20-01-2016 дата публикации
Номер: KR1020160007217A
Принадлежит:
A pixel of an image sensor includes: a photoelectric conversion area formed in a semiconductor substrate; a floating diffusion area formed by being separated from the photoelectric transformation area in the semiconductor substrate; a vertical transmission gate formed in a recess, extended from a first surface of the semiconductor substrate to the inside, and forming a transmission channel between the photoelectric transformation area and the floating diffusion area; and an impurity area formed by doping impurities to surround the recess, having a first impurity concentration in an adjacent area to a side of the recess, and having a second impurity concentration, higher than the first impurity concentration, in an adjacent area to the bottom of the recess. A channel area of the vertical transmission gate, adjacent to the bottom of the recess, is doped with an impurity concentration, higher than a channel area of the vertical transmission gate, adjacent to the side of the recess, and therefore ...
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