of the following:introducing the arrangement of local persistent modifications in an optically relevant area of the optical element;introducing the arrangement of local persistent modifications outside an optically relevant area of the optical element; orintroducing the arrangement of local persistent modifications in an optically relevant area of the optical element and introducing an additional arrangement of local persistent modifications outside the optically relevant area of the optical element.30. The method of claim 27 , further comprising selecting the arrangement of local persistent modifications so that a strain induced by the arrangement of local persistent modifications at least partially compensates a local polarization variation of the optical system.31. The method of claim 27 , wherein the defect of the optical system comprises a member selected from the group consisting of a defect of the optical element and a defect of a further optical element of the optical system.32. The method of claim 27 , further comprising determining the ...

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15-09-2016 дата публикации

Projection exposure system for microlithography and method of monitoring a lateral imaging stability

Номер: US20160266501A1
Принадлежит: CARL ZEISS SMT GMBH

A projection exposure system ( 10 ) for microlithography. The system includes projection optics ( 12 ) configured to image mask structures into a substrate plane ( 16 ), an input diffraction element ( 28 ) which is configured to convert irradiated measurement radiation ( 21 ) into at least two test waves ( 30 ) directed onto the projection optics ( 12 ) with differing propagation directions, a detection diffraction element ( 34; 28 ) which is disposed in the optical path of the test waves ( 30 ) after the latter have passed through the projection optics ( 12 ) and is configured to produce a detection beam ( 36 ) from the test waves ( 30 ) which has a mixture of radiation portions of both test waves ( 30 ), a photo detector ( 38 ) disposed in the optical path of the detection beam ( 36 ) which is configured to record the radiation intensity of the detection beam ( 36 ), time resolved, and an evaluation unit which is configured to determine the lateral imaging stability of the projection optics ( 12 ) from the radiation intensity recorded.

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15-08-2019 дата публикации

Detection apparatus, lithography apparatus, and method of manufacturing article

Номер: US20190250525A1
Принадлежит: Canon Inc

The present invention provides a detection apparatus for detecting a plurality of marks provided on a substrate, comprising: an optical system; an illumination unit configured to selectively illuminate the plurality of marks with a plurality of light beams via the optical system such that each of the plurality of marks is illuminated with at least one light beam; and an image capturing device configured to capture an image of the plurality of marks via the optical system, wherein the illumination unit includes a change unit configured to individually change an incident angle of each of the plurality of light beams on a pupil plane of the optical system, thereby changing an irradiated position of each of the plurality of light beams on the substrate.

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06-08-2020 дата публикации

Movable body apparatus, moving method, exposure apparatus, exposure method, flat-panel display manufacturing method, and device manufacturing method

Номер: US20200249586A1
Автор: Yasuo Aoki
Принадлежит: Nikon Corp

A movable body apparatus includes: a substrate holder which can move in the X-axis and Y-axis directions; a Y coarse movement stage which can move in the Y-axis direction; a first measurement system which acquires position information on the substrate holder by heads on the substrate holder and a scale on the Y coarse movement stage; a second measurement system which acquires position information on the Y coarse movement stage by heads on the Y coarse movement stage and a scale; and a control system which controls the position of the substrate holder based on position information acquired by the first and second measurement systems. The first measurement system irradiates a measurement beam while moving the heads in the X-axis direction with respect to the scale, and the second measurement system irradiates a measurement beam while moving the heads in the Y-axis direction with respect to the scale.

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22-09-2016 дата публикации

Measuring arrangement for measuring optical properties of a reflective optical element, in particular for microlithography

Номер: US20160274029A1
Принадлежит: CARL ZEISS SMT GMBH

A measuring arrangement for measuring optical properties of a reflective optical element, in particular for microlithography, with an EUV light source ( 5 ), a detector ( 20 ) configured to detect EUV radiation reflected at the reflective optical element ( 10 ), and an imaging system ( 30, 40, 50, 60, 70, 80, 90 ), which images object points on the reflective optical element onto respective image points on the detector, wherein the imaging system is configured to reflect the EUV radiation, a first optical component ( 31, 41, 51, 61, 71, 81, 91 ), and at least one second optical component ( 32, 42, 52, 62, 72, 82, 92 ). Both at the first optical component and at the second optical component, reflection angles with respect to respective surface normals that respectively occur during reflection of the EUV radiation are at least 70°.

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22-09-2016 дата публикации

PELLICLE AGING ESTIMATION AND PARTICLE REMOVAL FROM PELLICLE VIA ACOUSTIC WAVES

Номер: US20160274471A1
Принадлежит:

A pellicle is disposed over a lithography mask. An acoustic wave generator is placed over the pellicle. The acoustic wave generator is configured to generate acoustic waves to cause the pellicle to vibrate at a target resonance frequency. A resonance detection tool is configured to detect an actual resonance frequency of the pellicle in response to the acoustic waves. One or more electronic processors are configured to estimate an age condition of the pellicle as a function of a shift of the actual resonance frequency from the target resonance frequency. 1. A system , comprising:a pellicle disposed over a lithography mask;an acoustic wave generator placed over the pellicle, wherein the acoustic wave generator is configured to generate acoustic waves to cause the pellicle to vibrate at a target resonance frequency;a resonance detection tool configured to detect an actual resonance frequency of the pellicle in response to the acoustic waves; andone or more electronic processors configured to estimate an age condition of the pellicle as a function of a shift of the actual resonance frequency from the target resonance frequency.2. The system of claim 1 , wherein the acoustic wave generator includes a microphone or an array acoustic transducer that includes a plurality of acoustic transducers.3. The system of claim 1 , wherein the acoustic wave generator is configured to generate the acoustic waves to force the pellicle to vibrate at a predetermined mode of oscillation.4. The system of claim 1 , wherein the resonance detection tool includes:a source located on a first side of the pellicle, the source being configured to generate a signal that travels across the pellicle; anda sensor located on a second side of the pellicle opposite the first side, the sensor being configured to receive the signal.5. The system of claim 4 , wherein the source includes a laser claim 4 , and wherein the sensor includes a photo receiver.6. The system of claim 4 , wherein the source includes ...

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22-08-2019 дата публикации

Metrology Method and Apparatus with Increased Bandwidth

Номер: US20190258177A1
Принадлежит: ASML Netherlands B.V.

