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Небесная энциклопедия

Космические корабли и станции, автоматические КА и методы их проектирования, бортовые комплексы управления, системы и средства жизнеобеспечения, особенности технологии производства ракетно-космических систем

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Мониторинг СМИ

Мониторинг СМИ и социальных сетей. Сканирование интернета, новостных сайтов, специализированных контентных площадок на базе мессенджеров. Гибкие настройки фильтров и первоначальных источников.

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Поддерживает ввод нескольких поисковых фраз (по одной на строку). При поиске обеспечивает поддержку морфологии русского и английского языка
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Применить Всего найдено 2185. Отображено 100.
21-03-2013 дата публикации

SHIELDED CAPACITIVE ELECTRODE

Номер: US20130068963A1
Автор: Kireeff Covo Michel
Принадлежит: The Regents of the University of California

A device is described, which is sensitive to electric fields, but is insensitive to stray electrons/ions and unlike a bare, exposed conductor, it measures capacitively coupled current while rejecting currents due to charged particle collected or emitted. A charged particle beam establishes an electric field inside the beam pipe. A grounded metallic box with an aperture is placed in a drift region near the beam tube radius. The produced electric field that crosses the aperture generates a fringe field that terminates in the back surface of the front of the box and induces an image charge. An electrode is placed inside the grounded box and near the aperture, where the fringe fields terminate, in order to couple with the beam. The electrode is negatively biased to suppress collection of electrons and is protected behind the front of the box, so the beam halo cannot directly hit the electrode and produce electrons. The measured signal shows the net potential (positive ion beam plus negative electrons) variation with time, as it shall be observed from the beam pipe wall. 1. A sensor for the measurement of a potential of an ion beam including:a faceplate having a front wall and back wall, the faceplate defining an aperture; andan electrode mounted to the back wall of the faceplate, concentric to the aperture defined by the faceplate, wherein the electrode is configured to capacitively couple to fringe fields associated with the ion beam.2. The sensor of wherein the sensor includes a box claim 1 , and wherein the faceplate comprises a side of the box.3. The sensor of wherein the faceplate is configured to be grounded.4. The sensor of wherein the aperture of the sensor is in the form of a rectangle.5. The sensor of wherein the width-to-length aspect ratio of the rectangle is about 2/1 to 5/1.6. The sensor of wherein the electrode is mounted to an insulating layer claim 1 , and wherein the insulating layer is mounted to the back wall of the faceplate.7. The sensor of wherein ...

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Номер записи: 1
18-04-2013 дата публикации

Ion generator and air cleaner

Номер: US20130095000A1
Автор: Akira Yamamoto, Motoyuki Suzuki, Naoki Wada
Принадлежит: Japan Cash Machine Co Ltd, Sharp Corp

A casing, including an inlet through which air can flow in and outlets through which air can flow out, is internally provided with: an air passage through which the inlet and the outlets are connected to each other; and an ion generation device for discharging ions into the air passage. The casing has an inclined wind guide surface and an attachment surface that forms an acute angle with the wind guide surface. The inlet is provided in a region of the wind guide surface, the distance of which from the attachment surface is shorter, the first outlet is provided in a region of the wind guide surface, the distance of which from the attachment surface is longer, and the second outlet is provided in a region of the casing, extending to the attachment surface from an end of the wind guide surface at which the first outlet is provided.

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Номер записи: 2
02-05-2013 дата публикации

METHODS AND APPARATUS FOR DETECTING NEUTRAL CHEMICAL UNITS VIA NANOSTRUCTURES

Номер: US20130105686A1
Автор: Golovchenko Jene A., Goodsell Anne L., Hau Lene V.
Принадлежит:

Suspended nanotubes are used to capture and ionize neutral chemical units, such as individual atoms, molecules, and condensates, with excellent efficiency and sensitivity. Applying a voltage to the nanotube(s) (with respect to a grounding surface) creates an attractive potential between a polarizable neutral chemical unit and the nanotube that varies as 1/r2, where r is the unit's distance from the nanotube. An atom approaching the nanotube with a sub-threshold angular momentum is captured by the potential and eventually spirals towards the nanotube. The atom ionizes as in comes into close proximity with a sidewall of the nanotube, creating an ion whose polarity matches the polarity of the electric potential of the nanotube. Repulsive forces eject the ion, which can be detected more easily than a neutral chemical unit. Suspended nanotubes can be used to detect small numbers of neutral chemical units (e.g., single atoms) for applications in sensing and interferometry. 1. A method of ionizing a neutral chemical unit , the method comprising: A1) capture a neutral chemical unit at a position along a length of the nanostructure within the electric field;', 'A2) ionize the neutral chemical unit at the position along the length of the nanostructure to generate a charged chemical unit; and', 'A3) eject the charged chemical unit from the vicinity of the nanostructure., 'A) applying a charging voltage between a substantially one-dimensional nanostructure and a reference potential to create an electric field in a vicinity of the nanostructure, so as to2. The method of claim 1 , wherein A) comprises applying a charging voltage greater than about 200 V.3. The method of claim 1 , wherein A) comprises selecting the charging voltage such that the electric field is at least about 3 V/nm.4. The method of claim 1 , wherein A) comprises varying the charging voltage as a function of time.5. The method of claim 4 , further comprising detecting the charged chemical unit ejected in A3) as ...

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Номер записи: 3
09-05-2013 дата публикации

AIR CONDITIONER AND ION GENERATION DEVICE

Номер: US20130112299A1
Автор: Kanazawa Yukimasa
Принадлежит: SHARP KABUSHIKI KAISHA

An ion generator is provided with a casing configured to form a flow path for air and an ion generation unit detachably disposed in the casing and configured to discharge ions into the air. The ion generation unit is provided with a front face-side ion generation section and a rear face-side ion generation section which are disposed with a spacing there between, and a connection cover section configured to connect the front face-side ion generation section and the rear face-side ion generation section. One end of the front face-side ion generation section and one end of the rear face-side ion generation section are positioned to be separated from each other in the flow path. The other end of the front face-side ion generation section and the other end of the rear face-side ion generation section are connected to each other by the connection cover section. 1. An air conditioner comprising:a main body section configured to form a flow path for air; andan ion generation device detachably disposed in said main body section and configured to discharge ions into the air circulating in said flow path, whereinsaid ion generation device is provided with a first ion generation section and a second ion generation section which are disposed with a spacing therebetween and are configured to generate ions, and a connection section configured to connect said first ion generation section and said second ion generation section; andsaid first ion generation section and said second ion generation section include one ends which are positioned to be separated from each other in said flow path and the other ends which are connected to each other by said connection section.2. The air conditioner according to claim 1 , whereinsaid main body section includes an inner wall configured to define said flow path, andsaid main body section is formed with a recess section recessed from said inner wall for housing said connection section.3. The air conditioner according to claim 2 , wherein said ...

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Номер записи: 4
09-05-2013 дата публикации

In-line corona-based gas flow ionizer

Номер: US20130112892A1
Автор: Leslie W. Partridge, Lyle Dwight NELSON, Peter Gefter
Принадлежит: ILLINOIS TOOL WORKS INC

Self-balancing, corona discharge for the stable production of electrically balanced and ultra-clean ionized gas streams is disclosed. This result is achieved by promoting the electronic conversion of free electrons into negative ions without adding oxygen or another electronegative gas to the gas stream. The invention may be used with electronegative and/or electropositive or noble gas streams and may include the use of a closed loop corona discharge control system.

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Номер записи: 5
16-05-2013 дата публикации

Methods and apparatuses for cleaning at least one surface of an ion source

Номер: US20130118523A1
Автор: John Allison
Принадлежит: Kratos Analytical Ltd

The present invention is concerned with methods and apparatus for cleaning the surface of an ion source in a mass spectrometer, for example an electrode of a MALDI ion source. The method includes directing UV light onto the surface to desorb contaminant material. The UV light source can be a laser and a moving reflecting surface can be used to direct the light on to the surface.

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Номер записи: 6
16-05-2013 дата публикации

Ion Wind Generator and Ion Wind Generating Device

Номер: US20130119264A1
Автор: Makino Hiroshi, Tojyo Tetsuya, Yagi Takashige
Принадлежит: KYOCERA CORPORATION

Provided is an ion wind generator capable of diversifying either or both of the amount of wind or wind direction. An ion wind generator is provided with a first electrode, a second electrode having a downstream area which is arranged at a position in a plan view shifted from first electrode towards the positive side in the x direction, and a dielectric between the first electrode and the second electrode. In a plane view, the distance (d) in the x-direction from a downstream side edge of the first electrode to the downstream side edge of the downstream area differs in the y-direction which is perpendicular to the x-direction. 19-. (canceled)10. An ion wind generator comprising:a first electrode,a second electrode having a downstream area which is arranged at a position in a plan view shifted from the first electrode in a first direction, anda dielectric between the first electrode and the second electrode, wherein,in the plan view, a distance in the first direction from a downstream side edge of the first electrode to the downstream side edge of the downstream area differs in a second direction which is perpendicular to the first direction.11. The ion wind generator as set forth in claim 10 , wherein claim 10 , a length in the first direction of the downstream area is different in the second direction.12. The ion wind generator as set forth in claim 11 , wherein claim 11 , across the downstream side edge of the first electrode or the upstream side edge of the second electrode claim 11 , the downstream side part of the first electrode and the upstream side part of the second electrode overlap or are adjacent in the first direction or the distance between the two in the first direction is constant.13. The ion wind generator as set forth in claim 11 , wherein the downstream area is formed so that its length in the first direction becomes large at the center in the second direction.14. The ion wind generator as set forth in claim 12 , wherein the downstream area is ...

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Номер записи: 7
30-05-2013 дата публикации

Target for generating carbon ions and treatment apparatus using the same

Номер: US20130138184A1
Автор: Hyung Ju Park, Moon Youn Jung, Nam Soo Myung, Seunghwan Kim
Принадлежит: Electronics and Telecommunications Research Institute ETRI

Provided are a carbon ion generation target and a treatment apparatus including the same. The treatment apparatus includes a support member, a carbon ion generation target fixed to the support member, and a laser for irradiating laser beam into the carbon ion generation target to generate carbon ions from the carbon ion generation target, thereby projecting the carbon ions onto a tumor portion of a patient. Here, the carbon ion generation target includes a substrate and carbon thin films disposed on the substrate.

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Номер записи: 8
06-06-2013 дата публикации

MASS SPECTROMETER WITH SOFT IONIZING GLOW DISCHARGE AND CONDITIONER

Номер: US20130140453A1
Автор: Verenchikov Anatoly N., Zamyatin Anatoly
Принадлежит: LECO Corporation

An ion source () for a mass spectrometer comprising an ionizer () receiving an ionizer gas from an ionizer gas supply (), a conditioner () in communication with the ionizer (), a reactor () in communication with the conditioner () and adapted for communication with the mass spectrometer, the reactor () adapted to receive a sample from a sample supply in communication with the reactor (), wherein the conditioner () is sized to remove fast diffusing electrons from a flow of the ionizer gas from the glow discharge ionizer () to the reactor (). 112102. An ion source ( , ) for a mass spectrometer comprising:{'b': 18', '106', '16, 'an ionizer (, ) formatted to receive an ionizer gas from an ionizer gas supply ();'}{'b': 20', '18', '106, 'a conditioner () in communication with the at least one ionizer (, ); and'}{'b': 22', '110', '20', '22', '110', '24', '20', '18', '106', '22', '110, 'a reactor (, ) in communication with the conditioner () and formatted for communication with the mass spectrometer, the reactor (, ) formatted to receive a sample from a sample supply (), wherein the conditioner () is sized to remove fast diffusing electrons from a flow of the ionizer gas between the glow discharge ionizer (, ) and the reactor (, ).'}212102201810622110. The ion source ( claim 1 , ) of claim 1 , wherein the conditioner () is sized to provide a transfer time of the gas flow from the at least one ionizer ( claim 1 , ) to the reactor ( claim 1 , ) of between about 5 ms and about 10 ms.31210220. The ion source ( claim 1 , ) of claim 1 , wherein the conditioner () comprises a tube having a length of about 15 mm and an inner diameter of about 2 mm.412102202018106. The ion source ( claim 1 , ) of claim 1 , wherein the conditioner () comprises a tube and a product of an inner diameter of the conditioner () and a pressure of the at least one ionizer ( claim 1 , ) is at least 50 mm*mbar.512102181062842. The ion source ( claim 1 , ) of claim 1 , wherein the at least one ionizer ( claim ...

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Номер записи: 9
06-06-2013 дата публикации

Automatic Control System for Selection and Optimization of Co-Gas Flow Levels

Номер: US20130140473A1
Автор: Neil K. Colvin, Tseh-Jen Hsieh
Принадлежит: Axcelis Technologies Inc

An ion implantation system for improving performance and extending lifetime of an ion source is disclosed whereby the selection, delivery, optimization and control of the flow rate of a co-gas into an ion source chamber is automatically controlled.

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Номер записи: 10
13-06-2013 дата публикации

ION GENERATING DEVICE AND ELECTRICAL APPARATUS

Номер: US20130146781A1
Автор: Iwashita Yasuhiro, Sekoguchi Yoshinori, Sugano Minako
Принадлежит: SHARP KABUSHIKI KAISHA

An arrangement area of a transformer drive circuit, an arrangement area of a high-voltage transformer, and an arrangement area of an ion generating unit are two-dimensionally divided from each other in a casing. A connection terminal is electrically connected to the transformer drive circuit and is formed of a conductive film arranged to be exposed to the outside of the casing. Accordingly, an ion generating device whose size and thickness can be easily reduced and an electrical apparatus including the ion generating device can be provided. 1. An ion generating device comprising:a transformer drive circuit;a transformer driven by the transformer drive circuit to boost a voltage;an ion generating unit that generates either or both of positive ions and negative ions by receiving the voltage boosted by the transformer; anda casing that houses the transformer drive circuit, the transformer, and the ion generating unit,wherein an arrangement area of the transformer drive circuit, an arrangement area of the transformer, and an arrangement area of the ion generating unit are two-dimensionally divided from each other in the casing, andwherein the ion generating device further comprises a connection terminal that is electrically connected to the transformer drive circuit and formed of a conductive film arranged to be exposed to the outside of the casing.2. The ion generating device according to claim 1 , further comprising:a contact board on which the connection terminal is formed,wherein both ends of the contact board are supported by the casing so that the contact board is attached to the casing.3. The ion generating device according to claim 2 , further comprising:a drive circuit board that supports the transformer drive circuit; andan ion generating unit board that supports the ion generating unit,wherein at least one of the drive circuit board and the ion generating unit board is configured so as to support an inner surface of the contact board at a side opposite an ...

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Номер записи: 11
13-06-2013 дата публикации

Spatial Segregation of Plasma Components

Номер: US20130146782A1
Автор: Lane Glenn E.
Принадлежит:

A closed plasma channel (“CPC”) superconductor which, in a first embodiment, is comprised of an elongated, close-ended vacuum conduit comprising a cylindrical wall having a longitudinal axis and defining a transmission space for containing an ionized gas of vapor plasma (hereinafter “plasma components”), the plasma components being substantially separated into regionalized channels parallel to the longitudinal axis in response to a static magnetic field produced within the transmission space. Each channel is established along the entire length of the transmission space. At least one channel is established comprised primarily of free-electrons which provide a path of least resistance for the transmission of energy therethrough. Ionization is established and maintained by the photoelectric effect of a light source of suitable wavelength to produce the most conductive electrical transmission medium. Various embodiments of the subject method and apparatus are described including a hybrid system for the transmission of alternating current or, alternatively, multi-pole EM fields through the cylindrical wall and direct current or charged particles through the stratified channels. 1. A closed plasma channel apparatus , comprising:an ionization chamber comprising an ionization vessel having an ionization space under vacuum;an ionizer in operable communication with the ionization space for ionization of a plasma precursor gas or vapor confined within the ionization space into a low density plasma; anda static magnetic field within the ionization space for substantially separating the plasma into its constituent components, where each constituent component of the plasma occupies a separate region within the ionization space.2. The closed plasma channel apparatus of claim 1 , wherein the static magnetic field is produced by a close-ended Hallbach cylinder.3. The closed plasma channel apparatus of claim 1 , wherein the ionization vessel is a close-ended cylinder having a central ...

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Номер записи: 12
20-06-2013 дата публикации

NANOPOROUS VACUUM PUMP

Номер: US20130153763A1
Автор: Saint Andrew
Принадлежит: GBC SCIENTIFIC EQUIPMENT PTY. LTD.

The invention provides an element (), comprising: a nanoporous insulating film () (such as a thin nanoporous diamond film) and first and second conducting layers () on first and second opposed sides respectively of the film (). Also provided are a vacuum pump (), an ion source () and an ion trap (), each comprising such an element (). 1. A pump , comprising:a pumping element comprising: a nanoporous insulating film comprising a plurality of nanopores, and first and second conducting layers on first and second opposed sides respectively of said film; anda power supply configured to maintain a potential difference between said first and second conducting layers that produces a field ionizing electric field;wherein said pumping element supports a difference in gas pressure on said first and second conducting layers and supports field ionization by the electric field, and said electric field ionizes gas atoms or molecules in a proximity of said first conducting layer, transports said gas atoms or molecules once ionised through said first conducting layer into said nanopores, along said nanopores and through said second conducting layer.2. A pump as claimed in claim 1 , wherein the difference in gas pressure is one atmosphere.3. A pump as claimed in claim 1 , wherein said electric field is approximately 10 MV/cm.4. A pump as claimed in claim 1 , wherein the insulating film comprises a thin nanoporous diamond film or a thin nanoporous silicon nitride film.5. (canceled)6. A pump as claimed in claim 1 , wherein the first and second conducting layers comprise metallic layers or evaporatively deposited layers metallic layers.7. (canceled)8. An element as claimed in claim 1 , wherein said first and second conducting layers comprise molybdenum or gold.9. A pump as claimed in claim 1 , wherein the power supply is configured to maintain the first conducting layer at a negative potential relative to the second conducting layer.10. A pump as claimed in claim 1 , wherein the ...

