Tablet for ion plating, production method therefor and transparent conductive film

A tablet for ion plating which enables to attain high rate film-formation of a transparent conductive film suitable for a blue LED or a solar cell, and a noduleless film-formation not generating splash, an oxide sintered body most suitable for obtaining the same, and a production method thereof. A tablet for ion plating obtained by processing an oxide sintered body comprising indium and cerium as oxides, and having a cerium content of 0.3 to 9% by atom, as an atomicity ratio of Ce/(In+Ce), characterized in that said oxide sintered body has an In 2 O 3 phase of a bixbyite structure as a main crystal phase, has a CeO 2 phase of a fluorite-type structure finely dispersed as crystal grains having an average particle diameter of equal to or smaller than 3 μm, as a second phase; and the oxide sintered body is produced by mixing raw material powder consisting of indium oxide powder with an average particle diameter of equal to or smaller than 1.5 μm, then molding the mixed powder, and sintering the molding by a normal pressure sintering method, or molding and sintering the mixed powder by a hot press method.

Discharge electrode array for thin-film solar cell deposition

A discharge electrode array for a silicon-based thin film solar cell deposition chamber is provided, relating to solar cell technologies. The discharge electrode array includes a signal feed component having a rectangular-shaped end, a flat waist corresponding to a feed-in port located in a hallowed rectangular area on a center region of a cathode plate having a shielding cover, connecting a feed-in power supply signal by surface contact. The electrode array includes at least a set of cathode plates and an anode plate, with two cathode plates sharing or surrounding one anode plate. Uniform large area and stable discharge driven by the RF/VHF power supply signal can be achieved, and the standing wave and the skin effect can be effectively removed. The production efficiency can be improved and the cost can be reduced.

ELECTRODE FOR PRODUCING A PLASMA, PLASMA CHAMBER HAVING SAID ELECTRODE, AND METHOD FOR ANALYZING OR PROCESSING A LAYER OR THE PLASMA IN SITU

A RF electrode for generating, plasma in a plasma chamber comprising an optical feedthrough. A plasma chamber comprising an RF electrode and a counter-electrode with a substrate support for holding a substrate, wherein a high-frequency alternating field for generating the plasma can be formed between the RF electrode and the counter-electrode. The chamber comprising an RF electrode with an optical feedthrough. A method, for in situ analysis or in situ processing of a layer or plasma in a plasma chamber, wherein the layer is disposed on counter-electrode and an RF electrode is: disposed on the side lacing the layer. Selection of an RF electrode having an optical feedthrough, and at least one step in which electromagnetic radiation is supplied through the optical feedthrough for purposes of analysis or processing of the layer or the plasma, and by at least one other step in which the scattered or emitted or reflected radiation is supplied to an analysis unit. 1. An RF electrode for generating plasma in a plasma chamber , comprising at least one optical feedthrough wherein the RF electrode is a showerhead , and wherein a conical funnel lines the optical feedthrough of the showerhead in a gas-tight manner.2. The electrode according to claim 1 , wherein the optical feedthrough is large enough to allow in situ Raman spectroscopy or optical emission spectroscopy to be carried out through the RF electrode.3. An electrode according to claim 1 , wherein the optical feedthrough has a conical section.4. The electrode according to claim 3 , wherein the smaller of the two openings of the feedthrough has an area of 0.03 cmto 5 cm.5. An electrode according to claim 3 , wherein the larger of the two openings of the feedthrough has an area of 0.031 to 100 cm.6. An electrode according to claim 1 , wherein an opening of the optical feedthrough comprises a shielding.7. The electrode according to claim 6 , comprising a metallic mesh as a shielding tor the optical feedthrough claim 6 , ...

NEAR-FIELD LIGHT MICROCHANNEL STRUCTURE AND NEAR-FIELD LIGHT MICROREACTOR

The object can be attained by the near-field light microchannel structure that comprises a structure provided with a microchannel and a near-field light two-dimensional array arranged inside the microchannel and enabling in-plane near-field light generating, in which the near-field light two-dimensional array comprises an electroconductive layer formed on the inner wall surface of the microchannel , a immobilizing layer immobilized on one surface of the electroconductive layer via chemical bonding, and metal nanoparticle arrays immobilized on one surface of the immobilizing layer via chemical bonding, and in which the metal nanoparticle arrays each comprise multiple metal nanoparticles arrayed at regular intervals and bonded to each other via the modifying part arranged on the surface thereof. 1. A near-field light microchannel structure that comprises a structure provided with a microchannel and a near-field light two-dimensional array arranged inside the microchannel and enabling in-plane near-field light generating;wherein the near-field light two-dimensional array comprises an electroconductive layer formed on the inner wall surface of the microchannel, a immobilizing layer immobilized on one surface of the electroconductive layer via chemical bonding, and metal nanoparticle arrays immobilized on one surface of the immobilizing layer via chemical bonding, andwherein the metal nanoparticle arrays each comprise multiple metal nanoparticles arrayed at regular intervals and bonded to each other via the modifying part arranged on the surface thereof.2. The near-field light microchannel structure as claimed in claim 1 , wherein the structure has a first member and a second member laminated on one side of the first member claim 1 , and the microchannel is arranged between the first member and the second member.3. The near-field light microchannel structure as claimed in claim 1 , wherein the distance between the metal nanoparticles is from 1 to 10 nm.4. The near-field ...

Particle sources and methods for manufacturing the same

The present disclosure provides a method for manufacturing a particle source, comprising: placing a metal wire in vacuum, introducing active gas and catalyst gas, adjusting a temperature of the metal wire, and applying a positive high voltage V to the metal wire to dissociate the active gas at the surface of the metal wire, in order to generate at a peripheral surface of the head of the metal wire an etching zone in which field induced chemical etching (FICE) is performed; increasing by the FICE a surface electric field at the top of the metal wire head to be greater than the to evaporation field of the material for the metal wire, so that metal atoms at the wire apex are evaporated off; after the field evaporation is activated by the FICE, causing mutual adjustment between the FICE and the field evaporation, until the head of the metal wire has a shape of combination of a base and a tip on the base; and stopping the FICE and the field evaporation when the head of the metal wire takes a predetermine shape.

RADIO FREQUENCY (RF) POWER COUPLING SYSTEM UTILIZING MULTIPLE RF POWER COUPLING ELEMENTS FOR CONTROL OF PLASMA PROPERTIES

A radio frequency (RF) power coupling system is provided. The system has an RF electrode configured to couple RF power to plasma in a plasma processing system, multiple power coupling elements configured to electrically couple RF power at multiple power coupling locations on the RF electrode, and an RF power system coupled to the multiple power coupling elements, and configured to couple an RF power signal to each of the multiple power coupling elements. The multiple power coupling elements include a center element located at the center of the RF electrode and peripheral elements located off-center from the center of the RF electrode. A first peripheral RF power signal differs from a second peripheral RF power signal in phase. 1. A radio frequency (RF) power coupling system , comprising:an RF electrode configured to couple RF power to plasma in a plasma processing system;multiple power coupling elements configured to electrically couple RF power at multiple power coupling locations on said RF electrode; andan RF power system coupled to said multiple power coupling elements, and configured to couple an RF power signal to each of said multiple power coupling elements,wherein said multiple power coupling elements comprise a center element located at the center of said RF electrode and m peripheral elements located off-center from the center of said RF electrode, m being an integer greater than one,wherein a center RF power signal is coupled to said center element, said center RF power signal containing a center frequency,wherein a first peripheral RF power signal is coupled to a first peripheral element of said m peripheral elements, said first peripheral RF power signal containing a first peripheral frequency different than said center frequency,wherein a second peripheral RF power signal is coupled to a second peripheral element of said m peripheral elements, said second peripheral RF power signal containing a second peripheral frequency substantially equivalent to ...

ARC DEVICES AND MOVING ARC COUPLES

An apparatus for a first electrode and a second electrode. The first and second electrode support an arc that conducts electric current between the first and second electrode. A shape of at least one of the first and second electrode, after an arc is established between the first and second electrode, expand at least one of an arc footprint of the arc on at least one of the first and second electrode and an arc column of the arc between the first and second electrode as the electric current between the first and second electrode increases. 1. An apparatus comprising:a first electrode and a second electrode, wherein the first and second electrode are configured to support an arc that conducts electric current between the first and second electrode; anda shape of at least one of the first and second electrode, wherein the shape at least one of the first and second electrode is configured to, after an arc is established between the first and second electrode, expand at least one of an arc footprint of the arc on at least one of the first and second electrode and an arc column of the arc between the first and second electrode as the electric current between the first and second electrode increases.2. The apparatus of wherein the arc includes at least one of a non-thermionic cathode arc claim 1 , a cold-cathode arc claim 1 , a metal vapor arc claim 1 , a cathodic arc claim 1 , and an arc including at least 10% of atoms and ions originating from at least one of the first and second electrode.3. The apparatus of further comprising an arc gap between the first and second electrode claim 1 , wherein the arc gap includes a location at which a length of the arc gap is shortest.4. The apparatus of wherein the shape of at least one of the first and second electrode is further configured to decrease a self-current magnetic constriction of the arc column.5. The apparatus of wherein the shape of at least one of the first and second electrode is further configured to change shape in ...

INSULATING-LAYER-CONTAINING CERAMIC MEMBER, METAL-MEMBER-CONTAINING CERAMIC MEMBER, CHARGED PARTICLE BEAM EMITTER, AND METHOD FOR PRODUCING INSULATING-LAYER-CONTAINING CERAMIC MEMBER

A ceramic member containing an insulating member is disclosed. The ceramic member comprises a ceramic body and an insulating layer on the ceramic body. The ceramic body contains aluminum oxide crystals and aluminum titanate crystals. The insulating layer contains silicon oxide as a main component. The ceramic body includes a first region that includes a first surface portion covered by the insulating layer, and a second region outside the first region, and having a surface resistivity of 1×10to 1×10Ω/□. A surface resistivity of the first region is higher than the surface resistivity of the second region. 1. An insulating-member-containing ceramic member comprising:a ceramic body that contains an aluminum oxide crystal phase and an aluminum titanate crystal phase; andan insulating layer on a surface of the ceramic body, and containing silicon oxide as a main component, a first region that includes a first surface portion covered by the insulating layer; and', {'sup': 6', '9, 'a second region outside the first region, and having a surface resistivity of 1×10to 1×10Ω/□, and'}], 'wherein the ceramic body compriseswherein a surface resistivity of the first region is higher than the surface resistivity of the second region.2. The insulating-member-containing ceramic member according to claim 1 , wherein the ceramic body has a cylindrical shape comprising a first end surface claim 1 , a second end surface opposing to the first end surface claim 1 , and a penetrating hole penetrating between the first end surface and the second end surface;the first region lies in a central region of an outer peripheral surface of the ceramic body and between the first end surface and the second end surface; andthe second region is continuous through an inner peripheral surface of the penetrating hole between the first end surface and the second end surface of the ceramic body.3. The insulating-member-containing ceramic member according to claim 1 , wherein the ceramic body contains an ...