Disclosed is method of optimizing bandwidth of measurement illumination for a measurement application, and an associated metrology apparatus. The method comprises performing a reference measurement with reference measurement illumination having a reference bandwidth and performing one or more optimization measurements, each of said one or more optimization measurements being performed with measurement illumination having a varied candidate bandwidth. The one or more optimization measurements are compared with the reference measurement; and an optimal bandwidth for the measurement application is selected based on the comparison. 115-. (canceled)16. A method comprising:performing a reference measurement with reference measurement illumination having a reference bandwidth;performing one or more optimization measurements, each of the one or more optimization measurements being performed with measurement illumination having a varied candidate bandwidth;comparing the one or more optimization measurements with the reference measurement; andselecting an optimal bandwidth for the measurement application based on the comparison.17. The method of claim 16 , wherein the comparing comprises determining a bandwidth impact value for each of the one or more optimization measurements by comparing each of the one or more optimization measurements to the reference measurement.18. The method of claim 17 , wherein the selecting comprises selecting the broadest of the candidate bandwidths for which the bandwidth impact value meets a performance indicator.19. The method of claim 18 , wherein the performance indicator comprises a rejection threshold value such that the optimal bandwidth corresponds to the broadest candidate bandwidth for which the bandwidth impact value is below the rejection threshold value.20. The method of claim 19 , wherein the performing one or more optimization measurements and the comparing are performed such that the varied candidate bandwidth is increased and the ...

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29-09-2016 дата публикации

Efficient solution for removing euv native defects

Номер: US20160282713A1

The present disclosure relates to a method and apparatus for mitigating printable native defects in an extreme ultra violet (EUV) mask substrate. In some embodiments, the method is performed by identifying a printable native defect within an EUV mask substrate that violates one or more sizing thresholds. A first section of the EUV mask substrate including the printable native defect is removed to form a concavity within the EUV mask substrate. A multi-layer replacement section that is devoid of a printable native defect is inserted into the concavity.

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18-12-2014 дата публикации

Method for establishing distortion properties of an optical system in a microlithographic measurement system

Номер: US20140369592A1
Автор: Mario Laengle
Принадлежит: Carl Zeiss SMS GmbH

A method for establishing distortion properties of an optical system in a microlithographic measurement system is provided. The optical system has at least one pupil plane, in which the distortion properties of the optical system are established on the basis of measuring at least one distortion pattern, which the optical system generates when imaging a predetermined structure in an image field. The distortion properties of the optical system are established on the basis of a plurality of measurements of distortion patterns, in which these measurements differ from one another in respect of the intensity distribution present in each case in the pupil plane.

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05-10-2017 дата публикации

OPTICAL DEVICE

Номер: US20170284893A1
Принадлежит:

A device including an imaging optical unit () imaging an object field () in an image field (), a structured mask (), arranged in the region of the object field () via reticle holder () displaceable in a reticle scanning direction (), and a sensor apparatus (), arranged in the region of the image field () via a substrate holder () displaceable in a substrate scanning direction (). The mask () has at least one measurement structure () to be imaged on the sensor apparatus (), wherein the sensor apparatus () includes at least one sensor row () with a multiplicity of sensor elements (), and affords the possibility of testing the imaging optical unit () during the displacement of the substrate holder () for exposing a substrate () arranged on the substrate holder. 12-. (canceled)3. Optical device comprisinga. an imaging optical unit for imaging an object field in an image field,b. a structured mask, which is arranged in the region of an object plane of the imaging optical unit by means of a reticle holder that can be displaced in a reticle scanning direction, andc. a sensor apparatus, which is arranged in the region of an image plane of the imaging optical unit by means of a substrate holder that can be displaced in a substrate scanning direction,d. wherein the mask has at least one measurement structure to be imaged on the sensor apparatus,e. wherein the measurement structure is embodied such that a plurality of channels are formed for a channel-resolved test of the imaging optical unit.4. Device according to claim 3 , wherein the measurement structure has a diffraction structure with at least two diffraction directions.5. Device according to claim 3 , wherein the sensor apparatus comprises at least one interferometric apparatus.6. Device according to claim 3 , wherein the sensor elements have a clock frequency of at least 1 kHz.7. Device according to claim 3 , wherein the sensor apparatus comprises at least two sensor rows with a multiplicity of sensor elements.8. ...

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12-10-2017 дата публикации

Metrology Target, Method and Apparatus, Target Design Method, Computer Program and Lithographic System

Номер: US20170293233A1
Принадлежит: ASML Netherlands B.V.

Disclosed is a method of measuring a target, associated substrate comprising a target and computer program. The target comprises overlapping first and second periodic structures. The method comprising illuminating the target with measurement radiation and detecting the resultant scattered radiation. The pitch of the second periodic structure is such, relative to a wavelength of the measurement radiation and its angle of incidence on the target, that there is no propagative non-zeroth diffraction at the second periodic structure resultant from said measurement radiation being initially incident on said second periodic structure. There may be propagative non-zeroth diffraction at the second periodic structure which comprises further diffraction of one or more non-zero diffraction orders resultant from diffraction by the first periodic structure. Alternatively, the detected scattered radiation may comprise non-zero diffraction orders obtained from diffraction at said the periodic structure which have been disturbed in the near field by the second periodic structure. 1. A method of measuring a target , the target comprising overlapping periodic structures , the overlapping periodic structures comprising a first periodic structure and a second periodic structure , the method comprising:illuminating the target with measurement radiation; anddetecting resultant scattered radiation;wherein a pitch of the second periodic structure is such, relative to a wavelength of the measurement radiation and its angle of incidence on the target, that there is no propagative non-zeroth diffraction in reflection at the second periodic structure resultant from the measurement radiation being initially incident on the second periodic structure.2. The method of claim 1 , wherein the pitch of the first periodic structure is larger than the wavelength of the measurement radiation.3. The method of claim 1 , wherein the pitch of the second periodic structure is substantially equal to claim 1 , ...

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26-09-2019 дата публикации

Method of Measuring a Target, Metrology Apparatus, Polarizer Assembly

Номер: US20190294054A1
Автор: PANDEY Nitesh, Zhou Zili
Принадлежит: ASML Netherlands B.V.

