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Небесная энциклопедия

Космические корабли и станции, автоматические КА и методы их проектирования, бортовые комплексы управления, системы и средства жизнеобеспечения, особенности технологии производства ракетно-космических систем

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Мониторинг СМИ

Мониторинг СМИ и социальных сетей. Сканирование интернета, новостных сайтов, специализированных контентных площадок на базе мессенджеров. Гибкие настройки фильтров и первоначальных источников.

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Поддерживает ввод нескольких поисковых фраз (по одной на строку). При поиске обеспечивает поддержку морфологии русского и английского языка
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Применить Всего найдено 20. Отображено 20.
21-08-2015 дата публикации

SUBSTRATE TRANSFER ROBOT AND SUBSTRATE PROCESSING APPARATUS USING SAME

Номер: KR1020150095311A
Автор: HYON, JUN JIN, SONG, BYOUNG GYU, KIM, KYONG HUN, KIM, YONG KI, SHIN, YANG SIK, KIM, CHANG DOL
Принадлежит:

The present invention relates to a substrate processing apparatus including: a load lock chamber to allow a substrate transferred from the outside to be laid, wherein the inside is converted into a vacuum state or an atmospheric pressure state; a substrate processing module wherein a process for the substrate is carrier out; a transfer chamber placed between the load lock chamber and the substrate processing module and having an internal space to allow the substrate to be transferred; and a substrate transfer robot provided inside the transfer chamber to transfer the substrate. COPYRIGHT KIPO 2015 ...

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Номер записи: 1
30-09-2015 дата публикации

SUBSTRATE PROCESSING APPARATUS WITH HEATER ADJUSTING PROCESS SPACE TEMPERATURE ACCORDING TO HEIGHT

Номер: KR1020150108661A
Автор: HYON, JUN JIN, SONG, BYOUNG GYU, KIM, KYONG HUN, KIM, YONG KI, SHIN, YANG SIK, KIM, CHANG DOL
Принадлежит:

According to an embodiment of the present invention, a substrate processing apparatus to perform a process on the substrate, includes: a lower chamber which has an opened upper part and a path for inputting/outputting the substrate on a side; an external reaction tube which closes the opened upper part of the lower chamber, and provides a process space for the process; a substrate holder which vertically loads at least one substrate, and can be moved from a loading position for loading the substrate in the substrate holder to a process position for performing the process on the substrate; and a gas supply unit which is installed in the external reaction tube, supplies reaction gas to the process space, and forms the flow of the reaction gas with different phase difference in a vertical direction. COPYRIGHT KIPO 2015 ...

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Номер записи: 2
09-06-2016 дата публикации

APPARATUS AND METHOD FOR PROCESSING SUBSTRATE

Номер: KR0101628786B1
Автор: 현준진, 김해원, 신창훈, 송병규, 김경훈, 김용기, 신양식, 김창돌, 김은덕
Принадлежит: 주식회사 유진테크

... 본 발명의 일 실시예에 의하면, 기판 처리장치는, 일측에 형성된 통로를 통해 기판이 이송되며, 상기 기판에 대한 공정이 이루어지는 내부공간을 제공하는, 그리고 상기 기판을 향해 가스를 공급하는 공급포트가 상기 통로의 반대측에 형성된 챔버; 상기 내부공간에 설치되어 상기 내부공간과 대응되는 형상을 가지며, 개구가 형성되는 보조서셉터; 및 상기 개구에 삽입설치되어 상기 기판이 놓여진 상태에서 회전가능하며, 상기 기판을 가열하는 메인서셉터를 포함한다.

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Номер записи: 3
05-06-2015 дата публикации

APPARATUS FOR PROCESSING SUBSTRATE

Номер: KR101525210B1
Автор: SONG, BYOUNG GYU, KIM, KYONG HUN, KIM, YONG KI, SHIN, YANG SIK, KIM, CHANG DOL, SHIN, CHANG HUN, KIM, EUN DUCK
Принадлежит: EUGENE TECHNOLOGY CO., LTD.