ELECTRODE ASSEMBLIES, PLASMA GENERATING APPARATUSES, AND METHODS FOR GENERATING PLASMA

Electrode assemblies for plasma reactors include a structure or device for constraining an arc endpoint to a selected area or region on an electrode. In some embodiments, the structure or device may comprise one or more insulating members covering a portion of an electrode. In additional embodiments, the structure or device may provide a magnetic field configured to control a location of an arc endpoint on the electrode. Plasma generating modules, apparatus, and systems include such electrode assemblies. Methods for generating a plasma include covering at least a portion of a surface of an electrode with an electrically insulating member to constrain a location of an arc endpoint on the electrode. Additional methods for generating a plasma include generating a magnetic field to constrain a location of an arc endpoint on an electrode. 1. An electrode assembly for a plasma generating apparatus comprising: a tubular wall having an inner surface and an outer surface; and', 'an interior protrusion protruding from the tubular wall in a direction toward a longitudinal axis of the tubular wall, the interior protrusion including an edge extending along an intersection between at least two surfaces of the protrusion; and, 'an electrically conductive electrode body configured to provide an endpoint for an electrical arc, the electrically conductive electrode body comprisingat least one electrically insulating member disposed at least partially within the tubular wall of the electrode body, the at least one electrically insulating member covering at least a portion of the inner surface of the tubular wall and leaving exposed at least the edge of the interior protrusion.2. The electrode assembly of claim 1 , wherein the electrode body comprises:a first member comprising the tubular wall; anda separately formed second member comprising the interior protrusion, the second member positioned within and electrically coupled to the first member.3. The electrode assembly of claim 1 , ...

ELECTRODE OF ELECTROSTATIC LENS AND METHOD OF MANUFACTURING THE SAME

An electrode to be used for an electrostatic lens, wherein the electrode at least includes: a first substrate having a first through-hole and a second substrate having a second through-hole; the first substrate having a thickness smaller than the second substrate; the first through-hole having a diameter smaller than the second through-hole; the second substrate having a specific resistance smaller than the first substrate, wherein the first substrate and the second substrate are superimposed so that the first through-hole and the second through-hole are aligned relative to each other. Notching taking place near any of the through-holes in a dry etching process can be reduced, and thus, the through-holes can be formed accurately. 1. An electrode to be used for an electrostatic lens , the electrode at least comprising:a first substrate having a first through-hole and a second substrate having a second through-hole;the first substrate having a thickness smaller than the second substrate;the first through-hole having a diameter smaller than the second through-hole;the second substrate having a specific resistance smaller than the first substrate,wherein the first substrate and the second substrate are superimposed so that the first through-hole and the second through-hole are aligned relative to each other.2. The electrode according to claim 1 , whereinthe second through-hole is formed by way of:a step of forming a hole in an original substrate to be processed into the second substrate from the side of the first surface of the original substrate, the hole being not a through-hole getting to the second surface opposite to the first surface;a step of filling the hole with an infill by means of electroplating;a step of thinning the original substrate filled with the infill from the side of the second surface thereof; anda step of removing the infill from the thinned original substrate.3. The electrode according to claim 2 , wherein the first substrate is laid on the side ...

MESH ELECTRODE ADHESION STRUCTURE, ELECTRON EMISSION DEVICE AND ELECTRONIC APPARATUS INCLUDING THE ELECTRON EMISSION DEVICE

A mesh electrode adhesion structure includes: a substrate, and an opening defined in the substrate; a mesh electrode on the substrate, and a first combination groove defined in the mesh electrode; and an adhesion layer between the substrate and the mesh electrode. The mesh electrode includes: a mesh region corresponding to the opening defined in the substrate, and an adhesion region in which the first combination groove exposes the adhesion layer. 1. A mesh electrode adhesion structure comprising:a substrate, and an opening defined in the substrate;a mesh electrode on the substrate, and a first combination groove defined in the mesh electrode; andan adhesion layer between the substrate and the mesh electrode; a mesh region corresponding to the opening defined in the substrate, and', 'an adhesion region in which the first combination groove exposes the adhesion layer., 'wherein the mesh electrode comprises2. The mesh electrode adhesion structure of claim 1 , wherein an upper width and a lower width of the first combination groove are different from each other.3. The mesh electrode adhesion structure of claim 2 , wherein the upper width of the first combination groove is larger than the lower width thereof.4. The mesh electrode adhesion structure of claim 1 , wherein an angle between an inner wall of the mesh electrode at the first combination groove and the adhesion layer is in a range from about 90 degrees to about 130 degrees.5. The mesh electrode adhesion structure of claim 1 , wherein the first combination groove is circular-shaped or polygonal-shaped in a plan view.6. The mesh electrode adhesion structure of claim 1 , further comprising a second combination groove defined in the adhesion region of the mesh electrode claim 1 , wherein a width of the first combination groove is different from a width of the second combination groove.7. The mesh electrode adhesion structure of claim 1 , wherein the adhesion layer comprises a protruded portion extending into the ...

Biocompatible electrode component and method for fabrication thereof

The present invention provides methods for fabricating an electrode device component, the method comprising the steps of: (i) providing a biocompatible carrier material, and (ii) performing an ablative method on the biocompatible carrier material to form a recess, the recess capable of receiving a biocompatible electrode material. The components so fabricated are useful as carriers for biological electrodes, such as cochlear electrodes and nerve cuff electrodes.

ELECTRON GUN DEVICE

An electron gun device that emits an electron beam by heating to a high temperature in a vacuum. The surface of a material, which emits an electron beam, is a hydrogenated metal that is melted and in a liquid state during a high-temperature operation. The liquid hydrogenated metal is contained in a hollow cover tube container, which is in a solid state during the high-temperature operation, in the form of a hydrogenated liquid metal or in the form of a liquid metal before hydrogenation, and heated together with the cover tube container to a high temperature. The hydrogenated liquid metal is exposed from the cover tube container and forms a liquid surface where gravity, the electric field and the surface tension of the liquid surface are balanced; and an electron beam is emitted from the exposed surface of the hydrogenated liquid metal. 1. An electron gun device configured to emit an electron beam by being heated to a high temperature in vacuum , whereina surface of a material that emits the electron beam is a liquid hydrogenated metal dissolved during a high-temperature operation,the liquid hydrogenated metal is stored as a hydrogenated liquid metal or a liquid metal before hydrogenation in a hollow cover tube container which is solid during a high-temperature operation, is heated to the high temperature together with the cover tube container, and the hydrogenated liquid metal is exposed from the cover tube container to form a liquid surface on which gravity, an electric field, and a surface tension of the liquid surface are balanced, andthe electron beam is emitted from an exposed surface of the hydrogenated liquid metal.2. The electron gun device according to claim 1 , whereina surface of the hydrogenated liquid metal emits the electron beam in a range of plus and minus 60 degrees when a normal vector of the surface of the hydrogenated liquid metal faces the direction of gravity or emits the electron beam in a direction opposite to a direction of gravity when a ...

PARTIALLY INSULATED CATHODE

A partially-insulated cathode for exciting plasma in a plasma chamber is provided. The partially-insulated cathode includes a conductive structure enclosing a cavity having a cavity surface and an insulating material contiguously covering a portion of the cavity surface from the cavity opening up to an insulation height that is less than a cavity height. Cross-sections of the cavity in X-Y planes have at least one respective cavity-width. A cavity opening has a diameter less than a minimum cavity-width of the at least one cavity-width. 1. A partially-insulated cathode for exciting plasma in a plasma chamber , the partially-insulated cathode comprising:a conductive structure enclosing a cavity having a cavity surface, wherein cross-sections of the cavity in X-Y planes have at least one respective cavity-width, wherein a cavity opening has a diameter less than a minimum cavity-width of the at least one cavity-width; andan insulating material contiguously covering a portion of the cavity surface from the cavity opening up to an insulation height that is less than a cavity height.2. The partially-insulated cathode of claim 1 , wherein the at least one cavity-width includes a maximum cavity-width and the minimum cavity-width claim 1 , and wherein the cavity includes a step from the minimum cavity-width to the maximum cavity-width claim 1 , wherein the insulating material covers the cavity surface having the minimum cavity-width.3. The partially-insulated cathode of claim 2 , wherein the insulating material further covers a surface of the step claim 2 , the insulating material covering the surface of the step being contiguous with the insulating material covering the cavity surface having the minimum cavity-width.4. The partially-insulated cathode of claim 3 , wherein the insulating material further covers a portion of the cavity surface having the maximum cavity-width claim 3 , wherein the insulating material covering the surface of the step is contiguous with the ...

Structure of Emitter Electrode for Enhancing Ion Currents

The present invention discloses a structure of an emitter electrode for enhancing ion currents, including a tip end part and a shank part. The tip end part has a pinpoint, a first diameter, and a radius of curvature. A length of the tip end part with the shank part is from the pinpoint to a first position of the shank part and a distance between the first position and the pinpoint is 300 times the first diameter. The radius of curvature of the tip end part ranges from 50 nanometers to 5 micrometers. The first diameter is 2 times the radius of curvature.

HOLLOW CATHODE, AN APPARATUS INCLUDING A HOLLOW CATHODE FOR MANUFACTURING A SEMICONDUCTOR DEVICE, AND A METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE USING A HOLLOW CATHODE

A hollow cathode includes an insulation plate having cathode holes. Bottom electrodes are below the insulation plate. The bottom electrodes define first holes having a width greater than a width of the cathode holes. Top electrodes are at an opposite side of the insulation plate from the bottom electrodes. The top electrodes define second holes aligned with the first holes along a direction orthogonal to the upper surface of the insulation plate. 1. A method of manufacturing a semiconductor device , the method comprising:obtaining a measurement of etch uniformity of a substrate by detecting differences in etch rate depending on locations on the substrate;determining positions of bottom electrodes and top electrodes of a hollow cathode that are configured to be individually supplied with a source power and a bias power according to the detected differences in etch rate depending on locations on the substrate; andlocally generating a plasma on the substrate by selectively providing the source power and the bias power to the bottom electrodes and the top electrodes based on the differences in etch rate depending on locations on the substrate,wherein the hollow cathode further comprises an insulation plate provided between the bottom electrodes and the top electrodes, the hollow cathode having cathode holes,wherein the bottom electrodes have first holes and extend in a first direction,wherein the top electrodes have second holes aligned with the first holes and extend in a second direction intersecting the first direction, andwherein the cathode holes and the first and second holes are disposed at intersections of the bottom electrodes and the top electrodes.2. The method of claim 1 , wherein the bias power has a positive voltage when the source power has a negative voltage.3. The method of claim 2 , wherein the bias power is provided by a bias power supply.4. The method of claim 3 , wherein the bias power supply comprises:a bias power source;switching devices connected ...

Liquid filament for incandescent lights

A filament for a light bulb includes a tube and a filament material within the tube, wherein the filament material is configured to be in a liquid state while the light bulb is in use.

Particle-Optical Systems and Arrangements and Particle-Optical Components for such Systems and Arrangements

A particle-optical arrangement comprises a charged-particle source for generating a beam of charged particles; a multi-aperture plate arranged in a beam path of the beam of charged particles, wherein the multi-aperture plate has a plurality of apertures formed therein in a predetermined first array pattern, wherein a plurality of charged-particle beamlets is formed from the beam of charged particles downstream of the multi-aperture plate, and wherein a plurality of beam spots is formed in an image plane of the apparatus by the plurality of beamlets, the plurality of beam spots being arranged in a second array pattern; and a particle-optical element for manipulating the beam of charged particles and/or the plurality of beamlets; wherein the first array pattern has a first pattern regularity in a first direction, and the second array pattern has a second pattern regularity in a second direction electron-optically corresponding to the first direction, and wherein the second regularity is higher than the first regularity.