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Номер записи: 13
27-06-2013 дата публикации

METHODS OF FORMING LAYERS

Номер: US20130161505A1
Автор: Pitcher Philip George
Принадлежит: SEAGATE TECHNOLOGY LLC

A system that includes an ion source, the ion source configured to produce ions having a first energy; an extractor to extract the ions; an accelerator configured to accelerate the ions; a focusing and steering device configured to focus and/or steer the accelerated ions; and a decelerator configured to decelerate the accelerated ions so that the ions have a second energy when they impact a substrate, wherein the second energy is less than the first energy. 1. A system comprising:an ion source, the ion source configured to produce ions having a first energy;an extractor to extract the ions;an accelerator configured to accelerate the ions;a focusing and steering device configured to focus and/or steer the accelerated ions; anda decelerator configured to decelerate the accelerated ions so that the ions have a second energy when they impact a substrate, wherein the second energy is less than the first energy.2. The system according to wherein the ion source is negatively biased.3. The system according to wherein the accelerator comprises accelerating electrodes or lens system.4. The system according to further comprising a beam shaper configured to shape the accelerated ions.5. The system according to claim 4 , wherein the beam shaper is a circular beam shaper or a slot beam shaper.6. The system according to further comprising a mass filter configured to select a portion of the accelerated ions based on the mass thereof7. The system according to claim 6 , wherein the mass filter is configured to allow selection of variable masses.8. The system according to claim 1 , wherein the system can be configured to vary the incident angle of the ions when they impact a substrate.9. The system of claim 1 , wherein the system is configured so that the second energy of the ions is from about 20 ev to about 100 ev.10. A system comprising:an ion source, the ion source configured to produce ions having a first energy;an extractor to extract the ions;an accelerator configured to ...

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Номер записи: 14
27-06-2013 дата публикации

SWITCHING MICRO-RESONANT STRUCTURES BY MODULATING A BEAM OF CHARGED PARTICLES

Номер: US20130161529A1
Автор: Davidson Mark, Gorrell Jonathan, Maines Michael E.
Принадлежит: ADVANCED PLASMONICS, INC.

When using micro-resonant structures, a resonant structure may be turned on or off (e.g., when a display element is turned on or off in response to a changing image or when a communications switch is turned on or off to send data different data bits). Rather than turning the charged particle beam on and off, the beam may be moved to a position that does not excite the resonant structure, thereby turning off the resonant structure without having to turn off the charged particle beam. In one such embodiment, at least one deflector is placed between a source of charged particles and the resonant structure(s) to be excited. When the resonant structure is to be turned on (i.e., excited), the at least one deflector allows the beam to pass by undeflected. When the resonant structure is to be turned off, the at least one deflector deflects the beam away from the resonant structure by an amount sufficient to prevent the resonant structure from becoming excited. 1. A modulated electromagnetic radiation emitter , comprising:a charged particle generator configured to generate a beam of charged particles;at least one resonant structure configured to resonate at at least one resonant frequency higher than a microwave frequency when exposed to the beam of charged particles, anda director for directing the beam of charged particles away from the at least one resonant structure when the resonant structure is not to resonate.2. The emitter according to claim 1 , wherein the director is one from the group consisting of: a deflector claim 1 , a diffractor claim 1 , or an optical structure.3. The emitter according to claim 1 , wherein the director comprises at least one deflection plate between the charged particle generator and the at least one resonant structure.4. The emitter according to claim 1 , wherein the generator comprises a plurality of charged particle sources.5. The emitter according to claim 1 , wherein the at least one resonant structure comprises at least one silver- ...

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Номер записи: 15
27-06-2013 дата публикации

LASER ION SOURCE

Номер: US20130161530A1
Автор: Hayashi Kazuo, KAKUTANI Akiko, KURUSU Tsutomu, OSANAI Akihiro, SATO Kiyokazu, YOSHIYUKI Takeshi
Принадлежит: KABUSHIKI KAISHA TOSHIBA

According to one embodiment, a laser ion source is configured to generate ions by application of a laser beam, the laser ion source including a case to be evacuated, an irradiation box disposed in the case and including a target which generates ions by irradiation of laser light, an ion beam extraction mechanism which electrostatically extracts ions from the irradiation box and guides the ions outside the case as an ion beam, a valve provided to an ion beam outlet of the case, the valve being opened at ion beam emission and being closed at other times, and a shutter provided between the valve and the irradiation box, the shutter being intermittently opened at ion beam emission and being closed at other times. 1. A laser ion source , comprising:a case to be evacuated;an irradiation box disposed in the case and comprising a target which generates ions by irradiation of laser light;an ion beam extraction mechanism which electrostatically extracts ions from the irradiation box and guides the ions outside the case as an ion beam;a valve provided to an ion beam outlet of the case, the valve being opened at ion beam emission and being closed at other times; anda shutter provided between the valve and the irradiation box, the shutter being intermittently opened at ion beam emission and being closed at other times.2. The laser ion source of claim 1 , wherein the ion beam extraction mechanism is an extraction electrode opposed to an ion ejection window of the irradiation box.3. The laser ion source of claim 1 , whereinthe laser light is intermittently emitted by pulse driving, andthe shutter is open for a predetermined period of time in synchronization with a drive pulse of the laser light.4. The laser ion source of claim 1 , whereinan exhaust outlet for vacuum evacuation of the case is provided in an upper surface of the case.5. The laser ion source of claim 4 , whereina blocking plate which covers the exhaust outlet when viewed from the irradiation box is provided at a ...

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Номер записи: 16
11-07-2013 дата публикации

TARGETS FOR GENERATING IONS AND TREATMENT APPARATUSES USING THE TARGETS

Номер: US20130178689A1
Автор: JUNG Moon Youn, KIM Seunghwan, LEE Hwang Woon, PARK Hyung Ju, PARK Seon Hee, PYO Hyeon-Bong, SHIN Dong-Ho
Принадлежит: Electronics and Telecommunications Research Institute

Provided is an ion beam treatment apparatus including the target. The ion beam treatment apparatus includes a substrate having a first surface and a second surface opposed to the first surface, and including a cone type hole decreasing in width from the first surface to the second surface to pass through the substrate, wherein an inner wall of the substrate defining the cone type hole is formed of a metal, an ion generation thin film attached to the second surface to generate ions by a laser beam incident into the cone type hole through the first surface and strengthen, and a laser that emits a laser beam to generate ions from the ion generation thin film and project the ions onto a tumor portion of a patient. The laser beam incident into the cone type hole is focused by the cone type hole and is strengthened. 1. An ion generation target comprising:a substrate having a first surface and a second surface opposed to the first surface, and comprising a cone type hole decreasing in width from the first surface to the second surface to pass through the substrate, wherein an inner wall of the substrate defining the cone type hole is formed of a metal; andan ion generation thin film attached to the second surface of the substrate to generate ions by means of a laser beam incident into the cone type hole through the first surface and strengthen.2. The ion generation target of claim 1 , wherein the substrate comprises a metal material.3. The ion generation target of claim 2 , wherein the metal material comprises silver claim 2 , copper claim 2 , gold claim 2 , or aluminum.4. The ion generation target of claim 1 , wherein the substrate comprises an insulating material.5. The ion generation target of claim 4 , further comprising a cone type metal thin film on an inner surface of the substrate exposed by the cone type hole.6. The ion generation target of claim 5 , wherein the cone type metal thin film comprises silver claim 5 , copper claim 5 , gold claim 5 , or aluminum.7. The ...

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Номер записи: 17
15-08-2013 дата публикации

Laser-Ablation Ion Source with Ion Funnel

Номер: US20130207000A1
Автор: Bodo Hattendordf, Detlef Günther, Rolf Dietiker, Tatiana Egorova, Victor Varentsov
Принадлежит: Eidgenoessische Technische Hochschule Zurich ETHZ

A laser-ablation ion source for generating a low energy ion beam having low longitudinal and transverse emittance, including a supersonic nozzle, followed by an RF ion funnel. A laser source generates a laser beam which is focused by a lens to an ablation site. The ablation site is located upstream of the nozzle, at a distance of less than 10 mm from the nozzle aperture. The laser irradiates the ablation site through the nozzle aperture to generate the ions.

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Номер записи: 18
22-08-2013 дата публикации

ION GENERATING DEVICE

Номер: US20130214173A1
Автор: KATO Kenichi, Kitahira Makoto, Namikawa Akihito, Noda Yoshiyuki, Shikata Kazushi
Принадлежит:

To prevent a reduction in an amount of an ion emission while preventing generation of electromagnetic noise. A high-voltage generating circuit section that supplies a high voltage to an ion generating element that generates ions is housed in a housing, and sealed with filled resin. An emission port for emitting the generated ions is formed in the housing, and an outer surface of the housing except the emission port is covered with a shield case. A passage port communicating with the emission port is formed in the shield case. A periphery of the passage port of the shield case is covered with an electrically insulating covering sheet so that emitted ions do not adhere to the shield case. The ions emitted from the emission port do not adhere to the shield case covered with the covering sheet. 17-. (canceled)8. An ion generating device , wherein a high-voltage generating circuit section that supplies a high voltage to an ion generating element that generates ions is housed in a housing , an emission port for emitting the generated ions is formed in the housing , an outer surface of the housing except the emission port is covered with a shield case , and the shield case is covered with an insulating section so that the emitted ions do not adhere to the shield case.9. The ion generating device according to claim 8 , wherein a passage port communicating with the emission port is formed in the shield case claim 8 , and the insulating section covers a periphery of the passage port.10. The ion generating device according to claim 8 , wherein a passage port communicating with the emission port is formed in the shield case claim 8 , and an end surface of the passage port is covered with the insulating section so as not to be exposed to the emission port.11. The ion generating device according to claim 10 , wherein a rib protruding outward is formed on a peripheral edge of the emission port in the housing claim 10 , and the rib is the insulating section that covers the end ...

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Номер записи: 19
26-09-2013 дата публикации

ION SOURCE DEVICE AND ION BEAM GENERATING METHOD

Номер: US20130249400A1
Автор: SATO Masateru
Принадлежит: SEN CORPORATION

An ion source device has a configuration in which a cathode is provided in an arc chamber having a space for plasma formation, and a repeller is disposed to face a thermal electron discharge face of the cathode by interposing the space for plasma formation therebetween. An external magnetic field that is induced by a source magnetic field unit is applied to the space for plasma formation in a direction parallel to an axis that connects the cathode and the repeller. An opening is provided in a place corresponding to a portion in the repeller with the highest density of plasma that is formed in the space for plasma formation, and an ion beam is extracted from the opening. 1. An ion source device for ion beam generation ,wherein a cathode that discharges thermal electrons for generating beam electrons that ionize neutral molecules is provided in an arc chamber having a space for plasma formation, and a repeller is disposed to face a thermal electron discharge face of the cathode by interposing the space for plasma formation therebetween,wherein an external magnetic field F that is induced by a source magnetic field unit is applied to the space for plasma formation in a direction parallel to an axis that connects the cathode and the repeller, andwherein an opening is provided in a place corresponding to a portion in the repeller with the highest density of plasma that is formed in the space for plasma formation, and an ion beam is extracted from the opening.2. The ion source device according to claim 1 , wherein an extraction direction of the ion beam is parallel to the axis that connects the cathode and the repeller.3. The ion source device according to claim 1 , wherein the opening is provided in a place facing an outlet opening of the ion beam of the arc chamber claim 1 , and the opening and the outlet opening of the ion beam have a circular shape.4. The ion source device according to claim 3 , wherein the opening has a size that is the same as or smaller than that ...

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Номер записи: 20
10-10-2013 дата публикации

CHARGED PARTICLE EMISSION GUN AND CHARGED PARTICLE RAY APPARATUS

Номер: US20130264496A1
Автор: Arai Noriaki
Принадлежит: HITACHI HIGH-TECHNOLOGIES CORPORATION

Provided is a charged particle emission gun with which cleaning of a tip is possible without stopping the operation of the charged particle emission gun for a long time and without heating the tip. The charged particle emission gun includes a cleaning photo-irradiation apparatus that generates ultraviolet light or infrared light to irradiate a tip, and an optical fiber for guiding the ultraviolet light or the infrared light toward the tip. The cleaning photo-irradiation apparatus generates ultraviolet light or an infrared light with a predetermined wavelength and intensity to desorb a molecule adsorbed on the tip through photon stimulated desorption, or to desorb a molecule adsorbed on the tip through photon stimulated desorption and ionize the desorbed molecule. 1. A charged particle emission gun comprising:a tip;an extracting electrode having a central hole that is coaxial with the tip;an ion collector arranged between the tip and the extracting electrode, the ion collector having a central hole that is coaxial with the tip;a vacuum chamber that accommodates therein the tip, the extracting electrode, and the ion collector;a cooling apparatus for cooling the tip; anda cleaning photo-irradiation apparatus that generates ultraviolet light or infrared light to irradiate the tip.2. The charged particle emission gun according to claim 1 , wherein the cleaning photo-irradiation apparatus has an infrared laser source that generates an infrared laser ray with a peak output on the order of MW/cmand a wavelength of 1 μm or greater.3. The charged particle emission gun according to claim 1 , wherein the cleaning photo-irradiation apparatus has an ultraviolet lamp that generates ultraviolet light with a continuous spectrum of a wavelength of 400 nm or less.4. The charged particle emission gun according to claim 1 , wherein the cleaning photo-irradiation apparatus has an ultraviolet laser source that generates an ultraviolet laser ray with a pulse width on the order of ...

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Номер записи: 21
24-10-2013 дата публикации

IONIZATION DEVICE

Номер: US20130277567A1
Автор: Allsworth Max D., Dardona Sameh, Mantese Joseph V., Piech Marcin
Принадлежит:

An exemplary ionization device includes a pyroelectric electron accelerator that causes electrons to move away from the accelerator. A silicon target is positioned in a path of the electrons. X-ray radiation results from the electrons colliding with the target. 1. An ionization device , comprising:a pyroelectric electron accelerator that causes electrons to move away from the accelerator; anda silicon target positioned in a path of the electrons for providing x-ray radiation resulting from the electrons colliding with the target, wherein the x-ray radiation has a wavelength such that the x-ray radiation ionizes gas molecules near the target.2. The device of claim 1 , comprisinga temperature control element associated with the accelerator, the temperature control element establishing a temperature that facilitates the electrons being emitted from the accelerator.3. The device of claim 2 , wherein the temperature control element comprises a heater.4. The device of claim 2 , wherein the temperature control element comprises a microcontroller.5. The device of claim 1 , comprisinga housing, the accelerator being supported within the housing and the silicon target is situated relative to the housing so that the electrons travel within the housing from the accelerator toward the target and the x-ray radiation travels outside of the housing.6. The device of claim 5 , comprisinga gas within the housing, the gas being at a pressure that facilitates electron acceleration within the housing from the accelerator toward the target.7. The device of claim 1 , whereinthe electrons moving between the accelerator and the target have an energy up to 60 KeV; andthe target attenuates the energy so that the x-ray radiation has an energy between 1 KeV and 3 KeV.8. The device of claim 7 , wherein the x-ray radiation energy is approximately 1.5 KeV.9. (canceled)10. A detector claim 7 , comprisinga detection chamber; andan ionization device adjacent the detection chamber, the ionization ...

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Номер записи: 22
31-10-2013 дата публикации

ION GENERATION IN MASS SPECTROMETERS BY CLUSTER BOMBARDMENT

Номер: US20130285552A1
Автор: DUERR Michael, Gebhardt Christoph
Принадлежит: Bruker Daltonik GmbH

The invention relates to devices and methods in mass spectrometers for the generation of ions of heavy molecules, especially biomolecules, by bombarding them with uncharged clusters of molecules. The analyte ions which are generated or released by cluster bombardment of analyte substances on the surface of sample support plates show a broad distribution of their kinetic energies, which prevents good ion-optical focusing. In the invention, the kinetic energies are homogenized in a higher-density collision gas. The collision gas is preferably located in an RF ion guide, more preferably an RF ion funnel, which can transfer the ions to the mass analyzer. The collision gas may be introduced with temporal pulsing, coordinated or synchronized with the pulsed supersonic gas jet. The collision gas may be pumped off again before the next supersonic gas pulse. In an advantageous embodiment, the collision gas can originate from the supersonic gas jet itself. 1. A method for generating analyte ions comprising:subjecting analyte substances on a sample support of an ion source of a mass spectrometer to a pulsed bombardment with uncharged molecular clusters to produce analyte ions; andhomogenizing kinetic energies of the analyte ions by decelerating the analyte ions with a collision gas in a deceleration region that is pulsed temporarily to a pressure above a pressure at which the sample support is held at least for a desired duration of the bombardment, the timing of the collision gas pulsing being coordinated with said pulsed cluster bombardment.2. The method according to claim 1 , wherein the sample support is held at a pressure of less than 10 pascal claim 1 , and the collision gas is pulsed temporarily to a pressure above 10 pascal.3. The method according to claim 1 , wherein the deceleration region is located in the interior of an RF ion guide.4. The method according to claim 3 , wherein the deceleration region is located in the interior of an RF ion funnel.5. The method ...

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Номер записи: 23
31-10-2013 дата публикации

TARGETS FOR GENERATING IONS AND TREATMENT APPARATUSES INCLUDING THE TARGETS

Номер: US20130289331A1
Автор: JUNG Moon Youn, KIM Seunghwan, MYUNG Nam Soo, PARK Hyung Ju, PYO Hyeon-Bong
Принадлежит: Electronics and Telecommunications Research Institute

Provided are an ion generation target and a treatment apparatus including the target. The treatment apparatus includes a grid having a net shape of nano wires, an ion generation thin film attached to a side of the grid and generating ions by means of an incident laser beam, and a laser for emitting a laser beam into the nano wire of the grid to generate ions from the ion generation thin film and project the ions onto a tumor portion of a patient. The laser beam emitted into the nano wire forms a near field, the intensity of which is higher than that of the laser beam through a nanoplasmonics phenomenon, and the near field emits the ions from the ion generation thin film. 1. An ion generation target comprising;a grid having a net shape of nano wires; andan ion generation thin film attached to a side of the grid and generating ions by means of an incident laser beam.2. The ion generation target of claim 1 , wherein the ion is a proton or a carbon ion.3. The ion generation target of claim 2 , wherein the ion is the proton claim 2 , and the ion generation thin film is formed of a material comprising hydrogen.4. The ion generation target of claim 3 , wherein the material comprising hydrogen is a silicon nitride claim 3 , a silicon oxide claim 3 , or a metal.5. The ion generation target of claim 2 , wherein the ion is the carbon ion claim 2 , and the ion generation thin film comprises graphene.6. The ion generation target of claim 1 , wherein the grid comprises silver claim 1 , copper claim 1 , gold claim 1 , or aluminum.7. The ion generation target of claim 1 , wherein the grid has a line width ranging from tens to hundreds nanometers.8. The ion generation target of claim 1 , further comprising a peripheral frame surrounding a periphery of the grid claim 1 ,wherein the ion generation thin film is attached to the peripheral frame.9. An ion beam treatment apparatus comprising:{'claim-ref': {'@idref': 'CLM-00001', 'claim 1'}, 'the ion generation target of ; and'}a laser for ...