Methods of measuring a target formed by a lithographic process, a metrology apparatus and a polarizer assembly are disclosed. The polarizer assembly comprises a polarizing structure having a substantially planar form and configured to polarize radiation passing there through in a circular polarizing region. The circular polarizing region is configured to apply a first polarization to radiation passing through a first one of two pairs of diametrically opposite quadrants of the circular polarizing region and to apply a second polarization, orthogonal to the first polarization, to radiation passing through a second one of two pairs of diametrically opposite quadrants of the circular polarizing region. 1. A polarizer assembly comprising:a polarizing structure comprising a substantially planar form and configured to polarize radiation passing there through in a circular polarizing region,wherein the circular polarizing region is configured to apply a first polarization to radiation passing through a first one of two pairs of diametrically opposite quadrants of the circular polarizing region and to apply a second polarization, orthogonal to the first polarization, to radiation passing through a second one of two pairs of diametrically opposite quadrants of the circular polarizing region.2. The polarizer assembly of claim 1 , wherein the first polarization comprises a polarization in a horizontal direction and the second polarization comprises a polarization in a vertical direction.3. The polarizer assembly of claim 1 , wherein the first polarization comprises a polarization in a vertical direction and the second polarization comprises a polarization in a horizontal direction.4. The polarizer assembly of claim 1 , wherein the polarizer assembly is located in a pupil plane of an optical system of a metrology apparatus.6. The polarizer assembly of claim 1 , wherein the polarizer assembly is located in a pupil plane of an optical system of a metrology apparatus prior to ...

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12-11-2015 дата публикации

LITHOGRAPHIC PRINTING SYSTEM WITH PLACEMENT CORRECTIONS

Номер: US20150323319A1
Автор: Sandstrom Torbjorn
Принадлежит: MICRONIC MYDATA AB

The technology disclosed relates to methods and devices that compensate for displacements in a pattern or deformations of a workpiece. In particular, this relates to using timing to compensate for displacements along a first axis along the scanning direction while using resampling, interpolation or a similar method to compensate for displacements along a second axis that is substantially orthogonal to the first axis. The scanning direction may be an actual direction of movement of the scanning head or it may be a direction perpendicular to an orientation of an image projected onto a workpiece. 1. A method of inspecting a workpiece , the method including:rotating a rotor assembly comprising two or more rotor arms over a workpiece,wherein the rotor arms extend from and rotate about a hub;relaying image information from a portion of a surface of the workpiece through relay optics located on one of the rotor arms and the hub to an optical analytical instrument.2. The method of claim 1 , wherein optical analytical instrument is stationary relative to the rotor arms.3. The method of claim 1 , further including:determining flatness or smoothness of the workpiece with the image information relayed to the optical analytical instrument.4. The method of claim 1 , further including:verifying pattern integrity for a pattern patterned on the workpiece from the image information relayed to the optical analytical instrument.5. The method of claim 1 , further including:illuminating the portion of the workpiece by providing illumination from an illumination source near or at the hub and through the relay optics.6. A device for inspecting a workpiece claim 1 , the device including:a rotor assembly comprising two or more rotor arms extending from and configured to rotate about a hub;relay optics, located on one of the rotor arms and the hub, and configured to relay image information from a portion of a surface of the workpiece to an optical analytical instrument.7. The device of claim ...

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10-10-2019 дата публикации

LITHOGRAPHY OPTICS ADJUSTMENT AND MONITORING

Номер: US20190310558A1
Принадлежит:

Methods and apparatus for processing an image of a beam generated by an optical system to extract information indicative of an extent of damage to optical elements in the optical system. Also disclosed is a beam image and analysis tool capable of acquiring an image of a beam at any one of a number of locations. 1. A method for automatically detecting a state of a light source for semiconductor photolithography , the method comprising the steps of:(a) obtaining at least a portion of an image of a light beam produced by the light source;(b) obtaining image data from the portion;(c) filtering the image data using template matching to detect a state of the light source;(d) storing the results of the filtering operation in a database, wherein steps (a) through (c) are performed repeatedly over a period of time to detect the state repeatedly;(e) determining an evolution of the state over time from the plurality of stored results of the filtering step; and(f) adjusting the light source after a period of time having a duration based at least in part on the evolution of the state over time.2. A method as claimed in wherein the state is an extent of existence of one or more features in the image.3. A method as claimed in wherein one of the one or more features in the image is a worm-like feature.4. A method as claimed in wherein the state is an extent of existence of one or more defects in at least one optical element in the light source.5. A method as claimed in wherein one of the one or more defects in the image is a slip plane defect.6. A method as claimed in wherein the step (d) of storing the results of the filtering operation in a database includes appending the results of the filtering operation to a database containing a plurality of previous results of performing steps (a) through (c).7. A method as claimed in wherein the results are appended using wrap-around indexing.8. A method as claimed in wherein the results are appended using bit shifting.9. A method as ...

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08-10-2020 дата публикации

Metrology Method and Apparatus with Increased Bandwidth

Номер: US20200319562A1
Принадлежит: ASML Netherlands BV

Disclosed is method of optimizing bandwidth of measurement illumination for a measurement application, and an associated metrology apparatus. The method comprises performing a reference measurement with reference measurement illumination having a reference bandwidth and performing one or more optimization measurements, each of said one or more optimization measurements being performed with measurement illumination having a varied candidate bandwidth. The one or more optimization measurements are compared with the reference measurement; and an optimal bandwidth for the measurement application is selected based on the comparison.

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03-12-2015 дата публикации

Inspection Apparatus and Method

Номер: US20150346609A1
Автор: Arie Jeffrey Den Boef
Принадлежит: ASML Netherlands BV

A spectroscopic scatterometer detects both zero order and higher order radiation diffracted from an illuminated spot on a target grating. The apparatus forms and detects a spectrum of zero order (reflected) radiation, and separately forms and detects a spectrum of the higher order diffracted radiation. Each spectrum is formed using a symmetrical phase grating, so as to form and detect a symmetrical pair of spectra. The pair of spectra can be averaged to obtain a single spectrum with reduced focus sensitivity. Comparing the two spectra can yield information for improving height measurements in a subsequent lithographic step. The target grating is oriented obliquely so that the zero order and higher order radiation emanate from the spot in different planes. Two scatterometers can operate simultaneously, illuminating the target from different oblique directions. A radial transmission filter reduces sidelobes in the spot and reduces product crosstalk.