ELECTRON GENERATING APPARATUS AND IONIZATION GAUGE

An electron generating apparatus includes a filament, a power supply configured to supply power to the filament so as to make the filament emit an electron, and a controller configured to repeatedly detect a value having a correlation with power supplied from the power supply to the filament, determine whether a state of the filament satisfies a notification condition, by using a plurality of detected values, and perform notification when the state satisfies the notification condition. 1. An electron generating apparatus comprising:a filament;a power supply configured to supply power to the filament so as to make the filament emit an electron; anda controller configured to repeatedly detect a value having a correlation with power supplied from the power supply to the filament, determine whether a state of the filament satisfies a notification condition, by using a plurality of detected values, and perform notification when the state satisfies the notification condition.2. The apparatus according to claim 1 , wherein when an arithmetic value obtained by arithmetically calculating the plurality of values falls outside an allowable range claim 1 , the notification condition is satisfied.3. The apparatus according to claim 1 , wherein when an arithmetic value obtained by arithmetically calculating the plurality of values exceeds an upper limit value claim 1 , the notification condition is satisfied.4. The apparatus according to claim 1 , wherein when an arithmetic value obtained by arithmetically calculating the plurality of values falls below a lower limit value claim 1 , the notification condition is satisfied.5. The apparatus according to claim 2 , wherein the arithmetic value is an intermediate value of a set of the plurality of values.6. The apparatus according to claim 5 , wherein an intermediate value of the set is a mean value of the plurality of values.7. The apparatus according to claim 1 , wherein a time required to detect the plurality of values from the ...

Method and apparatus for a porous electrospray emitter

An ionic liquid ion source can include a microfabricated body including a base and a tip. The body can be formed of a porous material compatible with at least one of an ionic liquid or room-temperature molten salt. The body can have a pore size gradient that decreases from the base of the body to the tip of the body, such that the at least one of an ionic liquid or room-temperature molten salt is capable of being transported through capillarity from the base to the tip.

Electrode for dielectric barrier discharge treatment of a substrate

An electrode for dielectric barrier discharge treatment of a substrate includes a tubular housing that is made of electrically insulating material and has a bottom wall facing the substrate, two side walls extending away from the substrate, and a top wall connecting the distal ends of the side walls. The electrode further includes an electrically conductive electrode member disposed inside the housing and having a plate that engages an internal surface of the bottom wall of the housing. The electrode has two wings formed in one piece with the plate and engaging internal surfaces of the side walls of the housing.

ELECTRON EMISSION DEVICE

Provided herein are electron emission devices and device components for optical, electronic and optoelectronic devices, including cantilever-based MEMS and NEMS instrumentation. Devices of certain aspects of the invention integrate a dielectric, pyroelectric, piezoelectric or ferroelectric film on the receiving surface of a substrate having an integrated actuator, such as a temperature controller or mechanical actuator, optionally in the form of a cantilever device having an integrated heater-thermometer. Also provided are methods of making and using electron emission devices for a range of applications including sensing and imaging technology. 1. An electron emission device comprising:a substrate having a receiving surface;a dielectric, pyroelectric, piezoelectric or ferroelectric thin film provided on at least a portion of said receiving surface or provided on one or more intermediate structures supported by said receiving surface; wherein said dielectric, pyroelectric, piezoelectric or ferroelectric thin film comprises a crystalline material and has a thickness less than or equal to 10 μm; andan actuator operationally coupled to said dielectric, pyroelectric, piezoelectric or ferroelectric thin film for selectively modulating a state of mechanical strain, a temperature, an applied electric field or a combination of these in said dielectric, pyroelectric, piezoelectric or ferroelectric thin film so as to generate electron emission from an external surface of said dielectric, pyroelectric, piezoelectric or ferroelectric thin film.2. The device of claim 1 , wherein said external surface of said dielectric claim 1 , pyroelectric claim 1 , piezoelectric or ferroelectric thin film is characterized by one or more relief features each independently terminating at a distal end having lateral cross sectional dimensions less than or equal to 250 nm.3. The device of claim 2 , wherein said substrate comprises one or more probe tips on said receiving surface claim 2 , wherein ...

Hollow cathode, an apparatus including a hollow cathode for manufacturing a semiconductor device, and a method of manufacturing a semiconductor device using a hollow cathode

A hollow cathode includes an insulation plate having cathode holes. Bottom electrodes are below the insulation plate. The bottom electrodes define first holes having a width greater than a width of the cathode holes. Top electrodes are at an opposite side of the insulation plate from the bottom electrodes. The top electrodes define second holes aligned with the first holes along a direction orthogonal to the upper surface of the insulation plate.

DIELECTRIC BARRIER DISCHARGE-TYPE ELECTRODE STRUCTURE FOR GENERATING PLASMA HAVING CONDUCTIVE BODY PROTRUSION ON ELECTRODES

Provided is a dielectric barrier discharge-type electrode structure for generating plasma. The electrode structure, according to the present invention, comprises: an upper conductive body electrode and a lower conductive body electrode; at least one conductive body electrode protrusion portion, which is formed on at least one surface of the upper conductive body electrode and/or the lower conductive body electrode; a dielectric layer which is formed on at least one of the inner surfaces of the upper conductive body electrode and the lower conductive body electrode that face each other, so as to have a substantially uniform thickness; and a specific gap (d) which is formed between the upper and lower conductive body electrodes and the dielectric layer, or between dielectric layers, due to the protruding effect of the conductive body electrode protrusion portion when the upper conductive body electrode and the lower conductive body electrodes come into close contact, wherein the plasma is generated by applying a pulse power or an alternating power to the upper conductive body electrode and the lower conductive body electrode. 1. A dielectric barrier discharge-type plasma generating electrode structure comprising:an upper conductive electrode and a lower conductive electrode;at least one conductive electrode protrusion formed on at least one inner surface of the upper conductive electrode and the lower conductive electrode facing each other;a dielectric layer formed with a substantially uniform thickness on at least one inner surface of the upper conductive electrode and the lower conductive electrode facing each other; anda predetermined gap d formed between the upper and lower conductive electrodes and the dielectric layer or between the dielectric layers facing each other due to the protrusion effect of the conductive electrode protrusion when the upper conductive electrode and the lower conductive electrode are brought into close contact with each other,wherein a ...

SOLUTION ELECTRODE GLOW DISCHARGE APPARATUS

A solution electrode glow discharge apparatus has a housing that contains a solid electrode. The solid electrode has a head and a tip. The tip of the solid electrode extends outwards from the housing. At least a portion of the head of the solid electrode is positioned with an electrical and thermal conducting block. An adjustable-polarity power supply is provided in communication with the solid electrode. A cooling mechanism is provided for cooling the electrical and thermal conducting block. 1. A solution electrode glow discharge apparatus , comprising:a housing containing a solid electrode, the solid electrode having a head and a tip, the tip of the solid electrode extending outwards from the housing;an electrical and thermal conducting block positioned within the housing, at least a portion of the head of the solid electrode being positioned within the electrical and thermal conducting block;a adjustable-polarity power supply in communication with the solid electrode; anda cooling mechanism to cool the electrical and thermal conducting block.2. The solution electrode glow discharge apparatus of further comprising a solution receptacle positioned in spaced relation to the tip of the solid electrode for holding solution to be tested claim 1 , the solution to be tested having a different electrical potential than an electrical potential of the solid electrode claim 1 , the solution receptacle being spaced from the tip of the solid electrode such that a glow discharge is maintainable.3. The solution electrode glow discharge apparatus of wherein the cooling mechanism passively cools the electrical and thermal conducting block.4. The solution electrode glow discharge apparatus of wherein the cooling mechanism actively cools the electrical and thermal conducting block.5. The solution electrode glow discharge apparatus of wherein the cooling mechanism is at least one heat pump.6. The solution electrode glow discharge apparatus of wherein the at least one heat pump is a ...

Capacitors and radio frequency generators and other devices using them

Certain configurations of a stable capacitor are described which comprise electrodes produced from materials comprising a selected coefficient of thermal expansion to enhance stability. The electrodes can be spaced from each other through one of more dielectric layers or portions thereof. In some instances, the electrodes comprise integral materials and do not include any thin films. The capacitors can be used, for example, in feedback circuits, radio frequency generators and other devices used with mass filters and/or mass spectrometry devices.

Interference management for adaptive tdd with frequency domain separations

A method of wireless communication at a serving base station identifies a potential interference condition based on an uplink/downlink configuration mismatch. The method includes signaling, to a neighbor base station, to restrict transmissions based on the identified potential interference condition. The transmissions may be restricted by beamforming the transmissions into a different direction and/or blocking transmissions on a frequency. The signaling prompts the neighbor base station to restrict downlink transmissions that will potentially interfere with uplink control channel transmissions received at the serving base station, or to restrict uplink transmissions, intended for the neighbor base station, that will potentially interfere with downlink control channel transmissions from the serving base station.

METHOD AND APPARATUS FOR A POROUS ELECTROSPRAY EMITTER

An ionic liquid ion source can include a microfabricated body including a base and a tip. The body can be formed of a porous material compatible with at least one of an ionic liquid or room-temperature molten salt. The body can have a pore size gradient that decreases from the base of the body to the tip of the body, such that the at least one of an ionic liquid or room-temperature molten salt is capable of being transported through capillarity from the base to the tip. 1. (canceled)2. A system for producing ions comprising:a source of ions;a first porous material in contact with the source of ions;a connecting member comprising a second porous material, wherein the connecting member is operatively coupled to the first porous material; andan array of emitters comprising a third porous material, wherein the array is operatively coupled to the connecting member, wherein the source of ions is transported through capillarity from the first porous material to the array of emitters through the connecting member.3. The system of claim 2 , wherein the first porous material is a distal electrode.4. The system of claim 2 , wherein a pore size of the third porous material is less than a pore size of the second porous material claim 2 , and wherein a pore size of the second porous material is less than a pore size of the first porous material.5. The system of claim 4 , wherein a pore size of an emitter body of the array of emitters decreases from a base to a tip of the emitter body.6. The system of claim 2 , wherein the source of ions comprises an ionic liquid and/or a room-temperature molten salt.7. The system of claim 2 , further comprising a first electrode electrically connected to the array of emitters through the source of ions.8. The system of claim 7 , further comprising a second electrode positioned downstream relative to the array of emitters and the first electrode.9. The system of claim 8 , wherein when a voltage potential is applied to the source of ions claim 8 , ...

Method and apparatus for a porous electrospray emitter

An ionic liquid ion source can include a microfabricated body including a base and a tip. The body can be formed of a porous material compatible with at least one of an ionic liquid or room-temperature molten salt. The body can have a pore size gradient that decreases from the base of the body to the tip of the body, such that the at least one of an ionic liquid or room-temperature molten salt is capable of being transported through capillarity from the base to the tip.

Electron emission surface for x-ray generation

Embodiments of the disclosure relate to electron emitters for use in conjunction with X-ray emitting devices. In certain embodiments the emitter includes features that prevent, limit, or control deflection of the electron emitter at operating temperatures. In this manner, the electron emitter may be kept substantially flat or at a desired curvature during operation.

LIQUID FILAMENT FOR INCANDESCENT LIGHTS

A filament for a light bulb includes a tube and a filament material within the tube, wherein the filament material is configured to be in a liquid state while the light bulb is in use. 1. A light bulb , comprising:a tube, the tube having an inner diameter and an outer diameter defining a thickness of a tube wall, and wherein at least one of the inner diameter, the outer diameter, or the thickness varies along a length of the tube; anda filament material within the tube, the filament material configured to be in a liquid state when the light bulb is in use.2. The light bulb of claim 1 , wherein a first outer surface of the tube at one end of the tube and a second outer surface of the tube at the other end of the tube are configured such that the temperature of the tube is lower at each end of the tube than at a location between the two ends.3. The light bulb of claim 1 , wherein the tube includes two ends claim 1 , wherein the thickness and outer diameter at one end of the tube and the thickness and outer diameter at the other end of the tube are configured such that a stress of the tube is lower at each end of the tube than at a location between the two ends.4. The light bulb of claim 1 , wherein the outer diameter remains constant along a length of the tube.5. The light bulb of claim 1 , wherein the inner diameter remains constant along a length of the tube.6. The light bulb of claim 5 , wherein the outer diameter is fixed at a first value for a first distance from the ends of the tube toward the midpoint of the tube claim 5 , wherein the outer diameter decreases for a second distance and toward the midpoint of the tube claim 5 , and wherein the outer diameter is fixed at a second value for a third distance toward the midpoint of the tube.7. The light bulb of claim 5 , wherein the outer diameter decreases from the ends of the tube along the tube toward the midpoint of the tube.8. The light bulb of claim 1 , wherein the inner diameter of the tube varies along a ...