According to an embodiment of the present invention, an apparatus for processing a substrate comprises: a chamber in which a substrate is transferred through a path formed on one side, and a supply port which provides an internal space in a rectangular form where the substrate is processed, and supplies gas toward the substrate is formed in the opposite side of the path; and a susceptor installed on the internal space and having a heating area which is arranged at the bottom of the substrate and heats the substrates, and a preheating area which is arranged between the heating area and the supply port, and preheats the gas supplied from the supply port. The susceptor comprises: an auxiliary susceptor in a rectangular form having an opening on an internal surface and providing the preheating area; and a main susceptor inserted and installed into the opening and providing the heating area. COPYRIGHT KIPO 2015 ...

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Номер записи: 4
21-07-2017 дата публикации

기판처리장치

Номер: KR0101760316B1
Автор: 현준진, 제성태, 송병규, 김용기, 김경훈, 김창돌, 신양식, 김재우
Принадлежит: 주식회사 유진테크

... 본 발명은 내부에 공간이 형성되는 튜브, 상기 튜브 내부에서 복수의 기판을 상하방향으로 적재하고, 상기 복수의 기판이 각각 처리되는 처리공간을 구분하는 복수의 아이솔레이션 플레이트를 구비하는 기판지지부, 상기 복수의 기판으로 처리가스를 공급하는 가스공급부, 및 상기 가스공급부와 마주보게 배치되고, 상기 튜브 내부의 가스를 배기하는 배기부를, 포함하고, 상기 아이솔레이션 플레이트에 복수의 관통홀이 형성되어 기판 상 박막을 균일하게 할 수 있다.

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Номер записи: 5
22-10-2018 дата публикации

SUBSTRATE PROCESSING APPARATUS

Номер: KR101910085B1
Автор: KANG SUNG HO, KIM CHANG DOL, LEE SANG DON
Принадлежит: EUGENE TECHNOLOGY CO., LTD.

The present invention relates to a substrate processing apparatus to smooth a flow of a substrate processing gas on a substrate. According to one embodiment of the present invention, the substrate processing apparatus comprises: an outer tube having an internal space; an inner reaction tube disposed in the internal space of the outer tube by being spaced apart from the inner surface of the outer tube and having a reception space therein; a substrate boat mounting a plurality of substrates thereon by a plurality of stages and received on the top part of the reception space of the inner reception tube in processing the substrate; a pedestal received on the bottom part of the reception space of the inner reaction tube in processing the substrate; a gas supply unit disposed on one side of the inner reaction tube; and a discharge duct upwardly extended on the other side of the inner reaction tube to form an inner flow path communicating with a discharge hole penetrating a side wall of the inner ...

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Номер записи: 6
26-11-2015 дата публикации

SUBSTRATE PROCESSING DEVICE AND SUBSTRATE PROCESSING METHOD

Номер: WO2015178687A1
Автор: HYON, Jun-Jin, KIM, Hai-Won, SHIN, Chang-Hun, SONG, Byoung-Gyu, KIM, Kyong-Hun, KIM, Yong-Ki, SHIN, Yang-Sik, KIM, Chang-Dol, KIM, Eun-Duck
Принадлежит:

According to an embodiment of the present invention, a substrate processing device comprises: a chamber for transferring a substrate through a passage formed on one side thereof, the chamber providing an internal space, in which processes related to the substrate are conducted, and the chamber having a supply port formed on the opposite side to the passage so as to supply gas towards the substrate; an auxiliary susceptor, which is installed in the internal space, which has a shape corresponding to that of the internal space, and which has an opening formed therein; and a main susceptor, which is inserted/installed in the opening, which can rotate while the substrate is placed thereon, and which heats the substrate.

