Lithography optics adjustment and monitoring

Methods and apparatus for processing an image of a beam generated by an optical system to extract information indicative of an extent of damage to optical elements in the optical system. Also disclosed is a beam image and analysis tool capable of acquiring an image of a beam at any one of a number of locations.

LITHOGRAPHY OPTICS ADJUSTMENT AND MONITORING

Methods and apparatus for processing an image of a beam generated by an optical system to extract information indicative of an extent of damage to optical elements in the optical system. Also disclosed is a beam image and analysis tool capable of acquiring an image of a beam at any one of a number of locations. 1. A method for automatically detecting a state of a light source for semiconductor photolithography , the method comprising the steps of:(a) obtaining at least a portion of an image of a light beam produced by the light source;(b) obtaining image data from the portion;(c) filtering the image data using template matching to detect a state of the light source;(d) storing the results of the filtering operation in a database, wherein steps (a) through (c) are performed repeatedly over a period of time to detect the state repeatedly;(e) determining an evolution of the state over time from the plurality of stored results of the filtering step; and(f) adjusting the light source after a period of time having a duration based at least in part on the evolution of the state over time.2. A method as claimed in wherein the state is an extent of existence of one or more features in the image.3. A method as claimed in wherein one of the one or more features in the image is a worm-like feature.4. A method as claimed in wherein the state is an extent of existence of one or more defects in at least one optical element in the light source.5. A method as claimed in wherein one of the one or more defects in the image is a slip plane defect.6. A method as claimed in wherein the step (d) of storing the results of the filtering operation in a database includes appending the results of the filtering operation to a database containing a plurality of previous results of performing steps (a) through (c).7. A method as claimed in wherein the results are appended using wrap-around indexing.8. A method as claimed in wherein the results are appended using bit shifting.9. A method as ...

Method of Identification of Combinatorial Enzymatic Reaction Targets in Glioblastoma Specific Metabolic Network

The present invention relates to an in-silico method for identification of enzymatic reaction targets and combinations thereof useful in cancer therapy. Further, the present invention relates to combinatorial targeting of essential metabolites and reactions associated with glioblastoma survival. The present invention provides a way to prevent or treat glioblastoma by regulating/inhibiting a combination of glycine transporter along with one or more enzymes catalyzing the internal glycine serine metabolism. 1. An in-silico method for identifying essential metabolite and combinatorial target reaction associated with inhibition or suppression of glioblastoma cell growth , comprising:(a) providing data retrieved from biological database and literature relating to reactions in metabolic pathways associated with glioblastoma metabolism to construct an astrocyte/glioblastoma metabolism model in a computer readable storage medium;{'sub': lb', 'ub, '(b) simulating the model obtained in step (a) by constraining fluxes through said reactions in metabolic pathways as per reversibility and irreversibility of reactions, wherein reversible reactions were bound in range of v=−1000 and v=1000 and for irreversible reactions the model is bound either from 0 to 1000 or 1000 to 0;'} [ {'br': None, 'i': adp[m]+pi[m]+', 'h+[i]', 'h', 'o[m]+atp[m]+', 'h+[m], 'ATPSyn=4 ->23 \u2003\u2003 [Eq. (i)]'}, '(i) ATP synthesis through oxidative phosphorylation (ATPSyn)'}, {'br': None, 'i': oaa[m]+glt[c]+r', 'p[c]+succ[m], 'GBM_BM=5\u2003\u2003 [Eq. (ii)];'}, '(ii) a metabolic demand reaction], '(c) defining at least one flux distribution that increases or decreases the objective functions defined for the network, one of which accounts for the ATP requirement of the network and the other comprising ribose-5-phosphate (r5p), oxaloacetate (oaa), succinate (succ) and glutathione (glt), when a constraint is applied to the astrocyte/glioblastoma metabolism model, wherein said objective functions comprises ...

Method of identification of combinatorial enzymatic reaction targets in glioblastoma specific metabolic network

The present invention relates to an in-silico method for identification of enzymatic reaction targets and combinations thereof useful in cancer therapy. Further, the present invention relates to combinatorial targeting of essential metabolites and reactions associated with glioblastoma survival. The present invention provides a way to prevent or treat glioblastoma by regulating/inhibiting a combination of glycine transporter along with one or more enzymes catalyzing the internal glycine serine metabolism.

リソグラフィ光学部品の調節及びモニタリング

【課題】現在の動作不能時間が長すぎるという問題に対して、動作不能時間を短縮する方法を提供する。【解決手段】光学系によって生成されたビーム画像を処理して、光学系内の光学素子への損傷の範囲を示す情報を抽出するための方法及び装置を提供する。また、幾つかの位置のうちのいずれか１つでビーム画像を取得することができるビーム画像及び分析ツールも開示する。【選択図】図２

リソグラフィ光学部品の調節及びモニタリング

【課題】現在の動作不能時間が長すぎるという問題に対して、動作不能時間を短縮する方法を提供する。【解決手段】光学系によって生成されたビーム画像を処理して、光学系内の光学素子への損傷の範囲を示す情報を抽出するための方法及び装置を提供する。また、幾つかの位置のうちのいずれか１つでビーム画像を取得することができるビーム画像及び分析ツールも開示する。【選択図】図２

Lithography optics adjustment and monitoring

Methods and apparatus for processing an image of a beam generated by an optical system to extract information indicative of an extent of damage to optical elements in the optical system. Also disclosed is a beam image and analysis tool capable of acquiring an image of a beam at any one of a number of locations.

Lithography optics adjustment and monitoring

Methods and apparatus for processing an image of a beam generated by an optical system to extract information indicative of an extent of damage to optical elements in the optical system. Also disclosed is a beam image and analysis tool capable of acquiring an image of a beam at any one of a number of locations.

Lithography optics adjustment and monitoring

Lithography optics adjustment and monitoring