Thermionic wave generator (twg)

Energy conversion systems that may employ control grid electrodes, acceleration grid electrodes, inductive elements, multi-stage anodes, and emissive carbon coatings on the cathode and anode are described. These and other characteristics may allow for advantageous thermal energy to electrical energy conversion.

12CaO-7Al2O3 ELECTRIDE HOLLOW CATHODE

The use of the electride form of 12CaO-7Al 2 O 3 , or C12A7, as a low work function electron emitter in a hollow cathode discharge apparatus is described. No heater is required to initiate operation of the present cathode, as is necessary for traditional hollow cathode devices. Because C12A7 has a fully oxidized lattice structure, exposure to oxygen does not degrade the electride. The electride was surrounded by a graphite liner since it was found that the C12A7 electride converts to it's eutectic (CA+C3A) form when heated (through natural hollow cathode operation) in a metal tube.

OXIDE SINTERED BODY, PRODUCTION METHOD THEREFOR, TARGET, AND TRANSPARENT CONDUCTIVE FILM

A target for sputtering which enables to attain high rate film-formation of a transparent conductive film suitable for a blue LED or a solar cell. A oxide sintered body includes an indium oxide and a cerium oxide, and one or more oxide of titanium, zirconium, hafnium, molybdenum and tungsten. The cerium content is 0.3 to 9% by atom, as an atomicity ratio of Ce/(In+Ce), and the content of cerium is equal to or lower than 9% by atom, as an atomicity ratio of Ce/(In+Ce). The oxide sintered body has an InOphase of a bixbyite structure has a CeOphase of a fluorite-type structure finely dispersed as crystal grains having an average particle diameter of equal to or smaller than 3 μm. 1. A oxide sintered body comprising an indium oxide and a cerium oxide , wherein the cerium content is 0.3 to 9% by atom , as an atomicity ratio of Ce/(In+Ce) , and the content of cerium is equal to or lower than 9% by atom , as an atomicity ratio of Ce/(In+Ce) ,{'sub': 2', '3', '2, 'said oxide sintered body has an InOphase of a bixbyite structure as a main crystal phase, has a CeOphase of a fluorite-type structure finely dispersed as crystal grains having an average particle diameter of equal to or smaller than 3 μm, as a second phase.'}2. The oxide sintered body according to claim 1 , characterized in that X-ray diffraction peak intensity ratio (I) claim 1 , defined by the following formula claim 1 , is equal to or lower than 25%:{'br': None, 'sub': 2', '2', '3, 'I=[CeOphase(111)/InOphase(222)]×100[%]'}3. The oxide sintered body according to claim 1 , wherein the oxide sintered body does not comprise tin.4. A production method for a oxide sintered body obtained by adding and mixing raw material powder comprising indium oxide powder and cerium oxide powder claim 1 , and then molding the mixed powder claim 1 , and sintering the molding by a normal pressure sintering method claim 1 , or molding and sintering the mixed powder by a hot press method claim 1 ,{'sub': 2', '2', '2, 'wherein average ...

Magnetic structures

The present invention relates to a process of and apparatus for forming a magnetic structure on a substrate ( 44 ) and also a magnetic structure formed by such a process and apparatus. The magnetic structure comprises a matrix in which magnetic particles are embedded. Apparatus ( 30 ) for forming the magnetic structure on the substrate ( 44 ) comprises a source of matrix material ( 32 ) which is operable to deposit the matrix material onto the substrate to thereby form the matrix. The apparatus ( 30 ) for forming the magnetic structure further comprises a source of magnetic particles ( 34 ) which is operable to deposit the magnetic particles onto the matrix as the matrix forms to thereby embed the magnetic particles in the matrix. Each magnetic particle comprises a core covered at least in part with a layer of metal, at least one of the matrix material and the core is of ferromagnetic material and the core and the layer of metal are of different materials.

12CaO-7Al2O3 ELECTRIDE HOLLOW CATHODE

The use of the electride form of 12CaO-7AlO, or C12A7, as a low work function electron emitter in a hollow cathode discharge apparatus is described. No heater is required to initiate operation of the present cathode, as is necessary for traditional hollow cathode devices. Because C12A7 has a fully oxidized lattice structure, exposure to oxygen does not degrade the electride. The electride was surrounded by a graphite liner since it was found that the C12A7 electride converts to it's eutectic (CA+C3A) form when heated (through natural hollow cathode operation) in a metal tube. 1. A hollow cathode discharge apparatus , comprising:a metal tube having a first end and a second end, an outside surface and an inside surface;a gas source for flowing gas into the first end of said tube;a metal end cap having an orifice with a chosen diameter adapted to attach to the second end of said tube, such that the gas exits said tube through the orifice;a tubular graphite liner having an outer surface, a first open end and a second end, adapted to be inserted into said metal tube, and in electrical contact therewith, with the second end thereof disposed in the vicinity of said end cap;{'sub': 2', '3, 'a 12CaO-7AlOelectride material disposed inside of said tubular graphite liner in the vicinity of said metal end cap;'}a keeper element disposed outside of said tube in the vicinity of said end cap; anda first direct current source in electrical contact with said keeper and said tube for initiating and maintaining an electric discharge in the gas between said electride material and said keeper without said electride material being initially heated.2. The discharge apparatus of claim 1 , further comprising an electrode or plasma anode disposed outside of said keeper; and a second direct current source for initiating and maintaining an electric discharge in the gas between said electride material and said anode.3. The discharge apparatus of claim 1 , wherein said first direct current source ...

STEPPED INDIRECTLY HEATED CATHODE WITH IMPROVED SHIELDING

An ion source for forming a plasma has a cathode with a cavity and a cathode surface defining a cathode step. A filament is disposed within the cavity, and a cathode shield has a cathode shield surface at least partially encircling the cathode surface. A cathode gap is defined between the cathode surface and the cathode shield surface, where the cathode gap defines a tortured path for limiting travel of the plasma through the gap. The cathode surface can have a stepped cylindrical surface defined by a first cathode diameter and a second cathode diameter, where the first cathode diameter and second cathode diameter differ from one another to define the cathode step. The stepped cylindrical surface can be an exterior surface or an interior surface. The first and second cathode diameters can be concentric or axially offset. 1. An ion source for forming a plasma , the ion source comprising: a cathode surface defining a cathode step; and', 'a cavity;, 'a cathode comprisinga filament disposed within the cavity; anda cathode shield having a cathode shield surface at least partially encircling the cathode surface, wherein a cathode gap is defined between the cathode surface and the cathode shield surface.2. The ion source of claim 1 , wherein the cathode surface comprises a stepped cylindrical surface defined by a first cathode diameter and a second cathode diameter claim 1 , wherein the first cathode diameter and second cathode diameter differ from one another claim 1 , therein defining the cathode step.3. The ion source of claim 2 , wherein the stepped cylindrical surface comprises an exterior surface defining the first cathode diameter and the second cathode diameter claim 2 , and wherein the cathode shield surface defines a cathode shield step claim 2 , wherein a profile of the cathode shield step generally conforms to the cathode step claim 2 , whereby the cathode gap between the cathode surface and the cathode shield surface is maintained.4. The ion source of claim 3 ...

Semiconductor micro-hollow cathode discharge device for plasma jet generation

A micro-hollow cathode discharge device. The device includes a first electrode layer comprising a first electrode. A hole is disposed in the first electrode layer. The device also includes a dielectric layer having a first surface that is disposed on the first electrode layer. The hole continues from the first electrode layer through the dielectric layer. The device also includes a semi-conducting layer disposed on a second surface of the dielectric layer opposite the first surface. The semi-conducting layer is a semiconductor material that spans across the hole such that the hole terminates at the semi-conducting layer. The device also includes a second electrode layer disposed on the semi-conducting layer opposite the dielectric layer.

High Efficiency Hollow Cathode and Cathode System Applying Same

The present invention relates to a high efficiency hollow cathode and a cathode system applying the same, and comprises: a tube comprising at least two refractory metal parts; a gas providing unit and a gas outlet which are respectively formed at the distal ends of the tube; and an insert mounted inside the tube. According to the present invention, since the present invention constitutes a hollow cathode using more than two substances, the present invention can not only enhance thermal stability, lifespan and efficiency, but also can reduce costs accordingly. 1. A hollow cathode comprising: a tube comprising at least two refractory metal parts; a gas providing unit and a gas outlet which are respectively formed at the distal ends of the tube; and an insert mounted inside the tube.2. The hollow cathode of claim 1 , wherein the part constituting the tube is formed of refractory metal materials different from each other.3. The hollow cathode of claim 1 , wherein a first part and a second part of the tube are formed of the same refractory metal material and a third part is formed of a different refractory metal material claim 1 , the tube is formed of a tube part of the same or different refractory metal material claim 1 , and the thickness and diameter of each of the tube part are made to be the same or different.4. The hollow cathode of claim 1 , wherein a thermal radiation insulation layer is formed at an interval in the outer side of the tube where the insert is located.5. The hollow cathode of claim 1 , wherein the tube is formed of a tube part made of titanium claim 1 , titanium alloy claim 1 , tantalum material or a combination thereof.6. The hollow cathode of claim 1 , wherein part of or the entire insert is formed of refractory metal wire.7. The hollow cathode of claim 6 , wherein the insert comprises a wire type insert and a foil type insert.8. The hollow cathode of claim 7 , wherein the innermost layer or inner layers are formed of the wire type insert and ...

Conductive aerogel

Electrically conductive aerogel and methods of making the same are disclosed. A solution is provided. The solution is cured to form a polymer. The polymer is carbonized to form the conductive aerogel.

METHOD AND APPARATUS FOR A POROUS ELECTROSPRAY EMITTER

An ionic liquid ion source can include a microfabricated body including a base and a tip. The body can be formed of a porous material compatible with at least one of an ionic liquid or room-temperature molten salt. The body can have a pore size gradient that decreases from the base of the body to the tip of the body, such that the at least one of an ionic liquid or room-temperature molten salt is capable of being transported through capillarity from the base to the tip. 1. (canceled)2. A method of forming an electrospray emitter comprising:pouring a gel solution into a mold shaped to form one or more emitter bodies with a base and a tip; anddrying the gel solution in the mold to form the one or more emitter bodies at least partially from a porous material.3. The method of claim 2 , wherein the gel solution is a sol gel solution.4. The method of claim 3 , wherein the sol gel solution includes a solvent claim 3 , an acidic aluminum salt claim 3 , a polymer claim 3 , and a proton scavenger.5. The method of claim 3 , further comprising mixing aluminum chloride hexahydrate claim 3 , polyethylene oxide claim 3 , water claim 3 , ethanol claim 3 , and propylene oxide to form the sol gel solution.6. The method of claim 2 , wherein the porous material is a porous xerogel.7. The method of claim 2 , wherein the porous material is a ceramic.8. The method of claim 2 , wherein the porous material is alumina.9. The method of claim 2 , wherein a pore size of the one or more emitter bodies decreases from the base to the tip of the one or more emitter bodies.10. The method of claim 2 , wherein pores of the porous material have a diameter between or equal to 3 μm and 5 μm.11. The method of claim 2 , wherein a radius of curvature of the tip of the one or more emitter bodies is between or equal to 1 μm and 20 μm.12. A method of forming an electrospray emitter comprising:pouring a slurry including ground porous material into a mold shaped to form one or more emitter bodies with a base and ...