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Номер записи: 24
14-11-2013 дата публикации

ION GENERATOR

Номер: US20130299717A1
Автор: FUKADA Yoshinari
Принадлежит: KOGANEI CORPORATION

In an ion generator, a flexible discharge electrode composed of one wire is provided to a base , and a turning motion of a free end of the discharge electrode about a fixed end of the discharge electrode is performed by repulsive force of a corona discharge generated by supplying a high voltage to the fixed end . Therefore, in comparison with a discharge electrode composed of a bundle of thin wires, it is possible to significantly reduce dust emission from the free end of the discharge electrode , and to further improve the ion generator in maintenance interval. Since the discharge electrode is compose of one wire, it is possible to reduce the discharge electrode in size, easily observe the state of the discharge electrode , and simplify its maintenance. Since the discharge electrode performs a turning motion, it is possible to transport the generated air ions EI to a wide area of a packaging film , and to enhance ionizing efficiency. 1. An ion generator comprising a flexible discharge electrode which is composed of one wire , and which has a fixed end and a free end ,wherein a turning motion of the free end about the fixed end is performed by repulsive force of a corona discharge generated by supplying a high voltage to the fixed end.2. The ion generator according to claim 1 , further comprising a turning-motion control member for controlling a turning motion of the discharge electrode.3. The ion generator according to claim 1 , wherein the discharge electrode is set to 100 micrometers or less in diameter size.4. The ion generator according to claim 1 , wherein the discharge electrode is formed of titanium alloy. The present invention relates to an ion generator for generating air ions which are used for neutralizing and eliminating static electricity from an electrically-charged object such as for example a jig for assembling electronic parts, and a packaging film made of plastic material.When a packaging film made of plastic material, a jig for assembling ...

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Номер записи: 25
28-11-2013 дата публикации

EXCITED GAS INJECTION FOR ION IMPLANT CONTROL

Номер: US20130313443A1
Автор: Bassom Neil J., Benveniste Victor, Chaney Craig R., Koo Bon-Woong, Rowland Christopher A., SINCLAIR Frank
Принадлежит: VARIAN SEMICONDUCTOR EQUIPMENT ASSOCIATES, INC.

An ion source includes an ion chamber housing defining an ion source chamber, the ion chamber housing having a side with a plurality of apertures. The ion source also includes an antechamber housing defining an antechamber. The antechamber housing shares the side with the plurality of apertures with the ion chamber housing. The antechamber housing has an opening to receive a gas from a gas source. The antechamber is configured to transform the gas into an altered state having excited neutrals that is provided through the plurality of apertures into the ion source chamber. 1. An ion source comprising:an ion chamber housing defining an ion source chamber, the ion chamber housing having a side with a plurality of apertures; andan antechamber housing defining an antechamber, the antechamber housing sharing the side with the plurality of apertures with the ion chamber housing, the antechamber housing having an opening to receive a gas from a gas source, wherein the antechamber is configured to transform the gas into an altered state comprising excited neutrals that is provided through the plurality of apertures into the ion source chamber.2. The ion source of claim 1 , further comprising a source magnet positioned proximate the ion source chamber housing and the antechamber housing claim 1 , the source magnet configured to provide a magnetic field for both the ion source chamber and the antechamber.3. The ion source of claim 1 , wherein the ion source chamber comprises a first cathode configured to emit electrons into the ion source chamber that interacts with the gas in the altered state to generate plasma in the ion source chamber.4. The ion source of claim 3 , wherein the antechamber comprises a second cathode configured to emit electrons into the antechamber that interact with the gas to transform the gas into the altered state.5. The ion source of claim 1 , wherein the plurality of apertures has a quantity and dimension to enable the antechamber to operate over an ...

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Номер записи: 26
05-12-2013 дата публикации

ALIGNMENT OF AN ATOM BEAM WITH AN ELECTRIC FIELD IN THE PRODUCTION OF A CHARGED PARTICLE SOURCE

Номер: US20130320202A1
Автор: Knuffman Brenton, McClelland Jabez, Steele Adam
Принадлежит: United States of America, as represented by the Secretary of Commerce, NIST

A method for aligning the axis of an atom beam with the orientation of an electric field at a particular location within an enclosure for use in creating a charged particle source by photoionizing a cold atom beam. The method includes providing an atom beam in the enclosure, providing a plurality of electrically conductive devices in said enclosure, evacuating the enclosure to a pressure below about 10millibar, and aligning the axis of the atom beam with the orientation of the electric field, relative to each other, within less than about two degrees. Alignment may be facilitated by applying at least one voltage to the electrically conductive devices, mechanically tilting the atom beam's axis orientation of the electric field relative to each other and/or causing a deflection of the atom beam. 1. A method for aligning the axis of an atom beam with the orientation of an electric field at a particular location within an enclosure for use in a system for creating a charged particle source by photoionizing a cold atom beam , the method comprising:providing, by an atom beam creation device, an atom beam in the enclosure;providing a plurality of electrically conductive devices in said enclosure;providing an electric field;{'sup': '−6', 'evacuating the enclosure to a pressure below about 10millibar; and'}aligning the axis of the atom beam and the orientation of the electric field, at an angle relative to each other, within less than about two degrees.2. The method of claim 1 , wherein the electric field is generated by applying at least one voltage to the plurality of electrically conductive devices.3. The method of claim 2 , wherein the aligning step includes:adjusting the mechanical tilt of the plurality of electrically conductive devices until the atom beam axis and electric field are substantially aligned.4. The method of claim 2 , wherein the aligning step includes:adjusting the mechanical tilt of all or a portion of the atom beam creation device until the atom beam ...

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Номер записи: 27
19-12-2013 дата публикации

ION GENERATION DEVICE

Номер: US20130336838A1
Автор: WADDELL Charles Houston
Принадлежит:

The present invention provides methods and systems for an ion generation device that includes an elongate housing having a back portion and a pair of side portions extending from the back portion and forming a cavity therein. A conductive portion is disposed within the cavity and connected to a power supply for providing power to the conductive portion. A plurality of tines are engaged to the conductive portion. 1. An ion generation device , comprising:an elongate housing having a back portion and a pair of side portions extending from the back portion and forming a cavity therein;a conductive portion disposed within the cavity and connected to a power supply for providing voltage to the conductive portion; anda plurality of tines engaged to the conductive portion.2. The ion generation device of claim 1 , further comprising an extrusion disposed within the cavity of the housing.3. The ion generation device of claim 1 , wherein the plurality of tines are composed of a polypropylene impregnated with carbon.4. The ion generation device of claim 1 , wherein the tines are composed of a homopolypropylene impregnated with carbon.5. The ion generation device of claim 1 , further comprising an extrusion composed of UL V0 rated plastic having a hollow interior portion for receiving the power supply and conductive portion.6. The ion generation device of claim 1 , further comprising a shelf positioned on the inner portion of each side portion of the housing for receiving a first rib of the extrusion.7. The ion generation device of claim 1 , wherein the tines are spaced an equal distance apart along the length of the conductive portion.8. An ion generation device claim 1 , comprising:an elongate housing having a back portion and a pair of side portions having an interior portion and exterior portion and extending generally perpendicularly from the back portion and forming a cavity therein;an extrusion disposed within the cavity of the housing and having a hollow for receiving a ...

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Номер записи: 28
26-12-2013 дата публикации

IONIZATION METHOD, MASS SPECTROMETRY METHOD, EXTRACTION METHOD, AND PURIFICATION METHOD

Номер: US20130341279A1
Автор: Arakawa Ryuichi, Otsuka Yoichi
Принадлежит:

To achieve soft ionization more easily when a slight amount of substance is ionized under an atmosphere pressure. An ionization method for a substance contained in a liquid, including: supplying the liquid to a substrate from a probe and forming a liquid bridge made of the liquid containing the substance dissolved therein, between the probe and the substrate; oscillating the probe; and generating an electric field between an electrically conductive portion of the probe in contact with the liquid and an ion extraction electrode. 1. An ionization method for a substance contained in a liquid , comprising:(i) supplying the liquid onto a substrate from a probe and forming a liquid bridge made of the liquid containing the substance, between the probe and the substrate; and(ii) generating an electric field between an electrically conductive portion of the probe in contact with the liquid and an ion extraction electrode.2. The ionization method according to claim 1 , wherein one end of the probe is oscillated in a direction that intersects with an axis of the probe.3. The ionization method according to claim 1 , wherein a position of the one end of the probe is different between the (i) supplying and forming and the (ii) generating.4. The ionization method according to claim 1 , wherein claim 1 , in the (ii) generating claim 1 , the liquid forms a Taylor cone at an end of the probe.5. The ionization method according to claim 1 , wherein claim 1 , in the (ii) generating claim 1 , part of the liquid escapes as charged droplets from the end.6. The ionization method according to claim 5 , wherein the charged droplets escape from the Taylor cone.7. The ionization method according to claim 5 , wherein the charged droplets cause a Rayleigh fission.8. The ionization method according to claim 1 , wherein the probe includes a plurality of flow paths.9. The ionization method according to claim 1 , wherein the probe includes a protrusion.10. The ionization method according to claim 9 , ...

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Номер записи: 29
09-01-2014 дата публикации

LOW TEMPERATURE PLASMA PROBE AND METHODS OF USE THEREOF

Номер: US20140011282A1
Автор: Charipar Nicholas, Cooks Robert Graham, Harper Jason, Ouyang Zheng
Принадлежит: PURDUE RESEARCH FOUNDATION

The present invention generally relates to a low temperature plasma probe for desorbing and ionizing at least one analyte in a sample material and methods of use thereof. In one embodiment, the invention generally relates to a low temperature plasma probe including: a housing having a discharge gas inlet port, a probe tip, two electrodes, and a dielectric barrier, in which the two electrodes are separated by the dielectric barrier, in which application of voltage from a power supply generates a low temperature plasma, and in which the low temperature plasma is propelled out of the discharge region by the electric field and/or the discharge gas flow. 160-. (canceled)61. A low temperature plasma probe , the probe comprising:a hollow body having an open distal end;a discharge gas inlet port coupled to the body such that gas may be injected through the port and into the body; andan electrode at least partially disposed within the body; wherein the probe is configured such that injected gas interacts with the electrode to form a low temperature plasma that is ejected from the distal end of the body.62. The probe according to claim 61 , wherein the electrode is axially centered within the distal end of the body.63. The probe according to claim 61 , further comprising a power supply.64. The probe according to claim 61 , wherein a discharge gas is supplied to the probe through the discharge gas inlet port.65. The probe according to claim 61 , wherein the discharge gas assists in propelling the low temperature plasma out of the probe tip.66. The probe according to claim 61 , wherein the discharge gas is nitrogen.67. The probe according to claim 61 , wherein the probe is operably coupled to a sample stage such that low temperature plasma generated by the probe is directed from the probe to interact with a sample on the sample stage.68. The probe according to claim 66 , wherein a mass analyzer is located distal the sample stage to receive ions generated by the interaction of ...

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Номер записи: 30
06-03-2014 дата публикации

Ion generation method and ion source

Номер: US20140062286A1
Автор: Masateru Sato
Принадлежит: SEN Corp

An ion generation method uses a direct current discharge ion source provided with an arc chamber formed of a high melting point material, and includes: generating ions by causing molecules of a source gas to collide with thermoelectrons in the arc chamber and producing plasma discharge; and causing radicals generated in generating ions to react with a liner provided to cover an inner wall of the arc chamber at least partially. The liner is formed of a material more reactive to radicals generated as the source gas is dissociated than the material of the arc chamber.

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Номер записи: 31
13-03-2014 дата публикации

Advanced penning ion source

Номер: US20140070701A1
Автор: Amy V. Sy, Arun Persaud, Qing Ji, Thomas Schenkel
Принадлежит: UNIVERSITY OF CALIFORNIA

This disclosure provides systems, methods, and apparatus for ion generation. In one aspect, an apparatus includes an anode, a first cathode, a second cathode, and a plurality of cusp magnets. The anode has a first open end and a second open end. The first cathode is associated with the first open end of the anode. The second cathode is associated with the second open end of the anode. The anode, the first cathode, and the second cathode define a chamber. The second cathode has an open region configured for the passage of ions from the chamber. Each cusp magnet of the plurality of cusp magnets is disposed along a length of the anode.

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Номер записи: 32
20-03-2014 дата публикации

ION GENERATION APPARATUS AND ELECTRIC EQUIPMENT USING THE SAME

Номер: US20140077701A1
Автор: Nishida Hiromu
Принадлежит: SHARP KABUSHIKI KAISHA

In this ion generation apparatus, an induction electrode is formed on a surface of a first printed substrate, a hole is opened on the inside of the induction electrode, a needle electrode is mounted on a second printed substrate, and a tip end portion of the needle electrode is inserted in the hole. Therefore, even if the ion generation apparatus is placed in a high-humidity environment with dust accumulating on the first and the second printed substrates, the ion generation apparatus can prevent a current from leaking between the needle electrode and the induction electrode. 1. An ion generation apparatus generating ions including an induction electrode and a needle electrode , comprising:a first substrate having a hole opened therein; anda second substrate provided to face one surface of said first substrate,said induction electrode being provided around said hole in said first substrate,said needle electrode having a base end portion provided in said second substrate, and a tip end portion inserted in said hole.2. The ion generation apparatus according to claim 1 , further comprising a lid member provided to cover another surface of said first substrate and having a cylindrical boss at a position corresponding to said hole claim 1 , whereinsaid boss is inserted in said hole, and said needle electrode is inserted in said boss.3. The ion generation apparatus according to claim 2 , wherein the tip end portion of said needle electrode penetrates through said boss and protrudes from said lid member.4. The ion generation apparatus according to claim 1 , wherein said induction electrode is annularly formed around said hole in said first substrate.5. The ion generation apparatus according to claim 1 , whereinsaid first substrate is a printed substrate, andsaid induction electrode is formed of a wiring layer of said printed substrate.6. Electric equipment claim 1 , comprising:{'claim-ref': {'@idref': 'CLM-00001', 'claim 1'}, 'the ion generation apparatus according to ; ...

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Номер записи: 33
10-04-2014 дата публикации

Method and apparatus for thermal control of ion sources and sputtering targets

Номер: US20140099782A1
Автор: Neil J. Bassom
Принадлежит: Varian Semiconductor Equipment Associates Inc

A method and apparatus are disclosed for controlling a semiconductor process temperature. In one embodiment a thermal control device includes a heat source and a housing comprising a vapor chamber coupled to the heat source. The vapor chamber includes an evaporator section and a condenser section. The evaporator section has a first wall associated with the heat source, the first wall having a wick for drawing a working fluid from a lower portion of the vapor chamber to the evaporator section. The condenser section coupled to a cooling element. The vapor chamber is configured to transfer heat from the heat source to the cooling element via continuous evaporation of the working fluid at the evaporator section and condensation of the working fluid at the condenser section. Other embodiments are disclosed and claimed.

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Номер записи: 34
05-01-2017 дата публикации

ION GENERATOR MOUNTING DEVICE

Номер: US20170000921A1
Автор: WADDELL Charles Houston
Принадлежит: Global Plasma Solutions, LLC

The present invention provides methods and systems for an ion generator mounting device for application of bipolar ionization to airflow within a conduit, the device includes a housing for mounting to the conduit having an internal panel within the enclosure, and an arm extending from the housing for extension into the conduit and containing at least one opening. At least one coupling for mounting an ion generator to the arm oriented with an axis extending between a pair of electrodes of the ion generator being generally perpendicular to a flow direction of the airflow within the conduit. 1. An ion generator mounting device , comprising: 'a base,', 'a housing comprising [ 'at least one opening within the housing;', 'a top portion; and'}, 'a retention means extending outwardly from the housing; and', 'at least one coupling for mounting the ion generator., 'a first and second pair of spaced-apart, opposed sidewalls projecting from the base to collectively form an interior storage compartment and to define an upper edge;'}2. The ion generator mounting device of claim 1 , further comprising an ion generator disposed within the interior storage compartment.3. The ion generator mounting device of claim 1 , further comprising an ion generator containing at least one electrode for dispersing ions from the ion generator that is disposed within the interior storage compartment claim 1 , whereby at least one electrode is disposed adjacent that at least one opening.4. The ion generator mounting device of claim 1 , further comprising a power supply.5. The ion generator mounting device of claim 1 , further comprising a switch.6. The ion generator mounting device of claim 1 , further comprising a retention means disposed on one of the sidewalls and extending therefrom.7. The ion generator mounting device of claim 1 , further comprising an indicator disposed on the housing.8. An ion generator mounting device claim 1 , comprising:an elongate arm, comprising a first side and a second ...

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Номер записи: 35
07-01-2016 дата публикации

Apparatus For Dynamic Temperature Control Of An Ion Source

Номер: US20160005564A1
Автор: Bassom Neil J., Chaney Craig R., Lee William Davis
Принадлежит:

An apparatus for controlling the temperature of an ion source is disclosed. The ion source includes a plurality of walls defining a chamber in which ions are generated. To control the temperature of the ion source, one or more heat shields is disposed exterior to the chamber. The heat shields are made of high temperature and/or refractory material designed to reflect heat back toward the ion source. In a first position, these heat shields are disposed to reflect a first amount of heat back toward the ion source. In a second position, these heat shields are disposed to reflect a lesser second amount of heat back toward the ion source. In some embodiments, the heat shields may be disposed in one or more intermediate positions, located between the first and second positions. 1. An apparatus comprising:an ion source having a plurality of walls defining a chamber; anda movable heat shield disposed outside the chamber and proximate at least one of the walls, where the movable heat shield has a first position where a first amount of heat is reflected back toward the chamber and a second position where a second amount of heat is reflected back toward the chamber, the second amount of heat being less than the first amount of heat.2. The apparatus of claim 1 , wherein the plurality of walls comprises a bottom wall claim 1 , a top wall with an aperture claim 1 , two end walls and two side walls claim 1 , where a cathode is disposed proximate one of the two end walls claim 1 , and wherein the movable heat shield is disposed proximate one of the two end walls.3. The apparatus of claim 2 , wherein the movable heat shield moves in a direction parallel to a plane of a first of the two end walls and in the first position claim 2 , the movable heat shield overlaps a portion of a first end wall claim 2 , and in the second position claim 2 , the movable heat shield overlaps a smaller portion of the first end wall.4. The apparatus of claim 2 , wherein the movable heat shield rotates ...