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23-11-2017 дата публикации

Spheroidal mirror reflectivity measuring apparatus for extreme ultraviolet light

Номер: US20170336282A1
Принадлежит: GIGAPHOTON INC, University of Tokyo NUC

A spheroidal mirror reflectivity measuring apparatus for extreme ultraviolet light may include an extreme ultraviolet light source, an optical system, and a first photosensor. The extreme ultraviolet light source may be configured to output extreme ultraviolet light to a spheroidal mirror that includes a spheroidal reflection surface. The optical system may be configured to allow the extreme ultraviolet light to travel to the spheroidal reflection surface via a first focal position of the spheroidal mirror. The first photosensor may be provided at a second focal position of the spheroidal mirror, and may be configured to detect the extreme ultraviolet light that has passed through the first focal position and then has been reflected by the spheroidal reflection surface.

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15-10-2020 дата публикации

Stochastic Reticle Defect Dispositioning

Номер: US20200326634A1
Принадлежит:

A system for stochastic reticle defect dispositioning is disclosed. The system includes a controller including one or more processors and memory. The one or more processors configured to acquire product metrology data of a product reticle. The one or more processors configured to perform one or more stochastic simulations based on the product metrology data to generate one or more simulated product samples including the pattern of elements. The one or more processors configured to generate a product model of the product reticle modeling the printing process of the pattern of elements by the product reticle. The one or more processors configured to identify at least one of a care area of the product reticle which is susceptible to printing stochastic defects on product samples, or a care area on the one or more simulated product samples which is susceptible to printed stochastic defects based on the product model. 1. A system , comprising: acquire product metrology data of a product reticle, the product reticle configured to be used to print a pattern of elements on one or more product samples;', 'perform one or more stochastic simulations of a printing process based on the product metrology data of the product reticle to generate one or more simulated product samples including the pattern of elements;', 'generate a product model of the product reticle modeling the printing process of the pattern of elements by the product reticle; and', 'identify at least one of a care area of the product reticle which is susceptible to printing stochastic defects on product samples, or a care area on the one or more simulated product samples which is susceptible to printed stochastic defects based on the product model., 'a controller including one or more processors configured to execute a set of program instructions stored in memory, the set of program instructions configured to cause the one or more processors to2. The system of claim 1 , wherein the controller is configured to ...

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29-11-2018 дата публикации

Three dimensional structure fabrication control using novel processing system

Номер: US20180340769A1

An apparatus may include a processor and memory unit, including a control routine having a measurement processor to determine, based upon a first set of scatterometry measurements, a first change in a first dimension of a first set of substrate features along a first direction. The first set of substrate features may be elongated along a second direction perpendicular to the first direction. The measurement processor may be to determine, based upon a second set of scatterometry measurements, a second change in dimension of a second set of substrate features along the second direction, wherein the second set of substrate features is elongated along the first direction. The apparatus may include a control processor to generate an error signal when a figure of merit based upon the first change and the second change lies outside a target range.

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31-10-2019 дата публикации

OPTICAL APPARATUS, EXPOSURE APPARATUS, METHOD OF MANUFACTURING OPTICAL APPARATUS, AND METHOD OF MANUFACTURING ARTICLE

Номер: US20190332016A1
Принадлежит:

An optical apparatus includes an optical component, a support mechanism configured to support the optical component, a manipulation mechanism configured to manipulate the optical component while contacting the optical component such that a state of the optical component is changed. The optical component is changed by the manipulation mechanism from a first state in which the optical component is supported by the support mechanism to a second state in which the optical component is supported by the manipulation mechanism.

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07-11-2019 дата публикации

CONTROL DEVICE, LITHOGRAPHY APPARATUS, AND METHOD OF MANUFACTURING ARTICLE

Номер: US20190339624A1
Принадлежит:

The present invention provides a control device that performs position control of a control target by giving a feedforward manipulated value to the control target, wherein the device obtains, for each of a plurality of positions at which the control target is to be arranged, a measurement result of a first output response of the control target obtained when giving a first manipulated value to the control target, determines a reference value of the first output response, based on the measurement results respectively obtained at the plurality of positions, determines a second manipulated value by arraying a plurality of first manipulated values in time-series based on a relationship between the first manipulated value and the reference value, and sets the feedforward manipulated value based on the second manipulated value. 1. A control device that performs position control of a control target by giving a feedforward manipulated value to the control target , wherein the control device is configured to:obtain, for each of a plurality of positions at which the control target is to be arranged, a measurement result of a first output response of the control target obtained when giving a first manipulated value to the control target;determine a reference value of the first output response, based on the measurement results respectively obtained at the plurality of positions;determine a second manipulated value by arraying a plurality of first manipulated values in time-series and multiplying each of the plurality of first manipulated values by a coefficient, wherein the coefficient is adjusted such that a difference between a second output response of the control target predicted when giving the second manipulated value to the control target and a target response falls within an allowable range, and the second output response is predicted based on a relationship between the first manipulated value and the reference value; andset the feedforward manipulated value based on the ...

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06-12-2018 дата публикации

EXPOSURE APPARATUS AND DEVICE FABRICATION METHOD

Номер: US20180348642A1
Автор: ONO Kazuya
Принадлежит: NIKON CORPORATION

An exposure apparatus includes a liquid supply system having a supply path via which liquid is supplied to a space under a projection system; a liquid recovery system having a recovery path via which the supplied liquid is collected; a supply flow-meter provided at the supply path; a recovery flow-meter provided at the recovery path; a stage system having a movable stage apparatus on which a substrate is held; and a light receiver which is provided at the movable stage apparatus and which receives detection light via a light-transmissive member. The light-transmissive member has a liquid repellent upper surface from which the detection light is incident on the light-transmissive member. The substrate is exposed through liquid in a liquid immersion area formed on a portion of an upper surface of the substrate while supplying liquid via the supply path and collecting liquid via the recovery path. 1. An exposure apparatus comprising:a projection system;a liquid supply system having a supply path via which liquid is supplied to a space under the projection system;a liquid recovery system having a recovery path via which the supplied liquid is collected;a supply flow-meter provided at the supply path;a recovery flow-meter provided at the recovery path;a stage system having a movable stage apparatus on which a substrate is held; anda light receiver which is provided at the movable stage apparatus and which receives detection light via a light-transmissive member, whereinthe light-transmissive member is provided with a liquid repellent upper surface from which the detection light is incident on the light-transmissive member,a liquid immersion area is formed on a portion of an upper surface of the substrate while performing liquid supply via the supply path and liquid collection via the recovery path, andthe substrate is exposed through the liquid in the liquid immersion area.2. The apparatus according to claim 1 , wherein the recovery flow-meter measures an amount of the ...

