09-07-2015 дата публикации
Номер: WO2015100730A1
Принадлежит:
Provided are a write-through vacuum evaporation system and a method therefor, belonging to the field of film-plating processing. The apparatus comprises an electron beam generating device, a vacuum evaporation chamber, a vacuum system, a sample chamber, a driver, a multi-channel signal acquiring and conditioning module, a main control computer, a quantum detection platform, a control cabinet, and a display and detection module. The method comprises: step 1, preparation; step 2: vacuum pumping; step 3, positioning; step 4, target material evaporation; step 5, film-plating by the deposition of a target material beam; step 6, movement of the sample stage in a specific track; step 7, judgement; step 8, quantum effect detection; and step 9, whether there is a quantum effect or not. The write-through vacuum evaporation system overcomes the film-plating mechanism of sample fixing in an existing vacuum evaporation system, and controls the evaporating material for plating a film, in a write-through ...
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