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Номер записи: 7
30-11-2015 дата публикации

SUBSTRATE PROCESSING DEVICE AND SUBSTRATE PROCESSING METHOD

Номер: KR1020150133670A
Автор: HYON, JUN JIN, KIM, HAI WON, SHIN, CHANG HUN, SONG, BYOUNG GYU, KIM, KYONG HUN, KIM, YONG KI, SHIN, YANG SIK, KIM, CHANG DOL, KIM, EUN DUCK
Принадлежит:

According to an embodiment of the present invention, a substrate processing device comprises: a chamber for transferring a substrate through a passage formed on one side thereof, the chamber providing an internal space, in which processes related to the substrate are conducted, and the chamber having a supply port formed on the opposite side to the passage so as to supply gas towards the substrate; an auxiliary susceptor, which is installed in the internal space, which has a shape corresponding to that of the internal space, and which has an opening formed therein; and a main susceptor, which is inserted/installed in the opening, which can rotate while the substrate is placed thereon, and which heats the substrate. COPYRIGHT KIPO 2016 ...

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Номер записи: 8
19-04-2016 дата публикации

SUBSTRATE PROCESSING APPARATUS

Номер: KR0101613544B1
Автор: 현준진, 송병규, 김경훈, 김용기, 신양식, 김창돌
Принадлежит: 주식회사 유진테크

... 본 발명은 기판 처리 장치에 관한 것으로, 외부로부터 이송된 기판이 놓여지며, 내부가 진공 상태 및 대기압 상태로 전환되는 로드록 챔버와, 기판에 대한 공정이 이루어지는 기판 처리 모듈과, 로드록 챔버와 기판 처리 모듈 사이에 배치되며, 기판에 대한 이송이 이루어지는 내부공간을 가지는 트랜스퍼 챔버와, 트랜스퍼 챔버의 내부에 설치되며, 기판을 이송 가능한 기판 이송 로봇을 포함하되, 기판 이송 로봇은, 트랜스퍼 챔버의 하부에 회전 가능하게 설치되는 베이스 프레임과, 일단이 베이스 프레임에 회전 가능하게 연결되는 제1회전프레임과, 일단이 제1회전프레임의 타단에 회전 가능하게 연결되는 제2회전프레임과, 일단이 제2회전프레임의 타단에 회전 가능하게 연결되는 암과, 암의 타단에 연결되며 기판이 놓여지는 홀더를 구비하는 이송프레임을 포함하며, 기판 처리 모듈은, 격벽에 의해 구획되는 제1공정공간 및 제2공정공간을 가지며, 일측에 제1공정공간 및 제2공정공간으로 기판이 각각 출입하는 제1통로 및 제2통로가 형성되는 프로세스 챔버와, 프로세스 챔버의 내부에 설치되어 제1통로 및 제2통로의 전방에 각각 배치되고, 상부면이 관통 형성된 복수의 관통홀을 가지며, 공정진행시 상부에 기판이 놓여지는 제1서셉터와, 프로세스 챔버의 내부에 설치되어 제1통로와 제1서셉터의 사이 및 제2통로와 제1서셉터의 사이에 각각 배치되고, 상부면이 관통 형성된 복수의 관통홀을 가지며, 공정진행시 상부에 기판이 놓여지는 제2서셉터와, 제1서셉터 및 제2서셉터의 하부에 각각 설치되며, 관통홀을 이동 가능한 복수의 리프트핀을 포함한다.

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Номер записи: 9
05-10-2015 дата публикации