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22-12-2016 дата публикации

Method of Metrology, Inspection Apparatus, Lithographic System and Device Manufacturing Method

Номер: US20160370710A1
Принадлежит: ASML Netherlands B.V.

Disclosed is a method of determining a correction for measured values of radiation diffracted from a target comprising a plurality of periodic structures, subsequent to measurement of the target using measurement radiation defining a measurement field. The correction acts to correct for measurement field location dependence in the measured values. The method comprises performing a first and second measurements of the periodic structures; and determining a correction from said first measurement and said second measurement. The first measurement is performed with said target being in a normal measurement location with respect to the measurement field. The second measurement is performed with the periodic structure in a shifted location with respect to the measurement field, said shifted location comprising the location of another of said periodic structures when said target is in said normal measurement location with respect to the measurement field. 1. A method of determining a correction for measured values of radiation diffracted from a target subsequent to measurement of the target using measurement radiation defining a measurement field , said correction correcting for measurement field location dependence in said measured values , said target comprising a plurality of periodic structures , said method comprises:performing a first measurement and a second measurement of at least one of said periodic structures; anddetermining a correction from said first measurement and said second measurement; wherein:said first measurement is performed with said target being in a normal measurement location with respect to the measurement field; andsaid second measurement is performed with the periodic structure in a shifted location with respect to the measurement field, said shifted location comprising the location of another of said periodic structures when said target is in said normal measurement location with respect to the measurement field.23.-. (canceled)4. The method ...

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31-12-2015 дата публикации

MEASUREMENT APPARATUS, LITHOGRAPHY APPARATUS, AND METHOD OF MANUFACTURING ARTICLE

Номер: US20150378265A1
Принадлежит:

The present invention provides a measurement apparatus that includes a movable stage and measures a position of a mark on the stage, comprising an imaging device including a plurality of pixels arranged at a pitch and imaging the mark, a driving device changing a relative position between the stage and the imaging device, a measurement device measuring the relative position, and a processor obtaining the position of the mark based on a plurality of images respectively obtained by the imaging device at a plurality of relative positions between the stage and the imaging device that are different from each other and associated with the pitch, wherein the processor is configured to obtain, based on a deviation with respect to one of the plurality of relative positions, a target relative position with respect to another of the plurality of relative positions. 1. A measurement apparatus that includes a movable stage and measures a position of a mark on the stage , the apparatus comprising:an imaging device including a plurality of pixels arranged at a pitch and configured to image the mark via the plurality of pixels;a driving device configured to change a relative position between the stage and the imaging device;a measurement device configured to measure the relative position; anda processor configured to obtain the position of the mark based on a plurality of images respectively obtained by the imaging device at a plurality of relative positions between the stage and the imaging device that are different from each other and associated with the pitch,wherein the processor is configured to obtain, based on a deviation with respect to one of the plurality of relative positions, a target relative position with respect to another of the plurality of relative positions.2. The apparatus according to claim 1 , whereinnumber of the plurality of relative positions is n, andthe processor is configured to obtain the target relative position so as to make each adjacent ones of the ...

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27-12-2018 дата публикации

PROJECTION OBJECTIVE FOR A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS

Номер: US20180373155A1
Автор: Eder Robert, Wabra Norbert
Принадлежит:

A projection objective of a microlithographic projection exposure apparatus contains a plurality of optical elements arranged in N>−2 successive sections Ato Aof the projection objective which are separated from one another by pupil planes or intermediate image planes. According to the invention, in order to correct a wavefront deformation, at least two optical elements each have an optically active surface locally reprocessed aspherically. A first optical element is in this case arranged in one section A, j=1 . . . N and a second optical element is arranged in another section A, k=1 . . . N, the magnitude difference |k−j| being an odd number. 16.-. (canceled)7. A catadioptric projection objective comprising:a plurality of optical elements arranged to, during operation, direct light from a first field plane to a second field plane to form a reduced image of a reticle positioned in the first field plane at the second field plane, there being at least one intermediate image at a corresponding field plane and at least two pupil planes in a path of the light between the first field plane and the second field plane, the plurality of optical elements comprising a first lens and a concave mirror, the first lens having at least one curved surface, a surface of the first lens comprising a first corrective structure; anda pair of fold mirrors in the path of the light, a first of the fold mirrors being positioned in the path to direct the light towards the concave mirror and a second of the fold mirrors being positioned in the path to receive light reflected from the concave mirror,wherein the first lens is positioned in the projection objective in the path between the pair of fold mirrors and the concave mirror, the first corrective structure reducing an imaging error of the projection objective at the second field plane relative to an initial arrangement of the projection objective that does not include the first corrective structure.8. The catadioptric projection objective ...

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27-12-2018 дата публикации

PROJECTION EXPOSURE APPARATUS AND METHOD FOR MEASURING A PROJECTION LENS

Номер: US20180373163A1
Принадлежит:

Microlithographic projection exposure apparatus () has a projection lens () configured to image an object plane () onto an image plane (), wherein an immersion liquid is at least temporarily provided during operation of the projection exposure apparatus between the projection lens and the image plane, wherein a measurement structure () is arranged in the immersion liquid, and wherein the measurement structure is configured to generate a measurement pattern. The projection exposure apparatus also has a measurement device () configured to measure the measurement pattern. The measurement structure has an absorption layer () including silicon oxide and/or silicon oxynitride and/or nitride. 1. Microlithographic projection exposure apparatus , comprising:a projection lens configured to image an object plane onto an image plane,an immersion liquid provided at least temporarily during operation of the projection exposure apparatus between the projection lens and the image plane,a measurement structure arranged in the immersion liquid, wherein the measurement structure is configured to generate a measurement pattern, anda measurement device configured to measure the measurement pattern,wherein the measurement structure comprises an absorption layer comprising at least one of: silicon oxide, silicon oxynitride, and nitride.2. Projection exposure apparatus according to claim 1 , wherein the absorption layer of the measurement structure is made of metal silicon dioxide or is made of metal silicon oxynitride.3. Projection exposure apparatus according to claim 1 , wherein the absorption layer of the measurement structure is made of molybdenum silicon dioxide.4. Projection exposure apparatus according to claim 1 , wherein the absorption layer of the measurement structure is made of molybdenum silicon oxynitride.5. Projection exposure apparatus according to claim 1 , wherein the absorption layer of the measurement structure comprises at least one of chromium nitride claim 1 , ...