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Номер записи: 36
04-01-2018 дата публикации

Vaporizer For Ion Source

Номер: US20180005793A1
Автор: Chaney Craig R., Sporleder David P.
Принадлежит:

A vaporizer with several novel features to prevent vapor condensation and the clogging of the nozzle is disclosed. The vaporizer is designed such that there is an increase in temperature along the path that the vapor travels as it flows from the crucible to the arc chamber. The vaporizer uses a nested architecture, where the crucible is installed within an outer housing. Vapor leaving the crucible exits through an aperture and travels along the volume between the crucible and the outer housing to the nozzle, where it flows to the arc chamber. In certain embodiments, the aperture in the crucible is disposed at a location where liquid in the crucible cannot reach the aperture. 1. A vaporizer , comprising:a crucible in which a dopant material may be disposed, having an aperture passing through a sidewall of the crucible;an outer housing surrounding the crucible;a vapor channel disposed between the outer housing and the crucible, wherein the aperture is in communication with the vapor channel; anda gas nozzle attached to one end of the outer housing in communication with the vapor channel.2. The vaporizer of claim 1 , wherein the crucible and the outer housing are concentric cylinders.3. The vaporizer of claim 1 , comprising a heat source disposed outside of the outer housing.4. The vaporizer of claim 1 , comprising a heat source embedded in the outer housing.5. The vaporizer of claim 1 , wherein a temperature in the vapor channel is greater than a temperature in the crucible.6. The vaporizer of claim 1 , wherein the aperture is disposed in a location so that liquid in the crucible cannot reach the aperture.7. The vaporizer of claim 1 , wherein vapor travels in a path from the crucible through the aperture into the vapor channel and to the gas nozzle claim 1 , and wherein a temperature is increasing as the vapor flows along the path from the aperture to the gas nozzle.8. The vaporizer of claim 1 , comprising a spacer disposed between the crucible and the outer housing ...

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Номер записи: 37
15-01-2015 дата публикации

IONIZATION PROBE ASSEMBLIES

Номер: US20150014548A1
Автор: Bare Rex O., Drader Jared J., Gleason Paul J., Gutierrez Jose R., Hannis James C., Hofstadler Steven A., Nathanson Jared, Smith Jeffrey C.
Принадлежит:

The invention relates generally to sample ionization, and provides ionization probe assemblies, systems, computer program products, and methods useful for this purpose. 140.-. (canceled)41. An ionization probe assembly , comprising:at least one ion source housing back plate that comprises one or more surfaces that define at least one spray orifice, which ion source housing back plate is configured to operably connect to an ion source housing;at least one probe support structure coupled to the ion source housing back plate via at least one linear slide;at least one probe substantially fixedly mounted on the probe support structure; and,at least one probe conveyance mechanism operably connected to the probe support structure, which probe conveyance mechanism is configured to convey the probe between at least a first position and a second position, wherein the first position is substantially electrically isolated from the second position.42. (canceled)43. An ionization probe assembly , comprising:at least one ion source housing back plate that comprises one or more surfaces that define at least one spray orifice, which ion source housing back plate is configured to operably connect to an ion source housing;at least one probe movably coupled to the ion source housing back plate via at least one pivot mechanism; and,at least one probe conveyance mechanism that comprises at least one motor operably connected to the pivot mechanism via a pulley and belt drive assembly, which probe conveyance mechanism is configured to selectively convey the probe between at least a first position and a second position, wherein the first position is substantially electrically isolated from the second position.4449.-. (canceled)50. A method of spraying sample aliquots into an ion source housing of a molecular mass measurement system , the method comprising:(a) conveying a first probe from a first rinse position to a first spray position of the molecular mass measurement system, wherein the ...

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Номер записи: 38
03-02-2022 дата публикации

Facial beautifying and care apparatus

Номер: US20220032050A1
Автор: Pei-En Lee, Po-Chang Liu
Принадлежит: Individual

A facial beautifying and care apparatus includes a beauty bar ( 1 ) having an air supply passage (A), a negative pressure connecting hole ( 132 ), a conductive suction nozzle ( 15 ) and a first connection port ( 134 ); an EMS generation module ( 20 ) inside the beauty bar ( 1 ) electrically connected to the first connection port ( 134 ); an external negative pressure unit ( 6 ) separated from the beauty bar ( 1 ) and having a negative pressure driving control module ( 62 ) and a second connection port ( 637 ); the negative pressure driving control module ( 62 ) having an air supply tube assembly ( 66 ) with a negative pressure communicating hole ( 661 ); a communicating tube ( 7 ) communicating with the negative pressure connecting hole ( 132 ) and the negative pressure communicating hole ( 661 ); a conductive wire ( 8 ) connected to the first connecting port ( 134 ) and the second connecting port ( 637 ). Accordingly, the effects of facial skin firming, cleaning, beautifying and caring are achieved.

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Номер записи: 39
14-01-2021 дата публикации

DISCHARGE DEVICE AND ELECTRONIC EQUIPMENT

Номер: US20210012995A1
Автор: EZAKI TETSUYA, OHE NOBUYUKI, OKANO SATOSHI
Принадлежит:

An ion generating device includes a high voltage transformer, a discharge electrode connected to a terminal of the high voltage transformer on a secondary side, and an induction electrode that generates ions between the induction electrode and the discharge electrode and is connected to a terminal of the high voltage transformer on the secondary side. A first conductive path includes the terminal and extends from the terminal to the discharge electrode and a second conductive path includes a terminal and the induction electrode. Part of the first conductive path is located in proximity and opposed to part of the second conductive path. 1. A discharge device comprising:a transformer;a discharge electrode connected to a first terminal of the transformer on a secondary side; andan induction electrode that generates a discharged product between the induction electrode and the discharge electrode and is connected to a second terminal of the transformer on the secondary side, whereina first conductive path includes the first terminal and extends from the first terminal to the discharge electrode and a second conductive path includes the second terminal and the induction electrode, part of the first conductive path being located in proximity and opposed to part of the second conductive path.2. The discharge device according to claim 1 , wherein the first conductive path and the second conductive path are disposed so as to be substantially parallel in part of a portion where the part of the first conductive path is located in proximity and opposed to the part of the second conductive path.3. The discharge device according to claim 1 , wherein the first conductive path or the second conductive path includes a wire member.4. The discharge device according to claim 3 , wherein the wire member is a lead wire coated with an insulating coating member.5. The discharge device according to claim 3 , wherein the wire member is a conductor in a plate shape.6. The discharge device ...

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Номер записи: 40
21-01-2016 дата публикации

IN-SITU MONITORING OF FABRICATION OF INTEGRATED COMPUTATIONAL ELEMENTS

Номер: US20160018818A1
Автор: Freese Robert Paul, Gardner Richard Neal, Jones Christopher Michael, Perkins David L.
Принадлежит: Halliburton Energy Services, Inc.

Techniques include receiving a design of an integrated computational element (ICE), the ICE design including specification of a substrate and a plurality of layers, their respective target thicknesses and complex refractive indices, complex refractive indices of adjacent layers being different from each other, and a notional ICE fabricated in accordance with the ICE design being related to a characteristic of a sample; forming at least some of the plurality of layers of the ICE in accordance with the ICE design; performing at least two different types of in-situ measurements; predicting, using results of the at least two different types of in situ measurements, performance of the ICE relative to the ICE design; and adjusting the forming of the layers remaining to be formed, at least in part, by updating the ICE design based on the predicted performance.

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Номер записи: 41
17-04-2014 дата публикации

ION GENERATION APPARATUS AND ELECTRIC EQUIPMENT USING THE SAME

Номер: US20140103793A1
Автор: IZU Koichi, Nishida Hiromu
Принадлежит: SHARP KABUSHIKI KAISHA

In this ion generation apparatus, tip end portions of needle electrodes are aligned in an X direction with being oriented in a Z direction, and protrude from a casing. A protective cover covers the tip end portions of the needle electrodes. The protective cover is provided with holes opened to allow tip ends of the needle electrodes to be seen from the Z direction, and an opening opened to allow the needle electrodes to be seen from a Y direction. Therefore, ions generated at the tip end portions of the needle electrodes can be emitted efficiently out of the casing. Further, a user can be prevented from touching the tip end portion of the needle electrode and injuring his or her finger or the like. 1. An ion generation apparatus generating ions including a plurality of needle electrodes , comprising:a substrate having said plurality of needle electrodes mounted thereon;a casing accommodating said substrate, said plurality of needle electrodes having tip end portions aligned in an X direction with being oriented in a Z direction, and protruding from said casing; anda protective cover covering the tip end portions of said plurality of needle electrodes,said protective cover being provided with a plurality of first holes opened to allow tip ends of said plurality of needle electrodes to be seen from the Z direction, respectively, and a first opening opened to allow said plurality of needle electrodes to be seen from a Y direction.2. The ion generation apparatus according to claim 1 , further comprising a lid member closing said casing so as to cover said substrate claim 1 , whereinsaid lid member is provided with a second hole opened at a position corresponding to each needle electrode, a top plate provided to face said lid member and having said plurality of first holes opened therein, and', 'support members provided between said top plate and said lid member and having said first opening opened therein, and, 'said protective cover includes'}the tip end portion of ...

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Номер записи: 42
16-01-2020 дата публикации

Dynamic Electron Impact Ion Source

Номер: US20200020502A1
Автор: Chen Tong, Welkie David G.
Принадлежит:

An ion source can include a magnetic field generator configured to generate a magnetic field in a direction parallel to a direction of the electron beam and coincident with the electron beam. However, this magnetic field can also influence the path of ionized sample constituents as they pass through and exit the ion source. An ion source can include an electric field generator to compensate for this effect. As an example, the electric field generator can be configured to generate an electric field within the ion source chamber, such that an additional force is imparted on the ionized sample constituents, opposite in direction and substantially equal in magnitude to the force imparted on the ionized sample constituents by the magnetic field. 1. A system comprising: a first input port;', 'a second input port different from the first input port;', 'an exit port;', 'a magnetic field generator configured to generate a magnetic field within the ion source chamber;', 'a first electric field generator configured to generate a first electric field within the ion source chamber;', 'a second electric field generator configured to generate a second electric field within the ion source chamber;, 'an ion source chamber comprising receive gas-phase neutral species through the first input port;', 'receive a flow of electrons through the second input port;', 'guide the electrons through the ion source chamber using the magnetic field generator;', 'generate ions in an ionization region within the ion source chamber through an interaction between the gas-phase neutral species and the electrons; and', 'focus and accelerate at least some of the ions from the ion source chamber through the exit port along an ion beam axis using the first electric field generator;', 'wherein the second electric field generator is configured to reduce or eliminate an influence of the magnetic field on at least some of the ions accelerated from the ion source., 'wherein the ion source chamber is configured, ...

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Номер записи: 43
21-01-2021 дата публикации

Ion generator and ion implanter

Номер: US20210020403A1
Автор: Hiroki Murooka
Принадлежит: Sumitomo Heavy Industries Ion Technology Co Ltd

There is provided an ion generator including a vapor generating chamber for generating a vapor by heating a raw material in which a first solid material which is a single substance of an impurity element and a second solid material which is a compound containing the impurity element are mixed with each other, and a plasma generating chamber for generating a plasma containing ions of the impurity element by using the vapor.

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Номер записи: 44
26-01-2017 дата публикации

ION GENERATING DEVICE WITH ELECTRON CYCLOTRON RESONANCE

Номер: US20170025240A1
Автор: Delferriere Olivier, Harrault Francis, TUSKE Olivier
Принадлежит:

An electron cyclotron resonance ion generator device includes a metal tube subjected to a first potential and pierced by a first cavity forming a plasma chamber intended to contain a plasma; a second cavity forming a waveguide configured to inject a high frequency wave into the plasma chamber, an extraction system including an upstream end connected to the plasma chamber and a downstream end configured to be connected to an ion transport line, the connecting flange being subjected to a second potential, a magnetic field generator, and a ceramic tube in contact with the metal tube, the ceramic tube surrounding the metal tube and at least a part of the extraction system. 1. An electron cyclotron resonance ion generator device comprising: a first cavity forming a plasma chamber configured to contain a plasma;', 'a second cavity connected to the first cavity, the second cavity forming a waveguide configured to inject a high frequency wave into the plasma chamber,, 'a metal tube, the metal tube being intended configured to be placed at a first potential the metal tube being pierced byan extraction system configured to extract ions from the plasma chamber, the extraction system comprising an upstream end connected to the plasma chamber and a downstream end provided with a connecting flange configured to be connected to an ion transport line, the connecting flange being configured to be placed at a second potential different to the first potential,a magnetic field generator configured to generate a magnetic field in the plasma chamber, andan insulating structure configured to insulate electrically the metal tube from the downstream end of the extraction system, the insulating structure comprising a ceramic tube in contact with the metal tube, the ceramic tube surrounding the metal tube and at least a part of the extraction system.2. The device according to claim 1 , wherein the extraction system comprises:a first electrode integral with the metal tube, the first electrode ...

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Номер записи: 45
24-04-2014 дата публикации

ION SOURCE DEVICE AND METHOD FOR PROVIDING ION SOURCE

Номер: US20140110598A1
Автор: DONG CHUNRONG, SHAN LEON, WU LULEI
Принадлежит: Semiconductor Manufacturing International (Shanghai) Corporation

Various embodiments provide an ion source device and a method for providing the ion source. An exemplary ion source device can include an arc chamber, a filament, a reflector, a slit outlet, a source gas inlet, and/or a cleaning gas inlet. The filament can be configured to generate thermo-electrons in the arc chamber. The reflector can be configured to reflect the thermo-electrons back to the arc chamber. The slit outlet can be configured to exit a gaseous material out of the arc chamber. The source gas inlet and the cleaning gas inlet can be located on a same sidewall of the arc chamber configured to respectively introduce an ion source gas and an inert cleaning gas into the arc chamber. 1. An ion source device of an ion implanter , comprising:an arc chamber;a filament located on a first sidewall of the arc chamber and configured to generate thermo-electrons in the arc chamber;a reflector located on a second sidewall of the arc chamber opposite to the first sidewall and configured to reflect the thermo-electrons back to the arc chamber;a slit outlet located on a top of the arc chamber and configured to exit a gaseous material out of the arc chamber;a source gas inlet located on a third sidewall of the arc chamber and configured to introduce an ion source gas into the arc chamber, wherein the third sidewall is between the first sidewall and the second sidewall; anda cleaning gas inlet located on the third sidewall of the arc chamber and configured to introduce an inert cleaning gas into the arc chamber.2. The device of claim 1 , wherein the inert cleaning gas includes argon claim 1 , helium claim 1 , or a combination thereof.3. The device of claim 1 , wherein a straight-line distance between the cleaning gas inlet and the filament is greater than a straight-line distance between the source gas inlet and the filament.4. The device of claim 3 , wherein the straight-line distance between the cleaning gas inlet and the source gas inlet ranges from about 40 mm to about ...

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Номер записи: 46
02-02-2017 дата публикации

Ion generator device

Номер: US20170028096A1
Автор: Charles Houston Waddell, Joseph Anton Christiansen
Принадлежит: Global Plasma Solutions LLC

A system and method of treating air. Bipolar ionization is delivered to an airflow within a conduit from a tubeless ion generator. The ionized airflow may be delivered to a conditioned airspace by an HVAC system. In alternate applications, the airflow delivers ionized combustion air to an engine. The invention also includes a mounting assembly for positioning one or more ion generators into an airflow.

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Номер записи: 47
05-02-2015 дата публикации

Lifetime ion source

Номер: US20150034837A1
Автор: Bon-Woong Koo, Eric R. Cobb, Richard M. White, William T. Levay
Принадлежит: Varian Semiconductor Equipment Associates Inc

An ion source includes an ion source chamber, a gas source to provide a fluorine-containing gas species to the ion source chamber and a cathode disposed in the ion source chamber configured to emit electrons to generate a plasma within the ion source chamber. The ion source chamber and cathode are comprised of a refractory metal. A phosphide insert is disposed within the ion source chamber and presents an exposed surface area that is configured to generate gas phase phosphorous species when the plasma is present in the ion source chamber, wherein the phosphide component is one of boron phosphide, tungsten phosphide, aluminum phosphide, nickel phosphide, calcium phosphide and indium phosphide.

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Номер записи: 48
02-02-2017 дата публикации

Negative Ribbon Ion Beams from Pulsed Plasmas

Номер: US20170032937A1
Автор: Distaso Daniel, Dzengeleski Joseph P., Radovanov Svetlana B.
Принадлежит:

An apparatus and method for the creation of negative ion beams is disclosed. The apparatus includes an RF ion source, having an extraction aperture. An antenna disposed proximate a dielectric window is energized by a pulsed RF power supply. While the RF power supply is actuated, a plasma containing primarily positive ions and electrons is created. When the RF power supply is deactivated, the plasma transforms into an ion-ion plasma. Negative ions may be extracted from the RF ion source while the RF power supply is deactivated. These negative ions, in the form of a negative ribbon ion beam, may be directed toward a workpiece at a specific incident angle. Further, both a positive ion beam and a negative ion beam may be extracted from the same ion source by pulsing the bias power supply multiple times each period. 1. An apparatus for creating a negative ribbon ion beam , comprising:an ion source having a plurality of chamber walls defining an ion source chamber and having an extraction aperture;an RF antenna disposed proximate one of the plurality of chamber walls of the ion source chamber;an RF power supply in communication with the RF antenna, and outputting a first RF power level for a first time duration to the RF antenna to create a plasma within the ion source chamber from a feed gas and outputting a second RF power level, lower than the first RF power level, for a second time duration; anda bias power supply to create a voltage difference between a plasma disposed in the ion source chamber and a workpiece, such that the bias power supply is pulsed to create the voltage difference during at least a portion of the second time duration, so as to extract the negative ribbon ion beam from the ion source chamber through the extraction aperture.2. The apparatus of claim 1 , wherein at least one of the plurality of chamber walls is electrically conductive and the bias power supply is in communication with electrically conductive chamber walls of the ion source chamber ...

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Номер записи: 49
12-02-2015 дата публикации

AIR BLOWER, ION TRANSMITTING DEVICE, ELECTRICAL APPLIANCE, AND REMOTE CONTROL HOLDING STRUCTURE

Номер: US20150041675A1
Автор: Iwaki Nobuhiro, Shibata Masaki, SHIRAISHI Kenichi
Принадлежит:

An inlet port and an outlet port which are open in a body housing , an air-blowing pathway disposed inside the body housing , making the inlet port and the outlet port communicate with each other, and also having a plurality of divisional pathways obtained by division with partition plates , an air-blowing fan disposed upstream from the divisional pathways inside the air-blowing pathway , a removable inner cover covering the divisional pathways and having an inner surface which forms a side wall of the air-blowing pathway , and a removable exterior cover covering the inner cover to form an outer surface of the body housing are provided, and the inner cover has marking portions formed on an outer surface along the partition plates 1. An air blower comprising a body housing having an inlet port and an outlet port which are open; an air-blowing duct disposed inside the body housing , making the inlet port and the outlet port communicate with each other , and also having a plurality of divisional pathways obtained by division with partition plates; an air-blowing fan disposed upstream from the divisional pathways inside the air-blowing duct; a removable inner cover covering the divisional pathways and having an inner surface which forms a side wall of the air-blowing duct; and a removable exterior cover covering the inner cover to form an outer surface of the body housing;wherein the inner cover has marking portions formed on an outer surface along the partition plates.2. The air blower according to claim 1 ,wherein the inlet port is provided in a lower part of the body housing and the outlet port is provided in a front surface of the body housing above the inlet port, and the partition plates have a lower part extending in a vertical direction and an upper part curved toward the outlet port.3. The air blower according to or claim 1 ,wherein fitting grooves fitting in the partition plates are provided in the inner surface of the inner cover, and rear surfaces of the ...

