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Космические корабли и станции, автоматические КА и методы их проектирования, бортовые комплексы управления, системы и средства жизнеобеспечения, особенности технологии производства ракетно-космических систем

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Применить Всего найдено 2. Отображено 2.
27-06-2023 дата публикации

Wide-range, high-precision and wide-temperature-zone vacuum sensor batch calibration system and method

Номер: CN116337325A
Принадлежит:

The invention discloses a wide-range, high-precision and wide-temperature-zone vacuum sensor batch calibration system and method, and the system comprises a multi-channel spherical vacuum chamber which is provided with a standard vacuum sensor and is used for the batch calibration of a plurality of vacuum sensors to be calibrated; the air exhaust loop is used for vacuumizing the multi-channel spherical vacuum chamber; the air supply loop is used for supplying air to the multi-channel spherical vacuum chamber; and the PLC control system regulates and controls the air exhaust rate and the air supply rate according to the difference value between the actual pressure intensity of the multi-channel spherical vacuum chamber and the preset target pressure intensity, and high-precision regulation of the vacuum degree in the multi-channel spherical vacuum chamber is achieved. According to the invention, the wide-range standard vacuum sensor, the electric gate valve with the adjustable opening and ...

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26-05-2023 дата публикации

Micro hot plate of leadless glass substrate and preparation method of micro hot plate

Номер: CN116161611A
Принадлежит:

The invention provides a micro hot plate of a leadless glass substrate and a preparation method thereof. The micro hot plate comprises a glass substrate, the front surface of the glass substrate is provided with a glass film structure, two sides of the glass film structure are respectively provided with two through hole structures, and a conductive silicon column is arranged in each through hole structure; a heat insulation groove is formed in the back surface, opposite to the glass film structure, of the glass substrate, and ohmic contact metal electrodes are arranged at the bottom ends of the conductive silicon columns on the back surface of the glass substrate; the heating electrode and the detection electrode are formed on the glass film structure; and the insulation structure is formed between the heating electrode and the detection electrode on the glass film structure. The heat conductivity coefficient of the glass substrate is lower than that of a silicon substrate, the glass substrate ...

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