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03-12-2020 дата публикации

APPARATUS AND METHOD FOR MONITORING REFLECTIVITY OF THE COLLECTOR FOR EXTREME ULTRAVIOLET RADIATION SOURCE

Номер: US20200379357A1
Принадлежит:

A method of controlling a feedback system with a data matching module of an extreme ultraviolet (EUV) radiation source is disclosed. The method includes obtaining a slit integrated energy (SLIE) sensor data and diffractive optical elements (DOE) data. The method performs a data match, by the data matching module, of a time difference of the SLIE sensor data and the DOE data to identify a mismatched set of the SLIE sensor data and the DOE data. The method also determines whether the time difference of the SLIE sensor data and the DOE data of the mismatched set is within an acceptable range. Based on the determination, the method automatically validates a configurable data of the mismatched set such that the SLIE sensor data of the mismatched set is valid for a reflectivity calculation. 1. A method of calculating reflectivity of a collector for an extreme ultraviolet (EUV) radiation source , the method comprisingobtaining data of a first sensor and a second sensor to compare time stamps of the first sensor and the second sensor;determining whether a time difference between the time stamps of the first sensor and the second sensor is within an acceptable range;in response to a determination that the time difference is within the acceptable range, automatically adjusting a configurable data such that first sensor data is valid for calculating the reflectivity; andcalculating the reflectivity of the collector using the configurable data.2. The method of claim 1 , wherein obtaining time series data includes obtaining data from a slit integrated energy (SLIE) sensor.3. The method of claim 2 , wherein obtaining time series data includes obtaining data from diffractive optical elements (DOE) data along with a source-mask optimization serial number.4. The method of claim 2 , further comprising eliminating data points in the time series data for the SLIE sensor for which an energy data is less than a threshold value and data points in the time series data for the SLIE sensor ...

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19-12-2019 дата публикации

METHOD OF DETERMINING PELLICLE DEGRADATION COMPENSATION CORRECTIONS, AND ASSOCIATED LITHOGRAPHIC APPARATUS AND COMPUTER PROGRAM

Номер: US20190384164A1
Принадлежит: ASML Netherlands B.V.

A method for mitigating an effect of non-uniform pellicle degradation on control of a substrate patterning process and an associated lithographic apparatus. The method includes quantifying an effect of the non-uniform pellicle degradation on one or more properties of patterned features, such as one or more metrology targets, formed on the substrate by the substrate patterning process. A process control correction is then determined based on the quantification of the effect of the non-uniform pellicle degradation. 115.-. (canceled)16. A method for mitigating an effect of non-uniform pellicle degradation on control of a substrate patterning process , the method comprising:quantifying an effect of the non-uniform pellicle degradation on one or more properties of patterned features formed on a substrate by the substrate patterning process; anddetermining, by a hardware computer system and based on the quantification of the effect of the non-uniform pellicle degradation, a correction for control of the substrate patterning process.17. The method according to claim 16 , wherein the one or more properties of patterned features formed on the substrate comprises a shift in imaged position of the patterned features relative to a nominal position.18. The method according to claim 17 , wherein the correction comprises a correction of a subsequent overlay measurement based on one or more of the patterned features.19. The method according to claim 18 , further comprising determining a relative shift representative of an overlay error between a first layer and a second layer resultant from the non-uniform pellicle degradation claim 18 , the relative shift being between:a first shift in imaged position of a first patterned feature in a first layer of the substrate patterning process, anda second shift in imaged position of a second patterned feature in a second layer of the substrate patterning process,wherein the correction comprises a correction of a subsequent overlay ...

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26-12-2019 дата публикации

Photoresist Spectral Sensitivity Matching Radiometer For Trace/Space Width Variation Improvement

Номер: US20190391007A1
Принадлежит:

A radiometer probe for matching a spectral sensitivity of a dry-film resist is provided. The radiometer probe includes a light probe and a filter-diffuser assembly connected to the light probe. The filter-diffuser assembly includes a filter housing configured to receive an optical diffuser positioned on a filter. The optical diffuser and the filter are separated by a spacer. 1. A radiometer probe for matching a spectral sensitivity of a dry-film resist comprising:a light probe; anda filter-diffuser assembly connected to the light probe, the filter-diffuser assembly including a filter housing configured to receive an optical diffuser positioned on a filter, the optical diffuser and the filter are separated by a spacer such that the radiometer probe is configured to expose a pattern on the dry-film resist to form a space between at least one set of adjacent structures of less than 12 microns.2. The radiometer probe of claim 1 , wherein the light probe includes an international light probe.3. The radiometer probe of claim 1 , wherein the optical diffuser includes a quartz cosine diffuser configured to attenuate the intensity of an exposer to be within a targeted liner range.4. The radiometer probe of claim 3 , wherein the optical diffuser includes at least one of opaline glass claim 3 , Polytetrafluoroethylene (PTFE) or Spectralon that couple to fibers and spectrometers to collect signal from 180° field of view.5. The radiometer probe of claim 1 , wherein the optical diffuser includes a top side and an opposing underside claim 1 , wherein the top side of the optical diffuser includes an etched depression.6. The radiometer probe of claim 5 , wherein the optical diffuser is fixed within the filter housing with the etched depression opposing the filter and spacer.7. The radiometer probe of claim 1 , wherein the filter includes a metallic coating on a first side and a dielectric coating on an opposing second side.8. The radiometer probe of claim 1 , wherein the filter is ...

