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Небесная энциклопедия

Космические корабли и станции, автоматические КА и методы их проектирования, бортовые комплексы управления, системы и средства жизнеобеспечения, особенности технологии производства ракетно-космических систем

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Мониторинг СМИ

Мониторинг СМИ и социальных сетей. Сканирование интернета, новостных сайтов, специализированных контентных площадок на базе мессенджеров. Гибкие настройки фильтров и первоначальных источников.

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Применить Всего найдено 9. Отображено 9.
28-07-2023 дата публикации

High-current pulsed electron beam enhanced HEA transition layer and preparation method of HECs/ta-C composite multilayer structure thereof

Номер: CN116497328A
Автор: MA ZHENYU, LOU XUKUN, SHI XIANQING, ZHOU QIAN, ZHAO WENXUAN, XU FENG, ZUO DUNWEN
Принадлежит:

The invention discloses a high-current pulsed electron beam enhanced HEA transition layer and a preparation method of an HEA/(HECs/ta-C) n composite multilayer structure thereof. An HEA/(HECs/ta-C) n composite coating is formed through a high-entropy alloy (HEA) transition layer, HEA transition layer surface strengthening and HECs/ta-C multilayer alternate growth. The preparation method comprises the following steps: (1) substrate pretreatment, Ar ion cleaning and target material pre-sputtering; (2) preparing an HEA transition layer AlTiVCrZr by adopting a magnetron sputtering method; (3) strengthening the transition layer by an HCPEB method; (4) depositing an (AlTiVCrZr) C layer on the reinforced AlTiVCrZr transition layer by adopting a magnetron sputtering method; (5) further depositing ta-C on the (AlTiVCrZr) C layer by adopting a filtered cathode vacuum arc method; and (6) the operation in the step (4) and the operation in the step (5) are repeated, and the (AlTiVCrZr) C/ta-C multi-layer ...

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Номер записи: 1
05-05-2023 дата публикации

Loading batch optimization method for grinding and polishing silicon carbide wafer substrates

Номер: CN116061013A
Автор: ZHANG DAN, ZHU XISHENG, FU WEIDONG, XU HAITAO, ZUO DUNWEN
Принадлежит:

A loading batch optimization method for silicon carbide wafer substrate polishing processing is characterized by comprising the following steps: step 1, analyzing historical processing data of a silicon carbide wafer polishing processing procedure through a grey correlation analysis method; obtaining the consistency of the wafer group surface quality parameters having strong correlation with the process yield as the input parameter of the processing quality prediction model, and taking the output parameter as the prediction value of the process yield; step 2, establishing a silicon carbide wafer processing quality prediction model based on the historical processing data of the grinding and polishing process acquired by the silicon carbide wafer production line; 3, surface quality parameters of all the to-be-machined wafers in the buffer area are obtained through surface quality detection, and a wafer feeding batch optimization problem model in the buffer area of the batch of machining procedures ...

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Номер записи: 2
12-09-2017 дата публикации

Based on the map of the part of the multi-processing process MBD model and method

Номер: CN0105242538B
Автор: 张丹, 吴容, 魏涛, 徐锋, 左敦稳
Принадлежит:

... 本发明针对三维工艺设计系统中多工序模型管理的需求，公开了种基于图层的零件多加工工序MBD模型及实现方法，包括MBD多工序模型生成，工序模型另存，工序模型图层设置及多工序模型导入到设计部件。本发明可以克服现有工艺设计中操作繁琐、交互次数多及多文件管理模型不易管理等缺陷；本发明将多工序模型在个设计部件的图层中统管理，获得的零件三维加工工艺文件具有唯性，方便管理，而且数据传递过程中不易出错，可大大提高工艺设计效率，同时MBD模型中的几何和工艺信息也极大方便了下游数控编程中几何体部件和毛坯部件的指定工作。 ...

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Номер записи: 3
28-07-2023 дата публикации

Low-temperature assisted high-speed high-pressure microjet homogenizing method and device

Номер: CN116493105A
Автор: SUN YULI, KANG SHIJIE, SUN TAO, XU PENGCHONG, LU WENZHUANG, ZUO DUNWEN
Принадлежит:

A low-temperature assisted high-speed high-pressure microjet homogenizing method and device are characterized in that the device comprises an oil pump power part, a microjet homogenizer main body part, a feeding part, a cooling part and a collision and homogenized product collecting part; according to the invention, a micro-jet high-pressure homogenization technology is combined with low-temperature assistance, so that the brittleness of a slurry raw material is greatly improved, the crushing effect and efficiency of the slurry raw material can be improved when two opposite jets collide with each other at a high speed, and meanwhile, oxidation caused by temperature rise during preparation of some metal powder can be effectively prevented at a low temperature; in addition, a low-temperature cooling chamber is also designed at the collision cavity part, so that the temperature of the slurry raw material after collision can be effectively reduced. A micro-jet channel with a fixed shape is ...