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Номер записи: 50
06-02-2020 дата публикации

Systems And Methods For Workpiece Processing Using Neutral Atom Beams

Номер: US20200043775A1
Автор: Stephen E. Savas
Принадлежит: Beijing E Town Semiconductor Technology Co Ltd, Mattson Technology Inc

Plasma processing systems and methods are provided. In one example, a system includes a processing chamber having a workpiece support. The workpiece is configured to support a workpiece. The system includes a plasma source configured to induce a plasma from a process gas in a plasma chamber to generate one or more species of negative ions. The system includes a grid structure configured to accelerate the one or more negative ions towards the workpiece. The grid structure can include a first grid plate, a second grid plate, and one or more magnetic elements positioned between the first grid plate and second grid plate to reduce electrons accelerated through the first grid plate. The system can include a neutralizer cell disposed downstream of the grid structure configured to detach extra electrons from ions of the one or more species of negative ions to generate energetic neutral species for processing the workpiece.

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Номер записи: 51
03-03-2022 дата публикации

IONIC PROPULSION SYSTEM

Номер: US20220063821A1
Автор: Cass William J., Kurfess Gregory H.
Принадлежит:

An ionic propulsion system for an aircraft having an airfoil includes a first conductor and a second conductor, the first conductor and the second conductor being disposed at least partially within the airfoil when not in use. The propulsion system includes an actuator for extending the first conductor and the second conductor from an end of the airfoil such that the first conductor and the second conductor are in the airstream of the aircraft, the first conductor being upstream of the second conductor in the airstream. The propulsion system includes a power supply for supplying current to the first conductor and the second conductor to ionize the air particles in the vicinity of the first conductor and the end of the airfoil to create a flow of the ionized particles from the first conductor toward the second conductor.

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Номер записи: 52
14-02-2019 дата публикации

FIELD IONIZATION SOURCE, ION BEAM APPARATUS, AND BEAM IRRADIATION METHOD

Номер: US20190051491A1
Автор: HASHIZUME Tomihiro, Kawanami Yoshimi, Matsubara Shinichi, Shichi Hiroyasu
Принадлежит:

An H ion is used as an ion beam to achieve improvement in focusing capability influencing observed resolution and machining width, improvement in the beam stability, and a reduction in damage to the sample surface during the beam irradiation, in the process of observation and machining of the sample surface by the ion beam. The H ion can be obtained by use of a probe current within a voltage range around a second peak occurring when an extracted voltage is applied to a needle-shaped emitter tip with an apex terminated by three atoms or less, in an atmosphere of hydrogen gas. 1. An ion beam apparatus , comprising:{'sub': '3', 'sup': '+', 'a gas field ionization source that emits an ion beam containing a H ion;'}a beam irradiation column that includes a lens capable of focusing an ion emitted from the gas field ionization source, and a deflector capable of deflecting an ion beam;a sample stage on which a sample to be irradiated with an ion beam passing through the beam irradiation column is loaded; anda sample chamber that houses at least the sample stage,{'sub': '3', 'sup': '+', 'wherein an abundance ratio of the H ion is the highest in ion species emitted from an emitter tip of the gas field ionization source.'}2. The ion beam apparatus according to claim 1 ,{'sub': '3', 'sup': '+', 'further comprising a filter that allows an emitted H ion to penetrate based on ion mass in a selective manner.'}3. The ion beam apparatus according to claim 2 ,{'sub': '3', 'sup': '+', 'wherein the filter has a function of allowing only a H ion to penetrate in a selective manner.'}4. The ion beam apparatus according to claim 2 ,wherein the filter has a function of producing a magnetic field.5. The ion beam apparatus according to claim 1 ,further comprising a function of correcting a mask or mold for nanoimprint lithography by the ion beam.6. An ion beam apparatus claim 1 , comprising:a gas field ionization source;a beam irradiation column that is equipped with a lens capable of focusing ...

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Номер записи: 53
13-02-2020 дата публикации

Ion Source Thermal Gas Bushing

Номер: US20200051773A1
Автор: Chaney Craig R., McLaughlin Adam M.
Принадлежит:

A system for reducing clogging and deposition of feed gas on a gas tube entering an ion source chamber is disclosed. To lower the overall temperature of the gas tube, a gas bushing, made of a thermally isolating material, is disposed between the ion source chamber and the gas tube. The gas bushing is made of a thermally isolating material, such as titanium, quartz, boron nitride, zirconia or ceramic. The gas bushing has an inner channel in fluid communication with the ion source chamber and the gas tube to allow the flow of feed gas to the ion source chamber. The gas bushing may have a shape that is symmetrical, allowing it to be flipped to extend its useful life. In some embodiments, the gas tube may be in communication with a heat sink to maintain its temperature. 1. A system for delivering feed gas to an ion source , comprising:a gas tube, having an inner channel in fluid communication with a dopant source; anda gas bushing, having an inner channel in fluid communication with the inner channel of the gas tube and an ion source chamber, wherein the gas bushing has a thermal conductivity of less than 30 W/m K.2. The system of claim 1 , wherein the gas tube is linear.3. The system of claim 2 , further comprising an elbow joint disposed between the gas tube and the gas bushing claim 2 , the elbow joint having an inner channel in fluid communication with the inner channel of the gas tube and the inner channel of the gas bushing.4. The system of claim 3 , wherein the gas bushing has an inner surface in communication with the ion source chamber and an outer surface forming an interface with the elbow joint claim 3 , and wherein a shape of the gas bushing is symmetrical such that the gas bushing can be flipped claim 3 , wherein when flipped claim 3 , the inner surface becomes the outer surface.5. The system of claim 3 , wherein the gas bushing and the elbow joint have interlocking features to allow attachment of the gas bushing to the elbow joint.6. The system of claim 2 ...

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Номер записи: 54
01-03-2018 дата публикации

Ion generator device

Номер: US20180055966A1
Автор: Charles Houston Waddell, Joseph Anton Christiansen
Принадлежит: Global Plasma Solutions LLC

A system and method of treating air. Bipolar ionization is delivered to an airflow within a conduit from a tubeless ion generator. The ionized airflow may be delivered to a conditioned airspace by an HVAC system. In alternate applications, the airflow delivers ionized combustion air to an engine. The invention also includes a mounting assembly for positioning one or more ion generators into an airflow.

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Номер записи: 55
05-03-2015 дата публикации

Gas Coupled Arc Chamber Cooling

Номер: US20150061490A1
Автор: Bassom Neil J., Klesel Dennis, Lee William Davis
Принадлежит:

An ion implantation system, having a temperature controlled ion source chamber is disclosed. The temperature of the ion source chamber is regulated by disposing a heat sink in proximity to the ion source chamber. A gas fillable chamber is disposed between and in physical communication with both the ion source chamber and the heat sink. By controlling the amount of gas, i.e. the gas pressure, within the gas fillable chamber, the coefficient of heat transfer can be manipulated. This allows the temperature of the ion source chamber to be controlled through the application or removal of gas from the gas fillable chamber. This independent temperature control decouples the power used to heat the ion generator from the ion species that are ultimately generated. 1. A method of producing an ion beam having a desired beam current and a desired ion composition , comprising:introducing a feed gas to an ion source chamber;applying power to an ion generator disposed in said ion source chamber to create a plasma having said desired beam current; andindependently controlling a temperature of said ion source chamber by transferring a variable amount of heat away from said ion source chamber to create said ion beam of said desired ion composition.2. The method of claim 1 , further comprising a heat sink and a gas fillable chamber disposed between and in thermal communication with said ion source and said heat sink claim 1 , wherein said controlling said temperature is performed by regulating a pressure of gas within said gas fillable chamber.3. The method of claim 1 , wherein a parameter of said ion beam is monitored claim 1 , and said temperature is regulated based on said monitored parameter.4. The method of claim 3 , wherein said parameter comprises one or more selected from the group consisting of ion beam composition claim 3 , ion beam current claim 3 , ion beam current density claim 3 , ion beam angle and angle distribution.5. The method of claim 1 , wherein a parameter of said ...

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Номер записи: 56
15-05-2014 дата публикации

TARGET FOR GENERATING POSITIVE IONS, METHOD OF FABRICATING THE SAME, AND TREATMENT APPARATUS USING THE TARGET

Номер: US20140135562A1
Автор: JUNG Moon Youn, KIM Seunghwan, PYO Hyeon-Bong, SHIN Dong-Ho
Принадлежит:

Provided is an ion beam treatment apparatus. The treatment apparatus includes a target for generating positive ions including a thin film for generating positive ions and nanowires disposed on at least one side of the thin film for generating positive ions, and a laser for emitting a laser beam incident on nanowires to project positive ions to a tumor region of a patient by generating the positive ions from the thin film for generating positive ions. Each of the nanowires may include a metal nanocore and a polymer shell surrounding the metal nanocore. The laser beam incident on the nanowires forms surface plasmon resonance, a near field having an intensity enhanced more than an intensity of the laser beam is formed by the surface plasmon resonance, and the positive ions are emitted from the thin film for generating positive ions by the near field. 1. A target for generating positive ions comprising:a thin film for generating positive ions; andnanowires provided on at least one side of the thin film for generating positive ions,wherein each of the nanowires comprise a metal nanocore and a polymer shell surrounding the metal nanocore, andthe thin film for generating positive ions generates positive ions by a laser beam incident on the nanowires.2. The target for generating positive ions of claim 1 , wherein the metal nanocore is composed of metal nanoparticles.3. The target for generating positive ions of claim 2 , wherein the metal nanoparticles comprise gold claim 2 , silver claim 2 , copper claim 2 , or aluminum.4. The target for generating positive ions of claim 2 , wherein the nanowires are formed by electrospinning a polymer solution including the metal nanoparticles.5. The target for generating positive ions of claim 1 , wherein the metal nanocore has a linewidth ranging from a few tens to a few hundreds of nanometers.6. The target for generating positive ions of claim 1 , wherein the positive ions are protons claim 1 , carbon ions claim 1 , oxygen ions claim 1 ...

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Номер записи: 57
10-03-2016 дата публикации

Method of smoothing solid surface with gas cluster ion beam and solid surface smoothing apparatus

Номер: US20160068970A1
Автор: Akiko Suzuki, Akinobu Sato, Emmanuel Bourelle, Jiro Matsuo, Toshio Seki
Принадлежит: Japan Aviation Electronics Industry Ltd

A method of smoothing a solid surface with a gas cluster ion beam includes irradiating the solid surface with the gas cluster ion beam. The irradiating includes, when scratches which can be likened to a line-and-space pattern structure with widths and heights on the order of a submicrometer to micrometer are present on the solid surface, a process of emitting the gas cluster ion beam so as to expose substances, which remain on side-walls of the scratches due to lateral transferal caused by collisions with gas clusters, to other gas clusters, and the gas cluster ion beam diverges non-concentrically and/or non-uniformly.

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Номер записи: 58
29-05-2014 дата публикации

Ion Implanter

Номер: US20140145581A1
Автор: Borges Carlos F., Jerez Manuel A.
Принадлежит:

The support and electrode assemblies of the ion implanter are cooled by circulating a coolant through these parts during operation. The support for the arc chamber includes a one piece block of aluminum through which coolant passes and a hollow rectangular post on which the arc chamber sits with a space therebetween. 1. An ion implanter comprisinga one piece support having a flange including an inlet for a flow of coolant and an outlet for an outflow of the coolant and a skeletal block extending perpendicularly from said flange and having a channel communicating with said inlet and said outlet to conduct a flow of coolant therebetween, said channel and extending longitudinally of said skeletal block;a first electrode assembly having a high voltage feedthrough mounted in said flange and a conductor extending from said feedthrough; anda first coolant assembly for cooling said first electrode assembly having a plate secured to said flange concentrically of said feedthrough and having an inlet stub in said plate for a flow of coolant, a first outlet in said plate, a first channel extending through said plate from said inlet stub to said first outlet, a first inlet in said plate for a flow of coolant, an outlet stub in said plate and a second channel extending from said first inlet to said outlet stub to expel coolant therefrom.2. An ion implanter as set forth in further comprising a shielding cover disposed about said conductor adjacent said flange.3. An ion implanter as set forth in further comprising a second electrode assembly having a plate secured to said flange claim 1 , a plurality of insulators secured in spaced apart parallel relation within said plate and a plurality of electrodes claim 1 , each said electrode being secured to and passing through a respective one of said plurality of insulators; anda second coolant assembly for cooling said second electrode assembly and having an inlet for a flow of coolant in said plate of said second electrode assembly, a ...

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Номер записи: 59
17-03-2022 дата публикации

Systems, devices, and methods for ion beam modulation

Номер: US20220084774A1
Автор: Alexander Dunaevsky, Andrey A. KOREPANOV, Vladislav VEKSELMAN
Принадлежит: TAE Technologies Inc

Embodiments of systems, devices, and methods relate to an ion beam source system. An ion source is configured to provide a negative ion beam to a tandem accelerator system downstream of the ion source, and a modulator system connected to an extraction electrode of the ion source is configured to bias the extraction electrode for a duration sufficient to maintain acceleration voltage stability of the tandem accelerator system.

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Номер записи: 60
10-03-2016 дата публикации

Process gas enhancement for beam treatment of a substrate

Номер: US20160071734A1
Автор: Allen J. Leith, Matthew C. Gwinn, Michael Graf, Noel Russell
Принадлежит: TEL Epion Inc

A beam processing system and method of operating are described. In particular, the beam processing system includes a beam source having a nozzle assembly that is configured to introduce a primary gas through the nozzle assembly to a vacuum vessel in order to produce a gaseous beam, such as a gas cluster beam, and optionally, an ionizer positioned downstream from the nozzle assembly, and configured to ionize the gaseous beam to produce an ionized gaseous beam. The beam processing system further includes a process chamber within which a substrate is positioned for treatment by the gaseous beam, and a secondary gas source, wherein the secondary gas source includes a secondary gas supply system that delivers a secondary gas, and a secondary gas controller that operatively controls the flow of the secondary gas injected into the beam processing system downstream of the nozzle assembly.

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Номер записи: 61
11-03-2021 дата публикации

Apparatus and Method for Operating a Heaterless Hollow Cathode, and an Electric Space Propulsion System Employing such a Cathode

Номер: US20210071650A1
Автор: GAL Alon, LEV Dan, MIKITCHUK Demitiri
Принадлежит:

A heaterless hollow cathode provides electron emission current in an electric space propulsion system. A mechanical, thermal, and electromagnetic design of the cathode apparatus is presented, and a method of operation for rapid ignition and stabilization of the cathode is provided. The keeper of the cathode apparatus has a thickness change which reduces the flow of heat away from the cathode's emitter assembly. The method for heating the emitter assembly includes controlling applied voltages so that the current flowing from the emitter assembly to the keeper is maintained at a predetermined fixed value. By this method, damage to the electron emitting surfaces of the emitter assembly by electric arcing and/or by depletion of dopant materials is avoided. 1. A heaterless hollow cathode apparatus comprising:(a) an emitter assembly comprising an electron emitter and an emitter holder, said emitter assembly defining a gas flow path passing through an emitter orifice;(b) a keeper surrounding said emitter assembly, said keeper having a keeper orifice;(c) a gas flow regulator for supplying a regulated flow of gas through said gas flow path;(d) an electrical power supply; and (i) apply an emitter-keeper voltage between said emitter assembly and said keeper while gas is supplied to a volume between said emitter assembly and said keeper to initiate a discharge between said emitter assembly and said keeper;', '(ii) monitor the value of an emitter-keeper current, flowing between said emitter assembly and said keeper, and adjust said emitter-keeper voltage so as to maintain said emitter-keeper current at a predetermined current value;', '(iii) monitor said emitter-keeper voltage so as to detect a drop in said emitter-keeper voltage to values which remain below a predetermined voltage threshold for a predetermined minimum time duration;', '(iv) actuate a main discharge circuit in which current flows from an anode to the heaterless hollow cathode; and', '(v) set said emitter-keeper ...

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Номер записи: 62
28-02-2019 дата публикации

SYSTEM AND METHOD FOR POWER CONVERSION

Номер: US20190068066A1
Автор: Fogel Paul E.
Принадлежит:

A polarity-selectable high voltage direct current power supply including a first drive assembly that transforms a first low voltage DC input into a first medium voltage alternating current output; a first HV output assembly that transforms the first LV AC output into a first HV DC output, wherein the first HV output assembly defines a first input stage; a polarity selector coupled between the second output junction of the first drive assembly and the first and second input stages of the first HV output assembly, the polarity selector operable between a first configuration and a second configuration; wherein in the first configuration the first HV DC output has a positive polarity; and wherein in the second configuration the first HV DC output has a negative polarity. 1. An output-polarity-selectable power supply comprising:a first drive assembly that receives a first voltage and outputs a second voltage, wherein the first drive assembly defines a first output junction pair;a first output assembly that receives the second voltage and outputs a third voltage, wherein the first output assembly defines a first input stage electrically connectable to the first output junction pair, a second input stage electrically connectable to the first output junction pair, and a second output junction pair; wherein in the first configuration: the set of switches directly electrically connects the first output junction pair to the first input stage and electrically isolates the first output junction pair from the second input stage, and the second output junction pair defines a positive polarity; and', 'wherein in the second configuration: the set of switches directly electrically connects the first output junction pair to the second input stage and electrically isolates the first output junction pair from the first input stage, and the second output junction pair defines a negative polarity., 'a polarity selector coupled between the first output junction pair and the first and ...

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Номер записи: 63
11-03-2021 дата публикации

Thermally Isolated Repeller And Electrodes

Номер: US20210074503A1
Автор: Adam M. McLaughlin, Craig R. Chaney, Jordan B. Tye
Принадлежит: Applied Materials Inc

An ion source having a thermally isolated repeller is disclosed. The repeller comprises a repeller disk and a plurality of spokes originating at the back surface of the repeller disk and terminating in a post. In certain embodiments, the post may be hollow through at least a portion of its length. The use of spokes rather than a central stem may reduce the thermal conduction from the repeller disk to the post. By incorporating a hollow post, the thermal conduction is further reduced. This configuration may increase the temperature of the repeller disk by more than 100° C. In certain embodiments, radiation shields are provided on the back surface of the repeller disk to reduce the amount of radiation emitted from the sides of the repeller disk. This may also help increase the temperature of the repeller. A similar design may be utilized for other electrodes in the ion source.