Apparatus and process for generating, accelerating and propagating beams of electrons and plasma

An apparatus and a process for generating, accelerating and propagating beams of electrons and plasma at high density, the apparatus comprising: a first dielectric tube, which contains gas; a hollow cathode, which is connected to said first dielectric tube; a second dielectric tube, which is connected to said hollow cathode and protrudes inside, and is connected to, a deposition chamber; an anode, which is arranged around said second dielectric tube, in an intermediate position; means for applying voltage to said cathode and said anode; means for evacuating the gas from the chamber; and means for spontaneous conversion of gas in the first dielectric tube into plasma.

Channel spark source for generating a stable focussed electron beam

In a channel spark source triggered by gas discharge for generating a stable focused electron beam, a gas supply for a hollow cathode thereof is provided which generates in the hollow cathode a pressure differential so that the multiplication of charge carriers in a trigger plasma of a trigger plasma source connected to the hollow cathode provides for a reliable gas discharge and the formation of a stable electron beam which exits the arrangement and which does not damage the internal passages of the arrangement.

Magnetic structures

EMITTER, ELECTRON GUN IN WHICH SAME IS USED, ELECTRONIC DEVICE IN WHICH SAME IS USED, AND METHOD FOR MANUFACTURING SAME

The present invention provides a simpler method for sharpening a tip of an emitter. In addition, the present invention provides an emitter including a nanoneedle made of a single crystal material, an emitter including a nanowire made of a single crystal material such as hafnium carbide (HfC), both of which stably emit electrons with high efficiency, and an electron gun and an electronic device using any one of these emitters. A method for manufacturing the emitter according to an embodiment of the present invention comprises processing a single crystal material in a vacuum using a focused ion beam to form an end of the single crystal material, through which electrons are to be emitted, into a tapered shape, wherein the processing is performed in an environment in which a periphery of the single crystal material fixed to a support is opened. 1. A method for manufacturing an emitter , the method comprising:processing a single crystal material in a vacuum using a focused ion beam to form an end of the single crystal material, through which electrons are to be emitted, into a tapered shape, the processing being performed in an environment in which a periphery of the single crystal material fixed to a support is opened.2. The method according to claim 1 , wherein the single crystal material is chemically untreated.3. The method according to claim 1 , wherein an end face opposite to the end of the single crystal material is fixed to a support face of the support.4. The method according to claim 1 , wherein the processing the single crystal material comprises setting a radius of curvature rof a tip of the end to a value of 80% or less of a length dof the single crystal material in a lateral direction.5. The method according to claim 4 , wherein in the processing the single crystal material claim 4 , the single crystal material is thinned toward the end by setting irradiation conditions of the focused ion beam such that a current is 200 to 800 pA claim 4 , a voltage is 20 ...

Light transmissive metal electrode and manufacturing method thereof

The present invention provides a light-transmitting metal electrode including a substrate and a metal electrode layer having plural openings. The metal electrode layer also has such a continuous metal part that any pair of point-positions in the part is continuously connected without breaks. The openings in the metal electrode layer are periodically arranged to form plural microdomains. The plural microdomains are so placed that the in-plane arranging directions thereof are oriented independently of each other. The thickness of the metal electrode layer is in the range of 10 to 200 nm.

Conductive paste and conductive pattern

본 발명은 내산성이 우수한 어드레스 전극을 형성하는 것이 가능한 도전 페이스트 및 내산성이 우수한 도전 패턴을 제공한다. 또한, 도전 분말과, 산화비스무스, 실리카, 산화붕소, 지르코니아와 티타니아 중 적어도 어느 하나, RO(RO는 BeO, MgO, CaO, BaO, SrO에서 선택되는 적어도 1종), R 2 O(R 2 O는 Li 2 O, Na 2 O, K 2 O, Rb 2 O, Cs 2 0로부터 선택되는 적어도 1종)을 포함하는 유리 프릿을 포함하는 무기 성분, 및 유기 결합제를 함유한다. The present invention provides a conductive paste capable of forming an address electrode excellent in acid resistance and a conductive pattern excellent in acid resistance. Further, the conductive powder, bismuth oxide, silica, boron oxide, zirconia and titania, RO (RO is at least one selected from BeO, MgO, CaO, BaO, and SrO), R 2 O (R 2 O Contains an inorganic component comprising a glass frit containing Li 2 O, Na 2 O, K 2 O, at least one selected from Rb 2 O, Cs 2 0), and an organic binder.

Mesh electrode attachment structure, electron emission device and electronic installation

本发明提供了一种网状电极附接结构、一种电子发射器件以及包括该电子发射器件的电子装置。该网状电极附接结构包括：基板，具有至少一个开口；粘附层，设置在基板上；以及网状电极，设置在基板上，粘附层在网状电极和基板之间，其中网状电极具有与至少一个开口所位于的区域相应的网状区域以及接触粘附层的粘附区域，粘附区域包括暴露粘附层的一部分的至少一个结合凹槽。这样的网状电极附接区域应用于电子发射器件的栅电极使得栅电极稳定地附接到绝缘层。

mesh electrode adhesion structure, electron emission device and electronic apparatus employing the same

메쉬 전극 접합 구조체, 전자 방출 소자, 및 전자 방출 소자를 포함하는 전자 장치가 개시된다. 개시된 메쉬 전극 접합 구조체는 적어도 하나의 개구를 포함하는 기판; 기판의 상부에 마련된 접착층; 및 접착층을 사이에 두고 기판의 상부에 배치되는 메쉬 전극;을 포함하며, 메쉬 전극은 적어도 하나의 개구가 위치하는 영역에 마련되는 메쉬 영역과 접착층에 맞닿는 접착 영역을 가지며, 접착 영역에는 접착층의 일부가 노출되는 적어도 하나의 결합홀이 마련된다. 이러한 메쉬 전극 접합 구조체는 전자 방출 소자의 게이트 전극에 적용되어, 게이트 전극이 절연층에 안정적으로 부착될 수 있도록 할 수 있다. An electronic device including a mesh electrode junction structure, an electron-emitting device, and an electron-emitting device is disclosed. The disclosed mesh electrode bonding structure includes a substrate including at least one opening; An adhesive layer provided on the substrate; And a mesh electrode disposed on the top of the substrate with an adhesive layer interposed therebetween, wherein the mesh electrode has a mesh region provided in a region where at least one opening is located and an adhesion region contacting the adhesion layer, At least one coupling hole is provided. Such a mesh electrode junction structure may be applied to the gate electrode of the electron-emitting device so that the gate electrode can be stably attached to the insulating layer.

Structure for Plasma Display Panel Installation

본 발명은 플라즈마 디스플레이 패널을 설치하기 위한 구조물에 관한 것으로, 플라즈마 디스플레이 패널을 고정하는 장치를 벽이나 편평한 탁상 등에 설치한 후에도 상하 및, 좌우 조절이 가능하도록 하기 위해, PDP 장치(10)의 양측면에 결합되어 상기 PDP장치(10)를 수직축을 중심으로 좌우로 회동시키는 앙각조절수단(20)과, 이 앙각조절수단(20)과 받침대(30)사이에 결합되어 상기 PDP장치(10)를 수평축을 중심으로 상하로 회동시키는 방위각조절수단(40) 및 상기 받침대(30)에 힌지결합되면서 상기 벽(60)에 고정결합되는 보조받침대(32)로 구성되어, 플라즈마 디스플레이 패널이 본 발명에 따른 구조물을 매개로 하여 벽이나 탁상위에 설치한 후에도 상기 구조물에 의해 상하 및, 좌우로 조절될 수 있게 함으로써, 시청자가 다양한 각도에서 본 플라즈마 디스플레이 패널의 화면을 시청할 수 있게 한 것이다.

Conductive paste and conductive pattern

本发明提供导电糊剂及导电图案，更详细地说，提供能够形成耐酸性优异的寻址电极的导电糊剂、以及耐酸性优异的导电图案。导电糊剂含有无机成分、以及有机粘合剂，所述无机成分包含导电粉末和玻璃粉，所述玻璃粉含有：氧化铋；二氧化硅；氧化硼；氧化锆和二氧化钛中的至少任一种；RO(RO为选自BeO、MgO、CaO、BaO、SrO中的至少一种)；以及R 2 O(R 2 O为选自Li 2 O、Na 2 O、K 2 O、Rb 2 O、Cs 2 O中的至少一种)。

Hollow cathode device

AUTO EMISSION ELECTRON GUN

РОССИЙСКАЯ ФЕДЕРАЦИЯ (19) RU (11) (13) 2018 115 094 A (51) МПК H01J 1/00 (2006.01) ФЕДЕРАЛЬНАЯ СЛУЖБА ПО ИНТЕЛЛЕКТУАЛЬНОЙ СОБСТВЕННОСТИ (12) ЗАЯВКА НА ИЗОБРЕТЕНИЕ (21)(22) Заявка: 2018115094, 24.04.2018 (71) Заявитель(и): Общество с ограниченной ответственностью "Экологический свет" (RU) Приоритет(ы): (22) Дата подачи заявки: 24.04.2018 (43) Дата публикации заявки: 24.10.2019 Бюл. № 30 Стр.: 1 A 2 0 1 8 1 1 5 0 9 4 R U A (57) Формула изобретения 1. Автоэмиссионная электронная пушка, содержащая автокатод (1) с рабочей поверхностью (2) и контактным электродом (3), заключенный в диэлектрическую оболочку (4), содержащая также плоский модулятор (5) толщиной h1 с отверстием (6), имеющим диаметр d1, поверхность которого является рабочей частью (7) плоского модулятора (5), размещенный над первой поверхностью (8) диэлектрической оболочки (4), при этом рабочая часть (7) плоского модулятора (5) находится вокруг рабочей поверхности (2) автокатода (1), а контактный электрод (3) расположен со стороны второй поверхности (9) диэлектрической оболочки (4), при этом ось симметрии O1-O2 проходит через отверстие (6) плоского модулятора (5) и перпендикулярна первой поверхности (8) диэлектрической оболочки (4), отличающаяся тем, что в нее введен, по меньшей мере, один первый дополнительный автокатод (10) с рабочей поверхностью (2) и контактным электродом (3), заключенный в диэлектрическую оболочку (4), а соотношение диаметра d1 отверстия (6) к толщине h1 плоского модулятора (5) находится в диапазоне 1:1-1:5, при этом диэлектрическая оболочка (4) выполнена в виде плоского элемента, а плоский модулятор (5) размещен на первой поверхности (8) диэлектрической оболочки (4). 2. Автоэмиссионная электронная пушка по п. 1, отличающаяся тем, что автокатод (1) и, по меньшей мере, один первый дополнительный автокатод (10) выполнены из пучков углеродных волокон. 3. Автоэмиссионная электронная пушка по п. 1, отличающаяся тем, что автокатод (1) и, по меньшей мере, один первый дополнительный автокатод ( ...

