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Небесная энциклопедия

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Применить Всего найдено 9. Отображено 9.
09-05-2016 дата публикации

Method for Chamfering Optical Film Decreasing Contamination by Dust

Номер: KR0101618827B1
Автор: 류동원, 유민상

... 본 발명은 재단된 광학필름반제품의 측면을 다듬는 면취방법에 있어서, 보호필름에 의한 분진의 발생을 최소화하고, 발생된 분진의 발견과 제거를 용이하게 하기 위한 것으로, 보다 상세하게는 하나 또는 복수개의 광학필름반제품의 위아래에 하나 또는 복수개의 폴리프로필렌(PP) 재질의 보호시트를 덧댄 상태로 면취기에 장착하여 작업하는 것을 특징으로 면취방법에 관한 것이다.

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02-04-2018 дата публикации

BIOSENSOR FOR DETECTING PATHOGENIC BACTERIA, MANUFACTURING METHOD THEREOF AND METHOD FOR DETECTING PATHOGENIC BACTERIA USING SAME

Номер: KR1020180033021A
Принадлежит:

The present invention relates to: a biosensor for detecting pathogenic bacteria contained in yellow dust; a manufacturing method thereof; and a method for detecting pathogenic bacteria using the same, and specifically, to: a method for manufacturing a biosensor, which comprises the following steps: (a) aligning carbon nanotubes between electrodes on a substrate; (b) adsorbing a linker on the carbon nanotubes; and (c) fixing a bioreceptor to the linker, wherein the bioreceptor is an antibody which specifically binds to an antigen contained in the pathogenic bacteria; a biosensor manufactured by the manufacturing method; and a method for detecting the pathogenic bacteria using the biosensor. Provided is the biosensor, which can provide accuracy to the variability of an electrical signal when measuring specific binding between the antigen and the antibody with the variability of the electrical signal. COPYRIGHT KIPO 2018 ...

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02-12-2016 дата публикации

에지 노광 장치 및 방법, 기판 처리 장치

Номер: KR0101681636B1
Автор: 유민상, 김형배
Принадлежит: 세메스 주식회사

... 본 발명은 에지 노광 장치 및 이를 포함하는 기판 처리 장치에 관한 것이다. 본 발명의 일 실시 예에 따른 에지 노광 장치는 기판을 지지하는 지지 유닛과 기판의 네 변에 동시에 광을 조사하는 광원을 포함하는 광 조사 유닛을 포함하는 에지 노광 장치를 포함한다.

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04-06-2015 дата публикации

METHOD FOR MANUFACTURING SUBSTRATE, SUBSTRATE, METHOD FOR MANUFACTURING ORGANIC ELECTROLUMINESCENCE DEVICE, AND ORGANIC ELECTROLUMINESCENCE DEVICE

Номер: WO2015080422A1
Принадлежит:

The purpose of the present invention is to reduce light, which is absorbed at an interface of an organic electroluminescence device and disappears, thereby improving the efficiency of extraction of light that is drawn to the outside. A substrate (11) is coated with polymer to form a polymer layer (12); ion bombardment stress resulting from plasma is applied to the polymer layer (12) to form a corrugated layer (13) having multiple corrugated parts; and a first electrode, an organic light-emitting layer, and a second electrode are successively formed on the substrate, on which the corrugated layer is formed, thereby manufacturing an organic electroluminescence device. In addition, a metal layer (23) may be additionally formed on the polymer layer, ion bombardment stress and thermal stress may be applied simultaneously to form corrugated parts, and the metal layer may then be removed.

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11-12-2018 дата публикации

SERIES CONNECTED TYPE EQUIPMENT CLEANING DEVICE FOR WET EQUIPMENT OF SEMICONDUCTOR AND DISPLAY MANUFACTURING FACILITY

Номер: KR101928050B1
Автор: YOO, MIN SANG
Принадлежит: YOO, MIN SANG

Disclosed is a series connected type equipment cleaning device for wet equipment of a semiconductor and a display manufacturing facility, in which a reaction chamber having the wet equipment of the semiconductor and the display manufacturing facility by generating nano-oxygen bubble and nano-carbon dioxide bubble, foreign substances such as static electricity, bacteria, scale and the like caught in the pipes connecting a processing liquid storage tank is able to be removed, the nano-oxygen bubble and a tube-type nano-bubble generating member for generating the nano-carbon dioxide bubble and a rotating nano-bubble generating member are formed in series. Therefore, when only one of the nano-oxygen bubble and the nano-carbon dioxide bubble is generated, a bubble generating force for the only one bubble can be doubled. COPYRIGHT KIPO 2019 ...

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20-11-2015 дата публикации

METHOD FOR CHAMFERING OPTICAL FILM OF WHICH CONTAMINATION DUE TO DUST IS REDUCED

Номер: KR1020150129491A
Принадлежит:

The present invention relates to a method for chamfering a side surface of a cut semi-product of an optical film. The present invention minimizes dust generated by a protection film and easily detects and removes the generated dust. More specifically, a user is capable of performing a chamfering work with a chamfering device where one or more semi-products of the optical film are installed while one or more protective sheets made of polypropylene are added to a lower portion and the upper portion of the semi-products of the optical film. COPYRIGHT KIPO 2016 ...

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12-12-2018 дата публикации

EQUIPMENT CLEANING APPARATUS FOR WET EQUIPMENT OF FACILITY FOR MANUFACTURING SEMICONDUCTOR AND DISPLAY

Номер: KR101928049B1
Автор: YOO, MIN SANG
Принадлежит: HANYANG TS CO., LTD.

A disclosed equipment cleaning apparatus for wet equipment of a facility for manufacturing a semiconductor and a display generates nano-oxygen bubbles and nano-carbon dioxide bubbles. Accordingly, the apparatus of the present invention has an advantage of removing foreign substances such as static electricity, bacteria, scale, etc., which are caught in pipes connecting a reaction chamber and a process liquid storage tank constituting the wet equipment of the facility for manufacturing a semiconductor and a display. COPYRIGHT KIPO 2019 ...

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04-06-2015 дата публикации

METHOD FOR MANUFACTURING SUBSTRATE, METHOD FOR MANUFACTURING ORGANIC ELECTROLUMINESCENT DEVICE, AND ORGANIC ELECTROLUMINESCENT DEVICE

Номер: KR1020150061405A
Принадлежит:

The present invention is to improve the extraction efficiency of light emitted to the outside by reducing the light which is absorbed and disappears on the interface of an organic electroluminescent device. The organic electroluminescent device is manufactured by forming a polymer layer (12) by coating a substrate (11) with a polymer, forming an uneven layer (13) with a plurality of uneven parts by applying ion impact stress due to plasma to the polymer layer (12), and successively forming a first electrode, an organic light emitting layer, and a second electrode on the substrate with the uneven layer. Also, a metal layer (23) is further formed on the upper side of the polymer layer. The metal layer is removed after the uneven part is formed by simultaneously applying thermal stress and the ion impact stress. COPYRIGHT KIPO 2015 ...

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08-06-2016 дата публикации

EDGE EXPOSURE APPARATUS AND METHOD, AND SUBSTRATE TREATING APPARATUS

Номер: KR1020160064790A
Принадлежит:

The present invention relates to an edge exposure apparatus and a substrate treating apparatus including the same. According to an embodiment of the present invention, the edge exposure apparatus includes: a support unit supporting a substrate; and a light irradiation unit including a light source irradiating light to four sides of the substrate at the same time, thereby improving efficiency of an edge exposure process. COPYRIGHT KIPO 2016 ...

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