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27-09-2007 дата публикации

Overlay metrology using X-rays

Номер: US20070224518A1
Принадлежит: Individual

A method for inspection includes directing a beam of X-rays to impinge upon an area of a sample containing first and second features formed respectively in first and second thin film layers, which are overlaid on a surface of the sample. A pattern of the X-rays diffracted from the first and second features is detected and analyzed in order to assess an alignment of the first and second features.

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22-12-2022 дата публикации

RADIATION SOURCE TESTING

Номер: US20220404717A1
Принадлежит:

A method of generating a test for a radiation source for a lithographic apparatus comprises a step of receiving data corresponding to a plurality of firing patterns of the radiation source. The method further comprises the step of analyzing the data to determine parameters for configuring one or more further firing patterns for testing the radiation source. The parameters are determined such that a stability of the radiation source when executing the one or more further firing patterns configured using the parameters is substantially the same as, or within predefined bounds relative to, a stability of the radiation source when executing the plurality of firing patterns. Furthermore, parameters are determined such that a total duration of the one or more further firing patterns when executed by the radiation source will be less than a duration of the plurality of firing patterns when executed by the radiation source. 1. A method of generating a test for a radiation source for a lithographic apparatus , the method comprising the steps of:receiving data corresponding to a plurality of firing patterns of the radiation source; andanalyzing the data to determine parameters for configuring one or more further firing patterns for testing the radiation source;wherein the parameters are determined such that a stability of the radiation source when executing the one or more further firing patterns configured using the parameters is substantially the same as, or within predefined bounds relative to, a stability of the radiation source when executing the plurality of firing patterns,and a total duration of the one or more further firing patterns when executed by the radiation source will be less than a duration of the plurality of firing patterns when executed by the radiation source.2. The method of claim 1 , wherein the stability of the radiation source is an intrinsic stability.3. The method of claim 1 , wherein the stability of the radiation source is an actively controlled ...

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17-07-2020 дата публикации

用于检查及量测的方法和设备

Номер: CN107567584B
Принадлежит: ASML Netherlands BV

本发明公开了一种方法,所述方法涉及:通过光学部件将第一偏振状态的入射辐射提供至物体与外部环境界面中,其中一个表面被设置成邻近于所述界面且与所述界面分离开一段间隙;由从所述界面和从所述表面反射的入射辐射来检测由所述界面处的所述第一偏振状态的入射辐射的所述反射引起的、与经反射的辐射中的所述第一偏振状态的所述辐射不同的具有不同的第二偏转状态的辐射;和产生表示所述光学部件的焦点与所述物体之间的相对位置的位置信号。

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21-11-2007 дата публикации

模板、投影曝光设备、器件制造方法及测量方法

Номер: CN100350326C
Автор: 盐出吉宏
Принадлежит: Canon Inc

本发明涉及模板、投影曝光设备、器件制造方法及测量方法。该模板(16)具有测试图案(TP),用于测量投影光学系统(17)的光学特征,具有能减少或者抑制在所述投影光学系统光瞳平面(18)处的光谱的高频分量的图案。沿着一个方向或者多个方向将照射光投射在模板(16)的测试图案上,检测由沿着多个方向投射形成的测试图案(TP)影像的位置,并且据此,测量投影光学系统(17)的光学特征。

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26-07-1995 дата публикации

Automatic focusing device for optical inspection system

Номер: JPH0769162B2
Принадлежит: Dainippon Screen Manufacturing Co Ltd

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12-08-2021 дата публикации

Device for determining the exposure energy during the exposure of an element in an optical system, in particular for microlithography

Номер: KR102288614B1
Автор: 토마스 프랑크
Принадлежит: 칼 짜이스 에스엠티 게엠베하

본 발명은, 광학 시스템에서 요소의 노광 동안 노광 에너지를 결정하기 위한 디바이스로서, 광학 요소(110, 510, 610), 국부적으로 변화하는 격자 주기를 갖는 회절 구조(120, 420, 450, 460, 520, 620), 및 세기 센서 배치를 포함하며, 상기 광학 시스템의 동작 동안 상기 회절 구조(120, 420, 450, 460, 520, 620)에서 회절되는 전자기 방사선이, 적어도 1차의 회절로, 상기 광학 요소(110, 510, 610)에서 실행된 전반사에 의해 상기 세기 센서 배치로 보내지는, 노광 에너지 결정 디바이스에 관한 것이다. The present invention provides a device for determining exposure energy during exposure of an element in an optical system, comprising an optical element (110, 510, 610), a diffractive structure (120, 420, 450, 460, 520) having a locally varying grating period. , 620), and an intensity sensor arrangement, wherein, during operation of the optical system, electromagnetic radiation diffracted in the diffractive structure (120, 420, 450, 460, 520, 620) is, in at least first order diffraction, the optical an exposure energy determination device, which is sent to the intensity sensor arrangement by total reflection carried out in elements (110, 510, 610).

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31-05-2021 дата публикации

Diffractive optical system alignment method and diffractive optical element

Номер: KR102257889B1

본 발명에 따른, 작동 빔으로 작동될 회절 광학 시스템을 정렬시키는 방법은 작동 빔과 상이한 파장 범위를 갖는 정렬 빔을 이용하여 그리고 정렬 빔과 작동 빔을 동일 (또는 설정) 방향으로 회절시키기에 최적화된(552) 회절 광학 요소를 이용하여 회절 광학 시스템을 정렬하(558)는 것을 포함한다. 예에서, 정렬 빔은 적외선(IR) 방사선을 포함하며, 작동 빔은 연질 X-선(SXR) 방사선을 포함한다. 회절 광학 요소에 제1 피치(p IR )를 갖는 제1 주기적 구조체 및 제2 피치(p SXR )를 갖는 제2 주기적 구조를 제공함으로써 회절 광학 요소는 최적화된다. 정렬 후, 진공 시스템은 펌핑 다운되며(562), 작동 중에 SXR 작동 빔은 IR 정렬 빔의 광학 소스에 의해 펌핑된 고 고조파 생성(HHG) 광학 소스에 의해 생성(564)된다. According to the present invention, a method of aligning a diffractive optical system to be operated with a working beam is optimized for diffracting the alignment beam and the working beam in the same (or set) direction using an alignment beam having a different wavelength range than the working beam. (552) aligning 558 the diffractive optical system using the diffractive optical element. In an example, the alignment beam comprises infrared (IR) radiation and the working beam comprises soft X-ray (SXR) radiation. The diffractive optical element is optimized by providing the diffractive optical element with a first periodic structure having a first pitch p IR and a second periodic structure having a second pitch p SXR. After alignment, the vacuum system is pumped down 562, and during operation the SXR working beam is generated 564 by a high harmonic generation (HHG) optical source pumped by the optical source of the IR alignment beam.