Method of producing fine powder of intermetallide pd5ba

Изобретение относится к порошковой металлургии, в частности к получению мелкодисперсного порошка интерметаллида Рd 5 Ва. Может использоваться для изготовления катодов. Обезгаженный в вакууме порошок палладия и металлический барий размещают в предварительно вакуумированной и герметичной кварцевой реторте и ведут синтез интерметаллида Рd 5 Ва в две стадии. На первой стадии реторту нагревают до температуры 900-950°С в течение 1-1,5 часов, а на второй стадии - до температуры 1280-1300°С в течение 20-30 минут. Полученную в реторте губку дробят на гидропрессе, размалывают в стальной шаровой мельнице и просеивают через сито с ячейкой не более 50х50 мкм с получением мелкодисперсного порошка интерметаллида Рd 5 Ва. Полученный порошок освобождают от мелкодисперсных продуктов натира и помола с помощью магнитного поля в барабанном сепараторе. Обеспечивается повышение однородности и стабильности вторично-эмиссионных свойств катодов. 1 з.п. ф-лы, 2 ил. РОССИЙСКАЯ ФЕДЕРАЦИЯ (19) RU (11) (13) 2 741 940 C1 (51) МПК C22C 5/04 (2006.01) B22F 3/10 (2006.01) B22F 9/04 (2006.01) H01J 1/00 (2006.01) ФЕДЕРАЛЬНАЯ СЛУЖБА ПО ИНТЕЛЛЕКТУАЛЬНОЙ СОБСТВЕННОСТИ (12) ОПИСАНИЕ ИЗОБРЕТЕНИЯ К ПАТЕНТУ (52) СПК C22C 5/04 (2020.08); C22C 1/0466 (2020.08); C22C 1/0491 (2020.08); B22F 2301/25 (2020.08); H01J 1/00 (2020.08); B22F 2304/10 (2020.08) (21)(22) Заявка: 2019130966, 02.10.2019 02.10.2019 Дата регистрации: 29.01.2021 (45) Опубликовано: 29.01.2021 Бюл. № 4 Адрес для переписки: 248012, Калужская обл., г. Калуга, ул. Кибальчича, 30, кв. 48, Шкилев Владимир Дмитриевич C 1 2 7 4 1 9 4 0 R U (54) СПОСОБ ПОЛУЧЕНИЯ МЕЛКОДИСПЕРСНОГО ПОРОШКА ИНТЕРМЕТАЛЛИДА Pd 5 Ba (57) Реферат: Изобретение относится к порошковой металлургии, в частности к получению мелкодисперсного порошка интерметаллида Рd5Ва. Может использоваться для изготовления катодов. Обезгаженный в вакууме порошок палладия и металлический барий размещают в предварительно вакуумированной и герметичной кварцевой реторте и ведут синтез интерметаллида ...

Transparent carbon nanotube electrode using conductive dispersant and production method thereof

Disclosed is a transparent carbon nanotube (CNT) electrode using a coriductive dispersant. The transparent CNT electrode comprises a transparent substrate and a CNT thin film formed on a surface the transparent substrate wherein the CNT thin film is formed of a CNT composition comprising CNTs and a doped dispersant. Further disclosed is a method for producing the transparent CNT electrode.

HOLLOW CATHODE FOR PLASMA ELECTRONIC AND IONIC SOURCE

L'invention concerne une cathode creuse pour source électronique et ionique à plasma. Selon l'invention, la cathode creuse comporte un corps 2 avec un orifice de sortie 7 et un fond 3; la cavité interne du corps 2 est limitée d'un côté par le fond 3 du corps 2 et du côté opposé, par la paroi du corps 2 comportant l'orifice de sortie 7; la cavité interne du corps 2 comporte, isolée du corps 2, une membrane 6 à une distance L2 par rapport au fond 3 égale aux deux tiers de la longueur L1 . L'épaisseur h de la membrane 6 et le diamètre D2 de son orifice sont compris entre des valeurs limites de 0,3 et 0,4 fois le diamètre D1 de la cavité interne. L'invention s'applique notamment aux sources d'électrons et d'ions à plasma pour le soudage, pour le recuit ou pour le brasage à faisceau électronique. The invention relates to a hollow cathode for an electronic and ionic plasma source. According to the invention, the hollow cathode comprises a body 2 with an outlet orifice 7 and a bottom 3; the internal cavity of the body 2 is limited on one side by the bottom 3 of the body 2 and on the opposite side by the wall of the body 2 comprising the outlet orifice 7; the internal cavity of the body 2 comprises, isolated from the body 2, a membrane 6 at a distance L2 relative to the bottom 3 equal to two thirds of the length L1. The thickness h of the membrane 6 and the diameter D2 of its orifice are between limit values of 0.3 and 0.4 times the diameter D1 of the internal cavity. The invention applies in particular to sources of electrons and plasma ions for welding, for annealing or for electron beam brazing.

Circuit with a semiconductor with two valleys

ALKYDES WHICH MAY BE DISPERSED IN WATER, AQUEOUS DISPERSIONS OF ALKYDES AND PROCESS FOR THE PREPARATION OF THESE DISPERSIONS

Résines alkydes séchant à l'air et pouvant être dispersées dans l'eau. La résine se caractérise par la présence de 1,25-3,75 % en poids de radicaux oxyde de polyalkylène. Application à la préparation d'enduits brillants. Air-drying alkyd resins that can be dispersed in water. The resin is characterized by the presence of 1.25-3.75% by weight of polyalkylene oxide radicals. Application to the preparation of glossy coatings.

Convergence York with improved focus characteristics

보정을 위한 편향 신호가 입력됨에 따라 음극선관의 관축방향에 따라 형태가 더욱 약해지는 배렬형의 보정자계를 발생시킴으로써 코머에러를 보정함과 동시에 자계 강도의 변화없이도 보정자계를 균일화시켜서 전자빔의 포커스 특성을 개선하는 수직보정자계용 코일 ?? 수평보정자계용 코일과; 상기한 수직보정자계용 코일 및 수평보정자계용 코일이 균일화된 보정자계를 가질 수 있도록 약한 형태의 배럴형의 자계를 발생시키기 위한 코어로 구성되어; 컨버전스 요크로부터 발생되는 배럴자계 자체의 형태를 약화시킴으로써 자계의 강도에는 변화가 없이 균일자계를 갖도록 하여, 코머수차를 보정하는 동시에 전자빔 자체의 포커스 특성이 개선되도록 함으로써 보다 더욱 선명한 화질을 얻을 수 있는 포커스 특성을 개선한 컨버전스 요크에 관한 것.

Circuit comprising a semiconductor has two valleys.

Hollow cathode

본 발명은 게터 재료(21;31;41;41') 층으로 코팅된 내부 표면, 외부 표면 또는 두 표면 모두의 적어도 일부를 갖는 중공 음극(20;30;40)에 관한 것이다. 본 발명의 중공 음극의 제조 방법이 또한 설명된다. The present invention relates to a hollow cathode (20; 30; 40) having at least a portion of an inner surface, an outer surface, or both surfaces coated with a layer of getter material (21; 31; 41; 41 '). Also described are methods of making hollow cathodes of the present invention.

Tablet for ion plating, production method therefor and transparent conductive film

A tablet for ion plating enables to attain high rate film-formation of a transparent conductive film suitable for a blue LED or a solar cell, and a noduleless film-formation not generating splash, an oxide sintered body most suitable for obtaining the same, and a production method thereof. A tablet for ion plating obtained by processing an oxide sintered body includes indium and cerium as oxides, and having a cerium content of 0.3 to 9% by atom, as an atomicity ratio of Ce/(In+Ce). The oxide sintered body has an In 2 O 3 phase of a bixbyite structure as a main crystal phase, has a CeO 2 phase of a fluorite-type structure finely dispersed as crystal grains having an average particle diameter of equal to or smaller than 3 μm, as a second phase. The oxide sintered body is produced by (a) mixing raw material powder consisting of indium oxide powder with an average particle diameter of equal to or smaller than 1.5 μm, then (b) molding the mixed powder, and sintering the molding by a normal pressure sintering method, or (b′) molding and sintering the mixed powder by a hot press method.

Hollow cathode lamp with improved stability alloy for the cathode

8 48,558 ABSTRACT OF THE DISCLOSURE A hollow cathode type light source is provided having improved operating stability by forming the cathode of an alloy of a highly reactive, unstable prime metal of interest for spectral emission, and of a chemically sta-ble, readily sputtered metal. An alloy of silver and calcium with a small amount of magnesium provides a hollow cathode device which exhibits stable operation after a mimimum warm-up time.

Display panel, electrode panel and electrode substrate thereof

An electrode substrate of a flat panel display comprises a substrate, an electrode layer, a conductive layer, and a barrier layer. The electrode layer is disposed above the substrate. The conductive layer is disposed above the electrode layer. The barrier layer is disposed above the conductive layer.

Rf output coupling system using plural radio frequency (rf) output element to control plasma characteristic

【課題】 高周波(RF)プラズマ処理システムにおいて、RFエネルギーの均一性を改善する装置及び方法の改良が必要である。 【解決手段】 高周波(RF)出力結合システムが供される。当該システムは、RF出力をプラズマ処理システム内のプラズマへ結合するRF電極と、該RF電極上の複数の出力結合位置でRF出力を電気的に結合する複数の出力結合素子と、該複数の出力結合素子と結合して、RF出力信号を前記複数の出力結合素子の各々へ結合するRF出力システムを有する。前記複数の出力結合素子は、前記RF電極の中心に位置する中心素子と、前記RF電極の中心から外れた位置に設けられる周辺素子を有する。第1周辺RF出力信号は、第2周辺RF出力信号と位相が異なる。 【選択図】 図1

Hollow cathode with built-in gas absorber for gas-discharge lamps and methods for implementing it

FIELD: lighting engineering; gas-discharge lamps. SUBSTANCE: as distinct from prior-art hollow cylindrical cathode, proposed one has its inner and outer surfaces facing lamp discharge area coated with layer of gas-absorbing material deposited thereon by way of cathodic spraying. Hollow cylindrical part can be made of metal chosen from group of nickel, molybdenum, tantalum, or niobium. Gas-absorbing layer can be produced from metal chosen from group of titanium, vanadium, yttrium, zirconium, niobium, hafnium, and tantalum, or from zirconium or tantalum based alloy with one or more elements chosen out of transition metals and aluminum. Thickness of mentioned layer can be minimum 20 μm. Inner and outer surfaces can be partially coated by masking in the course of deposition by way of cathodic spraying using base element of adequate form. EFFECT: enlarged service life of cathode. 6 cl, 5 dwg ÐÎÑÑÈÉÑÊÀß ÔÅÄÅÐÀÖÈß (19) RU (11) 2 299 495 (13) C2 (51) ÌÏÊ H01J 61/09 (2006.01) ÔÅÄÅÐÀËÜÍÀß ÑËÓÆÁÀ ÏÎ ÈÍÒÅËËÅÊÒÓÀËÜÍÎÉ ÑÎÁÑÒÂÅÍÍÎÑÒÈ, ÏÀÒÅÍÒÀÌ È ÒÎÂÀÐÍÛÌ ÇÍÀÊÀÌ (12) ÎÏÈÑÀÍÈÅ ÈÇÎÁÐÅÒÅÍÈß Ê ÏÀÒÅÍÒÓ (21), (22) Çà âêà: 2004117872/09, 11.11.2002 (30) Êîíâåíöèîííûé ïðèîðèòåò: 12.11.2001 IT MI01A002389 (73) Ïàòåíòîîáëàäàòåëü(è): ÑÀÅÑ ÃÅÒÒÅÐÑ Ñ.Ï.À. (IT) (43) Äàòà ïóáëèêàöèè çà âêè: 10.10.2005 R U (24) Äàòà íà÷àëà îòñ÷åòà ñðîêà äåéñòâè ïàòåíòà: 11.11.2002 (72) Àâòîð(û): ÃÀËËÈÒÎÍÜÎÒÒÀ Àëåññàíäðî (IT), ÁÎÔÔÈÒÎ Êëàóäèî (IT), ÊÎÐÀÖÖÀ Àëåññèî (IT) (45) Îïóáëèêîâàíî: 20.05.2007 Áþë. ¹ 14 2 2 9 9 4 9 5 (56) Ñïèñîê äîêóìåíòîâ, öèòèðîâàííûõ â îò÷åòå î ïîèñêå: ÅÐ 0675520 À1, 04.10.1995. SU 141920 A1, 30.08.1985. SU 1601657 A2, 23.10.1990. RU 2071618 C1, 10.01.1997. JP 04-149954 A, 22.05.1992. JP 2000-133201 A, 12.05.2000. US 4628198 A, 09.12.1986. WO 0075950 A1, 14.12.2000. (86) Çà âêà PCT: IT 02/00711 (11.11.2002) C 2 C 2 (85) Äàòà ïåðåâîäà çà âêè PCT íà íàöèîíàëüíóþ ôàçó: 15.06.2004 R U 2 2 9 9 4 9 5 (87) Ïóáëèêàöè PCT: WO 03/044827 (30.05.2003) Àäðåñ äë ïåðåïèñêè: 129010, Ìîñêâà, óë. Á. Ñïàññêà ...