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Номер записи: 64
05-06-2014 дата публикации

GAS MIXTURE METHOD AND APPARATUS FOR GENERATING ION BEAM

Номер: US20140151572A1
Автор: HU Koulin, LIN WEI-CHENG, WAN ZHIMIN
Принадлежит: ADVANCED ION BEAM TECHNOLOGY, INC.

A gas mixture method and apparatus of prolonging lifetime of an ion source for generating an ion beam particularly an ion beam containing carbon is proposed here. By mixing the dopant gas and the minor gas together to generate an ion beam, undesired reaction between the gas species and the ion source can be mitigated and thus lifetime of the ion source can be prolonged. Accordingly, quality of ion beam can be maintained. 1. A gas mixture method of prolonging lifetime of an ion source for generating an ion beam comprising:supplying a dopant gas into a container, wherein the dopant gas is a carbon-containing gas used for generating carbon-containing ions; and{'sub': 2', '4', '3', '3', '4, 'supplying a minor gas into the container to dilute the dopant gas for prolonging lifetime of the ion source, wherein the minor gas can be H, CF, Xe, Kr, Ar, PH, AsH, CHor any combination thereof; and'}providing a gas mixture in the ion source chamber to generate the ion beam after mixing the dopant gas and the minor gas at a mixture ratio in the container, wherein the mixture ratio is volume ratio.2. The gas mixture method according to claim 1 , wherein the container is a gas bottle and the dopant gas and minor gas are already pre-mixed at the fixed mixture ratio in the gas bottle.3. (canceled)4. The gas mixture method according to claim 1 , wherein the dopant gas can be CO claim 1 , CO2 claim 1 , CH4 claim 1 , CF4 claim 1 , C2H2O4 or any combination thereof.5. The gas mixture method according to claim 1 , wherein the gas mixture comprises CO2 claim 1 , CO and H2.6. The gas mixture method according to claim 5 , wherein the mixture ratio of CO2 claim 5 , CO and H2 is 10:A:X claim 5 , wherein A ranges from 0.1 to 2 and X ranges from 1 to 6.7. The gas mixture method according to claim 5 , wherein the mixture ratio of CO2 claim 5 , CO and H2 is 10:0.5:3.8. The gas mixture method according to claim 1 , wherein the gas mixture comprises CO2 claim 1 , CO claim 1 , H2 and Xe.9. The gas ...

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Номер записи: 65
17-03-2016 дата публикации

INTEGRATED NANOSPRAY SYSTEM

Номер: US20160079051A1
Автор: Devlin John P., MAW Kurt M., NGO Ben, SCHON Ian, VALASKOVIC Gary
Принадлежит: NEW OBJECTIVE, INC.

Integrated nanospray ionization package, comprising a nanospray emitter, a push button carriage with button element projecting through a bore in said package, an integral high voltage contact pin, a bore in said package for reversible protrusion of the nanospray emitter, a push-and-retract spring mechanism in which the range of forward motion of the emitter is not dependent on range of travel of the said button, and then upon actuation of said button element and spring element for retraction of said nanospray emitter, said nanospray emitter is pushed forward to establish electrical contact, and upon release of said button retracts and breaks the electrical contact. 1. An integrated package for nanospray ionization , comprisinga top assembly cover and a bottom assembly cover, which engage each other to form a package, said package having a front face a rear face, and a bottom face and containinga hollow tube nanospray emitter, coaxially contained in a secondary tube, having a tapered proximal end facing the front face of said package, and a distal end facing the rear face of said package,an electrically conductive, fluid-coupling union having proximal and distal ends connected by a through bore, using compression ferrules in fluid communication and sealing to the distal end of said nanospray emitter,an electrically conductive union carrier, having front, rear, right side and left side faces a bore through the front and rear faces, parallel to the left- and right-side faces, adapted to receive the coupling union and electrospray emitter,an electrical contact pin protruding from the front face of said carrier,a set-screw to hold the coupling union inside the bore of the union carrier,a push-button carriage with button element, having a cavity element facing the union carrier with protruding finger elements adjacent to the side faces of said union carrier,One or more indentation elements on said button carrier facing the bottom part of the package cover,a limiting ...

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Номер записи: 66
16-03-2017 дата публикации

Ion beam device

Номер: US20170076902A1
Автор: Hiroyasu Shichi, Masahiro Yamaoka, Noriaki Arai, Norihide Saho, Shinichi Matsubara
Принадлежит: Hitachi High Technologies Corp

An ion beam device according to the present invention includes a gas field ion source including an emitter tip supported by an emitter base mount, a ionization chamber including an extraction electrode and being configured to surround the emitter tip, and a gas supply tube. A center axis line of the extraction electrode overlaps or is parallel to a center axis line of the ion irradiation light system, and a center axis line passing the emitter tip and the emitter base mount is inclinable with respect to a center axis line of the ionization chamber. Accordingly, an ion beam device including a gas field ion source capable of adjusting the direction of the emitter tip is provided.

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Номер записи: 67
26-03-2015 дата публикации

ION GENERATING APPARATUS

Номер: US20150083931A1
Автор: HARADA Shigeyuki, Kitahira Makoto, Temporin Noriko, Yukawa Shohgo
Принадлежит:

A discharge electrode for generating ions and a high-voltage generating circuit unit that supplies the discharge electrode with a high voltage are housed in a housing . A discharge opening for discharging the generated ions is formed in the housing . The housing is covered by an exterior case . The exterior case is connected to the high-voltage generating circuit unit and functions as an induction electrode. A passage opening leading to the discharge opening is formed in the exterior case . An insulating sheet covers the periphery of the passage opening in the exterior case facing a space into which the ions are discharged so that the discharged ions do not attach to the exterior case . Decrease in the amount of discharged ions can be prevented while using a peripheral component of the discharge electrode as the induction electrode. 1. An ion generating apparatuswherein a discharge electrode for generating ions and a high-voltage generating circuit unit that supplies the discharge electrode with a high voltage are housed in a housing,wherein a discharge opening for discharging the generated ions is formed in the housing,wherein the housing is covered by a shield case,wherein the shield case is connected to the high-voltage generating circuit unit and functions as an induction electrode, andwherein the outer surface of the shield case facing a space into which the ions are discharged is covered by an insulating section so that the discharged ions do not attach to the shield case.2. The ion generating apparatus according to claim 1 ,wherein the high-voltage generating circuit unit has a high-voltage transformer, andwherein the shield case is connected to a secondary side of the high-voltage transformer.3. The ion generating apparatus according to claim 1 ,wherein the shield case is ground-connected by a capacitor.4. The ion generating apparatus according to claim 3 ,wherein the capacitor is interposed between a primary side and the secondary side of the high-voltage ...

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Номер записи: 68
26-03-2015 дата публикации

End-hall ion source with enhanced radiation cooling

Номер: US20150084496A1
Автор: KAHN James R., KAUFMAN Harold R., NETHERY Richard E.
Принадлежит:

In accordance with one embodiment of the present invention, an end-Hall ion source has an electron emitting cathode, an anode, a reflector, an internal pole piece, an external pole piece, a magnetically permeable path, and a magnetic-field generating means located in the permeable path between the two pole pieces. The anode and reflector are enclosed without contact by a thermally conductive cup that has internal passages through which a cooling fluid can flow. The closed end of the cup is located between the reflector and the internal pole piece and the opposite end of the cup is in direct contact with the external pole piece, and wherein the cup is made of a material having a low microhardness, such as copper or aluminum. 1. An end-Hall ion-source apparatus comprising: (i) a discharge region having a first end, a second end, and a side, wherein said first end is open;', '(ii) an electron emitting means located outside of said discharge region;', '(iii) an anode which encloses said discharge region at said side;', '(iv) a reflector, which encloses said discharge region at said second end;', '(v) means for introducing an ionizable working gas into said discharge region;, '(a) an ion generating means comprising;'} (i) a magnetically permeable internal pole piece located outside of said second end of said discharge region and near said reflector;', '(ii) an magnetically permeable and thermally conductive external pole piece located around said first end of said discharge region and between said anode and said electron emitting means;', '(iii) a magnetically permeable path between said internal pole piece and said external pole piece;', '(iv) a magnetic-field generating means located in said magnetically permeable path;, '(b) magnetic-circuit means comprising;'}(c) a cooling means comprising a thermally conductive cup having a closed end, a side wall, an open end, and internal passages through which fluid can flow; wherein said cup encloses said anode and said ...

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Номер записи: 69
18-03-2021 дата публикации

System and method for power conversion

Номер: US20210083587A1
Автор: Mikhail Filippov, Paul Fogel
Принадлежит: Accion Systems Inc

A polarity-selectable high voltage direct current power supply including a first drive assembly that transforms a first low voltage DC input into a first medium voltage alternating current output; a first HV output assembly that transforms the first LV AC output into a first HV DC output, wherein the first HV output assembly defines a first input stage; a polarity selector coupled between the second output junction of the first drive assembly and the first and second input stages of the first HV output assembly, the polarity selector operable between a first configuration and a second configuration; wherein in the first configuration the first HV DC output has a positive polarity; and wherein in the second configuration the first HV DC output has a negative polarity.

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Номер записи: 70
14-03-2019 дата публикации

CHARGED PARTICLE GENERATION DEVICE AND TARGET UNIT

Номер: US20190080874A1
Автор: JUNG Moon Youn, KIM Jinsun
Принадлежит:

Provided is a charged particle generation device. The charged particle generation device includes a light source unit configured to emit a laser, a target layer that receives the laser and emits charged particles, and a focusing structure disposed on the target layer to focus the laser. The focusing structure includes solid films extending on an upper surface of the target layer in a direction away from the target layer, and a pore section disposed between the solid films and having a porous structure. The focusing structure includes a material having a higher atomic number than carbon. 1. A charged particle generation device comprising:a light source unit configured to emit a laser;a target layer that receives the laser and emits charged particles; anda focusing structure disposed on the target layer to focus the laser,wherein the focusing structure comprises:solid films extending on an upper surface of the target layer in a direction away from the target layer; anda pore section disposed between the solid films and having a porous structure,wherein the focusing structure comprises a material having a higher atomic number than carbon.2. The charged particle generation device of claim 1 , wherein the focusing structure comprises aluminum (Al) or zinc (Zn).3. The charged particle generation device of claim 1 , wherein the focusing structure further comprises a metal film surrounding the solid films and the pore section claim 1 , wherein the metal film comprises a material having a higher atomic number than carbon.4. The charged particle generation device of claim 1 , wherein the solid films are arranged along a first direction parallel to the upper surface of the target layer and each of the solid films extends in a second direction intersecting with the first direction.5. The charged particle generation device of claim 1 , wherein the pore section comprises a plurality of pores and a boundary layer surrounding the pores claim 1 , and the boundary layer has a mesh ...

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Номер записи: 71
24-03-2016 дата публикации

LIQUID DROPLET INJECTING APPARATUS AND ION SOURCE

Номер: US20160086758A1
Автор: Iwasaki Kota
Принадлежит:

In the known liquid droplet injecting apparatus, when a tube and a nozzle are heated in order to prevent deposition of a solid source material of liquid droplets, the efficiency of injection of liquid droplets into a vacuum vessel is decreased by evaporation of the liquid droplets. The present invention provides a liquid droplet injecting apparatus capable of efficiently injecting liquid droplets into a vacuum vessel. The liquid droplet injecting apparatus includes a liquid container which holds a liquid and whose inside pressure can be adjusted, a liquid droplet generating unit configured to generate liquid droplets from the liquid held in the liquid container, a nozzle which injects the liquid droplets generated in the liquid container, a connecting tube which connects the nozzle and the liquid container, and a first heating unit configured to heat at least one of the connecting tube and the nozzle. 1. A liquid droplet injecting apparatus comprising:a liquid container which holds a liquid and whose inside pressure can be adjusted;a liquid droplet generating unit configured to generate liquid droplets from the liquid held in the liquid container;a nozzle which injects the liquid droplets generated in the liquid container;a connecting tube which connects the nozzle and the liquid container; anda first heating unit configured to heat at least one of the connecting tube and the nozzle.2. The liquid droplet injecting apparatus according to claim 1 , wherein the partial pressure of a substance constituting the liquid droplets in the connecting tube is higher than the vapor pressure of the substance.3. The liquid droplet injecting apparatus according to claim 1 , further comprising a gas introduction tube which has an opening disposed in the liquid container and which introduces a gas into the liquid container.4. The liquid droplet injecting apparatus according to claim 1 , wherein the liquid droplet generating unit includes a vibrator which is disposed on the liquid ...

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Номер записи: 72
24-03-2016 дата публикации

Plasma Generator With at Least One Non-Metallic Component

Номер: US20160086759A1
Автор: Hahto Sami K., Horsky Thomas N.
Принадлежит:

A plasma generator for an ion implanter is provided. The plasma generator includes an ionization chamber for forming a plasma that is adapted to generate a plurality of ions and a plurality of electrons. An interior surface of the ionization chamber is exposed to the plasma and constructed from a first non-metallic material. The plasma generator also includes a thermionic emitter including at least one surface exposed to the plasma. The thermionic emitter is constructed from a second non-metallic material. The plasma generator further includes an exit aperture for extracting at least one of the plurality of ions or the plurality of electrons from the ionization chamber to form at least one of an ion beam or an electron flux. The ion beam or the electron flux comprises substantially no metal. The first and second non-metallic materials can be the same or different from each other. 1. A plasma generator for an ion implanter , the plasma generator comprising:an ionization chamber for forming a plasma that is adapted to generate a plurality of ions and a plurality of electrons, an interior surface of the ionization chamber being exposed to the plasma and constructed from a first non-metallic material;a thermionic emitter including at least one surface exposed to the plasma, the thermionic emitter being constructed from a second non-metallic material; andan exit aperture for extracting at least one of the plurality of ions or the plurality of electrons from the ionization chamber to form at least one of an ion beam or an electron flux, wherein the ion beam or the electron flux comprises substantially no metal.2. The plasma generator of claim 1 , wherein the thermionic emitter comprises one of an indirectly-heated cathode (IHC) or a filament.3. The plasma generator of claim 1 , wherein the interior surface of the ionization chamber comprises a liner of the ionization chamber.4. The plasma generator of claim 1 , further comprising at least one of a repeller electrode or a ...

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Номер записи: 73
23-03-2017 дата публикации

GRID, METHOD OF MANUFACTURING THE SAME, AND ION BEAM PROCESSING APPARATUS

Номер: US20170084419A1
Автор: NAKAGAWA Yukito, Tsujiyama Masashi, Yasumatsu Yasushi
Принадлежит:

A grid of the present invention is a plate-shaped grid provided with a hole. The grid is formed of a carbon-carbon composite including carbon fibers arranged in random directions along a planar direction of the grid, and the hole is formed in the grid so as to cut off the carbon fibers. 1. A plate-shaped grid provided with a hole , whereinthe grid is formed of a carbon-carbon composite including carbon fibers arranged in random directions along a planar direction of the grid, andthe hole is formed in the grid so as to cut off the carbon fibers.2. The grid according to claim 1 , wherein the carbon fibers included in the carbon-carbon composite are chopped carbon fibers.3. The grid according to claim 1 , wherein at least part of the carbon-carbon composite is coated with a different material from the carbon-carbon composite.4. An ion beam processing apparatus comprising:a plasma generating unit;a processing chamber; and{'claim-ref': {'@idref': 'CLM-00001', 'claim 1'}, 'a grid assembly including the grid according to and configured to extract ions from plasma generated by the plasma generating unit to the processing chamber.'}5. A method of manufacturing a grid comprising:preparing a plate-shaped carbon-carbon composite including carbon fibers arranged in random directions along a planar direction of the carbon-carbon composite; andforming a hole in the carbon-carbon composite so as to cut off the carbon fibers by using a processing tool configured to perform cutting by rotary motion. This application is a continuation application of International Application No. PCT/JP2015/005851, filed Nov. 25, 2015, which claims the benefit of Japanese Patent Application No. 2015-052363 filed Mar. 16, 2015. The contents of the aforementioned applications are incorporated herein by reference in their entireties.Field of the InventionThe present invention relates to a grid plate, a method of manufacturing the same, and an ion beam processing apparatus.Description of the Related ArtIon ...

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Номер записи: 74
19-06-2014 дата публикации

Ion Source Having Increased Electron Path Length

Номер: US20140166870A1
Автор: Irina Molodetsky, Jani Reijonen, Kenneth E. Stephenson
Принадлежит: Schlumberger Technology Corp

An ion source includes a cathode to emit electrons, a cathode grid downstream of the cathode, a reflector electrode downstream of the cathode grid, reflector grid radially inward of the reflector electrode, and an extractor electrode downstream of the reflector electrode, the extractor electrode and cathode grid defining an ionization region therebetween. The cathode and the cathode grid have a first voltage difference such the electrons are accelerated through the cathode grid and into the ionization region on a trajectory toward the extractor electrode. The reflector grid and the extractor electrode have a second voltage difference less than the first voltage difference such that the electrons slow as they near the extractor electrode and are repelled on a trajectory toward the reflector electrode. The reflector electrode has a negative potential such that the electrons are repelled away from the reflector electrode and into the ionization region.

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Номер записи: 75
31-03-2016 дата публикации

Purifier

Номер: US20160089470A1
Автор: LIU Yigang, Ran Hongyu, Wei Zhaofeng, Zhang Yan
Принадлежит:

Described is an ion air purifier. The ion air purifier includes a collector module () and a repeller module () which are connected in an openable and closable manner, wherein several collector plates () are uniformly distributed on the collector module (), and several repeller plates () are uniformly distributed on the repeller module (); and each collector plate () and each repeller plate () are alternately arranged when the two plates are in a closed state. Thus, an optimized distance between adjacent collector plates () and repeller plates () is ensured; and when the collector module () and the repeller module () are in an opened state, the collector plates () are separated from the repeller plates (), and the distance between two adjacent collector plates () and the distance between two adjacent repeller plates () are both increased, thereby facilitating cleaning of the collector module. Further described is a network air purifier. 1121112121121. An ion air purifier , comprising a collector module () and a repeller module () , which are connected in an openable and closable manner; several collector plates () parallel to each other are uniformly distributed on the collector module () , and several repeller plates () parallel to each other are uniformly distributed on the repeller module (); the collector module and the repeller module are isolated electrically , and each collector plate () and each repeller plate () are alternately arranged when the two plates are in a closed state.231213. The ion air purifier according to claim 1 , wherein a rotating shaft () is provided on one end of the collector module () claim 1 , and the repeller module () is opened relative to the collector module () around the rotating shaft ().334124. The ion air purifier according to claim 2 , wherein one end of the collector module away from the rotating shaft () is provided with a fixing member () claim 2 , and the collector module () and the repeller module () are fixedly connected ...