APPARATUS FOR PROCESSING SUBSTRATE

Номер: KR0101557016B1
Автор: 현준진, 송병규, 김경훈, 김용기, 신양식, 김창돌
Принадлежит: 주식회사 유진테크

... 본 발명의 일 실시예에 의하면, 기판 처리장치는, 일측에 형성된 통로를 통해 기판이 이송되며, 상부 및 하부가 개방된 챔버본체; 상기 챔버본체의 상부에 설치되어 상기 기판에 대한 공정이 이루어지는 공정공간을 제공하며, 하부가 개방된 형상을 가지는 내부반응튜브; 상기 챔버의 개방된 하부에 배치되어 상기 통로를 통해 이송된 상기 기판을 상하방향을 따라 적재하는 적재위치 및 상기 공정공간을 향해 상승하여 적재된 상기 기판에 대한 공정이 이루어지는 공정위치로 전환가능한 기판홀더; 상기 기판홀더의 하부에 연결되어 상기 기판홀더와 함께 승강하며, 상기 공정위치에서 상기 내부반응튜브의 개방된 하부를 폐쇄하는 차단플레이트; 상기 차단플레이트의 하부에 기립설치되어 상기 차단플레이트와 함께 승강하는 연결실린더; 상기 챔버본체의 개방된 하부면과 상기 연결실린더 사이에 연결되며, 개방된 상기 챔버본체의 하부를 외부로부터 격리하는 차단부재를 포함한다.

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Номер записи: 10
22-06-2015 дата публикации

SUBSTRATE PROCESSING MODULE, SUBSTRATE PROCESSING APPARATUS INCLUDING SUBSTRATE PROCESSING MODULE, AND SUBSTRATE TRANSFERRING METHOD

Номер: KR101530024B1
Автор: HYON, JUN JIN, SONG, BYOUNG GYU, KIM, KYONG HUN, KIM, YONG KI, SHIN, YANG SIK, KIM, CHANG DOL
Принадлежит: EUGENE TECHNOLOGY CO., LTD.

The present invention relates to a substrate processing module, a substrate processing apparatus including the same, and a substrate transferring method. The substrate processing module comprises: a chamber which provides a passage for inputting and outputting a substrate on one side; a second susceptor which is installed in the chamber and is disposed at the front portion of the passage, where the substrate is placed on an upper portion thereof during processing; a first susceptor which is installed in the chamber, is disposed between the passage and the second susceptor, and has a plurality of through-holes on the upper face, where the substrate is placed on the upper portion thereof during processing; a rotation member which is installed in the chamber and is rotated about a preset position; a holder which is connected to the rotation member, is rotated with the rotation member, and has a placement face on which the substrate is placed; a holder driving module which is connected to the ...

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Номер записи: 11
05-02-2015 дата публикации

SUBSTRATE PROCESSING APPARATUS

Номер: WO2015016492A1
Автор: SONG, Byoung-Gyu, KIM, Yong-Ki, KIM, Kyong-Hun, KIM, Chang Dol, SHIN, Yang-Sik, YANG, Il-Kwang, SHIN, Chang Hun, KIM, Eun Duck
Принадлежит:

According to one embodiment of the present invention, a substrate processing apparatus comprises: a chamber in which a substrate is transferred through a path formed at one side thereof, providing an inner space in which processing for the substrate is performed, and having a supply port, which supplies gas to the inner space, formed on the opposite side of the path; a susceptor provided in the inner space and in which the substrate is positioned at the upper part thereof; and a diffusion member provided between the susceptor and the sidewall of the chamber so as to be adjacent to the supply port and having a plurality of diffusion holes for diffusing the gas supplied through the supply port.

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Номер записи: 12
23-04-2015 дата публикации

SUBSTRATE TREATMENT APPARATUS

Номер: WO2015057023A1
Автор: HYON, Jun-Jin, SONG, Byoung-Gyu, KIM, Kyong-Hun, KIM, Yong-Ki, SHIN, Yang-Sik, KIM, Chang Dol
Принадлежит:

According to one embodiment of the present invention, a substrate treatment apparatus comprises: a main chamber body wherein a substrate is transferred through a passage formed in one side, and an upper part and a lower part of the main chamber body are open; an internal reaction tube that provides a treatment space in which a treatment for the substrate is performed and which has an open lower part; a substrate holder that is arranged in the open lower part of the chamber and that can carry the substrate as it is transferred through the passage to a stacking position in which substrates are stacked in a vertical direction and to a treatment position in which treatment for the stacked substrates lifted towards the treatment position is performed; a shielding plate that is connected to a lower part of the substrate holder and lifted together with the substrate holder, and that shields the open lower part of the internal reaction tube in the treatment position; a connection cylinder that ...