Virtual cathode deposition (VCD) for thin film production

Radio frequency (RF) power coupling system utilizing multiple RF power coupling elements for control of plasma properties

A radio frequency (RF) power coupling system is provided. The system has an RF electrode configured to couple RF power to plasma in a plasma processing system, multiple power coupling elements configured to electrically couple RF power at multiple power coupling locations on the RF electrode, and an RF power system coupled to the multiple power coupling elements, and configured to couple an RF power signal to each of the multiple power coupling elements. The multiple power coupling elements include a center element located at the center of the RF electrode and peripheral elements located off-center from the center of the RF electrode. A first peripheral RF power signal differs from a second peripheral RF power signal in phase.

Industrial hollow cathode with radiation shield structure

In accordance with one embodiment of the present invention, the hollow-cathode apparatus comprises a small-diameter tantalum tube with a plurality of tantalum-foil radiation shields, wherein the plurality of shields in turn comprise one or more spiral windings external to that tube and approximately flush with the open end from which electron emission takes place. The axial length of at least one of the inner windings (closer to the tantalum tube) is equal to or less than approximately half the length of the tantalum tube. An enclosed keeper surrounds the cathode. To start the cathode, a flow of ionizable inert gas, usually argon, is initiated through the cathode and out the open end. An electrical discharge is then started between the keeper and the hollow cathode. When heated to operating temperature, electrons exit from the open end of the hollow cathode.

Electrode for producing a plasma, plasma chamber having said electrode, and method for analyzing or processing a layer or the plasma in situ

Die Erfindung betrifft eine rf-Elektrode für die Erzeugung eines Plasmas in einer Plasmakammer, gekennzeichnet durch eine optische Durchführung. Die Erfindung betrifft ferner eine Plasmakammer, umfassend eine rf-Elektrode und eine Gegenelektrode mit einem Substrathalter zur Aufnahme eines Substrats, wobei zwischen der rf-Elektrode und der Gegenelektrode ein Hochfrequenzwechselfeld zur Erzeugung des Plasma ausgebildet werden kann. Die Kammer ist gekennzeichnet durch eine rf-Elektrode mit einer optischen Durchführung. Die Erfindung betrifft ferner ein Verfahren zur in situ-Analyse oder in situ-Bearbeitung einer Schicht oder eines Plasmas in einer Plasmakammer, wobei die Schicht auf einer Gegenelektrode angeordnet ist und auf der der Schicht zugewandten Seite eine rf-Elektrode angeordnet ist. Das Verfahren ist gekennzeichnet durch die Wahl einer rf-Elektrode mit einer optischen Durchführung, und durch mindestens einen Schritt, bei dem elektromagnetische Strahlung zum Zweck der Analyse oder der Bearbeitung der Schicht oder des Plasmas durch die optische Durchführung geleitet wird, und durch mindestens einen weiteren Schritt, bei der die gestreute oder emittierte oder reflektierte Strahlung einem Analysegerät zugeführt wird.

Electron tube device and electron tube

내용 없음. No content.

A method and apparatus for forming a magnetic film on a substrate

A method of forming a magnetic structure on a substrate 44 by depositing a matrix material onto a substrate and depositing magnetic particles onto the matrix as it forms where each magnetic particle comprises a core at least partially covered with a layer of metal. Apparatus for performing the method comprises an atomic beam of matrix material (e.g. generated by sputtering an evaporator such as an MBE source 32) and a beam of magnetic particles from a cluster source 34 such as a gas aggregation source. The magnetic particles are passed through at least one thermal evaporator 36 & 38 to apply the metal coating. The particles are then passed through a venturi 40 by which they are accelerated towards the substrate 44

Cup-shaped discharge electrode of cold cathode discharge tube and clad material for the discharge electrode

Biocompatible electrode component and method for fabrication thereof

Structure and fabrication of electron-emitting device having electrode with openings that facilitate short-circuit repair

An electrode (12 or 30) of an electron-emitting device has a plurality of openings (16 or 60) spaced laterally apart from one another. The openings can be used, as needed, in selectively separating one or more parts of the electrode from the remainder of the electrode during corrective test directed towards repairing any short-circuit defects that may exist between the electrode and other overlying or underlying electrodes. When the electrode with the openings is an emitter electrode (12), each opening (16) normally extends fully across an overlying control electrode (30). When the electrode with the openings is a control electrode (30), each opening (60) normally extends fully across an underlying emitter electrode (12). The short-circuit repair procedure typically entails directing light energy on appropriate portions of the electrode with the openings.

Hollow cathode with integrated getter for discharge lamps and methods for the realization thereof

Anode lead for high voltage rectifiers

Magnetic structures

The present invention relates to a process of and apparatus for forming a magnetic structure on a substrate (44) and also a magnetic structure formed by such a process and apparatus. The magnetic structure comprises a matrix in which magnetic particles are embedded. Apparatus (30) for forming the magnetic structure on the substrate (44) comprises a source of matrix material ( 32) which is operable to deposit the matrix material onto the substrate to thereby form the matrix. The apparatus (30) for forming the magnetic structure further comprises a source of magnetic particles (34) which is operable to deposit the magnetic particles onto the matrix as the matrix forms to thereby embed the magnetic particles in the matrix. Each magnetic particle comprises a core covered at least in part with a layer of metal, at least one of the matrix material and the core is of ferromagnetic material and the core and the layer of metal are of different materials.

Transparent carbon nanotube electrode using conductive dispersant and production method thereof

Disclosed is a transparent carbon nanotube (CNT) electrode using a conductive dispersant° The transparent CNT electrode comprises a transparent substrate and a CNT thin film formed on a surface the transparent substrate wherein the CNT thin film is formed of a CNT composition comprising CNTs and a doped dispersant. Further disclosed is a method for producing the transparent CNT electrode. The transparent CNT electrode exhibits excellent conductive properties, can be produced in an economical and simple manner by a room temperature wet process, and can be applied to flexible displays. The transparent CNT electrode can be used to fabricate a variety of devices, including image sensors, solar cells, liquid crystal displays, organic electroluminescence (EL) displays and touch screen panels, that are required to have both light transmission properties and conductive properties.

HOLLOW CATHODE WITH AN INTEGRATED GAS-ABSORBOR FOR GAS DISCHARGE LAMPS, AND WAYS OF ITS IMPLEMENTATION

ÐÎÑÑÈÉÑÊÀß ÔÅÄÅÐÀÖÈß (19) RU (51) ÌÏÊ 7 (11) 2004 117 872 (13) A H 01 J 61/00 ÔÅÄÅÐÀËÜÍÀß ÑËÓÆÁÀ ÏÎ ÈÍÒÅËËÅÊÒÓÀËÜÍÎÉ ÑÎÁÑÒÂÅÍÍÎÑÒÈ, ÏÀÒÅÍÒÀÌ È ÒÎÂÀÐÍÛÌ ÇÍÀÊÀÌ (12) ÇÀßÂÊÀ ÍÀ ÈÇÎÁÐÅÒÅÍÈÅ (21), (22) Çà âêà: 2004117872/09, 11.11.2002 (71) Çà âèòåëü(è): ÑÀÅÑ ÃÅÒÒÅÐÑ Ñ.Ï.À. (IT) (30) Ïðèîðèòåò: 12.11.2001 IT MI1A002389 (43) Äàòà ïóáëèêàöèè çà âêè: 10.10.2005 Áþë. ¹ 28 (86) Çà âêà PCT: IT 02/00711 (11.11.2002) (74) Ïàòåíòíûé ïîâåðåííûé: Åãîðîâà Ãàëèíà Áîðèñîâíà Àäðåñ äë ïåðåïèñêè: 129010, Ìîñêâà, óë. Á.Ñïàññêà , 25, ñòð.3, ÎÎÎ "Þðèäè÷åñêà ôèðìà Ãîðîäèññêèé è Ïàðòíåðû", ïàò.ïîâ. Ã.Á. Åãîðîâîé R U Ôîðìóëà èçîáðåòåíè 1. Ïîëûé êàòîä (20; 30; 40), ñôîðìèðîâàííûé ñ ïîìîùüþ öèëèíäðè÷åñêîé ïîëîé ÷àñòè (12), çàêðûòîé íà ïåðâîì êîíöå (13) è îòêðûòîé íà ïðîòèâîïîëîæíîì êîíöå (14) è â êîòîðîé è íà âíåøíåé, è íà âíóòðåííåé ÷àñò õ öèëèíäðè÷åñêîé ïîâåðõíîñòè ïðèñóòñòâóåò ñëîé ãàçîïîãëîùàþùåãî ìàòåðèàëà (21; 31; 41; 41'), îòëè÷àþùèéñ òåì, ÷òî óêàçàííûå ÷àñòè öèëèíäðè÷åñêîé ïîâåðõíîñòè îáðàùåíû ê ëàìïîâîé çîíå, â êîòîðîé ïðîèñõîäèò ðàçð ä, è òåì, ÷òî óêàçàííûé ñëîé ãàçîïîãëîùàþùåãî ìàòåðèàëà ñôîðìèðîâàí îñàæäåíèåì ìåòîäîì êàòîäíîãî ðàñïûëåíè . 2. Ïîëûé êàòîä ïî ï.1, îòëè÷àþùèéñ òåì, ÷òî óêàçàííà öèëèíäðè÷åñêà ïîëà ÷àñòü âûïîëíåíà èç ìåòàëëà. 3. Ïîëûé êàòîä ïî ï.2, îòëè÷àþùèéñ òåì, ÷òî óêàçàííûé ìåòàëë âûáðàí èç ãðóïïû ìåòàëëîâ, ñîñòî ùåé èç íèêåë , ìîëèáäåíà, òàíòàëà èëè íèîáè . 4. Ïîëûé êàòîä ïî ï.1, îòëè÷àþùèéñ òåì, ÷òî óêàçàííûé ñëîé ãàçîïîãëîùàþùåãî ìàòåðèàëà ñôîðìèðîâàí èç ìåòàëëà, âûáðàííîãî èç ãðóïïû, ñîñòî ùåé èç òèòàíà, âàíàäè , èòòðè , öèðêîíè , íèîáè , ãàôíè è òàíòàëà; èëè èç ñïëàâà íà îñíîâå öèðêîíè èëè òàíòàëà ñ îäíèì, èëè áîëåå ýëåìåíòîâ, âûáðàííûõ èç ÷èñëà ïåðåõîäíûõ ìåòàëëîâ è àëþìèíè . 5. Ïîëûé êàòîä ïî ï.1, îòëè÷àþùèéñ òåì, ÷òî óêàçàííûé ñëîé ãàçîïîãëîùàþùåãî ìàòåðèàëà èìååò òîëùèíó ìåíåå 20 ìêì. 6. Ïîëûé êàòîä ïî ï.1, îòëè÷àþùèéñ òåì, ÷òî ÷àñòè÷íîå ïîêðûòèå è âíóòðåííåé, è âíåøíåé ïîâåðõíîñòåé óêàçàííîé öèëèíäðè÷åñêîé ïîëîé ÷àñòè âûïîëíåíî ìàñêèðîâàíèåì Ñòðàíèöà: 1 RU ...