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01-08-2019 дата публикации

Method of determining edge placement error, inspection apparatus, patterning device, substrate and device manufacturing method

Номер: KR102006316B1

리소그래피 공정을 이용하여 생성된 구조체 내에서 에지 배치 오차를 결정하는 방법이 개시되고, 상기 방법은: (a) 리소그래피 공정을 이용하여 생성된 제 1 구조체를 포함한 기판을 수용하는 단계 -상기 제 1 구조체는 제 1 및 제 2 층들을 포함하고, 상기 층들 각각은 전기 전도성 재료의 제 1 영역들 및 비-전기 전도성 재료의 제 2 영역들을 가짐- ; (b) 상기 리소그래피 공정 동안 제 1 구조체 내의 제 2 층의 제 1 영역들과 제 2 영역들 사이의 에지들에 대한 제 1 층의 제 1 영역들과 제 2 영역들 사이의 에지들의 타겟 위치를 나타내는 제 1 타겟 상대 위치를 나타내는 타겟 신호를 수용하는 단계; (c) 광학 방사선으로 제 1 구조체를 조명하는 동안에 산란된 방사선을 검출하여, 제 1 신호를 얻는 단계; 및 (d) 제 1 신호 및 제 1 타겟 상대 위치에 기초하여 에지 배치 오차 파라미터를 알아내는 단계를 포함한다. A method of determining an edge placement error in a structure created using a lithographic process is disclosed, the method comprising: (a) receiving a substrate comprising a first structure created using a lithographic process, Wherein each of the layers has first regions of electrically conductive material and second regions of non-electrically conductive material; (b) a target location of the edges between the first and second areas of the first layer for edges between the first and second areas of the second layer in the first structure during the lithographic process Receiving a target signal indicative of a first target relative position indicative of a first target relative position; (c) detecting scattered radiation while illuminating the first structure with optical radiation to obtain a first signal; And (d) determining an edge placement error parameter based on the first signal and the first target relative position.

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21-04-2004 дата публикации

曝光装置、曝光法和器件制造法

Номер: CN1491427A
Автор: Ѯ, 石川旬
Принадлежит: Nikon Corp

在掩模台(RST)上固定一个其上形成有至少一个针孔状图案的基准板(RFM),掩模台(RST)上固持地移动掩模(R)。因此,例如可以不用任何特殊类型的测量用掩模,通过把连结型波前测量仪(80)设置到衬底台(WST)上、利用照明系统(IOP)照射基准板并利用波前测量仪接收通过投影光学系统在针孔状图案处产生的球面波,来测量投影光学系统(PL)的波前象差。因此,可以以理想的计时很容易地测量投影光学系统的波前象差,这使得能够对投影光学系统进行充分地质量控制。因此,可以利用进行了充分地质量控制的投影光学系统把掩模图案精确地转印到衬底上。

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09-12-2020 дата публикации

Method for measuring structure, inspection apparatus, lithographic system and device manufacturing method

Номер: KR102188711B1

검사 장치(140)는 리소그래피 프로세스에 의해 기판 상에 형성된 타겟 구조체(T)의 비대칭 또는 다른 특성을 측정한다. 조명 조건의 주어진 세트에 대하여, 상기 측정치의 정확도는 상기 기판에 걸친 프로세스 변동 및/또는 기판들 사이의 프로세스 변동에 의해 크게 영향받는다. 이러한 장치는 상기 조명 조건의 두 개 이상의 변형물(p1-, p1, p1+; λ1-, λ1, λ1+) 하에서 복수 개의 구조체에 의해 산란된 방사선을 집광하도록 구성된다. 처리 시스템(PU)은 상기 구조체 중 상이한 구조체들에 대한 상기 변형물의 상이한 선택 또는 조합 하에서 집광된 방사선을 사용하여 상기 특성의 측정치를 유도하도록 구현된다. 변형물은 예를 들어, 파장, 또는 각도 분포, 또는 조명 조건의 임의의 특성에 대한 것일 수 있다. 변형물의 선택 및/또는 조합은 상이한 변형물에서 관찰되는 신호 품질(302, Q, A)에 대해서 이루어진다. The inspection apparatus 140 measures an asymmetry or other property of the target structure T formed on the substrate by a lithographic process. For a given set of lighting conditions, the accuracy of the measurements is greatly affected by process variations across the substrates and/or process variations between substrates. Such an apparatus is configured to condense the radiation scattered by the plurality of structures under two or more variations of the above lighting conditions (p1-, p1, p1+; λ1-, λ1, λ1+). The processing system PU is implemented to derive a measure of the property using the focused radiation under different selections or combinations of the modifications for different of the structures. Variations can be, for example, for wavelength, or angular distribution, or for any nature of lighting conditions. Selection and/or combination of variants is made for the signal quality 302, Q, A observed in the different variants.

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08-10-2021 дата публикации

叠加及边缘放置错误的计量及控制

Номер: CN111801625B
Принадлежит: KLA Tencor Corp

本发明揭示一种叠加计量系统,其可包含:控制器,其通过测量基于光学可分辨特征的光学叠加测量与基于装置级特征的装置级叠加测量之间的差来产生对包含所述光学可分辨特征及所述装置级特征的混合叠加目标的光学工具错误调整;基于特征在装置区域内的位置来产生对所述混合叠加目标的目标到装置调整;基于所述光学叠加测量、所述光学工具错误调整或所述目标到装置调整中的至少一者来确定所述装置区域中的一或多个位置的装置相关叠加测量;及将所述装置区域的叠加可校正值提供到光刻工具,以基于所述装置相关叠加测量来修改至少一个后续曝光的曝光条件。

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