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Номер записи: 13
18-11-2015 дата публикации

SUBSTRATE TREATMENT DEVICE AND SUBSTRATE TREATMENT METHOD

Номер: KR101570227B1
Автор: HYON, JUN JIN, KIM, HAI WON, SHIN, CHANG HUN, SONG, BYOUNG GYU, KIM, KYONG HUN, KIM, YONG KI, SHIN, YANG SIK, KIM, CHANG DOL, KIM, EUN DUCK
Принадлежит: EUGENE TECHNOLOGY CO., LTD.

According to one embodiment of the present invention, a substrate treatment device comprises: a chamber, wherein a substrate is conveyed through a passage formed on one side and a supply port supplying a gas toward the substrate is formed on the opposite side of the passage, having an inner space where the substrate is processed; an auxiliary susceptor installed in the inner space to have a shape corresponding to the inner space and having an opening; and a main susceptor inserted into the opening to be rotated while the substrate is placed and heating the substrate. COPYRIGHT KIPO 2016 ...

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Номер записи: 14
18-12-2018 дата публикации

SYSTEM FOR PROCESSING SUBSTRATE

Номер: KR101930456B1
Автор: KANG SUNG HO, KIM CHANG DOL, OH SANG YOUNG, CHOI GYU HO
Принадлежит: EUGENE TECHNOLOGY CO., LTD.

The present invention relates to a system for processing a substrate and, more specifically, relates to a system for processing a substrate having a plurality of process tubes. According to an embodiment of the present invention, the system for processing a substrate comprises: first and second process tubes arranged to be spaced in a first axial direction, and providing an independent space with each other; a substrate boat in which a plurality of substrates are stacked, wherein the substrate boat is provided to each process space of the first and second process tubes; and first and second boat elevator provided to the first and second process tubes and elevating the substrate boat. Moreover, the first and second boat elevators can comprise an elevating member disposed in a space between the first and second process tubes. COPYRIGHT KIPO 2019 ...

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Номер записи: 15
12-12-2016 дата публикации

APPARATUS FOR PROCESSING SUBSTRATE AND METHOD FOR PROCESSING SUBSTRATE USING SAME

Номер: KR101685096B1
Автор: HYON, JUN JIN, JE, SUNG TAE, SONG, BYOUNG GYU, KIM, YONG KI, KIM, KYOUNG HUN, KIM, CHANG DOL, SHIN, YANG SIK, KIM, JAE WOO
Принадлежит: EUGENE TECHNOLOGY CO., LTD.

The present invention relates to an apparatus for processing a substrate, which can improve the flow of process gas used in a substrate processing process, and a method for processing a substrate using the same. According to an embodiment of the present invention, an apparatus for processing a substrate comprises: a preparatory chamber receiving a substrate; a process chamber communicating with the preparatory chamber, and performing a processing process of the substrate; a substrate boat including a plurality of partition plates partitioning a loading space in which the substrate is loaded, and able to be elevated; a gas supply unit supplying process gas to the substrate through a plurality of injection nozzles provided in the process chamber; an exhaust unit exhausting air through a plurality of air inlet ports provided in the process chamber; and a swap guide member provided in the preparatory chamber, and supporting the substrate received in the preparatory chamber to seat the substrate ...

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Номер записи: 16
28-02-2017 дата публикации

SUBSTRATE PROCESSING APPARATUS

Номер: KR101710944B1
Автор: HYON, JUN JIN, JE, SUNG TAE, SONG, BYOUNG GYU, KIM, YONG KI, KIM, KYOUNG HUN, KIM, CHANG DOL, SHIN, YANG SIK, KIM, JAE WOO
Принадлежит: EUGENE TECHNOLOGY CO., LTD.