Cascade voltage amplifier and method of activating cascaded electron tubes.

Se describe un amplificador de tensión en cascada para producir una salida amplificada en forma de onda de impulso o continua que comprende al menos una etapa no final con un tubo electrónico configurado como un conmutador y una estructura de amplificación Clase A o C. Una etapa final comprende un tubo electrónico configurado como una estructura de amplificación Clase A o C. La al menos una etapa no final y la etapa final se conectan en serie, y la salida amplificada tiene una tensión de al menos 1000 voltios. Se describe además un método para activar una pluralidad de etapas de tubos electrónicos en cascada dentro de una alojamiento al vacío común. De manera benéfica, una cantidad suficiente de energía suministrada a la primera etapa se propaga en serie a través de cualquier etapa intermedia hasta la etapa final a fin de facilitar la activación de todas las etapas del tubo.

Discharge device having cathode with micro hollow array

A discharge device for operation in a gas at a prescribed pressure includes a cathode having a plurality of micro hollows therein, and an anode spaced from the cathode. Each of the micro hollows has dimensions selected to produce a micro hollow discharge at the prescribed pressure. Preferably, each of the micro hollows has a cross-sectional dimension that is on the order of the mean free path of electrons in the gas. Electrical energy is coupled to the cathode and the anode at a voltage and current for producing micro hollow discharges in each of the micro hollows in the cathode. The discharge device may include a discharge chamber for maintaining the prescribed pressure. A dielectric layer may be disposed on the cathode when the spacing between the cathode and the anode is greater than about the mean free path of electrons in the gas. Applications of the discharge device include fluorescent lamps, excimer lamps, flat fluorescent light sources, miniature gas lasers, electron sources and ion sources.

Cathode for electron tube

Field emission assisted microdischarge devices

Field emission nanostructures assist operation of a microdischarge device. The field emission nanostructures are integrated into the microdischarge device(s) or are situated near an electrode of the microdischarge device(s). The field emission nanostructures reduce operating and ignition voltages compared to otherwise identical devices lacking the field emission nanostructures, while also increasing the radiative output of the microdischarge device(s).

Electron discharge device

Improvements in and relating to anode leads for high voltage current rectifiers

555,116. Current rectifiers. AKT.-GES, BROWN, BOVERI, & CIE. Oct. 2, 1940. No 14809. Convention date, Aug. 22, 1939. [Class 39 (i)] In an anode assembly for gas or vapour hightension current rectifiers, of the kind comprising a stem or rod 3 carrying the anode 4 and secured to the top of a hollow insulator 2 mounted on the outside of the metallic rectifier casing 1, a series of overlapping cylindrical shields 7 of increasing diameter downwardly from shield to shield is provided, the radial distances between the shields and the amounts of their overlap being so selected that charge carriers do not pass between them to the insulator, and a field having an approximately uniform voltage drop over the insulator is formed. As shown, the insulator is of conical form and provided with internal flanges to which the shields are secured. The lowermost shield is secured to an arc-guiding sleeve 8 surrounding the anode. Preferably heating means for preventing condensation is arranged either on the outside of the insulator, or is provided by so dimensioning The stem 3 that the power losses in it produce the desired heating.

Capacitors and radio frequency generators and other devices using them

Certain configurations of a stable capacitor are described which comprise electrodes produced from materials comprising a selected coefficient of thermal expansion to enhance stability. The electrodes can be spaced from each other through one of more dielectric layers or portions thereof. In some instances, the electrodes comprise integral materials and do not include any thin films. The capacitors can be used, for example, in feedback circuits, radio frequency generators and other devices used with mass filters and/or mass spectrometry devices.

Cold electrode for gas discharges

The invention concerns cold electrodes for gas discharges with an electrically conductive carrier material (1) on which an emission coating (3) is disposed, the photoelectric output work of the material of the emission coating (3) being less than that of the carrier material (1) or less than 5.6*10-19 joule/electron. The emission coating (3) can in particular contain yttrium. The electrode preferably has the form of a hollow body and can be embedded in a glass body (8).

Capacitors and RF generators and other devices using the same

本发明描述了稳定电容器的某些配置，其包括由包括选定热膨胀系数的材料制备的电极，以增强稳定性。所述电极可通过一个或多个介电层或其部分彼此间隔开。在一些情况下，所述电极包括整体材料并且不包括任何薄膜。所述电容器可用于例如反馈电路、射频发生器以及与滤质器和/或质谱装置一起使用的其他装置中。

Dielectric barrier discharge-type electrode structure for generating plasma having conductive body protrusion on electrodes

Provided is a dielectric barrier discharge-type electrode structure for generating plasma. The electrode structure, according to the present invention, comprises: an upper conductive body electrode and a lower conductive body electrode; at least one conductive body electrode protrusion portion, which is formed on at least one surface of the upper conductive body electrode and/or the lower conductive body electrode; a dielectric layer which is formed on at least one of the inner surfaces of the upper conductive body electrode and the lower conductive body electrode that face each other, so as to have a substantially uniform thickness; and a specific gap (d) which is formed between the upper and lower conductive body electrodes and the dielectric layer, or between dielectric layers, due to the protruding effect of the conductive body electrode protrusion portion when the upper conductive body electrode and the lower conductive body electrodes come into close contact, wherein the plasma is generated by applying a pulse power or an alternating power to the upper conductive body electrode and the lower conductive body electrode.

Electrode of electrostatic lens and method of manufacturing the same

An electrode to be used for an electrostatic lens, wherein the electrode at least includes: a first substrate having a first through-hole and a second substrate having a second through-hole; the first substrate having a thickness smaller than the second substrate; the first through-hole having a diameter smaller than the second through-hole; the second substrate having a specific resistance smaller than the first substrate, wherein the first substrate and the second substrate are superimposed so that the first through-hole and the second through-hole are aligned relative to each other. Notching taking place near any of the through-holes in a dry etching process can be reduced, and thus, the through-holes can be formed accurately.

Electron generator

【課題】電子発生装置を提供する。【解決手段】本発明によれば、支持板１５１と、支持板に結合される多数の放電ピン１５５と、多数の放電ピンのうち２つ以上の隣接する放電ピンを含む放電ピン群を電気的に連結し、支持板に結合される弾性接続部材１５８と、を備える放電ピンモジュール１５０；多数の放電ピンと対向して配される放電板１６０；支持板を挟んで、放電板の反対側に位置し、放電ピンモジュール及び放電板が分離可能に結合される結合板１４５を備える支持構造物１４０；結合板を挟んで、放電ピンモジュールの反対側に結合板と離隔して位置するメインボード１３１と、メインボードに接続されて、放電ピン群に個別的な高電圧、高周波パルス電源を印加する多数の分散処理ボード１３５と、を備える回路モジュール１３０；を含み、結合板は、多数の分散処理ボードのそれぞれと電気的に連結される多数の接続突起１４６を備え、弾性接続部材の先端は、接続突起と接触することを特徴とする電子発生装置が提供される。【選択図】図２

Particle-optical systems and arrangements and particle-optical components for such systems and arrangements

A particle-optical arrangement, comprising: at least one charged-particle source 329 for generating at least one beam 309 of charged particles, at least one multi-aperture plate 313 having a plurality of apertures formed in the plate, wherein the plurality of apertures being arranged in a first pattern, wherein a plurality of charged-particle beamlets 3 is formed from the beam of charged particles downstream of the aperture plate; and a first focusing lens 303 providing a focusing field in a region between the charged-particle source and the multi-aperture plate; wherein the beam of charged particles is a divergent beam 311 in a region immediately upstream of the multi-aperture plate.

Method and apparatus for a porous electrospray emitter

An ionic liquid ion source can include a microfabricated body including a base and a tip. The body can be formed of a porous material compatible with at least one of an ionic liquid or room-temperature molten salt. The body can have a pore size gradient that decreases from the base of the body to the tip of the body, such that the at least one of an ionic liquid or room-temperature molten salt is capable of being transported through capillarity from the base to the tip.

Magnetic structure

Partially insulated cathode

A partially-insulated cathode for exciting plasma in a plasma chamber is provided. The partially-insulated cathode includes a conductive structure enclosing a cavity having a cavity surface and an insulating material contiguously covering a portion of the cavity surface from the cavity opening up to an insulation height that is less than a cavity height. Cross-sections of the cavity in X-Y planes have at least one respective cavity-width. A cavity opening has a diameter less than a minimum cavity-width of the at least one cavity-width.

Electrode and method of manufacturing the same

A low-resistance, fine electrode is formed by baking in air a photosensitive paste which has an inorganic component containing copper powder, boron powder, and glass frit, and an organic component containing a photopolymerization initiator, monomer, and organic vehicle, and in which the average particle size of the copper powder is 2.5 μm or less, and the content of boron powder based on the total amount of copper powder and boron powder is 8 to 25 wt%.

WATER DISTRIBUTABLE ALKYD RESINS AND AQUATIC DISPERSIONS THEREOF AND PROCEDURES FOR THE PREPARATION OF THESE DISPERSIONS

Design and manufacturing processes of long-life hollow cathode assemblies

A process for testing an impregnated insert of a Hollow Cathode Assembly (HCA) subsequent to every exposure of the HCA to air, and prior to ignition, using a heater and an oil-free assembly having a base pressure of less than 5.0x10<-6 >torr. The process comprises the steps of: installing the HCA in a vacuum; energizing the heater to a particular current level; de-energizing the heater after one-half hour; again energizing the heater to a particular current level; and de-energizing the heater for at least one-half hour.

Electrodes Of Plasma Display Panel And Fabrication Method Thereof

본 발명은 전극의 저항성분을 낮추고 고정세화할 수 있는 플라즈마 디스플레이 패널의 전극 및 그 제조방법에 관한 것이다. The present invention relates to an electrode of a plasma display panel capable of lowering and high definition of a resistance component of an electrode and a method of manufacturing the same. 본 발명에 따른 플라즈마 디스플레이 패널의 전극 제조방법은 임의의 기판 상에 금속박을 접합하고 에칭하여 버스전극을 형성하는 단계와, 버스전극과 그 주변을 포획하는 형태의 투명전극을 형성하는 단계를 포함하는 것을 특징으로 한다. An electrode manufacturing method of a plasma display panel according to the present invention includes forming a bus electrode by bonding and etching a metal foil on an arbitrary substrate, and forming a transparent electrode having a shape of capturing the bus electrode and its surroundings. It is characterized by. 본 발명에 의하면, 금속박을 이용하여 전극을 형성함으로써 전극의 폭이나 두께의 선택에 대한 제한이 거의 없으므로 전극을 미세선폭화하여 가시광선의 투과율을 향상시킬 수 있을 뿐만 아니라 버스전극 폭을 미세화하는 대신 두께를 두껍게 형성함으로써 저항성분을 낮추어 플라즈마 디스플레이 패널의 전력소모를 줄일 수 있게 된다. According to the present invention, since the electrode is formed using a metal foil, there is almost no restriction on the selection of the width or thickness of the electrode. Therefore, the electrode can be fine-lined to improve the transmittance of visible light and to reduce the thickness of the bus electrode. By forming a thicker it is possible to lower the resistance component to reduce the power consumption of the plasma display panel.