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Номер записи: 76
31-03-2022 дата публикации

Apparatus and method for ionizing an analyte, and apparatus and method for analyzing an ionized analyte

Номер: US20220102129A1
Автор: Jan-Christoph WOLF
Принадлежит: Plasmion GmbH

The present invention discloses an ionization apparatus 10 for ionizing an analyte S, comprising an inlet E, an outlet A, a first electrode 1, a second electrode 2 and a dielectric element 3. The first electrode 1, the second electrode 2 and the dielectric element 3 are arranged relative to one another such that, by applying an electric voltage between the first electrode 1 and the second electrode 2, a dielectric barrier discharge is establishable in a discharge area 5 in the ionization apparatus 10. The first and second electrodes 1, 2 are arranged such that they are displaceable or movable relative to each other.

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Номер записи: 77
12-03-2020 дата публикации

REPELLER, CATHODE, CHAMBER WALL AND SLIT MEMBER FOR ION IMPLANTER AND ION GENERATING DEVICES INCLUDING THE SAME

Номер: US20200083018A1
Автор: Hwang Kyou Tae
Принадлежит:

Provided are elements for an ion implanter and an ion generating device including the same. The elements include a repeller, a cathode, a chamber wall, and a slit member constituting an arc chamber of an ion generating device for ion implantation used in the fabrication of a semiconductor device. A coating structure including a semicarbide layer is provided to each of the elements in order to stabilize the element against thermal deformation, protect the element from wear, and prevent a deposition product from being peeled off. The coating structure enables precise ion implantation without a change in the position of ion generation or distortion of the equipment. The coating structure allows electrons to be uniformly reflected into the arc chamber to increase the uniformity of plasma, resulting in an improvement in the dissociation efficiency of an ion source gas. The coating structure significantly improves the service life of the element compared to those of existing elements. Also provided are ion generating devices including the elements. 1. A chamber wall mounted inside an arc chamber of an ion generating device for an ion implanter to define a space where ions are generated wherein the chamber wall covers four sides of the arc chamber and its portion corresponding to at least one of the four sides of the arc chamber has a refractory metal material as a base material forming its shape and has a coating structure comprising a semicarbide layer on at least one surface of the base material.2. The chamber wall according to claim 1 , wherein the coating structure comprising a semicarbide layer comprises a refractory metal carbide structure in which a continuous or discontinuous refractory metal monocarbide layer is layered on a continuous or discontinuous refractory metal semicarbide layer.3. The chamber wall according to claim 1 , wherein the coating structure comprising a semicarbide layer comprises a refractory metal carbide structure in which a continuous or ...

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Номер записи: 78
29-03-2018 дата публикации

Method Of Improving Ion Beam Quality In A Non-Mass-Analyzed Ion Implantation System

Номер: US20180087148A1
Автор: Bon-Woong Koo, Christopher J. Leavitt, John A. Frontiero, Svetlana B. Radovanov, Timothy J. Miller
Принадлежит: Varian Semiconductor Equipment Associates Inc

A method of processing a workpiece is disclosed, where the plasma chamber is first coated using a conditioning gas and optionally, a co-gas. The conditioning gas, which is disposed within a conditioning gas container may comprise a hydride of the desired dopant species and a filler gas, where the filler gas is a hydride of a Group 4 or Group 5 element. The remainder of the conditioning gas container may comprise hydrogen gas. Following this conditioning process, a feedgas, which comprises fluorine and the desired dopant species, is introduced to the plasma chamber and ionized. Ions are then extracted from the plasma chamber and accelerated toward the workpiece, where they are implanted without being first mass analyzed. In some embodiments, the desired dopant species may be boron.

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Номер записи: 79
31-03-2016 дата публикации

Air Ionization Module

Номер: US20160093461A1
Автор: Beda Weibel, Michael Oswald
Принадлежит: LK Luftqualitat AG

The invention relates to air ionization modules with ionization tubes removably arranged in mounts and to a support comprising the mounts. The air ionization modules are characterized in particular in that as little condensation as possible occurs while enriching an air flow with ions. For this purpose, the support has two mutually spaced plates, a first plate being an assembly plate and a second plate being a circuit board comprising the mounts. Furthermore, a body made of a heat-insulating material is located between the plates such that the second plate is arranged so as to be heat-insulated relative to the first plate. The air ionization module is used to generate ions in an air flow for at least one inner room of a building. Ionized air leads to a separation of multiple odor-causing molecules, an eradication of microorganisms, a degradation of volatile gaseous hydrocarbons, and a reduction of the oxide potential of the air, for example. In this manner, a comfortable, near-natural air is produced in the room supplied with the air.

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Номер записи: 80
26-06-2014 дата публикации

Ion Source, Nanofabrication Apparatus Comprising Such Source, and a Method for Emitting Ions

Номер: US20140175301A1
Автор: Allemandou Nicolas, Donnier-Valentin Guillaume, Gavand Pauline, Gierak Jacques, Hasselbach Klaus, Leggeri Jean-Paul, Purcell Stephen
Принадлежит:

A ion source comprises: a chamber (), an injection to inject matter into the chamber, wherein said matter comprises at least a first species, a tip with an apex located in the chamber, wherein the apex has a surface made of a metallic second species, a generator to generate ions of said species, and a regulation system adapted to set operative conditions of the chamber to alternatively generate ions from the gaseous first species, and ions from the non-gaseous metallic second species. 1. A ion source comprising:a chamber having at least one entry port and one exit aperture,an injection adapted to inject matter into the chamber through the entry port, wherein said matter comprises at least a first species,a tip having an apex located in the chamber, wherein the apex has a surface made of a metallic second species,wherein said first species and said metallic second species have different ionization voltages,a generator, adapted to apply a voltage to said tip to ionise species inside said chamber, thereby generating ions of said species,an extractor, adapted to move said ions out from the chamber through the exit aperture,a regulation system adapted to set operative conditions of the chamber, including at least a temperature and a pressure inside the chamber, and said voltage, to alternatively generate:in a first operative setting, ions from the gaseous first species,in a second operative setting, ions from the non-gaseous metallic second species.2. An ion source according to claim 1 , comprising a thermal system claim 1 , adapted to place the chamber at a temperature claim 1 ,wherein the first species has a lower vaporization temperature and a higher ionisation voltage than the metallic second species,{'b': '11', 'claim-text': a voltage regulator adapted to set the voltage at least at a first value between the ionisation voltages of the metallic second species and the first species, and at a second value greater than the ionisation voltage of the first species,', 'a ...

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Номер записи: 81
16-04-2015 дата публикации

Method Of Cleaning An Extraction Electrode Assembly Using Pulsed Biasing

Номер: US20150101634A1
Автор: Kurunczi Peter F., Leavitt Christopher J.
Принадлежит:

A system and method of improving the performance and extending the lifetime of an ion source is disclosed. The ion source includes an ion source chamber, a suppression electrode and a ground electrode. In the processing mode, the ion source chamber may be biased to a first positive voltage, while the suppression electrode is biased to a negative voltage to attract positive ions from within the chamber through an aperture and toward the workpiece. In the cleaning mode, the ion beam is defocused so that it strikes the suppression electrode and the ground electrode. The voltages applied to the ion source chamber and the electrodes are pulsed to minimize the possibility of glitches during this cleaning mode. 1. An ion source comprising:an ion source chamber for generation of a process plasma during a processing mode and a cleaning plasma during a cleaning mode, said ion source chamber having an extraction aperture;a suppression electrode having a suppression electrode aperture, said suppression electrode disposed proximate said extraction aperture, wherein an ion beam extracted from said extraction aperture during said cleaning mode is defocused so as to strike said suppression electrode; anda biasing system configured to periodically stop said ion beam from striking said suppression electrode during said cleaning mode and to ground said suppression electrode and said ion source chamber when said ion beam is periodically stopped.2. The ion source of claim 1 , comprising a glitch detector claim 1 , wherein claim 1 , in said processing mode claim 1 , said biasing system grounds said suppression electrode and said ion source chamber when a glitch is detected.3. The ion source of claim 1 , wherein a source gas is used to generate said process plasma in said processing mode claim 1 , and a cleaning gas claim 1 , different than said source gas claim 1 , is used to generate said cleaning plasma in said cleaning mode.4. The ion source of claim 1 , wherein said ion beam is ...

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Номер записи: 82
05-04-2018 дата публикации

ATOM AND ION SOURCES AND SINKS, AND METHODS OF FABRICATING THE SAME

Номер: US20180098411A1
Автор: Bernstein Jonathan J.
Принадлежит:

A bi-directional device for generating or absorbing atoms or ions. In some embodiments, the device comprises a solid-phase ion-conducting material, a first electrode positioned on a first surface of the solid-phase ion-conducting material, and a second electrode positioned on a second surface of the solid-phase ion-conducting material. The first electrode includes a plurality of triple phase boundaries, each located at an interface between the solid-phase ion-conducting material and the first electrode. A density of the triple phase boundaries is in the range of about 10m/mto about 2×10m/mon the first surface of the ion-conducting material. A method of operating the bi-directional device and a method of fabricating a bi-directional device are also provided. 1. A bi-directional device for generating or absorbing atoms or ions , the device comprising:a solid-phase ion-conducting material, the solid-phase ion-conducting material including an element selected from the group consisting of an alkali metal, an alkaline earth metal, and a rare earth metal;a first electrode positioned on a first surface of the solid-phase ion-conducting material;a second electrode positioned on a second surface of the solid-phase ion-conducting material;a plurality of triple phase boundaries, each triple phase boundary located at an interface between the solid-phase ion-conducting material and the first electrode; and{'sup': 4', '2', '7', '2, 'a density of the triple phase boundaries in the range of about 10m/mto about 2×10m/mon the first surface of the ion-conducting material.'}2. The device of claim 1 , wherein the first electrode covers less than 10% of the first surface.3. The device of claim 1 , wherein the first electrode covers less than 3% of the first surface.4. The device of claim 1 , wherein the first electrode includes a plurality of contiguous ion-conducting particles disposed on the first surface claim 1 , the plurality of contiguous ion-conducting particles leaving contiguous ...

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Номер записи: 83
14-04-2016 дата публикации

ION GENERATION APPARATUS AND ELECTRIC EQUIPMENT INCLUDING THE SAME

Номер: US20160104595A1
Автор: IZU Koichi, Nishida Hiromu, OHE NOBUYUKI, Sekoguchi Yoshinori
Принадлежит:

A housing, a substrate accommodated in the housing, a needle electrode for generating ions through discharging, which is held by the substrate such that a tip end portion protrudes outside the housing, an insulating sealing portion insulating and sealing the substrate in the housing, and an electrode protection portion for protecting the needle electrode outside the housing are included. The housing is provided with an opening portion through which a side of the tip end portion of the needle electrode is inserted and which is sealed with the insulating sealing portion. The electrode protection portion has a first protection portion and a second protection portion which are provided to protrude from the housing relative to the tip end portion of the needle electrode and opposed to each other at a distance from each other on opposing sides of the needle electrode. 1. An ion generation apparatus , comprising:a housing;a substrate accommodated in said housing;a needle electrode for generating ions through discharging, which is held by said substrate such that a tip end portion protrudes outside said housing;an insulating sealing portion insulating and sealing said substrate in said housing; andan electrode protection portion for protecting said needle electrode outside said housing,said housing being provided with an opening portion through which a side of the tip end portion of said needle electrode is inserted and which is sealed with said insulating sealing portion, andsaid electrode protection portion having a first protection portion and a second protection portion provided to protrude from said housing relative to the tip end portion of said needle electrode and opposed to each other at a distance from each other on opposing sides of said needle electrode.2. The ion generation apparatus according to claim 1 , wherein a hole through which air toward said needle electrode passes is provided in at least one of said first protection portion and said second protection ...

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Номер записи: 84
14-04-2016 дата публикации

ELECTRON GUN, CHARGED PARTICLE GUN, AND CHARGED PARTICLE BEAM APPARATUS USING ELECTRON GUN AND CHARGED PARTICLE GUN

Номер: US20160104597A1
Автор: Imai Yuta, Morishita Hideo, OHSHIMA Takashi
Принадлежит:

The purpose of the present invention is to provide a charged particle gun using merely an electrostatic lens, said charged particle gun being relatively small and having less aberration, and to provide a field emission-type charged particle gun having high luminance even with a high current. This charged particle gun has: a charged particle source; an acceleration electrode that accelerates charged particles emitted from the charged particle source; a control electrode, which is disposed further toward the charged particle source side than the acceleration electrode, and which has a larger aperture diameter than the aperture diameter of the acceleration electrode; and a control unit that controls, on the basis of a potential applied to the acceleration electrode, a potential to be applied to the control electrode. 1. An electron gun comprising:a needle-like electron source acting as a field emission type electron source; an acceleration electrode to accelerate an electron emitted from the electron source;a control electrode disposed nearer to a side of the electron source than to a side of the acceleration electrode and having an aperture diameter larger than an aperture diameter of the acceleration electrode; anda control section to control a potential applied to the control electrode based on a potential applied to the acceleration electrode.2. The electron gun according to claim 1 , wherein provided that the aperture diameter of the control electrode is defined as D and a distance between the electron source and the acceleration electrode is defined as L claim 1 , a fraction of D to L is expressed with D/L<1.3. The electron gun according to claim 2 , wherein the distance between the electron source and the acceleration electrode is defined as 6 mm Подробнее

Номер записи: 85
03-07-2014 дата публикации

Ion source using field emitter array cathode and electromagnetic confinement

Номер: US20140184074A1
Автор: Luke Perkins
Принадлежит: Schlumberger Technology Corp

An ion source for use in a radiation generator tube includes a back passive cathode electrode, a passive anode electrode downstream of the back passive cathode electrode, a magnet adjacent the anode, and a front passive cathode electrode downstream of the passive anode electrode. The front passive cathode electrode and the back passive cathode electrode define an ionization region therebetween. At least one field emitter array (FEA) cathode is configured to electrostatically discharge due to an electric field in the ion source. The back passive cathode electrode and the passive anode electrode, and the front passive cathode electrode and the passive anode electrode, have respective voltage differences therebetween, and the magnet generating a magnetic field, such that a Penning-type trap is produced to confine electrons from the electrostatic discharge to the ionization region. At least some of the electrons in the ionization region interact with an ionizable gas to create ions.

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Номер записи: 86
12-04-2018 дата публикации

CHARGE STRIPPING FILM FOR CHARGE STRIPPING DEVICE OF ION BEAM

Номер: US20180102195A1
Автор: Hasebe Hiroo, MURAKAMI Mutsuaki, Tachibana Masamitsu, Tatami Atsushi
Принадлежит:

A charge stripping film for a charge stripping device of ion beam is a carbon film produced by annealing a polymer film, and has a film thickness of 10 μm to 150 μm, an area of at least 4 cm, and an atomic concentration of carbon of at least 97%. A charge stripping film for a charge stripping device of ion beam is a carbon film having a thermal conductivity in a film surface direction at 25° C. of at least 300 W/mK, and has a film thickness of 10 μm to 150 μm, an area of at least 4 cm, and an atomic concentration of carbon of at least 97%. 1. A charge stripping film for a charge stripping device of ion beam , whereinthe charge stripping film is a carbon film produced by annealing a polymer film, and{'sup': '2', 'the charge stripping film has a film thickness of 10 μm to 150 μm, an area of at least 4 cm, and an atomic concentration of carbon of at least 97%.'}2. A charge stripping film for a charge stripping device of ion beam , whereinthe charge stripping film is a carbon film having a thermal conductivity in a film surface direction at 25° C. of at least 300 W/mK, and{'sup': '2', 'the charge stripping film has a film thickness of 10 μm to 150 μm, an area of at least 4 cm, and an atomic concentration of carbon of at least 97%.'}3. The charge stripping film according to claim 1 , wherein the charge stripping film has a density of 0.90 g/cmto 2.26 g/cm.4. The charge stripping film according to claim 1 , wherein the charge stripping film has a weight per unit area of 1.5 mg/cmto 30 mg/cm.5. The charge stripping film according to claim 1 ,wherein the carbon film is produced by annealing the polymer film at a temperature of at least 2400° C. in an inert gas atmosphere, andwherein the polymer film comprises at least one selected from the group consisting of polyamide, polyimide, polyquinoxaline, polyparaphenylene vinylene, polyoxadiazole, polybenzimidazole, polybenzoxazole, polybenzothiazole, polyquinazolinedione, polybenzoxazinone, polyquinazolone, ...

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Номер записи: 87
12-04-2018 дата публикации

DC DISTRIBUTION CONNECTION DEVICE

Номер: US20180103530A1
Автор: EJIRI Koichiro, KONDO Haruhiko
Принадлежит: SMK CORPORATION

The respective proportionality constants of magnetic force by magnetic field producing portion for biasing the plug in the direction of insertion and resilient force by a spring mechanism for biasing the plug in the direction of extraction are adjusted in such a manner that the resilient force is greater than the magnetic force until the plug pin reaches an intermediate insertion position at which the plug pin comes into proximity to or separates from the socket contact, whereas the magnetic force is greater than the resilient force at a position at which the plug pin is inserted into a complete insertion position for a hot-line connection to the socket contact. The plug pin in the vicinity of the intermediate insertion position, at which there is a possibility of occurrence of an arc discharge, is ejected by the resilient force. 1. A DC distribution connection device comprising:a plug having plug pins to be connected to a DC load;a socket having socket contacts which are connected to a DC power supply and located in plug insertion holes that guide the plug pins so as to be freely inserted therein and extracted therefrom, wherein the plug pins and the socket contacts are brought into contact with each other between an intermediate insertion position of the plug pins at which the socket contacts come into proximity thereto or separate therefrom and a complete insertion position at which the plug pins have been inserted from the intermediate insertion position in a direction of insertion, and at the complete insertion position, the plug pins make a hot-line connection to the socket contacts;magnetic field producing portion that is formed between the plug and the socket in a direction of insertion and extraction of the plug pins, the magnetic field producing portion attracting the plug by a magnetic force in a direction of insertion of the plug pins; anda spring mechanism that is disposed between the plug and the socket in the direction of insertion and extraction of ...