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Номер записи: 4
09-06-2023 дата публикации

Tough and corrosion-resistant non-equimolar high-entropy nitride ceramic coating and preparation method thereof

Номер: CN116240487A
Автор: YI SIGUANG, LU WENZHUANG, PAN JIAGANG, ZHAO DONGXU, ZHANG YUNPENG, DU XINGZHU, SUN YULI, ZUO DUNWEN
Принадлежит:

The invention relates to a tough and corrosion-resistant non-equimolar high-entropy nitride ceramic coating and a preparation method thereof, the chemical composition of the high-entropy nitride ceramic coating is shown in the specification, the element proportion (values of xi and y) is changed by adjusting process parameters, so that the valence electron concentration (VEC) of a coating system is close to the optimal value, and the corrosion resistance of the high-entropy nitride ceramic coating is improved. And thus, the high-entropy nitride coating with optimal mechanical and chemical properties is obtained. The non-equimolar high-entropy nitride ceramic material is of a single-phase face-centered cubic structure, the hardness is larger than 28 GPa, the fracture toughness H3/E2 exceeds 0.58, and the non-equimolar high-entropy nitride ceramic material can tolerate neutral salt spray corrosion for not less than 1000 hours. The high-entropy nitride ceramic coating provided by the invention ...

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Номер записи: 5
29-08-2023 дата публикации

Cooling device for abrasive material cylinder body of abrasive particle flow processing machine tool

Номер: CN116652801A
Автор: SUN YULI, LIU YANLEI, YANG FANXUAN, FAN WULIN, SUN CHAOYUE, ZUO DUNWEN
Принадлежит:

A cooling device for an abrasive material cylinder of an abrasive flow processing machine tool is characterized by comprising a heat dissipation water tank and a temperature control device. The heat dissipation water tank is similar to a hollow sleeve in structure and is tightly attached to the outer wall of the lower grinding material cylinder, cooling liquid flows in a flow channel, the cooling liquid continuously flows when the grinding material cylinder works, a cooling system starts to work when the temperature is too high, heat is taken away through circulating flow of the cooling liquid, and therefore the temperature of grinding materials in the grinding material cylinder is controlled; the problem that the abrasive temperature cannot be effectively reduced during machining of a traditional abrasive flow machine tool is solved. Besides, a cooling pipeline is additionally arranged above the lower grinding material cylinder, the cooling pipeline and the cooling water tank are of an ...

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Номер записи: 6
18-07-2023 дата публикации

Superlattice tough high-entropy alloy nitride ceramic coating and preparation method

Номер: CN116445854A
Автор: YI SIGUANG, LU WENZHUANG, ZHAO DONGXU, PAN JIAGANG, ZHANG YUNPENG, DU XINGZHU, SUN YULI, ZUO DUNWEN
Принадлежит:

The invention discloses a superlattice tough high-entropy alloy nitride ceramic coating and a preparation method. The superlattice tough high-entropy alloy nitride ceramic coating is characterized in that the coating is formed by alternately arranging two kinds of fcc-structured high-entropy alloy nitride ceramics with nanoscale thickness. The hardness of the superlattice high-entropy alloy nitride ceramic coating obtained after annealing at the temperature of 750 DEG C for one hour is larger than 40 GPa, the requirement of a superhard material is met, the fracture toughness exceeds 5 MPa.m < 1/2 >, and the effect of simultaneously hardening and toughening the high-entropy nitride ceramic film is achieved. The superlattice tough high-entropy alloy nitride ceramic coating provided by the invention has a wide application prospect in the fields of advanced coating processing tools, aerospace equipment and the like.

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Номер записи: 7
21-04-2023 дата публикации

Feeding shaft repeated positioning error probability compensation method based on digital map

Номер: CN115993802A
Автор: WU HUAYANG, LI JIEJING, LIU HAIXU, ZUO DUNWEN
Принадлежит:

A feeding shaft repeated positioning error probability compensation method based on a digital map is characterized in that firstly, a repeated positioning error digital map of the position is drawn on the basis of a large number of random errors, secondly, the maximum probability point of the digital map is solved in combination with a dynamic optimization algorithm, and then an error probability threshold value is set to control the possibility of compensation errors. And outputting the size and the direction of a final compensation value, finally starting compensation by taking the maximum probability point as a compensation starting point, detecting the compensated error, enabling error data which does not meet the requirement to enter a probability statistics link again, redrawing the digital map and updating the map. According to the method, the problem that parts are easily damaged due to the fact that repeated positioning errors are restrained through repeated disassembly in the ...

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Номер записи: 8
28-07-2023 дата публикации

Multi-target co-deposition magnetic filtration coating device

Номер: CN116497326A
Автор: ZHOU QIAN, LOU XUKUN, SHI XIANQING, MA ZHENYU, ZHAO WENXUAN, XU FENG, ZUO DUNWEN
Принадлежит:

A multi-target co-deposition magnetic filtering coating device comprises a first cathode arc source and a second cathode arc source, the first cathode arc source and the second cathode arc source comprise a first target and a second target respectively, and insulating materials are arranged on the peripheries of the first target and the second target and used for preventing secondary discharge; the two ends of an inlet of the T-shaped magnetic filtering bent pipe are connected with the front ends of the first cathode arc source and the second cathode arc source respectively, and the outlet end of the T-shaped magnetic filtering bent pipe is connected with an inner cavity of the vacuum coating cavity; the vacuum coating chamber is in a vacuum state and comprises a substrate to be coated, the substrate is connected with an anode source, and the anode source is connected with a negative pulse bias voltage. By controlling the current in the coil module, high-efficiency deposition of a single ...

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Номер записи: 9