The present invention includes a tube for providing an internal space in which a substrate is processed, a substrate supporting part for stacking a plurality of substrates with multiple layers in the inner space of the tube, a gas supply part for supplying a process gas to the plurality of substrates, an exhaust part arranged to face the gas supply part so as to suck the process gas, and a flow regulating part formed around a circumference of the tube between the gas supply part and the exhaust part and having an injection hole for injecting a regulating gas. The flow of the process gas can be controlled to control the amount of process gas supplied to the upper surface of the substrate. COPYRIGHT KIPO 2017 ...

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Номер записи: 17
21-12-2018 дата публикации

BATCH-TYPE PLASMA SUBSTRATE PROCESSING APPARATUS

Номер: KR101931692B1
Автор: KANG SUNG HO, JO JEONG HEE, CHOI GYU HO, LEE HONG WON, KIM CHANG DOL
Принадлежит: EUGENE TECHNOLOGY CO., LTD.

According to the present invention, a substrate processing apparatus comprises: a tube to provide a processing space in which a plurality of substrates are processed; a substrate support unit to load the plurality of substrates in a first direction in the processing space; a gas supply pipe to supply process gas required for a process of processing the substrates into the tube; an exhaust unit communicating with the tube to discharge process residuals in the processing space to the outside; and a plasma reaction unit which is separated from the processing space by a partition defining a discharging space extended from the tube to form plasma and plasma-decomposes process gas received from the gas supply pipe to supply the decomposed process gas to the processing space. The plasma reaction unit includes: a plurality of power supply electrode units accommodated in the discharging space to be extended in the first direction; and a ground electrode unit provided between the plurality of power ...

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Номер записи: 18
21-03-2017 дата публикации

SUBSTRATE PROCESSING APPARATUS

Номер: KR1020170031437A
Автор: HYON, JUN JIN, JE, SUNG TAE, SONG, BYOUNG GYU, KIM, YONG KI, KIM, KYOUNG HUN, KIM, CHANG DOL, SHIN, YANG SIK, KIM, JAE WOO
Принадлежит:

A substrate processing apparatus according to the present invention includes a tube in which a space is formed, a substrate supporting unit which loads a plurality of substrates inside the tube in a vertical direction and includes a plurality of isolation plates dividing a processing space in which the plurality of substrates are processed, respectively, a gas supply unit which supplies processing gases to the plurality of substrates, and an exhaust unit which is arranged to face the gas supply unit and exhausts the gas from the inside of the tube. A plurality of through holes are formed on the isolation plate, thereby uniformly forming a thin film on the substrate. COPYRIGHT KIPO 2017 ...

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Номер записи: 19
18-11-2016 дата публикации

공정공간 높이별 가열온도를 조절할 수 있는 히터를 구비한 기판 처리 장치

Номер: KR0101677560B1
Автор: 현준진, 송병규, 김경훈, 김용기, 신양식, 김창돌
Принадлежит: 주식회사 유진테크

... 본 발명의 일 실시예에 의하면, 기판에 대한 공정이 이루어지는 기판 처리 장치는, 상부가 개방되며, 일측에 상기 기판이 출입하는 통로가 형성되는 하부챔버; 상기 하부챔버의 개방된 상부를 폐쇄하며, 상기 공정이 이루어지는 공정공간을 제공하는 외부반응튜브; 하나 이상의 상기 기판이 상하방향으로 적재되며, 상기 기판 홀더 내에 상기 기판이 적재되는 적재위치 및 상기 기판에 대한 상기 공정이 이루어지는 공정위치로 전환가능한 기판 홀더; 그리고 상기 외부반응튜브의 내부에 설치되어 상기 공정공간을 향해 반응가스를 공급하며, 상하방향에 따라 서로 다른 위상차를 가지는 상기 반응가스의 유동을 형성하는 가스공급유닛을 포함한다.

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Номер записи: 20