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Номер записи: 88
08-04-2021 дата публикации

ION BEAM PROCESSING APPARATUS, ELECTRODE ASSEMBLY, AND METHOD OF CLEANING ELECTRODE ASSEMBLY

Номер: US20210104377A1
Автор: Okamoto Naoyuki, SUZUKI Fumihito, Tsujiyama Masashi, Yasumatsu Yasushi
Принадлежит:

Provided is an ion beam processing apparatus including an ion generation chamber, a processing chamber, and electrodes to form an ion beam by extracting ions generated in the ion generation chamber to the processing chamber. The electrodes includes a first electrode disposed close to the ion generation chamber and provided with an ion passage hole to allow passage of the ions, and a second electrode disposed adjacent to the first electrode and closer to the processing chamber than the first electrode is, and provided with an ion passage hole to allow passage of the ions. The apparatus also includes a power unit which applies different electric potentials to the first electrode and the second electrode, respectively, so as to accelerate the ions generated by an ion generator in the ion generation chamber. A material of the first electrode is different from a material of the second electrode. 1an ion generation chamber including an ion generator;a processing chamber in which the processing is performed and a holder to hold a substrate is disposed; a first electrode disposed close to the ion generation chamber and provided with an ion passage hole to allow passage of the ions, and', 'a second electrode disposed adjacent to the first electrode and closer to the processing chamber than the first electrode is, and provided with an ion passage hole to allow passage of the ions; and, 'a plurality of electrodes configured to separate the ion generation chamber from the processing chamber, and to form an ion beam by extracting ions generated in the ion generation chamber to the processing chamber, the plurality of electrodes includinga power unit configured to apply different electric potentials to the first electrode and the second electrode, respectively, so as to accelerate the ions generated by the ion generator in the ion generation chamber,wherein a material of the first electrode is different from a material of the second electrode,wherein the plurality of electrodes ...

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Номер записи: 89
21-04-2016 дата публикации

Ion Beam Uniformity Control

Номер: US20160111241A1
Автор: Koo Bon-Woong, Likhanskii Alexandre, Radovanov Svetlana B.
Принадлежит:

A plasma chamber having improved controllability of the ion density of the extracted ribbon ion beam is disclosed. A plurality of pairs of RF biased electrodes is disposed on opposite sides of the extraction aperture in a plasma chamber. In some embodiments, one of each pair of RF biased electrodes is biased at the extraction voltage, while the other of each pair is coupled to a RF bias power supply, which provides a RF voltage having a DC component and an AC component. In another embodiment, both of the electrodes in each pair are coupled to a RF biased power supply. A blocker may be disposed in the plasma chamber near the extraction aperture. In some embodiments, RF biased electrodes are disposed on the blocker. 1. A plasma chamber , comprising:a power source to generate a plasma within the plasma chamber;a chamber wall having an extraction aperture through which ions from the plasma are extracted, the chamber wall biased at an extraction voltage;a blocker disposed within the plasma chamber proximate the extraction aperture, biased at the extraction voltage;an RF biased electrode disposed on the blocker; andan RF bias power supply to supply a RF voltage to the RF biased electrode.2. The plasma chamber of claim 1 , wherein the RF voltage comprises a DC component and an AC component and the DC component is equal to the extraction voltage.3. The plasma chamber of claim 1 , further comprising a plurality of RF biased electrodes disposed on the blocker along a length of the extraction aperture.4. The plasma chamber of claim 3 , wherein each of the plurality of RF biased electrodes is separately powered by the RF bias power supply.5. The plasma chamber of claim 1 , wherein a power level of the RF voltage determines an angle of incidence of ions passing between the blocker and the chamber wall.6. A plasma chamber claim 1 , comprising:a power source to generate a plasma within the plasma chamber;a chamber wall having an extraction aperture through which ions from the ...

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Номер записи: 90
02-06-2022 дата публикации

Sputter ion pump with penning-trap current sensor

Номер: US20220172935A1
Автор: Farhad Majdeteimouri, Steven Michael Hughes
Принадлежит: Coldquanta Inc

A sputter-ion-pump system includes a sputter ion pump and an electronic drive. The electronic drive supplies a voltage across the ion pump to establish, in cooperation with a magnetic field, a Penning trap within the ion pump. A current sensor measures the Penning-trap current across the Penning trap. The Penning trap is used as an indication of pressure within the ion pump or a vacuum chamber including or in fluid communication with the ion pump. The pressure information can be used to determine flow rates, e.g., due to a load, outgassing, and/or leakage from an ambient.

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Номер записи: 91
11-04-2019 дата публикации

SYSTEMS AND METHODS FOR PROVIDING AN ION BEAM

Номер: US20190108965A1
Автор: Brink-Danan Sagi, Eisenmann Shmuel, FERBER Yair, HEFETS Ynon, PAPEER Evgeny, SHAHAM Assaf, SHAVIT Omer, WEINFELD Boaz
Принадлежит:

Systems for generating a proton beam include an electromagnetic radiation beam (e.g., a laser) that is directed onto an ion-generating target by optics to form the proton beam. A detector is configured to measure a laser-target interaction property, which a processor uses to produce a feedback signal that can be used to alter the proton beam by adjusting the source of the electromagnetic radiation beam, the optics, or a relative position or orientation of the electromagnetic radiation beam to the ion-generating target. By adjusting the laser-target interaction, the feedback can be used to control properties of the proton beam, such as the proton beam energy or flux. Such systems have certain advantages, including reducing the size, complexity, and cost of machines used to generate proton beams, while also improving their speed, precision, and configurability. 1. A system for generating a proton beam , the system comprising:an interaction chamber configured to support an ion-generating target;an electromagnetic radiation source configured to provide an electromagnetic radiation beam;one or more optics components configured to direct the electromagnetic radiation beam at the ion-generating target to thereby cause a resultant proton beam;a detector configured to measure at least one laser-target interaction property; and receive a feedback signal based on the at least one laser-target interaction property measured by the detector, wherein the feedback signal is indicative of a relationship between the proton beam and the electromagnetic radiation beam; and', 'based on the received feedback signal, alter the proton beam by adjusting an item among at least one of the following: (A) the electromagnetic radiation source, (B) the one or more optics components, (C) at least one of a relative position and orientation of the electromagnetic radiation beam to the ion-generating target', 'wherein altering the proton beam includes altering a temporal profile of the ...

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Номер записи: 92
11-04-2019 дата публикации

ION BEAM PROCESSING APPARATUS, ELECTRODE ASSEMBLY, AND METHOD OF CLEANING ELECTRODE ASSEMBLY

Номер: US20190108973A1
Автор: Okamoto Naoyuki, SUZUKI Fumihito, Tsujiyama Masashi, Yasumatsu Yasushi
Принадлежит:

Provided is an ion beam processing apparatus including an ion generation chamber, a processing chamber, and electrodes to form an ion beam by extracting ions generated in the ion generation chamber to the processing chamber. The electrodes includes a first electrode disposed close to the ion generation chamber and provided with an ion passage hole to allow passage of the ions, and a second electrode disposed adjacent to the first electrode and closer to the processing chamber than the first electrode is, and provided with an ion passage hole to allow passage of the ions. The apparatus also includes a power unit which applies different electric potentials to the first electrode and the second electrode, respectively, so as to accelerate the ions generated by an ion generator in the ion generation chamber. A material of the first electrode is different from a material of the second electrode. 1. An ion beam processing apparatus configured to perform processing by ion beam irradiation , comprising:an ion generation chamber including an ion generator;a processing chamber in which the processing is performed and a holder to hold a substrate is disposed; a first electrode disposed close to the ion generation chamber and provided with an ion passage hole to allow passage of the ions, and', 'a second electrode disposed adjacent to the first electrode and closer to the processing chamber than the first electrode is, and provided with an ion passage hole to allow passage of the ions; and, 'a plurality of electrodes configured to separate the ion generation chamber from the processing chamber, and to form an ion beam by extracting ions generated in the ion generation chamber to the processing chamber, the plurality of electrodes including'}a power unit configured to apply different electric potentials to the first electrode and the second electrode, respectively, so as to accelerate the ions generated by the ion generator in the ion generation chamber,wherein a material of the ...

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Номер записи: 93
17-07-2014 дата публикации

Ion generator

Номер: US20140197332A1
Автор: Yasutaka Kataoka
Принадлежит: Sharp Corp

Two flow passages are provided for allowing the passage of air sent out from a blower in the same direction individually and discharging the air to outside. An ion generation unit for generating positive ions by only corona discharge is arranged at one flow passage, and an ion generation unit for generating electrostatic atomized water particles with negative polarity by electrostatic atomizing phenomenon is arranged at the other flow passage. A throttle is provided at the one flow passage for making the wind speed of air flowing through the one flow passage faster than the wind speed of air flowing through the other flow passage. Since positive ions having shorter lifetime are emitted more than electrostatic atomized water particles with negative polarity having longer lifetime, the balance between positive and negative polarities in the air can be sustained over a long period of time.

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Номер записи: 94
07-05-2015 дата публикации

ION GENERATOR

Номер: US20150123008A1
Автор: FUKADA Yoshinari
Принадлежит:

In an ion generator, a flexible discharge electrode composed of one wire is provided to a base , and a swinging motion or a turning motion of a free end of the discharge electrode about a fixed end of the discharge electrode is performed by repulsive force of a corona discharge generated by supplying a high voltage to the fixed end . Therefore, in comparison with a discharge electrode composed of a bundle of thin wires, it is possible to significantly reduce dust emission from the free end of the discharge electrode , and to further improve the ion generator in maintenance interval. Since the discharge electrode is compose of one wire, it is possible to reduce the discharge electrode in size, easily observe the state of the discharge electrode , and simplify its maintenance. Since the discharge electrode performs the swinging motion or the turning motion, it is possible to transport the generated air ions EI to a wide area of a packaging film , and to enhance ionizing efficiency. 1. An ion generator comprising a flexible discharge electrode which is composed of one wire , and which has a fixed end and a free end ,wherein a turning motion or a swinging motion of the free end about the fixed end is performed by repulsive force of a corona discharge generated by supplying a high voltage to the fixed end.2. The ion generator according to claim 1 , further comprising a turning-motion control member for controlling a turning motion of the discharge electrode.3. The ion generator according to claim 1 , wherein the discharge electrode is disposed in an air supply channel for guiding air toward an air outlet claim 1 , and the free end performs the swinging motion.4. The ion generator according to claim 3 , wherein the free end of the discharge electrode performs the swinging motion in a crossing direction with respect to air flow toward the air outlet.5. The ion generator according to claim 3 , wherein the discharge electrode is disposed along the air outlet.6. The ion ...

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Номер записи: 95
27-04-2017 дата публикации

Ion Source For Multiple Charged Species

Номер: US20170117113A1
Автор: Ackerman David, Alvarado Daniel, Becker Klaus
Принадлежит:

An indirectly heated cathode (IHC) ion source having improved life is disclosed. The IHC ion source comprises a chamber having a cathode and a repeller on opposite ends of the ion source. Biased electrodes are disposed on one or more sides of the ion source. The bias voltage applied to at least one of the cathode, the repeller and the electrodes, relative to the chamber, is varied over time. In certain embodiments, the voltage applied to the electrodes may begin at an initial positive voltage. Over time, this voltage may be reduced, while still maintaining the target ion beam current. Advantageously, the life of the cathode is improved using this technique. 1. An indirectly heated cathode ion source , comprising:a chamber into which a gas is introduced;a cathode disposed on one end of the chamber;a repeller disposed at an opposite end of the chamber; andat least one electrode disposed along a side of the chamber;wherein a voltage applied to at least one of the cathode, the repeller and the at least one electrode relative to the chamber varies over time.2. The indirectly heated cathode ion source of claim 1 , wherein the voltage decreases over time.3. The indirectly heated cathode ion source of claim 1 , further comprising a controller claim 1 , wherein the controller monitors hours of operation of the indirectly heated cathode ion source and determines the voltage to be applied based on hours of.4. The indirectly heated cathode ion source of claim 1 , further comprising a controller in communication with a current measurement system claim 1 , wherein the measurement system measures current of an ion beam extracted from the indirectly heated cathode ion source through an extraction aperture claim 1 , and the controller adjusts the voltage to be applied based on measured current of the ion beam.5. The indirectly heated cathode ion source of claim 1 , wherein the voltage is applied to the at least one electrode.6. The indirectly heated cathode ion source of claim 1 , ...

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Номер записи: 96
14-05-2015 дата публикации

ION GENERATOR AND ION GENERATING METHOD

Номер: US20150129775A1
Автор: SATO Masateru
Принадлежит:

An ion generator is provided with: an arc chamber that is at least partially made up of a material containing carbon; a thermal electron emitter that emits thermal electrons into the arc chamber; and a gas introducer that introduces a source gas and a compound gas into the arc chamber. The source gas to be introduced into the arc chamber contains a halide gas, and the compound gas to be introduced into the arc chamber contains a compound having carbon atoms and hydrogen atoms. 1. An ion generator comprising:an arc chamber that is at least partially made up of a material containing carbon;a thermal electron emitter that emits thermal electrons into the arc chamber; anda gas introducer that introduces a source gas and a compound gas into the arc chamber, whereinthe source gas to be introduced into the arc chamber contains a halide gas, andthe compound gas to be introduced into the arc chamber contains a compound having carbon atoms and hydrogen atoms.2. The ion generator according to claim 1 , wherein the compound gas is hydrocarbon.3. The ion generator according to claim 2 , wherein the hydrocarbon is at least one sort of gases selected from the group consisting of CH claim 2 , CH claim 2 , CHand CH.4. The ion generator according to claim 1 , wherein the source gas contains a fluoride gas.5. The ion generator according to claim 4 , wherein the fluoride gas is at least one sort of gases selected from the group consisting of BF claim 4 , GeFand PF.6. The ion generator according to claim 1 , wherein the source gas is at least one sort of gases selected from the group consisting of a chloride gas claim 1 , an iodide gas and a bromide gas.7. The ion generator according to claim 1 , wherein an inner wall surface of the arc chamber claim 1 , excluding a filament and a cathode claim 1 , is made up of carbon.8. An ion generating method comprising:introducing a source gas and a compound gas into an arc chamber that is at least partially made up of a material containing carbon; ...

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Номер записи: 97
03-05-2018 дата публикации

HIGH RELIABILITY, LONG LIFETIME, NEGATIVE ION SOURCE

Номер: US20180122615A1
Автор: Barrows Preston J., Campbell Logan D., Gribb Tye T., KOBERNIK ARNE V., Lee Jin W., Meaney Kevin D., Radel Ross F., Risley Eric D., SENGBUSCH EVAN R., SEYFERT CHRISTOPHER M., Sherman Joseph D., Swanson Daniel J.
Принадлежит:

A negative ion source includes a plasma chamber, a microwave source, a negative ion converter, a magnetic filter and a beam formation mechanism. The plasma chamber contains gas to be ionized. The microwave source transmits microwaves to the plasma chamber to ionize the gas into atomic species including hyperthermal neutral atoms. The negative ion converter converts the hyperthermal neutral atoms to negative ions. The magnetic filter reduces a temperature of an electron density provided between the plasma chamber and the negative ion converter. The beam formation mechanism extract the negative ions. 1. A negative ion source comprising:a plasma chamber containing a gas to be ionized;a microwave source configured to transmit microwaves to the plasma chamber to ionize the gas into atomic species including hyperthermal neutral atoms;a negative ion source converter configured to convert the hyperthermal neutral atoms to negative ions;a magnetic filter configured to reduce the temperature of electrons between the plasma chamber and the negative ion source converter; anda beam formation mechanism configured to extract the negative ions.2. The negative ion source of claim 1 , wherein the negative ion source is a negative ion source.3. The negative ion source of claim 1 , wherein the plasma chamber has a high voltage and the microwave source is at ground potential.4. The negative ion source of claim 1 , further comprising a waveguide configured to electrically isolate the plasma chamber and the microwave source claim 1 , the waveguide comprising a flange configured to allow a break in the waveguide to be insulated with air.5. The negative ion source of claim 4 , wherein a plurality of waveguides are used to electrically isolate the plasma chamber and the microwave source.6. The negative ion source of claim 1 , wherein the gas to be ionized is hydrogen and the hyperthermal neutral atoms produced are hyperthermal neutral hydrogen atoms.7. The negative ion source of claim 1 , ...

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Номер записи: 98
25-04-2019 дата публикации

Ion Source For Enhanced Ionization

Номер: US20190122851A1
Автор: Alexander S. Perel, Daniel Alvarado, Daniel R. Tieger, Klaus Becker
Принадлежит: Varian Semiconductor Equipment Associates Inc

An ion source having improved life is disclosed. In certain embodiments, the ion source is an IHC ion source comprising a chamber, having a plurality of electrically conductive walls, having a cathode which is electrically connected to the walls of the ion source. Electrodes are disposed on one or more walls of the ion source. A bias voltage is applied to at least one of the electrodes, relative to the walls of the chamber. In certain embodiments, fewer positive ions are attracted to the cathode, reducing the amount of sputtering experienced by the cathode. Advantageously, the life of the cathode is improved using this technique. In another embodiment, the ion source comprises a Bernas ion source comprising a chamber having a filament with one lead of the filament connected to the walls of the ion source.

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Номер записи: 99
25-08-2022 дата публикации

SYSTEM AND METHOD FOR POWER CONVERSION

Номер: US20220271673A1
Автор: Filippov Mikhail, Fogel Paul E.
Принадлежит:

A polarity-selectable high voltage direct current power supply including a first drive assembly that transforms a first low voltage DC input into a first medium voltage alternating current output; a first HV output assembly that transforms the first LV AC output into a first HV DC output, wherein the first HV output assembly defines a first input stage; a polarity selector coupled between the second output junction of the first drive assembly and the first and second input stages of the first HV output assembly, the polarity selector operable between a first configuration and a second configuration; wherein in the first configuration the first HV DC output has a positive polarity; and wherein in the second configuration the first HV DC output has a negative polarity. 1a first power source configured to output a positive polarity direct current (DC) voltage;a second power source configured to output a negative polarity DC voltage;a drive assembly configured to receive a first DC voltage and output an alternating current (AC) voltage;an output assembly electrically coupled to the drive assembly and a plurality of loads, wherein the output assembly is configured to transform the AC voltage into a second DC voltage;a polarity selector coupled between the first and second power source and the drive assembly, the polarity selector operable to modulate a polarity of the second DC voltage;a feedback circuit electrically coupled to the output assembly and operable to detect a parameter of the second DC voltage at the plurality of loads; anda controller connected to the feedback circuit, wherein the controller is operable to transmit signals to the drive assembly or the output assembly to control an output characteristic of the second DC voltage, based on the parameter.. A power supply comprising: This application is a continuation of U.S. application Ser. No. 17/066,429, filed 8 Oct. 2020, which is a continuation of U.S. application Ser. No. 16/385,709 filed 16 Apr. 2019, ...

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Номер записи: 100